TW202404812A - Method for producing film - Google Patents

Abstract

A method for producing a film, in which a slot die is used to form, on a substrate, a coating film having a width of 1,600 mm or larger and a thickness of 30 [mu]m or less. The method comprises an application step in which a coating fluid is applied to the substrate and a drying step in which the coating fluid applied to the substrate is dried, the shim of the slot die having a thickness of 20-100 [mu]m.

Description

Film manufacturing method

The present invention relates to a method for manufacturing a thin film.

Conventionally, a method of producing a film is known in which a coating liquid is applied to a base material using a slot die coater (see, for example, Patent Document 1). Prior technical literature patent documents

Patent Document 1: Japanese Patent Application Publication No. 2021-34139

The problem to be solved by the invention The thin film manufacturing method described in the above-mentioned Patent Document 1 is expected to form a broad and thin film on a substrate more uniformly.

The present invention provides a method for manufacturing a film that can uniformly form a wide and thin film using a slit mold.

means to solve problems The present invention [1] includes a method for manufacturing a film, which uses a slit mold to form a film with a width of 1600 mm or more and a thickness of 30 μm or less on a base material; the manufacturing method includes the following steps: a coating step, in which a coating liquid is The coating liquid is applied to the base material; and the drying step is to dry the coating liquid that has been applied to the base material; and the thickness of the gasket of the slit mold is 20 µm or more and 100 µm or less.

The present invention [2] includes the method for manufacturing a film according to the above [1], wherein the slit mold is provided with: a first block; and a second block disposed farther than the first block in the conveyance direction of the base material. Further downstream, a slit is formed between the first block and the first block; and the gasket is arranged between the first block and the second block; the second block has a main body part ; and a protruding portion protruding from the downstream end surface of the main body portion in the discharging direction of the coating liquid toward the downstream side in the discharging direction; and the protruding amount of the protruding portion is 10 µm or less.

The present invention [3] includes the method for manufacturing a film according to the above [1], wherein the slit mold is provided with: a first block; and a second block disposed farther than the first block in the conveyance direction of the base material. Further downstream, a slit is formed between the first block and the first block; and the gasket is arranged between the first block and the second block; the second block has an inclined surface, It starts from the downstream end of the second block in the discharge direction of the coating liquid, and gradually tilts away from the first block toward the upstream end of the second block in the discharge direction; Furthermore, an obtuse angle formed between the discharge direction of the coating liquid and the inclined surface is 110° or more and 170° or less.

The present invention [4] includes the method for producing a film according to the above [1], wherein the transport speed of the substrate is 15 m/min or more and 30 m/min or less.

The present invention [5] includes the method for producing a film according to the above [1], wherein the solid content concentration of the coating liquid is 10 mass % or more and 50 mass % or less.

The present invention [6] includes a method for manufacturing a film as described in the above [1], wherein the coating liquid contains a polyfunctional oligomer and a trifunctional monomer; the ratio of the polyfunctional oligomer in the coating liquid is 20 and the ratio of the aforementioned trifunctional monomer in the coating liquid is 20 mass% or more and 70 mass% or less.

The present invention [7] includes the method for manufacturing a film according to the above [1], wherein the elastic modulus of the gasket is 1500 MPa or more and 6000 MPa or less.

The present invention [8] includes the manufacturing method of the film according to the above [1], wherein the gasket is composed of polyethylene terephthalate.

Invention effect According to the film manufacturing method of the present invention, the thickness of the gasket of the slit mold is adjusted to 30 µm or more and 100 µm or less.

Therefore, a wide (width of 1600mm or more) and thin (thickness of 30µm or less) coating can be uniformly formed on the substrate.

1. Manufacturing method of thin film In the manufacturing method of the film F of the present invention, a "wide" and "thin" film C is formed on the base material S using a slit die D. "Wide" means the width is more than 1600mm. "Thin" means the thickness is less than 30µm.

(1)Film First, the film F will be described. As shown in FIG. 1 , the film F includes a base material S and a film C.

The base material S has a sheet shape. The base material S has a first surface S1 and a second surface S2 in the thickness direction of the base material S. The base material S is made of thermoplastic resin.

Examples of the thermoplastic resin include acrylic resin, polyolefin resin, cyclic polyolefin resin, polyester resin, polycarbonate resin, polystyrene resin, polyamide resin, polyimide resin, and acetate resin. Examples of the acetate resin include cellulose diacetate and cellulose triacetate.

In addition, the base material S may also contain additives. Examples of additives include antioxidants, stabilizers, reinforcing materials, ultraviolet absorbers, flame retardants, antistatic agents, colorants, fillers, plasticizers, lubricants and fillers.

The film C is arranged on the first surface S1 of the base material S. The film C covers the first surface S1 of the base material S. Examples of the functions of the coating C include anti-glare properties, anti-reflective properties, and scratch resistance.

The coating C contains resin. Examples of the resin include thermosetting resins and thermoplastic resins. Examples of the thermosetting resin include urethane resin and epoxy resin. Examples of the thermoplastic resin include acrylic resin, urethane acrylic resin and polyester resin.

The coating C may contain particles. Examples of the particles include oxides, carbonates, silicates, silicate minerals, and phosphates. Examples of the oxide include silicon oxide (silica), titanium oxide (titania), aluminum oxide (alumina), and zirconium oxide (zirconia). Examples of the carbonate include calcium carbonate. Examples of silicate include calcium silicate, aluminum silicate and magnesium silicate. Examples of silicate minerals include talc and kaolin. Examples of phosphate include calcium phosphate.

(2) Film manufacturing system Next, the manufacturing system 1 of the thin film F for carrying out the manufacturing method of the thin film F is demonstrated. As shown in FIG. 2 , the manufacturing system 1 of the film F includes a coating device 2 equipped with a slit die D and a drying device 3 .

The coating device 2 is used to apply the coating liquid to the first surface S1 of the base material S (coating step). That is, the manufacturing method of the film F includes a coating step. In addition, the first surface S1 of the base material S may also be subjected to surface treatment such as corona treatment and plasma treatment before the coating step.

In the coating step, the conveying speed of the substrate S is, for example, 10 m/min or more, preferably 15 m/min or more, more preferably 20 m/min or more, and, for example, 40 m/min or less, preferably 35 m/min or less, preferably It should be less than 30m/minute.

If the conveying speed of the base material S is below the above-mentioned upper limit, the coating liquid can be evenly coated on the base material S. If the conveying speed of the substrate S is above the above-mentioned lower limit, the production efficiency of the film F can be improved.

The drying device 3 is used to dry the coating liquid applied on the base material S (drying step). That is, the manufacturing method of the film F includes a drying step. By drying the coating liquid, the film C is formed on the base material S, and the above-mentioned thin film F can be obtained. In addition, the coating C can also be subjected to ultraviolet curing or heat curing if necessary.

2. Details of coating fluid The viscosity of the coating liquid is, for example, 100 mPa·s or less, preferably 50 mPa·s or less, more preferably 10 mPa·s or less, for example, 1 mPa·s or more. If the viscosity of the coating liquid is below the above upper limit, the coating liquid can be evenly coated on the substrate S.

The surface tension of the coating liquid is, for example, 30 mN/m or more, preferably 35 mN/m or more, and, for example, 60 mN/m or less, preferably 55 mN/m or less.

The solid content concentration of the coating liquid is adjusted so that the viscosity of the coating liquid becomes below the above-mentioned upper limit value. The solid content concentration of the coating liquid is, for example, 10% by mass or more, preferably 20% by mass or more, more preferably 30% by mass or more, more preferably 40% by mass or more, and, for example, 50% by mass or less, preferably 45% by mass. the following.

The coating liquid contains resin components and solvents. The coating liquid contains the above-mentioned particles and additives as necessary. The resin component may be the above-mentioned resin, or may be the above-mentioned resin precursor.

Specifically, the coating liquid contains a polyfunctional oligomer, a polyfunctional monomer, a hydroxyl monomer, a photopolymerization initiator, the above-mentioned particles, a surface tension adjuster, and a thickener. Multifunctional oligomers, multifunctional monomers and hydroxyl monomers are resin components (resin precursors), and photopolymerization initiators, surface tension adjusters and thickeners are additives.

Multifunctional oligomers have multiple ethylenically unsaturated groups. Examples of the ethylenically unsaturated group include an acrylic group, a methacrylic group, and a vinyl group.

The weight average molecular weight of the polyfunctional oligomer is, for example, 300 or more, preferably 400 or more, and, for example, 5,000 or less, preferably 3,000 or less.

The functional group equivalent of the polyfunctional oligomer is, for example, 1 or more, preferably 2 or more, and, for example, 6 or less, preferably 5 or less.

Examples of the polyfunctional oligomer include urethane acrylate and neopentyl acrylate.

The ratio of the polyfunctional oligomer in the coating liquid is, for example, 20 mass% or more, preferably 30 mass% or more, and, for example, 70 mass% or less, preferably 50 mass% or less.

Multifunctional monomers have multiple ethylenically unsaturated groups. Examples of the ethylenically unsaturated group include an acrylic group, a methacrylic group, and a vinyl group.

Examples of the polyfunctional monomer include the condensate of neopentyl erythritol and acrylic acid.

The ratio of the polyfunctional monomer in the coating liquid is, for example, 20 mass% or more, preferably 30 mass% or more, and, for example, 70 mass% or less, preferably 50 mass% or less.

The hydroxyl monomer has one ethylenically unsaturated group and one hydroxyl group. Examples of the hydroxyl monomer include 4-hydroxybutyl acrylate and 2-hydroxyethyl acrylate.

The photopolymerization initiator radically polymerizes multifunctional oligomers, multifunctional monomers and hydroxyl monomers through ultraviolet irradiation. Examples of the photopolymerization initiator include benzophenone-based photopolymerization initiators, phosphine oxide-based photopolymerization initiators, oxime ester-based photopolymerization initiators, and cationic photopolymerization initiators.

Surface tension adjusters adjust the surface tension of the coating fluid. Examples of the surface tension adjuster include cationic surfactants, anionic surfactants, nonionic surfactants, silicone leveling agents, and fluorine leveling agents.

Thickeners adjust the viscosity of the coating fluid. Examples of the thickener include synthetic inorganic polymers, synthetic organic polymers, and natural organic polymers.

3. Details of slit mold As shown in FIG. 3 , the slot die D includes a first block 11 , a second block 12 , and a spacer 13 . The slot mold D has a slit 10 between the first block 11 and the second block 12 . The coating liquid is discharged from the slit 10 .

(1) Block 1 The first block 11 is arranged upstream of the second block 12 in the conveyance direction of the base material S. In this embodiment, the first block 11 is arranged below the second block 12 . The first block 11 extends in the width direction of the base material S. As shown in FIG. 4 , the first block 11 has an upstream end E1 and a downstream end E2 in the discharge direction of the coating liquid. Furthermore, the first block 11 has a manifold 111, a flow path 112, a slit surface 113, and an inclined surface 114.

The manifold 111 is arranged between the upstream end E1 and the downstream end E2 in the discharge direction of the coating liquid. The manifold 111 extends in the width direction. The manifold 111 is open to the second block 12.

The flow path 112 is arranged at the center of the first block 11 in the width direction. The flow path 112 is connected to the manifold 111 . The coating liquid enters the manifold 111 through the flow path 112 .

The slit surface 113 is the inner surface upstream of the slit 10 in the conveyance direction of the base material S. The slit surface 113 faces the second block 12 . The slit surface 113 extends from the manifold 111 to the downstream end E2 in the discharge direction of the coating liquid. The slit surface 113 also extends in the width direction. The slit surface 113 is a flat surface.

The inclined surface 114 is the outer surface on the upstream side of the first block 11 in the conveyance direction of the base material S. The inclined surface 114 is inclined with respect to the discharge direction of the coating liquid. Specifically, the inclined surface 114 starts from the downstream end E2 of the first block 11 and gradually slopes away from the second block 12 toward the upstream end E1. The obtuse angle θ1 formed between the discharge direction of the coating liquid and the inclined surface 114 is, for example, 110° or more, preferably 140° or more, and, for example, 170° or less, preferably 160° or less.

If the obtuse angle θ1 is equal to or greater than the above-described lower limit, excessive accumulation of the coating liquid on the upstream side of the protruding portion 122 in the conveyance direction of the base material S can be suppressed. The protruding portion 122 will be described later. If the obtuse angle θ1 is equal to or less than the upper limit, the amount of the coating liquid accumulated in the protruding portion 122 on the upstream side of the conveyance direction of the substrate S can be prevented from being excessively reduced.

(2)The second block As shown in FIG. 3 , the second block 12 is arranged downstream of the first block 11 in the conveyance direction of the base material S. In this embodiment, the second block 12 is arranged above the first block 11 . The second block 12 extends in the width direction of the base material S. As shown in FIG. 4 , the second block 12 has an upstream end E11 and a downstream end E12 in the discharge direction of the coating liquid. Moreover, the second block 12 has a main body part 121 and a protruding part 122.

The main body part 121 is the entire second block 12 excluding the protruding part 122. The body part 121 has a slit surface 1211, an inclined surface 1212 and an end surface 1213.

The slit surface 1211 is the inner surface on the downstream side of the slit 10 in the conveyance direction of the base material S. The slit surface 1211 faces the first block 11 . Specifically, the slit surface 113 faces the manifold 111 and the slit surface 113 . The slit surface 1211 extends in the discharge direction of the coating liquid. The slit surface 1211 extends parallel to the slit surface 113 . In addition, the slit surface 1211 also extends in the width direction. The slit surface 1211 is a flat surface.

The inclined surface 1212 is the outer surface on the downstream side of the second block 12 in the conveyance direction of the base material S. The inclined surface 1212 is inclined with respect to the discharge direction of the coating liquid. Specifically, the inclined surface 1212 starts from the downstream end E12 of the second block 12 and gradually slopes away from the first block 11 toward the upstream end E11. The obtuse angle θ2 formed between the discharge direction of the coating liquid and the inclined surface 1212 is, for example, 110° or more, preferably 140° or more, and, for example, 170° or less, preferably 160° or less.

If the obtuse angle θ2 is equal to or greater than the lower limit, excessive accumulation of the coating liquid on the upstream side of the protruding portion 122 in the conveyance direction of the substrate S can be suppressed. If the obtuse angle θ2 is equal to or less than the upper limit, the amount of the coating liquid accumulated in the protruding portion 122 on the upstream side of the conveyance direction of the substrate S can be prevented from being excessively reduced.

The end surface 1213 is an end surface on the downstream side of the main body 121 in the discharge direction of the coating liquid. The end surface 1213 is arranged at the downstream end E12 of the second block. The end surface 1213 is orthogonal to the slit surface 1211. The end surface 1213 extends toward the conveying direction of the substrate S.

The protrusion 122 protrudes from the end surface 1213 toward the downstream side in the discharge direction. In other words, the protruding portion 122 protrudes toward the base material S.

The protruding amount of the protruding portion 122 is, for example, 15 μm or less, preferably 10 μm or less, and preferably 5 μm or less, for example, 1 μm or more.

If the protruding amount of the protruding portion 122 is less than the above-mentioned upper limit, contact of the protruding portion 122 with the base material S can be suppressed. If the protruding amount of the protruding portion 122 is more than the above-mentioned lower limit, the coating liquid can be accumulated on the upstream side of the protruding portion 122 in the conveying direction of the substrate S, and even if the conveying speed of the substrate S is increased, the coating liquid can still be accumulated. The application liquid is evenly applied on the base material S.

The protruding amount of the protruding portion 122 is, for example, 20% or less, preferably 10% or less, and, for example, 1% or more relative to the distance between the end surface 1213 and the base material S in the discharge direction.

If the ratio of the protruding amount of the protruding portion 122 to the distance between the end surface 1213 in the discharge direction and the base material S is below the above upper limit, contact of the protruding portion 122 with the base material S can be suppressed. If the ratio of the protruding amount of the protruding portion 122 to the distance between the end surface 1213 and the substrate S in the discharge direction is more than the above-mentioned lower limit, the coating liquid can be accumulated upstream of the protruding portion 122 in the conveyance direction of the substrate S. side, and even if the conveying speed of the substrate S increases, the coating liquid can still be evenly coated on the substrate S.

(3)Gasket As shown in FIGS. 3 and 4 , the gasket 13 is arranged between the first block 11 and the second block 12 . The gasket 13 adjusts the distance between the slit surface 113 of the first block 11 and the slit surface 1211 of the second block 12 . In other words, the spacer 13 adjusts the inner size of the slit 10 in the conveying direction of the substrate S.

The thickness of the gasket 13 is 20 µm or more, preferably 30 µm or more, more preferably 60 µm or more, and for example, 100 µm or less, preferably 80 µm or less.

If the thickness of the gasket 13 is more than the above-mentioned lower limit, the thickness of the center portion of the film C in the width direction of the base material S can be suppressed from excessively increasing relative to the thickness of the end portions of the film C in the width direction of the base material S. big. If the thickness of the gasket 13 is less than the above-mentioned upper limit, the thickness of the end portions of the film C in the width direction of the base material S can be suppressed from excessively increasing relative to the thickness of the center portion of the film C in the width direction of the base material S. big.

The gasket 13 may be made of materials such as stainless steel and polyethylene terephthalate.

The elastic modulus of the gasket 13 is 1500 MPa or more and 6000 MPa or less. When the elastic modulus of the gasket 13 is below the above upper limit, when the gasket 13 is sandwiched between the first block 11 and the second block 12, the gasket 13 can be slightly deformed. Thereby, the gasket 13 can contact the first block 11 in such a way that a gap cannot be formed between the first block 11 and the gasket 13 , and at the same time, the gasket 13 can be prevented from being in contact with the second block 12 and the gasket 13 . 13 contact the second block 12 by forming a gap between them. As a result, the coating liquid can be suppressed from leaking from between the first block 11 and the gasket 13 or from between the second block 12 and the gasket 13 . In addition, when the elastic modulus of the gasket 13 is below the above-mentioned upper limit, the gasket 13 can still be made to conform even if the gasket 13 is slightly bent during storage or when fine scratches are formed on the gasket 13 The first block 11 and the second block 12 are sandwiched between the first block 11 and the second block 12 . On the other hand, when the elastic modulus of the gasket 13 is equal to or higher than the above-mentioned lower limit, when the gasket 13 is sandwiched between the first block 11 and the second block 12, the gasket 13 can be prevented from overshooting. Deformation.

The gasket 13 is preferably composed of polyethylene terephthalate. When the gasket 13 is made of polyethylene terephthalate, the elastic modulus of the gasket 13 can be set within the above range. Furthermore, when the gasket 13 is made of polyethylene terephthalate, the gasket 13 can be easily processed.

4. Uniformity of film By applying the above-mentioned coating liquid to the base material S using the above-mentioned slit die D and drying it, a film F having a uniform thickness of the film C in the entire width direction of the base material S can be produced.

For the obtained film F, in the width direction of the substrate S, the difference between the thickness of the center portion of the film C and the thickness of the end portion of the film C is, for example, 2.5 µm or less, preferably 2.0 µm or less, more preferably 1.5 µm. or less, preferably 1.0µm or less, more preferably 0.5µm or less. In addition, the lower limit value of the difference between the thickness of the center part of the film C and the thickness of the edge part of the film C is not limited. The difference between the thickness of the central part of the coating C and the thickness of the end parts of the coating C may be 0 µm.

4. Effect According to the manufacturing method of the film F, the thickness of the gasket 13 of the slit mold D is adjusted to 30µm or more and 100µm or less.

Therefore, a wide (width of 1600 mm or more) and thin (thickness of 30 µm or less) coating C can be uniformly formed on the substrate S.

Specifically, when the viscosity of the coating liquid is 100 mPa or less, the difference between the thickness of the center portion of the film C and the thickness of the end portion of the film C in the width direction of the substrate S can be less than 2.5 µm.

Example Next, the present invention will be described based on Examples and Comparative Examples. The present invention is not limited by the following examples. In addition, specific numerical values such as physical property values and parameters used in the following description may be replaced by the upper limit values ("less than", "less than") of the corresponding physical property values, parameters, etc. described in the above "Modes for Carrying out the Invention". ”) or lower limit value (“above”, “greater than” the value defined).

1. Manufacturing of coating fluid The following materials were blended into toluene to obtain a coating liquid. The solid content of the coating liquid is 42% by mass, and the viscosity of the coating liquid is 6 mPa·s.

Multifunctional oligomers: NK oligomer UA-53H-80BK (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) 50 parts by mass Multifunctional monomer: Viscoat # 300 (manufactured by Osaka Organic Chemical Industry Co., Ltd.) 50 parts by mass Hydroxy monomer: 4-Hydroxybutyl acrylate (manufactured by Osaka Organic Chemical Industry Co., Ltd.) 20 parts by mass Photopolymerization initiator: Omnirad907 (manufactured by IGM Resin) 5 parts by mass surface tension adjuster GRANDIC PC4100 (manufactured by DIC Corporation) 1 part by mass Silica particles Techpolymer SSX-103DXE (manufactured by Sekisui Chemical Industry Co., Ltd.) 0.5 parts by mass thickener SUMECTON-SAN solution (manufactured by Nitto Denko Co., Ltd.) 1.5 parts by mass 2. Manufacturing of thin films Using the slit mold shown in Figure 3 (block height: 76mm), apply the coating liquid to the base material (material: acrylic film) under the conditions shown in Tables 1 to 3, and heat at 95°C The film was dried for 1 minute, and the films of each Example and each Comparative Example having a film of acrylic urethane resin on the substrate were obtained.

For the film obtained, measure the film thickness at five locations in the width direction of the base material (the center, one end, the other end, between one end and the center, and between the other end and the center), and calculate the maximum thickness and minimum thickness. difference. The results are shown in Table 1.

In addition, the appearance of the film was evaluated based on the following criteria. The results are shown in Tables 1 to 3.

＜Appearance Evaluation Criteria＞ A: There is no appearance defect at all by visual inspection.

B: Although some unevenness can be observed by visual inspection, it can still be used as a finished product.

C: Although the appearance is poor by visual inspection, it can still be used as a product.

D: Overall poor appearance occurs and the product cannot be used as a product.

[Table 1]

[Table 2]

[table 3] In addition, the above invention provides embodiments as examples of the present invention, but these are only examples and should not be construed as limiting. Those skilled in the art will clearly understand that modifications of the present invention are included in the patent scope described below. Industrial Applicability The method for producing the film of the present invention is used to produce films.

C:Coat D: Slit mold E1: The upstream end of the first block E11: Upstream end of the second block E2: The downstream end of the first block E12: The downstream end of the second block F: film S:Substrate S1: The first side of the substrate S2: The second side of the substrate 1: Film manufacturing system 2: Coating device 3: Drying device 10: slit 11: Block 1 111:Manifold 112:Flow path 113: Slit surface of the first block 114: Inclined surface 12:The second block 121: Ontology part 1211: Slit surface of the second block 1212: Inclined surface 1213: End face 122:Protrusion 13:Gasket θ1, θ2: obtuse angle

Figure 1 is a cross-sectional view of the film. FIG. 2 is a schematic diagram of a thin film manufacturing system. Figure 3 is a perspective view of the slit mold. Figure 4 is a cross-sectional view of the slit mold shown in Figure 3.

E1: The upstream end of the first block

E11: Upstream end of the second block

E2: The downstream end of the first block

E12: The downstream end of the second block

10: slit

11: Block 1

111:Manifold

112:Flow path

113: Slit surface of the first block

114: Inclined surface

12:The second block

121: Ontology part

1211: Slit surface of the second block

1212: Inclined surface

1213: End face

122:Protrusion

13:Gasket

θ1, θ2: obtuse angle

Claims (8)

A method of manufacturing a film that uses a slit mold to form a film with a width of 1600mm or more and a thickness of 30µm or less on a substrate; The manufacturing method includes the following steps: The coating step is to apply the coating liquid to the substrate; and The drying step is to dry the coating liquid that has been applied to the base material; and, The thickness of the gasket of the aforementioned slit mold is 20µm or more and 100µm or less. The method for manufacturing a film according to claim 1, wherein the slit mold is provided with: a first block; and a second block disposed further downstream than the first block in the conveying direction of the base material, and between A slit is formed between the first blocks; and the gasket is arranged between the first block and the second block; The aforementioned second block has: body part; and The protruding portion protrudes from the downstream end surface of the main body portion in the discharge direction of the coating liquid toward the downstream side in the discharge direction; and The protrusion amount of the protrusion is 10µm or less. The method for manufacturing a film according to claim 1, wherein the slit mold is provided with: a first block; and a second block disposed further downstream than the first block in the conveying direction of the base material, and between A slit is formed between the first blocks; and the gasket is arranged between the first block and the second block; The second block has an inclined surface that starts from the downstream end of the second block in the discharge direction of the coating liquid and gradually moves away from the upstream end of the second block in the discharge direction. The direction of the aforementioned first block is tilted; and, The obtuse angle formed by the discharge direction of the coating liquid and the inclined surface is 110° or more and 170° or less. The method for manufacturing a film according to claim 1, wherein the conveying speed of the substrate is 15 m/min or more and 30 m/min or less. The method for manufacturing a film according to claim 1, wherein the solid content concentration of the coating liquid is 10 mass% or more and 50 mass% or less. The method for manufacturing a film according to claim 1, wherein the coating liquid contains a multifunctional oligomer and a trifunctional monomer; The ratio of the polyfunctional oligomer in the coating liquid is 20 mass% or more and 70 mass% or less; and The ratio of the polyfunctional oligomer in the coating liquid is 20 mass% or more and 70 mass% or less. The method for manufacturing a film according to claim 1, wherein the elastic modulus of the gasket is 1500 MPa or more and 6000 MPa or less. The method for manufacturing a film according to claim 1, wherein the gasket is made of polyethylene terephthalate.