TW202403303A - Ultrasonic imaging device and method for removing noise of reflected wave capable of generating highly accurate image information of a bonding interface of an object by generating pixelized information using a waveform from which noise is removed - Google Patents

Ultrasonic imaging device and method for removing noise of reflected wave capable of generating highly accurate image information of a bonding interface of an object by generating pixelized information using a waveform from which noise is removed Download PDF

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TW202403303A
TW202403303A TW112123830A TW112123830A TW202403303A TW 202403303 A TW202403303 A TW 202403303A TW 112123830 A TW112123830 A TW 112123830A TW 112123830 A TW112123830 A TW 112123830A TW 202403303 A TW202403303 A TW 202403303A
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reflected wave
phase
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小林昌幸
大野茂
北見薫
菊川耕太郎
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日商日立電力解決方案股份有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N29/00Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
    • G01N29/04Analysing solids
    • G01N29/06Visualisation of the interior, e.g. acoustic microscopy
    • G01N29/0654Imaging
    • G01N29/069Defect imaging, localisation and sizing using, e.g. time of flight diffraction [TOFD], synthetic aperture focusing technique [SAFT], Amplituden-Laufzeit-Ortskurven [ALOK] technique
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N29/00Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
    • G01N29/44Processing the detected response signal, e.g. electronic circuits specially adapted therefor
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2291/00Indexing codes associated with group G01N29/00
    • G01N2291/04Wave modes and trajectories
    • G01N2291/045External reflections, e.g. on reflectors

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Abstract

The present invention provides an ultrasonic imaging device capable of generating highly accurate image information of a bonding interface of an object by generating pixelized information using a waveform from which noise is removed. An ultrasonic imaging device 100 irradiates an object formed by laminating a plurality of layers with an ultrasonic wave to obtain a reflected wave of a bonding interface of the object, and generates an image of the bonding interface based on signal intensity of the reflected wave. The ultrasonic imaging device 100 includes: a matching processing unit 56 for correcting a phase shift of a second reflected wave from a second irradiation point in the object with respect to a first reflected wave from a first irradiation point in the object; and a pixelized information generation processing unit (averaging processing unit) 57 for removing noise from the first reflected wave based on the first reflected wave and the second reflected wave after phase correction, and generating pixelized information of a portion of the bonding interface that returns an interface echo based on signal intensity of the interface echo indicating a waveform from the bonding interface in the first reflected wave from which the noise is removed.

Description

超音波影像裝置及反射波之雜訊除去方法Ultrasonic imaging device and method for removing reflected wave noise

本發明係關於超音波影像裝置及反射波之雜訊除去方法。The present invention relates to an ultrasonic imaging device and a method for removing reflected wave noise.

超音波影像裝置從探頭向檢查對象物(被檢體)照射超音波,接收其反射波而將對象界面影像化。於對檢查對象物反覆進行超音波之收發之超音波檢查裝置中,作為使對象波形清晰化之方法,提出了藉由類似之反射波進行平均化來除去雜訊之方法。The ultrasonic imaging device irradiates ultrasonic waves from a probe to an inspection object (subject), receives the reflected waves, and images the object interface. In ultrasonic inspection devices that repeatedly transmit and receive ultrasonic waves to an object to be inspected, a method of removing noise by averaging similar reflected waves has been proposed as a method of clarifying the waveform of the object.

於專利文獻1中揭示了一種超音波檢查裝置,其具備:超音波發送部,其反覆進行向檢查對象物之超音波之發送;超音波接收部,其反覆進行從超音波發送部發送且於檢查對象物中傳播之檢查對象超音波之接收;反覆間隔設定部,其設定超音波發送部發送超音波之反覆間隔,於每當反覆進行超音波發送部之超音波之發送時,使該反覆間隔每次增加或減少一定之偏移量;及平均化處理部,其使超音波發送部之超音波之發送開始時點同步地對由超音波接收部反覆進行接收之檢查對象超音波進行平均化;偏移量係滿足如下條件之值,即,表示重疊於檢查對象超音波之混響分量於由平均化處理部平均化前後之比之絕對值之指標為最小或預定值以下。 [先前技術文獻] [專利文獻] Patent Document 1 discloses an ultrasonic inspection device, which includes: an ultrasonic transmitter that repeatedly transmits ultrasonic waves to an inspection target; and an ultrasonic receiver that repeatedly transmits ultrasonic waves from the ultrasonic transmitter to Reception of the inspection target ultrasonic wave propagated in the inspection object; a repetition interval setting unit that sets the repetition interval of the ultrasonic wave sent by the ultrasonic transmitting unit, and causes the repetition every time the ultrasonic wave transmission by the ultrasonic transmitting unit is repeated. The interval increases or decreases by a certain offset each time; and an averaging processing unit synchronizes the ultrasonic transmission start point of the ultrasonic transmitting unit to average the inspection target ultrasonic waves repeatedly received by the ultrasonic receiving unit. ; The offset amount is a value that satisfies the condition that the index indicating the absolute value of the ratio of the reverberation component superimposed on the ultrasonic wave of the inspection object before and after averaging by the averaging processing unit is the minimum or less than a predetermined value. [Prior technical literature] [Patent Document]

[專利文獻1]日本專利特開2013-29396號公報[Patent Document 1] Japanese Patent Application Publication No. 2013-29396

[發明所欲解決之問題][Problem to be solved by the invention]

於專利文獻1所公開之技術中,沒有考慮抖動(時間軸方向之波動)之影響。於超音波影像裝置中,向對象物照射超音波而取得其反射波,但該等反射波由於抖動而產生相位之偏移。於產生了相位之偏移之狀態下進行平均化之情形時,必要之波形之信號強度有可能減弱。其結果,產生忽略應發現之缺陷之問題。In the technology disclosed in Patent Document 1, the influence of jitter (fluctuation in the time axis direction) is not considered. In an ultrasonic imaging device, an object is irradiated with ultrasonic waves to obtain its reflected waves. However, the phase of these reflected waves is shifted due to jitter. When averaging is performed in a state where a phase shift occurs, the signal strength of the necessary waveform may be weakened. As a result, defects that should be discovered are ignored.

本發明係鑒於上述課題而完成,其目的在於提供一種超音波影像裝置及反射波之雜訊除去方法,利用除去雜訊後之波形生成像素化資訊,藉此能夠生成對象物之接合界面之高精度之圖像資訊。 [解決問題之技術手段] The present invention was completed in view of the above-mentioned problems, and its purpose is to provide an ultrasonic imaging device and a method for removing noise from reflected waves, using the waveform after noise removal to generate pixelated information, thereby being able to generate the height of the joint interface of the object. Accurate image information. [Technical means to solve problems]

為了實現上述目的,本發明之超音波影像裝置係對積層多層而成之對象物照射超音波來取得上述對象物之接合界面之反射波,並基於上述反射波之信號強度來生成上述接合界面之圖像,且具有:匹配處理部,其對來自上述對象物中之第2照射點之第2反射波相對於來自上述對象物中之第1照射點之第1反射波之相位之偏移進行校正;及像素化資訊生成處理部,其基於上述第1反射波及相位校正後之上述第2反射波從上述第1反射波除去雜訊,並基於除去雜訊後之上述第1反射波中之表示來自上述接合界面之波形之界面回波之信號強度,生成返回了上述接合界面中之上述界面回波之部位之像素化資訊,上述匹配處理部係於上述第1反射波之上述界面回波之信號強度具有表示預定值之閾值以上之大小之情形時,進行使上述第2反射波之上述界面回波之峰部之相位與上述第1反射波之上述界面回波之峰部之相位一致之處理,於上述第1反射波之上述界面回波之信號強度不具有上述閾值以上之大小之情形時,進行使上述第2反射波之表面回波之峰部之相位與上述第1反射波之上述表面回波之峰部之相位一致之處理。本發明之其他方式,於後述之實施方式中進行說明。 [發明之效果] In order to achieve the above object, the ultrasonic imaging device of the present invention irradiates ultrasonic waves to a multi-layered object to obtain the reflected wave of the joint interface of the object, and generates the joint interface based on the signal strength of the reflected wave. The image further includes a matching processing unit that performs a phase shift of the second reflected wave from the second irradiation point on the object with respect to the phase of the first reflected wave from the first irradiation point on the object. Correction; and a pixelation information generation processing unit, which removes noise from the above-mentioned first reflected wave based on the above-mentioned first reflected wave and the above-mentioned second reflected wave after phase correction, and based on the above-mentioned first reflected wave after removing noise The signal strength of the interface echo from the waveform of the above-mentioned joint interface is represented, and pixelated information is generated that returns the portion of the above-mentioned interface echo in the above-mentioned joint interface. The above-mentioned matching processing unit is based on the above-mentioned interface echo of the above-mentioned first reflected wave. When the signal strength is greater than or equal to a threshold value indicating a predetermined value, the phase of the peak portion of the interface echo of the second reflected wave is made to coincide with the phase of the peak portion of the interface echo of the first reflected wave. When the signal intensity of the interface echo of the first reflected wave does not exceed the threshold, the phase of the peak of the surface echo of the second reflected wave is made equal to that of the first reflected wave. The process of making the peaks of the above-mentioned surface echoes consistent in phase. Other aspects of the present invention will be described in the embodiments described below. [Effects of the invention]

根據本發明,利用除去雜訊後之波形生成像素化資訊,藉此能夠生成積層多層而成之對象物之接合界面之高精度之圖像資訊。According to the present invention, the waveform after removing noise is used to generate pixelated information, thereby making it possible to generate high-precision image information of the joint interface of a multi-layered object.

適當參照附圖,對用於實施本發明之實施方式進行詳細說明。 圖1係表示本實施方式之超音波影像裝置100之構成之圖。圖2係表示作為反射波之界面回波及雜訊之圖。超音波影像裝置100用於發現積層多層之半導體等積層多層而成之對象物之接合界面之缺陷。 Embodiments for carrying out the present invention will be described in detail with appropriate reference to the drawings. FIG. 1 is a diagram showing the structure of the ultrasonic imaging device 100 according to this embodiment. Figure 2 is a diagram showing interface echo and noise as reflected waves. The ultrasonic imaging device 100 is used to detect defects in the bonding interface of an object formed by laminating multiple layers of semiconductors or the like.

超音波影像裝置100構成為包括控制部50、掃描部70(機械部)及超音波探頭20。超音波影像裝置100於對象物之檢查範圍內,經由探頭向以預先決定之間隔設定之照射點照射超音波而取得其反射波,從該反射波中提取表示作為檢查對象之接合界面之波形之界面回波,對全部之照射點或特定之照射點實施將該界面回波之信號強度轉換為正之整數值(0~255)而生成像素化資訊之處理,並基於所生成之照射點之像素化資訊生成接合界面之圖像而找出缺陷。The ultrasonic imaging device 100 is configured to include a control unit 50 , a scanning unit 70 (mechanical unit), and an ultrasonic probe 20 . The ultrasonic imaging device 100 irradiates ultrasonic waves through a probe to irradiation points set at predetermined intervals within the inspection range of the object to obtain the reflected waves, and extracts from the reflected waves a waveform representing the joint interface to be inspected. Interface echo is a process that converts the signal intensity of the interface echo into a positive integer value (0~255) to generate pixelated information for all illumination points or specific illumination points, and based on the pixels of the generated illumination point The information is used to generate an image of the joint interface to find defects.

但是,於反射波中,如圖2之波形資料31所示,除了表面回波、界面回波之外,有時還重疊電雜訊等雜訊。該等雜訊於生成界面回波之像素化資訊時產生影響,因此需要儘可能除去雜訊。However, in the reflected wave, as shown in the waveform data 31 in Fig. 2, in addition to the surface echo and the interface echo, noise such as electrical noise is sometimes superimposed. This noise affects the pixelated information generated by the interface echo, so it is necessary to remove the noise as much as possible.

返回到圖1,超音波探頭20具備偵測該超音波探頭20之掃描位置之編碼器21、將電信號與超音波信號相互轉換之壓電元件22。壓電元件22係單一焦點型之超音波感測器。Returning to FIG. 1 , the ultrasonic probe 20 includes an encoder 21 for detecting the scanning position of the ultrasonic probe 20 and a piezoelectric element 22 for converting electrical signals and ultrasonic signals to each other. The piezoelectric element 22 is a single focus type ultrasonic sensor.

控制部50具備:掃描控制部51,其控制超音波探頭20之掃描位置;收發控制部52,其控制超音波之收發;圖像生成部53,其基於由平均化處理部57生成之像素化資訊來生成超音波圖像;匹配處理部56,其校正來自被檢體15(對象物)中之第2照射點之第2反射波相對於來自被檢體15中之第1照射點之第1反射波之相位之偏移;平均化處理部57(像素化資訊生成處理部),其基於第1反射波及相位校正後之第2反射波從第1反射波除去雜訊,並基於除去雜訊後之第1反射波中之表示來自接合界面之波形之界面回波之信號強度,生成返回了接合界面中之界面回波之部位之像素化資訊;儲存部58;及收發部60等。另外,關於第1照射點、第2照射點,參照圖3於後面敍述。關於平均化處理,亦於後面進行說明。The control unit 50 includes a scan control unit 51 that controls the scanning position of the ultrasonic probe 20 , a transmission and reception control unit 52 that controls the transmission and reception of ultrasonic waves, and an image generation unit 53 that is based on pixelation generated by the averaging processing unit 57 information to generate an ultrasonic image; the matching processing unit 56 corrects the second reflected wave from the second irradiation point in the subject 15 (object) relative to the second reflected wave from the first irradiation point in the subject 15 1. Shift of the phase of the reflected wave; the averaging processing unit 57 (pixelated information generation processing unit) removes noise from the first reflected wave based on the first reflected wave and the phase-corrected second reflected wave, and removes noise based on the noise removal. The signal strength of the interface echo representing the waveform from the joint interface in the first reflected wave after the signal is generated to generate pixelated information of the location where the interface echo in the joint interface is returned; the storage unit 58; and the transceiver unit 60, etc. In addition, the first irradiation point and the second irradiation point will be described later with reference to FIG. 3 . The averaging process will also be described later.

雖未圖示,但收發部60具備發送器、對超音波探頭20接收到之接收信號進行放大之放大器、將該接收信號從類比信號轉換為數位信號之A/D轉換器、及對該接收信號進行信號處理之信號處理部等。Although not shown in the figure, the transceiver unit 60 includes a transmitter, an amplifier that amplifies the received signal received by the ultrasonic probe 20, an A/D converter that converts the received signal from an analog signal to a digital signal, and the received signal. Signal processing section for signal processing, etc.

掃描控制部51與機械控制裝置77可輸入輸出地連接。掃描控制部51藉由機械控制裝置77、X軸掃描儀71、Y軸掃描儀72及Z軸掃描儀73控制超音波探頭20之掃描位置,並且從機械控制裝置77接收超音波探頭20之當前之掃描位置資訊。The scan control unit 51 is connected to the mechanical control device 77 so that input and output are possible. The scanning control unit 51 controls the scanning position of the ultrasonic probe 20 through the mechanical control device 77 , the X-axis scanner 71 , the Y-axis scanner 72 and the Z-axis scanner 73 , and receives the current position of the ultrasonic probe 20 from the mechanical control device 77 Scan location information.

機械控制裝置77之輸出側與X軸掃描儀71、Y軸掃描儀72及Z軸掃描儀73連接。於機械控制裝置77連接有超音波探頭20之編碼器21之輸出側。機械控制裝置77根據編碼器21之輸出信號,偵測超音波探頭20之掃描位置,藉由X軸掃描儀71、Y軸掃描儀72及Z軸掃描儀73進行控制,以使超音波探頭20成為所指示之掃描位置。機械控制裝置77從掃描控制部51接受超音波探頭20之控制指示,並且響應超音波探頭20之掃描位置資訊。The output side of the mechanical control device 77 is connected to the X-axis scanner 71 , the Y-axis scanner 72 and the Z-axis scanner 73 . The output side of the encoder 21 of the ultrasonic probe 20 is connected to the mechanical control device 77 . The mechanical control device 77 detects the scanning position of the ultrasonic probe 20 according to the output signal of the encoder 21, and controls it through the X-axis scanner 71, the Y-axis scanner 72 and the Z-axis scanner 73, so that the ultrasonic probe 20 Become the indicated scanning position. The mechanical control device 77 receives the control instructions of the ultrasonic probe 20 from the scanning control unit 51 and responds to the scanning position information of the ultrasonic probe 20 .

壓電元件22於壓電膜之兩面分別安裝有電極,由氧化鋅(ZnO)、陶瓷、氟系共聚物等構成。壓電元件22藉由於兩電極間施加電壓而從該壓電膜發送超音波。進而,壓電元件22將該壓電膜接收到之回波(接收波)轉換為於上述兩電極間產生之電壓即接收信號。The piezoelectric element 22 has electrodes mounted on both sides of the piezoelectric film, and is made of zinc oxide (ZnO), ceramics, fluorine-based copolymer, or the like. The piezoelectric element 22 emits ultrasonic waves from the piezoelectric film by applying a voltage between two electrodes. Furthermore, the piezoelectric element 22 converts the echo (reception wave) received by the piezoelectric film into a voltage generated between the two electrodes, that is, a reception signal.

於水槽10內注入有水11,被檢體15以淹沒狀態放置於該水11中。水槽10內之水11係為了使從超音波探頭20(超音波探頭)之下端之開口面放射之超音波向被檢體15之內部高效地傳播而需要之傳播介質即液狀物質。被檢體15例如係包括晶圓、多層構造(或積層構造)等之半導體封裝。Water 11 is poured into the water tank 10, and the subject 15 is placed in the water 11 in a submerged state. The water 11 in the water tank 10 is a liquid substance that is a propagation medium required to efficiently propagate the ultrasonic waves emitted from the opening surface at the lower end of the ultrasonic probe 20 (ultrasonic probe) into the subject 15 . The subject 15 is, for example, a semiconductor package including a wafer, a multilayer structure (or a built-up structure), or the like.

超音波探頭20浸漬於充滿水槽10之水11中,以於被檢體15之上部Z方向上隔開預定之距離對置之方式配置。The ultrasonic probe 20 is immersed in the water 11 that fills the water tank 10 and is arranged to face the upper part of the subject 15 at a predetermined distance in the Z direction.

能夠藉由掃描部70使超音波探頭20於XYZ方向上自如地移動。例如,超音波探頭20一邊向被檢體15照射超音波,一邊以預定之速度從被檢體15之起點(一端點)至終點(另一端點)沿X軸方向進行掃描。當超音波探頭20到達終點時,使探頭於Y軸方向上移動預定量,以預定之速度向相反方向從起點至終點於X軸方向上進行掃描。The ultrasonic probe 20 can be freely moved in the XYZ direction by the scanning unit 70 . For example, the ultrasonic probe 20 irradiates the subject 15 with ultrasonic waves while scanning along the X-axis direction at a predetermined speed from a starting point (one end point) to an end point (the other end point) of the subject 15 . When the ultrasonic probe 20 reaches the end point, the probe is moved in the Y-axis direction by a predetermined amount, and scans in the X-axis direction from the starting point to the end point in the opposite direction at a predetermined speed.

基於該移動動作,超音波探頭20對被檢體15之表面中之預先決定之測定範圍進行掃描,發送超音波,於測定範圍內於預先設定之複數個測定點接收反射回波,能夠將該測定範圍所包含之內部構造之缺陷影像化來進行檢查。Based on this movement, the ultrasonic probe 20 scans a predetermined measurement range on the surface of the subject 15, sends ultrasonic waves, and receives reflected echoes at a plurality of preset measurement points within the measurement range. Defects in the internal structure included in the measurement range are imaged and inspected.

如圖1所示,本實施方式中之反射波之雜訊除去處理之特徵在於,以匹配處理部56中之處理(匹配處理)及平均化處理部57中之處理(平均化處理)這兩個階段進行處理。As shown in FIG. 1 , the noise removal process of the reflected wave in this embodiment is characterized by using two processes (matching processing) in the matching processing unit 56 and processing (averaging processing) in the averaging processing unit 57 . processed in stages.

於圖1之平均化處理部57中,藉由將於複數個照射點得到之反射波相加並除以相加後之照射點之數量之相加平均之方法(詳細後述)來除去雜訊(雜訊除去步驟)。雜訊於各個反射波中於時間上不相關地隨機產生,但界面回波於同一時間取得。因此,若將該等反射波相加,則界面回波成為n倍(n係相加後之照射點之數量),利用雜訊變小之情況。並且,藉由將該等結果平均化,界面回波變得清晰。In the averaging processing unit 57 of FIG. 1 , noise is removed by an additive averaging method (described in detail later) that adds the reflected waves obtained from a plurality of irradiation points and divides them by the number of irradiation points after addition. (Noise removal step). Noise is generated randomly and uncorrelated in time in each reflected wave, but the interface echo is acquired at the same time. Therefore, if these reflected waves are added together, the interface echo becomes n times (n is the number of irradiation points after addition), taking advantage of the fact that the noise becomes smaller. And, by averaging the results, the interface echo becomes clear.

圖3係照射點配置圖,係表示第1照射點及第2照射點之配置之圖。於圖3中,用●表示求出像素化資訊之照射點(像素化照射點)作為第1照射點,用○表示除此以外之照射點(非像素化照射點)作為第2照射點。於本實施方式中,藉由平均化處理,如以下般進行相加及平均化處理。FIG. 3 is an irradiation point arrangement diagram, showing the arrangement of the first irradiation point and the second irradiation point. In FIG. 3 , the irradiation point for which the pixelation information is obtained (pixelated irradiation point) is represented by ● as the first irradiation point, and ○ represents the other irradiation points (non-pixelated irradiation point) as the second irradiation point. In this embodiment, by averaging processing, addition and averaging processing are performed as follows.

控制部50從與第1照射點相鄰之照射點中選擇一個以上來設定於平均化處理中使用之第2照射點。使用相鄰之照射點來得到清晰化之效果係因為相加之反射波彼此具有類似之性質。即,於超音波影像裝置100中,於多數情形時,掃描儀之掃描間距被設定為較超音波之焦點尺寸小。其結果,由1個間距之差異引起之取得反射波之差異極小。若相加之反射波彼此之性質類似,則不會因相加而相互抵消。另一方面,於時間上隨機雜訊藉由相加而變小,因此可獲得清晰化之效果。於實施方式中,於圖3中將P0設為第1照射點之情形時,從P1至P8中選擇一個以上之用於平均化處理之第2照射點。另外,選擇之個數越多則越能夠得到清晰之像素化資訊,但由於處理時間亦變長,故考慮整體之處理時間而設定。The control unit 50 selects one or more irradiation points adjacent to the first irradiation point and sets the second irradiation point used in the averaging process. The effect of sharpening is obtained by using adjacent illumination points because the summed reflected waves have similar properties to each other. That is, in the ultrasonic imaging device 100, in most cases, the scanning pitch of the scanner is set to be smaller than the focus size of the ultrasonic wave. As a result, the difference in acquired reflected waves caused by a difference of one pitch is extremely small. If the added reflected waves have similar properties to each other, they will not cancel each other out due to the addition. On the other hand, random noise becomes smaller by adding up in time, so a sharpening effect can be obtained. In the embodiment, when P0 is set as the first irradiation point in FIG. 3 , one or more second irradiation points for averaging processing are selected from P1 to P8. In addition, the greater the number of selections, the clearer the pixelated information can be obtained, but since the processing time also becomes longer, the setting is made taking into account the overall processing time.

圖4係表示平均化處理(雜訊除去處理)之例子之圖。例如,基於與第1照射點(P0)相鄰之8個第2照射點(P1至P8)之平均化處理如以下般進行。將P0及P1至P8中之反射波作為時間軸之值(以取得反射波之時刻為基準之時刻)及信號強度之時間序列資料(時刻、信號強度)儲存於儲存部58(參照圖1)。將同一時刻之P0之時間序列資料之信號強度與從P1到P8之時間序列資料之信號強度相加,除以將該值相加後之照射點之數量(第1照射點之數量與第2照射點之數量之和)即9來進行平均化。對該時間序列資料內之所有時刻之信號強度實施該處理,除去雜訊而使第1照射點之反射波之界面回波清晰化,得到信號強度。FIG. 4 is a diagram showing an example of averaging processing (noise removal processing). For example, the averaging process based on eight second irradiation points (P1 to P8) adjacent to the first irradiation point (P0) is performed as follows. The reflected waves in P0 and P1 to P8 are stored in the storage unit 58 as the time axis value (the time based on the time when the reflected wave is obtained) and the time series data of the signal intensity (time, signal intensity) (see FIG. 1 ) . Add the signal strength of the time series data of P0 and the signal strength of the time series data from P1 to P8 at the same time, and divide it by the number of irradiation points after adding this value (the number of the first irradiation point is the same as the number of the second irradiation point). The sum of the number of irradiation points) is 9 for averaging. This processing is performed on the signal intensity at all moments in the time series data to remove noise and clarify the interface echo of the reflected wave at the first irradiation point, thereby obtaining the signal intensity.

以上對本實施方式中之平均化處理進行了敍述,但於實際之處理中,考慮時間要素。即,需要應對時間軸方向之波動即抖動之影響。於向對象物照射超音波而取得之反射波中,於波形之時間軸方向上產生微小之變動。即,該等時間軸之微小變動係各自之反射波固有,故於以來自像素化照射點之反射波為基準之情形時,於平均化處理中使用之來自非像素化照射點之反射波產生相位之偏移。若於產生了相位之偏移之狀態下進行平均化處理,則產生應生成像素化資訊之界面回波之波形未被很好地相加之現象。The averaging process in this embodiment has been described above, but in actual processing, the time element is taken into consideration. That is, it is necessary to deal with the influence of fluctuations in the direction of the time axis, that is, jitter. In the reflected wave obtained by irradiating the object with ultrasonic waves, slight changes occur in the time axis direction of the waveform. That is, these small changes in the time axis are inherent to each reflected wave. Therefore, when the reflected wave from the pixelated irradiation point is used as the basis, the reflection wave from the non-pixelated irradiation point used in the averaging process is generated. Phase shift. If the averaging process is performed in a state where a phase shift occurs, the waveforms of the interface echoes that should generate pixelated information will not be properly added.

圖5係表示匹配處理之例子之圖。波形資料32係實施匹配處理前之波形,波形資料33係實施匹配處理後之波形。於本實施方式中,藉由圖5所示之匹配處理來應對。將來自像素化照射點之反射波作為模板信號,使來自非像素化照射點之反射波之相位與該模板信號一致。具體而言,以使來自作為平均化處理之對象之非像素化照射點之反射波中之來自對象接合界面之界面回波之峰部與模板信號中之來自對象接合界面之界面回波之峰部一致之方式調整時間軸之位置,消除相位之偏移。FIG. 5 is a diagram showing an example of matching processing. The waveform data 32 is the waveform before the matching process is performed, and the waveform data 33 is the waveform after the matching process is performed. In this embodiment, the matching process shown in FIG. 5 is used. The reflected wave from the pixelated illumination point is used as the template signal, so that the phase of the reflected wave from the non-pixelated illumination point is consistent with the template signal. Specifically, the peak of the interface echo from the object joint interface in the reflected wave from the non-pixelated irradiation point that is the object of the averaging process and the peak of the interface echo from the object joint interface in the template signal are Adjust the position of the time axis in a consistent manner to eliminate phase deviation.

然而,於該方法中,雖然能夠應對來自對象接合界面之界面回波之信號強度足夠大之情況,但於該信號強度小之情形時,難以提取作為對象之界面回波。因此,於該情形時,使用於反射波中最初能夠提取之表面回波。即,以使來自作為平均化處理之對象之非像素化照射點之反射波中之表面回波之峰部與平均信號之表面回波之峰部一致之方式調整時間軸之位置,消除相位之偏移。However, this method can cope with the situation where the signal strength of the interface echo from the object joint interface is large enough, but when the signal strength is small, it is difficult to extract the interface echo as the object. Therefore, in this case, the surface echo that can be extracted first among the reflected waves is used. That is, the position of the time axis is adjusted so that the peak of the surface echo in the reflected wave from the non-pixelized irradiation point that is the object of the averaging process coincides with the peak of the surface echo of the average signal, and the phase difference is eliminated. offset.

另外,於匹配處理中,根據該界面回波之信號強度是否為預先設定之閾值以上來決定是使用來自對象接合界面之界面回波還是使用表面回波。於該界面回波之信號強度為預先設定之閾值以上之情形時,使用界面回波進行匹配處理,於該界面回波之信號強度小於預先設定之閾值之情形時,使用表面回波進行匹配處理。該閾值藉由實驗設定適當之值。此外,如圖1所示,匹配處理作為平均化處理之預處理來進行。In addition, in the matching process, whether to use the interface echo from the object joint interface or the surface echo is determined based on whether the signal strength of the interface echo is above a preset threshold. When the signal strength of the interface echo is above the preset threshold, the interface echo is used for matching processing. When the signal strength of the interface echo is less than the preset threshold, the surface echo is used for matching processing. . The threshold is set to an appropriate value through experimentation. In addition, as shown in FIG. 1 , the matching process is performed as a preprocessing of the averaging process.

圖6係表示反射波之雜訊除去處理之流程圖。首先,控制部50決定第2照射點之個數及位置,選定第2照射點(處理S51)。控制部50判定全部之第1照射點之處理是否結束(處理S52),於全部之第1照射點之處理未結束之情形時(處理S52,否),前進至處理S53,於全部之第1照射點之處理結束之情形時(處理S52,是),前進至處理S57。FIG. 6 is a flowchart showing the noise removal processing of reflected waves. First, the control unit 50 determines the number and position of the second irradiation points, and selects the second irradiation point (process S51). The control unit 50 determines whether the processing of all the first irradiation points has been completed (processing S52). If the processing of all the first irradiation points has not been completed (processing S52, No), the control unit 50 proceeds to processing S53. When the processing of the irradiation point is completed (Yes in processing S52), the process proceeds to processing S57.

控制部50使探頭對準照射之位置,對對象物進行超音波收發(處理S53),將反射波作為時間序列資料儲存於儲存部58(處理S54)。然後,控制部50對第1反射波及第2反射波進行匹配處理(處理S55),之後,進行平均化處理(處理S56),返回到處理S52。The control unit 50 aligns the probe with the irradiation position, transmits and receives ultrasonic waves to the object (process S53), and stores the reflected waves as time series data in the storage unit 58 (process S54). Then, the control unit 50 performs matching processing on the first reflected wave and the second reflected wave (processing S55), and then performs averaging processing (processing S56), and returns to processing S52.

於處理S57中,進行全部之第1照射點之圖像生成處理。具體而言,藉由將清晰化之界面回波之信號強度轉換為正整數值來生成像素化資訊。對對象物之檢查範圍之整個區域反覆實施該等處理,將接合界面圖像化。In process S57, the image generation process of all the first irradiation points is performed. Specifically, pixelation information is generated by converting the signal strength of the sharpened interface echo into a positive integer value. These processes are repeatedly performed on the entire inspection range of the target object to visualize the joint interface.

於處理S54中,向對象物照射超音波,於全部之第2照射點位於第1照射點之前側之情形時,於對第1照射點之超音波之收發處理結束之時點,對第2照射點實施匹配處理,繼而實施平均化處理。In process S54, when the object is irradiated with ultrasonic waves and all the second irradiation points are located in front of the first irradiation point, when the ultrasonic transmission and reception processing for the first irradiation point is completed, the second irradiation point is Click to perform matching processing, and then perform averaging processing.

另外,於第2照射點亦位於第1照射點之後之情形時,於針對關聯之全部第2照射點之超音波之收發處理結束之時點實施匹配處理及平均化處理。In addition, when the second irradiation point is also located after the first irradiation point, matching processing and averaging processing are performed at the time when the ultrasonic transmission and reception processing for all related second irradiation points is completed.

圖7係表示平均化處理後之波形資料31A之圖。圖7表示對圖2所記載之波形資料31實施了匹配處理、平均化處理之結果。來源於樣品(來源於被檢體15)之表面回波、界面回波之信號即使實施平均化處理亦不會消失。另一方面,不來源於樣品之於時間上隨機產生之雜訊成分被平均化,其強度降低。FIG. 7 is a diagram showing waveform data 31A after averaging processing. FIG. 7 shows the result of performing matching processing and averaging processing on the waveform data 31 shown in FIG. 2 . The signals of surface echo and interface echo originating from the sample (from the subject 15) will not disappear even if average processing is performed. On the other hand, noise components that do not originate from the sample and are randomly generated in time are averaged and their intensity is reduced.

圖8係表示平均化處理前之圖像之圖。圖9係表示平均化處理後之圖像之圖。於未實施圖8所示之匹配處理、平均化處理而生成之圖像中,於視野內缺陷被影像化,但由於相對於缺陷部分之亮度值,周圍之雜訊位準高,因此視覺辨認性、對比度變低。FIG. 8 is a diagram showing an image before averaging processing. FIG. 9 is a diagram showing an image after averaging processing. In the image generated without performing the matching processing and averaging processing shown in Figure 8, the defect is imaged in the field of view, but the surrounding noise level is high relative to the brightness value of the defective part, so it is visually recognized The performance and contrast become lower.

與此相對,於實施圖9所示之匹配處理、平均化處理而生成之圖像中,缺陷之信號不會消失,周圍之雜訊位準降低,因此能夠得到更高之視覺辨認性、對比度。In contrast, in the image generated by performing the matching process and averaging process shown in Figure 9, the signal of the defect does not disappear and the surrounding noise level is reduced, so higher visibility and contrast can be obtained. .

以上,本實施方式之超音波影像裝置100具有以下特徵。 (1)一種超音波影像裝置100,其特徵在於:對積層多層而成之對象物照射超音波來取得對象物之接合界面之反射波,並基於反射波之信號強度來生成接合界面之圖像,且具有:匹配處理部56,其對來自對象物中之第2照射點(例如,P1至P8)之第2反射波相對於來自對象物中之第1照射點(例如,P0)之第1反射波之相位之偏移進行校正;及像素化資訊生成處理部(例如,平均化處理部57),其基於第1反射波及相位校正後之上述第2反射波從第1反射波除去雜訊,並基於除去雜訊後之第1反射波中之表示來自接合界面之波形之界面回波之信號強度,生成返回了接合界面中之界面回波之部位之像素化資訊。由此,於超音波影像裝置中,利用除去雜訊後之波形生成像素化資訊,藉此能夠生成積層多層而成之對象物之接合界面之高精度之圖像資訊。 As mentioned above, the ultrasonic imaging device 100 of this embodiment has the following characteristics. (1) An ultrasonic imaging device 100, characterized by: irradiating ultrasonic waves to a multi-layered object to obtain reflected waves at the joint interface of the object, and generating an image of the joint interface based on the signal strength of the reflected waves. , and has a matching processing unit 56 that compares the second reflected wave from the second irradiation point (for example, P1 to P8) in the object with respect to the second reflected wave from the first irradiation point (for example, P0) in the object. Correcting the phase shift of the first reflected wave; and a pixelated information generation processing unit (for example, the averaging processing unit 57), which removes noise from the first reflected wave based on the first reflected wave and the phase-corrected second reflected wave. The signal is generated, and based on the signal strength of the interface echo representing the waveform from the bonding interface in the first reflected wave after removing the noise, pixelated information that returns the location of the interface echo in the bonding interface is generated. In this way, in an ultrasonic imaging device, the waveform after removing noise is used to generate pixelated information, thereby generating high-precision image information of the joint interface of the object formed by stacking multiple layers.

(2)於(1)中,匹配處理部56於第1反射波之界面回波之信號強度具有表示預定值之閾值以上之大小時,進行使第2反射波之界面回波之峰部之相位與第1反射波之界面回波之峰部之相位一致之處理,於第1反射波之界面回波之信號強度不具有閾值以上之大小時,進行使第2反射波之表面回波之峰部之相位與第1反射波之表面回波之峰部之相位一致之處理即可。(2) In (1), when the signal intensity of the interface echo of the first reflected wave is greater than or equal to a threshold value indicating a predetermined value, the matching processing unit 56 performs a peak portion of the interface echo of the second reflected wave. Processing in which the phase is consistent with the phase of the peak of the interface echo of the first reflected wave is performed to make the surface echo of the second reflected wave occur when the signal intensity of the interface echo of the first reflected wave does not exceed the threshold. The phase of the peak part is consistent with the phase of the peak part of the surface echo of the first reflected wave.

(3)於(2)中,像素化資訊生成處理部對第1反射波及實施與第1反射波之相位校正後之第2反射波進行加法平均。(3) In (2), the pixelation information generation processing unit performs an additive average on the first reflected wave and the second reflected wave after phase correction with the first reflected wave.

(4)於(1)中,匹配處理部56從與第1照射點相鄰之照射點中選擇一個以上預先決定之位置之照射點來設定第2照射點(例如,處理S51,參照圖3)。(4) In (1), the matching processing unit 56 selects one or more irradiation points at predetermined positions from the irradiation points adjacent to the first irradiation point to set the second irradiation point (for example, process S51, see FIG. 3 ).

(5)一種反射波之雜訊除去方法,其特徵在於係超音波影像裝置100中之反射波之雜訊除去方法,對積層多層而成之對象物照射超音波來取得對象物之接合界面之反射波,並基於反射波之信號強度來生成接合界面之圖像,該反射波之雜訊除去方法具有:相位校正步驟(例如,處理S55,參照圖5),其係藉由對來自對象物中之第1照射點之第1反射波及來自對象物中之第2照射點之第2反射波進行匹配處理來校正第2反射波相對於第1反射波之相位之偏移;及雜訊除去步驟(例如,處理S56,參照圖4),其係基於第1反射波及藉由相位校正步驟進行相位校正後之第2反射波從第1反射波除去雜訊。(5) A method for removing noise from reflected waves, which is characterized in that it is a method for removing noise from reflected waves in the ultrasonic imaging device 100, which irradiates an object formed by laminating multiple layers with ultrasonic waves to obtain the joint interface of the object. The reflected wave is used to generate an image of the joint interface based on the signal strength of the reflected wave. The noise removal method of the reflected wave includes: a phase correction step (for example, processing S55, refer to Figure 5), which is performed by The first reflected wave from the first irradiation point in the object and the second reflected wave from the second irradiation point in the object are matched to correct the phase shift of the second reflected wave relative to the first reflected wave; and noise removal Step (for example, process S56, see FIG. 4), which removes noise from the first reflected wave based on the first reflected wave and the second reflected wave that is phase-corrected through the phase correction step.

此外,本發明並不限定於上述實施方式,包括各種變形例。另外,上述實施方式係為了容易理解地說明本發明而詳細說明之實施方式,並不限定於必須具備所說明之全部構成。另外,關於各實施例之構成之一部分,能夠進行其他構成之追加、刪除、置換。In addition, the present invention is not limited to the above-described embodiment, and includes various modifications. In addition, the above-mentioned embodiment is described in detail in order to explain the present invention easily, and is not necessarily limited to having all the described configurations. In addition, regarding part of the components of each embodiment, addition, deletion, and replacement of other components can be performed.

10:水槽 11:水 15:被檢體(對象物) 20:超音波探頭 21:編碼器 22:壓電元件 31,31A,32,33:波形資料 50:控制部 51:掃描控制部 52:收發控制部 53:圖像生成部 56:匹配處理部 57:平均化處理部(像素化資訊生成處理部) 58:儲存部 60:收發部 70:掃描部(機械部) 71:X軸掃描儀 72:Y軸掃描儀 73:Z軸掃描儀 77:機械控制裝置 100:超音波影像裝置 P0:第1照射點 P1~P8:第2照射點 10:sink 11:water 15: Subject (object) 20: Ultrasonic probe 21:Encoder 22: Piezoelectric element 31,31A,32,33: Waveform data 50:Control Department 51:Scan control department 52: Transceiver control department 53:Image generation department 56: Matching processing department 57: Averaging processing unit (pixelation information generation processing unit) 58:Storage Department 60:Sending and receiving department 70: Scanning Department (Mechanical Department) 71:X-axis scanner 72:Y-axis scanner 73:Z-axis scanner 77: Mechanical control device 100: Ultrasound imaging device P0: The first irradiation point P1~P8: The second irradiation point

圖1係表示本實施方式之超音波影像裝置之構成之圖。 圖2係表示作為反射波之界面回波及雜訊之圖。 圖3係照射點配置圖,係表示第1照射點與第2照射點之配置之圖。 圖4係表示平均化處理之例子之圖。 圖5係表示匹配處理之例子之圖。 圖6係表示反射波之雜訊除去處理之流程圖。 圖7係表示平均化處理後之波形資料之圖。 圖8係表示平均化處理前之圖像之圖。 圖9係表示平均化處理後之圖像之圖。 FIG. 1 is a diagram showing the structure of the ultrasonic imaging device according to this embodiment. Figure 2 is a diagram showing interface echo and noise as reflected waves. FIG. 3 is an irradiation point arrangement diagram, showing the arrangement of the first irradiation point and the second irradiation point. FIG. 4 is a diagram showing an example of averaging processing. FIG. 5 is a diagram showing an example of matching processing. FIG. 6 is a flowchart showing the noise removal processing of reflected waves. Figure 7 is a diagram showing waveform data after averaging processing. FIG. 8 is a diagram showing an image before averaging processing. FIG. 9 is a diagram showing an image after averaging processing.

10:水槽 10:sink

11:水 11:water

15:被檢體(對象物) 15: Subject (object)

20:超音波探頭 20: Ultrasonic probe

21:編碼器 21:Encoder

22:壓電元件 22: Piezoelectric element

50:控制部 50:Control Department

51:掃描控制部 51:Scan control department

52:收發控制部 52: Transceiver control department

53:圖像生成部 53:Image generation department

56:匹配處理部 56: Matching processing department

57:平均化處理部(像素化資訊生成處理部) 57: Averaging processing unit (pixelation information generation processing unit)

58:儲存部 58:Storage Department

60:收發部 60:Sending and receiving department

70:掃描部(機械部) 70: Scanning Department (Mechanical Department)

71:X軸掃描儀 71:X-axis scanner

72:Y軸掃描儀 72:Y-axis scanner

73:Z軸掃描儀 73:Z-axis scanner

77:機械控制裝置 77: Mechanical control device

100:超音波影像裝置 100: Ultrasound imaging device

Claims (6)

一種超音波影像裝置,其特徵在於:對積層多層而成之對象物照射超音波來取得上述對象物之接合界面之反射波,並基於上述反射波之信號強度來生成上述接合界面之圖像,且具有: 匹配處理部,其對來自上述對象物中之第2照射點之第2反射波相對於來自上述對象物中之第1照射點之第1反射波之相位之偏移進行校正;及 像素化資訊生成處理部,其基於上述第1反射波及相位校正後之上述第2反射波從上述第1反射波除去雜訊,並基於除去雜訊後之上述第1反射波中之表示來自上述接合界面之波形之界面回波之信號強度,生成返回了上述接合界面中之上述界面回波之部位之像素化資訊, 上述匹配處理部係 於上述第1反射波之上述界面回波之信號強度具有表示預定值之閾值以上之大小之情形時,進行使上述第2反射波之上述界面回波之峰部之相位與上述第1反射波之上述界面回波之峰部之相位一致之處理, 於上述第1反射波之上述界面回波之信號強度不具有上述閾值以上之大小之情形時,進行使上述第2反射波之表面回波之峰部之相位與上述第1反射波之上述表面回波之峰部之相位一致之處理。 An ultrasonic imaging device, characterized in that it irradiates an object formed of a plurality of layers with ultrasonic waves to obtain reflected waves at the joint interface of the object, and generates an image of the joint interface based on the signal strength of the reflected wave. and has: a matching processing unit that corrects the phase shift of the second reflected wave from the second irradiation point in the object with respect to the first reflected wave from the first irradiation point in the object; and A pixelated information generation processing unit that removes noise from the first reflected wave based on the first reflected wave and the phase-corrected second reflected wave, and based on the representation in the first reflected wave after removing noise from the above The signal strength of the interface echo in the waveform of the bonding interface generates and returns pixelated information of the location of the interface echo in the bonding interface. The above matching processing department When the signal intensity of the interface echo of the first reflected wave is greater than or equal to a threshold indicating a predetermined value, the phase of the peak portion of the interface echo of the second reflected wave is adjusted to the phase of the first reflected wave. The processing of the phase consistency of the peaks of the above-mentioned interface echo, When the signal intensity of the interface echo of the first reflected wave does not exceed the threshold value, the phase of the peak of the surface echo of the second reflected wave is adjusted to the phase of the surface echo of the first reflected wave. The processing of the phase consistency of the peak part of the echo. 如請求項1之超音波影像裝置,其中 上述像素化資訊生成處理部對上述第1反射波及實施了與上述第1反射波之相位校正後之上述第2反射波進行加法平均。 The ultrasonic imaging device of claim 1, wherein The pixelation information generation processing unit performs an additive average on the first reflected wave and the second reflected wave that has been phase-corrected with the first reflected wave. 如請求項1之超音波影像裝置,其中 上述匹配處理部從與上述第1照射點相鄰之照射點中選擇一個以上確定之位置之照射點來設定上述第2照射點。 The ultrasonic imaging device of claim 1, wherein The matching processing unit selects one or more irradiation points at a certain position from the irradiation points adjacent to the first irradiation point to set the second irradiation point. 一種反射波之雜訊除去方法,其特徵在於:係超音波影像裝置中之反射波之雜訊除去方法,對積層多層而成之對象物照射超音波來取得上述對象物之接合界面之反射波,並基於上述反射波之信號強度來生成上述接合界面之圖像, 上述反射波之雜訊除去方法具有: 相位校正步驟,其係藉由對來自上述對象物中之第1照射點之第1反射波及來自上述對象物中之第2照射點之第2反射波進行匹配處理,來校正上述第2反射波相對於上述第1反射波之相位之偏移;及 雜訊除去步驟,其係基於上述第1反射波及藉由上述相位校正步驟進行相位校正後之上述第2反射波,從上述第1反射波除去雜訊, 於上述第1反射波之表示來自接合界面之波形之界面回波之信號強度具有表示預定值之閾值以上之大小之情形時,於上述匹配處理中,進行使上述第2反射波之上述界面回波之峰部之相位與上述第1反射波之上述界面回波之峰部之相位一致之處理, 於上述第1反射波之上述界面回波之信號強度不具有上述閾值以上之大小之情形時,於上述匹配處理中,進行使上述第2反射波之表面回波之峰部之相位與上述第1反射波之上述表面回波之峰部之相位一致之處理。 A method for removing noise from reflected waves, which is characterized in that: it is a method for removing noise from reflected waves in an ultrasonic imaging device. A multi-layered object is irradiated with ultrasonic waves to obtain reflected waves at the joint interface of the objects. , and generate the image of the above-mentioned joint interface based on the signal intensity of the above-mentioned reflected wave, The above-mentioned noise removal methods for reflected waves include: The phase correction step is to correct the above-mentioned second reflected wave by performing matching processing on the first reflected wave from the first irradiation point in the above-mentioned object and the second reflected wave from the second irradiation point in the above-mentioned object. The shift relative to the phase of the first reflected wave; and a noise removal step that removes noise from the first reflected wave based on the first reflected wave and the second reflected wave that has been phase-corrected by the phase correction step, When the signal intensity of the interface echo representing the waveform from the bonding interface of the first reflected wave is greater than or equal to a threshold value representing a predetermined value, in the matching process, the interface echo of the second reflected wave is performed. The phase of the peak of the wave is consistent with the phase of the peak of the interface echo of the first reflected wave, When the signal strength of the interface echo of the first reflected wave does not have a magnitude greater than or equal to the threshold, in the matching process, the phase of the peak of the surface echo of the second reflected wave is matched with the phase of the surface echo of the second reflected wave. 1. The process of making the peak of the above-mentioned surface echo of the reflected wave consistent in phase. 如請求項4之反射波之雜訊除去方法,其中 於上述雜訊除去步驟中,對上述第1反射波及藉由上述匹配處理實施了與上述第1反射波之相位校正後之上述第2反射波進行加法平均。 For example, the method for removing noise from reflected waves in claim 4, wherein In the above-mentioned noise removal step, the above-mentioned first reflected wave and the above-mentioned second reflected wave after performing phase correction with the above-mentioned first reflected wave through the above-mentioned matching process are added and averaged. 如請求項4之反射波之雜訊除去方法,其中 於上述匹配處理中,從與上述第1照射點相鄰之照射點中選擇一個以上預先確定之位置之照射點來設定上述第2照射點。 For example, the method for removing noise from reflected waves in claim 4, wherein In the above-mentioned matching process, one or more irradiation points at predetermined positions are selected from irradiation points adjacent to the above-mentioned first irradiation point to set the above-mentioned second irradiation point.
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