TW202402460A - Grinding method for workpiece including a rough grinding step, a fine grinding step, and a grinding correction step - Google Patents

Grinding method for workpiece including a rough grinding step, a fine grinding step, and a grinding correction step Download PDF

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TW202402460A
TW202402460A TW112125304A TW112125304A TW202402460A TW 202402460 A TW202402460 A TW 202402460A TW 112125304 A TW112125304 A TW 112125304A TW 112125304 A TW112125304 A TW 112125304A TW 202402460 A TW202402460 A TW 202402460A
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grinding
workpiece
thickness
rough
grindstone
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TW112125304A
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Chinese (zh)
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万波秀年
中野恵助
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日商迪思科股份有限公司
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Abstract

The present invention provides a workpiece grinding method that can unify a grinding time period into a fixed and short time period. A grinding method for deep-feed grinding of the workpiece with a slow speed includes: a rough grinding step, a fine grinding step, and a grinding correction step. The rough grinding step includes positioning a lower surface of a first grinding stone at a first distance lower than an upper surface of the workpiece and causing a first disk table to move horizontally relative to the first grinding stone, thereby grinding the upper surface of the workpiece. The fine grinding step includes positioning a lower surface of a second grinding stone at a second distance lower than the upper surface of the workpiece and causing a second disk table to move horizontally relative to the second grinding stone, thereby grinding the upper surface of the workpiece. The grinding correction step includes grinding the thickness of the workpiece to a predetermined thickness before the fine grinding step begins.

Description

被加工物的研削方法Grinding method of workpiece

本發明係關於一種將被加工物深進緩給研削成預定厚度之研削方法。The invention relates to a grinding method for grinding a workpiece into a predetermined thickness with deep feed.

作為將被使用於各種電子設備之元件進行積體化並小型化之封裝技術,已知有一種技術,其將形成有元件之晶片配置於基板上,在晶片上形成Cu電極,並以樹脂密封晶片與Cu電極而保護元件免受衝擊、濕氣等之後,研削樹脂而使Cu電極露出,再進一步研削樹脂而得到所預期的厚度的被加工物。As a packaging technology for integrating and miniaturizing components used in various electronic devices, there is a known technology in which a wafer on which components are formed is placed on a substrate, a Cu electrode is formed on the wafer, and the wafer is sealed with resin. After the wafer and the Cu electrode are connected to protect the element from impact, moisture, etc., the resin is ground to expose the Cu electrode, and the resin is further ground to obtain a workpiece of the desired thickness.

然後,在將具備Cu電極之被加工物研削成預定厚度之研削方法中,存在下述方法:在藉由卡盤台而吸引保持被加工物並將旋轉之環狀的磨石的下表面配置於從被加工物的上表面起僅下降預定距離之位置之狀態下,使被加工物與磨石相對地水平移動而將被加工物的上表面進行深進緩給研削(例如,參照專利文獻1、2)。Then, as a grinding method for grinding a workpiece equipped with a Cu electrode to a predetermined thickness, there is a method in which a ring-shaped grinding stone is placed on the lower surface of a rotating grindstone that attracts and holds the workpiece with a chuck table. In a state where the workpiece is lowered only a predetermined distance from the upper surface of the workpiece, the workpiece and the grindstone are relatively moved horizontally to perform deep creep grinding of the upper surface of the workpiece (for example, refer to patent documents 1, 2).

在上述深進緩給研削中,使磨石僅下降例如100μm,並藉由使該磨石與被加工物相對地水平移動而進行粗研削,直至Cu電極即將露出為止,所述粗研削係將研削被加工物的正面之動作僅重複預先設定之次數。然後,在此粗研削之後,使磨石僅下降例如10μm,並藉由使該磨石與被加工物相對地水平移動而進行精研削,所述精研削係重複研削被加工物的正面之動作直至被加工物的厚度成為預先設定之厚度為止。In the above-mentioned deep feed grinding, the grindstone is lowered by only 100 μm, for example, and the grindstone is horizontally moved relative to the workpiece to perform rough grinding until the Cu electrode is about to be exposed. The rough grinding is The action of grinding the front side of the workpiece is only repeated a preset number of times. Then, after the rough grinding, the grindstone is lowered by only 10 μm, for example, and the grindstone is horizontally moved relative to the workpiece to perform finish grinding. The finish grinding is an action of repeatedly grinding the front surface of the workpiece. Until the thickness of the workpiece reaches the preset thickness.

亦即,在粗研削中,將每次研削被加工物的上表面例如100μm之動作僅重複預先設定之次數,在精研削中,重複每次研削被加工物例如10μm之動作直至被加工物的厚度成為預先設定之厚度為止,重複研削該被加工物的上表面之動作。 [習知技術文獻] [專利文獻] That is, in rough grinding, the action of grinding the upper surface of the workpiece, for example, 100 μm, is repeated only a preset number of times. In fine grinding, the action of grinding the upper surface of the workpiece, for example, 10 μm, is repeated each time until the workpiece is The operation of grinding the upper surface of the workpiece is repeated until the thickness reaches the preset thickness. [Known technical documents] [Patent Document]

[專利文獻1]日本特開2019-084646號公報 [專利文獻2]日本特開2020-171977號公報 [Patent Document 1] Japanese Patent Application Publication No. 2019-084646 [Patent Document 2] Japanese Patent Application Publication No. 2020-171977

[發明所欲解決的課題] 在現行的被加工物的深進緩給研削中,因被加工物的粗研削僅進行預先設定之次數,故經粗研削之被加工物的厚度並非固定,後續的精研削所需要之時間會依據經粗研削之被加工物的厚度而變化。亦即,因精研削每次研削被加工物的上表面例如10μm,故有若粗研削後的被加工物的厚度較厚,則精研削所需要之時間變長而對下個步驟造成影響之問題。 [Problem to be solved by the invention] In the current deep-feed grinding of the workpiece, since the rough grinding of the workpiece is only performed a preset number of times, the thickness of the rough-ground workpiece is not fixed, and the time required for subsequent fine grinding will vary. It varies according to the thickness of the workpiece after rough grinding. That is, since the upper surface of the workpiece is ground by, for example, 10 μm each time in fine grinding, if the thickness of the workpiece after rough grinding is thicker, the time required for fine grinding may become longer, which may affect the next step. problem.

因此,本發明之目的在於提供一種可將研削時間統一成固定且較短之被加工物的研削方法。Therefore, an object of the present invention is to provide a grinding method that can unify the grinding time into a fixed and short workpiece.

[解決課題的技術手段] 根據本發明,提供一種被加工物的研削方法,其在被保持於卡盤台之被加工物的外側將磨石的下表面定位於比該被加工物的上表面低的位置,使該卡盤台與該磨石相對地水平移動而研削該被加工物的上表面,且具備:粗研削步驟,其將第一磨石的下表面定位於比該被加工物的該上表面低第一距離並使該卡盤台與該第一磨石相對地水平移動,藉此研削該被加工物的該上表面;修正研削步驟,其在實施該粗研削步驟之後,將該被加工物的厚度研削成預定的厚度;以及精研削步驟,其在實施該修正研削步驟之後,將第二磨石的下表面定位於比該被加工物的該上表面低第二距離並使該卡盤台與該第二磨石相對地水平移動,藉此研削被加工物的上表面。 [Technical means to solve the problem] According to the present invention, there is provided a method for grinding a workpiece, in which the lower surface of a grindstone is positioned lower than the upper surface of the workpiece on the outside of the workpiece held on a chuck table, so that the chuck The disc table moves horizontally relative to the grindstone to grind the upper surface of the workpiece, and is provided with: a rough grinding step that positions the lower surface of the first grindstone a first lower surface than the upper surface of the workpiece. distance and make the chuck table move horizontally relative to the first grinding stone, thereby grinding the upper surface of the workpiece; the correction grinding step is to change the thickness of the workpiece after performing the rough grinding step Grinding to a predetermined thickness; and a fine grinding step, which after implementing the corrective grinding step, positions the lower surface of the second grinding stone at a second distance lower than the upper surface of the workpiece and makes the chuck table and The second grindstone moves relatively horizontally to grind the upper surface of the workpiece.

[發明功效] 若根據本發明,因將在粗研削步驟中經粗研削之被加工物以其厚度成為預先設定之預定的厚度之方式在下個修正研削步驟中進行修正研削,故針對全部的被加工物,被精研削之前的被加工物的厚度成為預先設定之厚度並成為固定。因此,在下個精研削步驟中之被加工物的精研削所需要之時間被統一成固定且較短,而得到可在固定的短時間將全部的被加工物研削成預定的厚度之效果。 [Invention effect] According to the present invention, since the workpiece that has been roughly ground in the rough grinding step is corrected and ground in the next corrective grinding step so that its thickness becomes a preset predetermined thickness, all the workpieces are processed. The thickness of the workpiece before fine grinding becomes a preset thickness and becomes fixed. Therefore, the time required for fine grinding of the workpiece in the next fine grinding step is unified to a fixed and short time, and an effect is obtained that the entire workpiece can be ground to a predetermined thickness in a fixed short time.

以下根據圖式,說明本發明的實施方式。Hereinafter, embodiments of the present invention will be described based on the drawings.

首先,根據圖1及圖2而說明用於實施本發明之被加工物(工件)的研削方法的研削裝置的構成。此外,在以下的說明中,將圖1所示之箭頭方向分別作為X軸方向(左右方向)、Y軸方向(前後方向)、Z軸方向(上下方向)。First, the structure of a grinding device for implementing the grinding method of a workpiece (workpiece) according to the present invention will be described based on FIGS. 1 and 2 . In addition, in the following description, the arrow directions shown in FIG. 1 are respectively referred to as the X-axis direction (left-right direction), the Y-axis direction (front-back direction), and the Z-axis direction (up-down direction).

圖1所示之研削裝置1係將矩形板狀的被加工物W(參照圖5及圖6)進行深進緩給研削之裝置,且具備下述要素作為主要的構成要素:第一加工單元U1,其將被加工物W進行粗研削;第二加工單元U2,其將已被該第一加工單元U1粗研削之被加工物W進行精研削;第一厚度測量器5,其測量已被第一加工單元U1粗研削之被加工物W的厚度與上表面高度;第二厚度測量器6,其測量已被第二加工單元U2精研削之被加工物W的厚度;暫置部40,其暫時地預先暫置被加工物W;被加工物搬送手段20,其在暫置部40與第一加工單元U1及第二加工單元U2之間搬送被加工物W(參照圖2);清洗手段50,其清洗已被第二加工單元U2精研削之被加工物W;機器人60,其在第一卡匣7與對位台9之間以及清洗手段50與第二卡匣8之間搬送被加工物W;以及控制器70,其控制該研削裝置1的研削動作。The grinding device 1 shown in Figure 1 is a device for deep-feed grinding a rectangular plate-shaped workpiece W (see Figures 5 and 6), and has the following elements as its main components: a first processing unit U1, which performs rough grinding of the workpiece W; the second processing unit U2, which performs fine grinding of the workpiece W that has been roughly ground by the first processing unit U1; and the first thickness measuring device 5, whose measurement has been The thickness and upper surface height of the workpiece W that has been roughly ground by the first processing unit U1; the second thickness measuring device 6, which measures the thickness of the workpiece W that has been finely ground by the second processing unit U2; the temporary holding part 40, It temporarily places the workpiece W in advance; the workpiece conveying means 20 transports the workpiece W between the temporary holding part 40 and the first processing unit U1 and the second processing unit U2 (see FIG. 2 ); cleaning Means 50 for cleaning the workpiece W that has been finely ground by the second processing unit U2; robot 60 for conveying between the first cassette 7 and the alignment table 9 and between the cleaning means 50 and the second cassette 8 The workpiece W; and the controller 70 that controls the grinding operation of the grinding device 1 .

在此,如圖7(a)所示,研削加工前的被加工物W具有PCB等由樹脂所構成之矩形板狀的支撐基板W1與配置於該支撐基板W1上之多個晶片C,並在各晶片C的正面分別形成有未圖示的元件。而且,在各元件的正面分別突出設置有多個Cu電極P,此等晶片C與Cu電極P係被環氧樹脂等樹脂F密封。此外,各晶片C將矽、砷化鎵、藍寶石等作為母材。Here, as shown in FIG. 7( a ), the workpiece W before grinding has a rectangular plate-shaped support substrate W1 made of resin such as a PCB and a plurality of wafers C arranged on the support substrate W1 . Elements (not shown) are formed on the front surface of each wafer C. Furthermore, a plurality of Cu electrodes P are protrudingly provided on the front surface of each element, and these wafers C and Cu electrodes P are sealed with resin F such as epoxy resin. In addition, each wafer C uses silicon, gallium arsenide, sapphire, etc. as a base material.

接著,針對研削裝置1的主要構成要素的構成分別進行說明,所述主要構成要素係第一加工單元U1及第二加工單元U2、第一厚度測量器5及第二厚度測量器6、暫置部40、被加工物搬送手段20、清洗手段50、機器人60及控制器70。Next, the structure of the main components of the grinding device 1 will be described respectively. The main components are the first processing unit U1 and the second processing unit U2, the first thickness measuring device 5 and the second thickness measuring device 6, and the temporary storage unit. part 40, workpiece conveying means 20, cleaning means 50, robot 60 and controller 70.

如圖1所示,將被加工物W進行粗研削之第一加工單元U1與將被加工物W進行精研削之第二加工單元U2係沿著X軸方向(左右方向)並列設置於裝置基座2上,此等第一加工單元U1與第二加工單元U2的基本構成相同,因此以下以第一加工單元U1的構成為主進行說明。As shown in Figure 1, the first processing unit U1 for rough grinding the workpiece W and the second processing unit U2 for fine grinding the workpiece W are arranged side by side on the base of the device along the X-axis direction (left-right direction). On the base 2, the basic structures of the first processing unit U1 and the second processing unit U2 are the same, so the following description will focus on the structure of the first processing unit U1.

第一加工單元U1係包含第一卡盤台3、作為第一加工手段的粗研削手段10以及使第一卡盤台3在Y軸方向往返移動之未圖示的第一移動機構所構成。在此,以下說明構成此第一加工單元U1之第一卡盤台3、粗研削手段10、第一移動機構(未圖示)的構成。The first processing unit U1 is composed of a first chuck table 3, a rough grinding means 10 as a first processing means, and a first moving mechanism (not shown) that reciprocates the first chuck table 3 in the Y-axis direction. Here, the structure of the first chuck table 3, the rough grinding means 10, and the first moving mechanism (not shown) constituting the first processing unit U1 will be described below.

第一卡盤台3係圓板狀的構件,並可藉由未圖示的第一移動機構而沿著Y軸方向往返移動。在此第一卡盤台3的上表面形成有吸引保持被加工物W之圓形的保持面3a。此外,保持面3a係與未圖示的吸引源連接。The first chuck table 3 is a disk-shaped member and can move back and forth along the Y-axis direction by a first moving mechanism (not shown). A circular holding surface 3a for attracting and holding the workpiece W is formed on the upper surface of the first chuck table 3. In addition, the holding surface 3a is connected to an attraction source (not shown).

粗研削手段10具備:主軸馬達12,其固定於保持座11;垂直的主軸13,其被該主軸馬達12旋轉驅動;圓板狀的安裝件14,其安裝於該主軸13的下端;以及研削輪15,其能裝卸地裝設於該安裝件14的下表面。在此,在研削輪15安裝有被排列成圓環狀之多個第一磨石16。The rough grinding means 10 includes: a spindle motor 12 fixed to the holder 11; a vertical spindle 13 that is rotationally driven by the spindle motor 12; a disc-shaped mounting piece 14 mounted on the lower end of the spindle 13; and grinding The wheel 15 is removably mounted on the lower surface of the mounting member 14 . Here, a plurality of first grindstones 16 arranged in an annular shape are attached to the grinding wheel 15 .

然後,粗研削手段10係能升降地被升降機構30支撐,所述升降機構30設置於塊狀的柱體4的-Y軸方向端面(前表面),所述塊狀的柱體4垂直地立設於裝置基座2的+Y軸方向端部(後端部)。Then, the rough grinding means 10 is supported by the lifting mechanism 30 so as to be able to move up and down. The lifting mechanism 30 is provided on the -Y-axis direction end surface (front surface) of the block-shaped cylinder 4, and the block-shaped cylinder 4 is vertically It is erected at the end (rear end) of the device base 2 in the +Y-axis direction.

上述升降機構30係使粗研削手段10沿著Z軸方向(上下方向)升降移動之機構,並具備矩形板狀的升降板31與用於引導該升降板31的升降移動的左右一對導軌32。在此,在升降板31安裝有粗研削手段10。此外,左右一對導軌32係垂直且互相平行地配設於柱體4的-Y軸方向端面(前表面)。The above-mentioned lifting mechanism 30 is a mechanism for lifting and lowering the rough grinding means 10 along the Z-axis direction (up and down direction), and includes a rectangular plate-shaped lifting plate 31 and a pair of left and right guide rails 32 for guiding the lifting movement of the lifting plate 31 . Here, the rough grinding means 10 is attached to the lifting plate 31 . In addition, a pair of left and right guide rails 32 are arranged perpendicularly and parallel to each other on the -Y-axis direction end surface (front surface) of the column 4 .

然後,在左右一對導軌32之間,沿著Z軸方向(上下方向)垂直地配置有能旋轉的滾珠螺桿軸33,該滾珠螺桿軸33的上端係與驅動源亦即能正逆轉的電動馬達34連結。並且,滾珠螺桿軸33的下端係藉由未圖示的軸承而能旋轉地被柱體4支撐,此滾珠螺桿軸33係與朝向後方(+Y軸方向)水平地突出設置於升降板31的背面之未圖示的螺帽構件螺合。Then, between the pair of left and right guide rails 32, a rotatable ball screw shaft 33 is arranged vertically along the Z-axis direction (up and down direction). The upper end of the ball screw shaft 33 is connected to the driving source, that is, an electric motor that can forward and reverse. Motor 34 links. In addition, the lower end of the ball screw shaft 33 is rotatably supported by the column 4 via a bearing (not shown). The ball screw shaft 33 is horizontally protruded toward the rear (+Y-axis direction) on the back of the lift plate 31 . The nut member (not shown) is screwed together.

因此,若啟動如以上般所構成之升降機構30的電動馬達34而使滾珠螺桿軸33正逆轉,則突出設置有與該滾珠螺桿軸33螺合之未圖示的螺帽構件之升降板31會沿著左右一對導軌32升降,因此安裝於該升降板31之粗研削手段10亦沿著Z軸方向(上下方向)升降移動。Therefore, when the electric motor 34 of the lifting mechanism 30 configured as above is activated to cause the ball screw shaft 33 to rotate forward and reverse, the lifting plate 31 protrudes with a nut member (not shown) screwed to the ball screw shaft 33 . It moves up and down along the pair of left and right guide rails 32, so the rough grinding means 10 installed on the lifting plate 31 also moves up and down along the Z-axis direction (up and down direction).

未圖示的第一移動機構係使第一卡盤台3與被保持於此之被加工物W沿著Y軸方向往返移動之機構,並係藉由配置於裝置基座3內之習知的滾珠螺桿機構等所構成。因此,省略針對此第一移動機構的進一步說明與圖式。The first moving mechanism not shown in the figure is a mechanism that reciprocates the first chuck table 3 and the workpiece W held therein along the Y-axis direction, and is configured by a conventional mechanism disposed in the device base 3 It is composed of ball screw mechanism, etc. Therefore, further description and drawings of the first moving mechanism are omitted.

此外,第二加工單元U2雖具備第二卡盤台3’、第二加工手段亦即精研削手段10’及未圖示的第二移動機構,但第二卡盤台3’與第二移動機構的構成係與第一加工單元U1的第一卡盤台3與第一移動機構的構成相同,因此省略針對此等的說明。In addition, although the second processing unit U2 is provided with the second chuck table 3', the second processing means, that is, the finishing means 10', and the second moving mechanism not shown, the second chuck table 3' and the second moving mechanism The structure of the mechanism is the same as the structure of the first chuck table 3 and the first moving mechanism of the first processing unit U1, so the description thereof is omitted.

在此第二加工單元U2的第二卡盤台3’的上表面形成有用於吸引保持被加工物W的圓形的保持面3a’。Here, a circular holding surface 3a' for attracting and holding the workpiece W is formed on the upper surface of the second chuck table 3' of the second processing unit U2.

並且,精研削手段10’係與粗研削手段10同樣地具備:主軸馬達12’,其固定於保持座11’;垂直的主軸13’,其被該主軸馬達12’旋轉驅動;圓板狀的安裝件14’,其安裝於該主軸13’的下端;以及研削輪15’,其能裝卸地裝設於該安裝件14’的下表面。在此,在研削輪15’雖安裝有被排列成圓環狀之多個第二磨石16’,但此等第二磨石16’係藉由比粗研削手段10的第一磨石16更細的磨粒所構成。而且,在第二加工單元U2中亦設有使精研削手段10’之升降機構30。此升降機構30係與使粗研削手段10升降之升降機構30相同,因此針對此標注相同符號並省略再次的說明。Moreover, the fine grinding means 10' is equipped with the same as the rough grinding means 10: a spindle motor 12', which is fixed to the holder 11'; a vertical spindle 13', which is rotationally driven by the spindle motor 12'; a disc-shaped The mounting piece 14' is mounted on the lower end of the spindle 13'; and the grinding wheel 15' is detachably mounted on the lower surface of the mounting piece 14'. Here, although a plurality of second grindstones 16' arranged in an annular shape are installed on the grinding wheel 15', these second grindstones 16' are produced by using a grinding wheel that is more precise than the first grindstone 16 of the rough grinding means 10. Made of fine abrasive grains. Moreover, the second machining unit U2 is also provided with a lifting mechanism 30 for the fine grinding means 10'. This lifting mechanism 30 is the same as the lifting mechanism 30 that lifts and lowers the rough grinding means 10, so the same reference numerals are attached to these parts, and further description is omitted.

第一厚度測量器5兼作為測量被粗研削手段10粗研削之被加工物W的厚度之厚度測量器與測量被加工物W的上表面高度之上表面高度測量器,並係藉由高度規所構成。具體而言,此第一厚度測量器5具備與被保持於第一卡盤台3之被加工物W的上表面接觸之第一接觸子5a以及與第一卡盤台3的外周部上表面接觸之第二接觸子5b,若利用此第一厚度測量器5,則藉由第一接觸子5a而測量被加工物W的上表面高度,且從藉由第一接觸子5a所測量之被加工物W的上表面高度減去藉由第二接觸子5b所測量之第一卡盤台3的外周部上表面高度,藉此求出粗研削中的被加工物W的厚度。The first thickness measuring device 5 serves as both a thickness measuring device for measuring the thickness of the workpiece W rough ground by the rough grinding means 10 and a surface height measuring device for measuring the height of the upper surface of the workpiece W, and is measured by a height gauge. constituted. Specifically, this first thickness measuring instrument 5 includes a first contactor 5a that is in contact with the upper surface of the workpiece W held on the first chuck table 3, and a first contactor 5a that is in contact with the upper surface of the outer peripheral portion of the first chuck table 3. If the first thickness measuring device 5 is used to contact the second contactor 5b, the upper surface height of the workpiece W is measured through the first contactor 5a, and from the height of the workpiece W measured through the first contactor 5a The thickness of the workpiece W during rough grinding is obtained by subtracting the upper surface height of the outer peripheral portion of the first chuck table 3 measured by the second contactor 5b from the upper surface height of the workpiece W.

第二厚度測量器6測量被精研削手段10’精研削之被加工物W的厚度,並與第一厚度測量器5同樣地係藉由高度規所構成。具體而言,此第二厚度測量器6具備與被保持於第二卡盤台3’之被加工物W的上表面接觸之第一接觸子6a以及與第二卡盤台3’的外周部上表面接觸之第二接觸子6b,若利用此第二厚度測量器6,則從藉由第一接觸子6a所測量之被加工物W的上表面高度減去藉由第二接觸子6b所測量之第二卡盤台3’的外周部上表面高度,藉此求出精研削中的被加工物W的厚度。The second thickness measuring device 6 measures the thickness of the workpiece W finely ground by the fine grinding means 10', and is composed of a height gauge like the first thickness measuring device 5. Specifically, this second thickness measuring instrument 6 includes a first contactor 6a that is in contact with the upper surface of the workpiece W held on the second chuck table 3' and an outer peripheral portion of the second chuck table 3'. If the second contactor 6b is in contact with the upper surface and the second thickness measuring device 6 is used, the height measured by the second contactor 6b is subtracted from the height of the upper surface of the workpiece W measured by the first contactor 6a. The thickness of the workpiece W during fine grinding is determined by measuring the height of the upper surface of the outer peripheral portion of the second chuck table 3'.

暫置部40係為了將已被第一加工單元U1的粗研削手段10粗研削之被加工物W交接至第二加工單元U2而暫時地暫置已被粗研削手段10粗研削之被加工物W者,並如圖1所示,在Y軸方向配置於裝置基座2上的第一加工單元U1及第二加工單元U2與第一卡匣7及第二卡匣8之間。The temporary holding unit 40 temporarily holds the workpiece W that has been roughly ground by the rough grinding unit 10 of the first processing unit U1 in order to transfer the workpiece W that has been roughly ground by the rough grinding unit 10 to the second processing unit U2. W, as shown in FIG. 1 , is arranged between the first processing unit U1 and the second processing unit U2 and the first cassette 7 and the second cassette 8 on the device base 2 in the Y-axis direction.

此暫置部40在水平的暫置台41具備暫置工作台43,所述暫置工作台43能沿著沿X軸方向鋪設之導板42而在X軸方向移動,在此暫置工作台43的上表面形成有用於吸引保持被加工物W的圓形的保持面43a。此外,雖未圖示,但在暫置部40設有移動機構,所述移動機構係使暫置工作台43沿著導板42沿X軸方向移動。This temporary unit 40 is provided with a temporary workbench 43 on a horizontal temporary stand 41. The temporary workbench 43 can move in the X-axis direction along the guide plate 42 laid along the X-axis direction. Here, the temporary workbench is A circular holding surface 43a for attracting and holding the workpiece W is formed on the upper surface of the workpiece 43. In addition, although not shown in the figure, the temporary setting part 40 is provided with a moving mechanism that moves the temporary setting table 43 along the guide plate 42 in the X-axis direction.

圖2所示之被加工物搬送手段20分別配置於圖1中以虛線所示之空間S1、S2,且兩者的構成相同。The workpiece conveyance means 20 shown in Fig. 2 are respectively arranged in the spaces S1 and S2 shown by dotted lines in Fig. 1, and both have the same structure.

此被加工物搬送手段20保持被加工物W並將此搬送往預定的位置,並如圖2所示,具備吸引保持被加工物W之矩形板狀的一對搬送墊21。在此,一對搬送墊21係互相平行地安裝於使此等間歇性地旋轉180°之反轉機構22,反轉機構22係安裝於從塊狀的升降塊23b水平地延伸之旋轉軸24的前端。此外,在各搬送墊21的吸附面安裝有多個吸盤25。This workpiece conveying means 20 holds the workpiece W and conveys it to a predetermined position, and is equipped with a pair of rectangular plate-shaped conveyance pads 21 that attract and hold the workpiece W as shown in FIG. 2 . Here, a pair of conveying pads 21 are mounted parallel to each other on a reversing mechanism 22 that intermittently rotates 180°. The reversing mechanism 22 is mounted on a rotating shaft 24 extending horizontally from a block-shaped lifting block 23b. Front end. In addition, a plurality of suction cups 25 are attached to the suction surface of each transfer pad 21 .

然後,搬送墊21能藉由Y軸移動機構20A而在Y軸方向(前後方向)移動,且能藉由Z軸移動機構20B而在Z軸方向升降。在此,Y軸移動機構20A具備:上下一對導軌22a,其等在底板21a的側面沿著Y軸方向互相平行地配置;以及滑件23a,其能沿著此等導軌22a在Y軸方向滑動,在一對導軌22a之間配置有沿著Y軸方向延伸之能旋轉的滾珠螺桿軸24a。Then, the transfer pad 21 can move in the Y-axis direction (front-rear direction) by the Y-axis moving mechanism 20A, and can move up and down in the Z-axis direction by the Z-axis moving mechanism 20B. Here, the Y-axis moving mechanism 20A is provided with: a pair of upper and lower guide rails 22a, which are arranged parallel to each other along the Y-axis direction on the side surface of the bottom plate 21a; and a slider 23a, which can move in the Y-axis direction along these guide rails 22a. A rotatable ball screw shaft 24a extending in the Y-axis direction is disposed between the pair of guide rails 22a.

上述滾珠螺桿軸24a的軸向一端係與驅動源亦即電動馬達25a連接,滾珠螺桿軸24a的軸向另一端係藉由軸承26a而能旋轉地被底板21a支撐。然後,此滾珠螺桿軸24a係與矩形塊狀的滑件23a螺合插通。One axial end of the ball screw shaft 24a is connected to the electric motor 25a which is a driving source, and the other axial end of the ball screw shaft 24a is rotatably supported by the base plate 21a via a bearing 26a. Then, the ball screw shaft 24a is screwed and inserted into the rectangular block-shaped slider 23a.

Z軸移動機構20B具備:導軌22b,其沿著Z軸方向垂直地安裝於底板21b,所述底板21b被安裝於滑件23a的側面;以及升降塊23b,其沿著此導軌22b而在Z軸方向升降移動。然後,在前端透過反轉機構22而支撐第一搬送墊21之前述旋轉軸24係從升降塊23b沿著+X軸方向水平地延伸,並在該升降塊23b螺合插通有垂直地配置之能旋轉的滾珠螺桿軸24b。在此,滾珠螺桿軸24b的上端係與旋轉驅動源亦即電動馬達25b連結,滾珠螺桿軸24b的下端係藉由軸承26b而能旋轉地被底板21b支撐。The Z-axis moving mechanism 20B is provided with: a guide rail 22b that is vertically installed along the Z-axis direction on a base plate 21b that is installed on the side of the slider 23a; and a lifting block 23b that moves along the Z-axis direction along the guide rail 22b. Lifting and lowering movement in the axis direction. Then, the first conveying pad 21 is supported by the reversing mechanism 22 at the front end. The aforementioned rotating shaft 24 extends horizontally from the lifting block 23b along the + Rotatable ball screw shaft 24b. Here, the upper end of the ball screw shaft 24b is connected to the electric motor 25b that is a rotation drive source, and the lower end of the ball screw shaft 24b is rotatably supported by the base plate 21b via a bearing 26b.

因此,若啟動Y軸移動機構20A的電動馬達25a而使滾珠螺桿軸24a正逆轉,則與此滾珠螺桿軸24a螺合之滑件23a會與Z軸移動機構20B一起沿著導軌22a在Y軸方向移動,若啟動Z軸移動機構20B的電動馬達25b而使滾珠螺桿軸24b正逆轉,則與此滾珠螺桿軸24b螺合之升降塊23b會沿著Z軸方向升降移動,因此透過旋轉軸24與反轉機構22而被此升降塊23b支撐之搬送墊21可在Y軸方向移動,且可在Z軸方向升降移動。Therefore, if the electric motor 25a of the Y-axis moving mechanism 20A is started to cause the ball screw shaft 24a to rotate forward and reverse, the slider 23a screwed with the ball screw shaft 24a will move along the guide rail 22a along the Y-axis with the Z-axis moving mechanism 20B. If the electric motor 25b of the Z-axis moving mechanism 20B is started to cause the ball screw shaft 24b to move forward and reverse, the lifting block 23b screwed with the ball screw shaft 24b will move up and down along the Z-axis direction. Therefore, through the rotating shaft 24 The transfer pad 21 supported by the lift block 23b in conjunction with the reversal mechanism 22 can move in the Y-axis direction and can move up and down in the Z-axis direction.

此外,雖未圖示,但在本實施方式之研削裝置1設有研削水供給手段,所述研削水供給手段在研削加工期間將加工液亦即研削水分別供給至粗研削手段10的第一磨石16與精研削手段10’的第二磨石16’。此研削水供給手段將研削水通過粗研削手段10與精研削手段10’的各主軸馬達12、12’與各主軸13、13’的軸中心而分別供給至各研削輪15、15’的第一磨石16與第二磨石16’,並藉由研削水而分別冷卻第一磨石16及第二磨石16’與被加工物W的接觸面。在此,研削水較佳使用純水。In addition, although not shown in the figures, the grinding device 1 of this embodiment is provided with grinding water supply means that supplies the machining fluid, that is, grinding water, to the first portion of the rough grinding means 10 during the grinding process. The grinding stone 16 has a second grinding stone 16' with a fine grinding means 10'. This grinding water supply means supplies the grinding water to the grinding wheels 15 and 15' respectively through the axis centers of the spindle motors 12, 12' and the spindles 13, 13' of the rough grinding means 10 and the fine grinding means 10'. The contact surfaces between the first grindstone 16 and the second grindstone 16' and the workpiece W are respectively cooled by grinding water. Here, pure water is preferably used as the grinding water.

清洗手段50藉由清洗水而清洗已被第二加工單元U2的精研削手段10’精研削之被加工物W,並如圖1所示,在Y軸方向配置於暫置部40的下方。此清洗手段50具備:旋轉台51,其將經精研削之被加工物W吸引保持於上表面,並以預定的速度繞著垂直的中心軸旋轉;以及清洗水噴嘴52,其朝向被保持於該旋轉台51之被加工物W噴射清洗水。此外,清洗水較佳使用純水。The cleaning means 50 cleans the workpiece W that has been finely ground by the finishing means 10' of the second processing unit U2 with washing water, and is arranged below the temporary holding portion 40 in the Y-axis direction as shown in FIG. 1 . This cleaning means 50 is equipped with: a rotating table 51 that attracts and holds the finely ground workpiece W on the upper surface and rotates around a vertical central axis at a predetermined speed; and a cleaning water nozzle 52 whose direction is maintained on the upper surface. The workpiece W of the turntable 51 is sprayed with cleaning water. In addition, it is better to use pure water as the cleaning water.

機器人60為多關節機器人,並具有以下功能:將被容納於第一卡匣7之研削加工前的被加工物W取出並搬送往對位台9,且將在清洗手段50中經清洗之被加工物W搬送往第二卡匣8並容納於該第二卡匣8。The robot 60 is a multi-jointed robot and has the following functions: taking out the processed object W contained in the first cassette 7 before grinding and transporting it to the alignment table 9 , and cleaning the object W in the cleaning means 50 . The processed product W is transported to the second cassette 8 and accommodated in the second cassette 8 .

在此機器人60中,吸引保持被加工物W之機器手61係能裝卸地裝設於裝設部62。而且,在此機器人60設有:水平移動機構63,其使機器手61在水平方向移動;以及升降機構64,其使機器手61升降。在此,水平移動機構63具備能彎曲的第一臂63a與第二臂63b,第一臂63a的一端與升降機構64連結。In this robot 60, the robot hand 61 for sucking and holding the workpiece W is detachably attached to the mounting part 62. Furthermore, the robot 60 here is provided with a horizontal movement mechanism 63 that moves the robot hand 61 in the horizontal direction, and a lifting mechanism 64 that moves the robot hand 61 up and down. Here, the horizontal movement mechanism 63 includes a bendable first arm 63a and a second arm 63b, and one end of the first arm 63a is connected to the lifting mechanism 64.

圖1所示之控制器70具備:遵循控制程式而進行運算處理之CPU(Central Processing Unit,中央處理單元)與ROM(Read Only Memory,唯讀記憶體)、RAM(Random Access Memory,隨機存取記憶體)等記憶體等。此控制器70雖如後述般以經由由第一加工單元U1所進行之粗研削與由第二加工單元U2所進行之精研削而將被加工物W研削成預定厚度之方式執行控制該研削裝置1的動作之功能,但其詳細將於後述。The controller 70 shown in Figure 1 is equipped with: a CPU (Central Processing Unit, central processing unit) that performs calculation processing according to the control program, a ROM (Read Only Memory, read-only memory), and a RAM (Random Access Memory, random access memory). memory) and other memory, etc. As will be described later, the controller 70 controls the grinding device in such a manner that the workpiece W is ground to a predetermined thickness through rough grinding by the first machining unit U1 and fine grinding by the second machining unit U2. 1 action function, but its details will be described later.

接著,針對在如以上般所構成之研削裝置1中所實施之本發明之被加工物W的研削方法的第一實施方式進行說明。Next, the first embodiment of the grinding method of the workpiece W of the present invention implemented in the grinding device 1 configured as above will be described.

如圖3所示,第一實施方式之研削方法雖經由1)粗研削步驟、2)修正研削步驟及3)精研削步驟而將被加工物W研削成預定厚度,但在2)修正研削步驟中,依序實施2-1)厚度測量步驟、2-2)計算步驟及2-3)厚度修正研削步驟。以下,針對各步驟分別進行說明。As shown in FIG. 3 , the grinding method of the first embodiment grinds the workpiece W to a predetermined thickness through 1) rough grinding step, 2) corrective grinding step and 3) fine grinding step. However, in the 2) corrective grinding step , perform 2-1) thickness measurement step, 2-2) calculation step and 2-3) thickness correction grinding step in sequence. Each step is explained below.

在粗研削步驟中,圖1所示之機器人60從第一卡匣7取出研削加工前的一片被加工物W並將此設置於對位台9上。如此一來,被加工物W在對位台9進行對位,經對位之被加工物W被吸引保持於圖2所示之被加工物搬送手段20的搬送墊21並被往第一加工單元U1的第一卡盤台3交接,而被吸引保持於該第一卡盤台3的保持面3a。In the rough grinding step, the robot 60 shown in FIG. 1 takes out a piece of workpiece W before grinding from the first cassette 7 and places it on the alignment table 9 . In this way, the workpiece W is aligned on the positioning table 9, and the aligned workpiece W is attracted and held by the conveying pad 21 of the workpiece conveying means 20 shown in Fig. 2 and is moved to the first processing. The first chuck table 3 of the unit U1 is handed over and is attracted and held by the holding surface 3 a of the first chuck table 3 .

已吸引保持被加工物W之第一卡盤台3雖在圖5(a)所示之粗研削開始位置Y1待機,但此時,控制器70將粗研削次數n設定成0(n=0)作為初期設定(圖4的步驟S1)。並且,控制器70驅動第一加工單元U1的升降機構30,而如圖5(a)所示,將粗研削手段10的第一磨石16定位於其下表面從被加工物W的正面起僅低第一距離(在本實施方式中為100μm)(圖4的步驟S2)。Although the first chuck table 3 that has attracted and held the workpiece W is waiting at the rough grinding start position Y1 shown in Fig. 5(a), at this time, the controller 70 sets the number of rough grinding times n to 0 (n=0 ) as the initial setting (step S1 in Figure 4). Furthermore, the controller 70 drives the lifting mechanism 30 of the first processing unit U1 to position the first grindstone 16 of the rough grinding means 10 on its lower surface from the front of the workpiece W as shown in FIG. Only the first distance (100 μm in this embodiment) is lower (step S2 of FIG. 4 ).

從上述狀態,控制器70啟動粗研削手段10的主軸馬達12而將第一磨石16以預定的速度繞著其中心軸進行旋轉驅動,且驅動未圖示的第一移動機構而使第一卡盤台3與被保持於此之被加工物W一起從圖5(a)所示之粗研削開始位置Y1往圖示箭頭a方向以預定的速度移動直至圖5(b)所示之粗研削結束位置Y2為止。如此一來,被加工物W的正面(樹脂F)係藉由由第一磨石16所進行之深進緩給研削而僅被粗研削100μm的厚度份量(圖4的步驟S3)。然後,若此粗研削結束,則第一卡盤台3與被加工物W係藉由未圖示的第一移動機構的驅動而從粗研削結束位置Y2往圖示箭頭b方向移動,並返回粗研削開始位置Y1。From the above state, the controller 70 starts the spindle motor 12 of the rough grinding means 10 to rotate the first grindstone 16 around its central axis at a predetermined speed, and drives the first moving mechanism (not shown) to move the first grindstone 16 . The chuck table 3, together with the workpiece W held therein, moves at a predetermined speed in the direction of the arrow a from the rough grinding start position Y1 shown in Fig. 5(a) until the rough grinding start position Y1 shown in Fig. 5(b) to the grinding end position Y2. In this way, the front surface of the workpiece W (resin F) is roughly ground to a thickness of only 100 μm by deep creep grinding using the first grindstone 16 (step S3 in FIG. 4 ). Then, when the rough grinding is completed, the first chuck table 3 and the workpiece W are driven by the first moving mechanism (not shown) to move from the rough grinding end position Y2 in the direction of the arrow b in the figure, and return. Rough grinding start position Y1.

若如上述般地藉由一次的粗研削而將被加工物W的上表面僅粗研削100μm的厚度份量,則控制器70計數粗研削次數n並設定成n=1(圖4的步驟S4)。在本實施方式中,因將粗研削的次數n設定成3(亦即,僅粗研削三次),故控制器70判斷經計數之粗研削的次數n是否已到達3(步驟S5),在經計數之粗研削的次數n未到達3之情形(步驟S5:否)中,重複以上的粗研削(步驟S2~S5)。As described above, when the upper surface of the workpiece W is roughly ground only to a thickness of 100 μm by one rough grinding operation, the controller 70 counts the number of rough grinding operations n and sets n=1 (step S4 in FIG. 4 ). . In this embodiment, since the number n of rough grinding is set to 3 (that is, only three rough grindings), the controller 70 determines whether the counted number n of rough grinding has reached 3 (step S5). When the counted number of rough grinding n has not reached 3 (step S5: No), the above rough grinding (steps S2 to S5) is repeated.

然後,若進行被加工物W的粗研削三次(圖4的步驟S5:是),則如圖7(a)所示,被加工物W(樹脂F)的正面僅被粗研削300μm,該被加工物W的厚度雖成為圖示的t 1,但接著實施修正研削步驟。此外,在本實施方式中,雖將一次的粗研削的研削量設為100μm並將粗研削的次數n設定成3,但此等的研削量與粗研削次數n可設定成任意的值。 Then, if the workpiece W is roughly ground three times (step S5 in Fig. 4: Yes), as shown in Fig. 7(a), the front surface of the workpiece W (resin F) is roughly ground by only 300 μm. Although the thickness of the workpiece W reaches t 1 as shown in the figure, a correction grinding step is subsequently performed. In addition, in this embodiment, the grinding amount of one rough grinding is set to 100 μm and the number of rough grinding n is set to 3, but the grinding amount and the number of rough grinding n can be set to arbitrary values.

如前述,在厚度修正研削步驟中,依序實施以下說明之厚度測量步驟、計算步驟及厚度修正研削步驟(參照圖3)。As mentioned above, in the thickness correction grinding step, the thickness measurement step, the calculation step and the thickness correction grinding step described below are performed in sequence (see Figure 3).

在厚度測量步驟中,藉由圖1所示之第一厚度測量器5而測量在前述的1)粗研削步驟中經粗研削之被加工物W的厚度t 1(參照圖7(a))(圖4的步驟S6)。 In the thickness measurement step, the thickness t 1 of the workpiece W that has been roughly ground in the aforementioned 1) rough grinding step is measured using the first thickness measuring device 5 shown in Figure 1 (see Figure 7(a) ) (Step S6 in Figure 4).

在計算步驟中,計算藉由圖1所示之第一厚度測量器5所測量之被加工物W的厚度t 1與預先設定之厚度t 0(<t 1)的差(厚度差)Δt(=t 1-t 0)(參照圖7(a))(圖4的步驟S7)。此外,以此計算步驟所計算之厚度差為第一磨石16的消耗量。 In the calculation step , the difference (thickness difference ) Δt ( =t 1 −t 0 ) (see FIG. 7( a )) (step S7 in FIG. 4 ). In addition, the thickness difference calculated by this calculation step is the consumption of the first grindstone 16 .

在厚度修正研削步驟中,以第一磨石16的下表面位於從經粗研削之被加工物W的正面起僅低厚度差Δt之方式使該第一磨石16下降(圖4的步驟S8),與粗研削時同樣地(參照圖5),藉由未圖示的第一移動機構而使第一卡盤台3與被加工物W在Y軸方向移動,以研削量Δt將被加工物W(樹脂F)的正面進行厚度修正研削(圖4的步驟S9)。如此一來,如圖7(b)所示,雖得到預先設定之預定的厚度t 0的被加工物W,但在此狀態下,Cu電極P並未從被加工物W的正面露出,而是埋沒於樹脂F的內部。 In the thickness correction grinding step, the first grinding stone 16 is lowered so that the lower surface of the first grinding stone 16 is located just below the thickness difference Δt from the front surface of the roughly ground workpiece W (step S8 in FIG. 4 ), similarly to rough grinding (refer to FIG. 5 ), the first chuck table 3 and the workpiece W are moved in the Y-axis direction by the first moving mechanism (not shown), and the workpiece W is processed by the grinding amount Δt. The front surface of object W (resin F) is ground for thickness correction (step S9 in Figure 4). In this way, as shown in Figure 7(b), although the workpiece W with the predetermined thickness t0 is obtained, in this state, the Cu electrode P is not exposed from the front surface of the workpiece W, and It is buried inside the resin F.

在此,在被加工物W的粗研削後的厚度t 1與厚度修正研削步驟中之被加工物W的研削量Δt及厚度修正研削後的被加工物W的厚度t 0之間,成立t 1-Δt=t 0的關係式。 Here, t is established between the thickness t 1 of the workpiece W after rough grinding, the grinding amount Δt of the workpiece W in the thickness correction grinding step, and the thickness t 0 of the workpiece W after thickness correction grinding. 1 - Δt = t 0 relationship.

若在以上的粗研削步驟中得到預定的厚度t 0的被加工物W,則藉由圖2所示之被加工物搬送手段(第一被加工物搬送手段)20而將被加工物W搬送往圖1所示之暫置部40,所述圖2所示之被加工物搬送手段(第一被加工物搬送手段)20配置於圖1所示之空間S1。如此一來,經厚度修正研削之厚度t 0的被加工物W被載置並被保持於暫置部40的暫置工作台43上,已保持此被加工物W之暫置工作台43係藉由未圖示的移動機構而沿著導板42往-X軸方向移動。 If the workpiece W with a predetermined thickness t 0 is obtained in the above rough grinding step, the workpiece W is transported by the workpiece conveying means (first workpiece conveying means) 20 shown in FIG. 2 Moving toward the temporary storage portion 40 shown in FIG. 1 , the workpiece conveying means (first workpiece conveying means) 20 shown in FIG. 2 is arranged in the space S1 shown in FIG. 1 . In this way, the workpiece W with a thickness t 0 that has undergone thickness correction grinding is placed and held on the temporary table 43 of the temporary holding part 40 , and the temporary table 43 holding the workpiece W is It moves in the −X-axis direction along the guide plate 42 by a moving mechanism not shown in the figure.

接著,藉由配置於圖1的空間S2之圖2所示之被加工物搬送手段(第二被加工物搬送手段)20而將被加工物W搬送往第二加工單元U2的第二卡盤台3’,該被加工物W被吸引保持於第二卡盤台3’的保持面3a’。Next, the workpiece W is conveyed to the second chuck of the second processing unit U2 by the workpiece conveyance means (second workpiece conveyance means) 20 shown in FIG. 2 which is arranged in the space S2 of FIG. 1 The workpiece W is attracted and held by the holding surface 3a' of the second chuck table 3'.

如上述般已吸引保持被加工物W之第二卡盤台3’雖在圖6(a)所示之精研削開始位置Y3待機,但此時,控制器70驅動第二加工單元U2的升降機構30,而如圖6(a)所示,將精研削手段10’的第二磨石16’定位於其下表面從被加工物W的正面起僅低第二距離(在本實施方式中為10μm)(圖4的步驟S10)。The second chuck table 3', which has attracted and held the workpiece W as described above, is waiting at the finishing start position Y3 shown in Fig. 6(a). However, at this time, the controller 70 drives the lifting and lowering of the second processing unit U2. Mechanism 30, and as shown in FIG. 6(a), the second grindstone 16' of the fine grinding means 10' is positioned on its lower surface only a second distance lower than the front surface of the workpiece W (in this embodiment is 10 μm) (step S10 in Figure 4).

從上述狀態,控制器70啟動精研削手段10’的主軸馬達12’而將第二磨石16’以預定的速度繞著其中心軸進行旋轉驅動,且驅動未圖示的第二移動機構而使第二卡盤台3’與被保持於此之被加工物W一起從圖6(a)所示之精研削開始位置Y3往圖示箭頭c方向以預定的速度移動直至圖6(b)所示之精研削結束位置Y4為止。如此一來,藉由第二磨石16’而將被加工物W的正面(樹脂F)僅精研削10μm的厚度份量(圖4的步驟S11)。然後,若此精研削結束,則第二卡盤台3’與被加工物W係藉由未圖示的第二移動機構而從精研削結束位置Y4往圖示箭頭d方向移動,並返回精研削開始位置Y3。From the above state, the controller 70 starts the spindle motor 12' of the fine grinding means 10' to rotate the second grindstone 16' around its central axis at a predetermined speed, and drives the second moving mechanism not shown in the figure. The second chuck table 3', together with the workpiece W held therein, is moved from the finishing grinding start position Y3 shown in Figure 6(a) to the direction of the arrow c shown in the figure at a predetermined speed until Figure 6(b) to the finishing position Y4 shown. In this way, the front surface of the workpiece W (resin F) is finely ground to a thickness of only 10 μm by the second grindstone 16' (step S11 in Fig. 4). Then, when the finishing grinding is completed, the second chuck table 3' and the workpiece W are moved in the direction of the arrow d from the finishing position Y4 by the second moving mechanism (not shown), and return to the finishing position. Grinding start position Y3.

若如上述般藉由一次的精研削而將被加工物W的上表面僅精研削10μm的厚度份量,則藉由圖1所示之第二厚度測量器6而測量被加工物W的厚度(圖4的步驟S12),並將其結果發送至控制器70。如此一來,控制器70判斷經測量之被加工物W的厚度是否已到達預定的厚度t 2(參照圖7(b)、(c))(圖4的步驟S13)。 If the upper surface of the workpiece W is finely ground to a thickness of only 10 μm in one round of fine grinding as described above, the thickness of the workpiece W is measured by the second thickness measuring device 6 shown in FIG. 1 ( Step S12 of FIG. 4 ), and the result is sent to the controller 70 . In this way, the controller 70 determines whether the measured thickness of the workpiece W has reached the predetermined thickness t 2 (see FIGS. 7(b) and (c) ) (step S13 in FIG. 4 ).

在經測量之被加工物W的厚度比預定的厚度t 2更厚的情形(步驟S13:否)中,重複步驟S10~S13的動作而重複多次被加工物W的精研削,直至經測量之被加工物W的厚度變得等於預定的厚度t 2為止。在本實施方式中,如圖7(b)所示,重複五次精研削而得到圖7(c)所示之預定厚度t 2的被加工物W。此外,精研削的次數係依據一次的精研削量而定,並不受限於五次。 When the measured thickness of the workpiece W is thicker than the predetermined thickness t 2 (step S13: No), the operations of steps S10 to S13 are repeated to repeat the fine grinding of the workpiece W multiple times until the measured thickness is reached. until the thickness of the workpiece W becomes equal to the predetermined thickness t2 . In this embodiment, as shown in FIG. 7(b) , fine grinding is repeated five times to obtain a workpiece W with a predetermined thickness t 2 as shown in FIG. 7(c) . In addition, the number of finishing grinding is based on the amount of finishing grinding in one time and is not limited to five times.

然後,在經精研削之預定厚度t 2的被加工物W中,如圖7(c)所示,Cu電極P亦被研削,且其一部分從被加工物W的正面露出。 Then, in the workpiece W having a predetermined thickness t 2 that has been precisely ground, as shown in FIG. 7(c) , the Cu electrode P is also ground, and a part of it is exposed from the front surface of the workpiece W.

如上所述,若根據本發明之被加工物W的研削方法,則因將在粗研削步驟中經粗研削之被加工物W以其厚度成為預先設定之預定的厚度t 0之方式在下個修正研削步驟中進行修正研削,故針對全部的被加工物W,被精研削之前的被加工物W的厚度成為預先設定之厚度t 0並成為固定。因此,可使在下個精研削步驟中之被加工物W的精研削所需要之時間統一成固定且較短,並在固定的短時間將全部的被加工物W研削成預定的厚度t 2As described above, according to the grinding method of the workpiece W of the present invention, the thickness of the workpiece W that is rough-ground in the rough grinding step becomes the preset predetermined thickness t 0 in the next correction step. Correction grinding is performed in the grinding step, so that the thickness of all the workpieces W before finishing grinding becomes the preset thickness t 0 and becomes fixed. Therefore, the time required for fine grinding of the workpiece W in the next fine grinding step can be uniformly fixed and short, and all the workpieces W can be ground to the predetermined thickness t 2 in a fixed short time.

若如以上般進行而在第二加工單元U2中之被加工物W的精研削結束,則經精研削之被加工物W被保持於配置於圖1的空間S2之圖2所示之被加工物搬送手段20並被搬送往清洗手段50,而往該清洗手段50的旋轉台51交接。When the fine grinding of the workpiece W in the second processing unit U2 is completed as described above, the finely ground workpiece W is held in the workpiece W shown in FIG. 2 arranged in the space S2 of FIG. 1 The object transport means 20 is transported to the cleaning means 50 and delivered to the turntable 51 of the cleaning means 50 .

在清洗手段50中,藉由未圖示的旋轉機構而將旋轉台51與被加工物W一起以預定的速度繞著垂直的中心軸進行旋轉驅動,且從清洗水噴嘴52朝向被加工物W噴射清洗水。如此一來,被加工物W被清洗水清洗,去除附著於該被加工物W的正面之研削屑。如此般已被清洗手段50清洗之被加工物W被保持於機器人60並被搬送往第二卡匣8而被容納於該第二卡匣8,對於一片被加工物W之一連串的研削加工結束。In the cleaning means 50, the rotary table 51 is rotated and driven together with the workpiece W at a predetermined speed around a vertical central axis by a rotation mechanism not shown in the figure, and is directed from the cleaning water nozzle 52 toward the workpiece W. Spray cleaning water. In this way, the workpiece W is washed with the cleaning water, and the grinding chips adhering to the front surface of the workpiece W are removed. The workpiece W cleaned by the cleaning means 50 in this way is held by the robot 60 and transported to the second cassette 8 to be accommodated in the second cassette 8. The series of grinding processing of one piece of workpiece W is completed. .

接著,以下一邊參照圖8及圖9一邊說明本發明之被加工物的研削方法的第二實施方式。Next, a second embodiment of the grinding method of a workpiece according to the present invention will be described below with reference to FIGS. 8 and 9 .

在本實施方式之研削方法中,如圖8所示,雖與前述第一實施方式同樣地經由1)粗研削步驟、2)修正研削步驟及3)精研削步驟而研削被加工物W,但僅在2)修正研削步驟中之修正研削量的設定方法與前述第一實施方式不同。因此,以下僅針對2)修正研削步驟進行說明,針對1)粗研削步驟與3)精研削步驟則省略說明。並且,在圖9所示之流程圖中,針對與圖4所示之流程圖相同的處理,標注與圖4所示之步驟的符號相同的符號。In the grinding method of this embodiment, as shown in FIG. 8 , the workpiece W is ground through 1) rough grinding step, 2) correction grinding step, and 3) fine grinding step in the same manner as in the first embodiment. Only the setting method of the correction grinding amount in 2) the correction grinding step is different from the first embodiment mentioned above. Therefore, only the correction grinding step 2) will be explained below, and the description of the rough grinding step 1) and the fine grinding step 3) will be omitted. In addition, in the flowchart shown in FIG. 9 , the same processing as that in the flowchart shown in FIG. 4 is denoted by the same symbols as the steps shown in FIG. 4 .

在修正研削步驟中,如圖8所示,依序實施2-1)上表面高度測量步驟、2-2)計算步驟及2-3)上表面高度修正研削步驟。In the correction grinding step, as shown in Figure 8, 2-1) upper surface height measurement step, 2-2) calculation step, and 2-3) upper surface height correction grinding step are performed in sequence.

在上表面測量步驟中,藉由圖1所示之第一厚度測量器5而測量在1)粗研削步驟中經粗研削之被加工物W的上表面高度h 1(參照圖7(a))(圖9的步驟S6’)。 In the upper surface measurement step, the upper surface height h 1 of the workpiece W that was rough ground in the 1) rough grinding step is measured using the first thickness measuring device 5 shown in Figure 1 (see Figure 7(a) ) (Step S6' in Figure 9).

在計算步驟中,計算藉由圖1所示之第一厚度測量器5所測量之被加工物W的上表面高度h 1與從第一卡盤台3的保持面3a起僅高預先設定之厚度t 3的高度h 2(<h 1)的差Δh(=h 1-h 2)(參照圖7(a))(圖9的步驟S7’)。 In the calculation step, the height h 1 of the upper surface of the workpiece W measured by the first thickness measuring device 5 shown in FIG. 1 is calculated to be a preset height from the holding surface 3 a of the first chuck table 3 . The difference Δh (=h 1 −h 2 ) between the thickness t 3 and the height h 2 (<h 1 ) (refer to Fig. 7(a)) (step S7' in Fig. 9).

在上表面高度修正研削步驟中,以第一磨石16的下表面位於從經粗研削之被加工物W的正面起僅低高度的差Δh之方式使該第一磨石16下降(圖9的步驟S8’),與粗研削時同樣地(參照圖5),藉由未圖示的第一移動機構而使第一卡盤台3與被加工物W在Y軸方向移動,以研削量Δh將被加工物W(樹脂F)的正面進行厚度修正研削(圖9的步驟S9)。如此一來,如圖7(b)所示,得到預定的厚度t 0的被加工物W。 In the upper surface height correction grinding step, the first grinding stone 16 is lowered so that the lower surface of the first grinding stone 16 is located just a height difference Δh from the front surface of the roughly ground workpiece W (Fig. 9 Step S8'), in the same manner as in rough grinding (refer to FIG. 5), the first chuck table 3 and the workpiece W are moved in the Y-axis direction by the first moving mechanism not shown in the figure, and the grinding amount is Δh performs thickness correction grinding on the front surface of the workpiece W (resin F) (step S9 in FIG. 9 ). In this way, as shown in Fig. 7(b), the workpiece W with a predetermined thickness t0 is obtained.

之後,與前述第一實施方式同樣地,精研削被加工物W(圖9的步驟S10~S14),將被加工物W研削成預定的厚度t 2(參照圖7(c))。 Thereafter, as in the first embodiment, the workpiece W is finely ground (steps S10 to S14 in FIG. 9 ), and the workpiece W is ground to a predetermined thickness t 2 (see FIG. 7( c )).

在本實施方式中,亦與前述第一實施方式同樣地,因將在粗研削步驟中經粗研削之被加工物W以其厚度成為預先設定之預定的厚度t 0之方式在下個修正研削步驟中進行修正研削,故針對全部的被加工物W,被精研削之前的被加工物W的厚度成為預先設定之厚度t 0並成為固定。因此,在下個精研削步驟中之被加工物W的精研削所需要之時間被統一成固定且較短,而得到可在固定的短時間將全部的被加工物W研削成預定的厚度t 2之效果。 In this embodiment, similarly to the first embodiment described above, the workpiece W that has been roughly ground in the rough grinding step is processed in the next correction grinding step so that its thickness becomes the predetermined thickness t 0 set in advance. Correction grinding is performed in the process, so for all the workpieces W, the thickness of the workpiece W before finishing grinding becomes the preset thickness t 0 and becomes fixed. Therefore, the time required for fine grinding of the workpiece W in the next fine grinding step is unified to be fixed and short, so that the entire workpiece W can be ground to the predetermined thickness t 2 in a fixed short time. The effect.

此外,在以上的實施方式中,雖使第一及第二卡盤台3、3’(被加工物W)側相對於固定側的第一及第二磨石16、16’移動而進行深進緩給研削,但亦可與此相反地使第一及第二磨石16、16’相對於第一及第二卡盤台3、3’(被加工物W)移動而進行深進緩給研削。In addition, in the above embodiment, although the first and second chuck tables 3 and 3' (workpiece W) side are moved relative to the first and second grindstones 16 and 16' on the fixed side, deep grinding is performed. Grinding is performed by slow feed, but conversely, the first and second grindstones 16 and 16' may be moved relative to the first and second chuck tables 3 and 3' (the workpiece W) to perform deep feed and slow grinding. Give grinding.

並且,亦可在每次第一及第二卡盤台3、3’與第一及第二磨石16、16’的相對往返移動時進行深進緩給研削。Furthermore, deep feed grinding may be performed every time the first and second chuck tables 3, 3' and the first and second grindstones 16, 16' move relative to each other.

另外,本發明並不受限於應用在以上說明之實施方式,且當然能在申請專利範圍、說明書與圖式所記載之技術性思想的範圍內進行各種變形。In addition, the present invention is not limited to the embodiments described above and can be variously modified within the scope of the patent application, the technical ideas described in the specification and the drawings.

1:研削裝置 2:裝置基座 3:第一卡盤台 3a:保持面 3’:第二卡盤台 3a’:保持面 4:柱體 5:第一厚度測量器(厚度測量器、上表面高度測量器) 5a:第一接觸子 5b:第二接觸子 6:第二厚度測量器 6a:第一接觸子 6b:第二接觸子 7:第一卡匣 8:第二卡匣 9:對位台 10:粗研削手段 11,11’:保持座 12,12’:主軸馬達 13,13’:主軸 14,14’:安裝件 15,15’:研削輪 16:第一磨石 16’:第二磨石 20:被加工物搬送手段 20A:Y軸移動機構 20B:Z軸移動機構 21:搬送墊(第二搬送墊) 21a,21b:底板 22a,22b:導軌 23a:滑件 23b:升降塊 24a,24b:滾珠螺桿軸 25a,25b:電動馬達 26a,26b:軸承 25:吸盤 30:升降機構 31:升降板 32:導軌 33:滾珠螺桿軸 34:電動馬達 40:暫置部 41:暫置台 42:導板 43:暫置工作台 43a:保持面 50:清洗手段 51:旋轉台 52:清洗水噴嘴 60:機器人 61:機器手 62:裝設部 63:水平移動機構 63a:第一臂 63b:第二臂 64:升降機構 70:控制器 C:晶片 F:樹脂 h 1:經粗研削之被加工物的上表面高度 h 2:從保持面起僅高預定厚度的高度 P:Cu電極 S1,S2:空間 t 0:經預先設定之被加工物的厚度 t 1:經粗研削之被加工物的厚度 t 2:經精研削之被加工物的預定厚度 t 3:預先設定之厚度 Δt:厚度差 Δh:高度差 U1:第一加工單元 U2:第二加工單元 W:被加工物 W1:支撐基板 Y1:粗研削開始位置 Y2:粗研削結束位置 Y3:精研削開始位置 Y4:精研削結束位置 1: Grinding device 2: Device base 3: First chuck table 3a: Holding surface 3': Second chuck table 3a': Holding surface 4: Cylinder 5: First thickness gauge (thickness gauge, upper Surface height measuring device) 5a: first contact 5b: second contact 6: second thickness measuring device 6a: first contact 6b: second contact 7: first cassette 8: second cassette 9: Alignment table 10: Rough grinding means 11, 11': Holder 12, 12': Spindle motor 13, 13': Spindle 14, 14': Mounting parts 15, 15': Grinding wheel 16: First grinding stone 16' : Second grindstone 20: Workpiece conveying means 20A: Y-axis moving mechanism 20B: Z-axis moving mechanism 21: Conveying pad (second conveying pad) 21a, 21b: Bottom plate 22a, 22b: Guide rail 23a: Slider 23b: Lifting block 24a, 24b: Ball screw shaft 25a, 25b: Electric motor 26a, 26b: Bearing 25: Suction cup 30: Lifting mechanism 31: Lifting plate 32: Guide rail 33: Ball screw shaft 34: Electric motor 40: Temporary part 41: Temporary setting table 42: Guide plate 43: Temporary setting table 43a: Holding surface 50: Cleaning means 51: Rotary table 52: Cleaning water nozzle 60: Robot 61: Robot hand 62: Installation part 63: Horizontal moving mechanism 63a: First Arm 63b: Second arm 64: Elevating mechanism 70: Controller C: Wafer F: Resin h 1 : Height of the upper surface of the roughly ground workpiece h 2 : Height above the predetermined thickness from the holding surface P: Cu Electrodes S1, S2: Space t 0 : Preset thickness of the workpiece t 1 : Thickness of the roughly ground workpiece t 2 : Predetermined thickness of the finely ground workpiece t 3 : Preset thickness Δt: Thickness difference Δh: Height difference U1: First processing unit U2: Second processing unit W: Workpiece W1: Support substrate Y1: Rough grinding start position Y2: Rough grinding end position Y3: Fine grinding start position Y4: Fine grinding Grinding end position

圖1係將用於實施本發明之被加工物的研削方法的研削裝置的一部分剖斷表示之立體圖。 圖2係圖1所示之研削裝置的被加工物搬送手段的立體圖。 圖3係表示本發明的第一實施方式之被加工物的研削方法的步驟之流程圖。 圖4係表示本發明的第一實施方式之被加工物的研削方法的程序之流程圖。 圖5(a)、圖5(b)係表示在本發明的第一實施方式之被加工物的研削方法中之粗研削步驟之示意側視圖。 圖6(a)、圖6(b)係表示在本發明的第一實施方式之被加工物的研削方法中之精研削步驟之示意側視圖。 圖7(a)~圖7(c)係藉由本發明之被加工物的研削方法而被研削之被加工物的縱剖面圖。 圖8係表示本發明的第二實施方式之被加工物的研削方法的步驟之流程圖。 圖9係表示本發明的第二實施方式之被加工物的研削方法的程序之流程圖。 FIG. 1 is a partially cutaway perspective view of a grinding device used for carrying out the grinding method of a workpiece according to the present invention. FIG. 2 is a perspective view of a workpiece conveying means of the grinding device shown in FIG. 1 . FIG. 3 is a flowchart showing steps of a method for grinding a workpiece according to the first embodiment of the present invention. FIG. 4 is a flowchart showing the procedure of the grinding method of the workpiece according to the first embodiment of the present invention. 5(a) and 5(b) are schematic side views showing a rough grinding step in the method for grinding a workpiece according to the first embodiment of the present invention. 6(a) and 6(b) are schematic side views showing the finishing step in the method for grinding a workpiece according to the first embodiment of the present invention. 7(a) to 7(c) are longitudinal sectional views of the workpiece ground by the workpiece grinding method of the present invention. FIG. 8 is a flowchart showing the steps of the grinding method of a workpiece according to the second embodiment of the present invention. FIG. 9 is a flowchart showing the procedure of the grinding method of the workpiece according to the second embodiment of the present invention.

S1:初期設定:n=0 S1: Initial setting: n=0

S2:第一磨石下降100μm S2: The first grinding stone drops 100μm

S3:粗研削 S3: Rough grinding

S4:n=n+1 S4:n=n+1

S5:是否n=3? S5: Is n=3?

S6:測量工件的厚度 S6: Measure the thickness of the workpiece

S7:計算厚度差 S7: Calculate thickness difference

S8:第一磨石下降厚度差份量 S8: The first grinding stone reduces the thickness difference

S9:厚度修正研削 S9:Thickness correction grinding

S10:第二磨石下降10μm S10: The second grinding stone drops by 10μm

S11:精研削 S11: Precision grinding

S12:測量工件的厚度 S12: Measure the thickness of the workpiece

S13:是否厚度=預定厚度? S13: Is thickness = predetermined thickness?

S14:結束 S14:End

Claims (3)

一種被加工物的研削方法,其在被保持於卡盤台之被加工物的外側將磨石的下表面定位於比該被加工物的上表面低的位置,使該卡盤台與該磨石相對地水平移動而研削該被加工物的上表面,且具備: 粗研削步驟,其將第一磨石的下表面定位於比該被加工物的該上表面低第一距離並使該卡盤台與該第一磨石相對地水平移動,藉此研削該被加工物的該上表面; 修正研削步驟,其在實施該粗研削步驟之後,將該被加工物的厚度研削成預定的厚度;以及 精研削步驟,其在實施該修正研削步驟之後,將第二磨石的下表面定位於比該被加工物的該上表面低第二距離並使該卡盤台與該第二磨石相對地水平移動,藉此研削該被加工物的該上表面。 A method for grinding a workpiece, which includes positioning the lower surface of a grindstone lower than the upper surface of the workpiece on the outside of the workpiece held on a chuck table, so that the chuck table is in contact with the grindstone. The stone moves relatively horizontally to grind the upper surface of the workpiece, and has: The rough grinding step is to position the lower surface of the first grindstone at a first distance lower than the upper surface of the workpiece and move the chuck table horizontally relative to the first grindstone, thereby grinding the workpiece. The upper surface of the workpiece; A correction grinding step, which grinds the thickness of the workpiece to a predetermined thickness after performing the rough grinding step; and The fine grinding step is to position the lower surface of the second grindstone at a second distance lower than the upper surface of the workpiece and make the chuck table face the second grindstone after performing the corrective grinding step. Move horizontally to grind the upper surface of the workpiece. 如請求項1之被加工物的研削方法,其中,該修正研削步驟包含: 厚度測量步驟,其以厚度測量器測量被保持於該卡盤台之該被加工物的厚度; 計算步驟,其計算以該厚度測量步驟所測量之厚度與預先設定之厚度的差;以及 修正研削步驟,其將該第一磨石的該下表面定位於比以該粗研削步驟所研削之該被加工物的該上表面僅低以該計算步驟所計算之該差並使該卡盤台與該第一磨石相對地水平移動,藉此研削該被加工物的該上表面。 For example, the grinding method of the workpiece of claim 1, wherein the modified grinding step includes: a thickness measuring step, which uses a thickness measuring device to measure the thickness of the workpiece held on the chuck table; A calculation step that calculates the difference between the thickness measured by the thickness measurement step and the preset thickness; and A correction grinding step, which positions the lower surface of the first grinding stone lower than the upper surface of the workpiece ground by the rough grinding step by the difference calculated by the calculation step and causes the chuck to The table moves horizontally relative to the first grindstone, thereby grinding the upper surface of the workpiece. 如請求項1之被加工物的研削方法,其中,該修正研削步驟包含: 上表面高度測量步驟,其以上表面高度測量器測量被保持於該卡盤台之該被加工物的上表面高度; 計算步驟,其計算以該上表面高度步驟所測量之該被加工物的該上表面高度與從該保持面起僅高預先設定之厚度的高度的差;以及 上表面高度修正研削步驟,其將該第一磨石的該下表面定位於比以該粗研削步驟所研削之該被加工物的該上表面僅低以該計算步驟所計算之該差並使該卡盤台與該第一磨石相對地水平移動,藉此研削該被加工物的該上表面。 For example, the grinding method of the workpiece of claim 1, wherein the modified grinding step includes: An upper surface height measuring step, in which the upper surface height measuring device measures the upper surface height of the workpiece held on the chuck table; a calculation step that calculates the difference between the upper surface height of the workpiece measured by the upper surface height step and a height that is only higher than a preset thickness from the holding surface; and The upper surface height correction grinding step positions the lower surface of the first grinding stone only lower than the upper surface of the workpiece ground by the rough grinding step by the difference calculated by the calculation step and makes The chuck table moves horizontally relative to the first grindstone, thereby grinding the upper surface of the workpiece.
TW112125304A 2022-07-11 2023-07-06 Grinding method for workpiece including a rough grinding step, a fine grinding step, and a grinding correction step TW202402460A (en)

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