TW202342649A - Composition, film, optical filter, solid-state imaging element, image display device, infrared sensor, camera module, and compound - Google Patents

Abstract

This composition includes an infrared absorbing agent, a curable compound, and a solvent, wherein the infrared absorbing agent includes a compound represented by formula (1). Provided are a film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor, a camera module, and a compound.

Description

Compositions, films, optical filters, solid-state imaging devices, image display devices, infrared sensors, camera film groups and compounds

The present invention relates to a composition containing a squaraine compound. Furthermore, the present invention relates to a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, a camera film assembly and a compound using the composition.

The solid-state imaging element that uses color images in video cameras, digital cameras, mobile phones with camera functions, etc. is CCD (Charge Coupled Device) or CMOS (Complementary Metal Oxide Semiconductor). These solid-state imaging devices use silicon photodiodes that are sensitive to infrared rays in their light-receiving portions. Therefore, an infrared cutoff filter is sometimes set for luminosity factor correction.

The infrared cut filter is made of a composition containing an infrared absorber. As infrared absorbers, squaraine compounds and the like are known.

Patent Document 1 describes the production of an infrared cut filter or the like using a composition containing a specific squaraine compound or the like.

[Patent Document 1] International Publication No. 2014/088063

However, squaraine compounds tend to have lower photostability. Therefore, there is room for further improvement in the light resistance of films obtained using compositions containing these compounds.

In addition, since the squaraine compound has an intramolecular salt structure, its solubility in a solvent is often low. Therefore, regarding a composition containing a squaraine compound, the squaraine compound is likely to precipitate during storage of the composition, and when the composition after storage is used to form a film, foreign matter or the like is likely to be generated in the film. Therefore, there is room for further improvement in the storage stability of the composition containing the squaraine compound.

Therefore, an object of the present invention is to provide a composition capable of forming a film having excellent storage stability and excellent light resistance. Furthermore, an object of the present invention is to provide a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, a camera film assembly, and a compound.

The present invention provides the following. <1> A composition containing an infrared absorber, a curable compound and a solvent, wherein the infrared absorber contains a compound represented by formula (1); [Chemical 1] In formula (1), A and B independently represent an aromatic hydrocarbon ring or an aromatic heterocyclic ring, and R ^aa1 and R ^aa2 independently represent a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, and a phosphate group. , alkyl, aryl, heterocyclyl, alkoxy, acyl, alkoxycarbonyl, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 or -OSO ₂ R ^a15 , R ^a11 and R ^a12 Each independently represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, R ^a13 to R ^a15 each independently represents an alkyl group, an aryl group or a heterocyclic group, R ^b1 to R ^b4 each independently represents a hydrogen atom or a halogen atom , sulfo group, hydroxyl group, cyano group, nitro group, carboxyl group, phosphate group, alkyl group, aryl group, heterocyclic group, alkoxy group, hydroxyl group, alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , - NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^{b21 ,} R ^b11 and R ^b12 independently represent a hydrogen atom, an alkane group, aryl group or heterocyclic group, R ^b13 to R ^b21 independently represent an alkyl group, an aryl group or a heterocyclic group, Y ¹ to Y ⁴ independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group or A group represented by formula (Y-1), m1 represents an integer from 0 to mA, mA represents the largest integer that R ^aa1 can replace A, m2 represents an integer from 0 to mB, and mB represents the largest integer that R ^aa2 can replace B. Integer, when m1 is 2 or more, 2 R ^aa1 out of m1 R ^aa1 can bond with each other to form a ring. When m2 is 2 or more, 2 R ^aa2 out of m2 R ^aa2 can bond with each other to form a ring, R ^aa1 It can bond with Y ¹ to form a heterocyclic ring containing a 5-membered ring or a 6-membered ring containing at least one nitrogen atom. R ^aa1 and Y ² can bond to form a heterocyclic ring containing a 5-membered ring or a 6-membered ring containing at least one nitrogen atom. Ring, R ^aa2 and Y ³ can bond to form a 5-membered ring or a 6-membered heterocyclic ring containing at least one nitrogen atom, R ^aa2 and Y ⁴ can bond to form a 5-membered ring or 6-membered ring containing at least one nitrogen atom A heterocyclic ring with 5 members, Y ¹ and Y ² can be bonded to form a 5-membered ring or a 6-membered ring containing at least one nitrogen atom, Y ³ and Y ⁴ can be bonded to form a 5-membered ring containing at least one nitrogen atom. A membered ring or a 6-membered heterocyclic ring; wherein, at least one of Y ¹ to Y ⁴ is a group represented by formula (Y-1), and is selected from R ^aa1 and Y ¹ , R ^aa1 and Y ² , R ^aa2 and at least one of Y ³ and R ^aa2 and Y ⁴ bond to form a 5-membered ring or a 6-membered ring heterocycle containing at least one nitrogen atom; [Chemical 2] In formula (Y-1), the wavy line represents a bond, Ry ¹ to Ry ⁴ independently represent a hydrogen atom, an alkyl group or an aryl group, and X ¹ is a single bond, an alkylene group, an aryl group, -O-, -S-, -NRx-, -CO-, -CS-, -SO- or -SO ₂ -, or it will be selected from alkylene, aryl, -O-, -S-, -NRx-, A group composed of two or more of -CO-, -CS-, -SO- and -SO ₂ -, Rx represents a hydrogen atom, an alkyl group or an aryl group, Z ¹ represents an alicyclic hydrocarbon group or an aromatic hydrocarbon group , heterocyclic group, a group represented by any one of the formulas (Z-1) to (Z-6); wherein, Z ¹ is a group represented by the formula (Z-1) or a group represented by the formula (Z-4 ) represents a group, the part in X ¹ linked to Z ¹ is an alkylene group or an aryl group; [Chemical 3] In formula (Z-1) to formula (Z-6), the wavy line represents a bond; in formula (Z-1), Rz ¹¹ represents an alkyl group or an aryl group; in formula (Z-2), Rz ¹² represents hydrogen atom, -COR ¹⁰⁰ or -COOR ¹⁰⁰ , R ¹⁰⁰ represents a hydrogen atom, an alkyl group or an aryl group, Rz ^12a represents an alkyl group, mz represents an integer from 0 to 4; in formula (Z-3), Rz ¹³ to Rz ¹⁶ respectively independently represents an alkyl group, and Rz ¹⁷ represents a hydrogen atom, an alkyl group or an oxygen radical; in formula (Z-4), Rz ¹⁸ and Rz ¹⁹ independently represent an alkyl group or an aryl group; in formula (Z-6), W ¹ represents a single bond, an alkylene group, an aryl group or -CO-, Rz ²⁰ represents a hydrogen atom, an alkyl group, an aryl group or -COR ¹⁰¹ , and R ¹⁰¹ represents an alkyl group or an aryl group. <2> The composition according to <1>, wherein the compound represented by the above formula (1) is a compound represented by the formula (2); [Chemical 4] In formula (2), R ^a1 to R ^a4 each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, and an alkoxy group. , acyl group, alkoxycarbonyl group, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 or -OSO ₂ R ^a15 , R ^a11 and R ^a12 respectively independently represent a hydrogen atom, an alkyl group, an aryl group or a hetero Ring group, R ^a13 to R ^a15 independently represent an alkyl group, an aryl group or a heterocyclic group, R ^b1 to R ^b4 respectively independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, Phosphate group, alkyl group, aryl group, heterocyclyl group, alkoxy group, acyl group, alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , - SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 , R ^b11 and R ^b12 independently represent a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, R ^b13 ~ R ^b21 Each independently represents an alkyl group, an aryl group or a heterocyclic group, Y ¹ to Y ⁴ each independently represents a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group or a group represented by the above formula (Y-1), R ^a1 and Y ¹ may bond to form a 5-membered ring or 6-membered heterocyclic ring containing at least one nitrogen atom, and R ^a2 and Y ² may bond to form a 5-membered ring or 6-membered ring containing at least one nitrogen atom. Heterocycle, R ^a3 and Y ³ can bond to form a 5-membered ring or 6-membered ring containing at least one nitrogen atom, R ^a4 and Y ⁴ can bond to form a 5-membered ring containing at least one nitrogen atom or a 6-membered ring. A 6-membered heterocyclic ring, Y ¹ and Y ² can be bonded to form a 5-membered ring or a 6-membered ring heterocyclic containing at least one nitrogen atom, Y ³ and Y ⁴ can be bonded to form a 5-membered ring containing at least one nitrogen atom 5-membered ring or 6-membered ring heterocycle; wherein, at least one of Y ¹ to Y ⁴ is a group represented by the above formula (Y-1), and is selected from R ^a1 and Y ¹ , R ^a2 and Y ² , R ^a3 and at least one of Y ³ and R ^a4 and Y ⁴ are bonded to form a 5-membered ring or a 6-membered ring heterocyclic ring containing at least one nitrogen atom. <3> The composition according to <1>, wherein the compound represented by the above formula (1) is a compound represented by the formula (3); [Chemical 5] In formula (3), R ¹³ to R ¹⁷ and R ²³ to R ²⁷ respectively independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, a hetero group, and a hydrogen atom. Ring group, alkoxy group, acyl group, alkoxycarbonyl group, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 or -OSO ₂ R ^a15 , R ^a11 and R ^a12 independently represent a hydrogen atom, an alkane group, aryl or heterocyclic group, R ^a13 to R ^a15 independently represent an alkyl group, an aryl group or a heterocyclic group, R ¹¹ , R ¹² , R ²¹ and R ²² respectively independently represent a hydrogen atom, a halogen atom, a sulfonate group, hydroxyl group, cyano group, nitro group, carboxyl group, phosphate group, alkyl group, aryl group, heterocyclic group, alkoxy group, acyl group, alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 , R ^b11 and R ^b12 independently represent a hydrogen atom, an alkyl group, Aryl or heterocyclic group, R ^b13 to R ^b21 independently represent an alkyl group, an aryl group or a heterocyclic group, Y ¹¹ and Y ²¹ independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group or a combination of the above The group represented by formula (Y-1), at least one of Y ¹¹ and Y ²¹ is a group represented by the above formula (Y-1). <4> The composition according to <3>, wherein at least one of R ¹¹ and R ¹² and at least one of R ²¹ and R ²² of the above formula (3) are each independently -NHCOR ^b13 , and R ^b13 is Alkyl, aryl or heterocyclyl. <5> The composition according to <3>, wherein at least one of R ¹¹ and R ¹² and at least one of R ²¹ and R ²² of the above formula (3) are independently -NHSO ₂ R ^b14 , R ^b14 is an alkyl group, an aryl group or a heterocyclic group. <6> The composition according to any one of <1> to <5>, wherein the curable compound contains a resin. <7> The composition according to any one of <1> to <6>, wherein the infrared absorber further contains an infrared absorber other than the compound represented by the above formula (1). <8> The composition according to any one of <1> to <7>, further comprising at least one selected from the group consisting of ultraviolet absorbers and antioxidants. <9> A film obtained using the composition according to any one of <1> to <8>. <10> An optical filter including the film according to <9>. <11> A solid-state imaging element including the film according to <9>. <12> An image display device including the film according to <9>. <13> An infrared sensor including the film according to <9>. <14> A camera film set including the film according to <9>. <15> A compound represented by formula (1); [Chemical 6] In formula (1), A and B independently represent an aromatic hydrocarbon ring or an aromatic heterocyclic ring, and R ^aa1 and R ^aa2 independently represent a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, and a phosphate group. , alkyl, aryl, heterocyclyl, alkoxy, acyl, alkoxycarbonyl, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 or -OSO ₂ R ^a15 , R ^a11 and R ^a12 Each independently represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, R ^a13 to R ^a15 each independently represents an alkyl group, an aryl group or a heterocyclic group, R ^b1 to R ^b4 each independently represents a hydrogen atom or a halogen atom , sulfo group, hydroxyl group, cyano group, nitro group, carboxyl group, phosphate group, alkyl group, aryl group, heterocyclic group, alkoxy group, hydroxyl group, alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , - NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^{b21 ,} R ^b11 and R ^b12 independently represent a hydrogen atom, an alkane group, aryl group or heterocyclic group, R ^b13 to R ^b21 independently represent an alkyl group, an aryl group or a heterocyclic group, Y ¹ to Y ⁴ independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group or The group represented by formula (Y-1), m1 represents an integer from 0 to mA, mA represents the largest integer that R ^aa1 can be replaced by A, m2 represents an integer from 0 to mB, mB represents the maximum integer that R ^aa2 can be replaced by B The largest integer, when m1 is 2 or more, 2 R ^aa1 out of m1 R ^aa1 can bond with each other to form a ring. When m2 is 2 or more, 2 R ^aa2 out of m2 R ^aa2 can bond with each other to form a ring. R ^aa1 and Y ¹ may bond to form a 5-membered ring or a 6-membered heterocyclic ring containing at least one nitrogen atom, and R ^aa1 and Y ² may bond to form a 5-membered ring or 6-membered ring containing at least one nitrogen atom. A heterocyclic ring, R ^aa2 and Y ³ can bond to form a 5-membered ring or a 6-membered ring containing at least one nitrogen atom, R ^aa2 and Y ⁴ can bond to form a 5-membered ring containing at least one nitrogen atom Or a 6-membered heterocyclic ring, Y ¹ and Y ² can be bonded to form a 5-membered ring or a 6-membered ring heterocyclic containing at least one nitrogen atom, Y ³ and Y ⁴ can be bonded to form a 5-membered ring or a 6-membered ring containing at least one nitrogen atom. 5-membered ring or 6-membered ring heterocycle; wherein, at least one of Y ¹ to Y ⁴ is a group represented by formula (Y-1), and is selected from R ^aa1 and Y ¹ , R ^aa1 and Y ² , R ^aa2 and at least one of Y ³ and R ^aa2 and Y ⁴ bond to form a 5-membered ring or a 6-membered ring heterocycle containing at least one nitrogen atom; [Chemical 7] In formula (Y-1), the wavy line represents a bond, Ry ¹ to Ry ⁴ independently represent a hydrogen atom, an alkyl group or an aryl group, and X ¹ is a single bond, an alkylene group, an aryl group, -O-, -S-, -NRx-, -CO-, -CS-, -SO- or -SO ₂ -, or it will be selected from alkylene, aryl, -O-, -S-, -NRx-, A group composed of two or more of -CO-, -CS-, -SO- and -SO ₂ -, Rx represents a hydrogen atom, an alkyl group or an aryl group, Z ¹ represents an alicyclic hydrocarbon group or an aromatic hydrocarbon group , heterocyclic group, a group represented by any one of the formulas (Z-1) to (Z-6); wherein, Z ¹ is a group represented by the formula (Z-1) or a group represented by the formula (Z-4 ) represents a group, the part in X ¹ linked to Z ¹ is an alkylene group or an aryl group; [Chemical 8] In formula (Z-1) to formula (Z-6), the wavy line represents a bond; in formula (Z-1), Rz ¹¹ represents an alkyl group or an aryl group; in formula (Z-2), Rz ¹² represents hydrogen atom, -COR ¹⁰⁰ or -COOR ¹⁰⁰ , R ¹⁰⁰ represents a hydrogen atom, an alkyl group or an aryl group, Rz ^12a represents an alkyl group, mz represents an integer from 0 to 4; in formula (Z-3), Rz ¹³ to Rz ¹⁶ respectively independently represents an alkyl group, and Rz ¹⁷ represents a hydrogen atom, an alkyl group or an oxygen radical; in formula (Z-4), Rz ¹⁸ and Rz ¹⁹ independently represent an alkyl group or an aryl group; in formula (Z-6), W ¹ represents a single bond, an alkylene group, an aryl group or -CO-, Rz ²⁰ represents a hydrogen atom, an alkyl group, an aryl group or -COR ¹⁰¹ , and R ¹⁰¹ represents an alkyl group or an aryl group. [Effects of the invention]

According to the present invention, it is possible to provide a composition capable of forming a film having excellent storage stability and excellent light resistance. Furthermore, the present invention can provide a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, a camera film assembly, and a compound.

The contents of the present invention will be described in detail below. In this specification, "～" is used in the meaning of including the numerical value described before and after it as a lower limit value and an upper limit value. Among the symbols for groups (atomic groups) in this specification, the symbols not indicating substituted and unsubstituted include groups (atomic groups) without substituents and groups (atomic groups) with substituents. For example, "alkyl" includes not only alkyl groups without substituents (unsubstituted alkyl groups) but also alkyl groups with substituents (substituted alkyl groups). In this specification, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams, unless otherwise specified. Examples of the light used for exposure include active light or radiation such as the bright line spectrum of a mercury lamp, far ultraviolet light, extreme ultraviolet light (EUV light), X-rays, and electron beams represented by excimer lasers. In this specification, "(meth)acrylate" means both or either acrylate and methacrylate, "(meth)acrylic acid" means both or either acrylic acid and methacrylic acid, and "(meth)acrylic acid" means both or either acrylic acid and methacrylic acid. "Base) acrylyl group" means both or any one of acrylyl group and methacrylyl group. In this specification, the weight average molecular weight and the number average molecular weight are defined as polystyrene-converted values measured by gel permeation chromatography (GPC). In this specification, Me in the chemical formula represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. In this specification, infrared rays represent light (electromagnetic waves) with a wavelength of 700 to 2500 nm. In this specification, the total solid content refers to the total mass of all components of the composition excluding the solvent. In this specification, the term "step" includes not only independent steps but also those that cannot be clearly distinguished from other steps as long as the expected effect of the step is achieved.

＜Composition＞ The composition of the present invention is characterized by including an infrared absorber, a curable compound and a solvent, and the infrared absorber includes a compound represented by formula (1).

The composition of the present invention can form a film having excellent storage stability and suppressing the generation of foreign matter and the like even after long-term storage. Furthermore, the present invention can form a film excellent in light resistance. The detailed reason why such effects are obtained is not yet clear, but it is speculated as follows.

It is estimated that the compound represented by formula (1) contained in the composition of the present invention has at least one of Y ¹ to Y ⁴ that is a group represented by formula (Y-1) and is selected from R ^aa1 and Y ¹ , R ^aa1 It is bonded to at least one of Y ² , R ^aa2 and Y ³ , and R ^aa2 and Y ⁴ to form a structure of a 5-membered ring or a 6-membered ring heterocyclic ring containing at least one nitrogen atom, thereby improving the relationship with the composition. The compatibility of the contained solvent or curable compound results in a composition having excellent storage stability. In addition, squaraine compounds tend to easily form H associations in the film during film production. The formation of H associations tends to cause a decrease in light resistance, but it is presumed that the compound represented by formula (1) can suppress the formation of H associations in the film by having the above structure. Therefore, by using the composition of the present invention, a film excellent in light resistance can be formed.

The composition of the present invention can be used as an optical filter composition. Examples of types of optical filters include infrared cutoff filters, infrared transmission filters, and the like. Since the compound represented by formula (1) can suppress the formation of H association in the film, it is possible to form a film having excellent visible light transmittance and excellent infrared shielding property by using the composition of the present invention. Therefore, the composition of the present invention is particularly preferably used as a composition for an infrared cut filter.

Each component used in the composition of the present invention will be described below.

＜＜Infrared absorber＞＞ The composition of the present invention contains an infrared absorber. The infrared absorber contained in the composition of the present invention contains a compound represented by formula (1). Compounds represented by formula (1) are also compounds of the present invention. Hereinafter, the compound represented by formula (1) is also called a specific compound.

(Specific compound (compound represented by formula (1))) [Chemical 9]

A and B in Formula (1) each independently represent an aromatic hydrocarbon ring or an aromatic heterocyclic ring. The carbon number of the rings constituting the aromatic hydrocarbon ring is preferably 6 to 48, more preferably 6 to 22, and particularly preferably 6 to 12. It is preferred that the aromatic hydrocarbon ring is a single ring or a condensed ring with a condensation number of 2 to 8, a single ring or a condensed ring with a condensation number of 2 to 4 is even more preferred, a single ring or a condensed ring with a condensation number of 2 or 3 is preferred. More preferably, a single ring or a condensed ring with a condensation number of 2 is still more preferred, and a single ring is particularly preferred. The aromatic heterocyclic ring is preferably a 5-membered ring or a 6-membered ring. The aromatic heterocyclic ring is preferably a single ring or a condensed ring with a condensation number of 2 to 8, a single ring or a condensed ring with a condensation number of 2 to 4 is even more preferably, a single ring or a condensed ring with a condensation number of 2 or 3 is More preferably, a single ring or a condensed ring with a condensation number of 2 is still more preferred, and a single ring is particularly preferred. Examples of heteroatoms constituting the ring of the aromatic heterocyclic ring include nitrogen atoms, oxygen atoms, and sulfur atoms, with nitrogen atoms and sulfur atoms being preferred. The number of heteroatoms in the ring constituting the aromatic heterocyclic ring is preferably 1 to 3, more preferably 1 to 2.

In formula (1), at least one of A and B (preferably both A and B) is a benzene ring, a thiophene ring, a furan ring, a pyrrole ring, a pyridine ring, an azulene ring or a condensed ring containing these rings: Better. Examples of the condensed ring include naphthalene ring, benzothiophene ring, benzofuran ring, isobenzofuran ring, benzimidazole ring, indole ring, isoindole ring, quinoline ring, isoquinoline ring, Thienopyrrole ring, pyrrolothiazole ring, etc. At least one of A and B (preferably both A and B) is preferably a benzene ring or a naphthalene ring, and more preferably a benzene ring.

R ^aa1 and R ^aa2 in formula (1) each independently represent a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, a hydroxyl group, Alkoxycarbonyl, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 or -OSO ₂ R ^a15 , R ^a11 and R ^a12 respectively independently represent a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, R ^a13 to R ^a15 each independently represent an alkyl group, an aryl group or a heterocyclic group.

Examples of the halogen atom represented by R ^aa1 and R ^aa2 include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

The number of carbon atoms in the alkyl group represented by R ^aa1 , R ^aa2 , and R ^a11 to R ^a15 is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The alkyl group may be linear, branched, or cyclic, with linear or branched chains being preferred. The above-mentioned alkyl group may have a substituent. Examples of the substituent include groups exemplified in the substituent T described below, and are selected from the group consisting of an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. At least one of the groups is preferred.

The number of carbon atoms in the aryl group represented by R ^aa1 , R ^aa2 , and R ^a11 to R ^a15 is preferably 6 to 48, more preferably 6 to 22, and further preferably 6 to 12. The above-mentioned aryl group may have a substituent. Examples of the substituent include the groups listed for the substituent T described below, and are selected from the group consisting of an alkyl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. At least one of the groups is preferred.

The heterocyclic group represented by R ^aa1 , R ^aa2 , and R ^a11 to R ^a15 is preferably a 5-membered ring or a 6-membered ring heterocyclic group. Furthermore, the heterocyclic group is preferably a monocyclic heterocyclic group or a fused cyclic heterocyclic group with a condensation number of 2 to 8, and a monocyclic heterocyclic group or a fused cyclic heterocyclic group with a condensation number of 2 to 4 is preferred. More preferably, a monocyclic heterocyclic group or a fused cyclic heterocyclic group with a condensation number of 2 or 3 is still more preferable. The heteroatoms constituting the ring of the heterocyclyl group are preferably nitrogen atoms, oxygen atoms or sulfur atoms. The number of heteroatoms in the ring constituting the heterocyclyl group is preferably 1 to 3, more preferably 1 to 2. The number of carbon atoms of the ring constituting the heterocyclic group is preferably 1 to 30, more preferably 1 to 18, and further preferably 1 to 12. The above heterocyclic group may have a substituent. Examples of the substituent include the groups listed for the substituent T described below, and are selected from the group consisting of alkyl groups, aryl groups, heterocyclic groups, halogen atoms, sulfo groups, hydroxyl groups, cyano groups, nitro groups, carboxyl groups, phosphate groups, and At least one type from the group of amine groups is preferred.

The number of carbon atoms in the alkoxy group represented by R ^aa1 and R ^aa2 is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The alkoxy group is preferably straight chain or branched chain. The above-mentioned alkoxy group may have a substituent. Examples of the substituent include the groups listed for the substituent T described below, and are selected from the group consisting of alkyl groups, aryl groups, heterocyclic groups, halogen atoms, sulfo groups, hydroxyl groups, cyano groups, nitro groups, carboxyl groups, phosphate groups, and At least one type from the group of amine groups is preferred.

The carbon number of the acyl group represented by R ^aa1 and R ^aa2 is preferably 2 to 30, more preferably 2 to 15, and further preferably 2 to 8. Examples of the above-mentioned acyl group include a formyl group, an alkylcarbonyl group, and an arylcarbonyl group. The number of carbon atoms in the alkylcarbonyl group is preferably 2 to 30, more preferably 2 to 15, and still more preferably 2 to 8. The carbon number of the arylcarbonyl group is preferably 7 to 30, more preferably 7 to 20, and further preferably 7 to 12. The above-mentioned acyl group may have a substituent. Examples of the substituent include the groups listed for the substituent T described below, and are selected from the group consisting of alkyl groups, aryl groups, heterocyclic groups, halogen atoms, sulfo groups, hydroxyl groups, cyano groups, nitro groups, carboxyl groups, phosphate groups, and At least one type from the group of amine groups is preferred.

The carbon number of the alkoxycarbonyl group represented by R ^aa1 and R ^aa2 is preferably 2 to 30, more preferably 2 to 15, and further preferably 2 to 8. The alkoxycarbonyl group may have a substituent. Examples of the substituent include the groups listed for the substituent T described below, and are selected from the group consisting of alkyl groups, aryl groups, heterocyclic groups, halogen atoms, sulfo groups, hydroxyl groups, cyano groups, nitro groups, carboxyl groups, phosphate groups, and At least one type from the group of amine groups is preferred.

m1 in formula (1) represents an integer from 0 to mA, mA represents the largest integer that R ^aa1 can replace A, m2 represents an integer from 0 to mB, mB represents the largest integer that R ^aa2 can replace B, when m1 is 2 or more , two R ^aa1 out of m1 R ^aa1 can bond with each other to form a ring, and when m2 is 2 or more, two R ^aa2 out of m2 R ^aa2 can bond with each other to form a ring. For example, when A is a benzene ring, mA is 2. It is preferable that m1 and m2 are each independently an integer of 0 to 2, and 1 or 2 is more preferable.

R ^b1 to R ^b4 in the formula (1) each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, Cyl group, alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 , R ^b11 and R ^b12 each independently represent a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, and R ^b13 to R ^b21 each independently represent an alkyl group, an aryl group or a heterocyclic group.

The halogen atoms, alkoxy groups, hydroxyl groups and alkoxycarbonyl groups represented by R ^b1 to R ^b4 are the same as the halogen atoms, alkoxy groups, hydroxyl groups and alkoxycarbonyl groups represented by R ^aa1 and R ^aa2 , and the preferred range is Same thing. The alkyl group, aryl group and heterocyclic group represented by R ^b1 to R ^b4 and R ^b11 to R ^b21 are the same as the alkyl group, aryl group and heterocyclic group represented by R ^aa1 and R ^aa2 , and the preferred ranges are also the same. It is also preferable that the alkyl group represented by R ^b11 to R ^b21 is a fluoroalkyl group because the visible light transmittance and the infrared shielding property can be further improved.

In formula (1), at least one of R ^b1 and R ^b2 and at least one of R ^b3 and R ^b4 independently represent -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SO ₂ R ^b17 , - NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 are preferred, and -NHCOR ^b13 or -NHSO ₂ R ^b14 is more preferred, since it can further improve visible light transmittance and infrared shielding properties, and -NHCOR ^b13 is even more preferred. It is preferred that R ^b13 , R ^b14 , R ^b15 , R ^b17 , R ^b19 , R ^b20 and R ^b21 are each independently an alkyl group or an aryl group, and an alkyl group is more preferred, so that the visible light transmittance and infrared shielding properties can be further improved. Considering the reasons, fluoroalkyl group is further preferred.

In formula (1), one of R ^b1 and R ^b2 is -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SO ₂ R ^b17 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 , and the other is A hydrogen atom, and one of R ^b3 and R ^b4 is -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SO ₂ R ^b17 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 , and the other is a hydrogen atom Preferably, one of R ^b1 and R ^b2 is -NHCOR ^b13 or -NHSO ₂ R ^b14 , the other is a hydrogen atom, and one of R ^b3 and R ^b4 is -NHCOR ^b13 or -NHSO ₂ R ^b14 , and the other is a hydrogen atom. It is more preferred that one is a hydrogen atom, one of R ^b1 and R ^b2 is -NHCOR ^b13 and the other is a hydrogen atom, and one of R ^b3 and R ^b4 is -NHCOR ^b13 and the other is a hydrogen atom. .

Y ¹ to Y ⁴ in formula (1) each independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group or a group represented by formula (Y-1), and R ^aa1 and Y ¹ may be bonded to form a group consisting of A heterocyclic ring with a 5-membered ring or a 6-membered ring with at least one nitrogen atom, R ^aa1 and Y ² may bond to form a heterocyclic ring with a 5-membered ring or a 6-membered ring containing at least one nitrogen atom, R ^aa2 and Y ³ may bond R ^aa2 and Y ⁴ can be bonded to form a heterocyclic ring containing a 5-membered ring or a 6-membered ring containing at least one nitrogen atom, and Y ¹ and Y ² can be bonded to form a heterocyclic ring containing a 5-membered ring or a 6-membered ring containing at least one nitrogen atom, and Y ³ and Y ⁴ can be bonded to form a heterocyclic ring containing a 5-membered ring or a 6-membered ring containing at least one nitrogen atom. . Among them, at least one of Y ¹ to Y ⁴ is a group represented by formula (Y-1), and is selected from R ^aa1 and Y ¹ , R ^aa1 and Y ² , R ^aa2 and Y ³ and R ^aa2 and Y ⁴ At least one of them bonds to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom.

The alkyl group, aryl group and heterocyclic group represented by Y ¹ to Y ⁴ in the formula (1) are the same as the alkyl group, aryl group and heterocyclic group represented by R ^aa1 and R ^aa2 , and the preferred ranges are also the same.

In the formula (1), it is preferred that at least one of Y ¹ and Y ² and at least one of Y ³ and Y ⁴ be independently a group represented by the formula (Y-1).

The group represented by formula (Y-1) represented by Y ¹ to Y ⁴ of formula (1) will be described. [Chemical 10]

The wavy lines in formula (Y-1) represent bonding bonds.

Ry ¹ to Ry ⁴ in the formula (Y-1) each independently represent a hydrogen atom, an alkyl group or an aryl group. The number of carbon atoms in the alkyl group represented by Ry ¹ to Ry ⁴ is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The alkyl group may be linear, branched, or cyclic, with linear or branched chains being preferred. The above-mentioned alkyl group may have a substituent. Examples of the substituent include groups exemplified by the substituent T described below. The number of carbon atoms in the aryl group represented by Ry ¹ to Ry ⁴ is preferably 6 to 48, more preferably 6 to 22, and further preferably 6 to 12. The above-mentioned aryl group may have a substituent. Examples of the substituent include groups exemplified by the substituent T described below. Ry ¹ to Ry ⁴ are preferably hydrogen atoms.

X ¹ of formula (Y-1) is a single bond, an alkylene group, an aryl group, -O-, -S-, -NRx-, -CO-, -CS-, -SO- or -SO ₂ -, Or it means a combination of two or more selected from the group consisting of alkylene group, aryl group, -O-, -S-, -NRx-, -CO-, -CS-, -SO- and -SO ₂ - Group, Rx represents a hydrogen atom, an alkyl group or an aryl group. When Z ¹ is a group represented by formula (Z-1) or a group represented by formula (Z-4), the part in X ¹ linked to Z ¹ is an alkylene group or an aryl group.

The number of carbon atoms in the alkylene group represented by X ¹ is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The number of carbon atoms in the aryl group represented by X ¹ is preferably 6 to 48, more preferably 6 to 22, and further preferably 6 to 12. The number of carbon atoms of the alkyl group represented by Rx is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The alkyl group may be linear, branched, or cyclic, with linear or branched chains being preferred. The number of carbon atoms of the aryl group represented by Rx is preferably 6 to 48, more preferably 6 to 22, and still more preferably 6 to 12.

X ¹ of formula (Y-1) is preferably a group represented by formula (X-1). ^*1 -X ¹¹ -X ¹² -X ¹³ - ^*2 ･･････ (X-1) ^*1 and ^*2 indicate bonding bonds, and ^*2 represents the bonding bond with Z ¹ . X ¹¹ and X ¹³ independently represent single bonds, -O-, -S-, -NRx-, -NRxCO-, -CONRx-, -CO-, -OCO-, -COO-, -CS-, -SO - or -SO ₂ -, Rx represents a hydrogen atom, an alkyl group or an aryl group, X ¹² represents a single bond, an alkyl group or an aryl group. Wherein, when Z ¹ of the formula (Y-1) is a group represented by the formula (Z-1) or a group represented by the formula (Z-4), X ¹² is an alkylene group or an aryl group, and X ¹³ is a single key.

X ¹¹ and X ¹³ are each independently a single bond, -O-, -NRx-, -NRxCO-, -CONRx-, -CO-, -OCO- or preferably. X ¹² is preferably a single bond or an alkylene group.

When Z ¹ in the formula (Y-1) is an alicyclic hydrocarbon group, an aromatic hydrocarbon group or a heterocyclic group, it is preferable that X ¹³ is -O- from the viewpoint of storage stability and light resistance.

When Z ¹ of formula (Y-1) is a group represented by formula (Z-6) and W ¹ is -CO-, X ¹² is an alkylene group or an aryl group, and X ¹³ is preferably a single bond.

Z ¹ in formula (Y-1) represents an alicyclic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, or a group represented by any one of formulas (Z-1) to (Z-6).

The alicyclic hydrocarbon group represented by Z ¹ may be a monocyclic alicyclic hydrocarbon group or a polycyclic alicyclic hydrocarbon group. In addition, the polycyclic alicyclic hydrocarbon group may have a cross-linked structure or a spiro ring structure. The alicyclic hydrocarbon group may have a substituent. Examples of the substituent include the groups exemplified in the substituent T described below, and an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkoxycarbonyl group, an aryloxycarbonyl group or a acyloxy group are preferred.

The aromatic hydrocarbon group represented by Z ¹ may be a monocyclic aromatic hydrocarbon group or a condensed ring aromatic hydrocarbon group. The carbon number of the aromatic hydrocarbon group is preferably 6 to 48, more preferably 6 to 22, and still more preferably 6 to 12. The aromatic hydrocarbon group may have a substituent. Examples of the substituent include the groups exemplified in the substituent T described below, and an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkoxycarbonyl group, an aryloxycarbonyl group or a acyloxy group are preferred.

The heterocyclic group represented by Z ¹ is preferably a 5-membered ring or a 6-membered ring heterocyclic group. The heterocyclic group is preferably a monocyclic heterocyclic group or a fused cyclic heterocyclic group with a condensation number of 2 to 8, and more preferably a monocyclic heterocyclic group or a fused cyclic heterocyclic group with a condensation number of 2 to 4. Preferably, a monocyclic heterocyclic group or a fused cyclic heterocyclic group with a condensation number of 2 or 3 is further preferred. The heteroatoms constituting the ring of the heterocyclyl group are preferably nitrogen atoms, oxygen atoms or sulfur atoms. The number of heteroatoms in the ring constituting the heterocyclyl group is preferably 1 to 3, more preferably 1 to 2. The number of carbon atoms of the ring constituting the heterocyclic group is preferably 1 to 30, more preferably 1 to 18, and further preferably 1 to 12. The heterocyclic group may have a substituent. Examples of the substituent include groups exemplified by the substituent T described below.

[Chemical 11]

In formula (Z-1) to formula (Z-6), the wavy line represents a bond; in formula (Z-1), Rz ¹¹ represents an alkyl group or an aryl group; in formula (Z-2), Rz ¹² represents hydrogen atom, -COR ¹⁰⁰ or -COOR ¹⁰⁰ , R ¹⁰⁰ represents a hydrogen atom, an alkyl group or an aryl group, Rz ^12a represents an alkyl group, mz represents an integer from 0 to 4; in formula (Z-3), Rz ¹³ to Rz ¹⁶ respectively independently represents an alkyl group, and Rz ¹⁷ represents a hydrogen atom, an alkyl group or an oxygen radical; in formula (Z-4), Rz ¹⁸ and Rz ¹⁹ independently represent an alkyl group or an aryl group; in formula (Z-6), W ¹ represents a single bond, an alkylene group, an aryl group or -CO-, Rz ²⁰ represents a hydrogen atom, an alkyl group, an aryl group or -COR ¹⁰¹ , and R ¹⁰¹ represents an alkyl group or an aryl group.

Rz ¹¹ in the formula (Z-1) represents an alkyl group or an aryl group, with an alkyl group being preferred. The number of carbon atoms in the alkyl group is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The alkyl group may be linear, branched, or cyclic. In addition, the alkyl group may be unsubstituted or may have a substituent. Examples of the substituent include groups exemplified by the substituent T described below. The aryl group preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and further preferably 6 to 12 carbon atoms. In addition, the aryl group may be unsubstituted or may have a substituent. Examples of the substituent include groups exemplified by the substituent T described below.

Rz ¹² in the formula (Z-2) represents a hydrogen atom, -COR ¹⁰⁰ or -COOR ¹⁰⁰ , R ¹⁰⁰ represents a hydrogen atom, an alkyl group or an aryl group, Rz ^12a represents an alkyl group, and mz represents an integer of 0 to 4. From the viewpoint of light resistance, Rz ¹² is preferably a hydrogen atom. The alkyl group and aryl group represented by R ¹⁰⁰ are in the same range as described for Rz ¹¹ . mz represents an integer from 0 to 4, an integer from 0 to 2 is preferred, and 1 or 2 is more preferred. The number of carbon atoms in the alkyl group represented by Rz ^12a is preferably 1 to 10, more preferably 1 to 5. The alkyl group can be any one of straight chain, branched chain, and cyclic. Straight chain or branched chain is preferred, and branched chain is more preferred.

Rz ¹³ to Rz ¹⁶ in the formula (Z-3) each independently represent an alkyl group, and Rz ¹⁷ represents a hydrogen atom, an alkyl group or an oxygen radical (-O・). The number of carbon atoms in the alkyl group represented by Rz ¹³ to Rz ¹⁷ is preferably 1 to 10, more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic, with linear or branched chains being preferred.

In formula (Z-4), Rz ¹⁸ and Rz ¹⁹ each independently represent an alkyl group or an aryl group, with an aryl group being preferred. The alkyl group and aryl group represented by Rz ¹⁸ and Rz ¹⁹ are in the same range as described for Rz ¹¹ .

W ¹ in the formula (Z-6) represents a single bond, an alkylene group, an aryl group or -CO-, Rz ²⁰ represents a hydrogen atom, an alkyl group, an aryl group or -COR ¹⁰¹ , and R ¹⁰¹ represents an alkyl group or an aryl group. The number of carbon atoms in the alkylene group represented by W ¹ is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The number of carbon atoms in the aryl group represented by W ¹ is preferably 6 to 48, more preferably 6 to 22, and still more preferably 6 to 12. It is preferred that W ¹ is -CO-. Rz ²⁰ is preferably a hydrogen atom, an alkyl group or -COR ¹⁰¹ , more preferably a hydrogen atom. The alkyl group and aryl group represented by R ¹⁰¹ are in the same range as described for Rz ¹¹ .

From the viewpoint of light resistance, Z ¹ of the formula (Y-1) is preferably a group represented by any one of the formulas (Z-1) to (Z-6), and the group represented by the formulas (Z-1) to A group represented by any one of (Z-4) is more preferred, a group represented by formula (Z-2) or formula (Z-4) is still more preferred, a group represented by formula (Z-2) The group is particularly good.

When any one of Y ¹ and Y ² and any one of Y ³ and Y ⁴ in the formula (1) are each independently a group represented by the formula (Y-1), either one of Y ¹ and Y ² Z 1 in the group represented by formula (Y-1) may be the same as Z ¹ in the group represented by formula (Y- ¹ ) represented by any one of Y ³ and Y ⁴ , or Can be different. When different groups are used, from the viewpoint of light resistance, one Z ¹ is a group represented by formula (Z-1) or formula (Z-4), and the other Z ¹ is a group represented by formula (Z-2) or formula (Z -3) or formula (Z-6) is better.

Furthermore, a specific compound (compound represented by formula (1)) may have a compound in a resonance relationship. In the present invention, the specific compound (compound represented by formula (1)) also includes its resonance structure.

The specific compound is preferably a compound represented by formula (2). [Chemical 12] In formula (2), R ^a1 to R ^a4 each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, and an alkoxy group. , acyl group, alkoxycarbonyl group, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 or -OSO ₂ R ^a15 , R ^a11 and R ^a12 respectively independently represent a hydrogen atom, an alkyl group, an aryl group or a hetero Ring group, R ^a13 to R ^a15 independently represent an alkyl group, an aryl group or a heterocyclic group, R ^b1 to R ^b4 respectively independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, Phosphate group, alkyl group, aryl group, heterocyclyl group, alkoxy group, acyl group, alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , - SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 , R ^b11 and R ^b12 independently represent a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, R ^b13 ~ R ^b21 Each independently represents an alkyl group, an aryl group or a heterocyclic group, Y ¹ to Y ⁴ each independently represents a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group or a group represented by formula (Y-1), R ^a1 It can bond with Y ¹ to form a heterocyclic ring containing a 5-membered ring or a 6-membered ring containing at least one nitrogen atom. R ^a2 and Y ² can bond to form a heterocyclic ring containing a 5-membered ring or a 6-membered ring containing at least one nitrogen atom. Ring, R ^a3 and Y ³ can bond to form a 5-membered ring or a 6-membered heterocyclic ring containing at least one nitrogen atom, R ^a4 and Y ⁴ can bond to form a 5-membered ring or 6-membered ring containing at least one nitrogen atom A heterocyclic ring with 5 members, Y ¹ and Y ² can be bonded to form a 5-membered ring or a 6-membered ring containing at least one nitrogen atom, Y ³ and Y ⁴ can be bonded to form a 5-membered ring containing at least one nitrogen atom. membered ring or 6-membered ring heterocycle; wherein, at least one of Y ¹ to Y ⁴ is a group represented by formula (Y-1), and is selected from R ^a1 and Y ¹ , R ^a2 and Y ² , R ^a3 is bonded to at least one of Y ³ and R ^a4 to Y ⁴ to form a 5-membered or 6-membered heterocyclic ring containing at least one nitrogen atom.

R ^b1 to R ^b4 in the formula (2) have the same meaning as R ^b1 to R ^b4 in the formula (1). Y ¹ to Y ⁴ in the formula (2) have the same meaning as Y ¹ to Y ⁴ in the formula (1).

The halogen atom, alkoxy group, hydroxyl group and alkoxycarbonyl group represented by R ^a1 to R ^a4 of the formula (2) and the halogen atom, alkoxy group and hydroxyl group represented by R ^aa1 and R ^aa2 of the formula (2) It is the same as alkoxycarbonyl group, and the preferable range is also the same. The alkyl group, aryl group and heterocyclic group represented by R ^a1 to R ^a4 and R ^a11 to R ^a15 in the formula (2) are the same as the alkyl group, aryl group and heterocyclic group represented by the R ^aa1 and R ^aa2 of the formula (1). The ring groups are the same and the preferred ranges are also the same.

In the formula (2), at least one of R ^b1 and R ^b2 and at least one of R ^b3 and R ^b4 are independently -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SO ₂ R ^b17 , - NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 are preferred, and -NHCOR ^b13 or -NHSO ₂ R ^b14 is more preferred, since it can further improve visible light transmittance and infrared shielding properties, and -NHCOR ^b13 is even more preferred. It is preferred that R ^b13 , R ^b14 , R ^b15 , R ^b17 , R ^b19 , R ^b20 and R ^b21 are each independently an alkyl group or an aryl group, and an alkyl group is more preferred, so that the visible light transmittance and infrared shielding properties can be further improved. Considering the reasons, fluoroalkyl group is further preferred.

In formula (2), one of R ^b1 and R ^b2 is -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SO ₂ R ^b17 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 , and the other is A hydrogen atom, and one of R ^b3 and R ^b4 is -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SO ₂ R ^b17 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 , and the other is a hydrogen atom Preferably, one of R ^b1 and R ^b2 is -NHCOR ^b13 or -NHSO ₂ R ^b14 , the other is a hydrogen atom, and one of R ^b3 and R ^b4 is -NHCOR ^b13 or -NHSO ₂ R ^b14 , and the other is a hydrogen atom. It is more preferred that one is a hydrogen atom, one of R ^b1 and R ^b2 is -NHCOR ^b13 and the other is a hydrogen atom, and one of R ^b3 and R ^b4 is -NHCOR ^b13 and the other is a hydrogen atom. .

In formula (2), at least one of Y ¹ to Y ⁴ is a group represented by formula (Y-1), and is selected from R ^a1 and Y ¹ , R ^a2 and Y ² , R ^a3 and Y ³ and R ^a4 is bonded to at least one of Y ⁴ to form a 5- or 6-membered heterocyclic ring containing at least one nitrogen atom.

In the formula (2), it is preferred that at least one of Y ¹ and Y ² and at least one of Y ³ and Y ⁴ be independently a group represented by the formula (Y-1).

In formula (2), R ^a2 and Y ² are bonded to form a 5-membered ring or a 6-membered ring heterocyclic ring containing at least one nitrogen atom, and R ^a4 and Y ⁴ are bonded to form a 5-membered ring containing at least one nitrogen atom. Or a 6-membered heterocyclic ring is preferred, R ^a2 and Y ² are bonded to form a 5-membered heterocyclic ring containing at least one nitrogen atom, and R ^a4 and Y ⁴ are bonded to form a 5-membered ring containing at least one nitrogen atom. Heterocyclic rings are more preferred.

In formula (2), at least one of Y ¹ and Y ³ is a group represented by formula (Y-1) (preferably, Y ¹ and Y ³ are each independently a group represented by formula (Y-1) group), R ^a2 and Y ² bond to form a 5-membered ring or a 6-membered ring heterocyclic ring containing at least one nitrogen atom (preferably a 5-membered ring heterocyclic ring), R ^a4 and Y ⁴ bond to form a 5-membered ring or 6-membered ring heterocyclic ring containing at least one nitrogen atom. A 5-membered ring or a 6-membered heterocyclic ring (preferably a 5-membered heterocyclic ring) with at least one nitrogen atom is preferred.

The specific compound is preferably a compound represented by formula (3). [Chemical 13]

In formula (3), R ¹³ to R ¹⁷ and R ²³ to R ²⁷ respectively independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, a hetero group, and a hydrogen atom. Ring group, alkoxy group, acyl group, alkoxycarbonyl group, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 or -OSO ₂ R ^a15 , R ^a11 and R ^a12 independently represent a hydrogen atom, an alkane group, aryl or heterocyclic group, R ^a13 to R ^a15 independently represent an alkyl group, an aryl group or a heterocyclic group, R ¹¹ , R ¹² , R ²¹ and R ²² respectively independently represent a hydrogen atom, a halogen atom, a sulfonate group, hydroxyl group, cyano group, nitro group, carboxyl group, phosphate group, alkyl group, aryl group, heterocyclic group, alkoxy group, acyl group, alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 , R ^b11 and R ^b12 independently represent a hydrogen atom, an alkyl group, Aryl or heterocyclic group, R ^b13 ~ R ^b21 independently represent an alkyl group, an aryl group or a heterocyclic group, Y ¹¹ and Y ²¹ independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group or a formula (Y-1) is a group represented by formula (Y-1), and at least one of Y ¹¹ and Y ²¹ is a group represented by formula (Y-1).

The halogen atom, alkoxy group, hydroxyl group and alkoxycarbonyl group represented by R ¹³ to R ¹⁷ and R ²³ to R ²⁷ of the formula (3) is the same as the halogen atom represented by R ^aa1 and R ^aa2 of the formula (1). The alkoxy group, acyl group and alkoxycarbonyl group are the same, and the preferred ranges are also the same. The alkyl group, aryl group and heterocyclic group represented by R ¹³ to R ¹⁷ , R ²³ to R ²⁷ and R ^a11 to R ^a15 of the formula (3) and the alkyl group represented by R ^aa1 and R ^aa2 of the formula (1) , aryl group and heterocyclic group are the same, and the preferred ranges are also the same.

The halogen atom, alkoxy group, hydroxyl group and alkoxycarbonyl group represented by R ¹¹ , R ¹² , R ²¹ and R ²² of the formula (3) and the halogen atom represented by R ^b1 to R ^b4 of the formula (1), The alkoxy group, acyl group and alkoxycarbonyl group are the same, and the preferred ranges are also the same. The alkyl group, aryl group and heterocyclic group represented by R ¹¹ , R ¹² , R ²¹ , R ²² , R ^b13 to R ^b21 of the formula (3) and the alkyl group represented by R ^b1 to R ^b4 of the formula (1) , aryl group and heterocyclic group are the same, and the preferred ranges are also the same.

In formula (3), at least one of R ¹¹ and R ¹² and at least one of R ²¹ and R ²² are independently -NHCOR ^b13 or at least one of R ¹¹ and R ¹² and R ²¹ and R ²² It is preferred that at least one of them is independently -NHSO ₂ R ^b14 , and it is more preferred that at least one of R ¹¹ and R ¹² and at least one of R ²¹ and R ²² are independently -NHCOR ^b13 . Wherein, one of R ¹¹ and R ¹² is -NHCOR ^b13 and the other is a hydrogen atom, and one of R ²¹ and R ²² is -NHCOR ^b13 and the other is a hydrogen atom or one of R ¹¹ and R ¹² is -NHSO ₂ R ^b14 , the other is a hydrogen atom, and one of R ²¹ and R ²² is -NHSO ₂ R ^b14 , the other is preferably a hydrogen atom, and one of R ¹¹ and R ¹² is -NHCOR ^b13 , The other is a hydrogen atom, and one of R ²¹ and R ²² is -NHCOR ^b13 , and the other is more preferably a hydrogen atom.

The alkyl group, aryl group, heterocyclic group represented by Y ¹¹ and Y ²¹ of the formula (3) and the group represented by the formula (Y-1) and the alkyl group represented by Y ¹ to Y ⁴ of the formula (1) , aryl group, heterocyclic group and the group represented by formula (Y-1) are the same, and the preferred ranges are also the same. It is preferred that Y ¹¹ and Y ²¹ of the formula (3) are each independently a group represented by the formula (Y-1).

When Y ¹¹ and Y ²¹ of the formula (3) are each independently a group represented by the formula (Y-1), Z ¹ of the two formulas (Y-1) may be the same or different. When different groups are used, from the viewpoint of light resistance, one Z ¹ is a group represented by formula (Z-1) or formula (Z-4), and the other Z ¹ is a group represented by formula (Z-2) or formula (Z -3) or formula (Z-6) is better.

-About substituent T- Examples of the substituent T include the following groups. Halogen atom (for example, fluorine atom, chlorine atom, bromine atom, iodine atom), alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), alkenyl group (preferably an alkenyl group having 2 to 30 carbon atoms), Alkynyl group (preferably an alkynyl group having 2 to 30 carbon atoms), aryl group (preferably an aryl group having 6 to 30 carbon atoms), heterocyclic group (preferably a heterocyclic group having 1 to 30 carbon atoms), Amino group (preferably an amine group having 0 to 30 carbon atoms), alkoxy group (preferably an alkoxy group having 1 to 30 carbon atoms), aryloxy group (preferably an aryloxy group having 6 to 30 carbon atoms) ), heterocyclic oxy group (preferably a heterocyclic oxy group having 1 to 30 carbon atoms), hydroxyl group (preferably a hydroxyl group having 2 to 30 carbon atoms), alkoxycarbonyl group (preferably a hydroxyl group having 2 to 30 carbon atoms) 30 alkoxycarbonyl group), aryloxycarbonyl group (preferably an aryloxycarbonyl group with 7 to 30 carbon atoms), heterocyclicoxycarbonyl group (preferably a heterocyclicoxycarbonyl group with 2 to 30 carbon atoms), acyloxy group (preferably a acyloxy group having 2 to 30 carbon atoms), amide group (preferably a amide group having 2 to 30 carbon atoms), aminocarbonylamino group (preferably having 2 to 30 carbon atoms) aminocarbonylamino group), alkoxycarbonylamino group (preferably alkoxycarbonylamino group having 2 to 30 carbon atoms), aryloxycarbonylamino group (preferably aryloxycarbonylamino group having 7 to 30 carbon atoms) (carbonylamino group), sulfonamide group (preferably sulfonamide group with 0 to 30 carbon atoms), sulfonamide group (preferably sulfonamide group with 0 to 30 carbon atoms), Aminomethyl group (preferably an aminomethyl group having 1 to 30 carbon atoms), alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), arylthio group (preferably having 6 to 30 carbon atoms) arylthio group), heterocyclic thio group (preferably a heterocyclic thio group with 1 to 30 carbon atoms), alkylsulfonyl group (preferably an alkylsulfonyl group with 1 to 30 carbon atoms), alkyl group Sulfonylamine group (preferably an alkylsulfonylamine group having 1 to 30 carbon atoms), arylsulfonylamine group (preferably an arylsulfonylamine group having 6 to 30 carbon atoms), arylsulfonylamine group Amino group (preferably an arylsulfonylamine group with 6 to 30 carbon atoms), heterocyclic sulfonylamine group (preferably a heterocyclic sulfonylamine group with 1 to 30 carbon atoms), heterocyclic sulfonylamine group group (preferably a heterocyclic sulfenylamine group having 1 to 30 carbon atoms), an alkyl sulfinyl group (preferably an alkyl sulfinyl amine group having 1 to 30 carbon atoms), an aryl sulfenyl group (preferably an arylsulfenyl group having 6 to 30 carbon atoms), a heterocyclic sulfinyl group (preferably a heterocyclic sulfenyl group having 1 to 30 carbon atoms), ureido group (preferably an aryl sulfenyl group having a carbon number of 1 to 30 1 to 30 urea group), hydroxyl, nitro, carboxyl, sulfo, phosphate, carboxylic acid amide, sulfonyl amide, amide imide, phosphine, mercapto, cyano, alkyl sulfenyl Acid group, arylsulfinic acid group, aryl azo group, heterocyclic azo group, phosphinyl group, phosphinyloxy group, phosphinylamine group, silicon group, hydrazine group, imine group. When these groups are further substituted groups, they may further have a substituent. Examples of the substituent include the groups described for the substituent T described above.

-About specific examples- Specific examples of the specific compound include compounds having the structures shown below. Specific examples of specific compounds include resonance structures of these compounds.

[Chemical 14] [Chemical 15] [Chemical 16] [Chemical 17] [Chemical 18] [Chemical 19] [Chemistry 20] [Chemistry 21] [Chemistry 22] [Chemistry 23] [Chemistry 24] [Chemical 25] [Chemical 26] [Chemical 27] [Chemical 28] [Chemical 29] [Chemical 30]

It is preferable that the maximum absorption wavelength of the specific compound exists in the range of wavelength 650 to 1500 nm, more preferably it exists in the range of wavelength 680 to 1200 nm, and it is still more preferable that it exists in the range of wavelength 700 to 1000 nm.

(Other infrared absorbers) The composition of the present invention can contain infrared absorbers other than the above-mentioned specific compounds (other infrared absorbers). By further containing other infrared absorbers, a film capable of blocking infrared rays in a wider wavelength range can be formed. Other infrared absorbers can be dyes or pigments (particles). Examples of other infrared absorbers include pyrrolopyrrole compounds, cyanine compounds, squaraine compounds, polymethine compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, and merocyanine compounds. Compounds, ketonium compounds, oxocyanine compounds, iminium compounds, dithiol compounds, triarylmethane compounds, pyrrromethylene compounds, methimine compounds, anthraquinone compounds, dibenzofuranone compounds, disulfide compounds Alkene metal complexes, metal oxides, metal borides, etc. Examples of the pyrrolopyrrole compound include compounds described in paragraphs 0016 to 0058 of Japanese Patent Application Laid-Open No. 2009-263614, compounds described in paragraphs 0037 to 0052 of Japanese Patent Application Laid-Open No. 2011-068731, and International Publication No. 2015/ Compounds described in paragraphs 0010 to 0033 of No. 166873, etc. Examples of the squaraine compound include compounds described in paragraphs 0044 to 0049 of Japanese Patent Publication No. 2011-208101, compounds described in paragraphs 0060 to 0061 of Japanese Patent Publication No. 6065169, and International Publication No. 2016/181987. Compounds described in paragraph 0040 of Japanese Patent Application Laid-Open No. 2015-176046, compounds described in paragraph 0072 of International Publication No. 2016/190162, compounds described in paragraphs 0196 to 0228 of Japanese Patent Application Laid-Open No. 2016-074649 Compounds described, compounds described in paragraph 0124 of Japanese Patent Application Laid-Open No. 2017-067963, compounds described in International Publication No. 2017/135359, compounds described in Japanese Patent Application Publication No. 2017-114956, Japanese Patent Application No. 6197940 Compounds described in, Compounds described in International Publication No. 2016/120166, etc. Examples of the cyanine compound include compounds described in paragraphs 0044 to 0045 of Japanese Patent Application Laid-Open No. 2009-108267, compounds described in paragraphs 0026 to 0030 of Japanese Patent Application Publication No. 2002-194040, and compounds described in Japanese Patent Application Laid-Open No. 2015-172004. Compounds described in Japanese Patent Application Publication No. 2015-172102, Compounds described in Japanese Patent Application Publication No. 2008-088426, Compounds described in Paragraph 0090 of International Publication No. 2016/190162, Japanese Patent Application Publication No. 2016/190162 Compounds etc. described in the publication No. 2017-031394. Examples of the polymethine compound include compounds described in Japanese Patent Application Laid-Open No. 2021-134350, compounds described in International Publication No. 2021/085372, and the like. Examples of the crotonium compound include compounds described in Japanese Patent Application Laid-Open No. 2017-082029. Examples of the immonium compound include compounds described in Japanese Patent Application Publication No. 2008-528706, compounds described in Japanese Patent Application Publication No. 2012-012399, compounds described in Japanese Patent Application Publication No. 2007-092060, and International Publications. Compounds described in paragraphs 0048 to 0063 of No. 2018/043564. Examples of the phthalocyanine compound include the compound described in paragraph 0093 of Japanese Patent Application Laid-Open No. 2012-077153, titanyl phthalocyanine described in Japanese Patent Application Laid-Open No. 2006-343631, and 0013 of Japanese Patent Application Laid-Open No. 2013-195480. The compound described in paragraph ～0029, the vanadium phthalocyanine compound described in Japanese Patent No. 6081771, and the compound described in International Publication No. 2020/071470. Examples of the naphthalocyanine compound include compounds described in paragraph 0093 of Japanese Patent Application Laid-Open No. 2012-077153. Examples of the disulfene metal complex include compounds described in Japanese Patent No. 5733804. Examples of metal oxides include indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, tungsten oxide, and the like. For details about tungsten oxide, you can refer to paragraph 0080 of Japanese Patent Application Laid-Open No. 2016-006476, and this content is incorporated into this specification. Examples of the metal boride include lanthanum boride and the like. Examples of commercially available lanthanum boride include LaB ₆ -F (manufactured by Japan New Metals Co., Ltd.). In addition, as the metal boride, the compound described in International Publication No. 2017/119394 can also be used. Examples of commercially available products of indium tin oxide include F-ITO (manufactured by DOWA HIGHTECH CO., LTD.).

Moreover, as an infrared absorber, the squarylium compound described in Japanese Patent Application Laid-Open No. 2017-197437, the squarylium compound described in Japanese Patent Application Laid-Open No. 2017-025311, and the squarylium compound described in International Publication No. 2016/154782 can also be used. Squarylium compounds described in Japanese Patent No. 5884953, squarylyanine compounds described in Japanese Patent No. 6036689, squarylyanine compounds described in Japanese Patent No. 5810604, International Squarylium compounds described in paragraphs 0090 to 0107 of Publication No. 2017/213047, pyrrole ring-containing compounds described in paragraphs 0019 to 0075 of Japanese Patent Application Laid-Open No. 2018-054760, and 0078 of Japanese Patent Application Laid-Open No. 2018-040955 Pyrrole ring-containing compounds described in paragraphs 0082 to 0082, pyrrole ring-containing compounds described in paragraphs 0043 to 0069 of Japanese Patent Application Laid-Open No. 2018-002773, and pyrrole ring-containing compounds described in paragraphs 0024 to 0086 of Japanese Patent Application Laid-Open No. 2018-041047 Squarylyanine compounds having an aromatic ring at the α position of the amine, amide-linked squarylyanine compounds described in Japanese Patent Application Laid-Open No. 2017-179131, squarylyanine compounds having a pyrrole double type described in Japanese Patent Application Publication No. 2017-141215 Compounds with skeleton or ketonium skeleton, dihydrocarbazole bisquaryl cyanine compound described in Japanese Patent Application Laid-Open No. 2017-082029, asymmetric type described in paragraphs 0027 to 0114 of Japanese Patent Application Laid-Open No. 2017-068120 Compounds, pyrrole ring-containing compounds (carbazole type) described in Japanese Patent Publication No. 2017-067963, phthalocyanine compounds described in Japanese Patent No. 6251530, etc.

As another infrared absorber, tungsten oxide represented by the following formula described in paragraph 0025 of European Patent No. 3628645 can also be used. M ¹ _a M ² _b W _c O _d (P(O) _n R _m ) _e M ¹ and M ² represent ammonium cations or metal cations, a is 0.01 to 0.5, b is 0 to 0.5, c is 1, and d is 2.5 to 3, e is 0.01 to 0.75, n is 1, 2 or 3, m is 1, 2 or 3, and R represents a hydrocarbon group which may have a substituent.

In the total solid content of the composition, the content of the infrared absorber is preferably 0.1 mass% or more, more preferably 0.5 mass% or more, further preferably 3 mass% or more, and particularly preferably 5 mass% or more. Moreover, the upper limit of the content of the infrared absorber is preferably 50 mass% or less, more preferably 40 mass% or less, and further preferably 30 mass% or less. In the total solid content of the composition, the content of the specific compound is preferably 0.1 mass% or more, more preferably 0.5 mass% or more, further preferably 3 mass% or more, and particularly preferably 5 mass% or more. Furthermore, the upper limit of the content of the specific compound is preferably 50 mass% or less, more preferably 40 mass% or less, and still more preferably 30 mass% or less. The composition of the present invention may contain only one specific compound, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range. When the composition of the present invention contains other infrared absorbers, the content of the other infrared absorbers is preferably 1 to 1000 parts by mass, more preferably 3 to 500 parts by mass, and 5 to 300 parts by mass relative to 100 parts by mass of the above-mentioned specific compound. Parts by mass are more preferable. The composition of the present invention may contain only one type of other infrared absorber, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range.

＜＜Hardening compound＞＞ The composition of the present invention contains a curable compound. Examples of curable compounds include polymerizable compounds, resins, and the like. The resin may be a non-polymerizable resin (a resin without a polymerizable group) or a polymerizable resin (a resin with a polymerizable group). Examples of the polymerizable group include a group containing an ethylenically unsaturated bond, a cyclic ether group, a hydroxymethyl group, an alkoxymethyl group, and the like. Examples of the group containing an ethylenically unsaturated bond include vinyl, vinylphenyl, (meth)allyl, (meth)acrylyl, (meth)acryloxy, and (meth)acrylyl. ) acrylamide group, etc., (meth)allyl, (meth)acrylyl and (meth)acryloxy groups are preferred, and (meth)acryloxy group is more preferred. Examples of the cyclic ether group include an epoxy group, an oxybutanyl group, and the like, with an epoxy group being preferred.

As the curing compound, it is preferable to use one containing at least resin. Furthermore, when the composition of the present invention is used as a composition for photolithography, it is preferable to use a resin and a polymerizable compound (preferably a polymerizable monomer as a monomer type polymerizable compound) as the curable compound. Resins and polymerizable monomers (monomer type polymerizable compounds) having a group containing an ethylenically unsaturated bond are more preferred.

(polymeric compound) Examples of the polymerizable compound include compounds having an ethylenically unsaturated bond-containing group, compounds having a cyclic ether group, compounds having a hydroxymethyl group, and compounds having an alkoxymethyl group. A compound having an ethylenically unsaturated bond-containing group can be preferably used as a radically polymerizable compound. Moreover, the compound which has a cyclic ether group can be suitably used as a cationic polymerizable compound.

Examples of resin-type polymerizable compounds include resins containing repeating units having a polymerizable group.

The molecular weight of the monomer-type polymerizable compound (polymerizable monomer) is preferably less than 2,000, and more preferably not more than 1,500. The lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, and more preferably 200 or more. The weight average molecular weight (Mw) of the resin type polymerizable compound is preferably 2,000 to 2,000,000. The upper limit of the weight average molecular weight is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit of the weight average molecular weight is preferably 3,000 or more, and more preferably 5,000 or more.

Furthermore, the compound having an ethylenically unsaturated bond-containing group as the polymerizable monomer is preferably a 3- to 15-functional (meth)acrylate compound, and a 3- to 6-functional (meth)acrylate compound is preferably Better. Specific examples include Paragraphs 0095 to 0108 of Japanese Patent Application Laid-Open No. 2009-288705, Paragraph 0227 of Japanese Patent Application Laid-Open No. 2013-029760, Paragraphs 0254 to 0257 of Japanese Patent Application Laid-Open No. 2008-292970, and Paragraphs 0254 to 0257 of Japanese Patent Application Laid-Open No. 2008-292970. Paragraphs 0034 to 0038 of Publication No. 2013-253224, Paragraph 0477 of Japanese Patent Publication No. 2012-208494, Japanese Patent Publication No. 2017-048367, Japanese Patent Publication No. 6057891, Japanese Patent Publication No. 6031807, Japanese Patent Publication No. 2017 -Compounds described in Publication No. 194662, the contents of which are incorporated into this specification.

Examples of the compound having an ethylenically unsaturated bond-containing group include dipenterythritol tri(meth)acrylate (commercially available as KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), Neopenterythritol tetra(meth)acrylate (commercially available as KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), dineopenterythritol penta(meth)acrylate (commercially available as KAYARAD D -310; manufactured by Nippon Kayaku Co., Ltd.), dipenterythritol hexa(meth)acrylate (commercially available product is KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., NK ESTER A-DPH-12E; SHIN-NAKAMURA CHEMICAL Co., Ltd.) and compounds in which the (meth)acrylyl groups of these compounds are bonded via ethylene glycol and/or propylene glycol residues (for example, commercially available from SARTOMER Company, Inc. Products SR454, SR499), etc. Furthermore, as a compound having an ethylenically unsaturated bond-containing group, diglycerol EO (ethylene oxide) modified (meth)acrylate (commercially available as M-460; TOAGOSEI CO., LTD. .), neopentyl tetraacrylate (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd., NK ESTER A-TMMT), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), ARONIX TO-2349 (manufactured by TOAGOSEI CO., LTD.), NK Oligo UA-7200 (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), 8UH-1006, 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), LIGHT ACRYLATE POB-A0 (manufactured by KYOEISHA CHEMICAL Co., Ltd.), etc.

Furthermore, as the compound having an ethylenically unsaturated bond-containing group, trimethylolpropane tri(meth)acrylate, trimethylolpropane epoxypropane-modified tri(meth)acrylate, and trihydroxypropane tri(meth)acrylate are used. Methylpropane ethylene oxide modified tri(meth)acrylate, isocyanuric acid ethylene oxide modified tri(meth)acrylate, neopentylerythritol tri(meth)acrylate, etc. 3 functional (Meth)acrylate compounds are also preferred. Commercially available products of trifunctional (meth)acrylate compounds include ARONIX M-309, M-310, M-321, M-350, M-360, M-313, M-315, and M-306 , M-305, M-303, M-452, M-450 (manufactured by TOAGOSEI CO., LTD.), NK ESTER A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A- TMM-3L, A-TMM-3LM-N, A-TMPT, TMPT (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (Nippon Made by Kayaku Co., Ltd.) etc.

The compound having an ethylenically unsaturated bond-containing group may further have an acid group such as a carboxyl group, a sulfo group, or a phosphate group. Commercially available products of such compounds include ARONIX M-305, M-510, M-520, ARONIX TO-2349 (manufactured by TOAGOSEI CO., LTD.), and the like.

As the compound having an ethylenically unsaturated bond-containing group, a compound having a caprolactone structure can also be used. Regarding the compound having a caprolactone structure, the description in paragraphs 0042 to 0045 of Japanese Patent Application Laid-Open No. 2013-253224 can be referred to, and the content is incorporated into this specification. Examples of compounds having a caprolactone structure include commercially available products DPCA-20, DPCA-30, DPCA-60, and DPCA-120 from Nippon Kayaku Co., Ltd.

As the compound having an ethylenically unsaturated bond-containing group, a compound having an ethylenically unsaturated bond-containing group and an alkyloxy group can also be used. Such compounds are preferably compounds having a group containing an ethylenically unsaturated bond and a vinyloxy group and/or a propyleneoxy group, and more preferably a compound having a group containing an ethylenically unsaturated bond and an vinyloxy group. Preferable, 3-6 functional (meth)acrylate compounds having 4-20 vinyloxy groups are further preferred. Examples of commercially available products include SR-494, a tetrafunctional (meth)acrylate having four vinyloxy groups manufactured by SARTOMER Company, Inc., and SR-494, a tetrafunctional (meth)acrylate having three isobutoxy groups manufactured by Nippon Kayaku Co., Ltd. 3-functional (meth)acrylate KAYARAD TPA-330, etc.

As the compound having an ethylenically unsaturated bond-containing group, a polymerizable compound having a fluorine skeleton can also be used. Examples of commercially available products include OGSOL EA-0200 and EA-0300 ((meth)acrylate monomer having a fluorine skeleton, manufactured by Osaka Gas Chemicals Co., Ltd.).

As the compound having an ethylenically unsaturated bond-containing group, it is also preferred to use a compound that does not substantially contain environmentally controlled substances such as toluene. Commercially available products of such compounds include KAYARAD DPHA LT, KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.), and the like.

Examples of the compound having a cyclic ether group include compounds having an epoxy group, compounds having an oxybutanyl group, and the like, and compounds having an epoxy group are preferred. Examples of the compound having an epoxy group include compounds having 1 to 100 epoxy groups in one molecule. The upper limit of the number of epoxy groups can be set to 10 or less, for example, or 5 or less. The lower limit of the number of epoxy groups is preferably 2 or more.

The compound with a cyclic ether group may be a low molecular compound (for example, the molecular weight is less than 1000), or it may be a macromolecule compound (for example, the molecular weight is 1000 or more, and in the case of a polymer, the weight average molecular weight is 1000 or more ). The weight average molecular weight of the cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and still more preferably 3,000 or less.

As the compound having a cyclic ether group, compounds described in paragraphs 0034 to 0036 of Japanese Patent Application Publication No. 2013-011869, compounds described in paragraphs 0147 to 0156 of Japanese Patent Application Publication No. 2014-043556, and compounds described in Japanese Patent Application Publication No. 2014-043556 can also be used. Compounds described in paragraphs 0085 to 0092 of Japanese Patent Application Publication No. 2014-089408, and compounds described in Japanese Patent Application Publication No. 2017-179172.

Examples of commercially available compounds having a cyclic ether group include DENACOL EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX -850L, EX-850 (the above are made by Nagase ChemteX Corporation), ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, EP-4011S (the above are made by ADEKA CORPORATION), NC-2000, NC-3000, NC- 7300, P ACA 200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z300, ACA Z320 (the above are made by Daicel Corporation), jER1031S, jER157S65, jER152, jER154, jER157S70 (the above are made by Mitsubishi Chemical Corporation), ARONE OXETANE OXT-121, OXT-221, OX-SQ, PNOX (the above are manufactured by TOAGOSEI CO., LTD.), ADEKA GLYCIROL ED-505 (manufactured by ADEKA CORPORATION, containing epoxy monomer), Marproof G-0150M, G-0105SA, G- 0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (manufactured by NOF CORPORATION, containing epoxy polymer), OXT-101, OXT-121, OXT-212, OXT-221 (the above are manufactured by TOAGOSEI CO., LTD., oxygen-containing cyclobutane monomer), OXE-10, OXE-30 (the above are manufactured by OSAKA ORGANIC CHEMICAL INDUSTRY LTD., oxygen-containing cyclobutane) alkyl monomer), etc.

Examples of the compound having a hydroxymethyl group (hereinafter also referred to as a hydroxymethyl compound) include a compound in which a hydroxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Examples of the compound having an alkoxymethyl group (hereinafter also referred to as an alkoxymethyl compound) include a compound in which an alkoxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. As a compound in which alkoxymethyl or hydroxymethyl is bonded to a nitrogen atom, alkoxymethylated melamine, hydroxymethylated melamine, alkoxymethylated benzoguanamine, hydroxymethylated benzoguanamine Amine, alkoxymethylated glycoluril, hydroxymethylated glycoluril, alkoxymethylated urea, hydroxymethylated urea, etc. are preferred. In addition, compounds described in paragraphs 0134 to 0147 of Japanese Patent Application Laid-Open No. 2004-295116 and paragraphs 0095 to 0126 of Japanese Patent Application Laid-Open No. 2014-089408 can also be used.

(resin) The composition of the present invention can use resin as the curable compound. It is preferable to use a curable compound containing at least resin. The resin is used, for example, to disperse pigments in the composition and to be used as a binder. Furthermore, resins mainly used to disperse pigments and the like in compositions are also called dispersants. However, this type of use of the resin is an example, and the resin can be used for purposes other than such uses. Furthermore, a resin having a polymerizable group also corresponds to a polymerizable compound.

The weight average molecular weight of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, and even more preferably 500,000 or less. A lower limit of 4,000 or more is preferred, and a lower limit of 5,000 or more is even better.

Examples of the resin include (meth)acrylic resin, epoxy resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polystyrene resin, polyetherstyrene resin, polyphenylene resin, Polyarylene ether phosphine oxide resin, polyimide resin, polyamide resin, polyamide imine resin, polyolefin resin, cycloolefin resin, polyester resin, styrene resin, vinyl acetate resin, poly Vinyl alcohol resin, polyvinyl acetal resin, polyurethane resin, polyurea resin, etc. Among these resins, one type may be used alone, or two or more types may be mixed and used. As the cyclic olefin resin, norbornene resin is preferred from the viewpoint of improving heat resistance. Examples of commercially available norbornene resins include the ARTON series (for example, ARTON F4520) manufactured by JSR Corporation. In addition, as the resin, the resin described in the Examples of International Publication No. 2016/088645, the resin described in Japanese Patent Application Laid-Open No. 2017-057265, the resin described in Japanese Patent Application Laid-Open No. 2017-032685, and the Japanese Patent Application Publication No. 2017-032685 can also be used. The resin described in Japanese Patent Application Publication No. 2017-075248, the resin described in Japanese Patent Application Publication No. 2017-066240, the resin described in Japanese Patent Application Publication No. 2017-167513, the resin described in Japanese Patent Application Publication No. 2017-173787 , the resin described in paragraphs 0041 to 0060 of Japanese Patent Application Laid-Open No. 2017-206689, the resin described in paragraphs 0022 to 0071 of Japanese Patent Application Publication No. 2018-010856, and the capping described in Japanese Patent Application Laid-Open No. 2016-222891 Polyisocyanate resin, resin described in Japanese Patent Application Publication No. 2020-122052, resin described in Japanese Patent Application Publication No. 2020-111656, resin described in Japanese Patent Application Publication No. 2020-139021, Japanese Patent Application Publication No. 2017-138503 The resin described in the publication contains a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain. In addition, as the resin, a resin having a skeleton can also be suitably used. Regarding the resin having a tungsten skeleton, reference can be made to the description of U.S. Patent Application Publication No. 2017/0102610, which content is incorporated into this specification. In addition, as the resin, the resin described in paragraphs 0199 to 0233 of Japanese Patent Application Laid-Open No. 2020-186373, the alkali-soluble resin described in Japanese Patent Application Laid-Open No. 2020-186325, and Korean Patent Publication No. 10-2020-0078339 can also be used. The resin represented by Formula 1 described in the Japanese Patent Application Publication No. 2021-134350.

As the resin, it is preferable to use a resin having an acid group. Examples of acidic groups include carboxyl groups, phosphate groups, sulfo groups, phenolic hydroxyl groups, and the like. There may be only one type of these acid groups, or two or more types. Resins with acid groups can also be used as dispersants. The acid value of the resin with acid groups is preferably 30 to 500 mgKOH/g. The lower limit is preferably 50 mgKOH/g or more, and more preferably 70 mgKOH/g or more. The upper limit is preferably 400 mgKOH/g or less, more preferably 200 mgKOH/g or less, further preferably 150 mgKOH/g or less, and most preferably 120 mgKOH/g or less.

The resin includes a resin containing a repeating unit derived from a compound represented by formula (ED1) and/or a compound represented by formula (ED2) (hereinafter, these compounds may also be referred to as "ether dimers"). Also better.

[Chemical 31]

In the formula (ED1), R ¹ and R ² each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent. [Chemical 32] In formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. As a specific example of the formula (ED2), reference can be made to the description of Japanese Patent Application Laid-Open No. 2010-168539.

Regarding specific examples of the ether dimer, reference can be made to paragraph 0317 of Japanese Patent Application Laid-Open No. 2013-029760, and this content is incorporated into this specification.

As the resin, it is also preferable to use a resin having a polymerizable group. The polymerizable group is preferably a group containing an ethylenically unsaturated bond and a cyclic ether group, and more preferably a group containing an ethylenically unsaturated bond.

As the resin, it is also preferable to use a resin containing a repeating unit derived from a compound represented by formula (X). [Chemical 33] In the formula, R ¹ represents a hydrogen atom or a methyl group, R ²¹ and R ²² each independently represent an alkylene group, and n represents an integer of 0 to 15. The number of carbon atoms in the alkylene group represented by R ²¹ and R ²² is preferably from 1 to 10, more preferably from 1 to 5, further preferably from 1 to 3, and particularly preferably 2 or 3. n represents an integer of 0 to 15, and an integer of 0 to 5 is preferred, an integer of 0 to 4 is more preferred, and an integer of 0 to 3 is further preferred.

Examples of the compound represented by formula (X) include ethylene oxide or propylene oxide modified (meth)acrylate of para-cumyl phenol. Examples of commercially available products include ARONIX M-110 (manufactured by TOAGOSEI CO., LTD.) and the like.

The resin preferably contains a resin as a dispersant. Examples of the dispersant include acidic dispersants (acidic resins) and alkaline dispersants (basic resins). Here, the acidic dispersant (acidic resin) means a resin in which the amount of acid groups is greater than the amount of base groups. As an acidic dispersant (acidic resin), when the total amount of acid groups and base amounts is 100 mol%, a resin having an acid group amount of 70 mol% or more is preferred. The acid group of the acidic dispersant (acidic resin) is preferably a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH/g. In addition, the alkaline dispersant (alkaline resin) means a resin in which the amount of base groups is greater than the amount of acid groups. As an alkaline dispersant (alkaline resin), when the total amount of acid groups and bases is 100 mol%, a resin in which the amount of bases exceeds 50 mol% or more is preferred. The alkaline dispersant preferably has an amine group as its base.

It is also preferred that the resin used as the dispersant is a graft resin. Regarding the details of the graft resin, reference can be made to the description in paragraphs 0025 to 0094 of Japanese Patent Application Laid-Open No. 2012-255128, and this content is incorporated into this specification.

The resin used as a dispersant is also preferably a polyimine-based dispersant containing a nitrogen atom in at least one of the main chain and side chain. As the polyimine-based dispersant, a resin having a main chain and a side chain and having a basic nitrogen atom in at least one of the main chain and the side chain is preferred, and the main chain includes a partial structure having a functional group of pKa14 or less. , the number of atoms in the side chain is 40 to 10,000. The basic nitrogen atom is not particularly limited as long as it is a basic nitrogen atom. Regarding the polyimine-based dispersant, the descriptions in paragraphs 0102 to 0166 of Japanese Patent Application Laid-Open No. 2012-255128 can be referred to, and this content is incorporated into this specification.

It is also preferred that the resin used as the dispersant has a structure in which a plurality of polymer chains are bonded to the core. Examples of such resins include dendritic polymers (including star polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of Japanese Patent Application Laid-Open No. 2013-043962.

The resin used as a dispersant is also preferably a resin containing a repeating unit having a group containing an ethylenically unsaturated bond in the side chain. The content of the repeating unit having an ethylenically unsaturated bond-containing group in the side chain among all the repeating units of the resin is preferably 10 mol% or more, more preferably 10 to 80 mol%, and 20 to 70 mol%. For further improvement.

In addition, as the dispersant, the resin described in Japanese Patent Application Laid-Open No. 2018-087939 and the block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6432077 can also be used. ), the polyethyleneimine having a polyester side chain described in International Publication No. 2016/104803, the block copolymer described in International Publication No. 2019/125940, the polyethylene imine described in Japanese Patent Application Laid-Open No. 2020-066687 Block polymers with acrylamide structural units, block polymers with acrylamide structural units described in Japanese Patent Application Laid-Open No. 2020-066688, etc.

Dispersants are also available as commercial products, and specific examples thereof include DISPERBYK series manufactured by BYK-Chemie GmbH, SOLSPERSE series manufactured by Japan Lubrizol Corporation, Efka series manufactured by BASF Corporation, and Ajinomoto Fine-Techno Co., Inc. Ajispar series etc. In addition, the products described in Paragraph 0129 of Japanese Patent Application Laid-Open No. 2012-137564 and the products described in Paragraph 0235 of Japanese Patent Application Laid-Open No. 2017-194662 can also be used as the dispersant.

The content of the curable compound is preferably 1 to 95% by mass in the total solid content of the composition. The lower limit is preferably 2 mass% or more, more preferably 5 mass% or more, further preferably 7 mass% or more, and 10 mass% or more is particularly preferred. The upper limit is preferably 94 mass% or less, more preferably 90 mass% or less, further preferably 85 mass% or less, and particularly preferably 80 mass% or less.

When the composition of the present invention contains a polymerizable compound as a curable compound, the content of the polymerizable compound is preferably 1 to 85% by mass in the total solid content of the composition. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and still more preferably 5 mass% or more. The upper limit is preferably 80 mass% or less, and more preferably 70 mass% or less.

When the composition of the present invention contains a polymerizable monomer as a curable compound, the content of the polymerizable monomer is preferably 1 to 50% by mass in the total solid content of the composition. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and still more preferably 5 mass% or more. The upper limit is preferably 30 mass% or less, and more preferably 20 mass% or less.

When the composition of the present invention contains a compound having an ethylenically unsaturated bond-containing group as the curing compound, the content of the compound having an ethylenically unsaturated bond-containing group in the total solid content of the composition is 1 to 70 Mass% is better. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and still more preferably 5 mass% or more. The upper limit is preferably 65 mass% or less, and more preferably 60 mass% or less.

When the composition of the present invention contains a compound having a cyclic ether group as the curing compound, the content of the compound having a cyclic ether group is preferably 1 to 95% by mass in the total solid content of the composition. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and still more preferably 5 mass% or more. The upper limit is preferably 80 mass% or less, more preferably 70 mass% or less, and still more preferably 60 mass% or less.

When the composition of the present invention contains a resin as a curable compound, the content of the resin is preferably 1 to 85% by mass of the total solid content of the composition. The lower limit is preferably 2 mass% or more, more preferably 5 mass% or more, further preferably 7 mass% or more, and 10 mass% or more is particularly preferred. The upper limit is preferably 80 mass% or less, more preferably 75 mass% or less, further preferably 70 mass% or less, and particularly preferably 40 mass% or less.

When the composition of the present invention contains a resin as a dispersant, the content of the resin as a dispersant is preferably 0.1 to 40% by mass in the total solid content of the composition. The upper limit is preferably 25% by mass or less, and further preferably 20% by mass or less. It is more preferable that the lower limit is 0.5 mass % or more, and it is further more preferable that it is 1 mass % or more. In addition, the content of the resin as a dispersant is preferably 1 to 100 parts by mass relative to 100 parts by mass of the pigment. The upper limit is preferably 80 parts by mass or less, and more preferably 75 parts by mass or less. The lower limit is preferably 2.5 parts by mass or more, and more preferably 5 parts by mass or more.

The composition of the present invention may contain only one type of curable compound, or may contain two or more types. When two or more types of curable compounds are contained, the total amount is preferably within the above range.

＜＜Solvent＞＞ The composition of the present invention contains a solvent. Examples of the solvent include water and organic solvents, with organic solvents being preferred. Examples of the organic solvent include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, hydrocarbon solvents, and the like. For details, please refer to paragraph 0223 of International Publication No. 2015/166779, which is incorporated into this specification. Furthermore, ester-based solvents substituted with cyclic alkyl groups and ketone-based solvents substituted with cyclic alkyl groups can also be suitably used. Specific examples of the organic solvent include polyethylene glycol monomethyl ether, methylene chloride, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, and ethylcelusacetate. , Ethyl lactate, diglyme, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone , 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate , butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropylamide, 3-butoxy-N,N- Dimethylpropamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, γ-butyrolactone, cycloterine, anisole, 1,4-diethyloxy Butane, diethylene glycol monoethyl ether acetate, 1,3-butanediol diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as 4-hydroxy-4-methyl-2 -pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, isopropyl alcohol, etc. However, sometimes it is better to reduce the number of aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) used as organic solvents for environmental reasons (for example, it can be set to 50 mass based on the total amount of organic solvents). ppm (parts per million: parts per million) or less, it can also be set to 10 mass ppm or less, or it can be set to 1 mass ppm or less).

In the present invention, it is preferable to use an organic solvent with a small metal content. It is preferable that the metal content of the organic solvent is, for example, 10 mass ppb (parts per billion: parts per billion) or less. Organic solvents of ppt (parts per trillion) quality level can be used as needed, and such organic solvents are provided by Toyo Gosei Co., Ltd., for example (Chemical Industry Daily, November 13, 2015).

Examples of methods for removing impurities such as metals from organic solvents include distillation (molecular distillation, thin film distillation, etc.) or filtration using a filter. The filter pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and further preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene or nylon.

Organic solvents can contain isomers (compounds with the same number of atoms but different structures). In addition, the isomer may contain only one type or a plurality of types.

It is preferable that the content rate of peroxide in the organic solvent is 0.8 mmol/L or less, and it is more preferable that it does not contain peroxide substantially.

The content of the solvent in the composition is preferably 10 to 97% by mass. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, more preferably 50% by mass or more, still more preferably 60% by mass or more, and particularly preferably 70% by mass or more. The upper limit is preferably 96 mass% or less, and more preferably 95 mass% or less. The composition may contain only one type of solvent, or may contain two or more types of solvents. When two or more types are included, the total amount is preferably within the above range.

＜＜Pigment Derivatives＞＞ The composition of the present invention can further contain a pigment derivative. Pigment derivatives can be used as dispersing aids. Examples of dye derivatives include compounds having a structure in which an acid group or a base is bonded to the dye skeleton.

Examples of the pigment skeleton constituting the pigment derivative include squarylyanine pigment skeleton, pyrrolopyrrole pigment skeleton, diketopyrrolopyrrole pigment skeleton, quinacridone pigment skeleton, anthraquinone pigment skeleton, bisanthrone pigment skeleton, and benzene pigment skeleton. Isoindole pigment skeleton, thi𠯤indigo pigment skeleton, azo pigment skeleton, quinoline yellow pigment skeleton, phthalocyanine pigment skeleton, naphthalocyanine pigment skeleton, di-㗁𠯤 pigment skeleton, perylene pigment skeleton, purpurone pigment skeleton , benzimidazolone pigment skeleton, benzothiazole pigment skeleton, benzimidazole pigment skeleton and benzoethazole pigment skeleton, squaraine pigment skeleton, pyrrolopyrrole pigment skeleton, diketopyrrolopyrrole pigment skeleton, phthalocyanine pigment The skeleton, quinacridone pigment skeleton and benzimidazolone pigment skeleton are preferred, and the squaraine pigment skeleton and pyrrolopyrrole pigment skeleton are even better.

Examples of the acid group include a carboxyl group, a sulfo group, a phosphoric acid group, a boric acid group, a carboxylic acid amide group, a sulfonamide group, a amide acid group, and salts thereof. Examples of atoms or atomic groups constituting the salt include alkali metal ions (Li ⁺ , Na ⁺ , K ^{+ ,} etc.), alkaline earth metal ions (Ca ²⁺ , Mg ^{2+ ,} etc.), ammonium ions, imidazolium ions, and pyridinium ions, phosphonium ions, etc. As the carboxylic acid amide group, a group represented by -NHCOR ^A1 is preferred. As the sulfonamide group, a group represented by -NHSO ₂ R ^A2 is preferred. As the amide acid group, a group represented by -SO ₂ NHSO ₂ R ^A3 , -CONHSO ₂ R ^A4 , -CONHCOR ^A5 or -SO ₂ NHCOR ^A6 is preferred, and -SO ₂ NHSO ₂ R ^A3 is more preferred. R ^A1 to R ^A6 each independently represent an alkyl group or an aryl group. The alkyl group and aryl group represented by R ^A1 to R ^A6 may have a substituent. As the substituent, a halogen atom is preferred, and a fluorine atom is more preferred.

Examples of the base include an amino group, a pyridyl group and a salt thereof, a salt of an ammonium group, and a phthalimide methyl group. Examples of atoms or atomic groups constituting the salt include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, phenoxide ions, and the like.

Specific examples of the dye derivatives include compounds described in the Examples described below. Furthermore, Japanese Patent Application Laid-Open No. Sho 56-118462, Japanese Patent Application Laid-Open No. Sho 63-264674, Japanese Patent Application Laid-Open No. 01-217077, Japanese Patent Application Laid-Open No. 03-009961, and Japanese Patent Application Laid-Open No. 03-026767 can also be cited. Japanese Patent Application Publication No. 03-153780, Japanese Patent Application Publication No. 03-045662, Japanese Patent Application Publication No. 04-285669, Japanese Patent Application Publication No. 06-145546, Japanese Patent Application Publication No. 06-212088, Japanese Patent Application Publication No. 06-212088, Kaihei Publication No. 06-240158, Japanese Patent Application Publication No. 10-030063, Japanese Patent Application Publication No. 10-195326, paragraphs 0086 to 0098 of International Publication No. 2011/024896, paragraphs 0063 to 0094 of International Publication No. 2012/102399 The compounds described in are incorporated into this specification.

The content of the pigment derivative is preferably 1 to 50 parts by mass based on 100 parts by mass of the pigment. The lower limit value is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, and more preferably 30 parts by mass or less. Only one type of pigment derivative may be used, or two or more types may be used. When two or more types are used, the total amount is preferably within the above range.

＜＜Photopolymerization initiator＞＞ When the composition of the present invention contains a polymerizable compound, it is preferred that the composition of the present invention further contains a photopolymerization initiator. The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, compounds that are photosensitive to light in the ultraviolet range to the visible range are preferred. The photopolymerization initiator is preferably a photoradical polymerization initiator.

Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (for example, compounds having a trioxadiazole skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbisimidazole compounds, oxime compounds, organic Peroxides, sulfur compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. From the viewpoint of exposure sensitivity, photopolymerization initiators include trihalomethyl trisulfide compounds, benzyldimethyl ketal compounds, α-hydroxyketone compounds, α-aminoketone compounds, acylphosphine compounds, and phosphine oxides. Compounds, metallocene compounds, oxime compounds, hexaarylbisimidazole compounds, onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene-benzene-iron complexes, halomethyl compounds The oxadiazole compound and the 3-aryl substituted coumarin compound are preferred, and the compound selected from the group consisting of oxime compounds, α-hydroxyketone compounds, α-aminoketone compounds and acylphosphine compounds is more preferred, and the oxime compound is Better still. Examples of the photopolymerization initiator include compounds described in paragraphs 0065 to 0111 of Japanese Patent Application Laid-Open No. 2014-130173, compounds described in Japanese Patent Publication No. 6301489, and MATERIAL STAGE 37 to 60p, vol. 19 , the peroxide-based photopolymerization initiator described in No. 3, 2019, the photopolymerization initiator described in International Publication No. 2018/221177, the photopolymerization initiator described in International Publication No. 2018/110179 , the photopolymerization initiator described in Japanese Patent Application Publication No. 2019-043864, the photopolymerization initiator described in Japanese Patent Application Publication No. 2019-044030, the peroxide system described in Japanese Patent Application Publication No. 2019-167313 Initiator, the aminoacetophenone-based initiator having an oxazolidinyl group described in Japanese Patent Application Laid-Open No. 2020-055992, the oxime-based photopolymerization initiator described in Japanese Patent Application Publication No. 2013-190459, The polymer described in Japanese Patent Application Laid-Open No. 2020-172619, the compound represented by Formula 1 described in International Publication No. 2020/152120, and the like are incorporated in this specification.

Specific examples of hexaarylbisimidazole compounds include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-di Phenyl-1,1'-bisimidazole, etc.

Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, and Omnirad 127 (the above products are manufactured by IGM Resins B.V.), Irgacure 184, Irgacure 1173, Irgacure 2959, and Irgacure 127 (the above products are manufactured by BASF). company system), etc. Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, and Omnirad 379EG (the above are manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, and Irgacure 379EG (the above are manufactured by IGM Resins B.V.). BASF Corporation), etc. Examples of commercially available acylphosphine compounds include Omnirad 819, Omnirad TPO (the above products are manufactured by IGM Resins B.V.), Irgacure 819, and Irgacure TPO (the above products are manufactured by BASF Corporation), and the like.

Examples of the oxime compound include compounds described in Japanese Patent Application Publication No. 2001-233842, compounds described in Japanese Patent Application Publication No. 2000-080068, compounds described in Japanese Patent Application Publication No. 2006-342166, and J.C.S. Perkin II ( Compounds described in J.C.S. Perkin II (1979, pp. 156-162), Journal of Photopolymer Science and Technology (1995, pp. 202-232) Compounds, compounds described in Japanese Patent Application Publication No. 2000-066385, compounds described in Japanese Patent Application Publication No. 2004-534797, compounds described in Japanese Patent Application Publication No. 2006-342166, Japanese Patent Application Publication No. 2017-019766 Compounds described in, Compounds described in Japanese Patent Publication No. 6065596, Compounds described in International Publication No. 2015/152153, Compounds described in International Publication No. 2017/051680, Compounds described in Japanese Patent Publication No. 2017-198865 Compounds, compounds described in paragraphs 0025 to 0038 of International Publication No. 2017/164127, compounds described in International Publication No. 2013/167515, compounds described in International Publication No. 2017/169819, and 0029 of Japanese Patent Application Publication No. 2019-168654 Compounds described in ~0044, etc. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetyloxyiminobutan-2-one, and 3-propionyloxyiminobutan-2-one. Butan-2-one, 2-acetyloxyiminopentan-3-one, 2-acetyloxyimino-1-phenylpropan-1-one, 2-benzyloxyimine 1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one and 2-ethoxycarbonyloxyimino-1-phenylpropan- 1-one, etc., 1-[4-(phenylthio)phenyl]-3-cyclohexane-propan-1,2-dione-2-(O-acetyl oxime). Examples of commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04 (the above are manufactured by BASF), TR-PBG-304, TR-PBG-327 (manufactured by TRONLY), Adeka Optomer N-1919 ( Photopolymerization initiator 2) manufactured by ADEKA CORPORATION and described in Japanese Patent Application Publication No. 2012-014052. In addition, as the oxime compound, it is also preferable to use a compound that has no coloring properties or a compound that is highly transparent and difficult to change color. Examples of commercially available products include ADEKA ARKLS NCI-730, NCI-831, NCI-930 (the above are manufactured by ADEKA CORPORATION), and the like.

As the photopolymerization initiator, an oxime compound having a fluorine ring can also be used. Specific examples of the oxime compound having a fluorine ring include the compounds described in Japanese Patent Application Laid-Open No. 2014-137466, the compounds described in Japanese Patent Publication No. 6636081, and the compounds described in Korean Patent Publication No. 10-2016-0109444. of compounds.

As the photopolymerization initiator, an oxime compound having at least one benzene ring of a carbazole ring serving as the skeleton of a naphthalene ring can also be used. Specific examples of such oxime compounds include compounds described in International Publication No. 2013/083505.

As the photopolymerization initiator, an oxime compound having a fluorine atom can also be used. Specific examples of the oxime compound having a fluorine atom include compounds described in Japanese Patent Application Publication No. 2010-262028, compounds 24, 36 to 40 described in Japanese Patent Application Publication No. 2014-500852, and Japanese Patent Application Publication No. 2013- Compound (C-3) described in Publication No. 164471, etc.

As the photopolymerization initiator, an oxime compound having a nitro group can be used. It is also preferable that the oxime compound having a nitro group is a dimer. Specific examples of the oxime compound having a nitro group include compounds described in paragraphs 0031 to 0047 of Japanese Patent Application Laid-Open No. 2013-114249 and paragraphs 0008 to 0012 and 0070 to 0079 of Japanese Patent Application Laid-Open No. 2014-137466, The compound described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071, ADEKA ARKLS NCI-831 (manufactured by ADEKA CORPORATION).

As the photopolymerization initiator, an oxime compound having a benzofuran skeleton can also be used. Specific examples include OE-01 to OE-75 described in International Publication No. 2015/036910.

As the photopolymerization initiator, an oxime compound in which a substituent having a hydroxyl group is bonded to the carbazole skeleton can also be used. Examples of such photopolymerization initiators include compounds described in International Publication No. 2019/088055.

Specific examples of oxime compounds that can be preferably used in the present invention are shown below, but the present invention is not limited to these.

[Chemical 34] [Chemical 35] [Chemical 36] [Chemical 37]

The oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, and more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm. In addition, from the viewpoint of sensitivity, the oxime compound preferably has a high Mohr absorption coefficient at a wavelength of 365 nm or a wavelength of 405 nm, more preferably 1,000 to 300,000, further preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar absorption coefficient of a compound can be measured using a known method. For example, it is preferably measured with a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian Corporation) using an ethyl acetate solvent at a concentration of 0.01 g/L.

As the photopolymerization initiator, a bifunctional or trifunctional or higher photoradical polymerization initiator can be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, so good sensitivity can be obtained. In addition, when a compound with an asymmetric structure is used, the crystallinity decreases and the solubility in a solvent or the like increases, making it difficult to precipitate over time, thereby improving the stability of the composition over time. Specific examples of the bifunctional or trifunctional or higher-functional photoradical polymerization initiator include Japanese Patent Application Publication No. 2010-527339, Japanese Patent Application Publication No. 2011-524436, International Publication No. 2015/004565, and Japanese Patent Application Publication No. 2015/004565. The dimer of the oxime compound described in paragraphs 0407 to 0412 of Table 2016-532675, paragraphs 0039 to 0055 of International Publication No. 2017/033680, the compound (E) described in Japanese Patent Publication No. 2013-522445, and Compound (G), Cmpd1 to 7 described in International Publication No. 2016/034963, oxime ester-based initiator described in paragraph 0007 of Japanese Patent Application Publication No. 2017-523465, and 0020 of Japanese Patent Application Publication No. 2017-167399 The photoinitiator described in paragraphs 0033 to 0033, the photopolymerization initiator (A) described in paragraphs 0017 to 0026 of Japanese Patent Application Laid-Open No. 2017-151342, the oxime ester-based initiator described in Japanese Patent No. 6469669 Agents, etc.

In the total solid content of the composition, the content of the photopolymerization initiator is preferably 0.1 to 40 mass%, more preferably 0.5 to 35 mass%, and further preferably 1 to 30 mass%. The composition may contain only one type of photopolymerization initiator, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range.

＜＜Hardening agent＞＞ When the composition of the present invention contains a compound having a cyclic ether group, it is preferred to further contain a hardener. Examples of the curing agent include amine compounds, acid anhydride compounds, amide compounds, phenol compounds, polycarboxylic acids, thiol compounds, and the like. Specific examples of the hardening agent include succinic acid, trimellitic acid, pyromelonic acid, N,N-dimethyl-4-aminepyridine, neopentylerythritol tetrakis(3-mercaptopropionate), etc. . As the curing agent, the compounds described in paragraphs 0072 to 0078 of Japanese Patent Application Laid-Open No. 2016-075720 and the compounds described in Japanese Patent Application Laid-Open No. 2017-036379 can also be used. The content of the hardener is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and further preferably 0.1 to 6.0 parts by mass relative to 100 parts by mass of the compound having a cyclic ether group.

＜＜Color colorant＞＞ The composition of the present invention can contain a colorant. In the present invention, color colorants refer to colorants other than white colorants and black colorants. It is preferable that the colorant has absorption in a wavelength range of 400 nm or more and less than 650 nm.

Examples of color colorants include red colorants, green colorants, blue colorants, yellow colorants, purple colorants, and orange colorants. The colorant can be a pigment or a dye. Pigments and dyes can be used together. Moreover, the pigment may be either an inorganic pigment or an organic pigment. In addition, the pigment may be a material in which a part of an inorganic pigment or an organic-inorganic pigment is replaced with an organic chromophore. By replacing inorganic pigments or organic-inorganic pigments with organic chromophores, hue design can be easily performed.

The average primary particle size of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, and more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and still more preferably 100 nm or less. As long as the average primary particle diameter of the pigment is within the above range, the dispersion stability of the pigment in the composition is good. Furthermore, in the present invention, the primary particle diameter of the pigment can be determined from the obtained image photograph by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is determined, and the equivalent circle diameter corresponding thereto is calculated as the primary particle size of the pigment. In addition, the average primary particle diameter in the present invention is set as the arithmetic mean value of the primary particle diameters of 400 primary particles of the pigment. In addition, the primary particles of the pigment refer to independent particles that are not agglomerated.

The colorant preferably contains a pigment. The content of the pigment in the colorant is preferably 50 mass% or more, more preferably 70 mass% or more, further preferably 80 mass% or more, and particularly preferably 90 mass% or more. Examples of pigments include those shown below.

Pigment Index (C.I.) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35 :1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94 ,95,97,98,100,101,104,106,108,109,110,113,114,115,116,117,118,119,120,123,125,126,127,128,129,137 ,138,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176 , 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232 (methine series), 233 (quinoline series), 234 ( Amino ketone series), 235 (amino ketone series), 236 (amino ketone series), etc. (the above are yellow pigments), C.I. Pigment Orange 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73 etc. (the above is orange pigment), C.I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4 , 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3 ,83,88,90,105,112,119,122,123,144,146,149,150,155,166,168,169,170,171,172,175,176,177,178,179,184 ,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,269,270,272,279,291 , 294 (𠮿kou galaxy, Organo Ultramarine (organic ultramarine), Bluish Red (blue-red)), 295 (monoazo series), 296 (diazo series), 297 (amino ketone), etc. (the above are red pigments ), C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine series), 65 (phthalocyanine series), 66 (phthalocyanine series), etc. (the above are green pigments), C.I. Pigment Purple 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane series), 61 (𠮿kou galaxy), etc. (the above are purple pigments), C.I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo series), 88 (methine series), etc. (the above are blue pigments).

Furthermore, as the green pigment, it is also possible to use a halide zinc phthalocyanine pigment having an average number of halogen atoms in one molecule of 10 to 14, an average number of bromine atoms in a molecule of 8 to 12, and an average number of chlorine atoms in a molecule of 2 to 5. Specific examples include compounds described in International Publication No. 2015/118720. In addition, as the green pigment, the compound described in Chinese Patent Application No. 106909027, the phthalocyanine compound having a phosphate ester as a ligand described in International Publication No. 2012/102395, and Japanese Patent Application Laid-Open No. 2019-008014 can also be used. Phthalocyanine compounds described in the publication, phthalocyanine compounds described in Japanese Patent Application Publication No. 2018-180023, compounds described in Japanese Patent Application Publication No. 2019-038958, core-shell type described in Japanese Patent Application Publication No. 2020-076995 Pigments, etc.

Furthermore, as the blue pigment, an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples include compounds described in paragraphs 0022 to 0030 of Japanese Patent Application Laid-Open No. 2012-247591 and paragraph 0047 of Japanese Patent Application Laid-Open No. 2011-157478.

In addition, as the yellow pigment, compounds described in Japanese Patent Application Laid-Open No. 2017-201003, compounds described in Japanese Patent Application Laid-Open No. 2017-197719, and compounds 0011 to 0062 and 0137 to Japanese Patent Application Laid-Open No. 2017-171912 can also be used. Compounds described in paragraph 0276, compounds described in paragraphs 0010 to 0062 and 0138 to 0295 of Japanese Patent Application Laid-Open No. 2017-171913, compounds described in paragraphs 0011 to 0062 and 0139 to 0190 of Japanese Patent Application Publication No. 2017-171914 , the compounds described in paragraphs 0010 to 0065 and 0142 to 0222 of Japanese Patent Application Laid-Open No. 2017-171915, the quinoline yellow compounds described in paragraphs 0011 to 0034 of Japanese Patent Application Publication No. 2013-054339, and the compounds described in Japanese Patent Application Laid-Open No. 2014-026228 Quinoline compounds described in paragraphs 0013 to 0058 of Japanese Patent Application Publication No., isoindoline compounds described in Japanese Patent Application Laid-Open No. 2018-062644, quinoline yellow compounds described in Japanese Patent Application Publication No. 2018-203798, Japanese Patent Application Publication No. 2018-203798 Quinophthalone compounds described in Japanese Patent Application Publication No. 2018-062578, quinophthaline compounds described in Japanese Patent Application Publication No. 6432076, quinophthaline compounds described in Japanese Patent Application Publication No. 2018-155881, Japanese Patent Application Publication No. 2018-111757 Quinophthalone compound described in Japanese Patent Application Laid-Open No. 2018-040835, Quinophthalone compound described in Japanese Patent Application Laid-Open No. 2017-197640, Japanese Patent Application Laid-Open No. 2016-145282 Quinophthalone compound described in Japanese Patent Application Laid-Open No. 2014-085565, Quinophthalone compound described in Japanese Patent Application Laid-Open No. 2014-021139, Japanese Patent Application Laid-Open No. 2013-209614 The quinophthalone compound described in Japanese Patent Application Laid-Open No. 2013-209435, the quinophthalate compound described in Japanese Patent Application Laid-Open No. 2013-181015, and the quinoline yellow compound described in Japanese Patent Application Laid-Open No. 2013-061622 Quinophthal compounds, quinophthal compounds described in Japanese Patent Application Laid-Open No. 2013-032486, quinophthal compounds described in Japanese Patent Application Laid-Open No. 2012-226110, quinophthal compounds described in Japanese Patent Application Laid-Open No. 2008-074987 Compounds, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2008-081565, quinophthaline compounds described in Japanese Patent Application Laid-Open No. 2008-074986, quinophthaline compounds described in Japanese Patent Application Laid-Open No. 2008-074985, Quinophthalone compounds described in Japanese Patent Publication No. 2008-050420, quinophthaline compounds described in Japanese Patent Publication No. 2008-031281, quinophthaline compounds described in Japanese Patent Publication No. 48-032765, Japanese Patent Publication No. 48-032765 Quinophthalone compounds described in Japanese Patent Publication No. 2019-008014, quinophthalone compounds described in Japanese Patent Publication No. 6607427, compounds described in Korean Patent Publication No. 10-2014-0034963, Japanese Patent Publication No. 2017-095706 Compounds described in Japanese Patent Application Publication No. 201920495, Compounds described in Japanese Patent Application Publication No. 6607427, Compounds described in Japanese Patent Application Publication No. 2020-033525, Japanese Patent Application Publication No. 2020-033524 Compounds described in Japanese Patent Application Publication No. 2020-033523, Compounds described in Japanese Patent Application Publication No. 2020-033522, Compounds described in Japanese Patent Application Publication No. 2020-033521, International Publication No. 2020 Compounds described in /045200, compounds described in International Publication No. 2020/045199, and compounds described in International Publication No. 2020/045197. In addition, from the viewpoint of improving the color value, those in which these compounds are polymerized can also be preferably used.

As the red pigment, diketopyrrolopyrrole compounds described in Japanese Patent Application Laid-Open No. 2017-201384 in which at least one bromine atom is substituted in the structure and diketopyrrolopyrrole compounds described in paragraphs 0016 to 0022 of Japanese Patent No. 6248838 can also be used. Pyrrolopyrrole compound, diketopyrrolopyrrole compound described in International Publication No. 2012/102399, diketopyrrolopyrrole compound described in International Publication No. 2012/117965, naphthalene described in Japanese Patent Application Laid-Open No. 2012-229344 Phenolic azo compound, red pigment described in Japanese Patent No. 6516119, red pigment described in Japanese Patent No. 6525101, brominated diketopyrrolopyrrole described in paragraph 0229 of Japanese Patent Application Laid-Open No. 2020-090632 Compounds, anthraquinone compounds described in Korean Patent Publication No. 10-2019-0140741, anthraquinone compounds described in Korean Patent Publication No. 10-2019-0140744, perylene compounds described in Japanese Patent Application Laid-Open No. 2020-079396 Compounds etc. Furthermore, as the red pigment, a compound having a structure in which a group to which an oxygen atom, a sulfur atom or a nitrogen atom is bonded is introduced into an aromatic ring and an aromatic ring group is bonded to a diketopyrrolopyrrole skeleton can also be used.

Regarding the preferred diffraction angles of various pigments, you can refer to the records of Japanese Patent No. 6561862, Japanese Patent No. 6413872, Japanese Patent No. 6281345, and Japanese Patent Application Laid-Open No. 2020-026503, and these contents are incorporated into this specification. middle. In addition, as the pyrrolopyrrole-based pigment, those having a crystallite size of 140 Å or less in the direction of the plane corresponding to the maximum peak in the X-ray diffraction pattern among the eight planes of the lattice plane (±1±1±1) may also be used. Better. In addition, the physical properties of the pyrrolopyrrole-based pigment are preferably as described in paragraphs 0028 to 0073 of Japanese Patent Application Laid-Open No. 2020-097744.

Dyes can also be used as colorants. The dye is not particularly limited and known dyes can be used. Examples include pyrazole azo dyes, anilinoazo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxocyanine dyes, and pyrazole dyes. Triazole azo dyes, pyridone azo dyes, cyanine dyes, thiophene dyes, pyrrolopyrazole imine dyes, star dyes, phthalocyanine dyes, benzopyrans dyes, indigo dyes, pyrromethene dyes, etc.

Pigment polymers can also be used as colorants. It is preferable that the pigment polymer is a dye that is dissolved in a solvent. In addition, the dye multimer may form particles. When the pigment polymer is in the form of particles, it is usually used in a state dispersed in a solvent. The dye multimer in the particle state can be obtained by, for example, emulsion polymerization. Specific examples include the compound and the production method described in Japanese Patent Application Laid-Open No. 2015-214682. The pigment multimer has two or more pigment structures in one molecule, preferably three or more pigment structures. The upper limit is not particularly limited and can be set to 100 or less. The plurality of pigment structures in one molecule may be the same pigment structure or may be different pigment structures. The weight average molecular weight (Mw) of the dye multimer is preferably 2,000 to 50,000. It is more preferable that the lower limit is 3,000 or more, and it is further more preferable that it is 6,000 or more. It is more preferable that the upper limit is 30,000 or less, and it is further more preferable that it is 20,000 or less. The dye multimer can also be used as Japanese Patent Application Laid-Open Nos. 2011-213925, 2013-041097, 2015-028144, 2015-030742, and International Publication No. 2016/031442. Compounds described in etc.

In addition, the colorant can use the thiazole compound described in Japanese Patent Application Publication No. 2012-158649, the azo compound described in Japanese Patent Application Publication No. 2011-184493, and the azo compound described in Japanese Patent Application Publication No. 2011-145540. , the triarylmethane dye polymer described in Korean Patent Publication No. 10-2020-0028160, the triarylmethane compound described in Japanese Patent Application Publication No. 2020-117638, and the phthalocyanine described in International Publication No. 2020/174991 Compounds, isoindoline compounds described in Japanese Patent Application Laid-Open No. 2020-160279, or salts thereof.

When the composition of the present invention contains a colorant, the content of the colorant is preferably 1 to 50% by mass in the total solid content of the composition of the present invention. When the composition of the present invention contains two or more colorants, the total amount is preferably within the above range.

When the composition of the present invention is used as an infrared cut filter, it is preferred that the composition of the present invention contains substantially no colorant. Furthermore, the composition of the present invention substantially does not contain a colorant means that the content of the colorant in the total solid content of the composition of the present invention is 0.5% by mass or less, preferably 0.1% by mass or less, and does not contain a colorant. Colorants are even better.

＜＜Color material that transmits infrared rays and blocks visible light＞＞ The composition of the present invention may also contain a color material that transmits infrared rays and blocks visible light (hereinafter, also referred to as a color material that blocks visible light). A composition containing a color material that blocks visible light can be preferably used as a composition for forming an infrared transmission filter.

The color material that blocks visible light is preferably a color material that absorbs light in the wavelength range from purple to red. Furthermore, the color material that blocks visible light is preferably a color material that blocks light in a wavelength range of 450 to 650 nm. In addition, the color material that blocks visible light is preferably a color material that transmits light with a wavelength of 900 to 1500 nm. It is preferable that the color material that blocks visible light meets at least one of the following necessary conditions (A) and (B). (A): Contains two or more colorants, and the combination of two or more colorants forms black. (B): Contains organic black colorant.

Examples of the coloring agent include those mentioned above. Examples of the organic black colorant include dibenzofuranone compounds, methimine compounds, perylene compounds, azo compounds, and the like, with dibenzofuranone compounds and perylene compounds being preferred. Examples of the dibenzofuranone compound include compounds described in Japanese Patent Application Publication No. 2010-534726, Japanese Patent Application Publication No. 2012-515233, Japanese Patent Application Publication No. 2012-515234, and the like. For example, it can be used as a dibenzofuranone compound manufactured by BASF Corporation. "Irgaphor Black" obtained. Examples of the perylene compound include the compounds described in paragraphs 0016 to 0020 of Japanese Patent Application Laid-Open No. 2017-226821, C.I. Pigment Black 31, 32, and the like. Examples of the methimine compound include compounds described in Japanese Patent Application Laid-Open No. 01-170601, Japanese Patent Application Laid-Open No. 02-034664, etc., for example, "CHROMO" manufactured by Dainichiseika Color & Chemicals Mfg. Co., Ltd. FINE BLACK A1103” obtained.

Examples of combinations of color colorants used to form black by a combination of two or more color colorants include the following aspects (1) to (8). (1) Contains yellow colorant, blue colorant, purple colorant and red colorant. (2) Contains yellow colorant, blue colorant and red colorant. (3) Contains yellow colorant, purple colorant and red colorant. (4) Contains yellow coloring agent and purple coloring agent. (5) Containing green colorant, blue colorant, purple colorant and red colorant. (6) Contains purple coloring agent and orange coloring agent. (7) Contains green colorant, purple colorant and red colorant. (8) Contains green colorant and red colorant.

When the composition of the present invention contains a color material that blocks visible light, the content of the color material that blocks visible light is preferably 1 to 50% by mass in the total solid content of the composition. It is preferable that the lower limit is 5 mass % or more, more preferably 10 mass % or more, 20 mass % or more is still more preferred, and 30 mass % or more is particularly preferred.

When the composition of the present invention is used as an infrared cut filter, it is preferred that the composition of the present invention substantially does not contain a color material that blocks visible light. Furthermore, the composition of the present invention substantially does not contain a color material that blocks visible light means that the content of a color material that blocks visible light in the total solid content of the composition of the present invention is 0.5% by mass or less, preferably 0.1% by mass or less. , it is better if it does not contain color materials that block visible light.

＜＜Surfactant＞＞ The composition of the present invention preferably contains a surfactant. As the surfactant, various surfactants such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and polysiloxane-based surfactants can be used. The surfactant is preferably a polysiloxane-based surfactant or a fluorine-based surfactant. Examples of the surfactant include those described in paragraphs 0238 to 0245 of International Publication No. 2015/166779, and this content is incorporated into this specification.

Examples of the fluorine-based surfactant include surfactants described in paragraphs 0060 to 0064 of Japanese Patent Application Laid-Open No. 2014-041318 (corresponding to paragraphs 0060 to 0064 of International Publication No. 2014/017669), Japanese Patent Application Laid-Open No. 2014/017669, etc. The surfactants described in paragraphs 0117 to 0132 of Publication No. 2011-132503 and the surfactants described in Japanese Patent Application Laid-Open No. 2020-008634 are incorporated in this specification. Examples of commercially available fluorine-based surfactants include MEGAFACE F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F -144, F-437, F-475, F-477, F-479, F-482, F-554, F-555-A, F-556, F-557, F-558, F-559, F -560, F-561, F-563, F-565, F-568, F-575, F-780, EXP, MFS-330, R-01, R-40, R-40-LM, R-41 , R-41-LM, RS-43, TF-1956, RS-90, R-94, RS-72-K, DS-21 (the above are made by DIC Corporation), FLUORAD FC430, FC431, FC171 (the above are made by Sumitomo 3M Limited), SURFLON S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (the above is AGC INC .), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (the above are made by OMNOVA SOLUTIONS INC.), Futurgent 208G, 215M, 245F, 601AD, 601ADH2, 602A, 610FM, 710FL, 710FM, 710FS, FTX-218 (the above Made by NEOS COMPANY LIMITED), etc.

In addition, as the fluorine-based surfactant, an acrylic compound having a molecular structure including a functional group containing a fluorine atom and in which the portion of the functional group containing the fluorine atom is cleaved during heating can also be suitably used. The fluorine atoms volatilize. Examples of such fluorine-based surfactants include the MEGAFACE DS series manufactured by DIC Corporation (Chemical Industry Daily (February 22, 2016), Nikkei Sangyo Shimbun (February 23, 2016)). For example, MEGAFACE DS-21.

Furthermore, as the fluorine-based surfactant, it is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound. Examples of such fluorine-based surfactants include the fluorine-based surfactants described in Japanese Patent Application Laid-Open No. 2016-216602, the contents of which are incorporated in this specification.

As the fluorine-based surfactant, a block polymer can also be used. As the fluorine-based surfactant, a fluorine-containing polymer compound containing: a repeating unit derived from a (meth)acrylate compound having a fluorine atom; and a fluorine-containing polymer compound derived from a (meth)acrylate compound having 2 The repeating unit of the above (preferably 5 or more) (meth)acrylate compound having an alkyleneoxy group (preferably an vinyloxy group or a propyleneoxy group). In addition, the fluorine-containing surfactants described in paragraphs 0016 to 0037 of Japanese Patent Application Laid-Open No. 2010-032698 and the following compounds are also exemplified as fluorine-based surfactants used in the present invention. [Chemical 38] The weight average molecular weight of the above compound is preferably 3,000 to 50,000, for example, 14,000. In the above compounds, the percentage expressed as the proportion of repeating units is molar %.

Furthermore, as the fluorine-based surfactant, a fluorine-containing polymer having a group containing an ethylenically unsaturated bond in the side chain can also be used. Specific examples include compounds described in paragraphs 0050 to 0090 and paragraphs 0289 to 0295 of Japanese Patent Application Laid-Open No. 2010-164965, MEGAFACE RS-101, RS-102, RS-718K, and RS-72- manufactured by DIC Corporation. K et al. In addition, as the fluorine-based surfactant, compounds described in paragraphs 0015 to 0158 of Japanese Patent Application Laid-Open No. 2015-117327 can also be used.

In addition, it is also preferable from the viewpoint of environmental control to use the surfactant described in International Publication No. 2020/084854 as a substitute for the surfactant having a perfluoroalkyl group with a carbon number of 6 or more.

Furthermore, it is also preferable to use a fluoride-containing imine salt compound represented by formula (fi-1) as a surfactant. [Chemical 39] In formula (fi-1), m represents 1 or 2, n represents an integer from 1 to 4, a represents 1 or 2, X ^a+ represents a-valent metal ion, primary ammonium ion, secondary ammonium ion, tertiary ammonium ion, Quaternary ammonium ion or NH ₄ ⁺ .

Examples of nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane, and their ethoxylates and propoxylates (for example, glycerol propoxylate , glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether , polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitol fatty acid ester, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (manufactured by BASF), Tetronic 304, 701, 704, 901, 904, 150R1 (manufactured by BASF Corporation), SOLSPERSE 20000 (manufactured by Japan Lubrizol Corporation), NCW-101, NCW-1001, NCW-1002 (manufactured by FUJIFILM Wako Pure Chemical Corporation), PIONIN D-6112, D -6112-W, D-6315 (manufactured by Takemoto Oil & Fat Co., Ltd.), OLFIN E1010, Surfynol 104, 400, 440 (manufactured by Nissin Chemical Co., Ltd.), etc.

Examples of cationic surfactants include tetraalkylammonium salts, alkylamine salts, benzalkylammonium salts, alkylpyridinium salts, and imidazolium salts. Specific examples include dihydroxyethyl stearylamine, 2-heptadecenyl-hydroxyethyl imidazoline, lauryldimethylbenzyl ammonium chloride, cetylpyridinium chloride, and stearyl chloride. Aminomethylpyridinium chloride, etc.

Examples of the anionic surfactant include dodecyl benzene sulfonic acid, sodium dodecyl benzene sulfonate, sodium lauryl sulfate, sodium alkyl diphenyl ether disulfonate, sodium alkyl naphthalene sulfonate, and dioxane. Sodium sulfosuccinate, sodium stearate, potassium oleate, sodium dioctyl sulfosuccinate, sodium polyoxyethylene alkyl ether sulfate, sodium polyoxyethylene alkyl ether sulfate, polyoxyethylene alkyl phenyl Sodium ether sulfate, sodium dialkyl sulfosuccinate, sodium stearate, sodium oleate, tertiary octylphenoxyethoxypolyethoxyethyl sulfate sodium salt, etc.

Examples of polysilicone-based surfactants include SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, SF 8419 OIL (the above are manufactured by Dow Corning Toray Co., Ltd.), TSF -4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (the above are made by Momentive Performance Materials Inc.), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (the above (manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, BYK-UV3510 (the above are manufactured by BYK-Chemie GmbH), etc.

Moreover, the compound of the following structure can also be used as a polysiloxane surfactant. [Chemical 40]

In the total solid content of the composition, the surfactant content is preferably 0.001 to 1% by mass, more preferably 0.001 to 0.5% by mass, and further preferably 0.001 to 0.2% by mass. The composition may contain only one type of surfactant, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range.

＜＜Polymerization inhibitor＞＞ The composition of the present invention can contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tertiary butyl-p-cresol, gallic acid, tertiary butylcatechol, benzoquinone, and 4,4'-thio Bis(3-methyl-6-tertiary butylphenol), 2,2'-methylenebis(4-methyl-6-tertiary butylphenol), N-nitrosophenylhydroxylamine salt ( ammonium salt, first cerium salt, etc.), p-methoxyphenol is preferred. The content of the polymerization inhibitor is preferably 0.0001 to 5% by mass of the total solid content of the composition. The composition may contain only one type of polymerization inhibitor, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range.

＜＜Silane Coupling Agent＞＞ The composition of the present invention can contain a silane coupling agent. In this specification, a silane coupling agent refers to a silane compound having a hydrolyzable group and other functional groups. In addition, the hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and can generate a siloxane bond through at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, a hydroxyl group, and the like, with an alkoxy group being preferred. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. Examples of functional groups other than the hydrolyzable group include a vinyl group, a (meth)acrylyl group, a mercapto group, an epoxy group, an oxybutanyl group, an amino group, a urea group, a thioether group, and an isocyanate group. group, phenyl group, etc., (meth)acrylyl group and epoxy group are preferred. Examples of the silane coupling agent include the compounds described in paragraphs 0018 to 0036 of Japanese Patent Application Laid-Open No. 2009-288703 and the compounds described in paragraphs 0056 to 0066 of Japanese Patent Application Laid-Open No. 2009-242604, and these contents are incorporated in this specification. In the total solid content of the composition, the content of the silane coupling agent is preferably 0.01 to 15.0 mass%, and more preferably 0.05 to 10.0 mass%. The composition may contain only one type of silane coupling agent, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range.

＜＜UV absorber＞＞ The composition of the present invention can contain an ultraviolet absorber. Examples of the ultraviolet absorber include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyl trisulfonate compounds, and indepine compounds. Indole compounds, tribenzoyl compounds, benzyl compounds, etc. Specific examples of such compounds include paragraphs 0038 to 0052 of Japanese Patent Application Laid-Open No. 2009-217221, paragraphs 0052 to 0072 of Japanese Patent Application Laid-Open No. 2012-208374, and paragraphs 0317 to 0317 of Japanese Patent Application Laid-Open No. 2013-068814. Compounds described in Paragraph 0334, Paragraphs 0061 to 0080 of Japanese Patent Application Laid-Open No. 2016-162946, Paragraphs 0052 and 0074 of International Publication No. 2021/131355, Paragraphs 0022 to 0024 of International Publication No. 2021/132247, etc. incorporated into this manual. Commercially available products of ultraviolet absorbers include BASF's Tinuvin series, Uvinul series, and the like. Examples of benzotriazole compounds include the MYUA series manufactured by MIYOSHI OIL & FAT CO., LTD. (Chemical Industry Daily, February 1, 2016). As the ultraviolet absorber, the compounds described in the examples described below, and the compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967 and paragraphs 0059 to 0076 of International Publication No. 2016/181987 can also be used. In the total solid content of the composition, the content of the ultraviolet absorber is preferably 0.01 to 30% by mass, and more preferably 0.05 to 25% by mass. The composition may contain only one type of ultraviolet absorber, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range.

＜＜Antioxidants＞＞ The composition of the present invention can contain antioxidants. Examples of antioxidants include phenol-based antioxidants, amine-based antioxidants, phosphorus-based antioxidants, sulfur-based antioxidants, and the like. Examples of phenolic antioxidants include hindered phenol compounds. The phenolic antioxidant is preferably a compound having a substituent at the position adjacent to the phenolic hydroxyl group (ortho position). As the substituent, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferred. It is also preferable that the antioxidant is a compound having a phenol group and a phosphite group in the same molecule. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2] Dioxaphosphineheterocycloheptadien-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tertiary butyldibenzo[d,f] [1,3,2]dioxaphosphineheterocycloheptadien-2-yl)oxy]ethyl]amine, bis(2,4-di-tertiary butyl-6-methylphenyl phosphite) ) ethyl ester, tris (2,4-di-tertiary butylphenyl) phosphite, etc. Examples of commercially available antioxidants include ADEKA STAB AO-20, ADEKA STAB AO-30, ADEKA STAB AO-40, ADEKA STAB AO-50, ADEKA STAB AO-50F, ADEKA STAB AO-60, and ADEKA STAB. AO-60G, ADEKA STAB AO-80, ADEKA STAB AO-330, ADEKA STAB AO-412S, ADEKA STAB 2112, ADEKA STAB PEP-36, ADEKA STAB HP-10 (the above are made by ADEKA CORPORATION), JP-650 (JOHOKU CHEMICAL CO., LTD.) etc. As antioxidants, compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, compounds described in International Publication No. 2017/006600, compounds described in International Publication No. 2017/164024, and Korean Patent Publication No. 10 can also be used. -Compounds described in Publication No. 2019-0059371. In the total solid content of the composition, the antioxidant content is preferably 0.01 to 20 mass%, and more preferably 0.3 to 15 mass%. The composition may contain only one type of antioxidant, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range.

＜＜Other ingredients＞＞ The composition of the present invention may contain sensitizers, hardening accelerators, fillers, thermal hardening accelerators, plasticizers and other auxiliaries (for example, conductive particles, defoaming agents, flame retardants, leveling agents, Peeling accelerators, fragrances, surface tension regulators, chain transfer agents, etc.). By appropriately containing these components, film physical properties and other properties can be adjusted. Regarding these components, for example, reference can be made to the descriptions of paragraphs 0183 and onwards of Japanese Patent Application Laid-Open No. 2012-003225 (corresponding to paragraph 0237 of the specification of U.S. Patent Application Publication No. 2013/0034812), and the descriptions of Japanese Patent Application Laid-Open No. 2008-250074. The descriptions in paragraphs 0101 to 0104, 0107 to 0109, etc. are incorporated into this manual. Furthermore, the composition of the present invention may contain latent antioxidants if necessary. Examples of potential antioxidants include compounds in which a site functioning as an antioxidant is protected by a protective group and the protective group is detached by heating at 100 to 250°C or heating at 80 to 200°C in the presence of an acid/alkali catalyst. and acts as an antioxidant. Examples of potential antioxidants include compounds described in International Publication No. 2014/021023, International Publication No. 2017/030005, and Japanese Patent Application Laid-Open No. 2017-008219. Examples of commercially available latent antioxidants include ADEKA ARKLS GPA-5001 (manufactured by ADEKA CORPORATION).

＜Container＞ There is no particular limitation on the container for storing the composition of the present invention, and a known container can be used. In addition, as a storage container, in order to prevent impurities from being mixed into raw materials and compositions, it is also preferable to use a multi-layer bottle with an inner wall composed of six types of six-layer resins or a bottle with a seven-layer structure using six types of resins. Examples of such a container include the container described in Japanese Patent Application Laid-Open No. 2015-123351. In addition, the inner wall of the container is preferably made of glass, stainless steel, etc. for the purpose of preventing elution of metal from the inner wall of the container, improving the stability of the composition over time, or suppressing deterioration of components.

＜Preparation method of composition＞ The composition of the present invention can be prepared by mixing the aforementioned components. When preparing a composition, all the components can be dissolved or dispersed in a solvent at the same time to prepare the composition. Alternatively, a solution or dispersion containing 2 or more parts of each component can be prepared in advance as needed and used (when coating). ) are mixed to prepare a composition.

When preparing the composition, a pigment dispersion process may be included. In the pigment dispersion process, examples of mechanical forces used to disperse pigments include compression, extrusion, impact, shearing, pitting, and the like. Specific examples of these processes include bead milling, sand milling, roller milling, ball milling, paint stirring, micro-jet flow, high-speed impeller, sand mixing, jet mixing, high-pressure wet micronization, ultrasonic dispersion, and the like. In addition, when the pigment is pulverized in a sand mill (bead mill), it is preferable to perform the treatment under conditions that improve the pulverization efficiency by using microbeads with small diameters, increasing the filling rate of microbeads, etc. In addition, after the grinding process, it is preferable to remove coarse particles by filtration, centrifugation, etc. In addition, regarding the pigment dispersion process and dispersion machine, it is better to use "Encyclopedia of Dispersion Technology, published by JOHOKIKO CO., LTD., July 15, 2005" or "Centering on Suspension (Solid/Liquid Dispersion System)" "A Comprehensive Data Collection of Dispersion Technology and Industrial Applications, published by the Publishing Department of the Business Development Center, October 10, 1978" and the process and dispersion machine described in paragraph 0022 of Japanese Patent Application Publication No. 2015-157893. In addition, in the pigment dispersion process, the pigment can be refined through a salt grinding step. For example, the materials, equipment, processing conditions, etc. used in the salt grinding step can be referred to the descriptions of Japanese Patent Application Laid-Open No. 2015-194521 and Japanese Patent Application Laid-Open No. 2012-046629. Examples of bead materials used for dispersion include zirconium dioxide, agate, quartz, titanium dioxide, tungsten carbide, silicon nitride, alumina, stainless steel, and glass. In addition, an inorganic compound having a Mohs hardness of 2 or more can also be used for the beads. The above beads may be included in the composition at 1 to 10,000 ppm.

When preparing the composition, it is preferable to filter the composition with a filter for the purpose of removing foreign matter, reducing defects, etc. The filter can be used without particular limitation as long as it is a filter that has been conventionally used for filtration purposes. Examples include the use of fluororesins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (for example, nylon-6, nylon-6,6), and polyolefin resins (including high-resin resins such as polyethylene and polypropylene (PP)). density, ultra-high molecular weight polyolefin resin) and other materials. Among these materials, polypropylene (including high-density polypropylene) and nylon are preferred.

The pore diameter of the filter is preferably 0.01 to 7.0 μm, more preferably 0.01 to 3.0 μm, and further preferably 0.05 to 0.5 μm. As long as the pore size of the filter is within the above range, fine foreign matter can be removed more reliably. Regarding the pore size of the filter, you can refer to the nominal value of the filter manufacturer. As for the filter, various filters provided by Nihon Pall Ltd. (DFA4201NXEY, DFA4201NAEY, DFA4201J006P, etc.), Advantec Toyo Kaisha, Ltd., Nihon Entegris K.K. (Formerly Nippon Mykrolis Corporation), KITZ MICROFILTER Corporation, etc. can be used.

In addition, it is also preferable to use a fibrous filter material as the filter. Examples of fibrous filter materials include polypropylene fiber, nylon fiber, glass fiber, and the like. Commercially available products include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) manufactured by ROKI TECHNO CO., LTD.

When using filters, you can combine different filters (e.g. 1st filter and 2nd filter, etc.). At this time, filtration using each filter may be performed only once, or may be performed two or more times. Furthermore, filters with different pore sizes can be combined within the above range. In addition, filtration using the first filter is performed only on the dispersion, and filtration can be performed using the second filter after mixing other components.

＜Membrane＞ Next, the film of the present invention will be described. The film of the present invention is a film obtained from the composition of the present invention described above. The film of the present invention can be preferably used as an optical filter. The use of the optical filter is not particularly limited, and examples include infrared cut filters, infrared transmission filters, and the like. Examples of the infrared cut filter include an infrared cut filter on the light-receiving side of the solid-state imaging element (for example, an infrared cut-off filter for a wafer-level lens), and an infrared cut-off filter on the back side of the solid-state imaging element (opposite to the light-receiving side). Infrared cut filter for one side), infrared cut filter for ambient light sensor (for example, an illumination sensor that senses the illumination and hue of the environment where the information terminal device is placed and adjusts the hue of the display, and a color correction filter that adjusts the hue sensor) etc. In particular, it can be suitably used as an infrared cut filter on the light-receiving side of a solid-state imaging element. Examples of the infrared transmission filter include a filter that blocks visible light and can selectively transmit infrared rays having a specific wavelength or above.

The film of the present invention may have a pattern, or may be a film without a pattern (flat film). Furthermore, the film of the present invention can be laminated on a support and used, or the film of the present invention can be peeled off from the support and used. Examples of the support include semiconductor base materials such as silicon substrates and transparent base materials.

A charge coupled device (CCD), a complementary metal oxide film semiconductor (CMOS), a transparent conductive film, etc. can be formed on the semiconductor substrate used as a support. In addition, a black matrix that isolates each pixel may be formed on the semiconductor substrate. In addition, if necessary, a primer layer may be provided on the semiconductor base material for improving adhesion with the upper layer, preventing diffusion of substances, or flattening the substrate surface.

The transparent base material that can be used as a support is not particularly limited as long as it is made of a material that can transmit at least visible light. For example, a base material made of glass, resin, etc. can be mentioned. Examples of the resin include polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene/vinyl acetate copolymers, and norbornene resins. Acrylic resin, polyacrylate, polymethyl methacrylate and other acrylic resins, urethane resin, vinyl chloride resin, fluorine resin, polycarbonate resin, polyvinyl butyral resin, polyvinyl alcohol resin, etc. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, copper-containing glass, and the like. Examples of copper-containing glass include copper-containing phosphate glass, copper-containing fluorophosphate glass, and the like. Commercially available copper-containing glass can also be used. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC TECHNO GLASS Co., Ltd.).

The thickness of the film of the present invention can be appropriately adjusted depending on the purpose. The thickness of the film can be set to 200 μm or less, to 150 μm or less, to 120 μm or less, to 20 μm or less, to 10 μm or less, or to 5 μm or less. The lower limit of the thickness of the film is preferably 0.1 μm or more, and more preferably 0.2 μm or more.

When the film of the present invention is used as an infrared cut filter, it is preferable that the film of the present invention has a maximum absorption wavelength in the range of wavelength 650 to 1500 nm (preferably wavelength 660 to 1200 nm, more preferably wavelength 660 to 1000 nm). In addition, the average transmittance of light with a wavelength of 420 to 550 nm is preferably 50% or more, more preferably 70% or more, further preferably 80% or more, and particularly preferably 85% or more. In addition, the transmittance in the entire wavelength range of 420 to 550 nm is preferably 50% or more, more preferably 70% or more, and still more preferably 80% or more. In addition, the transmittance of the film of the present invention at at least one point within the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm) is preferably 15% or less, and 10% or less. Better still, 5% or less is even better. Furthermore, when the absorbance at the maximum absorption wavelength is set to 1, the average absorbance of the film of the present invention in the wavelength range of 420 to 550 nm is preferably less than 0.030, and more preferably less than 0.025.

When the film of the present invention is used as an infrared transmission filter, it is preferable that the film of the present invention has any one of the following spectral characteristics (i1) to (i3), for example. (i1): The maximum value of the transmittance in the wavelength range of 400 to 850 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 1000 to 1500 nm A filter with a minimum value of 70% or more (preferably 75% or more, more preferably 80% or more). A film with such spectroscopic characteristics can block light in the wavelength range of 400 to 850 nm and transmit light with wavelengths greater than 950 nm. (i2): The maximum value of the transmittance in the wavelength range of 400 to 950 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 1100 to 1500 nm A filter with a minimum value of 70% or more (preferably 75% or more, more preferably 80% or more). A film with such spectroscopic characteristics can block light with a wavelength in the range of 400 to 950 nm and transmit light with a wavelength greater than 1050 nm. (i3): The maximum value of the transmittance in the wavelength range of 400 to 1050 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 1200 to 1500 nm A filter with a minimum value of 70% or more (preferably 75% or more, more preferably 80% or more). A film with such spectroscopic characteristics can block light with a wavelength in the range of 400 to 1050 nm and transmit light with a wavelength greater than 1150 nm.

The films of the invention may also be used in combination with color filters containing colored colorants. The color filter can be produced using a coloring composition containing a color colorant. When the film of the present invention is used as an infrared cut filter, and the film of the present invention is used in combination with a color filter, it is preferable that the color filter is arranged on the optical path of the film of the present invention. For example, it is preferable to laminate the film of the present invention and a color filter to use as a laminate. In the laminate, the film of the present invention and the color filter may or may not be adjacent to each other in the thickness direction. When the film of the present invention and the color filter are not adjacent to each other in the thickness direction, the film of the present invention may be formed on a support different from the support on which the color filter is formed, or the film of the present invention may be formed on a different support than the support on which the color filter is formed. Other components constituting the solid-state imaging element (for example, microlenses, planarization layers, etc.) are sandwiched between the components.

The film of the present invention can be used in various devices such as solid-state imaging elements such as CCD (charge coupled device) and CMOS (complementary metal oxide semiconductor), infrared sensors, and image display devices.

＜Membrane manufacturing method＞ The film of the present invention can be produced by applying the composition of the present invention.

Examples of the support include those mentioned above. As a method of applying the composition, a known method can be used. Examples include dropping method (drip casting); slit coating method; spray method; roll coating method; spin coating method (spin coating); cast coating method; slit spin coating method; prewet method ( For example, the method described in Japanese Patent Application Laid-Open No. 2009-145395); inkjet (for example, drop-on-demand method, piezoelectric method, thermal method), nozzle jet printing, flexographic printing, screen printing, gravure printing, Various printing methods such as reverse offset printing and metal mask printing; transfer printing methods using molds, etc.; nanoimprinting methods, etc. There are no particular limitations on the applicable method for inkjet. For example, "Expansion and Usage of Inkjet - Infinite Possibilities Appeared in Patents -", published in February 2005, Sumitbe Techon Research Co., Ltd. method (especially pages 115 to 133) or Japanese Patent Application Publication No. 2003-262716, Japanese Patent Application Publication No. 2003-185831, Japanese Patent Application Publication No. 2003-261827, Japanese Patent Application Publication No. 2012-126830, Japan The method described in Japanese Patent Application Publication No. 2006-169325, etc.

The composition layer formed by applying the composition may be dried (prebaked). When prebaking is performed, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and further preferably 110°C or lower. The lower limit can be set to 50°C or higher, for example, or to 80°C or higher. The prebaking time is preferably 10 to 3000 seconds, more preferably 40 to 2500 seconds, and further preferably 80 to 220 seconds. Drying can be performed using a heating plate, an oven, etc.

The film manufacturing method may further include a pattern forming step. Examples of the pattern forming method include a pattern forming method using photolithography and a pattern forming method using dry etching. The pattern forming method using photolithography is preferred. Furthermore, when the film of the present invention is used as a flat film, the pattern forming step does not need to be performed. The pattern forming steps will be described in detail below.

(Pattern formation using photolithography) The pattern forming method using photolithography includes a step of exposing a composition layer formed by applying the composition of the present invention in a pattern (exposure step) and a step of developing and removing the unexposed portions of the composition layer to form a pattern (development step). steps) are better. The step of baking the developed pattern (post-baking step) can be set as needed. Each step is explained below.

In the exposure step, the composition layer is exposed in a pattern. For example, the composition layer can be exposed in a pattern by using a stepper exposure machine, a scanning exposure machine, or the like through a mask having a predetermined mask pattern. Thereby, the exposed portion can be hardened.

Examples of radiation (light) that can be used during exposure include g-rays, i-rays, and the like. In addition, light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light having a wavelength of 300 nm or less include KrF rays (wavelength: 248 nm), ArF rays (wavelength: 193 nm), and KrF rays (wavelength: 248 nm) are preferred. In addition, long-wavelength light sources of 300 nm or more can also be used.

In addition, during exposure, light may be continuously irradiated for exposure, or pulse irradiation may be performed for exposure (pulse exposure). In addition, pulse exposure refers to an exposure method in which light is irradiated and paused repeatedly for a short period of time (for example, milliseconds or less) to perform exposure.

The irradiation amount (exposure amount) is, for example, preferably 0.03 to 2.5 J/cm ² , and more preferably 0.05 to 1.0 J/cm ² . The oxygen concentration during exposure can be appropriately selected. In addition to performing the exposure in the atmosphere, for example, the exposure can also be performed in a low-oxygen environment with an oxygen concentration of 19% by volume or less (for example, 15% by volume, 5% by volume, or substantially no oxygen). , it can also be exposed in a high oxygen environment with an oxygen concentration exceeding 21 volume % (for example, 22 volume %, 30 volume % or 50 volume %). In addition, the exposure illuminance can be appropriately set, and can usually be selected from the range of 1000W/m ² to 100000W/m ² (for example, 5000W/m ² , 15000W/m ² or 35000W/m ² ). The conditions of oxygen concentration and exposure illumination can be appropriately combined. For example, the oxygen concentration can be set to 10 volume % and the illumination intensity is 10000 W/m ² , the oxygen concentration can be set to 35 volume % and the illumination intensity is 20000 W/m ² , etc.

Next, the composition layer is developed to remove the unexposed portions of the exposed composition layer to form a pattern. The composition layer of the unexposed portion can be removed by development using a developer. Thereby, the composition layer of the unexposed portion in the exposure step is eluted into the developer, and only the photohardened portion remains on the support. The temperature of the developer is preferably 20 to 30°C, for example. The development time is preferably 20 to 180 seconds. In addition, in order to improve the residue removal performance, the following steps can be repeated several times: the step of shaking off the developer every 60 seconds and then supplying new developer.

Examples of the developer include organic solvents, alkali developers, and the like, and an alkali developer is preferably used. As an alkali developer, an alkaline aqueous solution (alkali developer) obtained by diluting an alkali agent with pure water is preferred. Examples of the alkaline agent include ammonia, ethylamine, diethylamine, dimethylethanolamine, diethyleneglycolamine, diethanolamine, hydroxylamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, hydrogen Tetrapropylammonium oxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, pyrrole, piperidine, 1 , 8-diazabicyclo[5.4.0]-7-undecene and other organic alkaline compounds or inorganic compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate, sodium metasilicate, etc. Basic compounds. From environmental and safety considerations, it is better for the alkaline agent to be a compound with a large molecular weight. The concentration of the alkali agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, and more preferably 0.01 to 1% by mass. Moreover, the developer may further contain a surfactant. As the surfactant, nonionic surfactants are preferred. From the viewpoint of convenience in transportation and storage, the developer can be first produced as a concentrated solution and then diluted to a required concentration when used. The dilution ratio is not particularly limited, but can be set in the range of 1.5 to 100 times, for example. In addition, it is also preferable to wash (rinse) with pure water after development. Moreover, it is preferable to perform rinsing as follows: while rotating the support on which the developed composition layer is formed, a rinsing liquid is supplied to the developed composition layer. It is also preferable to move the nozzle that sprays the rinse liquid from the center of the support body to the peripheral edge of the support body. At this time, when moving the nozzle from the center part of the support body to the peripheral part, the nozzle may be moved while gradually reducing the moving speed. By performing flushing in this manner, in-plane unevenness of flushing can be suppressed. In addition, the same effect can also be obtained by gradually reducing the rotation speed of the support body while moving the nozzle from the center part of the support body to the peripheral part.

After development, it is preferable to perform additional exposure processing or heat processing (post-baking) after drying. Additional exposure processing or post-baking is a post-development hardening process used to achieve complete hardening. For example, the heating temperature in post-baking is preferably 100 to 240°C, and more preferably 200 to 240°C. The developed film can be post-baked in a continuous or intermittent manner using a heating mechanism such as a heating plate, a convection oven (hot air circulation dryer), or a high-frequency heating machine so that the above conditions are met. When performing additional exposure processing, it is preferable that the light used for exposure is light with a wavelength of 400 nm or less. In addition, the additional exposure process can be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

(When pattern formation using dry etching method) When forming a pattern by a dry etching method, the composition layer formed by applying the above composition on a support is cured to form a cured product layer, and then a patterned layer is formed on the cured product layer. The photoresist layer is then used as a mask, and etching gas is used to dry-etch the hardened material layer. When forming the photoresist layer, it is better to perform a pre-baking process. Regarding the content of pattern formation by dry etching, the description in paragraphs 0010 to 0067 of Japanese Patent Application Laid-Open No. 2013-064993 can be referred to, and the content is incorporated into this specification.

＜Optical Filter＞ The optical filter of the present invention has the film of the present invention described above. Examples of types of optical filters include infrared cutoff filters, infrared transmission filters, and the like.

The optical filter of the present invention may further include a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, etc., in addition to the film of the present invention. Examples of the ultraviolet absorbing layer include the absorbing layers described in paragraphs 0040 to 0070 and 0119 to 0145 of International Publication No. 2015/099060. Examples of the dielectric multilayer film include those described in paragraphs 0255 to 0259 of Japanese Patent Application Laid-Open No. 2014-041318. As the copper-containing layer, a glass substrate made of copper-containing glass (copper-containing glass substrate) or a layer containing a copper complex (copper complex-containing layer) can also be used. Examples of the copper-containing glass substrate include copper-containing phosphate glass, copper-containing fluorophosphate glass, and the like. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC TECHNO GLASS Co., Ltd.), BG-60, BG-61 (the above, manufactured by Schott AG), CD5000 (manufactured by HOYA CORPORATION), and the like.

＜Solid-state imaging device＞ The solid-state imaging element of the present invention includes the film of the present invention described above. The structure of the solid-state imaging element is not particularly limited as long as it has the structure of the film of the present invention and functions as a solid-state imaging element. For example, the following structures are mentioned.

The above-mentioned structure has a transmission electrode composed of a plurality of photodiodes, polycrystalline silicon, etc., which constitutes the light-receiving area of the solid-state imaging element, on the support body, and the photodiode and the transmission electrode have an opening in the light-receiving part only of the photodiode. A light-shielding film made of tungsten or the like, an element protective film made of silicon nitride or the like formed to cover the entire light-shielding film and the light-receiving part of the photodiode, and the film of the present invention on the element protective film. Furthermore, the element protection film may be provided with a light condensing mechanism (for example, a microlens, etc.; the same applies below) below (near the support side) the film of the present invention, or the film of the present invention may be provided with a condensing mechanism. The structure of the light mechanism, etc. Furthermore, the color filter may have a structure in which, for example, a film forming each pixel is embedded in a space divided into a grid shape by partition walls. At this time, it is preferable that the refractive index of the partition wall is lower than that of each pixel. Examples of imaging devices having such a structure include devices described in Japanese Patent Application Laid-Open No. 2012-227478 and Japanese Patent Application Laid-Open No. 2014-179577.

<Image display device> The image display device of the present invention includes the film of the present invention. Examples of image display devices include liquid crystal display devices, organic electroluminescence (organic EL) display devices, and the like. The definition and details of the image display device are described in, for example, "Electronic Display Device (by Akio Sasaki, published by Kogyo Chosakai Publishing Co., Ltd., 1990)" and "Display Device (by Junaki Ibuki, Sangyo Tosho Publishing)" Co., Ltd., issued in 1989)" etc. Further, the liquid crystal display device is described in, for example, "Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, published by Kogyo Chosakai Publishing Co., Ltd., 1994)". The liquid crystal display device to which the present invention can be applied is not particularly limited. For example, it can be applied to various types of liquid crystal display devices described in the above-mentioned “Next Generation Liquid Crystal Display Technology”. The image display device may have a white organic EL element. As a white organic EL element, a series structure is preferred. Regarding the series structure of organic EL elements, it is described in Japanese Patent Application Laid-Open No. 2003-045676, supervised by Mikami Akiyoshi, "The Frontier of Organic EL Technology Development - High Brightness, High Precision, Long Lifetime, and Technology Collection-", TECHNICAL INFORMATION INSTITUTE CO.,LTD., pages 326～328, 2008, etc. The spectrum of the white light emitted by the organic EL element is preferably one with strong maximum luminescence peaks in the blue region (430-485nm), green region (530-580nm) and yellow region (580-620nm). In addition to these luminescence peaks, it is more preferable to have a maximum luminescence peak in the red region (650 to 700 nm).

＜Infrared sensor＞ The infrared sensor of the present invention includes the film of the present invention described above. The structure of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. Hereinafter, an embodiment of the infrared sensor of the present invention will be described with reference to the drawings.

In FIG. 1 , reference numeral 110 denotes a solid-state imaging element. An infrared cut filter 111 and an infrared transmitting filter 114 are arranged in the imaging area of the solid-state imaging element 110 . Furthermore, a color filter 112 is arranged on the infrared cut filter 111 . Microlenses 115 are arranged on the incident light hν side of the color filter 112 and the infrared transmission filter 114 . A planarization layer 116 is formed to cover the microlens 115 .

The infrared cut filter 111 can be formed using the composition of the present invention. The color filter 112 is a color filter formed with pixels that transmit and absorb light of a specific wavelength in the visible range, and is not particularly limited, and conventionally known color filters for forming pixels can be used. For example, a color filter in which red (R), green (G), and blue (B) pixels are formed may be used. For example, the description in paragraphs 0214 to 0263 of Japanese Patent Application Laid-Open No. 2014-043556 can be referred to, and this content is incorporated into this specification. The characteristics of the infrared transmission filter 114 can be selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the composition of the present invention.

In the infrared sensor shown in FIG. 1 , an infrared cutoff filter (other infrared cutoff filter) different from the infrared cutoff filter 111 may be further disposed on the planarization layer 116 . Examples of other infrared cut filters include those having a copper-containing layer and/or a dielectric multilayer film. Details of these include those mentioned above. In addition, as another infrared cut filter, a double bandpass filter can be used.

＜Camera Film Set＞ The camera film set of the present invention includes a solid-state imaging element and the film of the present invention. The camera film assembly preferably further has a lens and a circuit for processing images obtained from the solid-state imaging element. The solid-state imaging element used in the camera film group may be the above-mentioned solid-state imaging element of the present invention or a known solid-state imaging element. In addition, known ones can be used as the lens used in the camera film group and the circuit for processing the image obtained from the above-mentioned solid-state imaging element. As an example of a camera film set, reference can be made to the camera film set described in Japanese Patent Application Laid-Open No. 2016-006476 and Japanese Patent Application Laid-Open No. 2014-197190, the contents of which are incorporated into this specification. [Example]

Hereinafter, the present invention will be described in further detail with reference to examples. The materials, usage amounts, proportions, treatment contents, treatment procedures, etc. shown in the following examples can be appropriately changed as long as they do not deviate from the gist of the present invention.

<Synthesis Example> (Synthesis Example 1) Synthesis of Compound Ae-1 Compound Ae-1 was synthesized according to the following synthesis scheme. [Chemical 41]

Intermediate 1 was synthesized by the method described in US Patent Application Publication No. 2014/0061505. Intermediate 2 was synthesized by the method described in International Publication No. 2011/107501. Intermediate 3 was synthesized by the method described in International Publication No. 2014/088063. Intermediate 4 was synthesized by the method described in Bioconjugate Chemistry (2017), 28(5), 1552-1559. Intermediate 5 was synthesized by the method described in Organic and Biomolecular Chemistry, 2011, vol.9, #23, pages 8122-8129. Intermediate 5 (4.4 g, 7.0 mmol) and squaric acid (0.36 g, 3.1 mmol) were azeotropically dehydrated in n-butanol/toluene (26 mL/60 mL) and heated to reflux for 12 hours. The reaction solution was cooled and the solvent was evaporated under reduced pressure, and the residue was purified by silica gel column chromatography (developing solvent: chloroform). After the chloroform was removed by distillation under reduced pressure, the solid was ultrasonically dispersed in methanol and filtered by adsorption to obtain the target compound (compound A-e-1) (green crystal, 1.3 g, yield 31%). Identification data of compound A-e-1: MALDI TOF-MASS (time-of-flight mass analysis method) Calc.for[M+H]+: 1332.5 found: 1332.5

＜Manufacture of composition＞ The components described in the following table were mixed and stirred in the mass parts described in the following table, and then filtered through a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm, thereby producing a composition.

[Table 1]    Infrared absorbers (specific compounds) Infrared absorber (other) Resin UV absorber Antioxidants Solvent Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Example 1 Aa-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 2 Aa-2 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 3 Aa-3 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 4 Ab-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 5 Ab-2 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 6 Ab-3 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 7 Ab-4 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 8 Ab-5 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 9 Ab-6 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 10 Ab-7 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 11 Ab-8 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 12 Ab-9 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 13 Ab-10 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 14 Ab-11 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 15 Ab-12 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 16 Ab-13 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 17 Ab-14 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 18 Ab-15 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 19 Ac-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 20 Ac-2 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 21 Ac-3 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 22 Ac-4 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 23 Ad-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 24 Ad-2 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 25 Ad-3 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 26 Ae-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 27 Ae-2 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 28 Ae-3 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 29 Ae-4 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 30 Ae-5 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 31 Ae-6 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 32 Ae-7 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 33 Ae-8 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 34 Ae-9 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 35 Ae-10 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 36 Ae-11 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 37 Ae-12 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 38 Ae-13 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 39 Ae-14 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 40 Ae-15 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 41 Ae-16 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 42 Af-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 43 Af-2 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 44 Af-3 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 45 Af-4 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 [Table 2]    Infrared absorbers (specific compounds) Infrared absorber (other) Resin UV absorber Antioxidants Solvent Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Example 46 Ag-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 47 Ag-2 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 48 Ag-3 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 49 Ag-4 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 50 Ah-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 51 Ah-2 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 52 Ai-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 53 Ai-2 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 54 Ai-3 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 55 Ai-4 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 56 Ai-5 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 57 Ai-6 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 58 Ak-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 59 Ak-2 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 60 Ak-3 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 61 Ak-4 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 62 Ak-5 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 63 Ak-6 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 64 Ae-1 Ag-4 0.02 0.02 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 65 Ae-1 0.04 Ba-2 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 66 Ae-1 0.04 Ba-3 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 67 Ae-1 0.035 Ba-1 Bb-1 0.02 0.1 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 68 Ae-1 0.035 Ba-1 Bb-2 0.02 0.1 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 69 Ae-1 0.035 Ba-1 Bb-3 0.02 0.1 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 70 Ae-1 0.035 Ba-1 Bb-4 0.02 0.1 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 71 Ae-1 0.035 Ba-1 Bb-5 0.02 0.1 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 72 Ae-1 0.038 Ba-1 Bb-6 0.075 0.2 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 73 Ae-1 0.038 Ba-1 Bb-7 0.075 0.2 C-1 99.2 D-1 0.17 E-1 0.3 F-1 400 Example 74 Ae-1 0.038 Ba-1 Bb-8 0.075 0.2 C-1 99.2 D-1 0.17 E-1 0.3 F-1 400 Example 75 Ae-1 0.05 Ba-1 Bc-1 0.12 0.05 C-1 99.2 D-1 0.17 E-1 0.3 F-1 400 Example 76 Ae-1 0.05 Ba-1 Bc-1 Bc-2 0.12 0.05 0.04 C-1 99.3 D-1 0.17 E-1 0.3 F-1 400 Example 77 Ae-1 0.04 Ba-1 Bc-3 0.09 0.005 C-1 99.3 D-1 0.17 E-1 0.3 F-1 400 [table 3]    Infrared absorbers (specific compounds) Infrared absorber (other) Resin UV absorber Antioxidants Solvent Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Example 78 Ae-1 0.06 Ba-1 Bd-1 0.07 0.04 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 79 Ae-1 0.06 Ba-1 Bd-2 0.07 0.04 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 80 Ae-1 0.06 Ba-1 Bd-3 0.07 0.05 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 81 Ae-1 0.06 Ba-1 Bd-4 0.07 0.05 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 82 Ae-1 0.04 Ba-1 Be-1 0.09 0.08 C-1 99.3 D-1 0.17 E-1 0.3 F-1 400 Example 83 Ae-1 0.04 Ba-1 0.09 C-2 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 84 Ae-1 0.04 Ba-1 0.09 C-3 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 85 Ae-1 0.04 Ba-1 0.09 C-4 99.4 D-1 0.17 E-1 0.3 F-1 400 Example 86 Ae-1 0.04 Ba-1 0.09 C-1 99.4 D-2 0.17 E-1 0.3 F-1 400 Example 87 Ae-1 0.04 Ba-1 0.09 C-1 99.4 D-3 0.17 E-1 0.3 F-1 400 Example 88 Ae-1 0.04 Ba-1 0.09 C-1 99.4 D-4 0.17 E-1 0.3 F-1 400 Example 89 Ae-1 0.04 Ba-1 0.09 C-1 99.4 D-5 0.17 E-1 0.3 F-1 400 Example 90 Ae-1 0.04 Ba-1 0.09 C-1 99.4 D-6 0.17 E-1 0.3 F-1 400 Example 91 Ae-1 0.04 Ba-1 0.09 C-1 99.4 D-7 0.17 E-1 0.3 F-1 400 Example 92 Ae-1 0.04 Ba-1 0.09 C-1 99.4 D-8 0.17 E-1 0.3 F-1 400 Example 93 Ae-1 0.04 Ba-1 0.09 C-1 99.4 D-9 0.17 E-1 0.3 F-1 400 Example 94 Ae-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-2 0.3 F-1 400 Example 95 Ae-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-3 0.3 F-1 400 Example 96 Ae-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-4 0.3 F-1 400 Example 97 Ae-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-5 0.3 F-1 400 Example 98 Ae-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-6 0.3 F-1 400 Example 99 Ae-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-7 0.3 F-1 400 Example 100 Ae-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 E-5 0.15 0.15 F-1 400 Example 101 Ae-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-2 400 Example 102 Ael 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-3 F-4 280 120 Comparative example 1 X-1 0.04 Ba-1 0.09 C-1 99.4 D-1 0.17 E-1 0.3 F-1 400 [Table 4]    Infrared absorbers (specific compounds) Infrared absorber (other) Resin Hardener UV absorber Antioxidants surfactant Solvent Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Example 201 Aa-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 202 Aa-2 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 203 Aa-3 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 204 Ab-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 205 Ab-2 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 206 Ab-3 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 207 Ab-4 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 208 Ab-5 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 209 Ab-6 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 210 Ab-7 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 211 Ab-8 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 212 Ab-9 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 213 Ab-10 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 214 Ab-11 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 215 Ab-12 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 216 Ab-13 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 217 Ab-14 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 218 Ab-15 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 219 Ac-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 220 Ac-2 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 221 Ac-3 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 222 Ac-4 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 223 Ad-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 224 Ad-2 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 225 Ad-3 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 226 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 227 Ae-2 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 [table 5]    Infrared absorbers (specific compounds) Infrared absorber (other) Resin Hardener UV absorber Antioxidants surfactant Solvent Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Example 228 Ae-3 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 229 Ae-4 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 230 Ae-5 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 231 Ae-6 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 232 Ae-7 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 233 Ae-8 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 234 Ae-9 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 235 Ae-10 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 236 Ae-11 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 237 Ae-12 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 238 Ae-13 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 239 Ae-14 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 240 Ae-15 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 241 Ae-16 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 242 Af-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 243 Af-2 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 244 Af-3 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 245 Af-4 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 246 Ag-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 247 Ag-2 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 248 Ag-3 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 249 Ag-4 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 250 Ah-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 251 Ah-2 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 252 Ai-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 253 Ai-2 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 254 Ai-3 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 [Table 6]    Infrared absorbers (specific compounds) Infrared absorber (other) Resin Hardener UV absorber Antioxidants surfactant Solvent Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Example 255 Ai-4 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 256 Ai-5 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 257 Ai-6 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 258 Ak-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 259 Ak-2 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 260 Ak-3 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 261 Ak-4 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 262 Ak-5 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 263 Ak-6 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 264 Ae-1 Ag-4 0.40 0.40 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 265 Ae-1 0.80 Ba-2 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 266 Ae-1 0.80 Ba-3 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 267 Ae-1 0.70 Ba-1 Bb-1 0.40 2.00 C-5 92.7 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 268 Ae-1 0.70 Ba-1 Bb-2 0.40 2.00 C-5 92.7 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 269 Ae-1 0.70 Ba-1 Bb-3 0.40 2.00 C-5 92.7 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 270 Ae-1 0.70 Ba-1 Bb-4 0.40 2.00 C-5 92.7 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 271 Ae-1 0.70 Ba-1 Bb-5 0.40 2.00 C-5 92.7 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 272 Ae-1 0.76 Ba-1 Bb-6 1.50 4.00 C-5 89.6 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 273 Ae-1 0.76 Ba-1 Bb-7 1.50 4.00 C-5 89.6 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 [Table 7]    Infrared absorbers (specific compounds) Infrared absorber (other) Resin Hardener UV absorber Antioxidants surfactant Solvent Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Example 274 Ae-1 0.76 Ba-1 Bb-8 1.50 4.00 C-5 89.6 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 275 Ae-1 1.00 Ba-1 Bc-1 2.40 1.00 C-5 91.4 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 276 Ae-1 1.00 Ba-1 Bc-1 Bc-2 2.40 1.00 0.80 C-5 90.6 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 277 Ae-1 0.80 Ba-1 Bc-3 1.80 0.10 C-5 93.1 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 278 Ae-1 1.20 Ba-1 Bd-1 1.40 0.80 C-5 92.4 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 279 Ae-1 1.20 Ba-1 Bd-2 1.40 0.80 C-5 92.4 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 280 Ae-1 1.20 Ba-1 Bd-3 1.40 1.00 C-5 92.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 281 Ae-1 1.20 Ba-1 Bd-4 1.40 1.00 C-5 92.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 282 Ae-1 0.80 Ba-1 Be-1 1.80 1.60 C-5 91.6 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 283 Ae-1 0.80 Ba-1 1.80 C-6 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 284 Ae-1 0.80 Ba-1 1.80 C-7 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 285 Ae-1 0.80 Ba-1 1.80 C-8 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 286 Ae-1 0.80 Ba-1 1.80 C-9 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 287 Ae-1 0.80 Ba-1 1.80 C-10 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 288 Ae-1 0.80 Ba-1 1.80 C-11 C-13 46.6 46.6 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 289 Ae-1 0.80 Ba-1 1.80 C-12 C-13 46.6 46.6 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 [Table 8]    Infrared absorbers (specific compounds) Infrared absorber (other) Resin Hardener UV absorber Antioxidants surfactant Solvent Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Example 290 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-2 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 291 Ae-1 0.80 Ba-1 1.80 C-11 C-13 74.1 - - D-2 20 E-1 3.3 G-1 0.01 F-5 233 Example 292 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-3 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 293 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-4 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 294 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-5 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 295 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-6 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 296 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-7 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 297 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-8 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 298 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-9 0.85 E-1 3.3 G-1 0.01 F-5 233 Example 299 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-2 3.3 G-1 0.01 F-5 233 Example 300 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-3 3.3 G-1 0.01 F-5 233 Example 301 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-4 3.3 G-1 0.01 F-5 233 Example 302 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-5 3.3 G-1 0.01 F-5 233 Example 303 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-6 3.3 G-1 0.01 F-5 233 Example 304 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-7 3.3 G-1 0.01 F-5 233 Example 305 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 E-5 1.7 1.6 G-1 0.01 F-5 233 Example 306 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-2 0.01 F-5 233 Example 307 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-3 0.01 F-5 233 Example 308 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-4 0.01 F-5 233 Example 309 Ae-1 0.80 Ba-1 1.80 C-5 90.2 H-1 3 D-1 0.85 E-2 3.3 G-1 0.01 F-5 233 Example 310 Ae-1 0.80 Ba-1 1.80 C-5 90.2 H-2 3 D-1 0.85 E-2 3.3 G-1 0.01 F-5 233 Example 311 Ae-1 0.80 Ba-1 1.80 C-5 90.2 H-3 3 D-1 0.85 E-2 3.3 G-1 0.01 F-5 233 Example 312 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-6 233 Example 313 Ae-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 F-7 117 116 Comparative example 2 X-1 0.80 Ba-1 1.80 C-5 93.2 - - D-1 0.85 E-1 3.3 G-1 0.01 F-5 233 [Table 9]    Infrared absorbers (specific compounds) Infrared absorber (other) Resin polymeric compound Photopolymerization initiator UV absorber Antioxidants surfactant polymerization inhibitor sealant Solvent Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Example 401 Aa-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 402 Aa-2 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 403 Aa-3 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 404 Ab-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 405 Ab-2 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 406 Ab-3 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 407 Ab-4 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 408 Ab-5 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 409 Ab-6 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 410 Ab-7 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 411 Ab-8 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 412 Ab-9 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 413 Ab-10 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 414 Ab-11 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 415 Ab-12 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 416 Ab-13 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 417 Ab-14 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 418 Ab-15 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 419 Ac-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 420 Ac-2 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 421 Ac-3 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 422 Ac-4 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 423 Ad-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 424 Ad-2 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 425 Ad-3 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 426 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 427 Ae-2 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 428 Ae-3 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 429 Ae-4 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 [Table 10]    Infrared absorbers (specific compounds) Infrared absorber (other) Resin polymeric compound Photopolymerization initiator UV absorber Antioxidants surfactant polymerization inhibitor sealant Solvent Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Example 430 Ae-5 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 431 Ae-6 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 432 Ae-7 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 433 Ae-8 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 434 Ae-9 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 435 Ae-10 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 436 Ae-11 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 437 Ae-12 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 438 Ae-13 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 439 Ae-14 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 440 Ae-15 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 441 Ae-16 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 442 Af-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 443 Af-2 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 444 Af-3 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 445 Af-4 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 446 Ag-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 447 Ag-2 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 448 Ag-3 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 449 Ag-4 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 450 Ah-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 451 Ah-2 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 452 Ai-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 453 Ai-2 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 454 Ai-3 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 455 Ai-4 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 456 Ai-5 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 457 Ai-6 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 458 Ak-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 [Table 11]    Infrared absorbers (specific compounds) Infrared absorber (other) Resin polymeric compound Photopolymerization initiator UV absorber Antioxidants surfactant polymerization inhibitor sealant Solvent Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Example 459 Ak-2 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 460 Ak-3 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 461 Ak-4 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 462 Ak-5 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 463 Ak-6 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 464 Ae-1 Ag-4 2.0 2.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 465 Ae-1 4.0 Ba-2 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 466 Ae-1 4.0 Ba-3 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 467 Ae-1 3.5 Ba-1 Bb-1 2.0 10 C-14 46.5 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 01003 F-5 400 Example 468 Ae-1 3.5 Ba-1 Bb-2 2.0 10 C-14 46.5 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 469 Ae-1 3.5 Ba-1 Bb-3 2.0 10 C-14 46.5 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 470 Ae-1 3.5 Ba-1 Bb-4 2.0 10 C-14 46.5 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 471 Ae-1 3.5 Ba-1 Bb-5 2.0 10 C-14 46.5 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 472 Ae-1 3.8 Ba-1 Bb-6 7.5 20 C-14 30.7 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 473 Ae-1 3.8 Ba-1 Bb-7 7.5 20 C-14 30.7 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 474 Ae-1 3.8 Ba-1 Bb-8 7.5 20 C-14 30.7 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 475 Ae-1 5.0 Ba-1 Bc-1 12 5.0 C-14 40.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 476 Ae-1 5.0 Ba-1 Bc-1 Bc-2 12 5.0 4.0 C-14 36.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 [Table 12]    Infrared absorbers (specific compounds) Infrared absorber (other) Resin polymeric compound Photopolymerization initiator UV absorber Antioxidants surfactant polymerization inhibitor sealant Solvent Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Example 477 Ae-1 4.0 Ba-1 Bc-3 9.0 0.5 C-14 48.5 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 478 Ae-1 6.0 Ba-1 Bd-1 7.0 4.0 C-14 45.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 479 Ae-1 6.0 Ba-1 Bd-2 7.0 4.0 C-14 45.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 480 Ae-1 6.0 Ba-1 Bd-3 7.0 5.0 C-14 44.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 481 Ae-1 6.0 Ba-1 Bd-4 7.0 5.0 C-14 44.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 482 Ae-1 4.0 Ba-1 Be-1 9.0 8.0 C-14 41.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 483 Ae-1 4.0 Ba-1 9.0 C-10 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 484 Ae-1 4.0 Ba-1 9.0 C-15 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 485 Ae-1 4.0 Ba-1 9.0 C-16 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 486 Ae-1 4.0 Ba-1 9.0 C-17 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 487 Ae-1 4.0 Ba-1 9.0 C-18 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 488 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-2 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 489 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-3 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 490 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-2 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 491 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-3 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 492 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-4 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 493 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-5 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 494 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-2 J-3 5 5 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 495 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-2 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 [Table 13]    Infrared absorbers (specific compounds) Infrared absorber (other) Resin polymeric compound Photopolymerization initiator UV absorber Antioxidants surfactant polymerization inhibitor sealant Solvent Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Kind parts by mass Example 496 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-3 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 497 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-4 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 498 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-5 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 499 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-6 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 500 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-7 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 501 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-8 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 502 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-9 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400 Example 503 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-2 3 G-1 0.01 K-1 0.003 F-5 400 Example 504 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-3 3 G-1 0.01 K-1 0.003 F-5 400 Example 505 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-4 3 G-1 0.01 K-1 0.003 F-5 400 Example 506 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-5 3 G-1 0.01 K-1 0.003 F-5 400 Example 507 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-6 3 G-1 0.01 K-1 0.003 F-5 400 Example 508 Ae-1 4.0 Ba-1 9.0 C-14 49.0 1-1 20 J-1 10 D-1 5 E-7 3 G-1 0.01 K-1 0.003 F-5 400 Example 509 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 E-5 1.5 1.5 G-1 0.01 K-1 0.003 F-5 400 Example 510 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-2 0.01 K-1 0.003 F-5 400 Example 511 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-3 0.01 K-1 0.003 F-5 400 Example 512 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-4 0.01 K-1 0.003 F-5 400 Example 513 Ae-1 4.0 Ba-1 9.0 C-14 46.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 L-1 0.003 3 F-5 400 Example 514 Ae-1 4.0 Ba-1 9.0 C-14 46.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 L-2 0.003 3 F-5 400 Example 515 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-6 400 Example 516 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 F-7 200 200 Example 517 Ae-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 F-8 200 200 Comparative example 3 X-1 4.0 Ba-1 9.0 C-14 49.0 I-1 20 J-1 10 D-1 5 E-1 3 G-1 0.01 K-1 0.003 F-5 400

Details of the materials listed in the above table are as follows.

(Infrared absorber) A-a-1～A-a-3, A-b-1～A-b-15, A-c-1～A-c-4, A-d-1～A-d-3, A-e-1～A-e-16, A-f-1～A-f-4, A-g- 1 to A-g-4, A-h-1, A-h-2, A-i-1 to A-i-6, A-k-1 to A-k-6: Compounds A-a-1 to A-a-3, A-b- exemplified in the specific examples of the above-mentioned specific compounds. 1～A-b-15, A-c-1～A-c-4, A-d-1～A-d-3, A-e-1～A-e-16, A-f-1～A-f-4, A-g-1～A-g-4, A-h-1, A-h-2, A-i-1～A-i-6, A-k-1～A-k-6

X-1: Compound with the following structure (comparative compound) [Chemical 42]

Ba-1 to Ba-3: Compounds with the following structure (phthalocyanine compounds) Bb-1 to Bb-8: Compounds with the following structure (pentamethyl compounds) Bc-1 to Bc-3: Compounds with the following structure Compounds (squaraine compounds) Bd-1 to Bd-3: Compounds with the following structure (heptaptine compounds) Bd-4: Compounds with the following structure (cyanine compounds) Be-1: Compounds with the following structure (immonium compound) [Chemical 43] [Chemical 44] [Chemical 45]

(Resin) C-1: A resin with the following structure (weight average molecular weight 137000, number average molecular weight 32000, glass transition temperature 165°C) was synthesized by the method described in Resin Synthesis Example 1 of Japanese Patent Application Publication No. 2021-134350. C-2: A resin with the following structure (weight average molecular weight 188000, number average molecular weight 75000, glass transition temperature 285°C) was synthesized by the method described in Resin Synthesis Example 2 of Japanese Patent Application Laid-Open No. 2021-134350. : A resin having the following structure was synthesized by the method described in Resin Synthesis Example 3 of Japanese Patent Application Publication No. 2021-134350 (the numerical value indicated on the main chain represents the molar ratio of the repeating unit. Glass transition temperature: 310°C. Logarithmic viscosity 0.87) C-4: ACRYVIEWA (acrylic resin manufactured by NIPPON SHOKUBAI CO., LTD.) C-5: Resin with the following structure (the numerical value marked on the main chain indicates the mass ratio of the repeating unit. Weight average molecular weight 26100, number average molecular weight 8600, epoxy equivalent 355g/eq, acid value 163mgKOH/g, glass transition temperature 133℃) C-6: Resin with the following structure (the value marked on the main chain indicates the mass ratio of the repeating unit. Weight average molecular weight 22900, quantity Average molecular weight 8800, epoxy equivalent 316g/eq, acid value 130mgKOH/g, glass transition temperature 124℃) C-7: Resin with the following structure (the value marked on the main chain indicates the mass ratio of the repeating unit. Weight average molecular weight 18300 , number average molecular weight 9100, epoxy equivalent 284g/eq, acid value 98mgKOH/g, glass transition temperature 134℃) C-8: Resin with the following structure (the value marked on the main chain indicates the mass ratio of the repeating unit. Weight average Molecular weight 20000, number average molecular weight 8300, epoxy equivalent 284g/eq, acid value 130mgKOH/g, glass transition temperature 136°C) C-9: Resin with the following structure (the value marked on the main chain indicates the mass ratio of the repeating unit. Weight average molecular weight 21100, number average molecular weight 8500, epoxy equivalent 355g/eq, acid value 157mgKOH/g, glass transition temperature 157℃) C-10: Resin with the following structure (the value marked on the main chain indicates the mass of the repeating unit Ratio. Weight average molecular weight 9500, number average molecular weight 5800) C-11: Resin with the following structure (the value marked on the main chain indicates the mass ratio of the repeating unit. Weight average molecular weight 23700, number average molecular weight 10300, epoxy equivalent 284g/ eq, glass transition temperature 83°C) C-12: EPICLON N-695 (manufactured by DIC Corporation, novolak type epoxy resin) C-13: Resin with the following structure (the numerical value indicated on the main chain represents the mole of the repeating unit Ratio. Weight average molecular weight 30000, number average molecular weight 15100, acid value 113mgKOH/g) C-14: Resin with the following structure (the value marked on the main chain indicates the weight ratio of the repeating unit. Weight average molecular weight 9700, number average molecular weight 5700, acid value 130mgKOH/g) C-15: Resin with the following structure (the value marked on the main chain indicates the weight ratio of repeating units. Weight average molecular weight 15100, number average molecular weight 7000, acid Value 136mgKOH/g) C-16: Resin with the following structure (the value marked on the main chain indicates the weight ratio of the repeating unit. Weight average molecular weight 17000, number average molecular weight 7700, acid value 32mgKOH/g) C-17: The following Resin of the structure (the numerical value marked on the main chain indicates the weight ratio of the repeating unit. Weight average molecular weight 16000, number average molecular weight 5800, acid value 101 mgKOH/g) C-18: Resin of the following structure (the numerical value marked on the main chain indicates Molar ratio of repeating units. Weight average molecular weight 10,000, number average molecular weight 3,900, acid value 69 mgKOH/g) [Chemical 46] [Chemical 47]

(Ultraviolet absorber) D-1: Compound with the following structure (absorption maximum wavelength in methylene chloride is 394 nm) D-2: Uvinul3050 (manufactured by BASF, compound with the following structure) D-3: Tinuvin477 (manufactured by BASF) , hydroxyphenyltrifluoroethylene-based ultraviolet absorber) D-4: Tinuvin 326 (manufactured by BASF, compound with the following structure) D-5: Compound (2)-22 (below) described in International Publication No. 2021/131355 (compound with the following structure) D-6: Compound (1)-46 described in International Publication No. 2021/131355 (compound with the following structure) D-7: Compound A-1 (compound A-1 described in International Publication No. 2021/132247 Compound with the following structure) D-8: NeoHeliopan357 (manufactured by Symrise AG, compound with the following structure) D-9: Compound with the following structure [Chemical 48]

(Antioxidant) E-1: ADEKA STAB AO-60 (manufactured by ADEKA CORPORATION, compound with the following structure) E-2: ADEKA STAB AO-80 (manufactured by ADEKA CORPORATION, compound with the following structure) E-3: following Compound of the structure E-4: ADEKA STAB 2112 (manufactured by ADEKA CORPORATION, compound with the following structure) E-5: ADEKA STAB PEP-36 (manufactured by ADEKA CORPORATION, compound with the following structure) E-6: ADEKA STAB HP-10 (manufactured by ADEKA CORPORATION, compound with the following structure) E-7: ADEKA STAB AO-412S (manufactured by ADEKA CORPORATION, compound with the following structure) [Chemical 49]

(solvent) F-1: Dichloromethane F-2: N,N-dimethylacetamide F-3: cyclohexane F-4: xylene F-5: cyclopentanone F-6: cyclohexanone F-7: Propylene glycol monomethyl ether acetate (PGMEA) F-8: Propylene glycol monomethyl ether (PGME)

(Surfactant) G-1: FTX-218D (fluorine-based surfactant manufactured by Neos Corporation) G-2: MEGAFACE F-554 (fluorine-based surfactant manufactured by DIC Corporation) G-3: KF-6001 (Shin- Polysilicone surfactant manufactured by Etsu Chemical Co., Ltd.) G-4: Compound with the following structure (weight average molecular weight: 14,000, the value indicating the percentage of repeating units is molar %) [Chemical 50]

(hardener) H-1: Trimellitic acid H-2: 2-ethyl-4-methylimidazole H-3: Methyltetrahydrophthalic anhydride

(polymeric compound) I-1: KAYARAD DPHA (a mixture of dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate manufactured by Nippon Kayaku Co., Ltd.) I-2: KAYARAD RP-1040 (Ethylene oxide modified neopentaerythritol tetraacrylate manufactured by Nippon Kayaku Co., Ltd.) I-3: ARONIX M-510 (polyacid-modified acrylic oligomer manufactured by TOAGOSEI CO., LTD.)

(Photopolymerization initiator) J-1: Irgacure OXE01 (oxime ester compound manufactured by BASF) J-2: Compound No. 1 described in International Publication No. 2017/169819 (compound with the following structure) J-3: Compound No. 10 (compound with the following structure) described in International Publication No. 2017/169819 J-4: Compound No. 5 (compound with the following structure) described in Japanese Patent Application Publication No. 2019-168654 J-5 : Compound No. 73 (compound with the following structure) described in Japanese Patent Application Laid-Open No. 2019-168654 [Chemical 51]

(Polymerization inhibitor) K-1: p-methoxyphenol (adhesive agent) L-1, L-2: Compounds with the following structures [Chemical 52]

＜Manufacturing of membrane＞ (Manufacture Example 1) Method for producing a film using the compositions of Examples 1 to 102 and Comparative Example 1 Each composition was cast on a glass substrate, dried at 20° C. for 8 hours, and then peeled from the glass substrate. The peeled coating film was further dried at 100° C. for 8 hours under reduced pressure, and a film with a thickness of 0.1 mm, a length of 60 mm, and a width of 60 mm was obtained.

(Manufacture Example 2) Method for producing a film using the compositions of Examples 201 to 313 and Comparative Example 2 Each composition was applied on a glass substrate by a spin coating method, and then heated at 100° C. for 2 minutes using a hot plate, and then heated at 200° C. for 8 minutes to perform hardening treatment, thereby obtaining a film with a thickness of 10 μm.

(Manufacture Example 3) Method for producing a film using the compositions of Examples 401 to 517 and Comparative Example 3. Each composition was applied on a glass substrate by a spin coating method, and then heated at 100° C. for 2 seconds using a hot plate. minutes, thereby obtaining a composition layer. The obtained composition layer was exposed over the entire surface using an i-ray stepper exposure device FPA-3000i5+ (manufactured by Canon Inc.) at an exposure dose of 500 mJ/cm ² . Next, the exposed composition layer was heated at 200° C. for 5 minutes using a hot plate to perform a hardening process, thereby obtaining a film with a thickness of 1.0 μm.

＜Performance Evaluation＞ (Evaluation criteria for infrared shielding properties) The average transmittance of the obtained film in the wavelength range of 700 to 720 nm was measured using a spectrophotometer U-4100 (manufactured by Hitachi High-Tech Corporation), and the infrared shielding properties were evaluated based on the following criteria. A: The average transmittance within the wavelength range of 700nm ~ 720nm is ≤ 2% B: 2%＜average transmittance within the wavelength range of 700nm to 720nm≤4% C: 4%＜average transmittance within the wavelength range of 700nm to 720nm≤7% D: 7%＜average transmittance within the wavelength range of 700nm to 720nm≤10% E: 10%＜average transmittance within the wavelength range of 700nm~720nm

(Evaluation of visible light transmittance) The average transmittance of the obtained film in the wavelength range of 420 to 550 nm was measured using a spectrophotometer U-4100 (manufactured by Hitachi High-Tech Corporation), and the visible light transmittance was evaluated based on the following criteria. A: The average transmittance in the wavelength range of 420nm ~ 550nm is ≥95% B: 92% ≤ average transmittance within the wavelength range of 420nm ~ 550nm < 95% C: 89% ≤ average transmittance within the wavelength range of 420nm ~ 550nm < 92% D: 86% ≤ average transmittance within the wavelength range of 420nm ~ 550nm < 89% E: Average transmittance in the wavelength range of 420nm to 550nm <86%

(Evaluation of light resistance) A light resistance test was conducted by irradiating the obtained film with 50,000 lux of light using an Xe lamp and an ultraviolet cut filter for 20 hours, using a colorimeter MCPD-1000 (Otsuka Electronics Co., Ltd. .) The ΔEab value of the color difference before and after light irradiation was measured. The smaller the ΔEab value is, the better the light resistance is. In addition, the ΔEab value is a value obtained from the following color difference formula based on the CIE1976 (L*, a*, b*) space color representation system (Japanese Color Society's newly compiled Color Science Handbook (1985), page 266). ΔEab={(ΔL*) ² + (Δa*) ² + (Δb*) ² } ^1/2 A: ΔEab value＜2.5 B: 2.5≤ΔEab value＜5 C: 5≤ΔEab value＜10 D: 10≤ ΔEab value＜15 E: 15≤ΔEab value

＜Evaluation of storage stability＞ Each composition was stored in a thermostat at 45° C. for 3 days, and then a film was produced according to the film production method described above. The obtained film was observed with a scanning electron microscope (measurement magnification = 10,000 times), the number of foreign matter present in the range of 10 μm × 15 μm was measured, and the storage stability was evaluated based on the following criteria. A: There is no foreign matter within the range of 10μm×15μm B: The number of foreign matter present in the range of 10 μm × 15 μm exceeds 0 and is less than 50. C: There are more than 50 and less than 100 foreign objects present in the range of 10 μm × 15 μm. D: There are more than 100 and less than 200 foreign objects in the range of 10 μm × 15 μm. E: More than 200 foreign objects exist within the range of 10μm×15μm

[Table 14] Evaluation results Infrared shielding Visible light transmittance Lightfastness Storage stability Example 1 A A D C Example 2 A A D C Example 3 A A D C Example 4 A A D A Example 5 A A D A Example 6 A A D A Example 7 D D D A Example 8 A A D A Example 9 C C D A Example 10 B B D A Example 11 D D D A Example 12 D D D A Example 13 D D D A Example 14 D D D A Example 15 D D D B Example 16 D D D B Example 17 D D D B Example 18 D D D B Example 19 A A D B Example 20 A A D B Example 21 A A D B Example 22 A A D B Example 23 A A B A Example 24 A A B A Example 25 A A B A Example 26 A A A A Example 27 A A A A Example 28 A A A A Example 29 A A A A Example 30 D D A A Example 31 A A A A Example 32 C C A A Example 33 B B A A Example 34 D D A A Example 35 D D A A Example 36 D D A A Example 37 D D B A Example 38 D D C A Example 39 D D C A Example 40 D D C A [Table 15] Evaluation results Infrared shielding Visible light transmittance Lightfastness Storage stability Example 41 D D C A Example 42 A A B A Example 43 A A B A Example 44 A A B A Example 45 A A B A Example 46 A A A A Example 47 A A A A Example 48 A A A A Example 49 A A A A Example 50 A A C A Example 51 A A C A Example 52 A A C A Example 53 A A C A Example 54 A A C A Example 55 A A C A Example 56 A A C A Example 57 A A C A Example 58 A A A A Example 59 A A B A Example 60 A A A A Example 61 A A A A Example 62 A A B A Example 63 A A B A Example 64 A A A A Example 65 A A A A Example 66 A A A A Example 67 A A A A Example 68 A A A A Example 69 A A A A Example 70 A A A A Example 71 A A A A Example 72 A A A A Example 73 A A A A Example 74 A A A A Example 75 A A A A Example 76 A A A A Example 77 A A A A Example 78 A A A A Example 79 A A A A Example 80 A A A A [Table 16] Evaluation results Infrared shielding Visible light transmittance Lightfastness Storage stability Example 81 A A A A Example 82 A A A A Example 83 A A A A Example 84 A A A A Example 85 A A A A Example 86 A A A A Example 87 A A A A Example 88 A A A A Example 89 A A A A Example 90 A A A A Example 91 A A A A Example 92 A A A A Example 93 A A A A Example 94 A A A A Example 95 A A A A Example 96 A A A A Example 97 A A A A Example 98 A A A A Example 99 A A A A Example 100 A A A A Example 101 A A A A Example 102 A A A A Comparative example 1 E E E E [Table 17] Evaluation results Infrared shielding Visible light transmittance Lightfastness Storage stability Example 201 A A D C Example 202 A A D C Example 203 A A D C Example 204 A A D A Example 205 A A D A Example 206 A A D A Example 207 D D D A Example 208 A A D A Example 209 C C D A Example 210 B B D A Example 211 D D D A Example 212 D D D A Example 213 D D D A Example 214 D D D A Example 215 D D D B Example 216 D D D B Example 217 D D D B Example 218 D D D B Example 219 A A D B Example 220 A A D B Example 221 A A D B Example 222 A A D B Example 223 A A B A Example 224 A A B A Example 225 A A B A Example 226 A A A A Example 227 A A A A Example 228 A A A A Example 229 A A A A Example 230 D D A A Example 231 A A A A Example 232 C C A A Example 233 B B A A Example 234 D D A A Example 235 D D A A Example 236 D D A A Example 237 D D B A Example 238 D D C A Example 239 D D C A Example 240 D D C A [Table 18] Evaluation results Infrared shielding Visible light transmittance Lightfastness Storage stability Example 241 D D C A Example 242 A A B A Example 243 A A B A Example 244 A A B A Example 245 A A B A Example 246 A A A A Example 247 A A A A Example 248 A A A A Example 249 A A A A Example 250 A A C A Example 251 A A C A Example 252 A A C A Example 253 A A C A Example 254 A A C A Example 255 A A C A Example 256 A A C A Example 257 A A C A Example 258 A A A A Example 259 A A B A Example 260 A A A A Example 261 A A A A Example 262 A A B A Example 263 A A B A Example 264 A A A A Example 265 A A A A Example 266 A A A A Example 267 A A A A Example 268 A A A A Example 269 A A A A Example 270 A A A A Example 271 A A A A Example 272 A A A A Example 273 A A A A Example 274 A A A A Example 275 A A A A Example 276 A A A A Example 277 A A A A Example 278 A A A A Example 279 A A A A Example 280 A A A A [Table 19] Evaluation results Infrared shielding Visible light transmittance Lightfastness Storage stability Example 281 A A A A Example 282 A A A A Example 283 A A A A Example 284 A A A A Example 285 A A A A Example 286 A A A A Example 287 A A A A Example 288 A A A A Example 289 A A A A Example 290 A A A A Example 291 A A A A Example 292 A A A A Example 293 A A A A Example 294 A A A A Example 295 A A A A Example 296 A A A A Example 297 A A A A Example 298 A A A A Example 299 A A A A Example 300 A A A A Example 301 A A A A Example 302 A A A A Example 303 A A A A Example 304 A A A A Example 305 A A A A Example 306 A A A A Example 307 A A A A Example 308 A A A A Example 309 A A A A Example 310 A A A A Example 311 A A A A Example 312 A A A A Example 313 A A A A Comparative example 2 E E E E [Table 20] Evaluation results Infrared shielding Visible light transmittance Lightfastness Storage stability Example 401 A A D C Example 402 A A D C Example 403 A A D C Example 404 A A D A Example 405 A A D A Example 406 A A D A Example 407 D D D A Example 408 A A D A Example 409 C C D A Example 410 B B D A Example 411 D D D A Example 412 D D D A Example 413 D D D A Example 414 D D D A Example 415 D D D B Example 416 D D D B Example 417 D D D B Example 418 D D D B Example 419 A A D B Example 420 A A D B Example 421 A A D B Example 422 A A D B Example 423 A A B A Example 424 A A B A Example 425 A A B A Example 426 A A A A Example 427 A A A A Example 428 A A A A Example 429 A A A A Example 430 D D A A Example 431 A A A A Example 432 C C A A Example 433 B B A A Example 434 D D A A Example 435 D D A A Example 436 D D A A Example 437 D D B A Example 438 D D C A Example 439 D D C A Example 440 D D C A [Table 21] Evaluation results Infrared shielding Visible light transmittance Lightfastness Storage stability Example 441 D D C A Example 442 A A B A Example 443 A A B A Example 444 A A B A Example 445 A A B A Example 446 A A A A Example 447 A A A A Example 448 A A A A Example 449 A A A A Example 450 A A C A Example 451 A A C A Example 452 A A C A Example 453 A A C A Example 454 A A C A Example 455 A A C A Example 456 A A C A Example 457 A A C A Example 458 A A A A Example 459 A A B A Example 460 A A A A Example 461 A A A A Example 462 A A B A Example 463 A A B A Example 464 A A A A Example 465 A A A A Example 466 A A A A Example 467 A A A A Example 468 A A A A Example 469 A A A A Example 470 A A A A Example 471 A A A A Example 472 A A A A Example 473 A A A A Example 474 A A A A Example 475 A A A A Example 476 A A A A Example 477 A A A A Example 478 A A A A Example 479 A A A A Example 480 A A A A [Table 22] Evaluation results Infrared shielding Visible light transmittance Lightfastness Storage stability Example 481 A A A A Example 482 A A A A Example 483 A A A A Example 484 A A A A Example 485 A A A A Example 486 A A A A Example 487 A A A A Example 488 A A A A Example 489 A A A A Example 490 A A A A Example 491 A A A A Example 492 A A A A Example 493 A A A A Example 494 A A A A Example 495 A A A A Example 496 A A A A Example 497 A A A A Example 498 A A A A Example 499 A A A A Example 500 A A A A Example 501 A A A A Example 502 A A A A Example 503 A A A A Example 504 A A A A Example 505 A A A A Example 506 A A A A Example 507 A A A A Example 508 A A A A Example 509 A A A A Example 510 A A A A Example 511 A A A A Example 512 A A A A Example 513 A A A A Example 514 A A A A Example 515 A A A A Example 516 A A A A Example 517 A A A A Comparative example 3 E E E E

As shown in the table above, the Examples were excellent in evaluation of visible light transmittance, infrared shielding properties, light resistance, and storage stability compared with the Comparative Examples.

110: Solid camera element 111: Infrared cut filter 112:Color filter 114:Infrared transmission filter 115: Microlens 116: Planarization layer

FIG. 1 is a schematic diagram showing an embodiment of an infrared sensor.

Claims (15)

A composition including an infrared absorber, a curable compound and a solvent, wherein the infrared absorber includes a compound represented by formula (1); In formula (1), A and B independently represent an aromatic hydrocarbon ring or an aromatic heterocyclic ring, and R ^aa1 and R ^aa2 independently represent a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, and a phosphate group. , alkyl, aryl, heterocyclyl, alkoxy, acyl, alkoxycarbonyl, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 or -OSO ₂ R ^a15 , R ^a11 and R ^a12 Each independently represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, R ^a13 to R ^a15 each independently represents an alkyl group, an aryl group or a heterocyclic group, R ^b1 to R ^b4 each independently represents a hydrogen atom or a halogen atom , sulfo group, hydroxyl group, cyano group, nitro group, carboxyl group, phosphate group, alkyl group, aryl group, heterocyclic group, alkoxy group, hydroxyl group, alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , - NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^{b21 ,} R ^b11 and R ^b12 independently represent a hydrogen atom, an alkane group, aryl group or heterocyclic group, R ^b13 to R ^b21 independently represent an alkyl group, an aryl group or a heterocyclic group, Y ¹ to Y ⁴ independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group or A group represented by formula (Y-1), m1 represents an integer from 0 to mA, mA represents the largest integer that R ^aa1 can replace A, m2 represents an integer from 0 to mB, and mB represents the largest integer that R ^aa2 can replace B. Integer, when m1 is 2 or more, 2 R ^aa1 out of m1 R ^aa1 can bond with each other to form a ring. When m2 is 2 or more, 2 R ^aa2 out of m2 R ^aa2 can bond with each other to form a ring, R ^aa1 It can bond with Y ¹ to form a heterocyclic ring containing a 5-membered ring or a 6-membered ring containing at least one nitrogen atom. R ^aa1 and Y ² can bond to form a heterocyclic ring containing a 5-membered ring or a 6-membered ring containing at least one nitrogen atom. Ring, R ^aa2 and Y ³ can bond to form a 5-membered ring or a 6-membered heterocyclic ring containing at least one nitrogen atom, R ^aa2 and Y ⁴ can bond to form a 5-membered ring or 6-membered ring containing at least one nitrogen atom A heterocyclic ring with 5 members, Y ¹ and Y ² can be bonded to form a 5-membered ring or a 6-membered ring containing at least one nitrogen atom, Y ³ and Y ⁴ can be bonded to form a 5-membered ring containing at least one nitrogen atom. A membered ring or a 6-membered heterocyclic ring; wherein, at least one of Y ¹ to Y ⁴ is a group represented by formula (Y-1), and is selected from R ^aa1 and Y ¹ , R ^aa1 and Y ² , R ^aa2 and at least one of Y ³ and R ^aa2 and Y ⁴ are bonded to form a 5-membered ring or a 6-membered ring heterocyclic ring containing at least one nitrogen atom; In formula (Y-1), the wavy line represents a bond, Ry ¹ to Ry ⁴ independently represent a hydrogen atom, an alkyl group or an aryl group, and X ¹ is a single bond, an alkylene group, an aryl group, -O-, -S-, -NRx-, -CO-, -CS-, -SO- or -SO ₂ -, or it will be selected from alkylene, aryl, -O-, -S-, -NRx-, A group composed of two or more of -CO-, -CS-, -SO- and -SO ₂ -, Rx represents a hydrogen atom, an alkyl group or an aryl group, Z ¹ represents an alicyclic hydrocarbon group or an aromatic hydrocarbon group , heterocyclic group, a group represented by any one of the formulas (Z-1) to (Z-6); wherein, Z ¹ is a group represented by the formula (Z-1) or a group represented by the formula (Z-4 ) represents a group, the part in X ¹ linked to Z ¹ is an alkylene group or an aryl group; In formula (Z-1) to formula (Z-6), the wavy line represents a bond; in formula (Z-1), Rz ¹¹ represents an alkyl group or an aryl group; in formula (Z-2), Rz ¹² represents hydrogen atom, -COR ¹⁰⁰ or -COOR ¹⁰⁰ , R ¹⁰⁰ represents a hydrogen atom, an alkyl group or an aryl group, Rz ^12a represents an alkyl group, mz represents an integer from 0 to 4; in formula (Z-3), Rz ¹³ to Rz ¹⁶ respectively independently represents an alkyl group, and Rz ¹⁷ represents a hydrogen atom, an alkyl group or an oxygen radical; in formula (Z-4), Rz ¹⁸ and Rz ¹⁹ independently represent an alkyl group or an aryl group; in formula (Z-6), W ¹ represents a single bond, an alkylene group, an aryl group or -CO-, Rz ²⁰ represents a hydrogen atom, an alkyl group, an aryl group or -COR ¹⁰¹ , and R ¹⁰¹ represents an alkyl group or an aryl group. The composition as described in claim 1, wherein the compound represented by the aforementioned formula (1) is a compound represented by the formula (2); In formula (2), R ^a1 to R ^a4 each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, and an alkoxy group. , acyl group, alkoxycarbonyl group, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 or -OSO ₂ R ^a15 , R ^a11 and R ^a12 respectively independently represent a hydrogen atom, an alkyl group, an aryl group or a hetero Ring group, R ^a13 to R ^a15 independently represent an alkyl group, an aryl group or a heterocyclic group, R ^b1 to R ^b4 respectively independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, Phosphate group, alkyl group, aryl group, heterocyclyl group, alkoxy group, acyl group, alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , - SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 , R ^b11 and R ^b12 independently represent a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, R ^b13 ~ R ^b21 Each independently represents an alkyl group, an aryl group or a heterocyclic group, Y ¹ to Y ⁴ each independently represents a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group or a group represented by the aforementioned formula (Y-1), R ^a1 and Y ¹ may bond to form a 5-membered ring or 6-membered heterocyclic ring containing at least one nitrogen atom, and R ^a2 and Y ² may bond to form a 5-membered ring or 6-membered ring containing at least one nitrogen atom. Heterocycle, R ^a3 and Y ³ can bond to form a 5-membered ring or 6-membered ring containing at least one nitrogen atom, R ^a4 and Y ⁴ can bond to form a 5-membered ring containing at least one nitrogen atom or a 6-membered ring. A 6-membered heterocyclic ring, Y ¹ and Y ² can be bonded to form a 5-membered ring or a 6-membered ring heterocyclic containing at least one nitrogen atom, Y ³ and Y ⁴ can be bonded to form a 5-membered ring containing at least one nitrogen atom 5-membered ring or 6-membered ring heterocycle; wherein, at least one of Y ¹ to Y ⁴ is a group represented by the aforementioned formula (Y-1), and is selected from R ^a1 and Y ¹ , R ^a2 and Y ² , R ^a3 and at least one of Y ³ and R ^a4 and Y ⁴ are bonded to form a 5-membered ring or a 6-membered ring heterocyclic ring containing at least one nitrogen atom. The composition as described in claim 1, wherein the compound represented by the aforementioned formula (1) is a compound represented by the formula (3); In formula (3), R ¹³ to R ¹⁷ and R ²³ to R ²⁷ respectively independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, a hetero group, and a hydrogen atom. Ring group, alkoxy group, acyl group, alkoxycarbonyl group, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 or -OSO ₂ R ^a15 , R ^a11 and R ^a12 independently represent a hydrogen atom, an alkane group, aryl or heterocyclic group, R ^a13 to R ^a15 independently represent an alkyl group, an aryl group or a heterocyclic group, R ¹¹ , R ¹² , R ²¹ and R ²² respectively independently represent a hydrogen atom, a halogen atom, a sulfonate group, hydroxyl group, cyano group, nitro group, carboxyl group, phosphate group, alkyl group, aryl group, heterocyclic group, alkoxy group, acyl group, alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , -NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R ^b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^b21 , R ^b11 and R ^b12 independently represent a hydrogen atom, an alkyl group, Aryl or heterocyclic group, R ^b13 ~ R ^b21 independently represent an alkyl group, an aryl group or a heterocyclic group, Y ¹¹ and Y ²¹ independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group or a combination of the above In the group represented by formula (Y-1), at least one of Y ¹¹ and Y ²¹ is a group represented by the aforementioned formula (Y-1). The composition according to claim 3, wherein at least one of R ¹¹ and R ¹² and at least one of R ²¹ and R ²² of the aforementioned formula (3) are independently -NHCOR ^b13 , and R ^b13 is an alkyl group, Aryl or heterocyclyl. The composition as claimed in claim 3, wherein at least one of R ¹¹ and R ¹² and at least one of R ²¹ and R ²² of the aforementioned formula (3) are independently -NHSO ₂ R ^b14 , and R ^b14 is an alkane. base, aryl or heterocyclic group. The composition as described in any one of claims 1 to 5, wherein The aforementioned curable compound includes resin. The composition as described in any one of claims 1 to 5, wherein The infrared absorber further includes an infrared absorber other than the compound represented by the formula (1). The composition according to any one of claims 1 to 5, further comprising at least one selected from the group consisting of ultraviolet absorbers and antioxidants. A film obtained using the composition according to any one of claims 1 to 5. An optical filter comprising the film according to claim 9. A solid-state imaging element including the film according to claim 9. An image display device comprising the film according to claim 9. An infrared sensor comprising the film described in claim 9. A camera film set including the film described in claim 9. A compound represented by formula (1); In formula (1), A and B independently represent an aromatic hydrocarbon ring or an aromatic heterocyclic ring, and R ^aa1 and R ^aa2 independently represent a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, and a phosphate group. , alkyl, aryl, heterocyclyl, alkoxy, acyl, alkoxycarbonyl, -NR ^a11 R ^a12 , -SR ^a13 , -SO ₂ R ^a14 or -OSO ₂ R ^a15 , R ^a11 and R ^a12 Each independently represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, R ^a13 to R ^a15 each independently represents an alkyl group, an aryl group or a heterocyclic group, R ^b1 to R ^b4 each independently represents a hydrogen atom or a halogen atom , sulfo group, hydroxyl group, cyano group, nitro group, carboxyl group, phosphate group, alkyl group, aryl group, heterocyclic group, alkoxy group, hydroxyl group, alkoxycarbonyl group, -NR ^b11 R ^b12 , -NHCOR ^b13 , - NHSO ₂ R ^b14 , -NHCSNHR ^b15 , -SR ^b16 , -SO ₂ R ^b17 , -OSO ₂ R b18 , -NHCSR ^b19 , -NHCONHR ^b20 or -NHCOOR ^{b21 ,} R ^b11 and R ^b12 independently represent a hydrogen atom, an alkane group, aryl group or heterocyclic group, R ^b13 to R ^b21 independently represent an alkyl group, an aryl group or a heterocyclic group, Y ¹ to Y ⁴ independently represent a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group or A group represented by formula (Y-1), m1 represents an integer from 0 to mA, mA represents the largest integer that R ^aa1 can replace A, m2 represents an integer from 0 to mB, and mB represents the largest integer that R ^aa2 can replace B. Integer, when m1 is 2 or more, 2 R ^aa1 out of m1 R ^aa1 can bond with each other to form a ring. When m2 is 2 or more, 2 R ^aa2 out of m2 R ^aa2 can bond with each other to form a ring, R ^aa1 It can bond with Y ¹ to form a heterocyclic ring containing a 5-membered ring or a 6-membered ring containing at least one nitrogen atom. R ^aa1 and Y ² can bond to form a heterocyclic ring containing a 5-membered ring or a 6-membered ring containing at least one nitrogen atom. Ring, R ^aa2 and Y ³ can bond to form a 5-membered ring or a 6-membered heterocyclic ring containing at least one nitrogen atom, R ^aa2 and Y ⁴ can bond to form a 5-membered ring or 6-membered ring containing at least one nitrogen atom A heterocyclic ring with 5 members, Y ¹ and Y ² can be bonded to form a 5-membered ring or a 6-membered ring containing at least one nitrogen atom, Y ³ and Y ⁴ can be bonded to form a 5-membered ring containing at least one nitrogen atom. A membered ring or a 6-membered heterocyclic ring; wherein, at least one of Y ¹ to Y ⁴ is a group represented by formula (Y-1), and is selected from R ^aa1 and Y ¹ , R ^aa1 and Y ² , R ^aa2 and at least one of Y ³ and R ^aa2 and Y ⁴ are bonded to form a 5-membered ring or a 6-membered ring heterocyclic ring containing at least one nitrogen atom; In formula (Y-1), the wavy line represents a bond, Ry ¹ to Ry ⁴ independently represent a hydrogen atom, an alkyl group or an aryl group, and X ¹ is a single bond, an alkylene group, an aryl group, -O-, -S-, -NRx-, -CO-, -CS-, -SO- or -SO ₂ -, or it will be selected from alkylene, aryl, -O-, -S-, -NRx-, A group composed of two or more of -CO-, -CS-, -SO- and -SO ₂ -, Rx represents a hydrogen atom, an alkyl group or an aryl group, Z ¹ represents an alicyclic hydrocarbon group or an aromatic hydrocarbon group , heterocyclic group, a group represented by any one of the formulas (Z-1) to (Z-6); wherein, Z ¹ is a group represented by the formula (Z-1) or a group represented by the formula (Z-4 ) represents a group, the part in X ¹ linked to Z ¹ is an alkylene group or an aryl group; In formula (Z-1) to formula (Z-6), the wavy line represents a bond; in formula (Z-1), Rz ¹¹ represents an alkyl group or an aryl group; in formula (Z-2), Rz ¹² represents hydrogen atom, -COR ¹⁰⁰ or -COOR ¹⁰⁰ , R ¹⁰⁰ represents a hydrogen atom, an alkyl group or an aryl group, Rz ^12a represents an alkyl group, mz represents an integer from 0 to 4; in formula (Z-3), Rz ¹³ to Rz ¹⁶ respectively independently represents an alkyl group, and Rz ¹⁷ represents a hydrogen atom, an alkyl group or an oxygen radical; in formula (Z-4), Rz ¹⁸ and Rz ¹⁹ independently represent an alkyl group or an aryl group; in formula (Z-6), W ¹ represents a single bond, an alkylene group, an aryl group or -CO-, Rz ²⁰ represents a hydrogen atom, an alkyl group, an aryl group or -COR ¹⁰¹ , and R ¹⁰¹ represents an alkyl group or an aryl group.