TW202336119A - Infrared absorbing composition, film, optical filter, solid-state imaging element, image display device, infrared sensor, and camera module - Google Patents

Abstract

Provided are: an infrared absorbing composition that contains a squarylium dye expressed by formula (SQ1), a compound expressed by formula (1a), and a resin, wherein the compound expressed by formula (1a) is included in the amount of 0.01-1.0 parts by mass with respect to 100 parts by mass of the squarylium dye expressed by formula (SQ1); a film; an optical filter; a solid-state imaging element; an image display device; an infrared sensor; and a camera module.

Description

Infrared absorbing compositions, films, optical filters, solid-state imaging devices, image display devices, infrared sensors and camera modules

The present invention relates to an infrared absorbing composition containing squaraine pigment. Furthermore, the present invention relates to a film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor and a camera module using an infrared absorbing composition.

The solid-state imaging element that uses color images in video cameras, digital cameras, mobile phones with camera functions, etc. is CCD (Charge Coupled Device) or CMOS (Complementary Metal Oxide Semiconductor). These solid-state imaging devices use silicon photodiodes that are sensitive to infrared rays in their light-receiving portions. Therefore, an infrared cut filter is sometimes set for luminosity factor correction.

An infrared cut filter is manufactured using a composition containing an infrared absorbing pigment. As infrared absorbing dyes, squaraine dyes and the like are known.

Patent Document 1 describes the production of an infrared cut filter using a composition using squaraine dye as an infrared absorbing dye.

[Patent Document 1] International Publication No. 2018/100834

However, squaraine dye tends to have low light resistance, and there is room for further improvement in the light resistance of a film obtained using a composition containing squaraine dye.

Therefore, an object of the present invention is to provide an infrared-absorbing composition capable of forming a film with excellent light resistance. Furthermore, an object of the present invention is to provide a film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor, and a camera module using an infrared absorbing composition.

The present invention provides the following.

<1> An infrared absorbing composition containing: a squarylium dye represented by formula (SQ1); a compound represented by formula (1a); and a resin, with respect to the above-mentioned squarylyanine dye represented by formula (SQ1) 100 parts by mass, containing 0.01 to 1.0 parts by mass of the compound represented by the formula (1a), [Chemical 1] In the formula, A ¹ and A ² each independently represent an aryl group, a heterocyclic group or a group represented by the formula (R1), R ¹⁰¹ represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, [Chemical 2] In the formula (R1), * represents a bond, Rs ¹ to Rs ³ each independently represent a hydrogen atom or an alkyl group, As ³ represents a heterocyclic group, n _s1 represents an integer above 0, Rs ¹ and Rs ² may be bonded to each other. To form a ring, Rs ¹ and As ³ can bond with each other to form a ring, and Rs ² and Rs ³ can bond with each other to form a ring. When n _s1 is 2 or more, multiple Rs ² and Rs ³ can be the same, respectively. Can be different. <2> The infrared absorbing composition according to <1>, wherein the squaraine dye represented by the formula (SQ1) is a squaraine dye. <3> The infrared absorbing composition as described in <2>, wherein the above-mentioned squaraine dye is selected from the squaraine dye represented by formula (SQ2), the squaraine dye represented by formula (SQ3) and the squaraine dye represented by formula (SQ3) SQ4) At least one kind of squaraine dye represented by formula (1a), the compound represented by formula (1a) is selected from the compound represented by formula (2a), the compound represented by formula (3a) and the compound represented by formula (4a) At least one of them, [Chemical 3] In the formula (SQ2), R ^a1 to R ^a4 each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, and an alkoxy group. , hydroxyl group, alkoxycarbonyl group or -NR ^a11 R ^a12 , R ^a11 and R ^a12 independently represent a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, R ^b1 ~ R ^b4 respectively independently represent a hydrogen atom and a halogen atom , sulfo group, hydroxyl, cyano group, nitro group, carboxyl group, phosphate group, alkyl group, aryl group, heterocyclic group, alkoxy group, acyl group or -NR ^b11 R ^b12 , R ^b11 and R ^b12 independently represent hydrogen Atom, alkyl group, aryl group, heterocyclic group or acyl group, Ya ¹ and Ya ² independently represent -NR ^y11 R ^y12 , R ^y11 and R ^y12 independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group group, R ^a1 and Y ^a1 can bond to form a 5-membered ring or a 6-membered heterocyclic ring containing at least 1 nitrogen atom, R ^a2 and Y ^a1 can bond to form a 5-membered ring containing at least 1 nitrogen atom Or a 6-membered ring heterocyclic ring, R ^a3 and Y ^a2 can be bonded to form a 5-membered ring or a 6-membered ring heterocyclic ring containing at least 1 nitrogen atom, R ^a4 and Y ^a2 can be bonded to form a 5-membered ring or 6-membered ring heterocyclic ring containing at least 1 nitrogen atom. A 5-membered ring or a 6-membered heterocyclic ring of a nitrogen atom, [Chemical 4] In formula (SQ3), X ¹ and X ² independently represent -O-, -S-, -Se-, -NR ^c10 - or -CR ^d10 R ^d11 -, and R ^c1 , R ^c2 and R ^c10 independently represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, and R ^d1 to R ^d8 , R ^d10 and R ^d11 independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group and a phosphate group. , alkyl group, aryl group, heterocyclyl group, alkoxy group, acyl group, alkoxycarbonyl group, or -NR ^d21 R ^a22 , R ^d21 and R ^d22 respectively independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group , among R ^d1 ~ R ^d8 , two adjacent groups can bond with each other to form a ring, [Chemical 5] In formula (SQ4), X ⁴¹ and X ⁴² each independently represent a divalent linking group represented by formula (X-1) or formula (X-2), and R ^41a and R ^41b each independently represent an alkyl group or Aryl group, R ^42a , R ^42b , R ^43a and R ^43b each independently represent a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, R ^44a and R ^44b each independently represent an alkyl group or an aryl group, - (CR ^X1 R ^X2 ) _n1 - ･･･(X-1) In formula (X-1), R ^X1 and ^{R X3} R ^X4 _{) n2} -O- ^{( CR X5 R} , n2 and n3 independently represent integers from 0 to 2, n2+n3 is 1 or 2, [Chemicalization 6] In formula (2a), R ^a1 and R ^a2 independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, and an alkoxy group. , hydroxyl group, alkoxycarbonyl group or -NR ^a11 R ^a12 , R ^a11 and R ^a12 independently represent a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, R ^b1 and R ^b2 respectively independently represent a hydrogen atom and a halogen atom , sulfo group, hydroxyl, cyano group, nitro group, carboxyl group, phosphate group, alkyl group, aryl group, heterocyclic group, alkoxy group, acyl group or -NR ^b11 R ^b12 , R ^b11 and R ^b12 independently represent hydrogen atom, alkyl group, aryl group, heterocyclic group or hydroxyl group, Ya ¹ represents -NR ^y11 R ^y12 , R ^y11 and R ^y12 independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group, R ^a1 and Y ^a1 can be bonded to form a 5-membered ring or a 6-membered heterocyclic ring containing at least one nitrogen atom, and R ^a2 and Y ^a1 can be bonded to form a 5-membered ring or a 6-membered heterocyclic ring containing at least 1 nitrogen atom. Ring, R ¹⁰² represents a hydrogen atom, alkyl group, aryl group or heterocyclic group, [Chemical 7] In formula (3a), X ¹ represents -O-, -S-, -Se-, -NR ^c10 - or -CR ^d10 R ^d11 -, and R ^c1 and R ^c10 independently represent a hydrogen atom, an alkyl group, and an aryl group. or heterocyclic group, R ^d1 ~ R ^d4 , R ^d10 and R ^d11 respectively independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, and a heterocyclic group. group, alkoxy group, acyl group, alkoxycarbonyl group or -NR ^d21 R ^a22 , R ^d21 and R ^d22 independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group, among R ^d1 to R ^d4 , adjacent The two groups can be bonded to each other to form a ring, R ¹⁰³ represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, [Chemical 8] In the formula (4a), X ⁴¹ represents the divalent linking group represented by the above formula (X-1) or the above formula (X-2), R ^41a represents an alkyl group or an aryl group, and R ^42a and R ^43a are respectively independent. represents a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, R ^44a represents an alkyl group or an aryl group, and R ¹⁰⁴ represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group. <4> The infrared absorbing composition as described in <3>, wherein the above-mentioned squarylium dye is a squaraine dye represented by the formula (SQ4), and the above-mentioned compound represented by the formula (1a) is the above-mentioned compound represented by the formula (4a) represents the compound. <5> The infrared absorbing composition according to <4>, wherein the squaraine pigment represented by the formula (SQ1) is a squaraine pigment. <6> The infrared absorbing composition according to <5>, wherein the squaraine pigment is at least one selected from the squaraine pigment represented by formula (SQ5) and the squaraine pigment represented by formula (SQ6) , the above-mentioned compound represented by formula (1a) is at least one selected from the compound represented by formula (5a) and the compound represented by formula (6a), [Chemical 9] In the formula (SQ5), R ⁵¹ to R ⁷⁰ each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a sulfo group, -NR ⁷¹ R ⁷² , -SO ₂ NR ⁷³ R ⁷⁴ , -COOR ⁷⁵ , -CONR ⁷⁶ R ⁷⁷ , nitro group, cyano group or halogen atom, R ⁷¹ ~ R ⁷⁷ independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group, R ⁷¹ and R ⁷² can be bonded to each other to form a ring, R ⁷³ and R ⁷⁴ can be bonded to each other to form a ring, R ⁷⁶ and R ⁷⁷ can be bonded to each other to form a ring, among R ⁵¹ to R ⁷⁰ , two adjacent groups They can bond with each other to form a ring, [Chemistry 10] In formula (SQ6), Q ^1a , Q ^1b , Q ^4a , Q ^4b , Q ^5a , Q ^5b , Q ^8a and Q ^8b respectively independently represent a carbon atom or a nitrogen atom. However, when Q ^1a is a nitrogen atom, Rq ^1a does not exist, when Q ^1b is a nitrogen atom, Rq ^1b does not exist, when Q ^4a is a nitrogen atom, Rq ^4a does not exist, when Q ^4b is a nitrogen atom, Rq ^4b does not exist, when Q ^5a is a nitrogen atom , Rq ^5a does not exist. When Q ^5b is a nitrogen atom, Rq ^5b does not exist. When Q ^8a is a nitrogen atom, Rq ^8a does not exist. When Q ^8b is a nitrogen atom, Rq ^8b does not exist. R ^81a ~ R ^85a And R ^81b ~ R ^85b independently represent a hydrogen atom, a sulfo group, -SO ₃ ^- M ⁺ or a halogen atom. M ⁺ represents an inorganic or organic cation. Among R ^81a ~ R ^85a , two adjacent groups can be mutually exclusive. Bond to form a ring. Among R ^81b to R ^85b , two adjacent groups can bond to each other to form a ring. Rq ^1a to Rq ^8a and Rq ^1b to Rq ^8b independently represent hydrogen atoms and alkyl groups. , alkenyl, aryl, heterocyclyl, alkoxy, aryloxy, hydroxyl, -NRq ¹¹ Rq ¹² , sulfo group, -SO ₂ NRq ¹³ Rq ¹⁴ , -COORq ¹⁵ , -CONRq ¹⁶ Rq ¹⁷ , nitro , cyano group or halogen atom, Rq ¹¹ to Rq ¹⁷ independently represent a hydrogen atom, alkyl group, aryl group, acyl group or heterocyclic group, Rq ¹¹ and Rq ¹² can be bonded to each other to form a ring, Rq ¹³ and Rq ¹⁴ Can bond with each other to form a ring, Rq ¹⁶ and Rq ¹⁷ can bond with each other to form a ring, [Chemical 11] In formula (5a), R ⁵¹ to R ⁶⁰ each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a sulfo group, -NR ⁷¹ R ⁷² , -SO ₂ NR ⁷³ R ⁷⁴ , -COOR ⁷⁵ , -CONR ⁷⁶ R ⁷⁷ , nitro group, cyano group or halogen atom, R ⁷¹ ~ R ⁷⁷ independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group, R ⁷¹ and R ⁷² can be bonded to each other to form a ring, R ⁷³ and R ⁷⁴ can be bonded to each other to form a ring, R ⁷⁶ and R ⁷⁷ can be bonded to each other to form a ring, among R ⁵¹ to R ⁶⁰ , two adjacent groups can bond with each other to form a ring, R ¹⁰⁵ represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, [Chemical 12] In formula (6a), Q ^1a , Q ^4a , Q ^5a and Q ^8a each independently represent a carbon atom or a nitrogen atom. However, when Q ^1a is a nitrogen atom, Rq ^1a does not exist. When Q ^4a is a nitrogen atom, Rq ^4a does not exist. When Q ^5a is a nitrogen atom, Rq ^5a does not exist. When Q ^8a is a nitrogen atom, Rq ^8a does not exist. R ^81a ~ R ^85a independently represent a hydrogen atom, a sulfo group, and -SO ₃ ^- M ⁺ or halogen atom, M ⁺ represents inorganic or organic cation, among R ^81a ~ R ^85a , two adjacent groups can bond with each other to form a ring, Rq ^1a ~ Rq ^8a independently represent hydrogen atoms and alkyl groups , alkenyl, aryl, heterocyclyl, alkoxy, aryloxy, hydroxyl, -NRq ¹¹ Rq ¹² , sulfo group, -SO ₂ NRq ¹³ Rq ¹⁴ , -COORq ¹⁵ , -CONRq ¹⁶ Rq ¹⁷ , nitro , cyano group or halogen atom, Rq ¹¹ to Rq ¹⁷ independently represent a hydrogen atom, alkyl group, aryl group, acyl group or heterocyclic group, Rq ¹¹ and Rq ¹² can be bonded to each other to form a ring, Rq ¹³ and Rq ¹⁴ They may be bonded to each other to form a ring. Rq ¹⁶ and Rq ¹⁷ may be bonded to each other to form a ring. R ¹⁰⁶ represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group. <7> The infrared absorbing composition according to <6>, wherein the above-mentioned squaraine pigment is a squaraine pigment represented by formula (SQ5), and the above-mentioned compound represented by formula (1a) is represented by formula (5a) of compounds. <8> The infrared absorbing composition according to <6>, wherein the above-mentioned squarylium pigment is a squaraine pigment represented by formula (SQ6), and the above-mentioned compound represented by formula (1a) is represented by formula (6a) of compounds. <9> The infrared absorbing composition according to any one of <1> to <8>, further containing a photopolymerization initiator and a polymerizable compound. <10> A film obtained using the infrared absorbing composition according to any one of <1> to <9>. <11> An optical filter including the film according to <10>. <12> A solid-state imaging element including the film according to <10>. <13> An image display device including the film according to <10>. <14> An infrared sensor including the film according to <10>. <15> A camera module including the film according to <10>. [Effects of the invention]

According to the present invention, it is possible to provide an infrared-absorbing composition capable of forming a film with excellent light resistance. Furthermore, the present invention can provide a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, and a camera module using an infrared absorbing composition.

Hereinafter, the contents of the present invention will be described in detail. In this specification, "～" is used in the sense that the numerical values described before and after it are included as the lower limit value and the upper limit value. Among the labels for groups (atomic groups) in this specification, the labels indicating unsubstituted and unsubstituted include groups (atomic groups) without substituents as well as groups (atomic groups) with substituents. For example, "alkyl" includes not only alkyl groups without substituents (unsubstituted alkyl groups) but also alkyl groups with substituents (substituted alkyl groups). In this specification, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams, unless otherwise specified. Examples of the light used for exposure include the bright line spectrum of a mercury lamp, actinic rays or radiation such as far ultraviolet rays, extreme ultraviolet rays (EUV light), X-rays, and electron beams represented by excimer lasers. In this specification, "(meth)acrylate" means both or either acrylate and methacrylate, "(meth)acrylic acid" means both or either acrylic acid and methacrylic acid, and "(meth)acrylic acid" means both or either acrylic acid and methacrylic acid. "Base) acrylyl group" means both or any one of acrylyl group and methacrylyl group. In this specification, the weight average molecular weight and the number average molecular weight are defined as polystyrene-converted values measured by gel permeation chromatography (GPC). In this specification, Me in the chemical formula represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. In this specification, infrared rays represent light (electromagnetic waves) with a wavelength of 700 to 2500 nm. In this specification, the total solid content refers to the total mass of all components of the composition excluding the solvent. In this specification, pigment refers to color materials that are not easily soluble in solvents. In this specification, the term "step" includes not only independent steps, but also includes steps that cannot be clearly distinguished from other steps, as long as the expected effect of the step is achieved.

＜Infrared absorbing composition＞ The infrared absorbing composition of the present invention contains: a squaraine pigment represented by formula (SQ1); a compound represented by formula (1a); and a resin, It is characterized by containing 0.01 to 1.0 parts by mass of the compound represented by the formula (1a) with respect to 100 parts by mass of the squarylyanine dye represented by the formula (SQ1).

According to the infrared absorbing composition of the present invention, a film excellent in light resistance can be formed. Although the detailed reason why this effect is obtained is not clear yet, it is speculated as follows. It is estimated that the compound of formula (1a) becomes the starting point because the infrared absorbing composition of the present invention contains 0.01 to 1.0 parts by mass of the compound represented by formula (1a) with respect to 100 parts by mass of squarylyanine dye represented by formula (SQ1). However, the association formation of the squaraine dye can be promoted and the size of the association can be appropriately increased. As a result, a film with excellent light resistance can be formed. In addition, when the content of the compound represented by formula (1a) is too high, sufficient light resistance cannot be obtained, and it is presumed that the reason for this is that the size of the formed aggregate becomes smaller.

When the infrared absorbing composition of the present invention further contains a photopolymerization initiator and a polymerizable compound, it is possible to form a pixel with excellent rectangularity by forming a pattern with the infrared absorbing composition using photolithography. Generally, when forming a pixel by forming a pattern using photolithography, a film formed on a support is exposed in a pattern, and the unexposed portion is removed by development to form a pixel. During exposure, since the lower part of the film (support side) is more difficult to irradiate with exposure light than the upper part of the film, the hardening of the film in the lower part of the film is often insufficient compared to the upper part of the film. Since the compound represented by the formula (1a) contained in the infrared absorbing composition of the present invention is a hydrophilic compound, it is estimated that the compound is likely to be located in the lower part of the film (support side) during film formation. It is speculated that the compound represented by formula (1a) is localized in the lower part of the film. During pattern formation exposure, the compound represented by formula (1a) absorbs exposure light such as i-rays, and the compound transfers the absorbed energy or electrons to the light. The polymerization initiator promotes the decomposition of the photopolymerization initiator in the lower part of the film, thereby efficiently generating active species such as free radicals. It is presumed that this can promote hardening in the vicinity of the lower part of the film during exposure, thereby enabling formation of pixels with excellent rectangularity. In addition, since the squarylyanine dye represented by formula (SQ1) has a similar chemical structure to the compound represented by formula (1a), it is presumed that the compound represented by formula (1a) has high solubility in the composition, and it can be converted from formula (SQ1) indicates that the squaraine pigment is almost uniformly distributed in the composition. Presumably, therefore, it is possible to form a film in which the compound represented by formula (1a) is almost uniformly distributed on the film plane, and the absorption efficiency of exposure light such as i-rays can be improved evenly across the film plane. It is presumed that for this reason, pixels with excellent rectangularity can be formed.

The infrared absorbing composition of the present invention can be used as an optical filter composition. Examples of types of optical filters include infrared cutoff filters, infrared transmission filters, and the like.

Each component used in the infrared absorbing composition of the present invention will be described below.

<<Squaraine dye>> The infrared absorbing composition of the present invention contains a squaraine dye represented by formula (SQ1) (hereinafter also referred to as squaraine dye). [Chemical 13] In the formula, A ¹ and A ² each independently represent an aryl group, a heterocyclic group or a group represented by formula (R1), [Chemical 14] In the formula (R1), * represents a bond, Rs ¹ to Rs ³ each independently represent a hydrogen atom or an alkyl group, As ³ represents a heterocyclic group, n _s1 represents an integer above 0, Rs ¹ and Rs ² may be bonded to each other. To form a ring, Rs ¹ and As ³ can bond with each other to form a ring, and Rs ² and Rs ³ can bond with each other to form a ring. When n _s1 is 2 or more, multiple Rs ² and Rs ³ can be the same, respectively. Can be different.

The number of carbon atoms of the aryl group represented by A ¹ and A ² is preferably 6 to 48, more preferably 6 to 22, and particularly preferably 6 to 12. The heterocyclic group represented by A ¹ and A ² is preferably a 5-membered ring or a 6-membered ring heterocyclic group. Furthermore, the heterocyclic group is preferably a monocyclic heterocyclic group or a fused cyclic heterocyclic group with a condensation number of 2 to 8, and a monocyclic heterocyclic group or a fused cyclic heterocyclic group with a condensation number of 2 to 4 is preferred. More preferably, a monocyclic heterocyclic group or a fused cyclic heterocyclic group with a condensation number of 2 or 3 is still more preferable. The heteroatoms constituting the ring of the heterocyclyl group are preferably nitrogen atoms, oxygen atoms or sulfur atoms. The number of heteroatoms in the ring constituting the heterocyclyl group is preferably 1 to 3, more preferably 1 to 2. The number of carbon atoms of the ring constituting the heterocyclic group is preferably 1 to 30, more preferably 1 to 18, and further preferably 1 to 12. The aryl group and the heterocyclic group may have a substituent. Examples of the substituent include substituent T described below.

* in formula (R1) represents a connecting key. Rs ¹ to Rs ³ in the formula (R1) each independently represent a hydrogen atom or an alkyl group. The number of carbon atoms in the alkyl group represented by Rs ¹ and Rs ³ is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The alkyl group may be linear, branched, or cyclic, with linear or branched chains being preferred. Rs ¹ to Rs ³ are preferably hydrogen atoms. Examples of the heterocyclic group represented by As ³ in the formula (R1) include the above-mentioned heterocyclic groups, and the preferred ranges are also the same.

In formula (R1), n _s1 represents an integer above 0. It is preferable that n _s1 is an integer of 0 to 2, 0 or 1 is more preferable, and 0 is still more preferable.

In the formula (R1), Rs ¹ and Rs ² may be bonded to each other to form a ring, Rs ¹ and As ³ may be bonded to each other to form a ring, and Rs ² and Rs ³ may be bonded to each other to form a ring. As the linking group when forming the above ring, a divalent linking group selected from the group consisting of -CO-, -O-, -NH-, an alkylene group having 1 to 10 carbon atoms, and a combination thereof is preferred. good. The alkylene group serving as the linking group may be unsubstituted or may have a substituent. Examples of the substituent include substituent T described below.

In formula (R1), when n _s1 is 2 or more, the plural Rs ² and Rs ³ may be the same or different.

Examples of the substituent T include a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom), an alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), and an alkenyl group (preferably a carbon atom). Alkenyl group with 2 to 30 carbon atoms), alkynyl group (preferably an alkynyl group with 2 to 30 carbon atoms), aryl group (preferably an aryl group with 6 to 30 carbon atoms), heterocyclic group (preferably an alkynyl group with 6 to 30 carbon atoms) Heterocyclic group with 1 to 30 carbon atoms), amine group (preferably an amine group with 0 to 30 carbon atoms), alkoxy group (preferably an alkoxy group with 1 to 30 carbon atoms), aryloxy group (preferably an alkoxy group with 1 to 30 carbon atoms) Aryloxy group having 6 to 30 carbon atoms), heterocyclic oxy group (preferably heterocyclic oxy group having 1 to 30 carbon atoms), hydroxyl group (preferably hydroxyl group having 2 to 30 carbon atoms), alkoxy group Carbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), heterocyclicoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms) 30 heterocyclic oxycarbonyl group), acyloxy group (preferably a acyloxy group with 2 to 30 carbon atoms), amide group (preferably a amide group with 2 to 30 carbon atoms), aminocarbonylamino group (preferably aminocarbonylamino group having 2 to 30 carbon atoms), alkoxycarbonylamino group (preferably alkoxycarbonylamino group having 2 to 30 carbon atoms), aryloxycarbonylamino group (preferably It is an aryloxycarbonylamino group having 7 to 30 carbon atoms), an amide sulfonyl group (preferably an amine sulfonyl amine group having 0 to 30 carbon atoms), or an amide sulfonyl amine group (preferably having 0 to 30 carbon atoms). aminesulfonylamine group), aminoformyl group (preferably an aminoformyl group having 1 to 30 carbon atoms), alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), arylthio group (preferably an arylthio group having 6 to 30 carbon atoms), heterocyclic thio group (preferably an arylthio group having 1 to 30 carbon atoms), alkylsulfonyl group (preferably an arylthio group having 1 to 30 carbon atoms) Alkylsulfonylamine group), alkylsulfonylamine group (preferably an alkylsulfonylamine group having 1 to 30 carbon atoms), arylsulfonylamine group (preferably an aryl group having 6 to 30 carbon atoms) sulfonylamine group), arylsulfonylamine group (preferably an arylsulfonylamine group with 6 to 30 carbon atoms), heterocyclic sulfonylamine group (preferably a heterocyclic group with 1 to 30 carbon atoms) sulfonyl group), heterocyclyl sulfonyl amine group (preferably a heterocyclic sulfonyl amine group with 1 to 30 carbon atoms), alkyl sulfenyl amine group (preferably an alkyl group with 1 to 30 carbon atoms) sulfinyl group), arylsulfinyl group (preferably an arylsulfinyl group with 6 to 30 carbon atoms), heterocyclyl sulfenyl group (preferably a heterocyclic ring with 1 to 30 carbon atoms) sulfinyl group), urea group (preferably urea group with 1 to 30 carbon atoms), hydroxyl group, nitro group, carboxyl group, sulfo group, phosphate group, carboxylic acid amide group, sulfonyl amide group, amide imine group group, phosphine group, mercapto group, cyano group, alkylsulfinate group, arylsulfinate group, aryl azo group, heterocyclyl azo group, phosphinyl group, phosphinyloxy group, phosphinyl group Amino group, silicon group, hydrazine group, imine group, -SO ₃ ^- M ⁺ (M ⁺ represents an inorganic or organic cation. Examples of cations include alkali metal ions (Li ⁺ , Na ⁺ , K ^+, etc.), ammonium ions, imidazolium ions, pyridinium ions, phosphonium ions, etc.), etc. When these groups are further substituted groups, they may further have a substituent.

In addition, in formula (SQ1), cations exist delocalized as follows. [Chemical 15]

A preferred aspect of the squaraine dye is one in which the squaraine dye is a squaraine dye. According to this aspect, the transmittance in the wavelength region where the influence of scattered light is small and light transmittance is required can be further improved. The squarylium dye is selected from the group consisting of the squarylium dye represented by the formula (SQ2) (hereinafter, also referred to as the squarylium dye (SQ2)) and the squarylium dye represented by the formula (SQ3) (hereinafter, also referred to as the squaraine dye (SQ3)), which will be described later. It is preferred that at least one of the squaraine dye (SQ3)) and the squaraine dye represented by the formula (SQ4) (hereinafter also referred to as squaraine dye (SQ4)) is preferred, and the squaraine dye (SQ4 ) is better.

Another preferred aspect of the squaraine pigment is one in which the squaraine pigment is a squaraine pigment. According to this aspect, a film excellent in heat resistance can be formed. The squarylyanine pigment is selected from the squarylyanine pigment represented by the formula (SQ5) (hereinafter, also referred to as the squarylyanine pigment (SQ5)) and the squarylyanine pigment represented by the formula (SQ6) (hereinafter, also referred to as the squarylyanine pigment) represented by the formula (SQ6) to be described later. At least one kind called squaraine pigment (SQ6) is preferred.

The solubility of the squaraine dye in 100 g of propylene glycol methyl ether acetate at 25° C. is preferably 1 g or more, more preferably 2 g or more, and still more preferably 5 g or more. The solubility of the squaraine pigment in 100 g of propylene glycol methyl ether acetate at 25°C is preferably less than 1 g, more preferably 0.1 g or less, and still more preferably 0.01 g or less.

(Squaraine dye (SQ2)) [Chemical 16] In the formula (SQ2), R ^a1 to R ^a4 each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, and an alkoxy group. , hydroxyl group, alkoxycarbonyl group or -NR ^a11 R ^a12 , R ^a11 and R ^a12 independently represent a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, R ^b1 ~ R ^b4 respectively independently represent a hydrogen atom and a halogen atom , sulfo group, hydroxyl, cyano group, nitro group, carboxyl group, phosphate group, alkyl group, aryl group, heterocyclic group, alkoxy group, acyl group or -NR ^b11 R ^b12 , R ^b11 and R ^b12 independently represent hydrogen Atom, alkyl group, aryl group, heterocyclic group or acyl group, Ya ¹ and Ya ² independently represent -NR ^y11 R ^y12 , R ^y11 and R ^y12 independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group group, R ^a1 and Y ^a1 can bond to form a 5-membered ring or a 6-membered heterocyclic ring containing at least 1 nitrogen atom, R ^a2 and Y ^a1 can bond to form a 5-membered ring containing at least 1 nitrogen atom Or a 6-membered ring heterocyclic ring, R ^a3 and Y ^a2 can be bonded to form a 5-membered ring or a 6-membered ring heterocyclic ring containing at least 1 nitrogen atom, R ^a4 and Y ^a2 can be bonded to form a 5-membered ring or 6-membered ring heterocyclic ring containing at least 1 nitrogen atom. A 5-membered or 6-membered heterocyclic ring of nitrogen atom.

Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

The alkyl group preferably has a carbon number of 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The alkyl group may be linear, branched, or cyclic, with linear or branched chains being preferred. The above-mentioned alkyl group may have a substituent. Examples of the substituent include the above substituent T, at least one selected from the group consisting of an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. Seed is better. The alkyl group is preferably a halogen-substituted alkyl group, and a fluoroalkyl group is also preferably used.

The number of carbon atoms in the aryl group is preferably 6 to 48, more preferably 6 to 22, and even more preferably 6 to 12. The above-mentioned aryl group may have a substituent. Examples of the substituent include the above substituent T, at least one selected from the group consisting of an alkyl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. Seed is better.

The above-mentioned heterocyclic group is preferably a 5-membered ring or a 6-membered ring heterocyclic group. Furthermore, the heterocyclic group is preferably a monocyclic heterocyclic group or a fused cyclic heterocyclic group with a condensation number of 2 to 8, and a monocyclic heterocyclic group or a fused cyclic heterocyclic group with a condensation number of 2 to 4 is preferred. More preferably, a monocyclic heterocyclic group or a fused cyclic heterocyclic group with a condensation number of 2 or 3 is still more preferable. The heteroatoms constituting the ring of the heterocyclyl group are preferably nitrogen atoms, oxygen atoms or sulfur atoms. The number of heteroatoms in the ring constituting the heterocyclyl group is preferably 1 to 3, more preferably 1 to 2. The number of carbon atoms of the ring constituting the heterocyclic group is preferably 1 to 30, more preferably 1 to 18, and further preferably 1 to 12. The above heterocyclic group may have a substituent. Examples of the substituent include the above-mentioned substituent T selected from the group consisting of an alkyl group, an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. At least one of them is preferred.

The number of carbon atoms in the alkoxy group is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The alkoxy group is preferably straight chain or branched chain. The above-mentioned alkoxy group may have a substituent. Examples of the substituent include the above-mentioned substituent T selected from the group consisting of an alkyl group, an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. At least one of them is preferred.

The carbon number of the above-mentioned acyl group is preferably 2 to 30, more preferably 2 to 15, and still more preferably 2 to 8. Examples of the above-mentioned acyl group include a formyl group, an alkylcarbonyl group, and an arylcarbonyl group. The number of carbon atoms in the alkylcarbonyl group is preferably 2 to 30, more preferably 2 to 15, and still more preferably 2 to 8. The carbon number of the arylcarbonyl group is preferably 7 to 30, more preferably 7 to 20, and further preferably 7 to 12. The above-mentioned acyl group may have a substituent. Examples of the substituent include the above-mentioned substituent T selected from the group consisting of an alkyl group, an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. At least one of them is preferred.

The number of carbon atoms in the alkoxycarbonyl group is preferably 2 to 30, more preferably 2 to 15, and further preferably 2 to 8. The above-mentioned alkoxycarbonyl group may have a substituent. Examples of the substituent include the above-mentioned substituent T selected from the group consisting of an alkyl group, an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. At least one of them is preferred.

In formula (SQ2), R ^a1 and Y ^a1 can bond to form a 5-membered ring or a 6-membered heterocyclic ring containing at least 1 nitrogen atom, and R ^a2 and Y ^a1 can bond to form a 5-membered ring or 6-membered ring containing at least 1 nitrogen atom. For a 5-membered ring or 6-membered ring heterocycle, R ^a3 and Y ^a2 can be bonded to form a 5-membered ring or 6-membered ring heterocycle containing at least 1 nitrogen atom, and R ^a4 and Y ^a2 can be bonded to form a 5-membered ring or 6-membered ring heterocycle. A 5- or 6-membered heterocyclic ring containing at least one nitrogen atom. The formed heterocycle may have substituents. Examples of the substituent include the above-mentioned substituent T selected from the group consisting of an alkyl group, an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. At least one of them is preferred.

It is preferred that one of R ^b1 and R ^b2 in Formula (SQ2) is -NR ^b11 R ^b12 and the other is a hydrogen atom. Moreover, it is preferable that one of R ^b3 and R ^a4 is -NR ^b11 R ^b12 and the other one is a hydrogen atom. It is preferred that R ^b11 and R ^b12 each independently represent an alkyl group, an aryl group, a heterocyclic group or a hydroxyl group, and a hydroxyl group is more preferred.

(Squaraine dye (SQ3)) [Chemical 17] In formula (SQ3), X ¹ and X ² independently represent -O-, -S-, -Se-, -NR ^c10 - or -CR ^d10 R ^d11 -, and R ^c1 , R ^c2 and R ^c10 independently represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, and R ^d1 to R ^d8 , R ^d10 and R ^d11 independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group and a phosphate group. , alkyl group, aryl group, heterocyclyl group, alkoxy group, acyl group, alkoxycarbonyl group, or -NR ^d21 R ^a22 , R ^d21 and R ^d22 respectively independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group , among R ^d1 to R ^d8 , two adjacent groups can bond with each other to form a ring.

The halogen atom, alkyl group, aryl group, heterocyclic group, alkoxy group, acyl group, and alkoxycarbonyl group in the formula (SQ3) is the same as the halogen atom, alkyl group, aryl group, heterocyclic group, and alkyl group in the formula (SQ2). The oxygen group, acyl group and alkoxycarbonyl group are the same, and the preferred ranges are also the same.

In formula (SQ3), two adjacent groups among R ^d1 to R ^d8 may be bonded to each other to form a ring. The ring formed may be a hydrocarbon ring or a heterocyclic ring. In addition, the hydrocarbon ring and the heterocyclic ring may be aromatic rings or non-aromatic rings. In addition, the hydrocarbon ring and the heterocyclic ring may be a single ring or a condensed ring. The formed ring is preferably a 5- or 6-membered hydrocarbon ring or heterocyclic ring. Moreover, the ring formed may have a substituent. Examples of the substituent include the above-mentioned substituent T selected from the group consisting of an alkyl group, an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. At least one of them is preferred.

(Squaraine dye (SQ4)) [Chemical 18] In formula (SQ4), X ⁴¹ and X ⁴² each independently represent a divalent linking group represented by formula (X-1) or formula (X-2), and R ^41a and R ^41b each independently represent an alkyl group or Aryl group, R ^42a , R ^42b , R ^43a and R ^43b each independently represent a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, R ^44a and R ^44b each independently represent an alkyl group or an aryl group, - (CR ^X1 R ^X2 ) _n1 - ･･･(X-1) In formula (X-1), R ^X1 and ^{R X3} R ^X4 _{) n2} -O- ^{( CR X5 R} , n2 and n3 independently represent integers from 0 to 2, and n2+n3 is 1 or 2.

The halogen atom, alkyl group, aryl group, and alkoxy group in the formula (SQ4) are the same as the halogen atom, alkyl group, aryl group, and alkoxy group in the formula (SQ2), and the preferred ranges are also the same.

It is preferable that n1 in formula (X-1) is 2. It is preferable that R ^X1 and R ^X2 of the formula (X-1) are each independently a hydrogen atom or an alkyl group.

It is preferable that n2+n3 in formula (X-2) is 1. It is preferred that R ^X3 to R ^X6 in the formula (X-2) are each independently a hydrogen atom or an alkyl group.

It is preferred that X ⁴¹ and X ⁴² of the formula (SQ4) are each independently a divalent linking group represented by the formula (X-1).

(Squaraine pigment (SQ5)) [Chemical 19] In the formula (SQ5), R ⁵¹ to R ⁷⁰ each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a sulfo group, -NR ⁷¹ R ⁷² , -SO ₂ NR ⁷³ R ⁷⁴ , -COOR ⁷⁵ , -CONR ⁷⁶ R ⁷⁷ , nitro group, cyano group or halogen atom, R ⁷¹ ~ R ⁷⁷ respectively independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group, R ⁷¹ and R ⁷² can be bonded to each other to form a ring, R ⁷³ and R ⁷⁴ can be bonded to each other to form a ring, R ⁷⁶ and R ⁷⁷ can be bonded to each other to form a ring, among R ⁵¹ to R ⁷⁰ , two adjacent groups They can bond with each other to form a ring.

The above-mentioned halogen atom, alkyl group, aryl group, heterocyclic group, and alkoxy group are the same as those in the formula (SQ2), and the preferred ranges are also the same.

The number of carbon atoms in the alkenyl group is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The alkenyl group is preferably straight chain or branched chain. The above alkenyl group may have a substituent. Examples of the substituent include the above substituent T, at least one selected from the group consisting of an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. Seed is better.

The carbon number of the above-mentioned aryloxy group is preferably 6 to 48, more preferably 6 to 22, and still more preferably 6 to 12. The above-mentioned aryl group may have a substituent. Examples of the substituent include the above substituent T, at least one selected from the group consisting of an alkyl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. Seed is better.

It is preferable that R ⁵⁵ , R ⁵⁶ , R ⁶⁵ and R ⁶⁶ in the formula (SQ5) are hydrogen atoms.

At least one of R ⁵¹ to R ⁵⁴ in formula (SQ5) is an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a sulfo group, -NR ⁷¹ R ⁷² , -SO ₂ NR ⁷³ R ⁷⁴ , -COOR ⁷⁵ , -CONR ⁷⁶ R ⁷⁷ , nitro group, cyano group or halogen atom are preferred, and alkyl group, alkoxy group or halogen atom is more preferred. Among them, one of R ⁵¹ to R ⁵⁴ is an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a sulfo group, -NR ⁷¹ R ⁷² , -SO ₂ NR ⁷³ R ⁷⁴ , - COOR ⁷⁵ , -CONR ⁷⁶ R ⁷⁷ , nitro group, cyano group or halogen atom, and the rest are preferably hydrogen atoms. One of R ⁵¹ to R ⁵⁴ is an alkyl group, alkoxy group or halogen atom, and the rest are hydrogen atoms. Better.

At least one of R ⁵⁷ to R ⁶⁰ in formula (SQ5) is an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a sulfo group, -NR ⁷¹ R ⁷² , -SO ₂ NR ⁷³ R ⁷⁴ , -COOR ⁷⁵ , -CONR ⁷⁶ R ⁷⁷ , nitro group, cyano group or halogen atom are preferred, and alkyl group, alkoxy group or halogen atom is more preferred. Among them, one of R ⁵⁷ to R ⁶⁰ is an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a sulfo group, -NR ⁷¹ R ⁷² , -SO ₂ NR ⁷³ R ⁷⁴ , - COOR ⁷⁵ , -CONR ⁷⁶ R ⁷⁷ , nitro group, cyano group or halogen atom, the rest are preferably hydrogen atoms. One of R ⁵⁷ ~ R ⁶⁰ is an alkyl group, alkoxy group or halogen atom, and the rest are hydrogen atoms. Better.

At least one of R ⁶¹ to R ⁶⁴ in formula (SQ5) is an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a sulfo group, -NR ⁷¹ R ⁷² , -SO ₂ NR ⁷³ R ⁷⁴ , -COOR ⁷⁵ , -CONR ⁷⁶ R ⁷⁷ , nitro group, cyano group or halogen atom are preferred, and alkyl group, alkoxy group or halogen atom is more preferred. Among them, one of R ⁶¹ to R ⁶⁴ is an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a sulfo group, -NR ⁷¹ R ⁷² , -SO ₂ NR ⁷³ R ⁷⁴ , - COOR ⁷⁵ , -CONR ⁷⁶ R ⁷⁷ , nitro group, cyano group or halogen atom, the rest are preferably hydrogen atoms. One of R ⁶¹ to R ⁶⁴ is an alkyl group, alkoxy group or halogen atom, and the rest are hydrogen atoms. Better.

At least one of R ⁶⁷ to R ⁷⁰ in formula (SQ5) is an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a sulfo group, -NR ⁷¹ R ⁷² , -SO ₂ NR ⁷³ R ⁷⁴ , -COOR ⁷⁵ , -CONR ⁷⁶ R ⁷⁷ , nitro group, cyano group or halogen atom are preferred, and alkyl group, alkoxy group or halogen atom is more preferred. Among them, one of R ⁶⁷ to R ⁷⁰ is an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a sulfo group, -NR ⁷¹ R ⁷² , -SO ₂ NR ⁷³ R ⁷⁴ , - COOR ⁷⁵ , -CONR ⁷⁶ R ⁷⁷ , nitro group, cyano group or halogen atom, and the rest are preferably hydrogen atoms. One of R ⁶⁷ ~ R ⁷⁰ is an alkyl group, alkoxy group or halogen atom, and the rest are hydrogen atoms. Better.

In formula (SQ5), two adjacent groups among R ⁵¹ to R ⁷⁰ may be bonded to each other to form a ring. The ring formed may be a hydrocarbon ring or a heterocyclic ring. In addition, the hydrocarbon ring and the heterocyclic ring may be aromatic rings or non-aromatic rings. In addition, the hydrocarbon ring and the heterocyclic ring may be a single ring or a condensed ring. The formed ring is preferably a 5- or 6-membered hydrocarbon ring or heterocyclic ring. Moreover, the ring formed may have a substituent. Examples of the substituent include the above-mentioned substituent T selected from the group consisting of an alkyl group, an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. At least one of them is preferred.

(Squaraine pigment (SQ6)) [Chemical 20] In formula (SQ6), Q ^1a , Q ^1b , Q ^4a , Q ^4b , Q ^5a , Q ^5b , Q ^8a and Q ^8b respectively independently represent a carbon atom or a nitrogen atom. However, when Q ^1a is a nitrogen atom, Rq ^1a does not exist, when Q ^1b is a nitrogen atom, Rq ^1b does not exist, when Q ^4a is a nitrogen atom, Rq ^4a does not exist, when Q ^4b is a nitrogen atom, Rq ^4b does not exist, when Q ^5a is a nitrogen atom , Rq ^5a does not exist. When Q ^5b is a nitrogen atom, Rq ^5b does not exist. When Q ^8a is a nitrogen atom, Rq ^8a does not exist. When Q ^8b is a nitrogen atom, Rq ^8b does not exist. R ^81a ~ R ^85a And R ^81b ~ R ^85b independently represent a hydrogen atom, a sulfo group, -SO ₃ ^- M ⁺ or a halogen atom. M ⁺ represents an inorganic or organic cation. Among R ^81a ~ R ^85a , two adjacent groups can be mutually exclusive. Bond to form a ring. Among R ^81b to R ^85b , two adjacent groups can bond to each other to form a ring. Rq ^1a to Rq ^8a and Rq ^1b to Rq ^8b independently represent hydrogen atoms and alkyl groups. , alkenyl, aryl, heterocyclyl, alkoxy, aryloxy, hydroxyl, -NRq ¹¹ Rq ¹² , sulfo group, -SO ₂ NRq ¹³ Rq ¹⁴ , -COORq ¹⁵ , -CONRq ¹⁶ Rq ¹⁷ , nitro , cyano group or halogen atom, Rq ¹¹ to Rq ¹⁷ independently represent a hydrogen atom, alkyl group, aryl group, acyl group or heterocyclic group, Rq ¹¹ and Rq ¹² can be bonded to each other to form a ring, Rq ¹³ and Rq ¹⁴ They can be bonded to each other to form a ring, and Rq ¹⁶ and Rq ¹⁷ can be bonded to each other to form a ring.

The above-mentioned halogen atom, alkyl group, aryl group, heterocyclic group, alkoxy group and hydroxyl group are the same as those in formula (SQ2), preferably The scope is also the same. The above-mentioned alkenyl group and aryloxy group are the same as those in formula (SQ5), and the preferred ranges are also the same. Among the -SO ₃ -M ⁺ represented by R ^81a to R ^85a and R ^81b to R ^85b , any known inorganic or organic cation represented by M ⁺ can be used without limitation ^. Examples include alkali metal ions (Li ⁺ , Na ⁺ , K ^{+ ,} etc.), ammonium ions, imidazolium ions, pyridinium ions, and phosphonium ions.

It is preferred that Q ^1a , Q ^1b , Q ^4a , Q ^4b , Q ^5a , Q ^5b , Q ^8a and Q ^8b in the formula (SQ6) are carbon atoms.

It is preferred that R ^81a to R ^85a and R ^81b to R ^85b of the formula (SQ6) are hydrogen atoms. M ⁺ is an inorganic or organic cation.

It is preferable that Rq ^1a to Rq ^8a and Rq ^1b to Rq ^8b of the formula (SQ6) are each independently a hydrogen atom, an alkyl group, an alkoxy group, a hydroxyl group, -NRq ¹¹ Rq ¹² or a halogen atom.

In R ^81a to R ^85a of the formula (SQ6), two adjacent groups can bond to each other to form a ring. Among R ^81b to R ^85b , two adjacent groups can bond to each other to form a ring. The ring formed may be a hydrocarbon ring or a heterocyclic ring. In addition, the hydrocarbon ring and the heterocyclic ring may be aromatic rings or non-aromatic rings. In addition, the hydrocarbon ring and the heterocyclic ring may be a single ring or a condensed ring. The formed ring is preferably a 5- or 6-membered hydrocarbon ring or heterocyclic ring. Moreover, the ring formed may have a substituent. Examples of the substituent include the above-mentioned substituent T selected from the group consisting of an alkyl group, an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. At least one of them is preferred.

It is preferred that the squaraine pigment is an infrared absorber. In addition, it is preferable that the maximum absorption wavelength of squaraine pigment exists at a wavelength of 650 nm or more, more preferably a wavelength range of 650 to 1500 nm, a further preferable wavelength range of 660 to 1200 nm, and a wavelength of 660 to 1000 nm. The range is particularly good.

Specific examples of the squaraine dye include the compounds shown below. P001～P006 and P101～P106 are squaraine pigments, and D001～D004 are squaraine dyes. [Chemistry 21] [Chemistry 22] [Chemistry 23]

The content of the squaraine pigment represented by the formula (SQ1) in the total solid content of the infrared absorbing composition is preferably 1 to 60% by mass. The upper limit is preferably 50 mass% or less, and more preferably 40 mass% or less. The lower limit is preferably 3% by mass or more, and more preferably 5% by mass or more. The infrared absorbing composition may contain only one type of squaraine pigment represented by formula (SQ1), or may contain two or more types. When two or more kinds of squaraine pigments represented by formula (SQ1) are contained, it is preferable that the total amount is within the above range.

＜＜Specific compounds＞＞ The infrared absorbing composition of the present invention contains a compound represented by formula (1a) (hereinafter also referred to as a specific compound).

The infrared absorbing composition of the present invention contains 0.01 to 1.0 parts by mass of a specific compound (the compound represented by the formula (1a)) with respect to 100 parts by mass of the squarylyanine dye represented by the formula (SQ1). Since the light resistance of the obtained film can be further improved, the upper limit of the content of the specific compound is preferably 0.9 parts by mass or less, and more preferably 0.8 parts by mass or less. The lower limit of the content of the specific compound is preferably 0.05 parts by mass or more, more preferably 0.1 parts by mass or more, and 0.2 parts by mass, in order to further improve the light resistance of the obtained film and further improve the rectangularity. Parts or more are more preferably, and 0.3 parts by mass or more are still more preferred. The infrared absorbing composition may contain only one specific compound, or may contain two or more types. [Chemical 24] In the formula (1a), A ¹ represents an aryl group, a heterocyclic group or the above-mentioned group represented by the formula (R1), and R ¹⁰¹ represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group.

The meaning of A ¹ in formula (1a) is the same as that of A ¹ in formula (SQ1), and the preferred range is also the same.

The number of carbon atoms in the alkyl group represented by R ¹⁰¹ is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 8. The alkyl group may be linear, branched, or cyclic, with linear or branched chains being preferred. The above-mentioned alkyl group may have a substituent. Examples of the substituent include the above substituent T, at least one selected from the group consisting of an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. Seed is better.

The aryl group represented by R ¹⁰¹ preferably has a carbon number of 6 to 48, more preferably 6 to 22, and further preferably 6 to 12. The above-mentioned aryl group may have a substituent. Examples of the substituent include the above substituent T, at least one selected from the group consisting of an alkyl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. Seed is better.

The heterocyclic group represented by R ¹⁰¹ is preferably a 5-membered ring or a 6-membered ring heterocyclic group. Furthermore, the heterocyclic group is preferably a monocyclic heterocyclic group or a fused cyclic heterocyclic group with a condensation number of 2 to 8, and a monocyclic heterocyclic group or a fused cyclic heterocyclic group with a condensation number of 2 to 4 is preferred. More preferably, a monocyclic heterocyclic group or a fused cyclic heterocyclic group with a condensation number of 2 or 3 is still more preferable. The heteroatoms constituting the ring of the heterocyclyl group are preferably nitrogen atoms, oxygen atoms or sulfur atoms. The number of heteroatoms in the ring constituting the heterocyclyl group is preferably 1 to 3, more preferably 1 to 2. The number of carbon atoms of the ring constituting the heterocyclic group is preferably 1 to 30, more preferably 1 to 18, and further preferably 1 to 12. The above heterocyclic group may have a substituent. Examples of the substituent include the above-mentioned substituent T selected from the group consisting of an alkyl group, an aryl group, a heterocyclic group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. At least one of them is preferred.

R ¹⁰¹ is preferably a hydrogen atom, an alkyl group or an aryl group, more preferably a hydrogen atom or an alkyl group, and further preferably a hydrogen atom.

In addition, in formula (1a), cations exist delocalized as follows. [Chemical 25]

The specific compound is selected from the following compounds represented by formula (2a) (hereinafter, also referred to as specific compound (2a)), compounds represented by formula (3a) (hereinafter, also referred to as specific compound (3a)), and The compound represented by formula (4a) (hereinafter, also referred to as specific compound (4a)), the compound represented by formula (5a) (hereinafter, also referred to as specific compound (5a)), and the compound represented by formula (6a) ( Hereinafter, at least one type (also referred to as specific compound (6a)) is preferred.

As a preferred embodiment of the combination of the squaraine dye and the specific compound, the squaraine dye is selected from the above-mentioned squaraine dye (SQ2), squaraine dye (SQ3) and squaraine dye (SQ4). At least one and the specific compound is a combination of at least one selected from the group consisting of specific compound (2a), specific compound (3a) and specific compound (4a). In this form, the squaraine dye is a combination of the squaraine dye (SQ2) and the specific compound is the specific compound (2a), and the squaraine dye is the squaraine dye (SQ3) and the specific compound is the specific compound (3a). A combination of squaraine dye is a squaraine dye (SQ4) and a specific compound is a specific compound (4a). It is preferable because pixels with better light resistance and squareness can be formed. A combination in which the cyanine dye is a squaraine dye (SQ4) and the specific compound is a specific compound (4a) is more preferred.

As another preferred embodiment of the combination of the squaraine pigment and the specific compound, the squaraine pigment is at least one specific compound selected from the above-mentioned squaraine pigment (SQ5) and the squaraine pigment (SQ6). It is at least 1 combination selected from the specific compound (5a) and the specific compound (6a). In this aspect, the squaraine pigment is a combination of the squaraine pigment (SQ5) and the specific compound (5a), or the squaraine pigment is capable of forming a pixel with better light resistance and squareness. A combination in which the pigment is a squaraine pigment (SQ6) and the specific compound is a specific compound (6a) is preferred.

(Specific compound (2a)) [Chemical 26] In formula (2a), R ^a1 and R ^a2 independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, and an alkoxy group. , hydroxyl group, alkoxycarbonyl group or -NR ^a11 R ^a12 , R ^a11 and R ^a12 independently represent a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, R ^b1 and R ^b2 respectively independently represent a hydrogen atom and a halogen atom , sulfo group, hydroxyl group, cyano group, nitro group, carboxyl group, phosphate group, alkyl group, aryl group, heterocyclic group, alkoxy group, acyl group or -NR ^b11 R ^b12 , R ^b11 and R ^b12 independently represent hydrogen atom, alkyl group, aryl group, heterocyclic group or hydroxyl group, Ya ¹ represents -NR ^y11 R ^y12 , R ^y11 and R ^y12 independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group, R ^a1 and Y ^a1 can be bonded to form a 5-membered ring or a 6-membered heterocyclic ring containing at least 1 nitrogen atom, and R ^a2 and Y ^a1 can be bonded to form a 5-membered ring or 6-membered heterocyclic ring containing at least 1 nitrogen atom. Ring, R ¹⁰² represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group.

The meanings of R ^a1 , R ^a2 , R ^b1 , R ^b2 , and Ya ¹ of the formula (2a) are the same as the meanings of R ^a1 , R ^a2 , R ^b1 , R b2 , ^and Ya ¹ of the formula (SQ2), and the preferred ranges are also the same. . R ¹⁰² in the formula (2a) has the same meaning as R ¹⁰¹ in the formula (1a), and the preferred ranges are also the same.

(Specific compound (3a)) [Chemical 27] In formula (3a), X ¹ represents -O-, -S-, -Se-, -NR ^c10 - or -CR ^d10 R ^d11 -, and R ^c1 and R ^c10 independently represent a hydrogen atom, an alkyl group, and an aryl group. or heterocyclic group, R ^d1 ~ R ^d4 , R ^d10 and R ^d11 respectively independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, and a heterocyclic group. group, alkoxy group, acyl group, alkoxycarbonyl group or -NR ^d21 R ^a22 , R ^d21 and R ^d22 independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group, among R ^d1 to R ^d4 , adjacent The two groups can be bonded to each other to form a ring, R ¹⁰³ represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group,

The meanings of X ¹ , R ^c1 , and R ^d1 to R ^d4 in the formula (3a) are the same as the meanings of X ¹ , R ^c1 , and R ^d1 to R ^d4 in the formula (SQ3), and the preferred ranges are also the same. R ¹⁰³ in the formula (3a) has the same meaning as R ¹⁰¹ in the formula (1a), and the preferred ranges are also the same.

(Specific compound (4a)) [Chemical 28] In the formula (4a), X ⁴¹ represents the divalent linking group represented by the above formula (X-1) or the above formula (X-2), R ^41a represents an alkyl group or an aryl group, and R ^42a and R ^43a are respectively independent. represents a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, R ^44a represents an alkyl group or an aryl group, and R ¹⁰⁴ represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group.

The meanings of X ⁴¹ , R ^41a , R ^42a , R ^43a , and R ^44a in Formula (4a) are the same as those of X ⁴¹ , R ^41a , R ^42a , R ^43a , and R ^44a in Formula (SQ4), and the preferred ranges are also the same. . R ¹⁰⁴ in the formula (4a) has the same meaning as R ¹⁰¹ in the formula (1a), and the preferred ranges are also the same.

(Specific compound (5a)) [Chemical 29] In formula (5a), R ⁵¹ to R ⁶⁰ each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a sulfo group, -NR ⁷¹ R ⁷² , -SO ₂ NR ⁷³ R ⁷⁴ , -COOR ⁷⁵ , -CONR ⁷⁶ R ⁷⁷ , nitro group, cyano group or halogen atom, R ⁷¹ ~ R ⁷⁷ independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group, R ⁷¹ and R ⁷² can be bonded to each other to form a ring, R ⁷³ and R ⁷⁴ can be bonded to each other to form a ring, R ⁷⁶ and R ⁷⁷ can be bonded to each other to form a ring, among R ⁵¹ to R ⁶⁰ , two adjacent groups can bond with each other to form a ring, R ¹⁰⁵ represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group,

The meanings of R ⁵¹ to R ⁶⁰ in the formula (5a) are the same as the meanings of R ⁵¹ to R ⁶⁰ in the formula (SQ5), and the preferred ranges are also the same. R ¹⁰⁵ in the formula (5a) has the same meaning as R ¹⁰¹ in the formula (1a), and the preferred ranges are also the same.

(Specific compound (6a)) [Chemical 30] In formula (6a), Q ^1a , Q ^4a , Q ^5a and Q ^8a each independently represent a carbon atom or a nitrogen atom. However, when Q ^1a is a nitrogen atom, Rq ^1a does not exist. When Q ^4a is a nitrogen atom, Rq ^4a does not exist. When Q ^5a is a nitrogen atom, Rq ^5a does not exist. When Q ^8a is a nitrogen atom, Rq ^8a does not exist. R ^81a ~ R ^85a independently represent a hydrogen atom, a sulfo group, and -SO ₃ ^- M ⁺ or halogen atom, M ⁺ represents inorganic or organic cation, among R ^81a ~ R ^85a , two adjacent groups can bond with each other to form a ring, Rq ^1a ~ Rq ^8a independently represent hydrogen atoms and alkyl groups , alkenyl, aryl, heterocyclyl, alkoxy, aryloxy, hydroxyl, -NRq ¹¹ Rq ¹² , sulfo group, -SO ₂ NRq ¹³ Rq ¹⁴ , -COORq ¹⁵ , -CONRq ¹⁶ Rq ¹⁷ , nitro , cyano group or halogen atom, Rq ¹¹ to Rq ¹⁷ independently represent a hydrogen atom, alkyl group, aryl group, acyl group or heterocyclic group, Rq ¹¹ and Rq ¹² can be bonded to each other to form a ring, Rq ¹³ and Rq ¹⁴ Rq 16 and Rq 17 may be bonded to each other to form a ring. Rq ¹⁶ and Rq ¹⁷ may be bonded to each other to form a ring. R ¹⁰⁶ represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group.

The meanings of Q ^1a , Q ^4a , Q ^5a , Q ^8a , R ^81a to R ^85a , and Rq ^1a to Rq ^8a in formula (6a) are the same as those of Q ^1a , Q ^4a , Q ^5a , Q ^8a , and R ^81a in formula (SQ6). ~R ^85a and Rq ^1a ~Rq ^8a have the same meaning, and the preferred ranges are also the same. R ¹⁰⁶ in the formula (6a) has the same meaning as R ¹⁰¹ in the formula (1a), and the preferred ranges are also the same.

Specific examples of the specific compound include the compounds shown below. [Chemical 31] [Chemical 32]

The content of the specific compound in the total solid content of the infrared absorbing composition is preferably 0.005 to 0.1% by mass. The upper limit is preferably 0.09 mass% or less, and more preferably 0.08 mass% or less. The lower limit is preferably 0.01 mass% or more, and more preferably 0.02 mass% or more.

The content of the specific compound is preferably 0.05 to 1 part by mass relative to 100 parts by mass of the photopolymerization initiator. The upper limit is preferably 0.9 parts by mass or less, and more preferably 0.8 parts by mass or less. The lower limit is preferably 0.1 parts by mass or more, and more preferably 0.2 parts by mass or more.

The content of the specific compound is preferably 0.025 to 0.5 parts by mass relative to 100 parts by mass of the polymerizable compound. The upper limit is preferably 0.45 parts by mass or less, and more preferably 0.4 parts by mass or less. The lower limit is preferably 0.05 parts by mass or more, and more preferably 0.1 parts by mass or more.

＜＜Resin＞＞ The infrared absorbing composition of the present invention contains resin. For example, the resin can be blended for the purpose of dispersing pigments in a composition or as a binder. In addition, resins mainly used to disperse pigments and the like in compositions are also called dispersants. However, this type of use of the resin is an example, and the resin can be used for purposes other than such uses.

The weight average molecular weight of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, and even more preferably 500,000 or less. A lower limit of 4,000 or more is preferred, and a lower limit of 5,000 or more is even better.

Examples of the resin include (meth)acrylic resin, epoxy resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polystyrene resin, polyetherstyrene resin, polyphenylene resin, Polyarylene ether phosphine oxide resin, polyimide resin, polyamide resin, polyamide imine resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, vinyl acetate resin, Polyvinyl alcohol resin, polyvinyl acetal resin, polyurethane resin, polyurea resin, etc. Among these resins, one type may be used alone, or two or more types may be mixed and used. As the cyclic olefin resin, norbornene resin is preferred from the viewpoint of improving heat resistance. Examples of commercially available norbornene resins include the ARTON series (for example, ARTON F4520) manufactured by JSR Corporation. In addition, as the resin, the resin described in the Examples of International Publication No. 2016/088645, the resin described in Japanese Patent Application Laid-Open No. 2017-057265, the resin described in Japanese Patent Application Laid-Open No. 2017-032685, and the Japanese Patent Application Publication No. 2017-032685 can also be used. The resin described in Japanese Patent Application Publication No. 2017-075248, the resin described in Japanese Patent Application Publication No. 2017-066240, the resin described in Japanese Patent Application Publication No. 2017-167513, the resin described in Japanese Patent Application Publication No. 2017-173787 , the resin described in paragraphs 0041 to 0060 of Japanese Patent Application Publication No. 2017-206689, the resin described in paragraphs 0022 to 0071 of Japanese Patent Application Publication No. 2018-010856, and the block described in Japanese Patent Application Publication No. 2016-222891 Polyisocyanate resin, resin described in Japanese Patent Application Publication No. 2020-122052, resin described in Japanese Patent Application Publication No. 2020-111656, resin described in Japanese Patent Application Publication No. 2020-139021, Japanese Patent Application Publication No. 2017-138503 The resin described in the publication contains a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain. In addition, as the resin, a resin having a skeleton can also be suitably used. Regarding the resin having a tungsten skeleton, please refer to the description of US Patent Application Publication No. 2017/0102610, which content is incorporated into this specification. In addition, as the resin, the resin described in paragraphs 0199 to 0233 of Japanese Patent Application Laid-Open No. 2020-186373, the alkali-soluble resin described in Japanese Patent Application Laid-Open No. 2020-186325, and Korean Patent Publication No. 10-2020-0078339 can also be used. The resin represented by formula 1 described in the publication No.

As the resin, it is preferable to use a resin having an acid group. Examples of acidic groups include carboxyl groups, phosphate groups, sulfo groups, phenolic hydroxyl groups, and the like. There may be only one type of these acid groups, or two or more types of them. A resin having an acid group can be used as an alkali-soluble resin, for example. The acid value of the resin with acid groups is preferably 30 to 500 mgKOH/g. The lower limit is preferably 50 mgKOH/g or more, and more preferably 70 mgKOH/g or more. The upper limit is preferably 400 mgKOH/g or less, more preferably 200 mgKOH/g or less, further preferably 150 mgKOH/g or less, and most preferably 120 mgKOH/g or less.

The resin includes a resin containing a repeating unit derived from a compound represented by formula (ED1) and/or a compound represented by formula (ED2) (hereinafter, these compounds may also be referred to as "ether dimers"). Also better.

[Chemical 33]

In the formula (ED1), R ¹ and R ² each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent. [Chemical 34] In formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. As a specific example of Formula (ED2), refer to the description of Japanese Patent Application Laid-Open No. 2010-168539.

Regarding specific examples of ether dimers, refer to paragraph 0317 of Japanese Patent Application Laid-Open No. 2013-029760, and this content is incorporated into this specification.

As the resin, a resin containing a repeating unit having a polymerizable group is also preferred. Examples of the polymerizable group include groups containing an ethylenically unsaturated bond.

As the resin, it is also preferable to use a resin containing a repeating unit derived from a compound represented by formula (X). [Chemical 35] In the formula, R ¹ represents a hydrogen atom or a methyl group, R ²¹ and R ²² each independently represent an alkylene group, and n represents an integer of 0 to 15. The number of carbon atoms in the alkylene group represented by R ²¹ and R ²² is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 3, and particularly preferably 2 or 3. n represents an integer of 0 to 15. An integer of 0 to 5 is preferred, an integer of 0 to 4 is more preferred, and an integer of 0 to 3 is further preferred.

Examples of the compound represented by formula (X) include ethylene oxide or propylene oxide modified (meth)acrylate of para-cumyl phenol. Examples of commercially available products include ARONIX M-110 (manufactured by TOAGOSEI CO., LTD.) and the like.

The resin preferably contains a resin as a dispersant. Examples of the dispersant include acidic dispersants (acidic resins) and alkaline dispersants (basic resins). Here, the acidic dispersant (acidic resin) means a resin in which the amount of acid groups is greater than the amount of base groups. As an acidic dispersant (acidic resin), when the total amount of acid groups and base groups is 100 mol%, a resin having an acid group amount of 70 mol% or more is preferred. It is preferable that the acidic group of the acidic dispersant (acidic resin) is a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH/g. In addition, the alkaline dispersant (alkaline resin) means a resin in which the amount of base groups is greater than the amount of acid groups. As an alkaline dispersant (basic resin), when the total amount of acid groups and bases is 100 mol%, a resin in which the amount of bases exceeds 50 mol% is preferred. The alkaline dispersant preferably has an amine group as its base.

It is also preferred that the resin used as the dispersant is a graft resin. For details of the graft resin, please refer to the description in paragraphs 0025 to 0094 of Japanese Patent Application Laid-Open No. 2012-255128, and this content is incorporated into this specification.

It is also preferred that the resin used as the dispersant is a polyimine-based dispersant containing a nitrogen atom in at least one of its main chain and side chain. As the polyimine-based dispersant, a resin having a main chain and a side chain and a basic nitrogen atom in at least one of the main chain and side chain is preferred. The main chain contains a partial structure having a functional group of pKa 14 or less. , the number of atoms in the side chain is 40 to 10,000. The basic nitrogen atom is not particularly limited as long as it is a basic nitrogen atom. Regarding the polyimine dispersant, please refer to the description in paragraphs 0102 to 0166 of Japanese Patent Application Laid-Open No. 2012-255128, and this content is incorporated into this specification.

It is also preferred that the resin used as the dispersant has a structure in which a plurality of polymer chains are bonded to the core. Examples of such resins include dendritic polymers (including star polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of Japanese Patent Application Laid-Open No. 2013-043962.

The resin used as a dispersant is also preferably a resin containing a repeating unit having a group containing an ethylenically unsaturated bond in a side chain. The content of the repeating unit having an ethylenically unsaturated bond-containing group in the side chain is preferably 10 mol% or more in all the repeating units of the resin, more preferably 10 to 80 mol%, and 20 to 70 mol%. Ear% is further preferred.

In addition, as the dispersant, the resin described in Japanese Patent Application Laid-Open No. 2018-087939 and the block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6432077 can also be used. ), the polyethyleneimine having a polyester side chain described in International Publication No. 2016/104803, the block copolymer described in International Publication No. 2019/125940, the polyethylene imine described in Japanese Patent Application Laid-Open No. 2020-066687 Block polymers with acrylamide structural units, block polymers with acrylamide structural units described in Japanese Patent Application Laid-Open No. 2020-066688, etc.

Dispersants are available as commercial products, and specific examples thereof include DISPERBYK series manufactured by BYK Japan K.K., SOLSPERSE series manufactured by Japan Lubrizol Corporation, Efka series manufactured by BASF Corporation, and Ajinomoto Fine-Techno Co., Inc. Manufactured Ajispar series, etc. In addition, the products described in Paragraph 0129 of Japanese Patent Application Laid-Open No. 2012-137564 and the products described in Paragraph 0235 of Japanese Patent Application Laid-Open No. 2017-194662 can also be used as the dispersant.

The content of the resin in the total solid content of the infrared absorbing composition is preferably 1 to 85% by mass. It is more preferable that the lower limit is 5 mass % or more, more preferably 10 mass % or more, 20 mass % or more is still more preferred, and 30 mass % or more is particularly preferred. The upper limit is preferably 80 mass% or less, more preferably 75 mass% or less, and still more preferably 70 mass% or less.

When the infrared absorbing composition of the present invention contains a resin as a dispersant, the content of the resin as a dispersant in the total solid content of the infrared absorbing composition is preferably 0.5 to 40% by mass. The upper limit is preferably 30 mass% or less, and further preferably 20 mass% or less. It is more preferable that the lower limit is 1 mass % or more, and it is further more preferable that it is 5 mass % or more. Moreover, the content of the resin as a dispersing agent is preferably 1 to 100 parts by mass relative to 100 parts by mass of the squaraine dye. The upper limit is preferably 80 parts by mass or less, and more preferably 75 parts by mass or less. The lower limit is preferably 2.5 parts by mass or more, and more preferably 5 parts by mass or more.

The infrared absorbing composition of the present invention may contain only one type of resin, or may contain two or more types. When two or more types of resins are contained, the total amount is preferably within the above range.

<<Other infrared absorbers>> The infrared absorbing composition of the present invention can contain infrared absorbers (other infrared absorbers) other than the above-mentioned squaraine dye. By further containing other infrared absorbers, a film capable of blocking infrared rays in a wider wavelength range can be formed. Other infrared absorbers can be dyes or pigments (particles). Examples of other infrared absorbers include pyrrolopyrrole compounds, polymethine compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, merocyanine compounds, ketonium compounds, and oxa compounds. Cyanine compounds, immonium compounds, dithiol compounds, triarylmethane compounds, pyrrromethylene compounds, azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, disulfene metal complexes, metals Oxides, metal borides, etc. Examples of the pyrrolopyrrole compound include compounds described in paragraphs 0016 to 0058 of Japanese Patent Application Laid-Open No. 2009-263614, compounds described in paragraphs 0037 to 0052 of Japanese Patent Application Laid-Open No. 2011-068731, and International Publication No. 2015/ Compounds described in paragraphs 0010 to 0033 of No. 166873, etc. Examples of the polymethine compound include compounds described in paragraphs 0044 to 0045 of Japanese Patent Application Laid-Open No. 2009-108267, compounds described in paragraphs 0026 to 0030 of Japanese Patent Application Publication No. 2002-194040, and compounds described in Japanese Patent Application Laid-Open No. 2015. - Compounds described in Japanese Patent Application Publication No. 172004, compounds described in Japanese Patent Application Publication No. 2015-172102, compounds described in Japanese Patent Application Publication No. 2008-088426, compounds described in Paragraph 0090 of International Publication No. 2016/190162, Compounds described in Japanese Patent Application Laid-Open No. 2017-031394, etc. Examples of the crotonium compound include compounds described in Japanese Patent Application Laid-Open No. 2017-082029. Examples of the immonium compound include compounds described in Japanese Patent Application Publication No. 2008-528706, compounds described in Japanese Patent Application Publication No. 2012-012399, compounds described in Japanese Patent Application Publication No. 2007-092060, and International Publications. Compounds described in paragraphs 0048 to 0063 of No. 2018/043564. Examples of the phthalocyanine compound include the compound described in paragraph 0093 of Japanese Patent Application Laid-Open No. 2012-077153, titanyl phthalocyanine described in Japanese Patent Application Laid-Open No. 2006-343631, and 0013 of Japanese Patent Application Laid-Open No. 2013-195480. The compound described in paragraph ～0029, the vanadium phthalocyanine compound described in Japanese Patent No. 6081771, and the compound described in International Publication No. 2020/071470. Examples of the naphthalocyanine compound include compounds described in paragraph 0093 of Japanese Patent Application Laid-Open No. 2012-077153. Examples of the disulfene metal complex include compounds described in Japanese Patent No. 5733804. Examples of metal oxides include indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, tungsten oxide, and the like. For details about tungsten oxide, you can refer to paragraph 0080 of Japanese Patent Application Laid-Open No. 2016-006476, and this content is incorporated into this specification. Examples of metal borides include lanthanum boride and the like. Examples of commercially available lanthanum boride include LaB ₆ -F (manufactured by Japan New Metals Co., Ltd.). In addition, as the metal boride, the compound described in International Publication No. 2017/119394 can also be used. Examples of commercially available products of indium tin oxide include F-ITO (manufactured by DOWA HIGHTECH CO., LTD.).

As another infrared absorber, tungsten oxide represented by the following formula described in paragraph 0025 of European Patent Application No. 3628645 can be used. M ¹ _a M ² _b W _c O _d (P(O) _n R _m ) _e M ¹ and M ² represent ammonium cations or metal cations, a is 0.01 to 0.5, b is 0 to 0.5, c is 1, and d is 2.5 to 3, e is 0.01 to 0.75, n is 1, 2 or 3, m is 1, 2 or 3, and R represents a hydrocarbon group which may have a substituent.

The content of other infrared absorbers is preferably 1 to 100 parts by mass, more preferably 3 to 60 parts by mass, and further preferably 5 to 40 parts by mass relative to 100 parts by mass of the squaraine pigment. Moreover, the total content of the squaraine pigment and other infrared absorbers in the total solid content of the infrared absorbing composition is preferably 1 mass % or more, more preferably 3 mass % or more, and still more preferably 5 mass % or more. The upper limit of the total content is preferably 50 mass% or less, more preferably 40 mass% or less, and still more preferably 30 mass% or less.

＜＜Pigment Derivatives＞＞ The infrared absorbing composition of the present invention may further contain a pigment derivative. Pigment derivatives can be used as dispersing aids. Examples of dye derivatives include compounds having a structure in which an acid group or a base is bonded to a dye skeleton.

Examples of the pigment skeleton constituting the pigment derivative include squarylyanine pigment skeleton, pyrrolopyrrole pigment skeleton, diketopyrrolopyrrole pigment skeleton, quinacridone pigment skeleton, anthraquinone pigment skeleton, bisanthrone pigment skeleton, and benzene pigment skeleton. Isoindole pigment skeleton, thiazine indigo pigment skeleton, azo pigment skeleton, quinoline yellow pigment skeleton, phthalocyanine pigment skeleton, naphthalocyanine pigment skeleton, dithiazine pigment skeleton, perylene pigment skeleton, purpurone pigment skeleton , benzimidazolone pigment skeleton, benzothiazole pigment skeleton, benzimidazole pigment skeleton and benzoethazole pigment skeleton, squaraine pigment skeleton, pyrrolopyrrole pigment skeleton, diketopyrrolopyrrole pigment skeleton, phthalocyanine pigment The skeleton, quinacridone pigment skeleton and benzimidazolone pigment skeleton are preferred, and the squaraine pigment skeleton and pyrrolopyrrole pigment skeleton are even better.

Examples of the acid group include a carboxyl group, a sulfo group, a phosphoric acid group, a boric acid group, a carboxylic acid amide group, a sulfonamide group, a amide acid group, and salts thereof. Examples of atoms or atomic groups constituting the salt include alkali metal ions (Li ⁺ , Na ⁺ , K ^{+ ,} etc.), alkaline earth metal ions (Ca ²⁺ , Mg ^{2+ ,} etc.), ammonium ions, imidazolium ions, and pyridinium ions, phosphonium ions, etc. As the carboxylic acid amide group, a group represented by -NHCOR ^X1 is preferred. As the sulfonamide group, a group represented by -NHSO ₂ R ^X2 is preferred. As the amide acid group, a group represented by -SO ₂ NHSO ₂ R ^X3 , -CONHSO ₂ R ^X4 , -CONHCOR ^X5 or -SO ₂ NHCOR ^X6 is preferred, and -SO ₂ NHSO ₂ ^R R ^X1 to R ^X6 each independently represent an alkyl group or an aryl group. The alkyl group and aryl group represented by R ^X1 to R ^X6 may have a substituent. As the substituent, a halogen atom is preferred, and a fluorine atom is more preferred.

Examples of the base include an amino group, a pyridyl group and a salt thereof, a salt of an ammonium group, and a phthalimide methyl group. Examples of atoms or atomic groups constituting the salt include hydroxide ions, halogen ions, carboxylate ions, sulfonic acid ions, phenoxide ions, and the like.

Specific examples of the pigment derivative include Japanese Patent Application Laid-Open Nos. 56-118462, 63-264674, 01-217077, 03-009961, Japanese Patent Application Publication No. 03-026767, Japanese Patent Application Publication No. 03-153780, Japanese Patent Application Publication No. 03-045662, Japanese Patent Application Publication No. 04-285669, Japanese Patent Application Publication No. 06-145546, Japanese Patent Application Publication No. 06- 212088, Japanese Patent Application Laid-Open No. 06-240158, Japanese Patent Application Laid-Open No. 10-030063, Japanese Patent Application Laid-Open No. 10-195326, paragraphs 0086 to 0098 of International Publication No. 2011/024896, International Publication No. 2012/102399 For the compounds described in paragraphs 0063 to 0094 of the No. No., these contents are incorporated into this specification.

The content of the pigment derivative is preferably 1 to 50 parts by mass based on 100 parts by mass of the pigment. The lower limit value is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, and more preferably 30 parts by mass or less. Only one type of pigment derivative may be used, or two or more types may be used. When two or more types are used, the total amount is preferably within the above range.

＜＜Polymerizable compounds＞＞ The infrared absorbing composition of the present invention can contain a polymerizable compound. As the polymerizable compound, a known compound that can be cross-linked by radicals, acid or heat can be used. The polymerizable compound is preferably a compound having a group containing an ethylenically unsaturated bond, for example. Examples of the group containing an ethylenically unsaturated bond include vinyl, (meth)allyl, (meth)acrylyl, and the like. The polymerizable compound used in the present invention is preferably a radical polymerizable compound.

The polymerizable compound may be in any chemical form such as a monomer, a prepolymer, or an oligomer, but a monomer is preferred. The molecular weight of the polymerizable compound is preferably 100 to 2,500. It is more preferable that the upper limit is 2,000 or less, and it is still more preferable that it is 1,500 or less. It is more preferable that the lower limit is 150 or more, and it is further more preferable that it is 250 or more.

The polymerizable compound is preferably a compound containing three or more groups containing ethylenically unsaturated bonds, more preferably a compound containing 3 to 15 groups containing ethylenically unsaturated bonds, and a compound containing 3 to 6 groups containing ethylene. Compounds having a sexually unsaturated bond group are further preferred. Furthermore, the polymerizable compound is preferably a 3- to 15-functional (meth)acrylate compound, and more preferably a 3- to 6-functional (meth)acrylate compound. Specific examples of the polymerizable compound include paragraphs 0095 to 0108 of Japanese Patent Application Laid-Open No. 2009-288705, paragraph 0227 of Japanese Patent Application Laid-Open No. 2013-029760, and paragraphs 0254 to 0257 of Japanese Patent Application Laid-Open No. 2008-292970. , Paragraphs 0034 to 0038 of Japanese Patent Publication No. 2013-253224, Paragraph 0477 of Japanese Patent Publication No. 2012-208494, Japanese Patent Publication No. 2017-048367, Japanese Patent Publication No. 6057891, and Japanese Patent Publication No. 6031807 The compounds described are incorporated into this specification.

As the polymerizable compound, dipenterythritol triacrylate (commercially available product, KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipenterythritol tetraacrylate (commercially available product, KAYARAD D -320; manufactured by Nippon Kayaku Co., Ltd.), dipenterythritol penta(meth)acrylate (commercially available, KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipenterythritol Alcohol hexa(meth)acrylate (commercially available, KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., NK ESTER A-DPH-12E; manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.) and these (A Compounds having a structure in which the acrylyl group is bonded via ethylene glycol and/or propylene glycol residues (for example, SR454 and SR499 commercially available from SARTOMER Company, Inc.) are preferred. In addition, as the polymerizable compound, diglycerin EO (ethylene oxide) modified (meth)acrylate (commercially available product, M-460; manufactured by TOAGOSEI CO., LTD.), neopentyl erythritol can also be used. Tetraacrylate (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd., NK ESTER A-TMMT), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 ( Nippon Kayaku Co., Ltd.), ARONIX TO-2349 (TOAGOSEI CO., LTD.), NK Oligo UA-7200 (SHIN-NAKAMURA CHEMICAL Co., Ltd.), DPHA-40H (Nippon Kayaku Co.) , Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINC-202UA (KYOEISHA CHEMICAL Co., LTD.), 8UH-1006, 8UH- 1012 (the above are manufactured by Taisei Fine Chemical Co., Ltd.), LIGHT ACRYLATE POB-A0 (manufactured by KYOEISHA CHEMICAL Co., Ltd.), etc.

As the polymerizable compound, trimethylolpropane tri(meth)acrylate, trimethylolpropane ethylene oxide-modified tri(meth)acrylate, and trimethylolpropane ethylene oxide-modified can also be used. Trifunctional (meth)acrylate compounds such as tri(meth)acrylate, ethylene oxide isocyanurate modified tri(meth)acrylate, and neopentylerythritol tri(meth)acrylate. Commercially available products of trifunctional (meth)acrylate compounds include ARONIX M-309, M-310, M-321, M-350, M-360, M-313, M-315, M- 306, M-305, M-303, M-452, M-450 (manufactured by TOAGOSEI CO., LTD.), NK ESTER A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A -TMM-3L, A-TMM-3LM-N, A-TMPT, TMPT (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 ( Manufactured by Nippon Kayaku Co., Ltd.), etc.

As the polymerizable compound, a compound having an acid group can also be used. By using a polymerizable compound having an acid group, the polymerizable compound in the unexposed portion can be easily removed during development, and the generation of development residue can be suppressed. Examples of the acid group include a carboxyl group, a sulfo group, a phosphate group, and the like, with a carboxyl group being preferred. Examples of the polymerizable compound having an acid group include succinic acid-modified dipentaerythritol penta(meth)acrylate. Examples of commercially available polymerizable compounds having an acid group include ARONIX M-510, M-520, ARONIX TO-2349 (manufactured by TOAGOSEI CO., LTD.), and the like. As a preferable acid value of the polymerizable compound having an acid group, 0.1 to 40 mgKOH/g is more preferable, and 5 to 30 mgKOH/g is more preferable. If the acid value of the polymerizable compound is 0.1 mgKOH/g or more, the solubility in the developer is good, and if it is 40 mgKOH/g or less, it is advantageous in terms of production or handling.

As the polymerizable compound, a compound having a caprolactone structure can also be used. Examples of commercially available polymeric compounds having a caprolactone structure include KAYARAD DPCA-20, DPCA-30, DPCA-60, and DPCA-120 (manufactured by Nippon Kayaku Co., Ltd.).

As the polymerizable compound, a polymerizable compound having an alkyloxy group can also be used. The polymerizable compound having an alkyleneoxy group is preferably a polymerizable compound having an vinyloxy group and/or a propyleneoxy group, and a polymerizable compound having an vinyloxy group is more preferably a polymerizable compound having 4 to 20 vinyloxy groups. A 3- to 6-functional (meth)acrylate compound is further preferred. Examples of commercially available polymerizable compounds having an alkyleneoxy group include SR-494, a tetrafunctional (meth)acrylate having four vinyloxy groups manufactured by SARTOMER Company, Inc. and manufactured by Nippon Kayaku Co. KAYARAD TPA-330, a 3-functional (meth)acrylate with 3 isobutyleneoxy groups manufactured by , Ltd., etc.

As the compound having an ethylenically unsaturated bond-containing group, a polymerizable compound having a fluorine skeleton can also be used. Examples of commercially available products include OGSOL EA-0200 and EA-0300 ((meth)acrylate monomer having a fluorine skeleton, manufactured by Osaka Gas Chemicals Co., Ltd.).

As the compound having an ethylenically unsaturated bond-containing group, it is also preferred to use a compound that does not substantially contain environmentally controlled substances such as toluene. Commercially available products of such compounds include KAYARAD DPHA LT, KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.), and the like.

The content of the polymerizable compound in the total solid content of the infrared absorbing composition is preferably 0.5 to 30% by mass. The lower limit is preferably 1 mass% or more, more preferably 3 mass% or more, and still more preferably 5 mass% or more. The upper limit is preferably 25 mass% or less, and more preferably 20 mass% or less. The infrared absorbing composition may contain only one type of polymerizable compound, or may contain two or more types. When two or more types of polymerizable compounds are contained, the total amount is preferably within the above range.

＜＜Photopolymerization initiator＞＞ The infrared absorbing composition of the present invention may also contain a photopolymerization initiator. The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, compounds that are photosensitive to light from the ultraviolet region to the visible region are preferred. The photopolymerization initiator is preferably a photoradical polymerization initiator.

Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (for example, compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbisimidazole compounds, oxime compounds, organic Peroxides, sulfur compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. From the viewpoint of exposure sensitivity, photopolymerization initiators include trihalomethyltriazine compounds, benzyldimethyl ketal compounds, α-hydroxyketone compounds, α-aminoketone compounds, acylphosphine compounds, and oxidation compounds. Phosphine compounds, metallocene compounds, oxime compounds, hexaarylbisimidazole compounds, onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene-benzene-iron complexes, halomethane compounds Preferred are ethadiazole compounds and 3-aryl substituted coumarin compounds, and compounds selected from the group consisting of oxime compounds, α-hydroxyketone compounds, α-aminoketone compounds and acylphosphine compounds are more preferred, and oxime compounds are more preferred. For further improvement. Examples of the photopolymerization initiator include compounds described in paragraphs 0065 to 0111 of Japanese Patent Application Publication No. 2014-130173, Japanese Patent Publication No. 6301489, and MATERIAL STAGE 37 to 60p, vol. 19, No. 3 , the peroxide-based photopolymerization initiator described in 2019, the photopolymerization initiator described in International Publication No. 2018/221177, the photopolymerization initiator described in International Publication No. 2018/110179, Japanese Patent Application Laid-Open The photopolymerization initiator described in Japanese Patent Application Publication No. 2019-043864, the photopolymerization initiator described in Japanese Patent Application Publication No. 2019-044030, the peroxide-based initiator described in Japanese Patent Application Publication No. 2019-167313, Aminoacetophenone-based initiator having an oxazolidinyl group described in Japanese Patent Application Laid-Open No. 2020-055992, oxime-based photopolymerization initiator described in Japanese Patent Application Laid-Open No. 2013-190459, Japanese Patent Application Laid-Open No. 2020 The polymers described in Publication No. -172619, the compounds represented by Formula 1 described in International Publication No. 2020/152120, and the like are incorporated into this specification.

Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, and Omnirad 127 (the above products are manufactured by IGM Resins B.V.), Irgacure 184, Irgacure 1173, Irgacure 2959, and Irgacure 127 (the above products are manufactured by BASF). manufactured by the company), etc. Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, and Omnirad 379EG (the above are manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, and Irgacure 379EG (the above are manufactured by IGM Resins B.V.). Manufactured by BASF Corporation), etc. Examples of commercially available acylphosphine compounds include Omnirad 819, Omnirad TPO (the above products are manufactured by IGM Resins B.V.), Irgacure 819, and Irgacure TPO (the above products are manufactured by BASF), and the like.

Examples of the oxime compound include compounds described in Japanese Patent Application Publication No. 2001-233842, compounds described in Japanese Patent Application Publication No. 2000-080068, compounds described in Japanese Patent Application Publication No. 2006-342166, and J.C.S. Perkin II ( Compounds described in J.C.S. Perkin II (1979, pp. 156-162), Journal of Photopolymer Science and Technology (1995, pp. 202-232) Compounds, compounds described in Japanese Patent Application Publication No. 2000-066385, compounds described in Japanese Patent Application Publication No. 2004-534797, compounds described in Japanese Patent Application Publication No. 2006-342166, Japanese Patent Application Publication No. 2017-019766 Compounds described in, Compounds described in Japanese Patent Publication No. 6065596, Compounds described in International Publication No. 2015/152153, Compounds described in International Publication No. 2017/051680, Compounds described in Japanese Patent Publication No. 2017-198865 compounds, compounds described in paragraphs 0025 to 0038 of International Publication No. 2017/164127, compounds described in International Publication No. 2013/167515, etc. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetyloxyiminobutan-2-one, and 3-propyloxyiminobutan-2-one. Aminobutan-2-one, 2-acetyloxyiminopentan-3-one, 2-acetyloxyiminopentan-1-one, 2-benzylpropan-1-one Oxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1 -Phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyl oxime), etc. . Examples of commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04 (the above are manufactured by BASF), TR-PBG-304, TR-PBG-327 (manufactured by Tronly), and Adeka Optomer N-1919 (ADEKA). Photopolymerization initiator 2) manufactured by CORPORATION and described in Japanese Patent Application Publication No. 2012-014052. In addition, as the oxime compound, it is also preferable to use a non-coloring compound or a compound with high transparency and resistance to discoloration. Examples of commercially available products include ADEKA ARKLS NCI-730, NCI-831, and NCI-930 (the above are manufactured by ADEKA CORPORATION).

As the photopolymerization initiator, an oxime compound having a fluorine ring can also be used. Specific examples of the oxime compound having a fluorine ring include the compounds described in Japanese Patent Application Laid-Open No. 2014-137466, the compounds described in Japanese Patent Publication No. 6636081, and the compounds described in Korean Patent Publication No. 10-2016-0109444. of compounds.

As the photopolymerization initiator, an oxime compound having at least one benzene ring of a carbazole ring serving as the skeleton of a naphthalene ring can also be used. Specific examples of such oxime compounds include compounds described in International Publication No. 2013/083505.

As the photopolymerization initiator, an oxime compound having a fluorine atom can also be used. Specific examples of the oxime compound having a fluorine atom include compounds described in Japanese Patent Application Publication No. 2010-262028, compounds 24, 36 to 40 described in Japanese Patent Application Publication No. 2014-500852, and Japanese Patent Application Publication No. 2013- Compound (C-3) described in Publication No. 164471, etc.

As the photopolymerization initiator, an oxime compound having a nitro group can be used. It is also preferable that the oxime compound having a nitro group is a dimer. Specific examples of the oxime compound having a nitro group include compounds described in paragraphs 0031 to 0047 of Japanese Patent Application Laid-Open No. 2013-114249 and paragraphs 0008 to 0012 and 0070 to 0079 of Japanese Patent Application Laid-Open No. 2014-137466, The compound described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071, ADEKA ARKLS NCI-831 (manufactured by ADEKA CORPORATION).

As the photopolymerization initiator, an oxime compound having a benzofuran skeleton can also be used. Specific examples include OE-01 to OE-75 described in International Publication No. 2015/036910.

As the photopolymerization initiator, an oxime compound in which a substituent having a hydroxyl group is bonded to a carbazole skeleton can also be used. Examples of such photopolymerization initiators include compounds described in International Publication No. 2019/088055.

Specific examples of oxime compounds that can be preferably used in the present invention are shown below, but the present invention is not limited to these.

[Chemical 36] [Chemical 37] [Chemical 38]

The oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, and more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm. In addition, from the viewpoint of sensitivity, the oxime compound preferably has a high Mohr absorption coefficient at a wavelength of 365 nm or a wavelength of 405 nm, more preferably 1,000 to 300,000, further preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar absorption coefficient of a compound can be measured using a known method. For example, it is preferable to measure with a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian) using an ethyl acetate solvent at a concentration of 0.01 g/L.

As the photopolymerization initiator, a bifunctional or trifunctional or higher photoradical polymerization initiator can be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, so good sensitivity can be obtained. In addition, when a compound with an asymmetric structure is used, the crystallinity decreases and the solubility in a solvent or the like increases, making it difficult to precipitate over time, thereby improving the stability of the composition over time. Specific examples of the bifunctional or trifunctional or higher-functional photoradical polymerization initiator include Japanese Patent Application Publication No. 2010-527339, Japanese Patent Application Publication No. 2011-524436, International Publication No. 2015/004565, and Japanese Patent Application Publication No. 2015/004565. The dimer of the oxime compound described in paragraphs 0407 to 0412 of Table 2016-532675, paragraphs 0039 to 0055 of International Publication No. 2017/033680, the compound (E) described in Japanese Patent Publication No. 2013-522445, and Compound (G), Cmpd1 to 7 described in International Publication No. 2016/034963, oxime ester photoinitiator described in paragraph 0007 of Japanese Patent Application Publication No. 2017-523465, Japanese Patent Application Publication No. 2017-167399 The photoinitiator described in paragraphs 0020 to 0033, the photopolymerization initiator (A) described in paragraphs 0017 to 0026 of Japanese Patent Application Laid-Open No. 2017-151342, the oxime ester photoinitiator described in Japanese Patent No. 6469669 starter, etc.

The content of the photopolymerization initiator in the total solid content of the infrared absorbing composition is preferably 0.5 to 30% by mass. The lower limit is preferably 1 mass% or more, more preferably 3 mass% or more, and still more preferably 5 mass% or more. The upper limit is preferably 25 mass% or less, and more preferably 20 mass% or less. The infrared absorbing composition may contain only one type of photopolymerization initiator, or may contain two or more types. When two or more types are contained, the total amount is preferably within the above range.

＜＜Solvent＞＞ The infrared absorbing composition of the present invention preferably contains a solvent. Examples of the solvent include water and organic solvents, with organic solvents being preferred. Examples of the organic solvent include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, hydrocarbon solvents, and the like. For details, please refer to paragraph 0223 of International Publication No. 2015/166779, which is incorporated into this specification. Furthermore, ester solvents in which a cyclic alkyl group is substituted and ketone solvents in which a cyclic alkyl group is substituted can also be suitably used. Specific examples of the organic solvent include polyethylene glycol monomethyl ether, methylene chloride, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, and ethylcelusacetate. , Ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methyl Cyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethylcarbitol acetate, butylcarbitol Bitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropamide, 3-butoxy-N,N-dimethylpropylamine Amide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, γ-butyrolactone, cyclotetrane, anisole, 1,4-diethyloxybutane, di Ethylene glycol monoethyl ether acetate, 1,3-butanediol diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol, etc. However, sometimes it is better to reduce the number of aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) used as organic solvents for environmental reasons (for example, it can be set to 50 mass based on the total amount of organic solvents). ppm (parts per million: parts per million) or less, it can also be set to 10 mass ppm or less, or it can be set to 1 mass ppm or less).

In the present invention, it is preferable to use an organic solvent with a small metal content. It is preferable that the metal content of the organic solvent is, for example, 10 mass ppb (parts per billion: parts per billion) or less. Organic solvents with a quality of ppt (parts per trillion: parts per trillion) level can be used as needed, and such organic solvents are provided by Toyo Gosei Co., Ltd. (Chemical Industry Daily, November 13, 2015).

Examples of methods for removing impurities such as metals from organic solvents include distillation (molecular distillation, thin film distillation, etc.) or filtration using a filter. The filter pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and further preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene or nylon.

Organic solvents can contain isomers (compounds with the same number of atoms but different structures). In addition, only one type of isomer may be contained, or a plurality of types of isomers may be contained.

It is preferable that the content rate of peroxide in the organic solvent is 0.8 mmol/L or less, and it is more preferable that it contains substantially no peroxide.

The content of the solvent in the infrared absorbing composition is preferably 10 to 97% by mass. The lower limit is preferably 30 mass % or more, more preferably 40 mass % or more, 50 mass % or more is still more preferably, 60 mass % or more is still more preferably, and 70 mass % or more is particularly preferred. The upper limit is preferably 96 mass% or less, and more preferably 95 mass% or less. The infrared absorbing composition may contain only one type of solvent, or may contain two or more types of solvents. When two or more types are contained, the total amount is preferably within the above range.

＜＜Color colorant＞＞ The infrared absorbing composition of the present invention can contain a colorant. In the present invention, color colorants refer to colorants other than white colorants and black colorants. It is preferable that the colorant has absorption in a wavelength range of 400 nm or more and less than 650 nm.

Examples of color colorants include red colorants, green colorants, blue colorants, yellow colorants, purple colorants, and orange colorants. The colorant can be a pigment or a dye. Pigments and dyes can be used together. Moreover, the pigment may be either an inorganic pigment or an organic pigment. In addition, the pigment may be a material in which a part of an inorganic pigment or an organic-inorganic pigment is replaced with an organic chromophore. By replacing inorganic pigments or organic-inorganic pigments with organic chromophores, hue design can be easily performed.

The average sub-particle size of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, and more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and still more preferably 100 nm or less. As long as the average sub-particle diameter of the pigment is within the above range, the dispersion stability of the pigment in the infrared absorbing composition will be good. In addition, in the present invention, the primary particle diameter of the pigment can be determined from the obtained image photograph by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is determined, and the equivalent circle diameter corresponding thereto is calculated as the primary particle size of the pigment. In addition, the average secondary particle diameter in the present invention is the arithmetic average of the primary particle diameters of 400 primary particles of the pigment. In addition, the primary particles of the pigment refer to independent particles that are not agglomerated.

The colorant preferably contains a pigment. The content of the pigment in the colorant is preferably 50 mass% or more, more preferably 70 mass% or more, further preferably 80 mass% or more, and particularly preferably 90 mass% or more. Examples of pigments include those shown below.

Colorimetric Index (C.I.) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232 (methine series), 233 (quinoline series), 234 (amino ketone series), 235 (amino ketone series), 236 (amino ketone series), etc. (the above are yellow pigments), C.I. Pigment Orange 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73 etc. (the above is orange pigment), C.I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4 , 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3 ,83,88,90,105,112,119,122,123,144,146,149,150,155,166,168,169,170,171,172,175,176,177,178,179,184 ,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,269,270,272,279,291 , 294 (Kouyamaguchi galaxy, Organo Ultramarine (organic ultramarine), Bluish Red (blue-red)), 295 (monoazo series), 296 (diazo series), 297 (aminoketone), etc. (the above are red pigments ), C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine series), 65 (phthalocyanine series), 66 (phthalocyanine series), etc. (the above are green pigments), C.I. Pigment Purple 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane series), 61 (Kouyamaguchi Galaxy), etc. (the above are purple pigments), C.I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo series), 88 (methine series), etc. (the above are blue pigments).

In addition, as the green pigment, it is also possible to use a halide zinc phthalocyanine pigment having an average number of halogen atoms in one molecule of 10 to 14, an average number of bromine atoms in one molecule of 8 to 12, and an average number of chlorine atoms in one molecule of 2 to 5. Specific examples include compounds described in International Publication No. 2015/118720. In addition, as the green pigment, the compound described in Chinese Patent Application No. 106909027, the phthalocyanine compound having a phosphate ester as a ligand described in International Publication No. 2012/102395, and Japanese Patent Application Laid-Open No. 2019-008014 can also be used. Phthalocyanine compounds described in the publication, phthalocyanine compounds described in Japanese Patent Application Publication No. 2018-180023, compounds described in Japanese Patent Application Publication No. 2019-038958, core-shell type described in Japanese Patent Application Publication No. 2020-076995 Pigments, etc.

Furthermore, as the blue pigment, an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples include compounds described in paragraphs 0022 to 0030 of Japanese Patent Application Laid-Open No. 2012-247591 and paragraph 0047 of Japanese Patent Application Laid-Open No. 2011-157478.

In addition, as the yellow pigment, compounds described in Japanese Patent Application Laid-Open No. 2017-201003, compounds described in Japanese Patent Application Laid-Open No. 2017-197719, and compounds 0011 to 0062 and 0137 to Japanese Patent Application Laid-Open No. 2017-171912 can also be used. Compounds described in paragraph 0276, compounds described in paragraphs 0010 to 0062 and 0138 to 0295 of Japanese Patent Application Laid-Open No. 2017-171913, compounds described in paragraphs 0011 to 0062 and 0139 to 0190 of Japanese Patent Application Publication No. 2017-171914 , the compounds described in paragraphs 0010 to 0065 and 0142 to 0222 of Japanese Patent Application Laid-Open No. 2017-171915, the quinoline yellow compounds described in paragraphs 0011 to 0034 of Japanese Patent Application Publication No. 2013-054339, and the compounds described in Japanese Patent Application Laid-Open No. 2014-026228 Quinoline compounds described in paragraphs 0013 to 0058 of Japanese Patent Application Publication No., isoindoline compounds described in Japanese Patent Application Laid-Open No. 2018-062644, quinoline yellow compounds described in Japanese Patent Application Publication No. 2018-203798, Japanese Patent Application Publication No. 2018-203798 Quinophthalone compounds described in Japanese Patent Application Publication No. 2018-062578, quinophthaline compounds described in Japanese Patent Application Publication No. 6432076, quinophthaline compounds described in Japanese Patent Application Publication No. 2018-155881, Japanese Patent Application Publication No. 2018-111757 Quinophthalone compound described in Japanese Patent Application Laid-Open No. 2018-040835, Quinophthalone compound described in Japanese Patent Application Laid-Open No. 2017-197640, Japanese Patent Application Laid-Open No. 2016-145282 Quinophthalone compound described in Japanese Patent Application Laid-Open No. 2014-085565, Quinophthalone compound described in Japanese Patent Application Laid-Open No. 2014-021139, Japanese Patent Application Laid-Open No. 2013-209614 The quinophthalone compound described in Japanese Patent Application Laid-Open No. 2013-209435, the quinophthalate compound described in Japanese Patent Application Laid-Open No. 2013-181015, and the quinoline yellow compound described in Japanese Patent Application Laid-Open No. 2013-061622 Quinophthal compounds, quinophthal compounds described in Japanese Patent Application Laid-Open No. 2013-032486, quinophthal compounds described in Japanese Patent Application Laid-Open No. 2012-226110, quinophthal compounds described in Japanese Patent Application Laid-Open No. 2008-074987 Compounds, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2008-081565, quinophthaline compounds described in Japanese Patent Application Laid-Open No. 2008-074986, quinophthaline compounds described in Japanese Patent Application Laid-Open No. 2008-074985, Quinophthalone compounds described in Japanese Patent Publication No. 2008-050420, quinophthaline compounds described in Japanese Patent Publication No. 2008-031281, quinophthaline compounds described in Japanese Patent Publication No. 48-032765, Japanese Patent Publication No. 48-032765 Quinophthalone compounds described in Japanese Patent Publication No. 2019-008014, quinophthalone compounds described in Japanese Patent Publication No. 6607427, compounds described in Korean Patent Publication No. 10-2014-0034963, Japanese Patent Publication No. 2017-095706 Compounds described in Japanese Patent Application Publication No. 201920495, Compounds described in Japanese Patent Application Publication No. 6607427, Compounds described in Japanese Patent Application Publication No. 2020-033525, Japanese Patent Application Publication No. 2020-033524 Compounds described in Japanese Patent Application Publication No. 2020-033523, Compounds described in Japanese Patent Application Publication No. 2020-033522, Compounds described in Japanese Patent Application Publication No. 2020-033521, International Publication No. 2020 Compounds described in /045200, compounds described in International Publication No. 2020/045199, and compounds described in International Publication No. 2020/045197. In addition, from the viewpoint of improving the color value, those in which these compounds are polymerized can also be preferably used.

As the red pigment, diketopyrrolopyrrole compounds described in Japanese Patent Application Laid-Open No. 2017-201384 in which at least one bromine atom is substituted in the structure and diketopyrrolopyrrole compounds described in paragraphs 0016 to 0022 of Japanese Patent No. 6248838 can also be used. Pyrrolopyrrole compound, diketopyrrolopyrrole compound described in International Publication No. 2012/102399, diketopyrrolopyrrole compound described in International Publication No. 2012/117965, naphthalene described in Japanese Patent Application Laid-Open No. 2012-229344 Phenolic azo compound, red pigment described in Japanese Patent No. 6516119, red pigment described in Japanese Patent No. 6525101, brominated diketopyrrolopyrrole described in paragraph 0229 of Japanese Patent Application Laid-Open No. 2020-090632 Compounds, anthraquinone compounds described in Korean Patent Publication No. 10-2019-0140741, anthraquinone compounds described in Korean Patent Publication No. 10-2019-0140744, perylene compounds described in Japanese Patent Application Laid-Open No. 2020-079396 Compounds etc. Furthermore, as the red pigment, a compound having a structure in which an aromatic ring group in which a group bonded with an oxygen atom, a sulfur atom or a nitrogen atom is introduced into an aromatic ring is bonded to a diketopyrrolopyrrole skeleton can also be used.

Regarding the optimal diffraction angles of various pigments, please refer to the records of Japanese Patent No. 6561862, Japanese Patent No. 6413872, Japanese Patent No. 6281345, and Japanese Patent Application Laid-Open No. 2020-026503. The contents are incorporated into this document. in the manual. In addition, as the pyrrolopyrrole-based pigment, those having a crystallite size of 140 Å or less in the direction of the plane corresponding to the maximum peak in the X-ray diffraction pattern among the eight planes of the lattice plane (±1±1±1) may also be used. Better. In addition, the physical properties of the pyrrolopyrrole-based pigment are preferably as described in paragraphs 0028 to 0073 of Japanese Patent Application Laid-Open No. 2020-097744.

In the present invention, dyes can also be used as the coloring agent. The dye is not particularly limited, and known dyes can be used. Examples include pyrazole azo dyes, anilinoazo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxocyanine dyes, and pyrazole dyes. Triazole azo dyes, pyridone azo dyes, cyanine dyes, thiazide dyes, pyrrolopyrazole azomethine dyes, Kouyamaguchi galaxy dyes, phthalocyanine dyes, benzo Piran dyes, indigo dyes, pyrromethene dyes, etc. Furthermore, the thiazole compound described in Japanese Patent Application Publication No. 2012-158649, the azo compound described in Japanese Patent Application Publication No. 2011-184493, and the compound described in Japanese Patent Application Publication No. 2011-145540 can also be preferably used as the dye. Nitrogen compounds.

The content of the colorant in the total solid content of the infrared absorbing composition is preferably 1 to 50% by mass. When the infrared absorbing composition of the present invention contains two or more colorants, the total amount is preferably within the above range.

＜＜Color material that transmits infrared rays and blocks visible light＞＞ The infrared absorbing composition of the present invention may also contain a color material that transmits infrared rays and blocks visible light (hereinafter, also referred to as a color material that blocks visible light). An infrared absorbing composition containing a color material that blocks visible light is preferably used as a composition for forming an infrared transmission filter.

The color material that blocks visible light is preferably a color material that absorbs light in the wavelength range from purple to red. Furthermore, the color material that blocks visible light is preferably a color material that blocks light in a wavelength range of 450 to 650 nm. In addition, the color material that blocks visible light is preferably a color material that transmits light with a wavelength of 900 to 1500 nm. It is preferable that the color material that blocks visible light meets at least one of the following requirements (A) and (B). (A): Contains two or more types of coloring agents, and a combination of two or more types of coloring agents forms black. (B): Contains organic black colorant.

Examples of the coloring agent include those mentioned above. Examples of the organic black colorant include dibenzofuranone compounds, azomethine compounds, perylene compounds, azo compounds, and the like, with dibenzofuranone compounds and perylene compounds being preferred. Examples of the dibenzofuranone compound include compounds described in Japanese Patent Application Publication No. 2010-534726, Japanese Patent Application Publication No. 2012-515233, Japanese Patent Application Publication No. 2012-515234, and the like. For example, it can be manufactured by BASF Co., Ltd. "Irgaphor Black" obtained. Examples of the perylene compound include the compounds described in paragraphs 0016 to 0020 of Japanese Patent Application Laid-Open No. 2017-226821, C.I. Pigment Black 31, 32, and the like. Examples of the azomethine compound include compounds described in Japanese Patent Application Laid-Open No. 01-170601, Japanese Patent Application Laid-Open No. 02-034664, etc., and can be manufactured by Dainichiseika Color & Chemicals Mfg. Co., Ltd., for example. "CHROMO FINE BLACK A1103" was obtained.

Examples of the combination of color colorants used to form black by a combination of two or more color colorants include the following (1) to (8). (1) Contains yellow colorant, blue colorant, purple colorant and red colorant. (2) Contains yellow colorant, blue colorant and red colorant. (3) Contains yellow colorant, purple colorant and red colorant. (4) Contains yellow coloring agent and purple coloring agent. (5) Containing green colorant, blue colorant, purple colorant and red colorant. (6) Contains purple coloring agent and orange coloring agent. (7) Contains green colorant, purple colorant and red colorant. (8) Contains green colorant and red colorant.

The content of the visible light-shielding color material in the total solid content of the infrared absorbing composition is preferably 1 to 50% by mass. It is preferable that the lower limit is 5 mass % or more, more preferably 10 mass % or more, 20 mass % or more is still more preferred, and 30 mass % or more is particularly preferred.

＜＜Surfactant＞＞ The infrared absorbing composition of the present invention can contain a surfactant. As the surfactant, various surfactants such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and polysiloxane surfactants can be used. The surfactant is preferably a polysiloxane-based surfactant or a fluorine-based surfactant. Regarding surfactants, please refer to the surfactants described in paragraphs 0238 to 0245 of International Publication No. 2015/166779, and this content is incorporated into this specification.

Examples of the fluorine-based surfactant include surfactants described in paragraphs 0060 to 0064 of Japanese Patent Application Laid-Open No. 2014-041318 (corresponding to paragraphs 0060 to 0064 of International Publication No. 2014/017669), Japanese Patent Application Laid-Open No. 2014/017669, etc. The surfactants described in paragraphs 0117 to 0132 of Publication No. 2011-132503 and the surfactants described in Japanese Patent Application Laid-Open No. 2020-008634 are incorporated into this specification. Examples of commercially available fluorine-based surfactants include MEGAFACE F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F -144, F-437, F-475, F-477, F-479, F-482, F-554, F-555-A, F-556, F-557, F-558, F-559, F -560, F-561, F-565, F-563, F-568, F-575, F-780, EXP, MFS-330, R-01, R-40, R-40-LM, R-41 , R-41-LM, RS-43, R-43, TF-1956, RS-90, R-94, RS-72-K, DS-21 (the above are manufactured by DIC Corporation), FLUORAD FC430, FC431, FC171 (The above are manufactured by Sumitomo 3M Limited), SURFLON S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 ( The above are manufactured by AGC INC.), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (the above are manufactured by OMNOVA SOLUTIONS INC.), Futurgent 208G, 215M, 245F, 601AD, 601ADH2, 602A, 610FM, 710FL, 710FM, 710FS, FTX -218 (the above are manufactured by NEOS COMPANY LIMITED), etc.

It is also preferable to use an acrylic compound as the fluorine-based surfactant. The acrylic compound has a molecular structure including a functional group containing a fluorine atom, and when heated, the part of the functional group containing the fluorine atom is cut off and the fluorine atom is volatilized. . Examples of such fluorine-based surfactants include the MEGAFACE DS series manufactured by DIC Corporation (Chemical Industry Daily (February 22, 2016), Nikkei Sangyo Shimbun (February 23, 2016)). Examples include MEGAFACE DS-21.

It is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound as the fluorine-based surfactant. Examples of such fluorine-based surfactants include the fluorine-based surfactants described in Japanese Patent Application Laid-Open No. 2016-216602, the content of which is incorporated into this specification.

Block polymers can also be used as fluorine-based surfactants. As the fluorine-based surfactant, a fluorine-containing polymer compound can preferably be used. The fluorine-containing polymer compound contains: a repeating unit derived from a (meth)acrylate compound having a fluorine atom; and a fluorine-containing polymer compound derived from a (meth)acrylate compound having 2 or more ( The repeating unit of a (meth)acrylate compound is preferably an alkyleneoxy group (preferably 5 or more) (preferably an vinyloxy group or a propyleneoxy group). In addition, the fluorine-containing surfactant described in paragraphs 0016 to 0037 of Japanese Patent Application Laid-Open No. 2010-032698 and the following compounds are also exemplified as the fluorine-based surfactant used in the present invention. [Chemical 39] The weight average molecular weight of the above compound is preferably 3,000 to 50,000, for example, 14,000. In the above compounds, the percentage expressed as the proportion of repeating units is molar %.

Furthermore, a fluorine-containing polymer having a group containing an ethylenically unsaturated bond in a side chain can also be used as the fluorine-based surfactant. Specific examples include compounds described in paragraphs 0050 to 0090 and paragraphs 0289 to 0295 of Japanese Patent Application Laid-Open No. 2010-164965, MEGAFACE RS-101, RS-102, RS-718K, and RS-72 manufactured by DIC Corporation. -K et al. In addition, the compounds described in paragraphs 0015 to 0158 of Japanese Patent Application Laid-Open No. 2015-117327 can also be used as the fluorine-based surfactant.

Furthermore, from the viewpoint of environmental control, it is also preferable to use the surfactant described in International Publication No. 2020/084854 as a substitute for the surfactant having a perfluoroalkyl group with a carbon number of 6 or more.

Furthermore, it is also preferable to use a fluorine-containing imine salt compound represented by formula (fi-1) as a surfactant. [Chemical 40] In formula (fi-1), m represents 1 or 2, n represents an integer from 1 to 4, a represents 1 or 2, X ^a+ represents a-valent metal ion, primary ammonium ion, secondary ammonium ion, tertiary ammonium ion, Quaternary ammonium ion or NH ₄ ⁺ .

Examples of nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane, and their ethoxylates and propoxylates (for example, glycerolpropane Oxylate, glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonyl Phenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitol fatty acid ester, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (manufactured by BASF), Tetronic 304, 701, 704, 901, 904, 150R1 (manufactured by BASF Corporation), SOLSPERSE 20000 (manufactured by Japan Lubrizol Corporation), NCW-101, NCW-1001, NCW-1002 (manufactured by FUJIFILM Wako Pure Chemical Corporation), PIONIN D- 6112, D-6112-W, D-6315 (manufactured by Takemoto Oil & Fat Co., Ltd.), OLFIN E1010, Surfynol 104, 400, 440 (manufactured by Nissin Chemical Industry Co., Ltd.), etc.

Examples of polysilicone-based surfactants include DOWSIL SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, SF 8419 OIL (the above are manufactured by Dow Corning Toray Co., Ltd.), TSF- 4300, TSF-4445, TSF-4460, TSF-4452 (the above are manufactured by Momentive Performance Materials Inc.), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (the above are manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-3760, BYK-UV3510 (the above are manufactured by BYK-Chemie GmbH), etc.

Moreover, the compound of the following structure can also be used as a polysiloxane surfactant. [Chemical 41]

The content of the surfactant in the total solid content of the infrared absorbing composition is preferably 0.001 to 1% by mass, more preferably 0.001 to 0.5% by mass, and further preferably 0.001 to 0.2% by mass. The infrared absorbing composition may contain only one type of surfactant, or may contain two or more types. When two or more types are contained, the total amount is preferably within the above range.

＜＜Polymerization inhibitor＞＞ The infrared absorbing composition of the present invention can contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tertiary butyl-p-cresol, gallic acid, tertiary butylcatechol, benzoquinone, and 4,4'-thio Bis(3-methyl-6-tertiary butylphenol), 2,2'-methylenebis(4-methyl-6-tertiary butylphenol), N-nitrosophenylhydroxylamine salt ( ammonium salt, first cerium salt, etc.), p-methoxyphenol is preferred. The content of the polymerization inhibitor in the total solid content of the infrared absorbing composition is preferably 0.0001 to 5% by mass. The infrared absorbing composition may contain only one type of polymerization inhibitor, or may contain two or more types. When two or more types are contained, the total amount is preferably within the above range.

＜＜Silane Coupling Agent＞＞ The infrared absorbing composition of the present invention can contain a silane coupling agent. In this specification, a silane coupling agent refers to a silane compound having a hydrolyzable group and functional groups other than the hydrolyzable group. In addition, the hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and can generate a siloxane bond through at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, a hydroxyl group, and the like, with an alkoxy group being preferred. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. Examples of functional groups other than hydrolyzable groups include vinyl groups, styrene groups, (meth)acrylyl groups, mercapto groups, epoxy groups, oxetanyl groups, amino groups, and urea groups. Thioether group, isocyanate group, phenyl group, etc., (meth)acrylyl group and epoxy group are preferred. Examples of the silane coupling agent include compounds described in paragraphs 0018 to 0036 of Japanese Patent Application Laid-Open No. 2009-288703, and compounds described in paragraphs 0056 to 0066 of Japanese Patent Application Laid-Open No. 2009-242604, and these contents are incorporated into this specification. . The content of the silane coupling agent in the total solid content of the infrared absorbing composition is preferably 0.01 to 15.0 mass%, and more preferably 0.05 to 10.0 mass%. The infrared absorbing composition may contain only one type of silane coupling agent, or may contain two or more types. When two or more types are contained, the total amount is preferably within the above range.

＜＜UV absorber＞＞ The infrared absorbing composition of the present invention can contain an ultraviolet absorber. Examples of ultraviolet absorbers include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, and indoles. Indole compounds, triazine compounds, benzyl compounds, etc. Specific examples of such compounds include paragraphs 0038 to 0052 of Japanese Patent Application Laid-Open No. 2009-217221, paragraphs 0052 to 0072 of Japanese Patent Application Laid-Open No. 2012-208374, and paragraphs 0317 to 0317 of Japanese Patent Application Laid-Open No. 2013-068814. Paragraph 0334 and compounds described in Paragraphs 0061 to 0080 of Japanese Patent Application Laid-Open No. 2016-162946, these contents are incorporated into this specification. Commercially available ultraviolet absorbers include Tinuvin series and Uvinul series manufactured by BASF. Examples of benzotriazole compounds include the MYUA series manufactured by MIYOSHI OIL & FAT CO., LTD. (Chemical Industry Daily, February 1, 2016). In addition, compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967 and paragraphs 0059 to 0076 of International Publication No. 2016/181987 can also be used as the ultraviolet absorber. The content of the ultraviolet absorber in the total solid content of the infrared absorbing composition is preferably 0.01 to 30 mass%, and more preferably 0.05 to 25 mass%. The infrared absorbing composition may contain only one type of ultraviolet absorber, or may contain two or more types. When two or more types are contained, the total amount is preferably within the above range.

＜＜Compounds with cyclic ether groups＞＞ The infrared absorbing composition of the present invention can contain a compound having a cyclic ether group. Examples of the cyclic ether group include an epoxy group, an oxetanyl group, and the like.

The compound having a cyclic ether group may be a low molecular compound (for example, the molecular weight is less than 2000, and the molecular weight is less than 1000), or it may be a macromolecule compound (for example, the molecular weight is 1000 or more, and it is a polymer) below, the weight average molecular weight is above 1000). The weight average molecular weight of the epoxy compound is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and still more preferably 3,000 or less.

The compound having a cyclic ether group is preferably a compound having an epoxy group (hereinafter also referred to as an epoxy compound). As the epoxy compound, Paragraphs 0034 to 0036 of Japanese Patent Application Laid-Open No. 2013-011869, Paragraphs 0147 to 0156 of Japanese Patent Application Laid-Open No. 2014-043556, and Paragraphs 0085 to 0092 of Japanese Patent Application Laid-Open No. 2014-089408 can also be used. The compounds described are compounds described in Japanese Patent Application Laid-Open No. 2017-179172.

As the epoxy compound, epoxy resin can be preferably used. Examples of the epoxy resin include epoxy resins that are glycidyl etherates of phenol compounds, epoxy resins that are glycidyl etherates of various novolak resins, alicyclic epoxy resins, aliphatic Epoxy resin, heterocyclic epoxy resin, glycidyl ester epoxy resin, glycidylamine epoxy resin, epoxy resin obtained by glycidylizing halogenated phenols, and has an epoxy group Condensates of silicon compounds and other silicon compounds, copolymers of polymerizable unsaturated compounds with epoxy groups and other polymerizable unsaturated compounds, etc. The epoxy equivalent of the epoxy resin is preferably 310 to 3300 g/eq, more preferably 310 to 1700 g/eq, and further preferably 310 to 1000 g/eq.

Examples of commercially available compounds having a cyclic ether group include EHPE3150 (manufactured by Daicel Corporation), EPICLON N-695 (manufactured by DIC Corporation), Marproof G-0150M, G-0105SA, G-0130SP, and G-0250SP. , G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (the above, manufactured by NOF CORPORATION., polymers containing epoxy groups), etc.

The content of the compound having a cyclic ether group in the total solid content of the infrared absorbing composition is preferably 0.1 to 20% by mass. The lower limit is, for example, preferably 0.5% by mass or more, more preferably 1% by mass or more. The upper limit is, for example, preferably 15% by mass or less, and further preferably 10% by mass or less. The infrared absorbing composition may contain only one type of compound having a cyclic ether group, or may contain two or more types. When two or more types are contained, the total amount is preferably within the above range.

＜＜Hardening agent＞＞ When the infrared absorbing composition of the present invention contains a compound having a cyclic ether group, it is preferred that the infrared absorbing composition of the present invention further contains a hardener. Examples of the curing agent include amine compounds, acid anhydride compounds, amide compounds, phenol compounds, polycarboxylic acids, thiol compounds, and the like. Specific examples of the hardener include succinic acid, trimellitic acid, pyromelonic acid, N,N-dimethyl-4-aminopyridine, and neopentylerythritol tetrakis(3-mercaptopropionate) wait. As the curing agent, the compounds described in paragraphs 0072 to 0078 of Japanese Patent Application Laid-Open No. 2016-075720 and the compounds described in Japanese Patent Application Laid-Open No. 2017-036379 can also be used.

The content of the hardener is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and further preferably 0.1 to 6.0 parts by mass relative to 100 parts by mass of the compound having a cyclic ether group.

＜＜Antioxidants＞＞ The infrared absorbing composition of the present invention can contain an antioxidant. Examples of antioxidants include phenol compounds, phosphite compounds, thioether compounds, and the like. As the phenolic compound, any phenolic compound known as a phenolic antioxidant can be used. Preferable phenol compounds include hindered phenol compounds. Compounds having a substituent at the position adjacent to the phenolic hydroxyl group (ortho position) are preferred. As the substituent, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferred. Moreover, it is also preferable that the antioxidant is a compound having a phenol group and a phosphite group in the same molecule. Moreover, as an antioxidant, a phosphorus-type antioxidant can also be suitably used. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2] Dioxaphosphineheterocycloheptadien-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tertiary butyldibenzo[d,f] [1,3,2]dioxaphosphineheterocycloheptadien-2-yl)oxy]ethyl]amine, ethyl bis(2,4-di-tertiary butyl-6-methyl phosphite) phenyl) etc. Examples of commercially available antioxidants include ADEKA STAB AO-20, ADEKA STAB AO-30, ADEKA STAB AO-40, ADEKA STAB AO-50, ADEKA STAB AO-50F, ADEKA STAB AO-60, and ADEKA STAB AO-60G, ADEKA STAB AO-80, ADEKA STAB AO-330 (the above are manufactured by ADEKA CORPORATION), etc. In addition, the compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, the compounds described in International Publication No. 2017/006600, and the compounds described in International Publication No. 2017/164024 can also be used as antioxidants. The antioxidant content in the total solid content of the infrared absorbing composition is preferably 0.01 to 20% by mass, and more preferably 0.3 to 15% by mass. The infrared absorbing composition may contain only one type of antioxidant, or may contain two or more types. When two or more types are contained, the total amount is preferably within the above range.

＜＜Other ingredients＞＞ The infrared absorbing composition of the present invention may optionally contain sensitizers, hardening accelerators, fillers, thermal hardening accelerators, plasticizers and other auxiliaries (for example, conductive particles, defoaming agents, flame retardants, leveling agents, etc.) agents, peeling accelerators, fragrances, surface tension regulators, chain transfer agents, etc.). By appropriately containing these components, film physical properties and other properties can be adjusted. Regarding these components, for example, the descriptions of paragraphs 0183 and onwards of Japanese Patent Application Laid-Open No. 2012-003225 (corresponding to paragraph 0237 of the specification of U.S. Patent Application Publication No. 2013/0034812), and the descriptions of Japanese Patent Application Laid-Open No. 2008-250074 The descriptions in paragraphs 0101 to 0104, 0107 to 0109, etc. are incorporated into this manual. In addition, the infrared absorbing composition of the present invention may contain a latent antioxidant if necessary. Examples of potential antioxidants include compounds in which a site functioning as an antioxidant is protected by a protective group and the protective group is detached by heating at 100 to 250°C or heating at 80 to 200°C in the presence of an acid/alkali catalyst. and acts as an antioxidant. Examples of potential antioxidants include compounds described in International Publication No. 2014/021023, International Publication No. 2017/030005, and Japanese Patent Application Laid-Open No. 2017-008219. Examples of commercially available latent antioxidants include ADEKA ARKLS GPA-5001 (manufactured by ADEKA CORPORATION).

＜Container＞ There is no particular limitation on the container for storing the infrared absorbing composition of the present invention, and a known container can be used. In addition, as a storage container, in order to prevent impurities from being mixed into raw materials and compositions, it is also preferable to use a multi-layer bottle with an inner wall composed of six types of six-layer resins or a bottle with a seven-layer structure using six types of resins. Examples of such a container include the container described in Japanese Patent Application Laid-Open No. 2015-123351. In addition, the inner wall of the container is preferably made of glass or stainless steel for the purpose of preventing elution of metal from the inner wall of the container, improving the stability of the infrared absorbing composition over time, or suppressing deterioration of components.

＜Preparation method of infrared absorbing composition＞ The infrared absorbing composition of the present invention can be prepared by mixing the aforementioned components. When preparing an infrared-absorbing composition, all the ingredients can be dissolved or dispersed in a solvent at the same time to prepare the infrared-absorbing composition. You can also prepare a solution or dispersion in which 2 or more parts of each ingredient is appropriately mixed in advance, and use it. (during coating), these are mixed to prepare an infrared absorbing composition.

When preparing the infrared absorbing composition, a process of dispersing pigments may be included. In the pigment dispersion process, examples of mechanical forces used to disperse pigments include compression, extrusion, impact, shearing, pitting, and the like. Specific examples of these processes include bead milling, sand milling, roller milling, ball milling, paint stirring, micro-jet flow, high-speed impeller, sand mixing, jet mixing, high-pressure wet micronization, ultrasonic dispersion, and the like. In addition, when grinding the pigment in a sand mill (bead mill), it is preferable to perform the treatment under conditions that improve grinding efficiency by using microbeads with small diameters, increasing the filling rate of microbeads, etc. In addition, after the grinding process, it is preferable to remove coarse particles by filtration, centrifugation, etc. In addition, regarding the process and dispersing machine for dispersing pigments, it is better to use the "Encyclopedia of Dispersion Technology, published by JOHOKIKO CO., LTD., July 15, 2005" or "Centering on Suspension (Solid/Liquid Dispersion System)" "A Comprehensive Data Collection of Dispersion Technology and Industrial Applications, published by the Publishing Department of the Business Development Center, October 10, 1978" and the process and dispersion machine described in paragraph 0022 of Japanese Patent Application Publication No. 2015-157893. In addition, in the process of dispersing pigments, the pigment can be refined through a salt grinding step. For example, the materials, machines, processing conditions, etc. used in the salt grinding step can be found in Japanese Patent Application Laid-Open No. 2015-194521 and Japanese Patent Application Laid-Open No. 2012-046629. Examples of materials for microbeads used for dispersion include zirconium dioxide, agate, quartz, titanium dioxide, tungsten steel, silicon nitride, alumina, stainless steel, and glass. In addition, an inorganic compound having a Mohs hardness of 2 or more can also be used as the microbeads. The composition may contain 1 to 10,000 ppm of the above-mentioned microbeads.

When preparing an infrared absorbing composition, it is preferable to filter the infrared absorbing composition with a filter for the purpose of removing impurities, reducing defects, etc. As a filter, any filter that has been conventionally used for filtration purposes and the like can be used without particular restrictions. Examples include the use of fluororesins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (for example, nylon-6, nylon-6,6), and polyolefin resins (including high-resin resins such as polyethylene and polypropylene (PP)). density, ultra-high molecular weight polyolefin resin) and other materials. Among these materials, polypropylene (including high-density polypropylene) and nylon are preferred.

The pore diameter of the filter is preferably 0.01 to 7.0 μm, more preferably 0.01 to 3.0 μm, and further preferably 0.05 to 0.5 μm. As long as the pore size of the filter is within the above range, fine foreign matter can be removed more reliably. Regarding the pore size of the filter, you can refer to the nominal value of the filter manufacturer. As for the filter, various filters provided by Nihon Pall Ltd. (DFA4201NXEY, DFA4201NAEY, DFA4201J006P, etc.), Advantec Toyo Kaisha, Ltd., Nihon Entegris K.K. (Formerly Nippon Mykrolis Corporation), KITZ MICROFILTER Corporation, etc. can be used.

In addition, it is also preferable to use a fibrous filter material as the filter. Examples of fibrous filter materials include polypropylene fiber, nylon fiber, glass fiber, and the like. Commercially available products include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) manufactured by ROKI TECHNO CO., LTD.

When using filters, you can combine different filters (e.g. 1st filter and 2nd filter, etc.). At this time, filtration using each filter may be performed only once, or may be performed two or more times. Furthermore, filters with different pore sizes can be combined within the above range. Alternatively, only the dispersion may be filtered with the first filter, and the other components may be mixed and then filtered with the second filter.

＜Membrane＞ Next, the film of the present invention will be described. The film of the present invention is a film obtained from the infrared absorbing composition of the present invention described above. The film of the present invention can be preferably used as an optical filter. The use of the optical filter is not particularly limited, and examples include infrared cut filters, infrared transmission filters, and the like. Examples of the infrared cut filter include an infrared cut filter on the light-receiving side of the solid-state imaging element (for example, an infrared cut-off filter used for a wafer-level lens), and an infrared cut-off filter on the back side of the solid-state imaging element (opposite to the light-receiving side). Infrared cut filter for the side), infrared cut filter for ambient light sensor (for example, illumination sensor that senses the illumination and hue of the environment where the information terminal device is located and adjusts the hue of the display, color correction that adjusts the hue using sensors) etc. In particular, it can be suitably used as an infrared cut filter on the light-receiving side of a solid-state imaging element. Examples of the infrared transmission filter include a filter capable of blocking visible light and selectively transmitting infrared rays having a specific wavelength or above.

The thickness of the film of the present invention can be appropriately adjusted depending on the purpose. The thickness of the film is preferably 20 μm or less, more preferably 10 μm or less, and further preferably 5 μm or less. The lower limit of the thickness of the film is preferably 0.1 μm or more, and more preferably 0.2 μm or more.

The films of the present invention can also be used in combination with color filters containing colored colorants. The color filter can be produced using a coloring composition containing a color colorant. When the film of the present invention is used as an infrared cut filter and the film of the present invention is used in combination with a color filter, it is preferable to arrange the color filter on the optical path of the film of the present invention. For example, it is preferable to laminate the film of the present invention and a color filter to use as a laminate. In the laminate, the film and the color filter of the present invention may be adjacent to each other in terms of thickness, or may not be adjacent to each other. When the film of the present invention and the color filter are not adjacent to each other in terms of thickness, the film of the present invention may be formed on a support different from the support on which the color filter is formed, or the film of the present invention may be formed on a different support than the support on which the color filter is formed. Other components constituting the solid-state imaging element (for example, microlenses, planarization layers, etc.) are sandwiched between the components.

The film of the present invention can be used in various devices such as solid-state imaging elements such as CCD (charge coupled device) and CMOS (complementary metal oxide semiconductor), infrared sensors, and image display devices.

＜Pixel Manufacturing Method＞ A method of manufacturing a pixel using the infrared absorbing composition of the present invention will be described. The manufacturing method of the pixel includes: a process of using an infrared absorbing composition to form a composition layer on a support; a process of exposing the composition layer in a pattern; and developing to remove the unexposed portion of the exposed composition layer to form a pattern. (pixel) process is better. The process of baking the composition layer (pre-baking process) and the process of baking the developed patterns (pixels) (post-baking process) can be set according to needs.

The support body is not particularly limited and can be appropriately selected depending on the intended use. Examples include glass substrates, silicon substrates, and the like, and silicon substrates are preferred. In addition, a charge coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, etc. can be formed on the silicon substrate. In addition, sometimes a black matrix is formed on the silicon substrate to isolate each pixel. In addition, a base layer may be provided on the silicon substrate for the purpose of improving adhesion with the upper layer, preventing substance diffusion, or flattening the substrate surface. When measured with diiodomethane, the surface contact angle of the base layer is preferably 20 to 70°. In addition, when measuring with water, 30 to 80° is preferred.

As a method of applying the infrared absorbing composition, a known method can be used. Examples include dropping method (drip casting); slit coating method; spray method; roll coating method; spin coating method (spin coating); cast coating method; slit spin coating method; prewet method ( For example, the method described in Japanese Patent Application Laid-Open No. 2009-145395); inkjet (for example, drop-on-demand method, piezoelectric method, thermal method), nozzle jet printing, flexographic printing, screen printing, gravure printing, Various printing methods such as reverse offset printing and metal mask printing; transfer printing methods using molds, etc.; nanoimprinting methods, etc. There are no particular limitations on the application method of inkjet. For example, "Expansion and Usage of Inkjet - Infinite Possibilities Appeared in Patents -", published in February 2005, Sumitbe Techon Research Co., Ltd. method (especially pages 115 to 133) or Japanese Patent Application Publication No. 2003-262716, Japanese Patent Application Publication No. 2003-185831, Japanese Patent Application Publication No. 2003-261827, Japanese Patent Application Publication No. 2012-126830, Japan The method described in Japanese Patent Application Publication No. 2006-169325, etc.

The composition layer formed by applying the infrared absorbing composition may be dried (prebaked). When prebaking is performed, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and further preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or 80°C or higher. The prebaking time is preferably 10 to 3000 seconds, more preferably 40 to 2500 seconds, and further preferably 80 to 220 seconds. Drying can be performed using a heating plate, an oven, etc.

Next, the composition layer is exposed in a pattern. For example, a stepper exposure machine, a scanning exposure machine, or the like is used to expose the composition layer through a mask having a predetermined mask pattern, whereby the composition layer can be exposed in a pattern. Thereby, the exposed portion can be hardened.

Examples of radiation (light) that can be used during exposure include g-rays, i-rays, and the like. In addition, light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light having a wavelength of 300 nm or less include KrF rays (wavelength: 248 nm), ArF rays (wavelength: 193 nm), and KrF rays (wavelength: 248 nm) are preferred. In addition, a long-wavelength light source of 300 nm or more can also be used.

In addition, during exposure, light may be continuously irradiated for exposure, or pulse irradiation may be performed for exposure (pulse exposure). In addition, pulse exposure refers to an exposure method in which light is irradiated and paused repeatedly to perform exposure in a short period of time (for example, milliseconds or less).

For example, the irradiation amount (exposure amount) is preferably 0.03 to 2.5 J/cm ² , and more preferably 0.05 to 1.0 J/cm ² . The oxygen concentration during exposure can be appropriately selected. In addition to performing the exposure in the atmosphere, for example, the exposure can also be performed in a low-oxygen environment with an oxygen concentration of 19% by volume or less (for example, 15% by volume, 5% by volume, or substantially no oxygen). , it can also be exposed in a high oxygen environment with an oxygen concentration exceeding 21 volume % (for example, 22 volume %, 30 volume % or 50 volume %). In addition, the exposure illuminance can be appropriately set, and can usually be selected from the range of 1000W/m ² to 100000W/m ² (for example, 5000W/m ² , 15000W/m ² or 35000W/m ² ). The conditions of oxygen concentration and exposure illuminance can be appropriately combined. For example, the oxygen concentration can be 10 volume % and the illuminance is 10000 W/m ² , the oxygen concentration can be 35 volume % and the illuminance is 20000 W/m ² , etc.

Next, the composition layer is developed to remove the unexposed portions of the exposed composition layer to form a pattern (pixel). The unexposed portion of the composition layer can be removed by development using a developing solution. Thereby, the unexposed portion of the composition layer is dissolved in the developer, leaving only the photohardened portion. For example, the temperature of the developer is preferably 20 to 30°C. The development time is preferably 20 to 180 seconds. In addition, in order to improve the residue removal performance, the step of shaking off the developer every 60 seconds and supplying new developer may be repeated several times.

Examples of the developer include organic solvents, alkali developers, and the like, and an alkali developer is preferably used. As an alkali developer, an alkaline aqueous solution (alkali developer) obtained by diluting an alkali agent with pure water is preferred. Examples of the alkaline agent include ammonia, ethylamine, diethylamine, dimethylethanolamine, diethylene glycolamine, diethanolamine, hydroxylamine, ethylenediamine, tetramethylammonium hydroxide, and tetraethyl hydroxide. Ammonium, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, bile Alkali, pyrrole, piperidine, 1,8-diazabicyclo[5.4.0]-7-undecene and other organic basic compounds or sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, silicic acid Sodium, sodium metasilicate and other inorganic alkaline compounds. From an environmental and safety perspective, it is better for the alkaline agent to be a compound with a large molecular weight. The concentration of the alkali agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, and more preferably 0.01 to 1% by mass. Moreover, the developer may further contain a surfactant. Examples of the surfactant include the above-mentioned surfactants, and nonionic surfactants are preferred. From the viewpoint of ease of transportation, storage, etc., the developer can be first produced as a concentrated solution and then diluted to a required concentration when used. The dilution ratio is not particularly limited, but can be set in the range of 1.5 to 100 times, for example. In addition, it is also preferable to wash (rinse) with pure water after development. Moreover, it is preferable to perform rinsing as follows: while rotating the support on which the developed composition layer is formed, a rinsing liquid is supplied to the developed composition layer. It is also preferable to move the nozzle that sprays the rinse liquid from the center of the support body to the peripheral edge of the support body. At this time, when moving the nozzle from the center part of the support body to the peripheral part, the nozzle may be moved while gradually reducing the moving speed. By performing flushing in this manner, in-plane unevenness of flushing can be suppressed. In addition, the same effect can also be obtained by gradually reducing the rotation speed of the support body while moving the nozzle from the center part of the support body to the peripheral part.

After development, it is preferable to perform additional exposure processing and heat processing (post-baking) after drying. The additional exposure process and post-baking are hardening processes after development for complete hardening. For example, the heating temperature in post-baking is preferably 100 to 240°C, and more preferably 200 to 240°C. In order to achieve the above conditions, heating mechanisms such as heating plates, convection ovens (hot air circulation dryers), and high-frequency heating machines can be used to post-bake the developed film in a continuous or intermittent manner. When performing additional exposure processing, it is preferable that the light used for exposure is light with a wavelength of 400 nm or less. In addition, the additional exposure process can be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

＜Optical Filter＞ The optical filter of the present invention has the film of the present invention described above. Examples of types of optical filters include infrared cutoff filters, infrared transmission filters, and the like.

The optical filter of the present invention may further include a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, etc., in addition to the film of the present invention. Examples of the ultraviolet absorbing layer include the absorbing layers described in paragraphs 0040 to 0070 and 0119 to 0145 of International Publication No. 2015/099060. Examples of the dielectric multilayer film include those described in paragraphs 0255 to 0259 of Japanese Patent Application Laid-Open No. 2014-041318. As the copper-containing layer, a glass substrate made of copper-containing glass (copper-containing glass substrate) or a layer containing a copper complex (copper complex-containing layer) can also be used. Examples of the copper-containing glass substrate include copper-containing phosphate glass, copper-containing fluorophosphate glass, and the like. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC TECHNO GLASS Co., Ltd.), BG-60, BG-61 (above, manufactured by Schott AG), CD5000 (manufactured by HOYA CORPORATION), and the like.

＜Solid-state imaging device＞ The solid-state imaging element of the present invention includes the film of the present invention described above. The structure of the solid-state imaging element is not particularly limited as long as it has the structure of the film of the present invention and functions as a solid-state imaging element. For example, the following structures are mentioned.

The support body has a transmission electrode made of a plurality of photodiodes, polysilicon, etc., constituting the light-receiving area of the solid-state imaging element, and the photodiode and the transmission electrode have a light-receiving part opening made of only the photodiode, made of tungsten, etc. The shielding film has an element protective film made of silicon nitride or the like formed to cover the entire shielding film and the light-receiving part of the photodiode, and has the structure of the film of the present invention on the element protective film. Furthermore, it is also possible to have a structure in which a light condensing mechanism (for example, a microlens, etc.; the same applies below) is provided on the element protection film and below (near the support side) of the film of the present invention, or a light condensing mechanism is provided on the film of the present invention. The structure of the organization, etc. Furthermore, the color filter may have a structure in which a film forming each pixel is embedded in a space divided by partition walls into a grid shape, for example. At this time, it is preferable that the refractive index of the partition wall is lower than that of each pixel. Examples of imaging devices having such a structure include devices described in Japanese Patent Application Laid-Open No. 2012-227478 and Japanese Patent Application Laid-Open No. 2014-179577.

<Image display device> The image display device of the present invention includes the film of the present invention. Examples of image display devices include liquid crystal display devices, organic electroluminescence (organic EL) display devices, and the like. The definition and details of the image display device are described in, for example, "Electronic Display Device (by Akio Sasaki, published by Kogyo Chosakai Publishing Co., Ltd., 1990)" and "Display Device (by Junaki Ibuki, Sangyo Tosho Publishing)" Co., Ltd., issued in 1989)" etc. Further, the liquid crystal display device is described in, for example, "Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, published by Kogyo Chosakai Publishing Co., Ltd., 1994)". The liquid crystal display device to which the present invention can be applied is not particularly limited. For example, it can be applied to various types of liquid crystal display devices described in the above-mentioned "Next Generation Liquid Crystal Display Technology". The image display device may have a white organic EL element. As a white organic EL element, a series structure is preferred. Regarding the series structure of organic EL elements, it is described in Japanese Patent Application Laid-Open No. 2003-045676, supervised by Mikami Akiyoshi, "The Frontier of Organic EL Technology Development - High Brightness, High Precision, Long Lifetime, and Technology Collection-", TECHNICAL INFORMATION INSTITUTE CO.,LTD., pages 326～328, 2008, etc. The spectrum of the white light emitted by the organic EL element is preferably one with strong maximum luminescence peaks in the blue region (430-485nm), green region (530-580nm) and yellow region (580-620nm). In addition to these luminescence peaks, it is more preferable to have a maximum luminescence peak in the red region (650 to 700 nm).

＜Infrared sensor＞ The infrared sensor of the present invention includes the film of the present invention described above. The structure of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. Hereinafter, an embodiment of the infrared sensor of the present invention will be described with reference to the drawings.

In FIG. 1 , reference numeral 110 denotes a solid-state imaging element. An infrared cut filter 111 and an infrared transmitting filter 114 are arranged in the imaging area of the solid-state imaging element 110 . Furthermore, a color filter 112 is arranged on the infrared cut filter 111 . Microlenses 115 are arranged on the incident light hν side of the color filter 112 and the infrared transmission filter 114 . A planarization layer 116 is formed to cover the microlens 115 .

The infrared cut filter 111 can be formed using the infrared absorbing composition of the present invention. The color filter 112 is a color filter formed with pixels that transmit and absorb light of a specific wavelength in the visible range, and is not particularly limited, and conventionally known color filters for forming pixels can be used. For example, a color filter in which red (R), green (G), and blue (B) pixels are formed may be used. For example, the description in paragraphs 0214 to 0263 of Japanese Patent Application Laid-Open No. 2014-043556 can be referred to, and this content is incorporated into this specification. The characteristics of the infrared transmission filter 114 can be selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the infrared absorbing composition of the present invention.

In the infrared sensor shown in FIG. 1 , an infrared cutoff filter (other infrared cutoff filter) different from the infrared cutoff filter 111 may be further disposed on the planarization layer 116 . Examples of other infrared cut filters include those having a copper-containing layer and/or a dielectric multilayer film. Details of these include those mentioned above. In addition, as another infrared cut filter, a double bandpass filter can be used.

＜Camera Module＞ The camera module of the present invention includes a solid-state imaging element and the film of the present invention. The camera module preferably further has a lens and a circuit for processing images obtained from the solid-state imaging element. The solid-state imaging device used in the camera module may be the above-mentioned solid-state imaging device of the present disclosure or a known solid-state imaging device. In addition, known ones can be used as the lens used in the camera module and the circuit for processing the image obtained from the solid-state imaging device. As examples of camera modules, refer to the camera modules described in Japanese Patent Application Laid-Open No. 2016-006476 and Japanese Patent Application Laid-Open No. 2014-197190, the contents of which are incorporated into this specification. [Example]

Hereinafter, an Example is given and this invention is demonstrated more concretely. Materials, usage amounts, proportions, processing contents, processing procedures, etc. shown in the following examples can be appropriately changed as long as they do not deviate from the gist of the present invention. In addition, Me in the structural formula represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group.

＜Measurement of weight average molecular weight and number average molecular weight＞ Regarding the measurement of the weight average molecular weight of the resin, HPC-8220GPC (manufactured by TOSOH CORPORATION) was used as the measuring device, TSKguardcolumn SuperHZ-L was used as the guard column, and direct connection TSKgel SuperHZM-M, TSKgel SuperHZ4000, TSKgel SuperHZ3000, TSKgel was used as the column. For the SuperHZ2000 column, set the column temperature to 40°C, inject 10 μL of tetrahydrofuran solution with a sample concentration of 0.1% by mass into the column, and flow tetrahydrofuran as the elution solvent at a flow rate of 0.35 mL per minute. Use RI (differential refraction) The sample peak was detected by the detection device and calculated using the calibration curve produced using standard polystyrene.

＜Preparation of pigment dispersion＞ The materials shown in the table below were blended in the proportions shown in the table below to obtain a mixture with a total amount of 10 g. This mixture was mixed and dispersed for 3 hours using zirconium dioxide microbeads with a diameter of 0.3 mm and a bead mill (high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.)). Each pigment dispersion liquid was prepared. The solid content concentration of the pigment dispersion liquid was adjusted based on the blending amount of the solvent.

[Table 1] Pigment dispersion Pigments dispersant Solvent Pigment dispersion Kind Blending amount [mass parts] Kind Blending amount [mass parts] Kind Solid content concentration [mass %] Pigment concentration in total solid content [mass %] A001 P001 20 Dis-002 20 S-001 20 50.0 A002 P002 20 Dis-001 20 S-001 20 50.0 A003 P003 20 Dis-002 20 S-001 20 50.0 A004 P004 20 Dis-002 20 S-001 20 50.0 A005 P005 20 Dis-002 20 S-001 20 50.0 A006 P006 20 Dis-002 20 S-001 20 50.0 A101 P101 20 Dis-002 20 S-001 20 50.0 A102 P102 20 Dis-002 20 S-001 20 50.0 A103 P103 20 Dis-001 20 S-001 20 50.0 A104 P104 20 Dis-002 20 S-001 20 50.0 A105 P105 20 Dis-002 20 S-001 20 50.0 A106 P106 20 Dis-002 20 S-001 20 50.0

Details of the materials listed in the table are as follows.

(pigment) P001 to P006, P101 to P106: Compounds P001 to P006, P101 to P106 (squaraine pigment, infrared absorber) shown in the specific examples of the squaraine pigment.

(Dispersant) Dis-001: Resin with the following structure (the value marked on the main chain is the molar ratio, and the value marked on the side chain is the number of repeating units. Weight average molecular weight: 25,000) Dis-002: Resin with the following structure (The value marked on the main chain is the molar ratio, and the value marked on the side chain is the number of repeating units. The weight average molecular weight is 9800) [Chemical 42]

(solvent) S-001: Propylene glycol monomethyl ether acetate

＜Preparation of infrared absorbing composition＞ Materials other than the solvents shown in the table below are mixed in the proportions shown in the table below, and the solvents shown in the table below are added and adjusted so that the solid content concentration reaches 20% by mass, and then stirred and used with a pore diameter of 0.45 μm. The nylon filter (manufactured by Nihon Pall Ltd.) was filtered to prepare an infrared absorbing composition. The values in the blending amount column in the table are parts by mass in terms of solid content conversion. The value of the part by mass of the specific compound relative to 100 parts by mass of the squaraine dye is shown in the "ratio of the specific compound" column of the following table.

[Table 2] Pigment dispersions, dyes specific compounds Resin Photopolymerization initiator polymeric compound surfactant polymerization inhibitor Solvent additives Proportion of a specific compound [parts by mass] Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Example 1 A001 30 111 0.003 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.02 Example 2 A001 30 111 0.03 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.20 Example 3 A001 30 111 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 4 A001 30 111 0.15 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 1.00 Example 5 A001 30 112 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 6 A001 30 113 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 7 A001 30 128 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 8 A001 30 033 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 9 A101 30 122 0.003 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.02 Example 10 A101 30 122 0.03 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.20 Example 11 A101 30 122 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 12 A101 30 122 0.15 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 1.00 Example 13 A101 30 121 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 14 A101 30 123 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 15 A101 30 126 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 16 A101 30 033 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 17 A002 30 124 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 18 A003 30 125 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 19 A004 30 126 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 20 A005 30 127 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 21 A006 30 128 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 22 A102 30 129 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 23 A103 30 130 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 24 A104 30 131 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 25 A105 30 132 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50

[table 3] Pigment dispersions, dyes specific compounds Resin Photopolymerization initiator polymeric compound surfactant polymerization inhibitor Solvent additives Proportion of a specific compound [parts by mass] Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Example 26 A106 30 133 0.075 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 27 D001 10 011 0.05 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 28 D002 10 021 0.002 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.02 Example 29 D002 10 021 0.02 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.20 Example 30 D002 10 021 0.05 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 31 D002 10 021 0.1 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 1.00 Example 32 D003 10 032 0.002 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.02 Example 33 D003 10 032 0.02 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.20 Example 34 D003 10 032 0.05 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 35 D003 10 032 0.1 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 1.00 Example 36 D004 10 021 0.05 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 37 D002 10 022 0.05 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 38 D002 10 023 0.05 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 39 D002 10 111 0.05 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 40 D003 10 031 0.05 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 41 D003 10 033 0.05 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 42 D003 10 122 0.05 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 43 A001 30 111 0.075 B001 50 C-1 10 M-3 10 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 44 D003 10 031 0.05 B001 60 C-1 10 M-3 20 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 45 A001 30 111 0.075 B001 50 C-1 C-2 5 5 M-1 10 F-2 0.006 G-1 0.003 S-001 - - 0.50 Example 46 D003 10 031 0.025 B001 60 C-1 C-2 5 5 M-1 20 F-3 0.003 G-1 0.003 S-001 - - 0.50 Example 47 A001 30 111 0.15 B001 50 C-2 10 M-1 M-3 5 5 F-2 0.006 G-1 0.003 S-001 - - 0.50 Example 48 D003 10 031 032 0.010 0.015 B004 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 49 D002 10 022 0.05 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-002 - - 0.50 Example 50 A101 30 122 0.075 B003 B002 30 20 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.50

[Table 4] Pigment dispersions, dyes specific compounds Resin Photopolymerization initiator polymeric compound surfactant polymerization inhibitor Solvent additives Proportion of a specific compound [parts by mass] Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Example 51 D003 10 031 0.05 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 U-1 2 0.50 Example 52 D003 10 031 0.05 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 U-2 2 0.50 Example 53 D003 10 031 0.05 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 U-3 2 0.50 Example 54 D003 D101 9 1 032 0.05 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 55 D003 D102 9 1 032 0.045 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.50 Example 56 D003 D103 9 1 032 0.045 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.50 Comparative example 1 A001 30 - - B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.00 Comparative example 2 A001 30 111 0.18 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 1.20 Comparative example 3 A101 30 - - B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 0.00 Comparative example 4 A101 30 122 0.18 B001 50 C-1 10 M-1 10 F-1 0.003 G-1 0.003 S-001 - - 1.20 Comparative example 5 D002 10 - - B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.00 Comparative example 6 D002 10 021 0.12 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 1.20 Comparative example 7 D003 10 - - B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 0.00 Comparative example 8 D003 10 032 0.12 B001 60 C-1 10 M-1 20 F-1 0.003 G-1 0.003 S-001 - - 1.20

[table 5] Pigment dispersions, dyes specific compounds Resin surfactant Solvent additives Proportion of a specific compound [parts by mass] Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Example 101 A001 30 111 0.003 B005 50 F-1 0.003 S-001 - - 0.02 Example 102 A001 30 111 0.03 B005 50 F-1 0.003 S-001 - - 0.20 Example 103 A001 30 111 0.075 B005 50 F-1 0.003 S-001 - - 0.50 Example 104 A001 30 111 0.15 B005 50 F-1 0.003 S-001 - - 1.00 Example 105 A101 30 112 0.075 B005 50 F-1 0.003 S-001 - - 0.50 Example 106 A002 30 124 0.075 B005 50 F-1 0.003 S-001 - - 0.50 Example 107 A003 30 125 0.075 B006 50 F-1 0.003 S-001 - - 0.50 Example 108 A004 30 126 0.075 B007 45 F-1 0.003 S-001 U-4 5 0.50 Example 109 A005 30 127 0.003 B008 50 F-1 0.003 S-001 - - 0.02 Example 110 A006 30 128 0.03 B005 50 F-1 0.003 S-001 - - 0.20 Example 111 A102 30 129 0.075 B006 50 F-1 0.003 S-001 - - 0.50 Example 112 A103 30 130 0.15 B007 45 F-1 0.003 S-001 U-4 5 1.00 Example 113 A104 30 131 0.075 B008 50 F-1 0.003 S-001 - - 0.50 Example 114 A105 30 132 0.075 B005 50 F-1 0.003 S-001 - - 0.50 Example 115 A106 30 133 0.075 B006 50 F-1 0.003 S-001 - - 0.50 Example 116 D001 D101 9 1 011 0.045 B006 50 F-1 0.003 S-001 U-1 1 0.50 Example 117 D002 D102 9 1 031 0.045 B005 50 F-1 0.003 S-001 U-2 1 0.50 Example 118 D003 D103 9 1 032 0.045 B006 50 F-1 0.003 S-001 U-3 U-5 1 1 0.50 Example 119 D004 D104 9 1 021 0.045 B007 45 F-1 0.003 S-001 U-4 U-6 5 1 0.50 Example 120 D001 D105 9 1 032 0.045 B008 50 F-1 0.003 S-001 U-1 1 0.50

[Table 6] Pigment dispersions, dyes specific compounds Resin surfactant Solvent additives Proportion of a specific compound [parts by mass] Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Kind Blending amount Example 121 D002 D106 9 1 032 0.045 B005 50 F-1 0.003 S-001 U-2 1 0.50 Example 122 D001 D107 9 1 022 0.045 B006 50 F-1 0.003 S-001 U-5 1 0.50 Example 123 D001 D108 9 1 023 0.045 B007 45 F-1 0.003 S-001 U-4 U-6 5 1 0.50 Example 124 D004 D109 9 1 032 0.045 B008 50 F-1 0.003 S-001 U-1 1 0.50 Example 125 D003 D110 9 1 032 0.045 B005 50 F-1 0.003 S-001 U-2 1 0.50 Example 126 D003 D111 9 1 032 0.045 B005 50 F-1 0.003 S-001 U-2 1 0.50 Example 127 D003 D112 9.2 1.2 032 0.045 B005 50 F-1 0.003 S-001 U-2 1 0.50 Example 128 D003 D113 9.5 0.5 032 0.045 B005 50 F-1 0.003 S-001 U-2 1 0.50 Comparative example 101 A001 30 - - B001 50 F-1 0.003 S-001 - - 0.00 Comparative example 102 A001 30 111 0.36 B001 50 F-1 0.003 S-001 - - 1.20 Comparative example 103 D001 D101 9 1 - B005 50 F-1 0.003 S-001 U-2 1 0.00 Comparative example 104 D001 D101 9 1 011 0.108 B005 50 F-1 0.003 S-001 U-2 1 1.20

Details of the materials listed in the above table are as follows.

(Pigment dispersion) A001～A006, A101～A106: The above pigment dispersion A001～A006, A101～A106

(Dye) D001 to D004: Compounds D001 to P004 shown in the specific examples of the squaraine dye (squaraine dye, infrared absorber) D101: Compounds with the following structures (squaraine dye, infrared absorber) D102: The compound with the following structure (phthalocyanine dye, infrared absorber) D103: The compound with the following structure (pyranium type polymethine dye, infrared absorber) D104: The compound with the following structure (phthalocyanine dye, Infrared absorber) D105: Compound with the following structure (phthalocyanine dye, infrared absorber) D106: Compound with the following structure (phthalocyanine dye, infrared absorber) D107: Compound with the following structure (pyranium type polyphosphate Methyl dye, infrared absorber) D108: Compound with the following structure (pyranium type polymethine dye, infrared absorber) D109: Compound with the following structure (pyranium type polymethine dye, infrared absorber) agent) D110: The compound with the following structure (pyranium type polymethine, infrared absorber) D111: The compound with the following structure (pyranium type polymethine, infrared absorber) D112: The following structure Compound (Thiopyranium type polymethine, infrared absorber) D113: Compound with the following structure (benzo[c,d]indole type polymethine, infrared absorber) [Chemical 43] [Chemical 44] [Chemical 45]

(Specific compound) [Compound represented by formula (1a)] 011, 021 to 023, 031 to 033, 111 to 113, 121 to 133: Compounds with the following structures [Chemical 46] [Chemical 47]

(Resin) B001: Resin with the following structure (the value marked on the main chain is the molar ratio of the repeating unit, the weight average molecular weight is 17000, and the dispersion is 2.3) [Chemical 48] B002: Resin with the following structure (the value marked on the main chain is the molar ratio of the repeating unit, the weight average molecular weight is 9700, and the dispersion is 1.8) [Chemical 49] B003: Resin with the following structure (the value marked on the main chain is the molar ratio of the repeating unit, the weight average molecular weight is 10100, and the dispersion is 1.7) [Chemical 50] B004: Resin with the following structure (the value marked on the main chain is the molar ratio of the repeating unit, the weight average molecular weight is 25000, and the dispersion is 2.2) [Chemical 51] B005: Resin with the following structure (the value marked on the main chain is the molar ratio of the repeating unit, the weight average molecular weight is 10000, and the dispersion is 2.0) [Chemical 52] B006: Resin with the following structure (the value marked on the main chain is the molar ratio of the repeating unit, the weight average molecular weight is 8000, and the dispersion is 1.8) [Chemical 53] B007: Resin with the following structure (the value marked on the main chain is the molar ratio of the repeating unit, the weight average molecular weight is 10500, and the dispersion is 2.4) [Chemical 54] B008: ARTON F4520 (manufactured by JSR Corporation, cyclic polyolefin resin)

(polymeric compound) M-1: KAYARAD DPHA (manufactured by Nippon Kayaku Co., Ltd., a mixture of dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate) M-3: ARONIX M-510 (manufactured by TOAGOSEI CO., LTD., polybasic acid-modified acrylic oligomer)

(Photopolymerization initiator) C-1: Irgacure OXE01 (manufactured by BASF, oxime ester compound) C-2: A compound with the following structure [Chemical 55]

(Surfactant) F-1: FTX-218D (manufactured by NEOS COMPANY LIMITED, fluorine-based surfactant) F-2: A compound with the following structure (weight average molecular weight: 14,000, the value representing the percentage of repeating units is moles ear%) [chemical 56] F-3: MEGAFACE F-554 (manufactured by DIC Corporation, fluorine-based surfactant)

(polymerization inhibitor) G-1: p-methoxyphenol

(Other additives) U-1: Compound with the following structure (antioxidant) U-2: Compound with the following structure (antioxidant) [Chemical 57] U-3: Uvinul3050 (UV absorber manufactured by BASF Corporation) U-4: EPICLON NM-695 (novolak type epoxy resin, manufactured by DIC Corporation) U-5: Compound with the following structure (antioxidant) U-6 : Compound with the following structure (antioxidant) [Chemical 58]

(solvent) S-001: Propylene glycol monomethyl ether acetate S-002: cyclopentanone

<Evaluation of light resistance> Regarding the infrared-absorbing compositions of Examples 1 to 56 and Comparative Examples 1 to 8, each infrared-absorbing composition was coated on a glass substrate by a spin coating method so that the film after film formation The thickness reached 1.0 μm, and the ^entire surface was exposed at an exposure dose of 1000 mJ/cm using an i-ray stepper exposure device FPA-3000i5+ (manufactured by Canon Inc.). Next, the film was heated at 200° C. for 10 minutes using a hot plate to produce a film. Regarding the infrared absorbing compositions of Examples 101 to 128 and Comparative Examples 101 to 104, each infrared absorbing composition was coated on a glass substrate by a spin coating method so that the film thickness after film formation reached 1.0 μm, and Heating at 200°C for 10 minutes produced a film. Regarding the glass base material on which the above film was formed, the transmittance in the wavelength range of 400 to 2000 nm was measured using an ultraviolet, visible, and near infrared spectrophotometer U-4100 (manufactured by Hitachi High-Tech Corporation). Next, the glass base material on which the film was formed was irradiated with a xenon lamp at 100,000 lux for 20 hours (equivalent to 2 million lux･h), and the transmittance of the film after irradiation with the xenon lamp was measured. The transmittance change amount (ΔT) before and after xenon lamp irradiation was determined at each wavelength within the wavelength range of 600 to 800 nm, and the light resistance was evaluated based on the maximum value of ΔT in the entire measurement wavelength range based on the following standards. The smaller the ΔT value is, the better the light resistance is. Change in transmittance (ΔT) =|Transmittance of the film before irradiation with xenon lamp - Transmittance of the film after irradiation with xenon lamp| -Evaluation criteria- A: ΔT is less than 1% B: ΔT is more than 1% and less than 3% D : ΔT is 3% or more

<Evaluation of rectangularity> The infrared absorbing compositions of Examples 1 to 56 and Comparative Examples 1 to 8 were coated on an 8-inch (1 inch = 2.54 cm) silicon wafer by spin coating method so that After the film was formed, the film thickness reached 1.0 μm, and the film was heated at 100° C. for 2 minutes using a heating plate. Next, using an i-line stepper exposure device FPA-3000i5+ (manufactured by Canon Inc.), a 2 μm Bell pattern was irradiated with i-rays through a mask at an exposure dose of 1000 mJ/cm ² . Next, spin immersion development was performed at 25° C. for 60 seconds using a 0.3 mass% tetramethylamine hydroxide (TMAH) aqueous solution. Then, it was washed by the spin spray method, further washed with pure water, and then heated at 200° C. for 5 minutes using a hot plate to form a pattern (pixel). The cross section of the obtained pixel was observed with a scanning electron microscope, the angle of the side wall of the pixel relative to the surface of the silicon wafer was measured, and the rectangularity was evaluated based on the following evaluation criteria. When the following evaluation criteria are 3 to 5, the closer the evaluation result is to 5, the better the squareness is, and when the evaluation result is 5, the squareness is the best. -Evaluation criteria- 5: The angle of the pixel side wall is more than 80° and less than 100° 4: The angle of the pixel side wall is more than 100° and less than 110° 3: The angle of the pixel side wall is more than 70° and less than 80° 2 : The angle of the pixel side wall is more than 110° 1: The angle of the pixel side wall is less than 70°

<Evaluation of Adhesion> Examples 1 to 56 and Comparative Examples 1 to 8 were coated on an 8-inch (1 inch is 2.54 cm) silicon wafer with hexamethyldisilazane sprayed by spin coating. The infrared absorbing composition was heated to 0.8 μm in thickness after film formation, and heated at 100°C for 2 minutes. Next, an i-line stepper exposure device FPA-3000i5+ (manufactured by Canon Inc.) was used to irradiate i-rays at an exposure dose of 50 to 1700 mJ/cm ² through a mask having an island pattern of 1.1 μm square. Next, spin immersion development was performed at 25°C for 40 seconds using a 0.3% by mass tetramethylamine hydroxide (TMAH) aqueous solution. Then, after rinsing with running water for 30 seconds, it was spray-dried to form a pattern (pixel). The obtained pixels were observed from above the pixels using a scanning electron microscope (S-9220 manufactured by Hitachi, Ltd.), and the pattern size of the pixels was measured. Furthermore, the adhesiveness was evaluated using an optical microscope. The pattern size when all pixels were closely connected was evaluated in five stages based on the following evaluation criteria. It can be said that the closer the evaluation result is to 5, the more excellent the adhesiveness is. -Evaluation criteria- 5: The pattern size is 0.9 μm or more and less than 1.0 μm, and all pixels are closely connected. 4: The pattern size is 1.0μm or more and less than 1.05μm, and all pixels are closely connected. 3: The pattern size is 1.05μm or more and less than 1.1μm, and all pixels are closely connected. 2: The pattern size is 1.1μm or more and less than 1.2μm, and all pixels are closely connected. 1: If the pattern size does not exceed 1.2μm, all pixels will not be closely connected.

[Table 7] Lightfastness rectangularity Tightness Example 1 B 4 4 Example 2 A 5 5 Example 3 A 5 5 Example 4 B 3 5 Example 5 A 5 5 Example 6 A 5 5 Example 7 A 5 4 Example 8 B 4 4 Example 9 B 4 4 Example 10 A 5 5 Example 11 A 5 5 Example 12 B 3 5 Example 13 A 5 5 Example 14 A 5 5 Example 15 A 5 4 Example 16 B 4 4 Example 17 A 5 4 Example 18 A 5 4 Example 19 A 5 3 Example 20 A 5 4 Example 21 A 5 4 Example 22 A 5 4 Example 23 A 5 3 Example 24 A 5 4 Example 25 A 5 5 Example 26 A 5 5 Example 27 A 4 4 Example 28 B 5 4 Example 29 A 5 5 Example 30 A 5 5 Example 31 B 3 5 Example 32 B 4 4 Example 33 A 5 5 Example 34 A 5 5 Example 35 B 3 5 Example 36 A 3 4 Example 37 A 5 5 Example 38 A 5 5 Example 39 B 3 4 Example 40 A 5 4

[Table 8] Lightfastness rectangularity Tightness Example 41 A 5 5 Example 42 B 3 4 Example 43 A 5 5 Example 44 A 5 5 Example 45 A 5 5 Example 46 A 5 5 Example 47 A 5 5 Example 48 A 5 5 Example 49 A 5 5 Example 50 A 5 5 Example 51 A 5 5 Example 52 A 5 5 Example 53 A 5 5 Example 54 A 5 5 Example 55 A 5 5 Example 56 A 5 5 Comparative example 1 C 2 2 Comparative example 2 C 1 5 Comparative example 3 C 2 3 Comparative example 4 C 1 5 Comparative example 5 C 2 3 Comparative example 6 C 1 5 Comparative example 7 C 2 2 Comparative example 8 C 1 5

[Table 9] Lightfastness Example 101 B Example 102 A Example 103 A Example 104 B Example 105 A Example 106 A Example 107 A Example 108 A Example 109 B Example 110 A Example 111 A Example 112 B Example 113 A Example 114 A Example 115 A Example 116 A Example 117 A Example 118 A Example 119 A Example 120 A Example 121 A Example 122 A Example 123 A Example 124 A Example 125 A Example 126 A Example 127 A Example 128 A Comparative example 101 C Comparative example 102 C Comparative example 103 C Comparative example 104 C

As shown in the above table, the examples were excellent in light resistance evaluation. In addition, Examples 1 to 56 can also form pixels excellent in rectangularity and adhesion.

110: Solid camera element 111: Infrared cut filter 112:Color filter 114:Infrared transmission filter 115: Microlens 116: Planarization layer

FIG. 1 is a schematic diagram showing an embodiment of an infrared sensor.

110: Solid camera element

111: Infrared cut filter

112:Color filter

114:Infrared transmission filter

115: Microlens

116: Planarization layer

Claims (15)

An infrared absorbing composition containing: a squarylyanine dye represented by the formula (SQ1); a compound represented by the formula (1a); and a resin, relative to 100 parts by mass of the squarylyanine dye represented by the formula (SQ1) , containing 0.01 to 1.0 parts by mass of the aforementioned compound represented by formula (1a), In the formula, A ¹ and A ² independently represent an aryl group, a heterocyclic group or a group represented by formula (R1), R ¹⁰¹ represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, In the formula (R1), * represents a bond, Rs ¹ to Rs ³ each independently represent a hydrogen atom or an alkyl group, As ³ represents a heterocyclic group, n _s1 represents an integer above 0, Rs ¹ and Rs ² may be bonded to each other. To form a ring, Rs ¹ and As ³ can bond with each other to form a ring, and Rs ² and Rs ³ can bond with each other to form a ring. When n _s1 is 2 or more, multiple Rs ² and Rs ³ can be the same, respectively. Can be different. The infrared absorbing composition as described in claim 1, wherein The aforementioned squaraine dye represented by formula (SQ1) is a squaraine dye. The infrared absorbing composition as described in claim 2, wherein the aforementioned squarylyanine dye is selected from the squarylyanine dye represented by formula (SQ2), the squarylyanine dye represented by formula (SQ3) and the squarylyanine dye represented by formula (SQ4) At least one of the squaraine dyes, the aforementioned compound represented by formula (1a) is at least one selected from the compound represented by formula (2a), the compound represented by formula (3a) and the compound represented by formula (4a) kind, In the formula (SQ2), R ^a1 to R ^a4 each independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, and an alkoxy group. , hydroxyl group, alkoxycarbonyl group or -NR ^a11 R ^a12 , R ^a11 and R ^a12 independently represent a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, R ^b1 ~ R ^b4 respectively independently represent a hydrogen atom and a halogen atom , sulfo group, hydroxyl, cyano group, nitro group, carboxyl group, phosphate group, alkyl group, aryl group, heterocyclic group, alkoxy group, acyl group or -NR ^b11 R ^b12 , R ^b11 and R ^b12 independently represent hydrogen Atom, alkyl group, aryl group, heterocyclic group or acyl group, Ya ¹ and Ya ² independently represent -NR ^y11 R ^y12 , R ^y11 and R ^y12 independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group group, R ^a1 and Y ^a1 can bond to form a 5-membered ring or a 6-membered heterocyclic ring containing at least 1 nitrogen atom, R ^a2 and Y ^a1 can bond to form a 5-membered ring containing at least 1 nitrogen atom Or a 6-membered ring heterocyclic ring, R ^a3 and Y ^a2 can be bonded to form a 5-membered ring or a 6-membered ring heterocyclic ring containing at least 1 nitrogen atom, R ^a4 and Y ^a2 can be bonded to form a 5-membered ring or 6-membered ring heterocyclic ring containing at least 1 nitrogen atom. A 5-membered ring or a 6-membered heterocyclic ring of a nitrogen atom, In formula (SQ3), X ¹ and X ² independently represent -O-, -S-, -Se-, -NR ^c10 - or -CR ^d10 R ^d11 -, and R ^c1 , R ^c2 and R ^c10 independently represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, and R ^d1 to R ^d8 , R ^d10 and R ^d11 independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group and a phosphate group. , alkyl group, aryl group, heterocyclyl group, alkoxy group, acyl group, alkoxycarbonyl group, or -NR ^d21 R ^a22 , R ^d21 and R ^d22 respectively independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group , among R ^d1 ~ R ^d8 , two adjacent groups can bond with each other to form a ring, In formula (SQ4), X ⁴¹ and X ⁴² each independently represent a divalent linking group represented by formula (X-1) or formula (X-2), and R ^41a and R ^41b each independently represent an alkyl group or Aryl group, R ^42a , R ^42b , R ^43a and R ^43b each independently represent a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, R ^44a and R ^44b each independently represent an alkyl group or an aryl group, - (CR ^X1 R ^X2 ) _n1 - ･･･(X-1) In formula (X-1), R ^X1 and ^{R X3} R ^X4 _{) n2} -O- ^{( CR X5 R} , n2 and n3 independently represent integers from 0 to 2, n2+n3 is 1 or 2, In formula (2a), R ^a1 and R ^a2 independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, a heterocyclic group, and an alkoxy group. , hydroxyl group, alkoxycarbonyl group or -NR ^a11 R ^a12 , R ^a11 and R ^a12 independently represent a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, R ^b1 and R ^b2 respectively independently represent a hydrogen atom and a halogen atom , sulfo group, hydroxyl, cyano group, nitro group, carboxyl group, phosphate group, alkyl group, aryl group, heterocyclic group, alkoxy group, acyl group or -NR ^b11 R ^b12 , R ^b11 and R ^b12 independently represent hydrogen atom, alkyl group, aryl group, heterocyclic group or hydroxyl group, Ya ¹ represents -NR ^y11 R ^y12 , R ^y11 and R ^y12 independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group, R ^a1 and Y ^a1 can be bonded to form a 5-membered ring or a 6-membered heterocyclic ring containing at least one nitrogen atom, and R ^a2 and Y ^a1 can be bonded to form a 5-membered ring or a 6-membered heterocyclic ring containing at least 1 nitrogen atom. Ring, R ¹⁰² represents a hydrogen atom, alkyl group, aryl group or heterocyclic group, In formula (3a), X ¹ represents -O-, -S-, -Se-, -NR ^c10 - or -CR ^d10 R ^d11 -, and R ^c1 and R ^c10 independently represent a hydrogen atom, an alkyl group, and an aryl group. or heterocyclic group, R ^d1 ~ R ^d4 , R ^d10 and R ^d11 respectively independently represent a hydrogen atom, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, and a heterocyclic group. group, alkoxy group, acyl group, alkoxycarbonyl group or -NR ^d21 R ^a22 , R ^d21 and R ^d22 independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group, among R ^d1 to R ^d4 , adjacent The two groups can be bonded to each other to form a ring, R ¹⁰³ represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, ^In formula ( ^{4a ) ,} represents a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, R ^44a represents an alkyl group or an aryl group, and R ¹⁰⁴ represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group. The infrared absorbing composition as described in claim 3, wherein The aforementioned squaraine dye is a squaraine dye represented by formula (SQ4), The aforementioned compound represented by formula (1a) is the aforementioned compound represented by formula (4a). The infrared absorbing composition as described in claim 4, wherein The aforementioned squaraine pigment represented by formula (SQ1) is a squaraine pigment. The infrared absorbing composition according to claim 5, wherein the aforementioned squarylyanine pigment is at least one selected from the squarylyanine pigment represented by formula (SQ5) and the squarylyanine pigment represented by formula (SQ6), and the aforementioned squarylyanine pigment is represented by The compound represented by formula (1a) is at least one selected from the compound represented by formula (5a) and the compound represented by formula (6a), In the formula (SQ5), R ⁵¹ to R ⁷⁰ each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a sulfo group, -NR ⁷¹ R ⁷² , -SO ₂ NR ⁷³ R ⁷⁴ , -COOR ⁷⁵ , -CONR ⁷⁶ R ⁷⁷ , nitro group, cyano group or halogen atom, R ⁷¹ ~ R ⁷⁷ independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group, R ⁷¹ and R ⁷² can be bonded to each other to form a ring, R ⁷³ and R ⁷⁴ can be bonded to each other to form a ring, R ⁷⁶ and R ⁷⁷ can be bonded to each other to form a ring, among R ⁵¹ to R ⁷⁰ , two adjacent groups can bond with each other to form rings, In formula (SQ6), Q ^1a , Q ^1b , Q ^4a , Q ^4b , Q ^5a , Q ^5b , Q ^8a and Q ^8b respectively independently represent a carbon atom or a nitrogen atom. However, when Q ^1a is a nitrogen atom, Rq ^1a does not exist, when Q ^1b is a nitrogen atom, Rq ^1b does not exist, when Q ^4a is a nitrogen atom, Rq ^4a does not exist, when Q ^4b is a nitrogen atom, Rq ^4b does not exist, when Q ^5a is a nitrogen atom , Rq ^5a does not exist. When Q ^5b is a nitrogen atom, Rq ^5b does not exist. When Q ^8a is a nitrogen atom, Rq ^8a does not exist. When Q ^8b is a nitrogen atom, Rq ^8b does not exist. R ^81a ~ R ^85a And R ^81b ~ R ^85b independently represent a hydrogen atom, a sulfo group, -SO ₃ ^- M ⁺ or a halogen atom. M ⁺ represents an inorganic or organic cation. Among R ^81a ~ R ^85a , two adjacent groups can be mutually exclusive. Bond to form a ring. Among R ^81b to R ^85b , two adjacent groups can bond to each other to form a ring. Rq ^1a to Rq ^8a and Rq ^1b to Rq ^8b independently represent hydrogen atoms and alkyl groups. , alkenyl, aryl, heterocyclyl, alkoxy, aryloxy, hydroxyl, -NRq ¹¹ Rq ¹² , sulfo group, -SO ₂ NRq ¹³ Rq ¹⁴ , -COORq ¹⁵ , -CONRq ¹⁶ Rq ¹⁷ , nitro , cyano group or halogen atom, Rq ¹¹ to Rq ¹⁷ independently represent a hydrogen atom, alkyl group, aryl group, acyl group or heterocyclic group, Rq ¹¹ and Rq ¹² can be bonded to each other to form a ring, Rq ¹³ and Rq ¹⁴ Can bond with each other to form a ring, Rq ¹⁶ and Rq ¹⁷ can bond with each other to form a ring, In formula (5a), R ⁵¹ to R ⁶⁰ each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a sulfo group, -NR ⁷¹ R ⁷² , -SO ₂ NR ⁷³ R ⁷⁴ , -COOR ⁷⁵ , -CONR ⁷⁶ R ⁷⁷ , nitro group, cyano group or halogen atom, R ⁷¹ ~ R ⁷⁷ independently represent a hydrogen atom, alkyl group, aryl group or heterocyclic group, R ⁷¹ and R ⁷² can be bonded to each other to form a ring, R ⁷³ and R ⁷⁴ can be bonded to each other to form a ring, R ⁷⁶ and R ⁷⁷ can be bonded to each other to form a ring, among R ⁵¹ to R ⁶⁰ , two adjacent groups can bond with each other to form a ring, R ¹⁰⁵ represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group, In formula (6a), Q ^1a , Q ^4a , Q ^5a and Q ^8a each independently represent a carbon atom or a nitrogen atom. However, when Q ^1a is a nitrogen atom, Rq ^1a does not exist. When Q ^4a is a nitrogen atom, Rq ^4a does not exist. When Q ^5a is a nitrogen atom, Rq ^5a does not exist. When Q ^8a is a nitrogen atom, Rq ^8a does not exist. R ^81a ~ R ^85a independently represent a hydrogen atom, a sulfo group, and -SO ₃ ^- M ⁺ or halogen atom, M ⁺ represents inorganic or organic cation, among R ^81a ~ R ^85a , two adjacent groups can bond with each other to form a ring, Rq ^1a ~ Rq ^8a independently represent hydrogen atoms and alkyl groups , alkenyl, aryl, heterocyclyl, alkoxy, aryloxy, hydroxyl, -NRq ¹¹ Rq ¹² , sulfo, -SO ₂ NRq ¹³ Rq ¹⁴ , -COORq ¹⁵ , -CONRq ¹⁶ Rq ¹⁷ , nitro , cyano group or halogen atom, Rq ¹¹ to Rq ¹⁷ independently represent a hydrogen atom, alkyl group, aryl group, acyl group or heterocyclic group, Rq ¹¹ and Rq ¹² can be bonded to each other to form a ring, Rq ¹³ and Rq ¹⁴ They may be bonded to each other to form a ring. Rq ¹⁶ and Rq ¹⁷ may be bonded to each other to form a ring. R ¹⁰⁶ represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group. The infrared absorbing composition as described in claim 6, wherein The aforementioned squaraine pigment is a squaraine pigment represented by formula (SQ5), The aforementioned compound represented by formula (1a) is a compound represented by formula (5a). The infrared absorbing composition as described in claim 6, wherein The aforementioned squaraine pigment is a squaraine pigment represented by formula (SQ6), The aforementioned compound represented by formula (1a) is a compound represented by formula (6a). The infrared absorbing composition according to claim 1 or 2, which further contains a photopolymerization initiator and a polymerizable compound. A film obtained using the infrared absorbing composition according to claim 1 or 2. An optical filter comprising the film according to claim 10. A solid-state imaging element including the film according to claim 10. An image display device comprising the film according to claim 10. An infrared sensor comprising the film described in claim 10. A camera module including the film described in claim 10.