TW202336019A - Composition, film, optical filter, solid-state imaging element, image display device, infrared sensor, camera module, and compound - Google Patents

Abstract

Provided are: a composition capable of forming a film that exhibits excellent storage stability, excellent spectral characteristics, and excellent light resistance and moisture resistance; a film; an optical filter; a solid-state imaging element; an image display device; an infrared sensor; a camera module; and a compound. The composition contains a dye expressed by formula (1), a curable compound, and a solvent.

Description

Compositions, films, optical filters, solid-state imaging devices, image display devices, infrared sensors, camera modules and compounds

The present invention relates to a composition containing squaraine pigment. Furthermore, the present invention relates to a film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor, a camera module and a compound using the composition.

The solid-state imaging element that uses color images in video cameras, digital cameras, mobile phones with camera functions, etc. is CCD (Charge Coupled Device) or CMOS (Complementary Metal Oxide Semiconductor). These solid-state imaging devices use silicon photodiodes that are sensitive to infrared rays in their light-receiving portions. Therefore, an infrared cut filter is sometimes set for luminosity factor correction.

An infrared cut filter is manufactured using a composition containing an infrared absorbing pigment. As infrared absorbing dyes, squaraine dyes and the like are known.

Patent Documents 1 and 2 describe a technology for manufacturing an infrared cut filter or the like using a composition containing a specific squaraine dye.

[Patent Document 1] Japanese Patent Application Publication No. 2015-176046 [Patent Document 2] Japanese Patent Application Publication No. 2017-179131

In recent years, there has been a demand for further improvements in spectral characteristics of films obtained using compositions containing infrared-absorbing pigments. For example, excellent visible transparency is required.

In addition, the composition containing an infrared-absorbing dye is required to have excellent storage stability, and the obtained film is also required to be excellent in light resistance or moisture resistance.

The inventors of the present invention have studied compositions containing squaraine pigments disclosed in Patent Documents 1 and 2, and found that there is room for further improvement in these properties.

Therefore, an object of the present invention is to provide a composition capable of forming a film having excellent storage stability, excellent spectral characteristics, and excellent light resistance and moisture resistance. Furthermore, an object of the present invention is to provide a film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor, a camera module, and a compound.

The present invention provides the following. <1> A composition containing a pigment represented by formula (1), a curable compound, and a solvent, [Chemical Formula 1] In formula (1), Y ¹ and Y ² independently represent -C(=O)-, -SO ₂ - or -C(=S)NH-, and Ra ¹ and Ra ² independently represent an electron-withdrawing group. , Rb ¹ and Rb ² each independently represent a hydrogen atom or a substituent, X ¹ represents a single bond or a divalent linking group, R ² , R ³ , R ⁸ and R ⁹ each independently represent a hydrogen atom, an alkyl group or an aryl group , R ¹ and R ¹⁰ each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, a halogen atom or a hydroxyl group, L ¹ and L ² each independently represent -CR ^L1 =CR ^L2 - or -Z ¹ -NR ^L3 -, R ^L1 and R ^L2 independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, a halogen atom or a hydroxyl group, R ^L3 represents a hydrogen atom, an alkyl group or an aryl group, Z ¹ represents -C (=O )-, -SO ₂ -or -C(=S)NH-, R ¹ and R ² can be connected to each other to form a ring, R ² and R ³ can be connected to each other to form a ring, R ³ and L ¹ can be connected to each other to form a ring. To form a ring, R ⁹ and R ¹⁰ can be connected to each other to form a ring, R ⁸ and R ⁹ can be connected to each other to form a ring, and R ⁸ and L ² can be connected to each other to form a ring. <2> The composition according to <1>, wherein the above-mentioned Rb ¹ and Rb ² are each independently an electron-withdrawing group. <3> The composition according to <1>, wherein the above-mentioned Ra ¹ , Ra ² , Rb ¹ and Rb ² are each independently a halogen atom. <4> The composition according to any one of <1> to <3>, wherein both Y ¹ and Y ² are -C(=O)-. <5> The composition according to any one of <1> to <3>, wherein both Y ¹ and Y ² are -SO ₂ -. <6> The composition according to any one of <1> to <5>, wherein the above-mentioned X ¹ is an alkylene group, a halogenated alkylene group, -O-, -CO-, -S-, -SO ₂ -, -NH-, -NR-, -C (=S)- or a group consisting of a combination of two or more of these. <7> The composition according to any one of <1> to <6>, wherein the pigment represented by the formula (1) is a pigment represented by the formula (1-1), [Chemical Formula 2] In formula (1-1), Y ¹ and Y ² independently represent -C (=O)-, -SO ₂ - or -C (=S)NH-, and Ra ¹ and Ra ² independently represent electron pulling. group, Rb ¹ and Rb ² independently represent a hydrogen atom or a substituent, X ¹ represents a single bond or a divalent linking group, R ² , R ³ , R ⁸ and R ⁹ each independently represent a hydrogen atom, an alkyl group or a substituent. Aryl group, R ¹ , R ⁴ , R ⁵ , R ⁶ , R ⁷ and R ¹⁰ each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, a halogen atom or a hydroxyl group, R ¹ and R ² can be linked to each other. To form a ring, R ² and R ³ can be connected to each other to form a ring, R ³ and R ⁴ can be connected to each other to form a ring, R ⁷ and R ⁸ can be connected to each other to form a ring, and R ⁸ and R ⁹ can be connected to each other to form a ring. Ring, R ⁹ and R ¹⁰ may be linked to each other to form a ring. <8> The composition according to <7>, wherein the pigment represented by formula (1-1) is a pigment represented by formula (2), [Chemical Formula 3] In formula (2), Y ¹ and Y ² independently represent -C(=O)-, -SO ₂ - or -C(=S)NH-, and Ra ¹ and Ra ² independently represent an electron-withdrawing group. , Rb ¹ and Rb ² independently represent a hydrogen atom or a substituent, X ¹ represents a single bond or a divalent linking group, R ¹ , R ⁵ , R ⁶ and R ¹⁰ respectively independently represent a hydrogen atom, an alkyl group, and an alkoxy group, aryl group, halogen atom or hydroxyl group, R ¹¹ and R ¹⁶ independently represent an alkyl group or an aryl group, R ¹² , R 13 , R ¹⁴ , R ¹⁵ , R ¹⁷ , ^{R 18 ,} R ¹⁹ and R ²⁰ are respectively independent represents a hydrogen atom, an alkyl group, an alkoxy group or an aryl group, R ¹³ and R ¹⁴ may be linked to each other to form a ring, and R ¹⁸ and R ¹⁹ may be linked to each other to form a ring. <9> A film obtained using the composition according to any one of <1> to <8>. <10> An optical filter including the film according to <9>. <11> A solid-state imaging element including the film according to <9>. <12> An image display device including the film according to <9>. <13> An infrared sensor including the film according to <9>. <14> A camera module including the film described in <9>. <15> A compound represented by formula (1-1), [Chemical Formula 4] In formula (1-1), Y ¹ and Y ² independently represent -C (=O)-, -SO ₂ - or -C (=S)NH-, and Ra ¹ and Ra ² independently represent electron pulling. group, Rb ¹ and Rb ² independently represent a hydrogen atom or a substituent, X ¹ represents a single bond or a divalent linking group, R ² , R ³ , R ⁸ and R ⁹ each independently represent a hydrogen atom, an alkyl group or a substituent. Aryl group, R ¹ , R ⁴ , R ⁵ , R ⁶ , R ⁷ and R ¹⁰ each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, a halogen atom or a hydroxyl group, R ¹ and R ² can be linked to each other. To form a ring, R ² and R ³ can be connected to each other to form a ring, R ³ and R ⁴ can be connected to each other to form a ring, R ⁷ and R ⁸ can be connected to each other to form a ring, and R ⁸ and R ⁹ can be connected to each other to form a ring. Ring, R ⁹ and R ¹⁰ may be linked to each other to form a ring. <16> The compound according to <15>, wherein the compound represented by the above formula (1-1) is a compound represented by the formula (2), [Chemical Formula 5] In formula (2), Y ¹ and Y ² independently represent -C(=O)-, -SO ₂ - or -C(=S)NH-, and Ra ¹ and Ra ² independently represent an electron-withdrawing group. , Rb ¹ and Rb ² independently represent a hydrogen atom or a substituent, X ¹ represents a single bond or a divalent linking group, R ¹ , R ⁵ , R ⁶ and R ¹⁰ respectively independently represent a hydrogen atom, an alkyl group, and an alkoxy group, aryl group, halogen atom or hydroxyl group, R ¹¹ and R ¹⁶ independently represent an alkyl group or an aryl group, R ¹² , R 13 , R ¹⁴ , R ¹⁵ , R ¹⁷ , ^{R 18 ,} R ¹⁹ and R ²⁰ are respectively independent represents a hydrogen atom, an alkyl group, an alkoxy group or an aryl group, R ¹³ and R ¹⁴ may be linked to each other to form a ring, and R ¹⁸ and R ¹⁹ may be linked to each other to form a ring. [Effects of the invention]

According to the present invention, it is possible to provide a composition capable of forming a film having excellent storage stability, excellent spectral characteristics, and excellent light resistance and moisture resistance. Furthermore, the present invention can provide a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, a camera module, and a compound.

Hereinafter, the contents of the present invention will be described in detail. In this specification, "～" is used in the sense that the numerical values described before and after it are included as the lower limit and the upper limit. Among the labels for groups (atomic groups) in this specification, the labels indicating unsubstituted and unsubstituted include groups (atomic groups) without substituents as well as groups (atomic groups) with substituents. For example, "alkyl" includes not only alkyl groups without substituents (unsubstituted alkyl groups) but also alkyl groups with substituents (substituted alkyl groups). In this specification, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams, unless otherwise specified. Examples of the light used for exposure include the bright line spectrum of a mercury lamp, actinic rays or radiation such as far ultraviolet rays, extreme ultraviolet rays (EUV light), X-rays, and electron beams represented by excimer lasers. In this specification, "(meth)acrylate" means both or either acrylate and methacrylate, "(meth)acrylic acid" means both or either acrylic acid and methacrylic acid, and "(meth)acrylic acid" means both or either acrylic acid and methacrylic acid. "Meth)acrylyl" means both or either of acrylyl and methacrylyl. In this specification, the weight average molecular weight and the number average molecular weight are defined as polystyrene conversion values measured by gel permeation chromatography (GPC). In this specification, Me in the chemical formula represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. In this specification, infrared rays represent light (electromagnetic waves) with a wavelength of 700 to 2500 nm. In this specification, the total solid content refers to the total mass of components excluding solvents from all components of the composition. In this specification, the term "step" includes not only independent steps, but also includes steps that cannot be clearly distinguished from other steps, as long as the expected effect of the step is achieved.

＜Composition＞ The composition of the present invention is characterized by containing a pigment represented by formula (1), a curable compound, and a solvent.

The composition of the present invention has excellent storage stability. Furthermore, by using the composition of the present invention, a film having excellent spectral characteristics and excellent light resistance and moisture resistance can be formed. The detailed reason why this effect is obtained is not yet known, but it is presumed to be due to the following reasons. The pigment represented by formula (1) contained in the composition of the present invention has the following structure: two rings directly bonded to the squaraine site via -NH-Y ¹ -CRa ¹ Rb ¹ -X ¹ -CRa ² Rb ² -Y ² -NH-link. Among them, Ra ¹ and Ra ² are electron-withdrawing groups. It is presumed that since the pigment represented by formula (1) has such a structure, the stability of the pigment mother core is improved against nucleophilic attack by nucleophilic compounds or water. In addition, since Ra ¹ and Ra ² are electron-withdrawing groups, their solubility in solvents increases. Therefore, it is presumed that the decomposition, modification, aggregation, etc. of the dye represented by formula (1) during storage of the composition can be suppressed, and a composition having excellent storage stability can be produced. Furthermore, since the composition has excellent storage stability, even when the composition after storage is used, a film with suppressed defects can be formed. In addition, regarding the dye represented by formula (1), the dye mother core is highly stable against nucleophilic attack by nucleophilic compounds or water. Therefore, by using the composition of the present invention, it is possible to form light resistance or A film with excellent moisture resistance. Furthermore, it is speculated that in the dye represented by the formula (1), Ra ¹ and Ra ² are electron-withdrawing groups, so that the oscillator intensity of the absorption in the visible part is reduced, or the absorption in the visible part is shortened, and the oscillator intensity of the dye is It can be seen that transparency can be further improved. Therefore, by using the composition of the present invention, a film excellent in spectral characteristics can be formed.

The composition of the present invention can be used as a composition for optical filters. Examples of types of optical filters include infrared cut filters, infrared transmitting filters, and the like. The dye represented by Formula (1) has excellent visible transparency. Therefore, by using the composition of the present invention, it is possible to form an infrared cut filter excellent in visible transparency. In addition, in the infrared transmission filter, the pigment represented by the formula (1) has the function of limiting the transmitted light (infrared rays) to the longer wavelength side. The dye represented by Formula (1) has excellent visible transparency, so it is easy to control the spectrum of the visible region that is blocked or the spectrum of the infrared region that is transmitted within an accurate range.

Each component used in the composition of the present invention will be described below.

<<Pigment represented by Formula (1) (specific dye)>> The composition of the present invention contains a dye represented by Formula (1) (hereinafter also referred to as specific dye). [Chemical formula 6]

In formula (1), Y ¹ and Y ² independently represent -C(=O)-, -SO ₂ - or -C(=S)NH-, and Ra ¹ and Ra ² independently represent an electron-withdrawing group. , Rb ¹ and Rb ² each independently represent a hydrogen atom or a substituent, X ¹ represents a single bond or a divalent linking group, R ² , R ³ , R ⁸ and R ⁹ each independently represent a hydrogen atom, an alkyl group or an aryl group , R ¹ and R ¹⁰ each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, a halogen atom or a hydroxyl group, L ¹ and L ² each independently represent -CR ^L1 =CR ^L2 - or -Z ¹ -NR ^L3 -, R ^L1 and R ^L2 independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, a halogen atom or a hydroxyl group, R ^L3 represents a hydrogen atom, an alkyl group or an aryl group, Z ¹ represents -C (=O )-, -SO ₂ -or -C(=S)NH-, R ¹ and R ² can be connected to each other to form a ring, R ² and R ³ can be connected to each other to form a ring, R ³ and L ¹ can be connected to each other to form a ring. To form a ring, R ⁹ and R ¹⁰ can be connected to each other to form a ring, R ⁸ and R ⁹ can be connected to each other to form a ring, and R ⁸ and L ² can be connected to each other to form a ring.

It is preferred that Y ¹ and Y ² in formula (1) are independently -C (=O) - or -SO ₂ -. Among them, it is preferable that both Y ¹ and Y ² be -C (=O) - or both Y ¹ and Y ² be -SO ₂ - because the effect of the present invention is more significantly exerted. In view of the transparency From this point of view, it is better if both Y ¹ and Y ² are -SO ₂ -.

Ra ¹ and Ra ² in the formula (1) each independently represent an electron withdrawing group. Examples of the electron withdrawing group include substituents having a positive Hammett substituent constant σp value. Specific examples of the electron-withdrawing group include halogen atoms, cyano groups, nitro groups, halogenated alkyl groups, acyl groups, sulfonyl groups, and the like. More preferably, halogen atoms, cyano groups, nitro groups, and halogenated alkyl groups are used. Atoms are further preferred. In addition, a halogenated alkyl group refers to a group in which one or more hydrogen atoms of an alkyl group are substituted by a halogen atom.

Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. A fluorine atom, a chlorine atom, and a bromine atom are preferred, and a fluorine atom is more preferred.

The number of carbon atoms in the halogenated alkyl group is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 3, more preferably 1 or 2, and 1 is particularly preferred. The halogenated alkyl group is preferably straight chain or branched chain, preferably straight chain. The halogenated alkyl group is preferably a fluoroalkyl group or a chloroalkyl group, and more preferably a fluoroalkyl group.

Rb ¹ and Rb ² in the formula (1) each independently represent a hydrogen atom or a substituent. Examples of the substituent include the above-mentioned electron-withdrawing group and the substituent T described below, and an electron-withdrawal group is preferred.

It is preferable that Ra ¹ , Ra ² , Rb ¹ and Rb ² of the formula (1) are each independently an electron-withdrawing group, more preferably a halogen atom, and further preferably a fluorine atom.

X ¹ in the formula (1) represents a single bond or a bivalent linking group, and a divalent linking group is preferred. Examples of the divalent linking group represented by X ¹ include an alkylene group, a halogenated alkylene group, -O-, -CO-, -S-, -SO ₂ -, -NH-, -NR-, and -C. (=S)-and groups formed by combining two or more of these. Among them, the halogenated alkylene group refers to a group in which one or more hydrogen atoms of the alkyl group are replaced by halogen atoms.

The carbon number of the alkylene group and the halogenated alkylene group is preferably 1 to 10, more preferably 1 to 5. The alkylene group and the halogenated alkylene group are preferably straight chain or branched chain, and more preferably straight chain. The halogenated alkylene group is preferably a fluoroalkylene group or a chloroalkylene group, and more preferably a fluoroalkylene group.

X ¹ in the formula (1) is preferably a group containing an alkylene group or a halogenated alkylene group, and more preferably a group containing a halogenated alkylene group. Specific examples of X ¹ include the following aspects <1> to <4>, with <2> or <4> being preferred. <1> X ¹ is an alkylene group ^{, <2> X 1 is} a halogenated alkylene group, <3> The aspect of the group connected to -S-, <4> X ¹ is the aspect of the group connected to two or more halogenated alkylene groups via -O-, -CO- or -S-.

R ² , R ³ , R ⁸ and R ⁹ in the formula (1) each independently represent a hydrogen atom, an alkyl group or an aryl group. An alkyl group or an aryl group is preferred, and an alkyl group is more preferred.

The number of carbon atoms in the alkyl group represented by R ² , R ³ , R ⁸ and R ⁹ is preferably 1 to 30, more preferably 1 to 20, and further preferably 1 to 10. The alkyl group may be straight chain, branched chain or cyclic, with straight chain or branched chain being more preferred. The alkyl group may have a substituent. Examples of the substituent include groups exemplified in the substituent T described below, and at least one selected from the group consisting of an aryl group, a heteroaryl group, a halogen atom, and an alkoxy group is preferred.

The number of carbon atoms in the aryl group represented by R ² , R ³ , R ⁸ and R ⁹ is preferably 6 to 40, more preferably 6 to 30, and further preferably 6 to 20. The aryl group may have a substituent. Examples of the substituent include groups exemplified in the substituent T described below, and at least one selected from the group consisting of an alkyl group, a heteroaryl group, a halogen atom, and an alkoxy group is preferred.

R ¹ and R ¹⁰ in formula (1) each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, a halogen atom or a hydroxyl group.

The number of carbon atoms of the alkyl group represented by R ¹ and R ¹⁰ is preferably 1 to 30, more preferably 1 to 20, and further preferably 1 to 10. The alkyl group may be straight chain, branched chain or cyclic, with straight chain or branched chain being more preferred. The alkyl group may have a substituent. Examples of the substituent include groups exemplified in the substituent T described below, selected from the group consisting of an aryl group, a heteroaryl group, a halogen atom, an alkoxy group, an amino group, a hydroxyl group, a cyano group, a nitro group, a sulfonyl group, At least one kind from the group consisting of carboxyl group, acyl group and sulfonamide group is preferred.

The number of carbon atoms of the alkoxy group represented by R ¹ and R ¹⁰ is preferably 1 to 30, more preferably 1 to 20, and further preferably 1 to 10. The alkoxy group is preferably straight chain or branched chain. The alkoxy group may have a substituent. Examples of the substituent include the groups listed for the substituent T described below, and are selected from the group consisting of an aryl group, a heteroaryl group, a halogen atom, an amino group, a hydroxyl group, a cyano group, a nitro group, a sulfonyl group, a carboxyl group, and a hydroxyl group. At least one of the group consisting of a sulfonamide group and a sulfonamide group is preferred.

The number of carbon atoms of the aryl group represented by R ¹ and R ¹⁰ is preferably 6 to 40, more preferably 6 to 30, and further preferably 6 to 20. The aryl group may have a substituent. Examples of the substituent include groups exemplified in the substituent T described below, selected from the group consisting of an alkyl group, a heteroaryl group, a halogen atom, an alkoxy group, an amino group, a hydroxyl group, a cyano group, a nitro group, a sulfonyl group, At least one kind from the group consisting of carboxyl group, acyl group and sulfonamide group is preferred.

R ¹ and R ² in formula (1) may be connected to each other to form a ring, R ² and R ³ may be connected to each other to form a ring, R ³ and L ¹ may be connected to each other to form a ring, and R ⁹ and R ¹⁰ may be connected to each other to form a ring. To form a ring, R ⁸ and R ⁹ may be linked to each other to form a ring, and R ⁸ and L ² may be linked to each other to form a ring. The formed ring may be an aromatic ring or a non-aromatic ring. In addition, the ring formed may be a single ring or a condensed ring. The formed ring is preferably a 5-member ring or a 6-member ring. Moreover, the ring formed may have a substituent. Examples of the substituent include the substituent T mentioned below, which is selected from the group consisting of an alkyl group, an aryl group, a heteroaryl group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. At least one of them is preferred.

L ¹ and L ² in formula (1) each independently represent -CR ^L1 =CR ^L2 - or -Z ¹ -NR ^L3 -, R ^L1 and R ^L2 each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aromatic group group, halogen atom or hydroxyl group, R ^L3 represents a hydrogen atom, alkyl group or aryl group, Z ¹ represents -C (=O)-, -SO ₂ - or -C (=S)NH-.

The alkyl group, alkoxy group, aryl group and halogen atom represented by R ^L1 and R ^L2 have the same meaning as the alkyl group, alkoxy group, aryl group and halogen atom represented by R ¹ and R ¹⁰ , and the preferred range is Same thing.

The alkyl group and aryl group represented by R ^L3 have the same meaning as the alkyl group and aryl group represented by R ² , R ³ , R ⁸ and R ⁹ , and the preferred ranges are also the same.

Z ¹ is -C (=O)- which is preferred.

L ¹ and L ² of the formula (1) are each independently -CR ^L1 =CR ^L2 - or -C (=O) -NR ^L3 - which is preferred, and -CR ^L1 =CR ^L2 - which is more preferred.

In formula (1), L ¹ and L ² are independently -CR ^L1 =CR ^L2 -, and it is better for R ³ and L ¹ and R ⁸ and L ² to form a ring by connecting to each other, forming a 5-membered ring or a 6-membered ring. The employee environment is better.

(Substituent T) Examples of the substituent T include the following groups. Halogen atom (for example, fluorine atom, chlorine atom, bromine atom, iodine atom), alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), alkenyl group (preferably an alkenyl group having 2 to 30 carbon atoms), Alkynyl group (preferably an alkynyl group having 2 to 30 carbon atoms), aryl group (preferably an aryl group having 6 to 30 carbon atoms), heteroaryl group (preferably an aryl group having 1 to 30 carbon atoms), Amino group (preferably an amine group having 0 to 30 carbon atoms), alkoxy group (preferably an alkoxy group having 1 to 30 carbon atoms), aryloxy group (preferably an aryloxy group having 6 to 30 carbon atoms) ), heteroaryloxy group (preferably a heteroaryloxy group having 1 to 30 carbon atoms), hydroxyl group (preferably a hydroxyl group having 2 to 30 carbon atoms), alkoxycarbonyl group (preferably a hydroxyl group having 2 to 30 carbon atoms) 30 alkoxycarbonyl group), aryloxycarbonyl group (preferably an aryloxycarbonyl group with 7 to 30 carbon atoms), heteroaryloxycarbonyl group (preferably an aryloxycarbonyl group with 2 to 30 carbon atoms), acyloxy group (preferably a acyloxy group having 2 to 30 carbon atoms), amide group (preferably a amide group having 2 to 30 carbon atoms), aminocarbonylamino group (preferably having 2 to 30 carbon atoms) aminocarbonylamino group), alkoxycarbonylamino group (preferably alkoxycarbonylamino group having 2 to 30 carbon atoms), aryloxycarbonylamino group (preferably aryloxycarbonylamino group having 7 to 30 carbon atoms) (carbonylamino group), sulfonamide group (preferably sulfonamide group with 0 to 30 carbon atoms), sulfonamide group (preferably sulfonamide group with 0 to 30 carbon atoms), Aminomethyl group (preferably an aminomethyl group having 1 to 30 carbon atoms), alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), arylthio group (preferably having 6 to 30 carbon atoms) arylthio group), heteroarylthio group (preferably a heteroarylthio group with 1 to 30 carbon atoms), alkylsulfonyl group (preferably an alkylsulfonyl group with 1 to 30 carbon atoms), alkyl group Sulfonylamine group (preferably an alkylsulfonylamine group having 1 to 30 carbon atoms), arylsulfonylamine group (preferably an arylsulfonylamine group having 6 to 30 carbon atoms), arylsulfonylamine group Amino group (preferably an arylsulfonylamine group with 6 to 30 carbon atoms), heteroarylsulfonyl group (preferably a heteroarylsulfonylamine group with 1 to 30 carbon atoms), heteroarylsulfonyl group Cylamine group (preferably a heteroarylsulfonylamine group having 1 to 30 carbon atoms), alkylsulfenylamine group (preferably an alkylsulfenylamine group having 1 to 30 carbon atoms), aryl group Sulfenyl group (preferably an arylsulfenyl group having 6 to 30 carbon atoms), heteroarylsulfenyl group (preferably a heteroarylsulfenyl group having 1 to 30 carbon atoms), urea group (preferably a urea group having 1 to 30 carbon atoms), hydroxyl group, nitro group, carboxyl group, sulfo group, phosphate group, carboxylic acid amide group, sulfonyl amide group, amide group, phosphine group, mercapto group, cyano group , Alkylsulfinate group, arylsulfinate group, aryl azo group, heteroarylazo group, phosphinyl group, phosphinyloxy group, phosphinylamine group, silicon group, hydrazine group, imine group. When these groups are further substituted groups, they may further have a substituent. Examples of the substituent include the groups described for the above-mentioned substituent T.

The pigment represented by formula (1) is preferably a pigment represented by formula (1-1). The pigment represented by formula (1-1) is also a compound of the present invention. [Chemical Formula 7] In formula (1-1), Y ¹ and Y ² independently represent -C (=O)-, -SO ₂ - or -C (=S)NH-, and Ra ¹ and Ra ² independently represent electron pulling. group, Rb ¹ and Rb ² independently represent a hydrogen atom or a substituent, X ¹ represents a single bond or a divalent linking group, R ² , R ³ , R ⁸ and R ⁹ each independently represent a hydrogen atom, an alkyl group or a substituent. Aryl group, R ¹ , R ⁴ , R ⁵ , R ⁶ , R ⁷ and R ¹⁰ each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, a halogen atom or a hydroxyl group, R ¹ and R ² can be linked to each other. To form a ring, R ² and R ³ can be connected to each other to form a ring, R ³ and R ⁴ can be connected to each other to form a ring, R ⁷ and R ⁸ can be connected to each other to form a ring, and R ⁸ and R ⁹ can be connected to each other to form a ring. Ring, R ⁹ and R ¹⁰ may be linked to each other to form a ring.

^The meanings ^{of Y 1} , Y ^{2 ,} Ra ^{1 ,} Ra ² , Rb ¹ , ^{Rb 2 ,} 1) ^Y1 , ^Y2 , ^Ra1 , Ra2, ^Rb1 , ^Rb2 , ^X1 , ^R1 , ^R2 , ^R3 , ^R8 , ^R9 and ^R10 have the same meaning, and the preferred ranges are ^also the same .

The alkyl group, alkoxy group, aryl group and halogen atom represented by R ⁴ , R ⁵ , R ⁶ and R ⁷ in the formula (1-1) have the same meaning as the alkane represented by R ¹ and R ¹⁰ in the formula (1). The meanings of radical, alkoxy group, aryl group and halogen atom are the same, and the preferred ranges are also the same.

In formula (1-1), R ¹ and R ² may be connected to each other to form a ring, R ² and R ³ may be connected to each other to form a ring, R ³ and R ⁴ may be connected to each other to form a ring, and R ⁷ and R ⁸ may be connected to each other to form a ring. R ⁸ and R ⁹ may be connected to each other to form a ring, and R ⁹ and R ¹⁰ may be connected to each other to form a ring. The formed ring may be an aromatic ring or a non-aromatic ring. In addition, the ring formed may be a single ring or a condensed ring. The formed ring is preferably a 5-member ring or a 6-member ring. Moreover, the ring formed may have a substituent. Examples of the substituent include the substituent T mentioned below, which is selected from the group consisting of an alkyl group, an aryl group, a heteroaryl group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group, and an amino group. At least one of them is preferred.

In the formula (1-1), R ³ and R ⁴ and R ⁷ and R ⁸ are preferably connected to each other to form a ring, and more preferably to form a 5-membered ring or a 6-membered ring.

The pigment represented by formula (1-1) is preferably a pigment represented by formula (2). The pigment represented by formula (2) is also a compound of the present invention. [Chemical formula 8] In formula (2), Y ¹ and Y ² independently represent -C(=O)-, -SO ₂ - or -C(=S)NH-, and Ra ¹ and Ra ² independently represent an electron-withdrawing group. , Rb ¹ and Rb ² independently represent a hydrogen atom or a substituent, X ¹ represents a single bond or a divalent linking group, R ¹ , R ⁵ , R ⁶ and R ¹⁰ respectively independently represent a hydrogen atom, an alkyl group, and an alkoxy group, aryl group, halogen atom or hydroxyl group, R ¹¹ and R ¹⁶ independently represent an alkyl group or an aryl group, R ¹² , R 13 , R ¹⁴ , R ¹⁵ , R ¹⁷ , ^{R 18 ,} R ¹⁹ and R ²⁰ are respectively independent represents a hydrogen atom, an alkyl group, an alkoxy group or an aryl group, R ¹³ and R ¹⁴ may be linked to each other to form a ring, and R ¹⁸ and R ¹⁹ may be linked to each other to form a ring.

The meanings of Y ¹ , Y ² , Ra ¹ , Ra 2 , Rb ¹ , Rb ² , X ¹ , ^{R 1 ,} R ⁵ , R ⁶ and R ¹⁰ in the formula (2) are the same as those of Y ¹ and Y ² , Ra ¹ , Ra ² , Rb ¹ , Rb ² , X ¹ , R ¹ , R ⁵ , R ⁶ and R ¹⁰ have the same meaning, and the preferred ranges are also the same.

The carbon number of the alkyl group represented by R ¹¹ to R ²⁰ in the formula (2) is preferably 1 to 30, more preferably 1 to 20, and further preferably 1 to 10. The alkyl group may be straight chain, branched chain or cyclic, with straight chain or branched chain being more preferred. The alkyl group may have a substituent. Examples of the substituent include the groups listed in the above-mentioned substituent T, selected from the group consisting of an aryl group, a heteroaryl group, a halogen atom, an alkoxy group, an amino group, a hydroxyl group, a cyano group, a nitro group, a sulfonyl group, At least one kind from the group consisting of carboxyl group, acyl group and sulfonamide group is preferred.

The carbon number of the aryl group represented by R ¹¹ to R ²⁰ in the formula (2) is preferably 6 to 40, more preferably 6 to 30, and further preferably 6 to 20. The aryl group may have a substituent. Examples of the substituent include the groups listed in the above-mentioned substituent T, selected from the group consisting of an alkyl group, a heteroaryl group, a halogen atom, an alkoxy group, an amino group, a hydroxyl group, a cyano group, a nitro group, a sulfonyl group, At least one kind from the group consisting of carboxyl group, acyl group and sulfonamide group is preferred.

The carbon number of the alkoxy group represented by R ¹² , R ¹³ , R ¹⁴ , R ¹⁵ , R ¹⁷ , R ¹⁸ , R ¹⁹ and R ²⁰ in the formula (2) is preferably 1 to 30, and more preferably 1 to 20. Best, 1 to 10 are further better. The alkoxy group is preferably straight chain or branched chain. The alkoxy group may have a substituent. Examples of the substituent include the groups listed in the above-mentioned substituent T, selected from the group consisting of an aryl group, a heteroaryl group, a halogen atom, an amino group, a hydroxyl group, a cyano group, a nitro group, a sulfonyl group, a carboxyl group, and a hydroxyl group. At least one of the group consisting of a sulfonamide group and a sulfonamide group is preferred.

In the formula (2), R ¹³ and R ¹⁴ may be connected to each other to form a ring, and R ¹⁸ and R ¹⁹ may be connected to each other to form a ring. The formed ring may be an aromatic ring or a non-aromatic ring. In addition, the ring formed may be a single ring or a condensed ring. The formed ring is preferably a 5-member ring or a 6-member ring. Moreover, the ring formed may have a substituent. Examples of the substituent include the above-mentioned substituent T, which is selected from the group consisting of an alkyl group, an aryl group, a heteroaryl group, a halogen atom, a sulfo group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a phosphate group and an amino group. At least one of them is preferred.

Furthermore, the dye represented by Formula (1) may contain a compound having a resonance relationship. However, in the present invention, the dye represented by Formula (1) also includes its resonance structure. That is, the compound of the resonance structure of Formula (1) is also included in the specific dye of this invention. Examples of compounds having a resonance relationship with the dye represented by formula (1) include compounds represented by the following formulas (1a) and (1b). [Chemical formula 9]

It is preferable that the maximum absorption wavelength of the specific dye exists at a wavelength of 650 nm or above, more preferably within a wavelength range of 650 to 1500 nm, further preferably a wavelength range of 660 to 1200 nm, and a wavelength range of 660 to 1000 nm. The inside is especially good.

Furthermore, regarding a specific dye, when the absorbance value at the wavelength (λmax) showing the maximum absorbance in the wavelength range of 400 nm to 1200 nm is set to 1, the average absorbance value in the wavelength range of 440 to 475 nm is not It is better if it reaches 0.007, it is better if it does not reach 0.005, and it is further better if it does not reach 0.0035.

The value of the absorbance and maximum absorption wavelength of the specific dye can be determined by preparing a dye solution by dissolving the specific dye in a solvent and measuring the absorbance of the dye solution. Examples of the solvent used to prepare the pigment solution include chloroform, dimethylstyrene (DMSO), tetrahydrofuran (THF), and the like. When the specific dye is a compound dissolved in chloroform, chloroform is used as the solvent. When the specific dye is a compound that is insoluble in chloroform but soluble in dimethylsulfoxide (DMSO) or tetrahydrofuran (THF), dimethylsulfoxide (DMSO) or tetrahydrofuran (THF) is used as the solvent.

Regarding specific pigments, when environmental protection is considered, compounds having a structure that does not contain fluorine atoms are also preferred.

Specific examples of the specific dye include dyes SQ-1 to SQ-19 described in the examples described below.

The content of the specific pigment is preferably 0.5 mass% or more in the total solid content of the composition, more preferably 3 mass% or more, and still more preferably 5 mass% or more. Furthermore, the upper limit of the content of the specific compound is preferably 50 mass% or less, more preferably 40 mass% or less, and further preferably 30 mass% or less. The composition may contain only one specific pigment, or may contain two or more specific pigments. When two or more types are contained, the total amount is preferably within the above range.

The composition of the present invention may contain decomposition products of the specific pigment or impurities during synthesis. Examples of such a compound include a compound represented by formula (100) or a compound represented by formula (101).

[Chemical formula 10]

The meanings of Y ^1a and Y ^1b in the formula (100) are the same as the meaning of Y ¹ in the formula (1). The meanings of Y ^2a and Y ^2b in the formula (100) are the same as the meaning of Y ² in the formula (1). The meanings of Ra ^1a , Ra ^1b , Ra ^2a and Ra ^2b in the formula (100) are the same as the meanings of Ra ¹ and Ra ² in the formula (1). The meanings of Rb ^1a , Rb ^1b , Rb ^2a and Rb ^2b in the formula (100) are the same as the meanings of Rb ¹ and Rb ² in the formula (1). The meanings of R ^1a and R ^1b in the formula (100) are the same as the meaning of R ¹ in the formula (1). The meanings of R ^2a and R ^2b in the formula (100) are the same as the meaning of R ² in the formula (1). The meanings of R ^3a and R ^3b in the formula (100) are the same as the meaning of R ³ in the formula (1). The meanings of R ^8a and R ^8b in the formula (100) are the same as the meaning of R ⁸ in the formula (1). The meanings of R ^9a and R ^9b in the formula (100) are the same as the meaning of R ⁹ in the formula (1). The meanings of R ^10a and R ^10b in the formula (100) are the same as the meaning of R ¹⁰ in the formula (1). The meanings of L ^1a and L ^1b in the formula (100) are the same as the meaning of L ¹ in the formula (1). The meanings of L ^2a and L ^2b in the formula (100) are the same as the meaning of L ² in the formula (1).

[Chemical formula 11]

The meaning of Y ^1c in Formula (101) is the same as the meaning of Y ¹ in Formula (1). The meaning of Y ^2c in the formula (101) is the same as the meaning of Y ² in the formula (1). The meanings of Ra ^1c and Ra ^2c in the formula (101) are the same as the meanings of Ra ¹ and Ra ² in the formula (1). The meanings of Rb ^1c and Rb ^2c in the formula (101) are the same as the meanings of Rb ¹ and Rb ² in the formula (1). The meanings of R ^1c and R ^1d in the formula (101) are the same as the meaning of R ¹ in the formula (1). The meanings of R ^2c and R ^2d in the formula (101) are the same as the meaning of R ² in the formula (1). The meanings of R ^3c and R ^3d in the formula (101) are the same as the meaning of R ³ in the formula (1). The meanings of L ^1c and L ^1c in the formula (101) are the same as the meaning of L ¹ in the formula (1).

＜＜Hardening compound＞＞ The composition of the present invention contains a curable compound. Examples of curable compounds include polymerizable compounds, resins, and the like. The resin may be a non-polymerizable resin (a resin without a polymerizable group) or a polymerizable resin (a resin with a polymerizable group). Examples of the polymerizable group include a group containing an ethylenically unsaturated bond, a cyclic ether group, a hydroxymethyl group, an alkoxymethyl group, and the like. Examples of the group containing an ethylenically unsaturated bond include vinyl, vinylphenyl, (meth)allyl, (meth)acrylyl, (meth)acryloxy, and (meth)acrylyl. ) acrylamide group, etc., (meth)allyl, (meth)acrylyl and (meth)acryloxy groups are preferred, and (meth)acryloxy group is more preferred. Examples of the cyclic ether group include an epoxy group, an oxetanyl group, and the like, with an epoxy group being preferred.

As the curing compound, it is preferable to use one containing at least resin. Furthermore, when the composition of the present invention is used as a composition for photolithography, it is preferable to use a resin and a polymerizable monomer (monomer type polymerizable compound) as the curable compound. A resin and a resin having an ethylenically unsaturated The bonding group is preferably a polymerizable monomer (monomer type polymerizable compound).

(polymeric compound) Examples of the polymerizable compound include compounds having an ethylenically unsaturated bond-containing group, compounds having a cyclic ether group, compounds having a hydroxymethyl group, and compounds having an alkoxymethyl group. A compound having an ethylenically unsaturated bond-containing group can be preferably used as a radically polymerizable compound. Moreover, the compound which has a cyclic ether group can be suitably used as a cationic polymerizable compound.

Examples of resin-type polymerizable compounds include resins containing repeating units having a polymerizable group.

The molecular weight of the monomer-type polymerizable compound (polymerizable monomer) is preferably less than 2,000, and more preferably not more than 1,500. The lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, and more preferably 200 or more. The weight average molecular weight (Mw) of the resin type polymerizable compound is preferably 2,000 to 2,000,000. The upper limit of the weight average molecular weight is preferably 1,000,000 or less, more preferably 500,000 or less. The lower limit of the weight average molecular weight is preferably 3,000 or more, and more preferably 5,000 or more.

Furthermore, the compound having an ethylenically unsaturated bond-containing group as the polymerizable monomer is preferably a 3- to 15-functional (meth)acrylate compound, and a 3- to 6-functional (meth)acrylate compound is preferably Better. Specific examples include Paragraphs 0095 to 0108 of Japanese Patent Application Laid-Open No. 2009-288705, Paragraph 0227 of Japanese Patent Application Laid-Open No. 2013-029760, Paragraphs 0254 to 0257 of Japanese Patent Application Laid-Open No. 2008-292970, and Paragraphs 0254 to 0257 of Japanese Patent Application Laid-Open No. 2008-292970. Paragraphs 0034 to 0038 of Publication No. 2013-253224, Paragraph 0477 of Japanese Patent Publication No. 2012-208494, Japanese Patent Publication No. 2017-048367, Japanese Patent Publication No. 6057891, Japanese Patent Publication No. 6031807, Japanese Patent Publication No. 2017 -Compounds described in Publication No. 194662, the contents of which are incorporated into this specification.

Examples of the compound having an ethylenically unsaturated bond-containing group include dipenterythritol tri(meth)acrylate (commercially available product, KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), Dineopenterythritol tetra(meth)acrylate (commercially available product, KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), dipenterythritol penta(meth)acrylate (commercially available product) , KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipenterythritol hexa(meth)acrylate (commercially available, KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., NK ESTER A- DPH-12E; manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.) and compounds in which the (meth)acrylyl group of these compounds is bonded via ethylene glycol and/or propylene glycol residues (for example, manufactured by SARTOMER Company, Inc. .Commercially available SR454, SR499), etc. Furthermore, as a compound having an ethylenically unsaturated bond-containing group, diglycerol EO (ethylene oxide) modified (meth)acrylate (commercially available, M-460; TOAGOSEI CO., Ltd.), neopentyl tetraacrylate (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd., NK ESTER A-TMMT), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd. , KAYARAD HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), ARONIX TO-2349 (manufactured by TOAGOSEI CO., LTD.), NK Oligo UA-7200 (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.) , 8UH-1006, 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), LIGHT ACRYLATE POB-A0 (manufactured by KYOEISHA CHEMICAL Co., Ltd.), etc.

Furthermore, as the compound having an ethylenically unsaturated bond-containing group, trimethylolpropane tri(meth)acrylate, trimethylolpropane epoxypropane-modified tri(meth)acrylate, and trihydroxypropane tri(meth)acrylate are used. Methylpropane ethylene oxide modified tri(meth)acrylate, isocyanuric acid ethylene oxide modified tri(meth)acrylate, neopentylerythritol tri(meth)acrylate, etc. 3 functional (meth)acrylate compounds are also preferred. Commercially available products of trifunctional (meth)acrylate compounds include ARONIX M-309, M-310, M-321, M-350, M-360, M-313, M-315, M- 306, M-305, M-303, M-452, M-450 (manufactured by TOAGOSEI CO., LTD.), NK ESTER A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A -TMM-3L, A-TMM-3LM-N, A-TMPT, TMPT (manufactured by SHIN-NAKAMURA CHEMICAL Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 ( Manufactured by Nippon Kayaku Co., Ltd.), etc.

The compound having an ethylenically unsaturated bond-containing group may further have an acid group such as a carboxyl group, a sulfo group, or a phosphate group. Commercially available products of such compounds include ARONIX M-305, M-510, M-520, ARONIX TO-2349 (manufactured by TOAGOSEI CO., LTD.), and the like.

As the compound having an ethylenically unsaturated bond-containing group, a compound having a caprolactone structure can also be used. Regarding the compound having a caprolactone structure, please refer to the description in paragraphs 0042 to 0045 of Japanese Patent Application Laid-Open No. 2013-253224, which content is incorporated into this specification. Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, and DPCA-120 commercially available from Nippon Kayaku Co., Ltd.

As the compound having an ethylenically unsaturated bond-containing group, a compound having an ethylenically unsaturated bond-containing group and an alkyloxy group can also be used. Such compounds are preferably compounds having a group containing an ethylenically unsaturated bond and a vinyloxy group and/or a propyleneoxy group, and more preferably a compound having a group containing an ethylenically unsaturated bond and an vinyloxy group. , 3-6 functional (meth)acrylate compounds having 4-20 vinyloxy groups are further preferred. Examples of commercially available products include SR-494, a tetrafunctional (meth)acrylate having four vinyloxy groups manufactured by SARTOMER Company, Inc., and SR-494, a tetrafunctional (meth)acrylate having three isobutyleneoxy groups manufactured by Nippon Kayaku Co., Ltd. (isobutyleneoxy) 3-functional (meth)acrylate KAYARAD TPA-330, etc.

As the compound having an ethylenically unsaturated bond-containing group, a polymerizable compound having a fluorine skeleton can also be used. Examples of commercially available products include OGSOL EA-0200 and EA-0300 ((meth)acrylate monomer having a fluorine skeleton, manufactured by Osaka Gas Chemicals Co., Ltd.).

As the compound having an ethylenically unsaturated bond-containing group, it is also preferred to use a compound that does not substantially contain environmentally controlled substances such as toluene. Commercially available products of such compounds include KAYARAD DPHA LT, KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.), and the like.

Examples of the compound having a cyclic ether group include compounds having an epoxy group, compounds having an oxetanyl group, and the like, and compounds having an epoxy group are preferred. Examples of the compound having an epoxy group include compounds having 1 to 100 epoxy groups in one molecule. The upper limit of the number of epoxy groups can be, for example, 10 or less, or 5 or less. The lower limit of the number of epoxy groups is preferably 2 or more.

The compound with a cyclic ether group can be a low molecular compound (for example, the molecular weight is less than 1000), or it can be a macromolecule compound (for example, the molecular weight is more than 1000. When it is a polymer, the weight average molecular weight is 1000 or more). The weight average molecular weight of the cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and still more preferably 3,000 or less.

As the compound having a cyclic ether group, compounds described in paragraphs 0034 to 0036 of Japanese Patent Application Publication No. 2013-011869, compounds described in paragraphs 0147 to 0156 of Japanese Patent Application Publication No. 2014-043556, and compounds described in Japanese Patent Application Publication No. 2014-043556 can also be used. Compounds described in paragraphs 0085 to 0092 of Japanese Patent Application Publication No. 2014-089408, and compounds described in Japanese Patent Application Publication No. 2017-179172.

Examples of commercially available compounds having a cyclic ether group include DENACOL EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX -850L, EX-850 (the above are manufactured by Nagase ChemteX Corporation), ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, EP-4011S (the above are manufactured by ADEKA CORPORATION), NC-2000, NC-3000, NC- 7300, P ACA 200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z300, ACA Z320 (the above are manufactured by Daicel Corporation), jER1031S, jER157S65, jER152, jER154, jER157S70 (the above are manufactured by Mitsubishi Chemical Corporation), ARONE OXETANE OXT-121, OXT-221, OX-SQ, PNOX (the above are manufactured by TOAGOSEI CO., LTD.), ADEKA GLYCIROL ED-505 (manufactured by ADEKA CORPORATION, containing epoxy monomer), Marproof G-0150M, G-0105SA, G- 0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (manufactured by NOF CORPORATION, containing epoxy polymer), OXT-101, OXT-121, OXT-212, OXT-221 (the above are manufactured by TOAGOSEI CO., LTD., containing oxetane-based monomers), OXE-10, OXE-30 (the above are manufactured by OSAKA ORGANIC CHEMICAL INDUSTRY LTD., containing oxetane) cyclobutyl monomer), etc.

Examples of the compound having a hydroxymethyl group (hereinafter also referred to as a hydroxymethyl compound) include a compound in which a hydroxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Examples of the compound having an alkoxymethyl group (hereinafter also referred to as an alkoxymethyl compound) include a compound in which an alkoxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. As a compound in which alkoxymethyl or hydroxymethyl is bonded to a nitrogen atom, alkoxymethylated melamine, hydroxymethylated melamine, alkoxymethylated benzoguanamine, hydroxymethylated benzoguanamine Amine, alkoxymethylated glycoluril, hydroxymethylated glycoluril, alkoxymethylated urea, hydroxymethylated urea, etc. are preferred. In addition, compounds described in paragraphs 0134 to 0147 of Japanese Patent Application Laid-Open No. 2004-295116 and paragraphs 0095 to 0126 of Japanese Patent Application Laid-Open No. 2014-089408 can also be used.

(resin) The composition of the present invention can use resin as the curable compound. It is preferable to use a curable compound containing at least resin. For example, the resin is blended for the purpose of dispersing pigments in the composition and the purpose of a binder. In addition, resins mainly used to disperse pigments and the like in compositions are also called dispersants. However, this type of use of the resin is an example, and the resin can be used for purposes other than such uses. In addition, a resin having a polymerizable group also corresponds to a polymerizable compound.

The weight average molecular weight of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, and even more preferably 500,000 or less. A lower limit of 4,000 or more is preferred, and a lower limit of 5,000 or more is even better.

Examples of the resin include (meth)acrylic resin, epoxy resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polystyrene resin, polyetherstyrene resin, polyphenylene resin, Polyarylene ether phosphine oxide resin, polyimide resin, polyamide resin, polyamide imine resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, vinyl acetate resin, Polyvinyl alcohol resin, polyvinyl acetal resin, polyurethane resin, polyurea resin, etc. Among these resins, one type may be used alone, or two or more types may be mixed and used. As the cyclic olefin resin, norbornene resin is preferred from the viewpoint of improving heat resistance. Examples of commercially available norbornene resins include the ARTON series (for example, ARTON F4520) manufactured by JSR Corporation. In addition, as the resin, the resin described in the Examples of International Publication No. 2016/088645, the resin described in Japanese Patent Application Laid-Open No. 2017-057265, the resin described in Japanese Patent Application Laid-Open No. 2017-032685, and the Japanese Patent Application Publication No. 2017-032685 can also be used. The resin described in Japanese Patent Application Publication No. 2017-075248, the resin described in Japanese Patent Application Publication No. 2017-066240, the resin described in Japanese Patent Application Publication No. 2017-167513, the resin described in Japanese Patent Application Publication No. 2017-173787 , the resin described in paragraphs 0041 to 0060 of Japanese Patent Application Publication No. 2017-206689, the resin described in paragraphs 0022 to 0071 of Japanese Patent Application Publication No. 2018-010856, and the block described in Japanese Patent Application Publication No. 2016-222891 Polyisocyanate resin, resin described in Japanese Patent Application Publication No. 2020-122052, resin described in Japanese Patent Application Publication No. 2020-111656, resin described in Japanese Patent Application Publication No. 2020-139021, Japanese Patent Application Publication No. 2017-138503 The resin described in the publication contains a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain. In addition, as the resin, a resin having a skeleton can also be suitably used. Regarding the resin having a tungsten skeleton, please refer to the description of US Patent Application Publication No. 2017/0102610, which content is incorporated into this specification. In addition, as the resin, the resin described in paragraphs 0199 to 0233 of Japanese Patent Application Laid-Open No. 2020-186373, the alkali-soluble resin described in Japanese Patent Application Laid-Open No. 2020-186325, and Korean Patent Publication No. 10-2020-0078339 can also be used. The resin represented by formula 1 described in the publication No.

As the resin, it is preferable to use a resin having an acid group. Examples of acidic groups include carboxyl groups, phosphate groups, sulfo groups, phenolic hydroxyl groups, and the like. There may be only one type of these acid groups, or two or more types of them. Resins with acid groups can also be used as dispersants. The acid value of the resin with acid groups is preferably 30 to 500 mgKOH/g. The lower limit is preferably 50 mgKOH/g or more, and more preferably 70 mgKOH/g or more. The upper limit is preferably 400 mgKOH/g or less, more preferably 200 mgKOH/g or less, further preferably 150 mgKOH/g or less, and most preferably 120 mgKOH/g or less.

The resin includes a resin containing a repeating unit derived from a compound represented by formula (ED1) and/or a compound represented by formula (ED2) (hereinafter, these compounds may also be referred to as "ether dimers"). Also better.

[Chemical formula 12]

In the formula (ED1), R ¹ and R ² each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent. [Chemical formula 13] In formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. As a specific example of Formula (ED2), refer to the description of Japanese Patent Application Laid-Open No. 2010-168539.

Regarding specific examples of ether dimers, refer to paragraph 0317 of Japanese Patent Application Laid-Open No. 2013-029760, and this content is incorporated into this specification.

As the resin, it is also preferable to use a resin having a polymerizable group. The polymerizable group is preferably a group containing an ethylenically unsaturated bond and a cyclic ether group, and more preferably a group containing an ethylenically unsaturated bond.

As the resin, it is also preferable to use a resin containing a repeating unit derived from a compound represented by formula (X). [Chemical formula 14] In the formula, R ¹ represents a hydrogen atom or a methyl group, R ²¹ and R ²² each independently represent an alkylene group, and n represents an integer of 0 to 15. The number of carbon atoms in the alkylene group represented by R ²¹ and R ²² is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 3, and particularly preferably 2 or 3. n represents an integer of 0 to 15, and an integer of 0 to 5 is preferred, an integer of 0 to 4 is more preferred, and an integer of 0 to 3 is further preferred.

Examples of the compound represented by formula (X) include ethylene oxide or propylene oxide modified (meth)acrylate of para-cumyl phenol. Examples of commercially available products include ARONIX M-110 (manufactured by TOAGOSEI CO., LTD.) and the like.

It is also preferred that the resin contains a resin as a dispersant. Examples of the dispersant include acidic dispersants (acidic resins) and alkaline dispersants (basic resins). Here, the acidic dispersant (acidic resin) means a resin in which the amount of acid groups is greater than the amount of base groups. As an acidic dispersant (acidic resin), when the total amount of acid groups and base groups is 100 mol%, a resin having an acid group amount of 70 mol% or more is preferred. It is preferable that the acidic group of the acidic dispersant (acidic resin) is a carboxyl group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH/g. In addition, the alkaline dispersant (alkaline resin) means a resin in which the amount of base groups is greater than the amount of acid groups. As an alkaline dispersant (basic resin), when the total amount of acid groups and bases is 100 mol%, a resin in which the amount of bases exceeds 50 mol% is preferred. The alkaline dispersant preferably has an amine group as its base.

It is also preferred that the resin used as the dispersant is a graft resin. For details of the graft resin, please refer to the description in paragraphs 0025 to 0094 of Japanese Patent Application Laid-Open No. 2012-255128, and this content is incorporated into this specification.

It is also preferred that the resin used as the dispersant is a polyimine-based dispersant containing a nitrogen atom in at least one of its main chain and side chain. As the polyimine-based dispersant, a resin having a main chain and a side chain and a basic nitrogen atom in at least one of the main chain and side chain is preferred. The main chain contains a partial structure having a functional group of pKa 14 or less. , the number of atoms in the side chain is 40 to 10,000. The basic nitrogen atom is not particularly limited as long as it is a basic nitrogen atom. Regarding the polyimine dispersant, please refer to the description in paragraphs 0102 to 0166 of Japanese Patent Application Laid-Open No. 2012-255128, and this content is incorporated into this specification.

It is also preferred that the resin used as the dispersant has a structure in which a plurality of polymer chains are bonded to the core. Examples of such resins include dendritic polymers (including star polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of Japanese Patent Application Laid-Open No. 2013-043962.

The resin used as a dispersant is also preferably a resin containing a repeating unit having a group containing an ethylenically unsaturated bond in a side chain. The content of the repeating unit having an ethylenically unsaturated bond-containing group in the side chain is preferably 10 mol% or more in all the repeating units of the resin, more preferably 10 to 80 mol%, and 20 to 70 mol%. Ear% is further preferred.

In addition, as the dispersant, the resin described in Japanese Patent Application Laid-Open No. 2018-087939 and the block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6432077 can also be used. ), the polyethyleneimine having a polyester side chain described in International Publication No. 2016/104803, the block copolymer described in International Publication No. 2019/125940, the polyethylene imine described in Japanese Patent Application Laid-Open No. 2020-066687 Block polymers with acrylamide structural units, block polymers with acrylamide structural units described in Japanese Patent Application Laid-Open No. 2020-066688, etc.

Dispersants are also available as commercial products, and specific examples thereof include DISPERBYK series manufactured by BYK-Chemie GmbH, SOLSPERSE series manufactured by Japan Lubrizol Corporation, Efka series manufactured by BASF Corporation, and Ajinomoto Fine-Techno Co., Inc. Production of Ajispar series, etc. In addition, the products described in Paragraph 0129 of Japanese Patent Application Laid-Open No. 2012-137564 and the products described in Paragraph 0235 of Japanese Patent Application Laid-Open No. 2017-194662 can also be used as the dispersant.

The content of the curable compound is preferably 1 to 95% by mass of the total solid content of the composition. The lower limit is preferably 2 mass% or more, more preferably 5 mass% or more, still more preferably 7 mass% or more, and particularly preferably 10 mass% or more. The upper limit is preferably 94 mass% or less, more preferably 90 mass% or less, further preferably 85 mass% or less, and particularly preferably 80 mass% or less.

When the composition of the present invention contains a polymerizable compound as a curable compound, the content of the polymerizable compound is preferably 1 to 85% by mass of the total solid content of the composition. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and still more preferably 5 mass% or more. The upper limit is preferably 80 mass% or less, and more preferably 70 mass% or less.

When the composition of the present invention contains a polymerizable monomer as a curable compound, the content of the polymerizable monomer is preferably 1 to 50% by mass in the total solid content of the composition. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and still more preferably 5 mass% or more. The upper limit is preferably 30 mass% or less, and more preferably 20 mass% or less.

When the composition of the present invention contains a compound having an ethylenically unsaturated bond-containing group as the curing compound, the content of the compound having an ethylenically unsaturated bond-containing group in the total solid content of the composition is 1 to 70 Mass% is better. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and still more preferably 5 mass% or more. The upper limit is preferably 65 mass% or less, and more preferably 60 mass% or less.

When the composition of the present invention contains a resin as a curable compound, the content of the resin is preferably 1 to 85% by mass of the total solid content of the composition. The lower limit is preferably 2 mass% or more, more preferably 5 mass% or more, still more preferably 7 mass% or more, and particularly preferably 10 mass% or more. The upper limit is preferably 80 mass% or less, more preferably 75 mass% or less, still more preferably 70 mass% or less, and particularly preferably 40 mass% or less.

When the composition of the present invention contains a resin as a dispersant, the content of the resin as a dispersant is preferably 0.1 to 40% by mass in the total solid content of the composition. The upper limit is preferably 25% by mass or less, and further preferably 20% by mass or less. It is more preferable that the lower limit is 0.5 mass % or more, and it is further more preferable that it is 1 mass % or more. Moreover, it is preferable that the content of the resin as a dispersant is 1 to 100 parts by mass relative to 100 parts by mass of the above-mentioned specific dye. The upper limit is preferably 80 parts by mass or less, and more preferably 75 parts by mass or less. The lower limit is preferably 2.5 parts by mass or more, and more preferably 5 parts by mass or more.

The composition of the present invention may contain only one type of curable compound, or may contain two or more types. When two or more types of curable compounds are contained, the total amount is preferably within the above range.

<<Other infrared absorbers>> The composition of the present invention can contain infrared absorbers (other infrared absorbers) other than the above-mentioned specific dye. By further containing other infrared absorbers, a film capable of blocking infrared rays in a wider wavelength range can be formed. Other infrared absorbers can be dyes or pigments (particles). Examples of other infrared absorbers include pyrrolopyrrole compounds, cyanine compounds, squaraine compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, merocyanine compounds, and quinonium compounds. , oxocyanine compounds, immonium compounds, dithiol compounds, triarylmethane compounds, pyrrromethylene compounds, azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, disulfene metal complexes materials, metal oxides, metal borides, etc. Examples of the pyrrolopyrrole compound include compounds described in paragraphs 0016 to 0058 of Japanese Patent Application Laid-Open No. 2009-263614, compounds described in paragraphs 0037 to 0052 of Japanese Patent Application Laid-Open No. 2011-068731, and International Publication No. 2015/ Compounds described in paragraphs 0010 to 0033 of No. 166873, etc. Examples of the squaraine compound include compounds described in paragraphs 0044 to 0049 of Japanese Patent Publication No. 2011-208101, compounds described in paragraphs 0060 to 0061 of Japanese Patent Publication No. 6065169, and International Publication No. 2016/181987. Compounds described in paragraph 0040 of Japanese Patent Application Laid-Open No. 2015-176046, compounds described in paragraph 0072 of International Publication No. 2016/190162, compounds described in paragraphs 0196 to 0228 of Japanese Patent Application Laid-Open No. 2016-074649 Compounds described, compounds described in paragraph 0124 of Japanese Patent Application Laid-Open No. 2017-067963, compounds described in International Publication No. 2017/135359, compounds described in Japanese Patent Application Publication No. 2017-114956, Japanese Patent Application No. 6197940 Compounds described in, Compounds described in International Publication No. 2016/120166, etc. Examples of the cyanine compound include compounds described in paragraphs 0044 to 0045 of Japanese Patent Application Laid-Open No. 2009-108267, compounds described in paragraphs 0026 to 0030 of Japanese Patent Application Publication No. 2002-194040, and compounds described in Japanese Patent Application Laid-Open No. 2015-172004. Compounds described in Japanese Patent Application Publication No. 2015-172102, Compounds described in Japanese Patent Application Publication No. 2008-088426, Compounds described in Paragraph 0090 of International Publication No. 2016/190162, Japanese Patent Application Publication No. 2016/190162 Compounds etc. described in the publication No. 2017-031394. Examples of the crotonium compound include compounds described in Japanese Patent Application Laid-Open No. 2017-082029. Examples of the immonium compound include compounds described in Japanese Patent Application Publication No. 2008-528706, compounds described in Japanese Patent Application Publication No. 2012-012399, compounds described in Japanese Patent Application Publication No. 2007-092060, and International Publications. Compounds described in paragraphs 0048 to 0063 of No. 2018/043564. Examples of the phthalocyanine compound include the compound described in paragraph 0093 of Japanese Patent Application Laid-Open No. 2012-077153, titanyl phthalocyanine described in Japanese Patent Application Laid-Open No. 2006-343631, and 0013 of Japanese Patent Application Laid-Open No. 2013-195480. The compound described in paragraph ～0029, the vanadium phthalocyanine compound described in Japanese Patent No. 6081771, and the compound described in International Publication No. 2020/071470. Examples of the naphthalocyanine compound include compounds described in paragraph 0093 of Japanese Patent Application Laid-Open No. 2012-077153. Examples of the disulfene metal complex include compounds described in Japanese Patent No. 5733804. Examples of metal oxides include indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, tungsten oxide, and the like. For details about tungsten oxide, you can refer to paragraph 0080 of Japanese Patent Application Laid-Open No. 2016-006476, and this content is incorporated into this specification. Examples of the metal boride include lanthanum boride and the like. Examples of commercially available lanthanum boride include LaB ₆ -F (manufactured by Japan New Metals Co., Ltd.). In addition, as the metal boride, the compound described in International Publication No. 2017/119394 can also be used. Examples of commercially available products of indium tin oxide include F-ITO (manufactured by DOWA HIGHTECH CO., LTD.).

Moreover, as an infrared absorber, the squarylium compound described in Japanese Patent Application Laid-Open No. 2017-197437, the squarylium compound described in Japanese Patent Application Laid-Open No. 2017-025311, and the squarylium compound described in International Publication No. 2016/154782 can also be used. Squarylium compounds described in Japanese Patent No. 5884953, squarylyanine compounds described in Japanese Patent No. 6036689, squarylyanine compounds described in Japanese Patent No. 5810604, International Squarylium compounds described in paragraphs 0090 to 0107 of Publication No. 2017/213047, pyrrole ring-containing compounds described in paragraphs 0019 to 0075 of Japanese Patent Application Laid-Open No. 2018-054760, and 0078 of Japanese Patent Application Laid-Open No. 2018-040955 Pyrrole ring-containing compounds described in paragraphs 0082 to 0082, pyrrole ring-containing compounds described in paragraphs 0043 to 0069 of Japanese Patent Application Laid-Open No. 2018-002773, and pyrrole ring-containing compounds described in paragraphs 0024 to 0086 of Japanese Patent Application Laid-Open No. 2018-041047 Squarylyanine compounds having an aromatic ring at the α position of the amine, amide-linked squarylyanine compounds described in Japanese Patent Application Laid-Open No. 2017-179131, squarylyanine compounds having a pyrrole double type described in Japanese Patent Application Publication No. 2017-141215 Compounds with skeleton or ketonium skeleton, dihydrocarbazole bisquaryl cyanine compound described in Japanese Patent Application Laid-Open No. 2017-082029, asymmetric type described in paragraphs 0027 to 0114 of Japanese Patent Application Laid-Open No. 2017-068120 Compounds, pyrrole ring-containing compounds (carbazole type) described in Japanese Patent Publication No. 2017-067963, phthalocyanine compounds described in Japanese Patent No. 6251530, etc.

The content of other infrared absorbers is preferably 1 to 100 parts by mass, more preferably 3 to 60 parts by mass, and further preferably 5 to 40 parts by mass relative to 100 parts by mass of the above-mentioned specific pigment. In addition, the total content of the above-mentioned specific dye and other infrared absorbers is preferably 1 mass % or more, more preferably 3 mass % or more, and still more preferably 5 mass % or more in the total solid content of the composition. The upper limit of the total content is preferably 50 mass% or less, more preferably 40 mass% or less, and still more preferably 30 mass% or less.

＜＜Pigment Derivatives＞＞ The composition of the present invention may further contain a pigment derivative in addition to the above-mentioned specific pigment. Pigment derivatives can be used as dispersing aids. Examples of dye derivatives include compounds having a structure in which an acid group or a base is bonded to a dye skeleton.

Examples of the pigment skeleton constituting the pigment derivative include squarylyanine pigment skeleton, pyrrolopyrrole pigment skeleton, diketopyrrolopyrrole pigment skeleton, quinacridone pigment skeleton, anthraquinone pigment skeleton, bisanthrone pigment skeleton, and benzene pigment skeleton. Isoindole pigment skeleton, thi𠯤indigo pigment skeleton, azo pigment skeleton, quinoline yellow pigment skeleton, phthalocyanine pigment skeleton, naphthalocyanine pigment skeleton, di-㗁𠯤 pigment skeleton, perylene pigment skeleton, purpurone pigment skeleton , benzimidazolone pigment skeleton, benzothiazole pigment skeleton, benzimidazole pigment skeleton and benzoethazole pigment skeleton, squaraine pigment skeleton, pyrrolopyrrole pigment skeleton, diketopyrrolopyrrole pigment skeleton, phthalocyanine pigment The skeleton, quinacridone pigment skeleton and benzimidazolone pigment skeleton are preferred, and the squaraine pigment skeleton and pyrrolopyrrole pigment skeleton are even better.

Examples of the acid group include a carboxyl group, a sulfo group, a phosphoric acid group, a boric acid group, a carboxylic acid amide group, a sulfonamide group, a amide acid group, and salts thereof. Examples of atoms or atomic groups constituting the salt include alkali metal ions (Li ⁺ , Na ⁺ , K ^{+ ,} etc.), alkaline earth metal ions (Ca ²⁺ , Mg ^{2+ ,} etc.), ammonium ions, imidazolium ions, and pyridinium ions, phosphonium ions, etc. As the carboxylic acid amide group, a group represented by -NHCOR ^A1 is preferred. As the sulfonamide group, a group represented by -NHSO ₂ R ^A2 is preferred. As the amide acid group, a group represented by -SO ₂ NHSO ₂ R ^A3 , -CONHSO ₂ R ^A4 , -CONHCOR ^A5 or -SO ₂ NHCOR ^A6 is preferred, and -SO ₂ NHSO ₂ R ^A3 is more preferred. R ^A1 to R ^A6 each independently represent an alkyl group or an aryl group. The alkyl group and aryl group represented by R ^A1 to R ^A6 may have a substituent. As the substituent, a halogen atom is preferred, and a fluorine atom is more preferred.

Examples of the base include an amino group, a pyridyl group and a salt thereof, a salt of an ammonium group, and a phthalimide methyl group. Examples of atoms or atomic groups constituting the salt include hydroxide ions, halogen ions, carboxylate ions, sulfonic acid ions, phenoxide ions, and the like.

Specific examples of the dye derivatives include compounds described in the Examples described below. Furthermore, Japanese Patent Application Laid-Open No. Sho 56-118462, Japanese Patent Application Laid-Open No. Sho 63-264674, Japanese Patent Application Laid-Open No. 01-217077, Japanese Patent Application Laid-Open No. 03-009961, and Japanese Patent Application Laid-Open No. 03-026767 can also be cited. Japanese Patent Application Publication No. 03-153780, Japanese Patent Application Publication No. 03-045662, Japanese Patent Application Publication No. 04-285669, Japanese Patent Application Publication No. 06-145546, Japanese Patent Application Publication No. 06-212088, Japanese Patent Application Publication No. 06-212088, Kaihei Publication No. 06-240158, Japanese Patent Application Publication No. 10-030063, Japanese Patent Application Publication No. 10-195326, paragraphs 0086 to 0098 of International Publication No. 2011/024896, paragraphs 0063 to 0094 of International Publication No. 2012/102399 Compounds described in , these contents are incorporated into this specification.

The content of the pigment derivative is preferably 1 to 50 parts by mass relative to 100 parts by mass of the above-mentioned specific pigment. The lower limit value is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, and more preferably 30 parts by mass or less. Only one type of pigment derivative may be used, or two or more types may be used. When two or more types are used, the total amount is preferably within the above range.

＜＜Solvent＞＞ The composition of the present invention preferably contains a solvent. Examples of the solvent include water and organic solvents, with organic solvents being preferred. Examples of the organic solvent include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, hydrocarbon solvents, and the like. For details, please refer to paragraph 0223 of International Publication No. 2015/166779, which is incorporated into this specification. Furthermore, ester solvents in which a cyclic alkyl group is substituted and ketone solvents in which a cyclic alkyl group is substituted can also be suitably used. Specific examples of the organic solvent include polyethylene glycol monomethyl ether, methylene chloride, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, and ethylcelusacetate. , Ethyl lactate, diglyme, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone , 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate , butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropylamide, 3-butoxy-N,N- Dimethylpropamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, γ-butyrolactone, cycloterine, anisole, 1,4-diethyloxy Butane, diethylene glycol monoethyl ether acetate, 1,3-butanediol diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol, 4-hydroxy-4-methyl methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, isopropyl alcohol, etc. However, sometimes it is preferable to reduce the number of aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) used as organic solvents for environmental reasons (for example, it can be set to 50 mass based on the total amount of organic solvents). ppm (parts per million: parts per million) or less, it can also be set to 10 mass ppm or less, or it can be set to 1 mass ppm or less).

In the present invention, it is preferable to use an organic solvent with a small metal content. It is preferable that the metal content of the organic solvent is, for example, 10 mass ppb (parts per billion: parts per billion) or less. Organic solvents with a quality of ppt (parts per trillion: parts per trillion) level can be used as needed, and such organic solvents are provided by Toyo Gosei Co., Ltd. (Chemical Industry Daily, November 13, 2015).

Examples of methods for removing impurities such as metals from organic solvents include distillation (molecular distillation, thin film distillation, etc.) or filtration using a filter. The filter pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and further preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene or nylon.

Organic solvents can contain isomers (compounds with the same number of atoms but different structures). In addition, only one type of isomer may be contained, or a plurality of types of isomers may be contained.

It is preferable that the content rate of peroxide in the organic solvent is 0.8 mmol/L or less, and it is more preferable that it contains substantially no peroxide.

The content of the solvent in the composition is preferably 10 to 97% by mass. The lower limit is preferably 30 mass % or more, more preferably 40 mass % or more, 50 mass % or more is still more preferably, 60 mass % or more is still more preferably, and 70 mass % or more is particularly preferred. The upper limit is preferably 96 mass% or less, and more preferably 95 mass% or less. The composition may contain only one type of solvent, or may contain two or more types of solvents. When two or more types are contained, the total amount is preferably within the above range.

＜＜Photopolymerization initiator＞＞ When the composition of the present invention contains a polymerizable compound, it is preferred that the composition of the present invention further contains a photopolymerization initiator. The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, compounds that are photosensitive to light in the ultraviolet range to the visible range are preferred. The photopolymerization initiator is preferably a photoradical polymerization initiator.

Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (for example, compounds having a trioxadiazole skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbisimidazole compounds, oxime compounds, organic Peroxides, sulfur compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. From the perspective of exposure sensitivity, photopolymerization initiators include trihalomethyltrifluoroethylene compounds, benzyldimethyl ketal compounds, α-hydroxyketone compounds, α-aminoketone compounds, acylphosphine compounds, and oxidation compounds. Phosphine compounds, metallocene compounds, oxime compounds, hexaarylbisimidazole compounds, onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene-benzene-iron complexes, halomethane compounds Preferred are ethadiazole compounds and 3-aryl substituted coumarin compounds, and compounds selected from the group consisting of oxime compounds, α-hydroxyketone compounds, α-aminoketone compounds and acylphosphine compounds are more preferred, and oxime compounds are more preferred. For further improvement. Examples of the photopolymerization initiator include compounds described in paragraphs 0065 to 0111 of Japanese Patent Application Laid-Open No. 2014-130173, compounds described in Japanese Patent Publication No. 6301489, and MATERIAL STAGE 37 to 60p, vol. 19 , the peroxide-based photopolymerization initiator described in No. 3, 2019, the photopolymerization initiator described in International Publication No. 2018/221177, the photopolymerization initiator described in International Publication No. 2018/110179 , the photopolymerization initiator described in Japanese Patent Application Publication No. 2019-043864, the photopolymerization initiator described in Japanese Patent Application Publication No. 2019-044030, the peroxide system described in Japanese Patent Application Publication No. 2019-167313 Initiator, the aminoacetophenone-based initiator having an oxazolidinyl group described in Japanese Patent Application Laid-Open No. 2020-055992, the oxime-based photopolymerization initiator described in Japanese Patent Application Publication No. 2013-190459, The polymer described in Japanese Patent Application Laid-Open No. 2020-172619, the compound represented by Formula 1 described in International Publication No. 2020/152120, and the like are incorporated in this specification.

Specific examples of hexaarylbisimidazole compounds include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-di Phenyl-1,1'-bisimidazole, etc.

Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, and Omnirad 127 (the above products are manufactured by IGM Resins B.V.), Irgacure 184, Irgacure 1173, Irgacure 2959, and Irgacure 127 (the above products are manufactured by BASF). manufactured by the company), etc. Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, and Omnirad 379EG (the above are manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, and Irgacure 379EG (the above are manufactured by IGM Resins B.V.). Manufactured by BASF Corporation), etc. Examples of commercially available acylphosphine compounds include Omnirad 819, Omnirad TPO (the above products are manufactured by IGM Resins B.V.), Irgacure 819, and Irgacure TPO (the above products are manufactured by BASF), and the like.

Examples of the oxime compound include compounds described in Japanese Patent Application Publication No. 2001-233842, compounds described in Japanese Patent Application Publication No. 2000-080068, compounds described in Japanese Patent Application Publication No. 2006-342166, and J.C.S. Perkin II ( Compounds described in J.C.S. Perkin II (1979, pp. 156-162), Journal of Photopolymer Science and Technology (1995, pp. 202-232) Compounds, compounds described in Japanese Patent Application Publication No. 2000-066385, compounds described in Japanese Patent Application Publication No. 2004-534797, compounds described in Japanese Patent Application Publication No. 2017-019766, compounds described in Japanese Patent Application Publication No. 6065596 Compounds, compounds described in International Publication No. 2015/152153, compounds described in International Publication No. 2017/051680, compounds described in Japanese Patent Publication No. 2017-198865, compounds 0025~ in International Publication No. 2017/164127 Compounds described in paragraph 0038, compounds described in International Publication No. 2013/167515, etc. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetyloxyiminobutan-2-one, and 3-propyloxyiminobutan-2-one. Aminobutan-2-one, 2-acetyloxyiminopentan-3-one, 2-acetyloxyiminopentan-1-one, 2-benzylpropan-1-one Oxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1 -Phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyl oxime), etc. Examples of commercially available products include Irgacure-OXE01, Irgacure-OXE02, Irgacure-OXE03, Irgacure-OXE04 (the above are manufactured by BASF), TR-PBG-304, TR-PBG-327 (manufactured by TRONLY), and Adeka Optomer N-1919 (photopolymerization initiator 2 manufactured by ADEKA CORPORATION and described in Japanese Patent Application Publication No. 2012-014052). In addition, as the oxime compound, it is also preferable to use a non-coloring compound or a compound with high transparency and resistance to discoloration. Examples of commercially available products include ADEKA ARKLS NCI-730, NCI-831, and NCI-930 (the above are manufactured by ADEKA CORPORATION).

As the photopolymerization initiator, an oxime compound having a fluorine ring can also be used. Specific examples of the oxime compound having a fluorine ring include the compounds described in Japanese Patent Application Laid-Open No. 2014-137466, the compounds described in Japanese Patent Publication No. 6636081, and the compounds described in Korean Patent Publication No. 10-2016-0109444. of compounds.

As the photopolymerization initiator, an oxime compound having at least one benzene ring of a carbazole ring serving as the skeleton of a naphthalene ring can also be used. Specific examples of such oxime compounds include compounds described in International Publication No. 2013/083505.

As the photopolymerization initiator, an oxime compound having a fluorine atom can also be used. Specific examples of the oxime compound having a fluorine atom include compounds described in Japanese Patent Application Publication No. 2010-262028, compounds 24, 36 to 40 described in Japanese Patent Application Publication No. 2014-500852, and Japanese Patent Application Publication No. 2013- Compound (C-3) described in Publication No. 164471, etc.

As the photopolymerization initiator, an oxime compound having a nitro group can be used. It is also preferable that the oxime compound having a nitro group is a dimer. Specific examples of the oxime compound having a nitro group include compounds described in paragraphs 0031 to 0047 of Japanese Patent Application Laid-Open No. 2013-114249 and paragraphs 0008 to 0012 and 0070 to 0079 of Japanese Patent Application Laid-Open No. 2014-137466, The compound described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071, ADEKA ARKLS NCI-831 (manufactured by ADEKA CORPORATION).

As the photopolymerization initiator, an oxime compound having a benzofuran skeleton can also be used. Specific examples include OE-01 to OE-75 described in International Publication No. 2015/036910.

As the photopolymerization initiator, an oxime compound in which a substituent having a hydroxyl group is bonded to a carbazole skeleton can also be used. Examples of such photopolymerization initiators include compounds described in International Publication No. 2019/088055.

Specific examples of oxime compounds that can be preferably used in the present invention are shown below, but the present invention is not limited to these.

[Chemical formula 15] [Chemical formula 16] [Chemical formula 17]

The oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, and more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm. In addition, from the viewpoint of sensitivity, the oxime compound preferably has a high Mohr absorption coefficient at a wavelength of 365 nm or a wavelength of 405 nm, more preferably 1,000 to 300,000, further preferably 2,000 to 300,000, and particularly preferably 5,000 to 200,000. The molar absorption coefficient of a compound can be measured using a known method. For example, it is preferable to measure with a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian) using an ethyl acetate solvent at a concentration of 0.01 g/L.

As the photopolymerization initiator, a bifunctional or trifunctional or higher photoradical polymerization initiator can be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, so good sensitivity can be obtained. In addition, when a compound with an asymmetric structure is used, the crystallinity decreases and the solubility in a solvent or the like increases, making it difficult to precipitate over time, thereby improving the stability of the composition over time. Specific examples of the bifunctional or trifunctional or higher-functional photoradical polymerization initiator include Japanese Patent Application Publication No. 2010-527339, Japanese Patent Application Publication No. 2011-524436, International Publication No. 2015/004565, and Japanese Patent Application Publication No. 2015/004565. The dimer of the oxime compound described in paragraphs 0407 to 0412 of Table 2016-532675, paragraphs 0039 to 0055 of International Publication No. 2017/033680, the compound (E) described in Japanese Patent Publication No. 2013-522445, and Compound (G), Cmpd1 to 7 described in International Publication No. 2016/034963, oxime ester-based initiator described in paragraph 0007 of Japanese Patent Application Publication No. 2017-523465, and 0020 of Japanese Patent Application Publication No. 2017-167399 The photoinitiator described in paragraphs 0033 to 0033, the photopolymerization initiator (A) described in paragraphs 0017 to 0026 of Japanese Patent Application Laid-Open No. 2017-151342, the oxime ester-based initiator described in Japanese Patent No. 6469669 Agents, etc.

The content of the photopolymerization initiator is preferably 0.1 to 40 mass%, more preferably 0.5 to 35 mass%, and further preferably 1 to 30 mass% in the total solid content of the composition. The composition may contain only one type of photopolymerization initiator, or may contain two or more types of photopolymerization initiators. When two or more types are contained, the total amount is preferably within the above range.

＜＜Hardening agent＞＞ When the composition of the present invention contains a compound having a cyclic ether group, it is preferred to further contain a hardener. Examples of the curing agent include amine compounds, acid anhydride compounds, amide compounds, phenol compounds, polycarboxylic acids, thiol compounds, and the like. Specific examples of the hardener include succinic acid, trimellitic acid, pyromelonic acid, N,N-dimethyl-4-aminopyridine, and neopentylerythritol tetrakis(3-mercaptopropionate) wait. As the curing agent, the compounds described in paragraphs 0072 to 0078 of Japanese Patent Application Laid-Open No. 2016-075720 and the compounds described in Japanese Patent Application Laid-Open No. 2017-036379 can also be used. The content of the hardener is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and further preferably 0.1 to 6.0 parts by mass relative to 100 parts by mass of the compound having a cyclic ether group.

＜＜Color colorant＞＞ The composition of the present invention can contain a colorant. In the present invention, a color colorant refers to a colorant other than a white colorant and a black colorant. It is preferable that the colorant has absorption in a wavelength range of 400 nm or more and less than 650 nm.

Examples of color colorants include red colorants, green colorants, blue colorants, yellow colorants, purple colorants, and orange colorants. The colorant can be a pigment or a dye. Pigments and dyes can be used together. Moreover, the pigment may be either an inorganic pigment or an organic pigment. In addition, the pigment may be a material in which a part of an inorganic pigment or an organic-inorganic pigment is replaced with an organic chromophore. By replacing inorganic pigments or organic-inorganic pigments with organic chromophores, hue design can be easily performed.

The average primary particle size of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, and more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and still more preferably 100 nm or less. As long as the average primary particle diameter of the pigment is within the above range, the dispersion stability of the pigment in the composition is good. In addition, in the present invention, the primary particle diameter of the pigment can be determined from the obtained image photograph by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is determined, and the equivalent circle diameter corresponding thereto is calculated as the primary particle diameter of the pigment. In addition, the average primary particle diameter in the present invention is the arithmetic average of the primary particle diameters of 400 primary particles of the pigment. In addition, the primary particles of the pigment refer to independent particles that are not agglomerated.

The colorant preferably contains a pigment. The content of the pigment in the colorant is preferably 50 mass% or more, more preferably 70 mass% or more, further preferably 80 mass% or more, and particularly preferably 90 mass% or more. Examples of pigments include those shown below.

Colorimetric Index (C.I.) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232 (methine series), 233 (quinoline series), 234 (amino ketone series), 235 (amino ketone series), 236 (amino ketone series), etc. (the above are yellow pigments), C.I. Pigment Orange 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73 etc. (the above is orange pigment), C.I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4 , 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3 ,83,88,90,105,112,119,122,123,144,146,149,150,155,166,168,169,170,171,172,175,176,177,178,179,184 ,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,269,270,272,279,291 , 294 (Kouyamaguchi galaxy, Organo Ultramarine (organic ultramarine), Bluish Red (blue-red)), 295 (monoazo series), 296 (diazo series), 297 (aminoketone), etc. (the above are red pigments ), C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine series), 65 (phthalocyanine series), 66 (phthalocyanine series), etc. (the above are green pigments), C.I. Pigment Purple 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane series), 61 (Kouyamaguchi Galaxy), etc. (the above are purple pigments), C.I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo series), 88 (methine series), etc. (the above are blue pigments).

In addition, as the green pigment, it is also possible to use a halide zinc phthalocyanine pigment having an average number of halogen atoms in one molecule of 10 to 14, an average number of bromine atoms in one molecule of 8 to 12, and an average number of chlorine atoms in one molecule of 2 to 5. Specific examples include compounds described in International Publication No. 2015/118720. In addition, as the green pigment, the compound described in Chinese Patent Application No. 106909027, the phthalocyanine compound having a phosphate ester as a ligand described in International Publication No. 2012/102395, and Japanese Patent Application Laid-Open No. 2019-008014 can also be used. Phthalocyanine compounds described in the publication, phthalocyanine compounds described in Japanese Patent Application Publication No. 2018-180023, compounds described in Japanese Patent Application Publication No. 2019-038958, core-shell type described in Japanese Patent Application Publication No. 2020-076995 Pigments, etc.

Furthermore, as the blue pigment, an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples include compounds described in paragraphs 0022 to 0030 of Japanese Patent Application Laid-Open No. 2012-247591 and paragraph 0047 of Japanese Patent Application Laid-Open No. 2011-157478.

In addition, as the yellow pigment, compounds described in Japanese Patent Application Laid-Open No. 2017-201003, compounds described in Japanese Patent Application Laid-Open No. 2017-197719, and compounds 0011 to 0062 and 0137 to Japanese Patent Application Laid-Open No. 2017-171912 can also be used. Compounds described in paragraph 0276, compounds described in paragraphs 0010 to 0062 and 0138 to 0295 of Japanese Patent Application Laid-Open No. 2017-171913, compounds described in paragraphs 0011 to 0062 and 0139 to 0190 of Japanese Patent Application Publication No. 2017-171914 , the compounds described in paragraphs 0010 to 0065 and 0142 to 0222 of Japanese Patent Application Laid-Open No. 2017-171915, the quinoline yellow compounds described in paragraphs 0011 to 0034 of Japanese Patent Application Publication No. 2013-054339, and the compounds described in Japanese Patent Application Laid-Open No. 2014-026228 Quinoline compounds described in paragraphs 0013 to 0058 of Japanese Patent Application Publication No., isoindoline compounds described in Japanese Patent Application Laid-Open No. 2018-062644, quinoline yellow compounds described in Japanese Patent Application Publication No. 2018-203798, Japanese Patent Application Publication No. 2018-203798 Quinophthalone compounds described in Japanese Patent Application Publication No. 2018-062578, quinophthaline compounds described in Japanese Patent Application Publication No. 6432076, quinophthaline compounds described in Japanese Patent Application Publication No. 2018-155881, Japanese Patent Application Publication No. 2018-111757 Quinophthalone compound described in Japanese Patent Application Laid-Open No. 2018-040835, Quinophthalone compound described in Japanese Patent Application Laid-Open No. 2017-197640, Japanese Patent Application Laid-Open No. 2016-145282 Quinophthalone compound described in Japanese Patent Application Laid-Open No. 2014-085565, Quinophthalone compound described in Japanese Patent Application Laid-Open No. 2014-021139, Japanese Patent Application Laid-Open No. 2013-209614 The quinophthalone compound described in Japanese Patent Application Laid-Open No. 2013-209435, the quinophthalate compound described in Japanese Patent Application Laid-Open No. 2013-181015, and the quinoline yellow compound described in Japanese Patent Application Laid-Open No. 2013-061622 Quinophthal compounds, quinophthal compounds described in Japanese Patent Application Laid-Open No. 2013-032486, quinophthal compounds described in Japanese Patent Application Laid-Open No. 2012-226110, quinophthal compounds described in Japanese Patent Application Laid-Open No. 2008-074987 Compounds, quinophthalone compounds described in Japanese Patent Application Laid-Open No. 2008-081565, quinophthaline compounds described in Japanese Patent Application Laid-Open No. 2008-074986, quinophthaline compounds described in Japanese Patent Application Laid-Open No. 2008-074985, Quinophthalone compounds described in Japanese Patent Publication No. 2008-050420, quinophthaline compounds described in Japanese Patent Publication No. 2008-031281, quinophthaline compounds described in Japanese Patent Publication No. 48-032765, Japanese Patent Publication No. 48-032765 Quinophthalone compounds described in Japanese Patent Publication No. 2019-008014, quinophthalone compounds described in Japanese Patent Publication No. 6607427, compounds described in Korean Patent Publication No. 10-2014-0034963, Japanese Patent Publication No. 2017-095706 Compounds described in Japanese Patent Application Publication No. 201920495, Compounds described in Japanese Patent Application Publication No. 6607427, Compounds described in Japanese Patent Application Publication No. 2020-033525, Japanese Patent Application Publication No. 2020-033524 Compounds described in Japanese Patent Application Publication No. 2020-033523, Compounds described in Japanese Patent Application Publication No. 2020-033522, Compounds described in Japanese Patent Application Publication No. 2020-033521, International Publication No. 2020 Compounds described in /045200, compounds described in International Publication No. 2020/045199, and compounds described in International Publication No. 2020/045197. In addition, from the viewpoint of improving the color value, those in which these compounds are polymerized can also be preferably used.

As the red pigment, diketopyrrolopyrrole compounds described in Japanese Patent Application Laid-Open No. 2017-201384 in which at least one bromine atom is substituted in the structure and diketopyrrolopyrrole compounds described in paragraphs 0016 to 0022 of Japanese Patent No. 6248838 can also be used. Pyrrolopyrrole compound, diketopyrrolopyrrole compound described in International Publication No. 2012/102399, diketopyrrolopyrrole compound described in International Publication No. 2012/117965, naphthalene described in Japanese Patent Application Laid-Open No. 2012-229344 Phenolic azo compound, red pigment described in Japanese Patent No. 6516119, red pigment described in Japanese Patent No. 6525101, brominated diketopyrrolopyrrole described in paragraph 0229 of Japanese Patent Application Laid-Open No. 2020-090632 Compounds, anthraquinone compounds described in Korean Patent Publication No. 10-2019-0140741, anthraquinone compounds described in Korean Patent Publication No. 10-2019-0140744, perylene compounds described in Japanese Patent Application Laid-Open No. 2020-079396 Compounds etc. In addition, as the red pigment, a compound having the following structure can also be used: an aromatic ring group in which a group bonded with an oxygen atom, a sulfur atom or a nitrogen atom is introduced into an aromatic ring, and a diketopyrrolopyrrole skeleton bond Knot.

Regarding the optimal diffraction angles of various pigments, please refer to the records of Japanese Patent No. 6561862, Japanese Patent No. 6413872, Japanese Patent No. 6281345, and Japanese Patent Application Laid-Open No. 2020-026503. The contents are incorporated into this document. in the manual. In addition, as the pyrrolopyrrole-based pigment, those having a crystallite size of 140 Å or less in the direction of the plane corresponding to the maximum peak in the X-ray diffraction pattern among the eight planes of the lattice plane (±1±1±1) may also be used. Better. In addition, the physical properties of the pyrrolopyrrole-based pigment are preferably as described in paragraphs 0028 to 0073 of Japanese Patent Application Laid-Open No. 2020-097744.

Dyes can also be used as colorants. The dye is not particularly limited, and known dyes can be used. Examples include pyrazole azo dyes, anilinoazo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxocyanine dyes, and pyrazole dyes. Triazole azo dyes, pyridone azo dyes, cyanine dyes, thiophene dyes, pyrrolopyrazole azomethine dyes, Kouyamaguchi galaxy dyes, phthalocyanine dyes, benzo Piran dyes, indigo dyes, pyrromethene dyes, etc.

Pigment polymers can also be used as colorants. It is preferable that the dye polymer is dissolved in a solvent and used. In addition, the dye multimer may form particles. When the pigment polymer is in the form of particles, it is usually used in a state of being dispersed in a solvent. The dye multimer in a particle state can be obtained by, for example, emulsion polymerization. Specific examples include the compound and the production method described in Japanese Patent Application Laid-Open No. 2015-214682. The pigment multimer has two or more pigment structures in one molecule, preferably three or more pigment structures. The upper limit is not particularly limited, but it can also be set to 100 or less. The plurality of pigment structures in one molecule may be the same pigment structure or may be different pigment structures. The weight average molecular weight (Mw) of the dye multimer is preferably 2,000 to 50,000. It is more preferable that the lower limit is 3,000 or more, and it is further more preferable that it is 6,000 or more. It is more preferable that the upper limit is 30,000 or less, and it is further more preferable that it is 20,000 or less. The dye multimer can also be used as Japanese Patent Application Laid-Open Nos. 2011-213925, 2013-041097, 2015-028144, 2015-030742, and International Publication No. 2016/031442. Compounds described in etc.

In addition, the colorant can use the thiazole compound described in Japanese Patent Application Publication No. 2012-158649, the azo compound described in Japanese Patent Application Publication No. 2011-184493, and the azo compound described in Japanese Patent Application Publication No. 2011-145540. , the triarylmethane dye polymer described in Korean Patent Publication No. 10-2020-0028160, the Yamaguchi star compound described in Japanese Patent Publication No. 2020-117638, and the phthalocyanine described in International Publication No. 2020/174991 Compounds, isoindoline compounds described in Japanese Patent Application Laid-Open No. 2020-160279, or salts thereof.

When the composition of the present invention contains a colorant, the content of the colorant is preferably 1 to 50% by mass in the total solid content of the composition of the present invention. When the composition of the present invention contains two or more colorants, the total amount is preferably within the above range.

When the composition of the present invention is used as a composition for an infrared cut filter, it is preferred that the composition of the present invention substantially contains no colorant. Furthermore, when the composition of the present invention does not substantially contain a colorant, it means that the content of the colorant in the total solid content of the composition of the present invention is 0.5% by mass or less, preferably 0.1% by mass or less, and not more. Containing colorants is better.

＜＜Color material that transmits infrared rays and blocks visible light＞＞ The composition of the present invention may also contain a color material that transmits infrared rays and blocks visible light (hereinafter also referred to as a color material that blocks visible light). A composition containing a color material that blocks visible light can be preferably used as a composition for forming an infrared transmission filter.

The color material that blocks visible light is preferably a color material that absorbs light in the wavelength range from purple to red. Furthermore, the color material that blocks visible light is preferably a color material that blocks light in a wavelength range of 450 to 650 nm. In addition, the color material that blocks visible light is preferably a color material that transmits light with a wavelength of 900 to 1500 nm. It is preferable that the color material that blocks visible light meets at least one of the following requirements (A) and (B). (A): Contains two or more chromatic colorants and forms black by a combination of two or more chromatic colorants. (B): Contains organic black colorant.

Examples of the coloring agent include those mentioned above. Examples of the organic black colorant include dibenzofuranone compounds, azomethine compounds, perylene compounds, azo compounds, and the like, with dibenzofuranone compounds and perylene compounds being preferred. Examples of the dibenzofuranone compound include compounds described in Japanese Patent Application Publication No. 2010-534726, Japanese Patent Application Publication No. 2012-515233, Japanese Patent Application Publication No. 2012-515234, and the like. For example, it can be used as a dibenzofuranone compound manufactured by BASF Corporation. "Irgaphor Black" obtained. Examples of the perylene compound include the compounds described in paragraphs 0016 to 0020 of Japanese Patent Application Laid-Open No. 2017-226821, C.I. Pigment Black 31, 32, and the like. Examples of the azomethine compound include compounds described in Japanese Patent Application Laid-Open No. 01-170601, Japanese Patent Application Laid-Open No. 02-034664, and the like. For example, the azomethine compound can be manufactured by Dainichiseika Color & Chemicals Mfg. Co., Ltd. "CHROMO FINE BLACK A1103" was obtained.

Examples of the combination of color colorants when forming black by a combination of two or more color colorants include the following aspects (1) to (8). (1) Contains yellow colorant, blue colorant, purple colorant and red colorant. (2) Contains yellow colorant, blue colorant and red colorant. (3) Contains yellow colorant, purple colorant and red colorant. (4) Contains yellow coloring agent and purple coloring agent. (5) Containing green colorant, blue colorant, purple colorant and red colorant. (6) Contains purple coloring agent and orange coloring agent. (7) Contains green colorant, purple colorant and red colorant. (8) Contains green colorant and red colorant.

When the composition of the present invention contains a color material that blocks visible light, the content of the color material that blocks visible light is preferably 1 to 50% by mass in the total solid content of the composition. It is more preferable that the lower limit is 5 mass % or more, more preferably 10 mass % or more, 20 mass % or more is still more preferred, and 30 mass % or more is particularly preferred.

When the composition of the present invention is used as a composition for an infrared cut filter, it is preferred that the composition of the present invention substantially does not contain a color material that blocks visible light. Furthermore, when the composition of the present invention substantially does not contain a color material that blocks visible light, it means that the content of the color material that blocks visible light in the total solid content of the composition of the present invention is 0.5 mass % or less, and 0.1 mass % or less is Preferably, it is better if it does not contain color materials that block visible light.

＜＜Surfactant＞＞ The composition of the present invention preferably contains a surfactant. As the surfactant, various surfactants such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and polysiloxane-based surfactants can be used. The surfactant is preferably a polysiloxane-based surfactant or a fluorine-based surfactant. Examples of the surfactant include those described in paragraphs 0238 to 0245 of International Publication No. 2015/166779, and these contents are incorporated into this specification.

Examples of the fluorine-based surfactant include surfactants described in paragraphs 0060 to 0064 of Japanese Patent Application Laid-Open No. 2014-041318 (corresponding to paragraphs 0060 to 0064 of International Publication No. 2014/017669), Japanese Patent Application Laid-Open No. 2014/017669, etc. The surfactants described in paragraphs 0117 to 0132 of Publication No. 2011-132503 and the surfactants described in Japanese Patent Application Laid-Open No. 2020-008634 are incorporated into this specification. Examples of commercially available fluorine-based surfactants include MEGAFACE F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F -144, F-437, F-475, F-477, F-479, F-482, F-554, F-555-A, F-556, F-557, F-558, F-559, F -560, F-561, F-563, F-565, F-568, F-575, F-780, EXP, MFS-330, R-01, R-40, R-40-LM, R-41 , R-41-LM, RS-43, TF-1956, RS-90, R-94, RS-72-K, DS-21 (the above manufactured by DIC Corporation), FLUORAD FC430, FC431, FC171 (the above manufactured by Sumitomo Manufactured by 3M Limited), SURFLON S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (the above is AGC INC .Manufactured), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (the above are manufactured by OMNOVA SOLUTIONS INC.), Futurgent 208G, 215M, 245F, 601AD, 601ADH2, 602A, 610FM, 710FL, 710FM, 710FS, FTX-218 (above) Manufactured for NEOS COMPANY LIMITED), etc.

In addition, as the fluorine-based surfactant, an acrylic compound having a molecular structure including a functional group containing a fluorine atom and in which the portion of the functional group containing the fluorine atom is cleaved during heating can also be suitably used. The fluorine atoms volatilize. Examples of such fluorine-based surfactants include the MEGAFACE DS series manufactured by DIC Corporation (Chemical Industry Daily (February 22, 2016), Nikkei Sangyo Shimbun (February 23, 2016)). For example, MEGAFACE DS-21.

Furthermore, as the fluorine-based surfactant, it is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound. Examples of such fluorine-based surfactants include the fluorine-based surfactants described in Japanese Patent Application Laid-Open No. 2016-216602, the content of which is incorporated into this specification.

As the fluorine-based surfactant, a block polymer can also be used. As the fluorine-based surfactant, a fluorine-containing polymer compound containing: a repeating unit derived from a (meth)acrylate compound having a fluorine atom; and a fluorine-containing polymer compound derived from a (meth)acrylate compound having 2 The repeating unit of the above (preferably 5 or more) (meth)acrylate compound having an alkyleneoxy group (preferably an vinyloxy group or a propyleneoxy group). In addition, the fluorine-containing surfactant described in paragraphs 0016 to 0037 of Japanese Patent Application Laid-Open No. 2010-032698 and the following compounds are also exemplified as the fluorine-based surfactant used in the present invention. [Chemical formula 18] The weight average molecular weight of the above compound is preferably 3,000 to 50,000, for example, 14,000. In the above compounds, the percentage expressed as the proportion of repeating units is molar %.

Furthermore, as the fluorine-based surfactant, a fluorine-containing polymer having a group containing an ethylenically unsaturated bond in a side chain can also be used. Specific examples include compounds described in paragraphs 0050 to 0090 and paragraphs 0289 to 0295 of Japanese Patent Application Laid-Open No. 2010-164965, MEGAFACE RS-101, RS-102, RS-718K, and RS-72- manufactured by DIC Corporation. K et al. In addition, as the fluorine-based surfactant, compounds described in paragraphs 0015 to 0158 of Japanese Patent Application Laid-Open No. 2015-117327 can also be used.

Furthermore, from the viewpoint of environmental control, it is also preferable to use the surfactant described in International Publication No. 2020/084854 as a substitute for the surfactant having a perfluoroalkyl group with a carbon number of 6 or more.

Furthermore, it is also preferable to use a fluoride-containing imine salt compound represented by formula (fi-1) as a surfactant. [Chemical formula 19] In formula (fi-1), m represents 1 or 2, n represents an integer from 1 to 4, a represents 1 or 2, X ^a+ represents a-valent metal ion, primary ammonium ion, secondary ammonium ion, tertiary ammonium ion, Quaternary ammonium ion or NH ₄ ⁺ .

Examples of nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane, and their ethoxylates and propoxylates (for example, glycerolpropane Oxylate, glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonyl Phenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitol fatty acid ester, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (manufactured by BASF), Tetronic 304, 701, 704, 901, 904, 150R1 (manufactured by BASF Corporation), SOLSPERSE 20000 (manufactured by Japan Lubrizol Corporation), NCW-101, NCW-1001, NCW-1002 (manufactured by FUJIFILMWako Pure Chemical Corporation), PIONIN D-6112 , D-6112-W, D-6315 (manufactured by Takemoto Oil & Fat Co., Ltd.), OLFIN E1010, Surfynol 104, 400, 440 (manufactured by Nissin Chemical Industry Co., Ltd.), etc.

Examples of cationic surfactants include tetraalkylammonium salts, alkylamine salts, benzalkylammonium salts, alkylpyridinium salts, and imidazolium salts. Specific examples include dihydroxyethyl stearylamine, 2-heptadecenyl-hydroxyethyl imidazoline, lauryldimethylbenzyl ammonium chloride, cetylpyridinium chloride, and stearyl chloride. Aminomethylpyridinium chloride, etc.

Examples of the anionic surfactant include dodecyl benzene sulfonic acid, sodium dodecyl benzene sulfonate, sodium lauryl sulfate, sodium alkyl diphenyl ether disulfonate, sodium alkyl naphthalene sulfonate, and dioxane. Sodium sulfosuccinate, sodium stearate, potassium oleate, sodium dioctyl sulfosuccinate, sodium polyoxyethylene alkyl ether sulfate, sodium polyoxyethylene alkylphenyl ether sulfate, dialkyl sulfonate Sodium succinate, sodium stearate, sodium oleate, tertiary octylphenoxyethoxypolyethoxyethyl sulfate sodium salt, etc.

Examples of polysilicone-based surfactants include SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, SF 8419 OIL (the above are manufactured by Dow Corning Toray Co., Ltd.), TSF -4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (the above are manufactured by Momentive Performance Materials Inc.), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (the above (manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, BYK-UV3510 (the above are manufactured by BYK-Chemie GmbH), etc.

Moreover, the compound of the following structure can also be used as a polysiloxane surfactant. [Chemical formula 20]

The content of the surfactant is preferably 0.001 to 1% by mass, more preferably 0.001 to 0.5% by mass, and further preferably 0.001 to 0.2% by mass in the total solid content of the composition. The composition may contain only one type of surfactant, or may contain two or more types. When two or more types are contained, the total amount is preferably within the above range.

＜＜Polymerization inhibitor＞＞ The composition of the present invention can contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tertiary butyl-p-cresol, gallic acid, tertiary butylcatechol, benzoquinone, and 4,4'-thio Bis(3-methyl-6-tertiary butylphenol), 2,2'-methylenebis(4-methyl-6-tertiary butylphenol), N-nitrosophenylhydroxylamine salt ( ammonium salt, first cerium salt, etc.), p-methoxyphenol is preferred. The content of the polymerization inhibitor is preferably 0.0001 to 5% by mass of the total solid content of the composition. The composition may contain only one polymerization inhibitor, or may contain two or more polymerization inhibitors. When two or more types are contained, the total amount is preferably within the above range.

＜＜Silane Coupling Agent＞＞ The composition of the present invention can contain a silane coupling agent. In this specification, a silane coupling agent refers to a silane compound having a hydrolyzable group and functional groups other than the hydrolyzable group. In addition, the hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and can generate a siloxane bond through at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, a hydroxyl group, and the like, with an alkoxy group being preferred. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. Examples of functional groups other than hydrolyzable groups include vinyl groups, (meth)acrylyl groups, mercapto groups, epoxy groups, oxetanyl groups, amino groups, ureido groups, and thioether groups. Isocyanate group, phenyl group, etc., (meth)acrylyl group and epoxy group are preferred. Examples of the silane coupling agent include compounds described in paragraphs 0018 to 0036 of Japanese Patent Application Laid-Open No. 2009-288703, and compounds described in paragraphs 0056 to 0066 of Japanese Patent Application Laid-Open No. 2009-242604, and these contents are incorporated into this specification. . The content of the silane coupling agent is preferably 0.01 to 15.0% by mass, and more preferably 0.05 to 10.0% by mass of the total solid content of the composition. The composition may contain only one silane coupling agent, or may contain two or more silane coupling agents. When two or more types are contained, the total amount is preferably within the above range.

＜＜UV absorber＞＞ The composition of the present invention can contain an ultraviolet absorber. Examples of the ultraviolet absorber include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyl trisulfonate compounds, and indepine compounds. Indole compounds, tribenzoyl compounds, benzoyl compounds, etc. Specific examples of such compounds include paragraphs 0038 to 0052 of Japanese Patent Application Laid-Open No. 2009-217221, paragraphs 0052 to 0072 of Japanese Patent Application Laid-Open No. 2012-208374, and paragraphs 0317 to 0317 of Japanese Patent Application Laid-Open No. 2013-068814. Paragraph 0334 and compounds described in Paragraphs 0061 to 0080 of Japanese Patent Application Laid-Open No. 2016-162946, these contents are incorporated into this specification. Commercially available products of ultraviolet absorbers include BASF's Tinuvin series, Uvinul series, and the like. Examples of benzotriazole compounds include the MYUA series manufactured by MIYOSHI OIL & FAT CO., LTD. (Chemical Industry Daily, February 1, 2016). In addition, compounds described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967 and paragraphs 0059 to 0076 of International Publication No. 2016/181987 can also be used as the ultraviolet absorber. The content of the ultraviolet absorber is preferably 0.01 to 30% by mass, and more preferably 0.05 to 25% by mass of the total solid content of the composition. The composition may contain only one type of ultraviolet absorber, or may contain two or more types of ultraviolet absorber. When two or more types are contained, the total amount is preferably within the above range.

＜＜Antioxidants＞＞ The composition of the present invention can contain antioxidants. Examples of antioxidants include phenol-based antioxidants, amine-based antioxidants, phosphorus-based antioxidants, sulfur-based antioxidants, and the like. Examples of phenolic antioxidants include hindered phenol compounds. The phenolic antioxidant is preferably a compound having a substituent at the position adjacent to the phenolic hydroxyl group (ortho position). As the substituent, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferred. It is also preferable that the antioxidant is a compound having a phenol group and a phosphite group in the same molecule. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2] Dioxaphosphineheterocycloheptadien-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tertiary butyldibenzo[d,f] [1,3,2]dioxaphosphineheterocycloheptadien-2-yl)oxy]ethyl]amine, ethyl bis(2,4-di-tertiary butyl-6-methyl phosphite) phenyl), tris(2,4-di-tertiary butylphenyl) phosphite, etc. Examples of commercially available antioxidants include ADEKA STAB AO-20, ADEKA STAB AO-30, ADEKA STAB AO-40, ADEKA STAB AO-50, ADEKA STAB AO-50F, ADEKA STAB AO-60, and ADEKA STAB AO-60G, ADEKA STAB AO-80, ADEKA STAB AO-330, ADEKA STAB AO-412S, ADEKA STAB 2112, ADEKA STAB PEP-36, ADEKA STAB HP-10 (the above are manufactured by ADEKA CORPORATION), JP-650 ( Manufactured by JOHOKU CHEMICAL CO., LTD), etc. As antioxidants, compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, compounds described in International Publication No. 2017/006600, compounds described in International Publication No. 2017/164024, and Korean Patent Publication No. 10 can also be used. -Compounds described in Publication No. 2019-0059371. The content of the antioxidant is preferably 0.01 to 20% by mass, and more preferably 0.3 to 15% by mass of the total solid content of the composition. The composition may contain only one type of antioxidant, or may contain two or more types. When two or more types are contained, the total amount is preferably within the above range.

＜＜Other ingredients＞＞ The composition of the present invention may optionally contain sensitizers, hardening accelerators, fillers, thermal hardening accelerators, plasticizers and other auxiliaries (for example, conductive particles, defoaming agents, flame retardants, leveling agents, Peeling accelerators, fragrances, surface tension regulators, chain transfer agents, etc.). By appropriately containing these components, film physical properties and other properties can be adjusted. Regarding these components, for example, the descriptions of paragraphs 0183 and onwards of Japanese Patent Application Laid-Open No. 2012-003225 (corresponding to paragraph 0237 of the specification of U.S. Patent Application Publication No. 2013/0034812), and the descriptions of Japanese Patent Application Laid-Open No. 2008-250074 The descriptions in paragraphs 0101 to 0104, 0107 to 0109, etc. are incorporated into this manual. In addition, it can be seen that the composition of the present invention needs to contain potential antioxidants. Examples of potential antioxidants include compounds in which a site functioning as an antioxidant is protected by a protective group and the protective group is detached by heating at 100 to 250°C or heating at 80 to 200°C in the presence of an acid/alkali catalyst. and acts as an antioxidant. Examples of potential antioxidants include compounds described in International Publication No. 2014/021023, International Publication No. 2017/030005, and Japanese Patent Application Publication No. 2017-008219. Examples of commercially available latent antioxidants include ADEKA ARKLS GPA-5001 (manufactured by ADEKA CORPORATION).

＜Container＞ There is no particular limitation on the container for storing the composition of the present invention, and a known container can be used. In addition, as a storage container, in order to prevent impurities from being mixed into raw materials and compositions, it is also preferable to use a multi-layer bottle with an inner wall composed of six types of six-layer resins or a bottle with a seven-layer structure using six types of resins. Examples of such a container include the container described in Japanese Patent Application Laid-Open No. 2015-123351. In addition, the inner wall of the container is preferably made of glass, stainless steel, etc., for the purpose of preventing elution of metal from the inner wall of the container, improving the stability of the composition over time, or suppressing deterioration of components.

＜Preparation method of composition＞ The composition of the present invention can be prepared by mixing the aforementioned components. When preparing a composition, you can prepare the composition by dissolving or dispersing all the ingredients in a solvent at the same time, or you can prepare a solution or dispersion in which 2 or more parts of each ingredient is appropriately blended in advance if necessary, and use it (when coating). ) are mixed to prepare a composition.

When preparing the composition, a process for dispersing the pigment may be included. In the pigment dispersion process, examples of mechanical forces used to disperse pigments include compression, extrusion, impact, shearing, pitting, and the like. Specific examples of these processes include bead milling, sand milling, roller milling, ball milling, paint stirring, micro-jet flow, high-speed impeller, sand mixing, jet mixing, high-pressure wet micronization, ultrasonic dispersion, and the like. In addition, when grinding the pigment in a sand mill (bead mill), it is preferable to perform the treatment under conditions that improve grinding efficiency by using microbeads with small diameters, increasing the filling rate of microbeads, etc. In addition, after the grinding process, it is preferable to remove coarse particles by filtration, centrifugation, etc. In addition, regarding the process and dispersing machine for dispersing pigments, "Encyclopedia of Dispersion Technology, published by JOHOKIKO CO., LTD., July 15, 2005" or "Suspension (solid/liquid dispersion system)" can be preferably used. The Center's Comprehensive Data Collection on Dispersion Technology and Industrial Applications, published by the Publication Department of the Business Development Center, October 10, 1978", the process and dispersion machine described in paragraph 0022 of Japanese Patent Application Publication No. 2015-157893. In addition, in the process of dispersing pigments, the pigment can be refined through a salt grinding step. For example, the materials, machines, processing conditions, etc. used in the salt grinding step can be found in Japanese Patent Application Laid-Open No. 2015-194521 and Japanese Patent Application Laid-Open No. 2012-046629. Examples of materials used for dispersed beads include zirconium dioxide, agate, quartz, titanium dioxide, tungsten carbide, silicon nitride, alumina, stainless steel and glass. In addition, an inorganic compound having a Mohs hardness of 2 or more can also be used for the beads. The composition may contain 1 to 10,000 ppm of the above beads.

When preparing the composition, it is better to filter the composition with a filter for the purpose of removing impurities, reducing defects, etc. As a filter, any filter that has been conventionally used for filtration purposes and the like can be used without particular restrictions. Examples include the use of fluororesins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (for example, nylon-6, nylon-6,6), and polyolefin resins (including high-resin resins such as polyethylene and polypropylene (PP)). density, ultra-high molecular weight polyolefin resin) and other materials. Among these materials, polypropylene (including high-density polypropylene) and nylon are preferred.

The pore diameter of the filter is preferably 0.01 to 7.0 μm, more preferably 0.01 to 3.0 μm, and further preferably 0.05 to 0.5 μm. If the pore size of the filter is within the above range, fine foreign matter can be removed more reliably. Regarding the pore size of the filter, you can refer to the nominal value of the filter manufacturer. As for the filter, various filters provided by Nihon Pall Ltd. (DFA4201NXEY, DFA4201NAEY, DFA4201J006P, etc.), Advantec Toyo Kaisha, Ltd., Nihon Entegris K.K. (Formerly Nippon Mykrolis Corporation), KITZ MICROFILTER Corporation, etc. can be used.

In addition, it is also preferable to use a fibrous filter material as the filter. Examples of fibrous filter materials include polypropylene fiber, nylon fiber, glass fiber, and the like. Commercially available products include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) manufactured by ROKI TECHNO CO., LTD.

When using filters, you can combine different filters (e.g. 1st filter and 2nd filter, etc.). At this time, filtration using each filter may be performed only once, or may be performed two or more times. Furthermore, filters with different pore sizes can be combined within the above range. Alternatively, only the dispersion may be filtered with the first filter, and the other components may be mixed and then filtered with the second filter.

＜Membrane＞ Next, the film of the present invention will be described. The film of the present invention is a film obtained from the composition of the present invention described above. The film of the present invention can be preferably used as an optical filter. The use of the optical filter is not particularly limited, and examples include infrared cut filters, infrared transmission filters, and the like. Examples of the infrared cut filter include an infrared cut filter on the light-receiving side of the solid-state imaging element (for example, an infrared cut-off filter used for a wafer-level lens), and an infrared cut-off filter on the back side of the solid-state imaging element (opposite to the light-receiving side). Infrared cut filter for the side), infrared cut filter for ambient light sensor (for example, illumination sensor that senses the illumination and hue of the environment where the information terminal device is located and adjusts the hue of the display, color correction that adjusts the hue using sensors) etc. In particular, it can be suitably used as an infrared cut filter on the light-receiving side of a solid-state imaging element. Examples of the infrared transmission filter include a filter capable of blocking visible light and selectively transmitting infrared rays having a specific wavelength or above.

The film of the present invention may have a pattern, or may be a film without a pattern (flat film). Furthermore, the film of the present invention can be laminated on a support and used, or the film of the present invention can be peeled off from the support and used. Examples of the support include semiconductor base materials such as silicon substrates and transparent base materials.

A charge coupled device (CCD), a complementary metal oxide film semiconductor (CMOS), a transparent conductive film, etc. can be formed on the semiconductor substrate used as a support. In addition, a black matrix that isolates each pixel may be formed on the semiconductor substrate. In addition, if necessary, a primer layer may be provided on the semiconductor base material for improving the adhesion with the upper layer, preventing diffusion of substances, or flattening the substrate surface.

The transparent base material that can be used as a support is not particularly limited as long as it is made of a material that can transmit at least visible light. For example, a base material made of glass, resin, etc. can be mentioned. Examples of the resin include polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene/vinyl acetate copolymers, and norbornene resins. , polyacrylate, polymethyl methacrylate and other acrylic resins, urethane resin, vinyl chloride resin, fluorine resin, polycarbonate resin, polyvinyl butyral resin, polyvinyl alcohol resin, etc. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, copper-containing glass, and the like. Examples of copper-containing glass include copper-containing phosphate glass, copper-containing fluorophosphate glass, and the like. Commercially available copper-containing glass can also be used. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC TECHNO GLASS Co., Ltd.).

The thickness of the film of the present invention can be appropriately adjusted depending on the purpose. The thickness of the film can be 200 μm or less, 150 μm or less, 120 μm or less, 20 μm or less, 10 μm or less, or 5 μm or less. The lower limit of the thickness of the film is preferably 0.1 μm or more, and more preferably 0.2 μm or more.

When the film of the present invention is used as an infrared cut filter, it is preferable that the film of the present invention has a maximum absorption wavelength in the range of wavelength 650 to 1500 nm (preferably wavelength 660 to 1200 nm, more preferably wavelength 660 to 1000 nm). In addition, the average transmittance of light with a wavelength of 420 to 550 nm is preferably 50% or more, more preferably 70% or more, further preferably 80% or more, and particularly preferably 85% or more. In addition, the transmittance in the entire wavelength range of 420 to 550 nm is preferably 50% or more, more preferably 70% or more, and further preferably 80% or more. In addition, the transmittance of the film of the present invention at at least one point within the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm) is preferably 15% or less, and 10% or less. Better still, 5% or less is even better. Moreover, when the absorbance at the maximum absorption wavelength is 1, the average absorbance of the film of the present invention in the wavelength range of 420 to 550 nm is preferably less than 0.030, and more preferably less than 0.025.

When the film of the present invention is used as an infrared transmission filter, it is preferable that the film of the present invention has any one of the following spectral characteristics (i1) to (i3), for example. (i1): The maximum value of the transmittance in the wavelength range of 400 to 850 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 1000 to 1500 nm A filter with a minimum value of 70% or more (preferably 75% or more, more preferably 80% or more). A film with such spectroscopic characteristics can block light with a wavelength in the range of 400 to 850 nm, and can transmit light with a wavelength exceeding 950 nm. (i2): The maximum value of the transmittance in the wavelength range of 400 to 950 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 1100 to 1500 nm A filter with a minimum value of 70% or more (preferably 75% or more, more preferably 80% or more). A film with such spectroscopic characteristics can block light with a wavelength in the range of 400 to 950 nm, and can transmit light with a wavelength exceeding 1050 nm. (i3): The maximum value of the transmittance in the wavelength range of 400 to 1050 nm is 20% or less (preferably 15% or less, more preferably 10% or less) and the transmittance in the wavelength range of 1200 to 1500 nm A filter with a minimum value of 70% or more (preferably 75% or more, more preferably 80% or more). A film with such spectroscopic characteristics can block light with a wavelength in the range of 400 to 1050 nm, and can transmit light with a wavelength exceeding 1150 nm.

The films of the present invention can also be used in combination with color filters containing colored colorants. The color filter can be produced using a coloring composition containing a color colorant. When the film of the present invention is used as an infrared cut filter and the film of the present invention is used in combination with a color filter, it is preferable to arrange the color filter on the optical path of the film of the present invention. For example, it is preferable to laminate the film of the present invention and a color filter to use as a laminate. In the laminate, the film of the present invention and the color filter may be adjacent to each other in the thickness direction, or may not be adjacent to each other. When the film of the present invention and the color filter are not adjacent to each other in the thickness direction, the film of the present invention may be formed on a support different from the support on which the color filter is formed, or the film of the present invention may be formed on a different support than the support on which the color filter is formed. Other components constituting the solid-state imaging element (for example, microlenses, planarization layers, etc.) are sandwiched between the components.

The film of the present invention can be used in various devices such as solid-state imaging elements such as CCD (charge coupled device) and CMOS (complementary metal oxide semiconductor), infrared sensors, and image display devices.

＜Membrane manufacturing method＞ The film of the present invention can be produced by applying the composition of the present invention.

Examples of the support include those mentioned above. As a method of applying the composition, a known method can be used. For example, dropping method (drip casting); slit coating method; spray method; roll coating method; spin coating method (spin coating); cast coating method; slit spin coating method; prewet method (for example, Japan Methods described in Japanese Patent Application Laid-Open No. 2009-145395); inkjet (e.g., drop-on-demand, piezoelectric, thermal), nozzle jet and other ejection system printing, flexographic printing, screen printing, gravure printing, reverse offset Various printing methods such as printing and metal mask printing; transfer methods using molds, etc.; nanoimprinting methods, etc. There are no particular limitations on the application method of inkjet. For example, "Expansion and Usage of Inkjet - Infinite Possibilities Appeared in Patents -", published in February 2005, Sumitbe Techon Research Co., Ltd. method (especially pages 115 to 133) or Japanese Patent Application Publication No. 2003-262716, Japanese Patent Application Publication No. 2003-185831, Japanese Patent Application Publication No. 2003-261827, Japanese Patent Application Publication No. 2012-126830, Japan The method described in Japanese Patent Application Publication No. 2006-169325, etc.

The composition layer formed by applying the composition may be dried (prebaked). When prebaking is performed, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and further preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or 80°C or higher. The prebaking time is preferably 10 to 3000 seconds, more preferably 40 to 2500 seconds, and further preferably 80 to 220 seconds. Drying can be performed using a heating plate, an oven, etc.

The film manufacturing method may further include a step of forming a pattern. Examples of the pattern forming method include a pattern forming method using photolithography and a pattern forming method using dry etching. The pattern forming method using photolithography is preferred. In addition, when the film of the present invention is used as a flat film, the step of forming a pattern does not need to be performed. Hereinafter, the steps of forming the pattern will be described in detail.

(When using photolithography to form patterns) The pattern forming method using photolithography includes the step of exposing the composition layer formed by applying the composition of the present invention in a pattern (exposure step) and the step of developing and removing the unexposed portions of the composition layer to form the pattern ( Development step) is preferred. A step of baking the developed pattern (post-baking step) can be set as needed. Each step is explained below.

In the exposure step, the composition layer is exposed in a pattern. For example, a stepper exposure machine, a scanning exposure machine, or the like is used to expose the composition layer through a mask having a predetermined mask pattern, whereby the composition layer can be exposed in a pattern. Thereby, the exposed portion can be hardened.

Examples of radiation (light) that can be used during exposure include g-rays, i-rays, and the like. In addition, light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light having a wavelength of 300 nm or less include KrF rays (wavelength: 248 nm), ArF rays (wavelength: 193 nm), and KrF rays (wavelength: 248 nm) are preferred. In addition, a long-wavelength light source of 300 nm or more can also be used.

In addition, during exposure, light may be continuously irradiated for exposure, or pulse irradiation may be performed for exposure (pulse exposure). In addition, pulse exposure refers to an exposure method in which light is irradiated and paused repeatedly to perform exposure in a short period of time (for example, milliseconds or less).

For example, the irradiation amount (exposure amount) is preferably 0.03 to 2.5 J/cm ² , and more preferably 0.05 to 1.0 J/cm ² . The oxygen concentration during exposure can be appropriately selected. In addition to performing the exposure in the atmosphere, for example, the exposure can also be performed in a low-oxygen environment with an oxygen concentration of 19% by volume or less (for example, 15% by volume, 5% by volume, or substantially no oxygen). , it can also be exposed in a high oxygen environment with an oxygen concentration exceeding 21 volume % (for example, 22 volume %, 30 volume % or 50 volume %). In addition, the exposure illuminance can be appropriately set, and can usually be selected from the range of 1000W/m ² to 100000W/m ² (for example, 5000W/m ² , 15000W/m ² or 35000W/m ² ). The conditions of oxygen concentration and exposure illuminance can be combined appropriately. For example, the oxygen concentration can be 10 volume % and the illuminance is 10000 W/m ² , the oxygen concentration can be 35 volume % and the illuminance is 20000 W/m ² , etc.

Next, the composition layer is developed to remove the unexposed portions of the exposed composition layer to form a pattern. The composition layer in the unexposed portion can be removed by development using a developer. Thereby, the composition layer of the unexposed portion in the exposure step is dissolved into the developer, and only the photohardened portion remains on the support. For example, the temperature of the developer is preferably 20 to 30°C. The development time is preferably 20 to 180 seconds. In addition, in order to improve the residue removal performance, the step of shaking off the developer every 60 seconds and supplying new developer may be repeated several times.

Examples of the developer include organic solvents, alkali developers, and the like, and an alkali developer is preferably used. As an alkali developer, an alkaline aqueous solution (alkali developer) obtained by diluting an alkali agent with pure water is preferred. Examples of the alkaline agent include ammonia, ethylamine, diethylamine, dimethylethanolamine, diethylene glycolamine, diethanolamine, hydroxylamine, ethylenediamine, tetramethylammonium hydroxide, and tetraethyl hydroxide. Ammonium, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, bile Alkali, pyrrole, piperidine, 1,8-diazabicyclo[5.4.0]-7-undecene and other organic basic compounds or sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, silicic acid Sodium, sodium metasilicate and other inorganic alkaline compounds. From an environmental and safety perspective, it is better for the alkaline agent to be a compound with a large molecular weight. The concentration of the alkali agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, and more preferably 0.01 to 1% by mass. Moreover, the developer may further contain a surfactant. As the surfactant, nonionic surfactants are preferred. From the viewpoint of ease of transportation, storage, etc., the developer can be first produced as a concentrated solution and then diluted to a required concentration when used. The dilution ratio is not particularly limited, but can be set in the range of 1.5 to 100 times, for example. In addition, it is also preferable to wash (rinse) with pure water after development. Furthermore, it is preferable to perform rinsing by supplying a rinsing liquid to the developed composition layer while rotating the support on which the developed composition layer is formed. It is also preferable to move the nozzle that sprays the rinse liquid from the center of the support body to the peripheral edge of the support body. At this time, when moving the nozzle from the center part of the support body to the peripheral part, the moving speed of the nozzle may be gradually reduced while moving the nozzle. By performing flushing in this manner, in-plane unevenness of flushing can be suppressed. In addition, the same effect can also be obtained by gradually reducing the rotation speed of the support body while moving the nozzle from the center part of the support body to the peripheral part.

After development, it is preferable to perform additional exposure processing and heat processing (post-baking) after drying. The additional exposure process and post-baking are hardening processes after development for complete hardening. For example, the heating temperature in post-baking is preferably 100 to 240°C, and more preferably 200 to 240°C. In order to achieve the above conditions, heating mechanisms such as heating plates, convection ovens (hot air circulation dryers), and high-frequency heating machines can be used to post-bake the developed film in a continuous or intermittent manner. When performing additional exposure processing, it is preferable that the light used for exposure is light with a wavelength of 400 nm or less. In addition, the additional exposure process can be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

(When patterning using dry etching) When forming a pattern by a dry etching method, the composition layer formed by applying the above composition on a support is cured to form a cured material layer, and then a patterned pattern is formed on the cured material layer. The photoresist layer is then used as a mask, and etching gas is used to dry-etch the hardened material layer. When forming the photoresist layer, it is better to perform a pre-baking process. Regarding the formation of patterns by dry etching, please refer to paragraphs 0010 to 0067 of Japanese Patent Application Laid-Open No. 2013-064993, which content is incorporated into this specification.

＜Optical filter＞ The optical filter of the present invention has the above-mentioned film of the present invention. Examples of types of optical filters include infrared cut filters, infrared transmitting filters, and the like.

In addition to the above-mentioned film of the present invention, the optical filter of the present invention may further have a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, and the like. Examples of the ultraviolet absorbing layer include the absorbing layers described in paragraphs 0040 to 0070 and 0119 to 0145 of International Publication No. 2015/099060. Examples of the dielectric multilayer film include those described in paragraphs 0255 to 0259 of Japanese Patent Application Laid-Open No. 2014-041318. As the copper-containing layer, a glass substrate made of copper-containing glass (copper-containing glass substrate) or a layer containing a copper complex (copper complex-containing layer) can also be used. Examples of the copper-containing glass substrate include copper-containing phosphate glass, copper-containing fluorophosphate glass, and the like. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC TECHNO GLASS Co., Ltd.), BG-60, BG-61 (above, manufactured by Schott AG), CD5000 (manufactured by HOYA CORPORATION), and the like.

＜Solid-state imaging device＞ The solid-state imaging device of the present invention includes the film of the present invention described above. The structure of the solid-state imaging element is not particularly limited as long as it has a structure of the film of the present invention and functions as a solid-state imaging element. For example, the following structures are mentioned.

The solid-state imaging element has a structure in which a transmission electrode composed of a plurality of photodiodes, polysilicon, etc., which constitutes the light-receiving area of the solid-state imaging element, is provided on a support, and the photodiode and the transmission electrode have a light-receiving area of only the photodiode. A light-shielding film made of tungsten or the like with a partial opening, and an element protective film made of silicon nitride or the like formed to cover the entire light-shielding film and the light-receiving part of the photodiode on the light-shielding film, and the element protective film has the invention membrane. Furthermore, it may be a structure in which a light condensing mechanism (for example, a microlens, etc.; the same applies below) is provided on the element protection film and below (near the support side) of the film of the present invention, or the film of the present invention may be provided with a light condensing mechanism. The structure of the organization, etc. Furthermore, the color filter may have a structure in which a film forming each pixel is embedded in a space divided by partition walls into a grid shape, for example. At this time, it is preferable that the refractive index of the partition wall is lower than that of each pixel. Examples of imaging devices having such a structure include devices described in Japanese Patent Application Laid-Open No. 2012-227478 and Japanese Patent Application Laid-Open No. 2014-179577.

<Image display device> The image display device of the present invention includes the film of the present invention. Examples of image display devices include liquid crystal display devices, organic electroluminescence (organic EL) display devices, and the like. The definition and details of the image display device are described in, for example, "Electronic Display Device (by Akio Sasaki, published by Kogyo Chosakai Publishing Co., Ltd., 1990)" and "Display Device (by Junaki Ibuki, Sangyo Tosho Publishing)" Co., Ltd., issued in 1989)" etc. Further, the liquid crystal display device is described in, for example, "Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, published by Kogyo Chosakai Publishing Co., Ltd., 1994)". The liquid crystal display device to which the present invention can be applied is not particularly limited. For example, it can be applied to various types of liquid crystal display devices described in the above-mentioned "Next Generation Liquid Crystal Display Technology". The image display device may have a white organic EL element. As a white organic EL element, a series structure is preferred. Regarding the series structure of organic EL elements, it is described in Japanese Patent Application Laid-Open No. 2003-045676, supervised by Mikami Akiyoshi, "The Frontier of Organic EL Technology Development - High Brightness, High Precision, Long Lifetime, and Technology Collection-", TECHNICAL INFORMATION INSTITUTE CO.,LTD., pages 326～328, 2008, etc. The spectrum of the white light emitted by the organic EL element is preferably one with strong maximum luminescence peaks in the blue region (430-485nm), green region (530-580nm) and yellow region (580-620nm). In addition to these luminescence peaks, it is more preferable to have a maximum luminescence peak in the red region (650 to 700 nm).

＜Infrared sensor＞ The infrared sensor of the present invention includes the film of the present invention described above. The structure of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. Hereinafter, an embodiment of the infrared sensor of the present invention will be described with reference to the drawings.

In FIG. 1 , reference numeral 110 denotes a solid-state imaging element. An infrared cut filter 111 and an infrared transmitting filter 114 are arranged in the imaging area of the solid-state imaging element 110 . Furthermore, a color filter 112 is arranged on the infrared cut filter 111 . Microlenses 115 are arranged on the incident light hν side of the color filter 112 and the infrared transmission filter 114 . A planarization layer 116 is formed to cover the microlens 115 .

The infrared cut filter 111 can be formed using the composition of the present invention. The color filter 112 is a color filter formed with pixels that transmit and absorb light of a specific wavelength in the visible range, and is not particularly limited, and conventionally known color filters for forming pixels can be used. For example, a color filter in which red (R), green (G), and blue (B) pixels are formed may be used. For example, the description in paragraphs 0214 to 0263 of Japanese Patent Application Laid-Open No. 2014-043556 can be referred to, and this content is incorporated into this specification. The characteristics of the infrared transmission filter 114 can be selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the composition of the present invention.

In the infrared sensor shown in FIG. 1 , an infrared cutoff filter (other infrared cutoff filter) different from the infrared cutoff filter 111 may be further disposed on the planarization layer 116 . Examples of other infrared cut filters include those having a copper-containing layer and/or a dielectric multilayer film. Details of these include those mentioned above. In addition, as another infrared cut filter, a double bandpass filter can be used.

＜Camera Module＞ The camera module of the present invention includes a solid imaging element and the above-mentioned film of the present invention. The camera module preferably further has a lens and a circuit for processing images obtained from the solid-state imaging element. The solid-state imaging device used in the camera module may be the above-mentioned solid-state imaging device of the present disclosure or a known solid-state imaging device. In addition, known ones can be used as the lens used in the camera module and the circuit for processing the image obtained from the above-mentioned solid-state imaging element. As examples of camera modules, refer to the camera modules described in Japanese Patent Application Publication No. 2016-006476 and Japanese Patent Application Publication No. 2014-197190, the contents of which are incorporated into this specification. [Example]

Hereinafter, an Example is given and this invention is demonstrated more concretely. The materials, usage amounts, proportions, treatment contents, treatment procedures, etc. shown in the following examples can be appropriately changed as long as they do not deviate from the gist of the present invention.

<Synthesis example> (Synthesis of pigment (SQ-1)) [Chemical Formula 21]

Compound (SQ-M1) was synthesized by referring to the method described in Japanese Patent Application Laid-Open No. 2015-176046. Under a nitrogen atmosphere, 1.3g (6.8mmol) of compound (SQ-M1), 1.1mL (8.2mmol) of triethylamine, and 200mL of methylene chloride were added to a 500mL eggplant-shaped flask, and under ice-cooling, 50 mL of a methylene chloride solution of 1.17 g (3.1 mmol) of 2,2,3,3,4,4,5,5,6,6-decafluoroheptanedioyl-dichloride was slowly added dropwise. After the reaction liquid was stirred at room temperature for 1 hour, water was added and the liquid was separated using ethyl acetate. The obtained organic layer was dried over magnesium sulfate and concentrated under reduced pressure using a rotary evaporator. The obtained residue was purified by silica gel column chromatography to obtain 1.27 g of compound (SQ-1-A). Under a nitrogen atmosphere, 1.00g (1.46mmol) of compound (SQ-1-A), 300mL of toluene, 200mL of 1-butanol, and 0.14g (1.19mmol) of square acid were added to a 1L eggplant-shaped flask. acid and stirred under reflux for 3 hours. The reaction solution was concentrated under reduced pressure, and the obtained residue was purified by silica gel column chromatography to obtain 0.17 g of the target compound (pigment (SQ-1)). MS (Mass spectrometry): m/z=763.2[M+H] ⁺

(Synthesis of Pigment (SQ-4)) [Chemical Formula 22]

Under a nitrogen atmosphere, 1.3g (6.8mmol) of compound (SQ-M1), 1.1mL (8.2mmol) of triethylamine, and 200mL of methylene chloride were added to a 500mL eggplant-shaped flask, and under ice-cooling, 50 mL of a methylene chloride solution of 1.14 g (3.1 mmol) of 1,1,2,2,3,3,4,4-octafluorobutane-1,4-disulfonyldifluoride was slowly added dropwise. After the reaction liquid was stirred at room temperature for 1 hour, water was added and the liquid was separated using ethyl acetate. The obtained organic layer was dried over magnesium sulfate and concentrated under reduced pressure using a rotary evaporator. The obtained residue was purified by silica gel column chromatography to obtain 1.53 g of compound (SQ-4-A). Under a nitrogen atmosphere, 1.03g (1.46mmol) of compound (SQ-4-A), 300mL of toluene, 200mL of 1-butanol, and 0.14g (1.19mmol) of squaraine were added to a 1L eggplant-shaped flask. , and stirred under heating and reflux for 3 hours. The reaction solution was concentrated under reduced pressure, and the obtained residue was purified by silica gel column chromatography to obtain 0.17 g of the target compound (pigment (SQ-4)). MS (Mass spectrometry): m/z=785.2[M+H] ⁺

＜Evaluation of visible transparency＞ The pigments described in the following tables were dissolved in the solvents described in the following tables to prepare pigment solutions. The absorbance of the obtained dye solution with respect to light with a wavelength of 400 to 1200 nm was measured using a spectrophotometer (UH-4150, manufactured by Hitachi High-Tech Science Corporation). The wavelength (λmax) at which the absorbance shows the maximum value was measured in the wavelength range of 400 nm to 1200 nm, and the average absorbance value at the wavelength of 440 to 475 nm was calculated when the absorbance value at λmax was set to 1, and evaluated based on the following standards. Visible transparency. It can be said that the smaller the above average absorbance value, the higher the visible transparency. A: The average absorbance at wavelength 440~475nm does not reach 0.0035 B: The average absorbance at wavelength 440 to 475 nm is 0.0035 or more and less than 0.005 C: The average absorbance at wavelength 440 to 475nm is 0.005 or more and less than 0.007 D: The average absorbance at wavelength 440~475nm is 0.007 or more

[Table 1] pigment Solvent λmax [nm] visible transparency SQ-1 Chloroform 712 B SQ-2 Chloroform 712 B SQ-3 Chloroform 683 B SQ-4 Chloroform 703 A SQ-5 Chloroform 703 A SQ-6 Chloroform 674 A SQ-7 Chloroform 703 B SQ-8 Chloroform 703 B SQ-9 Chloroform 703 B SQ-10 Chloroform 703 B SQ-11 Chloroform 683 B SQ-12 Chloroform 712 B SQ-13 Chloroform 712 B SQ-14 Chloroform 703 A SQ-15 Chloroform 703 A SQ-16 Chloroform 703 A SQ-17 Chloroform 705 C SQ-18 Dichloromethane 857 B SQ-19 Dichloromethane 857 A SQ-B-1 Chloroform 708 D SQ-B-2 Chloroform 691 D

Compared with dye SQ-B-1 and dye SQ-B-2, dyes SQ-1 to SQ-19 have superior visible transparency. Pigments SQ-1 to SQ-19 are compounds with the following structures (dyes represented by formula (1)). The dye SQ-B-1 and the dye SQ-B-2 are compounds with the following structures (comparative dyes). [Chemical formula 23] [Chemical formula 24] [Chemical formula 25]

＜Manufacture of composition＞ Each material was mixed in the proportions of Formula 1, Formula 2, Formula 3, or Formula 4 shown below, and filtered through a nylon filter (manufactured by Nihon Pall Ltd.) with a pore size of 0.45 μm to produce each composition. things.

＜Recipe 1＞ Pigments listed in the table below ･･････Parts by mass stated in the table Resin listed in the following table ･･････70.0 parts by mass Photopolymerization initiator listed in the following table ･･････5.0 parts by mass Polymerizable compounds listed in the following table ･･････20.0 parts by mass Surfactant listed in the following table ･･････0.01 parts by mass Antioxidants listed in the table below ･･････3.3 parts by mass Polymerization inhibitors listed in the following table ･･････0.001 parts by mass Solvents listed in the table below ･･････200.0 parts by mass

＜Recipe 2＞ Pigments listed in the table below ･･････Parts by mass stated in the table Epoxy compounds listed in the following table ･･････95.0 parts by mass Hardeners listed in the following table (when stated in the table) ･･････1.5 parts by mass Surfactant listed in the following table ･･････0.01 parts by mass Antioxidants listed in the table below ･･････3.3 parts by mass Solvents listed in the table below ･･････200.0 parts by mass

＜Recipe 3＞ Pigments listed in the table below ･･････Parts by mass stated in the table Epoxy compounds listed in the following table ･･････90.0 parts by mass Ultraviolet absorber listed in the following table ･･････5.0 parts by mass Surfactant listed in the following table ･･････0.01 parts by mass Antioxidants listed in the table below ･･････3.3 parts by mass Solvents listed in the table below ･･････200.0 parts by mass

＜Recipe 4＞ Pigments listed in the table below ･･････Parts by mass stated in the table Resin listed in the table below ･･････95.0 parts by mass Antioxidants listed in the table below ･･････3.3 parts by mass Solvents listed in the table below ･･････200.0 parts by mass

[Table 2] formula pigment pigment Resin Photopolymerization initiator polymeric compound surfactant Antioxidants polymerization inhibitor Solvent Kind Blending amount (mass parts) Kind Blending amount (mass parts) Example 1 Recipe 1 SQ-1 0.2 - - E-1 C-1 M-1 H-1 AO-1 I-1 S-1 Example 2 Recipe 1 SQ-2 0.2 - - E-3 C-2 M-2 H-2 AO-1 I-1 S-2 Example 3 Recipe 1 SQ-3 0.2 - - E-1/E-2=9/1 (mass ratio) C-3 M-3 H-3 AO-3 I-1 S-1/S-4=1/3 (mass ratio) Example 4 Recipe 1 SQ-4 0.2 - - E-4 C-2/C-3=3/1 (mass ratio) M-1/M-2=2/1 (mass ratio) H-2 AO-1/AO-3=1/1 (mass ratio) I-1 S-1 Example 5 Recipe 1 SQ-5 0.2 - - E-2/E-3=1/4 (mass ratio) C-1/C-3=5/1 (mass ratio) M-2 H-1/H-2=1/1 (mass ratio) AO-2 I-1 S-3/S-4=1/4 (mass ratio) Example 6 Recipe 1 SQ-6 0.2 - - E-5 C-2/C-4=2/3 (mass ratio) M-1 H-2/H-3=2/1 (mass ratio) AO-2/AO-5=2/1 (mass ratio) I-1 S-2/S-7=1/1 (mass ratio) Example 7 Recipe 1 SQ-7 0.2 - - E-4/E-7=14/1 (mass ratio) C-2 M-1/M-3=1/4 (mass ratio) H-3 AO-1 I-1 S-1/S-3=11/3 (mass ratio) Example 8 Recipe 1 SQ-8 0.2 - - E-1/E-4=1/1 (mass ratio) C-1 M-3 H-1/H-3=1/3 (mass ratio) AO-5 I-1 S-1 Example 9 Recipe 1 SQ-9 0.2 - - E-1 C-3 M-1 H-2/H-3=2/3 (mass ratio) AO-1 I-1 S-1 Example 10 Recipe 1 SQ-10 0.2 - - E-4/E-5=1/1 (mass ratio) C-2/C-3=1/2 (mass ratio) M-3 H-3 AO-1/AO-3=3/1 (mass ratio) I-1 S-1/S-2/S-7=2/1/1 (mass ratio) Example 11 Recipe 1 SQ-11 0.2 - - E-1/E-3=1/3 (mass ratio) C-4 M-2 H-1 AO-1 I-1 S-2 Example 12 Recipe 1 SQ-12 0.2 - - E-1 C-1/C-3=3/2 (mass ratio) M-1/M-3=3/1 (mass ratio) H-2 AO-3 I-1 S-1/S-4=1/2 (mass ratio) Example 13 Recipe 1 SQ-13 0.2 - - E-3/E-6=14/1 (mass ratio) C-3 M-3 H-3 AO-4 I-1 S-2/S-3=11/3 (mass ratio) Example 14 Recipe 1 SQ-14 0.2 - - E-4/E-7=19/1 (mass ratio) C-1 M-2/M-3=1/1 (mass ratio) H-2 AO-3/AO-4=3/2 (mass ratio) I-1 S-1/S-3=6/1 (mass ratio) Example 15 Recipe 1 SQ-15 0.2 - - E-3 C-1/C-4=4/1 (mass ratio) M-2 H-1/H-2=3/2 (mass ratio) AO-1 I-1 S-2 [table 3] formula pigment pigment Resin Photopolymerization initiator polymeric compound surfactant Antioxidants polymerization inhibitor Solvent Kind Blending amount (mass parts) Kind Blending amount (mass parts) Example 16 Recipe 1 SQ-16 0.2 - - E-1 C-3 M-1 H-2 AO-3 I-1 S-1 Example 17 Recipe 1 SQ-17 0.2 - - E-1/E-2=9/1 (mass ratio) C-1 M-1/M-2=1/4 (mass ratio) H-1/H-3=1/1 (mass ratio) AO-4 I-1 S-3 Example 18 Recipe 1 SQ-18 0.2 - - E-1 C-2 M-1 H-2 AO-1 I-1 S-1 Example 19 Recipe 1 SQ-19 0.2 - - E-3 C-1 M-2 H-1 AO-2 I-1 S-2 Example 20 Recipe 1 SQ-1 0.2 Z-1 2.0 E-1 C-1 M-1 H-1 AO-1 I-1 S-1 Example 21 Recipe 1 SQ-2 0.2 Z-2 2.0 E-5 C-4 M-1/M-3=1/1 (mass ratio) H-3 AO-2/AO-3=1/2 (mass ratio) I-1 S-2/S-7=1/1 (mass ratio) Example 22 Recipe 1 SQ-3 0.2 Z-3 2.0 E-2/E-3=1/4 (mass ratio) C-2 M-3 H-1/H-2=2/1 (mass ratio) AO-4 I-1 S-3/S-4=1/4 (mass ratio) Example 23 Recipe 1 SQ-4 0.2 Z-4 2.0 E-4/E-5=1/1 (mass ratio) C-1/C-2=3/1 (mass ratio) M-3 H-1 AO-3 I-1 S-1/S-2/S-7=2/1/1 (mass ratio) Example 24 Recipe 1 SQ-5 0.2 Z-5 2.0 E-1 C-3 M-2 H-2 AO-5 I-1 S-1 Example 25 Recipe 1 SQ-6 0.2 Z-6 2.0 E-4 C-4 M-1/M-2=1/2 (mass ratio) H-3 AO-2 I-1 S-1 Example 26 Recipe 1 SQ-7 0.2 Z-7 2.0 E-1/E-2=9/1 (mass ratio) C-1 M-1 H-2 AO-2/AO-4=3/2 (mass ratio) I-1 S-1/S-4=1/3 (mass ratio) Example 27 Recipe 1 SQ-8 0.2 Z-8 2.0 E-5 C-2 M-1/M-2=3/1 (mass ratio) H-1 AO-3 I-1 S-2/S-7=1/1 (mass ratio) Example 28 Recipe 1 SQ-9 0.2 Z-9 2.0 E-1 C-3/C-4=3/2 (mass ratio) M-2/M-3=2/1 (mass ratio) H-2/H-3=3/1 (mass ratio) AO-1/AO-2=2/1 (mass ratio) I-1 S-1 Example 29 Recipe 1 SQ-10 0.2 Z-10 2.0 E-4/E-7=14/1 (mass ratio) C-1 M-2 H-3 AO-5 I-1 S-1/S-3=11/3 (mass ratio) Example 30 Recipe 1 SQ-11 0.2 Z-11 2.0 E-4 C-2/C-3=1/1 (mass ratio) M-3 H-2 AO-4 I-1 S-1 [Table 4] formula pigment pigment Resin Photopolymerization initiator polymeric compound surfactant Antioxidants polymerization inhibitor Solvent Kind Blending amount (mass parts) Kind Blending amount (mass parts) Example 31 Recipe 1 SQ-12 0.2 Z-12 2.0 E-3/E-6=14/1 (mass ratio) C-3 M-2 H-3 AO-1/AO-3=2/3 (mass ratio) I-1 S-2/S-3=11/3 (mass ratio) Example 32 Recipe 1 SQ-13 0.2 Z-13 2.0 E-5 C-2 M-1 H-1/H-3=2/3 (mass ratio) AO-1 I-1 S-2/S-7=1/1 (mass ratio) Example 33 Recipe 1 SQ-14 0.2 Z-14 2.0 E-1/E-2=9/1 C-3 M-3 H-2 AO-2 I-1 S-3 Example 34 Recipe 1 SQ-15 0.2 Z-15 2.0 E-4 C-4 M-1 H-1 AO-5 I-1 S-1 Example 35 Recipe 1 SQ-16 0.2 Z-16 2.0 E-1/E-3=1/3 (mass ratio) C-2 M-1/M-3=3/1 (mass ratio) H-1 AO-1 I-1 S-2 Example 36 Recipe 1 SQ-18 0.2 Z-1 2.0 E-1/E-2=9/1 (mass ratio) C-1 M-1/M-2=1/2 (mass ratio) H-1 AO-1/AO-2=2/1 (mass ratio) I-1 S-3 Example 37 Recipe 1 SQ-19 0.2 Z-12 2.0 E-1 C-2/C-3=1/1 (mass ratio) M-1 H-1/H-2=2/1 (mass ratio) AO-1 I-1 S-1 Example 38 Recipe 1 SQ-1 0.2 SQ-18 0.2 E-1 C-1 M-1 H-2 AO-1 I-1 S-1 Example 39 Recipe 1 SQ-4 0.2 SQ-19 0.2 E-3 C-1 M-2 H-1 AO-2 I-1 S-2 Example 40 Recipe 1 SQ-1 0.2 SQ-4 0.2 E-1 C-2 M-1 H-1 AO-1 I-1 S-1 Comparative example 1 Recipe 1 SQ-B-1 0.2 - - E-1 C-1 M-1 H-1 AO-1 I-1 S-1 Comparative example 2 Recipe 1 SQ-B-2 0.2 - - E-1 C-1 M-1 H-1 AO-1 I-1 S-1 [table 5] formula pigment pigment Epoxy compound Hardener surfactant Antioxidants Solvent Kind Blending amount (mass parts) Kind Blending amount (mass parts) Example 101 Recipe 2 SQ-1 0.2 - - F-1 - H-1 AO-1 S-3/S-4=4/1 (mass ratio) Example 102 Recipe 2 SQ-2 0.2 - - F-2 - H-2 AO-1 S-3 Example 103 Recipe 2 SQ-3 0.2 - - F-3 G-2 H-3 AO-2 S-4 Example 104 Recipe 2 SQ-4 0.2 - - F-4 G-1 H-2 AO-1/AO-2=1/1 (mass ratio) S-3/S-4=3/1 (mass ratio) Example 105 Recipe 2 SQ-5 0.2 - - F-5 G-3 H-1/H-2=1/1 (mass ratio) AO-2 S-3 Example 106 Recipe 2 SQ-6 0.2 - - F-2/F-3=1/1 (mass ratio) - H-2/H-3=2/1 (mass ratio) AO-1/AO-4=2/1 (mass ratio) S-3/S-4=2/1 (mass ratio) Example 107 Recipe 2 SQ-7 0.2 - - F-1/F-4=2/1 (mass ratio) - H-3 AO-1 S-3 Example 108 Recipe 2 SQ-8 0.2 - - F-2/F-5=1/1 (mass ratio) - H-1/H-3=1/3 (mass ratio) AO-3 S-3/S-4=1/3 (mass ratio) Example 109 Recipe 2 SQ-9 0.2 - - F-1 - H-1 AO-1 S-3 Example 110 Recipe 2 SQ-10 0.2 - - F-1 - H-2 AO-4 S-3/S-4=3/2 (mass ratio) Example 111 Recipe 2 SQ-11 0.2 - - F-4 G-2 H-1 AO-2 S-3 Example 112 Recipe 2 SQ-12 0.2 - - F-1 - H-3 AO-1 S-3 Example 113 Recipe 2 SQ-13 0.2 - - F-2 - H-2 AO-2/AO-5=1/3 (mass ratio) S-3 Example 114 Recipe 2 SQ-14 0.2 - - F-5 G-1 H-1 AO-5 S-4 Example 115 Recipe 2 SQ-15 0.2 - - F-1 - H-1 AO-1 S-3/S-4=2/3 (mass ratio) [Table 6] formula pigment pigment Epoxy compound Hardener surfactant Antioxidants Solvent Kind Blending amount (mass parts) Kind Blending amount (mass parts) Example 116 Recipe 2 SQ-16 0.2 - - F-3 G-3 H-1 AO-3/AO-4=2/5 (mass ratio) S-3 Example 117 Recipe 2 SQ-17 0.2 - - F-1 - H-3 AO-1 S-4 Example 118 Recipe 2 SQ-18 0.2 - - F-1 - H-1 AO-2 S-3 Example 119 Recipe 2 SQ-19 0.2 - - F-2 - H-3 AO-1 S-3 Example 120 Recipe 2 SQ-1 0.2 Z-1 2.0 F-1 - H-1 AO-1 S-3 Example 121 Recipe 2 SQ-2 0.2 Z-2 2.0 F-3 - H-3 AO-2/AO-3=1/2 (mass ratio) S-4 Example 122 Recipe 2 SQ-3 0.2 Z-3 2.0 F-2 - H-1/H-2=2/1 (mass ratio) AO-4 S-3 Example 123 Recipe 2 SQ-4 0.2 Z-4 2.0 F-4/F-5=1/3 (mass ratio) - H-1 AO-3 S-4 Example 124 Recipe 2 SQ-5 0.2 Z-5 2.0 F-5 - H-2 AO-5 S-3 Example 125 Recipe 2 SQ-6 0.2 Z-6 2.0 F-1 - H-3 AO-2 S-4 Example 126 Recipe 2 SQ-7 0.2 Z-7 2.0 F-2 - H-2 AO-2/AO-4=3/2 (mass ratio) S-3 Example 127 Recipe 2 SQ-8 0.2 Z-8 2.0 F-3/F-4=3/1 (mass ratio) - H-1 AO-3 S-4 Example 128 Recipe 2 SQ-9 0.2 Z-9 2.0 F-5 - H-2/H-3=3/1 (mass ratio) AO-1/AO-2=2/1 (mass ratio) S-3 Example 129 Recipe 2 SQ-10 0.2 Z-10 2.0 F-3 - H-3 AO-5 S-4 Example 130 Recipe 2 SQ-11 0.2 Z-11 2.0 F-1/F-2=1/1 (mass ratio) - H-2 AO-4 S-3 [Table 7] formula pigment pigment Epoxy compound Hardener surfactant Antioxidants Solvent Kind Blending amount (mass parts) Kind Blending amount (mass parts) Example 131 Recipe 2 SQ-12 0.2 Z-12 2.0 F-3/F-5=2/5 (mass ratio) - H-3 AO-1/AO-3=2/3 (mass ratio) S-4 Example 132 Recipe 2 SQ-13 0.2 Z-13 2.0 F-1 - H-1/H-3=2/3 (mass ratio) AO-1 S-3 Example 133 Recipe 2 SQ-14 0.2 Z-14 2.0 F-3 - H-2 AO-2 S-4 Example 134 Recipe 2 SQ-15 0.2 Z-15 2.0 F-4 - H-1 AO-5 S-3 Example 135 Recipe 2 SQ-16 0.2 Z-16 2.0 F-2 - H-1 AO-1 S-4 Example 136 Recipe 2 SQ-18 0.2 Z-1 2.0 F-2 - H-3 AO-1 S-3 Example 137 Recipe 2 SQ-19 0.2 Z-12 2.0 F-4 - H-1 AO-2 S-3 Example 138 Recipe 2 SQ-1 0.2 SQ-18 0.2 F-2 - H-3 AO-2 S-3 Example 139 Recipe 2 SQ-4 0.2 SQ-19 0.2 F-1 - H-2 AO-1 S-3 Example 140 Recipe 2 SQ-1 0.2 SQ-4 0.2 F-3 - H-1 AO-1 S-3 Comparative example 101 Recipe 2 SQ-B-1 0.2 - - F-1 - H-1 AO-1 S-3 Comparative example 102 Recipe 2 SQ-B-2 0.2 - - F-2 - H-1 AO-1 S-3 [Table 8] formula pigment pigment Epoxy compound UV absorber surfactant Antioxidants Solvent Kind Blending amount (mass parts) Kind Blending amount (mass parts) Example 201 Recipe 3 SQ-1 0.2 - - F-1 U-1 H-1 AO-1 S-1/S-3=1/4 (mass ratio) Example 202 Recipe 3 SQ-2 0.2 - - F-2 U-1/U-2=1/1 (mass ratio) H-2 AO-1 S-3 Example 203 Recipe 3 SQ-3 0.2 - - F-3 U-2 H-3 AO-2 S-1 Example 204 Recipe 3 SQ-4 0.2 - - F-4 U-1/U-3=2/1 (mass ratio) H-2 AO-1/AO-2=1/1 (mass ratio) S-2/S-4=1/3 (mass ratio) Example 205 Recipe 3 SQ-5 0.2 - - F-5 U-3 H-1/H-2=1/1 (mass ratio) AO-2 S-3 Example 206 Recipe 3 SQ-6 0.2 - - F-2/F-3=1/1 (mass ratio) U-2 H-2/H-3=2/1 (mass ratio) AO-1/AO-4=2/1 (mass ratio) S-1/S-3=2/1 (mass ratio) Example 207 Recipe 3 SQ-7 0.2 - - F-1/F-4=2/1 (mass ratio) U-2/U-3=1/3 (mass ratio) H-3 AO-1 S-3 Example 208 Recipe 3 SQ-8 0.2 - - F-2/F-5=1/1 (mass ratio) U-1 H-1/H-3=1/3 (mass ratio) AO-3 S-1/S-4=1/3 (mass ratio) Example 209 Recipe 3 SQ-9 0.2 - - F-1 U-1 H-1 AO-1 S-1 Example 210 Recipe 3 SQ-10 0.2 - - F-1 U-3 H-2 AO-4 S-1/S-3=3/2 (mass ratio) Example 211 Recipe 3 SQ-11 0.2 - - F-4 U-2 H-1 AO-2 S-1 Example 212 Recipe 3 SQ-12 0.2 - - F-1 U-1 H-3 AO-1 S-3 Example 213 Recipe 3 SQ-13 0.2 - - F-2 U-1/U-3=1/3 (mass ratio) H-2 AO-2/AO-5=1/3 (mass ratio) S-1 Example 214 Recipe 3 SQ-14 0.2 - - F-5 U-1 H-1 AO-5 S-1 Example 215 Recipe 3 SQ-15 0.2 - - F-1 U-3 H-1 AO-1 S-1/S-3=2/3 (mass ratio) [Table 9] formula pigment pigment Epoxy compound UV absorber surfactant Antioxidants Solvent Kind Blending amount (mass parts) Kind Blending amount (mass parts) Example 216 Recipe 3 SQ-16 0.2 - - F-3 U-2/U-3=4/1 (mass ratio) H-1 AO-3/AO-4=2/5 (mass ratio) S-3 Example 217 Recipe 3 SQ-17 0.2 - - F-1 U-2 H-3 AO-1 S-1 Example 218 Recipe 3 SQ-18 0.2 - - F-1 U-1 H-1 AO-2 S-3 Example 219 Recipe 3 SQ-19 0.2 - - F-3 U-2 H-3 AO-1 S-3 Example 220 Recipe 3 SQ-1 0.2 Z-1 2.0 F-1 U-1 H-1 AO-1 S-3 Example 221 Recipe 3 SQ-2 0.2 Z-2 2.0 F-3 U-1/U-2=2/1 (mass ratio) H-3 AO-2/AO-3=1/2 (mass ratio) S-4 Example 222 Recipe 3 SQ-3 0.2 Z-3 2.0 F-2 U-1 H-1/H-2=2/1 (mass ratio) AO-4 S-3 Example 223 Recipe 3 SQ-4 0.2 Z-4 2.0 F-4/F-5=1/3 (mass ratio) U-2 H-1 AO-3 S-4 Example 224 Recipe 3 SQ-5 0.2 Z-5 2.0 F-5 U-1 H-2 AO-5 S-3 Example 225 Recipe 3 SQ-6 0.2 Z-6 2.0 F-1 U-1 H-3 AO-2 S-4 Example 226 Recipe 3 SQ-7 0.2 Z-7 2.0 F-2 U-3 H-2 AO-2/AO-4=3/2 (mass ratio) S-3 Example 227 Recipe 3 SQ-8 0.2 Z-8 2.0 F-3/F-4=3/1 (mass ratio) U-1 H-1 AO-3 S-4 Example 228 Recipe 3 SQ-9 0.2 Z-9 2.0 F-5 U-2/U-3=1/1 (mass ratio) H-2/H-3=3/1 (mass ratio) AO-1/AO-2=2/1 (mass ratio) S-3 Example 229 Recipe 3 SQ-10 0.2 Z-10 2.0 F-3 U-3 H-3 AO-5 S-4 Example 230 Recipe 3 SQ-11 0.2 Z-11 2.0 F-1/F-2=1/1 (mass ratio) U-2 H-2 AO-4 S-3 [Table 10] formula pigment pigment Epoxy compound UV absorber surfactant Antioxidants Solvent Kind Blending amount (mass parts) Kind Blending amount (mass parts) Example 231 Recipe 3 SQ-12 0.2 Z-12 2.0 F-3/F-5=2/5 (mass ratio) U-1 H-3 AO-1/AO-3=2/3 (mass ratio) S-4 Example 232 Recipe 3 SQ-13 0.2 Z-13 2.0 F-1 U-2 H-1/H-3=2/3 (mass ratio) AO-1 S-3 Example 233 Recipe 3 SQ-14 0.2 Z-14 2.0 F-3 U-3 H-2 AO-2 S-4 Example 234 Recipe 3 SQ-15 0.2 Z-15 2.0 F-4 U-1 H-1 AO-5 S-3 Example 235 Recipe 3 SQ-16 0.2 Z-16 2.0 F-2 U-2 H-1 AO-1 S-4 Example 236 Recipe 3 SQ-18 0.2 Z-1 2.0 F-2 U-2 H-3 AO-1 S-3 Example 237 Recipe 3 SQ-19 0.2 Z-12 2.0 F-4 U-3 H-1 AO-2 S-3 Example 238 Recipe 3 SQ-1 0.2 SQ-18 0.2 F-2 U-1 H-3 AO-2 S-3 Example 239 Recipe 3 SQ-4 0.2 SQ-19 0.2 F-1 U-1 H-2 AO-1 S-3 Example 240 Recipe 3 SQ-1 0.2 SQ-4 0.2 F-3 U-2 H-1 AO-1 S-3 [Table 11] formula pigment pigment Resin Antioxidants Solvent Kind Blending amount (mass parts) Kind Blending amount (mass parts) Example 301 Recipe 4 SQ-1 0.2 - - E-2 AO-1 S-5 Example 302 Recipe 4 SQ-2 0.2 - - E-6 AO-1 S-6 Example 303 Recipe 4 SQ-3 0.2 - - E-7 AO-3 S-5 Example 304 Recipe 4 SQ-4 0.2 - - E-2/E-6=1/1 (mass ratio) AO-1/AO-3=1/1 (mass ratio) S-5/S-6=1/1 (mass ratio) Example 305 Recipe 4 SQ-5 0.2 - - E-2 AO-2 S-5 Example 306 Recipe 4 SQ-6 0.2 - - E-6/E-7=2/1 (mass ratio) AO-1/AO-3=2/1 (mass ratio) S-5/S-6=1/2 (mass ratio) Example 307 Recipe 4 SQ-7 0.2 - - E-6 AO-1 S-6 Example 308 Recipe 4 SQ-8 0.2 - - E-7 AO-1 S-5 Example 309 Recipe 4 SQ-9 0.2 - - E-2 AO-1 S-5 Example 310 Recipe 4 SQ-10 0.2 - - E-2/E-7=2/1 (mass ratio) AO-1/AO-3=3/1 (mass ratio) S-5 Example 311 Recipe 4 SQ-11 0.2 - - E-2 AO-1 S-5 Example 312 Recipe 4 SQ-12 0.2 - - E-6 AO-3 S-6 Example 313 Recipe 4 SQ-13 0.2 - - E-2/E-6=2/1 (mass ratio) AO-1 S-5/S-6=2/1 (mass ratio) Example 314 Recipe 4 SQ-14 0.2 - - E-7 AO-1/AO-3=3/2 (mass ratio) S-5 Example 315 Recipe 4 SQ-15 0.2 - - E-2/E-7=1/3 (mass ratio) AO-1 S-5 [Table 12] formula pigment pigment Resin Antioxidants Solvent Kind Blending amount (mass parts) Kind Blending amount (mass parts) Example 316 Recipe 4 SQ-16 0.2 - - E-2 AO-3 S-5 Example 317 Recipe 4 SQ-17 0.2 - - E-6 AO-1 S-6 Example 318 Recipe 4 SQ-17 0.2 - - E-2 AO-1 S-5 Example 319 Recipe 4 SQ-18 0.2 - - E-6 AO-3 S-6 Example 320 Recipe 4 SQ-1 0.2 Z-1 2.0 E-2 AO-1/AO-3=2/1 (mass ratio) S-5 Example 321 Recipe 4 SQ-2 0.2 Z-2 2.0 E-6 AO-1 S-6 Example 322 Recipe 4 SQ-3 0.2 Z-3 2.0 E-2/E-6=1/1 (mass ratio) AO-1/AO-2=1/1 (mass ratio) S-5/S-6=1/1 (mass ratio) Example 323 Recipe 4 SQ-4 0.2 Z-4 2.0 E-7 AO-3 S-5 Example 324 Recipe 4 SQ-5 0.2 Z-5 2.0 E-2 AO-1 S-5 Example 325 Recipe 4 SQ-6 0.2 Z-6 2.0 E-7 AO-1 S-5 Example 326 Recipe 4 SQ-7 0.2 Z-7 2.0 E-6 AO-1/AO-2=1/2 (mass ratio) S-6 Example 327 Recipe 4 SQ-8 0.2 Z-8 2.0 E-2/E-6=2/1 (mass ratio) AO-1 S-5/S-6=2/1 (mass ratio) Example 328 Recipe 4 SQ-9 0.2 Z-9 2.0 E-6 AO-1/AO-3=1/1 (mass ratio) S-6 Example 329 Recipe 4 SQ-10 0.2 Z-10 2.0 E-2 AO-2 S-5 Example 330 Recipe 4 SQ-11 0.2 Z-11 2.0 E-2/E-7=1/1 (mass ratio) AO-2 S-5 [Table 13] formula pigment pigment Resin Antioxidants Solvent Kind Blending amount (mass parts) Kind Blending amount (mass parts) Example 331 Recipe 4 SQ-12 0.2 Z-12 2.0 E-2 AO-1 S-5 Example 332 Recipe 4 SQ-13 0.2 Z-13 2.0 E-6/E-7=1/3 (mass ratio) AO-3 S-5/S-6=3/1 (mass ratio) Example 333 Recipe 4 SQ-14 0.2 Z-14 2.0 E-7 AO-2/AO-3=1/1 (mass ratio) S-5 Example 334 Recipe 4 SQ-15 0.2 Z-15 2.0 E-6 AO-3 S-6 Example 335 Recipe 4 SQ-16 0.2 Z-16 2.0 E-7 AO-2/AO-3=3/1 (mass ratio) S-5 Example 336 Recipe 4 SQ-17 0.2 Z-1 2.0 E-7 AO-2 S-5 Example 337 Recipe 4 SQ-18 0.2 Z-12 2.0 E-2 AO-1 S-5 Example 338 Recipe 4 SQ-1 0.2 SQ-18 0.2 E-2 AO-1 S-5 Example 339 Recipe 4 SQ-4 0.2 SQ-19 0.2 E-6 AO-1 S-5 Example 340 Recipe 4 SQ-1 0.2 SQ-4 0.2 E-2 AO-2 S-5 Comparative example 301 Recipe 4 SQ-B-1 0.2 - - E-2 AO-1 S-1 Comparative example 302 Recipe 4 SQ-B-2 0.2 - - E-2 AO-1 S-1

Among the materials described in the above table, details of materials other than dyes SQ-1 to SQ-19, dye SQ-B-1, and dye SQ-B-2 are as follows.

(Pigment) Z-1 to Z-16: Compounds of the following structure (the value of the maximum absorption wavelength (λmax) in methylene chloride is also stated) [Chemical Formula 26] [Chemical formula 27]

(Resin) E-1: Copolymer resin of benzyl methacrylate, methacrylic acid, and 2-hydroxyethyl methacrylate (weight average molecular weight 14,000, acid value 77 mgKOH/g, alkali-soluble resin) [Chemical Formula 28] E-2: Resin with the following structure (weight average molecular weight 137000, number average molecular weight 32000, glass transition temperature 165°C) [Chemical Formula 29] E-3: Resin with the following structure (the value of the repeating unit is the mass ratio, the weight average molecular weight is 15100, and the number average molecular weight is 7000) [Chemical Formula 30] E-4: Resin with the following structure (the value of the repeating unit is the mass ratio, the weight average molecular weight is 9700, the number average molecular weight is 5700) [Chemical Formula 31] E-5: Resin with the following structure (the value of the repeating unit is the mass ratio, the weight average molecular weight is 9500, the number average molecular weight is 5800) [Chemical Formula 32] E-6: Resin with the following structure (weight average molecular weight 188,000, number average molecular weight 75,000, glass transition temperature 285°C) [Chemical Formula 33] E-7: Resin with the following structure (glass transition temperature 310°C, logarithmic viscosity 0.87) [Chemical Formula 34]

(polymeric compound) M-1: KAYARAD DPHA (manufactured by Nippon Kayaku Co., Ltd., a mixture of dipenterythritol hexaacrylate and dipenterythritol pentaacrylate) M-2: KAYARAD RP-1040 (manufactured by Nippon Kayaku Co., Ltd., ethylene oxide modified neopentyl tetraacrylate) M-3: ARONIX M-510 (manufactured by TOAGOSEI CO., LTD., polybasic acid-modified acrylic oligomer)

(Photopolymerization initiator) C-1: Irgacure OXE01 (manufactured by BASF, oxime compound) C-2: A compound with the following structure [Chemical Formula 35] C-3: Omnirad 907 (manufactured by IGM Resins BV, α-aminoketone compound) C-4: A compound with the following structure [Chemical Formula 36]

(Epoxy compound) F-1: Resin with the following structure (the values of the repeating units are mass ratios, weight average molecular weight 20000, number average molecular weight 8300, epoxy equivalent 284g/eq, acid value 130mgKOH/g, glass transition temperature 136 ℃) [Chemical formula 37] F-2: Resin with the following structure (the value of the repeating unit is the mass ratio, the weight average molecular weight is 26100, the number average molecular weight is 8600, the epoxy equivalent is 355g/eq, the acid value is 163mgKOH/g, the glass transition temperature is 133℃) [Chemical Formula 38 ] F-3: Resin with the following structure (the value of the repeating unit is the mass ratio, the weight average molecular weight is 21100, the number average molecular weight is 8500, the epoxy equivalent is 355g/eq, the acid value is 130mgKOH/g, the glass transition temperature is 157℃) [Chemical Formula 39 ] F-4: Resin with the following structure (the value of the repeating unit is the mass ratio, the weight average molecular weight is 18300, the number average molecular weight is 9100, the epoxy equivalent is 284g/eq, the acid value is 98mgKOH/g, the glass transition temperature is 134°C) [Chemical Formula 40 ] F-5: Resin with the following structure (the value of the repeating unit is the mass ratio, the weight average molecular weight is 22900, the number average molecular weight is 8800, the epoxy equivalent is 316g/eq, the acid value is 130mgKOH/g, the glass transition temperature is 124℃) [Chemical Formula 41 ]

(hardener) G-1: Trimellitic acid G-2: Karenz MT PEI (manufactured by SHOWA DENKO K.K.) G-3: Neopenterythritol tetrakis(3-mercaptopropionate)

(Surfactant) H-1: FTX-218D (manufactured by Neos Corporation, fluorine-based surfactant) H-2: A compound with the following structure (weight-average molecular weight: 14,000, the value indicating the proportion of repeating units in % is molar %) [Chemical formula 42] H-3: KF-6001 (manufactured by Shin-Etsu Chemical Co., Ltd., polysilicone-based surfactant) H-4: MEGAFACE F-554 (manufactured by DIC Corporation, fluorine-based surfactant)

(Antioxidant) AO-1: JP-650 (tris(2,4-di-tertiary butylphenyl)phosphite, manufactured by JOHOKU CHEMICAL CO., LTD) [Chemical Formula 43] AO-2: ADEKA STAB AO-60 (Neopenterythritol tetrakis[3-(3,5-di-tertiary butyl-4-hydroxyphenyl)propionate, manufactured by ADEKA CORPORATION) [Chemical Formula 44] AO-3: Compound with the following structure [Chemical Formula 45] AO-4: ADEKA STAB PEP-36 (3,9-bis(2,6-di-tertiary butyl-4-methylphenoxy)-2,4,8,10-tetraoxa-3, 9-diphosphaspiro[5.5]undecane (3,9-bis(2,6-di-tert-butyl-4-methylphenoxy)-2,4,8,10-tetraoxa-3,9-diphosphaspiro[ 5.5] undecane), manufactured by ADEKA CORPORATION) [Chemical Formula 46] AO-5: ADEKA STAB HP-10 (2,2'-methylenebis(4,6-di-tertiary-butylphenyl) 2-ethylhexyl phosphite, manufactured by ADEKA CORPORATION) [Chemical Formula 47 ]

(polymerization inhibitor) I-1: p-methoxyphenol

(Ultraviolet absorber) U-1: Uvinul3050 (manufactured by BASF, compound with the following structure) [Chemical Formula 48] U-2: Tinuvin477 (manufactured by BASF Company, hydroxyphenyltrifluoroethylene-based ultraviolet absorber) U-3: Tinuvin326 (manufactured by BASF Company, compound with the following structure) [Chemical Formula 49]

(solvent) S-1: Propylene glycol monomethyl ether acetate (PGMEA) S-2: Propylene glycol monomethyl ether (PGME) S-3: cyclopentanone S-4: cyclohexanone S-5: Dichloromethane S-6: Dimethylacetamide S-7: methyl 3-methoxypropionate

<Manufacture of Film> (Manufacture Example 1) Method for producing a film using the compositions of Examples 1 to 40 and Comparative Examples 1 and 2. Each composition was applied on a glass substrate by a spin coating method, and then a heating plate was used to apply the film on the glass substrate. The composition layer was obtained by heating at 100° C. for 2 minutes. The obtained composition layer was exposed using an i-ray stepper at an exposure dose of 500 mJ/cm ² . Next, the exposed composition layer was heated at 200° C. for 8 minutes using a hot plate to perform a hardening process, thereby obtaining a film with a thickness of 9.4 μm.

(Production Example 2) Method for producing a film using the compositions of Examples 101 to 140, 201 to 240, and Comparative Examples 101 and 102 Each composition prepared above is coated on a glass substrate by spin coating, and then heated (pre-baked) at 100°C for 2 minutes using a hot plate, and then heated at 200°C for 8 minutes to perform a hardening treatment. A film with a thickness of 9.4 μm was obtained.

(Production Example 3) Method for producing a film using the compositions of Examples 301 to 340 and Comparative Examples 301 and 302 Each composition prepared above was cast on a glass substrate, dried at 20° C. for 8 hours, and then peeled off from the glass substrate. The peeled coating film was further dried at 100° C. for 8 hours under reduced pressure to obtain a film having a thickness of 0.1 mm, a length of 60 mm, and a width of 60 mm.

＜Evaluation of light resistance＞ The transmittance of the obtained film was measured. Next, the film was placed in a fading tester equipped with a super xenon lamp (100,000 lux), and a light resistance test was conducted by irradiating 100,000 lux light for 50 hours without using an ultraviolet cutoff filter. . Next, the transmittance of the film after the light resistance test was measured. For the film before and after the light resistance test, the transmittance change (ΔT) at each wavelength in the wavelength range of 400 to 1200 nm was calculated, and the light resistance was evaluated based on the maximum value of ΔT in the entire measurement wavelength range based on the following criteria. sex. The smaller the ΔT value is, the better the light resistance is. In addition, the transmittance of the film was measured using a spectrophotometer (UH-4150, manufactured by Hitachi High-Tech Science Corporation). Change in transmittance (ΔT) = | (transmittance of the film after the light resistance test - transmittance of the film before the light resistance test) | A: ΔT does not reach 3% B: ΔT is more than 3% and less than 5% C: ΔT is more than 5%

＜Evaluation of moisture resistance＞ The transmittance of the obtained film was measured. Next, the film was stored in a thermostat with a humidity of 85°C and 95% for 6 months, and a humidity resistance test was performed. Next, the transmittance of the film after the moisture resistance test was measured. For the film before and after the moisture resistance test, the transmittance change (ΔT) at each wavelength in the wavelength range of 400 to 1200 nm was determined. Based on the maximum value of ΔT in the entire measurement wavelength range, the resistance was evaluated based on the following criteria. Moisture. The smaller the ΔT value is, the better the heat resistance is. In addition, the transmittance of the film was measured using a spectrophotometer (UH-4150, manufactured by Hitachi High-Tech Science Corporation). Change in transmittance (ΔT) = | (transmittance of the film after the moisture resistance test - transmittance of the film before the moisture resistance test) | A: ΔT does not reach 4% B: ΔT is more than 4% and less than 10% C: ΔT is more than 10%

＜Evaluation of storage stability＞ Each composition was stored in a thermostat at 45° C. for 3 days, and then a film was produced according to the above-mentioned Production Examples 1 to 3. The obtained film was observed using a scanning electron microscope (measurement magnification = 10,000 times), the number of foreign matter present in the range of 10 μm × 15 μm was measured, and the storage stability was evaluated based on the following criteria. A: There is no foreign matter within the range of 10μm×15μm B: The number of foreign matter present in the range of 10 μm × 15 μm exceeds 0 and is less than 100. C: More than 100 foreign objects exist in the range of 10 μm × 15 μm

[Table 14] Lightfastness Moisture resistance Storage stability Lightfastness Moisture resistance Storage stability Example 1 A A A Example 22 A A A Example 2 A A A Example 23 A A A Example 3 A A A Example 24 A A A Example 4 A A A Example 25 A A A Example 5 A A A Example 26 A A A Example 6 A A A Example 27 A A A Example 7 A A A Example 28 A A A Example 8 A A A Example 29 A A A Example 9 A A A Example 30 A A A Example 10 A A A Example 31 A A A Example 11 A A A Example 32 A A A Example 12 A A A Example 33 A A A Example 13 A A A Example 34 A A A Example 14 A A A Example 35 A A A Example 15 A A A Example 36 A A A Example 16 A A A Example 37 A A A Example 17 B B B Example 38 A A A Example 18 A A A Example 39 A A A Example 19 A A A Example 40 A A A Example 20 A A A Comparative example 1 C C C Example 21 A A A Comparative example 2 C C C [Table 15] Lightfastness Moisture resistance Storage stability Lightfastness Moisture resistance Storage stability Example 101 A A A Example 122 A A A Example 102 A A A Example 123 A A A Example 103 A A A Example 124 A A A Example 104 A A A Example 125 A A A Example 105 A A A Example 126 A A A Example 106 A A A Example 127 A A A Example 107 A A A Example 128 A A A Example 108 A A A Example 129 A A A Example 109 A A A Example 130 A A A Example 110 A A A Example 131 A A A Example 111 A A A Example 132 A A A Example 112 A A A Example 133 A A A Example 113 A A A Example 134 A A A Example 114 A A A Example 135 A A A Example 115 A A A Example 136 A A A Example 116 A A A Example 137 A A A Example 117 B B B Example 138 A A A Example 118 A A A Example 139 A A A Example 119 A A A Example 140 A A A Example 120 A A A Comparative example 101 C C C Example 121 A A A Comparative example 102 C C C [Table 16] Lightfastness Moisture resistance Storage stability Lightfastness Moisture resistance Storage stability Example 201 A A A Example 221 A A A Example 202 A A A Example 222 A A A Example 203 A A A Example 223 A A A Example 204 A A A Example 224 A A A Example 205 A A A Example 225 A A A Example 206 A A A Example 226 A A A Example 207 A A A Example 227 A A A Example 208 A A A Example 228 A A A Example 209 A A A Example 229 A A A Example 210 A A A Example 230 A A A Example 211 A A A Example 231 A A A Example 212 A A A Example 232 A A A Example 213 A A A Example 233 A A A Example 214 A A A Example 234 A A A Example 215 A A A Example 235 A A A Example 216 A A A Example 236 A A A Example 217 B B B Example 237 A A A Example 218 A A A Example 238 A A A Example 219 A A A Example 239 A A A Example 220 A A A Example 240 A A A [Table 17] Lightfastness Moisture resistance Storage stability Lightfastness Moisture resistance Storage stability Example 301 A A A Example 322 A A A Example 302 A A A Example 323 A A A Example 303 A A A Example 324 A A A Example 304 A A A Example 325 A A A Example 305 A A A Example 326 A A A Example 306 A A A Example 327 A A A Example 307 A A A Example 328 A A A Example 308 A A A Example 329 A A A Example 309 A A A Example 330 A A A Example 310 A A A Example 331 A A A Example 311 A A A Example 332 A A A Example 312 A A A Example 333 A A A Example 313 A A A Example 334 A A A Example 314 A A A Example 335 A A A Example 315 A A A Example 336 A A A Example 316 A A A Example 337 A A A Example 317 B B B Example 338 A A A Example 318 A A A Example 339 A A A Example 319 A A A Example 340 A A A Example 320 A A A Comparative example 301 C C C Example 321 A A A Comparative example 302 C C C

As shown in the table above, the compositions of the Examples have good storage stability, and the films obtained using the compositions of the Examples have excellent light resistance and moisture resistance.

51.23 parts by mass of the pigment dispersion 2-1 described in paragraph 0298 of International Publication No. 2020/189458 and 22.67 parts by mass of Examples 1 to 40, 101 to 140, and 201 to The compositions of Example 240 or Example 301 to Example 340 were mixed to prepare a composition for an infrared transmission filter. Using this composition, the light resistance and moisture resistance were evaluated in the same manner as above. As a result, for any film, the light resistance was A and the moisture resistance was A. In addition, the film obtained by using these compositions can block visible light and selectively transmit infrared rays above a specific wavelength, and has better spectroscopic characteristics as an infrared ray transmission filter.

Even if the dyes (Z-1) to (Z-16) in the examples were replaced with the following dyes, the same effects were obtained. [Chemical formula 50] [Chemical formula 51] [Chemical formula 52] [Chemical formula 53] [Chemical formula 54]

110: Solid camera element 111: Infrared cut filter 112:Color filter 114:Infrared transmission filter 115: Microlens 116: Planarization layer hν: incident light

FIG. 1 is a schematic diagram showing an embodiment of an infrared sensor.

without.

Claims (16)

A composition containing a pigment represented by formula (1), a curing compound and a solvent, In formula (1), Y ¹ and Y ² independently represent -C(=O)-, -SO ₂ - or -C(=S)NH-, and Ra ¹ and Ra ² independently represent an electron-withdrawing group. , Rb ¹ and Rb ² each independently represent a hydrogen atom or a substituent, X ¹ represents a single bond or a divalent linking group, R ² , R ³ , R ⁸ and R ⁹ each independently represent a hydrogen atom, an alkyl group or an aryl group , R ¹ and R ¹⁰ each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, a halogen atom or a hydroxyl group, L ¹ and L ² each independently represent -CR ^L1 =CR ^L2 - or -Z ¹ -NR ^L3 -, R ^L1 and R ^L2 independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, a halogen atom or a hydroxyl group, R ^L3 represents a hydrogen atom, an alkyl group or an aryl group, Z ¹ represents -C (=O )-, -SO ₂ -or -C(=S)NH-, R ¹ and R ² can be connected to each other to form a ring, R ² and R ³ can be connected to each other to form a ring, R ³ and L ¹ can be connected to each other to form a ring. To form a ring, R ⁹ and R ¹⁰ can be connected to each other to form a ring, R ⁸ and R ⁹ can be connected to each other to form a ring, and R ⁸ and L ² can be connected to each other to form a ring. The composition as claimed in claim 1, wherein the aforementioned Rb ¹ and Rb ² are each independently an electron-withdrawing group. The composition according to claim 1, wherein the aforementioned Ra ¹ , Ra ² , Rb ¹ and Rb ² are each independently a halogen atom. The composition according to any one of claims 1 to 3, wherein the aforementioned Y ¹ and Y ² are both -C (=O)-. The composition according to any one of claims 1 to 3, wherein the aforementioned Y ¹ and Y ² are both -SO ₂ -. The composition according to any one of claims 1 to 3, wherein the aforementioned X ¹ is an alkylene group, a halogenated alkylene group, -O-, -CO-, -S-, -SO ₂ -, - NH-, -NR-, -C(=S)-, or a group formed by combining two or more of these. The composition according to any one of claims 1 to 3, wherein the pigment represented by formula (1) is a pigment represented by formula (1-1), In formula (1-1), Y ¹ and Y ² independently represent -C (=O)-, -SO ₂ - or -C (=S)NH-, and Ra ¹ and Ra ² independently represent electron pulling. group, Rb ¹ and Rb ² independently represent a hydrogen atom or a substituent, X ¹ represents a single bond or a divalent linking group, R ² , R ³ , R ⁸ and R ⁹ each independently represent a hydrogen atom, an alkyl group or a substituent. Aryl group, R ¹ , R ⁴ , R ⁵ , R ⁶ , R ⁷ and R ¹⁰ each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, a halogen atom or a hydroxyl group, R ¹ and R ² can be linked to each other. To form a ring, R ² and R ³ can be connected to each other to form a ring, R ³ and R ⁴ can be connected to each other to form a ring, R ⁷ and R ⁸ can be connected to each other to form a ring, and R ⁸ and R ⁹ can be connected to each other to form a ring. Ring, R ⁹ and R ¹⁰ may be linked to each other to form a ring. The composition according to claim 7, wherein the aforementioned pigment represented by formula (1-1) is a pigment represented by formula (2), In formula (2), Y ¹ and Y ² independently represent -C(=O)-, -SO ₂ - or -C(=S)NH-, and Ra ¹ and Ra ² independently represent an electron-withdrawing group. , Rb ¹ and Rb ² independently represent a hydrogen atom or a substituent, X ¹ represents a single bond or a divalent linking group, R ¹ , R ⁵ , R ⁶ and R ¹⁰ respectively independently represent a hydrogen atom, an alkyl group, and an alkoxy group, aryl group, halogen atom or hydroxyl group, R ¹¹ and R ¹⁶ independently represent an alkyl group or an aryl group, R ¹² , R 13 , R ¹⁴ , R ¹⁵ , R ¹⁷ , ^{R 18 ,} R ¹⁹ and R ²⁰ are respectively independent represents a hydrogen atom, an alkyl group, an alkoxy group or an aryl group, R ¹³ and R ¹⁴ may be linked to each other to form a ring, and R ¹⁸ and R ¹⁹ may be linked to each other to form a ring. A film obtained using the composition described in any one of claims 1 to 8. An optical filter comprising the film described in claim 9. A solid-state imaging element including the film according to claim 9. An image display device comprising the film described in claim 9. An infrared sensor comprising the film described in claim 9. A camera module comprising the film described in claim 9. A compound represented by formula (1-1), In formula (1-1), Y ¹ and Y ² independently represent -C (=O)-, -SO ₂ - or -C (=S)NH-, and Ra ¹ and Ra ² independently represent electron pulling. group, Rb ¹ and Rb ² independently represent a hydrogen atom or a substituent, X ¹ represents a single bond or a divalent linking group, R ² , R ³ , R ⁸ and R ⁹ each independently represent a hydrogen atom, an alkyl group or a substituent. Aryl group, R ¹ , R ⁴ , R ⁵ , R ⁶ , R ⁷ and R ¹⁰ each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, a halogen atom or a hydroxyl group, R ¹ and R ² can be linked to each other. To form a ring, R ² and R ³ can be connected to each other to form a ring, R ³ and R ⁴ can be connected to each other to form a ring, R ⁷ and R ⁸ can be connected to each other to form a ring, and R ⁸ and R ⁹ can be connected to each other to form a ring. Ring, R ⁹ and R ¹⁰ may be linked to each other to form a ring. The compound as claimed in claim 15, wherein the aforementioned compound represented by formula (1-1) is a compound represented by formula (2), In formula (2), Y ¹ and Y ² independently represent -C(=O)-, -SO ₂ - or -C(=S)NH-, and Ra ¹ and Ra ² independently represent an electron-withdrawing group. , Rb ¹ and Rb ² independently represent a hydrogen atom or a substituent, X ¹ represents a single bond or a divalent linking group, R ¹ , R ⁵ , R ⁶ and R ¹⁰ respectively independently represent a hydrogen atom, an alkyl group, and an alkoxy group, aryl group, halogen atom or hydroxyl group, R ¹¹ and R ¹⁶ independently represent an alkyl group or an aryl group, R ¹² , R 13 , R ¹⁴ , R ¹⁵ , R ¹⁷ , ^{R 18 ,} R ¹⁹ and R ²⁰ are respectively independent represents a hydrogen atom, an alkyl group, an alkoxy group or an aryl group, R ¹³ and R ¹⁴ may be linked to each other to form a ring, and R ¹⁸ and R ¹⁹ may be linked to each other to form a ring.