TW202026317A - Composition, film, optical filter, solid-state imaging device, infrared sensor, method for manufacturing optical filter, camera module, compound, and dispersion composition - Google Patents

Abstract

Provided are: a composition having excellent heat resistance; a film obtained using said composition; an optical filter; a solid-state imaging device; an infrared sensor; a camera module; a method for manufacturing an optical filter; a novel compound; and a dispersion composition having excellent light stability. Said composition contains: a compound having a dye structure and a partial structure represented by formula (1); and at least one compound selected from the group consisting of a binder and a curable compound. In formula (1), X1 to X4 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryl group, or a heteroaryl group; at least one among X1 to X4 is a heteroaryl group; Z1 represents N or N+-RN; RN represents a hydrogen atom, an alkyl group, or an aryl group; and * represents a bonding position with respect to a structure having a dye structure.

Description

Composition, film, optical filter, solid-state imaging element, infrared sensor, optical filter manufacturing method, camera module, compound, and dispersion composition

The present disclosure relates to a composition, a film, an optical filter, a solid-state imaging element, an infrared sensor, a method of manufacturing an optical filter, a camera module, a compound, and a dispersion composition.

The solid-state image sensor that uses color images in video cameras, digital cameras, and mobile phones with camera functions is CCD (charge coupled device) or CMOS (complementary metal oxide film semiconductor). These solid-state imaging devices use silicon photodiodes with sensitivity to infrared rays in their light-receiving parts. Therefore, an infrared cut filter is sometimes used for visual sensitivity correction.

In addition, as conventional infrared sensors or infrared absorbers, those described in Patent Documents 1 to 3 are known. Patent Document 1 describes an infrared sensor that has an infrared transmission filter and a near-infrared absorption filter, and detects an object by detecting light with a wavelength of 900 nm or more and 1000 nm or less, wherein the near-infrared absorption filter Contains a near-infrared absorbing material with a maximum absorption wavelength at a wavelength of 900 nm or more and 1000 nm or less.

In addition, Patent Document 2 describes a material containing a pigment A and a compound B having a structure having an adsorbability to resin, and X ¹ represented by the following formula (I) is 0.99 or more. X ¹ =(X ² /X ³ )×100 ……(I) X ² is after the above-mentioned material is immersed in a solvent with a solubility of pigment A of 0.02% by mass or less and a solubility of compound B of 0.2% by mass or more at 25°C , The mass of the compound B in the above-mentioned material, and X ³ is the mass of the solid content of the above-mentioned material after being immersed in the above-mentioned solvent.

In addition, Patent Document 3 describes an organic compound represented by the following formula (1).

（上述式（1）中的R¹ 及R² 各自獨立地表示氫原子、碳數1至12的烷基，Z¹ 及Z² 各自獨立地表示具有5或6員環的含氮雜環之多環芳香族環。作為R³ 及R⁴ 所表示之取代基，表示氫原子、烷基、烷氧基、烷硫基、苯基、聯苯基、茚基、萘基、蒽基、茀基、芘基等芳香族烴基、呋喃基、噻吩基、噻吩并噻吩基、吡咯基、咪唑基、吡啶基、吡𠯤基、嘧啶基、喹啉基、吲哚基及咔唑基等芳香族基、鹵素原子、羥基、巰基、硝基、取代胺基、非取代胺基、氰基、磺基、醯基、胺磺醯基、烷基胺磺醯基、胺甲醯基或烷基胺甲醯基。） [先前技術文獻] [專利文獻][Chemical formula 1]

(R ¹ and R ² in the above formula (1) each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, and Z ¹ and Z ² each independently represent a nitrogen-containing heterocyclic ring having a 5- or 6-membered ring Polycyclic aromatic ring. As the substituents represented by R ³ and R ⁴ , hydrogen atom, alkyl group, alkoxy group, alkylthio group, phenyl group, biphenyl group, indenyl group, naphthyl group, anthryl group, stilbene Aromatic hydrocarbon groups such as pyrenyl, furanyl, thienyl, thienothienyl, pyrrolyl, imidazolyl, pyridyl, pyrrolyl, pyrimidinyl, quinolinyl, indolyl and carbazolyl and other aromatics Group, halogen atom, hydroxyl group, mercapto group, nitro group, substituted amino group, unsubstituted amino group, cyano group, sulfo group, sulfonyl group, sulfamethonyl group, alkylsulfonyl group, carbamethonyl group or alkylamine甲醯基.) [Prior Art Document] [Patent Document]

[Patent Document 1] International Publication No. 2015/166873 [Patent Document 2] International Publication No. 2017/038252 [Patent Document 3] JP 2017-137264 A

In the past, infrared cut filters were used as flat films. In recent years, research is under way to pattern the infrared cut filter. For example, it is being studied to form each pixel (for example, red pixel, blue pixel, green pixel, etc.) of the color filter on the infrared cut filter for use. However, the inventors of the present invention have discovered through research that the infrared-absorbing dye used in infrared cut filters and the like has insufficient heat resistance.

The problem to be solved by one embodiment of the present invention is to provide a composition having excellent heat resistance. In addition, the problem to be solved by another embodiment of the present invention is to provide a method for manufacturing a film, a filter, a solid-state imaging element, an infrared sensor, a filter, and a camera module using the above-mentioned composition. In addition, the problem to be solved by another embodiment of the present invention is to provide a novel compound. In addition, the problem to be solved by another embodiment of the present invention is to provide a dispersion composition having excellent heat resistance.

The means for solving the above-mentioned problems include the following aspects. <1> A composition comprising: a compound having a partial structure and a pigment structure represented by the following formula (1); and at least one compound selected from the group consisting of a binder and a hardening compound.

[Chemical formula 2]

In formula (1), X ¹ to X ⁴ each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryl group, or a heteroaryl group, and at least one of X ¹ to X ⁴ is a heteroaryl group, Z ¹ represents N or N ⁺ -R ^N , R ^N represents a hydrogen atom, an alkyl group or an aryl group, and * represents the bonding position to the structure having the above-mentioned dye structure.

<2> The composition according to <1>, wherein the partial structure represented by the above formula (1) is the partial structure represented by the following formula (2).

[Chemical formula 3]

In the formula (2), X ⁵ represents a heteroaryl group, and * represents the bonding position to the structure having the above-mentioned dye structure.

<3> The composition according to <1>, wherein the heteroaryl group in X ¹ to X ⁴ in the formula (1) is a furyl group or a thienyl group. <4> The composition according to <2>, wherein the heteroaryl group in X ⁵ of the above formula (2) is a furyl group or a thienyl group. <5> The composition according to any one of <1> to <4>, wherein the compound having the partial structure represented by the above formula (1) and the dye structure has a maximum absorption wavelength in the range of 650 nm to 1,500 nm. <6> The composition according to any one of <1> to <5>, wherein the pigment structure is selected from the group consisting of pyrrolopyrrole pigment structure, pyrromethene pigment structure, squaraine pigment structure, ketone Onium pigment structure, indigo pigment structure, anthraquinone pigment structure, diimonium pigment structure, phthalocyanine pigment structure, naphthalocyanine pigment structure, polymethine pigment structure, Kouyamaguchi pigment structure, quinacridone pigment structure, even At least one pigment structure in the group of nitrogen pigment structure and quinoline pigment structure. <7> The composition according to any one of <1> to <6>, wherein the compound having the partial structure represented by the above formula (1) and the dye structure is a compound represented by the following formula (3).

[Chemical formula 4]

In formula (3), Y ¹ and Y ² each independently represent a hydrogen atom or a substituent, A ¹ and A ² each independently represent a substituent, B ¹ and B ² each independently represent a hydrogen atom or a substituent, X ⁶ ~X ¹³ each independently represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryl group or a heteroaryl group, at least one of X ⁶ to X ⁹ is a heteroaryl group, and at least one of X ¹⁰ to X ¹³ One is heteroaryl.

<8> The composition according to any one of <1> to <7>, which contains the above-mentioned curable compound and further contains a photopolymerization initiator. <9> A film which contains the composition described in any one of <1> to <8> or is formed by curing the composition. <10> An optical filter having the film described in <9>. <11> The filter according to <10>, which is an infrared cut filter or an infrared transmission filter. <12> A solid-state imaging device having the film described in <9>. <13> An infrared sensor having the film described in <9>. <14> A method for manufacturing an optical filter, comprising: applying the composition described in any one of <1> to <8> to a support to form a composition layer; exposing the composition layer A process of patterning; and a process of developing and removing the unexposed parts after the above exposure process to form a pattern. <15> A method for manufacturing an optical filter, comprising: applying the composition described in any one of <1> to <8> to a support to form a composition layer; hardening the composition layer The process of forming a hardened layer; the process of forming a photoresist layer on the hardened layer; the process of patterning the photoresist layer by exposing and developing the photoresist layer to obtain a photoresist pattern; and using the photoresist pattern as etching Mask and dry etching the hardened layer. <16> A camera module comprising: a solid-state imaging element; and the filter described in <10> or <11>. <17> A compound represented by the following formula (3).

[Chemical formula 5]

In formula (3), Y ¹ and Y ² each independently represent a hydrogen atom or a substituent, A ¹ and A ² each independently represent a substituent, B ¹ and B ² each independently represent a hydrogen atom or a substituent, X ⁶ ~X ¹³ each independently represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryl group or a heteroaryl group, at least one of X ⁶ to X ⁹ is a heteroaryl group, and at least one of X ¹⁰ to X ¹³ One is heteroaryl.

<18> A dispersion composition comprising: a compound having a partial structure and a pigment structure represented by the following formula (1); and at least one compound selected from the group consisting of a solvent, a binder, and a hardening compound .

[Chemical formula 6]

In formula (1), X ¹ to X ⁴ each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryl group, or a heteroaryl group, and at least one of X ¹ to X ⁴ is a heteroaryl group, Z ¹ represents N or N ⁺ -R ^N , R ^N represents a hydrogen atom, an alkyl group or an aryl group, and * represents the bonding position to the structure having the above-mentioned dye structure.

[Invention Effect] According to one embodiment of the present invention, a composition having excellent heat resistance can be provided. Furthermore, according to another embodiment of the present invention, it is possible to provide a method for manufacturing a film, a filter, a solid-state imaging element, an infrared sensor, and a filter, and a camera module using the above-mentioned composition. In addition, according to another embodiment of the present invention, a novel compound can be provided. In addition, according to another embodiment of the present invention, a dispersion composition having excellent heat resistance can be provided.

Hereinafter, the content of this disclosure will be described in detail. In this specification, "total solid content" refers to the total mass of the components after removing the solvent from all the components of the composition. In addition, as described above, the "solid component" is a component after removing the solvent, and for example, it may be a solid or a liquid at 25°C. In the label of the group (atomic group) in this specification, the label not marked with substitution and unsubstituted includes those without substituents, and also includes those with substituents. For example, "alkyl" includes not only unsubstituted alkyl (unsubstituted alkyl) but also substituted alkyl (substituted alkyl). In this specification, unless otherwise specified, "exposure" includes not only exposure using light, but also drawing using particle beams such as electron beams and ion beams. In addition, as the light used in the exposure, generally, there are actinic rays or radiations such as the bright line spectrum of a mercury lamp, extreme ultraviolet rays represented by excimer lasers, extreme ultraviolet rays (EUV light), X-rays, and electron beams. In this specification, "～" is used in the meaning including the numerical value described before and after it as a lower limit and an upper limit. In this specification, "(meth)acrylate" means both or either of acrylate and methacrylate, "(meth)acrylic" means both or either of acrylic and methacrylic, " "(Meth)acryloyl group" means both or either of an acryloyl group and a methacryloyl group. In this specification, Me in the chemical formula represents a methyl group, Et represents an ethyl group, Pr represents a propyl group, Bu represents a butyl group, Ac represents an acetyl group, Bn represents a benzyl group, and Ph represents a phenyl group. In this specification, the term "process" not only includes an independent process, even if it cannot be clearly distinguished from other processes, as long as the process can achieve the expected effect of the process, it is included in this term. In addition, in this disclosure, "mass %" and "weight%" have the same meaning, and "mass part" and "weight part" have the same meaning. In addition, in the present disclosure, a combination of two or more preferable aspects is a more preferable aspect. Moreover, unless otherwise specified, the transmittance in this disclosure is the transmittance at 25°C. In this specification, weight average molecular weight and number average molecular weight are defined as polystyrene conversion values measured by gel permeation chromatography (GPC).

＜Compositions＞ The composition of the present disclosure includes: a compound having a partial structure and a pigment structure represented by the following formula (1); and at least one compound selected from the group consisting of a binder and a hardening compound.

[Chemical formula 7]

In formula (1), X ¹ to X ⁴ each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryl group, or a heteroaryl group, and at least one of X ¹ to X ⁴ is a heteroaryl group, Z ¹ represents N or N ⁺ -R ^N , R ^N represents a hydrogen atom, an alkyl group or an aryl group, and * represents a bonding position to a structure having a pigment structure.

The composition of this embodiment can be suitably used as a composition for pattern formation. The composition for pattern formation may be a composition for pattern formation of a negative type or a composition for pattern formation of a positive type, but from the viewpoint of resolution, a composition for pattern formation of a negative type is preferable. In addition, the composition of this embodiment can be suitably used as an infrared absorbing composition.

As mentioned above, the infrared absorbing pigments used in infrared cut filters have insufficient heat resistance, and thermal decomposition under the action of heat causes the infrared absorbing ability to decrease, and it is hardened by the composition containing the infrared absorbing pigments. Many films have insufficient heat resistance. As a result of intensive research, the inventors of the present invention found that by adopting the above-mentioned structure, a composition having excellent heat resistance can be provided. The mechanism of action based on this excellent effect is not clear, but it is estimated as follows. It is presumed that the partial structure represented by formula (1) in which the compound contains a dye structure and a heteroaryl group with a specific structure, the aforementioned heteroaryl groups interact with each other in the intermolecular dipole-dipole, thereby making it possible to have the formula (1 The compounds of the partial structure represented by) strongly agglomerate or coordinate with each other (packing properties are improved), thereby improving heat resistance. Hereinafter, each component of the composition of the present disclosure will be described.

(Compound having partial structure and pigment structure represented by formula (1)) The composition of the present disclosure includes a compound having the partial structure and pigment structure represented by the above formula (1). In addition, in this disclosure, the compound having the partial structure represented by the formula (1) and the dye structure may also be abbreviated as the compound having the partial structure represented by the formula (1). From the viewpoints of light resistance, heat resistance, and solvent resistance, the heteroaryl group in X ¹ to X ⁴ of formula (1) is preferably a heteroaryl group having an oxygen atom or a sulfur atom as a heteroatom. A 5-membered ring heteroaryl group with atom or sulfur atom is more preferred, furyl, thienyl, thiazolyl, benzothiazolyl or azolyl is further preferred, furyl or thienyl is particularly preferred, furyl is the most preferred good. As said furyl group, 2-furyl group and 3-furyl group are mentioned suitably. As said thienyl group, 2-thienyl group and 3-thienyl group are mentioned suitably. As said thiazolyl group, 2-thiazolyl group can be mentioned preferably. As said benzothiazolyl group, 2-benzothiazolyl group can be mentioned preferably. As the above-mentioned azolyl group, preferably, 2-oxazolyl group is used. In formula (1), from the viewpoint of light resistance, heat resistance, and solvent resistance, at least one of X ² and X ³ is preferably a heteroaryl group, and at least X ² is a heteroaryl group.

From the viewpoints of light resistance, heat resistance, and solvent resistance, it is preferred that X ¹ and X ⁴ in formula (1) are independently a hydrogen atom, a halogen atom, an alkyl group or a heteroaryl group, and a hydrogen atom is more preferably good. From the viewpoint of light resistance, heat resistance, and solvent resistance, X ² in the formula (1) is preferably a hydrogen atom, a halogen atom, an alkyl group, or a heteroaryl group, and a heteroaryl group is more preferable. From the viewpoints of light resistance, heat resistance, and solvent resistance, X ³ in formula (1) is preferably a hydrogen atom, a halogen atom, an alkyl group or a heteroaryl group, and a hydrogen atom, a halogen atom or a hetero Aryl is more preferable. Moreover, as the above-mentioned halogen atom, a chlorine atom or a bromine atom is preferable.

From the viewpoints of light resistance, heat resistance, and solvent resistance, Z ¹ in the formula (1) is preferably N. And the ^{N +} -R N R ^N in the system is preferably an alkyl group or an aryl group, an alkyl group is more preferred.

The compound having the partial structure represented by the above formula (1) may have only one partial structure represented by the above formula (1), or may have two or more, but from the viewpoint of light resistance, heat resistance, and solvent resistance In other words, it is preferable to have one to four partial structures represented by the above formula (1), one to three is more preferable, and one or two is particularly preferable.

From the viewpoint of light resistance, heat resistance, and solvent resistance, the partial structure represented by the above formula (1) is preferably the partial structure represented by the following formula (2).

[Chemical formula 8]

In the formula (2), X ⁵ represents a heteroaryl group, and * represents a bonding position with a structure having a pigment structure.

From the viewpoint of light resistance, heat resistance, and solvent resistance, the heteroaryl group in X ⁵ of formula (2) is preferably a heteroaryl group having an oxygen atom or a sulfur atom as a heteroatom, and having an oxygen atom or sulfur A 5-membered ring heteroaryl group is more preferred, furyl or thienyl is further preferred, and furyl is particularly preferred.

The molecular weight of the compound having the partial structure represented by the above formula (1) is preferably 2,500 or less, more preferably 300 or more and 2,500 or less, more preferably 400 or more and 2,000 or less, and particularly preferably 500 or more and 2,000 or less.

The compound having the partial structure represented by the above formula (1) is preferably an infrared absorbing dye. The above-mentioned infrared absorbing dye refers to a material that has at least absorption in the infrared region. The compound having the partial structure represented by the above formula (1) preferably has a maximum absorption wavelength in the wavelength range of 650nm to 1,500nm, and more preferably has a maximum absorption wavelength in the wavelength range of 680nm to 1,300nm, and in the wavelength range of 700nm to 1,100 It is further preferable that the range of nm has a maximum absorption wavelength.

The compound having the partial structure represented by the above formula (1) may be a pigment or a dye, but from the viewpoint of light resistance, heat resistance, and solvent resistance, pigments are preferred, and infrared absorbing pigments are more preferred. From the viewpoint of light resistance, heat resistance, and solvent resistance, the dye structure of the compound having the partial structure represented by the above formula (1) is selected from the group consisting of pyrrolopyrrole dye structure, pyrromethene dye structure, Squaraine pigment structure, croconium pigment structure, indigo pigment structure, anthraquinone pigment structure, diiminium pigment structure, phthalocyanine pigment structure, naphthalocyanine pigment structure, polymethine pigment structure, Kouyamaguchi pigment structure At least one pigment structure from the group of quinacridone pigment structure, azo pigment structure and quinoline pigment structure is preferably selected from the group consisting of pyrrolopyrrole pigment structure, pyrromethene pigment structure, squaraine pigment At least one pigment structure from the group of structure, phthalocyanine pigment structure, and anthraquinone pigment structure is more preferably selected from the group consisting of pyrrolopyrrole pigment structure, pyrromethene pigment structure, squaraine pigment structure and phthalocyanine pigment At least one pigment structure in the group of structures is further preferred, and the pyrrolopyrrole pigment structure is particularly preferred. In addition, there are no particular restrictions on the partial structure represented by the above formula (1) in the compound having the partial structure represented by the above formula (1) and the parts other than the above dye structure, and any structure may be used. It is better to cite the structure as in the specific example described later.

From the viewpoint of light resistance, heat resistance, and solvent resistance, the compound having a partial structure represented by the above formula (1) is preferably a compound represented by the following formula (3).

[Chemical formula 9]

In formula (3), Y ¹ and Y ² each independently represent a hydrogen atom or a substituent, A ¹ and A ² each independently represent a substituent, B ¹ and B ² each independently represent a hydrogen atom or a substituent, X ⁶ ~X ¹³ each independently represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryl group or a heteroaryl group, at least one of X ⁶ to X ⁹ is a heteroaryl group, and at least one of X ¹⁰ to X ¹³ One is heteroaryl.

From the viewpoints of infrared absorption, dispersibility, light resistance, heat resistance, and solvent resistance, it is preferred that Y ¹ and Y ² in formula (3) are independently substituents, and alkyl, aryl, hetero Aryl or -BR ^Y1 R ^Y2 is more preferred, and -BR ^Y1 R ^Y2 is particularly preferred. From the standpoint of infrared absorption and dispersibility, R ^Y1 and R ^Y2 are each independently a halogen atom, an alkyl group, an aryl group or an aryloxy group, preferably a halogen atom or an aryl group, and an aryl group is particularly preferred. good. In addition, R ^Y1 and R ^Y2 may be bonded to form a ring. ^Furthermore , it is preferable that R ^Y1 and R ^Y2 are the same group.

As Y ¹ and Y ² , the groups shown below can be preferably mentioned. In addition, * represents the bonding site with the nitrogen atom in formula (3).

[Chemical formula 10]

From the standpoint of dispersibility, light resistance, heat resistance and solvent resistance, A ¹ and A ² in formula (3) are independently alkyl, aryl, heteroaryl or the following formula (A1) The represented group is preferable, and the aryl group or the group represented by the following formula (A1) is more preferable.

[Chemical formula 11]

In formula (A1), X ^A1 represents meta-phenylene, para-phenylene, divalent condensed polycyclic aromatic ring group or divalent heteroaromatic ring group formed by condensation of more than 2 aromatic rings, L ^A1 represents A single bond or divalent linking group, Y ^A1 represents a substituent, and * represents a linking site to the pyrrolopyrrole ring in formula (3).

In addition, the alkyl group, aryl group, and heteroaryl group represented by A ¹ and A ² may have a substituent or may be unsubstituted. Examples of the substituent include an alkoxy group, a hydroxyl group, a halogen atom, a cyano group, a nitro group, a fluoroalkyl group, -OCOR ^1a , -SOR ^2a , -SO ₂ R ^3a , -SO ₂ NR ^4a R ^5a and the like. R ^1a to R ^5a each independently represent a hydrocarbon group or a heteroaryl group. In addition, as the substituent, the substituents described in paragraphs 0020 to 0022 of JP 2009-263614 A can be cited. Among them, as the substituent, an alkoxy group, a hydroxyl group, a cyano group, a nitro group, a fluoroalkyl group, -OCOR ^1a , -SOR ^2a , -SO ₂ R ^3a , and -SO ₂ NR ^4a R ^5a are preferred. In addition, the aryl group in A ¹ and A ² is an aryl group having an alkoxy group containing a branched alkyl group as a substituent, an aryl group having a hydroxyl group as a substituent, or a group represented by -OCOR ^1a as a substituent. Aryl is preferred. The carbon number of the branched alkyl group is preferably 3-30, and more preferably 3-20.

From the viewpoint of dispersibility, X ^A1 in formula (A1) is preferably meta-phenylene, para-phenylene, naphthylene, furandiyl or thiophenediyl, and meta-phenylene, para-phenylene A group or a naphthylene group is more preferable, a meta-phenylene group or a para-phenylene group is more preferable, and a para-phenylene group is particularly preferable. From the viewpoint of visible transparency, X ^A1 in formula (A1) is preferably meta-phenylene, para-phenylene, naphthylene, furandiyl or thiophene diyl, and meta-phenylene, para-phenylene Phenyl or naphthylene is more preferable, meta-phenyl or para-phenyl is more preferable, meta-phenyl is particularly preferable. From the viewpoint of dispersibility, L ^A1 in the formula (A1) is preferably a divalent linking group. From the viewpoint of dispersibility, the carbon number of the divalent linking group in L ^A1 is preferably 1 or more and 30 or less, more preferably 1 or more and 20 or less, and more preferably 1 or more and 10 or less. Moreover, as the divalent linking group in L ^A1 , from the viewpoint of dispersibility, an alkylene group, an ester bond, an ether bond, or an aryl group is preferred. In addition, from the viewpoint of dispersibility, the divalent linking group in L ^A1 is preferably a group having an oxygen atom, and a group having at least one structure selected from the group consisting of an ester bond and an ether bond The group is more preferable, and the group having an ester bond is even more preferable.

From the viewpoint of dispersibility, Y ^A1 in the formula (A1) has at least one selected from the group consisting of an imine structure, an acid anhydride structure, a coumarin structure, an anthracene structure, an anthraquinone structure, a benzothiophene structure, and a cyanide structure. Group, alkyl sulfonyl, aryl sulfonyl, alkyl sulfonyl, aryl sulfonyl, sulfonamide, amide, amino ester, urea and hydroxyl group Preferably, it has at least one selected from the group consisting of an imine structure, an acid anhydride structure, a coumarin structure, an anthracene structure, an anthraquinone structure, a benzothiophene structure, a cyano group, an alkyl sulfonyl group, an aryl sulfonyl group, and alkane The group of the structure in the group of alkylene group, aryl alkylene group, sulfonamide group, amide group, urethane group and urea group is more preferred, and has at least one group selected from the group including N-substituted guanidine Imine structure, acid anhydride structure, coumarin structure, anthracene structure, anthraquinone structure, benzothiophene structure, cyano, alkyl sulfonium, aryl sulfonium, alkyl sulfonium, aryl sulfonium, N -The group of the structure in the group of disubstituted sulfonamide group and N-disubstituted amide group is further preferred, and has at least one group selected from the group consisting of N-substituted sulfonamide and N-disubstituted sulfonamide Groups of structures in the group of amino group, coumarin structure, anthracene structure, anthraquinone structure, benzothiophene structure and N-disubstituted amide group are particularly preferred, and groups with N-substituted amide structure The group is the best. Moreover, Y ^A1 preferably does not have a group having an acidic group, a basic group, or a salt structure described later in the dye derivative. Also, from the viewpoint of dispersibility, Y ^A1 is preferably a group represented by any one of the following formula A-1 to formula A-20, and the following formula A-1 to formula A-8 and A group represented by any one of A-15 to formula A-20 is more preferred, and a group represented by any one of the following formula A-1 to formula A-3 and formula A-15 to formula A-20 The group is more preferable, and the group represented by any one of the following formula A-1, formula A-2, and formula A-15 to formula A-20 is particularly preferable, and the group represented by the following formula A-1 The group is the best.

[Chemical formula 12]

[Chemical formula 13]

Formula A-1 ~ A-20 in the formula, R ^A each independently represent a hydrogen atom, an alkyl group, an aryl group or a heteroaryl group, when having two or more R ^A in formula 1, R ^A 2 can By forming a ring by alkylene or alkylene-O-alkylene, * represents the linking site with L ^A1 in formula (A1). From the viewpoint of dispersibility terms, R ^A based alkyl, aryl or heteroaryl group is preferably an alkyl group is more preferably, an alkyl group having 1 to 8 carbon atoms is more preferred, methyl group is particularly preferred. Moreover, as said heteroaryl group, a thiazolyl group or a benzothiazolyl group is mentioned preferably.

From the standpoint of infrared absorption, it is preferred that B ¹ and B ² in formula (3) are independently substituents, cyano, acyl, alkoxycarbonyl, alkyl, and arylsulfinyl groups. Or a heteroaryl group is more preferable, a cyano group, an acyl group, an alkoxycarbonyl group, an alkyl group or an arylsulfinyl group is more preferable, and a cyano group is particularly preferable.

The meanings of X ⁶ to X ⁹ in formula (3) are the same as those of X ¹ to X ⁴ in formula (1), and preferred aspects are also the same. In addition, the meanings of X ¹⁰ to X ¹³ in formula (3) are the same as X ¹ to X ⁴ in formula (1), and preferred aspects are also the same.

As specific examples of the compound having the partial structure represented by the above formula (1), the compounds used in the examples described below can be preferably cited.

When the compound having the partial structure represented by the above formula (1) is a pigment, preferably an infrared absorbing pigment, from the viewpoint of dispersibility, the compound having the partial structure represented by the above formula (1) is in the form of particles Better. In addition, when the compound having the partial structure represented by the above formula (1) is a pigment, preferably an infrared absorbing pigment, from the viewpoint of dispersibility, the volume of the compound having the partial structure represented by the above formula (1) The average particle size is preferably 1 nm or more and 500 nm or less, more preferably 1 nm or more and 100 nm or less, and more preferably 1 nm or more and 50 nm or less. The volume average particle diameter of the compound having the partial structure represented by the above formula (1) is determined using MICROTRAC UPA 150 manufactured by Nikkiso Co., Ltd.

In addition, the composition of the present disclosure may contain one compound having a partial structure represented by the above formula (1) alone, or two or more kinds thereof. From the viewpoint of infrared absorption and dispersibility, the content of the compound having the partial structure represented by the above formula (1) is preferably 1% by mass to 90% by mass relative to the total solid content of the composition. The lower limit is more preferably 5% by mass or more, and more preferably 10% by mass or more. The upper limit is more preferably 80% by mass or less, and more preferably 70% by mass or less.

(Adhesive) The composition of the present disclosure contains at least one compound selected from the group consisting of a binder and a curable compound. From the viewpoint of film formation, it is preferable to include a binder. Moreover, as a binder, a binder polymer is preferable from a viewpoint of film formation property and dispersibility. In addition, as the binder polymer, a dispersant may be included.

Specific examples of binder polymers include (meth)acrylic resins, epoxy resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polyether resins, and polyether resins. Resin, polyphenylene resin, polyarylene ether phosphine oxide resin, polyimide resin, polyimide resin, polyolefin resin, cycloolefin resin, polyester resin, styrene resin, silicon Oxyane resin, urethane resin, etc. These resins may be used individually by 1 type, and may mix and use 2 or more types.

As the cycloolefin resin, a norbornene resin can be preferably used from the viewpoint of improving heat resistance. As a commercially available product of norbornene resin, for example, ARTON series manufactured by JSR Corporation (for example, ARTON F4520) and the like can be cited. Examples of commercially available products of polyimide resins include Neoprim (registered trademark) series (for example, C3450) manufactured by MITSUBISHI GAS CHEMICAL COMPANY, INC., etc. Examples of epoxy resins include epoxy resins which are glycidyl ether compounds of phenolic compounds, epoxy resins which are glycidyl ether compounds of various novolac resins, alicyclic epoxy resins, and aliphatic epoxy resins. , Heterocyclic epoxy resins, glycidyl ester epoxy resins, glycidylamine epoxy resins, epoxy resins obtained by glycidylation of halogenated phenols, silicon compounds with epoxy groups, and others Condensates of silicon compounds, copolymers of polymerizable unsaturated compounds with epoxy groups and other polymerizable unsaturated compounds, etc. Also, as epoxy resin, Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 can also be used (Manufactured by NOF CORPORATION, epoxy-containing polymer) etc. As the urethane resin, 8UH-1006 and 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.) can also be used.

In addition, as the binder polymer, the resins described in the examples of International Publication No. 2016/088645, the resins described in Japanese Patent Application Publication No. 2017-057265, and those described in Japanese Patent Application Publication No. 2017-032685 can also be used. The resins described, the resins described in JP 2017-075248 A, and the resins described in JP 2017-066240 A are incorporated in this specification. In addition, as the binder polymer, a resin having a 茀 skeleton can also be preferably used. Regarding the resin having a 茀 skeleton, please refer to the description of the specification of US Patent Application Publication No. 2017/0102610, the content of which is incorporated in this specification.

The weight average molecular weight (Mw) of the binder polymer is preferably 2,000-2,000,000. The upper limit is more preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit is more preferably 3,000 or more, and more preferably 5,000 or more. The content of the binder polymer relative to the total solid content of the composition is preferably 10% by mass to 80% by mass, and more preferably 15% by mass to 60% by mass. The said composition may contain only 1 type of resin, and may contain 2 or more types. When two or more types are contained, the total amount thereof is preferably in the above-mentioned range.

-Dispersant- The composition of the present disclosure may contain a dispersant. Examples of dispersants include polymer dispersants (for example, resins with amine groups (polyamide amines and their salts, etc.), oligomeric imine resins, polycarboxylic acids and their salts, and high molecular weight unsaturated acid esters. , Modified polyurethane, modified polyester, modified poly(meth)acrylate, (meth)acrylic copolymer, naphthalenesulfonate formalin condensate] etc. Polymer dispersants can be further classified into linear polymers, terminal modified polymers, graft-type polymers, and block-type polymers based on their structure. In addition, as the polymer dispersant, a resin having an acid value of 60 mgKOH/g or more (more preferably an acid value of 60 mgKOH/g or more and 300 mgKOH/g or less) can also be preferably mentioned.

As the terminal modified polymer, for example, a polymer having a phosphate group at the terminal described in Japanese Patent Application Laid-Open No. 3-112992, Japanese Patent Publication No. 2003-533455, etc., and Japanese Patent Application Publication No. 2002-273191 A polymer having a sulfonic acid group at the terminal described in the gazette, etc., a polymer having a partial skeleton or a heterocyclic ring of an organic pigment described in JP 9-077994 A, etc. In addition, as described in JP 2007-277514 A, two or more anchor sites (acid groups, basic groups, partial skeletons or heterocyclic rings of organic pigments) to the surface of the pigment are introduced into the end of the polymer. Etc.) because of its excellent dispersion stability, it is preferable.

As the graft type polymer, for example, the poly(lower alkylene group) described in Japanese Patent Application Publication No. 54-037082, Japanese Patent Application Publication No. 8-507960, Japanese Patent Application Publication No. 2009-258668, etc. Imine) and polyester reaction product, the reaction product of polyallylamine and polyester described in Japanese Patent Laid-Open No. 9-169821, etc., Japanese Patent Laid-Open No. 10-339949, and Japanese Patent Laid-Open No. 2004-037986 Copolymers of macromonomers and nitrogen atom monomers described in publications, etc., as described in Japanese Patent Application Publication No. 2003-238837, Japanese Patent Application Publication No. 2008-009426, Japanese Patent Application Publication No. 2008-081732, etc. Partial skeletons of organic pigments or heterocyclic graft polymers, copolymers of macromonomers and acid group-containing monomers described in JP 2010-106268 A, etc.

As the macromonomers used in the production of grafted polymers by radical polymerization, well-known macromonomers can be used, such as the macromonomer AA-6 manufactured by TOAGOSEI CO., LTD. (terminal group is methyl Polymethyl methacrylate with methacryloyl group), AS-6 (polystyrene with methacryloyl end group), AN-6S (polystyrene and acrylonitrile with methacryloyl end group) Copolymer), AB-6 (polybutyl acrylate with methacrylic acid end group), PLACCEL FM5 (ε-caprolactone 5-mole of 2-hydroxyethyl methacrylate) manufactured by Daicel Chemical Industries, Ltd. Ear equivalent plus finished product), FA10L (ε-caprolactone 10 molar equivalent of 2-hydroxyethyl acrylate plus finished product) and the polyester-based macromonomers described in Japanese Patent Application Publication No. 2-272009. Among them, from the viewpoint of the dispersibility, dispersion stability of the pigment dispersion, and the developability of the composition using the pigment dispersion, a polyester-based macromonomer with excellent flexibility and solvent affinity It is particularly preferable that the polyester-based macromonomer represented by the polyester-based macromonomer described in Japanese Patent Laid-Open No. 2-272009 is the best. As the block-type polymer, the block-type polymer described in JP 2003-049110 A, JP 2009-052010 A and the like is preferable.

The resin (dispersant) can also be obtained as a commercially available product. As a specific example, "Disperbyk-101 (polyamide phosphate), 107 (carboxylate), 110, 111 (containing acid groups) manufactured by BYK Chemie GmbH Copolymer), 130 (polyamide), 161, 162, 163, 164, 165, 166, 170 (polymer copolymer)", "BYK-P104, P105 (high molecular weight unsaturated polycarboxylic acid)", EFKA 4047, 4050-4165 (polyurethane series), EFKA 4330-4340 (block copolymer), 4400-4402 (modified polyacrylate), 5010 (polyester amide), 5765 (high molecular weight polycarboxylate) manufactured by EFKA Acid salt), 6220 (fatty acid polyester), 6745 (phthalocyanine derivative), 6750 (azo pigment derivative)", "AJISPER PB821, PB822, PB880, PB881" manufactured by Ajinomoto Fine-Techno Co., Inc. , "Florene TG-710 (urethane oligomer)", "Polyflow No.50E, No. 300 (acrylic copolymer)" manufactured by Kyoeisha chemical Co., Ltd., "DISPAR" manufactured by Kusumoto Chemicals, Ltd. LONKS-860, 873SN, 874, #2150 (aliphatic polycarboxylic acid), #7004 (polyether ester), DA-703-50, DA-705, DA-725", "DEMOL RN, N manufactured by Kao Corporation (Condensation polymer of formalin naphthalene sulfonate), MS, C, SN-B (condensation polymer of formalin aromatic sulfonate)", "HOMOGENOL L-18 (polymer polycarboxylic acid)", "Emalgen 920, 930, 935 , 985 (polyoxyethylene nonyl phenyl ether)", "Acetamine 86 (stearyl amine acetate)", "SOLSPERSE 5000 (phthalocyanine derivative), 22000 (azo pigment derivative) manufactured by Lubrizol Japan Ltd. ), 13240 (polyester amine), 3000, 17000, 27000 (polymer with functional part at the end), 24000, 28000, 32000, 38500 (graft polymer)", manufactured by Nikko Chemicals Co., Ltd. "Nikkor T106 (polyoxyethylene sorbitan monooleate), MYS-IEX (polyoxyethylene monostearate)", "HINOACT T-8000E" manufactured by Kawaken Fine Chemicals Co., Ltd., Shin-Etsu Chemical "Organosiloxane polymer KP341" manufactured by Co.,Ltd., "EFKA-46, EFKA-47, EFKA-47EA, EFKA polymer 100, EFKA polymer 400, EFKA manufactured by MORISHITA & CO.,LTD. Polymer 401, EFKA Polymer 450", "DISPERSE AID6, DISPERSE AID8, DISPERSE AID15, DISPERSE AID9100" manufactured by San Nopco Co., Ltd., "ADEKA PLURONIC L31, F38, L42, L44, L61, L64, F68, L72, P95, F77, P84, F87, P94, L101, P103, F108, L121, P-123" and "IONET S-20" manufactured by Sanyo Chemical Industries, Ltd., etc.

These resins may be used individually by 1 type, and may be used in combination of 2 or more types. Moreover, the alkali-soluble resin mentioned later can also be used as a dispersing agent. Examples of alkali-soluble resins include (meth)acrylic acid copolymers, itaconic acid copolymers, crotonic acid copolymers, maleic acid copolymers, partially esterified maleic acid copolymers, etc. The acidic cellulose derivative with carboxylic acid and the resin obtained by modifying the acid anhydride in the polymer with hydroxyl, especially the (meth)acrylic copolymer is preferred. In addition, the N-substituted maleimide monomer copolymer described in Japanese Patent Laid-Open No. 10-300922, the ether dimer copolymer described in Japanese Patent Laid-Open No. 2004-300204, and the Japanese Patent The alkali-soluble resin containing a polymerizable group described in Kaihei 7-319161 is also preferable. Among them, as the above-mentioned resin, from the viewpoint of dispersibility, it is preferable to include a resin having a polyester chain, and it is more preferable to include a resin having a polycaprolactone chain. In addition, from the viewpoints of dispersibility, transparency, and suppression of film defects caused by foreign substances, the resin (preferably an acrylic resin) preferably contains a structural unit having an ethylenically unsaturated group. The ethylenically unsaturated group is not particularly limited, but a (meth)acrylic acid group is preferred. In addition, when the resin has an ethylenically unsaturated group, especially a (meth)acrylic acid group in the side chain, the resin contains a divalent linking group having an alicyclic structure between the main chain and the ethylenic unsaturated group For better.

When the compound having the partial structure represented by formula (1) and the pigment, dye or pigment derivative other than the compound having the partial structure represented by formula (1) are included, the content of the dispersant is relative to that of the The total content of the compound represented by the partial structure represented by the formula (1) and the pigment, dye and pigment derivative other than the compound represented by the partial structure represented by formula (1) is 100 parts by mass, preferably 1 part by mass to 100 parts by mass , 5 parts by mass to 90 parts by mass are more preferable, and 10 parts by mass to 80 parts by mass are still more preferable.

-Alkali-soluble resin- From the viewpoint of developability, the composition of the present disclosure preferably contains an alkali-soluble resin as the binder polymer. As an alkali-soluble resin, it can have at least one group that promotes alkali solubility in the molecule (preferably a molecule with acrylic copolymer or styrene copolymer as the main chain), which is a linear organic polymer. The group of alkali-soluble resins is appropriately selected. From the standpoint of heat resistance, polyhydroxystyrene-based resins, polysiloxane-based resins, acrylic resins, acrylamide-based resins, and acrylic/acrylamide copolymer resins are preferred, and from the standpoint of controlling developability In particular, acrylic resins, acrylamide resins, and acrylic/acrylamide copolymer resins are preferred. Examples of groups that promote alkali solubility (hereinafter also referred to as acid groups) include carboxyl groups, phosphoric acid groups, sulfonic acid groups, phenolic hydroxyl groups, etc., which are soluble in organic solvents and can be developed with weak alkaline aqueous solutions. Preferably, (meth)acrylic acid can be cited as a particularly preferred one. These acid groups may be only one type or two or more types. As the alkali-soluble resin, reference can be made to the description of paragraphs 0558-0571 of JP 2012-208494 (corresponding to paragraphs 0685-0700 of the specification of U.S. Patent Application Publication No. 2012/0235099), and these contents are incorporated into this specification. in.

Alkali-soluble resins are also preferably resins having structural units represented by the following formula (ED).

[Chemical formula 14]

In the formula (ED), R ^E1 and R ^E2 each independently represent a hydrogen atom or an optionally substituted hydrocarbon group with 1 to 25 carbon atoms, and z represents 0 or 1.

The hydrocarbon group having 1 to 25 carbon atoms represented by R ^E1 and R ^E2 is not particularly limited. Examples include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, and tert-butyl. Straight-chain or branched alkyl groups such as phenyl, tertiary pentyl, stearyl, lauryl, 2-ethylhexyl; aryl groups such as phenyl; cyclohexyl, tertiary butylcyclohexyl, dicyclopentadi Alkenyl, tricyclodecyl, isobornyl, adamantyl, 2-methyl-2-adamantyl and other alicyclic groups; 1-methoxyethyl, 1-ethoxyethyl, etc. Alkyl substituted by oxy; alkyl substituted by aryl, such as benzyl. Among them, from the viewpoint of heat resistance, the first- or second-class hydrocarbon groups such as methyl, ethyl, cyclohexyl, and benzyl, which are difficult to be removed under the action of acid or heat, are particularly preferred. In addition, R ^E1 and R ^E2 may be the same kind of substituents or different substituents. As an example of the compound forming the structural unit represented by the formula (ED), 2,2'-[oxybis(methylene)]bis-2-dimethyl acrylate, 2,2'-[oxy Bis(methylene)]bis-2-diethyl acrylate, 2,2'-[oxybis(methylene)]bis-2-di(n-propyl)acrylate, 2,2'- [Oxybis(methylene)]bis-2-acrylate di(n-butyl) ester, 2,2'-[oxybis(methylene)]bis-2-acrylate di(tert-butyl) Esters, 2,2'-[oxybis(methylene)]bis-2-acrylate di(isobutyl) ester, etc. Among them, dimethyl 2,2'-[oxybis(methylene)]bis-2-acrylate is particularly preferred.

The said alkali-soluble resin may have a structural unit other than the structural unit represented by Formula (ED). As monomers forming the above-mentioned structural units, for example, from the viewpoint of ease of handling such as solubility in solvents, oil-soluble aryl (meth)acrylates, alkyl (meth)acrylates, and polyethylene are included. Oxy (meth)acrylate is also preferable as a copolymerization component, and aryl (meth)acrylate or alkyl (meth)acrylate is more preferable. In addition, from the viewpoint of alkali developability, it includes monomers having carboxyl groups such as (meth)acrylic acid or itaconic acid containing acidic groups, and those having phenolic hydroxyl groups such as N-hydroxyphenyl maleimide. Monomers, monomers having carboxylic anhydride groups, such as maleic anhydride or itaconic anhydride, are preferred as the copolymerization component, and (meth)acrylic acid is more preferred. As the above-mentioned alkali-soluble resin, for example, a structural unit represented by the formula (ED), a structural unit formed of benzyl methacrylate, and a resin selected from the group consisting of methyl methacrylate and methacrylic acid are preferably mentioned. At least one of the monomers in the group is a resin constituting a unit. Regarding the resin having the structural unit represented by the formula (ED), the description of paragraphs 0079 to 0099 of JP 2012-198408 A can be referred to, and the content is incorporated in the specification of this application.

The weight average molecular weight (Mw) of the alkali-soluble resin is preferably 2,000 to 50,000. The lower limit is more preferably 5,000 or more, and more preferably 7,000 or more. The upper limit is more preferably 45,000 or less, and more preferably 43,000 or less. The acid value of the alkali-soluble resin is preferably 30 to 200 mgKOH/g. The lower limit is more preferably 50 mgKOH/g or more, and more preferably 70 mgKOH/g or more. The upper limit is more preferably 150 mgKOH/g or less, and more preferably 120 mgKOH/g or less. In addition, the acid value in this disclosure is determined by the following method. The acid value means the mass of potassium hydroxide required to neutralize the solid content per 1 g of the acidic component. The measurement sample was dissolved in a mixed solvent of tetrahydrofuran/water=9/1 (mass ratio), and a potentiometric titration device (trade name: AT-510, manufactured by KYOTO ELECTRONICS MANUFACTURING CO., LTD.) was used at 25°C at 0.1 mol/ The L sodium hydroxide aqueous solution neutralizes the solution obtained by titration. The inflection point of the titration pH curve is regarded as the end point of the titration, and the acid value is calculated by the following formula. A=56.11×Vs×0.1×f/w A: Acid value (mgKOH/g) Vs: the amount of 0.1mol/L sodium hydroxide aqueous solution needed for titration (mL) f: The titration amount of 0.1mol/L sodium hydroxide aqueous solution w: Measure the mass of the sample (g) (conversion of solid content)

(Hardening compound) From the viewpoint of pattern formation, the composition of the present disclosure preferably contains a curable compound, and more preferably contains a curable compound and further contains a photopolymerization initiator. As the curable compound, a compound having a polymerizable group (hereinafter, also referred to as a “polymerizable compound”) is preferred. The hardening compound may be in any of chemical forms such as monomers, oligomers, prepolymers, and polymers. As the sclerosing compound, for example, paragraphs 0070 to 0191 of Japanese Patent Application Publication No. 2014-041318 (corresponding to paragraphs 0071 to 0192 of International Publication No. 2014/017669) and paragraphs 0045 to paragraphs of Japanese Patent Application Publication No. 2014-032380 can be referred to. The contents of 0216 etc. are incorporated in this application specification. Moreover, as commercial products of the urethane resin which has a methacryl group, 8UH-1006 and 8UH-1012 (the above are made by Taisei Fine Chemical Co., Ltd.) are mentioned.

The curable compound is preferably a polymerizable compound. The polymerizable compound may be a radical polymerizable compound or a cationic polymerizable compound. For example, a polymer containing an ethylenically unsaturated group, a cyclic ether group (epoxy group, oxetanyl group), etc. may be used. Sex-based compounds. Among them, ethylenically unsaturated compounds are preferred. As an ethylenically unsaturated group, a vinyl group, a styryl group, a (meth)acryloyl group, and a (meth)allyl group are preferable. The polymerizable compound may be a monofunctional compound having one polymerizable group, or a multifunctional polymerizable compound having two or more polymerizable groups, but a multifunctional polymerizable compound is preferred, and a multifunctional (methyl) Acrylate compounds are more preferable. When the composition contains a polyfunctional polymerizable compound, the film strength can be improved. Examples of the curable compound include monofunctional (meth)acrylate compounds, polyfunctional (meth)acrylate compounds (preferably 3-6 functional (meth)acrylate compounds), and polyacid modified acrylic acid. Oligomers, epoxy resins, multifunctional epoxy resins, etc.

As the curable compound, an ethylenically unsaturated compound can be preferably used. As an example of an ethylenically unsaturated compound, the description of paragraphs 0033 to 0034 of JP 2013-253224 A can be referred to, and the content is incorporated in this specification. As an ethylenically unsaturated compound, ethyleneoxy modified neopentyl erythritol tetraacrylate (as a commercially available product is NK Ester ATM-35E, manufactured by Shin-Nakamura Chemical Co., Ltd.), dineopentaerythritol triacrylic acid Ester (as a commercially available product is KAYARAD D-330, manufactured by Nippon Kayaku Co., Ltd.), dineopentaerythritol tetraacrylate (as a commercial product is KAYARAD D-320, manufactured by Nippon Kayaku Co., Ltd.) , Dineopentylerythritol penta(meth)acrylate (as a commercially available product is KAYARAD D-310, manufactured by Nippon Kayaku Co., Ltd.), dineopentylerythritol hexa(meth)acrylate (as a commercially available product) The product is KAYARAD DPHA, manufactured by Nippon Kayaku Co., Ltd., A-DPH-12E, manufactured by Shin-Nakamura Chemical Co., Ltd.), and these (meth)acrylic groups are through ethylene glycol and propylene glycol residues. The structure is better. Moreover, these oligomer types can also be used. In addition, diglycerin EO (ethylene oxide) modified (meth)acrylate (M-460 as a commercial product, manufactured by TOAGOSEI CO., LTD.) is preferred. Neopentyl erythritol tetraacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., A-TMMT) and 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA) are also comparable good. These oligomer types can also be used. For example, RP-1040 (manufactured by Nippon Kayaku Co., Ltd.) etc. can be mentioned.

The ethylenically unsaturated compound may have acid groups such as a carboxyl group, a sulfonic acid group, and a phosphoric acid group. Examples of the ethylenically unsaturated compound having an acid group include esters of aliphatic polyhydroxy compounds and unsaturated carboxylic acids. A compound having an acid group by reacting a non-aromatic carboxylic acid anhydride with an unreacted hydroxyl group of an aliphatic polyhydroxy compound is preferred, and particularly preferably the aliphatic polyhydroxy compound in the ester is neopentyl erythritol or di-neopentyl Four alcohols. As a commercially available product, for example, as a polyacid modified acrylic oligomer manufactured by TOAGOSEI CO., LTD., ARONIX series M-510, M-520, etc. can be cited. The acid value of the ethylenically unsaturated compound having an acid group is preferably 0.1 mgKOH/g to 40 mgKOH/g. The lower limit is more preferably 5mgKOH/g or more. The upper limit is more preferably 30 mgKOH/g or less.

In this disclosure, a compound having an epoxy group or an oxetanyl group can be used as the curable compound. Examples of the compound having an epoxy group or oxetanyl group include a polymer having an epoxy group in the side chain, a monomer or oligomer having two or more epoxy groups in the molecule, and the like. For example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolak type epoxy resin, cresol novolak type epoxy resin, aliphatic epoxy resin, etc. can be mentioned. In addition, monofunctional or polyfunctional glycidyl ether compounds can also be cited, and polyfunctional aliphatic glycidyl ether compounds are preferred. The weight average molecular weight is preferably 500 to 5,000,000, more preferably 1,000 to 500,000. Commercial products may be used for these compounds, or those obtained by introducing an epoxy group into the side chain of the polymer may be used. For example, CYCLOMER P ACA 200M, CYCLOMER ACA 230AA, CYCLOMER ACA Z250, CYCLOMER ACA Z251, CYCLOMER ACA Z300, CYCLOMER ACA Z320 (manufactured by Daicel Chemical Industries, Ltd. above) can be cited.

The curable compound may be only one type or two or more types. In the case of two or more types, the total amount is preferably in the above range. The content of the curable compound is preferably 1% by mass to 90% by mass relative to the total solid content of the composition. The lower limit is more preferably 5% by mass or more, more preferably 10% by mass or more, and more preferably 20% by mass or more. The upper limit is more preferably 80% by mass or less, and more preferably 75% by mass or less.

(Polymerization initiator) The composition of the present disclosure preferably contains a polymerization initiator together with the curable compound. The polymerization initiator may be a photopolymerization initiator or a thermal polymerization initiator, but a photopolymerization initiator is preferred. In addition, the polymerization initiator may be a radical polymerization initiator or a cationic polymerization initiator.

As the photoradical polymerization initiator, for example, halogenated hydrocarbon derivatives (for example, compounds having a triazole skeleton, compounds having a diazole skeleton, etc.), phosphine compounds such as oxyphosphine oxide, and hexaaryl Oxime compounds such as bisimidazole and oxime derivatives, organic peroxides, sulfur compounds, ketone compounds, aromatic onium salts, ketoxime ethers, aminoacetophenone compounds, hydroxyacetophenone, etc. As the halogenated hydrocarbon compound having a three 𠯤 skeleton, for example, Wakabayashi et al., Bull. Chem. Soc. The compound described in Japan, 42, 2924 (1969), the compound described in the specification of British Patent No. 1388492, the compound described in JP 53-133428 A, the compound described in the specification of German Patent No. 3337024 , By F. C. J. Schaefer et al. Org. Chem. ; Compounds described in 29, 1527 (1964), compounds described in JP 62-058241, compounds described in JP 5-281728, JP 5-034920 The compound described in, the compound described in the specification of U.S. Patent No. 4,212,976, etc.

From the viewpoint of exposure sensitivity, the photo-radical polymerization initiator is selected from the group consisting of oxime compounds, trihalomethyl tris compounds, benzyl dimethyl ketal compounds, α-hydroxy ketone compounds, and α-amino ketones. Compounds, phosphine compounds, phosphine oxide compounds, metallocene compounds, oxime compounds, triarylimidazole dimers, onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene compounds Compounds in the group of iron complexes, halomethyl oxadiazole compounds and 3-aryl substituted coumarin compounds are preferred, and oxime compounds are more preferred. Specific examples of oxime compounds include the compounds described in Japanese Patent Application Publication No. 2001-233842, the compounds described in Japanese Patent Application Publication No. 2000-080068, and the compounds described in Japanese Patent Application Publication No. 2006-342166. Compounds, compounds described in JP 2016-021012 A, etc. Also, you can cite J. C. S. Perkin II (1979, pp. 1653-1660), J. C. S. Perkin II (1979, pp. 156-162), Journal of Photopolymer Science and Technology (1995, pp. 202-232), Japanese Patent Application Publication No. 2000-066385, Japanese Patent Application Publication No. 2000-080068, Japanese Patent Table 2004-534797, Japanese Patent Application Publication No. 2006-342166, and the like described in the compound. Among commercially available products, IRGACURE-OXE01, IRGACURE-OXE02, IRGACURE-OXE03, and IRGACURE-OXE04 (the above are made by BASF) can also be preferably used. In addition, TR-PBG-304 (manufactured by Changzhou Tronly New Electronic Materials CO., LTD.), ADEKA ARKLS NCI-831 (manufactured by ADEKA CORPORATION), ADEKA ARKLS NCI-930 (manufactured by ADEKA CORPORATION), Adeka Optomer N- 1919 (manufactured by ADEKA CORPORATION).

In addition, as oxime compounds other than the above, the compounds described in Japanese Patent Application Publication No. 2009-519904 in which an oxime is attached to the N-position of the carbazole ring, and the US patent in which a heterosubstituent is introduced at the benzophenone site can be used The compound described in the specification No. 7626957, the compound described in Japanese Patent Laid-Open No. 2010-015025 and U.S. Patent Publication No. 2009-292039 in which a nitro group is introduced into the pigment site, and the compound described in the specification of International Publication No. 2009/131189 The ketoxime compound described, the compound described in the specification of U.S. Patent No. 7556910, which contains three skeletons and oxime skeletons in the same molecule, has a large absorption at 405 nm and has good sensitivity to g-ray light sources. Compounds described in 2009-221114 Bulletin, etc. Preferably, for example, paragraphs 0274 to 0275 of JP 2013-029760 A can be referred to, the contents of which are incorporated in this specification. Specifically, as the oxime compound, a compound represented by the following formula (OX-1) is preferred. In addition, the oxime compound may be an oxime compound in which the N-O bond of the oxime is an (E) body, an oxime compound in which the N-O bond of the oxime is a (Z) body, or a mixture of the (E) body and the (Z) body.

[Chemical formula 15]

In the formula (OX-1), R ^O1 and R ^O2 each independently represent a monovalent substituent, R ^O3 represents a divalent organic group, and Ar ^O1 represents an aryl group. In formula (OX-1), as the monovalent substituent represented by R ^O1 , a monovalent non-metal atomic group is preferred. Examples of the monovalent non-metal atomic group include an alkyl group, an aryl group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic group, an alkylthiocarbonyl group, and an arylthiocarbonyl group. In addition, these groups may have one or more substituents. In addition, the above-mentioned substituent may be further substituted with another substituent. Examples of the substituent include a halogen atom, an aryloxy group, an alkoxycarbonyl group or an aryloxycarbonyl group, an acyloxy group, an acyl group, an alkyl group, an aryl group, and the like. In the formula (OX-1), as the monovalent substituent represented by R ^O2 , an aryl group, a heterocyclic group, an arylcarbonyl group or a heterocyclic carbonyl group is preferred. These groups may have one or more substituents. As a substituent, the above-mentioned substituent can be illustrated. In the formula (OX-1), as the divalent organic group represented by R ^O3 , an alkylene group, cycloalkylene group, and alkynylene group having 1 to 12 carbon atoms are preferred. These groups may have one or more substituents. As a substituent, the above-mentioned substituent can be illustrated.

As the photopolymerization initiator, a compound represented by the following formula (X-1) or formula (X-2) can also be used.

[Chemical formula 16]

In formula (X-1), R ^X1 and R ^X2 each independently represent an alkyl group having 1 to 20 carbons, an alicyclic hydrocarbon group having 4 to 20 carbons, an aryl group having 6 to 30 carbons, or a carbon number of 7 to The arylalkyl group of 30, when R ^X1 and R ^X2 are phenyl groups, the phenyl groups may be bonded to each other to form a stilbene group, and R ^X3 and R ^X4 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, An aryl group having 6 to 30 carbons, an arylalkyl group having 7 to 30 carbons, or a heterocyclic group having 4 to 20 carbons, and X ^A represents a single bond or a carbonyl group.

In formula (X2), in the R ^X1, R ^X2, R ^X3, and R ^X4 meaning as in formula ^{(X1) R X1, R X2} , R ^X3, and the same R ^X4, R ^X5 represents -R ^X6, -OR ^X6 , -SR ^X6 , -COR ^X6 , -CONR ^X6 R ^X6 , -NR ^X6 COR ^X6 , -OCOR ^X6 , -COOR ^X6 , -SCOR ^X6 , -OCSR ^X6 , -COSR ^X6 , -CSOR ^X6 , -CN , A halogen atom or a hydroxyl group, R ^X6 represents an alkyl group having 1 to 20 carbons, an aryl group having 6 to 30 carbons, an arylalkyl group having 7 to 30 carbons or a heterocyclic group having 4 to 20 carbons, X ^A It represents a single bond or a carbonyl group, and xa represents an integer of 0-4.

In the above formula (X-1) and formula (X-2), it is preferred that R ¹ and R ² are independently methyl, ethyl, n-propyl, isopropyl, cyclohexyl or phenyl. R ^X3 is preferably methyl, ethyl, phenyl, tolyl or xylyl. R ^X4 is preferably an alkyl group or phenyl group having 1 to 6 carbon atoms. R ^X5 is preferably methyl, ethyl, phenyl, tolyl or naphthyl. X ^A is preferably a single bond. As specific examples of the compounds represented by formula (X-1) and formula (X-2), for example, the compounds described in paragraphs 0076 to 0079 of JP 2014-137466 A can be cited. Its content is compiled into this manual.

As the photopolymerization initiator, an oxime compound having a nitro group can be used. The oxime compound having a nitro group is also preferably a dimer. Specific examples of the oxime compound having a nitro group include paragraphs 0031 to 0047 of JP 2013-114249 A, paragraphs 0008 to 0012 and 0070 to 0079 of JP 2014-137466 A, and Japanese Patent No. 4223071 The compound and ADEKA ARKLS NCI-831 (manufactured by ADEKA CORPORATION) described in paragraphs 0007 to 0025 of the publication.

The oxime compound preferably has a maximum absorption wavelength in the wavelength region of 350 nm to 500 nm, more preferably has an absorption wavelength in the wavelength region of 360 nm to 480 nm, and particularly preferably the absorbance at 365 nm and 405 nm. As the oxime compound, from the viewpoint of sensitivity, the molar absorption coefficient at 365 nm or 405 nm is preferably 1,000 to 300,000, more preferably 2,000 to 300,000, and more preferably 5,000 to 200,000. The molar absorption coefficient of the compound can be measured using a known method. For example, by using an ultraviolet-visible spectrophotometer (Cary-5 spectrophotometer manufactured by Varian), it is better to use ethyl acetate solvent to measure at a concentration of 0.01 g/L.

Specific examples of oxime compounds that can be preferably used in the present disclosure are shown below, but the present disclosure is not limited to these.

[Chemical formula 17]

In addition, as examples of -OC ₉ F ₁₇ in (C-12) above, the following groups can be given.

[Chemical formula 18]

As the photopolymerization initiator, an oxime compound having a fluorine atom can also be used. Specific examples of the oxime compound having a fluorine atom include the compounds described in JP 2010-262028 A, the compounds 24, 36-40, and the compounds described in JP 2014-500852 A The compound (C-3), etc. described in the 2013-164471 Bulletin. Its content is compiled into this manual.

As a photocationic polymerization initiator, a photoacid generator can be mentioned. Examples of photoacid generators include onium salt compounds such as diazonium salts, phosphonium salts, sulfonium salts, and phosphonium salts, iminium sulfonates, oxime sulfonates, and diazonium salts that generate acids by decomposition by light irradiation. Sulfonate compounds such as dioxin, dioxin, o-nitrobenzyl sulfonate, etc. For the details of the photocationic polymerization initiator, refer to the description of paragraphs 0139 to 0214 of JP 2009-258603 A, and the contents are incorporated in this specification.

A commercially available product can also be used as a photocationic polymerization initiator. Commercial products of the photocationic polymerization initiator include ADEKA ARKLS SP series manufactured by ADEKA CORPORATION (for example, ADEKA ARKLS SP-606, etc.), IRGACURE250, IRGACURE270, IRGACURE290 manufactured by BASF, etc.

The polymerization initiator may be only one type or two or more types. In the case of two or more types, the total amount is preferably within the above-mentioned range. The content of the polymerization initiator is preferably 0.01% by mass to 30% by mass relative to the total solid content of the composition. The lower limit is more preferably 0.1% by mass or more, and more preferably 0.5% by mass or more. The upper limit is more preferably 20% by mass or less, and more preferably 15% by mass or less.

(Solvent) The composition of the present disclosure may include a solvent. The solvent is not particularly limited, and can be appropriately selected according to the purpose as long as it can uniformly dissolve or disperse each component of the composition. For example, water and organic solvents can be used, and organic solvents are preferred. As the organic solvent, for example, alcohols (such as methanol), ketones, esters, aromatic hydrocarbons, halogenated hydrocarbons, dimethylformamide, dimethylacetamide, and dimethylacetamide Yaqi, Huandingqi, etc. These may be used individually by 1 type, and may use 2 or more types together. Among them, at least one organic solvent selected from the group consisting of esters and ketones having a cyclic alkyl group can be preferably used. Specific examples of alcohols, aromatic hydrocarbons, and halogenated hydrocarbons include those described in paragraph 0136 of JP 2012-194534 A, etc., the contents of which are incorporated in this specification. Specific examples of esters, ketones, and ethers include those described in paragraph 0497 of JP 2012-208494 (corresponding to paragraph 0609 of the specification of U.S. Patent Application Publication No. 2012/0235099). Examples include n-pentyl acetate, ethyl propionate, dimethyl phthalate, ethyl benzoate, methyl sulfate, acetone, methyl isobutyl ketone, diethyl ether, ethylene glycol monobutyl ether acetate, and the like.

As a solvent, selected from ethanol, methanol, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, N -Methyl-2-pyrrolidone, ethyl cyrus acetate, ethyl lactate, butyl acetate, cyclohexyl acetate, diethylene glycol dimethyl ether, 2-heptanone, cyclopentanone, cyclopentanone One or more of hexanone, ethyl carbitol acetate, butyl carbitol acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether and propylene glycol monomethyl ether acetate is more good.

The content of the solvent is preferably an amount of 10% by mass to 90% by mass of the total solid content of the composition. The lower limit is more preferably 15% by mass or more, and more preferably 20% by mass or more. The upper limit is more preferably 80% by mass or less, and more preferably 70% by mass or less. The solvent may be only one type or two or more types. In the case of two or more types, the total amount is preferably in the above-mentioned range.

(Pigment derivatives) The composition of the present disclosure preferably further contains a pigment derivative other than the compound having a partial structure represented by the formula (1) (hereinafter, also referred to simply as a “color derivative”). By including the pigment derivative, especially when the compound having the partial structure represented by the formula (1) is a pigment, the dispersibility of the compound having the partial structure represented by the formula (1) is improved to efficiently suppress the compound having the formula (1) ) The aggregation of the partial structure of the compound. Pigment derivatives are preferably pigment derivatives. As the pigment derivative, one having a structure in which part of the pigment is substituted with an acidic group, a basic group, or a group having a salt structure is preferred, and the pigment derivative represented by the following formula (3) is more preferred. In the pigment derivative represented by the following formula (3), the pigment structure P is easily adsorbed on the surface of the compound having the partial structure represented by the formula (1), and therefore can improve the composition having the formula (1) Dispersibility of compounds with partial structure. In addition, when the composition contains a resin, the end portion X of the pigment derivative is adsorbed to the resin by the interaction with the adsorbing portion (polar group, etc.) of the resin, so that the partial structure represented by formula (1) can be further improved The dispersion of the compound.

[Chemical formula 19]

In formula (3), P ³ represents a dye structure, L ³ each independently represents a single bond or a linking group, X ³ each independently represents an acidic group, a basic group, or a group having a salt structure, and m represents an integer of 1 or more , N represents an integer of 1 or more.

The pigment structure in P ³ is selected from the group consisting of pyrrolopyrrole pigment structure, squaraine pigment structure, crotonium pigment structure, diiminium pigment structure, oxacyanine pigment structure, diketopyrrolopyrrole pigment structure, quinacrine Ketone pigment structure, anthraquinone pigment structure, dianthraquinone pigment structure, benzisoindole pigment structure, thioindigo pigment structure, azo pigment structure, quinophthalone pigment structure, phthalocyanine pigment structure, naphthalocyanine pigment structure At least one of the group consisting of two pigment structure, pyrromethene pigment structure, perylene pigment structure, perylene pigment structure, and benzimidazolinone pigment structure is preferably selected from the group consisting of pyrrolopyrrole pigments At least one of the group of structure, squaraine pigment structure, croconium pigment structure, diketopyrrolopyrrole pigment structure, quinacridone pigment structure, and benzimidazolinone pigment structure is more preferred, pyrrolopyrrole The pigment structure is particularly good. When the pigment derivative has these pigment structures, the dispersibility of the compound having the partial structure represented by formula (1) can be further improved.

As the linking group in L ³ , it is composed of 1 to 100 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, 1 to 200 hydrogen atoms and 0 to 20 sulfur atoms The group is preferred and may be unsubstituted or may further have a substituent. As the substituent, an alkyl group, an aryl group, a hydroxyl group or a halogen atom is preferred. The linking group is an alkylene group, an aryl group, a nitrogen-containing heterocyclic group, -NR'-, -SO ₂ -, -S-, -O-, -CO-, -COO-, -CONR'- or the Groups composed of two or more of the above are preferred, and groups composed of alkylene, arylene, -SO ₂ -, -COO- or two or more of these are more preferred . R'represents a hydrogen atom, an alkyl group (preferably with 1 to 30 carbons) or an aryl group (preferably with 6 to 30 carbons). The number of carbon atoms in the alkylene group is preferably 1-30, more preferably 1-15, and still more preferably 1-10. The alkylene group may have a substituent. The alkylene group may be any of linear, branched, and cyclic. In addition, the cyclic alkylene group may be monocyclic or polycyclic. The carbon number of the aryl group is preferably from 6 to 18, more preferably from 6 to 14, more preferably from 6 to 10, and particularly preferably from the phenyl group. The nitrogen-containing heterocyclic group is preferably a 5-membered ring or a 6-membered ring. In addition, the nitrogen-containing heterocyclic group is preferably a monocyclic ring or a condensed ring, a monocyclic ring or a condensed ring having a condensation number of 2 to 8 is preferable, and a monocyclic ring or a condensed ring having a condensation number of 2 to 4 is more preferable. The number of nitrogen atoms contained in the nitrogen-containing heterocyclic group is preferably 1 to 3, and 1 or 2 is more preferable. The nitrogen-containing heterocyclic group may contain heteroatoms other than nitrogen atoms. Examples of heteroatoms other than nitrogen atoms include oxygen atoms and sulfur atoms. The number of heteroatoms other than nitrogen atoms is preferably 0 to 3, and 0 or 1 is more preferable. Examples of the nitrogen-containing heterocyclic group include piperidine ring group, pyrrolidin ring group, pyrrol ring group, piperidine ring group, pyridine ring group, imidazole ring group, pyrazole ring group, azole ring group, and thiazole ring group. , Pyridine ring group, morpholine ring group, thio ring group, indole ring group, isoindole ring group, benzimidazole ring group, purine ring group, quinoline ring group, isoquinoline ring group, quinoline The group represented by any one of the following formula (L-1)-formula (L-7), a linoline ring group, a cinnoline ring group, a carbazole ring group.

[Chemical formula 20]

* In the formula represents a bonding site with P ³ , L ³ or X ³ , and R represents a hydrogen atom or a substituent. As a substituent, the substituent T can be mentioned. As the substituent T, for example, an alkyl group having 1 to 10 carbons, an alkoxy group having 1 to 10 carbons, a thioalkoxy group having 1 to 10 carbons, a hydroxyl group, a carboxyl group, an acetyl group, and a cyano group , Halogen atoms (fluorine atom, chlorine atom, bromine atom, iodine atom), etc. These substituents may further have a substituent.

Specific examples of the linking group include alkylene, aryl, -SO ₂ -, the group represented by the above formula (L-1), the group represented by the above formula (L-5), A group consisting of a combination of -O- and an alkylene group, a group consisting of a combination of -NR'- and an alkylene group, a group consisting of a combination of -NR'--CO- and an alkylene group, -NR'-, -CO-, a group consisting of a combination of alkylene and aryl, a group consisting of a combination of -NR'-, -CO- and aryl, a group consisting of -NR'-,- A group composed of a combination of SO ₂ -and an alkylene group, a group composed of a combination of -NR'-, -SO ₂ -, an alkylene group and an aryl group, represented by the above formula (L-1) A group composed of a combination of a group and an alkylene group, a group composed of a combination of the group represented by (L-1) above and an aryl group, a group represented by the above formula (L-1), A group consisting of a combination of -SO ₂ -and an alkylene group, a group consisting of a group represented by the above formula (L-1), a group consisting of a combination of -S- and an alkylene group, a group consisting of the above formula (L-1 The group represented by ), a group consisting of a combination of -O- and an aryl group, a group consisting of a combination of the group represented by the above formula (L-1), -NR'-, -CO- and an aryl group A group consisting of a combination of a group represented by the above formula (L-3) and an aryl group, a group consisting of a combination of an aryl group and -COO-, a group consisting of an aryl group, -COO- and A group composed of a combination of alkylene groups, etc.

In formula (3), X ³ represents an acidic group, a basic group, or a group having a salt structure. As an acidic group, a carboxyl group, a sulfo group, a phosphoric acid group, a sulfonylimide group, etc. are mentioned. As a basic group, the group represented by the formula (X-3)-a formula (X-8) mentioned later can be mentioned. Examples of groups having a salt structure include the salts of the above-mentioned acidic groups and the salts of basic groups. Examples of the atom or atomic group constituting the salt include metal atoms, tetrabutylammonium, and the like. As the metal atom, an alkali metal atom or an alkaline earth metal atom is more preferable. Examples of the alkali metal atom include lithium, sodium, potassium, and the like. Examples of alkaline earth metal atoms include calcium and magnesium.

X ^{3 is} at least one group selected from the group consisting of a carboxyl group, a sulfo group, a sulfonylimide group, and a group represented by any one of the following formulas (X-1) to (X-11) For better.

[Chemical formula 21]

In formula (X-1) to formula (X-11), * represents the bonding site with L ³ of formula (3), and R ¹⁰⁰ to R ¹⁰⁶ each independently represent a hydrogen atom, an alkyl group, an alkenyl group or an aryl group , R ¹⁰⁰ and R ¹⁰¹ may be connected to each other to form a ring, and M represents an atom or group of atoms that forms a salt with an anion. The alkyl group may be linear, branched, or cyclic. The carbon number of the linear alkyl group is preferably 1-20, more preferably 1-12, and still more preferably 1-8. The carbon number of the branched alkyl group is preferably 3-20, more preferably 3-12, and still more preferably 3-8. The cyclic alkyl group may be either monocyclic or polycyclic. The carbon number of the cyclic alkyl group is preferably 3-20, more preferably 4-10, and still more preferably 6-10. The carbon number of the alkenyl group is preferably 2-10, more preferably 2-8, and still more preferably 2-4. The carbon number of the aryl group is preferably 6-18, more preferably 6-14, and still more preferably 6-10. R ¹⁰⁰ and R ¹⁰¹ may be connected to each other to form a ring. The ring may be an alicyclic ring or an aromatic ring. The ring can be a single ring or multiple rings. As the linking group when R ¹⁰⁰ and R ^{101 are} bonded to form a ring, it can be selected from the group consisting of -CO-, -O-, -NH-, divalent aliphatic groups, divalent aromatic groups and the like The divalent linker in the combined group is connected. As specific examples, for example, piperidine ring, pyrrolidine ring, pyrrole ring, piperidine ring, pyridine ring, imidazole ring, pyrazole ring, azole ring, thiazole ring, pyrazole ring, morpholine ring, and thiazole ring are mentioned. Ring, indole ring, isoindole ring, benzimidazole ring, purine ring, quinoline ring, isoquinoline ring, quinoline ring, cinnoline ring, carbazole ring, etc. R ¹⁰⁷ , R ¹⁰⁸ and R ¹⁰⁹ each independently represent a halogen atom, a hydroxyl group, or a hydrocarbon group with 1 or more carbon atoms which may include a substituent. The hydrocarbon group represented by R ¹⁰⁷ , R ¹⁰⁸ and R ¹⁰⁹ may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group. In addition, the aliphatic hydrocarbon group may be any of linear, branched, and cyclic. The aliphatic hydrocarbon group preferably has 1 to 30 carbon atoms. The upper limit is preferably 20 or less, more preferably 10 or less, and even more preferably 5 or less. The aromatic hydrocarbon group preferably has 6 to 20 carbon atoms. The upper limit is preferably 18 or less, more preferably 15 or less, and more preferably 12 or less. Examples of substituents that may be contained in the hydrocarbon group represented by R ¹⁰⁷ , R ¹⁰⁸ and R ¹⁰⁹ include a halogen atom, a hydroxyl group, a carboxyl group, an alkoxy group, a phenoxy group, an acyl group, and a sulfo group. At least a part of the hydrogen atoms of the alkoxy group may be substituted with halogen atoms. As the above-mentioned substituent, a halogen atom or an alkoxy group in which at least a part of a hydrogen atom may be substituted with a halogen atom is preferred, and a halogen atom is more preferred. Furthermore, as the halogen atom, a chlorine atom, a fluorine atom or a bromine atom is preferable, and a fluorine atom is more preferable. M represents an atom or group of atoms forming a salt with an anion. The above can be cited, and the preferred range is also the same. The upper limit of m represents the number of substituents that the dye structure P can take, for example, 10 or less is preferable, and 5 or less is more preferable. When m is 2 or more, a plurality of L and X may be different from each other. It is preferable that n is an integer of 1 to 3, and 1 or 2 is more preferable. When n is 2 or more, a plurality of Xs may be different from each other. As specific examples, the following groups can be given.

[Chemical formula 22]

[Chemical formula 23]

The pigment derivative is preferably a pigment derivative represented by the following formula (4). The pigment derivative represented by the following formula (4) is a compound in which P in the formula (3) is a pyrrolopyrrole pigment structure.

[Chemical formula 24]

In formula (4), R ⁴³ to R ⁴⁶ each independently represent a cyano group, an acyl group, an alkoxycarbonyl group, an alkylsulfinyl group, an arylsulfinyl group or a heteroaryl group, and R ⁴⁷ and R ⁴⁸ are respectively Independently represent a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, -BR ⁴⁹ R ⁵⁰ or a metal atom, R ⁴⁷ can be covalently bonded or coordinately bonded with R ⁴³ or R ⁴⁵ , and R ⁴⁸ can be bonded to R ⁴⁴ or R ⁴⁶ are covalently bonded or coordinately bonded, R ⁴⁹ and R ⁵⁰ each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group Or heteroaryloxy, R ⁴⁹ and R ⁵⁰ may be bonded to each other to form a ring, L ⁴¹ and L ⁴² each independently represent a single bond or an alkylene group, an aryl group, a nitrogen-containing heterocyclic group, -O-,- S-, -NR'-, -CO-, -SO ₂ -or a linking group formed by combining two or more of these, R'represents a hydrogen atom, an alkyl group or an aryl group, X ⁴¹ and X ⁴² are respectively Each independently represents an acidic group, a basic group, or a group having a salt structure, n41 and n42 each independently represent an integer from 0 to 4, and at least one of n41 and n42 is 1 or more.

R ⁴³ to R ⁴⁸ in formula (4) have the same meaning as R ³ to R ⁸ in formula (1), and preferred aspects are also the same. X ⁴¹ and X ⁴² in formula (4) have the same meaning as X ^{3 in} formula (3), and preferred aspects are also the same.

In formula (4), L ⁴¹ and L ^{42 have} the same meaning as L ^{3 in} formula (3), and preferred aspects are also the same. In addition, from the viewpoint of synthesis suitability and visibility, the following linking groups are particularly preferred.

[Chemical formula 25]

In addition, in L ⁴¹ , the number of atoms constituting the benzene ring and the chain of X ⁴¹ directly connected to the pyrrolopyrrole structure as the core structure of the pigment derivative is preferably 1 to 20. The lower limit is more preferably 2 or more, and more preferably 3 or more. The upper limit is more preferably 15 or less, and more preferably 10 or less. In L ⁴² , the number of atoms constituting the benzene ring directly connected to the pyrrolopyrrole structure as the core structure of the pigment derivative and the chain of X ⁴² is preferably 1-20. The lower limit is more preferably 2 or more, and more preferably 3 or more. The upper limit is more preferably 15 or less, and more preferably 10 or less. According to this aspect, the dispersibility of the pigment can be further improved. Although the detailed reason is not clear, it is speculated that by extending the distance between the pyrrolopyrrole structure, which is the core structure of the pigment derivative, and X ⁴¹ and X ⁴² , X ⁴¹ and X ^{42 are} not susceptible to steric effects, and are not easily affected by resins. The interaction easily works, and as a result, the dispersibility of the pigment can be improved.

The solubility of the compound represented by the formula (4) to the solvent (25° C.) contained in the composition is preferably 0 g/L to 0.1 g/L, more preferably 0 g/L to 0.01 g/L. According to this aspect, the dispersibility of the pigment can be further improved.

The compound represented by the formula (4) is preferably a compound having a maximum absorption wavelength in the range of 700 nm to 1,200 nm. Furthermore, it is preferable that the ratio A1/A2 of the absorbance A1 at a wavelength of 500 nm to the absorbance A2 at the maximum absorption wavelength is 0.1 or less, and more preferably 0.05 or less. In addition, the absorbance of the compound in the present disclosure is a value obtained from the absorption spectrum of the compound in the solution. As the measurement solvent used in the measurement of the absorption spectrum of the compound represented by the formula (4) in the solution, chloroform, dimethyl sulfoxide, tetrahydrofuran and the like can be mentioned. When the compound represented by formula (4) is dissolved in chloroform, chloroform is used as the measurement solvent. In addition, when it is not dissolved in chloroform but dissolved in dimethyl sulfene or tetrahydrofuran, dimethyl sulfene or tetrahydrofuran is used as the measurement solvent.

As specific examples of the dye derivative represented by formula (3), the following (3-1) to (3-25) can be given. In addition, in the following formulae, m, m1, m2, and m3 each independently represent an integer of 1 or more.

[Chemical formula 26]

[Chemical formula 27]

[Chemical formula 28]

[Chemical formula 29]

[Chemical formula 30]

[Chemical formula 31]

As specific examples of the compound represented by formula (4), Syn-1 to Syn-19 and the following compounds in the examples described later can be given. In the following structural formula, Me represents a methyl group, Bu represents a butyl group, and Ph represents a phenyl group. In addition, Ar-1 to Ar-31 and R-1 to R-7 in the following table are shown below. The "*" in the structure shown below is the connection key.

[Table 1]

[Table 2]

[Chemical formula 32]

[Chemical formula 33]

[Chemical formula 34]

[Chemical formula 35]

In addition, the composition of the present disclosure may contain one kind of the above-mentioned pigment derivative alone or two or more kinds. From the viewpoint of infrared absorption and dispersibility, the content of the pigment derivative relative to the total solid content of the composition is preferably 0.1% by mass to 30% by mass, more preferably 0.5% by mass to 25% by mass. 1% by mass to 20% by mass is more preferable. In addition, from the viewpoint of infrared absorption and dispersibility, the content of the pigment derivative relative to the total mass of the compound having the partial structure represented by formula (1) is preferably 1% to 80% by mass. 2% by mass to 50% by mass is more preferable, and 5% by mass to 40% by mass is more preferable.

(Coloring agent, black coloring agent, coloring agent to block visible light) The composition of the present disclosure can contain at least one selected from the group consisting of color colorants and black colorants (hereinafter, color colorants and black colorants are also collectively referred to as visible colorants). In this disclosure, the color colorant refers to coloring agents other than white coloring agent and black coloring agent. The coloring agent is preferably a coloring agent that has absorption in the range of 400 nm or more and less than 650 nm.

-Color colorant- In this disclosure, the color colorant may be a pigment or a dye. The average particle diameter (r) of the pigment satisfies 20nm≤r≤300nm preferably, 25nm≤r≤250nm is more preferable, and 30nm≤r≤200nm is more preferable. The "average particle diameter" as used herein refers to the average particle diameter of the secondary particles formed by the aggregation of the primary particles of the pigment. In addition, in the particle size distribution of the secondary particles of the pigment that can be used (hereinafter also referred to as "particle size distribution"), the secondary particles entering (average particle size ±100) nm are 70% by mass or more of the whole, Preferably it is 80 mass% or more. In addition, the particle size distribution of the secondary particles can be measured using the scattering intensity distribution. In addition, the average particle size of the primary particles can be obtained by observing with a scanning electron microscope (SEM) or transmission electron microscope (TEM), measuring the size of 100 particles in the unaggregated part of the particles and calculating the average value. .

Pigment-based organic pigments are preferred. Moreover, as a pigment, the following can be mentioned. However, this disclosure is not limited to these. Color Index (CI) Pigment Yellow (Pigment Yellow) 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128,129,137,138,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, etc. (the above are yellow pigments); CI Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64 , 71, 73, etc. (the above are orange pigments); CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3 , 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2 , 81: 3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178 , 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 270, 272, 279 , 294 (Koushankou Galaxy, Organo Ultamarine, Bluish Red), etc. (the above are red pigments); C.I. Pigment Green 7, 10, 36, 37, 58, 59, etc. (the above are green pigments); C.I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, etc. (the above are purple pigments); CI Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (Monoazo series), 88 (methine/polymethine series), etc. (the above are blue pigments). These pigments can be used alone or in combination of various pigments.

The dye is not particularly limited, and known dyes can be used. As the chemical structure, pyrazole azo series, anilino azo series, triaryl methane series, anthraquinone series, anthrapyridone series, benzylidene series, oxacyanine series, pyrazolotriazole azo series can be used , Pyridone azo series, cyanine series, phenothionine series, pyrrolopyrazole methine azo series, Kouyamakou galaxy, phthalocyanine series, benzopyran series, indigo series, pyrromethene series, etc. dye. In addition, multimers of these dyes can be used. Moreover, the dyes described in JP 2015-028144 A and JP 2015-034966 A can also be used.

In addition, as the dye, at least one of acid dyes and derivatives thereof can be preferably used in some cases. In addition, at least one of direct dyes, basic dyes, mordant dyes, acid mordant dyes, ice dyes, disperse dyes, oil-soluble dyes, food dyes, and derivatives thereof can also be usefully used.

Specific examples of acid dyes are given below, but they are not limited to these. For example, the following dyes and derivatives of these dyes can be mentioned. Acid alizarin violet (acid alizarin violet) N; Acid blue (acid blue) 1, 7, 9, 15, 18, 23, 25, 27, 29, 40~45, 62, 70, 74, 80, 83, 86, 87, 90, 92, 103, 112, 113, 120, 129, 138, 147, 158, 171, 182, 192, 243, 324:1; Acid chrome violet (acid chrome violet) K; Acid Fuchsin (acid Fuchsin); acid green (acid green) 1, 3, 5, 9, 16, 25, 27, 50; Acid orange (acid orange) 6, 7, 8, 10, 12, 50, 51, 52, 56, 63, 74, 95; Acid red 1, 4, 8, 14, 17, 18, 26, 27, 29, 31, 34, 35, 37, 42, 44, 50, 51, 52, 57, 66, 73, 80, 87, 88, 91, 92, 94, 97, 103, 111, 114, 129, 133, 134, 138, 143, 145, 150, 151, 158, 176, 183, 198, 211, 215, 216, 217, 249, 252, 257, 260, 266, 274; Acid violet (acid violet) 6B, 7, 9, 17, 19; Acid yellow (acid yellow) 1, 3, 7, 9, 11, 17, 23, 25, 29, 34, 36, 42, 54, 72, 73, 76, 79, 98, 99, 111, 112, 114, 116, 184, 243; Food Yellow 3.

In addition, acid dyes of the azo series, the Kouyamaguchi system, and the phthalocyanine series other than the above are also preferred, and CI solvent blue (Solvent Blue) 44 and 38; CI solvent orange (Solvent orange) 45 can also be preferably used; Acid dyes such as Rhodamine B and Rhodamine 110 and their derivatives. Among them, as the dye, selected from the group consisting of triarylmethane series, anthraquinone series, methine azo series, benzylidene series, oxacyanine series, cyanine series, phenothionine series, pyrrolopyrazole methine series Nitrogen series, Kouyamaguchi galaxy, phthalocyanine series, benzopyran series, indigo series, pyrazole azo series, anilino azo series, pyrazolotriazole azo series, pyridone azo series, anthrapyridone The coloring agent in the pyrromethene series and the pyrromethene series is preferred. In addition, pigments and dyes can be used in combination.

-Black colorant- As the black colorant, an organic black colorant is preferred. In addition, in the present disclosure, a black colorant as a coloring agent for shielding visible light refers to a material that absorbs visible light but transmits at least a part of infrared rays. Therefore, in the present disclosure, the black colorants used as colorants for shielding visible light do not include carbon black and titanium black. The black colorant as a coloring agent for shielding visible light can also use bisbenzofuranone compounds, methine azo compounds, perylene compounds, azo compounds, and the like.

Examples of the bisbenzofuranone compound include those described in Japanese Patent Application Publication No. 2010-534726, Japanese Patent Application Publication No. 2012-515233, Japanese Patent Application Publication No. 2012-515234, and the like. For example, it can be obtained as "Irgaphor Black" manufactured by BASF. As the perylene compound, C.I. Pigment Black (Pigment Black) 31, 32 and the like can be mentioned.

Examples of the methine azo compound include those described in Japanese Patent Application Laid-Open No. 1-170601 and Japanese Patent Application Laid-Open No. 2-034664. For example, it can be manufactured by Dainichiseika Color & Chemicals Mfg. Co., Ltd. "CHROMO FINE BLACKA1103" was obtained. The azo compound is not particularly limited, but a compound represented by the following formula (A-1) and the like can be preferably mentioned.

[Chemical formula 36]

-Coloring agent to block visible light- When the composition of the present disclosure is used to manufacture an infrared transmission filter that transmits infrared rays in a region where the contained infrared absorbing pigment does not absorb, it is preferable to include a coloring agent that blocks visible light. The coloring agent for shielding visible light is preferably black, gray, or a color close to these by a combination of a plurality of coloring agents. In addition, a coloring agent that shields visible light is preferably a material that absorbs light in the purple to red wavelength range. In addition, a coloring agent that shields visible light is preferably a coloring agent that shields light in the wavelength region of 450 nm to 650 nm. In the present disclosure, it is preferable that the coloring agent that shields visible light satisfies at least one of the following requirements (1) and (2), and it is even more preferable to satisfy the requirement (1). (1): Contains more than two color colorants. (2): Contains black colorant. In addition, in the present disclosure, the black colorant as a coloring agent that shields visible light refers to a material that absorbs visible light but transmits at least a part of infrared rays. Therefore, in the present disclosure, the organic black colorant as a coloring agent that shields visible light does not include black colorants that absorb both visible light and infrared rays, such as carbon black or titanium black.

The above-mentioned coloring agent for shielding visible light, for example, the ratio of the minimum absorbance value A in the wavelength range of 450 nm to 650 nm to the minimum absorbance value B in the wavelength range of 900 nm to 1,300 nm, that is, A/B is preferably 4.5 or more. . The above-mentioned characteristics can be satisfied by a single material or by a combination of a plurality of materials. For example, in the case of the aspect (1) above, it is preferable to combine a plurality of color colorants to satisfy the above-mentioned spectral characteristics.

When two or more color colorants are included as colorants for shielding visible light, the color colorants are selected from the group consisting of red colorants, green colorants, blue colorants, yellow colorants, purple colorants, and orange colorants. Agent is preferred.

As a combination of color coloring agents when a coloring agent shielding visible light is formed from a combination of two or more color coloring agents, for example, the following may be mentioned. (1) Contains yellow colorant, blue colorant, purple colorant and red colorant. (2) Contains yellow colorant, blue colorant and red colorant (3) Containing yellow coloring agent, purple coloring agent and red coloring agent (4) Contains yellow colorant and purple colorant (5) Contains green colorant, blue colorant, purple colorant and red colorant (6) Containing purple coloring agent and orange coloring agent (7) Containing green coloring agent, purple coloring agent and red coloring agent (8) Containing green colorant and red colorant

As a specific example of the aspect of the above (1), CI pigment yellow (Pigment Yellow) 139 or 185 as a yellow pigment, CI Pigment Blue (Pigment Blue) 15:6 as a blue pigment, and a purple pigment CI Pigment Violet 23 and CI Pigment Red 254 or 224 as the red pigment. As a specific example of the aspect of the above (2), CI pigment yellow (Pigment Yellow) 139 or 185 as a yellow pigment, CI Pigment Blue 15:6 as a blue pigment, and a red pigment CI Pigment Red (Pigment Red) 254 or 224. As a specific example of the aspect of (3) above, CI pigments containing CI Pigment Yellow 139 or 185 as a yellow pigment, CI Pigment Violet 23 as a purple pigment, and CI pigment as a red pigment Red (Pigment Red) 254 or 224 appearance. As a specific example of the aspect of (4) above, an aspect containing C.I. Pigment Yellow (Pigment Yellow) 139 or 185 as a yellow pigment and C.I. Pigment Violet 23 as a purple pigment can be mentioned. As a specific example of the aspect of the above (5), CI Pigment Green 7 or 36 as a green pigment, CI Pigment Blue 15:6 as a blue pigment, and a purple pigment CI Pigment Violet 23 and CI Pigment Red 254 or 224 as the red pigment. As a specific example of the aspect of (6) above, an aspect containing C.I. Pigment Violet 23 as a purple pigment and C.I. Pigment Orange (Pigment Orange) 71 as an orange pigment can be cited. As specific examples of the above (7), CI Pigment Green 7 or 36 as a green pigment, CI Pigment Violet 23 as a purple pigment, and CI Pigment Red (Pigment Red) as a red pigment can be mentioned. Red) 254 or 224. As a specific example of the above (8), an aspect containing C.I. Pigment Green 7 or 36 as a green pigment and C.I. Pigment Red 254 or 224 as a red pigment can be mentioned.

As a ratio (mass ratio) of each coloring agent, the following can be mentioned, for example.

[Chemical formula 37] No. Yellow colorant Green colorant Blue colorant Purple colorant Red colorant Orange colorant 1 0.1~0.4 0.1~0.6 0.01~0.3 0.1~0.6 2 0.1~0.4 0.1~0.6 0.2~0.7 3 0.1~0.6 0.1~0.6 0.1~0.6 4 0.2~0.8 0.2~0.8 5 0.1~0.4 0.1~0.4 0.1~0.4 0.1~0.4 6 0.2~0.6 0.4~0.8 7 0.1~0.5 0.2~0.7 0.1~0.4 8 0.5~0.8 0.2~0.5

When the composition of the present disclosure contains a visible colorant, the content of the visible colorant is preferably 0.01% by mass to 50% by mass relative to the total solid content of the composition. The lower limit is more preferably 0.1% by mass or more, and more preferably 0.5% by mass or more. The upper limit is more preferably 30% by mass or less, and more preferably 15% by mass or less. In addition, the content of the visible colorant is preferably 10 parts by mass to 1,000 parts by mass, and more preferably 50 parts by mass to 800 parts by mass relative to 100 parts by mass of the content of the infrared-absorbing dye.

(Silane coupling agent) The composition of the present disclosure can contain a silane coupling agent. In this disclosure, the silane coupling agent refers to a silane compound having a hydrolyzable group and other functional groups. In addition, the hydrolyzable group refers to a substituent that is directly connected to a silicon atom and can generate a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, and an acyloxy group, and an alkoxy group is preferred. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. In addition, functional groups other than the hydrolyzable group are preferably groups that interact with resins or form bonds to show affinity. For example, vinyl groups, styryl groups, (meth)acrylic groups, mercapto groups, epoxy groups, oxetanyl groups, amino groups, ureido groups, thioether groups, isocyanate groups, etc. can be mentioned, (methyl) Acrylic and epoxy groups are preferred. Examples of the silane coupling agent include the compounds described in paragraphs 0018 to 0036 of JP 2009-288703, the compounds described in paragraphs 0056 to 0066 of JP 2009-242604, and International Publication No. 2015 The contents of the compounds described in paragraphs 0229 to 0236 of No. /166779 are incorporated in this specification.

The content of the silane coupling agent relative to the total solid content of the composition is preferably 0.01% by mass to 15.0% by mass, and more preferably 0.05% by mass to 10.0% by mass. The silane coupling agent may be only one type or two or more types. When two or more types are used, the total amount is preferably in the above range.

(Interface active agent) From the viewpoint of further improving coating properties, the composition of the present disclosure may contain a surfactant. As the surfactant, various surfactants such as fluorine surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone surfactants can be used. Surfactants can refer to paragraphs 0238 to 0245 of International Publication No. 2015/166779, the contents of which are incorporated in this specification.

By containing the fluorine-based surfactant in the composition of the present disclosure, the solution properties (especially fluidity) when preparing the coating liquid are further improved, and the uniformity of the coating thickness or the liquid-saving property can be further improved. In addition, it is possible to more preferably form a uniform thickness film with less thickness unevenness.

The fluorine atom content in the fluorine-based surfactant is preferably 3% by mass to 40% by mass, more preferably 5% by mass to 30% by mass, and particularly preferably 7% by mass to 25% by mass. From the viewpoint of uniformity of the thickness of the coating film and liquid-saving properties, a fluorine-based surfactant having a fluorine content within this range is effective and has good solubility in the composition.

Specific examples of the fluorine-based surfactant include the interfacial activity described in paragraphs 0060 to 0064 of JP 2014-041318 (corresponding to paragraphs 0060 to 0064 of International Publication No. 2014/017669). The surfactant, the surfactant described in paragraphs 0117 to 0132 of JP 2011-132503 A, the contents of which are incorporated in this specification. Commercial products of fluorine-based surfactants include, for example, MEGAFACE F171, F172, F173, F176, F177, F141, F142, F143, F144, R30, F437, F475, F479, F482, F554, F780 (the above are DIC Corporation), Fluorad FC430, FC431, FC171 (the above are manufactured by Sumitomo 3M Limited), Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC -383, S-393, KH-40 (the above are manufactured by ASAHI GLASS CO., LTD.), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (the above are manufactured by OMNOVA Solutions Inc.), etc.

In addition, fluorine-based surfactants can also preferably use acrylic compounds. The acrylic compound has a molecular structure with a functional group containing a fluorine atom, and when heat is applied, the part of the functional group containing the fluorine atom is cut and the fluorine The atom volatilizes. As such fluorine-based surfactants, MEGAFACE DS series manufactured by DIC Corporation (Chemical Industry Daily, February 22, 2016) (Nikkei Sangyo Shimbun, February 23, 2016), such as MEGAFACE DS-21 .

Block polymers can also be used for fluorine-based surfactants. For example, the compounds described in JP 2011-089090 A can be cited. Fluorine-based surfactants can also preferably use fluorine-containing polymer compounds, which contain repeating units derived from (meth)acrylate compounds having fluorine atoms and those derived from having 2 or more (preferably 5 One or more) repeating units of (meth)acrylate compounds of alkoxyl groups (preferably ethyleneoxy or propyleneoxy). The weight average molecular weight of the block polymer is preferably 3,000 to 50,000.

In addition, as the fluorine-based surfactant, a fluorine-containing polymer having an ethylenically unsaturated group on the side chain can also be used. As a specific example, the compounds described in paragraphs 0050 to 0090 and paragraphs 0289 to 0295 of JP 2010-164965 A can be cited, for example MEGAFACE RS-101, RS-102, RS-718K, RS manufactured by DIC Corporation -72-K etc. The fluorine-based surfactant can also use the compounds described in paragraphs 0015 to 0158 of JP 2015-117327 A.

Examples of nonionic surfactants include glycerin, trimethylolpropane, trimethylolethane, and these ethoxylates and propoxylates (for example, glycerol propoxylate, glycerol ethoxylate). Base compounds, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene nonyl phenyl ether, polyethylene glycol two Laurate, polyethylene glycol distearate, sorbitan fatty acid ester, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (manufactured by BASF), Tetronic 304, 701, 704, 901 , 904, 150R1 (manufactured by BASF Corporation), Solsperse 20000 (manufactured by Lubrizol Japan Limited.), NCW-101, NCW-1001, NCW-1002 (manufactured by Wako Pure Chemical Industries, Ltd.), PIONIN D-6112, D-6112 -W, D-6315 (manufactured by Takemoto Oil & Fat Co., Ltd.), Olfine E1010, Surfynol 104, 400, 440 (manufactured by Nissin Chemical Co., Ltd.), etc.

The content of the surfactant relative to the total solid content of the composition is preferably 0.001% to 5.0% by mass, and more preferably 0.005 to 3.0% by mass. The surfactant may be only one type or two or more types. In the case of two or more types, the total amount is preferably in the above range.

(Ultraviolet absorber) The composition of the present disclosure preferably contains an ultraviolet absorber. Examples of the ultraviolet absorber include conjugated diene compounds and diketone compounds, and conjugated diene compounds are preferred. The conjugated diene compound is more preferably a compound represented by the following formula (UV-1).

[Chemical formula 38]

In the formula (UV-1), R ^U1 and R ^U2 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, or an aryl group having 6 to 20 carbon atoms. R ^U1 and R ^U2 may be the same or different. , But does not mean hydrogen atom at the same time. R ^U1 and R ^U2 can form a cyclic amino group together with the nitrogen atom to which R ^U1 and R ^U2 are bonded. Examples of the cyclic amino group include piperidinyl, morpholinyl, pyrrolidinyl, hexahydroazepinyl, piperidine and the like. Preferably, R ^U1 and R ^U2 are independently an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 10 carbon atoms, and even more preferably an alkyl group having 1 to 5 carbon atoms. R ^U3 and R ^U4 represent electron withdrawing groups. R ^U3 and R ^U4 are acyl, carbamethan, alkoxycarbonyl, aryloxycarbonyl, cyano, nitro, alkylsulfonyl, arylsulfonyl, sulfonyloxy or sulfamsulfonyl Group is preferred, acyl group, carbamethanyl group, alkoxycarbonyl group, aryloxycarbonyl group, cyano group, alkylsulfonyl group, arylsulfonyl group, sulfonyloxy group or sulfasulfonyl group is more preferable . In addition, R ^U3 and R ^U4 may be bonded to each other to form a cyclic electron withdrawing group. Examples of the cyclic electron withdrawing group formed by bonding R ^U3 and R ^{U4 to} each other include, for example, a 6-membered ring containing two carbonyl groups. At least one of R ^U1 , R ^U2 , R ^U3 and R ^U4 may be in the form of a polymer derived from a monomer bonded to a vinyl group via a linking group. It can also be a copolymer with other monomers.

For the description of the substituent of the ultraviolet absorber represented by the formula (UV-1), reference can be made to the description of paragraphs 0320 to 0327 of JP 2013-068814 A, and the content is incorporated in this specification. As a commercial item of the ultraviolet absorber represented by Formula (UV-1), UV503 (made by DAITO CHEMICAL CO., LTD.) etc. are mentioned, for example.

The diketone compound used as the ultraviolet absorber is preferably a compound represented by the following formula (UV-2).

[Chemical formula 39]

In formula (UV-2), R ¹⁰¹ and R ¹⁰² each independently represent a substituent, and m1 and m2 each independently represent an integer of 0-4. Substituents include alkyl, alkenyl, aryl, heteroaryl, alkoxy, aryloxy, heteroaryloxy, acyl, alkoxycarbonyl, aryloxycarbonyl, heteroaryloxycarbonyl, Amino groups, amino groups, amide groups, alkoxycarbonyl amine groups, aryloxycarbonyl amine groups, heteroaryloxycarbonyl amine groups, sulfonamide groups, sulfamsulfonyl groups, carbamate groups, alkyl sulfides Group, arylthio group, heteroarylthio group, alkylsulfinyl group, arylsulfinyl group, heteroarylsulfinyl group, alkylsulfinyl group, arylsulfinyl group, heteroarylsulfinyl group Groups, ureido groups, phosphoamido groups, mercapto groups, sulfo groups, carboxyl groups, nitro groups, hydroxamic acid groups, sulfinic acid groups, hydrazine groups, imino groups, silyl groups, hydroxyl groups, halogen atoms, cyano groups, etc., A group or an alkoxy group is preferred. The carbon number of the alkyl group is preferably 1-20. The alkyl group may be linear, branched, and cyclic, and linear or branched is preferred, and branched is more preferred. The carbon number of the alkoxy group is preferably 1-20. The alkoxy group may be linear, branched, and cyclic, and linear or branched is preferred, and branched is more preferred. A combination in which one of R ¹⁰¹ and R ¹⁰² is an alkyl group and the other is an alkoxy group is preferred. It is preferable that m1 and m2 are each independently an integer of 0-2, 0 or 1 is more preferable, and 1 is particularly preferable.

As the compound represented by the formula (UV-2), the following compounds can be mentioned.

[Chemical formula 40]

Uvinul A (manufactured by BASF Corporation) can also be used as the ultraviolet absorber. In addition, ultraviolet absorbers such as amino diene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, and trifluoromethane compounds can be used as ultraviolet absorbers. Specific examples include The compound described in JP 2013-068814 A. As the benzotriazole compound, the MYUA series manufactured by MIYOSHI OIL & FAT CO., LTD. (Chemical Industry Daily, February 1, 2016) can be used. The content of the ultraviolet absorber is preferably 0.01% by mass to 10% by mass, and more preferably 0.01% by mass to 5% by mass relative to the total solid content of the composition.

(Polymerization inhibitor) The composition of the present disclosure may contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tertiary butyl-p-cresol, pyrogallol, tertiary butylcatechol, benzoquinone, 4,4 '-Thiobis(3-methyl-6-tertiary butylphenol), 2,2'-methylene bis(4-methyl-6-tertiary butylphenol), N-nitrosobenzene Hydroxyamine salt (ammonium salt, cerium salt, etc.). Among them, p-methoxyphenol is preferred. In addition, polymerization inhibitors sometimes function as antioxidants. The content of the polymerization inhibitor is preferably 0.01% by mass to 5% by mass relative to the total solid content of the composition.

(Other ingredients) The composition of the present disclosure may contain sensitizers, crosslinking agents, hardening accelerators, fillers, thermal hardening accelerators, plasticizers, and other auxiliary agents (for example, conductive particles, fillers, defoamers, barriers, etc.) as required. Burning agent, leveling agent, peeling accelerator, antioxidant, fragrance, surface tension regulator, chain transfer agent, etc.). By appropriately containing these components, it is possible to adjust the stability of the intended filter such as an infrared cut filter, and properties such as film properties. For these components, reference can be made to, for example, the description of paragraph 0183 and later of JP 2012-003225 A (corresponding to paragraph 0237 of U.S. Patent Application Publication No. 2013/0034812), and paragraphs 0101 to of JP 2008-250074 A 0104 and 0107-0109, etc., and these contents are incorporated into this manual. As the antioxidant, for example, a phenol compound, a phosphorus compound (for example, the compound described in paragraph 0042 of JP 2011-090147 A), a thioether compound, and the like can be used. As commercially available products, for example, Adekastab series manufactured by ADEKA CORPORATION (AO-20, AO-30, AO-40, AO-50, AO-50F, AO-60, AO-60G, AO-80, AO- 330 etc.). The content of the antioxidant relative to the total solid content of the composition is preferably 0.01% by mass to 20% by mass, and more preferably 0.3% by mass to 15% by mass. The antioxidant may be only one type or two or more types. When two or more types are used, the total amount is preferably in the above range.

(Preparation of composition) The composition of the present disclosure can be prepared by mixing the above-mentioned components. Furthermore, it is better to filter with a filter for the purpose of removing foreign matter or reducing defects. As the filter, as long as it has been used for filtration purposes, etc., it can be used without particular limitation. For example, the use of fluororesins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (for example, nylon-6, nylon-6, 6), and polyolefin resins such as polyethylene and polypropylene (PP) ( Including high-density, ultra-high molecular weight) filters. Among these materials, polypropylene (including high-density polypropylene) or nylon is preferred. The pore size of the filter is preferably 0.01 μm to 7.0 μm, more preferably 0.01 μm to 3.0 μm, and even more preferably 0.05 μm to 0.5 μm. By setting it in this range, it is possible to reliably remove fine foreign matter that hinders the preparation of a uniform and smooth composition in the subsequent process. It is also preferable to use a fibrous filter material. Examples of the filter material include polypropylene fiber, nylon fiber, glass fiber, etc. Specifically, the SBP type series manufactured by ROKI TECHNO CO., LTD. (SBP008 Etc.), TPR series (TPR002, TPR005, etc.), SHPX series (SHPX003, etc.) filter elements. When using filters, you can combine different filters. At this time, the filtration with the first filter may be performed only once, or it may be performed more than twice. In addition, it is also possible to combine first filters having different pore diameters within the above-mentioned range. The pore size at this time can refer to the nominal value of the filter manufacturer. As a commercially available filter, for example, it can be selected from various filters provided by NIHON PALL LTD. (DFA4201NIEY etc.), Advantec Toyo Kaisha, Ltd., Japan Entegris Inc., or KITZ MICRO FILTER Corporation.

(Use of composition) The composition of the present disclosure can be made into a liquid state, and therefore, for example, a film can be easily manufactured by applying the composition of the present disclosure to a substrate or the like and drying it. When the film is formed by coating, from the viewpoint of coating properties, the viscosity of the composition of the present disclosure is preferably 1 mPa·s to 100 mPa·s. The lower limit is more preferably 2 mPa·s or more, and more preferably 3 mPa·s or more. The upper limit is more preferably 50 mPa·s or less, more preferably 30 mPa·s or less, and particularly preferably 15 mPa·s or less. The total solid content of the composition of the present disclosure is changed according to the coating method, and for example, it is preferably 1% by mass to 50% by mass. The lower limit is more preferably 10% by mass or more. The upper limit is more preferably 30% by mass or less.

The use of the composition of the present disclosure is not particularly limited. For example, it can be preferably used to form an infrared cut filter. For example, it can be preferably used for infrared cut filters on the light-receiving side of solid-state imaging devices (for example, infrared cut filters for wafer-level lenses, etc.), and the back side of solid-state imaging devices (the side opposite to the light-receiving side) The infrared cut filter, etc. In particular, it can be suitably used as an infrared cut filter on the light receiving side of a solid-state image sensor. In addition, by further including a coloring agent that blocks visible light in the composition of the present disclosure, it is also possible to form an infrared transmission filter capable of transmitting only infrared rays having a specific wavelength or more. For example, it is also possible to form an infrared transmission filter that shields to a wavelength of 400 nm to 900 nm and can transmit infrared rays having a wavelength of 900 nm or more.

Furthermore, it is preferable to store the composition of the present disclosure in a container. As a storage container, for the purpose of preventing impurities from mixing into the raw materials or the composition, it is also preferable to use a multi-layer bottle made of 6 kinds of 6-layer resins to form the inner wall of the container or a 7-layer structure bottle made of 6 kinds of resins. Examples of these containers include those described in JP 2015-123351 A.

＜Membrane＞ The film of the present disclosure is composed of the composition of the present disclosure or a film formed by curing the aforementioned composition. In addition, when the composition contains a solvent, it may be dried. The film of the present disclosure can be preferably used as an infrared cut filter. Moreover, it can also be used as a heat-ray shielding filter or an infrared transmission filter. The film of the present disclosure may be laminated on a support and used, or it may be peeled off from the support and used. The film of the present disclosure may have a pattern or a film without a pattern (flat film). The "drying" in the present disclosure only needs to remove at least a part of the solvent, and it is not necessary to completely remove the solvent, and the removal amount of the solvent can be set as needed. In addition, the above-mentioned curing only needs to increase the hardness of the film, but curing by polymerization is preferable.

The thickness of the film of this disclosure can be appropriately adjusted according to the purpose. The thickness of the film is preferably 20 μm or less, more preferably 10 μm or less, and even more preferably 5 μm or less. The lower limit of the thickness of the film is preferably 0.1 μm or more, more preferably 0.2 μm or more, and more preferably 0.3 μm or more.

The film of the present disclosure preferably has a maximum absorption wavelength in the wavelength range of 650 nm to 1,500 nm, more preferably has a maximum absorption wavelength in the wavelength range of 680 nm to 1,300 nm, and has a maximum absorption wavelength in the wavelength range of 700 nm to 1,100 nm. Better.

When the film of the present disclosure is used as an infrared cut filter, it is preferable that the film of the present disclosure satisfies at least one of the following conditions (1) to (4), and satisfies all the conditions (1) to (4) as further Better. (1) The transmittance at a wavelength of 400 nm is preferably 70% or more, more preferably 80% or more, more preferably 85% or more, and particularly preferably 90% or more. (2) The transmittance at a wavelength of 500 nm is preferably 70% or more, more preferably 80% or more, more preferably 90% or more, and particularly preferably 95% or more. (3) The transmittance at a wavelength of 600 nm is preferably 70% or more, more preferably 80% or more, more preferably 90% or more, and particularly preferably 95% or more. (4) The transmittance at a wavelength of 650 nm is preferably 70% or more, more preferably 80% or more, more preferably 90% or more, and particularly preferably 95% or more.

The film of the present disclosure can also be used in combination with color filters containing color colorants. The color filter can be manufactured by containing a coloring agent. As the color colorant, the color colorant described in the composition column of the present disclosure can be cited. The coloring composition can further contain resin, polymerizable compound, polymerization initiator, surfactant, solvent, polymerization inhibitor, ultraviolet absorber, and the like. Regarding these details, the aforementioned materials can be cited, and these can be used.

When the film of the present disclosure and the color filter are used in combination, it is better to arrange the color filter on the optical path of the film of the present disclosure. For example, the film and the color filter of this disclosure can be laminated and used as a laminated body. In the laminate, the film and the color filter of the present disclosure may or may not be adjacent in the thickness direction. When the film of the present disclosure and the color filter are not adjacent in the thickness direction, the film of the present disclosure can be formed on another support body different from the support on which the color filter is formed, or the film of the present disclosure Between the color filter, there are other components (for example, microlens, planarization layer, etc.) constituting the solid-state imaging element.

In addition, in the present disclosure, the infrared cut filter refers to a filter that transmits light with a wavelength in the visible region (visible light) and shields at least a part of light with a wavelength in the near-infrared region (infrared). The infrared cut filter may transmit all light of wavelengths in the visible region, or may transmit light of a specific wavelength region among the wavelengths of the visible region and block light of a specific wavelength region. In addition, in the present disclosure, a color filter refers to a filter that passes light of a specific wavelength region among wavelengths in the visible region and shields light of a specific wavelength region. In addition, in the present disclosure, the infrared transmission filter refers to a filter that blocks visible light and transmits at least a part of infrared rays.

The film of the present disclosure can be used in various devices such as solid-state imaging devices such as CCD (charge coupled device) or CMOS (complementary metal oxide film semiconductor), infrared sensors, and image display devices.

＜Method of manufacturing film＞ Next, the manufacturing method of the film of this indication is demonstrated. The film of the present disclosure can be manufactured through the process of coating the composition of the present disclosure.

In the method of manufacturing the film of the present disclosure, it is preferable to coat the composition on the support. As the support, for example, a substrate made of materials such as silicon, alkali-free glass, soda glass, Pyrex (registered trademark) glass, and quartz glass can be cited. Organic films, inorganic films, etc. may be formed on these substrates. Examples of the material of the organic film include the above-mentioned resins. In addition, as the support, a substrate made of the above-mentioned resin can also be used. In addition, a charge coupled device (CCD), a complementary metal oxide film semiconductor (CMOS), a transparent conductive film, etc. may be formed on the support. In addition, a black matrix that isolates each pixel is sometimes formed on the support. In addition, if necessary, an undercoat layer may be provided on the support for improving adhesion with the upper layer, preventing diffusion of substances, or flattening the surface of the substrate. Moreover, when using a glass substrate as a support body, it is preferable to use it after forming an inorganic film on a glass substrate or subjecting a glass substrate to a dealkalization process. According to this aspect, it is easy to produce a film in which the generation of foreign substances is further suppressed.

As the coating method of the composition, a known method can be used. For example, the drop method (drop casting); slit coating method; spray method; roll coating method; spin coating method (spin coating method); cast coating method; slit spin coating method; pre-wet method (For example, the method described in Japanese Patent Application Laid-Open No. 2009-145395); inkjet (for example, on-demand, piezoelectric, thermal), nozzle jet and other jet printing, flexographic printing, screen printing, gravure Various printing methods such as printing, reverse offset printing, metal mask printing, etc.; transfer printing using molds, etc.; nanoimprinting, etc. The application method based on inkjet is not particularly limited. For example, "Inkjet that can be promoted and used-the infinite possibilities seen in the patent-issued in February 2005, SB RESEARCH CO., LTD." The method shown (especially pages 115 to 133), or Japanese Patent Application Publication No. 2003-262716, Japanese Patent Application Publication No. 2003-185831, Japanese Patent Application Publication No. 2003-261827, Japanese Patent Application Publication No. 2012-126830 The method described in the gazette, JP 2006-169325, etc.

The composition layer formed by coating the composition can be dried (pre-baked). When the pattern is formed by a low-temperature process, pre-baking may not be performed. When pre-baking is performed, the pre-baking temperature is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower. The lower limit is preferably 50°C or higher, and more preferably 80°C or higher. By performing the pre-baking temperature below 150°C, for example, when the photoelectric conversion film of the image sensor is made of organic materials, these characteristics can be maintained more effectively. The pre-baking time is preferably 10 seconds to 3,000 seconds, more preferably 40 seconds to 2,500 seconds, and more preferably 80 seconds to 220 seconds. Drying can be performed with a hot plate, oven, etc.

The manufacturing method of the film of the present disclosure may further include a patterning process. As the pattern formation method, a pattern formation method using a photolithography method or a pattern formation method using a dry etching method can be cited. In addition, when the film of the present disclosure is used as a flat film, the pattern forming process may not be performed. Hereinafter, the process of forming the pattern will be described in detail.

-The use of photolithography to form patterns- The pattern forming method using photolithography method preferably includes the following processes: a process of exposing the composition layer formed by coating the composition of the present disclosure in a pattern (exposure process); and developing and removing the unexposed part. The process of forming patterns by layering (development process). According to needs, the process of baking the developed pattern (post-baking process) and the process of re-exposing (post-exposure process) can be set. Hereinafter, each process will be described.

<<Exposure Process>> In the exposure process, the composition layer is exposed into a pattern. For example, by using an exposure device such as a stepper to expose the composition layer through a mask having a predetermined mask pattern, the composition layer can be pattern-exposed. Thereby, the exposed part can be hardened. As the radiation (light) that can be used for exposure, ultraviolet rays such as g-rays and i-rays are preferred, and i-rays are more preferred. Irradiation amount (exposure amount) based e.g. ^{0.03J / cm 2 ~ 2.5J / cm} 2 is ^{preferred, 0.05J / cm 2 ~ 1.0J /} cm 2 is more ^{preferred, 0.08J / cm 2 ~ 0.5J /} cm 2 of Especially good. Regarding the oxygen concentration during exposure, it can be appropriately selected. In addition to exposure under the atmosphere, for example, it can be in a low-oxygen environment with an oxygen concentration of 19% by volume or less (for example, 15% by volume, 5% by volume, substantially oxygen-free ) Exposure can also be carried out in a high oxygen environment with an oxygen concentration exceeding 21% by volume (for example, 22% by volume, 30% by volume, 50% by volume). Further, the exposure illuminance can be appropriately set so as to be preferably from ^{1,000W / m 2 ~ 100,000W m 2} ( ^{e.g., 5,000W / m 2, 15,000W /} m 2, 35,000W / m 2) range selection /. The oxygen concentration and the exposure illuminance can be appropriately combined with conditions. For example, the oxygen concentration can be 10% by volume and the illuminance is 10,000 W/m ² , the oxygen concentration is 35% by volume and the illuminance is 20,000 W/m ² .

＜＜Development process＞＞ Next, the composition layer in the unexposed part of the exposed composition layer is removed by development to form a pattern. The development and removal of the composition layer of the unexposed part can be performed using a developer. Thereby, the composition layer of the unexposed part in the exposure step is dissolved in the developing solution, and only the photo-hardened part remains on the support. As the developer, an alkali developer that does not damage the solid-state imaging element or circuit of the substrate or the like is preferable. The temperature of the developer is preferably 20°C to 30°C, for example. The development time is preferably 20 seconds to 180 seconds. In addition, in order to improve the residue removal, the process of throwing off the developer every 60 seconds can be repeated several times to supply new developer.

As the alkali agent used in the developer, for example, ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine (diglycolamine), diethanolamine, hydroxylamine, ethylenediamine, tetramethyl hydroxide Ammonium, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, Organic basic compounds such as pyrrole, piperidine, 1,8-diazabicyclo[5.4.0]-7-undecene, or sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate , Inorganic alkaline compounds such as sodium metasilicate. The developer can preferably use an alkaline aqueous solution obtained by diluting the alkaline agent in pure water. The concentration of the alkali agent in the alkaline aqueous solution is preferably 0.001% by mass to 10% by mass, and more preferably 0.01% by mass to 1% by mass. In addition, a surfactant can be used in the developer. As an example of the surfactant, the surfactant described in the above composition can be cited, and a nonionic surfactant is preferred. From the viewpoint of convenient transportation or storage, the developer can be temporarily made into a concentrated solution and diluted to the required concentration during use. The dilution ratio is not particularly limited, and can be set in the range of 1.5 times to 100 times, for example. In addition, when using a developer containing such an alkaline aqueous solution, it is better to wash (rinse) with pure water after development.

After development, heat treatment (post-baking) can also be performed after drying. Post-baking is a heat treatment after development for curing the film completely. When post-baking is performed, the post-baking temperature is preferably 100°C to 240°C. From the viewpoint of film curing, 200°C to 230°C is more preferable. In addition, when organic electroluminescence (organic EL) elements are used as the light source or the photoelectric conversion film of the image sensor is composed of organic materials, the post-baking temperature is preferably 150°C or less, and more preferably 120°C or less , 100°C or lower is more preferred, and 90°C or lower is particularly preferred. The lower limit can be 50°C or higher, for example. Regarding post-baking, the developed film can be continuously or intermittently performed using a heating mechanism such as a hot plate, a convection oven (hot-air circulating dryer), or a high-frequency heater so as to meet the above-mentioned conditions. Moreover, when the pattern is formed by a low-temperature process, post-baking may not be performed, and a re-exposure process (post-exposure process) may be added.

-Using dry etching method to form pattern- The pattern formation by dry etching can be performed by a method such as: curing the composition layer formed by coating the composition on the support to form a cured layer, and then forming a cured layer on the cured layer Then, the patterned photoresist layer is used as a mask, and the hardened layer is dry-etched using an etching gas. When forming the photoresist layer, it is better to further perform a pre-baking process. In particular, as the formation procedure of the photoresist layer, a form in which heat treatment after exposure and heat treatment after development (post-baking treatment) are carried out is preferable. Regarding the pattern formation by the dry etching method, refer to the description of paragraphs 0010 to 0067 of JP 2013-064993 A, the content of which is incorporated in this specification.

＜Filter and laminate＞ The optical filter of this disclosure has the film of this disclosure. The filter of the present disclosure can be preferably used as at least one filter selected from the group consisting of an infrared cut filter and an infrared transmission filter, and can be more preferably used as an infrared cut filter. In addition, the aspect having the film of the present disclosure and the pixels selected from the group including red, green, blue, magenta, yellow, cyan, black, and colorless are also preferred aspects of the filter of the present disclosure . In addition, the laminate system of the present disclosure has a laminate of the film of the present disclosure and a color filter containing a color colorant.

The infrared cut filter of this disclosure has the film of this disclosure. In addition, the infrared cut filter of the present disclosure may be a filter that cuts only a part of the wavelength of the infrared region, or may be a filter that cuts off the entire infrared region. As an infrared filter which cuts only a part of the wavelength in the infrared region, for example, a near infrared cut filter can be cited. In addition, examples of near-infrared rays include infrared rays with a wavelength of 750 nm to 2,500 nm. In addition, the infrared cut filter of the present disclosure is preferably a filter with a cut-off wavelength in the range of 750nm to 1,000nm, and a filter with a cutoff wavelength in the range of 750nm to 1,200nm is more preferable, with a cut-off wavelength of 750nm to 1,500nm The infrared filter is further preferred. The infrared cut filter of the present disclosure may further have a layer containing copper, a dielectric multilayer film, an ultraviolet absorbing layer, etc., in addition to the above-mentioned film. When the infrared cut filter of the present disclosure further has at least a copper-containing layer or a dielectric multilayer film, an infrared cut filter having a wide viewing angle and excellent infrared shielding properties can be easily obtained. In addition, the near-infrared cut filter of the present disclosure further has an ultraviolet absorbing layer, and an infrared cut filter with excellent ultraviolet shielding properties can be obtained. As the ultraviolet absorbing layer, for example, the absorbing layer described in paragraphs 0040 to 0070 and 0119 to 0145 of International Publication No. 2015/099060 can be referred to, the contents of which are incorporated in this specification. As the dielectric multilayer film, reference can be made to the description of paragraphs 0255 to 0259 of JP 2014-041318 A, and the content is incorporated in this specification. As the copper-containing layer, a glass substrate (copper-containing glass substrate) composed of copper-containing glass, or a copper complex-containing layer (copper complex-containing layer) can also be used. Examples of copper-containing glass substrates include copper-containing phosphate glass and copper-containing fluorophosphate glass. Commercial products of glass containing copper include NF-50 (manufactured by AGC TECHNO GLASS Co., Ltd.), BG-60, BG-61 (manufactured by Schott Corporation above), CD5000 (manufactured by HOYA CORPORATION), etc. .

The infrared dielectric filter of the present disclosure can be used in various devices such as solid-state imaging devices such as CCD (charge coupled device) or CMOS (complementary metal oxide film semiconductor), infrared sensors, and image display devices.

The infrared cut filter of the present disclosure has pixels (patterns) of the film obtained by using the composition of the present disclosure and at least 1 selected from the group consisting of red, green, blue, magenta, yellow, cyan, black, and colorless The aspect of this pixel (pattern) is also a better aspect.

The method for manufacturing the optical filter of the present disclosure is not particularly limited, but includes a process of applying the composition of the present disclosure to a support to form a composition layer, a process of exposing the composition layer into a pattern, and developing removal A method of forming a pattern on an unexposed part; or including a process of applying the composition of the present disclosure to a support to form a composition layer and hardening to form a layer, a process of forming a photoresist layer on the above layer, or The process of patterning the photoresist layer by exposure and development to obtain the photoresist pattern and the process of dry etching the layer using the photoresist pattern as an etching mask are preferred. As each process in the manufacturing method of the optical filter of the present disclosure, refer to each process in the film manufacturing method of the present disclosure.

＜Solid-state imaging device＞ The solid-state imaging device of the present disclosure has the film of the present disclosure. The structure of the solid-state imaging device is not particularly limited as long as it has the film of the present disclosure and functions as a solid-state imaging device. For example, the following structure can be mentioned.

The structure is as follows: on the support, there are a plurality of photodiodes constituting the light-receiving area of the solid-state imaging element, and transmission electrodes including polysilicon, etc., and the photodiodes and transmission electrodes have light-receiving part openings containing only the photodiodes. A light-shielding film of tungsten, etc., has an element protection film formed to cover the entire surface of the light-shielding film and the light-receiving portion of the photodiode and includes silicon nitride and the like on the light-shielding film, and the element protection film has the film of this disclosure. In addition, it can also be a configuration with a light-concentrating mechanism (for example, microlens, etc.) on the lower side of the film of the present disclosure (the side close to the support) on the element protection film, or on the film of the present disclosure It has the structure of concentrating mechanism, etc. In addition, the color filter used in the solid-state imaging device may have a structure in which a film forming each pixel is buried in a space partitioned by a partition wall in a lattice shape, for example. At this time, the refractive index of the partition wall is preferably lower than the refractive index of each pixel. As an example of an imaging device having such a structure, there can be mentioned devices described in Japanese Patent Application Publication No. 2012-227478 and Japanese Patent Application Publication No. 2014-179577.

＜Image display device＞ The image display device of the present disclosure has the film of the present disclosure. Examples of the image display device include a liquid crystal display device, an organic electroluminescence (organic EL) display device, and the like. The definition or details of the image display device are described in, for example, "Electronic Display Elements (by Akio Sasaki, Kogyo Chosakai Publishing Co., Ltd., published in 1990)", "Display Elements (by Ibuki Junsho, Sangyo Tosho Publishing) Co., Ltd., issued in 1989)” etc. In addition, the liquid crystal display device is described in, for example, "Next Generation Liquid Crystal Display Technology (Edited by Tatsuo Uchida, published by Kogyo Chosakai Publishing Co., Ltd., 1994)". The liquid crystal display device that can be applied to the present disclosure is not particularly limited. For example, it can be applied to various types of liquid crystal display devices described in the above-mentioned "Next Generation Liquid Crystal Display Technology". The image display device may have a white organic EL element. As a white organic EL element, a tandem structure is preferable. The tandem structure of organic EL elements is described in Japanese Patent Application Publication No. 2003-045676, Supervised by Akoyoshi Mikami, "The Frontline of Organic EL Technology Development-High Brightness, High Accuracy, Long Life, Skills Collection -", Technical Information Institute Co., Ltd., pages 326 to 328, 2008, etc. The spectrum of the white light emitted by the organic EL element is preferably the one with strong and extremely large luminous peaks in the blue region (430nm-485nm), green region (530nm-580nm) and yellow region (580nm-620nm). In addition to these luminescence peaks, it is better to have a very large luminescence peak in the red region (650nm-700nm).

＜Infrared sensor＞ The infrared sensor of this disclosure has the film of this disclosure. The structure of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. Hereinafter, an embodiment of the infrared sensor of the present disclosure will be described using drawings.

In FIG. 1, reference numeral 110 is a solid-state imaging device. The imaging area provided on the solid-state imaging element 110 has an infrared cut filter 111 and an infrared transmission filter 114. In addition, a color filter 112 is laminated on the infrared cut filter 111. A microlens 115 is arranged on the incident light hν side of the color filter 112 and the infrared transmission filter 114. A planarization layer 116 is formed to cover the microlens 115.

The infrared cut filter 111 can be formed using the composition of the present disclosure. The spectral characteristics of the infrared cut filter 111 are selected according to the emission wavelength of the infrared light-emitting diode (infrared LED) used.

The color filter 112 is a color filter formed with pixels that transmit and absorb light of a specific wavelength in the visible region, and is not particularly limited, and conventionally known color filters for pixel formation can be used. For example, a color filter formed with pixels of red (R), green (G), and blue (B) can be used. For example, refer to the description of paragraphs 0214 to 0263 of JP 2014-043556 A, the content of which is incorporated in this specification.

The infrared transmission filter 114 selects its characteristics according to the emission wavelength of the infrared LED used. For example, when the emission wavelength of the infrared LED is 850nm, the transmittance of the infrared transmission filter 114 in the thickness direction of the film is preferably 30% or less, and 20% or less is the maximum value in the wavelength range of 400nm～650nm. More preferably, 10% or less is more preferable, and 0.1% or less is particularly preferable. The transmittance preferably satisfies the above-mentioned conditions in the entire wavelength range of 400 nm to 650 nm.

The light transmittance of the infrared transmission filter 114 in the thickness direction of the film is at least 70% in the wavelength range of 800 nm or more (preferably 800 nm to 1,300 nm), and more preferably 80% or more, 90 % Or more is more preferable. The above-mentioned transmittance preferably satisfies the above-mentioned condition in a part of the wavelength range of 800 nm or more, and it is more preferable to satisfy the above-mentioned condition at a wavelength corresponding to the emission wavelength of the infrared LED.

The film thickness of the infrared transmission filter 114 is preferably 100 μm or less, more preferably 15 μm or less, more preferably 5 μm or less, and particularly preferably 1 μm or less. The lower limit is preferably 0.1 μm. If the film thickness is in the above range, the above-mentioned spectral characteristics can be satisfied. The methods of measuring the spectral characteristics, film thickness, and the like of the infrared transmission filter 114 are shown below. A stylus-type surface profile measuring device (DEKTAK150 manufactured by ULVAC) was used to measure the film thickness of the dried substrate with the film. The spectroscopic properties of the film are obtained by measuring the transmittance using an ultraviolet-visible-near-infrared spectrophotometer (U-4100 manufactured by Hitachi High-Technologies Corporation) in the wavelength range of 300nm to 1,300nm.

Also, for example, when the emission wavelength of the infrared LED is 940nm, the transmittance of the infrared transmission filter 114 in the thickness direction of the film is 20% or less at the maximum value in the range of wavelength 450nm to 650nm, and the thickness of the film The transmittance of light with a wavelength of 835 nm in the direction is 20% or less, and the transmittance of light in the thickness direction of the film is preferably at least 70% in the range of 1,000 nm to 1,300 nm in wavelength.

In the infrared sensor shown in FIG. 1, another infrared cut filter (other infrared cut filter) different from the infrared cut filter 111 may be further disposed on the planarization layer 116. Examples of other infrared cut filters include those having at least a copper-containing layer or a dielectric multilayer film. As for the details of these, the above can be cited. In addition, as another infrared cut filter, a dual band pass filter can be used. In addition, the absorption wavelengths of the infrared transmission filter and the infrared cut filter used in the present disclosure can be appropriately used in combination according to the light source used and the like.

(Camera module) The camera module of the present disclosure has a solid-state imaging element and the infrared cut filter of the present disclosure. In addition, it is preferable that the camera module of the present disclosure further has a lens and a circuit for processing imaging obtained by the solid-state imaging device. The solid-state imaging device used in the camera module of the present disclosure may be the above-mentioned solid-state imaging device of the present disclosure, or may be a well-known solid-state imaging device. In addition, as the lens used in the camera module of the present disclosure and the circuit for processing imaging obtained by the solid-state imaging element described above, known ones can be used. As an example of a camera module, refer to the camera module described in Japanese Patent Application Publication No. 2016-006476 or Japanese Patent Application Publication No. 2014-197190, and these contents are incorporated in this manual.

(Compound) The compound of the present disclosure is a compound having a partial structure represented by the above formula (1) and a dye structure. From the viewpoint of light resistance, heat resistance, and solvent resistance, the compound represented by the following formula (3) is preferred . The compound of the present disclosure can be preferably used as an infrared absorbing dye.

[Chemical formula 41]

In formula (3), Y ¹ and Y ² each independently represent a hydrogen atom or a substituent, A ¹ and A ² each independently represent a substituent, B ¹ and B ² each independently represent a hydrogen atom or a substituent, X ⁶ ~X ¹³ each independently represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryl group or a heteroaryl group, at least one of X ⁶ to X ⁹ is a heteroaryl group, and at least one of X ¹⁰ to X ¹³ One is heteroaryl.

Among the compounds of the present disclosure, the meaning of the compound having the partial structure represented by the formula (1) and the pigment structure and the compound represented by the formula (3) are the same as those having the part represented by the above formula (1) in the composition of the present disclosure The structure and the compound of the pigment structure and the compound represented by formula (3) are respectively the same, and the preferred aspects are also the same.

The method for producing the compound of the present disclosure is not particularly limited, and it can be appropriately produced with reference to a known production method. For example, a method of manufacturing by reacting a heteroaryl-bonded quinoline compound and a diketopyrrolopyrrole compound using phosphorus oxychloride or the like can be preferably mentioned.

(Dispersed composition) The dispersion composition of the present disclosure includes: a compound having a partial structure and a pigment structure represented by the following formula (1); and at least one compound selected from the group consisting of a solvent, a binder, and a hardening compound.

[Chemical formula 42]

In formula (1), X ¹ to X ⁴ each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryl group, or a heteroaryl group, and at least one of X ¹ to X ⁴ is a heteroaryl group, Z ¹ represents N or N ⁺ -R ^N , R ^N represents a hydrogen atom, an alkyl group or an aryl group, and * represents a bonding position to a structure having a pigment structure.

The meaning of the compound, solvent, binder, and curable compound having the partial structure and pigment structure represented by the above formula (1) in the dispersion composition of the present disclosure is the same as that of the above formula (1) in the composition of the present disclosure. The compound, solvent, adhesive and hardening compound of the partial structure and pigment structure represented by) are the same respectively, and the preferred aspects are also the same. In addition, with regard to components other than the above, the above-mentioned components can also be preferably included in the composition of the present disclosure.

When the compound having the partial structure represented by the above formula (1) is a pigment, from the viewpoint of dispersibility and dispersion stability, the dispersion composition of the present disclosure preferably contains a dispersant. In addition, when the compound having the partial structure represented by the above formula (1) is a pigment, from the viewpoint of dispersibility and dispersion stability, it is preferable that the dispersion composition of the present disclosure includes a pigment derivative, including a pigment derivative For better. The meaning of the dispersant and the pigment derivative in the dispersion composition of the present disclosure is the same as the above-mentioned dispersant and the pigment derivative in the composition of the present disclosure, and the preferred aspects are also the same. [Example]

Examples are given below to further specifically illustrate the present disclosure. The materials, usage amount, ratio, processing content, processing order, etc. shown in the following examples can be appropriately changed as long as they do not depart from the spirit of the present disclosure. Therefore, the scope of the present disclosure is not limited to the specific examples shown below. In addition, unless otherwise specified, "parts" and "%" are quality standards.

The compounds used in Examples and Comparative Examples other than the above are shown below. ＜Pigment＞

[Chemical formula 43]

The combinations of R _P1 to R _P7 , X _P1 , X _P2 and Y _P1 in the above chemical formula are shown in Tables 3 to 8 below. The symbol * indicates the position of bonding with other structures.

[table 3]

[Table 4]

[table 5]

[Table 6]

[Table 7]

[Table 8]

[Chemical formula 44]

The combinations of R _P11 to R _P14 , X _P11 and Y _P11 in the above chemical formula are shown in Table 9 below. The symbol * indicates the position of bonding with other structures.

[Table 9]

[Chemical formula 45]

The combination of R _P8 in the above chemical formula is shown in Table 10 below. The symbol * indicates the position of bonding with other structures.

[Table 10]

[Chemical formula 46]

The combination of R _P9 in the above chemical formula is shown in Table 11 below. The symbol * indicates the position of bonding with other structures.

[Table 11]

(Synthesis example 1) PPB-1 was synthesized by the method shown in the following scheme. The details are shown below.

[Chemical formula 47]

＜Synthesis of PPB-1-a＞ Using 4-(1-methylheptyloxy)benzonitrile as a raw material, the compound PPB-1-a was synthesized according to the method described in the specification of US Patent No. 5,969,154.

＜Synthesis of intermediate C-1＞ The intermediate C-1 was synthesized according to the following scheme.

137 parts by mass of potassium tertiary butoxide and 400 parts by mass of tetrahydrofuran (THF) were put into the flask, and 160 parts by mass of tert-butyl cyanoacetate were added dropwise under an ice bath. After stirring at room temperature (25°C, the same below) for 0.5 hours, 90 parts by mass of 2,6-dichloroquinoline was added, and the mixture was stirred for 2 hours. 900 parts by mass of water was poured into the reaction liquid, 53 parts by mass of acetic acid was added, and the precipitate was collected by filtration. By blowing and drying the crystal at 50°C, 118 parts by mass of intermediate C-1a was obtained. 115 parts by mass of the intermediate C-1a and 362 parts by mass of acetic acid were put into the flask, and stirred at an external temperature of 140°C for 7 hours. After the reaction, it was naturally cooled until the internal temperature became 30°C, and 630 parts by mass of water was dropped while maintaining the internal temperature at 30°C or lower. The crystals were filtered out and air-dried at 50°C, thereby obtaining 62 parts by mass of intermediate C-1b. Put 25 parts by mass of Intermediate C-1b, 18 parts by mass of 3-furylboronic acid, 17 parts by mass of potassium carbonate, 45 parts by mass of water, and 235 parts by mass of dimethylacetamide into the flask. After stirring at room temperature for 0.5 hours, 7 parts by mass of tetrakis(triphenylphosphine)palladium(0) was added, and the mixture was stirred at an external temperature of 120°C for 2 hours. After the reaction, it was ice-cooled until the internal temperature became 10°C, and 600 parts by mass of 1 mol/L hydrochloric acid was added dropwise while maintaining the internal temperature at 20°C or lower. The crystals were filtered out and washed with 250 parts by mass of water. 393 parts by mass of 2-propanol was added to the obtained crystals and stirred for 30 minutes to filter out the crystals. 25 mass parts of intermediate C-1 was obtained by blowing and drying the obtained crystal at 50°C.

＜Synthesis of PPB-1-b＞ In 346 parts by mass of toluene, 20 parts by mass of the compound PPB-1-a and 21 parts by mass of the intermediate C-1 were stirred, 51 parts by mass of phosphorus oxychloride were added dropwise, and the mixture was refluxed for 3.5 hours. After the reaction, it was cooled to an internal temperature of 25°C, and 634 parts by mass of methanol was added dropwise over 30 minutes while maintaining the internal temperature at 30°C or lower. After the dropwise addition, it was stirred at room temperature for 30 minutes. The precipitated crystals were filtered out and washed with 271 parts by mass of methanol. 16 parts by mass of the compound (PPB-1-b) were obtained by air drying the obtained crystal at 50°C for 12 hours.

＜Synthesis of PPB-1-c＞ In 98 parts by mass of 1,2-dichlorobenzene, the compound was stirred with 5 parts by mass of PPB-1-b and 10 parts by mass of 2-aminoethyl diphenylborate, and dropped over 15 minutes at an external temperature of 145°C. A mixture of 15 parts by mass of titanium tetrachloride and 32 parts by mass of 1,2-dichlorobenzene was added and stirred for 1 hour. It was naturally cooled until the internal temperature became 30°C, and 80 parts by mass of methanol was dropped while maintaining the internal temperature at 30°C or lower. After stirring for 30 minutes after dropping, the crystals were filtered out and washed with 40 parts by mass of methanol. To the obtained crystals, 28 parts by mass of methanol was added, heated under reflux for 30 minutes, and naturally cooled to 30°C, and the crystals were filtered out. 2.5 parts by mass of compound PPB-1-c was obtained by air drying the obtained crystal at 50°C for 12 hours.

<Synthesis of PPB-1> 0.3 parts by mass of compound PPB-1-c was stirred in 8.9 parts by mass of tetrahydrofuran, and 0.34 parts by mass of triethylamine, 2 parts by mass of tetrahydrofuran, and 0.42 parts by mass of 2- The naphthyl chloride mixture was heated to an external temperature of 75°C and heated to reflux for 1 hour. It was naturally cooled until the internal temperature became 30°C, the crystals were filtered out, and washed with 5.4 parts by mass of tetrahydrofuran. 7.9 parts by mass of methanol was added to the obtained crystals, heated under reflux for 1 hour, and naturally cooled to 30°C, and the crystals were filtered out. 0.16 parts by mass of compound PPB-1 was obtained by air drying the obtained crystal at 50°C for 12 hours. ¹ H-NMR (CDCl ₃ ): δ=6.40(d,4H), 6.61(d,2H), 7.25(d,4H), 7.16～7.32(m,14H), 7.43(m,10H), 7.60～ 7.70 (m, 6H), 7.82 (d, 2H), 7.97 (d, 2H), 8.02 (d, 2H), 8.06 (d, 2H), 8.12 (d, 2H), 8.32 (d, 2H), 8.92 (S, 2H), 9.12 (s, 2H). In addition, the λmax of the compound PPB-1 was 895 nm in chloroform.

(Synthesis example 2) Except for changing the raw materials, PPB-2 to PPB-76 and Syn-1 to Syn-19 described later were synthesized by the same method as PPB-1.

<PPB-4> ¹ H-NMR (CDCl ₃ ): δ=6.41 (d, 4H), 7.02 (d, 4H), 7.15-7.35 (m, 14H), 7.45 (m, 12H), 7.60-7.70 ( m, 4H), 7.94 ~ 8.07 (m, 10H), 8.14 (d, 2H), 8.31 (d, 2H), 8.93 (s, 2H), 9.12 (s, 2H). In addition, the λmax of the compound PPB-4 was 897 nm in chloroform.

<PPB-7> ¹ H-NMR (CDCl ₃ ): δ=6.41 (d, 4H), 7.01 (m, 6H), 7.17～7.30 (m, 16H), 7.39 (d, 2H), 7.44 (d, 8H), 7.60 ~ 7.70 (m, 4H), 7.94 ~ 8.14 (m, 10H), 8.31 (d, 2H), 8.92 (d, 2H), 9.11 (s, 2H). In addition, λmax of compound PPB-7 was 909 nm in chloroform.

<PPB-16> ¹ H-NMR (CDCl ₃ ): δ=6.39 (d, 4H), 6.61 (d, 2H), 7.01 (d, 4H), 7.16-7.30 (m, 10H), 7.41 (d, 10H), 7.47～7.59 (m, 8H), 7.68 (s, 2H), 7.81 (d, 2H), 7.98 (t, 4H), 8.10 (d, 2H), 8.35 (s, 2H), 9.09 (s , 2H). In addition, the λmax of the compound PPB-16 was 895 nm in chloroform.

<PPB-17> ¹ H-NMR (CDCl ₃ ): δ=3.28 (s, 6H), 6.41 (d, 4H), 6.61 (s, 2H), 6.09 (d, 4H), 7.16～7.31 (m, 14H), 7.40～7.42 (m, 10H), 7.68 (s, 2H), 7.82 (d, 2H), 8.05 (d, 2H), 8.09 (d, 2H), 8.67 (d, 2H), 8.77 (s , 2H), 9.09 (s, 2H). In addition, the λmax of the compound PPB-17 was 895 nm in chloroform.

<PPB-18> ¹ H-NMR (CDCl ₃ ): δ=6.39(d,4H), 7.01(d,4H), 7.16～7.35(m,14H), 7.39～7.45(m,12H), 7.47～ 7.57 (m, 6H) 7.94 (d, 2H), 7.98 (t, 4H), 8.13 (d, 2H), 8.35 (s, 2H), 9.10 (s, 2H). In addition, the λmax of compound PPB-18 was 898 nm in chloroform.

<PPB-19> ¹ H-NMR (CDCl ₃ ): δ=3.28 (s, 6H), 6.42 (d, 4H), 7.00 (d, 4H), 7.16-7.36 (m, 16H), 7.41-7.45 ( m, 12H), 7.94 (d, 2H), 8.05 (d, 2H), 8.11 (d, 2H), 8.67 (d, 2H), 8.77 (s, 2H), 9.10 (s, 2H). In addition, the λmax of the compound PPB-19 was 898 nm in chloroform.

(Synthesis example 3) The compound SQ-1 was synthesized by referring to the method described in JP 2017-137264 A.

(Synthesis example 4) SQ-2, SQ-3 and SQ-4 were synthesized by the same method as SQ-1.

＜Derivatives＞

[Chemical formula 48]

The combinations of R _P1 to R _P7 , X _P1 , X _P2 and Y _P1 in the above chemical formula are shown in Table 12 and Table 13 below. The symbol * indicates the position of bonding with other structures.

[Table 12]

[Table 13]

[Chemical formula 49]

＜Dispersion resin＞ D-1: Resin with the following structure (acid value=100mgKOH/g, weight average molecular weight=37,600, the value attached to the main chain represents the molar ratio of the repeating unit, and the value attached to the side chain represents the number of the repeating unit .) D-2: Resin with the following structure (acid value=32.3mgKOH/g, amine value=45.0mgKOH/g, weight average molecular weight=22,900, the value attached to the main chain represents the molar ratio of the repeating unit, in the side chain The attached value indicates the number of repeating units.)

[Chemical formula 50]

＜Resin＞ E-1: Acrybase FF-426 (manufactured by FUJIKURAKASEI CO., LTD., alkali-soluble resin) E-2: ARTON F4520 (manufactured by JSR Corporation, cyclic polyolefin resin) E-3: Resin with the following structure (Mw=40,000, acid value 100mgKOH/g, the numerical value in the main chain indicates the mass ratio of the repeating unit. Alkali-soluble resin.)

[Chemical formula 51]

＜Photopolymerization initiator＞

[Chemical formula 52]

＜Polymerizable compound＞ M-1: ARONIX M-305 (manufactured by TOAGOSEI CO., LTD., a mixture of the following two compounds. The content of triacrylate is 55% by mass to 63% by mass.)

[Chemical formula 53]

M-2: KAYARAD RP-1040 (manufactured by Nippon Kayaku Co., Ltd., ethylene oxide modified neopentylerythritol tetraacrylate) M-3: ARONIX M-510 (manufactured by TOAGOSEI CO., LTD., polyacid modified acrylic oligomer)

＜Solvent＞ PGMEA: Propylene glycol monomethyl ether acetate CYP: Cyclopentanone

(Examples 1 to 82 and Comparative Examples 1 to 4) <Evaluation method of pigment type examples and comparative examples> ＜＜Preparation of pigment dispersion＞＞ Mix 10 parts by mass of the pigment described in Table 14 or Table 15 below, 3 parts by mass of the derivative described in Table 14 or Table 15 below, and 7.8 parts by mass of the pigment described in Table 14 or Table 15 below. The dispersant, 150 parts by mass of propylene glycol methyl ether acetate (PGMEA) and 230 parts by mass of zirconia beads with a diameter of 0.3 mm were dispersed for 5 hours using a paint stirrer, and the beads were separated by filtration. Create a dispersion.

＜＜Preparation of curable composition 1＞＞ The following components are mixed to produce a curable composition. -The composition of the curable composition- ·The dispersion obtained in the above: 55 parts by mass ·Resin: 7.0 parts by mass ·Polymerizable compound: 4.5 parts by mass ·Photopolymerization initiator: 0.8 parts by mass ·Polymerization inhibitor (p-methoxyphenol): 0.001 parts by mass · Surfactant (the following mixture (Mw=14,000). In the following formula, the% representing the proportion of the repeating unit is mass %.): 0.03 parts by mass ·Ultraviolet absorber (UV-503, manufactured by DAITO CHEMICAL CO., LTD.): 1.3 parts by mass ·Solvent: 31 parts by mass

[Chemical formula 54]

＜＜Preparation of curable composition 2＞＞ The following components are mixed to produce a curable composition. -The composition of the curable composition- ·The dispersion obtained in the above: 55 parts by mass ·Resin: 14 parts by mass ·Solvent: 31 parts by mass

<<Production of cured film 1>> The curable composition was applied on a glass substrate by a spin coating method, and then stirred at 100°C for 2 minutes using a hot plate to obtain a composition layer. Using an i-ray stepper, the obtained composition layer was exposed with an exposure amount of 500 mJ/cm ² . Next, the exposed composition layer was cured at 220°C for 5 minutes using a hot plate to obtain a cured film with a thickness of 0.7 μm.

＜＜Production of cured film 2＞＞ The curable composition was coated on a glass substrate by spin coating, and then heated (pre-baked) at 80°C for 10 minutes using a hot plate, and then heated at 200°C for 5 minutes to obtain a film with a thickness of 0.7μm .

＜＜Evaluation of heat resistance＞＞ After heating the obtained film at 260°C for 30 minutes on a hot plate, the ΔEab of the color difference before and after the heat resistance test was measured with the colorimeter MCPD-1000 (manufactured by Otsuka Electronics Co., Ltd.) Value and evaluated according to the following criteria. A small value of ΔEab indicates good heat resistance. In addition, the value of ΔEab is calculated based on the following color difference formula based on the CIE1976 (L ^* , a ^* , b ^* ) space color system (The Color Science Handbook compiled by the Color Society of Japan (Showa 60) p. 266). ΔEab={(ΔL ^* ) ² +(Δa ^* ) ² +(Δb ^* ) ² } ^1/2 ＜＜Judgement criterion＞＞ A: ΔEab value＜5 B:5≤ΔEab value＜10 C:10≤ΔEab value

＜＜Evaluation of light resistance＞＞ After irradiating the obtained film with a xenon lamp at 50,000 lux for 20 hours (equivalent to 1 million lux·h), the ΔEab value of the color difference before and after the light resistance test was measured. A smaller ΔEab value indicates good light resistance. ＜＜Judgement Criteria＞＞ A: ΔEab value <5 B: 5≤ΔEab value＜10 C: 10≤ΔEab value

＜＜Evaluation of solvent resistance＞＞ The resulting film was left for 1 hour under a high temperature and high humidity environment of 85°C and a relative humidity of 85%. Then, the infrared absorption filter was immersed in cyclohexanone for 5 minutes, the spectra before and after the immersion were compared, and the solvent resistance was evaluated by the following formula. Regarding spectroscopy, the absorbance at the maximum absorption wavelength was measured with a spectroscope U4100 (manufactured by Hitachi High-Technologies Corporation). Formula: (Absorbance after immersion/Absorbance before immersion)×100 ＜＜Judgement Criteria＞＞ A: The value of the above formula is more than 90% B: The value of the above formula is more than 80% and less than 90% C: The value of the above formula is less than 80%

<Evaluation method of dye type examples and comparative examples> ＜＜Preparation of pigment solution＞＞ 2.34 parts by mass of the dyes described in the following Table 14 or Table 15 and 72.2 parts by mass of the solvent were mixed to produce a dye solution.

＜＜Preparation of curable composition 3＞＞ The following components are mixed to produce a curable composition. -The composition of the curable composition- ·Pigment solution: 74.5 parts by mass ·Resin (30% cyclopentanone solution): 20.1 parts by mass ·Polymerizable compound: 1.3 parts by mass ·Photopolymerization initiator: 1.4 parts by mass ·Polymerization inhibitor (p-methoxyphenol): 0.001 parts by mass ·MEGAFACE RS-72-K (fluorine-based surfactant, manufactured by DIC Corporation): 2.6 parts by mass

＜＜Preparation of curable composition 4＞＞ The following components are mixed to produce a curable composition. -The composition of the curable composition- ·Pigment solution: 74.5 parts by mass ·Epoxy resin (30% cyclopentanone solution): 20.1 parts by mass ·Epoxy hardener: 0.05 parts by mass

The details of the epoxy resin and epoxy hardener used in the examples and comparative examples are shown below.

-Epoxy resin- F-1: Glycidyl methacrylate backbone random polymer (manufactured by NOF CORPORATION, Marproof G-0150M, weight average molecular weight 10,000) F-2: EPICLON HP-4700 (manufactured by DIC Corporation, naphthalene type epoxy resin) F-3: JER1031S (manufactured by Mitsubishi Chemical Corporation., multifunctional epoxy resin)

-Epoxy hardener- G-1: Trimellitic acid G-2: pyromellitic anhydride G-3: N,N-Dimethyl-4-aminopyridine

＜＜Production of cured film 3＞＞ The curable composition prepared above was coated on a glass substrate by spin coating, and then heated (pre-baked) at 80°C for 10 minutes using a hot plate, and then heated at 150°C for 3 hours. A film with a thickness of 0.7 μm was obtained.

＜＜Evaluation of heat resistance and light resistance＞＞ The heat resistance, light resistance and solvent resistance were evaluated by the same method as above.

The evaluation results are summarized in Table 16 and Table 17.

[Table 14] pigment derivative Disperse resin Solvent Dispersion 1 PPB-1 pigment Syn-1 D-1 PGMEA Pigment solution 1 PPB-2 dye - - CYP Pigment solution 2 PPB-3 dye - - CYP Dispersion 2 PPB-4 pigment Syn-2 D-2 PGMEA Pigment solution 3 PPB-5 dye - - CYP Pigment solution 4 PPB-6 dye - - CYP Dispersion 3 PPB-7 pigment Syn-3 D-1 PGMEA Pigment solution 5 PPB-8 dye - - CYP Pigment solution 6 PPB-9 dye - - CYP Dispersion 4 PPB-10 pigment Syn-4 D-2 PGMEA Pigment solution 7 PPB-11 dye - - CYP Dispersion 5 PPB-12 pigment Syn-5 D-1 PGMEA Pigment solution 8 PPB-13 dye - - CYP Dispersion 6 PPB-14 pigment Syn-6 D-1 PGMEA Pigment solution 9 PPB-15 dye - - CYP Dispersion 7 PPB-16 pigment Syn-1 D-1 PGMEA Dispersion 8 PPB-17 pigment Syn-1 D-1 PGMEA Dispersion 9 PPB-18 pigment Syn-2 D-2 PGMEA Dispersion 10 PPB-19 pigment Syn-2 D-2 PGMEA Dispersion 11 PPB-20 pigment Syn-7 D-2 PGMEA Pigment solution 10 PPB-21 dye - - CYP Pigment solution 11 PPB-22 dye - - CYP Pigment solution 12 PPB-23 dye - - CYP Dispersion 12 PPB-24 pigment Syn-8 D-1 PGMEA Dispersion 13 PPB-25 pigment Syn-9 D-1 PGMEA Pigment solution 13 PPB-26 dye - - CYP Pigment solution 14 SQ-1 dye - - CYP Pigment solution 15 SQ-2 dye - - CYP Pigment solution 16 SQ-3 dye - - CYP Dispersion 14 Pc-1 pigment Derivative 1 D-1 PGMEA Dispersion 15 Pc-2 pigment Derivative 1 D-1 PGMEA Dispersion 16 Pc-3 pigment Derivative 1 D-1 PGMEA Dispersion 17 PPB-27 pigment Syn-10 D-1 PGMEA Pigment solution 17 PPB-28 dye - - CYP Pigment solution 18 PPB-29 dye - - CYP Pigment solution 19 SQ-4 dye - - CYP Pigment solution 20 PPB-30 dye - - CYP Pigment solution 21 PPB-31 dye - - CYP Pigment solution 22 PPB-32 dye - - CYP Pigment solution 23 PPB-33 dye - - CYP

[Table 15] pigment derivative Disperse resin Solvent Dispersion 18 PPB-34 pigment Syn-2 D-2 PGMEA Dispersion 19 PPB-35 pigment Syn-2 D-2 PGMEA Dispersion 20 PPB-36 pigment Syn-2 D-2 PGMEA Dispersion 21 PPB-37 pigment Syn-2 D-2 PGMEA Dispersion 22 PPB-38 pigment Syn-2 D-2 PGMEA Dispersion 23 PPB-39 pigment Syn-2 D-2 PGMEA Dispersion 24 PPB-40 pigment Syn-2 D-2 PGMEA Dispersion 25 PPB-41 pigment Syn-11 D-1 PGMEA Dispersion 26 PPB-42 pigment Syn-11 D-1 PGMEA Dispersion 27 PPB-43 pigment Syn-11 D-1 PGMEA Pigment solution 24 PPB-44 dye - - CYP Dispersion 28 PPB-45 pigment Syn-12 D-1 PGMEA Dispersion 29 PPB-46 pigment Syn-12 D-1 PGMEA Dispersion 30 PPB-47 pigment Syn-12 D-1 PGMEA Pigment solution 25 PPB-48 dye - - CYP Dispersion 31 PPB-49 pigment Syn-13 D-1 PGMEA Dispersion 32 PPB-50 pigment Syn-13 D-1 PGMEA Dispersion 33 PPB-51 pigment Syn-13 D-1 PGMEA Pigment solution 26 PPB-52 dye - - CYP Dispersion 34 PPB-53 pigment Syn-14 D-1 PGMEA Dispersion 35 PPB-54 pigment Syn-14 D-1 PGMEA Dispersion 36 PPB-55 pigment Syn-14 D-1 PGMEA Pigment solution 27 PPB-56 dye - - CYP Dispersion 37 PPB-57 pigment Syn-15 D-1 PGMEA Dispersion 38 PPB-58 pigment Syn-15 D-1 PGMEA Dispersion 39 PPB-59 pigment Syn-15 D-1 PGMEA Pigment solution 28 PPB-60 dye - - CYP Dispersion 40 PPB-61 pigment Syn-16 D-2 PGMEA Dispersion 41 PPB-62 pigment Syn-16 D-2 PGMEA Dispersion 42 PPB-63 pigment Syn-16 D-2 PGMEA Pigment solution 29 PPB-64 dye - - CYP Dispersion 43 PPB-65 pigment Syn-17 D-2 PGMEA Dispersion 44 PPB-66 pigment Syn-17 D-2 PGMEA Dispersion 45 PPB-67 pigment Syn-17 D-2 PGMEA Pigment solution 30 PPB-68 dye - - CYP Dispersion 46 PPB-69 pigment Syn-18 D-2 PGMEA Dispersion 47 PPB-70 pigment Syn-18 D-2 PGMEA Dispersion 48 PPB-71 pigment Syn-18 D-2 PGMEA Pigment solution 31 PPB-72 dye - - CYP Dispersion 49 PPB-73 pigment Syn-19 D-2 PGMEA Dispersion 50 PPB-74 pigment Syn-19 D-2 PGMEA Dispersion 51 PPB-75 pigment Syn-19 D-2 PGMEA Pigment solution 32 PPB-76 dye - - CYP

[Table 16] Composition manufacturing method Film making method Dispersions Resin Polymerization initiator monomer Epoxy resin hardener Heat resistance Light fastness Solvent resistance Example 1 1 1 Dispersion 1 E-1 C-1 M-1 - - A A A Example 2 2 2 Dispersion 1 E-1 - - - - A A A Example 3 3 1 Pigment solution 1 E-1/E-2=3/1 C-2 M-2 - - A A A Example 4 4 3 Pigment solution 1 - - - F-1 G-2 A A A Example 5 4 3 Pigment solution 1 - - - F-2 G-3 A A A Example 6 4 3 Pigment solution 1 - - - F-3 G-1 A A A Example 7 3 1 Pigment solution 2 E-1 C-1 M-1 - - A A A Example 8 1 1 Dispersion 2 E-3 C-1 M-2 - - A A A Example 9 3 1 Pigment solution 3 E-1 C-2 M-1/M-2=1/1 - - A A A Example 10 3 1 Pigment solution 4 E-1/E-2=4/1 C-1 M-1 - - A A A Example 11 1 1 Dispersion 3 E-1 C-1 M-1 - - A A A Example 12 3 1 Pigment solution 5 E-1 C-1 M-3 - - A A A Example 13 3 1 Pigment solution 6 E-3 C-2 M-1 - - A A A Example 14 1 1 Dispersion 4 E-3 C-1 M-1 - - A A A Example 15 3 1 Pigment solution 7 E-1/E-2=3/1 C-2 M-3 - - A A A Example 16 1 1 Dispersion 5 E-1 C-1 M-1/M-2=2/1 - - A A A Example 17 3 1 Pigment solution 8 E-1 C-3 M-1 - - A A A Example 18 1 1 Dispersion 6 E-3 C-1 M-2 - - A A A Example 19 3 1 Pigment solution 9 E-1 C-1 M-1 - - A A A Example 20 1 1 Dispersion 7 E-1 C-1 M-1 - - A A A Example 21 1 1 Dispersion 8 E-1/E-2=3/1 C-3 M-3 - - A A A Example 22 1 1 Dispersion 9 E-3 C-1 M-1/M-2=1/1 - - A A A Example 23 1 1 Dispersion 10 E-1 C-1 M-1 - - A A A Example 24 1 1 Dispersion 11 E-1 C-2 M-2 - - A A A Example 25 3 1 Pigment solution 10 E-3 C-1 M-1 - - A A A Example 26 3 1 Pigment solution 11 E-1 C-3 M-1 - - B A A Example 27 3 1 Pigment solution 12 E-1 C-1 M-3 - - B A A Example 28 1 1 Dispersion 12/dispersion 13=1/1 E-1 C-1 M-1 - - A A A Example 29 3 1 Pigment solution 13 E-1 C-1 M-3 - - B B A Example 30 3 1 Pigment solution 14 E-1 C-2 M-1 - - B B B Example 31 3 1 Pigment solution 15 E-3 C-3 M-1 - - B B B Example 32 3 1 Pigment solution 16 E-1 C-1 M-1 - - B B B Example 33 1 1 Dispersion 14 E-1 C-1 M-2 - - B B B Example 34 1 1 Dispersion 15 E-1 C-1 M-2 - - B B B Example 35 1 1 Dispersion 16 E-3 C-1 M-2 - - B B B Example 36 3 1 Pigment solution 20 E-1 C-1 M-1 - - B A A Example 37 3 1 Pigment solution 21 E-1 C-1 M-2 - - A A A Example 38 3 1 Pigment solution 22 E-1/E-2=3/1 C-1 M-2 - - B A A Example 39 3 1 Pigment solution 23 E-3 C-1 M-2 - - B A A Comparative example 1 1 1 Dispersion 17 E-1 C-1 M-1 - - C B B Comparative example 2 3 1 Pigment solution 17 E-1 C-1 M-1 - - C B B Comparative example 3 3 1 Pigment solution 18 E-1 C-1 M-1 - - C B B Comparative example 4 3 1 Pigment solution 19 E-1 C-1 M-1 - - C C C

[Table 17] Composition manufacturing method Film making method Dispersions Resin Polymerization initiator monomer Epoxy resin hardener Heat resistance Light fastness Solvent resistance Example 40 1 1 Dispersion 18 E-1 C-1 M-1 - - A A A Example 41 1 1 Dispersion 19 E-1 C-1 M-3 - - A A A Example 42 1 1 Dispersion 20 E-3 C-2 M-1 - - A A A Example 43 1 1 Dispersion 21 E-3 C-1 M-1 - - A A A Example 44 1 1 Dispersion 22 E-1/E-2=3/1 C-2 M-3 - - A A A Example 45 1 1 Dispersion 23 E-1 C-1 M-1/M-2=2/1 - - A A A Example 46 1 1 Dispersion 24 E-1 C-3 M-1 - - A A A Example 47 1 1 Dispersion 25 E-3 C-1 M-2 - - A A A Example 48 1 1 Dispersion 26 E-1 C-1 M-1 - - A A A Example 49 1 1 Dispersion 27 E-1 C-1 M-1 - - A A A Example 50 3 1 Pigment solution 24 E-1 C-2 M-2 - - A A A Example 51 1 1 Dispersion 28 E-3 C-1 M-1 - - A A A Example 52 1 1 Dispersion 29 E-1 C-3 M-1 - - A A A Example 53 1 1 Dispersion 30 E-1 C-1 M-3 - - A A A Example 54 4 3 Pigment solution 25 - - - F-1 G-1 A A A Example 55 1 1 Dispersion 31 E-1 C-1 M-3 - - A A A Example 56 1 1 Dispersion 32 E-1 C-2 M-1 - - A A A Example 57 1 1 Dispersion 33 E-3 C-3 M-1 - - A A A Example 58 3 1 Pigment solution 26 E-1 C-1 M-1 - - A A A Example 59 1 1 Dispersion 34 E-1 C-1 M-2 - - A A A Example 60 1 1 Dispersion 35 E-1 C-1 M-2 - - A A A Example 61 1 1 Dispersion 36 E-3 C-1 M-2 - - A A A Example 62 3 1 Pigment solution 27 E-1 C-1 M-1 - - A A A Example 63 1 1 Dispersion 37 E-1 C-1 M-2 - - A A A Example 64 1 1 Dispersion 38 E-1/E-2=3/1 C-1 M-2 - - A A A Example 65 1 1 Dispersion 39 E-3 C-1 M-2 - - A A A Example 66 4 3 Pigment solution 28 - - - F-2 G-3 A A A Example 67 1 1 Dispersion 40 E-1 C-1 M-1 - - A A A Example 68 1 1 Dispersion 41 E-1 C-1 M-1 - - A A A Example 69 2 2 Dispersion 42 E-1 - - - - A A A Example 70 4 3 Pigment solution 29 - - - F-3 G-2 A A A Example 71 1 1 Dispersion 43 E-1 C-1 M-1 - - A A A Example 72 1 1 Dispersion 44 E-1 C-1 M-3 - - A A A Example 73 1 1 Dispersion 45 E-3 C-2 M-1 - - A A A Example 74 3 1 Pigment solution 30 E-3 C-1 M-1 - - A A A Example 75 1 1 Dispersion 46 E-1/E-2=3/1 C-2 M-3 - - A A A Example 76 1 1 Dispersion 47 E-1 C-1 M-1/M-2=2/1 - - A A A Example 77 1 1 Dispersion 48 E-1 C-3 M-1 - - A A A Example 78 4 3 Pigment solution 31 - - - F-3 G-1 A A A Example 79 1 1 Dispersion 49 E-1/E-2=3/1 C-3 M-3 - - A A A Example 80 1 1 Dispersion 50 E-3 C-1 M-1/M-2=2/1 - - A A A Example 81 1 1 Dispersion 51 E-1 C-1 M-1 - - A A A Example 82 3 1 Pigment solution 32 E-1 C-2 M-2 - - A A A

From the results described in Table 16 and Table 17, it is clear that the composition of the present disclosure is superior in heat resistance compared with the composition of the comparative example. In addition, it can be seen that the composition of the present disclosure is also excellent in light resistance and solvent resistance. In addition, it can be seen that a composition including a compound having two partial structures represented by formula (1) has superior heat resistance compared to a composition including only one compound having a partial structure represented by formula (1).

In addition, in Example 1, even when 1/3 of the mass of PGMEA was replaced with propylene glycol monomethyl ether and evaluated in the same manner, the same results as in Example 1 were obtained. In Example 1, even when no polymerization inhibitor was added, the same result as in Example 1 was obtained. In Example 1, the same results as in Example 1 were obtained even when no surfactant was added.

(Examples 101 to 182) The compositions obtained in Examples 1, 3, 7 to 53, 55 to 65, 67, 68, 71 to 77, or 79 to 82 were applied by spin coating to form a film The film thickness after that was 1.0 μm. Then, it heated at 100 degreeC for 2 minutes using a hotplate. Next, exposure was performed at 1,000 mJ/cm ² through a mask of a 2 μm square dot pattern using an i-ray stepper exposure device FPA-3000i5+ (manufactured by Canon Inc.). Next, using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH), immersion development was performed at 23°C for 60 seconds. Then, it was rinsed with a rotary shower, and further rinsed with pure water. Next, it was heated at 200° C. for 5 minutes using a hot plate, thereby forming a 2 μm square pattern (infrared cut filter). The composition obtained in Examples 2, 4 to 6, 54, 66, 69, 70, or 78 was applied on a silicon wafer by a spin coating method so that the film thickness after film formation became 1.0 μm. Then, it heated at 100 degreeC for 2 minutes using a hotplate. Then, it heated at 200 degreeC for 5 minutes using a hotplate. Next, a 2 μm square pattern (infrared cut filter) was formed by dry etching.

Next, a red (Red) composition was applied on the pattern of the infrared cut filter by a spin coating method so that the film thickness after film formation became 1.0 μm. Then, it heated at 100 degreeC for 2 minutes using a hotplate. Next, exposure was performed at 1,000 mJ/cm ² through a mask of a 2 μm square dot pattern using an i-ray stepper exposure device FPA-3000i5+ (manufactured by Canon Inc.). Next, using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH), immersion development was performed at 23°C for 60 seconds. Then, it was rinsed with a rotary shower, and further rinsed with pure water. Next, heating was performed at 200° C. for 5 minutes using a hot plate, thereby patterning the red (Red) composition on the pattern of the near-infrared cut filter. Similarly, a green composition and a blue composition are patterned in sequence to form a colored pattern (Bayer pattern) of red, green, and blue. In addition, the Bayer pattern refers to a 2× color filter element having a red element, two green elements, and a blue element as disclosed in the specification of US Patent No. 3,971,065. 2 The pattern is repeated by the array. In this embodiment, a filter element with a red element, a green element, a blue element and an infrared transmission filter element is formed Bayer pattern formed by repeating 2×2 array.

Next, a composition for forming an infrared transmission filter (the following composition 100 or composition 101) was applied on the patterned film by a spin coating method so that the film thickness after film formation became 2.0 μm. Then, it heated at 100 degreeC for 2 minutes using a hotplate. Next, exposure was performed at 1,000 mJ/cm ² through a 2 μm square Bayer pattern mask using an i-ray stepper exposure device FPA-3000i5+ (manufactured by Canon Inc.). Next, using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH), immersion development was performed at 23°C for 60 seconds. Then, it was rinsed with a rotary shower, and further rinsed with pure water. Next, it was heated at 200° C. for 5 minutes using a hot plate, thereby patterning the infrared transmission filter in the missing portion where the colored pattern was not formed in the Bayer pattern of the infrared cut filter. It is assembled in a solid-state imaging element according to a known method. For the obtained solid-state imaging element, infrared light was irradiated with infrared light-emitting diodes (infrared LED) in a low illuminance environment (0.001 Lux) to read the image, and the image performance was evaluated. Even in the case of using any of the compositions obtained in Examples 1 to 82, the image can be clearly recognized in a low-illuminance environment.

The red (Red) composition, the green (Green) composition, the blue (Blue) composition, and the composition for forming an infrared transmission filter used in Examples 101 to 182 are as follows.

-Red composition- After mixing and stirring the following components, filtration was performed with a nylon filter (manufactured by NIHON PALL LTD.) with a pore diameter of 0.45 μm to prepare a red (Red) composition. Red pigment dispersion: 51.7 parts by mass Resin 4 (40% by mass PGMEA solution): 0.6 parts by mass Polymerizable compound 4: 0.6 parts by mass Photopolymerization initiator 1: 0.3 parts by mass Surfactant 1: 4.2 parts by mass PGMEA: 42.6 parts by mass

-Green composition- After mixing and stirring the following components, filtration was performed with a nylon filter (manufactured by NIHON PALL LTD.) with a pore size of 0.45 μm to prepare a green (Green) composition. Green pigment dispersion: 73.7 parts by mass Resin 4 (40% by mass PGMEA solution): 0.3 parts by mass Polymerizable compound 1: 1.2 parts by mass Photopolymerization initiator 1: 0.6 parts by mass Surfactant 1: 4.2 parts by mass Ultraviolet absorber (UV-503, manufactured by DAITO CHEMICAL CO., LTD.): 0.5 parts by mass PGMEA: 19.5 parts by mass

-Blue composition- After mixing and stirring the following components, filtration was performed with a nylon filter (manufactured by NIHON PALL LTD.) with a pore diameter of 0.45 μm to prepare a blue composition. Blue pigment dispersion: 44.9 parts by mass Resin 4 (40% by mass PGMEA solution): 2.1 parts by mass Polymerizable compound 1: 1.5 parts by mass Polymerizable compound 4: 0.7 parts by mass Photopolymerization initiator 1: 0.8 parts by mass Surfactant 1: 4.2 parts by mass PGMEA: 45.8 parts by mass

-Composition for forming infrared transmission filter- After mixing and stirring the components in the following composition, they were filtered with a nylon filter (manufactured by NIHON PALL LTD.) with a pore size of 0.45 μm to prepare an infrared transmission filter forming composition.

＜Composition 100＞ Pigment dispersion liquid 1-1: 46.5 parts by mass Pigment dispersion liquid 1-2: 37.1 parts by mass Polymerizable compound 5: 1.8 parts by mass Resin 4: 1.1 parts by mass Photopolymerization initiator 2: 0.9 parts by mass Surfactant 1: 4.2 parts by mass Polymerization inhibitor (p-methoxyphenol): 0.001 parts by mass Silane coupling agent: 0.6 parts by mass PGMEA: 7.8 parts by mass

＜Composition 101＞ Pigment dispersion 2-1: 1,000 parts by mass Polymerizable compound (dineopentaerythritol hexaacrylate): 50 parts by mass Resin: 17 parts by mass Photopolymerization initiator (1-[4-(phenylthio)]-1,2-octanedione-2-(O-benzophenoxime)): 10 parts by mass PGMEA: 179 parts by mass Alkali-soluble polymer F-1: 17 parts by mass (35 parts by mass of solid content)

＜Synthesis example of alkali-soluble polymer F-1＞ In the reaction vessel, mix 14 parts of benzyl methacrylate, 12 parts of N-phenylmaleimide, 15 parts of 2-hydroxyethyl methacrylate, 10 parts of styrene and 20 parts of The methacrylic acid was dissolved in 200 parts of propylene glycol monomethyl ether acetate, and 3 parts of 2,2'-azoisobutyronitrile and 5 parts of α-methylstyrene dimer were added. After purging the reaction vessel with nitrogen, it was heated at 80° C. for 5 hours while stirring and nitrogen bubbling to obtain a solution (solid content concentration 35% by mass) containing the alkali-soluble polymer F-1. The weight average molecular weight in terms of polystyrene of this polymer was 9,700, the number average molecular weight was 5,700, and the Mw/Mn was 1.70.

＜Pigment dispersion 2-1＞ Mix 60 parts of CI Pigment Black 32, 20 parts of CI Pigment Blue 15:6, 20 parts of CI Pigment Yellow 139, 80 parts of Lubrizol Japan Ltd. SOLSPERSE 76500 (solid content concentration 50% by mass), 120 parts of A solution containing the alkali-soluble polymer F-1 (with a solid content concentration of 35% by mass) and 700 parts of propylene glycol monomethyl ether acetate was dispersed using a paint stirrer for 8 hours to obtain a colorant dispersion liquid 2-1.

The raw materials used in the red (Red) composition, the green (Green) composition, the blue (Blue) composition, and the composition for forming an infrared transmission filter are as follows.

·Red (Red) pigment dispersion liquid uses a bead mill (zirconia beads 0.3mm diameter) to mix 9.6 mass parts of CI Pigment Red 254, 4.3 mass parts of CI Pigment Yellow 139, A mixed solution of 6.8 parts by mass of a dispersant (Disperbyk-161, manufactured by BYK-Chemie GmbH) and 79.3 parts by mass of PGMEA was mixed and dispersed for 3 hours to prepare a pigment dispersion. Then, a high-pressure dispersion machine NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism was further used, and the dispersion treatment was performed at a flow rate of 500 g/min under a pressure of 2,000 kg/cm ³ . This dispersion treatment was repeated 10 times to obtain a red pigment dispersion.

·The green pigment dispersion liquid uses a bead mill (zirconia beads 0.3mm diameter) to mix 6.4 mass parts of CI Pigment Green 36, 5.3 mass parts of CI Pigment Yellow 150, A mixture of 5.2 parts by mass of a dispersant (Disperbyk-161, manufactured by BYK Chemie GmbH) and 83.1 parts by mass of PGMEA was mixed and dispersed for 3 hours to prepare a pigment dispersion. Then, a high-pressure dispersion machine NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism was further used, and the dispersion treatment was performed at a flow rate of 500 g/min under a pressure of 2,000 kg/cm ³ . This dispersion treatment was repeated 10 times to obtain a green pigment dispersion.

·The blue (Blue) pigment dispersion liquid uses a bead mill (zirconia beads 0.3mm diameter) to mix 9.7 parts by mass of CI pigment blue (Pigment Blue) 15:6 and 2.4 parts by mass of CI pigment violet (Pigment Violet). ) A mixture of 23, 5.5 parts of dispersant (Disperbyk-161, manufactured by BYK-Chemie GmbH) and 82.4 parts of PGMEA was mixed and dispersed for 3 hours to prepare a pigment dispersion. Then, a high-pressure dispersion machine NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism was further used, and the dispersion treatment was performed at a flow rate of 500 g/min under a pressure of 2,000 kg/cm ³ . This dispersion treatment was repeated 10 times to obtain a blue pigment dispersion.

·Pigment dispersion 1-1 Using 0.3mm diameter zirconia beads, use a bead mill (high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with decompression mechanism) to mix and disperse the mixture of the following composition 3 After hours, a pigment dispersion liquid 1-1 was prepared. · Mixed pigments containing red pigment (C.I. Pigment Red 254) and yellow pigment (C.I. Pigment Yellow 139): 11.8 parts by mass ·Resin (Disperbyk-111, manufactured by BYK-Chemie GmbH): 9.1 parts by mass ·PGMEA: 79.1 parts by mass

·Pigment dispersion 1-2 Using 0.3mm diameter zirconia beads, use a bead mill (high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with decompression mechanism) to mix and disperse the mixture of the following composition 3 The pigment dispersion liquid 1-2 was prepared after hours. ·Mixed pigment containing blue pigment (C.I. Pigment Blue 15:6) and purple pigment (C.I. Pigment Violet 23): 12.6 parts by mass ·Resin (Disperbyk-111, manufactured by BYK-Chemie GmbH): 2.0 parts by mass ·Resin A: 3.3 parts by mass ·Cyclohexanone: 31.2 parts by mass ·PGMEA: 50.9 parts by mass

Resin A: The following structure (Mw=14,000, the ratio of each constituent unit is molar ratio.)

[Chemical formula 55]

·Polymerizable compound 1: KAYARAD DPHA (a mixture of dineopentaerythritol hexaacrylate and dineopentaerythritol pentaacrylate, manufactured by Nippon Kayaku Co., Ltd.) ·Polymerizable compound 4: the following structure

[Chemical formula 56]

·Polymerizable compound 5: The following structure (a mixture of 7:3 molar ratio of the compound on the left and the compound on the right)

[Chemical formula 57]

Resin 4: The following structure (acid value: 70mgKOH/g, Mw=11,000, the ratio of each constituent unit is molar ratio.)

[Chemical formula 58]

·Photopolymerization initiator 1: IRGACURE-OXE01 (1-[4-(phenylthio)]-1,2-octanedione-2-(O-benzophenoxime), manufactured by BASF Corporation) ·Photopolymerization initiator 2: The following structure

[Chemical formula 59]

· Surfactant 1: 1% by mass PGMEA solution of the following mixture (Mw=14,000). In the following formula, the unit representing% (62% and 38%) of the ratio of constituent units is mass %.

[Chemical formula 60]

· Silane coupling agent: a compound of the following structure. In the following structural formulae, Et represents an ethyl group.

[Chemical formula 61]

(Example 201) After mixing and stirring the following composition, filtration was performed with a nylon filter (manufactured by NIHON PALL LTD.) with a pore diameter of 0.45 μm to prepare a pattern forming composition of Example 201. The pattern forming composition of Example 1: 22.67 parts by mass Pigment dispersion liquid 2-1: 51.23 parts by mass Using the pattern forming composition of Example 201, the heat resistance, pattern shape, and development residue were evaluated in the same manner as in Example 1. As a result, the same effects as in Example 1 were obtained. In addition, the cured film obtained using the pattern forming composition of Example 201 can block light of wavelengths in the visible region and can transmit at least a part of light of wavelengths in the near-infrared region (near infrared).

(Embodiment 202) After mixing and stirring the following composition, filtration was performed with a nylon filter (manufactured by NIHON PALL LTD.) with a pore diameter of 0.45 μm to prepare a pattern forming composition of Example 202. The pattern forming composition of Example 1: 36.99 parts by mass Pigment dispersion liquid 1-1: 46.5 parts by mass Pigment dispersion liquid 1-2: 37.1 parts by mass The composition for pattern formation of Example 202 was used to evaluate the heat resistance, pattern shape, and development residue in the same manner as in Example 1. As a result, the same effects as in Example 1 were obtained. In addition, the cured film obtained using the pattern forming composition of Example 202 can block light of wavelengths in the visible region and can transmit at least a part of light of wavelengths in the near infrared region (near infrared).

(Example 301) The composition obtained in the above Examples 1 to 82 was used, a glass substrate was used as a substrate, and the above composition was coated on the glass substrate, except that the infrared shielding and heat resistance were performed in the same manner as in Example 1. , The evaluation of pattern shape and development residue can also obtain the same effects as in Examples 1-82.

(Example 302) The composition obtained in the above-mentioned Example 201 and Example 202 was used, a glass substrate was used as a substrate, and the above-mentioned composition was coated on the glass substrate, except that it was carried out in the same manner as in Example 201 or Example 202 In the evaluation of heat resistance, pattern shape, and development residue, the same effects as in Example 201 and Example 202 can also be obtained.

110: solid-state image sensor 111: Infrared cut filter 112: Color filter 114: Infrared transmission filter 115: Micro lens 116: Planarization layer

Fig. 1 is a schematic diagram showing an embodiment of the infrared sensor of the present disclosure.

110: solid-state image sensor

111: Infrared cut filter

112: Color filter

114: Infrared transmission filter

115: Micro lens

116: Planarization layer

Claims (18)

A composition comprising: a compound having a partial structure and a pigment structure represented by the following formula (1); and at least one compound selected from the group consisting of a binder and a hardening compound,

In formula (1), X ¹ to X ⁴ each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryl group, or a heteroaryl group, and at least one of X ¹ to X ⁴ is a heteroaryl group, Z ¹ represents N or N ⁺ -R ^N , R ^N represents a hydrogen atom, an alkyl group or an aryl group, and * represents the bonding position to the structure having the dye structure. The composition described in item 1 of the scope of patent application, wherein the partial structure represented by the formula (1) is the partial structure represented by the following formula (2),

In the formula (2), X ⁵ represents a heteroaryl group, and * represents the bonding position to the structure having the dye structure. The composition according to item 1 of the scope of the patent application, wherein the heteroaryl group in X ¹ to X ⁴ of the formula (1) is a furyl group or a thienyl group. The composition described in item 2 of the scope of patent application, wherein the heteroaryl group in X ⁵ of the formula (2) is a furyl group or a thienyl group. Such as the composition described in any one of items 1 to 4 of the scope of patent application, wherein The compound having the partial structure and dye structure represented by the formula (1) has a maximum absorption wavelength in the range of 650 nm to 1,500 nm. Such as the composition described in any one of items 1 to 4 of the scope of patent application, wherein The pigment structure is selected from the group consisting of pyrrolopyrrole pigment structure, pyrromethene pigment structure, squaraine pigment structure, croconium pigment structure, indigo pigment structure, anthraquinone pigment structure, diimonium pigment structure, phthalocyanine pigment At least one pigment structure from the group of structure, naphthalocyanine pigment structure, polymethine pigment structure, Kouyamaguchi pigment structure, quinacridone pigment structure, azo pigment structure, and quinoline pigment structure. For the composition described in any one of items 1 to 4 in the scope of the patent application, the compound having the partial structure represented by the formula (1) and the pigment structure is the compound represented by the following formula (3),

In formula (3), Y ¹ and Y ² each independently represent a hydrogen atom or a substituent, A ¹ and A ² each independently represent a substituent, B ¹ and B ² each independently represent a hydrogen atom or a substituent, X ⁶ ~X ¹³ each independently represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryl group or a heteroaryl group, at least one of X ⁶ to X ⁹ is a heteroaryl group, and at least one of X ¹⁰ to X ¹³ One is heteroaryl. The composition according to any one of items 1 to 4 of the scope of the patent application, which contains the curable compound and further contains a photopolymerization initiator. A film comprising or hardening the composition as described in any one of items 1 to 8 in the scope of patent application. An optical filter having the film described in item 9 of the scope of patent application. The filter described in item 10 of the scope of patent application is an infrared cut filter or an infrared transmission filter. A solid-state imaging device having a film as described in item 9 of the scope of patent application. An infrared sensor with the film as described in item 9 of the scope of patent application. A method for manufacturing an optical filter, which includes: The process of applying the composition described in any one of items 1 to 8 of the scope of patent application to the support to form a composition layer; The process of exposing the composition layer into a pattern; and A process of developing and removing the unexposed part after the exposure process to form a pattern. A method for manufacturing an optical filter, which includes: The process of applying the composition described in any one of items 1 to 8 of the scope of patent application to the support to form a composition layer; The process of hardening the composition layer to form a hardened layer; The process of forming a photoresist layer on the hardened layer; A process of obtaining a photoresist pattern by patterning the photoresist layer by exposing and developing; and The photoresist pattern is used as an etching mask to perform a dry etching process on the hardened layer. A camera module, which has: a solid-state imaging element; and the optical filter described in item 10 or item 11 of the scope of patent application. A compound represented by the following formula (3),

In formula (3), Y ¹ and Y ² each independently represent a hydrogen atom or a substituent, A ¹ and A ² each independently represent a substituent, B ¹ and B ² each independently represent a hydrogen atom or a substituent, X ⁶ ~X ¹³ each independently represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryl group or a heteroaryl group, at least one of X ⁶ to X ⁹ is a heteroaryl group, and at least one of X ¹⁰ to X ¹³ One is heteroaryl. A dispersion composition comprising: a compound having a partial structure and a pigment structure represented by the following formula (1); and at least one compound selected from the group consisting of a solvent, a binder, and a hardening compound,

In formula (1), X ¹ to X ⁴ each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryl group, or a heteroaryl group, and at least one of X ¹ to X ⁴ is a heteroaryl group, Z ¹ represents N or N ⁺ -R ^N , R ^N represents a hydrogen atom, an alkyl group or an aryl group, and * represents the bonding position to the structure having the dye structure.

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