TW202342364A - Reaction furnace for moisture generation - Google Patents

Reaction furnace for moisture generation Download PDF

Info

Publication number
TW202342364A
TW202342364A TW112106214A TW112106214A TW202342364A TW 202342364 A TW202342364 A TW 202342364A TW 112106214 A TW112106214 A TW 112106214A TW 112106214 A TW112106214 A TW 112106214A TW 202342364 A TW202342364 A TW 202342364A
Authority
TW
Taiwan
Prior art keywords
reaction furnace
furnace body
catalyst layer
platinum catalyst
coated
Prior art date
Application number
TW112106214A
Other languages
Chinese (zh)
Inventor
平尾圭志
皆見幸男
吉田牧人
Original Assignee
日商富士金股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商富士金股份有限公司 filed Critical 日商富士金股份有限公司
Publication of TW202342364A publication Critical patent/TW202342364A/en

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B5/00Water
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/38Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
    • B01J23/40Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
    • B01J23/42Platinum

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Catalysts (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Hydrogen, Water And Hydrids (AREA)

Abstract

To provide a reaction furnace for moisture generation capable of achieving a higher moisture generation ratio while preventing the risk of ignition. The present invention comprises: a reaction furnace main body 6 which has an inlet 2 and an outlet 4 for a gas; a first reflecting plate 7 which is disposed to face the outlet 4, and fixed to the inside of the reaction furnace main body 6 while maintaining a gap G2 with an inner wall surface of the reaction furnace main body 6, and which has a tapered portion 10 at a peripheral edge portion facing the inner wall surface of the reaction furnace main body 6; a first platinum catalyst layer 9 which is coated on the inner wall surface of the reaction furnace main body 6; and a second platinum catalyst layer 11 which is coated on an outer surface of the first reflecting plate 7, which is a side opposing the reaction furnace main body 6 and disposed more inward than the tapered portion 10.

Description

水分產生用反應爐Moisture generating reactor

本發明係關於主要在半導體製造裝置中利用,使氫氣與氧氣反應而產生水分的水分產生用反應爐。The present invention relates to a moisture-generating reactor that is mainly used in semiconductor manufacturing equipment and reacts hydrogen and oxygen to generate moisture.

以往,作為這種反應爐,已知有如圖6所示的水分產生用反應爐1C。此水分產生用反應爐1C,具備:將具有原料氣體的入口2的入口側爐本體構件3與具有水分氣體的出口4的出口側爐本體構件5以對向狀焊接接合之反應爐本體6;第1反射板7,其在反應爐本體6內部配置成與出口4呈對向狀,並與反應爐本體6的內壁面保持間隙G2而固定;第2反射板8,其在反應爐本體6的內部配置成與原料氣體的入口2對向狀,並與反應爐本體6的內壁面保持間隙G1而固定,在出口側爐本體構件5的內壁面塗佈有白金觸媒層9。再者,為了容易理解,用虛線誇張地圖示了白金觸媒層。Conventionally, as such a reaction furnace, a moisture generating reaction furnace 1C as shown in FIG. 6 has been known. This moisture-generating reaction furnace 1C includes a reaction furnace body 6 in which an inlet-side furnace body member 3 having an inlet 2 for raw material gas and an outlet-side furnace body member 5 having an outlet 4 for moisture gas are welded and joined in an opposing manner; The first reflecting plate 7 is disposed in the reaction furnace body 6 to face the outlet 4 and is fixed with a gap G2 to the inner wall surface of the reaction furnace body 6; the second reflecting plate 8 is disposed in the reaction furnace body 6 The interior of the reaction furnace body is arranged to face the inlet 2 of the raw material gas and is fixed with a gap G1 to the inner wall surface of the reaction furnace body 6. The inner wall surface of the outlet-side furnace body member 5 is coated with a platinum catalyst layer 9. In addition, for easy understanding, the platinum catalyst layer is exaggeratedly illustrated with dotted lines.

前述結構的水分產生用反應爐1C透過原料氣體的入口2向反應爐本體6內供給氧氣、氫氣,在較氫氣與氧氣的點火點(500~580℃)低的觸媒反應溫度(400℃以下)下,與白金觸媒層9進行觸媒反應,藉此,不會有燃燒,而能產生高純度的水分氣體並能夠從水分氣體取出口取出。The moisture-generating reaction furnace 1C with the aforementioned structure supplies oxygen and hydrogen into the reaction furnace body 6 through the inlet 2 of the raw material gas, and the catalyst reaction temperature (below 400°C) is lower than the ignition point of hydrogen and oxygen (500~580°C). ), a catalytic reaction occurs with the platinum catalyst layer 9, whereby there is no combustion, and high-purity moisture gas can be generated and can be taken out from the moisture gas outlet.

另外,圖6所示的水分產生用反應爐1C,藉由在第1反射板7的周緣部與反應爐本體6的內壁面相對向之側設置錐形部10,能夠不產生意外的起火燃燒而穩定地生成水分。亦即,由於觸媒反應在進入第1反射板7與反應爐本體6之間的間隙G2的部分發生強烈反應,故,藉由設置錐形部10,使前述原料氣體不會急劇流入至間隙G2,藉此抑制強力的觸媒反應產生,防止溫度的局部急劇上升,並防止起火。 [先前技術文獻] [專利文獻] In addition, in the moisture generating reaction furnace 1C shown in FIG. 6 , by providing the tapered portion 10 on the side facing the peripheral edge of the first reflecting plate 7 and the inner wall surface of the reaction furnace body 6 , unexpected ignition and combustion can be prevented. And stably generate moisture. That is, since the catalyst reaction reacts strongly at the portion entering the gap G2 between the first reflecting plate 7 and the reaction furnace body 6, by providing the tapered portion 10, the raw material gas will not flow into the gap suddenly. G2, thereby suppressing the generation of powerful catalytic reactions, preventing local sharp rises in temperature, and preventing fires. [Prior technical literature] [Patent Document]

[專利文獻1]日本特開第2000-169109號公報[Patent Document 1] Japanese Patent Application Laid-Open No. 2000-169109

[發明所欲解決之問題][Problem to be solved by the invention]

前述以往的水分產生用反應爐在能防止起火的危險性的同時達到水分發生率98%,穩定地達到高的水分產生率。但,雖可防止起火的危險性,但亦有期望進一步提高水分產生率的要求。The above-mentioned conventional moisture generation reactor can prevent the risk of fire and achieve a moisture generation rate of 98%, stably achieving a high moisture generation rate. However, although the risk of fire can be prevented, there is also a demand to further increase the moisture generation rate.

因此,本發明的目的在於提供一種能夠在防止起火危險性的同時實現更高的水分產生率的水分產生用反應爐。 [解決問題之技術手段] Therefore, an object of the present invention is to provide a moisture generation reactor capable of achieving a higher moisture generation rate while preventing the risk of fire. [Technical means to solve problems]

為了達到前述目的,本發明的一態樣的水分產生用反應爐,係具備: 反應爐本體,其具有氣體的入口及出口; 第1反射板,其與前述出口對向狀配設,與前述反應爐本體的內壁面保持有間隙而固定在前述反應爐本體內,並且在與前述反應爐本體的內壁面相對向的周緣部形成有錐形部; 第1白金觸媒層,其塗佈於前述反應爐本體的內壁面;及 第2白金觸媒層,其塗佈於前述第1反射板之與前述反應爐本體相對向之側且較前述錐形部更內側之外表面。 In order to achieve the aforementioned object, one aspect of the moisture generating reactor of the present invention is equipped with: The reactor body has a gas inlet and outlet; The first reflecting plate is disposed facing the outlet, is fixed in the reaction furnace body with a gap from the inner wall surface of the reaction furnace body, and is located at a peripheral edge portion facing the inner wall surface of the reaction furnace body. Formed with a tapered portion; The first platinum catalyst layer is coated on the inner wall surface of the aforementioned reaction furnace body; and The second platinum catalyst layer is coated on the outer surface of the first reflecting plate on the side opposite to the reaction furnace body and further inside than the tapered portion.

亦可還具備:環狀間隔件,其中介於前述第1反射板與前述反應爐本體的內壁面之間,用來保持有前述間隙;固定螺絲,其通過前述環狀間隔件而將前述第1反射板固定於前述反應爐本體, 前述第2白金觸媒層塗佈於除了前述環狀間隔件與前述第1反射板抵接的部分以外之前述外表面。 You may also further include: an annular spacer, which is interposed between the first reflecting plate and the inner wall surface of the reaction furnace body to maintain the aforementioned gap; and a fixing screw that secures the aforementioned third spacer through the annular spacer. 1. The reflecting plate is fixed on the aforementioned reaction furnace body. The second platinum catalyst layer is coated on the outer surface except for the portion where the annular spacer comes into contact with the first reflecting plate.

前述第2白金觸媒層能夠塗佈於較前述環狀間隔件更內側。The second platinum catalyst layer can be coated on the inner side of the annular spacer.

亦可為在前述反應爐本體的內壁面全面及前述第1反射板全面塗佈阻隔被膜,並且塗佈前述第1白金觸媒層及前述第2白金觸媒層。Alternatively, a barrier film may be coated on the entire inner wall surface of the reaction furnace body and the entire first reflective plate, and the first platinum catalyst layer and the second platinum catalyst layer may also be coated.

亦可還具備第2反射板,其與前述入口對向狀配設,與前述反應爐本體的內壁面保持有間隙而固定在前述反應爐本體內,並且在與前述反應爐本體的內壁面相對向的周緣部形成有錐形部; 前述第2反射板在全面塗佈有阻隔被膜且未塗佈有白金觸媒層。 [發明效果] You may further include a second reflecting plate, which is disposed opposite to the inlet, is fixed in the reaction furnace body with a gap from the inner wall surface of the reaction furnace body, and is opposite to the inner wall surface of the reaction furnace body. A tapered portion is formed on the peripheral portion; The aforementioned second reflective plate is coated with a barrier film on its entire surface and is not coated with a platinum catalyst layer. [Effects of the invention]

若依據本發明,藉由將第2白金觸媒層塗佈於前述第1反射板之與前述反應爐本體相對向之側且較前述錐形部更內側之外表面,在可防止起火的危險性的同時可達到更高的水分產生率。According to the present invention, by coating the second platinum catalyst layer on the outer surface of the first reflecting plate on the side opposite to the reaction furnace body and further inside than the tapered portion, the risk of fire can be prevented. It can achieve higher moisture production rate while maintaining stability.

以下,參照圖1至圖5,說明關於本發明的水分產生用反應爐之實施形態。再者,包括先前技術在內,在全圖及全部實施例中,對相同或類似的構成要件賦予相同的符號。Hereinafter, an embodiment of the moisture generating reaction furnace of the present invention will be described with reference to FIGS. 1 to 5 . In addition, the same or similar components are given the same reference numerals throughout the drawings and embodiments, including the prior art.

參照圖1,第1實施形態之水分產生用反應爐1A具備:反應爐本體6,其具有原料氣體(氧及氫)的入口2及水分氣體及未反應的原料氣體的出口4;第1反射板7,其與出口4對向狀配設,與反應爐本體6的內壁面保持有間隙G2而固定在反應爐本體6內,並且在與反應爐本體6的內壁面相對向的周緣部形成有錐形部10;第2白金觸媒層11,其塗佈於塗佈在反應爐本體6的內壁面之第1白金觸媒層9、和第1反射板7之與反應爐本體6相對向之側且較錐形部10更內側之外表面。Referring to FIG. 1 , a moisture generating reaction furnace 1A according to the first embodiment is provided with: a reaction furnace body 6 having an inlet 2 for raw material gas (oxygen and hydrogen) and an outlet 4 for moisture gas and unreacted raw material gas; and a first reflector. The plate 7 is arranged to face the outlet 4 and is fixed in the reactor body 6 with a gap G2 between it and the inner wall surface of the reactor body 6 . It is formed on a peripheral portion facing the inner wall surface of the reactor body 6 There is a tapered portion 10; a second platinum catalyst layer 11, which is coated on the first platinum catalyst layer 9 coated on the inner wall surface of the reactor body 6; and a first reflection plate 7 opposite to the reactor body 6. The outer surface is to the side and inward of the tapered portion 10 .

且,水分產生用反應爐1A具備第2反射板8。第2反射板8,其與入口2對向狀配設,與反應爐本體6的內壁面保持有間隙G1而固定在反應爐本體6內,並且在與反應爐本體6的內壁面相對向的周緣部形成有錐形部12。第2反射板8具有使自入口2流入的原料氣體有效率地擴散於反應爐本體6內的功能。Furthermore, the moisture generating reaction furnace 1A is provided with the second reflecting plate 8 . The second reflecting plate 8 is arranged to face the inlet 2 and is fixed in the reaction furnace body 6 with a gap G1 between it and the inner wall surface of the reaction furnace body 6 . A tapered portion 12 is formed at the peripheral edge. The second reflecting plate 8 has a function of efficiently diffusing the raw material gas flowing in from the inlet 2 into the reaction furnace body 6 .

反應爐本體6將入口側爐本體構件3與出口側爐本體構件5接合而具有短的圓柱狀外形。藉由入口側爐本體構件3的凹部3a與出口側爐本體構件5的凹部5a,形成內部空間P。凹部3a及凹部5a的各自的周緣凸緣部3b、5b藉由對接焊接而接合。氣體的入口2設在入口側爐本體構件3。水分氣體的出口4設在出口側爐本體構件5。The reaction furnace body 6 has a short cylindrical outer shape by joining the inlet-side furnace body member 3 and the outlet-side furnace body member 5 . The internal space P is formed by the recessed portion 3a of the entrance-side furnace body member 3 and the recessed portion 5a of the outlet-side furnace body member 5. The respective peripheral flange portions 3b and 5b of the recessed portion 3a and the recessed portion 5a are joined by butt welding. The gas inlet 2 is provided in the furnace body member 3 on the inlet side. The outlet 4 of moisture gas is provided in the furnace body member 5 on the outlet side.

第1白金觸媒層9主要塗佈於出口側爐本體構件5。入口側爐本體構件3亦可在周緣凸緣部3b的內表面塗佈第1白金觸媒層9。The first platinum catalyst layer 9 is mainly coated on the outlet side furnace body member 5 . The entrance-side furnace body member 3 may be coated with the first platinum catalyst layer 9 on the inner surface of the peripheral flange portion 3b.

若在第2反射板8塗佈白金觸媒層,則氣體進入爐內立即在間隙G1內引起觸媒反應。由於比起爐本體,第2反射板8的熱容量小,故,容易變成高溫,亦無法如反應爐本體6朝外部散熱,因此,若在第2反射板8塗佈白金觸媒層,則有起火的可能性。因此,期望在第2反射板8不塗佈白金觸媒層。If the platinum catalyst layer is coated on the second reflecting plate 8, the gas entering the furnace will immediately cause a catalytic reaction in the gap G1. Since the heat capacity of the second reflecting plate 8 is smaller than that of the furnace body, it easily reaches a high temperature and cannot dissipate heat to the outside like the reaction furnace body 6. Therefore, if the platinum catalyst layer is coated on the second reflecting plate 8, there may be Possibility of fire. Therefore, it is desirable not to apply the platinum catalyst layer to the second reflecting plate 8 .

第2反射板8及第1反射板7均具有圓板形狀。第2反射板8及第1反射板7經由間隙G1、G2大致平行地安裝在反應爐本體6的內壁面上,錐形部10、12形成為隨著朝向外周側而與反應爐本體6的內壁面的距離擴大。Both the second reflecting plate 8 and the first reflecting plate 7 have a disk shape. The second reflecting plate 8 and the first reflecting plate 7 are installed substantially parallel to the inner wall surface of the reaction furnace body 6 via gaps G1 and G2, and the tapered portions 10 and 12 are formed so as to be in contact with the outer circumferential side of the reaction furnace body 6. The distance between the inner wall surfaces increases.

反應爐本體6、第1反射板7、及第2反射板8可藉由不鏽鋼形成,但,亦可藉由其他材料例如鎳合金、鋁合金、鐵-鉻-鋁合金等形成。The reactor body 6, the first reflecting plate 7, and the second reflecting plate 8 can be made of stainless steel, but can also be made of other materials such as nickel alloy, aluminum alloy, iron-chromium-aluminum alloy, and the like.

在反應爐本體6的內側面、第1反射板7的表面、及第2反射板8的表面,全面塗佈有對於氧及氫具有鈍性之阻隔被膜13。第1白金觸媒層9及第2白金觸媒層11塗佈於阻隔被膜13上。阻隔被膜阻止構成反應爐本體6等之不鏽鋼等的母材中的雜質釋出到外部且阻止擴散至白金觸媒層內,用以防止白金觸媒層的劣化。The inner surface of the reactor body 6, the surface of the first reflecting plate 7, and the surface of the second reflecting plate 8 are all coated with a barrier film 13 that is passive against oxygen and hydrogen. The first platinum catalyst layer 9 and the second platinum catalyst layer 11 are coated on the barrier film 13 . The barrier film prevents impurities in the base material such as stainless steel constituting the reactor body 6 and the like from being released to the outside and from diffusing into the platinum catalyst layer, thereby preventing deterioration of the platinum catalyst layer.

阻隔被膜13可採用習知的材料。作為阻隔被膜,例如TiN、Al 2O 3、TiCN、TiAlN、Cr 2O 3、SiO 2、CrN、Y 2O 3、或Y 2O 3與其他的金屬氧化物(Ta 2O 5、SiO 2、TiO 2、ZrO 2、Al 2O 3、HfO 2、La 2O 3、CeO 2、Ce2O 3、MgO、ThO 2)之混合材料為眾所皆知。阻隔被膜13可藉由離子披覆法、離子濺鍍法、真空蒸鍍法等的PVD法、化學蒸鍍法(CVD法)、熱壓法或熱噴塗法等形成。阻隔被膜13的厚度可設為0.1μm至5μm左右。 The barrier film 13 can be made of conventional materials. As a barrier film, for example, TiN, Al 2 O 3 , TiCN, TiAlN, Cr 2 O 3 , SiO 2 , CrN, Y 2 O 3 , or Y 2 O 3 and other metal oxides (Ta 2 O 5 , SiO 2 , TiO 2 , ZrO 2 , Al 2 O 3 , HfO 2 , La 2 O 3 , CeO 2 , Ce2O 3 , MgO, ThO 2 ) mixed materials are well known. The barrier film 13 can be formed by a PVD method such as an ion coating method, an ion sputtering method, or a vacuum evaporation method, a chemical evaporation method (CVD method), a hot pressing method, or a thermal spraying method. The thickness of the barrier film 13 can be set to approximately 0.1 μm to 5 μm.

第1白金觸媒層9及第2白金觸媒層11可藉由真空蒸鍍法、離子披覆法、濺鍍法、化學蒸鍍法、熱壓法等進行成膜。第1白金觸媒層9及第2白金觸媒層11的厚度設成0.1μm~3μm為佳。再者,為了容易理解,在圖1中,用虛線誇張地顯示白金觸媒層。The first platinum catalyst layer 9 and the second platinum catalyst layer 11 can be formed by vacuum evaporation method, ion coating method, sputtering method, chemical evaporation method, hot pressing method, etc. The thickness of the first platinum catalyst layer 9 and the second platinum catalyst layer 11 is preferably 0.1 μm to 3 μm. In addition, in order to facilitate understanding, the platinum catalyst layer is exaggeratedly shown with a dotted line in FIG. 1 .

第1反射板7透過環狀間隔件14而藉由固定螺絲15固定於反應爐本體6。藉由供固定螺絲15通過的環狀間隔件14,在第1反射板7與反應爐本體6的內壁面之間保持有間隙G2。第2反射板8亦同樣地,透過環狀間隔件16而藉由固定螺絲17固定於反應爐本體6。間隙G1、G2理想為0.5~1.0mm,在圖示例設為0.5mm。在環狀間隔件14、16及固定螺絲15、17各自的表面,亦設有前述阻隔被膜。The first reflecting plate 7 passes through the annular spacer 14 and is fixed to the reactor body 6 by fixing screws 15 . A gap G2 is maintained between the first reflecting plate 7 and the inner wall surface of the reaction furnace body 6 by the annular spacer 14 through which the fixing screw 15 passes. Similarly, the second reflecting plate 8 is fixed to the reactor body 6 via the annular spacer 16 and the fixing screws 17 . The gaps G1 and G2 are ideally 0.5~1.0mm, and are set to 0.5mm in the example in the figure. The aforementioned barrier films are also provided on the respective surfaces of the annular spacers 14 and 16 and the fixing screws 15 and 17.

固定螺絲15在第1反射板7的錐形部10之半徑方向內側,沿著錐形部10以預定角度間隔(例如以90°間隔在4個部位)進行配設。The fixing screws 15 are arranged on the radial inner side of the tapered portion 10 of the first reflecting plate 7 at predetermined angular intervals (for example, at four locations at 90° intervals) along the tapered portion 10 .

具有前述結構的水分產生用反應爐1A,藉由在第1反射板7上塗佈第2白金觸媒層11,使觸媒反應增加,獲得更高的水分產生率。In the moisture generating reactor 1A having the above structure, the second platinum catalyst layer 11 is coated on the first reflecting plate 7 to increase the catalyst reaction and obtain a higher moisture generation rate.

如前述記載,錐形部10使原料氣體不會急劇進入間隙G2而防止溫度的急劇上升,但,若將第2白金觸媒層11也塗佈在錐形部10,則和與第1白金觸媒層9的反應相結合,觸媒反應變強,有溫度急劇上升而起火之虞。因此,除了錐形部10以外,在較錐形部10更內側的面上塗佈第2白金觸媒層11。As described above, the tapered portion 10 prevents the raw material gas from rapidly entering the gap G2 and prevents the temperature from rising sharply. However, if the second platinum catalyst layer 11 is also coated on the tapered portion 10, it will be combined with the first platinum catalyst layer 11. The reaction of the catalytic layer 9 is combined, the catalytic reaction becomes stronger, and the temperature may rise sharply and cause a fire. Therefore, in addition to the tapered portion 10 , the second platinum catalyst layer 11 is coated on the surface inside the tapered portion 10 .

且,在圖示例中,根據環狀間隔件14的材質、固定螺絲15的緊固扭矩的偏差等,亦可考慮在拴緊固定螺絲15時,在環狀間隔件14與第2白金觸媒層11接觸的部分,造成第2白金觸媒層11損傷,由此引起起火的可能性。因此,第2白金觸媒層11不塗佈於與環狀間隔件14接觸的部分為佳,在較環狀間隔件14更靠近半徑方向的內側呈圓形狀進行塗佈為佳。另外,為了確實地避免與環狀間隔件14之接觸,使第2白金觸媒層11預先與環狀間隔件14分離預定距離L(圖2、圖3)為佳。距離L可設為4~7mm。Furthermore, in the illustrated example, depending on the material of the annular spacer 14 and the variation in the tightening torque of the set screw 15, it may be considered that the annular spacer 14 contacts the second platinum when the set screw 15 is tightened. The contact portion of the catalyst layer 11 causes damage to the second platinum catalyst layer 11, thereby causing the possibility of fire. Therefore, it is preferable not to apply the second platinum catalyst layer 11 to the portion in contact with the annular spacer 14 , but to apply it in a circular shape on the inside of the annular spacer 14 in the radial direction. In addition, in order to reliably avoid contact with the annular spacer 14, it is preferable to separate the second platinum catalyst layer 11 from the annular spacer 14 by a predetermined distance L (Fig. 2, Fig. 3). The distance L can be set to 4~7mm.

作為變更例,亦可如圖4所示,除了與環狀間隔件14之接觸區域以外,亦可將較錐形部10更內側的面以第2白金觸媒層11加以塗佈。再者,與環狀間隔件14之接觸區域以外,亦可塗佈第1白金觸媒層9。As a modified example, as shown in FIG. 4 , in addition to the contact area with the annular spacer 14 , the surface further inside the tapered portion 10 may be coated with the second platinum catalyst layer 11 . Furthermore, the first platinum catalyst layer 9 may also be coated outside the contact area with the annular spacer 14 .

另一方面,流入間隙G2的氣體隨著接近出口4,未反應氣體减少,流到間隙G2中間的未反應氣體變少,因此,即使在第1反射板7與反應爐本體6雙方都有白金觸媒層,也不會發生直至起火程度的反應(溫度上升)。藉此,既可防止起火的危險性,又可獲得更高的水分產生率。On the other hand, as the gas flowing into the gap G2 approaches the outlet 4, the unreacted gas decreases, and the unreacted gas flowing into the middle of the gap G2 becomes smaller. Therefore, even if there is platinum on both the first reflecting plate 7 and the reactor body 6 The catalyst layer will not react to the point of fire (temperature rise). In this way, the risk of fire can be prevented and a higher moisture production rate can be achieved.

圖5顯示本發明的水分產生用反應爐之第2實施形態。第2實施形態的水分產生用反應爐1B具有厚度稍厚的第1反射板7,但不具備第1實施形態的第2反射板8,使得相應地被緊緻化。第2實施形態的其他結構是與第1實施形態相同,因此在此省略詳細說明。Fig. 5 shows a second embodiment of the moisture generating reaction furnace of the present invention. The moisture generating reaction furnace 1B of the second embodiment has a slightly thicker first reflecting plate 7 but does not include the second reflecting plate 8 of the first embodiment, so that it is compacted accordingly. The other structures of the second embodiment are the same as those of the first embodiment, so detailed descriptions are omitted here.

再者,本發明不限於前述實施形態,在不超出本發明的技術思想範圍可進行各種變更。In addition, the present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the scope of the technical idea of the present invention.

1A,1B,1C:水分產生用反應爐 2:入口 3:入口側爐本體構件 4:出口 5:出口側爐本體構件 6:反應爐本體 7:第1反射板 8:第2反射板 9:第1白金觸媒層 10:錐形部 11:第2白金觸媒層 14,16:環狀間隔件 15,17:固定螺絲 1A, 1B, 1C: Reaction furnace for moisture generation 2: Entrance 3: Inlet side furnace body components 4:Export 5: Exit side furnace body components 6:Reaction furnace body 7: The first reflective plate 8: 2nd reflector 9: The first platinum catalyst layer 10:Tapered part 11: The second platinum catalyst layer 14,16: Ring spacer 15,17: Fixing screws

[圖1]係顯示本發明的水分產生用反應爐之第1實施形態的剖面圖。 [圖2]係圖1的部分放大圖。 [圖3]係圖1的III-III線之剖面圖。 [圖4]係顯示圖3所示的形態的變更例之剖面圖。 [圖5]係顯示本發明的水分產生用反應爐之第2實施形態的剖面圖。 [圖6]係顯示以往的水分產生用反應爐之剖面圖。 [Fig. 1] is a cross-sectional view showing the first embodiment of the moisture generating reaction furnace of the present invention. [Figure 2] is a partially enlarged view of Figure 1. [Fig. 3] is a cross-sectional view taken along line III-III in Fig. 1. [Fig. 4] is a cross-sectional view showing a modified example of the form shown in Fig. 3. [Fig. [Fig. 5] is a cross-sectional view showing a second embodiment of the moisture generating reaction furnace of the present invention. [Fig. 6] is a cross-sectional view showing a conventional reaction furnace for moisture generation.

1A:水分產生用反應爐 1A: Reaction furnace for moisture generation

2:入口 2: Entrance

3:入口側爐本體構件 3: Inlet side furnace body components

4:出口 4:Export

5:出口側爐本體構件 5: Exit side furnace body components

6:反應爐本體 6:Reaction furnace body

7:第1反射板 7: The first reflective plate

8:第2反射板 8: 2nd reflector

9:第1白金觸媒層 9: The first platinum catalyst layer

10:錐形部 10:Tapered part

11:第2白金觸媒層 11: The second platinum catalyst layer

12:錐形部 12:Tapered part

13:阻隔被膜 13: Barrier film

14,16:環狀間隔件 14,16: Ring spacer

15,17:固定螺絲 15,17: Fixing screws

3a,5a:凹部 3a,5a: concave part

3b,5b:周緣凸緣部 3b, 5b: Peripheral flange part

G1,G2:間隙 G1, G2: Gap

P:內部空間 P: internal space

Claims (5)

一種水分產生用反應爐,係具備: 反應爐本體,其具有氣體的入口及出口; 第1反射板,其與前述出口對向狀配設,與前述反應爐本體的內壁面保持有間隙而固定在前述反應爐本體內,並且在與前述反應爐本體的內壁面相對向的周緣部形成有錐形部; 第1白金觸媒層,其塗佈於前述反應爐本體的內壁面;及 第2白金觸媒層,其塗佈於前述第1反射板之與前述反應爐本體相對向之側且較前述錐形部更內側之外表面。 A reaction furnace for moisture generation, equipped with: The reactor body has a gas inlet and outlet; The first reflecting plate is disposed facing the outlet, is fixed in the reaction furnace body with a gap from the inner wall surface of the reaction furnace body, and is located at a peripheral edge portion facing the inner wall surface of the reaction furnace body. Formed with a tapered portion; The first platinum catalyst layer is coated on the inner wall surface of the aforementioned reaction furnace body; and The second platinum catalyst layer is coated on the outer surface of the first reflecting plate on the side opposite to the reaction furnace body and further inside than the tapered portion. 如請求項1的水分產生用反應爐,其中,還具備:環狀間隔件,其中介於前述第1反射板與前述反應爐本體的內壁面之間,用來保持有前述間隙;及 固定螺絲,其通過前述環狀間隔件而將前述第1反射板固定於前述反應爐本體, 前述第2白金觸媒層塗佈於除了前述環狀間隔件與前述第1反射板抵接的部分以外之前述外表面。 The moisture generating reaction furnace of claim 1, further comprising: an annular spacer interposed between the first reflecting plate and the inner wall surface of the reaction furnace body to maintain the gap; and a fixing screw that fixes the first reflecting plate to the reaction furnace body through the annular spacer, The second platinum catalyst layer is coated on the outer surface except for the portion where the annular spacer comes into contact with the first reflecting plate. 如請求項2的水分產生用反應爐,其中,前述第2白金觸媒層塗佈於較前述環狀間隔件更內側。The moisture generating reactor of claim 2, wherein the second platinum catalyst layer is coated on an inner side of the annular spacer. 如請求項1的水分產生用反應爐,其中,在前述反應爐本體的內壁面全面及前述第1反射板全面塗佈阻隔被膜,並且塗佈前述第1白金觸媒層及前述第2白金觸媒層。The moisture generating reactor of claim 1, wherein a barrier film is coated on the entire inner wall surface of the reactor body and the entire first reflective plate, and the first platinum catalyst layer and the second platinum catalyst layer are coated media layer. 如請求項1的水分產生用反應爐,其中,還具備第2反射板,其與前述入口對向狀配設,與前述反應爐本體的內壁面保持有間隙而固定在前述反應爐本體內,並且在與前述反應爐本體的內壁面相對向的周緣部形成有錐形部; 前述第2反射板在全面塗佈有阻隔被膜且未塗佈有白金觸媒層。 The moisture-generating reaction furnace of claim 1, further comprising a second reflecting plate disposed opposite to the inlet and fixed in the reaction furnace body with a gap between it and the inner wall surface of the reaction furnace body, And a tapered portion is formed on the peripheral portion facing the inner wall surface of the reaction furnace body; The aforementioned second reflective plate is coated with a barrier film on its entire surface and is not coated with a platinum catalyst layer.
TW112106214A 2022-03-14 2023-02-21 Reaction furnace for moisture generation TW202342364A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022039549 2022-03-14
JP2022-039549 2022-03-14

Publications (1)

Publication Number Publication Date
TW202342364A true TW202342364A (en) 2023-11-01

Family

ID=88022772

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112106214A TW202342364A (en) 2022-03-14 2023-02-21 Reaction furnace for moisture generation

Country Status (4)

Country Link
JP (1) JPWO2023176208A1 (en)
KR (1) KR20240052957A (en)
TW (1) TW202342364A (en)
WO (1) WO2023176208A1 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3644790B2 (en) * 1997-04-28 2005-05-11 忠弘 大見 Water generation reactor
JP3686762B2 (en) 1998-12-04 2005-08-24 株式会社フジキン Water generation reactor
KR100402665B1 (en) * 2000-06-05 2003-10-22 가부시키가이샤 후지킨 Reactor for generating moisture

Also Published As

Publication number Publication date
WO2023176208A1 (en) 2023-09-21
JPWO2023176208A1 (en) 2023-09-21
KR20240052957A (en) 2024-04-23

Similar Documents

Publication Publication Date Title
JP3110465B2 (en) Moisture generation reactor, temperature control method of moisture generation reactor, and method of forming platinum-coated catalyst layer
RU2158840C2 (en) Housing of liquid-propellant rocket engine chamber
US20140219884A1 (en) High emissivity and high temperature diffusion barrier coatings for an oxygen transport membrane assembly
JP2009116219A (en) Antireflective film, method of forming antireflective film and light-transmissive member
KR100402665B1 (en) Reactor for generating moisture
TW202342364A (en) Reaction furnace for moisture generation
WO2010061601A1 (en) Vapor device
JP3686762B2 (en) Water generation reactor
JP3644790B2 (en) Water generation reactor
JP2007327737A (en) Insert for flame arrestor, and manufacturing method of the same
JP2009173534A (en) Membrane reactor
JP3679636B2 (en) Water generation reactor
JP2003342752A (en) Heat resistant and corrosion resistant member for vacuum use, vacuum apparatus having parts obtained by using the same member and coating method therefor
KR100351043B1 (en) Heater module with coated reflection plate
AU2018225388B2 (en) Chemical reactor with catalyst support system
KR101366027B1 (en) Reaction furnace for moisture generation
US10865138B2 (en) Infrared mirror with a thermally stable layer
JP2000169108A (en) Reaction furnace for generating water
JP2019035345A (en) Exhaust pipe of internal combustion engine
US20090233152A1 (en) Fuel cell system and apparatus for supplying media to a fuel cell arrangement
JPH06213328A (en) High temperature sealing device
JP5392596B2 (en) Fuel cell
JP4014735B2 (en) Thermal insulation wall structure
JPS5884972A (en) Surface treating device
TWM446413U (en) Deposition isolated disk