TW202340441A - 組成物、化合物、樹脂、基板之處理方法及半導體元件之製造方法 - Google Patents

組成物、化合物、樹脂、基板之處理方法及半導體元件之製造方法 Download PDF

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TW202340441A
TW202340441A TW112104890A TW112104890A TW202340441A TW 202340441 A TW202340441 A TW 202340441A TW 112104890 A TW112104890 A TW 112104890A TW 112104890 A TW112104890 A TW 112104890A TW 202340441 A TW202340441 A TW 202340441A
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metal
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下重直也
杉島泰雄
高橋智威
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日商富士軟片股份有限公司
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    • C07C217/60—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups bound to carbon atoms of at least one six-membered aromatic ring and amino groups bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings of the same carbon skeleton with amino groups linked to the six-membered aromatic ring, or to the condensed ring system containing that ring, by carbon chains not further substituted by singly-bound oxygen atoms linked by carbon chains having two carbon atoms between the amino groups and the six-membered aromatic ring or the condensed ring system containing that ring
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TW112104890A 2022-02-18 2023-02-13 組成物、化合物、樹脂、基板之處理方法及半導體元件之製造方法 TW202340441A (zh)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118638357A (zh) * 2024-07-10 2024-09-13 宁波伏龙同步带有限公司 一种高强度碳纤维同步带及其制备方法

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US4120766A (en) * 1977-03-28 1978-10-17 The B. F. Goodrich Company Hydroxyl-containing liquid polymers and process for preparation thereof
JP5373537B2 (ja) * 2009-10-09 2013-12-18 住友ゴム工業株式会社 タイヤ用ゴム組成物及びスタッドレスタイヤ
JP6040089B2 (ja) * 2013-04-17 2016-12-07 富士フイルム株式会社 レジスト除去液、これを用いたレジスト除去方法およびフォトマスクの製造方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN118638357A (zh) * 2024-07-10 2024-09-13 宁波伏龙同步带有限公司 一种高强度碳纤维同步带及其制备方法

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