TW202339130A - Electronic package and manufacturing method thereof - Google Patents

Electronic package and manufacturing method thereof Download PDF

Info

Publication number
TW202339130A
TW202339130A TW111109618A TW111109618A TW202339130A TW 202339130 A TW202339130 A TW 202339130A TW 111109618 A TW111109618 A TW 111109618A TW 111109618 A TW111109618 A TW 111109618A TW 202339130 A TW202339130 A TW 202339130A
Authority
TW
Taiwan
Prior art keywords
electronic
package
manufacturing
electronic component
contacts
Prior art date
Application number
TW111109618A
Other languages
Chinese (zh)
Other versions
TWI790945B (en
Inventor
李孟傑
蔡芳霖
Original Assignee
矽品精密工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 矽品精密工業股份有限公司 filed Critical 矽品精密工業股份有限公司
Priority to TW111109618A priority Critical patent/TWI790945B/en
Priority to CN202210320552.5A priority patent/CN116798962A/en
Application granted granted Critical
Publication of TWI790945B publication Critical patent/TWI790945B/en
Publication of TW202339130A publication Critical patent/TW202339130A/en

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3121Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814Conductive parts
    • H01L21/4846Leads on or in insulating or insulated substrates, e.g. metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814Conductive parts
    • H01L21/4846Leads on or in insulating or insulated substrates, e.g. metallisation
    • H01L21/4853Connection or disconnection of other leads to or from a metallisation, e.g. pins, wires, bumps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3114Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed the device being a chip scale package, e.g. CSP
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49811Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49811Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
    • H01L23/49816Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49838Geometry or layout

Abstract

An electronic package is provided, in which a panel wafer body includes a plurality of electronic structures arranged in an array, electronic components are stacked on each of the electronic structures, a plurality of conductive pillars are formed on the electronic structure, at least one groove is formed between the electronic structures, a encapsulating layer is formed on the panel wafer body, and a circuit structure is formed on the encapsulating layer, so when a dicing process is performed along the groove, the electronic structure does not need to be formed solder bump. Therefore, the overall height of the electronic package can be reduced, and the current transmission path can be effectively shortened to improve the electrical performance.

Description

電子封裝件及其製法 Electronic packages and manufacturing methods

本發明係有關一種半導體裝置,尤指一種電子封裝件及其製法。 The present invention relates to a semiconductor device, and in particular to an electronic package and a manufacturing method thereof.

隨著電子產業的蓬勃發展,電子產品也逐漸邁向多功能、高性能的趨勢。目前應用於晶片封裝領域之技術,包含有例如晶片尺寸構裝(Chip Scale Package,簡稱CSP)、晶片直接貼附封裝(Direct Chip Attached,簡稱DCA)或多晶片模組封裝(Multi-Chip Module,簡稱MCM)等覆晶型態的封裝模組,或將晶片立體堆疊化整合為三維積體電路(3D IC)堆疊技術等。 With the vigorous development of the electronics industry, electronic products are gradually moving towards multi-function and high performance. Technologies currently used in the field of chip packaging include, for example, Chip Scale Package (CSP), Direct Chip Attached (DCA) or Multi-Chip Module. MCM) and other flip-chip packaging modules, or three-dimensional stacking of chips integrated into three-dimensional integrated circuit (3D IC) stacking technology.

圖1係為習知三維積體電路堆疊之封裝結構1之剖面示意圖。如圖1所示,該封裝結構1將一矽中介板(Through Silicon interposer,簡稱TSI)1a藉由銲錫凸塊16設於封裝基板19上,且以底膠191包覆該些銲錫凸塊16。該矽中介板1a具有一矽板體10及複數形成於其中之導電矽穿孔(Through-silicon via,簡稱TSV)101,且該矽板體10之表面上形成有一電性連接該導電矽穿孔101之線路重佈結構(Redistribution layer,簡稱RDL),其中,該線路重佈結構係包含一介電層11及一形成於該介電層11上之線路層12,且該線路層12電性連接該導電矽穿孔101,並形成一絕緣保護層13於該介電層11與該線路層12上,且該絕緣保護層13 外露部分該線路層12,以結合複數銲錫凸塊14,供設置半導體晶片17,再以底膠171包覆該些銲錫凸塊14。之後,形成封裝材18於該封裝基板19上,以令該封裝材18包覆該半導體晶片17與該矽中介板1a。 FIG. 1 is a schematic cross-sectional view of a conventional three-dimensional integrated circuit stack packaging structure 1 . As shown in Figure 1, the packaging structure 1 has a silicon interposer (TSI) 1a disposed on a packaging substrate 19 through solder bumps 16, and covers the solder bumps 16 with a primer 191 . The silicon interposer 1a has a silicon plate body 10 and a plurality of conductive silicon vias (TSVs) 101 formed therein, and an electrically connected conductive silicon through hole 101 is formed on the surface of the silicon plate body 10 A redistribution layer (RDL), wherein the redistribution structure includes a dielectric layer 11 and a circuit layer 12 formed on the dielectric layer 11, and the circuit layer 12 is electrically connected The conductive silicon through hole 101 forms an insulating protective layer 13 on the dielectric layer 11 and the circuit layer 12, and the insulating protective layer 13 The exposed portion of the circuit layer 12 is used to combine a plurality of solder bumps 14 for setting the semiconductor chip 17 , and then the solder bumps 14 are covered with a primer 171 . After that, a packaging material 18 is formed on the packaging substrate 19 so that the packaging material 18 covers the semiconductor chip 17 and the silicon interposer 1 a.

再者,可形成另一絕緣保護層15於該矽板體10上,且該絕緣保護層15外露該些導電矽穿孔101之端面,以於該些導電矽穿孔101之端面上結合並電性連接複數銲錫凸塊16,其中,可選擇性於該導電矽穿孔101之端面上形成供接置該銲錫凸塊16之凸塊底下金屬層(Under Bump Metallurgy,簡稱UBM)160。 Furthermore, another insulating protective layer 15 can be formed on the silicon plate body 10, and the insulating protective layer 15 exposes the end surfaces of the conductive silicon through holes 101, so as to combine and electrically connect to the end surfaces of the conductive silicon through holes 101. A plurality of solder bumps 16 are connected, wherein an under-bump metallurgy (UBM) 160 for connecting the solder bumps 16 can be selectively formed on the end surface of the conductive silicon through hole 101.

於後續應用中,該封裝結構1可形成複數銲球192於該封裝基板19之下側,以接置於一電路板1b上。 In subsequent applications, the packaging structure 1 can form a plurality of solder balls 192 on the lower side of the packaging substrate 19 to be connected to a circuit board 1b.

惟,習知封裝結構1於製作該矽中介板1a時,需先將矽板體10置放於一玻璃載板上,再進行該導電矽穿孔101與RDL之製作,待製作該導電矽穿孔101與RDL後,需再移除該玻璃載板,造成材料成本增加與製程之困擾。 However, in the conventional packaging structure 1, when manufacturing the silicon interposer 1a, the silicon plate body 10 needs to be placed on a glass carrier first, and then the conductive silicon through holes 101 and RDL are made. 101 and RDL, the glass carrier needs to be removed again, causing increased material costs and trouble in the manufacturing process.

因此,如何克服上述習知技術之問題,實已成為目前業界亟待克服之難題。 Therefore, how to overcome the above-mentioned problems of the conventional technology has become an urgent problem that the industry needs to overcome.

鑑於上述習知技術之種種缺失,本發明係提供一種電子封裝件,係包括:電子結構,係具有複數接點,且該複數接點未凸出該電子結構之表面;電子元件,係疊設於該電子結構上;複數導電柱,係設於該電子結構上,以電性連接該電子結構之複數接點;包覆層,係形成於該電子結構上,以包覆該電子元件與該複數導電柱;以及線路結構,係設於該包覆層上,以電性連接該複數導電柱。 In view of the deficiencies of the above-mentioned conventional technologies, the present invention provides an electronic package, which includes: an electronic structure having a plurality of contacts, and the plurality of contacts do not protrude from the surface of the electronic structure; electronic components are stacked On the electronic structure, a plurality of conductive pillars are provided on the electronic structure to electrically connect a plurality of contacts of the electronic structure; a coating layer is formed on the electronic structure to cover the electronic component and the electronic structure. A plurality of conductive pillars; and a circuit structure are provided on the coating layer to electrically connect the plurality of conductive pillars.

本發明復提供一種電子封裝件之製法,係包括:提供一整版面晶圓體,其包含複數陣列排設之電子結構,且各該電子結構係具有複數接點;將一電子元件設於各該電子結構上,且各該電子結構上形成有複數電性連接該複數接點之複數導電柱;於各該電子結構之間形成凹槽,且該凹槽並未貫穿該電子結構;形成包覆層於該整版面晶圓體上,以令該包覆層包覆該電子元件與該複數導電柱;形成線路結構於該包覆層上,以令該線路結構電性連接該複數導電柱;以及沿該凹槽進行切單製程。 The present invention further provides a method for manufacturing an electronic package, which includes: providing a full-layout wafer body, which includes a plurality of electronic structures arranged in an array, and each electronic structure has a plurality of contacts; and arranging an electronic component on each On the electronic structure, a plurality of conductive pillars electrically connected to the plurality of contacts are formed on each electronic structure; grooves are formed between the electronic structures, and the grooves do not penetrate the electronic structure; forming a package Coating the full-layout wafer, so that the coating layer covers the electronic component and the plurality of conductive pillars; forming a circuit structure on the coating layer, so that the circuit structure is electrically connected to the plurality of conductive pillars ; and perform a cutting process along the groove.

前述之電子封裝件及其製法中,該電子元件係接觸該電子結構之表面。 In the aforementioned electronic package and its manufacturing method, the electronic component is in contact with the surface of the electronic structure.

前述之電子封裝件及其製法中,該電子元件係藉由結合層黏固於該電子結構上。 In the aforementioned electronic package and its manufacturing method, the electronic component is bonded to the electronic structure through a bonding layer.

前述之電子封裝件及其製法中,該電子元件係電性連接該線路結構。 In the aforementioned electronic package and its manufacturing method, the electronic component is electrically connected to the circuit structure.

前述之電子封裝件及其製法中,該電子元件係具有複數電極墊,以令該電子元件以該複數電極墊對應接合於該電子結構之複數接點上並電性連接該複數接點。 In the aforementioned electronic package and its manufacturing method, the electronic component has a plurality of electrode pads, so that the electronic component is connected to a plurality of contacts of the electronic structure through the plurality of electrode pads and is electrically connected to the plurality of contacts.

前述之電子封裝件及其製法中,該電子結構係配置有佈線結構,以供接置及電性連接該複數導電柱。進一步,該佈線結構上復接置及電性連接該電子元件。 In the aforementioned electronic package and its manufacturing method, the electronic structure is equipped with a wiring structure for connecting and electrically connecting the plurality of conductive pillars. Further, the electronic component is multiplexed and electrically connected to the wiring structure.

前述之電子封裝件及其製法中,該電子結構之邊緣係形成有階梯部。 In the aforementioned electronic package and its manufacturing method, a step portion is formed on the edge of the electronic structure.

前述之電子封裝件及其製法中,該複數導電柱之端面係齊平該包覆層之表面。 In the aforementioned electronic package and its manufacturing method, the end surfaces of the plurality of conductive pillars are flush with the surface of the coating layer.

前述之電子封裝件及其製法中,復包括形成複數導電元件於該線路結構上,且令該複數導電元件電性連接該線路結構。 The aforementioned electronic package and its manufacturing method further include forming a plurality of conductive elements on the circuit structure, and electrically connecting the plurality of conductive elements to the circuit structure.

由上可知,本發明之電子封裝件及其製法中,主要藉由該整版面晶圓體取代傳統無線路之玻璃載板,故相較於習知技術,本發明之製法係免用玻璃載板而可節省材料成本。 It can be seen from the above that in the electronic package and its manufacturing method of the present invention, the full-layout wafer is mainly used to replace the glass carrier of the traditional wireless circuit. Therefore, compared with the conventional technology, the manufacturing method of the present invention eliminates the need for a glass carrier. The board can save material costs.

再者,該電子結構無需形成銲錫凸塊,故可降低該電子封裝件之整體高度,且可有效的縮短電流傳輸路徑,以提升電性表現。 Furthermore, the electronic structure does not require the formation of solder bumps, so the overall height of the electronic package can be reduced, and the current transmission path can be effectively shortened to improve electrical performance.

又,該包覆層係於五個面向封裝該電子結構與該電子元件,使該電子結構之五個面與該電子元件之五個面受到保護,以避免該電子結構與該電子元件於製程中崩壞。 In addition, the coating layer encapsulates the electronic structure and the electronic component on five sides, so that the five sides of the electronic structure and the five sides of the electronic component are protected to prevent the electronic structure and the electronic component from being damaged during the manufacturing process. Medium collapse.

1:封裝結構 1:Package structure

1a:矽中介板 1a: Silicon interposer

1b:電路板 1b: Circuit board

10:矽板體 10:Silicon plate body

101:導電矽穿孔 101:Conductive silicon perforation

11,260:介電層 11,260: dielectric layer

12,241,441:線路層 12,241,441: Line layer

13,15:絕緣保護層 13,15: Insulating protective layer

14,16:銲錫凸塊 14,16:Solder bumps

160:凸塊底下金屬層 160: Metal layer under the bump

17:半導體晶片 17:Semiconductor wafer

171,191:底膠 171,191: Primer

18:封裝材 18:Packaging material

19:封裝基板 19:Package substrate

192:銲球 192: Solder ball

2:電子封裝件 2: Electronic packages

2a:整版面晶圓體 2a:Full-layout wafer

21:電子元件 21:Electronic components

21a:作用面 21a:Action surface

21b:非作用面 21b: Non-active surface

210,310:電極墊 210,310:Electrode pad

211:保護膜 211:Protective film

212:導電體 212: Electrical conductor

23:導電柱 23:Conductive pillar

23a:端面 23a:End face

24,44:佈線結構 24,44: Wiring structure

240:絕緣層 240:Insulation layer

25:包覆層 25: Cladding layer

25a:第一表面 25a: First surface

25b:第二表面 25b: Second surface

26:線路結構 26:Line structure

261:線路重佈層 261: Line redistribution layer

27:導電元件 27:Conductive components

29,49:電子結構 29,49:Electronic structure

290,291,391,490,491:接點 290,291,391,490,491:Contact

32:結合層 32: Bonding layer

411:導電凸塊 411: Conductive bumps

412:金屬柱 412:Metal pillar

42:底膠 42: Bottom glue

49a:晶片本體 49a: Chip body

S:凹槽 S: Groove

R:階梯部 R: step part

t:厚度 t:Thickness

L:切割路徑 L: cutting path

圖1係為習知封裝結構之剖視示意圖。 Figure 1 is a schematic cross-sectional view of a conventional packaging structure.

圖2A至圖2D係為本發明之電子封裝件之製法之剖視示意圖。 2A to 2D are schematic cross-sectional views of the manufacturing method of the electronic package of the present invention.

圖2E係為對應圖2D之另一實施例之剖視示意圖。 FIG. 2E is a schematic cross-sectional view corresponding to another embodiment of FIG. 2D.

圖3A及圖3B係為圖2A之其它配置方式之剖視示意圖。 Figures 3A and 3B are schematic cross-sectional views of other configurations of Figure 2A.

圖4A及圖4B係為本發明之電子封裝件之電子結構之其它態樣之剖視示意圖。 4A and 4B are schematic cross-sectional views of other aspects of the electronic structure of the electronic package of the present invention.

以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。 The following describes the implementation of the present invention through specific embodiments. Those familiar with the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification.

須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如「上」、「一」等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。 It should be noted that the structures, proportions, sizes, etc. shown in the drawings attached to this specification are only used to coordinate with the content disclosed in the specification for the understanding and reading of those familiar with the art, and are not used to limit the implementation of the present invention. Therefore, it has no technical substantive significance. Any structural modifications, changes in proportions, or adjustments in size shall still fall within the scope of this invention without affecting the effects that can be produced and the purposes that can be achieved. The technical content disclosed by the invention must be within the scope that can be covered. At the same time, terms such as "above" and "a" cited in this specification are only used to facilitate the description and are not used to limit the scope of the present invention. Changes or adjustments in their relative relationships will not occur without Substantial changes in the technical content shall also be deemed to be within the scope of the present invention.

圖2A至圖2D係為本發明之電子封裝件2之製法的剖面示意圖。 2A to 2D are schematic cross-sectional views of the manufacturing method of the electronic package 2 of the present invention.

如圖2A所示,提供一整版面晶圓體2a,其包含複數陣列排設之電子結構29,再將至少一電子元件21設於各該電子結構29上,且各該電子結構29上形成有複數導電柱23。接著,於各該電子結構29之間形成凹槽S,且該凹槽S係位於後續切單製程所需之切割路徑L(如圖2C所示)上,亦即,該凹槽S係採預切方式,並未貫穿該整版面晶圓體2a(電子結構29)。 As shown in FIG. 2A , a full-layout wafer 2 a is provided, which includes a plurality of electronic structures 29 arranged in an array. At least one electronic component 21 is provided on each electronic structure 29 , and a pattern formed on each electronic structure 29 is provided. There are a plurality of conductive pillars 23 . Next, a groove S is formed between the electronic structures 29, and the groove S is located on the cutting path L required for the subsequent dicing process (as shown in FIG. 2C). That is, the groove S is formed by The pre-cut method does not penetrate the entire wafer 2a (electronic structure 29).

於本實施例中,該電子結構29係為主動元件,如系統單晶片(System-On-Chip,簡稱SOC)型之半導體晶片,其具有複數非凸塊式接點290,291,且該複數接點290,291未凸出該電子結構29之表面。例如,其中一部分接點290係具有電性功能以電性連接該導電柱23,而另一部分接點291係對應該電子元件21之位置,以依需求具有電性功能或作為虛墊(dummy pad)。 In this embodiment, the electronic structure 29 is an active component, such as a System-On-Chip (SOC) type semiconductor chip, which has a plurality of non-bump contacts 290, 291, and the plurality of contacts 290,291 do not protrude from the surface of the electronic structure 29. For example, some of the contacts 290 have electrical functions to electrically connect the conductive pillars 23 , while the other contacts 291 correspond to the positions of the electronic components 21 to have electrical functions or serve as dummy pads as required. ).

再者,該電子元件21係為主動元件、被動元件或其二者組合等,其中,該主動元件係例如半導體晶片,且該被動元件係例如電阻、電容及電感。於本實施例中,該電子元件21係為半導體晶片,其具有相對之作用面21a與非作用面21b,該電子元件21係以其非作用面21b以直接接觸該電子結構29之方式置放於該電子結構29上,使該作用面21a呈面上(face up)型態,此時,該電子結構29之接點291係作為虛墊,供該非作用面21b散熱,而該作用面21a係具有複數電極墊210與一如鈍化材之保護膜211,其中,該複數電極墊210上係結合並電性連接複數導電體212,如導電線路、銲球之圓球狀、或如銅柱、銲錫凸塊等金屬材之柱狀、或銲線機製作之釘狀(stud)導電件,但不限於此,以令該導電體212位於該保護膜211中。應可理解地,於另一實施例中,如圖3A所示,該電子元件21之非作用面21b亦可藉由一結合層32黏固於該電子結構29上。 Furthermore, the electronic component 21 is an active component, a passive component, or a combination thereof. The active component is, for example, a semiconductor chip, and the passive component is, for example, a resistor, a capacitor, and an inductor. In this embodiment, the electronic component 21 is a semiconductor chip, which has an active surface 21a and a non-active surface 21b facing each other. The electronic component 21 is placed with its non-active surface 21b in direct contact with the electronic structure 29 On the electronic structure 29, the active surface 21a is in a face up state. At this time, the contact 291 of the electronic structure 29 serves as a virtual pad for heat dissipation of the non-active surface 21b, and the active surface 21a It has a plurality of electrode pads 210 and a protective film 211 such as a passivation material. The plurality of electrode pads 210 are combined and electrically connected to a plurality of conductors 212, such as conductive lines, spherical solder balls, or copper pillars. , pillar-shaped metal materials such as solder bumps, or stud-shaped conductive parts made by wire bonding machines, but are not limited to these, so that the conductor 212 is located in the protective film 211 . It should be understood that in another embodiment, as shown in FIG. 3A , the inactive surface 21 b of the electronic component 21 can also be bonded to the electronic structure 29 through a bonding layer 32 .

或者,如圖3B所示,該電子結構29之接點391具有電性功能,且該電子元件21之作用面21a採用面下(face down)型態,使該電子元件21以面對面(face-to-face)的混合式接合(Hybrid bond)方式將該電子元件21之複數電極墊310對應接合於該電子結構29之接點391上並電性連接該接點391。 Alternatively, as shown in FIG. 3B , the contact point 391 of the electronic structure 29 has an electrical function, and the active surface 21 a of the electronic component 21 adopts a face down type, so that the electronic component 21 is face-to-face. A to-face hybrid bonding method connects the plurality of electrode pads 310 of the electronic component 21 to the contacts 391 of the electronic structure 29 and electrically connects the contacts 391 .

應可理解地,有關該電子元件21相對該電子結構29之配置方式繁多,並不限於上述。 It should be understood that there are many ways of arranging the electronic component 21 relative to the electronic structure 29 and are not limited to the above.

於其它實施例中,如圖4A所示,該電子結構49係包含有一晶片本體49a以及一配置於該晶片本體49a上之佈線結構24,該佈線結構24包括至少一絕緣層240、及設於該絕緣層240上之RDL形式之線路層241,且最外層之線路層241配置有複數接點490,491,供設置該電子元件21及該導電柱23,其中,該電子元件21藉由其上之複數如銅柱之金屬柱412並透過如銲錫材料之導電凸塊411以覆 晶方式設於該電子結構49上並電性連接該接點491,且以底膠42包覆該金屬柱412與導電凸塊411。 In other embodiments, as shown in FIG. 4A , the electronic structure 49 includes a chip body 49a and a wiring structure 24 disposed on the chip body 49a. The wiring structure 24 includes at least an insulating layer 240 and is provided on The circuit layer 241 in the form of RDL is on the insulating layer 240, and the outermost circuit layer 241 is equipped with a plurality of contacts 490, 491 for setting the electronic component 21 and the conductive pillar 23, wherein the electronic component 21 is connected by the A plurality of metal pillars 412 such as copper pillars are covered by conductive bumps 411 such as solder material. The crystal is disposed on the electronic structure 49 and electrically connected to the contact 491 , and the metal pillar 412 and the conductive bump 411 are covered with the base glue 42 .

或者,如圖4B所示,該電子結構49之晶片本體49a之局部表面上配置該佈線結構44,且該佈線結構44最外層之線路層441配置有用以設置該複數導電柱23之複數接點490。此時,該電子元件21可依需求以其非作用面21b以直接接觸之方式(或黏固之方式)設於該晶片本體49a上,或如圖4B所示,將該電子元件21之複數電極墊310對應接合於該電子結構49之晶片本體49a的接點391上,並電性連接該接點391。 Alternatively, as shown in FIG. 4B , the wiring structure 44 is disposed on a partial surface of the chip body 49 a of the electronic structure 49 , and the outermost circuit layer 441 of the wiring structure 44 is disposed with a plurality of contacts for setting the plurality of conductive pillars 23 490. At this time, the electronic component 21 can be disposed on the chip body 49a with its inactive surface 21b in direct contact (or bonding) as required, or as shown in FIG. 4B, multiple electronic components 21 can be placed on the chip body 49a. The electrode pad 310 is correspondingly joined to the contact point 391 of the chip body 49a of the electronic structure 49 and is electrically connected to the contact point 391.

又,形成該線路層241,441之材質係為銅,且形成該絕緣層240之材質係為如聚對二唑苯(PBO)、聚醯亞胺(PI)、預浸材(PP)或其它等之介電材。 In addition, the material forming the circuit layers 241 and 441 is copper, and the material forming the insulating layer 240 is such as poly(p-oxadiazobenzene) (PBO), polyimide (PI), prepreg (PP) or others. of dielectric materials.

另外,形成該複數導電柱23之材質係為如銅之金屬材或銲錫材,且該複數導電柱23係設於該些具有電性功能之接點290,490上以電性連接該接點290,490。 In addition, the plurality of conductive pillars 23 are made of a metal material such as copper or a solder material, and the plurality of conductive pillars 23 are disposed on the contacts 290, 490 with electrical functions to electrically connect the contacts 290, 490.

如圖2B所示,接續圖2A或圖3A之製程,形成一包覆層25於該電子結構29上及該凹槽S中,以令該包覆層25包覆該電子元件21與該些導電柱23,其中,該包覆層25係具有相對之第一表面25a與第二表面25b,並使該包覆層25以其第二表面25b結合至該電子結構29上。接著,藉由整平製程,使該包覆層25之第一表面25a齊平該保護膜211之上表面、該導電體212之端面與該導電柱23之端面23a,以令該保護膜211、該導電體212與該導電柱23外露於該包覆層25之第一表面25a。 As shown in FIG. 2B , following the process of FIG. 2A or FIG. 3A , a coating layer 25 is formed on the electronic structure 29 and in the groove S, so that the coating layer 25 covers the electronic components 21 and the electronic components 21 . Conductive pillar 23, wherein the cladding layer 25 has an opposite first surface 25a and a second surface 25b, and the cladding layer 25 is bonded to the electronic structure 29 with its second surface 25b. Then, through a leveling process, the first surface 25a of the coating layer 25 is flush with the upper surface of the protective film 211, the end surface of the conductor 212 and the end surface 23a of the conductive pillar 23, so that the protective film 211 , the conductor 212 and the conductive pillar 23 are exposed on the first surface 25a of the coating layer 25.

於本實施例中,該包覆層25係為絕緣材,如環氧樹脂之封裝膠體,其可用壓合(lamination)或模壓(molding)之方式形成於該電子結構29上。 In this embodiment, the coating layer 25 is an insulating material, such as an epoxy resin encapsulant, which can be formed on the electronic structure 29 by lamination or molding.

再者,該整平製程係藉由研磨方式,移除該導電柱23之部分材質、該保護膜211之部分材質(甚至該導電體212之部分材質)與該包覆層25之部分材質。 Furthermore, the leveling process removes part of the material of the conductive pillar 23, part of the material of the protective film 211 (even part of the material of the conductor 212), and part of the material of the coating layer 25 through grinding.

如圖2C所示,形成一線路結構26於該包覆層25之第一表面25a上,且令該線路結構26電性連接該些導電柱23。 As shown in FIG. 2C , a circuit structure 26 is formed on the first surface 25 a of the coating layer 25 , and the circuit structure 26 is electrically connected to the conductive pillars 23 .

於本實施例中,該線路結構26係包括複數介電層260、及設於該複數介電層260上之複數線路重佈層(RDL)261,且最外層之介電層260可作為防銲層,以令最外層之線路重佈層261部分外露出該防銲層。或者,該線路結構26亦可僅包括單一介電層260及單一線路重佈層261。 In this embodiment, the circuit structure 26 includes a plurality of dielectric layers 260 and a plurality of redistribution layers (RDLs) 261 disposed on the plurality of dielectric layers 260, and the outermost dielectric layer 260 can be used as a protective layer. The solder layer is formed so that the outermost circuit redistribution layer 261 is partially exposed to the solder mask. Alternatively, the circuit structure 26 may only include a single dielectric layer 260 and a single circuit redistribution layer 261 .

再者,形成該線路重佈層261之材質係為銅,且形成該介電層260之材質係為如聚對二唑苯(PBO)、聚醯亞胺(PI)、預浸材(PP)或其它等之介電材。 Furthermore, the material forming the circuit redistribution layer 261 is copper, and the material forming the dielectric layer 260 is such as poly(p-oxadiazobenzene) (PBO), polyimide (PI), prepreg (PP). ) or other dielectric materials.

又,該線路結構26之線路重佈層261係直接電性連接該電子元件21之導電體212。應可理解地,若於圖2B之製程中,接續圖3B、圖4A或圖4B所示之配置方式,則該線路結構26之線路重佈層261不會直接電性連接該電子元件21。 In addition, the circuit redistribution layer 261 of the circuit structure 26 is directly electrically connected to the conductor 212 of the electronic component 21 . It should be understood that if the configuration shown in FIG. 3B, FIG. 4A or FIG. 4B is continued during the manufacturing process of FIG. 2B, the circuit redistribution layer 261 of the circuit structure 26 will not be directly electrically connected to the electronic component 21.

另外,可於最外層之線路重佈層261上形成複數如銲球之導電元件27,以令該複數導電元件27電性連接該複數導電柱23及/或該導電體212。 In addition, a plurality of conductive elements 27 such as solder balls can be formed on the outermost line redistribution layer 261 so that the plurality of conductive elements 27 are electrically connected to the plurality of conductive pillars 23 and/or the conductor 212 .

如圖2D所示,將切割工具(圖未示)對準各該凹槽S,沿如圖2C所示之切割路徑L進行切單製程,以獲取該電子封裝件2。 As shown in FIG. 2D , a cutting tool (not shown) is aligned with each groove S, and a cutting process is performed along the cutting path L as shown in FIG. 2C to obtain the electronic package 2 .

於本實施例中,該電子結構29之邊緣係對應其凹槽S處形成階梯部R。 In this embodiment, a stepped portion R is formed on the edge of the electronic structure 29 corresponding to the groove S thereof.

因此,本發明之製法藉由該整版面晶圓體2a之設計,即晶圓級形式(Wafer form)的電子結構29,49作為載板(carrier),以取代傳統無線路之玻璃載板,故相較於習知技術,本發明之製法係免用玻璃載板而可節省材料成本。 Therefore, the manufacturing method of the present invention uses the design of the full-layout wafer 2a, that is, the electronic structures 29, 49 in wafer form as a carrier to replace the glass carrier of the traditional wireless circuit. Therefore, compared with the conventional technology, the manufacturing method of the present invention eliminates the need for a glass carrier and can save material costs.

再者,該電子結構29,49無需設置習知之銲錫凸塊,故可降低該電子封裝件2之整體高度,且可有效的縮短電流傳輸路徑,以提升電性表現。 Furthermore, the electronic structures 29 and 49 do not need to be provided with conventional solder bumps, so the overall height of the electronic package 2 can be reduced, and the current transmission path can be effectively shortened to improve electrical performance.

又,該包覆層25係於五個面向封裝該電子結構29,49與該電子元件21,使該電子結構29,49之五個面與該電子元件21之五個面受到保護,以避免該電子結構29,49與該電子元件21於製程中崩壞。進一步,可於後續製程中,研磨該電子結構29,49之外露面(如圖2D之底面),使該電子結構29(或晶片本體49a)之厚度t可小於50微米(um),如圖2E所示,且於研磨過程中,因該電子結構29之各側面均具有該包覆層25之保護,故即使將該電子結構29,49研磨至極薄之情況下仍不會發生崩裂,因而有利於該電子封裝件2之整體薄化需求。 In addition, the coating layer 25 encapsulates the electronic structure 29, 49 and the electronic component 21 on five sides, so that the five sides of the electronic structure 29, 49 and the five sides of the electronic component 21 are protected to avoid The electronic structures 29, 49 and the electronic component 21 are damaged during the manufacturing process. Furthermore, in subsequent processes, the electronic structures 29 and 49 can be polished to expose the exposed surfaces (the bottom surface of Figure 2D), so that the thickness t of the electronic structure 29 (or the chip body 49a) can be less than 50 microns (um), as shown in Figure As shown in 2E, during the grinding process, because each side of the electronic structure 29 is protected by the coating layer 25, even if the electronic structure 29, 49 is ground to an extremely thin state, it will not crack. Therefore, It is beneficial to the overall thinning requirement of the electronic package 2 .

本發明復提供一種電子封裝件2,係包括:一電子結構29,49、一電子元件21、複數導電柱23、一包覆層25以及線路結構26。 The invention further provides an electronic package 2, which includes: an electronic structure 29, 49, an electronic component 21, a plurality of conductive pillars 23, a coating layer 25 and a circuit structure 26.

所述之電子結構29,49係具有複數接點290,291,391,490,491,且該複數接點290,291,391,490,491未凸出該電子結構29,49之表面。 The electronic structure 29, 49 has a plurality of contacts 290, 291, 391, 490, 491, and the plurality of contacts 290, 291, 391, 490, 491 does not protrude from the surface of the electronic structure 29, 49.

所述之電子元件21係疊設於該電子結構29,49上。 The electronic components 21 are stacked on the electronic structures 29, 49.

所述之複數導電柱23係設於該電子結構29,49上,以電性連接該電子結構29,49之複數接點290,490。 The plurality of conductive pillars 23 are disposed on the electronic structures 29 and 49 to electrically connect the plurality of contacts 290 and 490 of the electronic structures 29 and 49.

所述之包覆層25係形成於該電子結構29,49上,以包覆該電子元件21與該複數導電柱23。 The coating layer 25 is formed on the electronic structures 29 and 49 to cover the electronic component 21 and the plurality of conductive pillars 23 .

所述之線路結構26係設於該包覆層25上,以電性連接該複數導電柱23。 The circuit structure 26 is provided on the coating layer 25 to electrically connect the plurality of conductive pillars 23 .

於一實施例中,該電子元件21係接觸該電子結構29之表面。 In one embodiment, the electronic component 21 contacts the surface of the electronic structure 29 .

於一實施例中,該電子元件21係藉由結合層32黏固於該電子結構29上。 In one embodiment, the electronic component 21 is bonded to the electronic structure 29 through a bonding layer 32 .

於一實施例中,該電子元件21係電性連接該線路結構26。 In one embodiment, the electronic component 21 is electrically connected to the circuit structure 26 .

於一實施例中,該電子元件21係具有複數電極墊310,以令該電子元件21以混合式接合方式將該複數電極墊310對應接合於該電子結構29之接點391上並電性連接該接點391。 In one embodiment, the electronic component 21 has a plurality of electrode pads 310, so that the electronic component 21 connects the plurality of electrode pads 310 to the contacts 391 of the electronic structure 29 in a hybrid bonding manner and electrically connects them. The contact 391.

於一實施例中,該電子結構49係配置有佈線結構24,44,以接置及電性連接該導電柱23。例如,該佈線結構24上復接置及電性連接該電子元件21。 In one embodiment, the electronic structure 49 is configured with wiring structures 24, 44 to connect and electrically connect the conductive pillars 23. For example, the electronic component 21 is multiplexed and electrically connected to the wiring structure 24 .

於一實施例中,該電子結構29之邊緣係形成有階梯部R。 In one embodiment, a step portion R is formed on the edge of the electronic structure 29 .

於一實施例中,該導電柱23之端面23a係齊平該包覆層25之第一表面25a。 In one embodiment, the end surface 23a of the conductive pillar 23 is flush with the first surface 25a of the coating layer 25.

於一實施例中,所述之電子封裝件2復包括形成於該線路結構26上之複數導電元件27,且令該複數導電元件27電性連接該線路結構26。 In one embodiment, the electronic package 2 further includes a plurality of conductive elements 27 formed on the circuit structure 26, and the plurality of conductive elements 27 are electrically connected to the circuit structure 26.

綜上所述,本發明之電子封裝件及其製法,係藉由該整版面晶圓體取代傳統無線路之玻璃載板,故本發明之製法能有效節省材料成本。 In summary, the electronic package and its manufacturing method of the present invention use the full-surface wafer to replace the glass carrier of the traditional wireless circuit. Therefore, the manufacturing method of the present invention can effectively save material costs.

再者,該電子結構無需形成銲錫凸塊,因而能降低該電子封裝件之整體高度,且能有效的縮短電流傳輸路徑,以提升電性表現。 Furthermore, the electronic structure does not require the formation of solder bumps, thereby reducing the overall height of the electronic package and effectively shortening the current transmission path to improve electrical performance.

又,該包覆層係於五個面向進行封裝該電子結構與該電子元件,使該電子結構之五個面與該電子元件之五個面受到保護,以避免該電子結構與該電子元件於製程中崩壞。 In addition, the coating layer encapsulates the electronic structure and the electronic component on five sides, so that the five sides of the electronic structure and the five sides of the electronic component are protected to prevent the electronic structure and the electronic component from interfering with each other. Broken during the manufacturing process.

上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above embodiments are used to illustrate the principles and effects of the present invention, but are not intended to limit the present invention. Anyone skilled in the art can make modifications to the above embodiments without departing from the spirit and scope of the invention. Therefore, the scope of rights protection of the present invention should be as listed in the patent application scope described below.

2:電子封裝件 2: Electronic packages

21:電子元件 21:Electronic components

23:導電柱 23:Conductive pillar

25:包覆層 25: Cladding layer

26:線路結構 26:Line structure

27:導電元件 27:Conductive components

29:電子結構 29: Electronic structure

290,291:接點 290,291: Contact

R:階梯部 R: step part

Claims (20)

一種電子封裝件,係包括: An electronic package including: 電子結構,係具有複數接點,且該複數接點未凸出該電子結構之表面; The electronic structure has a plurality of contacts, and the plurality of contacts do not protrude from the surface of the electronic structure; 電子元件,係疊設於該電子結構上; Electronic components are stacked on the electronic structure; 複數導電柱,係設於該電子結構上,以電性連接該電子結構之複數接點; A plurality of conductive pillars are provided on the electronic structure to electrically connect a plurality of contacts of the electronic structure; 包覆層,係形成於該電子結構上,以包覆該電子元件與複數導電柱;以及 A coating layer is formed on the electronic structure to cover the electronic component and the plurality of conductive pillars; and 線路結構,係設於該包覆層上,以電性連接該複數導電柱。 The circuit structure is provided on the coating layer to electrically connect the plurality of conductive pillars. 如請求項1所述之電子封裝件,其中,該電子元件係接觸該電子結構之表面。 The electronic package of claim 1, wherein the electronic component contacts the surface of the electronic structure. 如請求項1所述之電子封裝件,其中,該電子元件係藉由結合層黏固於該電子結構上。 The electronic package of claim 1, wherein the electronic component is bonded to the electronic structure through a bonding layer. 如請求項1~3任一者所述之電子封裝件,其中,該電子元件係電性連接該線路結構。 The electronic package as described in any one of claims 1 to 3, wherein the electronic component is electrically connected to the circuit structure. 如請求項1所述之電子封裝件,其中,該電子元件係具有複數電極墊,且令該電子元件以該複數電極墊對應接合並電性連接於該電子結構之複數接點。 The electronic package of claim 1, wherein the electronic component has a plurality of electrode pads, and the electronic component is correspondingly joined and electrically connected to a plurality of contacts of the electronic structure using the plurality of electrode pads. 如請求項1所述之電子封裝件,其中,該電子結構係配置有佈線結構,以供接置及電性連接該複數導電柱。 The electronic package as claimed in claim 1, wherein the electronic structure is configured with a wiring structure for connecting and electrically connecting the plurality of conductive pillars. 如請求項6所述之電子封裝件,其中,該電子元件係設置並電性連接於該佈線結構上。 The electronic package of claim 6, wherein the electronic component is disposed and electrically connected to the wiring structure. 如請求項1所述之電子封裝件,其中,該電子結構之邊緣係形成有階梯部。 The electronic package of claim 1, wherein a step portion is formed on an edge of the electronic structure. 如請求項1所述之電子封裝件,其中,該複數導電柱之端面係齊平該包覆層之表面。 The electronic package as claimed in claim 1, wherein the end surfaces of the plurality of conductive pillars are flush with the surface of the coating layer. 如請求項1所述之電子封裝件,復包括形成於該線路結構上之複數導電元件,且令該複數導電元件電性連接該線路結構。 The electronic package of claim 1 further includes a plurality of conductive elements formed on the circuit structure, and the plurality of conductive elements are electrically connected to the circuit structure. 一種電子封裝件之製法,係包括: A method for manufacturing electronic packages includes: 提供一整版面晶圓體,其包含複數陣列排設之電子結構,且各該電子結構係具有複數接點; Provide a full layout wafer body, which contains a plurality of electronic structures arranged in an array, and each of the electronic structures has a plurality of contacts; 將一電子元件設於各該電子結構上,並於各該電子結構上形成電性連接該複數接點之複數導電柱; Arrange an electronic component on each of the electronic structures, and form a plurality of conductive pillars on each of the electronic structures that are electrically connected to the plurality of contacts; 於各該電子結構之間形成凹槽,其中,各該凹槽未貫穿各該電子結構; Forming grooves between the electronic structures, wherein each groove does not penetrate the electronic structures; 形成包覆層於該整版面晶圓體上,以令該包覆層包覆該電子元件與該複數導電柱; Forming a cladding layer on the full-layout wafer body so that the cladding layer covers the electronic component and the plurality of conductive pillars; 形成線路結構於該包覆層上,以令該線路結構電性連接該複數導電柱;以及 Forming a circuit structure on the cladding layer so that the circuit structure is electrically connected to the plurality of conductive pillars; and 沿該凹槽進行切單製程。 The cutting process is carried out along this groove. 如請求項11所述之電子封裝件之製法,其中,該電子元件係接觸該電子結構之表面。 The method for manufacturing an electronic package as claimed in claim 11, wherein the electronic component is in contact with the surface of the electronic structure. 如請求項11所述之電子封裝件之製法,其中,該電子元件係藉由結合層黏固於該電子結構上。 The method for manufacturing an electronic package as claimed in claim 11, wherein the electronic component is bonded to the electronic structure through a bonding layer. 如請求項11~13任一者所述之電子封裝件之製法,其中,該電子元件係電性連接該線路結構。 The method for manufacturing an electronic package as described in any one of claims 11 to 13, wherein the electronic component is electrically connected to the circuit structure. 如請求項11所述之電子封裝件之製法,其中,該電子元件係具有複數電極墊,且令該電子元件以該複數電極墊對應接合並電性連接於該電子結構之複數接點上。 The method of manufacturing an electronic package as claimed in claim 11, wherein the electronic component has a plurality of electrode pads, and the electronic component is correspondingly joined and electrically connected to a plurality of contacts of the electronic structure using the plurality of electrode pads. 如請求項11所述之電子封裝件之製法,其中,該電子結構係配置有佈線結構,以供接置及電性連接該複數導電柱。 The method of manufacturing an electronic package as claimed in claim 11, wherein the electronic structure is configured with a wiring structure for connecting and electrically connecting the plurality of conductive pillars. 如請求項16所述之電子封裝件之製法,其中,該電子元件係設置並電性連接於該佈線結構上。 The method of manufacturing an electronic package as claimed in claim 16, wherein the electronic component is disposed and electrically connected to the wiring structure. 如請求項11所述之電子封裝件之製法,其中,該電子結構之邊緣係形成有階梯部。 The method of manufacturing an electronic package as claimed in claim 11, wherein a step portion is formed on an edge of the electronic structure. 如請求項11所述之電子封裝件之製法,其中,該複數導電柱之端面係齊平該包覆層之表面。 The method for manufacturing an electronic package as claimed in claim 11, wherein the end surfaces of the plurality of conductive pillars are flush with the surface of the coating layer. 如請求項11所述之電子封裝件之製法,復包括形成複數導電元件於該線路結構上,且令該複數導電元件電性連接該線路結構。 The method of manufacturing an electronic package as claimed in claim 11 further includes forming a plurality of conductive elements on the circuit structure, and electrically connecting the plurality of conductive elements to the circuit structure.
TW111109618A 2022-03-16 2022-03-16 Electronic package and manufacturing method thereof TWI790945B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW111109618A TWI790945B (en) 2022-03-16 2022-03-16 Electronic package and manufacturing method thereof
CN202210320552.5A CN116798962A (en) 2022-03-16 2022-03-29 Electronic package and method for manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW111109618A TWI790945B (en) 2022-03-16 2022-03-16 Electronic package and manufacturing method thereof

Publications (2)

Publication Number Publication Date
TWI790945B TWI790945B (en) 2023-01-21
TW202339130A true TW202339130A (en) 2023-10-01

Family

ID=86670342

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111109618A TWI790945B (en) 2022-03-16 2022-03-16 Electronic package and manufacturing method thereof

Country Status (2)

Country Link
CN (1) CN116798962A (en)
TW (1) TWI790945B (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8138014B2 (en) * 2010-01-29 2012-03-20 Stats Chippac, Ltd. Method of forming thin profile WLCSP with vertical interconnect over package footprint
US9818734B2 (en) * 2012-09-14 2017-11-14 STATS ChipPAC Pte. Ltd. Semiconductor device and method of forming build-up interconnect structures over a temporary substrate

Also Published As

Publication number Publication date
TWI790945B (en) 2023-01-21
CN116798962A (en) 2023-09-22

Similar Documents

Publication Publication Date Title
US10867897B2 (en) PoP device
TWI698966B (en) Electronic package and manufacturing method thereof
KR20170034758A (en) Integrated fan-out package and the methods of manufacturing
TW201926588A (en) Electronic package and method of manufacture
TW201436161A (en) Semiconductor package and method of manufacture
TWI733569B (en) Electronic package and manufacturing method thereof
TWI728936B (en) Electronic packaging and manufacturing method thereof
TWI774597B (en) Electronic package and manufacturing method thereof
TWI746310B (en) Electronic package and manufacturing method thereof
TWI772816B (en) Electronic package and manufacturing method thereof
TWI802726B (en) Carrying substrate, electronic package having the carrying substrate, and methods for manufacturing the same
TWI790945B (en) Electronic package and manufacturing method thereof
TWI753561B (en) Electronic package and manufacturing method thereof
TWI807420B (en) Electronic device and manufacturing method thereof
TWI804411B (en) Electronic package and manufacturing method thereof
TWI778406B (en) Electronic package and manufacturing method thereof
TWI807827B (en) Electronic packaging and manufacturing method thereof
US20230378072A1 (en) Electronic package and manufacturing method thereof
TWI738525B (en) Electronic package and manufacturing method thereof
TWI827335B (en) Electronic package and manufacturing method thereof
US20230268262A1 (en) Electronic package and manufacturing method thereof
TW202407955A (en) Electronic package and manufacturing method thereof
TW202303900A (en) Semiconductor package and its manufacturing method
TW202343717A (en) Electronic package
TW202247362A (en) Electronic package and manufacturing method thereof