TW202324517A - Workbench cleaning device, and cutting and sorting equipment and method for semiconductor package body characterized by having no loss of tact time while the equipment running - Google Patents
Workbench cleaning device, and cutting and sorting equipment and method for semiconductor package body characterized by having no loss of tact time while the equipment running Download PDFInfo
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- 238000004140 cleaning Methods 0.000 title claims abstract description 172
- 239000004065 semiconductor Substances 0.000 title claims abstract description 170
- 238000005520 cutting process Methods 0.000 title claims abstract description 88
- 238000000034 method Methods 0.000 title claims abstract description 35
- 238000007689 inspection Methods 0.000 claims description 45
- 238000002347 injection Methods 0.000 claims description 36
- 239000007924 injection Substances 0.000 claims description 36
- 238000012546 transfer Methods 0.000 claims description 19
- 238000005507 spraying Methods 0.000 claims description 16
- 238000005406 washing Methods 0.000 claims description 2
- 239000007921 spray Substances 0.000 description 19
- 238000011109 contamination Methods 0.000 description 9
- 238000012545 processing Methods 0.000 description 7
- 208000037516 chromosome inversion disease Diseases 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 239000005038 ethylene vinyl acetate Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 230000032258 transport Effects 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000010981 drying operation Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
- B26D7/00—Details of apparatus for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting
- B26D7/08—Means for treating work or cutting member to facilitate cutting
- B26D7/088—Means for treating work or cutting member to facilitate cutting by cleaning or lubricating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/12—Brushes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67271—Sorting devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
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Abstract
Description
本發明涉及工作台清洗裝置和具備其的半導體封裝體切割及分類設備以及利用其的半導體封裝體切割分類方法。The present invention relates to a table cleaning device, a semiconductor package cutting and sorting device equipped with the same, and a semiconductor package cutting and sorting method using the same.
半導體製造工藝作爲用於在晶圓上製造半導體元件的工藝,例如包括曝光、蒸鍍、蝕刻、離子注入、清洗等。半導體封裝體切割以及分類裝備將配置有多個封裝體的料帶以封裝體單位切割來單個化,通過對各封裝體的清洗、乾燥、檢查而區分正常或者次品狀態,從而分別分類並承載到最終的收納容器即托盤。The semiconductor manufacturing process includes, for example, exposure, vapor deposition, etching, ion implantation, cleaning, and the like as a process for manufacturing a semiconductor element on a wafer. Semiconductor package cutting and sorting equipment separates tapes with multiple packages into individual packages, and separates and loads them by cleaning, drying, and inspecting each package to distinguish between normal and defective. To the final storage container is the tray.
由於切割時使用的水或者切割産生的顆粒,在封裝體處理區域中對支承封裝體的工作台工具(tool)頻繁發生污染。對工作台工具的污染可能影響對各封裝體的視訊檢查,可能帶來封裝體內污染而引發封裝體品質問題。Contamination of bench tools supporting packages occurs frequently in the package handling area due to water used in cutting or particles generated by cutting. Contamination of workbench tools may affect the video inspection of each package, which may cause contamination in the package and cause quality problems of the package.
因此,若對工作台工具發生污染,則執行工作台工具的清洗工藝,目前的工作台工具的清洗工藝需要由作業者從裝備分離工作台工具而直接清洗後再設置,在清洗工作台工具的期間,中斷設備運行而存在生産性下降的問題。Therefore, if the workbench tool is polluted, the cleaning process of the workbench tool is performed. The current cleaning process of the workbench tool needs to be set up after the operator separates the workbench tool from the equipment and directly cleans it. During this period, there is a problem that the productivity of the machine is interrupted due to the interruption of the operation of the equipment.
因此,本發明的實施例的目的在於提供具備將工作台部件的清洗工藝自動化而能够提高作業者的便利性的清洗裝置的半導體封裝體切割及分類設備。Therefore, an object of an embodiment of the present invention is to provide semiconductor package dicing and sorting equipment including a cleaning device that automates a cleaning process of table members to improve operator convenience.
另外,目的在於提供具備在設備運行狀態下清洗工作台部件而沒有節拍時間(tact time)損失的清洗裝置的半導體封裝體切割及分類設備。Another object is to provide semiconductor package dicing and sorting equipment provided with a cleaning device that cleans table components without loss of tact time while the equipment is in operation.
本發明的解决課題不限於以上提及的課題,本領域技術人員能够從下面的記載明確地理解未提及的其它解决課題。The problems to be solved by the present invention are not limited to the above-mentioned problems, and those skilled in the art can clearly understand other unmentioned problems from the following description.
根據本發明的一實施例,可以提供一種工作台清洗裝置,包括:毛刷單元,能够在支承半導體封裝體的工作台上在水平方向上移動;第一驅動部,使所述毛刷單元在垂直方向上移動;以及空氣噴射部,能够與所述毛刷單元一起移動。According to an embodiment of the present invention, a workbench cleaning device may be provided, including: a brush unit capable of moving horizontally on a workbench supporting semiconductor packages; moving in the vertical direction; and an air injection part capable of moving together with the brush unit.
在一實施例中,可以是,所述工作台清洗裝置安裝在將單個化的所述半導體封裝體拾取並在第一方向上傳送的單元拾取器中而在所述工作台部件上移動。In one embodiment, the stage cleaning device may be mounted on a unit picker that picks up and transports the singulated semiconductor packages in the first direction and moves on the stage member.
在一實施例中,可以是,所述工作台清洗裝置是所述單元拾取器、所述毛刷單元、所述空氣噴射部沿著所述第一方向呈一列配置。In an embodiment, the workbench cleaning device may be that the unit picker, the brush unit, and the air injection part are arranged in a row along the first direction.
在一實施例中,可以是,所述毛刷單元和所述空氣噴射部中的至少一個與所述單元拾取器連接。In an embodiment, at least one of the brush unit and the air injection part may be connected to the unit picker.
在一實施例中,可以是,所述工作台清洗裝置還包括第二空氣噴射部。In an embodiment, it may be that the workbench cleaning device further includes a second air injection part.
在一實施例中,可以是,所述第二空氣噴射部配置成所述單元拾取器和所述毛刷單元位於所述第二空氣噴射部和所述空氣噴射部之間的空間。In an embodiment, the second air injection part may be configured such that the unit picker and the brush unit are located in a space between the second air injection part and the air injection part.
在一實施例中,可以是,所述工作台清洗裝置還包括用於使所述空氣噴射部垂直移動的第二驅動部。In one embodiment, the table cleaning device may further include a second drive unit for vertically moving the air jetting unit.
在一實施例中,可以是,獨立地控制所述第一驅動部和所述第二驅動部的驅動。In an embodiment, the driving of the first driving part and the driving of the second driving part may be independently controlled.
在一實施例中,可以是,所述工作台部件包括:卡盤台,在切割區域中支承所述半導體封裝體;逆轉台,在檢查區域中支承所述半導體封裝體;以及托板台,在分類區域中支承所述半導體封裝體。In an embodiment, the work table part may include: a chuck table supporting the semiconductor package in the cutting area; a reverse table supporting the semiconductor package in the inspection area; and a pallet table, The semiconductor packages are supported in a sorting area.
根據本發明的一實施例,可以提供一種半導體封裝體切割及分類設備,包括:裝載模組,對配置有多個半導體封裝體的半導體料帶進行承載;切割模組,包括切割區域,並將所述半導體料帶切割而單個化成多個所述半導體封裝體;分類模組,包括檢查區域和分類區域,並對單個化的所述半導體封裝體進行檢查並根據檢查結果進行分類;單元拾取器,將所述半導體封裝體吸附而從所述切割區域的卡盤台經由所述檢查區域的逆轉台傳送到所述分類模組的托板台;以及工作台清洗裝置,清洗包括所述卡盤台、所述逆轉台和所述托板台的工作台部件,所述工作台清洗裝置包括:毛刷單元,能够在支承所述半導體封裝體的工作台上在水平方向上移動;第一驅動部,使所述毛刷單元在垂直方向上移動;以及空氣噴射部,能够與所述毛刷單元一起移動。According to an embodiment of the present invention, a semiconductor package cutting and sorting device may be provided, including: a loading module for carrying semiconductor strips configured with a plurality of semiconductor packages; a cutting module including a cutting area, and The semiconductor strip is cut and singulated into a plurality of semiconductor packages; the classification module includes an inspection area and a classification area, and inspects the individualized semiconductor packages and classifies them according to the inspection results; a unit picker , absorbing the semiconductor package and transferring it from the chuck table in the cutting area to the pallet table of the sorting module via the reverse table in the inspection area; and a workbench cleaning device, cleaning the chuck including the The table, the reversing table, and the table parts of the pallet table, the table cleaning device includes: a brush unit that can move in the horizontal direction on the table supporting the semiconductor package; the first drive a part that moves the brush unit in a vertical direction; and an air injection part that can move together with the brush unit.
在一實施例中,可以是,所述工作台清洗裝置設置於所述單元拾取器。In an embodiment, it may be that the workbench cleaning device is arranged on the unit picker.
在一實施例中,可以是,所述半導體封裝體切割及分類設備還包括:控制部,用於使所述工作台清洗裝置每隔一定時間工作。In an embodiment, the semiconductor package cutting and sorting equipment may further include: a control unit configured to make the table cleaning device work at regular intervals.
在一實施例中,可以是,所述工作台清洗裝置還包括:第二驅動部,用於使所述空氣噴射部垂直移動,獨立地控制所述第一驅動部和所述第二驅動部的驅動。In an embodiment, the workbench cleaning device may further include: a second driving part, used to vertically move the air injection part, and independently control the first driving part and the second driving part drive.
根據本發明的一實施例,可以提供一種半導體封裝體切割及分類方法,包括:裝載步驟,被供應配置有多個半導體封裝體的半導體料帶;切割步驟,切割供應的所述半導體料帶;檢查步驟,對通過所述切割步驟單個化的所述半導體封裝體進行檢查;分類步驟,根據所述檢查步驟的結果而分類所述半導體封裝體;以及工作台部件清洗步驟,用包括毛刷單元和空氣噴射部的工作台清洗裝置清洗工作台部件。According to an embodiment of the present invention, a semiconductor package cutting and sorting method may be provided, comprising: a loading step, a semiconductor strip configured with a plurality of semiconductor packages is supplied; a cutting step, cutting the supplied semiconductor strip; an inspection step of inspecting the semiconductor packages singulated by the cutting step; a sorting step of sorting the semiconductor packages according to a result of the inspection step; And the table cleaning device of the air jet department cleans the table parts.
在一實施例中,可以是,所述工作台部件清洗步驟包括:使所述工作台清洗裝置位於清洗對象工作台部件上方的步驟;使所述工作台清洗裝置朝向所述工作台部件下降的步驟;清洗所述工作台部件的步驟;以及使所述工作台清洗裝置從所述工作台部件上升的步驟。In an embodiment, the step of cleaning the workbench parts may include: positioning the workbench cleaning device above the workbench part to be cleaned; lowering the workbench cleaning device toward the workbench parts steps; the step of cleaning said table part; and the step of raising said table cleaning device from said table part.
在一實施例中,可以是,所述工作台部件清洗步驟分別包括在所述切割步驟、所述檢查步驟以及所述分類步驟中。In an embodiment, the cleaning step of the table components may be included in the cutting step, the checking step and the sorting step respectively.
在一實施例中,可以是,所述工作台部件清洗步驟能够與所述切割步驟、所述檢查步驟、所述分類步驟中的一個步驟同時進行。In an embodiment, the step of cleaning the workbench parts can be performed simultaneously with one of the cutting step, the checking step, and the sorting step.
在一實施例中,可以是,當所述工作台部件清洗步驟包括在所述切割步驟中時,所述清洗對象工作台部件是在切割區域中支承所述半導體封裝體的卡盤台。In one embodiment, when the stage member cleaning step is included in the cutting step, the stage member to be cleaned may be a chuck table supporting the semiconductor package in a cutting area.
在一實施例中,可以是,當所述工作台部件清洗步驟包括在所述檢查步驟中時,所述清洗對象工作台部件是在檢查區域中支承所述半導體封裝體的逆轉台。In one embodiment, when the stage member cleaning step is included in the inspection step, the stage member to be cleaned may be a reverse stage supporting the semiconductor package in an inspection area.
在一實施例中,可以是,當所述工作台部件清洗步驟包括在所述分類步驟中時,所述清洗對象工作台部件是在分類區域中支承所述半導體封裝體的托板台。In one embodiment, when the stage member cleaning step is included in the sorting step, the stage member to be cleaned may be a pallet supporting the semiconductor package in a sorting area.
根據本發明的實施例,在單元拾取器設置能够在垂直方向(Z軸方向)上移動的清洗裝置並設定清洗周期,從而能够自動清洗用於封裝體傳送的工作台工具,能够防止工作台工具污染引起的封裝體污染發生及其帶來的品質下降。According to an embodiment of the present invention, a cleaning device capable of moving in the vertical direction (Z-axis direction) is provided on the unit picker and the cleaning cycle is set, so that the table tool used for package transfer can be automatically cleaned, and the table tool can be prevented from The occurrence of package contamination caused by contamination and the resulting quality degradation.
另外,根據本發明的實施例,省略將工作台工具從設備分離並再組裝的時間,不中斷設備運行來清洗待機狀態的工作台工具,從而能够防止節拍時間損失並縮短作業時間而提高生産性(UPH)。In addition, according to the embodiment of the present invention, the time for separating and reassembling the table tool from the equipment is omitted, and the table tool in the standby state is cleaned without interrupting the operation of the equipment, thereby preventing the loss of tact time and shortening the working time to improve productivity. (UPH).
本發明的效果不限於以上提及的效果,本領域技術人員能够從下面的記載明確地理解未提及的其它效果。The effects of the present invention are not limited to the effects mentioned above, and those skilled in the art can clearly understand other effects not mentioned from the following description.
以下,參照附圖來詳細說明本發明的實施例,以使得本發明所屬技術領域中具有通常知識的人能够容易地實施。本發明可以以各種不同方式實現,不限於在此說明的實施例。Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those having ordinary knowledge in the technical field to which the present invention pertains can easily implement. The present invention can be implemented in various ways and is not limited to the embodiments described here.
爲了清楚地說明本發明,省略了與說明無關的部分,貫穿說明書整體對相同或類似的構成要件標注相同的附圖標記。In order to clearly describe the present invention, parts irrelevant to the description are omitted, and the same reference numerals are attached to the same or similar constituent elements throughout the entire specification.
另外,在多個實施例中,對具有相同結構的構成要件,使用相同的附圖標記來僅說明代表性實施例,在其餘的其它實施例中僅說明與代表性實施例不同的結構。In addition, among the plurality of embodiments, only representative embodiments will be described by using the same reference numerals for components having the same configuration, and only configurations different from the representative embodiments will be described in the remaining other embodiments.
在說明書整體中,當表述某部分與其它部分“連接(或者結合)”時,其不僅是“直接連接(或者結合)”的情况,還包括將其它部件置於中間“間接連接(或者結合)”的情况。另外,當表述某部分“包括”某構成要件時,只要沒有特別相反記載,其意指可以還包括其它構成要件而不是排除其它構成要件。Throughout the specification, when it is expressed that a certain part is "connected (or combined)" with other parts, it is not only the case of "directly connected (or combined)", but also "indirectly connected (or combined)" with other parts interposed. "Case. In addition, when it is stated that a certain part "includes" a certain constituent element, as long as there is no special contrary statement, it means that other constituent elements may also be included rather than excluded.
只要沒有不同地定義,包括技術或科學術語在內在此使用的所有術語具有與本發明所屬技術領域中具有通常知識的人一般所理解的含義相同的含義。在通常使用的詞典中定義的術語之類的術語應解釋爲具有與相關技術文脈上具有的含義一致的含義,只要在本申請中沒有明確定義,就不會理想性或過度地解釋爲形式性含義。Unless defined differently, all terms used herein including technical or scientific terms have the same meaning as generally understood by a person having ordinary knowledge in the technical field to which the present invention pertains. Terms such as terms defined in commonly used dictionaries should be interpreted as having meanings consistent with the meanings they have in the relevant technical context, and as long as they are not clearly defined in this application, they will not be ideally or excessively interpreted as formal meaning.
根據本發明的實施例的半導體封裝體切割及分類設備10可以包括對半導體料帶S執行切割作業的切割區域、對切割並單個化的半導體封裝體P執行檢查作業的檢查區域、對檢查後的半導體封裝體P進行分類的分類區域。The semiconductor package cutting and sorting
根據本發明的工作台清洗裝置可以用於在對半導體封裝體P執行處理的處理區域中對支承半導體封裝體P的工作台部件進行清洗。例如,工作台部件可以包括卡盤台、逆轉台、托板台等半導體封裝體切割及分類設備(鋸切分類器)的各種工作台。The table cleaning apparatus according to the present invention may be used to clean a table member supporting the semiconductor package P in a processing area where processing is performed on the semiconductor package P. Referring to FIG. For example, the table components may include various tables of semiconductor package cutting and sorting equipment (saw sorter) such as a chuck table, a reversing table, and a pallet table.
圖1示出根據本發明的實施例的半導體封裝體切割及分類設備10的概要構造。FIG. 1 shows a schematic configuration of a semiconductor package cutting and sorting
參照圖1,根據本發明的實施例的半導體封裝體切割及分類設備10包括支承配置有多個封裝體的半導體料帶S的裝載模組100、對將半導體料帶S切割而單個化的封裝體P進行傳送的切割模組200、檢查封裝體P並收納到托盤的分類模組300以及在各處理區域中清洗被安放封裝體P的工作台部件的工作台清洗裝置(工作台清洗單元)400。Referring to FIG. 1 , a semiconductor package cutting and sorting
裝載模組100將從外部裝載的半導體料帶S傳遞到切割模組200。雖在圖1中未詳細示出,裝載模組100可以包括承載半導體料帶S的料盒以及將半導體料帶S推動傳遞的推杆。The
料帶拾取器210可以從裝載模組100拾取半導體料帶S而將其傳送到卡盤台220。料帶拾取器210可以爲了拾取半導體料帶S而下降,可以爲了將半導體料帶S拾取後移動而升降。料帶拾取器210可以到達卡盤台220的位置後下降而將半導體料帶S放置於卡盤台。The
卡盤台220可以使半導體料帶S和封裝體P在料帶拾取器210和切割機230之間以及切割機230和單元拾取器240之間分別傳送。卡盤台220可以包括第一卡盤台222和第二卡盤台224。卡盤台220可以在Y軸方向上移動,可以以Z軸方向爲中心旋轉,可以被安放通過料帶拾取器210傳送的半導體料帶S。卡盤台220可以將通過料帶拾取器210傳送的半導體料帶S吸附並傳送到切割機230。另外,卡盤台220可以將通過切割機230完成切割的多個封裝體P傳遞到單元拾取器240。當將執行切割作業的切割機230的下方區域稱爲切割區域時,卡盤台220可以在切割區域和單元拾取器240的下方區域之間往返移動。此時,第一卡盤台222和第二卡盤台224的移動可以獨立地控制。在切割區域中通過切割機230單個化的半導體封裝體P可以通過單元拾取器240拾取並傳送。The chuck table 220 may transfer the semiconductor strip S and the package P between the
單元拾取器240可以將通過切割機230切割後通過卡盤台220傳送的半導體封裝體P以真空吸附方式把持而在第一方向上傳送。在此,第一方向指在圖1中裝載模組100、切割模組200、分類模組300一字排開配置的X軸方向。導架250提供用於單元拾取器240在X軸方向上移動的路徑。單元拾取器240可以沿著導架250從卡盤台220向逆轉台310傳送半導體封裝體P。單元拾取器240可以具備用於將半導體封裝體P真空吸附的多個真空孔(未圖示),可以通過拾取器驅動部(未圖示)在垂直以及水平方向上移動。單元拾取器240可以包括後述的工作台清洗單元400,拾取器驅動部(未圖示)可以通過使單元拾取器240在垂直方向上移動而使得包括在工作台清洗單元400中的毛刷單元410接觸於工作台部件T,並使單元拾取器240在水平方向上往返移動而從工作台部件T去除污染物質等異物。作爲一例,可以是,拾取器驅動部(未圖示)包括用於使單元拾取器240在X軸方向上移動的X軸驅動部以及用於使單元拾取器240在Z軸方向上移動的Z軸驅動部,X軸驅動部和Z軸驅動部包括馬達。另外,單元拾取器240可以將完成檢查的逆轉台310上的半導體封裝體P傳遞到托板封裝體342、344。The
通過單元拾取器240傳送到逆轉台310的半導體封裝體P可以向配置有檢查單元330的檢查區域傳送。逆轉台310可以包括第一逆轉台312以及第二逆轉台314。逆轉台312、314可以構成爲沿著傳送導件320往返移動。The semiconductor package P transferred to the reversing
分類模組300根據針對各半導體封裝體P的檢查結果而分別分類半導體封裝體P。分類模組300可以包括用於檢查逆轉台312、314上的半導體封裝體P的檢查單元330。作爲一例,檢查單元330可以包括用於對半導體封裝體P進行視訊檢查的視訊相機。可以是,通過檢查單元330完成檢查的半導體封裝體傳遞到第一托板台342以及第二托板台344,承載在第一托板台342和第二托板台344中的半導體封裝體P根據檢查結果而單獨地拾取並傳送到搬出托盤。The
此時,完成檢查的半導體封裝體可以通過單元拾取器240從第一逆轉台312以及第二逆轉台314傳遞到第一托板台342以及第二托板台344。第一托板台342和第二托板台344可以配置於第一逆轉台312和第二逆轉台314的下方,逆轉台312、314的傳送路徑和托板台342、344的移動路徑可以以疊層構造提供。At this time, the inspected semiconductor packages can be transferred from the first reversing table 312 and the second reversing table 314 to the first palletizing table 342 and the second palletizing table 344 through the
分類模組300可以包括分揀機370、分揀機驅動部件380、第一搬出托盤352、第二搬出托盤354、第一搬出托盤驅動部件351以及第二搬出托盤驅動部件353。The
分揀機370將通過檢查單元330完成檢查並分別承載到第一托板台342和第二托板台344的半導體封裝體P拾取而傳送到後述的第一搬出托盤352、第二搬出托盤354。以下,分揀機370的下方區域稱爲分類區域。The
分揀機驅動部件380呈軌道形狀形成並在X軸方向上設置,使分揀機370在X軸方向移動。爲此的分揀機驅動部件380可以內置有用於移動分揀機370的驅動構件。The
第一搬出托盤352和第二搬出托盤354可以將各個良品半導體封裝體P和次品半導體封裝體P承載而搬出到設備外部。與此不同,第一搬出托盤352和第二搬出托盤354可以還根據製造的狀態而將半導體封裝體P評等級並按照等級分別承載。例如,可以是,第一搬出托盤352承載A等級的半導體封裝體P,第二搬出托盤354承載製造的狀態比A等級低的B等級的半導體封裝體P。The first carry-out
若分揀機370從第一托板台342和第二托板台344將半導體封裝體P拾取而都承載到第一搬出托盤352或者第二搬出托盤354的每一個,則第一搬出托盤352或者第二搬出托盤354可以在Y軸方向上移動而將半導體封裝體P搬出到設備外部。If the
第一搬出托盤驅動部件351使第一搬出托盤352移動。第一搬出托盤驅動部件351可以內置有用於移動第一搬出托盤352的驅動構件。The first delivery
第二搬出托盤驅動部件353使第二搬出托盤354移動。第二搬出托盤驅動部件353可以內置有用於移動第二搬出托盤354的驅動構件。The second carry-out
另一方面,雖未詳細圖示,根據本發明的實施例的半導體封裝體切割及分類設備10可以還包括對經切割模組200傳送到分類模組300的半導體封裝體P執行清洗以及乾燥作業的清洗單元(未圖示)。On the other hand, although not shown in detail, the semiconductor package cutting and sorting
半導體封裝體切割及分類設備10可以如前述那樣將半導體料帶S切割、清洗、乾燥以及檢查後分類並排出到外部。另一方面,根據本發明的實施例的單元拾取器240不限於包括在半導體封裝體切割及分類設備10中,可以適用於普通的半導體封裝體製造系統。以下,對用於在各處理區域中對支承半導體封裝體P的工作台部件進行清洗的工作台清洗裝置以及具備其的半導體封裝體分類以及切割方法進行說明。The semiconductor package dicing and sorting
通常,在半導體封裝體切割及分類設備10內,半導體封裝體P的傳送可以通過單元拾取器240以及工作台部件T執行。具體地,從切割模組200向分類模組300的半導體封裝體P的傳送可以通過單元拾取器240執行,切割模組200以及分類模組300內部的各處理區域(例如:切割區域、檢查區域、分類區域)中的半導體封裝體P的移動可以通過工作台部件T執行。作爲一例,工作台部件T可以包括卡盤台220、逆轉台310、托板台342、344。Generally, in the semiconductor package cutting and sorting
圖2是用於說明用於清洗工作台部件T的工作台清洗裝置(工作台清洗單元)400的圖。參照圖2,根據本發明的一實施例的工作台清洗單元400可以包括毛刷單元410、第一驅動部420以及空氣噴射部430。FIG. 2 is a diagram for explaining a table cleaning device (table cleaning unit) 400 for cleaning the table member T. As shown in FIG. Referring to FIG. 2 , the
毛刷單元410可以構成爲能够移動到要清洗的工作台部件T上,可以通過第一驅動部420在垂直方向上移動。毛刷單元410可以以包括用於接觸於工作台部件T而從工作台部件T去除異物的毛刷以及用於支承毛刷的杆等支柱結構物的形態提供。作爲一例,毛刷可以由吸濕性和清洗力優異的聚乙烯醇(Polyvinyl Alcohol;PVA)纖維形成,或者由尼龍毛、無塵布等材料形成。The
以下,在本發明的實施例和附圖中將毛刷單元410的例子舉例說明爲毛刷形式,但也可以使用毛刷、海綿、EVA(乙烯-醋酸乙烯酯共聚物,ethylene-vinyl acetate copolymer)材質以及它們的結合形式等其它形式的清洗構件,在毛刷的情况下也可以使用固定式刷、旋轉刷、振動式刷、絲絨海綿刷等各種種類的毛刷。Hereinafter, the example of the
第一驅動部420可以使毛刷單元410下降而使毛刷單元410靠近工作台部件T,或使下降的毛刷單元410再上升。作爲一例,第一驅動部420可以包括用於使毛刷單元410在垂直方向上移動的氣壓氣缸。The
空氣噴射部430可以提供爲能够與毛刷單元410一起移動,爲了去除在通過毛刷單元410執行清洗作業後的工作台部件T上殘留的顆粒或者水分而朝向工作台部件T噴射空氣。空氣噴射部430的工作既可以與毛刷單元410的工作同時執行,也可以單獨執行。作爲一例,空氣噴射部430可以以氣刀(Air knife)形式提供。空氣噴射部430可以與毛刷單元410一起在水平方向上移動。The
作爲一例,空氣噴射部430可以以與毛刷單元410結合的形式提供而通過第一驅動部420向靠近工作台部件T的方向垂直移動。As an example, the
或者,工作台清洗裝置400可以還包括用於使空氣噴射部430垂直移動的第二驅動部440。第二驅動部440可以使空氣噴射部430下降而靠近工作台部件T,或使得下降的空氣噴射部430再上升。作爲一例,第二驅動部440可以包括用於使空氣噴射部430在垂直方向上移動的氣壓氣缸。Alternatively, the
第一驅動部420和第二驅動部440的工作可以獨立地控制。因此,毛刷單元410的下降和空氣噴射部430的升降工作可以單獨地執行。Operations of the
如圖2所示,工作台清洗裝置400可以以安裝於單元拾取器240的形式提供。作爲一例,工作台清洗裝置400可以以單元拾取器240、毛刷單元410和空氣噴射部430沿著單元拾取器240的傳送方向即第一方向(X軸方向)呈一字排開配置的形式安裝於單元拾取器240的一側面。此時,被安裝工作台清洗裝置400的單元拾取器240的一側面優選的是與單元拾取器240的移動方向即第一方向垂直的面。As shown in FIG. 2 , the
安裝於單元拾取器240的工作台清洗裝置400可以通過單元拾取器240的水平移動而移動到要清洗的工作台部件T上。The
工作台清洗單元400可以通過單元拾取器240的水平移動而位於清洗對象工作台部件T上方,通過單元拾取器240的垂直移動(下降),毛刷單元410可以與清洗對象工作台部件T接觸。另外,毛刷單元410與清洗對象工作台部件T接觸後使單元拾取器240在水平方向上往返移動,隨之可以從工作台部件T去除異物。The
通過工作台清洗單元400清洗的工作台部件T可以是將配置有多個半導體封裝體的半導體料帶S向切割區域傳送的卡盤台222、224、將單個化的半導體封裝體P向檢查區域傳送的逆轉台312、314、將完成檢查的半導體封裝體P向分類區域傳送的托板台342、344中的一個。工作台清洗單元400可以將工作台部件T一個一個清洗。The table part T cleaned by the
安裝到單元拾取器240的工作台清洗裝置400可以毛刷單元410和空氣噴射部430中的至少一個與單元拾取器240連接。The
圖3以及圖4是用於說明單元拾取器240和工作台清洗裝置400的配置例的圖。FIG. 3 and FIG. 4 are diagrams for explaining an arrangement example of the
作爲一例,如圖3的(a)所示,可以是與單元拾取器240連接毛刷單元410且毛刷單元410和空氣噴射部430結合的形式(即,一體式)。As an example, as shown in (a) of FIG. 3 , the
或者,如圖3的(b)所示,也可以是與單元拾取器240連接空氣噴射部430且毛刷單元410和空氣噴射部430結合的形式(一體式)。Alternatively, as shown in (b) of FIG. 3 , the
或者,如圖3的(c)所示,可以是與單元拾取器240分別連接毛刷單元410和空氣噴射部430的形式。Alternatively, as shown in (c) of FIG. 3 , the
或者,如圖4所示,安裝到單元拾取器240的工作台清洗裝置400可以還包括第二空氣噴射部435。此時,第二空氣噴射部435可以配置成單元拾取器240和毛刷單元410位於第二空氣噴射部435和空氣噴射部430之間的空間。即,第二空氣噴射部435、單元拾取器240、毛刷單元410、空氣噴射部430也可以沿著第一方向呈一列配置。根據還包括第二空氣噴射部435的工作台清洗單元400,工作台部件T上的殘留顆粒以及水分去除作業變得不受單元拾取器240的移動方向限制,因此能够提高工作台部件T上的殘留顆粒以及水分去除效率。Alternatively, as shown in FIG. 4 , the
另一方面,雖未詳細圖示,以單元拾取器240爲基準的毛刷單元410和空氣噴射部430的位置也可以根據需要彼此交叉。On the other hand, although not shown in detail, the positions of the
圖5至圖8是用於說明工作台清洗單元400的工作的概要圖。5 to 8 are schematic views for explaining the operation of the
參照圖5,工作台清洗單元400可以通過沿著導架250水平移動的單元拾取器240而位於清洗對象工作台部件T的上方。Referring to FIG. 5 , the
參照圖6,位於清洗對象工作台部件T的上方的工作台清洗單元400可以使毛刷單元410和空氣噴射部430下降而靠近工作台部件T。此時,毛刷單元410以及空氣噴射部430可以通過第一驅動部420下降。由此,毛刷單元410以及空氣噴射部430可以從單元拾取器240凸出。Referring to FIG. 6 , the
之後,可以隨著單元拾取器240垂直移動,再一次控制毛刷單元410的高度。參照圖7,毛刷單元410可以通過單元拾取器240的下降而接觸於工作台部件T。接觸在工作台部件T的狀態下的毛刷單元410可以隨著單元拾取器240沿著導架250在水平方向上往返移動而去除存在於工作台部件T上的異物。Afterwards, the height of the
此時,包括在毛刷單元410中的毛刷的Y軸長度可以提供爲等於或大於工作台部件T的Y軸長度。或者,可以構成爲,在工作台部件T的清洗步驟中,工作台部件T通過工作台部件驅動部在工作台清洗單元400的下方區域在與導架250垂直的水平方向(Y軸方向)上移動。由此,可以對工作台部件T的整個區域執行清洗作業。At this time, the Y-axis length of the brush included in the
若完成通過毛刷單元410進行的工作台部件T的清洗作業,則可以使得與毛刷單元410一起下降的空氣噴射部430運轉。開啓空氣噴射部430而向工作台部件T噴射空氣,從而能够去除殘留於工作台部件T的水分以及顆粒。另一方面,空氣噴射部430的運轉也可以與通過毛刷單元410進行的工作台部件T的清洗作業同時執行。When the cleaning operation of the table member T by the
若完成將殘留於工作台部件T的水分以及顆粒去除的去除過程,則停止空氣噴射部430的運轉而使得下降的毛刷單元410和空氣噴射部430上升。之後,可以執行使得下降的單元拾取器240再上升的過程。When the removal process of removing moisture and particles remaining on the table member T is completed, the operation of the
另一方面,如圖8以及9所示,當還具備用於使空氣噴射部430垂直移動的第二驅動部440時,毛刷單元410的垂直移動和空氣噴射部430的垂直移動可以單獨地形成。判斷爲隨著還具備第二驅動部440所附加的過程是通常技術人員能够容易地理解,省略具體說明。On the other hand, as shown in FIGS. 8 and 9 , when the
本發明的根據一實施例,前述的半導體封裝體切割及分類設備10可以還包括爲了使工作台清洗裝置自動化而控制工作台清洗單元400的工作的控制部。控制部可以設定工作台清洗單元400的清洗作業每一定時間執行而使得工作台清洗單元400的清洗作業周期性執行。清洗作業的執行周期可以由作業者設定。通過周期性的工作台部件T的清洗,工作台部件T的維護即使沒有由作業者執行,也每周期自動地執行,因此提高維護便利性,隨著每一定周期對工作台部件T執行清洗作業,能够防止工作台部件T的污染引起的設備錯誤發生以及封裝體內污染發生。According to an embodiment of the present invention, the aforementioned semiconductor package cutting and sorting
圖10是用於說明根據本發明的一實施例的半導體封裝體切割及分類方法的流程圖。根據本發明的一實施例的半導體封裝體切割及分類方法可以包括裝載步驟(S1)、切割步驟(S2)、檢查步驟(S3)、分類步驟(S4)以及工作台部件清洗步驟(S5)。FIG. 10 is a flow chart illustrating a semiconductor package cutting and sorting method according to an embodiment of the present invention. A semiconductor package cutting and sorting method according to an embodiment of the present invention may include a loading step ( S1 ), a cutting step ( S2 ), an inspection step ( S3 ), a sorting step ( S4 ), and a table component cleaning step ( S5 ).
根據本發明的一實施例的半導體封裝體切割及分類方法可以通過具備前述的根據本發明的一實施例的工作台清洗裝置的半導體封裝體切割及分類設備來執行。The semiconductor package cutting and sorting method according to an embodiment of the present invention may be performed by a semiconductor package cutting and sorting device provided with the aforementioned workbench cleaning device according to an embodiment of the present invention.
裝載步驟(S1)作爲將配置有多個半導體封裝體P的半導體料帶S裝載到半導體封裝體切割及分類設備的步驟,可以包括將從外部裝載的半導體料帶S向切割模組200傳遞的步驟。裝載模組100可以從收納有多個半導體料帶S的料盒將一個半導體料帶S取出並向切割模組200傳遞。從裝載模組100傳遞的半導體料帶S可以通過料帶拾取器210安放到卡盤台220上。The loading step ( S1 ) may include transferring the semiconductor strip S loaded from the outside to the
切割步驟(S2)是用於將裝載的半導體料帶S切割而將半導體料帶S單個化爲多個半導體封裝體P的步驟。若安放有半導體料帶S的卡盤台220移動到切割機230的下方,則通過切割機230執行切割步驟(S2),被切割而單個化的半導體封裝體P可以通過卡盤台220傳送到單元拾取器240。即,卡盤台220可以在Y軸方向上往返移動切割機230的下方區域(切割區域)和單元拾取器240的下方區域。此時,卡盤台220可以包括第一卡盤台222和第二卡盤台224,第一卡盤台222的移動和第二卡盤台224的移動可以獨立地控制。The cutting step ( S2 ) is a step of cutting the loaded semiconductor strip S to singulate the semiconductor strip S into a plurality of semiconductor packages P. If the chuck table 220 on which the semiconductor strip S is placed moves below the cutting
檢查步驟(S3)作爲用於對通過切割步驟(S2)單個化的半導體封裝體P進行檢查的步驟,可以通過檢查單元330執行。從卡盤台220傳送到單元拾取器240的半導體封裝體P可以通過單元拾取器240安放到逆轉台310,通過逆轉台310移動到檢查單元330下方的檢查區域而執行檢查步驟(S3)。逆轉台310可以包括第一逆轉台312和第二逆轉台314。The inspection step ( S3 ) may be performed by the
分類步驟(S4)作爲根據檢查步驟(S3)的檢查結果而分類半導體封裝體P的步驟,可以通過分揀機370執行。可以是,完成檢查的半導體封裝體P傳遞到第一托板台342以及第二托板台344,安放到第一托板台342以及第二托板台344的半導體封裝體P通過分揀機370拾取後分別承載到第一搬出托盤352或者第二搬出托盤354。承載到第一搬出托盤352或者第二搬出托盤354的基準可以根據檢查步驟(S3)中的檢查結果來確定。若完成通過分揀機370進行的分類步驟(S4),則第一搬出托盤352或者第二搬出托盤354可以在Y軸方向上移動而將半導體封裝體P搬出到設備外部。The sorting step ( S4 ) may be performed by the
工作台部件清洗步驟(S5)是對從切割步驟(S2)至分類步驟(S4)將半導體封裝體支承並傳送的工作台部件進行清洗的步驟。工作台部件清洗步驟(S5)可以通過前面說明的工作台清洗裝置400執行。The table member cleaning process (S5) is a process of cleaning the table member which supports and conveys a semiconductor package from a dicing process (S2) to a sorting process (S4). The table component cleaning step ( S5 ) can be performed by the above-described
圖11是用於說明根據本發明的實施例的工作台部件清洗步驟(S5)的流程圖。FIG. 11 is a flowchart for explaining the table part cleaning step ( S5 ) according to the embodiment of the present invention.
工作台部件清洗步驟(S5)可以包括工作台清洗裝置水平移動步驟(S51)、工作台清洗裝置下降步驟(S52)、工作台部件清洗步驟(S53)、工作台清洗裝置上升步驟(S54)。The workbench parts cleaning step (S5) may include a workbench cleaning device horizontally moving step (S51), a workbench cleaning device lowering step (S52), a workbench part cleaning step (S53), and a workbench cleaning device raising step (S54).
S51步驟是使工作台清洗裝置400水平移動而使工作台清洗裝置400位於要清洗的清洗對象工作台部件T的上方的步驟。S51步驟可以通過使得安裝有工作台清洗裝置400的單元拾取器240水平移動來執行。Step S51 is a step of moving the
S52步驟是用於使工作台清洗裝置400與清洗對象工作台部件T靠近以及接觸的步驟。S52步驟可以包括通過第一驅動部420使毛刷單元410和空氣噴射部430下降的步驟以及使單元拾取器240下降而使毛刷單元410接觸於工作台部件T的步驟。毛刷單元410和空氣噴射部430可以通過第一驅動部420從單元拾取器240朝向工作台部件T凸出,毛刷單元410可以通過單元拾取器240的下降而接觸於工作台部件T。Step S52 is a step for bringing the
S53步驟可以包括通過接觸於工作台部件T的毛刷單元410進行的清洗步驟以及通過靠近工作台部件T的空氣噴射部430進行的清洗步驟。Step S53 may include a cleaning step by the
通過毛刷單元410進行的清洗步驟可以通過使單元拾取器240在第一方向(X軸方向)上往返移動來執行。隨著使得接觸於清洗對象工作台部件T的單元拾取器240在水平方向(X軸方向)上往返移動,可以通過毛刷單元410去除清洗對象工作台部件T上的異物等。The cleaning step by the
通過空氣噴射部430進行的清洗步驟可以通過使空氣噴射部430運轉來執行。隨著使得靠近清洗對象工作台部件T的空氣噴射部430運轉,可以去除殘留在工作台部件T上的異物和水分等。通過空氣噴射部430進行的清洗步驟可以與通過毛刷單元410進行的清洗步驟同時執行,或者可以在完成通過毛刷單元410進行的清洗步驟之後執行。The cleaning step by the
S54步驟是用於使工作台清洗裝置400與清洗對象工作台部件T隔開的步驟。S54步驟可以包括完成S53步驟後使得通過第一驅動部420下降的毛刷單元410以及空氣噴射部430再上升的步驟和使得通過拾取器驅動部(未圖示)下降的單元拾取器240再上升的步驟。可以通過第一驅動部420回收從單元拾取器240朝向工作台部件T凸出的毛刷單元410和空氣噴射部430。Step S54 is a step for separating the
另一方面,當空氣噴射部430通過別的第二驅動部440相對於毛刷單元410獨立地垂直移動時,可以在各區間還包括通過第二驅動部440使空氣噴射部430下降或者上升的步驟。例如,可以在S52至S54步驟中的空氣噴射部430通過第一驅動部420與毛刷單元410一起垂直移動的步驟中還包括通過第二驅動部440使空氣噴射部430垂直移動的步驟。另一方面,通過第二驅動部440進行的空氣噴射部430的垂直移動步驟可以與通過第一驅動部420進行的毛刷單元410的垂直移動步驟同時執行,或者可以在通過第一驅動部420進行的毛刷單元410的垂直移動步驟全部完成之後執行。或者,毛刷單元410的垂直移動和空氣噴射部430的垂直移動也可以一個一個交替執行。On the other hand, when the
工作台部件清洗步驟(S5)可以包括在切割步驟(S2)、檢查步驟(S3)、分類步驟(S4)中。The table part washing step ( S5 ) may be included in the cutting step ( S2 ), the checking step ( S3 ), the sorting step ( S4 ).
包括在切割步驟(S2)中的工作台部件清洗步驟(S5)的清洗對象工作台部件T可以是能够向切割區域傳送半導體料帶S並在切割區域中支承半導體料帶S的卡盤台222、224。對第一卡盤台222的工作台清洗作業和對第二卡盤台224的工作台清洗作業可以依次執行。在一實施例中,在對安放在第一卡盤台222上的半導體料帶S執行切割工藝時,可以對待機狀態的第二卡盤台224執行工作台清洗作業。與此相反,當對安放在第二卡盤台224上的半導體料帶S執行切割工藝時,可以對待機狀態的第一卡盤台222執行工作台清洗作業。The cleaning target table part T included in the table part cleaning step (S5) in the cutting step (S2) may be the chuck table 222 capable of delivering the semiconductor strip S to the cutting area and supporting the semiconductor tape S in the cutting area. , 224. The table cleaning operation on the first chuck table 222 and the table cleaning operation on the second chuck table 224 may be performed sequentially. In one embodiment, when performing the cutting process on the semiconductor strip S placed on the first chuck table 222 , the second chuck table 224 in the standby state may perform a table cleaning operation. On the contrary, when the cutting process is performed on the semiconductor strip S placed on the second chuck table 224 , the table cleaning operation can be performed on the first chuck table 222 in the standby state.
包括在檢查步驟(S3)中的工作台部件清洗步驟(S5)的清洗對象工作台部件T可以是能够將在切割步驟中被單個化的半導體封裝體P向檢查區域傳送並在檢查區域中支承半導體封裝體P的逆轉台312、314。對第一逆轉台312的工作台清洗作業和對第二逆轉台314的工作台清洗作業可以依次執行。The table part T to be cleaned in the table part cleaning step (S5) included in the inspection step (S3) may be capable of transporting and supporting the semiconductor packages P singulated in the dicing step to the inspection area. Inverting
在一實施例中,當對安放在第一逆轉台312上的半導體封裝體P執行檢查工藝時,可以對待機狀態的第二逆轉台314執行工作台清洗作業。與此相反,當對安放在第二逆轉台314上的半導體封裝體P執行檢查工藝時,可以對待機狀態的第一逆轉台312執行工作台清洗作業。In one embodiment, when the inspection process is performed on the semiconductor package P placed on the first reversing table 312 , the workbench cleaning operation may be performed on the second reversing table 314 in the standby state. On the contrary, when the inspection process is performed on the semiconductor package P mounted on the second reversing table 314 , the stage cleaning operation may be performed on the first reversing table 312 in the standby state.
包括在分類步驟(S4)中的工作台部件清洗步驟(S5)的清洗對象工作台部件T可以是能够將完成檢查的半導體封裝體P向分類區域傳送並在分類區域中支承半導體封裝體P的托板台342、344。對第一托板台342的工作台清洗作業和對第二托板台344的工作台清洗作業可以依次執行。The cleaning target table part T included in the table part cleaning step (S5) in the sorting step (S4) may be capable of transferring the inspected semiconductor package P to the sorting area and supporting the semiconductor package P in the sorting area. Pallet tables 342,344. The workbench cleaning operation on the
在一實施例中,當對安放在第一托板台342上的半導體封裝體P執行分類工藝時,可以對待機狀態的第二托板台344執行工作台清洗作業。與此相反,當對安放在第二托板台344上的半導體封裝體P執行分類工藝時,可以對待機狀態的第一托板台342執行工作台清洗作業。In one embodiment, when the sorting process is performed on the semiconductor packages P placed on the
如此,對一個工作台部件T的工作台部件清洗步驟(S5)可以與對安放在工作台部件T上的半導體封裝體P的處理工藝同時執行。另外,根據需要,工作台部件清洗步驟(S5)也可以對安放在工作台部件T的半導體封裝體P執行。As such, the stage part cleaning step ( S5 ) for one stage part T may be performed simultaneously with the processing of the semiconductor package P mounted on the stage part T. Referring to FIG. In addition, the stage component cleaning step ( S5 ) may also be performed on the semiconductor package P placed on the stage component T as needed.
以上,參照圖1至圖11,說明了根據本發明的工作台清洗裝置400及具備其的導體封裝體切割及分類設備10以及半導體封裝體切割及分類方法。根據本發明的實施例的工作台清洗裝置是用於以一定周期對如卡盤台220、逆轉台310、托板台342、344等那樣被安放半導體封裝體P的工作台部件T進行清洗的裝置。工作台清洗裝置400可以與設備不分離地在設備內自動執行,可以對半導體封裝體的處理工藝同時執行。因此,以往的工作台清洗工藝所需的作業時間顯著縮短,能够提高生産性(UPH)。另外,能够防止工作台部件污染引起的封裝體污染以及品質下降問題。Above, referring to FIG. 1 to FIG. 11 , the
以上,參照有限的實施例以及附圖進行了說明,但其只是實施例,通常技術人員會自明可以在本發明的技術構思的範圍內實施各種變形這一點。各實施例可以選擇性地組合全部或者一部分來實施。因此,本發明的保護範圍應通過申請專利範圍的記載及其等同範圍來確定。As mentioned above, although it demonstrated with reference to the limited Example and drawing, it is only an Example, and it is obvious to those skilled in the art that various deformation|transformation can be implemented within the range of the technical concept of this invention. All or some of the embodiments can be selectively combined to implement. Therefore, the protection scope of the present invention should be determined by the description of the scope of the patent application and its equivalent scope.
10:分類設備 100:裝載模組 200:切割模組 210:料帶拾取器 220:卡盤台 222:第一卡盤台 224:第二卡盤台 230:切割機 240:單元拾取器 250:導架 300:分類模組 310:逆轉台 312:逆轉台 314:逆轉台 320:傳送導件 330:檢查單元 342:第一托板台 344:第二托板台 351:第一搬出托盤驅動部件 352:第一搬出托盤 353:第二搬出托盤驅動部件 354:第二搬出托盤 370:分揀機 380:分揀機驅動部件 400:工作台清洗裝置 410:毛刷單元 420:第一驅動部 430:空氣噴射部 435:第二空氣噴射部 440:第二驅動部 P:封裝體 S:半導體料帶 S1:步驟 S2:步驟 S3:步驟 S4:步驟 S5:步驟 S51:步驟 S52:步驟 S53:步驟 S54:步驟 T:工作台部件 X:X軸 Y:Y軸 Z:Z軸 10: Classification equipment 100: Loading mods 200: cutting module 210: tape picker 220: chuck table 222: The first chuck table 224: The second chuck table 230: cutting machine 240: Unit Picker 250: guide frame 300:Classification module 310: reverse station 312: reverse station 314: reverse station 320: transmission guide 330: check unit 342: The first pallet 344: Second pallet platform 351: The first unloading tray driving part 352: The first pallet is moved out 353: The second unloading tray driving part 354: The second unloading pallet 370: sorting machine 380:Sorter drive components 400: Bench cleaning device 410: Brush unit 420: The first driving department 430: Air Injection Department 435:Second air injection part 440:Second drive unit P: Package S: Semiconductor tape S1: step S2: step S3: step S4: step S5: step S51: step S52: step S53: step S54: step T: Workbench Parts X: X-axis Y: Y-axis Z: Z-axis
圖1是示出根據本發明的一實施例的半導體封裝體切割及分類設備的圖。FIG. 1 is a diagram illustrating a semiconductor package cutting and sorting apparatus according to an embodiment of the present invention.
圖2是用於說明圖1所示的工作台清洗裝置的放大圖。Fig. 2 is an enlarged view for explaining the table cleaning device shown in Fig. 1 .
圖3以及圖4是概要示出工作台清洗裝置的配置例的俯視圖。3 and 4 are plan views schematically showing an arrangement example of the table cleaning device.
圖5至圖9是用於說明工作台清洗裝置的工作的概要圖。5 to 9 are schematic diagrams for explaining the operation of the table cleaning device.
圖10是用於說明根據本發明的一實施例的半導體封裝體切割及分類方法的流程圖。FIG. 10 is a flow chart illustrating a semiconductor package cutting and sorting method according to an embodiment of the present invention.
圖11是用於說明圖10的工作台清洗方法的流程圖。Fig. 11 is a flow chart for explaining the table cleaning method of Fig. 10 .
10:分類設備 10: Classification equipment
100:裝載模組 100: Loading mods
200:切割模組 200: cutting module
210:料帶拾取器 210: tape picker
220:卡盤台 220: chuck table
222:第一卡盤台 222: The first chuck table
224:第二卡盤台 224: The second chuck table
230:切割機 230: cutting machine
240:單元拾取器 240: Unit Picker
250:導架 250: guide frame
300:分類模組 300:Classification module
310:逆轉台 310: reverse station
312:逆轉台 312: reverse station
314:逆轉台 314: reverse station
320:傳送導件 320: transmission guide
330:檢查單元 330: check unit
342:第一托板台 342: The first pallet
344:第二托板台 344: Second pallet platform
351:第一搬出托盤驅動部件 351: The first unloading tray driving part
352:第一搬出托盤 352: The first pallet is moved out
353:第二搬出托盤驅動部件 353: The second unloading tray driving part
354:第二搬出托盤 354: The second unloading pallet
370:分揀機 370: sorting machine
380:分揀機驅動部件 380:Sorter drive components
400:工作台清洗裝置 400: Bench cleaning device
P:封裝體 P: Package
S:半導體料帶 S: Semiconductor tape
X:X軸 X: X-axis
Y:Y軸 Y: Y-axis
Claims (20)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2021-0170954 | 2021-12-02 | ||
KR1020210170954A KR20230082955A (en) | 2021-12-02 | 2021-12-02 | Semiconductor package sawing and sorting equipment including table cleaning device |
Publications (1)
Publication Number | Publication Date |
---|---|
TW202324517A true TW202324517A (en) | 2023-06-16 |
Family
ID=86583037
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW111143020A TW202324517A (en) | 2021-12-02 | 2022-11-10 | Workbench cleaning device, and cutting and sorting equipment and method for semiconductor package body characterized by having no loss of tact time while the equipment running |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR20230082955A (en) |
CN (1) | CN116214614A (en) |
TW (1) | TW202324517A (en) |
-
2021
- 2021-12-02 KR KR1020210170954A patent/KR20230082955A/en not_active Application Discontinuation
-
2022
- 2022-10-12 CN CN202211244786.2A patent/CN116214614A/en active Pending
- 2022-11-10 TW TW111143020A patent/TW202324517A/en unknown
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KR20230082955A (en) | 2023-06-09 |
CN116214614A (en) | 2023-06-06 |
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