TW202313513A - Protective structure for preventing detachment and preparation method thereof - Google Patents

Protective structure for preventing detachment and preparation method thereof Download PDF

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TW202313513A
TW202313513A TW110136742A TW110136742A TW202313513A TW 202313513 A TW202313513 A TW 202313513A TW 110136742 A TW110136742 A TW 110136742A TW 110136742 A TW110136742 A TW 110136742A TW 202313513 A TW202313513 A TW 202313513A
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coating layer
protective structure
substrate
detachment
layer
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TW110136742A
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TWI791299B (en
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曾賀捷
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橙艾創新股份有限公司
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Abstract

The protective structure provided by the present invention to avoid the separation of the film layer and the preparation method thereof is to add a filling layer between the two film layer to overcome the problem of peeling off the film layer, to improve the overall bonding of the film layer strength.

Description

避免膜層脫離之防護結構及其製備方法Protective structure for preventing film detachment and preparation method thereof

本發明係與保護貼產品相關,特別係指一種避免膜層脫離之防護結構及其製備方法。The present invention is related to protective sticker products, in particular to a protective structure for preventing film detachment and a preparation method thereof.

按,習知鍍膜技術,在傳統上主要區分有液體成膜法及氣相成膜法,其中,液體成膜法包括酸蝕法、溶液沈積法、電鍍法、陽極氧化法、溶膠-凝膠法 (Sol-Gel Method)、LB膜(Langmuir-Blodgett Technique)及液相磊晶(Liquid Phase Epitaxy,LPE),氣相成膜法則包括化學氣相沈積法(Chemical Vapor-phase Deposition,CVD)及物理氣相沈積法(Physical Vapor-phase Deposition,PVD),並已廣泛應用於各種不同領域中。According to conventional coating technology, there are traditionally mainly divided into liquid film forming method and vapor phase film forming method, among which, liquid film forming method includes acid etching method, solution deposition method, electroplating method, anodic oxidation method, sol-gel method, etc. Sol-Gel Method, LB film (Langmuir-Blodgett Technique) and Liquid Phase Epitaxy (LPE), vapor phase film formation methods include Chemical Vapor-phase Deposition (CVD) and Physical vapor deposition (Physical Vapor-phase Deposition, PVD) has been widely used in various fields.

舉例來說,在一具體的應用態樣中,係對螢幕保護貼的進行鍍膜,據以增加某些特定之功效,其可見於我國公開第201506439號發明專利前案,在該案中係揭露了於玻璃基材10上疊加有一抗炫光學膜11及一抗反射增透膜12,其能夠降低光線反射,並避免炫光產生。For example, in a specific application, it is to coat the screen protector to increase certain specific functions. In order to stack an anti-glare optical film 11 and an anti-reflection anti-reflection film 12 on the glass substrate 10, they can reduce light reflection and avoid glare.

然而,惟囿於該發明專利前案所揭技術之不足,致使其在膜層疊加技術上及光線穿透率均仍非理想,其肇因於該發明專利前案係將抗反射增透膜12直接增設於抗炫光學膜11上,惟為了使抗炫光學膜11具有降低炫光的作用,抗炫光學膜11表面勢必具有凹凸不平的結構,致使抗反射增透膜12係設於一非平整表面13上,使得抗反射增透膜12與抗炫光學膜11兩者之間存在空隙P,除了減少了接觸面積,更使其貼合並不完全,如圖1所示。如此一來,使得抗反射增透膜12在抗炫光學膜11上的附著力不佳,容易造成鍍膜龜裂或剝落。However, due to the deficiencies in the technology disclosed in the prior patent of this invention, its film stacking technology and light transmittance are still not ideal. 12 is directly added on the anti-glare optical film 11, but in order to make the anti-glare optical film 11 have the effect of reducing glare, the surface of the anti-glare optical film 11 must have an uneven structure, so that the anti-reflection anti-reflection film 12 is arranged on a On the uneven surface 13 , there is a gap P between the anti-reflection and anti-reflection film 12 and the anti-glare optical film 11 , which not only reduces the contact area, but also makes the bonding incomplete, as shown in FIG. 1 . As a result, the adhesion of the anti-reflection and anti-reflection film 12 on the anti-glare optical film 11 is not good, which easily causes cracking or peeling off of the coating.

再者,由於傳統製程的限制及製造成本的考量,習知螢幕保護貼縱然設有抗反射增透膜,使用者透過貼覆有該螢幕保護貼的手機觀看顯示影像時,仍因光線穿透率不高,而可能無法被清楚、或降低了亮度表現,因此,習知螢幕保護貼的結構或製程步驟仍有不甚完善之處,而有予以改善之必要。Furthermore, due to the limitation of the traditional manufacturing process and the consideration of the manufacturing cost, even if the conventional screen protector is provided with an anti-reflective anti-reflection film, when the user watches the displayed image through the mobile phone covered with the screen protector, the screen protector still suffers from light penetration. The efficiency is not high, and may not be clear, or reduce the brightness performance. Therefore, the structure or process steps of the conventional screen protectors are still not perfect, and it is necessary to improve them.

本發明之主要目的係在於提供一種避免膜層脫離之防護結構,其係於第一鍍膜層與第三鍍膜層之間製作一第二鍍膜層,以克服習知技術膜層剝落的問題,可有效地提高膜層間結合強度。The main purpose of the present invention is to provide a protective structure to prevent the detachment of the film layer, which is to make a second coating layer between the first coating layer and the third coating layer, so as to overcome the problem of peeling off the film layer in the prior art. Effectively improve the bonding strength between film layers.

緣是,為達成上述目的,本發明所揭避免膜層脫離之防護結構係包括一基材、一第一鍍膜層、一粗糙面、一第二鍍膜層及一第三鍍膜層,其中,該第一鍍膜層設於該基材上;該粗糙面係利用蝕刻技術而形成於該第一鍍膜層相背於該第一鍍膜層與該基材彼此連接處的一側面上,以使該第一鍍膜層的霧度介於1 %-35 %之間;該第二鍍膜層係以真空濺鍍技術填補於該粗糙面的凹陷部分,並經固化後形成有一平整面;該第三鍍膜層設於該平整面上。據此,有效地提高了結合的穩固性,達成防止該等膜層脫離的效果。The reason is that, in order to achieve the above object, the protection structure disclosed by the present invention to prevent the detachment of the film layer comprises a base material, a first coating layer, a rough surface, a second coating layer and a third coating layer, wherein the The first coating layer is arranged on the base material; the rough surface is formed on the side of the first coating layer opposite to the connection between the first coating layer and the base material by using etching technology, so that the first coating layer and the base material are connected to each other. The haze of the first coating layer is between 1%-35%; the second coating layer is filled in the concave part of the rough surface by vacuum sputtering technology, and forms a flat surface after curing; the third coating layer on the flat surface. Accordingly, the stability of the combination is effectively improved, and the effect of preventing the detachment of the film layers is achieved.

在一實施例中,該第二鍍膜層與該第三鍍膜層為相同的組成物所構成,可提高兩者彼此之間的結合關係,確實具有功效上之增進。In one embodiment, the second coating layer and the third coating layer are composed of the same composition, which can improve the bonding relationship between the two, and indeed improve the efficacy.

為了進一步改善該防護結構的整體穿透率,本發明係於該基材相背於該基材與該第一鍍膜層彼此連接處的另一側面上更設有一第四鍍膜層,使光線行經該第四鍍膜層並產生二次反射時,會與原反射光之間發生干涉,以減少反射光,以達到增加光線穿透率之目的。In order to further improve the overall transmittance of the protective structure, the present invention is further provided with a fourth coating layer on the other side of the base material opposite to the connection between the base material and the first coating layer, so that light can pass through When the fourth coating layer produces secondary reflection, it will interfere with the original reflected light to reduce the reflected light and increase the light transmittance.

在一實施例中,該第四鍍膜層與該第二鍍膜層或該第三鍍膜層為相同的組成物所構成,且該組成物係五氧化二鈮,並使該第二鍍膜層與、該第三鍍膜層與第四鍍膜層具有相同的可見光反射率,其中,該反射率係介於0.5 %-1 %之間。In one embodiment, the fourth coating layer and the second coating layer or the third coating layer are made of the same composition, and the composition is niobium pentoxide, and the second coating layer and, The third coating layer and the fourth coating layer have the same visible light reflectivity, wherein the reflectivity is between 0.5%-1%.

在一實施例中,該基材的材質為玻璃。In one embodiment, the material of the substrate is glass.

在一實施例中,該基材的材質係選自聚甲基丙烯酸甲酯(PMMA)、聚碳酸酯(PC)、聚醯氨(PA)及高分子樹脂任其中一者。In one embodiment, the material of the substrate is selected from any one of polymethyl methacrylate (PMMA), polycarbonate (PC), polyamide (PA) and polymer resin.

此外,本發明還揭露了避免膜層脫離之防護結構的製備方法,其包含以下步驟:a.取一基材;b.於該基材上方形成一第一鍍膜層,並對該第一鍍膜層進行蝕刻,以形成一粗糙面;c.於該第一鍍膜層上方真空濺鍍一第二鍍膜層,並使該第二鍍膜層填補於該粗糙面的凹陷部分後,對該第二鍍膜層進行第一次固化,而形成有一平整面;d.以與該第二鍍膜層相同組成的靶材進行濺鍍,而於該平整面上方形成一第三鍍膜層,再對該第三鍍膜層進行第二次固化。In addition, the present invention also discloses a method for preparing a protective structure that prevents the detachment of the film layer, which includes the following steps: a. Take a substrate; b. Form a first coating layer on the substrate, and apply the first coating layer layer is etched to form a rough surface; c. vacuum sputtering a second coating layer above the first coating layer, and after the second coating layer is filled in the concave portion of the rough surface, the second coating layer layer is cured for the first time to form a flat surface; d. sputtering with a target material of the same composition as the second coating layer to form a third coating layer above the flat surface, and then the third coating layer layer undergoes a second cure.

在一實施例中,該方法更包括步驟e,其係以與該第二鍍膜層相同組成的靶材於該基材下方的位置上進行濺鍍,以形成一第四鍍膜層。In one embodiment, the method further includes a step e of sputtering a target with the same composition as that of the second coating layer on a position below the substrate to form a fourth coating layer.

其中,該靶材為五氧化二鈮,使該第二鍍膜層、該第三鍍膜層與第四鍍膜層具有相同的可見光反射率,且該反射率係介於0.5 %-1 %之間。Wherein, the target material is niobium pentoxide, so that the second coating layer, the third coating layer and the fourth coating layer have the same visible light reflectivity, and the reflectivity is between 0.5%-1%.

首先,本發明較佳實施例中所提供的避免膜層脫離之防護結構的製備方法,其係於兩彼此附著效果不佳的膜層之間再增設有另一填補層,以克服習知技術膜層剝落的問題,可有效地提高膜層整體的結合強度。First of all, the preparation method of the protective structure that prevents the detachment of the film layer provided in the preferred embodiment of the present invention is to add another filling layer between the two film layers with poor adhesion effect to overcome the conventional technology. The problem of peeling of the film layer can effectively improve the bonding strength of the film layer as a whole.

請參閱圖3至圖5所示,該製備方法乃係包含有下述之步驟:Please refer to shown in Fig. 3 to Fig. 5, this preparation method comprises the following steps:

a.取一片狀之基材20,並經CNC裁切、強化、印刷(Printing)等前置程序處理。其中,該基材20的材質可為但不限為玻璃或塑料,而塑料為聚甲基丙烯酸甲酯(PMMA)、聚碳酸酯(PC)、聚醯氨(PA)或高分子樹脂。在本例中該基材20係選用玻璃材質,且其厚度介於0.1 mm至0.45 mm之間,較佳為0.33 mm。a. Take a piece of base material 20 and process it through CNC cutting, strengthening, printing and other pre-processing procedures. Wherein, the material of the substrate 20 can be but not limited to glass or plastic, and the plastic is polymethyl methacrylate (PMMA), polycarbonate (PC), polyamide (PA) or polymer resin. In this example, the substrate 20 is made of glass, and its thickness is between 0.1 mm and 0.45 mm, preferably 0.33 mm.

b.於該基材20上方形成一第一鍍膜層30,其厚度介於0.1 μm至5.0 μm之間,較佳為2.0 μm,並對該第一鍍膜層30相背於該第一鍍膜層30與該基材20彼此連接處的一側面上進行蝕刻,以形成一粗糙面31,其表面粗糙度(Ra)大約介於10 nm至1000 nm之間,以使該第一鍍膜層30的霧度介於1 %-35 %之間,即為一防炫光膜層(Anti-glare,AG),用於抑制外部光源之反射。其中,蝕刻程序係採用噴砂或濕式蝕刻,而濕式蝕刻所使用的蝕刻劑為鹽酸、硝酸、硫酸、檸檬酸、抗壞血酸、草酸、乙酸、氫氟酸、氟化銨、氟化鈉、氟化鉀、二氟化銨、二氟化鈉或二氟化鉀等。b. forming a first coating layer 30 above the substrate 20, the thickness of which is between 0.1 μm and 5.0 μm, preferably 2.0 μm, and the first coating layer 30 is opposite to the first coating layer 30 and the substrate 20 are etched on one side of the connection to form a rough surface 31, the surface roughness (Ra) of which is approximately between 10 nm and 1000 nm, so that the first coating layer 30 The haze is between 1%-35%, which is an anti-glare film (Anti-glare, AG), which is used to suppress the reflection of external light sources. Among them, the etching process adopts sand blasting or wet etching, and the etchant used in wet etching is hydrochloric acid, nitric acid, sulfuric acid, citric acid, ascorbic acid, oxalic acid, acetic acid, hydrofluoric acid, ammonium fluoride, sodium fluoride, fluorine Potassium chloride, ammonium difluoride, sodium difluoride or potassium difluoride, etc.

c.於該第一鍍膜層30上方真空濺鍍一第二鍍膜層40,並使該第二鍍膜層40填補於該粗糙面31的凹陷部分後,對該第二鍍膜層40進行第一次固化,而形成有一平整面41。其中,該固化溫度介於250 ℃至400 ℃之間,固化時間大約15至90分鐘,並避免加熱溫度過高、或超過玻璃轉化溫度(glass transition temperature, Tg),而容易有玻璃黃化等問題產生。此外,當基材20改為塑料材質時,必須在低於150 ℃下(即固化溫度介於25 ℃至150 ℃之間)進行蝕刻、濺鍍、固化等程序,以避免塑料裂解。此外,在本例中係使該第二鍍膜層40完全填滿該粗糙面31的凹陷部分後,再堆疊一預定厚度(例如堆疊厚度介於0.1 μm至2.0 μm之間),以完全覆蓋於該第一鍍膜層30上。在其他的實施態樣中,還可僅使該第二鍍膜層40完全填滿該粗糙面31的凹陷部分,同樣可以呈現一平坦的表面。c. Vacuum sputtering a second coating layer 40 above the first coating layer 30, and after the second coating layer 40 is filled in the concave portion of the rough surface 31, the second coating layer 40 is subjected to the first step solidified to form a flat surface 41 . Among them, the curing temperature is between 250°C and 400°C, and the curing time is about 15 to 90 minutes, and the heating temperature should be avoided from being too high or exceeding the glass transition temperature (glass transition temperature, Tg), which is prone to glass yellowing, etc. Problem arises. In addition, when the base material 20 is changed to plastic, etching, sputtering, and curing must be performed at a temperature lower than 150° C. (ie, the curing temperature is between 25° C. and 150° C.) to avoid cracking of the plastic. In addition, in this example, after the second coating layer 40 completely fills the concave portion of the rough surface 31, it is stacked with a predetermined thickness (for example, the stack thickness is between 0.1 μm and 2.0 μm) to completely cover the on the first coating layer 30 . In other embodiments, only the second coating layer 40 can completely fill up the concave portion of the rough surface 31 , which can also present a flat surface.

d.於該平整面41上進行濺鍍,以形成一第三鍍膜層50,其厚度介於0.1 μm至5.0 μm之間,較佳為2 μm,使各膜層間均不存在空隙P,即呈現一密合狀態,確保了結合的穩固性,達成防止該等膜層脫離的效果。在本例中係以與該第二鍍膜層40相同組成的靶材來濺鍍該第三鍍膜層50,以提高兩者彼此之間的結合關係。再者,該靶材的組成物為五氧化二鈮(Nb2O5),使該第二鍍膜層40與該第三鍍膜層50為具有相同可見光反射率的增透層(Anti-reflective coating,AR),且該反射率係介於0.5 %-1 %之間。接著,再對該第三鍍膜層50進行第二次固化。其中,該固化溫度介於80至500 ℃之間,固化時間大約15至90分鐘。d. Carry out sputtering on the flat surface 41 to form a third coating layer 50, the thickness of which is between 0.1 μm and 5.0 μm, preferably 2 μm, so that there is no gap P between each film layer, namely It presents a closely bonded state, which ensures the stability of the combination and achieves the effect of preventing the detachment of the film layers. In this example, the third coating layer 50 is sputtered with a target having the same composition as that of the second coating layer 40 to improve the bonding relationship between the two. Furthermore, the composition of the target is niobium pentoxide (Nb2O5), so that the second coating layer 40 and the third coating layer 50 are anti-reflective coatings (Anti-reflective coating, AR) with the same visible light reflectance , and the reflectivity is between 0.5%-1%. Then, the third coating layer 50 is cured for the second time. Wherein, the curing temperature is between 80 to 500° C., and the curing time is about 15 to 90 minutes.

e. 於該第三鍍膜層50上方覆設有一防護層70。其中,該防護層70具有防水、疏水及抗油污之特性,當該防護層70上被潑灑水或其他液體時,會自然形成水珠,並因疏水及抗油污的因素,而順勢滑落,且不易沾附指紋或油汙等汙染物,並便於擦拭乾淨。e. A protective layer 70 is covered on the third coating layer 50 . Wherein, the protective layer 70 has the characteristics of waterproof, hydrophobic and oil-resistant, when water or other liquids are splashed on the protective layer 70, water droplets will naturally form, and due to the factors of hydrophobic and oil-resistant, they will slide down along the way, and Resistant to pollutants such as fingerprints or oil, and easy to wipe clean.

f.於該基材20下方的位置上進行濺鍍,以形成一第四鍍膜層60,其厚度為2 μm。本例中係以與該第二鍍膜層40相同組成的靶材來濺鍍該第四鍍膜層60,該靶材選自氟化鈣、氟化鎂、氧化鈦、硫化鉛、硒化鉛所組成的群集中任一者或其組合,使該第二鍍膜層40與該第四鍍膜層60為具有相同可見光反射率的增透層(Anti-reflective coating,AR),且該反射率係介於0.5 %-1 %之間。f. Perform sputtering on the position below the substrate 20 to form a fourth coating layer 60 with a thickness of 2 μm. In this example, the fourth coating layer 60 is sputtered with a target having the same composition as that of the second coating layer 40, and the target is selected from calcium fluoride, magnesium fluoride, titanium oxide, lead sulfide, and lead selenide. Any one or a combination of the clusters formed, so that the second coating layer 40 and the fourth coating layer 60 are anti-reflective coatings (Anti-reflective coating, AR) with the same visible light reflectivity, and the reflectivity is between Between 0.5%-1%.

g.於該第四鍍膜層60下方設有一膠合層80。其中,該膠合層80包含有壓克力或聚酯等複合黏著劑組合物。g. An adhesive layer 80 is disposed under the fourth coating layer 60 . Wherein, the adhesive layer 80 includes a composite adhesive composition such as acrylic or polyester.

h.檢驗並包裝。h. Inspection and packing.

接著,續請參閱圖3所示,該防護結構A具體構造中,係依序包含了防護層70、第三鍍膜層50、第二鍍膜層40、第一鍍膜層30、基材20、第四鍍膜層60及膠合層80,其中,由於該基材20的兩側面均分別設有一增透層(即第三鍍膜層50與第四鍍膜層60),使該防護結構A的穿透率提升至78%,較習知技術的穿透率僅為70%,有大幅之改善。Then, continue referring to Fig. 3, in the concrete structure of this protective structure A, system comprises protective layer 70, the 3rd coating layer 50, the 2nd coating layer 40, the 1st coating layer 30, base material 20, the 2nd coating layer in sequence. Four coating layers 60 and glued layers 80, wherein, since the two sides of the substrate 20 are respectively provided with an anti-reflection layer (that is, the third coating layer 50 and the fourth coating layer 60), the penetration rate of the protective structure A It has been increased to 78%, which is a significant improvement compared with the conventional technology's penetration rate of only 70%.

再者,本發明所提供之該防護結構A係用於貼覆於一電子裝置上,除了作為保護之用,還可防止炫光效應,以及提高光線穿透率。其中,該電子裝置可為但不限於筆記型電腦、個人桌上型電腦、平板電腦、智慧型手機、電視、儀表板或其他類似的顯示裝置。本例中,如圖2所示,本發明所提供之該防護結構A係用於貼覆於一手機90的螢幕91上。Furthermore, the protective structure A provided by the present invention is used to be pasted on an electronic device, in addition to being used for protection, it can also prevent the glare effect and increase the light transmittance. Wherein, the electronic device may be, but not limited to, a notebook computer, a personal desktop computer, a tablet computer, a smart phone, a TV, a dashboard or other similar display devices. In this example, as shown in FIG. 2 , the protective structure A provided by the present invention is used to stick on the screen 91 of a mobile phone 90 .

此外,在另一實施例中,該第二鍍膜層40與第三鍍膜層50之間可選用不同組成物的靶材所濺鍍而成,且該第二鍍膜層40與該第四鍍膜層60之間亦可選用不同組成物的靶材所濺鍍而成。例如,靶材可為但不限於氟化鈣、氟化鎂、氧化鈦、硫化鉛、硒化鉛等。In addition, in another embodiment, the second coating layer 40 and the third coating layer 50 can be formed by sputtering targets with different compositions, and the second coating layer 40 and the fourth coating layer Between 60 and 60 can also be sputtered with targets of different compositions. For example, the target material can be but not limited to calcium fluoride, magnesium fluoride, titanium oxide, lead sulfide, lead selenide, and the like.

綜上所陳,本發明所提供避免膜層脫離之防護結構及其製備方法非僅可有效地提高各膜層間的結合強度,於長期使用後仍具有可靠且完整複合結構,不容易龜裂或剝落,再者,更可使光線穿透率得以具有更佳的效能表現,其功效已屬顯著,當合於專利法所稱之發明。To sum up, the protection structure and the preparation method provided by the present invention can not only effectively improve the bonding strength between each film layer, but also have a reliable and complete composite structure after long-term use, and it is not easy to crack or Peeling, moreover, can make the light transmittance have a better performance, and its effect is already remarkable, which should be in line with the invention called by the patent law.

10:玻璃基材 11:抗炫光學膜 12:抗反射增透膜 13:非平整表面 P:空隙 A:防護結構 20:基材 30:第一鍍膜層 31:粗糙面 40:第二鍍膜層 41:平整面 50:第三鍍膜層 60:第四鍍膜層 70:防護層 80:膠合層 90:手機 91:螢幕 10: Glass substrate 11:Anti-glare optical film 12: Anti-reflection AR coating 13: Non-flat surface P: space A: Protective structure 20: Substrate 30: The first coating layer 31: rough surface 40: Second coating layer 41: flat surface 50: The third coating layer 60: The fourth coating layer 70: protective layer 80: glued layer 90: mobile phone 91: screen

圖1係習知螢幕保護貼的剖視圖。 圖2係為本發明之一較佳實施例之防護結構組裝於手機螢幕上之示意圖。 圖3係為本發明之一較佳實施例之防護結構沿圖2中3-3剖面線的剖視圖。 圖4係為本發明之一較佳實施例就圖3之局部放大圖。 圖5係為本發明之一較佳實施例之製備方法的流程圖。 Fig. 1 is a sectional view of a conventional screen protector. Fig. 2 is a schematic diagram of a protective structure assembled on a mobile phone screen according to a preferred embodiment of the present invention. Fig. 3 is a cross-sectional view of a protective structure of a preferred embodiment of the present invention along section line 3-3 in Fig. 2 . FIG. 4 is a partially enlarged view of FIG. 3 in a preferred embodiment of the present invention. Fig. 5 is a flowchart of a preparation method of a preferred embodiment of the present invention.

20:基材 20: Substrate

30:第一鍍膜層 30: The first coating layer

31:粗糙面 31: rough surface

40:第二鍍膜層 40: Second coating layer

41:平整面 41: flat surface

50:第三鍍膜層 50: The third coating layer

70:防護層 70: protective layer

Claims (12)

一種避免膜層脫離之防護結構,係允許外部可見光穿透,並包括: 一基材; 一第一鍍膜層,設於該基材上; 一粗糙面,係利用蝕刻技術而形成於該第一鍍膜層相背於該第一鍍膜層與該基材彼此連接處的一側面上,以使該第一鍍膜層的霧度介於1 %-35 %之間; 一第二鍍膜層,係以真空濺鍍技術填補於該粗糙面的凹陷部分,並經固化後形成有一平整面;以及 一第三鍍膜層,設於該平整面上。 A protective structure to prevent film detachment, which allows external visible light to penetrate, and includes: a substrate; a first coating layer, disposed on the substrate; A rough surface is formed on the side of the first coating layer opposite to the connection between the first coating layer and the substrate by etching technology, so that the haze of the first coating layer is between 1%. Between -35%; A second coating layer is used to fill the concave part of the rough surface by vacuum sputtering technology, and form a flat surface after curing; and A third coating layer is arranged on the flat surface. 如請求項1所述避免膜層脫離之防護結構,其中,該第二鍍膜層與該第三鍍膜層為相同的組成物所構成。According to claim 1, the protective structure for preventing film layer detachment, wherein the second coating layer and the third coating layer are made of the same composition. 如請求項1所述避免膜層脫離之防護結構,其更包括一第四鍍膜層,設於該基材相背於該基材與該第一鍍膜層彼此連接處的另一側面上,且該第四鍍膜層與該第二鍍膜層或該第三鍍膜層為相同的組成物所構成。The protective structure for avoiding detachment of the film layer as described in claim 1, which further includes a fourth coating layer, which is arranged on the other side of the substrate opposite to the connection between the substrate and the first coating layer, and The fourth coating layer is composed of the same composition as the second coating layer or the third coating layer. 如請求項3所述避免膜層脫離之防護結構,其中,該組成物係五氧化二鈮,並使該第二鍍膜層、該第三鍍膜層與第四鍍膜層具有相同的可見光反射率,該反射率係介於0.5 %-1 %之間。The protective structure for avoiding detachment of the film layer as described in claim 3, wherein the composition is niobium pentoxide, and the second coating layer, the third coating layer and the fourth coating layer have the same visible light reflectance, The reflectivity is between 0.5%-1%. 如請求項1所述避免膜層脫離之防護結構,其中,該基材的材質為玻璃。The protective structure for avoiding detachment of the film layer according to claim 1, wherein the material of the substrate is glass. 如請求項1所述避免膜層脫離之防護結構,其中,該基材的材質係選自聚甲基丙烯酸甲酯(PMMA)、聚碳酸酯(PC)、聚醯氨(PA)及高分子樹脂任其中一者。The protective structure for avoiding the detachment of the film layer as described in claim 1, wherein the material of the substrate is selected from polymethyl methacrylate (PMMA), polycarbonate (PC), polyamide (PA) and macromolecule Resin is any one of them. 一種避免膜層脫離之防護結構的製備方法,包含以下步驟: a.     取一基材; b.     於該基材上方形成一第一鍍膜層,並對該第一鍍膜層進行蝕刻,以形成一粗糙面; c.     於該第一鍍膜層上方真空濺鍍一第二鍍膜層,並使該第二鍍膜層填補於該粗糙面的凹陷部分後,對該第二鍍膜層進行第一次固化,而形成有一平整面; d.     於該平整面上方形成一第三鍍膜層,再對該第三鍍膜層進行第二次固化。 A method for preparing a protective structure for avoiding detachment of the film layer, comprising the following steps: a. Take a substrate; b. forming a first coating layer on the substrate, and etching the first coating layer to form a rough surface; c. Vacuum sputtering a second coating layer above the first coating layer, and after the second coating layer is filled in the concave part of the rough surface, the second coating layer is cured for the first time to form a flat surface; d. Forming a third coating layer above the flat surface, and then curing the third coating layer for the second time. 如請求項7所述避免膜層脫離之防護結構的製備方法,其中,在步驟d中,係以與該第二鍍膜層相同組成的靶材濺鍍出該第三鍍膜層。The method for preparing a protective structure for avoiding detachment of film layers according to claim 7, wherein, in step d, the third coating layer is sputtered with a target having the same composition as that of the second coating layer. 如請求項7所述避免膜層脫離之防護結構的製備方法,其更包括接續於該步驟d之後的步驟e,該步驟e係以與該第二鍍膜層相同組成的靶材於該基材下方的位置上進行濺鍍,以形成一第四鍍膜層。The method for preparing a protective structure that prevents the detachment of the film layer as described in claim 7, it further includes step e following the step d, and the step e is to use a target material with the same composition as the second coating layer on the substrate Sputtering is performed on the position below to form a fourth coating layer. 如請求項9所述避免膜層脫離之防護結構的製備方法,其中,該靶材選為五氧化二鈮,使該第二鍍膜層、該第三鍍膜層與第四鍍膜層具有相同的可見光反射率,且該反射率係介於0.5 %-1 %之間。The preparation method of the protective structure that prevents the detachment of the film layer as described in claim 9, wherein the target material is niobium pentoxide, so that the second coating layer, the third coating layer and the fourth coating layer have the same visible light reflectivity, and the reflectivity is between 0.5%-1%. 如請求項7所述避免膜層脫離之防護結構的製備方法,其中,該基材的材質為玻璃。The method for preparing a protective structure for avoiding detachment of the film layer according to claim 7, wherein the material of the substrate is glass. 如請求項7所述避免膜層脫離之防護結構的製備方法,其中,該基材的材質係選自聚甲基丙烯酸甲酯(PMMA)、聚碳酸酯(PC)、聚醯氨(PA)及高分子樹脂任其中一者。The preparation method of the protective structure that avoids the detachment of the film layer as described in claim item 7, wherein the material of the substrate is selected from polymethyl methacrylate (PMMA), polycarbonate (PC), polyamide (PA) and any one of polymer resins.
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