JP2001228330A - Birefringent plate - Google Patents
Birefringent plateInfo
- Publication number
- JP2001228330A JP2001228330A JP2000039274A JP2000039274A JP2001228330A JP 2001228330 A JP2001228330 A JP 2001228330A JP 2000039274 A JP2000039274 A JP 2000039274A JP 2000039274 A JP2000039274 A JP 2000039274A JP 2001228330 A JP2001228330 A JP 2001228330A
- Authority
- JP
- Japan
- Prior art keywords
- film
- antireflection film
- birefringent plate
- antireflection
- obliquely deposited
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 36
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims abstract description 28
- 238000000034 method Methods 0.000 claims abstract description 26
- 150000002500 ions Chemical class 0.000 claims abstract description 19
- 238000007740 vapor deposition Methods 0.000 claims abstract description 19
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims abstract description 18
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 16
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 238000000151 deposition Methods 0.000 claims abstract description 11
- 239000000463 material Substances 0.000 claims description 9
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 6
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 5
- 230000003287 optical effect Effects 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 abstract description 22
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 17
- 239000000377 silicon dioxide Substances 0.000 abstract description 17
- 229910044991 metal oxide Inorganic materials 0.000 abstract description 15
- 150000004706 metal oxides Chemical class 0.000 abstract description 15
- 239000011521 glass Substances 0.000 abstract description 7
- 239000011248 coating agent Substances 0.000 abstract 6
- 238000000576 coating method Methods 0.000 abstract 6
- 239000002344 surface layer Substances 0.000 abstract 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 11
- 238000010586 diagram Methods 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000000869 ion-assisted deposition Methods 0.000 description 2
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Polarising Elements (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、１／４波長板等の
複屈折板に関するものである。さらに詳しくは、斜め蒸
着膜を用いた複屈折板における膜構造に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a birefringent plate such as a quarter-wave plate. More specifically, the present invention relates to a film structure of a birefringent plate using an obliquely deposited film.
【０００２】[0002]
【従来の技術】複屈折板としては、光学異方性結晶を加
工したもの、高分子フィルムを伸延したもの、液晶を利
用したもの、斜め蒸着膜を利用したもの等がある。これ
らの複屈折板のうち、斜め蒸着膜を利用したものは、複
屈折性を備えた膜を広い領域にわたって一度に形成する
ことができるので、製造コストを低減できるとして注目
を浴びている。2. Description of the Related Art Birefringent plates include those obtained by processing optically anisotropic crystals, those obtained by elongating a polymer film, those using liquid crystal, and those using obliquely deposited films. Among these birefringent plates, those using an obliquely deposited film have attracted attention because they can form a film having birefringence over a wide area at once, and can reduce the manufacturing cost.
【０００３】このような複屈折板のうち、図５に示す複
屈折板１は、透明なガラスの基板２の表面に、真空蒸着
膜からなる下地膜３、斜め蒸着法により複屈折性が付与
された五酸化タンタル（Ｔａ2Ｏ5）等の金属酸化膜から
なる斜め蒸着膜４、および真空蒸着膜からなる反射防止
膜５がこの順で形成されている。ここで、反射防止膜５
は、二酸化珪素（ＳｉＯ2）またはフッ化マグネシウム
（ＭｇＦ2）等の真空蒸着膜が用いられている。Among such birefringent plates, a birefringent plate 1 shown in FIG. 5 has a base film 3 made of a vacuum deposited film on a surface of a transparent glass substrate 2 and has a birefringence by an oblique deposition method. An obliquely deposited film 4 made of a metal oxide film such as tantalum pentoxide (Ta 2 O 5 ) and an antireflection film 5 made of a vacuum deposited film are formed in this order. Here, the antireflection film 5
Uses a vacuum deposited film of silicon dioxide (SiO 2 ) or magnesium fluoride (MgF 2 ).
【０００４】このように構成した複屈折板１において、
反射防止膜５を構成する二酸化珪素膜またはフッ化マグ
ネシウム膜は、五酸化タンタルからなる斜め蒸着膜４と
の密着性が低いので、反射防止膜５が剥離しやすいとい
う問題点がある。また、斜め蒸着膜４は柱状組織として
形成されるので、膜内部に大きな応力をもっている。こ
のような大きな内部応力が膜中に存在するのは、斜め蒸
着膜４が反射防止膜５と比較して厚いということにも起
因している。このため、斜め蒸着膜４は、温度湿度の変
化等で膨張、収縮しやすいという性質を有し、このよう
な膨張、収縮が起こると、斜め蒸着膜４と反射防止膜５
との密着性がさらに低下し、反射防止膜５が剥離してし
まう。In the birefringent plate 1 configured as described above,
Since the silicon dioxide film or the magnesium fluoride film constituting the antireflection film 5 has low adhesion to the obliquely deposited film 4 made of tantalum pentoxide, there is a problem that the antireflection film 5 is easily peeled off. Further, since the obliquely deposited film 4 is formed as a columnar structure, it has a large stress inside the film. The presence of such a large internal stress in the film is also due to the fact that the obliquely deposited film 4 is thicker than the antireflection film 5. For this reason, the obliquely deposited film 4 has a property of easily expanding and contracting due to a change in temperature and humidity, and when such expansion and contraction occur, the obliquely deposited film 4 and the antireflection film 5 are formed.
And the anti-reflection film 5 is peeled off.
【０００５】このような反射防止膜５の剥離を防止する
方法として、特開平９−２９７２１４号公報には、反射
防止膜５を多層構造にするとともに、この反射防止膜５
において、斜め蒸着膜３と接する層を斜め蒸着膜４と同
一材料とする発明が開示されている。As a method of preventing such peeling of the anti-reflection film 5, Japanese Patent Application Laid-Open No. 9-297214 discloses that the anti-reflection film 5 has a multilayer structure,
Discloses that the layer in contact with the obliquely deposited film 3 is made of the same material as the obliquely deposited film 4.
【０００６】この発明を用いれば、たとえば、図６に示
すように、透明なガラスの基板２の表面に、真空蒸着膜
からなる下地膜３、斜め蒸着法により複屈折性が付与さ
れた五酸化タンタル（Ｔａ2Ｏ5）等の金属酸化膜からな
る斜め蒸着膜４、および真空蒸着膜からなる反射防止膜
５をこの順に形成するが、反射防止膜５については、斜
め蒸着膜４の上に真空蒸着法により形成された五酸化タ
ンタル（Ｔａ2Ｏ5）等の金属酸化膜からなる第１の反射
防止膜５１、この第１の反射防止膜５１の上に真空蒸着
法により形成された第２の反射防止膜５２、およびこの
第２の反射防止膜５２の上に真空蒸着法により形成され
た二酸化珪素（ＳｉＯ2）またはフッ化マグネシウム
（ＭｇＦ2）等からなる第３の反射防止膜５３を備える
多層構造とする。According to the present invention, for example, as shown in FIG. 6, a transparent glass substrate 2 has a base film 3 made of a vacuum-deposited film on a surface of the substrate 2 and a pentoxide having birefringence imparted by an oblique deposition method. An obliquely deposited film 4 made of a metal oxide film such as tantalum (Ta 2 O 5 ) and an antireflection film 5 made of a vacuum deposited film are formed in this order, and the antireflection film 5 is formed on the obliquely deposited film 4. A first antireflection film 51 made of a metal oxide film such as tantalum pentoxide (Ta 2 O 5 ) formed by a vacuum evaporation method, and a first antireflection film 51 formed on the first antireflection film 51 by a vacuum evaporation method 2 anti-reflection film 52, and a third anti-reflection film 53 made of silicon dioxide (SiO 2 ) or magnesium fluoride (MgF 2 ) formed on the second anti-reflection film 52 by a vacuum evaporation method. Multi-layer structure with
【０００７】このような構造によれば、五酸化タンタル
（Ｔａ2Ｏ5）等の金属酸化膜からなる斜め蒸着膜４と、
二酸化珪素（ＳｉＯ2）またはフッ化マグネシウム（Ｍ
ｇＦ2）からなる最表層の第３の反射防止膜５３との間
に、斜め蒸着膜４との密着性が高い五酸化タンタル（Ｔ
ａ2Ｏ5）等からなる第１の反射防止膜５１が形成されて
いるので、反射防止膜５が剥離しにくくなる。According to such a structure, the obliquely deposited film 4 made of a metal oxide film such as tantalum pentoxide (Ta 2 O 5 )
Silicon dioxide (SiO 2 ) or magnesium fluoride (M
gF 2 ) and the third anti-reflection film 53 as the outermost layer, tantalum pentoxide (T) having high adhesion to the obliquely deposited film 4.
Since the first anti-reflection film 51 made of a 2 O 5 ) or the like is formed, the anti-reflection film 5 does not easily peel off.
【０００８】[0008]
【発明が解決しようとする課題】しかしながら、図６に
示す複屈折板１のように、反射防止膜５を多層構造にし
た場合には、第１の反射防止膜５１および第２の反射防
止膜５２は剥離しないものの、最表層の第３の反射防止
膜５３のみが剥離してしまうという問題点がある。すな
わち、斜め蒸着膜４が内部応力によって膨張、収縮した
際には、その上層に位置する第１の反射防止膜５１およ
び第２の反射防止膜５２も斜め蒸着膜４と一緒に変形す
るため、その応力によって、第２の反射防止膜５２と第
３の反射防止膜５３との密着性が低下し、第３の反射防
止膜５３だけが剥離してしまうのである。However, when the antireflection film 5 has a multilayer structure as in the birefringent plate 1 shown in FIG. 6, the first antireflection film 51 and the second antireflection film are provided. Although 52 does not peel off, there is a problem that only the outermost third antireflection film 53 peels off. That is, when the obliquely deposited film 4 expands and contracts due to internal stress, the first anti-reflection film 51 and the second anti-reflective film 52 located thereon are also deformed together with the obliquely deposited film 4. Due to the stress, the adhesion between the second antireflection film 52 and the third antireflection film 53 is reduced, and only the third antireflection film 53 is peeled off.
【０００９】以上の問題点に鑑みて、本発明の課題は、
反射防止膜の最表層の剥離を確実に防止することのでき
る複屈折板を提案することにある。[0009] In view of the above problems, an object of the present invention is to provide:
An object of the present invention is to propose a birefringent plate capable of reliably preventing the outermost layer of the antireflection film from peeling off.
【００１０】[0010]
【課題を解決するための手段】上記課題を解決するた
め、本発明においては、基板と、該基板上に光学材料を
斜め蒸着することにより形成した複屈折性を備えた斜め
蒸着膜と、該斜め蒸着膜上に形成した反射防止膜とを有
する複屈折板において、前記反射防止膜の少なくとも最
表層は、イオンアシスト蒸着法により形成された層であ
ることを特徴とする。In order to solve the above-mentioned problems, in the present invention, there is provided a substrate, an obliquely deposited birefringent film formed by obliquely depositing an optical material on the substrate, and In a birefringent plate having an antireflection film formed on an obliquely deposited film, at least the outermost layer of the antireflection film is a layer formed by an ion-assisted vapor deposition method.
【００１１】本発明に係る複屈折板では、複屈折膜を斜
め蒸着膜によって形成するが、この斜め蒸着膜の表面に
反射防止膜を形成する際に、反射防止膜の少なくとも最
表層についてはイオンアシスト蒸着法により形成するの
で、温度や湿度の変化があっても、反射防止膜の最表層
が剥離することを確実に防止できる。その理由として、
イオンアシスト蒸着法では、従来の真空蒸着法に比較し
て、大きなエネルギーをもった原子、分子が蒸着される
ので、このエネルギーによって、最表層の下層側との密
着性、さらには下層側の膜同士の密着性が向上するため
であると考えられる。In the birefringent plate according to the present invention, the birefringent film is formed by an obliquely deposited film. When an antireflection film is formed on the surface of the obliquely deposited film, at least the outermost layer of the antireflection film is ionized. Since the film is formed by the assist evaporation method, it is possible to reliably prevent the outermost layer of the antireflection film from peeling off even when there is a change in temperature or humidity. As a reason,
In the ion-assisted vapor deposition method, atoms and molecules having a large energy are deposited compared to the conventional vacuum deposition method, and this energy is used to adhere to the lower surface of the outermost layer, and further, to form a film on the lower layer. It is considered that this is because the adhesion between them is improved.
【００１２】本発明において、前記反射防止膜の最表層
は、たとえば、シリコン酸化物またはフッ化マグネシウ
ムの層である。In the present invention, the outermost layer of the antireflection film is, for example, a layer of silicon oxide or magnesium fluoride.
【００１３】本発明において、前記反射防止膜は、前記
最表層より下層側に当該最表層と異なる材料を真空蒸着
することにより形成した下層を備えている構成であって
もよい。本発明では、反射防止膜の最表層がイオンアシ
スト蒸着法によって形成されるので、その下層側につい
ての成膜条件に制約がない。従って、反射防止膜の下層
側については、反射防止層の最上層と異なり、斜め蒸着
膜との密着性のよい材料を真空蒸着法により形成しても
よい。In the present invention, the antireflection film may have a lower layer formed by vacuum-depositing a material different from the outermost layer below the outermost layer. In the present invention, since the outermost layer of the antireflection film is formed by the ion-assisted vapor deposition method, there is no restriction on the film forming conditions on the lower layer side. Therefore, on the lower layer side of the antireflection film, unlike the uppermost layer of the antireflection layer, a material having good adhesion to the obliquely deposited film may be formed by a vacuum deposition method.
【００１４】また、本発明において、前記反射防止膜
は、前記最表層より下層側に当該最表層と異なる材料を
イオンアシスト蒸着することにより形成した下層を備え
ている構成であってもよい。このように構成すると、下
層側の密着性が向上するという利点がある。In the present invention, the antireflection film may have a lower layer formed by ion-assisted deposition of a material different from the outermost layer below the outermost layer. With this configuration, there is an advantage that the adhesion on the lower layer side is improved.
【００１５】本発明において、前記反射防止膜の前記下
層については、斜め蒸着膜との密着性のよいタンタル酸
化物またはチタン酸化物から形成することが好ましい。In the present invention, it is preferable that the lower layer of the antireflection film is formed of a tantalum oxide or a titanium oxide having good adhesion to an obliquely deposited film.
【００１６】本発明において、前記斜め蒸着膜がタンタ
ル酸化物により形成されている場合には、前記反射防止
膜において前記斜め蒸着膜と接する最下層もタンタル酸
化物により形成されていることが好ましい。In the present invention, when the obliquely deposited film is formed of tantalum oxide, it is preferable that the lowermost layer of the antireflection film that is in contact with the obliquely deposited film is also formed of tantalum oxide.
【００１７】[0017]
【発明の実施の形態】以下に、図面を参照して、本発明
の複屈折板を説明する。なお、本発明を適用した複屈折
板も、基本的な構造自身は従来の複屈折板と共通するの
で、共通する部分には同一の符号を付してある。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a birefringent plate of the present invention will be described with reference to the drawings. The basic structure of the birefringent plate to which the present invention is applied is also the same as that of the conventional birefringent plate, and thus the common parts are denoted by the same reference numerals.
【００１８】［実施の形態１］図１は、本発明の実施の
形態１に係る複屈折板の構造を示す説明図である。[First Embodiment] FIG. 1 is an explanatory view showing a structure of a birefringent plate according to a first embodiment of the present invention.
【００１９】図１において、本形態の複屈折板１では、
透明なガラスの基板２の表面に、真空蒸着膜からなる下
地膜３、斜め蒸着法により複屈折性が付与された五酸化
タンタル（Ｔａ2Ｏ5）等の金属酸化膜からなる斜め蒸着
膜４、および二酸化珪素（ＳｉＯ2）やフッ化マグネシ
ウム（ＭｇＦ2）等からなる反射防止膜５がこの順に形
成されている。ここで、下地膜３は、基板２と斜め蒸着
膜４との密着性を高める機能を担っている。In FIG. 1, in the birefringent plate 1 of the present embodiment,
A base film 3 made of a vacuum-deposited film and an obliquely deposited film 4 made of a metal oxide film such as tantalum pentoxide (Ta 2 O 5 ) provided with birefringence by an oblique deposition method on a surface of a transparent glass substrate 2. And an anti-reflection film 5 made of silicon dioxide (SiO 2 ), magnesium fluoride (MgF 2 ), or the like. Here, the base film 3 has a function of improving the adhesion between the substrate 2 and the obliquely deposited film 4.
【００２０】本形態において、反射防止膜５は、二酸化
珪素やフッ化マグネシウムからなる層であるが、このよ
うな反射防止膜５はイオンアシスト蒸着法により形成さ
れる。ここで、二酸化珪素（ＳｉＯ2）またはフッ化マ
グネシウム（ＭｇＦ2）は、屈折率が低いので反射防止
効果が高い。また、二酸化珪素（ＳｉＯ2）またはフッ
化マグネシウム（ＭｇＦ2）は、通常の真空蒸着法で形
成すると下層側の五酸化タンタル（Ｔａ2Ｏ5）や二酸化
チタン（ＴｉＯ2）との密着性が低いが、本形態では、
イオンアシスト蒸着法で形成したので、下層側の五酸化
タンタル（Ｔａ2Ｏ5）や二酸化チタン（ＴｉＯ2）との
密着性が高い。In the present embodiment, the antireflection film 5 is a layer made of silicon dioxide or magnesium fluoride. Such an antireflection film 5 is formed by an ion assisted vapor deposition method. Here, silicon dioxide (SiO 2 ) or magnesium fluoride (MgF 2 ) has a high antireflection effect because of its low refractive index. When silicon dioxide (SiO 2 ) or magnesium fluoride (MgF 2 ) is formed by a normal vacuum deposition method, the adhesion with the lower layer of tantalum pentoxide (Ta 2 O 5 ) or titanium dioxide (TiO 2 ) is reduced. Although low, in this embodiment,
Since it is formed by the ion assisted vapor deposition method, it has high adhesion to tantalum pentoxide (Ta 2 O 5 ) and titanium dioxide (TiO 2 ) on the lower layer side.
【００２１】このように構成した複屈折板１では、複屈
折膜を斜め蒸着膜４によって形成するが、この斜め蒸着
膜４の表面に反射防止膜５を形成する際にイオンアシス
ト蒸着法を用いる。このイオンアシスト蒸着法では、基
板２に向けてイオンを照射しながら蒸着を行なうため、
従来の真空蒸着法に比較して大きなエネルギーをもった
原子、分子が蒸着されることになる。従って、反射防止
膜５は、下層側（斜め蒸着膜４）の表面との密着性が高
いので、温度や湿度に急激な変化があっても、反射防止
膜５が斜め蒸着膜４から剥離することを確実に防止でき
る。In the birefringent plate 1 configured as described above, the birefringent film is formed by the obliquely deposited film 4, and when the antireflection film 5 is formed on the surface of the obliquely deposited film 4, an ion-assisted vapor deposition method is used. . In this ion assisted vapor deposition method, vapor deposition is performed while irradiating ions toward the substrate 2.
As a result, atoms and molecules having larger energy than the conventional vacuum deposition method are deposited. Therefore, since the antireflection film 5 has high adhesion to the surface of the lower layer (obliquely deposited film 4), the antireflection film 5 is separated from the obliquely deposited film 4 even if there is a sudden change in temperature or humidity. Can be reliably prevented.
【００２２】［実施の形態２］図２は、本発明の実施の
形態２に係る複屈折板の構造を示す説明図である。[Embodiment 2] FIG. 2 is an explanatory view showing the structure of a birefringent plate according to Embodiment 2 of the present invention.
【００２３】図２において、本形態の複屈折板１では、
透明なガラスの基板２の表面に、真空蒸着膜からなる下
地膜３、斜め蒸着法により複屈折性が付与された五酸化
タンタル（Ｔａ2Ｏ5）等の金属酸化膜からなる斜め蒸着
膜４、および反射防止膜５がこの順に形成されている。In FIG. 2, in the birefringent plate 1 of the present embodiment,
A base film 3 made of a vacuum-deposited film and an obliquely deposited film 4 made of a metal oxide film such as tantalum pentoxide (Ta 2 O 5 ) provided with birefringence by an oblique deposition method on a surface of a transparent glass substrate 2. , And the antireflection film 5 are formed in this order.
【００２４】本形態において、反射防止膜５は、斜め蒸
着膜４の上に真空蒸着法により形成された五酸化タンタ
ル（Ｔａ2Ｏ5）等の金属酸化膜からなる第１の反射防止
膜５１、この第１の反射防止膜５１の上に真空蒸着法に
より形成された二酸化チタン（ＴｉＯ2）等の金属酸化
膜からなる第２の反射防止膜５２、およびこの第２の反
射防止膜５２の上に形成された二酸化珪素（ＳｉＯ2）
またはフッ化マグネシウム（ＭｇＦ2）等からなる第３
の反射防止膜５３を備える多層構造になっている。ここ
で、多層に形成された反射防止膜５のうち、第１の反射
防止膜５１および第２の反射防止膜５２に用いられた五
酸化タンタル（Ｔａ2Ｏ5）および二酸化チタン（ＴｉＯ
2）は、いずれも斜め蒸着膜４と密着性の高い材料であ
る。In this embodiment, the antireflection film 5 is a first antireflection film 51 made of a metal oxide film such as tantalum pentoxide (Ta 2 O 5 ) formed on the obliquely deposited film 4 by a vacuum deposition method. A second anti-reflection film 52 made of a metal oxide film such as titanium dioxide (TiO 2 ) formed on the first anti-reflection film 51 by a vacuum evaporation method; Silicon dioxide (SiO 2 ) formed on
Or a third made of magnesium fluoride (MgF 2 ) or the like
Has a multi-layer structure including the anti-reflection film 53. The tantalum pentoxide (Ta 2 O 5 ) and titanium dioxide (TiO 2 ) used for the first anti-reflection film 51 and the second anti-reflection film 52 of the multi-layer anti-reflection film 5 are used.
2 ) are materials having high adhesion to the obliquely deposited film 4.
【００２５】本形態において、最表層の第３の反射防止
膜５３については、イオンアシスト蒸着法により形成さ
れた二酸化珪素（ＳｉＯ2）またはフッ化マグネシウム
（ＭｇＦ2）等からなる。この二酸化珪素（ＳｉＯ2）ま
たはフッ化マグネシウム（ＭｇＦ2）は、屈折率が低い
ので反射防止効果が高い。また、二酸化珪素（Ｓｉ
Ｏ2）またはフッ化マグネシウム（ＭｇＦ2）は、通常の
真空蒸着法で形成すると下層側の五酸化タンタル（Ｔａ
2Ｏ5）や二酸化チタン（ＴｉＯ2）との密着性が低い
が、本形態では、イオンアシスト蒸着法で形成したの
で、下層側の五酸化タンタル（Ｔａ2Ｏ5）や二酸化チタ
ン（ＴｉＯ2）との密着性が高い。In this embodiment, the outermost third antireflection film 53 is made of silicon dioxide (SiO 2 ), magnesium fluoride (MgF 2 ), or the like formed by ion-assisted vapor deposition. Since silicon dioxide (SiO 2 ) or magnesium fluoride (MgF 2 ) has a low refractive index, it has a high antireflection effect. In addition, silicon dioxide (Si
When O 2 ) or magnesium fluoride (MgF 2 ) is formed by a normal vacuum deposition method, tantalum pentoxide (Ta)
Adhesion with 2 O 5 ) and titanium dioxide (TiO 2 ) is low, but in this embodiment, since it is formed by an ion assisted vapor deposition method, tantalum pentoxide (Ta 2 O 5 ) and titanium dioxide (TiO 2 ) on the lower layer side are formed. ) And high adhesion.
【００２６】このように構成した複屈折板１では、複屈
折膜を斜め蒸着膜４によって形成するが、この斜め蒸着
膜４の表面に反射防止膜５を形成する際に、少なくとも
最表層の第３の反射防止膜５３についてはイオンアシス
ト蒸着法を用いる。このため、反射防止膜５の最表層た
る第３の反射防止膜５３は、下層側（第２の反射防止膜
５２）との密着性が高く、かつ、第３の反射防止膜５３
の下層側における膜同士の密着性が高い。それ故、本形
態によれば、温度や湿度に急激な変化があっても、反射
防止膜５の最表層（第３の反射防止膜５３）が剥離する
ことを確実に防止できる。In the birefringent plate 1 configured as described above, the birefringent film is formed by the obliquely deposited film 4. When the antireflection film 5 is formed on the surface of the obliquely deposited film 4, at least the outermost layer is formed. For the third antireflection film 53, an ion-assisted vapor deposition method is used. For this reason, the third anti-reflection film 53, which is the outermost layer of the anti-reflection film 5, has high adhesion to the lower layer (the second anti-reflection film 52) and has the third anti-reflection film 53.
The adhesion between the films on the lower layer side is high. Therefore, according to this embodiment, even if there is a sudden change in temperature or humidity, the outermost layer (third antireflection film 53) of antireflection film 5 can be reliably prevented from peeling off.
【００２７】［実施の形態３］図３は、本発明の実施の
形態３に係る複屈折板の構造を示す説明図である。[Third Embodiment] FIG. 3 is an explanatory view showing a structure of a birefringent plate according to a third embodiment of the present invention.
【００２８】図３において、本形態の複屈折板１では、
透明なガラスの基板２の表面に、真空蒸着膜からなる下
地膜３、斜め蒸着法により複屈折性が付与された五酸化
タンタル（Ｔａ2Ｏ5）等の金属酸化膜からなる斜め蒸着
膜４、および反射防止膜５がこの順に形成されている。In FIG. 3, in the birefringent plate 1 of the present embodiment,
A base film 3 made of a vacuum-deposited film and an obliquely deposited film 4 made of a metal oxide film such as tantalum pentoxide (Ta 2 O 5 ) provided with birefringence by an oblique deposition method on a surface of a transparent glass substrate 2. , And the antireflection film 5 are formed in this order.
【００２９】本形態において、反射防止膜５は、斜め蒸
着膜４の上に真空蒸着法により形成された五酸化タンタ
ル（Ｔａ2Ｏ5）等の金属酸化膜からなる第１の反射防止
膜５１、この第１の反射防止膜５１の上に真空蒸着法に
より形成された二酸化チタン（ＴｉＯ2）等の金属酸化
膜からなる第２の反射防止膜５２、この第２の反射防止
膜５２の上に真空蒸着法により形成された五酸化タンタ
ル（Ｔａ2Ｏ5）、二酸化チタン（ＴｉＯ2）などの金属
酸化膜からなる第３の反射防止膜５３、およびこの第３
の反射防止膜５３の上に形成された二酸化珪素（ＳｉＯ
2）またはフッ化マグネシウム（ＭｇＦ2）等からなる第
４の反射防止膜５４を備える多層構造になっている。In this embodiment, the anti-reflection film 5 is a first anti-reflection film 51 made of a metal oxide film such as tantalum pentoxide (Ta 2 O 5 ) formed on the oblique evaporation film 4 by a vacuum evaporation method. A second anti-reflection film 52 made of a metal oxide film such as titanium dioxide (TiO 2 ) formed on the first anti-reflection film 51 by a vacuum evaporation method; A third antireflection film 53 made of a metal oxide film such as tantalum pentoxide (Ta 2 O 5 ) or titanium dioxide (TiO 2 ) formed by a vacuum evaporation method;
Silicon dioxide (SiO 2) formed on the anti-reflection film 53 of
2 ) or a multilayer structure including a fourth anti-reflection film 54 made of magnesium fluoride (MgF 2 ) or the like.
【００３０】また、多層に形成された反射防止膜５のう
ち、最表層の第４の反射防止膜５４については、イオン
アシスト蒸着法により形成された二酸化珪素（Ｓｉ
Ｏ2）またはフッ化マグネシウム（ＭｇＦ2）等からな
る。The outermost fourth anti-reflection film 54 of the multi-layer anti-reflection film 5 is made of silicon dioxide (Si) formed by ion-assisted evaporation.
O 2 ) or magnesium fluoride (MgF 2 ).
【００３１】このように構成した複屈折板１では、複屈
折膜を斜め蒸着膜４によって形成するが、この斜め蒸着
膜４の表面に反射防止膜５を形成する際に、少なくとも
最表層の第４の反射防止膜５４についてはイオンアシス
ト蒸着法を用いる。このため、反射防止膜５の最表層た
る第４の反射防止膜５４は、下層側（第３の反射防止膜
５３）との密着性が高く、かつ、第４の反射防止膜５４
の下層側における膜同士の密着性が高い。それ故、本形
態によれば、温度や湿度に急激な変化があっても、反射
防止膜５の最表層（第４の反射防止膜５４）が剥離する
ことを確実に防止できる。In the birefringent plate 1 configured as described above, the birefringent film is formed by the obliquely deposited film 4. When the antireflection film 5 is formed on the surface of the obliquely deposited film 4, at least the outermost layer is formed. For the fourth antireflection film 54, an ion-assisted vapor deposition method is used. Therefore, the fourth anti-reflection film 54, which is the outermost layer of the anti-reflection film 5, has high adhesion to the lower layer (the third anti-reflection film 53), and the fourth anti-reflection film 54
The adhesion between the films on the lower layer side is high. Therefore, according to this embodiment, even if there is a sudden change in temperature or humidity, the outermost layer (the fourth antireflection film 54) of the antireflection film 5 can be reliably prevented from peeling off.
【００３２】［実施の形態４］図４は、本発明の実施の
形態４に係る複屈折板の構造を示す説明図である。[Fourth Embodiment] FIG. 4 is an explanatory diagram showing a structure of a birefringent plate according to a fourth embodiment of the present invention.
【００３３】図４において、本形態の複屈折板１では、
透明なガラスの基板２の表面に、真空蒸着膜からなる下
地膜３、斜め蒸着法により複屈折性が付与された五酸化
タンタル（Ｔａ2Ｏ5）等の金属酸化膜からなる斜め蒸着
膜４、および反射防止膜５がこの順に形成されている。In FIG. 4, in the birefringent plate 1 of the present embodiment,
A base film 3 made of a vacuum-deposited film and an obliquely deposited film 4 made of a metal oxide film such as tantalum pentoxide (Ta 2 O 5 ) provided with birefringence by an oblique deposition method on a surface of a transparent glass substrate 2. , And the antireflection film 5 are formed in this order.
【００３４】本形態において、反射防止膜５は、斜め蒸
着膜４の上に形成された五酸化タンタル（Ｔａ2Ｏ5）等
の金属酸化膜からなる第１の反射防止膜５１、およびこ
の第１の反射防止膜５１の上に形成された二酸化珪素
（ＳｉＯ2）またはフッ化マグネシウム（ＭｇＦ2）等か
らなる第２の反射防止膜５２を備える多層構造になって
いる。In the present embodiment, the anti-reflection film 5 includes a first anti-reflection film 51 formed of a metal oxide film such as tantalum pentoxide (Ta 2 O 5 ) formed on the obliquely deposited film 4, and the first anti-reflection film 51. The multilayer structure has a second anti-reflection film 52 made of silicon dioxide (SiO 2 ) or magnesium fluoride (MgF 2 ) formed on one anti-reflection film 51.
【００３５】また、反射防止膜５を構成する第１の反射
防止膜５１および第２の反射防止膜５２はいずれも、イ
オンアシスト蒸着法により形成された層である。The first anti-reflection film 51 and the second anti-reflection film 52 constituting the anti-reflection film 5 are both layers formed by ion-assisted vapor deposition.
【００３６】このように構成した複屈折板１では、複屈
折膜を斜め蒸着膜４によって形成するが、この斜め蒸着
膜４の表面に反射防止膜５を形成する際に、下層側の第
１の反射防止膜５１、および最表層の第２の反射防止膜
５２のいずれについても、イオンアシスト蒸着法を用い
たため、反射防止膜５の最表層たる第２の反射防止膜５
２は下層側（第１の反射防止膜５１）との密着性が高
く、かつ、第１の反射防止膜５１も斜め蒸着膜４との密
着性が高い。それ故、本形態によれば、温度や湿度に急
激な変化があっても、反射防止膜５（第１の反射防止膜
５１および第２の反射防止膜５２）が剥離することを確
実に防止できる。In the birefringent plate 1 thus configured, the birefringent film is formed by the obliquely deposited film 4. When the antireflection film 5 is formed on the surface of the obliquely deposited film 4, the lower first side is formed. Both the anti-reflection film 51 and the outermost second anti-reflection film 52 use the ion-assisted vapor deposition method, so that the second anti-reflection film 5 as the outermost layer of the anti-reflection film 5 is used.
2 has high adhesion to the lower layer side (first antireflection film 51), and the first antireflection film 51 also has high adhesion to the obliquely deposited film 4. Therefore, according to this embodiment, even if there is a sudden change in temperature or humidity, the antireflection film 5 (the first antireflection film 51 and the second antireflection film 52) is reliably prevented from peeling. it can.
【００３７】[0037]
【発明の効果】以上説明したように、本発明に係る複屈
折板では、複屈折膜を斜め蒸着膜によって形成するが、
この斜め蒸着膜の表面に反射防止膜を形成する際に、反
射防止膜の少なくとも最表層についてはイオンアシスト
蒸着法により形成する。このイオンアシスト蒸着法によ
れば、最表層の下層側との密着性が向上するため、温度
や湿度の変化があっても、反射防止膜の最表層が剥離す
ることを確実に防止できる。As described above, in the birefringent plate according to the present invention, the birefringent film is formed by an obliquely deposited film.
When an antireflection film is formed on the surface of the obliquely deposited film, at least the outermost layer of the antireflection film is formed by an ion-assisted deposition method. According to this ion-assisted vapor deposition method, the adhesion to the lower layer side of the outermost layer is improved, so that the outermost layer of the antireflection film can be surely prevented from peeling even when there is a change in temperature or humidity.
【図１】本発明の実施の形態１に係る複屈折板の構造を
示す説明図である。FIG. 1 is an explanatory diagram illustrating a structure of a birefringent plate according to Embodiment 1 of the present invention.
【図２】本発明の実施の形態２に係る複屈折板の構造を
示す説明図である。FIG. 2 is an explanatory diagram illustrating a structure of a birefringent plate according to Embodiment 2 of the present invention.
【図３】本発明の実施の形態３に係る複屈折板の構造を
示す説明図である。FIG. 3 is an explanatory diagram illustrating a structure of a birefringent plate according to Embodiment 3 of the present invention.
【図４】本発明の実施の形態４に係る複屈折板の構造を
示す説明図である。FIG. 4 is an explanatory diagram illustrating a structure of a birefringent plate according to Embodiment 4 of the present invention.
【図５】従来の複屈折板の構造を示す説明図である。FIG. 5 is an explanatory view showing the structure of a conventional birefringent plate.
【図６】従来の別の複屈折板の構造を示す説明図であ
る。FIG. 6 is an explanatory view showing the structure of another conventional birefringent plate.
１ 複屈折板 ２ 基板 ３ 下地膜 ４ 斜め蒸着膜 ５ 反射防止膜 ５１ 第１の反射防止膜 ５２ 第２の反射防止膜 ５３ 第３の反射防止膜 ５４ 第４の反射防止膜 DESCRIPTION OF SYMBOLS 1 Birefringent plate 2 Substrate 3 Base film 4 Oblique deposition film 5 Antireflection film 51 First antireflection film 52 Second antireflection film 53 Third antireflection film 54 Fourth antireflection film
フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｃ２３Ｃ 14/48 Ｃ２３Ｃ 14/48 Ｄ Ｇ０２Ｂ 1/11 Ｇ０２Ｂ 1/10 Ａ Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat II (reference) C23C 14/48 C23C 14/48 D G02B 1/11 G02B 1/10 A
Claims (6)
することにより形成した複屈折性を備えた斜め蒸着膜
と、該斜め蒸着膜上に形成した反射防止膜とを有する複
屈折板において、 前記反射防止膜の少なくとも最表層は、イオンアシスト
蒸着法により形成された層であることを特徴とする複屈
折板。1. A birefringent plate having a substrate, an obliquely deposited birefringent film formed by obliquely depositing an optical material on the substrate, and an antireflection film formed on the obliquely deposited film. 3. The birefringent plate according to claim 1, wherein at least the outermost layer of the antireflection film is a layer formed by an ion-assisted vapor deposition method.
表層は、シリコン酸化物またはフッ化マグネシウムの層
であることを特徴とする複屈折板。2. The birefringent plate according to claim 1, wherein the outermost layer of the antireflection film is a layer of silicon oxide or magnesium fluoride.
止膜は、前記最表層より下層側に当該最表層と異なる材
料を真空蒸着法により形成した下層を備えていることを
特徴とする複屈折板。3. The birefringence according to claim 1, wherein the antireflection film includes a lower layer formed by vacuum deposition of a material different from the outermost layer below the outermost layer. Board.
止膜は、前記最表層より下層側に当該最表層と異なる材
料をイオンアシスト蒸着法により形成した下層を備えて
いることを特徴とする複屈折板。4. The method according to claim 1, wherein the anti-reflection film includes a lower layer formed of a material different from that of the outermost layer by ion-assisted vapor deposition below the outermost layer. Refraction plate.
止膜の前記下層は、タンタル酸化物またはチタン酸化物
の層であることを特徴とする複屈折板。5. The birefringent plate according to claim 3, wherein the lower layer of the antireflection film is a layer of tantalum oxide or titanium oxide.
前記斜め蒸着膜はタンタル酸化物により形成され、 前記反射防止膜において前記斜め蒸着膜と接する最下層
は、タンタル酸化物により形成されていることを特徴と
する複屈折板。6. The method according to claim 1, wherein
The birefringent plate, wherein the obliquely deposited film is formed of tantalum oxide, and a lowermost layer of the antireflection film that is in contact with the obliquely deposited film is formed of tantalum oxide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000039274A JP2001228330A (en) | 2000-02-17 | 2000-02-17 | Birefringent plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000039274A JP2001228330A (en) | 2000-02-17 | 2000-02-17 | Birefringent plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2001228330A true JP2001228330A (en) | 2001-08-24 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000039274A Pending JP2001228330A (en) | 2000-02-17 | 2000-02-17 | Birefringent plate |
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| Country | Link |
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| JP (1) | JP2001228330A (en) |
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