WO2016038853A1

WO2016038853A1 - Anti-reflection member, and production method therefor

Info

Publication number: WO2016038853A1
Application number: PCT/JP2015/004457
Authority: WO
Inventors: 利治大石; 高英藤本
Original assignee: パナソニックＩｐマネジメント株式会社
Priority date: 2014-09-08
Filing date: 2015-09-02
Publication date: 2016-03-17
Also published as: EP3193194A1; EP3193194A4; JPWO2016038853A1; CN106574984A; US20170205539A1

Abstract

This anti-reflection member is provided with: an anti-glare layer provided with a fine uneven structure; and an anti-reflection layer which is provided with a plurality of stacked films, and which is formed above the anti-glare layer. In the anti-glare layer, the surface in at least 60% of the area where the fine uneven structure is formed has an inclination angle at which the variation in the film thickness of the anti-reflection layer, said variation being generated as a result of the variation in the inclination angle of the surface of the fine uneven structure, has a film thickness ratio within the range ±20%.

Description

Antireflection member and manufacturing method thereof

The present invention relates to an antireflection member and a method for manufacturing the same.

In recent years, displays have become increasingly versatile. For example, displays are often used in situations where visibility is likely to deteriorate, such as situations where external light or illumination is applied. For this reason, the improvement of the reflection processing performance of the display panel of a display is calculated | required.

The reflection processing technology includes an AR (Anti-Reflection) technology that cancels reflected light by a multilayer film to reduce the reflected light, and an AG (in which the reflected light is diffused by an anti-glare layer having a fine concavo-convex structure to make it inconspicuous. Anti-Glare) technology. However, when illumination or the like is reflected, the AR technique makes it possible to visually recognize the outline of the illumination, and this reduces the visibility of the display. Further, in the AG technology, the reflected portion is shined white by the diffused reflected light, and the visibility of the display is lowered.

As a conventional technique, Patent Document 1 discloses an antiglare plastic film in which a fine uneven pattern is provided on a transparent resin applied to a base material. Patent Document 2 discloses an antireflection film in which a low refractive index layer is formed on an antiglare layer having a fine concavo-convex structure. The low refractive index layer is formed by applying and curing a resin.

JP-A-6-234175 International Publication No. 2008/084604

The present invention provides an antireflection member having high reflection treatment performance and a method for manufacturing the same.

The antireflection member according to one embodiment of the present invention includes an antiglare layer having a fine concavo-convex structure and an antireflection layer having a plurality of laminated films and formed above the antiglare layer. In the antiglare layer, the surface having an inclination angle at which the film thickness variation of the antireflection layer caused by the variation in the inclination angle of the surface of the fine uneven structure is within ± 20% of the film thickness ratio is formed on the fine uneven structure. It occupies 60% or more of the area.

An antireflection member manufacturing method according to an aspect of the present invention includes an antiglare layer forming step of forming a fine uneven structure on a substrate by performing a molding process using a mold having an uneven surface, and an upper layer than the fine uneven structure. And an antireflection layer forming step of forming an antireflection layer having a plurality of laminated films. As for the uneven surface of the mold, the surface having an inclination angle in which the film thickness variation of the antireflection layer caused by the variation in the inclination angle of the transferred uneven surface is within ± 20% of the film thickness ratio occupies 60% or more. Formed as follows.

According to the present invention, the characteristics of the antireflection layer formed above the antiglare layer can be improved, and the reflection treatment performance of the antireflection member can be further improved. In addition, the number of grooves or recesses surrounded by a steeply inclined surface can be reduced, and the reduction in visibility due to adhesion of dirt to the grooves or recesses can be reduced.

The schematic diagram which shows the reflection preventing member of Embodiment 1 The figure explaining the inclination-angle of the fine concavo-convex structure of Embodiment 1. The schematic diagram which shows the reflection preventing member of Embodiment 2. The figure explaining the inclination-angle of the fine concavo-convex structure of Embodiment 2. Diagram showing antireflection layer Graph showing the relationship between the film thickness ratio of the antireflection layer and the reflectance The schematic diagram which shows the inclination angle of an example of the fine concavo-convex structure of a comparative example Top view of an example of a fine relief structure of a comparative example The figure explaining the 1st modification of the shape of an antireflection member The figure explaining the 2nd modification of the shape of an antireflection member The figure explaining the 3rd modification of the shape of an antireflection member The figure explaining the 4th modification of the shape of an antireflection member The figure explaining the 1st process of the 1st example of the manufacturing method of the type | mold which forms an anti-glare layer The figure explaining the 2nd process of the 1st example of the manufacturing method of the type | mold which forms a glare-proof layer. The schematic diagram which shows the shape of the final type | mold in the 1st example of the manufacturing method of the type | mold which forms an anti-glare layer The figure explaining the 1st process of the 2nd example of the manufacturing method of the type | mold which forms an anti-glare layer The figure explaining the 2nd process of the 2nd example of the manufacturing method of the type | mold which forms an anti-glare layer The schematic diagram which shows the shape of the final type | mold in the 2nd example of the manufacturing method of the type | mold which forms an anti-glare layer Schematic diagram showing the fine relief structure produced using the mold shown in FIG. 10C The figure explaining the 1st process of the 3rd example of the manufacturing method of the type | mold which forms an anti-glare layer The schematic diagram which shows the shape of the final type | mold in the 3rd example of the manufacturing method of the type | mold which forms an anti-glare layer Schematic diagram showing a fine relief structure produced using the mold shown in FIG. 12B

Prior to the description of the embodiment of the present invention, the problems in the prior art will be briefly described. By providing the antireflection layer of the AR technology on the antiglare layer of the AG technology, the reflection processing performance can be improved by making up for each defect. However, if the multilayer film of the antireflection layer is formed on the unevenness of the antiglare layer without any ingenuity, the film thickness varies depending on the inclination of the unevenness, and good characteristics of the antireflection layer cannot be obtained.

Also, if a groove or recess surrounded by a steeply inclined surface is formed in the concavo-convex structure of the antiglare layer, dirt adheres to it and the visibility is lowered.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In the embodiment, the same components are denoted by the same reference numerals, and the description thereof will be omitted because it is duplicated.

<Antireflection member>
(Embodiments 1 and 2)
FIG. 1 is a schematic diagram illustrating an antireflection member according to Embodiment 1. FIG. FIG. 2 is a diagram for explaining an inclination angle of the fine concavo-convex structure of the first embodiment.

The antireflection member 10 of Embodiment 1 includes a sheet-like base material 12, a fine concavo-convex structure 20 formed on one surface of the base material 12, and an antireflection layer formed on the fine concavo-convex structure 20. 14.

The fine concavo-convex structure 20 functions as an antiglare layer that diffuses light. The fine concavo-convex structure 20 is a structure having a large number of irregularities (for example, a large number of spherical convex portions 21) on the surface. The lateral pitch of the unevenness is in the range of 0.5 to 10 [μm], and is about 2 [μm] as a specific example. The anti-glare layer of the present embodiment employs a configuration that does not have fine particles that diffuse light (also referred to as haze) inside the layer.

As shown in FIG. 2, the fine concavo-convex structure 20 is formed by managing the inclination angle θ of the concavo-convex surface. In the first embodiment, the surface having the inclination angle of the specific angle θ1 = 36.8 ° or less is formed so as to occupy a range of 60% or more in the area in plan view in the formation surface of the fine concavo-convex structure 20. Has been. The tilt angle indicates the tilt angle from the upper surface of the substrate 12. In FIG. 2, a range exceeding the specific angle θ1 is indicated by a bold line. In FIG. 2, V0 indicates a normal line on the upper surface of the substrate 12, and h0 indicates a normal line on the uneven surface.

The portion where the inclination angle is equal to or smaller than the specific angle θ1 is a portion where the characteristics of the antireflection layer 14 can be improved. Therefore, when this range increases, the antireflection characteristic of the antireflection member 10 can be improved. Therefore, the range occupied by the portion where the inclination angle is equal to or less than the specific angle θ1 may be 70% or more, more preferably 80% or more in the formation surface of the fine relief structure 20.

In Embodiment 1, the reason why the ratio of the surface where the inclination angle is equal to or smaller than the specific angle θ1 is 60% or more will be described later.

Details of the antireflection layer 14 will be described later.

FIG. 3 is a schematic diagram showing the antireflection member of the second embodiment. FIG. 4 is a diagram for explaining an inclination angle of the fine concavo-convex structure of the second embodiment.

The antireflection member 10A according to Embodiment 2 includes a sheet-like base material 12, a fine concavo-convex structure 20 formed on one surface of the base material 12, and an antireflection layer formed on the fine concavo-convex structure 20. 14A.

The fine concavo-convex structure 20 is formed by controlling the inclination angle θ of the concavo-convex surface as shown in FIG. In the second embodiment, the inclination angle is formed such that the range in which the specific angle θ2 = 48.1 ° or less occupies a range of 70% or more in the area when viewed in plan in the formation surface of the fine concavo-convex structure 20. Has been. In FIG. 4, a range exceeding the specific angle θ2 is indicated by a bold line.

The portion where the inclination angle is equal to or smaller than the specific angle θ2 is a portion where the characteristics of the antireflection layer 14A can be improved. Therefore, when this range increases, the antireflection characteristic of the antireflection member 10A can be improved. Therefore, the range occupied by the portion where the inclination angle is equal to or less than the specific angle θ2 may be 80% or more, more preferably 90% or more in the formation surface of the fine concavo-convex structure 20.

In Embodiment 2, the reason why the ratio of the surface where the inclination angle is equal to or smaller than the specific angle θ2 is 70% or more will be described later.

FIG. 5 is a diagram showing an example of the antireflection layer. FIG. 6 is a graph showing the relationship between the film thickness ratio and the reflectance of an example antireflection layer.

The antireflection layers 14 and 14A are configured by laminating a plurality of types of films of three or more layers. The antireflection layers 14 and 14A are formed by controlling the refractive index and the film thickness of each layer, and the light reflected from each interface overlaps with different phases, thereby canceling each other's light and reducing the reflected light. The total thickness of the antireflection layers 14 and 14A varies depending on the type and number of films, but is 300 to 500 nm or the like, which is very thin compared to the unevenness of the fine uneven structure 20. The antireflection layers 14 and 14A are made of a transparent metal oxide such as SiO ₂ , TiO ₂ , or Al ₂ O ₃ , for example.

Each film of the antireflection layers 14 and 14A may be formed using a dry process such as a vapor deposition method or a sputtering method. The vapor deposition method and the sputtering method are included in a method of condensing a material substance evaporated in a vacuum on the surface. Each of the above films may be formed using a wet process such as chemical liquid phase growth. The antireflection layers 14 and 14A may be a laminate of a dry process thin film and a wet process thin film. That is, at least one of the films of the antireflection layers 14 and 14A may be formed by a process of evaporating in a vacuum to condense a material substance on the surface, or may be formed by a wet process. Good.

As shown in FIG. 6, the reflectance of the visible light changes as the antireflection layers 14 and 14A change in film thickness. In the graph of the relationship between the film thickness and the reflectance, there are film thickness regions where the reflectance is lower than other regions, such as a range in which the reflectance is 1% or less by efficiently canceling the light reflected by each interface. is there. When the film thickness becomes larger or smaller than this film thickness region, the reflectance increases rapidly.

In the antireflection layers 14 and 14A, when the film thickness at the center of the film thickness region where the reflectivity is low is assumed to be a film thickness ratio 1, as shown in FIG. 8 to 1.2.

The antireflection layer 14 of Embodiment 1 is formed so that a film thickness ratio of 1 can be obtained when the tilt angle of the substrate is zero. At this time, the area where the thin film particles adhere to the portion having the inclination angle θ is increased by the inclination angle θ with respect to a certain amount of thin film particles scattered by vapor deposition, for example. For this reason, the film thickness of the portion having the inclination angle θ is thinner than that of the portion having the inclination angle zero. If the portion having the tilt angle of zero is defined as the film thickness X, the thickness X1 of the portion having the tilt angle θ is represented by the following equation (1).

Therefore, in the antireflection layer 14 of Embodiment 1, the film thickness of the thin film formed on the surface having the inclination angle of 0 ° to the specific angle θ1 (= 36.8 °) is as shown in the range W1 in FIG. The film thickness ratio is 1 to 0.8. In this film thickness region, the reflectance is 1% or less, and the antireflection characteristic is good. On the surface where the inclination angle exceeds the specific angle θ1, the reflectance of the antireflection layer 14 increases rapidly as the inclination angle increases.

As described above, in the first embodiment, the range in which the inclination angle is 0 ° to the specific angle θ1 (= 36.8 °) occupies 60% or more, so that good performance of the antireflection layer 14 can be obtained.

The antireflection layer 14A of Embodiment 2 is formed so as to obtain a film thickness ratio of 1.2 when the substrate tilt angle is zero.

As described above, assuming that the portion having the tilt angle of zero is the film thickness X, the film thickness X1 of the portion having the tilt angle θ is expressed by the equation (1). Therefore, the film thickness of the antireflection layer 14A formed on the surface having the inclination angle of 0 ° to the specific angle θ2 (= 48.1 °) is 1.2 to as shown in the range W2 in FIG. The film thickness is 0.8. The antireflection layer 14A in this film thickness range has a reflectance of 1% or less and good antireflection characteristics. On the surface where the inclination angle exceeds the specific angle θ2, the reflectance of the antireflection layer 14A increases rapidly as the inclination angle increases.

As described above, also in the second embodiment, when the range in which the inclination angle is 0 ° to the specific angle θ2 (= 48.1 °) occupies 70% or more, good characteristics of the antireflection layer 14 can be obtained. .

<Comparative example>
Here, in Embodiment 1, the area where the inclination angle is equal to or less than the specific angle θ1 is 60% or more, and in Embodiment 2, the area where the inclination angle is equal to or less than the specific angle θ2 is 70% or more. The reason for this will be described with reference to FIGS. 7A and 7B.

FIG. 7A is a schematic diagram showing the inclination angle of the fine uneven structure of the comparative example, and FIG. 7B is a top view of the fine uneven structure of the comparative example.

7A and 7B is a model in which hemispheres of the same diameter are closely aligned on one surface of the substrate 50. The thick line portion in FIG. 7A and the shaded portion in FIG. 7B schematically show portions having an inclination angle where the film thickness ratio of the antireflection layer deviates from 0.8 to 1.2.

Here, if the antireflection layer is formed on a plane with a film thickness ratio of 1.0, as described above, the inclination angle θ of FIG. 7A is 36.8 °. If the antireflection layer is formed on a plane with a film thickness ratio of 1.2, the inclination angle θ in FIG. 7A is 48.1 °.

In plan view, the ratio of the thick line portion in FIG. 7A to the region where the fine concavo-convex structure is formed is similar to the ratio of the hatched portion in the equilateral triangle T in FIG. 7B. r2 is the radius of the circle on the inner peripheral side of the thick line portion when viewed in plan, and r1 is the radius of the circle on the outer peripheral side of the thick line portion when viewed in plan. From these conditions, the ratio of the area other than the thick line portion when viewed in plan can be obtained as follows.

First, since the length of one side of the equilateral triangle T is 2 × r1, the area S0 is expressed by the following equation (2).

Next, the area S1 of the hatched portion included in the equilateral triangle T is expressed by the following equation (3).

The ratio R1 of the area other than the thick line portion in the plan view and the relationship between the radii r1 and r2 are expressed by the following expressions (4) and (5).

From these results, in the model of the above comparative example, the ratio R1 of the area where the film thickness ratio is 0.8 to 1.2 in plan view is the case where the film is formed with the film thickness ratio of 1.0 (θ = 36). .8 °) is 42%, and when a film thickness ratio of 1.2 is formed (θ = 48.1 °), it is 60%.

In the first embodiment, in a plan view, the ratio of the area where the film thickness ratio is 0.8 to 1.2 is 60% or more, and the model is not specially devised only by closely arranging the hemispheres. The ratio is sufficiently large compared with 42%. Therefore, the action of the antireflection layer can be sufficiently obtained by the unique configuration of the first embodiment.

In the second embodiment, in a plan view, the ratio of the area where the film thickness ratio is 0.8 to 1.2 is 70% or more, and the model is not specially devised only by densely arranging the hemispheres. The ratio is sufficiently large compared with 60%. Therefore, the action of the antireflection layer can be sufficiently obtained by the unique configuration of the second embodiment.

As described above, according to the

antireflection members

10 and 10A of

Embodiments

1 and 2, the AG technology characteristics are obtained by the fine uneven structure 20 of the antiglare layer, and the antireflection layers 14 and 14A are favorable. Antireflection characteristics can be obtained. Therefore, the

antireflection members

10 and 10A having high reflection processing performance can be realized.

In addition, according to the

antireflection members

10 and 10A of the first and second embodiments, the groove or recess surrounded by the steeply inclined surface is reduced by the management of the tilt angle of the fine concavo-convex structure 20, and therefore the groove or recess. Visibility degradation due to adhesion of dirt to the surface can be reduced.

In the first and second embodiments, an example in which a plurality of spherical convex portions 21 are formed as the fine concavo-convex structure 20 is shown, but the shape of the concavo-convex shape is not limited to these.

In the first and second embodiments, the inclination angle of the fine concavo-convex structure 20 is managed, and the antireflection layers 14 and 14A having a film thickness ratio of 1 or a film thickness ratio of 1.2 are formed on the surface having the zero inclination angle. Thus, good film thicknesses of the antireflection layers 14 and 14A are realized. However, the film thickness formed on the surface having the zero tilt angle need not be any film thickness ratio of 0.8 to 1.2. Even if the film thickness formed on the surface with the tilt angle of zero is 1.2 or more, the film thickness variation of the antireflection layers 14 and 14A is reflected depending on the method of providing the tilt angle of the fine concavo-convex structure 20. It is possible to keep the film thickness ratio within ± 20% in the region where the rate is low. It is also possible to control the ratio of the surface having such an inclination angle to a certain level or more.

In addition, as shown in FIGS. 8A to 8D, the shape of the antireflection member is not particularly limited. The antireflection members 10B to 10E may be formed into a plate shape as shown in FIG. 8A, a film shape as shown in FIG. 8B, a belt shape as shown in FIG. 8C, or a block shape as shown in FIG. 8C. In each shape of the antireflection members 10B to 10E, it is only necessary to have the above-described antiglare layer and antireflection layer on at least one surface.

Further, the type, the number of layers, and the film thickness of each thin film of the antireflection layers 14 and 14A are not limited to the illustrated specific examples, and can be variously changed. The number of thin films is preferably 3 or more.

<Method for producing antireflection member>
Next, an example of a manufacturing method of the antireflection member will be described.

The manufacturing method of an antireflection member has an anti-glare layer formation process and an antireflection layer formation process in order of a process.

In the antiglare layer forming step, a mold 30 having a fine concavo-convex structure (see FIG. 9C), a transparent substrate 12 (see FIGS. 1 to 4), and a curable transparent resin are used. The mold 30 is, for example, a mold. The base material 12 is, for example, a transparent resin or transparent glass having a low haze. The transparent resin includes, for example, PET (polyethylene terephthalate), PC (polycarbonate), or acrylic resin. As the curable transparent resin, for example, an ultraviolet curable transparent resin can be applied.

The mold 30 has an uneven surface with a controlled inclination angle. The uneven surface of the mold 30 has a surface having an inclination angle at which the film thickness variation of the antireflection layer caused by the variation in the inclination angle is within ± 20% in the transferred uneven surface is 60% or more. It is formed to occupy. Specifically, the mold 30 for manufacturing the antireflection member 10 of Embodiment 1 is formed such that a portion with an inclination angle of 36.8 ° or less occupies 60% or more in the transferred uneven surface. . The mold 30 for manufacturing the antireflection member 10A of Embodiment 2 is formed such that a portion with an inclination angle of 48.1 ° or less occupies 60% or more in the transferred concavo-convex surface. A method for manufacturing the mold 30 will be described later.

In the antiglare layer forming step, the curable transparent resin is cured on the upper surface of the base material 12 in a shape in which the unevenness of the mold 30 is transferred by mold forming using the mold 30. Thereby, the transparent fine uneven structure 20 is added to the upper surface of the base material 12, and an anti-glare layer is formed.

In the antireflection layer forming step, a dry process or a wet process film forming process is performed a plurality of times on the substrate 12 having the fine concavo-convex structure 20. Each film forming process is performed by managing the film thickness of the thin film. When manufacturing the antireflection member 10 of Embodiment 1, the film thickness is controlled so that an antireflection layer having a film thickness ratio of 1 is formed on a surface having an inclination angle of 0 °. When manufacturing the antireflection member 10A of the second embodiment, the film thickness is controlled so that an antireflection layer having a film thickness ratio of 1.2 is formed on a surface with an inclination angle of 0 °. Thereby, a predetermined antireflection layer is formed above the fine relief structure 20 of the antiglare layer.

Through the above steps, the

antireflection members

10 and 10A of the first and second embodiments can be manufactured.

In addition, in the manufacturing method of the antireflection member, another film forming process may be included between the antiglare layer forming step and the antireflection layer forming step.

<Mold manufacturing method>
Then, an example of the manufacturing method of the type | mold 30 used at a glare-proof layer formation process is demonstrated.

9A to 9C are diagrams for explaining a first example of a mold manufacturing method. FIG. 9A is an explanatory diagram of the first step, FIG. 9B is an explanatory diagram of the second step, and FIG. 9C is a schematic diagram showing a final mold shape.

In the first example of the method for manufacturing the mold 30, first, as shown in FIG. 9A, the mold material 31 is subjected to blasting, etching, or electric discharge machining, and an antiglare action is obtained on one surface of the mold 31. Concavities and convexities are formed at an optical distance pitch. Next, as shown in FIG. 9B, the lower end portion of the unevenness is removed by polishing or etching. The ratio of the range in which the inclination angle increases can be adjusted by the amount of polishing or etching in FIG. 9B.

As a result, as shown in FIG. 9C, a mold 30 having projections and depressions as if the fine concavo-convex structure 20 of

Embodiments

1 and 2 was transferred can be manufactured.

10A to 10C are diagrams for explaining a second example of the mold manufacturing method. FIG. 10A is an explanatory diagram of the first step, FIG. 10B is an explanatory diagram of the second step, and FIG. 10C is a schematic diagram showing a final mold shape.

In the second example of the manufacturing method of the mold 30, first, as shown in FIG. 10A, irregularities are formed on one surface of the mold material 31 at a pitch of an optical distance that exerts an antiglare action by blasting or etching. Next, as shown in FIG. 10B, additional blasting is performed using particles 32 having a smaller diameter than the individual concave and convex portions. In the additional blast processing, a thin portion such as the lower end portion of the unevenness is sharply cut, and a cutting amount of a thick portion such as the center of the concave portion is reduced. As a result, as shown in FIG. 10C, a mold 30 having a fine concavo-convex structure in which a large range of inclination angles is cut can be manufactured.

FIG. 11 is a schematic view showing a fine concavo-convex structure produced using the mold shown in FIG. 10C.

By forming the antiglare layer using the mold 30 of the second example, a fine uneven structure 20A as shown in FIG. 11 can be produced. The fine concavo-convex structure 20 </ b> A can control a surface having an inclination angle exceeding a specific angle (indicated by a thick line in the drawing) to a predetermined ratio or less.

FIG. 12A and FIG. 12B are diagrams for explaining a third example of a mold manufacturing method for forming an antiglare layer. FIG. 12A is an explanatory diagram of the first step, and FIG. 12B is a schematic diagram showing a final mold shape.

A third example of the manufacturing method of the mold 30 is to perform electric discharge machining on the mold material 31 using the electrode 40 on which the fine pattern machining 45 has been performed, as shown in FIG. 12A. Thereby, as shown to FIG. 12B, the type | mold 30 which has the uniform fine uneven | corrugated shape according to the fine pattern process 45 can be formed.

FIG. 13 is a schematic view showing a fine concavo-convex structure produced using the mold shown in FIG. 12B.

By forming the antiglare layer using the mold 30 of the third example, a fine concavo-convex structure 20B having a uniform concavo-convex shape as shown in FIG. 13 can be produced. The fine uneven structure 20B is, for example, an uneven structure having a trapezoidal cross section. As a result, the tilt angle can be controlled so that the film thickness variation of the antireflection layer is within ± 20% of the film thickness ratio in the entire area of the fine concavo-convex structure 20B.

The embodiments of the present invention have been described above.

In the above embodiment, mold forming is shown as a method for manufacturing the fine concavo-convex structure of the antireflection member, and some specific methods for manufacturing the mold are shown. However, the manufacturing method of the fine uneven structure of the antireflection member is not particularly limited, and any manufacturing method may be used as long as the fine uneven structure having the inclination angle specified by the invention can be manufactured.

The present invention can be used for an antireflection member for preventing reflection of a display.

10, 10A, 10B, 10C, 10D,

10E Antireflection member

12, 50

Base material

14,

14A Antireflection layer

20, 20A, 20B Fine concavo-convex structure 21 Convex 30 Mold 31 Mold material 32 Particle 40 Electrode 45 Fine pattern processing

Claims

A substrate;
An anti-glare layer provided on the surface of the substrate, having a fine relief structure;
An antireflection layer having a plurality of laminated films and formed above the antiglare layer; and
In the antiglare layer, the inclination angle at which the film thickness variation of the antireflection layer caused by the variation in the inclination angle of the surface of the fine concavo-convex structure with respect to the surface of the substrate is within ± 20% of the film thickness ratio Occupying 60% or more of the region where the fine concavo-convex structure is formed,
Antireflection member.
Assuming that when the antireflection layer having a film thickness X is formed on the surface having the inclination angle of 0 °, the film thickness formed on the surface having the inclination angle θ is X · cos θ. The relationship between the corner and the film thickness variation of the antireflection layer is defined,
The antireflection member according to claim 1.
In the graph of the relationship between the film thickness and the reflectance of the antireflection layer, the median value of the film thickness region where the reflectance is lower than that of other regions is defined as a film thickness ratio of
The antireflection layer is formed with a film thickness ratio of 1 on the surface having the inclination angle of 0 °,
In the antiglare layer, in the region where the fine concavo-convex structure is formed, the surface having the inclination angle of 36.8 ° or less occupies 60% or more.
The antireflection member according to claim 1.
In the relationship graph between the film thickness and the reflectance of the antireflection layer, the median value of the film thickness region where the reflectance is lower than other regions is defined as a film thickness ratio of 1,
The antireflection layer is formed with a film thickness ratio of 1.2 on the surface where the tilt angle is 0 °,
In the antiglare layer, in the region where the fine concavo-convex structure is formed, the surface having the inclination angle of 48.1 ° or less occupies 70% or more,
The antireflection member according to claim 1.
At least one of the plurality of films of the antireflection layer is formed by a process of condensing on the surface a material substance evaporated in a vacuum,
The antireflection member according to claim 1.
At least one of the plurality of films of the antireflection layer is formed by a wet process.
The antireflection member according to claim 1.
An anti-glare layer forming step of forming a fine concavo-convex structure on a substrate by performing a molding process using a mold having an uneven surface;
An antireflection layer forming step of forming an antireflection layer having a plurality of laminated films on the upper layer than the fine concavo-convex structure,
In the concavo-convex surface of the mold, the inclination in which the film thickness variation of the antireflection layer caused by the variation in the inclination angle of the transferred concavo-convex surface with respect to the surface of the substrate is within ± 20% of the film thickness ratio It is formed so that the surface with corners occupies 60% or more.
Manufacturing method of antireflection member.
The concavo-convex surface of the mold is formed by performing an additional blast process using particles having a diameter smaller than the concavo-convex on the concavo-convex formed by blasting, etching, or electric discharge machining on one surface of the mold material,
The manufacturing method of the reflection preventing member of Claim 7.
The uneven surface of the mold is formed by polishing or etching an uneven surface formed on one surface of a mold material by blasting, etching, or electric discharge processing.
The manufacturing method of the reflection preventing member of Claim 7.
The uneven surface of the mold is formed by performing electric discharge machining using an electrode having an uneven pattern formed on one surface of a mold material.
The manufacturing method of the reflection preventing member of Claim 7.
In the relationship graph between the film thickness and the reflectance of the antireflection layer, the median value of the film thickness region where the reflectance is lower than other regions is defined as a film thickness ratio of 1,
In the antireflection layer forming step, the antireflection layer is formed with a film thickness ratio of 1 on the surface having the tilt angle of 0 °,
The concavo-convex surface of the mold is formed such that a portion having the inclination angle of 36.8 ° or less occupies 60% or more in the transferred concavo-convex surface.
The manufacturing method of the reflection preventing member of Claim 7.
In the relationship graph between the film thickness and the reflectance of the antireflection layer, the median value of the film thickness region where the reflectance is lower than other regions is defined as a film thickness ratio of 1,
In the antireflection layer forming step, the antireflection layer is formed with a film thickness ratio of 1.2 on the surface where the tilt angle is 0 °,
The concavo-convex surface of the mold is formed such that, in the transferred concavo-convex surface, the portion having the inclination angle of 48.1 ° or less occupies 70% or more.
The manufacturing method of the reflection preventing member of Claim 7.