TW202313301A - Mold releasing film and method for manufacturing molded product - Google Patents

Mold releasing film and method for manufacturing molded product Download PDF

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TW202313301A
TW202313301A TW111121137A TW111121137A TW202313301A TW 202313301 A TW202313301 A TW 202313301A TW 111121137 A TW111121137 A TW 111121137A TW 111121137 A TW111121137 A TW 111121137A TW 202313301 A TW202313301 A TW 202313301A
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release film
layer
release
film
thermoplastic resin
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TW111121137A
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Chinese (zh)
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橋本明徳
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日商住友電木股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/32Layered products comprising a layer of synthetic resin comprising polyolefins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/36Layered products comprising a layer of synthetic resin comprising polyesters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/022Mechanical properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/027Thermal properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/06Interconnection of layers permitting easy separation
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings

Abstract

A mold releasing film 10 of the present invention includes a first release layer 1 comprising a first thermoplastic resin composition and a cushion layer 3 comprising a third thermoplastic resin composition. A complex shear modulus of the mold releasing film 10 at 80ºC is 1.00 MPa or less. Further, it is preferred that a storage modulus of the cushion layer 3 at 150ºC is 9.0 MPa or more.

Description

脫模薄膜及成形品之製造方法Release film and manufacturing method of molded article

本發明係有關一種脫模薄膜及成形品之製造方法。The present invention relates to a method for manufacturing a release film and a molded product.

近年來,經由覆蓋膜所具備之接著劑層,藉由加熱壓製將覆蓋膜接著於電路露出之撓性電路基板而形成撓性印刷電路基板亦即積層體時,通常使用脫模薄膜。In recent years, when a flexible printed circuit board, that is, a laminate is formed by bonding the cover film to the flexible circuit board with exposed circuits by heating and pressing through the adhesive layer included in the cover film, a mold release film is generally used.

在使用了這樣的脫模薄膜之撓性印刷電路基板、換言之形成撓性電路基板與覆蓋膜的積層體時,對脫模薄膜要求具有2個特性、亦即填埋性與脫模性這兩者。When forming a flexible printed circuit board using such a release film, in other words, a laminate of a flexible circuit board and a cover film, the release film is required to have two characteristics, namely, embedding properties and mold release properties. By.

詳細而言,首先,藉由在撓性電路基板積層覆蓋膜,在撓性印刷電路基板形成凹部,但是要求脫模薄膜對該凹部發揮優異之填埋性。Specifically, firstly, a concave portion is formed on a flexible printed circuit board by laminating a cover film on the flexible printed circuit board, but the mold release film is required to exhibit excellent filling properties for the concave portion.

更具體而言,經由覆蓋膜所具備之接著劑層,對撓性電路基板積層覆蓋膜。該積層時,要求脫模薄膜對凹部發揮優異之填埋性,抑制接著劑滲入凹部內。More specifically, the cover film is laminated on the flexible circuit board via the adhesive layer included in the cover film. In this lamination, the mold release film is required to exhibit excellent embedding properties in the recessed portion, and to suppress the adhesive from penetrating into the recessed portion.

又,如上所述般在撓性電路基板上積層覆蓋膜之後,要求從所形成之撓性印刷電路基板剝離具有優異之脫模性的脫模薄膜。In addition, after laminating a cover film on a flexible printed circuit board as described above, it is required to peel off a release film having excellent releasability from the formed flexible printed circuit board.

更具體而言,使脫模薄膜從所形成之撓性印刷電路基板剝離時,要求脫模薄膜對撓性印刷電路基板發揮優異之脫模性,抑制在撓性印刷電路基板中發生伸長及斷裂。More specifically, when the release film is peeled from the formed flexible printed circuit board, the release film is required to exhibit excellent mold release properties on the flexible printed circuit board and to suppress elongation and breakage in the flexible printed circuit board .

為了製成兼具如上所述的2個特性(填埋性及脫模性)之脫模薄膜,例如,在專利文獻1中,提出了具有作為脫模層的聚酯系彈性體層和作為緩衝層的聚酯層之脫模薄膜。In order to produce a release film having the above two properties (fillability and release properties), for example, in Patent Document 1, it is proposed to have a polyester elastomer layer as a release layer and a cushioning layer as a buffer. The release film of the polyester layer of the layer.

在該脫模薄膜中,在以脫模層與撓性印刷電路基板接觸的方式配置之狀態下,脫模薄膜填埋於凹部。藉此,對脫模薄膜賦予了填埋性,但是從抑制接著劑滲入凹部內之觀點考慮,實際上要求開發對凹部發揮更優異之填埋性之脫模薄膜。In this mold release film, in the state arrange|positioned so that a mold release layer may contact a flexible printed circuit board, a mold release film fills in a recessed part. Thereby, embedding properties are imparted to the release film, but from the viewpoint of suppressing penetration of the adhesive into the recesses, the development of a release film exhibiting more excellent embedding properties in the recesses is actually required.

又,針對這樣的問題,在如下情況等亦同樣地產生:藉由設為對由含有半固化狀態的熱固性樹脂之材料形成之對象物黏附了脫模薄膜之狀態,並在該狀態下使熱固性樹脂固化,使用對象物製造具備凹部之成形品。 [先前技術文獻] [專利文獻] Moreover, regarding such a problem, it also occurs in the following case in the same way: by making the state where the release film is adhered to the object formed of the material containing the thermosetting resin in a semi-cured state, and making the thermosetting resin in this state The resin is cured, and the object is used to manufacture a molded product with a concave portion. [Prior Art Literature] [Patent Document]

[專利文獻1]日本特開2011-88351號公報[Patent Document 1] Japanese Unexamined Patent Publication No. 2011-88351

[發明所欲解決之課題][Problem to be Solved by the Invention]

本發明的目的在於提供一種能夠對凹部發揮優異之填埋性之脫模薄膜及使用該脫模薄膜之成形品之製造方法。 [解決課題之技術手段] An object of the present invention is to provide a release film capable of exhibiting excellent embedding properties in recesses and a method for producing a molded article using the release film. [Technical means to solve the problem]

這樣的目的由下述(1)~(14)中所記載之本發明達成。 (1)一種脫模薄膜,其具有由第1熱塑性樹脂組成物構成之第1脫模層及由第3熱塑性樹脂組成物構成之緩衝層,其特徵為, 該脫模薄膜在80℃下的複數剪切彈性模數為1.00MPa以下。 Such objects are achieved by the present invention described in the following (1) to (14). (1) A release film having a first release layer made of a first thermoplastic resin composition and a buffer layer made of a third thermoplastic resin composition, characterized in that, The complex shear elastic modulus at 80° C. of the release film is 1.00 MPa or less.

(2)如上述(1)之脫模薄膜,其中, 前述緩衝層在150℃下的儲存彈性模數為9.0MPa以上。 (2) The release film according to (1) above, wherein, The buffer layer has a storage modulus of elasticity at 150° C. of 9.0 MPa or more.

(3)如上述(1)或(2)之脫模薄膜,其中, 該脫模薄膜在80℃下的儲存剪切彈性模數為1.00MPa以下。 (3) The release film according to (1) or (2) above, wherein, The storage shear elastic modulus at 80° C. of the release film is 1.00 MPa or less.

(4)如上述(1)至(3)中任一項之脫模薄膜,其中, 該脫模薄膜在80℃下的損失剪切彈性模數為0.40MPa以下。 (4) The release film according to any one of the above (1) to (3), wherein, The loss shear elastic modulus at 80° C. of the release film is 0.40 MPa or less.

(5)如上述(1)至(4)中任一項之脫模薄膜,其中, 前述第1脫模層中,與前述緩衝層相反的一側的表面的10個點平均粗糙度(Rz)為0.5μm以上且3.6μm以下。 (5) The release film according to any one of the above (1) to (4), wherein, In the said 1st mold release layer, the 10 point average roughness (Rz) of the surface of the side opposite to the said buffer layer is 0.5 micrometer or more and 3.6 micrometers or less.

(6)如上述(1)至(5)中任一項之脫模薄膜,其中, 前述第1脫模層在150℃下的儲存彈性模數E’為100MPa以上。 (6) The release film according to any one of (1) to (5) above, wherein The storage elastic modulus E' at 150°C of the first release layer is 100 MPa or more.

(7)如上述(1)至(6)中任一項之脫模薄膜,其中, 前述第1熱塑性樹脂組成物含有聚酯系樹脂作為主材料。 (7) The release film according to any one of (1) to (6) above, wherein The aforementioned first thermoplastic resin composition contains a polyester-based resin as a main material.

(8)如上述(1)至(7)中任一項之脫模薄膜,其中, 前述緩衝層的平均厚度為60μm以上且200μm以下。 (8) The release film according to any one of (1) to (7) above, wherein The buffer layer has an average thickness of not less than 60 μm and not more than 200 μm.

(9)如上述(1)至(8)中任一項之脫模薄膜,其中, 前述第1脫模層的平均厚度為5μm以上且30μm以下。 (9) The release film according to any one of (1) to (8) above, wherein The average thickness of the said 1st mold release layer is 5 micrometers or more and 30 micrometers or less.

(10)如上述(1)至(9)中任一項之脫模薄膜,其中, 前述第3熱塑性樹脂組成物含有複數種熱塑性樹脂,前述熱塑性樹脂的熔點未達80℃。 (10) The release film according to any one of the above (1) to (9), wherein, The third thermoplastic resin composition contains a plurality of thermoplastic resins, and the melting point of the thermoplastic resin is less than 80°C.

(11)如上述(10)之脫模薄膜,其中, 前述第3熱塑性樹脂組成物含有聚酯系樹脂及聚烯烴系樹脂作為前述熱塑性樹脂。 (11) The release film according to (10) above, wherein, The third thermoplastic resin composition contains a polyester resin and a polyolefin resin as the thermoplastic resin.

(12)如上述(1)至(11)中任一項之脫模薄膜,其中, 該脫模薄膜具有在前述緩衝層的與前述第1脫模層相反的一側積層之由第2熱塑性樹脂組成物構成之第2脫模層。 (12) The release film according to any one of (1) to (11) above, wherein This mold release film has the 2nd mold release layer which consists of a 2nd thermoplastic resin composition laminated|stacked on the side opposite to the said 1st mold release layer of the said buffer layer.

(13)如上述(1)至(12)中任一項之脫模薄膜,其中, 該脫模薄膜用於形成電路。 (13) The release film according to any one of (1) to (12) above, wherein This release film is used to form circuits.

(14)一種成形品之製造方法,其特徵為,包括以上述(1)至(13)中任一項之脫模薄膜的前述第1脫模層成為對象物側之方式在前述對象物上配置前述脫模薄膜之步驟及對配置有前述脫模薄膜之前述對象物進行加熱壓製之步驟,在配置前述脫模薄膜之前述步驟中,前述對象物的配置有前述脫模薄膜之一側的面由含有半固化狀態的熱固性樹脂之材料形成。 [發明之效果] (14) A method of manufacturing a molded article, comprising forming the first release layer of the release film of any one of the above (1) to (13) on the object so that the first release layer is on the object side. The step of arranging the release film and the step of heating and pressing the object on which the release film is arranged, in the step of arranging the release film, the side of the object on which the release film is arranged The surface is formed of a material containing a thermosetting resin in a semi-cured state. [Effect of Invention]

依據本發明,能夠製成對凹部發揮優異之填埋性之脫模薄膜。According to the present invention, it is possible to obtain a release film that exhibits excellent embedding properties in recesses.

因此,在將脫模薄膜用於例如使用撓性電路基板及覆蓋膜之撓性印刷電路基板的形成之情況下,能夠將具有優異之填埋性之脫模薄膜填埋於形成於撓性印刷電路基板之凹部。因此,在撓性印刷電路基板上形成凹部時,能夠確實地抑制或防止接著劑從覆蓋膜所具備之接著劑層滲入形成之凹部內。Therefore, when the release film is used, for example, to form a flexible printed circuit board using a flexible circuit board and a cover film, the release film having excellent embedding properties can be embedded in the flexible printed circuit board formed. The concave part of the circuit board. Therefore, when the recess is formed on the flexible printed circuit board, it is possible to reliably suppress or prevent the adhesive agent from penetrating into the formed recess from the adhesive layer included in the cover film.

以下,依據圖式所示之較佳實施形態,對本發明的脫模薄膜及成形品之製造方法詳細地進行說明。Hereinafter, the method of manufacturing the mold release film and molded article of the present invention will be described in detail based on preferred embodiments shown in the drawings.

再者,以下,以使用本發明的脫模薄膜將撓性印刷電路基板製造為多層之情況、亦即將本發明的脫模薄膜用於形成電路之情況為一例進行說明。又,在說明本發明的脫模薄膜及成形品之製造方法之前,首先,對將撓性印刷電路基板製造為多層之製造方法進行說明。In addition, below, the case where the flexible printed circuit board is manufactured in multilayer using the release film of this invention, that is, the case where the release film of this invention is used for circuit formation is demonstrated as an example. Moreover, before explaining the manufacturing method of the mold release film and molded article of this invention, the manufacturing method which manufactures a flexible printed circuit board in multilayer is demonstrated first.

<撓性印刷電路基板之製造方法> 圖1係用以說明在以多層積層之狀態下製造撓性印刷電路基板之製造方法的縱向剖面圖。圖2係表示在以多層積層之狀態下製造撓性印刷電路基板之製造方法中的各步驟之縱向剖面圖。圖3係表示本發明的脫模薄膜的實施形態之縱向剖面圖。圖4係局部放大圖3所示之脫模薄膜的A部而得之局部放大縱向剖面圖。再者,以下,為了便於說明,將圖1~圖4中的上側稱為“上”或“上方”,將下側稱為“下”或“下方”,將左側稱為“左”,將右側稱為“右”。 <Manufacturing method of flexible printed circuit board> Fig. 1 is a longitudinal sectional view for explaining a method of manufacturing a flexible printed circuit board in a multilayered state. Fig. 2 is a longitudinal cross-sectional view showing each step in a method of manufacturing a flexible printed circuit board in a multilayered state. Fig. 3 is a longitudinal sectional view showing an embodiment of the release film of the present invention. Fig. 4 is a partially enlarged longitudinal sectional view obtained by partially enlarging part A of the release film shown in Fig. 3 . Furthermore, in the following, for convenience of description, the upper side in FIGS. The right side is called "right".

在本實施形態中,將撓性印刷電路基板200(以下,有時亦稱為“FPC200”)製造為多層之製造方法包括:第1步驟,成為將各自呈片狀之玻璃布300A、脫模薄膜10A、FPC200、脫模薄膜10B及玻璃布300B依序重合之狀態之積層體積層為多層;第2步驟,藉由對積層為多層之積層體分別進行加熱壓製,在FPC200中,將覆蓋膜220(以下,有時亦稱為“CL膜220”)與撓性電路基板210接合;及第3步驟,使脫模薄膜10(10A、10B)從FPC200離型,獲得在撓性電路基板210上接合有CL膜220之FPC200。再者,在該FPC200之製造方法中適用本發明的成形品之製造方法。In this embodiment, the manufacturing method for manufacturing the flexible printed circuit board 200 (hereinafter, sometimes referred to as "FPC200") as multilayer includes: the first step, which is to separate the sheet-shaped glass cloth 300A, the mold release Film 10A, FPC200, release film 10B, and glass cloth 300B are stacked in sequence. The laminated volume layer is multi-layered; in the second step, by heating and pressing the multi-layered laminated body separately, in FPC200, the cover film 220 (hereinafter, sometimes referred to as "CL film 220") is bonded to the flexible circuit board 210; The FPC 200 with the CL film 220 bonded thereon. In addition, the manufacturing method of the molded article of this invention is applied to the manufacturing method of this FPC200.

以下,對各步驟依序進行說明。 (第1步驟) 首先,成為將各自呈片狀之玻璃布300A、脫模薄膜10A、FPC200、脫模薄膜10B及玻璃布300B依序重合之狀態之積層體積層為多層(參閱圖1、圖2(a)。)。再者,以下,對將前述積層體積層為2層之情況進行說明。 Hereinafter, each step will be described in order. (step 1) First, the laminated volume layer in which the sheet-shaped glass cloth 300A, release film 10A, FPC 200, release film 10B, and glass cloth 300B are sequentially stacked is multilayer (see FIG. 1 and FIG. 2( a ). ). In addition, below, the case where the said build-up bulk layer is two layers is demonstrated.

(1-1)首先,準備3片呈平板狀之加熱壓接板521,配置成在該等的厚度方向上形成2個間隙。(1-1) First, three flat plate-shaped thermocompression bonding plates 521 are prepared, and arranged so as to form two gaps in the thickness direction thereof.

(1-2)接著,在2個間隙中,將各自呈片狀(膜狀)之玻璃布300A、脫模薄膜10A、FPC200、脫模薄膜10B及玻璃布300B以從上側向下側依序重合之狀態配置。再者,在本步驟(1-2)中,配置於間隙之FPC200成為藉由使撓性電路基板210與CL膜220重合而積層之狀態,但是撓性電路基板210與CL膜220未經由CL膜220所具備之接著劑層222接合。(1-2) Next, in the two gaps, the glass cloth 300A, the release film 10A, the FPC 200, the release film 10B, and the glass cloth 300B, which are each in the form of a sheet (film), are sequentially arranged from the upper side to the lower side. Overlapped state configuration. Furthermore, in this step (1-2), the FPC 200 disposed in the gap is in a state of being laminated by overlapping the flexible circuit board 210 and the CL film 220, but the flexible circuit board 210 and the CL film 220 are not covered by the CL film. The adhesive layer 222 included in the film 220 is bonded.

藉此,如圖1所示,在加熱壓接板521之間,成為將玻璃布300A、脫模薄膜10A、FPC200、脫模薄膜10B及玻璃布300B依序重合之狀態之積層體積層為2層。Thereby, as shown in FIG. 1 , between the heating and pressing plates 521, the laminated volume layer of the state in which the glass cloth 300A, the release film 10A, the FPC 200 , the release film 10B, and the glass cloth 300B are sequentially stacked is 2. layer.

再者,藉由本步驟(1-2),構成本發明的成形品之製造方法中在對象物(FPC200)上配置脫模薄膜之步驟。Furthermore, this step (1-2) constitutes a step of arranging a release film on the object (FPC200) in the manufacturing method of the molded article of the present invention.

(第2步驟) 接著,藉由經過前述第1步驟,對積層為多層之積層體分別進行加熱壓製,藉此在FPC200中,將CL膜220與撓性電路基板210接合(參閱圖1、圖2(b)。)。 (step 2) Next, by going through the above-mentioned first step, the multilayer laminated body is heated and pressed respectively, thereby bonding the CL film 220 and the flexible circuit board 210 in the FPC 200 (see FIG. 1 and FIG. 2( b ). ).

(2-1)首先,在玻璃布300(300A、300B)與加熱壓接板521接觸之狀態下,對加熱壓接板521進行加熱。(2-1) First, the heating and pressing plate 521 is heated while the glass cloth 300 ( 300A, 300B) is in contact with the heating and pressing plate 521 .

藉此,將玻璃布300A、脫模薄膜10A、FPC200、脫模薄膜10B及玻璃布300B重合之積層體藉由來自加熱壓接板521的熱傳遞而被加熱。Thereby, the laminated body which laminated|stacked glass cloth 300A, mold release film 10A, FPC200, mold release film 10B, and glass cloth 300B is heated by the heat transfer from the heating pressure bonding plate 521.

在本步驟(2-1)中,對積層體亦即FPC200進行加熱之溫度並無特別限定,但是例如較佳為100℃以上且250℃以下,更佳為150℃以上且200℃以下。In this step (2-1), the temperature for heating FPC 200 which is a laminate is not particularly limited, but is preferably 100°C to 250°C, more preferably 150°C to 200°C, for example.

又,對前述積層體進行加熱之時間並無特別限定,但是較佳為40sec以上且5000sec以下,更佳為設定為200sec以上且4000sec以下。藉此,能夠對積層體中的玻璃布300A、脫模薄膜10A、FPC200、脫模薄膜10B及玻璃布300B幾乎均勻地進行加熱。Also, the time for heating the laminate is not particularly limited, but is preferably 40 sec to 5000 sec, more preferably 200 sec to 4000 sec. Thereby, glass cloth 300A, release film 10A, FPC200, release film 10B, and glass cloth 300B in a laminate can be heated substantially uniformly.

(2-2)又,幾乎在進行前述步驟(2-1)中的加熱壓接板521的加熱之同時,使位於上側之加熱壓接板521與位於下側之加熱壓接板521沿著該等的厚度方向接近(壓製成形法)。(2-2) Also, almost simultaneously with the heating of the thermocompression bonding plate 521 in the aforementioned step (2-1), the thermocompression bonding plate 521 positioned on the upper side and the thermocompression bonding plate 521 positioned on the lower side are aligned. The thickness directions of these are close (press forming method).

其結果,在將形成於3片加熱壓接板521之間之2個空隙中分別配置之玻璃布300A、脫模薄膜10A、FPC200、脫模薄膜10B及玻璃布300B重合之積層體中,經由玻璃布300A、300B和脫模薄膜10A、10B,FPC200被加壓(參閱圖1、圖2(b))。As a result, in the laminate in which the glass cloth 300A, the mold release film 10A, the FPC 200 , the mold release film 10B, and the glass cloth 300B respectively disposed in the two spaces formed between the three heat-compression bonding plates 521 are stacked, the Glass cloth 300A, 300B, release film 10A, 10B, FPC200 are pressurized (refer FIG. 1, FIG. 2(b)).

藉此,由於FPC200被加熱的同時被加壓,因此在FPC200中,重合之撓性電路基板210與CL膜220經由CL膜220所具備之接著劑層222接合。換言之,覆蓋層221與撓性電路基板210經由接著劑層222接合。又,對FPC200進行加熱/加壓時、亦即覆蓋層221與撓性電路基板210經由接著劑層222接合時,在形成於覆蓋層221之凹部223內埋入脫模薄膜10。因此,能夠抑制來自於接著劑層222之接著劑滲入凹部223內(參閱圖2(b))。Thereby, since FPC200 is heated and pressurized, in FPC200, the superimposed flexible circuit board 210 and CL film 220 are bonded via the adhesive layer 222 with which CL film 220 is equipped. In other words, the cover layer 221 is bonded to the flexible circuit board 210 via the adhesive layer 222 . Also, when the FPC 200 is heated/pressurized, that is, when the cover layer 221 and the flexible circuit board 210 are bonded via the adhesive layer 222 , the release film 10 is embedded in the concave portion 223 formed in the cover layer 221 . Therefore, it is possible to suppress the adhesive from the adhesive layer 222 from penetrating into the concave portion 223 (see FIG. 2( b )).

在本步驟(2-2)中,對FPC200進行加壓之壓力並無特別限定,但是較佳為0.1MPa以上且20.0MPa以下,更佳為設定為0.5MPa以上且15.0MPa以下。In this step (2-2), the pressure for pressurizing FPC 200 is not particularly limited, but is preferably 0.1 MPa to 20.0 MPa, more preferably 0.5 MPa to 15.0 MPa.

又,對FPC200進行加壓之時間並無特別限定,但是較佳為20sec以上且5000sec以下,更佳為設定為100sec以上且4000sec以下。Also, the time for pressurizing the FPC 200 is not particularly limited, but is preferably not less than 20 sec and not more than 5000 sec, more preferably not less than 100 sec and not more than 4000 sec.

藉由將對FPC200進行加壓之壓力及時間分別設定在前述範圍內,能夠將覆蓋層221與撓性電路基板210經由接著劑層222確實地接合。By setting the pressure and time for pressurizing the FPC 200 within the aforementioned ranges, the cover layer 221 and the flexible circuit board 210 can be reliably bonded via the adhesive layer 222 .

再者,藉由本步驟(2-2),構成本發明的成形品之製造方法中對配置有脫模薄膜10之對象物(FPC200)進行加熱壓製之步驟。又,在覆蓋層221由含有半固化狀態的熱固性樹脂之材料構成之情況下,覆蓋層221構成對象物(FPC200)的配置有脫模薄膜10之一側的面。而且,以後述之第1脫模層1側的表面與該覆蓋層221的表面接觸之方式重疊使用了脫模薄膜10,因此能夠藉由脫模薄膜10,維持形成有凹部223之覆蓋層221的形狀,而使熱固性樹脂固化,因此能夠在撓性電路基板210上以優異之精度成形覆蓋層221(成形品)。Furthermore, this step (2-2) constitutes a step of heating and pressing the object (FPC200) on which the release film 10 is arranged in the manufacturing method of the molded article of the present invention. Moreover, when the cover layer 221 is comprised by the material containing the thermosetting resin in a semi-cured state, the cover layer 221 comprises the surface of the object (FPC200) on which the release film 10 is arrange|positioned. Furthermore, since the release film 10 is laminated so that the surface on the side of the first release layer 1 described later is in contact with the surface of the cover layer 221, the cover layer 221 in which the concave portion 223 is formed can be maintained by the release film 10. Since the thermosetting resin is cured, the cover layer 221 (molded product) can be molded on the flexible circuit board 210 with excellent precision.

又,在上述中,前述步驟(2-1)中的FPC200的加熱和本步驟(2-2)中的FPC200的加壓如上述幾乎同時實施為較佳,但是亦能夠以步驟(2-1)和步驟(2-2)的順序實施。但是,藉由幾乎同時實施步驟(2-1)和步驟(2-2),能夠實現縮短第2步驟、進而縮短製造FPC200時所需的時間。Also, in the above, the heating of the FPC 200 in the aforementioned step (2-1) and the pressurization of the FPC 200 in the present step (2-2) are preferably carried out almost simultaneously as described above, but it is also possible to perform the heating of the FPC 200 in the step (2-1) ) and steps (2-2) are implemented in sequence. However, by implementing step (2-1) and step (2-2) almost simultaneously, shortening of the time required for manufacturing FPC200 can be aimed at shortening a 2nd step.

(第3步驟;步驟(3)) 接著,使脫模薄膜10(10A、10B)從FPC200離型,獲得在撓性電路基板210上接合有CL膜220之FPC200(參閱圖2(c)。)。 (step 3; step (3)) Next, release film 10 (10A, 10B) is released from FPC200, and FPC200 in which CL film 220 is bonded to flexible circuit board 210 is obtained (see FIG. 2( c ).).

使脫模薄膜10從該FPC200離型之離型法並無特別限定,但是較佳地使用例如用手把持脫模薄膜的一端後,向90°以上且180°以下的方向剝離之方法。The release method for releasing the release film 10 from the FPC 200 is not particularly limited, but a method in which, for example, one end of the release film is held by hand and peeled in a direction of 90° to 180° is preferably used.

再者,在脫模薄膜10從FPC200剝離時,在加熱壓接板521與脫模薄膜10之間顯示優異之脫模性之情況下,亦可以省略在加熱壓接板521與脫模薄膜10之間配置玻璃布300。Furthermore, when the release film 10 is peeled from the FPC 200 , when excellent release properties are exhibited between the heat-compression bonding plate 521 and the release film 10 , the contact between the heat-pressure bonding plate 521 and the release film 10 may be omitted. Glass cloth 300 is arranged between them.

藉由如以上的步驟,構成使用脫模薄膜10之撓性印刷電路基板200之製造方法。Through the above-mentioned steps, the manufacturing method of the flexible printed circuit board 200 using the mold release film 10 is comprised.

又,作為適用於該撓性印刷電路基板200的製造之脫模薄膜10,使用本發明的脫模薄膜。亦即,作為脫模薄膜10可以使用如下脫模薄膜:具有由第1熱塑性樹脂組成物構成之第1脫模層1、由第3熱塑性樹脂組成物構成之緩衝層3及由第2熱塑性樹脂組成物構成之第2脫模層2,依序積層第1脫模層1、緩衝層3及第2脫模層2,脫模薄膜10在80℃下的複數剪切彈性模數為1.00MPa以下。Moreover, as the release film 10 suitable for manufacture of this flexible printed circuit board 200, the release film of this invention is used. That is, as the release film 10, the release film having the first release layer 1 made of the first thermoplastic resin composition, the buffer layer 3 made of the third thermoplastic resin composition, and the second thermoplastic resin composition can be used. The second release layer 2 composed of the composition is sequentially laminated with the first release layer 1, the buffer layer 3 and the second release layer 2, and the complex shear elastic modulus of the release film 10 at 80°C is 1.00 MPa the following.

在此,如前所述,在使用脫模薄膜10之撓性印刷電路基板200之製造方法中,要求兼顧脫模薄膜10對凹部223的填埋性和從撓性印刷電路基板200的脫模性。Here, as described above, in the method of manufacturing the flexible printed circuit board 200 using the release film 10, it is required to balance the filling of the concave portion 223 with the release film 10 and the release from the flexible printed circuit board 200. sex.

然而,尤其在考慮對於形成於撓性印刷電路基板200之凹部223之脫模薄膜10的填埋性之情況下,從抑制源自接著劑層222之接著劑滲入凹部223內之觀點考慮,實際上要求開發在前述步驟(2-2)中對凹部223發揮更優異之填埋性之脫模薄膜10。However, from the viewpoint of suppressing the penetration of the adhesive from the adhesive layer 222 into the recess 223, it is practical to consider the embedding properties of the release film 10 formed in the recess 223 of the flexible printed circuit board 200. Therefore, it is required to develop a release film 10 that exhibits a more excellent embedding property for the concave portion 223 in the aforementioned step (2-2).

與這樣的實際情況對應,在本發明中,作為脫模薄膜10,選擇其在80℃下的複數剪切彈性模數為1.00MPa以下之脫模薄膜。藉此,使脫模薄膜10發揮對於形成於撓性印刷電路基板200之凹部223之脫模薄膜10的更優異之填埋性,藉此抑制源自接著劑層222之接著劑滲入凹部223內。Corresponding to such actual conditions, in the present invention, as the release film 10, a release film having a complex shear elastic modulus at 80° C. of 1.00 MPa or less is selected. Thereby, the mold release film 10 exhibits a better embedding property for the mold release film 10 formed in the concave portion 223 of the flexible printed circuit board 200 , thereby suppressing penetration of the adhesive originating from the adhesive layer 222 into the concave portion 223 .

以下,對適用了本發明的脫模薄膜之脫模薄膜10進行說明。 <脫模薄膜10> 如圖3所示,在本實施形態中,脫模薄膜10由依序積層有第1脫模層1、緩衝層3及第2脫模層2之積層體構成,且以第1脫模層1側的表面與FPC200所具備之CL膜220接觸之方式重疊使用。 Hereinafter, the release film 10 to which the release film of the present invention is applied will be described. <Release film 10> As shown in FIG. 3 , in this embodiment, the release film 10 is composed of a laminate in which the first release layer 1, the buffer layer 3 and the second release layer 2 are sequentially laminated, and the first release layer 1 The surface on the side is overlapped and used so as to be in contact with the CL film 220 included in the FPC 200 .

作為該脫模薄膜10,如前述,在本發明中,選擇其在80℃下的複數剪切彈性模數為1.00MPa以下之脫模薄膜。藉此,能夠獲得具備更優異之追隨性之脫模薄膜10。As the release film 10 , as described above, in the present invention, a release film whose complex shear elastic modulus at 80° C. is 1.00 MPa or less is selected. Thereby, the mold release film 10 provided with the more excellent followability can be obtained.

脫模薄膜10具備更優異之追隨性,藉此在前述之使用脫模薄膜10之撓性印刷電路基板200的前述步驟(2-2)中,經由接著劑層222接合重合之撓性電路基板210和CL膜220時,以第1脫模層1追隨由撓性電路基板210和CL膜220形成之凹部223的形狀之方式壓入該第1脫模層1之層,且發揮作為緩衝的作用。又,藉由脫模薄膜10具備緩衝層3,能夠藉由脫模薄膜10,以均勻的壓力將CL膜220緊壓於撓性電路基板210。The release film 10 has better followability, so that in the aforementioned step (2-2) of the flexible printed circuit board 200 using the release film 10 , the overlapping flexible circuit boards are joined through the adhesive layer 222 210 and CL film 220, the first release layer 1 is pressed into the layer of the first release layer 1 in such a way that it follows the shape of the concave portion 223 formed by the flexible circuit board 210 and the CL film 220, and functions as a buffer. effect. Moreover, since the release film 10 is provided with the buffer layer 3 , the CL film 220 can be pressed against the flexible circuit board 210 with a uniform pressure by the release film 10 .

尤其,如上述,在幾乎同時實施前述步驟(2-1)中的FPC200的加熱和前述步驟(2-2)中的FPC200的加壓之情況下,前述步驟(2-1)中的FPC200的加熱與前述步驟(2-2)中的FPC200的加壓相比,其響應性較低。亦即,在幾乎同時實施FPC200的加熱和加壓之情況下,相對於對FPC200能夠相對較早地賦予作為目的之壓力,使FPC200到達作為目的之加熱溫度需要較長時間。In particular, as described above, in the case where the heating of the FPC 200 in the aforementioned step (2-1) and the pressurization of the FPC 200 in the aforementioned step (2-2) are carried out almost simultaneously, the FPC 200 in the aforementioned step (2-1) Heating has lower responsiveness than pressurization of FPC 200 in the aforementioned step (2-2). That is, when the heating and pressurization of the FPC 200 are performed almost simultaneously, it takes a long time for the FPC 200 to reach the desired heating temperature compared to the fact that the desired pressure can be applied to the FPC 200 relatively early.

因此,FPC200在作為目的之加熱溫度下加熱之前,對FPC200賦予作為目的之壓力。因此,考慮前述步驟(2-1)中的FPC200的加熱溫度,例如即使規定了作為加熱溫度的較佳的溫度範圍之100℃以上且250℃以下的範圍內的脫模薄膜10的彈性模數,亦無法將具有優異之填埋性之脫模薄膜10填埋於凹部223,在以往無法充分抑制源自接著劑層222之接著劑滲入凹部223內。Therefore, before FPC200 is heated at the target heating temperature, the target pressure is given to FPC200. Therefore, considering the heating temperature of the FPC 200 in the aforementioned step (2-1), for example, even if the elastic modulus of the release film 10 in the range of 100° C. to 250° C. is specified as a preferable temperature range of the heating temperature , and the mold release film 10 having excellent embedding properties cannot be buried in the concave portion 223 , and the penetration of the adhesive agent from the adhesive layer 222 into the concave portion 223 cannot be sufficiently suppressed conventionally.

相對於此,考慮在本發明中,對FPC200賦予作為目的之壓力之時點,FPC200的加熱溫度未達到作為目的之溫度,如前述,將80℃下的脫模薄膜10的複數剪切彈性模數設定在1.00MPa以下。因此,更確實地發揮作為脫模薄膜10的功能而能夠將具有優異之填埋性之脫模薄膜10填埋於凹部223。因此,能夠確實地抑制或防止源自接著劑層222之接著劑滲入凹部223內。On the other hand, considering that in the present invention, when the target pressure is applied to FPC 200, the heating temperature of FPC 200 does not reach the target temperature, and the complex shear elastic modulus of release film 10 at 80° C. Set it below 1.00MPa. Therefore, the function as the release film 10 can be exhibited more reliably, and the release film 10 which has excellent embedding property can be embedded in the recessed part 223. Therefore, it is possible to reliably suppress or prevent the adhesive from the adhesive layer 222 from penetrating into the concave portion 223 .

以下,對構成脫模薄膜10之各層進行說明。 <緩衝層3> 首先,對緩衝層3進行說明。該緩衝層3配置為第1脫模層1與第2脫模層2之間的中間層。 Hereinafter, each layer which comprises the release film 10 is demonstrated. <Buffer layer 3> First, the buffer layer 3 will be described. This buffer layer 3 is arrange|positioned as the intermediate layer between the 1st mold release layer 1 and the 2nd mold release layer 2.

該緩衝層3由第3熱塑性樹脂組成物構成。以對脫模薄膜10賦予前述功能、亦即將80℃下的脫模薄膜10的複數剪切彈性模數設定在前述上限值以下為目的,在本發明中,該第3熱塑性樹脂組成物含有複數種熱塑性樹脂為較佳。The buffer layer 3 is composed of a third thermoplastic resin composition. In the present invention, the third thermoplastic resin composition contains A plurality of thermoplastic resins are preferred.

作為複數種熱塑性樹脂的組合,例如可舉出聚酯系樹脂與聚烯烴系樹脂的組合、聚烯烴系樹脂彼此的組合及聚醯胺系樹脂與聚烯烴系樹脂的組合等,其中,藉由選擇聚酯系樹脂與聚烯烴系樹脂的組合,能夠相對容易地將脫模薄膜10在80℃下的複數剪切彈性模數設定在前述上限值以下。Examples of combinations of thermoplastic resins include combinations of polyester resins and polyolefin resins, combinations of polyolefin resins, and combinations of polyamide resins and polyolefin resins. By selecting a combination of a polyester-based resin and a polyolefin-based resin, the complex shear modulus of the release film 10 at 80° C. can be relatively easily set to be below the aforementioned upper limit.

作為聚酯系樹脂,並無特別限定,但是例如可舉出聚對酞酸乙二酯(PET)、聚環己烷對苯二甲酸酯(PCT)、聚對酞酸丁二酯(PBT)、聚萘二甲酸乙二酯(PEN)、聚環己烷對苯二甲酸酯、聚對苯二甲酸丙二醇酯等,能夠適用該等中的1種或組合2種以上使用。再者,在組合該等中的2種以上使用之情況下,該聚酯系樹脂可以為該等的混合體,亦可以為共聚物。該等中,聚酯系樹脂為聚對酞酸丁二酯為特佳。藉此,能夠對緩衝層3賦予對於凹部223之優異之追隨性。又,在構成第1脫模層1之第1熱塑性樹脂組成物中含有聚對酞酸丁二酯之情況下,緩衝層3對第1脫模層1發揮優異之密接性。The polyester-based resin is not particularly limited, but examples include polyethylene terephthalate (PET), polycyclohexane terephthalate (PCT), polybutylene terephthalate (PBT), ), polyethylene naphthalate (PEN), polycyclohexane terephthalate, polytrimethylene terephthalate, etc., one or a combination of two or more of these can be used. In addition, when using these in combination of 2 or more types, this polyester-type resin may be these mixtures, and may be a copolymer. Among these, it is particularly preferable that the polyester-based resin is polybutylene terephthalate. Thereby, excellent followability with respect to the recessed part 223 can be provided to the buffer layer 3. Moreover, when polybutylene terephthalate is contained in the 1st thermoplastic resin composition which comprises the 1st mold release layer 1, the cushion layer 3 exhibits the adhesiveness outstanding to the 1st mold release layer 1.

又,作為聚烯烴系樹脂,並無特別限定,例如可舉出如低密度聚乙烯、高密度聚乙烯之類的聚乙烯、具有聚丙烯等α-烯烴系聚合物、乙烯、丙烯、丁烯、戊烯、己烯、辛烯等作為聚合物成分之,乙烯與己烯的共聚物、乙烯與辛烯的共聚物、α-烯烴與(甲基)丙烯酸酯的共聚物、乙烯與乙酸乙烯酯的共聚物、乙烯與(甲基)丙烯酸的共聚物之類的α-烯烴系共聚物等,能夠使用該等中的1種或組合2種以上使用。該等中,乙烯與乙酸乙烯酯的共聚物(乙烯乙酸乙烯酯共聚物)及乙烯與(甲基)丙烯酸的共聚物(乙烯(甲基)丙烯酸共聚物)中的至少1種為較佳。藉此,能夠對緩衝層3賦予對於凹部223之優異之追隨性。Also, the polyolefin resin is not particularly limited, and examples thereof include polyethylene such as low-density polyethylene and high-density polyethylene, α-olefin-based polymers such as polypropylene, ethylene, propylene, butene , pentene, hexene, octene, etc. as polymer components, copolymers of ethylene and hexene, copolymers of ethylene and octene, copolymers of α-olefin and (meth)acrylate, ethylene and vinyl acetate An ester copolymer, an α-olefin-based copolymer such as a copolymer of ethylene and (meth)acrylic acid, or the like can be used alone or in combination of two or more kinds. Among these, at least one of a copolymer of ethylene and vinyl acetate (ethylene vinyl acetate copolymer) and a copolymer of ethylene and (meth)acrylic acid (ethylene (meth)acrylic acid copolymer) is preferred. Thereby, excellent followability with respect to the recessed part 223 can be provided to the buffer layer 3.

在設為聚酯系樹脂與聚烯烴系樹脂的組合之情況下,該第3熱塑性樹脂組成物中的聚酯系樹脂的含量為5重量%以上為較佳,8重量%以上且20重量%以下為更佳。藉此,能夠對脫模薄膜10賦予對於凹部223之優異之追隨性。In the case of a combination of a polyester resin and a polyolefin resin, the content of the polyester resin in the third thermoplastic resin composition is preferably 5% by weight or more, 8% by weight or more and 20% by weight or more. The following is better. Thereby, excellent followability with respect to the recessed part 223 can be provided to the release film 10.

又,第3熱塑性樹脂組成物中所含有之熱塑性樹脂的熔點未達80℃為較佳,40℃以上且未達80℃為更佳。藉此,能夠相對容易地將脫模薄膜10在80℃下的複數剪切彈性模數設定在前述上限值以下。In addition, the melting point of the thermoplastic resin contained in the third thermoplastic resin composition is preferably less than 80°C, more preferably 40°C or higher and less than 80°C. Thereby, the complex shear elastic modulus at 80 degreeC of the release film 10 can be set relatively easily below the said upper limit value.

又,在構成緩衝層3之第3熱塑性樹脂組成物中,除了前述之樹脂材料以外,還可以包含晶核劑、抗氧化劑、滑劑(slip agent)、防黏結劑、防靜電劑、著色劑、穩定劑之類的添加劑。Also, in the third thermoplastic resin composition constituting the buffer layer 3, in addition to the aforementioned resin materials, crystal nucleating agents, antioxidants, slip agents, anti-adhesive agents, antistatic agents, and colorants may also be included. , stabilizers and other additives.

該緩衝層3在150℃下的儲存彈性模數E’為9.0MPa以上為較佳,10MPa以上且50MPa以下為更佳,10MPa以上且25MPa以下為進一步較佳。如上述設定緩衝層3在150℃下的儲存彈性模數E’,藉此前述步驟(2-2)中的脫模薄膜10填埋於凹部223時,緩衝層3的一部分從脫模薄膜10的緣部露出,能夠確實地抑制或防止附著於FPC200。因此,能夠確實地抑制或防止FPC200的污染。又,能夠容易地進行前述步驟(3)中的夾持脫模薄膜10的緣部之脫模薄膜10的剝離。The storage elastic modulus E' at 150°C of the buffer layer 3 is preferably 9.0 MPa or more, more preferably 10 MPa or more and 50 MPa or less, still more preferably 10 MPa or more and 25 MPa or less. The storage elastic modulus E' of the buffer layer 3 at 150° C. is set as described above, so that when the release film 10 in the aforementioned step (2-2) is buried in the recess 223, a part of the buffer layer 3 is released from the release film 10 The edge portion of the film is exposed, and it is possible to reliably suppress or prevent adhesion to the FPC 200 . Therefore, contamination of FPC200 can be suppressed or prevented reliably. Moreover, the peeling of the release film 10 which pinches the edge part of the release film 10 in the said process (3) can be performed easily.

再者,緩衝層3在150℃下的儲存彈性模數E’例如能夠藉由如下來獲得:依據JIS K7244-4,準備寬度4mm、長度20mm的緩衝層3,使用動態黏彈性測量裝置(日立高科技公司製、“DMA7100”),以拉伸模式、頻率1Hz、升溫速度5℃/分鐘進行測量。Furthermore, the storage elastic modulus E' of the buffer layer 3 at 150° C. can be obtained, for example, by preparing a buffer layer 3 with a width of 4 mm and a length of 20 mm in accordance with JIS K7244-4, and using a dynamic viscoelasticity measuring device (Hitachi "DMA7100" manufactured by Hi-Tech Co., Ltd.) was measured in tension mode, at a frequency of 1 Hz, and at a heating rate of 5° C./min.

此外,該緩衝層3的平均厚度Tk為60μm以上且200μm以下為較佳,70μm以上且180μm以下為更佳。藉此,能夠更顯著地發揮藉由將脫模薄膜10在80℃下的複數剪切彈性模數設定在前述上限值以下來獲得之效果。In addition, the average thickness Tk of the buffer layer 3 is preferably not less than 60 μm and not more than 200 μm, more preferably not less than 70 μm and not more than 180 μm. Thereby, the effect acquired by setting the complex shear elastic modulus in 80 degreeC of the release film 10 below the said upper limit can be exhibited more remarkably.

<第1脫模層1> 接著,對第1脫模層1進行說明。該第1脫模層1積層於緩衝層3的一面側。 1st release layer 1> Next, the first release layer 1 will be described. The first release layer 1 is laminated on one side of the buffer layer 3 .

第1脫模層1具備撓性,在前述之使用了脫模薄膜10之撓性印刷電路基板200之製造方法中,以該第1脫模層1與FPC200所具備之CL膜220接觸之方式重合脫模薄膜10。而且,在該製造方法的前述步驟(2-2)中,經由接著劑層222接合重合之撓性電路基板210和CL膜220時,追隨由撓性電路基板210和CL膜220形成之凹部223的形狀而被壓入之層且作為防止脫模薄膜10斷裂之保護(緩衝)材而發揮作用。此外,第1脫模層1具有作為用以在前述步驟(3)中發揮脫模薄膜10從CL膜220(FPC200)的優異之脫模性之接觸層的功能。The first release layer 1 has flexibility, and in the above-mentioned method of manufacturing the flexible printed circuit board 200 using the release film 10 , the first release layer 1 is in contact with the CL film 220 included in the FPC 200 Overlay the release film 10. Furthermore, in the aforementioned step (2-2) of this manufacturing method, when the superimposed flexible circuit board 210 and CL film 220 are bonded via the adhesive layer 222, the concave portion 223 formed by the flexible circuit board 210 and the CL film 220 is followed. The layer that is pressed into the shape and functions as a protection (cushion) material that prevents the release film 10 from breaking. Moreover, the 1st release layer 1 has a function as a contact layer for exhibiting the excellent release property of the release film 10 from the CL film 220 (FPC200) in said process (3).

因此,在前述步驟(2-2)中,能夠確實地抑制或防止來自於接著劑層222之接著劑滲入形成於FPC200之凹部223中。又,在前述步驟(2-2)中的形成撓性電路基板210與CL膜220經由CL膜220所具備之接著劑層222接合之FPC200之後,在前述步驟(3)中,使脫模薄膜10從FPC200剝離時,能夠確實地抑制或防止在FPC200發生伸長及斷裂。又,在構成緩衝層3之第3熱塑性樹脂組成物中含有聚酯系樹脂之情況下,第1脫模層1能夠對緩衝層3發揮優異之密接性。Therefore, in the aforementioned step (2-2), penetration of the adhesive from the adhesive layer 222 into the concave portion 223 formed in the FPC 200 can be reliably suppressed or prevented. In addition, after forming the FPC 200 in which the flexible circuit board 210 and the CL film 220 are bonded via the adhesive layer 222 of the CL film 220 in the aforementioned step (2-2), in the aforementioned step (3), the mold release film When 10 is peeled off from FPC200, elongation and breakage in FPC200 can be suppressed or prevented reliably. Moreover, when the 3rd thermoplastic resin composition which comprises the cushion layer 3 contains a polyester resin, the 1st release layer 1 can exhibit the adhesiveness outstanding to the cushion layer 3.

第1脫模層1由第1熱塑性樹脂組成物構成。又,該第1熱塑性樹脂組成物由能夠將第1脫模層1在150℃下的儲存彈性模數E’設定在100MPa以上之組成物構成為較佳,例如主要含有聚酯系樹脂為較佳。藉此,能夠相對輕易地將前述儲存彈性模數E’設定為100MPa以上,並且能夠對第1脫模層1確實地賦予前述之功能。此外,相對容易地對脫模薄膜10賦予前述功能,亦即能夠相對容易地將80℃下的脫模薄膜10的複數剪切彈性模數設定在前述上限值以下。The 1st mold release layer 1 is comprised from the 1st thermoplastic resin composition. In addition, the first thermoplastic resin composition is preferably composed of a composition that can set the storage elastic modulus E' of the first release layer 1 at 150° C. to 100 MPa or more, for example, it is better to mainly contain a polyester resin. good. Thereby, the said storage modulus E' can be set to 100 MPa or more relatively easily, and the said function can be given to the 1st release layer 1 reliably. In addition, it is relatively easy to impart the aforementioned functions to the release film 10 , that is, it is relatively easy to set the complex shear elastic modulus of the release film 10 at 80° C. to the aforementioned upper limit value or less.

又,作為聚酯系樹脂,並無特別限定,但是例如能夠使用與在前述之第3熱塑性樹脂組成物中舉出者相同的樹脂,其中,特佳為聚對酞酸丁二酯(PBT)。藉此,能夠更顯著地發揮藉由使用聚酯系樹脂而獲得之效果。又,在構成緩衝層3之第3熱塑性樹脂組成物中含有聚對酞酸丁二酯之情況下,能夠製成對緩衝層3發揮優異之密接性之第1脫模層1。Also, the polyester-based resin is not particularly limited, but for example, the same resins as those mentioned in the aforementioned third thermoplastic resin composition can be used, and among them, polybutylene terephthalate (PBT) is particularly preferable. . Thereby, the effect obtained by using a polyester resin can be exhibited more notably. Moreover, when polybutylene terephthalate is contained in the 3rd thermoplastic resin composition which comprises the buffer layer 3, the 1st release layer 1 which exhibits the outstanding adhesiveness with respect to the buffer layer 3 can be set.

再者,第1熱塑性樹脂組成物在主要由聚酯系樹脂構成之情況下,可以含有除了聚酯系樹脂以外的熱塑性樹脂,作為該熱塑性樹脂,例如可舉出聚乙烯、聚丙烯、聚4-甲基1-戊烯之類的聚烯烴系樹脂、間規聚苯乙烯之類的聚苯乙烯系樹脂等,能夠使用該等中的1種或組合2種以上使用。Furthermore, when the first thermoplastic resin composition is mainly composed of polyester-based resins, it may contain thermoplastic resins other than polyester-based resins. Examples of such thermoplastic resins include polyethylene, polypropylene, polypropylene, - Polyolefin-based resins such as methyl-1-pentene, polystyrene-based resins such as syndiotactic polystyrene, and the like can be used alone or in combination of two or more kinds.

又,第1熱塑性樹脂組成物除了前述之熱塑性樹脂以外,還可以含有無機粒子及有機粒子中的至少1種。In addition, the first thermoplastic resin composition may contain at least one of inorganic particles and organic particles in addition to the aforementioned thermoplastic resins.

作為無機粒子,並無特別限定,但是例如可舉出氫氧化鋁、氫氧化鎂、碳酸鈣、碳酸鎂、矽酸鈣、矽酸鎂、氧化鈣、氧化鎂、氧化鋁、氮化鋁、硼酸鋁晶鬚、氮化硼、結晶性二氧化矽、非晶性二氧化矽、氧化銻、E玻璃、D玻璃、S玻璃等,能夠使用該等之中的1種或組合使用2種以上。The inorganic particles are not particularly limited, but examples include aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, calcium silicate, magnesium silicate, calcium oxide, magnesium oxide, aluminum oxide, aluminum nitride, boric acid Aluminum whiskers, boron nitride, crystalline silica, amorphous silica, antimony oxide, E glass, D glass, S glass, and the like can be used alone or in combination of two or more.

又,作為有機粒子,並無特別限定,但是例如可舉出聚苯乙烯粒子、丙烯酸粒子、聚醯亞胺粒子、聚酯粒子、聚矽氧粒子、聚丙烯粒子、聚乙烯粒子、氟樹脂粒子及核殼粒子等,能夠使用該等之中的1種或組合使用2種以上。Also, the organic particles are not particularly limited, but examples include polystyrene particles, acrylic particles, polyimide particles, polyester particles, silicone particles, polypropylene particles, polyethylene particles, fluororesin particles and core-shell particles, etc., one of them can be used or two or more can be used in combination.

此外,無機粒子及有機粒子的平均粒徑較佳為3μm以上且20μm以下,更佳為5μm以上且20μm以下。藉此,在第1熱塑性樹脂組成物中含有無機粒子及有機粒子中的至少一者之情況下,能夠相對輕易地將第1脫模層1的與緩衝層3相反的一側的表面的表面粗糙度設定在後述之範圍內。In addition, the average particle diameter of the inorganic particles and organic particles is preferably from 3 μm to 20 μm, more preferably from 5 μm to 20 μm. Thereby, when at least one of inorganic particles and organic particles is contained in the first thermoplastic resin composition, the surface of the surface of the first release layer 1 opposite to the buffer layer 3 can be relatively easily Roughness is set within the range described later.

在第1脫模層1在其表面具有凹凸形狀之情況下,前述表面的10個點平均粗糙度(Rz)較佳為0.5μm以上且3.6μm以下,更佳為1.0μm以上且3.5μm以下。藉此,使脫模薄膜10從FPC200(撓性電路基板210)離型時,能夠以優異之脫模性實施該離型。再者,前述10個點平均粗糙度(Rz)能夠依照JIS B 0601-1994來測量。When the first mold release layer 1 has unevenness on its surface, the 10-point average roughness (Rz) of the surface is preferably 0.5 μm or more and 3.6 μm or less, more preferably 1.0 μm or more and 3.5 μm or less . Thereby, when releasing the mold release film 10 from FPC200 (flexible circuit board 210), this mold release can be implemented with the excellent mold release property. In addition, the aforementioned 10-point average roughness (Rz) can be measured in accordance with JIS B 0601-1994.

形成該結構之第1脫模層1在150℃下的儲存彈性模數E’為100MPa以上為較佳,100MPa以上且1000MPa以下為更佳,100MPa以上且200MPa以下為特佳。藉此,能夠對第1脫模層1確實地賦予前述之功能。The storage elastic modulus E' at 150°C of the first release layer 1 forming this structure is preferably 100 MPa or more, more preferably 100 MPa or more and 1000 MPa or less, and particularly preferably 100 MPa or more and 200 MPa or less. Thereby, the above-mentioned function can be provided reliably to the 1st mold release layer 1.

再者,第1脫模層1在150℃下的儲存彈性模數E’能夠藉由如下來獲得:依照JIS K7244-4,準備寬度4mm、長度20mm的第1脫模層1,使用黏彈性測量裝置(日立高科技公司製,“DMA7100”),以拉伸模式、頻率1Hz、升溫速度5℃/分鐘進行測量。Furthermore, the storage elastic modulus E' at 150°C of the first release layer 1 can be obtained by preparing the first release layer 1 with a width of 4 mm and a length of 20 mm in accordance with JIS K7244-4, and using viscoelastic A measuring device (manufactured by Hitachi High-Tech Co., Ltd., "DMA7100") was used for measurement in tension mode, at a frequency of 1 Hz, and at a heating rate of 5° C./min.

又,該第1脫模層1的平均厚度T1較佳為5μm以上且30μm以下,更佳為6μm以上且25μm以下。藉此,第1脫模層1的平均厚度設定在適當的範圍內,因此能夠更確實地對第1脫模層1賦予前述之功能。Moreover, the average thickness T1 of the said 1st mold release layer 1 becomes like this. Preferably it is 5 micrometers or more and 30 micrometers or less, More preferably, it is 6 micrometers or more and 25 micrometers or less. Thereby, since the average thickness of the 1st mold release layer 1 is set in an appropriate range, the above-mentioned function can be given to the 1st mold release layer 1 more reliably.

再者,如上所述,關於第1脫模層1的厚度,在第1脫模層1的與緩衝層3相反的一側的表面具有凹凸形狀之情況下,在凸部中的包括凸部之位置且凹部中的包括凹部之位置分別測量該厚度。Furthermore, as mentioned above, regarding the thickness of the first mold release layer 1, when the surface of the first mold release layer 1 opposite to the buffer layer 3 has a concave-convex shape, the thickness of the convex portion includes the convex portion. The thickness is measured at the positions of the recesses and the positions including the recesses, respectively.

又,在構成第1脫模層1之第1熱塑性樹脂組成物中,除了前述之樹脂材料、無機粒子、有機粒子以外,還可以包含與在前述第3熱塑性樹脂組成物中舉出者相同的添加劑。Also, in the first thermoplastic resin composition constituting the first mold release layer 1, in addition to the above-mentioned resin material, inorganic particles, and organic particles, the same ones as those listed in the above-mentioned third thermoplastic resin composition may be included. additive.

<第2脫模層2> 接著,對第2脫模層2進行說明。該第2脫模層2積層於緩衝層3的另一面側亦即緩衝層3的與第1脫模層1相反的一面側。 Second release layer 2> Next, the second release layer 2 will be described. This 2nd mold release layer 2 is laminated|stacked on the other surface side of the cushion layer 3, ie, the surface side of the cushion layer 3 opposite to the 1st mold release layer 1.

第2脫模層2具備撓性並且前述之使用脫模薄膜10之撓性印刷電路基板200之製造方法中,以第1脫模層1與FPC200所具備之CL膜220接觸之方式重疊脫模薄膜10,而且,該製造方法的前述步驟(2-2)中,經由接著劑層222來接合重疊之撓性電路基板210和CL膜220時,作為將來自加熱壓接板521的力傳遞到緩衝層3之層發揮作用。此外,第2脫模層2具有作為用以在前述步驟(3)中在玻璃布300與脫模薄膜10之間發揮優異之脫模性之接觸層的功能。The second mold release layer 2 has flexibility, and in the above-mentioned method of manufacturing the flexible printed circuit board 200 using the mold release film 10 , the first mold release layer 1 and the CL film 220 of the FPC 200 are laminated and released. film 10, and in the aforementioned step (2-2) of the manufacturing method, when the overlapping flexible circuit board 210 and CL film 220 are bonded via the adhesive layer 222, as the force from the heating and pressing plate 521 is transmitted to The layer of buffer layer 3 plays a role. Moreover, the 2nd mold release layer 2 has the function as a contact layer for exhibiting the excellent mold release property between the glass cloth 300 and the mold release film 10 in the said process (3).

第2脫模層2由第2熱塑性樹脂組成物構成,該第2熱塑性樹脂組成物較佳選擇為能夠將第2脫模層2在150℃下的儲存彈性模數E’設定在100MPa以上之樹脂,具體而言,與前述第1熱塑性樹脂組成物同樣地,主要含有聚酯系樹脂為較佳。藉此,能夠相對輕易地將前述儲存彈性模數E’設定為100MPa以上,並且能夠對第2脫模層2確實地賦予前述之功能。此外,相對容易地對脫模薄膜10賦予前述功能,亦即能夠相對容易地將80℃下的脫模薄膜10的複數剪切彈性模數設定在前述上限值以下。The second release layer 2 is composed of a second thermoplastic resin composition, and the second thermoplastic resin composition is preferably selected so that the storage elastic modulus E' of the second release layer 2 at 150° C. can be set to 100 MPa or more. Specifically, the resin preferably mainly contains a polyester-based resin similarly to the aforementioned first thermoplastic resin composition. Thereby, the said storage elastic modulus E' can be set to 100 MPa or more relatively easily, and the said function can be given to the 2nd mold release layer 2 reliably. In addition, it is relatively easy to impart the aforementioned functions to the release film 10 , that is, it is relatively easy to set the complex shear elastic modulus of the release film 10 at 80° C. to the aforementioned upper limit value or less.

又,作為聚酯系樹脂,並無特別限定,但是例如能夠使用與在前述之第3熱塑性樹脂組成物中舉出者相同的樹脂,其中,特佳為聚對酞酸丁二酯(PBT)。藉此,能夠更顯著地發揮藉由使用聚酯系樹脂而獲得之效果。Also, the polyester-based resin is not particularly limited, but for example, the same resins as those mentioned in the aforementioned third thermoplastic resin composition can be used, and among them, polybutylene terephthalate (PBT) is particularly preferable. . Thereby, the effect obtained by using a polyester resin can be exhibited more notably.

再者,第2熱塑性樹脂組成物在主要由聚酯系樹脂構成之情況下,可以含有除了聚酯系樹脂以外的熱塑性樹脂,作為該熱塑性樹脂,能夠使用與在前述第1熱塑性樹脂組成物中舉出者相同的樹脂。Furthermore, when the second thermoplastic resin composition is mainly composed of polyester resin, it may contain thermoplastic resins other than polyester resin. The same resins are cited.

又,第2熱塑性樹脂組成物除了前述之熱塑性樹脂以外,還可以含有無機粒子及有機粒子中的至少1種。In addition, the second thermoplastic resin composition may contain at least one of inorganic particles and organic particles in addition to the aforementioned thermoplastic resins.

作為無機粒子及有機粒子,並無特別限定,但是能夠使用與在前述第1熱塑性樹脂組成物中舉出者相同的粒子。The inorganic particles and organic particles are not particularly limited, but the same particles as those mentioned in the above-mentioned first thermoplastic resin composition can be used.

形成該結構之第2脫模層2在150℃下的儲存彈性模數E’為100MPa以上較佳,100MPa以上且1000MPa以下為更佳。藉此,能夠對第2脫模層2確實地賦予前述之功能。The storage elastic modulus E' at 150°C of the second release layer 2 forming this structure is preferably 100 MPa or more, more preferably 100 MPa or more and 1000 MPa or less. Thereby, the above-mentioned function can be provided reliably to the 2nd mold release layer 2.

又,該第2脫模層2的平均厚度T2較佳為5μm以上且30μm以下,更佳為6μm以上且25μm以下。藉此,能夠更確實地對第2脫模層2賦予前述之功能。Moreover, the average thickness T2 of the said 2nd mold release layer 2 becomes like this. Preferably it is 5 micrometers or more and 30 micrometers or less, More preferably, it is 6 micrometers or more and 25 micrometers or less. Thereby, the above-mentioned function can be given to the 2nd mold release layer 2 more reliably.

此外,在構成第2脫模層2之第2熱塑性樹脂組成物中,除了前述之樹脂材料、無機粒子、有機粒子以外,還可以包含與在前述第3熱塑性樹脂組成物中舉出者相同的添加劑。In addition, in the second thermoplastic resin composition constituting the second mold release layer 2, in addition to the above-mentioned resin material, inorganic particles, and organic particles, the same ones as those listed in the above-mentioned third thermoplastic resin composition may be included. additive.

又,在第1脫模層1和第2脫模層2中,第1熱塑性樹脂組成物與第2熱塑性樹脂組成物可以相同,亦可以不同,但是就具有代替性之觀點而言,較佳為相同或相同性質。此外,在第1脫模層1和第2脫模層2中,其平均厚度可以相同,亦可以不同。In addition, in the first mold release layer 1 and the second mold release layer 2, the first thermoplastic resin composition and the second thermoplastic resin composition may be the same or different, but from the viewpoint of substitutability, preferably are the same or of the same nature. Moreover, in the 1st mold release layer 1 and the 2nd mold release layer 2, the average thickness may be the same, and may differ.

在成為如以上的積層第1脫模層1、緩衝層3及第2脫模層2之結構之脫模薄膜10中,其平均厚度Tt較佳為90μm以上且250μm以下,更佳為100μm以上且220μm以下。藉此,能夠更確實地發揮藉由將前述脫模薄膜10在80℃下的複數剪切彈性模數設定在前述上限值以下來獲得之效果。In the release film 10 having the structure of laminating the first release layer 1, buffer layer 3, and second release layer 2 as described above, the average thickness Tt thereof is preferably 90 μm or more and 250 μm or less, more preferably 100 μm or more And 220μm or less. Thereby, the effect acquired by setting the complex shear elastic modulus in 80 degreeC of the said release film 10 below the said upper limit can be exhibited more reliably.

在此,如前述,脫模薄膜10在80℃下的複數剪切彈性模數為1.00MPa以下即可,0.65MPa以下為較佳。藉由如上述設定脫模薄膜10在80℃下的複數剪切彈性模數,能夠更確實地抑制或防止源自接著劑層222之接著劑滲入凹部223內。Here, as mentioned above, the complex shear elastic modulus of the mold release film 10 at 80° C. may be 1.00 MPa or less, preferably 0.65 MPa or less. By setting the complex shear modulus of the release film 10 at 80° C. as described above, it is possible to more reliably suppress or prevent the adhesive from the adhesive layer 222 from penetrating into the concave portion 223 .

又,脫模薄膜10在80℃下的儲存剪切彈性模數為1.00MPa以下為較佳,0.60MPa以下為更佳。此外,脫模薄膜10在80℃下的損失剪切彈性模數為0.40MPa以下為較佳,0.25MPa以下為更佳。藉由如上述分別設定脫模薄膜10在80℃下的儲存剪切彈性模數及損失剪切彈性模數,能夠更確實地抑制或防止源自接著劑層222之接著劑滲入凹部223內。Moreover, the storage shear elastic modulus of the release film 10 at 80° C. is preferably 1.00 MPa or less, more preferably 0.60 MPa or less. In addition, the loss shear modulus of the release film 10 at 80° C. is preferably 0.40 MPa or less, more preferably 0.25 MPa or less. By separately setting the storage shear modulus and loss shear modulus of the release film 10 at 80° C. as described above, it is possible to more reliably suppress or prevent the adhesive from the adhesive layer 222 from penetrating into the recess 223 .

脫模薄膜10在80℃下的複數剪切彈性模數、儲存剪切彈性模數及損失剪切彈性模數能夠藉由如下來獲得:例如準備直徑8mm的整體形狀為圓盤狀亦即在俯視下形狀呈圓形狀之脫模薄膜10,使用黏彈性測量裝置(安東帕公司製、“MCR102”),以頻率10Hz、應變0.1%、升溫速度4℃/分鐘進行測量。The complex shear modulus, storage shear modulus and loss shear modulus of the release film 10 at 80°C can be obtained as follows: The release film 10 having a circular shape in plan view was measured at a frequency of 10 Hz, a strain of 0.1%, and a heating rate of 4° C./min using a viscoelasticity measuring device (manufactured by Anton Paar, “MCR102”).

再者,在本實施形態中,脫模薄膜10由依序積層第1脫模層1、緩衝層3及第2脫模層2之積層體構成,但是並不限定於該結構,例如,可以由具備配置於第1脫模層1與緩衝層3之間及第2脫模層2與緩衝層3之間中的至少一者之接著劑層之類的中間層之積層體構成。Furthermore, in the present embodiment, the release film 10 is composed of a laminate in which the first release layer 1, the buffer layer 3, and the second release layer 2 are sequentially laminated, but it is not limited to this structure. It is a laminate configuration including an intermediate layer such as an adhesive layer arranged between the first release layer 1 and the buffer layer 3 and at least one of the second release layer 2 and the buffer layer 3 .

又,若在前述步驟(3)中,脫模薄膜10能夠在玻璃布300與脫模薄膜10之間維持優異之脫模性,則可以省略與玻璃布300接觸之第2脫模層2。Also, if the release film 10 can maintain excellent release properties between the glass cloth 300 and the release film 10 in the aforementioned step (3), the second release layer 2 in contact with the glass cloth 300 can be omitted.

以上,對本發明的脫模薄膜及成形品之製造方法進行了說明,但是本發明並不限定於該等。As mentioned above, although the manufacturing method of the release film of this invention and a molded article was demonstrated, this invention is not limited to these.

例如,在前述實施形態中,對將本發明的脫模薄膜適用於將配置於加熱冷卻板之間之撓性印刷電路基板積層為2層而製造之壓製成形法之情況進行了說明,但是所積層之撓性印刷電路基板的數量並不限定於2層,可以為一層,亦可以為三層以上。For example, in the above-mentioned embodiment, the case where the release film of the present invention is applied to the press molding method of laminating two layers of flexible printed circuit boards disposed between heating and cooling plates has been described. The number of laminated flexible printed circuit boards is not limited to two layers, and may be one layer or three or more layers.

又,雖然將本發明的脫模薄膜適用於對配置於加熱冷卻板之間之撓性印刷電路基板使用壓製成形法進行加壓之情況,但是並不限定於此,對撓性印刷電路基板的加壓例如能夠使用輥對輥壓製機來實施,進而亦能夠使用真空壓空成形法來實施。 [實施例] In addition, although the mold release film of the present invention is applied to the case of pressurizing a flexible printed circuit board arranged between heating and cooling plates using a press molding method, it is not limited thereto. Pressurization can be performed using, for example, a roll-to-roll pressing machine, and further can also be performed using a vacuum pressure forming method. [Example]

以下,依據實施例對本發明詳細的進行說明,但是本發明並不限定於此。Hereinafter, the present invention will be described in detail based on examples, but the present invention is not limited thereto.

1.原材料的準備 作為用以製造脫模薄膜之原材料,分別準備了以下材料。 1. Preparation of raw materials The following materials were prepared as raw materials for manufacturing the release film.

•熱塑性樹脂材料 低密度聚乙烯(LDPE,宇部丸善公司製,“R300”) 乙烯乙酸乙烯酯共聚物(EVA,DOW-MITSUI POLYCHEMICALS 公司製,“P1403”) 乙烯乙酸乙烯酯共聚物(EVA,DOW-MITSUI POLYCHEMICALS公司製,“EV360”) 乙烯乙酸乙烯酯共聚物(EVA,DOW-MITSUI POLYCHEMICALS公司製,“V5274”) 乙烯甲基丙烯酸甲酯共聚物(EMMA,住友化學公司製,“WH102”) 乙烯丙烯酸甲酯共聚物(EMA,SK化學公司製,“29MA03”) 乙烯丙烯酸甲酯共聚物(EMA,日本聚乙烯公司製,“EB050S”) 聚對酞酸丁二酯(PBT,長春石油化學公司製,“1100-630S”) 共聚聚對酞酸丁二酯(PBT,三菱工程塑膠公司製,“5505S”) 聚丙烯(PP,住友化學公司製,“FH1016”) 接著性聚烯烴(AD,三菱化學公司製,“F515A”) • Thermoplastic resin material Low-density polyethylene (LDPE, manufactured by Ube Maruzen Co., Ltd., "R300") Ethylene vinyl acetate copolymer (EVA, manufactured by DOW-MITSUI POLYCHEMICALS, "P1403") Ethylene-vinyl acetate copolymer (EVA, manufactured by DOW-MITSUI POLYCHEMICALS, "EV360") Ethylene vinyl acetate copolymer (EVA, manufactured by DOW-MITSUI POLYCHEMICALS, "V5274") Ethylene methyl methacrylate copolymer (EMMA, manufactured by Sumitomo Chemical Co., Ltd., "WH102") Ethylene methyl acrylate copolymer (EMA, manufactured by SK Chemicals, "29MA03") Ethylene methyl acrylate copolymer (EMA, manufactured by Nippon Polyethylene Co., Ltd., "EB050S") Polybutylene terephthalate (PBT, manufactured by Changchun Petrochemical Company, "1100-630S") Copolymerized polybutylene terephthalate (PBT, manufactured by Mitsubishi Engineering Plastics Corporation, "5505S") Polypropylene (PP, manufactured by Sumitomo Chemical Co., Ltd., "FH1016") Adhesive polyolefin (AD, manufactured by Mitsubishi Chemical Corporation, "F515A")

2.脫模薄膜的製造 <實施例1> 首先,作為第1熱塑性樹脂組成物及第2熱塑性樹脂組成物,分別準備了由聚對酞酸丁二酯(PBT、1100-630S)70重量份及共聚聚對酞酸丁二酯(PBT、5505S)30重量份構成之組成物。又,作為第3熱塑性樹脂組成物,準備了由乙烯乙酸乙烯酯共聚物(EVA、EV360)40重量份、乙烯甲基丙烯酸甲酯共聚物(EMMA、WH102)35重量份、聚對酞酸丁二酯(PBT、1100-630S)10重量份及聚丙烯(PP、FH1016)15重量份構成之組成物。 2. Manufacture of release film <Example 1> First, as the first thermoplastic resin composition and the second thermoplastic resin composition, 70 parts by weight of polybutylene terephthalate (PBT, 1100-630S) and copolymerized polybutylene terephthalate (PBT, 5505S) composition consisting of 30 parts by weight. Also, as the third thermoplastic resin composition, 40 parts by weight of ethylene vinyl acetate copolymer (EVA, EV360), 35 parts by weight of ethylene methyl methacrylate copolymer (EMMA, WH102), polybutylene terephthalate A composition consisting of 10 parts by weight of diester (PBT, 1100-630S) and 15 parts by weight of polypropylene (PP, FH1016).

接著,使用第1熱塑性樹脂組成物,藉由擠出T模法成膜,藉此獲得了第1脫模層1。Next, the first release layer 1 was obtained by forming a film by extrusion T-die method using the first thermoplastic resin composition.

接著,對第1脫模層1依序實施使用第3熱塑性樹脂組成物及第2熱塑性樹脂組成物之擠出T模法分別成膜,藉此在第1脫模層1上形成將緩衝層3和第2脫模層2依序積層之積層體,從而獲得了實施例1的脫模薄膜10。Next, the first release layer 1 is sequentially formed into films using the extrusion T-die method using the third thermoplastic resin composition and the second thermoplastic resin composition, thereby forming a buffer layer on the first release layer 1 3 and the second release layer 2 were sequentially laminated to obtain the release film 10 of Example 1.

再者,在所獲得之脫模薄膜10中,第1脫模層1平均厚度T1為15μm,緩衝層3平均厚度Tk為80μm,第2脫模層2平均厚度T2為15μm。In addition, in the obtained release film 10, the average thickness T1 of the 1st release layer 1 was 15 micrometers, the average thickness Tk of the buffer layer 3 was 80 micrometers, and the average thickness T2 of the 2nd release layer 2 was 15 micrometers.

又,對於脫模薄膜10,使用黏彈性測量裝置(安東帕公司製、“產品編號MCR102”),以頻率10Hz、應變0.1%、升溫速度4℃/分鐘分別測量80℃下的複數剪切彈性模數、儲存剪切彈性模數及損失剪切彈性模數,其結果為0.63MPa、0.59MPa及0.21MPa。Also, for the release film 10, the complex shear elasticity at 80°C was measured at a frequency of 10 Hz, a strain of 0.1%, and a heating rate of 4°C/min using a viscoelasticity measuring device (manufactured by Anton Paar, "Product No. MCR102"). Modulus, storage shear modulus and loss shear modulus, the results were 0.63MPa, 0.59MPa and 0.21MPa.

此外,對於第1脫模層1及緩衝層3,使用動態黏彈性測量裝置(日立高科技公司製、“DMA7100”),以拉伸模式、頻率1Hz、升溫速度5℃/分鐘分別測量150℃下的儲存彈性模數E’,其結果為180MPa及16MPa。In addition, for the first mold release layer 1 and the buffer layer 3, each measured at 150° C. using a dynamic viscoelasticity measuring device (“DMA7100” manufactured by Hitachi High-Tech Co., Ltd.) in tension mode, frequency 1 Hz, and heating rate 5° C./min. Under the storage elastic modulus E', the result is 180MPa and 16MPa.

又,對於第1脫模層1,使用表面粗糙度測量裝置(三豐公司製,“SURFTST SJ-210”)測量在與緩衝層3相反的一側露出之表面的10個點平均粗糙度(Rz),其結果為2.7μm。Also, for the first release layer 1, the average roughness of 10 points on the surface exposed on the side opposite to the buffer layer 3 was measured using a surface roughness measuring device (manufactured by Mitutoyo Corporation, "SURFTST SJ-210") ( Rz), the result was 2.7 μm.

<實施例2、比較例1~4> 作為第1熱塑性樹脂組成物、第2熱塑性樹脂組成物及第3熱塑性樹脂組成物,使用表1所示之組成物,形成了平均厚度如表1所示之第1脫模層1、緩衝層3及第2脫模層2,除此以外,以與前述實施例1相同的方式,獲得了脫模薄膜10在80℃下的複數剪切彈性模數成為表1所示之實施例2、比較例1~4的脫模薄膜10。 <Example 2, Comparative Examples 1~4> The compositions shown in Table 1 were used as the first thermoplastic resin composition, the second thermoplastic resin composition, and the third thermoplastic resin composition, and the first mold release layer 1 and buffer layer having the average thicknesses shown in Table 1 were formed. 3 and the second release layer 2, in the same manner as in Example 1 above, the complex shear elastic modulus of the release film 10 at 80°C was obtained as shown in Table 1 in Example 2, Release film 10 of Comparative Examples 1-4.

3.評價 對於各實施例及各比較例的脫模薄膜10,分別進行了以下評價。 3. Evaluation The following evaluations were performed about the mold release film 10 of each Example and each comparative example, respectively.

3-1.脫模薄膜的填埋性 對於各實施例及各比較例的脫模薄膜10,分別設為寬度270mm。又,設為藉由在撓性電路基板210上黏附覆蓋膜220(有澤製造公司製,“CMA0525”)而將該覆蓋膜220所具備之接著劑層222作為撓性電路基板210側而形成之具備間距50μm、寬度50μm、高度18μm的凹凸之FPC200(積層體)之後,在180℃、3MPa、15分鐘的條件下將脫模薄膜10壓入如圖1所示那樣積層2層之FPC200。然後,在設為FPC200與脫模薄膜10的積層體之狀態下,將該積層體在厚度方向上裁斷(剪切)之後,把持脫模薄膜10的一端剝離脫模薄膜10。測量夾持脫模薄膜10的一端將其剝離時的FPC200的凹部的在俯視下的接著劑的最大滲入量,按照以下標準進行了評價。 3-1. Landfill performance of release film The mold release film 10 of each Example and each comparative example was made into width 270 mm, respectively. In addition, it is assumed that a cover film 220 (manufactured by Arisawa Manufacturing Co., Ltd., "CMA0525") is attached to the flexible circuit board 210 so that the adhesive layer 222 included in the cover film 220 is formed on the flexible circuit board 210 side. After FPC200 (laminated body) with pitch 50 μm, width 50 μm, and height 18 μm of unevenness, release film 10 is pressed into FPC200 laminated with 2 layers as shown in FIG. 1 under the conditions of 180°C, 3MPa, and 15 minutes. Then, in the state of the laminate of FPC200 and release film 10 , the laminate is cut (sheared) in the thickness direction, and one end of release film 10 is held to peel off release film 10 . The maximum infiltration amount of the adhesive agent in the concave part of FPC200 in planar view at the time of pinching and peeling off one end of the release film 10 was measured, and evaluated according to the following criteria.

[評價基準] A:最大滲入量未達55mm。 B:最大滲入量為55以上且未達65mm。 C:最大滲入量為65以上。 [evaluation criteria] A: The maximum infiltration amount is less than 55 mm. B: The maximum infiltration amount is 55 or more and less than 65 mm. C: The maximum infiltration amount is 65 or more.

3-2.脫模薄膜的剝離性 對於各實施例及各比較例的脫模薄膜10,分別設為寬度270mm,並且設為藉由在撓性電路基板210上黏附覆蓋膜220(有澤製作公司製,“CMA0525”)而將該覆蓋膜220所具備之接著劑層222作為撓性電路基板210側而形成之具備間距50μm、寬度50μm、高度18μm的凹凸之FPC200(積層體)之後,在180℃、3MPa、15分鐘的條件下將脫模薄膜10壓入如圖1所示那樣積層2層之FPC200。之後,對於夾持脫模薄膜10的一端將其剝離時的脫模薄膜10的剝離容易性(脫模性),按照以下標準進行了評價。 3-2. Peelability of release film The release film 10 of each example and each comparative example was set to have a width of 270 mm, and the cover film 220 (manufactured by Arisawa Manufacturing Co., Ltd., "CMA0525") was adhered to the flexible circuit board 210 to cover the flexible circuit board 210. After forming the adhesive layer 222 of the film 220 as the flexible circuit board 210 side, FPC 200 (laminated body) having irregularities with a pitch of 50 μm, a width of 50 μm, and a height of 18 μm was formed at 180° C., 3 MPa, and 15 minutes. The release film 10 is press-fitted into the FPC 200 laminated with two layers as shown in FIG. 1 . Then, the ease of peeling (release property) of the release film 10 when one end of the release film 10 was pinched and peeled was evaluated according to the following criteria.

[評價基準] A:在剝離脫模薄膜時,能夠剝離。 B:在剝離脫模薄膜時,緩衝層彼此熔接而難以剝離。 [evaluation criteria] A: When peeling off a release film, peeling was possible. B: When the release film was peeled off, the buffer layers were fused together and it was difficult to peel off.

3-3.總結 將前述3-1.脫模薄膜的填埋性及前述3-2.脫模薄膜的脫模性中獲得之評價結果示於表1。 3-3. Summary Table 1 shows the evaluation results obtained in the above-mentioned 3-1. Embedding property of the release film and the above-mentioned 3-2. Release property of the release film.

[表1]   實施例 比較例 1 2 1 2 3 4 脫模薄膜10 第1脫模層1 (第1)熱塑性樹脂組成物 聚對酞酸丁二酯(PBT 1100-630S)[重量%] 70 70 100 70 70 70 共聚聚對酞酸丁二酯(PBT 5505S)[重量%] 30 30   30 30 30 表面10個點平均粗糙度(Rz)(μm) 2.7 2.9 3.5 2.5 2.8 2.5 平均厚度T1(μm) 15 15 15 15 15 15 緩衝層3 (第3)熱塑性樹脂組成物 低密度聚乙烯(LDPE R300)[重量%]     50   35   乙烯乙酸乙烯酯共聚物(EVA P1403)[重量%]     20       乙烯乙酸乙烯酯共聚物(EVA EV360)[重量%] 40         100 乙烯甲基丙烯酸甲酯共聚物(EMMA WH102)[重量%] 35 35         乙烯乙酸乙烯酯共聚物(EVA V5274)[重量%]       45     乙烯丙烯酸甲酯共聚物(EMA 29MA03)[重量%]   40         乙烯丙烯酸甲酯共聚物(EMA EB050S)[重量%]         40   聚對酞酸丁二酯(PBT 1100-630S)[重量%] 10 10 15 15 10   聚丙烯(PP FH1016)[重量%] 15 15   20 15   接著性聚烯烴(AD F515A)[重量%]     15 20     平均厚度Tk(μm) 80 80 80 80 80 80 第1脫模層2 (第2)熱塑性樹脂組成物 聚對酞酸丁二酯(PBT 1100-630S)[重量%] 70 70 100 70 70 70 共聚聚對酞酸丁二酯(PBT 5505S)[重量%] 30 30   30 30 30 平均厚度T2(μm) 15 15 15 15 15 15 脫模薄膜10在80℃下的複數剪切彈性模數(MPa) 0.63 0.60 1.19 1.05 1.06 <0.1 脫模薄膜10在80℃下的儲存剪切彈性模數(MPa) 0.59 0.57 1.09 1.01 1.01 <0.1 脫模薄膜10在80℃下的損失剪切彈性模數(MPa) 0.21 0.19 0.49 0.29 0.33 <0.1 緩衝層3在150℃下的儲存彈性模數E’(MPa) 16 14 16 21 12 <0.1 第1脫模層1在150℃下的儲存彈性模數E’(MPa) 180 180 180 190 180 190 脫模薄膜10的平均厚度Tt(μm) 110 110 110 110 110 110 評價 脫模薄膜10的填埋性 A B C C C A 脫模薄膜10的脫模性 A A A A A B [Table 1] Example comparative example 1 2 1 2 3 4 Release film 10 1st release layer 1 (1st) thermoplastic resin composition Polybutylene terephthalate (PBT 1100-630S)[wt%] 70 70 100 70 70 70 Copolymerized polybutylene terephthalate (PBT 5505S) [wt%] 30 30 30 30 30 Average roughness of 10 points on the surface (Rz) (μm) 2.7 2.9 3.5 2.5 2.8 2.5 Average thickness T1(μm) 15 15 15 15 15 15 buffer layer 3 (3rd) thermoplastic resin composition Low-density polyethylene (LDPE R300) [wt%] 50 35 Ethylene vinyl acetate copolymer (EVA P1403) [wt%] 20 Ethylene vinyl acetate copolymer (EVA EV360) [wt%] 40 100 Ethylene methyl methacrylate copolymer (EMMA WH102) [wt%] 35 35 Ethylene vinyl acetate copolymer (EVA V5274) [wt%] 45 Ethylene methyl acrylate copolymer (EMA 29MA03) [wt%] 40 Ethylene methyl acrylate copolymer (EMA EB050S) [wt%] 40 Polybutylene terephthalate (PBT 1100-630S)[wt%] 10 10 15 15 10 Polypropylene (PP FH1016) [wt%] 15 15 20 15 Adhesive polyolefin (AD F515A) [wt%] 15 20 Average thickness Tk(μm) 80 80 80 80 80 80 1st release layer 2 (2nd) thermoplastic resin composition Polybutylene terephthalate (PBT 1100-630S)[wt%] 70 70 100 70 70 70 Copolymerized polybutylene terephthalate (PBT 5505S) [wt%] 30 30 30 30 30 Average thickness T2(μm) 15 15 15 15 15 15 Complex shear elastic modulus (MPa) of release film 10 at 80°C 0.63 0.60 1.19 1.05 1.06 <0.1 Storage shear elastic modulus (MPa) of release film 10 at 80°C 0.59 0.57 1.09 1.01 1.01 <0.1 Loss shear elastic modulus (MPa) of release film 10 at 80°C 0.21 0.19 0.49 0.29 0.33 <0.1 Storage elastic modulus E'(MPa) of buffer layer 3 at 150°C 16 14 16 twenty one 12 <0.1 Storage elastic modulus E'(MPa) of the first release layer 1 at 150°C 180 180 180 190 180 190 Average thickness Tt (μm) of release film 10 110 110 110 110 110 110 evaluate Embedding properties of release film 10 A B C C C A Release property of release film 10 A A A A A B

如表1所示,示出了如下結果:在各實施例中,脫模薄膜10在80℃下的複數剪切彈性模數設定為1.00MPa以下,其結果,可抑制接著劑滲入凹部223中。As shown in Table 1, the following results are shown. In each example, the complex shear elastic modulus of the release film 10 at 80° C. was set to be 1.00 MPa or less. As a result, penetration of the adhesive into the recess 223 was suppressed. .

相對於此,示出了如下結果:在各比較例中,無法將脫模薄膜10在80℃下的複數剪切彈性模數設定為1.00MPa以下,因此,明顯確認到接著劑滲入凹部223中。 [產業上之可利用性] On the other hand, the following results were shown. In each of the comparative examples, the complex shear modulus of the release film 10 at 80° C. could not be set to 1.00 MPa or less, so the penetration of the adhesive into the concave portion 223 was clearly confirmed. . [Industrial availability]

依據本發明,能夠製成對凹部發揮優異之填埋性之脫模薄膜。因此,在將脫模薄膜用於形成例如使用撓性電路基板及覆蓋膜而成之撓性印刷電路基板之情況下,能夠將具有優異之填埋性之脫模薄膜填埋於形成於撓性印刷電路基板之凹部。因此,在撓性印刷電路基板上形成凹部時,能夠確實地抑制或防止接著劑從覆蓋膜所具備之接著劑層滲入形成之凹部內。因此,本發明具有產業上之可利用性。According to the present invention, it is possible to obtain a release film that exhibits excellent embedding properties in recesses. Therefore, when the release film is used to form, for example, a flexible printed circuit board using a flexible circuit board and a cover film, the release film having excellent embedding properties can be embedded in the flexible printed circuit board formed on the flexible circuit board and the cover film. The concave part of the printed circuit board. Therefore, when the concave portion is formed on the flexible printed circuit board, it is possible to reliably suppress or prevent the adhesive from penetrating into the formed concave portion from the adhesive layer included in the cover film. Therefore, the present invention has industrial applicability.

1:第1脫模層 2:第2脫模層 3:緩衝層 10:脫模薄膜 10A:脫模薄膜 10B:脫模薄膜 200:撓性印刷電路基板(FPC) 210:撓性電路基板 220:覆蓋膜(CL膜) 221:覆蓋層 222:接著劑層 223:凹部 300:玻璃布 300A:玻璃布 300B:玻璃布 521:加熱壓接板 T1:第1脫模層的平均厚度 T2:第2脫模層的平均厚度 Tk:緩衝層的平均厚度 Tt:脫模薄膜的平均厚度 1: The first release layer 2: The second release layer 3: buffer layer 10: Release film 10A: Release film 10B: Release film 200: Flexible Printed Circuit Board (FPC) 210: flexible circuit substrate 220: Covering film (CL film) 221: Overlay 222: Adhesive layer 223: Concave 300: glass cloth 300A: glass cloth 300B: glass cloth 521: Heated crimping plate T1: Average thickness of the first release layer T2: Average thickness of the second release layer Tk: the average thickness of the buffer layer Tt: Average thickness of release film

[圖1]係用以說明在以多層積層之狀態下製造撓性印刷電路基板之製造方法的縱向剖面圖。 [圖2](a)~(c)係表示在以多層積層之狀態下製造撓性印刷電路基板之製造方法中的各步驟之縱向剖面圖。 [圖3]係表示本發明的脫模薄膜的實施形態之縱向剖面圖。 [圖4]係局部放大圖3所示之脫模薄膜的A部而得之局部放大縱向剖面圖。 [FIG. 1] It is a longitudinal cross-sectional view for explaining the manufacturing method of the flexible printed circuit board in the state which manufactures a multilayer. [Fig. 2] (a) to (c) are longitudinal cross-sectional views showing each step in a method of manufacturing a flexible printed circuit board in a multilayered state. [ Fig. 3 ] is a longitudinal sectional view showing an embodiment of the release film of the present invention. [ Fig. 4 ] is a partially enlarged longitudinal sectional view obtained by partially enlarging part A of the release film shown in Fig. 3 .

1:第1脫模層 1: The first release layer

2:第2脫模層 2: The second release layer

3:緩衝層 3: buffer layer

T1:第1脫模層的平均厚度 T1: Average thickness of the first release layer

T2:第2脫模層的平均厚度 T2: Average thickness of the second release layer

Tk:緩衝層的平均厚度 Tk: the average thickness of the buffer layer

Tt:脫模薄膜的平均厚度 Tt: Average thickness of release film

Claims (14)

一種脫模薄膜,其具有由第1熱塑性樹脂組成物構成之第1脫模層及由第3熱塑性樹脂組成物構成之緩衝層,其特徵為, 該脫模薄膜在80℃下的複數剪切彈性模數為1.00MPa以下。 A release film having a first release layer made of a first thermoplastic resin composition and a buffer layer made of a third thermoplastic resin composition, characterized in that, The complex shear elastic modulus at 80° C. of the release film is 1.00 MPa or less. 如請求項1之脫模薄膜,其中, 該緩衝層在150℃下的儲存彈性模數為9.0MPa以上。 Such as the release film of claim 1, wherein, The storage elastic modulus at 150° C. of the buffer layer is 9.0 MPa or more. 如請求項1或2之脫模薄膜,其中, 該脫模薄膜在80℃下的儲存剪切彈性模數為1.00MPa以下。 Such as the release film of claim 1 or 2, wherein, The storage shear elastic modulus at 80° C. of the release film is 1.00 MPa or less. 如請求項1或2之脫模薄膜,其中, 該脫模薄膜在80℃下的損失剪切彈性模數為0.40MPa以下。 Such as the release film of claim 1 or 2, wherein, The loss shear elastic modulus at 80° C. of the release film is 0.40 MPa or less. 如請求項1或2之脫模薄膜,其中, 該第1脫模層中,與該緩衝層相反的一側的表面的10個點平均粗糙度Rz為0.5μm以上且3.6μm以下。 Such as the release film of claim 1 or 2, wherein, In this 1st mold release layer, 10 point average roughness Rz of the surface of the side opposite to this buffer layer is 0.5 micrometer or more and 3.6 micrometers or less. 如請求項1或2之脫模薄膜,其中, 該第1脫模層在150℃下的儲存彈性模數E’為100MPa以上。 Such as the release film of claim 1 or 2, wherein, The storage elastic modulus E' at 150°C of the first release layer is 100 MPa or more. 如請求項1或2之脫模薄膜,其中, 該第1熱塑性樹脂組成物含有聚酯系樹脂作為主材料。 Such as the release film of claim 1 or 2, wherein, The first thermoplastic resin composition contains a polyester resin as a main material. 如請求項1或2之脫模薄膜,其中, 該緩衝層的平均厚度為60μm以上且200μm以下。 Such as the release film of claim 1 or 2, wherein, The buffer layer has an average thickness of not less than 60 μm and not more than 200 μm. 如請求項1或2之脫模薄膜,其中, 該第1脫模層的平均厚度為5μm以上且30μm以下。 Such as the release film of claim 1 or 2, wherein, The average thickness of this 1st mold release layer is 5 micrometers or more and 30 micrometers or less. 如請求項1或2之脫模薄膜,其中, 該第3熱塑性樹脂組成物含有複數種熱塑性樹脂,該熱塑性樹脂的熔點未達80℃。 Such as the release film of claim 1 or 2, wherein, The third thermoplastic resin composition contains a plurality of thermoplastic resins, and the melting point of the thermoplastic resin is less than 80°C. 如請求項10之脫模薄膜,其中, 該第3熱塑性樹脂組成物含有聚酯系樹脂及聚烯烴系樹脂作為該熱塑性樹脂。 Such as the release film of claim 10, wherein, The third thermoplastic resin composition contains a polyester resin and a polyolefin resin as the thermoplastic resin. 如請求項1或2之脫模薄膜,其中, 該脫模薄膜具有在該緩衝層的與該第1脫模層相反的一側積層之由第2熱塑性樹脂組成物構成的第2脫模層。 Such as the release film of claim 1 or 2, wherein, This mold release film has the 2nd mold release layer which consists of a 2nd thermoplastic resin composition laminated|stacked on the side opposite to this 1st mold release layer of this buffer layer. 如請求項1或2之脫模薄膜,其中, 該脫模薄膜用於形成電路。 Such as the release film of claim 1 or 2, wherein, This release film is used to form circuits. 一種成形品之製造方法,其特徵為,包括以請求項1至13中任一項之脫模薄膜的該第1脫模層成為對象物側之方式在該對象物上配置該脫模薄膜之步驟及對配置有該脫模薄膜之該對象物進行加熱壓製之步驟,在配置該脫模薄膜之該步驟中,該對象物的配置有該脫模薄膜之一側的面由含有半固化狀態的熱固性樹脂之材料形成。A method of manufacturing a molded article, comprising disposing the release film on the object in such a manner that the first release layer of the release film according to any one of claims 1 to 13 becomes the object side step and the step of heating and pressing the object on which the release film is arranged, and in the step of arranging the release film, the surface of the object on which the release film is arranged is composed of semi-cured Made of thermosetting resin material.
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