TW202308838A - Solder paste and method for manufacturing electronic device - Google Patents

Solder paste and method for manufacturing electronic device Download PDF

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TW202308838A
TW202308838A TW111121851A TW111121851A TW202308838A TW 202308838 A TW202308838 A TW 202308838A TW 111121851 A TW111121851 A TW 111121851A TW 111121851 A TW111121851 A TW 111121851A TW 202308838 A TW202308838 A TW 202308838A
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solder paste
acid
mentioned
solder
sec
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TW111121851A
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Chinese (zh)
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浅見愛
佐久間陽也
吉田久彦
髙木晶子
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日商千住金屬工業股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24Selection of soldering or welding materials proper
    • B23K35/26Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/36Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
    • B23K35/3601Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with inorganic compounds as principal constituents
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C13/00Alloys based on tin
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Abstract

A solder paste according to the present invention contains a flux composition and a solder powder and is configured such that, with respect to a flux residue that is obtained from this solder paste in accordance with a specific production procedure, if G'100 is the storage elastic modulus thereof at 100 DEG C and G"100 is the loss elastic modulus thereof at 100 DEG C as determined under specific measurement conditions with use of a rheometer, G'100 and G"100 satisfy G'100 > G"100.

Description

焊膏及電子裝置之製造方法Solder paste and manufacturing method of electronic device

本發明係關於一種焊膏及電子裝置之製造方法。The invention relates to a manufacturing method of a solder paste and an electronic device.

至今,對焊膏進行了各種開發。作為此種技術,例如已知專利文獻1中記載之技術。於專利文獻1中,記載有包含軟化點為90℃以下之松香系樹脂之焊膏。 先前技術文獻 專利文獻 Heretofore, various developments have been made on solder pastes. As such a technique, the technique described in patent document 1 is known, for example. Patent Document 1 describes a solder paste containing a rosin-based resin having a softening point of 90° C. or lower. prior art literature patent documents

專利文獻1:日本特開2018-140429公報Patent Document 1: Japanese Patent Application Laid-Open No. 2018-140429

[發明所欲解決之課題][Problem to be Solved by the Invention]

然而,本發明人進行了研究,結果判明:上述專利文獻1中記載之焊膏於高溫遷移之方面有改善之餘地。 [解決課題之技術手段] However, as a result of the inventor's research, it has been found that the solder paste described in Patent Document 1 has room for improvement in terms of high-temperature migration. [Technical means to solve the problem]

近年來,隨著裝置(device)之高輸出化,裝置運轉時之溫度亦達到100℃以上之高溫。 本發明人鑒於上述開發情況進行了研究,結果發現:若對於將焊膏進行回焊處理後殘存之助焊劑殘渣,長時間地施加裝置運轉時產生之高溫之熱歷程,則於助焊劑殘渣中溶出之錫離子等向陰極移動並析出,發生高溫遷移,結果有產生絕緣不良之虞。 基於此種見解進一步進行了潛心研究,結果發現:藉由適當控制焊膏中之助焊劑殘渣之黏彈特性,可抑制高溫遷移,從而完成了本發明。 In recent years, as the output of devices has increased, the temperature during device operation has also reached a high temperature of 100°C or higher. The inventors of the present invention conducted research in view of the above-mentioned development situation, and found that: if the heat history of the high temperature generated during the operation of the device is applied for a long time to the flux residue remaining after the solder paste is reflowed, the flux residue in the flux residue The eluted tin ions move to the cathode and precipitate, and high-temperature migration occurs, which may result in poor insulation. Based on this insight, they conducted further intensive research and found that high-temperature migration can be suppressed by properly controlling the viscoelastic properties of flux residue in solder paste, thereby completing the present invention.

根據本發明, 提供一種焊膏,其包含助焊劑組成物、及焊料粉末,且以下述方式構成: 對於依照下述製作順序自該焊膏獲得之助焊劑殘渣,基於下述測定條件並使用流變儀進行測定,將測得之於100℃之儲存彈性模數設為G' 100、損失彈性模數設為G'' 100時, G' 100及G'' 100滿足G' 100>G'' 100。 <助焊劑殘渣之製作順序> 1.準備底面為45 mm×45 mm、高度為5 mm、厚度為0.3 mm之2個銅製托盤。 2.於上述一銅製托盤之底面上,以其開口與上述另一銅製托盤之開口對向之方式重疊,並用膠帶進行固定,從而準備高度為約10 mm之銅製盒。 3.採集5 g該焊膏作為樣品。將該樣品於上述一銅製托盤之內側之底面上,以被覆底面之80%之面積之方式抹開。 4.對於裝有上述樣品之上述銅製盒,使用回焊爐,於大氣下實施下述溫度分佈A~E之回焊處理。 (溫度分佈A~E) A.以1.9℃/sec之升溫速度自室溫25℃加熱至150℃。 B.於150℃~180℃溫度區域保持80 sec。 C.以1.2℃/sec之升溫速度加熱至220℃。 D.以保持220℃以上40 sec、且峰值溫度為240℃之方式進行加熱。 E.其後冷卻至室溫25℃。 5.回焊處理後,採集殘存於上述一銅製托盤之內側之底面上之助焊劑殘渣。 <測定條件> 測定裝置:流變儀 測定溫度:20℃~180℃ 幾何形狀(上側):25 mmϕ、不鏽鋼製、平行板 平板(下側):60 mmϕ 模式:5℃/min 應變:1% 頻率:10 Hz 間隙:0.2 mm According to the present invention, a solder paste is provided, which includes a flux composition and solder powder, and is constituted as follows: For the flux residue obtained from the solder paste according to the following preparation procedure, based on the following measurement conditions and using flow Measured by a variable instrument, when the measured storage elastic modulus at 100°C is set as G' 100 and the loss elastic modulus is set as G'' 100 , G' 100 and G'' 100 satisfy G' 100 >G'' 100 . <Sequence of making flux residue> 1. Prepare 2 copper trays with a bottom surface of 45 mm x 45 mm, a height of 5 mm, and a thickness of 0.3 mm. 2. On the bottom surface of the above-mentioned one copper tray, overlap the opening with the opening of the above-mentioned another copper tray, and fix it with adhesive tape to prepare a copper box with a height of about 10 mm. 3. Collect 5 g of the solder paste as a sample. Spread the sample on the inner bottom surface of the above-mentioned copper tray to cover 80% of the bottom surface. 4. For the above-mentioned copper box containing the above-mentioned samples, use a reflow furnace to perform the reflow treatment of the following temperature profiles A to E under the atmosphere. (Temperature distribution A-E) A. Heat from room temperature 25°C to 150°C at a rate of 1.9°C/sec. B. Keep it in the temperature range of 150℃~180℃ for 80 sec. C. Heating to 220°C at a heating rate of 1.2°C/sec. D. Heating in such a way as to keep the temperature above 220°C for 40 sec and the peak temperature is 240°C. E. Thereafter cooled to room temperature 25°C. 5. After the reflow process, collect the flux residue remaining on the inner bottom surface of the above-mentioned copper tray. <Measurement conditions> Measuring device: Rheometer Measuring temperature: 20°C to 180°C Geometry (upper side): 25 mmϕ, made of stainless steel, parallel plate Plate (lower side): 60 mmϕ Mode: 5°C/min Strain: 1% Frequency: 10 Hz Gap: 0.2 mm

又,根據本發明, 提供一種電子裝置之製造方法,其包括下述步驟: 將上述焊膏印刷於電子電路基板之焊接部位; 於上述焊接部位構裝電子零件;及 於在上述焊接部位之周圍存在密閉構造之狀態,將上述焊接部位加熱至上述焊膏中之焊料粉末熔融之溫度,而將上述電子零件及上述電子電路基板進行接合之步驟。 [發明之效果] Also, according to the present invention, A method of manufacturing an electronic device is provided, which includes the following steps: Print the above solder paste on the soldering part of the electronic circuit board; Constructing electronic components at the above-mentioned soldering locations; and A step of joining the above-mentioned electronic component and the above-mentioned electronic circuit board by heating the above-mentioned soldered portion to a temperature at which solder powder in the above-mentioned solder paste melts in a state where a sealed structure exists around the above-mentioned soldered portion. [Effect of Invention]

根據本發明,提供一種耐高溫遷移性優異之焊膏、及使用其之電子裝置之製造方法。According to the present invention, there are provided a solder paste excellent in high temperature resistance and mobility, and a method of manufacturing an electronic device using the same.

以下,使用圖式對本發明之實施方式進行說明。再者,於所有圖式中,對相同之構成要素標記相同符號,適當省略說明。又,圖為概略圖,與實際之尺寸比率並不一致。Embodiments of the present invention will be described below using the drawings. In addition, in all drawings, the same code|symbol is attached|subjected to the same component, and description is abbreviate|omitted suitably. In addition, the figure is a schematic view, and the actual size ratio does not match.

對本實施方式之焊膏之概要進行說明。The outline of the solder paste of this embodiment is demonstrated.

本實施方式之焊膏包含助焊劑組成物、及焊料粉末,且以下述方式構成: 對於依照下述製作順序自焊膏獲得之助焊劑殘渣,基於下述測定條件並使用流變儀進行測定,將測得之於100℃之儲存彈性模數設為G' 100、損失彈性模數設為G'' 100時,G' 100及G'' 100滿足G' 100>G'' 100The solder paste of this embodiment includes a flux composition and solder powder, and is configured as follows: For the flux residue obtained from the solder paste according to the following preparation procedure, it is measured using a rheometer based on the following measurement conditions, When the measured storage elastic modulus at 100°C is set as G' 100 and the loss elastic modulus is set as G'' 100 , G' 100 and G'' 100 satisfy G' 100 >G'' 100 .

<助焊劑殘渣之製作順序> 1.準備底面為43~45 mm×43~45 mm、高度為5~7 mm、厚度為0.2~0.4 mm之2個銅製托盤。 2.於一銅製托盤之底面上,以其開口與另一銅製托盤之開口對向之方式重疊,並用膠帶進行固定,從而準備高度為10~14 mm之銅製盒。 3.採集約5 g該焊膏作為樣品。將該樣品於一銅製托盤之內側之底面上,以被覆底面之約80%之面積之方式抹開。 4.對於裝有上述樣品之銅製盒,使用回焊爐(千住金屬工業公司製造,SNR-825),於大氣下實施下述溫度分佈A~E之回焊處理。 (溫度分佈A~E) A.以1.9℃/sec之升溫速度自室溫25℃加熱至150℃。 B.於150℃~180℃溫度區域保持80 sec。 C.以1.2℃/sec之升溫速度加熱至220℃。 D.以保持220℃以上40 sec、且峰值溫度為240℃之方式進行加熱。 E.其後冷卻至室溫25℃。 5.回焊處理後,採集殘存於上述一銅製托盤之內側之底面上之助焊劑殘渣。 <Sequence of making flux residue> 1. Prepare two copper trays with a bottom surface of 43-45 mm×43-45 mm, a height of 5-7 mm, and a thickness of 0.2-0.4 mm. 2. On the bottom surface of a copper tray, overlap the opening with the opening of another copper tray, and fix it with adhesive tape to prepare a copper box with a height of 10-14 mm. 3. Collect about 5 g of the solder paste as a sample. Spread the sample on the inner bottom surface of a copper tray to cover about 80% of the bottom surface. 4. For the copper box containing the above samples, use a reflow furnace (manufactured by Senju Metal Industry Co., Ltd., SNR-825) to perform reflow treatment with the following temperature profiles A to E in the atmosphere. (Temperature distribution A~E) A. Heating from room temperature 25°C to 150°C at a heating rate of 1.9°C/sec. B. Keep it in the temperature range of 150℃~180℃ for 80 sec. C. Heating to 220°C at a heating rate of 1.2°C/sec. D. Heating in such a way as to keep the temperature above 220°C for 40 sec and the peak temperature is 240°C. E. Thereafter cooled to room temperature 25°C. 5. After the reflow process, collect the flux residue remaining on the inner bottom surface of the above-mentioned copper tray.

<測定條件> 測定裝置:流變儀(Malvern Panalytical公司製造,KINEXUS 1b+) 測定溫度:20℃~180℃ 幾何形狀(上側):25 mmϕ、不鏽鋼製、平行板 平板(下側):60 mmϕ 模式:5℃/min 應變:1% 頻率:10 Hz 間隙:0.2 mm <Measurement conditions> Measuring device: Rheometer (manufactured by Malvern Panalytical, KINEXUS 1b+) Measuring temperature: 20℃~180℃ Geometry (upper side): 25 mmϕ, stainless steel, parallel plate Plate (lower side): 60 mmϕ Mode: 5°C/min Strain: 1% Frequency: 10Hz Clearance: 0.2 mm

於近年來之高輸出裝置中,有時發熱零件之周圍之溫度達到100℃以上。通常,100℃以上之發熱零件之周圍之濕度變得低於通常濕度,因此被認為係不易發生離子遷移之環境條件,但本發明人確認到:即便於低濕度環境下,亦有可能於高輸出裝置中發生離子遷移。 然而,由於通常之離子遷移試驗係於溫度85℃、濕度85%之條件下實施,故難言與上述實際情況相對應。 由此,本發明人新發明了於100℃以上之溫度環境下評價金屬離子之遷移之高溫遷移試驗。於高溫遷移試驗中,可採用濕度為20%以下之低濕度環境、或濕度為85%以上之高濕度環境等環境條件。 根據本發明人之見解,發現藉由適當控制焊膏中之助焊劑殘渣之黏彈特性,可抑制高溫遷移。又,亦判明即便於進一步嚴酷之高濕度環境下,亦能夠抑制高溫遷移。 助焊劑殘渣之黏彈特性係藉由對以上述製作順序所獲得之助焊劑殘渣,基於上述測定條件並使用流變儀進行測定,將測得之於100℃之儲存彈性模數設為G' 100、損失彈性模數設為G'' 100,並將該等用作指標,從而可穩定地進行評價。關於此方面,基於助焊劑殘渣之黏彈特性、及使用同樣之助焊劑殘渣所得之高溫遷移試驗之評價結果的關係而得到證實。 並且判明,藉由以助焊劑殘渣之G' 100及G'' 100滿足G' 100>G'' 100之方式構成焊膏,可抑制高溫遷移。 In recent high output devices, the temperature around the heat generating parts sometimes reaches 100°C or higher. Generally, the surrounding humidity of heat-generating parts above 100°C becomes lower than normal humidity, so it is considered to be an environmental condition in which ion migration is difficult to occur, but the inventors have confirmed that even in a low-humidity environment, it is possible to Ion migration occurs in the output device. However, since the usual ion migration test is carried out at a temperature of 85°C and a humidity of 85%, it is difficult to say that it corresponds to the above-mentioned actual situation. Therefore, the present inventors newly invented a high-temperature migration test for evaluating the migration of metal ions in a temperature environment of 100° C. or higher. In the high temperature migration test, environmental conditions such as low humidity environment with humidity below 20% or high humidity environment with humidity above 85% can be used. According to the knowledge of the present inventors, it was found that high temperature migration can be suppressed by properly controlling the viscoelastic properties of the flux residue in the solder paste. In addition, it was also found that high-temperature migration can be suppressed even in a further severe high-humidity environment. The viscoelastic properties of flux residues are measured by using a rheometer based on the above measurement conditions for the flux residues obtained by the above-mentioned production procedures, and the measured storage elastic modulus at 100°C is set as G' 100 and the loss elastic modulus are set to G'' 100 , and these are used as indicators, so that stable evaluation can be performed. This point was confirmed based on the relationship between the viscoelastic properties of the flux residue and the evaluation results of the high-temperature migration test using the same flux residue. Furthermore, it was found that high-temperature migration can be suppressed by constituting the solder paste so that G' 100 and G'' 100 of the flux residue satisfy G' 100 >G'' 100 .

詳細之機制雖不明確,但認為其原因在於:藉由使於100℃之儲存彈性模數大於損失彈性模數,可抑制高溫時之變形,成功獲得低流動性狀態之助焊劑殘渣,因此可抑制錫離子等金屬離子之高溫遷移。Although the detailed mechanism is not clear, it is believed that the reason is that by making the storage elastic modulus at 100°C larger than the loss elastic modulus, the deformation at high temperature can be suppressed, and the flux residue in a low fluidity state can be successfully obtained, so it can be Inhibit the high-temperature migration of metal ions such as tin ions.

於上述助焊劑殘渣之製作順序中,溫度分佈採用上述(溫度分佈A~E),但視需要亦可依照圖3之標準回焊分佈進行設定。溫度分佈中之溫度係指工作溫度。 回焊處理可採用藉由加熱器進行熱風循環之方式。 In the production sequence of the above-mentioned flux residue, the temperature distribution adopts the above (temperature distribution A-E), but it can also be set according to the standard reflow distribution in Figure 3 if necessary. The temperature in the temperature distribution refers to the working temperature. The reflow process can be carried out by means of hot air circulation through the heater.

又,於上述助焊劑殘渣之製作順序中,樣品量只要為約5 g即可,容許4.5~5.5 g。於銅製托盤上抹開之面積可設為約80%,但只要為約60%以上,便可取得能夠採集助焊劑殘渣之量。 再者,銅製托盤亦可彎折厚度0.2~0.4 mm之銅板來製作。 In addition, in the preparation procedure of the above-mentioned flux residue, the sample amount only needs to be about 5 g, and 4.5 to 5.5 g is acceptable. The area to be wiped on the copper tray can be set to about 80%, but as long as it is more than about 60%, the amount that can collect flux residue can be obtained. Furthermore, the copper tray can also be made by bending a copper plate with a thickness of 0.2-0.4 mm.

將根據基於上述測定條件並使用流變儀所測得之於100℃之儲存彈性模數及損失彈性模數而求出之100℃之相位角設為δ 100,將根據於140℃之儲存彈性模數及損失彈性模數而求出之140℃之相位角設為δ 140Set the phase angle at 100°C obtained based on the storage elastic modulus and loss elastic modulus at 100°C measured with a rheometer based on the above measurement conditions as δ 100 , and based on the storage elasticity at 140°C The phase angle at 140°C obtained from the modulus and loss elastic modulus was set to δ 140 .

δ 140之下限例如為1°以上,較佳為2°以上,更佳為3°以上。 另一方面,δ 140之上限例如未達45°,較佳為44°以下,更佳為30°以下。藉此,可提昇於超過100℃之高溫運作環境下之耐高溫遷移性。 The lower limit of δ 140 is, for example, above 1°, preferably above 2°, more preferably above 3°. On the other hand, the upper limit of δ 140 is, for example, less than 45°, preferably not more than 44°, more preferably not more than 30°. In this way, the high temperature migration resistance in the high temperature operating environment exceeding 100°C can be improved.

δ 140及δ 100亦能以滿足0.1≦δ 140100≦3.0之方式構成。 δ 140100之下限例如為0.1以上,較佳為0.15以上,更佳為0.2以上。 另一方面,δ 140100之上限例如為3.0以下,較佳為2.5以下,更佳為2.0以下。 藉由設為上述數值範圍內,可提昇於超過100℃之高溫運作環境下之耐高溫遷移性。 δ 140 and δ 100 can also be configured so that 0.1≦δ 140100 ≦3.0 is satisfied. The lower limit of δ 140100 is, for example, 0.1 or more, preferably 0.15 or more, more preferably 0.2 or more. On the other hand, the upper limit of δ 140100 is, for example, 3.0 or less, preferably 2.5 or less, more preferably 2.0 or less. By setting it within the above numerical range, the high-temperature migration resistance in a high-temperature operating environment exceeding 100° C. can be improved.

使用上述流變儀,測定於25℃之焊膏之黏度,將剪切速率為6 sec -1時之黏度設為η1、剪切速率為1.8 sec -1時之黏度設為η2、剪切速率為18 sec -1時之黏度設為η3。 Use the rheometer above to measure the viscosity of the solder paste at 25°C. Set the viscosity at a shear rate of 6 sec -1 as η1, the viscosity at a shear rate of 1.8 sec -1 as η2, and the shear rate The viscosity at 18 sec -1 is set as η3.

黏度η1之下限例如為5 Pa・s以上,較佳為20 Pa・s以上,更佳為50 Pa・s以上。 另一方面,黏度η1之上限例如為400 Pa・s以下,較佳為300 Pa・s以下,更佳為280 Pa・s以下。 藉由設為上述數值範圍內,可提昇焊膏之印刷特性。 The lower limit of the viscosity η1 is, for example, 5 Pa·s or more, preferably 20 Pa·s or more, more preferably 50 Pa·s or more. On the other hand, the upper limit of the viscosity η1 is, for example, 400 Pa·s or less, preferably 300 Pa·s or less, more preferably 280 Pa·s or less. By setting it as the said numerical value range, the printing characteristic of a solder paste can be improved.

以Log(η2/η3)求出之觸變比之下限例如為0.3以上,較佳為0.4以上,更佳為0.5以上。 另一方面,上述觸變比之上限例如為1.8以下,較佳為1.5以下,更佳為1.0以下。 藉由設為上述數值範圍內,可提昇焊膏之印刷特性。 The lower limit of the thixotropic ratio calculated by Log(η2/η3) is, for example, 0.3 or more, preferably 0.4 or more, more preferably 0.5 or more. On the other hand, the upper limit of the thixotropic ratio is, for example, 1.8 or less, preferably 1.5 or less, more preferably 1.0 or less. By setting it as the said numerical value range, the printing characteristic of a solder paste can be improved.

於本實施方式中,例如藉由適當選擇焊膏中所含之各成分之種類或摻合量、焊膏之製備方法等,可控制上述100℃或140℃之儲存彈性模數、損失彈性模數、相位角、黏度η1及觸變比。該等之中,作為用以使上述100℃或140℃之儲存彈性模數、損失彈性模數、相位角、黏度η1及觸變比為所需之數值範圍之要素,例如可例舉:使用高軟化點之第一松香系樹脂;適當調整高軟化點之第一松香系樹脂之含量;不使用低軟化點之第三松香系樹脂;適當調整溶劑及/或活性劑之含量等。In this embodiment, for example, by appropriately selecting the type or blending amount of each component contained in the solder paste, the preparation method of the solder paste, etc., the above-mentioned storage elastic modulus and loss elastic modulus at 100°C or 140°C can be controlled. Number, phase angle, viscosity η1 and thixotropic ratio. Among them, as the elements for making the storage elastic modulus at 100°C or 140°C, the loss elastic modulus, the phase angle, the viscosity η1, and the thixotropic ratio in the desired numerical range, for example, use The first rosin-based resin with high softening point; properly adjust the content of the first rosin-based resin with high softening point; do not use the third rosin-based resin with low softening point; properly adjust the content of solvent and/or active agent, etc.

本實施方式之焊膏可用於將電子電路基板與電子零件接合,尤其是亦可用於:在由電子電路基板及電子零件所構成之密閉構造之周圍,將電子電路基板及電子零件進行接合。即便於密閉構造中殘存助焊劑殘渣之情形時,亦可抑制高溫遷移。 又,此種焊膏可適用於製造下述裝置,即,在電子電路基板及電子零件之接合部位處,裝置動作時之發熱溫度達到100℃以上之裝置。 The solder paste of the present embodiment can be used for joining an electronic circuit board and electronic parts, and particularly can be used for joining an electronic circuit board and electronic parts around a sealed structure composed of the electronic circuit board and electronic parts. Even when flux residues remain in the sealed structure, high-temperature migration can be suppressed. In addition, this solder paste can be suitably used in the manufacture of devices in which the temperature of heat generated during device operation reaches 100° C. or higher at the junction of an electronic circuit board and an electronic component.

以下,詳述本實施方式之焊膏之構成。Hereinafter, the structure of the solder paste of this embodiment is described in detail.

焊膏包含助焊劑組成物、及焊料粉。The solder paste contains a flux composition and solder powder.

助焊劑組成物可構成為包含選自由活性劑、基底樹脂、觸變劑、及溶劑所組成之群中之一種或兩種以上。The flux composition may contain one or two or more selected from the group consisting of an activator, a base resin, a thixotropic agent, and a solvent.

(活性劑) 助焊劑組成物可包含具有去除金屬氧化物這種特性之活性劑。 藉由包含活性劑,可提高焊料接合製程時之焊料潤濕性。 (active agent) The flux composition may contain an activator having metal oxide removal properties. By including the activator, the solder wettability during the solder joint process can be improved.

作為活性劑之具體例,例如可例舉:有機酸、胺類、鹵素系活性劑、磷系活性劑等。該等可單獨使用,亦可組合2種以上來使用。 該等活性劑之詳細機制雖不明確,但認為原因在於:藉由將金屬氧化物還原,形成與金屬之鹽,可去除焊料及焊接對象之金屬表面之金屬氧化膜。 Specific examples of the activating agent include, for example, organic acids, amines, halogen-based activating agents, phosphorus-based activating agents, and the like. These may be used individually or in combination of 2 or more types. Although the detailed mechanism of these activators is not clear, it is believed that the reason is that by reducing the metal oxide to form a salt with the metal, the metal oxide film on the surface of the solder and the metal to be soldered can be removed.

助焊劑組成物100重量%中,活性劑之含量例如可為0~30重量%,亦可為1~20重量%。 再者,於本說明書中,只要無特別明示,則「~」表示包括上限值及下限值。 In 100% by weight of the flux composition, the content of the activator may be, for example, 0 to 30% by weight, or 1 to 20% by weight. In addition, in this specification, unless otherwise indicated, "-" means that an upper limit and a lower limit are included.

作為有機酸,可例舉:單羧酸、二羧酸、二羧酸之酐、含氧酸等。該等可單獨使用,亦可組合2種以上來使用。As an organic acid, a monocarboxylic acid, a dicarboxylic acid, an anhydride of a dicarboxylic acid, an oxyacid, etc. are mentioned. These may be used individually or in combination of 2 or more types.

作為有機酸之具體例之一例,例如可例舉:戊二酸、己二酸、壬二酸、二十烷二酸、檸檬酸、乙醇酸、琥珀酸、水楊酸、縮二羥乙酸、2,6-吡啶二甲酸、二丁基苯胺縮二羥乙酸、辛二酸、癸二酸、硫代乙醇酸、對苯二甲酸、十二烷二酸、對羥基苯乙酸、2-吡啶甲酸、苯基琥珀酸、鄰苯二甲酸、富馬酸、馬來酸、丙二酸、月桂酸、苯甲酸、酒石酸、異三聚氰酸三(2-羧乙基)酯、甘胺酸、1,3-環己烷二羧酸、2,2-雙(羥甲基)丙酸、2,2-雙(羥甲基)丁酸、2,3-二羥基苯甲酸、2,4-二乙基戊二酸、2-喹啉甲酸、3-羥基苯甲酸、蘋果酸、對大茴香酸、硬脂酸、12-羥基硬脂酸、油酸、亞麻油酸、次亞麻油酸等。Examples of specific examples of organic acids include glutaric acid, adipic acid, azelaic acid, eicosanedioic acid, citric acid, glycolic acid, succinic acid, salicylic acid, diglycolic acid, 2,6-pyridinedicarboxylic acid, dibutylaniline diglycolic acid, suberic acid, sebacic acid, thioglycolic acid, terephthalic acid, dodecanedioic acid, p-hydroxyphenylacetic acid, 2-pyridinecarboxylic acid , phenylsuccinic acid, phthalic acid, fumaric acid, maleic acid, malonic acid, lauric acid, benzoic acid, tartaric acid, tris(2-carboxyethyl) isocyanurate, glycine, 1,3-cyclohexanedicarboxylic acid, 2,2-bis(hydroxymethyl)propionic acid, 2,2-bis(hydroxymethyl)butyric acid, 2,3-dihydroxybenzoic acid, 2,4- Diethylglutaric acid, 2-quinolinic acid, 3-hydroxybenzoic acid, malic acid, p-anisic acid, stearic acid, 12-hydroxystearic acid, oleic acid, linolenic acid, linolenic acid, etc. .

其中,就低殘渣性之觀點而言,有機酸可包含碳數11以下之有機酸。 作為碳數11以下之有機酸,例如可例舉:乙醇酸(碳數2)、硫代乙醇酸(碳數2)、甘胺酸(碳數2)、丙二酸(碳數3)、富馬酸(碳數4)、馬來酸(碳數4)、琥珀酸(碳數4)、縮二羥乙酸(碳數4)、酒石酸(碳數4)、蘋果酸(碳數4)、戊二酸(碳數5)、2,2-雙(羥甲基)丙酸(碳數5)、己二酸(碳數6)、檸檬酸(碳數6)、2-吡啶甲酸(碳數6)、苯甲酸(碳數7)、2,2-雙(羥甲基)丁酸(碳數6)、水楊酸(碳數7)、2,6-吡啶二甲酸(碳數7)、2,3-二羥基苯甲酸(碳數7)、3-羥基苯甲酸(碳數7)、辛二酸(碳數8)、鄰苯二甲酸(碳數8)、間苯二甲酸(碳數8)、對苯二甲酸(碳數8)、對羥基苯乙酸(碳數8)、1,3-環己烷二羧酸(碳數8)、對大茴香酸(碳數8)、壬二酸(碳數9)、2,4-二乙基戊二酸(碳數9)、癸二酸(碳數10)、苯基琥珀酸(碳數10)、2-喹啉甲酸(碳數10)、4-第三丁基苯甲酸(碳數11)等。 Among them, the organic acid may contain organic acids having 11 or less carbon atoms from the viewpoint of low residue property. Examples of organic acids having 11 or less carbon atoms include glycolic acid (2 carbon atoms), thioglycolic acid (2 carbon atoms), glycine (2 carbon atoms), malonic acid (3 carbon atoms), Fumaric acid (4 carbons), maleic acid (4 carbons), succinic acid (4 carbons), glycolic acid (4 carbons), tartaric acid (4 carbons), malic acid (4 carbons) , glutaric acid (carbon number 5), 2,2-bis(hydroxymethyl)propionic acid (carbon number 5), adipic acid (carbon number 6), citric acid (carbon number 6), 2-picolinic acid ( Carbon number 6), benzoic acid (carbon number 7), 2,2-bis(hydroxymethyl)butanoic acid (carbon number 6), salicylic acid (carbon number 7), 2,6-pyridinedicarboxylic acid (carbon number 7), 2,3-dihydroxybenzoic acid (carbon number 7), 3-hydroxybenzoic acid (carbon number 7), suberic acid (carbon number 8), phthalic acid (carbon number 8), isophthalic acid Formic acid (carbon number 8), terephthalic acid (carbon number 8), p-hydroxyphenylacetic acid (carbon number 8), 1,3-cyclohexanedicarboxylic acid (carbon number 8), p-anisic acid (carbon number 8), azelaic acid (9 carbons), 2,4-diethylglutaric acid (9 carbons), sebacic acid (10 carbons), phenylsuccinic acid (10 carbons), 2-quinone Phynoformic acid (10 carbons), 4-tert-butylbenzoic acid (11 carbons), etc.

又,作為有機酸,例如可例舉:二聚酸、三聚酸、於二聚酸中添加氫而得之氫化物即氫化二聚酸、於三聚酸中添加氫而得之氫化物即氫化三聚酸。Further, examples of organic acids include dimer acid, trimer acid, hydrogenated dimer acid obtained by adding hydrogen to dimer acid, and hydrogenated dimer acid obtained by adding hydrogen to trimer acid. Hydrogenated trimer acid.

助焊劑組成物100重量%中,有機酸之含量例如可為0~25重量%,亦可為1~20重量%。藉由設為上述上限值以下,可使助焊劑殘渣之黏彈特性適宜。In 100% by weight of the flux composition, the content of the organic acid may be, for example, 0 to 25% by weight, or 1 to 20% by weight. By setting it as below the said upper limit, the viscoelastic property of a flux residue can be made suitable.

作為胺類,例如可例舉:單乙醇胺、二苯胍、乙基胺、三乙基胺、乙二胺、三乙四胺、2-甲基咪唑、2-十一烷基咪唑、2-十七烷基咪唑、1,2-二甲基咪唑、2-乙基-4-甲基咪唑、2-苯基咪唑、2-苯基-4-甲基咪唑、1-苄基-2-甲基咪唑、1-苄基-2-苯基咪唑、1-氰乙基-2-甲基咪唑、1-氰乙基-2-十一烷基咪唑、1-氰乙基-2-乙基-4-甲基咪唑、1-氰乙基-2-苯基咪唑、1-氰乙基-2-十一烷基咪唑鎓偏苯三酸鹽、1-氰乙基-2-苯基咪唑鎓偏苯三酸鹽、2,4-二胺基-6-[2'-甲基咪唑基-(1')]-乙基對稱三

Figure 111121851-001
、2,4-二胺基-6-[2'-十一烷基咪唑基-(1')]-乙基對稱三
Figure 111121851-001
、2,4-二胺基-6-[2'-乙基-4'-甲基咪唑基-(1')]-乙基對稱三
Figure 111121851-001
、2,4-二胺基-6-[2'-甲基咪唑基-(1')]-乙基對稱三
Figure 111121851-001
異三聚氰酸加成物、2-苯基咪唑異三聚氰酸加成物、2-苯基-4,5-二羥基甲基咪唑、2-苯基-4-甲基-5-羥甲基咪唑、2,3-二氫-1H-吡咯并[1,2-a]苯并咪唑、1-十二烷基-2-甲基-3-苄基咪唑鎓氯化物、2-甲基咪唑啉、2-苯基咪唑啉、2,4-二胺基-6-乙烯基對稱三
Figure 111121851-001
、2,4-二胺基-6-乙烯基對稱三
Figure 111121851-001
異三聚氰酸加成物、2,4-二胺基-6-甲基丙烯醯氧基乙基對稱三
Figure 111121851-001
、環氧咪唑加成物、2-甲基苯并咪唑、2-辛基苯并咪唑、2-戊基苯并咪唑、2-(1-乙基戊基)苯并咪唑、2-壬基苯并咪唑、2-(4-噻唑基)苯并咪唑、苯并咪唑、2-(2'-羥基-5'-甲基苯基)苯并三唑、2-(2'-羥基-3'-第三丁基-5'-甲基苯基)-5-氯苯并三唑、2-(2'-羥基-3',5'-二第三戊基苯基)苯并三唑、2-(2'-羥基-5'-第三辛基苯基)苯并三唑、2,2'-亞甲基雙[6-(2H-苯并三唑-2-基)-4-第三辛基苯酚]、6-(2-苯并三唑基)-4-第三辛基-6'-第三丁基-4'-甲基-2,2'-亞甲基雙酚、1,2,3-苯并三唑、1-[N,N-雙(2-乙基己基)胺基甲基]苯并三唑、羧基苯并三唑、1-[N,N-雙(2-乙基己基)胺基甲基]甲基苯并三唑、2,2'-[[(甲基-1H-苯并三唑-1-基)甲基]亞胺基]雙乙醇、1-(1',2'-二羧基乙基)苯并三唑、1-(2,3-二羧基丙基)苯并三唑、1-[(2-乙基己基胺基)甲基]苯并三唑、2,6-雙[(1H-苯并三唑-1-基)甲基]-4-甲基苯酚、5-甲基苯并三唑、5-苯基四唑等。As the amines, for example, monoethanolamine, diphenylguanidine, ethylamine, triethylamine, ethylenediamine, triethylenetetramine, 2-methylimidazole, 2-undecylimidazole, 2- Heptadecyl imidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2- Methylimidazole, 1-benzyl-2-phenylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-ethyl Base-4-methylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazolium trimellitate, 1-cyanoethyl-2-phenyl Imidazolium trimellitate, 2,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl symmetrical tris
Figure 111121851-001
, 2,4-diamino-6-[2'-undecyl imidazolyl-(1')]-ethyl symmetrical three
Figure 111121851-001
, 2,4-diamino-6-[2'-ethyl-4'-methylimidazolyl-(1')]-ethyl symmetrical three
Figure 111121851-001
, 2,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl symmetrical three
Figure 111121851-001
Isocyanuric acid adduct, 2-phenylimidazole isocyanuric acid adduct, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5- Hydroxymethylimidazole, 2,3-dihydro-1H-pyrrolo[1,2-a]benzimidazole, 1-dodecyl-2-methyl-3-benzylimidazolium chloride, 2- Methylimidazoline, 2-phenylimidazoline, 2,4-diamino-6-vinyl symmetrical tri
Figure 111121851-001
, 2,4-diamino-6-vinyl symmetrical three
Figure 111121851-001
Isocyanuric acid adduct, 2,4-diamino-6-methacryloxyethyl symmetrical tri
Figure 111121851-001
, epoxy imidazole adduct, 2-methylbenzimidazole, 2-octylbenzimidazole, 2-pentylbenzimidazole, 2-(1-ethylpentyl)benzimidazole, 2-nonyl Benzimidazole, 2-(4-thiazolyl)benzimidazole, benzimidazole, 2-(2'-hydroxy-5'-methylphenyl)benzotriazole, 2-(2'-hydroxy-3 '-tert-butyl-5'-methylphenyl)-5-chlorobenzotriazole, 2-(2'-hydroxy-3',5'-di-tert-pentylphenyl)benzotriazole , 2-(2'-hydroxy-5'-tertoctylphenyl)benzotriazole, 2,2'-methylenebis[6-(2H-benzotriazol-2-yl)-4 -tertiary octylphenol], 6-(2-benzotriazolyl)-4-tertiary octyl-6'-tertiary butyl-4'-methyl-2,2'-methylenebis Phenol, 1,2,3-benzotriazole, 1-[N,N-bis(2-ethylhexyl)aminomethyl]benzotriazole, carboxybenzotriazole, 1-[N,N -Bis(2-ethylhexyl)aminomethyl]methylbenzotriazole, 2,2'-[[(methyl-1H-benzotriazol-1-yl)methyl]imino] Diethanol, 1-(1',2'-dicarboxyethyl)benzotriazole, 1-(2,3-dicarboxypropyl)benzotriazole, 1-[(2-ethylhexylamino )methyl]benzotriazole, 2,6-bis[(1H-benzotriazol-1-yl)methyl]-4-methylphenol, 5-methylbenzotriazole, 5-phenyl tetrazole, etc.

助焊劑組成物100重量%中,胺類之含量例如可為0~15重量%,亦可為0.1~10重量%。In 100% by weight of the flux composition, the content of the amines may be, for example, 0 to 15% by weight, or 0.1 to 10% by weight.

作為鹵素系活性劑,可例舉:有機鹵素化合物類或胺氫鹵酸鹽類等。As the halogen-based activator, organic halogen compounds, amine hydrohalides, and the like may, for example, be mentioned.

作為有機鹵素化合物類,例如可例舉:反式-2,3-二溴-1,4-丁二醇、異氰尿酸三烯丙酯六溴化物、1-溴-2-丁醇、1-溴-2-丙醇、3-溴-1-丙醇、3-溴-1,2-丙二醇、1,4-二溴-2-丁醇、1,3-二溴-2-丙醇、2,3-二溴-1-丙醇、2,3-二溴-1,4-丁二醇、2,3-二溴-2-丁烯-1,4-二醇等。 作為其他有機鹵素化合物,例如可例舉:作為有機氯化合物之氯烷烴、氯化脂肪酸酯、氯橋酸、氯橋酸酐等。進而可例舉:作為有機氟化合物之氟系界面活性劑、具有全氟烷基之界面活性劑、聚四氟乙烯等。 Examples of organic halogen compounds include: trans-2,3-dibromo-1,4-butanediol, triallyl isocyanurate hexabromide, 1-bromo-2-butanol, 1 -Bromo-2-propanol, 3-bromo-1-propanol, 3-bromo-1,2-propanediol, 1,4-dibromo-2-butanol, 1,3-dibromo-2-propanol , 2,3-dibromo-1-propanol, 2,3-dibromo-1,4-butanediol, 2,3-dibromo-2-butene-1,4-diol, etc. As other organic halogen compounds, for example, chlorinated alkanes, chlorinated fatty acid esters, chloracids, chloracid anhydrides, etc., which are organochlorine compounds, may, for example, be mentioned. Furthermore, a fluorine-based surfactant which is an organic fluorine compound, a surfactant having a perfluoroalkyl group, polytetrafluoroethylene, and the like may be mentioned.

作為胺氫鹵酸鹽類,例如可例舉將氫碘酸(HI)、氫溴酸(HBr)、氫氯酸(HCl)、氫氟酸(HF)等氫鹵酸、與苯胺、二苯胍、二乙基胺、異丙基胺等胺化合物進行組合所得之鹽。 又,作為胺氫鹵酸鹽類同等物,亦可使用將四氟硼酸(HBF 4)與胺化合物進行組合所得之鹽。 Examples of amine hydrohalides include hydrohalic acids such as hydroiodic acid (HI), hydrobromic acid (HBr), hydrochloric acid (HCl), and hydrofluoric acid (HF), mixed with aniline, diphenyl A salt obtained by combining amine compounds such as guanidine, diethylamine, and isopropylamine. In addition, as the equivalent of amine hydrohalide salts, salts obtained by combining tetrafluoroboric acid (HBF 4 ) and amine compounds can also be used.

作為胺氫鹵酸鹽類之例,可例舉:硬脂胺鹽酸鹽、二乙基苯胺鹽酸鹽、二乙醇胺鹽酸鹽、2-乙基己基胺氫溴酸鹽、吡啶氫溴酸鹽、異丙基胺氫溴酸鹽、環己基胺氫溴酸鹽、二乙基胺氫溴酸鹽、單乙基胺氫溴酸鹽、1,3-二苯胍氫溴酸鹽、二甲基胺氫溴酸鹽、二甲基胺鹽酸鹽、松香胺氫溴酸鹽、2-乙基己基胺鹽酸鹽、異丙基胺鹽酸鹽、環己基胺鹽酸鹽、2-甲基哌啶氫溴酸鹽、1,3-二苯胍鹽酸鹽、二甲基苄胺鹽酸鹽、水合肼氫溴酸鹽、二甲基環己基胺鹽酸鹽、三壬基胺氫溴酸鹽、二乙基苯胺氫溴酸鹽、2-二乙基胺基乙醇氫溴酸鹽、2-二乙基胺基乙醇鹽酸鹽、氯化銨、二烯丙基胺鹽酸鹽、二烯丙基胺氫溴酸鹽、單乙基胺鹽酸鹽、單乙基胺氫溴酸鹽、二乙基胺鹽酸鹽、三乙基胺氫溴酸鹽、三乙基胺鹽酸鹽、單鹽酸肼、二鹽酸肼、單氫溴酸肼、二氫溴酸肼、吡啶鹽酸鹽、苯胺氫溴酸鹽、丁基胺鹽酸鹽、己基胺鹽酸鹽、正辛基胺鹽酸鹽、十二烷基胺鹽酸鹽、二甲基環己基胺氫溴酸鹽、乙二胺二氫溴酸鹽、松香胺氫溴酸鹽、2-苯基咪唑氫溴酸鹽、4-苄基吡啶氫溴酸鹽、L-麩胺酸鹽酸鹽、N-甲基

Figure 111121851-002
啉鹽酸鹽、甜菜鹼鹽酸鹽、2-甲基哌啶氫碘酸鹽、環己基胺氫碘酸鹽、1,3-二苯胍氫氟酸鹽、二乙基胺氫氟酸鹽、2-乙基己基胺氫氟酸鹽、環己基胺氫氟酸鹽、乙基胺氫氟酸鹽、松香胺氫氟酸鹽、環己基胺四氟硼酸鹽、及二環己基胺四氟硼酸鹽等。Examples of amine hydrohalides include: stearylamine hydrochloride, diethylaniline hydrochloride, diethanolamine hydrochloride, 2-ethylhexylamine hydrobromide, pyridine hydrobromide salt, isopropylamine hydrobromide, cyclohexylamine hydrobromide, diethylamine hydrobromide, monoethylamine hydrobromide, 1,3-diphenylguanidine hydrobromide, di Methylamine hydrobromide, dimethylamine hydrobromide, rosinamine hydrobromide, 2-ethylhexylamine hydrochloride, isopropylamine hydrochloride, cyclohexylamine hydrochloride, 2- Methylpiperidine Hydrobromide, 1,3-Diphenylguanidine Hydrochloride, Dimethylbenzylamine Hydrochloride, Hydrazine Hydrate Hydrobromide, Dimethylcyclohexylamine Hydrochloride, Trinonylamine Hydrobromide, Diethylaniline Hydrobromide, 2-Diethylaminoethanol Hydrobromide, 2-Diethylaminoethanol Hydrochloride, Ammonium Chloride, Diallylamine Hydrochloride Salt, Diallylamine Hydrobromide, Monoethylamine Hydrochloride, Monoethylamine Hydrobromide, Diethylamine Hydrochloride, Triethylamine Hydrobromide, Triethylamine Hydrochloride, hydrazine monohydrochloride, hydrazine dihydrochloride, hydrazine monohydrobromide, hydrazine dihydrobromide, pyridine hydrochloride, aniline hydrobromide, butylamine hydrochloride, hexylamine hydrochloride, n-octylamine hydrochloride Ammonium Hydrochloride, Dodecylamine Hydrochloride, Dimethylcyclohexylamine Hydrobromide, Ethylenediamine Dihydrobromide, Rosinamine Hydrobromide, 2-Phenylimidazole Hydrobromide salt, 4-benzylpyridine hydrobromide, L-glutamine hydrochloride, N-methyl
Figure 111121851-002
Phenoline hydrochloride, betaine hydrochloride, 2-methylpiperidine hydroiodide, cyclohexylamine hydroiodide, 1,3-diphenylguanidine hydrofluoride, diethylamine hydrofluoride , 2-Ethylhexylamine Hydrofluoride, Cyclohexylamine Hydrofluoride, Ethylamine Hydrofluoride, Rosinamine Hydrofluoride, Cyclohexylamine Tetrafluoroborate, and Dicyclohexylamine Tetrafluoro Borate etc.

助焊劑組成物100重量%中,鹵素系活性劑之含量例如可為0~10重量%,亦可為0.1~5重量%。 助焊劑組成物100重量%中,有機鹵素化合物類之含量例如可為0~10重量%,亦可為0.1~5重量%。 助焊劑組成物100重量%中,胺氫鹵酸鹽類之含量例如可為0~5重量%,亦可為0.1~3重量%。 In 100% by weight of the flux composition, the content of the halogen-based activator may be, for example, 0 to 10% by weight, or 0.1 to 5% by weight. In 100% by weight of the flux composition, the content of the organic halogen compounds may be, for example, 0 to 10% by weight, or 0.1 to 5% by weight. In 100% by weight of the flux composition, the content of amine hydrohalide salts may be, for example, 0 to 5% by weight, or 0.1 to 3% by weight.

作為磷系活性劑,例如可例舉:膦酸酯、苯基取代次膦酸、磷酸酯類等。As a phosphorus-based active agent, a phosphonate, a phenyl-substituted phosphinic acid, phosphoric acid ester, etc. are mentioned, for example.

作為膦酸酯,例如可例舉:(2-乙基己基)膦酸2-乙基己酯、(正辛基)膦酸正辛酯、(正癸基)膦酸正癸酯、及(正丁基)膦酸正丁酯。 作為苯基取代次膦酸,例如可例舉:苯基次膦酸、及二苯基次膦酸。 As the phosphonate, for example, 2-ethylhexyl (2-ethylhexyl) phosphonate, n-octyl (n-octyl) phosphonate, n-decyl (n-decyl) phosphonate, and ( n-butyl) n-butyl phosphonate. As a phenyl substituted phosphinic acid, a phenyl phosphinic acid and a diphenyl phosphinic acid are mentioned, for example.

助焊劑組成物100重量%中,磷系活性劑之含量例如可為0~10重量%,亦可為0.1~5重量%。In 100% by weight of the flux composition, the content of the phosphorus-based activator may be, for example, 0 to 10% by weight, or 0.1 to 5% by weight.

(基底樹脂) 助焊劑組成物亦可包含基底樹脂。 作為基底樹脂,例如可例舉:松香系樹脂、(甲基)丙烯酸系樹脂、胺酯(urethane)系樹脂、聚酯系樹脂、苯氧樹脂、乙烯醚系樹脂、萜烯樹脂、改質萜烯樹脂(例如芳香族改質萜烯樹脂、氫化萜烯樹脂、氫化芳香族改質萜烯樹脂等)、萜酚樹脂、改質萜酚樹脂(例如氫化萜酚樹脂等)、苯乙烯樹脂、改質苯乙烯樹脂(例如苯乙烯丙烯酸樹脂、苯乙烯馬來酸樹脂等)、二甲苯樹脂、改質二甲苯樹脂(例如酚改質二甲苯樹脂、烷基酚改質二甲苯樹脂、酚改質可溶酚醛型二甲苯樹脂、多元醇改質二甲苯樹脂、聚氧乙烯加成二甲苯樹脂等)等。該等可單獨使用,亦可組合2種以上來使用。 再者,於本說明書中,「(甲基)丙烯酸系樹脂」係指包含甲基丙烯酸系樹脂及丙烯酸系樹脂之概念。 (base resin) The flux composition may also include a base resin. Examples of base resins include rosin-based resins, (meth)acrylic resins, urethane-based resins, polyester-based resins, phenoxy resins, vinyl ether-based resins, terpene resins, and modified terpene resins. olefin resins (such as aromatic modified terpene resins, hydrogenated terpene resins, hydrogenated aromatic modified terpene resins, etc.), terpene phenol resins, modified terpene phenol resins (such as hydrogenated terpene phenol resins, etc.), styrene resins, Modified styrene resin (such as styrene acrylic resin, styrene maleic acid resin, etc.), xylene resin, modified xylene resin (such as phenol modified xylene resin, alkylphenol modified xylene resin, phenol modified Resole phenolic xylene resin, polyol modified xylene resin, polyoxyethylene added xylene resin, etc.), etc. These may be used individually or in combination of 2 or more types. In addition, in this specification, "(meth)acrylic resin" means the concept including a methacrylic resin and an acrylic resin.

該等之中,基底樹脂亦可包含松香系樹脂。 作為松香系樹脂,例如可例舉:脂松香(gum rosin)、木松香、妥爾油松香等原料松香、自原料松香獲得之衍生物。作為衍生物,例如可例舉:純化松香、氫化松香、歧化松香、聚合松香、及α,β-不飽和羧酸改質物(丙烯基化松香)、馬來醯化松香、富馬醯化松香等、以及聚合松香之純化物、氫化物及歧化物、以及α,β-不飽和羧酸改質物之純化物、氫化物、歧化物等。該等松香系樹脂可單獨使用1種,或組合2種以上使用。 Among these, the base resin may contain a rosin-based resin. Examples of the rosin-based resin include raw material rosins such as gum rosin, wood rosin, and tall oil rosin, and derivatives obtained from raw material rosins. Examples of derivatives include: purified rosin, hydrogenated rosin, disproportionated rosin, polymerized rosin, and modified α,β-unsaturated carboxylic acid (acrylized rosin), maleated rosin, and fumalated rosin etc., as well as the purified, hydrogenated and disproportionated products of polymerized rosin, and the purified, hydrogenated and disproportionated products of α, β-unsaturated carboxylic acid modified products. These rosin-based resins may be used alone or in combination of two or more.

助焊劑組成物100重量%中,基底樹脂之含量例如可為0~50重量%,可為10~49重量%,亦可為15~48重量%。藉由將基底樹脂之含量設為上述15重量%以上,可使助焊劑殘渣之黏彈特性適宜。In 100% by weight of the flux composition, the content of the base resin may be, for example, 0 to 50% by weight, 10 to 49% by weight, or 15 to 48% by weight. The viscoelastic property of a flux residue can be made suitable by making content of a base resin into the said 15 weight% or more.

助焊劑組成物較佳為包含軟化點為135℃以上之第一松香系樹脂。第一松香系樹脂之軟化點較佳為138℃以上,更佳為140℃以上。 視需要,助焊劑組成物亦可包含軟化點為120℃以上且未達135℃之第二松香系樹脂。 再者,助焊劑組成物較佳為不含軟化點為90℃以下之第三松香系樹脂。 藉由設為包含第一松香系樹脂、及/或包含第二松香系樹脂或不含第三松香系樹脂之構成,可使助焊劑殘渣之黏彈特性適宜。 再者,軟化點可依據JIS K 2207:1996之軟化點試驗方法(環球法)來測定。 The flux composition preferably includes the first rosin-based resin having a softening point of 135° C. or higher. The softening point of the first rosin-based resin is preferably at least 138°C, more preferably at least 140°C. If necessary, the flux composition may contain a second rosin-based resin having a softening point of not less than 120° C. and less than 135° C. Furthermore, the flux composition preferably does not contain the third rosin-based resin whose softening point is 90° C. or lower. The viscoelastic property of a flux residue can be made suitable by setting it as a structure which contains a 1st rosin-type resin, and/or contains a 2nd rosin-type resin, or does not contain a 3rd rosin-type resin. In addition, the softening point can be measured according to the softening point test method (ring and ball method) of JIS K 2207:1996.

助焊劑組成物100重量%中,第一松香系樹脂之含量例如可為1~50重量%,可為3~30重量%,亦可為5~30重量%。藉由設為上述下限值以上,可使助焊劑殘渣之黏彈特性適宜。藉由設為上述上限值以下,可抑制焊膏之印刷特性下降。 全部松香系樹脂100重量%中,第一松香系樹脂之含量例如可為3~100重量%,可為10~90重量%,亦可為12~80重量%。藉由設為上述下限值以上,可使助焊劑殘渣之黏彈特性適宜。 The content of the first rosin-based resin in 100% by weight of the flux composition may be, for example, 1 to 50% by weight, 3 to 30% by weight, or 5 to 30% by weight. By setting it as more than the said lower limit, the viscoelastic property of a flux residue can be made suitable. By setting it as below the said upper limit, the fall of the printing characteristic of a solder paste can be suppressed. In 100% by weight of all rosin-based resins, the content of the first rosin-based resin may be, for example, 3 to 100% by weight, 10 to 90% by weight, or 12 to 80% by weight. By setting it as more than the said lower limit, the viscoelastic property of a flux residue can be made suitable.

(溶劑) 助焊劑組成物亦可包含溶劑。 溶劑可使用於25℃環境下為固體或液狀之溶劑。該等可單獨使用,亦可組合2種以上使用。 (solvent) The flux composition may also contain solvents. The solvent can be solid or liquid at 25°C. These may be used alone or in combination of two or more.

作為固體溶劑,例如可使用醇系固體溶劑或酚系固體溶劑等。 該等可單獨使用,亦可組合2種以上使用。 As the solid solvent, for example, an alcohol-based solid solvent, a phenol-based solid solvent, or the like can be used. These may be used alone or in combination of two or more.

醇系固體溶劑只要為於分子內具有1個或2個以上之羥基之固體溶劑即可,較佳為具有2個或3個以上之複數個羥基之多元醇系固體溶劑。The alcohol-based solid solvent may be a solid solvent having one or more hydroxyl groups in the molecule, and is preferably a polyol-based solid solvent having two or more hydroxyl groups.

作為多元醇系固體溶劑之具體例,例如可例舉:新戊四醇、三羥甲基丙烷、2,5-二甲基-2,5-己二醇、新戊二醇等。As a specific example of a polyol type solid solvent, neopentyl glycol, trimethylolpropane, 2, 5- dimethyl- 2, 5- hexanediol, neopentyl glycol, etc. are mentioned, for example.

酚系固體溶劑只要為於分子內具有1個或2個以上之酚基之固體溶劑即可,亦可於酚基之苯環上鍵結1或2個以上之羥基。The phenolic solid solvent may be a solid solvent as long as it has one or two or more phenolic groups in the molecule, and one or two or more hydroxyl groups may be bonded to the benzene ring of the phenolic group.

液狀溶劑例如可使用:醇系溶劑、二醇醚系溶劑、松油醇類、烴類、酯類、水等。該等可單獨使用,亦可組合2種以上使用。其中,作為液狀溶劑,亦可使用醇系溶劑及二醇醚系溶劑之至少一者。As the liquid solvent, for example, alcohol solvents, glycol ether solvents, terpineols, hydrocarbons, esters, water and the like can be used. These may be used alone or in combination of two or more. However, at least one of alcohol-based solvents and glycol ether-based solvents may be used as the liquid solvent.

作為醇系溶劑,例如可例舉:異丙醇、1,2-丁二醇、異莰基環己醇、2,4-二乙基-1,5-戊二醇、2,2-二甲基-1,3-丙二醇、2,5-二甲基-2,5-己二醇、2,5-二甲基-3-己炔-2,5-二醇、2,3-二甲基-2,3-丁二醇、1,1,1-三(羥甲基)乙烷、2-乙基-2-羥甲基-1,3-丙二醇、2,2'-氧雙(亞甲基)雙(2-乙基-1,3-丙二醇)、2,2-雙(羥甲基)-1,3-丙二醇、1,2,6-三羥基己烷、雙[2,2,2-三(羥甲基)乙基]醚、1-乙炔基-1-環己醇、1,4-環己二醇、1,4-環己烷二甲醇、赤蘚醇、蘇糖醇、愈創木酚甘油醚(guaiacol glycerol ether)、3,6-二甲基-4-辛炔-3,6-二醇、2,4,7,9-四甲基-5-癸炔-4,7-二醇等。Examples of alcohol-based solvents include isopropanol, 1,2-butanediol, isobornylcyclohexanol, 2,4-diethyl-1,5-pentanediol, 2,2-di Methyl-1,3-propanediol, 2,5-dimethyl-2,5-hexanediol, 2,5-dimethyl-3-hexyne-2,5-diol, 2,3-diol Methyl-2,3-butanediol, 1,1,1-tris(hydroxymethyl)ethane, 2-ethyl-2-hydroxymethyl-1,3-propanediol, 2,2'-oxybis (Methylene)bis(2-ethyl-1,3-propanediol), 2,2-bis(hydroxymethyl)-1,3-propanediol, 1,2,6-trihydroxyhexane, bis[2 ,2,2-tris(hydroxymethyl)ethyl]ether, 1-ethynyl-1-cyclohexanol, 1,4-cyclohexanediol, 1,4-cyclohexanedimethanol, erythritol, Threitol, guaiacol glycerol ether, 3,6-dimethyl-4-octyne-3,6-diol, 2,4,7,9-tetramethyl-5- Decyne-4,7-diol, etc.

作為二醇醚系溶劑,例如可例舉:二乙二醇己醚、二乙二醇單-2-乙基己醚、乙二醇單苯醚、2-甲基戊烷-2,4-二醇、二乙二醇單己醚、二乙二醇二丁醚、三乙二醇單丁醚、四乙二醇單甲醚等。Examples of glycol ether solvents include diethylene glycol hexyl ether, diethylene glycol mono-2-ethylhexyl ether, ethylene glycol monophenyl ether, 2-methylpentane-2,4- Diol, diethylene glycol monohexyl ether, diethylene glycol dibutyl ether, triethylene glycol monobutyl ether, tetraethylene glycol monomethyl ether, etc.

助焊劑組成物100重量%中,溶劑之含量例如為0~65重量%,可為1~50重量%,亦可為5~40重量%。藉由設為上述上限值以下,可使助焊劑殘渣之黏彈特性適宜。 助焊劑組成物100重量%中,液狀溶劑之含量例如為0~65重量%,可為1~50重量%,亦可為5~40重量%。 The content of the solvent in 100% by weight of the flux composition is, for example, 0 to 65% by weight, 1 to 50% by weight, or 5 to 40% by weight. By setting it as below the said upper limit, the viscoelastic property of a flux residue can be made suitable. The content of the liquid solvent in 100% by weight of the flux composition is, for example, 0 to 65% by weight, 1 to 50% by weight, or 5 to 40% by weight.

(觸變劑) 助焊劑組成物亦可包含觸變劑。 作為觸變劑,例如可例舉:蠟系觸變劑、醯胺系觸變劑、山梨醇系觸變劑等。 作為蠟系觸變劑,例如可例舉氫化蓖麻油等。 作為醯胺系觸變劑,可例舉:單醯胺、雙醯胺、聚醯胺。例如可例舉:月桂酸醯胺、棕櫚酸醯胺、硬脂酸醯胺、山萮酸醯胺、羥基硬脂酸醯胺、飽和脂肪酸醯胺、油酸醯胺、芥酸醯胺、不飽和脂肪酸醯胺、對甲苯甲烷醯胺、芳香族醯胺、亞甲基雙硬脂酸醯胺、伸乙基雙月桂酸醯胺、伸乙基雙羥基硬脂酸醯胺、飽和脂肪酸雙醯胺、亞甲基雙油酸醯胺、不飽和脂肪酸雙醯胺、間二甲苯雙硬脂酸醯胺、芳香族雙醯胺、脂肪族聚醯胺(飽和脂肪酸聚醯胺、不飽和脂肪酸聚醯胺)、芳香族聚醯胺、經取代之醯胺、羥甲基硬脂酸醯胺、羥甲基醯胺、脂肪酸酯醯胺、環狀醯胺低聚物、非環狀醯胺低聚物等。 (thixotropic agent) The flux composition may also contain a thixotropic agent. As a thixotropic agent, a wax type thixotropic agent, an amide type thixotropic agent, a sorbitol type thixotropic agent, etc. are mentioned, for example. As a wax-type thixotropic agent, hydrogenated castor oil etc. are mentioned, for example. The amide-based thixotropic agent may, for example, be monoamide, bisamide or polyamide. For example, lauric acid amide, palmitic acid amide, stearic acid amide, behenyl amide, hydroxystearic acid amide, saturated fatty acid amide, oleic acid amide, erucamide, Saturated fatty acid amide, p-toluene amide, aromatic amide, methylenebisstearamide, ethylenylbislauric acid amide, ethylenylbishydroxystearamide, saturated fatty acid bisamide Amine, methylenebisoleic acid amide, unsaturated fatty acid bisamide, m-xylene bisstearyl amide, aromatic bisamide, aliphatic polyamide (saturated fatty acid polyamide, unsaturated fatty acid polyamide amide), aromatic polyamide, substituted amide, hydroxymethylstearamide, hydroxymethylamide, fatty acid ester amide, cyclic amide oligomer, acyclic amide oligomers etc.

助焊劑組成物100重量%中,觸變劑之含量例如可為0~20重量%,亦可為1~15重量%。In 100% by weight of the flux composition, the content of the thixotropic agent may be, for example, 0 to 20% by weight, or 1 to 15% by weight.

(添加劑) 只要無損本發明之效果,則助焊劑組成物亦可包含助焊劑中通常所添加之添加劑。 作為添加劑,例如可例舉:抗氧化劑、防銹劑、消泡劑、消光劑、界面活性劑、著色劑等。該等可單獨使用,亦可組合2種以上使用。 例如,作為抗氧化劑,可例舉:受阻酚系抗氧化劑、磷系抗氧化劑等。 (additive) As long as the effects of the present invention are not impaired, the flux composition may also contain additives usually added to fluxes. As an additive, an antioxidant, an antirust agent, an antifoaming agent, a matting agent, a surfactant, a coloring agent, etc. are mentioned, for example. These may be used alone or in combination of two or more. For example, as an antioxidant, a hindered phenolic antioxidant, a phosphorus antioxidant, etc. are mentioned.

焊料粉末可由以下成分構成:Sn單質;或Sn-Ag系、Sn-Cu系、Sn-Ag-Cu系、Sn-Bi系、Sn-In系等;或者於該等合金中添加Pb、Sb、Bi、In、Cu、Zn、As、Ag、Cd、Fe、Ni、Co、Au、Ge、P等所得之焊料粉體。Solder powder can be composed of the following components: Sn simple substance; or Sn-Ag system, Sn-Cu system, Sn-Ag-Cu system, Sn-Bi system, Sn-In system, etc.; or add Pb, Sb, Solder powder obtained from Bi, In, Cu, Zn, As, Ag, Cd, Fe, Ni, Co, Au, Ge, P, etc.

焊料粉末可具有依據JIS Z 3284:2014並藉由粒度分佈測定試驗所測得之特定之粒度分佈。 焊料粉末例如可構成為:粒徑在2~150 μm之範圍之粉末的質量分率達到80%以上,較佳為粒徑在5~75 μm之範圍之粉末的質量分率達到80%以上,更佳為粒徑在5~45 μm之範圍之粉末的質量分率達到80%以上。 The solder powder may have a specific particle size distribution measured by a particle size distribution test according to JIS Z 3284:2014. The solder powder can be composed, for example, such that the mass fraction of powder with a particle size in the range of 2 to 150 μm reaches 80% or more, preferably more than 80% of the powder with a particle size in the range of 5 to 75 μm, More preferably, the mass fraction of the powder with a particle size in the range of 5-45 μm is more than 80%.

依據JIS Z 3284:2017並藉由粒度分佈測定試驗,焊料粉末可根據粒度分佈而分類為1型~8型。 於本實施方式中,其中較佳為2型~7型之焊料粉末,更佳為3型~6型之焊料粉末。 3型焊料粉末中,粒徑在25~45 μm之範圍之粉末的質量分率滿足80%以上。 4型焊料粉末中,粒徑在20~38 μm之範圍之粉末的質量分率滿足80%以上。 5型焊料粉末中,粒徑在15~25 μm之範圍之粉末的質量分率滿足80%以上。 6型焊料粉末中,粒徑在5~15 μm之範圍之粉末的質量分率滿足80%以上。 According to JIS Z 3284:2017 and through the particle size distribution measurement test, solder powder can be classified into types 1 to 8 according to the particle size distribution. In this embodiment, among them, solder powders of types 2 to 7 are preferable, and solder powders of types 3 to 6 are more preferable. In type 3 solder powder, the mass fraction of powder with a particle size in the range of 25 to 45 μm satisfies 80% or more. In type 4 solder powder, the mass fraction of powder with a particle size in the range of 20 to 38 μm satisfies 80% or more. In the type 5 solder powder, the mass fraction of the powder with a particle size in the range of 15-25 μm shall satisfy 80% or more. In Type 6 solder powder, the mass fraction of powder with a particle size in the range of 5 to 15 μm should be at least 80%.

包含焊料粉末及助焊劑組成物之焊膏100重量%中,助焊劑組成物之含量例如為7~30重量%,較佳為8~25重量%,更佳為10~20重量%。The content of the flux composition is, for example, 7-30% by weight, preferably 8-25% by weight, and more preferably 10-20% by weight in 100% by weight of the solder paste including solder powder and the flux composition.

助焊劑組成物及焊膏之製造方法並無限定,可藉由將原料同時或依序地利用任意之方法進行混合來製造。The manufacturing method of a flux composition and a solder paste is not limited, It can manufacture by mixing raw materials simultaneously or sequentially by arbitrary methods.

助焊劑組成物之製造只要最終將助焊劑組成物之全部成分加以混合即可,可於溶劑中依序混合其他成分,可將混合有其他成分者添加至溶劑中,亦可將溶劑及其他全部成分同時進行混合。 又,焊膏之製造無需預先製備助焊劑組成物,再將其與焊料粉末進行混合,只要最終將助焊劑組成物之全部成分、焊料粉末及視需要添加至焊膏中之添加劑加以混合即可,而不論混合之順序如何,亦可將助焊劑組成物之成分之一部分與焊料粉末進行混合後,添加助焊劑組成物之其餘成分等。 The manufacture of the flux composition only needs to finally mix all the components of the flux composition. Other components can be mixed in the solvent in order, and the mixed components can be added to the solvent, or the solvent and all other components can be mixed. The ingredients are mixed simultaneously. In addition, the manufacture of solder paste does not need to prepare the flux composition in advance, and then mix it with the solder powder, as long as all the components of the flux composition, solder powder and additives added to the solder paste are mixed at last. , regardless of the order of mixing, it is also possible to mix a part of the components of the flux composition with the solder powder, and then add the rest of the components of the flux composition.

關於本實施方式之焊膏,作為一例,可用於半導體裝置等電子裝置之製造方法。 電子裝置之製造方法可包括:將上述焊膏塗佈於電極之步驟;例如對引線框架或印刷配線基板等基板及半導體元件進行加熱處理,經由熔融之焊料將該等進行接合之步驟。 About the solder paste of this embodiment, it can be used for the manufacturing method of electronic devices, such as a semiconductor device, as an example. The manufacturing method of an electronic device may include: a step of applying the above-mentioned solder paste to electrodes; for example, a step of heat-treating substrates such as lead frames or printed wiring boards and semiconductor elements, and joining them with molten solder.

電子裝置之製造方法之一例亦可包括:將上述焊膏印刷於電子電路基板之焊接部位之步驟;於焊接部位構裝電子零件之步驟;及於在焊接部位之周圍存在密閉構造之狀態下,將焊接部位加熱至焊膏中之焊料粉末熔融之溫度,從而將電子零件及電子電路基板進行接合之步驟。 電子零件可使用功率半導體等高輸出裝置。 An example of the method of manufacturing an electronic device may include: a step of printing the above-mentioned solder paste on the soldered part of the electronic circuit board; a step of assembling electronic parts on the soldered part; Heating the soldering part to the temperature at which the solder powder in the solder paste melts, so as to join the electronic parts and the electronic circuit board. Electronic components can use high output devices such as power semiconductors.

作為焊膏之印刷方法,可例舉:網版印刷、膜印刷等,亦可使用除噴射點膠(jet dispense)以外之方法來印刷。As a printing method of solder paste, screen printing, film printing, etc. are mentioned, and printing by the method other than jet dispensing (jet dispense) is also possible.

以上,對本發明之實施方式進行了說明,但該等為本發明之例示,可採用除上述以外之各種構成。又,本發明並不限於上述實施方式,在可達成本發明之目的之範圍內之變化、改良等均包含於本發明。 以下,附記參考形態之例。 1.一種焊膏,其包含助焊劑組成物、及焊料粉末,且以下述方式構成: 對於依照下述製作順序自該焊膏獲得之助焊劑殘渣,基於下述測定條件並使用流變儀進行測定,將測得之於100℃之儲存彈性模數設為G' 100、損失彈性模數設為G'' 100時, G' 100及G'' 100滿足G' 100>G'' 100。 <助焊劑殘渣之製作順序> 1.準備底面為45 mm×45 mm、高度為5 mm、厚度為0.3 mm之2個銅製托盤。 2.於上述一銅製托盤之底面上,以其開口與上述另一銅製托盤之開口對向之方式重疊,並用膠帶進行固定,從而準備高度為約10 mm之銅製盒。 3.採集5 g該焊膏作為樣品。將該樣品於上述一銅製托盤之內側之底面上,以被覆上述底面之80%之面積之方式抹開。 4.對於裝有上述樣品之上述銅製盒,使用回焊爐,於大氣下實施下述溫度分佈A~E之回焊處理。 (溫度分佈A~E) A.以1.9℃/sec之升溫速度自室溫25℃加熱至150℃。 B.於150℃~180℃溫度區域保持80 sec。 C.以1.2℃/sec之升溫速度加熱至220℃。 D.以保持220℃以上40 sec、且峰值溫度為240℃之方式進行加熱。 E.其後冷卻至室溫25℃。 5.回焊處理後,採集殘存於上述一銅製托盤之內側之底面上之助焊劑殘渣。 <測定條件> 測定裝置:流變儀 測定溫度:20℃~180℃ 幾何形狀(上側):25 mmϕ、不鏽鋼製、平行板 平板(下側):60 mmϕ 模式:5℃/min 應變:1% 頻率:10 Hz 間隙:0.2 mm 2.如1.記載之焊膏,其中, 將根據基於上述測定條件並使用流變儀所測得之於140℃之儲存彈性模數及損失彈性模數而求出之140℃之相位角設為δ 140時,δ 140為1°以上且未達45°。 3.如2.記載之焊膏,其以下述方式構成: 將根據基於上述測定條件並使用流變儀所測得之於100℃之儲存彈性模數及損失彈性模數而求出之100℃之相位角設為δ 100時,δ 140及δ 100滿足0.1≦δ 140100≦3.0。 4.如1.至3.中任一項記載之焊膏,其中, 上述助焊劑組成物包含軟化點為135℃以上之松香系樹脂。 5.如1.至4.中任一項記載之焊膏,其中, 於該焊膏之100重量%中,上述助焊劑組成物之含量為7重量%以上且20重量%以下。 6.如1.至5.中任一項記載之焊膏,其中, 使用上述流變儀,於剪切速率:6 sec -1、25℃之條件進行測定時之黏度η1為5 Pa・s以上且400 Pa・s以下。 7.如1.至6.中任一項記載之焊膏,其中, 使用上述流變儀測定於25℃之該焊膏之黏度,將剪切速率為1.8 sec -1時之黏度設為η2、剪切速率為18 sec -1時之黏度設為η3時,以Log(η2/η3)求出之觸變比為0.3以上且1.8以下。 8.如1.至7.中任一項記載之焊膏,其用於: 在由電子電路基板及電子零件所構成之密閉構造之周圍將電子電路基板及電子零件進行接合。 9.如1.至8.中任一項記載之焊膏,其中, 上述助焊劑組成物包含選自由活性劑、基底樹脂、觸變劑、及溶劑所組成之群中之一種或兩種以上。 10.如9.記載之焊膏,其中, 上述活性劑包含選自由有機酸、胺類、鹵素系活性劑、及磷系活性劑所組成之群中之一種或兩種以上。 11.如1.至10.中任一項記載之焊膏,其中, 上述焊料粉末之粒徑在2~150 μm之範圍之粉末的質量分率為80%以上。 12.一種電子裝置之製造方法,其包括下述步驟: 將1.至11.中任一項記載之焊膏印刷於電子電路基板之焊接部位; 於上述焊接部位構裝電子零件;及 於在上述焊接部位之周圍存在密閉構造之狀態,將上述焊接部位加熱至上述焊膏中之焊料粉末熔融之溫度,而將上述電子零件及上述電子電路基板進行接合。 [實施例] As mentioned above, although embodiment of this invention was described, these are illustrations of this invention, and various structures other than the above-mentioned can be employ|adopted. In addition, the present invention is not limited to the above-described embodiments, and changes, improvements, and the like within the scope of attaining the object of the present invention are included in the present invention. Below, an example of the reference form is appended. 1. A solder paste, which comprises a flux composition and solder powder, and is constituted in the following manner: For the flux residue obtained from the solder paste according to the following production procedure, it is measured based on the following measurement conditions and using a rheometer For measurement, when the measured storage elastic modulus at 100°C is set as G' 100 and the loss elastic modulus is set as G'' 100 , G' 100 and G'' 100 satisfy G' 100 >G'' 100 . <Sequence of making flux residue> 1. Prepare 2 copper trays with a bottom surface of 45 mm x 45 mm, a height of 5 mm, and a thickness of 0.3 mm. 2. On the bottom surface of the above-mentioned one copper tray, overlap the opening with the opening of the above-mentioned another copper tray, and fix it with adhesive tape to prepare a copper box with a height of about 10 mm. 3. Collect 5 g of the solder paste as a sample. Spread the sample on the inner bottom surface of the aforementioned copper tray to cover 80% of the bottom surface. 4. For the above-mentioned copper box containing the above-mentioned samples, use a reflow furnace to perform the reflow treatment of the following temperature profiles A to E under the atmosphere. (Temperature distribution A-E) A. Heat from room temperature 25°C to 150°C at a rate of 1.9°C/sec. B. Keep it in the temperature range of 150℃~180℃ for 80 sec. C. Heating to 220°C at a heating rate of 1.2°C/sec. D. Heating in such a way as to keep the temperature above 220°C for 40 sec and the peak temperature is 240°C. E. Thereafter cooled to room temperature 25°C. 5. After the reflow process, collect the flux residue remaining on the inner bottom surface of the above-mentioned copper tray. <Measurement conditions> Measuring device: Rheometer Measuring temperature: 20°C to 180°C Geometry (upper side): 25 mmϕ, made of stainless steel, parallel plate Plate (lower side): 60 mmϕ Mode: 5°C/min Strain: 1% Frequency: 10 Hz Gap: 0.2 mm 2. For the solder paste as described in 1., it will be calculated based on the storage elastic modulus and loss elastic modulus measured at 140°C based on the above measurement conditions and using a rheometer When the phase angle at 140°C is set to δ 140 , δ 140 is more than 1° and less than 45°. 3. The solder paste as described in 2. is constituted in the following way: The storage elastic modulus and loss elastic modulus at 100 °C measured based on the above measurement conditions and using a rheometer are calculated at 100 °C When the phase angle is δ 100 , δ 140 and δ 100 satisfy 0.1≦δ 140100 ≦3.0. 4. The solder paste according to any one of 1. to 3., wherein the flux composition contains a rosin-based resin having a softening point of 135° C. or higher. 5. The solder paste according to any one of 1. to 4., wherein the content of the flux composition is 7% by weight or more and 20% by weight or less in 100% by weight of the solder paste. 6. The solder paste according to any one of 1. to 5., wherein the viscosity η1 when measured using the above-mentioned rheometer at a shear rate of 6 sec -1 and 25°C is 5 Pa·s Above and below 400 Pa・s. 7. The solder paste according to any one of 1. to 6., wherein the viscosity of the solder paste at 25° C. is measured using the above-mentioned rheometer, and the viscosity at a shear rate of 1.8 sec -1 is defined as η2 , When the viscosity at a shear rate of 18 sec -1 is set to η3, the thixotropic ratio calculated by Log (η2/η3) is not less than 0.3 and not more than 1.8. 8. The solder paste according to any one of 1. to 7., which is used for bonding an electronic circuit board and electronic parts around a sealed structure composed of the electronic circuit board and electronic parts. 9. The solder paste according to any one of 1. to 8., wherein the flux composition includes one or two or more selected from the group consisting of activators, base resins, thixotropic agents, and solvents . 10. The solder paste according to 9., wherein the activating agent contains one or two or more selected from the group consisting of organic acids, amines, halogen-based activating agents, and phosphorus-based activating agents. 11. The solder paste according to any one of 1. to 10., wherein the mass fraction of the solder powder having a particle diameter in the range of 2 to 150 μm is 80% or more. 12. A method of manufacturing an electronic device, comprising the following steps: printing the solder paste described in any one of 1. to 11. on the soldering part of the electronic circuit board; constructing electronic components on the above-mentioned soldering part; There is a sealed structure around the soldered portion, and the soldered portion is heated to a temperature at which solder powder in the solder paste melts to join the electronic component and the electronic circuit board. [Example]

以下,參照實施例對本發明詳細地進行說明,但本發明並不受該等實施例之記載之任何限定。Hereinafter, the present invention will be described in detail with reference to examples, but the present invention is not limited by the description of these examples.

以下,顯示表1中之原料成分之資訊。 (基底樹脂) ・松香系樹脂1:丙烯酸改質氫化松香(軟化點:131℃,荒川化學工業公司製造,KE-604) ・松香系樹脂2:氫化松香(軟化點:74℃,EASTMAN CHEMICAL公司製造,FORAL AX-E) ・松香系樹脂3:聚合松香(軟化點:141℃,荒川化學工業公司製造,KR-140) 再者,松香系樹脂之軟化點係依據JIS K 2207:1996之軟化點試驗方法(環球法)進行測定,設為2次測定值之平均值(將小數點第一位之值四捨五入)。 ・丙烯酸系樹脂1:丙烯酸樹脂 (活性劑) ・有機酸1:二聚酸 ・有機酸2:己二酸 ・有機酸3:壬二酸 ・胺類1:2-苯基-4-甲基咪唑(簡稱:2P4MZ) ・胺氫鹵酸鹽類1:二苯胍氫溴酸鹽 ・有機鹵素化合物1:2,3-二溴-2-丁烯-1,4-二醇 (溶劑) ・溶劑1:二醇醚系溶劑(二乙二醇單己醚) (觸變劑) ・觸變劑1:聚醯胺 (添加劑) ・抗氧化劑1:受阻酚系抗氧化劑 (焊料粉末) ・焊料粉末1:焊料粉末(SEC305:Sn-3.0Ag-0.5Cu,4型,千住金屬工業公司製造) Information on the raw material components in Table 1 is shown below. (base resin) ・Rosin-based resin 1: Acrylic modified hydrogenated rosin (softening point: 131°C, manufactured by Arakawa Chemical Industry Co., Ltd., KE-604) ・Rosin-based resin 2: Hydrogenated rosin (softening point: 74°C, manufactured by EASTMAN CHEMICAL, FORAL AX-E) ・Rosin-based resin 3: polymerized rosin (softening point: 141°C, manufactured by Arakawa Chemical Industry Co., Ltd., KR-140) Furthermore, the softening point of rosin-based resins is measured in accordance with the softening point test method (ring and ball method) of JIS K 2207:1996, and is set as the average value of the two measured values (the first decimal place is rounded off). ・Acrylic resin 1: Acrylic resin (active agent) ・Organic acid 1: dimer acid ・Organic acid 2: Adipic acid ・Organic acid 3: Azelaic acid ・Amines 1: 2-phenyl-4-methylimidazole (abbreviation: 2P4MZ) ・Amine hydrohalides 1: Diphenylguanidine hydrobromide ・Organohalogen compound 1: 2,3-dibromo-2-butene-1,4-diol (solvent) ・Solvent 1: Glycol ether solvent (diethylene glycol monohexyl ether) (thixotropic agent) ・Thixotropic agent 1: Polyamide (additive) ・Antioxidant 1: Hindered phenolic antioxidant (solder powder) ・Solder powder 1: Solder powder (SEC305: Sn-3.0Ag-0.5Cu, type 4, manufactured by Senju Metal Industry Co., Ltd.)

<焊膏之製備> 按下述表1所示之摻合比率將原料成分進行混合,藉此獲得助焊劑組成物。 其後,將所獲得之助焊劑組成物11.5重量%及焊料粉末88.5重量%進行混合,獲得焊膏。 <Preparation of solder paste> The raw material components were mixed in the blending ratio shown in Table 1 below to obtain a flux composition. Thereafter, 11.5% by weight of the obtained flux composition and 88.5% by weight of the solder powder were mixed to obtain a solder paste.

[表1]       單位 實施例1 實施例2 實施例3 實施例4 實施例5 實施例6 實施例7 實施例8 實施例9 比較例1 比較例2 比較例3 比較例4 焊膏    助焊劑組成物 基底樹脂 松香系樹脂1 質量% 33.0 34.6 35.0 33.5 34.5 33.3 33.0 33.0 37.6 20.0 20.0 19.6    松香系樹脂2                            7.0       30.0 松香系樹脂3 7.0 10.0 5.0 7.0 7.0 7.0 7.0 7.0 10.0       25.0 5.0 丙烯酸系樹脂1                         5.0             活性劑 有機酸1    8.0             8.0       8.0 8.0 8.0 8.0 有機酸2 2.0 1.0 2.0 2.0 2.0 2.0 2.0 2.0 1.0 2.0 2.0 5.0 2.0 有機酸3 8.0 3.5 8.0 8.0 8.0 8.0 10.0 8.0 3.5 8.0 8.0 17.0 8.0 胺類1          0.5                            胺氫鹵酸鹽類1                0.2                      有機鹵素化合物1             1.5                         溶劑 溶劑1 39.7 36.7 39.7 38.7 36.7 39.2 29.7 37.7 36.7 44.9 51.9 21.4 36.9 觸變劑 觸變劑1 10.3 6.2 10.3 10.3 10.3 10.3 10.3 10.3 6.2 10.1 10.1 4.0 10.1 添加劑 抗氧化劑1                      2.0                合計 100 100 100 100 100 100 100 100 100 100 100 100 100 焊料粉末 焊料粉末1 焊膏中之含量 (質量%) 85 85 85 85 85 85 85 85 85 85 85 85 85 儲存彈性模數G' 100、損失彈性模數G'' 1 00(100℃)之大小關係    G' 100>G'' 100 G' 100>G'' 100 G' 100>G'' 100 G' 100>G'' 100 G' 100>G'' 100 G' 100>G'' 100 G' 100>G'' 100 G' 100>G'' 100 G' 100>G'' 100 G' 100<G'' 100 G' 100<G'' 100 G' 100<G'' 100 G' 100<G'' 100 相位角δ 1 00(100℃) ° 32.49 25.99 11.87 30.16 18.41 13.32 11.19 12.9 28.61 58.90 47.90 56.80 52.90 相位角δ 14 0(140℃) ° 13.82 27.79 14.13 6.49 43.83 25.54 19.55 12.92 4.99 50.14 47.19 84.42 52.90 膏黏度η1 Pa·s 173.9 108 154 68 284 180 42 208 84 64 88 159 111 觸變比Log(η2/η3)    0.87 0.89 0.76 0.95 1.00 1.03 1.11 0.70 0.81 1.21 0.86 1.22 1.11 高溫遷移試驗    [Table 1] unit Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Example 7 Example 8 Example 9 Comparative example 1 Comparative example 2 Comparative example 3 Comparative example 4 solder paste Flux composition base resin Rosin-based resin 1 quality% 33.0 34.6 35.0 33.5 34.5 33.3 33.0 33.0 37.6 20.0 20.0 19.6 Rosin-based resin 2 7.0 30.0 Rosin-based resin 3 7.0 10.0 5.0 7.0 7.0 7.0 7.0 7.0 10.0 25.0 5.0 Acrylic resin 1 5.0 active agent Organic acid 1 8.0 8.0 8.0 8.0 8.0 8.0 Organic acid 2 2.0 1.0 2.0 2.0 2.0 2.0 2.0 2.0 1.0 2.0 2.0 5.0 2.0 Organic acid 3 8.0 3.5 8.0 8.0 8.0 8.0 10.0 8.0 3.5 8.0 8.0 17.0 8.0 Amines 1 0.5 Amine Hydrohalides 1 0.2 Organohalogen compound 1 1.5 solvent Solvent 1 39.7 36.7 39.7 38.7 36.7 39.2 29.7 37.7 36.7 44.9 51.9 21.4 36.9 Thixotropic agent Thixotropic agent 1 10.3 6.2 10.3 10.3 10.3 10.3 10.3 10.3 6.2 10.1 10.1 4.0 10.1 additive Antioxidant 1 2.0 total 100 100 100 100 100 100 100 100 100 100 100 100 100 Solder powder Solder powder 1 Content in solder paste (mass%) 85 85 85 85 85 85 85 85 85 85 85 85 85 The relationship between storage elastic modulus G' 100 and loss elastic modulus G'' 1 00 (100°C) G' 100 >G'' 100 G' 100 >G'' 100 G' 100 >G'' 100 G' 100 >G'' 100 G' 100 >G'' 100 G' 100 >G'' 100 G' 100 >G'' 100 G' 100 >G'' 100 G' 100 >G'' 100 G' 100 <G'' 100 G' 100 <G'' 100 G' 100 <G'' 100 G' 100 <G'' 100 Phase angle δ 1 00 (100°C) ° 32.49 25.99 11.87 30.16 18.41 13.32 11.19 12.9 28.61 58.90 47.90 56.80 52.90 Phase angle δ 14 0 (140°C) ° 13.82 27.79 14.13 6.49 43.83 25.54 19.55 12.92 4.99 50.14 47.19 84.42 52.90 Paste viscosity η1 Pa·s 173.9 108 154 68 284 180 42 208 84 64 88 159 111 Thixotropic ratio Log (η2/η3) 0.87 0.89 0.76 0.95 1.00 1.03 1.11 0.70 0.81 1.21 0.86 1.22 1.11 High temperature migration test excellent excellent excellent excellent excellent excellent excellent excellent excellent inferior inferior inferior inferior

關於所獲得之焊膏,對以下評價項目進行評價。The following evaluation items were evaluated about the obtained solder paste.

<儲存彈性模數、損失彈性模數之測定> 依照下述製作順序,自焊膏採集助焊劑殘渣。 (助焊劑殘渣之製作順序) 1.如圖1所示,準備底面為45 mm×45 mm、高度為5 mm、厚度為0.3 mm之2個銅製托盤12、14。 2.於一銅製托盤12之底面上,以其開口與另一銅製托盤14之開口對向之方式重疊,並用膠帶進行固定,從而準備高度為10 mm之銅製盒10。 3.採集5 g所獲得之焊膏作為樣品。將該樣品於一銅製托盤12之內側之底面上,以被覆底面之80%之面積之方式抹開。 4.對於裝有樣品之銅製盒10,使用回焊爐(千住金屬工業公司製造,SNR-825),於大氣下實施下述溫度分佈A~E之回焊處理。 (溫度分佈A~E) A.以1.9℃/sec之升溫速度自室溫25℃加熱至150℃。 B.於150℃~180℃溫度區域保持80 sec。 C.以1.2℃/sec之升溫速度加熱至220℃。 D.以保持220℃以上40 sec、且峰值溫度為240℃之方式進行加熱。 E.其後,冷卻至室溫25℃。 5.回焊處理後,採集殘存於一銅製托盤12之內側之底面上之助焊劑殘渣。 <Determination of storage elastic modulus and loss elastic modulus> Follow the fabrication sequence below to collect flux residue from the solder paste. (Sequence of making flux residue) 1. As shown in Figure 1, prepare two copper trays 12 and 14 with a bottom surface of 45 mm×45 mm, a height of 5 mm, and a thickness of 0.3 mm. 2. On the bottom surface of one copper tray 12, overlap it so that its opening faces the opening of another copper tray 14, and fix it with adhesive tape to prepare a copper box 10 with a height of 10 mm. 3. Take 5 g of the obtained solder paste as a sample. Spread the sample on the inner bottom surface of a copper tray 12 to cover 80% of the bottom surface. 4. With respect to the copper box 10 containing the sample, the reflow process of the following temperature profiles A to E was performed in the atmosphere using a reflow furnace (manufactured by Senju Metal Industry Co., Ltd., SNR-825). (Temperature distribution A~E) A. Heating from room temperature 25°C to 150°C at a heating rate of 1.9°C/sec. B. Keep it in the temperature range of 150℃~180℃ for 80 sec. C. Heating to 220°C at a heating rate of 1.2°C/sec. D. Heating in such a way as to keep the temperature above 220°C for 40 sec and the peak temperature is 240°C. E. Thereafter, cool to room temperature 25°C. 5. After the reflow process, collect the flux residue remaining on the inner bottom surface of a copper tray 12 .

對於所獲得之助焊劑殘渣,基於下述測定條件並使用流變儀來測定於25℃~180℃之儲存彈性模數。 (測定條件) 測定裝置:流變儀(Malvern Panalytical公司製造,KINEXUS 1b+) 測定溫度:20℃~180℃ 幾何形狀(上側):25 mmϕ、不鏽鋼製、平行板 平板(下側):60 mmϕ 模式:5℃/min 應變:1% 頻率:10 Hz 間隙:0.2 mm The storage elastic modulus at 25° C. to 180° C. was measured for the obtained flux residue using a rheometer based on the following measurement conditions. (measurement conditions) Measuring device: Rheometer (manufactured by Malvern Panalytical, KINEXUS 1b+) Measuring temperature: 20℃~180℃ Geometry (upper side): 25 mmϕ, stainless steel, parallel plate Plate (lower side): 60 mmϕ Mode: 5°C/min Strain: 1% Frequency: 10Hz Clearance: 0.2mm

將使用上述流變儀所測得之於100℃之儲存彈性模數設為G' 100、損失彈性模數設為G'' 100、於140℃之儲存彈性模數設為G' 140、損失彈性模數設為G'' 140。 基於tanδ=G'/G''之關係式,將根據G' 100及G'' 100所求出之於100℃之相位角設為δ 100、根據G' 140及G'' 140所求出之於140℃之相位角設為δ 140。將結果示於表1中。 Set the storage elastic modulus at 100°C as G' 100 , the loss elastic modulus as G'' 100 , the storage elastic modulus at 140°C as G' 140 , and the loss The modulus of elasticity is set to G'' 140 . Based on the relational expression of tanδ=G'/G'', set the phase angle at 100°C obtained from G' 100 and G'' 100 as δ 100 , and obtain it from G' 140 and G'' 140 The phase angle at 140°C is set to δ 140 . The results are shown in Table 1.

<黏度之測定> 使用上述流變儀,測定於25℃之焊膏之黏度,將剪切速率為6 sec -1時之黏度設為η1、剪切速率為1.8 sec -1時之黏度設為η2、剪切速率為18 sec -1時之黏度設為η3,求出η1、η2、η3。又,算出以Log(η2/η3)求出之觸變比。將結果示於表1中。 <Measurement of Viscosity> Using the rheometer above, measure the viscosity of the solder paste at 25°C. Set the viscosity at a shear rate of 6 sec -1 as η1 and the viscosity at a shear rate of 1.8 sec -1 as Set η2 and the viscosity when the shear rate is 18 sec -1 as η3, and calculate η1, η2, and η3. Also, the thixotropic ratio obtained by Log(η2/η3) was calculated. The results are shown in Table 1.

<高溫遷移試驗> 將所獲得之焊膏以模擬實際製程之方式印刷於「印刷基板上之銅電極30」上,實施240℃之回焊處理,從而將焊料50接合於銅電極30。接下來,將殘存於印刷部分之周邊之助焊劑殘渣洗淨去除。藉此,製作圖2所示之評價用裝置(由印刷基板、銅電極30、焊料50構成之構造體)。 繼而,使用圖2所示之評價用裝置,以如下方式進行高溫遷移試驗。 圖2所示之評價用裝置具備:基板、設置於基板上之銅電極30、及設置於銅電極30上之含錫焊料50。 使用上述(助焊劑殘渣之製作順序)採集之助焊劑殘渣22之0.002~0.005 g,無間隙地填充於以微細間隔相鄰配置之銅電極30之相隔部,以填充之助焊劑殘渣22被基板及焊料50密閉之方式配置玻璃罩60。 於銅電極30之間施加10 V之定電壓,將評價用裝置保管於105℃之溫度環境中。 其後,觀察銅電極30之相隔部中之助焊劑殘渣22之金屬遷移(高溫遷移試驗)。 於在相隔部中之助焊劑殘渣22中確認到灰色樹狀之析出之情形時,判斷為焊料中所含之錫發生了遷移。 實施3次高溫遷移試驗,確認各試驗中有無析出。 表1中,將3次中3次均未確認到析出之情形標記為「優」,將3次中確認到有1次析出之情形標記為「良」,將3次中確認到有2次以上析出之情形標記為「劣」。 <High temperature migration test> The obtained solder paste was printed on the "copper electrode 30 on the printed circuit board" in a manner simulating the actual process, and a reflow process at 240° C. was performed to join the solder 50 to the copper electrode 30 . Next, wash and remove the flux residue remaining on the periphery of the printed part. Thereby, the evaluation device (the structure which consists of a printed circuit board, the copper electrode 30, and the solder 50) shown in FIG. 2 was produced. Next, using the evaluation apparatus shown in FIG. 2, a high-temperature migration test was performed as follows. The evaluation device shown in FIG. 2 includes a substrate, a copper electrode 30 provided on the substrate, and a tin-containing solder 50 provided on the copper electrode 30 . Using 0.002 to 0.005 g of the flux residue 22 collected above (procedure of making flux residue), fill without gaps between the copper electrodes 30 arranged adjacently at fine intervals, and the filled flux residue 22 is covered by the substrate. The glass cover 60 is arranged in such a way that it is sealed with the solder 50 . A constant voltage of 10 V was applied between the copper electrodes 30, and the evaluation device was stored in a temperature environment of 105°C. Thereafter, the metal migration of the flux residue 22 in the partition portion of the copper electrode 30 was observed (high temperature migration test). When gray tree-like precipitation is observed in the flux residue 22 in the partition, it is judged that the tin contained in the solder has migrated. The high-temperature migration test was carried out three times, and the presence or absence of precipitation was confirmed in each test. In Table 1, the case where precipitation was not confirmed three times out of three was marked as "excellent", the case where precipitation was confirmed once out of three times was marked "good", and the case where precipitation was confirmed two or more times out of three The case of precipitation was marked as "poor".

各實施例之焊膏與各比較例之焊膏相比,高溫遷移試驗中之析出得到抑制,因此示出耐高溫遷移性優異之結果。Compared with the solder pastes of the comparative examples, the solder pastes of the respective examples showed that precipitation in the high temperature migration test was suppressed, and thus showed excellent results in the high temperature migration resistance.

該申請案主張以2021年6月25日提出申請之日本申請案特願2021-105629號為基礎之優先權,將其發明之全部內容併入本文中。This application claims priority based on Japanese application Japanese Patent Application No. 2021-105629 filed on June 25, 2021, and the entire content of the invention is incorporated herein.

10:銅製盒 12:銅製托盤 14:銅製托盤 20:焊膏 22:助焊劑殘渣 30:銅電極 50:焊料 60:玻璃罩 10: Copper box 12: copper tray 14: copper tray 20: solder paste 22: Flux residue 30: copper electrode 50: Solder 60: glass cover

[圖1]係用以說明助焊劑殘渣之製作方法之圖。 [圖2]係用以說明高溫遷移試驗之圖。 [圖3]表示助焊劑殘渣製作時之標準回焊分佈。 [Fig. 1] is a diagram illustrating how to make flux residue. [Fig. 2] is a diagram for explaining the high temperature migration test. [Fig. 3] shows the standard reflow distribution when the flux residue is produced.

22:助焊劑殘渣 22: Flux residue

30:銅電極 30: copper electrode

50:焊料 50: Solder

60:玻璃罩 60: glass cover

Claims (9)

一種焊膏,其包含助焊劑組成物、及焊料粉末,且以下述方式構成: 上述助焊劑組成物包含基底樹脂、活性劑、溶劑、及觸變劑, 上述基底樹脂包含松香系樹脂, 對於依照下述製作順序自該焊膏獲得之助焊劑殘渣,基於下述測定條件並使用流變儀進行測定,將測得之於100℃之儲存彈性模數設為G' 100、損失彈性模數設為G'' 100,將根據於140℃之儲存彈性模數及損失彈性模數而求出之140℃之相位角設為δ 140,將根據於100℃之儲存彈性模數及損失彈性模數而求出之100℃之相位角設為δ 100時, G' 100及G'' 100滿足G' 100>G'' 100、 δ 140滿足1°以上且未達45°、及 δ 140及δ 100滿足0.1≦δ 140100≦3.0; <助焊劑殘渣之製作順序> 1.準備底面為45 mm×45 mm、高度為5 mm、厚度為0.3 mm之2個銅製托盤; 2.於上述一銅製托盤之底面上,以其開口與上述另一銅製托盤之開口對向之方式重疊,並用膠帶進行固定,從而準備高度為約10 mm之銅製盒; 3.採集5 g該焊膏作為樣品,將該樣品於上述一銅製托盤之內側之底面上,以被覆上述底面之80%之面積之方式抹開; 4.對於裝有上述樣品之上述銅製盒,使用回焊爐,於大氣下實施下述溫度分佈A~E之回焊處理; (溫度分佈A~E) A.以1.9℃/sec之升溫速度自室溫25℃加熱至150℃; B.於150℃~180℃溫度區域保持80 sec; C.以1.2℃/sec之升溫速度加熱至220℃; D.以保持220℃以上40 sec、且峰值溫度為240℃之方式進行加熱; E.其後冷卻至室溫25℃; 5.回焊處理後,採集殘存於上述一銅製托盤之內側之底面上之助焊劑殘渣; <測定條件> 測定裝置:流變儀、 測定溫度:20℃~180℃、 幾何形狀(上側):25 mmϕ、不鏽鋼製、平行板、 平板(下側):60 mmϕ、 模式:5℃/min、 應變:1%、 頻率:10 Hz、 間隙:0.2 mm。 A solder paste, which includes a flux composition and solder powder, and is constituted as follows: The flux composition includes a base resin, an activator, a solvent, and a thixotropic agent, and the base resin includes a rosin-based resin. The flux residues obtained from the solder paste in the following production procedures were measured using a rheometer based on the following measurement conditions. The measured storage elastic modulus at 100°C was set as G' 100 , and the loss elastic modulus was set as G' 100 . G'' 100 , set the phase angle at 140°C calculated based on the storage elastic modulus and loss elastic modulus at 140°C as δ 140 , and set the phase angle based on the storage elastic modulus and loss elastic modulus at 100°C When the calculated phase angle at 100°C is set to δ 100 , G' 100 and G'' 100 satisfy G' 100 >G'' 100 , δ 140 satisfies more than 1° and less than 45°, and δ 140 and δ 100 satisfies 0.1≦δ 140100 ≦3.0; <Sequence of making flux residues> 1. Prepare 2 copper trays with a bottom surface of 45 mm×45 mm, a height of 5 mm, and a thickness of 0.3 mm; 2. On the above On the bottom surface of a copper tray, overlap the opening with the opening of the other copper tray above, and fix it with adhesive tape, so as to prepare a copper box with a height of about 10 mm; 3. Collect 5 g of the solder paste as a sample , spread the sample on the inner bottom surface of the above-mentioned copper tray in such a way as to cover 80% of the above-mentioned bottom surface; 4. For the above-mentioned copper box containing the above-mentioned sample, use a reflow furnace to implement Reflow treatment of the following temperature distribution A~E; (Temperature distribution A~E) A. Heating from room temperature 25℃ to 150℃ at a heating rate of 1.9℃/sec; sec; C. Heating to 220°C at a heating rate of 1.2°C/sec; D. Heating to maintain a temperature above 220°C for 40 sec with a peak temperature of 240°C; E. Cooling to room temperature 25°C; 5 .After the reflow process, collect the flux residue remaining on the bottom surface of the inner side of the above-mentioned copper tray; mmϕ, made of stainless steel, parallel plate, plate (lower side): 60 mmϕ, mode: 5°C/min, strain: 1%, frequency: 10 Hz, gap: 0.2 mm. 如請求項1之焊膏,其中, 上述助焊劑組成物包含軟化點為135℃以上之松香系樹脂。 Such as the solder paste of claim 1, wherein, The above-mentioned flux composition contains a rosin-based resin having a softening point of 135° C. or higher. 如請求項1或2之焊膏,其中, 於該焊膏之100重量%中,上述助焊劑組成物之含量為7重量%以上且20重量%以下。 Such as the solder paste of claim 1 or 2, wherein, In 100% by weight of the solder paste, the content of the above flux composition is not less than 7% by weight and not more than 20% by weight. 如請求項1或2之焊膏,其中, 使用上述流變儀,對該焊膏於剪切速率:6 sec -1、25℃之條件進行測定時之黏度η1為5 Pa・s以上且400 Pa・s以下。 The solder paste according to claim 1 or 2, wherein, using the above-mentioned rheometer, the viscosity η1 of the solder paste when measured at a shear rate of 6 sec -1 and 25°C is 5 Pa·s or more and 400 Below Pa・s. 如請求項1或2之焊膏,其中, 使用上述流變儀測定於25℃之該焊膏之黏度,將剪切速率為1.8 sec -1時之黏度設為η2、剪切速率為18 sec -1時之黏度設為η3時,以Log(η2/η3)求出之觸變比為0.3以上且1.8以下。 The solder paste according to claim 1 or 2, wherein the viscosity of the solder paste at 25°C is measured using the above-mentioned rheometer, and the viscosity when the shear rate is 1.8 sec -1 is set as η2, and the shear rate is 18 sec When the viscosity at -1 is η3, the thixotropic ratio calculated by Log (η2/η3) is 0.3 or more and 1.8 or less. 如請求項1或2之焊膏,其用於:在由電子電路基板及電子零件所構成之密閉構造之周圍將電子電路基板及電子零件進行接合。The solder paste according to claim 1 or 2, which is used for bonding the electronic circuit board and the electronic parts around the airtight structure formed by the electronic circuit board and the electronic parts. 如請求項1或2之焊膏,其中, 上述活性劑包含選自由有機酸、胺類、鹵素系活性劑、及磷系活性劑所組成之群中之一種或兩種以上。 Such as the solder paste of claim 1 or 2, wherein, The above-mentioned activating agent includes one or more than two selected from the group consisting of organic acids, amines, halogen-based activating agents, and phosphorus-based activating agents. 如請求項1或2之焊膏,其中, 上述焊料粉末之粒徑在2~150 μm之範圍之粉末的質量分率為80%以上。 Such as the solder paste of claim 1 or 2, wherein, The mass fraction of the solder powder having a particle size in the range of 2 to 150 μm is 80% or more. 一種電子裝置之製造方法,其包括下述步驟: 將請求項1至8中任一項之焊膏印刷於電子電路基板之焊接部位; 於上述焊接部位構裝電子零件;及 於在上述焊接部位之周圍存在密閉構造之狀態,將上述焊接部位加熱至上述焊膏中之焊料粉末熔融之溫度,而將上述電子零件及上述電子電路基板進行接合。 A method of manufacturing an electronic device, comprising the steps of: Print the solder paste of any one of claims 1 to 8 on the soldering part of the electronic circuit board; Constructing electronic components at the above-mentioned soldering locations; and In a state where a sealed structure exists around the soldered portion, the soldered portion is heated to a temperature at which solder powder in the solder paste melts, thereby bonding the electronic component and the electronic circuit board.
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