TW202303797A - Wafer sorting equipment and wafer sorting method - Google Patents

Wafer sorting equipment and wafer sorting method Download PDF

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TW202303797A
TW202303797A TW111137829A TW111137829A TW202303797A TW 202303797 A TW202303797 A TW 202303797A TW 111137829 A TW111137829 A TW 111137829A TW 111137829 A TW111137829 A TW 111137829A TW 202303797 A TW202303797 A TW 202303797A
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wafer
interface
sorting
manipulator
wafers
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TWI828351B (en
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蘇建生
呂天爽
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大陸商西安奕斯偉材料科技有限公司
大陸商西安奕斯偉矽片技術有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67271Sorting devices

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Abstract

The invention provides wafer sorting equipment and a wafer sorting method. The wafer sorting equipment comprises a first sorting area and a second sorting area, wherein the first sorting area comprises a wafer input interface and a first wafer collection interface; the transfer area is adjacent to the first sorting area; the first manipulator is arranged in the first sorting area and is configured to move the wafer input into the wafer input interface to at least one of the first wafer collection interface and the transfer area; the second sorting area is adjacent to the transfer area, and the second sorting area comprises a plurality of second wafer collecting interfaces; and the second manipulator is arranged in the second sorting area and is configured to move the wafers in the transfer area to at least one second wafer collecting interface in the plurality of second wafer collecting interfaces. According to the embodiment of the invention, the occupation of unqualified wafers on the wafer carrier is reduced, and the convenience of wafer sorting is improved.

Description

一種晶圓分選設備和晶圓分選方法A kind of wafer sorting equipment and wafer sorting method

本發明屬於半導體加工技術領域,尤其關於一種晶圓分選設備和晶圓分選方法。The invention belongs to the technical field of semiconductor processing, and in particular relates to a wafer sorting device and a wafer sorting method.

晶圓在生產過程中,需要根據晶圓是否合格將晶圓分選,其中合格晶圓進入後續流程,不合格晶圓通常包括多種不同狀態的晶圓,針對不同的晶圓需要進行不同方式的處理,因此需要進一步對不合格晶圓進行分裝,相關技術中的晶圓分選方式通常在同一區域內對合格和不合格的晶圓進行分選,且分裝為合格和不合格兩種,針對不合格晶圓來說,不同狀態的不合格晶圓需要分別分裝,然而承載晶圓的載具僅支持單項流轉,這導致分裝不同狀態的不合格晶圓時會佔用大量的載具,使用較為不便。During the production process of wafers, wafers need to be sorted according to whether the wafers are qualified. Among them, qualified wafers enter the follow-up process, and unqualified wafers usually include wafers in various states. Different wafers need to be sorted in different ways. Therefore, unqualified wafers need to be further packaged. The wafer sorting method in the related art usually sorts qualified and unqualified wafers in the same area, and the packages are divided into qualified and unqualified wafers. , for unqualified wafers, unqualified wafers in different states need to be packaged separately, but the carrier that carries the wafers only supports a single flow, which leads to a large amount of loading time when unqualified wafers in different states are packaged. tool, it is inconvenient to use.

本發明實施例提供一種晶圓分選設備和晶圓分選方法,以解決晶圓分裝時不合格晶圓佔用大量載具的問題。Embodiments of the present invention provide a wafer sorting device and a wafer sorting method to solve the problem that unqualified wafers occupy a large number of carriers during wafer sorting.

本發明實施例提供了一種晶圓分選設備,包括: 第一分選區,該第一分選區包括晶圓輸入介面和第一晶圓收集介面; 中轉區,與該第一分選區鄰接; 第一機械手,設置於該第一分選區,配置為將輸入至該晶圓輸入介面的晶圓移動至該第一晶圓收集介面和該中轉區中的至少一處; 第二分選區,與該中轉區鄰接,該第二分選區包括多個第二晶圓收集介面; 第二機械手,設置於該第二分選區,配置為將該中轉區的晶圓移動至該多個第二晶圓收集介面中的至少一個第二晶圓收集介面。 An embodiment of the present invention provides a wafer sorting device, including: a first sorting area, the first sorting area includes a wafer input interface and a first wafer collection interface; a transit area adjacent to the first sorting area; a first manipulator, disposed in the first sorting area, configured to move the wafers input into the wafer input interface to at least one of the first wafer collection interface and the transfer area; a second sorting area adjacent to the transfer area, the second sorting area includes a plurality of second wafer collection interfaces; The second manipulator is arranged in the second sorting area and is configured to move the wafers in the transfer area to at least one second wafer collection interface among the plurality of second wafer collection interfaces.

在一些實施例中,該第一分選區還包括抽樣晶圓收集介面,該第一機械手還用於將輸入至該晶圓輸入介面的晶圓移動至該抽樣晶圓收集介面。In some embodiments, the first sorting area further includes a sampling wafer collection interface, and the first manipulator is also used to move the wafers input into the wafer input interface to the sampling wafer collection interface.

在一些實施例中,該多個第二晶圓收集介面包括清洗晶圓介面、拋光晶圓介面、研磨晶圓介面和報廢晶圓介面中的一項或多項。In some embodiments, the plurality of second wafer collection interfaces includes one or more of a cleaned wafer interface, a polished wafer interface, a ground wafer interface, and a scrap wafer interface.

在一些實施例中,該晶圓分選設備還包括清洗元件,該第一分選區還設置有清洗元件,該清洗元件配置為在該第一機械手將晶圓移動至該中轉區之後,清洗該第一機械手。In some embodiments, the wafer sorting equipment further includes a cleaning element, the first sorting area is also provided with a cleaning element, and the cleaning element is configured to, after the first manipulator moves the wafer to the transfer area, Clean the first robot.

在一些實施例中,該晶圓分選設備還包括隔離元件,該隔離元件設置於該中轉區和該第一分選區之間,該隔離元件配置為在該第一機械手向該中轉區移動晶圓時開啟,在該第一機械手向該中轉區移動晶圓後關閉。In some embodiments, the wafer sorting equipment further includes an isolation element, the isolation element is arranged between the transfer area and the first sorting area, and the isolation element is configured to transfer the first manipulator to the transfer area. It is turned on when the first manipulator moves the wafer to the transfer area, and it is turned off after the first manipulator moves the wafer to the transfer area.

本發明實施例還提供了一種晶圓分選方法,應用以上任一項所述之晶圓分選設備,該方法包括以下步驟: 獲取輸入至該晶圓輸入介面的目標晶圓的狀態; 若該目標晶圓為合格晶圓,則通過該第一機械手將該目標晶圓移動至該第一晶圓收集介面; 若該目標晶圓為不合格晶圓,則通過該第一機械手將該目標晶圓移動至該中轉區。 The embodiment of the present invention also provides a wafer sorting method, using the wafer sorting equipment described in any one of the above, the method includes the following steps: Obtain the state of the target wafer input to the wafer input interface; If the target wafer is a qualified wafer, moving the target wafer to the first wafer collection interface by the first manipulator; If the target wafer is an unqualified wafer, the target wafer is moved to the transfer area by the first manipulator.

在一些實施例中,該不合格晶圓包括待清洗晶圓、待拋光晶圓、待研磨晶圓和報廢晶圓中的至少一種; 該通過該第一機械手將該目標晶圓移動至該中轉區之後,該方法還包括: 若該目標晶圓為待清洗晶圓,則通過該第二機械手將位於該中轉區的目標晶圓移動至清洗晶圓介面; 若該目標晶圓為待拋光晶圓,則通過該第二機械手將位於該中轉區的目標晶圓移動至拋光晶圓介面; 若該目標晶圓為待研磨晶圓,則通過該第二機械手將位於該中轉區的目標晶圓移動至研磨晶圓介面; 若該目標晶圓為報廢晶圓,則通過該第二機械手將位於該中轉區的目標晶圓移動至報廢晶圓介面。 In some embodiments, the unqualified wafer includes at least one of a wafer to be cleaned, a wafer to be polished, a wafer to be ground, and a discarded wafer; After the target wafer is moved to the transfer area by the first manipulator, the method further includes: If the target wafer is a wafer to be cleaned, the target wafer located in the transfer area is moved to the cleaning wafer interface by the second manipulator; If the target wafer is a wafer to be polished, the target wafer located in the transfer area is moved to the polishing wafer interface by the second manipulator; If the target wafer is a wafer to be ground, the target wafer located in the transfer area is moved to the grinding wafer interface by the second manipulator; If the target wafer is a scrap wafer, the target wafer located in the transfer area is moved to the scrap wafer interface by the second manipulator.

在一些實施例中,該通過該第一機械手將該目標晶圓移動至該中轉區之後,該方法還包括: 控制該第一機械手移動至清洗元件; 通過該清洗元件清洗該第一機械手。 In some embodiments, after the target wafer is moved to the staging area by the first manipulator, the method further includes: controlling the first manipulator to move to the cleaning element; The first manipulator is cleaned by the cleaning element.

在一些實施例中,該通過該第一機械手將該目標晶圓移動至該第一晶圓收集介面之前,包括: 根據預設抽樣晶圓確定合格晶圓中的抽樣晶圓; 若該目標晶圓為抽樣晶圓,則將該目標晶圓移動至抽樣晶圓收集介面。 In some embodiments, moving the target wafer to the front of the first wafer collection interface by the first manipulator includes: Determine the sampled wafers among the qualified wafers according to the preset sampled wafers; If the target wafer is a sampling wafer, the target wafer is moved to the sampling wafer collection interface.

本發明實施例的晶圓分選設備,通過設置中轉區,能夠將不合格晶圓移動至中轉區,並進一步在第二分選區對晶圓進行進一步分選,這一過程中,減少了不合格晶圓對於晶圓載具的佔用,晶圓分選的便利性。The wafer sorting equipment in the embodiment of the present invention can move unqualified wafers to the transit area by setting the transfer area, and further sort the wafers in the second sorting area. In this process, the Eliminate the occupancy of unqualified wafers on the wafer carrier and the convenience of wafer sorting.

為利 貴審查委員了解本發明之技術特徵、內容與優點及其所能達到之功效,茲將本發明配合附圖及附件,並以實施例之表達形式詳細說明如下,而其中所使用之圖式,其主旨僅為示意及輔助說明書之用,未必為本發明實施後之真實比例與精準配置,故不應就所附之圖式的比例與配置關係解讀、侷限本發明於實際實施上的申請範圍,合先敘明。In order for Ligui examiners to understand the technical characteristics, content and advantages of the present invention and the effects it can achieve, the present invention is hereby combined with the accompanying drawings and appendices, and is described in detail in the form of embodiments as follows, and the drawings used therein , the purpose of which is only for illustration and auxiliary instructions, and not necessarily the true proportion and precise configuration of the present invention after implementation, so it should not be interpreted based on the proportion and configuration relationship of the attached drawings, and limit the application of the present invention in actual implementation The scope is described first.

在本發明實施例的描述中,需要理解的是,術語“長度”、“寬度”、“上”、“下”、“前”、“後”、“左”、“右”、“垂直”、“水平”、“頂”、“底”“內”、“外”等指示的方位或位置關係為基於附圖所示的方位或位置關係,僅是為了便於描述本發明實施例和簡化描述,而不是指示或暗示所指的裝置或元件必須具有特定的方位、以特定的方位構造和操作,因此不能理解為對本發明的限制。In the description of the embodiments of the present invention, it should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical" , "horizontal", "top", "bottom", "inner", "outer" and other indicated orientations or positional relationships are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the embodiments of the present invention and simplifying the description , rather than indicating or implying that the device or element referred to must have a particular orientation, be constructed and operate in a particular orientation, and thus should not be construed as limiting the invention.

此外,術語“第一”、“第二”僅用於描述目的,而不能理解為指示或暗示相對重要性或者隱含指明所指示的技術特徵的數量。由此,限定有“第一”、“第二”的特徵可以明示或者隱含地包括一個或者更多個所述特徵。在本發明實施例的描述中,“多個”的含義是兩個或兩個以上,除非另有明確具體的限定。In addition, the terms "first" and "second" are used for descriptive purposes only, and cannot be interpreted as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of said features. In the description of the embodiments of the present invention, "plurality" means two or more, unless otherwise specifically defined.

在本發明實施例中,除非另有明確的規定和限定,術語“安裝”、“相連”、“連接”、“固定”等術語應做廣義理解,例如,可以是固定連接,也可以是可拆卸連接,或成一體;可以是機械連接,也可以是電連接;可以是直接相連,也可以通過中間媒介間接相連,可以是兩個元件內部的連通或兩個元件的相互作用關係。對於本領域的具通常知識者而言,可以根據具體情況理解上述術語在本發明實施例中的具體含義。In the embodiments of the present invention, terms such as "installation", "connection", "connection" and "fixation" should be interpreted in a broad sense unless otherwise clearly specified and limited. Disassembled connection, or integration; it can be mechanical connection or electrical connection; it can be direct connection or indirect connection through an intermediary, and it can be the internal communication of two components or the interaction relationship between two components. Those with ordinary knowledge in the art can understand the specific meanings of the above terms in the embodiments of the present invention according to specific situations.

下面將結合本發明實施例中的附圖,對本發明實施例中的技術方案進行清楚、完整地描述,顯然,所描述的實施例是本發明一部分實施例,而不是全部的實施例。不衝突的情況下,下述實施例及實施例中的特徵可以相互組合。基於本發明中的實施例,本領域具通常知識者在沒有作出進步性創作前提下所獲取的所有其他實施例,都屬於本發明保護的範圍。The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are some of the embodiments of the present invention, but not all of them. In the case of no conflict, the following embodiments and features in the embodiments can be combined with each other. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making progressive creations fall within the protection scope of the present invention.

在晶圓生產的後段製程,主要分為預清洗、量測、最終清洗、分選和包裝步驟。其中晶圓分選設備是按照量測設備所判定的結果來進行晶圓的分選處理,即一整盒的晶圓上分選機之後,按照晶圓的品質等級不一樣,會被分到不同的載具中(載具為晶圓傳送盒(front opening unified pod,FOUP)或者晶圓包裝盒(Front Opening Shipping Box,FOSB))來給予區分處置。In the back-end process of wafer production, it is mainly divided into pre-cleaning, measurement, final cleaning, sorting and packaging steps. Among them, the wafer sorting equipment sorts the wafers according to the results determined by the measuring equipment, that is, after a whole box of wafers is put on the sorting machine, it will be sorted according to the quality level of the wafers. Distinguish between different carriers (the carrier is a front opening unified pod (FOUP) or a front opening shipping box (FOSB)).

被分選後的晶圓主要包括合格晶圓(可以直接用於後續生產加工的晶圓),報廢晶圓(不達標直接報廢的晶圓),以及重製的晶圓(通過重製處理有機會成為合格品的晶圓)。The sorted wafers mainly include qualified wafers (wafers that can be directly used for subsequent production and processing), scrapped wafers (wafers that are not up to standard and directly scrapped), and remanufactured wafers (those that have been processed through remanufacturing) opportunity to become qualified wafers).

其中重製晶圓又分為3大類,重製清洗晶圓,重製拋光晶圓,重製研磨晶圓。所以晶圓分選設備的下載口(Unloader)很多,每次開始分選需要準備大量的載具來接不同類型的重製晶圓。Among them, remanufactured wafers are divided into 3 categories, remanufactured cleaned wafers, remanufactured polished wafers, and remanufactured polished wafers. Therefore, the wafer sorting equipment has a lot of download ports (Unloader), and each time the sorting starts, a large number of carriers need to be prepared to pick up different types of remanufactured wafers.

由於不同料號的重製晶圓不能混裝,因此,即使一個載具沒有被填滿,也不能用繼續於下一個料號重製晶圓的裝載,必須要上載新的載具,這樣,重製產品佔用了大量的載具,而且大部分的載具都沒有被裝滿。Since the remanufactured wafers of different part numbers cannot be mixed, even if a carrier is not filled, it cannot be used to continue loading the remanufactured wafers of the next part number, and a new carrier must be loaded, so that, The remake takes up a lot of vehicles, and most of them are not filled.

同時,目前晶圓分選設備在分選過程中都是在同一個設備上來完成,處在同一個內環境,設備在運行的時候,機械手臂根據產品不同的等級,會移動至不同載具點位進行傳送,往復的機械運動,會給品質好的產品帶來品質汙染風險。At the same time, the current wafer sorting equipment is completed on the same equipment during the sorting process, in the same internal environment. When the equipment is running, the robotic arm will move to different carrier points according to the different grades of the products. The reciprocating mechanical movement will bring the risk of quality pollution to high-quality products.

本發明實施例提供了一種晶圓分選設備和應用於該晶圓分選設備的晶圓分選方法。Embodiments of the present invention provide a wafer sorting device and a wafer sorting method applied to the wafer sorting device.

如圖1所示,在一個實施例中,該晶圓分選設備包括第一分選區100、中轉區200和第二分選區300。該晶圓分選設備還包括第一機械手101和第二機械手301。As shown in FIG. 1 , in one embodiment, the wafer sorting equipment includes a first sorting area 100 , a transfer area 200 and a second sorting area 300 . The wafer sorting equipment also includes a first manipulator 101 and a second manipulator 301 .

第一分選區100包括晶圓輸入介面和第一晶圓收集介面,其中,晶圓輸入介面用於輸入待分選的晶圓,晶圓輸入介面的數量可以為一個或多個,多個晶圓輸入介面可以對應不同料號的晶圓,也可以對應相同料號的晶圓以提高晶圓上載速度。The first sorting area 100 includes a wafer input interface and a first wafer collection interface, wherein the wafer input interface is used to input wafers to be sorted, and the number of wafer input interfaces can be one or more. The round input interface can correspond to wafers of different part numbers, or can correspond to wafers of the same part number to increase the speed of wafer uploading.

示例性地,本實施例中,介面1和介面2可以是晶圓輸入介面,介面3可以是第一晶圓收集介面。Exemplarily, in this embodiment, interface 1 and interface 2 may be a wafer input interface, and interface 3 may be a first wafer collection interface.

中轉區200與第一分選區100鄰接,第一機械手101設置於第一分選區100,第一機械手101配置為將輸入至晶圓輸入介面的晶圓移動至第一晶圓收集介面和中轉區200中的至少一處。The transfer area 200 is adjacent to the first sorting area 100, the first manipulator 101 is arranged in the first sorting area 100, and the first manipulator 101 is configured to move the wafers input to the wafer input interface to the first wafer collection interface and at least one of the transit area 200.

第二分選區300與中轉區200鄰接,第二分選區300包括多個第二晶圓收集介面。在一些實施例中,多個第二晶圓收集介面包括清洗晶圓介面、拋光晶圓介面、研磨晶圓介面和報廢晶圓介面中的一項或多項,以分別用於回收待清洗晶圓、待拋光晶圓、待研磨晶圓和報廢晶圓。進一步的,清洗晶圓介面、拋光晶圓介面、研磨晶圓介面的數量均可以設置多個,以分別對應不同料號的晶圓。報廢晶圓介面的數量可以為一個或多個,不同料號的報廢晶圓可以分別回收,也可以統一回收。The second sorting area 300 is adjacent to the transfer area 200 , and the second sorting area 300 includes a plurality of second wafer collection interfaces. In some embodiments, the plurality of second wafer collection interfaces includes one or more of a cleaning wafer interface, a polishing wafer interface, a grinding wafer interface, and a scrap wafer interface, respectively for recovering wafers to be cleaned , wafers to be polished, wafers to be ground, and wafers to be scrapped. Further, the number of cleaning wafer interface, polishing wafer interface, and grinding wafer interface can be set in multiples, so as to correspond to wafers of different material numbers. The number of scrapped wafer interfaces can be one or more, and scrapped wafers with different material numbers can be recycled separately or collectively.

示例性地,介面A和介面B作為清洗晶圓介面,介面C和介面D作為拋光晶圓介面,介面E和介面F作為研磨晶圓介面,介面G和介面H作為報廢晶圓介面。Exemplarily, interface A and interface B serve as a cleaning wafer interface, interface C and interface D serve as a polishing wafer interface, interface E and interface F serve as a grinding wafer interface, and interface G and interface H serve as a scrap wafer interface.

第二機械手301設置於第二分選區300,第二機械手301配置為將中轉區200的晶圓移動至多個第二晶圓收集介面中的至少一個第二晶圓收集介面。The second manipulator 301 is disposed in the second sorting area 300 , and the second manipulator 301 is configured to move the wafers in the transfer area 200 to at least one second wafer collection interface among the plurality of second wafer collection interfaces.

在本發明的一些實施例中,提供的晶圓分選方法,包括以下步驟: 獲取輸入至該晶圓輸入介面的目標晶圓的狀態; 若該目標晶圓為合格晶圓,則通過該第一機械手將該目標晶圓移動至該第一晶圓收集介面; 若該目標晶圓為不合格晶圓,則通過該第一機械手將該目標晶圓移動至該中轉區。 In some embodiments of the present invention, the wafer sorting method provided comprises the following steps: Obtain the state of the target wafer input to the wafer input interface; If the target wafer is a qualified wafer, moving the target wafer to the first wafer collection interface by the first manipulator; If the target wafer is an unqualified wafer, the target wafer is moved to the transfer area by the first manipulator.

本實施例中,首先將需要分選的晶圓輸入(或稱上載)至晶圓輸入介面,然後通過第一機械手101對輸入的晶圓進行分選,將合格的晶圓移動至第一晶圓收集介面進行收集、包裝,將不合格晶圓移動至中轉區200。In this embodiment, firstly, the wafers to be sorted are input (or uploaded) to the wafer input interface, and then the input wafers are sorted by the first manipulator 101, and the qualified wafers are moved to the first The wafer collection interface collects and packs the unqualified wafers to the transfer area 200 .

進一步的,對於移動至中轉區200的不合格晶圓,還通過以下方式進行處理: 若該目標晶圓為待清洗晶圓,則通過該第二機械手將位於該中轉區的目標晶圓移動至清洗晶圓介面; 若該目標晶圓為待拋光晶圓,則通過該第二機械手將位於該中轉區的目標晶圓移動至拋光晶圓介面; 若該目標晶圓為待研磨晶圓,則通過該第二機械手將位於該中轉區的目標晶圓移動至研磨晶圓介面; 若該目標晶圓為報廢晶圓,則通過該第二機械手將位於該中轉區的目標晶圓移動至報廢晶圓介面。 Further, for the unqualified wafers moved to the transfer area 200, the following methods are also used for processing: If the target wafer is a wafer to be cleaned, the target wafer located in the transfer area is moved to the cleaning wafer interface by the second manipulator; If the target wafer is a wafer to be polished, the target wafer located in the transfer area is moved to the polishing wafer interface by the second manipulator; If the target wafer is a wafer to be ground, the target wafer located in the transfer area is moved to the grinding wafer interface by the second manipulator; If the target wafer is a scrap wafer, the target wafer located in the transfer area is moved to the scrap wafer interface by the second manipulator.

本實施例中,設置了多個針對不同的不合格晶圓的第二晶圓收集介面,以分別回收不同的不合格晶圓,這樣,位於每一第二晶圓收集介面的載具可以在填充滿之後再更換載具,提高了載具的利用率,減少了對於載具的佔用。In this embodiment, a plurality of second wafer collection interfaces for different unqualified wafers are set up to recover different unqualified wafers respectively. In this way, the carrier positioned at each second wafer collection interface can be The carrier is replaced after it is full, which improves the utilization rate of the carrier and reduces the occupation of the carrier.

在一些實施例中,第一分選區100還包括抽樣晶圓收集介面,第一機械手101還用於將輸入至晶圓輸入介面的晶圓移動至抽樣晶圓收集介面。示例性地,介面4可以作為抽樣晶圓收集接。In some embodiments, the first sorting area 100 further includes a sampling wafer collection interface, and the first manipulator 101 is also used to move the wafers input into the wafer input interface to the sampling wafer collection interface. Exemplarily, the interface 4 can be used as a sampling wafer collection interface.

在一些實施例中,該通過該第一機械手101將該目標晶圓移動至該第一晶圓收集介面之前,包括: 根據預設抽樣晶圓確定合格晶圓中的抽樣晶圓; 若該目標晶圓為抽樣晶圓,則將該目標晶圓移動至抽樣晶圓收集介面。 In some embodiments, moving the target wafer to the front of the first wafer collection interface by the first manipulator 101 includes: Determine the sampled wafers among the qualified wafers according to the preset sampled wafers; If the target wafer is a sampling wafer, the target wafer is moved to the sampling wafer collection interface.

本實施例中,還需要對合格晶圓進行抽樣檢測,對於合格晶圓來說,本實施例中進一步確定待檢測的抽樣晶圓,將其移動至抽樣晶圓收集介面,以進行抽樣檢測。In this embodiment, it is also necessary to perform sampling inspection on qualified wafers. For qualified wafers, in this embodiment, the sampling wafers to be inspected are further determined and moved to the sampling wafer collection interface for sampling inspection.

在一些實施例中,晶圓分選設備還包括清洗元件,第一分選區100還設置有清洗元件,清洗元件配置為在第一機械手101將晶圓移動至中轉區200之後,清洗第一機械手101。In some embodiments, the wafer sorting equipment further includes a cleaning element, and the first sorting area 100 is also provided with a cleaning element configured to clean the first manipulator 101 after the wafer is moved to the transfer area 200. A manipulator 101 .

在一些實施例中,該通過該第一機械手101將該目標晶圓移動至該中轉區200之後,該方法還包括: 控制該第一機械手101移動至清洗元件; 通過該清洗元件清洗該第一機械手101。 In some embodiments, after the target wafer is moved to the transfer area 200 by the first manipulator 101, the method further includes: controlling the first manipulator 101 to move to the cleaning element; The first manipulator 101 is cleaned by the cleaning element.

本實施例中,在每一次將不合格晶圓移動至中轉區200之後,對第一機械手101進行清洗,從而避免不合格晶圓上脫落的顆粒等汙染物汙染第一機械手101後續夾持的合格晶圓。In this embodiment, after each unqualified wafer is moved to the transfer area 200, the first manipulator 101 is cleaned, so as to avoid contamination of the first manipulator 101 by pollutants such as particles falling off from the unqualified wafer. Acceptable wafers held.

在一些實施例中,晶圓分選設備還包括隔離元件,隔離元件設置於中轉區200和第一分選區100之間,隔離元件配置為在第一機械手101向中轉區200移動晶圓時開啟,在第一機械手101向中轉區200移動晶圓後關閉。In some embodiments, the wafer sorting equipment further includes an isolation element, the isolation element is arranged between the transfer area 200 and the first sorting area 100, and the isolation element is configured to move the wafer to the transfer area 200 when the first manipulator 101 It is turned on during the round, and turned off after the first manipulator 101 moves the wafer to the transfer area 200 .

進一步的,在一些實施例中,還可以在中轉區200和第二分選區300之間也設置隔離元件,從而進一步減少晶圓交叉汙染的可能性。Furthermore, in some embodiments, an isolation element may also be provided between the transfer area 200 and the second sorting area 300 , so as to further reduce the possibility of wafer cross-contamination.

在一些實施例中,如圖2所示,還可以在載具上設置清潔元件,具體的,載具上包括多個容納晶圓23的隔層22,清潔元件包括吹氣管20,吹氣管20在與每一隔層22對應的位置開設有吹氣孔21,通過吹氣管20與吹氣孔21相配合以實現對晶圓23的清潔。In some embodiments, as shown in FIG. 2 , cleaning elements can also be provided on the carrier. Specifically, the carrier includes a plurality of compartments 22 for accommodating wafers 23 . An air blowing hole 21 is opened at a position corresponding to each spacer 22 , and the cleaning of the wafer 23 is realized by cooperating with the air blowing pipe 20 and the air blowing hole 21 .

各晶圓收集介面處可以設置底座,底座上設置有與吹氣管匹配的接頭,當底座設置在晶圓收集介面處時,吹氣管20與接頭相連接,各接頭與氣泵連接,以使得載具設置在底座上時,能夠通過氣泵向吹氣管20供氣,以清潔位於載具上的晶圓23,去除晶圓23上的水分和汙染物。Each wafer collection interface can be provided with a base, and the base is provided with a joint that matches the blowing tube. When the base is set at the wafer collection interface, the blowing tube 20 is connected to the joint, and each joint is connected to the air pump, so that the carrier When it is installed on the base, the gas blowing pipe 20 can be supplied with air through the air pump to clean the wafer 23 on the carrier and remove moisture and pollutants on the wafer 23 .

這裡,晶圓收集介面指的可以是上述第一晶圓收集介面、第二晶圓收集介面和抽樣晶圓收集介面等。Here, the wafer collection interface may refer to the first wafer collection interface, the second wafer collection interface, the sampling wafer collection interface, and the like.

以上僅為本發明之較佳實施例,並非用來限定本發明之實施範圍,如果不脫離本發明之精神和範圍,對本發明進行修改或者等同替換,均應涵蓋在本發明申請專利範圍的保護範圍當中。The above are only preferred embodiments of the present invention, and are not used to limit the implementation scope of the present invention. If the present invention is modified or equivalently replaced without departing from the spirit and scope of the present invention, it shall be covered by the protection of the patent scope of the present invention. in the range.

1:介面 2:介面 3:介面 4:介面 20:吹氣管 21:吹氣孔 22:每一隔層 23:晶圓 100:第一分選區 101:第一機械手 200:中轉區 300:第二分選區 301:第二機械手 A:介面 B:介面 C:介面 D:介面 E:介面 F:介面 G:介面 H:介面 1: Interface 2: Interface 3: Interface 4: Interface 20: Blowing tube 21: Blowing hole 22: Each compartment 23: Wafer 100: The first constituency 101: The first manipulator 200: transit area 300:Second constituency 301: The second manipulator A: interface B: interface C: interface D: interface E: interface F: interface G: interface H: interface

圖1是本發明一實施例提供的晶圓分選設備的結構示意圖; 圖2是本發明一實施例中載具的結構示意圖。 FIG. 1 is a schematic structural view of a wafer sorting device provided by an embodiment of the present invention; FIG. 2 is a schematic structural diagram of a carrier in an embodiment of the present invention.

1:介面 1: Interface

2:介面 2: Interface

3:介面 3: Interface

4:介面 4: Interface

100:第一分選區 100: The first constituency

101:第一機械手 101: The first manipulator

200:中轉區 200: transit area

300:第二分選區 300:Second constituency

301:第二機械手 301: The second manipulator

A:介面 A: interface

B:介面 B: interface

C:介面 C: interface

D:介面 D: interface

E:介面 E: interface

F:介面 F: interface

G:介面 G: interface

H:介面 H: interface

Claims (9)

一種晶圓分選設備,包括: 第一分選區,該第一分選區包括晶圓輸入介面和第一晶圓收集介面; 中轉區,與該第一分選區鄰接; 第一機械手,設置於該第一分選區,配置為將輸入至該晶圓輸入介面的晶圓移動至該第一晶圓收集介面和該中轉區中的至少一處; 第二分選區,與該中轉區鄰接,該第二分選區包括多個第二晶圓收集介面; 第二機械手,設置於該第二分選區,配置為將該中轉區的晶圓移動至該多個第二晶圓收集介面中的至少一個第二晶圓收集介面。 A wafer sorting device, comprising: a first sorting area, the first sorting area includes a wafer input interface and a first wafer collection interface; a transit area adjacent to the first sorting area; a first manipulator, disposed in the first sorting area, configured to move the wafers input into the wafer input interface to at least one of the first wafer collection interface and the transfer area; a second sorting area adjacent to the transfer area, the second sorting area includes a plurality of second wafer collection interfaces; The second manipulator is arranged in the second sorting area and is configured to move the wafers in the transfer area to at least one second wafer collection interface among the plurality of second wafer collection interfaces. 如請求項1所述之晶圓分選設備,其中,該第一分選區還包括抽樣晶圓收集介面,該第一機械手還用於將輸入至該晶圓輸入介面的晶圓移動至該抽樣晶圓收集介面。The wafer sorting equipment as described in claim 1, wherein the first sorting area further includes a sampling wafer collection interface, and the first manipulator is also used to move the wafers input to the wafer input interface to the Sample wafer collection interface. 如請求項1所述之晶圓分選設備,其中,該多個第二晶圓收集介面包括清洗晶圓介面、拋光晶圓介面、研磨晶圓介面和報廢晶圓介面中的一項或多項。The wafer sorting device according to claim 1, wherein the plurality of second wafer collection interfaces include one or more of a cleaning wafer interface, a polishing wafer interface, a grinding wafer interface and a scrap wafer interface . 如請求項1所述之晶圓分選設備,其中,該晶圓分選設備還包括清洗元件,該第一分選區還設置有清洗元件,該清洗元件配置為在該第一機械手將晶圓移動至該中轉區之後,清洗該第一機械手。The wafer sorting equipment as described in claim 1, wherein the wafer sorting equipment further includes a cleaning element, the first sorting area is also provided with a cleaning element, and the cleaning element is configured to separate the wafer from the first robotic arm. After the circle moves to the transfer area, clean the first manipulator. 如請求項1所述之晶圓分選設備,其中,該晶圓分選設備還包括隔離元件,該隔離元件設置於該中轉區和該第一分選區之間,該隔離元件配置為在該第一機械手向該中轉區移動晶圓時開啟,在該第一機械手向該中轉區移動晶圓後關閉。The wafer sorting equipment as described in Claim 1, wherein the wafer sorting equipment further includes an isolation element, the isolation element is arranged between the transfer area and the first sorting area, and the isolation element is configured to The first manipulator is turned on when moving wafers to the transfer area, and is turned off after the first manipulator moves wafers to the transfer area. 一種晶圓分選方法,應用於如請求項1至5中任一項所述之晶圓分選設備,該方法包括以下步驟: 獲取輸入至該晶圓輸入介面的目標晶圓的狀態; 若該目標晶圓為合格晶圓,則通過該第一機械手將該目標晶圓移動至該第一晶圓收集介面; 若該目標晶圓為不合格晶圓,則通過該第一機械手將該目標晶圓移動至該中轉區。 A wafer sorting method, applied to the wafer sorting equipment described in any one of claims 1 to 5, the method includes the following steps: Obtain the state of the target wafer input to the wafer input interface; If the target wafer is a qualified wafer, moving the target wafer to the first wafer collection interface by the first manipulator; If the target wafer is an unqualified wafer, the target wafer is moved to the transfer area by the first manipulator. 如請求項6所述之晶圓分選方法,其中,該不合格晶圓包括待清洗晶圓、待拋光晶圓、待研磨晶圓和報廢晶圓中的至少一種; 該通過該第一機械手將該目標晶圓移動至該中轉區之後,該方法還包括: 若該目標晶圓為待清洗晶圓,則通過該第二機械手將位於該中轉區的目標晶圓移動至清洗晶圓介面; 若該目標晶圓為待拋光晶圓,則通過該第二機械手將位於該中轉區的目標晶圓移動至拋光晶圓介面; 若該目標晶圓為待研磨晶圓,則通過該第二機械手將位於該中轉區的目標晶圓移動至研磨晶圓介面; 若該目標晶圓為報廢晶圓,則通過該第二機械手將位於該中轉區的目標晶圓移動至報廢晶圓介面。 The wafer sorting method according to claim 6, wherein the unqualified wafers include at least one of wafers to be cleaned, wafers to be polished, wafers to be ground and scrapped wafers; After the target wafer is moved to the transfer area by the first manipulator, the method further includes: If the target wafer is a wafer to be cleaned, the target wafer located in the transfer area is moved to the cleaning wafer interface by the second manipulator; If the target wafer is a wafer to be polished, the target wafer located in the transfer area is moved to the polishing wafer interface by the second manipulator; If the target wafer is a wafer to be ground, the target wafer located in the transfer area is moved to the grinding wafer interface by the second manipulator; If the target wafer is a scrap wafer, the target wafer located in the transfer area is moved to the scrap wafer interface by the second manipulator. 如請求項6或7所述之晶圓分選方法,其中,該通過該第一機械手將該目標晶圓移動至該中轉區之後,該方法還包括: 控制該第一機械手移動至清洗元件; 通過該清洗元件清洗該第一機械手。 The wafer sorting method as described in Claim 6 or 7, wherein, after the target wafer is moved to the transfer area by the first manipulator, the method further includes: controlling the first manipulator to move to the cleaning element; The first manipulator is cleaned by the cleaning element. 如請求項6所述之晶圓分選方法,其中,該通過該第一機械手將該目標晶圓移動至該第一晶圓收集介面之前,包括: 根據預設抽樣晶圓確定合格晶圓中的抽樣晶圓; 若該目標晶圓為抽樣晶圓,則將該目標晶圓移動至抽樣晶圓收集介面。 The wafer sorting method as described in claim 6, wherein the moving the target wafer to the front of the first wafer collection interface by the first manipulator includes: Determine the sampled wafers among the qualified wafers according to the preset sampled wafers; If the target wafer is a sampling wafer, the target wafer is moved to the sampling wafer collection interface.
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