TW202243913A - Resin composition for underfill, electronic component apparatus and manufacturing method thereof - Google Patents

Resin composition for underfill, electronic component apparatus and manufacturing method thereof Download PDF

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TW202243913A
TW202243913A TW111113640A TW111113640A TW202243913A TW 202243913 A TW202243913 A TW 202243913A TW 111113640 A TW111113640 A TW 111113640A TW 111113640 A TW111113640 A TW 111113640A TW 202243913 A TW202243913 A TW 202243913A
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silicone compound
mass
underfill
epoxy resin
modified silicone
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古池大輝
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日商昭和電工材料股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/60Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape

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  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Epoxy Resins (AREA)
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Abstract

A resin composition for underfill includes an epoxy resin, a curing agent, an inorganic filler, and a silicone compound including at least one of a polyglycerin-modified silicone compound and a polyester-modified silicone compound.

Description

底部填充用樹脂組成物以及電子零件裝置及其製造方法Resin composition for underfill, electronic component device, and manufacturing method thereof

本發明是有關於一種底部填充用樹脂組成物以及電子零件裝置及其製造方法。The present invention relates to a resin composition for underfill, an electronic component device, and a manufacturing method thereof.

自先前以來,作為用以密封電晶體、積體電路(Integrated Circuit,IC)等半導體元件的密封材,就生產性、成本等方面而言,主要使用樹脂。其中,廣泛使用作業性、成形性、電氣特性、耐濕性、耐熱性、機械特性、與插入物的接著性等密封材所要求的諸特性的平衡優異的環氧樹脂。Conventionally, as a sealing material for sealing semiconductor elements such as transistors and integrated circuits (Integrated Circuit, IC), resins have been mainly used in terms of productivity and cost. Among them, epoxy resins are widely used that are excellent in the balance of properties required for sealing materials, such as workability, formability, electrical properties, moisture resistance, heat resistance, mechanical properties, and adhesion to inserts.

近年來,隨著密封了半導體元件的電子零件裝置的小型化及薄型化,將裸晶片直接安裝於配線基板上的所謂裸晶片安裝成為主流。作為基於該裸晶片安裝所得的電子零件裝置,可列舉基板覆晶(Chip on Board,COB)、玻璃覆晶(Chip on Glass,COG)、帶形載體封裝(Tape Carrier Package,TCP)等。於該些電子零件裝置中,廣泛使用液狀的樹脂組成物作為密封材。 另外,於將陶瓷、玻璃/環氧樹脂、玻璃/醯亞胺樹脂、聚醯亞胺膜等製成基板的配線基板(以下,亦簡稱為「基板」)上直接凸塊連接半導體元件而成的電子零件裝置(倒裝晶片)中,一直使用用以填充於經凸塊連接的半導體元件與配線基板的間隙(縫隙)的被稱為底部填充材的密封材。 用作底部填充材的樹脂組成物起到保護電子零件免受溫濕度及機械外力的影響的重要作用。 In recent years, so-called bare chip mounting, in which a bare chip is directly mounted on a wiring board, has become mainstream along with miniaturization and thinning of electronic component devices in which semiconductor elements are sealed. Examples of the electronic component device obtained by mounting the bare chip include Chip on Board (COB), Chip on Glass (COG), Tape Carrier Package (TCP), and the like. In these electronic component devices, liquid resin compositions are widely used as sealing materials. In addition, semiconductor elements are directly bump-connected on a wiring board (hereinafter, also simply referred to as "substrate") made of ceramics, glass/epoxy resin, glass/imide resin, polyimide film, etc. In conventional electronic component devices (flip chip), a sealing material called an underfill material has been used to fill the gap (gap) between a semiconductor element and a wiring board connected via bumps. The resin composition used as an underfill plays an important role in protecting electronic components from temperature, humidity and external mechanical force.

近年來,隨著資訊技術的發展,電子機器的進一步小型化、高積體度化及多功能化不斷進展,基於多引腳化的凸塊的小徑化、窄間距化及窄縫隙化不斷推進。進而,藉由電子機器的小型化,與先前相比,配置於基板上的連接端子與半導體元件的間隔變窄。因此,若於由底部填充材密封的半導體元件的圓角部產生樹脂成分向基板的滲出(以下,亦稱為「滲漏(bleed)」),則存在因其滲出而污染配線的情況。In recent years, with the development of information technology, the further miniaturization, high volume and multi-functionalization of electronic equipment have continued to progress, and the smaller diameter, narrower pitch and narrower gaps of bumps based on multi-pins have continued to advance. Furthermore, due to miniaturization of electronic equipment, the distance between the connection terminals arranged on the substrate and the semiconductor element has become narrower than before. Therefore, when the resin component bleeds into the substrate (hereinafter also referred to as "bleed") at the fillet of the semiconductor element sealed with the underfill material, the wiring may be contaminated by the bleed.

此處,為了改善滲漏不良,揭示有一種包含環氧樹脂、液狀芳香族胺、填料及具有羧基或胺基的液狀矽酮化合物的液狀密封樹脂組成物(例如,參照專利文獻1)。 [現有技術文獻] [專利文獻] Here, in order to improve leakage defects, a liquid sealing resin composition comprising an epoxy resin, a liquid aromatic amine, a filler, and a liquid silicone compound having a carboxyl group or an amine group is disclosed (for example, refer to Patent Document 1 ). [Prior art literature] [Patent Document]

[專利文獻1]日本專利特開2006-219575號公報[Patent Document 1] Japanese Patent Laid-Open No. 2006-219575

[發明所欲解決之課題] 關於專利文獻1中所記載的液狀密封樹脂組成物,記載有:於使用不含羧基及胺基的矽酮化合物的情況下,無法實現滲漏的抑制。因此,除專利文獻1中所記載的液狀密封樹脂組成物以外,亦謀求一種抑制樹脂成分的滲漏的方法。 [Problem to be Solved by the Invention] Regarding the liquid sealing resin composition described in Patent Document 1, it is described that when a silicone compound not containing a carboxyl group or an amino group is used, it is not possible to suppress leakage. Therefore, in addition to the liquid sealing resin composition described in Patent Document 1, a method of suppressing leakage of the resin component is also sought.

本揭示的目的在於提供一種可抑制滲漏的產生的底部填充用樹脂組成物以及使用該底部填充用樹脂組成物的電子零件裝置及其製造方法。 [解決課題之手段] An object of the present disclosure is to provide an underfill resin composition capable of suppressing occurrence of leakage, an electronic component device using the underfill resin composition, and a manufacturing method thereof. [Means to solve the problem]

用以達成所述課題的具體手段如以下所述。 <1> 一種底部填充用樹脂組成物,包含環氧樹脂、硬化劑、無機填充材、以及含有聚甘油改質矽酮化合物及聚酯改質矽酮化合物的至少一者的矽酮化合物。 <2> 如<1>所述的底部填充用樹脂組成物,其中,相對於底部填充用樹脂組成物總量,所述矽酮化合物的含有率為0.0001質量%~1質量%。 <3> 如<1>或<2>所述的底部填充用樹脂組成物,其中,所述矽酮化合物包含聚甘油改質矽酮化合物。 <4> 如<1>至<3>中任一項所述的底部填充用樹脂組成物,其中,於所述矽酮化合物包含聚酯改質矽酮化合物的情況下,所述聚酯改質矽酮化合物包含聚醚-聚酯改質矽酮化合物。 <5> 如<1>至<4>中任一項所述的底部填充用樹脂組成物,其中,所述硬化劑包含胺系硬化劑。 <6> 一種電子零件裝置,包括: 基板,具有電路層; 電子零件,配置於所述基板上並與所述電路層電性連接;以及 如<1>至<5>中任一項所述的底部填充用樹脂組成物的硬化物,配置於所述基板與所述電子零件的間隙。 <7> 一種電子零件裝置的製造方法,具有如下步驟:使用如<1>至<5>中任一項所述的底部填充用樹脂組成物將具有電路層的基板、及配置於所述基板上並與所述電路層電性連接的電子零件密封的步驟。 [發明的效果] Specific means for achieving the above-mentioned problems are as follows. <1> A resin composition for underfill, including an epoxy resin, a curing agent, an inorganic filler, and a silicone compound including at least one of a polyglycerol-modified silicone compound and a polyester-modified silicone compound. <2> The resin composition for underfill according to <1>, wherein the content of the silicone compound is 0.0001% by mass to 1% by mass based on the total amount of the resin composition for underfill. <3> The underfill resin composition according to <1> or <2>, wherein the silicone compound includes a polyglycerin-modified silicone compound. <4> The underfill resin composition according to any one of <1> to <3>, wherein, when the silicone compound includes a polyester-modified silicone compound, the polyester-modified The modified silicone compound includes polyether-polyester modified silicone compound. <5> The underfill resin composition according to any one of <1> to <4>, wherein the curing agent includes an amine-based curing agent. <6> An electronic component device, including: a substrate having a circuit layer; an electronic component disposed on the substrate and electrically connected to the circuit layer; and The cured product of the underfill resin composition according to any one of <1> to <5> is arranged in a gap between the substrate and the electronic component. <7> A method of manufacturing an electronic component device, comprising the step of disposing a substrate having a circuit layer, and arranging the substrate on the substrate using the resin composition for underfill according to any one of <1> to <5>. The step of sealing the electronic parts on and electrically connected with the circuit layer. [Effect of the invention]

根據本揭示,可提供一種可抑制滲漏的產生的底部填充用樹脂組成物以及使用該底部填充用樹脂組成物的電子零件裝置及其製造方法。According to the present disclosure, an underfill resin composition capable of suppressing occurrence of leakage, an electronic component device using the underfill resin composition, and a method of manufacturing the same can be provided.

以下,對用以實施本發明的形態進行詳細說明。其中,本發明並不限定於以下的實施方式。於以下的實施方式中,其結構要素(亦包括要素步驟等)除特別明示的情況以外,並非必須。關於數值及其範圍亦同樣如此,並不限制本發明。 於本揭示中,「步驟」的用語中,除與其他步驟獨立的步驟以外,即便於無法與其他步驟明確區別的情況下,若達成該步驟的目的,則亦包括該步驟。 於本揭示中,使用「~」所表示的數值範圍中包含「~」的前後所記載的數值分別作為最小值及最大值。 於本揭示中階段性記載的數值範圍中,一個數值範圍中所記載的上限值或下限值可置換為其他階段性記載的數值範圍的上限值或下限值。另外,於本揭示中所記載的數值範圍中,該數值範圍的上限值或下限值亦可置換為實施例中所示的值。 於本揭示中,各成分可包含多種相當的物質。於在組成物中存在多種相當於各成分的物質的情況下,只要無特別說明,則各成分的含有率或含量是指組成物中所存在的該多種物質的合計含有率或含量。 於本揭示中,可包含多種相當於各成分的粒子。於在組成物中存在多種相當於各成分的粒子的情況下,只要無特別說明,則各成分的粒子徑是指與組成物中所存在的該多種粒子的混合物相關的值。 於本揭示中,「層」或「膜」的用語中,於觀察該層或膜所存在的區域時,除形成於整個該區域的情況以外,亦包含僅形成於該區域的一部分的情況。 Hereinafter, the form for carrying out this invention is demonstrated in detail. However, the present invention is not limited to the following embodiments. In the following embodiments, the constituent elements (including element steps, etc.) are not essential unless otherwise specified. The same applies to numerical values and their ranges, and do not limit the present invention. In the present disclosure, the term "step" includes a step that is independent from other steps, even if it cannot be clearly distinguished from other steps, as long as the purpose of the step is achieved, the step is also included. In this disclosure, the numerical values described before and after including "-" in the numerical range represented by "-" are used as the minimum value and the maximum value, respectively. In the numerical ranges described step by step in this disclosure, the upper limit or lower limit described in one numerical range may be replaced with the upper limit or lower limit of the numerical range described in other steps. In addition, in the numerical range described in this indication, the upper limit or the lower limit of the numerical range may be replaced with the value shown in an Example. In the present disclosure, each component may contain a plurality of corresponding substances. When a plurality of substances corresponding to each component exist in the composition, unless otherwise specified, the content or content of each component refers to the total content or content of the plurality of substances present in the composition. In the present disclosure, a plurality of particles corresponding to each component may be included. When multiple types of particles corresponding to each component exist in the composition, unless otherwise specified, the particle size of each component refers to a value related to a mixture of the plurality of types of particles present in the composition. In this disclosure, the term "layer" or "film" includes not only the case where the layer or film is formed in the entire area but also the case where it is formed in only a part of the area when looking at the area where the layer or film exists.

<底部填充用樹脂組成物> 本揭示的底部填充用樹脂組成物包含環氧樹脂、硬化劑、無機填充材、以及含有聚甘油改質矽酮化合物及聚酯改質矽酮化合物的至少一者的矽酮化合物。 <Resin composition for underfill> The underfill resin composition disclosed herein includes an epoxy resin, a curing agent, an inorganic filler, and a silicone compound containing at least one of a polyglycerol-modified silicone compound and a polyester-modified silicone compound.

本揭示的底部填充用樹脂組成物(以下,亦稱為「底部填充材」)包含含有聚甘油改質矽酮化合物及聚酯改質矽酮化合物的至少一者(以下,亦稱為「特定的改質矽酮化合物」)的矽酮化合物。藉此,可抑制滲漏的產生。該理由如以下般推測。於將底部填充材填充於半導體元件等電子零件與配線基板的間隙時,特定的改質矽酮化合物中所含的羥基、酯基等極性基吸附於配線基板上。因此,可抑制先行液膜的潤濕擴展,從而可抑制滲漏的產生。The resin composition for underfill of the present disclosure (hereinafter also referred to as “underfill material”) contains at least one of polyglycerin-modified silicone compound and polyester-modified silicone compound (hereinafter also referred to as “specific underfill material”). Modified silicone compounds") silicone compounds. Thereby, occurrence of leakage can be suppressed. The reason is presumed as follows. When the underfill material is filled in the gap between electronic components such as semiconductor elements and the wiring board, polar groups such as hydroxyl groups and ester groups contained in the specific modified silicone compound are adsorbed on the wiring board. Therefore, the wetting spread of the preceding liquid film can be suppressed, and the occurrence of leakage can be suppressed.

底部填充材較佳為於常溫下為液體。於本揭示中,所謂「常溫」是指25℃,所謂「液體」是指顯示出流動性與黏性且作為表示黏性的尺度的黏度為0.0001 Pa·s~100 Pa·s的物質。另外,所謂「液狀」是指液體的狀態。The underfill material is preferably liquid at normal temperature. In this disclosure, the term "normal temperature" refers to 25°C, and the term "liquid" refers to a substance that exhibits fluidity and viscosity and has a viscosity of 0.0001 Pa·s to 100 Pa·s as a measure of viscosity. In addition, "liquid state" means a liquid state.

於本揭示中,黏度定義為如下值:將使EHD型旋轉黏度計於25℃下以規定的轉速旋轉1分鐘時的測定值乘以規定的換算係數而得的值。所述測定值是針對保持為25±1℃的液體,使用裝有圓錐角度3°、圓錐半徑14 mm的圓錐轉子的EHD型旋轉黏度計而獲得。轉速及換算係數根據測定對象的液體的黏度而不同。具體而言,預先粗略地推定測定對象的液體的黏度,根據推定值來確定轉速及換算係數。In the present disclosure, the viscosity is defined as a value obtained by multiplying a measured value when an EHD-type rotational viscometer is rotated at a predetermined rotation speed for 1 minute at 25° C. by a predetermined conversion factor. The measured value is obtained with respect to a liquid maintained at 25±1° C. using an EHD rotational viscometer equipped with a conical rotor with a cone angle of 3° and a cone radius of 14 mm. The rotational speed and conversion factor differ depending on the viscosity of the liquid to be measured. Specifically, the viscosity of the liquid to be measured is roughly estimated in advance, and the rotational speed and the conversion factor are determined based on the estimated value.

於黏度的測定中,於測定對象的液體的黏度的推定值為0 Pa·s以上且未滿1.25 Pa·s的情況下,將轉速設為每分鐘10轉,將換算係數設為0.5,於黏度的推定值為1.25 Pa·s以上且未滿2.5 Pa·s的情況下,將轉速設為每分鐘5轉,將換算係數設為1,於黏度的推定值為2.5 Pa·s以上且未滿6.25 Pa·s的情況下,將轉速設為每分鐘2.5轉,將換算係數設為2,於黏度的推定值為6.25 Pa·s以上且未滿12.5 Pa·s的情況下,將轉速設為每分鐘1轉,將換算係數設為5。In the measurement of viscosity, when the estimated value of the viscosity of the liquid to be measured is 0 Pa·s or more and less than 1.25 Pa·s, the rotational speed is set to 10 revolutions per minute, and the conversion factor is set to 0.5. When the estimated viscosity is 1.25 Pa·s or more and less than 2.5 Pa·s, set the rotational speed to 5 rpm and set the conversion factor to 1. In the case of full 6.25 Pa·s, set the rotational speed to 2.5 revolutions per minute, and set the conversion factor to 2. For 1 revolution per minute, set the conversion factor to 5.

底部填充材的黏度並無特別限制。其中,就高流動性的觀點而言,底部填充材於25℃下的黏度較佳為0.1 Pa·s~100.0 Pa·s,更佳為0.1 Pa·s~50.0 Pa·s,進而佳為0.1 Pa·s~30.0 Pa·s。The viscosity of the underfill is not particularly limited. Among them, from the viewpoint of high fluidity, the viscosity of the underfill material at 25° C. is preferably from 0.1 Pa·s to 100.0 Pa·s, more preferably from 0.1 Pa·s to 50.0 Pa·s, and still more preferably from 0.1 Pa·s to 100.0 Pa·s. Pa·s~30.0 Pa·s.

另外,作為於100℃~120℃附近向數十μm~數百μm的窄縫隙間填充底部填充材時的填充容易度的指標,可列舉110℃下的底部填充材的黏度。110℃下的底部填充材的黏度較佳為0.20 Pa·s以下,更佳為0.15 Pa·s以下。再者,110℃下的底部填充材的黏度可藉由流變儀AR2000(TA儀器(TA Instrument)製造、鋁圓錐40 mm、剪切速度32.5/sec)來測定。In addition, the viscosity of the underfill at 110°C can be cited as an indicator of the ease of filling when filling the underfill into narrow gaps of several tens of μm to several hundreds of μm at around 100°C to 120°C. The viscosity of the underfill material at 110° C. is preferably at most 0.20 Pa·s, more preferably at most 0.15 Pa·s. In addition, the viscosity of the underfill material at 110° C. can be measured with a rheometer AR2000 (manufactured by TA Instruments, aluminum cone 40 mm, shear rate 32.5/sec).

另外,底部填充材中,作為使用E型黏度計於25℃下測定的轉速為2.5轉/分鐘下的黏度與轉速為10轉/分鐘下的黏度的比的觸變指數[(2.5轉/分鐘下的黏度)/(10轉/分鐘下的黏度)]較佳為0.5~1.5,更佳為0.8~1.2。若觸變指數為所述範圍,則圓角形成性進一步提高。再者,底部填充材的黏度及觸變指數可藉由適當選擇環氧樹脂的組成、無機填充材的含有率等來設為所期望的範圍。In addition, in the underfill material, the thixotropic index [(2.5 rpm Viscosity at )/(viscosity at 10 rpm)] is preferably 0.5 to 1.5, more preferably 0.8 to 1.2. When the thixotropic index is within the above-mentioned range, the fillet forming property is further improved. Furthermore, the viscosity and thixotropic index of the underfill material can be set within a desired range by appropriately selecting the composition of the epoxy resin, the content rate of the inorganic filler, and the like.

本揭示的底部填充材包含環氧樹脂、硬化劑、無機填充材及含有特定的改質矽酮化合物的矽酮化合物,視需要亦可含有其他成分。The underfill material disclosed herein includes an epoxy resin, a curing agent, an inorganic filler, and a silicone compound containing a specific modified silicone compound, and may also contain other components as necessary.

(環氧樹脂) 本揭示的底部填充材含有環氧樹脂。 環氧樹脂的種類並無特別限制,可自作為底部填充材的材料通常使用的材料中選擇。環氧樹脂可單獨使用一種,亦可併用兩種以上。 (epoxy resin) The underfill of the present disclosure contains epoxy resin. The type of epoxy resin is not particularly limited, and it can be selected from materials generally used as an underfill material. One type of epoxy resin may be used alone, or two or more types may be used in combination.

作為環氧樹脂,可列舉:苯酚酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂等酚醛清漆型環氧樹脂、雙酚A型環氧樹脂、雙酚F型環氧樹脂等雙酚型環氧樹脂、N,N-二縮水甘油基苯胺、N,N-二縮水甘油基甲苯胺、二胺基二苯基甲烷型縮水甘油胺、胺基苯酚型縮水甘油胺等芳香族縮水甘油胺型環氧樹脂、具有伸苯基骨架或伸聯苯基骨架的至少一者的苯酚芳烷基型環氧樹脂、具有伸苯基骨架或伸聯苯基骨架的至少一者的萘酚芳烷基型環氧樹脂等芳烷基型環氧樹脂、對苯二酚型環氧樹脂、聯苯型環氧樹脂、二苯乙烯型環氧樹脂、三苯酚甲烷型環氧樹脂、三苯酚丙烷型環氧樹脂、烷基改質三苯酚甲烷型環氧樹脂、含三嗪核的環氧樹脂、二環戊二烯改質苯酚型環氧樹脂、萘酚型環氧樹脂、萘型環氧樹脂、乙烯基環己烯二氧化物、二環戊二烯氧化物、脂環族二環氧-己二酸酯(alicyclic diepoxy-adipate)等脂環式環氧樹脂、烷二醇二縮水甘油醚、聚(烷二醇)二縮水甘油醚、烯二醇二縮水甘油醚等於分子內具有兩個環氧基的二官能脂肪族環氧化合物等。例如,環氧樹脂可包含雙酚型環氧樹脂、芳香族縮水甘油胺型環氧樹脂及萘型環氧樹脂。Examples of the epoxy resin include bisphenol novolac epoxy resins such as phenol novolac epoxy resins and cresol novolac epoxy resins, bisphenol A epoxy resins, and bisphenol F epoxy resins. Aromatic glycidol such as epoxy resin, N,N-diglycidylaniline, N,N-diglycidyltoluidine, diaminodiphenylmethane type glycidylamine, aminophenol type glycidylamine, etc. Amine type epoxy resin, phenol aralkyl type epoxy resin having at least one of phenylene skeleton or biphenyl skeleton, naphthol aromatic resin having at least one of phenylene skeleton or biphenyl skeleton Aralkyl type epoxy resins such as alkyl type epoxy resins, hydroquinone type epoxy resins, biphenyl type epoxy resins, stilbene type epoxy resins, trisphenol methane type epoxy resins, trisphenol propane Type epoxy resin, alkyl modified trisphenol methane type epoxy resin, epoxy resin containing triazine nucleus, dicyclopentadiene modified phenol type epoxy resin, naphthol type epoxy resin, naphthalene type epoxy resin Resins, alicyclic epoxy resins such as vinylcyclohexene dioxide, dicyclopentadiene oxide, alicyclic diepoxy-adipate, alkanediol diglycidyl Ether, poly(alkylene glycol) diglycidyl ether, enediol diglycidyl ether are equal to difunctional aliphatic epoxy compounds with two epoxy groups in the molecule, etc. For example, the epoxy resin may include bisphenol type epoxy resin, aromatic glycidylamine type epoxy resin, and naphthalene type epoxy resin.

所述環氧樹脂中,就提高耐熱性、機械特性及耐濕性的觀點而言,較佳為包含縮水甘油基結構或縮水甘油胺結構鍵結於芳香族環上而成的結構的環氧樹脂。Among the above-mentioned epoxy resins, from the viewpoint of improving heat resistance, mechanical properties, and moisture resistance, epoxy resins containing a glycidyl structure or a structure in which a glycidyl amine structure is bonded to an aromatic ring are preferable. resin.

就使底部填充材於常溫下為液體的觀點而言,較佳為以使環氧樹脂整體於常溫下成為液體的方式選擇環氧樹脂。即,於僅包含一種環氧樹脂的情況下,較佳為該環氧樹脂於常溫下為液體。於為兩種以上的環氧樹脂的組合的情況下,可為兩種以上的環氧樹脂於常溫下均為液狀,亦可為一部分是常溫下為固體的環氧樹脂,且混合兩種以上的環氧樹脂時於常溫下成為液體的組合。 於使用常溫下為固體的環氧樹脂作為環氧樹脂的情況下,就流動性的觀點而言,相對於環氧樹脂整體,固體的環氧樹脂的含有率較佳為20質量%以下。 From the viewpoint of making the underfill material liquid at normal temperature, it is preferable to select the epoxy resin so that the entire epoxy resin becomes liquid at normal temperature. That is, when only one kind of epoxy resin is included, it is preferable that the epoxy resin is liquid at normal temperature. In the case of a combination of two or more epoxy resins, two or more epoxy resins may be liquid at room temperature, or part of them may be solid epoxy resins at room temperature, and two kinds of epoxy resins may be mixed. The above epoxy resins are combinations that become liquid at room temperature. When using a solid epoxy resin at normal temperature as the epoxy resin, from the viewpoint of fluidity, the content of the solid epoxy resin is preferably 20% by mass or less with respect to the entire epoxy resin.

於使用兩種以上的環氧樹脂的情況下,可預先將環氧樹脂彼此混合,然後與其他成分混合,亦可不將環氧樹脂彼此混合而與其他成分混合。In the case of using two or more epoxy resins, the epoxy resins may be mixed with other components beforehand, or may be mixed with other components without mixing the epoxy resins with each other.

環氧樹脂於底部填充材中的含有率並無特別限定,相對於底部填充材整體,較佳為5質量%~60質量%,更佳為5質量%~50質量%。若環氧樹脂的含有率為所述範圍內,則有硬化時的反應性、硬化後的耐熱性及機械強度、以及密封時的流動性優異的傾向。The content of the epoxy resin in the underfill is not particularly limited, but is preferably 5% by mass to 60% by mass, more preferably 5% by mass to 50% by mass, based on the entire underfill material. When the content of the epoxy resin is within the above range, the reactivity during curing, the heat resistance and mechanical strength after curing, and the fluidity during sealing tend to be excellent.

環氧樹脂較佳為包含雙酚型環氧樹脂與芳香族縮水甘油胺型環氧樹脂。就充分發揮該些環氧樹脂的性能的觀點而言,相對於環氧樹脂整體,雙酚型環氧樹脂及芳香族縮水甘油胺型環氧樹脂的合計含有率例如較佳為20質量%以上,更佳為30質量%以上,進而佳為50質量%以上,特佳為80質量%以上。相對於環氧樹脂整體,雙酚型環氧樹脂及芳香族縮水甘油胺型環氧樹脂的合計含有率例如可為90質量%以下。The epoxy resin preferably includes bisphenol epoxy resin and aromatic glycidylamine epoxy resin. From the viewpoint of fully exhibiting the performance of these epoxy resins, the total content of the bisphenol-type epoxy resin and the aromatic glycidylamine-type epoxy resin is preferably, for example, 20% by mass or more with respect to the entire epoxy resin. , more preferably at least 30% by mass, more preferably at least 50% by mass, particularly preferably at least 80% by mass. The total content of the bisphenol-type epoxy resin and the aromatic glycidylamine-type epoxy resin may be, for example, 90% by mass or less with respect to the entire epoxy resin.

於併用雙酚型環氧樹脂與芳香族縮水甘油胺型環氧樹脂作為環氧樹脂的情況下,其質量比(雙酚型環氧樹脂:芳香族縮水甘油胺型環氧樹脂)並無特別限制。就耐熱性、接著性及流動性的觀點而言,雙酚型環氧樹脂:芳香族縮水甘油胺型環氧樹脂例如較佳為20:80~95:5,更佳為40:60~90:10,進而佳為60:40~80:20。When bisphenol-type epoxy resin and aromatic glycidylamine-type epoxy resin are used together as the epoxy resin, there is no particular mass ratio (bisphenol-type epoxy resin: aromatic glycidylamine-type epoxy resin) limit. From the viewpoint of heat resistance, adhesiveness, and fluidity, bisphenol-type epoxy resin: aromatic glycidylamine-type epoxy resin is preferably 20:80-95:5, more preferably 40:60-90, for example. : 10, and preferably 60: 40 ~ 80: 20.

環氧樹脂的環氧當量(分子量/環氧基數)並無特別限制,例如較佳為100 g/eq~1000 g/eq,更佳為150 g/eq~500 g/eq。The epoxy equivalent (molecular weight/number of epoxy groups) of the epoxy resin is not particularly limited, for example, it is preferably 100 g/eq-1000 g/eq, more preferably 150 g/eq-500 g/eq.

環氧樹脂的環氧當量設為利用依據日本工業標準(Japanese Industrial Standards,JIS)K 7236:2009的方法進行測定所得的值。The epoxy equivalent of the epoxy resin was set to a value measured by a method based on Japanese Industrial Standards (Japanese Industrial Standards, JIS) K 7236:2009.

環氧樹脂的純度較佳為高。具體而言,特別是水解性氯量由於對IC等元件上的鋁配線的腐蝕有影響,因此較佳為少。就獲得耐濕性優異的底部填充材的觀點而言,例如較佳為500 ppm以下。The purity of the epoxy resin is preferably high. Specifically, since the amount of hydrolyzable chlorine affects the corrosion of aluminum wiring on elements such as ICs, it is preferable that the amount is small. From the viewpoint of obtaining an underfill material excellent in moisture resistance, for example, it is preferably 500 ppm or less.

此處,所謂水解性氯量是將如下值設為尺度者:將試樣的環氧樹脂1 g溶解於二噁烷30 mL中,添加1 mol/L-KOH(氫氧化鉀)甲醇溶液5 mL並回流30分鐘後,藉由電位差滴定而求出的值。Here, the amount of hydrolyzable chlorine is based on the following value: Dissolve 1 g of epoxy resin in the sample in 30 mL of dioxane, add 1 mol/L-KOH (potassium hydroxide) methanol solution 5 mL and refluxed for 30 minutes, the value obtained by potentiometric titration.

(硬化劑) 本揭示的底部填充材含有硬化劑。 硬化劑的種類並無特別限制,可自作為底部填充材的材料而通常使用的材料中選擇。硬化劑可單獨使用一種,亦可併用兩種以上。作為硬化劑,可列舉:胺系硬化劑、酚系硬化劑、酸酐系硬化劑等。該些中,作為硬化劑,較佳為胺系硬化劑。 (hardener) The underfill of the present disclosure contains a curing agent. The type of curing agent is not particularly limited, and may be selected from materials generally used as underfill materials. A hardening agent may be used individually by 1 type, and may use 2 or more types together. Examples of the curing agent include amine-based curing agents, phenol-based curing agents, acid anhydride-based curing agents, and the like. Among these, as a curing agent, an amine-based curing agent is preferable.

胺系硬化劑並無特別限制,例如較佳為於一分子中包含2個以上的選自由一級胺基及二級胺基所組成的群組中的一種以上(以下,亦簡稱為「胺基」)的化合物,更佳為於一分子中具有2個~4個胺基的化合物,進而佳為於一分子中具有2個胺基的化合物(二胺化合物)。The amine-based hardener is not particularly limited. For example, it is preferable to include two or more ones selected from the group consisting of primary amine groups and secondary amine groups (hereinafter, also referred to as "amine groups") in one molecule. ”), more preferably a compound having 2 to 4 amine groups in one molecule, and still more preferably a compound (diamine compound) having 2 amine groups in one molecule.

就使底部填充材於常溫下為液體的觀點而言,較佳為以使硬化劑整體於常溫下成為液體的方式選擇硬化劑。即,於僅包含一種硬化劑的情況下,較佳為該硬化劑於常溫下為液體。於為兩種以上的硬化劑的組合的情況下,可為兩種以上的硬化劑於常溫下均為液狀,亦可為一部分是常溫下為固體的硬化劑,且混合兩種以上的硬化劑時於常溫下成為液體的組合。 於使用常溫下為固體的硬化劑作為硬化劑的情況下,就流動性的觀點而言,相對於硬化劑整體,固體的硬化劑的含有率較佳為20質量%以下。 From the viewpoint of making the underfill liquid at normal temperature, it is preferable to select the curing agent so that the entire curing agent becomes liquid at normal temperature. That is, when only one kind of curing agent is included, it is preferable that the curing agent is liquid at normal temperature. In the case of a combination of two or more curing agents, two or more curing agents may be liquid at room temperature, or a part of the curing agent may be solid at room temperature, and two or more curing agents may be mixed. A combination that becomes liquid at room temperature when dosed. When using a solid curing agent at normal temperature as the curing agent, from the viewpoint of fluidity, the content of the solid curing agent is preferably 20% by mass or less relative to the entire curing agent.

具有胺基的化合物較佳為具有芳香環的化合物(芳香族胺化合物),更佳為常溫下為液狀的芳香族胺化合物,進而佳為於常溫下為液狀且於一分子中具有2個胺基的芳香族胺化合物。The compound having an amine group is preferably a compound having an aromatic ring (aromatic amine compound), more preferably an aromatic amine compound that is liquid at normal temperature, further preferably liquid at normal temperature and has 2 An aromatic amine compound with an amine group.

作為常溫下為液狀的芳香族胺化合物,可列舉:3,5-二乙基甲苯-2,4-二胺、3,5-二乙基甲苯-2,6-二胺等二乙基甲苯二胺;1,3,5-三乙基-2,6-二胺基苯等三乙基二胺基苯;3,3'-二乙基-4,4'-二胺基二苯基甲烷、3,5,3',5'-四甲基-4,4'-二胺基二苯基甲烷等二胺基二苯基甲烷等。Examples of aromatic amine compounds that are liquid at room temperature include: Toluenediamine; 1,3,5-triethyl-2,6-diaminobenzene and other triethyldiaminobenzenes; 3,3'-diethyl-4,4'-diaminodiphenyl diaminodiphenylmethane, 3,5,3',5'-tetramethyl-4,4'-diaminodiphenylmethane, etc.

所述化合物中,就保存穩定性的觀點而言,例如較佳為二胺基二苯基甲烷及二乙基甲苯二胺。於使用二胺基二苯基甲烷及二乙基甲苯二胺的至少一者作為硬化劑的情況下,相對於硬化劑整體,其合計含有率例如較佳為50質量%以上,更佳為70質量%以上,進而佳為80質量%以上。所述合計含有率的上限並無特別限定,例如,只要相對於硬化劑整體而為100質量%以下即可。Among these compounds, from the viewpoint of storage stability, for example, diaminodiphenylmethane and diethyltoluenediamine are preferable. When at least one of diaminodiphenylmethane and diethyltoluenediamine is used as a curing agent, the total content of the curing agent is preferably, for example, 50% by mass or more, more preferably 70% by mass, based on the entire curing agent. % by mass or more, and preferably more than 80% by mass. The upper limit of the total content is not particularly limited, for example, as long as it is 100% by mass or less based on the entire curing agent.

於使用常溫下為液狀的芳香族胺化合物作為硬化劑的情況下,就充分發揮其性能的觀點而言,相對於硬化劑整體,其含有率較佳為50質量%以上,更佳為70質量%以上,進而佳為80質量%以上。所述含有率的上限並無特別限定,只要相對於硬化劑整體而為100質量%以下即可。When using an aromatic amine compound that is liquid at room temperature as a curing agent, the content is preferably at least 50% by mass, more preferably 70% by mass, based on the entire curing agent, from the viewpoint of fully exhibiting its performance. % by mass or more, and preferably more than 80% by mass. The upper limit of the content is not particularly limited as long as it is 100% by mass or less based on the entire curing agent.

於使用芳香族胺化合物作為硬化劑的情況下,硬化劑的活性氫當量並無特別限制。就進一步抑制滲漏的產生的觀點而言,例如較佳為10 g/mol~200 g/mol,更佳為20 g/mol~100 g/mol,進而佳為30 g/mol~70 g/mol。When an aromatic amine compound is used as the curing agent, the active hydrogen equivalent of the curing agent is not particularly limited. From the viewpoint of further suppressing the occurrence of leakage, for example, preferably 10 g/mol to 200 g/mol, more preferably 20 g/mol to 100 g/mol, further preferably 30 g/mol to 70 g/mol mol.

硬化劑的活性氫當量是指基於依據JIS K7237:1995而測定的胺價來算出的值。The active hydrogen equivalent of a hardening|curing agent means the value calculated based on the amine value measured based on JISK7237:1995.

底部填充材中的環氧樹脂與硬化劑的當量比(環氧樹脂的環氧基的莫耳數/硬化劑的活性氫的莫耳數)並無特別限制。就將各自的未反應成分抑制得少的觀點而言,環氧樹脂的環氧基的莫耳數/硬化劑的活性氫的莫耳數例如較佳為0.7~1.6,更佳為0.8~1.4,進而佳為0.9~1.2。The equivalent ratio of the epoxy resin to the hardener in the underfill material (the number of moles of epoxy groups in the epoxy resin/the number of moles of active hydrogen in the hardener) is not particularly limited. The number of moles of epoxy groups in the epoxy resin/the number of moles of active hydrogen in the hardener is, for example, preferably from 0.7 to 1.6, more preferably from 0.8 to 1.4, from the viewpoint of suppressing the respective unreacted components. , and more preferably 0.9 to 1.2.

(無機填充材) 本揭示的底部填充材含有無機填充材。 無機填充材的種類並無特別限制。具體而言,可列舉:熔融二氧化矽、晶體二氧化矽、玻璃、氧化鋁、碳酸鈣、矽酸鋯、矽酸鈣、氮化矽、氮化鋁、氮化硼、氧化鎂、矽酸鈣、碳酸鈣、鈦酸鉀、碳化矽、氧化鈹、氧化鋯、鋯石、鎂橄欖石(fosterite)、塊滑石(steatite)、尖晶石、富鋁紅柱石、氧化鈦、滑石、黏土、雲母等無機材料。亦可使用具有阻燃效果的無機填充材。作為具有阻燃效果的無機填充材,可列舉:氫氧化鋁、氫氧化鎂、鎂與鋅的複合氫氧化物等複合金屬氫氧化物、硼酸鋅等。其中,就減低線膨脹係數的觀點而言,較佳為熔融二氧化矽,就高熱傳導性的觀點而言,較佳為氧化鋁。無機填充材可單獨使用一種,亦可併用兩種以上。作為無機填充材的狀態,可列舉:粉末、將粉末球形化而成的珠粒、纖維等。 (inorganic filler) The underfill of the present disclosure contains an inorganic filler. The type of inorganic filler is not particularly limited. Specifically, fused silica, crystalline silica, glass, alumina, calcium carbonate, zirconium silicate, calcium silicate, silicon nitride, aluminum nitride, boron nitride, magnesium oxide, silicic acid Calcium, calcium carbonate, potassium titanate, silicon carbide, beryllium oxide, zirconia, zircon, forsterite, steatite, spinel, mullite, titanium oxide, talc, clay, Inorganic materials such as mica. Inorganic fillers having a flame retardant effect can also be used. Examples of the inorganic filler having a flame-retardant effect include composite metal hydroxides such as aluminum hydroxide, magnesium hydroxide, and composite hydroxides of magnesium and zinc, zinc borate, and the like. Among these, fused silica is preferable from the viewpoint of reducing the coefficient of linear expansion, and alumina is preferable from the viewpoint of high thermal conductivity. An inorganic filler may be used alone or in combination of two or more. As a state of an inorganic filler, powder, the bead which spheroidized the powder, a fiber, etc. are mentioned.

無機填充材於底部填充材中的含有率並無特別限定,就硬化物的熱膨脹係數及底部填充材的流動性的觀點而言,相對於底部填充材整體,較佳為40質量%~70質量%,更佳為50質量%~65質量%。The content of the inorganic filler in the underfill is not particularly limited, but is preferably 40% by mass to 70% by mass relative to the entire underfill from the viewpoint of the thermal expansion coefficient of the cured product and the fluidity of the underfill. %, more preferably 50 mass % to 65 mass %.

無機填充材可包含二氧化矽粒子。就底部填充材的流動性及填充性的觀點而言,二氧化矽粒子的平均粒子徑較佳為0.2 μm~5 μm,更佳為0.2 μm~3 μm,進而佳為0.3 μm~1 μm,特佳為0.4 μm~0.8 μm。The inorganic filler may contain silica particles. From the viewpoint of fluidity and filling properties of the underfill, the average particle size of the silica particles is preferably 0.2 μm to 5 μm, more preferably 0.2 μm to 3 μm, and still more preferably 0.3 μm to 1 μm. Most preferably, it is 0.4 μm to 0.8 μm.

無機填充材亦可包含平均粒子徑更大的大徑二氧化矽粒子與平均粒子徑更小的小徑二氧化矽粒子。大徑二氧化矽粒子的平均粒子徑的較佳範圍與所述二氧化矽粒子的平均粒子徑的較佳範圍相同。The inorganic filler may also include large-diameter silica particles with a larger average particle diameter and small-diameter silica particles with a smaller average particle diameter. The preferable range of the average particle diameter of the large-diameter silica particles is the same as the preferable range of the average particle diameter of the above-mentioned silica particles.

小徑二氧化矽粒子的平均粒子徑較佳為7 nm~100 nm,更佳為9 nm~75 nm。若小徑二氧化矽粒子的平均粒子徑為7 nm以上,則有底部填充材的黏度不易增大,不易產生流動性的惡化的傾向。若小徑二氧化矽粒子的平均粒子徑為100 nm以下,則有可降低底部填充材的黏度的傾向。The average particle diameter of the small-diameter silica particles is preferably from 7 nm to 100 nm, more preferably from 9 nm to 75 nm. When the average particle diameter of the small-diameter silica particles is 7 nm or more, the viscosity of the underfill material tends to be less likely to increase, and the fluidity tends to be less likely to deteriorate. When the average particle diameter of the small-diameter silica particles is 100 nm or less, the viscosity of the underfill material tends to be reduced.

二氧化矽粒子或大徑二氧化矽粒子於無機填充材中所佔的比例可為70質量%以上,亦可為75質量%以上。另外,二氧化矽粒子或大徑二氧化矽粒子於無機填充材中所佔的比例若為100質量%以下,則並無特別限定,可為99.7質量%以下,亦可為99.5質量%以下。The proportion of silica particles or large-diameter silica particles in the inorganic filler may be 70% by mass or more, or may be 75% by mass or more. Also, the proportion of silica particles or large-diameter silica particles in the inorganic filler is not particularly limited as long as it is 100% by mass or less, and may be 99.7% by mass or less, or 99.5% by mass or less.

小徑二氧化矽粒子於無機填充材中所佔的比例可為0質量%,亦可為0.5質量%以上,亦可為10質量%以上。另外,小徑二氧化矽粒子於無機填充材中所佔的比例可為30質量%以下,亦可為25質量%以下。The proportion of the small-diameter silica particles in the inorganic filler may be 0% by mass, 0.5% by mass or more, or 10% by mass or more. In addition, the proportion of small-diameter silica particles in the inorganic filler may be 30% by mass or less, or may be 25% by mass or less.

無機填充材的平均粒子徑可藉由以下的方法來測定。 於對平均粒子徑為20 nm以上的無機填充材進行測定的情況下,向溶媒(例如,純水)中於1質量%~5質量%的範圍內添加測定對象的無機填充材並且添加1質量%~8質量%的界面活性劑,利用110 W的超音波清洗機振動30秒~5分鐘,將無機填充材分散。將分散液的約3 mL左右注入至測定用槽(cell)中並於25℃下進行測定。關於測定裝置,使用雷射繞射式粒度分佈計(堀場製作所股份有限公司製造、LA920)來測定體積基準的粒度分佈。平均粒子徑是作為於體積基準的粒度分佈中自小徑側起的累積成為50%時的粒子徑(D50%)而求出。 於對平均粒子徑未滿20 nm的無機填充材進行測定的情況下,可使用電子顯微鏡等將無機填充材圖像化,測定各個粒子的粒子徑,將藉由任意選擇的100個粒子的粒子徑的算術平均而獲得的粒子徑設為無機填充材的平均粒子徑。 於測定試樣為硬化物的情況下,例如可藉由所述方法來測定利用馬弗爐等以800℃以上的高溫對硬化物進行處理後作為殘渣獲得的灰分。 The average particle diameter of an inorganic filler can be measured by the following method. When measuring an inorganic filler with an average particle diameter of 20 nm or more, add the inorganic filler to be measured to a solvent (for example, pure water) in the range of 1 mass % to 5 mass % and add 1 mass % % to 8% by mass of surfactant, use a 110 W ultrasonic cleaner to vibrate for 30 seconds to 5 minutes to disperse the inorganic filler. About 3 mL of the dispersion liquid was poured into a measurement cell (cell), and the measurement was performed at 25°C. As for the measuring device, the volume-based particle size distribution was measured using a laser diffraction particle size distribution meter (manufactured by Horiba Seisakusho Co., Ltd., LA920). The average particle diameter is obtained as the particle diameter (D50%) when the accumulation from the small diameter side becomes 50% in the volume-based particle size distribution. When measuring an inorganic filler with an average particle diameter of less than 20 nm, the inorganic filler can be imaged using an electron microscope or the like, the particle diameter of each particle can be measured, and the particle size of 100 particles selected arbitrarily The particle diameter obtained by the arithmetic mean of the diameters was set as the average particle diameter of the inorganic filler. When the measurement sample is a cured product, for example, the ash obtained as a residue after the cured product is processed at a high temperature of 800° C. or higher in a muffle furnace or the like can be measured by the above method.

於使用大徑二氧化矽粒子及小徑二氧化矽粒子作為無機填充材的情況下,小徑二氧化矽粒子的平均粒子徑與大徑二氧化矽粒子的平均粒子徑的比(大徑二氧化矽粒子的平均粒子徑/小徑二氧化矽粒子的平均粒子徑)較佳為7~120,更佳為10~110,進而佳為20~100。In the case of using large-diameter silica particles and small-diameter silica particles as the inorganic filler, the ratio of the average particle diameter of the small-diameter silica particles to the average particle diameter of the large-diameter silica particles (large diameter 2 The average particle diameter of silica particles/average particle diameter of small-diameter silica particles) is preferably 7-120, more preferably 10-110, and still more preferably 20-100.

於使用大徑二氧化矽粒子作為無機填充材的情況下,求出小徑二氧化矽粒子及大徑二氧化矽粒子於無機填充材中所佔的比例的方法並無特別限定。例如,可求出無機填充材的體積基準的粒度分佈(頻度分佈),於相當於小徑二氧化矽粒子的波峰與相當於大徑二氧化矽粒子的波峰的谷間將兩者切開,利用所切開的各範圍中所含的粒子的體積除以無機填充材的總和的體積,藉此求出小徑二氧化矽粒子及大徑二氧化矽粒子的比例。於底部填充材的組成明確的情況下,可根據底部填充材的組成來求出小徑二氧化矽粒子及大徑二氧化矽粒子於無機填充材中所佔的比例。再者,算出方法並不限定於所述方法。In the case of using large-diameter silica particles as the inorganic filler, there is no particular limitation on the method of obtaining the proportion of small-diameter silica particles and large-diameter silica particles in the inorganic filler. For example, the volume-based particle size distribution (frequency distribution) of the inorganic filler can be obtained, and the peaks corresponding to the small-diameter silica particles and the valleys corresponding to the peaks of the large-diameter silica particles can be cut. The ratio of the small-diameter silica particles to the large-diameter silica particles was obtained by dividing the volume of the particles contained in each cut range by the total volume of the inorganic fillers. When the composition of the underfill material is clear, the ratio of the small-diameter silica particles and the large-diameter silica particles in the inorganic filler can be obtained from the composition of the underfill material. In addition, the calculation method is not limited to the above-mentioned method.

(矽酮化合物) 本揭示的底部填充材包含含有聚甘油改質矽酮化合物及聚酯改質矽酮化合物的至少一者(特定的改質矽酮化合物)的矽酮化合物。 特定的改質矽酮化合物的種類並無特別限制,可單獨使用一種,亦可併用兩種以上。例如,可單獨使用一種聚甘油改質矽酮化合物或聚酯改質矽酮化合物,亦可併用兩種以上,亦可將一種以上的聚甘油改質矽酮化合物及一種以上的聚酯改質矽酮化合物組合。 於本揭示中,所謂「矽酮化合物」是指具有利用矽氧烷鍵而形成的主鏈的化合物。 矽酮化合物及特定的改質矽酮化合物較佳為於25℃下為液狀的矽酮化合物。 再者,於本揭示中,經聚甘油改質及聚酯改質的矽酮化合物分類為聚甘油改質矽酮化合物。 (silicone compound) The underfill of the present disclosure includes a silicone compound containing at least one of a polyglycerol modified silicone compound and a polyester modified silicone compound (a specific modified silicone compound). The type of the specific modified silicone compound is not particularly limited, and one type may be used alone, or two or more types may be used in combination. For example, one polyglycerol modified silicone compound or polyester modified silicone compound may be used alone, two or more types may be used in combination, or more than one polyglycerol modified silicone compound and one or more polyester modified silicone compounds may be used. Silicone compound combination. In the present disclosure, the term "silicone compound" refers to a compound having a main chain formed by a siloxane bond. The silicone compound and the specific modified silicone compound are preferably liquid silicone compounds at 25°C. Furthermore, in this disclosure, polyglycerol-modified and polyester-modified silicone compounds are classified as polyglycerol-modified silicone compounds.

就適宜地抑制滲漏產生的觀點而言,相對於底部填充材整體,矽酮化合物於底部填充材中的含有率較佳為0.0001質量%~1質量%,進而,就底部填充材向半導體元件等電子零件與配線基板的間隙的填充速度的觀點而言,更佳為0.001質量%~0.25質量%,進而佳為0.005質量%~0.15質量%。From the viewpoint of appropriately suppressing leakage, the content of the silicone compound in the underfill material is preferably 0.0001% by mass to 1% by mass relative to the entire underfill material. From the viewpoint of the filling rate of the gap between the electronic component and the wiring board, etc., it is more preferably from 0.001 mass % to 0.25 mass %, and more preferably from 0.005 mass % to 0.15 mass %.

矽酮化合物可僅包含聚甘油改質矽酮化合物及聚酯改質矽酮化合物的其中一者,亦可包含它們兩者。矽酮化合物較佳為包含聚甘油改質矽酮化合物。The silicone compound may contain only one of the polyglycerin-modified silicone compound and the polyester-modified silicone compound, or may contain both of them. The silicone compound preferably contains a polyglycerol-modified silicone compound.

聚甘油改質矽酮化合物若為具有多個源自甘油的結構單元的矽酮化合物,則並無特別限定,較佳為於主鏈及側鏈的至少一者上具有多個源自甘油的結構單元的矽酮化合物,更佳為於主鏈及側鏈的至少一者上具有多個源自甘油的結構單元的聚二甲基矽氧烷衍生物。The polyglycerin-modified silicone compound is not particularly limited as long as it is a silicone compound having a plurality of structural units derived from glycerol, but preferably has a plurality of structural units derived from glycerol on at least one of the main chain and side chain. The silicone compound of the structural unit is more preferably a polydimethylsiloxane derivative having a plurality of structural units derived from glycerin on at least one of the main chain and the side chain.

聚甘油改質矽酮化合物可為經烷基改質的聚二甲基矽氧烷衍生物,亦可為未經烷基改質的聚二甲基矽氧烷衍生物。就適宜地抑制滲漏產生的觀點而言,聚甘油改質矽酮化合物較佳為未經烷基改質的聚二甲基矽氧烷衍生物。The polyglycerol-modified silicone compound can be an alkyl-modified polydimethylsiloxane derivative, or a non-alkyl-modified polydimethylsiloxane derivative. The polyglycerol-modified silicone compound is preferably a polydimethylsiloxane derivative that has not been modified with an alkyl group, from the viewpoint of suitably suppressing the occurrence of leakage.

聚酯改質矽酮化合物若為具有多個酯基(-C(=O)-O-)的矽酮化合物,則並無特別限定,較佳為於主鏈及側鏈的至少一者上具有多個酯基的矽酮化合物,更佳為於主鏈及側鏈的至少一者上具有多個酯基的聚二甲基矽氧烷衍生物。The polyester modified silicone compound is not particularly limited if it is a silicone compound having multiple ester groups (-C(=O)-O-), but it is preferably on at least one of the main chain and the side chain The silicone compound having a plurality of ester groups is more preferably a polydimethylsiloxane derivative having a plurality of ester groups in at least one of the main chain and the side chain.

於矽酮化合物包含聚酯改質矽酮化合物的情況下,聚酯改質矽酮化合物較佳為包含聚醚-聚酯改質矽酮化合物。作為聚醚-聚酯改質矽酮化合物,例如可列舉於主鏈及側鏈的至少一者上具有酯基及源自烷二醇的結構單元的矽酮化合物。作為烷二醇,例如可列舉:乙二醇、聚丙二醇及該些的組合。When the silicone compound includes a polyester modified silicone compound, the polyester modified silicone compound preferably includes a polyether-polyester modified silicone compound. As a polyether-polyester modified silicone compound, the silicone compound which has an ester group and the structural unit derived from an alkanediol in at least one of a main chain and a side chain is mentioned, for example. As alkanediol, ethylene glycol, polypropylene glycol, and these combinations are mentioned, for example.

聚酯改質矽酮化合物可為進行了聚酯改質以外的改質(例如,醚改質)的聚二甲基矽氧烷衍生物,亦可為未進行聚酯改質以外的改質的聚二甲基矽氧烷衍生物。The polyester-modified silicone compound may be a polydimethylsiloxane derivative modified other than polyester modified (e.g., ether modified), or may not be modified other than polyester modified polydimethylsiloxane derivatives.

作為特定的改質矽酮化合物,可為下述通式(1)所表示的化合物。As a specific modified silicone compound, a compound represented by the following general formula (1) may be used.

[化1]

Figure 02_image001
[chemical 1]
Figure 02_image001

通式(1)中,R 1分別獨立地表示烴基、具有多個源自甘油的結構單元的有機基或具有多個酯基的有機基。 於通式(1)所表示的化合物為聚甘油改質矽酮化合物的情況下,R 1的至少一個為具有多個源自甘油的結構單元的有機基。 於通式(1)所表示的化合物為聚酯改質矽酮化合物的情況下,R 1的至少一個為具有多個酯基的有機基。 l為0~100。 In the general formula (1), R 1 each independently represent a hydrocarbon group, an organic group having a plurality of structural units derived from glycerin, or an organic group having a plurality of ester groups. When the compound represented by the general formula (1) is a polyglycerol-modified silicone compound, at least one of R 1 is an organic group having a plurality of structural units derived from glycerin. When the compound represented by the general formula (1) is a polyester-modified silicone compound, at least one of R 1 is an organic group having a plurality of ester groups. l is 0-100.

於通式(1)中,作為R 1所表示的烴基,可列舉:烷基、烯基等脂肪族烴基。脂肪族烴基的碳數並無特別限制,就獲取容易性的觀點而言,例如較佳為1~10,更佳為1~5,進而佳為1~3。烷基可為直鏈狀,亦可為環狀,亦可為分支狀。具體而言,可列舉:甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、戊基、己基、庚基、辛基、環己基等。作為烯基,可列舉乙烯基、烯丙基等。該些中,就獲取容易性的觀點而言,較佳為甲基或乙基,更佳為甲基。 另外,可為R 1的一部分為甲基以外的烷基,剩餘的R 1為甲基,亦可為所有的R 1為甲基。 In the general formula (1), examples of the hydrocarbon group represented by R 1 include aliphatic hydrocarbon groups such as alkyl groups and alkenyl groups. The carbon number of the aliphatic hydrocarbon group is not particularly limited, and is, for example, preferably 1-10, more preferably 1-5, and still more preferably 1-3 from the viewpoint of ease of acquisition. The alkyl group may be linear, cyclic, or branched. Specifically, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, second-butyl, third-butyl, pentyl, hexyl, heptyl, octyl, Cyclohexyl, etc. Examples of the alkenyl group include a vinyl group, an allyl group, and the like. Among these, a methyl group or an ethyl group is preferable, and a methyl group is more preferable from a viewpoint of easy acquisition. In addition, a part of R 1 may be an alkyl group other than a methyl group, and the remaining R 1 may be a methyl group, or all of the R 1 may be a methyl group.

作為源自甘油的結構單元,例如可為以下的式(2)所表示的結構單元。聚甘油改質矽酮化合物亦可具有多個式(2)所表示的結構單元鍵結而成的結構。As a structural unit derived from glycerin, the structural unit represented by following formula (2) is mentioned, for example. The polyglycerol-modified silicone compound may also have a structure in which a plurality of structural units represented by formula (2) are bonded.

[化2]

Figure 02_image003
[Chem 2]
Figure 02_image003

作為具有多個源自甘油的結構單元的矽酮化合物的具體例,可列舉以下的包含式(3)所表示的結構的化合物及包含式(4)所表示的結構的化合物。式(3)中,n是指2以上的數。 [化3]

Figure 02_image005
[化4]
Figure 02_image007
Specific examples of the silicone compound having a plurality of glycerin-derived structural units include the following compounds having a structure represented by formula (3) and compounds having a structure represented by formula (4). In formula (3), n means a number of 2 or more. [Chem 3]
Figure 02_image005
[chemical 4]
Figure 02_image007

特定的改質矽酮化合物的重量平均分子量並無特別限制。就進一步抑制滲漏的產生的觀點而言,例如較佳為300~10000,更佳為500~8000,進而佳為1000~6000。 於本揭示中,重量平均分子量為藉由如下方式而確定的值:使用凝膠滲透層析法並使用標準聚苯乙烯的校準曲線進行換算。 The weight average molecular weight of the specific modified silicone compound is not particularly limited. From the viewpoint of further suppressing the occurrence of leakage, for example, 300-10000 is preferable, 500-8000 is more preferable, and 1000-6000 is still more preferable. In the present disclosure, the weight average molecular weight is a value determined by using gel permeation chromatography and converting using a calibration curve of standard polystyrene.

特定的改質矽酮化合物的黏度、較佳為聚甘油改質矽酮化合物於25℃下的黏度並無特別限定,例如較佳為500 mm 2/s~50,000 mm 2/s,更佳為1000 mm 2/s~10,000 mm 2/s,進而佳為2000 mm 2/s~5,000 mm 2/s。 特定的改質矽酮化合物的黏度是指25℃下的動態黏度。本揭示中的黏度是藉由依據JIS K7367-1:2002的方法,使用毛細管黏度計測定的動態黏度的值。 The viscosity of a specific modified silicone compound, preferably the viscosity of a polyglycerol modified silicone compound at 25°C is not particularly limited, for example, it is preferably 500 mm 2 /s to 50,000 mm 2 /s, more preferably 1000 mm 2 /s to 10,000 mm 2 /s, more preferably 2000 mm 2 /s to 5,000 mm 2 /s. The viscosity of a specific modified silicone compound refers to the dynamic viscosity at 25°C. The viscosity in this disclosure is the value of the dynamic viscosity measured using the capillary viscometer by the method based on JISK7367-1:2002.

特定的改質矽酮化合物可使用市售品。作為市售品,可列舉:信越化學工業股份有限公司製造的商品名KF-6100、KF-6104、KF-6105、KF-6106等;日本畢克化學(BYK-Chemie Japan)股份有限公司製造的商品名BYK-370、BYK-375等;花王股份有限公司製造的商品名索福凱亞(Sofcare)GS-G等。A commercial item can be used for the specific modified silicone compound. Examples of commercially available products include trade names KF-6100, KF-6104, KF-6105, and KF-6106 manufactured by Shin-Etsu Chemical Co., Ltd.; manufactured by BYK-Chemie Japan Co., Ltd. The trade names are BYK-370, BYK-375, etc.; the trade names of Kao Co., Ltd. are Sofcare GS-G, etc.

矽酮化合物可包含特定的改質矽酮化合物以外的矽酮化合物,亦可不包含。 特定的改質矽酮化合物以外的矽酮化合物可為未經改質的矽酮化合物,亦可為經改質的矽酮化合物。作為經改質的矽酮化合物,可列舉:聚醚改質矽酮化合物、羧基改質矽酮化合物、胺基改質矽酮化合物等。 The silicone compound may or may not contain silicone compounds other than the specific modified silicone compound. The silicone compound other than the specific modified silicone compound may be an unmodified silicone compound or a modified silicone compound. Examples of modified silicone compounds include polyether-modified silicone compounds, carboxyl-modified silicone compounds, and amino-modified silicone compounds.

相對於矽酮化合物整體,矽酮化合物中所含的特定的改質矽酮化合物的含有率可為70質量%~100質量%,亦可為80質量%~100質量%,亦可為90質量%~100質量%。The content of the specific modified silicone compound contained in the silicone compound may be 70% by mass to 100% by mass, 80% by mass to 100% by mass, or 90% by mass relative to the entire silicone compound. %~100% by mass.

(偶合劑) 本揭示的底部填充材亦可含有偶合劑。 偶合劑起到使底部填充材中的樹脂成分、無機填充材或樹脂成分及電子零件裝置的結構構件之間的接著性牢固的作用。偶合劑並無特別限制,可自作為底部填充材的成分而通常使用的偶合劑中選擇。具體而言,可列舉:具有選自由一級胺基、二級胺基及三級胺基所組成的群組中的一種以上的胺基矽烷、環氧矽烷、巰基矽烷、烷基矽烷、脲基矽烷、乙烯基矽烷等矽烷系化合物;鈦系化合物;鋁螯合物類;鋁/鋯系化合物等。該些中,就填充性的觀點而言,較佳為矽烷系化合物,更佳為環氧矽烷。 (coupling agent) The underfill of the present disclosure may also contain a coupling agent. The coupling agent plays a role of strengthening the adhesiveness between the resin component in the underfill material, the inorganic filler, or the resin component and the structural member of the electronic component device. The coupling agent is not particularly limited, and can be selected from coupling agents generally used as components of the underfill material. Specifically, examples include: aminosilanes, epoxysilanes, mercaptosilanes, alkylsilanes, and ureidosilanes having one or more selected from the group consisting of primary amino groups, secondary amino groups, and tertiary amino groups. Silane-based compounds such as silane and vinyl silane; titanium-based compounds; aluminum chelates; aluminum/zirconium-based compounds, etc. Among these, from the viewpoint of filling properties, silane-based compounds are preferable, and epoxysilane is more preferable.

於底部填充材含有偶合劑的情況下,其含有率並無特別限制。就使樹脂成分與無機填充材的界面接著及樹脂成分與電子零件裝置的結構構件的界面接著牢固的觀點、以及提高填充性的觀點而言,例如,相對於底部填充材整體,較佳為0.05質量%~10質量%,更佳為0.2質量%~5質量%,進而佳為0.4質量%~1質量%。When the underfill material contains a coupling agent, its content is not particularly limited. From the viewpoint of bonding the interface between the resin component and the inorganic filler and the interface between the resin component and the structural member of the electronic component device, and from the viewpoint of improving filling properties, for example, with respect to the entire underfill material, preferably 0.05 % by mass to 10% by mass, more preferably 0.2% by mass to 5% by mass, more preferably 0.4% by mass to 1% by mass.

(其他成分) 底部填充材視需要亦可包含硬化促進劑、離子捕捉劑、抗氧化劑、有機溶劑、脫模劑、著色劑、橡膠粒子、調平劑、消泡劑等作為所述成分以外的其他添加劑。 (other ingredients) The underfill material may contain a curing accelerator, an ion scavenger, an antioxidant, an organic solvent, a mold release agent, a colorant, rubber particles, a leveling agent, an antifoaming agent, and the like as other additives other than the above-mentioned components, if necessary.

-硬化促進劑- 本揭示的底部填充材亦可含有硬化促進劑。硬化促進劑的種類並無特別限制,可使用公知的硬化促進劑。 具體而言,可列舉:1,8-二氮雜-雙環[5.4.0]十一烯-7、1,5-二氮雜-雙環[4.3.0]壬烯、5,6-二丁基胺基-1,8-二氮雜-雙環[5.4.0]十一烯-7等環脒化合物;對環脒化合物加成馬來酸酐、1,4-苯醌、2,5-甲苯醌、1,4-萘醌、2,3-二甲基苯醌、2,6-二甲基苯醌、2,3-二甲氧基-5-甲基-1,4-苯醌、2,3-二甲氧基-1,4-苯醌、苯基-1,4-苯醌等醌化合物、重氮苯基甲烷、酚樹脂等具有π鍵的化合物而成的具有分子內極化的化合物;苄基二甲基胺、三乙醇胺、二甲基胺基乙醇、三(二甲基胺基甲基)苯酚等三級胺化合物;三級胺化合物的衍生物;2-甲基咪唑、2-苯基咪唑、2-苯基-4-甲基咪唑等咪唑化合物;咪唑化合物的衍生物;三丁基膦、甲基二苯基膦、三苯基膦、三(4-甲基苯基)膦、二苯基膦、苯基膦等有機膦化合物;對有機膦化合物加成馬來酸酐、所述醌化合物、重氮苯基甲烷、酚樹脂等具有π鍵的化合物而成的具有分子內極化的磷化合物;四苯基鏻四苯基硼酸鹽、三苯基膦四苯基硼酸鹽、2-乙基-4-甲基咪唑四苯基硼酸鹽、N-甲基嗎啉四苯基硼酸鹽等四苯基硼鹽;四苯基硼鹽的衍生物;三苯基鏻-三苯基硼烷、N-甲基嗎啉四苯基鏻-四苯基硼酸鹽等膦化合物與四苯基硼鹽的加成物等。硬化促進劑可單獨使用一種,亦可併用兩種以上。 -hardening accelerator- The underfill of the present disclosure may also contain a hardening accelerator. The type of hardening accelerator is not particularly limited, and known hardening accelerators can be used. Specifically, 1,8-diaza-bicyclo[5.4.0]undecene-7, 1,5-diaza-bicyclo[4.3.0]nonene, 5,6-dibutyl Amino-1,8-diaza-bicyclo[5.4.0]undecene-7 and other cyclic amidine compounds; addition of maleic anhydride, 1,4-benzoquinone, 2,5-toluene to cyclic amidine compounds quinone, 1,4-naphthoquinone, 2,3-dimethylbenzoquinone, 2,6-dimethylbenzoquinone, 2,3-dimethoxy-5-methyl-1,4-benzoquinone, quinone compounds such as 2,3-dimethoxy-1,4-benzoquinone, phenyl-1,4-benzoquinone, diazophenylmethane, phenolic resin and other compounds with π bonds have intramolecular poles Compounds; tertiary amine compounds such as benzyldimethylamine, triethanolamine, dimethylaminoethanol, tris(dimethylaminomethyl)phenol; derivatives of tertiary amine compounds; 2-methyl Imidazole compounds such as imidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole; derivatives of imidazole compounds; tributylphosphine, methyldiphenylphosphine, triphenylphosphine, tri(4-methane phenylphosphine, diphenylphosphine, phenylphosphine and other organic phosphine compounds; organic phosphine compounds are formed by adding maleic anhydride, the quinone compound, diazophenylmethane, phenol resin and other compounds with π bonds Phosphorus compounds with intramolecular polarization; tetraphenylphosphonium tetraphenyl borate, triphenylphosphine tetraphenyl borate, 2-ethyl-4-methylimidazolium tetraphenyl borate, N-methyl Tetraphenylboron salts such as morpholine tetraphenylborate; derivatives of tetraphenylboron salts; triphenylphosphonium-triphenylborane, N-methylmorpholinetetraphenylphosphonium-tetraphenylborate The adducts of phosphine compounds and tetraphenyl boron salts, etc. A hardening accelerator may be used individually by 1 type, and may use 2 or more types together.

於底部填充材含有硬化促進劑的情況下,相對於環氧樹脂與硬化劑的合計量,硬化促進劑的含有率較佳為0.1質量%~8質量%。When the underfill contains a hardening accelerator, the content of the hardening accelerator is preferably 0.1% by mass to 8% by mass relative to the total amount of the epoxy resin and the hardener.

-離子捕捉劑- 本揭示的底部填充材亦可含有離子捕捉劑。 於本揭示中能夠使用的離子捕捉劑若為於電子零件裝置的製造用途中所使用的底部填充材中通常所使用的離子捕捉劑,則並無特別限制。作為離子捕捉劑,例如可列舉下述通式(VI-1)或下述通式(VI-2)所表示的化合物。 -Ion Scavenger- The underfill of the present disclosure may also contain ion scavengers. The ion scavenger that can be used in the present disclosure is not particularly limited as long as it is an ion scavenger generally used for an underfill material used in the production of an electronic component device. As an ion trapping agent, the compound represented by following general formula (VI-1) or following general formula (VI-2) is mentioned, for example.

Mg 1-aAl a(OH) 2(CO 3) a/2·uH 2O (VI-1) (通式(VI-1)中,a為0<a≦0.5,u為正數) BiO b(OH) c(NO 3) d(VI-2) (通式(VI-2)中,b為0.9≦b≦1.1,c為0.6≦c≦0.8,d為0.2≦d≦0.4) Mg 1-a Al a (OH) 2 (CO 3 ) a/2 uH 2 O (VI-1) (In general formula (VI-1), a is 0<a≦0.5, u is a positive number) BiO b (OH) c (NO 3 ) d (VI-2) (In general formula (VI-2), b is 0.9≦b≦1.1, c is 0.6≦c≦0.8, d is 0.2≦d≦0.4)

離子捕捉劑能夠以市售品的形式獲取。作為通式(VI-1)所表示的化合物,例如能夠以市售品的形式獲取「DHT-4A」(協和化學工業股份有限公司製造、商品名)。另外,作為通式(VI-2)所表示的化合物,例如能夠以市售品的形式獲取「IXE500」(東亞合成股份有限公司製造、商品名)。The ion trapping agent can be obtained as a commercial item. As a compound represented by general formula (VI-1), "DHT-4A" (manufactured by Kyowa Chemical Industry Co., Ltd., brand name) can be obtained as a commercial item, for example. In addition, as a compound represented by the general formula (VI-2), "IXE500" (manufactured by Toagosei Co., Ltd., brand name) can be obtained as a commercial item, for example.

另外,作為所述以外的離子捕捉劑,可列舉含選自鎂、鋁、鈦、鋯、銻等中的元素的氫氧化物等。 離子捕捉劑可單獨使用一種,亦可併用兩種以上。 Moreover, as an ion trapping agent other than the above, the hydroxide etc. containing the element selected from magnesium, aluminum, titanium, zirconium, antimony, etc. are mentioned. One kind of ion trapping agent may be used alone, or two or more kinds may be used in combination.

於底部填充材含有離子捕捉劑的情況下,就實現充分的耐濕可靠性的觀點而言,相對於環氧樹脂100質量份,離子捕捉劑的含量較佳為1質量份以上。就充分發揮其他成分的效果的觀點而言,相對於環氧樹脂100質量份,離子捕捉劑的含量較佳為15質量份以下,更佳為1質量份~10質量份,進而佳為2質量份~5質量份。When the underfill material contains an ion scavenger, the content of the ion scavenger is preferably 1 part by mass or more relative to 100 parts by mass of the epoxy resin from the viewpoint of realizing sufficient moisture resistance reliability. From the viewpoint of fully exerting the effects of other components, the content of the ion-scavenging agent is preferably at most 15 parts by mass, more preferably 1 to 10 parts by mass, and still more preferably 2 parts by mass, relative to 100 parts by mass of the epoxy resin. parts to 5 parts by mass.

另外,離子捕捉劑的平均粒子徑較佳為0.1 μm~3.0 μm,最大粒子徑較佳為10 μm以下。離子捕捉劑的平均粒子徑可與無機填充材的情況同樣地進行測定。In addition, the average particle diameter of the ion trapping agent is preferably 0.1 μm to 3.0 μm, and the maximum particle diameter is preferably 10 μm or less. The average particle diameter of the ion scavenger can be measured similarly to the case of the inorganic filler.

-抗氧化劑- 本揭示的底部填充材亦可包含抗氧化劑。作為抗氧化劑,可使用先前公知的抗氧化劑。 關於酚化合物系抗氧化劑,作為於酚核的鄰位上具有至少一個烷基的化合物,可列舉:2,6-二-第三丁基-4-甲基苯酚、正十八烷基-3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯、2,2'-亞甲基雙-(4-甲基-6-第三丁基苯酚)、3,9-雙[2-〔3-(3-第三丁基-4-羥基-5-甲基苯基)丙醯氧基〕-1,1-二甲基乙基]-2,4,8,10-四氧雜螺[5.5]十一烷、4,4'-亞丁基雙-(6-第三丁基-3-甲基苯酚)、4,4'-硫代雙(6-第三丁基-3-甲基苯酚)、四[亞甲基-3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]甲烷、2,2-硫代-二伸乙基雙[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、N,N'-六亞甲基雙[3-(3,5-二-第三丁基-4-羥基苯基)丙醯胺]、異辛基-3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯、1,3,5-三甲基-2,4,6-三(3,5-二-第三丁基-4-羥基苄基)苯、4,6-雙(十二烷硫基甲基)-鄰甲酚、雙[3,5-二-第三丁基-4-羥基苄基(乙氧基)亞膦酸酯]鈣、2,4-雙(辛硫基甲基)-6-甲基苯酚、1,6-己二醇-雙[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、6-[3-(3-第三丁基-4-羥基-5-甲基苯基)丙氧基]-2,4,8,10-四-第三丁基二苯並[d,f][1,3,2]二氧雜磷環庚烷、2-第三丁基-6-(3-第三丁基-2-羥基-5-甲基苄基)-4-甲基苯基丙烯酸酯、2-[1-(2-羥基-3,5-二-第三戊基苯基)乙基]-4,6-二-第三戊基苯基丙烯酸酯、2,2'-亞甲基雙-(4-乙基-6-第三丁基苯酚)、2,6-二-第三丁基-4-乙基苯酚、1,1,3-三(2-甲基-4-羥基-5-第三丁基苯基)丁烷、三乙二醇-雙[3-(3-第三丁基-4-羥基-5-甲基苯基)丙酸酯]、三(3,5-二-第三丁基-4-羥基苄基)異氰脲酸酯、二乙基[〔3,5-雙(1,1-二甲基乙基)-4-羥基苯基〕甲基]磷酸酯、2,5,7,8-四甲基-2-(4',8',12'-三甲基十三烷基)色原烷-6-醇、2,4-雙-(正辛硫基)-6-(4-羥基-3,5-二-第三丁基苯胺基)-1,3,5-三嗪等。 作為有機硫化合物系抗氧化劑,可列舉:二月桂基-3,3'-硫代二丙酸酯、二肉豆蔻基-3,3'-硫代二丙酸酯、二硬脂基-3,3'-硫代二丙酸酯、季戊四醇四(3-月桂基硫代丙酸酯)、二-十三烷基-3,3'-硫代二丙酸酯、2-巰基苯並咪唑、4,4'-硫代雙(6-第三丁基-3-甲基苯酚)、2,2-硫代-二伸乙基雙[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、4,6-雙(十二烷硫基甲基)-鄰甲酚、2,4-雙(辛硫基甲基)-6-甲基苯酚、2,4-雙-(正辛硫基)-6-(4-羥基-3,5-二-第三丁基苯胺基)-1,3,5-三嗪等。 作為胺化合物系抗氧化劑,可列舉:N,N'-二烯丙基-對苯二胺、N,N'-二-第二丁基-對苯二胺、辛基化二苯胺、2,4-雙-(正辛硫基)-6-(4-羥基-3,5-二-第三丁基苯胺基)-1,3,5-三嗪等。 胺化合物系抗氧化劑中,作為二環己胺,能夠以市售品的形式獲取新日本理化股份有限公司製造的商品名D-CHA-T等,作為其衍生物,可列舉:亞硝酸二環己胺銨、N,N-二(3-甲基-環己基)胺、N,N-二(2-甲氧基-環己基)胺、N,N-二(4-溴-環己基)胺等。 作為磷化合物系抗氧化劑,可列舉:亞磷酸三壬基苯酯、亞磷酸三苯酯、雙[3,5-二-第三丁基-4-羥基苄基(乙氧基)亞膦酸酯]鈣、亞磷酸三(2,4-二-第三丁基苯基)酯、2-[〔2,4,8,10-四(1,1-二甲醚)二苯並[d,f][1,3,2]二氧雜磷環庚烷-6-基〕氧基]-N,N-雙[2-{〔2,4,8,10-四(1,1-二甲基乙基)二苯並[d,f][1,3,2]二氧雜磷環庚烷-6-基〕氧基}-乙基]乙胺、6-[3-(3-第三丁基-4-羥基-5-甲基苯基)丙氧基]-2,4,8,10-四-第三丁基二苯並[d,f][1,3,2]二氧雜磷環庚烷、二乙基[〔3,5-雙(1,1-二甲基乙基)-4-羥基苯基〕甲基]磷酸酯等。 抗氧化劑可單獨使用一種,亦可併用兩種以上。再者,作為抗氧化劑的具體例,存在於同一分子中包含酚性羥基以及至少一個磷原子、硫原子及胺的任一種的化合物,該些化合物有時會重覆列舉。 -Antioxidants- The underfill of the present disclosure may also contain antioxidants. As the antioxidant, previously known antioxidants can be used. Regarding the phenolic compound-based antioxidant, compounds having at least one alkyl group at the ortho position of the phenol nucleus include: 2,6-di-tert-butyl-4-methylphenol, n-octadecyl-3 -(3,5-di-tert-butyl-4-hydroxyphenyl)propionate, 2,2'-methylene bis-(4-methyl-6-tert-butylphenol), 3, 9-bis[2-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propionyloxy]-1,1-dimethylethyl]-2,4,8 ,10-tetraoxaspiro[5.5]undecane, 4,4'-butylenebis-(6-tert-butyl-3-methylphenol), 4,4'-thiobis(6-th Tributyl-3-methylphenol), tetrakis[methylene-3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate]methane, 2,2-thio- Diethylenylbis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate], N,N'-hexamethylenebis[3-(3,5-di -tert-butyl-4-hydroxyphenyl)propionamide], isooctyl-3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate, 1,3,5 -Trimethyl-2,4,6-tris(3,5-di-tert-butyl-4-hydroxybenzyl)benzene, 4,6-bis(dodecylthiomethyl)-o-cresol , bis[3,5-di-tert-butyl-4-hydroxybenzyl(ethoxy)phosphonite] calcium, 2,4-bis(octylthiomethyl)-6-methylphenol, 1,6-hexanediol-bis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate], 6-[3-(3-tert-butyl-4- Hydroxy-5-methylphenyl)propoxy]-2,4,8,10-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphoheptane , 2-tert-butyl-6-(3-tert-butyl-2-hydroxy-5-methylbenzyl)-4-methylphenylacrylate, 2-[1-(2-hydroxy-3 ,5-di-tertiary pentylphenyl) ethyl]-4,6-di-tertiary pentylphenyl acrylate, 2,2'-methylenebis-(4-ethyl-6-th Tributylphenol), 2,6-di-tert-butyl-4-ethylphenol, 1,1,3-tris(2-methyl-4-hydroxy-5-tert-butylphenyl)butyl alkane, triethylene glycol-bis[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propionate], tris(3,5-di-tert-butyl-4- Hydroxybenzyl) isocyanurate, diethyl[[3,5-bis(1,1-dimethylethyl)-4-hydroxyphenyl]methyl]phosphate, 2,5,7, 8-Tetramethyl-2-(4',8',12'-trimethyltridecyl)chroman-6-ol, 2,4-bis-(n-octylthio)-6-( 4-hydroxy-3,5-di-tert-butylanilino)-1,3,5-triazine, etc. Examples of organosulfur compound-based antioxidants include: dilauryl-3,3'-thiodipropionate, dimyristyl-3,3'-thiodipropionate, distearyl-3 ,3'-thiodipropionate, pentaerythritol tetrakis(3-lauryl thiopropionate), di-tridecyl-3,3'-thiodipropionate, 2-mercaptobenzimidazole , 4,4'-thiobis(6-tert-butyl-3-methylphenol), 2,2-thio-diethylenebis[3-(3,5-di-tert-butyl -4-hydroxyphenyl)propionate], 4,6-bis(dodecylthiomethyl)-o-cresol, 2,4-bis(octylthiomethyl)-6-methylphenol, 2,4-bis-(n-octylthio)-6-(4-hydroxy-3,5-di-tert-butylanilino)-1,3,5-triazine and the like. Examples of amine compound-based antioxidants include N,N'-diallyl-p-phenylenediamine, N,N'-di-second-butyl-p-phenylenediamine, octylated diphenylamine, 2, 4-bis-(n-octylthio)-6-(4-hydroxy-3,5-di-tert-butylanilino)-1,3,5-triazine and the like. Among the amine compound-based antioxidants, dicyclohexylamine is commercially available under the trade name D-CHA-T manufactured by Nippon Chemical Co., Ltd., and examples of derivatives thereof include dicyclohexyl nitrite Ammonium hexylamine, N,N-bis(3-methyl-cyclohexyl)amine, N,N-bis(2-methoxy-cyclohexyl)amine, N,N-bis(4-bromo-cyclohexyl) Amines etc. Examples of phosphorus compound-based antioxidants include: trinonylphenyl phosphite, triphenyl phosphite, bis[3,5-di-tert-butyl-4-hydroxybenzyl(ethoxy)phosphonous acid Esters] calcium, tris(2,4-di-tert-butylphenyl) phosphite, 2-[[2,4,8,10-tetrakis(1,1-dimethyl ether) dibenzo[d ,f][1,3,2]dioxaphosphorin-6-yl]oxy]-N,N-bis[2-{[2,4,8,10-tetrakis(1,1- Dimethylethyl) dibenzo[d,f][1,3,2]dioxaphosphorin-6-yl]oxy}-ethyl]ethylamine, 6-[3-(3 -tert-butyl-4-hydroxy-5-methylphenyl)propoxy]-2,4,8,10-tetra-tert-butyldibenzo[d,f][1,3,2 ] dioxaphosphorane, diethyl[[3,5-bis(1,1-dimethylethyl)-4-hydroxyphenyl]methyl]phosphate, etc. One type of antioxidant may be used alone, or two or more types may be used in combination. In addition, as specific examples of antioxidants, there are compounds containing a phenolic hydroxyl group and at least one of a phosphorus atom, a sulfur atom, and an amine in the same molecule, and these compounds may be repeatedly listed.

於底部填充材含有抗氧化劑的情況下,相對於環氧樹脂整體,抗氧化劑的含有率較佳為0.1質量%~10質量%,更佳為0.5質量%~5質量%。When the underfill material contains an antioxidant, the content of the antioxidant is preferably from 0.1% by mass to 10% by mass, more preferably from 0.5% by mass to 5% by mass, based on the entire epoxy resin.

-有機溶劑- 於本揭示的底部填充材中,為了低黏度化,視需要可調配有機溶劑。特別是於使用固體的環氧樹脂及固體的硬化劑的至少一者的情況下,為了獲得液狀的樹脂組成物,較佳為調配有機溶劑。 作為有機溶劑,並無特別限制,可列舉:甲醇、乙醇、丙醇、丁醇等醇系溶劑;丙酮、甲基乙基酮等酮系溶劑;乙二醇乙醚、乙二醇甲醚、乙二醇丁醚、丙二醇甲醚、二丙二醇甲醚、丙二醇乙醚、丙二醇甲醚乙酸酯等二醇醚系溶劑;γ-丁內酯、δ-戊內酯、ε-己內酯等內酯系溶劑;二甲基乙醯胺、二甲基甲醯胺等醯胺系溶劑;甲苯、二甲苯等芳香族系溶劑等,可單獨使用一種,亦可併用兩種以上。該些中,就避免將底部填充材硬化時的由急劇揮發引起的氣泡形成的觀點而言,較佳為沸點為170℃以上的有機溶劑。 -Organic solvents- In the underfill material of the present disclosure, an organic solvent may be blended as necessary for lowering the viscosity. In particular, when using at least one of a solid epoxy resin and a solid hardener, it is preferable to mix an organic solvent in order to obtain a liquid resin composition. The organic solvent is not particularly limited, and examples include: alcohol-based solvents such as methanol, ethanol, propanol, and butanol; ketone-based solvents such as acetone and methyl ethyl ketone; Glycol ether solvents such as butyl glycol ether, propylene glycol methyl ether, dipropylene glycol methyl ether, propylene glycol ethyl ether, propylene glycol methyl ether acetate; γ-butyrolactone, δ-valerolactone, ε-caprolactone and other lactones amide-based solvents such as dimethylacetamide and dimethylformamide; aromatic-based solvents such as toluene and xylene, etc., can be used alone or in combination of two or more. Among them, an organic solvent having a boiling point of 170° C. or higher is preferable from the viewpoint of avoiding formation of air bubbles due to rapid volatilization when the underfill material is hardened.

包含有機溶劑等的揮發成分的含有率若為將底部填充材硬化時不形成氣泡的程度,則並無特別限制,相對於底部填充材整體,較佳為5質量%以下,更佳為1質量%以下,進而佳為0.1質量%以下。包含有機溶劑等的揮發成分的含有率的下限若為0質量%以上,則並無特別限定。 於本揭示中,關於底部填充材的揮發成分,於180℃且30分鐘的條件下加熱底部填充材,基於加熱前後的重量差來算出。 The content of volatile components including organic solvents and the like is not particularly limited as long as the underfill does not form bubbles when the underfill is hardened, but it is preferably 5% by mass or less, more preferably 1% by mass of the underfill as a whole. % or less, more preferably 0.1 mass % or less. The lower limit of the content rate of the volatile components including an organic solvent etc. is not specifically limited as long as it is 0 mass % or more. In this disclosure, regarding the volatile component of the underfill, the underfill was heated at 180° C. for 30 minutes, and calculated based on the weight difference before and after heating.

-脫模劑- 本揭示的底部填充材亦可含有脫模劑。脫模劑的種類並無特別限制,可使用公知的脫模劑。具體而言,例如可列舉:高級脂肪酸、棕櫚蠟(carnauba wax)及聚乙烯系蠟。脫模劑可單獨使用一種,亦可併用兩種以上。 於底部填充材含有脫模劑的情況下,相對於環氧樹脂與硬化劑的合計量,脫模劑的含有率較佳為10質量%以下,就發揮其效果的觀點而言,較佳為0.5質量%以上。 -Release agent- The underfill of the present disclosure may also contain a release agent. The type of release agent is not particularly limited, and known release agents can be used. Specifically, examples thereof include higher fatty acids, carnauba wax, and polyethylene-based waxes. One type of release agent may be used alone, or two or more types may be used in combination. When the underfill contains a mold release agent, the content of the mold release agent is preferably 10% by mass or less relative to the total amount of the epoxy resin and the hardener, and from the viewpoint of exerting its effect, it is preferably 0.5% by mass or more.

-著色劑- 本揭示的底部填充材亦可含有染料、碳黑等著色劑。著色劑可單獨使用一種,亦可併用兩種以上。 -Colorant- The underfill material disclosed herein may also contain colorants such as dyes and carbon black. A coloring agent may be used individually by 1 type, and may use 2 or more types together.

於使用碳黑等導電性粒子作為著色劑的情況下,導電性粒子較佳為粒子徑10 μm以上的粒子的含有率為1質量%以下。 於底部填充材含有導電性粒子的情況下,相對於環氧樹脂與硬化劑的合計量,導電性粒子的含有率較佳為3質量%以下,更佳為0.01質量%~1質量%。 When using electroconductive particles, such as carbon black, as a coloring agent, it is preferable that the content rate of the electroconductive particle is 1 mass % or less of the particle diameter 10 micrometers or more. When the underfill contains conductive particles, the content of the conductive particles is preferably 3% by mass or less, more preferably 0.01% by mass to 1% by mass, based on the total amount of the epoxy resin and the curing agent.

-橡膠粒子- 就硬化物的低熱膨脹化的觀點而言,底部填充材亦可含有橡膠粒子。橡膠粒子可單獨使用一種,亦可併用兩種以上。 作為適宜的橡膠粒子的例子,可列舉:苯乙烯-丁二烯橡膠(styrene-butadiene rubber,SBR)、腈-丁二烯橡膠(nitrile-butadiene rubber,NBR)、丁二烯橡膠(butadiene rubber,BR)、胺基甲酸酯橡膠(urethane rubber,UR)、丙烯酸橡膠(acrylic rubber,AR)等的橡膠粒子。其中,就耐熱性及耐濕性的觀點而言,較佳為包含丙烯酸橡膠的橡膠粒子,更佳為芯殼型丙烯酸橡膠粒子。 -rubber particles- From the viewpoint of reducing thermal expansion of the cured product, the underfill may contain rubber particles. Rubber particles may be used alone or in combination of two or more. Examples of suitable rubber particles include: styrene-butadiene rubber (styrene-butadiene rubber, SBR), nitrile-butadiene rubber (nitrole-butadiene rubber, NBR), butadiene rubber (butadiene rubber, BR), urethane rubber (urethane rubber, UR), acrylic rubber (acrylic rubber, AR) and other rubber particles. Among them, from the viewpoint of heat resistance and moisture resistance, rubber particles made of acrylic rubber are preferred, and core-shell type acrylic rubber particles are more preferred.

另外,作為適宜的橡膠粒子的其他例,可列舉矽酮橡膠粒子。 作為矽酮橡膠粒子,可列舉:將聚二甲基矽氧烷、聚甲基苯基矽氧烷、聚二苯基矽氧烷等直鏈狀的聚有機矽氧烷交聯而成的矽酮橡膠粒子;利用矽酮樹脂被覆該矽酮橡膠粒子的表面而成的矽酮橡膠粒子;包含藉由乳化聚合等而獲得的固體矽酮粒子的芯與丙烯酸樹脂等有機聚合物的殼的芯-殼聚合物粒子等。該些矽酮橡膠粒子的形狀可為無定形,亦可為球形,為了將底部填充材的黏度抑制得低,較佳為使用球形的矽酮橡膠粒子。 關於矽酮橡膠粒子,能夠自東麗道康寧矽酮(Toray Dow Corning silicone)股份有限公司、信越化學工業股份有限公司等獲取市售品。 Moreover, silicone rubber particles are mentioned as another example of suitable rubber particle. Examples of silicone rubber particles include silicone rubber obtained by cross-linking linear polyorganosiloxanes such as polydimethylsiloxane, polymethylphenylsiloxane, and polydiphenylsiloxane. Ketone rubber particles; silicone rubber particles obtained by coating the surface of the silicone rubber particles with a silicone resin; a core consisting of a core of solid silicone particles obtained by emulsion polymerization or the like and a shell of an organic polymer such as acrylic resin - Shell polymer particles, etc. The shape of these silicone rubber particles may be amorphous or spherical. In order to suppress the viscosity of the underfill to be low, it is preferable to use spherical silicone rubber particles. As for the silicone rubber particles, commercially available products can be obtained from Toray Dow Corning Silicone Co., Ltd., Shin-Etsu Chemical Co., Ltd., and the like.

於底部填充材包含橡膠粒子的情況下,為了均勻性高地改質底部填充材,橡膠粒子的平均粒子徑較佳為微細。作為橡膠粒子的平均粒子徑,較佳為0.05 μm~10 μm的範圍,進而佳為0.1 μm~5 μm的範圍。若橡膠粒子的平均粒子徑為0.05 μm以上,則有向底部填充材的分散性進一步提高的傾向。若橡膠粒子的平均粒子徑為10 μm以下,則有低應力化改善效果進一步提高的傾向,作為底部填充材的向微細間隙的浸透性及流動性提高,有不易導致空隙及未填充的傾向。 橡膠粒子的平均粒子徑可使用與無機填充材相同的方法來測定。 於底部填充材包含橡膠粒子的情況下,相對於環氧樹脂整體,橡膠粒子的含有率較佳為3質量%~30質量%,更佳為5質量%~28質量%,進而佳為10質量%~25質量%。 When the underfill material contains rubber particles, in order to modify the underfill material with high uniformity, the average particle diameter of the rubber particles is preferably fine. The average particle diameter of the rubber particles is preferably in the range of 0.05 μm to 10 μm, more preferably in the range of 0.1 μm to 5 μm. When the average particle diameter of the rubber particles is 0.05 μm or more, the dispersibility to the underfill tends to be further improved. When the average particle diameter of the rubber particles is 10 μm or less, the stress reduction improvement effect tends to be further improved, and the penetration and fluidity of the underfill material into fine gaps are improved, and voids and unfilled tend to be less likely to be caused. The average particle diameter of the rubber particles can be measured by the same method as that of the inorganic filler. When the underfill material contains rubber particles, the content of the rubber particles is preferably 3% by mass to 30% by mass, more preferably 5% by mass to 28% by mass, and still more preferably 10% by mass relative to the entire epoxy resin. % to 25% by mass.

<底部填充材的用途> 底部填充材例如可應用於搭載有後述的電子零件的半導體裝置。 另外,近年來,隨著半導體元件的高速化,有時於半導體元件上形成低介電常數的層間絕緣膜。該層間絕緣膜的機械強度弱,容易因來自外部的應力而被破壞,因此容易產生故障。由於半導體元件越大,該傾向越顯著,因此要求減低因底部填充材而產生的應力。 根據本揭示的底部填充材,即便對於搭載如下半導體元件的倒裝晶片連接形式的電子零件裝置,亦可提供優異的可靠性,所述半導體元件中,半導體元件的尺寸以相對較長的邊計為2 mm以上且具有介電常數為3.0以下的層間絕緣膜。 另外,可提供一種對於構成電子零件的配線基板與半導體元件的凸塊連接面的距離為200 μm以下的倒裝晶片連接亦顯示出良好的流動性及填充性,且耐濕性、耐熱衝擊性等可靠性亦優異的電子零件裝置。 <Use of underfill material> The underfill material can be applied to, for example, a semiconductor device on which electronic components described later are mounted. In addition, in recent years, along with the increase in speed of semiconductor elements, an interlayer insulating film with a low dielectric constant is sometimes formed on the semiconductor elements. The mechanical strength of this interlayer insulating film is weak, and it is easily broken by external stress, so failures are likely to occur. Since this tendency becomes more prominent as the semiconductor element becomes larger, it is required to reduce the stress generated by the underfill material. According to the underfill material of the present disclosure, it is possible to provide excellent reliability even to a flip-chip connection type electronic component device that mounts a semiconductor element whose size is measured on a relatively long side An interlayer insulating film having a thickness of 2 mm or more and a dielectric constant of 3.0 or less. In addition, it is possible to provide a flip-chip connection with a distance of 200 μm or less between the wiring board constituting the electronic component and the bump connection surface of the semiconductor element, which also exhibits good fluidity and filling properties, and has moisture resistance and thermal shock resistance. Electronic parts and devices that are also excellent in reliability.

<底部填充材的製作方法> 底部填充材例如可藉由如下方式來獲得:將環氧樹脂、硬化劑、無機填充材及特定的改質矽酮化合物以及視需要使用的其他成分一併或分別地,一邊視需要施加加熱處理,一邊進行攪拌、熔融、混合、分散等。作為用以進行該些成分的混合、攪拌、分散等的裝置,並無特別限定,可列舉:包括攪拌裝置、加熱裝置等的擂潰機、三輥磨機、球磨機、行星式混合機、珠磨機等。藉由使用該些裝置將所述成分混合、混練,視需要進行脫泡,可獲得底部填充材。 作為二氧化矽粒子,為了提高粒子的分散性,亦可使用二氧化矽粒子預先混合於環氧樹脂中而成的混合物。 <How to make the underfill material> The underfill material can be obtained, for example, by adding an epoxy resin, a hardener, an inorganic filler, a specific modified silicone compound, and optionally other components together or separately, and applying heat treatment as necessary. , while stirring, melting, mixing, dispersing, etc. The device for mixing, stirring, and dispersing these components is not particularly limited, and includes a crushing machine including a stirring device, a heating device, etc., a three-roll mill, a ball mill, a planetary mixer, a bead mill, etc. mill etc. The underfill material can be obtained by mixing and kneading the above-mentioned components using these devices, and performing defoaming if necessary. As the silica particles, in order to improve the dispersibility of the particles, a mixture obtained by pre-mixing the silica particles with the epoxy resin can also be used.

<電子零件裝置> 本揭示的電子零件裝置包括:基板,具有電路層;電子零件,配置於所述基板上並與所述電路層電性連接;以及本揭示的底部填充材的硬化物,配置於所述基板與所述電子零件的間隙。本揭示的電子零件裝置可利用本揭示的底部填充材將電子零件密封來獲得。藉由電子零件由底部填充材密封,本揭示的電子零件裝置的可靠性優異。 <Electronic Components> The electronic component device of the present disclosure includes: a substrate having a circuit layer; an electronic component disposed on the substrate and electrically connected to the circuit layer; and a hardened underfill material of the present disclosure disposed on the substrate and the circuit layer. clearance of the electronic parts. The electronic component device of the present disclosure can be obtained by sealing the electronic component with the underfill material of the present disclosure. The electronic component device of the present disclosure is excellent in reliability because the electronic component is sealed by the underfill material.

作為電子零件裝置,可列舉於引線框架、配線完畢的帶形載體、剛性配線板、可撓性配線板、玻璃、矽晶圓等具有電路層的基板上搭載半導體元件、電晶體、二極體、閘流體等主動元件、電容器、電阻體、電阻陣列、線圈、開關等被動元件等電子零件,並利用本揭示的底部填充材將所需部分密封而獲得的電子零件裝置。 特別是,作為可適應本揭示的底部填充材的對象之一,可列舉藉由凸塊連接而將半導體元件與於剛性配線板、可撓性配線板或玻璃上所形成的配線倒裝晶片接合的電子零件裝置。作為具體例,可列舉:倒裝晶片球柵陣列(Ball Grid Array,BGA)、連接盤網格陣列(Land Grid Array,LGA)、薄膜覆晶(Chip On Film,COF)等的電子零件裝置。 Examples of electronic components include mounting semiconductor elements, transistors, and diodes on substrates with circuit layers such as lead frames, wired tape carriers, rigid wiring boards, flexible wiring boards, glass, and silicon wafers. Active components such as thyristors, electronic components such as capacitors, resistors, resistor arrays, coils, switches and other passive components, and electronic component devices obtained by sealing required parts with the underfill material of the present disclosure. In particular, as one of the underfill materials applicable to the present disclosure, flip-chip bonding of a semiconductor element and wiring formed on a rigid wiring board, a flexible wiring board, or glass by bump connection is exemplified. electronic parts device. Specific examples include electronic component devices such as flip chip ball grid array (BGA), land grid array (LGA), and chip on film (COF).

本揭示的底部填充材作為要求高可靠性的倒裝晶片用的底部填充材有用。作為可特別適宜地應用本揭示的底部填充材的倒裝晶片的領域,不僅可列舉將配線基板與半導體元件連接的凸塊材質為先前的含鉛焊料的情況,而且亦可列舉為Sn-Ag-Cu系等無鉛焊料的情況。本揭示的底部填充材有如下傾向:對於使用與先前的鉛焊料相比物性脆的無鉛焊料來進行凸塊連接的倒裝晶片,亦可維持良好的可靠性。另外,有如下傾向:藉由於將晶圓水準晶片尺寸封裝(Chip Size Package,CSP)等晶片級封裝安裝於基板時亦應用本揭示的底部填充材,可實現可靠性的提高。The underfill material of the present disclosure is useful as an underfill material for flip chips requiring high reliability. As the flip-chip field to which the underfill material of the present disclosure can be particularly suitably applied, not only the case where the material of the bumps connecting the wiring board and the semiconductor element is conventional lead-containing solder, but also Sn-Ag - In the case of lead-free solders such as Cu-based solders. The underfill material of the present disclosure tends to maintain good reliability even for flip-chip bump connections using lead-free solder that is physically brittle compared to conventional lead solder. In addition, there is a tendency that reliability can be improved by also applying the underfill material of the present disclosure when a chip-level package such as a wafer-level chip size package (CSP) is mounted on a substrate.

<電子零件裝置的製造方法> 本揭示的電子零件裝置的製造方法具有如下步驟:使用本揭示的底部填充材將具有電路層的基板、及配置於所述基板上並與所述電路層電性連接的電子零件密封的步驟。 對使用本揭示的底部填充材將具有電路層的基板與電子零件密封的步驟並無特別限定。例如,可列舉:後放入方式,於將電子零件與具有電路層的基板連接後,利用毛細管現象對電子零件與基板的縫隙賦予底部填充材,繼而,進行底部填充材的硬化反應;以及先塗佈方式,先對具有電路層的基板及電子零件的至少一者的表面賦予本揭示的底部填充材,進行熱壓接而將電子零件連接於基板時,一併進行電子零件及基板的連接與底部填充材的硬化反應。 作為底部填充材的賦予方法,可列舉:澆注方式、點膠方式、印刷方式等。 <Manufacturing method of electronic component device> The manufacturing method of the electronic component device of the present disclosure has the following steps: using the underfill material of the present disclosure to seal a substrate having a circuit layer and an electronic component disposed on the substrate and electrically connected to the circuit layer. There is no particular limitation on the step of sealing the substrate having the circuit layer and the electronic component using the underfill material of the present disclosure. For example, it can be mentioned: after the electronic component is connected to the substrate with the circuit layer, the underfill material is applied to the gap between the electronic component and the substrate by capillary phenomenon, and then the hardening reaction of the underfill material is carried out; In the coating method, the underfill material of the present disclosure is applied to the surface of at least one of the substrate having the circuit layer and the electronic component, and when the electronic component is connected to the substrate by thermocompression bonding, the electronic component and the substrate are connected together Reacts with hardening of the underfill. As a method of providing an underfill, a casting method, a dispensing method, a printing method, etc. are mentioned.

底部填充材的硬化條件並無特別限定,例如較佳為於80℃~165℃下加熱1分鐘~150分鐘。 [實施例] The curing conditions of the underfill material are not particularly limited, for example, it is preferably heated at 80° C. to 165° C. for 1 minute to 150 minutes. [Example]

以下,基於實施例對本發明進行說明,但本發明並不限定於下述實施例。Hereinafter, although this invention is demonstrated based on an Example, this invention is not limited to a following Example.

[底部填充材的製備] 將表1及表2所示的各成分以表1及表2所示的量(質量份)加以調配,利用三輥及真空擂潰機進行混練並加以分散,從而製備實施例及比較例的底部填充材。表1所示的各材料的詳細情況如下所述。表1中的空欄(-)表示未調配。 [Preparation of underfill material] Each component shown in Table 1 and Table 2 is allocated with the amount (parts by mass) shown in Table 1 and Table 2, and is mixed and dispersed using a three-roller and a vacuum crushing machine, thereby preparing the compounds of the Examples and Comparative Examples. Underfill. The details of each material shown in Table 1 are as follows. Empty columns (-) in Table 1 indicate no formulation.

·環氧樹脂1:將雙酚F環氧化而獲得的環氧當量160 g/mol的液狀2官能環氧樹脂 ·環氧樹脂2:將胺基苯酚環氧化而獲得的環氧當量95 g/mol的3官能液狀環氧樹脂 ·環氧樹脂3:將萘環氧化而獲得的環氧當量143 g/mol的液狀2官能環氧樹脂 ·硬化劑1:活性氫當量45 g/mol的二乙基甲苯二胺 ·硬化劑2:活性氫當量63 g/mol的二乙基二胺基二苯基甲烷 ·無機填充材:平均粒子徑0.5 μm的球狀熔融二氧化矽 ·著色劑:碳黑 ·矽酮化合物1:KF-6100(信越化學工業股份有限公司製造、25℃下的黏度:40,000 mm 2/s、聚甘油改質) ·矽酮化合物2:KF-6104(信越化學工業股份有限公司製造、25℃下的黏度:40,000 mm 2/s、聚甘油改質) ·矽酮化合物3:KF-6105(信越化學工業股份有限公司製造、25℃下的黏度:40,000 mm 2/s、聚甘油改質及烷基改質) ·矽酮化合物4:KF-6106(信越化學工業股份有限公司製造、25℃下的黏度:3,500 mm 2/s、聚甘油改質) ·矽酮化合物5:BYK-370(日本畢克化學(BYK-Chemie Japan)股份有限公司製造、40℃下的動態黏度:約1 mm 2/s、聚酯改質) ·矽酮化合物6:BYK-375(日本畢克化學(BYK-Chemie Japan)股份有限公司製造、聚醚-聚酯改質) ·矽酮化合物7:BYK-302(日本畢克化學(BYK-Chemie Japan)股份有限公司製造、不含羥基) ·矽酮化合物8:BYK-326(日本畢克化學(BYK-Chemie Japan)股份有限公司製造、不含羥基) ·矽酮化合物9:BYK-333(日本畢克化學(BYK-Chemie Japan)股份有限公司製造、不含羥基) ·矽酮化合物10:BYK-349(日本畢克化學(BYK-Chemie Japan)股份有限公司製造、不含羥基) ・Epoxy resin 1: Liquid bifunctional epoxy resin with an epoxy equivalent of 160 g/mol obtained by epoxidizing bisphenol F ・Epoxy resin 2: Epoxy equivalent of 95 g obtained by epoxidizing aminophenol Trifunctional liquid epoxy resin/mol Epoxy resin 3: Liquid bifunctional epoxy resin with an epoxy equivalent of 143 g/mol obtained by epoxidizing naphthalene Hardener 1: Active hydrogen equivalent 45 g/mol Diethyltoluenediamine Hardener 2: Diethyldiaminodiphenylmethane with an active hydrogen equivalent of 63 g/mol Inorganic filler: Spherical fused silica with an average particle size of 0.5 μm Colorant : Carbon black Silicone compound 1: KF-6100 (manufactured by Shin-Etsu Chemical Co., Ltd., viscosity at 25°C: 40,000 mm 2 /s, modified with polyglycerin) Silicone compound 2: KF-6104 (Shin-Etsu Chemical Industrial Co., Ltd., viscosity at 25°C: 40,000 mm 2 /s, modified with polyglycerin) Silicone compound 3: KF-6105 (manufactured by Shin-Etsu Chemical Co., Ltd., viscosity at 25°C: 40,000 mm 2 /s, polyglycerol modified and alkyl modified) Silicone compound 4: KF-6106 (manufactured by Shin-Etsu Chemical Co., Ltd., viscosity at 25°C: 3,500 mm 2 /s, polyglycerol modified) Silicone Ketone compound 5: BYK-370 (manufactured by BYK-Chemie Japan Co., Ltd., dynamic viscosity at 40°C: about 1 mm 2 /s, polyester modified) Silicone compound 6: BYK- 375 (manufactured by BYK-Chemie Japan Co., Ltd., polyether-polyester modified) Silicone compound 7: BYK-302 (manufactured by BYK-Chemie Japan Co., Ltd., Hydroxyl free) Silicone compound 8: BYK-326 (manufactured by BYK-Chemie Japan Co., Ltd., free of hydroxyl) Silicone compound 9: BYK-333 (BYK-Chemie Japan Chemie Japan Co., Ltd., hydroxyl-free) Silicone compound 10: BYK-349 (BYK-Chemie Japan Co., Ltd., hydroxyl-free)

[評價] 使用實施例及比較例中製備的底部填充材來製作試驗用的電子零件裝置,並進行滲漏的評價及填充速度的評價。將結果示於表1及表2中。 試驗用的電子零件裝置的規格如以下所述。試驗用的電子零件裝置是以如下方式製作:於110℃的條件下藉由點膠方式而將底部填充材20 mg塗佈於基板與半導體元件的間隙後,於150℃下且於空氣中硬化2小時,藉此將間隙密封。 [Evaluation] Using the underfill materials prepared in Examples and Comparative Examples, test electronic component devices were produced, and evaluations of leakage and filling speed were performed. The results are shown in Table 1 and Table 2. The specifications of the electronic component device used for the test are as follows. The electronic component device for the test was manufactured as follows: 20 mg of underfill material was applied to the gap between the substrate and the semiconductor element by dispensing at 110°C, and cured at 150°C in air 2 hours, whereby the gap is sealed.

·半導體元件的尺寸:10 mm×10 mm×0.4 mm厚 ·基板的尺寸:35 mm×35 mm×1 mm厚 ·基板(芯)的種類:E-679FG(G)(昭和電工材料股份有限公司製造、商品名) ·阻焊劑的種類:SR-7300G(昭和電工材料股份有限公司製造、商品名) ·基板與半導體元件的縫隙:50 μm ・Size of semiconductor element: 10 mm x 10 mm x 0.4 mm thick · Substrate size: 35 mm x 35 mm x 1 mm thick ・Type of substrate (core): E-679FG (G) (manufactured by Showa Denko Materials Co., Ltd., trade name) ・Type of solder resist: SR-7300G (manufactured by Showa Denko Materials Co., Ltd., trade name) ・Gap between substrate and semiconductor element: 50 μm

(1)基板上的滲出(滲漏)的長度(滲漏的評價) 利用雷射顯微鏡(基恩士(KEYENCE)股份有限公司製造、數位顯微鏡(Digital microscope)VHX-500(商品名))對密封後的電子零件裝置的基板中的與圓角相接的部分附近進行觀察,並測定底部填充材的滲出(滲漏)的長度。滲出(滲漏、Bleed)的長度越短,可判斷為滲漏的產生越得到抑制。 以比較例5中的滲漏的長度的測定結果為基準,求出實施例及比較例中的滲漏的長度。即,分別求出實施例或比較例中的滲漏(μm)/比較例5中的滲漏(μm)。滲漏的判定基準如以下所述。 -判定基準- A:實施例或比較例中的滲漏(μm)/比較例5中的滲漏(μm)未滿1.00。 B:實施例或比較例中的滲漏(μm)/比較例5中的滲漏(μm)為1.00。 C:實施例或比較例中的滲漏(μm)/比較例5中的滲漏(μm)大於1.00。 (1) Length of bleeding (leakage) on the substrate (evaluation of leakage) A laser microscope (manufactured by KEYENCE Co., Ltd., digital microscope (Digital microscope) VHX-500 (trade name)) was used to examine the vicinity of the portion of the sealed electronic component device that is in contact with the fillet. Observe and measure the length of seepage (leakage) of the underfill. The shorter the length of bleed (bleed, bleed), it can be judged that the occurrence of bleed is suppressed more. Based on the measurement results of the length of the leak in Comparative Example 5, the length of the leak in the examples and the comparative examples was determined. That is, the leakage (μm) in the example or the comparative example/the leakage (μm) in the comparative example 5 were calculated|required, respectively. Judgment criteria for leakage are as follows. - Judgment criteria - A: The leakage (μm) in Example or Comparative Example/the leakage (μm) in Comparative Example 5 is less than 1.00. B: The leakage (μm) in Example or Comparative Example/the leakage (μm) in Comparative Example 5 is 1.00. C: Leakage (µm) in Example or Comparative Example/Leakage (µm) in Comparative Example 5 is greater than 1.00.

(2)流動測試(填充速度的評價) 於110℃的條件下藉由點膠方式而將底部填充材1 mg注入至支撐構件(玻璃基板)與作為電子零件的代用使用的蓋玻璃之間的空隙中,測量直至空隙由底部填充材完全填充為止的時間(秒)。 評價用樣品的規格如以下所述。針對以所述方式獲得的填充速度,將以比較例5中的值為基準值1.0時的各實施例中的相對值示於表2中。 (2) Flow test (evaluation of filling speed) Under the condition of 110°C, inject 1 mg of the underfill material into the gap between the support member (glass substrate) and the cover glass used as a substitute for electronic parts by dispensing, and measure until the gap is completely filled with the underfill material. Time in seconds until filled. The specifications of the samples for evaluation are as follows. Table 2 shows the relative values in each example when the value in Comparative Example 5 is a reference value of 1.0 with respect to the filling speed obtained in this manner.

[評價用樣品的規格] ·玻璃基板的尺寸:76 mm×26 mm微載玻片(松浪硝子工業股份有限公司製造) ·蓋玻璃的尺寸:20 mm×20 mm(松浪硝子工業股份有限公司製造) ·基板與半導體元件之間的縫隙:25 μm [Specifications of samples for evaluation] ・Size of the glass substrate: 76 mm × 26 mm microslide (manufactured by Matsunami Glass Co., Ltd.) ・Dimensions of cover glass: 20 mm×20 mm (manufactured by Matsunami Glass Co., Ltd.) ・Gap between substrate and semiconductor element: 25 μm

[表1]    分類 單位 實施例 比較例 1 2 3 4 5 6 1 2 3 4 5 組成 環氧樹脂1 質量份 60 60 60 60 60 60 60 60 60 60 60 環氧樹脂2 質量份 20 20 20 20 20 20 20 20 20 20 20 環氧樹脂3 質量份 20 20 20 20 20 20 20 20 20 20 20 硬化劑1 質量份 9.8 9.8 9.8 9.8 9.8 9.8 9.8 9.8 9.8 9.8 9.8 硬化劑2 質量份 32 32 32 32 32 32 32 32 32 32 32 無機填充材 質量份 213 213 213 213 213 213 213 213 213 213 213 著色劑 質量份 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 矽酮化合物1 質量份 0.36 - - - - - - - - - - 矽酮化合物2 質量份 - 0.36 - - - - - - - - - 矽酮化合物3 質量份 - - 0.36 - - - - - - - - 矽酮化合物4 質量份 - - - 0.36 - - - - - - - 矽酮化合物5 質量份 - - - - 0.36 - - - - - - 矽酮化合物6 質量份 - - - - - 0.36 - - - - - 矽酮化合物7 質量份 - - - - - - 0.36 - - - - 矽酮化合物8 質量份 - - - - - - - 0.36 - - - 矽酮化合物9 質量份 - - - - - - - - 0.36 - - 矽酮化合物10 質量份 - - - - - - - - - 0.36 - 矽酮化合物的含有率 質量% 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0 評價 相對於比較例5的滲漏(Bleed)的長度 μm/μm 0.63 0.71 0.90 0.81 0.93 0.72 1.12 1.01 1.08 1.02 1.00 滲漏(Bleed)抑制效果 - A A A A A A C C C C B [Table 1] Classification unit Example comparative example 1 2 3 4 5 6 1 2 3 4 5 composition epoxy resin 1 parts by mass 60 60 60 60 60 60 60 60 60 60 60 Epoxy 2 parts by mass 20 20 20 20 20 20 20 20 20 20 20 Epoxy 3 parts by mass 20 20 20 20 20 20 20 20 20 20 20 Hardener 1 parts by mass 9.8 9.8 9.8 9.8 9.8 9.8 9.8 9.8 9.8 9.8 9.8 Hardener 2 parts by mass 32 32 32 32 32 32 32 32 32 32 32 Inorganic filler parts by mass 213 213 213 213 213 213 213 213 213 213 213 Colorant parts by mass 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 Silicone compound 1 parts by mass 0.36 - - - - - - - - - - Silicone compound 2 parts by mass - 0.36 - - - - - - - - - Silicone compound 3 parts by mass - - 0.36 - - - - - - - - Silicone compound 4 parts by mass - - - 0.36 - - - - - - - Silicone compound 5 parts by mass - - - - 0.36 - - - - - - Silicone compound 6 parts by mass - - - - - 0.36 - - - - - Silicone compound 7 parts by mass - - - - - - 0.36 - - - - Silicone compound 8 parts by mass - - - - - - - 0.36 - - - Silicone compound 9 parts by mass - - - - - - - - 0.36 - - Silicone compound 10 parts by mass - - - - - - - - - 0.36 - Content rate of silicone compound quality% 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0 Evaluation Compared to the length of the bleed (Bleed) of Comparative Example 5 μm/μm 0.63 0.71 0.90 0.81 0.93 0.72 1.12 1.01 1.08 1.02 1.00 Bleed suppression effect - A A A A A A C C C C B

[表2]    分類 單位 實施例 比較例 7 8 9 10 11 5 組成 環氧樹脂1 質量份 60 60 60 60 60 60 環氧樹脂2 質量份 20 20 20 20 20 20 環氧樹脂3 質量份 20 20 20 20 20 20 硬化劑1 質量份 9.8 9.8 9.8 9.8 9.8 9.8 硬化劑2 質量份 32 32 32 32 32 32 無機填充材 質量份 213 213 213 213 213 213 著色劑 質量份 0.2 0.2 0.2 0.2 0.2 0.2 矽酮化合物1 質量份 0.036 0.18 0.36 0.71 1.8 - 矽酮化合物的含有率 質量% 0.01 0.05 0.1 0.2 0.5 0 評價 相對於比較例5的滲漏(Bleed)的長度 μm/μm 0.89 0.48 0.38 0.38 0.32 1.00 流動測試 (填充速度) 對Ref 1.0 1.1 1.1 1.4 1.6 1.0 [Table 2] Classification unit Example comparative example 7 8 9 10 11 5 composition epoxy resin 1 parts by mass 60 60 60 60 60 60 Epoxy 2 parts by mass 20 20 20 20 20 20 Epoxy 3 parts by mass 20 20 20 20 20 20 Hardener 1 parts by mass 9.8 9.8 9.8 9.8 9.8 9.8 Hardener 2 parts by mass 32 32 32 32 32 32 Inorganic filler parts by mass 213 213 213 213 213 213 Colorant parts by mass 0.2 0.2 0.2 0.2 0.2 0.2 Silicone compound 1 parts by mass 0.036 0.18 0.36 0.71 1.8 - Content rate of silicone compound quality% 0.01 0.05 0.1 0.2 0.5 0 Evaluation Compared to the length of the bleed (Bleed) of Comparative Example 5 μm/μm 0.89 0.48 0.38 0.38 0.32 1.00 Flow Test (Fill Speed) to Ref 1.0 1.1 1.1 1.4 1.6 1.0

如表1所示,於使用不含羥基的矽酮化合物(例如,聚醚改質矽酮化合物)的比較例1~比較例4中,較未使用矽酮化合物的比較例5而言,滲漏的評價惡化。 另一方面,如表1及表2所示,於使用規定量的包含聚甘油改質矽酮化合物及聚酯改質矽酮化合物的至少一者的矽酮化合物的實施例1~實施例11中,較未使用矽酮化合物的比較例5而言,滲漏的評價良好。 As shown in Table 1, in Comparative Example 1 to Comparative Example 4 using a silicone compound not containing a hydroxyl group (for example, a polyether-modified silicone compound), compared with Comparative Example 5 in which no silicone compound was used, the penetration Leaked ratings worsen. On the other hand, as shown in Table 1 and Table 2, in Examples 1 to 11 using a predetermined amount of a silicone compound containing at least one of a polyglycerol-modified silicone compound and a polyester-modified silicone compound, Among them, the evaluation of leakage was better than that of Comparative Example 5 in which no silicone compound was used.

2021年5月12日提出申請的日本專利申請案2021-081207號的揭示的整體內容藉由參照而併入本說明書中。 關於本說明書中所記載的所有文獻、專利申請案及技術規格,與具體且分別記載有藉由參照而併入各文獻、專利申請案及技術規格的情況相同程度地,藉由參照而併入本說明書中。 The entire disclosure of Japanese Patent Application No. 2021-081207 for which it applied on May 12, 2021 is incorporated in this specification by reference. All documents, patent applications, and technical specifications described in this specification are incorporated by reference to the same extent as if each document, patent application, and technical specification were specifically and individually stated to be incorporated by reference. in this manual.

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Claims (7)

一種底部填充用樹脂組成物,包含環氧樹脂、硬化劑、無機填充材、以及含有聚甘油改質矽酮化合物及聚酯改質矽酮化合物的至少一者的矽酮化合物。A resin composition for bottom filling, including epoxy resin, curing agent, inorganic filler, and silicone compound containing at least one of polyglycerol modified silicone compound and polyester modified silicone compound. 如請求項1所述的底部填充用樹脂組成物,其中,相對於底部填充用樹脂組成物總量,所述矽酮化合物的含有率為0.0001質量%~1質量%。The resin composition for underfill according to claim 1, wherein the content of the silicone compound is 0.0001% by mass to 1% by mass relative to the total amount of the resin composition for underfill. 如請求項1或請求項2所述的底部填充用樹脂組成物,其中,所述矽酮化合物包含聚甘油改質矽酮化合物。The resin composition for underfill according to Claim 1 or Claim 2, wherein the silicone compound includes a polyglycerol-modified silicone compound. 如請求項1至請求項3中任一項所述的底部填充用樹脂組成物,其中,於所述矽酮化合物包含聚酯改質矽酮化合物的情況下,所述聚酯改質矽酮化合物包含聚醚-聚酯改質矽酮化合物。The underfill resin composition according to any one of claim 1 to claim 3, wherein, when the silicone compound includes a polyester-modified silicone compound, the polyester-modified silicone The compound comprises a polyether-polyester modified silicone compound. 如請求項1至請求項4中任一項所述的底部填充用樹脂組成物,其中,所述硬化劑包含胺系硬化劑。The underfill resin composition according to any one of claims 1 to 4, wherein the curing agent includes an amine-based curing agent. 一種電子零件裝置,包括: 基板,具有電路層; 電子零件,配置於所述基板上並與所述電路層電性連接;以及 如請求項1至請求項5中任一項所述的底部填充用樹脂組成物的硬化物,配置於所述基板與所述電子零件的間隙。 An electronic component device, comprising: a substrate having a circuit layer; an electronic component disposed on the substrate and electrically connected to the circuit layer; and The cured product of the resin composition for underfill according to any one of claims 1 to 5 is arranged in a gap between the substrate and the electronic component. 一種電子零件裝置的製造方法,具有如下步驟:使用如請求項1至請求項5中任一項所述的底部填充用樹脂組成物將具有電路層的基板、及配置於所述基板上並與所述電路層電性連接的電子零件密封的步驟。A method of manufacturing an electronic component device, comprising the steps of: using the resin composition for underfill according to any one of claim 1 to claim 5, disposing a substrate having a circuit layer on the substrate, and A step of sealing the electronic components electrically connected to the circuit layer.
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