TW202239773A - 感光性樹脂組合物、硬化物、阻隔壁、有機電致發光元件、彩色濾光器及圖像顯示裝置 - Google Patents

感光性樹脂組合物、硬化物、阻隔壁、有機電致發光元件、彩色濾光器及圖像顯示裝置 Download PDF

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TW202239773A
TW202239773A TW111103644A TW111103644A TW202239773A TW 202239773 A TW202239773 A TW 202239773A TW 111103644 A TW111103644 A TW 111103644A TW 111103644 A TW111103644 A TW 111103644A TW 202239773 A TW202239773 A TW 202239773A
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mass
ring
monomer
resin composition
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TW111103644A
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木村明日香
利光恵理子
佐藤嘉秀
倉久稔
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日商三菱化學股份有限公司
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
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    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
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    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
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    • C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
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    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
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    • C08F290/06—Polymers provided for in subclass C08G
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    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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    • G03F7/031—Organic compounds not covered by group G03F7/029
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
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    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
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    • H05B33/22—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
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    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
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  • Chemical & Material Sciences (AREA)
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  • Materials For Photolithography (AREA)
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  • Optics & Photonics (AREA)
TW111103644A 2021-01-29 2022-01-27 感光性樹脂組合物、硬化物、阻隔壁、有機電致發光元件、彩色濾光器及圖像顯示裝置 TW202239773A (zh)

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JP (1) JPWO2022163682A1 (https=)
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI832690B (zh) * 2023-02-03 2024-02-11 南亞塑膠工業股份有限公司 光阻液及其製造方法

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Publication number Priority date Publication date Assignee Title
WO2024190597A1 (ja) * 2023-03-10 2024-09-19 セントラル硝子株式会社 硬化性樹脂材料、撥液剤組成物、感光性樹脂組成物及び隔壁材料
WO2025173436A1 (ja) * 2024-02-13 2025-08-21 Ａｇｃ株式会社 レジスト組成物、レジスト膜、及び光学素子

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JPS5353632U (https=) 1976-10-09 1978-05-09
JP2010209183A (ja) * 2009-03-09 2010-09-24 Fujifilm Corp インク組成物及びインクジェット記録方法
EP2792665B1 (en) * 2011-12-15 2016-08-03 Asahi Glass Company, Limited Liquid repellent composition, liquid repellent polymer, curable composition, coating composition, article having cured film, article having pattern of liquid-philic region and liquid repellent region, and process for producing it
US8715904B2 (en) * 2012-04-27 2014-05-06 3M Innovative Properties Company Photocurable composition
JP2016147809A (ja) * 2013-06-12 2016-08-18 旭硝子株式会社 撥液性化合物、撥液性重合体、硬化性組成物、塗布用組成物、ならびに硬化膜を有する物品、親液性領域と撥液性領域とのパターンを有する物品およびその製造方法
KR101936282B1 (ko) * 2016-12-12 2019-01-08 한국화학연구원 과불소계 공중합체 및 이를 포함하는 방오성 광경화 수지 조성물
JP7234946B2 (ja) 2018-01-26 2023-03-08 三菱ケミカル株式会社 感光性樹脂組成物、隔壁、有機電界発光素子、画像表示装置及び照明

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI832690B (zh) * 2023-02-03 2024-02-11 南亞塑膠工業股份有限公司 光阻液及其製造方法

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CN116806326A (zh) 2023-09-26

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