TW202227807A - 高翹曲樣本之表面輪廓測量 - Google Patents

高翹曲樣本之表面輪廓測量 Download PDF

Info

Publication number
TW202227807A
TW202227807A TW109139908A TW109139908A TW202227807A TW 202227807 A TW202227807 A TW 202227807A TW 109139908 A TW109139908 A TW 109139908A TW 109139908 A TW109139908 A TW 109139908A TW 202227807 A TW202227807 A TW 202227807A
Authority
TW
Taiwan
Prior art keywords
sample
measurement
profile
optical elements
reflected light
Prior art date
Application number
TW109139908A
Other languages
English (en)
Chinese (zh)
Inventor
麥可 格林
大衛 歐文
海光 陳
Original Assignee
美商科磊股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商科磊股份有限公司 filed Critical 美商科磊股份有限公司
Publication of TW202227807A publication Critical patent/TW202227807A/zh

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/306—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
TW109139908A 2020-10-13 2020-11-16 高翹曲樣本之表面輪廓測量 TW202227807A (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US202063091171P 2020-10-13 2020-10-13
US63/091,171 2020-10-13
US202063094156P 2020-10-20 2020-10-20
US63/094,156 2020-10-20
PCT/US2020/056945 WO2022081178A1 (en) 2020-10-13 2020-10-23 Surface profile measurements of highly warped samples
WOPCT/US20/56945 2020-10-23

Publications (1)

Publication Number Publication Date
TW202227807A true TW202227807A (zh) 2022-07-16

Family

ID=81209271

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109139908A TW202227807A (zh) 2020-10-13 2020-11-16 高翹曲樣本之表面輪廓測量

Country Status (6)

Country Link
JP (1) JP7543560B2 (ko)
KR (1) KR20230085956A (ko)
CN (1) CN114631001A (ko)
DE (1) DE112020007442T5 (ko)
TW (1) TW202227807A (ko)
WO (1) WO2022081178A1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117739837B (zh) * 2024-02-19 2024-05-07 法博思(宁波)半导体设备有限公司 一种基于衍射元件的对射光谱共焦测厚系统及方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005043073A2 (en) 2003-10-20 2005-05-12 Zygo Corporation Reconfigureable interferometer system
US7966135B2 (en) * 2004-06-01 2011-06-21 California Institute Of Technology Characterizing curvatures and stresses in thin-film structures on substrates having spatially non-uniform variations
JP2010133860A (ja) 2008-12-05 2010-06-17 Canon Inc 形状算出方法
JP5620289B2 (ja) 2011-01-21 2014-11-05 中央精機株式会社 被検面形状測定方法および被検面形状測定装置と被検面形状測定プログラム
US8913236B2 (en) 2011-08-30 2014-12-16 Corning Incorporated Method and device for measuring freeform surfaces
DE102012217800A1 (de) 2012-09-28 2014-04-03 Carl Zeiss Smt Gmbh Diffraktives optisches Element sowie Messverfahren
EP2977720B1 (en) * 2014-07-25 2019-06-05 Mitutoyo Corporation A method for measuring a high accuracy height map of a test surface
US9784570B2 (en) 2015-06-15 2017-10-10 Ultratech, Inc. Polarization-based coherent gradient sensing systems and methods
NL2017881B1 (en) * 2015-12-18 2017-10-17 Ultratech Inc Full-wafer inspection methods having selectable pixel density
EP3382331A1 (en) * 2017-03-30 2018-10-03 Technische Universität München A method and device for obtaining a phase shifted shearogram for shearography

Also Published As

Publication number Publication date
KR20230085956A (ko) 2023-06-15
JP2023547353A (ja) 2023-11-10
DE112020007442T5 (de) 2023-05-11
WO2022081178A1 (en) 2022-04-21
JP7543560B2 (ja) 2024-09-02
CN114631001A (zh) 2022-06-14

Similar Documents

Publication Publication Date Title
US8345262B2 (en) Method and apparatus for determining a deviation of an actual shape from a desired shape of an optical surface
TWI428578B (zh) 局部應力量測
JP6542356B2 (ja) レンズ及びレンズ金型の光学評価
US9234739B2 (en) In situ calibration of interferometers
TW201825864A (zh) 用於圖案化半導體特徵之特徵化的掃描白光干涉測量系統
JP5971965B2 (ja) 面形状計測方法、面形状計測装置、プログラム、および、光学素子の製造方法
KR20090113895A (ko) 유리시트의 결함 측정장치
KR20130037723A (ko) 비구면을 정밀 고해상도로 측정하는 방법
JP2008046051A (ja) 光波干渉測定装置および光波干渉測定方法
US20220170735A1 (en) Diffractive optical element for a test interferometer
US6552806B1 (en) Automated minimization of optical path difference and reference mirror focus in white-light interference microscope objective
WO2007130158A2 (en) Interferometers for the measurement of large diameter thin wafers
TW202227807A (zh) 高翹曲樣本之表面輪廓測量
TWI570397B (zh) 透鏡和透鏡模具的光學評估技術
US7656542B2 (en) Method for evaluating microstructures on a workpiece based on the orientation of a grating on the workpiece
US20030161038A1 (en) Microscope and method for measuring surface topography in a quantitative and optical manner
US7340962B2 (en) Method and device for holding subject and measuring instrument equipped with the device
US7042578B2 (en) Method and apparatus for absolute figure metrology
Jansen et al. Scanning wafer thickness and flatness interferometer
Vishnyakov et al. Automated Interference Tools of the All-Russian Research Institute for Optical and Physical Measurements
TW202246749A (zh) 使用校正板校正光學系統之像差及跡變
US20060023225A1 (en) Microscope and method of measurement of a surface topography
Adapa The application of wavefront sensing methods to optical surface metrology
Kurteva et al. New technique for measuring free-form wafer shape for feed-forward overlay corrections
JP2000275021A (ja) 面形状測定装置