TW202226443A - 基板處理裝置 - Google Patents
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Abstract
本發明係一種對基板進行特定處理之基板處理裝置,上述裝置包含以下要素。上述要素係指:旋轉台,其構成為能夠繞鉛直軸旋轉;旋轉驅動部,其連結於上述旋轉台之中心部,具備經接地之旋轉軸,且於水平面內旋轉驅動上述旋轉台;保持機構,其設置於上述旋轉台之外周側之上表面,具備由導電性材料構成之複數根支持銷,且將基板以與上述旋轉台之上表面分離之狀態呈水平姿勢保持;及接地線,其具備導電性,構成上述旋轉台之一部分,將上述複數根支持銷與上述旋轉軸電性連接。
Description
本發明係關於一種基板處理裝置,其係將半導體晶圓、液晶顯示器或有機EL(Electroluminescence,電致發光)顯示裝置用基板、光罩用玻璃基板、光碟用基板、磁碟用基板、陶瓷基板、太陽電池用基板等基板(以下,簡稱為基板)支持於旋轉台上並以此狀態使其旋轉,同時對基板進行特定處理。
先前,作為此種裝置,有具備旋轉台及複數個支持銷之裝置。例如,參照日本專利特開2017-228582號公報(圖4)。該裝置中,利用複數個支持銷來支持基板,基板之下表面與旋轉台之上表面分離。基板藉由旋轉台而旋轉,同時對其上表面進行特定處理。於基板原本便帶電或供給至基板之處理液帶電之情形時,擔心因帶電引起之靜電力而導致粒子吸附於基板。因此,需要去除基板之電荷。
於先前之裝置中,支持銷之一部分由導電性之材料構成,使支持銷與旋轉軸導通而將支持銷接地。由此,被支持之基板經由支持銷及旋轉軸而接地,從而可去除基板之電荷。
但是,就具有此種構成之先前例來看,存在如下問題。
即,先前之裝置必須要實現複數根支持銷與旋轉軸之導通,該等複數根支持銷俯視下配置於旋轉台之外周側,該旋轉軸俯視下配置於旋轉台之中心部。為此,例如藉由用導電性之材料構成旋轉台,可實現支持銷與旋轉軸之導通。
但是,旋轉台亦必須要具備耐化學品性,因此,基板處理裝置中可利用之材料受限。例如,於先前技術中,列舉了在氟樹脂系之樹脂中混合碳而成之材料。但是,若用此種材料構成旋轉台,則會有成本變得非常高之問題。
本發明係鑒於上述情況而完成者,目的在於提供一種可藉由對實現導通之構成進行研究而防止基板帶電並且抑制成本之基板處理裝置。
本發明為了達成上述目的而採取如下構成。
(1)本發明係一種對基板進行特定處理之基板處理裝置,上述裝置包含以下要素:旋轉台,其構成為能夠繞鉛直軸旋轉;旋轉驅動器件,其連結於上述旋轉台之中心部,具備經接地之旋轉軸,且於水平面內旋轉驅動上述旋轉台;保持機構,其設置於上述旋轉台之外周側之上表面,具備由導電性材料構成之複數根支持銷,且將基板以與上述旋轉台之上表面分離之狀態呈水平姿勢保持;及接地線,其具備導電性,構成上述旋轉台之一部分,將上述複數根支持銷與上述旋轉軸電性連接。
根據本發明,中央部連結於經接地之旋轉軸之旋轉台中之一部分由接地線構成,藉由該接地線來將複數根支持銷與旋轉軸電性連接。因此,與在整個旋轉台中實現導通之構成相比,可防止基板帶電並且抑制成本。
(2)於本發明中,較佳為上述複數根支持銷,係以在PEEK(聚醚醚酮)材料中添加碳奈米管而成之材料構成。
可藉由作為氟系樹脂之PEEK(聚醚醚酮)材料而具備耐化學品性。藉由在該PEEK材料中添加碳奈米管而獲得導電性。因此,可良好地構成接地線。
(3)於本發明中,較佳為上述接地線係於上述旋轉台之面方向上形成為較薄之板狀構件。
由於使用在旋轉台之面方向上形成為較薄之板狀構件來構成接地線,因此,旋轉台旋轉時不易受到風之阻力。因此,可抑制亂流對處理造成之不良影響。
(4)於本發明中,較佳為上述複數根支持銷至少為4根,上述接地線於俯視下形成為十字型,且連接於上述複數根支持銷中之4根。
由於容易形成為十字型,因此可容易構成接地線。又,由於將4個部位接地,因此可充分地去除基板之電荷。
(5)於本發明中,較佳為上述接地線安裝於上述旋轉台之下表面。
可使對基板進行處理之處理液不易回流。又,即便處理液回流,亦可使其容易落下。因此,可抑制因伴隨處理而產生之處理液附著引起之不良狀況。
(6)於本發明中,較佳為上述接地線埋設於上述旋轉台之下表面。
由於將接地線埋設,因此,可減少旋轉台之下表面之凹凸。因此,可抑制伴隨旋轉台旋轉而產生之亂流。
(7)於本發明中,較佳為於上述旋轉台形成有從上述支持銷朝向上述旋轉軸具有長軸之槽,上述槽於與上述長軸正交之短軸處之縱剖面中,呈現上底形成得較下底長之梯形,上述接地線於上述短軸處之縱剖面呈現與上述槽相應之形狀。
可於不使用螺釘等產生之物理力的情況下將接地線經由槽而安裝於旋轉台。因此,可防止施加荷重時隨時間變化而不斷變形之現象(被稱為蠕變現象),此種現象於樹脂等中易產生。
以下,參照附圖就本發明之一實施例進行說明。
圖1係表示實施例之基板處理裝置之整體構成之圖。圖2A係表示整個旋轉台之俯視圖,圖2B係旋轉台之局部放大圖。圖3A係表示整個旋轉台之仰視圖,圖3B係旋轉台之局部放大圖。
實施例之基板處理裝置係逐片處理基板W之單片式處理裝置。該基板處理裝置具備基底單元1、夾頭單元3、防飛散杯5、供給噴嘴7及控制部9。
基底單元1使夾頭單元3旋轉,且解除夾頭單元3對基板W之保持。夾頭單元3將基板W以水平姿勢保持並使其旋轉。防飛散杯5防止從供給噴嘴7供給至基板W之處理液向周圍飛散。防飛散杯5於處理高度(圖1中之實線)、與相當於處理高度下方之交接高度(圖1中之雙點劃線)之間升降。
基底單元1具備電動馬達11及切換機構13。電動馬達11與切換機構13配置於具備耐化學品性之外罩15內。換言之,外罩15覆蓋電動馬達11與切換機構13。由於將電動馬達11與切換機構13配置於外罩15內,因此無須對該等構件實施對處理液具備耐性之處理,或者無須利用對處理液具備耐性之材料來構成。因此,可抑制基底單元1之成本。
電動馬達11於鉛直方向上具備旋轉軸17。旋轉軸17繞鉛直方向之軸芯P1旋轉。旋轉軸17由具有導電性之金屬材料構成。旋轉軸17以與未圖示之接地線導通之方式被電性連接。電動馬達11從編碼器19輸出旋轉軸17之旋轉位置。旋轉軸17藉由軸承21可旋轉地支持,且從外罩15向上方延伸。於旋轉軸17之上部安裝有夾頭單元3。
上述電動馬達11相當於本發明中之「旋轉驅動器件」。
夾頭單元3具備旋轉台23及保持機構25。如圖2A所示,旋轉台23於俯視下呈圓形。旋轉台23例如由對從供給噴嘴7供給之處理液具有耐性之材料構成。具體而言,可列舉例如氟樹脂。更具體而言,可列舉PEEK(聚醚醚酮)。
保持機構25例如具備2根固定銷27及2根可動銷29。旋轉台23於與2根固定銷27及2根可動銷29對應之位置具備貫通口31。各貫通口31從旋轉台23之上表面貫通至下表面。2根固定銷27及2根可動銷29分別插通於貫通口31中。旋轉台23於貫通口31之周圍形成有切開部33。切開部33形成為較旋轉台23之上表面低。切開部33於俯視下呈U字狀。
切開部33使得處理液容易向側方排出。因此,可抑制從旋轉台23之上表面流向側方之處理液滯留於安裝有固定銷27及可動銷29之部位。因此,可防止因滯留之處理液而產生粒子。
再者,上述固定銷27及可動銷29相當於本發明中之「支持銷」。
此處,參照圖4。圖4係固定銷之縱剖視圖。
固定銷27具備下部銷部35及上部銷部37。下部銷部35設置於旋轉台23之下部。下部銷部35經由貫通口31與上部銷部37連結。下部銷部35具有銷支持部35a、固定用螺釘35b、平衡塊35c、蓋構件35d及固定密封件35e。用於將上部銷部37固定於銷支持部35a之固定用螺釘35b係旋入銷支持部35a之上部。於固定用螺釘35b之下部安裝有平衡塊35c。平衡塊35c係用於取得與可動銷29之重量平衡者。於平衡塊35c之下部安裝有蓋構件35d。蓋構件35d將平衡塊35c固定於銷支持部35a。蓋構件35d藉由固定密封件35e而固定於銷支持部35a。銷支持部35a之上部隔著固定密封件35f而安裝有上部銷部37。固定密封件35f防止處理液滲入內部腐蝕固定用螺釘35b等。
上部銷部37具備軸部37a及支持片37b。支持片37b具備突起37c。軸部37a以載置於固定密封件35f之狀態下,藉由固定用螺釘35b而固定於銷支持部35a。支持片37b於俯視下呈橢圓形。支持片37b抵接於基板W之外周側之下表面及外周緣,以此來支持基板W。支持片37b於軸芯P1側形成有傾斜面37d。傾斜面37d具有從軸芯P1向旋轉台23之外周側緩慢變高之傾斜。傾斜面37d抵接於基板W之下表面。支持片37b於俯視下較固定用螺釘35b靠外周側之部位形成有突起37c。突起37c抵接於基板W之外周緣,限制基板W向外側移動。固定銷27係以支持片37b之橢圓形長軸成為沿著旋轉台23之外周緣之姿勢之方式安裝。
於固定銷27中之上部銷部37與銷支持部35a之上表面之接觸部分,可插入填隙片39。填隙片39為不鏽鋼板之薄板。藉由將填隙片39改變為不同厚度、或者增減填隙片39之片數,可調整固定銷27之上部銷部37距離旋轉台23之上表面之高度。由此,可調整基板W之支持高度,從而可將基板W調整為水平。固定密封件35e、35f為具有耐化學品性之彈性構件。具體而言,固定密封件35e、35f例如較佳為氟橡膠(偏二氟乙烯系(FKM)、四氟乙烯-丙烯系(FEPM)、四氟乙烯-全氟乙烯醚系(FFKM)等。
如圖3A所示,固定銷27之下部銷部35隔著銷殼41螺固於旋轉台23之下表面。再者,圖4中,就圖示之關係來看,省略了銷殼41之圖示。上述構成固定銷27之零件中,銷支持部35a與支持片37b較佳為由具有耐化學品性之導電性材料構成。更佳為添加有碳奈米管之導電性PEEK素材(PEEK-CNT)。藉此,能夠確保導電性。
於旋轉台23之下表面設置有接地線43。接地線43構成旋轉台23之一部分。具體而言,如圖2A及圖3A所示,以與2根固定銷27及2根可動銷29導通之方式配置有4條接地線43。接地線43具有導電性。較佳為添加有碳奈米管之導電性PEEK素材(PEEK-CNT)。接地線43之外周側之端部以與銷支持部35a導通之方式安裝。接地線43之軸芯P1側之端部以與旋轉軸17導通之方式安裝。旋轉軸17經由電動馬達11而連接於接地線。
接地線43可藉由作為氟系樹脂之PEEK(聚醚醚酮)材料而具備耐化學品性。藉由在該PEEK材料中添加碳奈米管而獲得導電性。因此,PEEK-CNT可良好地構成接地線43。
此處,參照圖5。圖5係圖4及圖6中之101-101箭視剖視圖。
於旋轉台23之下表面,以俯視下呈十字形之方式形成有槽45。槽45之縱剖面形狀為倒梯形。槽45從固定銷27或可動銷29朝向旋轉軸17具有長軸。槽45於與槽45之長軸正交之短軸之縱剖面上,呈現上底形成得較下底長之梯形。相當於梯形之腳方向之槽45之深度較槽45之長軸短。槽45中嵌埋有上述接地線43。即,接地線43埋設於旋轉台23之下表面。由於將接地線43埋設,因此,可減少旋轉台23之下表面之凹凸。因此,可抑制伴隨旋轉台23之旋轉而產生之亂流。進而,由於將接地線43安裝於旋轉台23之下表面,因此可使得對基板W進行處理之處理液不易流回至接地線43。又,即便處理液回流,亦可使其容易落下。因此,可抑制因處理液附著導致接地線43可能會產生之不良狀況。又,接地線43係於旋轉台23之面方向上形成為較薄之板狀構件。因此,即便不埋設於旋轉台23之下表面而以貼附於下表面之方式進行安裝,於旋轉台23旋轉時亦不易受到風之阻力。因此,可抑制亂流對處理造成之不良影響。接地線43之縱剖面形狀為與槽45大致一致之形狀。換言之,接地線43於槽45之短軸處之縱剖面呈現與槽45相應之形狀。接地線43之外形形成為稍小於槽45。因此,藉由沿著旋轉台23之面於半徑方向上使接地線43穿過槽45,可在不使用螺釘等產生之物理力的情況下將接地線43安裝於槽45。由此,接地線43會緩慢地穿過槽45。因此,可防止施加荷重時隨時間變化而不斷變形之現象(被稱為蠕變現象),樹脂材料中會擔心發生此種現象。由此,可防止接地線43變形而難以實現導通之不良狀況。
於旋轉台23由PEEK等非導電性材料構成之情形時,存在附著粒子因帶電而難以脫離的情況。由此,存在基板W被粒子污染的情況。於本實施例中,藉由配置接地線43,而將上述固定銷27與以下說明之可動銷29接地。因此,可防止帶電,從而可防止上述不良狀況。而且,雖說添加有碳奈米管之導電性PEEK素材之價格非常高,但於本實施例中,並非整個旋轉台23由導電性PEEK素材構成,而是僅俯視下呈十字形之一部分旋轉台23由導電性PEEK素材構成。因此,可與抑制成本之同時防止上述不良狀況。
繼而,參照圖6。圖6係可動銷之縱剖視圖。
可動銷29具備下部銷部47及上部銷部49。下部銷部47設置於旋轉台23之下部。下部銷部47經由貫通口31與上部銷部49連結。下部銷部47具備銷支持部47a、旋轉磁鐵47c、蓋構件47d、固定密封件47e、軸承47f、固定密封件47g及筒狀構件47h。
用於將上部銷部49固定於銷支持部47a之固定用螺釘47b,旋入銷支持部47a之上部。於固定用螺釘47b之下部安裝有旋轉磁鐵47c。旋轉磁鐵47c連結於可動銷29之下端部。如下所述,該旋轉磁鐵47c係藉由切換周圍之磁極來使可動銷29旋動。於旋轉磁鐵47c之下部安裝有蓋構件47d。蓋構件47d將旋轉磁鐵47c固定於銷支持部47a。蓋構件47d藉由固定密封件47e而固定於銷支持部47a。銷支持部47a經由軸承47f及筒狀構件47h並藉由固定密封件47g而安裝於貫通口31。銷支持部47a僅固定於軸承47f之內輪,而未固定於軸承47f之外輪。軸承47f之外輪固定於貫通口31。筒狀構件47h以下表面與銷支持部47a之上表面分離之狀態安裝於銷支持部47a之上部。
筒狀構件47h僅固定於軸承47f之外輪及旋轉台23之下表面。筒狀構件47h以下表面與銷支持部47a分離之方式配置。軸承47f於內輪與外輪之間不具備密封構件。因此,流體可流經軸承47f之內輪與外輪之間。軸承47f由對處理液具有耐性之材料構成。例如,軸承47f較佳為內輪及外輪均由導電性樹脂構成。軸承47f例如較佳為以添加有碳奈米管之導電性PEEK素材構成。又,從確保耐磨性及導電性之方面而言,軸承47f之滾動體較佳為由SiC(碳化矽)構成。沿著軸承47f流下之流體經過筒狀構件47h之下表面與銷支持部47a之間隙之流路47i而向周圍排出。因此,與切開部33之效果相結合,可更有效地防止處理液滯留於旋轉台23上之可動銷29之根部。
上部銷部49具備軸部49a及支持片49b。支持片49b具備突起49c。軸部49a以載置於固定密封件47g之狀態藉由固定用螺釘47b而固定於銷支持部47a。支持片47b於俯視下呈橢圓形。支持片47b抵接於基板W之外周側之下表面及外周緣,以此來支持基板W。支持片47b於軸芯P1側形成有傾斜面49d。傾斜面49d形成有從軸芯P1朝向旋轉台23之外周側緩慢變高之傾斜。傾斜面49d抵接於基板W之下表面。支持片49b於俯視下較固定用螺釘47b靠外周側之部位形成有突起49c。突起49c抵接於基板W之外周緣,以此限制基板W向外側移動。再者,可動銷29與固定銷27同樣,可於上部銷部49與銷支持部47a之上表面之接觸部分插入填隙片51。藉由將填隙片51改變為不同厚度、或增減填隙片51之片數,可調整可動銷29之上部銷部49距離旋轉台23之上表面之高度。由此,可調整基板W之面高度。此種情況亦被稱為面偏移調整。再者,固定密封件47e、47g之材質較佳為與上述固定密封件35e、35f相同。可動銷29構成為能夠藉由軸承47f而繞軸芯P2旋動。
如圖3A及圖3B所示,可動銷29之下部銷部47利用支持板53而螺固固定於旋轉台23之下表面。再者,圖6中,從圖示之關係方面而言,省略了支持板53之圖示。於上述構成可動銷29之零件中,下部銷部47與上部銷部37較佳為由具有耐化學品性之導電性材料構成。更佳為添加有碳奈米管之導電性PEEK素材(PEEK-CNT)。藉此,能夠確保導電性。
可動銷29於旋動至保持位置時,與固定銷27同樣,以支持片49b之橢圓形長軸成為沿著旋轉台23之外周緣之姿勢之方式安裝。因此,藉由將可動銷29旋動至保持位置,而支持片37b、49b之長軸成為沿著旋轉台23之外周緣之姿勢。因此,可減小旋轉台23旋轉時支持片37b、49b之空氣阻力,可抑制固定銷27及可動銷29周圍之氣流紊亂。其結果,可抑制固定銷27及可動銷29附近之基板W之周緣部之處理不均。
圖2A及圖3所示之接地線43係以其外周側之端部與下部銷部47導通之方式安裝。接地線43之軸芯P1側之端部係以與旋轉軸17導通之方式安裝。
參照圖3及圖7。再者,圖7係從下方觀察可動銷所得之立體圖。
支持板53具備一端部53a、另一端部53b、安裝部53c、圓螺釘孔部53d及長螺釘孔部53e。支持板53由對處理液具備耐性之材料構成。該材料較佳為氟樹脂。更佳為PEEK。
一端部53a係沿著相當於旋轉台23之外周緣之圓弧之支持板53之一部位。另一端部53b係在相當於旋轉台23之外周緣之圓弧上,與一端部53a為相反側之一部位。安裝部53c係形成於一端部53a側之供安裝可動銷29之部位。圓螺釘孔部53d係形成於另一端部53b側,且係用於螺固固定於旋轉台23之安裝孔。長螺釘孔部53e係形成於一端部53a側,且係用於螺固於旋轉台23之安裝孔。該孔係於旋轉台23之徑向上具有長軸之長孔。
支持板53如上所述具備長螺釘孔部53e。因此,可於將長螺釘孔部53e之螺釘旋鬆之狀態下,使一端部53a向旋轉台23之徑向移動,以此調整可動銷29於旋轉台23之徑向上之位置。由此,能夠以基板W於旋轉台23之徑向上被恰當地支持之方式容易地進行調整。換言之,能夠以旋轉台23之旋轉中心與基板W之中心一致之方式,即不會出現所謂之「芯偏移」之方式容易地進行調整。其結果,可提高基板W中之處理之面內均一性。
支持板53係於與安裝部53c相鄰之位置形成有收容部55。收容部55位於旋轉台23之下表面,且形成於旋轉磁鐵47c之側方。收容部55中收容有固定磁鐵57。固定磁鐵57不間斷地對旋轉磁鐵47c賦予磁場。被固定磁鐵57賦予磁場之旋轉磁鐵47c因磁力被固定磁鐵57吸引並旋轉,並於穩定之狀態下靜止。因此,可動銷29繞軸芯P2旋動並靜止。該位置成為保持位置。如圖2B中實線所示,保持位置係突起49c抵接於基板W之端緣之位置。另一方面,如圖2B中雙點劃線所示,交接位置係可動銷29繞軸芯P2旋動,突起49c與基板W之端緣分離,基板W之下表面周緣抵接於傾斜面49d而被支持之狀態。因此,當可動銷29位於交接位置時,可藉由未圖示之搬送臂來交接基板W。由於在旋轉磁鐵47c之側方配置有固定磁鐵57,因此,可藉由固定磁鐵57之位置而容易調整可動銷29成為保持位置時之旋動程度。
如圖3A及圖3B所示,上述固定磁鐵57與旋轉磁鐵47c配置於俯視下以旋轉台23之旋轉中心P1為中心之同一圓周上。由於進行此種配置,因此,如圖7所示,固定磁鐵57與旋轉磁鐵47c均能夠從外周側被觀察到。因此,於維護時可容易進行操作。
參照圖1及圖8~圖10。再者,圖8係切換機構之俯視圖。圖9係表示可動銷之保持位置上之磁鐵之位置關係之圖。圖10係表示可動銷之交接位置上之磁鐵之位置關係之圖。
切換機構13具備氣缸59、支持臂61及驅動磁鐵63。氣缸59具備於鉛直方向上伸縮之作動軸65。支持臂61安裝於作動軸65上。支持臂61具有跨及兩根可動銷29之長度。於支持臂61之兩端安裝有驅動磁鐵63。驅動磁鐵63於俯視下位於較旋轉磁鐵47c靠旋轉台23之內周側。換言之,驅動磁鐵63配置於較旋轉磁鐵47c及固定磁鐵57靠旋轉台23之軸芯P1側。驅動磁鐵63產生較固定磁鐵57強之磁力。
切換機構13於保持基板W之保持位置,以驅動磁鐵63位於圖1中實線所示之下降位置之方式使氣缸59之作動軸65收縮。該狀態為通常狀態下之位置,例如於因停電或電源故障等而切斷電源之情形時,會成為該狀態。再者,於俯視下,會成為如圖9所示之位置關係。即,對可動銷29之旋轉磁鐵47c賦予僅由固定磁鐵57產生之磁力,旋轉磁鐵47c與固定磁鐵57因磁力而相互吸引,從而將可動銷29旋動至保持位置。
另一方面,切換機構13於釋放基板W之交接位置,以驅動磁鐵63位於圖1中雙點劃線所示之上升位置之方式使氣缸59之作動軸65伸長。再者,於俯視下,成為如圖10所示之位置關係。即,賦予至可動銷29之旋轉磁鐵47c之較固定磁鐵57更大之磁力從驅動磁鐵63被賦予至旋轉磁鐵47c。於是,旋轉磁鐵47c被驅動磁鐵63吸引,可動銷29被旋動至交接位置。
上述旋轉磁鐵47c、固定磁鐵57及驅動磁鐵63較佳為釹磁鐵。釹磁鐵係以釹、鐵、硼為主成分之稀土類磁鐵(稀土元素磁鐵)。釹磁鐵產生強力之磁場。
切換機構13於俯視下配置於較旋轉磁鐵47c及固定磁鐵57靠旋轉台23之軸芯P1側。因此,可將驅動磁鐵63偏靠旋轉台23之軸芯P1側而配置。因此,可實現切換機構13之小型化。
控制部9包含CPU(Central Processing Unit,中央處理單元)及記憶體等。控制部9控制從供給噴嘴7之處理液之供給、及供給噴嘴7於待機位置與供給位置之間之擺動。待機位置係供給噴嘴7之噴出口如圖1所示相當於軸芯P1之上方之位置。待機位置係供給噴嘴7之噴出口從防飛散杯5向側方偏離之位置。控制部9控制防飛散杯5於處理高度與交接高度之間之升降。控制部9控制電動馬達11之旋轉。例如,控制部9以處理速度為目標按特定加速度提高轉速,於達到處理速度之時點,在整個處理時間範圍內維持處理速度。控制部9於經過處理時間後,以特定之負加速度使轉速下降,並使其停止。對控制部9輸入來自編碼器19之信號。控制部9於使電動馬達11停止時,參照來自編碼器19之輸出。控制部9以成為圖8所示之位置關係之方式使電動馬達11停止。具體而言,以2根可動銷29之旋轉磁鐵47c與切換機構13之驅動磁鐵63於旋轉台23之徑向上對向之方式控制電動馬達11之旋轉。控制部9控制由切換機構13進行之驅動磁鐵63之升降。
上述構成之基板處理裝置例如以如下方式對基板W進行處理。再者,於一般情況下,控制部9不對切換機構13進行操作。即,驅動磁鐵63位於圖1中實線所示之下降位置。該一般情況下,如圖9所示,旋轉磁鐵47c被固定磁鐵57之磁力吸引而旋動。因此,可動銷29成為圖2B中實線所示之保持位置。
控制部9使防飛散杯移動至交接高度,並且操作切換機構13,使驅動磁鐵63移動至上升位置。上升位置係圖1中雙點劃線所示之位置。於是,如圖10所示,旋轉磁鐵47c被驅動磁鐵63吸引。因此,可動銷29處於圖2B中雙點劃線所示之交接位置。
控制部9使保持有作為處理對象之基板W之搬送臂(未圖示)移動至旋轉台23之上方,然後使搬送臂下降而將基板W載置於固定銷27之傾斜面37d及可動銷29之傾斜面49d。
於搬送臂向外側退出之後,控制部9使防飛散杯上升至處理高度。控制部9操作切換機構13,使驅動磁鐵63下降至圖1中實線所示之下降位置。於是,如圖9所示,解除驅動磁鐵63對旋轉磁鐵47c之吸引。因此,旋轉磁鐵47c被固定磁鐵57之磁力吸引而旋動。由此,可動銷29處於圖2B中實線所示之保持位置。
控制部9操作供給噴嘴7,使供給噴嘴7從待機位置擺動至處理位置。然後,於使電動馬達11旋轉到處理速度之狀態下從供給噴嘴7供給處理液,在處理時間內對基板W供給處理液並進行處理。
於經過特定時間之後,藉由上述一連串動作之相反動作來搬出基板W。
根據本實施例,切換機構13於一般情況下,不對旋轉磁鐵47c賦予驅動磁鐵63之磁場,僅於基板W之交接時,才將驅動磁鐵63之磁場賦予至旋轉磁鐵47c,使得各可動銷29旋動至交接位置。因此,一般情況下,係藉由來自固定磁鐵57之磁力來將各可動銷29旋動至保持位置。另一方面,僅於基板W之交接時,才藉由切換機構13之驅動磁鐵63之磁力來將各可動銷29旋動至交接位置。其結果為,無需彈簧、凸輪板、升降板等,因此,能夠以簡單之構成實現旋轉台之輕量化。又,伴隨著旋轉台23之輕量化,於對需定期更換之2個固定銷27及2個可動銷29進行更換之維護時,可容易拆卸旋轉台23。因此,亦可減輕維護時作業人員之負擔。
又,根據本實施例,藉由構成旋轉台23之一部分之接地線,將2根固定銷27及2根可動銷29與旋轉軸17電性連接。因此,與整個旋轉台23中實現導通之構成相比,可防止基板W帶電並且抑制成本。
本發明並不限定於上述實施方式,亦可按以下方式變化實施。
(1)於上述實施例中,將旋轉磁鐵47c與固定磁鐵57配置於以軸芯P1為中心之同一圓周上。但是,本發明並不限定於此種構成。即,亦可將旋轉磁鐵47c與固定磁鐵57配置於旋轉台23之徑向上。
(2)於上述實施例中,將固定磁鐵57配置於旋轉磁鐵47c之側方。但是,本發明並不限定於此種構成。即,固定磁鐵57只要能藉由對旋轉磁鐵47c賦予磁場而使可動銷29旋動至保持位置即可,其配置位置不受限定。
(3)於上述實施例中,切換機構13包括氣缸59,但本發明並不限定於此種構成。即,只要構成為能夠使驅動磁鐵63於接近旋轉磁鐵47c之位置與遠離旋轉磁鐵47c之位置之間移動,則可為任意構成。
(4)於上述實施例中,旋轉台23具備切開部33,但本發明並非必須具備此種構成。
(5)於上述實施例中,構成為可利用支持板53來調整可動銷29於旋轉台23之徑向上之位置。但是,本發明並非必須具備該構成。只要所謂之芯偏移不會對處理造成較大影響,則亦可省略該構成,從而抑制成本。
(6)於上述實施例中,固定銷27與可動銷29之支持片37b、49b於俯視下呈橢圓形。但是,本發明並不限定於此種構成。例如,支持片37b、49b亦可於俯視下呈圓形。
(7)於上述實施例中,夾頭單元3具備2根固定銷27及2根可動銷29。但是,本發明並不限定於上述根數。
(8)於上述實施例中,例示了藉由供給噴嘴7供給處理液而進行處理之基板處理裝置。但是,本發明亦可應用於一面使基板W旋轉一面實施特定處理之基板處理裝置之任意裝置中。
(9)於上述實施例中,固定銷27及可動銷29由PEEK-CNT構成。但是,本發明並不限定於上述材料。即,只要具有耐化學品性且具有導電性,則亦可由其他材料構成。
(10)於上述實施例中,接地線43以俯視下形成為十字型之方式構成。但是,本發明並不限定於此種構成。例如,於可動銷27與固定銷29合計為6根之情形時,亦可形成為俯視下呈6條線狀。但是,即便於此種情形時,亦可構成為6根中之4根十字型接地線43導通。
(11)於上述實施例中,將接地線43設置於旋轉台23之下表面。但是,本發明並不限定於此種構成。即,亦可將接地線43設置於旋轉台23之上表面。又,將接地線43插通於槽45中而安裝,但於不會受到蠕變現象之影響之情形時,亦可藉由螺固等來安裝接地線43。
本發明可於不脫離其精神或基本屬性之情形時,以其他特別形式加以實施,因此,不應參考說明書,而應參考指定了本發明之範圍之申請專利範圍。
1:基底單元
3:夾頭單元
5:防飛散杯
7:供給噴嘴
9:控制部
11:電動馬達
13:切換機構
15:外罩
17:旋轉軸
19:編碼器
21:軸承
23:旋轉台
25:保持機構
27:固定銷
29:可動銷
31:貫通口
33:切開部
35:下部銷部
35a:支持部
35b:固定用螺釘
35c:平衡塊
35d:蓋構件
35e:固定密封件
35f:固定密封件
37:上部銷部
37a:軸部
37b:支持片
37c:突起
37d:傾斜面
41:銷殼
43:接地線
45:槽
47:下部銷部
47a:支持部
47b:固定用螺釘
47c:旋轉磁鐵
47d:蓋構件
47e:固定密封件
47f:軸承
47g:固定密封件
47h:筒狀構件
47i:流路
49:上部銷部
49a:軸部
49b:支持片
49c:突起
49d:傾斜面
51:填隙片
53:支持板
53a:一端部
53b:另一端部
53c:安裝部
53d:圓螺釘孔部
53e:長螺釘孔部
55:收容部
57:固定磁鐵
59:氣缸
61:支持臂
63:驅動磁鐵
65:作動軸
P1:軸芯
P2:軸芯
W:基板
為了說明本發明,附圖中示出了本發明較佳為之若干形式,但係應理解,本發明並不限定於示出之精確佈置及機構。
圖1係表示實施例之基板處理裝置之整體構成之圖,
圖2A係表示整個旋轉台之俯視圖,
圖2B係圖2A之局部放大圖,
圖3A係表示整個旋轉台之仰視圖,
圖3B係圖3A之局部放大圖,
圖4係固定銷之縱剖視圖,
圖5係圖4及圖6中之101-101箭視剖視圖,
圖6係可動銷之縱剖視圖,
圖7係從下方觀察可動銷所得之立體圖,
圖8係切換機構之俯視圖,
圖9係表示可動銷之保持位置上之磁鐵之位置關係的圖,
圖10係表示可動銷之交接位置上之磁鐵之位置關係的圖。
3:夾頭單元
23:旋轉台
27:固定銷
29:可動銷
35:下部銷部
41:銷殼
43:接地線
47:下部銷部
53:支持板
P1:軸芯
Claims (20)
- 一種基板處理裝置,其對基板進行特定處理,上述裝置包含以下要素: 旋轉台,其構成為能夠繞鉛直軸旋轉; 旋轉驅動器件,其連結於上述旋轉台之中心部,具備經接地之旋轉軸,且於水平面內旋轉驅動上述旋轉台; 保持機構,其設置於上述旋轉台之外周側之上表面,具備由導電性材料構成之複數根支持銷,且將基板以與上述旋轉台之上表面分離之狀態呈水平姿勢保持;及 接地線,其具備導電性,構成上述旋轉台之一部分,將上述複數根支持銷與上述旋轉軸電性連接。
- 如請求項1之裝置,其中 上述複數根支持銷,係以在PEEK(聚醚醚酮)材料中添加碳奈米管而成之材料構成。
- 如請求項1之裝置,其中 上述接地線係於上述旋轉台之面方向上,形成為較薄之板狀構件。
- 如請求項2之裝置,其中 上述接地線係於上述旋轉台之面方向上,形成為較薄之板狀構件。
- 如請求項1之裝置,其中 上述複數根支持銷至少為4根, 上述接地線於俯視下形成為十字型,且連接於上述複數根支持銷中之4根。
- 如請求項2之裝置,其中 上述複數根支持銷至少為4根, 上述接地線於俯視下形成為十字型,且連接於上述複數根支持銷中之4根。
- 如請求項3之裝置,其中 上述複數根支持銷至少為4根, 上述接地線於俯視下形成為十字型,且連接於上述複數根支持銷中之4根。
- 如請求項4之裝置,其中 上述複數根支持銷至少為4根, 上述接地線於俯視下形成為十字型,且連接於上述複數根支持銷中之4根。
- 如請求項1之裝置,其中 上述接地線安裝於上述旋轉台之下表面。
- 如請求項2之裝置,其中 上述接地線安裝於上述旋轉台之下表面。
- 如請求項3之裝置,其中 上述接地線安裝於上述旋轉台之下表面。
- 如請求項4之裝置,其中 上述接地線安裝於上述旋轉台之下表面。
- 如請求項5之裝置,其中 上述接地線安裝於上述旋轉台之下表面。
- 如請求項6之裝置,其中 上述接地線安裝於上述旋轉台之下表面。
- 如請求項7之裝置,其中 上述接地線安裝於上述旋轉台之下表面。
- 如請求項8之裝置,其中 上述接地線安裝於上述旋轉台之下表面。
- 如請求項9之裝置,其中 上述接地線埋設於上述旋轉台之下表面。
- 如請求項10之裝置,其中 上述接地線埋設於上述旋轉台之下表面。
- 如請求項11之裝置,其中 上述接地線埋設於上述旋轉台之下表面。
- 如請求項1之裝置,其中 於上述旋轉台形成有從上述支持銷朝向上述旋轉軸具有長軸之槽, 上述槽於與上述長軸正交之短軸處之縱剖面中,呈現上底形成得較下底長之梯形, 上述接地線於上述短軸處之縱剖面,呈現與上述槽相應之形狀。
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JP7281868B2 (ja) * | 2018-01-23 | 2023-05-26 | 株式会社Screenホールディングス | 基板処理方法および基板処理装置 |
KR102097009B1 (ko) * | 2018-06-11 | 2020-05-28 | 세메스 주식회사 | 스핀척 및 기판처리장치 |
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2020
- 2020-11-30 JP JP2020198317A patent/JP2022086363A/ja active Pending
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2021
- 2021-11-12 US US17/524,798 patent/US20220172979A1/en active Pending
- 2021-11-18 TW TW110142905A patent/TWI806245B/zh active
- 2021-11-29 KR KR1020210166812A patent/KR102665573B1/ko active IP Right Grant
- 2021-11-30 CN CN202111461026.2A patent/CN114582784A/zh active Pending
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CN114582784A (zh) | 2022-06-03 |
JP2022086363A (ja) | 2022-06-09 |
TWI806245B (zh) | 2023-06-21 |
KR20220076369A (ko) | 2022-06-08 |
US20220172979A1 (en) | 2022-06-02 |
KR102665573B1 (ko) | 2024-05-14 |
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