TW202222573A - Optical laminate - Google Patents

Optical laminate Download PDF

Info

Publication number
TW202222573A
TW202222573A TW110122767A TW110122767A TW202222573A TW 202222573 A TW202222573 A TW 202222573A TW 110122767 A TW110122767 A TW 110122767A TW 110122767 A TW110122767 A TW 110122767A TW 202222573 A TW202222573 A TW 202222573A
Authority
TW
Taiwan
Prior art keywords
layer
adhesive
bonding
adhesive layer
retardation
Prior art date
Application number
TW110122767A
Other languages
Chinese (zh)
Inventor
白石貴志
朴松熙
Original Assignee
日商住友化學股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商住友化學股份有限公司 filed Critical 日商住友化學股份有限公司
Publication of TW202222573A publication Critical patent/TW202222573A/en

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/023Optical properties
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3033Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
    • G02B5/3041Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
    • G02B5/305Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks including organic materials, e.g. polymeric layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/306Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising vinyl acetate or vinyl alcohol (co)polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/025Electric or magnetic properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29Laminated material
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3083Birefringent or phase retarding elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528Polarisers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363Birefringent elements, e.g. for optical compensation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/42Polarizing, birefringent, filtering
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Organic Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Polarising Elements (AREA)
  • Laminated Bodies (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

A subject of the present invention is providing an optical laminate that can suppress corrosion of metal layer in high temperature and high humidity environment.
A means for attaining the above-mentioned subject is an optical laminate, which includes a linearly polarizing layer, a phase difference layer, a barrier layer, and a pressure-sensitive adhesive layer in this order. The linearly polarizing layer is a polyvinyl alcohol resin film with iodine adsorbed and aligned therein. The phase difference layer includes at least one hardened layer formed by polymerizing and hardening a polymerizable liquid crystal compound. The barrier layer is such provided to directly contact the adhesive layer. The moisture permeability of the barrier layer at a temperature of 40℃ and a relative humidity of 90% RH is 1g/m2/24hr or more and 2000g/m2/24hr or less. The distance from a surface of the linearly polarizing layer on the side of the phase difference layer to a surface of the adhesive layer on the side opposite to the barrier layer is 55 μm or less.

Description

光學積層體 Optical laminate

本發明係有關光學積層體。 The present invention relates to an optical laminate.

偏光板係作為構成液晶顯示裝置、有機EL顯示裝置等顯示裝置的光學元件之一而使用者。偏光板通常具有於直線偏光層的單面或雙面積層有保護層的積層結構,並以該積層結構組裝於顯示裝置。又,在以智慧型手機、平板電腦等行動資訊終端等為中心而使用之觸控面板型式的顯示裝置當中,已知在偏光板與圖像顯示元件之間設置用以構成觸控感測器的導電層(例如專利文獻1至3等)。 Polarizing plates are used as one of optical elements constituting display devices such as liquid crystal display devices and organic EL display devices. The polarizing plate usually has a laminated structure in which a protective layer is layered on one side or two areas of the linear polarizing layer, and is assembled in a display device with the laminated structure. In addition, in display devices of the touch panel type mainly used in mobile information terminals such as smartphones and tablet computers, it is known that a touch sensor is provided between a polarizing plate and an image display element to constitute a touch sensor. the conductive layer (for example, Patent Documents 1 to 3, etc.).

近年來,為了提高顯示裝置的設計性,要求使顯示裝置整體變薄。又,將如可撓性顯示器般之顯示裝置折疊或捲繞時,若顯示裝置的厚度愈小,可使伴隨折疊、捲繞而產生的應力變小而抑制不良狀況的產生。因此,要求將顯示裝置所使用的各種構件薄膜化、及藉由功能整合而削減使用的構件數量。 In recent years, in order to improve the designability of the display device, the entire display device is required to be thinned. In addition, when a display device such as a flexible display is folded or rolled, if the thickness of the display device is smaller, the stress caused by the folding and winding can be reduced, and the occurrence of defects can be suppressed. Therefore, various components used in the display device are required to be thinned and the number of components used can be reduced by functional integration.

[先前技術文獻] [Prior Art Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本特開2015-52765號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2015-52765

[專利文獻2]日本特開2015-172740號公報 [Patent Document 2] Japanese Patent Laid-Open No. 2015-172740

[專利文獻3]國際公開第2020/111232號 [Patent Document 3] International Publication No. 2020/111232

發現在使用金屬層作為用以構成觸控感測器的導電層時,隨著顯示裝置的薄型化而直線偏光層與金屬層的距離變近時,在高溫高濕環境下金屬層容易產生腐蝕。 It is found that when a metal layer is used as a conductive layer for forming a touch sensor, when the distance between the linear polarizing layer and the metal layer becomes closer with the thinning of the display device, the metal layer tends to corrode in a high temperature and high humidity environment .

本發明之目的係提供一種光學積層體,其即使是在藉由使顯示裝置所使用的各種構件薄膜化及/或削減各種構件而使顯示裝置薄型化時,亦可抑制在高溫高濕環境下之金屬層的腐蝕。 It is an object of the present invention to provide an optical laminate which can suppress exposure to a high temperature and high humidity environment even when the display device is thinned by thinning and/or reducing various members used in the display device. Corrosion of the metal layer.

本發明係提供下述的光學積層體。 The present invention provides the following optical laminate.

〔1〕一種光學積層體,係依序包含直線偏光層、相位差層、阻隔層及黏著劑(pressure-sensitive adhesive,又稱壓敏性接著劑)層;其中, [1] An optical laminate, comprising a linear polarizing layer, a retardation layer, a barrier layer and an adhesive (pressure-sensitive adhesive, also known as pressure-sensitive adhesive) layer in sequence; wherein,

前述直線偏光層為吸附配向有碘之聚乙烯醇系樹脂膜, The aforementioned linear polarizing layer is a polyvinyl alcohol-based resin film with iodine adsorbed and aligned,

前述相位差層包含至少1層之由聚合性液晶化合物聚合硬化而成之硬化物層, The retardation layer includes at least one cured product layer formed by polymerizing and curing a polymerizable liquid crystal compound,

前述阻隔層係與前述黏著劑層直接相接而設置, The above-mentioned barrier layer is arranged in direct contact with the above-mentioned adhesive layer,

前述阻隔層之在溫度40℃、相對濕度90%RH的透濕度為1g/m2/24hr以上2000g/m2/24hr以下, The moisture permeability of the aforementioned barrier layer at a temperature of 40°C and a relative humidity of 90% RH is 1g/m 2 /24hr or more and 2000g/m 2 /24hr or less,

從前述直線偏光層之靠前述相位差層側的表面起到前述黏著劑層之與前述阻隔層側為相反側的表面為止的距離為55μm以下。 The distance from the surface on the retardation layer side of the linearly polarizing layer to the surface on the opposite side to the barrier layer side of the adhesive layer is 55 μm or less.

〔2〕如〔1〕所述之光學積層體,其中,將前述光學積層體在溫度85℃、相對濕度85%RH的條件下保管240小時後,前述黏著劑層之碘量為250ppm以下。 [2] The optical layered product according to [1], wherein the iodine content of the adhesive layer is 250 ppm or less after the optical layered product is stored for 240 hours under conditions of a temperature of 85° C. and a relative humidity of 85% RH.

〔3〕如〔1〕或〔2〕所述之光學積層體,其中,前述阻隔層為樹脂膜。 [3] The optical laminate according to [1] or [2], wherein the barrier layer is a resin film.

〔4〕如〔1〕至〔3〕中任一項所述之光學積層體,其中,前述相位差層包含2層的前述硬化物層, [4] The optical laminate according to any one of [1] to [3], wherein the retardation layer includes two layers of the cured product layer,

並且前述相位差層包含用以將前述2層的硬化物層彼此貼合之貼合層(X)。 And the said retardation layer contains the bonding layer (X) for bonding the said two hardened|cured material layers mutually.

〔5〕如〔4〕所述之光學積層體,其中,前述貼合層為接著劑層。 [5] The optical laminate according to [4], wherein the bonding layer is an adhesive layer.

〔6〕如〔1〕至〔5〕中任一項所述之光學積層體,更包含:含有前述直線偏光層的偏光板、及用以將前述偏光板與前述相位差層貼合之貼合層(Y), [6] The optical laminate according to any one of [1] to [5], further comprising: a polarizing plate containing the linear polarizing layer, and a sticker for bonding the polarizing plate and the retardation layer together Laminate (Y),

前述偏光板中,於前述直線偏光層的單面或雙面設置有保護層。 In the aforementioned polarizing plate, a protective layer is provided on one side or both sides of the aforementioned linear polarizing layer.

〔7〕如〔1〕至〔6〕中任一項所述之光學積層體,更包含用以將前述相位差層與前述阻隔層貼合之貼合層(Z)。 [7] The optical laminate according to any one of [1] to [6], further comprising a bonding layer (Z) for bonding the retardation layer and the barrier layer.

〔8〕如〔7〕所述之光學積層體,其中,前述貼合層(Z)為接著劑層。 [8] The optical laminate according to [7], wherein the bonding layer (Z) is an adhesive layer.

〔9〕如〔1〕至〔8〕中任一項所述之光學積層體,其中,於前述黏著劑層之與前述阻隔層側為相反側處更包含金屬層。 [9] The optical laminate according to any one of [1] to [8], further comprising a metal layer on the side opposite to the barrier layer side of the adhesive layer.

〔10〕如〔7〕所述之光學積層體,其中,前述金屬層係與前述黏著劑層直接相接而設置。 [10] The optical laminate according to [7], wherein the metal layer is provided in direct contact with the adhesive layer.

本發明之光學積層體即使在藉由將顯示裝置所使用的各種構件薄膜化及/或削減各種構件而使顯示裝置薄型化的情況,亦可抑制在高溫高濕環境下之金屬層的腐蝕。 The optical laminate of the present invention can suppress corrosion of the metal layer in a high temperature and high humidity environment even when the display device is thinned by thinning and/or reducing various members used in the display device.

1,1a,1b,1c,1d,1e,1f:光學積層體 1, 1a, 1b, 1c, 1d, 1e, 1f: Optical laminates

4:阻隔層 4: Barrier layer

5:黏著劑層 5: Adhesive layer

6:金屬層 6: Metal layer

10:相位差層 10: retardation layer

11:第1硬化物層(硬化物層) 11: The first hardened material layer (hardened material layer)

12:第2硬化物層(硬化物層) 12: Second hardened material layer (hardened material layer)

21:第1貼合層 21: The first bonding layer

22:第2貼合層 22: The second bonding layer

23:貼合層(Y) 23: Lamination layer (Y)

24:貼合層(Z) 24: Lamination layer (Z)

25:貼合層(X) 25: Lamination layer (X)

30:偏光板 30: polarizer

31:直線偏光層 31: Linear polarizing layer

32:第1保護層(保護層) 32: The first protective layer (protective layer)

33:第2保護層(保護層) 33: Second protective layer (protective layer)

圖1為示意性顯示本發明之光學積層體的一例之概略剖面圖。 FIG. 1 is a schematic cross-sectional view schematically showing an example of the optical laminate of the present invention.

圖2為示意性顯示本發明之光學積層體的另一例之概略剖面圖。 FIG. 2 is a schematic cross-sectional view schematically showing another example of the optical laminate of the present invention.

圖3為示意性顯示本發明之光學積層體的又另一例之概略剖面圖。 FIG. 3 is a schematic cross-sectional view schematically showing yet another example of the optical laminate of the present invention.

圖4為示意性顯示本發明之光學積層體的又另一例之概略剖面圖。 FIG. 4 is a schematic cross-sectional view schematically showing yet another example of the optical laminate of the present invention.

圖5為示意性顯示本發明之光學積層體的又另一例之概略剖面圖。 5 is a schematic cross-sectional view schematically showing yet another example of the optical laminate of the present invention.

圖6為示意性顯示本發明之光學積層體的又另一例之概略剖面圖。 6 is a schematic cross-sectional view schematically showing yet another example of the optical laminate of the present invention.

以下參照圖式,說明本發明之光學積層體及剝離方法的較佳實施形態。以下的所有圖式係為了有助於理解本發明而顯示,圖式所示之各構成要件的尺寸、形狀未必與實際的構成要件的尺寸、形狀一致。 Hereinafter, preferred embodiments of the optical laminate and the peeling method of the present invention will be described with reference to the drawings. All the drawings below are shown to facilitate understanding of the present invention, and the dimensions and shapes of the components shown in the drawings do not necessarily correspond to the dimensions and shapes of the actual components.

(光學積層體) (optical laminate)

圖1至圖6為示意性顯示本實施形態之光學積層體的一例之概略剖面圖。本實施形態之光學積層體1a至1f(以下有時將此等統稱為「光學積層體1」)係依序包含直線偏光層31、相位差層10、阻隔層4、及黏著劑層5。直線偏光層31為吸附配向有碘之聚乙烯醇系樹脂膜(以下有時稱為「PVA系膜」)。相位差層10包含至少 1層之由聚合性液晶化合物聚合硬化而成之硬化物層(後述的第1硬化物層11、第2硬化物層12等)。阻隔層4係與黏著劑層5直接相接而設置。阻隔層4之在溫度40℃、相對濕度90%RH的透濕度為1g/m2/24hr以上2000g/m2/24hr以下。光學積層體1中,從直線偏光層31之靠相位差層10側的表面起到黏著劑層5之與阻隔層4側為相反側的表面為止的距離D為55μm以下。 1 to 6 are schematic cross-sectional views schematically showing an example of the optical laminate of the present embodiment. The optical laminates 1a to 1f of the present embodiment (hereinafter, these may be collectively referred to as "optical laminates 1") include a linearly polarizing layer 31, a retardation layer 10, a barrier layer 4, and an adhesive layer 5 in this order. The linearly polarizing layer 31 is a polyvinyl alcohol-based resin film (hereinafter sometimes referred to as "PVA-based film") in which iodine is adsorbed and aligned. The retardation layer 10 includes at least one cured product layer (the first cured product layer 11, the second cured product layer 12, and the like described later) formed by polymerizing and curing a polymerizable liquid crystal compound. The barrier layer 4 is provided in direct contact with the adhesive layer 5 . The moisture permeability of the barrier layer 4 at a temperature of 40° C. and a relative humidity of 90% RH is 1 g/m 2 /24hr or more and 2000 g/m 2 /24hr or less. In the optical layered body 1, the distance D from the surface of the linear polarizing layer 31 on the retardation layer 10 side to the surface of the adhesive layer 5 on the opposite side from the barrier layer 4 side is 55 μm or less.

光學積層體1可進一步如圖5及圖6所示之光學積層體1e、1f一般,在黏著劑層5之與阻隔層4側為相反側處包含金屬層6。金屬層6較佳係與黏著劑層5直接相接而設置。 The optical layered body 1 may further include the metal layer 6 on the opposite side of the adhesive layer 5 from the side of the barrier layer 4 as in the optical layered bodies 1e and 1f shown in FIGS. 5 and 6 . The metal layer 6 is preferably disposed in direct contact with the adhesive layer 5 .

具有上述的層結構之光學積層體1中,在透過黏著劑層5而將光學積層體1a至1d積層於金屬層6時、或在光學積層體1e、1f中,可抑制於金屬層6產生的腐蝕,尤其是於金屬層6產生的孔蝕。藉由光學積層體1可抑制金屬層6的腐蝕的理由推測如下。作為直線偏光層之吸附配向有碘的PVA系膜,在高溫高濕環境下會有微量的碘從PVA系膜滲出。咸認在包含直線偏光層及金屬層的積層體中,從直線偏光層滲出的碘抵達金屬層時,會腐蝕金屬層。在此,在光學積層體1中,以與用以貼合於金屬層6的黏著劑層5相接的方式而設置透濕度位於上述範圍的阻隔層4。藉此,咸認即使是距離D為55μm以下之薄型的光學積層體1,亦可抑制從直線偏光層31滲出的碘抵達金屬層6之情形,並可抑制金屬層6的腐蝕。 In the optical laminate 1 having the above-mentioned layer structure, when the optical laminates 1a to 1d are laminated on the metal layer 6 through the adhesive layer 5, or in the optical laminates 1e, 1f, the occurrence of the metal layer 6 can be suppressed. corrosion, especially pitting corrosion of the metal layer 6. The reason why the corrosion of the metal layer 6 can be suppressed by the optical layered body 1 is presumed as follows. As a PVA film with iodine in the adsorption alignment of the linear polarizing layer, a small amount of iodine oozes out from the PVA film in a high temperature and high humidity environment. In a laminate including a linearly polarizing layer and a metal layer, when iodine oozing out from the linearly polarizing layer reaches the metal layer, it is believed to corrode the metal layer. Here, in the optical layered body 1 , the barrier layer 4 having the moisture permeability in the above-mentioned range is provided so as to be in contact with the adhesive layer 5 for bonding to the metal layer 6 . Accordingly, even in the thin optical layered body 1 with a distance D of 55 μm or less, the iodine exuded from the linear polarizing layer 31 can be suppressed from reaching the metal layer 6 and corrosion of the metal layer 6 can be suppressed.

如圖1至圖6所示,光學積層體1可包含偏光板30,該偏光板30係於直線偏光層31的單面或雙面具有保護層32、33(以下有時分別稱為「第1保護層32」及「第2保護層33」)者。從使光學積層體1薄型化的觀點來看,偏光板30較佳係只於直線偏光層31的單面具有第1保護層32或第2保護層33。當只於直線偏光層31的單面具有保護層時,從保護直線偏光層31的觀點來看,較佳係如圖1及圖2所 示般,在直線偏光層31之與相位差層10側為相反側處具有第1保護層32。由於光學積層體1具有阻隔層4,故即使在設置第1保護層32而未設置第2保護層33的情況,亦可有效地抑制金屬層6的腐蝕。例如,如圖1至圖6所示,第1保護層32及/或第2保護層33可透過第1貼合層21及/或第2貼合層22而設置於直線偏光層31上。第1貼合層21及第2貼合層22為接著劑層或黏著劑層。 As shown in FIGS. 1 to 6 , the optical laminate 1 may include a polarizing plate 30 having protective layers 32 and 33 on one side or both sides of the linear polarizing layer 31 (hereinafter sometimes referred to as “the first 1 protective layer 32" and "second protective layer 33"). From the viewpoint of reducing the thickness of the optical layered body 1 , the polarizing plate 30 preferably has the first protective layer 32 or the second protective layer 33 only on one side of the linearly polarizing layer 31 . When there is a protective layer on only one side of the linear polarizing layer 31, from the viewpoint of protecting the linear polarizing layer 31, it is preferable to be as shown in FIG. 1 and FIG. 2 . As shown, the linear polarizing layer 31 has the first protective layer 32 on the opposite side to the retardation layer 10 side. Since the optical layered body 1 has the barrier layer 4, even when the first protective layer 32 is provided and the second protective layer 33 is not provided, the corrosion of the metal layer 6 can be effectively suppressed. For example, as shown in FIGS. 1 to 6 , the first protective layer 32 and/or the second protective layer 33 may be disposed on the linear polarizing layer 31 through the first bonding layer 21 and/or the second bonding layer 22 . The first bonding layer 21 and the second bonding layer 22 are adhesive layers or adhesive layers.

光學積層體1可進一步包含用以將直線偏光層31或偏光板30與相位差層10貼合之貼合層(Y)23。此時,例如,如圖1至圖6所示,相位差層10係透過貼合層(Y)23而設置於直線偏光層31或偏光板30上。貼合層(Y)23為接著劑層或黏著劑層。或者,相位差層10亦可設置成與直線偏光層31或偏光板30直接相接。 The optical layered body 1 may further include a bonding layer (Y) 23 for bonding the linear polarizing layer 31 or the polarizing plate 30 and the retardation layer 10 together. At this time, for example, as shown in FIGS. 1 to 6 , the retardation layer 10 is provided on the linear polarizing layer 31 or the polarizing plate 30 through the bonding layer (Y) 23 . The bonding layer (Y) 23 is an adhesive layer or an adhesive layer. Alternatively, the retardation layer 10 may also be disposed in direct contact with the linear polarizing layer 31 or the polarizing plate 30 .

光學積層體1可進一步包含用以將相位差層10與阻隔層4貼合之貼合層(Z)24。此時,例如,如圖1至圖6所示,阻隔層4可透過貼合層(Z)24而設置於相位差層10上。貼合層(Z)24為接著劑層或黏著劑層。或者,阻隔層4可設置成與相位差層10直接相接。光學積層體1包含貼合層(Z)24時,貼合層(Z)24較佳為接著劑層。藉此,例如藉由切割刀將光學積層體1裁切時,可在裁切面抑制相位差層10的變形。 The optical layered body 1 may further include a bonding layer (Z) 24 for bonding the retardation layer 10 and the barrier layer 4 together. At this time, for example, as shown in FIGS. 1 to 6 , the barrier layer 4 may be provided on the retardation layer 10 through the bonding layer (Z) 24 . The bonding layer (Z) 24 is an adhesive layer or an adhesive layer. Alternatively, the barrier layer 4 may be disposed in direct contact with the retardation layer 10 . When the optical layered body 1 includes the bonding layer (Z) 24, the bonding layer (Z) 24 is preferably an adhesive layer. Thereby, when the optical layered body 1 is cut with a cutting blade, for example, deformation of the retardation layer 10 can be suppressed on the cut surface.

光學積層體1中,上述距離D為55μm以下,亦可為48μm以下、45μm以下、40μm以下、35μm以下、30μm以下、25μm以下。距離D通常為10μm以上,亦可為15μm以上、20μm以上。 In the optical layered body 1, the distance D is 55 μm or less, and may be 48 μm or less, 45 μm or less, 40 μm or less, 35 μm or less, 30 μm or less, or 25 μm or less. The distance D is usually 10 μm or more, and may be 15 μm or more, or 20 μm or more.

將光學積層體1在溫度85℃、相對濕度85%RH的條件下保管240小時後之前述黏著劑層中之碘量較佳為250ppm以下,更佳為200ppm以下,又更佳為150ppm以下,進一步更佳為100ppm以下,亦可為50ppm以下、30ppm以下、10ppm以下。藉由使上述碘量在上述的範圍內,容易抑制當將光學積層體1曝露 在高溫高濕環境下時之金屬層6的腐蝕。上述碘量例如可藉由下述方式調整,該方式為:調整阻隔層4的上述透濕度;於直線偏光層31設置第1保護層32及/或第2保護層33;調整第1保護層32及/或第2保護層33的種類、厚度等。上述碘量可藉由後述的實施例記載的方法而測定。 The amount of iodine in the adhesive layer is preferably 250 ppm or less, more preferably 200 ppm or less, and more preferably 150 ppm or less, after the optical layered body 1 is stored for 240 hours under the conditions of a temperature of 85° C. and a relative humidity of 85% RH. More preferably, it is 100 ppm or less, and may be 50 ppm or less, 30 ppm or less, or 10 ppm or less. By making the said amount of iodine within the above-mentioned range, it is easy to suppress when the optical layered body 1 is exposed. Corrosion of the metal layer 6 in a high temperature and high humidity environment. The amount of iodine can be adjusted, for example, by the following methods: adjusting the moisture permeability of the barrier layer 4; disposing the first protective layer 32 and/or the second protective layer 33 on the linear polarizing layer 31; adjusting the first protective layer 32 and/or the type, thickness, etc. of the second protective layer 33 . The said iodine amount can be measured by the method described in the Example mentioned later.

圖1至圖4所示之光學積層體1a至1d中,在黏著劑層5之與相位差層10側為相反側處可具有剝離膜。剝離膜為將黏著劑層5予以被覆保護、或支撐黏著劑層5者,且具有作為可對黏著劑層5進行剝離的分離膜之功能。剝離膜可列舉對基材膜的靠黏著劑層側的表面施予矽酮(silicone)處理等離型處理後之膜。構成基材膜的樹脂材料可列舉後述構成保護層的樹脂材料。樹脂膜可為1層結構,亦可為2層以上的多層結構之多層樹脂膜。 In the optical layered bodies 1 a to 1 d shown in FIGS. 1 to 4 , a release film may be provided on the opposite side of the adhesive layer 5 from the retardation layer 10 side. The release film covers the adhesive layer 5 for protection or supports the adhesive layer 5 , and has a function as a separation film that can peel the adhesive layer 5 . Examples of the release film include those obtained by applying a release treatment such as a silicone treatment to the surface of the base film on the adhesive layer side. As a resin material which comprises a base film, the resin material which comprises a protective layer mentioned later is mentioned. The resin film may have a single-layer structure, or may be a multilayer resin film having a multilayer structure of two or more layers.

圖1至圖4所示之光學積層體1a至1d可構成圓偏光板,且可作為有機EL(電致發光)顯示裝置等中之抗反射膜使用。光學積層體1a至1d為圓偏光板時,相位差層10中所含之硬化物層的至少1層較佳為具有λ/4波長相位差特性之層。如圖2、圖4、及圖6所示,相位差層10包含第1硬化物層11及第2硬化物層12時,第1硬化物層11及第2硬化物層12分別可為[i]1/2波長相位差層及1/4波長相位差層、[ii]1/4波長相位差層及正型C板、或[iii]正型C板及1/4波長相位差層。λ/4波長相位差層可為具有逆波長分散性者。 The optical laminates 1 a to 1 d shown in FIGS. 1 to 4 can constitute a circular polarizing plate, and can be used as an antireflection film in an organic EL (electroluminescence) display device or the like. When the optical layered bodies 1a to 1d are circularly polarizing plates, at least one layer of the cured product layer contained in the retardation layer 10 is preferably a layer having a λ/4 wavelength retardation characteristic. As shown in FIGS. 2 , 4 , and 6 , when the retardation layer 10 includes the first cured product layer 11 and the second cured product layer 12 , the first cured product layer 11 and the second cured product layer 12 can be respectively [ i] 1/2 wavelength retardation layer and 1/4 wavelength retardation layer, [ii] 1/4 wavelength retardation layer and positive type C plate, or [iii] positive type C plate and 1/4 wavelength retardation layer . The λ/4 wavelength retardation layer may have reverse wavelength dispersion.

光學積層體1可使用於智慧型手機、平板電腦等顯示裝置,尤其適合使用於觸控面板型式的顯示裝置。顯示裝置可列舉有機EL顯示裝置、液晶顯示裝置等。顯示裝置可為可撓性顯示器。 The optical laminate 1 can be used in display devices such as smart phones and tablet computers, and is especially suitable for use in display devices of a touch panel type. As a display device, an organic EL display device, a liquid crystal display device, etc. are mentioned. The display device may be a flexible display.

以下說明光學積層體1中所使用的各構件之詳細內容。 The details of each member used in the optical layered body 1 will be described below.

(直線偏光層) (linear polarizing layer)

直線偏光層係具有在入射無偏光的光時使具有與吸收軸正交的振動面之直線偏光穿透的性質。直線偏光層為吸附配向有碘之PVA系膜。 The linearly polarizing layer has the property of transmitting linearly polarized light having a vibration plane orthogonal to the absorption axis when unpolarized light is incident. The linear polarizing layer is a PVA film with iodine adsorbed and aligned.

直線偏光層例如可列舉:對聚乙烯醇膜、部分縮甲醛化聚乙烯醇膜、乙烯/乙酸乙烯酯共聚物系部分皂化膜等PVA系膜施予藉由碘所進行的染色處理、及延伸處理而成者等。視需要,可將藉由染色處理而吸附配向有碘之PVA系膜以硼酸水溶液進行處理,然後進行將硼酸水溶液沖洗掉之洗淨步驟。各步驟中可採用公知的方法。 Examples of the linear polarizing layer include applying dyeing treatment with iodine and stretching to PVA-based films such as polyvinyl alcohol films, partially formalized polyvinyl alcohol films, and ethylene/vinyl acetate copolymer-based partially saponified films. processed, etc. If necessary, the PVA-based film with iodine adsorbed and aligned by dyeing treatment may be treated with a boric acid aqueous solution, and then a washing step of washing away the boric acid aqueous solution may be performed. A well-known method can be used for each step.

聚乙烯醇系樹脂(以下有時稱為「PVA系樹脂」)可藉由使聚乙酸乙烯酯系樹脂皂化而製造。聚乙酸乙烯酯系樹脂除了屬於乙酸乙烯酯的均聚物之聚乙酸乙烯酯以外,亦可為乙酸乙烯酯及可與乙酸乙烯酯共聚的其他單體之共聚物。可與乙酸乙烯酯共聚的其他單體例如可列舉不飽和羧酸類、烯烴類、乙烯基醚類、不飽和磺酸類、具有銨基的丙烯醯胺類等。 A polyvinyl alcohol-based resin (hereinafter sometimes referred to as "PVA-based resin") can be produced by saponifying a polyvinyl acetate-based resin. In addition to polyvinyl acetate, which is a homopolymer of vinyl acetate, the polyvinyl acetate-based resin may also be a copolymer of vinyl acetate and other monomers that can be copolymerized with vinyl acetate. Examples of other monomers that can be copolymerized with vinyl acetate include unsaturated carboxylic acids, olefins, vinyl ethers, unsaturated sulfonic acids, acrylamides having an ammonium group, and the like.

PVA系樹脂的皂化度通常為85至100莫耳%左右,較佳為98莫耳%以上。PVA系樹脂可經改性,例如亦可使用經醛類改性的聚乙烯醇縮甲醛、聚乙烯醇縮乙醛等。PVA系樹脂的平均聚合度通常為1,000至10,000左右,較佳為1,500至5,000左右。PVA系樹脂的平均聚合度可依據JIS K 6726(1994)求出。平均聚合度未達1000時難以得到較佳的偏光性能,超過10000時會有膜加工性變差之情形。 The degree of saponification of the PVA-based resin is usually about 85 to 100 mol %, preferably 98 mol % or more. PVA-based resins can be modified, and for example, aldehyde-modified polyvinyl formal, polyvinyl acetal, and the like can also be used. The average degree of polymerization of the PVA-based resin is usually about 1,000 to 10,000, preferably about 1,500 to 5,000. The average degree of polymerization of the PVA-based resin can be determined in accordance with JIS K 6726 (1994). When the average degree of polymerization is less than 1,000, it is difficult to obtain better polarization performance, and when it exceeds 10,000, the film processability may deteriorate.

包含PVA系膜的直線偏光層之製造方法,可包含下述步驟,該步驟為:準備基材膜,於基材膜上塗布PVA系樹脂等樹脂的溶液,進行除去溶劑的乾燥等而在基材膜上形成樹脂層。此外,於基材膜之欲形成樹脂層的表面可預先形成底塗層。基材膜可使用PET等樹脂膜、或採用了可用於後述的保護層之熱塑 性樹脂的膜。底塗層的材料可列舉用於直線偏光層的親水性樹脂經交聯後之樹脂等。 The method for producing a linearly polarizing layer comprising a PVA-based film may include the steps of preparing a base film, coating a solution of a resin such as a PVA-based resin on the base film, and drying the base film to remove the solvent. A resin layer is formed on the material film. In addition, an undercoat layer may be formed in advance on the surface of the base film on which the resin layer is to be formed. As the base film, a resin film such as PET can be used, or a thermoplastic that can be used for the protective layer described later can be used. resin film. As the material of the undercoat layer, the hydrophilic resin used for the linear polarizing layer is cross-linked, and the like is mentioned.

其次,視需要調整樹脂層的水分等的溶劑量,然後將基材膜及樹脂層單軸延伸,接著將樹脂層以碘染色而使碘吸附配向於樹脂層。其次,視需要將吸附配向有碘之樹脂層以硼酸水溶液進行處理,然後進行將硼酸水溶液沖洗掉之洗淨步驟。藉此,製造出吸附配向有碘之樹脂層亦即直線偏光層的膜。在各步驟中可採用公知的方法。 Next, after adjusting the amount of solvent such as moisture in the resin layer as necessary, the base film and the resin layer are uniaxially stretched, and the resin layer is then dyed with iodine to adsorb and align the iodine on the resin layer. Next, if necessary, the resin layer with iodine adsorbed and aligned is treated with a boric acid aqueous solution, and then a cleaning step of rinsing the boric acid aqueous solution is performed. Thereby, the film of the resin layer in which iodine is adsorbed and aligned, that is, a linear polarizing layer is produced. A known method can be employed in each step.

將吸附配向有碘之PVA系膜或樹脂層進行處理之含硼酸的水溶液中之硼酸的量,通常相對於每100重量份的水為2至15重量份左右,較佳為5至12重量份。使用碘作為二色性色素時,該含硼酸的水溶液較佳係含有碘化鉀。含硼酸的水溶液中之碘化鉀的量通常相對於每100重量份的水為0.1至15重量份左右,較佳為5至12重量份左右。於含硼酸的水溶液之浸漬時間通常為60至1,200秒左右,較佳為150至600秒左右,更佳為200至400秒左右。含硼酸的水溶液之溫度通常為50℃以上,較佳為50至85℃,更佳為60至80℃。 The amount of boric acid in the boric acid-containing aqueous solution for treating the iodine-adsorbed PVA-based film or resin layer is usually about 2 to 15 parts by weight, preferably 5 to 12 parts by weight per 100 parts by weight of water . When iodine is used as the dichroic dye, the boric acid-containing aqueous solution preferably contains potassium iodide. The amount of potassium iodide in the boric acid-containing aqueous solution is usually about 0.1 to 15 parts by weight, preferably about 5 to 12 parts by weight, per 100 parts by weight of water. The immersion time in the boric acid-containing aqueous solution is usually about 60 to 1,200 seconds, preferably about 150 to 600 seconds, and more preferably about 200 to 400 seconds. The temperature of the boric acid-containing aqueous solution is usually 50°C or higher, preferably 50 to 85°C, more preferably 60 to 80°C.

PVA系膜、以及基材膜及樹脂層的單軸延伸可在染色前進行、在染色中進行、在染色後的硼酸處理中進行、或在該等複數個階段中各別進行單軸延伸。PVA系膜、以及基材膜及樹脂層可在MD方向(膜搬送方向)進行單軸延伸,此時,可在周速相異的滾輪間在單軸進行延伸、或使用熱滾輪在單軸進行延伸。又,PVA系膜、以及基材膜及樹脂層可在TD方向(與膜搬送方向垂直的方向)進行單軸延伸,此時可使用所謂的拉幅法。又,上述延伸可為在大氣中進行延伸的乾式延伸,亦可為使PVA系膜或樹脂層在溶劑中膨潤的狀態進行延伸的濕式延伸。要顯現直線偏光層的性能時,延伸倍率為4倍以上,較佳為5倍以上,特佳為5.5 倍以上。延伸倍率的上限並無特別者,但從抑制斷裂等的觀點來看,較佳為8倍以下。 The uniaxial stretching of the PVA-based film, the base film, and the resin layer can be performed before dyeing, during dyeing, during boric acid treatment after dyeing, or uniaxially stretched in each of these plural stages. The PVA-based film, the base film, and the resin layer can be uniaxially stretched in the MD direction (film conveying direction). to extend. In addition, the PVA-based film, the base film, and the resin layer can be uniaxially stretched in the TD direction (direction perpendicular to the film conveying direction), and in this case, a so-called tenter method can be used. In addition, the above-mentioned stretching may be dry stretching in which the stretching is performed in the atmosphere, or wet stretching in which the PVA-based film or the resin layer is stretched in a state of being swollen in a solvent. When the performance of the linear polarizing layer is to be exhibited, the stretching magnification is 4 times or more, preferably 5 times or more, and particularly preferably 5.5 times. times more. There is no particular upper limit of the stretching ratio, but it is preferably 8 times or less from the viewpoint of suppressing breakage and the like.

使用基材膜的製造方法中所製作之直線偏光層,可藉由積層後述的保護層後將基材膜剝離而得到。藉由此方法,可使直線偏光層更進一步薄膜化。 The linearly polarizing layer produced by the manufacturing method of a base film can be obtained by peeling a base film after laminating|stacking the protective layer mentioned later. By this method, the linearly polarizing layer can be further thinned.

直線偏光層的厚度較佳為1μm以上,亦可為2μm以上、或5μm以上,而且較佳為30μm以下,更佳為15μm以下,又更佳為10μm以下,亦可為8μm以下。直線偏光層的厚度愈小時,在高溫高濕環境下愈容易滲出碘。因此,直線偏光層的厚度較小時,藉由設為如本實施形態之光學積層體1般,可有效地抑制於金屬層6所產生的腐蝕。 The thickness of the linear polarizing layer is preferably 1 μm or more, also can be 2 μm or more, or 5 μm or more, and preferably 30 μm or less, more preferably 15 μm or less, and more preferably 10 μm m or less, or 8 μm or less. The smaller the thickness of the linear polarizing layer, the easier it is to seep out iodine in a high temperature and high humidity environment. Therefore, when the thickness of the linearly polarizing layer is small, by setting it as the optical layered body 1 of the present embodiment, corrosion of the metal layer 6 can be effectively suppressed.

在將吸附配向有碘之PVA系膜或樹脂層以硼酸水溶液進行處理,然後沖洗掉硼酸水溶液之洗淨步驟中,硼酸水溶液中之硼酸濃度愈低時,在高溫高濕環境下愈容易滲出碘。因此,直線偏光層的製造步驟中所使用的上述硼酸水溶液中之硼酸濃度較低時,藉由設為如本實施形態之光學積層體1般,可有效地抑制於金屬層6所產生的腐蝕。 In the cleaning step of treating the iodine-adsorbed PVA film or resin layer with a boric acid aqueous solution and then rinsing the boric acid aqueous solution, the lower the boric acid concentration in the boric acid aqueous solution, the easier it is to seep out iodine in a high temperature and high humidity environment . Therefore, when the boric acid concentration in the boric acid aqueous solution used in the production step of the linear polarizing layer is low, the corrosion of the metal layer 6 can be effectively suppressed by setting it as the optical layered body 1 of the present embodiment. .

(偏光板) (Polarizer)

如圖1至圖6所示,可在直線偏光層31的單面或雙面積層保護層(第1保護層32及/或第2保護層33)而形成偏光板30。該偏光板30為所謂的直線偏光板。可積層於直線偏光層31的單面或雙面之第1保護層32及/或第2保護層33例如可使用由透明性、機械強度、熱穩定性、水分遮斷性、等向性、延伸性等優異的熱塑性樹脂所形成的膜。熱塑性樹脂的具體例可列舉:三乙酸纖維素等纖維素樹脂;聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯等聚酯樹脂;聚醚碸樹脂;聚碸樹脂;聚碳酸 酯樹脂;尼龍、芳香族聚醯胺等聚醯胺樹脂;聚醯亞胺樹脂;聚乙烯、聚丙烯、乙烯/丙烯共聚物等聚烯烴樹脂;具有環系及降莰烯結構的環狀聚烯烴樹脂(亦稱為降莰烯系樹脂);(甲基)丙烯酸樹脂;聚芳酯樹脂;聚苯乙烯樹脂;聚乙烯醇樹脂、以及此等的混合物。第1保護層32及第2保護層33的樹脂組成可為相同或相異。此外,在本說明書中,「(甲基)丙烯酸」係意指可為丙烯酸或甲基丙烯酸之任一者。(甲基)丙烯酸酯等的「(甲基)」亦為相同的義意。 As shown in FIGS. 1 to 6 , the polarizing plate 30 may be formed on a single-sided or double-sided protective layer (the first protective layer 32 and/or the second protective layer 33 ) on the linear polarizing layer 31 . The polarizing plate 30 is a so-called linear polarizing plate. The first protective layer 32 and/or the second protective layer 33 that can be laminated on one side or both sides of the linear polarizing layer 31 can be used, for example, by transparency, mechanical strength, thermal stability, moisture barrier, isotropy, A film formed of a thermoplastic resin excellent in elongation and the like. Specific examples of thermoplastic resins include: cellulose resins such as cellulose triacetate; polyester resins such as polyethylene terephthalate and polyethylene naphthalate; polyether resins; polyresins; polycarbonates Ester resins; polyamide resins such as nylon and aromatic polyamide; polyimide resins; polyolefin resins such as polyethylene, polypropylene, and ethylene/propylene copolymers; Olefin resins (also called norbornene-based resins); (meth)acrylic resins; polyarylate resins; polystyrene resins; polyvinyl alcohol resins, and mixtures of these. The resin compositions of the first protective layer 32 and the second protective layer 33 may be the same or different. In addition, in this specification, "(meth)acrylic acid" means that either acrylic acid or methacrylic acid may be used. The "(meth)" of (meth)acrylate etc. also has the same meaning.

第1保護層32及第2保護層33之在溫度40℃、相對濕度90%RH的透濕度並無特別限定。本實施形態之光學積層體1中,第1保護層32的上述透濕度為300g/m2/24hr以下時,可有效地抑制金屬層的腐蝕,而且,第1保護層32的上述透濕度為100g/m2/24hr以下時,可更進一步有效地抑制金屬層的腐蝕。第1保護層32的上述透濕度變小時,在光學積層體1中直線偏光層31中之碘不容易移動至第1保護層32側,而容易移動至黏著劑層5側。由於光學積層體1中具有阻隔層4,故即使如上述般碘容易移動至黏著劑層5側,亦可抑制黏著劑層5之與阻隔層4側為相反側處所設置的金屬層6受到腐蝕之情形。第1保護層32及第2保護層33的上述透濕度可藉由透濕度試驗法(透濕杯法,JIS Z 0208)而測定。 The moisture permeability of the first protective layer 32 and the second protective layer 33 at a temperature of 40° C. and a relative humidity of 90% RH is not particularly limited. In the optical layered body 1 of the present embodiment, when the above-mentioned water vapor transmission rate of the first protective layer 32 is 300 g/m 2 /24hr or less, corrosion of the metal layer can be effectively suppressed, and the above-mentioned water vapor transmission rate of the first protective layer 32 is: When it is 100 g/m 2 /24hr or less, the corrosion of the metal layer can be further effectively suppressed. When the above-mentioned moisture permeability of the first protective layer 32 decreases, iodine in the linearly polarizing layer 31 in the optical layered body 1 does not easily move to the first protective layer 32 side, but tends to move to the adhesive layer 5 side. Since the optical layered body 1 has the barrier layer 4, even if the iodine easily migrates to the side of the adhesive layer 5 as described above, the metal layer 6 provided on the opposite side of the adhesive layer 5 from the side of the barrier layer 4 can be suppressed from being corroded situation. The above-mentioned moisture permeability of the first protective layer 32 and the second protective layer 33 can be measured by a moisture permeability test method (moisture permeability cup method, JIS Z 0208).

第1保護層32及第2保護層33可為具有相位差特性者,亦可為硬塗層、抗反射層等具有功能特性之光學功能層。第1保護層32及第2保護層33的厚度分別獨立地較佳為3μm以上,更佳為5μm以上,且較佳為50μm以下,更佳為30μm以下。 The first protective layer 32 and the second protective layer 33 may be those having retardation properties, or may be optical functional layers having functional properties such as a hard coat layer and an antireflection layer. The thicknesses of the first protective layer 32 and the second protective layer 33 are independently preferably 3 μm or more, more preferably 5 μm or more, and preferably 50 μm or less, more preferably 30 μm or less.

第1保護層32及第2保護層33係以分別藉由第1貼合層21及第2貼合層22而與直線偏光層貼合為較佳(圖1至圖6)。第1貼合層21及第2貼合層22為接 著劑層或黏著劑層。接著劑層及黏著劑層可使用後述者。第1貼合層21及第2貼合層22較佳為使用後述的水系接著劑所形成之接著劑層。 Preferably, the first protective layer 32 and the second protective layer 33 are bonded to the linear polarizing layer through the first bonding layer 21 and the second bonding layer 22 respectively ( FIGS. 1 to 6 ). The first bonding layer 21 and the second bonding layer 22 are connected Adhesive layer or adhesive layer. For the adhesive layer and the adhesive layer, those described later can be used. The first bonding layer 21 and the second bonding layer 22 are preferably adhesive layers formed using a water-based adhesive to be described later.

(相位差層) (retardation layer)

相位差層10包含具有相位差特性的層。具有相位差特性的層可列舉由聚合性液晶化合物聚合硬化而成之硬化物層。相位差層10包含至少1層的硬化物層,亦可包含2層以上的硬化物層。包含2層以上的硬化物層時,相位差層10可包含用以將硬化物層彼此貼合之貼合層(例如圖2、圖4、及圖6所示之貼合層(X)25)。硬化物層可為1/2波長相位差層、1/4波長相位差層、或正型C板。1/4波長相位差層可為逆波長分散性。相位差層包含2層以上的硬化物層時,硬化物層可具有彼此相同的相位差特性,亦可具有彼此相異的相位差特性。 The retardation layer 10 includes a layer having retardation characteristics. Examples of the layer having retardation properties include a cured product layer obtained by polymerization and curing of a polymerizable liquid crystal compound. The retardation layer 10 includes at least one cured product layer, and may include two or more cured product layers. When including two or more cured material layers, the retardation layer 10 may include a bonding layer for bonding the cured material layers to each other (for example, the bonding layer (X) 25 shown in FIG. 2 , FIG. 4 , and FIG. 6 ) ). The hardened material layer may be a 1/2 wavelength retardation layer, a 1/4 wavelength retardation layer, or a positive type C plate. The 1/4 wavelength retardation layer may have reverse wavelength dispersion. When the retardation layer includes two or more cured product layers, the cured product layers may have mutually the same retardation characteristics or may have mutually different retardation characteristics.

聚合性液晶化合物可列舉棒狀的聚合性液晶化合物及圓盤狀的聚合性液晶化合物,可使用該等中之其中一者,亦可使用包含該等兩者的混合物。棒狀的聚合性液晶化合物相對於基材層呈水平配向或垂直配向時,該聚合性液晶化合物的光軸係與該聚合性液晶化合物的長軸方向一致。配向圓盤狀的聚合性液晶化合物時,該聚合性液晶化合物的光軸係存在於與該聚合性液晶化合物的圓盤面正交的方向。棒狀的聚合性液晶化合物例如可適合使用日本特表平11-513019號公報(請求項1等)記載者。圓盤狀的聚合性液晶化合物可適合使用日本特開2007-108732號公報(段落[0020]至[0067]等)、日本特開2010-244038號公報(段落[0013]至[0108]等)記載者。 The polymerizable liquid crystal compound includes a rod-shaped polymerizable liquid crystal compound and a disc-shaped polymerizable liquid crystal compound, and one of these may be used, or a mixture containing both may be used. When the rod-shaped polymerizable liquid crystal compound is aligned horizontally or vertically with respect to the base material layer, the optical axis of the polymerizable liquid crystal compound is aligned with the long axis direction of the polymerizable liquid crystal compound. When aligning a discotic polymerizable liquid crystal compound, the optical axis of the polymerizable liquid crystal compound exists in a direction orthogonal to the disc plane of the polymerizable liquid crystal compound. As the rod-shaped polymerizable liquid crystal compound, for example, those described in JP-A No. 11-513019 (claim 1, etc.) can be suitably used. As the discotic polymerizable liquid crystal compound, JP 2007-108732 A (paragraphs [0020] to [0067] etc.) and JP 2010-244038 A (paragraphs [0013] to [0108] etc.) can be suitably used recorder.

欲使藉由將聚合性液晶化合物聚合而形成之硬化物層顯現面內相位差時,只要使聚合性液晶化合物在合適的方向配向即可。聚合性液晶化合物為棒狀時,藉由使該聚合性液晶化合物的光軸相對於基材層平面在水平配向而 使面內相位差顯現,此時,光軸方向與慢軸方向為一致。聚合性液晶化合物為圓盤狀時,藉由使該聚合性液晶化合物的光軸相對於基材層平面在水平配向而使面內相位差顯現,此時,光軸與慢軸為正交。聚合性液晶化合物的配向狀態可藉由配向層與聚合性液晶化合物的組合而調整。 In order to express the in-plane retardation in the cured product layer formed by polymerizing the polymerizable liquid crystal compound, the polymerizable liquid crystal compound may be aligned in an appropriate direction. When the polymerizable liquid crystal compound is rod-shaped, the optical axis of the polymerizable liquid crystal compound is aligned horizontally with respect to the plane of the substrate layer. The in-plane retardation is visualized, and at this time, the optical axis direction and the slow axis direction coincide. When the polymerizable liquid crystal compound has a disc shape, the optical axis of the polymerizable liquid crystal compound is aligned horizontally with respect to the plane of the base material layer to express in-plane retardation, and at this time, the optical axis and the slow axis are orthogonal. The alignment state of the polymerizable liquid crystal compound can be adjusted by the combination of the alignment layer and the polymerizable liquid crystal compound.

聚合性液晶化合物為具有至少1個聚合性基且具有液晶性之化合物。併用2種以上的聚合性液晶化合物時,較佳係至少1種於分子內具有2個以上的聚合性基。聚合性基係意指參與聚合反應的基,較佳為光聚合性基。在此,光聚合性基係指可藉由後述的光聚合起始劑產生的活性自由基、酸等而參與聚合反應之基。聚合性基可列舉乙烯基、乙烯基氧基、1-氯乙烯基、異丙烯基、4-乙烯基苯基、丙烯醯氧基、甲基丙烯醯氧基、環氧乙烷基(oxiranyl)、氧雜環丁烷基、苯乙烯基、烯丙基等。其中,較佳為丙烯醯氧基、甲基丙烯醯氧基、乙烯基氧基、環氧乙烷基及氧雜環丁烷基,更佳為丙烯醯氧基。聚合性液晶化合物所具有的液晶性可為熱致性液晶或溶致液晶,若以秩序性來分類熱致液晶,則可為向列型液晶或層列型液晶。 The polymerizable liquid crystal compound is a compound having at least one polymerizable group and having liquid crystallinity. When two or more types of polymerizable liquid crystal compounds are used in combination, at least one type preferably has two or more polymerizable groups in the molecule. The polymerizable group means a group that participates in a polymerization reaction, and is preferably a photopolymerizable group. Here, the photopolymerizable group refers to a group that can participate in a polymerization reaction by an active radical, an acid, or the like generated by a photopolymerization initiator described later. Examples of the polymerizable group include vinyl, vinyloxy, 1-chlorovinyl, isopropenyl, 4-vinylphenyl, acryloxy, methacryloyloxy, and oxiranyl. , oxetanyl, styryl, allyl, etc. Among them, an acryloxy group, a methacryloyloxy group, a vinyloxy group, an oxiranyl group, and an oxetanyl group are preferable, and an acryloxy group is more preferable. The liquid crystallinity possessed by the polymerizable liquid crystal compound may be a thermotropic liquid crystal or a lyotropic liquid crystal, and if the thermotropic liquid crystal is classified by orderliness, it may be a nematic liquid crystal or a smectic liquid crystal.

相位差層10包含聚合性液晶化合物的硬化物層時,相位差層10可包含配向層。配向層係具有使聚合性液晶化合物在期望的方向配向之配向規制力。配向層可為使聚合性液晶化合物的分子軸相對於基材層呈垂直配向之垂直配向層,亦可為使聚合性液晶化合物的分子軸相對於基材層呈水平配向之水平配向層,也可為使聚合性液晶化合物的分子軸相對於基材層呈傾斜配向之傾斜配向層。相位差層包含2層以上的配向層時,配向層可為彼此相同,亦可為彼此相異。 When the retardation layer 10 includes a cured product layer of a polymerizable liquid crystal compound, the retardation layer 10 may include an alignment layer. The alignment layer has an alignment regulation force to align the polymerizable liquid crystal compound in a desired direction. The alignment layer can be a vertical alignment layer that aligns the molecular axis of the polymerizable liquid crystal compound vertically with respect to the base material layer, or a horizontal alignment layer that aligns the molecular axis of the polymerizable liquid crystal compound horizontally with respect to the base material layer. It may be an oblique alignment layer that aligns the molecular axis of the polymerizable liquid crystal compound obliquely with respect to the base material layer. When the retardation layer includes two or more alignment layers, the alignment layers may be the same or different from each other.

配向層較佳係具有不會因塗布包含聚合性液晶化合物的液晶層形成用組成物等而溶解之耐溶劑性,且對於用以除去溶劑、配向聚合性液晶化合物的加熱處理具有耐熱性者。配向層可列舉由配向性聚合物所形成的配向性聚合物層、由光配向聚合物所形成的光配向性聚合物層、於層表面具有凹凸圖案或複數條溝(groove)的溝配向層。 The alignment layer preferably has solvent resistance that does not dissolve by applying a liquid crystal layer-forming composition containing a polymerizable liquid crystal compound or the like, and has heat resistance to heat treatment for removing the solvent and aligning the polymerizable liquid crystal compound. The alignment layer includes an alignment polymer layer formed of an alignment polymer, a photoalignment polymer layer formed of a photo-alignment polymer, and a groove alignment layer having a concavo-convex pattern or a plurality of grooves on the surface of the layer. .

硬化物層的厚度可為0.1μm以上、0.5μm以上、1μm以上或2μm以上,而且較佳為10μm以下,亦可為8μm以下或5μm以下。 The thickness of the cured product layer may be 0.1 μm or more, 0.5 μm or more, 1 μm or more, or 2 μm or more, and preferably 10 μm or less, and may be 8 μm or less or 5 μm or less.

聚合性液晶化合物的硬化物層可藉由在基材層上塗布包含聚合性液晶化合物的液晶層形成用組成物並乾燥,使聚合性液晶化合物聚合而形成。液晶層形成用組成物亦可塗布於在基材層上所形成的配向層上。 The cured product layer of the polymerizable liquid crystal compound can be formed by applying the composition for forming a liquid crystal layer containing the polymerizable liquid crystal compound on the base material layer, drying the composition, and polymerizing the polymerizable liquid crystal compound. The composition for liquid crystal layer formation can also be apply|coated to the alignment layer formed on the base material layer.

基材層可使用由樹脂材料所形成的膜,例如可列舉採用了上述作為用於形成保護層的熱塑性樹脂而說明的樹脂材料之膜。基材層的厚度並無特別限定,但一般而言,從強度、操作性等作業性的觀點來看,較佳為1至300μm,更佳為20至200μm,又更佳為30至120μm。基材層可與聚合性液晶化合物的硬化物層一起組裝於光學積層體,亦可將基材層剝離,只使聚合性液晶化合物的硬化物層、或使該硬化物層及配向層組裝於光學積層體。基材層與聚合性液晶化合物的硬化物層一起組裝於光學積層體1時,基材層的厚度可未達30μm,例如可為25μm以下。 As the base material layer, a film formed of a resin material can be used, and for example, a film using the resin material described above as the thermoplastic resin for forming the protective layer can be used. The thickness of the base material layer is not particularly limited, but generally, from the viewpoint of workability such as strength and handleability, it is preferably 1 to 300 μm , more preferably 20 to 200 μm , and still more preferably 30 to 120 μm . The base material layer may be assembled in the optical laminate together with the cured product layer of the polymerizable liquid crystal compound, or the base material layer may be peeled off, and only the cured product layer of the polymerizable liquid crystal compound, or the cured product layer and the alignment layer may be assembled in the optical laminate. Optical laminate. When the base material layer and the cured product layer of the polymerizable liquid crystal compound are assembled in the optical layered body 1, the thickness of the base material layer may be less than 30 μm , for example, 25 μm or less.

相位差層10可如圖1、圖3及圖5所示為第1硬化物層11,亦可如圖2、圖4及圖6所示為包含第1硬化物層11及第2硬化物層12者,也可為除了第1硬化物層11及第2硬化物層12以外,還包含用以貼合此等的貼合層(X)25者。 The retardation layer 10 may be the first cured product layer 11 as shown in FIGS. 1 , 3 and 5 , or may include the first cured product layer 11 and the second cured product as shown in FIGS. 2 , 4 and 6 . The layer 12 may include, in addition to the first cured product layer 11 and the second cured product layer 12, a bonding layer (X) 25 for bonding these.

如貼合層(X)25般之用以將2層以上的硬化物層貼合的貼合層為黏著劑層或接著劑層。貼合層較佳為接著劑層,更佳為使活性能量線硬化型接著劑硬化而成之接著劑層,又更佳為使紫外線硬化型接著劑硬化而成之接著劑層。藉由將貼合層(X)25設為接著劑層,在將光學積層體1進行折彎、折疊或捲繞等時,可抑制硬化物層產生皺褶之情形,因而較佳。 Like the bonding layer (X) 25 , the bonding layer for bonding two or more cured product layers is an adhesive layer or an adhesive layer. The bonding layer is preferably an adhesive layer, more preferably an adhesive layer obtained by curing an active energy ray curing adhesive, and more preferably an adhesive layer obtained by curing an ultraviolet curing adhesive. By using the bonding layer (X) 25 as an adhesive layer, when the optical layered body 1 is bent, folded, or wound, it is possible to suppress the occurrence of wrinkles in the cured product layer, which is preferable.

貼合層的厚度並無特別限定。貼合層為黏著劑層時的厚度較佳為3μm以上,亦可為10μm以上或15μm以上,而且較佳為30μm以下,亦可為25μm以下或20μm以下。貼合層為接著劑層時的厚度較佳為0.1μm以上,亦可為0.5μm以上,而且較佳為10μm以下,亦可為5μm以下。 The thickness of the bonding layer is not particularly limited. When the bonding layer is an adhesive layer, the thickness is preferably 3 μm or more, and can also be 10 μm or more or 15 μm or more, and preferably 30 μm or less, and can also be 25 μm or less or 20 μm or more. m or less. When the bonding layer is an adhesive layer, the thickness is preferably 0.1 μm or more, and may be 0.5 μm or more, and preferably 10 μm or less, and may be 5 μm or less.

相位差層10的厚度雖然取決於相位差層10中所含之硬化物層的總數量,但通常為0.5μm以上,亦可為1μm以上、2μm以上或5μm以上,而且較佳為50μm以下,亦可為30μm以下、15μm以下或10μm以下。 Although the thickness of the retardation layer 10 depends on the total number of hardened material layers contained in the retardation layer 10, it is usually 0.5 μm or more, and may be 1 μm or more, 2 μm or more, or 5 μm or more, Furthermore, it is preferably 50 μm or less, and may be 30 μm or less, 15 μm or less, or 10 μm or less.

(阻隔層) (barrier layer)

在光學積層體1中為了抑制直線偏光層31中的碘移動至黏著劑層5,可設置阻隔層4。阻隔層4之在溫度40℃、相對濕度90%RH的透濕度為1g/m2/24hr以上,亦可為30g/m2/24hr以上、100g/m2/24hr以上、200g/m2/24hr以上或500g/m2/24hr以上。阻隔層的上述透濕度為2000g/m2/24hr以下,亦可為1500g/m2/24hr以下、1200g/m2/24hr以下或1000g/m2/24hr以下。阻隔層4的上述透濕度未達1g/m2/24hr時,在高溫高濕環境下會有直線偏光層31的光學劣化容易變明顯之傾向,超過2000g/m2/24hr時,會有難以抑制金屬層6的腐蝕之傾向。上述透濕度如後述的實施例所記載,可藉由透濕度試驗法(透濕杯法,JIS Z 0208)而測定。 In the optical layered body 1 , the barrier layer 4 may be provided in order to suppress the migration of iodine in the linearly polarizing layer 31 to the adhesive layer 5 . The moisture permeability of the barrier layer 4 at a temperature of 40°C and a relative humidity of 90% RH is 1g/m 2 /24hr or more, and can also be 30g/m 2 /24hr or more, 100g/m 2 /24hr or more, 200g/m 2 / 24hr or more or 500g/m 2 /24hr or more. The above-mentioned moisture permeability of the barrier layer is 2000 g/m 2 /24hr or less, and may be 1500 g/m 2 /24hr or less, 1200 g/m 2 /24hr or less, or 1000 g/m 2 /24hr or less. When the above-mentioned moisture permeability of the barrier layer 4 is less than 1 g/m 2 /24hr, the optical deterioration of the linear polarizing layer 31 tends to become obvious in a high temperature and high humidity environment, and when it exceeds 2000 g/m 2 /24hr, it may be difficult The tendency of corrosion of the metal layer 6 is suppressed. The said water vapor transmission rate can be measured by the water vapor transmission test method (moisture-permeable cup method, JIS Z 0208) as described in the Example mentioned later.

阻隔層4只要是具有上述透濕度者就無特別限定。阻隔層4可為樹脂膜、無機層或使活性能量線硬化性樹脂硬化而成之樹脂硬化層。 The barrier layer 4 is not particularly limited as long as it has the above-mentioned moisture permeability. The barrier layer 4 may be a resin film, an inorganic layer, or a cured resin layer formed by curing an active energy ray curable resin.

阻隔層4為樹脂膜時,樹脂膜可為單層結構或多層結構。樹脂膜例如可列舉採用了上述作為用於形成保護層的熱塑性樹脂而說明的樹脂材料之膜。樹脂膜較佳為:三乙酸纖維素等纖維素樹脂膜;具有環系及降莰烯結構的環狀聚烯烴樹脂(亦稱為降莰烯系樹脂)膜;(甲基)丙烯酸樹脂膜。 When the barrier layer 4 is a resin film, the resin film may have a single-layer structure or a multi-layer structure. As a resin film, the film which used the resin material demonstrated as the thermoplastic resin for forming a protective layer mentioned above is mentioned, for example. The resin film is preferably a cellulose resin film such as cellulose triacetate; a cyclic polyolefin resin (also referred to as a norbornene-based resin) film having a cyclic and norbornene structure; and a (meth)acrylic resin film.

樹脂膜可具有λ/4相位差特性等相位差特性,但以不具有相位差特性(零相位差特性)為較佳。藉由使樹脂膜不具有相位差特性,可抑制對光學積層體1的光學特性造成影響。 The resin film may have retardation properties such as λ/4 retardation properties, but preferably does not have retardation properties (zero retardation properties). By making the resin film not have retardation characteristics, influence on the optical characteristics of the optical layered body 1 can be suppressed.

樹脂膜的厚度只要依構成樹脂膜之樹脂材料的種類而選擇即可。樹脂膜的厚度例如較佳為1μm以上,更佳為4μm以上,亦可為8μm以上,而且較佳為25μm以下,更佳為15μm以下。樹脂膜的厚度變太大時,將光學積層體1折彎時,會有產生光學特性降低等的影響之疑慮。 The thickness of the resin film may be selected according to the type of resin material constituting the resin film. The thickness of the resin film is, for example, preferably 1 μm or more, more preferably 4 μm or more, or 8 μm or more, and preferably 25 μm or less, more preferably 15 μm or less. When the thickness of the resin film becomes too large, when the optical layered body 1 is folded, there is a possibility that an influence such as a decrease in optical properties will occur.

阻隔層4為樹脂膜時,相位差層10與阻隔層4較佳係藉由貼合層(Z)24貼合。如上所述,貼合層(Z)24為接著劑層或黏著劑層。貼合層(Z)24為接著劑層時,相較於將貼合層(Z)24設黏著劑層的情況,即使厚度較小亦可將相位差層10與阻隔層4以充分的接著力貼合,且可使距離D縮小,因而較佳。 When the barrier layer 4 is a resin film, the retardation layer 10 and the barrier layer 4 are preferably bonded together via the bonding layer (Z) 24 . As described above, the bonding layer (Z) 24 is an adhesive layer or an adhesive layer. When the bonding layer (Z) 24 is an adhesive layer, compared with the case where the bonding layer (Z) 24 is provided with an adhesive layer, even if the thickness is small, the retardation layer 10 and the barrier layer 4 can be sufficiently bonded. Force fit, and can reduce the distance D, so it is better.

阻隔層4為無機層時,無機層可為單層結構或多層結構。構成無機層的無機材料例如可列舉金屬氧化物、金屬氮化物、金屬氮氧化物、及含有此等中之2種以上的混合物。無機材料中所含之金屬原子可列舉矽(Si)、鋁(Al)、鎂(Mg)、鈣(Ca)、鉀(K)、鈉(Na)、硼(B)、鉛(Pb)、鋯(Zr)、釔(Y)及該等原子中之2 種以上。無機材料可進一步含有氫原子(H)、磷原子(P)、硫原子(S)、氟原子(F)、氯原子(Cl)及該等原子中之2種以上。 When the barrier layer 4 is an inorganic layer, the inorganic layer may have a single-layer structure or a multi-layer structure. Examples of the inorganic material constituting the inorganic layer include metal oxides, metal nitrides, metal oxynitrides, and mixtures containing two or more of these. The metal atoms contained in the inorganic material include silicon (Si), aluminum (Al), magnesium (Mg), calcium (Ca), potassium (K), sodium (Na), boron (B), lead (Pb), Zirconium (Zr), Yttrium (Y) and 2 of these atoms more than one species. The inorganic material may further contain hydrogen atoms (H), phosphorus atoms (P), sulfur atoms (S), fluorine atoms (F), chlorine atoms (Cl), and two or more of these atoms.

無機層可藉由公知的化學氣相沉積法(CVD法)或物理氣相沉積法(PVD法)等而形成。化學氣相沉積法可列舉使用了輝光放電電漿等的電漿化學氣相沉積法、熱化學氣相沉積法、光化學氣相沉積法等。物理氣相沉積法可列舉真空蒸鍍法、濺鍍法、離子鍍法或離子化叢集束法等。 The inorganic layer can be formed by a known chemical vapor deposition method (CVD method), physical vapor deposition method (PVD method), or the like. The chemical vapor deposition method includes plasma chemical vapor deposition, thermal chemical vapor deposition, and photochemical vapor deposition using glow discharge plasma or the like. As the physical vapor deposition method, a vacuum vapor deposition method, a sputtering method, an ion plating method, an ionization cluster beam method, or the like can be mentioned.

無機層的厚度並無特別限定,例如可為1nm以上、10nm以上或30nm以上,而且亦可為1000nm以下、300nm以下或200nm以下。 The thickness of the inorganic layer is not particularly limited, and may be, for example, 1 nm or more, 10 nm or more, or 30 nm or more, and may be 1000 nm or less, 300 nm or less, or 200 nm or less.

光學積層體1中,無機層可直接形成於相位差層10的表面,亦可於基材膜上形成無機層,再將其貼合於相位差層10。基材膜可使用採用了上述之能夠用於保護層的熱塑性樹脂之膜。 In the optical layered body 1 , the inorganic layer may be directly formed on the surface of the retardation layer 10 , or the inorganic layer may be formed on the base film, and the retardation layer 10 may be bonded to the inorganic layer. As the base film, a film using the above-mentioned thermoplastic resin which can be used for the protective layer can be used.

阻隔層4為樹脂硬化層時,樹脂硬化層可藉由使活性能量線硬化性樹脂硬化而形成。樹脂硬化層可為在相位差層10的表面塗布活性能量線硬化性樹脂並硬化而成之保護塗層(overcoat layer)。活性能量線硬化性樹脂只要是公知的活性能量線硬化性樹脂就無特別限定,例如可列舉後述的用以形成接著劑層的活性能量線硬化型接著劑。 When the barrier layer 4 is a resin cured layer, the resin cured layer can be formed by curing an active energy ray-curable resin. The resin hardening layer may be an overcoat layer obtained by coating the surface of the retardation layer 10 with an active energy ray curable resin and then hardening it. The active energy ray-curable resin is not particularly limited as long as it is a known active energy ray-curable resin, and examples thereof include active energy ray-curable adhesives for forming an adhesive layer described later.

樹脂硬化層的厚度並無特別限定,例如可為0.5μm以上或1μm以上,而且亦可為10μm以下、5μm以下或3μm以下。 The thickness of the resin cured layer is not particularly limited, and may be, for example, 0.5 μm or more or 1 μm or more, and may be 10 μm or less, 5 μm or less, or 3 μm or less.

阻隔層4較佳為樹脂膜。咸認在將光學積層體1裁切成期望的尺寸、或對光學積層體1施予端面加工等加工時,樹脂膜相較於無機層可抑制裂隙的產生。又,在樹脂硬化層中,為了實現上述透濕度,會有需要將活性能量線硬化性樹脂塗布成厚者的情形,在此情形,會因活性能量線硬化性樹脂的硬化而產 生的硬化熱,而有使光學積層體1產生皺褶、或使光學積層體1產生翹曲之疑慮。相對於此,咸認樹脂膜相較於樹脂硬化層可抑制上述皺褶及翹曲的產生。 The barrier layer 4 is preferably a resin film. It is recognized that the resin film can suppress the generation of cracks compared to the inorganic layer when the optical layered body 1 is cut into a desired size or when the optical layered body 1 is subjected to processing such as end surface processing. In addition, in the resin cured layer, in order to realize the above-mentioned moisture permeability, it may be necessary to apply the active energy ray curable resin to a thick layer. There is a possibility that the optical layered body 1 may be wrinkled or warped due to the generated curing heat. On the other hand, it is considered that the resin film can suppress the occurrence of the above-mentioned wrinkles and warpage compared to the resin cured layer.

(黏著劑層) (adhesive layer)

黏著劑層5為使用黏著劑所形成的層。黏著劑為藉由將其本身貼附於金屬層等被接著物而顯現接著性者,而被稱為所謂的壓敏型接著劑。又,後述的活性能量線硬化型黏著劑可藉由照射能量線而調整交聯度、接著力。 The adhesive layer 5 is a layer formed using an adhesive. The adhesive is called a so-called pressure-sensitive adhesive because it exhibits adhesiveness by sticking itself to an adherend such as a metal layer. In addition, the degree of crosslinking and the adhesive force of the active energy ray-curable adhesive described later can be adjusted by irradiating energy rays.

從貼合於金屬層6等被接著物的觀點來看,黏著劑層5的厚度較佳為5μm以上30μm以下,更佳為10μm以上20μm以下。配置在靠近金屬層6的位置之黏著劑層5的厚度較小時,相較於不具備阻隔層4的積層體,黏著劑層5的碘濃度容易變大。因此,藉由設為如本實施形態之光學積層體1,可有效地抑制於金屬層6所產生的腐蝕。 The thickness of the adhesive layer 5 is preferably 5 μm or more and 30 μm or less, and more preferably 10 μm or more and 20 μm or less, from the viewpoint of bonding to an adherend such as the metal layer 6 . When the thickness of the adhesive layer 5 arranged near the metal layer 6 is small, the iodine concentration of the adhesive layer 5 is likely to increase compared to a laminate without the barrier layer 4 . Therefore, by setting it as the optical laminated body 1 like this embodiment, the corrosion which generate|occur|produces in the metal layer 6 can be suppressed effectively.

就黏著劑而言,可無特別限制地使用以往公知的光學上的透明性優異的黏著劑,例如可使用具有丙烯酸系、胺酯(urethane)系、聚矽氧系、聚乙烯基醚系等的基質聚合物之黏著劑。又,亦可為活性能量線硬化型黏著劑、熱硬化型黏著劑等。此等之中,適合為以透明性、黏著力、再剝離性(以下亦稱為再加工性)、耐候性、耐熱性等優異的丙烯酸系樹脂作為基質聚合物之黏著劑。黏著劑層較佳係由含有(甲基)丙烯酸系樹脂、交聯劑、矽烷化合物的黏著劑之反應生成物所構成,亦可含有其他成分。 As the adhesive, conventionally known adhesives excellent in optical transparency can be used without particular limitation, for example, acrylic, urethane, polysiloxane, polyvinyl ether, etc. can be used. adhesive for the matrix polymer. Moreover, an active energy ray hardening type adhesive agent, a thermosetting type adhesive agent, etc. may be sufficient. Among these, an acrylic resin excellent in transparency, adhesive force, releasability (hereinafter also referred to as reworkability), weather resistance, heat resistance, etc. is suitable as the adhesive of the matrix polymer. The adhesive layer is preferably composed of a reaction product of an adhesive containing a (meth)acrylic resin, a crosslinking agent, and a silane compound, and may contain other components.

黏著劑層5可使用活性能量線硬化型黏著劑而形成。活性能量線硬化型黏著劑可藉由在上述的黏著劑中調合多官能性丙烯酸酯等紫外線硬化性化合物而形成黏著劑層後,對其照射紫外線而使其硬化,而形成更堅硬的黏著劑層。活性能量線硬化型黏著劑係具有受到紫外線、電子束等能量線的照射而硬化 的性質。由於活性能量線硬化型黏著劑在照射能量線前亦具有黏著性,故該黏著劑具有可密著於金屬層等被接著物,並藉由能量線的照射使其硬化而調整密著力的性質。 The adhesive layer 5 can be formed using an active energy ray-curable adhesive. Active energy ray-curable adhesives can be formed by mixing ultraviolet curable compounds such as multifunctional acrylates in the above-mentioned adhesives to form an adhesive layer, and then irradiating it with ultraviolet rays to harden it to form a harder adhesive. Floor. Active energy ray-curable adhesives are cured by irradiation with energy rays such as ultraviolet rays and electron beams. nature. Since the active energy ray-curable adhesive also has adhesiveness before irradiating the energy ray, the adhesive has the property of being able to adhere to the adherend such as a metal layer, and being hardened by the energy ray irradiation to adjust the adhesive force .

一般而言,活性能量線硬化型黏著劑含有丙烯酸系黏著劑及能量線聚合性化合物作為主成分。通常進一步調合交聯劑,且視需要亦可調合光聚合起始劑、光敏劑等。 Generally, an active energy ray-curable adhesive contains an acrylic adhesive and an energy ray polymerizable compound as main components. Usually, a crosslinking agent is further blended, and if necessary, a photopolymerization initiator, a photosensitizer, and the like can also be blended.

黏著劑層5的儲存彈性模數例如可設為50,000Pa以下,亦可為49,000Pa以下或40,000Pa以下,較佳為10,000Pa以上。黏著劑層5的儲存彈性模數在上述範圍時,例如可使與金屬層6的密著力提升。黏著劑層5的儲存彈性模數為50,000Pa以下時,可抑制在高溫乾燥下、高溫高濕下與金屬層6之間產生浮起之情形。在本說明書中,「黏著劑層的儲存彈性模數」係依據JIS K7244-6在溫度25℃測定得到的值,可藉由市售的黏彈性測定裝置進行測定。黏彈性測定裝置例如後述的實施例所示,可使用Physica公司製的MCR300。 The storage elastic modulus of the adhesive layer 5 can be, for example, 50,000 Pa or less, 49,000 Pa or less, or 40,000 Pa or less, and preferably 10,000 Pa or more. When the storage elastic modulus of the adhesive layer 5 is in the above-mentioned range, for example, the adhesive force with the metal layer 6 can be improved. When the storage elastic modulus of the adhesive layer 5 is 50,000 Pa or less, the occurrence of floating between the metal layer 6 under high temperature drying and high temperature and high humidity can be suppressed. In this specification, the "storage elastic modulus of the adhesive layer" is a value measured at a temperature of 25°C in accordance with JIS K7244-6, and can be measured by a commercially available viscoelasticity measuring device. As the viscoelasticity measuring apparatus, MCR300 manufactured by Physica can be used, for example, as shown in the examples described later.

(金屬層) (metal layer)

金屬層6可作為用以構成觸控面板的觸控感測器之導電層使用。金屬層6為藉由1種以上的金屬形成之層。金屬層6可於其表面形成有鈍化被膜(氧化被膜)。金屬層6可為單層結構或多層結構。此外,鈍化被膜不計為層數中之1層。 The metal layer 6 can be used as a conductive layer for forming the touch sensor of the touch panel. The metal layer 6 is a layer formed of one or more metals. The metal layer 6 may have a passivation film (oxide film) formed on its surface. The metal layer 6 may have a single-layer structure or a multi-layer structure. In addition, the passivation film is not counted as one layer in the number of layers.

構成金屬層6的金屬可列舉鋁(Al)、銅(Cu)、金(Au)、銀(Ag)、鈦(Ti)、鈀(Pd)、鉻(Cr)、鎳(Ni)、鎢(W)、鉑(Pt)、鐵(Fe)、銦(In)、錫(Sn)、銥(Ir)、銠(Rh)、釹(Nd)、鉬(Mo)或含有2種以上該等金屬的合金。此等之中,金屬層6較佳係主成分為鋁或銅,亦可含有鈦作為添加劑。在此,主成分係指在構成金屬層6的金屬中占50質量%以上的金屬。 Metals constituting the metal layer 6 include aluminum (Al), copper (Cu), gold (Au), silver (Ag), titanium (Ti), palladium (Pd), chromium (Cr), nickel (Ni), tungsten ( W), platinum (Pt), iron (Fe), indium (In), tin (Sn), iridium (Ir), rhodium (Rh), neodymium (Nd), molybdenum (Mo) or two or more of these metals alloy. Among these, the metal layer 6 preferably contains aluminum or copper as the main component, and may also contain titanium as an additive. Here, the main component refers to a metal that accounts for 50 mass % or more of the metals constituting the metal layer 6 .

金屬層6例如可形成於透光性基材,可為遍及透光性基材的表面整面而形成的連續膜,亦可為形成於透光性基材的表面之金屬配線層。金屬配線層可為金屬網。透光性基材只要是具有透光性者即可,例如可列舉:採用了上述作為用於形成保護層的熱塑性樹脂而說明的樹脂材料之膜、玻璃膜、玻璃基板等。 The metal layer 6 may be formed on, for example, a translucent substrate, a continuous film formed over the entire surface of the translucent substrate, or a metal wiring layer formed on the surface of the translucent substrate. The metal wiring layer may be a metal mesh. The translucent base material may be any one having translucency, and examples thereof include films using the resin materials described above as the thermoplastic resin for forming the protective layer, glass films, glass substrates, and the like.

金屬層6的形成方法並無特別限定,只要在透光性基材的表面藉由例如上述的化學氣相沉積法、物理氣相沉積法、噴墨印刷法、凹版印刷法、電鍍覆、無電鍍覆等而形成即可。金屬層6較佳係藉由濺鍍法而形成。 The method of forming the metal layer 6 is not particularly limited, as long as it is formed on the surface of the light-transmitting substrate by, for example, the above-mentioned chemical vapor deposition method, physical vapor deposition method, inkjet printing method, gravure printing method, electroplating, non-metallic coating, etc. It may be formed by electroplating or the like. The metal layer 6 is preferably formed by sputtering.

金屬層6的厚度通常為0.01μm以上,亦可為0.05μm以上,而且從薄型化的觀點來看,較佳為3μm以下,更佳為1μm以下,又更佳為0.8μm以下。 The thickness of the metal layer 6 is usually 0.01 μm or more, and may be 0.05 μm or more, and from the viewpoint of thinning, preferably 3 μm or less, more preferably 1 μm or less, and still more preferably 0.8 μm or less.

金屬層6為金屬配線層時,其線寬通常為10μm以下,可為5μm以下,亦可為3μm以下,且通常為0.5μm以上。 When the metal layer 6 is a metal wiring layer, its line width is usually 10 μm or less, may be 5 μm or less, or 3 μm or less, and usually 0.5 μm or more.

(第1貼合層、第2貼合層、貼合層(X)、貼合層(Y)、貼合層(Z)、貼合層) (1st bonding layer, 2nd bonding layer, bonding layer (X), bonding layer (Y), bonding layer (Z), bonding layer)

第1及第2貼合層、貼合層(X)至(Z)、以及貼合層可列舉黏著劑層或接著劑層。 The first and second bonding layers, the bonding layers (X) to (Z), and the bonding layer include an adhesive layer or an adhesive layer.

上述各貼合層為黏著劑層時,可使用在上述黏著劑層中說明的黏著劑來形成。各貼合層為黏著劑層時,該黏著劑層的儲存彈性模數較佳為50,000Pa以上,更佳為100,000Pa以上,又更佳為150,000Pa以上。從抑制貼合時的氣泡產生的觀點來看,上述黏著劑層的儲存彈性模數較佳為200,000Pa以下。藉由使黏著劑層的儲存彈性模數在上述的範圍內,對光學積層體1進行折彎、折疊、捲繞等時,可抑制硬化物層產生皺褶之情形,因而較佳。儲存彈性模數的測定方 法如上所述。各貼合層為黏著劑層時,黏著劑層的厚度較佳為2μm以上20μm以下,更佳為4μm以上17μm以下。 When each said bonding layer is an adhesive bond layer, it can be formed using the adhesive agent demonstrated in the said adhesive bond layer. When each bonding layer is an adhesive layer, the storage elastic modulus of the adhesive layer is preferably 50,000Pa or more, more preferably 100,000Pa or more, and still more preferably 150,000Pa or more. The storage elastic modulus of the adhesive layer is preferably 200,000 Pa or less from the viewpoint of suppressing the generation of air bubbles during lamination. By setting the storage elastic modulus of the adhesive layer within the above-mentioned range, it is preferable to suppress the occurrence of wrinkles in the cured product layer when the optical layered body 1 is bent, folded, wound, or the like. The measurement method of the storage elastic modulus is as described above. When each bonding layer is an adhesive layer, the thickness of the adhesive layer is preferably 2 μm or more and 20 μm or less, more preferably 4 μm or more and 17 μm or less.

咸認上述各貼合層為接著劑層時,相較於該等貼合層為黏著劑層的情況,容易抑制金屬層6的腐蝕。上述各貼合層為接著劑層時,接著劑層可藉由使接著劑中的硬化性成分硬化而形成。用以形成接著劑層的接著劑為壓敏型接著劑(黏著劑)以外的接著劑,例如可列舉水系接著劑、活性能量線硬化型接著劑。 When it is accepted that each of the above-mentioned bonding layers is an adhesive layer, the corrosion of the metal layer 6 is easily suppressed compared with the case where these bonding layers are adhesive layers. When each said bonding layer is an adhesive agent layer, an adhesive agent layer can be formed by hardening the curable component in an adhesive agent. The adhesive for forming the adhesive layer is an adhesive other than a pressure-sensitive adhesive (adhesive), and examples thereof include a water-based adhesive and an active energy ray-curable adhesive.

水系接著劑例如可列舉使聚乙烯醇系樹脂溶解或分散於水中而成之接著劑。使用水系接著劑時的乾燥方法並無特別限定,例如可採用使用熱風乾燥機、紅外線乾燥機進行乾燥的方法。 Examples of the water-based adhesive include those obtained by dissolving or dispersing a polyvinyl alcohol-based resin in water. The drying method in the case of using the water-based adhesive is not particularly limited, and for example, a method of drying using a hot air dryer or an infrared dryer can be employed.

活性能量線硬化型接著劑例如可列舉:含有會因如紫外線、可見光、電子束、X射線等活性能量線的照射而硬化之硬化性化合物的無溶劑型的活性能量線硬化型接著劑。藉由使用無溶劑型的活性能量線硬化型接著劑,可使層間的密著性提升。 Examples of active energy ray-curable adhesives include solvent-free active-energy ray-curable adhesives containing a curable compound hardened by irradiation with active energy rays such as ultraviolet rays, visible light, electron beams, and X-rays. Adhesion between layers can be improved by using a solvent-free active energy ray-curable adhesive.

從顯示良好的接著性來看,活性能量線硬化型接著劑較佳係含有陽離子聚合性的硬化性化合物、自由基聚合性的硬化性化合物之任一者或兩者。活性能量線硬化型接著劑可進一步含有用以使上述硬化性化合物開始硬化反應之光陽離子聚合起始劑等陽離子聚合起始劑、或自由基聚合起始劑。 The active energy ray-curable adhesive preferably contains either or both of a cationically polymerizable curable compound and a radically polymerizable curable compound from the viewpoint of exhibiting favorable adhesiveness. The active energy ray-curable adhesive may further contain a cationic polymerization initiator such as a photocationic polymerization initiator for starting the curing reaction of the curable compound, or a radical polymerization initiator.

陽離子聚合性的硬化性化合物例如可列舉:具有與脂環式環鍵結的環氧基之脂環式環氧化合物、具有2個以上的環氧基且不具有芳香環之多官能脂肪族環氧化合物、具有1個環氧基之單官能環氧基(但不包含屬於脂環式環氧化合物者)、具有2個以上的環氧基且具有芳香環之多官能芳香族環氧化合物等環氧 系化合物;於分子內具有1個或2個以上的氧雜環丁烷環之氧雜環丁烷化合物;此等的組合。 The cationically polymerizable curable compound includes, for example, an alicyclic epoxy compound having an epoxy group bonded to an alicyclic ring, and a polyfunctional aliphatic ring having two or more epoxy groups and no aromatic ring. Oxygen compounds, monofunctional epoxy groups having one epoxy group (excluding those belonging to alicyclic epoxy compounds), polyfunctional aromatic epoxy compounds having two or more epoxy groups and having aromatic rings, etc. epoxy series compounds; oxetane compounds having one or more oxetane rings in the molecule; combinations of these.

自由基聚合性的硬化性化合物例如可列舉(甲基)丙烯酸系化合物(於分子內具有1個或2個以上的(甲基)丙烯醯氧基之化合物)、具有自由基聚合性的雙鍵之其他乙烯基系化合物、或此等的組合。 Examples of the radically polymerizable curable compound include (meth)acrylic compounds (compounds having one or more (meth)acryloyloxy groups in the molecule), and radically polymerizable double bonds. other vinyl compounds, or a combination of these.

活性能量線硬化型接著劑視需要可含有光敏助劑等增敏劑。藉由使用增敏劑,可使反應性提升,並進一步使接著劑層的機械強度、接著強度提升。增敏劑可適當應用公知者。調合增敏劑時,其調合量相對於活性能量線硬化型接著劑的總量100質量份,較佳係設為0.1至20質量份的範圍。 The active energy ray-curable adhesive may contain a sensitizer such as a photosensitizer as needed. By using the sensitizer, the reactivity can be improved, and the mechanical strength and the adhesive strength of the adhesive layer can be further improved. A known sensitizer can be appropriately used. When a sensitizer is blended, the blending amount is preferably in the range of 0.1 to 20 parts by mass with respect to 100 parts by mass of the total amount of the active energy ray-curable adhesive.

活性能量線硬化型接著劑視需要可包含離子捕捉劑、抗氧化劑、鏈轉移劑、增黏劑、熱塑性樹脂、填充劑、流動調整劑、塑化劑、消泡劑、抗靜電劑、調平劑、溶劑等添加劑。 The active energy ray hardening adhesive may contain ion scavengers, antioxidants, chain transfer agents, tackifiers, thermoplastic resins, fillers, flow modifiers, plasticizers, antifoaming agents, antistatic agents, leveling agents, as needed additives, solvents, etc.

使用活性能量線硬化型接著劑時,可照射如紫外線、可見光、電子束、X射線等活性能量線,使接著劑的塗布層硬化而形成接著劑層。活性能量線較佳為紫外線,此時的光源可使用低壓水銀燈、中壓水銀燈、高壓水銀燈、超高壓水銀燈、捕蟲器用螢光燈、黑光燈、微波激發水銀燈、金屬鹵素燈等。 When an active energy ray hardening type adhesive is used, an adhesive layer can be formed by irradiating active energy rays such as ultraviolet rays, visible light, electron beams, and X-rays to harden the coating layer of the adhesive. The active energy rays are preferably ultraviolet rays, and the light source at this time can use low-pressure mercury lamps, medium-pressure mercury lamps, high-pressure mercury lamps, ultra-high pressure mercury lamps, fluorescent lamps for insect traps, black light lamps, microwave-excited mercury lamps, and metal halide lamps.

(實施例) (Example)

以下列示實施例及比較例來更具體地說明本發明,但本發明並不限定於該等例。以下只要沒有特別註明,則表示調合量或含量的「份」及「%」均為質量基準。 The present invention will be described in more detail below with reference to Examples and Comparative Examples, but the present invention is not limited to these examples. Unless otherwise specified below, the "parts" and "%" indicating the blending amount or content are the quality standards.

(1)測定方法及評估方法 (1) Measurement method and evaluation method

[透濕度的測定] [Measurement of moisture permeability]

針對實施例及比較例中所使用的保護層及阻隔層,使用恆溫恆濕槽,以溫度40℃、相對濕度90%RH、測定時間24小時的測定條件,藉由透濕度試驗方法(透濕杯法,依據JIS Z 0208)測定水蒸氣穿透率,以此作為透濕度。 For the protective layers and barrier layers used in the Examples and Comparative Examples, a constant temperature and humidity tank was used, under the measurement conditions of a temperature of 40° C., a relative humidity of 90% RH, and a measurement time of 24 hours, by the moisture permeability test method (moisture permeability test method). The cup method was used to measure the water vapor transmission rate according to JIS Z 0208), which was used as the moisture permeability.

[黏著劑層中之碘量的測定] [Measurement of the amount of iodine in the adhesive layer]

將實施例及比較例所得的光學積層體裁切成25mm×50mm的大小,於保護層(附HC的COP膜)上使用黏著劑貼合無鹼玻璃,在黏著劑層(a)上貼合剝離膜,製作成試驗片(1)。將試驗片(1)在溫度85℃、相對濕度85%RH的烘箱中保管240小時後,將剝離膜剝離,刮取黏著劑層(a)的黏著劑。藉由以下述的條件進行的氧化燃燒離子層析法,測定刮取的黏著劑中所含之碘量[ppm]。 The optical laminates obtained in Examples and Comparative Examples were cut into a size of 25 mm × 50 mm, and an alkali-free glass was attached to the protective layer (COP film with HC) using an adhesive, and the adhesive layer (a) was attached and peeled. The film was prepared as a test piece (1). After storing the test piece (1) in an oven with a temperature of 85° C. and a relative humidity of 85% RH for 240 hours, the release film was peeled off, and the adhesive of the adhesive layer (a) was scraped off. The amount of iodine [ppm] contained in the scraped adhesive was measured by oxidative combustion ion chromatography performed under the following conditions.

<試料燃燒> <Sample burning>

‧裝置:Mitsubishi Chemical Analytech股份有限公司製AQF-2100H ‧Device: AQF-2100H manufactured by Mitsubishi Chemical Analytech Co., Ltd.

‧燃燒條件:將燃燒溫度設為1100℃,就氣體流量而言,將氬流量設為200mL/分鐘,將氧流量設為400mL/分鐘,將加濕空氣流量設為100mL/分鐘。 • Combustion conditions: the combustion temperature was set to 1100°C, the gas flow rate was set to 200 mL/min of argon, 400 mL/min of oxygen flow, and 100 mL/min of humidified air flow.

<離子層析> <Ion chromatography>

‧裝置:Thermo Fisher Scientific公司製Integrion ‧Device: Integrion manufactured by Thermo Fisher Scientific

‧管柱:Thermo Fisher Scientific公司製IonPac AS19 ‧Column: IonPac AS19 manufactured by Thermo Fisher Scientific

‧測定條件:將溶析液設為KOH水溶液梯度,將流速設為1.0mL/分鐘,將注入量設為100μL,將測定模式設為抑制器(suppressor)式,將檢測器設為導電度檢測器。 ・Measurement conditions: the eluent was set to a KOH aqueous solution gradient, the flow rate was set to 1.0 mL/min, the injection volume was set to 100 μL , the measurement mode was set to a suppressor type, and the detector was set to conductive degree detector.

[黏著劑層的儲存彈性模數之測定] [Measurement of Storage Elastic Modulus of Adhesive Layer]

實施例及比較例所使用的黏著劑層的儲存彈性模數係藉由下述方法測定。以使黏著劑層的厚度成為0.2mm的方式積層複數片。將所積層的黏著劑層衝切成 直徑8mm的圓柱體,並以此作為儲存彈性模數的測定用試樣。針對測定用試樣,依據JIS K7244-6使用黏彈性測定裝置(Physica公司製,MCR300)藉由扭轉剪切法,以下述的條件測定儲存彈性模數[Pa]。 The storage elastic modulus of the adhesive layers used in Examples and Comparative Examples was measured by the following method. A plurality of sheets were laminated so that the thickness of the adhesive layer would be 0.2 mm. Die the laminated adhesive layer into pieces A cylinder with a diameter of 8 mm was used as a sample for the measurement of the storage elastic modulus. The storage elastic modulus [Pa] was measured by the torsional shearing method according to JIS K7244-6 using a viscoelasticity measuring apparatus (manufactured by Physica, MCR300) on the sample for measurement under the following conditions.

<測定條件> <Measurement conditions>

‧正向力FN:1N ‧Normal force FN: 1N

‧應變γ:1% ‧Strain γ: 1%

‧頻率:1Hz ‧Frequency: 1Hz

‧溫度:25℃ ‧Temperature: 25℃

[金屬層的腐蝕性之評估] [Evaluation of Corrosion of Metal Layers]

製備出在無鹼玻璃表面藉由濺鍍而形成有厚度約500nm的金屬鋁層之附金屬層的玻璃基板(GEOMATEC公司製)。接著,將實施例及比較例所得之光學積層體裁切成50mm×60mm的大小,於黏著劑層(a)上貼附附金屬層的玻璃基板之金屬鋁層側,於保護層(附HC的COP膜)上使用黏著劑貼合無鹼玻璃,而製作成試驗片(2)。將試驗片(2)在溫度85℃、相對濕度85%RH的烘箱中保管240小時後,從附金屬層的玻璃基板的背面射照光,從保護層側之無鹼玻璃的表面起透過放大鏡觀察試驗片(2)的金屬層的狀態(貼附有光學積層體之裁切片的部分)。在觀察的金屬層中,計算孔蝕(直徑0.1mm以上,可使光穿透過之孔)的數目並依下述的基準進行評估。 A metal-attached glass substrate (manufactured by GEOMATEC) was prepared by sputtering on the surface of the alkali-free glass with a metal aluminum layer having a thickness of about 500 nm. Next, the optical laminates obtained in the examples and comparative examples were cut into a size of 50 mm×60 mm, and the metal aluminum layer side of the glass substrate with the metal layer was attached to the adhesive layer (a), and the protective layer (HC-attached) was The alkali-free glass was bonded to the COP film) using an adhesive, and a test piece (2) was produced. After storing the test piece (2) in an oven with a temperature of 85°C and a relative humidity of 85% RH for 240 hours, light was irradiated from the back of the glass substrate with the metal layer, and observed through a magnifying glass from the surface of the alkali-free glass on the protective layer side. The state of the metal layer of the test piece (2) (portion to which the cut piece of the optical laminate is attached). Among the observed metal layers, the number of pitting corrosion (holes with a diameter of 0.1 mm or more through which light can pass) was counted and evaluated according to the following criteria.

A:孔蝕的數目為4個以下, A: The number of pitting corrosion is less than 4,

B:孔蝕的數目為5個以上20個以下, B: The number of pitting corrosion is 5 or more and 20 or less,

C:產生超過20個的孔蝕。 C: More than 20 pitting corrosion occurred.

(2)構成光學積層體之各層的準備 (2) Preparation of the layers constituting the optical laminate

[活性能量線硬化型接著劑的調製] [Preparation of Active Energy Ray Curable Adhesives]

將下述成分調合並混合後進行脫泡,調製活性能量線硬化型接著劑。 The following components were prepared and mixed, followed by defoaming to prepare an active energy ray-curable adhesive.

<陽離子聚合性化合物> <Cationically polymerizable compound>

‧新戊二醇二縮水甘油基醚(商品名:EX-211L,Nagase ChemteX(股)製) 30份 ‧Neopentyl glycol diglycidyl ether (trade name: EX-211L, manufactured by Nagase ChemteX Co., Ltd.) 30 parts

‧3-乙基-3{[(3-乙基氧雜環丁烷-3-基)甲氧基]甲基}氧雜環丁烷(商品名:OXT-221,東亞合成(股)製) 13份 ‧3-Ethyl-3{[(3-ethyloxetan-3-yl)methoxy]methyl}oxetane (trade name: OXT-221, manufactured by Toagosei Co., Ltd. ) 13 servings

‧雙酚A型環氧樹脂(商品名:EP-4100E,ADEKA(股),黏度13Pa‧s(溫度25℃)) 12份 ‧Bisphenol A epoxy resin (trade name: EP-4100E, ADEKA (stock), viscosity 13Pa‧s (temperature 25℃)) 12 parts

‧含芳香族的氧雜環丁烷化合物(商品名:TCM-104,TRONLY製) 45份 ‧Aromatic-containing oxetane compound (trade name: TCM-104, manufactured by TRONLY) 45 parts

<光陽離子聚合起始劑> <Photocationic polymerization initiator>

‧CPI-100P,San-Apro(股)製,50%碳酸丙烯酯溶液 2.25份(固形物量) ‧CPI-100P, manufactured by San-Apro Co., Ltd., 50% propylene carbonate solution 2.25 parts (solid content)

<光敏助劑> <Photosensitizer>

‧1,4-二乙氧基萘 1份 ‧1,4-diethoxynaphthalene 1 part

[偏光板的製作] [Production of polarizing plate]

將厚度20μm、聚合度2,400、皂化度99.9%以上的聚乙烯醇膜在已加熱至125℃的滾輪上單軸延伸至延伸倍率4.5倍,在保持拉張狀態的情況下,浸漬於28℃的水中30秒後,浸漬於相對於每100份的水含有碘0.05份及碘化鉀5份之28℃的染色浴中30秒。接著,浸漬於相對於每100份的水含有硼酸5.5份及碘化鉀15份之64℃的硼酸水溶液中110秒。然後,浸漬於相對於每100份的水含有硼酸2.35份及碘化鉀15份之67℃的硼酸水溶液中30秒。然後使用10℃的純水進行水洗,在80℃乾燥,得到直線偏光層。所得之直線偏光層的厚度為8μm。進一步,在所得之直線偏光層的單面隔著水系接著劑貼合保護層,並在90℃乾燥,得到在直線偏光層 的單面具有保護層之偏光板。使用厚度27μm之附硬塗層的環烯烴膜(以下有時稱為「附HC的COP膜」)作為保護層,將附HC的COP膜之環烯烴膜側貼合於直線偏光層。所得之偏光板係依序積層有附HC的COP膜(保護層)、接著劑層(第1貼合層)及直線偏光層者。附HC的COP膜的透濕度為8g/m2/24hr。 The polyvinyl alcohol film with a thickness of 20 μm , a degree of polymerization of 2,400, and a degree of saponification of 99.9% or more was uniaxially stretched to a stretching ratio of 4.5 times on a roller heated to 125° C. After 30 seconds in water at °C, it was immersed for 30 seconds in a dyeing bath containing 0.05 parts of iodine and 5 parts of potassium iodide per 100 parts of water at 28°C. Next, it was immersed for 110 seconds in a boric acid aqueous solution containing 5.5 parts of boric acid and 15 parts of potassium iodide per 100 parts of water at 64°C. Then, it was immersed in the boric-acid aqueous solution containing 2.35 parts of boric acid and 15 parts of potassium iodide per 100 parts of water at 67°C for 30 seconds. Then, it washed with pure water at 10°C and dried at 80°C to obtain a linear polarizing layer. The thickness of the obtained linearly polarizing layer was 8 μm . Furthermore, a protective layer was attached to one side of the linearly polarizing layer obtained via a water-based adhesive, and dried at 90° C. to obtain a polarizing plate having a protective layer on one side of the linearly polarizing layer. Using a 27 μm -thick cycloolefin film with a hard coat layer (hereinafter sometimes referred to as a “COP film with HC”) as a protective layer, the cycloolefin film side of the COP film with HC was bonded to the linear polarizing layer. The obtained polarizing plate is one in which the HC-attached COP film (protective layer), the adhesive layer (1st bonding layer), and the linear polarizing layer are laminated in this order. The moisture permeability of the HC-attached COP film was 8 g/m 2 /24hr.

[相位差層的製作] [Production of retardation layer]

(1/2波長相位差層的製作) (Production of 1/2 wavelength retardation layer)

在由透明樹脂所形成的基材層上塗布配向層形成用組成物並使其乾燥,藉此進行λ/2配向處理。接著,在配向層上塗布含有盤狀聚合性液晶化合物的液晶層形成用組成物並進行加熱及UV照射,使聚合性液晶化合物的配向固定化,藉此在基材層的配向層上形成厚度2μm之作為硬化物層的1/2波長相位差層。 A λ/2 alignment treatment is performed by applying a composition for forming an alignment layer on a base material layer formed of a transparent resin and drying it. Next, a composition for forming a liquid crystal layer containing a discotic polymerizable liquid crystal compound is applied on the alignment layer, and heating and UV irradiation are performed to fix the alignment of the polymerizable liquid crystal compound, thereby forming a thickness on the alignment layer of the base material layer. 2 μm as the 1/2 wavelength retardation layer of the hardened material layer.

(λ/4波長相位差層的製作) (Fabrication of λ/4 wavelength retardation layer)

在由透明樹脂所形成的基材層上之經摩擦處理的配向層,塗布含有棒狀的向列型聚合性液晶化合物(液晶單體)之液晶層形成用組成物,在保持折射率異向性的狀態下進行固化,藉此在基材層的配向層上形成厚度1μm之作為硬化物層的1/4波長相位差層。 A composition for forming a liquid crystal layer containing a rod-shaped nematic polymerizable liquid crystal compound (liquid crystal monomer) is applied to the rubbing-treated alignment layer on the base material layer formed of a transparent resin, while maintaining the anisotropy of refractive index. By curing in a stable state, a 1/4 wavelength retardation layer as a cured product layer with a thickness of 1 μm was formed on the alignment layer of the base material layer.

(附基材層的相位差層之製作) (Production of retardation layer with base layer)

對基材層上之1/2波長相位差層的表面、及基材層上之1/4波長相位差層的表面分別施予電暈處理。以使該2層的相位差層的慢軸所夾的角度成為60°的方式,使用上述所調製的活性能量線硬化型接著劑而將各電暈處理面彼此貼合。然後,從1/4波長相位差層側,使用紫外線照射裝置[Fusion UV Systems(股)製]以累積光量400mJ/cm2(UV-B)進行紫外線照射以使活性能量線硬化型接著劑硬化,形成作為貼合層(貼合層(X))之接著劑層。貼合係使用積層機進行,活性能量線硬化型接 著劑係以使硬化後的接著劑層的厚度成為3μm之方式塗布。藉此得到依序積層有基材層、配向層、1/2波長相位差層(第1硬化物層)、接著劑層(貼合層、貼合層(X))、1/4波長相位差層(第2硬化物層)、配向層及基材層之附基材層的相位差層。此外,附基材層的相位差層之中,1/2波長相位差層(第1硬化物層)、接著劑層(貼合層、貼合層(X))及1/4波長相位差層(第2硬化物層)係構成實施例及比較例的光學積層體中之相位差層,該相位差層的厚度為6μm。 Corona treatment was applied to the surface of the 1/2 wavelength retardation layer on the base layer and the surface of the 1/4 wavelength retardation layer on the base layer, respectively. The respective corona-treated surfaces were bonded together using the active energy ray-curable adhesive prepared above so that the angle between the slow axes of the two retardation layers was 60°. Then, from the 1/4 wavelength retardation layer side, ultraviolet irradiation was performed with a cumulative light amount of 400 mJ/cm 2 (UV-B) using an ultraviolet irradiation apparatus (manufactured by Fusion UV Systems Co., Ltd.) to harden the active energy ray-curable adhesive. , to form an adhesive layer as a bonding layer (bonding layer (X)). The bonding was performed using a laminator, and the active energy ray-curable adhesive was applied so that the thickness of the adhesive layer after curing was 3 μm . Thereby, the base material layer, the alignment layer, the 1/2 wavelength retardation layer (the first cured product layer), the adhesive layer (the bonding layer, the bonding layer (X)), the 1/4 wavelength retardation layer, the adhesive layer (the bonding layer, the bonding layer (X)), and the The retardation layer with the base layer of the difference layer (the second cured product layer), the alignment layer and the base layer. In addition, among the retardation layers with the base material layer, the 1/2 wavelength retardation layer (the first cured product layer), the adhesive layer (the bonding layer, the bonding layer (X)), and the 1/4 wavelength retardation layer The layer (the second cured product layer) constituted the retardation layer in the optical layered bodies of Examples and Comparative Examples, and the thickness of the retardation layer was 6 μm .

(3)光學積層體的製作 (3) Production of optical laminates

[實施例1] [Example 1]

將上述所製作之附基材層的相位差層之靠1/2波長相位差層側的基材層及配向層剝離而露出的1/2波長相位差層、與上述所製作之偏光板的直線偏光層側,使用厚度5μm的丙烯酸系黏著劑層(儲存彈性模數:125,000Pa)予以貼合。1/2波長相位差層與偏光板的貼合係以使1/2波長相位差層的慢軸與直線偏光層的穿透軸所夾的角度成為15°之方式進行。接著,在將1/4波長相位差層側的配向層及基材層剝離而露出的1/4波長相位差層,隔著厚度5μm的丙烯酸系黏著劑層(儲存彈性模數:125,000Pa),貼合已在欲與丙烯酸系黏著劑層相接的表面施予電暈處理而得的作為阻隔層之厚度13μm的環烯烴膜(1)(以下有時稱為「COP膜(1)」),在COP膜的表面形成厚度15μm的黏著劑層(儲存彈性模數:25,500Pa)(以下有時稱為「黏著劑層(a)」),而得到光學積層體(1)。 The 1/2 wavelength retardation layer exposed by peeling off the base material layer and the alignment layer on the side of the 1/2 wavelength retardation layer of the retardation layer with the base material layer produced above, and the polarizing plate produced above. The linear polarizing layer side was bonded together using an acrylic adhesive layer (storage elastic modulus: 125,000 Pa) having a thickness of 5 μm . The 1/2 wavelength retardation layer and the polarizing plate were bonded together so that the angle between the slow axis of the 1/2 wavelength retardation layer and the transmission axis of the linear polarizing layer was 15°. Next, the 1/4 wavelength retardation layer exposed by peeling off the alignment layer and the base layer on the side of the quarter wavelength retardation layer was interposed with an acrylic adhesive layer (storage elastic modulus: 125,000) having a thickness of 5 μm . Pa), a cycloolefin film (1) with a thickness of 13 μm (hereinafter sometimes referred to as “COP film”) as a barrier layer obtained by corona treatment on the surface to be in contact with the acrylic adhesive layer is attached. (1)"), an adhesive layer (storage elastic modulus: 25,500 Pa) with a thickness of 15 μm (hereinafter sometimes referred to as “adhesive layer (a)”) was formed on the surface of the COP film to obtain an optical laminate (1).

光學積層體(1)係依序積層有附HC的COP膜(保護層、第1保護層)、接著劑層(第1貼合層)、直線偏光層、黏著劑層(貼合層(Y))、1/2波長相位差層(第1硬化物層)、接著劑層(貼合層、貼合層(X))、1/4波長相位差層(第2硬化物層)、黏著劑層(貼合層(Z))、COP膜(1)(阻隔層)及黏著劑層(a)者。從直線偏光層之靠1/2 波長相位差層側的表面起到黏著劑層(a)之與COP膜側為相反側的表面為止的距離D(黏著劑層(貼合層(Y))至黏著劑層(a)的厚度)為44μm。 The optical laminate (1) is formed by sequentially laminating a HC-attached COP film (protective layer, first protective layer), an adhesive layer (first bonding layer), a linear polarizing layer, and an adhesive layer (bonding layer (Y )), 1/2 wavelength retardation layer (first cured product layer), adhesive layer (bonding layer, bonding layer (X)), 1/4 wavelength retardation layer (second cured product layer), adhesive Agent layer (lamination layer (Z)), COP film (1) (barrier layer) and adhesive layer (a). Distance D from the surface of the linearly polarizing layer on the 1/2 wavelength retardation layer side to the surface of the adhesive layer (a) on the opposite side to the COP film side (adhesive layer (bonding layer (Y)) The thickness to the adhesive layer (a)) was 44 μm .

進行光學積層體(1)所使用的COP膜(1)的透濕度的測定、光學積層體(1)中之黏著劑層(a)的碘量的測定、及金屬層的腐蝕性的評估。將結果表示於表1。 The measurement of the moisture permeability of the COP film (1) used in the optical layered body (1), the measurement of the iodine content of the adhesive layer (a) in the optical layered body (1), and the evaluation of the corrosivity of the metal layer were performed. The results are shown in Table 1.

[實施例2] [Example 2]

除了使用厚度23μm的環烯烴膜(2)(以下有時稱為「COP膜(2)」)取代COP膜(1)而作為阻隔層以外,其餘以與實施例1同樣的方式得到光學積層體(2)。 Optical fibers were obtained in the same manner as in Example 1, except that a 23 μm -thick cycloolefin film (2) (hereinafter sometimes referred to as “COP film (2)”) was used as the barrier layer instead of the COP film (1). Laminate (2).

光學積層體(2)係依序積層有附HC的COP膜(保護層、第1保護層)、接著劑層(第1貼合層)、直線偏光層、黏著劑層(貼合層(Y))、1/2波長相位差層(第1硬化物層)、接著劑層(貼合層、貼合層(X))、1/4波長相位差層(第2硬化物層)、黏著劑層(貼合層(Z))、COP膜(2)(阻隔層)及黏著劑層(a)者。從直線偏光層之靠1/2波長相位差層側的表面起到黏著劑層(a)之與COP膜側為相反側的表面為止的距離D(黏著劑層(貼合層(Y))至黏著劑層(a)的厚度)為54μm。 The optical layered body (2) is formed by sequentially laminating the HC-attached COP film (protective layer, the first protective layer), the adhesive layer (the first bonding layer), the linear polarizing layer, and the adhesive layer (the bonding layer (Y). )), 1/2 wavelength retardation layer (first cured product layer), adhesive layer (bonding layer, bonding layer (X)), 1/4 wavelength retardation layer (second cured product layer), adhesive Agent layer (lamination layer (Z)), COP film (2) (barrier layer) and adhesive layer (a). Distance D from the surface on the half wavelength retardation layer side of the linearly polarizing layer to the surface on the opposite side to the COP film side of the adhesive layer (a) (adhesive layer (bonding layer (Y)) The thickness to the adhesive layer (a)) was 54 μm .

進行光學積層體(2)所使用的COP膜(2)的透濕度的測定、光學積層體(2)中之黏著劑層(a)的碘量的測定、及金屬層的腐蝕性的評估。將結果表示於表1。 The measurement of the water vapor transmission rate of the COP film (2) used for the optical layered body (2), the measurement of the iodine content of the adhesive layer (a) in the optical layered body (2), and the evaluation of the corrosivity of the metal layer were performed. The results are shown in Table 1.

[實施例3] [Example 3]

除了使用厚度20μm的丙烯酸膜(以下有時稱為「PMMA膜」)取代COP膜(1)而作為阻隔層以外,其餘以與實施例1同樣的方式得到光學積層體(3)。 An optical laminate (3) was obtained in the same manner as in Example 1, except that an acrylic film (hereinafter sometimes referred to as a "PMMA film") having a thickness of 20 μm was used as the barrier layer instead of the COP film (1).

光學積層體(3)係依序積層有附HC的COP膜(保護層、第1保護層)、接著劑層(第1貼合層)、直線偏光層、黏著劑層(貼合層(Y))、1/2波長相位差層(第 1硬化物層)、接著劑層(貼合層、貼合層(X))、1/4波長相位差層(第2硬化物層)、黏著劑層(貼合層(Z))、PMMA膜(阻隔層)及黏著劑層(a)者。從直線偏光層之靠1/2波長相位差層側的表面起到黏著劑層(a)之與COP膜側為相反側的表面為止的距離D(黏著劑層(貼合層(Y))至黏著劑層(a)的厚度)為51μm。 The optical laminate (3) is formed by sequentially laminating a HC-attached COP film (protective layer, first protective layer), an adhesive layer (first bonding layer), a linear polarizing layer, and an adhesive layer (bonding layer (Y). )), 1/2 wavelength retardation layer (first cured product layer), adhesive layer (bonding layer, bonding layer (X)), 1/4 wavelength retardation layer (second cured product layer), adhesive Agent layer (lamination layer (Z)), PMMA film (barrier layer) and adhesive layer (a). Distance D from the surface on the half wavelength retardation layer side of the linearly polarizing layer to the surface on the opposite side to the COP film side of the adhesive layer (a) (adhesive layer (bonding layer (Y)) The thickness to the adhesive layer (a)) was 51 μm .

進行光學積層體(3)所使用的PMMA膜的透濕度的測定、光學積層體(3)中之黏著劑層(a)的碘量的測定、及金屬層的腐蝕性的評估。將結果表示於表1。 The measurement of the moisture permeability of the PMMA film used in the optical laminate (3), the measurement of the iodine content of the adhesive layer (a) in the optical laminate (3), and the evaluation of the corrosion properties of the metal layer were performed. The results are shown in Table 1.

[實施例4] [Example 4]

在將1/4波長相位差層側之配向層及基材層剝離而露出的1/4波長相位差層,使用上述所調製的活性能量線硬化型接著劑貼合作為阻隔層之COP膜(1),並使活性能量線硬化型接著劑硬化而形成厚度2μm的接著劑層,除此以外,其餘以與實施例1同樣的方式得到光學積層體(4)。 A COP film ( 1) An optical laminate (4) was obtained in the same manner as in Example 1, except that the active energy ray-curable adhesive was cured to form an adhesive layer with a thickness of 2 μm .

光學積層體(4)係依序積層有附HC的COP膜(保護層、第1保護層)、接著劑層(第1貼合層)、直線偏光層、黏著劑層(貼合層(Y))、1/2波長相位差層(第1硬化物層)、接著劑層(貼合層、貼合層(X))、1/4波長相位差層(第2硬化物層)、接著劑層(貼合層(Z))、COP膜(1)(阻隔層)及黏著劑層(a)者。從直線偏光層之靠1/2波長相位差層側的表面起到黏著劑層(a)之與COP膜側為相反側的表面為止的距離D(黏著劑層(貼合層(Y))至黏著劑層(a)的厚度)為41μm。 The optical layered body (4) is formed by sequentially laminating a HC-attached COP film (protective layer, first protective layer), an adhesive layer (first bonding layer), a linear polarizing layer, and an adhesive layer (bonding layer (Y). )), 1/2 wavelength retardation layer (first cured product layer), adhesive layer (bonding layer, bonding layer (X)), 1/4 wavelength retardation layer (second cured product layer), and then Agent layer (lamination layer (Z)), COP film (1) (barrier layer) and adhesive layer (a). Distance D from the surface on the half wavelength retardation layer side of the linearly polarizing layer to the surface on the opposite side to the COP film side of the adhesive layer (a) (adhesive layer (bonding layer (Y)) The thickness to the adhesive layer (a)) was 41 μm .

進行光學積層體(4)中之黏著劑層(a)的碘量的測定、及金屬層的腐蝕性的評估。將結果表示於表1。 The measurement of the amount of iodine in the adhesive layer (a) in the optical layered body (4) and the evaluation of the corrosivity of the metal layer were performed. The results are shown in Table 1.

[比較例1] [Comparative Example 1]

在將1/4波長相位差層側之配向層及基材層剝離而露出的1/4波長相位差層,不設置丙烯酸系黏著劑層及阻隔層,而直接形成黏著劑層(a),除此以外,其餘以與實施例1同樣的方式得到光學積層體(5)。 On the 1/4 wavelength retardation layer exposed by peeling off the alignment layer and the base material layer on the side of the 1/4 wavelength retardation layer, the acrylic adhesive layer and the barrier layer are not provided, but the adhesive layer (a) is directly formed, Except for this, the optical layered body (5) was obtained in the same manner as in Example 1.

光學積層體(5)係依序積層有附HC的COP膜(保護層、第1保護層)、接著劑層(第1貼合層)、直線偏光層、黏著劑層(貼合層(Y))、1/2波長相位差層(第1硬化物層)、接著劑層(貼合層、貼合層(X))、1/4波長相位差層(第2硬化物層)及黏著劑層(a)者。從直線偏光層之靠1/2波長相位差層側的表面起到黏著劑層(a)之與COP膜側為相反側的表面為止的距離D(黏著劑層(貼合層(Y))至黏著劑層(a)的厚度)為26μm。 The optical laminate (5) is formed by sequentially laminating a HC-attached COP film (protective layer, first protective layer), an adhesive layer (first bonding layer), a linear polarizing layer, and an adhesive layer (bonding layer (Y); )), 1/2 wavelength retardation layer (first cured product layer), adhesive layer (lamination layer, bonding layer (X)), 1/4 wavelength retardation layer (second cured product layer) and adhesive Agent layer (a). Distance D from the surface on the half wavelength retardation layer side of the linearly polarizing layer to the surface on the opposite side to the COP film side of the adhesive layer (a) (adhesive layer (bonding layer (Y)) The thickness to the adhesive layer (a)) was 26 μm .

進行光學積層體(5)中之黏著劑層(a)的碘量的測定、及金屬層的腐蝕性的評估。將結果表示於表1。 Measurement of the amount of iodine in the adhesive layer (a) in the optical layered body (5) and evaluation of the corrosiveness of the metal layer were performed. The results are shown in Table 1.

[實施例5] [Example 5]

將1/2波長相位差層側之基材層及配向層剝離而露出的1/2波長相位差層、與偏光板的直線偏光層側,使用上述所調製的活性能量線硬化型接著劑予以貼合,並使活性能量線硬化型接著劑硬化而形成厚度2μm的接著劑層,除此以外,其餘以與實施例1同樣的方式得到光學積層體(6)。 The 1/2 wavelength retardation layer exposed by peeling off the base material layer and the alignment layer on the side of the 1/2 wavelength retardation layer, and the linear polarizing layer side of the polarizing plate, were treated with the active energy ray hardening type adhesive prepared above. The optical layered body (6) was obtained in the same manner as in Example 1, except that the active energy ray-curable adhesive was hardened to form an adhesive layer with a thickness of 2 μm .

光學積層體(6)係依序積層有附HC的COP膜(保護層、第1保護層)、接著劑層(第1貼合層)、直線偏光層、接著劑層(貼合層(Y))、1/2波長相位差層(第1硬化物層)、接著劑層(貼合層、貼合層(X))、1/4波長相位差層(第2硬化物層)、黏著劑層(貼合層(Z))、COP膜(1)(阻隔層)、及黏著劑層(a)者。從直線偏光層之靠1/2波長相位差層側的表面起到黏著劑層(a)之與COP膜側為相反側的表面為止的距離D(接著劑層(貼合層(Y))至黏著劑層(a)的厚度)為41μm。 The optical layered body (6) is formed by sequentially laminating a HC-attached COP film (protective layer, first protective layer), an adhesive layer (first bonding layer), a linear polarizing layer, and an adhesive layer (bonding layer (Y) )), 1/2 wavelength retardation layer (first cured product layer), adhesive layer (bonding layer, bonding layer (X)), 1/4 wavelength retardation layer (second cured product layer), adhesive Agent layer (bonding layer (Z)), COP film (1) (barrier layer), and adhesive layer (a). Distance D from the surface on the half wavelength retardation layer side of the linearly polarizing layer to the surface on the opposite side to the COP film side of the adhesive layer (a) (adhesive layer (bonding layer (Y)) The thickness to the adhesive layer (a)) was 41 μm .

進行光學積層體(6)中之黏著劑層(a)的碘量的測定、及金屬層的腐蝕性的評估。將結果表示於表1。 Measurement of the amount of iodine in the adhesive layer (a) in the optical layered body (6) and evaluation of the corrosiveness of the metal layer were performed. The results are shown in Table 1.

[實施例6] [Example 6]

在將1/4波長相位差層側之配向層及基材層剝離而露出的1/4波長相位差層,使用上述所調製的活性能量線硬化型接著劑貼合作為阻隔層之COP膜(1),並使活性能量線硬化型接著劑硬化而形成厚度2μm的接著劑層,除此以外,其餘以與實施例5同樣的方式得到光學積層體(7)。 The COP film ( 1) An optical laminate (7) was obtained in the same manner as in Example 5, except that the active energy ray-curable adhesive was cured to form an adhesive layer with a thickness of 2 μm .

光學積層體(7)係依序積層有附HC的COP膜(保護層、第1保護層)、接著劑層(第1貼合層)、直線偏光層、接著劑層(貼合層(Y))、1/2波長相位差層(第1硬化物層)、接著劑層(貼合層、貼合層(X))、1/4波長相位差層(第2硬化物層)、接著劑層(貼合層(Z))、COP膜(1)(阻隔層)及黏著劑層(a)者。從直線偏光層之靠1/2波長相位差層側的表面起到黏著劑層(a)之與COP膜側為相反側的表面為止的距離D(接著劑層(貼合層(Y))至黏著劑層(a)的厚度)為38μm。 The optical laminate (7) is formed by sequentially laminating a HC-attached COP film (protective layer, first protective layer), an adhesive layer (first bonding layer), a linear polarizing layer, and an adhesive layer (bonding layer (Y) )), 1/2 wavelength retardation layer (first cured product layer), adhesive layer (bonding layer, bonding layer (X)), 1/4 wavelength retardation layer (second cured product layer), and then Agent layer (lamination layer (Z)), COP film (1) (barrier layer) and adhesive layer (a). Distance D from the surface on the half wavelength retardation layer side of the linearly polarizing layer to the surface on the opposite side to the COP film side of the adhesive layer (a) (adhesive layer (bonding layer (Y)) The thickness to the adhesive layer (a)) was 38 μm .

進行光學積層體(7)中之黏著劑層(a)的碘量的測定、及金屬層的腐蝕性的評估。將結果表示於表1。 Measurement of the amount of iodine in the adhesive layer (a) in the optical layered body (7) and evaluation of the corrosiveness of the metal layer were performed. The results are shown in Table 1.

[實施例7] [Example 7]

除了使用厚度20μm的三乙酸纖維素膜(以下有時稱為「TAC膜」)作為阻隔層以外,其餘以與實施例6同樣的方式得到光學積層體(8)。 An optical laminate (8) was obtained in the same manner as in Example 6, except that a 20 μm -thick cellulose triacetate film (hereinafter, sometimes referred to as “TAC film”) was used as the barrier layer.

光學積層體(8)係依序積層有附HC的COP膜(保護層、第1保護層)、接著劑層(第1貼合層)、直線偏光層、接著劑層(貼合層(Y))、1/2波長相位差層(第1硬化物層)、接著劑層(貼合層、貼合層(X))、1/4波長相位差層(第2硬化物層)、接著劑層(貼合層(Z))、TAC膜(阻隔層)及黏著劑層(a)者。從直線偏光層之靠1/2波 長相位差層側的表面起到黏著劑層(a)之與COP膜側為相反側的表面為止的距離D(接著劑層(貼合層(Y))至黏著劑層(a)的厚度)為45μm。 The optical laminate (8) is formed by sequentially laminating a HC-attached COP film (protective layer, first protective layer), an adhesive layer (first bonding layer), a linear polarizing layer, and an adhesive layer (bonding layer (Y). )), 1/2 wavelength retardation layer (first cured product layer), adhesive layer (bonding layer, bonding layer (X)), 1/4 wavelength retardation layer (second cured product layer), and then Agent layer (lamination layer (Z)), TAC film (barrier layer) and adhesive layer (a). Distance D from the surface on the half wavelength retardation layer side of the linearly polarizing layer to the surface on the opposite side to the COP film side of the adhesive layer (a) (adhesive layer (bonding layer (Y)) The thickness to the adhesive layer (a)) was 45 μm .

進行光學積層體(8)所使用的TAC膜的透濕度的測定、光學積層體(8)中之黏著劑層(a)的碘量的測定、及金屬層的腐蝕性的評估。將結果表示於表1。 The measurement of the water vapor transmission rate of the TAC film used for the optical laminate (8), the measurement of the iodine content of the adhesive layer (a) in the optical laminate (8), and the evaluation of the corrosivity of the metal layer were performed. The results are shown in Table 1.

[比較例2] [Comparative Example 2]

在將1/4波長相位差層側之配向層及基材層剝離而露出的1/4波長相位差層,不設置丙烯酸系黏著劑層及阻隔層,而直接形成黏著劑層(a),除此以外,其餘以與實施例5同樣的方式得到光學積層體(9)。 On the 1/4 wavelength retardation layer exposed by peeling off the alignment layer and the base material layer on the side of the 1/4 wavelength retardation layer, the acrylic adhesive layer and the barrier layer are not provided, but the adhesive layer (a) is directly formed, Except for this, the optical layered body (9) was obtained in the same manner as in Example 5.

光學積層體(9)係依序積層有附HC的COP膜(保護層、第1保護層)、接著劑層(第1貼合層)、直線偏光層、接著劑層(貼合層(Y))、1/2波長相位差層(第1硬化物層)、接著劑層(貼合層、貼合層(X))、1/4波長相位差層(第2硬化物層)及黏著劑層(a)者。從直線偏光層之靠1/2波長相位差層側的表面起到黏著劑層(a)之與COP膜側為相反側的表面為止的距離D(接著劑層(貼合層(Y))至黏著劑層(a)的厚度)為23μm。 The optical laminate (9) is formed by sequentially laminating a HC-attached COP film (protective layer, first protective layer), an adhesive layer (first bonding layer), a linear polarizing layer, and an adhesive layer (bonding layer (Y) )), 1/2 wavelength retardation layer (first cured product layer), adhesive layer (lamination layer, bonding layer (X)), 1/4 wavelength retardation layer (second cured product layer) and adhesive Agent layer (a). Distance D from the surface on the half wavelength retardation layer side of the linearly polarizing layer to the surface on the opposite side to the COP film side of the adhesive layer (a) (adhesive layer (bonding layer (Y)) The thickness to the adhesive layer (a)) was 23 μm .

進行光學積層體(9)中之黏著劑層(a)的碘量的測定、及金屬層的腐蝕性的評估。將結果表示於表1。 Measurement of the amount of iodine in the adhesive layer (a) in the optical layered body (9) and evaluation of the corrosiveness of the metal layer were performed. The results are shown in Table 1.

[表1]

Figure 110122767-A0202-12-0033-1
[Table 1]
Figure 110122767-A0202-12-0033-1

1,1a:光學積層體 1,1a: Optical laminate

4:阻隔層 4: Barrier layer

5:黏著劑層 5: Adhesive layer

10:相位差層 10: retardation layer

11:第1硬化物層(硬化物層) 11: The first hardened material layer (hardened material layer)

21:第1貼合層 21: The first bonding layer

23:貼合層(Y) 23: Lamination layer (Y)

24:貼合層(Z) 24: Lamination layer (Z)

30:偏光板 30: polarizer

31:直線偏光層 31: Linear polarizing layer

32:第1保護層(保護層) 32: The first protective layer (protective layer)

Claims (10)

一種光學積層體,係依序包含直線偏光層、相位差層、阻隔層及黏著劑層;其中, An optical laminate, which sequentially comprises a linear polarizing layer, a retardation layer, a barrier layer and an adhesive layer; wherein, 前述直線偏光層為吸附配向有碘之聚乙烯醇系樹脂膜, The aforementioned linear polarizing layer is a polyvinyl alcohol-based resin film with iodine in adsorption alignment, 前述相位差層包含至少1層之由聚合性液晶化合物聚合硬化而成之硬化物層, The retardation layer includes at least one cured product layer formed by polymerizing and curing a polymerizable liquid crystal compound, 前述阻隔層係與前述黏著劑層直接相接而設置, The above-mentioned barrier layer is arranged in direct contact with the above-mentioned adhesive layer, 前述阻隔層之在溫度40℃、相對濕度90%RH的透濕度為1g/m2/24hr以上2000g/m2/24hr以下, The moisture permeability of the aforementioned barrier layer at a temperature of 40°C and a relative humidity of 90% RH is 1g/m 2 /24hr or more and 2000g/m 2 /24hr or less, 從前述直線偏光層之靠前述相位差層側的表面起到前述黏著劑層之與前述阻隔層側為相反側的表面為止的距離為55μm以下。 The distance from the surface on the retardation layer side of the linearly polarizing layer to the surface on the opposite side to the barrier layer side of the adhesive layer is 55 μm or less. 如請求項1所述之光學積層體,其中,將前述光學積層體在溫度85℃、相對濕度85%RH的條件下保管240小時後,前述黏著劑層之碘量為250ppm以下。 The optical layered product according to claim 1, wherein the iodine content of the adhesive layer is 250 ppm or less after the optical layered product is stored for 240 hours under conditions of a temperature of 85° C. and a relative humidity of 85% RH. 如請求項1或2所述之光學積層體,其中,前述阻隔層為樹脂膜。 The optical laminate according to claim 1 or 2, wherein the barrier layer is a resin film. 如請求項1至3中任一項所述之光學積層體,其中,前述相位差層包含2層的前述硬化物層, The optical laminate according to any one of claims 1 to 3, wherein the retardation layer includes two layers of the hardened material layer, 並且前述相位差層包含用以將前述2層的硬化物層彼此貼合之貼合層(X)。 And the said retardation layer contains the bonding layer (X) for bonding the said two hardened|cured material layers mutually. 如請求項4所述之光學積層體,其中,前述貼合層(X)為接著劑層。 The optical laminate according to claim 4, wherein the bonding layer (X) is an adhesive layer. 如請求項1至5中任一項所述之光學積層體,更包含:含有前述直線偏光層的偏光板、及用以將前述偏光板與前述相位差層貼合之貼合層(Y), The optical laminate according to any one of claims 1 to 5, further comprising: a polarizing plate containing the linear polarizing layer, and a bonding layer (Y) for bonding the polarizing plate and the retardation layer together , 前述偏光板中,於前述直線偏光層的單面或雙面設置有保護層。 In the aforementioned polarizing plate, a protective layer is provided on one side or both sides of the aforementioned linear polarizing layer. 如請求項1至6中任一項所述之光學積層體,更包含用以將前述相位差層與前述阻隔層貼合之貼合層(Z)。 The optical laminate according to any one of claims 1 to 6, further comprising a bonding layer (Z) for bonding the retardation layer and the barrier layer. 如請求項7所述之光學積層體,其中,前述貼合層(Z)為接著劑層。 The optical laminate according to claim 7, wherein the bonding layer (Z) is an adhesive layer. 如請求項1至8中任一項所述之光學積層體,其中,於前述黏著劑層之與前述阻隔層側為相反側處更包含金屬層。 The optical laminate according to any one of claims 1 to 8, further comprising a metal layer on the side opposite to the barrier layer side of the adhesive layer. 如請求項9所述之光學積層體,其中,前述金屬層係與前述黏著劑層直接相接而設置。 The optical laminate according to claim 9, wherein the metal layer is provided in direct contact with the adhesive layer.
TW110122767A 2020-09-10 2021-06-22 Optical laminate TW202222573A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-151854 2020-09-10
JP2020151854A JP2022046029A (en) 2020-09-10 2020-09-10 Optical laminate

Publications (1)

Publication Number Publication Date
TW202222573A true TW202222573A (en) 2022-06-16

Family

ID=80476650

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110122767A TW202222573A (en) 2020-09-10 2021-06-22 Optical laminate

Country Status (4)

Country Link
JP (2) JP2022046029A (en)
KR (1) KR20220033996A (en)
CN (1) CN114167538A (en)
TW (1) TW202222573A (en)

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4474094B2 (en) * 2002-09-19 2010-06-02 富士フイルム株式会社 Image display device
JP4465205B2 (en) * 2004-02-16 2010-05-19 日東電工株式会社 Reflective polarizing plate, manufacturing method thereof, and image display device
JP6071459B2 (en) * 2012-11-19 2017-02-01 日東電工株式会社 Polarizing plate, image display device, and manufacturing method thereof
JP6138002B2 (en) * 2013-09-09 2017-05-31 日東電工株式会社 Polarizing film with adhesive layer for transparent conductive film, laminate, and image display device
JP6803131B2 (en) * 2014-02-18 2020-12-23 日東電工株式会社 Laminate and image display device
JPWO2016013260A1 (en) * 2014-07-25 2017-06-01 コニカミノルタ株式会社 Polarizing plate, manufacturing method of polarizing plate, and liquid crystal display device
JP6738139B2 (en) * 2014-11-20 2020-08-12 日東電工株式会社 Circularly polarizing plate for organic EL display device and organic EL display device
JP6784481B2 (en) * 2015-07-13 2020-11-11 日東電工株式会社 Circular polarizing plate for organic EL display device and organic EL display device
JP2017102443A (en) * 2015-11-20 2017-06-08 日東電工株式会社 Optical laminated body and organic electroluminescence display device using same
KR20180088808A (en) * 2015-11-30 2018-08-07 니폰 제온 가부시키가이샤 Double layer film, manufacturing method, circular polarizer, anti-reflection film and organic electroluminescence display device
JP6589033B2 (en) * 2017-11-10 2019-10-09 住友化学株式会社 Display device
WO2020111232A1 (en) * 2018-11-29 2020-06-04 日東電工株式会社 Polarizing film with adhesive layer, and image display device

Also Published As

Publication number Publication date
JP2022174753A (en) 2022-11-24
JP2022046029A (en) 2022-03-23
CN114167538A (en) 2022-03-11
KR20220033996A (en) 2022-03-17

Similar Documents

Publication Publication Date Title
TWI708826B (en) Flexible laminated body and image display device provided with the same
CN105739003B (en) Polarizing plate
WO2021225114A1 (en) Image display device
TW202046076A (en) Flexible laminate and image display device provided with flexible laminate
CN105739002B (en) Polarizing plate
JP2008183812A (en) Manufacturing process of liquid crystal film and lamination film for optical device
WO2021085000A1 (en) Optical laminate and display device
TW202222573A (en) Optical laminate
WO2021132236A1 (en) Optical laminate
JP2023003753A (en) Optical laminate and display device
WO2022239508A1 (en) Optical laminate
JP7240938B2 (en) Optical laminate and image display device
JP2005114995A (en) Polarizing plate
WO2022250025A1 (en) Optical laminate
WO2023013275A1 (en) Retardation layer-equipped polarizing plate and image display device using same
JP2022183013A (en) optical laminate
WO2023063129A1 (en) Retardation layer–equipped polarizing plate and image display device using same
CN117242376A (en) Optical laminate
WO2023063128A1 (en) Retardation layer–equipped polarizing plate and image display device using same
TW202307486A (en) Display device
CN116266001A (en) Laminate body
WO2021225115A1 (en) Polarization film laminate
TW202040188A (en) Layered body and display device
TW202335865A (en) Laminate
JP2022008247A (en) Polarizing plate for oled and image display device including the same