TW202219599A - Retractable substrate - Google Patents

Retractable substrate Download PDF

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TW202219599A
TW202219599A TW110109692A TW110109692A TW202219599A TW 202219599 A TW202219599 A TW 202219599A TW 110109692 A TW110109692 A TW 110109692A TW 110109692 A TW110109692 A TW 110109692A TW 202219599 A TW202219599 A TW 202219599A
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active element
sub
pixel
retractable
active
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TW110109692A
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TWI767615B (en
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林恭正
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友達光電股份有限公司
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Abstract

A retractable substrate includes a patterned substrate, a plurality of device parts, and a plurality of circuit parts. The device parts are located on the patterned substrate. Each device parts includes an active area and a peripheral area surrounding the active area. Each device parts includes a first active element and a second active element arranged in the active area. The circuit parts are located on the patterned substrate and is connected to corresponding device parts.

Description

可伸縮式基板retractable base plate

本發明是有關於一種可伸縮式基板,且特別是有關於一種適用於顯示裝置的可伸縮式基板。The present invention relates to a retractable substrate, and more particularly, to a retractable substrate suitable for a display device.

隨著電子技術的高度發展,電子產品不斷推陳出新。為使電子產品能應用於各種不同的領域,可拉伸、輕薄及外型不受限的特性逐漸受到重視。也就是說,電子產品逐漸被要求依據不同的應用方式以及應用環境而具有不同的外型,因此電子產品需具有可拉伸性。With the high development of electronic technology, electronic products are constantly innovating. In order to enable electronic products to be applied in various fields, the characteristics of stretchability, thinness and unrestricted appearance have gradually been paid more and more attention. That is to say, electronic products are gradually required to have different shapes according to different application methods and application environments, so electronic products need to be stretchable.

然而,電子產品在被拉伸的狀態下,可能會因為承受應力造成結構上的斷裂,甚至進一步造成內部線路的斷路。因此,如何使可拉伸的電子產品具有良好的製造良率(yield)及產品可靠度(reliability),實為目前亟欲解決的課題。However, when the electronic product is stretched, it may cause structural fracture due to stress, and even further cause the internal circuit to be disconnected. Therefore, how to make stretchable electronic products have good manufacturing yield and product reliability is an urgent problem to be solved at present.

本發明提供一種可伸縮式基板,可以改善可伸縮式基板在拉伸後出現主動元件損壞的問題。The invention provides a retractable base plate, which can improve the problem that the active element is damaged after the retractable base plate is stretched.

本發明的至少一實施例提供一種可伸縮式基板。可伸縮式基板包括圖案化基板、多個裝置部以及多個線路部。裝置部位於圖案化基板上。各裝置部包括主動區以及環繞主動區的周邊區。各裝置部包括設置於主動區中的第一主動元件以及第二主動元件。線路部位於圖案化基板上,且連接對應的裝置部。At least one embodiment of the present invention provides a retractable substrate. The retractable substrate includes a patterned substrate, a plurality of device parts, and a plurality of circuit parts. The device portion is located on the patterned substrate. Each device portion includes an active area and a peripheral area surrounding the active area. Each device portion includes a first active element and a second active element disposed in the active region. The circuit part is located on the patterned substrate and is connected to the corresponding device part.

圖1A是依照本發明的一實施例的一種可伸縮式基板10的上視示意圖。FIG. 1A is a schematic top view of a retractable substrate 10 according to an embodiment of the present invention.

請參考圖1A,可伸縮式基板10包括圖案化基板100、多個裝置部200以及多個線路部300。在本實施例中,可伸縮式基板10還包括連接部400。Referring to FIG. 1A , the retractable substrate 10 includes a patterned substrate 100 , a plurality of device parts 200 and a plurality of circuit parts 300 . In this embodiment, the retractable base plate 10 further includes a connecting portion 400 .

圖案化基板100為軟性材質,舉例來說,圖案化基板100的材質可包括聚醯亞胺(polyimide;PI)、聚萘二甲酸乙醇酯(polyethylene naphthalate;PEN)、聚對苯二甲酸乙二酯(polyethylene terephthalate;PET)、聚碳酸酯(polycarbonates;PC)、聚醚碸(polyether sulfone;PES)或聚芳基酸酯(polyarylate)、其它合適的材料或前述至少二種材料之組合,但本發明不以此為限。The patterned substrate 100 is a soft material. For example, the material of the patterned substrate 100 may include polyimide (PI), polyethylene naphthalate (PEN), polyethylene terephthalate Ester (polyethylene terephthalate; PET), polycarbonate (polycarbonates; PC), polyether sulfone (PES) or polyarylate (polyarylate), other suitable materials or a combination of at least two of the foregoing materials, but The present invention is not limited to this.

在本實施例中,圖案化基板100具有多個貫孔TH。在本實施例中,各貫孔TH為啞鈴狀。在本實施例中,部分貫孔TH沿著第一方向E1延伸,且另一部分貫孔TH沿著第二方向E2延伸。沿著第一方向E1延伸的部分貫孔TH以及沿著第二方向E2延伸的另一部分貫孔TH交替排列,藉此提升可伸縮式基板10的伸縮性。In this embodiment, the patterned substrate 100 has a plurality of through holes TH. In this embodiment, each through hole TH is in the shape of a dumbbell. In this embodiment, some of the through holes TH extend along the first direction E1, and another part of the through holes TH extend along the second direction E2. Part of the through holes TH extending along the first direction E1 and another part of the through holes TH extending along the second direction E2 are alternately arranged, thereby improving the stretchability of the retractable substrate 10 .

裝置部200、線路部300以及連接部400位於圖案化基板100上。裝置部200、線路部300以及連接部400相連在一起,且貫孔TH中之一個至少被四個裝置部200實質上環繞。在本實施例中,一個貫孔TH被四個裝置部200、兩個線路部300以及兩個連接部400實質上環繞。舉例來說,在圖1A中,位於中央的貫孔TH被左右兩個線路部300、上下兩個連接部400以及四個角落的裝置部200所環繞。The device part 200 , the circuit part 300 and the connection part 400 are located on the patterned substrate 100 . The device part 200 , the circuit part 300 and the connection part 400 are connected together, and at least one of the through holes TH is substantially surrounded by the four device parts 200 . In this embodiment, one through hole TH is substantially surrounded by four device parts 200 , two circuit parts 300 and two connecting parts 400 . For example, in FIG. 1A , the central through hole TH is surrounded by two left and right circuit parts 300 , two upper and lower connecting parts 400 , and four corner device parts 200 .

各裝置部200包括主動區AR以及環繞主動區AR的周邊區PR。各裝置部200包括設置於主動區AR中的第一主動元件T1以及第二主動元件T2。在本實施例中,各裝置部200還包括第三主動元件T3。在一些實施例中,各裝置部200為長度為L且寬度為W的矩形,在各裝置部200的寬度W的方向上,周邊區PR的寬度W1為16%W至40%W,且在各裝置部200的長度L的方向上,周邊區PR的寬度W2為16%L至40%L。周邊區PR的寬度W1以及寬度W2為10至250微米。Each device portion 200 includes an active area AR and a peripheral area PR surrounding the active area AR. Each device portion 200 includes a first active element T1 and a second active element T2 disposed in the active area AR. In this embodiment, each device part 200 further includes a third active element T3. In some embodiments, each device portion 200 is a rectangle with a length L and a width W, and in the direction of the width W of each device portion 200 , the width W1 of the peripheral region PR is 16%W to 40%W, and The width W2 of the peripheral region PR in the direction of the length L of each device portion 200 is 16%L to 40%L. The width W1 and the width W2 of the peripheral region PR are 10 to 250 micrometers.

在本實施例中,各裝置部200包括第一子畫素SP1、第二子畫素SP2以及第三子畫素SP3,其中第二子畫素SP2位於第一子畫素SP1以及第三子畫素SP3之間。第一子畫素SP1、第二子畫素SP2以及第三子畫素SP3分別包括第一主動元件T1、第二主動元件T2以及第三主動元件T3,且第一子畫素SP1、第二子畫素SP2以及第三子畫素SP3分別包括第一發光二極體(圖1A未繪出)、第二發光二極體(圖1A未繪出)以及第三發光二極體(圖1A未繪出)。第一主動元件T1、第二主動元件T2以及第三主動元件T3分別適用於驅動前述第一發光二極體、第二發光二極體以及第三發光二極體。In this embodiment, each device part 200 includes a first sub-pixel SP1, a second sub-pixel SP2 and a third sub-pixel SP3, wherein the second sub-pixel SP2 is located in the first sub-pixel SP1 and the third sub-pixel Between pixels SP3. The first sub-pixel SP1, the second sub-pixel SP2 and the third sub-pixel SP3 respectively include a first active element T1, a second active element T2 and a third active element T3, and the first sub-pixel SP1, the second active element The sub-pixel SP2 and the third sub-pixel SP3 respectively include a first light-emitting diode (not shown in FIG. 1A ), a second light-emitting diode (not shown in FIG. 1A ), and a third light-emitting diode (not shown in FIG. 1A ) not shown). The first active element T1 , the second active element T2 and the third active element T3 are respectively suitable for driving the aforementioned first light emitting diode, second light emitting diode and third light emitting diode.

在本實施例中,可伸縮式基板10適用於顯示裝置,但本發明不以此為限。在其他實施例中,可伸縮式基板10並非顯示裝置,且裝置部200不包括子畫素。In this embodiment, the retractable substrate 10 is suitable for a display device, but the present invention is not limited thereto. In other embodiments, the retractable substrate 10 is not a display device, and the device portion 200 does not include sub-pixels.

線路部300連接對應的裝置部200。在本實施例中,各線路部300連接對應的兩個裝置部200。各線路部300包括至少一訊號線310。訊號線310電性連接至對應的第一子畫素SP1、對應的第二子畫素SP2及/或對應的第三子畫素SP3。雖然在圖1A僅繪出訊號線310延伸至裝置部200邊緣,但實際上,裝置部200中還包括許多其他導線(圖1A未繪出),藉此使訊號線310與對應的第一子畫素SP1、對應的第二子畫素SP2及/或對應的第三子畫素SP3電性連接。The line unit 300 is connected to the corresponding device unit 200 . In this embodiment, each line part 300 is connected to two corresponding device parts 200 . Each line portion 300 includes at least one signal line 310 . The signal line 310 is electrically connected to the corresponding first sub-pixel SP1, the corresponding second sub-pixel SP2 and/or the corresponding third sub-pixel SP3. Although only the signal line 310 is shown to extend to the edge of the device portion 200 in FIG. 1A , in fact, the device portion 200 also includes many other wires (not shown in FIG. 1A ), so that the signal line 310 is connected to the corresponding first sub-connector. The pixel SP1, the corresponding second sub-pixel SP2 and/or the corresponding third sub-pixel SP3 are electrically connected.

連接部400鄰近於對應的線路部300。在本實施例中,各連接部400連接對應的兩個裝置部200,且位於對應的一個線路部300的一側。各連接部400包括依序排列的多個加強結構410。加強結構410與訊號線310隔開。在一些實施例中,加強結構410可調整連接部400與線路部300的中性軸位置,並降低訊號線310因為拉伸而斷線的風險。此外,由於加強結構410與訊號線310隔開,因此,即便加強結構410出現裂痕,裂痕也不易延裂至訊號線310,造成訊號線310斷線。在一些實施例中,加強結構410為備用導線。在一些實施例中,加強結構410為絕緣圖案。The connection part 400 is adjacent to the corresponding line part 300 . In the present embodiment, each connection part 400 is connected to the corresponding two device parts 200 and is located on one side of the corresponding one of the circuit parts 300 . Each connecting portion 400 includes a plurality of reinforcing structures 410 arranged in sequence. The reinforcement structure 410 is separated from the signal line 310 . In some embodiments, the reinforcing structure 410 can adjust the neutral axis positions of the connecting portion 400 and the wiring portion 300 , and reduce the risk of the signal line 310 being disconnected due to stretching. In addition, since the reinforcing structure 410 is separated from the signal line 310 , even if a crack occurs in the reinforcing structure 410 , the crack is not easily extended to the signal line 310 , causing the signal line 310 to be disconnected. In some embodiments, the reinforcement structure 410 is a spare wire. In some embodiments, the reinforcement structure 410 is an insulating pattern.

圖1B是圖1A的可伸縮式基板10在拉伸後的上視示意圖。圖2是圖1B的可伸縮式基板的應變量模擬示意圖,其中在圖2中,位於左邊的數值代表的是應變量。FIG. 1B is a schematic top view of the retractable substrate 10 of FIG. 1A after stretching. FIG. 2 is a schematic diagram of the strain amount simulation of the retractable base plate of FIG. 1B , wherein in FIG. 2 , the numerical value on the left represents the strain amount.

請參考圖1B與圖2,拉伸可伸縮式基板10,並使其變形。在本實施例中,可伸縮式基板10受到不同方向的拉力F,拉力F使可伸縮式基板10的形狀改變。由圖2的模擬圖可以知道,在裝置部200中,靠近外圍的周邊區PR容易出現比中央的主動區AR還要大的應變,因此,使第一主動元件T1、第二主動元件T2以及第三主動元件T3設置於主動區AR中而非周邊區PR中,藉此避免可伸縮式基板10在拉伸後出現第一主動元件T1、第二主動元件T2以及第三主動元件T3的故障問題。Referring to FIG. 1B and FIG. 2 , the retractable substrate 10 is stretched and deformed. In this embodiment, the retractable base plate 10 is subjected to pulling forces F in different directions, and the pulling force F changes the shape of the retractable base plate 10 . It can be seen from the simulation diagram in FIG. 2 that in the device part 200, the peripheral region PR near the periphery is prone to have a larger strain than the active region AR in the center. Therefore, the first active element T1, the second active element T2 and the The third active element T3 is disposed in the active area AR instead of the peripheral area PR, so as to avoid the failure of the first active element T1 , the second active element T2 and the third active element T3 after the retractable substrate 10 is stretched question.

在一些實施例中,第一主動元件T1、第二主動元件T2以及第三主動元件T3是直接電性連接至發光二極體的驅動元件,即第一主動元件T1、第二主動元件T2以及第三主動元件T3與對應之發光二極體中間沒有其他薄膜電晶體,因此,第一主動元件T1、第二主動元件T2以及第三主動元件T3的品質對顯示畫面的影響較第一子畫素SP1、第二子畫素SP2以及第三子畫素SP3中的其他薄膜電晶體(例如開關元件)大。因此,將第一主動元件T1、第二主動元件T2以及第三主動元件T3設置於主動區AR比將其他未直接電性連接至發光二極體的薄膜電晶體設置於主動區AR能更佳的改善可伸縮式基板10在拉伸後出現畫面Mura的問題。In some embodiments, the first active element T1 , the second active element T2 and the third active element T3 are directly electrically connected to the driving elements of the light emitting diodes, namely the first active element T1 , the second active element T2 and There is no other thin-film transistor between the third active element T3 and the corresponding light-emitting diode. Therefore, the quality of the first active element T1, the second active element T2 and the third active element T3 has a greater impact on the display screen than the first sub-picture. Other thin film transistors (eg, switching elements) in the pixel SP1, the second sub-pixel SP2, and the third sub-pixel SP3 are large. Therefore, disposing the first active element T1 , the second active element T2 and the third active element T3 in the active region AR is better than disposing other thin film transistors that are not directly electrically connected to the light emitting diodes in the active region AR The improvement of the retractable substrate 10 has the problem of screen Mura after stretching.

圖3A是依照本發明的一實施例的一種可伸縮式基板20的上視示意圖,其中為了更清楚的說明圖3A的可伸縮式基板20,省略可伸縮式基板20的部分構件並繪示於圖3B與圖3C中,在圖3A至圖3D中,相同層別的導電層(即利用同一道圖案化製程形成的導電層)以相同的斜線或網點繪示,而不同層別的導電層透過貫穿絕緣層(例如絕緣層GI及/或絕緣層ILD)的導通孔V而電性連接。圖3D是圖3A的線A-A’的剖面示意圖。圖3E是依照本發明的一實施例的一種子畫素的等效電路圖,在本實施例中,第一子畫素SP1、第二子畫素SP2以及第三子畫素SP3具有類似的等效電路,且圖3E以第一子畫素SP1的等效電路為例。FIG. 3A is a schematic top view of a retractable base plate 20 according to an embodiment of the present invention. In order to explain the retractable base plate 20 of FIG. 3A more clearly, some components of the retractable base plate 20 are omitted and shown in In FIGS. 3B and 3C , in FIGS. 3A to 3D , the conductive layers of the same layer (that is, the conductive layers formed by the same patterning process) are shown with the same oblique lines or dots, and the conductive layers of different layers It is electrically connected through the via V passing through the insulating layer (eg, the insulating layer GI and/or the insulating layer ILD). Fig. 3D is a schematic cross-sectional view taken along line A-A' of Fig. 3A. 3E is an equivalent circuit diagram of a sub-pixel according to an embodiment of the present invention. In this embodiment, the first sub-pixel SP1, the second sub-pixel SP2 and the third sub-pixel SP3 have similar The equivalent circuit of the first sub-pixel SP1 is taken as an example in FIG. 3E .

在此必須說明的是,圖3A至圖3E的實施例沿用圖1A和圖1B的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。It must be noted here that the embodiments of FIGS. 3A to 3E use the element numbers and part of the content of the embodiment of FIGS. 1A and 1B , wherein the same or similar numbers are used to represent the same or similar elements, and the same elements are omitted. Description of technical content. For the description of the omitted part, reference may be made to the foregoing embodiments, which will not be repeated here.

請參考圖3A至圖3E,裝置部200與線路部300位於圖案化基板100上。在一些實施例中,圖案化基板100表面設置有緩衝層BL,且裝置部200與線路部300位於緩衝層BL上。Referring to FIGS. 3A to 3E , the device portion 200 and the circuit portion 300 are located on the patterned substrate 100 . In some embodiments, a buffer layer BL is disposed on the surface of the patterned substrate 100 , and the device portion 200 and the circuit portion 300 are located on the buffer layer BL.

各線路部300包括多條訊號線SGL。訊號線SGL為掃描線SL、第一資料線DL1、第二資料線DL2、第三資料線DL3、第一電源線PL1及/或第二電源線PL2。Each line part 300 includes a plurality of signal lines SGL. The signal line SGL is the scan line SL, the first data line DL1, the second data line DL2, the third data line DL3, the first power line PL1 and/or the second power line PL2.

各裝置部200包括第一子畫素SP1、第二子畫素SP2以及第三子畫素SP3。Each device unit 200 includes a first sub-pixel SP1, a second sub-pixel SP2, and a third sub-pixel SP3.

第一子畫素SP1包括第一開關元件SE1、第一主動元件T1以及第一發光二極體L1。第一開關元件SE1包括半導體層CHa、閘極Ga、源極Sa與汲極Da。閘極Ga電性連接至掃描線SL。閘極Ga重疊於通道層CHa,且閘極Ga與通道層CHa之間夾有絕緣層GI。絕緣層ILD覆蓋閘極Ga。源極Sa與汲極Da位於絕緣層ILD上,且電性連接至通道層CHa。源極Sa電性連接至第一資料線DL1。The first sub-pixel SP1 includes a first switching element SE1, a first active element T1 and a first light emitting diode L1. The first switching element SE1 includes a semiconductor layer CHa, a gate electrode Ga, a source electrode Sa and a drain electrode Da. The gate electrode Ga is electrically connected to the scan line SL. The gate electrode Ga overlaps with the channel layer CHa, and the insulating layer GI is sandwiched between the gate electrode Ga and the channel layer CHa. The insulating layer ILD covers the gate electrode Ga. The source electrode Sa and the drain electrode Da are located on the insulating layer ILD and are electrically connected to the channel layer CHa. The source electrode Sa is electrically connected to the first data line DL1.

第一主動元件T1包括半導體層CHb、閘極Gb、源極Sb與汲極Db。閘極Gb電性連接至第一開關元件SE1的汲極Da。閘極Gb重疊於通道層CHb,且閘極Gb與通道層CHb之間夾有絕緣層GI。絕緣層ILD覆蓋閘極Gb。源極Sb與汲極Db位於絕緣層ILD上,且電性連接至通道層CHb。源極Sb電性連接至第一電源線PL1。The first active element T1 includes a semiconductor layer CHb, a gate Gb, a source Sb and a drain Db. The gate Gb is electrically connected to the drain Da of the first switching element SE1. The gate electrode Gb overlaps the channel layer CHb, and an insulating layer GI is sandwiched between the gate electrode Gb and the channel layer CHb. The insulating layer ILD covers the gate Gb. The source electrode Sb and the drain electrode Db are located on the insulating layer ILD and are electrically connected to the channel layer CHb. The source electrode Sb is electrically connected to the first power line PL1.

平坦層PL位於源極Sa、汲極Da、源極Sb與汲極Db上,且第一發光二極體L1位於平坦層PL上。在一些實施例中,第一發光二極體L1透過接墊PD1以及接墊PD2而分別電性連接至源極Sb以及第二電源線PL2。The flat layer PL is located on the source electrode Sa, the drain electrode Da, the source electrode Sb and the drain electrode Db, and the first light emitting diode L1 is located on the flat layer PL. In some embodiments, the first light emitting diode L1 is electrically connected to the source electrode Sb and the second power line PL2 through the pad PD1 and the pad PD2, respectively.

第二子畫素SP2包括第二開關元件SE2、第二主動元件T2以及第二發光二極體L2。第二開關元件SE2包括半導體層CHc、閘極Gc、源極Sc與汲極Dc。閘極Gc電性連接至掃描線SL。閘極Gc重疊於通道層CHc,且閘極Gc與通道層CHc之間夾有絕緣層GI。絕緣層ILD覆蓋閘極Gc。源極Sc與汲極Dc位於絕緣層ILD上,且電性連接至通道層CHc。源極Sc電性連接至第二資料線DL2。The second sub-pixel SP2 includes a second switching element SE2, a second active element T2 and a second light emitting diode L2. The second switching element SE2 includes a semiconductor layer CHc, a gate electrode Gc, a source electrode Sc and a drain electrode Dc. The gate electrode Gc is electrically connected to the scan line SL. The gate electrode Gc overlaps the channel layer CHc, and an insulating layer GI is sandwiched between the gate electrode Gc and the channel layer CHc. The insulating layer ILD covers the gate electrode Gc. The source electrode Sc and the drain electrode Dc are located on the insulating layer ILD and are electrically connected to the channel layer CHc. The source electrode Sc is electrically connected to the second data line DL2.

第二主動元件T2包括半導體層CHd、閘極Gd、源極Sd與汲極Dd。閘極Gd電性連接至第二開關元件SE2的汲極Dc。閘極Gd重疊於通道層CHd,且閘極Gd與通道層CHd之間夾有絕緣層GI。絕緣層ILD覆蓋閘極Gd。源極Sd與汲極Dd位於絕緣層ILD上,且電性連接至通道層CHd。源極Sd電性連接至第一電源線PL1。The second active element T2 includes a semiconductor layer CHd, a gate electrode Gd, a source electrode Sd and a drain electrode Dd. The gate electrode Gd is electrically connected to the drain electrode Dc of the second switching element SE2. The gate electrode Gd overlaps the channel layer CHd, and an insulating layer GI is sandwiched between the gate electrode Gd and the channel layer CHd. The insulating layer ILD covers the gate electrode Gd. The source electrode Sd and the drain electrode Dd are located on the insulating layer ILD and are electrically connected to the channel layer CHd. The source electrode Sd is electrically connected to the first power line PL1.

第二發光二極體L2位於平坦層PL上。在一些實施例中,第二發光二極體L2透過接墊PD3以及接墊PD4而分別電性連接至源極Sd以及第二電源線PL2。The second light emitting diode L2 is located on the flat layer PL. In some embodiments, the second light emitting diode L2 is electrically connected to the source electrode Sd and the second power line PL2 through the pad PD3 and the pad PD4, respectively.

第三子畫素SP3包括第三開關元件SE3、第三主動元件T3以及第三發光二極體L3。第三開關元件SE3包括半導體層CHe、閘極Ge、源極Se與汲極De。閘極Ge電性連接至掃描線SL。閘極Ge重疊於通道層CHe,且閘極Ge與通道層CHe之間夾有絕緣層GI。絕緣層ILD覆蓋閘極Ge。源極Se與汲極De位於絕緣層ILD上,且電性連接至通道層CHe。源極Se電性連接至第二資料線DL3。The third sub-pixel SP3 includes a third switching element SE3, a third active element T3 and a third light emitting diode L3. The third switching element SE3 includes a semiconductor layer CHe, a gate electrode Ge, a source electrode Se and a drain electrode De. The gate electrode Ge is electrically connected to the scan line SL. The gate electrode Ge overlaps the channel layer CHe, and the insulating layer GI is sandwiched between the gate electrode Ge and the channel layer CHe. The insulating layer ILD covers the gate electrode Ge. The source electrode Se and the drain electrode De are located on the insulating layer ILD and are electrically connected to the channel layer CHe. The source electrode Se is electrically connected to the second data line DL3.

第三主動元件T3包括半導體層CHf、閘極Gf、源極S與汲極Df。閘極Gf電性連接至第三開關元件SE3的汲極De。閘極Gf重疊於通道層CHf,且閘極Gf與通道層CHf之間夾有絕緣層GI。絕緣層ILD覆蓋閘極Gf。源極Sf與汲極Df位於絕緣層ILD上,且電性連接至通道層CHf。源極Sf電性連接至第一電源線PL1。The third active element T3 includes a semiconductor layer CHf, a gate electrode Gf, a source electrode S and a drain electrode Df. The gate electrode Gf is electrically connected to the drain electrode De of the third switching element SE3. The gate electrode Gf overlaps the channel layer CHf, and an insulating layer GI is sandwiched between the gate electrode Gf and the channel layer CHf. The insulating layer ILD covers the gate electrode Gf. The source electrode Sf and the drain electrode Df are located on the insulating layer ILD and are electrically connected to the channel layer CHf. The source electrode Sf is electrically connected to the first power line PL1.

第三發光二極體L3位於平坦層PL上。在一些實施例中,第三發光二極體L3透過接墊PD5以及接墊PD6而分別電性連接至源極Sf以及第二電源線PL2。在本實施例中,第一主動元件T1相對於第一發光二極體L1的位置、第二主動元件T2相對於第二發光二極體L2的位置以及第三主動元件T3相對於第三發光二極體L3的位置彼此不同,藉此使第一發光二極體L1、第二主動元件T2以及第三主動元件T3能更容易的設置於主動區AR中。The third light emitting diode L3 is located on the flat layer PL. In some embodiments, the third light emitting diode L3 is electrically connected to the source electrode Sf and the second power line PL2 through the pad PD5 and the pad PD6, respectively. In this embodiment, the position of the first active element T1 relative to the first light emitting diode L1, the position of the second active element T2 relative to the second light emitting diode L2, and the position of the third active element T3 relative to the third light emitting diode The positions of the diodes L3 are different from each other, so that the first light emitting diode L1 , the second active element T2 and the third active element T3 can be more easily disposed in the active region AR.

在一些實施例中,接墊PD1~PD6為多層結構,舉例來說,接墊PD1~PD6各自包括第一導墊層CL1、第二導電層CL2以及第三導電層CL3。在一些實施例中,第一導電層CL1為金屬氧化物(例如銦錫氧化物),第二導電層CL2為金屬(例如銦),第三導電層CL3為金屬(例如金),但本發明不以此為限。在本實施例中,第一發光二極體L1、第二發光二極體L2以及第三發光二極體L3為無機發光二極體(例如微型發光二極體(micro-LED)),但本發明不以此為限。在其他實施例中,第一發光二極體L1、第二發光二極體L2以及第三發光二極體L3為有機發光二極體、電致發光元件或其他自發光元件。In some embodiments, the pads PD1 ˜ PD6 are multi-layered structures. For example, the pads PD1 ˜ PD6 each include a first pad layer CL1 , a second conductive layer CL2 and a third conductive layer CL3 . In some embodiments, the first conductive layer CL1 is a metal oxide (eg, indium tin oxide), the second conductive layer CL2 is a metal (eg, indium), and the third conductive layer CL3 is a metal (eg, gold), but the present invention Not limited to this. In this embodiment, the first light-emitting diode L1, the second light-emitting diode L2, and the third light-emitting diode L3 are inorganic light-emitting diodes (eg, micro-LEDs), but The present invention is not limited to this. In other embodiments, the first light emitting diode L1 , the second light emitting diode L2 and the third light emitting diode L3 are organic light emitting diodes, electroluminescent elements or other self-luminous elements.

在本實施例中,為了使傳輸不同訊號的訊號線彼此不會短路,各訊號線選擇性地包括不同層別的導電層,且不同層別的導電層藉由導通孔V而彼此電性連接。In this embodiment, in order to prevent the signal lines transmitting different signals from short-circuiting each other, each signal line selectively includes conductive layers of different layers, and the conductive layers of different layers are electrically connected to each other through the via holes V .

在本實施例中,第一主動元件T1的半導體層CHb、第二主動元件T2的半導體層CHd以及第三主動元件T3的半導體層CHf設置於主動區AR而非主動區AR外圍的周邊區PR,藉此能避免可伸縮式基板20在拉伸後故障並導致畫面Mura的問題。In this embodiment, the semiconductor layer CHb of the first active element T1, the semiconductor layer CHd of the second active element T2 and the semiconductor layer CHf of the third active element T3 are disposed in the active region AR instead of the peripheral region PR around the active region AR , thereby avoiding the problem that the retractable substrate 20 fails after being stretched and causes the screen Mura.

在本實施例中,第一主動元件T1、第二主動元件T2以及第三主動元件T3分別直接電性連接至第一發光二極體L1、第二發光二極體L2以及第三發光二極體L3,因此,第一主動元件T1、第二主動元件T2以及第三主動元件T3的品質對顯示畫面的影響較第一開關元件SE1、第二開關元件SE2以及第三開關元件SE3大。在一些實施例中,基於佈線空間的限制,第一主動元件T1、第二主動元件T2以及第三主動元件T3、第一開關元件SE1、第二開關元件SE2以及第三開關元件SE3沒辦法全部都設置於主動區AR中,優先選擇將第一主動元件T1、第二主動元件T2以及第三主動元件T3設置於主動區AR能較佳的改善可伸縮式基板20在拉伸後出現畫面Mura的問題,但本發明不以此為限。在其他實施例中,若佈線空間足夠,第一主動元件T1、第二主動元件T2以及第三主動元件T3、第一開關元件SE1、第二開關元件SE2以及第三開關元件SE3皆設置於主動區AR。In this embodiment, the first active element T1, the second active element T2 and the third active element T3 are directly electrically connected to the first light emitting diode L1, the second light emitting diode L2 and the third light emitting diode, respectively Therefore, the quality of the first active element T1, the second active element T2 and the third active element T3 has a greater impact on the display screen than the first switching element SE1, the second switching element SE2 and the third switching element SE3. In some embodiments, based on the limitation of wiring space, the first active element T1, the second active element T2 and the third active element T3, the first switching element SE1, the second switching element SE2 and the third switching element SE3 cannot be all All are arranged in the active area AR, and the first active element T1, the second active element T2 and the third active element T3 are preferably arranged in the active area AR, which can better improve the screen Mura of the retractable substrate 20 after stretching. problem, but the present invention is not limited to this. In other embodiments, if the wiring space is sufficient, the first active element T1, the second active element T2 and the third active element T3, the first switching element SE1, the second switching element SE2 and the third switching element SE3 are all arranged in the active District AR.

圖4是依照本發明的一實施例的一種可伸縮式基板的上視示意圖,其中圖4繪示了第一子畫素SP1中之第一主動元件T1的半導體層、第二子畫素SP2中之第二主動元件T2的半導體層以及第三子畫素SP3中之第三主動元件T3的半導體層,並省略繪出了第一子畫素SP1、第二子畫素SP2以及第三子畫素SP3中的其他構件。4 is a schematic top view of a retractable substrate according to an embodiment of the present invention, wherein FIG. 4 illustrates the semiconductor layer of the first active element T1 and the second sub-pixel SP2 in the first sub-pixel SP1 The semiconductor layer of the second active element T2 and the semiconductor layer of the third active element T3 in the third sub-pixel SP3 are omitted, and the first sub-pixel SP1, the second sub-pixel SP2 and the third sub-pixel are omitted. Other components in Pixel SP3.

在此必須說明的是,圖4的實施例沿用圖3A至圖3E的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。It must be noted here that the embodiment of FIG. 4 uses the element numbers and part of the content of the embodiment of FIG. 3A to FIG. 3E , wherein the same or similar numbers are used to represent the same or similar elements, and the same technical content is omitted. illustrate. For the description of the omitted part, reference may be made to the foregoing embodiments, which will not be repeated here.

請參考圖4,在本實施例中,可伸縮式基板30之第二主動元件T2的形狀不同於第一主動元件T1的形狀與第三主動元件T3的形狀。舉例來說,第二主動元件T2的半導體層形狀不同於第一主動元件T1的半導體層的形狀與第三主動元件T3的半導體層的形狀。在本實施例中,第二主動元件T2的半導體層實質上為直條形,第一主動元件T1的半導體層與第三主動元件T3的半導體層實質上為L形。半導體層為L形或彎曲形可以分散所受到的應力,減少半導體層因為應變或應力而導致電性出現不良影響。Referring to FIG. 4 , in this embodiment, the shape of the second active element T2 of the retractable substrate 30 is different from the shape of the first active element T1 and the shape of the third active element T3 . For example, the shape of the semiconductor layer of the second active element T2 is different from the shape of the semiconductor layer of the first active element T1 and the shape of the semiconductor layer of the third active element T3. In this embodiment, the semiconductor layer of the second active element T2 is substantially straight, and the semiconductor layer of the first active element T1 and the semiconductor layer of the third active element T3 are substantially L-shaped. The L-shaped or curved shape of the semiconductor layer can disperse the stress and reduce the bad influence on the electrical properties of the semiconductor layer due to strain or stress.

在一些實施例中,各裝置部200為長度為L且寬度為W的矩形,在各裝置部200的寬度W的方向上,周邊區PR的寬度W1為16%W至40%W,且在各裝置部200的長度L的方向上,周邊區PR的寬度W2為16%L至40%L。In some embodiments, each device portion 200 is a rectangle with a length L and a width W, and in the direction of the width W of each device portion 200 , the width W1 of the peripheral region PR is 16%W to 40%W, and The width W2 of the peripheral region PR in the direction of the length L of each device portion 200 is 16%L to 40%L.

基於上述,第一主動元件T1的半導體層、第二主動元件T2的半導體層以及第三主動元件T3的半導體層設置於主動區AR而非主動區AR外圍的周邊區PR,藉此能避免可伸縮式基板30在拉伸後故障並導致畫面Mura的問題。Based on the above, the semiconductor layer of the first active element T1, the semiconductor layer of the second active element T2, and the semiconductor layer of the third active element T3 are disposed in the active region AR instead of the peripheral region PR around the active region AR, thereby avoiding the possibility of The retractable substrate 30 failed after stretching and caused a problem with the picture Mura.

圖5是依照本發明的一實施例的一種可伸縮式基板的上視示意圖,其中圖5繪示了第一子畫素SP1中之第一主動元件T1的半導體層、第二子畫素SP2中之第二主動元件T2的半導體層以及第三子畫素SP3中之第三主動元件T3的半導體層,並省略繪出了第一子畫素SP1、第二子畫素SP2以及第三子畫素SP3中的其他構件。5 is a schematic top view of a retractable substrate according to an embodiment of the present invention, wherein FIG. 5 illustrates the semiconductor layer of the first active element T1 and the second sub-pixel SP2 in the first sub-pixel SP1 The semiconductor layer of the second active element T2 and the semiconductor layer of the third active element T3 in the third sub-pixel SP3 are omitted, and the first sub-pixel SP1, the second sub-pixel SP2 and the third sub-pixel are omitted. Other components in Pixel SP3.

在此必須說明的是,圖5的實施例沿用圖3A至圖3E的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,在此不贅述。It must be noted here that the embodiment in FIG. 5 uses the element numbers and part of the content of the embodiment in FIGS. 3A to 3E , wherein the same or similar numbers are used to represent the same or similar elements, and the same technical content is omitted. illustrate. For the description of the omitted part, reference may be made to the foregoing embodiments, which will not be repeated here.

請參考圖5,在本實施例中,可伸縮式基板40之第二主動元件T2的形狀不同於第一主動元件T1的形狀與第三主動元件T3的形狀。舉例來說,第二主動元件T2的半導體層形狀不同於第一主動元件T1的半導體層的形狀與第三主動元件T3的半導體層的形狀。在本實施例中,第一主動元件T1的半導體層與第三主動元件T3的半導體層實質上為直條形,第二主動元件T2的半導體層實質上為S形。Referring to FIG. 5 , in this embodiment, the shape of the second active element T2 of the retractable substrate 40 is different from the shape of the first active element T1 and the shape of the third active element T3 . For example, the shape of the semiconductor layer of the second active element T2 is different from the shape of the semiconductor layer of the first active element T1 and the shape of the semiconductor layer of the third active element T3. In this embodiment, the semiconductor layer of the first active element T1 and the semiconductor layer of the third active element T3 are substantially straight-striped, and the semiconductor layer of the second active element T2 is substantially S-shaped.

半導體層為S形或彎曲形可以分散所受到的應力,減少半導體層因為應變或應力而導致電性出現不良影響。The S-shaped or curved shape of the semiconductor layer can disperse the stress and reduce the bad influence on the electrical properties of the semiconductor layer due to strain or stress.

在相同電壓差的情況下,長度較長的半導體層的電流較小。在本實施例中,第二主動元件T2的半導體層的長度較長,且可對應於藍色子畫素設置。第一主動元件T1的半導體層與第三主動元件T3的半導體層的長度較短,且可分別對應於紅色子畫素與綠色子畫素設置。In the case of the same voltage difference, the current of the semiconductor layer with a longer length is smaller. In this embodiment, the length of the semiconductor layer of the second active element T2 is relatively long, and can be arranged corresponding to the blue sub-pixels. The length of the semiconductor layer of the first active element T1 and the semiconductor layer of the third active element T3 is relatively short, and can be arranged corresponding to the red sub-pixel and the green sub-pixel respectively.

在一些實施例中,各裝置部200為長度為L且寬度為W的矩形,在各裝置部200的寬度W的方向上,周邊區PR的寬度W1為16%W至40%W,且在各裝置部200的長度L的方向上,周邊區PR的寬度W2為16%L至40%L。In some embodiments, each device portion 200 is a rectangle with a length L and a width W, and in the direction of the width W of each device portion 200 , the width W1 of the peripheral region PR is 16%W to 40%W, and The width W2 of the peripheral region PR in the direction of the length L of each device portion 200 is 16%L to 40%L.

基於上述,第一主動元件T1的半導體層、第二主動元件T2的半導體層以及第三主動元件T3的半導體層設置於主動區AR而非主動區AR外圍的周邊區PR,藉此能避免可伸縮式基板40在拉伸後故障並導致畫面Mura的問題。Based on the above, the semiconductor layer of the first active element T1, the semiconductor layer of the second active element T2, and the semiconductor layer of the third active element T3 are disposed in the active region AR instead of the peripheral region PR around the active region AR, thereby avoiding the possibility of The retractable base plate 40 fails after stretching and causes problems with the picture Mura.

10、20、30、40:可伸縮式基板 100:圖案化基板 200:裝置部 300:線路部 310:訊號線 400:連接部 410:加強結構 AR:主動區 BL:緩衝層 CHa、CHb、CHc、CHd、CHe、CHf:半導體層 CL1:第一導電層 CL2:第二導電層 CL3:第三導電層 Da、Db、Dc、Dd、De、Df:汲極 DL1:第一資料線 DL2:第二資料線 DL3:第三資料線 Ga、Gb、Gc、Gd、Ge、Gf:閘極 GI、ILD:絕緣層 L:長度 L1:第一發光二極體 L2:第二發光二極體 L3:第三發光二極體 PD1、PD2、PD3、PD4、PD5、PD6:接墊 PL:平坦層 PL1:第一電源線 PL2:第二電源線 PR:周邊區 Sa、Sb、Sc、Sd、Se、Sf:源極 SE1:第一開關元件 SE2:第二開關元件 SE3:第三開關元件 SP1:第一子畫素 SP2:第二子畫素 SP3:第三子畫素 SGL:訊號線 SL:掃描線 TH:貫孔 T1:第一主動元件 T2:第二主動元件 T3:第三主動元件 V:導通孔 W、W1、W2:寬度 10, 20, 30, 40: retractable base plate 100: Patterned substrate 200: Device Department 300: Line Department 310: Signal line 400: Connection part 410: Strengthen the structure AR: Active area BL: buffer layer CHa, CHb, CHc, CHd, CHe, CHf: semiconductor layer CL1: first conductive layer CL2: second conductive layer CL3: the third conductive layer Da, Db, Dc, Dd, De, Df: drain DL1: The first data line DL2: Second data line DL3: The third data line Ga, Gb, Gc, Gd, Ge, Gf: Gate GI, ILD: insulating layer L: length L1: The first light-emitting diode L2: The second light-emitting diode L3: the third light-emitting diode PD1, PD2, PD3, PD4, PD5, PD6: pads PL: flat layer PL1: first power line PL2: Second power cord PR: Surrounding area Sa, Sb, Sc, Sd, Se, Sf: source SE1: first switching element SE2: Second switching element SE3: The third switching element SP1: First Subpixel SP2: Second Subpixel SP3: Third Subpixel SGL: signal line SL: scan line TH: through hole T1: The first active element T2: The second active element T3: The third active element V: via hole W, W1, W2: width

圖1A是依照本發明的一實施例的一種可伸縮式基板的上視示意圖。 圖1B是圖1A的可伸縮式基板在拉伸後的上視示意圖。 圖2是圖1B的可伸縮式基板的應變量模擬示意圖。 圖3A是依照本發明的一實施例的一種可伸縮式基板的上視示意圖。 圖3B是圖3A的可伸縮式基板省略部分構件後的上視示意圖。 圖3C是圖3A的可伸縮式基板省略部分構件後的上視示意圖。 圖3D是圖3A的可伸縮式基板的剖面示意圖。 圖3E是依照本發明的一實施例的一種子畫素的等效電路圖。 圖4是依照本發明的一實施例的一種可伸縮式基板的上視示意圖。 圖5是依照本發明的一實施例的一種可伸縮式基板的上視示意圖。 FIG. 1A is a schematic top view of a retractable substrate according to an embodiment of the present invention. FIG. 1B is a schematic top view of the retractable substrate of FIG. 1A after being stretched. FIG. 2 is a schematic diagram of strain amount simulation of the retractable substrate of FIG. 1B . 3A is a schematic top view of a retractable substrate according to an embodiment of the present invention. FIG. 3B is a schematic top view of the retractable base plate of FIG. 3A with some components omitted. FIG. 3C is a schematic top view of the retractable base plate of FIG. 3A with some components omitted. FIG. 3D is a schematic cross-sectional view of the retractable substrate of FIG. 3A . 3E is an equivalent circuit diagram of a sub-pixel according to an embodiment of the present invention. FIG. 4 is a schematic top view of a retractable base plate according to an embodiment of the present invention. FIG. 5 is a schematic top view of a retractable base plate according to an embodiment of the present invention.

10:可伸縮式基板 10: Retractable base plate

100:圖案化基板 100: Patterned substrate

200:裝置部 200: Device Department

300:線路部 300: Line Department

310:訊號線 310: Signal line

400:連接部 400: Connection part

410:加強結構 410: Strengthen the structure

AR:主動區 AR: Active area

L:長度 L: length

PR:周邊區 PR: Surrounding area

SP1:第一子畫素 SP1: First Subpixel

SP2:第二子畫素 SP2: Second Subpixel

SP3:第三子畫素 SP3: Third Subpixel

TH:貫孔 TH: through hole

T1:第一主動元件 T1: The first active element

T2:第二主動元件 T2: The second active element

T3:第三主動元件 T3: The third active element

W、W1、W2:寬度 W, W1, W2: width

Claims (10)

一種可伸縮式基板,包括: 一圖案化基板; 多個裝置部,位於該圖案化基板上,其中各該裝置部包括一主動區以及環繞該主動區的一周邊區,且各該裝置部包括設置於該主動區中的一第一主動元件以及一第二主動元件;以及 多個線路部,位於該圖案化基板上,且連接對應的該些裝置部。 A retractable base plate, comprising: a patterned substrate; A plurality of device parts are located on the patterned substrate, wherein each of the device parts includes an active area and a peripheral area surrounding the active area, and each of the device parts includes a first active element disposed in the active area and a a second active element; and A plurality of circuit parts are located on the patterned substrate and are connected to the corresponding device parts. 如請求項1所述的可伸縮式基板,其中該周邊區的寬度約為10微米至250微米。The retractable substrate of claim 1, wherein the peripheral region has a width of about 10 microns to 250 microns. 如請求項1所述的可伸縮式基板,其中各該裝置部包括: 一第一子畫素,包括該第一主動元件以及直接電性連接至該第一主動元件的一第一發光二極體; 一第二子畫素,包括一第二主動元件以及直接電性連接至該第二主動元件的一第二發光二極體;以及 一第三子畫素,包括一第三主動元件以及直接電性連接至該第三主動元件的一第三發光二極體,其中該第二子畫素位於該第一子畫素與該第三子畫素之間;且 各該線路部包括至少一訊號線,電性連接至對應的該第一子畫素、對應的該第二子畫素及/或對應的該第三子畫素。 The retractable base plate of claim 1, wherein each of the device sections comprises: a first sub-pixel including the first active element and a first light emitting diode directly electrically connected to the first active element; a second sub-pixel including a second active element and a second light emitting diode directly electrically connected to the second active element; and A third sub-pixel includes a third active element and a third light emitting diode directly electrically connected to the third active element, wherein the second sub-pixel is located between the first sub-pixel and the first sub-pixel between three sub-pixels; and Each of the circuit portions includes at least one signal line electrically connected to the corresponding first sub-pixel, the corresponding second sub-pixel and/or the corresponding third sub-pixel. 如請求項3所述的可伸縮式基板,其中該第二主動元件的半導體層的形狀不同於該第一主動元件的半導體層的形狀與該第三主動元件的半導體層的形狀。The retractable substrate of claim 3, wherein the shape of the semiconductor layer of the second active element is different from the shape of the semiconductor layer of the first active element and the shape of the semiconductor layer of the third active element. 如請求項3所述的可伸縮式基板,其中該第一主動元件相對於該第一發光二極體的位置、該第二主動元件相對於該第二發光二極體的位置以及該第三主動元件相對於該第三發光二極體的位置彼此不同。The retractable substrate of claim 3, wherein the position of the first active element relative to the first light emitting diode, the position of the second active element relative to the second light emitting diode, and the third The positions of the active elements relative to the third light emitting diode are different from each other. 如請求項1所述的可伸縮式基板,其中各該裝置部為長度為L且寬度為W的矩形,其中: 在各該裝置部的寬度的方向上,該周邊區的寬度為16%W至40%W,且 在各該裝置部的長度的方向上,該周邊區的寬度為16%L至40%L。 The retractable base plate of claim 1, wherein each of the device portions is a rectangle of length L and width W, wherein: In the direction of the width of each of the device portions, the width of the peripheral region is 16%W to 40%W, and The width of the peripheral region is 16%L to 40%L in the direction of the length of each of the device portions. 如請求項1所述的可伸縮式基板,其中該圖案化基板具有多個貫孔。The retractable substrate of claim 1, wherein the patterned substrate has a plurality of through holes. 如請求項6所述的可伸縮式基板,其中該些貫孔中之一個至少被四個裝置部實質上環繞。The retractable substrate of claim 6, wherein one of the through holes is substantially surrounded by at least four device parts. 如請求項6所述的可伸縮式基板,更包括: 多個連接部,設置於該圖案化基板上且鄰近於對應的線路部,各該連接部包括依序排列的多個加強結構。 The retractable base plate according to claim 6, further comprising: A plurality of connecting portions are disposed on the patterned substrate and adjacent to the corresponding circuit portions, and each of the connecting portions includes a plurality of reinforcing structures arranged in sequence. 如請求項6所述的可伸縮式基板,其中各該貫孔為啞鈴狀。The retractable base plate according to claim 6, wherein each of the through holes is in the shape of a dumbbell.
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