TW202213616A - Transport ring for a CVD reactor - Google Patents

Abstract

The invention relates to a transport ring for transporting a substrate (21), having an annular body (1) extending around an axis (A), with an annular lower part (2), the lower part (2) having an outer portion (6) and, radially inside the outer portion (6), a support surface (5) for supporting an edge of the substrate (21), the outer portion (6) carrying, with spacers (7, 7'), an annular upper part (3) which is distanced from a radially outer region of the outer portion (6) in a direction parallel to the axis (A) by a distance (D). According to the invention, the spacers (7, 7') are formed by individual ribs distanced from one another about the axis (A) in the circumferential direction, between which there is formed a gap which is open on both sides. The individual ribs are produced, for example, by wire erosion.

Description

Transport rings for CVD reactors

The present invention relates to a transport ring for transporting substrates and/or for placing substrates on substrate holders in a process chamber of a CVD reactor housing, the transport ring having an annular body extending around an axis, the body has an annular lower portion, wherein the lower portion has an outer section and radially inwardly of the outer section has a resting surface for placing the edge of the substrate, wherein the outer section supports the annular upper portion by means of spacers , and the upper portion is spaced a certain distance from the radially outer region of the outer section in a direction parallel to the axis.

The invention further relates to a device for supporting substrates having such a transport ring.

The invention further relates to a CVD reactor having a device for supporting a substrate, the device having a transport ring.

The present invention further relates to a method of manufacturing a transport ring.

The CVD reactor has a shell that is airtight to the outside, and a substrate seat is arranged in the shell. The substrate seat supports one or several substrate racks, and one substrate can be arranged on each of the substrate racks. The substrate holder can be heated to the process temperature by the heating device provided in the casing. A process gas consisting of several components can be fed into a process chamber extending between the substrate holder and the top of the process chamber. These components may be a carrier gas, organometallic compounds of elements of the third main group, and hydrides of elements of the fifth main group. Through pyrolysis and chemical reactions, layers are deposited on the surface of the substrate. In order to transport the substrate, a transport ring is provided, which holds the edge of the substrate from below. Such a transport ring is described in DE 10 2017 129 699 A1.

For a detailed description of the CVD reactor see also DE 103 23 085 A1, US 2018/138074 A1 and DE 10 2017 101 648 A1.

The CVD reactor components arranged inside the CVD reactor and in particular in the immediate vicinity of the substrate or substrate holder must be designed such that the temperature profile formed on the side of the substrate facing the process chamber is as smooth as possible. This technique focuses on a temperature profile that is as flat as possible so that local deviations in the surface temperature of the substrate surface are as small as possible.

US 2018/0030617 A1 discloses a transport ring having a lower portion that can carry a substrate and has spacers on which an annular upper portion can be placed, thereby forming a gas-permeable gap between the lower portion and the upper portion.

The object of the present invention is to improve the transport ring of the same type to facilitate its use, and in particular to provide a method of manufacturing such a transport ring in a simplified manner. By means of such a transfer ring, during the processing of the substrate, a temperature distribution as flat as possible can be achieved on the surface of the substrate facing the process chamber. In addition, there is also a well-defined temperature jump from the substrate holder to the substrate.

This object is achieved by the invention given in the scope of the patent application, wherein the subsidiary item is not only an advantageous improvement of the solution provided in the concurrent claim, but also an independent solution to achieve the object.

Unlike the transport ring described in DE 10 2017 129 699 A1, the spacers of the present invention are circumferentially spaced apart from each other. The spacers of the present invention may be single strips that are spatially separated from each other. The lower part is separated from the upper part by a spacer. The arrangement can be as follows: the spacers are evenly distributed circumferentially around the axis, in particular the axis of symmetry of the device. The spacers are preferably single strips with azimuthal gaps extending between the single strips. In these azimuthal gaps, the upper part freely spans the lower part. There is a gap between the upper part and the lower part which, viewed axially, is open in both the radially inward and radially outward directions. Thermal radiation can pass through this gap. However, gas can also pass through the gap. Thus, the gap allows heat to flow through, or to transport heat. Indeed, the gap is such that the heat flow from the bottom surface of the transport ring to the top surface of the transport ring is less than that of a transport ring without a gap. The gap substantially interrupts heat conduction in the vertical direction. The gap height can be decisive for the target temperature to be reached. It can be provided that the gap has two limiting surfaces extending parallel to each other. The first limiting surface is formed by the bottom surface forming the upper portion of the outer ring. The second limiting surface may be formed by the lower outer section. Both limit surfaces can be flat. The circumferential angle of the gap between two adjacent single connecting bars may be larger than the circumferential angle of the single connecting bars. The circumferential angle of the gap can be greater than 60°. The circumferential angle of the single connecting strip can be less than 10°, 15°, 20° or 30°. Three, four, five or six single strips can be provided evenly distributed around the circumference of the axis. According to the second aspect of the present invention (which may include the features of the first aspect), the configuration is as follows: the lower part and the upper part are connected to each other homogeneously by a plurality of stub bars separated from each other, and the plane outline of the stub bars is relatively The best line is triangular. Wherein, the long triangular side may coincide with the centering surface formed by the radially inner edge surface of the upper part. The two shorter triangular sides of the triangular planar profile of the single connection can be of the same length. The triangle sides (especially the shorter triangle sides) can intersect at an intersection point. The point of intersection may be spaced from the lower or upper outer peripheral surface. The intersection can also be spaced from the inner peripheral surface of the upper portion. In particular, the setting is as follows: the two triangular sides of a single link are respectively aligned with one of the triangle sides of an adjacent single link. According to a third aspect of the invention (which may include features of other aspects of the invention), it is arranged that several annular segments (in particular annular objects) spaced apart from each other overlap each other. In particular, it is provided that an intermediate ring is provided between the uppermost outer ring and the base body. The outer ring and the middle ring can be connected to each other by spacers, wherein the spacers are formed by the single strips as described above. The intermediate ring and the base body can also be connected to each other by a stub, wherein the stub connecting the base and the intermediate ring is arranged to be staggered by a certain angle from the singly connecting the intermediate ring and the uppermost outer ring. . Several intermediate rings may be provided, wherein a gap is respectively formed between the rings stacked on top of each other, the gap preferably having gap walls extending parallel to each other. One or several ring systems which lie one above the other and which extend in particular above the base body can overlap one another in a superimposed manner. According to another aspect of the invention, which may include the features of the preceding aspects of the invention, several annular objects may be made of the same material or of different materials. Two objects made of the same material are preferably connected to each other homogeneously, so that the gap between the objects is created by a material removal method. Two objects made of different materials can be two separate pieces. Preferably, the material can be considered as graphite, SiC, ceramic material, quartz or metal material. The outer ring in particular performs a thermal shielding function and is thermally decoupled from the base body for this by means of the aforementioned components. It can be provided that the transport ring consists of at least two individual parts, wherein the lower part forms the lower part and the upper part forms the upper part. The aforementioned slit is located between the lower portion and the upper portion and extends between the spacers in the azimuthal direction. The spacers may be formed from single strips which are homogeneously corresponding to the lower part and/or homogeneously corresponding to the upper part. Each stub of one of the pieces may correspond to a recess of the other piece. In this case, the free ends of the single connecting strips can each engage in a recess. The single strips and the recesses can be produced by machining methods. From a manufacturing-technical point of view, it is particularly advantageous if the single connecting strip is formed homogeneously with the upper part. The spacer may be formed from either the upper portion or the lower portion.

The device according to the invention for supporting substrates during processing in a CVD reactor has, in addition to the above-mentioned transport ring, a substrate holder. The substrate holder forms a support shoulder surrounding a central base that supports the substrate. The transport ring can be placed on the base. During processing, the substrate may not be placed on the placement surface of the transport ring. The edge region of the substrate extends above the placement surface. However, it is also possible to provide that the substrate is placed with its edge on the placement surface during processing. In this way, the substrate can be placed either on the placing surface of the transport ring or on the bearing protrusion of the substrate holder. The transport ring has a radial protrusion, and the fingers of the gripper can extend under the protrusion to lift the transport ring, wherein the placing surface of the transport ring is a radially outer distance from below to hold the substrate.

The CVD reactor of the present invention is characterized by several of the above-described devices, which may be arranged in a ring around a gas inlet member located in the center of the process chamber. The gas outlet member may then extend around the disc-shaped substrate holder carrying the substrate holder.

The present invention further relates to a manufacturing method, especially the manufacturing method of the aforementioned transport ring. In this case, firstly, a one-piece, in particular rotationally symmetrical, annular base body is produced, which has a section from which the lower part can be produced and which has a section which can be used for the production of the upper part. After forming the blank, in particular by material removal, the gap provided between the lower part and the upper part is produced. This can be done with tools that work in a straight line. The gap can be cut with a saw, made with a laser beam, or spark eroded with taut wire. In this process a polygonal cut is created, so that the single connection has the aforementioned triangular planar profile.

Embodiments of the present invention are described below with reference to the accompanying drawings. Fig. 1 shows roughly and schematically a CVD reactor with a housing 29 in which a substrate holder 23, which can be heated by a heating device 24, is arranged, and which delimits a process chamber 28 downwards, The process chamber top 27 defines the process chamber upwards. The center of the process chamber 28 is provided with a gas inlet member 25 through which process gas can be fed into the process chamber 28 . By heating the process chamber 28, and in particular by heating the substrate racks 17 carried by the substrate holder 23, the substrates 21 carried by the substrate racks 17 can be heated to the process temperature so that the process gases are pyrolyzed and chemically reacted with each other. reaction to deposit a layer on the broad side surface of the substrate 21 facing the process chamber 28 . The carrier gas and gaseous reaction products used to feed the process gases into the process chamber 28 can be removed through the gas outlet member 26 surrounding the substrate holder 23 .

4 to 10 illustrate the substrate holding device in different embodiments having a substrate holder 17 having a substantially flat bottom surface 18 which is buoyantly supported in a groove provided in the substrate holder 23 . bottom. For this purpose, flushing gas is injected into its grooves to form an air cushion. The substrate holder is surrounded by cover plates 22 whose top surfaces facing the process chamber 28 are aligned with the annular top surface of the substrate holder.

The substrate rack 17 has a step 32 surrounding the central area of the substrate rack 17, against which the bottom surface 8 of the transport ring 1 rests. The central area of the substrate holder 17 passes through the annular cavity of the transport ring 1, and the annular cavity is surrounded by the inner wall 12 of the transport ring. For example, a slightly curved top surface 19 extends on the side of the substrate frame 17 upward toward the process chamber, and on the top surface can be formed a plurality of bearing protrusions 30 on which the bottom surface of the substrate 21 can be placed. The radially outer edge region of the substrate 21 may protrude radially outward from the central region of the substrate holder 17 .

The transport ring 1 consists of at least an upper part 3 and a lower part 2 . The lower part 2 forms the base body, which forms the bottom surface 8 resting on the support shoulder 32 and the rest surface 5 extending below the radial outer edge of the base plate 21 . The placement surface 5 may be spaced apart from the bottom surface of the substrate 21 during processing of the substrate in the process chamber 28 .

The radially outer region formed by the outer section 6 of the lower part 2 of the transport ring 1 protrudes radially outwards from the substrate holder 17 . This radially outer area forms a contact surface 6 ′, below which the gripping fingers of the gripper, not shown in the figures, can extend to lift the transport ring 1 . When the transport ring 1 moves upward, the circular placement surface 5 contacts the bottom surface of the substrate 21 to lift the substrate 21 , provided that the edge of the substrate 21 is not already placed on the placement surface 5 .

The upper part 3 of the transport ring 1 is formed as the outer ring 3 . The outer ring 3 is connected to the lower part 2 only at fixed points, ie via a single connection 7 . As shown in FIG. 5 , it is sufficient that the three spacers 7 are distributed uniformly circumferentially around the axis of symmetry A in the form of single strips, respectively.

FIG. 6 shows a variant in which there are a total of five single connecting strips 7 distributed uniformly around the axis A in the circumferential direction. The single connecting strip 7 has a triangular planar profile, wherein the long triangular side 15 can coincide with the radial inner side 9 of the outer ring 3 . The inner side surface 9 of the outer ring 3 is formed as a centering surface, and the outer edge of the base plate 21 can be supported on the centering surface.

The triangular plane outlines of the single connecting strips 7 respectively have two short triangular sides 16 of equal length. The arrangement is as follows: the short triangular sides 16 are respectively aligned with the short triangular sides 16 of the adjacent single connecting strips 7 . This section is shown with auxiliary lines in Figures 5 and 6. In order to achieve this in terms of manufacturing technology, the gap 31 between two adjacent single bars 7 can be created by sawing, spark erosion with a taut wire, or by means of a laser beam. However, these gaps can also be created by grinding or other machining methods. The spacers 7 can be arranged radially on the inside of the transport ring, ie in the area of the centering surfaces 9 . The spacers 7 can also be arranged radially outside the transport ring. That is, the spacer 7 can be either a section of the radially inner peripheral wall of the annular structure surrounding the placement surface 5 or a section of the radially outer peripheral wall of the annular structure.

The azimuth angle of the gap 31 around the axis can be at least twice, three times, four times or five times the azimuth angle covered by the extension of the single connection bar 7, wherein the single connection bar 7 preferably adopts the same design, and has the same design. A uniform angular distribution is arranged around axis A. By the aforementioned manufacturing method, a gap 4 between the upper part 3 and the lower part 2 can be produced, the gap having two parallel limiting surfaces 4 ′, wherein the upper limiting surface 4 ′ is formed by the upper part 3 and the lower limiting surface 4 ″. It is formed by the lower part 2 .

The peripheral surface 10' of the upper part 3 and the peripheral surface 10 of the lower part 2 preferably extend on the same outer surface of the cylinder.

The distance D between the two limiting surfaces 4', 4'' may be in the range between 0.01 mm and 2 mm, between 0.05 mm and 2 mm, or between 0.5 mm and 2 mm. This distance may be approximately 1 mm. The long triangle sides 15 may be in the range between 20 mm and 30 mm. The height of the triangle of the cross-section of the single connecting strip 7 may be 7 mm.

In the embodiment shown in FIGS. 4 and 5 , a single outer ring 3 extends above the lower portion 2 . The outer ring is spaced a distance D from the lower part 2 along the entire perimeter area, except for the stub 7 .

FIG. 8 shows a variant of the transport ring 1 in which an intermediate ring 11 is provided between the uppermost outer ring 3 and the lower part 2 , which is arranged in a superimposed manner below the outer ring 3 . Between the top surface of the transport ring 1 (formed by the visible surface of the outer ring 3, which is aligned with the top surface of the cover plate 22 shown in FIG. 2) and the lower part 2 (ie, the base), there is now a There are two slits 4, which are axially spaced, viewed from the axis A.

The single-strands 7 extend between the lower part 2 and the intermediate ring 11 and are evenly distributed in the circumferential direction. The single webs 7' extend between the intermediate ring 11 and the upper part 3 and are likewise evenly distributed in the circumferential direction. However, they are offset by an angle with respect to the stub bars 7 and are arranged in particular on the gaps. Therefore, a single connection bar 7 ′ is located approximately in the center between the two single connection bars 7 .

The main difference between the embodiment shown in FIG. 9 and the previous embodiments is that the outer ring 3 has radial protrusions 14 , and the protrusions protrude radially from the peripheral surface 10 of the base body 2 . In this embodiment, the outer ring 3 of the gripper can be the focus point. The spacers, which are also here formed by the single strips 7, can have the above-mentioned triangular cross-sectional shape. However, the single connection 7 may also be in the shape of a spoke.

In the embodiment shown in Figure 10, the two parts of the transport ring 1 (ie the lower part 2 and the upper part 3) are formed by objects that can be separated from each other. The outer section 6 of the lower part 2 forms an upwardly facing flat surface which in turn forms the gap limiting surface 4'. A plurality of single connecting strips 7 protrude from the limiting surface 4 ′ in the direction of the axis A in the form of protrusions. The annular upper part 3 can be plugged onto these projections. For this purpose, the annular upper part 3 can have a plurality of recesses 13 into which the upwardly directed free ends of the projections can engage in order to achieve a fixed position.

In the embodiment shown in FIG. 11 , the lower part 2 and the upper part 3 of the transport ring 1 are objects that can be separated from each other. Contrary to the above-described embodiment, the one or more stub bars 7 now do not protrude from the lower part 2 , but from the upper part 3 . The single connection strip 7 is formed in the same material as the upper part 3 . The lower part 2 has, at corresponding locations, recesses 13 into which the free ends of the stub bars 7 can engage in order to fix the upper part 3 in its position opposite the lower part 2 . The embodiment shown in the figures illustrates a layout in which the substrate 21 is rested on the carrier protrusions 30 . Therefore, a cavity 20 is formed between the bottom surface of the substrate 21 and the top surface 19 of the substrate holder 17 . The distance between the radially outer edge of the base plate 21 and the placement surface 5 is small, so that the edge of the base plate 21 only comes into contact with the placement surface 5 when the transport ring 1 is lifted. In other embodiments it can be provided that the edge of the substrate 21 is permanently placed on the placement surface 5 . In this case, a cavity can also be formed between the top surface 19 and the bottom surface of the substrate 21 .

The bearing protrusion 30 can also be a movable element that can be used to lift the substrate 21 .

The foregoing embodiments are used to illustrate the inventions contained in the present application as a whole, and these inventions independently constitute improvements over the prior art through at least the following feature combinations, wherein two, several or all of these feature combinations Combinations can also be combined with each other, namely:

A device characterized in that the spacers 7, 7' are formed by single strips 7, 7' spaced from each other in the circumferential direction about the axis A.

A device, characterized in that the single strips 7, 7' are evenly distributed circumferentially around the axis A and are separated from each other by an azimuthal gap 31 in which the upper part 3 is formed to be open on both sides in the radial direction In the case of the slit 4, it extends suspended above the lower part 2, and/or the slit 4 extending between the upper part 3 and the lower part 2 has limit surfaces 4' and 4"' extending parallel to each other, and/or two The circumferential angle of the azimuthal gap 31 between the individual bars 7, 7' is at least three times larger, or at least four or five times larger than the circumferential angle occupied by the individual bars 7, 7'.

A device, characterized in that: the single connecting bars 7, 7' connect the lower part 2 and the upper part 3 homogeneously, and/or the plane contour of the single connecting bars 7, 7' is a triangle, and/or the plane contour is a triangle The single strips 7, 7' have one long triangular side 15 and two short triangular sides 16, which coincide with the centering surface 9 formed by the upper part 3, and/or the single strips The two short triangular sides 16 of 7, 7' meet at a point which is spaced radially inwardly from the peripheral surface 10, 10' of the lower part 2 or the upper part 3, and/or the single triangular The strips 7, 7' have two triangular sides 16, which are respectively aligned with one of the triangular sides 16 of the immediately adjacent single strips 7, 7'.

A device characterized in that one or several annular objects 3, 11 spaced from each other in the direction of the axis A are superimposed on each other, and/or several annular objects 3, 11 are superimposed on top of each other and by The spacers 7, 7' are spaced apart from each other and/or the spacers 7 are homogeneously formed from the upper part 3 or the lower part 2, and/or the spacers 7 homogeneously formed from the upper part 3 or the lower part 2 are respectively It engages in the recess 13 of the lower part 2 or the upper part 3, and/or an annular intermediate ring 11 is provided between the annular upper part 3 and the annular lower part 2, which is connected through a plurality of first single connecting strips 7' to The upper part 3 is connected, and the lower part 2 is connected through a plurality of second single connection bars 7, wherein the first single connection bars 7' and the second single connection bars 7 are staggered from each other by a certain angle.

A device characterized in that the lower part 2 and one or more annular upper parts 3 are made of the same material or different materials, wherein the materials are graphite, SiC, ceramic material, quartz or metal material.

A device characterized in that the transport ring 1 is designed according to any one of the aforementioned five devices.

A CVD reactor comprising: a casing 29 that is airtight to the outside, a process chamber 28 arranged between the top 27 of the process chamber and the substrate base 23 in the casing 29, and a gas inlet for feeding the process gas into the process chamber 28 A member 25, a gas outlet member 26 for discharging gaseous reaction products, a heating device 24 for heating the substrate holder 23, and at least one device for supporting the substrate 21 like the sixth device described above.

A method of manufacturing a device, characterized in that: first, an integrated base body 2 is produced together with an upper part 3, and the upper part is formed homogeneously with the base body 2; A gap 4 is made between the formed lower part 2 such that the gap 4 is open in both the radially inward and radially outward directions between the remaining single bars 7, 7'.

A method, characterized in that the gap 4 is created by spark erosion with a taut wire or by a laser beam.

All disclosed features (either as a single feature or as a combination of features) are essential to the invention. Therefore, the disclosure content of this application also includes all the content disclosed in the related/attached priority files (copy of the previous application), and the features described in these files are also included in the scope of the patent application of this application. The subordinate items describe the features of the improvement scheme of the present invention with respect to the prior art with its features, and its purpose is mainly to file a divisional application on the basis of these claims. The invention given in each claim may further have one or more of the features given in the preceding description, in particular indicated by symbols and/or given in the description of symbols. The invention also relates to designs in which individual features mentioned in the preceding description are not implemented, in particular features which are not necessary for a specific application or which can be replaced by other technically equivalent components.

1: transport ring; (ring) body 2: lower part; base 3: upper part; outer ring; annular object 4: Gap 4': (upper) limit surface; (gap) limit surface 4'': (bottom) limit surface 5: Place the surface 6: (lower) outer section 6': focus face 7: spacer; (second) single connection 7': spacer; (first) single connection 8: (transport ring) bottom surface 9: (radial) inner surface; centering surface 10: (lower/substrate) peripheral surface 10': (upper) peripheral surface 10'': (intermediate ring) peripheral surface 11: Intermediate ring; annular object 12: (transport ring) inner wall 13: Recess 14: Protrusions 15: (long) triangle sides 16: (Short) Triangle Side 17: Substrate rack 18: (substrate frame) bottom surface 19: (substrate frame) top surface 20: cavity 21: Substrate 22: Cover 23: Substrate base 24: Heating device 25: Gas inlet member 26: Gas outlet components 27: The top of the process room 28: Process room 29: Shell 30: Bearing protrusion 31: (azimuth) clearance 32: support shoulder; (substrate frame) step A: (symmetric) axis A': (symmetric) axis D: (limit between faces) distance

FIG. 1 is a schematic cross-sectional view of a CVD reactor. 2 is a top view of the substrate holder 23 for carrying a plurality of substrates 21 according to the cutting line II-II in FIG. 1 , wherein each of the substrates 21 is carried by the substrate holding device. FIG. 3 is an enlarged view of part III in FIG. 2 . FIG. 4 is a cross-sectional view of the substrate supporting device according to the first embodiment, taken along the line IV-IV in FIG. 3 . FIG. 5 is a top view of the substrate holding device for illustrating the position and the plane outline of the spacer 7 , wherein the auxiliary lines are used to illustrate the direction of the triangular sides 16 . FIG. 6 is a view of another embodiment such as FIG. 5 , wherein the auxiliary lines here also represent the directions of the sides of the triangle. FIG. 7 is an enlarged view of part VII in FIG. 6 . FIG. 8 is the view of FIG. 4 of another embodiment of the substrate holding device. FIG. 9 is the view of FIG. 4 of another embodiment. FIG. 10 is a perspective perspective view of another embodiment. FIG. 11 is a perspective perspective view of FIG. 10 of another embodiment.

1: transport ring; (ring) body

2: lower part; base

3: upper part; outer ring; annular object

4: Gap

4': (upper) limit surface; (gap) limit surface

4": (bottom) limit surface

5: Place the surface

6: (lower) outer section

6': focus face

7: spacer; (second) single connection

8: (transport ring) bottom surface

9: (radial) inner surface; centering surface

10: (lower/substrate) peripheral surface

10': (upper) peripheral surface

12: (transport ring) inner wall

17: Substrate rack

18: (substrate frame) bottom surface

19: (substrate frame) top surface

20: cavity

21: Substrate

30: Bearing protrusion

32: support shoulder; (substrate frame) step

A: (symmetric) axis

D: (limit between faces) distance

Claims (18)

A device for transporting substrates and/or for placing substrates on substrate holders in process chambers of the housing of a CVD reactor, having an annular body (1) extending around an axis (A), the body having an annular shaped lower part (2), wherein the lower part (2) has an outer section (6) and radially inward of the outer section (6) has a placement surface for placing the edge of the base plate (21) (5), wherein the outer section (6) carries an annular upper part (3) which is connected in a direction parallel to the axis (A) by spacers (7, 7') to The radially outer regions of the outer section (6) are separated by a distance (D) characterized by: The spacers (7, 7') connect the lower part (2) and the upper part (3) homogeneously. The device of claim 1, wherein the plane outlines of the spacers (7, 7') are triangular. The device of claim 1, wherein the spacers (7, 7') with a triangular plan profile have one long triangular side (15) and two short triangular sides (16), and the long triangular side is connected to the The centering planes (9) formed by the upper part (3) overlap. 3. The device of claim 3, wherein the two short triangular sides (16) meet at a point which is radially inwardly connected to the peripheral surface (10) of the lower portion (2) or the upper portion (3) , 10') spaced apart. The device of claim 3, wherein the two short triangular sides (16) are respectively aligned with one triangular side (16) of the immediately adjacent spacers (7, 7'). A device as claimed in claim 1, wherein the spacers (7, 7') are formed by a plurality of single strips (7, 7') spaced apart from each other in the circumferential direction around the axis (A). 6. The device of claim 6, wherein the single strips (7, 7') are evenly distributed circumferentially around the axis (A) and are separated from each other by an azimuthal gap (31), and in the In the gap, the upper part (3) is suspended above the lower part (2) under the condition of forming a gap (4) open on both sides in the radial direction. 2. The device of claim 1, wherein a slit (4) extending between the upper portion (3) and the lower portion (2) has limiting surfaces (4') and (4") extending parallel to each other. The device of claim 7, wherein the circumferential angle of the gap (31) in the azimuth angle between the two single connecting bars (7, 7') is greater than the circumferential angle occupied by the single connecting bars (7, 7') At least three times larger, or at least four or five times larger. A device for transporting substrates and/or for placing substrates on a substrate holder (23) in a process chamber of a housing of a CVD reactor, having an annular body (1) extending around an axis (A), the The body has an annular lower part (2), wherein the lower part (2) has an outer section (6) and radially inwardly of the outer section (6) has a rim for placing the base plate (21) A placing surface (5), wherein the outer section (6) carries an annular upper part (3), which is in a direction parallel to the axis (A) by means of spacers (7, 7' ) at a distance (D) from the radially outer region of the outer section (6), wherein one or more annular objects (3, 11) spaced apart from each other in the direction of the axis (A) are tied up and down superimposed, characterized by: The spacers (7) are engaged in a recess (13) of the lower part (2) or the upper part (3), respectively. 10. The device of claim 10, wherein the spacers (7) are homogeneously formed from the upper portion (3) or the lower portion (2). The device of claim 10, wherein an annular intermediate ring (11) is arranged between the annular upper part (3) and the annular lower part (2), the intermediate ring passing through a plurality of first single connecting strips (7) ') to connect the upper part (3), and to connect the lower part (2) through a plurality of second single connection bars (7), wherein the first single connection bars (7') and the second single connection bars (7') The strips (7) are staggered from each other by a certain angle. 10. The device of claim 10, wherein the spacers (7) are homogeneously formed from the upper portion (3) or the lower portion (2). The device of claim 10, wherein the lower portion (2) and the one or more annular upper portions (3) are made of the same material or different materials, and wherein the materials are graphite, SiC, ceramic materials , quartz or metal materials. A device for supporting a substrate, having a support shoulder (32) for supporting a bottom surface (8) of a transport ring (1), and the transport ring has a placement surface (5), when the CVD reaction When processing in the device, the placing surface is arranged below the edge of the substrate (21), and is characterized in that: The transport ring (1) is designed according to claim 1 or 10. A CVD reactor, comprising: a shell (29) airtight to the outside, a process chamber (28) arranged in the shell (29) between a top (27) of a process chamber and a substrate seat (23) ), a gas inlet member (25) for feeding process gases into the process chamber (28), a gas outlet member (26) for discharging gaseous reaction products, a gas outlet member (26) for heating the substrate holder (23) A heating device (24), and at least one device for supporting a substrate of claim 15. A method of manufacturing the device of claim 1, characterized in that: First, a one-piece base body (2) is produced together with an upper part (3), which is formed homogeneously with the base body (2), Then, by the material removal method, a gap (4) is made between the upper part (3) and the lower part (2) formed by the base body (2), so that the gap (4) is in the remaining single strips (7, 7') are open in both radially inward and radially outward directions. The method of claim 17, wherein the gap (4) is created by spark erosion with a taut wire or by a laser beam.

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