TW202117060A - Flat component that can be used in a CVD reactor - Google Patents

Abstract

The invention relates to a ceiling panel of a CVD reactor or to a CVD reactor having a ceiling panel (2) of this kind. The ceiling panel (2) is a flat component (2) having a first broad side (4) which can face the process chamber (3), and having a second broad side (5) which faces away therefrom. The component has an inner region (6) and an outer region (7) which is spaced apart therefrom. The second broad side (5) has one or more fastening elements (8) which each have a fastening shoulder (9) that can be engaged from underneath. It is essential that the first broad side surface (4) has a closed surface at the points at which the second broad side surface has a fastening element (8) on the opposite side. It is also essential that the one or more fastening elements (8) are spaced apart from the outer region (7) toward a center in such a way that the fastening elements (8), when installed in a CVD reactor, are arranged vertically above a process chamber floor surface (11) formed by a susceptor (20).

Description

Flat components for CVD reactors

The present invention relates to a flat component that can be used as a top plate in a CVD reactor, having a first wide side facing the first process chamber and a second wide side facing away from the first wide side, wherein the component has The inner area and the outer area spaced from the inner area. The second wide side has one or more fixing shoulders formed by fixing elements. The fixing elements can be held by the holding shoulders of the holding elements, so as to fasten the top plate above the substrate holder in the process chamber.

The present invention also relates to a CVD reactor provided with such a top plate for heat treatment of a substrate, and particularly for depositing a layer on the substrate, wherein the CVD reactor is particularly a MOCVD reactor. The present invention also relates to a method for installing or removing the top plate in such a CVD reactor. The present invention also relates to a method for manufacturing a flat component that can be used as a top plate in a CVD reactor, and the use of the flat component as a top plate in a CVD reactor.

US 10,418,264 B2 describes a CVD reactor with a top plate, which has two wide side surfaces facing away from each other. There are many openings on the wide side surface. Fixing elements as inserts are inserted in these openings. The fixing elements have undercut areas that can be held by the holding elements.

WO 2014/064179 describes a top plate of a CVD reactor, which is arranged below the exhaust surface of a gas inlet member, and the gas inlet member is in the shape of a shower head. The top plate has a central area and an outer area adjacent to the central area. The central area covers the substrate holder, and the substrate to be heat-treated is placed flat on the substrate holder. Taking the center of the top plate as a reference, the outer area protrudes from the radial outer edge of the base plate holder in a radially outward direction. A fixing element with fixing shoulders is provided in this outer area, and the fixing shoulders are held by the holding shoulders of the holding element. Wherein, the end portions of the holding elements each forming a holding shoulder pass through the window of the outermost edge of the top plate so as to support the top plate.

EP 2 741 316 B1 and EP 2 741 371 A1 respectively describe a CVD reactor with a process chamber top, the bottom of which is formed by a substrate holder, and the top of which is formed by flat components. The flat component is supported on a plurality of supporting shoulders, and the supporting shoulders are arranged in the radially outer area of the inner cavity of the CVD reactor shell.

US 2004/0005731 A1 describes a CVD reactor with a gas inlet member. The gas inlet member is arranged in the center of the process chamber for introducing process gas into the process chamber, and the top of the process chamber is supported by several mutually supporting Formed by flat components.

WO 99/43874 A1 describes a CVD reactor whose process chamber has a flat top plate. The top plate is in the shape of a disk with a central opening and is carried by a central gas inlet member.

In addition, US 5,855,679 and US 6,036,782 also belong to the prior art, which describe fixing elements by which the top plate can be fixed to the upper area of the CVD reactor.

The purpose of the present invention is to improve the top plate, the CVD reactor, the method of manufacturing the top plate, and the installation method of the top plate in the CVD reactor, which is beneficial to use.

Its purpose is achieved by the invention provided in the scope of the patent application, in which the appendix not only constitutes a beneficial improvement plan for the parallel claims, but also constitutes an independent solution to the purpose.

The present invention is first and essentially related to the improvement of flat components, which can be used or used as top plates in CVD reactors. This top plate has two opposite wide sides. The equal width sides are preferably flat surfaces extending in parallel, wherein one of the wide sides faces the process chamber, and the second wide side faces away from the process chamber. The second wide side facing away from the process chamber has many fixing elements, and the top plate can be fixed on the reactor shell by the fixing elements. The present invention proposes that at least one fixing element is provided. Preferably, several fixing elements are provided. Several fixing elements arranged on a circular arc around a center can be provided, wherein the center is located in the annular opening of the flat component. The fixing element has a fixing shoulder. In the first variant, the invention proposes that the fixing element can only be reached from the second wide side surface of the flat component. The fixing element may be a protrusion facing away from the second wide side. However, the fixing element can also be a groove. Among them, the groove has the largest depth extension, which is smaller than the material thickness of the flat component, that is, smaller than the distance between two opposite wide sides preferably formed by planes extending parallel to each other. According to the present invention, a first wide side that is continuous and uninterrupted toward the process chamber is formed. Where the second wide-side surface has the fixing element, the first wide-side surface disposed oppositely extends continuously without interruption. In this way, the bottom of the groove forming the fixing element and the first wide side surface are separated by the volume of the flat component. The groove thus has a closed bottom surface. The surface of the flat component facing the process chamber is preferably smooth or uniformly structured along its entire surface. The surface may assume a ring shape with a central opening. In addition, the surface preferably does not have an opening on the wide side facing the process chamber. In the second variant of the present invention (which can be combined with the first variant of the present invention), the following arrangement is provided: the fixing element is arranged vertically above the substrate with the top plate installed in the CVD reactor, and the substrate The system is arranged on the bottom surface of the process chamber, especially formed by the substrate holder. In particular, the arrangement is as follows: the flat component has an inner area and an outer area, wherein the inner area is closer to the center than the outer area. It can be arranged as follows: the center of the top plate is formed by the central opening, and the gas inlet member passes through the central opening in the state of being loaded into the CVD reactor. In particular, the arrangement is as follows: the fixing element is closer to the edge of the opening than the outer edge of the outer region. In particular, it is provided that the fixing element is directly adjacent to the edge of the opening. The edge of the opening can extend on the arc line. The center of the arc line can be the center of symmetry of the flat component, and the outer edge of the flat component can also extend on the arc line. In a further aspect of the present invention, it is proposed that the fixed shoulder is formed by the undercut of the hole, notch or groove. The hole can be a blind hole. The fixed shoulders can also be formed by protrusions, especially the undercuts of the ribs. The fixing shoulder is preferably formed by an undercut portion of a wall extending transversely to the second wide side surface, wherein the wall may be formed by a groove or a protrusion. The grooves can be single holes, and the single holes are spaced apart from each other, or evenly arranged circumferentially around the center of the top plate. The holes (especially blind holes) may have a keyhole-like profile. Blind holes can be made by cutting methods. In particular, the arrangement is as follows: the blind holes are made by milling. In particular, a side cutter with cutting edges on the peripheral edge and wide side surface is used. The cutting edges arranged on the wide side surface are used to create grooves until a bottom surface spaced from the wide side facing the process chamber is formed. This is achieved by the vertical displacement of the milling tool. Then, a fixed shoulder is generated by the horizontal displacement of the milling tool. In a variant of the present invention, it is proposed that the wide side used to fix the top plate on the shell of the CVD reactor has one or several protrusions. Each of these protrusions can form a fixed shoulder. But it is also arranged as follows: a fixing protrusion forms a plurality of fixing shoulders. In a variant of the present invention, it is proposed that the fixed shoulder is formed by an undercut of a rib extending concentrically around the center of the flat component. That is, a rib-like protrusion is provided, and the protrusion can also extend around the central opening of the flat component, wherein the protrusion can directly abut the central opening, especially the edge of the central opening can be formed. However, the annular fixed shoulder can be formed not only by ribs, but also by grooves.

The CVD reactor using the above-mentioned top plate has an airtight casing that can be evacuated. A substrate seat is provided inside the casing to accommodate the substrate to be heat-treated, and in particular, to be coated. The substrate can be laid flat on a plurality of substrate holders, and the substrate holders are respectively embedded in a recess of the substrate holder, and are supported on the air cushion there. The gas flow that generates the air cushion is preferably directed to flow into the recess, so that the substrate holder is driven to rotate during the heat treatment of the substrate. The substrate holder can be arranged on the rod body, and the rod system can rotate around the rod body axis, so that the substrate holder can rotate in the rotation plane. A heating device can be arranged under the substrate holder, so that the substrate holder can be heated to the process temperature. The heating device can be a radio frequency heater or an infrared heater. A gas inlet member is provided, so that many process gases can be fed into the process chamber of the CVD reactor. The process gases are preferably Group III organometallic compounds and Group V hydrides. Therefore, the CVD reactor can preferably be a MOCVD reactor. In a preferred technical solution, the gas inlet member extends into the process chamber through the opening in the center of the top plate, so that the process gas can flow into the process chamber from the exhaust area of the gas inlet member, and pass through the process chamber in the vertical direction. . The aforementioned flat component is used as a top plate in this CVD reactor. In order to fix the top plate above the substrate holder and orient the top plate in a vertical and/or oblique direction so that the wide side facing the process chamber is parallel to the bottom surface of the process chamber or perpendicular to the rotation axis of the substrate holder, a holding element is provided. The holding element preferably protrudes from the top of the shell of the CVD reactor. There may also be a plurality of adjusting elements, by means of these adjusting elements, one holding element can be displaced in the vertical direction and/or rotated around the vertical axis. According to the present invention, the CVD reactor has one or more holding elements, and the holding elements have holding shoulders that can hold the fixed shoulders. The holding shoulder may be formed by a wing protruding transversely to the rod body of the holding element, or may be formed by a disc body. The disc body can be in the shape of a disc. The rod body of the holding element is connected to the disc body in the center of the disc. The extension surface of the disc body or the wing portion preferably extends transversely to the extension direction of the rod body of the holding element. The holding elements are preferably constructed to be able to enter the holding position from the release position by rotating around their respective rod bodies. The holding shoulder holds the fixed shoulder at the holding position. In a variant of the present invention, the retaining shoulder is especially formed by the disc body, and the top plate is moved from the release position to the holding position by rotating about its axis. To this end, the fixing element has the shape of the aforementioned keyhole-shaped groove. Wherein, first, the vertical upward movement of the top plate is used to insert the retaining shoulder (ie, the plate body) into the blind hole. Then, the top plate is rotated around its figure axis until the holding shoulder enters the narrow part of the keyhole-shaped blind hole, wherein the edge part of the disc body supports and holds the fixed shoulder. In this variant, the retaining shoulders can also be formed by wings, and the wings protrude from the free end of the rod of the retaining element in only one direction. In this variant, it can also be arranged as follows: the holding shoulder is not driven by the rotation of the flat component, but by the rotation of the rod of the holding element, and enters the holding position from the release position. When disassembling the top plate, according to the specific variants used, if the top plate is not slightly rotated around its axis, it is the rotation of the rod of the holding element to separate the holding shoulders of the holding element from its holding position.

The embodiments of the present invention are described below with reference to the accompanying drawings. The device shown in the figure is a MOCVD reactor with a reactor shell 1, and the reactor shell system is formed by a metal shell such as a stainless steel shell or an aluminum shell. The housing can be evacuated. The gas inlet member 22 extends from the top of the casing 1 into the inside of the casing 1, and the casing is provided with a processing chamber 3. The processing chamber is bounded by the top plate 2 upwardly and bounded by the substrate holder 20 downwardly. With the gas inlet member 22, the process gas can be fed into the process chamber 3 to facilitate the deposition of a semiconductor layer on the substrate 10 lying on the bottom surface 11 of the process chamber there. For this reason, the process gas systems enter the process chamber 3 through the exhaust zone 23, and the process gases are preferably Group III organometallic compounds and Group V hydrides carried by a carrier gas.

The substrate holder 20 is carried by a rod 21 which can be driven around a rotation axis. A heating device 19 capable of heating the substrate holder 20 to the process temperature is provided under the substrate holder. Through the rod body 21, gas (not shown) is provided to the exhaust opening (not shown) at the bottom of the groove to support the substrate holder 24. A gas flow is exhausted from the exhaust opening, and the gas flow keeps the substrate holder 24 in rotating suspension.

Inside the reactor shell 1, a top plate 2 made of graphite is extended at a position vertically separated from the bottom surface 11 of the process chamber at a certain distance. This top plate is in particular a top plate made of coated graphite, formed by a flat component 2. The top plate 2 may have a graphite core, the surface of which is coated with a ceramic material, for example. The flat assembly 2 has a central opening 12 through which the gas inlet member 22 passes. The inner area 6 of the top plate 2 is connected to the edge of the opening 12, and the inner area is adjacent to the edge of the opening 12. The substantially disc-shaped top plate 2 has a radial outer periphery, which is formed as the boundary of the outer region 7. The inner area 6 extends vertically above the bottom surface 11 of the process chamber where the substrate 10 is laid, and the outer area 7 extends radially outside of the area occupied by the substrate 10 on the bottom surface 11 of the process chamber. The top plate 2 has a bottom surface forming a first wide side 4 which extends in a plane and should extend as parallel as possible to the bottom surface 11 of the process chamber. In a reactor in which the substrate holder 20 can be driven to rotate around a rotation axis, the first wide side 4 preferably extends perpendicular to the rotation axis. The second wide side 5 is arranged opposite to the first wide side 4, and the second wide side does not necessarily extend parallel to the first wide side 4, nor does it necessarily extend in a plane. However, in the embodiment, the second wide side 5 extends parallel to the first wide side 4.

According to the present invention, the second wide side 5 has a structure forming a fixing element 8, especially a space structure, and the fixing elements cooperate with the holding element 25 to hold the top plate 2 at a predetermined position. The spatial structure is designed to be limited to the second wide side 5 and does not affect the continuous two-dimensional plane extension of the first wide side 4.

One or several fixing elements 8 can be arranged, especially around the axis of the drawing surface of the top plate 2 and evenly distributed in the circumferential direction. However, it is also possible to provide a single fixing element 8 which extends along a larger surface area, and in particular extends along a circular arc on the second wide side 5. There is preferably the smallest radial distance between the fixing element 8 and the center of the top plate 2. The first wide side has a smooth or uniformly structured continuous surface where the second wide side 5 has a fixing element 8.

In the embodiment shown in FIGS. 1 to 7, the fixing element 8 is formed by a groove, and in particular by a blind hole. The fixing elements are single grooves cooperating with a holding element 25, respectively. The blind holes 14 each have a bottom 16 thereof, which has a closed surface, that is, does not have an opening to the first wide side 4 arranged opposite. Therefore, the volume area 17 of the core part of the top plate 2 preferably made of graphite extends between the bottom parts 16 of the blind hole 14. The blind hole 14 is preferably made with a side-edge milling cutter, and the side-edge milling cutter first generates a groove by vertical movement, and then generates a fixed shoulder 9 by horizontal movement. Among them, the narrow part 15 of the groove is formed. The groove has a keyhole-like profile as a whole.

The holding shoulder 26 of the holding element 25 can extend into the groove made in this way. In the embodiment shown in FIGS. 1 to 4, the retaining shoulder 26 is formed by a circular disk body 29, and the rod body 27 protrudes from the center of the disk body transversely to the extension plane of the disk body. However, the disk body 29 may also have a polygonal outline.

When installing the top plate 2, first, move the top plate vertically upwards until the retaining shoulder 26 formed by the plate body 29 extends into the blind hole 14. Next, the top plate 2 is rotated around the axis extending through the central opening 12, whereby the top plate 2 is connected to the disk body 29 through a rotary fixed movement, wherein the wide side of the disk body 29 The holding shoulder 26 formed on the surface supports the fixing shoulder 9 of the fixing element 8. The top plate 2 can preferably form a bayonet connection with the holding element 25.

In the embodiment shown in FIGS. 6 to 7, the retaining shoulder 26 is formed by a wing portion 28 protruding transversely to the extending direction of the rod body 27. A holding shoulder 26 is formed on the wide side surface of the wing portion 28, which is attached to the fixing shoulder 9 at the holding position.

In this embodiment, the top plate 2 can also be fixed on the reactor shell 1 by a bayonet movement. However, in this variant, the fixation can also be accomplished by individually rotating the rod body 27 around its axis. This is achieved by the adjustment element 30, which enables the holding element 25 to move both in the vertical direction and in the rotation direction.

With the adjustment element 30, the tilt posture of the top plate 2 can be changed so that the first wide side 4 can assume a posture parallel to the bottom surface 11 of the process chamber.

The difference between the embodiment shown in FIGS. 8 to 11 and the previous embodiment is that the fixing element 8 is not formed by a groove, but by a protrusion. In the embodiment, the protrusion 18 is formed by a rib extending along the edge of the central opening 12. The protrusion 18 has a cutout forming a fixing shoulder 9 on its side away from the central opening 12. The fixing shoulder 9 can be held by the holding shoulder 26 of the holding element 25. In this embodiment, the holding element 25 also has an elongated rod body 27 extending in the vertical direction, and a free end of the rod body is provided with a wing 28 protruding from the rod body transverse to the extending direction of the rod body 27. The upwardly facing surface of the wing portion 28 forms a holding shoulder 26. By rotating the holding element 25 around its shaft axis, the holding shoulder can be sent to the holding position for holding the fixed shoulder 9.

In the embodiment, the top plate 2 is formed of a graphite body coated with silicon carbide (SiC). However, the top plate 2 can also be made of other materials, such as quartz, graphite, ceramic materials, and so on. In the embodiment, the top plate 2 is integrally formed. However, the top plate can also be composed of several parts as described in US 2004/0003779 A1. The components of the top plate formed by a number of nested annular bodies can be composed of different parts. For example, one part may be composed of quartz, and the other part may be composed of graphite coated with silicon carbide.

A plurality of springs not shown in the figure may be provided, and the holding element 25 is fixed on the adjusting element 30 in a suspended state by the springs, or the springs function as holding shoulders. The top plate is lowered or raised by lifting movement and through the vertical displacement of the holding element 25, and its lifting movement can be driven manually, pneumatically, electric or hydraulically. For this purpose, in particular, a lifting element 30 fixedly arranged on the reactor shell 1 is provided. The material thickness of the top plate is preferably in the range between 4 mm and 20 mm. With the holding element 25, the height of the process chamber can be adjusted, and the height is in the range between 10 mm and 40 mm.

In addition to the fixing element 8 and the holding element 25 arranged adjacent to the center in the embodiment, other fixing elements 8 or holding elements arranged adjacent to the radial outer edge, especially also arranged in the area 7 outside the top plate 2 may be further provided. Element 25. Several fixing elements 8 can be arranged on a circular arc line R around the center of symmetry of the flat component 2. The configuration can be a uniform angular distribution. The lifting element 30 can be electrically operated by a control device not shown in the figure. The rotational movement of the holding element 25 can also be performed electromechanically under the control of the control device.

The part of the gas inlet member 22 passing through the central opening 12 can extend into the groove of the substrate holder 20. The exhaust zone 23 preferably extends on a cylindrical surface.

In the foregoing embodiment, the top plate 2 is a flat component. In an embodiment not shown in the figure, the flat component can also be composed of several single pieces, and the single pieces form a flat component in an assembled state. The flat component 2 can be composed of several ring-shaped monomers, of which one ring-shaped monomer (for example, the ring-shaped monomer on the radial outer side or the radial inner side) has a fixing element 8. This ring-shaped body can form a supporting side surface that can be supported by other ring-shaped bodies, and the other ring-shaped bodies either surround the ring-shaped body with the fixing element 8 or are surrounded by the ring-shaped body with the fixing element 8. The fixing element 8 may have the same function and shape as the fixing element described in FIGS. 1 to 11.

The following is regarded as advantageous: the fixing element 8 can be formed in a disc-shaped blank having a smooth wide-side surface only by a cutting method. For this reason, the following has proven to be advantageous: the fixing element forms a blind hole, wherein the bottom of the blind hole is materially consistent with this component. The wide side surface arranged opposite to the blind hole has a continuous surface with a single material. Further advantageously, a blind hole with a circular profile is connected to the narrow part. The narrow portion 15 may have a width W which is smaller than the diameter D of the opening of the blind hole. The narrow portion is preferably formed with two opposite edges 34. The edges 34 of the narrow portion 15 define a fixed shoulder 9 respectively. The wider volume between the two walls 32 extending parallel to each other extends below the fixed shoulder 9, wherein the walls 32 have a distance A equal to the diameter D of the circular blind hole. The walls 32 are connected to each other when a rounded wall 33 is formed. The end of the narrow portion 15 arranged opposite to the blind hole has a rounded edge, which smoothly connects the edge 34. The rounded edge of the narrow portion 15 extends coaxially with the wall 33. The fixing of this assembly on the holding element 25 is achieved by the relative rotation of the assembly relative to the holding element 25.

The foregoing embodiments are used to illustrate the inventions included in the application as a whole. These inventions are at least independently constituted by the following feature combinations to form an improvement over the prior art. Among them, two, several or all of these feature combinations Feature combinations can also be combined with each other, namely:

A flat component 2 that can be used as the top plate of the process chamber 3 in a CVD reactor. The flat component has a first wide side surface 4 facing the process chamber 3 and a second wide side surface 5 opposite to the first wide side surface , Wherein the second wide side surface 5 has one or several fixing elements 8, which respectively have fixed shoulders 9 that can be held and are formed by grooves, wherein the first wide side surface 4 is located on the first wide side surface 4 The two wide-side surfaces have a closed surface at the position where the fixing element 8 is located on the opposite side, and is characterized in that the fixing element 8 is a blind hole with a closed bottom that is consistent with the component 2 in material.

A component characterized in that: the blind hole has a circular opening, and a narrow portion 15 with a width W is connected to the opening, and the width is smaller than the diameter D of the blind hole, wherein two of the narrow portions 15 The opposite edges 34 respectively form a fixed shoulder 9.

An assembly characterized in that the inner area 6 of the assembly 2 is adjacent to the central opening 12, and the fixing elements 8 are closer to the edge of the opening 12 than the outer edge of the outer area 7.

A component is characterized in that the fixed shoulder 9 is formed on at least one core part of the component made of graphite by a cutting method and/or a side milling cutter.

An assembly characterized in that: a plurality of fixing elements 8 are arranged on a circular arc line R around the center of the assembly 2, and/or, a first wide side surface 4 facing away from at least one fixing element 8 has a surface along its entirety The surface extension is a smooth or uniformly structured closed surface.

An assembly characterized in that the two opposite walls 32 of the narrow portion 15 each spanned by a fixed shoulder 9 have a distance A equal to the diameter D.

A CVD reactor is characterized in that the fixed shoulder 9 is formed by the undercut portion of the rib-shaped protrusion 18, and the protrusion extends concentrically around the central opening 12 of the assembly 2.

A component is characterized in that the fixed shoulder 9 is arranged on the radially outward wall of the rib-shaped protrusion 18.

A CVD reactor, characterized in that: the flat assembly 2 is constructed according to any one of the foregoing inventions, and is held by one or more holding elements 25, and the holding elements have a plurality of holding shoulders 9 The multiple holding shoulders 26.

A CVD reactor is characterized in that the holding elements 25 are adjustable in height and/or have an elongated rod body 27 made of heat insulating material.

A CVD reactor characterized in that: the retaining shoulder 26 is formed by a wing 28 or a disc 29 arranged on the free end of the retaining element 25, and/or the retaining shoulder 26 can be formed by the retaining element 25 Rotate and/or rotate the flat component to leave or enter the holding position of the holding fixed shoulder (9).

A CVD reactor is characterized in that a flat assembly 2 is fixed on a plurality of holding elements 25 at a position above the substrate seat 20 of the CVD reactor, wherein the holding element 25 or the flat assembly 2 is rotated.

A component, a CVD reactor, a method, and a use are characterized by having one of the characteristics of the aforementioned inventions.

All the disclosed features (as individual features or combinations of features) are the essence of the invention. Therefore, the disclosure content of this application also includes all the content disclosed in the related/attached priority files (copy of the previous application), and the features described in these files are also included in the scope of the patent application of this application. The appendix uses its characteristics to describe the characteristics of the improvement scheme of the present invention with respect to the prior art, and its purpose is mainly to make a divisional application on the basis of these claims. The invention given in each claim may further have one or several of the features given in the foregoing description, especially marked with symbols and/or given in the symbol description. The present invention also relates to the following design forms: the individual features described in the foregoing description are not realized, and are especially unnecessary for specific applications or features that can be replaced by other technically equivalent components.

1: (reactor) shell 2: (flat) component/top plate 3: Process room 4: (first) wide side/wide side surface 5: (Second) wide side/wide side surface 6: (flat module/top plate) inner area 7: (flat component/top plate) outer area 8: fixed components 9: fixed shoulder 10: substrate 11: The bottom surface of the process chamber 12: (center) opening 13: Wall 14: Blind hole 15: Narrow part 16: (blind hole) bottom 17: Volume area 18: (rib-shaped) protrusion 19: Heating device 20: base plate seat 21: Rod body 22: Gas inlet component 23: Exhaust area 24: substrate rack 25: Keep components 26: Keep the shoulders 27: Rod body 28: Wing 29: Disc body 30: Adjusting element/lifting element 31: Wall 32: wall 33: wall 34: (narrow part 15) edge A: (wall 32) spacing D: (blind hole 14) diameter R: (around the center of the component) arc line W: (narrow part 15) width

Fig. 1 is a schematic cross-sectional view of a CVD reactor having a holding arrangement for holding a top plate of the present invention. Fig. 2 is an enlarged view of part II in Fig. 1. FIG. 3 is a schematic diagram of the second wide side surface of the top plate 2 viewed in the direction indicated by arrow III in FIG. 2. Fig. 4 is a perspective perspective view of the keyhole-shaped fixing element according to Figs. 2 and 3. Fig. 5 is a top view of the top plate 2 and the fixing elements evenly arranged circumferentially around the central opening. Fig. 6 is a view as shown in Fig. 2 of the second embodiment. Fig. 7 is a view as shown in Fig. 4 of the second embodiment. FIG. 8 is a view similar to FIG. 1 of the third embodiment, except that only a flat component 2, a part of the reactor shell 1 and a holding element 25 are shown. FIG. 9 is a top view of the top plate of the embodiment shown in FIG. 8. FIG. Fig. 10 is a perspective perspective view of the fixing element formed by the rib-shaped protrusion of the embodiment shown in Fig. 8. Fig. 11 is a view showing the holding position according to Fig. 10;

1: (reactor) shell

2: (flat) component/top plate

3: Process room

4: (first) wide side/wide side surface

5: (Second) wide side/wide side surface

6: (flat module/top plate) inner area

7: (flat component/top plate) outer area

8: fixed components

9: fixed shoulder

10: substrate

11: The bottom surface of the process chamber

12: (center) opening

19: Heating device

20: base plate seat

21: Rod body

22: Gas inlet component

23: Exhaust area

24: substrate rack

25: Keep components

30: Adjusting element/lifting element

Claims (13)

A flat component that can be used as the top plate of a process chamber in a CVD reactor. The flat component (2) has a first wide side surface (4) that can face the process chamber (3) and a back to the first wide side surface The second wide side surface (5) of Wherein, the second wide side surface (5) has one or several fixing elements (8), which respectively have fixed shoulders (9) that can be held and are formed by grooves, Wherein, the first wide side surface (4) has a closed surface at a location where the second wide side surface has a fixing element (8) on the opposite side thereof, It is characterized in that the fixing element (8) is a blind hole with a closed bottom which is consistent with the component (2) in material. Such as the component of claim 1, wherein the blind hole has a circular opening, and a narrow portion (15) having a width (W) is connected to the opening, and the width is smaller than the diameter of the blind hole (D ), wherein the two opposite edges (34) of the narrow portion (15) respectively form a fixed shoulder (9). Such as the component of claim 1, wherein the inner area (6) of the component (2) is adjacent to a central opening (12), and the fixing elements (8) are outside of an outer area (7) The edge is closer to the edge of the opening (12). Such as the component of claim 1, wherein the fixed shoulder (9) is formed on at least one core of the component made of graphite by a cutting method and/or a side milling cutter. Such as the assembly of claim 1, wherein a plurality of fixing elements (8) are arranged on a circular arc (R) around the center of the assembly (2), and/or, facing away from at least one of the fixing elements (8) The first wide-side surface (4) of has a closed surface that is smooth or uniformly structured along its entire surface. The assembly of claim 2, wherein the two opposite walls (32) of the narrow portion (15) each spanned by a fixed shoulder (9) have a distance (A) equal to the diameter (D). Such as the component of claim 6, wherein one end of the narrow portion (15) away from the opening of the blind hole is rounded, and/or the walls ( 32) is connected to each other by an arc-shaped wall (33), and the arc-shaped wall (33) extends coaxially with the rounded edge of the narrow portion (15). A flat component that can be used as the top plate of a process chamber in a CVD reactor. The flat component (2) has a first wide side surface (4) that can face the process chamber (3) and a back to the first wide side surface The second wide side surface (5) of the component, wherein the component has an inner area (6) and an outer area (7) spaced apart from the inner area, wherein the second wide side surface (5) corresponds to A fixing element (8), and the fixing element has a fixed shoulder (9) that can be held, and is characterized by: The fixed shoulder (9) is formed by an undercut part of a rib-shaped protrusion (18), and the protrusion extends concentrically around the central opening (12) of the component (2). The assembly of claim 8, wherein the fixed shoulder (9) is arranged on a radially outward wall of the rib-shaped protrusion (18). A CVD reactor having a substrate holder (20) for accommodating a plurality of substrates (10) to be processed in a process chamber (3) of the CVD reactor, and formed by a flat component (2) One of the top plates is characterized by: The flat assembly (2) is constructed according to claim 1 or 8, and is held by one or several holding elements (25), and the holding elements have a plurality of holding protrusions supporting a plurality of fixing shoulders (9). Shoulder (26). Such as the CVD reactor of claim 10, wherein the holding elements (25) are adjustable in height and/or have an elongated rod (27) made of heat-insulating material. Such as the CVD reactor of claim 10, wherein the holding shoulder (26) is formed by a wing (28) or a disc (29) arranged on the free end of the holding element (25), and/ Alternatively, the holding shoulder (26) can leave or enter the holding position for holding the fixed shoulder (9) by the rotation of the holding element (25) and/or by the rotation of the flat component. A method for installing or disassembling the top plate formed by flat components of claim 1 or 8 in the CVD reactor of claim 10, characterized in that: At a position above one of the substrate holders (20) of the CVD reactor, the flat assembly (2) is fixed on a plurality of holding elements (25), wherein the holding element (25) or the flat assembly (2) is rotated .

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