TW202140759A

TW202140759A - 半導體基板用洗淨液

半導體基板用洗淨液 Download PDF

Info

Publication number: TW202140759A
Authority: TW; Taiwan
Prior art keywords: cleaning solution; semiconductor substrate; acid; mass; compound
Prior art date: 2020-04-10

Application number

TW110112784A

Other languages

English (en)

Chinese (zh)

Inventor

上村哲也

大内直子

山田新平

Original Assignee

日商富士軟片電子材料股份有限公司

Priority date

2020-04-10

Filing date

2021-04-08

Publication date

2021-11-01

2021-04-08 Application filed by 日商富士軟片電子材料股份有限公司 filed Critical 日商富士軟片電子材料股份有限公司

2021-11-01 Publication of TW202140759A publication Critical patent/TW202140759A/zh

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238000004140 cleaning Methods 0.000 title claims abstract description 394
239000000758 substrate Substances 0.000 title claims abstract description 152
239000004065 semiconductor Substances 0.000 title claims abstract description 150
239000007788 liquid Substances 0.000 title description 143
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150000001414 amino alcohols Chemical class 0.000 claims abstract description 71
229910052721 tungsten Inorganic materials 0.000 claims abstract description 48
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 45
239000010937 tungsten Substances 0.000 claims abstract description 45
239000000126 substance Substances 0.000 claims abstract description 22
229910052751 metal Inorganic materials 0.000 claims description 160
239000002184 metal Substances 0.000 claims description 158
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239000004094 surface-active agent Substances 0.000 claims description 56
125000001424 substituent group Chemical group 0.000 claims description 42
125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 37
GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 35
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