TW202139279A - Setting method of alignment mark and machining apparatus automatically adjusting the range of the designated mark to set the alignment mark - Google Patents
Setting method of alignment mark and machining apparatus automatically adjusting the range of the designated mark to set the alignment mark Download PDFInfo
- Publication number
- TW202139279A TW202139279A TW110110420A TW110110420A TW202139279A TW 202139279 A TW202139279 A TW 202139279A TW 110110420 A TW110110420 A TW 110110420A TW 110110420 A TW110110420 A TW 110110420A TW 202139279 A TW202139279 A TW 202139279A
- Authority
- TW
- Taiwan
- Prior art keywords
- mark
- marks
- frame line
- circumscribed rectangle
- wafer
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67282—Marking devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54426—Marks applied to semiconductor devices or parts for alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
本發明是有關於一種在對正面側形成有複數個標記之晶圓進行加工的加工裝置中,將包含操作人員所指定之1個以上的標記之區域設定為校準標記的校準標記之設定方法、及可將該區域設定為校準標記之加工裝置。The present invention relates to a method for setting an area containing one or more marks designated by an operator as a calibration mark in a processing device for processing a wafer with a plurality of marks formed on the front side, And the processing device that can set this area as calibration mark.
於正面側在以設定成格子狀之複數條分割預定線所區劃的各區域中形成有IC(積體電路,Integrated Circuit)等器件的晶圓,在將背面側磨削至成為預定的厚度後,被加工裝置沿分割預定線加工而被分割成複數個器件晶片。A wafer in which devices such as IC (Integrated Circuit) are formed in each area divided by a plurality of planned dividing lines set in a grid on the front side, and the back side is ground to a predetermined thickness , The processed device is processed along the planned dividing line to be divided into a plurality of device wafers.
作為沿著分割預定線加工晶圓之加工裝置,可使用例如切削裝置。切削裝置具備用於吸引保持晶圓的工作夾台。工作夾台可繞著預定的旋轉軸旋轉。在此工作夾台的上方設置有相機、及包含切削刀片之切削單元。As a processing device for processing the wafer along the planned dividing line, for example, a cutting device can be used. The cutting device includes a work chuck table for sucking and holding wafers. The work clamp table can rotate around a predetermined rotation axis. A camera and a cutting unit including cutting blades are arranged above the work clamping table.
在以切削裝置切削晶圓之前,會進行用於將切削刀片定位在分割預定線的延長線上之校準步驟(參照例如專利文獻1)。在校準步驟中,是在以工作夾台吸引保持了晶圓的背面側的狀態下,拍攝形成於晶圓的正面側之預定形狀的標記,並將此標記作為校準標記而設定於切削裝置(教導步驟)。Before cutting the wafer with the cutting device, a calibration step for positioning the cutting insert on the extension line of the planned dividing line is performed (see, for example, Patent Document 1). In the calibration step, a mark of a predetermined shape formed on the front side of the wafer is photographed while the back side of the wafer is sucked and held by the work chuck, and the mark is set as a calibration mark in the cutting device ( Teaching steps).
之後,利用圖像中的型樣匹配,來特定出存在於分開之二處的相同形狀的校準標記。並且,利用此二處的校準標記的座標使工作夾台旋轉相當於預定的角度,藉此將晶圓的方向調整成分割預定線變得和切削裝置的X軸平行。After that, the pattern matching in the image is used to identify the calibration marks of the same shape that exist in the two separate places. And, using the coordinates of the two calibration marks to rotate the work chuck by a predetermined angle, the direction of the wafer is adjusted so that the planned dividing line becomes parallel to the X axis of the cutting device.
如此,在校準步驟中,首先是進行教導步驟。在教導步驟中,操作人員在已使相機所拍攝到的晶圓的正面側的圖像顯示於顯示裝置的狀態下,搜尋校準標記,並決定將哪個標記作為校準標記來使用。In this way, in the calibration step, the teaching step is performed first. In the teaching step, the operator searches for the calibration mark in a state where the image of the front side of the wafer captured by the camera is displayed on the display device, and decides which mark to use as the calibration mark.
在教導步驟中,於圖像的中央部顯示有由十字線、及包圍此十字線的周圍之正方形的框所構成之框線,且操作人員使用操作鍵,來將框線的位置在X軸方向及Y軸方向上調整、或放大/縮小框線的大小。In the teaching step, a frame line composed of a crosshair and a square frame surrounding the crosshair is displayed in the center of the image, and the operator uses the operation keys to set the position of the frame line on the X axis Adjust, or enlarge/reduce the size of the frame line in the direction and Y-axis direction.
並且,在已讓作為校準標記來使用之標記落在框線的內側之狀態下,將該標記、與被框線所包圍的該標記的周圍之區域作為校準標記來登錄。但是,由於框線的位置及大小的調整,通常是藉由操作人員的人工操作憑感覺來進行,因此每次校準標記之設定時、或每次不同的操作人員設定校準標記時,會有框線的大小不同的可能性。 先前技術文獻 專利文獻And, in a state where the mark used as the calibration mark falls inside the frame line, the mark and the area surrounding the mark surrounded by the frame line are registered as the calibration mark. However, since the adjustment of the position and size of the frame line is usually carried out by the operator's manual operation and feel, there will be a frame every time the calibration mark is set, or every time a different operator sets the calibration mark. Possibility of different sizes of lines. Prior art literature Patent literature
專利文獻1:日本特開平7-106405號公報Patent Document 1: Japanese Patent Laid-Open No. 7-106405
發明欲解決之課題The problem to be solved by the invention
若框線的大小在每次設定時不同,會有以下情況:儘管將相同形狀的標記設定為校準標記,但是被設定為校準標記之標記的範圍不同、或標記的周圍的區域的面積不同。也就是說,雖然是以相同形狀的標記作為對象,但會有相異的形狀及大小的校準標記被設定之可能性。If the size of the frame line is different each time it is set, there may be the following situations: although the mark of the same shape is set as the calibration mark, the range of the mark set as the calibration mark is different, or the area of the area around the mark is different. In other words, although marks of the same shape are used as targets, calibration marks of different shapes and sizes may be set.
本發明是有鑒於所述的問題點而作成的發明,其目的在於對所指定的標記自動地調整範圍來設定校準標記。 用以解決課題之手段The present invention was made in view of the above-mentioned problems, and its object is to automatically adjust the range of the designated mark to set the calibration mark. Means to solve the problem
根據本發明的一個態樣,可提供一種校準標記之設定方法,是在對正面側形成有複數個標記之晶圓進行加工的加工裝置中,將包含操作人員所指定之1個以上的標記之區域設定為校準標記,前述校準標記之設定方法具備以下步驟: 拍攝步驟,以拍攝單元拍攝已形成於該晶圓的該1個以上的標記; 資訊取得步驟,對在該拍攝步驟中所拍攝到的該1個以上的標記,取得構成該1個以上的標記的每一個的外接矩形之資訊; 框線調整步驟,在該資訊取得步驟之後,因應於指定了該1個以上的標記當中的1個標記或複數個標記之情形,使該1個標記或該複數個標記的整體的該外接矩形的中心,移動到要作為校準標記而設定在該加工裝置時所利用的四角形的框線的中心,並將該框線相對於該外接矩形的位置及大小自動地調整成:該外接矩形落在該框線內,且該外接矩形與該框線之間隔被調整為事先決定之距離;及 登錄步驟,將經調整大小之該框線的內側中的包含該1個標記或該複數個標記的區域作為校準標記來登錄於該加工裝置。According to one aspect of the present invention, a method for setting calibration marks can be provided. In a processing device for processing a wafer on which a plurality of marks are formed on the front side, one or more marks designated by an operator are included. The area is set as the calibration mark, and the setting method of the aforementioned calibration mark has the following steps: In the photographing step, the one or more marks that have been formed on the wafer are photographed by the photographing unit; The information obtaining step is to obtain the information of the circumscribed rectangle of each of the one or more marks photographed in the one or more marks; In the frame adjustment step, after the information acquisition step, in response to a situation where one or more of the more than one mark is designated, the circumscribed rectangle of the one mark or the entirety of the plurality of marks Move to the center of the square frame line used when setting the processing device as a calibration mark, and automatically adjust the position and size of the frame line relative to the circumscribed rectangle to: the circumscribed rectangle falls on Within the frame line, and the interval between the circumscribed rectangle and the frame line is adjusted to a predetermined distance; and The registration step is to register the region containing the one mark or the plurality of marks in the inner side of the frame line that has been resized as a calibration mark in the processing device.
根據本發明的其他態樣,可提供一種加工裝置,其可在對正面側形成有複數個標記之晶圓進行加工時,將包含操作人員所指定之1個以上的標記之區域設定為校準標記,前述加工裝置具備: 工作夾台,吸引保持該晶圓; 拍攝單元,具有拍攝元件,並配置在該工作夾台的上方且拍攝以該工作夾台所吸引保持之該晶圓; 顯示裝置,顯示以該拍攝單元所取得的圖像; 控制單元,具有處理器,且控制該工作夾台、該拍攝單元及該顯示裝置的動作;及 輸入裝置,將操作人員的指示對該控制單元輸入, 該控制單元包含: 資訊取得部,對以該拍攝單元所拍攝到的該1個以上的標記,取得構成該1個以上的標記的每一個的外接矩形之資訊; 框線調整部,因應於透過該輸入裝置指定了該1個以上的標記當中的1個標記或複數個標記之情形,使該1個標記或該複數個標記的整體的該外接矩形的中心,移動到要作為校準標記而設定在該加工裝置時所利用的四角形的框線的中心,並將該框線相對於該外接矩形的位置及大小自動地調整成:該外接矩形落在該框線內,且該外接矩形與該框線之間隔被調整為事先決定之距離;及 校準標記登錄部,將經調整大小之該框線的內側中的包含該1個標記或該複數個標記的區域作為校準標記來登錄。 發明效果According to another aspect of the present invention, a processing device can be provided, which can set an area containing more than one mark designated by an operator as a calibration mark when processing a wafer with a plurality of marks formed on the front side , The aforementioned processing device has: Work clamp table to attract and hold the wafer; A photographing unit having a photographing element, which is arranged above the work chuck table and photographs the wafer attracted and held by the work chuck table; A display device, which displays the image obtained by the photographing unit; The control unit has a processor and controls the actions of the work clamp table, the photographing unit and the display device; and Input device to input the instructions of the operator to the control unit, The control unit contains: The information obtaining unit obtains information of the circumscribed rectangle of each of the one or more marks photographed by the photographing unit; The frame adjustment unit, in response to the situation where one or more of the one or more marks is designated through the input device, the center of the circumscribed rectangle of the one mark or the entirety of the plurality of marks, Move to the center of the square frame line used in the processing device to be set as a calibration mark, and automatically adjust the position and size of the frame line relative to the circumscribed rectangle to: the circumscribed rectangle falls on the frame line , And the distance between the circumscribed rectangle and the frame line is adjusted to a predetermined distance; and The calibration mark registration unit registers an area including the one mark or the plurality of marks on the inner side of the frame line that has been resized as a calibration mark. Invention effect
在本發明的一個態樣的校準標記之設定方法中,首先,對所拍攝到的1個以上的標記取得構成1個以上的標記的外接矩形之資訊(資訊取得步驟)。並且,在資訊取得步驟之後,操作人員指定1個以上的標記當中的1個或複數個標記。In one aspect of the calibration mark setting method of the present invention, first, information of the circumscribed rectangle constituting one or more marks is acquired for one or more photographed marks (information acquisition step). And, after the information acquisition step, the operator designates one or more marks among the more than one marks.
因應於此操作人員的指定,使1個標記或複數個標記的整體的外接矩形的中心移動至四角形的框線的中心,並將框線相對於外接矩形的位置及大小自動地調整成:外接矩形落在框線內,且外接矩形與框線之間隔被調整為事先決定之距離(框線調整步驟)。In response to the operator’s designation, the center of the entire circumscribed rectangle of a mark or a plurality of marks is moved to the center of the square frame, and the position and size of the frame relative to the circumscribed rectangle are automatically adjusted to: circumscribed The rectangle falls within the frame line, and the interval between the circumscribed rectangle and the frame line is adjusted to a predetermined distance (frame line adjustment step).
之後,將經調整大小之框線的內側中的包含1個標記或複數個標記的區域作為校準標記來登錄於加工裝置(登錄步驟)。因而,可以因應於標記的形狀及大小來自動地在預定的範圍設定校準標記,而非取決於操作人員的感覺之設定。After that, an area containing one mark or a plurality of marks on the inner side of the resized frame line is registered as a calibration mark in the processing device (registration step). Therefore, the calibration mark can be automatically set in a predetermined range according to the shape and size of the mark, rather than a setting that depends on the operator's feeling.
用以實施發明之形態The form used to implement the invention
參照附加圖式,說明本發明的一個態樣之實施形態。圖1是切削裝置(加工裝置)2的立體圖。於圖1分別顯示之X軸方向(加工進給方向)、Y軸方向(分度進給方向)及Z軸方向(鉛直方向、高度方向)互相正交。With reference to the attached drawings, one aspect of the implementation of the present invention will be described. FIG. 1 is a perspective view of a cutting device (processing device) 2. The X-axis direction (processing feed direction), Y-axis direction (indexing feed direction), and Z-axis direction (vertical direction, height direction) shown in Fig. 1 are orthogonal to each other.
再者,在圖1中,將構成要素的一部分以功能方塊圖來顯示。切削裝置2具備支撐各構造之基台4。可在基台4的上方設置覆蓋基台4之罩蓋6。在罩蓋6的內側形成有預定的空間。Furthermore, in FIG. 1, a part of the constituent elements is shown as a functional block diagram. The
在此預定的空間中配置有用於切削(加工)晶圓11的切削單元(加工單元)8。切削單元8可藉由未圖示之Y軸Z軸方向移動機構而在Y軸方向及Z軸方向上移動。A cutting unit (processing unit) 8 for cutting (processing) the
Y軸Z軸方向移動機構具有例如使Y軸移動板(未圖示)沿著Y軸方向移動之滾珠螺桿式的Y軸方向機構(未圖示)、及設置於Y軸移動板且使切削單元8沿著Z軸方向移動之滾珠螺桿式的Z軸方向移動機構(未圖示)。The Y-axis and Z-axis direction moving mechanism includes, for example, a ball screw type Y-axis direction mechanism (not shown) that moves the Y-axis moving plate (not shown) along the Y-axis direction, and is provided on the Y-axis moving plate and makes cutting A ball screw type Z-axis direction moving mechanism (not shown) in which the unit 8 moves along the Z-axis direction.
切削單元8具有將長邊方向配置成和Y軸方向大致平行之角柱狀的主軸殼體。在主軸殼體內以可旋轉的態樣容置有圓柱狀的主軸(未圖示)的一部分。The cutting unit 8 has a spindle housing in which the longitudinal direction is arranged in an angular column shape substantially parallel to the Y-axis direction. A part of a cylindrical spindle (not shown) is rotatably accommodated in the spindle housing.
在主軸的一端部設置有馬達等的旋轉驅動源(未圖示),且在主軸的另一端部裝設有具有圓環狀之切刃的切削刀片。在主軸殼體中的X軸方向的一側的側面固定有相機單元(拍攝單元)10的一部分。A rotary drive source (not shown) such as a motor is provided at one end of the main shaft, and a cutting blade having an annular cutting edge is installed at the other end of the main shaft. A part of the camera unit (photographing unit) 10 is fixed to the side surface on one side in the X-axis direction in the spindle housing.
相機單元10具有LED等之光源(未圖示)、包含聚光透鏡(未圖示)等之光學系統、及CCD(電荷耦合器件,Charge Coupled Device)影像感測器或CMOS(互補式金屬氧化物半導體,Complementary Metal Oxide Semiconductor)影像感測器等之拍攝元件。The
切削單元8的下方設置有用於吸引保持晶圓11之工作夾台12。工作夾台12具有以金屬所形成之大致圓盤狀的框體。在框體形成有由圓盤狀的空間所構成的凹部。A work chuck table 12 for sucking and holding the
在凹部的底面露出有吸引路(未圖示)的一端部,且於吸引路的另一端部連接有真空泵、噴射器(ejector)等之吸引源(未圖示)。於凹部固定有圓盤狀的多孔板。One end of a suction path (not shown) is exposed on the bottom surface of the recess, and a suction source (not shown) such as a vacuum pump or an ejector is connected to the other end of the suction path. A disc-shaped perforated plate is fixed to the recess.
若使吸引源動作,會通過吸引路在多孔板的上表面(保持面12a)產生負壓。在工作夾台12的下方連結有馬達等的旋轉驅動源(未圖示)。If the suction source is operated, a negative pressure is generated on the upper surface (
旋轉驅動源使工作夾台12以繞著大致平行於Z軸方向之預定的旋轉軸的方式旋轉。在旋轉驅動源的下方設置有用於使工作夾台12及旋轉驅動源沿著X軸方向移動之滾珠螺桿式的X軸方向移動機構(未圖示)。The rotation drive source rotates the work chuck table 12 around a predetermined rotation axis substantially parallel to the Z-axis direction. A ball screw type X-axis direction moving mechanism (not shown) for moving the work chuck table 12 and the rotating drive source in the X-axis direction is provided below the rotation drive source.
可在工作夾台12的保持面12a載置圓盤狀的晶圓11等。圖2是晶圓11等的俯視圖。晶圓11以例如矽等的半導體所形成。但是,對晶圓11的材質、形狀、構造、大小等並未限制。A disc-
晶圓11的正面11a被配置排列成格子狀之分割預定線(切割道)13區劃成複數個區域。在各區域形成有IC(積體電路,Integrated Circuit)、LSI(大型積體電路,Large Scale Integration)等之器件15。再者,對於器件15的種類、數量、形狀、構造、大小、配置等也無限制。The
在分割預定線13的附近,形成有具有預定的形狀的複數個標記17(參照圖3)。標記17作為進行晶圓11的校準時之成為基準的校準標記29(參照圖8(B))而被利用。In the vicinity of the planned
標記17以例如藉由蝕刻等去除形成在構成半導體元件之活性區域上的電路層的最表面的一部分之作法來形成。只要以相機單元10拍攝正面11a側,即可取得標記17的圖像。圖3是晶圓11的正面11a側的局部放大圖。The
在圖3中,顯示隔著1條分割預定線13而配置的2個器件15。在圖3所示之1個器件15的分割預定線13的附近,形成有大致L字形狀的標記17a、大致圓形的標記17b、大致正方形的標記17c及大致十字形狀的標記17d。In FIG. 3, two
如圖2所示,在切削前的晶圓11的背面11b側貼附有黏著膠帶(切割膠帶)19,前述黏著膠帶19是以樹脂所形成之圓形的基材層、與設置在基材層的一面之樹脂製的黏著層(糊層)所構成。As shown in Figure 2, an adhesive tape (dicing tape) 19 is attached to the
晶圓11貼附於黏著膠帶19的中央部,且在黏著膠帶19的外周部貼附有金屬製的環狀的框架21。藉此,可形成以框架21透過黏著膠帶19而支撐有晶圓11之晶圓單元23。The
如圖1所示,在切削裝置2之罩蓋6的前表面6a設置有觸控面板14。觸控面板14是例如觸控面板式的液晶顯示器,且兼作為輸入裝置與顯示裝置,前述輸入裝置用於讓操作人員對控制單元16(後述)輸入指示,前述顯示裝置用於顯示以相機單元10所取得的圖像、或各種加工條件等。As shown in FIG. 1, a
再者,亦可取代觸控面板14,而設置僅具有顯示裝置之功能的監視器、顯示器等。但是,在此情況下,會將鍵盤、滑鼠、軌跡球、搖桿(joystick)等之使用者介面作為輸入裝置而另外設置。Furthermore, it is also possible to replace the
在切削裝置2中,設置有用於控制各構成要素的動作之控制單元16。控制單元16會控制例如切削單元8、相機單元10、工作夾台12、觸控面板14、X軸方向移動機構、Y軸Z軸方向移動機構之動作。The
控制單元16藉由電腦來構成,前述電腦包含例如以CPU(中央處理單元,Central Processing Unit)為代表之處理器(pocessor)等的處理裝置、DRAM(動態隨機存取記憶體,Dynamic Random Access Memory)等之主記憶裝置、快閃記憶體、硬碟驅動機、固態硬碟等之輔助記憶裝置。The
在輔助記憶裝置中記憶有包含預定的程式之軟體。可藉由依照此軟體來使處理裝置等動作,而實現控制單元16的功能。圖4是說明控制單元16的構成的圖。The auxiliary memory device stores software containing predetermined programs. The function of the
如圖4所示,控制單元16具備功能方塊,前述功能方塊可對以相機單元10所拍攝到的圖像施行各種處理。功能方塊的1個是資訊取得部16a,資訊取得部16a是對包含1個或複數個標記17之二值化圖像施行已知的標示(labeling)處理。As shown in FIG. 4, the
例如,資訊取得部16a對位於標記17a的邊界線上、與邊界線的內側之各像素賦與標示編號1,並對位於比標記17a的邊界線更外側的各像素賦與標示編號0。如此進行,資訊取得部16a會取得對應於各像素的座標及標示編號之資訊。For example, the
圖5是顯示對1個標記17a之標示處理之一例的圖。在圖5中,為了方便,而以圓圈來表示1個像素。在圖5中,雖然顯示在縱橫方向上以29個×29個像素來構成標記17a之例子,但是構成標記17a之像素的數量並非限定於此例。Fig. 5 is a diagram showing an example of labeling processing for one
資訊取得部16a在各個具有標示編號1的像素當中,特定出縱方向及橫方向的端部的位置。具體來說,資訊取得部16a特定出上端位置YU
及下端位置YD
、與左端位置XL
及右端位置XR
。The
在圖5,為了方便說明,而顯示有對座標加上了標示編號之(X‚Y‚標示編號)。又,在圖5中,代表性地顯示有位於上端之複數個座標(XU ‚YU )當中的2個。同樣地,分別代表性地顯示有位於下端之2個座標(XD ‚YD )、位於左端之2個座標(XL ‚YL )及位於右端之2個座標(XR ‚YR )。In Fig. 5, for the convenience of description, the coordinates are shown with a label number (X‚Y‚ label number). In addition, in FIG. 5, two of the plural coordinates (X U ‚Y U ) located at the upper end are representatively displayed. Similarly, the two coordinates at the lower end (X D ‚Y D ), the two coordinates at the left end (X L ‚Y L ), and the two coordinates at the right end (X R ‚Y R ) are representatively displayed respectively. .
資訊取得部16a會特定出位於1個或複數個標記17的縱方向及橫方向的中心之中心座標(XC
‚YC
)。例如,資訊取得部16a從上端位置YU
及下端位置YD
的平均來計算縱方向的中心位置YC
,並從左端位置XL
及右端位置XR
的平均來計算橫方向的中心位置XC
。 The information acquisition unit 16a specifies the center coordinates (X C ‚Y C ) located at the center of one or
上端位置YU
、下端位置YD
、左端位置XL
、右端位置XR
及中心座標(XC
‚YC
)成為構成標記17的外接矩形25(參照圖6)之資訊。然而,在本實施形態中,雖然為了容易理解,而說明將外接矩形25顯示於觸控面板14的畫面的例子,但外接矩形25亦可不一定顯示於畫面。The upper end position Y U , the lower end position Y D , the left end position X L , the right end position X R and the center coordinate (X C ‚Y C ) become the information of the circumscribed rectangle 25 (refer to FIG. 6) constituting the
如圖6所示,在相機單元10的拍攝區域的中央部,顯示有由十字線、及包圍此十字線的周圍之正方形的外框所構成之四角形的框線27。框線調整部16b(參照圖4)會自動地調整框線27相對於外接矩形25的位置及大小,以使外接矩形25落在框線27內。As shown in FIG. 6, in the center of the imaging area of the
具體而言,框線調整部16b首先使X軸方向移動機構及Y軸Z軸方向移動機構動作,而使相機單元10的拍攝區域移動成:1個標記17的外接矩形25的中心座標(XC
‚YC
)移動至框線27的中心(亦即十字線的交點)。Specifically, the frame
接著,框線調整部16b將相對於外接矩形25之相對的框線27的大小調整成:框線27、及位於框線27內之外接矩形25的間隔成為事先決定之距離。Next, the frame
框線27與外接矩形25之間隔雖然可調整成例如對應於10個像素之距離,但該間隔並非限定於對應於10個像素之距離,亦可設定為任意的距離。經調整大小之框線27為了確認用而顯示於觸控面板14。Although the interval between the
控制單元16具有校準標記登錄部16c(參照圖4)。校準標記登錄部16c將經調整大小之框線27、與存在於框線27的內側中的包含1個或複數個標記17之區域,作為校準標記29(參照圖8(B))來登錄到控制單元16的預定的記憶體區域。如此進行,可將校準標記29設定在切削裝置2。The
本實施形態的控制單元16因應於標記17而自動地調整框線27的位置及大小。藉此,可以不取決於操作人員的感覺,而是因應於標記17的形狀及大小等來自動地在預定的範圍設定校準標記29。The
接著,參照圖4至圖9,說明第1實施形態的校準標記29之設定方法(亦即,進行教導步驟之方法)。在第1實施形態中,是將1個標記17作為校準標記29來登錄。圖9是校準標記29之設定方法的流程圖。Next, referring to FIGS. 4 to 9, the method of setting the
首先,以保持面12a隔著黏著膠帶19來保持晶圓11的背面11b側。然後,操作人員透過相機單元10觀察正面11a側,並拍攝具有作為校準標記29來使用之可能性的1個以上的標記17(拍攝步驟S10)(參照圖4)。First, the
接著,資訊取得部16a取得在拍攝步驟S10中所拍攝到的構成1個以上的標記17的每一個的外接矩形25之資訊(亦即,圖5的上端位置YU
、下端位置YD
、左端位置XL
、右端位置XR
以及中心座標(XC
‚YC
))(資訊取得步驟S20)。Next, the
圖6是顯示各標記17的外接矩形25所顯示的畫面之一例的圖。在圖6中顯示:標記17a的外接矩形25a、標記17b的外接矩形25b、標記17c的外接矩形25c、及標記17d的外接矩形25d。FIG. 6 is a diagram showing an example of a screen displayed by the circumscribed
在第1實施形態中,在資訊取得步驟S20之後,藉由操作人員以手指觸碰其中1個標記17的顯示區域,藉此透過觸控面板14來指定1個標記17。圖7是顯示操作人員指定1個標記17a之情形的圖。再者,在圖7中,為了方便而以圖示(pictogram)來表示操作人員的手指及手。In the first embodiment, after the information acquisition step S20, the operator touches the display area of one of the
框線調整部16b會因應於指定了1個標記17a之情形,使拍攝區域移動,以使外接矩形25a的中心移動至框線27的中心(圖7的虛線箭頭)。並且,框線調整部16b將框線27的大小調整成外接矩形25a與框線27的間隔成為事先決定之距離(框線調整步驟S30)。The frame
圖8(A)是顯示經調整位置及大小之框線27的圖。在圖8(A)中,雖然為了明示標記17a的範圍,且為了方便說明而在標記17a附加有圖樣,但在實際的畫面中並未顯示圖樣。FIG. 8(A) is a diagram showing the
在框線調整步驟S30之後,校準標記登錄部16c將經調整大小之框線27、與存在於框線27的內側之包含標記17a的區域作為校準標記29,並登錄到控制單元16的預定的記憶體區域(登錄步驟S40)。After the frame line adjustment step S30, the calibration
圖8(B)是顯示經過S10至S40而設定於切削裝置2之校準標記29的圖。再者,在圖8(B)中,雖然以明確地形成校準標記29的外周端部為目的,而以虛線來表示對應於框線27的正方形之部分,但在實際的校準標記29上並未顯示此虛線。FIG. 8(B) is a diagram showing the
在本實施形態中,因應於標記17a來自動地調整框線27的位置及大小。藉此,可以不取決於操作人員的感覺,而是因應於標記17a的形狀及大小等而自動地在預定的範圍設定校準標記29。In this embodiment, the position and size of the
其次,說明第2實施形態。在第2實施形態中,是使用切削裝置2來將包含複數個標記17的區域設定為校準標記29。首先,拍攝具有作為校準標記29來使用的可能性之標記17a、17b、17c及17d(拍攝步驟S10)。Next, the second embodiment will be described. In the second embodiment, the
其次,資訊取得部16a取得標記17a、17b、17c及17d的每一個的上端位置YU
、下端位置YD
、左端位置XL
、右端位置XR
及中心座標(XC
‚YC
)(資訊取得步驟S20)。亦即,取得構成4個標記17的每一個的外接矩形25之資訊。Next, the
在第2實施形態中,是在資訊取得步驟S20之後,操作人員以手指觸碰對應於被標記17a、17b、17c及17d所包圍的任意區域之顯示區域。圖10(A)是顯示操作人員指定被複數個標記17所包圍的任意的區域31之情形的圖。In the second embodiment, after the information acquisition step S20, the operator touches the display area corresponding to any area surrounded by the
第2實施形態之資訊取得部16a因應於操作人員的指定,而特定出至少一部分位於以區域31為中心之事先決定的大小的矩形33的範圍內之全部的標記17,並判斷為操作人員指定了該等全部的標記17。In response to the operator’s designation, the
在圖10(A)所示的例子中,由於4個標記17a、17b、17c及17d的各一部分位於矩形33內,因此資訊取得部16a會判斷為操作人員指定了4個標記17a、17b、17c及17d。In the example shown in FIG. 10(A), since parts of the four
在指定了複數個標記17的情況下,資訊取得部16a會取得構成外接於複數個標記17之整體的外接矩形35之資訊。例如,資訊取得部16a從構成4個標記17的每一個的外接矩形25之資訊,取得構成外接於4個標記17之整體的外接矩形35之資訊。When a plurality of
在圖10(A)之例中,資訊取得部16a從標記17a或17b的上端位置YU
、標記17d的下端位置YD
、標記17b的左端位置XL
、及標記17a或17d的右端位置XR
取得外接矩形35的上端位置YU
、下端位置YD
、左端位置XL
及右端位置XR
之資訊。In the example of FIG. 10(A), the
又,資訊取得部16a從外接矩形35的上端位置YU
及下端位置YD
的平均來計算外接矩形35的縱方向的中心位置YC
,並從外接矩形35的左端位置XL
及右端位置XR
的平均來計算外接矩形35的橫方向的中心位置XC
。藉此,取得外接矩形35的中心座標(XC
‚YC
)。Furthermore, the
之後,框線調整部16b會因應於指定了4個標記17之情形,使拍攝區域移動,以使外接矩形35的中心移動至框線27的中心。並且,將框線27的大小調整成:外接矩形35落在框線27內,且外接矩形35與框線27的間隔成為事先決定之距離(框線調整步驟S30)。After that, the frame
圖10(B)是顯示框線調整步驟S30後的框線27的圖。在框線調整步驟S30之後,校準標記登錄部16c將經調整大小之框線27、與存在於框線27的內側之包含標記17a、17b、17c及17d的區域,作為校準標記29來登錄(登錄步驟S40)。FIG. 10(B) is a diagram showing the
在本實施形態中,因應於4個標記17的形狀、大小及配置,而自動地調整框線27的大小。因此,可以不取決於操作人員的感覺,而是因應於複數個標記17的形狀、大小及配置來自動地在預定的範圍設定校準標記29。In this embodiment, the size of the
其次,說明第3實施形態。在第3實施形態中,與第2實施形態同樣地進行拍攝步驟S10及資訊取得步驟S20。但是,在第3實施形態中,是操作人員以手指來觸碰對應於1個標記17的角部的附近之顯示區域,以讓位於矩形33內之標記17成為只有1個。Next, the third embodiment will be described. In the third embodiment, the imaging step S10 and the information obtaining step S20 are performed in the same manner as in the second embodiment. However, in the third embodiment, the operator touches the display area in the vicinity of the corner corresponding to one
圖11(A)是顯示操作人員以手指觸碰與標記17d的右下之角部的附近相對應的顯示區域之情形的圖。如此進行,僅一部分位於以標記17d之右下的區域31為中心之矩形33內之標記17d被操作人員指定。FIG. 11(A) is a diagram showing a state where the operator touches the display area corresponding to the vicinity of the lower right corner of the
因應於操作人員的指定,來移動拍攝區域,以使外接矩形25d的中心移動到框線27的中心,並調整框線27的大小,以使外接矩形25d與框線27的間隔成為事先決定之距離(框線調整步驟S30)。In response to the operator’s designation, move the shooting area so that the center of the circumscribed
圖11(B)是顯示框線調整步驟S30後的框線27的圖。在本實施形態中,可以藉由指定標記17d的顯示區域的附近以讓矩形33包含1個標記17d的一部分來選擇標記17d。又,可以因應於所選擇之標記17d的形狀及大小而自動地在預定的範圍設定校準標記29。FIG. 11(B) is a diagram showing the
另外,上述實施形態之構造、方法等,只要在不脫離本發明之目的之範圍內,均可適當變更而實施。標記17亦可如上述之實施形態地形成在器件15,亦可形成在分割預定線13。又,標記17並不限定為幾何學上的形狀,亦可為文字、數字等。In addition, the structure, method, etc. of the above-mentioned embodiment can be suitably changed and implemented as long as it does not deviate from the purpose of the present invention. The
然而,在上述之實施形態中,雖然說明了切削裝置2的例子來作為加工裝置,但是加工裝置亦可為以雷射光束加工晶圓11之雷射加工裝置(未圖示)。在雷射加工裝置中可配置雷射加工單元來取代切削單元8。雷射加工單元包含用於產生脈衝狀的雷射光束之雷射振盪器、或用於使雷射光束聚光之聚光透鏡等。However, in the above-mentioned embodiment, although the example of the
雷射光束亦可具有穿透晶圓11之波長。在此情況下,為將脈衝狀的雷射光束的聚光點定位在晶圓11的內部,並藉由多光子吸收來加工晶圓11之(所謂的隱形切割)。雷射光束亦可具有可被晶圓11吸收之波長。在此情況下,可藉由脈衝狀的雷射光束來將晶圓11燒蝕加工。The laser beam may also have a wavelength that penetrates the
2:切削裝置
4:基台
6:罩蓋
6a:前表面
8:切削單元
10:相機單元
11:晶圓
11a:正面
11b:背面
12:工作夾台
12a:保持面
13:分割預定線
14:觸控面板
15:器件
16:控制單元
16a:資訊取得部
16b:框線調整部
16c:校準標記登錄部
17,17a,17b,17c,17d:標記
19:黏著膠帶
21:框架
23:晶圓單元
25,25a,25b,25c,25d,35:外接矩形
27:框線
29:校準標記
31:區域
33:矩形
XC
,YC
:中心位置
XL
:左端位置
XR
:右端位置
YU
:上端位置
YD
:下端位置
X,Y,Z:方向
S10:拍攝步驟
S20:資訊取得步驟
S30:框線調整步驟
S40:登錄步驟2: Cutting device 4: Base 6:
圖1是切削裝置的立體圖。 圖2是晶圓等的俯視圖。 圖3是晶圓的正面側的局部放大圖。 圖4是說明控制單元之構成的圖。 圖5是顯示標示(labeling)處理之一例的圖。 圖6是顯示顯示有各標記之外接矩形的畫面之一例的圖。 圖7是顯示操作人員指定標記之情形的圖。 圖8(A)是顯示已調整位置及大小的框線的圖,圖8(B)是顯示校準標記的圖。 圖9是校準標記之設定方法的流程圖。 圖10(A)是顯示操作人員指定被複數個標記所包圍之任意的位置之情形的圖,圖10(B)是顯示框線調整步驟後的框線的圖。 圖11(A)是顯示操作人員以手指觸碰與標記的右下之角部的附近相對應的顯示區域之情形的圖,圖11(B)是顯示框線調整步驟後的框線的圖。Fig. 1 is a perspective view of a cutting device. Fig. 2 is a plan view of a wafer and the like. Fig. 3 is a partial enlarged view of the front side of the wafer. Fig. 4 is a diagram illustrating the structure of a control unit. Fig. 5 is a diagram showing an example of labeling processing. Fig. 6 is a diagram showing an example of a screen on which each mark is displayed outside the rectangle. Fig. 7 is a diagram showing how the operator designates a mark. FIG. 8(A) is a diagram showing the frame line of the adjusted position and size, and FIG. 8(B) is a diagram showing the calibration mark. Fig. 9 is a flowchart of a method for setting calibration flags. Fig. 10(A) is a diagram showing a situation where the operator designates an arbitrary position surrounded by a plurality of marks, and Fig. 10(B) is a diagram showing the frame line after the frame line adjustment step. Fig. 11(A) is a diagram showing a situation where the operator touches the display area corresponding to the vicinity of the lower right corner of the mark with a finger, and Fig. 11(B) is a diagram showing the frame line after the frame line adjustment step .
13:分割預定線13: Divide the planned line
15:器件15: Device
17a,17b,17c,17d:標記17a, 17b, 17c, 17d: mark
25,25a,25b,25c,25d:外接矩形25, 25a, 25b, 25c, 25d: circumscribed rectangle
27:框線27: frame line
Claims (2)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020067834A JP7399576B2 (en) | 2020-04-03 | 2020-04-03 | Alignment mark setting method and processing equipment |
JP2020-067834 | 2020-04-03 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW202139279A true TW202139279A (en) | 2021-10-16 |
Family
ID=77997563
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW110110420A TW202139279A (en) | 2020-04-03 | 2021-03-23 | Setting method of alignment mark and machining apparatus automatically adjusting the range of the designated mark to set the alignment mark |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP7399576B2 (en) |
KR (1) | KR20210124062A (en) |
CN (1) | CN113496933A (en) |
SG (1) | SG10202103473PA (en) |
TW (1) | TW202139279A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114098230A (en) * | 2021-10-26 | 2022-03-01 | 际华三五一三实业有限公司 | Calibration method of automatic marking machine |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2617870B2 (en) | 1993-10-04 | 1997-06-04 | 株式会社ディスコ | Alignment method |
JP6143336B2 (en) | 2013-04-01 | 2017-06-07 | 株式会社ディスコ | Key pattern detection method |
JP6584886B2 (en) | 2015-09-14 | 2019-10-02 | 株式会社ディスコ | Split method |
JP7088771B2 (en) | 2018-07-26 | 2022-06-21 | 株式会社ディスコ | Alignment method |
-
2020
- 2020-04-03 JP JP2020067834A patent/JP7399576B2/en active Active
-
2021
- 2021-03-23 TW TW110110420A patent/TW202139279A/en unknown
- 2021-03-31 CN CN202110347211.2A patent/CN113496933A/en active Pending
- 2021-04-01 KR KR1020210042725A patent/KR20210124062A/en active Search and Examination
- 2021-04-05 SG SG10202103473PA patent/SG10202103473PA/en unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114098230A (en) * | 2021-10-26 | 2022-03-01 | 际华三五一三实业有限公司 | Calibration method of automatic marking machine |
CN114098230B (en) * | 2021-10-26 | 2022-04-15 | 际华三五一三实业有限公司 | Calibration method of automatic marking machine |
Also Published As
Publication number | Publication date |
---|---|
JP7399576B2 (en) | 2023-12-18 |
KR20210124062A (en) | 2021-10-14 |
JP2021163951A (en) | 2021-10-11 |
SG10202103473PA (en) | 2021-11-29 |
CN113496933A (en) | 2021-10-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW202130459A (en) | Processing apparatus | |
KR20210088417A (en) | Machining apparatus | |
TW202139279A (en) | Setting method of alignment mark and machining apparatus automatically adjusting the range of the designated mark to set the alignment mark | |
US11061378B2 (en) | Processing apparatus and method of controlling processing apparatus using a touch-screen displaying an image-captured workpiece | |
JP2016025224A (en) | Processing method of package wafer | |
CN107186366B (en) | Laser processing apparatus | |
TW202123327A (en) | Processing device including a holding workbench, a processing unit, a first shooting unit, a second shooting, a display unit, and a control unit | |
TWI791580B (en) | How to set the alignment pattern | |
TW202238796A (en) | Processing apparatus | |
JP7475781B2 (en) | Processing Equipment | |
JP3439932B2 (en) | Peripheral exposure equipment | |
CN111515915B (en) | Alignment method | |
JP7460272B2 (en) | Processing Equipment | |
US11890711B2 (en) | Processing apparatus | |
JP7450350B2 (en) | cutting equipment | |
US20230410370A1 (en) | Positioning method | |
JP2023006378A (en) | Processing device, and registration method of alignment condition | |
KR20210069583A (en) | Method of adjusting laser machining apparatus | |
JP2024014234A (en) | Angle deviation adjustment method | |
JP2022059155A (en) | Cutting device | |
JP2021034468A (en) | Processing device | |
JP2008014684A (en) | Method of acquiring camera scaling in component placement machine |