TW202122472A - Polyamideimide resin - Google Patents

Polyamideimide resin Download PDF

Info

Publication number
TW202122472A
TW202122472A TW109137423A TW109137423A TW202122472A TW 202122472 A TW202122472 A TW 202122472A TW 109137423 A TW109137423 A TW 109137423A TW 109137423 A TW109137423 A TW 109137423A TW 202122472 A TW202122472 A TW 202122472A
Authority
TW
Taiwan
Prior art keywords
formula
group
optical film
halogen atom
mol
Prior art date
Application number
TW109137423A
Other languages
Chinese (zh)
Inventor
宮本皓史
江川貴将
Original Assignee
日商住友化學股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商住友化學股份有限公司 filed Critical 日商住友化學股份有限公司
Publication of TW202122472A publication Critical patent/TW202122472A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/14Polyamide-imides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/16Polyester-imides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/301Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements flexible foldable or roll-able electronic displays, e.g. thin LCD, OLED
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/40OLEDs integrated with touch screens
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2379/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
    • C08J2379/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2379/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

Provided are: a polyamideimide resin which can provide an optical film having high strength; and said optical film. The polyamideimide resin according to the present invention includes structural units represented by formula (1) and formula (2), and includes a structure, represented by formula (3), as Y in formula (1).

Description

聚醯胺醯亞胺樹脂Polyimide resin

本發明係關於一種聚醯胺醯亞胺樹脂、及包含該聚醯胺醯亞胺樹脂之光學膜。The present invention relates to a polyimide resin and an optical film containing the polyimide resin.

液晶顯示裝置或有機EL(ELectroluminescence,電致發光)顯示裝置等顯示裝置廣泛用於行動電話或智慧型手錶等各種用途。一直以來係使用玻璃作為此種顯示裝置之前面板,但玻璃非常剛直,容易破裂,故難以將其用作例如可撓性顯示裝置之前面板材料。因此,作為替代玻璃之材料,正在研究運用高分子材料。包含高分子材料之前面板容易表現出可撓特性,故可期待將其用於各種用途中。作為具有柔軟性之樹脂,可例舉各種樹脂,其中之一有聚醯亞胺系樹脂。例如,於專利文獻1及專利文獻2中,記載有由聚醯亞胺樹脂或聚醯胺醯亞胺樹脂形成之光學膜。 [先前技術文獻] [專利文獻] Display devices such as liquid crystal display devices or organic EL (ELectroluminescence) display devices are widely used in various applications such as mobile phones and smart watches. Glass has always been used as the front panel of such a display device, but the glass is very rigid and easily broken, so it is difficult to use it as a material for the front panel of a flexible display device, for example. Therefore, as a material to replace glass, the use of polymer materials is being studied. Before the polymer material is included, the panel tends to exhibit flexibility, so it can be expected to be used in various applications. As the resin having flexibility, various resins can be cited, and one of them is a polyimide-based resin. For example, Patent Document 1 and Patent Document 2 describe optical films formed of polyimide resin or polyimide resin. [Prior Technical Literature] [Patent Literature]

[專利文獻1]國際公開第2014/046180號 [專利文獻2]國際公開第2016/152459號[Patent Document 1] International Publication No. 2014/046180 [Patent Document 2] International Publication No. 2016/152459

[發明所欲解決之問題][The problem to be solved by the invention]

對於可撓性顯示裝置之材料等所使用之光學膜,要求具有耐折性等特徵。本發明人等為了提高光學膜之該等所需性能而深入研究後發現,藉由提高光學膜之耐力,能夠獲得耐折性等優異之光學膜。Optical films used in materials such as flexible display devices are required to have features such as folding resistance. The inventors of the present invention conducted intensive studies in order to improve the required performance of the optical film and found that by improving the endurance of the optical film, an optical film with excellent folding resistance and the like can be obtained.

因此,本發明之目的在於提供一種能夠提供具有高耐力之光學膜之聚醯胺醯亞胺樹脂、及該光學膜。 [解決問題之技術手段]Therefore, the object of the present invention is to provide a polyamide imide resin capable of providing an optical film with high durability, and the optical film. [Technical means to solve the problem]

本發明人等為了解決上述問題而努力研究後,完成了本發明。即,本發明提供以下較佳形態。 [1]一種聚醯胺醯亞胺樹脂,其 包含式(1)及式(2): [化1]

Figure 02_image005
[式(1)及式(2)中,X及Z相互獨立地表示2價有機基,Y表示4價有機基,*表示鍵結鍵] 所表示之結構單元,且包含式(3): [化2]
Figure 02_image007
[式(3)中,R1 相互獨立地表示鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基或芳氧基,R2 ~R5 相互獨立地表示氫原子或可具有鹵素原子之1價烴基,m相互獨立地表示0~3之整數,n表示1~4之整數,*表示鍵結鍵,其中,於具有R2 ~R5 之至少1個苯環中,R2 ~R5 之至少1個為可具有鹵素原子之1價烴基] 所表示之結構作為式(1)中之Y。 [2]如上述[1]中記載之聚醯胺醯亞胺樹脂,其包含2價芳香族基、2價脂環族基及2價脂肪族基之至少1種作為式(1)及式(2)中之X。 [3]如上述[1]或[2]中記載之聚醯胺醯亞胺樹脂,其 包含式(4): [化3]
Figure 02_image009
[式(4)中,A表示單鍵、-O-、二苯基亞甲基、可具有鹵素原子之2價烴基、-SO2 -、-S-、-CO-、-PO-、-PO2 -、-N(RA1 )-或-Si(RA2 )2 -,RA1 及RA2 相互獨立地表示氫原子或可具有鹵素原子之烷基,R6 相互獨立地表示鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基或芳氧基,s相互獨立地表示0~4之整數,*表示鍵結鍵] 所表示之結構作為式(1)及式(2)中之X。 [4]如上述[1]至[3]中任一項中記載之聚醯胺醯亞胺樹脂,其 進而包含式(5): [化4]
Figure 02_image011
[式(5)中,B表示單鍵、-O-、二苯基亞甲基、可具有鹵素原子之2價烴基、-SO2 -、-S-、-CO-、-COO-、-PO-、-PO2 -、-N(RB1 )-或-Si(RB2 )2 -,RB1 及RB2 相互獨立地表示氫原子或可具有鹵素原子之烷基,R7 相互獨立地表示鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基或芳氧基,t相互獨立地表示0~3之整數,*表示鍵結鍵] 所表示之結構作為式(1)中之Y。 [5]如上述[1]至[4]中任一項中記載之聚醯胺醯亞胺樹脂,其 包含式(6): [化5]
Figure 02_image013
[式(6)中,W相互獨立地表示單鍵、-O-、二苯基亞甲基、可具有鹵素原子之2價烴基、-SO2 -、-S-、-CO-、-PO-、-PO2 -、-N(RC1 )-或-Si(RC2 )2 -,RC1 及RC2 相互獨立地表示氫原子或可具有鹵素原子之烷基,R8 相互獨立地表示鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基或芳氧基,p相互獨立地表示0~4之整數,q表示0~4之整數,*表示鍵結鍵] 所表示之結構作為式(2)中之Z。 [6]如上述[1]至[5]中任一項中記載之聚醯胺醯亞胺樹脂,其重量平均分子量為100,000以上。 [7]一種光學膜,其包含如上述[1]至[6]中任一項中記載之聚醯胺醯亞胺樹脂。 [8]如上述[7]中記載之光學膜,其黃度未達3.0。 [9]如上述[7]或[8]中記載之光學膜,其全光線透過率為90%以上。 [10]如上述[7]至[9]中任一項中記載之光學膜,其彈性模數為5.0 GPa以上。 [11]如上述[7]至[10]中任一項中記載之光學膜,其係可撓性顯示裝置之前面板用膜。 [12]一種可撓性顯示裝置,其具備如上述[7]至[11]中任一項中記載之光學膜。 [13]如上述[12]中記載之可撓性顯示裝置,其進而具備觸控感測器。 [14]如上述[12]或[13]中記載之可撓性顯示裝置,其進而具備偏光板。 [發明之效果]The inventors of the present invention have completed the present invention after diligent research in order to solve the above-mentioned problems. That is, the present invention provides the following preferred aspects. [1] A polyamide imine resin comprising formula (1) and formula (2): [化1]
Figure 02_image005
[In formula (1) and formula (2), X and Z independently represent a divalent organic group, Y represents a tetravalent organic group, and * represents a bonding bond] The structural unit represented, and includes the formula (3): [化2]
Figure 02_image007
[In formula (3), R 1 independently represents a halogen atom, an alkyl group, an alkoxy group, an aryl group, or an aryloxy group that may have a halogen atom, and R 2 to R 5 independently represent a hydrogen atom or may have a halogen A monovalent hydrocarbon group of atoms, m independently represents an integer from 0 to 3, n represents an integer from 1 to 4, * represents a bonding bond, wherein, in at least one benzene ring having R 2 to R 5 , R 2 At least one of ~R 5 is a monovalent hydrocarbon group which may have a halogen atom] The structure represented by the structure represented is as Y in the formula (1). [2] The polyamideimide resin as described in [1] above, which contains at least one of a divalent aromatic group, a divalent alicyclic group, and a divalent aliphatic group as formula (1) and formula (2) The X in. [3] The polyamide resin as described in [1] or [2] above, which comprises the formula (4): [化3]
Figure 02_image009
[In formula (4), A represents a single bond, -O-, diphenylmethylene, a divalent hydrocarbon group that may have a halogen atom, -SO 2 -, -S-, -CO-, -PO-,- PO 2 -, -N(R A1 )- or -Si(R A2 ) 2 -, R A1 and R A2 independently represent a hydrogen atom or an alkyl group that may have a halogen atom, and R 6 independently represent a halogen atom, An alkyl group, an alkoxy group, an aryl group or an aryloxy group which may have a halogen atom, s independently represents an integer of 0-4, and * represents a bonding bond] The structure represented is as formula (1) and formula (2) Among the X. [4] The polyamide resin as described in any one of [1] to [3] above, which further comprises the formula (5): [化4]
Figure 02_image011
[In formula (5), B represents a single bond, -O-, diphenylmethylene, a divalent hydrocarbon group that may have a halogen atom, -SO 2 -, -S-, -CO-, -COO-,- PO-, -PO 2 -, -N(R B1 )- or -Si(R B2 ) 2 -, R B1 and R B2 independently represent a hydrogen atom or an alkyl group which may have a halogen atom, and R 7 are mutually independent It represents a halogen atom, an alkyl group, an alkoxy group, an aryl group or an aryloxy group which may have a halogen atom, t independently represents an integer of 0 to 3, and * represents a bonding bond] The structure represented is as in formula (1) Of Y. [5] The polyimide resin as described in any one of [1] to [4] above, which comprises the formula (6): [化5]
Figure 02_image013
[In formula (6), W independently represents a single bond, -O-, diphenylmethylene, a divalent hydrocarbon group that may have a halogen atom, -SO 2 -, -S-, -CO-, -PO -, -PO 2 -, -N(R C1 )- or -Si(R C2 ) 2 -, R C1 and R C2 independently represent a hydrogen atom or an alkyl group which may have a halogen atom, and R 8 independently represent each other A halogen atom, an alkyl group, an alkoxy group, an aryl group or an aryloxy group which may have a halogen atom, p independently represents an integer from 0 to 4, q represents an integer from 0 to 4, * represents a bonding bond] The structure is the Z in formula (2). [6] The polyimide resin as described in any one of [1] to [5] above, which has a weight average molecular weight of 100,000 or more. [7] An optical film comprising the polyamide imide resin as described in any one of [1] to [6] above. [8] The optical film as described in [7] above, which has a yellowness of less than 3.0. [9] The optical film as described in [7] or [8] above, which has a total light transmittance of 90% or more. [10] The optical film described in any one of [7] to [9] above, which has an elastic modulus of 5.0 GPa or more. [11] The optical film described in any one of [7] to [10] above, which is a film for a front panel of a flexible display device. [12] A flexible display device including the optical film described in any one of [7] to [11] above. [13] The flexible display device described in [12] above, which further includes a touch sensor. [14] The flexible display device as described in [12] or [13] above, which further includes a polarizing plate. [Effects of Invention]

根據本發明,能夠提供一種能夠提供具有高耐力之光學膜之聚醯胺醯亞胺樹脂、及該光學膜。According to the present invention, it is possible to provide a polyamideimide resin capable of providing an optical film with high durability, and the optical film.

[聚醯胺醯亞胺樹脂] 本發明之聚醯胺醯亞胺樹脂包含式(1)及式(2): [化6]

Figure 02_image015
[式(1)及式(2)中,X及Z相互獨立地表示2價有機基,Y表示4價有機基,*表示鍵結鍵] 所表示之結構單元。[Polyamide imide resin] The polyamide imide resin of the present invention includes formula (1) and formula (2): [化6]
Figure 02_image015
[In formula (1) and formula (2), X and Z independently represent a divalent organic group, Y represents a tetravalent organic group, and * represents a bonding bond].

式(1)中,Y相互獨立地表示4價有機基,較佳為表示碳數4~80之4價有機基,更佳為表示具有環狀結構之碳數4~60之4價有機基。作為環狀結構,可例舉脂環、芳香環、雜環結構。上述有機基係可具有取代基之有機基,該取代基較佳為鹵素原子、可具有鹵素原子之1價烴基(例如,烷基、芳基等)、烷氧基或芳氧基。本發明之一實施方式之聚醯胺醯亞胺樹脂可包含複數種Y,複數種Y可彼此相同,亦可互不相同。 In formula (1), Y independently represents a tetravalent organic group, preferably a tetravalent organic group having 4 to 80 carbons, more preferably a tetravalent organic group having 4 to 60 carbons having a cyclic structure . The cyclic structure may, for example, be an alicyclic, aromatic, or heterocyclic structure. The above-mentioned organic group is an organic group that may have a substituent, and the substituent is preferably a halogen atom, a monovalent hydrocarbon group that may have a halogen atom (for example, an alkyl group, an aryl group, etc.), an alkoxy group, or an aryloxy group. The polyamide imide resin of an embodiment of the present invention may include a plurality of Y, and the plurality of Y may be the same or different from each other.

又,本發明之聚醯胺醯亞胺樹脂至少包含式(3): [化7]

Figure 02_image017
[式(3)中,R1 相互獨立地表示鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基或芳氧基,R2 ~R5 相互獨立地表示氫原子或可具有鹵素原子之1價烴基,m相互獨立地表示0~3之整數,n表示1~4之整數,*表示鍵結鍵,其中,於具有R2 ~R5 之至少1個苯環中,R2 ~R5 之至少1個為可具有鹵素原子之1價烴基] 所表示之結構作為式(1)中之Y。In addition, the polyimide imine resin of the present invention includes at least the formula (3): [化7]
Figure 02_image017
[In formula (3), R 1 independently represents a halogen atom, an alkyl group, an alkoxy group, an aryl group, or an aryloxy group that may have a halogen atom, and R 2 to R 5 independently represent a hydrogen atom or may have a halogen A monovalent hydrocarbon group of atoms, m independently represents an integer from 0 to 3, n represents an integer from 1 to 4, * represents a bonding bond, wherein, in at least one benzene ring having R 2 to R 5 , R 2 At least one of ~R 5 is a monovalent hydrocarbon group which may have a halogen atom] The structure represented by the structure represented is as Y in the formula (1).

本發明人等發現:於在包含式(1)及式(2)所表示之結構單元之聚醯胺醯亞胺樹脂中,式(1)中之Y至少包含式(3)所表示之結構之情形時,包含該聚醯胺醯亞胺樹脂之光學膜之耐力提高。藉由聚醯胺醯亞胺樹脂包含式(3)所表示之結構作為式(1)中之Y而容易提高該光學膜之耐力的原因並不明確,認為其原因在於:式(3)所表示之結構雖然剛直,但具有側鏈,因此為阻礙分子間堆積之結構,藉由包含該結構,聚醯胺醯亞胺樹脂成為高彈性模數並且成為高韌性,進一步提高達到降伏前之應力。又,由於包含此種結構,故本發明之聚醯胺醯亞胺樹脂亦具有優異之光學特性,能夠兼顧高耐力及優異之光學特性。 The inventors of the present invention found that in the polyamide imide resin containing the structural units represented by formula (1) and formula (2), Y in formula (1) includes at least the structure represented by formula (3) In this case, the durability of the optical film containing the polyimide resin is improved. The reason why the polyamide imine resin contains the structure represented by formula (3) as Y in formula (1) is not clear, but it is believed that the reason lies in: formula (3) Although the structure shown is rigid, it has side chains, so it is a structure that hinders intermolecular accumulation. By including this structure, the polyamide imide resin has a high elastic modulus and a high toughness, which further increases the stress before reaching the yield. . In addition, due to the inclusion of such a structure, the polyamideimide resin of the present invention also has excellent optical properties, and can achieve both high endurance and excellent optical properties.

式(3)中,R1 相互獨立地表示鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基或芳氧基。作為鹵素原子,例如可例舉氟原子、氯原子、溴原子、碘原子。作為烷基,例如可例舉甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基、正戊基、2-甲基-丁基、3-甲基丁基、2-乙基-丙基、正己基等。作為烷氧基,例如可例舉甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、第三丁氧基、戊氧基、己氧基、環己氧基等。作為芳基,例如可例舉苯基、甲苯基、二甲苯基、萘基、聯苯基等。作為芳氧基,例如可例舉苯氧基、萘氧基、聯苯氧基等。R1 相互獨立地較佳為表示鹵素原子、可具有鹵素原子的碳數1~6之烷基、碳數1~6之烷氧基、碳數6~12之芳基、或碳數6~12之芳氧基。In the formula (3), R 1 independently represents a halogen atom, an alkyl group, an alkoxy group, an aryl group, or an aryloxy group which may have a halogen atom. As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom are mentioned, for example. As the alkyl group, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, tertiary butyl, n-pentyl, 2-methyl-butyl, 3- Methylbutyl, 2-ethyl-propyl, n-hexyl, etc. As the alkoxy group, for example, a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, an isobutoxy group, a tertiary butoxy group, a pentoxy group, a hexyloxy group, a cyclo Hexyloxy and so on. As an aryl group, a phenyl group, a tolyl group, a xylyl group, a naphthyl group, a biphenyl group etc. are mentioned, for example. As an aryloxy group, a phenoxy group, a naphthoxy group, a biphenoxy group, etc. are mentioned, for example. R 1 independently of each other preferably represents a halogen atom, an alkyl group having 1 to 6 carbons which may have a halogen atom, an alkoxy group having 1 to 6 carbons, an aryl group having 6 to 12 carbons, or a carbon number of 6 to 12 of the aryloxy group.

就容易提高包含聚醯胺醯亞胺樹脂之光學膜(以下,有時簡稱為光學膜)之彈性模數及透明性,且容易提高耐力之觀點而言,式(3)中,m相互獨立地表示0~3之整數,較佳為表示0~2之整數,更佳為表示0或1,進而較佳為表示0。 From the standpoint that it is easy to improve the elastic modulus and transparency of an optical film containing polyimide imide resin (hereinafter, sometimes referred to as optical film), and it is easy to improve endurance, in formula (3), m is independent of each other P represents an integer of 0 to 3, preferably represents an integer of 0 to 2, more preferably represents 0 or 1, and more preferably represents 0.

式(3)中,R2 、R3 、R4 及R5 相互獨立地表示氫原子或可具有鹵素原子之1價烴基。作為1價烴基,可例舉芳香族烴基、脂環族烴基、脂肪族烴基。作為芳香族烴基,例如可例舉苯基、甲苯基、二甲苯基、萘基、聯苯基等芳基等。作為脂環族烴基,可例舉環戊基、環己基等環烷基等。作為脂肪族烴基,例如可例舉甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基、正戊基、2-甲基-丁基、3-甲基丁基、2-乙基-丙基、正己基、正庚基、正辛基、第三辛基、正壬基、正癸基等烷基等。作為鹵素原子,可例舉上文中所記載者。R2 ~R5 相互獨立地較佳為表示氫原子或可具有鹵素原子的碳數6~12之芳基、碳數4~8之環烷基、或碳數1~6之烷基。就容易提高樹脂於溶劑中之溶解性以及光學膜的彈性模數及透明性且容易提高光學膜之耐力之觀點而言,R2 ~R5 相互獨立地較佳為表示氫原子或可具有鹵素原子之烷基,更佳為氫原子或可具有鹵素原子之1~6之烷基,進而較佳為氫原子或可具有鹵素原子之1~3之烷基。In the formula (3), R 2 , R 3 , R 4 and R 5 independently represent a hydrogen atom or a monovalent hydrocarbon group which may have a halogen atom. The monovalent hydrocarbon group may, for example, be an aromatic hydrocarbon group, an alicyclic hydrocarbon group, or an aliphatic hydrocarbon group. As an aromatic hydrocarbon group, aryl groups, such as a phenyl group, a tolyl group, a xylyl group, a naphthyl group, a biphenyl group, etc. are mentioned, for example. As an alicyclic hydrocarbon group, a cycloalkyl group, such as a cyclopentyl group and a cyclohexyl group, etc. are mentioned. As the aliphatic hydrocarbon group, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, second butyl, tertiary butyl, n-pentyl, 2-methyl-butyl, 3 -Alkyl groups such as methylbutyl, 2-ethyl-propyl, n-hexyl, n-heptyl, n-octyl, tertiary octyl, n-nonyl, n-decyl, etc. As the halogen atom, those described above may be mentioned. R 2 to R 5 each independently preferably represent a hydrogen atom or an aryl group having 6 to 12 carbons which may have a halogen atom, a cycloalkyl group having 4 to 8 carbons, or an alkyl group having 1 to 6 carbons. From the viewpoint of easily improving the solubility of the resin in the solvent and the elastic modulus and transparency of the optical film, and easily improving the endurance of the optical film, R 2 to R 5 independently of each other preferably represent a hydrogen atom or may have a halogen The alkyl group of the atom is more preferably a hydrogen atom or an alkyl group of 1 to 6 which may have a halogen atom, and still more preferably a hydrogen atom or an alkyl group of 1 to 3 which may have a halogen atom.

式(3)中,於具有R2 ~R5 之至少1個苯環中,R2 ~R5 之至少1個為可具有鹵素原子之1價烴基。若於式(3)中之具有R2 ~R5 之全部苯環中,R2 ~R5 中之可具有鹵素原子之1價烴基未達1個,則難以充分提高光學膜之耐力,光學特性亦容易降低。式(3)中,就容易提高光學膜之耐力且容易提高光學特性之觀點而言,於具有R2 ~R5 之至少1個苯環中,R2 ~R5 中之較佳為2~4個、更佳為3或4個、進而較佳為3個為可具有鹵素原子之1價烴基。 In formula (3), where R2 ~R5 Of at least one benzene ring, R2 ~R5 At least one of them is a monovalent hydrocarbon group which may have a halogen atom. If there is R in formula (3)2 ~R5 Of all the benzene rings, R2 ~R5 If the number of monovalent hydrocarbon groups that may have halogen atoms is less than one, it is difficult to sufficiently improve the endurance of the optical film, and the optical properties are also liable to decrease. In the formula (3), from the viewpoint of easily improving the endurance of the optical film and easily improving the optical properties, the R2 ~R5 Of at least one benzene ring, R2 ~R5 Among them, preferably 2 to 4, more preferably 3 or 4, and still more preferably 3 are monovalent hydrocarbon groups that may have halogen atoms.

就更容易提高樹脂於溶劑中之溶解性以及光學膜之耐力、斷裂應變、彈性模數及透明性之觀點而言,於n為2以上之情形時,更佳為於具有R2 ~R5 之至少2個苯環中,R2 ~R5 之至少1個為可具有鹵素原子之1價烴基,進而較佳為於具有R2 ~R5 之全部苯環中,R2 ~R5 之至少1個為可具有鹵素原子之1價烴基。From the viewpoint of easier to improve the solubility of the resin in the solvent and the endurance, breaking strain, elastic modulus and transparency of the optical film, when n is 2 or more, it is more preferable to have R 2 ~R 5 Among the at least two benzene rings, at least one of R 2 to R 5 is a monovalent hydrocarbon group that may have a halogen atom, and more preferably in all benzene rings having R 2 to R 5 , R 2 to R 5 At least one is a monovalent hydrocarbon group which may have a halogen atom.

式(3)中,n表示1~4之整數,就容易提高光學膜之耐力、彈性模數及透明性之觀點而言,n較佳為1~3之整數,更佳為2或3,進而較佳為2。再者,式(1)所表示之結構單元可包含1種或複數種式(3)所表示之結構(或基)作為Y。In formula (3), n represents an integer of 1 to 4. From the viewpoint of easily improving the endurance, elastic modulus, and transparency of the optical film, n is preferably an integer of 1 to 3, more preferably 2 or 3. More preferably, it is 2. Furthermore, the structural unit represented by the formula (1) may include one or more structures (or groups) represented by the formula (3) as Y.

於本發明之較佳實施方式中,式(3)由式(3'): [化8]

Figure 02_image019
[式(3')中,*表示鍵結鍵] 表示。即,於本發明之較佳實施方式中,聚醯胺醯亞胺樹脂包含式(3')所表示之結構作為式(1)中之Y。若為此種形態,則容易提高光學膜之耐力、彈性模數及透明性。In the preferred embodiment of the present invention, formula (3) is represented by formula (3'): [化8]
Figure 02_image019
[In formula (3'), * represents a bonding bond] means. That is, in a preferred embodiment of the present invention, the polyimide imine resin includes the structure represented by the formula (3') as Y in the formula (1). In this form, it is easy to improve the endurance, elastic modulus, and transparency of the optical film.

於本發明之一實施方式中,式(1)所表示之結構單元中,Y為式(3)所表示之結構之結構單元的比率相對於式(1)所表示之結構單元之總莫耳量(100莫耳%),較佳為30莫耳%以上,更佳為35莫耳%以上,進而較佳為40莫耳%以上,較佳為100莫耳%以下,更佳為90莫耳%以下,進而較佳為80莫耳%以下,尤佳為70莫耳%以下。若Y由式(3)所表示之結構單元之比率為上述下限值以上,則容易提高光學膜之耐力及彈性模數。又,若為上述上限值以下,則容易提高光學膜之斷裂應變及透明性。Y由式(3)所表示之結構單元之比率例如可使用1 H-NMR進行測定,或亦可根據原料之添加比而算出。 In one embodiment of the present invention, in the structural unit represented by the formula (1), Y is the ratio of the structural unit of the structure represented by the formula (3) to the total mole of the structural unit represented by the formula (1) Amount (100 mol%), preferably 30 mol% or more, more preferably 35 mol% or more, still more preferably 40 mol% or more, preferably 100 mol% or less, more preferably 90 mol% Ear% or less, more preferably 80 mol% or less, and particularly preferably 70 mol% or less. If the ratio of the structural unit represented by the formula (3) of Y is more than the above-mentioned lower limit, the endurance and elastic modulus of the optical film are easily improved. Moreover, if it is below the said upper limit, it will become easy to improve the fracture strain and transparency of an optical film. The ratio of the structural unit represented by the formula (3) can be used, for example1 It can be measured by H-NMR, or it can be calculated based on the addition ratio of the raw materials.

本發明之聚醯胺醯亞胺樹脂亦可進而包含式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(26)、式(27)、式(28)及式(29): [化9]

Figure 02_image021
所表示之結構作為式(1)中之Y。The polyamide imine resin of the present invention may further include formula (20), formula (21), formula (22), formula (23), formula (24), formula (25), formula (26), formula (27), formula (28) and formula (29): [化9]
Figure 02_image021
The structure shown is the Y in formula (1).

式(20)~式(29)中,*表示鍵結鍵,W1 表示單鍵、-O-、二苯基亞甲基、可具有鹵素原子之2價烴基(例如,-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -)、-Ar-、-SO2 -、-S-、-CO-、-PO-、-PO2 -、-N(RW1 )-或-Si(RW2 )2 -、-O-Ar-O-、-Ar-O-Ar-、-Ar-CH2 -Ar-、-Ar-C(CH3 )2 -Ar-或-Ar-SO2 -Ar-。Ar表示可具有氟原子之碳數6~20之伸芳基,作為具體例,可例舉伸苯基。RW1 及RW2 相互獨立地表示氫原子或可具有鹵素原子之烷基。再者,可為式(20)~式(29)所表示之基中之氫原子被取代為甲基、氟基、氯基或三氟甲基而成的基、以及4價之碳數6以下之鏈式烴基。再者,式(20)~式(29)中之環上之氫原子亦可被取代為碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基。作為碳數1~6之烷基、碳數1~6之烷氧基及碳數6~12之芳基,分別可例舉作為式(3)之R1 所例示者。In formulas (20) to (29), * represents a bonding bond, W 1 represents a single bond, -O-, diphenylmethylene, a divalent hydrocarbon group that may have a halogen atom (for example, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -), -Ar-, -SO 2 -, -S-, -CO -, -PO-, -PO 2 -, -N(R W1 )-or -Si(R W2 ) 2 -, -O-Ar-O-, -Ar-O-Ar-, -Ar-CH 2- Ar-, -Ar-C(CH 3 ) 2 -Ar- or -Ar-SO 2 -Ar-. Ar represents an arylene group having 6 to 20 carbon atoms which may have a fluorine atom, and as a specific example, a phenylene group may be mentioned. R W1 and R W2 independently represent a hydrogen atom or an alkyl group which may have a halogen atom. Furthermore, it may be a group in which the hydrogen atom in the group represented by formula (20) to formula (29) is substituted with a methyl group, a fluoro group, a chloro group or a trifluoromethyl group, and a tetravalent carbon number 6 The following chain hydrocarbon groups. Furthermore, the hydrogen atoms on the rings in formulas (20) to (29) can also be substituted with alkyl groups with 1 to 6 carbons, alkoxy groups with 1 to 6 carbons, or aromatics with 6 to 12 carbons. base. As the alkyl group having 1 to 6 carbons, the alkoxy group having 1 to 6 carbons, and the aryl group having 6 to 12 carbons, those exemplified as R 1 of the formula (3) can be exemplified, respectively.

式(20)~式(29)所表示之基之中,就容易提高光學膜之耐力、斷裂應變、彈性模數及透明性之觀點而言,較佳為式(26)、式(28)或式(29)所表示之基,更佳為式(26)所表示之基。又,就容易提高光學膜之耐力、斷裂應變、彈性模數及透明性之觀點而言,W1 較佳為表示單鍵、-O-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -或-C(CF3 )2 -,更佳為表示單鍵、-O-、-CH2 -、-CH(CH3 )-、-C(CH3 )2 -或-C(CF3 )2 -,進而較佳為表示單鍵、-C(CH3 )2 -或-C(CF3 )2 -,進而更佳為表示單鍵或-C(CF3 )2 -,尤佳為表示-C(CF3 )2 -。Among the bases represented by formulas (20) to (29), in terms of easily improving the endurance, breaking strain, elastic modulus, and transparency of the optical film, formulas (26) and (28) are preferred Or the group represented by formula (29), more preferably the group represented by formula (26). In addition, from the viewpoint of easily improving the endurance, breaking strain, elastic modulus, and transparency of the optical film, W 1 preferably represents a single bond, -O-, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -or -C(CF 3 ) 2 -, more preferably represents a single bond, -O-, -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -or -C(CF 3 ) 2 -, more preferably represents a single bond, -C(CH 3 ) 2 -or -C(CF 3 ) 2 -, and more preferably represents a single bond The bond or -C(CF 3 ) 2 -, particularly preferably represents -C(CF 3 ) 2 -.

於本發明之較佳實施方式中,式(26)由式(5): [化10]

Figure 02_image023
[式(5)中,B表示單鍵、-O-、二苯基亞甲基、可具有鹵素原子之2價烴基、-SO2 -、-S-、-CO-、-COO-、-PO-、-PO2 -、-N(RB1 )-或-Si(RB2 )2 -,RB1 及RB2 相互獨立地表示氫原子或可具有鹵素原子之烷基,R7 相互獨立地表示鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基或芳氧基,t相互獨立地表示0~3之整數,*表示鍵結鍵] 表示。若聚醯胺醯亞胺樹脂進而包含式(5)所表示之結構作為式(1)中之Y,則容易提高樹脂於溶劑中之溶解性、以及光學膜之耐力及透明性。In the preferred embodiment of the present invention, the formula (26) is derived from the formula (5): [化10]
Figure 02_image023
[In formula (5), B represents a single bond, -O-, diphenylmethylene, a divalent hydrocarbon group that may have a halogen atom, -SO 2 -, -S-, -CO-, -COO-,- PO-, -PO 2 -, -N(R B1 )- or -Si(R B2 ) 2 -, R B1 and R B2 independently represent a hydrogen atom or an alkyl group which may have a halogen atom, and R 7 are mutually independent It represents a halogen atom, an alkyl group, an alkoxy group, an aryl group or an aryloxy group which may have a halogen atom, t represents an integer of 0 to 3 independently of each other, and * represents a bonding bond] represents. If the polyimide imine resin further contains the structure represented by formula (5) as Y in formula (1), it is easy to improve the solubility of the resin in a solvent, and the durability and transparency of the optical film.

式(5)中,R7 相互獨立地表示鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基或芳氧基。作為鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基及芳氧基,分別可例舉上文中作為式(3)之R1 所例示者。就容易提高光學膜之斷裂應變、彈性模數及透明性之觀點而言,R7 相互獨立地較佳為可具有鹵素原子之碳數1~6之烷基,更佳為可具有鹵素原子之碳數1~3之烷基。 In formula (5), R7 Each independently represents a halogen atom, an alkyl group, an alkoxy group, an aryl group, or an aryloxy group which may have a halogen atom. As a halogen atom, an alkyl group, an alkoxy group, an aryl group and an aryloxy group which may have a halogen atom, respectively, the R in the formula (3) mentioned above can be exemplified1 Exemplified. From the viewpoint of easily improving the fracture strain, elastic modulus and transparency of the optical film, R7 Independently from each other, an alkyl group having 1 to 6 carbon atoms which may have a halogen atom is preferable, and an alkyl group having 1 to 3 carbon atoms which may have a halogen atom is more preferable.

式(5)中,t相互獨立地表示0~3之整數,就容易提高光學膜之斷裂應變、彈性模數及透明性之觀點而言,較佳為表示0~2之整數,更佳為表示0或1,進而較佳為0。In formula (5), t represents an integer of 0 to 3 independently of each other. From the viewpoint of easily improving the fracture strain, elastic modulus, and transparency of the optical film, it preferably represents an integer of 0 to 2, more preferably It represents 0 or 1, more preferably 0.

式(5)中,B相互獨立地表示單鍵、-O-、二苯基亞甲基、可具有鹵素原子之2價烴基、-SO2 -、-S-、-CO-、-COO-、-PO-、-PO2 -、-N(RB1 )-或-Si(RB2 )2 -,RB1 及RB2 相互獨立地表示氫原子或可具有鹵素原子之烷基。In formula (5), B independently represents a single bond, -O-, diphenylmethylene, a divalent hydrocarbon group that may have a halogen atom, -SO 2 -, -S-, -CO-, -COO- , -PO-, -PO 2 -, -N(R B1 )- or -Si(R B2 ) 2 -, RB1 and RB2 independently represent a hydrogen atom or an alkyl group which may have a halogen atom.

作為可具有鹵素原子之2價烴基,可例舉自式(3)中之R2 ~R5 中之可具有鹵素原子之1價烴基中,進而去除1個氫原子而成的2價基。關於可具有鹵素原子之2價烴基,亦可使該基所含之氫原子中之2個氫原子被取代而形成環,即,上述2個氫原子被取代為鍵結鍵,上述2個鍵結鍵連結而形成環,作為該環,例如可例舉碳數3~12之環烷烴環等。又,作為式(5)中之B所含的-N(RB1 )-及-Si(RB2 )2 -中之RB1 及RB2 中的可具有鹵素原子之烷基,可例舉上文中作為式(3)中之R1 中的可具有鹵素原子之烷基所例示者。As the divalent hydrocarbon group which may have a halogen atom, among the monovalent hydrocarbon groups which may have a halogen atom among R 2 to R 5 in the formula (3), a divalent group obtained by further removing one hydrogen atom can be mentioned. Regarding a divalent hydrocarbon group that may have a halogen atom, two hydrogen atoms of the hydrogen atoms contained in the group may be substituted to form a ring, that is, the above two hydrogen atoms are substituted into bonding bonds, and the above two bonds A ring is formed by linking together, and as this ring, a C3-12 cycloalkane ring etc. are mentioned, for example. In addition, as the alkyl group which may have a halogen atom in R B1 and R B2 in -N(R B1 )- and -Si(R B2 ) 2 -contained in B in formula (5), the above can be exemplified Here, the alkyl group which may have a halogen atom in R 1 in formula (3) is exemplified.

式(5)中,就容易提高光學膜之透明性、彈性模數及耐彎曲性之觀點而言,B較佳為表示單鍵或可具有鹵素原子之2價烴基,更佳為表示單鍵、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -或-C(CF3 )2 -,進而較佳為表示單鍵、-C(CH3 )2 -或-C(CF3 )2 -,進而更佳為表示單鍵或-C(CF3 )2 -,尤佳為表示-C(CF3 )2 -。In formula (5), from the viewpoint of easily improving the transparency, elastic modulus, and bending resistance of the optical film, B preferably represents a single bond or a divalent hydrocarbon group that may have a halogen atom, and more preferably represents a single bond , -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -or -C(CF 3 ) 2 -, and more preferably represent a single bond, -C (CH 3 ) 2 -or -C(CF 3 ) 2 -, more preferably represents a single bond or -C(CF 3 ) 2 -, particularly preferably represents -C(CF 3 ) 2 -.

於本發明之較佳實施方式中,式(5)由式(5'): [化11]

Figure 02_image025
[式(5')中,*表示鍵結鍵] 表示。即,聚醯胺醯亞胺樹脂較佳為包含式(5')所表示之結構作為式(1)中之Y。若為此種形態,則容易提高光學膜之透明性、彈性模數及耐彎曲性。In a preferred embodiment of the present invention, formula (5) is represented by formula (5'): [化11]
Figure 02_image025
[In formula (5'), * represents a bonding bond] means. That is, the polyimide resin preferably includes the structure represented by the formula (5′) as Y in the formula (1). In this form, it is easy to improve the transparency, elastic modulus, and bending resistance of the optical film.

於聚醯胺醯亞胺樹脂包含式(1)中之Y由式(5)所表示之結構單元之情形時,式(1)所表示之結構單元中,式(1)中之Y為式(5)所表示之結構之結構單元的比率相對於式(1)所表示之結構單元之總莫耳量(100莫耳%),較佳為30莫耳%以上,更佳為35莫耳%以上,進而較佳為40莫耳%以上,較佳為90莫耳%以下,更佳為80莫耳%以下,進而較佳為70莫耳%以下。若Y由式(5)所表示之結構單元之比率為上述下限值以上,則容易提高樹脂於溶劑中之溶解性及光學膜之透明性。又,若為上述上限值以下,則容易提高光學膜之彈性模數,且容易提高光學膜之耐力。再者,式(1)中之Y由式(5)所表示之結構單元之比率例如可使用1 H-NMR進行測定,或亦可根據原料之添加比而算出。 When the polyamide imine resin contains the structural unit represented by formula (5) in Y in formula (1), in the structural unit represented by formula (1), Y in formula (1) is the formula (5) The ratio of the structural unit of the structure represented by the formula (1) to the total molar amount (100 mol%) of the structural unit represented by the formula (1) is preferably 30 mol% or more, more preferably 35 mol% % Or more, more preferably 40 mol% or more, preferably 90 mol% or less, more preferably 80 mol% or less, and still more preferably 70 mol% or less. If the ratio of the structural unit represented by the formula (5) of Y is more than the above lower limit, it is easy to improve the solubility of the resin in the solvent and the transparency of the optical film. In addition, if it is less than the above upper limit, the elastic modulus of the optical film is easily increased, and the endurance of the optical film is easily increased. Furthermore, the ratio of Y in formula (1) to the structural unit represented by formula (5) can be used, for example1 It can be measured by H-NMR, or it can be calculated based on the addition ratio of the raw materials.

於本發明之一實施方式中,於包含式(1)中之Y由式(5)所表示之結構單元之情形時,Y由式(3)所表示之結構單元與Y由式(5)所表示之結構單元的合計比率相對於式(1)所表示之結構單元之總莫耳量,較佳為50莫耳%以上,更佳為70莫耳%以上,進而較佳為90莫耳%以上,較佳為100莫耳%以下。若該合計比率處於上述範圍內,則容易提高光學膜之耐力、斷裂應變、彈性模數及透明性。再者,該合計比率例如可使用1 H-NMR進行測定,或亦可根據原料之添加比而算出。 In one embodiment of the present invention, when the structural unit represented by formula (5) in Y in formula (1) is included, the structural unit represented by formula (3) and Y are represented by formula (5) The total ratio of the structural units represented relative to the total molar amount of the structural units represented by formula (1) is preferably 50 mol% or more, more preferably 70 mol% or more, and still more preferably 90 mol% % Or more, preferably 100 mol% or less. If the total ratio is within the above range, it is easy to improve the endurance, breaking strain, elastic modulus, and transparency of the optical film. Furthermore, the total ratio can be used, for example1 It can be measured by H-NMR, or it can be calculated based on the addition ratio of the raw materials.

式(1)中,X表示2價有機基,較佳為表示碳數4~40之2價有機基。In formula (1), X represents a divalent organic group, and preferably represents a divalent organic group having 4 to 40 carbon atoms.

關於本發明之聚醯胺醯亞胺樹脂,就容易提高光學膜之耐力、斷裂應變、彈性模數及透明性之觀點而言,式(1)中,X較佳為包含2價芳香族基、2價脂環族基及2價脂肪族基之至少1種,更佳為包含2價芳香族基。作為2價芳香族基,例如可例舉:上文中作為式(3)中之R2 ~R5 所例示之1價芳香族烴基中的氫原子中之1個氫原子被取代為鍵結鍵而成之2價芳香族烴基;使該2價芳香族烴基中之至少1個以上經由連結基、例如下述V1 等連結基鍵結而成之基。作為2價脂環族基,例如可例舉:上文中作為式(3)中之R2 ~R5 所例示之1價脂環族烴基中的氫原子中之1個氫原子被取代為鍵結鍵而成之2價脂環族烴基;使該2價脂環族烴基中之至少1個以上經由連結基、例如下述V1 等連結基鍵結而成之基。作為2價脂肪族基,例如可例舉:上文中作為式(3)中之R2 ~R5 所例示之1價脂肪族烴基中的氫原子中之1個氫原子被取代為鍵結鍵而成之2價脂肪族烴基;使該2價脂肪族烴基中之至少1個以上經由連結基、例如下述V1 等連結基鍵結而成之基。Regarding the polyamide imide resin of the present invention, from the viewpoint of easily improving the endurance, breaking strain, elastic modulus, and transparency of the optical film, in formula (1), X preferably contains a divalent aromatic group , At least one of a divalent alicyclic group and a divalent aliphatic group, and more preferably contains a divalent aromatic group. As the divalent aromatic group, for example, one of the hydrogen atoms in the monovalent aromatic hydrocarbon group exemplified above as R 2 to R 5 in formula (3) is substituted with a bonding bond from the divalent aromatic hydrocarbon group; the divalent aromatic hydrocarbon group is at least one or more via the linking group, for example below V 1 and the like of the linking group formed by bonding group. As the divalent alicyclic group, for example, one of the hydrogen atoms in the monovalent alicyclic hydrocarbon group exemplified above as R 2 to R 5 in formula (3) is substituted as a bond bonded to each junction of divalent alicyclic hydrocarbon group; the divalent alicyclic hydrocarbon group of at least one or more via the linking group, for example below V 1 and the like of the linking group formed by bonding group. As the divalent aliphatic group, for example, one of the hydrogen atoms in the monovalent aliphatic hydrocarbon group exemplified above as R 2 to R 5 in formula (3) is substituted with a bonding bond from the divalent aliphatic hydrocarbon group; the divalent aliphatic hydrocarbon group of at least one or more via the linking group, for example below V 1 and the like of the linking group formed by bonding group.

式(1)中,X較佳為表示具有環狀結構(脂環、芳香環、雜環結構等)之碳數4~40之2價有機基,更佳為表示碳數4~40之2價芳香族基及碳數4~40之2價脂環族基,進而較佳為表示碳數4~40之2價芳香族基。關於該有機基,有機基中之氫原子亦可被取代為烴基或經氟取代之烴基,於該情形時,烴基及經氟取代之烴基之碳數較佳為1~8。於本發明之一實施方式中,本發明之聚醯胺醯亞胺樹脂可包含複數種X,複數種X可彼此相同,亦可互不相同。作為X,可例示:式(10)、式(11)、式(12)、式(13)、式(14)、式(15)、式(16)、式(17)及式(18)所表示之基;上述式(10)~式(18)所表示之基中之氫原子被取代為甲基、氟基、氯基或三氟甲基而成之基。In formula (1), X preferably represents a divalent organic group having a cyclic structure (alicyclic, aromatic, heterocyclic structure, etc.) having 4 to 40 carbons, and more preferably represents 2 of 4 to 40 carbons. The valence aromatic group and the divalent alicyclic group having 4 to 40 carbon atoms more preferably represent the divalent aromatic group having 4 to 40 carbon atoms. Regarding the organic group, the hydrogen atom in the organic group may be substituted with a hydrocarbyl group or a hydrocarbyl group substituted with fluorine. In this case, the carbon number of the hydrocarbyl group and the hydrocarbyl group substituted with fluorine is preferably 1-8. In one embodiment of the present invention, the polyamideimide resin of the present invention may include multiple types of X, and the multiple types of X may be the same or different from each other. Examples of X include: formula (10), formula (11), formula (12), formula (13), formula (14), formula (15), formula (16), formula (17), and formula (18) The group represented: The hydrogen atom in the group represented by the above formula (10) to formula (18) is substituted with a methyl group, a fluoro group, a chloro group or a trifluoromethyl group.

[化12]

Figure 02_image027
再者,式(10)~式(18)中之環上之氫原子亦可被取代為碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基。作為碳數1~6之烷基、碳數1~6之烷氧基及碳數6~12之芳基,分別可例舉上文中作為式(3)之R1 所例示者。[化12]
Figure 02_image027
Furthermore, the hydrogen atoms on the rings in formulas (10) to (18) can also be substituted with alkyl groups with 1 to 6 carbons, alkoxy groups with 1 to 6 carbons, or aromatics with 6 to 12 carbons. base. As the alkyl group having 1 to 6 carbons, the alkoxy group having 1 to 6 carbons, and the aryl group having 6 to 12 carbons, those exemplified above as R 1 of the formula (3) can be exemplified, respectively.

式(10)~式(18)中,*表示鍵結鍵,V1 、V2 及V3 相互獨立地表示單鍵、-O-、-S-、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -、-CO-或-N(Q)-。此處,Q表示可具有鹵素原子之碳數1~12之1價烴基。 作為可具有鹵素原子之碳數1~12之1價烴基,可例舉上文中作為式(3)之R2 ~R5 中之可具有鹵素原子之1價烴基所例示者。 作為一例,V1 及V3 為單鍵、-O-或-S-,且V2 為-CH2 -、-C(CH3 )2 -、-C(CF3 )2 -或-SO2 -。V1 及V2 相對於各環之鍵結位置、以及V2 及V3 相對於各環之鍵結位置相互獨立,相對於各環較佳為間位或對位,更佳為對位。In formulas (10) to (18), * represents a bonding bond, and V 1 , V 2 and V 3 independently represent a single bond, -O-, -S-, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -, -SO 2 -, -CO- or -N(Q)-. Here, Q represents a monovalent hydrocarbon group having 1 to 12 carbon atoms which may have a halogen atom. Examples of the monovalent hydrocarbon group having 1 to 12 carbon atoms that may have a halogen atom include those exemplified above as the monovalent hydrocarbon group that may have a halogen atom among R 2 to R 5 in formula (3). As an example, V 1 and V 3 are single bonds, -O- or -S-, and V 2 is -CH 2 -, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -or -SO 2 -. The bonding positions of V 1 and V 2 with respect to each ring and the bonding positions of V 2 and V 3 with respect to each ring are independent of each other, and are preferably meta-position or para-position with respect to each ring, more preferably para-position.

於本發明之較佳實施方式中,本發明之聚醯胺醯亞胺樹脂可包含式(4): [化13]

Figure 02_image029
[式(4)中,A表示單鍵、-O-、二苯基亞甲基、可具有鹵素原子之2價烴基、-SO2 -、-S-、-CO-、-PO-、-PO2 -、-N(RA1 )-或-Si(RA2 )2 -,RA1 及RA2 相互獨立地表示氫原子或可具有鹵素原子之烷基,R6 相互獨立地表示鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基或芳氧基,s相互獨立地表示0~4之整數,*表示鍵結鍵] 所表示之結構作為式(1)中之X。若為此種形態,則容易提高光學膜之耐力、斷裂應變、彈性模數及透明性。又,式(1)所表示之結構單元亦可包含1種或複數種式(4)所表示之基作為X。 In a preferred embodiment of the present invention, the polyamide imide resin of the present invention may comprise formula (4): [化 13]
Figure 02_image029
[In formula (4), A represents a single bond, -O-, diphenylmethylene, a divalent hydrocarbon group that may have a halogen atom, -SO 2 -, -S-, -CO-, -PO-,- PO 2 -, -N(R A1 )- or -Si(R A2 ) 2 -, R A1 and R A2 independently represent a hydrogen atom or an alkyl group that may have a halogen atom, and R 6 independently represent a halogen atom, An alkyl group, an alkoxy group, an aryl group or an aryloxy group which may have a halogen atom, s each independently represents an integer of 0 to 4, and * represents a bonding bond] The structure represented is used as X in formula (1). In such a form, it is easy to improve the endurance, breaking strain, elastic modulus, and transparency of the optical film. In addition, the structural unit represented by formula (1) may include one or more types of groups represented by formula (4) as X.

式(4)中,R6 相互獨立地表示鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基或芳氧基。作為鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基及芳氧基,分別可例舉上文中作為式(3)之R1 所例示者。In formula (4), R 6 independently represents a halogen atom, an alkyl group, an alkoxy group, an aryl group, or an aryloxy group which may have a halogen atom. As a halogen atom, the alkyl group, an alkoxy group, an aryl group, and an aryloxy group which may have a halogen atom, what was exemplified above as R 1 of formula (3) can be mentioned, respectively.

該等之中,就容易提高光學膜之耐力、斷裂應變、彈性模數及透明性之觀點而言,R6 相互獨立地較佳為碳數1~6之烷基或碳數1~6之鹵化烷基,更佳為碳數1~6之烷基或碳數1~6之氟代烷基(較佳為全氟烷基),更佳為甲基、氯基或三氟甲基。s相互獨立地表示0~4之整數,就容易提高光學膜之耐力、斷裂應變、彈性模數及透明性之觀點而言,較佳為1~3之整數,更佳為1或2,進而較佳為1。 於本發明之較佳實施方式中,於各苯環中,s為1,R6 於以-A-為基準之鄰位上進行取代,且R6 可為甲基、氟基、氯基或三氟甲基。 Among them, from the viewpoint of easily improving the endurance, breaking strain, elastic modulus, and transparency of the optical film, R 6 is preferably an alkyl group having 1 to 6 carbons or an alkyl group having 1 to 6 carbons independently of each other. The halogenated alkyl group is more preferably an alkyl group having 1 to 6 carbons or a fluoroalkyl group having 1 to 6 carbons (preferably a perfluoroalkyl group), and more preferably a methyl group, a chloro group or a trifluoromethyl group. s represents an integer from 0 to 4 independently of each other. From the viewpoint of easily improving the endurance, breaking strain, elastic modulus, and transparency of the optical film, it is preferably an integer of 1 to 3, more preferably 1 or 2, and further Preferably it is 1. In a preferred embodiment of the present invention, in each benzene ring, s is 1, R 6 is substituted at the ortho position on the basis of -A-, and R 6 can be methyl, fluoro, chloro or Trifluoromethyl.

式(4)中,就容易提高光學膜之耐力、斷裂應變、彈性模數及透明性之觀點而言,鍵結鍵之位置相互獨立,以-A-為基準,較佳為間位或對位,更佳為對位。In formula (4), from the viewpoint of easily improving the endurance, breaking strain, elastic modulus, and transparency of the optical film, the positions of the bonding bonds are independent of each other, based on -A-, preferably meta or opposite Position, more preferably counterpoint.

式(4)中,A表示單鍵、-O-、二苯基亞甲基、可具有鹵素原子之2價烴基、-SO2 -、-S-、-CO-、-PO-、-PO2 -、-N(RA1 )-或-Si(RA2 )2 -,RA1 及RA2 相互獨立地表示氫原子或可具有鹵素原子之烷基。In formula (4), A represents a single bond, -O-, diphenylmethylene, a divalent hydrocarbon group that may have a halogen atom, -SO 2 -, -S-, -CO-, -PO-, -PO 2 -, -N(R A1 )- or -Si(R A2 ) 2 -, R A1 and R A2 independently represent a hydrogen atom or an alkyl group which may have a halogen atom.

作為可具有鹵素原子之2價烴基,可例舉自式(3)之R2 ~R5 中之可具有鹵素原子之1價烴基中,進而去除1個氫原子而成的2價基。關於可具有鹵素原子之2價烴基,亦可使該基所含之氫原子中之2個氫原子被取代而形成環,即,上述2個氫原子被取代為鍵結鍵,上述2個鍵結鍵連結而形成環,作為該環,例如可例舉碳數3~12之環烷烴環等。又,作為式(4)中之A所含之-N(RA1 )-及-Si(RA2 )2 -之RA1 及RA2 中的可具有鹵素原子之烷基,可例舉上文中作為式(3)中之R1 中的可具有鹵素原子之烷基所例示者。As the divalent hydrocarbon group which may have a halogen atom, among the monovalent hydrocarbon groups which may have a halogen atom among R 2 to R 5 in the formula (3), a divalent group obtained by further removing one hydrogen atom can be mentioned. Regarding a divalent hydrocarbon group that may have a halogen atom, two hydrogen atoms of the hydrogen atoms contained in the group may be substituted to form a ring, that is, the above two hydrogen atoms are substituted into bonding bonds, and the above two bonds A ring is formed by linking together, and as this ring, a C3-12 cycloalkane ring etc. are mentioned, for example. In addition, as the alkyl groups that may have halogen atoms in R A1 and R A2 of -N(R A1 )- and -Si(R A2 ) 2 -contained in A in formula (4), the above can be exemplified The alkyl group which may have a halogen atom in R 1 in formula (3) is exemplified.

式(4)中,就容易提高光學膜之耐力、斷裂應變、彈性模數及透明性之觀點而言,A較佳為表示單鍵、-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -或-C(CF3 )2 -,更佳為表示單鍵、-C(CH3 )2 -或-C(CF3 )2 -,進而較佳為表示單鍵或-C(CF3 )2 -,尤佳為表示單鍵。In formula (4), from the viewpoint of easily improving the endurance, breaking strain, elastic modulus, and transparency of the optical film, A preferably represents a single bond, -CH 2 -, -CH 2 -CH 2 -,- CH(CH 3 )-, -C(CH 3 ) 2 -or -C(CF 3 ) 2 -, more preferably represents a single bond, -C(CH 3 ) 2 -or -C(CF 3 ) 2 -, More preferably, it represents a single bond or -C(CF 3 ) 2 -, and particularly preferably represents a single bond.

於本發明之較佳實施方式中,就容易提高光學膜之耐力、斷裂應變、彈性模數及透明性之觀點而言,式(4)中,R6 相互獨立地表示碳數1~6之鹵化烷基,s表示1或2,A表示單鍵、-C(CH3 )2 -或-C(CF3 )2 -。 In a preferred embodiment of the present invention, from the viewpoint of easily improving the endurance, breaking strain, elastic modulus, and transparency of the optical film, in formula (4), R6 Each independently represents a halogenated alkyl group with carbon number 1 to 6, s represents 1 or 2, A represents a single bond, -C(CH3 )2 -Or-C(CF3 )2 -.

本發明之較佳形態中,式(4)由式(4'): [化14]

Figure 02_image031
所表示。即,就容易提高光學膜之耐力、斷裂應變、彈性模數及透明性之觀點而言,聚醯胺醯亞胺樹脂較佳為包含式(4')所表示之結構作為式(1)中之X。 In the preferred form of the present invention, formula (4) is represented by formula (4'): [化14]
Figure 02_image031
Represented. That is, from the viewpoint of easily improving the endurance, breaking strain, elastic modulus, and transparency of the optical film, the polyimide imide resin preferably includes the structure represented by the formula (4') as the formula (1) Of X.

式(1)所表示之結構單元中,式(1)中之X為式(4)所表示之結構之結構單元的比率相對於式(1)所表示之結構單元之總莫耳量(100莫耳%),較佳為50莫耳%以上,更佳為70莫耳%以上,進而較佳為80莫耳%以上,較佳為100莫耳%以下。若X由式(4)所表示之結構單元之比率為上述下限值以上,則容易提高光學膜之透明性。又,若為上述上限值以下,則容易提高光學膜之耐力。再者,式(1)中之X由式(4)所表示之結構單元之比率例如可使用1 H-NMR進行測定,或亦可根據原料之添加比而算出。In the structural unit represented by the formula (1), X in the formula (1) is the ratio of the structural unit of the structure represented by the formula (4) to the total molar amount of the structural unit represented by the formula (1) (100 Mol%), preferably 50 mol% or more, more preferably 70 mol% or more, still more preferably 80 mol% or more, and preferably 100 mol% or less. If the ratio of the structural unit represented by X by the formula (4) is more than the above lower limit, the transparency of the optical film is easily improved. Moreover, if it is below the said upper limit, it will become easy to improve the durability of an optical film. Furthermore, the ratio of the structural units represented by the formula (4) for X in the formula (1) can be measured using 1 H-NMR, or can also be calculated based on the addition ratio of the raw materials.

式(2)中,Z表示2價有機基,較佳為表示亦可具有碳數1~8之烴基或經氟取代之碳數1~8之烴基的碳數4~40之2價有機基,更佳為表示亦可具有碳數1~8之烴基或經氟取代之碳數1~8之烴基的具有環狀結構之碳數4~40之2價有機基。作為環狀結構,可例舉脂環、芳香環、雜環結構。作為具有脂環及芳香環之2價有機基,可例舉:式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(26)、式(27)、式(28)及式(29): [化15]

Figure 02_image033
[式(20)~式(29)中,W1 表示單鍵、-O-、二苯基亞甲基、可具有鹵素原子之2價烴基(例如,-CH2 -、-CH2 -CH2 -、-CH(CH3 )-、-C(CH3 )2 -、-C(CF3 )2 -)、-Ar-、-SO2 -、-S-、-CO-、-PO-、-PO2 -、-N(RW1 )-或-Si(RW2 )2 -、-O-Ar-O-、-Ar-O-Ar-、-Ar-CH2 -Ar-、-Ar-C(CH3 )2 -Ar-或-Ar-SO2 -Ar-,此處,Ar相互獨立地表示可具有氟原子之碳數6~20之伸芳基(例如,伸苯基),RW1 及RW2 相互獨立地表示氫原子或可具有鹵素原子之烷基,*表示鍵結鍵] 所表示之基之鍵結鍵中的不相鄰之2個鍵結鍵被取代為氫原子而成之基;及碳數6以下之2價鏈式烴基。作為具有雜環結構之2價有機基,可例舉具有噻吩環骨架之基。就容易抑制光學膜之黃度(以下,有時記作YI值)之觀點而言,較佳為:式(20)~式(29)所表示之基之鍵結鍵中的不相鄰之2個鍵結鍵被取代為氫原子而成之基;及具有噻吩環骨架之基。In formula (2), Z represents a divalent organic group, and preferably represents a divalent organic group with 4 to 40 carbons that may also have a hydrocarbon group with 1 to 8 carbons or a hydrocarbon group with 1 to 8 carbons substituted by fluorine More preferably, it represents a divalent organic group with 4 to 40 carbons and a cyclic structure that may have a hydrocarbon group with 1 to 8 carbons or a hydrocarbon group with 1 to 8 carbons substituted by fluorine. The cyclic structure may, for example, be an alicyclic, aromatic, or heterocyclic structure. As a divalent organic group having an alicyclic ring and an aromatic ring, for example: formula (20), formula (21), formula (22), formula (23), formula (24), formula (25), formula (26) ), formula (27), formula (28) and formula (29): [化15]
Figure 02_image033
[In formulas (20) to (29), W 1 represents a single bond, -O-, diphenylmethylene, or a divalent hydrocarbon group that may have a halogen atom (for example, -CH 2 -, -CH 2 -CH 2 -, -CH(CH 3 )-, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -), -Ar-, -SO 2 -, -S-, -CO-, -PO- , -PO 2 -, -N(R W1 )-or -Si(R W2 ) 2 -, -O-Ar-O-, -Ar-O-Ar-, -Ar-CH 2 -Ar-, -Ar -C(CH 3 ) 2 -Ar- or -Ar-SO 2 -Ar-, where Ar represents independently of each other an arylene group having 6 to 20 carbon atoms (for example, a phenylene group) which may have a fluorine atom, R W1 and R W2 independently represent a hydrogen atom or an alkyl group that may have a halogen atom, * represents a bonding bond] Two non-adjacent bonding bonds in the group represented by the group are replaced with hydrogen atoms And a divalent chain hydrocarbon group with a carbon number of 6 or less. The divalent organic group having a heterocyclic structure may, for example, be a group having a thiophene ring skeleton. From the viewpoint of easily suppressing the yellowness of the optical film (hereinafter, sometimes referred to as YI value), it is preferable that the bonding bonds of the base represented by formulas (20) to (29) are not adjacent to each other A group formed by substituting two bonding bonds with hydrogen atoms; and a group having a thiophene ring skeleton.

作為式(2)中之Z,更佳為式(20')、式(21')、式(22')、式(23')、式(24')、式(25')、式(26')、式(27')、式(28')及式(29'): [化16]

Figure 02_image035
[式(20')~式(29')中,W1 及*同式(20)~式(29)中之定義] 所表示之2價有機基。再者,式(20)~式(29)及式(20')~式(29')中之環上之氫原子亦可被取代為碳數1~6之烷基、碳數1~6之烷氧基、或碳數6~12之芳基。作為碳數1~6之烷基、碳數1~6之烷氧基及碳數6~12之芳基,分別可例舉上文中作為式(3)之R1 所例示者。As Z in formula (2), more preferably formula (20'), formula (21'), formula (22'), formula (23'), formula (24'), formula (25'), formula ( 26'), formula (27'), formula (28') and formula (29'): [化16]
Figure 02_image035
[In formula (20') to formula (29'), W 1 and * are the same as defined in formula (20) to formula (29)] The divalent organic group represented. Furthermore, the hydrogen atoms on the ring in formulas (20) to (29) and formulas (20') to (29') can also be substituted with alkyl groups having 1 to 6 carbons, and 1 to 6 carbons. The alkoxy group, or the aryl group with 6-12 carbons. As the alkyl group having 1 to 6 carbons, the alkoxy group having 1 to 6 carbons, and the aryl group having 6 to 12 carbons, those exemplified above as R 1 of the formula (3) can be exemplified, respectively.

於本發明之較佳實施方式中,本發明之聚醯胺醯亞胺樹脂可包含式(6): [化17]

Figure 02_image037
[式(6)中,W相互獨立地表示單鍵、-O-、二苯基亞甲基、可具有鹵素原子之2價烴基、-SO2 -、-S-、-CO-、-PO-、-PO2 -、-N(RC1 )-或-Si(RC2 )2 -,RC1 及RC2 相互獨立地表示氫原子或可具有鹵素原子之烷基,R8 相互獨立地表示鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基或芳氧基,p相互獨立地表示0~4之整數,q表示0~4之整數,*表示鍵結鍵] 所表示之結構作為式(2)中之Z。若為此種形態,則容易提高光學膜之耐力、斷裂應變、彈性模數及透明性。又,式(2)所表示之結構單元亦可包含1種或複數種式(6)所表示之基作為Z。 In a preferred embodiment of the present invention, the polyamideimide resin of the present invention may comprise formula (6): [化17]
Figure 02_image037
[In formula (6), W independently represents a single bond, -O-, diphenylmethylene, a divalent hydrocarbon group that may have a halogen atom, -SO 2 -, -S-, -CO-, -PO -, -PO 2 -, -N(R C1 )- or -Si(R C2 ) 2 -, R C1 and R C2 independently represent a hydrogen atom or an alkyl group which may have a halogen atom, and R 8 independently represent each other A halogen atom, an alkyl group, an alkoxy group, an aryl group or an aryloxy group which may have a halogen atom, p independently represents an integer from 0 to 4, q represents an integer from 0 to 4, * represents a bonding bond] The structure is the Z in formula (2). In such a form, it is easy to improve the endurance, breaking strain, elastic modulus, and transparency of the optical film. In addition, the structural unit represented by formula (2) may include one or more types of groups represented by formula (6) as Z.

式(6)中,就容易提高光學膜之耐力、斷裂應變、彈性模數及透明性之觀點而言,W之鍵結位置相互獨立,以鍵結鍵為基準,較佳為間位或對位,更佳為對位。In formula (6), from the viewpoint of easily improving the endurance, breaking strain, elastic modulus, and transparency of the optical film, the bonding positions of W are independent of each other, based on the bonding bond, preferably meta or pair Position, more preferably counterpoint.

於本發明之較佳形態中,式(6)由式(6'): [化18]

Figure 02_image039
[式(6')中,W、R8 、p及q同式(6)中之定義] 所表示。即,本發明之聚醯胺醯亞胺樹脂較佳為包含式(6')所表示之結構作為式(2)中之Z。若為此種形態,則容易提高光學膜之耐力、斷裂應變、彈性模數及透明性。In a preferred form of the present invention, formula (6) is represented by formula (6'): [化18]
Figure 02_image039
[In formula (6'), W, R 8 , p and q are the same as defined in formula (6)]. That is, the polyimide resin of the present invention preferably includes the structure represented by the formula (6′) as Z in the formula (2). In such a form, it is easy to improve the endurance, breaking strain, elastic modulus, and transparency of the optical film.

式(6)及式(6')中,R8 相互獨立地表示鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基或芳氧基。作為鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基及芳氧基,分別可例舉上文中作為式(3)之R1 所例示者。In formula (6) and formula (6'), R 8 independently represents a halogen atom, an alkyl group, an alkoxy group, an aryl group, or an aryloxy group which may have a halogen atom. As a halogen atom, the alkyl group, an alkoxy group, an aryl group, and an aryloxy group which may have a halogen atom, what was exemplified above as R 1 of formula (3) can be mentioned, respectively.

該等之中,就容易提高光學膜之耐力、斷裂應變、彈性模數及透明性之觀點而言,R8 相互獨立地較佳為表示可具有鹵素原子的碳數1~6之烷基或碳數1~6之烷氧基,更佳為表示碳數1~3之烷基或碳數1~3之烷氧基。p相互獨立地表示0~4之整數,就容易提高光學膜之耐力、斷裂應變、彈性模數及透明性之觀點而言,較佳為0~2之整數,更佳為0或1,進而較佳為0。Among them, from the standpoint of easily improving the endurance, breaking strain, elastic modulus, and transparency of the optical film, R 8 independently of each other preferably represents an alkyl group having 1 to 6 carbon atoms or which may have a halogen atom The alkoxy group having 1 to 6 carbons more preferably represents an alkyl group having 1 to 3 carbons or an alkoxy group having 1 to 3 carbons. p represents an integer of 0-4 independently of each other. From the viewpoint of easily improving the endurance, breaking strain, elastic modulus, and transparency of the optical film, it is preferably an integer of 0-2, more preferably 0 or 1, and further Preferably it is 0.

式(6)及式(6')中,W相互獨立地表示單鍵、-O-、二苯基亞甲基、可具有鹵素原子之2價烴基、-SO2 -、-S-、-CO-、-PO-、-PO2 -、-N(RC1 )-或-Si(RC2 )2 -,就容易提高光學膜之耐力、斷裂應變、彈性模數及透明性之觀點而言,較佳為表示-O-或-S-,更佳為表示-O-。RC1 及RC2 相互獨立地表示氫原子或可具有鹵素原子之碳數1~12之1價烴基。作為可具有鹵素原子之碳數1~12之1價烴基,可例舉上文中作為式(3)之R2 ~R5 中之可具有鹵素原子之1價烴基所例示者。In formula (6) and formula (6'), W independently represents a single bond, -O-, diphenylmethylene, a divalent hydrocarbon group that may have a halogen atom, -SO 2 -, -S-,- CO-, -PO-, -PO 2 -, -N(R C1 )- or -Si(R C2 ) 2 -, from the viewpoint of easily improving the endurance, breaking strain, elastic modulus and transparency of the optical film , Preferably represents -O- or -S-, more preferably represents -O-. R C1 and R C2 independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 12 carbon atoms which may have a halogen atom. Examples of the monovalent hydrocarbon group having 1 to 12 carbon atoms that may have a halogen atom include those exemplified above as the monovalent hydrocarbon group that may have a halogen atom among R 2 to R 5 in formula (3).

式(6)及式(6')中,q係0~4之範圍之整數,若q處於該範圍內,則容易提高光學膜之耐力、斷裂應變、彈性模數及透明性。式(6)及式(6')中之q較佳為0~3之範圍之整數,更佳為0~2之範圍之整數。In formula (6) and formula (6'), q is an integer in the range of 0-4. If q is within this range, the endurance, breaking strain, elastic modulus, and transparency of the optical film are easily improved. Q in formula (6) and formula (6') is preferably an integer in the range of 0-3, more preferably an integer in the range of 0-2.

q=0之式(6)或式(6')所表示之結構例如為來自對苯二甲酸或間苯二甲酸之結構,關於該結構,其中較佳為式(6)或式(6')中之p及q分別為0、或q為0且p為1或2(較佳為R8 為碳數1~3之烷基或氟化烷基或碳數1~3之烷氧基)之結構。就容易提高光學膜之耐力、斷裂應變、彈性模數及透明性之觀點而言,聚醯胺醯亞胺樹脂較佳為包含含有來自苯二甲酸之結構之式(2)所表示之結構單元。聚醯胺醯亞胺樹脂亦可包含1種或2種以上之式(6)或式(6')所表示之結構單元作為式(2)中之Z。The structure represented by formula (6) or formula (6') where q=0 is, for example, a structure derived from terephthalic acid or isophthalic acid, and the structure is preferably formula (6) or formula (6') ) In p and q are 0 respectively, or q is 0 and p is 1 or 2 (preferably R 8 is an alkyl group with 1 to 3 carbons or a fluorinated alkyl group or an alkoxy group with 1 to 3 carbons ) The structure. From the viewpoint of easily improving the endurance, breaking strain, elastic modulus, and transparency of the optical film, the polyimide resin preferably contains a structural unit represented by formula (2) containing a structure derived from phthalic acid . The polyimide imine resin may also include one or more structural units represented by formula (6) or formula (6') as Z in formula (2).

於本發明之一實施方式中,於包含式(6)所表示之結構作為式(2)中之Z之情形時,式(2)所表示之結構單元中,X由式(6)所表示之結構單元的比率相對於式(2)所表示之結構單元之總莫耳量,較佳為30莫耳%以上,更佳為50莫耳%以上,進而較佳為70莫耳%以上,較佳為100莫耳%以下。若式(2)中之Z由式(6)所表示之結構單元之比率為上述下限值以上,則容易提高光學膜之耐力、斷裂應變、彈性模數及透明性。若該比率為上述上限值以下,則容易抑制來自式(6)之醯胺鍵間氫鍵所導致的樹脂清漆之黏度上升,容易提高膜之加工性。再者,式(2)中之Z由式(6)所表示之結構單元之比率例如可使用1 H-NMR進行測定,或亦可根據原料之添加比而算出。 In one embodiment of the present invention, when the structure represented by formula (6) is included as Z in formula (2), in the structural unit represented by formula (2), X is represented by formula (6) The ratio of the structural unit relative to the total molar amount of the structural unit represented by formula (2) is preferably 30 mol% or more, more preferably 50 mol% or more, and even more preferably 70 mol% or more, Preferably it is 100 mol% or less. If the ratio of Z in the formula (2) and the structural unit represented by the formula (6) is more than the above lower limit, the endurance, breaking strain, elastic modulus, and transparency of the optical film are easily improved. If the ratio is less than the above upper limit, it is easy to suppress the increase in the viscosity of the resin varnish caused by the hydrogen bonding between the amide bonds of the formula (6), and it is easy to improve the processability of the film. Furthermore, the ratio of Z in formula (2) to the structural unit represented by formula (6) can be used, for example1 It can be measured by H-NMR, or it can be calculated based on the addition ratio of the raw materials.

於本發明之一實施方式中,於包含式(6)所表示之結構作為式(2)中之Z之情形時,式(2)所表示之結構單元中,X由式(6)所表示之結構單元的比率相對於式(1)所表示之結構單元與式(2)所表示之結構單元的總莫耳量,較佳為5莫耳%以上,更佳為15莫耳%以上,進而較佳為30莫耳%以上,尤佳為50莫耳%以上,較佳為100莫耳%以下。若式(2)中之Z由式(6)所表示之結構單元之比率為上述下限值以上,則容易提高光學膜之耐力、斷裂應變、彈性模數及透明性。若該比率為上述上限值以下,則容易抑制來自式(6)之醯胺鍵間氫鍵所導致的樹脂清漆之黏度上升,容易提高膜之加工性。再者,式(2)中之Z由式(6)所表示之結構單元之比率例如可使用1 H-NMR進行測定,或亦可根據原料之添加比而算出。 In one embodiment of the present invention, when the structure represented by formula (6) is included as Z in formula (2), in the structural unit represented by formula (2), X is represented by formula (6) The ratio of the structural unit relative to the total molar amount of the structural unit represented by the formula (1) and the structural unit represented by the formula (2) is preferably at least 5 mol%, more preferably at least 15 mol%, It is more preferably 30 mol% or more, more preferably 50 mol% or more, and more preferably 100 mol% or less. If the ratio of Z in the formula (2) and the structural unit represented by the formula (6) is more than the above lower limit, the endurance, breaking strain, elastic modulus, and transparency of the optical film are easily improved. If the ratio is less than the above upper limit, it is easy to suppress the increase in the viscosity of the resin varnish caused by the hydrogen bonding between the amide bonds of the formula (6), and it is easy to improve the processability of the film. Furthermore, the ratio of Z in formula (2) to the structural unit represented by formula (6) can be used, for example1 It can be measured by H-NMR, or it can be calculated based on the addition ratio of the raw materials.

於聚醯胺醯亞胺樹脂具有式(2)中之Z由上述式(20')~式(29')之任一者所表示之結構單元之情形時,尤其是於具有式(2)中之Z由式(6')所表示之結構單元之情形時,就容易提高樹脂之溶解性而提高樹脂之加工性之觀點而言,較佳為聚醯胺醯亞胺樹脂除式(1)及式(2)所表示之結構單元以外,進而具有下述式(d1): [化19]

Figure 02_image041
[式(d1)中,R24 相互獨立地表示氫原子、碳數1~6之烷基、碳數1~6之烷氧基或碳數6~12之芳基,R25 表示R24 或-C(=O)-*,*表示鍵結鍵] 所表示之來自羧酸之結構單元。When the polyamide imide resin has a structural unit represented by any of the above-mentioned formulas (20') to (29'), Z in the formula (2), especially when it has the formula (2) In the case where Z is a structural unit represented by formula (6'), from the viewpoint that it is easy to increase the solubility of the resin and improve the processability of the resin, the polyimide imine resin is preferably divided by the formula (1 In addition to the structural units represented by the formula (2), it has the following formula (d1): [化19]
Figure 02_image041
[In formula (d1), R 24 independently represents a hydrogen atom, an alkyl group with 1 to 6 carbons, an alkoxy group with 1 to 6 carbons, or an aryl group with 6 to 12 carbons, and R 25 represents R 24 or -C(=O)-*, * represents a bonding bond] The structural unit derived from carboxylic acid represented.

R24 中,作為碳數1~6之烷基、碳數1~6之烷氧基及碳數6~12之芳基,分別可例舉上文中作為式(3)之R1 所例示者。作為結構單元(d1),具體而言,可例舉R24 及R25 均為氫原子之結構單元(來自二羧酸化合物之結構單元)、R24 均為氫原子且R25 表示-C(=O)-*之結構單元(來自三羧酸化合物之結構單元)等。In R 24 , as the alkyl group with 1 to 6 carbons, the alkoxy group with 1 to 6 carbons, and the aryl group with 6 to 12 carbons, those exemplified above as R 1 of formula (3) can be exemplified. . As the structural unit (d1), specifically, a structural unit in which R 24 and R 25 are both hydrogen atoms (a structural unit derived from a dicarboxylic acid compound), R 24 is a hydrogen atom, and R 25 represents -C( =O)-*The structural unit (the structural unit derived from the tricarboxylic acid compound) and so on.

於聚醯胺醯亞胺樹脂包含式(d1)所表示之結構單元之情形時,式(d1)所表示之結構單元的比率相對於式(1)所表示之結構單元與式(2)所表示之結構單元的總莫耳量,較佳為0.01莫耳%以上,更佳為0.1莫耳%以上,進而較佳為1莫耳%以上,較佳為30莫耳%以下,更佳為20莫耳%以下,進而較佳為10莫耳%以下。若該比率處於上述範圍內,則容易維持光學膜之彈性模數並且改善樹脂之溶解性。再者,該比率例如可使用1 H-NMR進行測定,或亦可根據原料之添加比而算出。When the polyimide imine resin contains the structural unit represented by the formula (d1), the ratio of the structural unit represented by the formula (d1) relative to the structural unit represented by the formula (1) and the structural unit represented by the formula (2) The total molar amount of the structural unit represented is preferably 0.01 mol% or more, more preferably 0.1 mol% or more, still more preferably 1 mol% or more, preferably 30 mol% or less, more preferably 20 mol% or less, more preferably 10 mol% or less. If the ratio is within the above range, it is easy to maintain the elastic modulus of the optical film and improve the solubility of the resin. In addition, this ratio can be measured using 1 H-NMR, for example, or it can also be calculated based on the addition ratio of raw materials.

作為式(2)中之X,可例舉上文中作為式(1)中之X所例示者,較佳形態亦相同。又,式(1)中之X與式(2)中之X可相同,亦可不同。於本發明之一實施方式中,式(1)所表示之結構單元及/或式(2)所表示之結構單元亦可包含1種或複數種式(4)所表示之結構(或基)作為X。As X in the formula (2), those exemplified as X in the formula (1) above can be exemplified, and preferred forms are also the same. In addition, X in formula (1) and X in formula (2) may be the same or different. In one embodiment of the present invention, the structural unit represented by formula (1) and/or the structural unit represented by formula (2) may also include one or more structures (or groups) represented by formula (4) As X.

於本發明之一實施方式中,於包含式(4)所表示之結構作為式(1)及式(2)中之X之情形時,X由式(4)所表示之結構單元的比率相對於式(1)所表示之結構單元與式(2)所表示之結構單元的總莫耳量,較佳為30莫耳%以上,更佳為50莫耳%以上,進而較佳為70莫耳%以上,較佳為100莫耳%以下。若X由式(4)所表示之結構單元之比率處於上述範圍內,則容易提高光學膜之斷裂應變、彈性模數及透明性,且容易提高光學膜之耐力。再者,X由式(4)所表示之結構單元之比率例如可使用1 H-NMR進行測定,或亦可根據原料之添加比而算出。In one embodiment of the present invention, when the structure represented by formula (4) is included as X in formula (1) and formula (2), the ratio of the structural unit represented by formula (4) to X is relative to The total molar amount of the structural unit represented by the formula (1) and the structural unit represented by the formula (2) is preferably 30 mol% or more, more preferably 50 mol% or more, and even more preferably 70 mol% Ear% or more, preferably 100 mol% or less. If the ratio of the structural unit represented by the formula (4) of X is within the above range, the fracture strain, elastic modulus, and transparency of the optical film are easily improved, and the endurance of the optical film is easily improved. In addition, the ratio of the structural unit represented by X by the formula (4) can be measured using 1 H-NMR, for example, or can be calculated based on the addition ratio of the raw materials.

本發明之聚醯胺醯亞胺樹脂除式(1)及式(2)所表示之結構單元以外,亦可包含式(30)所表示之結構單元及/或式(31)所表示之結構單元。 [化20]

Figure 02_image043
In addition to the structural units represented by formula (1) and formula (2), the polyamide imine resin of the present invention may also include the structural unit represented by formula (30) and/or the structure represented by formula (31) unit. [化20]
Figure 02_image043

式(30)中,Y1 表示4價有機基,較佳為表示有機基中之氫原子亦可被取代為烴基或經氟取代之烴基的有機基。作為Y1 ,可例示:式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(26)、式(27)、式(28)及式(29)所表示之基;上述式(20)~式(29)所表示之基中之氫原子被取代為甲基、氟基、氯基或三氟甲基而成之基;以及4價之碳數6以下之鏈式烴基。於本發明之一實施方式中,式(30)所表示之結構單元可包含複數種Y1 所表示之結構,複數種Y1 可彼此相同,亦可互不相同。In formula (30), Y 1 represents a tetravalent organic group, and preferably represents an organic group in which the hydrogen atom in the organic group may be substituted with a hydrocarbon group or a fluorine-substituted hydrocarbon group. As Y 1 , there can be exemplified: formula (20), formula (21), formula (22), formula (23), formula (24), formula (25), formula (26), formula (27), formula (28) ) And the group represented by the formula (29); the hydrogen atom in the group represented by the above formula (20) to formula (29) is substituted with a methyl group, a fluoro group, a chloro group or a trifluoromethyl group; And tetravalent chain hydrocarbon group with carbon number 6 or less. In one embodiment of the present invention, the formula (30) a structural unit represented by the structure may comprise a plurality of species represented by Y 1, Y 1 may be the same kind of a plurality of one another, also different from each other.

式(31)中,Y2 係3價有機基,較佳為有機基中之氫原子亦可被取代為烴基或經氟取代之烴基的有機基。作為Y2 ,可例示:上述式(20)、式(21)、式(22)、式(23)、式(24)、式(25)、式(26)、式(27)、式(28)及式(29)所表示之基之鍵結鍵中之任一個被取代為氫原子而成之基;及3價之碳數6以下之鏈式烴基。於本發明之一實施方式中,式(31)所表示之結構單元可包含複數種Y2 所表示之結構,複數種Y2 可彼此相同,亦可互不相同。In formula (31), Y 2 is a trivalent organic group, preferably an organic group in which the hydrogen atom in the organic group may be substituted with a hydrocarbon group or a fluorine-substituted hydrocarbon group. As Y 2 , the above formula (20), formula (21), formula (22), formula (23), formula (24), formula (25), formula (26), formula (27), formula ( 28) A group in which any one of the bonding bonds of the group represented by the formula (29) is substituted with a hydrogen atom; and a trivalent chain hydrocarbon group with 6 or less carbon atoms. In one embodiment of the present invention, the formula (31) of the structural unit represented may include a plurality of kinds of structure represented by Y 2, a plurality of kinds of Y 2 may be identical to each other, also different from each other.

式(30)及式(31)中,X1 及X2 相互獨立地為2價有機基,較佳為有機基中之氫原子亦可被取代為烴基或經氟取代之烴基的有機基。作為X1 及X2 ,可例示:上述式(10)、式(11)、式(12)、式(13)、式(14)、式(15)、式(16)、式(17)及式(18)所表示之基;該式(10)~式(18)所表示之基中之氫原子被取代為甲基、氟基、氯基或三氟甲基而成之基;以及碳數6以下之鏈式烴基。In formula (30) and formula (31), X 1 and X 2 are independently a divalent organic group, preferably an organic group in which the hydrogen atom in the organic group may be substituted with a hydrocarbon group or a fluorine-substituted hydrocarbon group. Examples of X 1 and X 2 include the above-mentioned formula (10), formula (11), formula (12), formula (13), formula (14), formula (15), formula (16), and formula (17) And the group represented by the formula (18); the hydrogen atom in the group represented by the formula (10) to the formula (18) is substituted with a methyl group, a fluoro group, a chloro group or a trifluoromethyl group; and Chain hydrocarbon group with carbon number 6 or less.

於聚醯胺醯亞胺樹脂包含式(30)所表示之結構單元、及/或式(31)所表示之結構單元之情形時,式(30)所表示之結構單元及式(31)所表示之結構單元的合計比率相對於式(1)所表示之結構單元與式(2)所表示之結構單元的總莫耳量,較佳為0.01莫耳%以上,更佳為0.1莫耳%以上,進而較佳為1莫耳%以上,較佳為30莫耳%以下,更佳為20莫耳%以下,進而較佳為10莫耳%以下。若該合計比率處於上述範圍內,則容易獲得高彈性模數之光學膜。再者,該比率例如可使用1 H-NMR進行測定,或亦可根據原料之添加比而算出。 When the polyamide imine resin contains the structural unit represented by the formula (30) and/or the structural unit represented by the formula (31), the structural unit represented by the formula (30) and the structural unit represented by the formula (31) are The total ratio of the structural units represented is preferably 0.01 mol% or more, more preferably 0.1 mol% relative to the total molar amount of the structural units represented by the formula (1) and the structural units represented by the formula (2) Above, it is more preferably 1 mol% or more, more preferably 30 mol% or less, more preferably 20 mol% or less, and still more preferably 10 mol% or less. If the total ratio is within the above range, it is easy to obtain an optical film with a high elastic modulus. Furthermore, the ratio can be used, for example1 It can be measured by H-NMR, or it can be calculated based on the addition ratio of the raw materials.

聚醯胺醯亞胺樹脂中,式(1)所表示之結構單元的比率相對於式(1)所表示之結構單元與式(2)所表示之結構單元的總莫耳量(100莫耳%),較佳為10莫耳%以上,更佳為15莫耳%以上,進而較佳為20莫耳%以上,進而更佳為25莫耳%以上,尤佳為30莫耳%以上,較佳為90莫耳%以下,更佳為70莫耳%以下,進而較佳為60莫耳%以下,尤佳為50莫耳%以下。若聚醯胺醯亞胺樹脂中,式(1)所表示之結構單元之比率為上述下限值以上,則能夠抑制式(2)中之醯胺鍵間之氫鍵所導致之增黏,能夠降低聚醯胺醯亞胺清漆之黏度,容易製造光學構件。若聚醯胺醯亞胺樹脂中,式(1)所表示之結構單元之比率為上述上限值以下,則包含該聚醯胺醯亞胺樹脂而成之光學膜會發揮較高之表面硬度。又,若式(1)所表示之結構單元之比率為上述上限值以下,則式(2)所表示之結構單元之比率相對增加,由此容易提高包含該聚醯胺醯亞胺樹脂而成之光學膜之耐力。再者,上述比率例如可使用1 H-NMR進行測定,或亦可根據原料之添加比而算出。In the polyimide imine resin, the ratio of the structural unit represented by the formula (1) is relative to the total molar amount of the structural unit represented by the formula (1) and the structural unit represented by the formula (2) (100 mol %), preferably 10 mol% or more, more preferably 15 mol% or more, still more preferably 20 mol% or more, still more preferably 25 mol% or more, particularly preferably 30 mol% or more, It is preferably 90 mol% or less, more preferably 70 mol% or less, further preferably 60 mol% or less, and particularly preferably 50 mol% or less. If the ratio of the structural units represented by the formula (1) in the polyamide imide resin is more than the above lower limit, the viscosity increase caused by the hydrogen bonds between the amide bonds in the formula (2) can be suppressed, It can reduce the viscosity of polyimide varnish, making it easy to manufacture optical components. If the ratio of the structural units represented by the formula (1) in the polyimide resin is below the above upper limit, the optical film containing the polyimide resin will exhibit high surface hardness . In addition, if the ratio of the structural unit represented by formula (1) is below the above upper limit, the ratio of the structural unit represented by formula (2) is relatively increased, thereby making it easier to increase the resin containing the polyamide imine The endurance of the optical film. In addition, the above-mentioned ratio can be measured using 1 H-NMR, for example, or it can also be calculated based on the addition ratio of raw materials.

於本發明之一實施方式中,式(1)所表示之結構單元及式(2)所表示之結構單元之總量的比率相對於聚醯胺醯亞胺樹脂所含之全部結構單元,較佳為50莫耳%以上,更佳為70莫耳%以上,進而較佳為80莫耳%以上,尤佳為90莫耳%以上,較佳為100莫耳%以下。若該比率為上述下限值以上,則容易提高光學膜之耐力及透明性。In one embodiment of the present invention, the ratio of the total amount of the structural unit represented by formula (1) and the total structural unit represented by formula (2) relative to all the structural units contained in the polyimide resin is higher than It is preferably 50 mol% or more, more preferably 70 mol% or more, further preferably 80 mol% or more, particularly preferably 90 mol% or more, and more preferably 100 mol% or less. If this ratio is more than the said lower limit, it will become easy to improve the durability and transparency of an optical film.

本發明之聚醯胺醯亞胺樹脂之重量平均分子量(以下,有時記作Mw)較佳為100,000以上,更佳為150,000以上,進而較佳為200,000以上,進而更佳為300,000以上,尤佳為400,000以上,尤其更佳為500,000以上,特別較佳為600,000以上,較佳為1,500,000以下,更佳為1,200,000以下,進而較佳為1,000,000以下,尤佳為800,000以下。若聚醯胺醯亞胺樹脂之Mw為上述下限值以上,則容易提高所獲得之光學膜之斷裂應變及彈性模數。又,若Mw為上述上限值以下,則容易抑制樹脂清漆之凝膠化,容易提高所獲得之光學膜之光學特性,且容易提高光學膜之耐力。此處可知,於本發明之聚醯胺醯亞胺樹脂包含式(3)所表示之結構作為式(1)中之Y之情形時,有具有該結構之聚醯胺醯亞胺樹脂之溶液之黏度變高之傾向。由於存在聚醯胺醯亞胺樹脂之Mw變大亦會導致樹脂溶液之黏度變高之傾向,因此,極難將包含此種結構之聚醯胺醯亞胺樹脂高分子量化。本發明人等進行各種研究後,發現藉由於下述製造條件下製造聚醯胺醯亞胺樹脂,能夠提高Mw。Mw例如可藉由進行凝膠滲透層析法(以下,有時記作GPC)測定,經標準聚苯乙烯換算而求出,例如可藉由實施例中記載之方法而求出。 The weight average molecular weight (hereinafter, sometimes referred to as Mw) of the polyamideimide resin of the present invention is preferably 100,000 or more, more preferably 150,000 or more, still more preferably 200,000 or more, and even more preferably 300,000 or more, especially It is preferably 400,000 or more, particularly more preferably 500,000 or more, particularly preferably 600,000 or more, preferably 1,500,000 or less, more preferably 1,200,000 or less, still more preferably 1,000,000 or less, and particularly preferably 800,000 or less. If the Mw of the polyimide resin is more than the above lower limit, it is easy to increase the fracture strain and elastic modulus of the obtained optical film. Moreover, if Mw is less than the above upper limit value, the gelation of the resin varnish is easily suppressed, the optical properties of the obtained optical film are easily improved, and the durability of the optical film is easily improved. It can be seen here that when the polyamide imide resin of the present invention contains the structure represented by formula (3) as Y in formula (1), there is a solution of polyamide imide resin having the structure The tendency of the viscosity to become higher. As the Mw of the polyimide resin tends to increase, the viscosity of the resin solution will also increase. Therefore, it is extremely difficult to polymerize the polyimide imide resin containing such a structure. The inventors of the present invention conducted various studies and found that the Mw can be increased by producing a polyimide resin under the following production conditions. Mw can be obtained by, for example, performing gel permeation chromatography (hereinafter, sometimes referred to as GPC) measurement and conversion of standard polystyrene. For example, it can be obtained by the method described in the examples.

於本發明之較佳之一實施方式中,本發明之聚醯胺醯亞胺樹脂可包含例如可利用上述含氟取代基等導入之氟原子等鹵素原子。於聚醯胺醯亞胺樹脂包含鹵素原子之情形時,容易降低光學膜之YI值,且容易提高斷裂應變及彈性模數。又,若光學膜之彈性模數較高,則容易抑制損傷及皺褶等之產生。又,若光學膜之YI值較低,則容易提高該膜之透明性及視認性。鹵素原子較佳為氟原子。作為良好地使聚醯胺醯亞胺樹脂中含有氟原子之含氟取代基,例如可例舉氟基及三氟甲基。In a preferred embodiment of the present invention, the polyamide imide resin of the present invention may contain halogen atoms such as fluorine atoms that can be introduced using the above-mentioned fluorine-containing substituents. When the polyamideimide resin contains halogen atoms, it is easy to reduce the YI value of the optical film, and it is easy to increase the fracture strain and elastic modulus. In addition, if the elastic modulus of the optical film is high, it is easy to suppress the occurrence of damage and wrinkles. In addition, if the YI value of the optical film is low, the transparency and visibility of the film can be easily improved. The halogen atom is preferably a fluorine atom. As a fluorine-containing substituent which makes a polyamide imide resin contain a fluorine atom, for example, a fluorine group and a trifluoromethyl group can be mentioned.

關於聚醯胺醯亞胺樹脂中之鹵素原子之含量,分別以聚醯胺醯亞胺樹脂之質量為基準計,較佳為1~40質量%,更佳為5~40質量%,進而較佳為5~30質量%。若鹵素原子之含量為上述下限值以上,則容易降低光學膜之YI值,且容易提高斷裂應變及彈性模數。若鹵素原子之含量為上述上限值以下,則容易進行合成。Regarding the content of the halogen atom in the polyimide resin, based on the mass of the polyimide resin, it is preferably 1-40% by mass, more preferably 5-40% by mass, and more Preferably, it is 5 to 30% by mass. If the content of halogen atoms is more than the above lower limit, the YI value of the optical film is easily reduced, and the fracture strain and elastic modulus are easily increased. If the content of the halogen atom is less than the above upper limit, the synthesis is easy.

聚醯胺醯亞胺樹脂之醯亞胺化率較佳為90%以上,更佳為93%以上,進而較佳為96%以上,通常為100%以下。就容易提高光學膜之光學特性之觀點而言,醯亞胺化率較佳為上述下限值以上。醯亞胺化率表示聚醯胺醯亞胺樹脂中之醯亞胺鍵之莫耳量相對於聚醯胺醯亞胺樹脂中的來自四羧酸化合物之結構單元之莫耳量的2倍之值的比率。再者,於聚醯胺醯亞胺樹脂包含三羧酸化合物之情形時,表示聚醯胺醯亞胺樹脂中之醯亞胺鍵之莫耳量相對於聚醯胺醯亞胺樹脂中的來自四羧酸化合物之結構單元之莫耳量的2倍之值與來自三羧酸化合物之結構單元之莫耳量之合計的比率。又,醯亞胺化率可藉由IR(Infrared Radiation,紅外線)法、NMR(nuclear magnetic resonance,核磁共振)法等求出。The imidization rate of the polyimide resin is preferably 90% or more, more preferably 93% or more, still more preferably 96% or more, and usually 100% or less. From the viewpoint of easy improvement of the optical properties of the optical film, the imidization rate is preferably at least the above lower limit. The imidization rate means that the molar amount of the imine bond in the polyimide imide resin is twice that of the molar amount of the structural unit derived from the tetracarboxylic acid compound in the polyimide imide resin. Value ratio. Furthermore, when the polyimide imide resin contains a tricarboxylic acid compound, it means that the molar amount of the imine bond in the polyimide imide resin is relative to the amount of moles in the polyimide imide resin. The ratio of the value of twice the molar amount of the structural unit of the tetracarboxylic acid compound to the total molar amount of the structural unit derived from the tricarboxylic acid compound. In addition, the imidization rate can be determined by an IR (Infrared Radiation) method, an NMR (nuclear magnetic resonance) method, or the like.

<聚醯胺醯亞胺樹脂之製造方法> 本發明之聚醯胺醯亞胺樹脂之製造方法並無特別限定。於本發明之一實施方式中,可以下述四羧酸化合物、二羧酸化合物及二胺化合物為主要原料進行製造。更具體而言,可藉由包含如下步驟之方法進行製造:使二胺化合物與四羧酸化合物反應而獲得聚醯胺酸之步驟;使該聚醯胺酸與二羧酸反應而獲得聚醯胺醯亞胺樹脂前驅物之步驟;及將該聚醯胺醯亞胺樹脂前驅物醯亞胺化之步驟。再者,除四羧酸化合物及二羧酸化合物以外,亦可使三羧酸化合物參與反應。<Manufacturing method of polyimide resin> The manufacturing method of the polyimide resin of this invention is not specifically limited. In one embodiment of the present invention, the following tetracarboxylic acid compound, dicarboxylic acid compound, and diamine compound can be produced as main raw materials. More specifically, it can be produced by a method comprising the steps of: reacting a diamine compound with a tetracarboxylic acid compound to obtain polyamide; and reacting the polyamide with a dicarboxylic acid to obtain polyamide The step of amide resin precursor; and the step of imidizing the polyamide resin precursor. Furthermore, in addition to the tetracarboxylic acid compound and the dicarboxylic acid compound, a tricarboxylic acid compound may also be involved in the reaction.

式(1)及式(30)所表示之結構單元通常衍生自二胺化合物與四羧酸化合物。式(2)所表示之結構單元通常衍生自二胺化合物與二羧酸化合物。式(31)所表示之結構單元通常衍生自二胺化合物與三羧酸化合物。The structural units represented by formula (1) and formula (30) are usually derived from diamine compounds and tetracarboxylic acid compounds. The structural unit represented by the formula (2) is usually derived from a diamine compound and a dicarboxylic acid compound. The structural unit represented by the formula (31) is usually derived from a diamine compound and a tricarboxylic acid compound.

聚醯胺醯亞胺樹脂之製造中使用之四羧酸化合物較佳為至少包含式(X): [化21]

Figure 02_image045
[式(X)中,R1 ~R5 、m及n分別與式(3)中之R1 ~R5 、m及n相同] 所表示之化合物。The tetracarboxylic acid compound used in the production of the polyamide imide resin preferably contains at least the formula (X): [化21]
Figure 02_image045
[In the formula (X), R 1 ~ R 5, m and n each formula R 1 ~ R 5, m, and n (. 3) in the same] a compound represented by the.

式(X)所表示之化合物可藉由慣用方法、例如使偏苯三甲酸酐或其衍生物與芳香族二醇反應而獲得,亦可使用市售品。The compound represented by the formula (X) can be obtained by a conventional method, for example, by reacting trimellitic anhydride or a derivative thereof with an aromatic diol, and a commercially available product can also be used.

於本發明之一實施方式中,較佳為聚醯胺醯亞胺樹脂之製造中使用之四羧酸化合物除式(X)所表示之化合物以外,進而包含式(Y): [化22]

Figure 02_image047
[式(Y)中,B、R7 及t分別與式(5)中之B、R7 及t相同] 所表示之化合物。In one embodiment of the present invention, it is preferable that the tetracarboxylic acid compound used in the production of the polyamideimide resin further includes the formula (Y) in addition to the compound represented by the formula (X): [化22]
Figure 02_image047
[In formula (Y), B, R 7 and t, respectively of formula (5) in the B, R 7, and the same t] a compound represented by the.

作為聚醯胺醯亞胺樹脂之製造(或合成)中使用之四羧酸化合物,可例舉:芳香族四羧酸二酐等芳香族四羧酸化合物;及脂肪族四羧酸二酐等脂肪族四羧酸化合物等。四羧酸化合物可單獨使用,亦可將2種以上組合使用。四羧酸化合物除二酐以外,亦可為醯氯化合物等四羧酸化合物之類似物。Examples of tetracarboxylic acid compounds used in the production (or synthesis) of polyamide imide resins include aromatic tetracarboxylic acid compounds such as aromatic tetracarboxylic dianhydride; and aliphatic tetracarboxylic dianhydride, etc. Aliphatic tetracarboxylic acid compounds, etc. The tetracarboxylic acid compound may be used alone or in combination of two or more kinds. In addition to the dianhydride, the tetracarboxylic acid compound may be an analog of a tetracarboxylic acid compound such as a chlorine compound.

作為芳香族四羧酸二酐之具體例,可例舉非縮合多環式之芳香族四羧酸二酐、單環式之芳香族四羧酸二酐及縮合多環式之芳香族四羧酸二酐。作為非縮合多環式之芳香族四羧酸二酐,例如可例舉偏苯三甲酸酐與2,2',3,3',5,5'-六甲基-4,4'-聯苯酚之酯化物(以下,有時記作TAHMBP)、偏苯三甲酸酐與2,2',3,3'-四甲基-4,4'-聯苯酚之酯化物(以下,有時記作TA23X-BP)、偏苯三甲酸酐與3,3',5,5'-四甲基-4,4'-聯苯酚之酯化物、4,4'-氧二鄰苯二甲酸二酐、3,3',4,4'-二苯甲酮四羧酸二酐、2,2',3,3'-二苯甲酮四羧酸二酐、3,3',4,4'-聯苯四羧酸二酐、2,2',3,3'-聯苯四羧酸二酐、3,3',4,4'-二苯碸四羧酸二酐、2,2-雙(3,4-二羧基苯基)丙烷二酐、2,2-雙(2,3-二羧基苯基)丙烷二酐、2,2-雙(3,4-二羧基苯氧基苯基)丙烷二酐、4,4'-(六氟亞異丙基)二鄰苯二甲酸二酐(以下,有時記作6FDA)、1,2-雙(2,3-二羧基苯基)乙烷二酐、1,1-雙(2,3-二羧基苯基)乙烷二酐、1,2-雙(3,4-二羧基苯基)乙烷二酐、1,1-雙(3,4-二羧基苯基)乙烷二酐、雙(3,4-二羧基苯基)甲烷二酐、雙(2,3-二羧基苯基)甲烷二酐、4,4'-(對苯二氧基)二鄰苯二甲酸二酐、4,4'-(間苯二氧基)二鄰苯二甲酸二酐。又,作為單環式之芳香族四羧酸二酐,例如可例舉1,2,4,5-苯四羧酸二酐[亦稱作均苯四甲酸二酐(以下,有時記作PMDA)],作為縮合多環式之芳香族四羧酸二酐,例如可例舉2,3,6,7-萘四羧酸二酐。Specific examples of aromatic tetracarboxylic dianhydrides include non-condensed polycyclic aromatic tetracarboxylic dianhydrides, monocyclic aromatic tetracarboxylic dianhydrides, and condensed polycyclic aromatic tetracarboxylic dianhydrides. Acid dianhydride. As non-condensed polycyclic aromatic tetracarboxylic dianhydrides, for example, trimellitic anhydride and 2,2',3,3',5,5'-hexamethyl-4,4'-biphenol can be cited The esterified product (hereinafter, sometimes referred to as TAHMBP), the esterified product of trimellitic anhydride and 2,2',3,3'-tetramethyl-4,4'-biphenol (hereinafter, sometimes referred to as TA23X -BP), trimellitic anhydride and 3,3',5,5'-tetramethyl-4,4'-biphenol ester, 4,4'-oxydiphthalic dianhydride, 3, 3',4,4'-benzophenone tetracarboxylic dianhydride, 2,2',3,3'-benzophenone tetracarboxylic dianhydride, 3,3',4,4'-biphenyl Tetracarboxylic dianhydride, 2,2',3,3'-biphenyltetracarboxylic dianhydride, 3,3',4,4'-diphenyl tetracarboxylic dianhydride, 2,2-bis(3 ,4-Dicarboxyphenyl)propane dianhydride, 2,2-bis(2,3-dicarboxyphenyl)propane dianhydride, 2,2-bis(3,4-dicarboxyphenoxyphenyl)propane Dianhydride, 4,4'-(hexafluoroisopropylidene) diphthalic dianhydride (hereinafter, sometimes referred to as 6FDA), 1,2-bis(2,3-dicarboxyphenyl)ethane Dianhydride, 1,1-bis(2,3-dicarboxyphenyl)ethane dianhydride, 1,2-bis(3,4-dicarboxyphenyl)ethane dianhydride, 1,1-bis(3 ,4-Dicarboxyphenyl)ethane dianhydride, bis(3,4-dicarboxyphenyl)methane dianhydride, bis(2,3-dicarboxyphenyl)methane dianhydride, 4,4'-(p- Phenylenedioxy)diphthalic dianhydride, 4,4'-(isophthalic)diphthalic dianhydride. In addition, as the monocyclic aromatic tetracarboxylic dianhydride, for example, 1,2,4,5-benzenetetracarboxylic dianhydride [also referred to as pyromellitic dianhydride (hereinafter, sometimes referred to as PMDA)], as the condensed polycyclic aromatic tetracarboxylic dianhydride, for example, 2,3,6,7-naphthalenetetracarboxylic dianhydride may be mentioned.

該等之中,較佳為例舉TAHMBP、TA23X-BP、偏苯三甲酸酐與3,3',5,5'-四甲基-4,4'-聯苯酚之酯化物、PMDA、4,4'-氧二鄰苯二甲酸二酐、3,3',4,4'-二苯甲酮四羧酸二酐、2,2',3,3'-二苯甲酮四羧酸二酐、3,3',4,4'-聯苯四羧酸二酐、2,2',3,3'-聯苯四羧酸二酐、3,3',4,4'-二苯碸四羧酸二酐、2,2-雙(3,4-二羧基苯基)丙烷二酐、2,2-雙(2,3-二羧基苯基)丙烷二酐、2,2-雙(3,4-二羧基苯氧基苯基)丙烷二酐、6FDA、1,2-雙(2,3-二羧基苯基)乙烷二酐、1,1-雙(2,3-二羧基苯基)乙烷二酐、1,2-雙(3,4-二羧基苯基)乙烷二酐、1,1-雙(3,4-二羧基苯基)乙烷二酐、雙(3,4-二羧基苯基)甲烷二酐、雙(2,3-二羧基苯基)甲烷二酐、4,4'-(對苯二氧基)二鄰苯二甲酸二酐、及4,4'-(間苯二氧基)二鄰苯二甲酸二酐,更佳為例舉偏苯三甲酸酐與2,2',3,3',5,5'-六甲基-4,4'-聯苯酚之酯化物、偏苯三甲酸酐與2,2',3,3'-四甲基-4,4'-聯苯酚之酯化物、偏苯三甲酸酐與3,3',5,5'-四甲基-4,4'-聯苯酚之酯化物、4,4'-氧二鄰苯二甲酸二酐、3,3',4,4'-聯苯四羧酸二酐、2,2',3,3'-聯苯四羧酸二酐、6FDA、雙(3,4-二羧基苯基)甲烷二酐、及4,4'-(對苯二氧基)二鄰苯二甲酸二酐。該等可單獨使用或將2種以上組合使用。Among these, the esterified products of TAHMBP, TA23X-BP, trimellitic anhydride and 3,3',5,5'-tetramethyl-4,4'-biphenol, PMDA, 4, 4'-oxydiphthalic dianhydride, 3,3',4,4'-benzophenone tetracarboxylic dianhydride, 2,2',3,3'-benzophenone tetracarboxylic dianhydride Anhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 2,2',3,3'-biphenyltetracarboxylic dianhydride, 3,3',4,4'-diphenyl Tetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxyphenyl)propane dianhydride, 2,2-bis(2,3-dicarboxyphenyl)propane dianhydride, 2,2-bis (3,4-Dicarboxyphenoxyphenyl)propane dianhydride, 6FDA, 1,2-bis(2,3-dicarboxyphenyl)ethane dianhydride, 1,1-bis(2,3-di Carboxyphenyl) ethane dianhydride, 1,2-bis(3,4-dicarboxyphenyl)ethane dianhydride, 1,1-bis(3,4-dicarboxyphenyl)ethane dianhydride, bis (3,4-dicarboxyphenyl)methane dianhydride, bis(2,3-dicarboxyphenyl)methane dianhydride, 4,4'-(terephthalic acid) dianhydride, and 4,4'-(isophthalenedioxy)diphthalic dianhydride, more preferably exemplified by trimellitic anhydride and 2,2',3,3',5,5'-hexamethyl-4 ,4'-biphenol ester, trimellitic anhydride and 2,2',3,3'-tetramethyl-4,4'-biphenol ester, trimellitic anhydride and 3,3', 5,5'-Tetramethyl-4,4'-biphenol ester, 4,4'-oxydiphthalic dianhydride, 3,3',4,4'-biphenyltetracarboxylic acid Anhydride, 2,2',3,3'-biphenyltetracarboxylic dianhydride, 6FDA, bis(3,4-dicarboxyphenyl)methane dianhydride, and 4,4'-(p-phenylenedioxy) Diphthalic dianhydride. These can be used individually or in combination of 2 or more types.

作為脂肪族四羧酸二酐,可例舉環式或非環式之脂肪族四羧酸二酐。環式脂肪族四羧酸二酐係指具有脂環式烴結構之四羧酸二酐,作為其具體例,可例舉1,2,4,5-環己烷四羧酸二酐、1,2,3,4-環丁烷四羧酸二酐、1,2,3,4-環戊烷四羧酸二酐等環烷烴四羧酸二酐、雙環[2.2.2]辛-7-烯-2,3,5,6-四羧酸二酐、二環己基-3,3',4,4'-四羧酸二酐及該等之位置異構物。該等可單獨使用或將2種以上組合使用。作為非環式脂肪族四羧酸二酐之具體例,可例舉1,2,3,4-丁烷四羧酸二酐及1,2,3,4-戊烷四羧酸二酐等,該等可單獨使用或將2種以上組合使用。又,亦可將環式脂肪族四羧酸二酐與非環式脂肪族四羧酸二酐組合使用。The aliphatic tetracarboxylic dianhydride may, for example, be a cyclic or acyclic aliphatic tetracarboxylic dianhydride. Cycloaliphatic tetracarboxylic dianhydride refers to a tetracarboxylic dianhydride having an alicyclic hydrocarbon structure. As a specific example, 1,2,4,5-cyclohexanetetracarboxylic dianhydride, 1 , 2,3,4-cyclobutane tetracarboxylic dianhydride, 1,2,3,4-cyclopentane tetracarboxylic dianhydride and other cycloalkane tetracarboxylic dianhydride, bicyclo[2.2.2]oct-7 -En-2,3,5,6-tetracarboxylic dianhydride, dicyclohexyl-3,3',4,4'-tetracarboxylic dianhydride and their positional isomers. These can be used individually or in combination of 2 or more types. As a specific example of acyclic aliphatic tetracarboxylic dianhydride, 1,2,3,4-butane tetracarboxylic dianhydride and 1,2,3,4-pentane tetracarboxylic dianhydride, etc. may be mentioned These can be used alone or in combination of two or more. Moreover, cycloaliphatic tetracarboxylic dianhydride and acyclic aliphatic tetracarboxylic dianhydride can also be used in combination.

上述四羧酸二酐之中,就容易提高光學膜之耐力及透明性之觀點而言,較佳為偏苯三甲酸酐與2,2',3,3',5,5'-六甲基-4,4'-聯苯酚之酯化物、偏苯三甲酸酐與2,2',3,3'-四甲基-4,4'-聯苯酚之酯化物、偏苯三甲酸酐與3,3',5,5'-四甲基-4,4'-聯苯酚之酯化物、PMDA、4,4'-氧二鄰苯二甲酸二酐、3,3',4,4'-二苯甲酮四羧酸二酐、3,3',4,4'-聯苯四羧酸二酐、2,2',3,3'-聯苯四羧酸二酐、3,3',4,4'-二苯碸四羧酸二酐、2,2-雙(3,4-二羧基苯基)丙烷二酐、6FDA以及該等之混合物,更佳為偏苯三甲酸酐與2,2',3,3',5,5'-六甲基-4,4'-聯苯酚之酯化物、偏苯三甲酸酐與2,2',3,3'-四甲基-4,4'-聯苯酚之酯化物、偏苯三甲酸酐與3,3',5,5'-四甲基-4,4'-聯苯酚之酯化物、6FDA以及該等之混合物。Among the above-mentioned tetracarboxylic dianhydrides, in terms of easily improving the durability and transparency of the optical film, trimellitic anhydride and 2,2',3,3',5,5'-hexamethyl are preferred -4,4'-biphenol ester, trimellitic anhydride and 2,2',3,3'-tetramethyl-4,4'-biphenol ester, trimellitic anhydride and 3,3 ',5,5'-Tetramethyl-4,4'-biphenol ester, PMDA, 4,4'-oxydiphthalic dianhydride, 3,3',4,4'-diphenyl Ketonetetracarboxylic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 2,2',3,3'-biphenyltetracarboxylic dianhydride, 3,3',4 ,4'-Diphenylbenzenetetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxyphenyl)propane dianhydride, 6FDA and mixtures of these, more preferably trimellitic anhydride and 2,2 ',3,3',5,5'-hexamethyl-4,4'-biphenol ester, trimellitic anhydride and 2,2',3,3'-tetramethyl-4,4' -The ester of biphenol, the ester of trimellitic anhydride and 3,3',5,5'-tetramethyl-4,4'-biphenol, 6FDA and their mixtures.

作為聚醯胺醯亞胺樹脂之合成中使用之二羧酸化合物,可例舉芳香族二羧酸、脂肪族二羧酸及與其等類性之醯氯化合物、酸酐等,亦可將2種以上併用。作為具體例,可例舉:對苯二甲酸;2,5-雙(三氟甲基)對苯二甲酸;間苯二甲酸;2,5-二甲基對苯二甲酸;2,5-二甲氧基對苯二甲酸;萘二羧酸;4,4'-聯苯二羧酸;3,3'-聯苯二羧酸;2,2'-雙(三氟甲基)-4,4'-聯苯二羧酸;碳數8以下之鏈式烴之二羧酸化合物;及2個苯甲酸經由單鍵、-CH2 -、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -或伸苯基連結而成之化合物;以及其等之醯氯化合物。該等二羧酸化合物之中,就容易提高光學膜之耐力及透明性之觀點而言,較佳為4,4'-氧基雙苯甲酸、對苯二甲酸、間苯二甲酸、2-甲氧基對苯二甲醯氯、2,5-二甲基對苯二甲酸、2,5-二甲氧基對苯二甲酸、2,5-雙(三氟甲基)對苯二甲酸、2,2'-雙(三氟甲基)-4,4'-聯苯二羧酸及其等之醯氯,更佳為2-甲氧基對苯二甲醯氯、4,4'-氧基雙(苯甲醯氯)、2,5-二甲基對苯二甲醯氯、2,5-二甲氧基對苯二甲醯氯、2,5-雙(三氟甲基)對苯二甲醯氯、對苯二甲醯氯(以下,有時記作TPC)、間苯二甲醯氯,進而較佳為TPC、2-甲氧基對苯二甲醯氯、2,5-二甲基對苯二甲醯氯、2,5-二甲氧基對苯二甲醯氯。As the dicarboxylic acid compound used in the synthesis of polyamide imide resins, aromatic dicarboxylic acids, aliphatic dicarboxylic acids, and similar chlorinated compounds, acid anhydrides, etc., can be exemplified. Two kinds of Use the above. Specific examples include: terephthalic acid; 2,5-bis(trifluoromethyl)terephthalic acid; isophthalic acid; 2,5-dimethylterephthalic acid; 2,5- Dimethoxyterephthalic acid; naphthalene dicarboxylic acid; 4,4'-biphenyl dicarboxylic acid; 3,3'-biphenyl dicarboxylic acid; 2,2'-bis(trifluoromethyl)-4 ,4'-Biphenyl dicarboxylic acid; a dicarboxylic acid compound of chain hydrocarbon with carbon number 8 or less; and two benzoic acids via a single bond, -CH 2 -, -C(CH 3 ) 2 -, -C( CF 3 ) 2 -, -SO 2 -or phenylene-linked compounds; and other chlorinated compounds. Among these dicarboxylic acid compounds, 4,4'-oxybisbenzoic acid, terephthalic acid, isophthalic acid, 2- Methoxy terephthalate chloride, 2,5-dimethylterephthalic acid, 2,5-dimethoxyterephthalic acid, 2,5-bis(trifluoromethyl)terephthalic acid , 2,2'-bis(trifluoromethyl)-4,4'-biphenyl dicarboxylic acid and its chlorinated acids, more preferably 2-methoxyterephthalate chloride, 4,4' -Oxybis(benzyl chloride), 2,5-dimethylterephthalate chloride, 2,5-dimethoxyterephthalate chloride, 2,5-bis(trifluoromethyl) ) Terephthalate chloride, terephthalate chloride (hereinafter, sometimes referred to as TPC), m-phthalate chloride, more preferably TPC, 2-methoxy-terephthalate chloride, 2 ,5-Dimethylterephthalate chloride, 2,5-Dimethoxyterephthalate chloride.

再者,關於上述聚醯胺醯亞胺樹脂,於無損光學膜之各種物性之範圍內,亦可為除上述聚醯胺醯亞胺樹脂合成中使用之四羧酸化合物以外,進而與其他四羧酸及三羧酸以及其等之酐及衍生物反應而成者。Furthermore, regarding the above-mentioned polyimide resin, within the range of not damaging the various physical properties of the optical film, it may also be used in addition to the tetracarboxylic acid compound used in the synthesis of the above-mentioned polyimide resin, and in addition to other tetracarboxylic acid compounds. It is formed by the reaction of carboxylic acid, tricarboxylic acid, and their anhydrides and derivatives.

作為其他四羧酸,可例舉上述四羧酸化合物之酐之水加成物。Examples of other tetracarboxylic acids include water adducts of anhydrides of the above-mentioned tetracarboxylic acid compounds.

作為三羧酸化合物,可例舉芳香族三羧酸、脂肪族三羧酸及與其等類性之醯氯化合物、酸酐等,亦可將2種以上組合使用。作為具體例,可例舉:1,2,4-苯三羧酸之酐;2,3,6-萘三羧酸-2,3-酐;鄰苯二甲酸酐與苯甲酸經由單鍵、-O-、-CH2 -、-C(CH3 )2 -、-C(CF3 )2 -、-SO2 -或伸苯基連結而成之化合物。The tricarboxylic acid compound may, for example, be aromatic tricarboxylic acid, aliphatic tricarboxylic acid, and similar chlorinated compounds, acid anhydrides, etc., and may be used in combination of two or more kinds. Specific examples include: 1,2,4-benzenetricarboxylic acid anhydride; 2,3,6-naphthalenetricarboxylic acid-2,3-anhydride; phthalic anhydride and benzoic acid via a single bond, -O-, -CH 2 -, -C(CH 3 ) 2 -, -C(CF 3 ) 2 -, -SO 2 -or phenylene-linked compound.

作為聚醯胺醯亞胺樹脂之合成中使用之二胺化合物,例如可例舉脂肪族二胺、芳香族二胺及該等之混合物。再者,於本實施方式中,「芳香族二胺」表示胺基直接鍵結於芳香環而成之二胺,亦可於其結構之一部分中包含脂肪族基或其他取代基。該芳香環可為單環,亦可為縮合環,可例示苯環、萘環、蒽環及茀環等,但並不限定於該等。該等之中,較佳為苯環。又,「脂肪族二胺」表示胺基直接鍵結於脂肪族基而成之二胺,亦可於其結構之一部分中包含芳香環或其他取代基。As the diamine compound used in the synthesis of the polyimide resin, for example, aliphatic diamine, aromatic diamine, and mixtures thereof can be mentioned. Furthermore, in this embodiment, "aromatic diamine" means a diamine in which an amine group is directly bonded to an aromatic ring, and an aliphatic group or other substituents may be included in a part of the structure. The aromatic ring may be a monocyclic ring or a condensed ring. Examples of the aromatic ring include a benzene ring, a naphthalene ring, an anthracene ring, and a sulphur ring, but are not limited to these. Among them, a benzene ring is preferred. In addition, "aliphatic diamine" means a diamine in which an amine group is directly bonded to an aliphatic group, and an aromatic ring or other substituents may be included in a part of the structure.

作為脂肪族二胺,例如可例舉:六亞甲基二胺等非環式脂肪族二胺;以及1,3-雙(胺基甲基)環己烷、1,4-雙(胺基甲基)環己烷、降𦯉烷二胺及4,4'-二胺基二環己基甲烷等環式脂肪族二胺等。該等可單獨使用或將2種以上組合使用。As aliphatic diamines, for example, acyclic aliphatic diamines such as hexamethylene diamine; and 1,3-bis(aminomethyl)cyclohexane, 1,4-bis(amino) Cycloaliphatic diamines such as methyl)cyclohexane, noralkylene diamine and 4,4'-diaminodicyclohexylmethane, etc. These can be used individually or in combination of 2 or more types.

作為芳香族二胺,例如可例舉:對苯二胺、間苯二胺、2,4-甲苯二胺、間苯二甲胺、對苯二甲胺、1,5-二胺基萘、2,6-二胺基萘等具有1個芳香環之芳香族二胺;4,4'-二胺基二苯甲烷、4,4'-二胺基二苯丙烷、4,4'-二胺基二苯醚、3,4'-二胺基二苯醚、3,3'-二胺基二苯醚、4,4'-二胺基二苯碸、3,4'-二胺基二苯碸、3,3'-二胺基二苯碸、1,4-雙(4-胺基苯氧基)苯、1,3-雙(4-胺基苯氧基)苯、雙[4-(4-胺基苯氧基)苯基]碸、雙[4-(3-胺基苯氧基)苯基]碸、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2-雙[4-(3-胺基苯氧基)苯基]丙烷、2,2'-二甲基聯苯胺、2,2'-雙(三氟甲基)-4,4'-二胺基聯苯(以下,有時記作TFMB)、4,4'-(六氟亞丙基)二苯胺(以下,有時記作6FDAM)、4,4'-雙(4-胺基苯氧基)聯苯、9,9-雙(4-胺基苯基)茀、9,9-雙(4-胺基-3-甲基苯基)茀、9,9-雙(4-胺基-3-氯苯基)茀、9,9-雙(4-胺基-3-氟苯基)茀等具有2個以上之芳香環之芳香族二胺。該等可單獨使用或將2種以上組合使用。As aromatic diamines, for example, p-phenylenediamine, m-phenylenediamine, 2,4-toluenediamine, m-xylylenediamine, p-xylylenediamine, 1,5-diaminonaphthalene, 2,6-diaminonaphthalene and other aromatic diamines with one aromatic ring; 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylpropane, 4,4'-di Aminodiphenyl ether, 3,4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether Diphenyl benzene, 3,3'-diaminodiphenyl benzene, 1,4-bis(4-aminophenoxy)benzene, 1,3-bis(4-aminophenoxy)benzene, bis[ 4-(4-aminophenoxy) phenyl] chrysene, bis[4-(3-aminophenoxy) phenyl] chrysene, 2,2-bis[4-(4-aminophenoxy) )Phenyl]propane, 2,2-bis[4-(3-aminophenoxy)phenyl]propane, 2,2'-dimethylbenzidine, 2,2'-bis(trifluoromethyl) )-4,4'-diaminobiphenyl (hereinafter, sometimes referred to as TFMB), 4,4'-(hexafluoropropylene) diphenylamine (hereinafter, sometimes referred to as 6FDAM), 4,4' -Bis(4-aminophenoxy)biphenyl, 9,9-bis(4-aminophenyl)pyridium, 9,9-bis(4-amino-3-methylphenyl)pyridium, 9 , 9-bis(4-amino-3-chlorophenyl) pyrene, 9,9-bis(4-amino-3-fluorophenyl) pyrene, and other aromatic diamines with more than two aromatic rings. These can be used individually or in combination of 2 or more types.

作為芳香族二胺,較佳為4,4'-二胺基二苯甲烷、4,4'-二胺基二苯丙烷、4,4'-二胺基二苯醚、3,3'-二胺基二苯醚、4,4'-二胺基二苯碸、3,3'-二胺基二苯碸、1,4-雙(4-胺基苯氧基)苯、雙[4-(4-胺基苯氧基)苯基]碸、雙[4-(3-胺基苯氧基)苯基]碸、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2-雙[4-(3-胺基苯氧基)苯基]丙烷、2,2'-二甲基聯苯胺、TFMB、4,4'-雙(4-胺基苯氧基)聯苯,更佳為4,4'-二胺基二苯甲烷、4,4'-二胺基二苯丙烷、4,4'-二胺基二苯醚、4,4'-二胺基二苯碸、1,4-雙(4-胺基苯氧基)苯、雙[4-(4-胺基苯氧基)苯基]碸、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2'-二甲基聯苯胺、(TFMB、6FDAM、4,4'-雙(4-胺基苯氧基)聯苯。該等可單獨使用或將2種以上組合使用。As the aromatic diamine, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenyl ether, 3,3'- Diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfide, 3,3'-diaminodiphenyl sulfide, 1,4-bis(4-aminophenoxy)benzene, bis[4 -(4-Aminophenoxy) phenyl] ash, bis[4-(3-aminophenoxy) phenyl] ash, 2,2-bis[4-(4-aminophenoxy) Phenyl]propane, 2,2-bis[4-(3-aminophenoxy)phenyl]propane, 2,2'-dimethylbenzidine, TFMB, 4,4'-bis(4-amine Phenyloxy)biphenyl, more preferably 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenyl ether, 4,4 '-Diaminodiphenyl sulfide, 1,4-bis(4-aminophenoxy)benzene, bis[4-(4-aminophenoxy)phenyl] sulfide, 2,2-bis[4 -(4-Aminophenoxy)phenyl]propane, 2,2'-dimethylbenzidine, (TFMB, 6FDAM, 4,4'-bis(4-aminophenoxy)biphenyl. The It can be used individually or in combination of 2 or more types.

上述二胺化合物之中,就容易提高光學膜之耐力及透明性之觀點而言,更佳為使用選自由2,2'-二甲基聯苯胺、TFMB、4,4'-雙(4-胺基苯氧基)聯苯、6FDAM及4,4'-二胺基二苯醚所組成之群中之1種以上,進而較佳為使用TFMB及/或(6FDAM)。Among the above-mentioned diamine compounds, it is more preferable to use 2,2'-dimethylbenzidine, TFMB, 4,4'-bis(4- One or more of the group consisting of aminophenoxy)biphenyl, 6FDAM, and 4,4'-diaminodiphenyl ether, and it is more preferable to use TFMB and/or (6FDAM).

聚醯胺醯亞胺樹脂之製造中,二胺化合物、四羧酸化合物及二羧酸化合物之使用量可根據所需之樹脂之各結構單元之比率適當選擇。In the production of polyimide resin, the amount of diamine compound, tetracarboxylic acid compound, and dicarboxylic acid compound used can be appropriately selected according to the ratio of each structural unit of the resin required.

於本發明之較佳實施方式中,於將四羧酸化合物與二羧酸化合物之總莫耳量設為1莫耳時,二胺化合物之使用量較佳為0.94莫耳以上,更佳為0.96莫耳以上,進而較佳為0.98莫耳以上,尤佳為0.99莫耳以上,較佳為1.20莫耳以下,更佳為1.10莫耳以下,進而較佳為1.05莫耳以下,尤佳為1.02莫耳以下。若二胺化合物相對於四羧酸化合物及二羧酸化合物之使用量處於上述範圍內,則容易獲得高分子量之聚醯胺醯亞胺樹脂,容易提高光學膜之耐力及透明性。 In a preferred embodiment of the present invention, when the total molar amount of the tetracarboxylic acid compound and the dicarboxylic acid compound is set to 1 mol, the usage amount of the diamine compound is preferably 0.94 mol or more, more preferably 0.96 mol or more, more preferably 0.98 mol or more, particularly preferably 0.99 mol or more, preferably 1.20 mol or less, more preferably 1.10 mol or less, still more preferably 1.05 mol or less, particularly preferably 1.02 mol or less. If the usage amount of the diamine compound relative to the tetracarboxylic acid compound and the dicarboxylic acid compound is within the above range, it is easy to obtain a high molecular weight polyamide imide resin, and it is easy to improve the durability and transparency of the optical film.

二胺化合物與四羧酸化合物之反應溫度並無特別限定,例如可為5~200℃,反應時間亦無特別限定,例如可為30分鐘~72小時左右。於本發明之較佳實施方式中,就容易獲得高分子量之聚醯胺醯亞胺樹脂之觀點而言,反應溫度較佳為5~50℃,更佳為5~40℃,進而較佳為5~25℃,反應時間較佳為3~24小時,更佳為5~20小時。The reaction temperature of the diamine compound and the tetracarboxylic acid compound is not particularly limited, and may be, for example, 5 to 200°C, and the reaction time is also not particularly limited, and may be, for example, about 30 minutes to 72 hours. In a preferred embodiment of the present invention, from the viewpoint of easily obtaining a high molecular weight polyimide resin, the reaction temperature is preferably 5-50°C, more preferably 5-40°C, and still more preferably At 5-25°C, the reaction time is preferably 3-24 hours, more preferably 5-20 hours.

二胺化合物與四羧酸化合物之反應較佳為於溶劑中進行。作為溶劑,只要不對反應造成影響即可,無特別限定,例如可例舉:水、甲醇、乙醇、乙二醇、異丙醇、丙二醇、乙二醇甲基醚、乙二醇丁基醚、1-甲氧基-2-丙醇、2-丁氧基乙醇、丙二醇單甲醚等醇系溶劑;乙酸乙酯、乙酸丁酯、乙二醇甲醚乙酸酯、γ-丁內酯、γ-戊內酯、丙二醇甲醚乙酸酯、乳酸乙酯等酯系溶劑;丙酮、甲基乙基酮、環戊酮、環己酮、2-庚酮、甲基異丁酮等酮系溶劑;戊烷、己烷、庚烷等脂肪族烴溶劑;乙基環己烷等脂環式烴溶劑;甲苯、二甲苯等芳香族烴溶劑;乙腈等腈系溶劑;四氫呋喃及二甲氧基乙烷等醚系溶劑;氯仿及氯苯等含氯溶劑;N,N-二甲基乙醯胺(以下,有時記作DMAc)、N,N-二甲基甲醯胺(以下,有時記作DMF)等醯胺系溶劑;二甲基碸、二甲基亞碸、環丁碸等含硫系溶劑;碳酸乙二酯、碳酸丙二酯等碳酸酯系溶劑;及其等之組合等。該等之中,就溶解性之觀點而言,較佳為使用醯胺系溶劑。The reaction of the diamine compound and the tetracarboxylic acid compound is preferably carried out in a solvent. The solvent is not particularly limited as long as it does not affect the reaction. For example, water, methanol, ethanol, ethylene glycol, isopropanol, propylene glycol, ethylene glycol methyl ether, ethylene glycol butyl ether, Alcohol solvents such as 1-methoxy-2-propanol, 2-butoxyethanol, propylene glycol monomethyl ether; ethyl acetate, butyl acetate, ethylene glycol methyl ether acetate, γ-butyrolactone, Ester solvents such as γ-valerolactone, propylene glycol methyl ether acetate and ethyl lactate; ketones such as acetone, methyl ethyl ketone, cyclopentanone, cyclohexanone, 2-heptanone, methyl isobutyl ketone, etc. Solvents; aliphatic hydrocarbon solvents such as pentane, hexane and heptane; alicyclic hydrocarbon solvents such as ethylcyclohexane; aromatic hydrocarbon solvents such as toluene and xylene; nitrile solvents such as acetonitrile; tetrahydrofuran and dimethoxy Ether solvents such as ethane; chlorine-containing solvents such as chloroform and chlorobenzene; N,N-dimethylacetamide (hereinafter, sometimes referred to as DMAc), N,N-dimethylformamide (hereinafter, there are DMF) and other amine-based solvents; sulfur-containing solvents such as dimethyl sulfide, dimethyl sulfide, and cyclobutyl sulfide; carbonate-based solvents such as ethylene carbonate and propylene carbonate; and the like Combination etc. Among these, from the viewpoint of solubility, it is preferable to use an amide-based solvent.

於本發明之較佳實施方式中,就容易獲得高分子量之聚醯胺醯亞胺樹脂之觀點而言,反應中使用之溶劑較佳為嚴格脫水直至水分量為700 ppm以下為止之溶劑。In a preferred embodiment of the present invention, from the viewpoint of easily obtaining a high molecular weight polyimide resin, the solvent used in the reaction is preferably a solvent that is strictly dehydrated until the moisture content is 700 ppm or less.

二胺化合物與四羧酸化合物之反應亦可視需要於氮氣或氬氣等惰性氣體氛圍或減壓之條件下進行,就容易獲得高分子量之聚醯胺醯亞胺樹脂之觀點而言,較佳為於與上述相同之惰性氣體氛圍下,一面於嚴格控制之脫水溶劑中進行攪拌,一面進行反應。The reaction of the diamine compound and the tetracarboxylic acid compound can also be carried out under an inert gas atmosphere such as nitrogen or argon or under reduced pressure conditions. From the viewpoint of easily obtaining a high molecular weight polyimide resin, it is preferred In order to carry out the reaction while stirring in a strictly controlled dehydration solvent under the same inert gas atmosphere as the above.

關於聚醯胺酸及二羧酸之製造條件,自二胺化合物與四羧酸化合物之反應中之製造條件適當選擇即可。 Regarding the production conditions of the polyamide acid and the dicarboxylic acid, the production conditions in the reaction of the diamine compound and the tetracarboxylic acid compound may be appropriately selected.

作為醯亞胺化步驟中使用之醯亞胺化觸媒,例如可例舉:三丙基胺、二丁基丙基胺、乙基二丁基胺等脂肪族胺;N-乙基哌啶、N-丙基哌啶、N-丁基吡咯啶、N-丁基哌啶、及N-丙基六氫氮呯等脂環式胺(單環式);氮雜雙環[2.2.1]庚烷、氮雜雙環[3.2.1]辛烷、氮雜雙環[2.2.2]辛烷及氮雜雙環[3.2.2]壬烷等脂環式胺(多環式);以及吡啶、2-甲基吡啶(2-picoline)、3-甲基吡啶(3-picoline)、4-甲基吡啶(4-picoline)、2-乙基吡啶、3-乙基吡啶、4-乙基吡啶、2,4-二甲基吡啶、2,4,6-三甲基吡啶、3,4-環戊烯吡啶、5,6,7,8-四氫異喹啉及異喹啉等芳香族胺。又,就容易促進醯亞胺化反應之觀點而言,較佳為與醯亞胺化觸媒一起使用酸酐。酸酐可例舉醯亞胺化反應中使用之慣用酸酐等,作為其具體例,可例舉:乙酸酐、丙酸酐、丁酸酐等脂肪族酸酐;鄰苯二甲酸等芳香族酸之酐等。As the imidization catalyst used in the imidization step, for example, aliphatic amines such as tripropylamine, dibutylpropylamine, and ethyldibutylamine; N-ethylpiperidine , N-propylpiperidine, N-butylpyrrolidine, N-butylpiperidine, and N-propyl hexahydroazepine and other alicyclic amines (monocyclic); azabicyclo[2.2.1] Heptane, azabicyclo[3.2.1]octane, azabicyclo[2.2.2]octane and azabicyclo[3.2.2]nonane and other alicyclic amines (polycyclic); and pyridine, 2 -Picoline (2-picoline), 3-picoline (3-picoline), 4-picoline (4-picoline), 2-ethylpyridine, 3-ethylpyridine, 4-ethylpyridine, Aromatic amines such as 2,4-lutidine, 2,4,6-trimethylpyridine, 3,4-cyclopentenepyridine, 5,6,7,8-tetrahydroisoquinoline and isoquinoline . In addition, from the viewpoint of facilitating the promotion of the imidization reaction, it is preferable to use an acid anhydride together with the imidization catalyst. The acid anhydride may, for example, be a conventional acid anhydride used in an imidization reaction, and specific examples thereof may include aliphatic anhydrides such as acetic anhydride, propionic anhydride, and butyric anhydride; anhydrides of aromatic acids such as phthalic acid, and the like.

於本發明之較佳實施方式中,較佳為階段性地進行醯亞胺化步驟,升溫直至最佳反應溫度為止。藉由階段性地進行醯亞胺化,容易抑制樹脂之分解,容易獲得高分子量之聚醯胺醯亞胺樹脂。階段性地進行之醯亞胺化步驟中,使其升溫之反應溫度較佳為40~85℃,更佳為45~80℃。若反應溫度處於上述範圍內,則存在醯亞胺化反應充分進行之傾向,又,存在Mw充分提高之傾向。其反應時間較佳為30分鐘~10小時,更佳為30分鐘~5小時。若反應時間處於上述範圍內,則容易抑制樹脂產生分解而使Mw降低之情況,又,容易抑制醯亞胺化率降低而於其後之步驟中分解成低分子之情況。如此,除上文所述之合成條件以外,亦對醯亞胺化步驟進行控制,藉此能夠獲得高分子量之樹脂。In a preferred embodiment of the present invention, it is preferable to carry out the imidization step step by step, and raise the temperature until the optimal reaction temperature. By carrying out the imidization step by step, it is easy to inhibit the decomposition of the resin, and it is easy to obtain a high molecular weight polyimide resin. In the stepwise imidization step, the reaction temperature for raising the temperature is preferably 40 to 85°C, more preferably 45 to 80°C. If the reaction temperature is within the above range, there is a tendency for the imidization reaction to proceed sufficiently, and there is a tendency for Mw to be sufficiently increased. The reaction time is preferably 30 minutes to 10 hours, more preferably 30 minutes to 5 hours. If the reaction time is within the above range, it is easy to suppress the decomposition of the resin to reduce the Mw, and it is easy to suppress the decrease in the imidization rate and decomposition into low molecules in the subsequent steps. In this way, in addition to the above-mentioned synthesis conditions, the imidization step is also controlled, whereby a high molecular weight resin can be obtained.

聚醯胺醯亞胺樹脂可藉由慣用方法、例如過濾、濃縮、萃取、晶析、再結晶、管柱層析法等分離方法或將該等組合之分離方法進行分離精製,從而進行單離,於較佳態樣中,可藉由於包含透明聚醯胺醯亞胺樹脂之反應液中添加大量之甲醇等醇而使樹脂析出後,進行濃縮、過濾、乾燥等,從而進行單離。The polyimide resin can be separated and purified by conventional methods, such as separation methods such as filtration, concentration, extraction, crystallization, recrystallization, column chromatography, or a combination of these separation methods, to be isolated and purified. In a preferred aspect, a large amount of methanol and other alcohols are added to the reaction liquid containing the transparent polyimide resin to precipitate the resin, and then the resin can be concentrated, filtered, dried, etc. to perform isolation.

本發明包括包含本發明之聚醯胺醯亞胺樹脂之光學膜。本發明之光學膜包含聚醯胺醯亞胺樹脂。本發明之光學膜可包含1種聚醯胺醯亞胺樹脂,亦可包含2種以上之聚醯胺醯亞胺樹脂。本發明之光學膜中之聚醯胺醯亞胺樹脂之含量相對於光學膜100質量份,較佳為10質量份以上,更佳為30質量份以上,進而較佳為50質量份以上,較佳為99.5質量份以下,更佳為95質量份以下。若聚醯胺醯亞胺樹脂之含量處於上述範圍內,則容易提高光學膜之光學特性、耐衝擊性及彈性模數、以及耐力。The present invention includes an optical film containing the polyamide imide resin of the present invention. The optical film of the present invention contains a polyamide imide resin. The optical film of the present invention may include one type of polyamide resin, or two or more types of polyamide resin. The content of the polyamide imine resin in the optical film of the present invention is preferably 10 parts by mass or more, more preferably 30 parts by mass or more, and still more preferably 50 parts by mass or more with respect to 100 parts by mass of the optical film. It is preferably 99.5 parts by mass or less, and more preferably 95 parts by mass or less. If the content of the polyimide resin is within the above range, it is easy to improve the optical properties, impact resistance, elastic modulus, and endurance of the optical film.

本發明之光學膜由於包含上述聚醯胺醯亞胺樹脂,故能夠兼顧高耐力與較高透明性。因此,本發明之聚醯胺醯亞胺樹脂及光學膜可良好地用於可撓性顯示裝置之材料等。再者,於本說明書中,透明性可藉由全光線透過率及霧度等進行評價,透明性提高或提昇係指全光線透過率較高、及/或霧度較低、及/或YI值較低。Since the optical film of the present invention contains the above-mentioned polyimide resin, it can achieve both high durability and high transparency. Therefore, the polyimide resin and optical film of the present invention can be suitably used as materials for flexible display devices. Furthermore, in this specification, transparency can be evaluated by total light transmittance and haze, etc. Increased or improved transparency means higher total light transmittance, and/or lower haze, and/or YI The value is low.

本發明之光學膜能夠顯示出較高之耐力。該光學膜之耐力較佳為90 MPa以上,更佳為95Mpa以上,進而較佳為100 MPa以上,尤佳為105 MPa以上,通常為200 MPa以下。若耐力為上述下限值以上,則容易提高光學膜之耐彎曲性、尤其是耐折性。作為可能會影響光學膜之耐彎曲性之物性值,對彈性模數等各種物性值進行了研究,根據本發明人等之研究可知,僅藉由提高彈性模數,有時無法達成充分之耐折性。因此,為了進一步提高耐折性,本發明人等對各種物性值進行研究後得知,藉由提高光學膜之耐力,能夠充分提高耐折性。再者,耐力可用拉伸試驗機進行測定,例如可藉由實施例中記載之方法進行測定。 The optical film of the present invention can show high endurance. The endurance of the optical film is preferably 90 MPa or more, more preferably 95 MPa or more, more preferably 100 MPa or more, particularly preferably 105 MPa or more, and usually 200 MPa or less. If the endurance is more than the above lower limit, it is easy to improve the bending resistance of the optical film, especially the folding resistance. Various physical properties such as elastic modulus have been studied as the physical property values that may affect the bending resistance of the optical film. According to the research of the present inventors, it is known that only by increasing the elastic modulus, sufficient resistance may sometimes not be achieved. Foldability. Therefore, in order to further improve the folding endurance, the inventors studied various physical properties and found that by improving the endurance of the optical film, the folding endurance can be sufficiently improved. In addition, the endurance can be measured with a tensile testing machine, for example, by the method described in the examples.

於本發明之較佳實施方式中,本發明之光學膜之全光線透過率、較佳為厚度40 μm下之全光線透過率較佳為85%以上,更佳為88%以上,進而較佳為超過88%,進而更佳為90%以上,尤佳為91%以上。若全光線透過率為上述下限值以上,則能夠提高光學膜之透明性,例如於用於顯示裝置之前面板等之情形時,能夠表現出較高之視認性。全光線透過率之上限通常為100%以下。本發明之光學膜通常顯示出較高之全光線透過率,因此,與例如使用透過率較低之膜之情形相比,能夠抑制獲得一定亮度所需之顯示元件等之發光強度。因此,能夠削減消耗電力。例如,於將本發明之光學膜組裝至顯示裝置中之情形時,存在即便減少背光裝置之光量亦能夠獲得明亮顯示之傾向,能夠有助於節約能源。又,全光線透過率可依據JIS K 7105:1981,使用霧度計來進行測定,例如可藉由實施例中記載之方法進行測定。又,於本說明書中,全光線透過率亦可設為本發明之光學膜之厚度範圍內之全光線透過率。全光線透過率可為下述光學膜之厚度範圍內之全光線透過率。再者,於本說明書中,光學膜之光學特性優異係指全光線透過率較高、及/或霧度較低、及/或YI值較低,有時以與透明性提高或提昇相同之含義使用。 In a preferred embodiment of the present invention, the total light transmittance of the optical film of the present invention, preferably at a thickness of 40 μm, is preferably 85% or more, more preferably 88% or more, and more preferably It is more than 88%, more preferably 90% or more, and particularly preferably 91% or more. If the total light transmittance is more than the above lower limit, the transparency of the optical film can be improved. For example, when it is used in the front panel of a display device, it can exhibit high visibility. The upper limit of total light transmittance is usually below 100%. The optical film of the present invention generally exhibits a higher total light transmittance, and therefore, compared with the case where a film with a lower transmittance is used, for example, the luminous intensity of a display element required to obtain a certain brightness can be suppressed. Therefore, power consumption can be reduced. For example, when the optical film of the present invention is assembled into a display device, there is a tendency to obtain a bright display even if the amount of light of the backlight device is reduced, which can contribute to energy saving. In addition, the total light transmittance can be measured using a haze meter in accordance with JIS K 7105:1981, for example, it can be measured by the method described in the examples. In addition, in this specification, the total light transmittance can also be set as the total light transmittance within the thickness range of the optical film of the present invention. The total light transmittance can be the total light transmittance within the thickness range of the following optical film. Furthermore, in this specification, the excellent optical properties of the optical film means that the total light transmittance is higher, and/or the haze is lower, and/or the YI value is lower, sometimes the same as the increase or improvement of transparency. Meaning use.

於本發明之較佳實施方式中,本發明之光學膜之霧度、較佳為厚度40 μm下之霧度較佳為2.0%以下,更佳為1.5%以下,進而較佳為1.0%以下,進而更佳為0.8%以下,尤佳為0.5%以下,尤其更佳為0.3%以下,通常為0%以上。若光學膜之霧度為上述上限值以下,則能夠提高光學膜之透明性,例如於用於顯示裝置之前面板等之情形時,能夠表現出較高之視認性。再者,霧度可依據JIS K 7136:2000,使用霧度計等來進行測定,例如可藉由實施例中記載之方法進行測定。又,於本說明書中,霧度可處於下述光學膜之厚度範圍內。 In a preferred embodiment of the present invention, the haze of the optical film of the present invention, preferably at a thickness of 40 μm, is preferably 2.0% or less, more preferably 1.5% or less, and still more preferably 1.0% or less , Still more preferably 0.8% or less, particularly preferably 0.5% or less, especially more preferably 0.3% or less, and usually 0% or more. If the haze of the optical film is below the above upper limit, the transparency of the optical film can be improved. For example, when it is used in a front panel of a display device, it can exhibit high visibility. In addition, the haze can be measured using a haze meter or the like in accordance with JIS K 7136:2000, for example, it can be measured by the method described in the examples. In addition, in this specification, the haze may be within the thickness range of the following optical film.

於本發明之較佳實施方式中,本發明之光學膜之YI值較佳為未達3.0,更佳為2.8以下,進而較佳為2.5以下。若光學膜之YI值為上述上限值以下,則能夠提高光學膜之透明性,於用於顯示裝置之前面板等之情形時,能夠表現出較高之視認性。又,黃度通常為-5以上,較佳為-2以上。再者,YI值可以如下方式算出,即,使用紫外可見近紅外分光光度計,針對300~800 nm之光進行透過率測定,求出3刺激值(X、Y、Z),並基於YI=100×(1.2769X-1.0592Z)/Y之式而算出。例如,可藉由實施例中記載之方法而算出。 In a preferred embodiment of the present invention, the YI value of the optical film of the present invention is preferably less than 3.0, more preferably 2.8 or less, and still more preferably 2.5 or less. If the YI value of the optical film is less than the above upper limit, the transparency of the optical film can be improved, and when it is used in the front panel of a display device, etc., it can exhibit high visibility. In addition, the yellowness is usually -5 or higher, preferably -2 or higher. Furthermore, the YI value can be calculated as follows, that is, using an ultraviolet-visible-near-infrared spectrophotometer, measuring the transmittance of light from 300 to 800 nm, and obtaining 3 stimulus values (X, Y, Z), and based on YI= 100×(1.2769X-1.0592Z)/Y formula. For example, it can be calculated by the method described in the examples.

於本發明之較佳實施方式中,本發明之光學膜之彈性模數較佳為5.0 GPa以上,更佳為5.5 GPa以上,進而較佳為6.0 GPa以上,通常為15 GPa以下。若彈性模數為上述下限值以上,則容易抑制光學膜之變形,且容易提高耐久性。彈性模數可使用拉伸試驗機進行測定,例如可藉由實施例中記載之方法進行測定。再者,彈性模數係25℃下之值。 In a preferred embodiment of the present invention, the elastic modulus of the optical film of the present invention is preferably 5.0 GPa or more, more preferably 5.5 GPa or more, still more preferably 6.0 GPa or more, and usually 15 GPa or less. If the modulus of elasticity is more than the above lower limit, the deformation of the optical film is easily suppressed and durability is easily improved. The modulus of elasticity can be measured using a tensile testing machine, for example, by the method described in the examples. Furthermore, the modulus of elasticity is the value at 25°C.

於本發明之較佳實施方式中,本發明之光學膜之依據ASTM標準D2176-16之MIT耐折疲勞試驗中之耐折次數較佳為80,000次以上,更佳為100,000次以上,進而較佳為200,000次以上,尤佳為250,000次以上。若耐折次數為上述下限值以上,則即便反覆彎折,亦能夠有效抑制裂痕或破裂等之產生。再者,MIT耐折疲勞試驗可使用MIT耐折疲勞試驗機進行測定,例如可藉由實施例中記載之方法進行測定。 In a preferred embodiment of the present invention, the number of folds in the MIT flex fatigue test according to ASTM standard D2176-16 of the optical film of the present invention is preferably 80,000 or more, more preferably 100,000 or more, and more preferably 200,000 times or more, more preferably 250,000 times or more. If the number of folds is more than the above-mentioned lower limit, even if it is repeatedly bent, it is possible to effectively suppress the occurrence of cracks, cracks, etc. Furthermore, the MIT flex fatigue test can be measured using an MIT flex fatigue tester, for example, it can be measured by the method described in the examples.

全光線透過率及霧度根據光學膜之厚度而發生變化,厚度越厚,全光線透過率越低,霧度越高。即,厚度較厚之膜難以製成全光線透過率較高且霧度較低之光學膜。 另一方面,於本發明之較佳實施方式中,本發明之光學膜具有高水準之透明性,因此,即便厚度相對較厚,亦能夠顯示出較高之全光線透過率及較低之霧度。因此,本發明之光學膜之厚度較佳為10 μm以上,更佳為15 μm以上,進而較佳為20 μm以上,進而更佳為30 μm以上,尤佳為35 μm以上,尤其更佳為40 μm以上,較佳為100 μm以下,更佳為80 μm以下,進而較佳為60 μm以下。光學膜之厚度可用厚度計等進行測定,例如可藉由實施例中記載之方法進行測定。The total light transmittance and haze vary according to the thickness of the optical film. The thicker the thickness, the lower the total light transmittance and the higher the haze. That is, it is difficult for a thicker film to be an optical film with higher total light transmittance and lower haze. On the other hand, in the preferred embodiment of the present invention, the optical film of the present invention has a high level of transparency. Therefore, even if the thickness is relatively thick, it can show higher total light transmittance and lower fog. degree. Therefore, the thickness of the optical film of the present invention is preferably 10 μm or more, more preferably 15 μm or more, still more preferably 20 μm or more, still more preferably 30 μm or more, particularly preferably 35 μm or more, especially more preferably 40 μm or more, preferably 100 μm or less, more preferably 80 μm or less, and still more preferably 60 μm or less. The thickness of the optical film can be measured with a thickness gauge or the like, and can be measured, for example, by the method described in the examples.

<添加劑> 本發明之光學膜除聚醯胺醯亞胺樹脂以外,亦可包含至少1種填料。作為填料,例如可例舉有機粒子、無機粒子等,較佳為例舉無機粒子。作為無機粒子,可例舉二氧化矽、氧化鋯、氧化鋁、二氧化鈦、氧化鋅、氧化鍺、氧化銦、氧化錫、氧化銦錫(ITO)、氧化銻、氧化鈰等金屬氧化物粒子、氟化鎂、氟化鈉等金屬氟化物粒子等,該等之中,就容易提高光學膜之耐力、彈性模數及透明性之觀點而言,較佳為例舉二氧化矽粒子、氧化鋯粒子、氧化鋁粒子,更佳為例舉二氧化矽粒子。該等填料可單獨使用或將2種以上組合使用。<Additives> The optical film of the present invention may include at least one type of filler in addition to the polyimide resin. As the filler, for example, organic particles and inorganic particles may be mentioned, and preferably, inorganic particles may be mentioned. Examples of inorganic particles include metal oxide particles such as silicon dioxide, zirconium oxide, aluminum oxide, titanium dioxide, zinc oxide, germanium oxide, indium oxide, tin oxide, indium tin oxide (ITO), antimony oxide, and cerium oxide, and fluorine Metal fluoride particles such as magnesium fluoride, sodium fluoride, etc. Among them, from the viewpoint of easily improving the endurance, elastic modulus, and transparency of the optical film, silicon dioxide particles and zirconium oxide particles are preferred. , Alumina particles, more preferably silica particles. These fillers can be used alone or in combination of two or more kinds.

填料、較佳為二氧化矽粒子之平均一次粒徑通常為1 nm以上,較佳為5 nm以上,更佳為10 nm以上,進而較佳為15 nm以上,尤佳為20 nm以上,較佳為100 nm以下,更佳為90 nm以下,進而較佳為80 nm以下,進而更佳為70 nm以下,尤佳為60 nm以下,尤其更佳為50 nm以下,尤其進而較佳為40 nm以下。若二氧化矽粒子之平均一次粒徑處於上述範圍內,則容易提高光學膜之耐力、彈性模數及透明性。又,容易抑制二氧化矽粒子之凝聚,容易提高所獲得之光學膜之透明性。填料之平均一次粒徑可藉由BET(Brunauer-Emmett-Teller,布厄特)法進行測定。再者,亦可藉由穿透式電子顯微鏡或掃描式電子顯微鏡之圖像解析來測定平均一次粒徑。The average primary particle size of the filler, preferably silica particles, is usually 1 nm or more, preferably 5 nm or more, more preferably 10 nm or more, still more preferably 15 nm or more, particularly preferably 20 nm or more. It is preferably 100 nm or less, more preferably 90 nm or less, still more preferably 80 nm or less, still more preferably 70 nm or less, particularly preferably 60 nm or less, especially more preferably 50 nm or less, and especially more preferably 40 Below nm. If the average primary particle size of the silica particles is within the above range, it is easy to improve the endurance, elastic modulus, and transparency of the optical film. In addition, it is easy to inhibit the aggregation of silicon dioxide particles, and it is easy to improve the transparency of the obtained optical film. The average primary particle size of the filler can be measured by the BET (Brunauer-Emmett-Teller, Buert) method. Furthermore, the average primary particle size can also be measured by image analysis of a transmission electron microscope or a scanning electron microscope.

於本發明之光學膜含有填料、較佳為二氧化矽粒子之情形時,填料之含量相對於光學膜之質量,通常為0.1質量%以上,較佳為1質量%以上,更佳為5質量%以上,進而較佳為10質量%以上,進而更佳為20質量%以上,尤佳為30質量%以上,較佳為60質量%以下。若填料之含量為上述下限值以上,則容易提高光學膜之耐力、彈性模數及透明性。又,若填料之含量為上述上限值以下,則容易提高光學膜之光學特性。 When the optical film of the present invention contains a filler, preferably silica particles, the content of the filler relative to the mass of the optical film is usually 0.1% by mass or more, preferably 1% by mass or more, and more preferably 5% by mass % Or more, more preferably 10% by mass or more, still more preferably 20% by mass or more, particularly preferably 30% by mass or more, and more preferably 60% by mass or less. If the content of the filler is more than the above lower limit, it is easy to improve the endurance, elastic modulus, and transparency of the optical film. Moreover, if the content of the filler is below the above upper limit, it is easy to improve the optical properties of the optical film.

本發明之光學膜亦可進而含有紫外線吸收劑。紫外線吸收劑可自樹脂材料領域中常作為紫外線吸收劑使用者適當選擇。紫外線吸收劑亦可包含吸收400 nm以下之波長之光之化合物。作為紫外線吸收劑,例如可例舉選自由二苯甲酮系化合物、水楊酸酯系化合物、苯并三唑系化合物、及三𠯤系化合物所組成之群中之至少1種化合物。紫外線吸收劑可單獨使用或將2種以上組合使用。藉由光學膜含有紫外線吸收劑,能夠抑制樹脂之劣化,因此,於將光學膜應用於圖像顯示裝置等之情形時,能夠提高視認性。於本說明書中,「系化合物」係指帶有該「系化合物」之化合物之衍生物。例如,「二苯甲酮系化合物」係指具有作為母體骨架之二苯甲酮及鍵結於二苯甲酮之取代基的化合物。The optical film of the present invention may further contain an ultraviolet absorber. The ultraviolet absorber can be appropriately selected from users who are often used as ultraviolet absorbers in the field of resin materials. The ultraviolet absorber may also include a compound that absorbs light with a wavelength below 400 nm. As the ultraviolet absorber, for example, at least one compound selected from the group consisting of benzophenone-based compounds, salicylate-based compounds, benzotriazole-based compounds, and triazole-based compounds may be mentioned. The ultraviolet absorber can be used alone or in combination of two or more kinds. Since the optical film contains the ultraviolet absorber, the deterioration of the resin can be suppressed, and therefore, when the optical film is applied to an image display device or the like, the visibility can be improved. In this specification, "system compound" refers to a derivative of the compound with the "system compound". For example, "benzophenone-based compound" refers to a compound having benzophenone as a parent skeleton and a substituent bonded to benzophenone.

於光學膜含有紫外線吸收劑之情形時,紫外線吸收劑之含量相對於光學膜之質量,較佳為1質量%以上,更佳為2質量%以上,進而較佳為3質量%以上,較佳為10質量%以下,更佳為8質量%以下,進而較佳為6質量%以下。較佳含量因使用之紫外線吸收劑而異,若以400 nm之光線透過率成為20~60%左右之方式調節紫外線吸收劑之含量,則可提高光學膜之耐光性,並且容易提高透明性。When the optical film contains an ultraviolet absorber, the content of the ultraviolet absorber relative to the mass of the optical film is preferably 1% by mass or more, more preferably 2% by mass or more, and still more preferably 3% by mass or more, more preferably It is 10% by mass or less, more preferably 8% by mass or less, and still more preferably 6% by mass or less. The preferred content varies with the ultraviolet absorber used. If the content of the ultraviolet absorber is adjusted so that the light transmittance of 400 nm becomes about 20-60%, the light resistance of the optical film can be improved, and the transparency can be easily improved.

本發明之光學膜亦可進而含有填料及紫外線吸收劑以外之其他添加劑。作為其他添加劑,例如可例舉抗氧化劑、脫模劑、穩定劑、上藍劑、阻燃劑、pH值調整劑、二氧化矽分散劑、滑劑、增黏劑及流平劑等。於含有其他添加劑之情形時,其含量相對於光學膜之質量,較佳為0.001~20質量%,更佳為0.01~15質量%,進而較佳為0.1~10質量%。The optical film of the present invention may further contain other additives other than fillers and ultraviolet absorbers. As other additives, for example, antioxidants, mold release agents, stabilizers, bluing agents, flame retardants, pH adjusters, silica dispersants, lubricants, tackifiers, and leveling agents may be mentioned. When other additives are contained, the content is preferably 0.001 to 20% by mass relative to the mass of the optical film, more preferably 0.01 to 15% by mass, and still more preferably 0.1 to 10% by mass.

本發明之光學膜之用途並無特別限定,可用於各種用途。本發明之光學膜可為單層,亦可為積層體,本發明之光學膜可直接使用,亦可進而積層其他膜而作為積層體使用。再者,於光學膜為積層體之情形時,將包含光學膜之單面或兩面上積層之全部層在內的積層體稱作光學膜。The use of the optical film of the present invention is not particularly limited, and it can be used for various purposes. The optical film of the present invention may be a single layer or a laminate, and the optical film of the present invention may be used as it is, or another film may be laminated and used as a laminate. In addition, when the optical film is a laminated body, the laminated body including all the layers laminated on one side or both sides of the optical film is called an optical film.

於本發明之光學膜為積層體之情形時,較佳為於光學膜之至少一個面上具有1個以上之功能層。作為功能層,例如可例舉硬塗層、底塗層、阻氣層、紫外線吸收層、黏著層、色相調整層、折射率調整層等。功能層可單獨使用或將2種以上組合使用。When the optical film of the present invention is a laminate, it is preferable to have one or more functional layers on at least one surface of the optical film. As the functional layer, for example, a hard coat layer, an undercoat layer, a gas barrier layer, an ultraviolet absorbing layer, an adhesive layer, a hue adjustment layer, a refractive index adjustment layer, etc. may be mentioned. The functional layer can be used alone or in combination of two or more kinds.

硬塗層之厚度並無特別限定,例如可為2~100 μm。若上述硬塗層之厚度處於上述範圍內,則存在能夠提高耐衝擊性,並且不易降低耐彎曲性,不易因硬化收縮導致出現捲曲產生之問題之傾向。硬塗層可藉由活性能量線照射、或者熱能賦予使包含可形成交聯結構之反應性材料之硬塗組合物硬化而形成,較佳為藉由活性能量線照射而獲得者。活性能量線定義為能夠使產生活性種之化合物分解而使其產生活性種之能量線,可例舉可見光、紫外線、紅外線、X射線、α射線、β射線、γ射線及電子束等,較佳為例舉紫外線。上述硬塗組合物含有自由基聚合性化合物及陽離子聚合性化合物中之至少1種聚合物。The thickness of the hard coat layer is not particularly limited, and may be, for example, 2 to 100 μm. If the thickness of the hard coat layer is within the above range, there is a tendency that the impact resistance can be improved, the bending resistance is not easily reduced, and the problem of curling due to hardening shrinkage is unlikely to occur. The hard coat layer can be formed by curing a hard coat composition containing a reactive material capable of forming a crosslinked structure by irradiation with active energy rays or by imparting thermal energy, and is preferably obtained by irradiation with active energy rays. Active energy rays are defined as energy rays that can decompose compounds that produce active species to produce active species. Examples include visible light, ultraviolet rays, infrared rays, X-rays, α-rays, β-rays, γ-rays, and electron beams. Take ultraviolet rays as an example. The above-mentioned hard coating composition contains at least one polymer of a radical polymerizable compound and a cation polymerizable compound.

上述自由基聚合性化合物係具有自由基聚合性基之化合物。作為上述自由基聚合性化合物所具有之自由基聚合性基,只要為可使自由基聚合反應發生之官能基即可,可例舉包含碳-碳不飽和雙鍵之基等,具體而言,可例舉乙烯基、(甲基)丙烯醯基等。再者,於上述自由基聚合性化合物具有2個以上之自由基聚合性基之情形時,該等自由基聚合性基可彼此相同,亦可互不相同。就提高硬塗層之硬度之方面而言,上述自由基聚合性化合物於1分子中具有之自由基聚合性基之數量較佳為2以上。作為上述自由基聚合性化合物,就反應性提高之方面而言,較佳可例舉具有(甲基)丙烯醯基之化合物,具體而言,可例舉於1分子中具有2~6個(甲基)丙烯醯基之稱為多官能丙烯酸酯單體之化合物、及稱為環氧(甲基)丙烯酸酯、聚胺基甲酸酯(甲基)丙烯酸酯、聚酯(甲基)丙烯酸酯之於分子內具有數個(甲基)丙烯醯基之分子量為數百至數千之低聚物,較佳為例舉選自環氧(甲基)丙烯酸酯、聚胺基甲酸酯(甲基)丙烯酸酯及聚酯(甲基)丙烯酸酯中之1種以上。The above-mentioned radically polymerizable compound is a compound having a radically polymerizable group. The radical polymerizable group possessed by the above radical polymerizable compound may be a functional group capable of generating a radical polymerization reaction, and a group containing a carbon-carbon unsaturated double bond can be mentioned. Specifically, A vinyl group, a (meth)acryloyl group, etc. can be mentioned. Furthermore, when the above-mentioned radically polymerizable compound has two or more radically polymerizable groups, these radically polymerizable groups may be the same or different from each other. In terms of increasing the hardness of the hard coat layer, the number of the radical polymerizable groups that the radical polymerizable compound has in one molecule is preferably 2 or more. As the above-mentioned radically polymerizable compound, in terms of improving reactivity, a compound having a (meth)acryloyl group is preferably exemplified. Specifically, it may be exemplified as having 2 to 6 ( (Meth)acrylic acid compound called multifunctional acrylate monomer, and called epoxy (meth)acrylate, polyurethane (meth)acrylate, polyester (meth)acrylic acid The ester is an oligomer with several (meth)acrylic acid groups in the molecule and a molecular weight of several hundred to several thousand, preferably selected from epoxy (meth)acrylate and polyurethane One or more of (meth)acrylate and polyester (meth)acrylate.

上述陽離子聚合性化合物係具有環氧基、氧雜環丁基、乙烯醚基等陽離子聚合性基之化合物。就提高硬塗層之硬度之方面而言,上述陽離子聚合性化合物於1分子中具有之陽離子聚合性基之數量較佳為2以上,更佳為3以上。 又,作為上述陽離子聚合性化合物,其中較佳為具有環氧基及氧雜環丁基中之至少1種作為陽離子聚合性基之化合物。就伴隨聚合反應之收縮較小之方面而言,較佳為環氧基、氧雜環丁基等環狀醚基。又,具有環狀醚基中之環氧基之化合物具有如下優點:容易獲得各種結構之化合物,不會對所獲得之硬塗層之耐久性造成不良影響,亦容易控制與自由基聚合性化合物之相容性。又,環狀醚基中之氧雜環丁基具有如下等優點:與環氧基相比,聚合度容易提高,加快由所獲得之硬塗層之陽離子聚合性化合物取得之網狀結構形成速度,即便在與自由基聚合性化合物混合存在之區域中亦不會於膜中殘留未反應之單體,形成獨立之網狀結構。 作為具有環氧基之陽離子聚合性化合物,例如可例舉:具有脂環族環之多元醇之聚縮水甘油醚、或藉由將含有環己烯環、環戊烯環之化合物以過氧化氫、過酸等適當之氧化劑進行環氧化而獲得之脂環族環氧樹脂;脂肪族多元醇、或其環氧烷加成物之聚縮水甘油醚、脂肪族長鏈多元酸之聚縮水甘油酯、(甲基)丙烯酸縮水甘油酯之均聚物、共聚物等脂肪族環氧樹脂;藉由雙酚A、雙酚F及氫化雙酚A等雙酚類、或其等之環氧烷加成物、己內酯加成物等衍生物與表氯醇之反應而製造之縮水甘油醚、及酚醛清漆環氧樹脂等,即自雙酚類衍生之縮水甘油醚型環氧樹脂等。The above-mentioned cationically polymerizable compound is a compound having a cationically polymerizable group such as an epoxy group, an oxetanyl group, and a vinyl ether group. In terms of increasing the hardness of the hard coat layer, the number of cationically polymerizable groups contained in the above-mentioned cationically polymerizable compound per molecule is preferably 2 or more, more preferably 3 or more. In addition, as the above-mentioned cationically polymerizable compound, a compound having at least one of an epoxy group and an oxetanyl group as a cationically polymerizable group is particularly preferred. In terms of small shrinkage accompanying the polymerization reaction, cyclic ether groups such as epoxy groups and oxetanyl groups are preferred. In addition, the compound having the epoxy group in the cyclic ether group has the following advantages: it is easy to obtain compounds of various structures, does not adversely affect the durability of the obtained hard coat layer, and is easy to control and free radically polymerizable compounds. The compatibility. In addition, the oxetanyl group in the cyclic ether group has the following advantages: Compared with the epoxy group, the degree of polymerization is easily increased, and the formation speed of the network structure obtained from the cation polymerizable compound of the hard coat layer is accelerated. , Even in the region where the radical polymerizable compound is mixed, no unreacted monomer will remain in the film, forming an independent network structure. As the cationic polymerizable compound having an epoxy group, for example, polyglycidyl ether of a polyhydric alcohol having an alicyclic ring, or by using a compound containing a cyclohexene ring and a cyclopentene ring with hydrogen peroxide The alicyclic epoxy resin obtained by epoxidizing suitable oxidizing agents such as peracid, etc.; aliphatic polyols, or polyglycidyl ethers of their alkylene oxide adducts, polyglycidyl esters of aliphatic long-chain polybasic acids, Aliphatic epoxy resins such as homopolymers and copolymers of (meth)glycidyl acrylate; added by bisphenols such as bisphenol A, bisphenol F and hydrogenated bisphenol A, or their alkylene oxides Glycidyl ethers, novolac epoxy resins, etc., which are produced by the reaction of derivatives, such as caprolactone adducts, and epichlorohydrin, that is, glycidyl ether type epoxy resins derived from bisphenols.

上述硬塗組合物可進而包含聚合起始劑。作為聚合起始劑,可例舉自由基聚合起始劑、陽離子聚合起始劑、自由基及陽離子聚合起始劑等,可適當選擇使用。該等聚合起始劑係藉由活性能量線照射及加熱之至少一種而分解,產生自由基或者陽離子而使自由基聚合及陽離子聚合進行者。 自由基聚合起始劑只要可藉由活性能量線照射及加熱之至少任一者而釋出使自由基聚合開始之物質即可。例如,作為熱自由基聚合起始劑,可例舉:過氧化氫、過苯甲酸等有機過氧化物;偶氮二丁腈等偶氮化合物等。 作為活性能量線自由基聚合起始劑,有:藉由分子之分解而生成自由基之Type1型自由基聚合起始劑、及與三級胺共存地藉由奪氫型反應而生成自由基之Type2型自由基聚合起始劑,其等可單獨使用或一併使用。 陽離子聚合起始劑只要可藉由活性能量線照射及加熱之至少任一者而釋出使陽離子聚合開始之物質即可。作為陽離子聚合起始劑,可使用芳香族錪鹽、芳香族鋶鹽、環戊二烯基鐵(II)錯合物等。其等根據結構之不同,可藉由活性能量線照射或加熱之任一者而開始陽離子聚合,或藉由活性能量線照射或加熱兩者均可開始陽離子聚合。The above-mentioned hard coat composition may further contain a polymerization initiator. The polymerization initiator may, for example, be a radical polymerization initiator, a cationic polymerization initiator, a radical and a cationic polymerization initiator, etc., and they can be appropriately selected and used. These polymerization initiators are decomposed by at least one of active energy ray irradiation and heating to generate free radicals or cations to cause radical polymerization and cationic polymerization to proceed. The radical polymerization initiator may release a substance that initiates radical polymerization by at least any one of active energy ray irradiation and heating. For example, as the thermal radical polymerization initiator, organic peroxides such as hydrogen peroxide and perbenzoic acid; azo compounds such as azobisbutyronitrile and the like can be mentioned. As active energy ray radical polymerization initiators, there are Type1 radical polymerization initiators that generate free radicals by the decomposition of molecules, and those that coexist with tertiary amines to generate free radicals by hydrogen abstraction reaction. Type 2 radical polymerization initiators can be used alone or together. The cationic polymerization initiator may release a substance that initiates cationic polymerization by at least one of active energy ray irradiation and heating. As the cationic polymerization initiator, aromatic iodonium salts, aromatic sulfonium salts, cyclopentadienyl iron (II) complexes, and the like can be used. Depending on the structure, it is possible to start cationic polymerization by either active energy ray irradiation or heating, or both active energy ray irradiation or heating can start cationic polymerization.

上述聚合起始劑相對於上述硬塗組合物整體100質量%,較佳可包含0.1~10質量%。若上述聚合起始劑之含量處於上述範圍內,則能夠使硬化充分進行,能夠使最終獲得之塗膜之機械物性或密接力處於良好範圍內,又,存在不易出現因硬化收縮導致之接著力不良或破裂現象及捲曲現象之傾向。The polymerization initiator may preferably contain 0.1 to 10% by mass relative to 100% by mass of the entire hard coating composition. If the content of the polymerization initiator is within the above range, the curing can be fully performed, and the mechanical properties or adhesion of the finally obtained coating film can be in a good range, and there is less adhesion due to curing shrinkage. Defects or cracking phenomenon and tendency to curl phenomenon.

上述硬塗組合物可進而包含選自由溶劑及添加劑所組成之群中之一種以上。 上述溶劑只要能夠使上述聚合性化合物及聚合起始劑溶解或分散,且為本技術領域中作為硬塗組合物之溶劑而廣為人知之溶劑,則可於不阻礙本發明之效果之範圍內加以使用。 上述添加劑可進而包含無機粒子、流平劑、穩定劑、界面活性劑、抗靜電劑、潤滑劑、防污劑等。The above-mentioned hard coating composition may further include one or more selected from the group consisting of solvents and additives. As long as the above-mentioned solvent can dissolve or disperse the above-mentioned polymerizable compound and polymerization initiator, and is a solvent widely known in the technical field as a solvent for hard coating compositions, it can be used within a range that does not hinder the effects of the present invention. . The above-mentioned additives may further include inorganic particles, leveling agents, stabilizers, surfactants, antistatic agents, lubricants, antifouling agents, and the like.

紫外線吸收層係具有紫外線吸收功能之層,例如由選自紫外線硬化型透明樹脂、電子束硬化型透明樹脂、及熱硬化型透明樹脂之主材與分散於該主材中之紫外線吸收劑所構成。The ultraviolet absorbing layer is a layer with ultraviolet absorbing function, for example, it is composed of a main material selected from ultraviolet curable transparent resin, electron beam curable transparent resin, and thermosetting transparent resin, and an ultraviolet absorber dispersed in the main material .

黏著層係具有黏著性功能之層,具有使光學膜接著於其他構件之功能。作為黏著層之形成材料,通常可使用已知者。例如,可使用熱硬化性樹脂組合物或光硬化性樹脂組合物。於該情形時,藉由事後供給能量,能夠使樹脂組合物進行高分子化而發生硬化。The adhesive layer is a layer with adhesive function, and has the function of adhering the optical film to other components. As the forming material of the adhesive layer, generally known ones can be used. For example, a thermosetting resin composition or a photocuring resin composition can be used. In this case, by supplying energy afterwards, the resin composition can be polymerized and hardened.

黏著層亦可為稱為壓敏型接著劑(Pressure Sensitive Adhesive,PSA)之藉由按壓貼合於對象物之層。壓敏型接著劑可為作為「於常溫下具有黏著性且以較輕壓力接著於被接著材之物質」(JIS K 6800)的黏著劑,亦可為作為「於保護被膜(微膠囊)中包含特定成分且於藉由適當方法(壓力、熱等)破壞被膜前能夠保持穩定性之接著劑」(JIS K 6800)的膠囊型接著劑。The adhesive layer may also be a layer called a Pressure Sensitive Adhesive (PSA) that is attached to an object by pressing. Pressure-sensitive adhesives can be used as "substances that are adhesive at room temperature and adhere to the material to be adhered with a lighter pressure" (JIS K 6800), or can be used as "in the protective film (microcapsules)" It is a capsule type adhesive agent that contains specific ingredients and can maintain stability before the film is destroyed by appropriate methods (pressure, heat, etc.)" (JIS K 6800).

色相調整層係具有色相調整功能之層,係能夠將光學膜調整為目標色相之層。色相調整層例如為含有樹脂及著色劑之層。作為該著色劑,例如可例舉:氧化鈦、氧化鋅、紅丹、氧化鈦系燒成顏料、群青、鋁酸鈷及碳黑等無機顏料;偶氮系化合物、喹吖啶酮系化合物、蒽醌系化合物、苝系化合物、異吲哚啉酮系化合物、酞菁系化合物、喹酞酮系化合物、蒽系化合物及吡咯并吡咯二酮系化合物等有機顏料;硫酸鋇及碳酸鈣等體質顏料;以及鹼性染料、酸性染料及媒染染料等染料。The hue adjustment layer is a layer with a hue adjustment function, and is a layer that can adjust the optical film to the target hue. The hue adjusting layer is, for example, a layer containing resin and coloring agent. As the colorant, for example, inorganic pigments such as titanium oxide, zinc oxide, red lead, titanium oxide-based calcined pigments, ultramarine blue, cobalt aluminate, and carbon black; azo-based compounds, quinacridone-based compounds, Organic pigments such as anthraquinone-based compounds, perylene-based compounds, isoindolinone-based compounds, phthalocyanine-based compounds, quinophthalone-based compounds, anthracene-based compounds, and diketopyrrolopyrrole-based compounds; barium sulfate and calcium carbonate, etc. Pigments; and dyes such as basic dyes, acid dyes and mordant dyes.

折射率調整層係具有折射率調整功能之層,例如為具有與光學膜不同之折射率、能夠對光學積層體賦予特定折射率之層。折射率調整層例如可為含有適當選擇之樹脂及視情形進而含有顏料之樹脂層,亦可為金屬薄膜。作為調整折射率之顏料,例如可例舉氧化矽、氧化鋁、氧化銻、氧化錫、氧化鈦、氧化鋯及氧化鉭。該顏料之平均一次粒徑亦可為0.1 μm以下。藉由將顏料之平均一次粒徑設為0.1 μm以下,能夠防止透過折射率調整層之光之漫反射,能夠防止透明度降低。作為折射率調整層所使用之金屬,例如可例舉氧化鈦、氧化鉭、氧化鋯、氧化鋅、氧化錫、氧化矽、氧化銦、氮氧化鈦、氮化鈦、氮氧化矽、氮化矽等金屬氧化物或金屬氮化物。The refractive index adjustment layer is a layer having a refractive index adjustment function, and is, for example, a layer having a refractive index different from that of an optical film and capable of imparting a specific refractive index to the optical laminate. The refractive index adjustment layer may be, for example, a resin layer containing appropriately selected resin and pigments as appropriate, or a metal thin film. As the pigment for adjusting the refractive index, for example, silicon oxide, aluminum oxide, antimony oxide, tin oxide, titanium oxide, zirconium oxide, and tantalum oxide may be mentioned. The average primary particle size of the pigment may also be 0.1 μm or less. By setting the average primary particle diameter of the pigment to 0.1 μm or less, diffuse reflection of light passing through the refractive index adjustment layer can be prevented, and the decrease in transparency can be prevented. As the metal used for the refractive index adjustment layer, for example, titanium oxide, tantalum oxide, zirconium oxide, zinc oxide, tin oxide, silicon oxide, indium oxide, titanium oxynitride, titanium nitride, silicon oxynitride, silicon nitride can be mentioned. Such as metal oxides or metal nitrides.

於本發明之一實施方式中,光學膜亦可於至少一個面(單面或兩面)上具有保護膜。例如,於在光學膜之單面上具有功能層之情形時,保護膜可積層於光學膜側之表面或功能層側之表面上,亦可積層於光學膜側及功能層側之兩側。於在光學膜之兩面上具有功能層之情形時,保護膜可積層於一個功能層側之表面上,亦可積層於兩個功能層側之表面上。保護膜係暫時保護光學膜或功能層之表面之膜,只要為能夠保護光學膜或功能層之表面且能夠剝離之膜即可,無特別限定。作為保護膜,例如可例舉:聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯等聚酯系樹脂膜;聚乙烯、聚丙烯膜等聚烯烴系樹脂膜、丙烯酸系樹脂膜等,較佳為選自由聚烯烴系樹脂膜、聚對苯二甲酸乙二酯系樹脂膜及丙烯酸系樹脂膜所組成之群。於光學膜具有2個保護膜之情形時,各保護膜可相同,亦可不同。In one embodiment of the present invention, the optical film may also have a protective film on at least one side (single side or both sides). For example, in the case of a functional layer on a single surface of the optical film, the protective film may be laminated on the surface of the optical film side or the surface of the functional layer side, or may be laminated on both sides of the optical film side and the functional layer side. When there are functional layers on both sides of the optical film, the protective film can be laminated on the surface on the side of one functional layer or on the surface on the side of the two functional layers. The protective film is a film that temporarily protects the surface of the optical film or the functional layer, and it is not particularly limited as long as it can protect the surface of the optical film or the functional layer and can be peeled off. Examples of the protective film include polyester resin films such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate; polyolefin films such as polyethylene and polypropylene films. The resin film, acrylic resin film, etc. are preferably selected from the group consisting of polyolefin resin film, polyethylene terephthalate resin film, and acrylic resin film. When the optical film has two protective films, each protective film may be the same or different.

保護膜之厚度並無特別限定,通常為10~120 μm,較佳為15~110 μm,更佳為20~100 μm。於光學膜具有2個保護膜之情形時,各保護膜之厚度可相同,亦可不同。The thickness of the protective film is not particularly limited, and is usually 10 to 120 μm, preferably 15 to 110 μm, and more preferably 20 to 100 μm. When the optical film has two protective films, the thickness of each protective film may be the same or different.

[光學膜之製造方法] 本發明之光學膜並無特別限定,例如可藉由包含以下之步驟: (a)製備包含上述聚醯胺醯亞胺樹脂之液體(有時稱作樹脂清漆)之步驟(清漆製備步驟); (b)將樹脂清漆塗佈於基材上而形成塗膜之步驟(塗佈步驟);及 (c)使所塗佈之液體(塗膜)乾燥而形成光學膜之步驟(光學膜形成步驟) 之方法進行製造。[Method of manufacturing optical film] The optical film of the present invention is not particularly limited. For example, it may include the following steps: (a) A step of preparing a liquid (sometimes called a resin varnish) containing the above-mentioned polyamide imine resin (a varnish preparation step); (b) the step of coating the resin varnish on the substrate to form a coating film (coating step); and (c) The step of drying the applied liquid (coating film) to form an optical film (optical film forming step) The method of manufacturing.

於清漆製備步驟中,使上述聚醯胺醯亞胺樹脂溶解於溶劑中,視需要添加上述添加劑並加以攪拌混合,藉此製備樹脂清漆。In the varnish preparation step, the polyimide resin is dissolved in a solvent, and the additives are added as necessary and stirred and mixed, thereby preparing a resin varnish.

樹脂清漆之製備中使用之溶劑只要能夠使上述樹脂溶解即可,無特別限定。作為該溶劑,例如可例舉:DMAc、DMF等醯胺系溶劑;γ-丁內酯、γ-戊內酯等內酯系溶劑;二甲基碸、二甲基亞碸、環丁碸等含硫系溶劑;碳酸乙二酯、碳酸丙二酯等碳酸酯系溶劑;及其等之組合。該等之中,較佳為醯胺系溶劑或內酯系溶劑。該等溶劑可單獨使用或將2種以上組合使用。又,樹脂清漆中亦可包含水、醇系溶劑、酮系溶劑、非環狀酯系溶劑、醚系溶劑等。清漆之固形物成分濃度較佳為1~25質量%,更佳為5~15質量%。再者,於本說明書中,清漆之固形物成分表示自清漆中去除溶劑後之成分之合計量。The solvent used in the preparation of the resin varnish is not particularly limited as long as it can dissolve the above-mentioned resin. Examples of the solvent include: amide-based solvents such as DMAc and DMF; lactone-based solvents such as γ-butyrolactone and γ-valerolactone; dimethyl sulfide, dimethyl sulfide, cyclobutyl sulfide, etc. Sulfur-containing solvents; carbonate-based solvents such as ethylene carbonate and propylene carbonate; and combinations thereof. Among these, an amide-based solvent or a lactone-based solvent is preferred. These solvents can be used alone or in combination of two or more kinds. In addition, the resin varnish may contain water, alcohol-based solvents, ketone-based solvents, acyclic ester-based solvents, ether-based solvents, and the like. The solid content concentration of the varnish is preferably 1 to 25% by mass, more preferably 5 to 15% by mass. Furthermore, in this specification, the solid content of the varnish means the total amount of the components after removing the solvent from the varnish.

於塗佈步驟中,藉由公知之塗佈方法於基材上塗佈清漆而形成塗膜。作為公知之塗佈方法,例如可例舉線棒塗佈法、反向塗佈、凹版塗佈等輥塗法、模嘴塗佈法、卡馬(comma)塗佈法、唇式塗佈法、旋轉塗佈法、網版塗佈法、噴注式塗佈法、浸漬法、噴霧法、流涎成形法等。In the coating step, a varnish is coated on the substrate by a well-known coating method to form a coating film. As well-known coating methods, for example, roll coating methods such as wire bar coating, reverse coating, and gravure coating, die nozzle coating methods, comma coating methods, and lip coating methods can be mentioned. , Spin coating method, screen coating method, spray coating method, dipping method, spray method, casting method, etc.

於光學膜形成步驟中,對塗膜進行乾燥後,自基材剝離,藉此可形成光學膜。剝離後,可進而設置對光學膜進行乾燥之步驟。塗膜之乾燥通常可於50~350℃、較佳為於50~230℃之溫度下進行。於本發明之較佳實施方式中,較佳為階段性地進行乾燥。包含高分子量樹脂之清漆容易具有高黏度,通常難以獲得均勻之膜,不易獲得透明性優異之膜。因此,藉由階段性地進行乾燥,能夠使包含高分子量樹脂之清漆均勻地乾燥。可視需要於惰性氣體氛圍或減壓之條件下進行塗膜之乾燥。又,若於真空條件下進行光學膜之乾燥,有時會於膜中產生、殘留微小氣泡,導致光學特性降低,因此較佳為於大氣壓下進行光學膜之乾燥。In the optical film forming step, after the coating film is dried, it is peeled from the substrate, whereby an optical film can be formed. After peeling, a step of drying the optical film can be further provided. The drying of the coating film can usually be carried out at a temperature of 50 to 350°C, preferably 50 to 230°C. In a preferred embodiment of the present invention, it is preferable to perform drying stepwise. Varnishes containing high molecular weight resins tend to have high viscosity, it is usually difficult to obtain a uniform film, and it is difficult to obtain a film with excellent transparency. Therefore, by stepwise drying, the varnish containing the high molecular weight resin can be dried uniformly. The coating film can be dried in an inert gas atmosphere or under reduced pressure as needed. In addition, if the optical film is dried under vacuum conditions, minute bubbles may be generated and left in the film, resulting in degradation of optical properties. Therefore, it is preferable to dry the optical film under atmospheric pressure.

作為基材之例,可例舉PET(polyethylene terephthalate,聚對苯二甲酸乙二酯)膜、PEN(polyethylenenaphthelate,聚萘二甲酸乙二酯)膜、其他聚醯亞胺系樹脂或聚醯胺系樹脂膜等。其中,就耐熱性優異之觀點而言,較佳為PET膜、PEN膜等,進而就與光學膜之密接性及成本之觀點而言,更佳為PET膜。Examples of substrates include PET (polyethylene terephthalate) film, PEN (polyethylene naphthelate, polyethylene naphthalate) film, other polyimide resins or polyamides. Series resin film, etc. Among them, from the viewpoint of excellent heat resistance, a PET film, a PEN film, etc. are preferred, and from the viewpoint of adhesion to an optical film and cost, a PET film is more preferred.

本發明之光學膜可良好地用作顯示裝置、尤其是可撓性顯示裝置之前面板(有時稱作視窗膜)、特別是可捲曲顯示器或可摺疊顯示器之前面板。即,本發明之光學膜較佳為可撓性顯示裝置之前面板用膜。該前面板具有保護可撓性顯示裝置之顯示元件之功能。再者,可撓性顯示裝置係指伴隨將圖像顯示裝置反覆彎折、反覆捲繞等之操作而使用之顯示裝置。對於此種伴隨反覆之彎折操作等而使用之可撓性顯示裝置之前面板,要求較高之耐彎曲性,尤其是耐折性。又,對於前面板,亦要求較高之視認性。與圖像顯示裝置內部所使用之圖像顯示裝置之基板用膜相比,對於圖像顯示裝置之前面板、尤其是可撓性顯示裝置之前面板用膜,要求較高之視認性,並且要求較高之耐彎曲性。例如,就容易提高用於可撓性顯示裝置之前面板之情形時之視認性之觀點而言,本發明之膜較佳為具有如上文中記載之全光線透過率、霧度及/或YI值,又,就容易提高用作可撓性顯示裝置之前面板之情形時之耐彎曲性、尤其是耐折性之觀點而言,較佳為滿足如上文中記載之MIT耐折疲勞試驗中之耐折次數。作為顯示裝置,可例舉電視、智慧型手機、行動電話、汽車導航、平板PC(personal computer,個人電腦)、可攜式遊戲機、電子紙、量表、指示板、時鐘、及智慧型手錶等可穿戴設備等。作為可撓性顯示器,可例舉具有可撓特性之顯示裝置,例如,電視、智慧型手機、行動電話、智慧型手錶等。作為可撓性顯示裝置,可例舉具有可撓性之全部圖像顯示裝置,例如可例舉如上所述之可捲曲顯示器或可摺疊顯示器。可捲曲顯示器係指包含前面板之圖像顯示部分呈捲筒狀捲繞,將該圖像顯示部分拉出使之成為平面或曲面之狀態而使用之圖像顯示裝置,係如每次使用時均進行呈捲筒狀捲繞等操作之圖像顯示裝置。又,可摺疊顯示器係指包含前面板之圖像顯示部分被彎折,將該圖像顯示部分打開使之成為平面或曲面之狀態而使用之圖像顯示裝置,係如每次使用時均進行彎折等操作之圖像顯示裝置。將此種反覆進行捲繞、彎折等操作之圖像顯示裝置稱為可撓性顯示裝置。The optical film of the present invention can be used as a display device, especially a front panel of a flexible display device (sometimes called a window film), especially a front panel of a rollable display or a foldable display. That is, the optical film of the present invention is preferably a film for a front panel of a flexible display device. The front panel has the function of protecting the display elements of the flexible display device. Furthermore, the flexible display device refers to a display device used in conjunction with operations such as repeated bending and repeated winding of the image display device. For the front panel of the flexible display device used with repeated bending operations and the like, high bending resistance, especially folding resistance, is required. Moreover, for the front panel, high visibility is also required. Compared with the film for the substrate of the image display device used inside the image display device, the front panel of the image display device, especially the film for the front panel of the flexible display device, requires higher visibility and requires more High bending resistance. For example, from the viewpoint of easily improving the visibility when used in the front panel of a flexible display device, the film of the present invention preferably has the total light transmittance, haze and/or YI value as described above, In addition, from the viewpoint that it is easy to improve the bending resistance, especially the bending resistance, when used as a front panel of a flexible display device, it is preferable to satisfy the bending resistance in the MIT bending fatigue test described above. . Examples of display devices include TVs, smart phones, mobile phones, car navigation, tablet PCs (personal computers), portable game consoles, electronic paper, gauges, indicator boards, clocks, and smart watches And other wearable devices. As a flexible display, a display device with flexible characteristics can be mentioned, for example, a TV, a smart phone, a mobile phone, a smart watch, etc. As the flexible display device, all image display devices having flexibility can be mentioned, for example, a rollable display or a foldable display as described above can be mentioned. A rollable display is an image display device that includes the image display part of the front panel and is wound in a roll shape, and the image display part is pulled out to make it into a flat or curved state and used, such as every time it is used Both are image display devices that perform operations such as winding in a reel. In addition, a foldable display refers to an image display device in which the image display part including the front panel is bent, and the image display part is opened to make it into a flat or curved state. It is used every time it is used. Image display device for bending and other operations. An image display device that repeatedly performs operations such as winding and bending is called a flexible display device.

[可撓性顯示裝置] 本發明包括具備本發明之光學膜之可撓性顯示裝置。本發明之光學膜較佳為於可撓性顯示裝置中用作前面板,有時將該前面板稱為視窗膜。該可撓性顯示裝置包括可撓性顯示裝置用積層體及有機EL顯示面板,且係相對於有機EL顯示面板,於視認側配置可撓性顯示裝置用積層體,可彎折地構成。作為可撓性顯示裝置用積層體,亦可進而含有偏光板、觸控感測器,其等之積層順序任意,較佳為自視認側起依序積層視窗膜、偏光板、觸控感測器或視窗膜、觸控感測器、偏光板。若偏光板存在相較於觸控感測器靠視認側,則不易視認觸控感測器之圖案,顯示圖像之視認性變得良好,故而較佳。各個構件可使用接著劑、黏著劑等進行積層。又,可具備於視窗膜、偏光板、觸控感測器之任一層之至少一面上形成之遮光圖案。[Flexible display device] The present invention includes a flexible display device provided with the optical film of the present invention. The optical film of the present invention is preferably used as a front panel in a flexible display device, and the front panel is sometimes called a window film. The flexible display device includes a laminate for a flexible display device and an organic EL display panel, and the laminate for a flexible display device is arranged on the visible side of the organic EL display panel, and is configured to be bendable. As a laminate for a flexible display device, it may further include a polarizing plate and a touch sensor. The order of the layers is arbitrary, and it is preferable to laminate the window film, the polarizing plate, and the touch sensor in order from the viewing side Mirror or window film, touch sensor, polarizing plate. If the polarizer is on the side that is more visible than the touch sensor, it is difficult to see the pattern of the touch sensor, and the visibility of the displayed image becomes better, which is better. Each member can be laminated using adhesives, adhesives, etc. In addition, it may be provided with a light-shielding pattern formed on at least one surface of any layer of the window film, the polarizing plate, and the touch sensor.

<偏光板> 如上所述,本發明之可撓性顯示裝置進而具備偏光板,其中較佳為圓偏光板。圓偏光板係藉由在直線偏光板上積層λ/4相位差板而具有僅使右旋圓偏振光分量或者左旋圓偏振光分量透過之功能的功能層。例如係用於:將外界光轉換成右旋圓偏振光,將被有機EL面板反射而成為左旋圓偏振光之外界光遮斷,僅使有機EL之發光分量透過,藉此抑制反射光之影響而使圖像易於觀看。為了達成圓偏振光功能,直線偏光板之吸收軸與λ/4相位差板之遲相軸理論上必須為45°,但實用中為45±10°。直線偏光板與λ/4相位差板並非必須相鄰積層,只要吸收軸與遲相軸之關係滿足上述範圍即可。較佳為於全波長達成完全之圓偏光,但實用中並非必須如此,因此本發明中之圓偏光板亦包含橢圓偏光板。亦較佳為藉由於直線偏光板之視認側進而積層λ/4相位差膜,使出射光成為圓偏光,從而提高佩戴偏光太陽眼鏡之狀態下之視認性。<Polarizing plate> As described above, the flexible display device of the present invention further includes a polarizing plate, and among them, a circular polarizing plate is preferred. The circular polarizer is a functional layer that has a function of transmitting only a right-handed circularly polarized light component or a left-handed circularly polarized light component by laminating a λ/4 retardation plate on a linear polarizer. For example, it is used to convert external light into right-handed circularly polarized light, which will be reflected by the organic EL panel and become left-handed circularly polarized light to block the outer boundary light, and only transmit the luminous component of the organic EL, thereby suppressing the influence of the reflected light And make the image easy to view. In order to achieve the circularly polarized light function, the absorption axis of the linear polarizer and the late axis of the λ/4 retardation plate must theoretically be 45°, but in practice it is 45±10°. The linear polarizing plate and the λ/4 retardation plate do not have to be laminated adjacently, as long as the relationship between the absorption axis and the slow axis satisfies the above range. It is preferable to achieve complete circular polarization at the full wavelength, but this is not necessary in practice. Therefore, the circular polarization plate in the present invention also includes an elliptical polarization plate. It is also preferable to laminate a λ/4 retardation film on the visibility side of the linear polarizer to make the emitted light circularly polarized, thereby improving the visibility in the state of wearing polarized sunglasses.

直線偏光板係具有使於透射軸方向上振動之光通過,但將與其垂直之振動成分之偏振光遮斷之功能的功能層。上述直線偏光板可為單獨之直線偏光元件或具備直線偏光元件及貼附於其至少一面之保護膜的構成。上述直線偏光板之厚度可為200 μm以下,較佳為0.5~100 μm。若直線偏光板之厚度處於上述範圍內,則存在直線偏光板之柔軟性不易降低之傾向。The linear polarizer is a functional layer that has the function of passing light that vibrates in the direction of the transmission axis, but blocking the polarized light of the vibrating component perpendicular to it. The above-mentioned linear polarizing plate may be a single linear polarizing element or a structure having a linear polarizing element and a protective film attached to at least one surface thereof. The thickness of the linear polarizer may be 200 μm or less, preferably 0.5-100 μm. If the thickness of the linear polarizer is within the above range, there is a tendency that the flexibility of the linear polarizer is not easily reduced.

上述直線偏光元件亦可為藉由對聚乙烯醇(有時簡稱為PVA)系膜進行染色、延伸而製造之膜型偏光元件。於藉由延伸而配向之PVA系膜中吸附碘等二色性色素,或者藉由於吸附於PVA之狀態下進行延伸而使二色性色素配向,從而發揮偏光性能。於上述膜型偏光元件之製造中,亦可另外具有膨潤、利用硼酸之交聯、利用水溶液之洗淨、乾燥等步驟。延伸或染色步驟可對單獨之PVA系膜進行,亦可於與如聚對苯二甲酸乙二酯之其他膜積層之狀態下進行。所使用之PVA系膜之厚度較佳為10~100 μm,上述延伸倍率較佳為2~10倍。 進而,作為上述偏光元件之另一例,亦可為塗佈液晶偏光組合物而形成之液晶塗佈型偏光元件。上述液晶偏光組合物可包含液晶性化合物及二色性色素化合物。上述液晶性化合物只要具有顯示出液晶狀態之性質即可,尤其是若具有層列相等高次配向狀態,則能夠發揮較高之偏光性能,故而較佳。又,液晶性化合物較佳為具有聚合性官能基。 上述二色性色素係與上述液晶化合物一起配向而顯示出二色性之色素,可具有聚合性官能基,又,二色性色素自身亦可具有液晶性。 液晶偏光組合物所含之化合物中之任一種具有聚合性官能基。上述液晶偏光組合物可進而包含起始劑、溶劑、分散劑、流平劑、穩定劑、界面活性劑、交聯劑、矽烷偶合劑等。 上述液晶偏光層可藉由在配向膜上塗佈液晶偏光組合物而形成液晶偏光層來進行製造。液晶偏光層與膜型偏光元件相比,可形成較薄之厚度,其厚度較佳為0.5~10 μm,更佳為1~5 μm。The linear polarizing element described above may also be a film-type polarizing element manufactured by dyeing and stretching a polyvinyl alcohol (sometimes abbreviated as PVA) film. Dichroic pigments such as iodine are adsorbed on the PVA-based film aligned by stretching, or dichroic pigments are aligned by stretching while being adsorbed on PVA, thereby exhibiting polarization performance. In the manufacture of the above-mentioned film-type polarizing element, there may be additional steps such as swelling, cross-linking with boric acid, washing with aqueous solution, and drying. The stretching or dyeing step can be performed on a separate PVA-based film, or can be performed in the state of being laminated with other films such as polyethylene terephthalate. The thickness of the PVA-based film used is preferably 10-100 μm, and the above-mentioned stretching ratio is preferably 2-10 times. Furthermore, as another example of the above-mentioned polarizing element, it may be a liquid crystal coating type polarizing element formed by coating a liquid crystal polarizing composition. The liquid crystal polarizing composition may include a liquid crystal compound and a dichroic dye compound. The above-mentioned liquid crystalline compound only needs to have the property of exhibiting a liquid crystal state. In particular, if it has a high-order alignment state such as a smectic arrangement, it can exhibit a higher polarization performance, which is preferable. Moreover, it is preferable that the liquid crystal compound has a polymerizable functional group. The dichroic dye is a dye that is aligned together with the liquid crystal compound to exhibit dichroism, and may have a polymerizable functional group, and the dichroic dye itself may also have liquid crystallinity. Any of the compounds contained in the liquid crystal polarizing composition has a polymerizable functional group. The above-mentioned liquid crystal polarizing composition may further include a starter, a solvent, a dispersant, a leveling agent, a stabilizer, a surfactant, a crosslinking agent, a silane coupling agent, and the like. The above-mentioned liquid crystal polarizing layer can be manufactured by coating a liquid crystal polarizing composition on an alignment film to form a liquid crystal polarizing layer. Compared with the film-type polarizing element, the liquid crystal polarizing layer can be formed into a thinner thickness, and the thickness is preferably 0.5-10 μm, more preferably 1-5 μm.

上述配向膜可藉由例如於基材上塗佈配向膜形成組合物並利用磨擦、偏光照射等賦予配向性而製造。上述配向膜形成組合物包含配向劑,亦可進而包含溶劑、交聯劑、起始劑、分散劑、流平劑、矽烷偶合劑等。作為上述配向劑,例如可使用聚乙烯醇類、聚丙烯酸酯類、聚醯胺酸類、聚醯亞胺類。於使用藉由偏光照射賦予配向性之配向劑之情形時,較佳為使用包含肉桂酸酯基之配向劑。用作上述配向劑之高分子之Mw例如為10,000~1,000,000左右。上述配向膜之厚度較佳為5~10,000 nm,就可充分表現出配向限制力之方面而言,更佳為10~500 nm。 上述液晶偏光層可自基材剝離並轉印而積層,亦可直接積層上述基材。上述基材亦較佳為發揮作為保護膜及相位差板、視窗膜之透明基材之作用。The above-mentioned alignment film can be manufactured by, for example, coating an alignment film forming composition on a substrate and imparting alignment properties by rubbing, polarized light irradiation, or the like. The aforementioned alignment film forming composition includes an alignment agent, and may further include a solvent, a crosslinking agent, an initiator, a dispersant, a leveling agent, a silane coupling agent, and the like. As the above-mentioned alignment agent, for example, polyvinyl alcohols, polyacrylates, polyamides, and polyimines can be used. In the case of using an alignment agent that imparts alignment properties by polarized light irradiation, it is preferable to use an alignment agent containing a cinnamate group. The Mw of the polymer used as the above-mentioned alignment agent is, for example, about 10,000 to 1,000,000. The thickness of the above-mentioned alignment film is preferably 5 to 10,000 nm, and more preferably 10 to 500 nm in terms of sufficiently exhibiting the alignment restriction force. The liquid crystal polarizing layer may be peeled from the base material and transferred to be laminated, or the base material may be directly laminated. The above-mentioned base material also preferably functions as a transparent base material for a protective film, a phase difference plate, and a window film.

作為上述保護膜,只要為透明之高分子膜即可,可使用與上述視窗膜之透明基材所使用之材料及添加劑相同者。又,亦可為塗佈環氧樹脂等陽離子硬化組合物或丙烯酸酯等自由基硬化組合物並使其硬化而獲得之塗層型保護膜。該保護膜亦可視需要包含塑化劑、紫外線吸收劑、紅外線吸收劑、顏料及染料之類之著色劑、螢光增白劑、分散劑、熱穩定劑、光穩定劑、抗靜電劑、抗氧化劑、滑劑、溶劑等。該保護膜之厚度較佳為200 μm以下,更佳為1~100 μm。若保護膜之厚度處於上述範圍內,則存在該膜之柔軟性不易降低之傾向。As the above-mentioned protective film, any transparent polymer film may be used, and the same materials and additives as those used for the transparent substrate of the above-mentioned window film can be used. Furthermore, it may be a coating type protective film obtained by applying and curing a cationic curing composition such as epoxy resin or a radical curing composition such as acrylate. The protective film may also optionally contain plasticizers, ultraviolet absorbers, infrared absorbers, pigments and dyes, such as coloring agents, fluorescent whitening agents, dispersants, heat stabilizers, light stabilizers, antistatic agents, antistatic agents, etc. Oxidizing agent, lubricant, solvent, etc. The thickness of the protective film is preferably 200 μm or less, more preferably 1-100 μm. If the thickness of the protective film is within the above range, there is a tendency that the flexibility of the film is not easily reduced.

上述λ/4相位差板係於與入射光之行進方向正交之方向(膜之面內方向)上賦予λ/4之相位差之膜。上述λ/4相位差板亦可為藉由對纖維素系膜、烯烴系膜、聚碳酸酯系膜等高分子膜進行延伸而製造之延伸型相位差板。上述λ/4相位差板亦可視需要包含相位差調整劑、塑化劑、紫外線吸收劑、紅外線吸收劑、顏料及染料之類之著色劑、螢光增白劑、分散劑、熱穩定劑、光穩定劑、抗靜電劑、抗氧化劑、滑劑、溶劑等。 上述延伸型相位差板之厚度較佳為200 μm以下,更佳為1~100 μm。若延伸型相位差板之厚度處於上述範圍內,則存在該延伸型相位差板之柔軟性不易降低之傾向。 進而,作為上述λ/4相位差板之另一例,可例舉塗佈液晶組合物而形成之液晶塗佈型相位差板。 上述液晶組合物包含顯示出向列型、膽固醇狀、層列型等之液晶狀態之液晶性化合物。上述液晶性化合物具有聚合性官能基。 上述液晶組合物可進而包含起始劑、溶劑、分散劑、流平劑、穩定劑、界面活性劑、交聯劑、矽烷偶合劑等。 上述液晶塗佈型相位差板與上述液晶偏光層同樣地,可藉由於基底膜上塗佈硬化液晶組合物而形成液晶相位差層,從而進行製造。液晶塗佈型相位差板與延伸型相位差板相比,可形成較薄之厚度。上述液晶偏光層之厚度較佳為0.5~10 μm,更佳為1~5 μm。 上述液晶塗佈型相位差板可自基材剝離並轉印而積層,亦可直接積層上述基材。上述基材亦較佳為發揮作為保護膜及相位差板、視窗膜之透明基材之作用。The above-mentioned λ/4 retardation plate is a film that provides a λ/4 retardation in a direction orthogonal to the traveling direction of incident light (in-plane direction of the film). The above-mentioned λ/4 retardation plate may be a stretched retardation plate manufactured by stretching a polymer film such as a cellulose-based film, an olefin-based film, and a polycarbonate-based film. The above-mentioned λ/4 retardation plate may optionally contain retardation modifiers, plasticizers, ultraviolet absorbers, infrared absorbers, pigments and dyes and other coloring agents, fluorescent brighteners, dispersants, heat stabilizers, Light stabilizers, antistatic agents, antioxidants, slip agents, solvents, etc. The thickness of the above-mentioned extended phase difference plate is preferably 200 μm or less, more preferably 1-100 μm. If the thickness of the extended phase difference plate is within the above-mentioned range, the flexibility of the extended phase difference plate tends to be less likely to decrease. Furthermore, as another example of the above-mentioned λ/4 retardation plate, a liquid crystal coating type retardation plate formed by applying a liquid crystal composition can be exemplified. The above-mentioned liquid crystal composition contains a liquid crystal compound showing a liquid crystal state such as nematic, cholesteric, smectic, and the like. The above-mentioned liquid crystal compound has a polymerizable functional group. The above-mentioned liquid crystal composition may further include an initiator, a solvent, a dispersant, a leveling agent, a stabilizer, a surfactant, a crosslinking agent, a silane coupling agent, and the like. The said liquid crystal coating type retardation plate can be manufactured by forming a liquid crystal retardation layer by coating a hardening liquid crystal composition on a base film similarly to the said liquid crystal polarizing layer. The liquid crystal coating type retardation plate can be formed into a thinner thickness than the extension type retardation plate. The thickness of the above-mentioned liquid crystal polarizing layer is preferably 0.5 to 10 μm, more preferably 1 to 5 μm. The liquid crystal coating type retardation plate may be peeled from the base material and transferred and laminated, or the base material may be directly laminated. The above-mentioned base material also preferably functions as a transparent base material for a protective film, a phase difference plate, and a window film.

通常,波長越短則顯示出越大之雙折射、波長越長則顯示出越小之雙折射的材料較多。於該情形時,無法於整個可見光區域達成λ/4之相位差,因此以於視感度高之560 nm附近成為λ/4、以面內相位差較佳為100~180 nm、更佳為130~150 nm之方式進行設計。就能夠使視認性良好而言,較佳為使用逆分散λ/4相位差板,該逆分散λ/4相位差板使用了具有與通常相反之雙折射率波長分散特性之材料。作為此種材料,例如,延伸型相位差板可使用日本專利特開2007-232873號公報等中記載者,液晶塗佈型相位差板可使用日本專利特開2010-30979號公報中記載者。 又,作為其他方法,亦已知有藉由與λ/2相位差板組合而獲得廣帶域λ/4相位差板之技術(例如,日本專利特開平10-90521號公報)。λ/2相位差板亦可藉由與λ/4相位差板相同之材料及方法進行製造。延伸型相位差板與液晶塗佈型相位差板之組合任意,均可藉由使用液晶塗佈型相位差板使厚度較薄。 亦已知有於上述圓偏光板上積層正C板以提高斜方向之視認性之方法(例如,日本專利特開2014-224837號公報)。正C板可為液晶塗佈型相位差板,亦可為延伸型相位差板。該相位差板之厚度方向之相位差較佳為-200~-20 nm,更佳為-140~-40 nm。Generally, the shorter the wavelength, the greater the birefringence, and the longer the wavelength, the smaller the birefringence. In this case, the phase difference of λ/4 cannot be achieved in the entire visible light region, so it becomes λ/4 near 560 nm where the visual sensitivity is high, and the in-plane phase difference is preferably 100-180 nm, more preferably 130 Design in a way of ~150 nm. In terms of enabling good visibility, it is preferable to use a reverse-dispersion λ/4 retardation plate that uses a material having birefringence wavelength dispersion characteristics contrary to normal. As such a material, for example, the extension type retardation plate can use what is described in Japanese Patent Laid-Open No. 2007-232873, and the liquid crystal coating type retardation plate can use what is described in the Japanese Patent Laid-Open No. 2010-30979. In addition, as another method, a technique of obtaining a wide-band λ/4 retardation plate by combining with a λ/2 retardation plate is also known (for example, Japanese Patent Laid-Open No. 10-90521). The λ/2 retardation plate can also be manufactured by the same materials and methods as the λ/4 retardation plate. Any combination of the extension type retardation plate and the liquid crystal coating type retardation plate can be made thinner by using the liquid crystal coating type retardation plate. There is also known a method of laminating a positive C plate on the circular polarizing plate to improve the visibility in the oblique direction (for example, Japanese Patent Laid-Open No. 2014-224837). The positive C plate can be a liquid crystal coating type retardation plate or an extended type retardation plate. The retardation in the thickness direction of the retardation plate is preferably -200 to -20 nm, more preferably -140 to -40 nm.

[觸控感測器] 如上所述,本發明之可撓性顯示裝置較佳為進而具備觸控感測器。觸控感測器係作為輸入機構使用。作為觸控感測器,可例舉電阻膜方式、表面聲波方式、紅外線方式、電磁感應方式、靜電電容方式等各種方式,較佳為例舉靜電電容方式。 靜電電容方式觸控感測器分為活性區域及位於上述活性區域之外廓部之非活性區域。活性區域係與顯示面板中顯示畫面之區域(顯示部)對應之區域,係感知使用者之觸控之區域,非活性區域係與顯示裝置中不顯示畫面之區域(非顯示部)對應之區域。觸控感測器可包含:具有可撓特性之基板;形成於上述基板之活性區域之感知圖案;形成於上述基板之非活性區域並用以經由墊部將上述感知圖案與外部驅動電路連接之各感測線。作為具有可撓特性之基板,可使用與上述視窗膜之透明基板相同之材料。[Touch Sensor] As described above, the flexible display device of the present invention preferably further includes a touch sensor. The touch sensor is used as an input mechanism. As the touch sensor, various methods such as a resistive film method, a surface acoustic wave method, an infrared method, an electromagnetic induction method, and an electrostatic capacitance method can be exemplified, and an electrostatic capacitance method is preferable. The capacitive touch sensor is divided into an active area and an inactive area located outside the active area. The active area is the area corresponding to the area on the display panel (display part) that perceives the user's touch, and the inactive area is the area corresponding to the area where the picture is not displayed (non-display part) in the display device . The touch sensor may include: a substrate with flexible characteristics; a sensing pattern formed on the active area of the substrate; each of the sensing patterns formed on the inactive area of the substrate and used to connect the sensing pattern to an external drive circuit via a pad Sensing line. As a substrate with flexible properties, the same material as the transparent substrate of the above-mentioned window film can be used.

上述感知圖案可具備於第1方向上形成之第1圖案及於第2方向上形成之第2圖案。第1圖案與第2圖案配置於互不相同之方向上。第1圖案及第2圖案形成於同一層,為了感知被觸控之地點,必須將各圖案電性連接。第1圖案為複數個單位圖案經由接頭相互連接之形態,但第2圖案為複數個單位圖案呈島嶼形態相互分離之結構,因此,為了將第2圖案電性連接,需要另外之橋接電極。用於第2圖案之連接之電極可使用周知之透明電極。作為該透明電極之素材,例如可例舉氧化銦錫(ITO)、氧化銦鋅(IZO)、氧化鋅(ZnO)、氧化銦鋅錫(IZTO)、氧化銦鎵鋅(IGZO)、氧化鎘錫(CTO)、PEDOT(poly(3,4-ethylenedioxythiophene),聚(3,4-乙烯二氧噻吩))、奈米碳管(CNT)、石墨烯及金屬線等,較佳為例舉ITO。該等可單獨使用或將2種以上混合使用。金屬線所使用之金屬並無特別限定,例如可例舉銀、金、鋁、銅、鐵、鎳、鈦、硒及鉻等,該等可單獨使用或將2種以上混合使用。 橋接電極可於感知圖案上部介隔絕緣層而形成於上述絕緣層上部,於基板上形成有橋接電極,可於其上形成絕緣層及感知圖案。上述橋接電極亦可由與感知圖案相同之素材形成,亦可由鉬、銀、鋁、銅、鈀、金、鉑、鋅、錫、鈦或該等中之2種以上之合金形成。 第1圖案與第2圖案必須電絕緣,因此於感知圖案與橋接電極之間形成絕緣層。該絕緣層可僅形成於第1圖案之接頭與橋接電極之間,亦可形成為覆蓋感知圖案之層。於覆蓋感知圖案之層之情形時,橋接電極可經由形成於絕緣層之接觸孔將第2圖案連接。The aforementioned sensing pattern may include a first pattern formed in the first direction and a second pattern formed in the second direction. The first pattern and the second pattern are arranged in different directions. The first pattern and the second pattern are formed on the same layer. In order to sense the touched location, each pattern must be electrically connected. The first pattern is a form in which a plurality of unit patterns are connected to each other via a joint, but the second pattern is a structure in which a plurality of unit patterns are separated from each other in the form of islands. Therefore, in order to electrically connect the second pattern, another bridge electrode is required. As the electrode used for the connection of the second pattern, a well-known transparent electrode can be used. As the material of the transparent electrode, for example, indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), indium gallium zinc oxide (IGZO), cadmium tin oxide (CTO), PEDOT (poly(3,4-ethylenedioxythiophene), poly(3,4-ethylenedioxythiophene)), carbon nanotubes (CNT), graphene, metal wires, etc., preferably ITO. These can be used individually or in mixture of 2 or more types. The metal used for the metal wire is not particularly limited. For example, silver, gold, aluminum, copper, iron, nickel, titanium, selenium, and chromium can be exemplified, and these can be used alone or in combination of two or more. The bridging electrode can be formed on the upper insulating layer through the insulating edge layer on the upper part of the sensing pattern, and the bridging electrode can be formed on the substrate, and the insulating layer and the sensing pattern can be formed on the bridging electrode. The above-mentioned bridge electrode may also be formed of the same material as the sensing pattern, or may be formed of molybdenum, silver, aluminum, copper, palladium, gold, platinum, zinc, tin, titanium, or an alloy of two or more of these. The first pattern and the second pattern must be electrically insulated, so an insulating layer is formed between the sensing pattern and the bridge electrode. The insulating layer may be formed only between the joints of the first pattern and the bridging electrodes, or may be formed as a layer covering the sensing pattern. In the case of covering the layer of the sensing pattern, the bridge electrode can connect the second pattern through the contact hole formed in the insulating layer.

上述觸控感測器可進而於基板與電極之間包含光學調節層,作為用以適當補償由形成有圖案之圖案區域與未形成圖案之非圖案區域間之透過率差、具體而言由該等區域中之折射率差導致的光透過率差之方法。該光學調節層可包含無機絕緣物質或有機絕緣物質。光學調節層可將包含光硬化性有機黏合劑及溶劑之光硬化組合物塗佈於基板上而形成。上述光硬化組合物可進而包含無機粒子。可利用上述無機粒子提高光學調節層之折射率。 上述光硬化性有機黏合劑可於無損本發明之效果之範圍內,包含例如丙烯酸酯系單體、苯乙烯系單體、羧酸系單體等各單體之共聚物。上述光硬化性有機黏合劑亦可為包含例如含環氧基之重複單元、丙烯酸酯重複單元、羧酸重複單元等互不相同之各重複單元之共聚物。 作為上述無機粒子,例如可例舉氧化鋯粒子、二氧化鈦粒子、氧化鋁粒子等。 上述光硬化組合物亦可進而包含光聚合起始劑、聚合性單體、硬化助劑等各種添加劑。The above-mentioned touch sensor may further include an optical adjustment layer between the substrate and the electrode to appropriately compensate for the difference in transmittance between the patterned area and the unpatterned non-patterned area. A method of difference in light transmittance caused by difference in refractive index in the same area. The optical adjustment layer may include an inorganic insulating material or an organic insulating material. The optical adjustment layer can be formed by coating a photo-curing composition containing a photo-curing organic adhesive and a solvent on a substrate. The above-mentioned photocurable composition may further contain inorganic particles. The above-mentioned inorganic particles can be used to increase the refractive index of the optical adjustment layer. The above-mentioned photocurable organic adhesive may include copolymers of monomers such as acrylic ester monomers, styrene monomers, and carboxylic acid monomers within a range that does not impair the effects of the present invention. The aforementioned photocurable organic adhesive may also be a copolymer containing, for example, epoxy-containing repeating units, acrylate repeating units, carboxylic acid repeating units, and other repeating units that are different from each other. Examples of the above-mentioned inorganic particles include zirconia particles, titania particles, and alumina particles. The above-mentioned photocurable composition may further contain various additives such as a photopolymerization initiator, a polymerizable monomer, and a curing aid.

[接著層] 形成上述可撓性顯示裝置用積層體之視窗膜、偏光板、觸控感測器等各層以及構成各層之直線偏光板、λ/4相位差板等膜構件可利用接著劑進行接著。作為該接著劑,可使用水系接著劑、有機溶劑系、無溶劑系接著劑、固體接著劑、溶劑揮散型接著劑、水系溶劑揮散型接著劑、濕氣硬化型接著劑、加熱硬化型接著劑、厭氧硬化型、活性能量線硬化型接著劑、硬化劑混合型接著劑、熱熔融型接著劑、壓敏型接著劑、壓敏型黏著劑、再濕型接著劑等通常使用之接著劑等,較佳為使用水系溶劑揮散型接著劑、活性能量線硬化型接著劑、黏著劑。接著劑層之厚度可根據所要求之接著力等適當調節,較佳為0.01~500 μm,更佳為0.1~300 μm。於上述可撓性顯示裝置用積層體中存在複數個接著層,各接著層之厚度及種類可相同,亦可不同。[Next layer] The window film, polarizing plate, touch sensor and other layers forming the laminated body for the flexible display device, and the film members such as the linear polarizing plate and λ/4 phase difference plate constituting each layer can be bonded with an adhesive. As the adhesive, water-based adhesives, organic solvent-based, solvent-free adhesives, solid adhesives, solvent-volatile adhesives, water-based solvent-volatile adhesives, moisture-curing adhesives, and heat-curing adhesives can be used , Anaerobic curing type, active energy ray curing type adhesive, curing agent mixed type adhesive, hot melt type adhesive, pressure sensitive adhesive, pressure sensitive adhesive, rewetting type adhesive, etc. commonly used adhesives For example, it is preferable to use a water-based solvent-volatile adhesive, an active energy ray-curable adhesive, and an adhesive. The thickness of the adhesive layer can be appropriately adjusted according to the required adhesive force, etc., preferably 0.01-500 μm, more preferably 0.1-300 μm. There are a plurality of adhesive layers in the above-mentioned laminate for flexible display devices, and the thickness and type of each adhesive layer may be the same or different.

作為上述水系溶劑揮散型接著劑,可使用聚乙烯醇系聚合物、澱粉等水溶性聚合物、乙烯-乙酸乙烯酯系乳液、苯乙烯-丁二烯系乳液等水分散狀態之聚合物作為主劑聚合物。除上述主劑聚合物及水以外,亦可調配交聯劑、矽烷系化合物、離子性化合物、交聯觸媒、抗氧化劑、染料、顏料、無機填料、有機溶劑等。於利用上述水系溶劑揮散型接著劑進行接著之情形時,將上述水系溶劑揮散型接著劑注入至被接著層間而使被接著層貼合後,使其乾燥,藉此能夠賦予接著性。於使用上述水系溶劑揮散型接著劑之情形時,接著層之厚度較佳為0.01~10 μm,更佳為0.1~1 μm。於將上述水系溶劑揮散型接著劑用於複數層之情形時,各層之厚度及種類可相同,亦可不同。As the above-mentioned water-based solvent-volatile adhesive, water-dispersed polymers such as polyvinyl alcohol-based polymers, starches and other water-soluble polymers, ethylene-vinyl acetate emulsions, styrene-butadiene emulsions, and other water-dispersed polymers can be used as the main Agent polymer. In addition to the above-mentioned main agent polymer and water, crosslinking agents, silane-based compounds, ionic compounds, crosslinking catalysts, antioxidants, dyes, pigments, inorganic fillers, organic solvents, etc. can also be formulated. When the water-based solvent-volatile adhesive is used for bonding, the water-based solvent-volatile adhesive is injected between the layers to be bonded to bond the bonded layers, and then dried to impart adhesiveness. In the case of using the above-mentioned water-based solvent-volatile adhesive, the thickness of the adhesive layer is preferably 0.01-10 μm, more preferably 0.1-1 μm. When the above-mentioned water-based solvent volatile adhesive is used for multiple layers, the thickness and type of each layer may be the same or different.

上述活性能量線硬化型接著劑可藉由照射活性能量線使形成接著劑層之包含反應性材料之活性能量線硬化組合物硬化而形成。上述活性能量線硬化組合物可含有與硬塗組合物所含者相同之自由基聚合性化合物及陽離子聚合性化合物中之至少1種聚合物。上述自由基聚合性化合物可使用與硬塗組合物中之自由基聚合性化合物相同之化合物。 上述陽離子聚合性化合物可使用與硬塗組合物中之陽離子聚合性化合物相同之化合物。 作為活性能量線硬化組合物中使用之陽離子聚合性化合物,較佳為環氧化合物。為了降低作為接著劑組合物之黏度,亦較佳為包含單官能之化合物作為反應性稀釋劑。The active energy ray curable adhesive can be formed by irradiating active energy rays to harden the active energy ray curable composition containing the reactive material that forms the adhesive layer. The active energy ray hardening composition may contain at least one polymer of the same radically polymerizable compound and cationically polymerizable compound as those contained in the hard coat composition. The radical polymerizable compound can be the same compound as the radical polymerizable compound in the hard coat composition. As the above-mentioned cationically polymerizable compound, the same compound as the cationically polymerizable compound in the hard coat composition can be used. The cationic polymerizable compound used in the active energy ray curing composition is preferably an epoxy compound. In order to reduce the viscosity of the adhesive composition, it is also preferable to include a monofunctional compound as a reactive diluent.

活性能量線組合物可包含單官能之化合物以使黏度降低。作為該單官能之化合物,可例舉於1分子中具有1個(甲基)丙烯醯基之丙烯酸酯系單體及於1分子中具有1個環氧基或氧雜環丁基之化合物,例如(甲基)丙烯酸縮水甘油酯等。 活性能量線組合物可進而包含聚合起始劑。作為該聚合起始劑,可例舉自由基聚合起始劑、陽離子聚合起始劑、自由基及陽離子聚合起始劑等,其等可適當選擇而使用。該等聚合起始劑係藉由活性能量線照射及加熱之至少一種而分解,產生自由基或者陽離子從而使自由基聚合及陽離子聚合進行者。可使用硬塗組合物之記載中能夠藉由活性能量線照射使自由基聚合或陽離子聚合中之至少任一者開始的起始劑。 上述活性能量線硬化組合物可進而包含離子捕捉劑、抗氧化劑、鏈轉移劑、密接賦予劑、熱塑性樹脂、填充劑、流動黏度調整劑、塑化劑、消泡劑溶劑、添加劑、溶劑。於藉由上述活性能量線硬化型接著劑將2個被接著層接著之情形時,可藉由如下方式進行接著,即,將上述活性能量線硬化組合物塗佈於被接著層之任一者或兩者後,進行貼合,對任一被接著層或兩個被接著層照射活性能量線使其硬化。於使用上述活性能量線硬化型接著劑之情形時,接著層之厚度較佳為0.01~20 μm,更佳為0.1~10 μm。於將上述活性能量線硬化型接著劑用於形成複數個接著層之情形時,各層之厚度及種類可相同,亦可不同。The active energy ray composition may contain a monofunctional compound to reduce the viscosity. Examples of the monofunctional compound include an acrylate-based monomer having one (meth)acrylic acid group in one molecule and a compound having one epoxy group or oxetanyl group in one molecule. For example, glycidyl (meth)acrylate and the like. The active energy ray composition may further include a polymerization initiator. The polymerization initiator may, for example, be a radical polymerization initiator, a cationic polymerization initiator, a radical and a cationic polymerization initiator, etc., and these can be appropriately selected and used. These polymerization initiators are decomposed by at least one of active energy ray irradiation and heating to generate free radicals or cations to allow radical polymerization and cationic polymerization to proceed. In the description of the hard coating composition, an initiator capable of starting at least one of radical polymerization and cationic polymerization by active energy ray irradiation can be used. The active energy ray hardening composition may further include an ion scavenger, an antioxidant, a chain transfer agent, an adhesion imparting agent, a thermoplastic resin, a filler, a fluid viscosity adjuster, a plasticizer, a defoamer solvent, an additive, and a solvent. In the case where two adhesive layers are bonded by the above-mentioned active energy ray-curable adhesive, the bonding can be performed by applying the above-mentioned active energy ray-curing composition to any one of the layers to be bonded Or after both, bonding is performed, and either one of the bonded layers or both of the bonded layers is irradiated with active energy rays to harden them. In the case of using the above-mentioned active energy ray-curable adhesive, the thickness of the adhesive layer is preferably 0.01-20 μm, more preferably 0.1-10 μm. When the active energy ray-curable adhesive is used to form a plurality of adhesive layers, the thickness and type of each layer may be the same or different.

作為上述黏著劑,可根據主劑聚合物分為丙烯酸系黏著劑、胺基甲酸酯系黏著劑、橡膠系黏著劑、矽酮系黏著劑等,可使用其中任一種。黏著劑中除主劑聚合物以外,亦可調配交聯劑、矽烷系化合物、離子性化合物、交聯觸媒、抗氧化劑、黏著賦予劑、塑化劑、染料、顏料、無機填料等。使構成上述黏著劑之各成分溶解、分散於溶劑中而獲得黏著劑組合物,將該黏著劑組合物塗佈於基材上後,進行乾燥,藉此形成黏著層或接著層。黏著層可直接形成,亦可轉印另外形成於基材者。為了覆蓋接著前之黏著面,亦較佳為使用離型膜。於使用上述活性能量線硬化型接著劑之情形時,接著層之厚度較佳為0.1~500 μm,更佳為1~300 μm。於將上述黏著劑用於複數層之情形時,各層之厚度及種類可相同,亦可不同。The above-mentioned adhesives can be classified into acrylic adhesives, urethane-based adhesives, rubber-based adhesives, silicone-based adhesives, etc. according to the main agent polymer, and any of them can be used. In addition to the main agent polymer, the adhesive can also be blended with crosslinking agents, silane-based compounds, ionic compounds, crosslinking catalysts, antioxidants, adhesion imparting agents, plasticizers, dyes, pigments, inorganic fillers, etc. The components constituting the adhesive are dissolved and dispersed in a solvent to obtain an adhesive composition, and the adhesive composition is applied on a substrate and then dried to form an adhesive layer or an adhesive layer. The adhesive layer can be directly formed, or it can be transferred to a substrate formed separately. In order to cover the adhesive surface before bonding, it is also preferable to use a release film. In the case of using the above-mentioned active energy ray-curable adhesive, the thickness of the adhesive layer is preferably 0.1 to 500 μm, more preferably 1 to 300 μm. When the above-mentioned adhesive is used in multiple layers, the thickness and type of each layer may be the same or different.

[遮光圖案] 上述遮光圖案可用作上述可撓性顯示裝置之邊框(bezel)或外殼之至少一部分。利用遮光圖案,將配置於上述可撓性顯示裝置之邊緣部之配線隱藏,使其不易被視認,藉此提高圖像之視認性。上述遮光圖案可為單層或複層之形態。遮光圖案之顏色並無特別限制,可為黑色、白色、金屬色等各種顏色。遮光圖案可由用以呈現顏色之顏料與丙烯酸系樹脂、酯系樹脂、環氧系樹脂、聚胺基甲酸酯、矽酮等高分子形成。該等可單獨使用或以2種以上之混合物之形式使用。上述遮光圖案可藉由印刷、微影術、噴墨等各種方法而形成。遮光圖案之厚度通常為1~100 μm,較佳為2~50 μm。又,亦較佳為於遮光圖案之厚度方向上賦予傾斜等形狀。 [實施例][Shading Pattern] The above-mentioned light-shielding pattern can be used as at least a part of the bezel or housing of the above-mentioned flexible display device. The light-shielding pattern is used to hide the wiring arranged at the edge of the flexible display device to make it difficult to be seen, thereby improving the visibility of the image. The above-mentioned light-shielding pattern may be in the form of a single layer or a multiple layer. The color of the shading pattern is not particularly limited, and can be various colors such as black, white, and metallic. The light-shielding pattern can be formed by pigments used to present colors and polymers such as acrylic resins, ester resins, epoxy resins, polyurethanes, and silicones. These can be used alone or in the form of a mixture of two or more kinds. The above-mentioned light-shielding pattern can be formed by various methods such as printing, lithography, and inkjet. The thickness of the light-shielding pattern is usually 1-100 μm, preferably 2-50 μm. Moreover, it is also preferable to give a shape such as an inclination in the thickness direction of the light-shielding pattern. [Example]

以下,基於實施例及比較例更具體地說明本發明,但本發明並不限定於以下之實施例。首先,對測定及評價方法進行說明。Hereinafter, the present invention will be explained more specifically based on examples and comparative examples, but the present invention is not limited to the following examples. First, the measurement and evaluation methods will be described.

<耐力> 使用島津製作所(股)製造之「Autograph AG-IS」來測定實施例及比較例中獲得之光學膜之耐力。更詳細而言,製作縱橫10 mm寬之膜,於夾頭間距離50 mm、拉伸速度10 mm/分鐘之條件下測定應力-應變線(S-S曲線)。 1. S-S曲線之資料整理 自S-S曲線中之測定起始點起連續採樣10個點,藉由最小平方法擬合為二次函數。然後,自測定起始點之左側排除1個點,追加右側的1個點,直至藉由採樣範圍10個點之二次函數擬合而成為向上凸起之形狀為止。於擬合函數向上凸起之時點,結束資料整理。 2. S-S曲線之切線方程式之計算 利用上述1.中之資料之第n=i~j(j=2~50)個資料,藉由最小平方法求出斜率及截距。然後,針對j-1個斜率,藉由最小平方法將第k個(k=1~48)至第49個資料擬合為1次函數,藉由外插求出應變為0時之斜率。取得所獲得之48個點之中央值,定義為應變為0時之直線之斜率(S-S曲線切線)。對於截距,亦同樣地進行計算,獲得應變為0時之S-S曲線之切線方程式。 3. 耐力之計算 將上述2.中獲得之S-S曲線之應變為0時之切線於應變方向上平行移動0.2%。將應力測定資料超過平行移動之直線之應力的資料之應力值作為耐力。<Endurance> The "Autograph AG-IS" manufactured by Shimadzu Corporation (Stock) was used to measure the endurance of the optical films obtained in the Examples and Comparative Examples. In more detail, a film with a width of 10 mm is produced, and the stress-strain line (S-S curve) is measured under the conditions of a distance between the chucks of 50 mm and a stretching speed of 10 mm/min. 1. Data sorting of S-S curve 10 points were continuously sampled from the starting point of the measurement in the S-S curve, and fitted to a quadratic function by the least square method. Then, one point is excluded from the left side of the measurement starting point, and one point on the right side is added until it becomes an upward convex shape by fitting a quadratic function of 10 points in the sampling range. At the point when the fitting function bulges upwards, the data sorting ends. 2. Calculation of the tangent equation of the S-S curve Using the n=i~j (j=2~50) data of the data in 1. above, obtain the slope and intercept by the least square method. Then, for j-1 slopes, the kth (k=1~48) to 49th data are fitted into a first-order function by the least square method, and the slope when the strain becomes 0 is obtained by extrapolation. The median value of the obtained 48 points is defined as the slope of the straight line when the strain is 0 (the tangent of the S-S curve). For the intercept, the same calculation is performed to obtain the tangent equation of the S-S curve when the strain is 0. 3. Calculation of Endurance Move the tangent line of the S-S curve obtained in 2. above to 0 when the strain is parallel to the strain direction by 0.2%. The stress value of the data whose stress measurement data exceeds the stress of the straight line of parallel movement is regarded as endurance.

<全光線透過率> 依據JIS K 7105:1981,利用Suga Test Instruments(股)製造之全自動直讀霧度計HGM-2DP,測定實施例及比較例中獲得之光學膜之全光線透過率(Tt)。<Total light transmittance> According to JIS K 7105:1981, the total light transmittance (Tt) of the optical film obtained in the examples and comparative examples was measured using the automatic direct-reading haze meter HGM-2DP manufactured by Suga Test Instruments (stock).

<霧度(Haze)> 依據JIS K 7136:2000,將實施例及比較例中獲得之光學膜切割成30 mm×30 mm之大小,使用霧度計(Suga Test Instruments(股)製造之「HGM-2DP」)測定霧度(%)。<Haze (Haze)> According to JIS K 7136:2000, the optical films obtained in the examples and comparative examples were cut into a size of 30 mm×30 mm, and the haze was measured using a haze meter ("HGM-2DP" manufactured by Suga Test Instruments Co., Ltd.) (%).

<YI值> 針對實施例及比較例中獲得之光學膜,使用紫外可見近紅外分光光度計(日本分光(股)製造之V-670),求出三刺激值(X,Y,Z),代入下述計算式中,藉此算出YI值。 YI=100×(1.2769X-1.0592Z)/Y <YI value> For the optical films obtained in the examples and comparative examples, use an ultraviolet-visible-near-infrared spectrophotometer (V-670 manufactured by JASCO Corporation) to obtain the tristimulus values (X, Y, Z), Substitute into the following calculation formula to calculate the YI value. YI=100×(1.2769X-1.0592Z)/Y

<彈性模數> 使用島津製作所(股)製造之「Autograph AG-IS」測定實施例及比較例中獲得之光學膜之彈性模數。製作縱橫10 mm寬之膜,於夾頭間距離50 mm、拉伸速度10 mm/分鐘之條件下測定應力-應變線(S-S曲線),根據其斜率算出彈性模數。<Elastic modulus> The elastic modulus of the optical films obtained in the examples and comparative examples was measured using "Autograph AG-IS" manufactured by Shimadzu Corporation (stocks). A film with a width of 10 mm is made. The stress-strain line (S-S curve) is measured under the conditions of a distance between the chucks of 50 mm and a stretching speed of 10 mm/min, and the elastic modulus is calculated based on its slope.

<耐折性之評價> 依據ASTM標準D2176-16,以如下方式求出實施例及比較例中之光學膜之彎折次數。使用啞鈴切割機將該光學膜切割成15 mm×100 mm之短條狀。將切割後之光學膜設置於MIT耐折疲勞試驗機(東洋精機製作所(股)製造,型號0530)本體上,於試驗速度175 cpm、彎折角度135°、負載0.75 kgf、彎折夾具之半徑R=1 mm之條件下,測定光學膜斷裂前於正反方向上之往復彎折次數,將其作為彎折次數(亦稱作耐折次數)。<Evaluation of folding endurance> According to ASTM standard D2176-16, the number of bending of the optical film in the examples and comparative examples is calculated as follows. Use a dumbbell cutter to cut the optical film into short strips of 15 mm×100 mm. Set the cut optical film on the body of the MIT flex fatigue tester (manufactured by Toyo Seiki Co., Ltd., model 0530), at a test speed of 175 cpm, a bending angle of 135°, a load of 0.75 kgf, and the radius of the bending jig Under the condition of R=1 mm, the number of reciprocating bending in the front and back directions before the optical film breaks is measured, and this is used as the number of bending (also called the number of resistance to bending).

<Mw之測定> GPC測定 (1)前處理方法 向實施例及比較例中獲得之聚醯胺醯亞胺樹脂中,以濃度成為2 mg/mL之方式添加DMF(dimethylformamide,二甲基甲醯胺)溶離液(添加有10 mmol/L之溴化鋰之溶液),一面於80℃下攪拌30分鐘,一面加熱,冷卻後,利用0.45 μm膜濾器進行過濾,將所獲得者作為測定溶液。 (2)測定條件 管柱:東曹(股)製造之TSKgel α-2500((7)7.8 mm徑×300 mm)×1根、α-M((13)7.8 mm徑×300 mm)×2根 溶離液:DMF(添加有10 mmol/L之溴化鋰) 流量:1.0 mL/分鐘 檢測器:RI檢測器 管柱溫度:40℃ 進樣量:100 μL 分子量標準:標準聚苯乙烯<Determination of Mw> GPC determination (1) Pre-treatment method To the polyimide resin obtained in the examples and comparative examples, add DMF (dimethylformamide, dimethylformamide) lysate (with 10 mmol/L of lithium bromide) at a concentration of 2 mg/mL The solution) was heated and cooled while stirring at 80°C for 30 minutes, and then filtered with a 0.45 μm membrane filter. The obtained solution was used as the measurement solution. (2) Measurement conditions Column: TSKgel α-2500 ((7)7.8 mm diameter×300 mm)×1, α-M((13)7.8 mm diameter×300 mm)×2 pieces manufactured by Tosoh Corporation Eluent: DMF (with 10 mmol/L lithium bromide) Flow rate: 1.0 mL/min Detector: RI detector Column temperature: 40℃ Injection volume: 100 μL Molecular weight standard: standard polystyrene

<光學膜之厚度> 使用ABS數位式量表(Absolute Digimatic Indicator,絕對原點型數位式量表)(Mitutoyo(股)製造之「ID-C112BS」),測定實施例及比較例中獲得之光學膜之厚度。<Thickness of optical film> An ABS digital indicator (Absolute Digimatic Indicator) ("ID-C112BS" manufactured by Mitutoyo Co., Ltd.) was used to measure the thickness of the optical films obtained in the Examples and Comparative Examples.

(實施例1) [聚醯胺醯亞胺樹脂(1)之製備] 於氮氣氛圍下,於具備攪拌翼之可分離式燒瓶中,以TFMB之固形物成分成為5.13質量%之方式,添加TFMB及水分量嚴格脫水至700 ppm以下之DMAc,一面於室溫下進行攪拌,一面使TFMB溶解於DMAc中。然後,於燒瓶中添加6FDA及TAHMBP,使其等相對於TFMB分別成為20.20 mol%,於室溫下攪拌16小時。然後,冷卻至10℃後,添加TPC,使其相對於TFMB成為27.27 mol%,攪拌10分鐘後,進而添加TPC,使其相對於TFMB成為27.27 mol%,攪拌30分鐘。然後,添加與最初添加之DMAc相同量之DMAc,攪拌10分鐘後,添加TPC,使其相對於TFMB成為6.06 mol%,攪拌2小時。繼而,於燒瓶中添加二異丙基乙基胺、4-甲吡啶及乙酸酐,使其等相對於TFMB分別成為60.61 mol%、60.61 mol%、282.83 mol%,攪拌30分鐘後,將內溫升溫至70℃,進而攪拌3小時,獲得反應液。 將所獲得之反應液冷卻至室溫,將該反應液以線狀投入大量之甲醇中,取出析出之沈澱物,於甲醇中浸漬6小時後,用甲醇洗淨。然後,於60℃下進行沈澱物之減壓乾燥,獲得聚醯胺醯亞胺樹脂(1)。所獲得之聚醯胺醯亞胺樹脂(1)之Mw為748,000。(Example 1) [Preparation of polyamide imide resin (1)] Under a nitrogen atmosphere, in a separable flask equipped with a stirring blade, add TFMB and DMAc whose water content is strictly dehydrated to less than 700 ppm in such a way that the solid content of TFMB becomes 5.13% by mass, and stir at room temperature. , While dissolving TFMB in DMAc. Then, 6FDA and TAHMBP were added to the flask so that each of them became 20.20 mol% with respect to TFMB, and the flask was stirred at room temperature for 16 hours. Then, after cooling to 10°C, TPC was added to make it 27.27 mol% with respect to TFMB, and after stirring for 10 minutes, TPC was further added to make it 27.27 mol% with respect to TFMB, and stirring was carried out for 30 minutes. Then, the same amount of DMAc as the DMAc added initially was added, and after stirring for 10 minutes, TPC was added to 6.06 mol% with respect to TFMB, and the mixture was stirred for 2 hours. Then, diisopropylethylamine, 4-picoline, and acetic anhydride were added to the flask so that they were respectively 60.61 mol%, 60.61 mol%, and 282.83 mol% relative to TFMB. After stirring for 30 minutes, the internal temperature The temperature was raised to 70°C and further stirred for 3 hours to obtain a reaction liquid. The obtained reaction liquid was cooled to room temperature, the reaction liquid was linearly poured into a large amount of methanol, and the deposited precipitate was taken out, immersed in methanol for 6 hours, and then washed with methanol. Then, the precipitate was dried under reduced pressure at 60°C to obtain a polyimide resin (1). The Mw of the obtained polyimide resin (1) was 748,000.

[光學膜(1)之製造] 於所獲得之聚醯胺醯亞胺樹脂(1)中,以濃度成為10質量%之方式添加DMAc,製作聚醯胺醯亞胺樹脂清漆(1)。使用敷料器,以自立膜之厚度成為45 μm之方式,於聚酯基材(東洋紡織(股)製造,商品名「A4100」)之平滑面上塗敷所獲得之聚醯胺醯亞胺樹脂清漆(1),於50℃下乾燥30分鐘,繼而於140℃下乾燥15分鐘,獲得自立膜。將自立膜固定於金屬框,進而於200℃下乾燥60分鐘,獲得厚度40 μm之光學膜(1)。[Manufacturing of Optical Film (1)] To the obtained polyimide resin (1), DMAc was added so that the concentration became 10% by mass to produce a polyimide resin varnish (1). Using an applicator, apply the obtained polyimide resin varnish on the smooth surface of a polyester substrate (manufactured by Toyobo Co., Ltd., trade name "A4100") so that the thickness of the self-supporting film becomes 45 μm (1) Drying at 50°C for 30 minutes, and then at 140°C for 15 minutes, to obtain a self-supporting film. The self-supporting film was fixed to a metal frame, and then dried at 200° C. for 60 minutes to obtain an optical film (1) with a thickness of 40 μm.

(實施例2) [聚醯胺醯亞胺樹脂(2)之製備] 於氮氣氛圍下,於具備攪拌翼之可分離式燒瓶中,以TFMB之固形物成分成為5.08質量%之方式,添加TFMB及水分量嚴格脫水至700 ppm以下之DMAc,一面於室溫下進行攪拌,一面使TFMB溶解於DMAc中。然後,於燒瓶中添加6FDA及TAHMBP,使其等相對於TFMB分別成為20.62 mol%,於室溫下攪拌16小時。然後,冷卻至10℃後,添加TPC,使其相對於TFMB成為27.84 mol%,攪拌10分鐘後,進而添加TPC,使其相對於TFMB成為27.84 mol%,攪拌30分鐘。然後,添加與最初添加之DMAc相同量之DMAc,攪拌10分鐘後,添加TPC,使其相對於TFMB成為6.19 mol%,攪拌2小時。繼而,於燒瓶中添加二異丙基乙基胺、4-甲吡啶及乙酸酐,使其等相對於TFMB分別成為61.86 mol%、61.86 mol%、288.66 mol%,攪拌30分鐘後,將內溫升溫至70℃,進而攪拌3小時,獲得反應液。 將所獲得之反應液冷卻至室溫,將該反應液以線狀投入大量之甲醇中,取出析出之沈澱物,於甲醇中浸漬6小時後,用甲醇洗淨。然後,於60℃下進行沈澱物之減壓乾燥,獲得聚醯胺醯亞胺樹脂(2)。所獲得之聚醯胺醯亞胺樹脂(2)之Mw為486,000。(Example 2) [Preparation of polyamide imide resin (2)] Under nitrogen atmosphere, in a separable flask equipped with stirring wings, add TFMB and DMAc whose water content is strictly dehydrated to less than 700 ppm in such a way that the solid content of TFMB becomes 5.08% by mass, while stirring at room temperature , While dissolving TFMB in DMAc. Then, 6FDA and TAHMBP were added to the flask so that each of them became 20.62 mol% with respect to TFMB, and the flask was stirred at room temperature for 16 hours. Then, after cooling to 10°C, TPC was added to make it 27.84 mol% with respect to TFMB, and after stirring for 10 minutes, TPC was further added to make it 27.84 mol% with respect to TFMB, and stirring was carried out for 30 minutes. Then, the same amount of DMAc as the DMAc added initially was added, and after stirring for 10 minutes, TPC was added to make it 6.19 mol% with respect to TFMB, and the mixture was stirred for 2 hours. Then, diisopropylethylamine, 4-picoline, and acetic anhydride were added to the flask to make them 61.86 mol%, 61.86 mol%, and 288.66 mol% with respect to TFMB, respectively. After stirring for 30 minutes, the internal temperature The temperature was raised to 70°C and further stirred for 3 hours to obtain a reaction liquid. The obtained reaction liquid was cooled to room temperature, the reaction liquid was thrown into a large amount of methanol in a linear fashion, and the deposited precipitate was taken out, immersed in methanol for 6 hours, and then washed with methanol. Then, the precipitate was dried under reduced pressure at 60°C to obtain polyimide resin (2). The Mw of the obtained polyimide resin (2) was 486,000.

[光學膜(2)之製造] 於所獲得之聚醯胺醯亞胺樹脂(2)中,以濃度成為10質量%之方式添加DMAc,製作聚醯胺醯亞胺樹脂清漆(2)。使用敷料器,以自立膜之厚度成為45 μm之方式,於聚酯基材(東洋紡織(股)製造,商品名「A4100」)之平滑面上塗敷所獲得之聚醯胺醯亞胺樹脂清漆(2),於50℃下乾燥30分鐘,繼而於140℃下乾燥15分鐘,獲得自立膜。將自立膜固定於金屬框,進而於200℃下乾燥60分鐘,獲得厚度40 μm之光學膜(2)。[Manufacturing of Optical Film (2)] To the obtained polyimide resin (2), DMAc was added so that the concentration became 10% by mass to produce a polyimide resin varnish (2). Using an applicator, apply the obtained polyimide resin varnish on the smooth surface of a polyester substrate (manufactured by Toyobo Co., Ltd., trade name "A4100") so that the thickness of the self-supporting film becomes 45 μm (2) Drying at 50°C for 30 minutes, and then at 140°C for 15 minutes, to obtain a self-supporting film. The self-supporting film was fixed to a metal frame, and then dried at 200° C. for 60 minutes to obtain an optical film (2) with a thickness of 40 μm.

(實施例3) [聚醯胺醯亞胺樹脂(3)之製備] 於氮氣氛圍下,於具備攪拌翼之可分離式燒瓶中,以TFMB之固形物成分成為5.08質量%之方式,添加TFMB及水分量嚴格脫水至700 ppm以下之DMAc,一面於室溫下進行攪拌,一面使TFMB溶解於DMAc中。然後,於燒瓶中添加6FDA及TAHMBP,使其等相對於TFMB分別成為20.62 mol%,於室溫下攪拌16小時。然後,冷卻至10℃後,添加TPC,使其相對於TFMB成為27.84 mol%,攪拌10分鐘後,進而添加TPC,使其相對於TFMB成為27.84 mol%,攪拌30分鐘。然後,添加與最初添加之DMAc相同量之DMAc,攪拌10分鐘後,添加TPC,使其相對於TFMB成為6.19 mol%,攪拌2小時。繼而,於燒瓶中添加二異丙基乙基胺、4-甲吡啶及乙酸酐,使其等相對於TFMB分別成為61.86 mol%、61.86 mol%、288.66 mol%,攪拌30分鐘後,將內溫升溫至70℃,進而攪拌3小時,獲得反應液。 將所獲得之反應液冷卻至室溫,將該反應液以線狀投入大量之甲醇中,取出析出之沈澱物,於甲醇中浸漬6小時後,用甲醇洗淨。然後,於60℃下進行沈澱物之減壓乾燥,獲得聚醯胺醯亞胺樹脂(3)。所獲得之聚醯胺醯亞胺樹脂(3)之Mw為215,000。(Example 3) [Preparation of polyamide imide resin (3)] Under nitrogen atmosphere, in a separable flask equipped with stirring wings, add TFMB and DMAc whose water content is strictly dehydrated to less than 700 ppm in such a way that the solid content of TFMB becomes 5.08% by mass, while stirring at room temperature , While dissolving TFMB in DMAc. Then, 6FDA and TAHMBP were added to the flask so that each of them became 20.62 mol% with respect to TFMB, and the flask was stirred at room temperature for 16 hours. Then, after cooling to 10°C, TPC was added to make it 27.84 mol% with respect to TFMB, and after stirring for 10 minutes, TPC was further added to make it 27.84 mol% with respect to TFMB, and stirring was carried out for 30 minutes. Then, the same amount of DMAc as the DMAc added initially was added, and after stirring for 10 minutes, TPC was added to make it 6.19 mol% with respect to TFMB, and the mixture was stirred for 2 hours. Then, diisopropylethylamine, 4-picoline, and acetic anhydride were added to the flask to make them 61.86 mol%, 61.86 mol%, and 288.66 mol% with respect to TFMB, respectively. After stirring for 30 minutes, the internal temperature The temperature was raised to 70°C and further stirred for 3 hours to obtain a reaction liquid. The obtained reaction liquid was cooled to room temperature, the reaction liquid was thrown into a large amount of methanol in a linear fashion, and the deposited precipitate was taken out, immersed in methanol for 6 hours, and then washed with methanol. Then, the precipitate was dried under reduced pressure at 60°C to obtain polyimide resin (3). The Mw of the obtained polyimide resin (3) was 215,000.

[光學膜(3)之製造] 於所獲得之聚醯胺醯亞胺樹脂(3)中,以濃度成為10質量%之方式添加DMAc,製作聚醯胺醯亞胺樹脂清漆(3)。使用敷料器,以自立膜之厚度成為45 μm之方式,於聚酯基材(東洋紡織(股)製造,商品名「A4100」)之平滑面上塗敷所獲得之聚醯胺醯亞胺樹脂清漆(3),於50℃下乾燥30分鐘,繼而於140℃下乾燥15分鐘,獲得自立膜。將自立膜固定於金屬框,進而於200℃下乾燥60分鐘,獲得厚度40 μm之光學膜(3)。[Manufacturing of Optical Film (3)] To the obtained polyimide resin (3), DMAc was added so that the concentration became 10% by mass to produce a polyimide resin varnish (3). Using an applicator, apply the obtained polyimide resin varnish on the smooth surface of a polyester substrate (manufactured by Toyobo Co., Ltd., trade name "A4100") so that the thickness of the self-supporting film becomes 45 μm (3) Drying at 50°C for 30 minutes, followed by drying at 140°C for 15 minutes, to obtain a self-supporting film. The self-supporting film was fixed to a metal frame, and then dried at 200° C. for 60 minutes to obtain an optical film (3) with a thickness of 40 μm.

(實施例4) [聚醯胺醯亞胺樹脂(4)之製備] 於氮氣氛圍下,於具備攪拌翼之可分離式燒瓶中,以TFMB之固形物成分成為5.16質量%之方式,添加TFMB及水分量嚴格脫水至700 ppm以下之DMAc,一面於室溫下進行攪拌,一面使TFMB溶解於DMAc中。然後,於燒瓶中添加TAHMBP,使其相對於TFMB成為30.61 mol%,於室溫下攪拌16小時。然後,冷卻至10℃後,添加TPC,使其相對於TFMB成為32.14 mol%,攪拌10分鐘後,進而添加TPC,使其相對於TFMB成為32.14 mol%,攪拌30分鐘。然後,添加與最初添加之DMAc相同量之DMAc,攪拌10分鐘後,添加TPC,使其相對於TFMB成為7.14 mol%,攪拌2小時。繼而,於燒瓶中添加二異丙基乙基胺、4-甲吡啶及乙酸酐,使其等相對於TFMB分別成為71.43 mol%、71.43 mol%、214.29 mol%,攪拌30分鐘後,將內溫升溫至70℃,進而攪拌3小時,獲得反應液。 將所獲得之反應液冷卻至室溫,將該反應液以線狀投入大量之甲醇中,取出析出之沈澱物,於甲醇中浸漬6小時後,用甲醇洗淨。然後,於60℃下進行沈澱物之減壓乾燥,獲得聚醯胺醯亞胺樹脂(4)。所獲得之聚醯胺醯亞胺樹脂(4)之Mw為764,000。(Example 4) [Preparation of polyamide imide resin (4)] Under nitrogen atmosphere, in a separable flask equipped with stirring wings, add TFMB and DMAc whose water content is strictly dehydrated to less than 700 ppm in such a way that the solid content of TFMB becomes 5.16% by mass, while stirring at room temperature , While dissolving TFMB in DMAc. Then, TAHMBP was added to the flask so that it became 30.61 mol% with respect to TFMB, and it stirred at room temperature for 16 hours. Then, after cooling to 10°C, TPC was added to make it 32.14 mol% with respect to TFMB, and after stirring for 10 minutes, TPC was further added to make it to 32.14 mol% with respect to TFMB, and stirring was carried out for 30 minutes. Then, the same amount of DMAc as the DMAc added initially was added, and after stirring for 10 minutes, TPC was added so as to be 7.14 mol% with respect to TFMB, and the mixture was stirred for 2 hours. Then, diisopropylethylamine, 4-picoline, and acetic anhydride were added to the flask so that they were 71.43 mol%, 71.43 mol%, and 214.29 mol% with respect to TFMB. After stirring for 30 minutes, the internal temperature The temperature was raised to 70°C and further stirred for 3 hours to obtain a reaction liquid. The obtained reaction liquid was cooled to room temperature, the reaction liquid was thrown into a large amount of methanol in a linear fashion, and the deposited precipitate was taken out, immersed in methanol for 6 hours, and then washed with methanol. Then, the precipitate was dried under reduced pressure at 60°C to obtain polyimide resin (4). The Mw of the obtained polyimide resin (4) was 764,000.

[光學膜(4)之製造] 於所獲得之聚醯胺醯亞胺樹脂(4)中,以濃度成為10質量%之方式添加DMAc,製作聚醯胺醯亞胺樹脂清漆(4)。使用敷料器,以自立膜之厚度成為45 μm之方式,於聚酯基材(東洋紡織(股)製造,商品名「A4100」)之平滑面上塗敷所獲得之聚醯胺醯亞胺樹脂清漆(4),於50℃下乾燥30分鐘,繼而於140℃下乾燥15分鐘,獲得自立膜。將自立膜固定於金屬框,進而於200℃下乾燥60分鐘,獲得厚度40 μm之光學膜(4)。[Manufacturing of Optical Film (4)] To the obtained polyimide resin (4), DMAc was added so that the concentration might be 10% by mass to produce a polyimide resin varnish (4). Using an applicator, apply the obtained polyimide resin varnish on the smooth surface of a polyester substrate (manufactured by Toyobo Co., Ltd., trade name "A4100") so that the thickness of the self-supporting film becomes 45 μm (4) Drying at 50°C for 30 minutes, and then at 140°C for 15 minutes to obtain a self-supporting film. The self-supporting film was fixed to a metal frame, and then dried at 200° C. for 60 minutes to obtain an optical film (4) with a thickness of 40 μm.

(實施例5) [聚醯胺醯亞胺樹脂(5)之製備] 於氮氣氛圍下,於具備攪拌翼之可分離式燒瓶中,以TFMB之固形物成分成為4.86質量%之方式,添加TFMB及水分量嚴格脫水至700 ppm以下之DMAc,一面於室溫下進行攪拌,一面使TFMB溶解於DMAc中。然後,於燒瓶中添加TAHMBP,使其相對於TFMB成為40.82 mol%,於室溫下攪拌16小時。然後,冷卻至10℃後,添加TPC,使其相對於TFMB成為27.55 mol%,攪拌10分鐘後,進而添加TPC,使其相對於TFMB成為27.55 mol%,攪拌30分鐘。然後,添加與最初添加之DMAc相同量之DMAc,攪拌10分鐘後,添加TPC,使其相對於TFMB成為6.12 mol%,攪拌2小時。繼而,於燒瓶中添加二異丙基乙基胺、4-甲吡啶及乙酸酐,使其等相對於TFMB分別成為61.22 mol%、61.22 mol%、285.71 mol%,攪拌30分鐘後,將內溫升溫至70℃,進而攪拌3小時,獲得反應液。 將所獲得之反應液冷卻至室溫,將該反應液以線狀投入大量之甲醇中,取出析出之沈澱物,於甲醇中浸漬6小時後,用甲醇洗淨。然後,於60℃下進行沈澱物之減壓乾燥,獲得聚醯胺醯亞胺樹脂(5)。所獲得之聚醯胺醯亞胺樹脂(5)之Mw為613,000。(Example 5) [Preparation of polyamide imide resin (5)] Under a nitrogen atmosphere, in a separable flask equipped with a stirring blade, add TFMB and DMAc whose water content is strictly dehydrated to less than 700 ppm in such a way that the solid content of TFMB becomes 4.86% by mass, and stir at room temperature. , While dissolving TFMB in DMAc. Then, TAHMBP was added to the flask so that it became 40.82 mol% with respect to TFMB, and it stirred at room temperature for 16 hours. Then, after cooling to 10°C, TPC was added to make it 27.55 mol% with respect to TFMB, and after stirring for 10 minutes, TPC was further added to make it 27.55 mol% with respect to TFMB, and stirring was carried out for 30 minutes. Then, the same amount of DMAc as the DMAc added initially was added, and after stirring for 10 minutes, TPC was added to make it 6.12 mol% with respect to TFMB, and the mixture was stirred for 2 hours. Then, diisopropylethylamine, 4-picoline, and acetic anhydride were added to the flask so that they were 61.22 mol%, 61.22 mol%, and 285.71 mol% with respect to TFMB. After stirring for 30 minutes, the internal temperature The temperature was raised to 70°C and further stirred for 3 hours to obtain a reaction liquid. The obtained reaction liquid was cooled to room temperature, the reaction liquid was thrown into a large amount of methanol in a linear fashion, and the deposited precipitate was taken out, immersed in methanol for 6 hours, and then washed with methanol. Then, the precipitate was dried under reduced pressure at 60°C to obtain a polyimide resin (5). The Mw of the obtained polyimide resin (5) was 613,000.

[光學膜(5)之製造] 於所獲得之聚醯胺醯亞胺樹脂(5)中,以濃度成為10質量%之方式添加DMAc,製作聚醯胺醯亞胺樹脂清漆(5)。使用敷料器,以自立膜之厚度成為45 μm之方式,於聚酯基材(東洋紡織(股)製造,商品名「A4100」)之平滑面上塗敷所獲得之聚醯胺醯亞胺樹脂清漆(5),於50℃下乾燥30分鐘,繼而於140℃下乾燥15分鐘,獲得自立膜。將自立膜固定於金屬框,進而於200℃下乾燥60分鐘,獲得厚度40 μm之光學膜(5)。[Manufacturing of Optical Film (5)] To the obtained polyimide resin (5), DMAc was added so that the concentration became 10 mass %, and the polyimide resin varnish (5) was produced. Using an applicator, apply the obtained polyimide resin varnish on the smooth surface of a polyester substrate (manufactured by Toyobo Co., Ltd., trade name "A4100") so that the thickness of the self-supporting film becomes 45 μm (5) Drying at 50°C for 30 minutes, followed by drying at 140°C for 15 minutes, to obtain a self-supporting film. The self-supporting film was fixed to a metal frame, and then dried at 200° C. for 60 minutes to obtain an optical film (5) with a thickness of 40 μm.

(實施例6) [聚醯胺醯亞胺樹脂(6)之製備] 於氮氣氛圍下,於具備攪拌翼之可分離式燒瓶中,以TFMB之固形物成分成為5.29質量%之方式,添加TFMB及水分量嚴格脫水至700 ppm以下之DMAc,一面於室溫下進行攪拌,一面使TFMB溶解於DMAc中。然後,於燒瓶中添加6FDA及TAHMBP,使其等相對於TFMB分別成為10.20 mol%、20.41 mol%,於室溫下攪拌16小時。然後,冷卻至10℃後,添加TPC,使其相對於TFMB成為32.14 mol%,攪拌10分鐘後,進而添加TPC,使其相對於TFMB成為32.14 mol%,攪拌30分鐘。然後,添加與最初添加之DMAc相同量之DMAc,攪拌10分鐘後,添加TPC,使其相對於TFMB成為7.14 mol%,攪拌2小時。繼而,於燒瓶中添加二異丙基乙基胺、4-甲吡啶及乙酸酐,使其等相對於TFMB分別成為71.43 mol%、71.43 mol%、214.29 mol%,攪拌30分鐘後,將內溫升溫至70℃,進而攪拌3小時,獲得反應液。 將所獲得之反應液冷卻至室溫,將該反應液以線狀投入大量之甲醇中,取出析出之沈澱物,於甲醇中浸漬6小時後,用甲醇洗淨。然後,於60℃下進行沈澱物之減壓乾燥,獲得聚醯胺醯亞胺樹脂(6)。所獲得之聚醯胺醯亞胺樹脂(6)之Mw為751,000。(Example 6) [Preparation of polyamide imide resin (6)] Under nitrogen atmosphere, in a separable flask equipped with stirring wings, add TFMB and DMAc whose water content is strictly dehydrated to 700 ppm or less so that the solid content of TFMB becomes 5.29% by mass, while stirring at room temperature , While dissolving TFMB in DMAc. Then, 6FDA and TAHMBP were added to the flask so that it became 10.20 mol% and 20.41 mol% with respect to TFMB, respectively, and stirred at room temperature for 16 hours. Then, after cooling to 10°C, TPC was added to make it 32.14 mol% with respect to TFMB, and after stirring for 10 minutes, TPC was further added to make it to 32.14 mol% with respect to TFMB, and stirring was carried out for 30 minutes. Then, the same amount of DMAc as the DMAc added initially was added, and after stirring for 10 minutes, TPC was added so as to be 7.14 mol% with respect to TFMB, and the mixture was stirred for 2 hours. Then, diisopropylethylamine, 4-picoline, and acetic anhydride were added to the flask so that they were 71.43 mol%, 71.43 mol%, and 214.29 mol% with respect to TFMB. After stirring for 30 minutes, the internal temperature The temperature was raised to 70°C and further stirred for 3 hours to obtain a reaction liquid. The obtained reaction liquid was cooled to room temperature, the reaction liquid was thrown into a large amount of methanol in a linear fashion, and the deposited precipitate was taken out, immersed in methanol for 6 hours, and then washed with methanol. Then, the precipitate was dried under reduced pressure at 60°C to obtain polyimide resin (6). The Mw of the obtained polyimide resin (6) was 751,000.

[光學膜(6)之製造] 於所獲得之聚醯胺醯亞胺樹脂(6)中,以濃度成為10質量%之方式添加DMAc,製作聚醯胺醯亞胺樹脂清漆(6)。使用敷料器,以自立膜之厚度成為45 μm之方式,於聚酯基材(東洋紡織(股)製造,商品名「A4100」)之平滑面上塗敷所獲得之聚醯胺醯亞胺樹脂清漆(6),於50℃下乾燥30分鐘,繼而於140℃下乾燥15分鐘,獲得自立膜。將自立膜固定於金屬框,進而於200℃下乾燥60分鐘,獲得厚度40 μm之光學膜(6)。[Manufacturing of Optical Film (6)] To the obtained polyimide resin (6), DMAc was added so that the concentration became 10 mass %, and the polyimide resin varnish (6) was produced. Using an applicator, apply the obtained polyimide resin varnish on the smooth surface of a polyester substrate (manufactured by Toyobo Co., Ltd., trade name "A4100") so that the thickness of the self-supporting film becomes 45 μm (6) Drying at 50°C for 30 minutes, and then at 140°C for 15 minutes, to obtain a self-supporting film. The self-supporting film was fixed to a metal frame, and then dried at 200° C. for 60 minutes to obtain an optical film (6) with a thickness of 40 μm.

(比較例1) [聚醯胺醯亞胺樹脂(7)之製備] 於氮氣氛圍下,於具備攪拌翼之可分離式燒瓶中,以TFMB之固形物成分成為5.27質量%之方式,添加TFMB及水分量嚴格脫水至700 ppm以下之DMAc,一面於室溫下進行攪拌,一面使TFMB溶解於DMAc中。然後,於燒瓶中添加6FDA、及偏苯三甲酸酐與4,4'-聯苯酚之酯化物(TA44BP),使其等相對於TFMB分別成為20.10 mol%,於室溫下攪拌16小時。然後,冷卻至10℃後,添加TPC,使其相對於TFMB成為27.14 mol%,攪拌10分鐘後,進而添加TPC,使其相對於TFMB成為27.14mоl%,攪拌30分鐘。然後,添加與最初添加之DMAc相同量之DMAc,攪拌10分鐘後,添加TPC,使其相對於TFMB成為6.03 mol%,攪拌2小時。繼而,於燒瓶中添加二異丙基乙基胺、4-甲吡啶及乙酸酐,使其等相對於TFMB分別成為60.30 mol%、60.30 mol%、281.41 mol%,攪拌30分鐘後,將內溫升溫至70℃,進而攪拌3小時,獲得反應液。 將所獲得之反應液冷卻至室溫,將該反應液以線狀投入大量之甲醇中,取出析出之沈澱物,於甲醇中浸漬6小時後,用甲醇洗淨。然後,於60℃下進行沈澱物之減壓乾燥,獲得聚醯胺醯亞胺樹脂(7)。所獲得之聚醯胺醯亞胺樹脂(7)之Mw為139,000。(Comparative example 1) [Preparation of polyamide imide resin (7)] Under nitrogen atmosphere, in a separable flask equipped with stirring wings, add TFMB and DMAc whose water content is strictly dehydrated to less than 700 ppm in such a way that the solid content of TFMB becomes 5.27% by mass, while stirring at room temperature , While dissolving TFMB in DMAc. Then, 6FDA and the esterified product of trimellitic anhydride and 4,4'-biphenol (TA44BP) were added to the flask so that the equivalent was 20.10 mol% with respect to TFMB, and the mixture was stirred at room temperature for 16 hours. Then, after cooling to 10° C., TPC was added to make it 27.14 mol% with respect to TFMB, and after stirring for 10 minutes, TPC was further added to make it to 27.14 mol% with respect to TFMB, and stirred for 30 minutes. Then, the same amount of DMAc as the DMAc added initially was added, and after stirring for 10 minutes, TPC was added to 6.03 mol% with respect to TFMB, and the mixture was stirred for 2 hours. Then, diisopropylethylamine, 4-picoline, and acetic anhydride were added to the flask so that they were respectively 60.30 mol%, 60.30 mol%, and 281.41 mol% relative to TFMB. After stirring for 30 minutes, the internal temperature The temperature was raised to 70°C and further stirred for 3 hours to obtain a reaction liquid. The obtained reaction liquid was cooled to room temperature, the reaction liquid was thrown into a large amount of methanol in a linear fashion, and the deposited precipitate was taken out, immersed in methanol for 6 hours, and then washed with methanol. Then, the precipitate was dried under reduced pressure at 60°C to obtain polyimide resin (7). The Mw of the obtained polyimide resin (7) was 139,000.

[光學膜(7)之製造] 於所獲得之聚醯胺醯亞胺樹脂(7)中,以濃度成為10質量%之方式添加DMAc,製作聚醯胺醯亞胺樹脂清漆(7)。使用敷料器,以自立膜之厚度成為55 μm之方式,於聚酯基材(東洋紡織(股)製造,商品名「A4100」)之平滑面上塗敷所獲得之聚醯胺醯亞胺樹脂清漆(7),於50℃下乾燥30分鐘,繼而於140℃下乾燥15分鐘,獲得自立膜。將自立膜固定於金屬框,進而於200℃下乾燥60分鐘,獲得厚度50 μm之光學膜(7)。[Manufacturing of Optical Film (7)] To the obtained polyimide resin (7), DMAc was added so that the concentration became 10% by mass to produce a polyimide resin varnish (7). Using an applicator, apply the obtained polyimide resin varnish to the smooth surface of a polyester substrate (manufactured by Toyobo Co., Ltd., trade name "A4100") so that the thickness of the self-supporting film becomes 55 μm (7) Drying at 50°C for 30 minutes, and then at 140°C for 15 minutes, to obtain a self-supporting film. The self-supporting film was fixed to a metal frame, and then dried at 200° C. for 60 minutes to obtain an optical film (7) with a thickness of 50 μm.

(比較例2) [聚醯胺醯亞胺樹脂(8)之製備] 於氮氣氛圍下,於具備攪拌翼之可分離式燒瓶中,以TFMB之固形物成分成為5.35質量%之方式,添加TFMB及水分量嚴格脫水至700 ppm以下之DMAc,一面於室溫下進行攪拌,一面使TFMB溶解於DMAc中。然後,於燒瓶中添加6FDA,使其相對於TFMB成為41.24 mol%,於室溫下攪拌16小時。然後,冷卻至10℃後,添加TPC,使其相對於TFMB成為27.84 mol%,攪拌10分鐘後,進而添加TPC,使其相對於TFMB成為27.84 mol%,攪拌30分鐘。然後,添加與最初添加之DMAc相同量之DMAc,攪拌10分鐘後,添加TPC,使其相對於TFMB成為6.19 mol%,攪拌2小時。繼而,於燒瓶中添加二異丙基乙基胺、4-甲吡啶及乙酸酐,使其等相對於TFMB分別成為61.86 mol%、61.86 mol%、288.66 mol%,攪拌30分鐘後,將內溫升溫至70℃,進而攪拌3小時,獲得反應液。 將所獲得之反應液冷卻至室溫,將該反應液以線狀投入大量之甲醇中,取出析出之沈澱物,於甲醇中浸漬6小時後,用甲醇洗淨。然後,於60℃下進行沈澱物之減壓乾燥,獲得聚醯胺醯亞胺樹脂(8)。所獲得之聚醯胺醯亞胺樹脂(8)之Mw為174,000。(Comparative example 2) [Preparation of polyamide imide resin (8)] Under a nitrogen atmosphere, in a separable flask equipped with stirring wings, add TFMB and DMAc whose water content is strictly dehydrated to less than 700 ppm in such a way that the solid content of TFMB becomes 5.35 mass%, and stir at room temperature. , While dissolving TFMB in DMAc. Then, 6FDA was added to the flask to make it 41.24 mol% with respect to TFMB, and it was stirred at room temperature for 16 hours. Then, after cooling to 10°C, TPC was added to make it 27.84 mol% with respect to TFMB, and after stirring for 10 minutes, TPC was further added to make it 27.84 mol% with respect to TFMB, and stirring was carried out for 30 minutes. Then, the same amount of DMAc as the DMAc added initially was added, and after stirring for 10 minutes, TPC was added to make it 6.19 mol% with respect to TFMB, and the mixture was stirred for 2 hours. Then, diisopropylethylamine, 4-picoline, and acetic anhydride were added to the flask to make them 61.86 mol%, 61.86 mol%, and 288.66 mol% with respect to TFMB, respectively. After stirring for 30 minutes, the internal temperature The temperature was raised to 70°C and further stirred for 3 hours to obtain a reaction liquid. The obtained reaction liquid was cooled to room temperature, the reaction liquid was linearly poured into a large amount of methanol, and the deposited precipitate was taken out, immersed in methanol for 6 hours, and then washed with methanol. Then, the precipitate was dried under reduced pressure at 60°C to obtain a polyimide resin (8). The Mw of the obtained polyimide resin (8) was 174,000.

[光學膜(8)之製造] 於所獲得之聚醯胺醯亞胺樹脂(8)中,以濃度成為10質量%之方式添加DMAc,製作聚醯胺醯亞胺樹脂清漆(8)。使用敷料器,以自立膜之厚度成為55 μm之方式,於聚酯基材(東洋紡織(股)製造,商品名「A4100」)之平滑面上塗敷所獲得之聚醯胺醯亞胺樹脂清漆(8),於50℃下乾燥30分鐘,繼而於140℃下乾燥15分鐘,獲得自立膜。將自立膜固定於金屬框,進而於200℃下乾燥60分鐘,獲得厚度50 μm之光學膜(8)。[Manufacturing of Optical Film (8)] To the obtained polyimide resin (8), DMAc was added so that the concentration became 10% by mass to produce a polyimide resin varnish (8). Using an applicator, apply the obtained polyimide resin varnish to the smooth surface of a polyester substrate (manufactured by Toyobo Co., Ltd., trade name "A4100") so that the thickness of the self-supporting film becomes 55 μm (8) Drying at 50°C for 30 minutes, and then at 140°C for 15 minutes, to obtain a self-supporting film. The self-supporting film was fixed to a metal frame, and then dried at 200° C. for 60 minutes to obtain an optical film (8) with a thickness of 50 μm.

(比較例3) [聚醯胺醯亞胺樹脂(9)之製備] 於氮氣氛圍下,於具備攪拌翼之可分離式燒瓶中,以TFMB之固形物成分成為5.81質量%之方式,添加TFMB及水分量嚴格脫水至700 ppm以下之DMAc,一面於室溫下進行攪拌,一面使TFMB溶解於DMAc中。然後,於燒瓶中添加6FDA,使其相對於TFMB成為20.41 mol%,於室溫下攪拌16小時。然後,冷卻至10℃後,添加TPC,使其相對於TFMB成為36.73 mol%,攪拌10分鐘後,進而添加TPC,使其相對於TFMB成為36.73 mol%,攪拌30分鐘。然後,添加與最初添加之DMAc相同量之DMAc,攪拌10分鐘後,添加TPC,使其相對於TFMB成為8.16 mol%,攪拌2小時,但中途黏度顯著上升,溶液成為瓊脂狀。難以進行其後之合成操作,因此放棄樹脂合成。(Comparative example 3) [Preparation of polyamide imide resin (9)] Under a nitrogen atmosphere, in a separable flask equipped with stirring wings, add TFMB and DMAc whose water content is strictly dehydrated to less than 700 ppm in such a way that the solid content of TFMB becomes 5.81% by mass, while stirring at room temperature , While dissolving TFMB in DMAc. Then, 6FDA was added to the flask so that it was 20.41 mol% with respect to TFMB, and it was stirred at room temperature for 16 hours. Then, after cooling to 10° C., TPC was added to make it 36.73 mol% with respect to TFMB, and after stirring for 10 minutes, TPC was further added to make it 36.73 mol% with respect to TFMB, and the mixture was stirred for 30 minutes. Then, the same amount of DMAc as the DMAc added initially was added, and after stirring for 10 minutes, TPC was added to make it 8.16 mol% relative to TFMB, and stirred for 2 hours, but the viscosity increased significantly in the middle, and the solution became agar-like. It is difficult to carry out the subsequent synthesis operation, so resin synthesis is abandoned.

針對實施例1~6以及比較例1及2中獲得之光學膜,進行耐力、全光線透過率、霧度、YI值及彈性模數之測定、以及耐折性評價,將結果示於表1中。再者,比較例3於合成中成為不溶狀態,未能合成聚醯胺醯亞胺樹脂,因此無法進行測定及評價。For the optical films obtained in Examples 1 to 6 and Comparative Examples 1 and 2, measurements of endurance, total light transmittance, haze, YI value, and elastic modulus, and evaluation of folding endurance were performed. The results are shown in Table 1. in. In addition, Comparative Example 3 became insoluble during the synthesis, and the polyamide resin could not be synthesized, so measurement and evaluation could not be performed.

[表1]    耐力 (MPa) 全光線透過率(%) 霧度(%) YI值 彈性模數 (GPa) 耐折次數 (次) 實施例1 95.4 91.4 0.3 2.44 6.24 254,000 實施例2 90.8 89.0 0.2 2.27 5.99 111,000 實施例3 90.4 89.1 0.2 2.41 6.01 107,000 實施例4 105.1 88.4 0.3 2.49 7.02 377,000 實施例5 91.6 89.1 0.3 2.55 5.43 146,000 實施例6 106.6 88.7 0.2 2.57 6.56 241,000 比較例1 77.1 88.0 3.25 18.11 5.88 11,000 比較例2 72.0 91.8 0.2 1.56 4.71 75,000 [Table 1] Endurance (MPa) Total light transmittance (%) Haze (%) YI value Modulus of Elasticity (GPa) Folding times (times) Example 1 95.4 91.4 0.3 2.44 6.24 254,000 Example 2 90.8 89.0 0.2 2.27 5.99 111,000 Example 3 90.4 89.1 0.2 2.41 6.01 107,000 Example 4 105.1 88.4 0.3 2.49 7.02 377,000 Example 5 91.6 89.1 0.3 2.55 5.43 146,000 Example 6 106.6 88.7 0.2 2.57 6.56 241,000 Comparative example 1 77.1 88.0 3.25 18.11 5.88 11,000 Comparative example 2 72.0 91.8 0.2 1.56 4.71 75,000

如表1所示,確認到,由實施例1~6之聚醯胺醯亞胺樹脂形成之光學膜具有較高之耐力,且具有優異之光學特性。相對於此,確認到,由比較例1及2之聚醯胺醯亞胺樹脂形成之光學膜之耐力較低。 因此可知,由實施例1~6之聚醯胺醯亞胺樹脂形成之膜具有高耐力,且具有優異之光學特性。As shown in Table 1, it was confirmed that the optical films formed from the polyamide imide resins of Examples 1 to 6 had high durability and excellent optical properties. In contrast, it was confirmed that the optical films formed of the polyamide imide resins of Comparative Examples 1 and 2 had low durability. Therefore, it can be seen that the films formed from the polyamide imide resins of Examples 1 to 6 have high durability and excellent optical properties.

Claims (14)

一種聚醯胺醯亞胺樹脂,其包含式(1)及式(2): [化23]
Figure 03_image049
[式(1)及式(2)中,X及Z相互獨立地表示2價有機基,Y表示4價有機基,*表示鍵結鍵] 所表示之結構單元,且包含式(3): [化24]
Figure 03_image051
[式(3)中,R1 相互獨立地表示鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基或芳氧基,R2 ~R5 相互獨立地表示氫原子或可具有鹵素原子之1價烴基,m相互獨立地表示0~3之整數,n表示1~4之整數,*表示鍵結鍵,其中,於具有R2 ~R5 之至少1個苯環中,R2 ~R5 之至少1個為可具有鹵素原子之1價烴基] 所表示之結構作為式(1)中之Y。
A polyamide imide resin, which comprises formula (1) and formula (2): [化23]
Figure 03_image049
[In formula (1) and formula (2), X and Z independently represent a divalent organic group, Y represents a tetravalent organic group, and * represents a bonding bond] The structural unit represented, and includes the formula (3): [化24]
Figure 03_image051
[In formula (3), R 1 independently represents a halogen atom, an alkyl group, an alkoxy group, an aryl group, or an aryloxy group that may have a halogen atom, and R 2 to R 5 independently represent a hydrogen atom or may have a halogen A monovalent hydrocarbon group of atoms, m independently represents an integer from 0 to 3, n represents an integer from 1 to 4, * represents a bonding bond, wherein, in at least one benzene ring having R 2 to R 5 , R 2 At least one of ~R 5 is a monovalent hydrocarbon group which may have a halogen atom] The structure represented by the structure represented is as Y in the formula (1).
如請求項1之聚醯胺醯亞胺樹脂,其包含2價芳香族基、2價脂環族基及2價脂肪族基之至少1種作為式(1)及式(2)中之X。Such as the polyamide imine resin of claim 1, which contains at least one of a divalent aromatic group, a divalent alicyclic group, and a divalent aliphatic group as X in formula (1) and formula (2) . 如請求項1或2之聚醯胺醯亞胺樹脂,其包含式(4): [化25]
Figure 03_image053
[式(4)中,A表示單鍵、-O-、二苯基亞甲基、可具有鹵素原子之2價烴基、-SO2 -、-S-、-CO-、-PO-、-PO2 -、-N(RA1 )-或-Si(RA2 )2 -,RA1 及RA2 相互獨立地表示氫原子或可具有鹵素原子之烷基,R6 相互獨立地表示鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基或芳氧基,s相互獨立地表示0~4之整數,*表示鍵結鍵] 所表示之結構作為式(1)及式(2)中之X。
Such as the polyamide imine resin of claim 1 or 2, which comprises formula (4): [化25]
Figure 03_image053
[In formula (4), A represents a single bond, -O-, diphenylmethylene, a divalent hydrocarbon group that may have a halogen atom, -SO 2 -, -S-, -CO-, -PO-,- PO 2 -, -N(R A1 )- or -Si(R A2 ) 2 -, R A1 and R A2 independently represent a hydrogen atom or an alkyl group that may have a halogen atom, and R 6 independently represent a halogen atom, An alkyl group, an alkoxy group, an aryl group or an aryloxy group which may have a halogen atom, s independently represents an integer of 0-4, and * represents a bonding bond] The structure represented is as formula (1) and formula (2) Among the X.
如請求項1或2之聚醯胺醯亞胺樹脂,其進而包含式(5): [化26]
Figure 03_image055
[式(5)中,B表示單鍵、-O-、二苯基亞甲基、可具有鹵素原子之2價烴基、-SO2 -、-S-、-CO-、-COO-、-PO-、-PO2 -、-N(RB1 )-或-Si(RB2 )2 -,RB1 及RB2 相互獨立地表示氫原子或可具有鹵素原子之烷基,R7 相互獨立地表示鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基或芳氧基,t相互獨立地表示0~3之整數,*表示鍵結鍵] 所表示之結構作為式(1)中之Y。
Such as the polyamide imine resin of claim 1 or 2, which further comprises formula (5): [化26]
Figure 03_image055
[In formula (5), B represents a single bond, -O-, diphenylmethylene, a divalent hydrocarbon group that may have a halogen atom, -SO 2 -, -S-, -CO-, -COO-,- PO-, -PO 2 -, -N(R B1 )- or -Si(R B2 ) 2 -, R B1 and R B2 independently represent a hydrogen atom or an alkyl group which may have a halogen atom, and R 7 are mutually independent It represents a halogen atom, an alkyl group, an alkoxy group, an aryl group or an aryloxy group which may have a halogen atom, t independently represents an integer of 0 to 3, and * represents a bonding bond] The structure represented is as in formula (1) Of Y.
如請求項1或2之聚醯胺醯亞胺樹脂,其包含式(6): [化27]
Figure 03_image057
[式(6)中,W相互獨立地表示單鍵、-O-、二苯基亞甲基、可具有鹵素原子之2價烴基、-SO2 -、-S-、-CO-、-PO-、-PO2 -、-N(RC1 )-或-Si(RC2 )2 -,RC1 及RC2 相互獨立地表示氫原子或可具有鹵素原子之烷基,R8 相互獨立地表示鹵素原子、可具有鹵素原子之烷基、烷氧基、芳基或芳氧基,p相互獨立地表示0~4之整數,q表示0~4之整數,*表示鍵結鍵] 所表示之結構作為式(2)中之Z。
Such as the polyamide imine resin of claim 1 or 2, which comprises formula (6): [化27]
Figure 03_image057
[In formula (6), W independently represents a single bond, -O-, diphenylmethylene, a divalent hydrocarbon group that may have a halogen atom, -SO 2 -, -S-, -CO-, -PO -, -PO 2 -, -N(R C1 )- or -Si(R C2 ) 2 -, R C1 and R C2 independently represent a hydrogen atom or an alkyl group which may have a halogen atom, and R 8 independently represent each other A halogen atom, an alkyl group, an alkoxy group, an aryl group or an aryloxy group which may have a halogen atom, p independently represents an integer from 0 to 4, q represents an integer from 0 to 4, * represents a bonding bond] The structure is the Z in formula (2).
如請求項1或2之聚醯胺醯亞胺樹脂,其重量平均分子量為100,000以上。For example, the polyimide resin of claim 1 or 2 has a weight average molecular weight of 100,000 or more. 一種光學膜,其包含如請求項1至6中任一項之聚醯胺醯亞胺樹脂。An optical film comprising the polyimide resin according to any one of claims 1 to 6. 如請求項7之光學膜,其黃度未達3.0。For example, the optical film of claim 7 has a yellowness of less than 3.0. 如請求項7或8之光學膜,其全光線透過率為90%以上。For example, the optical film of claim 7 or 8 has a total light transmittance of 90% or more. 如請求項7或8之光學膜,其彈性模數為5.0 GPa以上。For example, the optical film of claim 7 or 8 has an elastic modulus of 5.0 GPa or more. 如請求項7或8之光學膜,其係可撓性顯示裝置之前面板用膜。Such as the optical film of claim 7 or 8, which is a film for the front panel of a flexible display device. 一種可撓性顯示裝置,其具備如請求項7至11中任一項之光學膜。A flexible display device provided with the optical film according to any one of claims 7 to 11. 如請求項12之可撓性顯示裝置,其進而具備觸控感測器。For example, the flexible display device of claim 12 further includes a touch sensor. 如請求項12或13之可撓性顯示裝置,其進而具備偏光板。For example, the flexible display device of claim 12 or 13, which is further provided with a polarizing plate.
TW109137423A 2019-10-31 2020-10-28 Polyamideimide resin TW202122472A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2019198535 2019-10-31
JP2019-198535 2019-10-31
JP2020171456A JP2021075700A (en) 2019-10-31 2020-10-09 Polyamideimide resin
JP2020-171456 2020-10-09

Publications (1)

Publication Number Publication Date
TW202122472A true TW202122472A (en) 2021-06-16

Family

ID=75897896

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109137423A TW202122472A (en) 2019-10-31 2020-10-28 Polyamideimide resin

Country Status (4)

Country Link
JP (1) JP2021075700A (en)
KR (1) KR20220095208A (en)
CN (1) CN114599708A (en)
TW (1) TW202122472A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7469088B2 (en) * 2020-03-18 2024-04-16 住友化学株式会社 Optical film and flexible display device
CN114940822B (en) * 2022-05-17 2024-02-23 浙江中科玖源新材料有限公司 Polyamide-imide film and flexible display

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4115372A (en) * 1977-01-21 1978-09-19 The Upjohn Company Novel copolyamideimides
JPH10182822A (en) * 1996-12-24 1998-07-07 Hitachi Chem Co Ltd Polyester-amide-imide resin, its precursor and their production
JP2004051447A (en) * 2002-07-22 2004-02-19 Kanegafuchi Chem Ind Co Ltd Method for manufacturing glassy carbon film
JP5312071B2 (en) * 2009-01-30 2013-10-09 旭化成株式会社 Polyimide polyamide copolymer and photosensitive resin composition
JP2012102155A (en) * 2010-11-05 2012-05-31 Kaneka Corp Polyimide film, laminate, and flexible device
JP5939066B2 (en) * 2011-11-15 2016-06-22 Jsr株式会社 Method for producing liquid crystal aligning agent
JP6165153B2 (en) 2012-09-19 2017-07-19 本州化学工業株式会社 Polyimide and molded body thereof
JP2014101502A (en) * 2012-10-26 2014-06-05 Nitto Denko Corp Polyamide-imide resin composition
JP2014101501A (en) * 2012-10-26 2014-06-05 Nitto Denko Corp Polyamide-imide resin composition
WO2016152459A1 (en) 2015-03-24 2016-09-29 コニカミノルタ株式会社 Polyimide-based optical film, process for producing same, and organic electroluminescent display
JP7084710B2 (en) * 2017-01-20 2022-06-15 住友化学株式会社 Polyamide-imide resin and an optical member containing the polyamide-imide resin.
KR102075739B1 (en) * 2017-02-03 2020-02-10 주식회사 엘지화학 Polyamideimide copolymers and polyamideimide film comprising the same
JP6541856B1 (en) * 2018-10-02 2019-07-10 住友化学株式会社 Optical film, flexible display device, and method of manufacturing optical film
WO2020138360A1 (en) * 2018-12-28 2020-07-02 三菱瓦斯化学株式会社 Imide-(amic acid) copolymer and method for producing same, varnish, and polyimide film

Also Published As

Publication number Publication date
JP2021075700A (en) 2021-05-20
KR20220095208A (en) 2022-07-06
CN114599708A (en) 2022-06-07

Similar Documents

Publication Publication Date Title
TW202122472A (en) Polyamideimide resin
TW202003256A (en) Optical film having excellent impact resistance
JP7382810B2 (en) optical film
TW202037641A (en) Optical film comprising at least one resin selected from the group consisting of a polyamide resin, a polyimide resin, and a polyamide-imide resin
TW202031734A (en) Optical film and flexible display device
TW202033616A (en) Method for producing polyimide resin
TW202031729A (en) Resin composition
WO2020138046A1 (en) Optical film
JP2020097710A (en) Optical film, flexible display device, and resin composition
TW202126728A (en) Optical film and flexible display device
JP7365211B2 (en) optical film
KR102625083B1 (en) Optical film
WO2021085283A1 (en) Polyamideimide resin
TW202037642A (en) Optical film
WO2021085284A1 (en) Optical film and flexible display device
WO2021075395A1 (en) Optical film
TW202122464A (en) Polyimide resin
TW202302719A (en) Optical laminate and flexible display device
TW202035527A (en) Optical film, flexible display device and polyamide-imide resin
TW202126730A (en) Polyamide imide resin, optical film and flexible display device with excellent quality stability and suppressed temporal degradation of optical properties and mechanical properties
TW202030230A (en) Polyimide resin and method for producing same
TW202037643A (en) Optical film, flexible display device, and polyamide-imide resin
JP2020100805A (en) Optical film, flexible display device, and resin composition
TW202035526A (en) Optical film showing excellence in elastic modulus while maintaining a yield point strain