TW202108778A - SnZn SOLDER AND MANUFACTURING METHOD THEREOF - Google Patents

SnZn SOLDER AND MANUFACTURING METHOD THEREOF Download PDF

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TW202108778A
TW202108778A TW109121888A TW109121888A TW202108778A TW 202108778 A TW202108778 A TW 202108778A TW 109121888 A TW109121888 A TW 109121888A TW 109121888 A TW109121888 A TW 109121888A TW 202108778 A TW202108778 A TW 202108778A
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solder
snzn
snzn solder
alloy
base material
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TW109121888A
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Chinese (zh)
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TWI817020B (en
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岡田守弘
新井傑也
菅原美愛子
小林賢一
小宮秀利
松井正五
錦織潤
森尚久
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日商亞特比目有限公司
岡田守弘
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24Selection of soldering or welding materials proper
    • B23K35/26Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24Selection of soldering or welding materials proper
    • B23K35/26Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
    • B23K35/262Sn as the principal constituent
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K1/00Soldering, e.g. brazing, or unsoldering
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K1/00Soldering, e.g. brazing, or unsoldering
    • B23K1/0008Soldering, e.g. brazing, or unsoldering specially adapted for particular articles or work
    • B23K1/0016Brazing of electronic components
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/40Making wire or rods for soldering or welding
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/02Making non-ferrous alloys by melting
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C13/00Alloys based on tin
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C13/00Alloys based on tin
    • C22C13/02Alloys based on tin with antimony or bismuth as the next major constituent

Abstract

The present invention relates to a SnZn solder and a manufacturing method thereof. The purpose is to provide a solder that is extremely strong with respect to electrodes of solar cell substrates and the likes, and can withstand repeated high and low temperature tests for many times, such that even if there is mixing in the solder, the melting temperature is about the same or lower. In addition, the solder is cheap. The present invention is constituted by mixing a main material containing at least one of P, In, Bi, and Sb into a base material of an alloy of Sn and Zn at a total amount of 1 to 1.5 wt% or less, and then melting and alloying them.

Description

SnZn焊料及其製造方法 SnZn solder and its manufacturing method

本發明係關於使用於太陽能電池基板、液晶基板等之SnZn焊料及其製造方法。 The present invention relates to SnZn solder used in solar cell substrates, liquid crystal substrates, etc., and its manufacturing method.

以往,由於錫鉛焊料強度較強且廉價等理由,而大量運用於對於太陽能電池基板及液晶基板等的電極之導線的焊接。 In the past, tin-lead solder has been used in large quantities for soldering wires of electrodes such as solar cell substrates and liquid crystal substrates due to its strong strength and low cost.

再者,電極為鋁等的情況時,由於無法獲得充分的焊接強度,故塗覆銀膏並進行燒結,而於其上以錫鉛焊料來焊接導線。 Furthermore, when the electrode is aluminum or the like, since sufficient soldering strength cannot be obtained, silver paste is applied and sintered, and a lead wire is soldered with tin-lead solder on it.

另外,最近由於公害等觀點,無鉛焊料的需求逐漸提高。 In addition, the demand for lead-free solder is gradually increasing due to the viewpoint of pollution.

習知的無鉛焊料相較於錫鉛焊料,存在有強度相對於需求強度稍有不足,或價格較高而無法替代使用等之問題點。 Compared with tin-lead solder, the conventional lead-free solder has the problems that the strength is slightly insufficient relative to the required strength, or the price is higher and cannot be used instead.

本案發明人係針對屬於無鉛焊料的一種之由Sn與Zn的合金構成之SnZn焊料,發現混入合計1至1.5wt%以下之微量的P、In、Bi、Sb等主材並且予以熔融、合金化,且依據需求而混入微量的Al、Si、Ag、Cu、Ni等副材並且予以熔融、合金化而成之SnZn焊料,對於太陽能電池基板等的電極極為強固,能夠多次承受高溫、低溫反覆測試,且即便混入其他成分,SnZn焊料的熔融溫度亦大致相同或更低。 The inventors of this case found that SnZn solder composed of an alloy of Sn and Zn, which is a kind of lead-free solder, was mixed with a trace amount of P, In, Bi, Sb, etc., which is a total of 1 to 1.5wt% or less, and was melted and alloyed. , And according to the needs, it is mixed with a small amount of Al, Si, Ag, Cu, Ni and other auxiliary materials and melted and alloyed to form SnZn solder. It is extremely strong for the electrodes of solar cell substrates and can withstand repeated high and low temperatures. Tested, and even if other ingredients are mixed in, the melting temperature of SnZn solder is about the same or lower.

因此,本發明係一種SnZn焊料,係由Sn與Zn的合金構成,其中,於屬於Sn及Zn的合金之母材混入合計1至1.5wt%以下之包含P、In、Bi、Sb之中一種以上之主材,並且予以熔融、合金化而成。 Therefore, the present invention is a SnZn solder, which is composed of an alloy of Sn and Zn, wherein the base material of the alloy of Sn and Zn is mixed with a total of 1 to 1.5 wt% or less containing one of P, In, Bi, and Sb The above main materials are melted and alloyed.

此時,熔融、合金化後之SnZn焊料的熔融溫度係與母材的熔融溫度相同或更低。 At this time, the melting temperature of the SnZn solder after melting and alloying is the same as or lower than the melting temperature of the base material.

再者,主材係在Sn與Zn的合金的骨架內合金化。 In addition, the main material is alloyed in the skeleton of the alloy of Sn and Zn.

再者,依據需求,於母材混入5wt%以下之Al、Si、Cu、Ag、Ni之中一種以上或含有Al、Si、Cu、Ag、Ni之中一種以上之玻璃之副材,並且予以熔融、合金化而成。 In addition, according to requirements, the base material is mixed with at least 5wt% of Al, Si, Cu, Ag, Ni or a glass containing at least one of Al, Si, Cu, Ag, and Ni as a secondary material. It is made by melting and alloying.

再者,就主材及副材而言,將主材與副材的合金混入母材,並且予以熔融、合金化。 Furthermore, for the main material and the auxiliary material, the alloy of the main material and the auxiliary material is mixed into the base material, and is melted and alloyed.

再者,就主材與副材的合金而言,採用Cu與P的合金。 In addition, for the alloy of the main material and the auxiliary material, an alloy of Cu and P is used.

再者,將母材、主材、副材同時或分複數次混合,並且予以熔融、合金化。 Furthermore, the base material, the main material, and the secondary material are mixed simultaneously or divided into multiple times, and are melted and alloyed.

再者,SnZn焊料係用於對太陽能電池基板、液晶基板的電極焊接導線。 In addition, SnZn solder is used for soldering wires to the electrodes of solar cell substrates and liquid crystal substrates.

再者,於製作出之SnZn焊料中,混入3wt%以下0.05wt%以上之氯化銨水合物之粉末或含有氯化銨水合物之粉末,以在焊接加熱時分解而改善對於被焊接對象物之焊接密接度。 Furthermore, in the manufactured SnZn solder, ammonium chloride hydrate powder or powder containing ammonium chloride hydrate below 3wt% and 0.05wt% or more is mixed to decompose during soldering heating to improve the resistance to the object to be welded. The welding tightness.

如上所述,本發明係於屬於Sn及Zn的合金之母材混入合計1至1.5wt%以下微量之包含P、In、Bi、Sb等之中一種以上之主材,並且依據需求,混入微量之Al、Si、Cu、Ag、Ni等之中一種以上或含有Al、Si、Cu、Ag、Ni之中一種以上之玻璃之副材,並且予以熔融、合金化,藉此成為對於太陽能電池基板等的電極極為強固且能夠多次承受高溫、低溫反覆測試之焊料,並且,即便混入其他成分,SnZn焊料的熔融溫度亦大致相同或更低,更能夠低價地製造。 As described above, the present invention is based on the fact that the base material of the alloy of Sn and Zn is mixed with a trace amount of 1 to 1.5wt% or less of the main material containing more than one of P, In, Bi, Sb, etc., and a trace amount is mixed according to the requirements. One or more of Al, Si, Cu, Ag, Ni, etc. or a sub-material of glass containing more than one of Al, Si, Cu, Ag, Ni, and melted and alloyed to become a substrate for solar cells SnZn solder is a solder that is extremely strong and can withstand repeated high and low temperature tests. Even if it is mixed with other components, the melting temperature of SnZn solder is about the same or lower, making it more cost-effective to manufacture.

再者,熔融、合金化後之SnZn焊料的熔融溫度係與母材的熔融溫度相同或更低,而可消除因混入造成之熔融溫度的上升。 Furthermore, the melting temperature of the SnZn solder after melting and alloying is the same as or lower than the melting temperature of the base material, which can eliminate the increase in melting temperature caused by mixing.

再者,主材係在Sn與Zn的合金的骨架內合金化,而可消除非期望地析出之缺陷。 Furthermore, the main material is alloyed in the framework of the alloy of Sn and Zn, so that undesired precipitation defects can be eliminated.

再者,藉由混入Al、Si、Cu、Ag、Ni等之中一種以上或含有Al、Si、Cu、Ag、Ni之中一種以上之玻璃,並且予以熔融、合金化而製造SnZn焊料,可改善對於焊接對象之接觸電位等電氣特性。 Furthermore, by mixing one or more of Al, Si, Cu, Ag, Ni, etc., or glass containing more than one of Al, Si, Cu, Ag, Ni, and melting and alloying to produce SnZn solder, Improve the electrical characteristics such as the contact potential of the welding object.

再者,藉由混入主材與副材的合金並且予以熔融、合金化來製造SnZn焊料,可謀求主材的穩定化,成為能夠多次承受高溫、低溫反覆測試之焊料。 Furthermore, by mixing the alloys of the main material and the sub-materials and melting and alloying them to produce SnZn solder, the main material can be stabilized, and it can become a solder that can withstand repeated high and low temperature tests many times.

再者,於所製作出之SnZn焊料混入3wt%以下0.05wt%以上之氯化銨水合物之粉末或含有氯化銨水合物之粉末,可在焊接加熱時分解而改善對於被焊接對象物之焊接密接度。 In addition, mixing ammonium chloride hydrate powder or powder containing ammonium chloride hydrate below 3wt% and 0.05wt% or more into the manufactured SnZn solder can be decomposed during soldering heating to improve the performance of the soldering object. Welding tightness.

1:焊料材料 1: Solder material

2:焊料材料投入皿 2: The solder material is put into the dish

3:熔融爐 3: melting furnace

4:加熱器 4: heater

11:矽基板 11: Silicon substrate

12:鋁燒結膜 12: Aluminum sintered film

13:超音波烙鐵前端 13: Front end of ultrasonic soldering iron

13-1:烙鐵前端 13-1: The tip of the soldering iron

14:焊料 14: Solder

15:帶片、金屬線 15: Belt piece, metal wire

S1,S2,S3,S4,S11,S12:步驟 S1, S2, S3, S4, S11, S12: steps

圖1係本發明之焊料製造說明圖。 Fig. 1 is an explanatory diagram of the solder manufacturing of the present invention.

圖2係本發明之焊料材料製造裝置之說明圖。 Fig. 2 is an explanatory diagram of the solder material manufacturing device of the present invention.

圖3係本發明之導線的焊接說明圖。 Fig. 3 is an explanatory diagram of welding of the lead wire of the present invention.

圖4係本發明之焊接說明圖。 Fig. 4 is an explanatory diagram of welding of the present invention.

圖5係本發明之焊料之組成例(ABS-S)。 Figure 5 is an example of the composition of the solder of the present invention (ABS-S).

圖6係本發明之焊料之試作例。 Fig. 6 is a trial example of the solder of the present invention.

圖7係本發明之焊料的TC測試說明圖。 Fig. 7 is an explanatory diagram of the TC test of the solder of the present invention.

圖8係本發明之焊料(A-14)的TC測試例。 Figure 8 is a TC test example of the solder (A-14) of the present invention.

圖9係本發明之超音波(刮擦)/膏狀物例。 Figure 9 is an example of ultrasonic (scratch)/paste of the present invention.

圖1係本發明之焊料製造說明圖。 Fig. 1 is an explanatory diagram of the solder manufacturing of the present invention.

圖1(a)係顯示流程圖,圖1(b)係顯示材料例。 Fig. 1(a) shows the flow chart, and Fig. 1(b) shows examples of materials.

圖1(a)中,步驟S1係製備母材、主材、副材。此係製備圖1(b)之材料例所示之下述材料。 In Figure 1(a), step S1 is to prepare the base material, the main material, and the secondary material. This is to prepare the following materials shown in the material example of Fig. 1(b).

˙母材:Sn91 Zn9 ˙Base material: Sn91 Zn9

˙主材:P、In、Bi、Sb ˙Main material: P, In, Bi, Sb

˙副材:Al、Si、Cu、Ag、Ni ˙Sub-materials: Al, Si, Cu, Ag, Ni

於此,母材為形成本發明之SnZn焊料之SnZn合金的基本材料(母材),在此採用Sn為91wt%,Zn為9wt%作為試作料。Sn、Zn的重量比在可製作合金的範圍內可任意設定,例如Zn可為1至15wt%,而其餘的為Sn(可依照熔融溫度等進行實驗而適當地選擇設定比例)。 Here, the base material is the basic material (base material) of the SnZn alloy forming the SnZn solder of the present invention. Here, 91wt% of Sn and 9wt% of Zn are used as sample materials. The weight ratio of Sn and Zn can be arbitrarily set within the range of alloys that can be made, for example, Zn can be 1 to 15 wt%, and the rest is Sn (the ratio can be appropriately selected and set according to experiments such as melting temperature).

再者,主材係在進行焊接時對於被焊接對象的表面的氧化膜去除、密接性、濕潤性、流動性、黏性等焊接的性質造成影響之材料,本發明中,將主材的總量設為1至1.5wt%以下。於此,主材係混合P(被焊接對象之氧化膜去除、密接性)、In(濕潤性、流動性)、Bi(密接性)、Sb(密接性)之一種以上並予以熔融、合金化之對象材料。再者,因主材為總量1至1.5wt%之微量,故相較於母材的熔融溫度,將主材混合於母材並予以熔融、合金化後之SnZn焊料的熔融溫度係相同或略低(例如降低1至5℃左右)。此係推測主材的總量相對於母材為1至1.5wt%以下之微量而進入母材的骨架內並重新建構骨架所致。 Furthermore, the main material is a material that affects the removal of oxide film on the surface of the welding object, adhesion, wettability, fluidity, viscosity and other welding properties during welding. In the present invention, the total of the main material The amount is set to 1 to 1.5 wt% or less. Here, the main material is mixed with at least one of P (removal of the oxide film of the welding object, adhesion), In (wettability, fluidity), Bi (adhesion), and Sb (adhesion) and melted and alloyed The object material. Furthermore, since the main material is a trace amount of 1 to 1.5 wt% in total, compared to the melting temperature of the base material, the main material is mixed with the base material and melted, and the melting temperature of the alloyed SnZn solder is the same or Slightly lower (for example, lowered by 1 to 5°C). This is due to speculation that the total amount of the main material is 1 to 1.5 wt% or less relative to the base material, which enters the frame of the base material and reconstructs the frame.

再者,副材係更進一步添加於母材與主材之材料,用以使被焊接對象(太陽能電池基板、液晶基板等半導體基板、燒製鋁膜、銅電極等)的電氣特性(接觸電位差、接觸電阻、太陽能電池的I-V特性等)、密接性等變得良好,於此為Al(相對於燒製鋁膜之材料)、Si(相對於矽基板之材料)、Cu(相對於銅電極之材料)、Ag(相對於全部情形之材料)、Ni(相對於在矽基板鍍覆有微量Ni時之材料)等材料。就副材而言,除了金屬以外,亦可藉由將含有金屬之玻璃混合、熔融、合金化來進行添加(玻璃中所含有的氧等氣體成分係於熔融、合金化時放出外部等)。 In addition, the secondary material is further added to the base material and the main material to improve the electrical characteristics (contact potential difference) of the soldered objects (solar cell substrates, liquid crystal substrates and other semiconductor substrates, fired aluminum films, copper electrodes, etc.) , Contact resistance, IV characteristics of solar cells, etc.), adhesion, etc. become better, here are Al (compared to the material of the fired aluminum film), Si (compared to the material of the silicon substrate), Cu (compared to the copper electrode Materials), Ag (compared to materials in all cases), Ni (compared to materials when a small amount of Ni is plated on a silicon substrate) and other materials. As for the secondary materials, in addition to metals, they can also be added by mixing, melting, and alloying glass containing metals (gas components such as oxygen contained in the glass are released to the outside during melting and alloying, etc.).

步驟S2係對母材混合主材、副材。此係於步驟S1製備之母材中混合主材、副材。 Step S2 is to mix the main material and the auxiliary material with the base material. This is to mix the main material and the auxiliary material in the base material prepared in step S1.

步驟S3係使母材、主材、副材熔融而合金化。此係將步驟S2中於母材混合主材、副材者加熱熔融,且充分攪拌而使其合金化。此時,主材、副材因空氣中的氧而氧化導致難以合金化等情形時,可依需求將非活性氣體(例如氮氣)吹入坩堝內,或進一步使用充滿非活性氣體之熔融爐、真空熔爐等。 In step S3, the base material, the main material, and the secondary material are melted and alloyed. This system heats and melts the mixture of the main material and the auxiliary material with the base material in step S2, and stirs them sufficiently to alloy them. At this time, when the main materials and auxiliary materials are oxidized by oxygen in the air and are difficult to alloy, you can blow inert gas (such as nitrogen) into the crucible as required, or use a melting furnace filled with inert gas, Vacuum furnace, etc.

步驟S4係完成焊料材料(ABS-S)。 Step S4 completes the solder material (ABS-S).

如以上所述,製備母材、主材、副材且將該等混合並予以熔融、合金化,藉此可製造本發明之SnZn焊料(ABS-S)。以下依序詳細說明。 As described above, the base material, the main material, and the auxiliary material are prepared, and these are mixed and melted and alloyed, whereby the SnZn solder (ABS-S) of the present invention can be manufactured. The following is a detailed description in order.

圖2係顯示本發明之材料製造裝置之說明圖。 Fig. 2 is an explanatory diagram showing the material manufacturing device of the present invention.

圖2中,焊料材料1係已說明之圖1的步驟S1所製備之母材、主材、副材,於此係金屬、玻璃等的破片(粗略粉碎而成者)。 In FIG. 2, the solder material 1 is the base material, the main material, and the subsidiary material prepared in step S1 of FIG.

焊料材料投入皿2係盛裝焊料材料以投入熔融爐3者。 The solder material input pan 2 is the one that contains the solder material and puts it into the melting furnace 3.

熔融爐3係藉由加熱器4進行加熱,將焊料材料1投入於內部時,用以將母材、主材、副材熔融,並進行攪拌而使其合金化。熔融爐3通常係在大氣中將投入於內部之母材、主材、副材熔融並進行攪拌而使其合金化。此時,依據需求而吹進非活性氣體(氮氣等)而減低因空氣中的氧導致之氧化,再者,依據需求而密封並充滿非活性氣體(或真空排氣)。 The melting furnace 3 is heated by the heater 4, and when the solder material 1 is put inside, it is used to melt the base material, the main material, and the auxiliary material, and stir to alloy them. The melting furnace 3 usually melts and stirs the base material, main material, and subsidiary material put into the interior in the atmosphere to alloy them. At this time, inert gas (nitrogen, etc.) is blown in according to demand to reduce the oxidation caused by oxygen in the air, and furthermore, it is sealed and filled with inert gas (or vacuum exhaust) according to demand.

如以上所述,將圖1之步驟S1中備製之母材、主材、副材混合,以熔融爐3熔融並進行攪拌而使其合金化,可製造本發明之SnZn焊料。 As described above, the base material, main material, and subsidiary material prepared in step S1 of FIG. 1 are mixed, melted in the melting furnace 3 and stirred to alloy, and the SnZn solder of the present invention can be manufactured.

圖3係顯示本發明之導線的焊接說明圖。 Fig. 3 is an explanatory diagram showing the welding of the wire of the present invention.

圖3(a)係顯示流程圖,圖3(b)係顯示基板/導線例。 Figure 3(a) shows a flowchart, and Figure 3(b) shows an example of a substrate/wire.

圖3(a)中,步驟S11係以超音波將焊料對基板圖案進行預焊接。此係例如於太陽能電池基板的電極,對於要開始進行焊接之部分(圖案),將本發明之SnZn焊料(圖1之步驟S4所製造之SnZn焊料)供給至超音波烙鐵的烙鐵前端並使其熔融且施加超音波,對於基板上的該圖案部分預先進行焊接(稱為超音波預焊接)。 In FIG. 3(a), step S11 is to pre-soldering the solder to the substrate pattern by ultrasonic waves. This is, for example, the electrode of the solar cell substrate. For the part (pattern) to be soldered, the SnZn solder of the present invention (the SnZn solder manufactured in step S4 of FIG. 1) is supplied to the tip of the ultrasonic soldering iron and made It is melted and ultrasonic waves are applied, and the pattern part on the substrate is welded in advance (referred to as ultrasonic pre-welding).

步驟S12係對導線等進行超音波焊接或無超音波焊接。此係使導線靠接於步驟S11中例如對太陽能電池基板的電極上進行過超音波預焊接之部分(圖案),並從其上施加超音波或不施加超音波,同時使本發明之SnZn焊料熔融而焊接導線。另外,若將SnZn焊料預焊於導線時,則無需供給焊料。 Step S12 is to perform ultrasonic welding or non-ultrasonic welding on the wires and the like. This is to make the wire abut the part (pattern) that has been pre-soldered by ultrasonic waves on the electrodes of the solar cell substrate in step S11, and apply ultrasonic waves or no ultrasonic waves thereon, while making the SnZn solder of the present invention Melt and weld the wires. In addition, if SnZn solder is pre-soldered to the wire, there is no need to supply solder.

如上所述,由於難以對於焊接對象之部分(例如太陽能電池基板的電池部分)進行通常的焊接,故使用超音波進行本發明之SnZn焊料的預焊接(步驟S11),並於進行過預焊接之部分(圖案)之上使用本發明之SnZn焊料對導線進行超音波焊接或進行無超音波焊接(步驟S12),藉此,對以往無法進行焊接之太陽能電池基板的電極部分,可進行超音波預焊接,並在其上對導線進行超音波焊接或無超音波焊接。 As described above, since it is difficult to perform normal soldering on the part to be soldered (for example, the battery part of the solar cell substrate), the pre-soldering of the SnZn solder of the present invention (step S11) is performed using ultrasonic waves, and the pre-soldering is performed. On the part (pattern), ultrasonic welding or non-ultrasonic welding is performed on the wire using the SnZn solder of the present invention (step S12), thereby, the electrode part of the solar cell substrate that cannot be soldered in the past can be subjected to ultrasonic pre-warning. Welding, and ultrasonic or non-ultrasonic welding is performed on the wires.

另外,超音波焊接係以10W以下,通常係進行2至3W的超音波焊接。若過強則會損壞形成於太陽能電池基板上之膜(例如氮化膜)、基板表面的結晶等,故不進行過強的超音波焊接。 In addition, ultrasonic welding is 10W or less, usually 2 to 3W ultrasonic welding. If it is too strong, it will damage the film (for example, a nitride film) formed on the solar cell substrate, the crystals on the surface of the substrate, etc., so excessive ultrasonic welding is not performed.

圖3(b)係顯示基板/導線例。 Figure 3(b) shows an example of a substrate/wire.

圖3(b)中,基板係Al、Si基板、玻璃基板等,且為通常的焊接極難以進行焊接之基板之例。對於成為該等基板的電極的部分(圖案),將本發明之 SnZn焊料超音波預焊接。然後,對此進行過預焊接之部分(圖案),將導線超音波焊接或無超音波焊接,藉此,可將導線焊接於基板。 In Fig. 3(b), the substrate is an Al, Si substrate, glass substrate, etc., and is an example of a substrate that is extremely difficult to solder with ordinary soldering. For the parts (patterns) that become the electrodes of these substrates, the present invention is Ultrasonic pre-soldering of SnZn solder. Then, the pre-welded part (pattern) is welded by ultrasonic welding or non-ultrasonic welding of the wire, whereby the wire can be welded to the substrate.

再者,導線係使用本發明之SnZn焊料而焊接於基板上的電極的部分(圖案)之導線,且為金屬線(於圓形的銅線鍍覆本發明之SnZn焊料而成之金屬線,稍微壓成橢圓則容易進行焊接)、帶片(對於將銅之薄板切成1mm左右之寬度而成之帶片預先鍍覆本發明之SnZn焊料者)等。 Furthermore, the wire is a wire that is soldered to the part (pattern) of the electrode on the substrate using the SnZn solder of the present invention, and is a metal wire (a metal wire formed by plating the SnZn solder of the present invention on a round copper wire, Slightly pressed into an ellipse for easy soldering), strips (for strips made by cutting a copper sheet into a width of about 1 mm, which are pre-plated with the SnZn solder of the present invention), etc.

圖4係本發明之焊接說明圖。 Fig. 4 is an explanatory diagram of welding of the present invention.

圖4(a)係顯示預焊接例,圖4(b)係顯示帶片或金屬線的焊接例。 Figure 4(a) shows an example of pre-welding, and Figure 4(b) shows an example of welding a strip or wire.

圖4(a)中,矽基板11係本例中為太陽能電池基板之例,且為於該矽基板11的例如背面的整面形成鋁燒結膜12者。 In FIG. 4(a), the silicon substrate 11 is an example of a solar cell substrate in this example, and an aluminum sintered film 12 is formed on the entire surface of the silicon substrate 11, for example, the back surface.

鋁燒結膜12係於屬於太陽能電池基板之圖示的矽基板11的背面的整面塗覆鋁膏(或者,以網版印刷成預定的圖案)並進行燒結而形成的電極(鋁燒結膜)。 The aluminum sintered film 12 is an electrode (aluminum sintered film) formed by coating aluminum paste (or screen printing into a predetermined pattern) and sintering the entire back surface of the silicon substrate 11, which is a solar cell substrate. .

超音波烙鐵前端13係從未圖示之超音波產生器施加超音波並同時加熱。 The tip 13 of the ultrasonic soldering iron is heated by applying ultrasonic waves from an ultrasonic generator (not shown).

焊料(ABS-S)14係本發明之SnZn焊料(圖1之步驟S4所製造之SnZn焊料)。 The solder (ABS-S) 14 is the SnZn solder of the present invention (the SnZn solder manufactured in step S4 of FIG. 1).

接著,說明焊接動作。 Next, the welding operation will be described.

(1)將矽基板11搬送至預加熱台上並真空吸附固定,進行預加熱(例如預加熱至180℃左右)。 (1) The silicon substrate 11 is transported to a preheating stage, vacuum-adsorbed and fixed, and preheated (for example, preheated to about 180°C).

(2)對於要形成在鋁燒結膜12上之電極的圖案(長條狀之圖案),從起點朝向終點,將焊料14自動供給至圖示的超音波烙鐵前端13並使其熔融且同 時施加超音波,並在不會刮擦該鋁燒結膜12上之程度而接近之狀態下,以一定速度移動,從而在鋁燒結膜12上形成長條狀的預焊接圖案。 (2) For the electrode pattern (a long pattern) to be formed on the aluminum sintered film 12, from the start point to the end point, the solder 14 is automatically supplied to the tip 13 of the ultrasonic soldering iron shown in the figure and melted and the same Ultrasonic waves are applied at the same time, and the aluminum sintered film 12 is moved at a certain speed without scratching the aluminum sintered film 12 so as to be close, thereby forming a long pre-welded pattern on the aluminum sintered film 12.

如上所述,可將本發明之SnZn焊料14在鋁燒結膜12上焊接成預定圖案之預焊接圖案。 As described above, the SnZn solder 14 of the present invention can be soldered on the aluminum sintered film 12 into a pre-soldering pattern of a predetermined pattern.

圖4(b)係顯示帶片或金屬線的焊接例。 Figure 4(b) shows an example of welding a strip or wire.

圖4(b)中,可施加超音波之烙鐵前端13-1係從未圖示之超音波產生器施加超音波並同時加熱,或不施加超音波而加熱。 In Fig. 4(b), the tip 13-1 of the soldering iron capable of applying ultrasonic waves is heated by applying ultrasonic waves to an ultrasonic generator (not shown), or heating without ultrasonic waves.

附焊料之帶片或金屬線15係於帶片或金屬線預焊本發明之SnZn焊料而成者。另外,若使金屬線15稍變形成橢圓,則焊接性較良好。 The strip or metal wire 15 with solder is formed by pre-welding the SnZn solder of the present invention to the strip or metal wire. In addition, if the metal wire 15 is slightly deformed into an ellipse, the weldability is relatively good.

接著,說明帶片或金屬線對於預焊接圖案部分之焊接動作。 Next, the welding operation of the strip or metal wire to the part of the pre-welded pattern will be described.

(1)與圖4(a)同樣地,對矽基板11預加熱。 (1) As in FIG. 4(a), the silicon substrate 11 is preheated.

(2)對於沿著形成於矽基板11上(背面)的鋁燒結膜12的部分之預焊接圖案部分配置之附焊料之帶片或金屬線15,從上方以可施加超音波或無超音波之烙鐵前端13-1輕輕按壓並同時使其往圖示之右方以一定速度移動,將附焊料之帶片或金屬線15的焊料熔融而焊接於預焊接圖案部分。 (2) For the solder-attached strip or metal wire 15 arranged along the pre-soldering pattern portion of the aluminum sintered film 12 formed on the silicon substrate 11 (back side), ultrasonic waves or no ultrasonic waves can be applied from above The tip 13-1 of the soldering iron is gently pressed and moved to the right of the figure at a certain speed at the same time, to melt the solder of the strip with solder or the wire 15 and solder it to the pre-soldering pattern part.

如以上所述,可將預焊接有本發明之SnZn焊料之帶片或金屬線15焊接於鋁燒結膜12上的預焊接圖案的部分。 As described above, the strip or wire 15 pre-soldered with the SnZn solder of the present invention can be welded to the part of the pre-soldering pattern on the aluminum sintered film 12.

另外,本發明之超音波焊接、無超音波焊接之優劣的判定,係將帶片或金屬線對焊接對象部分進行超音波焊接或無超音波焊接之後,以比基板等會裂開之力稍弱之力拉扯帶片或金屬線,不會從基板剝落時判定為優良,會從基板剝落時判定為不良。 In addition, the ultrasonic welding and non-ultrasonic welding of the present invention are judged by ultrasonic welding or non-ultrasonic welding of the strip or metal wire to the welding target part, and the force is slightly stronger than that of the substrate. Pulling a strip or metal wire with a weak force will be judged as good when it does not peel off from the substrate, and judged as bad when it is peeled off from the substrate.

圖5係顯示本發明之焊料之組成例(ABS-S)。 Figure 5 shows an example of the composition of the solder of the present invention (ABS-S).

圖5中,母材、主材、副材係圖1所說明之母材、主材、副材之區別。 In Fig. 5, the base material, main material, and auxiliary material are the differences between the base material, main material, and auxiliary material described in Fig. 1.

組成例係母材、主材、副材之組成例。 The composition example is the composition example of the base material, main material, and auxiliary material.

wt%例係母材、主材、副材之組成的wt%之例。 Examples of wt% are examples of wt% of the composition of the base material, main material, and secondary material.

wt%範圍為母材、主材、副材之組成的wt%的範圍例。 The wt% range is an example of the wt% range of the composition of the base material, main material, and subsidiary material.

組成、wt%例、wt%範圍係成為如圖5所圖示之下述內容。 The composition, wt% example, and wt% range are as follows as shown in FIG. 5.

Figure 109121888-A0304-12-0010-10
Figure 109121888-A0304-12-0010-10

於此,就組成例而言,試作中,母材係使用圖示之Sn 91wt%、Zn 9wt%。再者,組成範圍係若為能夠製作SnZn之範圍且穩定者即可,例如可為Zn 1至15wt%,而其餘為Sn,所製作出之SnZn母材的熔融溫度等,經實測以實驗決定即可。 Here, as for the composition example, in the trial production, the base material is 91wt% of Sn and 9wt% of Zn as shown in the figure. Furthermore, the composition range should be the range that can produce SnZn and is stable, for example, it can be 1 to 15wt% of Zn, and the rest is Sn. The melting temperature of the SnZn base material produced is determined by experiment. That's it.

就主材而言,雖有P、In、Bi、Sb等,惟P在試作中係使用P(紅磷)與CuP8合金(P為8wt%,其餘為Cu之合金,P的wt%為CuP8的8%之磷化銅)。另外,添加約0.1wt%的P(P飽和狀態)之情形以及以CuP8中的P為主材而添加之情形時,需較多地添加為約0.16wt%(P飽和狀態)。P係在約0.1wt%(或CuP8之情形為約P=0.16wt%)時飽和,若更進一步添加則成為過飽和,會使SnZn焊料的黏性非期望地大幅增加。因此,為了通常使用之流動性、濕潤性的確保,較佳為P之飽和以下之添加。P亦可為非常微量(約0.001wt%左右之微量)。再者,P之飽和、過飽 和亦可依據用途而適當使用。同樣地,其他的主材也有此種傾向,因此,可因應需求而在實驗中決定最佳的添加量。 As far as the main material is concerned, although there are P, In, Bi, Sb, etc., P (red phosphorus) and CuP8 alloy are used in the trial production (P is 8wt%, the rest is an alloy of Cu, and the wt% of P is CuP8 8% of copper phosphide). In addition, when adding about 0.1wt% of P (P saturated state) and when adding P in CuP8 as the main material, it is necessary to add more to about 0.16wt% (P saturated state). P is saturated at about 0.1wt% (or about P=0.16wt% in the case of CuP8). If it is added further, it becomes supersaturated, and the viscosity of the SnZn solder will increase undesirably. Therefore, in order to ensure the fluidity and wettability that are commonly used, it is preferable to add P at a saturation level or lower. P can also be a very trace amount (a trace amount of about 0.001 wt%). Furthermore, P is saturated and oversatisfied And can also be used appropriately according to the purpose. Similarly, other main materials also have this tendency. Therefore, the optimal addition amount can be determined in experiments according to the needs.

再者,主材的總量較佳為1至1.5wt%以下。將該主材的總量1至1.5wt%混合至母材(Sn 91wt%、Zn 9wt%)並予以熔融、合金化而成之本發明之SnZn焊料,實際測量出的熔融溫度相較於母材的熔融溫度為相同或降低1至5℃。此係推測主材之總量1至1.5wt%以下進入母材(SnZn合金)的骨架內部而重新建構骨架,結果致使熔融溫度相同或降低。另外,在坩堝內混合、熔融、合金化時顯現出網目狀之骨架,並觀察到將其攪拌而使整體熔解使其熔融時會成為一致之合金,據此亦可推測其原因。 Furthermore, the total amount of the main material is preferably 1 to 1.5 wt% or less. The SnZn solder of the present invention made by mixing the total amount of the main material 1 to 1.5wt% with the base material (Sn 91wt%, Zn 9wt%) and melting and alloying, the actual measured melting temperature is compared with that of the parent material The melting temperature of the material is the same or lowered by 1 to 5°C. It is speculated that the total amount of the main material 1 to 1.5wt% or less enters the inside of the skeleton of the base material (SnZn alloy) to reconstruct the skeleton, resulting in the same or lower melting temperature. In addition, a mesh-like skeleton appears during mixing, melting, and alloying in the crucible, and it has been observed that it becomes a consistent alloy when the whole is melted and melted by stirring, and the reason can be inferred from this.

再者,由於太陽能電池基板、液晶基板等為矽,且在矽上存在有鋁燒結膜等,故副材係考慮Si、Al以及Cu(銅線、銅圖案等)、Ag(燒結電極)、Ni(對於矽的表面的鎳鍍覆)等而添加者,且為用以改善電氣特性(接觸電位差、接觸電阻、太陽能電池的I-V特性等)、接合強度等。 Furthermore, since solar cell substrates, liquid crystal substrates, etc. are made of silicon, and there is an aluminum sintered film on the silicon, Si, Al, Cu (copper wire, copper pattern, etc.), Ag (sintered electrode), Ni (nickel plating on the surface of silicon) or the like is added to improve electrical characteristics (contact potential difference, contact resistance, IV characteristics of solar cells, etc.), bonding strength, and the like.

圖6係顯示本發明之焊料之試作例。圖中顯示多數試作之焊料中能夠用於已說明之圖4之焊接之例。無法使用者係省略圖示。 Fig. 6 shows a trial example of the solder of the present invention. The figure shows an example of most of the sample solders that can be used for the soldering shown in Fig. 4 already described. Users who are not able to omit the icon.

圖6中,本發明之SnZn焊料(圖1之步驟S4所製造之SnZn焊料)的母材係使用Sn 91wt%、Zn 9wt%。 In FIG. 6, the base material of the SnZn solder of the present invention (SnZn solder manufactured in step S4 of FIG. 1) uses Sn 91wt% and Zn 9wt%.

副材係使用Al、Si(其他省略)。 Al and Si are used as auxiliary materials (others omitted).

主材之In、Bi、P(紅磷)係使用金屬材料。CuP8係使用P為8wt%其餘為Cu之磷化銅。另外,如上所述,使用CuP8時,其中的P的添加量未相當於0.16wt%就不會飽和(P(紅磷)則於0.1wt%時飽和)。 The main materials of In, Bi, P (red phosphorus) are metal materials. CuP8 uses copper phosphide whose P is 8wt% and the rest is Cu. In addition, as mentioned above, when CuP8 is used, the amount of P added therein is not equivalent to 0.16wt% and it will not be saturated (P (red phosphorus) is saturated at 0.1wt%).

試樣No係試作出之試樣的編號。 The sample number is the number of the sample to be tried.

關於以上之試樣No,進行已說明之圖5之超音波焊接及無超音波焊接,並僅記載良好焊料。無法進行焊接之焊料則省略記載。 Regarding the sample No. above, the ultrasonic welding and non-ultrasonic welding of Fig. 5 have been described, and only good solders are described. For solders that cannot be soldered, the description is omitted.

圖7係顯示本發明之焊料的TC測試說明圖。於此,TC測試係使用已說明之圖6的試樣No「A-14」。 FIG. 7 is an explanatory diagram showing the TC test of the solder of the present invention. Here, the TC test uses the sample No. "A-14" in Fig. 6 which has already been described.

圖7(a)係示意顯示ABS-S焊料(A-14)的TC測試例。至目前為止TC測試已超過1000小時(並持續進行中)。 Figure 7(a) schematically shows a TC test example of ABS-S solder (A-14). So far, the TC test has exceeded 1,000 hours (and is ongoing).

圖7(b)係顯示試樣照片之例。如圖所示,使用A-14將銅線焊接至鋁板、矽面、鋁面(超音波焊接,或施加刮痕並焊接)。 Figure 7(b) shows an example of a sample photo. As shown in the figure, use A-14 to solder the copper wire to the aluminum plate, silicon surface, aluminum surface (ultrasonic welding, or apply scratches and solder).

圖7(c)係顯示TC測試之溫度條件。於此,如圖所示,以下述條件實施TC測試。 Figure 7(c) shows the temperature conditions of the TC test. Here, as shown in the figure, the TC test was carried out under the following conditions.

˙最大溫度為87.5℃ ˙Maximum temperature is 87.5℃

˙最小溫度為-24.4℃ ˙The minimum temperature is -24.4℃

˙最大濕度98.3% ˙Maximum humidity 98.3%

˙最小濕度1.6% ˙Minimum humidity 1.6%

圖7(d)係顯示測試環境與結果之例。於此,如圖所示, Figure 7(d) shows an example of the test environment and results. Here, as shown in the figure,

(1)試驗期間為2019年5月1日至6月12日(1000小時) (1) The test period is from May 1st to June 12th, 2019 (1000 hours)

(2)以焊料A-14將銅線接合於鋁板、矽板、鋁面 (2) Join the copper wire to aluminum plate, silicon plate, and aluminum surface with solder A-14

(3)高溫條件係於高溫爐80℃時放入。於試樣放入後再升溫。 (3) The high temperature condition is placed in the high temperature furnace at 80°C. The temperature is increased after the sample is placed.

(4)低溫條件係於冷凍庫-20℃時放入。 (4) The low temperature condition is to put in the freezer at -20°C.

(5)交換係不將試樣置於常溫而立即替換。 (5) The exchange system does not place the sample at room temperature and replace it immediately.

測試結果係焊料未崩毀而無問題。 The test result is that the solder did not collapse without problems.

由以上測試條件實施1000小時之TC測試之結果,關於試樣No「A-14」,獲得測試合格之結果。 According to the result of 1000 hours of TC test carried out under the above test conditions, the result of the test is passed for sample No. "A-14".

圖8係顯示本發明之焊料(A-14)的TC測試例。 Fig. 8 shows a TC test example of the solder (A-14) of the present invention.

圖8中,橫軸表示經過時間(h)。縱軸表示溫度(℃)/濕度(%),圖中上部的曲線表示濕度,下部的曲線表示溫度。 In FIG. 8, the horizontal axis represents the elapsed time (h). The vertical axis represents temperature (°C)/humidity (%), the upper curve in the figure represents humidity, and the lower curve represents temperature.

圖8中,圖中下部的溫度曲線係 In Figure 8, the temperature curve at the bottom of the figure is

˙高溫(最大溫度)為圖7(c)所載的87.6℃ ˙High temperature (maximum temperature) is 87.6℃ as shown in Figure 7(c)

˙低溫(最小溫度)為圖7(c)所載的-24.4℃ ,且顯示經過1000小時之記錄。 ˙The low temperature (minimum temperature) is -24.4℃ as shown in Figure 7(c) , And display the records after 1000 hours.

圖8中,圖中上部的濕度曲線係 In Figure 8, the humidity curve in the upper part of the figure is

˙最大濕度為圖7(c)所載的98.3% ˙Maximum humidity is 98.3% as shown in Figure 7(c)

˙最小濕度為圖7(c)所載的1.6% ,且顯示經過1000小時之記錄。 ˙The minimum humidity is 1.6% as shown in Figure 7(c) , And display the records after 1000 hours.

圖9係顯示本發明之超音波(刮擦)/膏狀物例。於此,圖9中: Figure 9 shows an example of ultrasonic (scratch)/paste of the present invention. Herein, in Figure 9:

˙「膏狀物/超音波(刮擦)」係使用本發明之SnZn焊料焊接至焊接對象物時,區別「超音波焊接」,「無超音波並以烙鐵刮擦焊接對象物」,「使用膏狀物之氯化銨(NH4Cl)水合物(3wt%以下,0.05wt%以上)」,「使用膏狀物之氯化銨無水合物(3wt%以下,0.05wt%以上)」,以及「使用膏狀物之樹脂(松脂)(3wt%以下,0.05wt%以上)」。 ˙"Paste/ultrasonic (scratch)" is the difference between "ultrasonic welding", "no ultrasonic and scratch the welding object with a soldering iron" when using the SnZn solder of the present invention to solder to the welding object. "Use Paste ammonium chloride (NH4Cl) hydrate (3wt% or less, 0.05wt% or more)", "Use paste ammonium chloride anhydrate (3wt% or less, 0.05wt% or more)", and " Use paste resin (rosin) (3wt% or less, 0.05wt% or more)".

˙焊接對象物係使用本發明之SnZn焊料進行焊接之對象之材料,區別為Si(晶圓,約0.2mm厚)、燒結於晶圓上之Al燒結膜、Cu(0.1mm厚板)、Al(0.1mm厚板)、不鏽鋼(0.1mm厚板)。 ˙The soldering object is the material of the object to be soldered using the SnZn solder of the present invention. The difference is Si (wafer, about 0.2mm thick), Al sintered film sintered on the wafer, Cu (0.1mm thick plate), Al (0.1mm thick plate), stainless steel (0.1mm thick plate).

˙◎係表示本發明之SnZn焊料對於焊接對象密接優良(焊接0.4mm

Figure 109121888-A0304-12-0014-11
之鍍錫線後拉扯時,若達矽晶圓斷裂之力(拉伸強度),判定為密接優良)。 ˙◎It means that the SnZn solder of the present invention has excellent adhesion to the welding object (welding 0.4mm
Figure 109121888-A0304-12-0014-11
When the tinned wire is pulled after it is pulled, if it reaches the breaking force (tensile strength) of the silicon wafer, it is judged as good adhesion).

˙○係表示本發明之SnZn焊料對於焊接對象密接佳(焊接0.4mm

Figure 109121888-A0304-12-0014-12
之鍍錫線後拉扯時,若達矽晶圓斷裂之力或稍弱之力(拉伸強度),判定為密接佳)。 ˙○ means that the SnZn solder of the present invention has good adhesion to the welding object (welding 0.4mm
Figure 109121888-A0304-12-0014-12
When the tinned wire is pulled after it is pulled, if the silicon wafer breaks or is weaker (tensile strength), it is judged as good adhesion).

˙△係表示本發明之SnZn焊料對於焊接對象密接弱(焊接0.4mm

Figure 109121888-A0304-12-0014-13
之鍍錫線後拉扯時,立即剝離之狀態)。 ˙△ means that the SnZn solder of the present invention has a weak adhesion to the welding object (welding 0.4mm
Figure 109121888-A0304-12-0014-13
After the tinned wire is pulled, it will peel off immediately).

˙╳係表示本發明之SnZn焊料對於焊接對象密接不良。 ˙╳ means that the SnZn solder of the present invention has poor adhesion to the soldering object.

依據上述圖9之實驗可知,「超音波焊接」及「無超音波並以烙鐵刮擦焊接對象物」之情形時,對於Si晶圓、Al燒結膜、Cu、Al、不鏽鋼可得到充分的焊接強度。 According to the experiment in Figure 9 above, it can be seen that in the case of "ultrasonic welding" and "no ultrasonic welding and scratching the welding object with a soldering iron", sufficient welding can be achieved for Si wafers, Al sintered films, Cu, Al, and stainless steel. strength.

再者,使用氯化銨水合物(3wt%以下,0.05wt%以上)時,對於Cu、Al可得到充分的焊接強度。 Furthermore, when ammonium chloride hydrate (3 wt% or less, 0.05 wt% or more) is used, sufficient welding strength can be obtained for Cu and Al.

再者,使用樹脂(松脂)(3wt%以下,0.05wt%以上)時,對於Cu可得到充分的焊接強度。 Furthermore, when resin (rosin) (3 wt% or less, 0.05 wt% or more) is used, sufficient welding strength can be obtained for Cu.

另外,用於實驗之混入粉末之本發明之SnZn焊料係於粗棒狀之焊料的中心開孔(約1-3mm左右),或切出缺口等,於此孔的內部或缺口的內部等填入預定量的粉末(例如氯化銨水合物或樹脂等粉末),藉由軋壓(付溝)輥反覆複數次依序拉伸成細棒狀,最後加工成約1mm

Figure 109121888-A0304-12-0014-14
左右或一邊為1mm左右之角柱形之線狀焊料。該線狀焊料的剖面的中心附近可觀察到前述填入(混入)之粉末。然後,使烙鐵接觸於焊接對象(例如Cu板等,依需求載置於預加熱台(例如180℃))並進行加熱而使該線狀焊料熔融,將混入該線狀焊料之粉末(例如氯化銨水合物之粉 末)分解而嘗試大幅改善對於焊接對象的部分之密接性(例如,為Cu板之情形係大幅改善了密接性。參閱圖9)。 In addition, the SnZn solder of the present invention mixed with powder used in the experiment is to open a hole (about 1-3mm) in the center of the thick rod-shaped solder, or cut a notch, etc., and fill in the inside of the hole or the inside of the notch. Pour a predetermined amount of powder (such as ammonium chloride hydrate or resin powder), and stretch it into a thin rod by rolling (sub-groove) rolls several times, and finally process it into about 1mm
Figure 109121888-A0304-12-0014-14
The left and right or one side is a linear solder with a corner column of about 1mm. The filler (mixed) powder was observed near the center of the cross section of the wire solder. Then, the soldering iron is brought into contact with the soldering object (e.g., Cu plate, etc., placed on a preheating stage (e.g., 180°C) as required) and heated to melt the wire solder, and mix the wire solder powder (such as chlorine) The powder of ammonium hydrate) decomposes to try to greatly improve the adhesion to the part to be welded (for example, in the case of a Cu plate, the adhesion is greatly improved. See Figure 9).

S1,S2,S3,S4:步驟 S1, S2, S3, S4: steps

Claims (17)

一種SnZn焊料,係由Sn與Zn的合金構成,其中,於屬於Sn與Zn的合金之母材混入合計1至1.5wt%以下之包含P、In、Bi、Sb之中一種以上之主材,並且予以熔融、合金化而成。 A SnZn solder consisting of an alloy of Sn and Zn, wherein the base material of the alloy of Sn and Zn is mixed with a total of 1 to 1.5 wt% or less of the main material containing one or more of P, In, Bi, and Sb, And it is made by melting and alloying. 如請求項1所述之SnZn焊料,其中,前述熔融、合金化後之SnZn焊料的熔融溫度係與前述母材的熔融溫度相同或更低。 The SnZn solder according to claim 1, wherein the melting temperature of the SnZn solder after melting and alloying is the same as or lower than the melting temperature of the base material. 如請求項1或2所述之SnZn焊料,其中,前述主材係在Sn與Zn的合金的骨架內合金化。 The SnZn solder according to claim 1 or 2, wherein the main material is alloyed in a skeleton of an alloy of Sn and Zn. 如請求項1至3中任一項所述之SnZn焊料,其中,依據需求,於前述母材混入5wt%以下之Al、Si、Cu、Ag、Ni之中一種以上或含有Al、Si、Cu、Ag、Ni之中一種以上之玻璃之副材,並且予以熔融、合金化而成。 The SnZn solder according to any one of claims 1 to 3, wherein, according to requirements, 5wt% or less of Al, Si, Cu, Ag, Ni is mixed in the aforementioned base material or contains Al, Si, Cu , Ag, Ni and more than one kind of glass secondary material, and it is made by melting and alloying. 如請求項1至4中任一項所述之SnZn焊料,其中,就前述主材及前述副材而言,將該主材與該副材的合金混入前述母材,並且予以熔融、合金化。 The SnZn solder according to any one of claims 1 to 4, wherein, regarding the main material and the auxiliary material, an alloy of the main material and the auxiliary material is mixed into the base material, and the base material is melted and alloyed . 如請求項5所述之SnZn焊料,其中,就前述主材與前述副材的合金而言,採用Cu與P的合金。 The SnZn solder according to claim 5, wherein an alloy of Cu and P is used for the alloy of the main material and the auxiliary material. 如請求項1至6中任一項所述之SnZn焊料,其中,將前述母材、主材、副材同時或分複數次混合,並且予以熔融、合金化。 The SnZn solder according to any one of claims 1 to 6, wherein the aforementioned base material, main material, and subsidiary material are mixed simultaneously or divided into multiple times, and are melted and alloyed. 如請求項1至7中任一項所述之SnZn焊料,係用於對太陽能電池基板、液晶基板的電極焊接導線。 The SnZn solder described in any one of claims 1 to 7 is used for soldering wires to the electrodes of solar cell substrates and liquid crystal substrates. 一種SnZn焊料,係於請求項1至8中任一項所述之SnZn焊料中,混入3wt%以下0.05wt%以上之氯化銨水合物之粉末或含有氯化銨水合物之粉末,以在焊接加熱時分解而改善對於被焊接對象物之焊接密接度。 A kind of SnZn solder, in which the SnZn solder described in any one of claims 1 to 8 is mixed with ammonium chloride hydrate powder or powder containing ammonium chloride hydrate below 3wt% and 0.05wt% or more, so as to Decomposes during welding heating to improve welding adhesion to the welding object. 一種SnZn焊料的製造方法,係製造由Sn與Zn的合金構成之SnZn焊料,該製造方法係於屬於Sn與Zn的合金之母材混入合計1至1.5wt%以下之包含P、In、Bi、Sb之中一種以上之主材,並且予以熔融、合金化而進行製造。 A method for manufacturing SnZn solder, which is to manufacture SnZn solder composed of an alloy of Sn and Zn. The manufacturing method is to mix the base material of the alloy of Sn and Zn with a total of 1 to 1.5wt% or less containing P, In, Bi, One or more of the main materials of Sb are melted and alloyed to be manufactured. 如請求項10所述之SnZn焊料的製造方法,其中,前述熔融、合金化後之SnZn焊料的熔融溫度係與前述母材的熔融溫度相同或更低。 The method for producing SnZn solder according to claim 10, wherein the melting temperature of the SnZn solder after melting and alloying is the same as or lower than the melting temperature of the base material. 如請求項10或11所述之SnZn焊料的製造方法,其中,前述主材係在Sn與Zn的合金的骨架內合金化。 The method of manufacturing a SnZn solder according to claim 10 or 11, wherein the main material is alloyed in a skeleton of an alloy of Sn and Zn. 如請求項10至12中任一項所述之SnZn焊料的製造方法,其中,依據需求,於前述母材混入5wt%以下之Al、Si、Cu、Ag、Ni之中一種以上或含有Al、Si、Cu、Ag、Ni之中一種以上之玻璃之副材,並且予以熔融、合金化。 The manufacturing method of SnZn solder according to any one of claims 10 to 12, wherein, according to requirements, at least one of Al, Si, Cu, Ag, Ni is mixed with 5wt% or less of Al, Si, Cu, Ag, Ni or Al, One or more sub-materials of glass among Si, Cu, Ag, and Ni, and are melted and alloyed. 如請求項10至13中任一項所述之SnZn焊料的製造方法,其中,就前述主材及前述副材而言,將該主材與該副材的合金混入前述母材,並且予以熔融、合金化。 The manufacturing method of SnZn solder according to any one of claims 10 to 13, wherein, regarding the main material and the auxiliary material, an alloy of the main material and the auxiliary material is mixed into the base material and melted , Alloying. 如請求項14所述之SnZn焊料的製造方法,其中,就前述主材與前述副材的合金而言,採用Cu與P的合金。 The method for producing SnZn solder according to claim 14, wherein the alloy of the main material and the sub material is an alloy of Cu and P. 如請求項10至15中任一項所述之SnZn焊料的製造方法,其中,將前述母材、主材、副材同時或分複數次混合,並且予以熔融、合金化。 The manufacturing method of SnZn solder according to any one of claims 10 to 15, wherein the base material, the main material, and the auxiliary material are mixed simultaneously or divided into multiple times, and are melted and alloyed. 一種SnZn焊料的製造方法,係於請求項10至16中任一項所述之SnZn焊料中,混入3wt%以下0.05wt%以上之氯化銨水合物之粉末或含有氯化銨水合物之粉末,以在焊接加熱時分解而改善對於被焊接對象物之焊接密接度。 A manufacturing method of SnZn solder, which is mixed with powder of ammonium chloride hydrate or powder containing ammonium chloride hydrate of less than 3wt% and more than 0.05wt% of SnZn solder according to any one of claims 10 to 16 , To decompose during welding heating to improve the welding adhesion to the welding object.
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