TW202100263A - Processing apparatus for reducing internal surface roughness of workpiece - Google Patents
Processing apparatus for reducing internal surface roughness of workpiece Download PDFInfo
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- TW202100263A TW202100263A TW108122130A TW108122130A TW202100263A TW 202100263 A TW202100263 A TW 202100263A TW 108122130 A TW108122130 A TW 108122130A TW 108122130 A TW108122130 A TW 108122130A TW 202100263 A TW202100263 A TW 202100263A
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Abstract
Description
本發明係關於一種工件內表面處理裝置,尤係關於一種可用於精密鑄件的內表面處理裝置。 The invention relates to an inner surface treatment device of a workpiece, and more particularly relates to an inner surface treatment device that can be used for precision castings.
近來,選擇性雷射燒熔(Selective Laser Melting;SLM)技術於成型工藝領域中備受各界關注,相較於傳統的精密鑄造技術,SLM技術因具備高度的工藝靈活性,故能製得具有複雜度高的精密鑄件,且其所得之製品具備良好的機械性能,可廣泛應用於航太、汽機車、家電等產業,係目前極具發展潛力之製程。 Recently, the selective laser melting (Selective Laser Melting; SLM) technology has attracted much attention in the field of molding process. Compared with the traditional precision casting technology, the SLM technology has a high degree of process flexibility. Precision castings with high complexity and good mechanical properties can be widely used in aerospace, automotive, home appliances and other industries. It is a process with great development potential.
然而,藉由SLM技術所製備之製品因受限於使用粉體之平均粒徑範圍的先天侷限,其表面粗糙度普遍大於20微米,遠高於現今精密鑄造製品之表面粗糙度,而難以實現取代精密鑄造技術之願景。 However, products prepared by SLM technology are limited by the inherent limitations of the average particle size range of the powder used, and their surface roughness is generally greater than 20 microns, which is much higher than the surface roughness of current precision casting products, and it is difficult to achieve The vision to replace precision casting technology.
目前常見用於鑄件的表面處理技術主要為噴砂技術或震動研磨技術,惟,噴砂技術無法適用於內表面處理,而震動研磨則僅適用於 平坦表面或深度不大的凹面,難以用於高複雜度的SLM技術所製成之精密鑄件的內表面處理。 At present, the commonly used surface treatment technologies for castings are mainly sandblasting technology or vibration grinding technology. However, sandblasting technology cannot be applied to inner surface treatment, and vibration grinding is only suitable for Flat surfaces or concave surfaces with a small depth are difficult to use for the inner surface treatment of precision castings made by the highly complex SLM technology.
有鑑於此,有必要提出一種可用於SLM技術所製成之精密鑄件的內表面處理裝置,以解決習知技術所存在的問題。 In view of this, it is necessary to propose an internal surface treatment device that can be used for precision castings made by SLM technology to solve the problems of the conventional technology.
為解決上述之問題,本發明提供一種降低工件之內腔表面粗糙度之處理裝置,係包括:研磨液供給系統,係提供增壓的研磨液至該工件之內腔,且增壓後之該研磨液之壓力為每平方英寸100磅至1500磅;分別連接及流體連通該工件之入口端及該研磨液供給系統之導向元件,且該導向元件係界定該研磨液之輸入流徑,俾由該研磨液供給系統將增壓後之該研磨液經由該導向元件饋入該工件之該內腔;連接該工件之出口端的排放系統;以及用於固持該工件之固定台。 In order to solve the above problems, the present invention provides a processing device for reducing the surface roughness of the inner cavity of a workpiece. The pressure of the polishing liquid is 100 to 1500 pounds per square inch; the inlet end of the workpiece and the guiding element of the polishing liquid supply system are respectively connected and fluidly connected, and the guiding element defines the input flow path of the polishing liquid. The grinding fluid supply system feeds the pressurized grinding fluid into the inner cavity of the workpiece via the guide element; a discharge system connected to the outlet end of the workpiece; and a fixing table for holding the workpiece.
於本發明的其他實施態樣中,該研磨液增壓後的壓力可為每平方英寸100磅、120磅、150磅、180磅、200磅、250磅、300磅、400磅、500磅、600磅、700磅、800磅、900磅、1000磅、1100磅、1200磅、1300磅、1400磅、1450磅或1500磅,且不以此為限。 In other embodiments of the present invention, the pressurized pressure of the polishing liquid may be 100 pounds per square inch, 120 pounds, 150 pounds, 180 pounds, 200 pounds, 250 pounds, 300 pounds, 400 pounds, 500 pounds, 600 pounds, 700 pounds, 800 pounds, 900 pounds, 1000 pounds, 1100 pounds, 1200 pounds, 1300 pounds, 1400 pounds, 1450 pounds or 1500 pounds, and not limited to this.
於本發明之處理裝置的一具體實施態樣中,該排放系統復與該研磨液供給系統連接形成一密閉迴路,以使該研磨液於該迴路中循環流動。 In a specific embodiment of the processing device of the present invention, the exhaust system is connected to the polishing liquid supply system to form a closed loop, so that the polishing liquid circulates in the loop.
於本發明之處理裝置的一具體實施態樣中,該研磨液供給系統係包括提供該研磨液之儲槽及與該儲槽流體連通且提供增壓流體的驅動單元,以增壓該研磨液。 In a specific embodiment of the processing device of the present invention, the polishing liquid supply system includes a storage tank that provides the polishing liquid and a drive unit that is in fluid communication with the storage tank and provides pressurized fluid to pressurize the polishing liquid .
於本發明之處理裝置的一具體實施態樣中,該導向元件之流通面積係介於0.1平方釐米至1300平方釐米。 In a specific embodiment of the processing device of the present invention, the flow area of the guide element is between 0.1 square centimeters and 1300 square centimeters.
於本發明的其他實施態樣中,該導向元件之流通面積的下限值可為0.1平方釐米、0.2平方釐米、0.5平方釐米、1平方釐米、2平方釐米、5平方釐米、10平方釐米、20平方釐米、50平方釐米、100平方釐米、250平方釐米、500平方釐米、750平方釐米或1000平方釐米,且不以此為限,而該導向元件之流通面積的上限值則可為1300平方釐米、1256平方釐米、1200平方釐米、1100平方釐米、1000平方釐米或900平方釐米,且不以此為限。 In other embodiments of the present invention, the lower limit of the flow area of the guide element can be 0.1 square centimeters, 0.2 square centimeters, 0.5 square centimeters, 1 square centimeters, 2 square centimeters, 5 square centimeters, 10 square centimeters, 20 square centimeters, 50 square centimeters, 100 square centimeters, 250 square centimeters, 500 square centimeters, 750 square centimeters or 1000 square centimeters, and not limited to this, and the upper limit of the flow area of the guide element can be 1300 Square centimeters, 1256 square centimeters, 1200 square centimeters, 1100 square centimeters, 1000 square centimeters, or 900 square centimeters, and not limited thereto.
於本發明之處理裝置的一具體實施態樣中,該研磨液係包括切削粒子及漿料,且該漿料係包含陶瓷顆粒。 In a specific embodiment of the processing device of the present invention, the polishing liquid includes cutting particles and slurry, and the slurry includes ceramic particles.
於本發明之處理裝置的一具體實施態樣中,該固定台係包括:用以承載該工件之底座;以及可拆卸地組裝於該底座之周邊以固定該工件於該底座上的複數個固定組件。於另一具體實施態樣中,該底座係包括定位件及止滑件。 In a specific embodiment of the processing device of the present invention, the fixing table includes: a base for carrying the workpiece; and a plurality of fixings detachably assembled on the periphery of the base to fix the workpiece on the base Components. In another embodiment, the base includes a positioning element and a non-slip element.
於本發明之處理裝置的一具體實施態樣中,該工件之內腔為呈管狀,例如,該工件之內腔的管徑係介於1公分至20公分;於另一具體實施態樣中,該工件之內腔復包括複數個折彎部,且該折彎部之R角係介於5毫米至100毫米。 In a specific embodiment of the processing device of the present invention, the inner cavity of the workpiece is tubular, for example, the diameter of the inner cavity of the workpiece ranges from 1 cm to 20 cm; in another embodiment , The inner cavity of the workpiece includes a plurality of bending parts, and the R angle of the bending part is between 5 mm and 100 mm.
於本發明的其他實施態樣中,該工件之內腔的管徑可為1.5公分、2公分、2.5公分、5公分、7.5公分、10公分、12.5公分、15公分、17.5公分或19.5公分,且不以此為限。 In other embodiments of the present invention, the diameter of the inner cavity of the workpiece may be 1.5 cm, 2 cm, 2.5 cm, 5 cm, 7.5 cm, 10 cm, 12.5 cm, 15 cm, 17.5 cm or 19.5 cm. And not limited to this.
於本發明的其他實施態樣中,該折彎部之R角可為6毫米、7.5毫米、8毫米、10毫米、12毫米、15毫米、20毫米、25毫米、30毫米、40毫米、50毫米、60毫米、70毫米、75毫米、80毫米、85毫米、90毫米、95毫米或98毫米,且不以此為限。 In other embodiments of the present invention, the R angle of the bending portion may be 6 mm, 7.5 mm, 8 mm, 10 mm, 12 mm, 15 mm, 20 mm, 25 mm, 30 mm, 40 mm, 50 mm. Mm, 60 mm, 70 mm, 75 mm, 80 mm, 85 mm, 90 mm, 95 mm or 98 mm, and not limited to this.
於本發明之處理裝置的一具體實施態樣中,該工件復包括複數個開口,且該開口係相互連通。於此實施態樣中,該處理裝置復包括對應於該工件之開口的複數個塞件,且該塞件係經加壓固定於該固定台。 In a specific embodiment of the processing device of the present invention, the workpiece includes a plurality of openings, and the openings are communicated with each other. In this embodiment, the processing device further includes a plurality of plugs corresponding to the opening of the workpiece, and the plugs are fixed to the fixing table under pressure.
藉由本發明所提供之處理裝置處理工件之內腔表面,可獲得所期望低內表面粗糙度之處理效果,因而解決SLM技術所製備之精密鑄件的內腔表面高粗糙度的問題,進而提升SLM技術的產品競爭力。 By processing the inner cavity surface of the workpiece by the processing device provided by the present invention, the desired low inner surface roughness processing effect can be obtained, thus solving the problem of the high roughness of the inner cavity surface of the precision casting prepared by SLM technology, thereby improving the SLM Technical product competitiveness.
10‧‧‧工件、管狀工件 10‧‧‧Workpiece, tubular workpiece
11‧‧‧研磨液供給系統 11‧‧‧Grinding fluid supply system
12、12’‧‧‧導向元件 12, 12’‧‧‧Guiding element
13‧‧‧排放系統 13‧‧‧Exhaust system
14‧‧‧固定台 14‧‧‧Fixed table
15‧‧‧底座 15‧‧‧Base
15a‧‧‧底板 15a‧‧‧Bottom plate
15b、15c‧‧‧豎板 15b、15c‧‧‧Riser
101‧‧‧入口端 101‧‧‧Entrance
102‧‧‧出口端 102‧‧‧Exit port
103‧‧‧開口 103‧‧‧Open
104‧‧‧折彎部 104‧‧‧Bending part
105‧‧‧塞件 105‧‧‧plug
106‧‧‧凹部 106‧‧‧Concave
110‧‧‧儲槽 110‧‧‧Storage tank
112‧‧‧驅動單元 112‧‧‧Drive unit
130‧‧‧管線 130‧‧‧Pipeline
131‧‧‧過濾器 131‧‧‧Filter
132‧‧‧廢液儲槽 132‧‧‧ Waste liquid storage tank
151‧‧‧定位件 151‧‧‧Positioning piece
152‧‧‧止滑件 152‧‧‧Slip Parts
160‧‧‧鎖固件 160‧‧‧Lock firmware
161、162、163‧‧‧固定組件 161, 162, 163‧‧‧Fixed components
A‧‧‧箭頭 A‧‧‧Arrow
R‧‧‧R角 R‧‧‧R angle
透過例示性之參考附圖說明本發明的實施方式:第1圖係降低工件之內腔表面粗糙度之處理裝置之第一實施例的示意圖;第2圖係降低工件之內腔表面粗糙度之處理裝置之第二實施例的示意圖;第3圖係固定台之結構示意圖;第4A圖係具有複數個開口之工件之示意圖; 第4B圖係根據第4A圖所示工件的折彎部之示意圖;以及第4C圖係根據第4A圖所示工件之底側示意圖。 The embodiment of the present invention will be explained by referring to the drawings illustratively: Figure 1 is a schematic diagram of the first embodiment of the processing device for reducing the surface roughness of the inner cavity of the workpiece; Figure 2 is the schematic diagram of the first embodiment of reducing the surface roughness of the inner cavity of the workpiece A schematic diagram of the second embodiment of the processing device; Figure 3 is a schematic diagram of the structure of the fixed table; Figure 4A is a schematic diagram of a workpiece with a plurality of openings; Fig. 4B is a schematic diagram of the bending part of the workpiece shown in Fig. 4A; and Fig. 4C is a schematic diagram of the bottom side of the workpiece shown in Fig. 4A.
以下係藉由特定的具體實施例說明本發明之實施方式,熟習此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之優點及功效。 The following is a specific embodiment to illustrate the implementation of the present invention. Those skilled in the art can easily understand the advantages and effects of the present invention from the content disclosed in this specification.
須知,本說明書所附圖式中所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用如「上」及「一」等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,亦當視為本發明可實施之範疇。此外,本說明書所有範圍和數值皆係包含及可合併的。落在本說明書中所述的範圍內之任何數值或點,例如任何整數,都可以作為最小值或最大值以導出下位範圍。 It should be noted that the structure, ratio, size, etc. shown in the accompanying drawings in this specification are only used to match the content disclosed in the specification for the understanding and reading of those familiar with this technique, and are not intended to limit the scope of the present invention. The implementation conditions are limited, so any structural modification, proportional relationship change, or size adjustment, without affecting the effects and objectives that can be achieved by the present invention, still fall within the technical content disclosed in the present invention. Can be covered. At the same time, the terms "上" and "一" cited in this specification are only for ease of description and are not used to limit the scope of implementation of the present invention. The change or adjustment of the relative relationship is insubstantial. Changes in the technical content should also be regarded as the scope of the present invention. In addition, all ranges and values in this specification are inclusive and combinable. Any value or point falling within the range described in this specification, such as any integer, can be used as the minimum or maximum value to derive the lower range.
請參閱第1圖,係說明本發明之降低工件之內腔表面粗糙度之處理裝置之第一實施例的示意圖,該處理裝置係包括:研磨液供給系統11、導向元件12、排放系統13以及固定台14。
Please refer to Figure 1, which is a schematic diagram illustrating the first embodiment of the processing device for reducing the surface roughness of the inner cavity of the workpiece according to the present invention. The processing device includes: a
所述之研磨液供給系統11係提供增壓的研磨液至該工件10之內腔,且增壓後之該研磨液之壓力為每平方英寸100磅至1500磅。透過
研磨液流體的高壓流動所產生之剪應力摩擦,可增強工件的表面處理效果。
The grinding
為提供增壓之研磨液,於一具體實施態樣中,該研磨液供給系統係包括提供該研磨液之儲槽110及與該儲槽110流體連通且提供增壓流體的驅動單元112,其中,該驅動單元係為一壓縮機或高壓流體槽,透過調整研磨液的壓力,進而對應調整該研磨液之流動速度。或者,藉由驅動單元112提供加壓的流體,當該儲槽110提供的研磨液與該經加壓的流體結合後,形成該增壓之研磨液。
In order to provide pressurized polishing liquid, in a specific embodiment, the polishing liquid supply system includes a
於一具體實施態樣中,該研磨液供給系統之管線中可視情況包括測量器或閥門,如流量調節閥或逆止閥,以供控制輸送研磨液之流量,並穩定其管線壓力。 In a specific embodiment, the pipeline of the slurry supply system may optionally include a meter or valve, such as a flow regulating valve or a check valve, to control the flow of the slurry and stabilize the pipeline pressure.
所述之研磨液係包括切削粒子及漿料,其中,該漿料係包含陶瓷顆粒,且該切削粒子係選自氧化鈰、金剛石、氮化硼、氧化鋯、氧化鋁及碳化矽球所組成群組之至少其中一種,上述粒子的粒度大小可依據期望的研磨表面紋理及實際的操作情況而選擇。於另一具體實施態樣中,該儲槽110復包括攪拌裝置,以減少於研磨液儲槽中發生沉降問題。於一具體實施態樣中,該研磨液復包括溶劑、界面活性劑或助劑,以提供有效的整平處理。
The grinding fluid includes cutting particles and slurry, wherein the slurry includes ceramic particles, and the cutting particles are selected from the group consisting of cerium oxide, diamond, boron nitride, zirconium oxide, aluminum oxide and silicon carbide balls At least one of the groups, the particle size of the aforementioned particles can be selected according to the desired grinding surface texture and actual operating conditions. In another specific embodiment, the
所述之導向元件12係分別連接及流體連通該工件10之入口端101及研磨液供給系統11,且該導向元件12係界定該研磨液之輸入流徑,以使增壓後之研磨液產生期望的流動形式,如扇形、圓形等形式之噴流流動後,再饋入該工件10之內腔。
The
於一具體實施態樣中,該導向元件12為其中設有管路之塞件,以使該導向元件與該入口端緊密接合。
In a specific embodiment, the
於另一具體實施態樣中,該導向元件12係可整合於固定台14。
In another embodiment, the guiding
於一具體實施態樣中,該導向元件12之流通面積為0.1平方釐米至1300平方釐米。於一具體實施態樣中,該導向元件12之流通面積與該工件之入口面積比為1:0.1至1:15。
In a specific implementation aspect, the flow area of the
於其他實施態樣中,該導向元件12之流通面積與該工件之入口面積比可為1:0.2、1:0.5、1:1、1:2、1:2.5、1:3、1:5、1:7.5、1:10、1:12或1:14,且不以此為限。
In other embodiments, the ratio of the flow area of the
所述之排放系統13係連接該工件10之出口端102,以於完成表面處理後,排空該工件10內腔之研磨液及其表面磨蝕碎屑。具體而言,排放系統13亦可連接及流體連通另一導向元件12’,例如其中設有管路之塞件,以排空該工件10內腔之研磨液及磨蝕碎屑。
The
於一具體實施態樣中,該排放系統13係包括過濾器及廢液儲槽,以供接收並儲放難再回收使用的廢棄物質。
In a specific implementation aspect, the
於另一具體實施態樣中,可視情況於該排放系統13之下游端連接一負壓裝置,以加速排放程序的進行。
In another embodiment, a negative pressure device may be connected to the downstream end of the
藉由本發明中降低工件之內腔表面粗糙度之處理裝置,可改善該工件之表面紋理特徵,以減少該工件之內腔表面的平均表面粗糙度(Ra)、表面最高尖峰之高度(Rp)或表面最深凹谷之深度(Rv)。於一具體實施態樣中,透過本發明中降低工件之內腔表面粗糙度之處理裝置處理後, 可使其內表面由起初大於20微米之粗糙度,降至小於15微米、小於12微米、小於10微米或小於8微米之粗糙度。 With the processing device for reducing the surface roughness of the inner cavity of the workpiece in the present invention, the surface texture characteristics of the workpiece can be improved to reduce the average surface roughness (R a ) of the inner cavity surface of the workpiece and the height of the highest peak (R p ) or the depth of the deepest valley on the surface (R v ). In a specific embodiment, after processing by the processing device for reducing the surface roughness of the inner cavity of the workpiece in the present invention, the inner surface of the workpiece can be reduced from the initial roughness greater than 20 microns to less than 15 microns, less than 12 microns, Roughness less than 10 microns or less than 8 microns.
請參閱第2圖,於另一具體實施態樣中,係說明本發明之降低工件之內腔表面粗糙度之處理裝置之第二實施例的示意圖,該處理裝置之排放系統13復與該研磨液供給系統11連接形成一密閉的迴路,以使該研磨液於該迴路中循環流動。
Please refer to Figure 2, in another specific embodiment, it is a schematic diagram illustrating the second embodiment of the processing device for reducing the surface roughness of the inner cavity of the workpiece according to the present invention. The
具體而言,該排放系統13係包括過濾器131及廢液儲槽132,且透過管線130將經由該過濾器131處理後之研磨液回流至該研磨液供給系統11,難再回收使用的廢棄物質係傳送至廢液儲槽132,以減少製程成本。
Specifically, the
請參閱第3圖,係說明本發明之固定台14之結構示意圖,該固定台14係包括:用以承載該工件10之底座15;以及複數個固定組件161、162、163,係可拆卸地組裝於該底座15之周邊並固定該工件10。
Please refer to Figure 3, which is a schematic diagram illustrating the structure of the fixed
在非用以限定本發明之實施態樣中,例如該底座15具有底板15a、設於底板相對兩側的豎板15b、15c,其係經設計用以承載如第4A圖所示之工件10;當應用在不同的工件時,可根據實際需求調整固定台的設計。此外,在本實施態樣中,該複數個固定組件包括位於底座15上方之固定組件161、位於底座15後方之固定組件162以及位於底座15前方之固定組件163。又,該底座15係包括可與該工件10相互鑲嵌之定位件151及止滑件152,其中,該定位件151可為定位銷,以將如第4C圖所示位於管狀工件10之底側之複數個凹部106鑲嵌固定於定位件151,而止滑件152係為耐磨材料,於一具體實施例中,該止滑件152係選自鐵氟龍(Teflon)、
尼龍(Nylon)、丙烯腈-丁二烯-苯乙烯共聚物(ABS樹脂)及聚碳酸酯(PC)所組成群組之其中一種。
In an embodiment that is not intended to limit the present invention, for example, the
所述之固定組件161、162、163係包括複數個鎖固件160,係依據該工件外形而設計,以緊密壓抵該工件10上或複數個對應該工件10之開口103的塞件105上(如第4B圖所示),進而阻止該工件10於處理程序中與固定台14產生相對移動。
The fixing
關於施用於本發明之處理裝置的工件10係為具有至少二個開口之工件。於一具體實施態樣中,該工件10可為具有較長且狹窄之內腔結構;具體而言,該工件10係為一管狀工件或該工件之內腔係呈管狀。
The
於另一具體實施態樣中,該管狀工件的管徑或該工件10之內腔的管徑為1公分至20公分。
In another embodiment, the pipe diameter of the tubular workpiece or the inner cavity of the
請參閱第4A圖,於一具體實施態樣中,該管狀工件10復包括複數個開口103。此外,該工件10可復包括複數個折彎部104,如第4B圖所示,該折彎部104之R角為5毫米至100毫米。
Please refer to FIG. 4A. In a specific embodiment, the
針對具有複數個開口之管狀工件,本發明之處理裝置復包括複數個對應該工件10之開口103的塞件105,且如第4B圖所示,該塞件105係沿箭頭A所示之方向加壓而固定於該固定台14;具體而言,該開口之塞件復可透過鎖固件160而加壓固定於該固定台14。
For a tubular workpiece with a plurality of openings, the processing device of the present invention includes a plurality of
綜上所述,本發明所提供之降低工件之內腔表面粗糙度之處理裝置,係藉由提供增壓的研磨液,以磨蝕該工件之內腔表面,使經處理之工件獲得所期望低內表面粗糙度之處理效果,以解決藉由SLM技術所 製備之精密鑄件的內腔表面高粗糙度的問題,進而提升SLM技術的產品競爭力。 In summary, the processing device provided by the present invention for reducing the surface roughness of the inner cavity of a workpiece provides a pressurized grinding fluid to abrade the surface of the inner cavity of the workpiece, so that the processed workpiece obtains the desired low The processing effect of the inner surface roughness to solve the problem of the SLM technology The high roughness of the inner cavity surface of the prepared precision castings further enhances the product competitiveness of SLM technology.
上述實施例僅為例示性說明,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修飾與改變。因此,本發明之權利保護範圍係由本發明所附之申請專利範圍所定義,只要不影響本發明之效果及實施目的,應涵蓋於此公開技術內容中。 The above-mentioned embodiments are only illustrative and not used to limit the present invention. Anyone familiar with this technique can modify and change the above-mentioned embodiments without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the rights of the present invention is defined by the scope of the patent application attached to the present invention. As long as it does not affect the effect and implementation purpose of the present invention, it should be covered in the technical content of this disclosure.
10‧‧‧工件 10‧‧‧Workpiece
101‧‧‧入口端 101‧‧‧Entrance
102‧‧‧出口端 102‧‧‧Exit port
11‧‧‧研磨液供給系統 11‧‧‧Grinding fluid supply system
110‧‧‧儲槽 110‧‧‧Storage tank
112‧‧‧驅動單元 112‧‧‧Drive unit
12、12’‧‧‧導向元件 12, 12’‧‧‧Guiding element
13‧‧‧排放系統 13‧‧‧Exhaust system
14‧‧‧固定台 14‧‧‧Fixed table
Claims (12)
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TW108122130A TW202100263A (en) | 2019-06-25 | 2019-06-25 | Processing apparatus for reducing internal surface roughness of workpiece |
JP2019139256A JP2021003798A (en) | 2019-06-25 | 2019-07-29 | Processing equipment capable of reducing inner surface roughness of workpiece |
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TW108122130A TW202100263A (en) | 2019-06-25 | 2019-06-25 | Processing apparatus for reducing internal surface roughness of workpiece |
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US3729871A (en) * | 1971-08-05 | 1973-05-01 | Acme Cleveland Corp | Abrasive cleaning |
JPS4849095A (en) * | 1971-10-21 | 1973-07-11 | ||
JPS5986936U (en) * | 1982-11-29 | 1984-06-12 | 相生精機株式会社 | Machine tool work fixing plate |
JPS6150651U (en) * | 1984-09-10 | 1986-04-05 | ||
JPH0639867Y2 (en) * | 1987-06-23 | 1994-10-19 | 日東工器株式会社 | Clamp device |
JP3711250B2 (en) * | 2001-05-30 | 2005-11-02 | 株式会社堀場エステック | Pipe inner surface polishing equipment |
JP3853273B2 (en) * | 2002-02-08 | 2006-12-06 | 株式会社不二越 | Fine hole processing equipment |
JP2007090507A (en) * | 2005-09-30 | 2007-04-12 | Nachi Fujikoshi Corp | Apparatus for flow-machining fine hole |
JP5477739B2 (en) * | 2009-09-25 | 2014-04-23 | 国立大学法人金沢大学 | Abrasive mixed fluid polishing apparatus and polishing method |
JP2016179515A (en) * | 2015-03-23 | 2016-10-13 | パナソニックIpマネジメント株式会社 | Method and device for polishing penetration passage of three-dimensional structure |
JP2016179514A (en) * | 2015-03-23 | 2016-10-13 | パナソニックIpマネジメント株式会社 | Method and device for polishing penetration passage of three-dimensional structure |
JP2017074629A (en) * | 2015-10-13 | 2017-04-20 | トヨタ自動車株式会社 | Inner surface polishing device of hole with bottom |
US10646977B2 (en) * | 2016-06-17 | 2020-05-12 | United Technologies Corporation | Abrasive flow machining method |
WO2019003397A1 (en) * | 2017-06-28 | 2019-01-03 | 三菱製鋼株式会社 | Method for manufacturing hollow stabilizer |
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