TW202042296A - Substrate processing apparatus and substrate processing method - Google Patents

Substrate processing apparatus and substrate processing method Download PDF

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TW202042296A
TW202042296A TW109101959A TW109101959A TW202042296A TW 202042296 A TW202042296 A TW 202042296A TW 109101959 A TW109101959 A TW 109101959A TW 109101959 A TW109101959 A TW 109101959A TW 202042296 A TW202042296 A TW 202042296A
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substrate
gas
liquid
phase fluid
ozone
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TWI833880B (en
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舟橋倫正
房野正幸
小見山昌彥
戶田貴大
河合勇治
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日商Ｊｅｔ股份有限公司
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02—Spray pistols; Apparatus for discharge
    • B05B7/04—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge
    • B05B7/0416—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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Abstract

Provided are a substrate processing apparatus and a substrate processing method with which it is possible to obtain a high resist film removal rate. In a housing (12), a substrate (11) is fixed onto a rotary table (21) and positioned with a processing surface (S1) of the substrate (11) being spaced apart from an upper surface of a fixing plate (17) by a predetermined interval and facing downward. The substrate (11) rotates together with the rotary table (21). During rotation of the substrate (11), a two-phase gas-liquid fluid comprising a mixture of ozone gas and ozone water is flowed from an ejecting portion (16) provided at the center of the fixing plate (17) into a flow path formed between the processing surface (S1) and the upper surface.

Description

基板處理裝置及基板處理方法Substrate processing device and substrate processing method

本發明係關於一種半導體晶圓等之基板處理裝置及基板處理方法。The present invention relates to a substrate processing apparatus and substrate processing method for semiconductor wafers and the like.

通常，於半導體之晶圓製程中，作為用以形成器件構造之蝕刻或離子布植等之遮罩，廣泛使用作為感光性樹脂之抗蝕膜。即，以形成於基板之處理面之抗蝕膜為遮罩進行蝕刻或離子布植等後，自基板之處理面去除抗蝕膜。Generally, in the semiconductor wafer manufacturing process, as a mask for etching or ion implantation for forming device structures, it is widely used as a resist film for photosensitive resin. That is, after etching or ion implantation is performed using the resist film formed on the processing surface of the substrate as a mask, the resist film is removed from the processing surface of the substrate.

作為去除抗蝕膜之方法，廣泛使用硫酸與過氧化氫之混合液(硫酸過氧化氫混合物)。又，提出使用對環境影響較小之臭氧(O3 )水之方法(參照專利文獻1)。 [先前技術文獻] [專利文獻]As a method of removing the resist film, a mixed solution of sulfuric acid and hydrogen peroxide (sulfuric acid hydrogen peroxide mixture) is widely used. In addition, a method of using ozone (O 3 ) water, which has a small impact on the environment, is proposed (refer to Patent Document 1). [Prior Art Document] [Patent Document]

[專利文獻1]國際公開第2010/140581號 [專利文獻2]日本專利特開2009-218548號公報[Patent Document 1] International Publication No. 2010/140581 [Patent Document 2] Japanese Patent Laid-Open No. 2009-218548

[發明所欲解決之問題][The problem to be solved by the invention]

使用臭氧(O3 )水去除抗蝕膜之方法雖然對環境之影響較小，但存在抗蝕膜之去除速率較低，對1片基板進行處理之時間較長之問題。Although the method of using ozone (O 3 ) water to remove the resist film has little impact on the environment, it has the problem that the removal rate of the resist film is low and the processing time for one substrate is longer.

本發明係鑒於上述情況完成者，其目的在於提供一種可獲得較高之抗蝕膜之去除速率之基板處理裝置及基板處理方法。 [解決問題之技術手段]The present invention was completed in view of the above circumstances, and its object is to provide a substrate processing apparatus and a substrate processing method that can obtain a higher removal rate of the resist film. [Technical means to solve the problem]

本發明之基板處理裝置具備：旋轉機構部，其水平保持基板，使所保持之上述基板繞鉛直軸旋轉；固定板，其固定於一個面與由上述旋轉機構部保持之上述基板之處理面隔開間隔地相對之位置，於與上述處理面之間形成流路；及噴出部，其設置於與上述基板之中央部對向之位置，於藉由上述旋轉機構部使上述基板旋轉期間，對上述流路供給臭氧氣體及臭氧水，使混合臭氧氣體與臭氧水而成之氣液兩相流體流動。The substrate processing apparatus of the present invention includes a rotating mechanism section that horizontally holds a substrate and rotates the held substrate around a vertical axis; and a fixing plate that is fixed to a surface separated from the processing surface of the substrate held by the rotating mechanism section Positions opposed to each other at intervals, forming a flow path between the processing surface; and an ejection portion, which is provided at a position opposite to the center portion of the substrate, and is opposed during the rotation of the substrate by the rotation mechanism portion The above-mentioned flow path supplies ozone gas and ozone water, and flows a gas-liquid two-phase fluid formed by mixing ozone gas and ozone water.

本發明之基板處理方法具有：旋轉步驟，其係於使水平保持之基板之處理面與固定之固定板之一個面隔開間隔相對，於上述處理面與上述一個面之間形成有流路的狀態下，使上述基板繞鉛直軸旋轉；及氣液兩相流體供給步驟，其係於上述旋轉步驟中，自與上述基板之中央部對向之位置對上述流路供給臭氧氣體及臭氧水，使混合臭氧氣體與臭氧水而成之氣液兩相流體流動。 [發明之效果]The substrate processing method of the present invention has: a rotating step in which the processing surface of the horizontally held substrate is opposed to one surface of the fixed fixing plate at an interval, and a flow path is formed between the processing surface and the one surface In the state, the substrate is rotated around a vertical axis; and the gas-liquid two-phase fluid supply step is performed in the rotation step, in which ozone gas and ozone water are supplied to the flow path from a position opposite to the center of the substrate, The gas-liquid two-phase fluid formed by mixing ozone gas and ozone water flows. [Effects of Invention]

根據本發明，使基板之處理面與固定板之一個面隔開間隔地相對，於處理面與固定板之一個面之間形成流路，於基板之旋轉中使混合臭氧氣體與臭氧水而成之氣液兩相流體於流路中流動，因此可獲得較高之去除速率。According to the present invention, the processing surface of the substrate and one surface of the fixed plate are opposed to each other at a distance, a flow path is formed between the processing surface and one surface of the fixed plate, and ozone gas and ozone water are mixed during the rotation of the substrate. The gas-liquid two-phase fluid flows in the flow path, so a higher removal rate can be obtained.

圖1中，基板處理裝置10使用臭氧氣體與臭氧水之氣液兩相流去除形成於基板11之抗蝕膜(省略圖示)。基板11例如為矽晶圓等半導體基板。該例中，形成各種半導體元件、電路之基板11之一個面為成為處理對象之處理面S1，基板處理裝置10去除形成於該處理面S1之抗蝕膜。該例之基板處理裝置10以使處理面S1向下之狀態進行去除抗蝕膜之處理，但亦可以使處理面S1向上之狀態進行去除抗蝕膜之處理。In FIG. 1, the substrate processing apparatus 10 uses a gas-liquid two-phase flow of ozone gas and ozone water to remove a resist film (not shown) formed on the substrate 11. The substrate 11 is, for example, a semiconductor substrate such as a silicon wafer. In this example, one surface of the substrate 11 on which various semiconductor elements and circuits are formed is the processing surface S1 to be processed, and the substrate processing apparatus 10 removes the resist film formed on the processing surface S1. The substrate processing apparatus 10 of this example performs the process of removing the resist film with the processing surface S1 facing downward, but it is also possible to perform the process of removing the resist film with the processing surface S1 facing upward.

基板處理裝置10具備殼體12、旋轉機構部14、裝載機構15、噴出部16、固定板17、供給部18、鹵素燈加熱器19、排出部20等。該基板處理裝置10之各部藉由控制部(省略圖示)總括地控制。The substrate processing apparatus 10 includes a housing 12, a rotating mechanism section 14, a loading mechanism 15, a discharge section 16, a fixed plate 17, a supply section 18, a halogen lamp heater 19, a discharge section 20, and the like. Each part of this substrate processing apparatus 10 is collectively controlled by a control part (illustration omitted).

殼體12為有底之圓筒狀，於上部設置有開口為圓形狀之上部開口12a。於殼體12內，收容有固定板17及後述旋轉台21等，並且收容基板11。上部開口12a以大於基板11之直徑形成，通過該上部開口12a對殼體12進行基板11之取出置入。又，該例中，如下所述，上部開口12a成為對殼體12內擷取外部氣體之擷取口。The housing 12 is cylindrical with a bottom, and an upper opening 12a having a circular opening is provided on the upper part. In the housing 12, a fixed plate 17 and a rotating table 21 described later are housed, and the substrate 11 is housed. The upper opening 12a is formed with a larger diameter than the substrate 11, and the substrate 11 is taken out and placed in the housing 12 through the upper opening 12a. Furthermore, in this example, as described below, the upper opening 12a serves as an extraction port for capturing external air in the casing 12.

旋轉機構部14使水平保持之基板11繞鉛直軸旋轉，該例中，包含旋轉台21、驅動軸22、電動馬達23、基板保持部24等。旋轉台21為圓盤狀，收容於殼體12內。旋轉台21固定於驅動軸22之上端部，繞鉛直之旋轉軸Z旋動自如，以使其上表面水平之狀態旋動。旋轉台21與驅動軸22同軸。驅動軸22於厚度方向(上下方向)貫通殼體12之底面12b，藉由設置於底面12b之開口部之軸承25而旋動自如地被支持。於驅動軸22之下部固定有皮帶輪26。該皮帶輪26與安裝於電動馬達23之旋轉軸之皮帶輪23a之間掛設有皮帶27。藉此，當電動馬達23驅動時，驅動軸22與旋轉台21一體旋轉。藉由使電動馬達23之速度增減，調節旋轉台21之旋轉速度。The rotating mechanism unit 14 rotates the horizontally held substrate 11 around a vertical axis. In this example, it includes a rotating table 21, a drive shaft 22, an electric motor 23, a substrate holding unit 24, and the like. The rotating table 21 has a disc shape and is housed in the housing 12. The rotating table 21 is fixed to the upper end of the drive shaft 22, and it can rotate freely around the vertical rotation axis Z so that its upper surface is horizontal. The rotating table 21 is coaxial with the drive shaft 22. The drive shaft 22 penetrates the bottom surface 12b of the housing 12 in the thickness direction (up and down direction), and is rotatably supported by the bearing 25 provided in the opening part of the bottom surface 12b. A pulley 26 is fixed to the lower part of the drive shaft 22. A belt 27 is hung between the pulley 26 and the pulley 23a installed on the rotating shaft of the electric motor 23. Thereby, when the electric motor 23 is driven, the drive shaft 22 and the rotating table 21 rotate integrally. By increasing or decreasing the speed of the electric motor 23, the rotation speed of the rotating table 21 is adjusted.

於旋轉台21設置有保持基板11之基板保持部24。基板保持部24包含沿周向以特定間隔排列於旋轉台21之周緣部之複數個保持具24a。各保持具24a與旋轉台21一體旋轉。再者，圖1中，僅描繪有2根保持具24a，實際上例如設置有6根保持具24a。The turntable 21 is provided with a substrate holding portion 24 that holds the substrate 11. The substrate holding portion 24 includes a plurality of holding fixtures 24a arranged on the periphery of the turntable 21 at specific intervals in the circumferential direction. Each holder 24a rotates integrally with the rotating table 21. In addition, in Fig. 1, only two holders 24a are depicted, but actually, for example, six holders 24a are provided.

保持具24a例如於其前端形成有階差部，於各保持具24a之階差部之各者載置基板11之周緣部。藉此，藉由基板保持部24於特定高度水平支持基板11。藉由基板保持部24支持之基板11與旋轉台21之上表面隔開被支持於上方。又，各保持具24a分別於基板11之徑向移動，藉此利用各保持具24a夾持基板11。如此，基板11由基板保持部24保持，與旋轉台21同軸地固定，與旋轉台21一體地旋轉。上述基板保持部24之構成為一例，並不限定於此。例如，亦可藉由抵接於基板11之處理面S1側之周緣部而對基板11與旋轉台21規定間隔之複數個銷、及於徑向夾持固定基板11之複數個銷構成基板保持部24。The holder 24a has, for example, a stepped portion formed at its front end, and the peripheral edge portion of the substrate 11 is placed on each of the stepped portions of each holder 24a. Thereby, the substrate 11 is supported by the substrate holding portion 24 at a certain height level. The substrate 11 supported by the substrate holding portion 24 is separated from the upper surface of the turntable 21 and supported above. In addition, the holders 24a move in the radial direction of the substrate 11, respectively, thereby clamping the substrate 11 by the holders 24a. In this way, the substrate 11 is held by the substrate holding portion 24, is fixed coaxially with the turntable 21, and rotates integrally with the turntable 21. The configuration of the substrate holding portion 24 described above is an example, and is not limited to this. For example, a plurality of pins contacting the peripheral edge portion of the processing surface S1 side of the substrate 11 to define a distance between the substrate 11 and the turntable 21, and a plurality of pins clamping and fixing the substrate 11 in the radial direction may constitute the substrate holding Department 24.

於驅動軸22，於其內部形成有上下方向貫通之貫通孔22a。又，於旋轉台21之中央部，形成有與貫通孔22a連接之貫通孔21a。筒狀之固定軸28貫穿於貫通孔21a及貫通孔22a。該固定軸28與殼體12等共同固定於外部之框架等。因此，旋轉台21及驅動軸22繞固定軸28旋轉。The drive shaft 22 has a through hole 22a penetrating in the vertical direction. In addition, a through hole 21a connected to the through hole 22a is formed in the center of the turntable 21. The cylindrical fixed shaft 28 penetrates through the through hole 21a and the through hole 22a. The fixed shaft 28 is fixed to an external frame and the like together with the housing 12 and the like. Therefore, the rotating table 21 and the drive shaft 22 rotate around the fixed shaft 28.

於固定軸28之上端，固定有用以供給氣液兩相流之流體(以下稱氣液兩相流體)之混合器29，於該混合器29固定有固定板17。於混合器29之上表面形成有成為噴出部16之複數個噴出孔30(參照圖2)。又，於混合器29，經由供給管部31連接有供給部18，該供給管部31包含穿過固定軸28之中空部28a之供給管31a～31d(參照圖2)。再者，亦可將固定板17直接固定於固定軸28。At the upper end of the fixed shaft 28, a mixer 29 for supplying a gas-liquid two-phase fluid (hereinafter referred to as a gas-liquid two-phase fluid) is fixed, and a fixing plate 17 is fixed to the mixer 29. On the upper surface of the mixer 29, a plurality of ejection holes 30 serving as the ejection portion 16 are formed (see FIG. 2). Moreover, the mixer 29 is connected to the supply part 18 via the supply pipe part 31 which contains the supply pipe 31a-31d (refer FIG. 2) which penetrates the hollow part 28a of the fixed shaft 28. Furthermore, the fixed plate 17 may be directly fixed to the fixed shaft 28.

包含噴出部16之混合器29及固定板17配置於由基板保持部24保持之基板11與旋轉台21之間。如下所述，固定板17固定於其上表面與由基板保持部24保持之基板11之處理面S1隔開間隔地相對之位置。The mixer 29 including the ejection portion 16 and the fixing plate 17 are arranged between the substrate 11 held by the substrate holding portion 24 and the rotating table 21. As described below, the fixing plate 17 is fixed at a position where the upper surface thereof faces the processing surface S1 of the substrate 11 held by the substrate holding portion 24 at an interval.

基板11之取出置入係藉由裝載機構15如上所述般通過上部開口12a進行。裝載機構15自收納盒(省略圖示)取出作為處理對象之基板11，將基板11移動至由基板保持部24支持之位置。收納盒中，以處理面S1向上之姿勢收納基板11。因此，裝載機構15自收納盒取出基板11後，將基板11上下翻轉使處理面S1向下。又，裝載機構15自殼體12內取出處理後之基板11後，將基板11上下翻轉使處理面S1向上後，將基板11返回至收納盒。The removal and placement of the substrate 11 is performed by the loading mechanism 15 through the upper opening 12a as described above. The loading mechanism 15 takes out the substrate 11 to be processed from a storage box (not shown), and moves the substrate 11 to a position supported by the substrate holding portion 24. In the storage box, the substrate 11 is stored with the processing surface S1 upward. Therefore, after the loading mechanism 15 takes out the substrate 11 from the storage box, the substrate 11 is turned upside down so that the processing surface S1 faces downward. In addition, after the loading mechanism 15 takes out the processed substrate 11 from the housing 12, the substrate 11 is turned upside down so that the processing surface S1 is upward, and the substrate 11 is returned to the storage box.

於殼體12之上方配置有鹵素燈加熱器19。鹵素燈加熱器19以向下放射紅外線之姿勢設置。如圖1所示，該鹵素燈加熱器19藉由移動機構32在配置於上部開口12a之上方而加熱基板11的加熱位置與為了自上部開口12a進行基板11之取出置入而自上部開口12a之上方退避的退避位置之間於水平方向上移動。加熱位置之鹵素燈加熱器19配置於與上部開口12a之周緣之間形成較小之間隙之高度。再者，圖1中，為方便圖示，誇張描繪加熱位置處之鹵素燈加熱器19與上部開口12a之周緣之間之間隙。又，該例中，使鹵素燈加熱器19於水平方向移動而位於加熱位置與退避位置，亦可以使其自上部開口12a朝上方離開從而不妨礙基板11之取出置入的位置作為退避位置，藉由移動機構32使鹵素燈加熱器19於上下方向移動。A halogen lamp heater 19 is arranged above the casing 12. The halogen lamp heater 19 is installed in a posture that emits infrared rays downward. As shown in FIG. 1, the halogen lamp heater 19 is arranged above the upper opening 12a by the moving mechanism 32 to heat the heating position of the substrate 11 and from the upper opening 12a for the removal and placement of the substrate 11 from the upper opening 12a. Move in the horizontal direction between the retreat positions of the upper retreat. The halogen lamp heater 19 at the heating position is arranged at a height that forms a small gap with the periphery of the upper opening 12a. Furthermore, in FIG. 1, for the convenience of illustration, the gap between the halogen lamp heater 19 at the heating position and the periphery of the upper opening 12a is exaggeratedly depicted. Also, in this example, the halogen lamp heater 19 is moved in the horizontal direction to be located at the heating position and the retreat position, and it may be moved upward from the upper opening 12a so as not to hinder the removal and placement of the substrate 11 as the retreat position. The halogen lamp heater 19 is moved in the vertical direction by the moving mechanism 32.

於藉由基板處理裝置10對基板11進行處理時，鹵素燈加熱器19藉由移動機構32位於加熱位置。加熱位置之鹵素燈加熱器19通過上部開口12a對位於其正下方之基板11之背面S2(與處理面S1為相反側之面)照射紅外線加熱基板11。鹵素燈加熱器19於以氣液兩相流體對基板11進行處理時點亮，照射紅外線。因鹵素燈加熱器19與背面S2之間不存在障礙物，因此可有效率地加熱基板11。藉由加熱基板11，促進藉由氣液兩相流體使抗蝕膜氧化分解。When the substrate 11 is processed by the substrate processing apparatus 10, the halogen lamp heater 19 is located at the heating position by the moving mechanism 32. The halogen lamp heater 19 at the heating position irradiates the back surface S2 (the surface opposite to the processing surface S1) of the substrate 11 directly underneath it with infrared rays to heat the substrate 11 through the upper opening 12a. The halogen lamp heater 19 lights up when the substrate 11 is processed with a gas-liquid two-phase fluid, and irradiates infrared rays. Since there is no obstacle between the halogen lamp heater 19 and the back surface S2, the substrate 11 can be heated efficiently. By heating the substrate 11, the oxidative decomposition of the resist film by the gas-liquid two-phase fluid is promoted.

再者，該例中，使用鹵素燈加熱器19作為加熱器，亦可使用其他各種加熱器。又，於可自上部開口12a向上方充分遠離地配置鹵素燈加熱器19之情形時，亦可省略移動機構32，使鹵素燈加熱器19之位置固定。In addition, in this example, the halogen lamp heater 19 is used as a heater, and other various heaters may be used. In addition, when the halogen lamp heater 19 can be arranged sufficiently away from the upper opening 12a upward, the moving mechanism 32 may be omitted, and the position of the halogen lamp heater 19 may be fixed.

於殼體12內設置有導引筒34。該例中之導引筒34係其上部隨著朝向上方直徑漸窄之錐形狀的筒狀。導引筒34例如固定於殼體12，其軸心經調整與旋轉台21之旋轉中心一致。又，導引筒34之下端到達殼體12之底面12b。於導引筒34之上部之開口34a內配置有旋轉台21。開口34a之內徑為略大於旋轉台21之外徑之程度，使旋轉台21與導引筒34之間之間隙較小。該導引筒34於與殼體12之間形成排出之通路。又，藉由設置該導引筒34，防止因旋轉台21之旋轉捲起微粒，抑制微粒附著於基板11，又，防止處理液或其氣化物流向驅動軸22及軸承25等機構部。A guide cylinder 34 is provided in the housing 12. The guide tube 34 in this example is a cylindrical tube with a tapered shape whose upper part becomes smaller in diameter as it goes upward. The guide cylinder 34 is fixed to the housing 12, for example, and its axis is adjusted to coincide with the rotation center of the rotating table 21. In addition, the lower end of the guide tube 34 reaches the bottom surface 12 b of the housing 12. A rotating table 21 is arranged in the opening 34a of the upper portion of the guide cylinder 34. The inner diameter of the opening 34a is slightly larger than the outer diameter of the rotating table 21, so that the gap between the rotating table 21 and the guide cylinder 34 is small. The guide tube 34 forms a discharge passage between the guide tube 34 and the housing 12. In addition, by providing the guide tube 34, particles are prevented from being rolled up by the rotation of the turntable 21, the particles are prevented from adhering to the substrate 11, and the flow of the processing liquid or its vapor to the drive shaft 22, the bearing 25 and other mechanical parts is prevented.

排出部20包含上述作為擷取口之上部開口12a、形成於殼體12之底面12b之排出口37、抽吸機38等。作為抽吸機38，例如使用泵，經由配管39連接於排出口37。排出部20藉由抽吸機38之驅動產生壓力差，使排出口37之壓力較基板11與固定板17之間及上部開口12a小。藉此，將自基板11與固定板17之間流出之各種氣體、處理液或其飛沫、進而因處理產生之微粒等異物有效率地導向排出口37，並排出至殼體12之外部。於抽吸機38設置有分離機構，將自排出口37抽吸之氣體與液體分離排出。The discharge portion 20 includes the above-mentioned upper opening 12a as the extraction port, a discharge port 37 formed on the bottom surface 12b of the housing 12, a suction machine 38, and the like. As the suction machine 38, a pump is used, for example, and is connected to the discharge port 37 via a pipe 39. The discharge portion 20 is driven by the suction machine 38 to generate a pressure difference, so that the pressure of the discharge port 37 is smaller than that between the base plate 11 and the fixed plate 17 and the upper opening 12a. Thereby, various gases, processing liquids or their droplets flowing out from between the substrate 11 and the fixing plate 17 and foreign substances such as particles generated by the processing are efficiently guided to the discharge port 37 and discharged to the outside of the casing 12. The suction machine 38 is provided with a separation mechanism to separate and discharge the gas and liquid sucked from the discharge port 37.

又，藉由利用上述壓力差自上部開口12a向殼體12內擷取外部氣體，形成自上部開口12a通過殼體12與導引筒34之間朝向排出口37之氣流(圖1之箭頭F)。藉此，防止臭氧氣體、處理液及處理液之氣化物、微粒等異物經由上部開口12a漏出至殼體12之外部，並且將自基板11與固定板17之間流出之各種氣體、處理液、微粒等異物有效率地導向排出口37，並排出至殼體12之外部。In addition, by using the above-mentioned pressure difference to extract external air from the upper opening 12a into the casing 12, an air flow from the upper opening 12a through the casing 12 and the guide tube 34 toward the discharge port 37 is formed (arrow F in FIG. 1 ). Thereby, foreign matter such as ozone gas, processing liquid and vapors and particles of the processing liquid are prevented from leaking to the outside of the housing 12 through the upper opening 12a, and various gases, processing liquids, and other gases flowing out between the substrate 11 and the fixed plate 17 are prevented Foreign matter such as particles is efficiently guided to the discharge port 37 and discharged to the outside of the casing 12.

就利用自上向下流動之氣流將自基板11與固定板17之間流出之氣體、液體、微粒等導向排出口37之觀點而言，構成排出部20之擷取口設置於較由基板保持部24保持之基板11之處理面S1高之位置即可。又，就將自基板11與固定板17之間流出之氣體、液體、微粒等導向排出口37之觀點而言，排出口37設置於較固定板17之上表面低之位置即可。再者，考慮到自旋轉台21上流下之臭氧水，亦較佳為於較旋轉台之上表面低之位置設置排出口37。From the viewpoint of the gas, liquid, particles, etc. flowing out between the substrate 11 and the fixed plate 17 to the discharge port 37 by the airflow flowing from top to bottom, the extraction port constituting the discharge portion 20 is arranged at a position which is more retained by the substrate The position where the processing surface S1 of the substrate 11 held by the portion 24 is high is sufficient. In addition, from the viewpoint of guiding the gas, liquid, particles, etc. flowing out between the substrate 11 and the fixed plate 17 to the discharge port 37, the discharge port 37 may be provided at a position lower than the upper surface of the fixed plate 17. Furthermore, considering the ozone water flowing down from the rotating table 21, it is also preferable to provide a discharge port 37 at a position lower than the upper surface of the rotating table.

因此，例如於設為處理中將上部開口12a氣密地封閉之構成之情形時，於較由殼體12之側面之基板保持部24所保持之基板11之處理面S1高的位置，設置作為擷取口之1個或複數個開口。又，亦可設為自貫通殼體12之管道之一端之開口向殼體12內導入外部氣體之構成，於該情形時，將管道之一端之開口設置於較由基板保持部24所保持之基板11之處理面S1高之位置即可。又，將自基板11與固定板17之間流出之氣體、液體、微粒等導向排出口37之觀點而言，例如亦可於較殼體12之側面之固定板17(或旋轉台21)之上表面低之位置設置排出口37。Therefore, for example, when the upper opening 12a is airtightly closed during processing, the processing surface S1 of the substrate 11 held by the substrate holding portion 24 on the side surface of the housing 12 is set higher than the processing surface S1 One or more openings of the extraction port. Alternatively, it may be configured to introduce external air from an opening at one end of a pipe penetrating through the housing 12 into the housing 12. In this case, the opening at one end of the pipe is set to be higher than that held by the substrate holding portion 24. The position where the processing surface S1 of the substrate 11 is high is sufficient. In addition, from the viewpoint of guiding the gas, liquid, particles, etc., flowing out between the substrate 11 and the fixed plate 17 to the discharge port 37, for example, it may also be on the fixed plate 17 (or the rotating table 21) on the side of the housing 12 A discharge port 37 is provided at a lower position on the upper surface.

於將基板11之處理面S1保持為向上之姿勢進行處理之情形時，固定板17配置於基板11之處理面S1之上方。於該情形時，構成排出部20之擷取口設置於較固定板17之下表面高之位置，排出口37設置於較所保持之基板11之處理面S1低之位置即可。When the processing surface S1 of the substrate 11 is maintained in an upward posture for processing, the fixing plate 17 is arranged above the processing surface S1 of the substrate 11. In this case, the extraction port constituting the discharge portion 20 may be provided at a position higher than the lower surface of the fixing plate 17, and the discharge port 37 may be provided at a position lower than the processing surface S1 of the substrate 11 held.

再者，於設為將上部開口12a氣密地封閉之構成之情形時，藉由將上部開口12a以紅外線之透過率較高之例如石英玻璃封閉，便可使用鹵素燈加熱器19等自殼體12之外側加熱基板11。Furthermore, when the upper opening 12a is airtightly closed, by sealing the upper opening 12a with a high infrared transmittance, such as quartz glass, a halogen lamp heater 19 or the like can be used. The substrate 11 is heated on the outer side of the body 12.

圖2中，混合器29形成為於內部形成有中空部29a之例如圓柱形狀。如上所述，該混合器29於上表面形成有構成噴出部16之複數個噴出孔30。各噴出孔30形成為於厚度方向貫通混合器29之上表面之孔。於圖3中表示一例，混合器29之上表面之各噴出孔30係以使氣液兩相流體於基板11之處理面S1上均勻流動之方式配置。In FIG. 2, the mixer 29 is formed in, for example, a cylindrical shape in which a hollow part 29a is formed. As described above, the mixer 29 has a plurality of ejection holes 30 forming the ejection portion 16 formed on the upper surface. Each ejection hole 30 is formed as a hole penetrating the upper surface of the mixer 29 in the thickness direction. An example is shown in FIG. 3, the ejection holes 30 on the upper surface of the mixer 29 are arranged in such a way that the gas-liquid two-phase fluid flows uniformly on the processing surface S1 of the substrate 11.

固定板17為直徑略小於基板11之圓盤狀，配置於保持具24a之內周側。該固定板17之直徑可根據保持基板11之基板保持部24之構成等適當變更，較佳為與基板11相同程度或其以上。固定板17於其中央部形成有貫通孔17a。藉由於該貫通孔17a嵌合固定混合器29，固定板17與旋轉台21同軸地固定於固定軸28。又，藉由以此種方式將固定板17與混合器29固定，於與基板11之中央部對向之固定板17之中央部配置噴出部16。又，該例中，以混合器29之上表面成為與固定板17之上表面S3相同高度之方式固定混合器29與固定板17。固定板17之上表面S3平坦。The fixing plate 17 has a disc shape with a diameter slightly smaller than that of the base plate 11, and is arranged on the inner peripheral side of the holder 24a. The diameter of the fixing plate 17 can be appropriately changed according to the structure of the substrate holding portion 24 holding the substrate 11 and the like, and is preferably the same as or greater than the substrate 11. The fixing plate 17 has a through hole 17a formed in the center portion thereof. By fitting and fixing the mixer 29 through the through hole 17 a, the fixing plate 17 and the rotating table 21 are fixed to the fixing shaft 28 coaxially. In addition, by fixing the fixing plate 17 and the mixer 29 in this manner, the ejection portion 16 is arranged at the central portion of the fixing plate 17 facing the central portion of the substrate 11. In this example, the mixer 29 and the fixed plate 17 are fixed so that the upper surface of the mixer 29 becomes the same height as the upper surface S3 of the fixed plate 17. The upper surface S3 of the fixing plate 17 is flat.

鉛直方向上，固定板17之上表面S3與由各保持具24a保持之基板11之處理面S1之間隔開間隔D相對。藉此，於上表面S3與處理面S1之間形成供臭氧氣體與臭氧水之氣液兩相流體流動之流路41。作為流路41之高度之間隔D例如可藉由增減由各保持具24a支持之基板11之處理面S1之位置、即保持具24a之階差之高度調整。間隔D例如設定為1 mm左右。該間隔D較佳為0.5 mm～3 mm之範圍內，更佳為1 mm～2 mm之範圍內。若間隔D為0.5 mm以上，則可容易地回避基板11與固定板17之接觸進行處理，若為3 mm以下，則可於流路41內容易地獲得氣液兩相流之如下所述之期望之流動樣式。又，若為1 mm以上，則可顯著降低基板11與固定板17之接觸之危險性，若為2 mm以下，則可藉由較少之臭氧水容易地形成所期望之流動樣式之高速流動。In the vertical direction, the upper surface S3 of the fixing plate 17 and the processing surface S1 of the substrate 11 held by each holder 24a are opposed to each other with an interval D. Thereby, a flow path 41 for the gas-liquid two-phase fluid of ozone gas and ozone water to flow is formed between the upper surface S3 and the processing surface S1. The interval D as the height of the flow path 41 can be adjusted, for example, by increasing or decreasing the position of the processing surface S1 of the substrate 11 supported by each holder 24a, that is, the height of the step difference of the holder 24a. The interval D is set to about 1 mm, for example. The interval D is preferably in the range of 0.5 mm to 3 mm, more preferably in the range of 1 mm to 2 mm. If the interval D is 0.5 mm or more, the contact between the substrate 11 and the fixing plate 17 can be easily avoided for processing, and if it is 3 mm or less, the gas-liquid two-phase flow can be easily obtained in the flow path 41 as follows Expected flow style. In addition, if the thickness is 1 mm or more, the risk of contact between the substrate 11 and the fixing plate 17 can be significantly reduced, and if it is 2 mm or less, the desired high-speed flow can be easily formed with less ozone water. .

混合器29於其中空部29a之下部分別連接有供給管31a～31d之一端。供給管31a～31d之另一端連接於供給部18。供給部18包含臭氧氣體供給部18a、臭氧水供給部18b、純水供給部18c、藥液供給部18d。臭氧氣體供給部18a經由供給管31a對混合器29供給臭氧氣體，臭氧水供給部18b經由供給管31b對混合器29供給使臭氧溶解於純水而成之臭氧水。該等臭氧氣體與臭氧水之供給同時進行。又，純水供給部18c經由供給管31c對混合器29供給純水，藥液供給部18d經由供給管31d對混合器29供給藥液。作為藥液，使用用以去除處理面S1之微粒等異物者，例如作為過氧化氫與氨之混合水溶液之SC1(Standard Clean 1，標準清潔液1)。In the mixer 29, one end of the supply pipes 31a to 31d is respectively connected to the lower part of the hollow part 29a. The other ends of the supply pipes 31 a to 31 d are connected to the supply part 18. The supply unit 18 includes an ozone gas supply unit 18a, an ozone water supply unit 18b, a pure water supply unit 18c, and a chemical solution supply unit 18d. The ozone gas supply unit 18a supplies ozone gas to the mixer 29 via the supply pipe 31a, and the ozone water supply unit 18b supplies ozone water in which ozone is dissolved in pure water to the mixer 29 via the supply pipe 31b. The ozone gas and ozone water are supplied simultaneously. In addition, the pure water supply unit 18c supplies pure water to the mixer 29 via the supply pipe 31c, and the chemical solution supply unit 18d supplies the chemical solution to the mixer 29 via the supply pipe 31d. As the chemical solution, one used to remove foreign matter such as particles on the treatment surface S1, for example, SC1 (Standard Clean 1), which is a mixed aqueous solution of hydrogen peroxide and ammonia.

亦可設置對來自臭氧水供給部18b之臭氧水添加添加劑之添加部。作為對臭氧水添加之添加劑，例如可列舉有助於增加羥基(OH)自由基從而提高抗蝕膜之去除速率之氨(NH4 OH)、過氧化氫(H2 O2 )及異丙醇(IPA)及該等之組合。An addition part for adding additives to ozone water from the ozone water supply part 18b may also be provided. As additives added to ozone water, for example, ammonia (NH 4 OH), hydrogen peroxide (H 2 O 2 ), and isopropanol that help increase hydroxyl (OH) radicals and improve the removal rate of the resist film (IPA) and combinations of these.

混合器29使被供給之臭氧氣體與臭氧水於中空部29a內混合，產生氣液兩相流體。以混合器29產生之氣液兩相流體自各噴出孔30噴出至流路41內。又，各噴出孔30藉由混合器29被供給純水，將純水噴出至流路41內，藉由混合器29被供給藥液，將藥液噴出至流路41內。自噴出部16供給之氣液兩相流體、純水、藥液一面沿基板11之周向擴散一面向外周流動。The mixer 29 mixes the supplied ozone gas and ozone water in the hollow part 29a to generate a gas-liquid two-phase fluid. The gas-liquid two-phase fluid generated by the mixer 29 is ejected from each ejection hole 30 into the flow path 41. In addition, each spray hole 30 is supplied with pure water by the mixer 29 to spray the pure water into the flow path 41, and is supplied with the chemical liquid by the mixer 29, and the chemical liquid is discharged into the flow path 41. The gas-liquid two-phase fluid, pure water, and chemical liquid supplied from the ejection unit 16 flow toward the outer periphery while spreading in the circumferential direction of the substrate 11.

基板處理裝置10中，如上所述，於流路41中使氣液兩相流體流動，使基板11之處理面S1之各部交替地暴露於臭氧氣體與臭氧水，藉此與僅使用臭氧水之情形時相比，獲得較高之抗蝕膜之去除速率。因此，流路41中之氣液兩相流體於基板11之處理面S1上作為臭氧氣體(氣相)與臭氧水(液相)交替流動之間歇流之形式流動。如圖4所示，以基板11之處理面S1與固定板17之上表面S3形成之流路41中之氣液兩相流體之流動至少為臭氧氣體之大氣泡46與臭氧水之液體部47於流路41之上部交替流動。作為此種氣液兩相流之流動樣式，例如可列舉汽包流。又，如圖5所示，氣液兩相流體之流動亦可為擴散充滿流路41之高度之大氣泡48與液體部49交替流動之間歇流。為了設為如上所述之氣液兩相流，根據流路41之高度(間隔D)調整臭氧氣體流量與臭氧水流量之比率及總流量。In the substrate processing apparatus 10, as described above, the gas-liquid two-phase fluid flows in the flow path 41 to alternately expose each part of the processing surface S1 of the substrate 11 to ozone gas and ozone water. Compared with the situation, the removal rate of the resist film is higher. Therefore, the gas-liquid two-phase fluid in the flow path 41 flows on the processing surface S1 of the substrate 11 as an intermittent flow in which ozone gas (gas phase) and ozone water (liquid phase) flow alternately. As shown in FIG. 4, the flow of the gas-liquid two-phase fluid in the flow path 41 formed by the processing surface S1 of the substrate 11 and the upper surface S3 of the fixing plate 17 is at least the large bubbles 46 of ozone gas and the liquid portion 47 of ozone water. It flows alternately on the upper part of the flow path 41. As the flow pattern of such a gas-liquid two-phase flow, for example, a steam drum flow can be cited. In addition, as shown in FIG. 5, the flow of the gas-liquid two-phase fluid may also be an intermittent flow in which the large bubbles 48 and the liquid part 49 which diffuse and fill the height of the flow path 41 alternately flow. In order to set the gas-liquid two-phase flow as described above, the ratio of the ozone gas flow rate to the ozone water flow rate and the total flow rate are adjusted according to the height (interval D) of the flow path 41.

其次，對上述構成之作用進行說明。再者，以下說明之順序為一例，並不限定處理順序。設為抽吸機38始終驅動，對殼體12內進行抽吸之狀態。設為鹵素燈加熱器19藉由移動機構32移動至退避位置之狀態。此後，如圖6所示，藉由裝載機構15自盒中取出作為處理對象之基板11(步驟ST1)。基板11係以處理面S1向上之方式收納於盒中，因此裝載機構15使取出之基板11翻轉180°，使處理面S1向下(步驟ST2)。Next, the function of the above configuration will be explained. In addition, the order described below is an example, and the processing order is not limited. It is assumed that the suction machine 38 is always driven to suck the inside of the housing 12. It is assumed that the halogen lamp heater 19 is moved to the retracted position by the moving mechanism 32. Thereafter, as shown in FIG. 6, the substrate 11 to be processed is taken out from the cassette by the loading mechanism 15 (step ST1). The substrate 11 is stored in the box with the processing surface S1 facing upwards, so the loading mechanism 15 turns the taken out substrate 11 by 180°, and the processing surface S1 faces downwards (step ST2).

藉由裝載機構15，將翻轉之基板11通過上部開口12a移動至殼體12內之旋轉台21上，將該基板11之周緣載置於各保持具24a之階差。解除裝載機構15對基板11之保持後，使各保持具24a進行作動，成為藉由各保持具24a保持基板11之狀態(步驟ST3)。藉此，基板11以處理面S1向下且與固定板17之上表面S3隔開間隔之方式固定於旋轉台21。With the loading mechanism 15, the inverted substrate 11 is moved to the rotating table 21 in the housing 12 through the upper opening 12a, and the periphery of the substrate 11 is placed on the level difference of each holder 24a. After releasing the holding of the substrate 11 by the loading mechanism 15, each holder 24a is actuated, and the substrate 11 is held by each holder 24a (step ST3). Thereby, the substrate 11 is fixed to the rotating table 21 in such a manner that the processing surface S1 faces downward and is spaced apart from the upper surface S3 of the fixing plate 17.

基板11固定後，鹵素燈加熱器19藉由移動機構32移動至加熱位置。其後，驅動電動馬達23，旋轉台21開始與基板11一體旋轉(步驟ST4)。After the substrate 11 is fixed, the halogen lamp heater 19 is moved to the heating position by the moving mechanism 32. After that, the electric motor 23 is driven, and the turntable 21 starts to rotate integrally with the substrate 11 (step ST4).

旋轉台21之旋轉開始後，臭氧氣體供給部18a開始供給臭氧氣體，與此同時地，臭氧水供給部18b開始供給臭氧水(步驟ST5)。此時，臭氧水例如藉由臭氧水供給部18b預先加熱至70℃左右後供給。臭氧水中之臭氧之濃度例如為100 ppm以上500 ppm以下之範圍內，供給量例如為2 L(升)/分鐘以上20 L/分鐘以下之範圍內，臭氧氣體之流量例如調整為20 L/分鐘以下。再者，上述臭氧水中之臭氧濃度、臭氧水及臭氧氣體之供給量之範圍為一例，並不限定於該等範圍。After the rotation of the turntable 21 starts, the ozone gas supply unit 18a starts supplying ozone gas, and at the same time, the ozone water supply unit 18b starts supplying ozone water (step ST5). At this time, the ozone water is supplied after being preheated to about 70°C by the ozone water supply unit 18b, for example. The concentration of ozone in ozone water is, for example, within the range of 100 ppm to 500 ppm, the supply amount is, for example, within the range of 2 L (liter)/minute to 20 L/minute, and the flow rate of ozone gas is adjusted to, for example, 20 L/minute. the following. In addition, the range of the ozone concentration in the ozone water, the supply amount of ozone water, and the ozone gas is an example, and is not limited to these ranges.

進而，點亮鹵素燈加熱器19(步驟ST6)。藉由點亮該鹵素燈加熱器19，自背面S2側將基板11加熱至特定溫度。此時之基板11之溫度例如為30℃～100℃之範圍內。Furthermore, the halogen lamp heater 19 is turned on (step ST6). By lighting the halogen lamp heater 19, the substrate 11 is heated to a specific temperature from the side of the back surface S2. The temperature of the substrate 11 at this time is, for example, in the range of 30°C to 100°C.

來自臭氧氣體供給部18a之臭氧氣體與來自臭氧水供給部18b之臭氧水經由供給管31a、31b供給至混合器29。藉此，所供給之臭氧氣體與臭氧水於混合器29之中空部29a混合，自各噴出孔30作為氣液兩相流體供給至由基板11之處理面S1與固定板17之上表面S3形成之流路41。氣液兩相流體於流路41中流動，藉由基板11之旋轉一面沿周向擴散，一面向基板11之外周流動。The ozone gas from the ozone gas supply unit 18a and the ozone water from the ozone water supply unit 18b are supplied to the mixer 29 via the supply pipes 31a and 31b. Thereby, the supplied ozone gas and ozone water are mixed in the hollow portion 29a of the mixer 29, and supplied as a gas-liquid two-phase fluid from each ejection hole 30 to the processing surface S1 of the substrate 11 and the upper surface S3 of the fixing plate 17. Stream 41. The gas-liquid two-phase fluid flows in the flow path 41, and when the substrate 11 rotates, it spreads in the circumferential direction and flows toward the outer circumference of the substrate 11.

藉由以此種方式使氣液兩相流體於流路41中流動，對處理面S1之整個面供給氣液兩相流體，處理面S1之各部交替暴露於臭氧氣體與臭氧水。藉此，將抗蝕膜氧化分解，逐漸去除。推測係由於基板11之表面附近產生亂流，故而邊界層變薄，臭氧到達基板11之量增加，因此去除速率變高。又，藉由鹵素燈加熱器19加熱基板11，因此促進利用臭氧使抗蝕膜氧化分解。By flowing the gas-liquid two-phase fluid in the flow path 41 in this way, the gas-liquid two-phase fluid is supplied to the entire processing surface S1, and each part of the processing surface S1 is alternately exposed to ozone gas and ozone water. Thereby, the resist film is oxidized and decomposed and gradually removed. It is presumed that turbulent flow is generated near the surface of the substrate 11, so that the boundary layer becomes thinner, and the amount of ozone reaching the substrate 11 increases, so the removal rate becomes higher. In addition, since the substrate 11 is heated by the halogen lamp heater 19, the oxidative decomposition of the resist film by ozone is promoted.

當氣液兩相流體到達基板11之外周時，藉由壓力差被導向排出口37排出。因此，氣液兩相流體之臭氧氣體及臭氧水不會自上部開口12a漏出至殼體12之外側。又，離開處理面S1之微粒等與上述氣液兩相流體共同被搬送至基板11之外側，藉由來自上部開口12a之氣流自排出口37排出。When the gas-liquid two-phase fluid reaches the outer periphery of the substrate 11, it is guided to the discharge port 37 and discharged by the pressure difference. Therefore, the ozone gas and ozone water of the gas-liquid two-phase fluid will not leak from the upper opening 12a to the outside of the casing 12. In addition, the particles and the like leaving the processing surface S1 are conveyed to the outside of the substrate 11 together with the above-mentioned gas-liquid two-phase fluid, and are discharged from the discharge port 37 by the air flow from the upper opening 12a.

當距開始供給氣液兩相流體經過特定處理時間時(步驟ST7中為「是(YES)」)，熄滅鹵素燈加熱器19(步驟ST8)，並且停止供給臭氧氣體及臭氧水(步驟ST9)。特定處理時間預先設定為可完全去除抗蝕膜之時間。When the specific processing time has elapsed since the start of supply of the gas-liquid two-phase fluid ("YES" in step ST7), the halogen lamp heater 19 is turned off (step ST8), and the supply of ozone gas and ozone water is stopped (step ST9) . The specific processing time is set in advance as the time for which the resist film can be completely removed.

繼而，進行第1次純水沖洗處理(步驟ST10)。自純水供給部18c經由供給管31c對混合器29供給純水，該純水自各噴出孔30供給至流路41。純水藉由基板11之旋轉於處理面S1上一面沿周向擴散，一面向基板11之外周流動。如此，對處理面S1之整個面供給純水將其洗淨。經過特定時間後，停止純水之供給。再者，亦可省略該第1次純水沖洗處理。Then, the first pure water rinsing process is performed (step ST10). The pure water is supplied to the mixer 29 from the pure water supply part 18 c via the supply pipe 31 c, and the pure water is supplied to the flow path 41 from each spray hole 30. The pure water spreads in the circumferential direction on the processing surface S1 by the rotation of the substrate 11 and flows toward the outer circumference of the substrate 11. In this way, pure water is supplied to the entire processing surface S1 to wash it. After a certain period of time, the supply of pure water is stopped. In addition, the first pure water rinsing treatment may be omitted.

其次，為了去除微粒，進行藥液處理(步驟ST11)。藥液處理中，來自藥液供給部18d之藥液經由供給管31d、混合器29、噴出孔30供給至流路41。藉此，對處理面S1供給藥液，該藥液藉由基板11之旋轉，於處理面S1上一面沿周向擴散，一面向基板11之外周流動。如此，對處理面S1之整個面供給藥液，去除處理面S1上之微粒。藥液視其種類加溫。例如，於藥液為SC1之情形時，將SC1加溫至40℃～80℃供給，於30秒～60秒之處理時間後停止供給藥液。Next, in order to remove particles, a chemical liquid treatment is performed (step ST11). In the chemical liquid treatment, the chemical liquid from the chemical liquid supply part 18d is supplied to the flow path 41 via the supply pipe 31d, the mixer 29, and the ejection hole 30. Thereby, the chemical liquid is supplied to the processing surface S1, and the chemical liquid is spread on the processing surface S1 in the circumferential direction by the rotation of the substrate 11 and flows toward the outer periphery of the substrate 11. In this way, the chemical solution is supplied to the entire surface of the processing surface S1, and the particles on the processing surface S1 are removed. The liquid medicine is heated according to its type. For example, when the chemical solution is SC1, the SC1 is heated to 40°C to 80°C and supplied, and the chemical solution supply is stopped after a treatment time of 30 seconds to 60 seconds.

藥液處理後，進行第2次純水沖洗處理(步驟ST12)。與第1次純水沖洗處理同樣地，對流路41供給純水，從而對處理面S1之整個面供給純水將其洗淨。經過特定時間後停止供給純水。After the chemical solution treatment, the second pure water rinsing treatment is performed (step ST12). As in the first pure water rinsing treatment, pure water is supplied to the flow path 41, and pure water is supplied to the entire processing surface S1 to wash it. After a certain period of time, the supply of pure water is stopped.

純水沖洗處理後，增大旋轉台21之旋轉速度、即基板11之旋轉速度，進行基板11之旋轉乾燥(步驟ST13)。藉此，藉由離心力甩出附著於基板11之兩面之純水，使基板11乾燥。After the pure water rinse treatment, the rotation speed of the turntable 21, that is, the rotation speed of the substrate 11 is increased, and the substrate 11 is spin-dried (step ST13). Thereby, the pure water attached to both sides of the substrate 11 is thrown out by centrifugal force, and the substrate 11 is dried.

再者，藥液處理、純水沖洗處理、及旋轉乾燥中，自基板11及旋轉台21流出之藥液及純水、進而附著於殼體12之內壁而流下之藥液及純水被抽吸至排出口37排出。又，即便產生藥液及純水之微小飛沫，該飛沫亦藉由來自上部開口12a之氣流被導向排出口37。因此，藥液及純水之飛沫不會自上部開口12a漏出。Furthermore, in the chemical treatment, pure water rinsing treatment, and spin drying, the chemical and pure water flowing from the substrate 11 and the rotating table 21, and the chemical and pure water that adhere to the inner wall of the housing 12 and flow down are removed It is sucked to discharge port 37 and discharged. In addition, even if minute droplets of the chemical liquid and pure water are generated, the droplets are guided to the discharge port 37 by the airflow from the upper opening 12a. Therefore, droplets of the chemical liquid and pure water do not leak from the upper opening 12a.

旋轉乾燥結束時，停止電動馬達23，從而停止旋轉台21及基板11之旋轉(步驟ST14)。解除保持具24a對基板11之保持後(步驟ST15)，藉由裝載機構15通過上部開口12a取出基板(步驟ST16)。裝載機構15將基板11翻轉使處理面S1向上(步驟ST17)，將基板11收納至盒中(步驟ST18)。When the spin drying is completed, the electric motor 23 is stopped to stop the rotation of the turntable 21 and the substrate 11 (step ST14). After the holding of the substrate 11 by the holder 24a is released (step ST15), the substrate is taken out through the upper opening 12a by the loading mechanism 15 (step ST16). The loading mechanism 15 inverts the substrate 11 so that the processing surface S1 faces upward (step ST17), and stores the substrate 11 in a cassette (step ST18).

如上，對1片基板11之處理結束，此後以同樣之順序對新基板11進行處理。如上所述，使用氣液兩相流體去除抗蝕膜，其去除速率較高，因此於短時間內對1片基板11進行處理。As above, the processing of one substrate 11 is completed, and then the new substrate 11 is processed in the same order. As described above, the use of a gas-liquid two-phase fluid to remove the resist film has a high removal rate, so one substrate 11 is processed in a short time.

將測定藉由如上構成之基板處理裝置10去除抗蝕膜時抗蝕膜之去除速度所得的結果(符號G1)表示於圖7中。又，圖7中，一併表示測定使用臭氧水時抗蝕膜之去除速度之結果(符號G2)。再者，以臭氧水去除抗蝕膜時之基板處理裝置之構成與基板處理裝置10相同，代替氣液兩相流體，僅使臭氧水於流路41中流動。根據其結果可知，藉由使用氣液兩相流體去除抗蝕膜，獲得較高之去除速率。The result (symbol G1) obtained by measuring the removal rate of the resist film when the resist film is removed by the substrate processing apparatus 10 configured as above is shown in FIG. 7. In addition, FIG. 7 also shows the result of measuring the removal rate of the resist film when ozone water is used (symbol G2). Furthermore, the structure of the substrate processing apparatus when removing the resist film with ozone water is the same as that of the substrate processing apparatus 10, instead of the gas-liquid two-phase fluid, only the ozone water flows in the flow path 41. According to the results, it can be seen that by using a gas-liquid two-phase fluid to remove the resist film, a higher removal rate can be obtained.

上文中，使用內部中空之混合器混合臭氧氣體與臭氧水，但混合器之構成並不限定於此。例如，圖8所示之混合器51於其中空部51a設置有將經由供給管31a、31b供給之臭氧氣體與臭氧水混合攪拌之元件52、53，作為靜態混合器發揮功能。又，亦可自固定板之中央部直接對流路供給臭氧氣體與臭氧水，於流路內混合臭氧氣體與臭氧水。In the above, a hollow mixer is used to mix ozone gas and ozone water, but the configuration of the mixer is not limited to this. For example, the mixer 51 shown in FIG. 8 is provided with elements 52, 53 for mixing and stirring ozone gas and ozone water supplied through the supply pipes 31a, 31b in the hollow portion 51a, and functions as a static mixer. In addition, ozone gas and ozone water may be directly supplied to the flow path from the central part of the fixed plate, and ozone gas and ozone water may be mixed in the flow path.

上述例中，於殼體內設置有1個導引筒，亦可設為如下構成：使各軸心與旋轉台之旋轉中心一致地設置上部開口之高度不同之複數個導引筒，並且使旋轉台以可於形成於各導引筒之上部之各開口內旋轉之方式升降。根據該構成，於最外側之導引筒與殼體之間、及導引筒與導引筒之間形成氣流之複數條路徑。藉此，藉由根據要供給之氣體或處理液之種類，改變旋轉台之高度進行處理，可改變使自旋轉台與基板之間流出之氣體或處理液流動的路徑，將其等分別排出至殼體外。再者，關於此種構成，記載於日本專利特開2012-209559號公報、日本專利特開2007-180268號公報。In the above example, one guide tube is installed in the housing, but it can also be configured as follows: a plurality of guide tubes with different heights of the upper opening are arranged so that each axis is consistent with the rotation center of the rotating table, and the rotation The platform can be raised and lowered in a manner that can rotate in each opening formed on the upper part of each guide cylinder. According to this structure, a plurality of paths of air flow are formed between the outermost guide tube and the housing, and between the guide tube and the guide tube. In this way, by changing the height of the rotating table according to the type of gas or processing liquid to be supplied for processing, it is possible to change the flow path of the gas or processing liquid flowing out between the rotating table and the substrate, and to discharge them respectively to Outside the shell. In addition, this structure is described in Japanese Patent Laid-Open No. 2012-209559 and Japanese Patent Laid-Open No. 2007-180268.

10:基板處理裝置 11:基板 12:殼體 12a:上部開口 12b:底面 14:旋轉機構部 15:裝載機構 16:噴出部 17:固定板 18:供給部 18a:臭氧氣體供給部 18b:臭氧水供給部 18c:純水供給部 18d:藥液供給部 19:鹵素燈加熱器 20:排出部 21:旋轉台 21a:貫通孔 22:驅動軸 22a:貫通孔 23:電動馬達 23a:皮帶輪 24:基板保持部 24a:保持具 25:軸承 26:皮帶輪 27:皮帶 28:固定軸 28a:中空部 29:混合器 29a:中空部 30:噴出孔 31:供給管部 31a:供給管 31b:供給管 31c:供給管 31d:供給管 32:移動機構 34:導引筒 34a:開口 37:排出口 38:抽吸機 39:配管 41:流路 46:大氣泡 47:液體部 48:大氣泡 49:液體部 51:混合器 51a:中空部 52:元件 53:元件 S1:處理面 S2:背面 S3:上表面 Z:旋轉軸10: Substrate processing equipment 11: substrate 12: Shell 12a: Upper opening 12b: bottom surface 14: Rotating Mechanism Department 15: Loading mechanism 16: spouting part 17: fixed plate 18: Supply Department 18a: Ozone gas supply unit 18b: Ozone water supply department 18c: Pure water supply unit 18d: Liquid medicine supply part 19: Halogen heater 20: Discharge part 21: Rotating table 21a: Through hole 22: drive shaft 22a: Through hole 23: electric motor 23a: Pulley 24: Board holding part 24a: retainer 25: Bearing 26: Pulley 27: Belt 28: fixed shaft 28a: hollow part 29: mixer 29a: hollow part 30: spout hole 31: Supply pipe department 31a: Supply pipe 31b: Supply pipe 31c: supply pipe 31d: supply pipe 32: mobile mechanism 34: guide tube 34a: opening 37: Outlet 38: suction machine 39: Piping 41: Flow Path 46: Big Bubble 47: Liquid Department 48: Big Bubble 49: Liquid Department 51: mixer 51a: hollow part 52: Components 53: Components S1: Processing surface S2: Back S3: upper surface Z: Rotation axis

圖1係表示基板處理裝置之構成之剖視圖。 圖2係表示混合器及噴出部之構成之剖視圖。 圖3係表示噴出孔之排列之一例之說明圖。 圖4係表示流路內之氣液兩相流體之說明圖。 圖5係表示流路內之氣液兩相流體之另一例之說明圖。 圖6係表示去除抗蝕膜之順序之流程圖。 圖7係表示使用氣液兩相流體去除抗蝕膜之速度與使用臭氧水去除抗蝕膜之速度之圖表。 圖8係表示以靜態混合器作為混合器之例之剖視圖。Fig. 1 is a cross-sectional view showing the structure of a substrate processing apparatus. Fig. 2 is a cross-sectional view showing the structure of the mixer and the ejection section. Fig. 3 is an explanatory diagram showing an example of the arrangement of ejection holes. Fig. 4 is an explanatory diagram showing the gas-liquid two-phase fluid in the flow path. Fig. 5 is an explanatory diagram showing another example of the gas-liquid two-phase fluid in the flow path. Fig. 6 is a flowchart showing the procedure for removing the resist film. FIG. 7 is a graph showing the speed of removing the resist film using a gas-liquid two-phase fluid and the speed of removing the resist film using ozone water. Fig. 8 is a cross-sectional view showing an example in which a static mixer is used as a mixer.

10:基板處理裝置 10: Substrate processing equipment

11:基板 11: substrate

12:殼體 12: Shell

12a:上部開口 12a: Upper opening

12b:底面 12b: bottom surface

14:旋轉機構部 14: Rotating Mechanism Department

15:裝載機構 15: Loading mechanism

16:噴出部 16: spouting part

17:固定板 17: fixed plate

18:供給部 18: Supply Department

19:鹵素燈加熱器 19: Halogen heater

20:排出部 20: Discharge part

21:旋轉台 21: Rotating table

21a:貫通孔 21a: Through hole

22:驅動軸 22: drive shaft

22a:貫通孔 22a: Through hole

23:電動馬達 23: electric motor

23a:皮帶輪 23a: Pulley

24:基板保持部 24: Board holding part

24a:保持具 24a: retainer

25:軸承 25: Bearing

26:皮帶輪 26: Pulley

27:皮帶 27: Belt

28:固定軸 28: fixed shaft

28a:中空部 28a: hollow part

29:混合器 29: mixer

31:供給管部 31: Supply pipe department

32:移動機構 32: mobile mechanism

34:導引筒 34: guide tube

34a:開口 34a: opening

37:排出口 37: Outlet

38:抽吸機 38: suction machine

39:配管 39: Piping

S1:處理面 S1: Processing surface

S2:背面 S2: Back

Claims (9)

一種基板處理裝置，其特徵在於具備： 旋轉機構部，其水平保持基板，使所保持之上述基板繞鉛直軸旋轉； 固定板，其固定於一個面與由上述旋轉機構部保持之上述基板之處理面隔開間隔地相對之位置，於與上述處理面之間形成流路；及 噴出部，其設置於與上述基板之中央部對向之位置，於藉由上述旋轉機構部使上述基板旋轉期間，對上述流路供給臭氧氣體及臭氧水，使混合臭氧氣體與臭氧水而成之氣液兩相流體流動。A substrate processing device, characterized by having: The rotating mechanism part holds the substrate horizontally, so that the held substrate rotates around a vertical axis; A fixed plate, which is fixed to a position where one surface is opposed to the processing surface of the substrate held by the rotating mechanism portion at an interval, and forms a flow path between the processing surface and the processing surface; and The ejection part is provided at a position opposite to the central part of the substrate, and is formed by supplying ozone gas and ozone water to the flow path during the rotation of the substrate by the rotation mechanism part to mix ozone gas and ozone water The gas-liquid two-phase fluid flow. 如請求項1之基板處理裝置，其中上述噴出部使上述氣液兩相流體以汽包流之形式流動。The substrate processing apparatus of claim 1, wherein the ejection portion causes the gas-liquid two-phase fluid to flow in the form of a steam drum flow. 如請求項1或2之基板處理裝置，其中上述固定板之上述一個面平坦。The substrate processing apparatus of claim 1 or 2, wherein the one surface of the fixing plate is flat. 如請求項1之基板處理裝置，其具備加熱器，上述加熱器於使上述氣液兩相流體於上述流路中流動時加熱上述基板。The substrate processing apparatus according to claim 1, including a heater, and the heater heats the substrate when the gas-liquid two-phase fluid flows in the flow path. 如請求項1之基板處理裝置，其中上述旋轉機構部使上述處理面向下地保持上述基板。The substrate processing apparatus according to claim 1, wherein the rotation mechanism section holds the substrate with the processing face down. 一種基板處理方法，其特徵在於具有： 旋轉步驟，其係於使水平保持之基板之處理面與固定之固定板之一個面隔開間隔相對，於上述處理面與上述一個面之間形成有流路的狀態下，使上述基板繞鉛直軸旋轉；及 氣液兩相流體供給步驟，其係於上述旋轉步驟中，自與上述基板之中央部對向之位置對上述流路供給臭氧氣體及臭氧水，使混合臭氧氣體與臭氧水而成之氣液兩相流體流動。A substrate processing method is characterized by having: The rotating step involves making the processing surface of the substrate held horizontally opposed to one surface of the fixed fixing plate at an interval, and in a state where a flow path is formed between the processing surface and the one surface, the substrate is wound vertically Shaft rotation; and A gas-liquid two-phase fluid supply step, which is in the rotation step, supplies ozone gas and ozone water to the flow path from a position opposite to the central part of the substrate to mix ozone gas and ozone water to form a gas liquid Two-phase fluid flow. 如請求項6之基板處理方法，其中上述氣液兩相流體供給步驟使上述氣液兩相流體以汽包流之形式流動。The substrate processing method of claim 6, wherein the gas-liquid two-phase fluid supply step causes the gas-liquid two-phase fluid to flow in the form of a steam drum flow. 如請求項6或7之基板處理方法，其具有於上述氣液兩相流體供給步驟中加熱上述基板之加熱步驟。The substrate processing method of claim 6 or 7, which has a heating step of heating the substrate in the gas-liquid two-phase fluid supply step. 如請求項6之基板處理方法，其中上述旋轉步驟係使將上述處理面向下保持之上述基板旋轉。The substrate processing method of claim 6, wherein the rotating step is to rotate the substrate holding the processing surface downward.
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