TW202035312A - Conduit heating apparatus and method with improved corrosion resistance - Google Patents

Conduit heating apparatus and method with improved corrosion resistance Download PDF

Info

Publication number
TW202035312A
TW202035312A TW109104623A TW109104623A TW202035312A TW 202035312 A TW202035312 A TW 202035312A TW 109104623 A TW109104623 A TW 109104623A TW 109104623 A TW109104623 A TW 109104623A TW 202035312 A TW202035312 A TW 202035312A
Authority
TW
Taiwan
Prior art keywords
annular
heating element
dew point
temperature
cooling fluid
Prior art date
Application number
TW109104623A
Other languages
Chinese (zh)
Inventor
馬汀赫伯特 高樂
尼可拉斯史考特 萊恩
克里斯坦 史文克喬治
Original Assignee
美商康寧公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商康寧公司 filed Critical 美商康寧公司
Publication of TW202035312A publication Critical patent/TW202035312A/en

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B7/00Distributors for the molten glass; Means for taking-off charges of molten glass; Producing the gob, e.g. controlling the gob shape, weight or delivery tact
    • C03B7/02Forehearths, i.e. feeder channels
    • C03B7/06Means for thermal conditioning or controlling the temperature of the glass
    • C03B7/07Electric means
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B7/00Distributors for the molten glass; Means for taking-off charges of molten glass; Producing the gob, e.g. controlling the gob shape, weight or delivery tact
    • C03B7/08Feeder spouts, e.g. gob feeders
    • C03B7/084Tube mechanisms
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B5/00Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
    • C03B5/16Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
    • C03B5/167Means for preventing damage to equipment, e.g. by molten glass, hot gases, batches
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B7/00Distributors for the molten glass; Means for taking-off charges of molten glass; Producing the gob, e.g. controlling the gob shape, weight or delivery tact
    • C03B7/08Feeder spouts, e.g. gob feeders
    • C03B7/094Means for heating, cooling or insulation
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16LPIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
    • F16L53/00Heating of pipes or pipe systems; Cooling of pipes or pipe systems
    • F16L53/70Cooling of pipes or pipe systems
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16LPIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
    • F16L53/00Heating of pipes or pipe systems; Cooling of pipes or pipe systems
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16LPIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
    • F16L58/00Protection of pipes or pipe fittings against corrosion or incrustation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Resistance Heating (AREA)
  • Furnace Details (AREA)

Abstract

A conduit heating apparatus and a method of heating a conduit. The conduit heating apparatus includes an annular heating element circumferentially surrounding at least a portion of the conduit. The annular heating element includes an annular channel and the method includes flowing a cooling fluid therethrough. The annular heating element also includes an interface region extending between the annular channel and a refractory ceramic material contained in an atmosphere. A temperature at a boundary between the interface region the refractory ceramic material is above the dew point of the atmosphere.

Description

具有改良抗腐蝕性之導管加熱設備及方法Catheter heating equipment and method with improved corrosion resistance

本申請案根據專利法主張於2019年2月14日申請之美國臨時申請案序號第62/805,332號之優先權之權益,依據此案之內容並且將此案之內容以其全文引用方式併入本文。This application claims the priority rights of U.S. Provisional Application Serial No. 62/805,332 filed on February 14, 2019 under the Patent Law, based on the content of this case and the content of this case is incorporated by reference in its entirety This article.

本揭示案大體上是關於導管之加熱,如玻璃熔化系統中使用的金屬導管之加熱,並且更具體而言關於具有改良抗腐蝕性的導管之加熱。The present disclosure generally relates to the heating of conduits, such as the heating of metal conduits used in glass melting systems, and more specifically to the heating of conduits with improved corrosion resistance.

在玻璃製品之生產中,如用於顯示應用(包含電視及手持式裝置,如電話及平板電腦)的玻璃片,熔融材料通常經由一或更多個導管傳輸,導管如由貴金屬(如鉑)構成的導管。上述導管可例如藉由電動凸緣直接加熱,電動凸緣包括周向環繞導管的金屬材料。水冷卻通道可幫助管理凸緣之溫度。In the production of glass products, such as glass sheets for display applications (including televisions and handheld devices such as phones and tablet computers), molten materials are usually transported through one or more conduits, such as precious metals (such as platinum) Constitute the catheter. The above-mentioned catheter can be directly heated, for example, by an electric flange, which includes a metal material surrounding the catheter in a circumferential direction. Water cooling channels can help manage the temperature of the flange.

在上述系統中,導管通常被包裝於耐火材料中,如耐火陶瓷材料,其可進一步被包含在受控氛圍(atmosphere)的膠囊中。受控氛圍的膠囊通常為露點(dew point)實質上高於流體冷卻通道之溫度的相對潮濕的環境。當通道之外部與耐火材料直接接觸時,水沿著通道與耐火材料之界面凝結,這可大幅加速通道材料腐蝕,從而不僅縮短通道之使用壽命而且還縮短凸緣之使用壽命。期望找到對這問題的解決方案,而此解決方案實質上不會不利地影響系統操作參數或能力。In the above system, the catheter is usually packaged in a refractory material, such as a refractory ceramic material, which can be further contained in a capsule of a controlled atmosphere. A controlled atmosphere capsule is usually a relatively humid environment with a dew point substantially higher than the temperature of the fluid cooling channel. When the outside of the channel is in direct contact with the refractory material, water condenses along the interface between the channel and the refractory material, which can greatly accelerate the corrosion of the channel material, thereby not only shortening the service life of the channel but also the service life of the flange. It is desirable to find a solution to this problem, and this solution does not substantially adversely affect system operating parameters or capabilities.

本文揭示的實施例包含導管加熱設備。導管加熱設備包含周向環繞導管之至少一部分的環形加熱元件。環形加熱元件包含環形通道,環形通道經配置以使冷卻流體流過其中。環形加熱元件至少部分地被在氛圍中含有的耐火陶瓷材料環繞。氛圍之露點高於冷卻流體之溫度。加熱元件包含界面區域,界面區域包括金屬或金屬合金。界面區域在環形通道與耐火陶瓷材料之間延伸。在界面區域與耐火陶瓷材料之間的邊界處的界面區域之溫度高於氛圍之露點。The embodiments disclosed herein include catheter heating devices. The catheter heating device includes an annular heating element circumferentially surrounding at least a part of the catheter. The annular heating element includes an annular channel that is configured to allow cooling fluid to flow therethrough. The annular heating element is at least partially surrounded by the refractory ceramic material contained in the atmosphere. The dew point of the atmosphere is higher than the temperature of the cooling fluid. The heating element includes an interface area, and the interface area includes a metal or a metal alloy. The interface area extends between the annular channel and the refractory ceramic material. The temperature of the interface area at the boundary between the interface area and the refractory ceramic material is higher than the dew point of the atmosphere.

本文揭示的實施例亦包含加熱導管之方法。方法包含藉由環形加熱元件周向環繞導管之至少一部分的步驟。環形加熱元件包含環形通道及流過其中的冷卻流體。環形加熱元件至少部分地被在氛圍中含有的耐火陶瓷材料環繞。氛圍之露點高於冷卻流體之溫度。加熱元件包含界面區域,界面區域包括金屬或金屬合金。界面區域在環形通道與耐火陶瓷材料之間延伸。在界面區域與耐火陶瓷材料之間的邊界處的界面區域之溫度高於氛圍之露點。The embodiments disclosed herein also include methods of heating the catheter. The method includes the step of circumferentially surrounding at least a part of the catheter by an annular heating element. The annular heating element includes an annular channel and a cooling fluid flowing therethrough. The annular heating element is at least partially surrounded by the refractory ceramic material contained in the atmosphere. The dew point of the atmosphere is higher than the temperature of the cooling fluid. The heating element includes an interface area, and the interface area includes a metal or a metal alloy. The interface area extends between the annular channel and the refractory ceramic material. The temperature of the interface area at the boundary between the interface area and the refractory ceramic material is higher than the dew point of the atmosphere.

本文揭示的實施例之另外的特徵及優點將於以下的實施方式中記載,並且部分地對於本領域熟知技術者而言從此實施方式將為顯而易見的,或藉由實踐本文所述的實施例而認知,本文包含以下的實施方式、申請專利範圍以及附圖。The additional features and advantages of the embodiments disclosed herein will be described in the following embodiments, and part of them will be apparent to those skilled in the art from this embodiment, or by practicing the embodiments described herein Acknowledge that this article contains the following embodiments, the scope of patent application and drawings.

應理解,前述一般性描述及以下實施方式兩者呈現欲提供用於理解本案所主張的實施例之本質及特性的概要或架構的實施例。本文包含附圖以提供進一步理解,並且附圖併入此說明書中且構成此說明書之部分。圖式繪示本揭示案之各種實施例,且圖式與說明一起用以解釋各種實施例之原理及操作。It should be understood that both the foregoing general description and the following embodiments present embodiments intended to provide a summary or architecture for understanding the essence and characteristics of the embodiments claimed in this case. The drawings are included herein to provide further understanding, and the drawings are incorporated into this specification and constitute a part of this specification. The drawings illustrate various embodiments of the present disclosure, and the drawings and description together are used to explain the principles and operations of the various embodiments.

現將詳細參照本揭示案之現有較佳實施例,實施例之實例繪示於附圖中。在圖式各處將儘可能使用相同的元件符號來指稱相同或類似的部件。然而,本揭示案可以許多不同的形式來實現,並且不應被解釋為限於本文記載的實施例。Now, reference will be made in detail to the existing preferred embodiments of the present disclosure, and examples of the embodiments are shown in the accompanying drawings. The same reference symbols will be used throughout the drawings to refer to the same or similar parts. However, the present disclosure can be implemented in many different forms, and should not be construed as being limited to the embodiments described herein.

在本文中可將範圍表示為從「約」一個特定值,及/或至「約」另一個特定值。當表示上述範圍時,另一個實施例包含從一個特定值及/或至另一個特定值。類似地,當藉由使用先行詞「約」將數值表示為近似值時,將理解特定值形成另一個實施例。將進一步理解,每個範圍之端點關於另一個端點皆為有意義的並且獨立於此另一個端點。A range can be expressed herein as from "about" one specific value, and/or to "about" another specific value. When the above range is expressed, another embodiment encompasses from one specific value and/or to another specific value. Similarly, when a numerical value is expressed as an approximation by using the antecedent "about", it will be understood that the specific value forms another embodiment. It will be further understood that the endpoints of each range are meaningful with respect to and independent of the other endpoint.

如本文使用的方向性用語──例如,上、下、右、左、前、後、頂部、底部──僅為參照所繪製的圖式而作出,而不欲暗示絕對定向。The directional terms used in this article—for example, up, down, right, left, front, back, top, bottom—are only made with reference to the drawing scheme, and do not intend to imply absolute orientation.

除非另外明確說明,否則本文記載的任何方法決不欲解釋為要求以特定順序執行方法的步驟,亦無要求以任何設備特定的定向來執行。因此,當方法請求項實際上並未敘述方法的步驟所要遵循的順序時,或當任何設備請求項實際上並未敘述對個別部件的順序或定向時,或當在申請專利範圍或說明中並未另外特定說明步驟將限於特定的順序時,或當並未敘述對設備之部件的特定順序或定向時,決不欲在任何態樣中推斷順序或定向。此適用於任何可能的非表達的解釋依據,包含:關於步驟之安排、操作流程、部件之順序或部件之定向之邏輯事項;自語法組織或標點符號得到的簡單含義,以及;說明書中描述的實施例之數量或類型。Unless expressly stated otherwise, any method described herein is never intended to be interpreted as requiring the steps of the method to be executed in a specific order, nor is it required to be executed in any device-specific orientation. Therefore, when the method claim does not actually describe the order in which the steps of the method are to be followed, or when any equipment claim does not actually describe the order or orientation of individual components, or when the patent application scope or description is combined When it is not otherwise specified that the steps will be limited to a specific order, or when the specific order or orientation of the components of the device is not described, it is never intended to infer the order or orientation in any aspect. This applies to any possible non-expressive interpretation basis, including: logical matters concerning the arrangement of steps, operating procedures, the order of components or the orientation of components; simple meanings derived from grammatical organization or punctuation, and; descriptions in the manual The number or type of embodiments.

如本文所使用,除非上下文另有明確指示,否則單數形式「一」、「一個」及「該」包含複數指示物。因此,例如,除非上下文另有明確指示,否則對「一」部件的參照包含具有兩個或多於兩個上述部件的態樣。As used herein, unless the context clearly indicates otherwise, the singular forms "a", "an", and "the" include plural indicators. Thus, for example, unless the context clearly dictates otherwise, references to "a" component include aspects having two or more of the aforementioned components.

第1圖圖示示例性玻璃製造設備10。在一些實例中,玻璃製造設備10可包括玻璃熔化爐12,玻璃熔化爐12可包含熔化容器14。除了熔化容器14之外,玻璃熔化爐12可任選地包含一或更多種另外的部件,如加熱元件(例如,燃燒器或電極),其加熱原料並且將原料轉換成熔融玻璃。在進一步實例中,玻璃熔化爐12可包含熱管理裝置(例如,隔熱部件),其減少從熔化容器附近損失的熱。在更進一步實例中,玻璃熔化爐12可包含有助於將原料熔化成玻璃熔體的電子裝置及/或機電裝置。更進一步,玻璃熔化爐12可包含支撐結構(例如,支撐底盤、支撐構件等)或其他部件。FIG. 1 illustrates an exemplary glass manufacturing facility 10. In some examples, the glass manufacturing facility 10 may include a glass melting furnace 12, and the glass melting furnace 12 may include a melting vessel 14. In addition to the melting vessel 14, the glass melting furnace 12 may optionally include one or more additional components, such as heating elements (eg, burners or electrodes) that heat the raw materials and convert the raw materials into molten glass. In a further example, the glass melting furnace 12 may include a thermal management device (eg, thermal insulation) that reduces heat loss from the vicinity of the melting vessel. In a further example, the glass melting furnace 12 may include electronic devices and/or electromechanical devices that help to melt the raw materials into glass melt. Furthermore, the glass melting furnace 12 may include a supporting structure (for example, a supporting chassis, a supporting member, etc.) or other components.

玻璃熔化容器14通常由耐火材料構成,如耐火陶瓷材料,例如,包括氧化鋁或氧化鋯的耐火陶瓷材料。在一些實例中,玻璃熔化容器14可由耐火陶瓷磚構成。玻璃熔化容器14之具體實施例將在以下更詳細地描述。The glass melting vessel 14 is generally composed of a refractory material, such as a refractory ceramic material, for example, a refractory ceramic material including alumina or zirconia. In some examples, the glass melting vessel 14 may be constructed of refractory ceramic tiles. Specific embodiments of the glass melting vessel 14 will be described in more detail below.

在一些實例中,可將玻璃熔化爐併入作為玻璃製造設備之部件,以製造玻璃基板,例如,連續長度的玻璃帶。在一些實例中,可將本揭示案之玻璃熔化爐併入作為玻璃製造設備之部件,此玻璃製造設備包括槽拉製(slot draw)設備、浮浴(float bath)設備、下拉(down-draw)設備(如熔融製程)、上拉(up-draw)設備、壓輥(press-rolling)設備、管拉製(tube drawing)設備或將受益於本文揭示的態樣的任何其他玻璃製造設備。作為實例,第1圖示意繪示玻璃熔化爐12作為熔融下拉玻璃製造設備10之部件,用於熔融拉製玻璃帶以用於後續處理成個別玻璃片。In some examples, a glass melting furnace can be incorporated as a part of glass manufacturing equipment to manufacture glass substrates, for example, a continuous length of glass ribbon. In some examples, the glass melting furnace of the present disclosure can be incorporated as a part of glass manufacturing equipment, which includes slot draw equipment, float bath equipment, and down-draw equipment. ) Equipment (such as a melting process), up-draw equipment, press-rolling equipment, tube drawing equipment, or any other glass manufacturing equipment that would benefit from the aspects disclosed herein. As an example, Fig. 1 schematically shows the glass melting furnace 12 as a component of the melting and drawing glass manufacturing equipment 10, which is used for melting and drawing a glass ribbon for subsequent processing into individual glass sheets.

玻璃製造設備10(例如,熔融下拉設備10)可任選地包含上游玻璃製造設備16,上游玻璃製造設備16位於相對於玻璃熔化容器14的上游。在一些實例中,上游玻璃製造設備16之一部分或全部可併入作為玻璃熔化爐12之一部分。The glass manufacturing facility 10 (for example, the fusion down-drawing facility 10) may optionally include an upstream glass manufacturing facility 16 that is located upstream with respect to the glass melting vessel 14. In some examples, part or all of the upstream glass manufacturing equipment 16 may be incorporated as part of the glass melting furnace 12.

如繪示的實例所示,上游玻璃製造設備16可包含儲存倉(storage bin) 18、原料輸送裝置20及連接至原料輸送裝置的馬達22。儲存倉18可經配置以儲存定量的原料24,定量的原料24可進料至玻璃熔化爐12之熔化容器14中,如由箭頭26所指示。原料24通常包括一或更多種玻璃成型金屬氧化物及一或更多種改質劑。在一些實例中,原料輸送裝置20可由馬達22提供動力,使得原料輸送裝置20將預定量的原料24從儲存倉18輸送至熔化容器14。在進一步實例中,馬達22可為原料輸送裝置20提供動力以基於在熔化容器14的下游處感測到的熔融玻璃之水平(level)於受控速率下引入原料24。此後,可加熱熔化容器14內的原料24以形成熔融玻璃28。As shown in the illustrated example, the upstream glass manufacturing equipment 16 may include a storage bin 18, a material conveying device 20, and a motor 22 connected to the material conveying device. The storage bin 18 may be configured to store a quantitative amount of raw material 24 that can be fed into the melting vessel 14 of the glass melting furnace 12 as indicated by the arrow 26. The raw material 24 generally includes one or more glass forming metal oxides and one or more modifiers. In some examples, the material conveying device 20 may be powered by the motor 22 so that the material conveying device 20 conveys a predetermined amount of the material 24 from the storage bin 18 to the melting vessel 14. In a further example, the motor 22 may power the raw material conveying device 20 to introduce the raw material 24 at a controlled rate based on the level of molten glass sensed downstream of the melting vessel 14. Thereafter, the raw material 24 in the vessel 14 may be heated and melted to form the molten glass 28.

玻璃製造設備10亦可任選地包含相對於玻璃熔化爐12位於下游的下游玻璃製造設備30。在一些實例中,下游玻璃製造設備30之一部分可併入作為玻璃熔化爐12之部分。在一些情況下,以下論述的第一連接導管32或下游玻璃製造設備30之其他部分可併入作為玻璃熔化爐12之部分。下游玻璃製造設備之元件(包含第一連接導管32)可由貴金屬形成。適合的貴金屬包含選自由鉑、銥、銠、鋨、釕及鈀所組成的金屬之群組的鉑族金屬或其合金。例如,玻璃製造設備之下游部件可由鉑-銠合金形成,其包含從約70%至約90%重量的鉑與從約10%至約30%重量的銠。然而,其他適合的金屬可包含鉬、鈀、錸、鉭、鈦、鎢及其合金。The glass manufacturing facility 10 may also optionally include a downstream glass manufacturing facility 30 located downstream from the glass melting furnace 12. In some examples, a part of the downstream glass manufacturing equipment 30 may be incorporated as part of the glass melting furnace 12. In some cases, the first connecting duct 32 discussed below or other parts of the downstream glass manufacturing equipment 30 may be incorporated as part of the glass melting furnace 12. The components of the downstream glass manufacturing equipment (including the first connecting duct 32) may be formed of precious metals. Suitable precious metals include platinum group metals or alloys thereof selected from the group of metals consisting of platinum, iridium, rhodium, osmium, ruthenium, and palladium. For example, the downstream components of the glass manufacturing equipment may be formed of a platinum-rhodium alloy, which contains from about 70% to about 90% by weight of platinum and from about 10% to about 30% by weight of rhodium. However, other suitable metals may include molybdenum, palladium, rhenium, tantalum, titanium, tungsten and alloys thereof.

下游玻璃製造設備30可包含第一調節(即,處理)容器,如澄清容器34,其位於熔化容器14的下游並且藉由上述第一連接導管32耦接至熔化容器14。在一些實例中,熔融玻璃28可藉由第一連接導管32從熔化容器14由重力進料至澄清容器34。例如,重力可導致熔融玻璃28穿過第一連接導管32之內部路徑從熔化容器14至澄清容器34。然而,應理解,其他調節容器可位於熔化容器14的下游,例如在熔化容器14與澄清容器34之間。在一些實施例中,可在熔化容器與澄清容器之間採用調節容器,其中將來自初級熔化容器的熔融玻璃進一步加熱以繼續熔化製程,或在進入澄清容器之前冷卻至低於熔化容器中熔融玻璃之溫度的溫度。The downstream glass manufacturing facility 30 may include a first conditioning (ie, processing) vessel, such as a clarification vessel 34, which is located downstream of the melting vessel 14 and is coupled to the melting vessel 14 by the above-mentioned first connecting conduit 32. In some examples, the molten glass 28 can be gravity fed from the melting vessel 14 to the clarification vessel 34 via the first connecting conduit 32. For example, gravity may cause the molten glass 28 to pass through the internal path of the first connecting conduit 32 from the melting vessel 14 to the clarifying vessel 34. However, it should be understood that other conditioning vessels may be located downstream of the melting vessel 14, for example between the melting vessel 14 and the clarification vessel 34. In some embodiments, a conditioning vessel can be used between the melting vessel and the clarification vessel, in which the molten glass from the primary melting vessel is further heated to continue the melting process, or is cooled to lower than the molten glass in the melting vessel before entering the clarification vessel The temperature of the temperature.

可藉由各種技術從澄清容器34內的熔融玻璃28移除氣泡。例如,原料24可包含多價化合物(即,澄清劑(fining agent)),如氧化錫,當加熱時,其經歷化學還原反應並且釋放氧。其他適合的澄清劑包含但不限於砷、銻、鐵及鈰。將澄清容器34加熱至高於熔化容器溫度的溫度,從而加熱熔融玻璃及澄清劑。由一或更多個澄清劑之溫度誘導的化學還原產生的氧氣氣泡上升經過澄清容器內的熔融玻璃,其中在熔化爐中產生的熔融玻璃中的氣體可擴散或聚結進入由澄清劑產生的氧氣氣泡中。隨後,增大的氣泡可上升至澄清容器中熔融玻璃之自由表面,隨後從澄清容器排出。氧氣氣泡可進一步引起澄清容器中熔融玻璃之機械性混合。The bubbles can be removed from the molten glass 28 in the clarification vessel 34 by various techniques. For example, the raw material 24 may include a multivalent compound (ie, a fining agent), such as tin oxide, which undergoes a chemical reduction reaction and releases oxygen when heated. Other suitable clarifying agents include, but are not limited to, arsenic, antimony, iron, and cerium. The clarification vessel 34 is heated to a temperature higher than the temperature of the melting vessel, thereby heating the molten glass and the clarifying agent. The oxygen bubbles generated by the chemical reduction induced by the temperature of one or more fining agents rise through the molten glass in the clarification vessel, where the gas in the molten glass generated in the melting furnace can diffuse or coalesce into the fining agent Oxygen bubbles. Subsequently, the enlarged bubbles can rise to the free surface of the molten glass in the clarification vessel and then be discharged from the clarification vessel. Oxygen bubbles can further cause mechanical mixing of molten glass in the clarification vessel.

下游玻璃製造設備30可進一步包含另一個調節容器,如用於混合熔融玻璃的混合容器36。混合容器36可位於澄清容器34的下游。混合容器36可用於提供均質的玻璃熔體組成物,從而減少原本可能存在於離開澄清容器的經澄清的熔融玻璃內的化學或熱不均質性的波筋(cord)。如圖所示,澄清容器34可藉由第二連接導管38耦接至混合容器36。在一些實例中,熔融玻璃28可藉由第二連接導管38從澄清容器34重力進料至混合容器36。例如,重力可導致熔融玻璃28穿過第二連接導管38之內部路徑從澄清容器34至混合容器36。應注意,儘管混合容器36圖示為在澄清容器34的下游,但混合容器36可位於澄清容器34的上游。在一些實施例中,下游玻璃製造設備30可包含多個混合容器,例如在澄清容器34的上游的混合容器及在澄清容器34的下游的混合容器。這些多個混合容器可具有相同的設計,或他們可具有不同的設計。The downstream glass manufacturing equipment 30 may further include another adjustment vessel, such as a mixing vessel 36 for mixing molten glass. The mixing vessel 36 may be located downstream of the clarification vessel 34. The mixing vessel 36 can be used to provide a homogeneous glass melt composition, thereby reducing the chemical or thermal inhomogeneity cords that might otherwise exist in the clarified molten glass leaving the refining vessel. As shown in the figure, the clarification container 34 may be coupled to the mixing container 36 by the second connecting pipe 38. In some examples, the molten glass 28 can be gravity fed from the clarification vessel 34 to the mixing vessel 36 through the second connecting conduit 38. For example, gravity may cause the molten glass 28 to pass through the internal path of the second connecting conduit 38 from the clarification vessel 34 to the mixing vessel 36. It should be noted that although the mixing vessel 36 is illustrated as being downstream of the clarification vessel 34, the mixing vessel 36 may be located upstream of the clarification vessel 34. In some embodiments, the downstream glass manufacturing equipment 30 may include a plurality of mixing vessels, such as a mixing vessel upstream of the clarification vessel 34 and a mixing vessel downstream of the clarification vessel 34. These multiple mixing containers may have the same design, or they may have different designs.

下游玻璃製造設備30可進一步包含另一個調節容器,如可位於混合容器36的下游的輸送容器40。輸送容器40可調節待進料至下游成型裝置的熔融玻璃28。例如,輸送容器40可作為累加器(accumulator)及/或流量控制器,以調整及/或藉由出口導管44提供一致的熔融玻璃28之流量流至成型體(forming body) 42。如圖所示,混合容器36可藉由第三連接導管46耦接至輸送容器40。在一些實例中,熔融玻璃28可藉由第三連接導管46從混合容器36重力進料至輸送容器40。例如,重力可驅動熔融玻璃28穿過第三連接導管46之內部路徑從混合容器36至輸送容器40。The downstream glass manufacturing facility 30 may further include another conditioning vessel, such as a delivery vessel 40 that may be located downstream of the mixing vessel 36. The conveying container 40 can adjust the molten glass 28 to be fed to the downstream forming device. For example, the delivery container 40 can be used as an accumulator and/or a flow controller to adjust and/or provide a consistent flow of the molten glass 28 to the forming body 42 through the outlet duct 44. As shown in the figure, the mixing container 36 may be coupled to the delivery container 40 by a third connecting pipe 46. In some examples, the molten glass 28 may be gravity fed from the mixing container 36 to the conveying container 40 through the third connecting conduit 46. For example, gravity can drive the molten glass 28 from the mixing container 36 to the delivery container 40 through the internal path of the third connecting conduit 46.

下游玻璃製造設備30可進一步包含成型設備48,成型設備48包括上述成型體42及入口導管50。出口導管44可定位成將熔融玻璃28從輸送容器40輸送至成型設備48之入口導管50。例如在實例中,出口導管44可嵌套在入口導管50之內表面內並且與此內表面間隔開,從而提供位於出口導管44之外表面與入口導管50之內表面之間的熔融玻璃之自由表面。在熔融下拉玻璃製作設備中的成型體42可包括位於成型體之上表面中的槽52及沿著成型體之底部邊緣56在拉製方向上會聚的會聚成型表面54。經由輸送容器40、出口導管44及入口導管50輸送至成型體槽的熔融玻璃溢出槽之側壁並且沿著會聚成型表面54下降而作為個別的熔融玻璃流。個別的熔融玻璃流在底部邊緣56下方且沿著底部邊緣56連接以產生單一玻璃帶58,藉由向玻璃帶施加張力(如藉由重力、邊緣輥72及拉引輥82)從底部邊緣56沿拉製或流動方向60拉製此單一玻璃帶58,以當玻璃冷卻並且玻璃之黏度增加時控制玻璃帶之尺寸。因此,玻璃帶58經過黏性-彈性過渡變化(visco-elastic transition)並且獲得給予玻璃帶58穩定的尺寸特性的機械性質。在一些實施例中,玻璃帶58可藉由玻璃分離設備100在玻璃帶之彈性區域中分離成個別玻璃片62。隨後,機器人64可使用夾持工具65將個別玻璃片62傳送至輸送系統,於此處可進一步處理個別玻璃片。The downstream glass manufacturing equipment 30 may further include a molding equipment 48, which includes the aforementioned molding body 42 and the inlet duct 50. The outlet duct 44 may be positioned to convey the molten glass 28 from the conveying container 40 to the inlet duct 50 of the forming device 48. For example, in an example, the outlet duct 44 may be nested within the inner surface of the inlet duct 50 and spaced from the inner surface, thereby providing freedom for the molten glass between the outer surface of the outlet duct 44 and the inner surface of the inlet duct 50 surface. The molded body 42 in the fusion down-draw glass manufacturing equipment may include a groove 52 located in the upper surface of the molded body and a convergent molding surface 54 that converges in the drawing direction along the bottom edge 56 of the molded body. The molten glass delivered to the molding tank through the transportation container 40, the outlet duct 44, and the inlet duct 50 overflows the side wall of the tank and descends along the convergent molding surface 54 as individual molten glass streams. The individual molten glass flows are connected below the bottom edge 56 and along the bottom edge 56 to produce a single glass ribbon 58, which is removed from the bottom edge 56 by applying tension to the glass ribbon (such as by gravity, edge roller 72, and pull roller 82). This single glass ribbon 58 is drawn along the drawing or flow direction 60 to control the size of the glass ribbon as the glass cools and the viscosity of the glass increases. Therefore, the glass ribbon 58 undergoes a visco-elastic transition and obtains mechanical properties that give the glass ribbon 58 stable dimensional characteristics. In some embodiments, the glass ribbon 58 can be separated into individual glass sheets 62 in the elastic region of the glass ribbon by the glass separating device 100. Subsequently, the robot 64 can use the clamping tool 65 to transfer the individual glass sheets 62 to the conveying system, where the individual glass sheets can be further processed.

第2圖圖示環形加熱元件100之透視圖,環形加熱元件100周向環繞導管之一部分,此部分在第2圖中圖示為連接導管38,儘管應理解,一或更多個環形加熱元件100可周向環繞第1圖中繪示的導管中之任一者。在某些示例性實施例中,環形加熱元件100可包括與連接導管38相同或相似的材料。例如,當連接導管包括鉑時,環形加熱元件100亦可包括鉑。環形加熱元件100亦可包括其他材料,例如,鎳、銅中之至少一者,以及包括鎳、銅、銠、鈀及鉑中之至少一者的合金。另外,如本領域具有通常技術者所知,環形加熱元件100可連接至功率源(未圖示),如電源。這繼而可導致環形加熱元件100之電阻加熱,這繼而可加熱連接導管38以及加熱流過連接導管38的熔融材料(如熔融玻璃28)至期望的溫度。Figure 2 shows a perspective view of the annular heating element 100. The annular heating element 100 circumferentially surrounds a portion of the duct. This part is shown as the connecting duct 38 in Figure 2, although it should be understood that one or more annular heating elements 100 can circumferentially surround any of the catheters shown in Figure 1. In certain exemplary embodiments, the annular heating element 100 may include the same or similar material as the connecting duct 38. For example, when the connecting pipe includes platinum, the annular heating element 100 may also include platinum. The annular heating element 100 may also include other materials, for example, at least one of nickel and copper, and an alloy including at least one of nickel, copper, rhodium, palladium, and platinum. In addition, as known to those skilled in the art, the annular heating element 100 may be connected to a power source (not shown), such as a power source. This in turn may cause resistance heating of the annular heating element 100, which in turn may heat the connecting duct 38 and the molten material (such as molten glass 28) flowing through the connecting duct 38 to a desired temperature.

第3圖圖示環形加熱元件100之示意正剖視圖,環形加熱元件100周向環繞導管(即,連接導管38)並且被氛圍300中含有的耐火陶瓷材料200環繞。環形加熱元件100包含由相對較厚的區域104周向環繞的相對較薄的區域102,相對較厚的區域104繼而被環形通道106周向環繞,環形通道106經配置以使冷卻流體流過其中。FIG. 3 shows a schematic front cross-sectional view of the annular heating element 100. The annular heating element 100 circumferentially surrounds the duct (ie, the connecting duct 38) and is surrounded by the refractory ceramic material 200 contained in the atmosphere 300. The annular heating element 100 includes a relatively thin area 102 circumferentially surrounded by a relatively thick area 104, which is in turn circumferentially surrounded by an annular channel 106 that is configured to allow cooling fluid to flow therethrough .

相對較薄的區域102、相對較厚的區域104及環形通道106可包括彼此相同或不同的材料。例如,在某些實施例中,相對較薄的區域102、相對較厚的區域104及環形通道106每一者包括鎳、銅中之至少一者,以及包括鎳、銅、銠、鈀及鉑中之至少一者的合金。The relatively thin region 102, the relatively thick region 104, and the annular channel 106 may include the same or different materials from each other. For example, in certain embodiments, each of the relatively thin region 102, the relatively thick region 104, and the annular channel 106 includes at least one of nickel and copper, and includes nickel, copper, rhodium, palladium, and platinum. At least one of the alloys.

耐火陶瓷材料200,儘管不限於任何特定的材料,但例如可包括氧化鋁、鋯石、鋁酸鈣、氧化鋯及氧化物陶瓷(包括鈣、鎂、鋁、矽及鋯中之至少一者)中之至少一者。例如,本文揭示的實施例包含其中耐火陶瓷材料200被包含在系統中的實施例,此系統包含支架殼體(包括例如熔融氧化鋯)以及在殼體中並且環繞導管的至少一種可澆鑄的耐火材料,例如,揭示於WO2009/058330中,其全部揭示內容以引用方式併入本文。The refractory ceramic material 200, although not limited to any particular material, may include alumina, zircon, calcium aluminate, zirconia, and oxide ceramics (including at least one of calcium, magnesium, aluminum, silicon, and zirconium). At least one of them. For example, the embodiments disclosed herein include embodiments in which the refractory ceramic material 200 is contained in a system including a stent shell (including, for example, fused zirconia) and at least one castable refractory in the shell and surrounding the conduit The materials are, for example, disclosed in WO2009/058330, the entire disclosure of which is incorporated herein by reference.

氛圍300可被包含並且維持在系統內,此系統控制玻璃製造設備30之至少一部分周圍的環境,包含導管(即,連接導管38)及耐火陶瓷材料200。例如,系統可包含控制系統及膠囊,控制系統及膠囊用於控制玻璃製造設備30之至少一部分周圍的氫氣之水平,以便抑制在個別玻璃片62中形成氣態夾雜物及表面起泡。當熔融玻璃28在玻璃製造設備30中的容器之間行進時,系統亦可用於幫助冷卻熔融玻璃28。系統亦可用於維持氛圍300以在容器周圍包含最少的氧氣,以便減少容器上貴金屬之氧化。在WO 2006/115972中圖示及描述了示例性系統,其全部揭示內容以引用方式併入本文。The atmosphere 300 can be contained and maintained in a system, and this system controls at least a part of the surrounding environment of the glass manufacturing equipment 30, including the pipe (ie, the connecting pipe 38) and the refractory ceramic material 200. For example, the system may include a control system and a capsule. The control system and the capsule are used to control the level of hydrogen around at least a part of the glass manufacturing equipment 30 so as to suppress the formation of gaseous inclusions and surface blistering in individual glass sheets 62. The system can also be used to help cool molten glass 28 as molten glass 28 travels between containers in glass manufacturing facility 30. The system can also be used to maintain the atmosphere 300 to contain the least oxygen around the container in order to reduce the oxidation of precious metals on the container. An exemplary system is illustrated and described in WO 2006/115972, the entire disclosure of which is incorporated herein by reference.

第4圖圖示環形加熱元件100之一部分之示意側剖視圖,此部分包含環形冷卻流體通道106。如同第3圖中繪示的實施例,環形加熱元件100包含由相對較厚的區域104周向環繞的相對較薄的區域102,相對較厚的區域104繼而被環形通道106周向環繞,環形通道106經配置以使冷卻流體150流過其中。包含環形通道106的環形加熱元件100被耐火陶瓷材料200環繞。FIG. 4 shows a schematic side cross-sectional view of a portion of the annular heating element 100 that includes the annular cooling fluid channel 106. Like the embodiment shown in Figure 3, the annular heating element 100 includes a relatively thin area 102 circumferentially surrounded by a relatively thick area 104. The relatively thick area 104 is then circumferentially surrounded by the annular channel 106, which is annular The passage 106 is configured to allow the cooling fluid 150 to flow therethrough. The annular heating element 100 containing the annular channel 106 is surrounded by a refractory ceramic material 200.

在某些示例性實施例中,冷卻流體150可包括液體,例如水。冷卻流體150亦可包括油及/或抗腐蝕添加劑。冷卻流體150亦可包括氣體,例如,至少一種選自空氣、氮氣、氧氣、氦氣、氫氣及氖氣的氣體。In certain exemplary embodiments, the cooling fluid 150 may include a liquid, such as water. The cooling fluid 150 may also include oil and/or anti-corrosion additives. The cooling fluid 150 may also include a gas, for example, at least one gas selected from the group consisting of air, nitrogen, oxygen, helium, hydrogen, and neon.

在某些示例性實施例中,冷卻流體150之溫度,儘管不限於任何特定值,但可小於或等於約60°C,如從約0°C至約60°C,且進一步如從約10°C至約50°C,且又進一步如從約20°C至約40°C,且又更進一步如從約25°C至約35°C。In certain exemplary embodiments, the temperature of the cooling fluid 150, although not limited to any specific value, may be less than or equal to about 60°C, such as from about 0°C to about 60°C, and further, for example, from about 10°C. °C to about 50°C, and still further such as from about 20°C to about 40°C, and still further such as from about 25°C to about 35°C.

本文揭示的實施例包含其中氛圍300之露點高於冷卻流體150之溫度的實施例。氛圍300之露點,儘管不限於任何特定值,但在某些示例性實施例中可為至少約60°C,如至少約65°C,且進一步如至少約70°C,如從約60°C至約100°C,且進一步如從約65°C至約95°C,且又進一步如從約70°C至約90°C。The embodiments disclosed herein include embodiments in which the dew point of the atmosphere 300 is higher than the temperature of the cooling fluid 150. Although the dew point of the atmosphere 300 is not limited to any specific value, in certain exemplary embodiments it may be at least about 60°C, such as at least about 65°C, and further such as at least about 70°C, such as from about 60° C to about 100°C, and further such as from about 65°C to about 95°C, and still further such as from about 70°C to about 90°C.

在某些示例性實施例中,氛圍300之露點比冷卻流體150之溫度高至少約5°C,如至少約10°C,且進一步如至少約15°C,且又進一步如至少約20°C,且仍又進一步如至少約25°C,且甚至仍又進一步如至少約30°C,包含從約5°C至約70°C,如從約10°C至約60°C,且進一步如從約15°C至約50°C,且又進一步如從約20°C至約40°C。In certain exemplary embodiments, the dew point of the atmosphere 300 is at least about 5°C higher than the temperature of the cooling fluid 150, such as at least about 10°C, and further such as at least about 15°C, and still further such as at least about 20° C, and still further such as at least about 25°C, and even still further such as at least about 30°C, including from about 5°C to about 70°C, such as from about 10°C to about 60°C, and Further such as from about 15°C to about 50°C, and yet further such as from about 20°C to about 40°C.

第5圖圖示環形加熱元件100之一部分之示意側剖視圖,此部分包含環繞環形通道106(經配置以使冷卻流體150流過其中)的環形殼體108及在環形冷卻流體通道106與環形殼體108之間延伸的流體間隙160。包含環形殼體108的環形加熱元件100被耐火陶瓷材料200環繞。環形殼體108及流體間隙160包括在環形通道106與耐火陶瓷材料200之間延伸的界面區域(在第9A圖中圖示為I)。Figure 5 shows a schematic side cross-sectional view of a portion of the annular heating element 100, which includes an annular housing 108 surrounding the annular passage 106 (configured to allow the cooling fluid 150 to flow therethrough) and the annular cooling fluid passage 106 and the annular housing The fluid gap 160 extends between the bodies 108. The annular heating element 100 containing the annular housing 108 is surrounded by a refractory ceramic material 200. The annular housing 108 and the fluid gap 160 include an interface area (illustrated as I in Figure 9A) extending between the annular channel 106 and the refractory ceramic material 200.

第6圖圖示環形加熱元件100之一部分之示意側剖視圖,此部分包含環繞替代配置的環形通道106的環形殼體108及在環形冷卻流體通道106與環形殼體108之間延伸的流體間隙160,此替代配置的環形通道106與相對較厚的區域104具有更大程度的接觸並且經配置以使冷卻流體150流過其中。包含環形殼體108的環形加熱元件100被耐火陶瓷材料200環繞。環形殼體108及流體間隙160包括在環形通道106與耐火陶瓷材料200之間延伸的界面區域(在第9A圖中圖示為I)。Figure 6 shows a schematic side cross-sectional view of a portion of the annular heating element 100, which includes an annular housing 108 surrounding an alternately configured annular passage 106 and a fluid gap 160 extending between the annular cooling fluid passage 106 and the annular housing 108 The annular channel 106 of this alternative configuration has a greater degree of contact with the relatively thicker region 104 and is configured to allow the cooling fluid 150 to flow therethrough. The annular heating element 100 containing the annular housing 108 is surrounded by a refractory ceramic material 200. The annular housing 108 and the fluid gap 160 include an interface area (illustrated as I in Figure 9A) extending between the annular channel 106 and the refractory ceramic material 200.

第7圖圖示環形加熱元件100之一部分之示意側剖視圖,此部分包含環繞替代配置的環形通道106的環形殼體108及在環形冷卻流體通道106與環形殼體108之間延伸的流體間隙160,此替代配置的環形通道106具有D形剖面並且經配置以使冷卻流體150流過其中。包含環形殼體108的環形加熱元件100被耐火陶瓷材料200環繞。環形殼體108及流體間隙160包括在環形通道106與耐火陶瓷材料200之間延伸的界面區域(在第9A圖中圖示為I)。Figure 7 shows a schematic side cross-sectional view of a portion of the annular heating element 100, which includes an annular housing 108 surrounding an alternatively configured annular passage 106 and a fluid gap 160 extending between the annular cooling fluid passage 106 and the annular housing 108 The annular channel 106 of this alternative configuration has a D-shaped cross-section and is configured to allow the cooling fluid 150 to flow therethrough. The annular heating element 100 containing the annular housing 108 is surrounded by a refractory ceramic material 200. The annular housing 108 and the fluid gap 160 include an interface area (illustrated as I in Figure 9A) extending between the annular channel 106 and the refractory ceramic material 200.

第8圖圖示環形加熱元件100之一部分之示意側剖視圖,此部分包含在環形通道106(經配置以使冷卻流體150流過其中)之至少一部分與耐火陶瓷材料200之間的環形環110。包含環形環110的環形加熱元件100被耐火陶瓷材料200環繞。環形環110包括在環形通道106與耐火陶瓷材料200之間延伸的界面區域(在第9B圖中圖示為I)。在某些示例性實施例中,環形環110可包括鎳、銅中之至少一者,以及包括鎳、銅、銠、鈀及鉑中之至少一者的合金。Figure 8 shows a schematic side cross-sectional view of a portion of the annular heating element 100 that includes the annular ring 110 between at least a portion of the annular channel 106 (configured to allow the cooling fluid 150 to flow therethrough) and the refractory ceramic material 200. The annular heating element 100 including the annular ring 110 is surrounded by a refractory ceramic material 200. The annular ring 110 includes an interface area (illustrated as I in Figure 9B) extending between the annular channel 106 and the refractory ceramic material 200. In certain exemplary embodiments, the annular ring 110 may include at least one of nickel, copper, and an alloy including at least one of nickel, copper, rhodium, palladium, and platinum.

第9A圖及第9B圖圖示環形加熱元件100之一部分之分解側剖視圖,此部分分別包含環形殼體108(第9A圖)或環形環110(第9B圖)。界面區域I與耐火陶瓷材料200之間的邊界B處的界面區域I之溫度高於氛圍(在第3圖中圖示為300)之露點。9A and 9B illustrate an exploded side cross-sectional view of a part of the annular heating element 100, which includes the annular housing 108 (Figure 9A) or the annular ring 110 (Figure 9B), respectively. The temperature of the interface area I at the boundary B between the interface area I and the refractory ceramic material 200 is higher than the dew point of the atmosphere (300 in the illustration in Figure 3).

第10A圖及第10B圖分別圖示環形加熱元件100之一部分之示意側剖視圖及分解側剖視圖,此部分包含在環形通道106(經配置以使冷卻流體150流過其中)之至少一部分與耐火陶瓷材料200之間的環形環110之替代實施例。包含環形環110的環形加熱元件100被耐火陶瓷材料200環繞。環形環110包括在環形通道106與耐火陶瓷材料200之間延伸的界面區域(在第10B圖中圖示為I)。界面區域I與耐火陶瓷材料200之間的邊界B處的界面區域I之溫度高於氛圍(在第3圖中圖示為300)之露點。在某些示例性實施例中,環形環110可包括鎳、銅中之至少一者,以及包括鎳、銅、銠、鈀及鉑中之至少一者的合金。Figures 10A and 10B respectively illustrate a schematic side sectional view and an exploded side sectional view of a part of the annular heating element 100, which part contains at least a part of the annular channel 106 (configured to allow the cooling fluid 150 to flow therethrough) and refractory ceramic An alternative embodiment of the annular ring 110 between the materials 200. The annular heating element 100 including the annular ring 110 is surrounded by a refractory ceramic material 200. The annular ring 110 includes an interface area (illustrated as I in Figure 10B) extending between the annular channel 106 and the refractory ceramic material 200. The temperature of the interface area I at the boundary B between the interface area I and the refractory ceramic material 200 is higher than the dew point of the atmosphere (300 in the illustration in Figure 3). In certain exemplary embodiments, the annular ring 110 may include at least one of nickel, copper, and an alloy including at least one of nickel, copper, rhodium, palladium, and platinum.

因此,本文揭示的實施例包含其中界面區域I與耐火陶瓷材料200之間的邊界B處的界面區域I之溫度高於氛圍300之露點並且氛圍300之露點高於流過環形通道106的冷卻流體150之溫度的實施例。例如,在某些實施例中,界面區域I與耐火陶瓷材料200之間的邊界B處的界面區域I之溫度比氛圍300之露點高至少約5°C,如至少約10°C,且進一步如至少約15°C,包含從約5°C至約100°C,如從約10°C至約50°C,並且氛圍300之露點比流過環形通道106的冷卻流體150之溫度高至少約5°C,如至少約10°C,且進一步如至少約15°C,且又進一步如至少約20°C,且又更進一步如至少約25°C,且甚至又更進一步如至少約30°C,包含從約5°C至約70°C,如從約10°C至約60°C,且進一步如從約15°C至約50°C,且又進一步如從約20°C至約40°C。Therefore, the embodiment disclosed herein includes the temperature of the interface region I at the boundary B between the interface region I and the refractory ceramic material 200 is higher than the dew point of the atmosphere 300 and the dew point of the atmosphere 300 is higher than the cooling fluid flowing through the annular channel 106 Example of a temperature of 150. For example, in some embodiments, the temperature of the interface region I at the boundary B between the interface region I and the refractory ceramic material 200 is higher than the dew point of the atmosphere 300 by at least about 5°C, such as at least about 10°C, and further For example, at least about 15°C, including from about 5°C to about 100°C, such as from about 10°C to about 50°C, and the dew point of the atmosphere 300 is at least higher than the temperature of the cooling fluid 150 flowing through the annular channel 106 About 5°C, such as at least about 10°C, and further such as at least about 15°C, and still further such as at least about 20°C, and still further such as at least about 25°C, and even still further such as at least about 30°C, including from about 5°C to about 70°C, such as from about 10°C to about 60°C, and further such as from about 15°C to about 50°C, and further such as from about 20°C C to about 40°C.

在某些示例性實施例中,界面區域I與耐火陶瓷材料200之間的邊界B處的界面區域I之溫度至少約65°C,如至少約75°C,且進一步如至少約85°C,如從約65°C至約200°C,包含從約75°C至約150°C,且進一步包含從約85°C至約125°C。同時,界面區域I與耐火陶瓷材料200之間的邊界B處的界面區域I之溫度高於氛圍300之露點,並且氛圍300之露點高於冷卻流體150之溫度,其中冷卻流體150之溫度小於或等於約60°C,如從約0°C至約60°C,且進一步如從約10°C至約50°C,且又進一步如從約20°C至約40°C,且又更進一步如從約25°C至約35°C。In certain exemplary embodiments, the temperature of the interface region I at the boundary B between the interface region I and the refractory ceramic material 200 is at least about 65°C, such as at least about 75°C, and further such as at least about 85°C , Such as from about 65°C to about 200°C, including from about 75°C to about 150°C, and further including from about 85°C to about 125°C. At the same time, the temperature of the interface area I at the boundary B between the interface area I and the refractory ceramic material 200 is higher than the dew point of the atmosphere 300, and the dew point of the atmosphere 300 is higher than the temperature of the cooling fluid 150, where the temperature of the cooling fluid 150 is less than or Equal to about 60°C, such as from about 0°C to about 60°C, and further such as from about 10°C to about 50°C, and still further such as from about 20°C to about 40°C, and more Further, for example, from about 25°C to about 35°C.

在某些示例性實施例中,氛圍300之露點為至少約60°C,如至少約65°C,且進一步如至少約70°C,如從約60°C至約100°C,且進一步如從約65°C至約95°C,且又進一步如從約70°C至約90°C。同時,在界面區域I與耐火陶瓷材料200之間的邊界B處的界面區域I之溫度高於氛圍300之露點,並且氛圍300之露點高於冷卻流體150之溫度。In certain exemplary embodiments, the dew point of the atmosphere 300 is at least about 60°C, such as at least about 65°C, and further such as at least about 70°C, such as from about 60°C to about 100°C, and further Such as from about 65°C to about 95°C, and still further such as from about 70°C to about 90°C. At the same time, the temperature of the interface area I at the boundary B between the interface area I and the refractory ceramic material 200 is higher than the dew point of the atmosphere 300, and the dew point of the atmosphere 300 is higher than the temperature of the cooling fluid 150.

當界面區域I包括流體間隙160時,例如,如第5圖至第7圖及第9A圖所示,流體間隙160可例如包括氣體,例如空氣。另外,可將流體間隙160中的氣體之溫度及露點控制在預定的溫度及露點範圍內。例如,流體間隙160中的氣體之溫度可控制為高於氛圍300之露點。另外,將流體間隙160中的氣體之露點控制為低於流過環形通道106的冷卻流體150之溫度。When the interface region I includes the fluid gap 160, for example, as shown in FIG. 5 to FIG. 7 and FIG. 9A, the fluid gap 160 may, for example, include gas, such as air. In addition, the temperature and dew point of the gas in the fluid gap 160 can be controlled within a predetermined temperature and dew point range. For example, the temperature of the gas in the fluid gap 160 can be controlled to be higher than the dew point of the atmosphere 300. In addition, the dew point of the gas in the fluid gap 160 is controlled to be lower than the temperature of the cooling fluid 150 flowing through the annular channel 106.

例如,可控制流體間隙160中的氣體之溫度以幫助使界面區域I與耐火陶瓷材料200之間的邊界B處的界面區域I之溫度高於氛圍300之露點。在某些示例性實施例中,流體間隙160中的氣體之溫度可為至少約60°C,如從約60°C至約120°C,包含從約70°C至約100°C。同時,流體間隙160中的氣體之露點可例如小於約25°C,且進一步如小於約15°C,如從約-25°C至約25°C,包含從約-15°C至約15°C。For example, the temperature of the gas in the fluid gap 160 can be controlled to help make the temperature of the interface region I at the boundary B between the interface region I and the refractory ceramic material 200 higher than the dew point of the atmosphere 300. In certain exemplary embodiments, the temperature of the gas in the fluid gap 160 may be at least about 60°C, such as from about 60°C to about 120°C, including from about 70°C to about 100°C. At the same time, the dew point of the gas in the fluid gap 160 may be, for example, less than about 25°C, and further such as less than about 15°C, such as from about -25°C to about 25°C, including from about -15°C to about 15°C. °C.

在某些示例性實施例中,流體間隙160亦可包括液體,例如疏水性液體,如油。流體間隙亦可包括親水性液體,如包括抗腐蝕添加劑的水性液體。In certain exemplary embodiments, the fluid gap 160 may also include a liquid, such as a hydrophobic liquid, such as oil. The fluid gap may also include hydrophilic liquids, such as aqueous liquids including anti-corrosion additives.

第11圖圖示環形加熱元件100之示意前剖視圖,環形加熱元件100周向環繞導管38並且被耐火陶瓷材料200環繞,其中環形加熱元件100之中心X偏離導管38之中心Y。如同第3圖中所示的實施例,環形加熱元件100包含由相對較厚的區域104周向環繞的相對較薄的區域102,相對較厚的區域104繼而被環形通道106周向環繞,環形通道106經配置以使冷卻流體流過其中。在一些實施例中,使環形加熱元件100從導管38偏移可使得流過導管材料的電流更均勻地分佈。Figure 11 shows a schematic front sectional view of the annular heating element 100. The annular heating element 100 circumferentially surrounds the duct 38 and is surrounded by the refractory ceramic material 200, wherein the center X of the annular heating element 100 is offset from the center Y of the duct 38. As in the embodiment shown in Figure 3, the annular heating element 100 includes a relatively thin area 102 circumferentially surrounded by a relatively thick area 104. The relatively thick area 104 is then circumferentially surrounded by an annular channel 106. The channel 106 is configured to allow cooling fluid to flow therethrough. In some embodiments, offsetting the annular heating element 100 from the conduit 38 may cause the current flowing through the conduit material to be more evenly distributed.

儘管已參照熔融下拉法描述了以上實施例,但應理解,上述實施例亦適用於其他玻璃形成製程,如浮式製程、槽拉製製程、上拉製程、管拉製製程以及壓輥製程。Although the above embodiments have been described with reference to the fusion down-draw method, it should be understood that the above-mentioned embodiments are also applicable to other glass forming processes, such as a floating process, a groove drawing process, a top drawing process, a tube drawing process, and a pressing roll process.

對於本領域熟知技術者而言將為顯而易見的是,在不脫離本揭示案之精神及範疇的情況下,可對本揭示案之實施例進行各種修改及變化。因此,預期本揭示案涵蓋這些修改及變化,只要他們落入所附申請專利範圍及其均等物之範疇內。It will be obvious to those skilled in the art that various modifications and changes can be made to the embodiments of the present disclosure without departing from the spirit and scope of the present disclosure. Therefore, this disclosure is expected to cover these modifications and changes, as long as they fall within the scope of the attached patent application and their equivalents.

10:玻璃製造設備/熔融下拉設備 12:玻璃熔化爐 14:熔化容器/玻璃熔化容器 16:上游玻璃製造設備 18:儲存倉 20:原料輸送裝置 22:馬達 24:原料 26:箭頭 28:熔融玻璃 30:下游玻璃製造設備 32:第一連接導管 34:澄清容器 36:混合容器 38:第二連接導管 40:輸送容器 42:成型體 44:出口導管 46:第三連接導管 48:成型設備 50:入口導管 52:槽 54:會聚成型表面 56:底部邊緣 58:玻璃帶 60:拉製或流動方向 62:玻璃片 64:機器人 65:夾持工具 72:邊緣輥 82:拉引輥 100:玻璃分離設備/環形加熱元件 102:區域 104:區域 106:環形通道/環形冷卻流體通道 108:環形殼體 110:環形環 150:冷卻流體 160:流體間隙 200:耐火陶瓷材料 300:氛圍 B:邊界 I:界面區域10: Glass manufacturing equipment/melting down-drawing equipment 12: Glass melting furnace 14: melting container/glass melting container 16: Upstream glass manufacturing equipment 18: Storage warehouse 20: Raw material conveying device 22: Motor 24: raw materials 26: Arrow 28: molten glass 30: Downstream glass manufacturing equipment 32: The first connecting duct 34: Clarification container 36: mixing container 38: second connecting duct 40: conveying container 42: molding 44: Outlet duct 46: third connecting duct 48: molding equipment 50: inlet duct 52: Slot 54: Convergent molding surface 56: bottom edge 58: glass ribbon 60: drawing or flow direction 62: glass sheet 64: Robot 65: clamping tool 72: edge roller 82: Pull roll 100: Glass separation equipment/ring heating element 102: area 104: area 106: Ring channel / ring cooling fluid channel 108: Ring shell 110: Ring 150: Cooling fluid 160: fluid gap 200: Refractory ceramic material 300: Atmosphere B: boundary I: Interface area

第1圖為示例性熔融下拉玻璃製作設備及製程之示意圖;Figure 1 is a schematic diagram of an exemplary fusion down-draw glass manufacturing equipment and process;

第2圖為環形加熱元件之透視圖,此環形加熱元件周向環繞導管之一部分;Figure 2 is a perspective view of an annular heating element, which circumferentially surrounds a part of the duct;

第3圖為環形加熱元件之示意正剖視圖,此環形加熱元件周向環繞導管並且被氛圍中含有的耐火陶瓷材料環繞;Figure 3 is a schematic front cross-sectional view of the annular heating element, which surrounds the pipe circumferentially and is surrounded by refractory ceramic materials contained in the atmosphere;

第4圖為環形加熱元件之一部分之示意側剖視圖,此部分包含環形冷卻流體通道;Figure 4 is a schematic side sectional view of a part of the annular heating element, this part contains the annular cooling fluid channel;

第5圖為環形加熱元件之一部分之示意側剖視圖,此部分包含環繞環形冷卻流體通道的環形殼體及在環形冷卻流體通道與環形殼體之間延伸的流體間隙;Figure 5 is a schematic side sectional view of a part of the annular heating element, this part includes an annular casing surrounding the annular cooling fluid channel and a fluid gap extending between the annular cooling fluid channel and the annular casing;

第6圖為環形加熱元件之一部分之示意側剖視圖,此部分包含環繞替代配置的環形冷卻流體通道的環形殼體及在環形冷卻流體通道與環形殼體之間延伸的流體間隙;Figure 6 is a schematic side cross-sectional view of a part of the annular heating element. This part includes an annular casing surrounding an alternatively configured annular cooling fluid passage and a fluid gap extending between the annular cooling fluid passage and the annular casing;

第7圖為環形加熱元件之一部分之示意側剖視圖,此部分包含環繞替代配置的環形冷卻流體通道的環形殼體及在環形冷卻流體通道與環形殼體之間延伸的流體間隙;Figure 7 is a schematic side cross-sectional view of a part of the annular heating element, this part includes an annular casing surrounding an alternatively configured annular cooling fluid passage and a fluid gap extending between the annular cooling fluid passage and the annular casing;

第8圖為環形加熱元件之一部分之示意側剖視圖,此部分包含在環形冷卻流體通道之至少一部分與耐火陶瓷材料之間的環形環;Figure 8 is a schematic side cross-sectional view of a part of the annular heating element, this part including the annular ring between at least a part of the annular cooling fluid channel and the refractory ceramic material;

第9A圖及第9B圖為環形加熱元件之一部分之分解側剖視圖,此部分分別包含環形殼體或環形環;Figures 9A and 9B are exploded side cross-sectional views of a part of the annular heating element, which includes an annular shell or an annular ring, respectively;

第10A圖及第10B圖為環形加熱元件之一部分之示意側剖視圖及分解側剖視圖,此部分包含在環形冷卻流體通道之至少一部分與耐火陶瓷材料之間的環形環之替代實施例;以及Figures 10A and 10B are schematic side cross-sectional views and exploded side cross-sectional views of a part of the annular heating element, which includes an alternative embodiment of the annular ring between at least a part of the annular cooling fluid channel and the refractory ceramic material; and

第11圖為環形加熱元件之示意前剖視圖,此環形加熱元件周向環繞導管並且被耐火陶瓷材料環繞,其中環形加熱元件之中心偏離導管之中心。Figure 11 is a schematic front cross-sectional view of the annular heating element. The annular heating element circumferentially surrounds the pipe and is surrounded by refractory ceramic material, wherein the center of the annular heating element is offset from the center of the pipe.

國內寄存資訊(請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊(請依寄存國家、機構、日期、號碼順序註記) 無Domestic deposit information (please note in the order of deposit institution, date and number) no Foreign hosting information (please note in the order of hosting country, institution, date and number) no

100:環形加熱元件 100: Ring heating element

102:區域 102: area

104:區域 104: area

106:環形通道/環形冷卻流體通道 106: Ring channel / ring cooling fluid channel

108:環形殼體 108: Ring shell

150:冷卻流體 150: Cooling fluid

160:流體間隙 160: fluid gap

200:耐火陶瓷材料 200: Refractory ceramic material

Claims (20)

一種導管加熱設備,包括: 一環形加熱元件,周向環繞該導管之至少一部分,該環形加熱元件包括一環形通道,該環形通道經配置以使一冷卻流體流過其中; 其中: 該環形加熱元件至少部分地被在一氛圍中含有的一耐火陶瓷材料環繞; 該氛圍之一露點高於該冷卻流體之一溫度;以及 該加熱元件包括一界面區域,該界面區域包括一金屬或金屬合金,該界面區域在該環形通道與該耐火陶瓷材料之間延伸,其中在該界面區域與該耐火陶瓷材料之間的一邊界處的該界面區域之一溫度高於該氛圍之該露點。A catheter heating device, including: An annular heating element circumferentially surrounding at least a part of the duct, the annular heating element including an annular channel configured to allow a cooling fluid to flow therethrough; among them: The annular heating element is at least partially surrounded by a refractory ceramic material contained in an atmosphere; A dew point of the atmosphere is higher than a temperature of the cooling fluid; and The heating element includes an interface area, the interface area includes a metal or metal alloy, the interface area extends between the annular channel and the refractory ceramic material, wherein at a boundary between the interface area and the refractory ceramic material The temperature of one of the interface areas is higher than the dew point of the atmosphere. 如請求項1所述之設備,其中該界面區域包括環繞該環形通道的一環形殼體及在該環形通道與該環形殼體之間延伸的一流體間隙。The device according to claim 1, wherein the interface area includes an annular casing surrounding the annular passage and a fluid gap extending between the annular passage and the annular casing. 如請求項2所述之設備,其中該流體間隙包括空氣。The apparatus according to claim 2, wherein the fluid gap includes air. 如請求項2所述之設備,其中該流體間隙包括一氣體,並且將該氣體之一溫度及露點控制在一預定的溫度及露點範圍內。The apparatus according to claim 2, wherein the fluid gap includes a gas, and a temperature and dew point of the gas are controlled within a predetermined temperature and dew point range. 如請求項4所述之設備,其中將該氣體之該溫度控制為高於該氛圍之該露點,並且將該氣體之該露點控制為低於該冷卻流體之該溫度。The apparatus according to claim 4, wherein the temperature of the gas is controlled to be higher than the dew point of the atmosphere, and the dew point of the gas is controlled to be lower than the temperature of the cooling fluid. 如請求項1所述之設備,其中該界面區域包括在該環形通道之至少一部分與該耐火陶瓷材料之間的一環形環。The apparatus of claim 1, wherein the interface area includes an annular ring between at least a portion of the annular channel and the refractory ceramic material. 如請求項1所述之設備,其中該金屬或金屬合金選自鎳、銅、鈀或鉑或其合金。The device according to claim 1, wherein the metal or metal alloy is selected from nickel, copper, palladium or platinum or alloys thereof. 如請求項1所述之設備,其中該冷卻流體包括一液體。The apparatus according to claim 1, wherein the cooling fluid includes a liquid. 如請求項8所述之設備,其中該液體包括水。The apparatus according to claim 8, wherein the liquid includes water. 如請求項1所述之設備,其中該冷卻流體包括選自空氣、氮氣、氧氣、氦氣、氫氣及氖氣中之至少一者。The apparatus according to claim 1, wherein the cooling fluid includes at least one selected from the group consisting of air, nitrogen, oxygen, helium, hydrogen, and neon. 一種加熱一導管之方法,該方法包括以下步驟: 藉由一環形加熱元件周向環繞該導管之至少一部分,該環形加熱元件包括一環形通道及流過其中的一冷卻流體; 其中: 該環形加熱元件至少部分地被在一氛圍中含有的一耐火陶瓷材料環繞; 該氛圍之一露點高於該冷卻流體之一溫度;以及 該加熱元件包括一界面區域,該界面區域包括一金屬或金屬合金,該界面區域在該環形通道與該耐火陶瓷材料之間延伸,其中在該界面區域與該耐火陶瓷材料之間的一邊界處的該界面區域之一溫度高於該氛圍之該露點。A method of heating a catheter, the method comprising the following steps: An annular heating element circumferentially surrounds at least a part of the duct, the annular heating element includes an annular channel and a cooling fluid flowing therethrough; among them: The annular heating element is at least partially surrounded by a refractory ceramic material contained in an atmosphere; A dew point of the atmosphere is higher than a temperature of the cooling fluid; and The heating element includes an interface area, the interface area includes a metal or metal alloy, the interface area extends between the annular channel and the refractory ceramic material, wherein at a boundary between the interface area and the refractory ceramic material The temperature of one of the interface areas is higher than the dew point of the atmosphere. 如請求項11所述之方法,其中該界面區域包括環繞該環形通道的一環形殼體及在該環形通道與該環形殼體之間延伸的一流體間隙。The method according to claim 11, wherein the interface area includes an annular shell surrounding the annular channel and a fluid gap extending between the annular channel and the annular shell. 如請求項12所述之方法,其中該流體間隙包括空氣。The method of claim 12, wherein the fluid gap includes air. 如請求項12所述之方法,其中該流體間隙包括一氣體,並且將該氣體之一溫度及露點控制在一預定的溫度及露點範圍內。The method according to claim 12, wherein the fluid gap includes a gas, and a temperature and a dew point of the gas are controlled within a predetermined temperature and dew point range. 如請求項14所述之方法,其中將該氣體之該溫度控制為高於該氛圍之該露點,並且將該氣體之該露點控制為低於該冷卻流體之該溫度。The method according to claim 14, wherein the temperature of the gas is controlled to be higher than the dew point of the atmosphere, and the dew point of the gas is controlled to be lower than the temperature of the cooling fluid. 如請求項11所述之方法,其中該界面區域包括在該環形通道之至少一部分與該耐火陶瓷材料之間的一環形環。The method of claim 11, wherein the interface area includes an annular ring between at least a portion of the annular channel and the refractory ceramic material. 如請求項11所述之方法,其中該金屬或金屬合金選自鎳、銅、鈀或鉑或其合金。The method according to claim 11, wherein the metal or metal alloy is selected from nickel, copper, palladium or platinum or alloys thereof. 如請求項11所述之方法,其中該冷卻流體包括一液體。The method of claim 11, wherein the cooling fluid includes a liquid. 如請求項18所述之方法,其中該液體包括水。The method of claim 18, wherein the liquid includes water. 如請求項11所述之方法,其中該冷卻流體包括選自空氣、氮氣、氧氣、氦氣、氫氣及氖氣中之至少一者。The method according to claim 11, wherein the cooling fluid includes at least one selected from the group consisting of air, nitrogen, oxygen, helium, hydrogen, and neon.
TW109104623A 2019-02-14 2020-02-14 Conduit heating apparatus and method with improved corrosion resistance TW202035312A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201962805332P 2019-02-14 2019-02-14
US62/805,332 2019-02-14

Publications (1)

Publication Number Publication Date
TW202035312A true TW202035312A (en) 2020-10-01

Family

ID=72045037

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109104623A TW202035312A (en) 2019-02-14 2020-02-14 Conduit heating apparatus and method with improved corrosion resistance

Country Status (5)

Country Link
JP (1) JP7535529B2 (en)
KR (1) KR102700028B1 (en)
CN (1) CN113544100A (en)
TW (1) TW202035312A (en)
WO (1) WO2020167472A1 (en)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07278626A (en) * 1994-04-15 1995-10-24 Nippon Steel Corp Method for filling irregular shaped refractory to surrounding stave cooler in blast furnace
KR20080073508A (en) * 2007-02-06 2008-08-11 서병기 Insulation with space
US8269131B2 (en) 2008-02-28 2012-09-18 Corning Incorporated Nickel-containing flanges for use in direct resistance heating of platinum-containing vessels
US8274018B2 (en) 2010-02-25 2012-09-25 Corning Incorporated Apparatus for use in direct resistance heating of platinum-containing vessels
EP3307683B1 (en) * 2015-06-10 2022-04-20 Corning Incorporated Apparatus and method for conditioning molten glass
JP6765638B2 (en) * 2016-11-25 2020-10-07 日本電気硝子株式会社 Heating device and glass supply pipe
JP2018172225A (en) * 2017-03-31 2018-11-08 AvanStrate株式会社 Device for manufacturing glass substrate and method for manufacturing glass substrate
CN107935360A (en) 2017-11-09 2018-04-20 彩虹集团(邵阳)特种玻璃有限公司 A kind of cover-plate glass platinum channel flange building method

Also Published As

Publication number Publication date
KR102700028B1 (en) 2024-08-30
JP7535529B2 (en) 2024-08-16
JP2022521379A (en) 2022-04-07
KR20210119534A (en) 2021-10-05
CN113544100A (en) 2021-10-22
WO2020167472A1 (en) 2020-08-20

Similar Documents

Publication Publication Date Title
TWI718154B (en) Apparatus and method for conditioning molten glass
TWI761395B (en) Method and apparatus for glass ribbon thermal control
TWI774715B (en) Method and apparatus for managing glass ribbon cooling
WO2017223034A1 (en) Apparatus and method for glass delivery orientation
TWI761524B (en) Methods for reconditioning glass manufacturing systems
TWI756290B (en) High temperature glass melting vessel
TW202035312A (en) Conduit heating apparatus and method with improved corrosion resistance
TW201908250A (en) Method and apparatus for adjustable glass ribbon heat transfer
CN216918999U (en) Glass manufacturing apparatus with leakage mitigation features
TW202417385A (en) Apparatus and method for manufacturing a glass article
TW201821377A (en) Liquid metal viscosity control of molten glass
TW202204272A (en) Apparatus and method for reducing defects in glass melt systems
TW202136161A (en) Apparatus and method for improving electrical current flow in glass melt conduit
TW202335978A (en) Glass melting furnaces and vessels with improved thermal performance
TW202222713A (en) Glass forming body and method of making a glass article using the same