TW202030238A - Dry film, cured product, and electronic component resulting in no bulging of the protective film or cracking of the resin - Google Patents

Dry film, cured product, and electronic component resulting in no bulging of the protective film or cracking of the resin Download PDF

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TW202030238A
TW202030238A TW108131815A TW108131815A TW202030238A TW 202030238 A TW202030238 A TW 202030238A TW 108131815 A TW108131815 A TW 108131815A TW 108131815 A TW108131815 A TW 108131815A TW 202030238 A TW202030238 A TW 202030238A
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resin
film
protective film
resin layer
manufactured
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TWI747040B (en
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遠藤新
中居弘進
播磨英司
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日商太陽油墨製造股份有限公司
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094Multilayer resist systems, e.g. planarising layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/32Layered products comprising a layer of synthetic resin comprising polyolefins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/36Layered products comprising a layer of synthetic resin comprising polyesters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/03Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers with respect to the orientation of features
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/281Applying non-metallic protective coatings by means of a preformed insulating foil
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B38/00Ancillary operations in connection with laminating processes
    • B32B2038/0052Other operations not otherwise provided for
    • B32B2038/0076Curing, vulcanising, cross-linking
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00Coating on the layer surface
    • B32B2255/10Coating on the layer surface on synthetic resin layer or on natural or synthetic rubber layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00Coating on the layer surface
    • B32B2255/26Polymeric coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/748Releasability
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/08PCBs, i.e. printed circuit boards

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  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Laminated Bodies (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)

Abstract

A subject of the present invention is to provide a dry film, which does not cause resin to adhere to a blade even if a cutting process is continuously performed, resulting no cracks or bulging of the resin at the end and no bulging of the protective film. The solution of the present invention is a dry film provided with a carrier film, a resin layer and a protective film, which is characterized in that: the peel strength of the protective film relative to the resin layer is 0.010kgf/cm or more, and the peel strength of the protective film relative to the resin layer is greater than the peel strength of the carrier film relative to the resin layer.

Description

乾膜、硬化物及電子零件Dry film, hardened material and electronic parts

本發明關於乾膜、硬化物及電子零件。The present invention relates to dry films, hardened products and electronic parts.

以往,作為設置於電子機器等所使用的印刷配線板上之阻焊劑或層間絕緣層等保護膜或絕緣層之形成手段之一,利用乾膜(積層膜)(例如專利文獻1)。乾膜係具有將具有所欲的特性之樹脂組成物塗佈於載體膜之上後,經過乾燥步驟而得之樹脂層,一般而言,以更積層有保護與載體膜相反側之面用的保護膜之狀態,流通於市場。將乾膜之樹脂層貼附(以下亦稱為「層合」)於基板後,藉由施予圖型化或硬化處理,可製造具有如上述之保護膜或絕緣層之印刷配線板。Conventionally, as one of the means for forming protective films or insulating layers such as solder resists or interlayer insulating layers that are provided on printed wiring boards used in electronic equipment, etc., dry films (laminated films) have been used (for example, Patent Document 1). The dry film has a resin layer obtained by coating a resin composition with desired characteristics on the carrier film and then undergoing a drying step. Generally speaking, it is a layer for protecting the side opposite to the carrier film. The state of the protective film is circulating in the market. After the resin layer of the dry film is attached (hereinafter also referred to as "laminating") on the substrate, patterning or hardening is applied to produce a printed wiring board with the above-mentioned protective film or insulating layer.

保護膜係在將乾膜黏著至基板時,從樹脂層卸除,當時為了不使樹脂組成物轉印至保護膜(以下亦稱為「樹脂之分離」),以往係在乾膜之製程中,調整條件而使得相對於樹脂組成物之保護膜的剝離強度變小。專利文獻2中揭示作為在保護膜剝離時不發生樹脂剝落的附保護膜之接著片,保護膜剝離強度比載體膜剝離強度更小0.0020kgf/cm以上的附保護膜之接著片。 [先前技術文獻] [專利文獻]The protective film is removed from the resin layer when the dry film is adhered to the substrate. At that time, in order to prevent the resin composition from being transferred to the protective film (hereinafter also referred to as "resin separation"), it was used in the dry film manufacturing process. , Adjust the conditions so that the peel strength of the protective film with respect to the resin composition becomes small. Patent Document 2 discloses an adhesive sheet with a protective film that does not peel off the resin when the protective film is peeled off, and an adhesive sheet with a protective film whose peel strength of the protective film is lower than the peel strength of the carrier film by 0.0020 kgf/cm or more. [Prior Technical Literature] [Patent Literature]

[專利文獻1]日本特開第2015-010179號公報 [專利文獻2]日本發明專利第6353184號公報[Patent Document 1] Japanese Patent Laid-Open No. 2015-010179 [Patent Document 2] Japanese Invention Patent No. 6353184

[發明所欲解決的課題][The problem to be solved by the invention]

具有保護膜與載體膜之前述三層構造乾膜,通常係首先藉由溶劑量將硬化性樹脂組成物予以黏度調整後,塗佈在載體膜上,其次在乾燥爐中乾燥,而在載體膜上形成樹脂層,其後於所製作的乾膜之表面,進行保護膜之貼合而製造長條的乾膜。長條的乾膜之形狀例如為寬度1m、長度1000m之捲筒狀。The aforementioned three-layer dry film with a protective film and a carrier film is usually made by first adjusting the viscosity of the curable resin composition by the amount of solvent, then coating it on the carrier film, and then drying it in a drying oven, and then the carrier film A resin layer is formed on the surface, and then a protective film is attached to the surface of the dry film to produce a long dry film. The shape of the long dry film is, for example, a roll shape with a width of 1 m and a length of 1000 m.

前述長條的乾膜係藉由按照所要求的長度與寬度進行切割加工(裁切),而例如成為寬度經調整至50cm的乾膜,但例如如同前述,在長度1000m中連續地進行切割加工時,於以往的乾膜中,樹脂附著於刀刃,鋒利度變差,結果有造成端部的樹脂之破裂或浮起、保護膜之浮起的問題。The aforementioned long dry film is cut (cut) according to the required length and width, for example, to become a dry film whose width is adjusted to 50 cm, but for example, as mentioned above, the cutting process is continuously performed in a length of 1000 m At this time, in the conventional dry film, the resin adheres to the blade and the sharpness deteriorates. As a result, the resin at the end may be broken or floated, and the protective film may float.

因此,本發明之目的在於提供乾膜、該乾膜的樹脂層之硬化物及具有該硬化物之電子零件,該乾膜係即使連續地進行切割加工,也不使樹脂附著於刀刃而鋒利度變差,結果不發生端部的樹脂之破裂或浮起、保護膜之浮起。 [解決課題的手段]Therefore, the object of the present invention is to provide a dry film, a cured product of the resin layer of the dry film, and an electronic component having the cured product. Even if the dry film is continuously cut, the resin does not adhere to the blade and is sharp. As a result, the resin at the end will not be broken or floated, and the protective film will not float. [Means to solve the problem]

發明者們專心致力地檢討,發現藉由將保護膜充分地接著於樹脂層,相對於樹脂層之保護膜的剝離強度滿足一定條件之乾膜,可解決上述課題,而且於該情況中,也沒有當初掛慮的將保護膜從樹脂層卸除時的樹脂組成物向保護膜之轉印者,終於完成本發明。即,本發明之乾膜係一種具備載體膜、樹脂層與保護膜之乾膜,其特徵在於:相對於前述樹脂層之前述保護膜的剝離強度為0.010kgf/cm以上,且相對於前述樹脂層之前述保護膜的剝離強度大於相對於前述樹脂層之前述載體膜的剝離強度。The inventors intensively reviewed and found that by fully adhering the protective film to the resin layer, a dry film whose peel strength relative to the resin layer’s protective film satisfies a certain condition can solve the above-mentioned problems, and in this case, also The transfer of the resin composition to the protective film when the protective film was removed from the resin layer was not initially concerned, and finally completed the present invention. That is, the dry film of the present invention is a dry film provided with a carrier film, a resin layer, and a protective film, and is characterized in that the peel strength of the protective film relative to the resin layer is 0.010 kgf/cm or more, and is relative to the resin layer. The peel strength of the protective film of the layer is greater than the peel strength of the carrier film of the resin layer.

本發明之乾膜係前述保護膜的剝離強度較佳為比相對於前述樹脂層之前述載體膜的剝離強度大0.005kgf/cm以上。The peel strength of the dry film-based protective film of the present invention is preferably greater than the peel strength of the carrier film relative to the resin layer by 0.005 kgf/cm or more.

本發明之乾膜係厚度較佳為60μm以上。The thickness of the dry film of the present invention is preferably 60 μm or more.

本發明之乾膜係前述保護膜較佳為具有黏著性。The above-mentioned protective film of the dry film system of the present invention preferably has adhesiveness.

本發明之硬化物之特徵為將前述乾膜的樹脂層進行硬化而得者。The cured product of the present invention is characterized by curing the resin layer of the aforementioned dry film.

本發明之電子零件之特徵為具有前述硬化物。 [發明的效果]The electronic component of the present invention is characterized by having the aforementioned hardened substance. [Effects of the invention]

依照本發明,可提供乾膜、該乾膜的樹脂層之硬化物及具有該硬化物之電子零件,該乾膜係即使連續地進行切割加工,也不使樹脂附著於刀刃而鋒利度變差,結果不發生端部的樹脂之破裂或浮起、保護膜之浮起。According to the present invention, it is possible to provide a dry film, a cured product of the resin layer of the dry film, and an electronic component having the cured product. Even if the dry film is continuously cut, the resin does not adhere to the blade and the sharpness is deteriorated. , As a result, no cracking or floating of the resin at the end and floating of the protective film occurred.

[實施發明的形態] <乾膜>[The form of implementing the invention] <Dry film>

圖1中顯示本發明之乾膜的概略剖面圖。本發明之三層構造的乾膜11具有將樹脂層12形成在載體膜13上,積層有保護膜14之構造。本發明之乾膜之特徵為於如此的三層構造之乾膜中,相對於樹脂層之保護膜的剝離強度為0.010kgf/cm以上,且相對於樹脂層之保護膜的剝離強度大於相對於樹脂層之載體膜的剝離強度。此處,作為相對於樹脂層之保護膜的剝離強度之上限值,例如只要0.150kgf/cm以下,則可良好地防止樹脂組成物轉印至保護膜者。 又,於本發明之乾膜中,相對於樹脂層之保護膜的剝離強度較佳為比相對於樹脂層之載體膜的剝離強度大0.005kgf/cm以上。此處,作為前述剝離強度之差的上限值,例如只要0.150kgf/cm以下,則可良好地防止樹脂組成物轉印至保護膜者。Fig. 1 shows a schematic cross-sectional view of the dry film of the present invention. The dry film 11 of the three-layer structure of the present invention has a structure in which a resin layer 12 is formed on a carrier film 13 and a protective film 14 is laminated. The dry film of the present invention is characterized in that in such a three-layered dry film, the peel strength of the protective film relative to the resin layer is 0.010kgf/cm or more, and the peel strength of the protective film relative to the resin layer is greater than The peel strength of the carrier film of the resin layer. Here, as the upper limit of the peel strength of the protective film with respect to the resin layer, for example, if it is 0.150 kgf/cm or less, it is possible to well prevent the resin composition from being transferred to the protective film. Furthermore, in the dry film of the present invention, the peel strength of the protective film with respect to the resin layer is preferably greater than the peel strength of the carrier film with respect to the resin layer by 0.005 kgf/cm or more. Here, as the upper limit of the difference in peel strength, for example, if it is 0.150 kgf/cm or less, it is possible to well prevent the resin composition from being transferred to the protective film.

本發明之乾膜由於滿足前述之要件,故即使連續地進行切割加工,也不使樹脂附著於刀刃而鋒利度變差,結果不發生端部的樹脂之破裂或浮起、保護膜之浮起。如此的效果係在具有60μm以上的厚度之乾膜中顯著,在具有100μm以上的厚度之乾膜中更顯著,在具有150μm以上的厚度之乾膜中特別顯著。乾膜的厚度之上限值為500μm。Since the dry film of the present invention satisfies the aforementioned requirements, even if the cutting process is continuously performed, the resin will not adhere to the blade and the sharpness will not deteriorate. As a result, the resin at the end will not break or float, and the protective film will not float. . Such an effect is significant in dry films having a thickness of 60 μm or more, more significant in dry films having a thickness of 100 μm or more, and particularly significant in dry films having a thickness of 150 μm or more. The upper limit of the thickness of the dry film is 500 μm.

[保護膜] 所謂的保護膜,就是以防止灰塵等附著於乾膜的樹脂層之表面為目的,或以在切割加工乾膜之際防止樹脂層表面的物理損傷,同時提高操作性為目的,設置於樹脂層之與載體膜相反的面。作為用於保護膜得材質,例如可舉出聚乙烯、聚丙烯、聚氯乙烯等之聚烯烴、PET、PEN等之聚酯、聚碳酸酯、聚醯亞胺等。[Protective Film] The so-called protective film is to prevent dust etc. from adhering to the surface of the resin layer of the dry film, or to prevent physical damage to the surface of the resin layer when the dry film is cut and process the dry film, and to improve the workability. It is installed on the resin layer. It is the opposite side of the carrier film. Examples of materials used for the protective film include polyolefins such as polyethylene, polypropylene, and polyvinyl chloride, polyesters such as PET and PEN, polycarbonate, and polyimide.

作為本發明之保護膜,只要滿足:相對於樹脂層之保護膜的剝離強度為0.010kgf/cm以上,相對於樹脂層之前述保護膜的剝離強度大於相對於樹脂層之前述載體膜的剝離強度之本發明的要件,則可使用市售的任一保護膜。例如,王子F-TEX公司製雙軸延伸聚丙烯薄膜MA-411、MA-420、MAM-430等習知的薄膜,亦由於可調整貼合時的壓力或溫度,提高保護膜的剝離強度而使用,較佳的薄膜可舉出FUKUMURA化學公司製自黏著雙軸延伸聚丙烯薄膜100M、150M、300M及日東SHINKO公司製耐熱性微黏著特殊聚酯薄膜T-APN10、SOMAR公司製的Somatac WA系列(PS-105WA、PS-1080WA、PS-503WA等)、寺岡製作所公司製的薄膜遮蔽膠帶(465 #40等)、PEEK薄膜黏著膠帶(4920 0.012等)、矽氧橡膠雙面黏著膠帶(9030W)、LINTEC公司製的黏著劑(MF、MA、Ntac、REPOP聚矽氧微黏著等)經形成在PET或OPP薄膜上者、日立化成公司製的黏著薄膜「Hitalex」、A-2400系列、D-5700系列、GS-1000系列、L-1200系列、L-3300系列、BN-1000、東洋化學公司製的Lioelm LE950系列(LE951、LE957L)、PANAC公司製的Panaprotect(HP、CT、ET、MK等)、巴川公司製的黏著薄膜(CA01、CA22、CA91、CA31、CA32、Clearvisible等)、DNP公司製的DNP耐熱黏著薄膜等。As the protective film of the present invention, as long as it satisfies: the peel strength of the protective film relative to the resin layer is 0.010kgf/cm or more, and the peel strength of the protective film relative to the resin layer is greater than the peel strength of the carrier film relative to the resin layer For the requirements of the present invention, any commercially available protective film can be used. For example, conventional films such as biaxially stretched polypropylene films MA-411, MA-420, and MAM-430 manufactured by Oji F-TEX Co., Ltd. can also adjust the pressure or temperature during bonding to improve the peel strength of the protective film. Suitable films for use include self-adhesive biaxially stretched polypropylene films 100M, 150M, 300M manufactured by Fukumura Chemical Co., Ltd., heat-resistant micro-adhesive special polyester film T-APN10 manufactured by Nitto Shinko Co., and Somatac WA series manufactured by Somar Co. (PS-105WA, PS-1080WA, PS-503WA, etc.), Teraoka Manufacturing Co., Ltd. film masking tape (465 #40, etc.), PEEK film adhesive tape (4920 0.012, etc.), silicone rubber double-sided adhesive tape (9030W) , LINTEC's adhesives (MF, MA, Ntac, REPOP polysiloxane micro-adhesive, etc.) are formed on PET or OPP film, Hitachi Chemical's adhesive film "Hitalex", A-2400 series, D- 5700 series, GS-1000 series, L-1200 series, L-3300 series, BN-1000, Lioelm LE950 series (LE951, LE957L) manufactured by Toyo Chemical Company, Panaprotect (HP, CT, ET, MK, etc.) manufactured by PANAC ), adhesive films made by Bachuan Company (CA01, CA22, CA91, CA31, CA32, Clearvisible, etc.), DNP heat-resistant adhesive films made by DNP, etc.

此處,本發明中所謂相對於樹脂層之保護膜的剝離強度,就是指將保護膜對於樹脂層在垂直方向(90°方向)中撕開時的剝離強度(90°剝離強度),將保護膜對於樹脂層以撕開角度90°撕開時的剝離強度,係可藉由拉伸試驗機測定而求出。作為拉伸試驗機,例如可舉出島津製作所製萬能拉伸試驗機AG-X。Here, in the present invention, the peel strength of the protective film relative to the resin layer refers to the peel strength (90° peel strength) when the protective film is torn off the resin layer in the vertical direction (90° direction). The peel strength when the film is torn to the resin layer at a tear angle of 90° can be determined by a tensile testing machine. As a tensile tester, for example, the universal tensile tester AG-X manufactured by Shimadzu Corporation can be mentioned.

將保護膜貼合於樹脂層時,較佳為在硬化性樹脂組成物的最低熔融溫度左右之溫度條件下,藉由輥或加壓壓接等,將保護膜層合處理至樹脂層。層合處理的壓接壓力較佳為0.01kgf/cm2 ~20kgf/cm2 。此處,最低熔融溫度之定義係如以下。 <最低熔融溫度之定義> 將所製作的乾膜(40μm),使用真空層合機MVLP-500 (名機公司製),於條件(溫度50℃、時間120sec、壓力0.5MPa、剝離保護膜面)下,製作厚度200μm、尺寸50×50mm的熔融黏度測定用之樣品。接著,加工成測定尺寸φ20mm的圓形,剝離表裏的PET薄膜,製作測定用的樣品。然後,使用流變計HAAKE MARS40(Thermo Fisher製),藉由以下之條件下進行熔融黏度的測定時之黏度而定義。以感測器平行板φ20mm、應變2%、頻率1Hz之振動模式、測定樣品的間隙180μm、從室溫起5℃/min之升溫方法進行測定,由材料的黏度變最低時之溫度來定義。When bonding the protective film to the resin layer, it is preferable to laminate the protective film to the resin layer by a roll or pressure bonding under a temperature condition around the lowest melting temperature of the curable resin composition. The crimping pressure of the lamination process is preferably 0.01 kgf/cm 2 to 20 kgf/cm 2 . Here, the definition of the minimum melting temperature is as follows. <Definition of the minimum melting temperature> Use a vacuum laminator MVLP-500 (manufactured by Meiji Corporation) to produce a dry film (40μm) under the conditions (temperature 50℃, time 120sec, pressure 0.5MPa, peeling off the protective film surface ), prepare a sample for melt viscosity measurement with a thickness of 200 μm and a size of 50×50 mm. Next, it was processed into a circle with a measurement size of φ20 mm, and the PET film on the front and back was peeled off to prepare a sample for measurement. Then, using a rheometer HAAKE MARS40 (manufactured by Thermo Fisher), it was defined by the viscosity when the melt viscosity was measured under the following conditions. The measurement is performed with a sensor parallel plate φ20mm, strain 2%, frequency 1Hz vibration mode, measurement sample gap 180μm, 5°C/min from room temperature, and the temperature rise is defined by the temperature when the viscosity of the material becomes the lowest.

此處,一邊使用不具有微黏著性的保護膜,一邊為了將相對於樹脂層之保護膜剝離強度擴大到本發明之範圍,必須比以往的貼合溫度更提高貼合溫度,此時當在貼合溫度發生不均時,或貼合溫度變過高時,會發生保護膜伸長之問題,或在貼合後的收縮時由於保護膜與樹脂層或載體膜的收縮率之差異而成為捲曲狀態之問題。因此,基於本發明中不提高貼合溫度而能提高保護膜的剝離強度之理由,較佳為使用微黏著保護膜等之具有黏著性的保護膜。作為具有黏著性的保護膜之黏著層的構成材料,較佳為苯乙烯系聚合物或苯乙烯-異戊二烯系聚合物。Here, while using a protective film that does not have micro-adhesive properties, in order to expand the peel strength of the protective film with respect to the resin layer to the scope of the present invention, the bonding temperature must be higher than the conventional bonding temperature. When the bonding temperature is uneven, or when the bonding temperature becomes too high, the problem of elongation of the protective film may occur, or it may become curled due to the difference in the shrinkage rate of the protective film and the resin layer or carrier film during shrinkage after bonding. The question of status. Therefore, for the reason that the peel strength of the protective film can be improved without increasing the bonding temperature in the present invention, it is preferable to use an adhesive protective film such as a micro-adhesive protective film. As the constituent material of the adhesive layer of the adhesive protective film, a styrene-based polymer or a styrene-isoprene-based polymer is preferable.

又,作為保護膜,從能減少向樹脂層的積層後之冷卻收縮之觀點來看,較佳為使用雙軸延伸聚丙烯薄膜。In addition, as the protective film, it is preferable to use a biaxially stretched polypropylene film from the viewpoint of reducing cooling shrinkage after lamination to the resin layer.

保護膜之厚度係沒有特別的制限,可在大約10~100μm之範圍中按照用途而適宜選擇。於保護膜之設置樹脂層之面,較佳為施予壓花加工或電暈處理、微黏著處理等之提高密著性的處理或脫模處理。The thickness of the protective film is not particularly limited, and can be appropriately selected in the range of about 10-100 μm according to the application. The surface where the resin layer is provided on the protective film is preferably subjected to embossing processing, corona processing, micro-adhesion processing, or other processing to improve adhesion or release processing.

[樹脂層] 本發明之乾膜的樹脂層係一般被稱為B階段狀態的狀態,由硬化性樹脂組成物所得者,具體而言,將硬化性樹脂組成物塗佈於薄膜後,經過乾燥步驟而得。樹脂層之厚度係沒有特別的制限,例如厚度為1~200μm即可。本發明中厚度大時平坦性優異,故例如厚度為30μm以上,尤其50μm以上,進一步100μm以上,也可適用。還有,重疊複數的本發明之乾膜的樹脂層,也可形成厚度超過200μm的樹脂層。當時,使用輥層合機或真空層合機即可。[Resin layer] The resin layer of the dry film of the present invention is generally referred to as the state of the B-stage state, and is obtained from the curable resin composition, specifically, the curable resin composition is applied to the film and then dried. The thickness of the resin layer is not particularly limited. For example, the thickness may be 1 to 200 μm. In the present invention, when the thickness is large, the flatness is excellent. Therefore, for example, the thickness is 30 μm or more, especially 50 μm or more, and further 100 μm or more. In addition, by stacking plural resin layers of the dry film of the present invention, a resin layer having a thickness of more than 200 μm may be formed. At that time, a roll laminator or a vacuum laminator was sufficient.

前述樹脂層較佳為包含硬化性樹脂,例如可包含環氧樹脂。環氧樹脂係具有環氧基的樹脂,可使用習知的任一者。可舉出分子中具有2個環氧基的2官能性環氧樹脂、分子中具有3個以上的環氧基之多官能環氧樹脂等。還有,亦可為經氫化的環氧樹脂。前述樹脂層包含半固體環氧樹脂及結晶性環氧樹脂之至少任一種作為前述環氧樹脂。半固體環氧樹脂及結晶性環氧樹脂各自可單獨1種或組合2種類以上使用。又,前述樹脂層也可含有固體環氧樹脂或液狀環氧樹脂。於本說明書中,固體環氧樹脂係指在40℃下固體狀的環氧樹脂,半固體環氧樹脂係指在20℃下固體狀,在40℃下液狀的環氧樹脂,液狀環氧樹脂係指在20℃下液狀的環氧樹脂。液狀的判定係依據關於危險物的試驗及性質形狀之省令(日本平成元年自治省令第1號)之附件第2之「液狀的確認方法」進行。例如,以日本特開2016-079384號公報之段落23~25中記載的方法進行。又,結晶性環氧樹脂係意指結晶性強的環氧樹脂,於熔點以下之溫度,高分子鏈規則正確排列,雖然為固體樹脂,也在熔融時成為與液狀樹脂同樣的低黏度之熱硬化性環氧樹脂。The aforementioned resin layer preferably contains a curable resin, for example, an epoxy resin. The epoxy resin is a resin having an epoxy group, and any known ones can be used. Examples include bifunctional epoxy resins having two epoxy groups in the molecule, and multifunctional epoxy resins having three or more epoxy groups in the molecule. In addition, it may be a hydrogenated epoxy resin. The resin layer contains at least any one of a semi-solid epoxy resin and a crystalline epoxy resin as the epoxy resin. Semi-solid epoxy resin and crystalline epoxy resin can be used individually by 1 type or in combination of 2 or more types. In addition, the aforementioned resin layer may contain a solid epoxy resin or a liquid epoxy resin. In this specification, solid epoxy resin means solid epoxy resin at 40°C, semi-solid epoxy resin means solid epoxy resin at 20°C, liquid epoxy resin at 40°C, liquid ring Oxygen resin refers to epoxy resin that is liquid at 20°C. The determination of the liquid state is based on the "Method of Confirming Liquid State" in Annex No. 2 of the Provincial Order concerning the test and the nature and shape of hazardous materials (Japan Autonomous Ministry Order No. 1). For example, it is performed by the method described in paragraphs 23 to 25 of JP 2016-079384 A. In addition, crystalline epoxy resin means an epoxy resin with strong crystallinity. At a temperature below the melting point, the polymer chains are regularly arranged. Although it is a solid resin, it has the same low viscosity as a liquid resin during melting. Thermosetting epoxy resin.

作為半固體環氧樹脂,可舉出DIC公司製EPICLON 860、EPICLON 900-IM、EPICLON EXA-4816、EPICLON EXA-4822、東都化成公司製Epotohto YD-134、三菱化學公司製jER834、jER872、住友化學公司製ELA-134等之雙酚A型環氧樹脂;DIC公司製EPICLON HP-4032等之萘型環氧樹脂;DIC公司製EPICLON N-740等之苯酚酚醛清漆型環氧樹脂等。 作為半固體狀環氧樹脂,較佳為包含選自由雙酚A型環氧樹脂、萘型環氧樹脂及苯酚酚醛清漆型環氧樹脂所成之群組的至少1種。藉由包含半固體狀環氧樹脂,硬化物之玻璃轉移溫度(Tg)高,CTE變低,抗龜裂性優異。Examples of semi-solid epoxy resins include EPICLON 860, EPICLON 900-IM, EPICLON EXA-4816, EPICLON EXA-4822 manufactured by DIC, Epotohto YD-134 manufactured by Toto Kasei Co., Ltd., jER834 and jER872 manufactured by Mitsubishi Chemical Corporation, and Sumitomo Chemical Bisphenol A type epoxy resin such as ELA-134 manufactured by the company; naphthalene type epoxy resin such as EPICLON HP-4032 manufactured by DIC company; phenol novolac type epoxy resin such as EPICLON N-740 manufactured by DIC company. The semisolid epoxy resin preferably contains at least one selected from the group consisting of bisphenol A epoxy resin, naphthalene epoxy resin, and phenol novolak epoxy resin. By including semi-solid epoxy resin, the glass transition temperature (Tg) of the hardened product is high, the CTE is low, and the crack resistance is excellent.

作為結晶性環氧樹脂,例如可使用具有聯苯構造、硫醚構造、伸苯基構造、萘構造等之結晶性環氧樹脂。聯苯型的環氧樹脂例如可提供三菱化學公司製jER YX4000、jER YX4000H、jER YL6121H、jER YL6640、jER YL6677,二苯基硫醚型環氧樹脂例如可提供東都化成公司製Epotohto YSLV-120TE,伸苯基型環氧樹脂例如可提供東都化成公司製Epotohto YDC-1312,萘型環氧樹脂例如可提供DIC公司製EPICLON HP-4032、EPICLON HP-4032D、EPICLON HP-4700。又,作為結晶性環氧樹脂,亦可使用東都化成公司製Epotohto YSLV-90C、日產化成公司製TEPIC-S(三環氧丙基異三聚氰酸酯)。As the crystalline epoxy resin, for example, a crystalline epoxy resin having a biphenyl structure, a sulfide structure, a phenylene structure, a naphthalene structure, or the like can be used. Biphenyl type epoxy resins can be provided, for example, by Mitsubishi Chemical Corporation jER YX4000, jER YX4000H, jER YL6121H, jER YL6640, jER YL6677, and diphenyl sulfide type epoxy resins can be provided, for example, by Totoh Kasei Co., Ltd. Epotohto YSLV-120TE, The phenylene type epoxy resin can be provided, for example, by Tohto Kasei Co., Ltd. Epotohto YDC-1312, and the naphthalene type epoxy resin can be provided, for example, by DIC Co., Ltd. EPICLON HP-4032, EPICLON HP-4032D, and EPICLON HP-4700. In addition, as the crystalline epoxy resin, Epotohto YSLV-90C manufactured by Totoh Chemical Co., Ltd. and TEPIC-S (triglycidyl isocyanurate) manufactured by Nissan Chemical Co., Ltd. can also be used.

作為固體環氧樹脂,可舉出DIC公司製HP-4700(萘型環氧樹脂)、DIC公司製EXA4700(4官能萘型環氧樹脂)、日本化藥公司製NC-7000(含有萘骨架的多官能固體環氧樹脂)等之萘型環氧樹脂;日本化藥公司製EPPN-502H(三酚環氧樹脂)等之酚類與具有酚性羥基的芳香族醛之縮合物的環氧化物(三酚型環氧樹脂);DIC公司製EPICLON HP-7200H(含有二環戊二烯骨架的多官能固體環氧樹脂)等之二環戊二烯芳烷基型環氧樹脂;日本化藥公司製NC-3000H(含有聯苯骨架的多官能固體環氧樹脂)等之聯苯芳烷基型環氧樹脂;日本化藥公司製NC-3000L等之聯苯/苯酚酚醛清漆型環氧樹脂;DIC公司製EPICLON N660、EPICLON N690、N770、日本化藥公司製EOCN-104S等之酚醛清漆型環氧樹脂;新日鐵住金化學公司製TX0712等之含磷環氧樹脂;日產化學公司製TEPIC等之參(2,3-環氧基丙基)異三聚氰酸酯等。由於包含固體環氧樹脂,硬化物的玻璃轉移溫度變高,耐熱性優異。Examples of solid epoxy resins include HP-4700 (naphthalene type epoxy resin) manufactured by DIC, EXA4700 (4-functional naphthalene epoxy resin) manufactured by DIC, and NC-7000 (containing naphthalene skeleton) manufactured by Nippon Kayaku Co., Ltd. Multifunctional solid epoxy resin) and other naphthalene type epoxy resins; EPPN-502H (triphenol epoxy resin) manufactured by Nippon Kayaku Co., Ltd., etc. Epoxides of condensation products of phenols and aromatic aldehydes with phenolic hydroxyl groups (Triphenol type epoxy resin); Dicyclopentadiene aralkyl type epoxy resin such as EPICLON HP-7200H (multifunctional solid epoxy resin containing dicyclopentadiene skeleton) manufactured by DIC; Nippon Kayaku Biphenyl aralkyl type epoxy resin such as NC-3000H (multifunctional solid epoxy resin containing biphenyl skeleton) manufactured by the company; Biphenyl/phenol novolac type epoxy resin such as NC-3000L manufactured by Nippon Kayaku Co., Ltd. ; EPICLON N660, EPICLON N690, N770 manufactured by DIC Corporation, EOCN-104S manufactured by Nippon Kayaku Co., Ltd. Novolac epoxy resin; Nippon Steel & Sumikin Chemical Corporation TX0712, etc. phosphorous epoxy resin; TEPIC manufactured by Nissan Chemical Co., Ltd. Etc. (2,3-epoxypropyl) isocyanurate, etc. Since it contains a solid epoxy resin, the glass transition temperature of the cured product becomes high, and the heat resistance is excellent.

作為液狀環氧樹脂,可舉出雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚AF型環氧樹脂、苯酚酚醛清漆型環氧樹脂、第三丁基-兒茶酚型環氧樹脂、環氧丙基胺型環氧樹脂、胺基苯酚型環氧樹脂、脂環式環氧樹脂等。由於包含液狀環氧樹脂,乾膜之可撓性優異。Examples of liquid epoxy resins include bisphenol A epoxy resins, bisphenol F epoxy resins, bisphenol AF epoxy resins, phenol novolac epoxy resins, and tertiary butyl catechol Type epoxy resin, glycidylamine type epoxy resin, aminophenol type epoxy resin, alicyclic epoxy resin, etc. Since it contains liquid epoxy resin, the dry film has excellent flexibility.

半固體環氧樹脂及結晶性環氧樹脂之摻合量係合計,以環氧樹脂全量基準,較佳為5~40質量%,更佳為10~30質量%。若為上述範圍內,則乾膜的樹脂層之黏性與柔軟性優異。The total blending amount of the semi-solid epoxy resin and the crystalline epoxy resin is based on the total amount of the epoxy resin, preferably 5-40% by mass, more preferably 10-30% by mass. If it is within the above range, the resin layer of the dry film has excellent viscosity and flexibility.

[無機填料] 前述樹脂層較佳為含有無機填料。藉由摻合無機填料,而抑制所得之硬化物的硬化收縮,提高密著性、硬度、配合在絕緣層之周圍的銅等之導體層與熱強度所致的抗龜裂性等之熱特性。作為無機填料,可使用習知的無機填料,並無特定,例如可舉出硫酸鋇、鈦酸鋇、無定形二氧化矽、結晶性二氧化矽、熔融二氧化矽、球狀二氧化矽等之二氧化矽、滑石、黏土、諾伊堡(Neuburg)矽土粒子、勃姆石、碳酸鎂、碳酸鈣、氧化鈦、氧化鋁、氫氧化鋁、氮化矽、氮化鋁、鋯酸鈣等之體質顏料,或銅、錫、鋅、鎳、銀、鈀、鋁、鐵、鈷、金、鉑等之金屬粉體。無機填料較佳為球狀粒子。其中,較佳為二氧化矽,抑制硬化性組成物之硬化物的硬化收縮,變成更低的CTE,且提高密著性、硬度等之特性。又,如氧化鋁,比重大的無機填料一般沈降速度變快,但由於在本發明中能抑制沈降,故可適用。無機填料的平均粒徑(中值粒徑、D50)較佳為0.01~10μm。作為無機填料,從切割加工性之觀點來看,較佳為平均粒徑是0.01~3μm的二氧化矽。還有,於本說明書中,無機填料的平均粒徑係不僅一次粒子的粒徑,而且也包含二次粒子(凝聚體)的粒徑之平均粒徑。平均粒徑係可藉由雷射繞射式粒徑分布測定裝置求出。作為雷射繞射法之測定裝置,可舉出MicrotracBel公司製Nanotrac wave等。[Inorganic Filler] The aforementioned resin layer preferably contains an inorganic filler. By blending inorganic fillers, the hardening shrinkage of the obtained hardened material is suppressed, and the adhesion, hardness, and thermal characteristics of the conductive layer such as copper and the like around the insulating layer and the thermal resistance due to the thermal strength are improved. . As the inorganic filler, conventional inorganic fillers can be used, and they are not specified, for example, barium sulfate, barium titanate, amorphous silica, crystalline silica, fused silica, spherical silica, etc. Of silicon dioxide, talc, clay, Neuburg silica particles, boehmite, magnesium carbonate, calcium carbonate, titanium oxide, aluminum oxide, aluminum hydroxide, silicon nitride, aluminum nitride, calcium zirconate Extender pigments such as copper, tin, zinc, nickel, silver, palladium, aluminum, iron, cobalt, gold, platinum and other metal powders. The inorganic filler is preferably spherical particles. Among them, silicon dioxide is preferred, which suppresses the curing shrinkage of the cured product of the curable composition, becomes lower CTE, and improves the properties such as adhesion and hardness. In addition, as for alumina, inorganic fillers with a high specific gravity generally have a faster sedimentation rate, but they are applicable because sedimentation can be suppressed in the present invention. The average particle diameter (median particle diameter, D50) of the inorganic filler is preferably 0.01 to 10 μm. As the inorganic filler, from the viewpoint of cutting processability, silica having an average particle diameter of 0.01 to 3 μm is preferred. In this specification, the average particle diameter of the inorganic filler is not only the particle diameter of the primary particles, but also the average particle diameter of the secondary particles (aggregates). The average particle size can be determined by a laser diffraction particle size distribution measuring device. As a measuring device of the laser diffraction method, the Nanotrac wave manufactured by Microtrac Bel, etc. can be mentioned.

前述無機填料係可被表面處理。作為表面處理,進行偶合劑之表面處理,或氧化鋁處理等之不導入有機基之表面處理。無機填料之表面處理方法係沒有特別的限定,只要使用眾所周知慣用之方法即可,只要以具有硬化性反應基的表面處理劑,例如以具有硬化性反應基作為有機基的偶合劑等,處理無機填料之表面即可。The aforementioned inorganic filler system may be surface-treated. As the surface treatment, the surface treatment of the coupling agent or the surface treatment such as alumina treatment without introducing organic groups is performed. The surface treatment method of the inorganic filler is not particularly limited, as long as the well-known and commonly used method is used, as long as the surface treatment agent with a curable reactive group, for example, a coupling agent with a curable reactive group as an organic group, is used to treat the inorganic The surface of the filler is sufficient.

無機填料係可以粉體或固體狀態與環氧樹脂等摻合,也可在與溶劑或分散劑混合而成為漿體後,與環氧樹脂等摻合。The inorganic filler system may be blended with epoxy resin or the like in a powder or solid state, or may be blended with epoxy resin or the like after being mixed with a solvent or dispersant to form a slurry.

無機填料係可單獨1種使用,也可作為2種以上的混合物使用。無機填料之摻合量係以乾膜的樹脂層之固體成分全量基準,較佳為10~90質量%,更佳為50~90質量%,尤佳為60~90質量%。無機填料之摻合量為10質量%以上時,可抑制熱膨脹,提高耐熱性,另一方面,90質量%以下時,可抑制龜裂之發生。The inorganic filler system may be used alone or as a mixture of two or more types. The blending amount of the inorganic filler is based on the total solid content of the resin layer of the dry film, and is preferably 10 to 90% by mass, more preferably 50 to 90% by mass, and particularly preferably 60 to 90% by mass. When the blending amount of the inorganic filler is 10% by mass or more, thermal expansion can be suppressed and heat resistance can be improved. On the other hand, when the amount is less than 90% by mass, the occurrence of cracks can be suppressed.

[硬化劑] 前述樹脂層較佳為含有硬化劑。作為硬化劑,可舉出具有酚性羥基的化合物、聚羧酸及其酸酐、具有氰酸酯基的合物、具有活性酯基的化合物、具有馬來醯亞胺基的化合物、脂環式烯烴聚合物等。硬化劑係可單獨1種或組合2種以上使用。[hardener] The aforementioned resin layer preferably contains a curing agent. Examples of hardeners include compounds having phenolic hydroxyl groups, polycarboxylic acids and their anhydrides, compounds having cyanate ester groups, compounds having active ester groups, compounds having maleimide groups, and alicyclic compounds. Olefin polymers, etc. The hardening agent system can be used individually by 1 type or in combination of 2 or more types.

本發明中,前述樹脂層較佳為包含具有酚性羥基的化合物、具有活性酯基的化合物、具有氰酸酯基的化合物及具有馬來醯亞胺基的化合物之至少任一種。藉由使用具有酚性羥基的化合物及具有活性酯基的化合物,可得到低粗度基材或與電路的接著性優異的硬化物。又,藉由使用氰酸酯,硬化物的Tg變高,耐熱性升高,藉由使用具有馬來醯亞胺基的化合物,硬化物的Tg變高,耐熱性升高,同時可減低CTE。In the present invention, the resin layer preferably contains at least any one of a compound having a phenolic hydroxyl group, a compound having an active ester group, a compound having a cyanate group, and a compound having a maleimide group. By using a compound having a phenolic hydroxyl group and a compound having an active ester group, a cured product having a low-thickness substrate or excellent adhesion to a circuit can be obtained. In addition, by using cyanate ester, the Tg of the cured product becomes higher, and the heat resistance is increased. By using a compound having a maleimide group, the Tg of the cured product becomes higher, the heat resistance is increased, and the CTE can be reduced. .

作為前述具有酚性羥基的化合物,可使用苯酚酚醛清漆樹脂、烷基苯酚酚醛清漆樹脂、雙酚A酚醛清漆樹脂、二環戊二烯型酚樹脂、新酚(Xylok)型酚樹脂、萜烯改質酚樹脂、甲酚/萘酚樹脂、聚乙烯基酚類、苯酚/萘酚樹脂、含有α-萘酚骨架的酚樹脂、含有三𠯤骨架的甲酚酚醛清漆樹脂、聯苯基芳烷基型酚樹脂、新酚型苯酚酚醛清漆樹脂等之習知者。 於前述具有酚性羥基的化合物之中,較佳係羥基當量為100g/eq.以上者。作為羥基當量為100g/eq.以上之具有酚性羥基的化合物,例如可舉出二環戊二烯骨架苯酚酚醛清漆樹脂(GDP系列,群榮化學公司製)、新型苯酚酚醛清漆樹脂(MEH-7800,明和化成公司製)、聯苯基芳烷基型酚醛清漆樹脂(MEH-7851,明和化成公司製)、萘酚芳烷基型硬化劑(SN系列,新日鐵住金公司製)、含有三𠯤骨架的甲酚酚醛清漆樹脂(LA-3018-50P,DIC公司製)、含有三𠯤骨架的苯酚酚醛清漆樹脂(LA-705N,DIC公司製)等。As the aforementioned compound having a phenolic hydroxyl group, phenol novolak resin, alkylphenol novolak resin, bisphenol A novolak resin, dicyclopentadiene type phenol resin, Xylok type phenol resin, terpene can be used Modified phenol resin, cresol/naphthol resin, polyvinyl phenols, phenol/naphthol resin, phenol resin containing α-naphthol skeleton, cresol novolak resin containing tri-skeleton, biphenylarane Those who are familiar with basic phenol resin, new phenol phenol novolak resin, etc. Among the aforementioned compounds having a phenolic hydroxyl group, those having a hydroxyl equivalent of 100 g/eq. or more are preferred. Examples of compounds having a phenolic hydroxyl group with a hydroxyl equivalent of 100 g/eq. or more include dicyclopentadiene skeleton phenol novolac resin (GDP series, manufactured by Kunei Chemical Co., Ltd.), and novel phenol novolac resin (MEH- 7800, made by Meiwa Chemical Co., Ltd.), biphenyl aralkyl type novolac resin (MEH-7851, made by Meiwa Chemical Co., Ltd.), naphthol aralkyl type hardener (SN series, manufactured by Nippon Steel & Sumikin Co.), containing Tri-skeleton cresol novolac resin (LA-3018-50P, manufactured by DIC Corporation), tri-skeleton-containing phenol novolac resin (LA-705N, DIC Corporation), etc.

前述具有氰酸酯基的化合物較佳為在一分子中具有2個以上的氰酸酯基(-OCN)之化合物。具有氰酸酯基的化合物係可使用習知的任一者。作為具有氰酸酯基的化合物,例如可舉出苯酚酚醛清漆型氰酸酯樹脂、烷基苯酚酚醛清漆型氰酸酯樹脂、二環戊二烯型氰酸酯樹脂、雙酚A型氰酸酯樹脂、雙酚F型氰酸酯樹脂、雙酚S型氰酸酯樹脂。又,亦可為一部分經三𠯤化的預聚物。The aforementioned compound having a cyanate group is preferably a compound having two or more cyanate groups (-OCN) in one molecule. Any conventional compound can be used for the compound having a cyanate ester group. Examples of the compound having a cyanate group include phenol novolac type cyanate resin, alkylphenol novolac type cyanate resin, dicyclopentadiene type cyanate resin, and bisphenol A type cyanate resin. Ester resin, bisphenol F type cyanate ester resin, bisphenol S type cyanate ester resin. In addition, it can also be a part of the prepolymer that has undergone a triad.

作為市售之具有氰酸酯基的化合物,可舉出苯酚酚醛清漆型多官能氰酸酯樹脂(LONZA日本公司製,PT30S)、雙酚A二氰酸酯的一部分或全部經三𠯤化的三聚物之預聚物(LONZA日本公司製,BA230S75)、含有二環戊二烯構造的氰酸酯樹脂(LONZA日本公司製,DT-4000、DT-7000)等。Examples of commercially available compounds having cyanate groups include phenol novolac type polyfunctional cyanate resin (manufactured by LONZA Japan, PT30S), and bisphenol A dicyanate in which a part or all of it has been trioxidized Prepolymer of trimer (made by LONZA Japan, BA230S75), cyanate ester resin containing dicyclopentadiene structure (made by LONZA Japan, DT-4000, DT-7000), etc.

前述具有活性酯基的化合物較佳為在一分子中具有2個以上的活性酯基之化合物。具有活性酯基的化合物一般可藉由羧酸化合物與羥基化合物之縮合反應而得。其中,較佳為使用苯酚化合物或萘酚化合物作為羥基化合物而得之具有活性酯基的化合物。作為苯酚化合物或萘酚化合物,可舉出對苯二酚、間苯二酚、雙酚A、雙酚F、雙酚S、酚酞、甲基化雙酚A、甲基化雙酚F、甲基化雙酚S、苯酚、鄰甲酚、間甲酚、對甲酚、兒茶酚、α-萘酚、β-萘酚、1,5-二羥基萘、1,6-二羥基萘、2,6-二羥基萘、二羥基二苯基酮、三羥基二苯基酮、四羥基二苯基酮、根皮三酚、苯三酚、二環戊二烯基二苯酚、苯酚酚醛清漆等。又,作為具有活性酯基的化合物,可為萘二酚烷基/苯甲酸型。The aforementioned compound having an active ester group is preferably a compound having two or more active ester groups in one molecule. Compounds with active ester groups can generally be obtained by the condensation reaction of carboxylic acid compounds and hydroxyl compounds. Among them, a compound having an active ester group obtained by using a phenol compound or a naphthol compound as the hydroxyl compound is preferred. Examples of phenol compounds or naphthol compounds include hydroquinone, resorcinol, bisphenol A, bisphenol F, bisphenol S, phenolphthalein, methylated bisphenol A, methylated bisphenol F, methyl Alkylated bisphenol S, phenol, o-cresol, m-cresol, p-cresol, catechol, α-naphthol, β-naphthol, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,6-Dihydroxynaphthalene, dihydroxydiphenyl ketone, trihydroxydiphenyl ketone, tetrahydroxydiphenyl ketone, phloroglucinol, benzenetriol, dicyclopentadienyl diphenol, phenol novolac Wait. In addition, as a compound having an active ester group, a naphthalenediol alkyl/benzoic acid type may be used.

作為市售之具有活性酯基的化合物,可舉出二環戊二烯型之二苯酚化合物,例如可舉出HPC8000-65T (DIC公司製)、HPC8100-65T(DIC公司製)、HPC8150-65T (DIC公司製)。Examples of commercially available compounds having active ester groups include dicyclopentadiene-type diphenol compounds, such as HPC8000-65T (manufactured by DIC Corporation), HPC8100-65T (manufactured by DIC Corporation), HPC8150-65T (Dic company system).

前述具有馬來醯亞胺基的化合物係具有馬來醯亞胺骨架的化合物,可使用習知的任一者。具有馬來醯亞胺基的化合物較佳為具有2以上的馬來醯亞胺骨架,更佳為N,N’-1,3-伸苯基二馬來醯亞胺、N,N’-1,4-伸苯基二馬來醯亞胺、N,N’-4,4-二苯基甲烷雙馬來醯亞胺、1,2-雙(馬來醯亞胺)乙烷、1,6-雙馬來醯亞胺己烷、1,6-雙馬來醯亞胺-(2,2,4-三甲基)己烷、2,2’-雙-[4-(4-馬來醯亞胺苯氧基)苯基]丙烷、3,3’-二甲基-5,5’-二乙基-4,4’-二苯基甲烷雙馬來醯亞胺、4-甲基-1,3-伸苯基雙馬來醯亞胺、雙(3-乙基-5-甲基-4-馬來醯亞胺苯基)甲烷、雙酚A二苯基醚雙馬來醯亞胺、聚苯基甲烷馬來醯亞胺、及此等之寡聚物、以及具有馬來醯亞胺骨架的二胺縮合物之中的至少任一種。前述寡聚物係藉由使上述具有馬來醯亞胺基的化合物之中的單體之具有馬來醯亞胺基的化合物進行縮合而得之寡聚物。The aforementioned compound having a maleimine group is a compound having a maleimine skeleton, and any conventionally known compound can be used. The compound having a maleimide group preferably has a maleimide skeleton of 2 or more, more preferably N,N'-1,3-phenylene dimaleimide, N,N'- 1,4-Phenyldimaleimide, N,N'-4,4-diphenylmethane bismaleimide, 1,2-bis(maleimide)ethane, 1 ,6-Bismaleimide hexane, 1,6-bismaleimide-(2,2,4-trimethyl)hexane, 2,2'-bis-(4-(4- (Maleimide phenoxy) phenyl) propane, 3,3'-dimethyl-5,5'-diethyl-4,4'-diphenylmethane bismaleimide, 4- Methyl-1,3-phenylene bismaleimide, bis(3-ethyl-5-methyl-4-maleiminophenyl)methane, bisphenol A diphenyl ether bismarine Leximine, polyphenylmethane maleimide, and at least any one of these oligomers, and diamine condensates having a maleimine skeleton. The aforementioned oligomer is an oligomer obtained by condensing a compound having a maleimide group among monomers among the above-mentioned maleimide group-containing compounds.

作為市售之具有馬來醯亞胺基的化合物,可舉出BMI-1000(4,4’-二苯基甲烷雙馬來醯亞胺,大和化成工業公司製)、BMI-2300(苯基甲烷雙馬來醯亞胺,大和化成工業公司製)、BMI-3000(m-伸苯基雙馬來醯亞胺,大和化成工業公司製)、BMI-5100(3,3’-二甲基-5,5’-二甲基-4,4’-二苯基甲烷雙馬來醯亞胺,大和化成工業公司製)、BMI-7000(4-甲基-1,3,-伸苯基雙馬來醯亞胺,大和化成工業公司製)、BMI-TMH((1,6-雙馬來醯亞胺-2,2,4-三甲基)己烷,大和化成工業公司製)等。Examples of commercially available compounds having a maleimide group include BMI-1000 (4,4'-diphenylmethane bismaleimide, manufactured by Daiwa Chemical Industry Co., Ltd.), BMI-2300 (phenyl Methane bismaleimide, manufactured by Daiwa Chemical Industry Co., Ltd., BMI-3000 (m-phenylene bismaleimide, manufactured by Daiwa Chemical Industry Co., Ltd.), BMI-5100 (3,3'-dimethyl -5,5'-Dimethyl-4,4'-diphenylmethane bismaleimide, manufactured by Daiwa Chemical Industry Co., Ltd., BMI-7000 (4-methyl-1,3,-phenylene Bismaleimide, manufactured by Daiwa Chemical Co., Ltd.), BMI-TMH ((1,6-Bismaleimide-2,2,4-trimethyl)hexane, manufactured by Daiwa Chemical Co., Ltd.), etc. .

相對於環氧樹脂100質量份,硬化劑之摻合量較佳為20~100質量份,更佳為25~90質量份。The blending amount of the hardener is preferably 20-100 parts by mass, more preferably 25-90 parts by mass relative to 100 parts by mass of epoxy resin.

作為形成前述樹脂層的硬化性樹脂組成物之具體例,可舉出熱硬化性樹脂組成物、光硬化性熱硬化性樹脂組成物、含有光聚合起始劑之光硬化性熱硬化性樹脂組成物、含有光鹼產生劑之光硬化性熱硬化性樹脂組成物、含有光酸產生劑之光硬化性熱硬化性樹脂組成物、負型光硬化性熱硬化性樹脂組成物及正型感光性熱硬化性樹脂組成物、鹼顯像型光硬化性熱硬化性樹脂組成物、溶劑顯像型光硬化性熱硬化性樹脂組成物、膨潤剝離型熱硬化性樹脂組成物、溶解剝離型熱硬化性樹脂組成物,惟不受此等所限定。Specific examples of the curable resin composition forming the aforementioned resin layer include thermosetting resin composition, photocuring thermosetting resin composition, and photocuring thermosetting resin composition containing a photopolymerization initiator. Photocurable thermosetting resin composition containing photoalkali generator, photocurable thermosetting resin composition containing photoacid generator, negative photocuring thermosetting resin composition and positive photosensitive Thermosetting resin composition, alkali-developing photo-curing thermosetting resin composition, solvent-developing photo-curing thermosetting resin composition, swelling peeling type thermosetting resin composition, dissolving peeling type thermosetting The resin composition is not limited by these.

以下,作為一例,關於以不含光硬化性成分的熱硬化性樹脂組成物來形成樹脂層之情況,說明上述成分以外可含有的成分。Hereinafter, as an example, regarding a case where the resin layer is formed from a thermosetting resin composition that does not contain a photocurable component, components that may be contained in addition to the above-mentioned components will be described.

前述樹脂層可含有環氧樹脂以外之熱硬化性樹脂,例如可使用異氰酸酯化合物、封端異氰酸酯化合物、胺基樹脂、苯并㗁𠯤樹脂、碳二亞胺樹脂、環碳酸酯化合物、多官能氧雜環丁烷化合物、環硫化物樹脂等之眾所周知慣用的熱硬化性樹脂。The aforementioned resin layer may contain thermosetting resins other than epoxy resins. For example, isocyanate compounds, blocked isocyanate compounds, amino resins, benzodiazepine resins, carbodiimide resins, cyclic carbonate compounds, and polyfunctional oxygen can be used. Well-known and commonly used thermosetting resins such as ethidium compounds and episulfide resins.

前述樹脂層係為了提高所得之硬化膜的機械強度,可進一步含有熱塑性樹脂。熱塑性樹脂較佳為可溶於溶劑者。可溶於溶劑時,可提高乾膜的柔軟性,抑制龜裂之發生或掉粉。作為熱塑性樹脂,可舉出熱塑性聚羥基聚醚樹脂、或環氧氯丙烷與各種2官能苯酚化合物之縮合物的苯氧基樹脂或存在於其骨架的羥基醚部對羥基經使用各種酸酐或醯氯所酯化的苯氧基樹脂、聚乙烯縮醛樹脂、聚醯胺樹脂、聚醯胺醯亞胺樹脂、嵌段共聚合物等。熱塑性樹脂係可單獨1種或組合2種以上使用。The aforementioned resin layer may further contain a thermoplastic resin in order to increase the mechanical strength of the cured film obtained. The thermoplastic resin is preferably one that is soluble in a solvent. When it is soluble in solvents, it can improve the softness of the dry film and inhibit the occurrence of cracks or powder falling. Examples of thermoplastic resins include thermoplastic polyhydroxy polyether resins, or phenoxy resins of condensates of epichlorohydrin and various bifunctional phenol compounds, or hydroxy ethers existing in the skeleton. Various acid anhydrides or phenols are used for the hydroxyl group. Chlorine esterified phenoxy resin, polyvinyl acetal resin, polyamide resin, polyimide imine resin, block copolymer, etc. The thermoplastic resin system can be used individually by 1 type or in combination of 2 or more types.

前述樹脂層含有高分子樹脂。前述高分子樹脂之玻璃轉移點較佳為-40~20℃,更佳為-15~15℃,特佳為-5~15℃。若為-5~15℃,則可良好地抑制硬化物之翹曲。 又,前述高分子樹脂的重量平均分子量愈高,無機填料的沈降防止效果愈大,故較佳為10萬以上,更佳為20萬以上。上限值例如為100萬以下。The aforementioned resin layer contains a polymer resin. The glass transition point of the aforementioned polymer resin is preferably -40 to 20°C, more preferably -15 to 15°C, particularly preferably -5 to 15°C. If it is -5 to 15°C, the warpage of the hardened product can be suppressed well. In addition, the higher the weight average molecular weight of the aforementioned polymer resin, the greater the effect of preventing sedimentation of the inorganic filler, so it is preferably 100,000 or more, and more preferably 200,000 or more. The upper limit is, for example, 1 million or less.

作為高分子樹脂,可舉出具有由丁二烯骨架、醯胺骨架、醯亞胺骨架、縮醛骨架、碳酸酯骨架、酯骨架、胺基甲酸酯骨架、丙烯酸骨架及矽氧烷骨架所選出的1種以上之骨架的高分子樹脂等。例如,可舉出具有丁二烯骨架的高分子樹脂(日本曹達公司製「G-1000」、「G-3000」、「GI-1000」、「GI-3000」、出光興產公司製「R-45EPI」、DAICEL公司製「PB3600」、「Epofriend AT501」、CRAY VALLEY公司製「Ricon130」、「Ricon142」、「Ricon150」、「Ricon657」、「Ricon130MA」)、具有丁二烯骨架與聚醯亞胺骨架的高分子樹脂(日本特開2006-37083號公報記載者)、具有丙烯酸骨架的高分子樹脂(Nagase Chemtex公司製「SG-P3」、「SG-600LB」、「SG-280」、「SG-790」、「SG-K2」、根上工業公司製「SN-50」、「AS-3000E」、「ME-2000」)等。Examples of polymer resins include butadiene skeletons, amide skeletons, amide skeletons, acetal skeletons, carbonate skeletons, ester skeletons, urethane skeletons, acrylic skeletons, and silicone skeletons. Selected one or more kinds of polymer resins with a skeleton, etc. For example, a polymer resin having a butadiene skeleton ("G-1000", "G-3000", "GI-1000", "GI-3000", "GI-3000" manufactured by Soda Corporation, and "R -45EPI", "PB3600", "Epofriend AT501" manufactured by DAICEL, "Ricon130", "Ricon142", "Ricon150", "Ricon657", "Ricon130MA" manufactured by CRAY VALLEY), with butadiene skeleton and polyamide Amine skeleton polymer resin (described in JP 2006-37083 A), polymer resin with acrylic skeleton ("SG-P3", "SG-600LB", "SG-280", "SG-790", "SG-K2", "SN-50", "AS-3000E", "ME-2000" manufactured by Nejo Industrial Co., Ltd.), etc.

以樹脂層的固體成分全量基準,熱塑性樹脂之摻合量較佳為0.5~20質量%,更佳為0.5~10質量%。若熱塑性樹脂之摻合量為上述範圍內,則容易得到均勻的粗化面狀態。Based on the total solid content of the resin layer, the blending amount of the thermoplastic resin is preferably 0.5 to 20% by mass, more preferably 0.5 to 10% by mass. If the blending amount of the thermoplastic resin is within the above range, it is easy to obtain a uniform roughened surface state.

再者,前述樹脂層係視需要可含有橡膠狀粒子。作為如此的橡膠狀粒子,可舉出聚丁二烯橡膠、聚異丙烯橡膠、胺基甲酸酯改質聚丁二烯橡膠、環氧改質聚丁二烯橡膠、丙烯腈改質聚丁二烯橡膠、羧基改質聚丁二烯橡膠、經羧基或羥基改質的丙烯腈丁二烯橡膠,及彼等之交聯橡膠粒子、芯殼型橡膠粒子等,可單獨1種或組合2種以上使用。此等之橡膠狀粒子係為了提高所得之硬化膜的柔軟性,或提高抗龜裂性,使藉由氧化劑的表面粗化處理成為可能,提高與銅箔等之密著強度而添加。Furthermore, the aforementioned resin layer may contain rubber-like particles as necessary. Examples of such rubbery particles include polybutadiene rubber, polyisopropylene rubber, urethane modified polybutadiene rubber, epoxy modified polybutadiene rubber, and acrylonitrile modified polybutadiene rubber. Diene rubber, carboxyl modified polybutadiene rubber, carboxyl or hydroxyl modified acrylonitrile butadiene rubber, and their cross-linked rubber particles, core-shell rubber particles, etc., can be one type alone or two in combination More than one kind of use. These rubber-like particles are added in order to increase the flexibility of the cured film obtained, or to increase the crack resistance, to enable surface roughening treatment with an oxidizing agent, and to increase the adhesion strength with copper foil.

橡膠狀粒子之平均粒徑較佳為0.005~1μm之範圍,更佳為0.2~1μm之範圍。本發明中的橡膠狀粒子之平均粒徑係可藉由雷射繞射式粒徑分布測定裝置而求出。例如,可藉由超音波等使橡膠狀粒子更均勻地分散於適當的有機溶劑中,使用日機裝公司製Nanotrac wave,以質量基準作成橡膠狀粒子之粒度分布,將其中值粒徑當作平均粒徑而測定。The average particle diameter of the rubber-like particles is preferably in the range of 0.005 to 1 μm, more preferably in the range of 0.2 to 1 μm. The average particle size of the rubber-like particles in the present invention can be determined by a laser diffraction particle size distribution measuring device. For example, the rubber-like particles can be more uniformly dispersed in a suitable organic solvent by ultrasonic waves. The Nanotrac wave manufactured by Nikkiso Co., Ltd. is used to create the particle size distribution of the rubber-like particles on a mass basis, and the median diameter is taken as The average particle size is measured.

以樹脂層之固體成分全量基準,橡膠狀粒子之摻合量較佳為0.5~10質量%,更佳為1~5質量%。0.5質量%以上時,得到抗龜裂性,可提高與導體圖型等之密著強度。10質量%以下時,熱膨脹係數(CTE)降低下,玻璃轉移溫度(Tg)上升,硬化特性升高。Based on the total solid content of the resin layer, the blending amount of the rubber-like particles is preferably 0.5-10% by mass, more preferably 1-5% by mass. At 0.5% by mass or more, crack resistance is obtained and the adhesion strength with conductor patterns can be improved. At 10% by mass or less, the coefficient of thermal expansion (CTE) decreases, the glass transition temperature (Tg) increases, and the hardening characteristics increase.

前述樹脂層可含有硬化促進劑。硬化促進劑係促進熱硬化反應者,為了更進一步提高密著性、耐藥品性、耐熱性等特性而使用。作為如此的硬化促進劑之具體例,可舉出咪唑及其衍生物;乙醯胍胺、苯并胍胺等之胍胺類;二胺基二苯基甲烷、間伸苯基二胺、間二甲苯二胺、二胺基二苯基碸、二氰二胺、脲、脲衍生物、三聚氰胺、多鹼醯肼等之多胺類;此等之有機酸鹽及/或環氧加成物;三氟化硼之胺錯合物;乙基二胺基-S-三𠯤、2,4-二胺基-S-三𠯤、2,4-二胺基-6-二甲苯基-S-三𠯤等之三𠯤衍生物類;三甲基胺、三乙醇胺、N,N-二甲基辛基胺、N-苄基二甲基胺、吡啶、N-甲基嗎啉、六(N-甲基)三聚氰胺、2,4,6-參(二甲基胺基苯酚)、四甲基胍、間胺基苯酚等之胺類;聚乙烯基苯酚、聚乙烯基苯酚溴化物、苯酚酚醛清漆、烷基苯酚酚醛清漆等之多酚類;三丁基膦、三苯基膦、參-2-氰基乙基膦等之有機膦類;三正丁基(2,5-二羥基苯基)鏻溴化物、十六基三丁基鏻氯化物等之鏻鹽類;苄基三甲基銨氯化物、苯基三丁基銨氯化物等之四級銨鹽類;前述多元酸酐;二苯基碘鎓四氟硼酸鹽、三苯基鋶六氟銻酸鹽、2,4,6-三苯基噻喃鎓六氟磷酸鹽等之光陽離子聚合觸媒;苯乙烯-馬來酸酐樹脂;苯基異氰酸酯與二甲胺之等莫耳反應物,或甲苯二異氰酸酯、異佛爾酮二異氰酸酯等之有機聚異氰酸酯與二甲胺之等莫耳反應物、金屬觸媒等之習知的硬化促進劑。於硬化促進劑之中,從得到BHAST(Biased Highly Accelerated Stress Test)耐性來看,較佳為鏻鹽類。The aforementioned resin layer may contain a hardening accelerator. The hardening accelerator is one that promotes the thermal hardening reaction, and is used to further improve the characteristics such as adhesion, chemical resistance, and heat resistance. Specific examples of such hardening accelerators include imidazole and its derivatives; guanamines such as acetoguanamine and benzoguanamine; diaminodiphenylmethane, metaphenylene diamine, and Polyamines such as xylene diamine, diamino diphenyl sulfide, dicyandiamine, urea, urea derivatives, melamine, polybasic hydrazine, etc.; these organic acid salts and/or epoxy adducts ; Amine complexes of boron trifluoride; ethyldiamino-S-tris, 2,4-diamino-S-tris, 2,4-diamino-6-xylyl-S -Three derivatives such as three; trimethylamine, triethanolamine, N,N-dimethyloctylamine, N-benzyldimethylamine, pyridine, N-methylmorpholine, hexa( N-Methyl) melamine, 2,4,6-ginseng (dimethylaminophenol), tetramethylguanidine, m-aminophenol and other amines; polyvinylphenol, polyvinylphenol bromide, phenol Polyphenols such as novolac and alkylphenol novolac; organic phosphines such as tributyl phosphine, triphenyl phosphine, ginseng-2-cyanoethyl phosphine; tri-n-butyl (2,5-dihydroxy (Phenyl) phosphonium bromide, hexadecyl tributyl phosphonium chloride and other phosphonium salts; benzyl trimethyl ammonium chloride, phenyl tributyl ammonium chloride and other quaternary ammonium salts; the aforementioned polybasic acid anhydride ;Diphenyliodonium tetrafluoroborate, triphenylsulfonium hexafluoroantimonate, 2,4,6-triphenylthiopyrylium hexafluorophosphate and other photocationic polymerization catalysts; Styrene-Male Acid anhydride resin; Moore reactants such as phenyl isocyanate and dimethylamine, or organic polyisocyanates such as toluene diisocyanate, isophorone diisocyanate, and dimethylamine mole reactants, metal catalysts, etc. Known hardening accelerator. Among the hardening accelerators, phosphonium salts are preferred from the viewpoint of obtaining BHAST (Biased Highly Accelerated Stress Test) resistance.

硬化促進劑係可單獨1種或混合2種以上使用。硬化促進劑之使用係非必須,但尤其當欲促進硬化時,相對於環氧樹脂100質量份,較佳可以0.01~5質量份之範圍使用。為金屬觸媒時,相對於具有氰酸酯基的化合物100質量份,以金屬換算較佳為10~550ppm,更佳為25~200ppm。The hardening accelerator system can be used individually by 1 type or in mixture of 2 or more types. The use of a hardening accelerator is not essential, but especially when it is desired to accelerate hardening, it is preferably used in the range of 0.01-5 parts by mass relative to 100 parts by mass of epoxy resin. In the case of a metal catalyst, it is preferably 10 to 550 ppm in terms of metal, and more preferably 25 to 200 ppm based on 100 parts by mass of the compound having a cyanate ester group.

作為有機溶劑,並沒有特別的制限,例如可舉出酮類、芳香族烴類、二醇醚類、二醇醚乙酸酯類、酯類、醇類、脂肪族烴、石油系溶劑等。具體而言,可舉出甲基乙基酮、環己酮、甲基丁基酮、甲基異丁基酮等之酮類;甲苯、二甲苯、四甲基苯等之芳香族烴類;溶纖劑、甲基溶纖劑、丁基溶纖劑、卡必醇、甲基卡必醇、丁基卡必醇、乙二醇單甲基醚、乙二醇單乙基醚、乙二醇單丁基醚、丙二醇單甲基醚、二丙二醇單甲基醚、二丙二醇二乙基醚、三乙二醇單乙基醚等之二醇醚類;乙酸乙酯、乙酸丁酯、乙酸異丁酯、乙二醇單乙基醚乙酸酯、二丙二醇甲基醚乙酸酯、丙二醇甲基醚乙酸酯、丙二醇乙基醚乙酸酯、丙二醇丁基醚乙酸酯等之酯類;乙醇、丙醇、2-甲氧基丙醇、正丁醇、異丁醇、異戊醇、乙二醇、丙二醇等之醇類;辛烷、癸烷等之脂肪族烴;石油醚、石油腦、氫化石油腦、溶劑石油腦等之石油系溶劑等,以及N,N-二甲基甲醯胺(DMF)、四氯乙烯、松節油等。又,可使用丸善石油化學公司製Swazole 1000、Swazole 1500、三共化學公司製Solvent #100、Solvent #150、SHELL化學日本公司製Shellsol A100、Shellsol A150、出光興產公司製Ipsol 100號、Ipsol 150號等之有機溶劑。有機溶劑係可單獨1種使用,也可作為2種以上的混合物使用。The organic solvent is not particularly limited, and examples thereof include ketones, aromatic hydrocarbons, glycol ethers, glycol ether acetates, esters, alcohols, aliphatic hydrocarbons, and petroleum solvents. Specifically, ketones such as methyl ethyl ketone, cyclohexanone, methyl butyl ketone, and methyl isobutyl ketone; aromatic hydrocarbons such as toluene, xylene, and tetramethylbenzene; Cellosolve, methyl cellosolve, butyl cellosolve, carbitol, methyl carbitol, butyl carbitol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono Glycol ethers such as butyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol diethyl ether, triethylene glycol monoethyl ether, etc.; ethyl acetate, butyl acetate, isobutyl acetate Esters, ethylene glycol monoethyl ether acetate, dipropylene glycol methyl ether acetate, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol butyl ether acetate, etc.; Alcohols such as ethanol, propanol, 2-methoxypropanol, n-butanol, isobutanol, isoamyl alcohol, ethylene glycol, and propylene glycol; aliphatic hydrocarbons such as octane and decane; petroleum ether, petroleum Petroleum solvents such as naphtha, hydrogenated naphtha, solvent naphtha, etc., as well as N,N-dimethylformamide (DMF), perchloroethylene, turpentine, etc. In addition, Swazole 1000, Swazole 1500 manufactured by Maruzen Petrochemical Company, Solvent #100, Solvent #150 manufactured by Sankyo Chemical Co., Ltd., Shellsol A100 and Shellsol A150 manufactured by Shell Chemical Japan Co., Ltd., Ipsol No. 100 and Ipsol No. 150 manufactured by Idemitsu Kosan Co., Ltd. can be used. And other organic solvents. The organic solvent system may be used alone or as a mixture of two or more types.

前述樹脂層中之殘留溶劑量較佳為0.5~7.0質量%。若殘留溶劑為7.0質量%以下,則抑制熱硬化時之突沸,表面之平坦性變更良好。又,可抑制熔融黏度過度下降而樹脂流動,平坦性變良好。若殘留溶劑為0.5質量%以上,則層合時的流動性良好,平坦性及埋入性變更良好。The amount of residual solvent in the aforementioned resin layer is preferably 0.5 to 7.0% by mass. If the residual solvent is 7.0% by mass or less, sudden boiling during thermal hardening is suppressed, and the flatness of the surface changes well. In addition, it is possible to prevent the resin from flowing due to excessive drop in melt viscosity and to improve flatness. If the residual solvent is 0.5% by mass or more, the fluidity at the time of lamination will be good, and the flatness and embedment will be improved.

前述樹脂層係更視需要可使用酞菁藍、酞菁綠、碘綠、雙偶氮黃、結晶紫、氧化鈦、碳黑、萘黑等之習知的著色劑、石綿、歐魯本(Orben)、本頓(benton)、微紛二氧化矽等之習知的增黏劑、聚矽氧系、氟系、高分子系等之消泡劑及/或調平劑、噻唑系、三唑系、矽烷偶合劑等之密接性賦予劑、難燃劑、鈦酸酯系、鋁系之習知的添加劑類。The aforementioned resin layer system can also use conventional coloring agents such as phthalocyanine blue, phthalocyanine green, iodine green, disazo yellow, crystal violet, titanium oxide, carbon black, naphthalene black, etc., asbestos, oruben ( Orben), Benton, Weifen silica and other conventional tackifiers, silicone, fluorine, polymer and other defoamers and/or leveling agents, thiazole, three Adhesion imparting agents such as azole-based and silane coupling agents, flame retardants, titanate-based, and aluminum-based additives.

[載體膜] 載體膜係具有支撐乾膜的樹脂層之功能者,於形成該樹脂層之際,塗佈有硬化性樹脂組成物之薄膜。作為載體膜,例如可使用聚對苯二甲酸乙二酯或聚萘二甲酸乙二酯等之聚酯薄膜、聚醯亞胺薄膜、聚醯胺醯亞胺薄膜、聚乙烯薄膜、聚四氟乙烯薄膜、聚丙烯薄膜、聚苯乙烯薄膜等之由熱塑性樹脂所成的薄膜及經表面處理的紙等。於此等之中,從耐熱性、機械強度、操作性等之觀點來看,可較宜使用聚酯薄膜。載體膜之厚度係沒有特別的限制,但在大約10~150μm之範圍中按照用途而適宜選擇。對於載體膜之設置樹脂層之面,亦可施予脫模處理。又,對於載體膜之設置樹脂層之面,也可濺鍍或形成極薄銅箔。[Carrier Film] The carrier film has a function of supporting the resin layer of the dry film, and when the resin layer is formed, a film coated with a curable resin composition is applied. As the carrier film, for example, polyester film such as polyethylene terephthalate or polyethylene naphthalate, polyimide film, polyimide film, polyethylene film, and polytetrafluoroethylene can be used. Films made of thermoplastic resins such as vinyl film, polypropylene film, and polystyrene film, and surface-treated paper. Among these, from the viewpoint of heat resistance, mechanical strength, handleability, etc., a polyester film can be preferably used. The thickness of the carrier film is not particularly limited, but is appropriately selected in the range of about 10 to 150 μm according to the application. The surface of the carrier film where the resin layer is provided can also be subjected to mold release treatment. In addition, it is also possible to sputter or form an ultra-thin copper foil on the surface of the carrier film where the resin layer is provided.

作為使用本發明之乾膜的印刷配線板之製造方法,只要使用習知的方法即可。例如,當樹脂層由熱硬化性樹脂組成物所構成時,可以如下述之方法製造印刷配線板。從乾膜剝離保護膜,加熱層合於形成有電路圖型的電路基板後,使其熱硬化。熱硬化係可在烘箱中硬化,或以熱板加壓而使其硬化。將形成有電路的基材與本發明之乾膜予以層合或熱板加壓時,亦可同時地積層銅箔或形成有電路的基材。藉由在對應於形成有電路圖型的基材上之指定位置的位置,以雷射照射或鑽頭形成圖型或通孔,使電路配線露出,可製造印刷配線板。此時,當在圖型或通孔內的電路配線上,無法完全去除而殘留的成分(膠渣)存在時,進行除膠渣處理。載體膜係在層合後、熱硬化後、雷射加工後或除膠渣處理後之任一個後,進行剝離即可。還有,層間電路之連接方法亦可藉由銅柱連接。As a manufacturing method of the printed wiring board using the dry film of this invention, what is necessary is just to use a conventional method. For example, when the resin layer is composed of a thermosetting resin composition, a printed wiring board can be manufactured as follows. The protective film was peeled off from the dry film, and then heated and laminated on the circuit board on which the circuit pattern was formed, and then cured by heat. The thermal hardening system can be hardened in an oven or hardened by pressing with a hot plate. When the circuit-formed substrate and the dry film of the present invention are laminated or hot plated, a copper foil or a circuit-formed substrate may be simultaneously laminated. A printed wiring board can be manufactured by forming a pattern or a through hole with a laser or a drill at a position corresponding to a designated position on the substrate on which the circuit pattern is formed to expose the circuit wiring. At this time, when there are remaining components (smudge) that cannot be completely removed on the circuit wiring in the pattern or through hole, the desmear process is performed. The carrier film can be peeled after any one of laminating, thermal hardening, laser processing, or desmearing treatment. In addition, the connection method of the interlayer circuit can also be connected by copper pillars.

本發明之乾膜係可較宜使用在電子零件尤其印刷配線板的永久保護膜之形成,其中可較宜使用在阻焊劑層、層間絕緣層、可撓性印刷配線板之覆蓋層之形成。特別地,本發明之乾膜可較宜使用在形成無機填料含量多的硬化物之用途。藉由使用本發明之乾膜,貼合配線,亦可形成配線板。又,亦可作為半導體晶片用的密封材使用。 [實施例]The dry film of the present invention can be suitably used in the formation of permanent protective films for electronic parts, especially printed wiring boards, and among them, it can be suitably used in the formation of solder resist layers, interlayer insulating layers, and covering layers of flexible printed wiring boards. In particular, the dry film of the present invention can be suitably used for the purpose of forming a hardened product with a large amount of inorganic filler. By using the dry film of the present invention and bonding wiring, a wiring board can also be formed. It can also be used as a sealing material for semiconductor wafers. [Example]

以下,顯示本發明之實施例及比較例,具體地說明本發明,但本發明當然不受下述實施例所限定。還有,以下的「份」及「%」只要沒有特別預先指明,則皆以質量基準。Hereinafter, examples and comparative examples of the present invention are shown to specifically explain the present invention, but the present invention is of course not limited by the following examples. In addition, the following "parts" and "%" are all based on quality unless otherwise specified.

<硬化性樹脂組成物之調製> 將表1及2中記載的材料與溶劑置入容器內,一邊加溫至50℃,一邊攪拌,接著分別添加樹脂及偶合劑。確認樹脂已溶解後,添加填料成分,充分地進行攪拌。然後,以三輥研磨機來混煉,調整硬化性樹脂組成物1~4。<Preparation of curable resin composition> The materials and solvents described in Tables 1 and 2 were put into a container, and stirred while heating to 50°C, and then the resin and coupling agent were added separately. After confirming that the resin is dissolved, the filler component is added, and the mixture is sufficiently stirred. Then, kneading was performed with a three-roll mill to adjust curable resin compositions 1 to 4.

<乾膜之製作> 將所調整的硬化性樹脂組成物,以成為黏度0.5~20dPa・s(旋轉黏度計5rpm、25℃)之方式調整溶劑之量,使用HIRANO TECSEED製標準實驗塗佈機,以樹脂層的膜厚在乾燥後成為40μm之方式,塗佈於載體膜(PET薄膜;東洋紡公司製TN-100,厚度38μm),接著,用在80℃~100℃附有溫度梯度的乾燥爐,以樹脂層的殘留溶劑成為0.5~2.5質量%之方式進行乾燥,而在載體膜上形成樹脂層。接著,於所製作的乾膜之表面,夾輥表面溫度設定在110℃,壓力設定在0.1kgf/cm2 ,進行表中記載的保護膜(王子F-TEX公司製OPP薄膜MA-411、FUKUMURA化學公司製自黏著OPP薄膜100M、或日東SHINKO公司製耐熱性微黏著特殊聚酯薄膜T-APN10)之貼合,製作1000m分量的實施例1~6及比較例1之三層構造的捲筒狀乾膜。 具體而言,使用不具有黏著性的保護膜MA-411,於通常的貼合溫度條件下將保護膜貼合於硬化性樹脂組成物,製作比較例1。相對於其,使用同樣不具有黏著性的保護膜MA-411,使保護膜的貼合溫度高於通常的貼合溫度條件,製作實施例1,再者,代替不具有黏著性的保護膜MA-411,使用具有黏著性的保護膜100M及T-APN10,製作實施例2~6。<Production of dry film> Adjust the amount of the solvent so that the adjusted curable resin composition has a viscosity of 0.5-20dPa·s (rotational viscometer at 5rpm, 25°C), using a standard laboratory coater manufactured by HIRANO TECSEED, After drying, the thickness of the resin layer becomes 40μm, and it is applied to a carrier film (PET film; Toyobo TN-100, thickness 38μm), and then used in a drying oven with a temperature gradient at 80°C to 100°C Drying is performed so that the residual solvent of the resin layer becomes 0.5 to 2.5% by mass, and the resin layer is formed on the carrier film. Next, on the surface of the produced dry film, the nip roll surface temperature was set at 110°C, the pressure was set at 0.1kgf/cm 2 , and the protective film described in the table (OPP film MA-411, FUKUMURA manufactured by Oji F-TEX) Self-adhesive OPP film 100M manufactured by Chemical Company, or heat-resistant micro-adhesive special polyester film T-APN10 manufactured by Nitto Shinko Co., Ltd.) was laminated to produce rolls of three-layer structure of Examples 1 to 6 and Comparative Example 1 with a weight of 1000m Like dry film. Specifically, a protective film MA-411 having no adhesiveness was used, and the protective film was bonded to the curable resin composition under normal bonding temperature conditions to prepare Comparative Example 1. In contrast, the protective film MA-411, which is also non-adhesive, was used to make the bonding temperature of the protective film higher than the usual bonding temperature conditions to produce Example 1. Furthermore, instead of the non-adhesive protective film MA -411, using the adhesive protective film 100M and T-APN10 to make Examples 2-6.

<剝離強度之測定> 對於所得之三層構造的乾膜,測定(A)相對於樹脂層之載體膜的剝離強度及(B)相對於樹脂層之保護膜的剝離強度。使用接著劑,將所得之乾膜固定於厚度1.6mm之FR4上,在薄膜之表面中導入寬度10mm、長度150mm之切口,撕開薄膜之一端。然後,以夾具固定薄膜之端部,用島津製作所製萬能拉伸試驗機AG-X,實施剝離強度之測定。實驗方法係依據JIS-C-6481,以溫度25℃、撕開角度90°、速度50mm/分鐘進行測定。表3中顯示測定結果。<Measurement of peel strength> For the obtained dry film of the three-layer structure, the peel strength of (A) the carrier film relative to the resin layer and the peel strength of (B) the protective film relative to the resin layer were measured. Using an adhesive, fix the resulting dry film on FR4 with a thickness of 1.6mm, introduce a cut with a width of 10mm and a length of 150mm in the surface of the film, and tear off one end of the film. Then, the end of the film was fixed with a jig, and the peel strength was measured using the universal tensile tester AG-X manufactured by Shimadzu Corporation. The test method is based on JIS-C-6481, with a temperature of 25°C, a tearing angle of 90°, and a speed of 50mm/min. Table 3 shows the measurement results.

<樹脂的剝離之評價> 對於所得之三層構造的捲筒狀乾膜,使用自動切割裝置TS-350P(坂下鐵工公司製),連續1000m分量實施切割加工後,評價切割面的樹脂端部之狀態。評價基準係如以下。表3中顯示測定結果。 ○:於1000m加工後也沒有樹脂端部破裂、保護膜之剝離。 ×:於1000m加工後,觀察到樹脂端部破裂、保護膜之剝離(3mm左右之浮起)。<Evaluation of resin peeling> For the obtained dry film in the form of a roll of three-layer structure, the automatic cutting device TS-350P (manufactured by Sakashita Iron Works) was used to perform cutting processing at a continuous 1000 m portion, and then the state of the resin end of the cut surface was evaluated. The evaluation criteria are as follows. Table 3 shows the measurement results. ○: There is no resin end cracking or peeling of the protective film even after 1000m processing. ×: After processing at 1000 m, cracking of the resin end and peeling of the protective film (floating about 3 mm) were observed.

<樹脂組成物之轉印(樹脂之分離)評價> 將所製作之長條的3層構造之乾膜(厚度40μm、寬度490mm、長度100m分量之捲筒製品)設置於自動切割層合機HLM-A60-T(日立化成公司製),在捲取輥剝離保護膜後,以層合速度1m/min、輥溫度90℃、輥壓力0.2MPa,在尺寸500×500mm、厚度0.8mm之覆銅板上連續地實施20片的暫時貼附試驗。評價基準係如以下。表3中顯示評價結果。 ○:在保護膜之捲取、到暫時貼附(熱壓接)部分為止之間的保護膜之捲取輥部分,看到樹脂層之剝離。 ×:在保護膜之捲取輥部分,看到樹脂層之剝離。<Evaluation of transfer of resin composition (separation of resin)> Set the produced long dry film with a three-layer structure (a roll product with a thickness of 40μm, a width of 490mm, and a length of 100m) on the automatic cutting laminator HLM-A60-T (manufactured by Hitachi Chemical Co., Ltd.), After the protective film was peeled off by the roller, a temporary attachment test of 20 sheets was continuously performed on a copper-clad plate with a size of 500×500 mm and a thickness of 0.8 mm at a lamination speed of 1 m/min, a roller temperature of 90° C., and a roller pressure of 0.2 MPa. The evaluation criteria are as follows. Table 3 shows the evaluation results. ○: Peeling of the resin layer was observed at the winding roller part of the protective film between the winding of the protective film and the temporary attachment (thermal compression bonding) part. ×: Peeling of the resin layer was observed in the take-up roller part of the protective film.

Figure 02_image001
Figure 02_image001

Figure 02_image003
Figure 02_image003

*1:DIC公司製EPICLON 840(液狀環氧樹脂、環氧當量185g/eq) *2:DIC公司製EPICLON 860(雙酚A型固體環氧樹脂、環氧當量245g/eq) *3:DIC公司製EPICLON HP-5000(萘骨架改質多官能環氧樹脂、環氧當量252g/eq) *4:明和化成公司製HF-1M、苯酚酚醛清漆樹脂、羥基當量106g/eq *5:DIC公司製EPICLON HPC-8000、活性酯樹脂、活性當量223g/eq、固體 *6:二甲基胺基吡啶 *7:四國化成公司製2E4MZ、2-乙基-4-甲基咪唑 *8:苯氧基樹脂 *9:ADMATECHS公司製SO-C1、球狀二氧化矽、平均粒徑(D50 )=200nm *10:雙酚F型丙烯酸酯樹脂、日本化藥公司製 *11:DIC公司製:具有醯胺醯亞胺構造之含有羧基的樹脂 *12:三環[5.2.1.0 2,6]癸烷二甲醇二丙烯酸酯、新中村化學公司製 *13:三菱化學公司製jER828、雙酚A型環氧樹脂、環氧當量189g/eq、液狀 *14:DIC公司製、二環戊二烯型 *15:IGM Resins B. V.製Omnirad 369、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉代丙烷-1-酮 *16:硫酸鋇、堺化學公司製*1: EPICLON 840 manufactured by DIC (liquid epoxy resin, epoxy equivalent 185g/eq) *2: EPICLON 860 manufactured by DIC (bisphenol A type solid epoxy resin, epoxy equivalent 245g/eq) *3: EPICLON HP-5000 manufactured by DIC (Naphthalene skeleton modified multifunctional epoxy resin, epoxy equivalent 252g/eq) *4: HF-1M manufactured by Meiwa Chemicals Co., Ltd., phenol novolac resin, hydroxyl equivalent 106g/eq *5: DIC EPICLON HPC-8000 manufactured by the company, active ester resin, active equivalent 223g/eq, solid*6: dimethylaminopyridine*7: 2E4MZ manufactured by Shikoku Chemicals Corporation, 2-ethyl-4-methylimidazole*8: Phenoxy resin *9: SO-C1 manufactured by ADMATECHS Co., Ltd., spherical silica, average particle size (D 50 )=200nm *10: Bisphenol F type acrylate resin, manufactured by Nippon Kayaku Co., Ltd. *11: DIC Co. Production: A carboxyl group-containing resin having an amidoimide structure *12: Tricyclic [5.2.1.0 2,6] decane dimethanol diacrylate, manufactured by Shin Nakamura Chemical Co., Ltd. *13: Mitsubishi Chemical Corporation jER828, double Phenolic A type epoxy resin, epoxy equivalent 189g/eq, liquid form *14: manufactured by DIC Corporation, dicyclopentadiene type *15: manufactured by IGM Resins BV Omnirad 369, 2-methyl-1-[4-( (Methylthio)phenyl]-2-morpholinopropane-1-one*16: Barium sulfate, manufactured by Sakai Chemical Co., Ltd.

Figure 02_image005
Figure 02_image005

由上述表中所示的結果可知,依照本發明,可得到一種乾膜,其係即使連續地進行切割加工,也不使樹脂附著於刀刃而鋒利度變差,結果不發生端部的樹脂之破裂或浮起、保護膜之浮起。From the results shown in the above table, it can be seen that according to the present invention, a dry film can be obtained, which does not cause the resin to adhere to the blade and deteriorate the sharpness even if the cutting process is continuously performed. As a result, the resin at the end does not occur. Cracking or floating, floating of protective film.

11:三層構造之乾膜 12:樹脂層 13:載體膜 14:保護膜11: Three-layer dry film 12: Resin layer 13: carrier film 14: Protective film

[圖1]係示意地顯示本發明之乾膜的一實施態樣之概略剖面圖。[Fig. 1] A schematic cross-sectional view schematically showing an embodiment of the dry film of the present invention.

11:三層構造之乾膜 11: Three-layer dry film

12:樹脂層 12: Resin layer

13:載體膜 13: carrier film

14:保護膜 14: Protective film

Claims (6)

一種乾膜,於具備載體膜、樹脂層與保護膜之乾膜中, 相對於前述樹脂層之前述保護膜的剝離強度為0.010kgf/cm以上, 且相對於前述樹脂層之前述保護膜的剝離強度大於相對於前述樹脂層之前述載體膜的剝離強度。A dry film in a dry film with carrier film, resin layer and protective film, The peel strength of the protective film with respect to the resin layer is 0.010kgf/cm or more, And the peel strength of the protective film with respect to the resin layer is greater than the peel strength of the carrier film with respect to the resin layer. 如請求項1之乾膜,其中相對於前述樹脂層之前述保護膜的剝離強度比相對於前述樹脂層之前述載體膜的剝離強度大0.005kgf/cm以上。The dry film of claim 1, wherein the peel strength of the protective film relative to the resin layer is greater than the peel strength of the carrier film relative to the resin layer by 0.005 kgf/cm or more. 如請求項1之乾膜,其厚度為60μm以上。For example, the dry film of claim 1 has a thickness of 60 μm or more. 如請求項1之乾膜,其中前述保護膜具有黏著性。Such as the dry film of claim 1, wherein the aforementioned protective film is adhesive. 一種硬化物,其係將如請求項1~4中任一項之乾膜的樹脂層進行硬化而得到。A hardened product obtained by hardening the resin layer of the dry film as in any one of claims 1 to 4. 一種電子零件,其具有如請求項5之硬化物。An electronic component having a hardened product as claimed in claim 5.
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JP2018125378A (en) * 2017-01-31 2018-08-09 太陽インキ製造株式会社 Dry film, cured product, printed wiring board, and method for manufacturing cured product

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JP2020121481A (en) 2020-08-13
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