TW202020062A - Photosensitive resin composition, photosensitive resin layer and color filter layer - Google Patents

Abstract

Disclosed are a photosensitive resin composition including (A) a colorant including a blue pigment and an azaporphyrin-based dye having a maximum absorption wavelength in a wavelength region of 350 nm to 450 nm; (B) a binder resin; (C) a photopolymerizable compound; (D) a photopolymerization initiator; and (E) a solvent, a photosensitive resin layer manufactured using the photosensitive resin composition, and a color filter layer.

Description

Photosensitive resin composition, photosensitive resin layer, and color filter layer

The present invention relates to a photosensitive resin composition, a photosensitive resin layer using the composition, and a color filter layer including the photosensitive resin layer. [Cross-reference to related applications]

This application requires the priority and rights of Korean Patent Application No. 10-2018-0147495 filed on November 26, 2018 at the Korea Intellectual Property Office, and the entire contents of the application are incorporated herein by reference.

Among many types of displays, the advantages of liquid crystal display devices are brightness, thinness, low cost, low operating power consumption, and improved adhesion to integrated circuits, and have been more widely used in notebook computers, Monitor and TV screen. The liquid crystal display device includes a lower substrate on which a black matrix (light shielding layer), a color filter, and an ITO pixel electrode are formed, and an active circuit including a liquid crystal layer, a thin film transistor, and a capacitor layer is formed thereon Part and the upper substrate of the ITO pixel electrode.

Formed in the pixel area by stacking a plurality of color filters in sequence (usually, formed from three primary colors (such as red (R), green (G), and blue (B)) in a predetermined order to form each pixel) A color filter, and a black matrix (light shielding layer) is placed on a transparent substrate in a predetermined pattern to form a boundary between pixels.

The pigment dispersion method, which is one of the methods for realizing the color filter, provides a color film by repeating a series of processes such as coating a photopolymerizable composition containing a colorant on a transparent substrate containing a black matrix Above, the formed pattern is exposed, the unexposed part is removed with a solvent, and the composition is thermally cured. The coloring photosensitive resin composition used for manufacturing the color filter according to the pigment dispersion method generally contains an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, an epoxy resin, a solvent, other additives, and the like. The pigment dispersion method having the above-mentioned characteristics is actively applied to manufacture liquid crystal displays of mobile phones, notebook computers, monitors, and TVs.

However, the photosensitive resin composition in the color filter using the pigment dispersion method with many advantages has some drawbacks because there are difficulties in finely pulverizing the powder, thereby requiring various additives for use even in dispersion and complicated processes In this case, the dispersion is stabilized, and the optimal quality of the pigment dispersion is further maintained under complex storage and transportation conditions.

In addition, color filters manufactured by using a pigment-type photosensitive resin composition have limitations in terms of brightness and contrast ratio due to pigment particle size. The color image sensor device used for the image sensor requires a small dispersed particle diameter to form a fine pattern. In response to this request, attempts have been made to achieve color filters with improved color characteristics by introducing dyes instead of pigments or preparing photosensitive resin compositions together with pigments, such improved color characteristics such as brightness, contrast ratio, etc., but with pigment type Compared with the photosensitive resin composition, the dye-type photosensitive resin composition has a problem of light-resistance deterioration.

It has been tried to use CI Pigment Blue 15:3 (β-type) or CI Pigment Blue 15:4 (β-type) pigments instead of Pigment Blue 15:6 (ε-type) pigments, but in this case, despite improved light resistance However, the increase in Bx color coordinates in high-color blue resists is a problem because it is not suitable for the recent trend of increasing demand for high color reproduction.

Therefore, research on a photosensitive resin composition capable of simultaneous high color reproduction (having small Bx color coordinates in a high-color blue resist) without causing deterioration in light resistance is continued.

The embodiment provides a photosensitive resin composition having high color reproduction while having improved light resistance.

Another embodiment provides a photosensitive resin layer manufactured using a photosensitive resin composition.

Another embodiment provides a color filter layer including a photosensitive resin layer.

Embodiments of the present invention provide a photosensitive resin composition, which includes: (A) a colorant, including a blue pigment and an azaporphyrin-based dye having a maximum absorption wavelength in the wavelength range of 350 nm to 450 nm ( azaporphyrin-based dye); (B) binder resin; (C) photopolymerizable compound; (D) photopolymerization initiator; and (E) solvent.

The azaporphyrin-based dye may contain a central metal of Cu or V (=O).

在化學式1中， M是Cu或V(=O)，且 R¹ 到R²⁰ 獨立地是氫原子、鹵素原子、取代或未取代的C1到C20烷基、取代或未取代的C1到C20烷氧基、取代或未取代的C6到C20芳基、磺酸基、取代或未取代的磺醯胺基或取代或未取代的C1到C20烷基酯基， 條件為，R¹ 到R⁵ 中的至少一個、R⁶ 到R¹⁰ 中的至少一個、R¹¹ 到R¹⁵ 中的至少一個以及R¹⁶ 到R²⁰ 中的至少一個不是獨立的氫原子。The azaporphyrin-based dye can be represented by Chemical Formula 1. [Chemical Formula 1]

In Chemical Formula 1, M is Cu or V (=O), and R ¹ to R ^{20 are} independently a hydrogen atom, a halogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkyl group Oxygen group, substituted or unsubstituted C6 to C20 aryl group, sulfonic acid group, substituted or unsubstituted sulfonamide group or substituted or unsubstituted C1 to C20 alkyl ester group, provided that R ¹ to R ⁵ At least one of R, at least one of R ⁶ to R ¹⁰ , at least one of R ¹¹ to R ¹⁵ and at least one of R ¹⁶ to R ²⁰ are not independent hydrogen atoms.

在化學式2中， R²¹ 是取代或未取代的C1到C20烷基。One of R ¹ to R ⁵ , one of R ⁶ to R ¹⁰ , one of R ¹¹ to R ¹⁵ , and one of R ¹⁶ to R ²⁰ may be independently represented by Chemical Formula 2. [Chemical Formula 2]

In Chemical Formula 2, R ²¹ is a substituted or unsubstituted C1 to C20 alkyl group.

在化學式3中， L¹ 是取代或未取代的C1到C20伸烷基（alkylene group），且 R²² 和R²³ 獨立地是取代或未取代的C1到C20烷基。R ³ , R ⁸ , R ¹³ and R ¹⁸ may be independently represented by Chemical Formula 3. [Chemical Formula 3]

In Chemical Formula 3, L ¹ is a substituted or unsubstituted C1 to C20 alkylene group, and R ²² and R ^{23 are} independently a substituted or unsubstituted C1 to C20 alkyl group.

[化學式1-2]

The azaporphyrin-based dye can be represented by Chemical Formula 1-1 or Chemical Formula 1-2. [Chemical Formula 1-1]

[Chemical Formula 1-2]

The azaporphyrin-based dye may be included in an amount of 0.1% to 5% by weight based on the total solid amount of the photosensitive resin composition.

The colorant may further include a violet pigment.

The blue pigment may be C.I. Pigment Blue 15:6.

Based on the total amount of the photosensitive resin composition, the photosensitive resin composition may contain 2% to 40% by weight of coloring agent; 3% to 20% by weight of the binder resin; 1% to 20% by weight of light resin Polymerization compound; 0.1% to 5% by weight of photopolymerization initiator; and the balance of solvent.

The photosensitive resin composition may further contain an epoxy compound, a silane coupling agent, a surfactant, or a combination thereof.

Another embodiment provides a photosensitive resin layer manufactured using a photosensitive resin composition.

Another embodiment provides a color filter layer including a photosensitive resin layer.

Other aspects of the invention are included in the following detailed description.

The photosensitive resin composition according to the embodiment contains a compound that blocks light in the wavelength range of 350 nm to 450 nm in order to improve the color filter of the panel constituting the optical display device (such as liquid crystal display (LCD), etc.) The color reproducibility of the light sheet layer, and therefore relatively high light resistance can be maintained even at high color coordinates. In particular, the compound has a characteristic of absorbing light strongly in a very narrow wavelength region, and thus can block the spectrum of the corresponding region and achieve high color (blue).

Hereinafter, embodiments of the present invention are described in detail. However, these embodiments are exemplary, the present invention is not limited thereto and the present invention is defined by the scope of patent application.

In this specification, when a specific definition is not otherwise provided, "substitution" refers to substitution by a substituent selected from the following: halogen (F, Br, Cl, or I), hydroxyl, nitro, cyano, amino (NH ₂ , NH(R ²⁰⁰ ) or N(R ²⁰¹ )(R ²⁰² ), where R ²⁰⁰ , R ²⁰¹ and R ^{202 are the} same or different, and are independently C1 to C10 alkyl), amidino group, hydrazino (Hydrazine group), hydrazone group (hydrazone group), carboxyl group, substituted or unsubstituted alkyl group, substituted or unsubstituted alkenyl group, substituted or unsubstituted alkynyl group, substituted or unsubstituted alicyclic organic group, substituted Or unsubstituted aryl and substituted or unsubstituted heterocyclic.

In this specification, when no specific definition is provided otherwise, "alkyl" refers to C1 to C20 alkyl, and specifically C1 to C15 alkyl, and "cycloalkyl" refers to C3 to C20 cycloalkyl, and Specifically C3 to C18 cycloalkyl, "alkoxy" means C1 to C20 alkoxy, and specifically C1 to C18 alkoxy, "aryl" means C6 to C20 aryl, and specifically Said C6 to C18 aryl, "alkenyl" refers to C2 to C20 alkenyl, and specifically C2 to C18 alkenyl, "alkylene" refers to C1 to C20 alkylene, and specifically C1 to C18 Alkyl extension, and "arylene extension" refers to C6 to C20 aryl extension, and specifically C6 to C16 aryl extension.

In this specification, when no specific definition is provided otherwise, "(meth)acrylate" means "acrylate" and "methacrylate", and "(meth)acrylic acid" means "acrylic acid" and " Methacrylate".

In this specification, when a definition is not otherwise provided, the term "combination" refers to mixing or copolymerization. In addition, "copolymerization" refers to block copolymerization to random copolymerization, and "copolymer" refers to block copolymer to random copolymer.

In the chemical formula of this specification, unless a specific definition is provided otherwise, when the chemical bond is not drawn at the position to be given, hydrogen bonding is at the position.

In this specification, when no specific definition is provided otherwise, "*" indicates a point connecting the same or different atoms or chemical formulas.

In addition, when any member is disposed "on" another member in this specification, the member may not only contact the other member, but another member may exist between the two members.

In addition, in the present invention, unless explicitly described as the contrary, the word "comprise" and its variants (such as (comprises/comprising)) should be understood as implying the inclusion of the stated elements without excluding any Other components.

The embodiment provides a photosensitive resin composition, including: (A) a colorant including a blue pigment and an azaporphyrin-based dye having a maximum absorption wavelength in a wavelength range of 350 nm to 450 nm; (B) bonding Resin; (C) photopolymerizable compound; (D) photopolymerization initiator; and (E) solvent.

In the following, each component is specifically described. (A) Colorant

The photosensitive resin composition according to the embodiment includes a blue pigment as a colorant and an azaporphyrin-based dye.

The azaporphyrin-based dye has a maximum absorption wavelength in the wavelength range of 350 nm to 450 nm, for example, in the wavelength range of 400 nm to 440 nm.

In order to achieve a high-color blue (high-color blue resist), it is necessary to achieve a low Bx color coordinate, and therefore the combination and amount of colorants that can minimize the deterioration of light resistance and processability are important of. In order to achieve a high-color blue, a method of increasing the amount of coloring while absorbing the blue-shifting blue colorant is generally used. However, as the amount of colorant increases, the method has a problem of greatly reducing endurance characteristics (such as light resistance). Therefore, a method of mixing different dyes with a blue colorant has been proposed, but when different dyes are applied to the blue colorant, the light resistance is greatly reduced due to the different dyes, so it is difficult to maintain excellent light resistance and At the same time achieve a high color blue. For example, attempts have been made to use traditional azo-base yellow dyes to absorb light in the wavelength range of 380 nm to 420 nm, but here, azo yellow dyes should be used in relatively large amounts, and Therefore, there is a problem that the process margin of the entire composition cannot be ensured, and it cannot be purchased on the market. In addition, when the conventional azo-based yellow dye is used together with the conventional blue pigment (ε blue), the blue transmission region is damaged due to the overlap of the transmission spectrum and the absorption spectrum, and thus the luminance loss is increased, and thus the light resistance may be deteriorated.

According to the embodiment, a mixture of a blue pigment and an porphyrin-based dye can be used as a colorant to minimize the above-mentioned problem of deterioration in light resistance, while achieving high-color blue, the azaporphyrin-based dye ranges from 350 nm to It has a maximum absorption wavelength in the 450 nm wavelength range.

For example, the azaporphyrin-based dye may include a central metal of Cu or V(=0). Since high color reproduction and light resistance characteristics vary depending on the central metal of the azaporphyrin dye, the type of the central metal of the azaporphyrin dye is very important. For example, when the central metal of the azaporphyrin-based dye is Zn, Co, Pt, etc., even if the mixture with the above-mentioned blue pigment is used as a colorant, light resistance is not improved.

The azaporphyrin-based dye can be represented by Chemical Formula 1. [Chemical Formula 1]

In Chemical Formula 1, M is Cu or V (=O), and R ¹ to R ^{20 are} independently a hydrogen atom, a halogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkyl group Oxygen, substituted or unsubstituted C6 to C20 aryl, sulfonic acid, substituted or unsubstituted sulfoneamide group or substituted or unsubstituted C1 to C20 alkylester group, condition For, at least one of R ¹ to R ⁵ , at least one of R ⁶ to R ¹⁰ , at least one of R ¹¹ to R ¹⁵ , and at least one of R ¹⁶ to R ²⁰ are not independent hydrogen atoms.

For example, in Chemical Formula 1, one of R ¹ to R ⁵ , one of R ⁶ to R ¹⁰ , one of R ¹¹ to R ¹⁵ , and one of R ¹⁶ to R ²⁰ can be independently determined by Chemical Formula 2 Said. [Chemical Formula 2]

In Chemical Formula 2, R ²¹ is a substituted or unsubstituted C1 to C20 alkyl group.

For example, in Chemical Formula 1, R ³ , R ⁸ , R ^13, and R ¹⁸ may be independently represented by Chemical Formula 3. [Chemical Formula 3]

In Chemical Formula 3, L ¹ is a substituted or unsubstituted C1 to C20 alkylene group, and R ²² and R ^{23 are} independently a substituted or unsubstituted C1 to C20 alkyl group.

[化學式1-2]

For example, the azaporphyrin-based dye may be represented by Chemical Formula 1-1 or Chemical Formula 1-2. [Chemical Formula 1-1]

[Chemical Formula 1-2]

The azaporphyrin-based dye may be contained in an amount smaller than that of the blue pigment. Azaporphyrin-based dyes are auxiliary dyes that function to absorb light in the wavelength range of 350 nm to 450 nm, and when the amount contained is less than the amount of blue pigment, a high level can be obtained in the blue resist Color reproduction, but when the azaporphyrin-based dye is included in an amount larger than the amount of the blue pigment, the azaporphyrin-based dye is used in an excessive amount, and therefore high color reproduction may not be achieved in the blue resist.

Even if azoporphyrin-based dyes are used in large amounts, it is not difficult to obtain high color reproduction and achieve color coordinates, but even transmittance may be deteriorated, and therefore, brightness may be reduced, or other performance (reliability) is expected to be deteriorated.

The azaporphyrin-based dye may be included in an amount of 0.1% to 5% by weight based on the total solid amount of the photosensitive resin composition. Within the amount range, sufficient high color reproduction is possible, and an excellent processing margin can be obtained.

For example, in addition to blue pigments and azaporphyrin-based dyes, the colorant may include purple pigments.

For example, the blue pigment may be an epsilon blue pigment. It may be a blue pigment used in the composition according to an embodiment, and using an ε blue pigment instead of a β blue pigment helps to improve brightness (light resistance).

For example, the blue pigment may be C.I. Pigment Blue 15:6.

The colorant may be included in an amount of 2% to 40% by weight based on the total solid amount of the photosensitive resin composition according to the embodiment. When the colorant is included in the range, improved light resistance can be achieved at high color coordinates. (B) Adhesive resin

The binder resin may include acryl-based binder resin. For example, the binder resin may be an acrylic binder resin.

The propylene-based binder resin is a copolymer of a first ethylenic unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and is a resin containing at least one propylene-based repeating unit.

The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxyl group and/or hydroxyl group, and examples of the monomer include acrylic acid, methacrylic acid, maleic acid (Maleic acid), itaconic acid, fumaric acid, or a combination thereof.

Based on the total amount of the propylene-based binder resin, the first ethylenically unsaturated monomer may be included in an amount of 5% to 50% by weight, for example, 10% to 40% by weight.

The second ethylenically unsaturated monomer may be an aromatic vinyl compound, such as styrene, α-methylstyrene, vinyltoluene, vinylbenzyl methyl ether, etc.; unsaturated carboxylate compounds, Such as methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxy(meth)acrylate Group) 2-hydroxy butyl(meth)acrylate, benzyl (meth)acrylate, cyclohexyl (meth)acrylate, phenyl (meth)acrylate, etc.; unsaturated amino alkyl carboxylic acid Ester compounds, such as 2-aminoethyl(meth)acrylate, 2-dimethylaminoethyl(meth)acrylate, etc.; carboxylic acid vinyl ester compounds, such as vinyl acetate (Vinyl acetate), vinyl benzoate, etc.; unsaturated glycidyl carboxylate ester compounds, such as glycidyl (meth)acrylate, etc. ; Vinyl cyanide (vinyl cyanide) compounds, such as (meth) acrylonitrile ((meth)acrylonitrile), etc.; unsaturated amide compounds, such as (meth)acrylamide ((meth)acrylamide), etc.; and similar compounds , And can be used alone or as a mixture of two or more.

Specific examples of the acrylic binder resin may be (meth)acrylic acid/benzyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene copolymer, (meth)acrylic acid/methacrylate Benzyl acrylate/2-hydroxyethyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene/2-hydroxyethyl methacrylate copolymer and the like, but not It is not limited to this, and can be used alone or as a mixture of two or more.

The weight average molecular weight of the acrylic binder resin may be 3,000 g/mole (g/mol) to 150,000 g/mole, for example 5,000 g/mole to 50,000 g/mole, for example 20,000 g /Mole to 30,000 g/mole. When the weight average molecular weight of the acrylic binder resin is within the range, the photosensitive resin composition can have excellent physical and chemical properties and appropriate viscosity, maintain appropriate developability (developability) and sensitivity, and be used in the manufacture of color The filter layer shows excellent close contact performance with the substrate.

The acid value of the acrylic binder resin may be 15 mg KOH/g (mgKOH/g) to 60 mg KOH/g, for example, 20 mg KOH/g to 50 mg KOH/g. When the acrylic binder resin has an acid value within the range, excellent pixel resolution can be obtained.

Based on the total amount of the photosensitive resin composition, the binder resin may be included in an amount of 3 to 20% by weight, for example, 5 to 15% by weight. When the binder resin is included in the range, developability can be improved and surface smoothness can be improved due to improved cross-linking during manufacturing of the color filter layer. (C) Photopolymerizable compound

The photopolymerizable compound may be a monofunctional or polyfunctional ester of (meth)acrylic acid containing at least one ethylenically unsaturated double bond.

The photopolymerizable compound has an ethylenically unsaturated double bond, and thus can cause sufficient polymerization and form a pattern having excellent heat resistance, light resistance, and chemical resistance during exposure during pattern formation.

Specific examples of the photopolymerizable compound may be ethylene glycol di(meth)acrylate, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, Triethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate (Neopentyl glycol di(meth)acrylate), 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate Ester (1,6-hexanediol di(meth)acrylate), bisphenolA di(meth)acrylate (bisphenolA di(meth)acrylate), pentaerythritol di(meth)acrylate (pentaerythritol di(meth)acrylate), Pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol hexa(meth)acrylate , Dipentaerythritol di(meth)acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol penta(di) meth)acrylate), dipentaerythritol hexa(meth)acrylate, bisphenol A epoxy(meth)acrylate, ethylene glycol monomethyl Ether (meth) acrylate (ethylene glycol monomethylether (meth) acrylate), trimethylol propane tri (meth) acrylate (trimethylol propane tri (meth) acrylate), tris (meth) acrylic acid oxyethyl phosphate Ester (tris(meth )acryloyloxyethyl phosphate), novolac epoxy (meth)acrylate and similar compounds.

Examples of commercially available photopolymerizable compounds are as follows. The monofunctional (meth)acrylate may include Aronix M-101 ^® , M-111 ^® , M-114 ^® (Toagosei Chemistry Industry Co., Ltd.); card KAYARAD TC-110S ^® , TC-120S ^® (Nippon Kayaku Co., Ltd.); V-158 ^® , V-2311 ^® (Osaka Organic Chemical Industry Co., Ltd. (Osaka Organic Chemical Ind., Ltd.)), and the like. Examples of the bifunctional (meth) acrylate may include Anix M-210 ^® , M-240 ^® , M-6200 ^® (East Asia Synthetic Chemical Industry Co., Ltd.); Kayarad HDDA ^® , HX-220 ^® , R-604 ^® (Nippon Kayaku Co., Ltd.); V-260 ^® , V-312 ^® , V-335 HP ^® (Osaka Organic Chemical Industry Co., Ltd.), and the like. Examples of trifunctional (meth)acrylates may include Anix M-309 ^® , M-400 ^® , M-405 ^® , M-450 ^® , M-710 ^® , M-8030 ^® , M-8060 ^® ( Toya Synthetic Chemical Industry Co., Ltd.); Kayarad TMPTA ^® , DPCA-20 ^® , DPCA-30 ^® , DPCA-60 ^® , DPCA-120 ^® (Japan Chemical Pharmaceutical Co., Ltd.); V-295 ^® , V-300 ^® , V-360 ^® , V-GPT ^® , V-3PA ^® , V-400 ^® (Osaka Yuki Kayaku Kogyo Co. Ltd.), and the like. These can be used alone or in a mixture of two or more.

The photopolymerizable compound can be treated with acid anhydride to improve developability.

Based on the total amount of the photosensitive resin composition, the photopolymerizable compound may be contained in an amount of 1 to 20% by weight, for example, 3 to 10% by weight. When the photopolymerizable compound is included in the range, the photopolymerizable monomer is sufficiently cured during exposure during pattern formation and has excellent reliability, and can improve the developability of the alkaline developer. (D) Photopolymerization initiator

The photopolymerization initiator may be an initiator commonly used in photosensitive resin compositions, for example, acetophenone-based compounds, benzophenone-based compounds, thioxanthone-based compounds ) Compounds, benzoin-based compounds, triazine-based compounds, oxime-based compounds or combinations thereof.

Examples of the acetophenone compounds may be 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylacetophenone, p-tert-butyl Trichloroacetophenone, p-tert-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4- (Methylthio)phenyl)-2-morpholinopropan-1-one (2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropan-1-one), 2-benzyl- 2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one (2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one), and similar compounds .

Examples of benzophenone compounds may be benzophenone, benzoyl benzoate, benzoyl methacrylate, 4-phenyl benzophenone, hydroxybenzophenone, acrylated benzophenone, 4 ,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichloro Benzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and similar compounds.

Examples of the thioxanthone compound may be thioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone , 2-chlorothioxanthone, and similar compounds.

Examples of the benzoin-based compound may be benzoin, benzoin methyl ether, benzoin ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, and similar compounds.

Examples of triazine compounds may be 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3', 4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloro Methyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis (Trichloromethyl)-s-triazine, 2-biphenyl-4,6-bis(trichloromethyl)-s-triazine (2-biphenyl-4,6-bis(trichloromethyl)-s-triazine ), bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphthyl-1-yl)-4,6-bis(trichloromethyl)-s-triazine (2 -(naphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine), 2-(4-methoxynaphthyl-1-yl)-4,6-bis(trichloromethyl) -s-triazine, 2,4-bis(trichloromethyl)-6-piperonyl-s-triazine (2,4-bis(trichloromethyl)-6-piperonyl-s-triazine), 2-2-4 Bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine, and similar compounds.

Examples of oxime compounds may be O-acyloxime-based compounds, 2-(o-benzoyl oxime)-1-[4-(phenylthio)phenyl]-1,2- Octanedione (2-(o-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octandione), 1-(o-acetyl oxime)-1-[9-ethyl-6-( 2-methylbenzyl)-9H-oxazol-3-yl]ethanone (1-(o-acetyloxime)-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3 -yl]ethanone), O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one, and similar compounds. Specific examples of O-acetoxime compounds may be 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl- Phenyl)-butan-1-one, 1-(4-phenylthiophenyl)-butane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylthio Phenyl)-octane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylthiophenyl)-octan-1-one oxime-O-acetate , 1-(4-phenylthiophenyl)-butan-1-one oxime-O-acetate, and similar compounds.

The photopolymerization initiator may include both an oxime-based initiator and an acetophenone-based initiator. In this case, compared with the case where one type of photopolymerization initiator is used alone, an excellent processing margin can be ensured by increasing the curing efficiency. In addition, in this case, the oxime initiator may be included in an amount larger than the amount of the acetophenone initiator. When the oxime-based initiator is included in an amount equal to or less than the acetophenone-based initiator dose, the sensitivity is low (the sensitivity is excellent), and thus the desired CD can be performed.

In addition to the above-mentioned compounds, the photopolymerization initiator may further include oxazole compounds, diketone compounds, sulfonium borate-based compounds, diazo-based compounds, and imidazole-based compounds. ) Compounds, biimidazole-based compounds, fluorene-based compounds, and similar compounds.

The photopolymerization initiator can be used with a photosensitizer capable of causing a chemical reaction by absorbing light and becoming excited and then transferring its energy.

Examples of the sensitizer may be tetraethylene glycol bis-3-mercaptopropionate (tetraethylene glycol bis-3-mercapto propionate), pentaerythritol tetra-3-mercaptopropionate (pentaerythritol tetrakis-3-mercapto propionate), Dipentaerythritol tetrakis-3-mercapto propionate, and similar compounds.

Based on the total amount of the photosensitive resin composition, the photopolymerization initiator may be included in an amount of 0.1% by weight to 5% by weight, for example, 0.1% by weight to 3% by weight. When a photopolymerization initiator is included in the range, sufficient photopolymerization occurs during exposure during pattern formation, excellent reliability can be achieved, and heat resistance, light resistance and chemical resistance, resolution, and tightness of the pattern can be improved Contact characteristics, and can prevent the reduction of transmittance due to non-reaction initiators. (E) Solvent

Solvents are materials that have compatibility with colorants, binder resins, photopolymerizable compounds, and photopolymerization initiators, but do not react with them.

Examples of the solvent may include, but are not limited to, alcohols, such as methanol, ethanol, and the like; ethers, such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether, Tetrahydrofuran and the like; glycol ethers (glycol ether), such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, and the like; ethylene glycol acetate ethyl ether (cellosolve acetate), such as methyl glycol acetate ethyl ether, Ethyl glycol acetate ether, diethyl glycol acetate ether, and the like; carbitol, such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether , Diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether and the like; propylene glycol alkyl ether acetate (propylene glycol alkylether acetate), such as propylene glycol methyl ether Ether acetate, propylene glycol propyl ether acetate and the like; aromatic hydrocarbons such as toluene, xylene and the like; ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl 2-pentanone, methyl-n-acetone, methyl-n-butanone, methyl-n-pentanone, 2-heptanone, and the like; saturated aliphatic monocarboxylic acid alkyl esters, such as ethyl acetate , N-butyl acetate, isobutyl acetate and the like; lactic acid esters (lactic acid esters) such as methyl lactate, ethyl lactate and the like; oxy acetic acid alkyl esters (oxy acetic acid alkyl ester), such as Methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate and the like; alkyl alkoxyacetates such as methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate Ester, methyl ethoxyacetate, ethyl ethoxyacetate and the like; 3-oxy propionic acid alkyl esters (3-oxy propionic acid alkylester), such as 3-oxy propionic acid methyl ester, 3- Ethyloxypropionate and the like; 3-alkoxypropionic acid alkyl esters, such as 3-methoxypropionic acid methyl ester, 3-methoxypropionic acid ethyl ester, 3-ethoxypropionic acid Ethyl acetate, methyl 3-ethoxypropionate and the like; alkyl esters of 2-oxypropionate, such as methyl 2-oxypropionate, ethyl 2-oxypropionate, 2-oxypropionate Propyl propionate and the like; 2-alkoxypropionic acid alkyl esters, such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate , Methyl 2-ethoxypropionate and the like; 2-oxy-2-methyl propionate esters, such as methyl 2-oxy-2-methyl propionate, 2-oxy-2- Ethyl methylpropionate and the like; 2-alkoxy-2-methylpropionic acid alkyl esters of monooxymonocarboxylic acid alkyl esters, such as 2-methoxy-2-methylpropane Methyl acid ester, 2-ethoxy-2-methyl ethyl propionate and the like; esters, such as ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methyl propionate, ethyl glycolate Ester, methyl 2-hydroxy-3-methylbutyrate And analogs; keto esters, such as ethyl pyruvate and the like. In addition, high boiling point solvents such as N-methylformamide, N,N-dimethylformamide, N-methylformamide, N-methylacetamide, N,N-di Methylacetamide, N-methylpyrrolidone, dimethylsulfoxide, benzyl ether, dihexyl ether, acetone, isophorone, caproic acid, caprylic acid , 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, phenyl cellosolve acetate and the like.

In view of miscibility and reactivity, ketones such as cyclohexanone and the like can be preferably used; ethylene glycol alkyl ether acetate, such as ethyl cellosolve acetic acid Ester (ethyl cellosolve acetate) and the like; esters, such as ethyl 2-hydroxypropionate and the like; carbitol, such as diethylene glycol monomethyl ether and the like; propylene glycol alkyl ether acetate, such as Propylene glycol methyl ether acetate, propylene glycol propyl ether acetate.

Based on the total amount of the photosensitive resin composition, the solvent is used in a balance amount of, for example, 20% by weight to 80% by weight, for example, 25% by weight to 60% by weight. When a solvent is included in the above range, the photosensitive resin composition may have an appropriate viscosity, thereby improving the coating characteristics of the color filter layer. Other additives

The photosensitive resin composition according to the embodiment may further include an epoxy compound to improve close contact characteristics with the substrate.

Examples of the epoxy compound may include a phenol novolac epoxy compound, a tetramethylbiphenyl epoxy compound, a bisphenol A epoxy compound, an alicyclic epoxy compound, or a combination thereof.

The epoxy compound may be included in an amount of 0.01 parts by weight to 20 parts by weight, for example, 0.1 parts by weight to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the epoxy compound is included in the range, intimate contact characteristics, storage characteristics, and the like can be improved.

In addition, the photosensitive resin composition may further include a silane coupling agent having a reactive substituent such as a carboxyl group, a methacryloyl group, an isocyanate group, an epoxy group, and the like to improve Its adhesion to the substrate.

Examples of the silane-based coupling agent may include trimethoxysilyl benzoic acid, γ methylpropenyl propoxy trimethoxy silane, vinyl triethoxy silane, vinyl trimethoxy silane, γ isocyanate propyl tri Ethoxysilane, γ glycidoxypropyltrimethoxysilane, β epoxycyclohexylethyltrimethoxysilane, vinylchlorosilane, vinyltrimethoxysilane, vinyltriethoxysilane, 2 -(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3-shrink Glyceryloxypropyl diethoxysilane, 3-glycidoxypropyltriethoxysilane, p-styryltrimethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-Methylacryloxypropyltrimethoxysilane, 3-Methylacryloxypropylmethyldimethoxysilane, 3-Methylacryloxypropylmethyldiethoxysilane , 3-propenyl propyl propyl trimethoxy silane, N-2-(aminoethyl)-3-aminopropyl methyl dimethoxy silane, N-2-(aminoethyl)-3-amino Propyltrimethoxysilane, N-2-(aminoethyl)-3-aminopropylmethyltriethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane , 3-triethoxysilane-N-(1,3-dimethylbutylene)propylamine, N-phenyl-3-aminopropyltrimethoxysilane, 3-chloropropyltrimethoxysilane, 3-mercaptopropylmethyldimethoxysilane, 3-mercaptopropyltrimethoxysilane, bis(triethoxysilylpropyl)tetrasulfide, 3-isocyanatepropyltriethoxysilane and the like Compounds, and can be used alone or in a mixture of two or more.

The silane coupling agent may be included in an amount of 0.01 parts by weight to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the silane coupling agent is included in the range, intimate contact performance, storage performance, and the like can be improved.

In addition, if necessary, the photosensitive resin composition may further contain a surfactant to improve coating characteristics and prevent defects.

Examples of the surfactant may be commercially available BM-1000 ^® , BM-1100 ^® and similar fluorine-based surfactants of BM Chemie Inc.; Dainippon Ink Kagaku Kogyo Co., Ltd) MEGAFACE F 142D ^® , F 172 ^® , F 173 ^® , F 183 ^® , F 554 ^® and similar products; the Sumitomo 3M Co., Ltd. (Sumitomo 3M Co., Ltd) FULORAD FC-135 ^® , FC-170C ^® , FC-430 ^® , FC-431 ^® and similar products; SURFLON S-112 of ASAHI Glass Co., Ltd. ^® , S-113 ^® , S-131 ^® , S-141 ^® , S-145 ^® and similar products; SH-28PA ^® , SH-190 ^® , SH-193 ^® , SZ-6032 ^® , SF-8428 ^® and similar product.

The surfactant may be included in an amount of 0.001 part by weight to 5 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the surfactant is included in the range, uniformity of coating is ensured, stain is not found, and the wetting property of the glass substrate is excellent.

In addition, unless the performance is degraded, the photosensitive resin composition may further contain a predetermined amount of other additives, such as oxidation inhibitors, stabilizers, and similar additives.

According to another embodiment, a photosensitive resin layer manufactured using the photosensitive resin composition according to the embodiment is provided.

The pattern forming process in the photosensitive resin layer is as follows.

The process includes applying the photosensitive resin composition according to the embodiment to the support substrate by spin coating, slit coating, inkjet printing, etc.; drying the applied photosensitive resin composition to form the photosensitive resin composition Layer; exposing the photosensitive resin composition; developing the exposed photosensitive resin composition in an alkaline aqueous solution to obtain a photosensitive resin layer; and heat-treating the photosensitive resin layer. The conditions of the patterning process are well known in the related art and are not described in detail in this specification.

According to an embodiment, a color filter layer including a photosensitive resin layer is provided.

Hereinafter, the present invention is explained in more detail with reference to examples, but these examples are not to be construed as limiting the scope of the present invention in any sense. ( Synthesis of Dyes ) Synthesis Example 1 : Synthesis of dye represented by Chemical Formula 1-1

30 g (0.2 mol) of para-aldehyde benzoic acid was put in a round bottom flask, 600 g of propionic acid was added thereto, and the mixture was stirred. 13.5 g (0.2 mol) of pyrrole was added thereto, and the resulting mixture was heated to 80°C, stirred for 1 hour, heated to 130°C, and stirred for 1.5 hours to complete the reaction. The reaction was cooled to room temperature (23°C), 300 g of acetone was added thereto, and the resulting mixture was stirred at room temperature for 1 hour and filtered. Subsequently, the solid compound on the screening program was collected, washed with acetone, and dried to synthesize 8.3 g (26%) of intermediate (A).

Then, 24.5 g (30.1 mmol) of Intermediate A and 34.3 g (241 mmol) of K ₂ CO _{3 were} placed in a round bottom flask, 250 g of dimethylformamide (DMF) was added thereto, and The resulting mixture was stirred. 46.5 g (241 mmol) of 1-bromo-2-ethylhexane was added thereto, and the resulting mixture was stirred at 100°C for 24 hours. After the reaction was completed, the temperature was lowered to room temperature, dimethylformamide was removed by distillation, extracted with methylene chloride (MC), and the resulting product was washed with 10% sodium chloride and DI water. Subsequently, the solvent was removed by distillation, MeCN was added thereto, and the resulting mixture was washed and dried to obtain 28.9 g (75%) of Compound (B).

Then, 1.0 g (0.81 mmol) of intermediate (B) and 0.44 g (2.42 mmol) of Cu(OAc) ₂ H ₂ O were put in a round bottom flask, 10 g of DMF was added thereto, and the mixture Stir at 100°C for 15 hours. When the reaction was completed, the temperature was lowered to room temperature, DMF was removed by distillation, extracted with MC, and the product was washed with 10% sodium chloride and DI. Subsequently, the solvent was removed by distillation, the reactant was dissolved by using a minimum amount of MC, and the solution was slowly added dropwise to 100 g of MeCN for precipitation. The precipitate thus obtained was filtered, washed with MeCN, and dried to obtain 0.9 g (86%) of the compound represented by Chemical Formula 1-1.

[Chemical Formula 1-1]

LC Mass: 1299 m/z Synthesis Example 2 : Synthesis of dye represented by Chemical Formula 1-2

In addition to using vanadium oxide sulfate hydrate (2.42 mmol) based on 1.0 g (0.81 mmol) of intermediate (B) instead of Cu(OAc) ₂ H ₂ O, and the temperature was raised to 120 Except for carrying out the reaction at ℃, according to the same method as in Synthesis Example 1, 0.84 g (80%) of the compound represented by Chemical Formula 1-2 was obtained.

[Chemical Formula 1-2]

LC Mass: 1303 m/z Comparative Synthesis Example 1 : Synthesis of compounds represented by Chemical Formulas 1-3

3.2 g (2.58 mmol) of intermediate (B) was put in a round bottom flask, 160 g of chloroform was added thereto, and the mixture was stirred at 60°C. 1.42 g (7.74 mmol) of Zn(OAc) _{2 was} put in another round bottom flask, 30 g of MeOH was added thereto, and the resulting mixture was stirred at room temperature to dissolve Zn(OAc) ₂ . Subsequently, the Zn(OAc) ₂ solution was added to the flask containing the intermediate (B), and the mixture was stirred for 2 hours to carry out the reaction. After the reaction was completed, the temperature was lowered to room temperature, extracted with MC, and washed with 10% NaCl and DI water. After the solvent was distilled off, the reactant was dissolved with a minimum amount of MC, and the resulting solution was slowly added dropwise to 100 g of MeCN for precipitation. The precipitate thus obtained was filtered, washed with MeCN, and dried to obtain 3.1 g (92%) of the compound represented by Chemical Formula 1-3.

[Chemical Formula 1-3]

LC Mass: 1300 m/z (synthetic photosensitive resin composition) Examples 1 , 2 and Comparative Examples 1 to 3

The following components were mixed in the composition shown in Table 1 to prepare photosensitive resin compositions according to Example 1, Example 2, and Comparative Examples 1 to 3.

Specifically, the photopolymerization initiator was dissolved in a solvent, the solution was stirred at room temperature for 2 hours, a binder resin and a photopolymerizable compound were added thereto, and the resulting mixture was stirred at room temperature for 2 hours. Subsequently, a blue pigment dispersion, colorant, and other additives were added to the reactant, and the resulting mixture was stirred at room temperature for 1 hour. Subsequently, the product obtained therefrom was filtered three times to remove impurities, thereby preparing each photosensitive resin composition.

（ A ）著色劑 [Table 1] (Unit:% by weight)

( A ) Colorant

(A-1) C.I. Pigment Blue 15:6 pigment dispersion (GC1679, Sanyo; pigment solids content 10%)

(A-2) C.I. Pigment Blue 15:6 pigment dispersion (GC1207, Sanyo; pigment solids content 10%)

(A-3) The compound of Comparative Synthesis Example 1 (dye represented by Chemical Formula 1-3)

(A-4) Synthesis of the compound of Example 1 (dye represented by Chemical Formula 1-1)

(A-5) Synthesis of the compound of Example 2 (dye represented by Chemical Formula 1-2) ( B ) Binder resin

Acrylic adhesive resin (CRB-400H, SMS) ( C ) photopolymerizable compound

Dipentaerythritol hexaacrylate (DPHA) (Nippon Kayaku Co., Ltd.) ( D ) Photopolymerization initiator

Oxime compounds (OXE01, BASF) ( E ) solvent

Propylene glycol methyl ether acetate (Kyowa Co., Ltd.) ( F ) Additive

Fluorine surfactant (F-554, DIC Co., Ltd.) Evaluation : Bx color coordinates and light resistance

Each photosensitive resin composition of Example 1, Example 2, and Comparative Example 1 to Comparative Example 3 was prepared on a 1 mm thick degreased and washed glass substrate at 250 revolutions per minute (rpm) to 350 revolutions per minute It was coated to a thickness of 1 μm to 3 μm, and then dried on a hot plate at 90° C. for 2 minutes to obtain a film. Subsequently, the film was exposed at 50 millijoules/square centimeter (mJ/cm ² ) by using a high-pressure mercury lamp with a main wavelength of 365 nanometers, and by using a KOH developer (111-fold diluted solution) in the washing solution/developer = The film was developed under the condition of 1/0.8 for 60 seconds and washed for another 60 seconds. Subsequently, the film was dried in a forced convection drying oven at 230° C. for 20 minutes to obtain each color sample (color chip).

The CIE color coordinates and brightness (Y) of each color sample were measured before and after using a spectrophotometer (MCPD3000, Otsuka Electronics) to evaluate the light resistance, and the results of the changes based on the light resistance evaluation are shown in Table 2. And in Table 3.

*Light resistance evaluation: Xenon lamp (0.68 watt), under the respective environmental conditions of air and N ₂ gas, at 60 ℃ for 20 hours

[Table 2]

[table 3]

From Tables 2 and 3, when the azaporphyrin-based dye represented by Chemical Formula 1-1 or Chemical Formula 1-2 is used together with the blue pigment, it can be confirmed that the blue resistance is achieved while maintaining sufficient improvement in light resistance in a small amount High color in etchant.

Although the present invention has been described in conjunction with embodiments currently considered to be practical example embodiments, it should be understood that the present invention is not limited to the disclosed embodiments. On the contrary, it is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended patent application.

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Claims (13)

A photosensitive resin composition, including: (A) Colorants, including blue pigments and azaporphyrin dyes with maximum absorption wavelengths in the wavelength range of 350 nm to 450 nm; (B) Binder resin; (C) Photopolymerizable compounds; (D) Photopolymerization initiator; and (E) Solvent. The photosensitive resin composition as described in item 1 of the patent application range, wherein the azaporphyrin-based dye includes a central metal of Cu or V(=O). The photosensitive resin composition as described in item 1 of the patent application range, wherein the azaporphyrin-based dye is represented by Chemical Formula 1: [Chemical Formula 1]

Among them, in Chemical Formula 1, M is Cu or V(=O), and R ¹ to R ^{20 are} independently a hydrogen atom, a halogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C6 to C20 aryl, sulfonic acid, substituted or unsubstituted sulfonamide or substituted or unsubstituted C1 to C20 alkyl ester, provided that R ¹ to R At least one of ⁵ , at least one of R ⁶ to R ¹⁰ , at least one of R ¹¹ to R ¹⁵ and at least one of R ¹⁶ to R ²⁰ are not independent hydrogen atoms. The photosensitive resin composition as described in item 3 of the patent application scope, wherein one of R ¹ to R ⁵ , one of R ⁶ to R ¹⁰ , one of R ¹¹ to R ¹⁵ and one of R ¹⁶ to R ²⁰ One of is independently represented by Chemical Formula 2: [Chemical Formula 2]

Among them, in Chemical Formula 2, R ²¹ is a substituted or unsubstituted C1 to C20 alkyl group. The photosensitive resin composition as described in item 4 of the patent application scope, wherein R ³ , R ⁸ , R ¹³ and R ^{18 are} independently represented by Chemical Formula 3: [Chemical Formula 3]

Among them, in Chemical Formula 3, L ¹ is a substituted or unsubstituted C1 to C20 alkylene group, and R ²² and R ^{23 are} independently a substituted or unsubstituted C1 to C20 alkyl group. The photosensitive resin composition as described in Item 1 of the patent application range, wherein the azaporphyrin-based dye is represented by Chemical Formula 1-1 or Chemical Formula 1-2: [Chemical Formula 1-1]

[Chemical Formula 1-2]

. The photosensitive resin composition according to item 1 of the patent application range, wherein the azaporphyrin-based dye is contained in an amount of 0.1% to 5% by weight based on the total solid amount of the photosensitive resin composition. The photosensitive resin composition as described in item 1 of the patent application range, wherein the colorant further includes a purple pigment. The photosensitive resin composition as described in item 1 of the patent application range, wherein the blue pigment is C.I. Pigment Blue 15:6. The photosensitive resin composition as described in item 1 of the patent application range, wherein the photosensitive resin composition includes, based on the total amount of the photosensitive resin composition 2% to 40% by weight of the colorant; 3% to 20% by weight of the binder resin; 1% to 20% by weight of the photopolymerizable compound; 0.1% to 5% by weight of the photopolymerization initiator; and The balance of the solvent. The photosensitive resin composition as described in item 1 of the patent application scope, wherein the photosensitive resin composition further includes an epoxy compound, a silane coupling agent, a surfactant, or a combination thereof. A photosensitive resin layer manufactured using the photosensitive resin composition as described in any one of patent application items 1 to 11. A color filter layer includes a photosensitive resin layer as described in item 12 of the patent application scope.