TW202020062A - Photosensitive resin composition, photosensitive resin layer and color filter layer - Google Patents

Photosensitive resin composition, photosensitive resin layer and color filter layer Download PDF

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TW202020062A
TW202020062A TW108132662A TW108132662A TW202020062A TW 202020062 A TW202020062 A TW 202020062A TW 108132662 A TW108132662 A TW 108132662A TW 108132662 A TW108132662 A TW 108132662A TW 202020062 A TW202020062 A TW 202020062A
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photosensitive resin
resin composition
chemical formula
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TWI731411B (en
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許洙榮
金善大
李智惠
郭善榮
金智恩
李英
鄭周昊
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南韓商三星Sdi股份有限公司
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B47/00Porphines; Azaporphines
    • C09B47/04Phthalocyanines abbreviation: Pc
    • C09B47/08Preparation from other phthalocyanine compounds, e.g. cobaltphthalocyanineamine complex
    • C09B47/085Preparation from other phthalocyanine compounds, e.g. cobaltphthalocyanineamine complex substituting the central metal atom
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

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  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Structural Engineering (AREA)
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  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Organic Chemistry (AREA)
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  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)

Abstract

Disclosed are a photosensitive resin composition including (A) a colorant including a blue pigment and an azaporphyrin-based dye having a maximum absorption wavelength in a wavelength region of 350 nm to 450 nm; (B) a binder resin; (C) a photopolymerizable compound; (D) a photopolymerization initiator; and (E) a solvent, a photosensitive resin layer manufactured using the photosensitive resin composition, and a color filter layer.

Description

感光性樹脂組成物、感光性樹脂層以及彩色濾光片層Photosensitive resin composition, photosensitive resin layer, and color filter layer

本發明是有關於一種感光性樹脂組成物、使用所述組成物的感光性樹脂層以及包含所述感光性樹脂層的彩色濾光片層。 [相關申請案的交叉參考]The present invention relates to a photosensitive resin composition, a photosensitive resin layer using the composition, and a color filter layer including the photosensitive resin layer. [Cross-reference to related applications]

本申請案要求2018年11月26日在韓國智慧財產權局提交的第10-2018-0147495號韓國專利申請案的優先權和權益,所述申請案的全部內容以引用的方式併入本文中。This application requires the priority and rights of Korean Patent Application No. 10-2018-0147495 filed on November 26, 2018 at the Korea Intellectual Property Office, and the entire contents of the application are incorporated herein by reference.

在許多類型的顯示器中,液晶顯示裝置的優勢在於亮度、薄度、低成本、低操作功耗以及對積體電路(integrated circuit)的黏附性改進,且已更廣泛地用於筆記型電腦、監視器以及TV螢幕。液晶顯示裝置包含其上形成有黑矩陣(遮光層)、彩色濾光片以及ITO畫素電極的下部基底,以及其上形成有包含液晶層、薄膜電晶體以及電容器層的主動電路(active circuit)部分和ITO畫素電極的上部基底。Among many types of displays, the advantages of liquid crystal display devices are brightness, thinness, low cost, low operating power consumption, and improved adhesion to integrated circuits, and have been more widely used in notebook computers, Monitor and TV screen. The liquid crystal display device includes a lower substrate on which a black matrix (light shielding layer), a color filter, and an ITO pixel electrode are formed, and an active circuit including a liquid crystal layer, a thin film transistor, and a capacitor layer is formed thereon Part and the upper substrate of the ITO pixel electrode.

通過依序堆疊多個彩色濾光片(通常,以預定順序由三原色(如紅(R)、綠(G)以及藍(B))形成以形成每一畫素)來在畫素區域中形成彩色濾光片,且黑矩陣(遮光層)以預定圖案安置在透明基底上,以形成畫素之間的邊界。Formed in the pixel area by stacking a plurality of color filters in sequence (usually, formed from three primary colors (such as red (R), green (G), and blue (B)) in a predetermined order to form each pixel) A color filter, and a black matrix (light shielding layer) is placed on a transparent substrate in a predetermined pattern to form a boundary between pixels.

作為實現彩色濾光片的方法中的一種的顏料分散方法通過重複一系列過程來提供彩色薄膜,所述一系列過程例如將包含著色劑的光可聚合組成物塗佈在包含黑矩陣的透明基底上、將形成的圖案曝光、用溶劑去除未曝光部分以及熱固化所述組成物。用於根據顏料分散方法製造彩色濾光片的著色感光性樹脂組成物,一般包含鹼溶性樹脂、光可聚合單體、光聚合引發劑、環氧樹脂、溶劑、其它添加劑以及類似物。具有上述特徵的顏料分散方法積極應用於製造行動電話、筆記型電腦、監視器以及TV的液晶顯示器。The pigment dispersion method, which is one of the methods for realizing the color filter, provides a color film by repeating a series of processes such as coating a photopolymerizable composition containing a colorant on a transparent substrate containing a black matrix Above, the formed pattern is exposed, the unexposed part is removed with a solvent, and the composition is thermally cured. The coloring photosensitive resin composition used for manufacturing the color filter according to the pigment dispersion method generally contains an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, an epoxy resin, a solvent, other additives, and the like. The pigment dispersion method having the above-mentioned characteristics is actively applied to manufacture liquid crystal displays of mobile phones, notebook computers, monitors, and TVs.

然而,使用具有許多優點的顏料分散方法的彩色濾光片中的感光性樹脂組成物具有一些缺陷,因為在精細地粉碎粉末時存在困難,從而需要多種添加劑以用於即使在分散和複雜過程的情況下使分散液穩定,且進一步在複雜的存儲和運輸條件下維持顏料分散液的最佳品質。However, the photosensitive resin composition in the color filter using the pigment dispersion method with many advantages has some drawbacks because there are difficulties in finely pulverizing the powder, thereby requiring various additives for use even in dispersion and complicated processes In this case, the dispersion is stabilized, and the optimal quality of the pigment dispersion is further maintained under complex storage and transportation conditions.

另外,通過使用顏料型感光性樹脂組成物製造的彩色濾光片因顏料粒徑(particle size)而在亮度和對比率方面存在局限。用於圖像感測器的彩色圖像感測器裝置需要較小分散粒徑以形成精細圖案。為了回應此要求,已嘗試通過引入染料替代顏料或與顏料一起製備感光性樹脂組成物來實現具有改良彩色特徵的彩色濾光片,所述改良彩色特徵例如亮度、對比率等,但與顏料型感光性樹脂組成物相比,染料型感光性樹脂組成物具有耐光性劣化(light-resistance deterioration)的問題。In addition, color filters manufactured by using a pigment-type photosensitive resin composition have limitations in terms of brightness and contrast ratio due to pigment particle size. The color image sensor device used for the image sensor requires a small dispersed particle diameter to form a fine pattern. In response to this request, attempts have been made to achieve color filters with improved color characteristics by introducing dyes instead of pigments or preparing photosensitive resin compositions together with pigments, such improved color characteristics such as brightness, contrast ratio, etc., but with pigment type Compared with the photosensitive resin composition, the dye-type photosensitive resin composition has a problem of light-resistance deterioration.

已經嘗試過應用C.I.顏料藍15:3(β型)或C.I.顏料藍15:4(β型)顏料來代替顏料藍15:6(ε型)顏料,但是在這種情況下,儘管改良耐光性,但在高色彩藍色(high-color blue)抗蝕劑中Bx色彩座標增大,這是一個問題,因為它不適合近來對高色彩再現(color reproduction)的增大需求的趨勢。It has been tried to use CI Pigment Blue 15:3 (β-type) or CI Pigment Blue 15:4 (β-type) pigments instead of Pigment Blue 15:6 (ε-type) pigments, but in this case, despite improved light resistance However, the increase in Bx color coordinates in high-color blue resists is a problem because it is not suitable for the recent trend of increasing demand for high color reproduction.

因此,繼續研究能夠同時進行高色彩再現(在高色彩藍色抗蝕劑中具有小Bx色彩座標)而不引起耐光性劣化的感光性樹脂組成物。Therefore, research on a photosensitive resin composition capable of simultaneous high color reproduction (having small Bx color coordinates in a high-color blue resist) without causing deterioration in light resistance is continued.

實施例提供具有高色彩再現同時具有改良耐光性的感光性樹脂組成物。The embodiment provides a photosensitive resin composition having high color reproduction while having improved light resistance.

另一實施例提供使用感光性樹脂組成物製造的感光性樹脂層。Another embodiment provides a photosensitive resin layer manufactured using a photosensitive resin composition.

另一實施例提供包含感光性樹脂層的彩色濾光片層。Another embodiment provides a color filter layer including a photosensitive resin layer.

本發明的實施例提供感光性樹脂組成物,其包含:(A)著色劑,包含藍色顏料和在350奈米到450奈米的波長範圍內具有最大吸收波長的氮雜卟啉類染料(azaporphyrin-based dye);(B)黏合劑樹脂;(C)光可聚合化合物;(D)光聚合引發劑;以及(E)溶劑。Embodiments of the present invention provide a photosensitive resin composition, which includes: (A) a colorant, including a blue pigment and an azaporphyrin-based dye having a maximum absorption wavelength in the wavelength range of 350 nm to 450 nm ( azaporphyrin-based dye); (B) binder resin; (C) photopolymerizable compound; (D) photopolymerization initiator; and (E) solvent.

氮雜卟啉類染料可以包含Cu或V(=O)的中心金屬。The azaporphyrin-based dye may contain a central metal of Cu or V (=O).

氮雜卟啉類染料可以由化學式1表示。 [化學式1]

Figure 02_image001
在化學式1中, M是Cu或V(=O),且 R1 到R20 獨立地是氫原子、鹵素原子、取代或未取代的C1到C20烷基、取代或未取代的C1到C20烷氧基、取代或未取代的C6到C20芳基、磺酸基、取代或未取代的磺醯胺基或取代或未取代的C1到C20烷基酯基, 條件為,R1 到R5 中的至少一個、R6 到R10 中的至少一個、R11 到R15 中的至少一個以及R16 到R20 中的至少一個不是獨立的氫原子。The azaporphyrin-based dye can be represented by Chemical Formula 1. [Chemical Formula 1]
Figure 02_image001
In Chemical Formula 1, M is Cu or V (=O), and R 1 to R 20 are independently a hydrogen atom, a halogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkyl group Oxygen group, substituted or unsubstituted C6 to C20 aryl group, sulfonic acid group, substituted or unsubstituted sulfonamide group or substituted or unsubstituted C1 to C20 alkyl ester group, provided that R 1 to R 5 At least one of R, at least one of R 6 to R 10 , at least one of R 11 to R 15 and at least one of R 16 to R 20 are not independent hydrogen atoms.

R1 到R5 中的一個、R6 到R10 中的一個、R11 到R15 中的一個以及R16 到R20 中的一個可獨立地由化學式2表示。 [化學式2]

Figure 02_image003
在化學式2中, R21 是取代或未取代的C1到C20烷基。One of R 1 to R 5 , one of R 6 to R 10 , one of R 11 to R 15 , and one of R 16 to R 20 may be independently represented by Chemical Formula 2. [Chemical Formula 2]
Figure 02_image003
In Chemical Formula 2, R 21 is a substituted or unsubstituted C1 to C20 alkyl group.

R3 、R8 、R13 以及R18 可獨立地由化學式3表示。 [化學式3]

Figure 02_image005
在化學式3中, L1 是取代或未取代的C1到C20伸烷基(alkylene group),且 R22 和R23 獨立地是取代或未取代的C1到C20烷基。R 3 , R 8 , R 13 and R 18 may be independently represented by Chemical Formula 3. [Chemical Formula 3]
Figure 02_image005
In Chemical Formula 3, L 1 is a substituted or unsubstituted C1 to C20 alkylene group, and R 22 and R 23 are independently a substituted or unsubstituted C1 to C20 alkyl group.

氮雜卟啉類染料可由化學式1-1或化學式1-2表示。 [化學式1-1]

Figure 02_image007
[化學式1-2]
Figure 02_image009
The azaporphyrin-based dye can be represented by Chemical Formula 1-1 or Chemical Formula 1-2. [Chemical Formula 1-1]
Figure 02_image007
[Chemical Formula 1-2]
Figure 02_image009

基於感光性樹脂組成物的總固體量,可以包含0.1重量%到5重量%的量的氮雜卟啉類染料。The azaporphyrin-based dye may be included in an amount of 0.1% to 5% by weight based on the total solid amount of the photosensitive resin composition.

著色劑可進一步包含紫色(violet)顏料。The colorant may further include a violet pigment.

藍色顏料可以是C.I.顏料藍15:6。The blue pigment may be C.I. Pigment Blue 15:6.

基於感光性樹脂組成物的總量,感光性樹脂組成物可包含2重量%到40重量%的著色劑;3重量%到20重量%的黏合劑樹脂;1重量%到20%重量的光可聚合化合物;0.1重量%到5重量%的光聚合引發劑;以及餘量的溶劑。Based on the total amount of the photosensitive resin composition, the photosensitive resin composition may contain 2% to 40% by weight of coloring agent; 3% to 20% by weight of the binder resin; 1% to 20% by weight of light resin Polymerization compound; 0.1% to 5% by weight of photopolymerization initiator; and the balance of solvent.

感光性樹脂組成物可進一步包含環氧化合物、矽烷偶合劑、表面活性劑或其組合。The photosensitive resin composition may further contain an epoxy compound, a silane coupling agent, a surfactant, or a combination thereof.

另一實施例提供使用感光性樹脂組成物製造的感光性樹脂層。Another embodiment provides a photosensitive resin layer manufactured using a photosensitive resin composition.

另一實施例提供包含感光性樹脂層的彩色濾光片層。Another embodiment provides a color filter layer including a photosensitive resin layer.

本發明的其它方面包含在以下詳細描述中。Other aspects of the invention are included in the following detailed description.

根據實施例的感光性樹脂組成物包含阻擋350奈米到450奈米的波長範圍的光的化合物,以便改良構成光學顯示裝置(如液晶顯示器(liquid crystal display,LCD)等)的面板的彩色濾光片層的色彩再現性,且因此即使在高色彩座標下也可維持相對高的耐光性。特別地,化合物具有在非常窄的波長區域內強烈吸收光的特性,且因此可阻擋對應區域的光譜並實現高色彩(藍色)。The photosensitive resin composition according to the embodiment contains a compound that blocks light in the wavelength range of 350 nm to 450 nm in order to improve the color filter of the panel constituting the optical display device (such as liquid crystal display (LCD), etc.) The color reproducibility of the light sheet layer, and therefore relatively high light resistance can be maintained even at high color coordinates. In particular, the compound has a characteristic of absorbing light strongly in a very narrow wavelength region, and thus can block the spectrum of the corresponding region and achieve high color (blue).

在下文中詳細地描述本發明的實施例。然而,這些實施例是示例性,本發明不限於此且本發明是由申請專利範圍的範圍定義。Hereinafter, embodiments of the present invention are described in detail. However, these embodiments are exemplary, the present invention is not limited thereto and the present invention is defined by the scope of patent application.

在本說明書中,當未另外提供具體定義時,「取代」是指經由以下中選出的取代基取代:鹵素(F、Br、Cl或I)、羥基、硝基、氰基、氨基(NH2 、NH(R200 )或N(R201 )(R202 ),其中R200 、R201 以及R202 相同或不同,且獨立地是C1到C10烷基)、脒基(amidino group)、肼基(hydrazine group)、腙基(hydrazone group)、羧基、取代或未取代的烷基、取代或未取代的烯基、取代或未取代的炔基、取代或未取代的脂環族有機基、取代或未取代的芳基以及取代或未取代的雜環基。In this specification, when a specific definition is not otherwise provided, "substitution" refers to substitution by a substituent selected from the following: halogen (F, Br, Cl, or I), hydroxyl, nitro, cyano, amino (NH 2 , NH(R 200 ) or N(R 201 )(R 202 ), where R 200 , R 201 and R 202 are the same or different, and are independently C1 to C10 alkyl), amidino group, hydrazino (Hydrazine group), hydrazone group (hydrazone group), carboxyl group, substituted or unsubstituted alkyl group, substituted or unsubstituted alkenyl group, substituted or unsubstituted alkynyl group, substituted or unsubstituted alicyclic organic group, substituted Or unsubstituted aryl and substituted or unsubstituted heterocyclic.

在本說明書中,當未另外提供具體定義時,「烷基」是指C1到C20烷基,且具體地說C1到C15烷基,「環烷基」是指C3到C20環烷基,且具體地說C3到C18環烷基,「烷氧基」是指C1到C20烷氧基,且具體地說C1到C18烷氧基,「芳基」是指C6到C20芳基,且具體地說C6到C18芳基,「烯基」是指C2到C20烯基,且具體地說C2到C18烯基,「伸烷基」是指C1到C20伸烷基,且具體地說C1到C18伸烷基,且「伸芳基」是指C6到C20伸芳基,且具體地說C6到C16伸芳基。In this specification, when no specific definition is provided otherwise, "alkyl" refers to C1 to C20 alkyl, and specifically C1 to C15 alkyl, and "cycloalkyl" refers to C3 to C20 cycloalkyl, and Specifically C3 to C18 cycloalkyl, "alkoxy" means C1 to C20 alkoxy, and specifically C1 to C18 alkoxy, "aryl" means C6 to C20 aryl, and specifically Said C6 to C18 aryl, "alkenyl" refers to C2 to C20 alkenyl, and specifically C2 to C18 alkenyl, "alkylene" refers to C1 to C20 alkylene, and specifically C1 to C18 Alkyl extension, and "arylene extension" refers to C6 to C20 aryl extension, and specifically C6 to C16 aryl extension.

在本說明書中,當未另外提供具體定義時,「(甲基)丙烯酸酯」是指「丙烯酸酯」和「甲基丙烯酸酯」,且「(甲基)丙烯酸」是指「丙烯酸」和「甲基丙烯酸」。In this specification, when no specific definition is provided otherwise, "(meth)acrylate" means "acrylate" and "methacrylate", and "(meth)acrylic acid" means "acrylic acid" and " Methacrylate".

在本說明書中,當未另外提供定義時,術語「組合」是指混合或共聚合。另外,「共聚合」是指嵌段共聚合(block copolymerization)到無規(random)共聚合,且「共聚物」是指嵌段共聚物到無規共聚物。In this specification, when a definition is not otherwise provided, the term "combination" refers to mixing or copolymerization. In addition, "copolymerization" refers to block copolymerization to random copolymerization, and "copolymer" refers to block copolymer to random copolymer.

在本說明書的化學式中,除非另外提供具體定義,否則當化學鍵在應給出的位置處未繪製時,氫鍵結在所述位置處。In the chemical formula of this specification, unless a specific definition is provided otherwise, when the chemical bond is not drawn at the position to be given, hydrogen bonding is at the position.

在本說明書中,當未另外提供具體定義時,「*」指示連接相同或不同原子或化學式的點。In this specification, when no specific definition is provided otherwise, "*" indicates a point connecting the same or different atoms or chemical formulas.

此外,當在本說明書中將任何構件設置在另一構件「上」時,構件不僅可接觸另一構件,而且在這兩個構件之間還可存在另一構件。In addition, when any member is disposed "on" another member in this specification, the member may not only contact the other member, but another member may exist between the two members.

此外,在本發明書中,除非明確地描述為相反情況,否則詞語「包括(comprise)」及其變體(如包括(comprises/comprising))應理解為暗示包括所陳述的元件而不排除任何其它元件。In addition, in the present invention, unless explicitly described as the contrary, the word "comprise" and its variants (such as (comprises/comprising)) should be understood as implying the inclusion of the stated elements without excluding any Other components.

實施例提供感光性樹脂組成物,包含:(A)著色劑,包含藍色顏料和在350奈米到450奈米的波長範圍內具有最大吸收波長的氮雜卟啉類染料;(B)黏合劑樹脂;(C)光可聚合化合物;(D)光聚合引發劑;以及(E)溶劑。The embodiment provides a photosensitive resin composition, including: (A) a colorant including a blue pigment and an azaporphyrin-based dye having a maximum absorption wavelength in a wavelength range of 350 nm to 450 nm; (B) bonding Resin; (C) photopolymerizable compound; (D) photopolymerization initiator; and (E) solvent.

在下文中,具體地描述每個組件。 (A)著色劑In the following, each component is specifically described. (A) Colorant

根據實施例的感光性樹脂組成物包括作為著色劑的藍色顏料和氮雜卟啉類染料。The photosensitive resin composition according to the embodiment includes a blue pigment as a colorant and an azaporphyrin-based dye.

氮雜卟啉類染料在350奈米到450奈米的波長範圍內,例如在400奈米到440奈米的波長範圍內,具有最大吸收波長。The azaporphyrin-based dye has a maximum absorption wavelength in the wavelength range of 350 nm to 450 nm, for example, in the wavelength range of 400 nm to 440 nm.

為了實現高色彩藍色(高色彩藍色抗蝕劑(resist)),必須實現低Bx色彩座標,且因此能夠使耐光性和可加工性的劣化最小化的著色劑的組合及其量是重要的。為了實現高色彩藍色,通常使用增加著色劑量同時藍移(blue-shifting)藍色著色劑的光吸收的方法。然而,由於著色劑的量增加,方法存在大大降低耐久性(endurance)特性(例如耐光性)的問題。因此,已經提出了將不同的染料與藍色著色劑混合的方法,但是當不同的染料應用於藍色著色劑時,耐光性因不同染料而大大降低,因此,很難維持優異的耐光性並同時實現高色彩藍色。例如,已經嘗試使用傳統的偶氮類(azo-base)黃色染料來吸收380奈米到420奈米波長範圍內的光,但是在此,偶氮類黃色染料應該以相對大的量使用,且因此存在不能確保整個組成物的處理裕量(process margin)的問題,並且不能在市場上買到。此外,當常規偶氮類黃色染料與常規藍色顏料(ε藍)一起使用時,由於透射光譜和吸收光譜重疊,藍色透射區域損壞,且因此增大亮度損耗,且因此耐光性可劣化。In order to achieve a high-color blue (high-color blue resist), it is necessary to achieve a low Bx color coordinate, and therefore the combination and amount of colorants that can minimize the deterioration of light resistance and processability are important of. In order to achieve a high-color blue, a method of increasing the amount of coloring while absorbing the blue-shifting blue colorant is generally used. However, as the amount of colorant increases, the method has a problem of greatly reducing endurance characteristics (such as light resistance). Therefore, a method of mixing different dyes with a blue colorant has been proposed, but when different dyes are applied to the blue colorant, the light resistance is greatly reduced due to the different dyes, so it is difficult to maintain excellent light resistance and At the same time achieve a high color blue. For example, attempts have been made to use traditional azo-base yellow dyes to absorb light in the wavelength range of 380 nm to 420 nm, but here, azo yellow dyes should be used in relatively large amounts, and Therefore, there is a problem that the process margin of the entire composition cannot be ensured, and it cannot be purchased on the market. In addition, when the conventional azo-based yellow dye is used together with the conventional blue pigment (ε blue), the blue transmission region is damaged due to the overlap of the transmission spectrum and the absorption spectrum, and thus the luminance loss is increased, and thus the light resistance may be deteriorated.

根據實施例,藍色顏料與氮雜卟啉類染料的混合物可用作著色劑,以最小化耐光性劣化的上述問題,同時實現高色彩藍色,氮雜卟啉類染料在350奈米到450奈米的波長範圍內具有最大吸收波長。According to the embodiment, a mixture of a blue pigment and an porphyrin-based dye can be used as a colorant to minimize the above-mentioned problem of deterioration in light resistance, while achieving high-color blue, the azaporphyrin-based dye ranges from 350 nm to It has a maximum absorption wavelength in the 450 nm wavelength range.

舉例來說,氮雜卟啉類染料可包含Cu或V(=O)的中心金屬。由於高色彩再現和耐光特性取決於氮雜卟啉類染料的中心金屬而改變,氮雜卟啉類染料的中心金屬的類型非常重要。例如,當氮雜卟啉類染料的中心金屬是Zn、Co、Pt等時,即使其與上述藍色顏料的混合物用作著色劑,耐光性也不會提高。For example, the azaporphyrin-based dye may include a central metal of Cu or V(=0). Since high color reproduction and light resistance characteristics vary depending on the central metal of the azaporphyrin dye, the type of the central metal of the azaporphyrin dye is very important. For example, when the central metal of the azaporphyrin-based dye is Zn, Co, Pt, etc., even if the mixture with the above-mentioned blue pigment is used as a colorant, light resistance is not improved.

氮雜卟啉類染料可以由化學式1表示。 [化學式1]

Figure 02_image011
The azaporphyrin-based dye can be represented by Chemical Formula 1. [Chemical Formula 1]
Figure 02_image011

在化學式1中, M是Cu或V(=O),且 R1 到R20 獨立地是氫原子、鹵素原子、取代或未取代的C1到C20烷基、取代或未取代的C1到C20烷氧基、取代或未取代的C6到C20芳基、磺酸基、取代或未取代的磺醯胺基(sulfoneamide group)或取代或未取代的C1到C20烷基酯基(alkylester group), 條件為,R1 到R5 中的至少一個、R6 到R10 中的至少一個、R11 到R15 中的至少一個以及R16 到R20 中的至少一個不是獨立的氫原子。In Chemical Formula 1, M is Cu or V (=O), and R 1 to R 20 are independently a hydrogen atom, a halogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkyl group Oxygen, substituted or unsubstituted C6 to C20 aryl, sulfonic acid, substituted or unsubstituted sulfoneamide group or substituted or unsubstituted C1 to C20 alkylester group, condition For, at least one of R 1 to R 5 , at least one of R 6 to R 10 , at least one of R 11 to R 15 , and at least one of R 16 to R 20 are not independent hydrogen atoms.

舉例來說,在化學式1中,R1 到R5 中的一個、R6 到R10 中的一個、R11 到R15 中的一個以及R16 到R20 中的一個可獨立地由化學式2表示。 [化學式2]

Figure 02_image013
For example, in Chemical Formula 1, one of R 1 to R 5 , one of R 6 to R 10 , one of R 11 to R 15 , and one of R 16 to R 20 can be independently determined by Chemical Formula 2 Said. [Chemical Formula 2]
Figure 02_image013

在化學式2中,R21 是取代或未取代的C1到C20烷基。In Chemical Formula 2, R 21 is a substituted or unsubstituted C1 to C20 alkyl group.

舉例來說,在化學式1中,R3 、R8 、R13 以及R18 可獨立地由化學式3表示。 [化學式3]

Figure 02_image015
For example, in Chemical Formula 1, R 3 , R 8 , R 13, and R 18 may be independently represented by Chemical Formula 3. [Chemical Formula 3]
Figure 02_image015

在化學式3中, L1 是取代或未取代的C1到C20伸烷基,且 R22 和R23 獨立地是取代或未取代的C1到C20烷基。In Chemical Formula 3, L 1 is a substituted or unsubstituted C1 to C20 alkylene group, and R 22 and R 23 are independently a substituted or unsubstituted C1 to C20 alkyl group.

舉例來說,氮雜卟啉類染料可由化學式1-1或化學式1-2表示。 [化學式1-1]

Figure 02_image017
[化學式1-2]
Figure 02_image019
For example, the azaporphyrin-based dye may be represented by Chemical Formula 1-1 or Chemical Formula 1-2. [Chemical Formula 1-1]
Figure 02_image017
[Chemical Formula 1-2]
Figure 02_image019

可以比藍色顏料的量小的量包含氮雜卟啉類染料。氮雜卟啉類染料是起吸收350奈米到450奈米波長範圍內的光的作用的輔助染料,且當包含的量小於藍色顏料的量時,可在藍色抗蝕劑中獲得高色彩再現,但是當以比藍色顏料的量大的量包含氮雜卟啉類染料時,氮雜卟啉類染料使用過量,且因此可能無法在藍色抗蝕劑中實現高色彩再現。The azaporphyrin-based dye may be contained in an amount smaller than that of the blue pigment. Azaporphyrin-based dyes are auxiliary dyes that function to absorb light in the wavelength range of 350 nm to 450 nm, and when the amount contained is less than the amount of blue pigment, a high level can be obtained in the blue resist Color reproduction, but when the azaporphyrin-based dye is included in an amount larger than the amount of the blue pigment, the azaporphyrin-based dye is used in an excessive amount, and therefore high color reproduction may not be achieved in the blue resist.

即使大量使用偶氮卟啉類染料,也不難獲得高色彩再現,且實現色彩坐標,但是甚至透射率也可能劣化,且因此,亮度可能降低,或者其它性能(可靠性)預計會劣化。Even if azoporphyrin-based dyes are used in large amounts, it is not difficult to obtain high color reproduction and achieve color coordinates, but even transmittance may be deteriorated, and therefore, brightness may be reduced, or other performance (reliability) is expected to be deteriorated.

基於感光性樹脂組成物的總固體量,可以0.1重量%到5重量%的量包含氮雜卟啉類染料。在量範圍內,足夠的高色彩再現是可能的,且可獲得優異的處理裕量。The azaporphyrin-based dye may be included in an amount of 0.1% to 5% by weight based on the total solid amount of the photosensitive resin composition. Within the amount range, sufficient high color reproduction is possible, and an excellent processing margin can be obtained.

舉例來說,除了藍色顏料和氮雜卟啉類染料之外,著色劑可包含紫色顏料。For example, in addition to blue pigments and azaporphyrin-based dyes, the colorant may include purple pigments.

舉例來說,藍色顏料可以是ε藍色顏料。它可以是用於根據一實施方案的組成物中的藍色顏料,且使用ε藍色顏料而不是β藍色顏料有助於改良亮度(耐光性)。For example, the blue pigment may be an epsilon blue pigment. It may be a blue pigment used in the composition according to an embodiment, and using an ε blue pigment instead of a β blue pigment helps to improve brightness (light resistance).

舉例來說,藍色顏料可以是C.I.顏料藍15:6。For example, the blue pigment may be C.I. Pigment Blue 15:6.

基於根據實施例的感光性樹脂組成物的總固體量,可以2重量%到40重量%的量包含著色劑。當在範圍內包含著色劑時,可在高色彩坐標下實現改良耐光性。 (B)黏合劑樹脂The colorant may be included in an amount of 2% to 40% by weight based on the total solid amount of the photosensitive resin composition according to the embodiment. When the colorant is included in the range, improved light resistance can be achieved at high color coordinates. (B) Adhesive resin

黏合劑樹脂可包含丙烯類(acryl-based)黏合劑樹脂。舉例來說,黏合劑樹脂可以是丙烯類黏合劑樹脂。The binder resin may include acryl-based binder resin. For example, the binder resin may be an acrylic binder resin.

丙烯類黏合劑樹脂是第一烯系(ethylenic)不飽和單體和可與其共聚的第二烯系不飽和單體的共聚物,且是包含至少一個丙烯類重複單元的樹脂。The propylene-based binder resin is a copolymer of a first ethylenic unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and is a resin containing at least one propylene-based repeating unit.

第一烯系不飽和單體是包含至少一個羧基和/或羥基的烯系不飽和單體,且單體的實例包含丙烯酸(acrylic acid)、甲基丙烯酸(methacrylic acid)、順丁烯二酸(maleic acid)、衣康酸(itaconic acid)、反丁烯二酸(fumaric acid)或其組合。The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxyl group and/or hydroxyl group, and examples of the monomer include acrylic acid, methacrylic acid, maleic acid (Maleic acid), itaconic acid, fumaric acid, or a combination thereof.

基於丙烯類黏合劑樹脂的總量,可以5重量%到50重量%,例如10重量%到40重量%的量包含第一烯系不飽和單體。Based on the total amount of the propylene-based binder resin, the first ethylenically unsaturated monomer may be included in an amount of 5% to 50% by weight, for example, 10% to 40% by weight.

第二烯系不飽和單體可以是芳族乙烯基化合物,如苯乙烯(styrene)、α-甲基苯乙烯、乙烯基甲苯、乙烯基苯甲基甲醚等;不飽和羧酸酯化合物,如(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-羥乙酯(2-hydroxyethyl(meth)acrylate)、2-羥基(甲基)丙烯酸丁酯(2-hydroxy butyl(meth)acrylate)、(甲基)丙烯酸苯甲酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸苯酯等;不飽和氨基烷基羧酸酯化合物,如2-氨基乙基(甲基)丙烯酸酯、2-(甲基)丙烯酸二甲氨基乙酯(2-dimethylaminoethyl(meth)acrylate)等;羧酸乙烯基酯化合物,如醋酸乙烯酯(vinyl acetate)、乙烯基苯甲酸鹽(vinyl benzoate)等;不飽和縮水甘油基羧酸酯(glycidyl carboxylate ester)化合物,如縮水甘油基(甲基)丙烯酸酯(glycidyl(meth)acrylate)等;氰化乙烯(vinyl cyanide)化合物,如(甲基)丙烯腈((meth)acrylonitrile)等;不飽和醯胺化合物,如(甲基)丙烯醯胺((meth)acrylamide)等;以及類似化合物,且可以單獨使用或者作為兩種或大於兩種的混合物使用。The second ethylenically unsaturated monomer may be an aromatic vinyl compound, such as styrene, α-methylstyrene, vinyltoluene, vinylbenzyl methyl ether, etc.; unsaturated carboxylate compounds, Such as methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxy(meth)acrylate Group) 2-hydroxy butyl(meth)acrylate, benzyl (meth)acrylate, cyclohexyl (meth)acrylate, phenyl (meth)acrylate, etc.; unsaturated amino alkyl carboxylic acid Ester compounds, such as 2-aminoethyl(meth)acrylate, 2-dimethylaminoethyl(meth)acrylate, etc.; carboxylic acid vinyl ester compounds, such as vinyl acetate (Vinyl acetate), vinyl benzoate, etc.; unsaturated glycidyl carboxylate ester compounds, such as glycidyl (meth)acrylate, etc. ; Vinyl cyanide (vinyl cyanide) compounds, such as (meth) acrylonitrile ((meth)acrylonitrile), etc.; unsaturated amide compounds, such as (meth)acrylamide ((meth)acrylamide), etc.; and similar compounds , And can be used alone or as a mixture of two or more.

丙烯酸類黏合劑樹脂的具體實例可以是(甲基)丙烯酸/甲基丙烯酸苯甲酯共聚物、(甲基)丙烯酸/甲基丙烯酸苯甲酯/苯乙烯共聚物、(甲基)丙烯酸/甲基丙烯酸苯甲酯/甲基丙烯酸2-羥乙基酯共聚物、(甲基)丙烯酸/甲基丙烯酸苯甲酯/苯乙烯/甲基丙烯酸2-羥乙酯共聚物以及類似物,但不限於此,且可單獨使用或作為兩種或大於兩種的混合物使用。Specific examples of the acrylic binder resin may be (meth)acrylic acid/benzyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene copolymer, (meth)acrylic acid/methacrylate Benzyl acrylate/2-hydroxyethyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene/2-hydroxyethyl methacrylate copolymer and the like, but not It is not limited to this, and can be used alone or as a mixture of two or more.

丙烯酸類黏合劑樹脂的重量平均分子量(weight average molecular weight)可以是3,000克/莫耳(g/mol)到150,000克/莫耳,例如5,000克/莫耳到50,000克/莫耳,例如20,000克/莫耳到30,000克/莫耳。當丙烯酸類黏合劑樹脂的重均分子量在範圍內時,感光性樹脂組成物可具有優異的物理性能和化學性能以及合適的黏度,維持適當的可顯影性(developability)和靈敏度,且在製造彩色濾光片層期間顯示出優異的與基底的緊密接觸性能。The weight average molecular weight of the acrylic binder resin may be 3,000 g/mole (g/mol) to 150,000 g/mole, for example 5,000 g/mole to 50,000 g/mole, for example 20,000 g /Mole to 30,000 g/mole. When the weight average molecular weight of the acrylic binder resin is within the range, the photosensitive resin composition can have excellent physical and chemical properties and appropriate viscosity, maintain appropriate developability (developability) and sensitivity, and be used in the manufacture of color The filter layer shows excellent close contact performance with the substrate.

丙烯酸類黏合劑樹脂的酸值可以是15毫克KOH/克(mgKOH/g)到60毫克KOH/克,例如,20毫克KOH/克到50毫克KOH/克。當丙烯酸類黏合劑樹脂具有在範圍內的酸值時,可得到極佳畫素解析度。The acid value of the acrylic binder resin may be 15 mg KOH/g (mgKOH/g) to 60 mg KOH/g, for example, 20 mg KOH/g to 50 mg KOH/g. When the acrylic binder resin has an acid value within the range, excellent pixel resolution can be obtained.

基於感光性樹脂組成物的總量,可以3重量%到20重量%,例如5重量%到15重量%的量包含黏合劑樹脂。當在範圍內包含黏合劑樹脂時,在製造彩色濾光片層期間由於改良交聯(cross-linking),可顯影性可得以改良且表面光滑度可得以改良。 (C)光可聚合化合物Based on the total amount of the photosensitive resin composition, the binder resin may be included in an amount of 3 to 20% by weight, for example, 5 to 15% by weight. When the binder resin is included in the range, developability can be improved and surface smoothness can be improved due to improved cross-linking during manufacturing of the color filter layer. (C) Photopolymerizable compound

光可聚合化合物可以是包含至少一個烯系不飽和雙鍵的(甲基)丙烯酸的單官能酯或多官能酯。The photopolymerizable compound may be a monofunctional or polyfunctional ester of (meth)acrylic acid containing at least one ethylenically unsaturated double bond.

光可聚合化合物具有烯系不飽和雙鍵,且因此可在圖案形成過程中的曝光期間引起足夠的聚合且形成具有極佳耐熱性、耐光性以及耐化學性的圖案。The photopolymerizable compound has an ethylenically unsaturated double bond, and thus can cause sufficient polymerization and form a pattern having excellent heat resistance, light resistance, and chemical resistance during exposure during pattern formation.

光可聚合化合物的具體實例可以是乙二醇二(甲基)丙烯酸酯(ethylene glycol di(meth)acrylate)、二乙二醇二(甲基)丙烯酸酯(diethylene glycol di(meth)acrylate)、三乙二醇二(甲基)丙烯酸酯(triethylene glycol di(meth)acrylate)、丙二醇二(甲基)丙烯酸酯(propylene glycol di(meth)acrylate)、新戊二醇二(甲基)丙烯酸酯(neopentyl glycol di(meth)acrylate)、1,4-丁二醇二(甲基)丙烯酸酯(1,4-butanediol di(meth)acrylate)、1,6-己二醇二(甲基)丙烯酸酯(1,6-hexanediol di(meth)acrylate)、雙酚A二(甲基)丙烯酸酯(bisphenolA di(meth)acrylate)、季戊四醇二(甲基)丙烯酸酯(pentaerythritol di(meth)acrylate)、季戊四醇三(甲基)丙烯酸酯(pentaerythritol tri(meth)acrylate)、季戊四醇四(甲基)丙烯酸酯(pentaerythritol tetra(meth)acrylate)、季戊四醇六(甲基)丙烯酸酯(pentaerythritol hexa(meth)acrylate)、二季戊四醇二(甲基)丙烯酸酯(dipentaerythritol di(meth)acrylate)、二季戊四醇三(甲基)丙烯酸酯(dipentaerythritol tri(meth)acrylate)、二季戊四醇五(甲基)丙烯酸酯(dipentaerythritol penta(meth)acrylate)、二季戊四醇六(甲基)丙烯酸酯(dipentaerythritol hexa(meth)acrylate)、雙酚A環氧基(甲基)丙烯酸酯(bisphenol A epoxy(meth)acrylate)、乙二醇單甲醚(甲基)丙烯酸酯(ethylene glycol monomethylether (meth)acrylate)、三羥甲基丙烷三(甲基)丙烯酸酯(trimethylol propane tri(meth)acrylate)、磷酸三(甲基)丙烯醯氧基乙酯(tris(meth)acryloyloxyethyl phosphate)、酚醛環氧基(甲基)丙烯酸酯(novolac epoxy (meth)acrylate)以及類似化合物。Specific examples of the photopolymerizable compound may be ethylene glycol di(meth)acrylate, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, Triethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate (Neopentyl glycol di(meth)acrylate), 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate Ester (1,6-hexanediol di(meth)acrylate), bisphenolA di(meth)acrylate (bisphenolA di(meth)acrylate), pentaerythritol di(meth)acrylate (pentaerythritol di(meth)acrylate), Pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol hexa(meth)acrylate , Dipentaerythritol di(meth)acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol penta(di) meth)acrylate), dipentaerythritol hexa(meth)acrylate, bisphenol A epoxy(meth)acrylate, ethylene glycol monomethyl Ether (meth) acrylate (ethylene glycol monomethylether (meth) acrylate), trimethylol propane tri (meth) acrylate (trimethylol propane tri (meth) acrylate), tris (meth) acrylic acid oxyethyl phosphate Ester (tris(meth )acryloyloxyethyl phosphate), novolac epoxy (meth)acrylate and similar compounds.

市售光可聚合化合物的實例如下。單官能(甲基)丙烯酸酯可包含阿尼克斯(Aronix)M-101® 、M-111® 、M-114® (東亞合成化學工業株式會社(Toagosei Chemistry Industry Co., Ltd.));卡亞拉德(KAYARAD)TC-110S® 、TC-120S® (日本化藥株式會社(Nippon Kayaku Co., Ltd.));V-158® 、V-2311® (大阪有機化學工業株式會社(Osaka Organic Chemical Ind., Ltd.)),以及類似物。雙官能(甲基)丙烯酸酯的實例可包含阿尼克斯M-210® 、M-240® 、M-6200® (東亞合成化學工業株式會社);卡亞拉德HDDA® 、HX-220® 、R-604® (日本化藥株式會社);V-260® 、V-312® 、V-335 HP® (大阪有機化學工業株式會社),以及類似物。三官能(甲基)丙烯酸酯的實例可包含阿尼克斯M-309® 、M-400® 、M-405® 、M-450® 、M-710® 、M-8030® 、M-8060® (東亞合成化學工業株式會社);卡亞拉德TMPTA® 、DPCA-20® 、DPCA-30® 、DPCA-60® 、DPCA-120® (日本化藥株式會社);V-295® 、V-300® 、V-360® 、V-GPT® 、V-3PA® 、V-400® (大阪由岐化藥工業株式會社(Osaka Yuki Kayaku Kogyo Co. Ltd.)),以及類似物。這些可單獨使用或以兩種或大於兩種的混合物形式使用。Examples of commercially available photopolymerizable compounds are as follows. The monofunctional (meth)acrylate may include Aronix M-101 ® , M-111 ® , M-114 ® (Toagosei Chemistry Industry Co., Ltd.); card KAYARAD TC-110S ® , TC-120S ® (Nippon Kayaku Co., Ltd.); V-158 ® , V-2311 ® (Osaka Organic Chemical Industry Co., Ltd. (Osaka Organic Chemical Ind., Ltd.)), and the like. Examples of the bifunctional (meth) acrylate may include Anix M-210 ® , M-240 ® , M-6200 ® (East Asia Synthetic Chemical Industry Co., Ltd.); Kayarad HDDA ® , HX-220 ® , R-604 ® (Nippon Kayaku Co., Ltd.); V-260 ® , V-312 ® , V-335 HP ® (Osaka Organic Chemical Industry Co., Ltd.), and the like. Examples of trifunctional (meth)acrylates may include Anix M-309 ® , M-400 ® , M-405 ® , M-450 ® , M-710 ® , M-8030 ® , M-8060 ® ( Toya Synthetic Chemical Industry Co., Ltd.); Kayarad TMPTA ® , DPCA-20 ® , DPCA-30 ® , DPCA-60 ® , DPCA-120 ® (Japan Chemical Pharmaceutical Co., Ltd.); V-295 ® , V-300 ® , V-360 ® , V-GPT ® , V-3PA ® , V-400 ® (Osaka Yuki Kayaku Kogyo Co. Ltd.), and the like. These can be used alone or in a mixture of two or more.

光可聚合化合物可用酸酐處理以改良可顯影性。The photopolymerizable compound can be treated with acid anhydride to improve developability.

基於感光性樹脂組成物的總量,可以1重量%到20重量%,例如3重量%到10重量%的量包含光可聚合化合物。當在範圍內包含光可聚合化合物時,光可聚合單體在圖案形成過程中的曝光期間充分固化且具有極佳可靠性,且可改良鹼性顯影液的可顯影性。 (D)光聚合引發劑Based on the total amount of the photosensitive resin composition, the photopolymerizable compound may be contained in an amount of 1 to 20% by weight, for example, 3 to 10% by weight. When the photopolymerizable compound is included in the range, the photopolymerizable monomer is sufficiently cured during exposure during pattern formation and has excellent reliability, and can improve the developability of the alkaline developer. (D) Photopolymerization initiator

光聚合引發劑可以是感光性樹脂組成物中通常所用的引發劑,例如,苯乙酮類(acetophenone-based)化合物、苯甲酮類(benzophenone-based)化合物、噻噸酮類(thioxanthone-based)化合物、安息香類(benzoin-based)化合物、三嗪類(triazine-based)化合物、肟類(oxime-based)化合物或其組合。The photopolymerization initiator may be an initiator commonly used in photosensitive resin compositions, for example, acetophenone-based compounds, benzophenone-based compounds, thioxanthone-based compounds ) Compounds, benzoin-based compounds, triazine-based compounds, oxime-based compounds or combinations thereof.

苯乙酮類化合物的實例可以是2,2'-二乙氧基苯乙酮、2,2'-二丁氧基苯乙酮、2-羥基-2-甲基苯丙酮、對叔丁基三氯苯乙酮、對叔丁基二氯苯乙酮、4-氯苯乙酮、2,2'-二氯-4-苯氧基苯乙酮、2-甲基-1-(4-(甲硫基)苯基)-2-嗎啉基丙-1-酮(2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropan-1-one)、2-苯甲基-2-二甲氨基-1-(4-嗎啉基苯基)-丁-1-酮(2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one),以及類似化合物。Examples of the acetophenone compounds may be 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylacetophenone, p-tert-butyl Trichloroacetophenone, p-tert-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4- (Methylthio)phenyl)-2-morpholinopropan-1-one (2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropan-1-one), 2-benzyl- 2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one (2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one), and similar compounds .

苯甲酮類化合物的實例可以是苯甲酮、苯甲酸苯甲醯基酯、甲基苯甲酸苯甲醯酯、4-苯基苯甲酮、羥基苯甲酮、丙烯酸化苯甲酮、4,4'-雙(二甲基氨基)苯甲酮、4,4'-雙(二乙基氨基)苯甲酮、4,4'-二甲氨基苯甲酮、4,4'-二氯苯甲酮、3,3'-二甲基-2-甲氧基苯甲酮,以及類似化合物。Examples of benzophenone compounds may be benzophenone, benzoyl benzoate, benzoyl methacrylate, 4-phenyl benzophenone, hydroxybenzophenone, acrylated benzophenone, 4 ,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichloro Benzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and similar compounds.

噻噸酮類化合物的實例可為噻噸酮、2-甲基噻噸酮、異丙基噻噸酮、2,4-二乙基噻噸酮、2,4-二異丙基噻噸酮、2-氯噻噸酮,以及類似化合物。Examples of the thioxanthone compound may be thioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone , 2-chlorothioxanthone, and similar compounds.

安息香類化合物的實例可以是安息香、安息香甲醚、安息香乙醚、安息香異丙醚、安息香異丁醚、苯甲基二甲基縮酮,以及類似化合物。Examples of the benzoin-based compound may be benzoin, benzoin methyl ether, benzoin ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, and similar compounds.

三嗪類化合物的實例可以是2,4,6-三氯-s-三嗪、2-苯基-4,6-雙(三氯甲基)-s-三嗪、2-(3',4'-二甲氧基苯乙烯基)-4,6-雙(三氯甲基)-s-三嗪、2-(4'-甲氧基萘基)-4,6-雙(三氯甲基)-s-三嗪、2-(對甲氧基苯基)-4,6-雙(三氯甲基)-s-三嗪、2-(對甲苯基)-4,6-雙(三氯甲基)-s-三嗪、2-聯苯-4,6-雙(三氯甲基)-s-三嗪(2-biphenyl-4,6-bis(trichloromethyl)-s-triazine)、雙(三氯甲基)-6-苯乙烯基-s-三嗪、2-(萘基-1-基)-4,6-雙(三氯甲基)-s-三嗪(2-(naphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine)、2-(4-甲氧基萘基-1-基)-4,6-雙(三氯甲基)-s-三嗪、2,4-雙(三氯甲基)-6-胡椒基-s-三嗪(2,4-bis(trichloromethyl)-6-piperonyl-s-triazine)、2-4-雙(三氯甲基)-6-(4-甲氧基苯乙烯基)-s-三嗪,以及類似化合物。Examples of triazine compounds may be 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3', 4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloro Methyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis (Trichloromethyl)-s-triazine, 2-biphenyl-4,6-bis(trichloromethyl)-s-triazine (2-biphenyl-4,6-bis(trichloromethyl)-s-triazine ), bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphthyl-1-yl)-4,6-bis(trichloromethyl)-s-triazine (2 -(naphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine), 2-(4-methoxynaphthyl-1-yl)-4,6-bis(trichloromethyl) -s-triazine, 2,4-bis(trichloromethyl)-6-piperonyl-s-triazine (2,4-bis(trichloromethyl)-6-piperonyl-s-triazine), 2-2-4 Bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine, and similar compounds.

肟類化合物的實例可以是O-醯肟類(O-acyloxime-based)化合物、2-(鄰苯甲醯基肟)-1-[4-(苯硫基)苯基]-1,2-辛二酮(2-(o-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octandione)、1-(鄰乙醯肟)-1-[9-乙基-6-(2-甲基苯甲醯基)-9H-哢唑-3-基]乙酮(1-(o-acetyloxime)-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone)、O-乙氧基羰基-α-氧氨基-1-苯基丙-1-酮,以及類似化合物。O-醯肟類化合物的具體實例可以是1,2-辛二酮、2-二甲基氨基-2-(4-甲基苯甲基)-1-(4-嗎啉-4-基-苯基)-丁-1-酮、1-(4-苯硫基苯基)-丁烷-1,2-二酮-2-肟-O-苯甲酸酯、1-(4-苯硫基苯基)-辛烷-1,2-二酮-2-肟-O-苯甲酸酯、1-(4-苯硫基苯基)-辛-1-酮肟-O-乙酸酯、1-(4-苯硫基苯基)-丁-1-酮肟-O-乙酸酯,以及類似化合物。Examples of oxime compounds may be O-acyloxime-based compounds, 2-(o-benzoyl oxime)-1-[4-(phenylthio)phenyl]-1,2- Octanedione (2-(o-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octandione), 1-(o-acetyl oxime)-1-[9-ethyl-6-( 2-methylbenzyl)-9H-oxazol-3-yl]ethanone (1-(o-acetyloxime)-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3 -yl]ethanone), O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one, and similar compounds. Specific examples of O-acetoxime compounds may be 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl- Phenyl)-butan-1-one, 1-(4-phenylthiophenyl)-butane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylthio Phenyl)-octane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylthiophenyl)-octan-1-one oxime-O-acetate , 1-(4-phenylthiophenyl)-butan-1-one oxime-O-acetate, and similar compounds.

光聚合引發劑可包含肟類引發劑和苯乙酮類引發劑兩者。在這種情況下,與單獨使用一種類型的光聚合引發劑的情況相比,通過提高固化效率可確保極佳處理裕量。此外,在這種情況下,可以比苯乙酮類引發劑的量大的量包含肟類引發劑。當以等於或小於苯乙酮類引發劑量的量包含肟類引發劑時,靈敏度低(靈敏度極佳),且因此可執行所需的CD。The photopolymerization initiator may include both an oxime-based initiator and an acetophenone-based initiator. In this case, compared with the case where one type of photopolymerization initiator is used alone, an excellent processing margin can be ensured by increasing the curing efficiency. In addition, in this case, the oxime initiator may be included in an amount larger than the amount of the acetophenone initiator. When the oxime-based initiator is included in an amount equal to or less than the acetophenone-based initiator dose, the sensitivity is low (the sensitivity is excellent), and thus the desired CD can be performed.

除所述化合物以外,光聚合引發劑可進一步包含哢唑類化合物、二酮類化合物、硼酸鋶類(sulfonium borate-based)化合物、重氮類(diazo-based)化合物、咪唑類(imidazole-based)化合物、聯咪唑類(biimidazole-based)化合物、芴類(fluorene-based)化合物,以及類似化合物。In addition to the above-mentioned compounds, the photopolymerization initiator may further include oxazole compounds, diketone compounds, sulfonium borate-based compounds, diazo-based compounds, and imidazole-based compounds. ) Compounds, biimidazole-based compounds, fluorene-based compounds, and similar compounds.

光聚合引發劑可與能夠通過吸收光引起化學反應和變得激發且接著傳遞其能量的感光劑一起使用。The photopolymerization initiator can be used with a photosensitizer capable of causing a chemical reaction by absorbing light and becoming excited and then transferring its energy.

所述感光劑的實例可以是四乙二醇雙-3-巰基丙酸酯(tetraethylene glycol bis-3-mercapto propionate)、季戊四醇四-3-巰基丙酸酯(pentaerythritol tetrakis-3-mercapto propionate)、二季戊四醇四-3-巰基丙酸酯(dipentaerythritol tetrakis-3-mercapto propionate),以及類似化合物。Examples of the sensitizer may be tetraethylene glycol bis-3-mercaptopropionate (tetraethylene glycol bis-3-mercapto propionate), pentaerythritol tetra-3-mercaptopropionate (pentaerythritol tetrakis-3-mercapto propionate), Dipentaerythritol tetrakis-3-mercapto propionate, and similar compounds.

基於感光性樹脂組成物的總量,可以0.1重量%到5重量%,例如0.1重量%到3重量%的量包含光聚合引發劑。當所述範圍內包含光聚合引發劑時,在圖案形成過程中的曝光期間發生充足光聚合,可實現極佳可靠性,可以改良圖案的耐熱性、耐光性以及耐化學性、解析度和緊密接觸特性,且可防止因非反應引發劑所致的透射率降低。 (E)溶劑Based on the total amount of the photosensitive resin composition, the photopolymerization initiator may be included in an amount of 0.1% by weight to 5% by weight, for example, 0.1% by weight to 3% by weight. When a photopolymerization initiator is included in the range, sufficient photopolymerization occurs during exposure during pattern formation, excellent reliability can be achieved, and heat resistance, light resistance and chemical resistance, resolution, and tightness of the pattern can be improved Contact characteristics, and can prevent the reduction of transmittance due to non-reaction initiators. (E) Solvent

溶劑是具有與著色劑、黏合劑樹脂、光可聚合化合物以及光聚合引發劑的相容性但不與其反應的材料。Solvents are materials that have compatibility with colorants, binder resins, photopolymerizable compounds, and photopolymerization initiators, but do not react with them.

所述溶劑的實例可包含(但不限於)醇類,例如甲醇、乙醇以及類似物;醚類,例如二氯乙基醚、正丁基醚、二異戊基醚、甲基苯基醚、四氫呋喃以及類似物;二醇醚類(glycol ether),例如乙二醇單甲醚、乙二醇單乙醚以及類似物;乙二醇乙酸乙醚(cellosolve acetate),例如甲基乙二醇乙酸乙醚、乙基乙二醇乙酸乙醚、二乙基乙二醇乙酸乙醚以及類似物;卡必醇(carbitol),例如甲基乙基卡比醇、二乙基卡比醇、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇二甲醚、二乙二醇甲乙醚、二乙二醇二乙醚以及類似物;丙二醇烷基醚乙酸酯(propylene glycol alkylether acetate),例如丙二醇甲醚乙酸酯、丙二醇丙醚乙酸酯以及類似物;芳香族烴類,例如甲苯、二甲苯以及類似物;酮類,例如甲基乙基酮、環己酮、4-羥基-4-甲基-2-戊酮、甲基-正丙酮、甲基-正丁酮、甲基-正戊酮、2-庚酮以及類似物;飽和脂肪族單羧酸烷基酯類,例如乙酸乙酯、乙酸正丁酯、乙酸異丁酯以及類似物;乳酸酯類(lactic acid ester),例如乳酸甲酯、乳酸乙酯以及類似物;氧基乙酸烷基酯(oxy acetic acid alkyl ester),例如氧基乙酸甲酯、氧基乙酸乙酯、氧基乙酸丁酯以及類似物;烷氧基乙酸烷基酯類,例如甲氧基乙酸甲酯、甲氧基乙酸乙酯、甲氧基乙酸丁酯、乙氧基乙酸甲酯、乙氧基乙酸乙酯以及類似物;3-氧基丙酸烷基酯類(3-oxy propionic acid alkylester),例如3-氧基丙酸甲酯、3-氧基丙酸乙酯以及類似物;3-烷氧基丙酸烷基酯類,例如3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸乙酯、3-乙氧基丙酸甲酯以及類似物;2-氧基丙酸烷基酯類,例如2-氧基丙酸甲酯、2-氧基丙酸乙酯、2-氧基丙酸丙酯以及類似物;2-烷氧基丙酸烷基酯類,例如2-甲氧基丙酸甲酯、2-甲氧基丙酸乙酯、2-乙氧基丙酸乙酯、2-乙氧基丙酸甲酯以及類似物;2-氧基-2-甲基丙酸酯類,例如2-氧基-2-甲基丙酸甲酯、2-氧基-2-甲基丙酸乙酯以及類似物;單氧基單羧酸烷基酯類的2-烷氧基-2-甲基丙酸烷基酯類,例如2-甲氧基-2-甲基丙酸甲酯、2-乙氧基-2-甲基丙酸乙酯以及類似物;酯類,例如2-羥基丙酸乙酯、2-羥基-2-甲基丙酸乙酯、羥基乙酸乙酯、2-羥基-3-甲基丁酸甲酯以及類似物;酮酸酯類,例如丙酮酸乙脂以及類似物。另外,也可以使用高沸點溶劑,如N-甲基甲醯胺、N,N-二甲基甲醯胺、N-甲基甲醯苯胺、N-甲基乙醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮、二甲亞碸、苯甲基乙醚、二己醚、乙醯丙酮、異佛爾酮(isophorone)、己酸(caproic acid)、辛酸(caprylic acid)、1-辛醇、1-壬醇、苯甲醇、乙酸苯甲酯、苯甲酸乙酯(ethyl benzoate)、草酸二乙酯(diethyl oxalate)、順丁烯二酸二乙酯(diethyl maleate)、γ-丁內酯(γ-butyrolactone)、碳酸乙二酯(ethylene carbonate)、碳酸丙二酯(propylene carbonate)、乙二醇乙醚乙酸苯酯(phenyl cellosolve acetate)以及類似物。Examples of the solvent may include, but are not limited to, alcohols, such as methanol, ethanol, and the like; ethers, such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether, Tetrahydrofuran and the like; glycol ethers (glycol ether), such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, and the like; ethylene glycol acetate ethyl ether (cellosolve acetate), such as methyl glycol acetate ethyl ether, Ethyl glycol acetate ether, diethyl glycol acetate ether, and the like; carbitol, such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether , Diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether and the like; propylene glycol alkyl ether acetate (propylene glycol alkylether acetate), such as propylene glycol methyl ether Ether acetate, propylene glycol propyl ether acetate and the like; aromatic hydrocarbons such as toluene, xylene and the like; ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl 2-pentanone, methyl-n-acetone, methyl-n-butanone, methyl-n-pentanone, 2-heptanone, and the like; saturated aliphatic monocarboxylic acid alkyl esters, such as ethyl acetate , N-butyl acetate, isobutyl acetate and the like; lactic acid esters (lactic acid esters) such as methyl lactate, ethyl lactate and the like; oxy acetic acid alkyl esters (oxy acetic acid alkyl ester), such as Methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate and the like; alkyl alkoxyacetates such as methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate Ester, methyl ethoxyacetate, ethyl ethoxyacetate and the like; 3-oxy propionic acid alkyl esters (3-oxy propionic acid alkylester), such as 3-oxy propionic acid methyl ester, 3- Ethyloxypropionate and the like; 3-alkoxypropionic acid alkyl esters, such as 3-methoxypropionic acid methyl ester, 3-methoxypropionic acid ethyl ester, 3-ethoxypropionic acid Ethyl acetate, methyl 3-ethoxypropionate and the like; alkyl esters of 2-oxypropionate, such as methyl 2-oxypropionate, ethyl 2-oxypropionate, 2-oxypropionate Propyl propionate and the like; 2-alkoxypropionic acid alkyl esters, such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate , Methyl 2-ethoxypropionate and the like; 2-oxy-2-methyl propionate esters, such as methyl 2-oxy-2-methyl propionate, 2-oxy-2- Ethyl methylpropionate and the like; 2-alkoxy-2-methylpropionic acid alkyl esters of monooxymonocarboxylic acid alkyl esters, such as 2-methoxy-2-methylpropane Methyl acid ester, 2-ethoxy-2-methyl ethyl propionate and the like; esters, such as ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methyl propionate, ethyl glycolate Ester, methyl 2-hydroxy-3-methylbutyrate And analogs; keto esters, such as ethyl pyruvate and the like. In addition, high boiling point solvents such as N-methylformamide, N,N-dimethylformamide, N-methylformamide, N-methylacetamide, N,N-di Methylacetamide, N-methylpyrrolidone, dimethylsulfoxide, benzyl ether, dihexyl ether, acetone, isophorone, caproic acid, caprylic acid , 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, phenyl cellosolve acetate and the like.

考慮到混溶性(miscibility)和反應性,可優選地使用酮類,如環己酮以及類似物;乙二醇烷基醚乙酸酯(ethylene glycol alkylether acetate),如乙基溶纖劑乙酸酯(ethyl cellosolve acetate)以及類似物;酯類,如2-羥基丙酸乙酯以及類似物;卡必醇,如二甘醇單甲基醚以及類似物;丙二醇烷基醚乙酸酯,如丙二醇甲醚乙酸酯、丙二醇丙醚乙酸酯。In view of miscibility and reactivity, ketones such as cyclohexanone and the like can be preferably used; ethylene glycol alkyl ether acetate, such as ethyl cellosolve acetic acid Ester (ethyl cellosolve acetate) and the like; esters, such as ethyl 2-hydroxypropionate and the like; carbitol, such as diethylene glycol monomethyl ether and the like; propylene glycol alkyl ether acetate, such as Propylene glycol methyl ether acetate, propylene glycol propyl ether acetate.

基於感光性樹脂組成物的總量,以例如20重量%到80重量%,例如25重量%到60重量%的餘量(balance amount)使用溶劑。當在所述範圍內包含溶劑時,感光性樹脂組成物可具有適當黏度,從而改良彩色濾光片層的塗佈特徵。 其它添加劑Based on the total amount of the photosensitive resin composition, the solvent is used in a balance amount of, for example, 20% by weight to 80% by weight, for example, 25% by weight to 60% by weight. When a solvent is included in the above range, the photosensitive resin composition may have an appropriate viscosity, thereby improving the coating characteristics of the color filter layer. Other additives

根據實施例的感光性樹脂組成物可進一步包含環氧化合物,以改良與基底的緊密接觸特性。The photosensitive resin composition according to the embodiment may further include an epoxy compound to improve close contact characteristics with the substrate.

環氧化合物的實例可包含苯酚酚醛(phenol novolac)環氧化合物、四甲基聯苯環氧化合物、雙酚A環氧化合物、脂環族環氧化合物或其組合。Examples of the epoxy compound may include a phenol novolac epoxy compound, a tetramethylbiphenyl epoxy compound, a bisphenol A epoxy compound, an alicyclic epoxy compound, or a combination thereof.

基於100重量份的感光性樹脂組成物,可以0.01重量份到20重量份,例如0.1重量份到10重量份的量包含環氧化合物。當在範圍內包含環氧化合物時,可改良緊密接觸特性、存儲特性以及類似特性。The epoxy compound may be included in an amount of 0.01 parts by weight to 20 parts by weight, for example, 0.1 parts by weight to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the epoxy compound is included in the range, intimate contact characteristics, storage characteristics, and the like can be improved.

另外,感光性樹脂組成物可進一步包含具有如羧基、甲基丙烯醯基(methacryloyl group)、異氰酸酯基(isocyanate group)、環氧基以及類似基團的反應性取代基的矽烷偶合劑,以便改良其與基底的黏附性。In addition, the photosensitive resin composition may further include a silane coupling agent having a reactive substituent such as a carboxyl group, a methacryloyl group, an isocyanate group, an epoxy group, and the like to improve Its adhesion to the substrate.

矽烷類偶合劑的實例可包含三甲氧基矽烷基苯甲酸、γ甲基丙烯基丙氧基三甲氧基矽烷、乙烯基三乙醯氧基矽烷、乙烯基三甲氧基矽烷、γ異氰酸酯丙基三乙氧基矽烷、γ縮水甘油氧基丙基三甲氧基矽烷、β環氧環己基乙基三甲氧基矽烷、乙烯基氯矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-縮水甘油氧基丙基三甲氧基矽烷、3-縮水甘油氧基丙基甲基二乙氧基矽烷、3-縮水甘油氧基丙基二乙氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽烷、對苯乙烯基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷、N-2-(氨基乙基)-3-氨基丙基甲基二甲氧基矽烷,N-2-(氨基乙基)-3-氨基丙基三甲氧基矽烷、N-2-(氨基乙基)-3-氨基丙基甲基三乙氧基矽烷、3-氨基丙基三甲氧基矽烷、3-氨基丙基三乙氧基矽烷、3-三乙氧基矽烷基-N-(1,3-二甲基亞丁基)丙胺、N-苯基-3-氨基丙基三甲氧基矽烷、3-氯丙基三甲氧基矽烷、3-巰基丙基甲基二甲氧基矽烷、3-巰基丙基三甲氧基矽烷、雙(三乙氧基矽烷基丙基)四硫化物、3-異氰酸酯丙基三乙氧基矽烷以及類似化合物,且可單獨使用或兩種或大於兩種的混合物使用。Examples of the silane-based coupling agent may include trimethoxysilyl benzoic acid, γ methylpropenyl propoxy trimethoxy silane, vinyl triethoxy silane, vinyl trimethoxy silane, γ isocyanate propyl tri Ethoxysilane, γ glycidoxypropyltrimethoxysilane, β epoxycyclohexylethyltrimethoxysilane, vinylchlorosilane, vinyltrimethoxysilane, vinyltriethoxysilane, 2 -(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3-shrink Glyceryloxypropyl diethoxysilane, 3-glycidoxypropyltriethoxysilane, p-styryltrimethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-Methylacryloxypropyltrimethoxysilane, 3-Methylacryloxypropylmethyldimethoxysilane, 3-Methylacryloxypropylmethyldiethoxysilane , 3-propenyl propyl propyl trimethoxy silane, N-2-(aminoethyl)-3-aminopropyl methyl dimethoxy silane, N-2-(aminoethyl)-3-amino Propyltrimethoxysilane, N-2-(aminoethyl)-3-aminopropylmethyltriethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane , 3-triethoxysilane-N-(1,3-dimethylbutylene)propylamine, N-phenyl-3-aminopropyltrimethoxysilane, 3-chloropropyltrimethoxysilane, 3-mercaptopropylmethyldimethoxysilane, 3-mercaptopropyltrimethoxysilane, bis(triethoxysilylpropyl)tetrasulfide, 3-isocyanatepropyltriethoxysilane and the like Compounds, and can be used alone or in a mixture of two or more.

基於100重量份的感光性樹脂組成物,可以0.01重量份到10重量份的量包含矽烷偶合劑。當在範圍內包括矽烷偶合劑時,可改良緊密接觸性能、存儲性能以及類似性能。The silane coupling agent may be included in an amount of 0.01 parts by weight to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the silane coupling agent is included in the range, intimate contact performance, storage performance, and the like can be improved.

此外,必要時,感光性樹脂組成物可進一步包含表面活性劑以改良塗佈特性且防止缺陷。In addition, if necessary, the photosensitive resin composition may further contain a surfactant to improve coating characteristics and prevent defects.

表面活性劑的實例可以是BM化學公司(BM Chemie Inc.)的市售BM-1000® 、BM-1100® 以及類似產品的氟類表面活性劑;大日本油墨化學工業株式會社(Dainippon Ink Kagaku Kogyo Co., Ltd)的麥格菲斯(MEGAFACE)F 142D® 、F 172® 、F 173® 、F 183® 、F 554® 以及類似產品;住友3M株式會社(Sumitomo 3M Co., Ltd)的福勒拉德(FULORAD)FC-135® 、FC-170C® 、FC-430® 、FC-431® 以及類似產品;旭日玻璃株式會社(ASAHI Glass Co., Ltd)的索龍(SURFLON)S-112® 、S-113® 、S-131® 、S-141® 、S-145® 以及類似產品;SH-28PA® 、SH-190® 、SH-193® 、SZ-6032® 、SF-8428® 以及類似產品。Examples of the surfactant may be commercially available BM-1000 ® , BM-1100 ® and similar fluorine-based surfactants of BM Chemie Inc.; Dainippon Ink Kagaku Kogyo Co., Ltd) MEGAFACE F 142D ® , F 172 ® , F 173 ® , F 183 ® , F 554 ® and similar products; the Sumitomo 3M Co., Ltd. (Sumitomo 3M Co., Ltd) FULORAD FC-135 ® , FC-170C ® , FC-430 ® , FC-431 ® and similar products; SURFLON S-112 of ASAHI Glass Co., Ltd. ® , S-113 ® , S-131 ® , S-141 ® , S-145 ® and similar products; SH-28PA ® , SH-190 ® , SH-193 ® , SZ-6032 ® , SF-8428 ® and similar product.

基於100重量份的感光性樹脂組成物,可以0.001重量份到5重量份的量包含表面活性劑。當在所述範圍內包含表面活性劑時,確保塗佈均勻性,未發現染色(stain),且玻璃基底的潤濕特性極佳。The surfactant may be included in an amount of 0.001 part by weight to 5 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the surfactant is included in the range, uniformity of coating is ensured, stain is not found, and the wetting property of the glass substrate is excellent.

此外,除非性能劣化,否則感光性樹脂組成物可進一步包含預定量的其它添加劑,如氧化抑制劑、穩定劑以及類似添加劑。In addition, unless the performance is degraded, the photosensitive resin composition may further contain a predetermined amount of other additives, such as oxidation inhibitors, stabilizers, and similar additives.

根據另一實施例,提供使用根據實施例的感光性樹脂組成物製造的感光性樹脂層。According to another embodiment, a photosensitive resin layer manufactured using the photosensitive resin composition according to the embodiment is provided.

感光性樹脂層中的圖案形成過程如下。The pattern forming process in the photosensitive resin layer is as follows.

製程包含以旋塗、狹縫塗佈、噴墨印刷等方法將根據實施例的感光性樹脂組成物塗佈到支撐基底上;乾燥所塗佈的感光性樹脂組成物以形成感光性樹脂組成物層;將感光性樹脂組成物曝光;在鹼性水溶液中顯影曝光的感光性樹脂組成物以獲得感光性樹脂層;以及熱處理感光性樹脂層。圖案化製程(patterning process)的條件是相關技術中眾所周知的且不在本說明書中詳細說明。The process includes applying the photosensitive resin composition according to the embodiment to the support substrate by spin coating, slit coating, inkjet printing, etc.; drying the applied photosensitive resin composition to form the photosensitive resin composition Layer; exposing the photosensitive resin composition; developing the exposed photosensitive resin composition in an alkaline aqueous solution to obtain a photosensitive resin layer; and heat-treating the photosensitive resin layer. The conditions of the patterning process are well known in the related art and are not described in detail in this specification.

根據實施例,提供一種包含感光性樹脂層的彩色濾光片層。According to an embodiment, a color filter layer including a photosensitive resin layer is provided.

在下文中,參照實例更詳細說明本發明,但然而,這些實例不在任何意義上解釋為限制本發明的範圍。 染料的合成 合成實例 1 由化學式 1-1 表示的染料的合成 Hereinafter, the present invention is explained in more detail with reference to examples, but these examples are not to be construed as limiting the scope of the present invention in any sense. ( Synthesis of Dyes ) Synthesis Example 1 : Synthesis of dye represented by Chemical Formula 1-1

將30克(0.2莫耳)對醛基苯甲酸放入圓底燒瓶中,向其中加入600克丙酸,並攪拌混合物。向其中加入13.5克(0.2莫耳)吡咯,且將所得混合物加熱到80℃,攪拌1小時,加熱到130℃,且攪拌1.5小時以完成反應。將反應物冷卻到室溫(23℃),向其中加入300克丙酮,並將所得混合物在室溫下攪拌1小時並過濾。隨後,收集篩檢程式上的固體化合物,用丙酮洗滌,並乾燥以合成8.3克(26%)中間物(A)。30 g (0.2 mol) of para-aldehyde benzoic acid was put in a round bottom flask, 600 g of propionic acid was added thereto, and the mixture was stirred. 13.5 g (0.2 mol) of pyrrole was added thereto, and the resulting mixture was heated to 80°C, stirred for 1 hour, heated to 130°C, and stirred for 1.5 hours to complete the reaction. The reaction was cooled to room temperature (23°C), 300 g of acetone was added thereto, and the resulting mixture was stirred at room temperature for 1 hour and filtered. Subsequently, the solid compound on the screening program was collected, washed with acetone, and dried to synthesize 8.3 g (26%) of intermediate (A).

然後,將24.5克(30.1毫莫耳)中間物A和34.3克(241毫莫耳)K2 CO3 放入圓底燒瓶中,向其中加入250克二甲基甲醯胺(DMF),並攪拌所得混合物。向其中加入46.5克(241毫莫耳)1-溴-2-乙基己烷,並將所得混合物在100℃下攪拌24小時。反應完成後,將溫度降到室溫,通過蒸餾除去二甲基甲醯胺,用二氯甲烷(methylene chloride,MC)萃取,用10%氯化鈉和DI水洗滌所得產物。隨後,通過蒸餾除去溶劑,向其中加入MeCN,且將所得混合物洗滌並乾燥,得到28.9克(75%)化合物(B)。Then, 24.5 g (30.1 mmol) of Intermediate A and 34.3 g (241 mmol) of K 2 CO 3 were placed in a round bottom flask, 250 g of dimethylformamide (DMF) was added thereto, and The resulting mixture was stirred. 46.5 g (241 mmol) of 1-bromo-2-ethylhexane was added thereto, and the resulting mixture was stirred at 100°C for 24 hours. After the reaction was completed, the temperature was lowered to room temperature, dimethylformamide was removed by distillation, extracted with methylene chloride (MC), and the resulting product was washed with 10% sodium chloride and DI water. Subsequently, the solvent was removed by distillation, MeCN was added thereto, and the resulting mixture was washed and dried to obtain 28.9 g (75%) of Compound (B).

然後,將1.0克(0.81毫莫耳)中間物(B)和0.44克(2.42毫莫耳)Cu(OAc)2 H2 O放入圓底燒瓶中,向其中加入10克DMF,並將混合物在100℃下攪拌15小時。當反應完成時,將溫度降到室溫,通過蒸餾除去DMF,用MC萃取,且用10%氯化鈉和DI洗滌產物。隨後,通過蒸餾除去溶劑,通過使用最小量的MC溶解反應物,並將溶液以逐滴方式緩慢加入到100克MeCN中進行沉澱。將由此獲得的沉澱物過濾,用MeCN洗滌,且乾燥,得到0.9克(86%)由化學式1-1表示的化合物。Then, 1.0 g (0.81 mmol) of intermediate (B) and 0.44 g (2.42 mmol) of Cu(OAc) 2 H 2 O were put in a round bottom flask, 10 g of DMF was added thereto, and the mixture Stir at 100°C for 15 hours. When the reaction was completed, the temperature was lowered to room temperature, DMF was removed by distillation, extracted with MC, and the product was washed with 10% sodium chloride and DI. Subsequently, the solvent was removed by distillation, the reactant was dissolved by using a minimum amount of MC, and the solution was slowly added dropwise to 100 g of MeCN for precipitation. The precipitate thus obtained was filtered, washed with MeCN, and dried to obtain 0.9 g (86%) of the compound represented by Chemical Formula 1-1.

[化學式1-1]

Figure 02_image021
[Chemical Formula 1-1]
Figure 02_image021

LC Mass:1299 m/z合成實例 2 由化學式 1-2 表示的染料的合成 LC Mass: 1299 m/z Synthesis Example 2 : Synthesis of dye represented by Chemical Formula 1-2

除了基於1.0克(0.81毫莫耳)中間物(B)使用硫酸氧化釩水合物(vanadium oxide sulfate hydrate)(2.42毫莫耳)代替Cu(OAc)2 H2 O,且將溫度升高到120℃以進行反應以外,根據與合成實例1相同的方法獲得0.84克(80%)化學式1-2表示的化合物。In addition to using vanadium oxide sulfate hydrate (2.42 mmol) based on 1.0 g (0.81 mmol) of intermediate (B) instead of Cu(OAc) 2 H 2 O, and the temperature was raised to 120 Except for carrying out the reaction at ℃, according to the same method as in Synthesis Example 1, 0.84 g (80%) of the compound represented by Chemical Formula 1-2 was obtained.

[化學式1-2]

Figure 02_image023
[Chemical Formula 1-2]
Figure 02_image023

LC Mass:1303 m/z比較合成實例 1 由化學式 1-3 表示的化合物的合成 LC Mass: 1303 m/z Comparative Synthesis Example 1 : Synthesis of compounds represented by Chemical Formulas 1-3

將3.2克(2.58毫莫耳)中間物(B)放入圓底燒瓶中,向其中加入160克氯仿,並將混合物在60℃下攪拌。將1.42克(7.74毫莫耳)Zn(OAc)2 放入另一個圓底燒瓶中,向其中加入30克MeOH,並將所得混合物在室溫下攪拌以溶解Zn(OAc)2 。隨後,將Zn(OAc)2 溶液加入到含有中間物(B)的燒瓶中,並將混合物攪拌2小時以進行反應。反應完成後,將溫度降到室溫,用MC萃取,且用10%NaCl和DI水洗滌。蒸餾除去溶劑後,用最少量的MC溶解反應物,且所得溶液以逐滴方式緩慢添加到100克MeCN中進行沉澱。將由此獲得的沉澱物過濾,用MeCN洗滌,且乾燥,得到3.1克(92%)由化學式1-3表示的化合物。3.2 g (2.58 mmol) of intermediate (B) was put in a round bottom flask, 160 g of chloroform was added thereto, and the mixture was stirred at 60°C. 1.42 g (7.74 mmol) of Zn(OAc) 2 was put in another round bottom flask, 30 g of MeOH was added thereto, and the resulting mixture was stirred at room temperature to dissolve Zn(OAc) 2 . Subsequently, the Zn(OAc) 2 solution was added to the flask containing the intermediate (B), and the mixture was stirred for 2 hours to carry out the reaction. After the reaction was completed, the temperature was lowered to room temperature, extracted with MC, and washed with 10% NaCl and DI water. After the solvent was distilled off, the reactant was dissolved with a minimum amount of MC, and the resulting solution was slowly added dropwise to 100 g of MeCN for precipitation. The precipitate thus obtained was filtered, washed with MeCN, and dried to obtain 3.1 g (92%) of the compound represented by Chemical Formula 1-3.

[化學式1-3]

Figure 02_image025
[Chemical Formula 1-3]
Figure 02_image025

LC Mass:1300 m/z(合成感光性樹脂組成物) 實例 1 、實例 2 以及比較例 1 到比較例 3 LC Mass: 1300 m/z (synthetic photosensitive resin composition) Examples 1 , 2 and Comparative Examples 1 to 3

在表1中示出的組成物中混合以下組分以製備根據實例1、實例2以及比較例1到比較例3的感光性樹脂組成物。The following components were mixed in the composition shown in Table 1 to prepare photosensitive resin compositions according to Example 1, Example 2, and Comparative Examples 1 to 3.

具體而言,使光聚合引發劑溶解於溶劑中,在室溫下將溶液攪拌2小時,向其中添加黏合劑樹脂和光可聚合化合物,且在室溫下將所得混合物攪拌2小時。隨後,將藍色顏料分散體、著色劑以及其它添加劑添加到反應物中,且將所得混合物在室溫下攪拌1小時。隨後,過濾從其中得到的產物三次以去除雜質,從而製備每一感光性樹脂組成物。Specifically, the photopolymerization initiator was dissolved in a solvent, the solution was stirred at room temperature for 2 hours, a binder resin and a photopolymerizable compound were added thereto, and the resulting mixture was stirred at room temperature for 2 hours. Subsequently, a blue pigment dispersion, colorant, and other additives were added to the reactant, and the resulting mixture was stirred at room temperature for 1 hour. Subsequently, the product obtained therefrom was filtered three times to remove impurities, thereby preparing each photosensitive resin composition.

[表1] (單位:重量%)

Figure 108132662-A0304-0001
A )著色劑 [Table 1] (Unit:% by weight)
Figure 108132662-A0304-0001
( A ) Colorant

(A-1)C.I.顏料藍15:6顏料分散體(GC1679,三洋(SANYO);顏料固體含量10%)(A-1) C.I. Pigment Blue 15:6 pigment dispersion (GC1679, Sanyo; pigment solids content 10%)

(A-2)C.I.顏料藍15:6顏料分散體(GC1207,三洋;顏料固體含量10%)(A-2) C.I. Pigment Blue 15:6 pigment dispersion (GC1207, Sanyo; pigment solids content 10%)

(A-3)比較合成實例1的化合物(由化學式1-3表示的染料)(A-3) The compound of Comparative Synthesis Example 1 (dye represented by Chemical Formula 1-3)

(A-4)合成實例1的化合物(由化學式1-1表示的染料)(A-4) Synthesis of the compound of Example 1 (dye represented by Chemical Formula 1-1)

(A-5)合成實例2的化合物(由化學式1-2表示的染料) B 黏合劑樹脂 (A-5) Synthesis of the compound of Example 2 (dye represented by Chemical Formula 1-2) ( B ) Binder resin

丙烯酸類黏合劑樹脂(CRB-400H,SMS) C )光可聚合化合物 Acrylic adhesive resin (CRB-400H, SMS) ( C ) photopolymerizable compound

二季戊四醇六丙烯酸酯(DPHA)(日本化藥株式會社) D )光聚合引發劑 Dipentaerythritol hexaacrylate (DPHA) (Nippon Kayaku Co., Ltd.) ( D ) Photopolymerization initiator

肟類化合物(OXE01,BASF) E )溶劑 Oxime compounds (OXE01, BASF) ( E ) solvent

丙二醇甲醚乙酸酯(協和有限公司(Kyowa Co., Ltd.)) F )添加劑 Propylene glycol methyl ether acetate (Kyowa Co., Ltd.) ( F ) Additive

氟類表面活性劑(F-554,大日本油墨化學工業株式會社(DIC Co., Ltd.))評估 Bx 色彩座標和耐光性 Fluorine surfactant (F-554, DIC Co., Ltd.) Evaluation : Bx color coordinates and light resistance

在1毫米厚的去除油污且洗滌的玻璃基底上以250每分鐘轉數(rpm)到350每分鐘轉數將實例1、實例2以及比較例1到比較例3的每一感光性樹脂組成物塗佈成1微米到3微米厚,且隨後在90℃的加熱板上將其乾燥2分鐘以得到薄膜。隨後,通過使用具有365奈米主波長的高壓汞燈以50毫焦/平方釐米(mJ/cm2 )使膜曝光,且通過使用KOH顯影液(111倍稀溶液)在洗滌液/顯影液 = 1/0.8的條件下使所述膜顯影60秒且另外再洗滌60秒。隨後,在230℃的強制對流乾燥爐中將膜乾燥20分鐘以得到每一彩色樣本(色卡樣本(color chip))。Each photosensitive resin composition of Example 1, Example 2, and Comparative Example 1 to Comparative Example 3 was prepared on a 1 mm thick degreased and washed glass substrate at 250 revolutions per minute (rpm) to 350 revolutions per minute It was coated to a thickness of 1 μm to 3 μm, and then dried on a hot plate at 90° C. for 2 minutes to obtain a film. Subsequently, the film was exposed at 50 millijoules/square centimeter (mJ/cm 2 ) by using a high-pressure mercury lamp with a main wavelength of 365 nanometers, and by using a KOH developer (111-fold diluted solution) in the washing solution/developer = The film was developed under the condition of 1/0.8 for 60 seconds and washed for another 60 seconds. Subsequently, the film was dried in a forced convection drying oven at 230° C. for 20 minutes to obtain each color sample (color chip).

在使用分光光度計(MCPD3000,奧特蘇卡(Otsuka)電子)評估耐光性之前和之後測量每個色彩樣本的CIE色彩座標和亮度(Y),且根據耐光性評估的變化結果顯示於表2和表3中。The CIE color coordinates and brightness (Y) of each color sample were measured before and after using a spectrophotometer (MCPD3000, Otsuka Electronics) to evaluate the light resistance, and the results of the changes based on the light resistance evaluation are shown in Table 2. And in Table 3.

*耐光性評估:氙燈(0.68瓦),在空氣和N2 氣體的各自環境條件下,在60℃下持續20小時*Light resistance evaluation: Xenon lamp (0.68 watt), under the respective environmental conditions of air and N 2 gas, at 60 ℃ for 20 hours

[表2]

Figure 108132662-A0304-0002
[Table 2]
Figure 108132662-A0304-0002

[表3]

Figure 108132662-A0304-0003
[table 3]
Figure 108132662-A0304-0003

從表2和表3中,當化學式1-1或化學式1-2表示的氮雜卟啉類染料與藍色顏料一起使用時,可確認在少量保持充分改良耐光性的同時實現了藍色抗蝕劑中的高色彩。From Tables 2 and 3, when the azaporphyrin-based dye represented by Chemical Formula 1-1 or Chemical Formula 1-2 is used together with the blue pigment, it can be confirmed that the blue resistance is achieved while maintaining sufficient improvement in light resistance in a small amount High color in etchant.

儘管已結合當前認為是實用的實例實施例的實施例描述了本發明,但應理解,本發明不限於所公開的實施例。相反地,預期涵蓋包含在所附申請專利範圍的精神和範圍內的各種修改和等效佈置。Although the present invention has been described in conjunction with embodiments currently considered to be practical example embodiments, it should be understood that the present invention is not limited to the disclosed embodiments. On the contrary, it is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended patent application.

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Claims (13)

一種感光性樹脂組成物,包括: (A)著色劑,包含藍色顏料和在350奈米到450奈米的波長範圍內具有最大吸收波長的氮雜卟啉類染料; (B)黏合劑樹脂; (C)光可聚合化合物; (D)光聚合引發劑;以及 (E)溶劑。A photosensitive resin composition, including: (A) Colorants, including blue pigments and azaporphyrin dyes with maximum absorption wavelengths in the wavelength range of 350 nm to 450 nm; (B) Binder resin; (C) Photopolymerizable compounds; (D) Photopolymerization initiator; and (E) Solvent. 如申請專利範圍第1項所述的感光性樹脂組成物,其中所述氮雜卟啉類染料包括Cu或V(=O)的中心金屬。The photosensitive resin composition as described in item 1 of the patent application range, wherein the azaporphyrin-based dye includes a central metal of Cu or V(=O). 如申請專利範圍第1項所述的感光性樹脂組成物,其中所述氮雜卟啉類染料由化學式1表示: [化學式1]
Figure 03_image001
其中,在化學式1中, M是Cu或V(=O),且 R1 到R20 獨立地是氫原子、鹵素原子、取代或未取代的C1到C20烷基、取代或未取代的C1到C20烷氧基、取代或未取代的C6到C20芳基、磺酸基、取代或未取代的磺醯胺基或取代或未取代的C1到C20烷基酯基, 條件為,R1 到R5 中的至少一個、R6 到R10 中的至少一個、R11 到R15 中的至少一個以及R16 到R20 中的至少一個不是獨立的氫原子。
The photosensitive resin composition as described in item 1 of the patent application range, wherein the azaporphyrin-based dye is represented by Chemical Formula 1: [Chemical Formula 1]
Figure 03_image001
Among them, in Chemical Formula 1, M is Cu or V(=O), and R 1 to R 20 are independently a hydrogen atom, a halogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C6 to C20 aryl, sulfonic acid, substituted or unsubstituted sulfonamide or substituted or unsubstituted C1 to C20 alkyl ester, provided that R 1 to R At least one of 5 , at least one of R 6 to R 10 , at least one of R 11 to R 15 and at least one of R 16 to R 20 are not independent hydrogen atoms.
如申請專利範圍第3項所述的感光性樹脂組成物,其中R1 到R5 中的一個、R6 到R10 中的一個、R11 到R15 中的一個以及R16 到R20 中的一個獨立地由化學式2表示: [化學式2]
Figure 03_image028
其中,在化學式2中, R21 是取代或未取代的C1到C20烷基。
The photosensitive resin composition as described in item 3 of the patent application scope, wherein one of R 1 to R 5 , one of R 6 to R 10 , one of R 11 to R 15 and one of R 16 to R 20 One of is independently represented by Chemical Formula 2: [Chemical Formula 2]
Figure 03_image028
Among them, in Chemical Formula 2, R 21 is a substituted or unsubstituted C1 to C20 alkyl group.
如申請專利範圍第4項所述的感光性樹脂組成物,其中R3 、R8 、R13 以及R18 獨立地由化學式3表示: [化學式3]
Figure 03_image030
其中,在化學式3中, L1 是取代或未取代的C1到C20伸烷基,且 R22 和R23 獨立地是取代或未取代的C1到C20烷基。
The photosensitive resin composition as described in item 4 of the patent application scope, wherein R 3 , R 8 , R 13 and R 18 are independently represented by Chemical Formula 3: [Chemical Formula 3]
Figure 03_image030
Among them, in Chemical Formula 3, L 1 is a substituted or unsubstituted C1 to C20 alkylene group, and R 22 and R 23 are independently a substituted or unsubstituted C1 to C20 alkyl group.
如申請專利範圍第1項所述的感光性樹脂組成物,其中所述氮雜卟啉類染料由化學式1-1或化學式1-2表示: [化學式1-1]
Figure 03_image032
[化學式1-2]
Figure 03_image034
The photosensitive resin composition as described in Item 1 of the patent application range, wherein the azaporphyrin-based dye is represented by Chemical Formula 1-1 or Chemical Formula 1-2: [Chemical Formula 1-1]
Figure 03_image032
[Chemical Formula 1-2]
Figure 03_image034
.
如申請專利範圍第1項所述的感光性樹脂組成物,其中基於所述感光性樹脂組成物的總固體量,以0.1重量%到5重量%的量包含所述氮雜卟啉類染料。The photosensitive resin composition according to item 1 of the patent application range, wherein the azaporphyrin-based dye is contained in an amount of 0.1% to 5% by weight based on the total solid amount of the photosensitive resin composition. 如申請專利範圍第1項所述的感光性樹脂組成物,其中所述著色劑進一步包括紫色顏料。The photosensitive resin composition as described in item 1 of the patent application range, wherein the colorant further includes a purple pigment. 如申請專利範圍第1項所述的感光性樹脂組成物,其中所述藍色顏料是C.I.顏料藍15:6。The photosensitive resin composition as described in item 1 of the patent application range, wherein the blue pigment is C.I. Pigment Blue 15:6. 如申請專利範圍第1項所述的感光性樹脂組成物,其中基於所述感光性樹脂組成物的總量,所述感光性樹脂組成物包括 2重量%到40重量%的所述著色劑; 3重量%到20重量%的所述黏合劑樹脂; 1重量%到20重量%的所述光可聚合化合物; 0.1重量%到5重量%的所述光聚合引發劑;以及 餘量的所述溶劑。The photosensitive resin composition as described in item 1 of the patent application range, wherein the photosensitive resin composition includes, based on the total amount of the photosensitive resin composition 2% to 40% by weight of the colorant; 3% to 20% by weight of the binder resin; 1% to 20% by weight of the photopolymerizable compound; 0.1% to 5% by weight of the photopolymerization initiator; and The balance of the solvent. 如申請專利範圍第1項所述的感光性樹脂組成物,其中所述感光性樹脂組成物還包括環氧化合物、矽烷偶合劑、表面活性劑或其組合。The photosensitive resin composition as described in item 1 of the patent application scope, wherein the photosensitive resin composition further includes an epoxy compound, a silane coupling agent, a surfactant, or a combination thereof. 一種感光性樹脂層,使用如申請專利範圍第1項至第11項中任一項所述的感光性樹脂組成物製造。A photosensitive resin layer manufactured using the photosensitive resin composition as described in any one of patent application items 1 to 11. 一種彩色濾光片層,包括如申請專利範圍第12項所述的感光性樹脂層。A color filter layer includes a photosensitive resin layer as described in item 12 of the patent application scope.
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