KR20230011080A - Dye, composition compring the same, film, optical member and display device - Google Patents

Abstract

Provided are a dye, a composition including the same, a film prepared by using the composition, an optical member including the film, and a display device including the optical member, wherein the dye includes a compound represented by the following chemical formula 1 and a different compound having a different structure from the structure of the compound and the content of the compound represented by the following chemical formula 1 is two times or higher as the content of the different compound having a different structure from the structure of the compound represented by the chemical formula 1. [Chemical formula 1] (In Chemical formula 1, each substituent is the same as defined in the specification.) Accordingly, provided is a mixed dye that can promote an effect of improving reflectivity.

Description

Dye, composition containing the same, film, optical member and display device {DYE, COMPOSITION COMPRING THE SAME, FILM, OPTICAL MEMBER AND DISPLAY DEVICE}

The present disclosure relates to a dye, a composition including the same, a film manufactured using the composition, an optical member including the film, and a display device including the optical member.

In a typical liquid crystal display (LCD), light emitted from a white light source passes through RGB color filters of each pixel to form partial pixels of each color, and by combining them, colors in the RGB range can be produced.

Recently, new displays using luminous substances such as quantum dots or organic/inorganic phosphors that emit color of each sub-pixel have been developed, and methods using UV light sources and blue, green, and red luminous substances are excited. A method of using a light source has been proposed.

When using a UV light source, each color is created and implemented with blue, green, and red light emitters, but when using a blue light source, each color is generated with green and red light emitters, and the blue pixel transmits the light source as it is. .

In the case of a quantum dot-containing display material that has recently been commercialized or is being developed, light emission of green quantum dots and red quantum dots through a blue light source or a white light source is used. A quantum dot-containing display device is intended to improve color gamut and luminance by using a quantum dot material, and development of panels using quantum dot light emission using various types of light sources is continuing. In addition, it is possible to improve the viewing angle according to the application position of the quantum dot material during panel construction. Next-generation quantum dot display devices are being developed in the direction of increasing the intensity of light sources in order to improve the luminous efficiency of quantum dots or in the direction of developing light sources with an extended blue region.

In the quantum dot display device, the spectrum of the light source reaching the quantum dot material has a very close influence on the efficiency of the quantum dot, and since the characteristics are different depending on the type of current light source, various approaches are being introduced to improve the efficiency of the quantum dot for each light source. efforts are continuing.

On the other hand, in the case of a new display using a light emitting body, it is necessary to lower the reflectance due to external light or adjust the color of the panel due to scattering reflection. In order to solve this problem, there has been an attempt to use a dye in an optical member constituting a panel. When quantum dots are used as the light emitting body, there is a problem in that it is difficult to reduce the reflectance due to external light or adjust the color of the panel.

In the case of new displays, antireflection films with added luminance loss improvement or color correction functions are being introduced. ) is applied with a dye capable of

Commonly known cutting dyes include neon light blocking dyes and near infrared ray blocking dyes used in plasma displays. In this way, by absorbing a mixed color region rather than red, green, and blue wavelengths, the reflectance of the entire wavelength region may be lowered without compromising display performance, and additional color correction may be performed.

However, in the case of the cutting dye, there is a disadvantage that the color of the panel is lowered and the reflectance reduction effect is lowered, and various attempts have been made to overcome this to improve it.

One embodiment is to provide a mixed dye capable of improving reflectance by enabling light absorption in a wavelength range of 540 nm to 550 nm while minimizing the amount of a colorant in the composition.

Another embodiment is to provide a composition including the mixed dye.

Another embodiment is to provide a film comprising the composition.

Another embodiment is to provide an optical member including the film.

Another embodiment is to provide a display device including the optical member.

An embodiment includes a compound represented by Formula 1 and another compound having a structure different from that of the compound, and the content of the compound represented by Formula 1 is the content of another compound having a structure different from that of the compound represented by Formula 1. Provides a dye with at least twice the

[Formula 1]

In Formula 1,

M is two hydrogen atoms, a divalent metal atom, a trivalent substituted metal atom, a tetravalent substituted metal atom, a metal hydroxide atom, or a metal oxide atom;

R ¹ to R ⁸ are each independently a hydrogen atom, a halogen atom, a cyano group, a carbonyl group or a nitro group, provided that at least one of R ¹ to R ⁸ is a halogen atom, a cyano group, a carbonyl group or a nitro group,

R ⁹ to R ²⁸ are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group ), a substituted or unsubstituted C3 to C20 cycloalkyl group or a substituted or unsubstituted C6 to C20 aryl group, provided that at least two or more of R ⁹ to R ¹³ are necessarily substituted or unsubstituted C1 to C20 alkoxy groups.

At least one or more of R ¹ and R ² and at least one or more of R ⁵ and R ⁶ may each independently be a halogen atom, a cyano group, a carbonyl group, or a nitro group.

At least one or more of R ³ and R ⁴ and at least one or more of R ⁷ and R ⁸ may each independently be a halogen atom, a cyano group, a carbonyl group, or a nitro group.

At least one or more of R ¹ and R ² , at least one or more of R ³ and R ⁴ , at least one or more of R ⁵ and R ⁶ , and at least one or more of R ⁷ and R ⁸ are each independently a halogen atom, a cyano group, It may be a carbonyl group or a nitro group.

The M may be Cu, Co, Zn, V(=O) or Ag.

Wherein R ⁹ to R ²⁸ are each independently a C1 to C20 alkyl group substituted with a halogen atom, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group) im) can be

At least two or more of R ⁹ to R ¹³ and at least two or more of R ¹⁴ to R ¹⁸ may each independently be a substituted or unsubstituted C1 to C20 alkoxy group.

At least two or more of R ⁹ to R ¹³ , at least two or more of R ¹⁴ to R ¹⁸ , and at least two or more of R ¹⁹ to R ²³ may each independently be a substituted or unsubstituted C1 to C20 alkoxy group.

At least two or more of R ⁹ to R ¹³ , at least two or more of R ¹⁴ to R ¹⁸ , at least two or more of R ¹⁹ to R ²³ and at least two or more of R ²⁴ to R ²⁸ are independently substituted or unsubstituted C1 to C20 alkoxy groups.

Chemical Formula 1 may be represented by any one of Chemical Formulas 1-1 to 1-9.

[Formula 1-1]

[Formula 1-2]

[Formula 1-3]

[Formula 1-4]

[Formula 1-5]

[Formula 1-6]

[Formula 1-7]

[Formula 1-8]

[Formula 1-9]

The compound exhibits absorption wavelengths at 350 nm to 480 nm and 500 nm to 500 nm, and may have a maximum absorption wavelength at 420 nm to 435 nm among the absorption wavelengths.

The dye may have a maximum absorption wavelength at 540 nm to 550 nm.

Other compounds having a different structure from the compound represented by Formula 1 may include at least one selected from the group consisting of Formula 2, Formula 3 and Formula 4 below.

[Formula 2]

[Formula 3]

[Formula 4]

In Formulas 2 to 4,

R ³² , R ³⁴ , R ³⁵ and R ³⁷ are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group;

R ³³ and R ³⁶ are each independently a hydrogen atom or a cyano group, but at least one of R ² and R ⁵ is necessarily a cyano group;

X is a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group,

L is a divalent ligand,

R ³⁸ to R ⁴⁵ are each independently a hydrogen atom, a halogen atom, a cyano group, a carboxyl group, a hydroxy group, a mercapto group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted substituted C2 to C20 alkenyl group, substituted or unsubstituted C3 to C20 cycloalkenyl group, substituted or unsubstituted C2 to C20 alkynyl group, substituted or unsubstituted C1 to C20 alkoxy group, substituted or unsubstituted C1 to C20 alkyl A thio group, a substituted or unsubstituted C6 to C20 aryl group, a substituted or unsubstituted C6 to C20 aryloxy group, or a substituted or unsubstituted C2 to C20 heterocycloalkyl group,

R ⁴⁶ to R ⁶¹ are each independently a hydrogen atom, a halogen atom, a substituted or unsubstituted C1 to C20 alkoxy group or a substituted or unsubstituted C6 to C20 aryloxy group;

M is two hydrogen atoms, a divalent metal atom, a trivalent substituted metal atom, a tetravalent substituted metal atom, a metal hydroxide atom, or a metal oxide atom.

The content of the compound represented by Formula 1 may be twice or more than the amount of the compound represented by Formula 2.

The content of the compound represented by Formula 1 may be twice or more the amount of the compound represented by Formula 3.

The content of the compound represented by Formula 1 may be twice or more than the amount of the compound represented by Formula 4.

Another embodiment provides a composition containing the dye.

The composition may further include a non-curable resin, a pressure sensitive adhesive, or a combination thereof.

Another embodiment provides a film prepared using the composition.

Another embodiment provides an optical member including the film.

The optical member may include a base film; A film prepared using the composition located on the base film; A protective film positioned on a film prepared using the composition; And it may include a hard coat layer located on the protective film. At this time, the film prepared using the composition in the optical member may include a pressure-sensitive adhesive.

The optical member may include a base film; an adhesive layer positioned on the base film; A film prepared using the composition located on the adhesive layer; A protective film positioned on a film prepared using the composition; And it may include a hard coat layer located on the protective film. At this time, the film manufactured using the composition in the optical member may not include a pressure-sensitive adhesive.

The optical member may further include a high refractive index layer positioned on the hard coat layer and a low refractive index layer positioned on the high refractive index layer.

Another embodiment provides a display device including the optical member.

The display device may further include a quantum dot-containing layer on a lower surface of the optical member.

The specific details of other aspects of the present invention are included in the detailed description below.

When the mixed dye according to one embodiment is used as a colorant, it is possible to minimize luminance loss by minimizing the amount of the colorant in the composition, while at the same time improving reflectance and securing reliability in light resistance.

1 and 2 are each independently schematic diagrams showing the structure of an optical member according to an embodiment.

Hereinafter, embodiments of the present invention will be described in detail. However, this is presented as an example, and the present invention is not limited thereby, and the present invention is only defined by the scope of the claims to be described later.

Unless otherwise specified herein, "alkyl group" means a C1 to C20 alkyl group, "alkenyl group" means a C2 to C20 alkenyl group, "cycloalkenyl group" means a C3 to C20 cycloalkenyl group, and , "Heterocycloalkenyl group" means a C3 to C20 heterocycloalkenyl group, "aryl group" means a C6 to C20 aryl group, "arylalkyl group" means a C6 to C20 arylalkyl group, "alkylene group" means a C1 to C20 alkylene group, "arylene group" means a C6 to C20 arylene group, "alkylarylene group" means a C6 to C20 alkylarylene group, and "heteroarylene group" means a C3 to C20 hetero It means an arylene group, and "alkoxyylene group" means a C1 to C20 alkoxyylene group.

Unless otherwise specified herein, "substitution" means that at least one hydrogen atom is a halogen atom (F, Cl, Br, I), a hydroxy group, a C1 to C20 alkoxy group, a nitro group, a cyano group, an amine group, an imino group, Azido group, amidino group, hydrazino group, hydrazono group, carbonyl group, carbamyl group, thiol group, ester group, ether group, carboxyl group or its salt, sulfonic acid group or its salt, phosphoric acid or its salt, C1 to C20 alkyl group, C2 to C20 alkenyl group, C2 to C20 alkynyl group, C6 to C20 aryl group, C3 to C20 cycloalkyl group, C3 to C20 cycloalkenyl group, C3 to C20 cycloalkynyl group, C2 to C20 heterocycloalkyl group, C2 to C20 heterocycloalkenyl group, C2 to C20 heterocycloalkynyl group, C3 to C20 heteroaryl group, or a substituent of a combination thereof.

In addition, unless otherwise specified herein, "hetero" means that at least one heteroatom of N, O, S, and P is included in the chemical formula.

In addition, unless otherwise specified herein, "(meth)acrylate" means that both "acrylate" and "methacrylate" are possible, and "(meth)acrylic acid" means "acrylic acid" and "methacrylic acid". "That means both are possible.

In this specification, unless otherwise specified, "combination" means mixing or copolymerization.

Unless otherwise defined in the chemical formula within this specification, if a chemical bond is not drawn at a position where a chemical bond is to be drawn, it means that a hydrogen atom is bonded to the position.

When describing a numerical range in this specification, “X to Y” means “X or more and Y or less” (X ≤ and ≤ Y).

In this specification, "X to Y" in the description other than a numerical range means "from X to Y".

In the present specification, the "maximum absorption wavelength (λ _max )" of a compound (dye) means a wavelength at which the maximum absorbance appears when the absorbance is measured for a solution of a compound (dye) having a concentration of 10 ppm in methyl ethyl ketone. The maximum absorbance may be measured according to a method known to those skilled in the art.

In this specification, the "reflectance" of a film is measured by using a reflectance meter for a specimen prepared by laminating CL-885 black acrylic sheet of Nitto resin on which a pressure-sensitive adhesive having a refractive index of 1.46 to 1.50 is formed on the base film side of the film at 70 ° C. , which means the average reflectance of the reflectance measured in the wavelength range of 380 nm to 780 nm. As the reflectance meter, Perkin Elmer's UV/VIS spectrometer Lambda 1050 may be used, but is not limited thereto.

In the present specification, the "reflectance" of an optical member is a scattering reflectance (SCE, Specular Component Exclude), and means a value measured by the SCE Mode measurement method.

In this specification, “light resistance reliability” of an optical member is measured in a Xenon Test Chamber (Q-SUN) for a display device [light source lamp: Xenon lamp, irradiation intensity: 0.35 W/cm ² , irradiation temperature: 63° C., irradiation time: 500 Time, direction of irradiation: irradiation from the antireflection film side] before and after irradiation under the condition of measuring the light transmittance at the maximum absorption wavelength of the dye, and then evaluating the change in light transmittance.

In addition, unless otherwise specified in this specification, "*" means a portion connected to the same or different atoms or chemical formulas.

According to one embodiment, it includes a compound represented by Formula 1 and another compound having a structure different from that of the compound, and the content of the compound represented by Formula 1 is different from that of the compound represented by Formula 1. Provides a dye with at least twice the compound content.

[Formula 1]

In Formula 1,

M is two hydrogen atoms, a divalent metal atom, a trivalent substituted metal atom, a tetravalent substituted metal atom, a metal hydroxide atom, or a metal oxide atom;

R ¹ to R ⁸ are each independently a hydrogen atom, a halogen atom, a cyano group, a carbonyl group or a nitro group, provided that at least one of R ¹ to R ⁸ is a halogen atom, a cyano group, a carbonyl group or a nitro group,

R ⁹ to R ²⁸ are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group ), a substituted or unsubstituted C3 to C20 cycloalkyl group or a substituted or unsubstituted C6 to C20 aryl group, provided that at least two or more of R ⁹ to R ¹³ are necessarily substituted or unsubstituted C1 to C20 alkoxy groups.

Conventionally, there has been an attempt to improve the color purity of a display device by absorbing neon colors, but in the case of a quantum dot-containing display device, the purpose is different due to the use of a scattering body. Quantum dot-containing display devices try to lower the reflectance in order to improve external light reflection caused by scatterers, which helps improve black visibility of the device. Specifically, it is effective to use an antireflection film using a dye capable of absorbing mixed colors (Violet/Cyan/Neon/Near-IR) in order to lower reflectance and minimize degradation of RGB color purity of the panel. In particular, the absorption wavelength range is 480 nm to 520 nm Absorption of external light of a phosphorus cyan color and a neon color having an absorption wavelength range of 530 nm to 670 nm is effective in reducing reflectance. However, since it is difficult to implement Neutral Black in a display device when only dyes that absorb only cyan and neon colors are used, Violet color with an absorption wavelength range of 350 nm to 450 nm and Near-IR (Red) color with an absorption wavelength range of 605 nm to 790 nm are used. Color correction of the antireflection film and the display device is possible by using a mixture of absorbing dyes. That is, by using dyes capable of absorbing mixed colors (Violet/Cyan/Neon/Near-IR), the reflectance can be lowered, black visibility can be improved, and the color reproduction rate can also be increased. Meanwhile, the compound represented by Chemical Formula 1 may improve solubility and improve light resistance reliability. That is, when the compound represented by Chemical Formula 1 according to one embodiment is applied to the antireflection film, it is possible to secure the light resistance reliability of the film. In particular, no attempt has been made to improve color gamut by using a specific compound in a display device using a quantum dot light emitting body to absorb mixed colors, thereby improving color gamut. For example, in the case of cyan color, the absorption wavelength range is 480 nm to 520 nm, in the case of neon color, the absorption wavelength range is 530 nm to 670 nm, and in the case of near-IR color, the absorption wavelength range is 605 nm to 790 nm. The compound represented by 1 exhibits absorption wavelengths at 350 nm to 480 nm and 500 nm to 550 nm, and may have a maximum absorption wavelength at 420 nm to 435 nm, more specifically at 420 nm to 430 nm, among the absorption wavelengths. Mixed with another compound having a structure different from Formula 1, and at this time, the amount of the compound represented by Formula 1 is more than twice the amount of the other compound having a structure different from Formula 1, and the compound is mixed to obtain a mixed dye. When configured, in the case of the antireflection film, optical member, and display device including the mixed dye, it may be easy to improve the reflectance and secure light resistance reliability while minimizing the decrease in blue luminance.

In the case of the dye-type antireflection film, the present inventors newly confirmed that the reflectance can be improved by using four kinds of mixed color (Violet/Cyan/Neon/Near-IR) absorption dyes other than RGB, but controlling the amount used, When using the above four types of dyes, efficiency loss (loss) occurs according to the amount used for each dye, and the problem of additional consideration of color correction for implementing neutral black of the applied panel was faced again.

Accordingly, the inventors of the present application, after many trials and errors, further controlled the composition of the mixed dye so that the mixed dye according to one embodiment has a maximum absorption wavelength at 540 nm to 550 nm in order to realize panel color and minimize efficiency loss, thereby solving the above problems. and came to complete the present invention.

That is, considering the specific visibility, the reflectance improvement effect is different depending on the absorption wavelength of the dye, and considering the half width of the absorption wavelength of the dye, the efficiency loss is minimized and the reflectance can be improved as the wavelength range of 540 nm to 550 nm is effectively absorbed.

In the present invention, the relative amount of the compound (first dye) represented by Formula 1 is increased to minimize the use of mixed color absorption dyes for each wavelength and to enable light absorption in the 540 nm to 550 nm wavelength region to minimize luminance loss and reflectance. has improved In addition, since the compound represented by Chemical Formula 1 (first dye) having high dye stability such as light resistance is used in the largest amount, reliability of the film can also be secured.

(Compound represented by Formula 1 (first dye))

For example, in Formula 1, at least one or more of R ¹ and R ² and at least one or more of R ⁵ and R ⁶ are each independently an electron withdrawing group, such as a halogen atom, a cyano group, a carbonyl group, or a nitro group. can

For example, in Formula 1, at least one or more of R ³ and R ⁴ and at least one or more of R ⁷ and R ⁸ are each independently an electron withdrawing group, such as a halogen atom, a cyano group, a carbonyl group, or a nitro group. can

For example, in Formula 1, at least one or more of R ¹ and R ² , at least one or more of R ³ and R ⁴ , at least one or more of R ⁵ and R ⁶ , and at least one or more of R ⁷ and R ⁸ are each independently It may be a halogen atom, a cyano group, a carbonyl group or a nitro group.

In Formula 1, when R ¹ to R ⁸ are as described above, an effect of shifting the maximum absorption wavelength of the compound to a long wavelength within a wavelength range of 435 nm or less can be realized, effectively absorbing a short wavelength region of a blue light source. and the light resistance reliability is also excellent. Furthermore, as the number of electron withdrawing groups, for example, halogen atoms, among R ¹ to R ⁸ increases, the effect of shifting toward a longer wavelength increases, so that the amount of absorption of a blue light source can be effectively controlled, and light resistance reliability becomes more excellent. can

However, as the number of electron acceptors such as halogen atoms among R ¹ to R ⁸ increases, the solubility of the porphyrin-based compound decreases.

However, the present inventors limit R ⁹ to R ²⁸ in Formula 1 as described above (R ⁹ to R ²⁸ are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group), a substituted or unsubstituted C3 to C20 cycloalkyl group or a substituted or unsubstituted C6 to C20 aryl group, provided that R ⁹ to At least two or more of R ¹³ are necessarily substituted or unsubstituted C1 to C20 alkoxy groups) to maximize the solubility of the compound represented by Formula 1.

That is, the compound represented by Formula 1 has improved solubility compared to conventional dyes and at the same time has a long-wavelength shift effect of the maximum absorption wavelength and excellent light resistance reliability, so it is very suitable for application to an antireflection film.

For example, in Chemical Formula 1, M may be Cu, Co, Zn, V(=O), or Ag. For example, in Chemical Formula 1, M may be Cu.

For example, in Formula 1, R ⁹ to R ²⁸ are each independently a C1 to C20 alkyl group substituted with a halogen atom, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C20 alkoxy group) It may be a cyclic C1 to C15 alkyl group).

For example, in Formula 1, 'at least two or more of R ⁹ to R ¹³ ' and 'at least two or more of R ¹⁴ to R ¹⁸ ' may each independently be a substituted or unsubstituted C1 to C20 alkoxy group.

For example, in Formula 1, 'at least two or more of R ⁹ to R ¹³ ', 'at least two or more of R ¹⁴ to R ¹⁸ ', and 'at least two or more of R ¹⁹ to R ²³ ' are each independently substituted or unsubstituted. It may be a C1 to C20 alkoxy group.

For example, in Formula 1, 'at least two or more of R ⁹ to R ¹³ ', 'at least two or more of R ¹⁴ to R ¹⁸ ', 'at least two or more of R ¹⁹ to R ²³ ', and 'R ²⁴ to R ²⁸ ' At least two or more' may each independently be a substituted or unsubstituted C1 to C20 alkoxy group. Any one of R ⁹ to R ¹³ , any one of R ¹⁴ to R ¹⁸ , any one of R ¹⁹ to R ²³ and any one of R ²⁴ to R ²⁸ are simultaneously substituted or unsubstituted C1 to C20 alkoxy groups, Although the effect of improving light resistance reliability is insignificant, the decrease in solubility is very severe, which is not preferable.

For example, the substituted or unsubstituted C1 to C20 alkoxy group may be represented by Formula A below.

[Formula A]

In Formula A,

L ¹ is a substituted or unsubstituted C1 to C8 alkylene group;

R ²⁹ to R ³¹ are each independently a hydrogen atom or a substituted or unsubstituted C1 to C8 alkyl group.

For example, the compound represented by Chemical Formula 1 may be represented by any one of Chemical Formulas 1-1 to 1-9, but is not necessarily limited thereto.

[Formula 1-1]

[Formula 1-2]

[Formula 1-3]

[Formula 1-4]

[Formula 1-5]

[Formula 1-6]

[Formula 1-7]

[Formula 1-8]

[Formula 1-9]

The compound represented by Formula 1 exhibits absorption wavelengths at 350 nm to 480 nm and 500 nm to 550 nm, and may have a maximum absorption wavelength at 420 nm to 435 nm among the absorption wavelengths. When the compound represented by Formula 1 has a maximum absorption wavelength within the above range, it effectively absorbs a short wavelength region of a blue light source, thereby effectively improving light resistance reliability and color gamut of the panel.

Other compounds having a different structure from the compound represented by Formula 1 may include at least one selected from the group consisting of Formula 2, Formula 3 and Formula 4 below.

(Compound represented by Formula 2 (second dye)

[Formula 2]

In Formula 2,

R ³² , R ³⁴ , R ³⁵ and R ³⁷ are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group;

R ³³ and R ³⁶ are each independently a hydrogen atom or a cyano group, but at least one of R ² and R ⁵ is necessarily a cyano group;

L is a divalent ligand.

In Formula 2, R ³³ and R ³⁶ may each independently be a cyano group. When both R ³³ and R ³⁶ are the cyano group, compared to the case where only one of R ³³ and R ³⁶ is the cyano group, there is almost no change in the maximum absorption wavelength and full width at half maximum, and at the same time, light resistance reliability itself is greatly improved. It can be.

In Formula 2, L is a catechol-based ligand, a 2,3-naphthalenediol-based ligand, or a 1,1'-bi-2-naphthol (1,1'-Bi-2 -naphthol)-based ligand.

The L is a catechol-based ligand, a 2,3-naphthalenediol-based ligand, or a 1,1'-bi-2-naphthol (1,1'-Bi-2-naphthol)-based ligand. If it is not a ligand (for example, F, etc.), it may be impossible to apply it to the antireflection film according to one embodiment due to the expression of fluorescence properties. Conventionally, in order to solve this problem, a catechol-based ligand was used as the ligand. However, although non-fluorescence characteristics can be achieved by using the catechol-based ligand, excellent light resistance reliability cannot be secured. Therefore, efforts have been made for a long time to improve light resistance reliability while maintaining non-fluorescence properties using catechol-based ligands, and reports of slightly improved light resistance reliability while maintaining non-fluorescence properties little by little have been reported, but all of these contents are applied to conventional LCDs. It is based on the premise, and when the compounds or antireflection films mentioned in the above are applied to the quantum dot applied display, which is a recent display market trend, the decrease in light resistance reliability appears again, and the reflection based on the application of the quantum dot display It is a trend that the demand for the compound for the anti-film is rapidly increasing day by day. The inventors of the present invention were able to secure light resistance reliability and excellent solubility at the same time by accurately recognizing the latest trends and market needs as described above, analyzing the conventional problems in detail, and then controlling the structure of L in Formula 2 as described above. .

Formula 2 may be represented by Formula 2-1 or Formula 2-2 below.

[Formula 2-1]

[Formula 2-2]

In Formula 2-1 and Formula 2-2,

R ³² , R ³⁴ , R ³⁵ and R ³⁷ are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group;

R ³³ and R ³⁶ are each independently a hydrogen atom or a cyano group, but at least one of R ³³ and R ³⁶ is necessarily a cyano group;

X is a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group,

C1 and C2 are each independently an aromatic ring.

In Formula 2-1 and Formula 2-2, X is 'an unsubstituted C1 to C10 alkyl group, a C1 to C10 alkyl group unsubstituted or substituted with a halogen atom, a C1 to C10 alkyl group substituted with a C1 to C5 alkyl group, an unsubstituted C1 to C10 alkyl group A C1 to C20 alkyl group unsubstituted or substituted with a C1 to C10 alkoxy group or a combination thereof, or a C1 to C10 alkyl group unsubstituted with an unsubstituted C1 to C10 alkyl group, a C1 to C10 alkyl group unsubstituted or substituted with a halogen atom, or a C1 to C5 alkyl group substituted with a C1 to C5 alkyl group to C10 alkyl group, an unsubstituted C1 to C10 alkoxy group, or a combination thereof' or a substituted or unsubstituted C6 to C20 aryl group.

In Formula 2-1 and Formula 2-2, X is an unsubstituted C1 to C20 alkyl group, an unsubstituted C6 to C20 aryl group, a C6 to C20 aryl group substituted with an 'unsubstituted C1 to C10 alkyl group', ' It may be a C6 to C20 aryl group substituted with a C1 to C10 alkyl group substituted with a halogen atom or a C6 to C20 aryl group substituted with an 'unsubstituted C1 to C10 alkoxy group'.

In Formula 2-1 and Formula 2-2, C1 and C2 may each independently be a benzene ring or a naphthalene ring.

More excellent light resistance reliability can be secured when X is an alkyl group substituted with a specific substituent than when it is an unsubstituted alkyl group.

More excellent light resistance reliability can be secured when X is an aryl group substituted with a specific substituent than when it is an unsubstituted aryl group.

The C1 and C2 may each independently be a benzene ring or a naphthalene ring, but are not necessarily limited thereto.

The compound represented by Chemical Formula 2 may be represented by any one selected from the group consisting of Chemical Formulas 2-1-1 to 2-1-8.

[Formula 2-1-1]

[Formula 2-1-2]

[Formula 2-1-3]

[Formula 2-1-4]

[Formula 2-1-5]

[Formula 2-1-6]

[Formula 2-1-7]

[Formula 2-1-8]

The compound represented by Formula 2 exhibits an absorption wavelength at 400 nm to 520 nm, and may have a maximum absorption wavelength at 490 nm to 520 nm, more specifically, 500 nm to 510 nm among the absorption wavelengths. As described above, when the compound represented by Chemical Formula 1 has a maximum absorption wavelength within the above range, it effectively absorbs long-wavelength blue regions and short-wavelength green regions, thereby effectively improving light resistance reliability and color gamut of the panel.

The first dye may be included in an amount twice or more than that of the second dye, for example, the first dye may be included in an amount that is twice or more and 10 times or less than the amount of the second dye. In this case, absorption occurs effectively in a wavelength region of 540 nm to 550 nm, thereby improving reflectance while minimizing loss of efficiency.

(Compound represented by Formula 3 (third dye)

[Formula 3]

In Formula 3,

R ³⁸ to R ⁴⁵ are each independently a hydrogen atom, a halogen atom, a cyano group, a carboxyl group, a hydroxy group, a mercapto group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted substituted C2 to C20 alkenyl group, substituted or unsubstituted C3 to C20 cycloalkenyl group, substituted or unsubstituted C2 to C20 alkynyl group, substituted or unsubstituted C1 to C20 alkoxy group, substituted or unsubstituted C1 to C20 alkyl A thio group, a substituted or unsubstituted C6 to C20 aryl group, a substituted or unsubstituted C6 to C20 aryloxy group, or a substituted or unsubstituted C2 to C20 heterocycloalkyl group,

M is two hydrogen atoms, a divalent metal atom, a trivalent substituted metal atom, a tetravalent substituted metal atom, a metal hydroxide atom, or a metal oxide atom.

For example, M may be as described above in Chemical Formula 1.

The amount of the first dye may be twice or more than that of the third dye, for example, the first dye may be included in an amount that is twice or more and 10 times or less than the amount of the third dye. In this case, absorption occurs effectively in a wavelength region of 540 nm to 550 nm, thereby improving reflectance while minimizing loss of efficiency.

(Compound represented by Formula 4 (third dye)

[Formula 4]

In Formula 4,

R ⁴⁶ to R ⁶¹ are each independently a hydrogen atom, a halogen atom, a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C6 to C20 aryloxy group, or a substituted or unsubstituted sulfonamide;

M is two hydrogen atoms, a divalent metal atom, a trivalent substituted metal atom, a tetravalent substituted metal atom, a metal hydroxide atom, or a metal oxide atom.

For example, M may be as described above in Chemical Formula 1.

For example, at least one of R ⁴⁶ to R ⁴⁹ , at least one of R ⁵⁰ to R ⁵³ , at least one of R ⁵⁴ to R ⁵⁷ , and at least one of R ⁵⁸ to R ⁶¹ may each independently be represented by Formula 5 below.

[Formula 5]

The compound represented by Chemical Formula 4 has excellent green spectral characteristics and high luminance. Furthermore, the compound represented by Chemical Formula 4 includes a sulfonamide group substituted with a cyclohexyl group represented by Chemical Formula 5, and thus may have excellent solubility in organic solvents.

For example, in Formula 4, R ⁴⁷ , R ⁵¹ , R ⁵⁵ and R ⁵⁹ are each independently represented by Formula 5, and R ⁴⁶ , R ⁴⁸ , R ⁴⁹ , R ⁵⁰ , R ⁵² , R ⁵³ , R ⁵⁴ , R ⁵⁶ , R ⁵⁷ , R ⁵⁸ , R ⁶⁰ and R ⁶¹ may each independently be a hydrogen atom or a halogen atom.

The first dye may be included in an amount twice or more than that of the fourth dye, for example, the first dye may be included in an amount that is twice or more and 10 times or less than the amount of the fourth dye. In this case, absorption occurs effectively in a wavelength region of 540 nm to 550 nm, thereby improving reflectance while minimizing loss of efficiency.

Another embodiment provides a composition including the mixed dye.

For example, the composition may further include a non-curing resin, a pressure sensitive adhesive, or a combination thereof.

The non-curing resin can significantly reduce the change in reflectance and the change in light transmittance of the optical member after evaluation of light resistance reliability.

The non-curable resin may include a resin that does not have at least one functional group reactive to heat and/or light, for example, an epoxy group, a hydroxyl group, or a carboxylic acid group.

The non-curable resin may include a resin capable of forming a matrix of a film (anti-reflection film) to be described later by a solvent casting method without a curing agent and an initiator (eg, at least one of a photoinitiator and a thermal initiator).

The non-curable resin may have a glass transition temperature of 40 °C to 200 °C. Within this range, the glass transition temperature of a film (anti-reflection film) to be described later may be reached and the brittle phenomenon of the film may be improved. Preferably, the non-curing resin may have a glass transition temperature of 100 °C to 200 °C.

For example, the non-curable resin may include a polymer of a monomer or a monomer mixture including a (meth)acrylic monomer or a vinyl monomer having no functional group reactive to heat and/or light. The polymer may include a homopolymer or a heteropolymer. The "homopolymer" is a polymer in which the monomers constituting the polymer are the same, and the "heteropolymer" is a polymer in which two or more types of monomers constituting the polymer are used.

The monomer or monomer mixture is a (meth)acrylic acid ester having an unsubstituted C1 to C10 alkyl group, a (meth)acrylic or vinyl monomer having a cyano group, and a (meth)acrylic or vinyl monomer having an unsubstituted cycloalkyl group having 5 to 10 carbon atoms. It may include at least one of an acrylic acid ester, an unsubstituted aromatic vinyl monomer, and an aromatic vinyl monomer having an unsubstituted C1 to C10 alkyl group.

The monomers are methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, ethylhexyl (meth)acrylate, cyclohexyl (meth)acrylate, (meth)acrylonitrile, styrene , methyl styrene, dimethyl styrene, ethyl styrene, butyl styrene, vinyl naphthalene, diphenyl ethylene, isopropenyl toluene, isopropenyl methyl benzene, and isopropenyl ethyl benzene.

The non-curing resin is a poly(meth)acrylic resin including a polyalkyl(meth)acrylic resin such as polymethylmethacrylate (PMMA), a polystyrene (PS) resin, and a styrene-acrylonitrile (SAN) resin. , Methyl (meth)acrylate-styrene-(meth)acrylonitrile-based resins including methyl methacrylate-styrene-acrylonitrile (m-SAN)-based resins, polyarylene-based resins, etc. can do.

The non-curing resin is a polycarbonate (PC)-based resin, a polyurethane-based resin including a thermoplastic polyurethane (TPU)-based resin, a non-modified polyvinylidene fluoride (PVDF)-based resin, and a modified polyvinylidene fluoride. (modified-PVDF) may include one or more types of polyvinylidene fluoride-based resins including resins and the like.

As the pressure sensitive adhesive (PSA), any type may be used as long as it is used in the conventional technical field, and the type is not particularly limited.

The composition including the mixed dye may further include conventional additives such as a light stabilizer, an antioxidant, a plasticizer, an antistatic agent, and a rework agent. Preferably, a light stabilizer may be included to further improve light resistance reliability.

The light stabilizer may include a conventional light stabilizer known to those skilled in the art, such as a hindered amine light stabilizer (HALS)-based, phenol-based, or oxanilide-based.

The conventional additives may be included in an amount of 0 to 20 parts by weight, for example, 0.001 to 20 parts by weight, for example, 0.01 to 20 parts by weight, based on 100 parts by weight of the non-curing resin. Within this range, additive effects can be obtained without affecting physical properties of the antireflection film described later.

The composition including the mixed dye may be a solvent-free type. Alternatively, the composition including the mixed dye may further include a solvent. When the composition containing the mixed dye contains a solvent, the antireflection film to be described below can be made thin and its coating properties can be improved. As the solvent, a common solvent known to those skilled in the art may be used. For example, the solvent may include one or more of methyl ethyl ketone, ethyl acetate, and toluene.

Another embodiment provides a film prepared using the composition, for example, an antireflection film.

Another embodiment provides an optical member including the above film, for example, an antireflection film.

For example, the optical member may have a structure shown in FIG. 1 or 2, but is not necessarily limited thereto.

The optical member having the structure of FIG. 1 includes a base film; an antireflection film positioned on the base film; a protective film positioned on the anti-reflection film; And it may include a hard coat layer located on the protective film.

Since the optical member having the structure of FIG. 1 includes a pressure sensitive adhesive in the antireflection film, a separate adhesive layer may not be required.

The optical member having the structure of FIG. 2 includes an adhesive layer positioned on the base film; an antireflection film positioned on the adhesive layer; a protective film positioned on the anti-reflection film; And it may include a hard coat layer located on the protective film.

In the optical member having the structure of FIG. 2 , an adhesive layer may be separately present between the anti-reflection film and the base film, and thus the pressure-sensitive adhesive may be included in the adhesive layer and not included in the anti-reflection film.

Both the optical members having the structures of FIGS. 1 and 2 may further include a high refractive index layer positioned on the hard coat layer and a low refractive index layer positioned on the high refractive index layer.

The anti-reflection film may include the compound (first dye) represented by Chemical Formula 1 in an amount of 0.001 wt% to 0.5 wt% based on solid content. When the compound represented by Formula 1 (first dye) is included in the above content range, it is easy to adjust the color of the panel of the display device to which the antireflection film is applied, and dyes in other absorption regions (second dye, third dye, and second dye) 4 dye) can be used together to improve Neutral Black.

The antireflection film may be prepared by applying a predetermined thickness to a base film and then drying the solvent, and the solvent drying may be performed by a conventional method known to those skilled in the art, but the manufacturing method is not necessarily limited thereto.

The anti-reflection film may have a thickness of 0.5 μm to 10 μm, for example, 1 μm to 5 μm. Within this range, it can be easily used for an optical member.

The low refractive index layer may lower the reflectance of the antireflection film due to a difference in refractive index between the protective film and the high refractive index layer.

The low refractive index layer contains a curable binder resin, a fluorine atom-containing monomer, and fine particles (eg, hollow silica) having an average particle diameter of 5 nm to 300 nm, and the thickness of the low refractive index layer may be 0.01 μm to 0.15 μm. The refractive index of the low refractive index layer may be 1.20 to 1.40.

A functional coating layer may be further formed on one surface of the low refractive index layer, that is, an upper surface of the low refractive index layer, thereby providing an additional function to the antireflection film. The functional coating layer may include, but is not limited to, a fingerprint resistant layer, an antistatic layer, a hard coating layer, an antiglare layer, and a barrier layer.

The high refractive index layer may be formed between the protective film and the low refractive index layer to have a refractive index between the protective film and the low refractive index layer, thereby lowering the reflectance of the antireflection film.

The high refractive index layer has a thickness of 0.05 μm to 20 μm, a refractive index of 1.45 to 2, and a haze value specified in JIS-K7361 that does not differ from the haze value of the substrate or a difference of 10% or less from the haze value of the substrate is transparent. It is excellent, and antireflection properties may be excellent.

The hard coat layer increases the hardness of the anti-reflection film, so that even when the anti-reflection film is used on the outermost part of the optical member, there is no occurrence of scratches or the like. The hard coat layer is not necessarily provided. The hard coat layer may be omitted if the target hardness can be secured in the high refractive index layer or the low refractive index layer.

The hard coat layer may be formed between the protective film and the high refractive index layer.

The hard coat layer may be a cured layer formed by uniformly mixing ultrafine metal oxide particles having an average particle diameter of 1 nm to 30 nm and a particle size distribution range of ±5 nm or less in an average particle diameter of 5 nm or less in a cured binder. The hard coat layer may have a thickness of 1 μm to 15 μm, and the hard coat layer may have a refractive index of 1.54 or more.

The anti-reflection film may have a thickness of 50 μm to 500 μm, such as 50 μm to 300 μm, such as 50 μm to 150 μm. When the anti-reflection film has a thickness within the above range, it may be easily applied to a display device to be described later.

The adhesive layer may be formed on a lower surface of the anti-reflection film to adhere the anti-reflection film to a base film or the like. As described above, the adhesive layer may be used integrally with the antireflection film.

The adhesive layer may have a glass transition temperature of -70 °C to 0 °C, for example -65 °C to -20 °C. When the glass transition temperature of the adhesive layer is within the above range, adhesion to the panel may be excellent.

The adhesive layer may be a thermosetting adhesive layer or a photocurable adhesive layer. Preferably, since the adhesive layer is a thermosetting adhesive layer, it is not necessary to consider the influence of ultraviolet rays due to the absorption wavelength of the dye according to one embodiment, thereby facilitating the manufacture of the adhesive layer. The “thermosetting adhesive layer” may include not only an adhesive layer cured through a predetermined heat treatment of 40° C. to 100° C., but also an adhesive layer cured at room temperature (eg, 20° C. to 30° C.).

The adhesive layer may be formed of a composition for an adhesive layer including an adhesive resin and a curing agent.

The type of adhesive resin is not limited as long as it can secure the glass transition temperature of the adhesive layer. For example, the adhesive resin may be a silicone-based, urethane-based, or (meth)acrylic adhesive resin, but preferably a (meth)acrylic adhesive resin may be used.

The adhesive resin may have a glass transition temperature of -70°C to 0°C, preferably -65°C to -20°C. When the glass transition temperature of the adhesive resin is within the above range, adhesion to the panel may be excellent.

The adhesive resin may have a weight average molecular weight of 500,000 g/mol to 2,000,000 g/mol, such as 800,000 g/mol to 1,500,000 g/mol. When the weight average molecular weight of the adhesive resin has the above range, adhesion to the panel may be excellent.

The adhesive resin is a (meth)acrylic monomer having an alkyl group; A (meth)acrylic monomer having a hydroxyl group; and a copolymer of at least one of a (meth)acrylic monomer having an aromatic group, a (meth)acrylic monomer having an alicyclic group, and a (meth)acrylic monomer having a heteroalicyclic group, preferably a random copolymer.

The (meth)acrylic monomer having an alkyl group may include (meth)acrylic acid ester having an unsubstituted C1 to C10 alkyl group. Specifically, the (meth)acrylic monomer having an alkyl group is methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, n-butyl (meth)acrylate, t-butyl (meth)acrylate , iso-butyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, heptyl (meth)acrylate, octyl (meth)acrylate, iso- It may include one or more of octyl (meth) acrylate, nonyl (meth) acrylate, and decyl (meth) acrylate, but is not limited thereto. These may be included alone or in combination of two or more. The (meth)acrylic monomer having an alkyl group may be included in an amount of 60 wt% to 99.99 wt%, for example, 60 wt% to 90 wt%, for example, 80 wt% to 99.9 wt% of the monomer mixture.

The (meth)acrylic monomer having a hydroxyl group is a (meth)acrylic monomer having a C1 to C20 alkyl group having one or more hydroxyl groups, a (meth)acrylic monomer having a C3 to C20 cycloalkyl group having one or more hydroxyl groups, and a (meth)acrylic monomer having one or more hydroxyl groups. It may include at least one of (meth)acrylic monomers having a C6 to C20 aromatic group. Specifically, the (meth)acrylic monomer having a hydroxyl group is preferably a (meth)acrylic monomer having a C1 to C20 alkyl group having one or more hydroxyl groups, and 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylic monomer )Acrylate, 2-hydroxybutyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, 1-chloro-2-hydroxypropyl (meth)acrylate may include one or more of the rates. These may be included alone or in combination of two or more. The (meth)acrylic monomer having the hydroxyl group may be included in an amount of 0.01 wt % to 20 wt %, such as 0.1 wt % to 10 wt %, in the monomer mixture.

The (meth)acrylic monomer having an aromatic group may include a (meth)acrylic acid ester having a C6 to C20 aryl group or a C7 to C20 arylalkyl group. Specifically, the (meth)acrylic monomer having an aromatic group may include phenyl (meth)acrylate, benzyl (meth)acrylate, and the like, but is not limited thereto. The (meth)acrylic monomer having the aromatic group may be included in an amount of 0 wt% to 50 wt%, such as 0 wt% to 20 wt%, in the monomer mixture.

In the present specification, when an alicyclic group and an alkyl group are mixed among the monomers, it is classified as a (meth)acrylic monomer having an alicyclic group.

The (meth)acrylic monomer having an alicyclic group is a (meth)acrylic acid ester having a C5 to C20 monocyclic or heterocyclic alicyclic group, such as cyclohexyl (meth)acrylate, isobornyl (meth)acrylate, and dicyclopentanyl (meth)acrylate, methylcyclohexyl (meth)acrylate, and dicyclopentenyl (meth)acrylate. The (meth)acrylic monomer having the alicyclic group may be included in an amount of 0 wt% to 50 wt%, for example, 1 wt% to 30 wt% or 1 wt% to 20 wt% of the monomer mixture.

The (meth)acrylic monomer having a heteroalicyclic group may include a (meth)acrylic acid ester having a C4 to C9 heteroalicyclic group containing at least one of nitrogen, oxygen, or sulfur. Specifically, the (meth)acrylic monomer having a heteroalicyclic group may include (meth)acryloylmorpholine, but is not limited thereto. The (meth)acrylic monomer having the heteroalicyclic group may be included in an amount of 0 wt% to 50 wt%, such as 0 wt% to 10 wt%, in the monomer mixture.

The adhesive resin contains 70% to 99.99% by weight of the (meth)acrylic monomer having the alkyl group, such as 90% to 99.5% by weight, and 0.01% to 30% by weight of the (meth)acrylic monomer having the hydroxyl group, such as 0.5% by weight. It may include a (meth)acrylic copolymer of a monomer mixture comprising % to 10% by weight. When each of the monomers constituting the adhesive resin has the above range, it may be easy to secure adhesive strength.

The curing agent may include an isocyanate-based curing agent. The curing agent may be included in an amount of 0.01 part by weight to 20 parts by weight, for example, 0.01 part by weight to 10 parts by weight, for example, 0.1 part by weight to 4 parts by weight, based on 100 parts by weight of the adhesive resin. When the curing agent has the above range, the composition may be crosslinked to form an adhesive layer, and transparency deterioration and reliability failure due to excessive use may be prevented.

The composition for the adhesive layer may further include conventional additives such as a silane coupling agent, an antioxidant, a tackifying resin, a plasticizer, an antistatic agent, a rework agent, and a curing catalyst. The silane coupling agent may be included in an amount of 0.01 to 20 parts by weight, for example, 0.01 to 10 parts by weight, for example, 0.1 to 4 parts by weight, based on 100 parts by weight of the adhesive resin. When the silane coupling agent has the above range, it is possible to prevent adhesion control and reliability failure.

The composition for the adhesive layer may increase coating properties by further including a non-solvent type or a conventional organic solvent.

The adhesive layer may have a thickness of 1 μm to 50 μm, for example, 5 μm to 25 μm. When the adhesive layer has a thickness within the above range, it can be easily used in a display device.

As long as the protective film can be used by those skilled in the art (eg, TAC; Tri-Acetyl Cellulose), it can be used regardless of its type.

The base film may be a glass substrate.

According to another embodiment, a display device including the optical member is provided. For example, a display device including the optical member and the quantum dot-containing layer may be provided.

For example, the display device may further include a light source and a color filter.

For example, the display device may have a laminated structure in which the quantum dot-containing layer is positioned on the light source, the color filter is positioned on the quantum dot-containing layer, and the optical member is positioned on the color filter.

For example, the light source may be a blue light source.

Components constituting the quantum dot-containing layer may further include a binder resin, a reactive unsaturated compound, a photopolymerization initiator, a diffusion agent, and other additives in addition to the quantum dots, which will be described later.

The quantum dots may have a full width at half maximum (FWHM) of 20 nm to 100 nm, for example, 20 nm to 50 nm. When the quantum dots have a full width at half maximum in the above range, the color reproduction rate is increased when used as a color material in a color filter according to high color purity.

Each of the quantum dots may independently be an organic material, an inorganic material, or a hybrid (composite) of an organic material and an inorganic material.

The quantum dots may each independently consist of a core and a shell surrounding the core, and the core and shell may each independently consist of a core, a core/shell, a core/first shell/ It may have a structure of a second shell, alloy, alloy/shell, etc., but is not limited thereto.

For example, the core may include at least one material selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs, and alloys thereof. , but is not necessarily limited thereto. The shell surrounding the core may include at least one material selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, HgSe, and alloys thereof, but is not necessarily limited thereto.

In one embodiment, since interest in the environment has greatly increased worldwide in recent years and regulations on toxic substances have been strengthened, instead of light emitting materials having a cadmium-based core, the quantum yield is rather low, but environmentally friendly A non-cadmium-based light emitting material (InP/ZnS) was used, but is not necessarily limited thereto.

The structure of the quantum dots is not particularly limited, but in the case of the quantum dots having a core/shell structure, the size (average particle diameter) of each quantum dot including the shell may be 1 nm to 15 nm, for example, 5 nm to 15 nm.

For example, the quantum dots may include red quantum dots, green quantum dots, or a combination thereof. For example, the quantum dots may include both green quantum dots and red quantum dots. In this case, the green quantum dots may be included in a greater content than the red quantum dots. The red quantum dots may have an average particle diameter of 10 nm to 15 nm. The green quantum dots may have an average particle diameter of 5 nm to 8 nm.

Meanwhile, for dispersion stability of the quantum dots, a dispersant may be used together. The dispersant helps to uniformly disperse the light conversion material such as quantum dots in the curable composition, and all of nonionic, anionic or cationic dispersants may be used. Specifically, polyalkylene glycol or esters thereof, polyoxyalkylene, polyhydric alcohol ester alkylene oxide adduct, alcohol alkylene oxide adduct, sulfonic acid ester, sulfonic acid salt, carboxylic acid ester, carboxylic acid salt, alkyl amide alkylene oxide Adducts, alkyl amines, and the like may be used, and these may be used alone or in combination of two or more. The dispersant may be used in an amount of 0.1 wt % to 100 wt %, for example, 10 wt % to 20 wt %, based on the solid content of light conversion materials such as quantum dots.

The quantum dots may be included in an amount of 1 to 40 parts by weight, for example, 1 to 10 parts by weight, based on 100 parts by weight of the components constituting the quantum dot-containing layer. When the quantum dots are included within the above range, the light conversion rate is excellent, and pattern characteristics and development characteristics are not impaired, so that excellent fairness may be obtained.

The binder resin may include an acrylic resin, an epoxy resin, or a combination thereof.

The acrylic resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable with the first ethylenically unsaturated monomer, and may include one or more acrylic repeating units.

The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxy group, and specific examples thereof include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.

The first ethylenically unsaturated monomer may be included in an amount of 5 wt % to 50 wt %, for example, 10 wt % to 40 wt %, based on the total amount of the acrylic binder resin.

The second ethylenically unsaturated monomer may be an aromatic vinyl compound such as styrene, α-methylstyrene, vinyltoluene, or vinylbenzylmethyl ether; Methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxy butyl (meth)acrylate, benzyl (meth)acrylate, unsaturated carboxylic acid ester compounds such as cyclohexyl (meth)acrylate and phenyl (meth)acrylate; Unsaturated carboxylic acid amino alkyl ester compounds, such as 2-aminoethyl (meth)acrylate and 2-dimethylaminoethyl (meth)acrylate; carboxylic acid vinyl ester compounds such as vinyl acetate and vinyl benzoate; unsaturated carboxylic acid glycidyl ester compounds such as glycidyl (meth)acrylate; vinyl cyanide compounds such as (meth)acrylonitrile; unsaturated amide compounds such as (meth)acrylamide; and the like, and these may be used alone or in combination of two or more.

Specific examples of the acrylic resin include polybenzyl methacrylate, (meth)acrylic acid/benzyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene copolymer, (meth)acrylic acid/benzyl methacrylate/2 -Hydroxyethyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene/2-hydroxyethyl methacrylate copolymer, etc. may be exemplified, but are not limited thereto, and these may be used alone or in combination of two or more. can also be used in combination.

The acrylic resin may have a weight average molecular weight of 1,000 g/mol to 15,000 g/mol.　When the weight average molecular weight of the acrylic resin is within the above range, adhesion to the substrate is excellent, physical and chemical properties are good, and the viscosity is appropriate.

The epoxy resin is a monomer or oligomer that can be polymerized by heat, and may include a compound having a carbon-carbon unsaturated bond and a carbon-carbon cyclic bond.

The epoxy resin may further include a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a phenol novolak type epoxy resin, a cyclic aliphatic epoxy resin, and an aliphatic polyglycidyl ether.

As commercial products of these compounds, YX4000, YX4000H, YL6121H, YL6640, YL6677 from Ukashell Epoxy Co., Ltd.; EOCN-102, EOCN-103S, EOCN-104S, EOCN-1020, EOCN-1025, EOCN-1027 from Nippon Kayaku Co., Ltd. and Epicoat 180S75 from Ukashell Epoxy Co., Ltd.; Bisphenol A type epoxy resins include Epicoat 1001, 1002, 1003, 1004, 1007, 1009, 1010 and 828 from Yukashell Epoxy Co., Ltd.; Bisphenol F-type epoxy resins include Epicoat 807 and 834 from Yukashell Epoxy Co., Ltd.; Phenol noblock type epoxy resins include Epicoat 152, 154, 157H65 from Yukashell Epoxy Co., Ltd. and EPPN 201, 202 from Nippon Kayaku Co., Ltd.; Other cyclic aliphatic epoxy resins include CY175, CY177 and CY179 from CIBA-GEIGY A.G, ERL-4234, ERL-4299, ERL-4221 and ERL-4206 from U.C.C, Shodyne 509 from Showa Denko Co., Ltd. , Araldite CY-182, CY-192 and CY-184 from CIBA-GEIGY A.G, Epichron 200 and 400 from Dainipbon Ink Kogyo Co., Ltd., Epicoat 871 and 872 from Ukashell Epoxy Co., Ltd. and EP1032H60, ED-5661 and ED-5662 from Celanese Coating Co., Ltd.; Examples of aliphatic polyglycidyl ether include Epicoat 190P and 191P from Yukashell Epoxy Co., Ltd., Epolite 100MF from Kyoeisha Yushi Kagaku Kogyo Co., Ltd., and Epiol TMP from Nippon Yushi Co., Ltd. can

The binder resin may be included in an amount of 1 part by weight to 40 parts by weight, for example, 5 parts by weight to 20 parts by weight, based on 100 parts by weight of the components constituting the quantum dot-containing layer. When the binder resin is included within the above range, excellent sensitivity, developability, resolution, and linearity of the pattern may be obtained.

The reactive unsaturated compound may be used by mixing monomers or oligomers commonly used in conventional photocurable compositions and thermosetting compositions.

The reactive unsaturated compound may be an acrylate-based compound. For example, ethylene glycol diacrylate, triethylene glycol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, pentaerythritol diacrylate, Pentaerythritol triacrylate, dipentaerythritol diacrylate, dipentaerythritol triacrylate, dipentaerythritol pentaacrylate, pentaerythritol hexaacrylate, bisphenol A diacrylate, trimethylolpropane triacrylate , novolac epoxy acrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, propylene glycol dimethacrylate, 1,4-butanediol dimethacrylate, 1,6 - It can be used by selecting or mixing one or more types from hexanediol dimethacrylate and the like.

The reactive unsaturated compound may be used after being treated with an acid anhydride to impart better developability.

The reactive unsaturated compound may be included in an amount of 1 part by weight to 10 parts by weight, for example, 1 part by weight to 5 parts by weight, based on 100 parts by weight of the components constituting the quantum dot-containing layer. When the reactive unsaturated compound is included within the above range, sufficient curing occurs during exposure in the pattern forming process, resulting in excellent reliability, and excellent heat resistance, light resistance, chemical resistance, resolution and adhesion of the pattern.

As the photopolymerization initiator, an acetophenone-based compound, a benzophenone-based compound, a thioxanthone-based compound, a benzoin-based compound, a triazine-based compound, or an oxime-based compound may be used.

Examples of the acetophenone-based compound include 2,2'-diethoxy acetophenone, 2,2'-dibutoxy acetophenone, 2-hydroxy-2-methylpropiophenone, p-t-butyltrichloro acetophenone, p-t -Butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropane-1 -one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, etc. are mentioned.

Examples of the benzophenone-based compound include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4 '-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and the like.

Examples of the thioxanthone-based compound include thioxanthone, 2-methylthioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diisopropyl thioxanthone, 2- Chlorothioxanthone etc. are mentioned.

Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyldimethylketal.

Examples of the triazine-based compound include 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3',4' -Dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine , 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine , 2-biphenyl-4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphtho-1-yl)- 4,6-bis(trichloromethyl)-s-triazine,2-(4-methoxynaphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4 -Bis(trichloromethyl)-6-piperonyl-s-triazine, 2-4-bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine, etc. are mentioned. .

Examples of the oxime-based compound include O-acyloxime-based compounds, 2-(O-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(O-acetyloxime) -1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone, O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one, etc. can be used. Specific examples of the O-acyloxime compound include 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butane- 1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione -2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octan-1-one oxime-O-acetate, 1-(4-phenylsulfanylphenyl)-butan-1-one oxime- O-acetate 　 etc. are mentioned.

As the photopolymerization initiator, a carbazole-based compound, a diketone compound, a sulfonium borate-based compound, a diazo-based compound, an imidazole-based compound, a biimidazole-based compound, a fluorene-based compound, and the like may be used in addition to the above compounds.

The photopolymerization initiator may be used together with a photosensitizer that causes a chemical reaction by absorbing light, becoming excited, and then transferring the energy thereto.

Examples of the photosensitizer include tetraethylene glycol bis-3-mercapto propionate, pentaerythritol tetrakis-3-mercapto propionate, dipentaerythritol tetrakis-3-mercapto propionate, and the like. can be heard

The photopolymerization initiator may be included in an amount of 0.1 part by weight to 10 parts by weight, for example, 0.1 part by weight to 5 parts by weight, based on 100 parts by weight of the components constituting the quantum dot-containing layer. When the photopolymerization initiator is included within the above range, it is possible to obtain a pattern having excellent resolution without remaining film due to excellent balance of sensitivity and developability during exposure.

The quantum dot-containing layer may further include a diffusion agent.

For example, the diffusing agent may include barium sulfate (BaSO ₄ ), calcium carbonate (CaCO ₃ ), titanium dioxide (TiO ₂ ), zirconia (ZrO ₂ ), or a combination thereof.

The diffusing agent reflects light that is not absorbed by the above-described quantum dots, and enables the quantum dots to absorb the reflected light again. That is, the diffusing agent may increase the light conversion efficiency of the curable composition by increasing the amount of light absorbed by the quantum dots.

The diffusion agent may have an average particle diameter (D ₅₀ ) of 150 nm to 250 nm, specifically 180 nm to 230 nm. When the average particle diameter of the diffusing agent is within the above range, a superior light diffusion effect may be obtained and light conversion efficiency may be increased.

The diffusing agent may be included in an amount of 0.1 wt% to 20 wt%, for example, 0.1 wt% to 5 wt%, based on solid content, based on 100 parts by weight of the components constituting the quantum dot-containing layer. When the diffusion agent is included in an amount of less than 0.1% by weight based on 100 parts by weight of the components constituting the quantum dot-containing layer, it is difficult to expect an effect of improving light conversion efficiency by using the diffusion agent, and when it is included in an amount exceeding 20% by weight, There is a possibility that the pattern characteristics may deteriorate.

To improve stability and dispersibility of the quantum dots, the quantum dot-containing layer may further include a thiol-based additive.

The thiol-based additive may be substituted on the shell surface of the quantum dots to improve dispersion stability of the quantum dots in a solvent, thereby stabilizing the quantum dots.

The thiol-based additive may have 2 to 10, for example, 2 to 4 thiol groups (-SH) at the terminal depending on its structure.

For example, the thiol-based additive may include at least two or more functional groups represented by the following Chemical Formula 7 at the terminal.

[Formula 7]

In Formula 7,

L ⁷ and L ⁸ are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted C3 to C20 arylene group. It is a C2 to C20 heteroarylene group.

For example, the thiol-based additive may be represented by Formula 8 below.

[Formula 8]

In Formula 8,

L ⁷ and L ⁸ are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted C3 to C20 arylene group. It is a C2 to C20 heteroarylene group,

u1 and u2 are each independently an integer of 0 or 1.

For example, in Chemical Formulas 7 and 8, L ⁷ and L ⁸ may each independently be a single bond or a substituted or unsubstituted C1 to C20 alkylene group.

Specific examples of the thiol-based additive include pentaerythritol tetrakis (3-mercaptopropionate) represented by the following formula (7a), trimethylolpropane tris (3-mercaptopropionate) represented by the following formula (7b) -Mercaptopropionate) (trimethylolpropane tris (3-mercaptopropionate)), pentaerythritol tetrakis (mercaptoacetate) represented by the following formula 7c, trimethylolpropane tris represented by the following formula 7d 2-mercaptoacetate) (trimethylolpropane tris (2-mercaptoacetate)), glycol di-3-mercaptopropionate represented by the following formula 7e (Glycol di-3-mercaptopropionate), and any combination thereof selected from the group consisting of can take one

[Formula 7a]

[Formula 7b]

[Formula 7c]

[Formula 7d]

[Formula 7e]

The thiol-based additive may be included in an amount of 0.1 part by weight to 10 parts by weight, for example, 0.1 part by weight to 5 parts by weight, based on 100 parts by weight of the components constituting the quantum dot-containing layer. When the thiol-based additive is included within the above range, the stability of light conversion materials such as quantum dots can be improved, and the heat resistance of light conversion materials such as quantum dots can be improved by forming a covalent bond by reacting with the thiol group in the component with the acrylic group of the resin or monomer. may have an effect.

The quantum dot-containing layer may further include a polymerization inhibitor including a hydroquinone-based compound, a catechol-based compound, or a combination thereof. As the quantum dot-containing layer further includes the hydroquinone-based compound, the catechol-based compound, or a combination thereof, crosslinking at room temperature may be prevented during exposure after printing (coating) a composition including quantum dots and the like.

For example, the hydroquinone-based compound, the catechol-based compound, or a combination thereof is hydroquinone, methyl hydroquinone, methoxyhydroquinone, t-butyl hydroquinone, 2,5-di- t -butyl hydroquinone, 2,5- Bis(1,1-dimethylbutyl) hydroquinone, 2,5-bis(1,1,3,3-tetramethylbutyl) hydroquinone, catechol, t-butyl catechol, 4-methoxyphenol, pyroga Lol, 2,6-di- t -butyl-4-methylphenol, 2-naphthol, tris(N-hydroxy-N-nitrosophenylaminato-O,O') aluminum (Tris(N-hydroxy-N -nitrosophenylaminato-O, O')aluminium) or a combination thereof, but is not necessarily limited thereto.

The hydroquinone-based compound, the catechol-based compound, or a combination thereof may be used in the form of a dispersion, and the polymerization inhibitor in the form of the dispersion is 100% by weight of the component constituting the quantum dot and fluorescent dye-containing layer or the quantum dot-containing layer (not containing fluorescent dye). It may be included in 0.001 part by weight to 1 part by weight, for example, 0.01 part by weight to 0.1 part by weight per part. When the stabilizer is included within the above range, it is possible to solve the aging problem at room temperature and to prevent sensitivity deterioration and surface peeling.

The quantum dot-containing layer may include malonic acid in addition to the thiol-based additive and polymerization inhibitor; 3-amino-1,2-propanediol; silane-based coupling agents; leveling agent; fluorine-based surfactants; or a combination thereof.

For example, the quantum dot-containing layer may further include a silane-based coupling agent having a reactive substituent such as a vinyl group, a carboxyl group, a methacryloxy group, an isocyanate group, or an epoxy group in order to improve adhesion to a substrate.

Examples of the silane-based coupling agent include trimethoxysilyl benzoic acid, γ-methacryloxypropyl trimethoxysilane, vinyl triacetoxysilane, vinyl trimethoxysilane, γ-isocyanate propyl triethoxysilane, γ-glyc sidoxy propyl trimethoxysilane, β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, and the like, and these may be used alone or in combination of two or more.

The silane-based coupling agent may be included in an amount of 0.01 part by weight to 10 parts by weight based on 100 parts by weight of the components constituting the quantum dot-containing layer. When the silane-based coupling agent is included within the above range, adhesion, storability, and the like are excellent.

In addition, the quantum dot-containing layer may further include a surfactant, such as a fluorine-based surfactant, to improve coating properties and prevent defect formation, if necessary.

As the fluorine-based surfactant, BM Chemie's BM-1000 ^® , BM-1100 ^® , etc.; Mecha Pack F 142D ^® , F 172 ^® , F 173 ^® , F 183 ^® and the like of Dainippon Inki Kagaku Kogyo Co., Ltd.; Sumitomo 3M Co., Ltd.'s Prorad FC-135 ^® , the same FC-170C ^® , the same FC-430 ^® , the same FC-431 ^® , etc.; Saffron S-112 ^® , S-113 ^® , S-131 ^® , S-141 ^® , S-145 ^® and the like of Asahi Grass Co., Ltd.; SH-28PA ^® , Copper-190 ^® , Copper-193 ^® , SZ-6032 ^® , SF-8428 ^® and the like from Toray Silicone Co., Ltd.; Fluorine-based surfactants commercially available under names such as F-482, F-484, F-478, and F-554 from DIC Co., Ltd. may be used.

The fluorine-based surfactant may be used in an amount of 0.001 part by weight to 5 parts by weight based on 100 parts by weight of the components constituting the quantum dot-containing layer. When the fluorine-based surfactant is included within the above range, coating uniformity is secured, stains do not occur, and wettability to a glass substrate is excellent.

In addition, a certain amount of other additives such as antioxidants and stabilizers may be further added to the quantum dot-containing layer within a range that does not impair physical properties.

The method of manufacturing each of the quantum dot-containing layers includes forming a pattern by applying a curable composition containing the above-described components on a substrate by an inkjet spraying method (S1); and curing the pattern (S2).

(S1) Step of forming a pattern

The curable composition is preferably applied on a substrate in a thickness of 0.5 to 10 μm by an inkjet dispersion method. In the inkjet jetting, a pattern may be formed by jetting only a single color and repeatedly jetting according to the required number of colors, or a pattern may be formed by simultaneously jetting the required number of colors to reduce a process.

(S2) curing step

A cured resin film can be obtained by curing the obtained pattern. As a method of curing at this time, a thermal curing step is preferable. The thermal curing process may be a process of first removing the solvent in the curable composition by heating at a temperature of about 100 ° C. or higher for about 3 minutes, and then curing by heating at a temperature of 160 ° C. to 300 ° C., and more preferably 180 ° C. It may be a process of curing by heating for about 30 minutes at a temperature of ℃ to 250 ℃.

In addition, each of the quantum dot-containing layers may be prepared without inkjetting. In this case, the manufacturing method uses an appropriate method such as spin coating, roller coating, spray coating, etc., on a substrate subjected to a predetermined pretreatment of the curable composition containing the above components, etc., for example, 0.5 μm to 10 μm. It is applied with a thickness of, and light is irradiated to form a pattern required for a color filter. As a light source used for irradiation, UV, electron beams, or X-rays may be used, and for example, UV in a range of 190 nm to 450 nm, specifically, 200 nm to 400 nm may be irradiated. In the irradiation step, a photoresist mask may be further used. After performing the irradiation process in this way, the composition layer irradiated with the light source is treated with a developing solution. At this time, the unexposed portion of the composition layer is dissolved to form a pattern required for the color filter. By repeating this process according to the number of colors required, a color filter having a desired pattern can be obtained. In addition, when the image pattern obtained by development in the above process is heated again or cured by irradiation with actinic rays, etc., crack resistance, solvent resistance, and the like can be improved.

The curable composition may further include a solvent.

Examples of the solvent include alcohols such as methanol and ethanol; glycol ethers such as ethylene glycol methyl ether, ethylene glycol ethyl ether, and propylene glycol methyl ether; Cellosolve acetates, such as methyl cellosolve acetate, ethyl cellosolve acetate, and diethyl cellosolve acetate; carbitols such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, and diethylene glycol diethyl ether; propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate; Ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propyl ketone, methyl-n-butyl ketone, methyl-n-amyl ketone, and 2-heptanone ; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate and isobutyl acetate; lactic acid alkyl esters such as methyl lactate and ethyl lactate; hydroxyacetic acid alkyl esters such as methyl hydroxyacetate, ethyl hydroxyacetate, and butyl hydroxyacetate; acetic acid alkoxyalkyl esters such as methoxymethyl acetate, methoxyethyl acetate, methoxybutyl acetate, ethoxymethyl acetate, and ethoxyethyl acetate; 3-hydroxypropionic acid alkyl esters such as methyl 3-hydroxypropionate and ethyl 3-hydroxypropionate; 3-alkoxypropionic acid alkyl esters such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate, and methyl 3-ethoxypropionate; 2-hydroxypropionic acid alkyl esters such as methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, and propyl 2-hydroxypropionate; 2-alkoxypropionic acid alkyl esters such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate, and methyl 2-ethoxypropionate; 2-hydroxy-2-methylpropionic acid alkyl esters such as methyl 2-hydroxy-2-methylpropionate and ethyl 2-hydroxy-2-methylpropionate; 2-alkoxy-2-methylpropionic acid alkyl esters such as methyl 2-methoxy-2-methylpropionate and ethyl 2-ethoxy-2-methylpropionate; esters such as 2-hydroxyethyl propionate, 2-hydroxy-2-methylethyl propionate, hydroxyethyl acetate, and methyl 2-hydroxy-3-methylbutanoate; or ketonic acid ester compounds such as ethyl pyruvate, N-methylformamide, N,N-dimethylformamide, N-methylformanilide, N-methylacetamide, N,N-dimethylacetamide , N-methylpyrrolidone, dimethylsulfoxide, benzylethyl ether, dihexyl ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, benzoic acid Ethyl, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, phenyl cellosolve acetate, dimethyl adipate, etc. may be used, but is not limited thereto.

For example, the solvent may be glycol ethers such as ethylene glycol monoethyl ether and ethylene diglycol methyl ethyl ether; ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; esters such as 2-hydroxy ethyl propionate; carbitols such as diethylene glycol monomethyl ether; propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate; It is preferable to use alcohols such as ethanol or a combination thereof.

For example, the solvent is propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, ethanol, ethylene glycol dimethyl ether, ethylene diglycol methyl ethyl ether, diethylene glycol dimethyl ether, dimethylacetamide, 2-butoxyethanol, N - It may be a solvent containing methylpyrrolidine, N-ethylpyrrolidine, propylene carbonate, γ-butyrolactone, dimethyl adipate, or a combination thereof.

The solvent may be included in a balance amount relative to the total amount of the curable composition.

Hereinafter, preferred embodiments of the present invention will be described. However, the following examples are only preferred examples of the present invention, and the present invention is not limited by the following examples.

(Example)

(synthesis example)

Synthesis Example 1: Synthesis of Compound Represented by Chemical Formula 1-1

(reaction formula)

(1) Put 3,4-bis(1-methylbutoxy)benzaldehyde (100g, 0.36 mol), 800g of propionic acid, and pyrrole (24g, 0.36 mol) in a round bottom flask, raise the temperature to 130℃, and stir for 6 hours. After the reaction was completed, the temperature was lowered to room temperature, and 100 g of acetone was added thereto and stirred. The resulting solid compound was filtered through a filter, washed with acetone, and dried to synthesize a porphyrin intermediate (23 g, 20%).

(2) The porphyrin intermediate (23 g, 17.6 mmol), DMF 140 g, and copper acetate (6.4 g, 35.3 mmol) were put in a round bottom flask, stirred at 100 ° C. for 5 hours, and the reaction was terminated. After lowering the temperature, 700 g of methanol was added thereto and stirred. The resulting solid compound was filtered through a filter, washed with methanol, and dried to obtain a porphyrin-based dye (18 g, 75%). ([M+H] ⁺ 1366)

(3) The above porphyrin-based dye (18g, 13.2 mmol), tetrachloroethane 360mL and NCS (N-chlorosuccinimide, 11.4g, 85.7 mmol) were put in a round bottom flask and stirred at 100°C for 4 hours, followed by reaction. terminate After lowering the temperature, 1600 mL of methanol was added thereto and stirred. The resulting solid compound was filtered through a filter, washed with methanol, and dried to synthesize a compound represented by Formula 1-1 (15 g, 80%).

[Formula 1-1]

[M+H] ⁺ 1573, λ _max = 429 nm

Synthesis Example 2: Synthesis of Compound Represented by Chemical Formula 1-2

(reaction formula)

The porphyrin-based dye (16 g, 11.7 mmol) obtained in (2) of Synthesis Example 1 was put into a round bottom flask, and 320 mL of tetrachloroethane and NCS (N-chlorosuccinimide, 8.6 g, 64.5 mmol) were added and heated to 100 ° C. After stirring for 4 hours, the reaction was terminated. After lowering the temperature, 1200 mL of methanol was added thereto and stirred. The resulting solid compound was filtered through a filter, washed with methanol, and dried to synthesize a compound represented by Formula 1-2 (13g, 75%).

[Formula 1-2]

[M+H] ⁺ 1504, λ _max = 426 nm

Synthesis Example 3: Synthesis of a compound represented by Formula 1-3

(reaction formula)

The porphyrin-based dye (15 g, 11.0 mmol) obtained in (2) of Synthesis Example 1 was put into a round bottom flask, and 300 mL of tetrachloroethane and NCS (N-chlorosuccinimide, 3.7 g, 27.5 mmol) were added and heated to 100 ° C. After stirring for 4 hours, the reaction was terminated. After lowering the temperature, 1000 mL of methanol was added thereto and stirred. The resulting solid compound was filtered through a filter, washed with methanol, and dried to synthesize a compound represented by Formula 1-3 (12g, 75%).

[Formula 1-3]

[M+H] ⁺ 1435, λ _max = 424 nm

Synthesis Example 4: Synthesis of a compound represented by Formula 1-4

A compound represented by Formula 1-4 was synthesized in the same manner as in Synthesis Example 1, except that 3,4-dibutoxybenzaldehyde was used instead of 3,4-bis(1-methylbutoxy)benzaldehyde.

[Formula 1-4]

[M+H] ⁺ 1460, λ _max = 429 nm

Synthesis Example 5: Synthesis of Compounds Represented by Chemical Formulas 1-5

A compound represented by Formula 1-5 was synthesized in the same manner as in Synthesis Example 2, except that 3,4-dibutoxybenzaldehyde was used instead of 3,4-bis(1-methylbutoxy)benzaldehyde.

[Formula 1-5]

[M+H] ⁺ 1391, λ _max = 426 nm

Synthesis Example 6: Synthesis of Compounds Represented by Chemical Formulas 1-6

A compound represented by Formula 1-6 was synthesized in the same manner as in Synthesis Example 3, except that 3,4-dibutoxybenzaldehyde was used instead of 3,4-bis(1-methylbutoxy)benzaldehyde.

[Formula 1-6]

[M+H] ⁺ 1323, λ _max = 424 nm

Synthesis Example 7: Synthesis of Compounds Represented by Chemical Formulas 1-7

A compound represented by Formula 1-7 was synthesized in the same manner as in Synthesis Example 1, except that 3,4-diisopentyloxybenzaldehyde was used instead of 3,4-bis(1-methylbutoxy)benzaldehyde.

[Formula 1-7]

[M+H] ⁺ 1573, λ _max = 429 nm

Synthesis Example 8: Synthesis of Compounds Represented by Chemical Formulas 1-8

A compound represented by Formula 1-8 was synthesized in the same manner as in Synthesis Example 2, except that 3,4-diisopentyloxybenzaldehyde was used instead of 3,4-bis(1-methylbutoxy)benzaldehyde.

[Formula 1-8]

[M+H] ⁺ 1504, λ _max = 426 nm

Synthesis Example 9: Synthesis of Compounds Represented by Chemical Formulas 1-9

A compound represented by Formula 1-9 was synthesized in the same manner as in Synthesis Example 3, except that 3,4-diisopentyloxybenzaldehyde was used instead of 3,4-bis(1-methylbutoxy)benzaldehyde.

[Formula 1-9]

[M+H] ⁺ 1435, λ _max = 424 nm

Synthesis Example 10: Synthesis of Compound Represented by Chemical Formula 2-1-1

(Scheme 1)

2,4-Dimethylpyrrole (10 g, 105 mmol), Benzaldehyde (2.79 g, 26.28 mmol) and 500 ml of dichloromethane (DCM) were added to a 2L round bottom flask and stirred at room temperature for 30 minutes. After adding 0.2 ml of trifluoroacetic acid dropwise, the mixture was stirred at room temperature for 16 hours. A solution of 2,3-Dichloro-5,6-dicyano-1,4-benzoquinone (DDQ) (5.94 g, 26.28 mmol) in 50 ml of Toluene was added dropwise, followed by additional stirring for 4 hours. After removing the solvent, a mixed solution of Ethylacetate/Hexane/TEA (20%/80%/0.2%) was purified using column chromatography and then dried. (Yield 40%, 3 g)

(Scheme 2)

The product of Scheme 1 (3 g, 11 mmol), toluene 300ml and triethynamine (4.6 ml, 33 mmol) were sequentially added to a 2L round bottom flask and stirred. After adding 6.7ml (55 mol) of BF ₃ Et ₂ O, the mixture was stirred at 100°C for 4 hours. After removing the solvent, a mixed solution of Methylene Chloride/Hexane/TEA (80%/20%/0.2%) was used for purification using column chromatography, followed by drying. (Yield 85%, 3 g)

(Scheme 3)

The product of Scheme 2 (3 g, 9.25 mmol) and 300 ml of Methylene Chloride (MC) were added to a 2L round bottom flask and stirred. Aluminum chloride (3.1 g, 23 mmol) was added and stirred for 5 minutes. A solution of Catechol (4.1 g, 37 mmol) dissolved in 30 ml of acetonitrile was added to the reactant and stirred at room temperature for 30 minutes. After washing the reactant with water, the solvent was removed, and methanol was added and stirred. The precipitated solid is filtered and dried to obtain a compound. (Yield 50%, 1.82 g)

(Scheme 4)

(1) The compound obtained in Scheme 3 (1 g, 2.54 mmol), methylene chloride (MC) (20 ml) and NBS (N-bromosuccinimide, 0.90 g, 5.07 mmol) were sequentially added to a round flask, Stir at room temperature for 1 hour. The reaction product obtained after stirring was purified using column chromatography and then dried to synthesize an intermediate 1.37 g (yield: 98%).

(2) In a round flask, the intermediate (1 g, 1.81 mmol), zinc cyanide (0.47 g, 4.0 mmol), palladium acetate (0.02 g, 0.09 mmol), tritertbutylphosphine (0.035 g, 0.36 mmol), Potassium carbonate (0.75 g, 5.43 mmol) and toluene (20 ml) were sequentially added. The mixture was stirred at 100 ° C. for 24 hours, cooled to room temperature, purified using column chromatography, and then dried to synthesize 0.38 g (yield: 47%) of a compound represented by Formula 2-1-1.

[Formula 2-1-1]

[M+H] ⁺ 444.3, λ _max = 504 nm

Synthesis Example 11: Synthesis of Compound Represented by Chemical Formula 4-1

(1) In a 500ml round bottom flask, chlorosulfonic acid (35 g) was added and cooled to less than 30 °C while stirring. 5 g of CuPC (Copper (II) phthalocyanine) was added slowly at 50 ° C or lower and stirred for 3 hours at a reaction temperature of 90 ° C. it was added After the addition was completed, the reactant was stirred for 1 hour at 95 ° C., cooled to room temperature, neutralized with 300 mL of water at 10 ° C. or lower, and washed several times with water.

(2) The filtered solid formation was placed in a flask, and 100 mL of water was added, stirred, and cooled to 10°C. After slowly adding cyclohexylamine (3.4 g) dropwise, the mixture was stirred for 1 hour, and the reaction temperature was raised to 65 °C and reacted for 6 hours. The reactants were filtered and washed, and the resulting solid compound was dried to synthesize a compound (53 g) represented by Formula 4-1 below.

[Formula 4-1]

Comparative Synthesis Example 1: Synthesis of Compound Represented by Formula C-1

A compound represented by Formula C-1 was synthesized in the same manner as in Synthesis Example 1 except that 4-(2-ethylhexoxy)benzaldehyde was used instead of 3,4-bis(1-methylbutoxy)benzaldehyde.

[Formula C-1]

[M+H] ⁺ 1190, λ _max = 419 nm

Comparative Synthesis Example 2: Synthesis of Compound Represented by Formula C-2

A compound represented by Formula C-2 was synthesized in the same manner as in Synthesis Example 3, except that 4-(2-ethylhexoxy)benzaldehyde was used instead of 3,4-bis(1-methylbutoxy)benzaldehyde.

[Formula C-2]

[M+H] ⁺ 1259, λ _max = 421 nm

(Evaluation 1: Solubility)

In addition, by measuring the maximum dissolvable weight of each compound based on 10 g of methyl ethyl ketone and calculating the weight of the compound as a percentage of the total weight, Synthesis Example 1 to Synthesis Example 9 for methyl ethyl ketone, comparative synthesis The solubilities of the compounds of Example 1 and Comparative Synthesis Example 2 were measured and are shown in Table 1 below.

Solubility (%) Synthesis Example 1 5.1% Synthesis Example 2 7.4% Synthesis Example 3 11.0% Synthesis Example 4 2.5% Synthesis Example 5 3.5% Synthesis Example 6 4.0% Synthesis Example 7 3.4% Synthesis Example 8 4.3% Synthesis Example 9 5.2% Comparative Synthesis Example 1 2.0% Comparative Synthesis Example 2 0.8%

From Table 1, it can be seen that the compounds according to Synthesis Examples 1 to 9 have better solubility than the compounds according to Comparative Synthesis Examples 1 to 2.

(Manufacture of anti-reflection film)

Example 1, Example 2, Comparative Example 1 and Comparative Example 2

A composition for an antireflection film was prepared by mixing 20 parts by weight of a styrene acrylonitrile (SAN, Lotte Chemical) resin as a non-curing resin, 0.643 parts by weight of a mixed dye, and 27 parts by weight of methyl ethyl ketone and 54 parts by weight of toluene as a solvent. The composition of the mixed dye and the transmittance at 550 nm according to the composition are shown in Table 2 below.

(unit: parts by weight)
Mixed dye usage
(First dye / Second dye / Third dye / Fourth dye) Transmittance @550nm Example 1 0.4/0.160/0.155/0.150 90.9% Example 2 0.6/0.160/0.155/0.150 88.7% Comparative Example 1 0.178/0.160/0.155/0.150 94.7% Comparative Example 2 0.183/0.168/0.163/0.158 93.3%

(first dye)

Dye of Synthesis Example 5

(second dye)

Dye of Synthesis Example 10

(third dye)

KIS001 (Tetraazaporphyrin type, maximum absorption wavelength 594nm, Kyungin Corporation)

(Fourth dye)

Dye of Synthesis Example 11

(Evaluation 2: transmittance)

Looking at the transmittance at 550 nm of the compositions according to Example 1, Example 2, Comparative Example 1 and Comparative Example 2, in the case of Example 1 and Example 2, compared to Comparative Example 1 and Comparative Example 2, the first dye It can be seen that the transmittance decreased due to the increase in light absorption at 550 nm due to the increase in the amount used, and from this, the compositions according to Examples 1 and 2 had improved reflectance compared to the compositions according to Comparative Examples 1 and 2. can be inferred.

(Evaluation 3: reflectance and light fastness reliability)

In order to check whether the light resistance reliability of the panel film to which quantum dots are applied is improved, after manufacturing an optical member (manufactured by laminating the anti-reflection film on the other side of glass having a quantum dot-containing layer on one side), Xenon is applied to the optical member. Irradiation in the Test Chamber (Q-SUN) under the conditions of [Light source lamp: Xenon lamp, Irradiation intensity: 0.35W/cm ² , Irradiation temperature: 63℃, Irradiation time: 500 hours, Irradiation direction: Irradiation from the antireflection film side] After measuring the light transmittance at the maximum absorption wavelength of each compound before and after irradiation, light resistance reliability was evaluated by the amount of change in light transmittance, and the results are shown in Table 3 below. The light transmittance change amount is the absolute value of the difference between the transmittance before irradiation and the transmittance after irradiation.

In addition, in order to check whether the reflectance is improved, specimens were prepared by placing the optical members prepared in Examples and Comparative Examples on black sheet paper (Hyundai Sheet Co.) and laminating using a laminator at 50 ° C. For the manufactured specimen, the scattering reflectance was measured in the wavelength range of 380 nm to 780 nm in the reflection mode and SCE mode using a UV/VIS spectrometer Lambda 1050 (Perkin Elmer Co.), and the reflectance, which is the average value, was compared with the initial value to determine whether the reflectance was improved. did

Reflectance drop (%) Light fastness reliability (ΔT%) Example 1 -0.18 0.3 Example 2 -0.20 0.1 Comparative Example 1 -0.15 4.7 Comparative Example 2 -0.15 3.1

From Table 2, it can be seen that the reflectance and light resistance reliability of Examples 1 and 2 were improved compared to Comparative Examples 1 and 2. That is, it can be expected that the antireflection film and the display device containing the quantum dots to which the mixed dye according to the embodiment effectively absorbs a short wavelength region of a blue light source, thereby improving the color gamut of the panel.

The present invention is not limited to the above embodiments, but can be manufactured in a variety of different forms, and those skilled in the art to which the present invention pertains may take other specific forms without changing the technical spirit or essential features of the present invention. It will be understood that it can be implemented as. Therefore, the embodiments described above should be understood as illustrative in all respects and not limiting.

1 base film
2 anti-reflection film
3 protective film
4 hard coat layer
5 high refractive index layer
6 low refractive index layer
7 pressure sensitive adhesive
8 adhesive layer
10 optical element

Claims (24)

Including a compound represented by Formula 1 below and another compound having a structure different from that of the compound,
A dye in which the content of the compound represented by Formula 1 is at least twice the content of other compounds having a structure different from that of the compound represented by Formula 1:
[Formula 1]

In Formula 1,
M is two hydrogen atoms, a divalent metal atom, a trivalent substituted metal atom, a tetravalent substituted metal atom, a metal hydroxide atom, or a metal oxide atom;
R ¹ to R ⁸ are each independently a hydrogen atom, a halogen atom, a cyano group, a carbonyl group or a nitro group, provided that at least one of R ¹ to R ⁸ is a halogen atom, a cyano group, a carbonyl group or a nitro group,
R ⁹ to R ²⁸ are each independently a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group ), a substituted or unsubstituted C3 to C20 cycloalkyl group or a substituted or unsubstituted C6 to C20 aryl group, provided that at least two or more of R ⁹ to R ¹³ are necessarily substituted or unsubstituted C1 to C20 alkoxy groups.
According to claim 1,
At least one or more of R ¹ and R ² and at least one or more of R ⁵ and R ⁶ are each independently a halogen atom, a cyano group, a carbonyl group, or a nitro group.
According to claim 1,
At least one or more of R ¹ and R ² , at least one or more of R ³ and R ⁴ , at least one or more of R ⁵ and R ⁶ , and at least one or more of R ⁷ and R ⁸ are each independently a halogen atom, a cyano group, A dye that is a carbonyl group or a nitro group.
According to claim 1,
Wherein M is Cu, Co, Zn, V (= O) or Ag.
According to claim 1,
Wherein R ⁹ to R ²⁸ are each independently a C1 to C20 alkyl group substituted with a halogen atom, a substituted or unsubstituted C1 to C20 alkoxy group, *-C(=O)OR (R is a substituted or unsubstituted C1 to C15 alkyl group) i) phosphorus dyes.
According to claim 1,
Wherein at least two or more of R ⁹ to R ¹³ and at least two or more of R ¹⁴ to R ¹⁸ are each independently a substituted or unsubstituted C1 to C20 alkoxy group.
According to claim 1,
At least two or more of R ⁹ to R ¹³ , at least two or more of R ¹⁴ to R ¹⁸ , and at least two or more of R ¹⁹ to R ²³ are each independently a substituted or unsubstituted C1 to C20 alkoxy group.
According to claim 1,
At least two or more of R ⁹ to R ¹³ , at least two or more of R ¹⁴ to R ¹⁸ , at least two or more of R ¹⁹ to R ²³ and at least two or more of R ²⁴ to R ²⁸ are independently substituted or unsubstituted C1 to C20 alkoxy groups.
According to claim 1,
Chemical Formula 1 is a dye represented by any one of the following Chemical Formulas 1-1 to 1-9.
[Formula 1-1]

[Formula 1-2]

[Formula 1-3]

[Formula 1-4]

[Formula 1-5]

[Formula 1-6]

[Formula 1-7]

[Formula 1-8]

[Formula 1-9]

According to claim 1,
The compound represented by Formula 1 exhibits absorption wavelengths at 350 nm to 480 nm and 500 nm to 550 nm, and has a maximum absorption wavelength at 420 nm to 435 nm among the absorption wavelengths.
According to claim 1,
The dye has a maximum absorption wavelength at 540 nm to 550 nm.
According to claim 1,
Another compound having a different structure from the compound represented by Formula 1 is a dye containing at least one selected from the group consisting of Formula 2, Formula 3 and Formula 4 below:
[Formula 2]

[Formula 3]

[Formula 4]

In Formulas 2 to 4,
R ³² , R ³⁴ , R ³⁵ and R ³⁷ are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group;
R ³³ and R ³⁶ are each independently a hydrogen atom or a cyano group, but at least one of R ² and R ⁵ is necessarily a cyano group;
X is a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group,
L is a divalent ligand,
R ³⁸ to R ⁴⁵ are each independently a hydrogen atom, a halogen atom, a cyano group, a carboxyl group, a hydroxy group, a mercapto group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted substituted or unsubstituted C2 to C20 alkenyl group, substituted or unsubstituted C3 to C20 cycloalkenyl group, substituted or unsubstituted C2 to C20 alkynyl group, substituted or unsubstituted C1 to C20 alkoxy group, substituted or unsubstituted C1 to C20 alkyl A thio group, a substituted or unsubstituted C6 to C20 aryl group, a substituted or unsubstituted C6 to C20 aryloxy group, or a substituted or unsubstituted C2 to C20 heterocycloalkyl group,
R ⁴⁶ to R ⁶¹ are each independently a hydrogen atom, a halogen atom, a substituted or unsubstituted C1 to C20 alkoxy group or a substituted or unsubstituted C6 to C20 aryloxy group;
M is two hydrogen atoms, a divalent metal atom, a trivalent substituted metal atom, a tetravalent substituted metal atom, a metal hydroxide atom, or a metal oxide atom.
According to claim 1,
The content of the compound represented by Formula 1 is at least twice the content of the compound represented by Formula 2,
The content of the compound represented by Formula 1 is at least twice the content of the compound represented by Formula 3,
The amount of the compound represented by Formula 1 is twice or more than the amount of the compound represented by Formula 4.
A composition comprising a dye according to claim 1 .
According to claim 14,
The composition further comprises a non-curable resin, a pressure sensitive adhesive or a combination thereof.
A film prepared using the composition according to claim 14 .
base film;
The film according to claim 16 located on the base film;
A protective film positioned on the film according to claim 16; and
Hard coat layer located on the protective film
An optical member comprising a.
According to claim 17,
An optical member in which the film according to claim 16 includes a pressure-sensitive adhesive.
According to claim 17,
The optical member further comprises a high refractive index layer positioned on the hard coat layer and a low refractive index layer positioned on the high refractive index layer.
base film;
an adhesive layer positioned on the base film;
a film according to claim 16 located on the adhesive layer;
A protective film positioned on the film according to claim 16; and
Hard coat layer located on the protective film
An optical member comprising a.
According to claim 20,
An optical member wherein the film according to claim 16 does not contain a pressure-sensitive adhesive.
According to claim 20,
The optical member further comprises a high refractive index layer positioned on the hard coat layer and a low refractive index layer positioned on the high refractive index layer.
A display device comprising the optical member according to claim 17 or the optical member according to claim 20 .
According to claim 23,
The display device further comprises a quantum dot-containing layer on the lower surface of the optical member.

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