TWI812299B - Compound and composition, antireflection film, and display device comprising the same - Google Patents

Abstract

Provided are a compound represented by Chemical Formula 1, a composition including the same, an antireflection film including the same, and a display device including the antireflection film. In Chemical Formula 1, each substituent is as defined in the specification.

Description

Compounds and compositions thereof, anti-reflective films and display devices

The present disclosure relates to a compound, a composition including the same, an anti-reflective film including the same, and a display device including the anti-reflective film. Cross-references to related applications

This application claims priority and rights to Korean Patent Application No. 10-2021-0081130 filed with the Korean Intellectual Property Office on June 22, 2021. The entire content of the Korean patent application is incorporated into this application for reference.

In a typical liquid crystal display (LCD), light emitted from a white light source passes through the RGB color filter of each pixel to form sub-pixels of each color, and these sub-pixels can be processed by Combined to produce colors in the RGB range.

In recent years, new displays using light emitters such as quantum dots and organic-inorganic phosphors that emit a color for each sub-pixel are being developed. A method of using an ultraviolet (UV) light source and a method of using a blue light source have been proposed as methods of exciting these blue light sources, green light sources, and red light sources.

When using a UV light source, each color is produced and implemented by a blue emitter, a green emitter, and a red emitter, but when a blue light source is used, green and red are colors produced by the emitters respectively, while blue paints The element transmits the light source unchanged.

In the case of display materials including quantum dots that have recently been commercialized or are under development, light emission of green quantum dots and red quantum dots through a blue light source or a white light source is used. Display devices containing quantum dots aim to improve color reproducibility and brightness by using quantum dot materials, and panels using quantum dots to emit light using various types of light sources have been continuously developed. Additionally, viewing angles can be improved depending on the position of the quantum dot material in the panel configuration. In order to improve the luminous efficiency of quantum dots, next-generation quantum dot display devices are being developed in terms of increasing the intensity of the light source or in terms of developing a light source with an extended blue region.

In quantum dot display devices, the spectrum of the light source reaching the quantum dot material has a very close impact on the efficiency of the quantum dots. Since the characteristics of each light source vary depending on the type of light source, efforts continue in various fields to introduce new ways to improve the efficiency of each light source.

On the other hand, in the case of new displays using light emitters, it is necessary to reduce the reflectivity of external light or adjust the panel color caused by scattered reflection. To solve this problem, attempts have been made to use dyes in the optical components that make up the panels. When quantum dots are used as light emitters, it is difficult to reduce the reflectivity of external light or adjust the panel color.

Therefore, in the case of new displays, antireflection films that improve brightness loss or color correction are being introduced, and recently, attempts have been made to additionally apply cyanine-based dyes or azo-based dyes as dyes capable of absorbing light of specific wavelengths to maximize Low reflective properties of anti-reflective coating.

However, cyanine-based dyes or azo-based dyes can absorb light in a short wavelength region, but have a problem of reducing light resistance reliability, and it is therefore difficult to apply them to antireflection films.

The embodiment provides a compound capable of absorbing light in the long blue wavelength region and the short green wavelength region of a light source.

Another embodiment provides a composition including the compound.

Another embodiment provides an antireflective film including the compound.

Another embodiment provides a display device including the anti-reflection film.

Examples provide compounds represented by Chemical Formula 1. [Chemical formula 1]

In Chemical Formula 1, R ¹ and R ² are each independently a substituted or unsubstituted C1 to C20 alkyl group, and R ³ to R ⁶ are each independently a hydrogen atom, halogen, cyano group, ester group (*-C (=O)OR', where R' is substituted or unsubstituted C1 to C15 alkyl) or amide group (*-C(=O)NR''R''', where R'' and R ''' is each independently a hydrogen atom or a substituted or unsubstituted C1 to C15 alkyl group), R ⁷ to R ¹⁴ are each independently a hydroxyl group, a substituted or unsubstituted C1 to C20 alkyl group, a substituted Or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C6 to C20 aryl, or substituted or unsubstituted C2 to C20 hetero Cycloalkyl, M is Zn, Ag, Ti, Pt, Co, Fe, Ni or Pd, and n1 and n2 are each independently an integer from 1 to 5.

In Chemical Formula 1, R ¹ and R ² may each independently be a halogen-substituted C1 to C20 alkyl group.

Chemical Formula 1 can be represented by Chemical Formula 1-1. [Chemical formula 1-1]

In Chemical Formula 1-1, R ¹ and R ² are each independently a substituted or unsubstituted C1 to C20 alkyl group, and R ³ to R ⁶ are each independently a hydrogen atom, halogen, cyano group, ester group (* -C(=O)OR', where R' is substituted or unsubstituted C1 to C15 alkyl) or amide group (*-C(=O)NR''R''', where R'' and R'''' are each independently a hydrogen atom or a substituted or unsubstituted C1 to C15 alkyl group), R ⁷ to R ¹⁴ are each independently a hydroxyl group, a substituted or unsubstituted C1 to C20 alkyl group, Substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C6 to C20 aryl, or substituted or unsubstituted C2 to C20 heterocycloalkyl, and M is Zn, Ag, Ti, Pt, Co, Fe, Ni or Pd.

In Chemical Formula 1, R ³ to R ⁶ can each independently be halogen, cyano group, ester group (*-C(=O)OR', where R' is a substituted or unsubstituted C1 to C15 alkyl group) Or amide group (*-C(=O)NR''R''', where R'' and R''' are each independently a hydrogen atom or a substituted or unsubstituted C1 to C15 alkyl group).

In Chemical Formula 1, R ³ to R ⁶ may each independently be halogen.

In Chemical Formula 1, R ⁷ to R ¹⁴ may each independently be a substituted or unsubstituted C1 to C20 alkyl group.

The compound may be represented by any one selected from Chemical Formula 1-1-1 to Chemical Formula 1-1-3. [Chemical formula 1-1-1] [Chemical formula 1-1-2] [Chemical formula 1-1-3]

The compound represented by Chemical Formula 1 may exhibit an absorption wavelength at 400 nm to 520 nm, and may have a maximum absorption wavelength at an absorption wavelength of 480 nm to 520 nm.

The compound may be a dye.

Another embodiment provides a composition including the compound represented by Chemical Formula 1.

Another embodiment provides an anti-reflective film including the compound represented by Chemical Formula 1.

The anti-reflective film includes an adhesive layer and an anti-reflective layer located on the adhesive layer, and the compound represented by Chemical Formula 1 may be included in the adhesive layer.

The anti-reflective film includes an adhesive layer, a dye-containing layer and an anti-reflective layer located on the dye-containing layer, and the compound represented by Chemical Formula 1 may be included in the dye-containing layer.

Another embodiment provides a display device including the anti-reflective film.

The display device may further include a quantum dot-containing layer.

The display device may further include a light source, a color filter and a substrate.

In the display device, the quantum dot-containing layer may be provided on the light source, the color filter may be provided on the quantum dot-containing layer, the substrate may be provided on the color filter, and the anti-reflection film may be provided on the substrate.

The light source may be a white light source or a blue light source.

The substrate may include a glass substrate.

Other embodiments of the invention are included in the following detailed description.

By using a compound that has absorption in the blue long wavelength region and the green short wavelength region (400 nm to 520 nm) and has a maximum absorption wavelength of 480 nm to 520 nm, and more specifically 490 nm to 510 nm, the solubility It can be improved, there is no fluorescence, and the light resistance reliability can be improved by reducing the reflectivity of the display device to external light, and the brightness loss and color reproducibility can also be improved.

Embodiments of the invention are explained in detail below. However, these embodiments are illustrative and the present invention is not limited thereto, and the present invention is defined by the scope of the patent application.

As used herein, when no specific definition is otherwise provided, "alkyl" refers to C1 to C20 alkyl, "alkenyl" refers to C2 to C20 alkenyl, and "cycloalkenyl" refers to C3 to C20 cycloalkenyl. , "Heterocycloalkenyl" refers to C3 to C20 heterocyclic alkenyl, "aryl" refers to C6 to C20 aryl, "arylalkyl" refers to C6 to C20 arylalkyl, "alkylene" refers to C1 to C20 alkylene group, "arylene group" refers to C6 to C20 aryl group, "alkyl aryl group" refers to C6 to C20 alkyl aryl group, and "heteroaryl group" refers to C3 to C20 heteroaryl, and "alkoxy" refers to C1 to C20 alkoxy.

As used herein, when no specific definition is otherwise provided, "substituted" means that at least one hydrogen is replaced by the following substituents: halogen atom (F, Cl, Br, I), hydroxyl, C1 to C20 alkoxy, nitro group, cyano group, amino group, imino group, azido group, amidino group, hydrazine group, hydrazone group, carbonyl group, carbamate group, thiol group, ester group, ether group, carboxyl group or its salt, sulfonic acid group or its salt Salt, phosphoric acid or its salt, C1 to C20 alkyl, C2 to C20 alkenyl, C2 to C20 alkynyl, C6 to C20 aryl, C3 to C20 cycloalkyl, C3 to C20 cycloalkenyl, C3 to C20 cycloalkyne base, C2 to C20 heterocycloalkyl, C2 to C20 heterocycloalkenyl, C2 to C20 heterocycloalkynyl, C3 to C20 heteroaryl or combinations thereof.

As used herein, when no specific definition is otherwise provided, "hetero" means including at least one heteroatom of N, O, S, or P in the chemical formula.

As used herein, when no specific definition is otherwise provided, "(meth)acrylate" refers to both "acrylate" and "methacrylate" and "(meth)acrylic" refers to "acrylic" and "methacrylic acid".

As used herein, when no specific definition is otherwise provided, the term "combination" refers to mixing or copolymerization.

As used herein, unless a specific definition is provided otherwise, when a chemical bond is not drawn where it should be given, a hydrogen atom is bonded at the stated position.

When describing a numerical range in this specification, "X to Y" means "greater than or equal to X and less than or equal to Y" (X ≤ and ≤ Y).

In descriptions in this specification that are not numerical ranges, "X to Y" means "from X to Y."

In this specification, the "maximum absorption wavelength (λ _max )" of a compound (dye) refers to the absorbance of a solution of a compound (dye) in cyclohexanone with a concentration of 10 parts per million (10 ppm) measured The wavelength at which maximum absorbance occurs. Maximum absorbance can be determined according to methods known to those skilled in the art.

"Lightfastness reliability" as used in this article is evaluated by changes in light transmittance. The light transmittance of the display device is measured in a xenon test chamber (Q-SUN) [light source lamp: xenon lamp, irradiation intensity: 0.35 watts/square centimeter (W/cm ² ), irradiation temperature: 63°C, irradiation time: 500 hours, and irradiation direction: irradiation from the anti-reflection film side] measured at the maximum absorption wavelength of the dye before and after irradiation.

Additionally, as used herein, "*" means a moiety attached to the same or different atoms or chemical formulas, unless specific definition is provided otherwise.

According to the embodiment, a compound represented by Chemical Formula 1 is provided. [Chemical formula 1]

In Chemical Formula 1, R ¹ and R ² are each independently a substituted or unsubstituted C1 to C20 alkyl group,

R ³ to R ⁶ are each independently a hydrogen atom, halogen, cyano group, ester group (*-C(=O)OR', where R' is a substituted or unsubstituted C1 to C15 alkyl group) or amide group (*-C(=O)NR''R''', where R'' and R''' are each independently a hydrogen atom or a substituted or unsubstituted C1 to C15 alkyl group), R ⁷ to R ¹⁴ is each independently hydroxyl, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C1 to C20 alkoxy, Substituted or unsubstituted C6 to C20 aryl or substituted or unsubstituted C2 to C20 heterocycloalkyl, M is Zn, Ag, Ti, Pt, Co, Fe, Ni or Pd, and n1 and n2 are each Independently an integer from 1 to 5.

Traditionally, although attempts have been made to improve the color purity of display devices by using specific compounds to absorb fluorescent colors to block specific wavelength regions of the light source, display devices including quantum dots have a different purpose due to the use of scatterers. Display devices containing quantum dots can reduce reflectivity to improve reflection of external light caused by scatterers, which helps improve black visibility of the device. To reduce reflectivity and minimize the decrease in RGB color purity of the panel, it is effective to use an anti-reflective film that absorbs dyes that can absorb mixed colors (violet/cyan/fluorescent/near-infrared ray (IR)). Specifically, absorbing external light of cyan color with an absorption wavelength range of 480 nm to 520 nm and fluorescent color with an absorption wavelength range of 530 nm to 670 nm is effective in reducing reflectivity. However, in the case of using only dyes that absorb only cyan and fluorescent colors, it is difficult to implement neutral black in a display device. Therefore, violet, which has an absorption wavelength range of 350 nm to 450 nm, and near-infrared (red) color, which has an absorption wavelength range of 605 nm to 790 nm, are used. By using mixtures of absorbing dyes, it is possible to achieve color correction of antireflective films and display devices. By using dyes that absorb mixed colors (violet/cyan/fluorescent/near-infrared), reflectivity can be reduced, black visibility can be improved, and color reproducibility can be increased. In addition, the compound represented by Chemical Formula 1 can improve light resistance reliability, which is one of the shortcomings of conventional compounds (dyes) that absorb a specific wavelength range. That is, when the compound represented by Chemical Formula 1 according to the embodiment is applied to an antireflection film, the reliability of the light resistance of the film can be ensured. Specifically, in display devices using quantum dot emitters, attempts to improve color reproducibility by using specific compounds to absorb mixed colors have not been known until now. For example, in the case of cyan color, the absorption wavelength range is 480 nm to 520 nm, in the case of fluorescent color, the absorption wavelength range is 530 nm to 670 nm, and in the case of near-infrared color, the absorption wavelength range is 605 nm to 790 nm. However, since the compound represented by Chemical Formula 1 according to the embodiment exhibits an absorption wavelength at 400 nm to 520 nm, and can be detected at 480 nm to 520 nm of the absorption wavelength, specifically 490 nm to 520 nm, and More specifically, there is a maximum absorption wavelength at 490 nm to 515 nm, and further specifically 500 nm to 510 nm, so in the case of an antireflection film and a display device including the compound represented by Chemical Formula 1 as a dye, it can be easily to ensure lightfastness reliability while minimizing deterioration in blue brightness.

As will be described later, when considering the spectrum of a light source applied to a display device, it is necessary to effectively absorb the blue long-wavelength region and the green short-wavelength region (480 nm to 520 nm) of the light source so that the color of the panel can be effectively improved. Reproducibility. For example, when the maximum absorption wavelength of the compound applied to the antireflective film is shorter than 500 nm or longer than 520 nm and at the same time the full width at half maximum (FWHM) is wider than 100 nm, and specifically wider than At 50 nm, the blue long-wavelength region and the green short-wavelength region cannot be effectively absorbed, so it is difficult to achieve the effect of improving the color reproducibility of the panel. Therefore, when the maximum absorption wavelength of the compound applied to the antireflection film occurs between 480 nm and 520 nm, specifically between 490 nm and 520 nm, the blue long wavelength region and the green short wavelength region can be effectively ground absorption. The compound represented by Chemical Formula 1 according to the embodiment has a maximum absorption wavelength at 480 nm to 520 nm, and more specifically at 490 nm to 510 nm due to its structural specificity, and therefore can effectively absorb blue long wavelengths area and green short-wavelength area, and can ensure the reliability of light resistance and effectively improve the color reproducibility of the panel.

In Chemical Formula 1, M is Zn, Ag, Ti, Pt, Co, Fe, Ni, or Pd, and M does not include metals such as Cu, for example. In Chemical Formula 1, when M is Cu, it is not preferable since the half-maximum width is wide and it is difficult to control the spectral consistency.

In Chemical Formula 1, R ¹ and R ² may each independently be a C1 to C20 alkyl group substituted by halogen (fluoro group, chlorine group, bromo group or iodide group). For example, R ¹ and R ² may each independently be a C1 to C20 alkyl group substituted with a fluoro group (eg, trifluoro group). In Chemical Formula 1, when R ¹ and R ² are alkyl groups substituted by electron withdrawing groups (EWG) (for example, fluorine groups), the spectral consistency can be easily controlled.

For example, Chemical Formula 1 can be represented by Chemical Formula 1-1, but is not necessarily limited to this. [Chemical formula 1-1]

In chemical formula 1-1,

R ¹ and R ² are each independently substituted or unsubstituted C1 to C20 alkyl,

R ³ to R ⁶ are each independently a hydrogen atom, halogen, cyano group, ester group (*-C(=O)OR', where R' is a substituted or unsubstituted C1 to C15 alkyl group) or amide group (*-C(=O)NR''R''', where R'' and R''' are each independently a hydrogen atom or a substituted or unsubstituted C1 to C15 alkyl group),

R ⁷ to R ¹⁴ are each independently hydroxyl, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C6 to C20 aryl group or a substituted or unsubstituted C2 to C20 heterocycloalkyl group, and

M is Zn, Ag, Ti, Pt, Co, Fe, Ni or Pd.

On the other hand, by limiting the types of R ¹ and R ² , the spectral consistency of the compound can be easily controlled, and ultimately, the light transmission of the display product can be controlled to improve color purity.

For example, in Chemical Formula 1, R ³ to R ⁶ can each independently be halogen, cyano group, ester group (*-C(=O)OR', wherein R' is substituted or unsubstituted C1 to C15 alkyl) or amide group (*-C(=O)NR''R''', where R'' and R''' are each independently a hydrogen atom or substituted or unsubstituted C1 to C15 alkyl).

In Chemical Formula 1, when R ³ to R ⁶ are not necessarily the above substituents, it is difficult to ensure excellent solubility and light resistance reliability. Specifically, in the case of a display containing quantum dots, excellent solubility and light resistance reliability can be ensured only when an antireflection film containing the compound represented by Chemical Formula 1 is applied. Even if it is a compound used for an antireflection film showing excellent light resistance in conventional LCDs, when it is applied as it is to a display containing quantum dots, the light resistance may be deteriorated.

For example, in Chemical Formula 1, R ³ to R ⁶ may each independently be halogen. When R ³ to ^{R 6 are} all halogen, the maximum ^absorption wavelength is slightly shifted to a longer wavelength and the half-maximum width becomes Slightly wider, but the lightfastness reliability itself could be greatly improved.

For example, in Chemical Formula 1, R ⁷ to R ¹⁴ may each independently be a substituted or unsubstituted C1 to C20 alkyl group.

For example, Chemical Formula 1 may be represented by any one selected from Chemical Formula 1-1-1 to Chemical Formula 1-1-3, but is not necessarily limited thereto. [Chemical formula 1-1-1] [Chemical formula 1-1-2] [Chemical formula 1-1-3]

The compound represented by Chemical Formula 1 may exhibit an absorption wavelength at 400 nm to 520 nm, and may be at 480 nm to 520 nm, specifically 490 nm to 520 nm, among the absorption wavelengths, and more specifically It has maximum absorption wavelength from 490 nm to 515 nm. As described above, when the compound represented by Chemical Formula 1 has the maximum absorption wavelength in the above range, it can effectively absorb the blue long wavelength region and the green short wavelength region, thereby effectively improving the light resistance reliability and the color reproduction of the panel. sex.

For example, the compound represented by Chemical Formula 1 may be a dye.

Another embodiment provides a composition including the compound.

Another embodiment provides an antireflective film including the compound.

The anti-reflection film may include 0.01% to 0.5% by weight of the compound represented by Chemical Formula 1 based on solid content. When the compound represented by Chemical Formula 1 is included within the range, neutral black is effectively improved by adjusting the panel color of the display device to which the antireflection film is applied.

The anti-reflective film includes an adhesive layer and an anti-reflective layer formed on the adhesive layer, and the compound represented by Chemical Formula 1 may be included in the adhesive layer.

In addition, the anti-reflection film includes an adhesive layer, a dye-containing layer, and an anti-reflection layer formed on the dye-containing layer, and the compound represented by Chemical Formula 1 may be included in the dye-containing layer.

That is, in the laminated structure of the antireflection film according to the embodiment, the compound represented by Chemical Formula 1 may be included in the adhesive layer, or may be included in a separate dye-containing layer. (See Figure 1 and Figure 2)

The anti-reflective layer may consist of only a low-refractive layer, or may include a low-refractive layer.

The low refractive layer may reduce the reflectivity of the antireflective film due to the difference in refractive index between the substrate and/or the high refractive layer described later.

The low-refractive layer may include a curable binder resin, a fluorine atom-containing monomer, and fine particles (for example, hollow silica) with an average particle diameter of 5 nm to 300 nm, and the thickness of the low-refractive layer may be 0.01 μm. to 0.15 μm. The refractive index of the low refractive layer may be 1.20 to 1.40.

By further forming a functional coating on one surface of the low-refractive layer (ie, on the upper surface of the low-refractive layer), the anti-reflective film can be given additional functions. Functional coatings may include anti-fingerprint layers, antistatic layers, hard coatings, anti-glitter layers, barrier layers, etc., but are not limited to these.

The anti-reflective layer may further include a high refractive layer.

The high refractive layer is formed between a substrate and a low refractive layer described later, and has a refractive index between the substrate and the low refractive layer, thereby reducing the reflectivity of the antireflection layer. The high refractive layer is formed directly with the base and the low refractive layer respectively. "Directly formed" means that there are no other layers between the layers.

The high refractive layer has a thickness of 0.05 μm to 20 μm, a refractive index of 1.45 to 2, and a haze value specified in JIS-K7361 that is no different from the haze value of the base material or the difference from the haze value of the substrate 10% or less, it has excellent transparency and excellent anti-reflective properties.

The hard coating layer increases the hardness of the anti-reflective layer so that scratches will not occur even if the anti-reflective layer is used on the outermost surface of the display device. Hard coating is not required. If the target hardness is ensured in the high refractive layer or the low refractive layer, the hard coat layer can be omitted.

The hard coat layer may be formed between the substrate and the high refractive layer or between the substrate and the low refractive layer.

The hard coat layer may be a cured layer formed by uniformly mixing ultrafine metal oxide particles with an average particle diameter of 1 nm to 30 nm and a particle size distribution range of less than or equal to ±5 nm in a cured binder. The hard coat layer may have a thickness of 1 μm to 15 μm, and the refractive index of the hard coat layer may be greater than or equal to 1.54.

The anti-reflective layer may have a thickness of 50 μm to 500 μm, such as 50 μm to 300 μm, such as 50 μm to 150 μm. When the thickness of the anti-reflection layer is within the above range, it can be easily applied to a display device.

An adhesive layer may be formed on the lower surface of the anti-reflective layer to adhere optical components such as a display to a panel or the like. As described above, the adhesive layer may include the compound (dye) represented by Chemical Formula 1.

The adhesive layer may have a glass transition temperature of -70°C to 0°C, such as -65°C to -20°C. When the glass transition temperature of the adhesive layer is within the above range, the adhesion to the panel can be improved.

The adhesive layer may be a thermosetting adhesive layer or a light-curing adhesive layer. Preferably, since the adhesive layer becomes a thermosetting adhesive layer, there is no need to consider the influence of ultraviolet rays caused by the absorption wavelength of the compound (dye) represented by Chemical Formula 1, thereby facilitating the production of the adhesive layer. The "thermosetting adhesive layer" may include not only an adhesive layer cured by predetermined heat treatment at 40°C to 100°C, but also an adhesive layer cured at room temperature (for example, 20°C to 30°C).

The adhesive layer may be formed from a composition for the adhesive layer, which composition includes an adhesive resin and a curing agent.

The type of adhesive resin is not limited as long as it can ensure the glass transition temperature of the adhesive layer. For example, the adhesive resin may be a silicone-based resin, a urethane-based resin, a (meth)acrylic resin, or the like, but preferably, a (meth)acrylic adhesive resin may be used.

The binding resin may have a glass transition temperature of -70°C to 0°C, preferably -65°C to -20°C. When the glass transition temperature of the adhesive resin is in the above range, the adhesion to the panel can be improved.

The weight average molecular weight of the binding resin may range from 500,000 g/mol to 2,000,000 g/mol, for example, from 800,000 g/mol to 1,500,000 g/mol. When the weight average molecular weight of the adhesive resin has the above range, the adhesion to the panel can be improved.

The adhesive resin may include a copolymer, preferably a random copolymer of at least one of: a (meth)acrylic monomer having an alkyl group; a (meth)acrylic monomer having a hydroxyl group; and a random copolymer having an aromatic group (meth)acrylic acid monomers, (meth)acrylic acid monomers with alicyclic groups and (meth)acrylic acid monomers with heteroalicyclic groups.

The (meth)acrylic monomer having an alkyl group may include (meth)acrylate having an unsubstituted C1 to C10 alkyl group. Specifically, the (meth)acrylic monomer having an alkyl group may include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, n-butyl (meth)acrylate, Tert-butyl (meth)acrylate, isobutyl (meth)acrylate, amyl (meth)acrylate, hexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, (methyl) One or more of heptyl acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, nonyl (meth)acrylate and decyl (meth)acrylate, but is not limited thereto. These monomers may be included individually or in combination of two or more. The content of (meth)acrylic monomers having alkyl groups may be 60% to 99.99% by weight of the monomer mixture, such as 60% to 90% by weight, such as 80% to 99.9% by weight.

The (meth)acrylic acid monomer having a hydroxyl group may include one or more of the following: a (meth)acrylic acid monomer having a C1 to C20 alkyl group having at least one hydroxyl group, a C3 to C20 alkyl group having at least one hydroxyl group Cycloalkyl (meth)acrylic monomers, and (meth)acrylic monomers having a C6 to C20 aromatic group having at least one hydroxyl group. Specifically, the (meth)acrylic acid monomer having a hydroxyl group may desirably include a (meth)acrylic acid monomer having a C1 to C20 alkyl group possessing at least one hydroxyl group, one or more of the following: 2-hydroxyl Ethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, 6-hydroxyhexyl ( Meth)acrylate, 1-chloro-2-hydroxypropyl (meth)acrylate. These monomers may be included individually or in combination of two or more. The content of (meth)acrylic monomers having hydroxyl groups may be 0.01% to 20% by weight of the monomer mixture, for example 0.1% to 10% by weight.

The (meth)acrylic monomer having an aromatic group may include (meth)acrylate having a C6 to C20 aryl group or a C7 to C20 arylalkyl group. Specifically, the (meth)acrylic monomer having an aromatic group may include, but is not limited to, phenyl (meth)acrylate, benzyl (meth)acrylate, and the like. The content of (meth)acrylic monomers having aromatic groups may be 0 to 50% by weight of the monomer mixture, for example 0 to 20% by weight.

In this specification, when an alicyclic group and an alkyl group are mixed in a monomer, it is classified as a (meth)acrylic monomer having an alicyclic group.

The (meth)acrylic acid monomer having an alicyclic group may be a (meth)acrylate having a C5 to C20 monocyclic or heterocyclic alicyclic group, and may include cyclohexyl (meth)acrylate, (meth)acrylate At least one of isobornyl acrylate, dicyclopentyl (meth)acrylate, methylcyclohexyl (meth)acrylate and dicyclopentenyl (meth)acrylate. The content of the (meth)acrylic monomer having an alicyclic group may be 0% to 50% by weight of the monomer mixture, such as 1% to 30% by weight, or 1% to 20% by weight.

The (meth)acrylic acid monomer having a heteroalicyclic group may include a (meth)acrylate having a C4 to C9 heteroalicyclic group, the C4 to C9 heteroalicyclic group including nitrogen, oxygen or sulfur. At least one of. Specifically, the (meth)acrylic acid monomer having a heteroalicyclic group may include (meth)acryloylmorpholine, but is not limited thereto. The content of the (meth)acrylic monomer having a heteroalicyclic group may be from 0 to 50% by weight of the monomer mixture, for example from 0 to 10% by weight.

The adhesive resin may include a (meth)acrylic copolymer of a monomer mixture including 70 to 99.99% by weight, for example, 90 to 99.5% by weight of a (meth)acrylic monomer having an alkyl group. , 0.01% to 30% by weight, such as 0.5% to 10% by weight of (meth)acrylic acid monomer having a hydroxyl group. When each monomer constituting the adhesive resin has the above range, adhesive strength can be easily ensured.

The curing agent may include an isocyanate-based curing agent. Based on 100 parts by weight of the adhesive resin, the content of the curing agent may be 0.01 to 20 parts by weight, such as 0.01 to 10 parts by weight, such as 0.1 to 4 parts by weight. When the curing agent has the above range, the composition can be cross-linked to form an adhesive layer and prevent reduction in transparency and poor reliability due to excessive use thereof.

The composition may further include traditional additives, such as silane coupling agent, antioxidant, tackifying resin, plasticizer, antistatic agent, rework agent and curing catalyst. Based on 100 parts by weight of the adhesive resin, the content of the silane coupling agent may be 0.01 to 20 parts by weight, such as 0.01 to 10 parts by weight, such as 0.1 to 4 parts by weight. When the silane coupling agent has the above range, adhesion can be controlled, and reliability defects can be prevented.

The composition used for the adhesive layer may be solvent-free, or may further include traditional organic solvents to enhance coating properties.

The adhesive layer may have a thickness of 1 μm to 50 μm, such as 5 μm to 25 μm. When the thickness of the adhesive layer is within the above range, it can be easily used in a display device.

According to another embodiment, a display device including an anti-reflection film is provided. For example, a display device including an anti-reflection film and a quantum dot-containing layer can be provided.

For example, the display device may further include a light source, a color filter, and a substrate.

For example, the display device may have a stacked structure, in which a quantum dot-containing layer may be disposed on the light source, a color filter may be disposed on the quantum dot-containing layer, the substrate may be disposed on the color filter, and the anti-reflection film may be disposed on on the base. (See Figure 3 and Figure 4)

For example, the light source may be a blue light source.

For example, the substrate can be a glass substrate.

Generally, when a light source is shifted or expanded to a short wavelength, absorbance and fluorescence are known to increase, and therefore, in order to increase the fluorescence efficiency of quantum dots, a method of shifting or expanding the light source in a short wavelength is used. However, when a blue light source is used, color reproducibility may be deteriorated, and specifically, a blue organic light emitting diode (OLED) light source has difficulty in shifting and the like.

However, the display device according to the embodiment uses the compound represented by Chemical Formula 1 to increase the light source in the blue region, and thus enhances light having a wavelength absorbed by the quantum dots, and therefore, can be expected to have increased luminous efficiency of the quantum dots Effect. In addition, by absorbing (cutting) light in the short wavelength region of the blue light source to improve the color reproducibility of the panel, the light source applied to the panel does not need to be changed, and in addition, the amount of quantum dots included in the display device can be reduced, And therefore price competitive.

In addition, by specifying the anti-reflection film containing the compound represented by Chemical Formula 1 on the glass substrate, the display device according to the embodiment can maximize the efficiency increase of the quantum dots due to the anti-reflection film containing the compound represented by Chemical Formula 1.

In addition to quantum dots, the components constituting the quantum dot-containing layer may further include a binder resin, a reactive unsaturated compound, a photopolymerization initiator, a diffusing agent and other additives, which will be described later.

Quantum dots may have a maximum fluorescent emission wavelength (fluorescence λ _max ) in the wavelength range of 350 nm to 550 nm, 400 nm to 500 nm.

Quantum dots may have a full width at half maximum (FWHM) in the range of 20 nm to 100 nm, such as 20 nm to 50 nm. When the quantum dot has a half-maximum width (FWHM) within the range, the quantum dot has high color purity and therefore has the effect of increasing color reproducibility when used as a color material in a color filter.

Quantum dots can be organic materials, inorganic materials, or a mixture (mixture) of organic and inorganic materials.

A quantum dot may each independently include a core and a shell surrounding the core, and as used herein, the core and the shell may have, for example, each independently including a group II-IV, a group III-V, and the like. Core, core/shell, core/first shell/second shell, alloy, alloy/shell and similar structures, but are not limited to these.

For example, the core may include at least one material selected from CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs and alloys thereof, but is not necessarily limited to this. The shell surrounding the core may include at least one material selected from CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, HgSe and alloys thereof, but is not necessarily limited thereto.

In the embodiment, since environmental concerns have greatly increased around the world recently and regulations regarding toxic materials have also been tightened, a cadmium-free luminescent material (InP/ ZnS) to replace luminescent materials with cadmium cores, but it is not necessarily limited to this.

The quantum dot having a core/shell structure may have an entire size (average particle diameter) including the shell of 1 nm to 15 nm, for example, 5 nm to 15 nm, but its structure is not particularly limited.

For example, the quantum dots can be red quantum dots, green quantum dots, or a combination thereof. For example, quantum dots may include both green quantum dots and red quantum dots. In this case, the content of green quantum dots may be greater than the content of red quantum dots. Red quantum dots can have an average particle diameter of 10 nm to 15 nm. Green quantum dots can have an average particle diameter of 5 nm to 8 nm.

At the same time, for the dispersion stability of quantum dots, a dispersant can be used together. Dispersants can help the light conversion material (eg, quantum dots) be uniformly dispersed in the curable composition and include nonionic, anionic, or cationic dispersants. Specifically, the dispersant may include polyalkylene glycol or its ester, polyoxyalkylene, polyol ester alkylene oxide addition product, alcohol alkylene oxide addition product, sulfonate ester, sulfonate, carboxylic acid Esters, carboxylates, alkylamide alkylene oxide addition products, alkylamines. The dispersants may be used alone or in a mixture of two or more. The dispersant may be used in an amount of 0.1% to 100% by weight, such as 10% to 20% by weight, based on the solids content of the light conversion material (eg quantum dots).

The content of quantum dots may be 1 to 40 parts by weight, such as 1 to 10 parts by weight based on 100 parts by weight of the components constituting the quantum dot-containing layer. When quantum dots are included within the above range, the light conversion efficiency is improved, and the pattern characteristics and development characteristics are not impaired, so that excellent processability can be obtained.

The adhesive resin may include acrylic resin, epoxy resin, or combinations thereof.

The acrylic resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and is a resin containing at least one acrylic acid repeating unit.

The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxyl group. Examples of such monomers include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid or combinations thereof.

Based on the total amount of the acrylic resin, the content of the first ethylenically unsaturated monomer may be 5% to 50% by weight, such as 10% to 40% by weight.

The second ethylenically unsaturated monomer can be: aromatic vinyl compounds, such as styrene, α-methylstyrene, vinyl toluene, vinyl benzyl methyl ether and the like; unsaturated carboxylic acid ester compounds, such as Methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, (methyl) Benzyl acrylate, cyclohexyl (meth)acrylate, phenyl (meth)acrylate and the like; unsaturated carboxylic acid aminoalkyl ester compounds, such as 2-aminoethyl (meth)acrylate, (meth)acrylate 2-dimethylaminoethyl acrylate and the like; carboxylic acid vinyl ester compounds, such as vinyl acetate, vinyl benzoate and the like; unsaturated carboxylic acid glycidyl ester compounds, such as glycidyl (meth)acrylate esters and the like; cyanide vinyl compounds, such as (meth)acrylonitrile and the like; unsaturated amide compounds, such as (meth)acrylamide and the like; etc. These compounds may be used alone or in a mixture of two or more.

Specific examples of the acrylic resin may be polybenzyl methacrylate, (meth)acrylic acid/benzyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene copolymer, (meth)acrylic acid /Benzyl methacrylate/2-hydroxyethyl methacrylate copolymer, (meth)acrylic acid/benzyl methacrylate/styrene/2-hydroxyethyl methacrylate copolymer and the like, but not only Limited to this. These acrylic resins may be used alone or in a mixture of two or more.

The acrylic resin may have a weight average molecular weight of 1,000 to 15,000 g/mol. When the weight average molecular weight of the acrylic resin is within the range, the close contact properties with the substrate and the physical and chemical formation are improved, and the viscosity is appropriate.

The epoxy resin may be a thermally polymerizable monomer or oligomer, and may include compounds having carbon-carbon unsaturated bonds and carbon-carbon cyclic bonds.

Epoxy resins may further include bisphenol A epoxy resin, bisphenol F epoxy resin, phenol novolac epoxy resin, cyclic aliphatic epoxy resin and aliphatic polyglycidyl ether, but are not necessarily limited thereto.

Commercially available products of the compound can be YX4000, YX4000H, YL6121H, YL6640 or YL6677 from Yuka Shell Epoxy Co., Ltd.; YX4000 from Nippon Kayaku Co. Ltd. EOCN-102, EOCN-103S, EOCN-104S, EOCN-1020, EOCN-1025 or EOCN-1027; and epoxy resin (EPIKOTE) 180S75 of Youxiang Shell Epoxy Co., Ltd.; bisphenol A epoxy resin, such as Youxiang Shell Epoxy Co., Ltd. EPIKOTE 1001, 1002, 1003, 1004, 1007, 1009, 1010 and 828 of Shell Epoxy Co., Ltd.; bisphenol F epoxy resins, such as EPIKOTE 807 and 834 of Youxiang Shell Epoxy Co., Ltd.; phenolic epoxy resins, such as Youxiang EPIKOTE 152, 154 or 157H65 of Shell Epoxy Co., Ltd., and EPPN 201, 202 of Nippon Chemical Co., Ltd.; cyclic aliphatic epoxy resins, such as CY175, CY177 and CY179, ERL-4234, ERL-4299, ERL-4221 and ERL-4206 of Union Carbide Corporation (U.C.C.), Showdyne 509 of Showa Denko K.K., Ciba-Geigy The company’s Araldite CY-182, Dainippon Ink & Chemicals Inc.’s CY-192 and CY-184, Youxiang Shell Epoxy Company’s EPICLON 200 and 400, EPIKOTE 871, 872, and EP1032H60, ED-5661 and ED-5662 of Celanese Coating Corporation; aliphatic polyglycidyl ethers can be EPIKOTE 190P and 191P of Youxiang Shell Epoxy Company, and Gyoei Society by EPOLITE 100MF from Kyoeisha Yushi Kagaku Kogyo Co., Ltd., EPIOL TMP from Nihon Yushi K. K. and similar products.

Based on 100 parts by weight of the components constituting the subdot-containing layer, the content of the binder resin may be 1 to 40 parts by weight, such as 5 to 20 parts by weight. When the binder resin is included within the above range, excellent sensitivity, developability, resolution and linearity of the pattern can be obtained.

The reactive unsaturated compound can be used by mixing monomers or oligomers commonly used in conventional photocurable compositions and thermosetting compositions.

The reactive unsaturated compound may be an acrylate compound. For example, ethylene glycol diacrylate, triethylene glycol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, pentaerythritol Diacrylate, pentaerythritol triacrylate, dipentaerythritol diacrylate, dipentaerythritol triacrylate, dipentaerythritol pentaacrylate, pentaerythritol hexaacrylate, bisphenol A diacrylate, trimethylolpropane triacrylate, phenolic ring Oxyacrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, propylene glycol dimethacrylate, 1,4-butanediol dimethyl At least one of acrylate, 1,6-hexanediol dimethacrylate or a mixture thereof.

Reactive unsaturated compounds can be treated with anhydrides to improve developability.

The content of the reactive unsaturated compound may be 1 to 10 parts by weight, such as 1 to 5 parts by weight based on 100 parts by weight of the components constituting the subdot-containing layer. When the reactive unsaturated compound is included within the above range, curing sufficiently occurs during exposure in the pattern forming process, resulting in excellent reliability, heat resistance, light resistance, chemical resistance, resolution and close contact properties of the pattern .

The photopolymerization initiator may be an acetophenone-based compound, a benzophenone-based compound, a thioxanthone-based compound, a benzoin-based compound, an oxime-based compound, and the like.

Examples of the acetophenone-based compound may be 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylpropiophenone, p-tert-butyl Trichloroacetophenone, p-tert-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-(4- (Methylthio)phenyl)-2-morpholinylpropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)-butan-1-one and Analogues.

Examples of the benzophenone-based compound may be benzophenone, benzoyl benzoate, benzoyl methyl benzoate, 4-phenylbenzophenone, hydroxybenzophenone, diacrylate Benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone ketone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone and the like.

Examples of the thioxanthone-based compound may be thioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diethylthioxanthone, and 2,4-diisopropylthioxanthone , 2-chlorothioxanthone and the like.

Examples of the benzoin-based compound may be benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzoin dimethyl ketal and the like.

Examples of the triazine-based compound may be 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3', 4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloro Methyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis (Trichloromethyl)-s-triazine, 2-biphenyl-4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s -Triazine, 2-(naphthol-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphthol-1-yl)-4, 6-bis(trichloromethyl)-s-triazine, 2-4-bis(trichloromethyl)-6-piperonyl-s-triazine, 2-4-bis(trichloromethyl)-6 -(4-methoxystyryl)-s-triazine and the like.

Examples of the oxime-based compound may be O-carboxyloxime-based compounds, 2-(O-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1 -(O-acetyl oxime)-1-[9-ethyl-6-(2-methylbenzoyl)-9H-terazol-3-yl]ethanone, O-ethoxycarbonyl- α-Oxylamino-1-phenylpropan-1-one and the like. Specific examples of the O-acyl oxime-based compound include 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl- Phenyl)-butan-1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione-2-oxime-O-benzoate, 1-(4- Phenylsulfanylphenyl)-octane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1-oneoxime -O-acetate, 1-(4-phenylsulfanylphenyl)-but-1-one oxime-O-acetate and the like.

In addition to the above-mentioned compounds, the photopolymerization initiator may further include a benzazole-based compound, a diketone-based compound, a sulfonium borate-based compound, a diazo-based compound, an imidazole-based compound, a biimidazole-based compound, a fluorene-based compound, and the like.

Photopolymerization initiators may be used with photosensitizers that are capable of causing a chemical reaction by absorbing light and becoming excited and subsequently transmitting its energy.

Examples of photosensitizers may be tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate, dipentaerythritol tetrakis-3-mercaptopropionate, and the like.

Based on 100 parts by weight of the components constituting the subdot layer, the content of the photopolymerization initiator may be 0.1 to 10 parts by weight, for example, 0.1 to 5 parts by weight. When the photopolymerization initiator is included within the above range, the balance between sensitivity and developability during exposure is improved, so that a pattern with excellent resolution without residual film can be obtained.

The subdot-containing layer may further include a diffusing agent.

For example, the diffusing agent may include barium sulfate (BaSO ₄ ), calcium carbonate (CaCO ₃ ), titanium dioxide (TiO ₂ ), zirconium oxide (ZrO ₂ ), or combinations thereof.

The diffusing agent reflects the light that has not been absorbed by the aforementioned quantum dots, so that the reflected light can be absorbed in the quantum dots again. In other words, the diffusing agent increases the amount of light absorbed in the quantum dots, and therefore increases the light conversion efficiency of the curable composition.

The average particle diameter (D ₅₀ ) of the diffusing agent may be in the range of 150 nm to 250 nm, and specifically in the range of 180 nm to 230 nm. When the diffusing agent has an average particle diameter within the range, a more excellent light scattering effect can be obtained, and the light conversion efficiency can be increased.

Based on 100 parts by weight of the solid content of the components constituting the subdot-containing layer, the content of the diffusing agent may be 0.1% to 20% by weight, such as 0.1% to 5% by weight. When the content of the diffusing agent is less than 0.1% by weight based on 100 parts by weight of the components constituting the content subdot layer, it is difficult to expect the effect of improving the light conversion efficiency by using the diffusing agent, and when the content of the diffusing agent is greater than 5% by weight , pattern characteristics may deteriorate.

In order to improve the stability and dispersion of the quantum dots, the quantum dot-containing layer may further include a thiol-based additive.

Thiol-based additives can replace the shell surface of quantum dots, improve the dispersion stability of quantum dots in solvents, and stabilize quantum dots.

The thiol-based additive may have one or more, such as 2 to 10, such as 2 to 4, thiol groups (-SH) at the terminal depending on its structure.

For example, the thiol-based additive may include at least two functional groups represented by Chemical Formula 2. [Chemical formula 2]

In Chemical Formula 2, L ⁷ and L ⁸ are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C1 to C20 cycloalkylene group, Substituted C6 to C20 aryl group or substituted or unsubstituted C2 to C20 heteroaryl group.

For example, the thiol-based additive can be represented by Chemical Formula 3. [Chemical formula 3]

In Chemical Formula 3, L ⁷ and L ⁸ are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C1 to C20 cycloalkylene group, A substituted C6 to C20 aryl group or a substituted or unsubstituted C2 to C20 heteroaryl group, and u1 and u2 are each independently an integer 0 or 1.

For example, in Chemical Formula 2 and Chemical Formula 3, L ⁷ and L ⁸ may each independently be a single bond or a substituted or unsubstituted C1 to C20 alkylene group.

Specific examples of the thiol-based additive may be selected from pentaerythritol tetrakis(3-mercaptopropionate) represented by Chemical Formula 2a, trimethylolpropane tris(3-mercaptopropionate) represented by Chemical Formula 2b, trimethylolpropane tris(3-mercaptopropionate) represented by Chemical Formula 2c Pentaerythritol tetrakis(mercaptoacetate), trimethylolpropane tris(2-mercaptoacetate) represented by Chemical Formula 2d, diol di-3-mercaptopropionate represented by Chemical Formula 2e, and combinations thereof. [Chemical formula 2a] [Chemical formula 2b] [Chemical formula 2c] [Chemical formula 2d] [Chemical formula 2e]

Based on 100 parts by weight of the components constituting the subdot layer, the content of the thiol-based additive may be 0.1 to 10 parts by weight, for example, 0.1 to 5 parts by weight. When a thiol-based additive is included within the range, the stability of light conversion materials such as quantum dots can be improved, and the thiol group in the component reacts with the acrylic group of the resin or monomer to form a covalent bond, And thus the heat resistance of light conversion materials such as quantum dots can be improved.

The subdot-containing layer may further include a polymerization inhibitor, which includes a hydroquinone-based compound, a catechol-based compound, or a combination thereof. Since the quantum dot-containing layer further includes a hydroquinone-based compound, a catechol-based compound, or a combination thereof, cross-linking at room temperature can be prevented during exposure after printing (coating) the composition containing quantum dots.

For example, hydroquinone compounds, catechol compounds or combinations thereof may include hydroquinone, methylhydroquinone, methoxyhydroquinone, tert-butylhydroquinone, 2,5-di-tert-butylhydroquinone , 2,5-bis(1,1-dimethylbutyl)hydroquinone, 2,5-bis(1,1,3,3-tetramethylbutyl)hydroquinone, catechol, tert-butyl Catechol, 4-methoxyphenol, pyrogallol, 2,6-di-tert-butyl-4-methylphenol, 2-naphthol, tris(N-hydroxy-N-nitrosobenzene Alumina-O,O')aluminum or combinations thereof, but not necessarily limited to this.

Based on 100 parts by weight of components constituting a layer including quantum dots and fluorescent dyes or a layer containing quantum dots (excluding fluorescent dyes), a hydroquinone-based compound, a catechol-based compound or a combination thereof may be a dispersion The content of the polymerization inhibitor in the form of dispersion may be 0.001 to 1 part by weight, such as 0.01 to 0.1 part by weight. When the stabilizer is included within the above range, the problem of aging at room temperature can be solved, and sensitivity reduction and surface peeling can be prevented.

In addition to thiol-based additives and polymerization inhibitors, the subdot-containing layer may include: malonic acid; 3-amino-1,2-propanediol; silane-based coupling agent; leveling agent; fluorine-based surfactant; or other combination.

In addition, the subdot-containing layer may further include a silane coupling agent having reactive substituents such as carboxyl groups, methacrylyl groups, isocyanate groups, epoxy groups and similar groups to improve the close contact properties with the substrate.

Examples of the silane-based coupling agent may include trimethoxysilyl benzoic acid, γ-methacrylateoxypropyltrimethoxysilane, vinyltriacetyloxysilane, vinyltrimethoxysilane, γ-isocyanatepropyl triethoxysilane, γ-glycidoxypropyltrimethoxysilane, β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane and the like. These silane coupling agents may be used alone or in a mixture of two or more.

The content of the silane coupling agent may be 0.01 to 10 parts by weight based on 100 parts by weight of the components constituting the subdot layer. When the silane coupling agent is included within the stated range, close contact properties, storage properties and the like can be improved.

In addition, the subdot-containing layer may further contain surfactants such as fluorine-based surfactants to improve coating and prevent defects if necessary.

Examples of fluorine-based surfactants include BM-1000 ^® and BM-1100 ^® from BM Chemie Inc.; Mejifa from Dainippon Ink Kagaku Kogyo Co., Ltd. MEGAFACE) F 142D ^® , F 172 ^® , F 173 ^® and F 183 ^® ; Sumitomo 3M Co., Ltd.’s FULORAD FC-135 ^® , FULORAD FC- 170C ^® , Florad FC-430 ^® and Florad FC-431 ^® ; SURFLON S-112 ^® and SURFLON S from ASAHI Glass Co., Ltd. -113 ^® , Sulfon S-131 ^® , Sulfon S-141 ^® and Sulfon S-145 ^® ; and Toray Silicone Co., Ltd.’s SH-28PA ^® , SH-190 ^® , SH-193 ^® , SZ-6032 ^® and SF-8428 ^® and similar; F-482, F-484, F-478, F- from DIC Co., Ltd. 554 and similar.

The content of the fluorine-based surfactant may be 0.001 to 5 parts by weight based on 100 parts by weight of the components constituting the subdot layer. When the fluorine-based surfactant is included within the above range, excellent wettability and coating uniformity on the glass substrate can be ensured, but stains cannot be generated.

In addition, a certain amount of other additives such as antioxidants and stabilizers can be further added to the quantum dot-containing layer within a range that does not impair the physical properties.

The method of manufacturing each subdot-containing layer may include coating a curable composition including the above components and the like on a substrate by an inkjet jetting method to form a pattern (S1); and curing the pattern (S2). ( S1 ) Pattern formation

The curable composition is coated on a substrate with a thickness of 0.5 μm to 10 μm using an inkjet dispersion method. According to inkjet dispersion, the pattern can be formed by repeatedly dispersing the desired colors one by one or the pattern can be formed by dispersing the desired colors simultaneously to simplify the process. ( S2 ) Curing

By curing the obtained pattern, a cured resin film can be obtained. At this time, a thermal curing process is preferred as the curing method. The thermal curing process may be to first remove the solvent in the curable composition by heating at a temperature greater than or equal to 100°C for 3 minutes, and then by heating at a temperature of 160°C to 300°C (and more preferably at Curing process by heating at a temperature of 180°C to 250°C) for 30 minutes.

Additionally, each subdot-containing layer can be fabricated without inkjet. The manufacturing method in this case includes: coating a curable material containing the above-mentioned components on a predetermined pre-treated substrate using a suitable method (for example, spin coating, roller coating, spray coating, etc.), for example, at a thickness of 0.5 μm to 10 μm. the composition; and irradiating the resultant with light to form a pattern required for the color filter. As a light source for irradiation, UV, electron beam, or X-ray (X-ray) can be used, and for example, UV in the range of 190 nm to 450 nm, specifically 200 nm to 400 nm, can be irradiated. In the irradiation process, a photoresist mask can be further used. After the irradiation process is performed in this manner, the composition layer irradiated with the light source is treated with a developing solution. At this time, the unexposed portions of the composition layer are dissolved to form the desired pattern of the color filter. By repeating this process according to the number of colors required, a color filter with the desired pattern can be obtained. In addition, when the image pattern obtained by development in the above process is heated again or solidified by irradiation with actinic rays, crack resistance and solvent resistance can be improved.

The curable composition may further include a solvent.

Solvents may include the following compounds: alcohols, such as methanol, ethanol and the like; glycol ethers, such as ethylene glycol methyl ether, ethylene glycol ethyl ether, propylene glycol methyl ether and the like; cellosolve acetates, such as methyl Cellosolve acetate, ethyl cellosolve acetate, diethyl cellosolve acetate and the like; carbitols such as methylethyl carbitol, diethyl carbitol, diethyl cellosolve Ethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ether, diethylene glycol diethyl ether and the like; propylene glycol alkyl ether acetates, such as propylene glycol Monomethyl ether acetate, propylene glycol propyl ether acetate and similar; ketones, such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl n-propyl ketone, methyl n-butyl ketone, methyl n-amyl ketone, 2-heptanone and the like; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate, isobutyl acetate and the like; lactic acid alkanes Alkyl glycolates, such as methyl lactate, ethyl lactate and the like; alkyl glycolates, such as methyl glycolate, ethyl glycolate, butyl glycolate and the like; alkoxyalkyl acetates, such as methane Methyloxyacetate, ethylmethoxyacetate, butylmethoxyacetate, methylethoxyacetate, ethoxyethylacetate and the like; alkyl 3-hydroxypropionates, such as 3-hydroxypropionate Methyl propionate, ethyl 3-hydroxypropionate and the like; alkyl 3-alkoxypropionates, such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, 3- Ethyl ethoxypropionate, methyl 3-ethoxypropionate and the like; alkyl 2-hydroxypropionate, such as methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, 2-hydroxypropionate Propyl propionate and the like; alkyl 2-alkoxypropionates, such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate, Methyl 2-ethoxypropionate and analogs; alkyl 2-hydroxy-2-methylpropionate, such as methyl 2-hydroxy-2-methylpropionate, 2-hydroxy-2-methylpropionate Acid ethyl esters and analogs; 2-alkoxy-2-methylpropionic acid alkyl esters, such as 2-methoxy-2-methylpropionic acid methyl ester, 2-ethoxy-2-methylpropionate Ethyl acid esters and the like; esters such as 2-hydroxyethyl propionate, 2-hydroxy-2-methylethyl propionate, hydroxyethyl acetate, 2-hydroxy-3-methylmethyl butyrate and the like substances; or ketoacid esters, such as ethyl pyruvate and the like. In addition, N-methylformamide, N,N-dimethylformamide, N-methylformaniline, N-methylacetamide, and N,N-dimethylacetamide can also be used , N-methylpyrrolidone, dimethylsulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, hexanoic acid, octanoic acid, 1-octanol, 1-nonanol, benzyl alcohol, acetic acid Benzyl ester, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, phenyl cellosolve acetate (phenyl cellosolve acetate), dimethyl oxalate, but not exclusively.

For example, the solvent may desirably be a glycol ether such as ethylene glycol monoethyl ether, ethylene glycol methyl ethyl ether and the like; a glycol alkyl ether acetate such as ethyl cellosolve acetate and Analogs; Esters, such as 2-hydroxyethyl propionate and similar; Carbitol, such as diethylene glycol monomethyl ether and similar; Propylene glycol alkyl ether acetate, such as propylene glycol monomethyl ether acetate, Propylene glycol propyl ether acetate and the like; alcohols, such as ethanol and the like; or combinations thereof.

For example, the solvent may include propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, ethanol, ethylene glycol dimethyl ether, ethylene glycol methyl ethyl ether, diethylene glycol dimethyl ether, dimethyl Acetamide, 2-butoxyethanol, N-methylpyrrolidine, N-ethylpyrrolidine, propylene carbonate, γ-butyrolactone, dimethyl oxalate or combinations thereof.

The balance of solvent may be included based on the total amount of curable composition.

In the following, the invention is illustrated in more detail with reference to examples. However, these examples should not be construed in any sense as limiting the scope of the invention. (Example) (Synthesis example)

Each compound was diluted to a concentration of 10 ppm by using methylethylketone (MEK) solvent and measured using a UV/VIS spectrophotometer (Lamda 25, PerkinElmer, Inc.)) measured the maximum absorption wavelength. Additionally, the extinction coefficient was calculated based on Beer's law. Furthermore, the full width at half maximum (FWHM) (nm) was determined in which the absorption at each maximum absorption wavelength was reduced to half.

Synthesis Example 1 : Synthesis of the compound represented by Chemical Formula 1-1-1 [Synthesis Example 1-1]

Put 6 g (63.1 mmol) 2,4-dimethylpyrrole, 1.9 g (7.88 mmol) 3,5-bis(trifluoromethyl)benzaldehyde and 40 ml dichloromethane (DCM) into 250 L round bottom flask and then stirred at room temperature for 30 minutes. 0.1 ml of trifluoroacetic acid was added dropwise thereto, and then stirred at room temperature for 16 hours. Subsequently, 4.4 g (7.88 mmol) of 2,3-dichloro-5,6-dicyano-1,4-benzoquinone was added , DDQ) dissolved in 50 ml of toluene was added dropwise thereto, and then stirred for 4 hours. After removal of the solvent, the residue was purified by column chromatography with a mixed solution of ethyl acetate/hexane/TEA (20%/80%/0.2%) and dried. (Yield: 66%, 2 g) [Synthesis Example 1-2]

In a 1 L flask, 2 g (4.83 mmol) of the product of Synthesis Example 1-1 was stirred in 240 ml of chloroform. _Dissolve 0.43 g (2.41 mmol) of Co(OAc) in 200 ml of MeOH. A Co(OAc) ₂ /MeOH solution was added and then stirred together. 40 ml of triethylamine was added thereto, and then the reaction was carried out by stirring at room temperature for 4 hours. After removing the solvent from the reactant, methanol was added thereto to perform recrystallization. The reddish powder was filtered out and dried, and the compound represented by Chemical Formula 1-1-1 was synthesized. (Yield: 50%, 1.1 g) [Chemical formula 1-1-1] [M+H] ⁺ = 882 m/z

Synthesis example 2 : From chemical formula 1-1-2 The synthesis of the compound represented

The compound represented by Chemical Formula 1-1-2 was synthesized in the same manner as in Synthesis Example 1, except that Pd(OAc) ₂ was used instead of Co(OAc) ₂ . [Chemical formula 1-1-2] [M+H] ⁺ = 929 m/z

Synthesis Example 3 : Synthesis of the compound represented by Chemical Formula 1-1-3 [Synthesis Example 3-1]

Dissolve 1 g (1.08 mmol) of the material of chemical formula 1-1-1 in 20 ml of methylene chloride under a nitrogen atmosphere. 0.81 g (4.52 mmol) N-bromosuccinimide was added thereto, and then reacted at room temperature for 4 hours. The resultant was distilled and separated by a column method, and the compound represented by Chemical Formula 1-1-3 was synthesized. [Chemical formula 1-1-3] [M+H] ⁺ = 1245 m/z

Comparative Synthesis Example 1 : Synthesis of the compound represented by Chemical Formula C-1 [Comparative Synthesis Example 1-1]

The same process as in Synthesis Example 1-1 was carried out except that benzaldehyde was used instead of 3,5-bis(trifluoromethyl)-benzaldehyde. [Comparative synthesis example 1-2]

2.5 g (5.9 mmol) of the intermediate synthesized in Comparative Synthesis Example 1-1, 1000 ml of toluene, and 2.5 ml (17.8 mmol) of triethanolamine were sequentially added thereto, and then stirred. 3.7 ml (29.7 mmol) BF ₃ ·Et ₂ O was added thereto, and then stirred at 100° C. for 4 hours. After removing the solvent therefrom, the residue was purified by column chromatography with a mixed solution of methylene chloride/hexane/TEA (79.9%/19.9%/0.2%) and dried.

2.2 g (4.7 mmol) of the dry compound and 100 ml of dichloromethane were added and then stirred. An additional 1.6 g (11.8 mmol) aluminum chloride was added and then stirred for 5 minutes. Subsequently, a solution prepared by dissolving 2.1 g (18.8 mmol) catechol in 10 ml acetonitrile was added thereto, and then stirred at room temperature for 30 minutes and washed, and after removing the solvent therefrom, Methanol was added thereto, and then stirred. The solid precipitated therein was filtered and dried to obtain a compound of chemical formula C-1. (Yield: 50%, 1.2 g) [Chemical Formula C-1] [M+H] ⁺ = 395 m/z

Comparative synthesis example 2 : From chemical formula C-2 The synthesis of the compound represented

The compound of Chemical Formula C-2 was synthesized in the same manner as in Synthesis Example 1 except that pyrrole was used instead of 2,4-dimethylpyrrole. [Chemical formula C-2] [M+H] ⁺ = 770 m/z

Comparative synthesis example 3 : From chemical formula C-3 The synthesis of the compound represented

The compound represented by Chemical Formula C-3 was synthesized in the same manner as in Synthesis Example 1, except that Cu(OAc) ₂ was used instead of Co(OAc) ₂ . [Chemical formula C-3] [M+H] ⁺ = 887 m/z

(evaluate 1 : Spectral consistency)

The maximum absorption wavelength and full width at half maximum (FWHM) of the compounds according to Synthesis Examples 1 to 3 and Comparative Synthesis Examples 1 to 3 are shown in Table 1. Referring to Table 1, the compounds according to Synthesis Examples 1 to 3 and Comparative Synthesis Example 1 have a maximum absorption wavelength in the range of 490 nm to 515 nm, and at the same time have a full width at half maximum (FWHM) of less than or equal to 50 nm, which is It was shown that unlike the compounds according to Comparative Synthesis Example 2 and Comparative Synthesis Example 3, the spectral consistency can be easily controlled. [Table 1] λ _max (nm) Full width at half maximum (FWHM) (nm) Synthesis example 1 498 25 Synthesis example 2 490 26 Synthesis example 3 513 35 Comparative synthesis example 1 507 20 Comparative synthesis example 2 477 71 Comparative synthesis example 3 458, 502 98

(Manufacture of anti-reflective film) Example 1

100 parts by weight of the monomer mixture including 99 parts by weight of n-butyl acrylate and 1 part by weight of 2-hydroxyethyl acrylate and 150 parts by weight of ethyl acetate were put into a 1 L reactor equipped with Condenser to conveniently control the temperature, reflux nitrogen in the reactor, and while stirring the flask, inject nitrogen into it for 1 hour to replace the oxygen in the reactor with nitrogen, and then maintain the reactor at 70°C . 0.06 parts by weight of 2,2'-azobisisobutyronitrile as an initiator was added thereto, and then reacted for 8 hours to prepare a solution containing a (meth)acrylic acid copolymer. The (meth)acrylic acid copolymer has a Tg of -46°C and a weight average molecular weight of 1,100,000 g/mol. Subsequently, ethyl acetate was added thereto, thereby preparing a 19.4% by weight (meth)acrylic acid copolymer solution. Based on 100 parts by weight of the solid content of the (meth)acrylic acid copolymer, 0.193 parts by weight of an XDI-based isocyanate cross-linking agent (75% solid content, TD-75, Soken Chemical Co., Ltd. ., Ltd.)), 0.154 parts by weight of 3-glycidoxypropyltrimethoxysilane (KBM-403, ShinEtsu Chemical Co.) as a silane coupling agent, and 0.06 parts by weight of synthesized according to The compound of Example 1 (represented by Chemical Formula 1-1-1) was mixed. Subsequently, 25 parts by weight of methyl ethyl ketone was added thereto to prepare an adhesive layer composition.

Use a bar coater to directly apply the adhesive layer composition as an anti-reflective layer (an anti-reflective layer formed by sequentially stacking a hard coat layer, a high refractive layer and a low refractive layer on the upper surface of the PET film. Reflectivity: 0.2 %, DNP, LLC) on the bottom surface of the PET film as a base film, and then dried in a 90°C oven for 4 minutes to form a 20 μm thick anti-reflective film. Example 2

An antireflection film was formed according to the same method as Example 1, except that the compound of Synthesis Example 2 (represented by Chemical Formula 1-1-2) was used instead of the compound of Synthesis Example 1 (represented by Chemical Formula 1-1-1). Example 3

An antireflection film was formed according to the same method as Example 1, except that the compound of Synthesis Example 3 (represented by Chemical Formula 1-1-3) was used instead of the compound of Synthesis Example 1 (represented by Chemical Formula 1-1-1). Comparative example 1

An antireflection film was formed according to the same method as Example 1, except that the compound of Comparative Synthesis Example 1 (represented by Chemical Formula C-1) was used instead of the compound of Synthesis Example 1 (represented by Chemical Formula 1-1-1).

(evaluate 2 : Lightfastness reliability)

To evaluate whether the light resistance reliability of films used for panels formed by applying quantum dots is improved, optical members (manufactured by stacking an antireflection film on one surface of glass with a quantum dot-containing layer on the other surface) were fabricated ), and then, by testing in a xenon test chamber (Q-SUN) [light source lamp: xenon lamp, irradiation intensity: 0.35 W/cm ² , irradiation temperature: 63°C, irradiation time: 500 hours, and irradiation direction: from the anti- [Reflective Film Irradiation] The light transmittance at a wavelength of 550 nm was measured before and after irradiation, and the light resistance reliability was evaluated using the change in light transmittance. The results are shown in Table 2. The amount of change in light transmittance (ΔT%) is the absolute value of the difference between the amount of change in light transmittance before irradiation and the amount of change in light transmittance after irradiation. [Table 2] Light fastness reliability Example 1 ○ Example 2 ○ Example 3 ○ Comparative example 1 X (Evaluation criteria for light resistance reliability) ○: Change in light transmittance (ΔT%) is 5% or less X: Change in light transmittance (ΔT%) exceeds 5%

Referring to Table 1 and Table 2, Examples 1 to 3 showed improved light resistance reliability compared to Comparative Examples 1 to 3. Specifically, the spectral consistency of the compound according to Comparative Synthesis Example 1 used as it is in Comparative Example 1 can be easily controlled, but when applied to the antireflection film, compared to the compound according to Example (from the chemical formula 1 indicates) is also applied to anti-reflective films, the light resistance reliability is greatly deteriorated. In other words, the antireflection film and the quantum dot-containing display device applying the dye compound according to the embodiment effectively absorb light in the blue long wavelength region and the green short wavelength region, and therefore improve the color reproduction of the quantum dot application panel sex. Specifically, for traditional LCD panels, in the lightfastness test, the lightfastness is evaluated by measuring the pigment retention rate at the maximum absorption wavelength after a specific period of time under specific conditions, but due to the specific time under specific conditions The maximum absorption wavelength itself changes after this period, and in addition pigment retention is controversial as an indicator of lightfastness. Therefore, in this application, the light resistance reliability is evaluated by using the change in light transmittance at specific wavelengths before and after irradiation.

While the invention has been described in connection with what are presently considered practical exemplary embodiments, it is to be understood that the invention is not limited to the disclosed embodiments but, on the contrary, is intended to be encompassed within the spirit and scope of the appended claims. Various modifications and equivalent arrangements. Therefore, it should be understood that the above-described embodiments are exemplary and do not limit the invention in any way.

10:Blue light source 20:Content subdot layer 30:Color filter 40: Base 50:Adhesive layer 60: Dye-containing layer 70:Anti-reflective layer 80:Anti-reflective film 100:Display device

1 and 2 are schematic diagrams each independently showing an anti-reflection film according to an embodiment. 3 and 4 are schematic diagrams each independently showing a display device according to an embodiment. 5 is a graph showing changes in absorbance with wavelength of compounds according to Synthesis Example 1, Comparative Synthesis Example 2, and Comparative Synthesis Example 3.

50:Adhesive layer

70:Anti-reflective layer

80:Anti-reflective film

Claims (18)

A compound represented by Chemical Formula 1:

Wherein, in Chemical Formula 1, R ¹ and R ² are each independently a C1 to C20 alkyl group substituted by halogen, and R ³ to R ⁶ are each independently a hydrogen atom, halogen, cyano group, *-C (=O) OR' or *-C(=O)NR"R''', where R' is a substituted or unsubstituted C1 to C15 alkyl group, and R" and R''' are each independently a hydrogen atom or Substituted or unsubstituted C1 to C15 alkyl, R ⁷ to R ¹⁴ are each independently hydroxyl, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C3 to C20 cycloalkyl, Substituted or unsubstituted C1 to C20 alkoxy, substituted or unsubstituted C6 to C20 aryl or substituted or unsubstituted C2 to C20 heterocycloalkyl, M is Zn, Ag, Ti, Pt, Co, Fe, Ni or Pd, and n1 and n2 are each independently an integer of 2. The compound as claimed in claim 1, wherein Chemical Formula 1 is represented by Chemical Formula 1-1:

Wherein, in Chemical Formula 1-1, R ¹ and R ² are each independently a C1 to C20 alkyl group substituted by halogen, and R ³ to R ⁶ are each independently a hydrogen atom, halogen, cyano group, *-C(= O)OR' or *-C(=O)NR"R''', where R' is a substituted or unsubstituted C1 to C15 alkyl group, and R" and R''' are each independently a hydrogen atom Or substituted or unsubstituted C1 to C15 alkyl, R ⁷ to R ¹⁴ are each independently hydroxyl, substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted C2 to C20 heterocycloalkyl group, and M is Zn, Ag , Ti, Pt, Co, Fe, Ni or Pd. The compound of claim 1, wherein R ³ to R ⁶ are each independently halogen, cyano, *-C(=O)OR' or *-C(=O)NR"R''', wherein R ' is a substituted or unsubstituted C1 to C15 alkyl group, and R" and R''' are each independently a hydrogen atom or a substituted or unsubstituted C1 to C15 alkyl group. The compound of claim 3, wherein R ³ to R ⁶ are each independently halogen. The compound of claim 1, wherein R ⁷ to R ¹⁴ are each independently a substituted or unsubstituted C1 to C20 alkyl group. The compound of claim 1, wherein the compound is represented by any one selected from Chemical Formula 1-1-1 to Chemical Formula 1-1-3:

The compound of claim 1, wherein the compound represented by Chemical Formula 1 exhibits an absorption wavelength at 400 nm to 520 nm, and has a maximum absorption wavelength at 480 nm to 520 nm of the absorption wavelength. The compound of claim 1, wherein the compound is a dye. A composition comprising a compound as described in any one of claims 1 to 8. An anti-reflective film comprising the compound described in any one of claims 1 to 8. The anti-reflective film according to claim 10, wherein the anti-reflective film includes an adhesive layer and an anti-reflective layer on the adhesive layer, and the compound is included in the adhesive layer. The anti-reflective film according to claim 10, wherein the anti-reflective film includes an adhesive layer, a dye-containing layer and an anti-reflective layer on the dye-containing layer, and the compound is included in the dye-containing layer. A display device including the anti-reflective film according to claim 10. The display device of claim 13, wherein the display device further includes a quantum dot-containing layer. The display device of claim 14, wherein the display device further includes a light source, a color filter and a substrate. The display device of claim 15, wherein the subdot-containing layer is provided on the light source, the color filter is provided on the subdot-containing layer, and the substrate is provided on the color filter , and the anti-reflective film is disposed on the substrate. The display device of claim 15, wherein the light source is a white light source or a blue light source. The display device of claim 15, wherein the substrate includes a glass substrate.

Images