TW202020041A - Substrate for surface protective film, method for manufacturing the substrate, surface protective film using the substrate, and optical film with surface protective film including forming a film-forming material comprising an acrylic resin and an elastomer into a film shape, and sequentially or biaxially stretching the molded film - Google Patents

Substrate for surface protective film, method for manufacturing the substrate, surface protective film using the substrate, and optical film with surface protective film including forming a film-forming material comprising an acrylic resin and an elastomer into a film shape, and sequentially or biaxially stretching the molded film Download PDF

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TW202020041A
TW202020041A TW108123605A TW108123605A TW202020041A TW 202020041 A TW202020041 A TW 202020041A TW 108123605 A TW108123605 A TW 108123605A TW 108123605 A TW108123605 A TW 108123605A TW 202020041 A TW202020041 A TW 202020041A
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film
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中原歩夢
清水享
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日商日東電工股份有限公司
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    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
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    • B29C55/00Shaping by stretching, e.g. drawing through a die; Apparatus therefor
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    • B29C55/10Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets multiaxial
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    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings
    • GPHYSICS
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    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
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    • C08J2333/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2333/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
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    • C08J2453/00Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers
    • C08J2453/02Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers of vinyl aromatic monomers and conjugated dienes
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2477/00Characterised by the use of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Derivatives of such polymers

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  • Adhesive Tapes (AREA)
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Abstract

The present invention provides a substrate for a surface protective film, which has excellent flexibility or bending resistance, and can favorably suppress light leakage, coloring, and rainbow stains during optical inspection. The substrate for the surface protective film of the present invention is composed of a film comprising an acrylic resin and an elastomer, has in-plane retardation Re (550) of 30 nm or less, and the number of bending times to break in the MIT test is 500 or more. A method for manufacturing the substrate for the surface protective film of the present invention comprises: molding of a film forming material comprising the acrylic resin and the elastomer into a film; and sequential biaxial stretching or simultaneous biaxial stretching of the molded film.

Description

表面保護薄膜用基材、該基材的製造方法、使用該基材的表面保護薄膜及附表面保護薄膜的光學薄膜Substrate for surface protection film, method for producing the substrate, surface protection film using the substrate, and optical film with surface protection film

發明領域 本發明涉及表面保護薄膜用基材、該基材的製造方法、使用該基材的表面保護薄膜、及附表面保護薄膜的光學薄膜。Field of invention The present invention relates to a substrate for a surface protection film, a method for manufacturing the substrate, a surface protection film using the substrate, and an optical film with a surface protection film.

發明背景 對於光學薄膜(例如,偏光板、包含偏光板的層疊體),為了在直至應用該光學薄膜的影像顯示裝置實際使用之前的期間保護該光學薄膜(最終為影像顯示裝置),以可剝離的方式貼合有表面保護薄膜。實用中,將光學薄膜/表面保護薄膜的層疊體貼合於顯示單元來製作影像顯示裝置,在貼合有該層疊體的狀態下將影像顯示裝置供於光學試驗(例如,點亮試驗),在之後的適當時機將表面保護薄膜剝離去除。表面保護薄膜代表性地具有作為基材的樹脂薄膜和黏著劑層。利用以往的表面保護薄膜,有時在光學檢查時發生漏光、著色、彩虹狀不均勻等,成為光學檢查精度降低的原因。其結果,有時儘管影像顯示裝置自身沒有問題,在出廠前的光學檢查中也會被判斷為不良,由此,存在從影像顯示裝置的製造到出廠為止的效率降低的問題。進而,對於表面保護薄膜(實質上為基材),考慮貼合時及剝離時的操作性,要求優異的撓性。 現有技術文獻 專利文獻Background of the invention For the optical film (for example, a polarizing plate, a laminate including the polarizing plate), in order to protect the optical film (eventually the image display device) until the actual use of the image display device to which the optical film is applied, it is peelable A surface protection film is attached. In practice, an image display device is produced by laminating an optical film/surface protective film laminate to a display unit, and the image display device is subjected to an optical test (for example, a lighting test) with the laminate attached. After the appropriate time, the surface protection film is peeled off and removed. The surface protective film typically has a resin film as a base material and an adhesive layer. With the conventional surface protection film, light leakage, coloring, rainbow-like unevenness, etc. may occur during optical inspection, which may cause a decrease in the accuracy of optical inspection. As a result, although there is no problem with the image display device itself, it may be judged to be defective in the optical inspection before shipment, and thus there is a problem that the efficiency from the manufacture of the image display device to the shipment is reduced. Furthermore, the surface protection film (substantially a base material) requires excellent flexibility in consideration of handling properties during bonding and peeling. Existing technical literature Patent Literature

專利文獻1:日本特開2017-190406號公報Patent Document 1: Japanese Patent Laid-Open No. 2017-190406

發明概要 發明所欲解決之課題 本發明是為了解決上述現有問題而作出的,其主要目的在於,提供具有優異撓性或耐彎折性、並且可良好地抑制光學檢查時的漏光、著色及彩虹狀不均勻的表面保護薄膜用基材。 用以解決課題之手段Summary of the invention Problems to be solved by the invention The present invention has been made to solve the above-mentioned existing problems, and its main object is to provide a surface protection film having excellent flexibility or bending resistance and capable of suppressing light leakage, coloring, and rainbow-like unevenness during optical inspection Substrate. Means to solve the problem

本發明實施方式的表面保護薄膜用基材由包含丙烯酸類樹脂和彈性體的薄膜構成,面內相位差Re(550)為30nm以下,MIT試驗中直至斷裂為止的彎折次數為500次以上,相對於該丙烯酸類樹脂100重量份,包含6重量份以上該彈性體。 1個實施方式中,上述丙烯酸類樹脂具有選自於由戊二醯亞胺單元、內酯環單元、馬來酸酐單元、馬來醯亞胺單元及戊二酸酐單元所構成群組中之至少1者。 1個實施方式中,上述彈性體為選自於橡膠狀聚合物、聚醯胺系彈性體、聚乙烯系彈性體、苯乙烯系彈性體及丁二烯系彈性體中之至少1者。 1個實施方式中,上述表面保護薄膜用基材的總透光率為80%以上,霧度為1.0%以下。 根據本發明的另一方面,提供上述表面保護薄膜用基材的製造方法。該製造方法包含:將包含丙烯酸類樹脂和彈性體的薄膜形成材料成形為薄膜狀;及對該經成形之薄膜進行逐次雙軸拉伸或同時雙軸拉伸。 1個實施方式中,上述製造方法中,上述逐次雙軸拉伸或同時雙軸拉伸中的拉伸溫度為Tg+10℃~Tg+30℃。 根據本發明的又一方面,提供表面保護薄膜。該表面保護薄膜包含上述表面保護薄膜用基材和黏著劑層。 根據本發明的又一方面,提供附表面保護薄膜的光學薄膜。該附表面保護薄膜的光學薄膜包含:光學薄膜和上述表面保護薄膜,且上述表面保護薄膜以可剝離的方式貼合於該光學薄膜。 發明效果The substrate for a surface protection film according to an embodiment of the present invention is composed of a film containing an acrylic resin and an elastomer, the in-plane retardation Re (550) is 30 nm or less, and the number of bending times until breakage in the MIT test is 500 or more. It contains 6 parts by weight or more of the elastomer with respect to 100 parts by weight of the acrylic resin. In one embodiment, the acrylic resin has at least one selected from the group consisting of glutarimide units, lactone ring units, maleic anhydride units, maleimide units, and glutaric anhydride units 1 of them. In one embodiment, the above-mentioned elastomer is at least one selected from the group consisting of rubber-like polymers, polyamide-based elastomers, polyethylene-based elastomers, styrene-based elastomers, and butadiene-based elastomers. In one embodiment, the total light transmittance of the substrate for a surface protection film is 80% or more, and the haze is 1.0% or less. According to another aspect of the present invention, there is provided a method for manufacturing the substrate for a surface protection film. The manufacturing method includes: forming a film-forming material containing an acrylic resin and an elastomer into a film shape; and successively biaxially stretching or simultaneously biaxially stretching the formed film. In one embodiment, in the manufacturing method described above, the stretching temperature in the sequential biaxial stretching or simultaneous biaxial stretching is Tg+10°C to Tg+30°C. According to yet another aspect of the present invention, a surface protection film is provided. The surface protection film includes the substrate for the surface protection film and the adhesive layer. According to yet another aspect of the present invention, an optical film with a surface protective film is provided. The optical film with a surface protection film includes an optical film and the surface protection film, and the surface protection film is attached to the optical film in a peelable manner. Effect of invention

根據本發明的實施方式,藉由對包含丙烯酸類樹脂和彈性體的薄膜在預定拉伸條件(例如,拉伸溫度及拉伸速度)下進行拉伸,能夠實現兼顧非常小面內相位差和優異撓性或耐彎折性的表面保護薄膜用基材。According to an embodiment of the present invention, by stretching a film containing an acrylic resin and an elastomer under predetermined stretching conditions (for example, stretching temperature and stretching speed), it is possible to achieve a balance between very small in-plane retardation and Base material for surface protection film with excellent flexibility or bending resistance.

較佳實施形態之詳細說明 以下,對本發明的優選實施方式進行說明,但本發明不限定於這些實施方式。Detailed description of preferred embodiments Hereinafter, preferred embodiments of the present invention will be described, but the present invention is not limited to these embodiments.

A.表面保護薄膜用基材 本發明的實施方式的表面保護薄膜用基材是由薄膜構成,該薄膜包含丙烯酸類樹脂和彈性體。A. Base material for surface protection film The substrate for a surface protection film according to an embodiment of the present invention is composed of a film including acrylic resin and elastomer.

作為丙烯酸類樹脂,可以採用任意適當的丙烯酸類樹脂。對於丙烯酸類樹脂,代表性的是,在單體單元方面含有(甲基)丙烯酸烷基酯作為主成分。本說明書中,「(甲基)丙烯酸」是指丙烯酸及/或甲基丙烯酸。作為構成丙烯酸類樹脂的主骨架的(甲基)丙烯酸烷基酯,可以例示出直鏈狀或支鏈狀烷基的碳數1~18的(甲基)丙烯酸烷基酯。它們可以單獨使用或組合使用。進而,可以通過共聚對丙烯酸類樹脂導入任意適當的共聚單體。這樣的共聚單體的種類、數量、共聚比等可以根據目的來適當地設定。對於丙烯酸類樹脂的主骨架的構成成分(單體單元),參照通式(2)在後面進行敘述。As the acrylic resin, any appropriate acrylic resin can be used. The acrylic resin typically contains alkyl (meth)acrylate as the main component in the monomer unit. In this specification, "(meth)acrylic acid" means acrylic acid and/or methacrylic acid. As the (meth)acrylic acid alkyl ester constituting the main skeleton of the acrylic resin, a linear or branched alkyl group having 1 to 18 carbon atoms (meth)acrylic acid alkyl ester can be exemplified. They can be used alone or in combination. Furthermore, any appropriate comonomer can be introduced into the acrylic resin by copolymerization. The kind, number, copolymerization ratio, etc. of such a comonomer can be appropriately set according to purposes. The constituent components (monomer units) of the main skeleton of the acrylic resin will be described later with reference to the general formula (2).

丙烯酸類樹脂優選具有選自戊二醯亞胺單元、內酯環單元、馬來酸酐單元、馬來醯亞胺單元及戊二酸酐單元中的結構單元。丙烯酸類樹脂可以僅具有這些結構單元中的1種,也可以具有多種。具有內酯環單元的丙烯酸類樹脂例如記載於日本特開2008-181078號公報,該公報的記載作為參考被援引至本說明書中。戊二醯亞胺單元優選由下述通式(1)表示。The acrylic resin preferably has a structural unit selected from glutarimide units, lactone ring units, maleic anhydride units, maleimide units, and glutaric anhydride units. The acrylic resin may have only one kind of these structural units, or plural kinds. An acrylic resin having a lactone ring unit is described in, for example, Japanese Patent Laid-Open No. 2008-181078, and the description of this publication is incorporated by reference in this specification. Glutarimide units are preferably represented by the following general formula (1).

[化學式1]

Figure 02_image001
[Chemical Formula 1]
Figure 02_image001

通式(1)中,R1 及R2 各自獨立地表示氫或碳數1~8的烷基,R3 表示碳數1~18的烷基、碳數3~12的環烷基、或碳數6~10的芳基。通式(1)中,優選的是,R1 及R2 各自獨立地為氫或甲基,R3 為氫、甲基、丁基或環己基。更優選R1 為甲基、R2 為氫、R3 為甲基。In the general formula (1), R 1 and R 2 each independently represent hydrogen or a C 1-8 alkyl group, R 3 represents a C 1-18 alkyl group, a C 3-12 cycloalkyl group, or Aryl groups with 6 to 10 carbon atoms. In the general formula (1), it is preferred that R 1 and R 2 are each independently hydrogen or methyl, and R 3 is hydrogen, methyl, butyl, or cyclohexyl. More preferably, R 1 is methyl, R 2 is hydrogen, and R 3 is methyl.

上述(甲基)丙烯酸烷基酯代表性的是由下述通式(2)表示。The above-mentioned alkyl (meth)acrylate is typically represented by the following general formula (2).

[化學式2]

Figure 02_image003
[Chemical Formula 2]
Figure 02_image003

通式(2)中,R4 表示氫原子或甲基,R5 表示氫原子、或亦可被取代的碳數1~6的脂肪族或脂環式烴基。作為取代基,例如,可列舉出鹵素、羥基。作為(甲基)丙烯酸烷基酯的具體例,可列舉出(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸叔丁酯、(甲基)丙烯酸正己酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸氯甲酯、(甲基)丙烯酸2-氯乙酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸3-羥基丙酯、(甲基)丙烯酸2,3,4,5,6-五羥基己酯及(甲基)丙烯酸2,3,4,5-四羥基戊酯。通式(2)中,R5 優選為氫原子或甲基。因此,特別優選的(甲基)丙烯酸烷基酯為丙烯酸甲酯或甲基丙烯酸甲酯。In the general formula (2), R 4 represents a hydrogen atom or a methyl group, and R 5 represents a hydrogen atom, or an optionally substituted aliphatic or alicyclic hydrocarbon group having 1 to 6 carbon atoms. Examples of the substituent include halogen and hydroxyl. Specific examples of the alkyl (meth)acrylate include methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, n-butyl (meth)acrylate, Tert-butyl (meth)acrylate, n-hexyl (meth)acrylate, cyclohexyl (meth)acrylate, chloromethyl (meth)acrylate, 2-chloroethyl (meth)acrylate, (meth) 2-hydroxyethyl acrylate, 3-hydroxypropyl (meth)acrylate, 2,3,4,5,6-pentahydroxyhexyl (meth)acrylate and 2,3,4,5 (meth)acrylate -Tetrahydroxypentyl ester. In the general formula (2), R 5 is preferably a hydrogen atom or a methyl group. Therefore, a particularly preferred alkyl (meth)acrylate is methyl acrylate or methyl methacrylate.

上述丙烯酸類樹脂可以僅包含單一的戊二醯亞胺單元,也可以包含上述通式(1)中的R1 、R2 及R3 不同的多種戊二醯亞胺單元。The acrylic resin may include only a single glutarimide unit, or may include multiple glutarimide units different in R 1 , R 2, and R 3 in the general formula (1).

上述丙烯酸類樹脂中的戊二醯亞胺單元的含有比例優選為2莫耳%~50莫耳%、更優選為2莫耳%~45莫耳%、進一步優選為2莫耳%~40莫耳%、特別優選為2莫耳%~35莫耳%、最優選為3莫耳%~30莫耳%。若含有比例比2莫耳%少,則有不能充分發揮源自戊二醯亞胺單元所表現出的效果(例如,高光學特性、高機械強度、與偏光件的優異接著性、薄型化)之虞。若含有比例超過50莫耳%,則有例如耐熱性、透明性變不充分之憂。再者,丙烯酸類樹脂中,代替戊二醯亞胺單元或在戊二醯亞胺單元的基礎上具有內酯環單元、馬來酸酐單元、馬來醯亞胺單元及/或戊二酸酐單元的情況下,上述含有比例可以為這些結構單元的合計的含有比例。The content ratio of glutarimide units in the acrylic resin is preferably 2 mol% to 50 mol%, more preferably 2 mol% to 45 mol%, and still more preferably 2 mol% to 40 mol Ear %, particularly preferably 2 mol% to 35 mol %, most preferably 3 mol% to 30 mol %. If the content ratio is less than 2 mol%, the effects derived from glutarimide units may not be fully exhibited (for example, high optical characteristics, high mechanical strength, excellent adhesion to polarizers, thinning) Worry. If the content exceeds 50 mol%, for example, heat resistance and transparency may be insufficient. Furthermore, in the acrylic resin, the glutarimide unit is substituted for or has a lactone ring unit, maleic anhydride unit, maleimide unit and/or glutaric anhydride unit on the basis of the glutarimide unit. In the case of the above, the above content ratio may be the total content ratio of these structural units.

上述丙烯酸類樹脂可以僅包含單一的(甲基)丙烯酸烷基酯單元,也可以包含上述通式(2)中的R4 及R5 不同的多種(甲基)丙烯酸烷基酯單元。The acrylic resin may include only a single alkyl (meth)acrylate unit, or may include multiple alkyl (meth)acrylate units having different R 4 and R 5 in the general formula (2).

上述丙烯酸類樹脂中的(甲基)丙烯酸烷基酯單元的含有比例優選為50莫耳%~98莫耳%、更優選為55莫耳%~98莫耳%、進一步優選為60莫耳%~98莫耳%、特別優選為65莫耳%~98莫耳%、最優選為70莫耳%~97莫耳%。若含有比例比50莫耳%少,則有不能充分發揮源自(甲基)丙烯酸烷基酯單元所表現出的效果(例如,高的耐熱性、高的透明性)之虞。若上述含有比例比98莫耳%多,則有樹脂變脆而容易破裂、不能充分發揮高機械強度、生產率差之虞。The content ratio of the (meth)acrylic acid alkyl ester unit in the acrylic resin is preferably 50 mol% to 98 mol%, more preferably 55 mol% to 98 mol%, and still more preferably 60 mol% ~98 mol%, particularly preferably 65 mol% to 98 mol%, most preferably 70 mol% to 97 mol%. If the content ratio is less than 50 mol %, there is a possibility that the effects (for example, high heat resistance and high transparency) derived from the alkyl (meth)acrylate unit cannot be fully exhibited. If the above content ratio is more than 98 mol%, the resin may become brittle and easily break, and the high mechanical strength may not be fully exhibited, and productivity may be poor.

上述丙烯酸類樹脂也可以包含除(甲基)丙烯酸烷基酯單元、以及戊二醯亞胺單元、內酯環單元、馬來酸酐單元、馬來醯亞胺單元及/或戊二酸酐單元以外的單元。例如,丙烯酸類樹脂可以含有除上述以外之能共聚的乙烯基系單體單元(其他乙烯基系單體單元)。作為其他乙烯基系單體,例如,可列舉出丙烯腈、甲基丙烯腈、乙基丙烯腈、烯丙基環氧丙基醚、馬來酸酐、衣康酸酐、N-甲基馬來醯亞胺、N-乙基馬來醯亞胺、N-環己基馬來醯亞胺、丙烯酸胺基乙酯、丙烯酸丙基胺基乙酯、甲基丙烯酸二甲基胺基乙酯、甲基丙烯酸乙基胺基丙酯、甲基丙烯酸環己基胺基乙酯、N-乙烯基二乙基胺、N-乙醯基乙烯胺、烯丙基胺、甲基烯丙基胺、N-甲基烯丙基胺、2-異丙烯基

Figure 108123605-A0304-12-0059-1
唑啉、2-乙烯基
Figure 108123605-A0304-12-0059-1
唑啉、2-丙烯醯基
Figure 108123605-A0304-12-0059-1
唑啉、N-苯基馬來醯亞胺、甲基丙烯酸苯基胺基乙酯、苯乙烯、α-甲基苯乙烯、對環氧丙基苯乙烯、對胺基苯乙烯、2-苯乙烯基
Figure 108123605-A0304-12-0059-1
唑啉等。這些可以單獨使用,也可以組合使用。優選為苯乙烯、α-甲基苯乙烯等苯乙烯系單體。其他乙烯基系單體單元的含有比例優選為0~1重量%、更優選為0~0.1重量%。若為這樣的範圍,能夠抑制不期望的相位差展現及透明性降低。The acrylic resin may contain other than alkyl (meth)acrylate units, glutarimide units, lactone ring units, maleic anhydride units, maleimide units and/or glutaric anhydride units Unit. For example, the acrylic resin may contain vinyl monomer units (other vinyl monomer units) that can be copolymerized in addition to the above. Examples of other vinyl-based monomers include acrylonitrile, methacrylonitrile, ethacrylonitrile, allyl epoxypropyl ether, maleic anhydride, itaconic anhydride, and N-methylmaleimide. Imine, N-ethylmaleimide, N-cyclohexylmaleimide, aminoethyl acrylate, propylaminoethyl acrylate, dimethylaminoethyl methacrylate, methyl Ethylaminopropyl acrylate, cyclohexylaminoethyl methacrylate, N-vinyl diethylamine, N-acetyl vinylamine, allylamine, methallylamine, N-methyl Allylamine, 2-isopropenyl
Figure 108123605-A0304-12-0059-1
Oxazoline, 2-vinyl
Figure 108123605-A0304-12-0059-1
Oxazoline, 2-propenyl
Figure 108123605-A0304-12-0059-1
Oxazoline, N-phenylmaleimide, phenylaminoethyl methacrylate, styrene, α-methylstyrene, p-epoxypropylstyrene, p-aminostyrene, 2-benzene Vinyl
Figure 108123605-A0304-12-0059-1
Oxazoline etc. These can be used alone or in combination. Styrene-based monomers such as styrene and α-methylstyrene are preferred. The content ratio of other vinyl-based monomer units is preferably 0 to 1% by weight, and more preferably 0 to 0.1% by weight. Within such a range, it is possible to suppress undesired phase difference development and decrease in transparency.

上述丙烯酸類樹脂的醯亞胺化率優選為2.5%~20.0%。醯亞胺化率為這樣的範圍時,可得到耐熱性、透明性及成形加工性優異的樹脂,可防止薄膜成形時焦糊的發生、機械強度降低。上述丙烯酸類樹脂中,醯亞胺化率用戊二醯亞胺單元與(甲基)丙烯酸烷基酯單元的比來表示。該比例可以根據例如丙烯酸類樹脂的NMR譜、IR譜等來得到。本實施方式中,醯亞胺化率可以使用1 HNMR BRUKER AvanceIII(400MHz)通過樹脂的1 H-NMR測定來求出。更具體而言,將3.5~3.8ppm附近的源自(甲基)丙烯酸烷基酯的O-CH3 質子的峰面積設為A、將3.0~3.3ppm附近的源自戊二醯亞胺的N-CH3 質子的峰的面積設為B,通過下式求出。 醯亞胺化率Im(%)={B/(A+B)}×100The amidation rate of the acrylic resin is preferably 2.5% to 20.0%. When the imidate ratio is in such a range, a resin excellent in heat resistance, transparency, and moldability can be obtained, and the occurrence of scorching during film formation and reduction in mechanical strength can be prevented. In the above-mentioned acrylic resin, the imidate ratio is expressed by the ratio of glutarimide units to alkyl (meth)acrylate units. This ratio can be obtained from, for example, NMR spectrum, IR spectrum, etc. of acrylic resin. In the present embodiment, the imidate ratio can be determined by 1 H-NMR measurement of the resin using 1 HNMR BRUKER Avance III (400 MHz). More specifically, the peak area of the O-CH 3 proton derived from the alkyl (meth)acrylate near 3.5 to 3.8 ppm is set to A, and the glutarimide-derived one near 3.0 to 3.3 ppm is used. The area of the peak of the N-CH 3 proton is defined as B, and it is determined by the following formula. Acetylimidization rate Im(%)={B/(A+B)}×100

上述丙烯酸類樹脂的酸值優選為0.10mmol/g~0.50mmol/g。酸值為這樣的範圍時,能夠得到耐熱性、機械物性及成形加工性的平衡優異的樹脂。若酸值過小,則有時會產生如下問題:為了調整為期望的酸值而使用改性劑所導致的成本上升、改性劑殘留導致的凝膠狀物產生等。若酸值過大,則有容易引起薄膜成形時(例如,熔融擠出時)的發泡、成形品生產率降低的傾向。上述丙烯酸類樹脂中,酸值為該丙烯酸類樹脂中的羧酸單元及羧酸酐單元的含量。本實施方式中,酸值例如可以通過WO2005/054311或日本特開2005-23272號公報中記載的滴定法來算出。The acid value of the acrylic resin is preferably 0.10 mmol/g to 0.50 mmol/g. When the acid value is in such a range, a resin having an excellent balance of heat resistance, mechanical properties, and moldability can be obtained. If the acid value is too small, there may be problems such as an increase in cost due to the use of the modifier to adjust to the desired acid value, generation of a gel-like substance due to residual modifier, and the like. If the acid value is too large, it tends to cause foaming during film forming (for example, during melt extrusion), and the productivity of the molded product tends to decrease. In the acrylic resin, the acid value is the content of carboxylic acid units and carboxylic anhydride units in the acrylic resin. In this embodiment, the acid value can be calculated by, for example, the titration method described in WO2005/054311 or JP-A-2005-23272.

丙烯酸類樹脂、其製造方法及其特性等的詳細情況例如記載於日本特開2016-139027號公報、日本特開2007-316366號公報及日本特開2008-181078號公報,這些公報的記載作為參考被援引至本說明書中。The details of the acrylic resin, its manufacturing method, and its characteristics are described in, for example, Japanese Patent Laid-Open No. 2016-139027, Japanese Patent Laid-Open No. 2007-316366, and Japanese Patent Laid-Open No. 2008-181078. It is cited in this specification.

作為彈性體,可以採用任意適當的彈性體。彈性體代表性的是具有能作為假交聯點發揮作用的硬鏈段和主要能有助於彈性的軟鏈段。作為彈性體的代表例,可列舉出橡膠狀聚合物、聚醯胺系彈性體、聚乙烯系彈性體、苯乙烯系彈性體及丁二烯系彈性體。彈性體可以單獨使用,也可以組合使用。彈性體可以根據期望的特性來適當地選擇。例如,從光學特性設計容易的觀點出發,可以採用苯乙烯系彈性體。作為苯乙烯系彈性體的代表例,可列舉出具有作為硬鏈段的聚苯乙烯和作為軟鏈段的聚丁二烯、聚異戊二烯、或聚丁二烯與聚異戊二烯的共聚物的苯乙烯系彈性體、及它們的氫化物。再者,氫化物可以為聚丁二烯、聚異戊二烯等的一部分進行了氫化而成者、也可以為全部進行了氫化而成者。作為苯乙烯系彈性體,可以使用市售品。作為苯乙烯系彈性體的市售品,例如,可列舉出Tuftec、Tufprene(以上為Asahi Kasei Chemicals Corporation製)、Kraton(Kraton Corporation製)、DYNARON、JSR TR、JSR SIS(以上為JSR公司製)、SEPTON(KURARAY CO.,LTD製)、RABALON (Mitsubishi Chemical Corporation製)等。作為聚乙烯系彈性體,優選具有50份以上乙烯嵌段的聚乙烯系彈性體,作為市售品,可列舉出EXCELLEN FX(住友化學(股))等。聚醯胺系彈性體優選具有聚醚嵌段體,作為市售品,可列舉出Pebax(東京材料(股)製)等。作為橡膠狀聚合物,優選核殼型的顆粒,作為市售品,可列舉出W-300(Mitsubishi Chemical Corporation製)等。As the elastomer, any appropriate elastomer can be used. Elastomers typically have a hard segment that can function as a pseudo-crosslinking point and a soft segment that mainly contributes to elasticity. Representative examples of the elastomer include rubber-like polymers, polyamide-based elastomers, polyethylene-based elastomers, styrene-based elastomers, and butadiene-based elastomers. The elastomer can be used alone or in combination. The elastomer can be appropriately selected according to the desired characteristics. For example, from the viewpoint of easy design of optical characteristics, a styrene-based elastomer can be used. Representative examples of styrene-based elastomers include polystyrene having hard segments and polybutadiene, polyisoprene, or polybutadiene and polyisoprene as soft segments. Copolymers of styrene elastomers and their hydrides. In addition, the hydride may be obtained by partially hydrogenating polybutadiene, polyisoprene, or the like, or may be obtained by hydrogenating all of them. As the styrene-based elastomer, commercially available products can be used. Examples of commercially available styrene elastomers include Tuftec, Tufprene (manufactured by Asahi Kasei Chemicals Corporation above), Kraton (manufactured by Kraton Corporation), DYNARON, JSR TR, and JSR SIS (manufactured by JSR Corporation). , SEPTON (manufactured by KURARAY CO., LTD), RABALON (manufactured by Mitsubishi Chemical Corporation), etc. As the polyethylene-based elastomer, a polyethylene-based elastomer having 50 parts or more of ethylene blocks is preferable, and examples of commercially available products include EXCELLEN FX (Sumitomo Chemical Co., Ltd.) and the like. The polyamido-based elastomer preferably has a polyether block. Examples of commercially available products include Pebax (manufactured by Tokyo Materials Co., Ltd.) and the like. The rubber-like polymer is preferably a core-shell type particle, and as a commercially available product, W-300 (manufactured by Mitsubishi Chemical Corporation) and the like can be cited.

彈性體的配混量相對於丙烯酸類樹脂100重量份為6重量份以上、優選為6重量份~30重量份、更優選為8重量份~20重量份。彈性體的配混量為這樣的範圍時,能夠實現兼顧了非常小面內相位差和優異撓性或耐彎折性的表面保護薄膜用基材。The compounding amount of the elastomer is 6 parts by weight or more relative to 100 parts by weight of the acrylic resin, preferably 6 to 30 parts by weight, and more preferably 8 to 20 parts by weight. When the blending amount of the elastomer is within such a range, it is possible to realize a substrate for a surface protection film that combines both very small in-plane retardation and excellent flexibility or bending resistance.

本發明的實施方式中,表面保護薄膜用基材的面內相位差Re(550)為30nm以下,優選為10nm以下、更優選為5nm以下、進一步優選為3nm以下、特別優選為2.5nm以下。面內相位差Re(550)越小越優選,其下限理想的是0nm,例如可以為0.1nm。面內相位差Re(550)為這樣的範圍時,將使用了本發明的表面保護薄膜用基材的表面保護薄膜供於影像顯示裝置的光學檢查時,能夠良好地抑制漏光、著色及彩虹狀不均勻。其結果,能夠顯著地提高影像顯示裝置的光學檢查精度,能夠提高從影像顯示裝置從製造到出廠為止的效率。這樣的面內相位差Re(550)可以通過在後述預定拉伸條件下對包含如上述特定丙烯酸類樹脂和特定彈性體的薄膜進行拉伸來實現。再者,本說明書中,「Re(λ) 」為在23℃下以波長λnm的光測得的面內相位差。對於Re(λ),將層(薄膜)的厚度設為d(nm)時,根據式:Re=(nx-ny)×d來求出。因此,「Re(550)」為在23℃下以波長550nm的光測得的面內相位差。此處,「nx」為面內的折射率成為最大的方向(即慢軸方向)的折射率,「ny」為在面內與慢軸正交的方向(即快軸方向)的折射率。In the embodiment of the present invention, the in-plane retardation Re(550) of the substrate for a surface protection film is 30 nm or less, preferably 10 nm or less, more preferably 5 nm or less, further preferably 3 nm or less, and particularly preferably 2.5 nm or less. The smaller the in-plane phase difference Re(550) is, the more preferable. The lower limit is ideally 0 nm, for example, it may be 0.1 nm. When the in-plane retardation Re(550) is in such a range, when the surface protective film using the substrate for surface protective film of the present invention is used for optical inspection of an image display device, light leakage, coloring, and iridescence can be suppressed well Uneven. As a result, the optical inspection accuracy of the video display device can be significantly improved, and the efficiency from the manufacturing of the video display device to the shipment can be improved. Such an in-plane retardation Re (550) can be achieved by stretching a film containing the above-mentioned specific acrylic resin and a specific elastomer under predetermined stretching conditions described below. In addition, in this specification, "Re(λ)" is an in-plane phase difference measured with light of a wavelength λnm at 23°C. Re (λ), when the thickness of the layer (thin film) is d (nm), is calculated according to the formula: Re=(nx-ny)×d. Therefore, "Re(550)" is the in-plane retardation measured at 23°C with light having a wavelength of 550 nm. Here, "nx" is the refractive index in the direction in which the in-plane refractive index becomes maximum (that is, the slow axis direction), and "ny" is the refractive index in the direction orthogonal to the slow axis (that is, the fast axis direction) in the plane.

表面保護薄膜用基材的厚度方向相位差Rth(550)優選為50nm以下、更優選為25nm以下、進一步優選為15nm以下、特別優選為10nm以下。厚度方向相位差Rth(550)越小越優選,其下限理想的是0nm,例如可以為0.5nm。厚度方向相位差Rth(550)為這樣的範圍時,能夠良好地抑制上述光學檢查中傾斜方向的漏光、著色及彩虹狀不均勻。其結果,在大型的影像顯示裝置的光學檢查中也能夠顯著提高精度。表面保護薄膜用基材的Nz係數優選為1.1~20、更優選為1.5~5.4。因此,表面保護薄膜用基材的折射率特性可以顯示例如nx>ny>nz的關係。Nz係數為這樣的範圍時,能夠進一步良好地抑制光學檢查中傾斜方向的漏光、著色及彩虹狀不均勻。「Rth(λ)」為在23℃下以波長λnm的光測得的厚度方向的相位差。對於Rth(λ),將層(薄膜)的厚度設為d(nm)時,根據式:Rth=(nx-nz)×d來求出。因此,「Rth(550)」為在23℃下以波長550nm的光測得的厚度方向的相位差。此處,「nz」為厚度方向的折射率。進而,「Nz係數」通過Nz=Rth(λ)/Re(λ)來求出。The thickness direction phase difference Rth(550) of the substrate for a surface protection film is preferably 50 nm or less, more preferably 25 nm or less, still more preferably 15 nm or less, and particularly preferably 10 nm or less. The smaller the thickness direction phase difference Rth(550), the more preferable, and the lower limit is ideally 0 nm, for example, 0.5 nm. When the thickness direction phase difference Rth(550) is within such a range, light leakage, coloring, and rainbow-like unevenness in the oblique direction in the optical inspection can be suppressed well. As a result, it is possible to significantly improve the accuracy even in the optical inspection of a large image display device. The Nz coefficient of the substrate for surface protection film is preferably 1.1 to 20, and more preferably 1.5 to 5.4. Therefore, the refractive index characteristic of the base material for surface protection films can show the relationship of nx>ny>nz, for example. When the Nz coefficient is in such a range, light leakage, coloring, and rainbow-like unevenness in the oblique direction during optical inspection can be further satisfactorily suppressed. "Rth(λ)" is a phase difference in the thickness direction measured at 23°C with light having a wavelength of λnm. Regarding Rth(λ), when the thickness of the layer (thin film) is d (nm), it is obtained from the formula: Rth=(nx-nz)×d. Therefore, "Rth(550)" is the phase difference in the thickness direction measured at 23°C with light having a wavelength of 550 nm. Here, "nz" is the refractive index in the thickness direction. Furthermore, the "Nz coefficient" is obtained by Nz=Rth(λ)/Re(λ).

表面保護薄膜用基材,可以顯示面內相位差因應測定光的波長而變大的逆色散波長特性、也可以顯示面內相位差因應測定光的波長而變小的正波長色散特性、還可以顯示面內相位差基本不隨測定光的波長發生變化的平坦波長色散特性。The substrate for surface protective film can display the inverse dispersion wavelength characteristic that the in-plane phase difference becomes larger according to the wavelength of the measurement light, or the positive wavelength dispersion characteristic that the in-plane phase difference becomes smaller according to the measurement light wavelength, or The flat-wavelength dispersion characteristic that the in-plane phase difference basically does not change with the wavelength of the measurement light.

表面保護薄膜用基材的總透光率優選為80%以上、更優選為85%以上、進一步優選為90%以上、特別優選為95%以上。進而,表面保護薄膜用基材的霧度優選為1.0%以下、更優選為0.7%以下、進一步優選為0.5%以下、特別優選為0.3%以下。根據本發明的實施方式,能夠實現具有如上所述的非常小面內相位差Re(550)、並且具有這樣非常優異透明性的表面保護薄膜用基材。The total light transmittance of the substrate for a surface protective film is preferably 80% or more, more preferably 85% or more, still more preferably 90% or more, and particularly preferably 95% or more. Furthermore, the haze of the substrate for a surface protection film is preferably 1.0% or less, more preferably 0.7% or less, still more preferably 0.5% or less, and particularly preferably 0.3% or less. According to the embodiment of the present invention, it is possible to realize a substrate for a surface protection film having a very small in-plane retardation Re (550) as described above and having such a very excellent transparency.

本發明的實施方式中,表面保護薄膜用基材在MIT試驗中直至斷裂為止的彎折次數為500次以上,優選為1000次以上、更優選為1500次以上、進一步優選為2000次以上。即,表面保護薄膜用基材能具有非常優異的撓性或耐彎折性。由於表面保護薄膜用基材這樣優異的撓性或耐彎折性,能夠得到貼合時及剝離時的操作性優異、並且破裂得以抑制的表面保護薄膜。根據本發明的實施方式,能夠兼顧這樣優異的撓性或耐彎折性和如上所述非常小面內相位差Re(550)。能夠實現這樣的兼顧是本發明的成果之一。再者,MIT試驗可以依據JIS P 8115來進行。In the embodiment of the present invention, the number of times the substrate for a surface protective film is bent until fracture in the MIT test is 500 or more, preferably 1000 or more, more preferably 1500 or more, and still more preferably 2000 or more. That is, the substrate for a surface protective film can have very excellent flexibility or bending resistance. Due to the excellent flexibility or bending resistance of the substrate for a surface protection film, it is possible to obtain a surface protection film which is excellent in handleability at the time of bonding and peeling and which suppresses cracking. According to the embodiment of the present invention, such excellent flexibility or bending resistance and the very small in-plane retardation Re(550) as described above can be reconciled. Being able to achieve such a balance is one of the achievements of the present invention. Furthermore, the MIT test can be performed in accordance with JIS P 8115.

表面保護薄膜用基材的彈性模量優選在拉伸速度100mm/分鐘下為50MPa~350MPa。彈性模量為這樣的範圍時,能夠得到輸送性及操作性優異的表面保護薄膜。根據本發明的實施方式,能夠兼顧優異彈性模量(強度)和如上所述的優異撓性或耐彎折性(柔韌性)。再者,彈性模量依據JIS K 7127:1999來測定。The elastic modulus of the substrate for surface protection film is preferably 50 MPa to 350 MPa at a stretching speed of 100 mm/min. When the elastic modulus is in such a range, a surface protective film excellent in transportability and handleability can be obtained. According to the embodiments of the present invention, excellent elastic modulus (strength) and excellent flexibility or bending resistance (flexibility) as described above can be reconciled. In addition, the elastic modulus is measured according to JIS K 7127:1999.

表面保護薄膜用基材的拉伸伸長率優選為70%~200%。拉伸伸長率為這樣的範圍時,有在輸送中不易斷裂的優點。再者,拉伸伸長率依據JIS K 6781來測定。The tensile elongation of the substrate for surface protection film is preferably 70% to 200%. When the tensile elongation is within this range, there is an advantage that it is not easily broken during transportation. In addition, the tensile elongation is measured according to JIS K 6781.

表面保護薄膜用基材的厚度代表性的為10μm~100μm,優選為20μm~70μm。The thickness of the substrate for the surface protection film is typically 10 μm to 100 μm, preferably 20 μm to 70 μm.

B.表面保護薄膜用基材的製造方法 本發明實施方式的表面保護薄膜用基材的製造方法包括:將上述A項中記載的包含丙烯酸類樹脂和彈性體的薄膜形成材料(樹脂組合物)成形為薄膜狀、及對該經成形的薄膜進行拉伸。B. Manufacturing method of base material for surface protection film The method for manufacturing a substrate for a surface protection film according to an embodiment of the present invention includes forming a film-forming material (resin composition) containing an acrylic resin and an elastomer as described in the above item A into a film shape, and forming the The film is stretched.

薄膜形成材料除了包含上述丙烯酸類樹脂及上述彈性體以外,還可以包含其他樹脂,可以包含添加劑,也可以包含溶劑。作為添加劑,根據目的可以採用任意適當的添加劑。作為添加劑的具體例,可列舉出反應性稀釋劑、塑化劑、界面活性劑、填充劑、抗氧化劑、防老化劑、紫外線吸收劑、流平劑、觸變劑、抗靜電劑、導電材料、阻燃劑。添加劑的數量、種類、組合、添加量等可以根據目的來適當地設定。The film-forming material may contain other resins in addition to the acrylic resin and the elastomer, and may contain additives or solvents. As the additive, any appropriate additive can be adopted according to the purpose. Specific examples of additives include reactive diluents, plasticizers, surfactants, fillers, antioxidants, anti-aging agents, ultraviolet absorbers, leveling agents, thixotropic agents, antistatic agents, conductive materials ,Flame retardant. The number, kind, combination, amount of additives, etc. of the additives can be appropriately set according to the purpose.

作為由薄膜形成材料形成薄膜的方法,可以採用任意適當的成形加工法。作為具體例,可列舉出壓縮成形法、傳遞成形法、射出成形法、擠製成形法、吹塑成形法、粉末成形法、FRP成形法、流延塗佈法(例如,流延法)、壓延成形法、熱壓法等。優選擠製成形法或流延塗佈法。這是因為,能提高所得薄膜的平滑性,能夠得到良好的光學均勻性。成形條件可以根據使用的樹脂的組成、種類、表面保護薄膜用基材所期望的特性等來適宜設定。As a method of forming a thin film from a thin film forming material, any appropriate forming method can be adopted. Specific examples include compression molding method, transfer molding method, injection molding method, extrusion molding method, blow molding method, powder molding method, FRP molding method, cast coating method (for example, casting method), Calendering method, hot pressing method, etc. The extrusion molding method or the cast coating method is preferred. This is because the smoothness of the obtained film can be improved, and good optical uniformity can be obtained. The molding conditions can be appropriately set according to the composition and type of the resin used, desired characteristics of the substrate for surface protection film, and the like.

薄膜的拉伸方法代表性的為雙軸拉伸,更詳細而言為逐次雙軸拉伸或同時雙軸拉伸。這是因為,可得到面內相位差Re(550)小、並且撓性或耐彎折性優異的表面保護薄膜用基材。逐次雙軸拉伸或同時雙軸拉伸代表性的是使用拉幅機來進行。因此,薄膜的拉伸方向代表性的為薄膜的長度方向及寬度方向。The film stretching method is typically biaxial stretching, more specifically, sequential biaxial stretching or simultaneous biaxial stretching. This is because a substrate for a surface protection film having a small in-plane retardation Re (550) and excellent flexibility or bending resistance can be obtained. Successive biaxial stretching or simultaneous biaxial stretching is typically performed using a tenter. Therefore, the stretching direction of the film is typically the longitudinal direction and the width direction of the film.

拉伸溫度可以根據表面保護薄膜用基材所期望的面內相位差及厚度、使用的樹脂的種類、使用的薄膜的厚度、拉伸倍率等來變化。具體而言,拉伸溫度相對於薄膜的玻璃轉變溫度(Tg)優選為Tg+5℃~Tg+50℃、更優選為Tg+10℃~Tg+30℃。通過以這樣的溫度進行拉伸,本發明的實施方式中可得到具有適當特性的表面保護薄膜用基材。The stretching temperature can be changed according to the desired in-plane retardation and thickness of the substrate for a surface protective film, the type of resin used, the thickness of the film used, the stretching ratio, and the like. Specifically, the stretching temperature relative to the glass transition temperature (Tg) of the film is preferably Tg+5°C to Tg+50°C, and more preferably Tg+10°C to Tg+30°C. By stretching at such a temperature, in the embodiment of the present invention, a substrate for a surface protection film having appropriate characteristics can be obtained.

拉伸倍率可以根據表面保護薄膜用基材所期望的面內相位差及厚度、使用的樹脂的種類、使用的薄膜的厚度、拉伸溫度等來變化。採用雙軸拉伸(例如,逐次雙軸拉伸或同時雙軸拉伸)的情況下,第1方向(例如,長度方向)的拉伸倍率和第2方向(例如,寬度方向)的拉伸倍率優選其差盡可能小,更優選實質上相等。為這樣的構成時,可得到面內相位差Re(550)小、並且撓性或耐彎折性優異的表面保護薄膜用基材。採用雙軸拉伸(例如,逐次雙軸拉伸或同時雙軸拉伸)的情況下,拉伸倍率對於第1方向(例如,長度方向)及第2方向(例如,寬度方向)各自而言,例如可以為1.1倍~3.0倍。The stretching ratio can be changed according to the desired in-plane retardation and thickness of the substrate for a surface protection film, the type of resin used, the thickness of the film used, the stretching temperature, and the like. When using biaxial stretching (for example, sequential biaxial stretching or simultaneous biaxial stretching), the stretching ratio in the first direction (for example, the longitudinal direction) and the stretching in the second direction (for example, the width direction) The magnification is preferably as small as possible, and is more preferably substantially equal. With such a configuration, a substrate for a surface protection film having a small in-plane retardation Re (550) and excellent flexibility or bending resistance can be obtained. In the case of biaxial stretching (for example, sequential biaxial stretching or simultaneous biaxial stretching), the stretching ratio is for each of the first direction (for example, the longitudinal direction) and the second direction (for example, the width direction) For example, it can be 1.1 times to 3.0 times.

本發明的實施方式中,拉伸速度優選為10%/秒以下、更優選為7%/秒以下、進一步優選為5%/秒以下、特別優選為2.5%/秒以下。通過以這樣小的拉伸速度對包含如上所述的特定丙烯酸類樹脂和特定彈性體的薄膜進行拉伸,從而可得到面內相位差Re(550)小、並且撓性或耐彎折性優異的表面保護薄膜用基材。拉伸速度的下限例如可以為1.2%/秒。若拉伸速度過小,則有生產率變不實用的情況。再者,採用雙軸拉伸(例如,逐次雙軸拉伸或同時雙軸拉伸)的情況下,第1方向(例如,長度方向)的拉伸速度和第2方向(例如,寬度方向)的拉伸速度優選其差盡可能小,更優選實質上相等。為這樣的構成時,能夠進一步減小面內相位差Re(550)、並且使撓性或耐彎折性更優異。In the embodiment of the present invention, the stretching speed is preferably 10%/sec or less, more preferably 7%/sec or less, still more preferably 5%/sec or less, and particularly preferably 2.5%/sec or less. By stretching the film containing the specific acrylic resin and the specific elastomer as described above at such a small stretching speed, it is possible to obtain a small in-plane retardation Re (550) and excellent flexibility or bending resistance Substrate for surface protection film. The lower limit of the stretching speed may be, for example, 1.2%/sec. If the drawing speed is too low, the productivity may become impractical. Furthermore, in the case of biaxial stretching (eg, sequential biaxial stretching or simultaneous biaxial stretching), the stretching speed in the first direction (eg, longitudinal direction) and the second direction (eg, width direction) The stretching speed of is preferably as small as possible, and is more preferably substantially equal. With such a configuration, the in-plane retardation Re (550) can be further reduced, and the flexibility or bending resistance can be further improved.

C.表面保護薄膜 上述A項及B項中記載的表面保護薄膜用基材可以適當地用於表面保護薄膜。因此,本發明的實施方式也包括表面保護薄膜。本發明的實施方式的表面保護薄膜包含上述A項及B項中記載的表面保護薄膜用基材和黏著劑層。C. Surface protection film The substrate for a surface protection film described in the above items A and B can be suitably used for the surface protection film. Therefore, the embodiment of the present invention also includes a surface protection film. The surface protection film of the embodiment of the present invention includes the substrate for a surface protection film and the adhesive layer described in the above items A and B.

作為形成黏著劑層的黏著劑,可以採用任意適當的黏著劑。作為黏著劑的基礎樹脂,例如,可列舉出丙烯酸類樹脂、苯乙烯系樹脂、矽氧烷系樹脂、胺基甲酸酯系樹脂、橡膠系樹脂。這樣的基礎樹脂例如記載於日本特開2015-120337號公報或日本特開2011-201983號公報中。這些公報的記載作為參考而被援引至本說明書中。從耐化學藥品性、用於防止浸漬時處理液浸入的密合性、對被黏物的自由度等的觀點出發,優選丙烯酸類樹脂。作為黏著劑中可包含的交聯劑,例如,可列舉出異氰酸酯化合物、環氧化合物、氮丙啶化合物。黏著劑例如可以包含矽烷偶聯劑。黏著劑的配混處方可以根據目的及期望特性來適當地設定。As the adhesive forming the adhesive layer, any appropriate adhesive can be used. Examples of the base resin of the adhesive include acrylic resins, styrene resins, silicone resins, urethane resins, and rubber resins. Such a base resin is described in, for example, Japanese Patent Laid-Open No. 2015-120337 or Japanese Patent Laid-Open No. 2011-201983. The descriptions of these publications are incorporated into this specification by reference. From the viewpoints of chemical resistance, adhesion for preventing penetration of the treatment liquid during immersion, freedom from adherends, and the like, acrylic resins are preferred. Examples of the crosslinking agent that can be included in the adhesive include isocyanate compounds, epoxy compounds, and aziridine compounds. The adhesive may include, for example, a silane coupling agent. The compounding prescription of the adhesive can be appropriately set according to the purpose and desired characteristics.

黏著劑層的儲藏彈性模量優選為1.0×104 Pa~1.0×107 Pa、更優選為2.0×104 Pa~5.0×106 Pa。黏著劑層的儲藏彈性模量為這樣的範圍時,能夠抑制卷形成時的黏連。再者,儲藏彈性模量例如可以根據溫度23℃及角速度0.1rad/s下的動態黏彈性測定來求出。The storage elastic modulus of the adhesive layer is preferably 1.0×10 4 Pa to 1.0×10 7 Pa, and more preferably 2.0×10 4 Pa to 5.0×10 6 Pa. When the storage elastic modulus of the adhesive layer is within such a range, it is possible to suppress blocking during roll formation. In addition, the storage elastic modulus can be obtained from, for example, dynamic viscoelasticity measurement at a temperature of 23° C. and an angular velocity of 0.1 rad/s.

黏著劑層的厚度優選為1μm~60μm、更優選為3μm~30μm。若厚度過薄,則有時黏著性變不充分,在黏著界面混入氣泡等。若厚度過厚,則容易產生黏著劑滲出等不良情況。The thickness of the adhesive layer is preferably 1 μm to 60 μm, and more preferably 3 μm to 30 μm. If the thickness is too thin, the adhesiveness may become insufficient, and bubbles and the like may be mixed at the adhesive interface. If the thickness is too thick, defects such as adhesive bleed are likely to occur.

實用上,表面保護薄膜在實際使用(即,貼合於光學薄膜或影像顯示裝置)之前,以可剝離的方式在黏著劑層表面臨時黏貼分離件。通過設置分離件,從而能保護黏著劑層、並且將表面保護薄膜卷取成卷狀。作為分離件,例如,可列舉出利用矽氧烷系剝離劑、氟系剝離劑、丙烯酸長鏈烷基酯系剝離劑等剝離劑進行了表面塗佈的塑膠(例如,聚對苯二甲酸乙二醇酯(PET)、聚乙烯、聚丙烯)薄膜、不織布或紙等。對於分離件的厚度,可以根據目的來採用任意適當的厚度。分離件的厚度例如為10μm~100μm。Practically, before the actual use of the surface protection film (that is, bonding to the optical film or image display device), the separator is temporarily attached to the surface of the adhesive layer in a peelable manner. By providing the separating member, the adhesive layer can be protected, and the surface protection film can be wound into a roll shape. As the separator, for example, a plastic (for example, polyethylene terephthalate) surface-coated with a release agent such as a silicone-based release agent, a fluorine-based release agent, or a long-chain alkyl acrylate-based release agent is used. Glycol ester (PET), polyethylene, polypropylene) film, non-woven fabric or paper, etc. For the thickness of the separator, any appropriate thickness can be adopted according to the purpose. The thickness of the separator is, for example, 10 μm to 100 μm.

D.附表面保護薄膜的光學薄膜 上述C項中記載的表面保護薄膜用於在實際使用光學薄膜(最終為影像顯示裝置)之前保護該光學薄膜。因此,本發明的實施方式也包括附表面保護薄膜的光學薄膜。本發明實施方式的附表面保護薄膜的光學薄膜包含:光學薄膜、以可剝離的方式貼合於該光學薄膜的上述C項中記載的表面保護薄膜。D. Optical film with surface protection film The surface protection film described in the above item C is used to protect the optical film (actually, an image display device) before actually using the optical film. Therefore, the embodiment of the present invention also includes an optical film with a surface protective film. The optical film with a surface protection film according to an embodiment of the present invention includes an optical film and the surface protection film described in item C above that is peelably attached to the optical film.

光學薄膜可以為單一薄膜,也可以為層疊體。作為光學薄膜的具體例,可列舉出偏光件、相位差薄膜、偏光板(代表性的為偏光件與保護薄膜的層疊體)、觸控面板用導電性薄膜、表面處理薄膜、以及根據目的將它們適當地層疊而得到的層疊體(例如,防反射用圓偏光板、觸控面板用附導電層偏光板、附相位差層偏光板、稜鏡片一體型偏光板)。 實施例The optical film may be a single film or a laminate. Specific examples of the optical film include polarizers, retardation films, polarizing plates (typically laminates of polarizers and protective films), conductive films for touch panels, surface treatment films, and A laminated body obtained by appropriately laminating them (for example, a circular polarizing plate for antireflection, a polarizing plate with a conductive layer for a touch panel, a polarizing plate with a retardation layer, and a polarizing plate integrated with a sheet). Examples

以下,通過實施例具體地對本發明進行說明,但本發明不受這些實施例限定。實施例中的各特性的測定方法如下。再者,只要沒有特別說明,則實施例中的「份」及「%」為重量基準。Hereinafter, the present invention will be specifically described by examples, but the present invention is not limited to these examples. The measuring method of each characteristic in an Example is as follows. Furthermore, unless otherwise specified, "parts" and "%" in the examples are based on weight.

(1)面內相位差Re(550)及厚度方向相位差Rth(550) 將實施例及比較例中得到的表面保護薄膜用基材(雙軸拉伸薄膜)切成長度4cm及寬度4cm,作為測定試樣。對該測定試樣使用Axometrics公司製、製品名「Axoscan」測定面內相位差及厚度方向相位差。測定波長為550nm、測定溫度為23℃。 (2)霧度 對與上述(1)同樣的測定試樣,使用霧度計(村上色彩技術研究所製、HM-150型)測定霧度。測定溫度為23℃。 (3)MIT試驗 MIT試驗依據JIS P 8115來進行。具體而言,將實施例及比較例中得到的表面保護薄膜用基材(雙軸拉伸薄膜)切成長度15cm及寬度1.5cm,作為測定試樣。將測定試樣安裝於MIT耐折疲勞試驗機BE-202型(TESTER SANGYO CO,.LTD.製)(載荷1.0kgf、夾具的R:0.38mm),以試驗速度90cpm及彎折角度90°並以2000次為上限重複進行彎折,將測定試樣斷裂時的彎折次數作為試驗值。 (4)彩虹狀不均勻 將實施例及比較例中得到的表面保護薄膜用基材(雙軸拉伸薄膜)配置在交叉稜鏡狀態的2張偏光板間。此時,以表面保護薄膜用基材的長度方向與一個偏光板的透過軸方向平行的方式配置表面保護薄膜用基材。在該狀態下從下側偏光板的下側照射螢光燈的光,通過目視觀察彩虹狀不均勻的有無。按照以下的基準進行評價。 ○:未觀察到彩虹狀不均勻 △:稍微觀察到彩虹狀不均勻 ×:顯著觀察到彩虹狀不均勻 (5)撓性或耐彎折性 對表面保護薄膜用基材(雙軸拉伸薄膜)重複進行100次180°彎折試驗,確認斷裂的有無。按照以下的基準進行評價。 ○:未觀察到斷裂 ×:觀察到斷裂(1) In-plane phase difference Re (550) and thickness direction phase difference Rth (550) The base material for surface protection films (biaxially stretched film) obtained in Examples and Comparative Examples was cut into a length of 4 cm and a width of 4 cm, and used as a measurement sample. For this measurement sample, in-plane retardation and thickness direction retardation were measured using the product name "Axoscan" manufactured by Axometrics. The measurement wavelength was 550 nm and the measurement temperature was 23°C. (2) Haze For the same measurement sample as the above (1), the haze was measured using a haze meter (manufactured by Murakami Color Technology Research Institute, model HM-150). The measurement temperature was 23°C. (3) MIT test The MIT test was conducted in accordance with JIS P 8115. Specifically, the substrate for a surface protection film (biaxially stretched film) obtained in Examples and Comparative Examples was cut into a length of 15 cm and a width of 1.5 cm, and used as a measurement sample. The measurement sample was mounted on the MIT Folding Fatigue Tester Model BE-202 (manufactured by TESTER SANGYO CO., LTD.) (load 1.0 kgf, R of the fixture: 0.38 mm), and the test speed was 90 cpm and the bending angle was 90°. Bending was repeated with 2000 times as the upper limit, and the number of times of bending at the time of measuring the sample fracture was taken as the test value. (4) Rainbow-like unevenness The base material (biaxially stretched film) for the surface protection film obtained in Examples and Comparative Examples was placed between two polarizing plates in a crossed state. At this time, the substrate for the surface protection film is arranged so that the longitudinal direction of the substrate for the surface protection film is parallel to the transmission axis direction of one polarizing plate. In this state, the light of the fluorescent lamp is irradiated from the lower side of the lower polarizing plate, and the presence or absence of rainbow-like unevenness is visually observed. The evaluation was performed according to the following criteria. ○: Rainbow-like unevenness was not observed △: Rainbow-like unevenness is slightly observed ×: Rainbow-like unevenness is significantly observed (5) Flexibility or bending resistance The substrate for surface protection film (biaxially stretched film) was repeatedly subjected to a 180° bending test 100 times to confirm the presence or absence of breakage. The evaluation was performed according to the following criteria. ○: No fracture was observed ×: Fracture observed

>實施例1> 1-1.丙烯酸類樹脂的聚合及彈性體的配混 在具備攪拌裝置、溫度感測器、冷凝管及氮導入管的反應容器中,投入甲基丙烯酸甲酯(MMA)229.6份、2-(羥基甲基)丙烯酸甲酯(MHMA)33份、甲苯248.6份、及正十二烷基硫醇0.19份,向其中通入氮氣並升溫至105℃。在伴隨升溫的回流開始的時點,添加作為聚合引發劑的過氧化異壬酸叔戊酯(ARKEMA Yoshitomi, Ltd.製「Luperox(註冊商標)570」)0.28份,進而一邊費時2小時滴加過氧化異壬酸叔戊酯0.56份和苯乙烯12.4份一邊在約105℃~110℃的回流下進行溶液聚合,滴加結束後,在同溫度下進而進行4小時的熟化。接著,向所得聚合溶液中加入作為環化縮合反應的催化劑(環化催化劑)的磷酸硬脂基酯(Sakai Chemical Industry Co.,Ltd.製「PhoslexA-18」) 0.21份,在約90~110℃的回流下進行2小時用於形成內酯環結構的環化縮合反應。接著,使所得聚合溶液通過加熱至240℃的多管式熱交換器來結束環化縮合反應。如此操作,得到具有內酯環單元的丙烯酸類樹脂。 接著,自上述環化縮合反應結束後接著將上述樹脂溶液以31.2份/小時(樹脂量換算)的處理速度導入到料筒溫度為250℃、具備1個後排氣孔、4個前排氣孔(自上游側起稱為第1排氣孔、第2排氣孔、第3排氣孔、第4排氣孔)及在第3排氣孔與第4排氣孔之間具備側餵料機、在前端部配置有葉盤型的聚合物過濾器(過濾精度5μm)的排氣型螺桿雙螺桿擠出機(L/D=52)。此時,以0.47份/小時的投入速度從第2排氣孔後面投入離子交換水,以0.59份/小時的投入速度從第3排氣孔後面投入已使紫外線吸收劑(ADEKA(股)製「ADK STAB(註冊商標)LA-F70」)0.66份溶解於甲苯1.23份而成的溶液,進而以0.47份/小時的投入速度從第4排氣孔後面投入離子交換水。進而,從側餵料機以0.63份/小時的投入速度投入聚乙烯系彈性體(住友化學(股)製、製品名「EXCELLEN FX」)的粒料。如此操作,製作包含具有內酯環單元的丙烯酸類樹脂和聚乙烯系彈性體的粒料。所得粒料相對於丙烯酸類樹脂100重量份含有10重量份彈性體。>Example 1> 1-1. Polymerization of acrylic resin and compounding of elastomer 229.6 parts of methyl methacrylate (MMA), 33 parts of 2-(hydroxymethyl) methyl acrylate (MHMA), toluene were put into a reaction vessel equipped with a stirring device, a temperature sensor, a condenser tube, and a nitrogen introduction tube 248.6 parts and 0.19 parts of n-dodecyl mercaptan were introduced into it, and the temperature was raised to 105°C. At the beginning of the reflux with the temperature rise, 0.28 parts of tert-amyl isononyl peroxide ("Luperox (registered trademark) 570" manufactured by ARKEMA Yoshitomi, Ltd.) was added as a polymerization initiator, and the solution was added dropwise over 2 hours. 0.56 parts of oxidized tert-amyl isononanoate and 12.4 parts of styrene were subjected to solution polymerization at a reflux of about 105° C. to 110° C. After completion of the dropwise addition, aging was further performed at the same temperature for 4 hours. Next, 0.21 part of stearyl phosphate ("Phoslex A-18" manufactured by Sakai Chemical Industry Co., Ltd.) which is a catalyst for the cyclization condensation reaction (cyclization catalyst) is added to the resulting polymerization solution at about 90 to 110 The cyclization condensation reaction for forming a lactone ring structure was carried out under reflux at 2°C for 2 hours. Next, the obtained polymerization solution was passed through a multi-tube heat exchanger heated to 240°C to complete the cyclization condensation reaction. In this way, an acrylic resin having a lactone ring unit is obtained. Next, after the completion of the cyclization condensation reaction, the resin solution was introduced at a processing speed of 31.2 parts/hour (resin amount conversion) to a cylinder temperature of 250° C., with a rear vent hole and four front vents Holes (referred to as the first exhaust hole, the second exhaust hole, the third exhaust hole, the fourth exhaust hole from the upstream side) and the side feed between the third exhaust hole and the fourth exhaust hole A feeder, an exhaust-type screw twin-screw extruder (L/D=52) with a disc-type polymer filter (filter accuracy of 5 μm) arranged at the front end. At this time, ion exchange water was introduced from behind the second exhaust hole at an input rate of 0.47 parts/hour, and an ultraviolet absorber (manufactured by ADEKA Corporation) was introduced from behind the third exhaust hole at an input rate of 0.59 parts/hour. "ADK STAB (registered trademark) LA-F70") 0.66 parts of a solution prepared by dissolving in 1.23 parts of toluene, and ion exchange water was added from behind the fourth exhaust hole at a feed rate of 0.47 parts/hour. Furthermore, pellets of a polyethylene-based elastomer (manufactured by Sumitomo Chemical Co., Ltd., product name "EXCELLEN FX") were fed from a side feeder at a feed rate of 0.63 parts/hour. In this way, pellets containing an acrylic resin having a lactone ring unit and a polyethylene-based elastomer are produced. The obtained pellet contained 10 parts by weight of elastomer relative to 100 parts by weight of acrylic resin.

1-2.包含丙烯酸類樹脂和彈性體的薄膜的製作 將所得粒料在80℃下進行5小時真空乾燥後,使用具備單螺桿擠出機(均為Isuzu Chemical Industries製、螺桿直徑25mm、料筒設定溫度:250℃)、T模(寬度200mm、設定溫度:250℃)、冷卻輥(設定溫度:120~130℃)及卷取機的薄膜製膜裝置,製作厚度160μm的包含丙烯酸類樹脂和彈性體的薄膜。包含丙烯酸類樹脂和彈性體的薄膜的玻璃轉變溫度(Tg)為121℃。1-2. Manufacture of film containing acrylic resin and elastomer After the obtained pellets were vacuum-dried at 80°C for 5 hours, a single screw extruder (all made by Isuzu Chemical Industries, screw diameter 25 mm, barrel setting temperature: 250°C), T die (width 200 mm, setting Temperature: 250°C), a cooling roll (set temperature: 120 to 130°C) and a film-making device of a winder to produce a film containing acrylic resin and elastomer with a thickness of 160 μm. The glass transition temperature (Tg) of the film containing the acrylic resin and the elastomer was 121°C.

1-3.表面保護薄膜用基材的製作 將上述中得到的包含丙烯酸類樹脂和彈性體的薄膜沿長度方向及寬度方向分別進行同時雙軸拉伸至2倍。拉伸溫度為[Tg+10℃](即131℃),拉伸速度在長度方向及寬度方向均為1.4%/秒。如此操作,得到表面保護薄膜用基材(厚度40μm)。所得表面保護薄膜用基材的Re(550)為0.3nm、Rth(550)為1.6nm、霧度為0.6%、MIT試驗值超過作為上限的2000次。將所得表面保護薄膜用基材供於上述(4)及(5)的評價。將結果示於表1。1-3. Fabrication of substrates for surface protection films The film containing the acrylic resin and the elastomer obtained above was simultaneously biaxially stretched to twice the length and width directions, respectively. The stretching temperature is [Tg+10°C] (that is, 131°C), and the stretching speed is 1.4%/sec in both the length direction and the width direction. In this way, a substrate for a surface protection film (thickness 40 μm) was obtained. Re (550) of the obtained substrate for surface protection films was 0.3 nm, Rth (550) was 1.6 nm, haze was 0.6%, and the MIT test value exceeded 2000 times as an upper limit. The obtained substrate for surface protection films was used for the evaluation of (4) and (5) above. The results are shown in Table 1.

>實施例2> 將彈性體的配混量設為15重量份、且將拉伸溫度設為[Tg+20℃],除此以外,與實施例1同樣地操作,得到表面保護薄膜用基材。所得表面保護薄膜用基材的Re(550)為0.5nm、Rth(550)為9nm、霧度為0.2%、MIT試驗值超過作為上限的2000次。將所得表面保護薄膜用基材供於上述(4)及(5)的評價。將結果示於表1。>Example 2> Except that the compounding amount of the elastomer was 15 parts by weight and the stretching temperature was [Tg+20° C.], the same procedure as in Example 1 was carried out to obtain a substrate for a surface protection film. Re (550) of the obtained substrate for surface protection films was 0.5 nm, Rth (550) was 9 nm, haze was 0.2%, and the MIT test value exceeded 2000 times as an upper limit. The obtained substrate for surface protection films was used for the evaluation of (4) and (5) above. The results are shown in Table 1.

>實施例3> 將彈性體的配混量設為8重量份、且將拉伸溫度設為[Tg+30℃],除此以外,與實施例1同樣地操作,得到表面保護薄膜用基材。所得表面保護薄膜用基材的Re(550)為2nm、Rth(550)為20nm、霧度為0.3%、MIT試驗值為1032次。將所得表面保護薄膜用基材供於上述(4)及(5)的評價。將結果示於表1。>Example 3> Except that the compounding amount of the elastomer was 8 parts by weight and the stretching temperature was [Tg+30° C.], the same procedure as in Example 1 was carried out to obtain a substrate for a surface protection film. Re (550) of the obtained substrate for surface protection films was 2 nm, Rth (550) was 20 nm, haze was 0.3%, and the MIT test value was 1032 times. The obtained substrate for surface protection films was used for the evaluation of (4) and (5) above. The results are shown in Table 1.

>實施例4> 使用苯乙烯系彈性體(旭化成(股)製、製品名「Tuftec」)10重量份來代替聚乙烯系彈性體10重量份,且將拉伸溫度設為[Tg+20℃],除此以外,與實施例1同樣地操作,得到表面保護薄膜用基材。所得表面保護薄膜用基材的Re(550)為0.8nm、Rth(550)為3nm、霧度為0.3%、MIT試驗值超過作為上限的2000次。將所得表面保護薄膜用基材供於上述(4)及(5)的評價。將結果示於表1。>Example 4> Use 10 parts by weight of styrene-based elastomer (manufactured by Asahi Kasei Co., Ltd., product name "Tuftec") instead of 10 parts by weight of polyethylene-based elastomer, and set the stretching temperature to [Tg+20°C], otherwise In the same manner as in Example 1, a substrate for a surface protection film was obtained. Re (550) of the obtained substrate for surface protection films was 0.8 nm, Rth (550) was 3 nm, haze was 0.3%, and the MIT test value exceeded the upper limit 2000 times. The obtained substrate for surface protection films was used for the evaluation of (4) and (5) above. The results are shown in Table 1.

>實施例5> 將彈性體的配混量設為15重量份、且將拉伸溫度設為[Tg+30℃],除此以外,與實施例4同樣地操作,得到表面保護薄膜用基材。所得表面保護薄膜用基材的Re(550)為1.2nm、Rth(550)為5.1nm、霧度為0.4%、MIT試驗值超過作為上限的2000次。將所得表面保護薄膜用基材供於上述(4)及(5)的評價。將結果示於表1。>Example 5> Except that the compounding amount of the elastomer was 15 parts by weight and the stretching temperature was [Tg+30° C.], the same procedure as in Example 4 was carried out to obtain a substrate for a surface protection film. Re (550) of the obtained substrate for surface protection films was 1.2 nm, Rth (550) was 5.1 nm, haze was 0.4%, and the MIT test value exceeded 2000 times as an upper limit. The obtained substrate for surface protection films was used for the evaluation of (4) and (5) above. The results are shown in Table 1.

>實施例6> 使用聚醯胺系彈性體(東京材料(股)製、製品名「Pebax」)20重量份來代替聚乙烯系彈性體10重量份,且將拉伸溫度設為[Tg+20℃],除此以外,與實施例1同樣地操作,得到表面保護薄膜用基材。所得表面保護薄膜用基材的Re(550)為2.3nm、Rth(550)為3.1nm、霧度為0.8%、MIT試驗值超過作為上限的2000次。將所得表面保護薄膜用基材供於上述(4)及(5)的評價。將結果示於表1。>Example 6> Instead of 10 parts by weight of polyethylene-based elastomer, 20 parts by weight of polyamide-based elastomer (manufactured by Tokyo Materials Co., Ltd., product name "Pebax") was used, and the stretching temperature was set to [Tg+20°C], except Except this, it carried out similarly to Example 1, and obtained the base material for surface protection films. Re (550) of the obtained substrate for surface protection films was 2.3 nm, Rth (550) was 3.1 nm, haze was 0.8%, and the MIT test value exceeded 2000 times as an upper limit. The obtained substrate for surface protection films was used for the evaluation of (4) and (5) above. The results are shown in Table 1.

>實施例7> 使用核殼型的橡膠狀顆粒(Mitsubishi Chemical Corporation製、製品名「W-300」)10重量份來代替聚乙烯系彈性體10重量份,且將拉伸溫度設為[Tg+20℃],除此以外,與實施例1同樣地操作,得到表面保護薄膜用基材。所得表面保護薄膜用基材的Re(550)為0.3nm、Rth(550)為1nm、霧度為0.3%、MIT試驗值為592次。將所得表面保護薄膜用基材供於上述(4)及(5)的評價。將結果示於表1。>Example 7> 10 parts by weight of core-shell rubber-like particles (manufactured by Mitsubishi Chemical Corporation, product name "W-300") were used instead of 10 parts by weight of the polyethylene-based elastomer, and the stretching temperature was set to [Tg+20°C], Except this, it carried out similarly to Example 1, and obtained the base material for surface protection films. Re (550) of the obtained substrate for surface protection films was 0.3 nm, Rth (550) was 1 nm, haze was 0.3%, and the MIT test value was 592 times. The obtained substrate for surface protection films was used for the evaluation of (4) and (5) above. The results are shown in Table 1.

>比較例1> 使用市售的降冰片烯系樹脂薄膜(Zeon Corporation製、商品名「ZEONOR」、Tg:150℃)來代替包含丙烯酸類樹脂和彈性體的薄膜,且將拉伸溫度設為[Tg+20℃],除此以外,與實施例1同樣地操作,得到表面保護薄膜用基材。所得表面保護薄膜用基材的Re(550)為2nm、Rth(550)為8nm、霧度為0.1%、MIT試驗值為150次。將所得表面保護薄膜用基材供於上述(4)及(5)的評價。將結果示於表1。>Comparative example 1> A commercially available norbornene-based resin film (manufactured by Zeon Corporation, trade name "ZEONOR", Tg: 150°C) was used instead of a film containing an acrylic resin and an elastomer, and the stretching temperature was set to [Tg+20°C ] Except this, it carried out similarly to Example 1, and obtained the base material for surface protection films. Re (550) of the obtained substrate for surface protection films was 2 nm, Rth (550) was 8 nm, haze was 0.1%, and the MIT test value was 150 times. The obtained substrate for surface protection films was used for the evaluation of (4) and (5) above. The results are shown in Table 1.

>比較例2> 使用超高相位差聚對苯二甲酸乙二醇酯(Mitsubishi Chemical Corporation製、商品名「Diafoil」、Tg:81℃)來代替包含丙烯酸類樹脂和彈性體的薄膜,且將拉伸溫度設為[Tg+20℃],除此以外,與實施例1同樣地操作,得到表面保護薄膜用基材。所得表面保護薄膜用基材的Re(550)為4500nm、Rth(550)為6000nm、霧度為1.3%、MIT試驗值超過作為上限的2000次。將所得表面保護薄膜用基材供於上述(4)及(5)的評價。將結果示於表1。>Comparative example 2> Ultra-high phase difference polyethylene terephthalate (manufactured by Mitsubishi Chemical Corporation, trade name "Diafoil", Tg: 81°C) was used instead of the film containing acrylic resin and elastomer, and the stretching temperature was set to Except [Tg+20 degreeC], it carried out similarly to Example 1, and obtained the base material for surface protection films. Re (550) of the obtained substrate for surface protection films was 4500 nm, Rth (550) was 6000 nm, haze was 1.3%, and the MIT test value exceeded 2000 times as an upper limit. The obtained substrate for surface protection films was used for the evaluation of (4) and (5) above. The results are shown in Table 1.

>比較例3> 將彈性體的配混量設為5重量份、且將拉伸溫度設為[Tg+20℃],除此以外,與實施例1同樣地操作,得到表面保護薄膜用基材。所得表面保護薄膜用基材的Re(550)為0.6nm、Rth(550)為1.3nm、霧度為0.2%、MIT試驗值為412次。將所得表面保護薄膜用基材供於上述(4)及(5)的評價。將結果示於表1。>Comparative Example 3> Except that the compounding amount of the elastomer was 5 parts by weight and the stretching temperature was [Tg+20° C.], the same procedure as in Example 1 was carried out to obtain a substrate for a surface protection film. Re (550) of the obtained substrate for surface protection films was 0.6 nm, Rth (550) was 1.3 nm, haze was 0.2%, and the MIT test value was 412 times. The obtained substrate for surface protection films was used for the evaluation of (4) and (5) above. The results are shown in Table 1.

[表1]

Figure 02_image005
[Table 1]
Figure 02_image005

>評價> 根據表1明確可知,本發明的實施例的表面保護薄膜用基材能防止彩虹狀不均勻、並且具有優異的耐彎折性(或撓性)。推測這可以通過以預定拉伸條件對包含特定丙烯酸類樹脂和特定彈性體的薄膜進行拉伸來實現。進而,根據比較例3的結果可知,在彈性體的配混量超過5重量份的附近可能存在耐彎折性(或撓性)低於容許範圍的臨界值。再者,關於漏光及著色,也已確認得到與彩虹狀不均勻同樣的結果。>evaluation> It is clear from Table 1 that the substrates for surface protection films of the examples of the present invention can prevent rainbow-like unevenness and have excellent bending resistance (or flexibility). It is speculated that this can be achieved by stretching a film containing a specific acrylic resin and a specific elastomer under predetermined stretching conditions. Furthermore, from the results of Comparative Example 3, it can be seen that there may be a critical value where the bending resistance (or flexibility) is lower than the allowable range in the vicinity of the compounding amount of the elastomer exceeding 5 parts by weight. In addition, with regard to light leakage and coloration, it has been confirmed that the same results as rainbow-like unevenness are obtained.

產業上可利用性 本發明的表面保護薄膜用基材適合用於表面保護薄膜。本發明的表面保護薄膜可在光學薄膜(最終為影像顯示裝置)實際供於使用之前,用以保護該光學薄膜。通過使用本發明的表面保護薄膜用基材及表面保護薄膜,能夠顯著地提高影像顯示裝置的光學檢查的精度。Industrial availability The base material for surface protection films of the present invention is suitable for surface protection films. The surface protection film of the present invention can be used to protect the optical film (eventually the image display device) before it is actually used. By using the substrate for a surface protection film and the surface protection film of the present invention, the accuracy of optical inspection of an image display device can be significantly improved.

(無)(no)

Claims (8)

一種表面保護薄膜用基材,其由包含丙烯酸類樹脂和彈性體的薄膜構成,面內相位差Re(550)為30nm以下,MIT試驗中直至斷裂為止的彎折次數為500次以上,相對於該丙烯酸類樹脂100重量份,包含6重量份以上該彈性體。A substrate for a surface protection film, which is composed of a film containing an acrylic resin and an elastomer, and the in-plane retardation Re (550) is 30 nm or less, and the number of bending times until breakage in the MIT test is 500 or more, relative to 100 parts by weight of the acrylic resin contains 6 parts by weight or more of the elastomer. 如請求項1之表面保護薄膜用基材,其中前述丙烯酸類樹脂具有選自於由戊二醯亞胺單元、內酯環單元、馬來酸酐單元、馬來醯亞胺單元及戊二酸酐單元所構成群組中之至少1者。The substrate for a surface protection film according to claim 1, wherein the acrylic resin has a unit selected from the group consisting of glutarimide units, lactone ring units, maleic anhydride units, maleimide units and glutaric anhydride units At least one of the formed group. 如請求項1之表面保護薄膜用基材,其中前述彈性體為選自於橡膠狀聚合物、聚醯胺系彈性體、聚乙烯系彈性體、苯乙烯系彈性體及丁二烯系彈性體中之至少1者。The substrate for a surface protection film according to claim 1, wherein the elastomer is selected from rubber-like polymers, polyamide elastomers, polyethylene elastomers, styrene elastomers and butadiene elastomers At least one of them. 如請求項1之表面保護薄膜用基材,其總透光率為80%以上,霧度為1.0%以下。For the substrate for the surface protection film of claim 1, the total light transmittance is 80% or more, and the haze is 1.0% or less. 一種表面保護薄膜用基材的製造方法,係製造如請求項1之表面保護薄膜用基材,該方法包含:將包含丙烯酸類樹脂和彈性體的薄膜形成材料成形為薄膜狀;及對該經成形之薄膜進行逐次雙軸拉伸或同時雙軸拉伸。A method for manufacturing a substrate for a surface protection film, which manufactures a substrate for a surface protection film as claimed in claim 1, the method comprising: forming a film-forming material containing an acrylic resin and an elastomer into a film shape; and The formed film is subjected to successive biaxial stretching or simultaneous biaxial stretching. 如請求項5之表面保護薄膜用基材的製造方法,其中前述逐次雙軸拉伸或同時雙軸拉伸中的拉伸溫度為Tg+10℃~Tg+30℃。The method for manufacturing a substrate for a surface protection film according to claim 5, wherein the stretching temperature in the sequential biaxial stretching or simultaneous biaxial stretching is Tg+10°C to Tg+30°C. 一種表面保護薄膜,包含如請求項1至4中任一項之表面保護薄膜用基材和黏著劑層。A surface protection film comprising the substrate for a surface protection film according to any one of claims 1 to 4 and an adhesive layer. 一種附表面保護薄膜的光學薄膜,包含: 光學薄膜;及 如請求項7之表面保護薄膜,其以可剝離的方式貼合於該光學薄膜。An optical film with surface protective film, including: Optical film; and The surface protection film according to claim 7, which is peelably attached to the optical film.
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