TW202008494A - Transport mechanism, electronic component manufacturing device and method for manufacturing electronic component comprising a holding mechanism, a first camera, a second camera, and an arithmetic unit - Google Patents

Transport mechanism, electronic component manufacturing device and method for manufacturing electronic component comprising a holding mechanism, a first camera, a second camera, and an arithmetic unit Download PDF

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TW202008494A
TW202008494A TW108125775A TW108125775A TW202008494A TW 202008494 A TW202008494 A TW 202008494A TW 108125775 A TW108125775 A TW 108125775A TW 108125775 A TW108125775 A TW 108125775A TW 202008494 A TW202008494 A TW 202008494A
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camera
optical mark
imaging element
transported
axis direction
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TWI702682B (en
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片岡昌一
深井元樹
今井一郎
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日商Towa股份有限公司
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K13/00Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
    • H05K13/08Monitoring manufacture of assemblages
    • H05K13/081Integration of optical monitoring devices in assembly lines; Processes using optical monitoring devices specially adapted for controlling devices or machines in assembly lines
    • H05K13/0812Integration of optical monitoring devices in assembly lines; Processes using optical monitoring devices specially adapted for controlling devices or machines in assembly lines the monitoring devices being integrated in the mounting machine, e.g. for monitoring components, leads, component placement
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67121Apparatus for making assemblies not otherwise provided for, e.g. package constructions
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67276Production flow monitoring, e.g. for increasing throughput
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67721Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742Mechanical parts of transfer devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/544Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0266Marks, test patterns or identification means
    • H05K1/0269Marks, test patterns or identification means for visual or optical inspection
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K13/00Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
    • H05K13/04Mounting of components, e.g. of leadless components
    • H05K13/046Surface mounting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54426Marks applied to semiconductor devices or parts for alignment

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
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Abstract

The present invention provides a transport mechanism, an electronic component manufacturing device, and a method for manufacturing electronic components. The transport mechanism includes a holding mechanism that is configured to hold and move an object to be transported, a light source, and an optical mark forming section capable of optically forming an optical mark; a first camera, including a first photographing element that is configured to capture the optical mark and a target transport position of the object to be transported; a second camera, including a second photographing element that is configured to capture the target transport position of the object to be transported and the optical mark, wherein the object to be transported is held by the holding mechanism; and an arithmetic unit that is configured to correct a moving distance of the object to be transported to the target transport position based on a relative position offset between the first camera and the second camera.

Description

搬運機構、電子零件製造裝置及電子零件的製造方法Carrying mechanism, electronic parts manufacturing device, and electronic parts manufacturing method

本發明涉及一種搬運機構、電子零件製造裝置及電子零件的製造方法。The invention relates to a conveying mechanism, an electronic parts manufacturing device and a manufacturing method of electronic parts.

在專利文獻1(日本專利特開平7-7028號公報)中,記載了一種晶片接合(chip bonding)裝置,其包括:第一識別相機,進行基板的位置識別;第二識別相機,進行半導體晶片的位置識別;以及修正機構,用於第一識別相機與第二識別相機的基準位置的設定。Patent Document 1 (Japanese Patent Laid-Open No. 7-7028) describes a chip bonding apparatus including: a first recognition camera to perform substrate position recognition; and a second recognition camera to perform semiconductor wafer Position recognition; and a correction mechanism for setting the reference position of the first recognition camera and the second recognition camera.

在專利文獻1所述的晶片接合裝置中,第一識別相機與第二識別相機的基準位置的設定是以如下的方式進行。首先,修正機構的桿件(rod)伸長,使靶(target)進入至規定位置並停止,所述靶在表背兩面的同一位置設有十字圖形的特定標誌。靶的停止位置是設為如下的位置:特定標誌的中心交叉點抵達至第二識別相機的中心下方。In the wafer bonding apparatus described in Patent Document 1, the reference positions of the first recognition camera and the second recognition camera are set as follows. First, the rod of the correction mechanism is extended to bring the target to a predetermined position and stop. The target is provided with a specific mark of a cross pattern at the same position on both sides of the front and back. The stop position of the target is set as follows: the center intersection of the specific mark reaches below the center of the second recognition camera.

接著,使第一識別相機移動,以使特定標誌即十字圖形的中心交叉點位於第一識別相機的中心。由此,第一識別相機的中心、第二識別相機的中心及特定標誌的中心交叉點位於同軸上。此時的X軸位置及Y軸位置是作為第一識別相機、第二識別相機及靶的基準位置而記錄於記憶裝置。Next, the first recognition camera is moved so that a specific mark, that is, the center intersection of the cross figure is located at the center of the first recognition camera. Thus, the intersection of the center of the first recognition camera, the center of the second recognition camera, and the center of the specific mark is on the same axis. The X-axis position and the Y-axis position at this time are recorded in the memory device as the reference positions of the first recognition camera, the second recognition camera, and the target.

然後,進行規定次數的晶片接合之後,或經過規定時間之後,檢測第一識別相機相對於基準位置的相對偏移量以及第二識別相機相對於基準位置的相對偏移量。基於這些檢測到的相對偏移量,運算第一識別相機與第二識別相機的相對偏移量。考慮將所述運算出的相對偏移量作為修正量,對基板與半導體晶片的位置關係進行修正,而再次開始晶片接合。Then, after wafer bonding is performed a predetermined number of times, or after a predetermined time has passed, the relative displacement of the first recognition camera from the reference position and the relative displacement of the second recognition camera from the reference position are detected. Based on these detected relative offsets, the relative offsets of the first recognition camera and the second recognition camera are calculated. Considering that the calculated relative offset is used as a correction amount, the positional relationship between the substrate and the semiconductor wafer is corrected, and wafer bonding is restarted.

但是,在專利文獻1所述的晶片接合裝置中,必須在第一識別相機與第二識別相機的基準位置的設定中,在裝置內設置包含桿件及靶的修正機構的移動空間,所以存在裝置大型化的課題。However, in the wafer bonding apparatus described in Patent Document 1, it is necessary to provide a movement space including a correction mechanism including a rod member and a target in the setting of the reference positions of the first recognition camera and the second recognition camera, so there is The issue of large-scale installations.

並且,在專利文獻1所述的晶片接合裝置中,也必須將修正機構安裝於裝置,所以也存在裝置的結構複雜化的課題。In addition, in the wafer bonding apparatus described in Patent Document 1, the correction mechanism must also be attached to the apparatus, so there is also a problem that the structure of the apparatus is complicated.

根據此處所公開的實施方式,可以提供一種搬運機構,其包括:保持機構,構成為能夠保持被搬運物且能夠移動;光源;光學標誌形成部,能夠在從光源發出的光的光路中在光學上形成光學標誌;第一相機,包括第一攝像元件,所述第一攝像元件構成為能夠拍攝光學標誌及被搬運物的搬運目標部位;第二相機,包括第二攝像元件,所述第二攝像元件構成為能夠拍攝被搬運物及光學標誌,所述被搬運物保持於保持機構;以及運算機構,構成為能夠基於第一相機與第二相機的相對位置偏移量,修正至搬運目標部位為止的被搬運物的移動距離。According to the embodiments disclosed herein, it is possible to provide a transport mechanism including: a holding mechanism configured to be able to hold the object to be transported and movable; a light source; and an optical mark forming portion that can be optically positioned in the optical path of light emitted from the light source An optical mark is formed on the first camera; the first camera includes a first imaging element, the first imaging element is configured to be capable of photographing an optical mark and a transport target portion of the object to be transported; the second camera includes a second imaging element, the second The imaging element is configured to be able to photograph the conveyed object and the optical mark, the conveyed object is held in the holding mechanism; and the computing mechanism is configured to be corrected to the conveyance target location based on the relative positional offset of the first camera and the second camera The travel distance of the object to be transported.

根據此處所公開的實施方式,可以提供一種搬運機構,其包括:保持機構,構成為能夠保持被搬運物且能夠移動;光源;光學標誌形成部,能夠在從光源發出的光的光路中在光學上形成光學標誌;設置有非光學標誌的面;第一相機,包括第一攝像元件,所述第一攝像元件構成為能夠拍攝被搬運物的搬運目標部位及非光學標誌;第二相機,包括第二攝像元件,所述第二攝像元件構成為能夠拍攝被搬運物及光學標誌,所述被搬運物保持於保持機構;第三相機,包括第三攝像元件,所述第三攝像元件是構成為能夠拍攝光學標誌及非光學標誌;以及運算機構,能夠基於第一相機與第二相機的相對位置偏移量,修正至搬運目標部位為止的被搬運物的移動距離。According to the embodiments disclosed herein, it is possible to provide a transport mechanism including: a holding mechanism configured to be able to hold the object to be transported and movable; a light source; and an optical mark forming portion that can be optically positioned in the optical path of light emitted from the light source An optical mark is formed on the surface; a surface provided with a non-optical mark; a first camera, including a first imaging element, the first imaging element is configured to be able to photograph a transport target portion of the object to be transported, and a non-optical mark; a second camera, including A second imaging element configured to be capable of imaging the conveyed object and the optical mark, the conveyed object is held in the holding mechanism; a third camera including a third imaging element, the third imaging element is configured In order to be able to take an optical mark and a non-optical mark; and a calculation mechanism, it is possible to correct the moving distance of the object to be transported to the target position based on the relative positional offset of the first camera and the second camera.

根據此處所公開的實施方式,可以提供一種電子零件製造裝置,其包括所述搬運機構。According to the embodiments disclosed herein, it is possible to provide an electronic part manufacturing apparatus including the conveying mechanism.

根據此處所公開的實施方式,可以提供一種電子零件的製造方法,其包括如下的步驟:利用保持機構保持被搬運物的步驟;在光學上形成光學標誌的步驟;利用第一相機的第一攝像元件拍攝光學標誌的步驟;利用第二相機的第二攝像元件拍攝光學標誌的步驟;利用第二攝像元件拍攝被搬運物的步驟,所述被搬運物保持於保持機構;利用第一攝像元件拍攝被搬運物的搬運目標部位的步驟;算出第一相機與第二相機的相對位置偏移量的步驟;基於相對位置偏移量,修正至搬運目標部位為止的被搬運物的移動距離;以及將被搬運物載置於搬運目標部位的步驟。According to the embodiments disclosed herein, a method for manufacturing an electronic part can be provided, which includes the steps of: a step of holding a conveyed object by a holding mechanism; a step of optically forming an optical mark; a first imaging using a first camera The step of photographing the optical mark by the element; the step of photographing the optical mark by the second imaging element of the second camera; the step of photographing the carried object by the second imaging element, the carried object is held in the holding mechanism; the photographing by the first imaging element The step of transporting the target part of the object to be transported; the step of calculating the relative positional offset of the first camera and the second camera; based on the relative positional offset, correcting the movement distance of the object to be transported to the target target; and The step of placing the transported object on the transport target.

根據此處所公開的實施方式,可以提供一種電子零件的製造方法,其包括如下的步驟:利用保持機構保持被搬運物的步驟;在光學上形成光學標誌的步驟;利用第一相機的第一攝像元件拍攝非光學標誌的步驟;利用第二相機的第二攝像元件拍攝光學標誌的步驟;利用安裝於保持機構的第三相機的第三攝像元件,拍攝非光學標誌的步驟;利用第二攝像元件拍攝被搬運物的步驟,所述被搬運物是保持於保持機構;利用第一攝像元件拍攝被搬運物的搬運目標部位的步驟;算出第一相機與第二相機的相對位置偏移量的步驟;基於相對位置偏移量,修正至搬運目標部位為止的被搬運物的移動距離的步驟;以及將被搬運物載置於搬運目標部位的步驟。According to the embodiments disclosed herein, a method for manufacturing an electronic part can be provided, which includes the steps of: a step of holding a conveyed object by a holding mechanism; a step of optically forming an optical mark; a first imaging using a first camera The step of photographing the non-optical mark by the element; The step of photographing the optical mark by the second imaging element of the second camera; The step of photographing the non-optical mark by the third imaging element of the third camera mounted on the holding mechanism; The second imaging element The step of photographing the object to be transported, which is held in the holding mechanism; the step of photographing the transport target part of the object to be transported using the first imaging element; the step of calculating the relative positional offset of the first camera and the second camera A step of correcting the moving distance of the object to be transported to the target position based on the amount of relative position deviation; and a step of placing the object to be transported on the target position of transport.

根據此處所公開的實施方式,可以提供一種能夠抑制裝置的大型化及裝置的結構的複雜化的搬運機構、電子零件製造裝置及電子零件的製造方法。According to the embodiments disclosed herein, it is possible to provide a conveyance mechanism, an electronic component manufacturing apparatus, and a manufacturing method of an electronic component that can suppress the enlargement of the device and the complexity of the device structure.

本發明的所述目的及其它目的、特徵、方面及優點將藉由與附圖相關聯而理解的本發明的相關如下的詳細說明來闡明。The above-mentioned object and other objects, features, aspects, and advantages of the present invention will be clarified by the following detailed description of the present invention understood in association with the drawings.

以下,對實施方式進行說明。再者,在用於說明實施方式的附圖中,相同的參照符號表示相同部分或相當部分。Hereinafter, the embodiment will be described. In the drawings for explaining the embodiments, the same reference symbols indicate the same parts or corresponding parts.

<實施方式1> 在圖1中,表示實施方式1的電子零件製造裝置的示意性平面圖。圖1所示的實施方式1的電子零件製造裝置包括基板供給機構A、基板切斷機構B、洗滌機構C及搬運機構D。<Embodiment 1> FIG. 1 shows a schematic plan view of the electronic component manufacturing apparatus of the first embodiment. The electronic component manufacturing apparatus of Embodiment 1 shown in FIG. 1 includes a substrate supply mechanism A, a substrate cutting mechanism B, a washing mechanism C, and a transport mechanism D.

如圖1所示,基板供給機構A包括:基板裝填部1,用於裝填半導體封裝體基板5;基板供給台7,用於載置從基板裝填部1取出的半導體封裝體基板5;封裝體置入裝載機(package in loader)6,用於保持半導體封裝體基板5而供給至基板切斷機構B;以及軌道6a,供封裝體置入裝載機6移動至基板切斷機構B為止。As shown in FIG. 1, the substrate supply mechanism A includes: a substrate loading portion 1 for loading a semiconductor package substrate 5; a substrate supply stage 7 for placing the semiconductor package substrate 5 taken out from the substrate loading portion 1; a package A package in loader 6 is provided for holding the semiconductor package substrate 5 and supplied to the substrate cutting mechanism B; and a rail 6a is provided for the package loading loader 6 to move to the substrate cutting mechanism B.

在圖2及圖3中,表示圖解基板供給機構A的動作的一例的示意性側視圖。基板供給機構A例如,如下所述而運行。首先,如圖2所示,利用基板推出構件2,在X軸方向上推出裝填於基板裝填部1的半導體封裝體基板5而載置於基板供給台7上。接著,位於半導體封裝體基板5的Z軸方向上方的封裝體置入裝載機6保持基板供給台7上的半導體封裝體基板5。接著,如圖1所示,封裝體置入裝載機6在保持著半導體封裝體基板5的狀態下在X軸方向上沿軌道6a移動至基板切斷機構B為止。然後,如圖3所示,封裝體置入裝載機6在Z軸方向下方的基板切斷機構B的切割平台(cut table)8上載置半導體封裝體基板5。由此,基板供給機構A的動作完成。2 and 3 show schematic side views illustrating an example of the operation of the substrate supply mechanism A. The substrate supply mechanism A operates, for example, as follows. First, as shown in FIG. 2, the semiconductor package substrate 5 loaded on the substrate loading portion 1 is pushed out in the X-axis direction by the substrate pushing member 2 and placed on the substrate supply stage 7. Next, the package located above the semiconductor package substrate 5 in the Z-axis direction is placed in the loader 6 to hold the semiconductor package substrate 5 on the substrate supply table 7. Next, as shown in FIG. 1, the package loading loader 6 moves to the substrate cutting mechanism B along the rail 6 a in the X-axis direction while holding the semiconductor package substrate 5. Then, as shown in FIG. 3, the semiconductor package substrate 5 is placed on the cut table 8 of the substrate cutting mechanism B of the loader 6 below the Z-axis direction. Thus, the operation of the substrate supply mechanism A is completed.

半導體封裝體基板5是最終被切斷而單片化為多個半導體封裝體5a的切斷物件物。半導體封裝體基板5例如可以包括:基材,包含基板或引線框架(lead frame)等;半導體晶片狀零件,分別安裝於基材所包含的多個區域;以及密封樹脂,以統一覆蓋基材所包含的多個區域的方式而形成。在實施方式1中,作為一例,說明使用半導體封裝體基板5的情況,所述半導體封裝體基板5包括搭載有多個半導體晶片狀零件的基材3及密封樹脂4。The semiconductor package substrate 5 is finally a cut object that is cut into a plurality of semiconductor packages 5a. The semiconductor package substrate 5 may include, for example, a base material, including a substrate or a lead frame, a semiconductor wafer-like component, respectively mounted on a plurality of areas included in the base material, and a sealing resin to uniformly cover the base material Contains multiple areas. In the first embodiment, as an example, a case where the semiconductor package substrate 5 including the base material 3 and the sealing resin 4 on which a plurality of semiconductor wafer-like components are mounted will be described.

如圖1所示,基板切斷機構B包括:切割平台8,用於載置切斷前的半導體封裝體基板5或切斷後的半導體封裝體5a;旋轉機構8a,用於使切割平台8旋轉;移動機構(未圖示),用於使切割平台8及旋轉機構8a移動;對準相機8b,用於確認切割平台8上的半導體封裝體基板5的位置;轉軸9,包括刀片(blade),所述刀片用於切斷半導體封裝體基板5;洗滌水噴霧構件11,用於將洗滌水噴霧至半導體封裝體5a;以及空氣噴射構件12,用於使噴霧至半導體封裝體5a的洗滌水乾燥。As shown in FIG. 1, the substrate cutting mechanism B includes: a cutting table 8 for placing the semiconductor package substrate 5 before cutting or the semiconductor package 5a after cutting; a rotating mechanism 8a for rotating the cutting table 8 ; A moving mechanism (not shown) for moving the cutting platform 8 and the rotating mechanism 8a; aiming at the camera 8b for confirming the position of the semiconductor package substrate 5 on the cutting platform 8; a rotating shaft 9, including a blade The blade is used to cut off the semiconductor package substrate 5; the washing water spray member 11 is used to spray the washing water to the semiconductor package 5a; and the air spraying member 12 is used to spray the washing water sprayed to the semiconductor package 5a dry.

在圖1及圖4~圖6中,表示圖解基板切斷機構B的動作的一例的示意性側視圖。基板切斷機構B例如,如下所述而運行。首先,如圖1所示,利用未圖示的移動機構,使切割平台8及旋轉機構8a在Y軸方向上移動,所述切割平台8載置著切斷前的半導體封裝體基板5。此時,利用對準相機8b確認切割平台8上的半導體封裝體基板5的位置。1 and 4 to 6 show schematic side views illustrating an example of the operation of the substrate cutting mechanism B. The substrate cutting mechanism B operates as follows, for example. First, as shown in FIG. 1, the dicing stage 8 and the rotation mechanism 8 a are moved in the Y-axis direction by a moving mechanism (not shown), and the dicing stage 8 mounts the semiconductor package substrate 5 before cutting. At this time, the position of the semiconductor package substrate 5 on the dicing table 8 is confirmed using the alignment camera 8b.

接著,如圖1所示,使載置著半導體封裝體基板5的切割平台8及旋轉機構8a在X軸方向上移動至轉軸9為止,利用旋轉機構8a使半導體封裝體基板5旋轉。接著,如圖4所示,藉由使轉軸9旋轉而使刀片10旋轉,切斷切割平台8上的半導體封裝體基板5。由此,使半導體封裝體基板5單片化而獲得多個半導體封裝體5a。各個半導體封裝體5a例如可以具有如下的結構:包括搭載著各個半導體晶片狀零件的基材3、及包覆所述半導體晶片狀零件的密封樹脂4。Next, as shown in FIG. 1, the dicing stage 8 and the rotation mechanism 8 a on which the semiconductor package substrate 5 is placed are moved to the rotation axis 9 in the X-axis direction, and the semiconductor package substrate 5 is rotated by the rotation mechanism 8 a. Next, as shown in FIG. 4, by rotating the rotary shaft 9 to rotate the blade 10, the semiconductor package substrate 5 on the dicing table 8 is cut. Thus, the semiconductor package substrate 5 is singulated to obtain a plurality of semiconductor packages 5a. Each semiconductor package 5a may have a structure including, for example, a base material 3 on which each semiconductor wafer-shaped component is mounted, and a sealing resin 4 covering the semiconductor wafer-shaped component.

接著,如圖5所示,利用洗滌水噴霧構件11,將洗滌水噴霧至切割平台8上的經單片化的半導體封裝體5a的基材3側。接著,如圖6所示,藉由從空氣噴射構件12噴射空氣而將噴霧至半導體封裝體5a的基材3側的洗滌水吹掉,使半導體封裝體5a乾燥。然後,使切割平台8上的半導體封裝體5a移動至洗滌機構C。由此,基板切斷機構B的動作完成。Next, as shown in FIG. 5, the washing water spray member 11 is used to spray the washing water onto the substrate 3 side of the singulated semiconductor package 5 a on the dicing table 8. Next, as shown in FIG. 6, by spraying air from the air injection member 12, the washing water sprayed to the base material 3 side of the semiconductor package 5 a is blown off to dry the semiconductor package 5 a. Then, the semiconductor package 5a on the dicing table 8 is moved to the washing mechanism C. Thus, the operation of the substrate cutting mechanism B is completed.

如圖1所示,洗滌機構C包括:封裝體卸載機(package unloader)13,用於保持半導體封裝體5a;海綿輥(sponge roller)16,用於洗滌半導體封裝體5a的密封樹脂4側;以及空氣噴射構件17,用於使半導體封裝體5a乾燥。As shown in FIG. 1, the washing mechanism C includes: a package unloader 13 for holding the semiconductor package 5a; a sponge roller 16 for washing the sealing resin 4 side of the semiconductor package 5a; And the air ejection member 17 for drying the semiconductor package 5a.

在圖1、圖7及圖8中,表示圖解洗滌機構C的動作的一例的示意性側視圖。洗滌機構C例如,如以所述而運行。首先,如圖7所示,封裝體卸載機13保持半導體封裝體5a而從切割平台8拽起至Z軸方向上方。接著,如圖1所示,封裝體卸載機13使半導體封裝體5a在X軸方向上移動而移動至海綿輥16及空氣噴射構件17的Z軸方向上方為止。然後,如圖8所示,海綿輥16洗滌半導體封裝體5a的密封樹脂4側,並且空氣噴射構件17噴射空氣,從而使半導體封裝體5a乾燥。由此,洗滌機構C的動作完成。1, 7 and 8 show schematic side views illustrating an example of the operation of the washing mechanism C. The washing mechanism C operates as described above, for example. First, as shown in FIG. 7, the package unloader 13 holds the semiconductor package 5 a and is pulled up from the dicing table 8 to the Z-axis direction upward. Next, as shown in FIG. 1, the package unloader 13 moves the semiconductor package 5 a in the X-axis direction and moves it upward in the Z-axis direction of the sponge roller 16 and the air injection member 17. Then, as shown in FIG. 8, the sponge roller 16 cleans the sealing resin 4 side of the semiconductor package 5a, and the air injection member 17 sprays air, thereby drying the semiconductor package 5a. Thus, the operation of the washing mechanism C is completed.

如圖1所示,搬運機構D包括:標記檢查用相機18,用於檢查標記,所述標記是印刷於半導體封裝體5a的密封樹脂4;封裝體檢查用相機19,用於檢查半導體封裝體5a的基材3;翻轉器(flipper)14,用於保持半導體封裝體5a並使其反轉;軌道14a,供翻轉器14移動;分度平台(index table)15,用於載置已藉由翻轉器14而反轉的半導體封裝體5a;以及移動機構(未圖示),用於使分度平台15移動。As shown in FIG. 1, the transport mechanism D includes: a mark inspection camera 18 for inspecting marks, the mark being the sealing resin 4 printed on the semiconductor package 5 a; and a package inspection camera 19 for inspecting the semiconductor package Base material 3 of 5a; flipper 14 for holding and reversing the semiconductor package 5a; rail 14a for moving the flipper 14; index table 15 for placing borrowed The semiconductor package 5a reversed by the flipper 14; and a moving mechanism (not shown) for moving the indexing table 15.

搬運機構D還包括:保持機構21,用於保持並搬運半導體封裝體5a;配置構件23,用於載置半導體封裝體5a;平台22,用於載置配置構件23;移動機構(未圖示),用於使平台22移動;配置構件裝載機24,用於保持載置著半導體封裝體5a的配置構件23;軌道25,用於使配置構件裝載機24移動;配置構件裝填部26,用於裝填載置著半導體封裝體5a的配置構件23;以及運算機構27,構成為如後所述那樣能夠修正作為被搬運物的半導體封裝體5a至作為搬運目標部位的配置構件23的開口23a為止的的相對移動量。The transport mechanism D further includes: a holding mechanism 21 for holding and transporting the semiconductor package 5a; a placement member 23 for placing the semiconductor package 5a; a platform 22 for placing the placement member 23; and a moving mechanism (not shown) ) For moving the platform 22; the placement member loader 24 for holding the placement member 23 on which the semiconductor package 5a is placed; the track 25 for moving the placement member loader 24; the placement member loading section 26 for The placement member 23 on which the semiconductor package 5a is loaded is loaded; and the calculation mechanism 27 is configured to be able to correct the semiconductor package 5a that is the object to be transported to the opening 23a of the placement member 23 that is the destination of transportation as described later. Relative movement.

在實施方式1中,作為保持機構21,例如可以使用吸附機構,所述吸附機構是吸附、保持並且搬運半導體封裝體5a。並且,作為配置構件23,例如,可以使用黏附構件,所述黏附構件包括設置有多個開口23a的金屬制範本(stencil)等支撐基台、及支撐基臺上的樹脂薄片。In the first embodiment, as the holding mechanism 21, for example, a suction mechanism that sucks, holds, and transports the semiconductor package 5a can be used. Furthermore, as the arrangement member 23, for example, an adhesive member including a support base such as a metal stencil provided with a plurality of openings 23a and a resin sheet on the support base can be used.

當使用吸附機構作為保持機構21時,可以使用吸附頭,作為用於保持半導體封裝體5a的保持構件。這時,例如,藉由使用未圖示的真空泵抽吸中空的吸附頭內的氣體,可以將半導體封裝體5a吸附並保持於吸附頭的設置有開口部的端面。When a suction mechanism is used as the holding mechanism 21, a suction head may be used as a holding member for holding the semiconductor package 5a. At this time, for example, by sucking the gas in the hollow suction head using a vacuum pump (not shown), the semiconductor package 5a can be sucked and held on the end surface of the suction head where the opening is provided.

作為用於黏附構件的樹脂薄片,例如可以使用如下的薄片,其包括樹脂制的薄片狀基材及黏接層(黏合層),所述黏接層(黏合層)是包含塗布於所述薄片狀基材的至少單面的黏接劑。作為黏接劑,例如可以使用黏合劑(感壓黏接劑:pressure sensitive adhesive)。作為樹脂薄片,例如,可以使用在聚醯亞胺薄膜的兩面塗布有矽酮系黏合劑的樹脂薄片等。此處,在樹脂薄片中,可以至少在黏附半導體封裝體5a之側的薄片狀基材的面塗布黏接劑而形成黏接層,但也可以在黏附半導體封裝體5a之側的薄片狀基材的面及其相反側的薄片狀基材的面塗布黏接劑而形成黏接層。如上所述,在樹脂薄片的至少半導體封裝體5a的配置面設置黏接層(黏合層),因此能夠將半導體封裝體5a黏附於作為黏附構件的配置構件23。As the resin sheet used for the adhesive member, for example, a sheet including a resin-made sheet-like base material and an adhesive layer (adhesive layer) including the coating applied to the sheet can be used Adhesive on at least one side of the substrate. As the adhesive, for example, an adhesive (pressure sensitive adhesive) can be used. As the resin sheet, for example, a resin sheet coated with a silicone adhesive on both sides of the polyimide film can be used. Here, in the resin sheet, an adhesive may be applied to at least the surface of the sheet-like substrate on the side where the semiconductor package 5a is adhered to form an adhesive layer, but the sheet-like substrate on the side where the semiconductor package 5a is adhered may also be formed The surface of the material and the surface of the sheet-like substrate on the opposite side are coated with an adhesive to form an adhesive layer. As described above, since the adhesive layer (adhesive layer) is provided on at least the arrangement surface of the semiconductor package 5a of the resin sheet, the semiconductor package 5a can be adhered to the arrangement member 23 as the adhesion member.

以下,參照圖9~圖19及圖24(a)~圖24(d),圖解搬運機構D的動作的一例。首先,如圖9的示意性側視圖所示,封裝體卸載機13保持半導體封裝體5a而移動至標記檢查用相機18的Z軸方向上方為止,所述半導體封裝體5a是利用海綿輥16而洗滌及藉由空氣噴射構件17加以乾燥後的半導體封裝體。接著,標記檢查用相機18確認印刷於半導體封裝體5a的密封樹脂4的標記適當與否。Hereinafter, referring to FIGS. 9 to 19 and FIGS. 24( a) to 24 (d ), an example of the operation of the transport mechanism D will be illustrated. First, as shown in the schematic side view of FIG. 9, the package unloader 13 holds the semiconductor package 5 a and moves it up to the Z-axis direction of the mark inspection camera 18 using the sponge roller 16. The semiconductor package after washing and drying by the air injection member 17. Next, the mark inspection camera 18 confirms whether the mark of the sealing resin 4 printed on the semiconductor package 5a is appropriate.

接著,如圖10的示意性側視圖所示,封裝體卸載機13在X軸方向上移動而移動至翻轉器14的Z軸方向上方為止,並使半導體封裝體5a向Z軸方向下方下降而載置於翻轉器14上。接著,如圖11的示意性側視圖所示,藉由翻轉器14旋轉而使半導體封裝體5a反轉。此時,翻轉器14以半導體封裝體5a的基材3側朝向Z軸方向下方的方式而保持半導體封裝體5a。Next, as shown in the schematic side view of FIG. 10, the package unloader 13 moves in the X-axis direction and moves up to the Z-axis direction of the flipper 14, and the semiconductor package 5a is lowered downward in the Z-axis direction. It is placed on the flipper 14. Next, as shown in the schematic side view of FIG. 11, the semiconductor package 5 a is reversed by rotating the inverter 14. At this time, the inverter 14 holds the semiconductor package 5a so that the base 3 side of the semiconductor package 5a faces downward in the Z-axis direction.

接著,如圖1所示,翻轉器14在X軸方向上沿軌道14a移動,如圖12的示意性側視圖所示,將半導體封裝體5a搬運至封裝體檢查用相機19的Z軸方向上方為止。接著,封裝體檢查用相機19進行半導體封裝體5a的基材3的檢查。在基材3例如為基板的情況下,封裝體檢查用相機19例如檢查焊球的位置、數量及形狀。並且,在基材3例如是引線框架的情況下,封裝體檢查用相機19例如檢查引線的位置、數量及形狀。接著,如圖1所示,翻轉器14在X軸方向上沿軌道14a移動至分度平台15的Z軸方向上方為止,而如圖13的示意性側視圖所示,將半導體封裝體5a載置於分度平台15上。Next, as shown in FIG. 1, the flipper 14 moves along the rail 14 a in the X-axis direction, and as shown in the schematic side view of FIG. 12, the semiconductor package 5 a is transported above the Z-axis direction of the camera 19 for package inspection until. Next, the camera 19 for package inspection inspects the base material 3 of the semiconductor package 5 a. When the base material 3 is, for example, a substrate, the camera 19 for package inspection checks, for example, the position, number, and shape of solder balls. In addition, when the base material 3 is, for example, a lead frame, the camera 19 for package inspection checks the position, number, and shape of the leads, for example. Next, as shown in FIG. 1, the flipper 14 moves along the rail 14 a in the X-axis direction up to the Z-axis direction of the indexing table 15, and as shown in the schematic side view of FIG. 13, the semiconductor package 5 a is loaded. Place on the indexing platform 15.

接著,運算機構27如圖1所示,使載置著半導體封裝體5a的分度平台15在Y軸方向上移動至保持機構21側,並使保持機構21在X軸方向上移動至分度平台15側。由此,如圖14的示意性側視圖所示,保持機構21位於分度平台15上的半導體封裝體5a的Z軸方向上方。在分度平台15的X軸方向上,配置有包括第二攝像元件41的第二相機102。在第二相機102的X軸方向上,配置有配置構件23。在保持機構21,安裝有包括第一攝像元件31的第一相機101。並且,在實施方式1中,作為配置構件23,是使用如下的薄片,所述薄片包括樹脂制的薄片狀基材72及黏接層(黏合層)71,所述黏接層(黏合層)71是包含塗布於薄片狀基材72的至少單面的黏接劑。在配置構件23,設置有開口23a,所述開口23a在實施方式1中成為搬運目標部位。Next, as shown in FIG. 1, the calculation mechanism 27 moves the indexing table 15 on which the semiconductor package 5 a is mounted to the holding mechanism 21 side in the Y-axis direction, and moves the holding mechanism 21 to the indexing direction in the X-axis direction. Platform 15 side. Thus, as shown in the schematic side view of FIG. 14, the holding mechanism 21 is located above the semiconductor package 5 a on the index table 15 in the Z-axis direction. In the X-axis direction of the index table 15, the second camera 102 including the second imaging element 41 is arranged. In the X-axis direction of the second camera 102, the arrangement member 23 is arranged. The first camera 101 including the first imaging element 31 is mounted on the holding mechanism 21. In addition, in Embodiment 1, as the arrangement member 23, a sheet is used that includes a resin-made sheet-like base material 72 and an adhesive layer (adhesive layer) 71, and the adhesive layer (adhesive layer) 71 is an adhesive agent coated on at least one side of the sheet-like substrate 72. In the arrangement member 23, an opening 23a is provided, and the opening 23a becomes a transport target site in the first embodiment.

接著,如圖15的示意性側視圖所示,運算機構27使保持機構21的保持頭21a移動至Z軸方向下方而使保持頭21a保持半導體封裝體5a,所述半導體封裝體5a在實施方式1中成為被搬運物。然後,如圖14所示,運算機構27使保持頭21a將半導體封裝體5a拽起至Z軸方向上方。再者,為了便於說明,在圖14中,表示了保持機構21只保持一個半導體封裝體5a的情況,但是並不限定於所述情況,如圖15所示,也可以同時保持多個半導體封裝體5a。Next, as shown in the schematic side view of FIG. 15, the arithmetic mechanism 27 moves the holding head 21 a of the holding mechanism 21 downward in the Z-axis direction and causes the holding head 21 a to hold the semiconductor package 5 a, which in the embodiment 1 becomes the object to be transported. Then, as shown in FIG. 14, the calculation mechanism 27 causes the holding head 21 a to pull the semiconductor package 5 a upward in the Z-axis direction. In addition, for convenience of explanation, FIG. 14 shows the case where the holding mechanism 21 holds only one semiconductor package 5a, but it is not limited to the above case, and as shown in FIG. 15, it is also possible to hold multiple semiconductor packages at the same time.体5a。 5a.

接著,如圖16的示意性側視圖所示,運算機構27使保持著半導體封裝體5a的保持機構21,從半導體封裝體5a的Z軸方向上方朝向配置構件23的Z軸方向上方在X軸方向上移動。此時,例如,如圖16的示意性側視圖所示,運算機構27使第二相機102的第二攝像元件41,從Z軸方向下方拍攝保持於保持機構21的半導體封裝體5a,而獲取半導體封裝體5a的圖像。運算機構27使第二攝像元件41所拍攝的半導體封裝體5a的圖像的資料發送至運算機構27。Next, as shown in the schematic side view of FIG. 16, the calculation mechanism 27 moves the holding mechanism 21 holding the semiconductor package 5 a from the Z axis direction upward of the semiconductor package 5 a toward the Z axis direction upward of the arrangement member 23 in the X axis Move in the direction. At this time, for example, as shown in the schematic side view of FIG. 16, the computing mechanism 27 causes the second imaging element 41 of the second camera 102 to capture the semiconductor package 5a held by the holding mechanism 21 from below in the Z-axis direction to obtain Image of the semiconductor package 5a. The arithmetic unit 27 sends the data of the image of the semiconductor package 5 a captured by the second imaging element 41 to the arithmetic unit 27.

接著,如圖17的示意性側視圖所示,運算機構27使保持機構21從第一攝像元件41的Z軸方向上方朝向配置構件23的Z軸方向上方進一步在X軸方向上移動。然後,運算機構27例如使安裝於保持機構21的第一相機101的第一攝像元件31從Z軸方向上方拍攝開口23a,而獲取開口23a的圖像。運算機構27使第一攝像元件31所獲取的開口23a的圖像的資料也發送至運算機構27。Next, as shown in the schematic side view of FIG. 17, the calculation mechanism 27 moves the holding mechanism 21 in the X-axis direction from above the Z-axis direction of the first imaging element 41 toward above the Z-axis direction of the arrangement member 23. Then, for example, the calculation mechanism 27 causes the first imaging element 31 of the first camera 101 attached to the holding mechanism 21 to capture the opening 23a from above the Z-axis direction, and acquires an image of the opening 23a. The arithmetic unit 27 also sends the data of the image of the opening 23 a acquired by the first imaging element 31 to the arithmetic unit 27.

以上,已說明如下的情況,即,運算機構27利用第二相機102的第二攝像元件41獲取半導體封裝體5a的圖像之後,利用第一相機101的第一攝像元件31獲取開口23a的圖像,但是也可以調換第一攝像元件31與第二攝像元件41的圖像的獲取的順序,利用第一攝像元件31獲取開口23a的圖像之後,利用第二攝像元件41獲取半導體封裝體5a的圖像。In the above, the case has been described in which the arithmetic unit 27 acquires the image of the opening 23a using the first imaging element 31 of the first camera 101 after acquiring the image of the semiconductor package 5a using the second imaging element 41 of the second camera 102 Like, but it is also possible to reverse the order of acquiring images of the first imaging element 31 and the second imaging element 41, after acquiring the image of the opening 23a using the first imaging element 31, then acquiring the semiconductor package 5a using the second imaging element 41 Image.

接著,運算機構27基於第二攝像元件41所拍攝的半導體封裝體5a的圖像,算出第二相機102與半導體封裝體5a的位置偏移量,並且基於第一攝像元件31所拍攝的開口23a的圖像,算出第一相機101與開口23a的位置偏移量。Next, the arithmetic unit 27 calculates the amount of positional deviation between the second camera 102 and the semiconductor package 5a based on the image of the semiconductor package 5a captured by the second imaging element 41, and based on the opening 23a captured by the first imaging element 31 Image, the amount of positional deviation between the first camera 101 and the opening 23a is calculated.

第二相機102與半導體封裝體5a的位置偏移量的計算,例如可以藉由如下的方式而進行:算出第二相機102的光入射部的中心與半導體封裝體5a的中心之間的例如作為第一方向的X軸方向上的距離、以及例如作為與第一方向不同的第二方向的Y軸方向上的距離,所述半導體封裝體5a是利用第二攝像元件41從Z軸方向下方拍攝。The calculation of the positional offset of the second camera 102 and the semiconductor package 5a can be performed by, for example, the following method: calculating, for example, the center between the light incident portion of the second camera 102 and the center of the semiconductor package 5a as The distance in the X-axis direction of the first direction and, for example, the distance in the Y-axis direction as a second direction different from the first direction, the semiconductor package 5a is photographed from below the Z-axis direction by the second imaging element 41 .

第一相機101與開口23a的位置偏移量的計算,例如可以藉由如下的方式而進行:算出第一相機101的光入射部的中心與開口23a的中心之間的X軸方向上的距離及Y軸方向上的距離,所述開口23a是利用第一攝像元件31從Z軸方向上方拍攝。The calculation of the positional offset of the first camera 101 and the opening 23a can be performed, for example, by calculating the distance in the X-axis direction between the center of the light incident portion of the first camera 101 and the center of the opening 23a And the distance in the Y-axis direction, the opening 23a is imaged from above in the Z-axis direction by the first imaging element 31.

接著,運算機構27利用如上所述而算出的第二相機102與半導體封裝體5a的分別在X軸方向及Y軸方向上的位置偏移量、及第一相機101與開口23a的分別在X軸方向及Y軸方向上的位置偏移量,例如,修正半導體封裝體5a至開口23a為止的分別在X軸方向及Y軸方向上的設計上的移動距離,而算出分別在X軸方向及Y軸方向上的實際移動距離。再者,半導體封裝體5a的至開口23a為止的分別在X軸方向及Y軸方向上的設計上的移動距離,例如可以設為如下的分別在X軸方向及Y軸方向上的計算上的移動距離,其可認為是為了將作為被搬運物的半導體封裝體5a的中心準確地載置於作為搬運目標部位的開口23a的中心所必需的移動距離。並且,也可以取代利用設計上的移動距離進行修正,而例如,基於預先由第一相機101及第二相機102所測定的值(例如,從保持半導體封裝體5a之前的保持頭21a的中心到開口23a的中心為止的移動距離、或在上次測定中算出的移動距離等),修正至開口23a為止的半導體封裝體5a的分別在X軸方向及Y軸方向上的移動距離。Next, the calculation mechanism 27 uses the positional shift amounts of the second camera 102 and the semiconductor package 5 a calculated in the X-axis direction and the Y-axis direction, and the first camera 101 and the opening 23 a at the X The amount of positional displacement in the axial direction and the Y-axis direction, for example, corrects the design movement distances in the X-axis direction and the Y-axis direction from the semiconductor package 5a to the opening 23a, and calculates the X-axis direction and the Y-axis direction respectively The actual moving distance in the Y-axis direction. In addition, the design movement distances of the semiconductor package 5a to the opening 23a in the X-axis direction and the Y-axis direction can be, for example, the following calculations in the X-axis direction and the Y-axis direction, respectively. The moving distance is considered to be a moving distance necessary for accurately placing the center of the semiconductor package 5a as the object to be conveyed in the center of the opening 23a as the target portion of the conveyance. Furthermore, instead of using the design movement distance for correction, for example, based on the values measured in advance by the first camera 101 and the second camera 102 (for example, from the center of the holding head 21a before holding the semiconductor package 5a to The moving distance to the center of the opening 23a, or the moving distance calculated in the previous measurement, etc.) corrects the moving distances of the semiconductor package 5a to the opening 23a in the X-axis direction and the Y-axis direction, respectively.

接著,運算機構27藉由保持機構21而使半導體封裝體5a分別在X軸方向及Y軸方向上移動僅如下的移動距離,即,移動如上所述而算出的分別在X軸方向及Y軸方向上的實際移動距離,而如圖18的示意性側視圖所示,移動至開口23a的Z軸方向上方。Next, the calculation mechanism 27 moves the semiconductor package 5a in the X-axis direction and the Y-axis direction only by the following movement distance by the holding mechanism 21, that is, the movement calculated in the X-axis direction and the Y-axis, respectively, as described above The actual moving distance in the direction, as shown in the schematic side view of FIG. 18, moves above the Z axis direction of the opening 23a.

當例如半導體封裝體5a是球柵陣列(Ball Grid Array,BGA)半導體封裝體,在半導體封裝體5a的一個面上設置有未圖示的球電極(ball electrode)時,靠近半導體封裝體5a的周緣而設置有球電極,從而存在從半導體封裝體5a的球電極到周緣為止的距離變得非常短的情況。此時,必須一方面將球電極收納於開口23a內,一方面將半導體封裝體5a的從球電極到周緣為止的短距離的區域全部設置於開口23a外,所以存在要求更高精度的配置技術的情況。For example, when the semiconductor package 5a is a ball grid array (BGA) semiconductor package, and a ball electrode (not shown) is provided on one surface of the semiconductor package 5a, the one close to the semiconductor package 5a A ball electrode is provided at the periphery, so that the distance from the ball electrode of the semiconductor package 5a to the periphery may become very short. In this case, the ball electrode must be accommodated in the opening 23a, and the short distance from the ball electrode to the periphery of the semiconductor package 5a must be provided outside the opening 23a. Case.

然後,運算機構27例如,如圖19的示意性剖面圖所示,使保持頭21a所保持的半導體封裝體5a下降至Z軸方向下方,以使半導體封裝體5a收納於開口23a內。由此,完成向開口23a的半導體封裝體5a的搬運。Then, for example, as shown in the schematic cross-sectional view of FIG. 19, the calculation mechanism 27 lowers the semiconductor package 5 a held by the holding head 21 a downward in the Z-axis direction so that the semiconductor package 5 a is accommodated in the opening 23 a. This completes the transportation of the semiconductor package 5a to the opening 23a.

但是,由於使用電子零件製造裝置及搬運機構D的溫度環境、各個零件的加工偏差、及零件的組裝偏差等,有時在第一相機101與第二相機102之間會產生相對位置偏移。因此,為了更準確地進行半導體封裝體5a相對於開口23a的位置對準,存在必須進一步考慮第一相機101與第二相機102之間的相對位置偏移量的情況。However, due to the temperature environment of the electronic component manufacturing apparatus and the transport mechanism D, the processing variation of each component, and the assembly variation of the component, etc., a relative positional shift may occur between the first camera 101 and the second camera 102. Therefore, in order to more accurately align the position of the semiconductor package 5a with respect to the opening 23a, there may be a case where the relative positional offset between the first camera 101 and the second camera 102 must be further considered.

以下,參照圖20~圖23,說明在實施方式1中,計算第一相機101與第二相機102之間的相對位置偏移量的方法的一例。首先,如圖20的示意性側視圖所示,運算機構27使保持機構21移動至用於載置配置構件23的平台22的Z軸方向上方。Hereinafter, referring to FIGS. 20 to 23, an example of a method of calculating the relative positional offset between the first camera 101 and the second camera 102 in Embodiment 1 will be described. First, as shown in the schematic side view of FIG. 20, the arithmetic mechanism 27 moves the holding mechanism 21 upward in the Z-axis direction of the platform 22 on which the placement member 23 is placed.

如圖20的示意性局部透視側視圖所示,在保持機構21安裝有第一相機101。第一相機101例如包括第一攝像元件31、第一光源32、包括透光部33a及遮光部33b的光學標誌形成部33、單位共軛比設計的第一透鏡34、第二透鏡35以及半鏡(half mirror)36。作為光學標誌形成部33,例如可以使用在中央開設有圓形的孔的構件等。並且,單位共軛比設計是指如下的設計:使位於非無限遠的有限位置的物體所發出的光,通過光學系統而聚集於另外的某一點。As shown in the schematic partial perspective side view of FIG. 20, the first camera 101 is mounted on the holding mechanism 21. The first camera 101 includes, for example, a first imaging element 31, a first light source 32, an optical mark forming portion 33 including a light-transmitting portion 33a and a light-shielding portion 33b, a first lens 34 with a unit conjugate ratio design, a second lens 35, and a half镜(half mirror)36. As the optical mark forming portion 33, for example, a member having a circular hole in the center can be used. In addition, the unit conjugate ratio design refers to a design in which light emitted from an object located at a finite position that is not infinity is collected at a certain point through an optical system.

運算機構27可以使第一光源32發出光38。從第一光源32發出的光38穿過光學標誌形成部33,藉由半鏡36而反射至平台22側,並穿過第一透鏡34入射至平台22的面22a。此時,在成為光38的光路的平台22的面22a,在光學上形成光學標誌37。The computing mechanism 27 can cause the first light source 32 to emit light 38. The light 38 emitted from the first light source 32 passes through the optical mark forming portion 33, is reflected by the half mirror 36 to the side of the platform 22, and enters the surface 22a of the platform 22 through the first lens 34. At this time, the optical mark 37 is optically formed on the surface 22a of the platform 22 that becomes the optical path of the light 38.

光學標誌形成部33是例如能夠沿著從第一光源32發出的光38的光路在第一相機101內移動而配置。因此,藉由運算機構27使光學標誌形成部33移動,第一攝像元件31可以例如在使光學標誌37的中心對焦的狀態下拍攝光學標誌37。換言之,藉由使光學標誌形成部33移動,能夠進行光學標誌37的焦點調整(調焦)。The optical mark forming unit 33 is, for example, arranged to be movable within the first camera 101 along the optical path of the light 38 emitted from the first light source 32. Therefore, by moving the optical mark forming unit 33 by the arithmetic mechanism 27, the first imaging element 31 can capture the optical mark 37 with the center of the optical mark 37 in focus, for example. In other words, by moving the optical mark forming unit 33, the focus adjustment (focusing) of the optical mark 37 can be performed.

運算機構27使第一攝像元件31,穿過第一透鏡34、半鏡36及第二透鏡35拍攝光學標誌37,而獲取光學標誌37的圖像,所述光學標誌37是光學地形成於平台22的面22a。運算機構27使第一攝像元件31所獲取的光學標誌37的圖像的資料發送至運算機構27。再者,實施方式1的電子零件製造裝置中,作為光38的光路的光學系統,包括半鏡36、第一透鏡34及第二透鏡35。The arithmetic mechanism 27 causes the first imaging element 31 to pass through the first lens 34, the half mirror 36, and the second lens 35 to capture the optical mark 37 to obtain an image of the optical mark 37, which is optically formed on the platform 22的面22a。 22 face 22a. The arithmetic unit 27 sends the data of the image of the optical mark 37 acquired by the first imaging element 31 to the arithmetic unit 27. Furthermore, in the electronic component manufacturing apparatus of the first embodiment, the optical system as the optical path of the light 38 includes the half mirror 36, the first lens 34, and the second lens 35.

在圖21中,表示第一攝像元件31所拍攝的光學標誌37的圖像的一例的示意性平面圖。如圖21所示,光學標誌37包括亮部39及暗部40。亮部39具有與透光部33a的形狀相對應的形狀,所述透光部33a是使光學標誌形成部33的光38透過的部分。暗部40具有與遮光部33b的形狀相對應的形狀,所述遮光部33b是遮擋光學標誌形成部33的光38的部分。藉由使用單位共軛比設計的第一透鏡34,可以使光學標誌形成部33的亮部39與暗部40的邊界明確。In FIG. 21, a schematic plan view showing an example of the image of the optical mark 37 captured by the first imaging element 31. As shown in FIG. 21, the optical mark 37 includes a bright part 39 and a dark part 40. The bright portion 39 has a shape corresponding to the shape of the light-transmitting portion 33 a that transmits the light 38 of the optical mark forming portion 33. The dark portion 40 has a shape corresponding to the shape of the light shielding portion 33b, which is a portion that blocks the light 38 of the optical mark forming portion 33. By using the first lens 34 designed with a unit conjugate ratio, the boundary between the bright portion 39 and the dark portion 40 of the optical mark forming portion 33 can be made clear.

然後,運算機構27基於第一攝像元件31所拍攝的光學標誌37的圖像,算出第一相機101與光學標誌37的位置偏移量即第一位置偏移量。第一相機101與光學標誌37的第一位置偏移量的計算,例如,可以藉由如下的方式進行:算出第一相機101的光入射部101a的中心與光學標誌37的中心之間的X軸方向上的距離及Y軸方向上的距離,所述光學標誌37是第一攝像元件31從Z軸方向上方拍攝。Then, based on the image of the optical mark 37 captured by the first imaging element 31, the arithmetic unit 27 calculates the first positional offset amount, which is the amount of positional offset between the first camera 101 and the optical mark 37. The first position offset between the first camera 101 and the optical mark 37 can be calculated, for example, by calculating the X between the center of the light incident portion 101a of the first camera 101 and the center of the optical mark 37 For the distance in the axis direction and the distance in the Y axis direction, the optical mark 37 is captured by the first imaging element 31 from above in the Z axis direction.

接著,運算機構27如圖22的局部透視側視圖所示,使安裝有第一相機101的保持機構21,移動至第二相機102的Z軸方向上方。第二相機102例如,包括第二攝像元件41、第三透鏡42、第四透鏡43、反射鏡(mirror)44及照明45。Next, as shown in the partial perspective side view of FIG. 22, the arithmetic mechanism 27 moves the holding mechanism 21 to which the first camera 101 is mounted upward in the Z-axis direction of the second camera 102. The second camera 102 includes, for example, a second imaging element 41, a third lens 42, a fourth lens 43, a mirror 44 and an illumination 45.

接著,運算機構27使第一相機101的第一光源32發出光,而在第一相機101與第二相機102之間的光路中光學地形成光學標誌37。Next, the arithmetic unit 27 causes the first light source 32 of the first camera 101 to emit light, and optical marks 37 are optically formed in the optical path between the first camera 101 and the second camera 102.

接著,運算機構27如圖22所示,使第二相機102的第二攝像元件41從Z軸方向下方拍攝光學標誌37。Next, as shown in FIG. 22, the arithmetic unit 27 causes the second imaging element 41 of the second camera 102 to capture the optical mark 37 from below the Z-axis direction.

即,從第一光源32發出的光38穿過光學標誌形成部33,經半鏡36反射至第二相機102側,穿過第一透鏡34而光學地形成光學標誌37。然後,光38從第二相機102的光入射部102a入射至反射鏡44而反射至第二攝像元件41側,並穿過第四透鏡43及第三透鏡42而入射至第二攝像元件41。由此,第二攝像元件41從Z軸方向下方拍攝光學標誌37,而獲取光學標誌37的圖像,所述光學標誌37是在第一相機101與第二相機102之間的光路中光學地形成。運算機構27將第二攝像元件41所獲取的光學標誌37的圖像的資料發送至運算機構27。再者,實施方式1的電子零件製造裝置中,作為光38的光路中的光學系統,包括半鏡36、第一透鏡34、反射鏡44、第四透鏡43及第三透鏡42。That is, the light 38 emitted from the first light source 32 passes through the optical mark forming portion 33, is reflected by the half mirror 36 to the second camera 102 side, and passes through the first lens 34 to form the optical mark 37 optically. Then, the light 38 enters the reflecting mirror 44 from the light incident portion 102 a of the second camera 102 and reflects to the second imaging element 41 side, passes through the fourth lens 43 and the third lens 42, and enters the second imaging element 41. Thus, the second imaging element 41 captures the optical mark 37 from below the Z-axis direction, and acquires an image of the optical mark 37, which is optically in the optical path between the first camera 101 and the second camera 102 form. The arithmetic unit 27 sends the data of the image of the optical mark 37 acquired by the second imaging element 41 to the arithmetic unit 27. Furthermore, in the electronic component manufacturing apparatus of the first embodiment, the optical system in the optical path of the light 38 includes the half mirror 36, the first lens 34, the reflecting mirror 44, the fourth lens 43, and the third lens 42.

在圖23中,表示第二攝像元件41所拍攝的光學標誌37的圖像的一例的示意性平面圖。如圖23所示,光學標誌37包括亮部46及暗部47。亮部46具有與光學標誌形成部33的透光部33a的形狀相對應的形狀。暗部47具有與光學標誌形成部33的遮光部33b的形狀相對應的形狀。FIG. 23 is a schematic plan view showing an example of the image of the optical mark 37 captured by the second imaging element 41. As shown in FIG. 23, the optical mark 37 includes a bright part 46 and a dark part 47. The bright portion 46 has a shape corresponding to the shape of the light transmitting portion 33a of the optical mark forming portion 33. The dark portion 47 has a shape corresponding to the shape of the light shielding portion 33b of the optical mark forming portion 33.

接著,運算機構27基於第二攝像元件41所拍攝的光學標誌37的圖像,算出第二相機102與光學標誌37的位置偏移量即第二位置偏移量。第二相機102與光學標誌37的第二位置偏移量的計算,例如可藉由如下方式進行:算出第二相機102的光入射部102a的中心與第二攝像元件41所拍攝的光學標誌37的中心之間的X軸方向上的距離及Y軸方向上的距離。Next, based on the image of the optical mark 37 captured by the second imaging element 41, the arithmetic unit 27 calculates the second positional offset amount, which is the amount of positional offset between the second camera 102 and the optical mark 37. The second position offset of the second camera 102 and the optical mark 37 can be calculated, for example, by calculating the center of the light incident portion 102a of the second camera 102 and the optical mark 37 captured by the second imaging element 41 The distance in the X axis direction and the distance in the Y axis direction between the centers of.

接著,運算機構27基於第一相機101與光學標誌37的第一位置偏移量、及第二相機102與光學標誌37的第二位置偏移量,算出第一相機101與第二相機102的相對位置偏移量。Next, the arithmetic unit 27 calculates the difference between the first camera 101 and the second camera 102 based on the first positional offset between the first camera 101 and the optical mark 37 and the second positional offset between the second camera 102 and the optical mark 37. Relative position offset.

再者,當第二相機102的光入射部102a的中心及第二攝像元件41所拍攝的光學標誌37的中心不存在於在Z軸方向上延伸的同軸上時,優選的是使第一相機101移動,以使這些中心位於同軸上。這時,可以將第二相機102與光學標誌37的第二位置偏移量設為零,因此能夠使運算機構27所算出的第一相機101與第二相機102的相對位置偏移量等於第一相機101與光學標誌37的第一位置偏移量。可以將如上所述的第二相機102的光入射部102a的中心與光學標誌37的中心存在於在Z軸方向上延伸的同軸上時的第一相機101的位置作為後述臨時的基準位置,用於至搬運目標部位為止的被搬運物的移動距離的修正。Furthermore, when the center of the light incident portion 102a of the second camera 102 and the center of the optical mark 37 captured by the second imaging element 41 do not exist on the coaxial axis extending in the Z-axis direction, it is preferable that the first camera 101 moves so that these centers are on the same axis. At this time, the second positional offset between the second camera 102 and the optical mark 37 can be set to zero. Therefore, the relative positional offset between the first camera 101 and the second camera 102 calculated by the calculation mechanism 27 can be equal to the first The first position offset of the camera 101 and the optical mark 37. The position of the first camera 101 when the center of the light incident portion 102a of the second camera 102 and the center of the optical mark 37 exist on the coaxial axis extending in the Z-axis direction as described above can be used as a temporary reference position to be described later. Correction of the moving distance of the object to be transported to the target location.

圖24(a)表示第一相機101及第二相機102位於臨時的基準位置的狀態的一例。首先,運算機構27使第一相機101及第二相機102移動至臨時的基準位置為止。臨時的基準位置例如,是第一相機101的光入射部101a的中心與第二相機102的光入射部102a的中心存在於在Z軸方向延伸的同軸103上時的X軸方向上的設計上的位置。在實施方式1的臨時的基準位置上,實際上,第二相機102的光入射部102a的中心與光學標誌37的中心並不位於在Z軸方向上延伸的同軸103上,運算機構27所算出的第一相機101與第二相機102的X軸方向上的相對位置偏移量為ΔX0 。將臨時的基準位置上的第一相機101的光入射部101a的中心的X軸方向上的位置設為P1 X。並且,在本例中,保持機構21已從分度平台15拽起並保持著半導體封裝體5a。FIG. 24( a) shows an example of a state where the first camera 101 and the second camera 102 are located at the temporary reference position. First, the arithmetic unit 27 moves the first camera 101 and the second camera 102 to the temporary reference position. The temporary reference position is, for example, the design in the X-axis direction when the center of the light incident portion 101a of the first camera 101 and the center of the light incident portion 102a of the second camera 102 exist on the coaxial 103 extending in the Z-axis direction s position. At the temporary reference position in the first embodiment, actually, the center of the light incident portion 102a of the second camera 102 and the center of the optical mark 37 are not located on the coaxial 103 extending in the Z-axis direction, and the calculation mechanism 27 calculates The relative positional offset of the first camera 101 and the second camera 102 in the X-axis direction is ΔX 0 . Let the position in the X-axis direction of the center of the light incident portion 101a of the first camera 101 at the temporary reference position be P 1 X. Furthermore, in this example, the holding mechanism 21 has pulled up from the indexing table 15 and held the semiconductor package 5a.

接著,如圖24(b)所示,運算機構27使第一相機101從臨時的基準位置在X軸方向上移動僅距離L1。距離L1例如是從臨時的基準位置,到如下的設計上的位置為止的X軸方向上的設計上的距離,所述設計是使第二相機102的光入射部102a的中心與圖24(b)所示的中央的半導體封裝體5a的中心存在於在Z軸方向上延伸的同軸上。如果將此時的第一相機101的光入射部101a的中心的X軸方向上的位置設為P2 X,那麼P2 X=P1 X+L1的等式成立。Next, as shown in FIG. 24( b ), the calculation mechanism 27 moves the first camera 101 from the temporary reference position in the X-axis direction by only the distance L1. The distance L1 is, for example, the design distance in the X-axis direction from the temporary reference position to the design position such that the center of the light incident portion 102a of the second camera 102 is as shown in FIG. 24(b ) Shows the center of the central semiconductor package 5a on the coaxial axis extending in the Z-axis direction. If the position in the X-axis direction of the center of the light incident portion 101a of the first camera 101 at this time is P 2 X, the equation of P 2 X=P 1 X+L1 holds.

此時,第二相機102的第二攝像元件41從Z軸方向下方拍攝保持機構21所保持的半導體封裝體5a。第二攝像元件41所拍攝的半導體封裝體5a的圖像的資料被發送至運算機構27。由此,運算機構27可以從第二攝像元件41所拍攝的半導體封裝體5a的圖像,算出第二相機102的光入射部102a的中心與半導體封裝體5a的中心的X軸方向上的位置偏移量ΔX1 。由此,運算機構27能夠掌握半導體封裝體5a(被搬運物)的實際的中心位置。At this time, the second imaging element 41 of the second camera 102 photographs the semiconductor package 5a held by the holding mechanism 21 from the Z-axis direction downward. The data of the image of the semiconductor package 5 a captured by the second imaging element 41 is sent to the arithmetic unit 27. Thereby, the arithmetic unit 27 can calculate the position in the X-axis direction of the center of the light incident portion 102a of the second camera 102 and the center of the semiconductor package 5a from the image of the semiconductor package 5a captured by the second imaging element 41 Offset ΔX 1 . Thereby, the calculation mechanism 27 can grasp the actual center position of the semiconductor package 5a (object to be conveyed).

接著,如圖24(c)所示,運算機構27使第一相機101從臨時的基準位置在X軸方向上移動至距離L2的位置為止。距離L2例如是從臨時的基準位置,到如下的X軸方向上的設計上的位置為止的設計上的距離,所述X軸方向上的設計是使第一相機101的光入射部101a的中心與圖24(c)所示的開口23a的中心存在於在Z軸方向上延伸的同軸上。如果將此時的第一相機101的光入射部101a的中心的X軸方向的位置設為P3 X,那麼P3 X=P1 X+L2的等式成立。Next, as shown in FIG. 24( c ), the calculation mechanism 27 moves the first camera 101 from the temporary reference position in the X-axis direction to a position at a distance L2. The distance L2 is, for example, the design distance from the temporary reference position to the design position in the X-axis direction such that the center of the light incident portion 101a of the first camera 101 is designed The center of the opening 23a shown in FIG. 24(c) exists on the same axis extending in the Z-axis direction. If the position of the center of the light incident portion 101a of the first camera 101 in the X-axis direction at this time is P 3 X, then the equation of P 3 X=P 1 X+L2 holds.

此時,第一相機101的第一攝像元件31從Z軸方向上方拍攝開口23a,所述開口23a是被搬運物的一例即半導體封裝體5a的搬運目標部位的一例。將第一攝像元件31所拍攝的開口23a的圖像的資料發送至運算機構27。因此,運算機構27可以從第一攝像元件31所拍攝的開口23a的圖像,算出第一相機101的光入射部101a的中心與開口23a的中心的X軸方向上的位置偏移量ΔX2 。並且,由此,運算機構27能夠掌握實際的開口23a(搬運目標部位)的中心位置。At this time, the first imaging element 31 of the first camera 101 captures an opening 23a from above the Z-axis direction, which is an example of the transport target portion of the semiconductor package 5a, which is an example of the object to be transported. The data of the image of the opening 23a captured by the first imaging element 31 is sent to the arithmetic unit 27. Therefore, the computing mechanism 27 can calculate the positional deviation amount ΔX 2 in the X-axis direction of the center of the light incident portion 101 a of the first camera 101 and the center of the opening 23 a from the image of the opening 23 a captured by the first imaging element 31. . In addition, from this, the calculation mechanism 27 can grasp the actual center position of the opening 23 a (transport target portion).

接著,如圖24(d)所示,運算機構27藉由安裝有第一相機101的保持機構21,而使半導體封裝體5a從臨時的基準位置移動至在X軸方向上相隔僅距離L3的位置。Next, as shown in FIG. 24( d ), the arithmetic mechanism 27 moves the semiconductor package 5 a from the temporary reference position to a distance of only L3 in the X-axis direction by the holding mechanism 21 on which the first camera 101 is mounted position.

此處,運算機構27例如是以如下的方式算出距離L3。藉由將所述距離L1與所述距離L2相加,而算出臨時的基準位置上的作為被搬運物的半導體封裝體5a的至開口23a為止的X軸方向上的設計上的移動距離L3'(=L1+L2),所述開口23a成為搬運目標部位。設計上的移動距離L3'例如是設為從臨時的基準位置,到如下的X軸方向上的設計上的位置為止的設計上的移動距離,所述X軸方向上的設計是使圖24(b)所示的中央的半導體封裝體5a的中心與圖24(c)所示的開口23a的中心存在於在Z軸方向上延伸的同軸上。Here, the calculation mechanism 27 calculates the distance L3 as follows, for example. By adding the distance L1 and the distance L2, the design moving distance L3' in the X-axis direction from the semiconductor package 5a as the object to be transported at the temporary reference position to the opening 23a is calculated (=L1+L2), said opening 23a becomes a conveyance target part. The design moving distance L3' is, for example, the design moving distance from the temporary reference position to the following design position in the X-axis direction, which is shown in FIG. 24 ( The center of the central semiconductor package 5a shown in b) and the center of the opening 23a shown in FIG. 24(c) exist on the same axis extending in the Z-axis direction.

並且,利用以上算出的相對位置偏移量ΔX0 、位置偏移量ΔX1 及位置偏移量ΔX2 分別進行相加或相除,而修正設計上的移動距離L3'。由此,可以算出X軸方向上的臨時的基準位置上的作為被搬運物的半導體封裝體5a的至開口23a為止的X軸方向上的實際移動距離L3,所述開口23a成為搬運目標部位。換言之,可以算出使第二相機102所拍攝的半導體封裝體5a(被搬運物)移動至搬運目標部位即開口23a為止的移動距離。Then, the relative displacement amount ΔX 0 , the displacement amount ΔX 1 and the displacement amount ΔX 2 calculated above are respectively added or divided to correct the designed moving distance L3 ′. Thereby, the actual movement distance L3 in the X-axis direction of the semiconductor package 5a as the object to be transported at the temporary reference position in the X-axis direction to the opening 23a, which becomes the transfer target site, can be calculated. In other words, it is possible to calculate the moving distance until the semiconductor package 5a (object to be transported) captured by the second camera 102 moves to the opening 23a which is the transport target.

藉由使半導體封裝體5a移動至如下的位置,可以實現作為被搬運物的半導體封裝體5a相對於成為搬運目標部位的開口23a的X軸方向上的更準確的位置對準,所述位置是與臨時的基準位置在X軸方向上相隔僅如上所述而算出的實際移動距離L3的位置。藉由在Y軸方向上也進行與X軸方向同樣的動作,可以實現Y軸方向上的半導體封裝體5a相對於開口23a的更準確的位置對準。如上所述的位置對準之後,藉由將半導體封裝體5a實際載置於開口23a,可以將半導體封裝體5a載置於開口23a的更準確的位置。再者,也可以設為藉由對半導體封裝體5a及開口23a以外的保持機構所保持的半導體封裝體及配置構件的開口也進行同樣的處理,而將相對應的各個半導體封裝體載置於準確的位置。By moving the semiconductor package 5a to the following position, it is possible to achieve a more accurate positional alignment of the semiconductor package 5a as the object to be transported in the X-axis direction with respect to the opening 23a to be the transfer target portion, the position being A position separated from the temporary reference position in the X-axis direction by the actual movement distance L3 calculated only as described above. By performing the same operation in the Y-axis direction as in the X-axis direction, a more accurate positional alignment of the semiconductor package 5a in the Y-axis direction relative to the opening 23a can be achieved. After the alignment as described above, by actually placing the semiconductor package 5a in the opening 23a, the semiconductor package 5a can be placed in a more accurate position of the opening 23a. In addition, the openings of the semiconductor package and the arrangement member held by the holding mechanism other than the semiconductor package 5a and the opening 23a may be treated in the same manner, and the corresponding semiconductor packages may be placed on Accurate location.

然後,如圖1所示,平台22在Y軸方向上移動,使在多個開口23a分別載置有半導體封裝體5a的狀態的配置構件23移動至配置構件裝載機24。配置構件裝載機24是以保持著配置構件23的狀態沿軌道25在X軸方向移動,在配置構件裝填部26裝填載置有半導體封裝體5a的配置構件23。並且,以上是基於設計上的移動距離或位置等進行至搬運目標部位為止的被搬運物的移動距離的修正,但是並不限定於此,例如,也可以基於預先由第一相機101及第二相機102測定的值(例如,第一相機101的光入射部101a的中心與第二相機102的光入射部102a的中心存在於在Z軸方向上延伸的同軸上的實測位置、從保持半導體封裝體5a之前的保持頭21a的中心到開口23a為止的距離、或在上次測定中算出的位置及距離等),修正至搬運目標部位為止的被搬運物的移動距離。Then, as shown in FIG. 1, the stage 22 moves in the Y-axis direction, and the arrangement member 23 in a state where the semiconductor package 5 a is placed in each of the plurality of openings 23 a moves to the arrangement member loader 24. The placement member loader 24 moves in the X-axis direction along the rail 25 while holding the placement member 23, and the placement member 23 on which the semiconductor package 5 a is placed is placed in the placement member loading portion 26. In addition, the above is the correction of the moving distance of the conveyed object to the conveying target part based on the designed moving distance, position, etc., but it is not limited to this, for example, it may be based on the first camera 101 and the second The value measured by the camera 102 (for example, the center of the light incident portion 101a of the first camera 101 and the center of the light incident portion 102a of the second camera 102 exist at the actually measured position on the coaxial extending in the Z-axis direction, from the holding semiconductor package The distance from the center of the holding head 21a before the body 5a to the opening 23a, or the position and distance calculated in the previous measurement, etc.) are corrected for the moving distance of the object to be transported to the transport target.

如上所述,在實施方式1的電子零件製造裝置中,是將在光學上形成的光學標誌37用於半導體封裝體5a與開口23a的位置對準。因此,在實施方式1的電子零件製造裝置中,例如不需要將桿件及靶之類的修正機構等夾具的移動空間設置於裝置內的被搬運物的搬運路徑,因此能夠抑制裝置的大型化。並且,在實施方式1的電子零件製造裝置中,也不需要將包含桿件及靶的修正機構等治具安裝於裝置,因此也能夠抑制裝置的結構的複雜化。As described above, in the electronic component manufacturing apparatus of the first embodiment, the optical mark 37 formed optically is used for aligning the position of the semiconductor package 5a and the opening 23a. Therefore, in the electronic component manufacturing apparatus of the first embodiment, for example, it is not necessary to provide a moving space of a jig such as a correction mechanism such as a rod and a target in the transport path of the object to be transported in the apparatus, so it is possible to suppress the enlargement of the apparatus . In addition, in the electronic component manufacturing apparatus of the first embodiment, it is not necessary to attach a jig including a correction mechanism including a rod and a target to the device, and therefore, it is possible to suppress the complexity of the structure of the device.

<實施方式2> 實施方式2的電子零件製造裝置的特徵在於,除了包括第一攝像元件31的第一相機201及包括第二攝像元件41的第二相機202以外,還包含包括第三攝像元件51的第三相機203。以下,參照圖25~圖29的示意性平面圖,對實施方式2的電子零件製造裝置的搬運機構的動作的一例進行說明。<Embodiment 2> The electronic component manufacturing apparatus of Embodiment 2 is characterized by including a third camera including a third imaging element 51 in addition to the first camera 201 including the first imaging element 31 and the second camera 202 including the second imaging element 41 203. Hereinafter, an example of the operation of the conveyance mechanism of the electronic component manufacturing apparatus according to Embodiment 2 will be described with reference to the schematic plan views of FIGS. 25 to 29.

在圖25中,表示實施方式2的電子零件製造裝置的搬運機構的基本結構。在保持機構21,除了第一相機201以外,還安裝有第三相機203。保持機構21能夠在作為第一方向的X軸方向移動。並且,保持機構21包括保持頭21a,所述保持頭21a是構成為能夠保持半導體封裝體5a。FIG. 25 shows the basic structure of the transport mechanism of the electronic component manufacturing apparatus according to the second embodiment. In the holding mechanism 21, in addition to the first camera 201, a third camera 203 is installed. The holding mechanism 21 can move in the X-axis direction as the first direction. In addition, the holding mechanism 21 includes a holding head 21a configured to be able to hold the semiconductor package 5a.

第二相機202能夠在作為第二方向的Y軸方向移動。第二相機202能夠位於與第三相機203為在Z軸方向上延伸的同軸,但由於裝置的限制,而不能位於與第一相機201為在Z軸方向上延伸的同軸。並且,平台22只能夠在Y軸方向移動,在載置配置構件23之側的平台22的面22a,設置有非光學標誌48。The second camera 202 can move in the Y-axis direction as the second direction. The second camera 202 can be located coaxially with the third camera 203 extending in the Z-axis direction, but due to limitations of the device, it cannot be located coaxially with the first camera 201 extending in the Z-axis direction. In addition, the platform 22 can only move in the Y-axis direction, and a non-optical mark 48 is provided on the surface 22 a of the platform 22 on the side where the placement member 23 is placed.

在實施方式2中,也是首先,與實施方式1的第一相機101同樣地,運算機構27使第三相機203移動至平台22的Z軸方向上方而在平台22的面22a形成光學標誌37。接著,運算機構27藉由使第三相機203的第三攝像元件51拍攝光學標誌37,而獲取光學標誌37的圖像。接著,運算機構27將第三攝像元件51所獲取的光學標誌37的圖像的資料發送至運算機構27。然後,運算機構27基於第三攝像元件51所獲取的光學標誌37的圖像,算出第三相機203與光學標誌37的位置偏移量即第一位置偏移量。In the second embodiment, too, first, similar to the first camera 101 in the first embodiment, the calculation mechanism 27 moves the third camera 203 upward in the Z-axis direction of the stage 22 to form an optical mark 37 on the surface 22 a of the stage 22. Next, the arithmetic unit 27 causes the third imaging element 51 of the third camera 203 to capture the optical mark 37 to obtain an image of the optical mark 37. Next, the arithmetic unit 27 sends the data of the image of the optical mark 37 acquired by the third imaging element 51 to the arithmetic unit 27. Then, based on the image of the optical mark 37 acquired by the third imaging element 51, the arithmetic unit 27 calculates the first positional offset amount, which is the amount of positional offset between the third camera 203 and the optical mark 37.

接著,如圖26所示,運算機構27使第三相機203在X軸方向移動,使第二相機202在Y軸方向移動,以使第三相機203位於第二相機202的Z軸方向上方。此時的第三相機203的朝X軸方向的移動距離及第二相機202的朝Y軸方向的移動距離,例如可以使用如下的設計上的距離,所述設計上的距離成為第三相機203的光入射部的中心與第二相機202的光入射部的中心存在於在Z軸方向延伸的同軸上的位置。Next, as shown in FIG. 26, the arithmetic mechanism 27 moves the third camera 203 in the X-axis direction and moves the second camera 202 in the Y-axis direction so that the third camera 203 is positioned above the second camera 202 in the Z-axis direction. In this case, the moving distance of the third camera 203 in the X-axis direction and the moving distance of the second camera 202 in the Y-axis direction can be, for example, the following design distances, which become the third camera 203 The center of the light incident portion of φ and the center of the light incident portion of the second camera 202 exist on coaxial positions extending in the Z-axis direction.

接著,與實施方式1的第一相機101及第二相機102同樣地,運算機構27在第三相機203與第二相機202之間的光路在光學上形成光學標誌37,使第二相機202的第二攝像元件41從Z軸方向下方拍攝光學標誌37,從而獲取光學標誌37的圖像的資料。接著,運算機構27使第二攝像元件41所獲取的光學標誌37的圖像的資料發送至運算機構27。然後,運算機構27基於第二攝像元件41所獲取的光學標誌37的圖像,算出第二相機202與光學標誌37的位置偏移量即第二位置偏移量。Next, similarly to the first camera 101 and the second camera 102 of the first embodiment, the arithmetic unit 27 optically forms an optical mark 37 on the optical path between the third camera 203 and the second camera 202 to make the second camera 202 The second imaging element 41 captures the optical mark 37 from below the Z-axis direction, thereby acquiring data of the image of the optical mark 37. Next, the arithmetic unit 27 sends the data of the image of the optical mark 37 acquired by the second imaging element 41 to the arithmetic unit 27. Then, based on the image of the optical mark 37 acquired by the second imaging element 41, the arithmetic unit 27 calculates the second positional offset amount, which is the amount of positional offset between the second camera 202 and the optical mark 37.

藉由運算機構27算出第一位置偏移量及第二位置偏移量,能夠確定成為第三相機203的光入射部的中心與第二相機202的光入射部的中心存在於在Z軸方向延伸的同軸上的位置時的第三相機203的X軸方向上的位置及第二相機202的Y軸方向上的實際位置。By calculating the first position shift amount and the second position shift amount by the arithmetic unit 27, it can be determined that the center of the light incident portion of the third camera 203 and the center of the light incident portion of the second camera 202 exist in the Z-axis direction The extended coaxial position is the position of the third camera 203 in the X-axis direction and the actual position of the second camera 202 in the Y-axis direction.

接著,如圖27所示,運算機構27使平台22在Y軸方向移動,並使第一相機201在X軸方向移動,以使第一相機201位於非光學標誌48的Z軸方向上方,所述非光學標誌48設置於平台22的面22a。此時的平台22的朝Y軸方向的移動距離及第一相機201的朝X軸方向的移動距離,例如可以使用如下的設計上的距離,所述設計上的距離成為第一相機201的光入射部的中心與非光學標誌48的中心存在於在Z軸方向延伸的同軸上的位置,所述非光學標誌48是設置於平台22的面22a。Next, as shown in FIG. 27, the calculation mechanism 27 moves the stage 22 in the Y-axis direction and moves the first camera 201 in the X-axis direction so that the first camera 201 is positioned above the Z-axis direction of the non-optical mark 48. The non-optical mark 48 is provided on the surface 22 a of the platform 22. At this time, the moving distance of the platform 22 in the Y-axis direction and the moving distance of the first camera 201 in the X-axis direction may be, for example, the following design distances, which become the light of the first camera 201 The center of the incident portion and the center of the non-optical mark 48 exist on the coaxial axis extending in the Z-axis direction, and the non-optical mark 48 is provided on the surface 22 a of the platform 22.

接著,運算機構27藉由使第一相機201的第一攝像元件31從Z軸方向上方拍攝非光學標誌48,而獲取非光學標誌48的圖像。接著,運算機構27使第一攝像元件31所獲取的非光學標誌48的圖像的資料發送至運算機構27。然後,運算機構27基於第一攝像元件31所獲取的非光學標誌48的圖像,算出第一相機201與非光學標誌48的第三位置偏移量。換言之,運算機構27算出第一相機201的X軸方向上的位置及平台22的Y軸方向上的實際位置,所述第一相機201的X軸方向上的位置及平台22的Y軸方向上的實際位置成為第一相機201的光入射部的中心與非光學標誌48的中心存在於在Z軸方向延伸的同軸上的位置。Next, the arithmetic unit 27 captures the image of the non-optical mark 48 by causing the first imaging element 31 of the first camera 201 to capture the non-optical mark 48 from above the Z-axis direction. Next, the arithmetic unit 27 sends the data of the image of the non-optical mark 48 acquired by the first imaging element 31 to the arithmetic unit 27. Then, based on the image of the non-optical mark 48 acquired by the first imaging element 31, the arithmetic unit 27 calculates the third positional deviation between the first camera 201 and the non-optical mark 48. In other words, the computing mechanism 27 calculates the position of the first camera 201 in the X-axis direction and the actual position of the stage 22 in the Y-axis direction, and the position of the first camera 201 in the X-axis direction and the stage 22 in the Y-axis direction The actual position of is the position where the center of the light incident portion of the first camera 201 and the center of the non-optical mark 48 exist on the same axis extending in the Z-axis direction.

接著,如圖28所示,運算機構27使平台22在Y軸方向移動,並使第三相機203在X軸方向移動,以使第三相機203位於非光學標誌48的Z軸方向上方,所述非光學標誌48是設置於平台22的面22a。此時的平台22的朝Y軸方向的移動距離及第三相機203的朝X軸方向的移動距離,例如,可以使用如下的設計上的距離,所述設計上的距離成為第三相機203的光入射部的中心與非光學標誌48的中心存在於在Z軸方向延伸的同軸上的位置。Next, as shown in FIG. 28, the calculation mechanism 27 moves the stage 22 in the Y-axis direction and moves the third camera 203 in the X-axis direction so that the third camera 203 is positioned above the Z-axis direction of the non-optical mark 48. The non-optical mark 48 is provided on the surface 22 a of the platform 22. At this time, the moving distance of the platform 22 in the Y-axis direction and the moving distance of the third camera 203 in the X-axis direction can be, for example, the following design distances, which are the distances of the third camera 203 The center of the light incident portion and the center of the non-optical mark 48 exist on the coaxial position extending in the Z-axis direction.

接著,運算機構27藉由使第三相機203的第三攝像元件51從Z軸方向上方拍攝非光學標誌48,而獲取非光學標誌48的圖像。接著,運算機構27使第三攝像元件51所獲取的非光學標誌48的圖像的資料發送至運算機構27。然後,運算機構27從第三攝像元件51所獲取的非光學標誌48的圖像,算出第三相機203與非光學標誌48的第四位置偏移量。換言之,運算機構27算出第三相機203的X軸方向上的位置及平台22的Y軸方向上的實際位置,所述第三相機203的X軸方向上的位置及平台22的Y軸方向上的實際位置成為第三相機203的光入射部的中心與非光學標誌48的中心存在於在Z軸方向延伸的同軸上的位置。Next, the arithmetic unit 27 captures the image of the non-optical mark 48 by causing the third imaging element 51 of the third camera 203 to capture the non-optical mark 48 from above the Z-axis direction. Next, the arithmetic unit 27 sends the data of the image of the non-optical mark 48 acquired by the third imaging element 51 to the arithmetic unit 27. Then, the arithmetic unit 27 calculates the fourth positional offset of the third camera 203 and the non-optical mark 48 from the image of the non-optical mark 48 acquired by the third imaging element 51. In other words, the computing mechanism 27 calculates the position of the third camera 203 in the X-axis direction and the actual position of the stage 22 in the Y-axis direction, and the position of the third camera 203 in the X-axis direction and the stage 22 in the Y-axis direction The actual position of is the position where the center of the light incident portion of the third camera 203 and the center of the non-optical mark 48 exist on the same axis extending in the Z-axis direction.

運算機構27能夠基於如上所述而算出的第三位置偏移量及第四位置偏移量,算出第一相機201與第三相機203的相對位置關係。例如,藉由獲取第一相機201的X軸方向上的位置及平台22的Y軸方向上的位置、與第三相機203的X軸方向上的位置及平台22的Y軸方向上的位置的差分,運算機構27能夠算出第一相機201的光入射部的中心與第三相機203的光入射部的中心之間的X軸方向的距離及Y軸方向的距離,所述第一相機201的X軸方向上的位置及平台22的Y軸方向上的位置成為第一相機201的光入射部的中心及非光學標誌48的中心存在於在Z軸方向上延伸的同軸上的位置,所述第三相機203的X軸方向上的位置及平台22的Y軸方向上的位置成為第三相機203的光入射部的中心及非光學標誌48的中心存在於在Z軸方向上延伸的同軸上的位置。The arithmetic unit 27 can calculate the relative positional relationship between the first camera 201 and the third camera 203 based on the third positional deviation amount and the fourth positional deviation amount calculated as described above. For example, by acquiring the position of the first camera 201 in the X-axis direction and the position of the stage 22 in the Y-axis direction, and the position of the third camera 203 in the X-axis direction and the position of the stage 22 in the Y-axis direction Difference, the calculation mechanism 27 can calculate the distance in the X axis direction and the distance in the Y axis direction between the center of the light incident portion of the first camera 201 and the center of the light incident portion of the third camera 203. The position in the X axis direction and the position in the Y axis direction of the stage 22 become the positions where the center of the light incident portion of the first camera 201 and the center of the non-optical mark 48 exist on the coaxial axis extending in the Z axis direction, The position of the third camera 203 in the X axis direction and the position of the stage 22 in the Y axis direction become the center of the light incident portion of the third camera 203 and the center of the non-optical mark 48 exist on the coaxial axis extending in the Z axis direction s position.

並且,當運算機構27能夠算出第一相機201的光入射部的中心與第三相機203的光入射部的中心之間的X軸方向的距離及Y軸方向的距離時,可以算出第一相機201的光入射部的中心與第二相機202的光入射部的中心之間的分別在X軸方向及Y軸方向上的相對於設計上的位置的相對位置偏移量。即,在實施方式2中,運算機構27藉由進行第二相機202與第三相機203的位置對準,能夠進行第一相機201與第二相機202的位置對準。In addition, when the computing mechanism 27 can calculate the distance in the X-axis direction and the distance in the Y-axis direction between the center of the light incident portion of the first camera 201 and the center of the light incident portion of the third camera 203, the first camera can be calculated The relative positional offset between the center of the light incident portion of 201 and the center of the light incident portion of the second camera 202 in the X-axis direction and the Y-axis direction with respect to the design position, respectively. That is, in Embodiment 2, the arithmetic unit 27 can perform the position alignment of the first camera 201 and the second camera 202 by performing the position alignment of the second camera 202 and the third camera 203.

以如上所述的方式,運算機構27算出第一相機201的光入射部的中心與第二相機202的光入射部的中心之間的分別在X軸方向及Y軸方向上的相對位置偏移量之後,利用所述相對位置偏移量,修正作為被搬運物的半導體封裝體5a至作為搬運目標部位的開口23a為止的分別在X軸方向及Y軸方向上的設計上的移動距離。由此,在實施方式2中,也能夠進行半導體封裝體5a相對於開口23a的更準確的位置對準。As described above, the calculation mechanism 27 calculates the relative positional deviation between the center of the light incident portion of the first camera 201 and the center of the light incident portion of the second camera 202 in the X-axis direction and the Y-axis direction, respectively After the measurement, the relative movement distance between the semiconductor package 5a, which is the object to be transported, and the opening 23a, which is the destination of the transfer, in the X-axis direction and the Y-axis direction is corrected. Thus, in the second embodiment, the semiconductor package 5a can be more accurately aligned with the opening 23a.

如圖29所示,第二相機202的第二攝像元件41能夠從Z軸方向下方拍攝保持機構21的保持頭21a。這意味著,第二相機202的第二攝像元件41能夠從Z軸方向下方拍攝保持機構21的保持頭21a所保持的半導體封裝體5a。並且,第一相機201的第一攝像元件31是構成為能夠從Z軸方向上方與拍攝非光學標誌48一同,還拍攝作為被搬運物的搬運目標部位的開口23a。As shown in FIG. 29, the second imaging element 41 of the second camera 202 can capture the holding head 21 a of the holding mechanism 21 from below in the Z-axis direction. This means that the second imaging element 41 of the second camera 202 can photograph the semiconductor package 5a held by the holding head 21a of the holding mechanism 21 from below the Z-axis direction. In addition, the first imaging element 31 of the first camera 201 is configured to be capable of imaging the opening 23 a as a conveyance target portion of the object to be conveyed together with the non-optical mark 48 from above in the Z-axis direction.

因此,在實施方式2中,也是能夠除了第一相機201的光入射部的中心與第二相機202的光入射部的中心之間的分別在X軸方向及Y軸方向上的相對位置偏移量以外,還考慮到第二相機202的光入射部的中心與半導體封裝體5a的中心之間的分別在X軸方向及Y軸方向上的位置偏移量、及第一相機201的光入射部的中心與開口23a之間的分別在X軸方向及Y軸方向上的位置偏移量,而修正分別在X軸方向及Y軸方向上的半導體封裝體5a至開口23a為止的設計上的移動距離。Therefore, in the second embodiment as well, the relative positions of the center of the light incident portion of the first camera 201 and the center of the light incident portion of the second camera 202 in the X-axis direction and the Y-axis direction can be shifted, respectively. In addition to the amount, the positional offset in the X-axis direction and the Y-axis direction between the center of the light incident portion of the second camera 202 and the center of the semiconductor package 5a, and the light incidence of the first camera 201 are also considered Between the center of the portion and the opening 23a in the X-axis direction and the Y-axis direction, respectively, to correct the design of the semiconductor package 5a to the opening 23a in the X-axis direction and the Y-axis direction, respectively Moving distance.

實施方式2的以上所述以外的說明與實施方式1相同,因此省略其說明。The description of Embodiment 2 other than the above is the same as that of Embodiment 1, and therefore the description is omitted.

<實施方式3> 實施方式3的電子零件製造裝置的特徵在於如下方面:包括第一相機301,所述第一相機301在圖30及圖31中表示了示意性局部透視側視圖。在實施方式3的第一相機301中,除了第一光源32以外,還包括第二光源65。<Embodiment 3> The electronic component manufacturing apparatus of Embodiment 3 is characterized by including the first camera 301, which shows a schematic partial perspective side view in FIGS. 30 and 31. The first camera 301 of Embodiment 3 includes a second light source 65 in addition to the first light source 32.

當實施方式3的電子零件製造裝置處於圖30的狀態時,從第一光源32發出光,另一方面,從第二光源65未發出光。此時,利用從第一光源32發出的光而形成光學標誌37。在圖32的示意性平面圖中,表示此時第一相機301的第一攝像元件31所拍攝的光學標誌37的圖像的一例。When the electronic component manufacturing apparatus of Embodiment 3 is in the state of FIG. 30, light is emitted from the first light source 32, and on the other hand, light is not emitted from the second light source 65. At this time, the optical mark 37 is formed using the light emitted from the first light source 32. The schematic plan view of FIG. 32 shows an example of the image of the optical mark 37 captured by the first imaging element 31 of the first camera 301 at this time.

當實施方式3的電子零件製造裝置處於圖31的狀態時,從第一光源32未發出光,另一方面,從第二光源65發出光。此時,只是使從第二光源65發出並透過半鏡64的光照射至面,所以不形成光學標誌37,而只是明亮地照射照射面。在圖33的示意性平面圖中,表示此時第一相機301的第一攝像元件31所拍攝的面的圖像的一例。當實施方式3的電子零件製造裝置處於圖33的狀態時,與形成有光學標誌37的情況相比,能夠以更寬廣的視場進行拍攝。即,當需要相機進行位置對準時設為圖30的狀態,在拍攝開口等時設為圖31的狀態,由此能夠以寬闊的視場拍攝開口等。即,在實施方式3中,藉由進行如下的步驟,而可以根據狀況使用電子零件製造裝置,所述步驟包括切換包含光學標誌形成部33的光源32與不含光學標誌形成部33的第二光源65的步驟。When the electronic component manufacturing apparatus of Embodiment 3 is in the state of FIG. 31, no light is emitted from the first light source 32, and on the other hand, light is emitted from the second light source 65. At this time, only the light emitted from the second light source 65 and passing through the half mirror 64 is irradiated to the surface, so the optical mark 37 is not formed, but the irradiation surface is brightly irradiated. The schematic plan view in FIG. 33 shows an example of the image of the surface captured by the first imaging element 31 of the first camera 301 at this time. When the electronic component manufacturing apparatus of Embodiment 3 is in the state of FIG. 33, it is possible to perform imaging with a wider field of view than when the optical mark 37 is formed. That is, it is set to the state of FIG. 30 when the camera needs to be aligned, and is set to the state of FIG. 31 when shooting the opening or the like, whereby the opening and the like can be captured with a wide field of view. That is, in Embodiment 3, the electronic component manufacturing apparatus can be used according to the situation by performing the following steps including switching the light source 32 including the optical mark forming portion 33 and the second without the optical mark forming portion 33 Steps of the light source 65.

另外,光學標誌形成部33配置於適配器(adapter)62內,並固定了其位置,但是例如,如圖34的示意性側面透視圖所示,藉由使固定適配器62的緊固螺釘(set screw)63鬆開而使適配器62的位置變更至例如Z軸方向上方,能夠使光學標誌形成部33移動。再者,緊固螺釘61將第一光源32固定於適配器62。In addition, the optical mark forming portion 33 is arranged in an adapter 62 and fixes its position, but, for example, as shown in the schematic side perspective view of FIG. 34, a set screw that fixes the adapter 62 (set screw ) 63 is released to change the position of the adapter 62 to, for example, the Z-axis direction upward, and the optical mark forming unit 33 can be moved. Furthermore, the fastening screw 61 fixes the first light source 32 to the adapter 62.

所述結構的實施方式3的電子零件製造裝置的第一相機301也可以應用於實施方式1的第一相機101及實施方式2的第一相機201中的任一者。The first camera 301 of the electronic component manufacturing apparatus of the third embodiment having the above-described structure can also be applied to any of the first camera 101 of the first embodiment and the first camera 201 of the second embodiment.

實施方式3的以上所述以外的說明與實施方式1或實施方式2相同,因此省略對其說明。The description of Embodiment 3 other than the above is the same as that of Embodiment 1 or Embodiment 2, and therefore its description is omitted.

再者,在實施方式1~實施方式3中,電子零件製造裝置並不限定於此,例如也可以是切斷裝置。In addition, in Embodiments 1 to 3, the electronic component manufacturing apparatus is not limited to this, and may be a cutting apparatus, for example.

已對本發明的實施方式進行說明,但是應認為,本次公開的實施方式在所有方面均為例示,而不起限制性的作用。本發明的範圍是由權利要求書來表示,並且意圖包含與實施方式同等的含義及範圍內的所有變更。The embodiment of the present invention has been described, but it should be considered that the embodiment disclosed this time is an example in all aspects and does not play a limiting role. The scope of the present invention is defined by the claims, and is intended to include all modifications within the meaning and scope equivalent to the embodiments.

1‧‧‧基板裝填部 2‧‧‧基板推出構件 3‧‧‧基材 4‧‧‧密封樹脂 5‧‧‧半導體封裝體基板 5a‧‧‧半導體封裝體 6‧‧‧封裝體置入裝載機 6a‧‧‧軌道 7‧‧‧基板供給台 8‧‧‧切割平台 8a‧‧‧旋轉機構 8b‧‧‧對準相機 9‧‧‧轉軸 10‧‧‧刀片 11‧‧‧洗滌水噴霧構件 12‧‧‧空氣噴射構件 13‧‧‧封裝體卸載機 14‧‧‧翻轉器 14a‧‧‧軌道 15‧‧‧分度平台 16‧‧‧海綿輥 17‧‧‧空氣噴射構件 18‧‧‧標記檢查用相機 19‧‧‧封裝體檢查用相機 21‧‧‧保持機構 21a‧‧‧保持頭 22‧‧‧平台 22a‧‧‧面 23‧‧‧配置構件 23a‧‧‧開口 24‧‧‧配置構件裝載機 25‧‧‧軌道 26‧‧‧配置構件裝填部 27‧‧‧運算機構 31‧‧‧第一攝像元件 32‧‧‧第一光源 33‧‧‧光學標誌形成部 33a‧‧‧透光部 33b‧‧‧遮光部 34‧‧‧第一透鏡 35‧‧‧第二透鏡 36‧‧‧半鏡 37‧‧‧光學標誌 38‧‧‧光 39‧‧‧亮部 40‧‧‧暗部 41‧‧‧第二撮像元件 42‧‧‧第三透鏡 43‧‧‧第四透鏡 44‧‧‧反射鏡 45‧‧‧照明 46‧‧‧亮部 47‧‧‧暗部 48‧‧‧非光學標誌 51‧‧‧第三攝像元件 61‧‧‧緊固螺釘 62‧‧‧適配器 63‧‧‧緊固螺釘 64‧‧‧半鏡 65‧‧‧第二光源 71‧‧‧黏接層(黏合層) 72‧‧‧薄片狀基材 101、201、301‧‧‧第一相機 101a‧‧‧光入射部 102、202‧‧‧第二相機 102a‧‧‧光入射部 103‧‧‧同軸 203‧‧‧第三相機 A‧‧‧基板供給機構 B‧‧‧基板切斷機構 C‧‧‧洗滌機構 D‧‧‧搬運機構 L1、L2、L3‧‧‧距離 ΔX0‧‧‧相對位置偏移量 ΔX1‧‧‧位置偏移量 ΔX2‧‧‧位置偏移量 P1X、P2X、P3X‧‧‧位置 X、Y、Z‧‧‧座標軸方向1‧‧‧Substrate loading part 2‧‧‧Substrate ejection member 3‧‧‧Base material 4‧‧‧Sealing resin 5‧‧‧Semiconductor package substrate 5a‧‧‧Semiconductor package 6‧‧‧Package placement and loading Machine 6a ‧ ‧ ‧ track 7 ‧ ‧ ‧ substrate supply table 8 ‧ ‧ ‧ cutting platform 8a ‧ ‧ ‧ rotating mechanism 8b ‧ ‧ ‧ alignment camera 9 ‧ ‧ ‧ shaft 10 ‧ ‧ ‧ blade 11 ‧ ‧ wash water spray member 12‧‧‧Air injection member 13‧‧‧Package unloader 14‧‧‧Inverter 14a‧‧‧Track 15‧‧‧ Indexing platform 16‧‧‧Sponge roller 17‧‧‧Air injection member 18‧‧‧ Mark inspection camera 19‧‧‧Camera inspection package 21‧‧‧ Holding mechanism 21a‧‧‧ Holding head 22‧‧‧Platform 22a‧‧‧Face 23‧‧‧Configuration member 23a‧‧‧Opening 24‧‧‧ Configuration component loader 25‧‧‧ track 26‧‧‧ configuration component loading part 27‧‧‧ arithmetic mechanism 31‧‧‧ first imaging element 32‧‧‧ first light source 33‧‧‧ optical mark forming part 33a‧‧‧ Transmitting part 33b‧‧‧Shading part 34‧‧‧First lens 35‧‧‧Second lens 36‧‧‧Half mirror 37‧‧‧Optical mark 38‧‧‧Light 39‧‧‧Bright part 40‧‧‧ Dark part 41‧‧‧ Second imaging element 42‧‧‧ Third lens 43‧‧‧ Fourth lens 44‧‧‧Reflector 45‧‧‧ Illumination 46‧‧‧ Bright part 47‧‧‧Dark part 48‧‧‧Non Optical mark 51‧‧‧ Third imaging element 61‧‧‧Clamping screw 62‧‧‧Adapter 63‧‧‧Clamping screw 64‧‧‧Half mirror 65‧‧‧Second light source 71‧‧‧ Adhesive layer ( Adhesive layer) 72‧‧‧Flake-shaped substrates 101, 201, 301‧‧‧ First camera 101a‧‧‧Light incident section 102, 202‧‧‧ Second camera 102a‧‧‧Light incident section 103‧‧‧Coaxial 203‧‧‧ Third camera A‧‧‧Substrate supply mechanism B‧‧‧Substrate cutting mechanism C‧‧‧ Washing mechanism D‧‧‧Transport mechanism L1, L2, L3‧‧‧Distance ΔX 0 ‧‧‧Relative position Offset ΔX 1 ‧‧‧Position offset ΔX 2 ‧‧‧Position offset P 1 X, P 2 X, P 3 X‧‧‧Position X, Y, Z‧‧‧Coordinate axis direction

圖1是實施方式1的電子零件製造裝置的示意性平面圖。 圖2是圖解基板供給機構A的動作的一例的示意性側視圖。 圖3是圖解基板供給機構A的動作的一例的示意性側視圖。 圖4是圖解基板切斷機構B的動作的一例的示意性側視圖。 圖5是圖解基板切斷機構B的動作的一例的示意性側視圖。 圖6是圖解基板切斷機構B的動作的一例的示意性側視圖。 圖7是圖解洗滌機構C的動作的一例的示意性側視圖。 圖8是圖解洗滌機構C的動作的一例的示意性側視圖。 圖9是圖解搬運機構D的動作的一例的示意性側視圖。 圖10是圖解搬運機構D的動作的一例的示意性側視圖。 圖11是圖解搬運機構D的動作的一例的示意性側視圖。 圖12是圖解搬運機構D的動作的一例的示意性側視圖。 圖13是圖解搬運機構D的動作的一例的示意性側視圖。 圖14是圖解保持機構保持半導體封裝體的動作的一例的示意性側視圖。 圖15是圖解保持機構保持半導體封裝體的動作的另一例的示意性剖面圖。 圖16是圖解第二攝像元件從Z軸方向下方拍攝半導體封裝體的動作的一例的示意性側視圖,所述半導體封裝體是由保持機構保持著。 圖17是圖解第一攝像元件從Z軸方向上方拍攝配置構件的開口的動作的一例的示意性側視圖。 圖18是圖解進行半導體封裝體的位置對準的動作的一例的示意性剖面圖。 圖19是圖解進行半導體封裝體的配置的動作的一例的示意性剖面圖。 圖20是圖解第一攝像元件拍攝在光學上形成的光學標誌的動作的一例的示意性局部透視側視圖。 圖21是第一攝像元件所拍攝的在光學上形成的光學標誌的圖像的一例的示意性平面圖。 圖22是圖解第二攝像元件拍攝在光學上形成的光學標誌的動作的一例的示意性局部透視側視圖。 圖23是第二攝像元件所拍攝的在光學上形成的光學標誌的圖像的一例的示意性平面圖。 圖24(a)~圖24(d)是圖解搬運機構D的動作的一例的示意性側視圖。 圖25是圖解實施方式2的電子零件製造裝置的搬運機構的動作的一例的示意性平面圖。 圖26是圖解實施方式2的電子零件製造裝置的搬運機構的動作的一例的示意性平面圖。 圖27是圖解實施方式2的電子零件製造裝置的搬運機構的動作的一例的示意性平面圖。 圖28是圖解實施方式2的電子零件製造裝置的搬運機構的動作的一例的示意性平面圖。 圖29是圖解實施方式2的電子零件製造裝置的搬運機構的動作的一例的示意性平面圖。 圖30是實施方式3的電子零件製造裝置的第一相機的一例的示意性局部透視側視圖。 圖31是實施方式3的電子零件製造裝置的第一相機的一例的示意性局部透視側視圖。 圖32是在圖30所示的狀態下第一相機的第一攝像元件所拍攝的光學標誌的圖像的一例的示意性平面圖。 圖33是在圖31所示的狀態下第一相機的第一攝像元件所拍攝的面的圖像的一例的示意性平面圖。 圖34是實施方式3的電子零件製造裝置的第一相機的另一例的示意性局部透視側視圖。FIG. 1 is a schematic plan view of the electronic component manufacturing apparatus of Embodiment 1. FIG. 2 is a schematic side view illustrating an example of the operation of the substrate supply mechanism A. 3 is a schematic side view illustrating an example of the operation of the substrate supply mechanism A. 4 is a schematic side view illustrating an example of the operation of the substrate cutting mechanism B. 5 is a schematic side view illustrating an example of the operation of the substrate cutting mechanism B. 6 is a schematic side view illustrating an example of the operation of the substrate cutting mechanism B. 7 is a schematic side view illustrating an example of the operation of the washing mechanism C. FIG. 8 is a schematic side view illustrating an example of the operation of the washing mechanism C. FIG. 9 is a schematic side view illustrating an example of the operation of the transport mechanism D. 10 is a schematic side view illustrating an example of the operation of the transport mechanism D. 11 is a schematic side view illustrating an example of the operation of the transport mechanism D. 12 is a schematic side view illustrating an example of the operation of the transport mechanism D. 13 is a schematic side view illustrating an example of the operation of the transport mechanism D. 14 is a schematic side view illustrating an example of an operation of the holding mechanism to hold the semiconductor package. 15 is a schematic cross-sectional view illustrating another example of the operation of the holding mechanism holding the semiconductor package. 16 is a schematic side view illustrating an example of the operation of the second imaging element photographing the semiconductor package from below in the Z-axis direction, the semiconductor package being held by the holding mechanism. FIG. 17 is a schematic side view illustrating an example of an operation of the first imaging element to image the opening of the arrangement member from above the Z-axis direction. FIG. 18 is a schematic cross-sectional view illustrating an example of an operation for performing positional alignment of a semiconductor package. 19 is a schematic cross-sectional view illustrating an example of an operation of arranging a semiconductor package. FIG. 20 is a schematic partial perspective side view illustrating an example of an operation of the first imaging element to photograph an optical mark formed optically. 21 is a schematic plan view of an example of an image of an optical mark optically formed by the first imaging element. FIG. 22 is a schematic partial perspective side view illustrating an example of an operation of the second imaging element to photograph an optical mark formed optically. 23 is a schematic plan view of an example of an image of an optical mark optically formed by the second imaging element. 24( a) to 24 (d) are schematic side views illustrating an example of the operation of the transport mechanism D. 25 is a schematic plan view illustrating an example of the operation of the conveyance mechanism of the electronic component manufacturing apparatus of Embodiment 2. FIG. 26 is a schematic plan view illustrating an example of the operation of the conveyance mechanism of the electronic component manufacturing apparatus of Embodiment 2. FIG. 27 is a schematic plan view illustrating an example of the operation of the conveyance mechanism of the electronic component manufacturing apparatus of the second embodiment. 28 is a schematic plan view illustrating an example of the operation of the conveyance mechanism of the electronic component manufacturing apparatus of the second embodiment. 29 is a schematic plan view illustrating an example of the operation of the conveyance mechanism of the electronic component manufacturing apparatus according to the second embodiment. 30 is a schematic partial perspective side view of an example of the first camera of the electronic component manufacturing apparatus of Embodiment 3. FIG. 31 is a schematic partial perspective side view of an example of the first camera of the electronic component manufacturing apparatus of Embodiment 3. FIG. 32 is a schematic plan view of an example of an image of an optical mark captured by the first imaging element of the first camera in the state shown in FIG. 30. 33 is a schematic plan view of an example of the image of the surface captured by the first imaging element of the first camera in the state shown in FIG. 31. 34 is a schematic partial perspective side view of another example of the first camera of the electronic component manufacturing apparatus of Embodiment 3. FIG.

21‧‧‧保持機構 21‧‧‧ Keep the organization

31‧‧‧第一攝像元件 31‧‧‧The first camera element

32‧‧‧第一光源 32‧‧‧First light source

33‧‧‧光學標誌形成部 33‧‧‧ Optical Mark Forming Department

33a‧‧‧透光部 33a‧‧‧Transparent

33b‧‧‧遮光部 33b‧‧‧Shade

34‧‧‧第一透鏡 34‧‧‧First lens

35‧‧‧第二透鏡 35‧‧‧Second lens

36‧‧‧半鏡 36‧‧‧Half mirror

37‧‧‧光學標誌 37‧‧‧Optical logo

38‧‧‧光 38‧‧‧ light

41‧‧‧第二攝像元件 41‧‧‧Second camera element

42‧‧‧第三透鏡 42‧‧‧third lens

43‧‧‧第四透鏡 43‧‧‧ fourth lens

44‧‧‧反射鏡 44‧‧‧Reflecting mirror

45‧‧‧照明 45‧‧‧ Lighting

101‧‧‧第一相機 101‧‧‧ First camera

101a‧‧‧光入射部 101a‧‧‧Light Incident Department

102‧‧‧第二相機 102‧‧‧Second camera

102a‧‧‧光入射部 102a‧‧‧Light Incident Department

X、Y、Z‧‧‧座標軸方向 X, Y, Z‧‧‧Coordinate axis direction

Claims (18)

一種搬運機構,包括: 保持機構,構成為能夠保持被搬運物且能夠移動; 光源; 光學標誌形成部,能夠在從所述光源發出的光的光路中,在光學上形成光學標誌; 第一相機,包括第一攝像元件,所述第一攝像元件構成為能夠拍攝所述光學標誌及所述被搬運物的搬運目標部位; 第二相機,包括第二攝像元件,所述第二攝像元件構成為能夠拍攝所述被搬運物及所述光學標誌,所述被搬運物保持於所述保持機構;以及 運算機構,構成為能夠基於所述第一相機與所述第二相機的相對位置偏移量,修正至所述搬運目標部位為止的所述被搬運物的移動距離。A handling mechanism, including: The holding mechanism is configured to be able to hold the object to be transported and move; light source; An optical mark forming part capable of optically forming an optical mark in the optical path of light emitted from the light source; A first camera, including a first imaging element, the first imaging element being configured to be able to photograph the optical mark and the transport target part of the object to be transported; A second camera including a second imaging element configured to be able to photograph the object to be transported and the optical mark, and the object to be transported is held by the holding mechanism; and The arithmetic unit is configured to be able to correct the movement distance of the object to be transported to the transportation target part based on the relative positional deviation of the first camera and the second camera. 如申請專利範圍第1項所述的搬運機構,其中 所述運算機構能夠基於所述第一相機與所述光學標誌的第一位置偏移量、及所述第二相機與所述光學標誌的第二位置偏移量,算出所述相對位置偏移量,所述第一相機與所述光學標誌的第一位置偏移量是基於所述第一攝像元件所拍攝的所述光學標誌的圖像而算出,所述第二相機與所述光學標誌的第二位置偏移量是基於所述第二攝像元件所拍攝的所述光學標誌的圖像而算出。The transport mechanism as described in item 1 of the patent application scope, where The computing mechanism can calculate the relative position offset based on the first position offset between the first camera and the optical mark and the second position offset between the second camera and the optical mark The first camera and the optical mark are calculated based on the image of the optical mark captured by the first imaging element, the second camera and the optical mark Is calculated based on the image of the optical mark captured by the second imaging element. 如申請專利範圍第2項所述的搬運機構,還包括: 面,構成為能夠在光學上形成所述光學標誌;並且 所述第一攝像元件藉由拍攝所述光學標誌而獲取所述光學標誌的圖像,所述光學標誌是在光學上形成於所述面。The handling mechanism as described in item 2 of the scope of patent application also includes: Surface, configured to optically form the optical mark; and The first imaging element acquires an image of the optical mark by photographing the optical mark, and the optical mark is optically formed on the surface. 如申請專利範圍第1項所述的搬運機構,其中 所述運算機構能夠基於所述第二相機與所述被搬運物的位置偏移量、及所述第一相機與所述搬運目標部位的位置偏移量中的至少一者,修正所述移動距離,所述第二相機與所述被搬運物的位置偏移量是基於所述第二攝像元件所拍攝的所述被搬運物的圖像而算出,所述第一相機與所述搬運目標部位的位置偏移量是基於所述第一攝像元件所拍攝的所述搬運目標部位的圖像而算出。The transport mechanism as described in item 1 of the patent application scope, where The calculation mechanism can correct the movement based on at least one of a positional offset between the second camera and the object to be transported, and a positional offset between the first camera and the transport target site The distance, the amount of positional deviation between the second camera and the object to be transported is calculated based on the image of the object to be transported captured by the second imaging element, the first camera to the transport target The positional shift amount of the part is calculated based on the image of the transport target part captured by the first imaging element. 如申請專利範圍第1項所述的搬運機構,其中 所述光學標誌形成部構成為能夠移動。The transport mechanism as described in item 1 of the patent application scope, where The optical mark forming portion is configured to be movable. 如申請專利範圍第1項所述的搬運機構,其中 所述光學標誌形成部包括: 遮光部,以遮擋所述光的方式構成;以及 透光部,以使所述光透過的方式構成。The transport mechanism as described in item 1 of the patent application scope, where The optical mark forming section includes: A light shielding portion configured to block the light; and The light-transmitting portion is configured to transmit the light. 如申請專利範圍第1項所述的搬運機構,其中 在所述光路中還包括光學系統。The transport mechanism as described in item 1 of the patent application scope, where An optical system is also included in the optical path. 如申請專利範圍第1項所述的搬運機構,還包括: 第二光源,不含所述光學標誌形成部;並且 切換地使用所述光源與所述第二光源。The handling mechanism as described in item 1 of the patent application scope also includes: A second light source, excluding the optical mark forming portion; and The light source and the second light source are used in a switched manner. 一種搬運機構,包括: 保持機構,構成為能夠保持被搬運物且能夠移動; 光源; 光學標誌形成部,能夠在從所述光源發出的光的光路中,在光學上形成光學標誌; 面,設置有非光學標誌; 第一相機,包括第一攝像元件,所述第一攝像元件構成為能夠拍攝所述被搬運物的搬運目標部位及所述非光學標誌; 第二相機,包括第二攝像元件,所述第二攝像元件構成為能夠拍攝所述被搬運物及所述光學標誌,所述被搬運物保持於所述保持機構; 第三相機,包括第三攝像元件,所述第三攝像元件構成為能夠拍攝所述光學標誌及所述非光學標誌;以及 運算機構,構成為能夠基於所述第一相機與所述第二相機的相對位置偏移量,修正至所述搬運目標部位為止的所述被搬運物的移動距離。A handling mechanism, including: The holding mechanism is configured to be able to hold the object to be transported and move; light source; An optical mark forming part capable of optically forming an optical mark in the optical path of light emitted from the light source; Surface, set with non-optical signs; A first camera, including a first imaging element, the first imaging element being configured to be able to photograph the transport target part of the object and the non-optical mark; The second camera includes a second imaging element configured to be able to photograph the object to be transported and the optical mark, and the object to be transported is held by the holding mechanism; A third camera, including a third imaging element, the third imaging element being configured to be able to photograph the optical mark and the non-optical mark; and The arithmetic unit is configured to be able to correct the movement distance of the object to be transported to the transportation target part based on the relative positional deviation of the first camera and the second camera. 如申請專利範圍第9項所述的搬運機構,其中 所述運算機構是: 能夠基於所述第三相機與所述光學標誌的第一位置偏移量、及所述第二相機與所述光學標誌的第二位置偏移量,算出所述第二相機與所述第三相機的第一相對位置偏移量,所述第三相機與所述光學標誌的第一位置偏移量是基於所述第三攝像元件所拍攝的所述光學標誌的圖像的資料而算出,所述第二相機與所述光學標誌的第二位置偏移量是基於所述第二攝像元件所拍攝的所述光學標誌的圖像而算出, 能夠基於所述第一攝像元件所拍攝的所述非光學標誌的圖像、及所述第三攝像元件所拍攝的所述非光學標誌的圖像,算出所述第一相機與所述第三相機之間的第一方向上的距離、及與所述第一方向不同的第二方向上的距離。The handling mechanism as described in item 9 of the patent application scope, where The computing mechanism is: The second camera and the third can be calculated based on the first position offset between the third camera and the optical mark, and the second position offset between the second camera and the optical mark A first relative positional offset of the camera, the first positional offset of the third camera and the optical mark is calculated based on the data of the image of the optical mark captured by the third imaging element, The second positional offset of the second camera and the optical mark is calculated based on the image of the optical mark captured by the second imaging element, The first camera and the third camera can be calculated based on the image of the non-optical mark captured by the first imaging element and the image of the non-optical mark captured by the third imaging element The distance between the cameras in the first direction and the distance in the second direction different from the first direction. 如申請專利範圍第9項所述的搬運機構,其中 所述運算機構能夠基於所述第二相機與所述被搬運物的位置偏移量、及所述第一相機與所述搬運目標部位的位置偏移量中的至少一者,修正所述移動距離,所述第二相機與所述被搬運物的位置偏移量是基於所述第二攝像元件所拍攝的所述被搬運物的圖像而算出,所述第一相機與所述搬運目標部位的位置偏移量是基於所述第一攝像元件所拍攝的所述搬運目標部位的圖像而算出。The handling mechanism as described in item 9 of the patent application scope, where The calculation mechanism can correct the movement based on at least one of a positional offset between the second camera and the object to be transported, and a positional offset between the first camera and the transport target site The distance, the amount of positional deviation between the second camera and the object to be transported is calculated based on the image of the object to be transported captured by the second imaging element, the first camera to the transport target The positional shift amount of the part is calculated based on the image of the transport target part captured by the first imaging element. 如申請專利範圍第9項所述的搬運機構,其中 所述光學標誌形成部構成為能夠移動。The handling mechanism as described in item 9 of the patent application scope, where The optical mark forming portion is configured to be movable. 如申請專利範圍第9項所述的搬運機構,其中 所述光學標誌形成部包括: 遮光部,以遮擋所述光的方式構成;以及 透光部,以使所述光透過的方式構成。The handling mechanism as described in item 9 of the patent application scope, where The optical mark forming section includes: A light shielding portion configured to block the light; and The light-transmitting portion is configured to transmit the light. 如申請專利範圍第9項所述的搬運機構,其中 在所述光路中還包括光學系統。The handling mechanism as described in item 9 of the patent application scope, where An optical system is also included in the optical path. 如申請專利範圍第9項所述的搬運機構,還包括: 第二光源,不含所述光學標誌形成部;並且 切換地使用所述光源與所述第二光源。The handling mechanism as described in item 9 of the patent application scope also includes: A second light source, excluding the optical mark forming portion; and The light source and the second light source are used in a switched manner. 一種電子零件製造裝置,包括: 如申請專利範圍第1項至第15項中任一項所述的搬運機構。An electronic parts manufacturing device, including: The conveying mechanism as described in any one of items 1 to 15 of the patent application scope. 一種電子零件的製造方法,包括如下的步驟: 利用保持機構保持被搬運物的步驟; 在光學上形成光學標誌的步驟; 利用第一相機的第一攝像元件拍攝所述光學標誌的步驟; 利用第二相機的第二攝像元件拍攝所述光學標誌的步驟; 利用所述第二攝像元件拍攝所述被搬運物的步驟,所述被搬運物是保持於所述保持機構; 利用所述第一攝像元件拍攝所述被搬運物的搬運目標部位的步驟; 算出所述第一相機與所述第二相機的相對位置偏移量的步驟; 基於所述相對位置偏移量,修正至所述搬運目標部位為止的所述被搬運物的移動距離的步驟;以及 將所述被搬運物載置於所述搬運目標部位的步驟。An electronic part manufacturing method includes the following steps: The steps of using the holding mechanism to hold the carried objects; Steps to form optical marks optically; The step of photographing the optical mark with the first imaging element of the first camera; The step of photographing the optical mark with the second imaging element of the second camera; The step of photographing the object to be transported by the second imaging element, the object to be transported is held by the holding mechanism; The step of photographing the transport target part of the object by using the first imaging element; The step of calculating the relative position offset of the first camera and the second camera; The step of correcting the moving distance of the conveyed object to the conveying target site based on the relative positional deviation; and The step of placing the object to be transported on the transport target portion. 一種電子零件的製造方法,包括如下的步驟: 利用保持機構保持被搬運物的步驟; 在光學上形成光學標誌的步驟; 利用第一相機的第一攝像元件拍攝非光學標誌的步驟; 利用第二相機的第二攝像元件拍攝所述光學標誌的步驟; 利用安裝於所述保持機構的第三相機的第三攝像元件,拍攝所述非光學標誌的步驟; 利用所述第二攝像元件拍攝所述被搬運物的步驟,所述被搬運物是保持於所述保持機構; 利用所述第一攝像元件拍攝所述被搬運物的搬運目標部位的步驟; 算出所述第一相機與所述第二相機的相對位置偏移量的步驟; 基於所述相對位置偏移量,修正至所述搬運目標部位為止的所述被搬運物的移動距離的步驟;以及 將所述被搬運物載置於所述搬運目標部位的步驟。An electronic part manufacturing method includes the following steps: The steps of using the holding mechanism to hold the carried objects; Steps to form optical marks optically; The step of photographing the non-optical mark with the first imaging element of the first camera; The step of photographing the optical mark with the second imaging element of the second camera; The step of photographing the non-optical mark with the third imaging element of the third camera mounted on the holding mechanism; The step of photographing the object to be transported by the second imaging element, the object to be transported is held by the holding mechanism; The step of photographing the transport target part of the object by using the first imaging element; The step of calculating the relative position offset of the first camera and the second camera; The step of correcting the moving distance of the conveyed object to the conveying target site based on the relative positional deviation; and The step of placing the object to be transported on the transport target portion.
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KR102609787B1 (en) * 2020-11-19 2023-12-05 세메스 주식회사 Apparatus for drying package in semiconductor strip sawing and sorting equipment
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Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2780000B2 (en) * 1993-06-16 1998-07-23 澁谷工業株式会社 Semiconductor alignment equipment
JPH0878479A (en) * 1994-08-31 1996-03-22 Toshiba Corp Outer lead bonding machine and bonding method
JP3276537B2 (en) * 1995-06-21 2002-04-22 東レエンジニアリング株式会社 Chip bonding apparatus and calibration method therefor
CN1192226C (en) * 1997-09-30 2005-03-09 西门子公司 Method and device for recognizing position of connections and/or edges of components
JP3977668B2 (en) * 2002-03-01 2007-09-19 ヤマハ発動機株式会社 Component mounting equipment
JP4046030B2 (en) * 2002-08-30 2008-02-13 株式会社村田製作所 Component mounting method and component mounting apparatus
JP4653550B2 (en) * 2005-04-27 2011-03-16 株式会社東芝 Semiconductor device manufacturing apparatus and manufacturing method
KR101484348B1 (en) * 2007-08-10 2015-01-19 가부시키가이샤 니콘 Substrate bonding apparatus and substrate bonding method
TWI478272B (en) * 2007-08-15 2015-03-21 尼康股份有限公司 A positioning device, a bonding device, a laminated substrate manufacturing device, an exposure device, and a positioning method
JP5342210B2 (en) * 2008-10-30 2013-11-13 三菱重工業株式会社 Alignment apparatus control apparatus and alignment method
JP2011023424A (en) * 2009-07-13 2011-02-03 Shibaura Mechatronics Corp Mounting device and mounting method for electronic component
JP5373657B2 (en) * 2010-02-09 2013-12-18 ヤマハ発動機株式会社 Component mounting apparatus and component mounting method
JP5365618B2 (en) * 2010-12-24 2013-12-11 ソニー株式会社 Position adjustment apparatus and position adjustment method
JP5986741B2 (en) * 2011-12-14 2016-09-06 アルファーデザイン株式会社 Component mounting method, apparatus, and program
TWI545663B (en) * 2014-05-07 2016-08-11 新川股份有限公司 Bonding apparatus and bonding method
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