TW202006149A - Ni-based alloy for seed layer in magnetic recording medium - Google Patents

Ni-based alloy for seed layer in magnetic recording medium Download PDF

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TW202006149A
TW202006149A TW108123554A TW108123554A TW202006149A TW 202006149 A TW202006149 A TW 202006149A TW 108123554 A TW108123554 A TW 108123554A TW 108123554 A TW108123554 A TW 108123554A TW 202006149 A TW202006149 A TW 202006149A
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based alloy
seed layer
less
magnetic recording
present
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田中優衣
松原慶明
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日商山陽特殊製鋼股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C19/00Alloys based on nickel or cobalt
    • C22C19/03Alloys based on nickel or cobalt based on nickel
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C19/00Alloys based on nickel or cobalt
    • C22C19/07Alloys based on nickel or cobalt based on cobalt
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C38/00Ferrous alloys, e.g. steel alloys
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/08Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/14Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • B22F9/02Making metallic powder or suspensions thereof using physical processes
    • B22F9/06Making metallic powder or suspensions thereof using physical processes starting from liquid material
    • B22F9/08Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/04Making non-ferrous alloys by powder metallurgy

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
  • Powder Metallurgy (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)

Abstract

In order to provide a Ni-based alloy for a seed layer, the alloy enabling achievement of a seed layer that exhibits enhanced alignment to the (111) plane and that has a fine crystal grain size, a sputtering target which contains said alloy, and a magnetic recording medium having a seed layer which contains said alloy, provided is a Ni-based alloy for a seed layer in a magnetic recording medium, the alloy containing one or more types of elements RE selected from the group consisting of La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu, wherein the content rate of said elements RE falls within 1-10 at%.

Description

磁性記錄媒體之晶種層用Ni系合金Ni-based alloy for seed layer of magnetic recording media

本發明關於磁性記錄媒體之晶種層用Ni系合金、含有該合金之濺鍍靶及具有含有該合金的晶種層之磁性記錄媒體。The present invention relates to a Ni-based alloy for a seed layer of a magnetic recording medium, a sputtering target containing the alloy, and a magnetic recording medium having a seed layer containing the alloy.

對於磁性記錄媒體來說,大容量係重要。為了達成大容量,必須高記錄密度化。For magnetic recording media, large capacity is important. In order to achieve a large capacity, it is necessary to increase the recording density.

採用縱向磁性記錄(longitudinal magnetic recording)方式的媒體係已普及。近年來,代替該媒體,採用垂直磁性記錄(perpendicular magnetic recording)方式的媒體(垂直磁性記錄媒體)係正在普及。於垂直磁性記錄媒體中,易磁化軸係對於磁性膜中的媒體面,在垂直方向中配向。該垂直磁性記錄媒體係適合高記錄密度。Media systems using longitudinal magnetic recording have been popularized. In recent years, in place of this medium, a medium employing a perpendicular magnetic recording (perpendicular magnetic recording) system (perpendicular magnetic recording medium) is becoming popular. In a perpendicular magnetic recording medium, the easy axis of magnetization is aligned in the perpendicular direction to the medium surface in the magnetic film. This perpendicular magnetic recording medium is suitable for high recording density.

垂直磁性記錄媒體係具有磁性記錄層與軟磁性層。垂直磁性記錄媒體更在磁性記錄層與軟磁性層之間,具有晶種層、基底膜層等。The perpendicular magnetic recording medium has a magnetic recording layer and a soft magnetic layer. The perpendicular magnetic recording medium further has a seed layer, a base film layer, etc. between the magnetic recording layer and the soft magnetic layer.

日本特開2009-155722公報中揭示由NiW系的合金所構成之晶種層。此晶種層可有助於磁性記錄層之微細化。Japanese Patent Laid-Open No. 2009-155722 discloses a seed layer composed of a NiW-based alloy. This seed layer can contribute to the miniaturization of the magnetic recording layer.

日本特開2012-128933公報中揭示其材質為Ni-Fe-Co-M合金的晶種層用靶。該合金含有元素W、Mo、Ta、Cr、V或Nb作為元素M。該靶係有助於晶種層向(111)面之配向。Japanese Unexamined Patent Publication No. 2012-128933 discloses a target for a seed layer whose material is Ni-Fe-Co-M alloy. The alloy contains elements W, Mo, Ta, Cr, V or Nb as element M. This target system contributes to the alignment of the seed layer to the (111) plane.

日本特開2017-191625公報中揭示其材質為Ni-Fe-Co-M合金的晶種層用靶。該合金含有貴金屬(Au、Ag、Pd、Rh、Ir、Ru、Re或Pt)作為元素M。該靶係有助於晶種層向(111)面之配向。Japanese Unexamined Patent Publication No. 2017-191625 discloses that the material is a target for the seed layer of Ni-Fe-Co-M alloy. The alloy contains noble metals (Au, Ag, Pd, Rh, Ir, Ru, Re or Pt) as element M. This target system contributes to the alignment of the seed layer to the (111) plane.

日本特開2013-073635公報中揭示添加有稀土類之合金作為濺鍍靶之材質。從該靶形成垂直磁性記錄媒體的軟磁性層。 [先前技術文獻] [專利文獻]Japanese Unexamined Patent Publication No. 2013-073635 discloses the addition of rare earth alloys as materials for sputtering targets. From this target, a soft magnetic layer of a perpendicular magnetic recording medium is formed. [Prior Technical Literature] [Patent Literature]

[專利文獻1] 日本特開2009-155722公報 [專利文獻2] 日本特開2012-128933公報 [專利文獻3] 日本特開2017-191625公報 [專利文獻4] 日本特開2013-073635公報[Patent Document 1] Japanese Unexamined Patent Publication No. 2009-155722 [Patent Document 2] Japanese Unexamined Patent Publication No. 2012-128933 [Patent Document 3] Japanese Patent Application Publication No. 2017-191625 [Patent Document 4] Japanese Patent Application Publication No. 2013-073635

[發明所欲解決的課題][Problems to be solved by the invention]

於磁性記錄媒體,有更高記錄密度化之要求。在晶種層向(111)面的配向性與結晶粒的微細化,有改善之餘地。For magnetic recording media, there is a requirement for higher recording density. There is room for improvement in the orientation of the seed layer to the (111) plane and the refinement of crystal grains.

本發明之目的在於提供能得到向(111)面的配向性高且結晶粒度為微細的晶種層之晶種層用Ni系合金、含有該合金之濺鍍靶及具有含有該合金的晶種層之磁性記錄媒體。 [解決課題的手段]An object of the present invention is to provide a Ni-based alloy for a seed layer that can obtain a seed layer with high alignment to the (111) plane and a fine crystal grain size, a sputtering target containing the alloy, and a seed crystal containing the alloy Layer of magnetic recording media. [Means to solve the problem]

本發明之磁性記錄媒體之晶種層用Ni系合金(以下亦稱為「本發明之Ni系合金」)含有選自由La、Ce、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb及Lu所成之群組的1種或2種以上之元素RE。本發明之Ni系合金中的元素RE之含有率為1at%以上10at%以下。The Ni-based alloy for the seed layer of the magnetic recording medium of the present invention (hereinafter also referred to as "Ni-based alloy of the present invention") contains a material selected from the group consisting of La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, and Dy , Ho, Er, Tm, Yb, and Lu, a group of one or more elements RE. The content rate of the element RE in the Ni-based alloy of the present invention is 1 at% or more and 10 at% or less.

於本發明之Ni系合金中,以Ni的含有率:Fe的含有率:Co的含有率=α:β:γ表示Ni的含有率(at%)、Fe的含有率(at%)及Co的含有率(at%)之比時(惟,α+β+γ=100),較佳係α為15以上100以下,β為0以上60以下,γ為0以上70以下。In the Ni-based alloy of the present invention, Ni content rate: Fe content rate: Co content rate = α: β: γ represents Ni content rate (at%), Fe content rate (at%) and Co When the content ratio (at%) is (but, α+β+γ=100), it is preferable that α is 15 or more and 100 or less, β is 0 or more and 60 or less, and γ is 0 or more and 70 or less.

本發明之Ni系合金較佳為進一步含有Fe及/或Co。The Ni-based alloy of the present invention preferably further contains Fe and/or Co.

本發明之Ni系合金較佳為進一步含有選自由Ru、Re、W、Mo及Ta所成之群組的1種或2種以上之元素M1。本發明之Ni系合金中的元素M1之含有率較佳為25at%以下。The Ni-based alloy of the present invention preferably further contains one or more elements M1 selected from the group consisting of Ru, Re, W, Mo, and Ta. The content rate of the element M1 in the Ni-based alloy of the present invention is preferably 25 at% or less.

本發明之Ni系合金較佳為進一步含有選自由Al、Si、B及C所成之群組的1種或2種以上之元素M2。本發明之Ni系合金中的M2之含有率較佳為10at%以下。The Ni-based alloy of the present invention preferably further contains one or more elements M2 selected from the group consisting of Al, Si, B, and C. The content of M2 in the Ni-based alloy of the present invention is preferably 10 at% or less.

依照另一觀點,本發明之濺鍍靶係由本發明之Ni系合金所構成。即,本發明之濺鍍靶的材質係本發明之Ni系合金。本發明之Ni系合金含有選自由La、Ce、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb及Lu所成之群組的1種或2種以上之元素RE。本發明之Ni系合金中的元素RE之含有率為1at%以上10at%以下。According to another aspect, the sputtering target of the present invention is composed of the Ni-based alloy of the present invention. That is, the material of the sputtering target of the present invention is the Ni-based alloy of the present invention. The Ni-based alloy of the present invention contains one or more kinds selected from the group consisting of La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu The element RE. The content rate of the element RE in the Ni-based alloy of the present invention is 1 at% or more and 10 at% or less.

再者,依照再另一觀點,本發明之磁性記錄媒體具有含有本發明的Ni系合金之晶種層。此晶種層較佳為以使用本發明之濺鍍靶的濺鍍而得。本發明之靶的材質較佳為本發明之Ni系合金。本發明之Ni系合金含有選自由La、Ce、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb及Lu所成之群組的1種或2種以上之元素RE。本發明之Ni系合金中的元素RE之含有率為1at%以上10at%以下。 [發明的效果]Furthermore, according to still another aspect, the magnetic recording medium of the present invention has a seed layer containing the Ni-based alloy of the present invention. The seed layer is preferably obtained by sputtering using the sputtering target of the present invention. The material of the target of the present invention is preferably the Ni-based alloy of the present invention. The Ni-based alloy of the present invention contains one or more kinds selected from the group consisting of La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu The element RE. The content rate of the element RE in the Ni-based alloy of the present invention is 1 at% or more and 10 at% or less. [Effect of invention]

藉由本發明之Ni系合金,可得到向(111)面的配向性高且結晶粒度為微細的晶種層。本發明之Ni系合金可有助於磁性記憶媒體之高記錄密度。With the Ni-based alloy of the present invention, a seed layer with high alignment to the (111) plane and a fine crystal grain size can be obtained. The Ni-based alloy of the present invention can contribute to the high recording density of magnetic memory media.

[實施發明的形態][Forms for carrying out the invention]

本發明之磁性記錄媒體之晶種層用Ni系合金包含: (1)Ni,以及 (2)選自由La、Ce、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb及Lu所成之群組的1種或2種以上之元素RE。本發明之Ni系合金中的元素RE之含有率為1at%以上10at%以下。還有,當本發明之Ni系合金含有2種以上的元素RE時,「元素RE之含有率」係意指該2種以上的元素RE之合計含有率。The Ni-based alloy for the seed layer of the magnetic recording medium of the present invention includes: (1) Ni, and (2) One or more element RE selected from the group consisting of La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu. The content rate of the element RE in the Ni-based alloy of the present invention is 1 at% or more and 10 at% or less. In addition, when the Ni-based alloy of the present invention contains two or more kinds of element RE, the "content rate of element RE" means the total content of the two or more kinds of element RE.

於較佳的一態樣中,本發明之Ni系合金的組成為 1種或2種以上之元素RE:1at%以上10at%以下,以及 Ni及不可避免的雜質:剩餘部分。In a preferred aspect, the composition of the Ni-based alloy of the present invention is 1 or more elements RE: 1at% or more and 10at% or less, and Ni and inevitable impurities: the rest.

La、Ce、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb及Lu(即元素RE)皆為稀土類元素。Ni具有fcc構造。元素RE係其機制未明確,但可使fcc構造的優先配向從(200)變化至(111)。可從在Ni中添加有元素RE之合金,得到向(111)面的配向性優異之晶種層。藉由此晶種層,可達成垂直磁性記錄媒體中的高記錄密度。La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu (that is, element RE) are all rare earth elements. Ni has an fcc structure. The mechanism of the element RE system is not clear, but the priority alignment of the fcc structure can be changed from (200) to (111). A seed layer excellent in alignment to the (111) plane can be obtained from an alloy in which element RE is added to Ni. With this seed layer, a high recording density in perpendicular magnetic recording media can be achieved.

元素RE向Ni的固溶範圍係非常窄。因此,於由在Ni中添加有元素RE的合金所得之晶種層中,析出金屬間化合物。藉由該析出,達成結晶粒度的微細化。藉由該晶種層,可達成垂直磁性記錄媒體中的高記錄密度。The solid solution range of element RE to Ni is very narrow. Therefore, in the seed layer obtained from the alloy in which the element RE is added to Ni, intermetallic compounds are precipitated. By this precipitation, the crystal grain size becomes finer. With this seed layer, a high recording density in a perpendicular magnetic recording medium can be achieved.

從高記錄密度之觀點來看,本發明之Ni系合金中的元素RE之含有率較佳為1at%以上,更佳為2at%以上。過剩的元素RE係使晶種層位移至fcc構造以外的構造。從晶種層能維持fcc構造之觀點來看,元素RE之含有率較佳為10at%以下,更佳為5at%以下。From the viewpoint of high recording density, the content rate of the element RE in the Ni-based alloy of the present invention is preferably 1 at% or more, and more preferably 2 at% or more. The excess element RE system shifts the seed layer to a structure other than the fcc structure. From the viewpoint that the seed layer can maintain the fcc structure, the content rate of the element RE is preferably 10 at% or less, and more preferably 5 at% or less.

本發明之Ni系合金可進一步含有Fe及/或Co。本發明之Ni系合金包含Fe及Co皆不含之態樣、含有Fe但不含Co之態樣、含有Co但不含Fe之態樣以及同時含有Fe及Co之態樣。The Ni-based alloy of the present invention may further contain Fe and/or Co. The Ni-based alloy of the present invention includes a state in which neither Fe nor Co is contained, a state in which Fe is contained but not in Co, a state in which Co is contained but not in Fe, and a state in which both Fe and Co are contained.

於本發明之Ni系合金中,Ni的含有率(at%)、Fe的含有率(at%)及Co的含有率(at%)之比係以Ni的含有率:Fe的含有率:Co的含有率=a:β:γ表示。還有,α+β+r=100。α係相對於Ni、Fe及Co之合計含有率(at%)而言Ni的含有率(at%)之百分率,β係相對於Ni、Fe及Co之合計含有率(at%)而言Fe的含有率(at%)之百分率,γ係相對於Ni、Fe及Co之合計含有率(at%)而言Co的含有率(at%)之百分率。In the Ni-based alloy of the present invention, the ratio of the Ni content rate (at%), Fe content rate (at%) and Co content rate (at%) is based on the Ni content rate: Fe content rate: Co The content rate = a: β: γ said. Also, α+β+r=100. α is the percentage of Ni content (at%) relative to the total content (at%) of Ni, Fe and Co, and β is the Fe content relative to the total content (at%) of Ni, Fe and Co The percentage of the content rate (at%), γ is the percentage of the content rate of Co (at%) relative to the total content rate (at%) of Ni, Fe and Co.

α較佳為15以上100以下。藉由α為15以上的Ni系合金,可得到保磁力經抑制的晶種層。基於同樣之觀點,α更佳為20以上,尤佳為25以上,尤更佳為30以上,尤特佳為40以上,又更佳為50以上,又特佳為60以上。α is preferably 15 or more and 100 or less. With a Ni-based alloy having α of 15 or more, a seed layer with suppressed coercive force can be obtained. From the same point of view, α is more preferably 20 or more, particularly preferably 25 or more, even more preferably 30 or more, particularly preferably 40 or more, still more preferably 50 or more, and particularly preferably 60 or more.

β較佳為0以上60以下。藉由β為此範圍內之Ni系合金,可得到保磁力經抑制的晶種層。基於同樣之觀點,β更佳為2以上,尤佳為5以上,尤更佳為10以上。基於同樣之觀點,β更佳為50以下,尤佳為40以下。β is preferably 0 or more and 60 or less. With β-based Ni-based alloys within this range, a seed layer with suppressed coercive force can be obtained. From the same viewpoint, β is more preferably 2 or more, particularly preferably 5 or more, and even more preferably 10 or more. From the same viewpoint, β is more preferably 50 or less, and particularly preferably 40 or less.

γ較佳為0以上70以下。藉由γ為此範圍內之Ni系合金,可得到(111)方向的保磁力經抑制的晶種層。基於同樣之觀點,γ更佳為2以上,尤佳為5以上,尤更佳為10以上。基於同樣之觀點,γ更佳為60以下,尤佳為40以下,尤更佳為30以下。γ is preferably 0 or more and 70 or less. With a Ni-based alloy in which γ is within this range, a seed layer with suppressed coercivity in the (111) direction can be obtained. From the same viewpoint, γ is more preferably 2 or more, particularly preferably 5 or more, and even more preferably 10 or more. From the same viewpoint, γ is more preferably 60 or less, particularly preferably 40 or less, and even more preferably 30 or less.

本發明之Ni系合金含有Fe但不含Co時,較佳係α為40以上且未達100,β超過0且為60以下。還有,此時γ為0。When the Ni-based alloy of the present invention contains Fe but does not contain Co, it is preferable that α is 40 or more and less than 100, and β is more than 0 and 60 or less. Also, at this time, γ is 0.

本發明之Ni系合金含有Co但不含Fe時,較佳係α為30以上且未達100,γ超過0且為70以下。還有,此時β為0。When the Ni-based alloy of the present invention contains Co but does not contain Fe, it is preferable that α is 30 or more and less than 100, and γ is more than 0 and 70 or less. Also, β is 0 at this time.

本發明之Ni系合金含有Fe及Co時,較佳係α為15以上且未達100,β超過0且為60以下,γ超過0且為70以下。When the Ni-based alloy of the present invention contains Fe and Co, it is preferable that α is 15 or more and not more than 100, β exceeds 0 and 60 or less, and γ exceeds 0 and 70 or less.

於較佳的一態樣中,本發明之Ni系合金的組成為 1種或2種以上之元素RE:1at%以上10at%以下,以及 Ni、與Fe及/或Co、與不可避免的雜質:剩餘部分。In a preferred aspect, the composition of the Ni-based alloy of the present invention is 1 or more elements RE: 1at% or more and 10at% or less, and Ni, and Fe and/or Co, and inevitable impurities: the remainder.

本發明之Ni系合金可進一步含有選自由Ru、Re、W、Mo及Ta所成之群組的1種或2種以上之元素M1。可從含有元素M1的Ni系合金,得到向(111)面的配向性優異之晶種層。再者,可從含有元素M1的Ni系合金,得到結晶粒度為微細的晶種層。藉由此之晶種層,可達成垂直磁性記錄媒體中的高記錄密度。The Ni-based alloy of the present invention may further contain one or more elements M1 selected from the group consisting of Ru, Re, W, Mo, and Ta. A seed layer excellent in alignment to the (111) plane can be obtained from the Ni-based alloy containing the element M1. Furthermore, a seed layer with a fine crystal grain size can be obtained from a Ni-based alloy containing the element M1. With this seed layer, a high recording density in perpendicular magnetic recording media can be achieved.

從高記錄密度之觀點來看,元素M1之含有率較佳為1at%以上,特佳為2at%以上。過剩的元素M1係使晶種層位移至fcc構造以外的構造。再者,過剩的元素M1係有造成晶種層的非晶質化之虞。從晶種層能維持fcc構造之觀點及從不易發生非晶質化之觀點來看,元素M1之含有率較佳為20at%以下,特佳為10at%以下。還有,當本發明之Ni系合金含有2種以上的元素M1時,「元素M1之含有率」係意指該2種以上的元素M1之合計含有率。From the viewpoint of high recording density, the content of the element M1 is preferably 1 at% or more, and particularly preferably 2 at% or more. The excessive element M1 shifts the seed layer to a structure other than the fcc structure. Furthermore, the excessive element M1 may cause amorphization of the seed layer. From the viewpoint that the seed layer can maintain the fcc structure and from the viewpoint that the amorphization is unlikely to occur, the content of the element M1 is preferably 20 at% or less, and particularly preferably 10 at% or less. In addition, when the Ni-based alloy of the present invention contains two or more elements M1, the "content rate of element M1" means the total content rate of the two or more elements M1.

於較佳的一態樣中,本發明之Ni系合金的組成為 1種或2種以上之元素RE:1at%以上10at%以下, 1種或2種以上之元素M1:20at%以下,以及 Ni、與Fe及/或Co、與不可避免的雜質:剩餘部分。In a preferred aspect, the composition of the Ni-based alloy of the present invention is 1 or more element RE: 1at% or more and 10at% or less, One or more elements M1: 20at% or less, and Ni, and Fe and/or Co, and inevitable impurities: the remainder.

本發明之Ni系合金可進一步含有選自由Al、Si、B及C所成之群組的1種或2種以上之元素M2。可從含有元素M2的Ni系合金,得到向(111)面的配向性優異之晶種層。再者,可從含有元素M2的Ni系合金,得到結晶粒度為微細的晶種層。藉由此之晶種層,可達成垂直磁性記錄媒體中的高記錄密度。The Ni-based alloy of the present invention may further contain one or more elements M2 selected from the group consisting of Al, Si, B, and C. A seed layer with excellent alignment to the (111) plane can be obtained from a Ni-based alloy containing the element M2. Furthermore, a seed layer with a fine crystal grain size can be obtained from a Ni-based alloy containing the element M2. With this seed layer, a high recording density in perpendicular magnetic recording media can be achieved.

從高記錄密度之觀點來看,元素M2之含有率較佳為1at%以上,特佳為2at%以上。過剩的元素M2係有造成晶種層的非晶質化之虞。從不易發生晶種層的非晶質化之觀點來看,元素M2之含有率較佳為5at%以下。還有,當本發明之Ni系合金含有2種以上的元素M2時,「元素M2之含有率」係意指該2種以上的元素M2之合計含有率。From the viewpoint of high recording density, the content of the element M2 is preferably 1 at% or more, and particularly preferably 2 at% or more. The excessive element M2 may cause amorphization of the seed layer. From the viewpoint of not easily causing amorphization of the seed layer, the content rate of the element M2 is preferably 5 at% or less. In addition, when the Ni-based alloy of the present invention contains two or more elements M2, the "content rate of element M2" means the total content rate of the two or more elements M2.

從能達成垂直磁性記錄媒體中的高記錄密度之觀點來看,元素M1之含有率與元素M2之含有率的合計較佳為1at%以上,特佳為2at%以上。從不易發生晶種層的非晶質化之觀點來看,元素M1之含有率與元素M2之含有率的合計較佳為20at%以下,特佳為15at%以下。From the viewpoint of achieving a high recording density in the perpendicular magnetic recording medium, the total content of the element M1 and the content of the element M2 is preferably 1 at% or more, and particularly preferably 2 at% or more. From the viewpoint of not easily causing amorphization of the seed layer, the total content of the element M1 and the content of the element M2 is preferably 20 at% or less, and particularly preferably 15 at% or less.

於較佳的一態樣中,本發明之Ni系合金的組成為 1種或2種以上之元素RE:1at%以上10at%以下, 1種或2種以上之元素M1:20at%以下, 1種或2種以上之元素M2:5at%以下,以及 Ni、與Fe及/或Co、及不可避免的雜質:剩餘部分。In a preferred aspect, the composition of the Ni-based alloy of the present invention is 1 or more element RE: 1at% or more and 10at% or less, 1 or more elements M1: 20at% or less, One or more than two elements M2: 5at% or less, and Ni, and Fe and/or Co, and inevitable impurities: the remainder.

於較佳的另一態樣中,本發明之Ni系合金的組成為 1種或2種以上之元素RE:1at%以上10at%以下, 1種或2種以上之元素M2:5at%以下,以及 Ni、與Fe及/或Co、與不可避免的雜質:剩餘部分。In another preferred aspect, the composition of the Ni-based alloy of the present invention is 1 or more element RE: 1at% or more and 10at% or less, One or more than two elements M2: 5at% or less, and Ni, and Fe and/or Co, and inevitable impurities: the remainder.

由本發明之Ni系合金所構成的粉末係可藉由霧化而得。較佳的霧化為氣體霧化。於此粉末,視需要地施予分級(例如抽出粒徑為500μm以下的粒子)。分級後的粉末係填充於碳鋼製的罐內。此罐係被真空脫氣、密封,得到小胚(billet)。於此小胚,施予HIP成形(熱均壓)。HIP成形的較佳壓力為50MPa以上300MPa以下,較佳的燒結溫度為800℃以上1350℃以下。藉由HIP成形,得到成形體。對於此成形體,施予加工,得到靶。藉由對於此靶,施予濺鍍,而得到具有與此靶的成分相同成分的晶種層。於磁性記錄媒體中,組入此晶種層。 [實施例]The powder composed of the Ni-based alloy of the present invention can be obtained by atomization. The preferred atomization is gas atomization. The powder is classified as necessary (for example, particles with a particle diameter of 500 μm or less are extracted). The powder after classification is filled in a can made of carbon steel. The tank is vacuum degassed and sealed to obtain billets. In this small embryo, HIP forming (hot pressure equalization) was applied. The preferred pressure for HIP forming is 50 MPa or more and 300 MPa or less, and the preferred sintering temperature is 800°C or more and 1350°C or less. By HIP molding, a molded body is obtained. This shaped body is processed to obtain a target. By applying sputtering to this target, a seed layer having the same composition as that of this target is obtained. This seed layer is incorporated in the magnetic recording medium. [Example]

以下,藉由實施例而明瞭本發明之效果,但以此實施例之記載為基礎,本發明應不受限定地解釋。Hereinafter, the effects of the present invention will be clarified by examples, but based on the description of the examples, the present invention should be interpreted without limitation.

如前述,晶種層係藉由對於具有與其成分相同成分的靶,施予濺鍍,而成膜。此晶種層係藉由急速冷卻、凝固而得。於晶種層之形成中,由於需要很大的勞力,使用藉由單輥法所得之試驗片。單輥法係與濺鍍同樣,具有急速冷卻、凝固之步驟。藉由採用單輥法,可簡易地進行以濺鍍所將要得到的膜之評價。As described above, the seed layer is formed by sputtering a target having the same composition as its composition. This seed layer is obtained by rapid cooling and solidification. In the formation of the seed layer, since a large amount of labor is required, the test piece obtained by the single-roll method is used. The single-roll method has the same steps as rapid cooling and solidification like sputtering. By using the single roll method, the evaluation of the film to be obtained by sputtering can be easily performed.

將以下述之表1-5所示的組成之方式所秤量之30g的原料,投入至直徑為10mm且長度為40mm的水冷銅鑄模中。將此鑄模減壓,於氬氣環境中進行電弧熔化,得到熔化母材。將此母材投入至直徑為15mm的石英罐中,從噴嘴出液,供單輥法而得到試驗片。此單輥法之條件係如以下。 出液噴嘴的直徑:1mm 環境的氣壓:61kPa 噴霧差壓:69kPa 輥的材質:銅 輥的直徑:300mm 輥的旋轉速度:3000rpm 輥與出液噴嘴之間隙:0.3mm30 g of raw materials weighed with the composition shown in Table 1-5 below are put into a water-cooled copper casting mold with a diameter of 10 mm and a length of 40 mm. The mold was depressurized, and arc melting was performed in an argon atmosphere to obtain a molten base material. This base material was put into a quartz tank with a diameter of 15 mm, and the liquid was discharged from the nozzle, and the test piece was obtained by the single-roll method. The conditions of this single roll method are as follows. Outlet nozzle diameter: 1mm Ambient air pressure: 61kPa Spray differential pressure: 69kPa Roller material: copper Roller diameter: 300mm Rotation speed of roller: 3000rpm Clearance between roller and discharge nozzle: 0.3mm

還有,各表中記載的RE元素、M1元素及M2元素以外的合金之剩餘部分係Ni-Fe-Co及不可避免的雜質。再者,表1~4係實施例,表5係比較例。In addition, the rest of the alloys other than the RE element, M1 element, and M2 element described in each table are Ni-Fe-Co and inevitable impurities. In addition, Tables 1 to 4 are examples, and Table 5 is comparative examples.

[結晶粒徑] 得到試驗片之輥方向剖面的微組織影像。依據「JIS G 0551」的「鋼・結晶粒度之顯微鏡試驗方法」之規定,測定結晶粒徑。根據下述之基準,進行評級。 A:P/Lt為1.5以上 B:P/Lt為1.2以上且未達1.5 C:P/Lt未達1.2[Crystal size] The microstructure image of the cross section of the test piece in the roll direction is obtained. The crystal grain size was measured in accordance with the "JIS G 0551" "Microscope Test Method for Steel and Crystal Particle Size". The rating is based on the following criteria. A: P/Lt is 1.5 or more B: P/Lt is 1.2 or more and less than 1.5 C: P/Lt is less than 1.2

關於結晶粒徑之結果,係顯示於下述表1-5中。The results of the crystal particle size are shown in Table 1-5 below.

[保磁力] 用雙面膠帶將試驗片貼附於試料台。於初期外加磁場144kA/m之條件下,以振動試料型的保磁力計,測定保磁力。根據下述之基準,進行評級。 A:保磁力為300A/m以下 B:保磁力超過300A/m且為500A/m以下 C:保磁力超過500A/m[Coercivity] Attach the test piece to the sample table with double-sided tape. Under the condition of an initial external magnetic field of 144 kA/m, the coercive force was measured with a vibrating sample type coercive force meter. The rating is based on the following criteria. A: The coercive force is below 300A/m B: The coercive force exceeds 300A/m and is below 500A/m C: coercive force exceeds 500A/m

關於保磁力之結果,係顯示於下述表1-5中。The results of coercive force are shown in Table 1-5 below.

[配向性] 以測定面成為與銅輥的接觸面之方式,用雙面膠帶將試驗片貼附於玻璃板。以X射線繞射裝置,得到該試驗片之繞射圖型。繞射之條件係如下述。 X射線源:Cu-α線 掃描速率:4°/min[Alignment] The test piece was attached to the glass plate with a double-sided tape so that the measurement surface became the contact surface with the copper roller. An X-ray diffraction device was used to obtain the diffraction pattern of the test piece. The conditions of diffraction are as follows. X-ray source: Cu-α line Scanning rate: 4°/min

以所得之繞射圖型,求出在(111)面所繞射的X射線之強度I(111)與在(200)面所繞射的X射線之強度I(200)的強度比I(111)/I(200)。Using the obtained diffraction pattern, find the intensity ratio I(111) of the X-ray intensity diffracted on the (111) plane to the X-ray intensity I(200) diffracted on the (200) plane. 111)/I(200).

根據下述之基準,進行評級。 A:強度比I(111)/I(200)為1.0以上 B:強度比I(111)/I(200)為0.7以上、未達1.0 C:強度比I(111)/I(200)未達0.7The rating is based on the following criteria. A: Intensity ratio I(111)/I(200) is 1.0 or more B: The intensity ratio I(111)/I(200) is 0.7 or more and less than 1.0 C: The intensity ratio I(111)/I(200) is less than 0.7

還有,試驗片不保持fcc構造者及非晶質化者亦當作C。In addition, the test piece does not retain the fcc structure and the amorphous one is also regarded as C.

關於配向性之結果,係顯示於下述表1-5中。The results of alignment are shown in Table 1-5 below.

Figure 02_image001
Figure 02_image001

Figure 02_image003
Figure 02_image003

Figure 02_image005
Figure 02_image005

Figure 02_image007
Figure 02_image007

Figure 02_image009
Figure 02_image009

如表1-5所示,藉由本發明之Ni系合金,可得到諸性能優異的晶種層。根據此評價結果,本發明之優勢性係明顯。 [產業上的利用可能性]As shown in Tables 1-5, with the Ni-based alloy of the present invention, seed layers with excellent properties can be obtained. According to this evaluation result, the advantage of the present invention is obvious. [Industry use possibility]

以上說明的Ni系合金係適合各種的磁性記錄媒體之晶種層。The Ni-based alloy described above is suitable for seed layers of various magnetic recording media.

Claims (8)

一種磁性記錄媒體之晶種層用Ni系合金,其含有選自由La、Ce、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb及Lu所成之群組的1種或2種以上之元素RE, 前述元素RE之含有率為1at%以上10at%以下。A Ni-based alloy for the seed layer of a magnetic recording medium, which contains a group selected from the group consisting of La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu 1 or more elements RE of the group, The content rate of the aforementioned element RE is 1 at% or more and 10 at% or less. 如請求項1之Ni系合金,其進一步含有Fe及/或Co。The Ni-based alloy of claim 1 further contains Fe and/or Co. 如請求項1或2之Ni系合金,其中以Ni的含有率:Fe的含有率:Co的含有率=α:β:γ表示前述Ni系合金中之Ni的含有率(at%)、Fe的含有率(at%)及Co的含有率(at%)之比時(惟,α+β+γ=100),α為15以上100以下,β為0以上60以下,γ為0以上70以下。The Ni-based alloy according to claim 1 or 2, wherein Ni content rate: Fe content rate: Co content rate = α: β: γ represents the Ni content rate (at%), Fe in the aforementioned Ni system alloy When the ratio of the content ratio (at%) to the Co content ratio (at%) (but, α+β+γ=100), α is 15 or more and 100 or less, β is 0 or more and 60 or less, and γ is 0 or more 70 the following. 如請求項1~3中任一項之Ni系合金,其進一步含有選自由Ru、Re、W、Mo及Ta所成之群組的1種或2種以上之元素M1, 前述元素M1之含有率為25at%以下。The Ni-based alloy according to any one of claims 1 to 3, further containing one or more elements M1 selected from the group consisting of Ru, Re, W, Mo, and Ta, The content rate of the aforementioned element M1 is 25 at% or less. 如請求項1~4中任一項之Ni系合金,其進一步含有選自由Al、Si、B及C所成之群組的1種或2種以上之元素M2, 前述元素M2之含有率為10at%以下。The Ni-based alloy according to any one of claims 1 to 4, which further contains one or more elements M2 selected from the group consisting of Al, Si, B, and C, The content rate of the aforementioned element M2 is 10 at% or less. 一種濺鍍靶材,其係由如請求項1~5中任一項之Ni系合金所構成。A sputtering target material composed of the Ni-based alloy according to any one of claims 1 to 5. 一種磁性記錄媒體,其係具有晶種層之磁性記錄媒體, 其中前述晶種層含有如請求項1~5中任一項之Ni系合金。A magnetic recording medium, which is a magnetic recording medium with a seed layer, The aforementioned seed layer contains the Ni-based alloy according to any one of claims 1 to 5. 如請求項7之磁性記錄媒體,其中前述晶種層係以使用如請求項6之濺鍍靶的濺鍍而得。The magnetic recording medium of claim 7, wherein the aforementioned seed layer is obtained by sputtering using the sputtering target of claim 6.
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