TW201934791A - Method for adjusting flatness of sheet parts of chemical vapor deposition machine - Google Patents

Method for adjusting flatness of sheet parts of chemical vapor deposition machine Download PDF

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TW201934791A
TW201934791A TW107104381A TW107104381A TW201934791A TW 201934791 A TW201934791 A TW 201934791A TW 107104381 A TW107104381 A TW 107104381A TW 107104381 A TW107104381 A TW 107104381A TW 201934791 A TW201934791 A TW 201934791A
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flatness
plate
cvd
shaped member
item
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TW107104381A
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Chinese (zh)
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TWI646210B (en
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金東熙
朴淵珏
洪啓方
崔勝龍
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世界中心科技股份有限公司
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Priority to KR1020180079887A priority patent/KR20190095856A/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52Controlling or regulating the coating process
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45559Diffusion of reactive gas to substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/30Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/306Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness

Abstract

The present disclosure provides a method for adjusting flatness of a sheet part of a chemical vapor deposition (CVD) machine. The method includes (a) drawing a coordinate system corresponding to a CVD sheet part, the coordinate system including a plurality of coordinates; (b) measuring flatness of each coordinate; (c) determining whether flatness on each coordinate meets a predetermined flatness; (d) if the flatness on each coordinate does not meet the predetermined flatness, utilizing a stamp to apply a stress force under normal temperature onto the coordinates required to be adjusted in flatness, and back to steps (b) and (c). The present disclosure can reduce the time required for adjusting the flatness of the CVD sheet part.

Description

化學氣相沉積機台之板狀構件的平坦度處理方 法 Flatness treatment method of plate-shaped member of chemical vapor deposition machine law

本發明係關於一種化學氣相沉積機台之部件的處理方法,特別有關一種化學氣相沉積機台之板狀構件的平坦度處理方法。 The invention relates to a method for processing components of a chemical vapor deposition machine, and more particularly to a method for processing flatness of a plate-shaped member of a chemical vapor deposition machine.

化學氣相沉積(chemical vapor deposition,CVD)機台是光電半導體製程中常用的機台,廣泛應用於顯示面板的製造上。CVD機台各個部件在使用一段時間後,容易出現劣化情形。為維持CVD機台各個部件的使用年限,對CVD部件進行保養、修整是必要的,而如何縮短CVD部件的再生時間,控制時間成本是本領域重要的課題。此外,對於CVD新品部件,如何縮短其製造時間,也是本領域關注的問題。 Chemical vapor deposition (CVD) machines are commonly used in optoelectronic semiconductor manufacturing processes and are widely used in the manufacture of display panels. Each component of the CVD machine is prone to deterioration after a period of use. In order to maintain the service life of each component of the CVD machine, it is necessary to maintain and repair the CVD component. How to shorten the regeneration time of the CVD component and control the time cost are important issues in the field. In addition, how to shorten the manufacturing time of new CVD parts is also a concern in the field.

請參閱第1圖,其顯示現有的CVD機台1的結構示意圖。在CVD機台1中,擴散板(diffuser)12作為上電極,加熱器(susceptor)14作為下電極。背板(backing plate)16固定在腔壁上,並為擴散板12的安裝提供支撐。進行化學氣相沉積時,氣體由入口11導入,在擴散板12與背板16間的間隙擴散,自擴散板12 上的複數孔洞進入腔體。擴散板12與加熱器14間的電壓差使得帶電氣體分子向加熱器14移動,因在玻璃基板10上沉積以利於製造顯示元件,而多餘的氣體則從出口19排出。 Please refer to FIG. 1, which shows a schematic structural diagram of a conventional CVD machine 1. In the CVD machine 1, a diffuser 12 serves as an upper electrode, and a heater 14 serves as a lower electrode. A backing plate 16 is fixed on the cavity wall and provides support for the installation of the diffusion plate 12. When performing chemical vapor deposition, gas is introduced from the inlet 11 and diffuses in the gap between the diffusion plate 12 and the back plate 16 to self-diffusion plate 12 A plurality of holes in the cavity enter the cavity. The voltage difference between the diffuser plate 12 and the heater 14 causes the charged gas molecules to move toward the heater 14, because the deposition on the glass substrate 10 facilitates the manufacture of the display element, and the excess gas is discharged from the outlet 19.

CVD機台1中的板狀構件(例如擴散板12、加熱器14及背板16)往往因各種因素影響而產生形變,使得平坦度無法滿足原始要求。因此,業界需定期或不定期地對CVD板狀構件的平坦度進行修整。對於CVD板狀構件,不管是新品還是再生品,其平坦度的處理流程一般是,將板狀構件置於烤爐(oven)中的平台上,並按照想要的成形形狀,在板狀構件上施予一定的配重,在烤爐中進行升溫降溫,使其形狀慢慢達到預定的形狀。 The plate-like members (such as the diffuser plate 12, the heater 14, and the back plate 16) in the CVD machine 1 are often deformed due to various factors, so that the flatness cannot meet the original requirements. Therefore, the industry needs to modify the flatness of the CVD plate-like member regularly or irregularly. Regarding the CVD plate-shaped member, whether it is a new product or a recycled product, the flatness processing flow is generally to place the plate-shaped member on a platform in an oven, and according to the desired forming shape, the plate-shaped member A certain weight is applied on the top, and the temperature is raised and lowered in the oven so that its shape gradually reaches a predetermined shape.

然而,為避免CVD板狀構件在日後使用上產生回彈現象,烤爐中進行的升溫降溫程序需要緩慢進行,此程序通常需耗時2~3天。而且,在烤爐中塑形後,若CVD板狀構件的平坦度或構形沒有達到預定的要求,則需重新置入烤爐中,重新塑形。這種CVD板狀構件之平坦度的處理方式,不僅耗費相當多的時間成本,塑形成效也是相當不穩定的。 However, in order to avoid springback of the CVD plate-like member in the future, the heating and cooling process in the oven needs to be performed slowly. This process usually takes 2 to 3 days. In addition, after the shaping in the oven, if the flatness or configuration of the CVD plate-shaped member does not meet the predetermined requirements, it needs to be placed in the oven again and reshaped. Such a flatness processing method of the CVD plate-shaped member not only consumes a considerable amount of time cost, but also the plastic forming effect is quite unstable.

本揭示提供一種化學氣相沉積機台之板狀構件的平坦度處理方法,以減少板狀構件之平坦度處理的時間成本。 The present disclosure provides a method for processing flatness of a plate-shaped member of a chemical vapor deposition machine to reduce the time cost of flatness processing of the plate-shaped member.

為達成上述目的,本揭示提供一種化學氣相沉積機台之板狀構件的平坦度處理方法,包含:(a)繪製對應於一CVD板狀構件的一座標系,該座標系上包含複數個座標點;(b)量測每 個座標點的平坦度;(c)判斷各個座標點的平坦度是否符合一預定平坦度;以及(d)若該各個座標點的平坦度不符合該預定平坦度,則在常溫下以一壓頭向需要進行平坦度調整的座標點施予壓力,並回到步驟(b)和(c)。 To achieve the above object, the present disclosure provides a method for processing flatness of a plate-like member of a chemical vapor deposition machine, including: (a) drawing a coordinate system corresponding to a CVD plate-like member, the coordinate system including a plurality of Coordinate points; (b) Measure each The flatness of each coordinate point; (c) judging whether the flatness of each coordinate point conforms to a predetermined flatness; and (d) if the flatness of each coordinate point does not conform to the predetermined flatness, then press at a pressure at room temperature The head applies pressure to the coordinate points requiring flatness adjustment, and returns to steps (b) and (c).

在本揭示之CVD機台之板狀構件的平坦度處理方法中,在常溫下利用壓頭進行板狀構件的平坦度處理,相較於習知技術採用加溫配重的方式,本揭示可縮短CVD部件的再生時間,節省時間成本,也減少了CVD新品部件的製造時間,且能夠有效解決塑形成效不穩定的技術問題。 In the flatness processing method of the plate-shaped member of the CVD machine disclosed in the present disclosure, the flatness processing of the plate-shaped member is performed by using an indenter at normal temperature. Compared with the conventional technique of using a heating weight, the present disclosure can Reducing the regeneration time of CVD parts, saving time and cost, reducing the manufacturing time of new CVD parts, and effectively solving the technical problem of unstable plastic forming efficiency.

1‧‧‧CVD機台 1‧‧‧CVD machine

10‧‧‧玻璃基板 10‧‧‧ glass substrate

11‧‧‧入口 11‧‧‧ entrance

12‧‧‧擴散板 12‧‧‧ diffuser

14‧‧‧加熱器 14‧‧‧ heater

16‧‧‧背板 16‧‧‧ back plate

19‧‧‧出口 19‧‧‧ export

30‧‧‧擴散板 30‧‧‧ diffuser

40‧‧‧壓頭 40‧‧‧ Indenter

S10~S16‧‧‧步驟 S10 ~ S16‧‧‧step

第1圖顯示現有的CVD機台的結構示意圖。 FIG. 1 is a schematic diagram showing the structure of a conventional CVD machine.

第2圖顯示根據本揭示的一種CVD機台之板狀構件的平坦度處理方法的流程圖。 FIG. 2 is a flowchart illustrating a method for processing flatness of a plate-shaped member of a CVD machine according to the present disclosure.

第3圖顯示根據本揭示的擴散板的示意圖。 FIG. 3 shows a schematic view of a diffusion plate according to the present disclosure.

第4圖顯示根據本揭示的壓頭擠壓板狀構件的示意圖。 FIG. 4 shows a schematic view of pressing a plate-shaped member by an indenter according to the present disclosure.

第5圖顯示根據本揭示的平坦度處理方式的一個例子的示意圖。 FIG. 5 is a schematic diagram showing an example of a flatness processing method according to the present disclosure.

為使本揭示的目的、技術方案及效果更加清楚、明確,以下參照圖式並舉實施例對本揭示進一步詳細說明。應當理解,此處所描述的具體實施例僅用以解釋本揭示,本揭示說明書 所使用的詞語“實施例”意指用作實例、示例或例證,並不用於限定本揭示。此外,本揭示說明書和所附申請專利範圍中所使用的冠詞「一」一般地可以被解釋為意指「一個或多個」,除非另外指定或從上下文可以清楚確定單數形式。 In order to make the objectives, technical solutions, and effects of the present disclosure more clear and definite, the following further describes the present disclosure in detail with reference to the drawings and examples. It should be understood that the specific embodiments described herein are only used to explain this disclosure, and this disclosure specification The word "embodiment" is used as an example, example, or illustration and is not intended to limit the present disclosure. In addition, the articles "a" and "an" used in this disclosure and the scope of the appended patents may generally be construed to mean "one or more" unless specified otherwise or clear from context to be singular.

本揭示提供一種化學氣相沉積(chemical vapor deposition,CVD)機台之板狀構件的平坦度處理方法,其能夠有效縮短CVD板狀構件之平坦度的處理時間。 The present disclosure provides a method for processing flatness of a plate-shaped member of a chemical vapor deposition (CVD) machine, which can effectively shorten the processing time of the flatness of a CVD plate-shaped member.

該CVD板狀構件可以是CVD機台中的擴散板(diffuser)或稱上電極、加熱器(susceptor)或稱下電極、以及背板(backing plate),如第1圖所示,本揭示不作具體之限定,只要是CVD機台中的板狀構件即可。該CVD板狀構件的材料為金屬,特別是鋁材。 The CVD plate-like member may be a diffuser or an upper electrode, a susceptor or a lower electrode, and a backing plate in a CVD machine. As shown in FIG. 1, this disclosure does not specifically describe The limitation is only a plate-shaped member in a CVD machine. The material of the CVD plate-like member is a metal, particularly an aluminum material.

該CVD板狀構件可以是新品或再生品,新品意指剛製造完成尚未使用過之產品,而再生品意指已用於CVD機台進行化學沉積製程而需進行再生使用之部件。 The CVD plate-like member may be a new product or a recycled product. The new product means a product that has not been used just after being manufactured, and the recycled product means a component that has been used in a CVD machine for a chemical deposition process and needs to be recycled.

請參閱第2圖,以下對本揭示之平坦度處理方法的具體步驟說明如下: Please refer to FIG. 2. The specific steps of the flatness processing method of the present disclosure are described as follows:

步驟S10:繪製對應於一CVD板狀構件的一座標系,該座標系上包含複數個座標點。 Step S10: Draw a coordinate system corresponding to a CVD plate-shaped member, and the coordinate system includes a plurality of coordinate points.

在此步驟中,可以在板狀構件上繪製座標系。在一個例子中,如第3圖所示,在擴散板30上繪製複數個彼此間隔相同 隔線,如縱向隔線和橫向隔線,這些隔線構成複數個面積相同的區域,每個區域可以作為一個座標點。 In this step, you can draw the coordinate system on the plate-like member. In one example, as shown in FIG. 3, a plurality of pieces are drawn on the diffuser plate 30 at the same interval from each other. Dividing lines, such as vertical dividing lines and horizontal dividing lines, these dividing lines constitute a plurality of areas of the same area, and each area can be used as a coordinate point.

進一步地,也可以在電腦上利用圖形繪圖軟體繪製相應於第3圖上的座標系,這樣可以在後續平坦度量測後,建立每個座標點之平坦度的圖形。 Further, the coordinate system corresponding to the figure 3 can also be drawn on a computer by using a graphic drawing software. In this way, a flatness graph of each coordinate point can be established after subsequent flatness measurement.

步驟S12:量測每個座標點的平坦度。 Step S12: Measure the flatness of each coordinate point.

在此步驟中,可以採用紅外線水平儀量測每個座標點的平坦度,以建立板狀構件的平坦度分佈。具體來說,利用紅外線水平儀在板狀構件上一一測量出每個座標點的平坦度,而後將其輸入安裝於電腦中的圖形繪製軟體,從而建立板狀構件整體的平坦度分佈。圖形繪製軟體可以採用內插算法,以得出模擬的平坦度分佈。 In this step, an infrared level can be used to measure the flatness of each coordinate point to establish the flatness distribution of the plate-like member. Specifically, an infrared level meter is used to measure the flatness of each coordinate point on the plate-shaped member one by one, and then input it into the graphics drawing software installed in the computer to establish the flatness distribution of the entire plate-shaped member. The graphics rendering software can use interpolation algorithms to arrive at a simulated flatness distribution.

步驟S14:判斷各個座標點的平坦度是否符合一預定平坦度。 Step S14: Determine whether the flatness of each coordinate point conforms to a predetermined flatness.

在一個例子中,操作人員可以檢查CVD板狀構件上的每一個座標點的平坦度,判斷其是否符合預定平坦度,將不符合預定平坦度的座標點列為待調整的座標點。在某些情況下,操作人員也可以只檢查某一些座標點的平坦度,再查看周圍區域是否平滑,來決定是否進行平坦度處理,而不需對所有的座標點進行檢查。 In one example, the operator can check the flatness of each coordinate point on the CVD plate-like member, determine whether it meets a predetermined flatness, and list the coordinate points that do not meet the predetermined flatness as the coordinate points to be adjusted. In some cases, the operator can also only check the flatness of certain coordinate points, and then check whether the surrounding area is smooth, to determine whether to perform flatness processing, without checking all the coordinate points.

在另一個例子中,可以利用軟體建立一個符合該預定平坦度下的各個座標點的預定平坦值,將步驟S12量測出的各個 座標點的量測值與預定平坦值進行比較,從而判斷出每一座標點平坦度是否符合要求。 In another example, the software may be used to establish a predetermined flatness value that conforms to each coordinate point under the predetermined flatness, and each measured in step S12 The measured values of the coordinate points are compared with a predetermined flatness value, so as to determine whether the flatness of each coordinate point meets the requirements.

若各個座標點的平坦度已符合該預定平坦度,表示CVD板狀構件的平坦度已符合成形要求,可以結束流程。而若各個座標點的平坦度不符合該預定平坦度,表示需對CVD板狀構件的平坦度進行調整,流程進入步驟S16。 If the flatness of each coordinate point has met the predetermined flatness, it means that the flatness of the CVD plate-shaped member has met the forming requirements, and the process can be ended. If the flatness of each coordinate point does not conform to the predetermined flatness, it means that the flatness of the CVD plate-shaped member needs to be adjusted, and the flow proceeds to step S16.

作為例示的,可以將各個座標點的量測值與預定平坦值之差的平均進行加總後再取其根號值,若得出的結果小於一閾值,則判定符合平坦度要求,而若得出的結果大於該閾值,則判定不符合平坦度要求。 As an example, the difference between the measured value of each coordinate point and a predetermined flat value can be added up and then the root value can be taken. If the result obtained is less than a threshold value, it is determined that the flatness requirement is met. If the obtained result is greater than the threshold, it is determined that the flatness requirement is not met.

步驟S16:在常溫下以一壓頭向需要進行平坦度調整的座標點施予壓力。 Step S16: Apply pressure to a coordinate point requiring flatness adjustment with an indenter at normal temperature.

在此步驟中,如第4圖所示,利用由一油壓機(未圖示)驅動的壓頭40對板狀構件的某個座標點進行施力、擠壓,以調整其平坦度。具體來說,在一個例子中,操作人員可以針對步驟S14中判斷出的平坦度不符合預定平坦度的座標點進行平坦度調整。操作人員將該壓頭40移動至該座標點上方,接著將該壓頭40向下移動,以對某一座標點施予一定壓力,來改變該座標點的平坦度。在另一個例子中,操作人員在步驟S16得知每個座標點的量測值與預定平坦值的差,若這個差大於一預定值時,即對該座標點進行平坦度調整。 In this step, as shown in FIG. 4, a pressure point 40 driven by a hydraulic press (not shown) is used to apply force and squeeze to a certain coordinate point of the plate-like member to adjust its flatness. Specifically, in one example, the operator may perform flatness adjustment on the coordinate points whose flatness determined in step S14 does not conform to the predetermined flatness. The operator moves the indenter 40 above the coordinate point, and then moves the indenter 40 downward to apply a certain pressure to a coordinate point to change the flatness of the coordinate point. In another example, the operator knows the difference between the measured value of each coordinate point and a predetermined flat value in step S16. If the difference is greater than a predetermined value, the flatness adjustment is performed on the coordinate point.

該壓頭需要的施力大小可透過一施力模型得出,可利用數學建模或統計學上的方法來建立此施力模型。根據施力模型提供的需要施加的力的大小,工作人員可以藉由設定壓頭與板狀構件的接觸時間來達到預定的施力大小。 The magnitude of the force required by the indenter can be obtained through a force model, which can be established using mathematical modeling or statistical methods. According to the magnitude of the force to be applied provided by the force application model, a worker can reach a predetermined force by setting the contact time between the indenter and the plate-like member.

步驟S16後,進入步驟S12,再一次量測平坦度調整後各個座標點的平坦度,並進入步驟S14,判斷平坦度是否符合要求,若是則結束流程,若否則再利用壓頭進行一次平坦度調整。 After step S16, proceed to step S12, and measure the flatness of each coordinate point after the flatness adjustment again, and proceed to step S14 to determine whether the flatness meets the requirements. If so, end the process; otherwise, use the indenter to perform a flatness again. Adjustment.

於一實施例中,請參閱第5圖,假定CVD板狀構件預定的成形形狀為弧形。不管是新品或再生品,可以以下列步驟來調整其平坦度:(1)先對板狀構件中心區域的平坦度進行調整;(2)而後對板狀構件中心區域及周圍區域進行平坦度調整,從而達到預定的弧度要求。在平坦度調整過程中,可以採用多個壓頭同時施壓,也可以採用單一個壓頭對不同區域輪流施壓。 In an embodiment, referring to FIG. 5, it is assumed that the predetermined forming shape of the CVD plate-shaped member is an arc shape. Regardless of whether it is new or recycled, you can adjust its flatness in the following steps: (1) first adjust the flatness of the central area of the plate-shaped member; (2) then adjust the flatness of the central area of the plate-shaped member and the surrounding area To meet the predetermined radian requirements. In the flatness adjustment process, multiple indenters can be used to apply pressure simultaneously, or a single indenter can be used to apply pressure to different areas in turn.

在步驟S10之前,本揭示之方法還可包含對該CVD板狀構件進行熱處理以解除其應力的步驟。以新品來說,在其加工過程中容易殘存加工應力而成為平坦度處理上的一個不穩定因素,因此需對其進行熱處理。在一個例子中,可對CVD板狀構件以溫度420℃、升溫4小時、降溫6小時的方式進行熱處理。再生品應力積聚的情形通常不顯著,可以省略熱處理的步驟,以提升平坦度處理效率。 Prior to step S10, the method of the present disclosure may further include a step of heat-treating the CVD plate-like member to relieve its stress. For new products, it is easy to remain processing stress during processing and become an unstable factor in flatness processing, so it needs to be heat treated. In one example, the CVD plate-like member may be heat-treated at a temperature of 420 ° C, a temperature increase of 4 hours, and a temperature decrease of 6 hours. Stress accumulation in recycled products is usually not significant, and the heat treatment step can be omitted to improve the flatness processing efficiency.

在進行熱處理的步驟之前,本揭示之方法還可包含形成一保護層於該CVD板狀構件上的步驟。以CVD板狀構件為鋁 材來說,可對鋁板進行氧化還原反應,以在其上形成一氧化鋁層,以提升抗蝕能力。 Before performing the heat treatment step, the method of the present disclosure may further include a step of forming a protective layer on the CVD plate-like member. CVD plate-shaped member is aluminum In terms of materials, an aluminum plate can be subjected to a redox reaction to form an aluminum oxide layer thereon to improve the corrosion resistance.

在進行平坦度調整之前,可先對CVD板狀構件進行清洗,如化學清洗(chemical wash),以清除其上的殘留雜物,避免影響平坦度處理。 Before performing the flatness adjustment, the CVD plate-like member may be cleaned, such as chemical wash, to remove residual impurities thereon, so as to avoid affecting the flatness processing.

具體來說,於一實施例中,新品的處理步驟如下:先將板材加工成與預定成形要求(例如弧形)相近的形狀,對其進行化學清洗,在板材上形成保護層,而後進行熱處理的步驟以解除應力,再採用步驟S10~S16進行精細的平坦度調整,再進行一次清洗後即可出貨。於一實施例中,再生品的處理步驟如下:對板狀構件進行化學清洗,而後進行步驟S10~S16的平坦度調整,再進行一次清洗,即完成板狀構件的再生。 Specifically, in an embodiment, the processing steps of the new product are as follows: first, the plate is processed into a shape close to a predetermined forming requirement (such as an arc), chemically cleaned, a protective layer is formed on the plate, and then heat treated Steps to relieve stress, and then use steps S10 to S16 to fine-tune the flatness adjustment. After another cleaning, it can be shipped. In one embodiment, the processing steps of the recycled product are as follows: performing chemical cleaning on the plate-like member, and then performing the flatness adjustment of steps S10 to S16, and then performing another cleaning to complete the regeneration of the plate-like member.

採用習知的加溫配重將一塊CVD板狀構件塑形,需要2~3天的時間。在本技術的成效方面,對於第8.5代的擴散板來說,僅需花費現有技術1/3的時間即能完成平坦度處理,而對第6代的擴散板來說,也僅需約1/6的時間。本技術能夠有效節省時間成本,也減少了習知技術中不穩定因素的影響。 It takes 2 to 3 days to shape a CVD plate-shaped member using a conventional heating weight. In terms of the effectiveness of this technology, for the diffusion plate of the 8.5th generation, it only takes 1/3 of the time of the prior art to complete the flatness processing, and for the diffusion plate of the 6th generation, it only takes about 1 / 6 time. This technology can effectively save time and cost, and also reduce the influence of unstable factors in the conventional technology.

在本揭示之CVD機台之板狀構件的平坦度處理方法中,在常溫下利用壓頭進行板狀構件的平坦度處理,相較於習知技術採用加溫配重的方式,本揭示可縮短CVD部件的再生時間,節省時間成本,也減少了CVD新品部件的製造時間,且能夠有效解決塑形成效不穩定的技術問題。 In the flatness processing method of the plate-shaped member of the CVD machine disclosed in the present disclosure, the flatness processing of the plate-shaped member is performed by using an indenter at normal temperature. Compared with the conventional technique of using a heating weight, the present disclosure can Reducing the regeneration time of CVD parts, saving time and cost, reducing the manufacturing time of new CVD parts, and effectively solving the technical problem of unstable plastic forming efficiency.

本揭示已用較佳實施例揭露如上,然其並非用以限定本揭示,本揭示所屬技術領域中具有通常知識者,在不脫離本揭示之精神和範圍內,當可作各種之更動與潤飾,因此本揭示之保護範圍當視後附之申請專利範圍所界定者為準。 The present disclosure has been disclosed as above with a preferred embodiment, but it is not intended to limit the present disclosure. Those with ordinary knowledge in the technical field to which this disclosure belongs can make various changes and modifications without departing from the spirit and scope of this disclosure. Therefore, the scope of protection of this disclosure shall be determined by the scope of the appended patent application.

Claims (13)

一種化學氣相沉積(chemical vapor deposition,CVD)機台之板狀構件的平坦度處理方法,包含:(a)繪製對應於一CVD板狀構件的一座標系,該座標系上包含複數個座標點;(b)量測每個座標點的平坦度;(c)判斷各個座標點的平坦度是否符合一預定平坦度;以及(d)若該各個座標點的平坦度不符合該預定平坦度,則在常溫下以一壓頭向需要進行平坦度調整的座標點施予壓力,並回到步驟(b)和(c)。 A method for processing flatness of a plate-shaped member of a chemical vapor deposition (CVD) machine, comprising: (a) drawing a coordinate system corresponding to a CVD plate-shaped member, the coordinate system including a plurality of coordinates; Points; (b) measure the flatness of each coordinate point; (c) determine whether the flatness of each coordinate point conforms to a predetermined flatness; and (d) if the flatness of each coordinate point does not conform to the predetermined flatness , At a normal temperature, apply pressure to a coordinate point that needs to be adjusted for flatness with an indenter, and return to steps (b) and (c). 根據申請專利範圍第1項所述之方法,還包含:(e)若該各個座標點的平坦度符合該預定平坦度,則結束流程。 The method according to item 1 of the patent application scope further includes: (e) if the flatness of each coordinate point conforms to the predetermined flatness, then the process is ended. 根據申請專利範圍第1項所述之方法,其中該CVD板狀構件係選自由一擴散板(diffuser)、一加熱器(susceptor)和一背板(backing plate)所組成的群組。 The method according to item 1 of the scope of patent application, wherein the CVD plate-shaped member is selected from the group consisting of a diffuser, a heater, and a backing plate. 根據申請專利範圍第1項所述之方法,其中在步驟(a)之前,所述方法還包含:對該CVD板狀構件進行熱處理以解除其應力。 The method according to item 1 of the scope of patent application, wherein before step (a), the method further comprises: heat-treating the CVD plate-shaped member to relieve its stress. 根據申請專利範圍第4項所述之方法,其中在該熱處理的步驟之前,所述方法還包含:形成一保護層於該CVD板狀構件上。 The method according to item 4 of the scope of patent application, wherein before the step of heat treatment, the method further comprises: forming a protective layer on the CVD plate-shaped member. 根據申請專利範圍第5項所述之方法,其中於形成該保護層的步驟中,該保護層係利用氧化還原反應而形成。 The method according to item 5 of the scope of patent application, wherein in the step of forming the protective layer, the protective layer is formed by using a redox reaction. 根據申請專利範圍第1項所述之方法,其中在步驟(a)之前,所述方法還包含:對該CVD板狀構件進行化學清洗(chemical wash)。 The method according to item 1 of the scope of patent application, wherein before step (a), the method further comprises: chemically washing the CVD plate-shaped member. 根據申請專利範圍第1項所述之方法,其中步驟(a)包含:以一圖形繪圖軟體建立對應該CVD板狀構件的座標系。 The method according to item 1 of the scope of patent application, wherein step (a) includes: establishing a coordinate system corresponding to the CVD plate-shaped member by a graphic drawing software. 根據申請專利範圍第8項所述之方法,其中步驟(b)包含:以該圖形繪圖軟體建立該CVD板狀構件的平坦度分佈。 The method according to item 8 of the scope of patent application, wherein step (b) includes: establishing flatness distribution of the CVD plate-shaped member by using the graphic drawing software. 根據申請專利範圍第1項所述之方法,其中步驟(b)包含:利用一紅外線水平儀量測每個座標點的平坦度。 The method according to item 1 of the scope of patent application, wherein step (b) comprises: measuring the flatness of each coordinate point using an infrared level. 根據申請專利範圍第1項所述之方法,其中步驟(c)包含:將步驟(b)量測出的各個座標點的平坦度量測值與該預定平坦度進行比較,從而判斷出是否符合該預定平坦度。 The method according to item 1 of the scope of patent application, wherein step (c) comprises: comparing the flatness measurement value of each coordinate point measured in step (b) with the predetermined flatness, so as to determine whether it is consistent The predetermined flatness. 根據申請專利範圍第1項所述之方法,其中步驟(d)包含:(d1)對該CVD板狀構件之中心區域的平坦度進行調整;以及(d2)在步驟(d1)之後,對該CVD板狀構件的中心區域及周圍區域進行平坦度調整。 The method according to item 1 of the scope of patent application, wherein step (d) includes: (d1) adjusting the flatness of the central area of the CVD plate-shaped member; and (d2) after step (d1), The central region and the surrounding region of the CVD plate-shaped member are adjusted for flatness. 根據申請專利範圍第1項所述之方法,其中該壓頭係利用一油壓機驅動。 The method according to item 1 of the scope of patent application, wherein the indenter is driven by a hydraulic press.
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