TW201934653A - Composition for heat-dissipation member, heat-dissipation member, electronic apparatus, and production method for heat-dissipation member - Google Patents

Composition for heat-dissipation member, heat-dissipation member, electronic apparatus, and production method for heat-dissipation member Download PDF

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TW201934653A
TW201934653A TW108100483A TW108100483A TW201934653A TW 201934653 A TW201934653 A TW 201934653A TW 108100483 A TW108100483 A TW 108100483A TW 108100483 A TW108100483 A TW 108100483A TW 201934653 A TW201934653 A TW 201934653A
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inorganic filler
silane coupling
coupling agent
diyl
composition
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TW108100483A
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Chinese (zh)
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氏家研人
藤原武
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日商捷恩智股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B32B27/20Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/01Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013Fillers, pigments or reinforcing additives
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00Use of pretreated ingredients
    • C08K9/04Ingredients treated with organic substances
    • C08K9/06Ingredients treated with organic substances with silicon-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C3/00Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
    • C09C3/12Treatment with organosilicon compounds

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Inorganic Insulating Materials (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Laminated Bodies (AREA)

Abstract

The present invention achieves a laminate of an organic-inorganic hybrid composite and a metal, the laminate having excellent thermal conductivity and interlayer adhesion. This composition for a heat-dissipation member contains: a first inorganic filler (11) to which one end of a first silane coupling agent (21) has been bonded; a second inorganic filler (12) to which one end of a second silane coupling agent (22) has been bonded; a third inorganic filler (13) to which one end of a third silane coupling agent (23) has been bonded; a first at least bifunctional polymerizable compound (31); and a second at least bifunctional polymerizable compound (32). Per 100 total parts by weight of the first at least bifunctional polymerizable compound (31) and the second at least bifunctional polymerizable compound (32), there are a total of 300-600 parts by weight of the first inorganic filler (11), the second inorganic filler (12), and the third inorganic filler (13).

Description

散熱構件用組成物、散熱構件、電子機器、散熱構件的製造方法Composition for heat radiation member, heat radiation member, electronic device, and method for manufacturing heat radiation member

本發明是有關於一種散熱構件用組成物及使用其的散熱構件、電子機器。特別是有關於一種可藉由效率良好地傳導、傳遞產生於電子機器內部的熱來進行散熱,從而可形成電子基板等的散熱構件用組成物及使用其的散熱構件、電子機器。The present invention relates to a composition for a heat dissipation member, a heat dissipation member using the same, and an electronic device. In particular, the present invention relates to a composition for a heat-dissipating member capable of forming and dissipating heat by efficiently conducting and transmitting heat generated inside an electronic device, and a heat-dissipating member and an electronic device using the same.

近年來,對於混合動力車(hybrid vehicle)或電動汽車(electric automobile)等的電力控制用的半導體元件、或高速電腦(high speed computer)用的中央處理單元(central processing unit,CPU)等,為了不使內部的半導體的溫度變得過高,而期望晶片・封裝材料的高導熱化。即,使自半導體晶片產生的熱有效地釋出至外部的能力變得重要。另外,由於動作溫度的上昇,因用於晶片・封裝內的材料間的熱膨脹率的差而產生熱應變,由配線的剝離、積層基板的層剝離等引起的壽命的降低成為問題。In recent years, semiconductor devices for power control, such as hybrid vehicles and electric automobiles, or central processing units (CPUs) for high speed computers have been developed in order to The internal semiconductor temperature is not excessively high, and high thermal conductivity of wafers and packaging materials is desired. That is, the ability to efficiently release heat generated from a semiconductor wafer to the outside becomes important. In addition, due to the increase in operating temperature, thermal strain occurs due to the difference in the thermal expansion coefficient between the materials used in the wafer and the package, and reduction in life due to peeling of wiring and layer peeling of the laminated substrate becomes a problem.

作為解決此種散熱問題的方法,可列舉使高導熱性材料(散熱構件)與發熱部位接觸,從而將熱導出至外部來進行散熱的方法。於專利文獻1中揭示了一種散熱構件,其是使有機材料與無機材料複合化而成,且利用矽烷偶合劑與聚合性液晶化合物將無機材料間相連(段落0007)。於引用文獻1中,藉由利用矽烷偶合劑與聚合性液晶化合物予以相連,可顯著提高無機材料間的導熱性。然而,該散熱構件的反應性部位僅為與矽烷偶合劑鍵結的聚合性液晶化合物的前端部位、及矽烷偶合劑的前端部位,因此為了利用矽烷偶合劑與聚合性液晶化合物予以相連,需要施加高的壓力以使填料間的距離縮短至成為矽烷偶合劑的鏈長與聚合性液晶化合物的鏈長之和的長度為止。另外,於用作高導熱性接著劑的情況下,亦需要利用高的壓力使填料與填料、及填料與被接著體密接,進而藉由加熱來進行反應。As a method for solving such a heat radiation problem, a method in which a highly thermally conductive material (radiation member) is brought into contact with a heat-generating portion, and heat is dissipated to the outside to dissipate heat is mentioned. Patent Document 1 discloses a heat-dissipating member that is a composite of an organic material and an inorganic material, and connects the inorganic material with a silane coupling agent and a polymerizable liquid crystal compound (paragraph 0007). In Reference 1, by using a silane coupling agent to connect to a polymerizable liquid crystal compound, the thermal conductivity between inorganic materials can be significantly improved. However, the reactive portion of the heat dissipation member is only the front end portion of the polymerizable liquid crystal compound bonded to the silane coupling agent and the front end portion of the silane coupling agent. Therefore, in order to connect the polymerizable liquid crystal compound by the silane coupling agent, it is necessary to apply The pressure is so high that the distance between the fillers is shortened to a length that becomes the sum of the chain length of the silane coupling agent and the chain length of the polymerizable liquid crystal compound. In addition, when it is used as a highly thermally conductive adhesive, it is also necessary to make the filler and the filler and the filler and the adherend adhere to each other by high pressure, and then react by heating.

於專利文獻2中,作為所述晶片・封裝內所使用的導熱性高的接著劑,揭示了一種填充有銀粒子的黏晶膏(die bonding paste)。另外,於專利文獻3中揭示有含有焊料粒子的接著劑的膏。而且,於專利文獻4中揭示了一種藉由於100℃以上、400℃以下對包含實施了表面處理的非球狀銀粒子與揮發性分散介質的膏狀銀粒子組成物進行加熱,銀粒子燒結而形成固體形狀的銀的方法。
然而,專利文獻4所記載的膏狀銀粒子組成物需要進行塗佈或乾燥步驟,因此具有因溶媒乾燥時產生不均或燒結時產生空隙而接著性不充分的問題。另外,該些高導熱的黏晶膏使用了金屬粒子,因此導電性高,亦具有於需絕緣的部位需要另外進行絕緣加工的問題。
[現有技術文獻]
[專利文獻]
Patent Document 2 discloses a die bonding paste filled with silver particles as a highly thermally conductive adhesive used in the wafer and package. In addition, Patent Document 3 discloses a paste of an adhesive containing solder particles. Further, Patent Document 4 discloses a method in which a paste-like silver particle composition containing non-spherical silver particles and a volatile dispersion medium subjected to surface treatment is heated at a temperature of 100 ° C or higher and 400 ° C or lower, and the silver particles are sintered. Method for forming solid silver.
However, since the paste-like silver particle composition described in Patent Document 4 requires a coating or drying step, there is a problem in that the adhesiveness is insufficient due to unevenness during solvent drying or voids during sintering. In addition, these highly thermally conductive pastes use metal particles, so they have high electrical conductivity, and they also have the problem of requiring additional insulation processing at the parts that need insulation.
[Prior Art Literature]
[Patent Literature]

[專利文獻1]國際公開第2016/031888號公報
[專利文獻2]日本專利特開2006-392834號公報
[專利文獻3]日本專利特開2005-93996號公報
[專利文獻4]國際公開第2017/034833號公報
[Patent Document 1] International Publication No. 2016/031888
[Patent Document 2] Japanese Patent Laid-Open No. 2006-392834
[Patent Document 3] Japanese Patent Laid-Open No. 2005-93996
[Patent Document 4] International Publication No. 2017/034833

[發明所欲解決之課題]
如上所述,對晶片・封裝內所使用的散熱構件與構成其的各種材料進行了研究。然而,例如於專利文獻1中,因利用1分子或2分子的矽烷偶合劑以及2官能以上的聚合性液晶化合物使無機填料間及無機填料與被接著體之間鍵結,故如圖1所示般接著面積小,無法提高作為整體的接著強度,從而無法獲得為電絕緣性且導熱性及與包含其他原材料的層的接著性優異的散熱構件。另外,亦無法獲得更容易的散熱構件的製造方法。
因所述情況,本發明的課題在於提供一種包含有機材料與無機材料的複合化材料的、電絕緣性及接著性優異的散熱構件,進而提供一種可藉由較少的步驟而更容易地製造散熱構件的散熱構件用組成物的製造方法。
[解決課題之手段]
[Problems to be Solved by the Invention]
As described above, the heat dissipation members used in wafers and packages and various materials constituting them have been studied. However, for example, in Patent Document 1, since one or two molecules of a silane coupling agent and two or more functional polymerizable liquid crystal compounds are used to bond between inorganic fillers and between an inorganic filler and an adherend, as shown in FIG. 1 In general, the bonding area is small, and the overall bonding strength cannot be improved, so that a heat-radiating member having excellent electrical insulation and thermal conductivity and excellent adhesion to a layer containing other raw materials cannot be obtained. In addition, it is not possible to obtain an easier method for manufacturing a heat dissipation member.
In view of the foregoing, an object of the present invention is to provide a heat-dissipating member having excellent electrical insulation and adhesiveness, including a composite material of an organic material and an inorganic material, and further, to provide a method that can be more easily manufactured with fewer steps. A method for producing a heat radiation member composition.
[Means for solving problems]

因此,本發明者等人為解決所述課題而反覆進行了研究。其結果發現:使用藉由在包含有機材料與無機材料的散熱構件用組成物中進而加入聚合性化合物及聚合性液晶化合物來延長可鍵結距離,從而於有機材料與無機材料的複合化中使無機材料彼此經由矽烷偶合劑並利用有機材料而相連,以使得如圖2般擴大接著面積來提高接著力的態樣,即,使用藉由包含矽烷偶合劑、作為無機材料的無機填料、以及作為有機材料的2官能以上的聚合性化合物的組成物而形成的複合體層(以下有時將該複合體層稱為有機無機混合接著層),藉此可獲得金屬/金屬間、金屬/半導體間、金屬/樹脂間等的接著性優異,導熱性極高的散熱構件,從而完成了本發明。Therefore, the present inventors have repeatedly studied to solve the problems. As a result, it was found that by adding a polymerizable compound and a polymerizable liquid crystal compound to a composition for a heat-dissipating member containing an organic material and an inorganic material, the bondable distance is extended to make the composite of the organic material and the inorganic material useful. Inorganic materials are connected to each other via a silane coupling agent and organic materials, so that the bonding area is enlarged as shown in FIG. 2 to increase the bonding force, that is, an inorganic filler containing a silane coupling agent, as an inorganic material, and as A composite layer formed of a composition of a bifunctional or more polymerizable compound of an organic material (hereinafter, this composite layer may be referred to as an organic-inorganic mixed adhesive layer), thereby obtaining a metal / metal space, a metal / semiconductor space, and a metal. A heat dissipating member having excellent adhesion between resins and the like and extremely high thermal conductivity has completed the present invention.

如圖3所示,本發明的第一態樣的散熱構件用組成物含有:與第一矽烷偶合劑21的一端鍵結的第一無機填料11、與第二矽烷偶合劑22的一端鍵結的第二無機填料12、與第三矽烷偶合劑23的一端鍵結的第三無機填料13、第一2官能以上的聚合性化合物31、及第二2官能以上的聚合性化合物32,其中,相對於所述第一2官能以上的聚合性化合物31及所述第二2官能以上的聚合性化合物32的總量100重量份的、所述第一無機填料11、所述第二無機填料12、及所述第三無機填料13的合計量的比率為300重量份~600重量份。
所謂「一端」,只要為分子形狀的邊緣或端部即可,可為分子的長邊的兩端亦可不為分子的長邊的兩端。
若如此構成,則可獲得可與金屬、陶瓷材料等的基板層接著的散熱構件用組成物。
若使用該散熱構件用組成物來形成有機無機混合接著層,則可製作可於有機無機混合接著層與基板層之間直接傳播作為導熱的主要要素的聲子(phonon)的積層體。該積層體可用作散熱構件,且不僅在水平方向而且在厚度方向上亦具有極高的導熱性。另外,該積層體的、有機無機混合接著層與基板層的層間的接著性亦優異。再者,此處所謂聲子,是指固體內的原子的晶格振動。
As shown in FIG. 3, the composition for a heat dissipation member according to a first aspect of the present invention includes a first inorganic filler 11 bonded to one end of a first silane coupling agent 21 and a end bonded to one end of a second silane coupling agent 22. The second inorganic filler 12, the third inorganic filler 13 bonded to one end of the third silane coupling agent 23, the first bi-functional polymerizable compound 31, and the second bi-functional polymerizable compound 32, wherein: The first inorganic filler 11 and the second inorganic filler 12 with respect to 100 parts by weight of the total amount of the first and second functional polymerizable compounds 31 and the second and second functional polymerizable compounds 32. And the ratio of the total amount of the third inorganic filler 13 is 300 parts by weight to 600 parts by weight.
The "one end" may be an edge or an end of a molecular shape, and may be both ends of the long side of the molecule or not both ends of the long side of the molecule.
With such a configuration, a composition for a heat dissipating member that can be adhered to a substrate layer such as a metal or a ceramic material can be obtained.
By using the composition for a heat dissipating member to form an organic-inorganic hybrid adhesive layer, a laminated body capable of directly propagating a phonon as a main element of heat conduction between the organic-inorganic hybrid adhesive layer and the substrate layer can be produced. The laminated body can be used as a heat dissipation member, and has extremely high thermal conductivity not only in the horizontal direction but also in the thickness direction. In addition, the laminated body has excellent adhesion between the organic-inorganic mixed adhesive layer and the substrate layer. The term “phonon” used herein refers to the lattice vibration of atoms in a solid.

本發明的第二態樣的散熱構件用組成物是如所述本發明的第一的散熱構件用組成物,其中所述第一無機填料與所述第二無機填料利用各自所鍵結的矽烷偶合劑的另一端及選自所述第一2官能以上的聚合性化合物及第二2官能以上的聚合性化合物中的至少一者而鍵結。
若如此構成,則可經由矽烷偶合劑/2官能以上的聚合性化合物/矽烷偶合劑使無機填料彼此鍵結而形成積層體。因此,可於無機填料彼此、及無機填料與被基板層等接著體間直接傳播作為導熱的主要要素的聲子。進而,有機無機混合接著層與被接著層之間因鍵的增加而接著性亦優異。
The second aspect of the present invention is a composition for a heat dissipating member, as in the first composition of the present invention for a heat dissipating member, wherein the first inorganic filler and the second inorganic filler utilize silanes bonded to each other. The other end of the coupling agent and at least one selected from the first di- or more-functional polymerizable compound and the second di- or more-functional polymerizable compound are bonded.
With such a configuration, the inorganic filler can be bonded to each other via the silane coupling agent / 2 functional polymerizable compound / silane coupling agent to form a laminate. Therefore, it is possible to directly propagate phonons, which are the main elements of heat conduction, between the inorganic fillers, and between the inorganic filler and the substrate layer. Furthermore, the organic-inorganic mixed adhesive layer and the adhered layer are also excellent in adhesiveness due to an increase in bonding.

本發明的第三態樣的散熱構件用組成物是如所述本發明的第一態樣或第二態樣的散熱構件用組成物,其中所述第一2官能以上的聚合性化合物或第二2官能以上的聚合性化合物包含選自由下述式(1-1)及下述式(1-2)所表示的聚合性液晶化合物所組成的群組中的至少兩種。

Ra -Z-(A-Z)m -Ra (1-1)

所述式(1-1)中,
Ra 分別獨立地為能夠與矽烷偶合劑的另一端的官能基鍵結的官能基,
A分別獨立地為1,4-伸環己基、1,4-伸環己烯基、1,4-伸苯基、萘-2,6-二基、四氫萘-2,6-二基、茀-2,7-二基、雙環[2.2.2]辛-1,4-二基、或雙環[3.1.0]己-3,6-二基,
該些環中,任意的-CH2 -可由-O-取代,任意的-CH=可由-N=取代,任意的氫可由鹵素、碳數1~10的烷基、或碳數1~10的鹵化烷基取代,
所述烷基中,任意的-CH2 -可由-O-、-CO-、-COO-、-OCO-、-CH=CH-、或-C≡C-取代,
Z分別獨立地為單鍵、或碳數1~20的伸烷基,
所述伸烷基中,任意的-CH2 -可由-O-、-S-、-CO-、-COO-、-OCO-、-CH=CH-、-CF=CF-、-CH=N-、-N=CH-、-N=N-、-N(O)=N-、或-C≡C-取代,任意的氫可由鹵素取代,
m為1~6的整數。

J-Xn -J (1-2)

所述式(1-2)中,
J分別獨立地為能夠與所述式(1-1)的另一端的官能基鍵結的官能基,
X分別獨立地為1,4-伸環己基、1,4-伸環己烯基、1,4-伸苯基、萘-2,6-二基、四氫萘-2,6-二基、茀-2,7-二基、雙環[2.2.2]辛-1,4-二基、或雙環[3.1.0]己-3,6-二基,
該些環中,任意的-CH2 -可由-O-取代,任意的-CH=可由-N=取代,任意的氫可由鹵素、碳數1~10的烷基、或碳數1~10的鹵化烷基取代,
所述烷基中,任意的-CH2 -可由-O-、-CO-、-COO-、-OCO-、-CH=CH-、或-C≡C-取代,
n為1~6的整數。
若如此構成,則可形成經由矽烷偶合劑及聚合性液晶化合物使在粒子表面具有環氧基等官能基的無機填料與金屬層等基板層鍵結的積層體。因此,可於有機無機混合接著層與基板層等被接著體之間直接傳播作為絕緣性物質內的導熱的主要要素的聲子,於有機無機混合接著層與被接著體間導熱性優異。進而,有機無機混合接著層與基板層等被接著體之間的鍵增加,層間接著性亦優異。
A third aspect of the present invention is a composition for a heat dissipating member as described in the first aspect or the second aspect of the present invention, wherein the first di- or more functional polymerizable compound or the first The di- or more-functional polymerizable compound includes at least two kinds selected from the group consisting of a polymerizable liquid crystal compound represented by the following formula (1-1) and the following formula (1-2).

R a -Z- (AZ) m -R a (1-1)

In the formula (1-1),
R a is each independently a functional group capable of being bonded to a functional group at the other end of the silane coupling agent,
A is independently 1,4-cyclohexyl, 1,4-cyclohexenyl, 1,4-phenylene, naphthalene-2,6-diyl, tetrahydronaphthalene-2,6-diyl , Fluorene-2,7-diyl, bicyclic [2.2.2] oct-1,4-diyl, or bicyclic [3.1.0] hexan-3,6-diyl,
In these rings, any -CH 2 -may be substituted by -O-, any -CH = may be substituted by -N =, and any hydrogen may be halogen, an alkyl group having 1 to 10 carbon atoms, or an alkyl group having 1 to 10 carbon atoms. Haloalkyl substitution,
In the alkyl group, any -CH 2 -may be substituted by -O-, -CO-, -COO-, -OCO-, -CH = CH-, or -C≡C-,
Z is independently a single bond or an alkylene group having 1 to 20 carbon atoms,
In the alkylene group, any -CH 2 -may be -O-, -S-, -CO-, -COO-, -OCO-, -CH = CH-, -CF = CF-, -CH = N -, -N = CH-, -N = N-, -N (O) = N-, or -C≡C-, any hydrogen can be replaced by halogen,
m is an integer from 1 to 6.

JX n -J (1-2)

In the formula (1-2),
J are each independently a functional group capable of bonding to a functional group at the other end of the formula (1-1),
X is independently 1,4-cyclohexyl, 1,4-cyclohexenyl, 1,4-phenylene, naphthalene-2,6-diyl, tetrahydronaphthalene-2,6-diyl , Fluorene-2,7-diyl, bicyclic [2.2.2] oct-1,4-diyl, or bicyclic [3.1.0] hexan-3,6-diyl,
In these rings, any -CH 2 -may be substituted by -O-, any -CH = may be substituted by -N =, and any hydrogen may be halogen, an alkyl group having 1 to 10 carbon atoms, or an alkyl group having 1 to 10 carbon atoms. Haloalkyl substitution,
In the alkyl group, any -CH 2 -may be substituted by -O-, -CO-, -COO-, -OCO-, -CH = CH-, or -C≡C-,
n is an integer from 1 to 6.
With such a configuration, a laminate can be formed in which an inorganic filler having a functional group such as an epoxy group on the surface of a particle is bonded to a substrate layer such as a metal layer via a silane coupling agent and a polymerizable liquid crystal compound. Therefore, a phonon, which is a main element of heat conduction in an insulating substance, can be directly transmitted between an adherend such as an organic-inorganic hybrid adhesive layer and a substrate layer, and has excellent thermal conductivity between the organic-inorganic hybrid adhesive layer and the adherend. Furthermore, the bond between an organic-inorganic mixed adhesive layer and an adherend such as a substrate layer increases, and the layer indirect adhesion is also excellent.

本發明的第四態樣的散熱構件用組成物是如所述本發明的第三態樣的散熱構件用組成物,其中所述式(1-1)中,Z為單鍵、-(CH2 )a -、-O(CH2 )a -、-(CH2 )a O-、-O(CH2 )a O-、-CH=CH-、-C≡C-、-COO-、-OCO-、-CH=CH-COO-、-OCO-CH=CH-、-CH2 CH2 -COO-、-OCO-CH2 CH2 -、-CH=N-、-N=CH-、-N=N-、-OCF2 -或-CF2 O-,該a為1~20的整數。
若如此構成,則無機填料間具有經由矽烷偶合劑/2官能以上的聚合性化合物/矽烷偶合劑的鍵。因此,可於無機填料間直接傳播作為導熱的主要要素的聲子,有機無機混合接著層不僅在水平方向而且在厚度方向亦可具有極高的導熱性。
The fourth aspect of the present invention is a composition for a heat dissipating member as described in the third aspect of the present invention, wherein in the formula (1-1), Z is a single bond,-(CH 2 ) a- , -O (CH 2 ) a -,-(CH 2 ) a O-, -O (CH 2 ) a O-, -CH = CH-, -C≡C-, -COO-,- OCO-, -CH = CH-COO-, -OCO-CH = CH-, -CH 2 CH 2 -COO-, -OCO-CH 2 CH 2- , -CH = N-, -N = CH-,- N = N-, -OCF 2 -or -CF 2 O-, and a is an integer of 1-20.
When comprised in this way, the inorganic filler has a bond via the silane coupling agent / 2 functional polymerizable compound / silane coupling agent. Therefore, phonons, which are the main elements of thermal conduction, can be directly propagated between the inorganic fillers, and the organic-inorganic mixed adhesive layer can have extremely high thermal conductivity not only in the horizontal direction but also in the thickness direction.

本發明的第五態樣的散熱構件用組成物是如所述本發明的第三態樣或第四態樣的散熱構件用組成物,其中所述式(1-1)中,Ra 分別獨立地為下述式(2-1)~式(2-4)的任一者所表示的聚合性基。



所述式(2-1)~式(2-2)中,Rb 為氫、鹵素、-CF3 、碳數1~5的烷基,q為0或1。
所述式(2-3)~式(2-4)中,Rc 為1,4-伸環己基、1,4-伸環己烯基、1,4-伸苯基、萘-2,6-二基、四氫萘-2,6-二基、茀-2,7-二基、雙環[2.2.2]辛-1,4-二基、或雙環[3.1.0]己-3,6-二基,
該些環中,任意的-CH2 -可由-O-取代,任意的-CH=可由-N=取代,任意的氫可由鹵素、碳數1~10的烷基、或碳數1~10的鹵化烷基取代,所述烷基中,任意的-CH2 -可由-O-、-CO-、-COO-、-OCO-、-CH=CH-、或-C≡C-取代。任意的氫可由鹵素取代。
Rd 分別獨立地為氫、鹵素、或碳數1~5的烷基。
若如此構成,則矽烷偶合劑可牢固地與無機填料鍵結。
The fifth aspect of the present invention is a composition for a heat dissipating member as described in the third aspect or the fourth aspect of the present invention, wherein R a in the formula (1-1) is It is independently a polymerizable group represented by any one of the following formulae (2-1) to (2-4).



In the formulae (2-1) to (2-2), R b is hydrogen, halogen, -CF 3 , or an alkyl group having 1 to 5 carbon atoms, and q is 0 or 1.
In the formulae (2-3) to (2-4), R c is 1,4-cyclohexyl, 1,4-cyclohexenyl, 1,4-phenylene, naphthalene-2, 6-diyl, tetrahydronaphthalene-2,6-diyl, fluorene-2,7-diyl, bicyclic [2.2.2] octane-1,4-diyl, or bicyclic [3.1.0] hexan-3 , 6-diyl,
In these rings, any -CH 2 -may be substituted by -O-, any -CH = may be substituted by -N =, and any hydrogen may be halogen, an alkyl group having 1 to 10 carbon atoms, or an alkyl group having 1 to 10 carbon atoms. Halogenated alkyl substitution, in which any -CH 2 -may be substituted by -O-, -CO-, -COO-, -OCO-, -CH = CH-, or -C≡C-. Arbitrary hydrogen may be substituted by halogen.
R d is each independently hydrogen, halogen, or an alkyl group having 1 to 5 carbon atoms.
With this structure, the silane coupling agent can be firmly bonded to the inorganic filler.

本發明的第六態樣的散熱構件用組成物是如所述本發明的第一態樣至第五態樣的任一態樣的散熱構件用組成物,其中為氮化物、碳材料、矽酸鹽化物或金屬氧化物,所述第二無機填料為金屬氧化物,所述第三無機填料與所述第一無機填料相同。
若如此構成,則散熱構件可含有作為無機填料而更佳的化合物,同時可提高聚合性化合物的聚合度。
The sixth aspect of the present invention is a composition for a heat dissipating member as described in any one of the first aspect to the fifth aspect of the present invention, wherein the composition is a nitride, a carbon material, or silicon. A salt or a metal oxide, the second inorganic filler is a metal oxide, and the third inorganic filler is the same as the first inorganic filler.
With such a configuration, the heat dissipating member can contain a compound that is more preferable as the inorganic filler, and at the same time, the degree of polymerization of the polymerizable compound can be improved.

本發明的第七態樣的散熱構件用組成物是如所述本發明的第六態樣的散熱構件用組成物,其中所述第一無機填料為選自氮化硼、氮化鋁、碳化硼、硼碳氮、石墨、碳纖維、碳奈米管、氧化鋁、及堇青石(cordierite)中的至少一者,所述第二無機填料為選自氧化鋁、金屬氮化物、氧化鋅、氧化鋯、及氧化鈦中的至少一者。
若如此構成,則可獲得導熱率高、熱膨脹率小的散熱構件。
A composition for a heat dissipation member according to a seventh aspect of the present invention is the composition for a heat dissipation member according to the sixth aspect of the present invention, wherein the first inorganic filler is selected from the group consisting of boron nitride, aluminum nitride, and carbonization. Boron, boron carbon nitrogen, graphite, carbon fiber, carbon nanotube, alumina, and cordierite, the second inorganic filler is selected from alumina, metal nitride, zinc oxide, and oxide At least one of zirconium and titanium oxide.
With such a configuration, a heat radiation member having a high thermal conductivity and a small thermal expansion coefficient can be obtained.

本發明的第八態樣的散熱構件用組成物是如所述本發明的第一態樣至第七態樣的任一態樣的散熱構件用組成物,其中所述第一無機填料的矽烷偶合劑的修飾率為0.1重量%以上。
若如此構成,則可提高散熱構件用組成物的密度,且使機械強度提高。
An eighth aspect of the present invention is a composition for a heat dissipating member as described in any one of the first aspect to the seventh aspect of the present invention, wherein the silane of the first inorganic filler is The modification ratio of the coupling agent is 0.1% by weight or more.
With such a configuration, the density of the composition for a heat dissipation member can be increased, and the mechanical strength can be improved.

本發明的第九態樣的散熱構件用組成物是如所述本發明的第一態樣至第八態樣的任一態樣的散熱構件用組成物,其更包含所述第1無機填料及所述第2無機填料所未鍵結的聚合性化合物。
若如此構成,則為如下所述:於將第一無機填料、第二無機填料直接連接並加以硬化而獲得的散熱構件中,隨著為了提高散熱構件的導熱率而增大填料的粒徑,空隙率將與其相對應地提高。藉由利用未鍵結的聚合性化合物或高分子化合物來填滿其空隙,可使散熱構件的導熱率或水蒸氣阻斷性能等提高。
The ninth aspect of the present invention is a composition for a heat dissipating member, which is any one of the first aspect to the eighth aspect of the present invention, and further includes the first inorganic filler. And a polymerizable compound to which the second inorganic filler is not bonded.
With such a structure, it is as follows: In a heat radiating member obtained by directly connecting and hardening the first inorganic filler and the second inorganic filler, the particle diameter of the filler is increased as the thermal conductivity of the heat radiating member is increased, The porosity will increase correspondingly. By filling the gap with an unbonded polymerizable compound or a polymer compound, the thermal conductivity of the heat dissipation member, the water vapor blocking performance, and the like can be improved.

本發明的第十態樣的散熱構件用組成物包含所述本發明的第一態樣至第九態樣的任一態樣的散熱構件用組成物的硬化物以及基板層。
若如此構成,則散熱構件在無機填料間具有鍵,且該鍵不會如通常的樹脂般引起分子振動或相變化,因此熱膨脹的直線性高,進而可具有高導熱性。
A tenth aspect of the present invention includes a hardened member of the heat dissipation member composition of any one of the first to ninth aspects of the present invention, and a substrate layer.
With such a configuration, the heat dissipating member has a bond between the inorganic fillers, and the bond does not cause molecular vibration or phase change like ordinary resins. Therefore, the linearity of thermal expansion is high, and further, it can have high thermal conductivity.

本發明的第十一態樣的電子機器包括如所述本發明的第十態樣的散熱構件、及具有發熱部的電子器件,且所述散熱構件以與所述發熱部接觸的方式配置於所述電子器件中。
若如此構成,則散熱構件的耐熱性良好,在高溫下亦可對熱膨脹率進行控制,因此可抑制電子機器中可能產生的熱應變。
An electronic device according to an eleventh aspect of the present invention includes the heat dissipating member according to the tenth aspect of the present invention, and an electronic device having a heat generating portion, and the heat dissipating member is disposed in contact with the heat generating portion In the electronic device.
With such a configuration, the heat dissipation member has good heat resistance, and the thermal expansion coefficient can be controlled even at high temperatures. Therefore, it is possible to suppress thermal strain that may occur in an electronic device.

本發明的第十二態樣的散熱構件用組成物的製造方法包括:
使第一無機填料與第一矽烷偶合劑的一端鍵結的步驟;
使第二無機填料與第二矽烷偶合劑的一端鍵結的步驟;
使第三無機填料與第三矽烷偶合劑的一端鍵結的步驟;
使散熱構件用組成物含有與第一矽烷偶合劑的一端鍵結的第一無機填料、與第二矽烷偶合劑的一端鍵結的第二無機填料、及與第三矽烷偶合的一端鍵結的第三無機填料的步驟;以及
使所述矽烷偶合劑各自的另一端與2官能以上的聚合性化合物鍵結的步驟。
若如此構成,則可製造無機填料彼此利用矽烷偶合劑與2官能以上的聚合性化合物而鍵結的散熱構件。
[發明的效果]
A method for manufacturing a composition for a heat dissipation member according to a twelfth aspect of the present invention includes:
A step of bonding the first inorganic filler to one end of the first silane coupling agent;
A step of bonding the second inorganic filler to one end of the second silane coupling agent;
A step of bonding the third inorganic filler to one end of the third silane coupling agent;
The composition for a heat-dissipating member contains a first inorganic filler bonded to one end of a first silane coupling agent, a second inorganic filler bonded to one end of a second silane coupling agent, and a compound bonded to one end of a third silane coupling agent. A step of a third inorganic filler; and a step of bonding the other end of each of the silane coupling agents to a bifunctional or more functional polymerizable compound.
With such a configuration, a heat radiation member in which inorganic fillers are bonded to each other by a silane coupling agent and a bifunctional or more polymerizable compound can be manufactured.
[Effect of the invention]

本發明的散熱構件用組成物藉由硬化而可與金屬層或陶瓷層等的基板層形成積層體,且因極高的導熱性、以及散熱構件用組成物的洩漏少而具有優異的基板層間的接著性。進而,具有化學穩定性、硬度、及機械強度等優異的特性。本發明的積層體例如適於散熱基板、散熱板(面狀散熱器)、散熱片(sheet)、散熱塗膜、散熱接著劑、或帶電極的散熱性絕緣基板、導熱性電子基板等。進而,本發明的積層體的製造方法可藉由較少的步驟而更容易地製造有機無機混合接著層與金屬或陶瓷等的基板層的積層體。The composition for a heat radiating member of the present invention can form a laminated body with a substrate layer such as a metal layer or a ceramic layer by curing, and has excellent substrate interlayers due to extremely high thermal conductivity and less leakage of the composition for a heat radiating member. Of adhering. Furthermore, it has excellent characteristics such as chemical stability, hardness, and mechanical strength. The laminated body of the present invention is suitable for, for example, a heat radiation substrate, a heat radiation plate (planar heat sink), a heat radiation sheet, a heat radiation coating film, a heat radiation adhesive, a heat radiation insulating substrate with an electrode, a heat conductive electronic substrate, and the like. Furthermore, the method for producing a laminated body of the present invention can more easily produce a laminated body of an organic-inorganic mixed adhesive layer and a substrate layer such as metal or ceramic with fewer steps.

以下,參照圖式對本發明的實施方式進行說明。再者,於各圖中對相互相同或相當的部分標註同一或類似的符號,並省略重覆的說明。另外,本發明並不限定於以下的實施方式。Hereinafter, embodiments of the present invention will be described with reference to the drawings. It should be noted that the same or similar parts are denoted by the same or similar symbols in each drawing, and repeated descriptions are omitted. The present invention is not limited to the following embodiments.

本說明書中的用語的用法如下所述。
「液晶化合物」「液晶性化合物」是表現出向列相或層列相等液晶相的化合物。
The usage of terms in this specification is as follows.
A "liquid crystal compound" and a "liquid crystal compound" are compounds exhibiting a nematic phase or a smectic liquid crystal phase.

利用下述一例來表示「烷基中的任意的-CH2 -可由-O-等取代」或「任意的-CH2 CH2 -可由-CH=CH-等取代」等語句的含義。例如,C4 H9 -中的任意的-CH2 -由-O-或-CH=CH-取代的基為C3 H7 O-、CH3 -O-(CH2 )2 -、CH3 -O-CH2 -O-等。同樣地,C5 H11 -中的任意的-CH2 CH2 -由-CH=CH-取代的基為H2 C=CH-(CH2 )3 -、CH3 -CH=CH-(CH2 )2 -等,進而任意的-CH2 -由-O-取代的基為CH3 -CH=CH-CH2 -O-等。如此「任意的」這一用語意指「未區分而選擇的至少一個」。再者,考慮化合物的穩定性,則相較於氧與氧鄰接的CH3 -O-O-CH2 -,氧與氧不鄰接的CH3 -O-CH2 -O-較佳。Represented by the following one case to the meaning of - - "may be substituted with -CH = CH- other arbitrary -CH 2 CH 2" statement like "alkyl arbitrary -CH 2 -O- and the like may be substituted" or. For example, any of the -CH 2 -groups substituted by -O- or -CH = CH- in C 4 H 9 -is C 3 H 7 O-, CH 3 -O- (CH 2 ) 2- , CH 3 -O-CH 2 -O- and the like. Similarly, the arbitrary -CH 2 CH 2 -groups substituted with -CH = CH- among C 5 H 11 -are H 2 C = CH- (CH 2 ) 3- , CH 3 -CH = CH- (CH 2 ) 2 -etc., and further the -CH 2 -group substituted with -O- is CH 3 -CH = CH-CH 2 -O- and the like. The term "arbitrary" thus means "at least one selected without distinction". Furthermore, in consideration of the stability of the compound, CH 3 -O-CH 2 -O-, which is not adjacent to oxygen, is preferable to CH 3 -OO-CH 2- , which is adjacent to oxygen.

另外,關於環A,「任意的氫可由鹵素、碳數1~10的烷基、或碳數1~10的鹵化烷基取代」這一語句意指例如1,4-伸苯基的2,3,5,6位的至少一個氫由氟或甲基等取代基取代的情況下的態樣,另外,取代基為「碳數1~10的鹵化烷基」的情況下的態樣包含如2-氟乙基或3-氟-5-氯己基的例子。In addition, regarding ring A, the phrase "arbitrary hydrogen may be substituted by halogen, alkyl having 1 to 10 carbon atoms, or halogenated alkyl having 1 to 10 carbon atoms" means, for example, 2,4-phenylene, The aspect when at least one hydrogen at the 3,5,6 position is substituted with a substituent such as fluorine or methyl, and the aspect when the substituent is a "halogenated alkyl group having 1 to 10 carbon atoms" includes such as Examples of 2-fluoroethyl or 3-fluoro-5-chlorohexyl.

「化合物(1-1)」意指後述的下述式(1-1)所表示的聚合性液晶化合物,另外,亦有意指下述式(1-1)所表示的化合物的至少一種的情況。「散熱構件用組成物」意指含有選自所述化合物(1-1)或其他聚合性化合物中的至少一種化合物的組成物。在一個化合物(1-1)具有多個A時,任意的2個A可相同亦可不同。在多個化合物(1-1)具有A時,任意的2個A可相同亦可不同。該規則亦適用於Ra 或Z等其他記號、基等。"Compound (1-1)" means a polymerizable liquid crystal compound represented by the following formula (1-1) described later, and also means at least one of the compounds represented by the following formula (1-1) . The "composition for a heat radiation member" means a composition containing at least one compound selected from the compound (1-1) or another polymerizable compound. When a compound (1-1) has multiple A's, any two A's may be the same or different. When multiple compounds (1-1) have A, any two A's may be the same or different. This rule also applies to other symbols and bases such as Ra or Z.

[散熱構件用組成物]
散熱構件用組成物含有:與第一矽烷偶合劑的一端鍵結的第一無機填料、與第二矽烷偶合劑的一端鍵結的第二無機填料、與第三矽烷偶合的一端鍵結的第三無機填料、第一2官能以上的聚合性化合物、及第二2官能以上的聚合性化合物,其中,相對於所述第一2官能以上的聚合性化合物及第二2官能以上的聚合性化合物的總量100重量份的、所述第一無機填料、所述第二無機填料、及所述第三無機填料的合計量的比率為300重量份~600重量份。
[Composition for heat dissipation member]
The composition for a heat dissipation member includes a first inorganic filler bonded to one end of a first silane coupling agent, a second inorganic filler bonded to one end of a second silane coupling agent, and a first inorganic filler bonded to one end of a third silane coupling agent. A tri-inorganic filler, a first di- or more-functional polymerizable compound, and a second di- or more-functional polymerizable compound, in which the first di- or more-functional polymerizable compound and the second di- or more functional polymerizable compound are used. The total ratio of 100 parts by weight of the first inorganic filler, the second inorganic filler, and the third inorganic filler is 300 parts by weight to 600 parts by weight.

散熱構件用組成物可包含能夠形成無機填料間的鍵的無機填料的組合。例如,在包含與第一矽烷偶合劑的一端鍵結的第一無機填料、和使得與第一及/或第二2官能以上的聚合性化合物鍵結的、第二矽烷偶合劑的一端鍵結的第二無機填料、鍵結有第三矽烷偶合劑的第三無機填料、第一2官能以上的聚合性化合物、以及第二2官能以上的聚合性化合物的情況下,若使散熱構件用組成物硬化,則可使無機填料彼此經由矽烷偶合劑及2官能以上的聚合性化合物而鍵結。在作為無機填料而使用氮化硼(h-BN)的粒子的情況下,若利用矽烷偶合劑對氮化硼進行處理,則氮化硼因其結晶結構而於粒子的平面中反應基少,因此僅在側面的周圍鍵結比較多的矽烷偶合劑。經矽烷偶合劑處理的氮化硼可與2官能以上的聚合性化合物鍵結。
因此,利用2官能以上的聚合性化合物使經第一矽烷偶合劑處理的氮化硼11的矽烷偶合劑21的另一端與進行了矽烷偶合處理的氮化硼21的聚合性化合物22的另一端鍵結,藉此可使氮化硼彼此相互鍵結。另一方面,於氧化鋁或氮化鋁般的可於整個面鍵結矽烷偶合劑的不定形或球狀的粒子中,與氮化硼相比鍵結增加,藉由其使用而接著性提高。
如此,藉由使第一無機填料與第二無機填料彼此經由矽烷偶合劑及2官能以上的聚合性化合物而鍵結,可直接傳播聲子,因此硬化物具有極高的導熱性,從而可製作接著性高的散熱構件。
在本發明中重要的是實現此種第一無機填料與第二無機填料之間的鍵結,亦可預先使用有機合成技術而使矽烷偶合劑22與第一2官能以上的聚合性化合物31鍵結,其後使第二矽烷偶合劑22鍵結於第二無機填料12。藉由實現第一無機填料與第三無機填料之間的鍵結,與基板的密接性進一步增加,可製作具有高導熱性的散熱構件。
The composition for a heat radiating member may include a combination of inorganic fillers capable of forming a bond between the inorganic fillers. For example, the first silane coupling agent is bonded to one end of the first silane coupling agent, and the first silane coupling agent is bonded to one end of the second silane coupling agent, and the second silane coupling agent is bonded to the first and / or second difunctional polymerizable compound. In the case of a second inorganic filler, a third inorganic filler to which a third silane coupling agent is bonded, a first bifunctional or more polymerizable compound, and a second bifunctional or more polymerizable compound, if the composition for a heat dissipating member is made If the material is hardened, the inorganic fillers can be bonded to each other via a silane coupling agent and a bifunctional or more polymerizable compound. In the case of particles using boron nitride (h-BN) as an inorganic filler, if boron nitride is treated with a silane coupling agent, boron nitride has fewer reactive groups in the plane of the particles due to its crystal structure. Therefore, only a large number of silane coupling agents are bonded around the sides. Boron nitride treated with a silane coupling agent can be bonded to a bifunctional or more polymerizable compound.
Therefore, the other end of the silane coupling agent 21 of the boron nitride 11 treated with the first silane coupling agent and the other end of the polymerizable compound 22 of the boron nitride 21 subjected to the silane coupling treatment are made of a bifunctional polymerizable compound. Bonding, whereby boron nitrides can be bonded to each other. On the other hand, in amorphous or spherical particles, such as alumina or aluminum nitride, which can be bonded to the entire surface of the silane coupling agent, the bonding is increased compared to boron nitride, and the adhesion is improved by its use. .
In this way, the first inorganic filler and the second inorganic filler are bonded to each other via a silane coupling agent and a bifunctional or more polymerizable compound to directly propagate phonons. Therefore, the cured product has extremely high thermal conductivity, and can be produced. A highly heat-dissipating member.
It is important in the present invention to achieve such a bond between the first inorganic filler and the second inorganic filler, and it is also possible to bond the silane coupling agent 22 to the first difunctional polymerizable compound 31 by using organic synthesis technology in advance. Then, the second silane coupling agent 22 is bonded to the second inorganic filler 12. By realizing the bonding between the first inorganic filler and the third inorganic filler, the adhesion with the substrate is further increased, and a heat dissipation member having high thermal conductivity can be manufactured.

[第一2官能以上的聚合性化合物]
作為第一2官能以上的聚合性化合物,較佳為使用2官能以上的聚合性液晶化合物(以下有時簡稱為「聚合性液晶化合物」)。
作為聚合性液晶化合物,較佳為下述式(1-1)所表示的液晶化合物,具有液晶骨架與聚合性基,具有高聚合反應性、寬廣的液晶相溫度範圍、良好的混和性等。該化合物(1-1)在與其他液晶性的化合物或聚合性的化合物等混合時,容易變得均勻。

Ra -Z-(A-Z)m -Ra (1-1)

m為1~6的整數,較佳為2~6的整數,進而較佳為2~4的整數。
[First two-functional polymerizable compound]
As the first di- or more-functional polymerizable compound, it is preferable to use a bi- or more-functional polymerizable liquid crystal compound (hereinafter sometimes referred to simply as "polymerizable liquid crystal compound").
The polymerizable liquid crystal compound is preferably a liquid crystal compound represented by the following formula (1-1), has a liquid crystal skeleton and a polymerizable group, has high polymerization reactivity, a wide liquid crystal phase temperature range, and good miscibility. When this compound (1-1) is mixed with other liquid crystal compounds, polymerizable compounds, etc., it tends to become uniform.

R a -Z- (AZ) m -R a (1-1)

m is an integer of 1 to 6, preferably an integer of 2 to 6, and more preferably an integer of 2 to 4.

藉由適當選擇所述化合物(1-1)的末端基Ra 、環結構A及鍵結基Z,可任意地調整液晶相表現區域等物性。以下說明末端基Ra 、環結構A及鍵結基Z的種類對化合物(1-1)的物性產生的效果、以及該些的較佳例。By appropriately selecting the terminal group R a , the ring structure A, and the bonding group Z of the compound (1-1), physical properties such as a liquid crystal phase expression region can be arbitrarily adjusted. The effects of the types of the terminal group R a , the ring structure A, and the bonding group Z on the physical properties of the compound (1-1), and preferable examples thereof will be described below.

・末端基Ra
末端基Ra 只要分別獨立地為可與第一矽烷偶合劑及第二矽烷偶合劑的另一端的官能基鍵結的官能基即可。
例如可列舉下述式(2-1)~式(2-4)的任一者所表示的聚合性基、氧化環己烯、鄰苯二甲酸酐、或琥珀酸酐,但並不限定於該些。
・ Terminal group R a
The terminal group R a may be a functional group that can be independently bonded to a functional group on the other end of the first silane coupling agent and the second silane coupling agent.
Examples include, but are not limited to, the polymerizable group represented by any of the following formulae (2-1) to (2-4), cyclohexene oxide, phthalic anhydride, or succinic anhydride. some.

所述式(2-1)~式(2-2)中,Rb 為氫、鹵素、-CF3 、或碳數1~5的烷基,q為0或1。另外,所述式(2-3)~式(2-4)中,Rc 為1,4-伸環己基、1,4-伸環己烯基、1,4-伸苯基、萘-2,6-二基、四氫萘-2,6-二基、茀-2,7-二基、雙環[2.2.2]辛-1,4-二基、或雙環[3.1.0]己-3,6-二基,該些環中,任意的-CH2 -可由-O-取代,任意的-CH=可由-N=取代,任意的氫可由鹵素、碳數1~10的烷基、或碳數1~10的鹵化烷基取代,所述烷基中,任意的-CH2 -可由-O-、-CO-、-COO-、-OCO-、-CH=CH-、或-C≡C-取代。Rd 分別獨立地為氫、鹵素、或碳數1~5的烷基。In the formulae (2-1) to (2-2), R b is hydrogen, halogen, -CF 3 , or an alkyl group having 1 to 5 carbon atoms, and q is 0 or 1. In addition, in the formulae (2-3) to (2-4), R c is 1,4-cyclohexyl, 1,4-cyclohexenyl, 1,4-phenylene, or naphthalene- 2,6-diyl, tetrahydronaphthalene-2,6-diyl, fluorene-2,7-diyl, bicyclic [2.2.2] octane-1,4-diyl, or bicyclic [3.1.0] hexane -3,6-diyl, in these rings, any -CH 2 -may be substituted by -O-, any -CH = may be substituted by -N =, any hydrogen may be substituted by halogen, alkyl having 1 to 10 carbon atoms Or a halogenated alkyl group having 1 to 10 carbon atoms, in the alkyl group, any -CH 2 -may be -O-, -CO-, -COO-, -OCO-, -CH = CH-, or- C≡C- substituted. R d is each independently hydrogen, halogen, or an alkyl group having 1 to 5 carbon atoms.

作為較佳的Rc ,可列舉:1,4-伸環己基、1,4-伸環己烯基、2,2-二氟-1,4-伸環己基、1,3-二噁烷-2,5-二基、1,4-伸苯基、2-氟-1,4-伸苯基、2,3-二氟-1,4-伸苯基、2,5-二氟-1,4-伸苯基、2,6-二氟-1,4-伸苯基、2,3,5-三氟-1,4-伸苯基、吡啶-2,5-二基、3-氟吡啶-2,5-二基、嘧啶-2,5-二基、噠嗪-3,6-二基、萘-2,6-二基、四氫萘-2,6-二基、茀-2,7-二基、9-甲基茀-2,7-二基、9,9-二甲基茀-2,7-二基、9-乙基茀-2,7-二基、9-氟茀-2,7-二基、9,9-二氟茀-2,7-二基等。Preferred examples of R c include 1,4-cyclohexyl, 1,4-cyclohexenyl, 2,2-difluoro-1,4-cyclohexyl, and 1,3-dioxane. -2,5-diyl, 1,4-phenylene, 2-fluoro-1,4-phenylene, 2,3-difluoro-1,4-phenylene, 2,5-difluoro- 1,4-phenylene, 2,6-difluoro-1,4-phenylene, 2,3,5-trifluoro-1,4-phenylene, pyridine-2,5-diyl, 3 -Fluoropyridine-2,5-diyl, pyrimidine-2,5-diyl, pyridazine-3,6-diyl, naphthalene-2,6-diyl, tetrahydronaphthalene-2,6-diyl, Fluorene-2,7-diyl, 9-methylfluorene-2,7-diyl, 9,9-dimethylfluorene-2,7-diyl, 9-ethylfluorene-2,7-diyl , 9-fluorofluorene-2,7-diyl, 9,9-difluorofluorene-2,7-diyl, etc.

關於1,4-伸環己基及1,3-二噁烷-2,5-二基的立體構型,反式(trans)優於順式(cis)。2-氟-1,4-伸苯基及3-氟-1,4-伸苯基於結構上相同,因此未例示後者。該規則亦適用於2,5-二氟-1,4-伸苯基與3,6-二氟-1,4-伸苯基的關係等。Regarding the stereo configuration of 1,4-cyclohexyl and 1,3-dioxane-2,5-diyl, trans (trans) is better than cis (cis). Since 2-fluoro-1,4-phenylene and 3-fluoro-1,4-phenylene are structurally the same, the latter is not illustrated. This rule also applies to the relationship between 2,5-difluoro-1,4-phenylene and 3,6-difluoro-1,4-phenylene.

進而較佳的Rc 為1,4-伸環己基、1,4-伸環己烯基、1,3-二噁烷-2,5-二基、1,4-伸苯基、2-氟-1,4-伸苯基、2,3-二氟-1,4-伸苯基、2,5-二氟-1,4-伸苯基、2,6-二氟-1,4-伸苯基等。尤佳的Rc 為1,4-伸環己基及1,4-伸苯基。Further preferred R c is 1,4-cyclohexyl, 1,4-cyclohexenyl, 1,3-dioxane-2,5-diyl, 1,4-phenylene, 2- Fluoro-1,4-phenylene, 2,3-difluoro-1,4-phenylene, 2,5-difluoro-1,4-phenylene, 2,6-difluoro-1,4 -Phenylene etc. Particularly preferred R c is 1,4-cyclohexyl and 1,4-phenylene.

進而,作為形成末端基Ra 與矽烷偶合劑的鍵的官能基的組合,例如可列舉氧雜環丙基與胺基、氧雜環丁基與胺基、乙烯基彼此、甲基丙烯醯氧基彼此、羧基或羧酸酐殘基與胺、咪唑基與氧雜環丙基、咪唑基與氧雜環丁基等的組合,但並不限定於該些。更佳為耐熱性高的組合。Furthermore, as a combination of the functional group which forms the bond of the terminal group Ra and a silane coupling agent, an oxetanyl group and an amine group, an oxetanyl group and an amine group, a vinyl group, and methacryloxy The combination of each other, a carboxyl group or a carboxylic acid anhydride residue with an amine, an imidazolyl group and an oxetanyl group, an imidazolyl group and an oxetanyl group is not limited thereto. More preferred is a combination with high heat resistance.

・環結構A
在所述化合物(1-1)的環結構A中的至少一個環為1,4-伸苯基的情況下,配向秩序參數(orientational order parameter)及磁化各向異性大。另外,在至少兩個環為1,4-伸苯基的情況下,液晶相的溫度範圍寬廣,進而透明點高。在1,4-伸苯基環上的至少一個氫被取代為氰基、鹵素、-CF3 或-OCF3 的情況下,介電常數各向異性高。另外,在至少兩個環為1,4-伸環己基的情況下,透明點高,且黏度小。
・ Ring structure A
When at least one ring in the ring structure A of the compound (1-1) is 1,4-phenylene, the orientation order parameter and the magnetization anisotropy are large. In addition, when at least two rings are 1,4-phenylene, the temperature range of the liquid crystal phase is wide, and the transparent point is high. When at least one hydrogen on a 1,4-phenylene ring is substituted with cyano, halogen, -CF 3 or -OCF 3 , the dielectric constant anisotropy is high. In addition, when at least two rings are 1,4-cyclohexyl, the transparent point is high and the viscosity is small.

作為較佳的A,可分別獨立地列舉:1,4-伸環己基、1,4-伸環己烯基、2,2-二氟-1,4-伸環己基、1,3-二噁烷-2,5-二基、1,4-伸苯基、2-氟-1,4-伸苯基、2,3-二氟-1,4-伸苯基、2,5-二氟-1,4-伸苯基、2,6-二氟-1,4-伸苯基、2,3,5-三氟-1,4-伸苯基、吡啶-2,5-二基、3-氟吡啶-2,5-二基、嘧啶-2,5-二基、噠嗪-3,6-二基、萘-2,6-二基、四氫萘-2,6-二基、茀-2,7-二基、9-甲基茀-2,7-二基、9,9-二甲基茀-2,7-二基、9-乙基茀-2,7-二基、9-氟茀-2,7-二基、9,9-二氟茀-2,7-二基等。As preferred A, each can be independently listed: 1,4-cyclohexyl, 1,4-cyclohexenyl, 2,2-difluoro-1,4-cyclohexyl, 1,3-di Oxane-2,5-diyl, 1,4-phenylene, 2-fluoro-1,4-phenylene, 2,3-difluoro-1,4-phenylene, 2,5-diphenyl Fluoro-1,4-phenylene, 2,6-difluoro-1,4-phenylene, 2,3,5-trifluoro-1,4-phenylene, pyridine-2,5-diyl , 3-fluoropyridine-2,5-diyl, pyrimidine-2,5-diyl, pyridazine-3,6-diyl, naphthalene-2,6-diyl, tetrahydronaphthalene-2,6-di Base, fluorene-2,7-diyl, 9-methylfluorene-2,7-diyl, 9,9-dimethylfluorene-2,7-diyl, 9-ethylfluorene-2,7- Diyl, 9-fluorofluorene-2,7-diyl, 9,9-difluorofluorene-2,7-diyl, etc.

關於1,4-伸環己基及1,3-二噁烷-2,5-二基的立體構型,反式優於順式。2-氟-1,4-伸苯基及3-氟-1,4-伸苯基於結構上相同,因此未例示後者。該規則亦適用於2,5-二氟-1,4-伸苯基與3,6-二氟-1,4-伸苯基的關係等。Regarding the stereo configuration of 1,4-cyclohexyl and 1,3-dioxane-2,5-diyl, the trans is better than the cis. Since 2-fluoro-1,4-phenylene and 3-fluoro-1,4-phenylene are structurally the same, the latter is not illustrated. This rule also applies to the relationship between 2,5-difluoro-1,4-phenylene and 3,6-difluoro-1,4-phenylene.

進而較佳的A分別獨立地為1,4-伸環己基、1,4-伸環己烯基、1,3-二噁烷-2,5-二基、1,4-伸苯基、2-氟-1,4-伸苯基、2,3-二氟-1,4-伸苯基、2,5-二氟-1,4-伸苯基、2,6-二氟-1,4-伸苯基等。尤佳的A為1,4-伸環己基及1,4-伸苯基。Further preferred A's are each independently 1,4-cyclohexyl, 1,4-cyclohexenyl, 1,3-dioxane-2,5-diyl, 1,4-phenylene, 2-fluoro-1,4-phenylene, 2,3-difluoro-1,4-phenylene, 2,5-difluoro-1,4-phenylene, 2,6-difluoro-1 , 4-phenylene and so on. Particularly preferred A is 1,4-cyclohexyl and 1,4-phenylene.

・鍵結基Z
在所述化合物(1-1)的鍵結基Z分別獨立地為單鍵、-(CH2 )2 -、-CH2 O-、-OCH2 -、-CF2 O-、-OCF2 -、-CH=CH-、-CF=CF-或-(CH2 )4 -的情況下,特別是為單鍵、-(CH2 )2 -、-CF2 O-、-OCF2 -、-CH=CH-或-(CH2 )4 -的情況下,黏度變小。另外,在鍵結基Z為-CH=CH-、-CH=N-、-N=CH-、-N=N-或-CF=CF-的情況下,液晶相的溫度範圍寬廣。另外,在鍵結基Z為碳數4~10左右的烷基的情況下,熔點降低。
・ Bond base Z
The bonding group Z in the compound (1-1) is independently a single bond,-(CH 2 ) 2- , -CH 2 O-, -OCH 2- , -CF 2 O-, -OCF 2- In the case of -CH = CH-, -CF = CF-, or-(CH 2 ) 4- , especially a single bond,-(CH 2 ) 2- , -CF 2 O-, -OCF 2 -,- When CH = CH- or-(CH 2 ) 4- , the viscosity becomes small. In addition, when the bonding group Z is -CH = CH-, -CH = N-, -N = CH-, -N = N-, or -CF = CF-, the temperature range of the liquid crystal phase is wide. In addition, when the bonding group Z is an alkyl group having about 4 to 10 carbon atoms, the melting point decreases.

作為較佳的Z,可分別獨立地列舉:單鍵、-(CH2 )2 -、-(CF22 -、-COO-、-OCO-、-CH2 O-、-OCH2 -、-CF2 O-、-OCF2 -、-CH=CH-、-CF=CF-、-C≡C-、-(CH2 )4 -、-(CH2 )3 O-、-O(CH2 )3 -、-(CH2 )2 COO-、-OCO(CH2 )2 -、-CH=CH-COO-、-OCO-CH=CH-等。As the preferred Z, a single bond,-(CH 2 ) 2 -,-(CF 2 ) 2- , -COO-, -OCO-, -CH 2 O-, -OCH 2- , -CF 2 O-, -OCF 2- , -CH = CH-, -CF = CF-, -C≡C-,-(CH 2 ) 4 -,-(CH 2 ) 3 O-, -O (CH 2 ) 3 -,-(CH 2 ) 2 COO-, -OCO (CH 2 ) 2- , -CH = CH-COO-, -OCO-CH = CH-, etc.

作為進而較佳的Z,可分別獨立地列舉:單鍵、-(CH2 )2 -、-COO-、-OCO-、-CH2 O-、-OCH2 -、-CF2 O-、-OCF2 -、-CH=CH-、-C≡C-等。尤佳的Z分別獨立地為單鍵、-(CH2 )2 -、-COO-或-OCO-。As further preferable Z, a single bond,-(CH 2 ) 2- , -COO-, -OCO-, -CH 2 O-, -OCH 2- , -CF 2 O-,- OCF 2- , -CH = CH-, -C≡C-, etc. Particularly preferred Z is each independently a single bond,-(CH 2 ) 2- , -COO-, or -OCO-.

所述化合物(1-1)具有的環越多,則不易軟化的溫度越高,因此,作為散熱構件用組成物而較佳,但軟化溫度若變得高於聚合溫度,則難以成形,因此較佳為根據目的而取得兩者的平衡。此外,在本說明書中,基本上將六員環及包含六員環的縮合環等視為環,例如單獨的三員環或四員環、五員環並不被視為環。另外,萘環或茀環等縮合環被視為1個環。The more rings the compound (1-1) has, the higher the temperature at which it is difficult to soften. Therefore, the compound (1-1) is preferred as a composition for a heat-radiating member. However, if the softening temperature becomes higher than the polymerization temperature, it is difficult to form. It is preferable to achieve a balance between the two depending on the purpose. In addition, in this specification, a six-membered ring and a condensed ring including a six-membered ring are basically regarded as a ring. For example, a three-membered ring, a four-membered ring, or a five-membered ring is not considered as a ring. A condensed ring such as a naphthalene ring or a fluorene ring is regarded as one ring.

所述化合物(1-1)可為光學活性,亦可為光學惰性。當化合物(1-1)為光學活性時,該化合物(1-1)有具有不對稱碳的情況與具有不對稱軸的情況。不對稱碳的立體構型可為R亦可為S。不對稱碳可位於Ra 或A的任一者,若具有不對稱碳,則化合物(1-1)的相容性良好。在化合物(1-1)具有不對稱軸的情況下,扭曲誘導力大。另外,旋光性可為任一種。
如上所述,藉由適當選擇末端基Ra 、環結構A及鍵結基Z的種類、環的個數,可獲得具有目標物性的化合物。
The compound (1-1) may be optically active or optically inert. When the compound (1-1) is optically active, the compound (1-1) has a case of having an asymmetric carbon and a case of having an asymmetric axis. The stereo configuration of the asymmetric carbon may be R or S. The asymmetric carbon may be located in either R a or A, and if it has an asymmetric carbon, the compatibility of the compound (1-1) is good. When the compound (1-1) has an asymmetric axis, the twist-inducing force is large. In addition, any of the optical rotation properties may be used.
As described above, by appropriately selecting terminal groups R a, the type of ring structure A and the bonding group Z, the number of rings, the target compound was obtained having properties.

・化合物(1-1)
化合物(1-1)亦可如下述式(1-a)或式(1-b)般表示。

P-Y-(A-Z)m -Ra (1-a)
P-Y-(A-Z)m -Y-P (1-b)
・ Compound (1-1)
The compound (1-1) can also be represented by the following formula (1-a) or (1-b).

PY- (AZ) m -R a (1-a)
PY- (AZ) m -YP (1-b)

所述式(1-a)及式(1-b)中,A、Z、Ra 與由所述式(1-1)定義的A、Z、Ra 含義相同,P表示下述式(2-1)~式(2-4)所表示的聚合性基、氧化環己烯、鄰苯二甲酸酐、或琥珀酸酐,Y獨立地表示單鍵或碳數1~20的伸烷基,較佳為碳數1~10的伸烷基,該伸烷基中,任意的-CH2 -可由-O-、-S-、-CO-、-COO-、-OCO-或-CH=CH-取代。尤佳的Y為碳數1~10的伸烷基的單末端或兩末端的-CH2 -由-O-取代的伸烷基。m為1~6的整數,較佳為2~6的整數,進而較佳為2~4的整數。In (1-a) and formula (1-b), A, Z, R a and by the (1-1) defined by the formula A, Z, R a same meaning as the formula, P represented by the following formula ( 2-1) to the polymerizable group represented by formula (2-4), cyclohexene oxide, phthalic anhydride, or succinic anhydride, and Y independently represents a single bond or an alkylene group having 1 to 20 carbon atoms, Preferred is an alkylene group having 1 to 10 carbon atoms. In this alkylene group, any -CH 2 -may be -O-, -S-, -CO-, -COO-, -OCO-, or -CH = CH. -Replace. Particularly preferred Y is a single-terminal or both-terminal -CH 2 -alkylene substituted with -O- of an alkylene group having 1 to 10 carbon atoms. m is an integer of 1 to 6, preferably an integer of 2 to 6, and more preferably an integer of 2 to 4.

式(2-1)~式(2-2)中,Rb 為氫、鹵素、-CF3 、或碳數1~5的烷基,q為0或1。另外,所述式(2-3)~式(2-4)中,Rc 為1,4-伸環己基、1,4-伸環己烯基、1,4-伸苯基、萘-2,6-二基、四氫萘-2,6-二基、茀-2,7-二基、雙環[2.2.2]辛-1,4-二基、或雙環[3.1.0]己-3,6-二基,
該些環中,任意的-CH2 -可由-O-取代,任意的-CH=可由-N=取代,任意的氫可由鹵素、碳數1~10的烷基、或碳數1~10的鹵化烷基取代,
所述烷基中,任意的-CH2 -可由-O-、-CO-、-COO-、-OCO-、-CH=CH-、或-C≡C-取代。
Rd 分別獨立地為氫、鹵素、或碳數1~5的烷基。
In the formulae (2-1) to (2-2), R b is hydrogen, halogen, -CF 3 , or an alkyl group having 1 to 5 carbon atoms, and q is 0 or 1. In addition, in the formulae (2-3) to (2-4), R c is 1,4-cyclohexyl, 1,4-cyclohexenyl, 1,4-phenylene, or naphthalene- 2,6-diyl, tetrahydronaphthalene-2,6-diyl, fluorene-2,7-diyl, bicyclic [2.2.2] octane-1,4-diyl, or bicyclic [3.1.0] hexane -3,6-diyl,
In these rings, any -CH 2 -may be substituted by -O-, any -CH = may be substituted by -N =, and any hydrogen may be halogen, an alkyl group having 1 to 10 carbon atoms, or 1 to 10 carbon atoms. Haloalkyl substitution,
In the alkyl group, any -CH 2 -may be substituted by -O-, -CO-, -COO-, -OCO-, -CH = CH-, or -C≡C-.
R d is each independently hydrogen, halogen, or an alkyl group having 1 to 5 carbon atoms.

作為較佳的化合物(1-1)的例子,可列舉以下所示的化合物(a-1)~化合物(a-10)、化合物(b-1)~化合物(b-16)、化合物(c-1)~化合物(c-16)、化合物(d-1)~化合物(d-15)、化合物(e-1)~化合物(e-15)、化合物(f-1)~化合物(f-14)、化合物(g-1)~化合物(g-20)。再者,式中的*表示不對稱碳。Examples of preferred compounds (1-1) include compounds (a-1) to (a-10), compounds (b-1) to (b-16), and compound (c) shown below. -1) to compound (c-16), compound (d-1) to compound (d-15), compound (e-1) to compound (e-15), compound (f-1) to compound (f- 14) Compound (g-1) to compound (g-20). In addition, * in the formula represents an asymmetric carbon.

該些式中,Ra 、P及Y如所述式(1-a)及式(1-b)中所定義。
Z1 分別獨立地為單鍵、-(CH2 )2 -、-(CF2 )2 -、-(CH2 )4 -、-CH2 O-、-OCH2 -、-(CH2 )3 O-、-O(CH2 )3 -、-COO-、-OCO-、-CH=CH-、-CF=CF-、-CH=CHCOO-、-OCOCH=CH-、-(CH2 )2 COO-、-OCO(CH2 )2 -、-C≡C-、-C≡C-COO-、-OCO-C≡C-、-C≡C-CH=CH-、-CH=CH-C≡C-、-CH=N-、-N=CH-、-N=N-、-OCF2 -、或-CF2 O-。再者,多個Z1 可相同亦可不同。
In these formulas, R a , P and Y are as defined in the formulas (1-a) and (1-b).
Z 1 is independently a single bond,-(CH 2 ) 2 -,-(CF 2 ) 2 -,-(CH 2 ) 4- , -CH 2 O-, -OCH 2 -,-(CH 2 ) 3 O-, -O (CH 2 ) 3- , -COO-, -OCO-, -CH = CH-, -CF = CF-, -CH = CHCOO-, -OCOCH = CH-,-(CH 2 ) 2 COO-, -OCO (CH 2 ) 2- , -C≡C-, -C≡C-COO-, -OCO-C≡C-, -C≡C-CH = CH-, -CH = CH-C ≡C-, -CH = N-, -N = CH-, -N = N-, -OCF 2- , or -CF 2 O-. Furthermore, a plurality of Z 1 may be the same or different.

Z2 分別獨立地為-(CH2 )2 -、-(CF2 )2 -、-(CH2 )4 -、-CH2 O-、-OCH2 -、-(CH2 )3 O-、-O(CH2 )3 -、-COO-、-OCO-、-CH=CH-、-CF=CF-、-CH=CHCOO-、-OCOCH=CH-、-(CH2 )2 COO-、-OCO(CH2 )2 -、-C≡C-、-C≡C-COO-、-OCO-C≡C-、-C≡C-CH=CH-、-CH=CH-C≡C-、-CH=N-、-N=CH-、-N=N-、-OCF2 -、或-CF2 O-。Z 2 is independently-(CH 2 ) 2 -,-(CF 2 ) 2 -,-(CH 2 ) 4- , -CH 2 O-, -OCH 2 -,-(CH 2 ) 3 O-, -O (CH 2 ) 3- , -COO-, -OCO-, -CH = CH-, -CF = CF-, -CH = CHCOO-, -OCOCH = CH-,-(CH 2 ) 2 COO-, -OCO (CH 2 ) 2- , -C≡C-, -C≡C-COO-, -OCO-C≡C-, -C≡C-CH = CH-, -CH = CH-C≡C- , -CH = N-, -N = CH-, -N = N-, -OCF 2- , or -CF 2 O-.

Z3 分別獨立地為單鍵、碳數1~10的烷基、-(CH2 )a -、-O(CH2 )a O-、-CH2 O-、-OCH2 -、-O(CH2 )3 -、-(CH2 )3 O-、-COO-、-OCO-、-CH=CH-、-CH=CHCOO-、-OCOCH=CH-、-(CH2 )2 COO-、-OCO(CH2 )2 -、-CF=CF-、-C≡C-、-CH=N-、-N=CH-、-N=N-、-OCF2 -、或-CF2 O-,多個Z3 可相同亦可不同。a為1~20的整數。Z 3 is independently a single bond, an alkyl group having 1 to 10 carbon atoms,-(CH 2 ) a- , -O (CH 2 ) a O-, -CH 2 O-, -OCH 2- , -O ( CH 2 ) 3 -,-(CH 2 ) 3 O-, -COO-, -OCO-, -CH = CH-, -CH = CHCOO-, -OCOCH = CH-,-(CH 2 ) 2 COO-, -OCO (CH 2 ) 2- , -CF = CF-, -C≡C-, -CH = N-, -N = CH-, -N = N-, -OCF 2- , or -CF 2 O- Multiple Z 3 may be the same or different. a is an integer of 1-20.

X為任意的氫可由鹵素、烷基、氟化烷基取代的1,4-伸苯基、或茀-2,7-二基的取代基,表示鹵素、烷基、或氟化烷基。X is a substituent of 1,4-phenylene, or fluorene-2,7-diyl in which any hydrogen may be substituted by halogen, alkyl, or fluorinated alkyl, and represents halogen, alkyl, or fluorinated alkyl.

對所述化合物(1-1)的更佳態樣進行說明。更佳的化合物(1-1)可由下述式(1-c)或式(1-d)表示。

P1 -Y-(A-Z)m -Ra (1-c)
P1 -Y-(A-Z)m -Y-P1 (1-d)

所述式中,A、Y、Z、Ra 及m如上文所定義,P1 表示下述式(2-1)~式(2-4)的任一者所表示的聚合性基。在所述式(1-d)的情況下,2個P1 表示相同的聚合性基(2-1)~聚合性基(2-4),2個Y表示相同的基,2個Y是以成為對稱的方式鍵結。
A more preferable aspect of the compound (1-1) will be described. A more preferable compound (1-1) can be represented by the following formula (1-c) or (1-d).

P 1 -Y- (AZ) m -R a (1-c)
P 1 -Y- (AZ) m -YP 1 (1-d)

In the formula, A, Y, Z, R a , and m are as hereinbefore defined, P 1 represents a polymerizable group of the following formula (2-1) to formula (2-4) is represented by any one. In the case of the formula (1-d), two P 1 represent the same polymerizable group (2-1) to polymerizable group (2-4), two Y represent the same group, and two Y are Bonded in a way that becomes symmetrical.

以下表示所述化合物(1-1)的更佳的具體例。More specific examples of the compound (1-1) are shown below.

・化合物(1-1)、化合物(1-2)的合成方法
所述化合物(1-1)與化合物(1-2)可藉由組合有機合成化學中公知的方法而合成。將目標末端基、環結構及鍵結基導入至起始物質的方法例如在霍本-維勒(Houben-Wyle, 有機化學方法(Methods of Organic Chemistry), 格奧爾格蒂梅出版社(Georg Thieme Verlag), 斯圖加特(Stuttgart))、有機合成(Organic Syntheses, 約翰威立父子出版社(John Wily & Sons, Inc.))、有機反應(Organic Reactions, 約翰威立父子出版社(John Wily & Sons Inc.))、綜合有機合成(Comprehensive Organic Synthesis, 培格曼出版社(Pergamon Press))、新實驗化學講座(丸善)等成書中有所記載。另外,亦可參照日本專利特開2006-265527號公報。
-Method for synthesizing compound (1-1) and compound (1-2) The compound (1-1) and the compound (1-2) can be synthesized by combining a known method in organic synthetic chemistry. Methods for introducing target end groups, ring structures and bonding groups into starting materials, such as Houben-Wyle (Methods of Organic Chemistry), Georg Thieme Verlag, Stuttgart), Organic Syntheses (John Wily & Sons, Inc.), Organic Reactions, John Wily & Sons Inc .)), Comprehensive Organic Synthesis (Pergamon Press), New Experimental Chemistry Lecture (Maruzen) and other books are recorded. Also, refer to Japanese Patent Laid-Open No. 2006-265527.

J-Xn -J ・・・(1-2)

所述式(1-2)中,J分別獨立地為能夠與所述式(1-1)的另一端的官能基鍵結的官能基,Xn 分別獨立地為1,4-伸環己基、1,4-伸環己烯基、1,4-伸苯基、萘-2,6-二基、四氫萘-2,6-二基、茀-2,7-二基、雙環[2.2.2]辛-1,4-二基、或雙環[3.1.0]己-3,6-二基,該些環中,任意的-CH2 -可由-O-取代,任意的-CH=可由-N=取代,任意的氫可由鹵素、碳數1~10的烷基、或碳數1~10的鹵化烷基取代,所述烷基中,任意的-CH2 -可由-O-、-CO-、-COO-、-OCO-、-CH=CH-、或-C≡C-取代,n為1~6的整數。
JX n -J ・ ・ ・ (1-2)

In the formula (1-2), J is each independently a functional group capable of being bonded to a functional group at the other end of the formula (1-1), and X n is each independently a 1,4-cyclohexyl group , 1,4-cyclohexenyl, 1,4-phenylene, naphthalene-2,6-diyl, tetrahydronaphthalene-2,6-diyl, fluorene-2,7-diyl, bicyclic [ 2.2.2] octyl-1,4-diyl, or bicyclic [3.1.0] hex-3,6-diyl, in these rings, any -CH 2 -may be substituted by -O-, any -CH = Can be substituted by -N =, arbitrary hydrogen can be substituted by halogen, alkyl group having 1 to 10 carbon atoms, or halogenated alkyl group having 1 to 10 carbon atoms. Among the alkyl groups, any -CH 2 -can be substituted by -O- , -CO-, -COO-, -OCO-, -CH = CH-, or -C≡C-, and n is an integer from 1 to 6.

若2官能以上的聚合性化合物為多環,則耐熱性變高,且若直線性高,則無機填料間的由熱所引起的延伸或波動少,進而可效率良好地傳遞熱的聲子傳導,故而較佳。若為多環且直線性高,則結果多數情況下表現出液晶性,因此若為液晶性,則可謂熱傳導變佳。
但2官能以上的聚合性化合物亦可為除所述式(1-1)所表示的聚合性液晶化合物以外的不顯示液晶性的聚合性化合物。例如可列舉:聚醚的二縮水甘油醚、雙酚A的二縮水甘油醚、雙酚F的二縮水甘油醚、雙酚的二縮水甘油醚、或式(1-1)的化合物中直線性不足且未表現出液晶性的化合物等。
所述聚合性化合物可藉由組合有機合成化學中公知的方法而合成。
When the bifunctional or more polymerizable compound is polycyclic, the heat resistance is increased, and when the linearity is high, the extension or fluctuation due to heat between the inorganic fillers is small, and heat phonon conduction can be efficiently transmitted. , So it is better. If it is polycyclic and has high linearity, liquid crystallinity is often exhibited as a result. Therefore, if it is liquid crystallinity, it can be said that thermal conductivity is improved.
However, the polymerizable compound having two or more functions may be a polymerizable compound that does not exhibit liquid crystallinity other than the polymerizable liquid crystal compound represented by the formula (1-1). For example, diglycidyl ether of polyether, diglycidyl ether of bisphenol A, diglycidyl ether of bisphenol F, diglycidyl ether of bisphenol, or linearity among compounds of formula (1-1) Compounds that are insufficient and do not exhibit liquid crystallinity.
The polymerizable compound can be synthesized by a method known in combination organic synthetic chemistry.

本發明中所使用的2官能以上的聚合性化合物為了形成與矽烷偶合劑的鍵而具有2官能以上的官能基,且包含3官能以上、及4官能以上的情況。進而,作為2官能以上的聚合性化合物,於長邊的兩端具有官能基的情況可形成直線性鍵,故而較佳。When the bifunctional or more polymerizable compound used in the present invention has a bifunctional or more functional group in order to form a bond with a silane coupling agent, it may include a trifunctional or more functional group and a tetrafunctional or more functional group. Further, it is preferable that the polymerizable compound having two or more functions has a linear bond when it has a functional group at both ends of the long side.

[無機填料]
作為第一無機填料、第二無機填料、第三無機填料,分別可列舉氮化物、碳化物、碳材料、金屬氧化物、矽酸鹽礦物等,較佳為第一無機填料、第三無機填料分別為氮化物、碳化物、碳材料、金屬氧化物、矽酸鹽礦物,第二無機填料為金屬氧化物。第一無機填料、第二無機填料、第三無機填料可相同亦可不同。
具體而言,在第一無機填料、第三無機填料中可列舉氮化硼、碳化硼、硼碳氮、石墨、碳纖維、碳奈米管作為高導熱性的無機填料。或者,可列舉氧化鋁、氧化矽、氧化鎂、氧化鋅、氧化鐵、鐵氧體、莫來石、堇青石、氮化矽、及碳化矽。另外,在第二無機填料中可列舉氧化鋁、金屬氮化物、氧化鋅、氧化鋯、及氧化鈦作為高導熱性的無機填料。
[Inorganic filler]
Examples of the first inorganic filler, the second inorganic filler, and the third inorganic filler include nitrides, carbides, carbon materials, metal oxides, and silicate minerals. The first inorganic filler and the third inorganic filler are preferred. They are nitride, carbide, carbon material, metal oxide, silicate mineral, and the second inorganic filler is metal oxide. The first inorganic filler, the second inorganic filler, and the third inorganic filler may be the same or different.
Specifically, examples of the first inorganic filler and the third inorganic filler include boron nitride, boron carbide, boron carbonitride, graphite, carbon fiber, and carbon nanotube as the inorganic filler having high thermal conductivity. Alternatively, alumina, silicon oxide, magnesium oxide, zinc oxide, iron oxide, ferrite, mullite, cordierite, silicon nitride, and silicon carbide can be cited. Examples of the second inorganic filler include alumina, metal nitride, zinc oxide, zirconia, and titanium oxide as the inorganic filler having high thermal conductivity.

第一無機填料、第二無機填料、第三無機填料亦可混合存在。再者,第一無機填料、第二無機填料、第三無機填料於粒子表面具有能夠與矽烷偶合劑所具有的有機官能基鍵結的官能基,且相對於無機填料的重量,其修飾量只要為0.1重量%以上即可,較佳為0.3重量%~50重量%,更佳為0.5重量%~25重量%。另外,於重視電絕緣性的部位中,使用絕緣性的無機填料者的超壽命化等可靠性高,因此較佳為不使用作為導電體的碳材料、或作為半導體的一部分氧化物等。The first inorganic filler, the second inorganic filler, and the third inorganic filler may be mixed together. Furthermore, the first inorganic filler, the second inorganic filler, and the third inorganic filler have a functional group capable of being bonded to the organic functional group of the silane coupling agent on the particle surface, and the modification amount relative to the weight of the inorganic filler is only required. It may be 0.1% by weight or more, preferably 0.3% to 50% by weight, and more preferably 0.5% to 25% by weight. In addition, in areas where electrical insulation is important, the use of insulating inorganic fillers has high reliability, such as longevity. Therefore, it is preferable not to use a carbon material as a conductor or an oxide as a part of a semiconductor.

第一無機填料、第三無機填料進而較佳為氮化硼、氮化鋁、氮化矽、碳化矽、石墨、碳纖維、碳奈米管。尤佳為六方晶系的氮化硼(h-BN)或石墨。氮化硼、石墨由於平面方向的導熱率非常高,且氮化硼的介電常數亦低,絕緣性亦高,故而較佳。例如,若使用板狀結晶的氮化硼,則在成型及硬化時,因原料的流動或壓力,板狀結構容易沿模具配向,故而較佳。The first inorganic filler and the third inorganic filler are more preferably boron nitride, aluminum nitride, silicon nitride, silicon carbide, graphite, carbon fiber, and carbon nanotube. Particularly preferred is hexagonal boron nitride (h-BN) or graphite. Boron nitride and graphite are preferable because the thermal conductivity in the plane direction is very high, and the dielectric constant of boron nitride is also low and the insulation is also high. For example, if plate-shaped crystal boron nitride is used, it is preferable that the plate-like structure is easily aligned along the mold due to the flow or pressure of the raw material during molding and hardening.

2官能以上的聚合性化合物的結構理想的是具有可使該些無機填料間效率良好地直接鍵結的形狀及長度。無機填料的種類、形狀、大小、添加量等可根據目的而適當選擇。在散熱構件用組成物的硬化物需要絕緣性的情況下,只要可保持所期望的絕緣性,則亦可為具有導電性的無機填料。作為無機填料的形狀,可列舉板狀、球狀、無定形、纖維狀、棒狀、筒狀等。It is desirable that the structure of the bifunctional or more polymerizable compound has a shape and a length that allow efficient direct bonding between these inorganic fillers. The type, shape, size, and addition amount of the inorganic filler can be appropriately selected according to the purpose. When the hardened | cured material of the composition for heat radiation members requires insulation, as long as desired insulation can be maintained, it may be an inorganic filler which has electroconductivity. Examples of the shape of the inorganic filler include a plate shape, a spherical shape, an amorphous shape, a fibrous shape, a rod shape, and a cylindrical shape.

第一無機填料、第二無機填料及第三無機填料的平均粒徑較佳為0.1 μm~600 μm。更佳為1 μm~200 μm。若為0.1 μm以上,則導熱率良好,若為200 μm以下,則可提高填充率。
再者,在本說明書中,平均粒徑是基於利用雷射(laser)繞射・散射法的粒度分佈測定。即,利用基於夫朗和斐(Fraunhofer)繞射理論及米氏(Mie)散射理論的解析,藉由濕式法,將粉體自某粒徑分為兩者時,將大側與小側成為等量(體積基準)的直徑設為中值粒徑。
無機填料與矽烷偶合劑及聚合性化合物的比例依存於與所使用的無機填料鍵結的矽烷偶合劑的量。用作第一無機填料、第二無機填料及第三無機填料的化合物(例如氮化硼)較佳為使盡可能多的矽烷偶合劑鍵結於反應基,從而使與所述反應基的個數相等或稍多的有機化合物進行鍵結。矽烷偶合劑對無機填料的反應量主要根據無機填料的大小或所使用的矽烷偶合劑的反應性而變化。例如無機填料越大,則無機填料的側面的面積比越減小,故而修飾量少。雖欲使盡可能多的矽烷偶合劑反應,但若減小粒子,則產物的導熱率將變低,因此較佳為取得平衡。
The average particle diameter of the first inorganic filler, the second inorganic filler, and the third inorganic filler is preferably from 0.1 μm to 600 μm. More preferably, it is 1 to 200 μm. When it is 0.1 μm or more, the thermal conductivity is good, and when it is 200 μm or less, the filling rate can be improved.
In addition, in this specification, an average particle diameter is a particle size distribution measurement based on the laser diffraction and scattering method. That is, using the analysis based on the Fraunhofer diffraction theory and Mie scattering theory to divide the powder from a certain particle size into two by the wet method, the large side and the small side are divided. The diameter which becomes an equivalent amount (volume basis) is set as a median particle diameter.
The ratio of the inorganic filler to the silane coupling agent and the polymerizable compound depends on the amount of the silane coupling agent bonded to the inorganic filler used. The compound (such as boron nitride) used as the first inorganic filler, the second inorganic filler, and the third inorganic filler is preferably such that as many silane coupling agents are bonded to the reactive group as possible, so that each of the reactive groups An equal number or more of organic compounds are bonded. The reaction amount of the silane coupling agent to the inorganic filler mainly changes depending on the size of the inorganic filler or the reactivity of the silane coupling agent used. For example, the larger the inorganic filler is, the smaller the area ratio of the side surface of the inorganic filler is, so that the amount of modification is small. Although it is desired to react as many silane coupling agents as possible, if the particles are reduced, the thermal conductivity of the product will be low, so it is preferable to achieve equilibrium.

[矽烷偶合劑]
作為矽烷偶合劑,較佳為具有矽烷偶合劑彼此能夠鍵結的官能基者、或具有能夠與2官能以上的聚合性化合物所具有的官能基鍵結的官能基者、或具有能夠與第三無機填料所具有的官能基鍵結的官能基者。在鍵結對象側的官能基為氧雜環丙基或酸酐殘基等的情況下,較佳為與該些官能基反應,故而較佳為在末端具有胺系反應基。例如可列舉捷恩智(JNC)(股)製造的塞拉艾斯(Sila-Ace)(註冊商標)S310、Sila-Ace S320、Sila-Ace S330、Sila-Ace S360、信越化學工業(股)製造的KBM-903、KBE-903等。在對象側的末端為胺的情況下,較佳為在末端具有氧雜環丙基等的矽烷偶合劑。例如可列舉捷恩智(JNC)(股)製造的Sila-Ace(註冊商標)S510、Sila-Ace S530等。
作為形成矽烷偶合劑與對象側的鍵的官能基的組合,例如可列舉氧雜環丙基與胺基、乙烯基彼此、甲基丙烯醯氧基彼此、羧基或羧酸酐殘基與胺、咪唑基與氧雜環丙基等組合,但並不限定於該些。只要為能夠形成矽烷偶合劑與對象側的鍵的官能基的組合即可。更佳為耐熱性高的組合。
再者,第1偶合劑、第2偶合劑可相同亦可不同。
[Silane coupling agent]
As the silane coupling agent, those having a functional group capable of being bonded to each other by the silane coupling agents, those having a functional group capable of being bonded to a functional group possessed by a polymerizable compound having two or more functions, or those having a third A functional group having a functional group bonded to an inorganic filler. When the functional group on the bonding target side is an oxetanyl group, an acid anhydride residue, or the like, it is preferred to react with these functional groups, and therefore it is preferred to have an amine-based reactive group at the terminal. For example, Sila-Ace (registered trademark) S310, Sila-Ace S320, Sila-Ace S330, Sila-Ace S360, Shin-Etsu Chemical Industry Co., Ltd. KBM-903, KBE-903, etc. When the target-side terminal is an amine, a silane coupling agent having an oxetanyl group or the like at the terminal is preferred. For example, Sila-Ace (registered trademark) S510 and Sila-Ace S530 manufactured by JNC Corporation are listed.
Examples of the combination of functional groups that form a silane coupling agent and a bond on the target side include, for example, oxepropyl groups and amine groups, vinyl groups, methacryloxy groups, carboxyl or carboxylic anhydride residues, amines, and imidazoles. The group is combined with oxetrayl and the like, but is not limited to these. It is only required to be a combination of functional groups capable of forming a silane coupling agent and a target-side bond. More preferred is a combination with high heat resistance.
The first coupling agent and the second coupling agent may be the same or different.

[其他構成要素]
散熱構件用組成物可包含第一無機填料及第二無機填料所未鍵結的、即未有助於鍵結的有機化合物(例如聚合性化合物或高分子化合物),亦可包含聚合起始劑或溶媒等。
於散熱構件用組成物的硬化物中,在隨著為了提高導熱率而增大填料的粒徑,空隙率與其相對應地提高的情況下,可藉由利用未鍵結的化合物來填滿其空隙,可使導熱率或水蒸氣阻斷性能等提高。
[Other components]
The composition for a heat radiation member may include an organic compound (for example, a polymerizable compound or a polymer compound) that is not bonded by the first inorganic filler and the second inorganic filler, that is, does not contribute to the bonding, and may also include a polymerization initiator. Or solvent.
In the hardened material of the composition for a heat dissipation member, when the filler particle size is increased in order to increase the thermal conductivity, and the porosity is increased correspondingly, it can be filled with an unbonded compound. Voids can improve thermal conductivity and water vapor blocking performance.

[未鍵結的聚合性化合物]
散熱構件用組成物亦可包含無機填料所未鍵結的聚合性化合物(此時亦可不必為2官能以上)作為構成要素。作為此種聚合性化合物,較佳為不會妨礙散熱構件用組成物的熱硬化且不會因加熱而蒸發或滲出的化合物。該聚合性化合物分類為不具有液晶性的化合物與具有液晶性的化合物。作為不具有液晶性的聚合性化合物,可列舉:乙烯衍生物、苯乙烯衍生物、(甲基)丙烯酸衍生物、山梨酸(sorbic acid)衍生物、富馬酸衍生物、衣康酸衍生物等。關於含量,理想的是首先製作不含未鍵結的聚合性化合物的散熱構件用組成物,測定其空隙率,從而添加可填埋其空隙的量的聚合性化合物。
[Unbonded polymerizable compound]
The composition for a heat radiating member may contain a polymerizable compound which is not bonded to the inorganic filler (in this case, it may not necessarily be bifunctional or more) as a constituent element. As such a polymerizable compound, a compound which does not inhibit the thermal curing of the composition for a heat radiation member and which does not evaporate or bleed out by heating is preferable. The polymerizable compound is classified into a compound having no liquid crystallinity and a compound having liquid crystallinity. Examples of the polymerizable compound having no liquid crystal properties include ethylene derivatives, styrene derivatives, (meth) acrylic acid derivatives, sorbic acid derivatives, fumaric acid derivatives, and itaconic acid derivatives. Wait. Regarding the content, it is desirable to first prepare a composition for a heat dissipating member that does not contain an unbonded polymerizable compound, and measure the porosity to add a polymerizable compound in an amount that can fill the void.

[未鍵結的高分子化合物]
散熱構件用組成物亦可以無機填料所未鍵結的高分子化合物作為構成要素。此種高分子化合物較佳為不會使膜形成性及機械強度降低的化合物。該高分子化合物只要為不與無機填料、矽烷偶合劑、及聚合性化合物反應的高分子化合物即可,例如在聚合性化合物為氧雜環丙基且矽烷偶合劑具有胺基的情況下,可列舉:聚烯烴系樹脂、聚乙烯系樹脂、矽酮樹脂、蠟等。關於含量,理想的是首先製作不含未鍵結的高分子化合物的散熱構件用組成物,測定其空隙率,從而添加可填埋其空隙的量的高分子化合物。
[Unbonded polymer compound]
The composition for a heat radiating member may use a polymer compound not bonded to the inorganic filler as a constituent element. Such a polymer compound is preferably a compound that does not reduce film-forming properties and mechanical strength. The polymer compound may be a polymer compound that does not react with an inorganic filler, a silane coupling agent, and a polymerizable compound. For example, when the polymerizable compound is an oxetanyl group and the silane coupling agent has an amine group, it may be Examples include polyolefin resins, polyethylene resins, silicone resins, and waxes. Regarding the content, it is desirable to first prepare a composition for a heat dissipating member that does not contain an unbonded polymer compound, and measure the porosity thereof to add a polymer compound in an amount that can fill the void.

[非聚合性的液晶性化合物]
散熱構件用組成物亦可以不具有聚合性基的液晶性化合物作為構成要素。此種非聚合性的液晶性化合物的例子在作為液晶性化合物的資料庫(date base)的液晶資料庫(LiqCryst, LCI 出版社(Publisher GmbH), 漢堡市(Hamburg), 德國(Germany))等中有所記載。可藉由使含有非聚合性的液晶性化合物的該組成物聚合而獲得例如化合物(1-1)的聚合物與液晶性化合物的複合材(composite materials)。此種複合材中,在如高分子分散型液晶的高分子網狀結構中存在非聚合性的液晶性化合物。因此,理想的是具有如在所使用的溫度區域中無流動性般的特性的液晶性化合物。可使無機填料硬化後,藉由在顯示各向同性相的溫度區域中注入其空隙的方法進行複合化,亦可在無機填料中混合預先以填埋空隙的方式計算出的分量的液晶性化合物,從而使無機填料彼此聚合。
[Non-polymerizable liquid crystal compound]
The composition for a heat radiation member may be a liquid crystal compound which does not have a polymerizable group as a constituent element. Examples of such non-polymerizable liquid crystal compounds are the liquid crystal database (LiqCryst, LCI Press (Publisher GmbH), Hamburg, Germany, etc.) which is the date base of liquid crystal compounds. It's documented. By polymerizing the composition containing a non-polymerizable liquid crystal compound, for example, a composite material of a polymer of the compound (1-1) and a liquid crystal compound can be obtained. In such a composite material, a non-polymerizable liquid crystal compound exists in a polymer network structure such as a polymer dispersed liquid crystal. Therefore, it is desirable to have a liquid crystal compound having characteristics such as no fluidity in the temperature region used. After the inorganic filler is hardened, it is compounded by injecting voids in a temperature region showing an isotropic phase, and the inorganic filler may be mixed with a liquid crystal compound of a component calculated in advance to fill the voids. , Thereby polymerizing the inorganic fillers with each other.

[聚合起始劑]
散熱構件用組成物亦可以聚合起始劑作為構成要素。聚合起始劑只要根據該組成物的構成要素及聚合方法使用例如光自由基聚合起始劑、光陽離子聚合起始劑、熱自由基聚合起始劑等即可。特別是因無機填料會吸收紫外線,故較佳為熱自由基聚合起始劑。
作為熱自由基聚合用的較佳的起始劑,例如可列舉:過氧化苯甲醯、過氧化二碳酸二異丙酯、過氧化-2-乙基己酸第三丁酯、過氧化特戊酸第三丁酯、二-第三丁基過氧化物(DTBPO)、過氧化二異丁酸第三丁酯、過氧化月桂醯、2,2'-偶氮雙異丁酸二甲酯(MAIB)、偶氮雙異丁腈(AIBN)、偶氮雙環己烷碳腈(ACN)等。
[Polymerization initiator]
The composition for a heat radiating member may have a polymerization initiator as a constituent element. The polymerization initiator may be, for example, a photoradical polymerization initiator, a photocationic polymerization initiator, a thermal radical polymerization initiator, or the like depending on the constituent elements and the polymerization method of the composition. In particular, since the inorganic filler absorbs ultraviolet rays, a thermal radical polymerization initiator is preferred.
Examples of preferred initiators for thermal radical polymerization include benzamidine peroxide, diisopropyl peroxydicarbonate, tert-butyl peroxy-2-ethylhexanoate, and peroxytetracycline. Tertiary butyl valerate, di-tertiary butyl peroxide (DTBPO), tertiary butyl peroxydiisobutyrate, lauryl peroxide, dimethyl 2,2'-azobisisobutyrate (MAIB), azobisisobutyronitrile (AIBN), azobiscyclohexanecarbonitrile (ACN), etc.

[溶媒]
散熱構件用組成物亦可含有溶媒。在該組成物中包含必須聚合的構成要素的情況下,聚合可在溶媒中進行,亦可在無溶媒下進行。藉由例如旋塗法(spin coat method)等將含有溶媒的該組成物塗佈於基板上後,去除溶媒後使其進行光聚合。或者,亦可在光硬化後加溫至適當的溫度,藉由熱硬化而進行後處理。
作為較佳的溶媒,例如可列舉:苯、甲苯、二甲苯、均三甲苯、己烷、庚烷、辛烷、壬烷、癸烷、四氫呋喃、γ-丁內酯、N-甲基吡咯啶酮、二甲基甲醯胺、二甲基亞碸、環己烷、甲基環己烷、環戊酮、環己酮、丙二醇單甲醚乙酸酯(propylene glycol monomethyl ether acetate,PGMEA)等。所述溶媒可單獨使用一種,亦可混合使用兩種以上。
再者,限定聚合時的溶媒的使用比例並無太大意義,只要考慮聚合效率、溶媒成本(cost)、能量(energy)成本等而按各事例(case)分別決定即可。
[Solvent]
The composition for a heat radiation member may contain a solvent. In the case where constituents which must be polymerized are contained in the composition, the polymerization may be performed in a solvent or may be performed without a solvent. This composition containing a solvent is applied to a substrate by, for example, a spin coat method, and then the solvent is removed and then photopolymerized. Alternatively, it may be heated to an appropriate temperature after photo-hardening, and post-treatment may be performed by thermal hardening.
Examples of preferred solvents include benzene, toluene, xylene, mesitylene, hexane, heptane, octane, nonane, decane, tetrahydrofuran, γ-butyrolactone, and N-methylpyrrolidine. Ketones, dimethylformamide, dimethylmethylene, cyclohexane, methylcyclohexane, cyclopentanone, cyclohexanone, propylene glycol monomethyl ether acetate (PGMEA), etc. . The solvents may be used singly or in combination of two or more kinds.
In addition, it does not make much sense to limit the use ratio of the solvent during the polymerization, as long as the efficiency of the polymerization, the cost of the solvent, and the cost of energy are taken into consideration and determined for each case.

[其他]
為了使操作變得容易,亦可在散熱構件用組成物中添加穩定劑。作為所述穩定劑,只要無損本發明的效果,則並無特別限制,可列舉:抗氧化劑、硬化劑、銅抑制劑、金屬鈍化劑、黏著性賦予劑、抗老化劑、消泡劑、抗靜電劑、耐候劑等。作為抗氧化劑,例如可列舉:對苯二酚(hydroquinone)、4-乙氧基苯酚及3,5-二-第三丁基-4-羥基甲苯(BHT)等。
例如,在形成接著層的樹脂因與金屬的接觸而劣化的情況下,較佳為添加如日本專利特開平5-48265號公報中所列舉般的銅抑制劑或金屬鈍化劑。
作為所述銅抑制劑(商品名),較佳為艾迪科(ADEKA)(股)製造的馬克(Mark)ZS-27、Mark CDA-16;三光化學工業(股)製造的三光-艾伯科琳(SANKO-EPOCLEAN);巴斯夫(BASF)公司製造的易璐諾斯(Irganox)MD1024等。
就可防止接著層的與金屬接觸的部分的樹脂的劣化等方面而言,所述銅抑制劑的添加量較佳為相對於接著層中所包含的樹脂的總量100重量份而為0.1重量份~3重量份。
進而,亦可為了調整散熱構件用組成物的黏度或顏色而添加添加劑(氧化物等)。例如可列舉:用以形成白色的氧化鈦、用以形成黑色的碳黑(carbon black)、用以調整黏度的二氧化矽(silica)的微粉末。另外,亦可為了進一步增加機械強度而添加添加劑。例如可列舉:玻璃纖維、碳纖維(carbon fiber)、碳奈米管等無機纖維或布(cloth)、或作為高分子添加劑的聚乙烯甲醛、聚乙烯丁醛、聚酯、聚醯胺、聚醯亞胺等纖維或長分子。
[other]
In order to facilitate the operation, a stabilizer may be added to the composition for a heat radiation member. The stabilizer is not particularly limited as long as the effects of the present invention are not impaired, and examples thereof include antioxidants, hardeners, copper inhibitors, metal deactivators, adhesion-imparting agents, anti-aging agents, defoamers, and Static agent, weathering agent, etc. Examples of the antioxidant include hydroquinone, 4-ethoxyphenol, and 3,5-di-third-butyl-4-hydroxytoluene (BHT).
For example, when the resin forming the adhesive layer is deteriorated by contact with a metal, it is preferable to add a copper inhibitor or a metal deactivator such as those listed in Japanese Patent Laid-Open No. 5-48265.
As the copper inhibitor (trade name), Mark ZS-27 and Mark CDA-16 manufactured by ADEKA Co., Ltd. are preferred; and Mitsuko-Alber manufactured by Sanko Chemical Co., Ltd. Kelin (SANKO-EPOCLEAN); Irganox (MD1024) manufactured by BASF.
In terms of preventing deterioration of the resin in the portion of the adhesive layer that is in contact with the metal, the addition amount of the copper inhibitor is preferably 0.1% by weight relative to 100 parts by weight of the total amount of the resin contained in the adhesive layer. Parts to 3 parts by weight.
Further, additives (such as oxides) may be added in order to adjust the viscosity or color of the composition for a heat dissipation member. Examples include fine titanium oxide powder for forming white titanium oxide, carbon black for forming black carbon dioxide, and silica for adjusting viscosity. In addition, additives may be added in order to further increase the mechanical strength. Examples include inorganic fibers or cloth such as glass fiber, carbon fiber, and carbon nanotube, or polyvinyl formaldehyde, polyvinyl butyral, polyester, polyamide, and polyfluorene as polymer additives. Fiber or long molecule such as imine.

[基板層]
如圖3所示,基板層經由矽烷偶合劑及2官能以上的聚合性化合物而與無機填料形成鍵結,且構成與有機無機混合接著層的積層體。對於基板層,例如可列舉銅、鋁、鎳、金、合金、或陶瓷等。例如,在作為基板層的材料而使用金屬層的情況下,有機無機混合接著層與基板層的鍵形成於位於基板層的最表面的金屬層與有機無機混合接著層之間。因此,在具有鍍敷等的薄膜的材料中,於鍍敷材料與有機無機混合接著層之間,形成有經由矽烷偶合劑或2官能以上的聚合性化合物的鍵。如此,金屬層亦可為可成為鍍敷材料的金屬。另外,基板層的厚度並無特別限制,可使用與用途相對應的厚度。更厚者的散熱性優異,故而較佳。
[Substrate layer]
As shown in FIG. 3, the substrate layer is bonded to an inorganic filler via a silane coupling agent and a bifunctional or more functional polymerizable compound, and constitutes a laminated body mixed with an organic-inorganic adhesive layer. Examples of the substrate layer include copper, aluminum, nickel, gold, alloys, and ceramics. For example, when a metal layer is used as the material of the substrate layer, the bond between the organic-inorganic mixed adhesion layer and the substrate layer is formed between the metal layer and the organic-inorganic mixed adhesion layer located on the outermost surface of the substrate layer. Therefore, in a material having a thin film such as plating, a bond is formed between the plating material and the organic-inorganic mixed adhesive layer through a silane coupling agent or a bifunctional or more polymerizable compound. In this way, the metal layer may be a metal that can be used as a plating material. The thickness of the substrate layer is not particularly limited, and a thickness according to the application can be used. A thicker one is preferred because it has excellent heat dissipation properties.

基板層只要為可塗佈散熱構件用組成物、可與使散熱構件用組成物硬化而成的有機無機混合接著層形成積層體的形狀或材料即可。例如,作為形狀,可列舉板狀、棒狀等。
在作為基板層的材料而使用金屬層的情況下,不僅可用作散熱構件,亦可用作金屬電極。因此,金屬層可為一塊金屬電極,亦可為將一塊金屬電極分割成多塊的狀態下的金屬電極。即,金屬層亦可為包含多個金屬電極的層。如此,本申請案的積層體亦可用作具有導熱性、散熱性、絕緣性的電子基板(印刷基板)。
The substrate layer may have a shape or a material that can coat the composition for a heat dissipating member, and can be mixed with an organic-inorganic material obtained by curing the composition for a heat dissipating member and then laminated to form a laminate. Examples of the shape include a plate shape and a rod shape.
When a metal layer is used as a material of a substrate layer, it can be used not only as a heat radiation member but also as a metal electrode. Therefore, the metal layer may be a metal electrode or a metal electrode in a state where one metal electrode is divided into a plurality of pieces. That is, the metal layer may be a layer including a plurality of metal electrodes. In this way, the laminated body of the present application can also be used as an electronic substrate (printed substrate) having thermal conductivity, heat dissipation, and insulation.

[製造方法]
以下,以散熱構件用組成物為例,對製造散熱構件用組成物的方法、及由該組成物與基板層製造積層體的方法進行具體說明。
(1)實施矽烷偶合處理
利用第一矽烷偶合劑對第一無機填料實施矽烷偶合處理,使第一無機填料與第一矽烷偶合劑的一端鍵結。矽烷偶合處理可使用公知的方法。對於第二無機填料、第三無機填料,亦可利用第二無機填料、第三無機填料同樣地進行矽烷偶合處理。
作為一例,首先,將無機填料與矽烷偶合劑添加至溶媒中。使用攪拌器(stirrer)等加以攪拌後進行乾燥。在溶媒乾燥後,使用真空乾燥機等在真空條件下進行加熱處理。向該無機填料中添加溶媒,藉由超音波處理進行粉碎。使用離心分離機對該溶液進行分離精製。捨棄上清液後,添加溶媒進行多次同樣的操作。使用烘箱(oven)使精製後的實施了矽烷偶合處理的無機填料乾燥。
(2)利用2官能以上的聚合性化合物進行修飾
利用第二矽烷偶合劑對第二無機填料實施矽烷偶合處理(或者亦可將利用第一矽烷偶合劑實施了矽烷偶合處理的所述第一無機填料用作第二無機填料),進一步使第一2官能以上的聚合性化合物與第二矽烷偶合劑的另一端鍵結。
作為一例,使用瑪瑙研缽等將經矽烷偶合處理的無機填料與第二官能以上的聚合性化合物混合後,使用雙輥等進行混練。其後,藉由超音波處理及離心分離進行分離精製。
(3)進行混合
例如以僅無機填料的重量成為1:1:1的方式秤量與第一矽烷偶合劑的一端鍵結的第一無機填料、與第二矽烷偶合劑的一端鍵結的第二無機填料、以及與第三矽烷偶合劑的一端鍵結的第三無機填料,使用瑪瑙研缽等將其混合。然後,使用雙輥等進行混合,獲得散熱構件用組成物。
關於與第一矽烷偶合劑的一端鍵結的第一無機填料、與第二矽烷偶合劑的一端鍵結的第二無機填料、和與第三矽烷偶合劑的一端鍵結的第三無機填料的混合比例,在形成第一無機填料與第二無機填料間的鍵的鍵結基分別為胺:環氧基的情況下,僅無機填料的重量例如以重量比計較佳為1:0.1~1:30,更佳為1:3~1:20。進而較佳為1:4~1:10。混合比例由形成第一無機填料與第二無機填料間的鍵的末端的鍵結基的個數決定,例如,若為一級胺,則可與2個氧雜環丙基進行反應,因此與氧雜環丙基側相比可為少量,亦有氧雜環丙基側開環的可能性,從而較佳為增大根據環氧當量所計算的量而使用。
[Production method]
Hereinafter, a method for producing a composition for a heat-dissipating member and a method for producing a laminated body from the composition and a substrate layer will be specifically described using the composition for a heat-dissipating member as an example.
(1) Implementing a silane coupling treatment A silane coupling treatment is performed on the first inorganic filler with a first silane coupling agent, so that the first inorganic filler and one end of the first silane coupling agent are bonded. A known method can be used for the silane coupling treatment. The second inorganic filler and the third inorganic filler can be similarly subjected to a silane coupling treatment using the second inorganic filler and the third inorganic filler.
As an example, first, an inorganic filler and a silane coupling agent are added to a solvent. Stir with a stirrer or the like and dry. After the solvent is dried, heat treatment is performed under a vacuum condition using a vacuum dryer or the like. A solvent is added to this inorganic filler, and it is pulverized by ultrasonic treatment. This solution was separated and purified using a centrifugal separator. After discarding the supernatant, a vehicle was added to perform the same operation several times. The refined inorganic filler subjected to the silane coupling treatment was dried using an oven.
(2) Modification with a bifunctional or more polymerizable compound. The second inorganic filler is subjected to a silane coupling treatment with a second silane coupling agent (or the first inorganic material subjected to the silane coupling treatment with the first silane coupling agent may be used) The filler is used as the second inorganic filler), and the first difunctional polymerizable compound and the other end of the second silane coupling agent are further bonded.
As an example, the silane coupling-treated inorganic filler is mixed with a polymer having a second or higher functionality using an agate mortar or the like, and then kneaded using a double roll or the like. Thereafter, separation and purification were performed by ultrasonic treatment and centrifugation.
(3) For example, the first inorganic filler bonded to one end of the first silane coupling agent and the second inorganic bond bonded to one end of the second silane coupling agent are weighed so that only the weight of the inorganic filler becomes 1: 1. The inorganic filler and the third inorganic filler bonded to one end of the third silane coupling agent are mixed using an agate mortar or the like. Then, they are mixed using a double roll or the like to obtain a composition for a heat radiation member.
Regarding the first inorganic filler bonded to one end of the first silane coupling agent, the second inorganic filler bonded to one end of the second silane coupling agent, and the third inorganic filler bonded to one end of the third silane coupling agent In the mixing ratio, when the bonding groups that form the bond between the first inorganic filler and the second inorganic filler are amine: epoxy, respectively, the weight of the inorganic filler alone is preferably 1: 0.1 to 1: 30, more preferably 1: 3 to 1:20. It is more preferably 1: 4 to 1:10. The mixing ratio is determined by the number of bonding groups that form the end of the bond between the first inorganic filler and the second inorganic filler. For example, if it is a primary amine, it can react with two oxetanyl groups. The heterocyclopropyl side may be a small amount compared with the possibility of ring opening at the oxecyclopropyl side, and therefore it is preferable to use it by increasing the amount calculated based on the epoxy equivalent.

壓縮成形時的溫度為室溫~350℃、較佳為室溫~300℃、更佳為50℃~250℃的範圍,時間為5秒~10小時、較佳為1分鐘~5小時、更佳為5分鐘~1小時的範圍。硬化後較佳為進行緩冷以抑制應力應變等。另外,亦可進行再加熱處理而緩和應變等。如此,可藉由比較低的溫度下的加熱壓接來進行有機無機混合接著層的形成、以及有機無機混合接著層與基板層(金屬層)的接合。
為使垂直方向上的導熱率良好,有機無機混合接著層的膜厚較佳為較薄。較佳為30 μm~2000 μm,更佳為30 μm~1000 μm。進而較佳為30 μm~從500 μm。有機無機混合接著層及基板層(金屬層)的膜厚只要根據用途而適當變更即可。
The temperature during compression molding is in the range of room temperature to 350 ° C, preferably room temperature to 300 ° C, more preferably 50 ° C to 250 ° C, and the time is 5 seconds to 10 hours, preferably 1 minute to 5 hours, more It is preferably in the range of 5 minutes to 1 hour. After hardening, it is preferable to perform slow cooling to suppress stress and strain. In addition, a reheating treatment may be performed to reduce strain or the like. In this manner, the formation of the organic-inorganic mixed adhesive layer and the bonding of the organic-inorganic mixed adhesive layer and the substrate layer (metal layer) can be performed by thermal compression bonding at a relatively low temperature.
In order to make the thermal conductivity in the vertical direction good, the film thickness of the organic-inorganic mixed adhesive layer is preferably thin. It is preferably 30 μm to 2000 μm, and more preferably 30 μm to 1000 μm. It is more preferably from 30 μm to 500 μm. The film thickness of the organic-inorganic mixed adhesive layer and the substrate layer (metal layer) may be appropriately changed depending on the application.

根據以上所述,本發明的散熱構件為具有作為使散熱構件用組成物硬化而成的硬化物的有機無機混合接著層與基板層(金屬層)的積層體。散熱構件用組成物的硬化物具有高導熱性,並且根據所使用的有機材料與無機材料的種類、調配比率、硬化條件等而熱膨脹率為負值至正值,化學穩定性、硬度及機械強度等優異。再者,所述機械強度是指楊氏模數(Young's modulus)、拉伸強度、撕裂強度、彎曲強度、彎曲彈性模數、衝擊強度等。
本發明的散熱構件可用於散熱板、散熱片、散熱膜、散熱接著材、散熱成形品等。進而,亦可用作具有導熱性、散熱性、絕緣性的電子基板(印刷基板)。
As described above, the heat radiating member of the present invention is a laminated body including an organic-inorganic mixed adhesive layer and a substrate layer (metal layer) as a cured product obtained by curing the composition for a heat radiating member. The hardened material of the composition for the heat radiation member has high thermal conductivity, and the thermal expansion coefficient is negative to positive, depending on the type of organic and inorganic materials used, the blending ratio, and hardening conditions, chemical stability, hardness, and mechanical strength. And so on. Moreover, the mechanical strength refers to Young's modulus, tensile strength, tear strength, flexural strength, flexural elastic modulus, impact strength, and the like.
The heat radiation member of the present invention can be used for a heat radiation plate, a heat radiation sheet, a heat radiation film, a heat radiation adhesive, a heat radiation molded product, and the like. Furthermore, it can be used as an electronic substrate (printed substrate) having thermal conductivity, heat dissipation, and insulation.

[電子機器]
本發明的電子機器包括本發明的散熱構件、以及具有發熱部的電子器件。散熱構件是以與所述發熱部接觸的方式配置於電子器件中。散熱構件的態樣可為散熱電子基板、散熱板、散熱片、散熱膜、散熱接著材、散熱成形品等的任一者。
例如,作為電子器件而可列舉半導體元件。本發明的散熱構件除高導熱性以外亦具有高耐熱性、高絕緣性。因此,半導體元件中,對於因高電力而需要更有效率的散熱機構的矽、碳化矽、氮化鎵、氧化鎵、金剛石等的功率半導體特別有效。具備該些功率半導體的電子機器可列舉大電力反相器(inverter)的主轉換元件、無停電電源裝置、交流電動機的可變電壓可變頻率控制裝置、鐵道車輛的控制裝置、混合動力汽車、電車(electric car)等的電動輸送機器、感應加熱(induction heat,IH)調理器等。
[實施例]
[Electronic equipment]
An electronic device according to the present invention includes the heat radiating member of the present invention, and an electronic device having a heat generating portion. The heat radiating member is disposed in the electronic device in contact with the heat generating portion. The aspect of the heat radiating member may be any of a heat radiating electronic substrate, a heat radiating plate, a heat radiating fin, a heat radiating film, a heat radiating adhesive, a heat radiating molded product, and the like.
For example, a semiconductor element is mentioned as an electronic device. The heat radiating member of the present invention has high heat resistance and high insulation in addition to high thermal conductivity. Therefore, semiconductor devices are particularly effective for power semiconductors such as silicon, silicon carbide, gallium nitride, gallium oxide, and diamond that require more efficient heat dissipation mechanisms due to high power. Examples of the electronic equipment provided with these power semiconductors include a main converter of a large power inverter, a non-stop power supply device, a variable voltage and frequency control device for an AC motor, a control device for a railway vehicle, a hybrid vehicle, Electric conveyors such as electric cars, induction heat (IH) conditioners, etc.
[Example]

以下,使用實施例對本發明進行詳細說明。但是,本發明並不限定於以下實施例中所記載的內容。Hereinafter, the present invention will be described in detail using examples. However, the present invention is not limited to the contents described in the following examples.

本發明的實施例中所使用的成分材料如下所述。The component materials used in the examples of the present invention are as follows.

<無機填料>
・氮化硼:h-BN粒子,日本邁圖高新材料(Momentive Performance Materials Japan)(合)製造,(商品名)帕拉姆(PolarTherm)PTX-25
・氧化鋁
・日本輕金屬(股)製造,(商品名)日輕金FS-210B
・日本輕金屬(股)製造,(商品名)日輕金FS-243
・日本輕金屬(股)製造,(商品名)日輕金FS-711C
・日本輕金屬(股)製造,(商品名)日輕朗德姆(Nikkei Rundum)V325F
・日本輕金屬(股)製造,(商品名)多面體氧化鋁CT50
・電化(Denka)(股)製造,(商品名)DAW-20
< Inorganic fillers >
・ Boron nitride: h-BN particles, manufactured by Momentive Performance Materials Japan (combined), (brand name) PolarTherm PTX-25
・ Alumina ・ Manufactured by Japan Light Metal (stock), (brand name) Nikkei Gold FS-210B
・ Made in Japan Light Metal (stock), (brand name) Nikkei Gold FS-243
・ Made in Japan Light Metal (stock), (brand name) Nikkei Gold FS-711C
・ Made in Japan Light Metal (Stock), (brand name) Nikkei Rundum V325F
・ Producted by Japan Light Metal Co., Ltd. (brand name) Polyhedron Alumina CT50
・ Manufactured by Denka Co., Ltd. (brand name) DAW-20

<矽烷偶合劑>
・N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷,捷恩智(JNC)(股)製造,(商品名)S320



・3-縮水甘油氧基丙基三甲氧基矽烷,捷恩智(JNC)(股)製造,(商品名)塞拉艾斯(Sila-Ace)(註冊商標)S510

< Silane coupling agent >
・ N- (2-Aminoethyl) -3-Aminopropyltrimethoxysilane, manufactured by JNC (stock), (trade name) S320



・ 3-Glycidoxypropyltrimethoxysilane, manufactured by JNC Corporation (trade name), Sila-Ace (registered trademark) S510

<2官能以上的聚合性化合物>
・聚合性氧雜環丙基化合物,捷恩智(JNC)(股)製造,下述式(1-11)

(1-11)
・聚合性氧雜環丙基化合物,三菱化學(股)製造,(商品名)jER807
<Two-functional polymerizable compound>
・ Polymerizable oxelanyl compound, manufactured by JNC Corporation, with the following formula (1-11)

(1-11)
・ Polymerizable oxelanyl compound, manufactured by Mitsubishi Chemical Corporation (trade name) jER807

・聚合性胺化合物,4,4'-二胺基-1,2-二苯基甲烷,和光純藥工業(股)製造



・聚合性胺化合物,4,4'-伸乙基二苯胺,東京化成工業(股)製造

・ Polymerizable amine compound, 4,4'-diamino-1,2-diphenylmethane, manufactured by Wako Pure Chemical Industries, Ltd.



・ Polymerizable amine compound, 4,4'-ethylendiline, manufactured by Tokyo Chemical Industry Co., Ltd.

<基板層>
將銅板用作設想為DCB基板時的材料,將鋁板用作設想為DBA基板時的材料。
・銅箔,古河電氣工業(股)製造,(商品名)FS-WS
・銅板:尺寸 4×4 cm,厚度 400 μm
・鋁板:尺寸 4×4 cm,厚度 400 μm
<Substrate layer>
A copper plate is used as a material when it is assumed to be a DCB substrate, and an aluminum plate is used as a material when it is assumed to be a DBA substrate.
・ Copper foil, manufactured by Furukawa Electric Industry Co., Ltd. (trade name) FS-WS
・ Copper plate: size 4 × 4 cm, thickness 400 μm
・ Aluminum plate: size 4 × 4 cm, thickness 400 μm

[實施例1]
・修飾填料製作步驟
將作為第一無機填料的氮化硼粒子(日本邁圖高新材料(Momentive Performance Materials Japan)(合)製造的帕拉姆(PolarTherm)PTX-25)10 g、作為第一矽烷偶合劑的捷恩智(JNC)(股)製造的塞拉艾斯(Sila-Ace)(註冊商標)S320 1 g加入至甲苯100 mL中,使用攪拌器以500 rpm攪拌1小時,將所獲得的混合物於40℃下乾燥4小時。進而,在溶媒乾燥後使用設定為120℃的真空乾燥機在真空條件下進行5小時加熱處理。所獲得的粒子為與第一矽烷偶合劑的一端鍵結的第一無機填料,將其設為修飾填料X。
使用氧化鋁粒子(日本輕金屬(股)製造的日輕金LS-210B)來代替所述PTX-25,並以相同的方式獲得的粒子為與第二矽烷偶合劑的一端鍵結的第二無機填料,將其設為修飾填料Y。
代替所述修飾填料X的矽烷偶合劑S320而將矽烷偶合劑(捷恩智(JNC)(股)製造的塞拉艾斯(Sila-Ace)(註冊商標)S510)2.5 g加入至純水125 g中,使用攪拌器以500 rpm攪拌15小時。繼而,將氮化硼粒子(日本邁圖高新材料(Momentive Performance Materials Japan)(合)製造的帕拉姆(PolarTherm)PTX-25)12.5 g投入至溶液中,使用攪拌器以500 rpm攪拌1小時,將所獲得的混合物於60℃下乾燥4小時。進而,在乾燥後使用設定為80℃的真空烘箱在真空條件下進行5小時加熱處理。所獲得的粒子為與第三矽烷偶合劑的一端鍵結的第三無機填料,將其設為修飾填料Z。
[Example 1]
・ Modified filler preparation step: 10 g of boron nitride particles (PolarTherm PTX-25 manufactured by Momentive Performance Materials Japan (KK)) as the first inorganic filler, as the first silane 1 g of Sila-Ace (registered trademark) S320 manufactured by JNC Co., Ltd. as a coupling agent was added to 100 mL of toluene, and the resulting mixture was stirred at 500 rpm for 1 hour using a stirrer. The mixture was dried at 40 ° C for 4 hours. Furthermore, after drying the solvent, a vacuum dryer set at 120 ° C. was used to perform heat treatment under vacuum for 5 hours. The obtained particles were the first inorganic filler bonded to one end of the first silane coupling agent, and this was referred to as a modified filler X.
Alumina particles (Nikkei Gold LS-210B manufactured by Nippon Light Metal Co., Ltd.) were used in place of the PTX-25, and the particles obtained in the same manner were the second inorganic bonded to one end of the second silane coupling agent The filler is referred to as a modified filler Y.
In place of the silane coupling agent S320 of the modified filler X, 2.5 g of a silane coupling agent (Sila-Ace (registered trademark) S510 manufactured by JNC) was added to 125 g of pure water The mixture was stirred at 500 rpm for 15 hours using a stirrer. Next, 12.5 g of boron nitride particles (PolarTherm PTX-25 manufactured by Momentive Performance Materials Japan Co., Ltd.) was put into the solution and stirred at 500 rpm for 1 hour using a stirrer The obtained mixture was dried at 60 ° C for 4 hours. Furthermore, after drying, it heat-processed for 5 hours under vacuum using the vacuum oven set to 80 degreeC. The obtained particles were a third inorganic filler bonded to one end of a third silane coupling agent, and this was set as a modified filler Z.

・散熱構件用組成物製作步驟
秤量修飾填料粒子X 0.9 g、修飾填料粒子Y 2 g、修飾填料粒子Z 0.1 g、作為第一2官能以上的聚合性化合物的捷恩智(JNC)(股)製造的化合物(1-11)0.6 g、作為第二2官能以上的聚合性化合物的4,4'-二胺基-1,2-二苯基甲烷 0.3 g,將該些於室溫下進行混合。所獲得的混合物為散熱構件用組成物。
・ Production steps for the composition for heat dissipation members Weigh modified filler particles X 0.9 g, modified filler particles Y 2 g, modified filler particles Z 0.1 g, and manufactured by JNC Corporation, which is a polymer compound of the first and second functionalities. 0.6 g of compound (1-11) and 0.3 g of 4,4'-diamino-1,2-diphenylmethane which is a second difunctional or more polymerizable compound, and these are mixed at room temperature . The obtained mixture was a composition for a heat radiation member.

・散熱構件(1)的製作
秤量散熱構件用組成物0.2 g,將其置於作為基材的鋁板(4 cm×4 cm× 400 μm)的大致下部(1.65 cm×4 cm),以僅與所載置部分重疊的方式放置同樣的鋁板而予以夾持,使用設定為150℃的壓縮成形機(東洋精機制作所(股)製造的小型測試壓機(mini test press)-10型小型加熱壓機)加壓至20 MPa為止,並將加熱狀態持續15分鐘,藉此進行配向處理與硬化。即,在使散熱構件用組成物在鋁板之間擴展時,因氮化硼粒子為板狀粒子,故以氮化硼粒子與鋁板平行的方式配向。另外,以鋁板/散熱構件用組成物的層/鋁板的積層體的厚度成為約1 mm的方式調整散熱構件用組成物的量。將所獲得的積層體設為散熱構件(1)。
・ Production of the heat-dissipating member (1) 0.2 g of the composition for the heat-dissipating member was weighed and placed on a substantially lower portion (1.65 cm × 4 cm) of an aluminum plate (4 cm × 4 cm × 400 μm) as a base material, so that only The same aluminum plates were placed and held in an overlapping manner so that they were clamped, and a compression molding machine set at 150 ° C (a mini test press) (type 10 mini heating press manufactured by Toyo Seiki Seisakusho Co., Ltd.) was used. Machine) pressurize to 20 MPa, and continue heating for 15 minutes to perform alignment treatment and hardening. That is, when the composition for a heat radiating member is expanded between aluminum plates, since the boron nitride particles are plate-like particles, the boron nitride particles are aligned parallel to the aluminum plate. In addition, the amount of the composition for a heat-dissipating member was adjusted so that the thickness of the layer of the aluminum plate / the composition for a heat-dissipating member / the laminated body of the aluminum plate became about 1 mm. The obtained laminated body was made into a heat radiation member (1).

・散熱構件(2)的製作
秤量散熱構件用組成物0.1 g,將其置於作為基材的銅箔(5 cm×5 cm× 35 μm)上,以重疊的方式放置同樣的銅箔而予以夾持,使用設定為150℃的壓縮成形機(東洋精機制作所(股)製造的小型測試壓機(mini test press)-10型小型加熱壓機)加壓至20 MPa為止,並將加熱狀態持續15分鐘,藉此進行配向處理與硬化。即,在使散熱構件用組成物在銅箔之間擴展時,因氮化硼粒子為板狀粒子,故以氮化硼粒子與銅箔平行的方式配向。另外,以銅箔/散熱構件用組成物的層/銅箔的積層體的厚度成為約300 μm的方式調整散熱構件用組成物的量。將所獲得的積層體設為散熱構件(2)。
・ Production of the heat-dissipating member (2) 0.1 g of the composition for the heat-dissipating member was weighed, placed on a copper foil (5 cm × 5 cm × 35 μm) as a base material, and the same copper foil was placed in an overlapping manner. Clamp, press to a temperature of 20 MPa using a compression molding machine (mini test press-10 small heating press manufactured by Toyo Seiki Seisakusho Co., Ltd.) set to 150 ° C, and heat it up For 15 minutes, alignment treatment and hardening are performed. That is, when the composition for a heat radiation member is expanded between copper foils, since the boron nitride particles are plate-like particles, the boron nitride particles are aligned parallel to the copper foil. In addition, the amount of the composition for a heat-dissipating member was adjusted so that the thickness of the layer of the copper foil / composition for a heat-dissipating member / layer of the copper foil became approximately 300 μm. The obtained laminated body was made into a heat radiation member (2).

<接著構件的洩漏程度評價(洩漏率)>
一般而言,於使用聚合性化合物等樹脂成分與無機填料的混合物而於加壓狀態下進行接著的情況下,無機填料成分殘留於被接著體之間而引起多餘的樹脂成分漏出至周邊的問題。然而,藉由採用如本發明的圖1的結構,可解決該樹脂成分與無機填料分離的問題。相反地,認為所漏出的樹脂成分少的情況是由圖1的結構所達成的。
如以下般對接著構件的洩漏程度進行了確認。
在散熱構件(1)中,算出將如圖6所示般漏出的面積除以應接著的面積而得的數值乘以100所得的值來作為洩漏率。
<剝離強度測定>
如下般進行拉伸試驗,並對剝離強度進行了確認。
在散熱構件(1)中,以如圖4、圖5所示般上下夾持2塊鋁板的未接著的部位的方式,使用拉伸試驗測定機(島津製作所製造的AGS-X方拉伸試驗機),以5 mm/min的速度進行拉伸,測定斷裂時的張力。在未斷裂的情況下,設為檢測極限(1000 N)以上。
<熱擴散率的測定>
使用散熱構件(2),藉由ai相(ai-phase)(股)製造的ai相移動(ai-Phase Mobile)1u熱擴散率裝置來測定熱擴散率。
< Evaluation of leakage degree of subsequent members (leak rate) >
Generally, when a mixture is applied under pressure using a mixture of a resin component such as a polymerizable compound and an inorganic filler, the inorganic filler component remains between the adherends, causing an excessive resin component to leak out to the periphery. . However, by adopting the structure of FIG. 1 of the present invention, the problem of separation of the resin component from the inorganic filler can be solved. On the contrary, it is considered that the case where there is little resin component leaked is achieved by the structure of FIG. 1.
The degree of leakage of the adhering member was confirmed as follows.
In the heat radiating member (1), a value obtained by dividing the area leaked out as shown in FIG. 6 by the area to be followed multiplied by 100 was calculated as the leakage rate.
< Measurement of peeling strength >
The tensile test was performed as follows, and the peeling strength was confirmed.
In the heat dissipation member (1), as shown in Figs. 4 and 5, two unattached portions of the aluminum plate were clamped up and down using a tensile tester (AGS-X square tensile test manufactured by Shimadzu Corporation). Machine), stretched at a speed of 5 mm / min, and measured the tension at break. If it is not broken, the detection limit (1000 N) or more.
<Measurement of thermal diffusivity>
The heat diffusivity was measured using a heat dissipating member (2) by an ai-phase mobile 1u thermal diffusivity device manufactured by ai-phase (strand).

[實施例2]
代替4,4'-二胺基-1,2-二苯基甲烷而將4,4'-伸乙基二苯胺用作第二2官能以上的聚合性化合物。除此以外,以與實施例1相同的方式進行製作、評價。
[Example 2]
Instead of 4,4'-diamino-1,2-diphenylmethane, 4,4'-ethylidene diphenylamine is used as the second difunctional or more polymerizable compound. Except for this, production and evaluation were performed in the same manner as in Example 1.

[實施例3]
代替日輕金LS-210B而將日輕金LS-243用作第二無機填料。除此以外,以與實施例1相同的方式進行製作、評價。
[Example 3]
Instead of Nikkei Gold LS-210B, Nikkei Gold LS-243 was used as the second inorganic filler. Except for this, production and evaluation were performed in the same manner as in Example 1.

[實施例4]
代替4,4'-二胺基-1,2-二苯基甲烷而將4,4'-伸乙基二苯胺用作第二2官能以上的聚合性化合物。除此以外,以與實施例3相同的方式進行製作、評價。
[Example 4]
Instead of 4,4'-diamino-1,2-diphenylmethane, 4,4'-ethylidene diphenylamine is used as the second difunctional or more polymerizable compound. Except for this, production and evaluation were performed in the same manner as in Example 3.

[實施例5]
代替日輕金LS-210B而將日輕金LS-711C用作第二無機填料。除此以外,以與實施例1相同的方式進行製作、評價。
[Example 5]
Instead of Nikkei Gold LS-210B, Nikkei Gold LS-711C was used as the second inorganic filler. Except for this, production and evaluation were performed in the same manner as in Example 1.

[實施例6]
代替4,4'-二胺基-1,2-二苯基甲烷而將4,4'-伸乙基二苯胺用作第二2官能以上的聚合性化合物。除此以外,以與實施例5相同的方式進行製作、評價。
[Example 6]
Instead of 4,4'-diamino-1,2-diphenylmethane, 4,4'-ethylidene diphenylamine is used as the second difunctional or more polymerizable compound. Except for this, production and evaluation were performed in the same manner as in Example 5.

[實施例7]
代替日輕金LS-210B而將日輕朗德姆(Nikkei Rundum)V325F用作第二無機填料。除此以外,以與實施例1相同的方式進行製作、評價。
[Example 7]
Instead of Nikkei Gold LS-210B, Nikkei Rundum V325F was used as the second inorganic filler. Except for this, production and evaluation were performed in the same manner as in Example 1.

[實施例8]
代替4,4'-二胺基-1,2-二苯基甲烷而將4,4'-伸乙基二苯胺用作第二2官能以上的聚合性化合物。除此以外,以與實施例7相同的方式進行製作、評價。
[Example 8]
Instead of 4,4'-diamino-1,2-diphenylmethane, 4,4'-ethylidene diphenylamine is used as the second difunctional or more polymerizable compound. Except for this, production and evaluation were performed in the same manner as in Example 7.

[實施例9]
代替日輕金LS-210B而使用多面體氧化鋁CT50。除此以外,以與實施例1相同的方式進行製作、評價。
[Example 9]
Polyhedron alumina CT50 was used instead of Nikkei Gold LS-210B. Except for this, production and evaluation were performed in the same manner as in Example 1.

[實施例10]
代替4,4'-二胺基-1,2-二苯基甲烷而將4,4'-伸乙基二苯胺用作第二2官能以上的聚合性化合物。除此以外,以與實施例9相同的方式進行製作、評價。
[Example 10]
Instead of 4,4'-diamino-1,2-diphenylmethane, 4,4'-ethylidene diphenylamine is used as the second difunctional or more polymerizable compound. Except for this, production and evaluation were performed in the same manner as in Example 9.

[實施例11]
代替日輕金LS-210B而使用DAW-20。除此以外,以與實施例1相同的方式進行製作、評價。
[Example 11]
Use DAW-20 instead of Nikkei Gold LS-210B. Except for this, production and evaluation were performed in the same manner as in Example 1.

[實施例12]
代替4,4'-二胺基-1,2-二苯基甲烷而將4,4'-伸乙基二苯胺用作第二2官能以上的聚合性化合物。除此以外,以與實施例11相同的方式進行製作、評價。
[Example 12]
Instead of 4,4'-diamino-1,2-diphenylmethane, 4,4'-ethylidene diphenylamine is used as the second difunctional or more polymerizable compound. Except for this, production and evaluation were performed in the same manner as in Example 11.

[比較例1]
代替捷恩智(股)製造的化合物(1-11)而使用埃皮考特(Epikote)jER807。除此以外,以與實施例11相同的方式進行製作、評價。
[Comparative Example 1]
Epikote jER807 was used in place of the compound (1-11) manufactured by Genesis. Except for this, production and evaluation were performed in the same manner as in Example 11.

將實施例、比較例的評價結果示於表1。
另外,將實施例、比較例的散熱構件用組成物的組成示於表2。
The evaluation results of the examples and comparative examples are shown in Table 1.
Moreover, the composition of the composition for heat radiation members of an Example and a comparative example is shown in Table 2.

[表1]


[Table 1]


[表2]

[Table 2]

如所述表1所示,在將捷恩智(股)製造的化合物(1-11)用作第一2官能以上的聚合性化合物的情況下,與作為基板層的金屬層的密接性高,散熱構件用組成物的洩漏亦少,垂直方向上的熱擴散率成為高值。尤其當使用具有胺基的4,4'-伸乙基二苯胺時的密接性良好。
與此相比,使用作為聚合性氧雜環丙基化合物的埃皮考特(Epikote)jER807來作為第一2官能以上的聚合性化合物者中,散熱構件用組成物的洩漏明顯,且嚴重受此影響,與作為基板層的金屬層的密接性不良,同時熱擴散率亦低。
As shown in Table 1 above, when the compound (1-11) manufactured by Genesis Corporation is used as the first difunctional polymerizable compound, the adhesiveness with the metal layer as the substrate layer is high. Leakage of the composition for a heat radiating member is also small, and the thermal diffusivity in a vertical direction becomes a high value. In particular, when 4,4'-ethylenediphenylamine having an amine group is used, the adhesiveness is good.
In contrast, in the case of using Epikote jER807, which is a polymerizable oxetanyl compound, as the first di- or more functional polymerizable compound, leakage of the composition for a heat-dissipating member is significant and severely affected. This affects poor adhesion to the metal layer as the substrate layer, and also has a low thermal diffusivity.

1‧‧‧基板1‧‧‧ substrate

10‧‧‧無機填料 10‧‧‧ inorganic filler

11‧‧‧第一無機填料/氮化硼 11‧‧‧The first inorganic filler / boron nitride

12‧‧‧第二無機填料 12‧‧‧Second inorganic filler

13‧‧‧第三無機填料 13‧‧‧Third inorganic filler

21‧‧‧第一矽烷偶合劑/第一偶合劑/矽烷偶合劑 21‧‧‧first silane coupling agent / first coupling agent / silane coupling agent

22‧‧‧第二矽烷偶合劑/第二偶合劑/矽烷偶合劑 22‧‧‧Second Silane Coupling Agent / Second Coupling Agent / Silane Coupling Agent

23‧‧‧第三矽烷偶合劑 23‧‧‧Third Silane Coupling Agent

31‧‧‧第一2官能以上的聚合性化合物 31‧‧‧The first two-functional polymerizable compound

32‧‧‧第二2官能以上的聚合性化合物 32‧‧‧Second bi-functional polymerizable compound

41‧‧‧上方的金屬板 41‧‧‧ metal plate above

42‧‧‧散熱構件用組成物 42‧‧‧Composition for heat dissipation member

43‧‧‧下方的金屬板 43‧‧‧ metal plate below

51‧‧‧貼合面 51‧‧‧ Fitting surface

52‧‧‧自貼合面漏出的散熱構件用組成物 52‧‧‧Composition for heat dissipation member leaking from bonding surface

61‧‧‧應接著的面積 61‧‧‧ Area to be continued

62‧‧‧漏出的面積 62‧‧‧ Leaked Area

圖1是表示與第一偶合劑21的一端鍵結的無機填料10經由第一2官能以上的聚合性化合物31而與基板1鍵結的情況的概念圖。FIG. 1 is a conceptual diagram showing a state in which the inorganic filler 10 bonded to one end of the first coupling agent 21 is bonded to the substrate 1 via the first bifunctional or higher polymerizable compound 31.

圖2是表示與第二偶合劑22的一端鍵結的無機填料10經由第一2官能以上的聚合性化合物31及第二2官能以上的聚合性化合物32、進而經由第一2官能以上的聚合性化合物31而與基板1鍵結的情況的概念圖。 FIG. 2 shows that the inorganic filler 10 bonded to one end of the second coupling agent 22 is polymerized via the first bifunctional or higher polymerizable compound 31 and the second bifunctional or higher polymerizable compound 32, and is further polymerized via the first or second functional group. Conceptual view of the case where the chemical compound 31 is bonded to the substrate 1.

圖3是表示以下情況的概念圖:藉由散熱構件用組成物的硬化處理,與第一偶合劑21的一端鍵結的第一無機填料11和與第二矽烷偶合劑22的一端鍵結的第二無機填料12經由第一2官能以上的聚合性化合物31及/或第二2官能以上的聚合性化合物32而鍵結,且第二無機填料12與基板1和與第二矽烷偶合劑22的一端鍵結的第二2官能以上的聚合性化合物31鍵結,進而經由第一2官能以上的聚合性化合物31及第二2官能以上的聚合性化合物32、及第一2官能以上的聚合性化合物31而鍵結的情況;另外,與第一矽烷偶合劑21的一端鍵結的第一無機填料11、和與第三矽烷偶合23的一端鍵結的第三無機填料13,是由第一矽烷偶合劑21的另一端與第三矽烷偶合劑23的另一端鍵結,且經由與鍵結於第三無機填料11的第三矽烷偶合劑23鍵結的第二2官能以上的聚合性化合物32及第一2官能以上的聚合性化合物31而與基板1鍵結的情況。 FIG. 3 is a conceptual diagram showing a case where the first inorganic filler 11 bonded to one end of the first coupling agent 21 and the one end bonded to the second silane coupling agent 22 are hardened by the hardening treatment of the composition for a heat sink member. The second inorganic filler 12 is bonded via the first bi-functional polymerizable compound 31 and / or the second bi-functional polymerizable compound 32, and the second inorganic filler 12 is bonded to the substrate 1 and the second silane coupling agent 22 The second bi- or more-functional polymerizable compound 31 bonded at one end is further bonded through the first bi- or more-functional polymerizable compound 31, the second bi- or more-functional polymerizable compound 32, and the first bi- or more-functional polymerizable compound. The first inorganic filler 11 bonded to one end of the first silane coupling agent 21 and the third inorganic filler 13 bonded to one end of the third silane coupling 23 are The other end of the one silane coupling agent 21 is bonded to the other end of the third silane coupling agent 23 and is polymerizable through the second difunctionality through the third silane coupling agent 23 bonded to the third inorganic filler 11. Compound 32 and the first difunctional polyfunctional Compound 31 and the substrate 1 is bonded to the case.

圖4是表示拉伸試驗及洩漏率測定中所使用的試驗構件的圖。 FIG. 4 is a diagram showing a test member used in a tensile test and a leak rate measurement.

圖5是表示拉伸試驗及洩漏率測定中所使用的試驗構件的剖面的圖。 FIG. 5 is a view showing a cross section of a test member used in a tensile test and a leak rate measurement.

圖6是表示洩漏率測定中所使用的試驗構件的上表面的圖。 FIG. 6 is a diagram showing an upper surface of a test member used in the leak rate measurement.

Claims (12)

一種散熱構件用組成物,含有:與第一矽烷偶合劑的一端鍵結的第一無機填料、與第二矽烷偶合劑的一端鍵結的第二無機填料、與第三矽烷偶合的一端鍵結的第三無機填料、第一2官能以上的聚合性化合物、及第二2官能以上的聚合性化合物,所述散熱構件用組成物中, 相對於所述第一2官能以上的聚合性化合物及所述第二2官能以上的聚合性化合物的總量100重量份的、所述第一無機填料、所述第二無機填料、及所述第三無機填料的合計量的比率為300重量份~600重量份。A composition for a heat dissipation member, comprising: a first inorganic filler bonded to one end of a first silane coupling agent; a second inorganic filler bonded to one end of a second silane coupling agent; and one end bonded to a third silane coupling agent. The third inorganic filler, the first di- or more-functional polymerizable compound, and the second di- or more-functional polymerizable compound, in the composition for a heat dissipation member, The first inorganic filler, the second inorganic filler, and the 100% by weight of the total amount of the first bifunctional or more polymerizable compound and the second bifunctional or more polymerizable compound The ratio of the total amount of the third inorganic filler is 300 parts by weight to 600 parts by weight. 如申請專利範圍第1項所述的散熱構件用組成物,其中所述第一無機填料與所述第二無機填料利用各自所鍵結的矽烷偶合劑的另一端、及選自所述第一2官能以上的聚合性化合物及第二2官能以上的聚合性化合物中的至少一者而鍵結。The composition for a heat-dissipating member according to item 1 of the scope of patent application, wherein the first inorganic filler and the second inorganic filler use the other end of the silane coupling agent bonded to each other, and are selected from the first At least one of the bifunctional or more polymerizable compound and the second bifunctional or more polymerizable compound are bonded. 如申請專利範圍第1項或第2項所述的散熱構件用組成物,其中 所述第一2官能以上的聚合性化合物或第二2官能以上的聚合性化合物包含選自由下述式(1-1)及下述式(1-2)所表示的聚合性液晶化合物所組成的群組中的至少兩種, Ra -Z-(A-Z)m -Ra (1-1) 所述式(1-1)中, Ra 分別獨立地為能夠與矽烷偶合劑的另一端的官能基鍵結的官能基, A分別獨立地為1,4-伸環己基、1,4-伸環己烯基、1,4-伸苯基、萘-2,6-二基、四氫萘-2,6-二基、茀-2,7-二基、雙環[2.2.2]辛-1,4-二基、或雙環[3.1.0]己-3,6-二基, 該些環中,任意的-CH2 -可由-O-取代,任意的-CH=可由-N=取代,任意的氫可由鹵素、碳數1~10的烷基、或碳數1~10的鹵化烷基取代, 所述烷基中,任意的-CH2 -可由-O-、-CO-、-COO-、-OCO-、-CH=CH-、或-C≡C-取代, Z分別獨立地為單鍵、或碳數1~20的伸烷基, 所述伸烷基中,任意的-CH2 -可由-O-、-S-、-CO-、-COO-、-OCO-、-CH=CH-、-CF=CF-、-CH=N-、-N=CH-、-N=N-、-N(O)=N-、或-C≡C-取代,任意的氫可由鹵素取代, m為1~6的整數, J-Xn -J (1-2) 所述式(1-2)中, J分別獨立地為能夠與所述式(1-1)的另一端的官能基鍵結的官能基, X分別獨立地為1,4-伸環己基、1,4-伸環己烯基、1,4-伸苯基、萘-2,6-二基、四氫萘-2,6-二基、茀-2,7-二基、雙環[2.2.2]辛-1,4-二基、或雙環[3.1.0]己-3,6-二基, 該些環中,任意的-CH2 -可由-O-取代,任意的-CH=可由-N=取代,任意的氫可由鹵素、碳數1~10的烷基、或碳數1~10的鹵化烷基取代, 所述烷基中,任意的-CH2 -可由-O-、-CO-、-COO-、-OCO-、-CH=CH-、或-C≡C-取代, n為1~6的整數。The composition for a heat dissipating member according to item 1 or 2 of the scope of the patent application, wherein the first or second functional polymerizable compound or the second or more functional polymerizable compound contains a compound selected from the following formula (1 -1) and at least two of the group consisting of the polymerizable liquid crystal compound represented by the following formula (1-2): R a -Z- (AZ) m -R a (1-1) In (1-1), R a is independently a functional group capable of being bonded to a functional group at the other end of the silane coupling agent, and A is independently 1,4-cyclohexyl and 1,4-cyclohexyl Alkenyl, 1,4-phenylene, naphthalene-2,6-diyl, tetrahydronaphthalene-2,6-diyl, fluorene-2,7-diyl, bicyclo [2.2.2] octane-1, 4-diyl or bicyclic [3.1.0] hex-3,6-diyl, in these rings, any -CH 2 -may be substituted by -O-, any -CH = may be substituted by -N =, any Hydrogen may be substituted by halogen, an alkyl group having 1 to 10 carbon atoms, or a halogenated alkyl group having 1 to 10 carbon atoms. In the alkyl group, any -CH 2 -may be -O-, -CO-, -COO- , -OCO-, -CH = CH-, or -C≡C-, Z is independently a single bond or an alkylene group having 1 to 20 carbon atoms. Among the alkylene groups, any -CH 2 -Can be -O-, -S-, -CO-, -COO-, -OCO-, -CH = CH-, -CF = CF-, -CH = N-, -N = CH-,- N = N-, -N (O) = N-, or -C≡C- substitution, arbitrary hydrogen may be substituted by halogen, m is an integer of 1 to 6, JX n -J (1-2), the formula ( In 1-2), J is each independently a functional group capable of bonding to the functional group at the other end of the formula (1-1), and X is each independently 1,4-cyclohexyl, 1,4- Cyclohexenyl, 1,4-phenylene, naphthalene-2,6-diyl, tetrahydronaphthalene-2,6-diyl, fluorene-2,7-diyl, bicyclo [2.2.2] octyl -1,4-diyl, or bicyclic [3.1.0] hex-3,6-diyl, in these rings, any -CH 2 -may be substituted by -O-, any -CH = may be -N = Substituting, arbitrary hydrogen may be substituted by halogen, alkyl group having 1 to 10 carbon atoms, or halogenated alkyl group having 1 to 10 carbon atoms. In the alkyl group, any -CH 2 -may be -O-, -CO-, -COO-, -OCO-, -CH = CH-, or -C≡C-, and n is an integer of 1 to 6. 如申請專利範圍第3項所述的散熱構件用組成物,其中 所述式(1-1)中,Z為單鍵、-(CH2 )a -、-O(CH2 )a -、-(CH2 )a O-、-O(CH2 )a O-、-CH=CH-、-C≡C-、-COO-、-OCO-、-CH=CH-COO-、-OCO-CH=CH-、-CH2 CH2 -COO-、-OCO-CH2 CH2 -、-CH=N-、-N=CH-、-N=N-、-OCF2 -、或-CF2 O-,所述a為1~20的整數。The composition for a heat radiating member according to item 3 of the scope of patent application, wherein in the formula (1-1), Z is a single bond,-(CH 2 ) a- , -O (CH 2 ) a -,- (CH 2 ) a O-, -O (CH 2 ) a O-, -CH = CH-, -C≡C-, -COO-, -OCO-, -CH = CH-COO-, -OCO-CH = CH-, -CH 2 CH 2 -COO-, -OCO-CH 2 CH 2- , -CH = N-, -N = CH-, -N = N-, -OCF 2- , or -CF 2 O -, Said a is an integer of 1-20. 如申請專利範圍第3項或第4項所述的散熱構件用組成物,其中所述式(1-1)中,Ra 分別獨立地為下述式(2-1)~式(2-4)的任一者所表示的聚合性基, 所述式(2-1)~式(2-2)中,Rb 為氫、鹵素、-CF3 、碳數1~5的烷基,q為0或1; 所述式(2-3)~式(2-4)中,Rc 為1,4-伸環己基、1,4-伸環己烯基、1,4-伸苯基、萘-2,6-二基、四氫萘-2,6-二基、茀-2,7-二基、雙環[2.2.2]辛-1,4-二基、或雙環[3.1.0]己-3,6-二基, 該些環中,任意的-CH2 -可由-O-取代,任意的-CH=可由-N=取代,任意的氫可由鹵素、碳數1~10的烷基、或碳數1~10的鹵化烷基取代, 所述烷基中,任意的-CH2 -可由-O-、-CO-、-COO-、-OCO-、-CH=CH-、或-C≡C-取代; Rd 分別獨立地為氫、鹵素、或碳數1~5的烷基。The composition for a heat dissipation member according to item 3 or 4 of the scope of patent application, wherein in the formula (1-1), R a is independently the following formula (2-1) to formula (2- 4) the polymerizable group represented by any one, In the formulae (2-1) to (2-2), R b is hydrogen, halogen, -CF 3 , an alkyl group having 1 to 5 carbon atoms, and q is 0 or 1; ) To formula (2-4), R c is 1,4-cyclohexyl, 1,4-cyclohexenyl, 1,4-phenyl, naphthalene-2,6-diyl, tetrahydro Naphthalene-2,6-diyl, fluorene-2,7-diyl, bicyclic [2.2.2] octane-1,4-diyl, or bicyclic [3.1.0] hex-3,6-diyl, the In these rings, any -CH 2 -may be substituted by -O-, any -CH = may be substituted by -N =, and any hydrogen may be halogenated, alkyl group having 1 to 10 carbon atoms, or halogenation having 1 to 10 carbon atoms. Alkyl substitution, in the alkyl, any -CH 2 -may be substituted by -O-, -CO-, -COO-, -OCO-, -CH = CH-, or -C≡C-; R d respectively It is independently hydrogen, halogen, or an alkyl group having 1 to 5 carbon atoms. 如申請專利範圍第1項至第5項中任一項所述的散熱構件用組成物,其中 所述第一無機填料為氮化物、碳材料、矽酸鹽化物、或金屬氧化物,所述第二無機填料為金屬氧化物,所述第三無機填料與所述第一無機填料相同。The composition for a heat dissipation member according to any one of claims 1 to 5 in the scope of patent application, wherein The first inorganic filler is a nitride, a carbon material, a silicate, or a metal oxide, the second inorganic filler is a metal oxide, and the third inorganic filler is the same as the first inorganic filler. 如申請專利範圍第6項所述的散熱構件用組成物,其中 所述第一無機填料為選自氮化硼、氮化鋁、碳化硼、硼碳氮、石墨、碳纖維、碳奈米管、氧化鋁、及堇青石中的至少一者,所述第二無機填料為選自氧化鋁、金屬氮化物、氧化鋅、氧化鋯、及氧化鈦中的至少一者。The composition for a heat dissipation member according to item 6 of the scope of patent application, wherein The first inorganic filler is at least one selected from the group consisting of boron nitride, aluminum nitride, boron carbide, boron carbonitride, graphite, carbon fiber, carbon nanotube, alumina, and cordierite, and the second inorganic filler The filler is at least one selected from the group consisting of aluminum oxide, metal nitride, zinc oxide, zirconia, and titanium oxide. 如申請專利範圍第1項至第7項中任一項所述的散熱構件用組成物,其中所述第一無機填料的矽烷偶合劑的修飾率為0.1重量%以上。The composition for a heat dissipating member according to any one of claims 1 to 7, wherein a modification rate of the silane coupling agent of the first inorganic filler is 0.1% by weight or more. 如申請專利範圍第1項至第8項中任一項所述的散熱構件用組成物, 其更包含所述第一無機填料及所述第二無機填料所未鍵結的聚合性化合物。The composition for a heat dissipation member according to any one of claims 1 to 8 of the scope of patent application, It further includes a polymerizable compound that is not bonded by the first inorganic filler and the second inorganic filler. 一種散熱構件,其包含如申請專利範圍第1項至第9項中任一項所述的散熱構件用組成物的硬化物以及基板層。A heat radiating member comprising the hardened body of the composition for a heat radiating member according to any one of claims 1 to 9 and a substrate layer. 一種電子機器,其包括: 如申請專利範圍第10項所述的散熱構件;以及 具有發熱部的電子器件, 所述散熱構件是以與所述發熱部接觸的方式配置於所述電子器件中。An electronic machine including: A heat dissipation member as described in item 10 of the scope of patent application; and Electronic device with heating part, The heat radiating member is disposed in the electronic device in contact with the heat generating portion. 一種散熱構件用組成物的製造方法,其包括: 使第一無機填料與第一矽烷偶合劑的一端鍵結的步驟; 使第二無機填料與第二矽烷偶合劑的一端鍵結的步驟; 使第三無機填料與第三矽烷偶合劑的一端鍵結的步驟; 使散熱構件用組成物含有與第一矽烷偶合劑的一端鍵結的第一無機填料、與第二矽烷偶合劑的一端鍵結的第二無機填料、及與第三矽烷偶合的一端鍵結的第三無機填料的步驟;以及 使所述矽烷偶合劑各自的另一端與2官能以上的聚合性化合物鍵結的步驟。A manufacturing method of a composition for a heat dissipation member includes: A step of bonding the first inorganic filler to one end of the first silane coupling agent; A step of bonding the second inorganic filler to one end of the second silane coupling agent; A step of bonding the third inorganic filler to one end of the third silane coupling agent; The composition for a heat-dissipating member contains a first inorganic filler bonded to one end of a first silane coupling agent, a second inorganic filler bonded to one end of a second silane coupling agent, and a A step of a third inorganic filler; and A step of bonding the other end of each of the silane coupling agents to a bifunctional or more functional polymerizable compound.
TW108100483A 2018-01-12 2019-01-07 Composition for heat-dissipation member, heat-dissipation member, electronic apparatus, and production method for heat-dissipation member TW201934653A (en)

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