TW201842151A - Resin composition for heat dissipation member, heat dissipation member, electronic device, manufacturing method of the heat dissipation member - Google Patents

Resin composition for heat dissipation member, heat dissipation member, electronic device, manufacturing method of the heat dissipation member Download PDF

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TW201842151A
TW201842151A TW107111173A TW107111173A TW201842151A TW 201842151 A TW201842151 A TW 201842151A TW 107111173 A TW107111173 A TW 107111173A TW 107111173 A TW107111173 A TW 107111173A TW 201842151 A TW201842151 A TW 201842151A
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inorganic filler
coupling agent
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heat
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氏家研人
藤原武
國信隆史
滝沢和宏
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日商捷恩智股份有限公司
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    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C09K5/00Heat-transfer, heat-exchange or heat-storage materials, e.g. refrigerants; Materials for the production of heat or cold by chemical reactions other than by combustion
    • C09K5/08Materials not undergoing a change of physical state when used
    • C09K5/14Solid materials, e.g. powdery or granular
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K7/00Constructional details common to different types of electric apparatus
    • H05K7/20Modifications to facilitate cooling, ventilating, or heating

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Abstract

The present invention is a composition which is capable of forming a heat dissipation member that has high thermal conductivity and high heat resistance, while being able to be controlled with respect to the thermal expansion coefficient. A composition for heat dissipation members according to the present invention contains: a heat conductive first inorganic filler 1 which is bonded to one end of a first coupling agent; and a heat conductive second inorganic filler 2 which is bonded to one end of a second coupling agent, with the other end of the second coupling agent being bonded with a bi- or higher functional polymerizable compound 22. The bi- or higher functional polymerizable compound is a non-liquid crystalline compound; and at least one functional group of the polymerizable compound is able to be bonded to the other end of the first coupling agent.

Description

放熱構件用組成物、放熱構件、電子機器、放熱構件的製造方法Composition for heat radiation member, heat radiation member, electronic device, and manufacturing method of heat radiation member

本發明是有關於一種放熱構件用組成物。特別是有關於一種可形成藉由效率良好地傳導、傳遞電子機器內部產生的熱而放熱,且可控制熱膨脹率的放熱構件的放熱構件用組成物。The present invention relates to a composition for a heat radiation member. In particular, the present invention relates to a composition for a heat radiation member that can form a heat radiation member that can efficiently dissipate heat by conducting and transmitting heat generated inside an electronic device and can control the thermal expansion coefficient.

近年來,於混合動力汽車(hybrid vehicle)或電動汽車(electric automobile)等電力控制用的半導體元件、或高速電腦(high speed computer)用的中央處理單元(central processing unit,CPU)等中,為了不使內部的半導體的溫度變得過高,而期望封裝(package)材料的高導熱化。即,使自半導體晶片(semiconductor chip)產生的熱有效地釋放出至外部的能力變得重要。另外,藉由動作溫度的上昇,因用於封裝內的材料間的熱膨脹率的差而產生熱應變,由配線的剝離等引起的壽命的降低成為問題。In recent years, in semiconductor devices for power control such as hybrid vehicles or electric automobiles, or central processing units (CPUs) for high speed computers, etc., A high thermal conductivity of the package material is desired without increasing the temperature of the semiconductor inside. That is, the ability to efficiently release heat generated from a semiconductor chip to the outside becomes important. In addition, as the operating temperature increases, thermal strain occurs due to a difference in thermal expansion coefficient between materials used in the package, and a reduction in life due to peeling of the wiring or the like becomes a problem.

作為解決此種放熱問題的方法,可列舉使高導熱性材料(放熱構件)與發熱部位接觸並將熱導出至外部而進行放熱的方法。專利文獻1中揭示有一種放熱構件,其為使有機材料與無機材料複合化而成的放熱構件,且利用偶合劑與聚合性液晶化合物將無機材料間相連(段落0007、圖1、圖2)。藉由利用偶合劑與聚合性液晶化合物相連,可極其提高無機材料間的導熱性。 [現有技術文獻] [專利文獻]As a method of solving such a heat radiation problem, the method of contacting a highly thermally-conductive material (heat radiation member) with a heat-generating part, and taking out heat to the outside can be mentioned. Patent Literature 1 discloses a heat-radiating member which is a heat-radiating member obtained by compounding an organic material and an inorganic material, and which connects the inorganic materials with a coupling agent and a polymerizable liquid crystal compound (paragraph 0007, FIG. 1, and FIG. 2). . By coupling the polymerizable liquid crystal compound with a coupling agent, the thermal conductivity between the inorganic materials can be extremely improved. [Prior Art Literature] [Patent Literature]

[專利文獻1]國際公開第2016/031888號[Patent Document 1] International Publication No. 2016/031888

[發明所欲解決之課題] 然而,液晶化合物具有大量的反應部位,且容易受到熱的影響。 因此,本發明的課題在於提供一種可形成具有高導熱性且可控制熱膨脹率、進而具有高耐熱性的放熱構件的組成物及放熱構件。 [解決課題之手段][Problems to be Solved by the Invention] However, liquid crystal compounds have a large number of reaction sites and are easily affected by heat. Therefore, an object of the present invention is to provide a composition and a heat radiation member that can form a heat radiation member that has high thermal conductivity, can control the thermal expansion coefficient, and further has high heat resistance. [Means for solving problems]

本發明者等人發現若於放熱構件用組成物中使用聚合性化合物及偶合劑中的具有特定結構者,則具有高導熱性,且可控制熱膨脹率,進而可提高耐熱性,從而完成了本發明。The present inventors have found that if a polymer having a specific structure among polymerizable compounds and coupling agents is used in a composition for a heat release member, the polymer has high thermal conductivity, can control the thermal expansion rate, and can further improve heat resistance. invention.

本發明的第1態樣的放熱構件用組成物例如如圖2所示,包含:與第1偶合劑11的一端鍵結的導熱性的第1無機填料1;以及為與第2偶合劑12的一端鍵結的導熱性的第2無機填料2且於所述第2偶合劑12的另一端進而鍵結有二官能以上的聚合性化合物22的第2無機填料,並且所述第2偶合劑12鍵結有下述式(1-1)所表示的聚合性化合物作為所述二官能以上的聚合性化合物22,所述聚合性化合物22為非液晶性化合物,所述聚合性化合物22所具有的官能基的至少一者可與所述第1偶合劑11的另一端鍵結。 Ra -R6 -O-(Rx)n -O-R11 -Ra (1-1) 所述式(1-1)中, Ra 分別為下述式(2-1)~式(2-2)、胺基、乙烯基、羧酸酐殘基、或包含該些結構的任一聚合性基; Rx為下述式(2-3)~式(2-6)的任一者; n為1~3的整數; R6 、R11 分別獨立地為單鍵、或碳數1~20的伸烷基。 [化1]式(2-1)~式(2-2)中,Rb 為氫、鹵素、-CF3 、或碳數1~5的烷基,q為0或1。 [化2]式(2-4)~式(2-6)中,R7 ~R10 分別獨立地為氫、或碳數1~20的伸烷基。 所謂「一端」及「另一端」,只要為分子形狀的邊緣或端部即可,可為分子的長邊的兩端亦可不為分子的長邊的兩端。 若如此構成,則可經由偶合劑及聚合性化合物而使無機填料彼此直接鍵結而形成放熱構件。因此,可直接傳播作為導熱的主要要素的聲子(phonon),硬化後的放熱構件不僅於水平方向而且於厚度方向亦可具有極高的導熱性。進而,聚合性化合物的結構的反應部位少,且不易受到熱的影響,因此放熱構件可具有高耐熱性。As shown in FIG. 2, the composition for a heat radiation member according to the first aspect of the present invention includes, for example, a first inorganic filler 1 having thermal conductivity bonded to one end of the first coupling agent 11, and a second coupling agent 12. A second thermally conductive second inorganic filler 2 bonded to one end thereof, and a second inorganic filler having a difunctional or more functional polymerizable compound 22 bonded to the other end of the second coupling agent 12, and the second coupling agent A polymerizable compound represented by the following formula (1-1) is bonded to 12 as the difunctional or more functional polymerizable compound 22, the polymerizable compound 22 is a non-liquid crystal compound, and the polymerizable compound 22 has At least one of the functional groups may be bonded to the other end of the first coupling agent 11. R a -R 6 -O- (Rx) n -OR 11 -R a (1-1) In the formula (1-1), R a is the following formula (2-1) to formula (2- 2), an amine group, a vinyl group, a carboxylic acid anhydride residue, or any polymerizable group containing these structures; Rx is any one of the following formulae (2-3) to (2-6); n is An integer of 1 to 3; R 6 and R 11 are each independently a single bond or an alkylene group having 1 to 20 carbon atoms. [Chemical 1] In the formulae (2-1) to (2-2), R b is hydrogen, halogen, -CF 3 , or an alkyl group having 1 to 5 carbon atoms, and q is 0 or 1. [Chemical 2] In the formulae (2-4) to (2-6), R 7 to R 10 are each independently hydrogen or an alkylene group having 1 to 20 carbon atoms. The so-called "one end" and "the other end" may be the edges or ends of the molecular shape, and may be both ends of the long side of the molecule or not both ends of the long side of the molecule. With such a configuration, the inorganic filler can be directly bonded to each other via the coupling agent and the polymerizable compound, thereby forming a heat radiation member. Therefore, a phonon, which is a main element of heat conduction, can be directly transmitted, and the heat-radiated member after curing can have extremely high heat conductivity not only in the horizontal direction but also in the thickness direction. Furthermore, since the structure of the polymerizable compound has few reaction sites and is not easily affected by heat, the exothermic member can have high heat resistance.

本發明的第2態樣的放熱構件用組成物是如所述本發明的第1態樣的放熱構件用組成物,其為於所述第1無機填料及所述第2無機填料上鍵結下述式(3-1)所表示的矽烷偶合劑作為所述第1偶合劑及所述第2偶合劑的組成物。 (R1 -O)j -Si(R5 )3-j -(R2 )k -(R3 )k -(R4 )k -Ry (3-1) 所述式(3-1)中, R1 為H-、或CH3 -(CH2 )0 4 -; R2 為-(CH2 )0 3 -O-; R3 為1,3-伸苯基、1,4-伸苯基、萘-2,6-二基、或萘-2,7-二基; R4 為-(NH)0 1 -(CH2 )0 3 -; R5 為H-、或CH3 -(CH2 )0 7 -; Ry為氧雜環丙基、氧雜環丁基、胺基、乙烯基、羧酸酐殘基、或包含該些結構的任一聚合性基; j為0~3的整數; k為0~1的整數; 式(3-1)包含R3 與R4 的至少一者。 若如此構成,則偶合劑的結構的反應部位少,且不易受到熱的影響,因此放熱構件可具有高耐熱性。The composition for a heat radiation member according to a second aspect of the present invention is the composition for a heat radiation member according to the first aspect of the present invention, which is bonded to the first inorganic filler and the second inorganic filler. The silane coupling agent represented by the following formula (3-1) is a composition of the first coupling agent and the second coupling agent. (R 1 -O) j -Si (R 5 ) 3-j- (R 2 ) k- (R 3 ) k- (R 4 ) k -Ry (3-1) In the formula (3-1), , R 1 is H-, or CH 3- (CH 2 ) 0 to 4- ; R 2 is-(CH 2 ) 0 to 3 -O-; R 3 is 1,3-phenylene, 1,4- Phenylene, naphthalene-2,6-diyl, or naphthalene-2,7-diyl; R 4 is-(NH) 0 to 1- (CH 2 ) 0 to 3- ; R 5 is H-, or CH 3- (CH 2 ) 0 to 7- ; Ry is oxetanyl, oxetanyl, amino, vinyl, carboxylic anhydride residue, or any polymerizable group containing these structures; j Is an integer of 0 to 3; k is an integer of 0 to 1; Formula (3-1) includes at least one of R 3 and R 4 . If comprised in this way, since the structure of a coupling agent has few reaction sites and is not easily affected by heat, a heat release member can have high heat resistance.

本發明的第3態樣的放熱構件用組成物是如所述本發明的第1態樣或第2態樣的放熱構件用組成物,其中所述第1無機填料與所述第2無機填料分別為選自氮化硼、碳化硼、碳氮化硼、石墨、碳纖維、碳奈米管、石墨烯、礬土(alumina)、氮化鋁、二氧化矽、氮化矽、碳化矽、氧化鋅、氧化鎂、氫氧化鎂、堇青石(cordierite)、或氧化鐵系材料中的至少一者。 若如此構成,則無機填料的導熱率高、熱膨脹率為正或非常小,或者為負,藉由與該些填料複合化,可獲得目標放熱構件用組成物。The composition for a heat radiation member according to a third aspect of the present invention is the composition for a heat radiation member according to the first aspect or the second aspect of the present invention, wherein the first inorganic filler and the second inorganic filler Respectively selected from boron nitride, boron carbide, boron carbonitride, graphite, carbon fiber, carbon nanotube, graphene, alumina, aluminum nitride, silicon dioxide, silicon nitride, silicon carbide, and oxide At least one of zinc, magnesium oxide, magnesium hydroxide, cordierite, or iron oxide-based materials. With such a structure, the thermal conductivity of the inorganic filler is high, and the thermal expansion coefficient is positive or very small, or negative. By compounding with these fillers, the target composition for an exothermic member can be obtained.

本發明的第4態樣的放熱構件用組成物是如所述本發明的第1態樣至第3態樣中任一態樣的放熱構件用組成物,其進而包含具有與所述第1無機填料及所述第2無機填料不同的熱膨脹率的第3無機填料。 若如此構成,則於所述第1無機填料與所述第2無機填料具有不同的熱膨脹率的情況下,若使該些複合化,則經複合化的放熱構件用組成物的熱膨脹率為僅以各填料複合化的情況下的中間值。然而,於該狀態下,在填料的間隙多的情況下,不僅導熱率不會變高,而且因水分侵入至間隙中而電絕緣性降低。因此,藉由添加導熱率高、且與第1無機填料、第2無機填料相比粒子徑小的第3無機填料,從而填埋第1無機填料、第2無機填料的間隙,並且提高材料的穩定性。進而,與僅使用第1無機填料、第2無機填料的情況相比,藉由添加導熱率更高的第3無機填料,可提高放熱構件的導熱率。第3無機填料中使用的無機填料不受制約,於需要高絕緣性的情況下,理想的是氮化硼或氮化鋁、碳化矽素、氮化矽素,於不需要高絕緣性的情況下,理想的是金剛石(diamond)、碳奈米管、石墨烯、金屬粉等導熱率高者。The composition for a heat radiation member according to a fourth aspect of the present invention is the composition for a heat radiation member according to any one of the first aspect to the third aspect of the present invention, and further includes a component having the same properties as the first aspect. A third inorganic filler having a different thermal expansion coefficient from the inorganic filler and the second inorganic filler. With such a configuration, when the first inorganic filler and the second inorganic filler have different thermal expansion coefficients, if these are compounded, the thermal expansion coefficient of the composite composition for an exothermic member is only The median value when each filler is compounded. However, in this state, when there are many gaps in the filler, not only does the thermal conductivity not increase, but also the electrical insulation decreases due to the penetration of moisture into the gaps. Therefore, by adding a third inorganic filler having a high thermal conductivity and a smaller particle diameter than the first inorganic filler and the second inorganic filler, the gaps between the first inorganic filler and the second inorganic filler are filled, and the material is improved. stability. Furthermore, compared with a case where only the first inorganic filler and the second inorganic filler are used, the addition of the third inorganic filler having a higher thermal conductivity can increase the thermal conductivity of the heat releasing member. The inorganic filler used in the third inorganic filler is not restricted. When high insulation is required, boron nitride or aluminum nitride, silicon carbide, and silicon nitride are desirable. When high insulation is not required. Below, ideally, those with high thermal conductivity such as diamond, carbon nanotubes, graphene, and metal powder.

本發明的第5態樣的放熱構件用組成物是如所述本發明的第1態樣至第4態樣的任一態樣的放熱構件用組成物,其進而包含:所述第1無機填料及所述第2無機填料所未鍵結的有機化合物或高分子化合物。 若如此構成,則於將第1無機填料、第2無機填料連接而使其硬化而成的放熱構件中,隨著為了提高導熱率而增大填料的粒徑,與此相應地空隙率變高,該情況下,可利用未鍵結的化合物來填滿該空隙,可使導熱率或水蒸氣阻斷性能等提高。The composition for a heat radiation member according to a fifth aspect of the present invention is the composition for a heat radiation member according to any one of the first aspect to the fourth aspect of the present invention, and further includes: the first inorganic An organic compound or a polymer compound to which the filler and the second inorganic filler are not bonded. With such a structure, in a heat-radiating member in which the first inorganic filler and the second inorganic filler are connected and hardened, as the particle diameter of the filler is increased in order to increase the thermal conductivity, the porosity is increased accordingly. In this case, the gap can be filled with an unbonded compound, and thermal conductivity, water vapor blocking performance, and the like can be improved.

本發明的第6態樣的放熱構件是所述本發明的第1態樣至第5態樣的任一態樣的放熱構件用組成物硬化而成的放熱構件。 若如此構成,則放熱構件於無機填料間具有鍵,可具有極高的導熱性及耐熱性。A sixth aspect of the present invention is a heat release member, which is a heat release member in which the composition for any one of the first to fifth aspects of the present invention is cured. With such a structure, the exothermic member has a bond between the inorganic fillers, and can have extremely high thermal conductivity and heat resistance.

本發明的第7態樣的電子機器包括如所述本發明的第6態樣的放熱構件;以及具有發熱部的電子裝置,並且所述放熱構件是以與所述發熱部接觸的方式配置於所述電子裝置。 若如此構成,則可藉由具有高導熱性、高耐熱性的放熱構件而效率良好地傳導電子裝置中產生的熱。另外,藉由使面方向的熱膨脹率與安裝於放熱構件的銅配線或矽、氮化矽等的半導體元件的熱膨脹率相近,可抑制由熱循環引起的剝落。An electronic device according to a seventh aspect of the present invention includes the heat radiation member according to the sixth aspect of the present invention; and an electronic device having a heat generation portion, and the heat radiation member is disposed in contact with the heat generation portion. The electronic device. With such a configuration, the heat generated in the electronic device can be efficiently conducted by the heat radiation member having high thermal conductivity and high heat resistance. In addition, by making the thermal expansion coefficient in the plane direction close to the thermal expansion coefficient of a copper wiring or a semiconductor element such as silicon or silicon nitride mounted on a heat radiation member, it is possible to suppress spalling due to thermal cycling.

本發明的第8態樣的放熱構件的製造方法例如如圖2所示般包括:使導熱性的第1無機填料1與第1偶合劑11的一端鍵結的步驟;使導熱性的第2無機填料2與第2偶合劑12的一端鍵結的步驟;使所述第2偶合劑12的另一端與二官能以上的聚合性化合物22鍵結的步驟;以及使所述第1偶合劑11的另一端與所述二官能以上的聚合性化合物11鍵結的步驟,並且所述二官能以上的聚合性化合物22為下述式(1-1)所表示的聚合性化合物,所述聚合性化合物為非液晶性化合物。 Ra -R6 -O-(Rx)n -O-R11 -Ra (1-1) 所述式(1-1)中, Ra 分別為下述式(2-1)~式(2-2)、胺基、乙烯基、羧酸酐殘基、或包含該些結構的任一聚合性基; Rx為下述式(2-3)~式(2-6)的任一者; n為1~3的整數; R6 、R11 分別獨立地為單鍵、或碳數1~20的伸烷基。 [化3]式(2-1)~式(2-2)中,Rb 為氫、鹵素、-CF3 、或碳數1~5的烷基,q為0或1。 [化4]式(2-4)~式(2-6)中,R7 ~R10 分別獨立地為氫、或碳數1~20的伸烷基。 若如此構成,則可製造為包含經由偶合劑及聚合性化合物使無機填料間鍵結而成的無機填料的放熱構件、且高耐熱性的放熱構件。 [發明的效果]As shown in FIG. 2, for example, a method for manufacturing an exothermic member according to the eighth aspect of the present invention includes a step of bonding a thermally conductive first inorganic filler 1 and one end of a first coupling agent 11; and a thermally conductive second A step of bonding the inorganic filler 2 to one end of the second coupling agent 12; a step of bonding the other end of the second coupling agent 12 to a difunctional or more functional polymerizable compound 22; and a step of bonding the first coupling agent 11 A step of bonding the other end to the difunctional or more functional polymerizable compound 11 and the difunctional or more functional polymerizable compound 22 is a polymerizable compound represented by the following formula (1-1). The compound is a non-liquid crystalline compound. R a -R 6 -O- (Rx) n -OR 11 -R a (1-1) In the formula (1-1), R a is the following formula (2-1) to formula (2- 2), an amine group, a vinyl group, a carboxylic acid anhydride residue, or any polymerizable group containing these structures; Rx is any one of the following formulae (2-3) to (2-6); n is An integer of 1 to 3; R 6 and R 11 are each independently a single bond or an alkylene group having 1 to 20 carbon atoms. [Chemical 3] In the formulae (2-1) to (2-2), R b is hydrogen, halogen, -CF 3 , or an alkyl group having 1 to 5 carbon atoms, and q is 0 or 1. [Chemical 4] In the formulae (2-4) to (2-6), R 7 to R 10 are each independently hydrogen or an alkylene group having 1 to 20 carbon atoms. With such a structure, it is possible to produce a heat releasing member including an inorganic filler in which inorganic fillers are bonded to each other via a coupling agent and a polymerizable compound, and a heat releasing member having high heat resistance. [Effect of the invention]

由本發明的放熱構件用組成物形成的放熱構件具有極高的導熱性、熱膨脹率的控制性、及高耐熱性。進而,亦具有化學穩定性、硬度及機械強度等優異的特性。該放熱構件例如適於放熱基板、放熱板(面狀散熱片)、放熱片(sheet)、放熱塗膜、放熱接著劑等。The heat radiation member formed from the composition for a heat radiation member of the present invention has extremely high thermal conductivity, controllability of thermal expansion coefficient, and high heat resistance. Furthermore, it has excellent characteristics such as chemical stability, hardness, and mechanical strength. This heat radiation member is suitable for a heat radiation substrate, a heat radiation plate (planar heat sink), a heat radiation sheet, a heat radiation coating film, a heat radiation adhesive, etc., for example.

該申請是基於在日本於2017年3月31日提出申請的日本專利特願2017-072255號,且使其內容形成為本申請的內容的一部分。本發明藉由以下的詳細說明而可更完全地理解。本發明的進一步的應用範圍藉由以下的詳細說明而變得明確。但是,詳細的說明及特定的實施例為本發明的理想的實施形態,僅為了說明而記載。根據該詳細的說明,於本發明的精神與範圍內,本領域技術人員明瞭各種變更、改變。申請人並未意圖將所記載的實施形態均呈獻給公眾,改變、代替案中語言上可能不包含於發明申請專利範圍內者亦設為均等論下的發明的一部分。This application is based on Japanese Patent Application No. 2017-072255 filed in Japan on March 31, 2017, and its content forms part of the content of this application. The present invention can be more fully understood from the following detailed description. The further application range of this invention will become clear by the following detailed description. However, the detailed description and specific examples are ideal embodiments of the present invention, and are described only for explanation. Based on the detailed description, those skilled in the art will recognize various changes and modifications within the spirit and scope of the present invention. The applicant does not intend to present the described implementation forms to the public, and those who change or replace the language in the case that may not be included in the scope of the patent application for the invention are also made part of the invention under the equality theory.

以下,參照圖式對本發明的實施形態進行說明。再者,於各圖中對相互相同或者相當的部分標註相同或類似的符號,並省略重複的說明。另外,本發明並不由以下的實施形態限制。Hereinafter, embodiments of the present invention will be described with reference to the drawings. It should be noted that the same or similar parts are denoted by the same or similar symbols in each drawing, and repeated descriptions are omitted. The present invention is not limited by the following embodiments.

本說明書中的用語的用法如下所述。 「液晶化合物」「液晶性化合物」為表現出向列相或層列相等液晶相的化合物。 「聚合性基」為參與聚合反應的基。The usage of terms in this specification is as follows. A "liquid crystal compound" and a "liquid crystal compound" are compounds exhibiting a nematic phase or a smectic liquid crystal phase. The "polymerizable group" is a group participating in a polymerization reaction.

以下述一例表示「烷基中的任意的-CH2 -可經-O-等取代」或「任意的-CH2 CH2 -可經-CH=CH-等取代」等用語的含義。例如,C4 H9 -中的任意的-CH2 -經-O-或-CH=CH-取代而成的基為C3 H7 O-、CH3 -O-(CH2 )2 -、CH3 -O-CH2 -O-等。同樣地,C5 H11 -中的任意的-CH2 CH2 -經-CH=CH-取代而成的基為H2 C=CH-(CH2 )3 -、CH3 -CH=CH-(CH2 )2 -等,進而任意的-CH2 -經-O-取代而成的基為CH3 -CH=CH-CH2 -O-等。如此,「任意的」這一用語是指「未區分而選擇的至少一者」。再者,考慮到化合物的穩定性,則較氧與氧鄰接的CH3 -O-O-CH2 -而言,氧與氧不鄰接的CH3 -O-CH2 -O-較佳。The meanings of terms such as "arbitrary -CH 2 -in the alkyl group may be substituted with -O-, etc." or "arbitrary -CH 2 CH 2 -may be substituted with -CH = CH-, etc." For example, any of the -CH 2 -groups substituted by -O- or -CH = CH- in C 4 H 9 -is C 3 H 7 O-, CH 3 -O- (CH 2 ) 2- , CH 3 -O-CH 2 -O- and the like. Similarly, any of the -CH 2 CH 2 -groups substituted with -CH = CH- in C 5 H 11 -is H 2 C = CH- (CH 2 ) 3- , CH 3 -CH = CH- (CH 2 ) 2 -etc., And further any -CH 2 -substituted by -O- is CH 3 -CH = CH-CH 2 -O- or the like. As such, the term "arbitrary" means "at least one selected without distinction". Furthermore, considering the stability of the compound, CH 3 -O-CH 2 -O-, which is not adjacent to oxygen, is preferred to CH 3 -OO-CH 2- , which is adjacent to oxygen.

另外,關於環A,「任意的氫可經鹵素、碳數1~10的烷基、或碳數1~10的鹵化烷基取代」這一用語是指例如1,4-伸苯基的2,3,5,6位的至少一個氫經氟或甲基等取代基取代的情況下的態樣,另外,取代基為「碳數1~10的鹵化烷基」的情況下的態樣包含如2-氟乙基或3-氟-5-氯己基般的例子。In addition, with regard to ring A, the term "arbitrary hydrogen may be substituted with halogen, an alkyl group having 1 to 10 carbon atoms, or a halogenated alkyl group having 1 to 10 carbon atoms" means, for example, 2,4-phenylene In the case where at least one hydrogen at the 3, 5, 6 position is substituted with a substituent such as fluorine or methyl, the embodiment in which the substituent is a "halogenated alkyl group having 1 to 10 carbon atoms" includes Examples are 2-fluoroethyl or 3-fluoro-5-chlorohexyl.

「化合物(1-2)」是指後述的下述式(1-2)所表示的液晶化合物,另外,亦有時是指下述式(1-2)所表示的化合物的至少一種。「放熱構件用組成物」是指含有選自所述化合物(1-2)或其他聚合性化合物中的至少一種化合物的組成物。於一個化合物(1-2)具有多個A時,任意的兩個A可相同亦可不同。於多個化合物(1-2)具有A時,任意的兩個A可相同亦可不同。該規則亦適用於Ra 或Z等其他記號、基等。"Compound (1-2)" means the liquid crystal compound represented by the following formula (1-2) mentioned later, and may mean at least one of the compounds represented by the following formula (1-2). The "composition for an exothermic member" means a composition containing at least one compound selected from the compound (1-2) or another polymerizable compound. When a compound (1-2) has multiple A's, any two A's may be the same or different. When multiple compounds (1-2) have A, any two A's may be the same or different. This rule also applies to other symbols and bases such as Ra or Z.

[放熱構件用組成物] 本申請案的放熱構件用組成物為藉由硬化,使無機填料彼此經由偶合劑及二官能以上的聚合性化合物而鍵結從而形成放熱構件的組成物。圖1為使用作為無機填料的氮化硼的情況下的例子。若利用偶合劑對氮化硼(h-BN)進行處理,則於氮化硼的情況下,因於粒子的平面並無反應基,因此僅於其周圍鍵結偶合劑。經偶合劑處理的氮化硼可與聚合性化合物形成鍵。因此,如圖2所示般,使經偶合處理的氮化硼1的偶合劑11的另一端、與經偶合處理進而利用聚合性化合物22進行了修飾的氮化硼2的聚合性化合物22的另一端鍵結,藉此可使氮化硼彼此如圖1般相互鍵結。 如此,藉由使無機填料彼此經由偶合劑及聚合性化合物而鍵結,可直接傳播聲子,因此硬化後的放熱構件具有極高的導熱性,從而可製作直接反映無機成分的熱膨脹率的有機無機複合材料。[Composition for Exothermic Member] The composition for an exothermic member of the present application is a composition that forms an exothermic member by bonding inorganic fillers to each other via a coupling agent and a difunctional polymerizable compound or more by curing. FIG. 1 is an example in the case of using boron nitride as an inorganic filler. If boron nitride (h-BN) is treated with a coupling agent, in the case of boron nitride, since there is no reactive group on the plane of the particle, the coupling agent is bonded only around the particle. The coupling agent-treated boron nitride can form a bond with a polymerizable compound. Therefore, as shown in FIG. 2, the other end of the coupling agent 11 of the boron nitride 1 subjected to the coupling treatment and the polymerizable compound 22 of the boron nitride 2 which has been subjected to the coupling treatment and further modified by the polymerizable compound 22 are used. The other end is bonded, whereby the boron nitrides can be bonded to each other as shown in FIG. 1. In this way, by bonding inorganic fillers to each other via a coupling agent and a polymerizable compound, phonons can be directly propagated. Therefore, the heat-generating member after curing has extremely high thermal conductivity, and an organic material that directly reflects the thermal expansion coefficient of the inorganic component can be produced Inorganic composite materials.

本發明的第1實施形態的放熱構件用組成物例如如圖1、圖2所示,包含:多個與第1偶合劑1的一端鍵結的導熱性的第1無機填料11;以及多個為與第2偶合劑12的一端鍵結的導熱性的第2無機填料2且於所述第2偶合劑12的另一端進而鍵結有二官能以上的聚合性化合物22的第2無機填料。 如圖2所示,若使放熱構件用組成物硬化,則第1無機填料1所鍵結的偶合劑11的另一端與第2無機填料2的聚合性化合物22鍵結。如此,形成無機填料間的鍵。The composition for a heat radiation member according to the first embodiment of the present invention includes, for example, as shown in FIGS. 1 and 2, a plurality of thermally conductive first inorganic fillers 11 bonded to one end of the first coupling agent 1; The second inorganic filler 2 is a thermally conductive second inorganic filler 2 bonded to one end of the second coupling agent 12, and a second inorganic filler having a difunctional or higher functional polymerizable compound 22 is further bonded to the other end of the second coupling agent 12. As shown in FIG. 2, when the composition for an exothermic member is cured, the other end of the coupling agent 11 bonded to the first inorganic filler 1 is bonded to the polymerizable compound 22 of the second inorganic filler 2. In this way, bonds between the inorganic fillers are formed.

[二官能以上的聚合性化合物] 二官能以上的聚合性化合物可為非液晶性化合物。二官能以上的聚合性化合物具有可與偶合劑形成鍵的官能基。 作為二官能以上的聚合性化合物,可列舉下述式(1-1)所表示的聚合性化合物。 Ra -R6 -O-(Rx)n -O-R11 -Ra (1-1) 所述式(1-1)中, Ra 分別為下述式(2-1)~式(2-2)、胺基、乙烯基、羧酸酐殘基、或包含該些結構的任一聚合性基; Rx為萘-2,6-二基、或下述式(2-3)~式(2-6)所表示的萘-2,7-二基、聯苯基-2,2'、聯苯基-2,4'、聯苯基-3,3'的任一者; n為1~3的整數; R6 、R11 分別獨立地為單鍵、或碳數1~20的伸烷基。 [化5]式(2-1)~式(2-2)中,Rb 為氫、鹵素、-CF3 、或碳數1~5的烷基,q為0或1。 [化6]式(2-4)~式(2-6)中,R7 ~R10 分別獨立地為氫、或碳數1~20的伸烷基。[Difunctional or More Polymerizable Compound] The difunctional or more polymerizable compound may be a non-liquid crystalline compound. The bifunctional or more polymerizable compound has a functional group capable of forming a bond with a coupling agent. Examples of the difunctional or more polymerizable compound include a polymerizable compound represented by the following formula (1-1). R a -R 6 -O- (Rx) n -OR 11 -R a (1-1) In the formula (1-1), R a is the following formula (2-1) to formula (2- 2), an amino group, a vinyl group, a carboxylic anhydride residue, or any polymerizable group containing these structures; Rx is a naphthalene-2,6-diyl group, or the following formulae (2-3) to (2) -6) Any of naphthalene-2,7-diyl, biphenyl-2,2 ', biphenyl-2,4', and biphenyl-3,3 '; n is 1 to An integer of 3; R 6 and R 11 are each independently a single bond or an alkylene group having 1 to 20 carbon atoms. [Chemical 5] In the formulae (2-1) to (2-2), R b is hydrogen, halogen, -CF 3 , or an alkyl group having 1 to 5 carbon atoms, and q is 0 or 1. [Chemical 6] In the formulae (2-4) to (2-6), R 7 to R 10 are each independently hydrogen or an alkylene group having 1 to 20 carbon atoms.

再者,Ra 只要分別獨立地為可與第1偶合劑的另一端的官能基及第2偶合劑的另一端的官能基鍵結的官能基即可。例如,除了所述式(2-1)~式(2-2)所表示的聚合性基以外,可列舉氧化環己烯、鄰苯二甲酸酐、或琥珀酸酐,但並不限於該些。 作為形成Ra 與偶合劑的鍵的官能基的組合,例如可列舉氧雜環丙基與胺基、乙烯基彼此、甲基丙烯醯氧基彼此、羧基或羧酸酐殘基與胺、咪唑與氧雜環丙基等組合,但並不限於該些。只要為可形成聚合性化合物與偶合劑的鍵的官能基的組合即可。更佳為耐熱性高的組合。In addition, R a may be a functional group which can be independently bonded to a functional group on the other end of the first coupling agent and a functional group on the other end of the second coupling agent, respectively. For example, cyclohexene oxide, phthalic anhydride, or succinic anhydride is mentioned besides the polymerizable group represented by said Formula (2-1)-Formula (2-2), However, It is not limited to these. Examples of the combination of functional groups that form a bond between R a and a coupling agent include oxepropyl and amine, vinyl, methacryloxy, carboxyl or carboxylic anhydride residues, amines, and imidazoles Combinations such as oxetanyl are not limited thereto. What is necessary is just the combination of the functional group which can form the bond of a polymerizable compound and a coupling agent. More preferred is a combination with high heat resistance.

關於式(1-1)所表示的聚合性化合物,其結構中反應部位少,且不易受到熱的影響。另一方面,得知其結構的聲子的傳播優異。因此,由放熱構件用組成物形成的放熱構件可具有高導熱性,並且可具有高耐熱性。The polymerizable compound represented by formula (1-1) has few reaction sites in the structure and is not easily affected by heat. On the other hand, it was found that the phonon of the structure has excellent propagation. Therefore, the heat radiation member formed from the composition for a heat radiation member can have high thermal conductivity and can have high heat resistance.

二官能以上的聚合性化合物亦可為液晶性化合物。作為具有液晶性的二官能以上的聚合性化合物,可列舉下述式(1-2)所表示的聚合性液晶化合物。 聚合性液晶化合物具有液晶骨架與聚合性基,且具有高的聚合反應性、寬廣的液晶相溫度範圍、良好的混和性等。該化合物(1-2)於與其他液晶性化合物或聚合性化合物等混合時,容易變得均勻。 Ra -Z-(A-Z)m -Ra (1-2)The difunctional or more polymerizable compound may be a liquid crystal compound. Examples of the difunctional or more polymerizable compound having liquid crystallinity include a polymerizable liquid crystal compound represented by the following formula (1-2). The polymerizable liquid crystal compound has a liquid crystal skeleton and a polymerizable group, and has high polymerization reactivity, a wide liquid crystal phase temperature range, good miscibility, and the like. When this compound (1-2) is mixed with other liquid crystal compounds, polymerizable compounds, etc., it becomes easy to become uniform. R a -Z- (AZ) m -R a (1-2)

藉由適宜選擇所述化合物(1-2)的末端基Ra 、環結構A及鍵結基Z,可任意地調整液晶相表現區域等物性。以下說明末端基Ra 、環結構A及鍵結基Z的種類對化合物(1-2)的物性產生的效果、以及該些的較佳例。By suitably selecting the compound (1-2) of the terminal group R a, ring structure A and the bonding group Z, can arbitrarily adjust the liquid crystal phase exhibits properties like region. The effects of the types of the terminal group R a , the ring structure A, and the bonding group Z on the physical properties of the compound (1-2), and preferable examples thereof will be described below.

·末端基Ra 末端基Ra 與所述式(1-1)中定義的Ra 為相同含義。• Terminal group R a The terminal group R a has the same meaning as that defined for R a in the formula (1-1).

·環結構A 於所述化合物(1-2)的環結構A中的至少一個環為1,4-伸苯基的情況下,配向秩序參數(orientational order parameter)及磁化各向異性大。另外,於至少兩個環為1,4-伸苯基的情況下,液晶相的溫度範圍寬廣,進而透明點高。於1,4-伸苯基環上的至少一個氫經取代為氰基、鹵素、-CF3 或-OCF3 的情況下,介電各向異性高。另外,於至少兩個環為1,4-伸環己基的情況下,透明點高,且黏度小。Ring structure A In the case where at least one ring in ring structure A of the compound (1-2) is 1,4-phenylene, the orientation order parameter and the magnetization anisotropy are large. In addition, when at least two rings are 1,4-phenylene, the temperature range of the liquid crystal phase is wide, and the transparent point is high. When at least one hydrogen on a 1,4-phenylene ring is substituted with cyano, halogen, -CF 3 or -OCF 3 , the dielectric anisotropy is high. In addition, when at least two rings are 1,4-cyclohexyl, the transparent point is high and the viscosity is small.

作為較佳的A,可列舉:1,4-伸環己基、1,4-伸環己烯基、2,2-二氟-1,4-伸環己基、1,3-二噁烷-2,5-二基、1,4-伸苯基、2-氟-1,4-伸苯基、2,3-二氟-1,4-伸苯基、2,5-二氟-1,4-伸苯基、2,6-二氟-1,4-伸苯基、2,3,5-三氟-1,4-伸苯基、吡啶-2,5-二基、3-氟吡啶-2,5-二基、嘧啶-2,5-二基、噠嗪-3,6-二基、萘-2,6-二基、四氫萘-2,6-二基、茀-2,7-二基、9-甲基茀-2,7-二基、9,9-二甲基茀-2,7-二基、9-乙基茀-2,7-二基、9-氟茀-2,7-二基、9,9-二氟茀-2,7-二基等。As preferred A, 1,4-cyclohexyl, 1,4-cyclohexenyl, 2,2-difluoro-1,4-cyclohexyl, 1,3-dioxane- 2,5-diyl, 1,4-phenylene, 2-fluoro-1,4-phenylene, 2,3-difluoro-1,4-phenylene, 2,5-difluoro-1 1,4-phenylene, 2,6-difluoro-1,4-phenylene, 2,3,5-trifluoro-1,4-phenylene, pyridine-2,5-diyl, 3- Fluoropyridine-2,5-diyl, pyrimidine-2,5-diyl, pyridazine-3,6-diyl, naphthalene-2,6-diyl, tetrahydronaphthalene-2,6-diyl, fluorene -2,7-diyl, 9-methylfluorene-2,7-diyl, 9,9-dimethylfluorene-2,7-diyl, 9-ethylfluorene-2,7-diyl, 9-fluorofluorene-2,7-diyl, 9,9-difluorofluorene-2,7-diyl, etc.

1,4-伸環己基及1,3-二噁烷-2,5-二基的立體構型是反式構型優於順式構型。2-氟-1,4-伸苯基及3-氟-1,4-伸苯基的結構相同,因此未例示後者。該規則亦適用於2,5-二氟-1,4-伸苯基與3,6-二氟-1,4-伸苯基的關係等。The stereo configuration of 1,4-cyclohexyl and 1,3-dioxane-2,5-diyl is the trans configuration is better than the cis configuration. The structures of 2-fluoro-1,4-phenylene and 3-fluoro-1,4-phenylene are the same, so the latter is not exemplified. This rule also applies to the relationship between 2,5-difluoro-1,4-phenylene and 3,6-difluoro-1,4-phenylene.

進而佳的A為1,4-伸環己基、1,4-伸環己烯基、1,3-二噁烷-2,5-二基、1,4-伸苯基、2-氟-1,4-伸苯基、2,3-二氟-1,4-伸苯基、2,5-二氟-1,4-伸苯基、2,6-二氟-1,4-伸苯基等。特佳的A為1,4-伸環己基及1,4-伸苯基。Further preferred A is 1,4-cyclohexyl, 1,4-cyclohexenyl, 1,3-dioxane-2,5-diyl, 1,4-phenylene, 2-fluoro- 1,4-phenylene, 2,3-difluoro-1,4-phenylene, 2,5-difluoro-1,4-phenylene, 2,6-difluoro-1,4-phenylene Phenyl etc. Particularly preferred A is 1,4-cyclohexyl and 1,4-phenylene.

·鍵結基Z 於所述化合物(1-2)的鍵結基Z為單鍵、-(CH2 )2 -、-CH2 O-、-OCH2 -、-CF2 O-、-OCF2 -、-CH=CH-、-CF=CF-或-(CH2 )4 -的情況下,特別是為單鍵、-(CH2 )2 -、-CF2 O-、-OCF2 -、-CH=CH-或-(CH2 )4 -的情況下,黏度變小。另外,於鍵結基Z為-CH=CH-、-CH=N-、-N=CH-、-N=N-或-CF=CF-的情況下,液晶相的溫度範圍寬廣。另外,於鍵結基Z為碳數4~10左右的烷基的情況下,熔點降低。Bonding group Z The bonding group Z to the compound (1-2) is a single bond,-(CH 2 ) 2- , -CH 2 O-, -OCH 2- , -CF 2 O-, -OCF 2- , -CH = CH-, -CF = CF-, or-(CH 2 ) 4 -especially single bonds,-(CH 2 ) 2- , -CF 2 O-, -OCF 2- When -CH = CH- or-(CH 2 ) 4- , the viscosity becomes small. When the bonding group Z is -CH = CH-, -CH = N-, -N = CH-, -N = N-, or -CF = CF-, the temperature range of the liquid crystal phase is wide. When the bonding group Z is an alkyl group having about 4 to 10 carbon atoms, the melting point is lowered.

作為較佳的Z,可列舉:單鍵、-(CH2 )2 -、-(CF2 )2 -、-COO-、-OCO-、-CH2 O-、-OCH2 -、-CF2 O-、-OCF2 -、-CH=CH-、-CF=CF-、-C≡C-、-(CH2 )4 -、-(CH2 )3 O-、-O(CH2 )3 -、-(CH2 )2 COO-、-OCO(CH2 )2 -、-CH=CH-COO-、-OCO-CH=CH-等。Examples of preferred Z include a single bond,-(CH 2 ) 2 -,-(CF 2 ) 2- , -COO-, -OCO-, -CH 2 O-, -OCH 2- , -CF 2 O-, -OCF 2- , -CH = CH-, -CF = CF-, -C≡C-,-(CH 2 ) 4 -,-(CH 2 ) 3 O-, -O (CH 2 ) 3 -,-(CH 2 ) 2 COO-, -OCO (CH 2 ) 2- , -CH = CH-COO-, -OCO-CH = CH-, and the like.

作為進而佳的Z,可列舉:單鍵、-(CH2 )2 -、-COO-、-OCO-、-CH2 O-、-OCH2 -、-CF2 O-、-OCF2 -、-CH=CH-、-C≡C-等。特佳的Z為單鍵、-(CH2 )2 -、-COO-或-OCO-。Further preferred Z include a single bond,-(CH 2 ) 2- , -COO-, -OCO-, -CH 2 O-, -OCH 2- , -CF 2 O-, -OCF 2- , -CH = CH-, -C≡C-, etc. Particularly preferred Z is a single bond,-(CH 2 ) 2- , -COO-, or -OCO-.

所述化合物(1-2)越具有大量的環,則於更高的溫度下越不易軟化,因此,作為放熱材料而較佳,但軟化溫度若變得高於聚合溫度,則難以成形,因此較佳為根據目的而取得兩者的平衡。再者,於本說明書中,基本上將六員環及包含六員環的縮合環等視為環,例如單獨的三員環或四員環、五員環並不被視為環。另外,萘環或茀環等縮合環被視為一個環。The more the compound (1-2) has a larger number of rings, the more difficult it is to soften at a higher temperature. Therefore, it is preferable as an exothermic material. However, if the softening temperature becomes higher than the polymerization temperature, it is difficult to form, so It is better to strike a balance between the two according to purpose. In addition, in this specification, a six-membered ring and a condensed ring including a six-membered ring are basically regarded as a ring. For example, a three-membered ring or a four-membered ring and a five-membered ring are not considered as a ring. A condensed ring such as a naphthalene ring or a fluorene ring is regarded as one ring.

所述化合物(1-2)可為光學活性,亦可為光學惰性。於化合物(1-2)為光學活性的情況下,該化合物(1-2)存在具有不對稱碳的情況與具有不對稱軸的情況。不對稱碳的立體構型可為R亦可為S。不對稱碳可位於Ra 或A的任一者,若具有不對稱碳,則化合物(1-2)的相容性良好。於化合物(1-2)具有不對稱軸的情況下,扭曲誘導力大。另外,旋光性可為任一種。 如上所述,藉由適宜選擇末端基Ra 、環結構A及鍵結基Z的種類、環的數量,可獲得具有目標物性的化合物。The compound (1-2) may be optically active or optically inert. When the compound (1-2) is optically active, the compound (1-2) has a case of having an asymmetric carbon and a case of having an asymmetric axis. The stereo configuration of the asymmetric carbon may be R or S. The asymmetric carbon may be located in either R a or A. If the asymmetric carbon is present, the compatibility of the compound (1-2) is good. In the case where the compound (1-2) has an asymmetric axis, the twist-inducing force is large. In addition, any of the optical rotation properties may be used. As described above, by appropriately selecting the terminal group R a, ring structure A and the type of bonding group Z, the number of rings, the compound having desired physical properties can be obtained.

·化合物(1-2) 化合物(1-2)亦可如下述式(1-a)或式(1-b)般表示。 P-Y-(A-Z)m -Ra (1-a) P-Y-(A-Z)m -Y-P (1-b)Compound (1-2) The compound (1-2) can also be represented by the following formula (1-a) or (1-b). PY- (AZ) m -R a (1-a) PY- (AZ) m -YP (1-b)

所述式(1-a)及式(1-b)中,A、Z、Ra 與所述式(1-2)中定義的A、Z、Ra 為相同含義,P表示下述式(2-1)~式(2-2)所表示的聚合性基、氧化環己烯、鄰苯二甲酸酐、或琥珀酸酐,Y表示單鍵或碳數1~20的伸烷基、較佳為碳數1~10的伸烷基,該伸烷基中,任意的-CH2 -可經-O-、-S-、-CO-、-COO-、-OCO-或-CH=CH-取代。特佳的Y為碳數1~10的伸烷基的單末端或兩末端的-CH2 -經-O-取代的伸烷基。m為1~6的整數,較佳為2~6的整數,進而佳為2~4的整數。 [化7]式(2-1)~式(2-2)中,Rb 為氫、鹵素、-CF3 、或碳數1~5的烷基,q為0或1。The formula (1-a) and formula (1-b), the defined A, Z, R a in the formula (1-2) A, Z, R a is the same meaning, P represented by the following formula (2-1) to the polymerizable group represented by formula (2-2), cyclohexene oxide, phthalic anhydride, or succinic anhydride, Y represents a single bond or an alkylene group having 1 to 20 carbon atoms, and Preferred is an alkylene group having 1 to 10 carbon atoms. In this alkylene group, any -CH 2 -may pass through -O-, -S-, -CO-, -COO-, -OCO-, or -CH = CH. -Replace. Particularly preferred Y is a single-terminal or both-terminal -CH 2 -O-substituted alkylene group having 1 to 10 carbon atoms. m is an integer of 1 to 6, preferably an integer of 2 to 6, and more preferably an integer of 2 to 4. [Chemical 7] In the formulae (2-1) to (2-2), R b is hydrogen, halogen, -CF 3 , or an alkyl group having 1 to 5 carbon atoms, and q is 0 or 1.

作為較佳的化合物(1-2)的例子,可列舉以下所示的化合物(a-1)~化合物(a-10)、化合物(b-1)~化合物(b-16)、化合物(c-1)~化合物(c-16)、化合物(d-1)~化合物(d-15)、化合物(e-1)~化合物(e-15)、化合物(f-1)~化合物(f-14)、化合物(g-1)~化合物(g-20)。再者,式中的*表示不對稱碳。Examples of preferred compounds (1-2) include compounds (a-1) to (a-10), compounds (b-1) to (b-16), and compound (c) shown below. -1) to compound (c-16), compound (d-1) to compound (d-15), compound (e-1) to compound (e-15), compound (f-1) to compound (f- 14) Compound (g-1) to compound (g-20). In addition, * in the formula represents an asymmetric carbon.

[化8] [Chemical 8]

[化9] [Chemical 9]

[化10] [Chemical 10]

[化11] [Chemical 11]

[化12] [Chemical 12]

[化13] [Chemical 13]

[化14] [Chemical 14]

[化15] [Chemical 15]

[化16] [Chemical 16]

[化17] [Chemical 17]

[化18] [Chemical 18]

[化19] [Chemical 19]

[化20] [Chemical 20]

[化21] [Chemical 21]

所述化學式(a-1)~化學式(g-20)中,Ra 、P及Y如所述式(1-a)及式(1-b)中所定義般。 Z1 分別獨立地為單鍵、-(CH2 )2 -、-(CF2 )2 -、-(CH2 )4 -、-CH2 O-、-OCH2 -、-(CH2 )3 O-、-O(CH2 )3 -、-COO-、-OCO-、-CH=CH-、-CF=CF-、-CH=CHCOO-、-OCOCH=CH-、-(CH2 )2 COO-、-OCO(CH2 )2 -、-C≡C-、-C≡C-COO-、-OCO-C≡C-、-C≡C-CH=CH-、-CH=CH-C≡C-、-CH=N-、-N=CH-、-N=N-、-OCF2 -或-CF2 O-。再者,多個Z1 可相同亦可不同。In the chemical formulas (a-1) to (g-20), R a , P, and Y are as defined in the formulas (1-a) and (1-b). Z 1 is independently a single bond,-(CH 2 ) 2 -,-(CF 2 ) 2 -,-(CH 2 ) 4- , -CH 2 O-, -OCH 2 -,-(CH 2 ) 3 O-, -O (CH 2 ) 3- , -COO-, -OCO-, -CH = CH-, -CF = CF-, -CH = CHCOO-, -OCOCH = CH-,-(CH 2 ) 2 COO-, -OCO (CH 2 ) 2- , -C≡C-, -C≡C-COO-, -OCO-C≡C-, -C≡C-CH = CH-, -CH = CH-C ≡C-, -CH = N-, -N = CH-, -N = N-, -OCF 2 -or -CF 2 O-. Furthermore, a plurality of Z 1 may be the same or different.

Z2 分別獨立地為-(CH2 )2 -、-(CF2 )2 -、-(CH2 )4 -、-CH2 O-、-OCH2 -、-(CH2 )3 O-、-O(CH2 )3 -、-COO-、-OCO-、-CH=CH-、-CF=CF-、-CH=CHCOO-、-OCOCH=CH-、-(CH2 )2 COO-、-OCO(CH2 )2 -、-C≡C-、-C≡C-COO-、-OCO-C≡C-、-C≡C-CH=CH-、-CH=CH-C≡C-、-CH=N-、-N=CH-、-N=N-、-OCF2 -或-CF2 O-。Z 2 is independently-(CH 2 ) 2 -,-(CF 2 ) 2 -,-(CH 2 ) 4- , -CH 2 O-, -OCH 2 -,-(CH 2 ) 3 O-, -O (CH 2 ) 3- , -COO-, -OCO-, -CH = CH-, -CF = CF-, -CH = CHCOO-, -OCOCH = CH-,-(CH 2 ) 2 COO-, -OCO (CH 2 ) 2- , -C≡C-, -C≡C-COO-, -OCO-C≡C-, -C≡C-CH = CH-, -CH = CH-C≡C- , -CH = N-, -N = CH-, -N = N-, -OCF 2 -or -CF 2 O-.

Z3 分別獨立地為單鍵、碳數1~10的烷基、-(CH2 )a -、-O(CH2 )a O-、-CH2 O-、-OCH2 -、-O(CH2 )3 -、-(CH2 )3 O-、-COO-、-OCO-、-CH=CH-、-CH=CHCOO-、-OCOCH=CH-、-(CH2 )2 COO-、-OCO(CH2 )2 -、-CF=CF-、-C≡C-、-CH=N-、-N=CH-、-N=N-、-OCF2 -或-CF2 O-,多個Z3 可相同亦可不同。a為1~20的整數。Z 3 is independently a single bond, an alkyl group having 1 to 10 carbon atoms,-(CH 2 ) a- , -O (CH 2 ) a O-, -CH 2 O-, -OCH 2- , -O ( CH 2 ) 3 -,-(CH 2 ) 3 O-, -COO-, -OCO-, -CH = CH-, -CH = CHCOO-, -OCOCH = CH-,-(CH 2 ) 2 COO-, -OCO (CH 2 ) 2- , -CF = CF-, -C≡C-, -CH = N-, -N = CH-, -N = N-, -OCF 2- , or -CF 2 O-, The plurality of Z 3 may be the same or different. a is an integer of 1-20.

X為任意的氫可經鹵素、烷基、氟化烷基取代的1,4-伸苯基及茀-2,7-二基的取代基,表示鹵素、烷基或氟化烷基。X is a substituent of 1,4-phenylene and fluorene-2,7-diyl in which any hydrogen may be substituted with halogen, alkyl, or fluorinated alkyl, and represents halogen, alkyl, or fluorinated alkyl.

對所述化合物(1-2)的更佳的態樣進行說明。更佳的化合物(1-2)可以下述式(1-c)或式(1-d)表示。 P1 -Y-(A-Z)m -Ra (1-c) P1 -Y-(A-Z)m -Y-P1 (1-d) 所述式中,A、Y、Z、Ra 及m如上文所定義般,P1 表示下述式(2-1)~式(2-2)所表示的聚合性基。於所述式(1-d)的情況下,兩個P1 表示相同的聚合性基(2-1)~聚合性基(2-2),兩個Y表示相同的基,兩個Y是以成為對稱的方式鍵結。 [化22] A more preferable aspect of the compound (1-2) will be described. A more preferable compound (1-2) can be represented by the following formula (1-c) or (1-d). P 1 -Y- (AZ) m -R a (1-c) P 1 -Y- (AZ) m -YP 1 (1-d) In the formula, A, Y, Z, R a and m are as above As defined herein, P 1 represents a polymerizable group represented by the following formula (2-1) to formula (2-2). In the case of the formula (1-d), two P 1 represent the same polymerizable group (2-1) to polymerizable group (2-2), two Y represent the same group, and two Y are Bonded in a way that becomes symmetrical. [Chemical 22]

以下表示所述化合物(1-2)的更佳的具體例。More specific examples of the compound (1-2) are shown below.

[化23] [Chemical 23]

[化24] [Chemical 24]

[化25] [Chemical 25]

·化合物(1-1)(1-2)的合成方法 所述化合物(1-1)(1-2)可藉由組合有機合成化學中公知的方法而合成。將目標末端基、環結構及鍵結基導入至起始物質的方法例如於霍本-維勒(Houben-Wyle,有機化學方法(Methods of Organic Chemistry),格奧爾格蒂梅出版社(Georg Thieme Verlag),斯圖加特(Stuttgart))、有機合成(Organic Syntheses,約翰威立父子出版社(John Wily & Sons, Inc.))、有機反應(Organic Reactions,約翰威立父子出版社(John Wily & Sons Inc.))、綜合有機合成(Comprehensive Organic Synthesis,培格曼出版社(Pergamon Press))、新實驗化學講座(丸善)等成書中有所記載。另外,亦可參照日本專利特開2006-265527號公報。-Method for synthesizing compound (1-1) (1-2) The compound (1-1) (1-2) can be synthesized by a combination of methods known in organic synthetic chemistry. Methods for introducing target terminal groups, ring structures, and bonding groups into starting materials, such as Houben-Wyle (Methods of Organic Chemistry), Georg Thieme Verlag), Stuttgart), Organic Syntheses (John Wily & Sons, Inc.), Organic Reactions (John Wily & Sons Inc.) .)), Comprehensive Organic Synthesis (Pergamon Press), New Experimental Chemistry Lecture (Maruzen) and other books are recorded. Also, refer to Japanese Patent Laid-Open No. 2006-265527.

二官能以上的聚合性化合物(以下,有時簡稱為「聚合性化合物」)亦可為所述式(1-1)(1-2)所表示的聚合性化合物以外的聚合性化合物。例如可列舉:聚醚的二縮水甘油醚、雙酚A的二縮水甘油醚、雙酚F的二縮水甘油醚、雙酚的二縮水甘油醚、或式(1-2)的化合物中直線性不足且未表現出液晶性的化合物等。 所述聚合性化合物可藉由組合有機合成化學中公知的方法而合成。The difunctional or more functional polymerizable compound (hereinafter, simply referred to as “polymerizable compound”) may be a polymerizable compound other than the polymerizable compound represented by the formula (1-1) (1-2). For example, diglycidyl ether of polyether, diglycidyl ether of bisphenol A, diglycidyl ether of bisphenol F, diglycidyl ether of bisphenol, or linearity among compounds of formula (1-2) Compounds that are insufficient and do not exhibit liquid crystallinity. The polymerizable compound can be synthesized by a method known in combination organic synthetic chemistry.

本發明中使用的聚合性化合物為了形成與偶合劑的鍵而較佳為具有二官能以上的官能基,且包含為三官能以上或四官能以上的情況。進而,於聚合性化合物的長邊的兩端具有官能基的化合物可形成直線性鍵,因此較佳。 再者,利用聚合性化合物等的表面修飾若過少,則使填料間鍵結的分子過少,因此強度變低,若過多,則表現出玻璃轉移溫度等而強烈顯現出樹脂的性質。因此,理想的是根據所要求的特性來適宜調整表面修飾量。In order to form a bond with a coupling agent, the polymerizable compound used in the present invention preferably has a difunctional or higher functional group, and contains a trifunctional or higher functional group or a tetrafunctional or higher functional group. Furthermore, a compound having a functional group at both ends of the long side of the polymerizable compound is preferable because it can form a linear bond. In addition, when the surface modification by a polymerizable compound or the like is too small, the number of molecules bonded between fillers is too small, so that the strength is low. If it is too large, the glass transition temperature and the like are strongly exhibited, and the properties of the resin are strongly expressed. Therefore, it is desirable to appropriately adjust the surface modification amount according to the required characteristics.

[無機填料] 作為第1無機填料及第2無機填料,可列舉:氮化物、碳化物、碳材料、金屬氧化物、矽酸鹽礦物等。第1無機填料及第2無機填料可相同亦可不同。 具體而言,於第1無機填料、第2無機填料中,可列舉氮化硼、碳化硼、碳氮化硼、石墨、碳纖維、碳奈米管作為高導熱性且熱膨脹率非常小或為負的無機填料。或者,可列舉:礬土、二氧化矽、氧化鎂、氧化鋅、氧化鐵、鐵氧體、莫來石(mullite)、堇青石、氮化矽、及碳化矽。 或者,亦可於第1無機填料或第2無機填料的任一者中使用下述導熱率高且熱膨脹率為正的無機填料。[Inorganic filler] Examples of the first inorganic filler and the second inorganic filler include nitrides, carbides, carbon materials, metal oxides, and silicate minerals. The first inorganic filler and the second inorganic filler may be the same or different. Specifically, examples of the first inorganic filler and the second inorganic filler include boron nitride, boron carbide, boron carbonitride, graphite, carbon fiber, and carbon nanotubes as having high thermal conductivity and a very low or negative thermal expansion coefficient. Inorganic filler. Alternatively, alumina, silicon dioxide, magnesium oxide, zinc oxide, iron oxide, ferrite, mullite, cordierite, silicon nitride, and silicon carbide can be listed. Alternatively, an inorganic filler having a high thermal conductivity and a positive thermal expansion coefficient described below may be used for either the first inorganic filler or the second inorganic filler.

作為第3無機填料,較佳為導熱率高、或者與第1無機填料、第2無機填料相比尺寸小的、具有與第1無機填料、第2無機填料不同的熱膨脹率等的無機填料。例如可列舉:礬土、二氧化矽、氮化硼、碳化硼、碳化矽、氮化鋁、氮化矽、金剛石、碳奈米管、石墨、石墨烯、矽、氧化鈹(beryllia)、氧化鎂、氧化鋁、氧化鋅、氧化矽、氧化銅、氧化鈦、氧化鈰、氧化釔、氧化錫、氧化鈥、氧化鉍、氧化鈷、氧化鈣、氫氧化鎂、氫氧化鋁、金、銀、銅、鉑、鐵、錫、鉛、鎳、鋁、鎂、鎢、鉬、不鏽鋼(stainless)等無機填充材料及金屬填充材料。第3無機填料可未修飾,亦可經偶合劑修飾,還可經偶合劑與聚合性化合物修飾。The third inorganic filler is preferably an inorganic filler having a high thermal conductivity or a smaller size than the first inorganic filler and the second inorganic filler, and having a thermal expansion coefficient different from that of the first inorganic filler and the second inorganic filler. Examples include: alumina, silicon dioxide, boron nitride, boron carbide, silicon carbide, aluminum nitride, silicon nitride, diamond, carbon nanotubes, graphite, graphene, silicon, berylia, and oxidation Magnesium, aluminum oxide, zinc oxide, silicon oxide, copper oxide, titanium oxide, cerium oxide, yttrium oxide, tin oxide, oxide's, bismuth oxide, cobalt oxide, calcium oxide, magnesium hydroxide, aluminum hydroxide, gold, silver, Copper, platinum, iron, tin, lead, nickel, aluminum, magnesium, tungsten, molybdenum, stainless and other inorganic filling materials and metal filling materials. The third inorganic filler may be unmodified, modified with a coupling agent, or modified with a coupling agent and a polymerizable compound.

聚合性化合物的結構理想的是具有該些無機填料間可效率良好地直接鍵結的形狀及長度。無機填料的種類、形狀、大小、添加量等可根據目的而適宜選擇。於所獲得的放熱構件需要絕緣性的情況下,只要可保持所期望的絕緣性,則亦可為具有導電性的無機填料。作為無機填料的形狀,可列舉板狀、球狀、無定形、纖維狀、棒狀、筒狀等。The structure of the polymerizable compound desirably has a shape and a length capable of directly and efficiently bonding between these inorganic fillers. The type, shape, size, and addition amount of the inorganic filler can be appropriately selected according to the purpose. When the obtained heat radiation member requires insulation, as long as the desired insulation can be maintained, it may be an inorganic filler having conductivity. Examples of the shape of the inorganic filler include a plate shape, a spherical shape, an amorphous shape, a fibrous shape, a rod shape, and a cylindrical shape.

無機填料較佳為氮化硼、氮化鋁、氮化矽、碳化矽、石墨、碳纖維、碳奈米管。特佳為六方晶系的氮化硼(h-BN)或石墨。氮化硼、石墨因平面方向的導熱率非常高,且氮化硼的介電常數亦低,絕緣性亦高,因此較佳。例如,若使用板狀結晶的氮化硼,則於成型及硬化時,因原料的流動或壓力,板狀結構容易沿模具配向,因此較佳。The inorganic filler is preferably boron nitride, aluminum nitride, silicon nitride, silicon carbide, graphite, carbon fiber, or carbon nanotube. Particularly preferred is hexagonal boron nitride (h-BN) or graphite. Boron nitride and graphite are preferable because the thermal conductivity in the plane direction is very high, the dielectric constant of boron nitride is also low, and the insulation is also high. For example, if plate-shaped boron nitride is used, it is preferable that the plate-like structure is easily aligned along the mold due to the flow or pressure of the raw materials during molding and hardening.

無機填料的平均粒徑較佳為0.1 μm~200 μm。更佳為1 μm~100 μm。若為0.1 μm以上,則導熱率良好,若為200 μm以下,則可提高填充率。 再者,於本說明書中,平均粒徑是基於利用雷射(laser)繞射·散射法的粒度分佈測定。即,利用基於夫朗和斐(Fraunhofer)繞射理論及米氏(Mie)散射理論的分析,藉由濕式法,將粉體自某粒子徑分為兩種時,將大側與小側成為等量(體積基準)的直徑設為中值徑。 無機填料與偶合劑及聚合性化合物的比例依存於與使用的無機填料鍵結的偶合劑的量。用作第1無機填料、第2無機填料的化合物(例如氮化硼)如上所述於表面並無反應基,僅於側面存在反應基。較佳為使儘可能多的偶合劑鍵結於所述少的反應基,從而使與所述反應基的數量相等或稍多的有機化合物進行鍵結。偶合劑對無機填料的反應量主要根據無機填料的大小或使用的偶合劑的反應性而變化。例如,無機填料越大,則無機填料的側面的面積比越減小,因此修飾量少。雖欲使儘可能多的偶合劑反應,但若減小粒子,則產物的導熱率變低,因此較佳為取得平衡。 理想的是放熱構件中的偶合劑及聚合性化合物、與無機成分的體積比率理想為5:95~30:70的範圍,更理想為10:90~25:75。所謂無機成分,是指進行矽烷偶合劑處理等之前的無機原料。The average particle diameter of the inorganic filler is preferably from 0.1 μm to 200 μm. More preferably, it is 1 to 100 μm. When it is 0.1 μm or more, the thermal conductivity is good, and when it is 200 μm or less, the filling rate can be improved. In addition, in this specification, an average particle diameter is a particle size distribution measurement based on the laser diffraction and scattering method. That is, using the analysis based on the Fraunhofer diffraction theory and Mie scattering theory to divide the powder from a particle diameter into two by the wet method, the large side and the small side are divided. The diameter which becomes an equivalent amount (volume basis) is set as a median diameter. The ratio of the inorganic filler to the coupling agent and the polymerizable compound depends on the amount of the coupling agent bonded to the inorganic filler used. As described above, the compound (for example, boron nitride) used as the first inorganic filler and the second inorganic filler has no reactive group on the surface and a reactive group exists only on the side surface. It is preferable that as many coupling agents as possible be bonded to the few reactive groups, so that organic compounds having the same or slightly more reactive groups are bonded. The reaction amount of the coupling agent to the inorganic filler mainly changes depending on the size of the inorganic filler or the reactivity of the coupling agent used. For example, the larger the inorganic filler, the smaller the area ratio of the side surface of the inorganic filler, and therefore the smaller the modification amount. Although it is intended to react as many coupling agents as possible, if the particles are reduced, the thermal conductivity of the product will be low, and therefore it is preferable to achieve equilibrium. The volume ratio of the coupling agent, the polymerizable compound, and the inorganic component in the exothermic member is preferably in a range of 5:95 to 30:70, and more preferably 10:90 to 25:75. The inorganic component refers to an inorganic raw material before being subjected to a silane coupling agent treatment or the like.

[偶合劑] 鍵結於無機填料的偶合劑具有可與二官能以上的聚合性化合物所具有的官能基鍵結的官能基。作為偶合劑,可列舉下述式(3-1)所表示的矽烷偶合劑。 (R1 -O)j -Si(R5 )3-j -(R2 )k -(R3 )k -(R4 )k -Ry (3-1) 所述式(3-1)中, R1 為H-、或CH3 -(CH2 )0 4 -; R2 為-(CH2 )0 3 -O-; R3 為1,3-伸苯基、1,4-伸苯基、萘-2,6-二基、或萘-2,7-二基; R4 為-(NH)0 1 -(CH2 )0 3 -; R5 為H-、或CH3 -(CH2 )0 7 -; Ry為氧雜環丙基、氧雜環丁基、胺基、乙烯基、羧酸酐殘基、或包含該些結構的任一聚合性基; j為0~3的整數; k為0~1的整數; 式(3-1)包含R3 與R4 的至少一者。[Coupling Agent] The coupling agent bonded to the inorganic filler has a functional group capable of bonding to a functional group of a difunctional or more polymerizable compound. Examples of the coupling agent include a silane coupling agent represented by the following formula (3-1). (R 1 -O) j -Si (R 5 ) 3-j- (R 2 ) k- (R 3 ) k- (R 4 ) k -Ry (3-1) In the formula (3-1), , R 1 is H-, or CH 3- (CH 2 ) 0 to 4- ; R 2 is-(CH 2 ) 0 to 3 -O-; R 3 is 1,3-phenylene, 1,4- Phenylene, naphthalene-2,6-diyl, or naphthalene-2,7-diyl; R 4 is-(NH) 0 to 1- (CH 2 ) 0 to 3- ; R 5 is H-, or CH 3- (CH 2 ) 0 to 7- ; Ry is oxetanyl, oxetanyl, amino, vinyl, carboxylic anhydride residue, or any polymerizable group containing these structures; j Is an integer of 0 to 3; k is an integer of 0 to 1; Formula (3-1) includes at least one of R 3 and R 4 .

於二官能以上的聚合性化合物所具有的官能基為氧雜環丙基或酸酐殘基等的情況下,較佳為與該些官能基反應,因此較佳為於末端具有胺系反應基。例如可列舉捷恩智(JNC)(股)製造的塞拉艾斯(Sila-Ace)(註冊商標)S310、塞拉艾斯(Sila-Ace)S320、塞拉艾斯(Sila-Ace)S330、塞拉艾斯(Sila-Ace)S360、信越化學工業(股)製造的KBM903、KBE903等。 於二官能以上的聚合性化合物的末端為胺的情況下,較佳為於末端具有氧雜環丙基等的偶合劑。例如可列舉捷恩智(JNC)(股)製造的塞拉艾斯(Sila-Ace)(註冊商標)S510、塞拉艾斯(Sila-Ace)S530等。 作為形成偶合劑與聚合性化合物的鍵的官能基的組合,例如可列舉氧雜環丙基與胺基、乙烯基彼此、甲基丙烯醯氧基彼此、羧基或羧酸酐殘基與胺、咪唑與氧雜環丙基等組合,但並不限於該些。只要為可形成偶合劑與聚合性化合物的鍵的官能基的組合即可。更佳為耐熱性高的組合。 利用偶合劑的無機填料的修飾越多則鍵越增多,因此較佳。第1偶合劑與第2偶合劑可相同亦可不同。When the functional group possessed by the difunctional or more polymerizable compound is an oxetanyl group or an acid anhydride residue, it is preferred to react with these functional groups, and therefore it is preferable to have an amine-based reactive group at the terminal. For example, Sila-Ace (registered trademark) S310, Sila-Ace S320, Sila-Ace S330 manufactured by JNC (stock), Sila-Ace S360, KBM903 and KBE903 manufactured by Shin-Etsu Chemical Industry Co., Ltd. When the terminal of the difunctional or more polymerizable compound is an amine, a coupling agent such as an oxetanyl group at the terminal is preferred. For example, Sila-Ace (registered trademark) S510, Sila-Ace S530 manufactured by JNC Corporation, etc. can be cited. Examples of the combination of the functional groups that form a bond between the coupling agent and the polymerizable compound include oxepropyl groups and amine groups, vinyl groups, methacryloxy groups, carboxyl or carboxylic anhydride residues, amines, and imidazoles. It is combined with oxetanyl and the like, but is not limited to these. What is necessary is just the combination of the functional group which can form the bond of a coupling agent and a polymerizable compound. More preferred is a combination with high heat resistance. The more the inorganic filler using a coupling agent is modified, the more the bond is increased, and therefore, it is preferable. The first coupling agent and the second coupling agent may be the same or different.

[其他構成要素] 放熱構件用組成物可進而包含第1無機填料及第2無機填料所未鍵結的、即並不有助於鍵結的有機化合物(例如聚合性化合物或高分子化合物),亦可包含聚合起始劑或溶媒等。[Other components] The composition for an exothermic member may further include an organic compound (such as a polymerizable compound or a polymer compound) that is not bonded by the first inorganic filler and the second inorganic filler, that is, does not contribute to the bonding, A polymerization initiator or a solvent may be included.

[未鍵結的聚合性化合物] 放熱構件用組成物亦可以無機填料所未鍵結的聚合性化合物(該情況下,亦可未必為二官能以上)作為構成要素。此種聚合性化合物較佳為不會妨礙無機填料的熱硬化且不會因加熱而蒸發或滲出的化合物。該聚合性化合物被分類為不具有液晶性的化合物與具有液晶性的化合物。作為不具有液晶性的聚合性化合物,可列舉:乙烯衍生物、苯乙烯衍生物、(甲基)丙烯酸衍生物、山梨酸(sorbic acid)衍生物、富馬酸衍生物、衣康酸衍生物等。關於含量,理想的是首先製作不含未鍵結的聚合性化合物的放熱構件用組成物,測定其空隙率,從而添加填埋其空隙的量的聚合性化合物。[Unbonded polymerizable compound] The composition for an exothermic member may be a polymerizable compound (in this case, it may not necessarily be difunctional or more) that is not bonded by the inorganic filler as a constituent element. Such a polymerizable compound is preferably a compound that does not prevent thermal curing of the inorganic filler and does not evaporate or bleed out by heating. This polymerizable compound is classified into a compound having no liquid crystallinity and a compound having liquid crystallinity. Examples of the polymerizable compound having no liquid crystallinity include ethylene derivatives, styrene derivatives, (meth) acrylic acid derivatives, sorbic acid derivatives, fumaric acid derivatives, and itaconic acid derivatives. Wait. Regarding the content, it is desirable to first prepare a composition for an exothermic member that does not contain an unbonded polymerizable compound, and measure the porosity to add a polymerizable compound in an amount to fill the void.

[未鍵結的高分子化合物] 放熱構件用組成物亦可以無機填料所未鍵結的高分子化合物作為構成要素。此種高分子化合物較佳為不會使膜形成性及機械強度降低的化合物。該高分子化合物只要為不與無機填料、偶合劑、及聚合性化合物反應的高分子化合物即可,例如於聚合性化合物為氧雜環丙基且矽烷偶合劑具有胺基的情況下,可列舉:聚烯烴系樹脂、聚乙烯系樹脂、矽酮樹脂、蠟等。關於含量,理想的是首先製作不含未鍵結的高分子化合物的放熱構件用組成物,測定其空隙率,從而添加填埋其空隙的量的高分子化合物。[Unbonded polymer compound] The composition for an exothermic member may include a polymer compound not bonded to the inorganic filler as a constituent element. Such a polymer compound is preferably a compound that does not reduce film-forming properties and mechanical strength. The polymer compound may be a polymer compound that does not react with an inorganic filler, a coupling agent, and a polymerizable compound. For example, when the polymerizable compound is an oxetanyl group and the silane coupling agent has an amine group, examples thereof include: : Polyolefin resin, polyethylene resin, silicone resin, wax, etc. Regarding the content, it is desirable to first prepare a composition for an exothermic member that does not contain an unbonded polymer compound, and measure the porosity thereof to add a polymer compound in an amount that fills the void.

[非聚合性的液晶性化合物] 放熱構件用組成物亦可以不具有聚合性基的液晶性化合物作為構成要素。此種非聚合性的液晶性化合物的例子於作為液晶性化合物的資料庫(date base)的液晶(LiqCryst,LCI出版社(LCI Publisher GmbH),漢堡市(Hamburg),德國(Germany))等中有所記載。可藉由使含有非聚合性的液晶性化合物的該組成物聚合而獲得例如化合物(1-2)的聚合物與液晶性化合物的複合材(composite materials)。此種複合材中,於如高分子分散型液晶般的高分子網狀物中存在非聚合性的液晶性化合物。藉此,理想的是具有如於使用的溫度區域中無流動性般的特性的液晶性化合物。可使無機填料硬化後,以於示出各向同性相的溫度區域中注入其空隙的方法進行複合化,亦可於無機填料中混合預先以填埋空隙的方式計算出的分量的液晶性化合物,從而使無機填料彼此聚合。[Non-polymerizable liquid crystal compound] The composition for an exothermic member may include a liquid crystal compound having no polymerizable group as a constituent element. Examples of such non-polymerizable liquid crystal compounds are liquid crystals (LiqCryst, LCI Publisher GmbH, Hamburg, Germany) and the like as a date base of liquid crystal compounds. Be documented. By polymerizing the composition containing a non-polymerizable liquid crystal compound, for example, a composite material of a polymer of the compound (1-2) and a liquid crystal compound can be obtained. In such a composite material, a non-polymerizable liquid crystal compound exists in a polymer network such as a polymer dispersed liquid crystal. Accordingly, a liquid crystal compound having characteristics such as no fluidity in a temperature region to be used is desirable. After the inorganic filler is hardened, it is compounded by injecting voids in a temperature region showing an isotropic phase, and a liquid crystal compound of a component calculated in advance to fill the voids may be mixed with the inorganic filler. , Thereby polymerizing the inorganic fillers with each other.

[聚合起始劑] 放熱構件用組成物亦可以聚合起始劑作為構成要素。聚合起始劑只要根據該組成物的構成要素及聚合方法使用例如光自由基聚合起始劑、光陽離子聚合起始劑、熱自由基聚合起始劑等即可。特別是因無機填料會吸收紫外線,因此較佳為熱自由基聚合起始劑。 作為熱自由基聚合用的較佳的起始劑,例如可列舉:過氧化苯甲醯、過氧化二碳酸二異丙酯、過氧化-2-乙基己酸第三丁酯、過氧化特戊酸第三丁酯、二-第三丁基過氧化物(DTBPO)、過氧化二異丁酸第三丁酯、過氧化月桂醯、2,2'-偶氮雙異丁酸二甲酯(MAIB)、偶氮雙異丁腈(AIBN)、偶氮雙環己烷碳腈(ACN)等。[Polymerization initiator] The composition for an exothermic member may have a polymerization initiator as a constituent element. The polymerization initiator may be, for example, a photoradical polymerization initiator, a photocationic polymerization initiator, a thermal radical polymerization initiator, or the like depending on the constituent elements and the polymerization method of the composition. In particular, since the inorganic filler absorbs ultraviolet rays, a thermal radical polymerization initiator is preferred. Examples of preferred initiators for thermal radical polymerization include benzamidine peroxide, diisopropyl peroxydicarbonate, tert-butyl peroxy-2-ethylhexanoate, and peroxytetracycline. Tertiary butyl valerate, di-tertiary butyl peroxide (DTBPO), tertiary butyl diisobutyrate, lauryl peroxide, dimethyl 2,2'-azobisisobutyrate (MAIB), azobisisobutyronitrile (AIBN), azobiscyclohexanecarbonitrile (ACN), and the like.

[溶媒] 放熱構件用組成物亦可含有溶媒。於該組成物中包含必須聚合的構成要素的情況下,聚合可於溶媒中進行,亦可於無溶媒下進行。藉由例如旋塗法(spin coat method)等將含有溶媒的該組成物塗佈於基板上後,去除溶媒後使其進行光聚合。或者,亦可於光硬化後加溫至適當的溫度,藉由熱硬化而進行後處理。 作為較佳的溶媒,例如可列舉:苯、甲苯、二甲苯、均三甲苯、己烷、庚烷、辛烷、壬烷、癸烷、四氫呋喃、γ-丁內酯、N-甲基吡咯啶酮、二甲基甲醯胺、二甲基亞碸、環己烷、甲基環己烷、環戊酮、環己酮、丙二醇單甲醚乙酸酯(propylene glycol monomethyl ether acetate,PGMEA)等。所述溶媒可單獨使用一種,亦可混合使用兩種以上。 再者,限定聚合時的溶媒的使用比例並無太大意義,只要考慮聚合效率、溶媒成本(cost)、能量(energy)成本等而按各事例(case)分別決定即可。[Solvent] The composition for an exothermic member may contain a solvent. When the composition which needs to be polymerized is contained in the composition, the polymerization may be performed in a solvent or may be performed without a solvent. This composition containing a solvent is applied to a substrate by, for example, a spin coat method, and then the solvent is removed and then photopolymerized. Alternatively, it may be heated to an appropriate temperature after photo-hardening, and post-processed by thermal hardening. Examples of preferred solvents include benzene, toluene, xylene, mesitylene, hexane, heptane, octane, nonane, decane, tetrahydrofuran, γ-butyrolactone, and N-methylpyrrolidine. Ketones, dimethylformamide, dimethylmethylene, cyclohexane, methylcyclohexane, cyclopentanone, cyclohexanone, propylene glycol monomethyl ether acetate (PGMEA), etc. . The solvents may be used singly or in combination of two or more kinds. In addition, it does not make much sense to limit the use ratio of the solvent during the polymerization, as long as the efficiency of the polymerization, the cost of the solvent, and the cost of energy are taken into consideration and determined for each case.

[其他] 為了使操作變得容易,亦可於放熱構件用組成物中添加穩定劑。此種穩定劑可無限制地使用公知者,例如可列舉對苯二酚(hydroquinone)、4-乙氧基苯酚及3,5-二-第三丁基-4-羥基甲苯(BHT)等。 進而,亦可為了調整放熱構件用組成物的黏度或顏色而添加添加劑(氧化物等)。例如可列舉:用以形成白色的氧化鈦、用以形成黑色的碳黑、用以調整黏度的二氧化矽的微粉末。另外,亦可為了進一步增加機械強度而添加添加劑。例如可列舉:玻璃纖維、碳纖維、碳奈米管等無機纖維或布(cloth)、或作為高分子添加劑的聚乙烯甲醛、聚乙烯丁醛、聚酯、聚醯胺、聚醯亞胺等纖維或長分子。[Others] In order to facilitate handling, a stabilizer may be added to the composition for an exothermic member. Such a stabilizer can be used without limitation, and examples thereof include hydroquinone, 4-ethoxyphenol, and 3,5-di-third-butyl-4-hydroxytoluene (BHT). Furthermore, additives (oxides, etc.) may be added in order to adjust the viscosity or color of the composition for a heat radiation member. Examples include fine powders of titanium oxide to form white, carbon black to form black, and silicon dioxide to adjust viscosity. In addition, additives may be added in order to further increase the mechanical strength. Examples include inorganic fibers such as glass fibers, carbon fibers, and carbon nanotubes, or cloth, or fibers such as polyvinyl formaldehyde, polyvinyl butyral, polyester, polyamide, and polyimide as polymer additives. Or long molecules.

[製造方法] 以下,對製造放熱構件用組成物的方法及由該組成物製造放熱構件的方法進行具體說明。 (1)實施偶合處理 對第1無機填料實施偶合處理,並使偶合劑的一端與第1無機填料鍵結。偶合處理可使用公知的方法。 作為一例,首先,將無機填料與偶合劑添加至溶媒中。使用攪拌器(stirrer)等加以攪拌後進行乾燥。於溶媒乾燥後,使用真空乾燥機等於真空條件下進行加熱處理。於該無機填料中添加溶媒,藉由超音波處理進行粉碎。使用離心分離機對該溶液進行分離精製。捨棄上清液後,添加溶媒進行多次相同的操作。使用烘箱使精製後的實施了偶合處理的無機填料乾燥。 (2)利用聚合性化合物進行修飾 對第2無機填料實施偶合處理(或亦可使用實施了偶合處理的所述第1無機填料作為的2無機填料),進而使二官能以上的聚合性化合物與偶合劑的另一端鍵結。 作為一例,使用瑪瑙研缽等將經偶合處理的無機填料與二官能以上的聚合性化合物混合後,使用雙輥等進行混練。其後,藉由超音波處理及離心分離進行分離精製。 (3)進行混合 例如以僅無機填料的重量成為1:1的方式秤量第1無機填料與第2無機填料,利用瑪瑙研缽等進行混合。其後,使用雙輥等進行混合,獲得放熱構件用組成物。 關於第1無機填料與第2無機填料的混合比例,於形成第1無機填料與第2無機填料間的鍵的鍵結基分別為胺:環氧基的情況下,僅無機填料的重量例如以重量比計較佳為1:1~1:30,更佳為1:3~1:20。混合比例由形成第1無機填料與第2無機填料間的鍵的末端的鍵結基的數量決定,例如,若為二級胺,則可與兩個氧雜環丙基進行反應,因此與氧雜環丙基側相比可為少量,亦有氧雜環丙基側開環的可能性,從而較佳為增加根據環氧當量所計算的量而使用。 (4)製造放熱構件 作為一例,對使用放熱構件用組成物製造作為放熱構件的膜的方法進行說明。使用壓縮成形機將放熱構件用組成物夾於加熱板中,藉由壓縮成形進行配向·硬化成形。進而,使用烘箱等進行後硬化,獲得放熱構件。再者,壓縮成形時的壓力較佳為50 kgf/cm2 ~200 kgf/cm2 ,更佳為70 kgf/cm2 ~180 kgf/cm2 。硬化時的壓力基本上以高為佳。然而,較佳為根據模具的流動性或目標物性(重視哪一方向的導熱率等)而適宜變更,施加適當的壓力。[Manufacturing Method] Hereinafter, a method for manufacturing a composition for a heat radiation member and a method for manufacturing a heat radiation member from the composition will be specifically described. (1) Coupling treatment is performed on the first inorganic filler, and one end of the coupling agent is bonded to the first inorganic filler. For the coupling treatment, a known method can be used. As an example, first, an inorganic filler and a coupling agent are added to a solvent. Stir with a stirrer or the like and dry. After the solvent is dried, a vacuum dryer is used to perform heat treatment under vacuum conditions. A solvent is added to this inorganic filler, and it is pulverized by ultrasonic treatment. This solution was separated and purified using a centrifugal separator. After discarding the supernatant, the solvent was added to perform the same operation multiple times. The purified inorganic filler subjected to the coupling treatment was dried using an oven. (2) Modification with a polymerizable compound: A second inorganic filler is subjected to a coupling treatment (or the first inorganic filler subjected to the coupling treatment may be used as a 2 inorganic filler), and the difunctional polymerizable compound or more The other end of the coupling agent is bonded. As an example, the coupling-treated inorganic filler is mixed with a difunctional or more polymerizable compound using an agate mortar or the like, and then kneaded using a double roll or the like. Thereafter, separation and purification were performed by ultrasonic treatment and centrifugation. (3) Mixing For example, the first inorganic filler and the second inorganic filler are weighed so that only the weight of the inorganic filler becomes 1: 1, and mixed with an agate mortar or the like. Thereafter, they are mixed using a double roll or the like to obtain a composition for a heat radiation member. Regarding the mixing ratio of the first inorganic filler and the second inorganic filler, when the bonding groups that form the bond between the first inorganic filler and the second inorganic filler are amine: epoxy, respectively, the weight of the inorganic filler is, for example, The weight ratio is preferably 1: 1 to 1:30, and more preferably 1: 3 to 1:20. The mixing ratio is determined by the number of bonding groups that form the end of the bond between the first inorganic filler and the second inorganic filler. For example, if it is a secondary amine, it can react with two oxetanyl groups. The heterocyclopropyl side may be a small amount compared with the possibility of ring opening of the oxecyclopropyl side, and therefore it is preferably used by increasing the amount calculated based on the epoxy equivalent. (4) Production of a heat radiation member As an example, a method of manufacturing a film as a heat radiation member using a composition for a heat radiation member will be described. The composition for a heat radiation member was sandwiched in a hot plate using a compression molding machine, and orientation and hardening molding were performed by compression molding. Further, post-curing is performed using an oven or the like to obtain an exothermic member. The pressure during compression molding is preferably 50 kgf / cm 2 to 200 kgf / cm 2 , and more preferably 70 kgf / cm 2 to 180 kgf / cm 2 . The pressure during hardening is preferably high. However, it is preferable to appropriately change according to the fluidity of the mold or the target physical properties (in which direction the thermal conductivity is important, etc.), and to apply an appropriate pressure.

以下,對使用含有溶媒的放熱構件用組成物製造作為放熱構件的膜的方法進行具體說明。 首先,於基板上塗佈該組成物並將溶媒乾燥去除而形成膜厚均勻的塗膜層。作為塗佈方法,例如可列舉:旋塗、輥塗(roll coat)、簾塗(curtain coat)、流塗(flow coat)、印刷(print)、微凹版塗佈(microgravure coat)、凹版塗佈(gravure coat)、線棒塗佈(wire bar coat)、浸漬塗佈(dip coat)、噴塗(spray coat)、彎月面塗佈法(meniscus coat method)等。 溶媒的乾燥去除例如可藉由在室溫下的風乾、利用加熱板(hot plate)的乾燥、利用乾燥爐的乾燥、溫風或熱風的吹送等進行。溶媒去除的條件並無特別限定,只要乾燥至將溶媒大致去除,塗膜層的流動性消失即可。Hereinafter, the method of manufacturing the film as a heat radiation member using the composition for heat radiation members containing a solvent is demonstrated concretely. First, the composition is applied on a substrate and the solvent is dried and removed to form a coating film layer having a uniform film thickness. Examples of the coating method include spin coating, roll coat, curtain coat, flow coat, print, microgravure coat, and gravure coating. (Gravure coat), wire bar coat, dip coat, spray coat, meniscus coat method, and the like. The drying and removal of the solvent can be performed, for example, by air-drying at room temperature, drying by a hot plate, drying by a drying furnace, or blowing by warm air or hot air. The conditions for removing the solvent are not particularly limited, as long as it is dried until the solvent is substantially removed, and the fluidity of the coating film layer disappears.

作為所述基板,例如可列舉:銅、鋁、鐵等金屬基板;矽、氮化矽、氮化鎵、氧化鋅等無機半導體基板;鹼玻璃(alkali glass)、硼矽酸玻璃、火石玻璃(flint glass)等玻璃基板、礬土、氮化鋁等無機絕緣基板;聚醯亞胺、聚醯胺醯亞胺、聚醯胺、聚醚醯亞胺、聚醚醚酮、聚醚酮、聚酮硫醚、聚醚碸、聚碸、聚苯硫醚、聚苯醚、聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯、聚縮醛、聚碳酸酯、聚芳酯、丙烯酸樹脂、聚乙烯醇、聚丙烯、纖維素、三乙醯纖維素或其部分皂化物、環氧樹脂、酚樹脂、降冰片烯樹脂等塑膠膜(plastic film)基板等。Examples of the substrate include metal substrates such as copper, aluminum, and iron; inorganic semiconductor substrates such as silicon, silicon nitride, gallium nitride, and zinc oxide; alkali glass, borosilicate glass, and flint glass ( flint glass) and other glass substrates, alumina, aluminum nitride, and other inorganic insulating substrates; polyimide, polyimide, imine, polyimide, polyetherimide, polyetheretherketone, polyetherketone, polyimide Keto sulfide, polyether fluorene, polyfluorene, polyphenylene sulfide, polyphenylene ether, polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyacetal, Polycarbonate, Polyarylate, Acrylic Resin, Polyvinyl Alcohol, Polypropylene, Cellulose, Triethylpyrene Cellulose or Partial Saponified, Epoxy Resin, Phenolic Resin, Norbornene Resin and Other Plastic Films Substrate, etc.

所述膜基板可為單軸延伸膜,亦可為雙軸延伸膜。所述膜基板亦可預先實施皂化處理、電暈處理(corona treatment)、電漿處理(plasma treatment)等表面處理。再者,亦可於該些膜基板上形成不會被所述放熱構件用組成物中所含的溶媒侵蝕的保護層。用作保護層的材料可列舉例如聚乙烯醇。進而,亦可形成增黏塗層(anchor coat layer)以提高保護層與基板的密著性。此種增黏塗層只要為提高保護層與基板的密著性者,則可為無機系及有機系的任一種材料。The film substrate may be a uniaxially stretched film or a biaxially stretched film. The film substrate may be previously subjected to a surface treatment such as a saponification treatment, a corona treatment, or a plasma treatment. Furthermore, a protective layer which is not corroded by the solvent contained in the composition for a heat radiation member may be formed on these film substrates. Examples of the material used as the protective layer include polyvinyl alcohol. Furthermore, an anchor coat layer may be formed to improve the adhesion between the protective layer and the substrate. Such a tackifier coating may be any of an inorganic type and an organic type as long as it improves the adhesion between the protective layer and the substrate.

以上,對由經偶合處理的無機填料與經偶合處理進而利用聚合性化合物進行了修飾的無機填料構成無機填料彼此的鍵的情況進行了說明。再者,於本發明中重要的是實現所述般的無機填料間的鍵,亦可預先使用有機合成技術而使偶合劑與聚合性化合物鍵結,其後使該偶合劑與第2無機填料鍵結。例如,利用具有胺基的矽烷偶合劑對第1無機填料進行偶合處理。其次,利用於末端分別具有乙烯基與環氧基的聚合性化合物對具有乙烯基的矽烷偶合劑進行修飾後,利用該矽烷偶合劑對第2無機填料進行偶合處理。最後,使第1無機填料側的胺基與第2無機填料側的聚合性化合物所具有的環氧基鍵結。 或者,可僅使用經偶合處理後進而利用聚合性化合物進行了修飾的無機填料,藉由適當的聚合起始劑等使聚合性化合物彼此鍵結,於無機填料間形成鍵。Hereinabove, the case where the bonds between the inorganic fillers are constituted by the inorganic fillers subjected to the coupling treatment and the inorganic fillers subjected to the coupling treatment and further modified with a polymerizable compound has been described. In addition, it is important in the present invention to realize the above-mentioned bonds between the inorganic fillers, and the coupling agent and the polymerizable compound may be bonded in advance using an organic synthesis technique, and then the coupling agent and the second inorganic filler may be used. Bonding. For example, the first inorganic filler is subjected to a coupling treatment with a silane coupling agent having an amine group. Next, a silane coupling agent having a vinyl group is modified with a polymerizable compound having a vinyl group and an epoxy group at each terminal, and then the second inorganic filler is coupled with the silane coupling agent. Finally, the amine group on the first inorganic filler side and the epoxy group on the polymerizable compound on the second inorganic filler side are bonded. Alternatively, only an inorganic filler modified by a coupling compound and then modified with a polymerizable compound may be used, and the polymerizable compounds may be bonded to each other with an appropriate polymerization initiator or the like to form a bond between the inorganic fillers.

所述化合物(1-2)越具有大量的環,則於更高的溫度下越不易軟化,因此,作為放熱材料而較佳。如此,若聚合性化合物為多環,則耐熱性變高,且若直線性高,則無機填料間的由熱引起的延伸或波動少,進而可效率良好地傳遞熱的聲子傳導,因此較佳。若為多環且直線性高,則結果多數情況下表現出液晶性,因此若為液晶性,則可謂導熱變良好。 然而,得知於使用所述式(1-1)所表示的二官能以上的聚合性化合物作為二官能以上的聚合性化合物的情況下,亦可獲得高導熱性、高耐熱性。化合物(1-1)與化合物(1-2)相比,分子鏈短,容易合成,容易操作,因此較佳。The more the compound (1-2) has a large number of rings, the harder it is to soften at a higher temperature, and therefore, it is preferable as an exothermic material. As described above, if the polymerizable compound is polycyclic, heat resistance is increased, and if linearity is high, heat-induced extension or fluctuation between the inorganic fillers is small, and phonon conduction of heat can be efficiently transmitted. good. If it is polycyclic and has high linearity, as a result, liquid crystallinity is often exhibited. Therefore, if it is liquid crystallinity, it can be said that the thermal conductivity is improved. However, it was found that when a difunctional or more functional polymerizable compound represented by the formula (1-1) is used as the difunctional or more functional polymerizable compound, high thermal conductivity and high heat resistance can also be obtained. Compared with compound (1-2), compound (1-1) has a shorter molecular chain, is easier to synthesize, and is easier to handle, so it is preferred.

[放熱構件] 本發明的第2實施形態的放熱構件是根據用途而成形使所述第1實施形態的放熱構件用組成物硬化而成的硬化物所得者。該硬化物具有高導熱性、高耐熱性,並且熱膨脹率為負或為非常小的正,化學穩定性、硬度及機械強度等優異。再者,所述機械強度是指楊氏係數(Young's modulus)、拉伸強度、撕裂強度、彎曲強度、彎曲彈性係數、衝擊強度等。 本發明的放熱構件於放熱板、放熱片、放熱膜、放熱接著材、放熱成形品等中有用。[Exothermic member] The exothermic member according to the second embodiment of the present invention is a cured product obtained by molding and curing the composition for an exothermic member according to the first embodiment according to the application. This hardened material has high thermal conductivity and high heat resistance, and has a negative or very small thermal expansion coefficient, and is excellent in chemical stability, hardness, and mechanical strength. In addition, the mechanical strength refers to Young's modulus, tensile strength, tear strength, flexural strength, flexural modulus of elasticity, impact strength, and the like. The heat radiation member of the present invention is useful for a heat radiation plate, a heat radiation sheet, a heat radiation film, a heat radiation adhesive, a heat radiation molded product, and the like.

作為藉由熱聚合而使放熱構件用組成物硬化的條件,熱硬化溫度為室溫~350℃、較佳為室溫~250℃、更佳為50℃~200℃的範圍,硬化時間為5秒~10小時、較佳為1分鐘~5小時、更佳為5分鐘~1小時的範圍。聚合後較佳為進行緩冷以抑制應力應變等。另外,亦可進行再加熱處理而緩和應變等。As a condition for curing the composition for an exothermic member by thermal polymerization, the thermal curing temperature is from room temperature to 350 ° C, preferably from room temperature to 250 ° C, more preferably from 50 ° C to 200 ° C, and the curing time is 5 It is in the range of seconds to 10 hours, preferably 1 minute to 5 hours, and more preferably 5 minutes to 1 hour. After the polymerization, it is preferable to perform slow cooling to suppress stress and strain. In addition, a reheating treatment may be performed to reduce strain or the like.

本申請案的放熱構件由所述放熱構件用組成物形成,以片、膜、薄膜、纖維、成形體等形狀使用。較佳的形狀為板、片、膜及薄膜。再者,本說明書中的片的膜厚為1 mm以上,膜的膜厚為5 μm以上,較佳為10 μm~500 μm,更佳為20 μm~300 μm,薄膜的膜厚小於5 μm。膜厚只要根據用途而適宜變更即可。The heat radiation member of the present application is formed of the composition for a heat radiation member, and is used in the shape of a sheet, a film, a film, a fiber, a molded body, or the like. Preferred shapes are plates, sheets, films and films. Moreover, the film thickness of the sheet in this specification is 1 mm or more, the film thickness of the film is 5 μm or more, preferably 10 μm to 500 μm, more preferably 20 μm to 300 μm, and the film thickness of the film is less than 5 μm . The film thickness may be appropriately changed depending on the application.

[電子機器] 本發明的第3實施形態的電子機器包括所述第2實施形態的放熱構件、以及具有發熱部的電子裝置。放熱構件是以與所述發熱部接觸的方式配置於電子裝置。放熱構件的形狀可為放熱電子基板、放熱板、放熱片、放熱膜、放熱接著材、放熱成形品等任一種。 例如電子裝置可列舉半導體元件。本申請案的放熱構件除了高導熱性以外亦具有高耐熱性、高絕緣性。因此,半導體元件中,對於因高電力而需要更有效率的放熱機構的絕緣閘雙極電晶體(Insulated Gate Bipolar Transistor,IGBT)特別有效。IGBT是半導體元件之一,是將金氧半導體場效電晶體(Metal-Oxide-Semiconductor Field-Effect Transistor,MOSFET)組入至閘極部而成的雙極電晶體,可用於電力控制的用途。具備IGBT的電子機器可列舉大電力反相器(inverter)的主轉換元件、無停電電源裝置、交流電動機的可變電壓可變頻率控制裝置、鐵道車輛的控制裝置、混合動力汽車、電車(electric car)等的電動輸送機器、感應加熱(induction heat,IH)調理器等。[Electronic device] An electronic device according to a third embodiment of the present invention includes the heat-radiating member according to the second embodiment, and an electronic device having a heat generating portion. The heat radiation member is disposed on the electronic device so as to be in contact with the heat generating portion. The shape of the heat release member may be any of a heat release electronic substrate, a heat release plate, a heat release sheet, a heat release film, a heat release adhesive, a heat release molded product, and the like. Examples of the electronic device include a semiconductor device. The exothermic member of the present application has high heat resistance and high insulation in addition to high thermal conductivity. Therefore, semiconductor devices are particularly effective for insulated gate bipolar transistors (IGBTs) that require a more efficient heat dissipation mechanism due to high power. IGBT is one of the semiconductor components. It is a bipolar transistor formed by combining a metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) into the gate, which can be used for power control applications. Examples of electronic devices equipped with IGBT include main converter elements of high-power inverters, non-stop power supply devices, variable voltage and frequency control devices for AC motors, control devices for railway vehicles, hybrid vehicles, and electric vehicles (electric car) and other electric conveyors, induction heat (IH) conditioners, etc.

以上,本發明為於無機材料與有機化合物的複合化中,利用有機化合物於無機材料間形成鍵,從而使導熱性、耐熱性顯著提高,進而可控制熱膨脹率者。再者,所述官能基為例示,只要可獲得本發明的效果則並不限於所述官能基。 [實施例]As described above, in the compounding of an inorganic material and an organic compound, the present invention uses organic compounds to form a bond between the inorganic materials, thereby significantly improving thermal conductivity and heat resistance, and further controlling the thermal expansion rate. It should be noted that the functional group is an example, and is not limited to the functional group as long as the effect of the present invention can be obtained. [Example]

以下,使用實施例對本發明進行詳細說明。然而,本發明並不限定於以下實施例中所記載的內容。Hereinafter, the present invention will be described in detail using examples. However, the present invention is not limited to the contents described in the following examples.

本發明的實施例中所使用的構成放熱構件的成分材料如下所述。 <無機填料> ·氮化硼:h-BN粒子,日本邁圖高新材料(Momentive Performance Materials Japan)(合)製造,(商品名)帕拉姆(PolarTherm)PTX-25 ·氮化硼:h-BN粒子,日本電氣化學(denka)(股)製造,(商品名)SGP ·礬土:日本電氣化學(denka)(股)製造,(商品名)DAW-20The component materials constituting the heat radiation member used in the examples of the present invention are as follows. <Inorganic Filler> · Boron nitride: h-BN particles, manufactured by Momentive Performance Materials Japan, (trade name) PolarTherm PTX-25 · boron nitride: h- BN particles, manufactured by Denka Corporation (trade name), (brand name) SGP • Alumina: Denka Corporation (trade name), DAW-20

<矽烷偶合劑> ·N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷,捷恩智(JNC)(股)製造,(商品名)S320 [化26]·3-胺基丙基三乙氧基矽烷,捷恩智(JNC)(股)製造,(商品名)S330 [化27]·3-胺基丙基三甲氧基矽烷,信越化學工業(股)製造,(商品名)KBM-903 [化28]·對胺基苯基三甲氧基矽烷,蓋勒斯特(GELEST)公司製造,(商品名)SIA0599.1-d [化29] <Silane coupling agent> · N- (2-Aminoethyl) -3-aminopropyltrimethoxysilane, manufactured by JNC Corporation (trade name), S320 [Chem. 26] · 3-Aminopropyltriethoxysilane, manufactured by JNC (stock), (brand name) S330 [Chem. 27] · 3-Aminopropyltrimethoxysilane, manufactured by Shin-Etsu Chemical Industry Co., Ltd. (trade name) KBM-903 [Chemical 28] · P-Aminophenyltrimethoxysilane, manufactured by GELEST, (brand name) SIA0599.1-d [Chem. 29]

<聚合性化合物> ·三菱化學(股)製造,(商品名)jER YL6121H 下述式(1-11)與式(1-12)以1:1混合。 [化30](1-11)(1-12) ·三菱化學(股)製造,(商品名)jER YX4000H [化31]·捷恩智(JNC)(股)製造,下述式(1-13) 下述式(1-13)可利用日本專利第5084148號公報中記載的方法來合成。 [化32](1-13)<Polymerizable Compound> • Manufactured by Mitsubishi Chemical Corporation (trade name) jER YL6121H The following formula (1-11) and formula (1-12) are mixed 1: 1. [Chemical 30] (1-11) (1-12) · Mitsubishi Chemical Corporation (trade name) jER YX4000H [Chem. 31] -Made by JNC Corporation, the following formula (1-13) The following formula (1-13) can be synthesized by the method described in Japanese Patent No. 5084148. [Chemical 32] (1-13)

<定義> 以下實施例中,將與第1偶合劑鍵結的第1無機填料設為填料A(氮化硼+矽烷偶合劑)。 將為與第2偶合劑鍵結的第2無機填料且進而鍵結有二官能以上的聚合性化合物的第2無機填料設為填料B(氮化硼+矽烷偶合劑+聚合性化合物)。 將填料A與填料B鍵結而成者設為放熱構件。 圖3表示填料A、填料B、放熱構件的製作步驟。<Definition> In the following examples, the first inorganic filler bonded to the first coupling agent is referred to as filler A (boron nitride + silane coupling agent). A second inorganic filler that is a second inorganic filler bonded to a second coupling agent and further has a bifunctional or more functional polymerizable compound is referred to as filler B (boron nitride + silane coupling agent + polymerizable compound). The filler A and the filler B are bonded to each other as an exothermic member. FIG. 3 shows the manufacturing steps of the filler A, the filler B, and the heat radiation member.

<實施例1> ·填料A製作步驟 將氮化硼粒子(日本邁圖高新材料(Momentive Performance Materials Japan)(合)製造的帕拉姆(PolarTherm)PTX-25)15 g與矽烷偶合劑(捷恩智(JNC)(股)製造的S320)2.25 g添加至甲苯100 mL中,使用攪拌器以500 rpm攪拌1小時,將所獲得的混合物於40℃下乾燥4小時。進而,於溶媒乾燥後使用設定為120℃的真空乾燥機於真空條件下進行5小時加熱處理。將所獲得的粒子設為填料A。〈Example 1〉 Filler A production step: 15 g of boron nitride particles (PolarTherm PTX-25 manufactured by Momentive Performance Materials Japan Co., Ltd.) and a silane coupling agent (Jie 2.25 g of S320 manufactured by JNC Corporation was added to 100 mL of toluene, and stirred at 500 rpm for 1 hour using a stirrer, and the obtained mixture was dried at 40 ° C for 4 hours. Furthermore, after drying the solvent, a vacuum dryer set at 120 ° C. was used to perform heat treatment under vacuum for 5 hours. Let the obtained particles be filler A.

·填料B製作步驟 量取填料A粒子2 g、與3.2 g的聚合性化合物(三菱化學(股)製造的jER YL6121H),使用雙輥(井元製作所(股)製造的IMC-AE00型)對該些於120℃下混合10分鐘。其重量比為填料A粒子所具有的胺基充分進行反應的環氧環的個數以及於雙輥上使雙方充分融合的量。將所獲得的混合物添加至四氫呋喃45 mL中,充分攪拌後,利用離心分離機(日立工機(股)製造的高速冷卻離心機CR22N型,4,000轉×10分鐘×25℃)使不溶成分沈降,利用傾析除掉包含溶解有未反應的聚合性化合物的成分的溶液。繼而,添加丙酮45 mL,進行與所述相同的操作。進而,按照四氫呋喃、丙酮的順序重覆相同的操作。對不溶成分進行乾燥,並將所獲得的粒子設為填料B。· Filler B production steps: Measure 2 g of filler A particles and 3.2 g of polymerizable compound (jER YL6121H manufactured by Mitsubishi Chemical Corporation) using a double roll (IMC-AE00 type manufactured by Imoto Manufacturing Co., Ltd.) These were mixed at 120 ° C for 10 minutes. The weight ratio is the number of epoxy rings in which the amine groups in the filler A particles fully react, and the amount of the two rings being fully fused on the two rolls. The obtained mixture was added to 45 mL of tetrahydrofuran, and after sufficiently stirring, the insoluble component was settled by using a centrifugal separator (CR22N type high-speed cooling centrifuge manufactured by Hitachi Koki Co., Ltd., 4,000 revolutions × 10 minutes × 25 ° C). The solution containing the components in which the unreacted polymerizable compound was dissolved was removed by decantation. Then, 45 mL of acetone was added, and the same operation as described above was performed. Furthermore, the same operation was repeated in the order of tetrahydrofuran and acetone. The insoluble component was dried, and the obtained particles were set as filler B.

·放熱構件製作步驟 量取填料A 0.46 g與填料B 0.24 g,進行混合,之後夾於不鏽鋼製板中,使用設定為150℃的壓縮成形機(井元製作所(股)製造的IMC-19EC)加壓至30 MPa,持續15分鐘加熱狀態,藉此進行配向處理與預硬化。即,於使混合物在不鏽鋼板之間擴展時,因BN粒子為板狀粒子,因此以粒子與不鏽鋼板平行的方式配向。另外,以試樣的厚度為約300 μm的方式調整試樣的量。進而,使用烘箱於120℃下進行12小時後硬化。將該操作中所獲得的試樣設為放熱構件。· Exothermic member production steps: Weigh 0.46 g of filler A and 0.24 g of filler B, mix them, sandwich them in a stainless steel plate, and use a compression molding machine set at 150 ° C (IMC-19EC manufactured by Imoto Manufacturing Co., Ltd.). Press to 30 MPa and heat for 15 minutes to perform alignment treatment and pre-hardening. That is, when the mixture is expanded between the stainless steel plates, since the BN particles are plate-like particles, the particles are aligned parallel to the stainless steel plate. The amount of the sample was adjusted so that the thickness of the sample was about 300 μm. Furthermore, it hardened | cured at 120 degreeC using the oven for 12 hours. The sample obtained in this operation was set as an exothermic member.

<評價> ·熱重量(TG)測定 填料A、填料B及放熱構件的、聚合性化合物或矽烷偶合劑對無機填料的被覆量是使用熱重量·示差熱測定裝置(理學(Rigaku)(股)製造的TG-8121),根據其於910℃下的加熱減量而算出。 另外,放熱構件的5%重量減少溫度是使用所述測定裝置根據將140℃至900℃的減少量設為100重量%時的5重量%減少時的溫度算出。 ·熱膨脹率的評價 自所獲得的試樣切出3 mm×15 mm的試驗片,於50℃~200℃的範圍下求出熱膨脹率。熱膨脹率是利用SII(股)製造的TMA-SS6100熱機械性分析裝置進行測定。 ·色彩的評價 自所獲得的試樣切出15 mm×15 mm的試驗片,測定色彩。色彩是利用日本電色工業(股)製造的分光光度計(spectrophotometer)SD7000進行測定。<Evaluation> • Thermogravimetric (TG) measurement of the amount of coating of inorganic fillers by fillers A, B, and exothermic members, polymerizable compounds, or silane coupling agents. Thermogravimetric and differential thermal measurement devices (Rigaku) TG-8121 (manufactured) was calculated from the heating loss at 910 ° C. The 5% weight reduction temperature of the exothermic member was calculated from the temperature at the time of 5% weight reduction when the reduction amount of 140 ° C to 900 ° C was set to 100% by weight using the measurement device. · Evaluation of thermal expansion coefficient A test piece of 3 mm × 15 mm was cut out from the obtained sample, and the thermal expansion coefficient was determined in a range of 50 ° C to 200 ° C. The thermal expansion coefficient was measured using a TMA-SS6100 thermomechanical analysis device manufactured by SII. Evaluation of color A 15 mm × 15 mm test piece was cut out of the obtained sample, and the color was measured. Color was measured using a spectrophotometer SD7000 manufactured by Nippon Denshoku Industries Co., Ltd.

<實施例2> 實施例2中將填料B步驟的雙輥加熱溫度設為150℃。<Example 2> In Example 2, the double-roll heating temperature of the filler B step was set to 150 ° C.

<實施例3、實施例4> 實施例3、實施例4中使用三菱化學(股)製造的聚合性化合物jER YX4000H。 實施例4中將填料B步驟的雙輥加熱溫度設為150℃。<Example 3 and Example 4> In Examples 3 and 4, a polymerizable compound jER YX4000H manufactured by Mitsubishi Chemical Corporation was used. In Example 4, the double-roll heating temperature of the filler B step was set to 150 ° C.

<實施例5~實施例12> 實施例5~實施例12中,BN粒子使用日本電氣化學(denka)(股)製造的SGP。 實施例5、實施例6的矽烷偶合劑使用信越化學工業(股)製造的KBM-903。 實施例7~實施例12的矽烷偶合劑使用捷恩智(JNC)(股)製造的S330。<Example 5 to Example 12> In Examples 5 to 12, the BN particles used SGP manufactured by Denka Corporation. As the silane coupling agent of Examples 5 and 6, KBM-903 manufactured by Shin-Etsu Chemical Industry Co., Ltd. was used. As the silane coupling agent of Examples 7 to 12, S330 manufactured by JNC Corporation was used.

<實施例13> 實施例13的矽烷偶合劑使用蓋勒斯特(GELEST)公司製造的SIA0599.1-d(對胺基苯基三甲氧基矽烷)。 ·填料A製作步驟 將氮化硼粒子(日本電氣化學(denka)(股)製造的SGP)7 g與矽烷偶合劑(SIA0599.1-d)0.36 g添加至甲醇20 mL及水50 mL中,使用攪拌器以920 rpm於60℃下攪拌1小時,將所獲得的混合物放置一晚。進而,於溶媒乾燥後使用設定為120℃的真空乾燥機於真空條件下進行5小時加熱處理。將所獲得的粒子設為填料A。 ·填料B製作步驟 量取填料A粒子2.56 g、與4.8 g的聚合性化合物(三菱化學(股)製造的jER YX4000H),使用雙輥(井元製作所(股)製造的IMC-AE00型)對該些於180℃下混合10分鐘。其重量比為填料A粒子所具有的胺基充分進行反應的環氧環的個數以及於雙輥上使雙方充分融合的量。將所獲得的混合物添加至四氫呋喃45 mL中,充分攪拌後,利用離心分離機(日立工機(股)製造的高速冷卻離心機CR22N型,4,000轉×10分鐘×25℃)使不溶成分沈降,利用傾析除掉包含溶解有未反應的聚合性化合物的成分的溶液。繼而,添加丙酮45 mL,進行與所述相同的操作。進而,按照四氫呋喃、丙酮的順序重覆相同的操作。對不溶成分進行乾燥,並將所獲得的粒子設為填料B。<Example 13> As the silane coupling agent of Example 13, SIA0599.1-d (p-aminophenyltrimethoxysilane) manufactured by GELEST was used. Filler A production step: 7 g of boron nitride particles (SGP manufactured by Denka Corporation) and 0.36 g of silane coupling agent (SIA0599.1-d) are added to 20 mL of methanol and 50 mL of water. The mixture was stirred at 920 rpm at 60 ° C. for 1 hour using a stirrer, and the obtained mixture was allowed to stand overnight. Furthermore, after drying the solvent, a vacuum dryer set at 120 ° C. was used to perform heat treatment under vacuum for 5 hours. Let the obtained particles be filler A. · Filler B production step Measure 2.56 g of filler A particles and 4.8 g of polymerizable compound (jER YX4000H manufactured by Mitsubishi Chemical Corporation), using a double roll (IMC-AE00 type manufactured by Imoto Manufacturing Co., Ltd.) These were mixed at 180 ° C for 10 minutes. The weight ratio is the number of epoxy rings in which the amine groups in the filler A particles fully react, and the amount of the two rings being fully fused on the two rolls. The obtained mixture was added to 45 mL of tetrahydrofuran, and after sufficiently stirring, the insoluble component was settled by using a centrifugal separator (CR22N type high-speed cooling centrifuge manufactured by Hitachi Koki Co., Ltd., 4,000 revolutions × 10 minutes × 25 ° C). The solution containing the components in which the unreacted polymerizable compound was dissolved was removed by decantation. Then, 45 mL of acetone was added, and the same operation as described above was performed. Furthermore, the same operation was repeated in the order of tetrahydrofuran and acetone. The insoluble component was dried, and the obtained particles were set as filler B.

<實施例14> 實施例14中,使用礬土(日本電氣化學(denka)(股)製造的DAW-20)作為無機填料粒子。<Example 14> In Example 14, alumina (DAW-20 manufactured by Denka Corporation) was used as the inorganic filler particles.

<比較例1、比較例2> 比較例1、比較例2中,使用日本電氣化學(denka)(股)製造的SGP作為BN粒子。 比較例1的矽烷偶合劑使用信越化學工業(股)製造的KBM-903。 比較例2的矽烷偶合劑使用捷恩智(JNC)(股)製造的S320。 作為交聯的聚合性化合物,使用捷恩智(JNC)(股)製造的式(1-13)。<Comparative Example 1, Comparative Example 2> In Comparative Examples 1 and 2, SGP manufactured by Denka Corporation was used as the BN particles. As the silane coupling agent of Comparative Example 1, KBM-903 manufactured by Shin-Etsu Chemical Co., Ltd. was used. As the silane coupling agent of Comparative Example 2, S320 manufactured by JNC Corporation was used. As the crosslinkable polymerizable compound, Formula (1-13) manufactured by JNC Corporation was used.

<比較例3> 比較例3與比較例2相同,使用礬土(日本電氣化學(denka)(股)製造的DAW20)作為無機填料粒子。<Comparative Example 3> Comparative Example 3 was the same as Comparative Example 2, and used alumina (DAW20 manufactured by Denka Corporation) as the inorganic filler particles.

[表1] 表1:填料A製作步驟 [Table 1] Table 1: Preparation steps of filler A

[表2] 表2:填料B製作步驟 [Table 2] Table 2: Preparation steps of filler B

[表3] 表3:放熱構件製作步驟 [Table 3] Table 3: Manufacturing steps of exothermic components

[表4] 表4:重量減少溫度、熱膨脹率、色彩 [Table 4] Table 4: Weight reduction temperature, thermal expansion rate, color

實施例1~實施例16的5%重量減少溫度與比較例1~比較例3相比較,均示出高的溫度。實施例的有機成分(聚合性化合物及矽烷偶合劑)的結構的取代基少,且不易受到熱的影響,因此認為放熱構件的耐熱性提高。進而,實施例1~實施例16的熱膨脹率為正負混合存在的情況,藉由組合可控制放熱構件的熱膨脹。進而,實施例1~實施例16的L*與比較例1~比較例3相比較,明度增加。認為原因在於:與比較例相比,實施例的有機成分的取代基少,且藉由氧化而抑制著色,白色調增加。實施例1~實施例16中使用的聚合性化合物與表現出液晶性的聚合性化合物相比,分子鏈短,但實施例1~實施例16的放熱構件可具有高導熱性、高耐熱性。The 5% weight reduction temperature of Examples 1 to 16 is higher than that of Comparative Examples 1 to 3. The organic components (polymerizable compounds and silane coupling agents) of the examples have few substituents and are not easily affected by heat. Therefore, it is considered that the heat resistance of the exothermic member is improved. Furthermore, in cases where the thermal expansion coefficients of Examples 1 to 16 are positive and negative, the thermal expansion of the heat releasing member can be controlled by combination. Furthermore, L * of Examples 1 to 16 increased the brightness as compared with Comparative Examples 1 to 3. The reason is considered to be that compared with the comparative example, the organic component of the example has fewer substituents, suppresses coloring by oxidation, and increases the white tone. The polymerizable compound used in Examples 1 to 16 has a shorter molecular chain than the polymerizable compound exhibiting liquid crystallinity, but the heat releasing members of Examples 1 to 16 can have high thermal conductivity and high heat resistance.

針對本說明書中所引用的刊物、包含日本專利申請案及日本專利的所有文獻,分別具體地表示各文獻並加以參考而組入本說明書中、且與於本說明書中敍述其全部內容的情況以相同程度加以參考而組入本說明書中。Regarding the publications cited in this specification, and all documents including Japanese patent applications and Japanese patents, each document is specifically indicated and referred to and incorporated into this specification, and the entire content of this document is described in this specification. The same degree is incorporated into this specification by reference.

關聯於本發明的說明(特別是關聯於以下的申請專利範圍)而使用的名詞及相同的指示語的使用只要於本說明書中未特別指出或未明顯與文脈矛盾則可理解為涉及單數及複數兩者。語句「包括」、「具有」、「含有」及「包含」只要未特別說明則可理解為開放式術語(open end term)(即,「包含~但不限定」的含義)。本說明書中的數值範圍的詳細說明只要於本說明書中未特別指出,則僅意圖發揮作為用以逐個言及屬於該範圍內的各值的略記法的作用,如將各值於本說明書中逐個列舉般被組入至說明書中。本說明書中所說明的全部方法只要於本說明書中未特別指出或未明顯與文脈矛盾,則可以所有適當的順序進行。本說明書中所使用的所有例子或例示性措辭(例如「等」)只要未特別主張,則僅意圖更好地說明本發明,而並非設置對本發明的範圍的限制。不能將說明書中的任何措辭均理解為表示對實施本發明而言不可或缺的申請專利範圍中未記載的要素者。The use of nouns and the same designations used in connection with the description of the present invention (especially in connection with the scope of patent applications below) can be understood as involving singular and plural as long as they are not specifically mentioned in this specification or are not clearly contradictory to context Both. The phrases "including", "having", "containing", and "including" can be understood as open end terms (ie, meaning of "including-but not limited to") unless otherwise specified. The detailed description of the numerical range in this specification is only intended to play a role as a notation to describe each value within the range as long as it is not specifically stated in the specification, such as listing each value in this specification one by one Generally incorporated into the manual. All the methods described in this specification can be performed in all appropriate order as long as they are not specifically pointed out in this specification or are not clearly contradictory to context. All examples or illustrative words (such as "etc.") used in this specification are only intended to better illustrate the present invention, and are not intended to limit the scope of the present invention, unless otherwise specifically claimed. Any wording in the specification should not be interpreted to mean an element that is not described in the scope of a patent application that is indispensable for implementing the present invention.

於本說明書中,為了實施本發明,包括本發明者所知的最良好的形態在內,對本發明的較佳的實施形態進行說明。對於本領域技術人員而言,於讀過所述說明後,可明瞭該些較佳的實施形態的變形。本發明者預想熟練者適宜應用此種變形,預定利用除了本說明書中具體地說明以外的方法實施本發明。因此,如基準法所容許般,本發明包含隨附於本說明書的申請專利範圍中記載的內容的變更及均等物的全部。進而,只要於本說明書中未特別指出或未與文脈矛盾,則全部的變形中的所述要素的任一組合均包含於本發明中。In this specification, in order to implement the present invention, a preferred embodiment of the present invention will be described including the best form known to the inventors. For those skilled in the art, after reading the description, modifications of these preferred embodiments will be apparent. The inventor anticipates that a skilled person may suitably apply such a modification, and plans to implement the present invention by methods other than those specifically described in this specification. Therefore, as permitted by the benchmark method, the present invention includes all changes and equivalents described in the scope of patent application accompanying this specification. Furthermore, as long as it is not specifically mentioned in this specification or contradictory to context, any combination of the said elements in all the modifications is included in this invention.

1‧‧‧第1無機填料、氮化硼1‧‧‧ 1st inorganic filler, boron nitride

2‧‧‧第2無機填料、氮化硼2‧‧‧ 2nd inorganic filler, boron nitride

11‧‧‧第1偶合劑11‧‧‧ the first coupling agent

12‧‧‧第2偶合劑12‧‧‧ 2nd coupling agent

22‧‧‧聚合性化合物22‧‧‧ polymerizable compound

圖1是於本申請案的放熱構件中,以氮化硼為例來表示無機填料彼此的鍵的概念圖。 圖2是表示藉由放熱構件用組成物的硬化,第1無機填料1所鍵結的偶合劑11的另一端與第2無機填料2的聚合性化合物22鍵結的概念圖。 圖3是表示填料A、填料B、放熱構件的製作步驟的概念圖。FIG. 1 is a conceptual diagram showing the bond between inorganic fillers using a boron nitride as an example in the exothermic member of the present application. FIG. 2 is a conceptual diagram showing that the other end of the coupling agent 11 bonded to the first inorganic filler 1 and the polymerizable compound 22 of the second inorganic filler 2 are bonded by curing of the composition for an exothermic member. FIG. 3 is a conceptual diagram showing the manufacturing steps of the filler A, the filler B, and the heat radiation member.

Claims (8)

一種放熱構件用組成物,其包含: 與第1偶合劑的一端鍵結的導熱性的第1無機填料;以及 與第2偶合劑的一端鍵結的導熱性的第2無機填料,且為於所述第2偶合劑的另一端進而鍵結有二官能以上的聚合性化合物的第2無機填料,並且 所述第2偶合劑鍵結有下述式(1-1)所表示的聚合性化合物作為所述二官能以上的聚合性化合物, 所述聚合性化合物為非液晶性化合物, 所述聚合性化合物所具有的官能基的至少一者能夠與所述第1偶合劑的另一端鍵結, Ra -R6 -O-(Rx)n -O-R11 -Ra (1-1) 所述式(1-1)中, Ra 分別為下述式(2-1)~式(2-2)、胺基、乙烯基、羧酸酐殘基、或包含該些結構的任一聚合性基; Rx為下述式(2-3)~式(2-6)的任一者; n為1~3的整數; R6 、R11 分別獨立地為單鍵、或碳數1~20的伸烷基,式(2-1)~式(2-2)中,Rb 為氫、鹵素、-CF3 、或碳數1~5的烷基,q為0或1,式(2-4)~式(2-6)中,R7 ~R10 分別獨立地為氫、或碳數1~20的伸烷基。A composition for an exothermic member, comprising: a thermally conductive first inorganic filler bonded to one end of a first coupling agent; and a thermally conductive second inorganic filler bonded to one end of a second coupling agent, wherein The other end of the second coupling agent is further bonded to a second inorganic filler having a difunctional polymerizable compound or more, and the second coupling agent is bonded to a polymerizable compound represented by the following formula (1-1). As the difunctional or more functional polymerizable compound, the polymerizable compound is a non-liquid crystalline compound, and at least one of the functional groups of the polymerizable compound can be bonded to the other end of the first coupling agent, R a -R 6 -O- (Rx) n -OR 11 -R a (1-1) In the formula (1-1), R a is the following formula (2-1) to formula (2- 2), an amine group, a vinyl group, a carboxylic acid anhydride residue, or any polymerizable group containing these structures; Rx is any one of the following formulae (2-3) to (2-6); n is An integer of 1 to 3; R 6 and R 11 are each independently a single bond or an alkylene group having 1 to 20 carbon atoms, In the formulae (2-1) to (2-2), R b is hydrogen, halogen, -CF 3 , or an alkyl group having 1 to 5 carbon atoms, and q is 0 or 1, In the formulae (2-4) to (2-6), R 7 to R 10 are each independently hydrogen or an alkylene group having 1 to 20 carbon atoms. 如申請專利範圍第1項所述的放熱構件用組成物,其中所述第1無機填料及所述第2無機填料鍵結有下述式(3-1)所表示的矽烷偶合劑作為所述第1偶合劑及所述第2偶合劑, (R1 -O)j -Si(R5 )3-j -(R2 )k -(R3 )k -(R4 )k -Ry (3-1) 所述式(3-1)中, R1 為H-、或CH3 -(CH2 )0 4 -; R2 為-(CH2 )0 3 -O-; R3 為1,3-伸苯基、1,4-伸苯基、萘-2,6-二基、或萘-2,7-二基; R4 為-(NH)0 1 -(CH2 )0 3 -; R5 為H-、或CH3 -(CH2 )0 7 -; Ry為氧雜環丙基、氧雜環丁基、胺基、乙烯基、羧酸酐殘基、或包含該些結構的任一聚合性基; j為0~3的整數; k為0~1的整數; 式(3-1)包含R3 與R4 的至少一者。The composition for an exothermic member according to item 1 of the scope of patent application, wherein the first inorganic filler and the second inorganic filler are bonded with a silane coupling agent represented by the following formula (3-1) as the The first coupling agent and the second coupling agent, (R 1 -O) j -Si (R 5 ) 3-j- (R 2 ) k- (R 3 ) k- (R 4 ) k -Ry (3 -1) In the formula (3-1), R 1 is H-, or CH 3- (CH 2 ) 0 to 4- ; R 2 is-(CH 2 ) 0 to 3 -O-; R 3 is 1,3-phenylene, 1,4-phenylene, naphthalene-2,6-diyl, or naphthalene-2,7-diyl; R 4 is-(NH) 0 to 1- (CH 2 ) 0 to 3- ; R 5 is H-, or CH 3- (CH 2 ) 0 to 7- ; Ry is oxetanyl, oxetanyl, amino, vinyl, carboxylic anhydride residue, or Any polymerizable group containing these structures; j is an integer of 0 to 3; k is an integer of 0 to 1; Formula (3-1) includes at least one of R 3 and R 4 . 如申請專利範圍第1項或第2項所述的放熱構件用組成物,其中所述第1無機填料與所述第2無機填料分別為選自氮化硼、碳化硼、碳氮化硼、石墨、碳纖維、碳奈米管、石墨烯、礬土、氮化鋁、二氧化矽、氮化矽、碳化矽、氧化鋅、氧化鎂、氫氧化鎂、堇青石、或氧化鐵系材料中的至少一者。The composition for an exothermic member according to item 1 or item 2 of the scope of the patent application, wherein the first inorganic filler and the second inorganic filler are selected from the group consisting of boron nitride, boron carbide, boron carbonitride, Graphite, carbon fiber, carbon nanotube, graphene, alumina, aluminum nitride, silicon dioxide, silicon nitride, silicon carbide, zinc oxide, magnesium oxide, magnesium hydroxide, cordierite, or iron oxide-based materials At least one. 如申請專利範圍第1項或第2項所述的放熱構件用組成物,其進而包含具有與所述第1無機填料及所述第2無機填料不同的熱膨脹率的第3無機填料。The composition for an exothermic member according to claim 1 or claim 2, further comprising a third inorganic filler having a thermal expansion coefficient different from that of the first inorganic filler and the second inorganic filler. 如申請專利範圍第1項或第2項所述的放熱構件用組成物,其進而包含所述第1無機填料及所述第2無機填料所未鍵結的有機化合物或高分子化合物。The composition for an exothermic member according to claim 1 or claim 2, further comprising an organic compound or a polymer compound not bonded to the first inorganic filler and the second inorganic filler. 一種放熱構件,其是如申請專利範圍第1項至第5項中任一項所述的放熱構件用組成物硬化而成。A heat-radiating member is obtained by curing the composition for a heat-radiating member according to any one of claims 1 to 5 of the scope of patent application. 一種電子機器,其包括:如申請專利範圍第6項所述的放熱構件; 具有發熱部的電子裝置,並且 所述放熱構件是以與所述發熱部接觸的方式配置於所述電子裝置。An electronic device includes: the heat-radiating member according to item 6 of the scope of patent application; and an electronic device having a heat-generating portion, and the heat-radiating member is disposed on the electronic device in contact with the heat-generating portion. 一種放熱構件的製造方法,其包括: 使導熱性的第1無機填料與第1偶合劑的一端鍵結的步驟; 使導熱性的第2無機填料與第2偶合劑的一端鍵結的步驟; 使所述第2偶合劑的另一端與二官能以上的聚合性化合物鍵結的步驟;以及 使所述第1偶合劑的另一端與所述二官能以上的聚合性化合物鍵結的步驟,並且 所述二官能以上的聚合性化合物為下述式(1-1)所表示的聚合性化合物, 所述聚合性化合物為非液晶性化合物, Ra -R6 -O-(Rx)n -O-R11 -Ra (1-1) 所述式(1-1)中, Ra 分別為下述式(2-1)~式(2-2)、胺基、乙烯基、羧酸酐殘基、或包含該些結構的任一聚合性基; Rx為下述式(2-3)~式(2-6)的任一者; n為1~3的整數; R6 、R11 分別獨立地為單鍵、或碳數1~20的伸烷基,式(2-1)~式(2-2)中,Rb 為氫、鹵素、-CF3 、或碳數1~5的烷基,q為0或1,式(2-4)~式(2-6)中,R7 ~R10 分別獨立地為氫、或碳數1~20的伸烷基。A method for producing a heat-radiating member, comprising: a step of bonding a thermally conductive first inorganic filler to one end of a first coupling agent; a step of bonding a thermally conductive second inorganic filler to one end of a second coupling agent; A step of bonding the other end of the second coupling agent to a difunctional or higher polymerizable compound; and a step of bonding the other end of the first coupling agent to the difunctional or higher polymerizable compound; and The difunctional or more polymerizable compound is a polymerizable compound represented by the following formula (1-1), the polymerizable compound is a non-liquid crystal compound, and R a -R 6 -O- (Rx) n -OR 11 -R a (1-1) In the formula (1-1), R a is the following formula (2-1) to formula (2-2), an amino group, a vinyl group, a carboxylic acid anhydride residue, Or any polymerizable group containing these structures; Rx is any one of the following formulae (2-3) to (2-6); n is an integer of 1 to 3; R 6 and R 11 are each independently Is a single bond or an alkylene group having 1 to 20 carbon atoms, In the formulae (2-1) to (2-2), R b is hydrogen, halogen, -CF 3 , or an alkyl group having 1 to 5 carbon atoms, and q is 0 or 1, In the formulae (2-4) to (2-6), R 7 to R 10 are each independently hydrogen or an alkylene group having 1 to 20 carbon atoms.
TW107111173A 2017-03-31 2018-03-30 Resin composition for heat dissipation member, heat dissipation member, electronic device, manufacturing method of the heat dissipation member TW201842151A (en)

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