TW201934195A - Method for manufacturing heat radiation sheet, heat radiation sheet, substrate, power semiconductor module - Google Patents

Method for manufacturing heat radiation sheet, heat radiation sheet, substrate, power semiconductor module Download PDF

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TW201934195A
TW201934195A TW107144844A TW107144844A TW201934195A TW 201934195 A TW201934195 A TW 201934195A TW 107144844 A TW107144844 A TW 107144844A TW 107144844 A TW107144844 A TW 107144844A TW 201934195 A TW201934195 A TW 201934195A
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heat sink
inorganic filler
manufacturing
liquid crystal
compound
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TW107144844A
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國信隆史
氏家研人
滝沢和宏
藤原武
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日商捷恩智股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • C08L71/02Polyalkylene oxides
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K5/00Heat-transfer, heat-exchange or heat-storage materials, e.g. refrigerants; Materials for the production of heat or cold by chemical reactions other than by combustion
    • C09K5/08Materials not undergoing a change of physical state when used
    • C09K5/14Solid materials, e.g. powdery or granular
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/07Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/18Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different subgroups of the same main group of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K7/00Constructional details common to different types of electric apparatus
    • H05K7/20Modifications to facilitate cooling, ventilating, or heating

Abstract

The present invention provides a method for manufacturing a heat dissipation sheet having heat conductivity, wherein heat conductivity in the thickness direction is enhanced. This method for manufacturing a heat dissipation sheet is provided with a baking step for heating so as to polymerize a polymerizable compound while applying pressure, from the top-bottom direction with respect to the thickness of the heat dissipation sheet, to a composition including an inorganic filler, the polymerizable compound, and a curing agent for curing the polymerizable compound.

Description

散熱片的製造方法、散熱片、基板及功率半導體模組Manufacturing method of heat sink, heat sink, substrate and power semiconductor module

本發明是有關於一種散熱片的製造方法。特別是有關於一種厚度方向的導熱性優異的散熱片的製造方法。The invention relates to a method for manufacturing a heat sink. In particular, it relates to a method for manufacturing a heat sink having excellent thermal conductivity in the thickness direction.

近年來,對於混合動力汽車或電動汽車等電力控制用的半導體元件、或高速電腦用的中央處理單元(central processing unit,CPU)等,為了不使內部的半導體的溫度變得過高,而期望晶片·封裝材料的高導熱化。即,使自半導體晶片產生的熱有效地釋出至外部的能力變得重要。In recent years, semiconductor components for power control such as hybrid cars and electric vehicles, or central processing units (CPUs) for high-speed computers have been desired in order to prevent the temperature of the internal semiconductors from becoming too high. High thermal conductivity of wafers and packaging materials. That is, the ability to efficiently release heat generated from a semiconductor wafer to the outside becomes important.

作為解決此種散熱問題的方法,可列舉使高導熱性材料(散熱構件)接觸發熱部位,將熱導出至外部而進行散熱的方法。作為散熱構件,就加工性或絕緣性優異的方面而言,正在進行包含使無機材料與樹脂複合化而高導熱化的樹脂複合材的散熱構件的開發。As a method for solving such a heat radiation problem, a method of contacting a highly thermally conductive material (radiation member) with a heat-generating portion, and dissipating heat to the outside to dissipate heat can be mentioned. As a heat radiating member, in terms of excellent workability or insulation, the development of a heat radiating member including a resin composite material in which an inorganic material is compounded with a resin and high thermal conductivity is being developed.

樹脂複合材的高導熱化一般是藉由如下方式而進行:於聚乙烯樹脂、聚醯胺樹脂、聚苯乙烯樹脂、丙烯酸樹脂、環氧樹脂等通用樹脂中大量添加金屬填充材或無機填充材。然而,無機填充材的導熱率為物質固有的值而上限已確定。因此,廣泛嘗試提高通用樹脂的導熱率來提昇樹脂複合材的導熱率的方法。 於專利文獻1中揭示有如下內容:於包含藉由使具有液晶性的聚合性化合物的液晶原部位於一定的方向配向並進行聚合而獲得的、分子排列固定的聚合體的散熱構件中,若與特定的高導熱性無機填充材(高導熱性無機填料)複合,則藉由組合的協同效應,可獲得配向方向的導熱率極高的樹脂複合材(段落0007)。High thermal conductivity of resin composites is generally achieved by adding a large amount of metal fillers or inorganic fillers to general resins such as polyethylene resins, polyamide resins, polystyrene resins, acrylic resins, and epoxy resins. . However, the thermal conductivity of an inorganic filler is a value inherent in a substance, and the upper limit has been determined. Therefore, attempts have been made to increase the thermal conductivity of general-purpose resins to increase the thermal conductivity of resin composites. Patent Document 1 discloses the following: In a heat dissipating member including a polymer having a fixed molecular arrangement, which is obtained by orienting and polymerizing a liquid crystal source of a polymerizable compound having liquid crystallinity in a predetermined direction, if When compounded with a specific highly thermally conductive inorganic filler (highly thermally conductive inorganic filler), a resin composite with extremely high thermal conductivity in the alignment direction can be obtained through the synergistic effect of the combination (paragraph 0007).

再者,於使用聚合性液晶化合物或者板狀或針狀的填料來製作散熱片的情況下,於壓製法或擠出法中,於片的平面方向產生原料的流動,因此液晶化合物或填料於平面方向進行配向,平面方向的導熱率變得非常高。但是,甚至存在片的垂直(厚度)方向的導熱率較無配向狀態而言更低的情況。因此,為了形成所述無配向狀態,亦進行如下嘗試:使板狀填料凝聚,製作沙漠玫瑰狀的二次粒子,並使所述二次粒子與樹脂進行複合化,藉此提高於片的垂直(厚度)方向配向的填料的量,從而提高導熱率(專利文獻2、段落0013、專利文獻3、段落0023、參照專利文獻4、段落0170)。 然而,樹脂成分難以滲入二次粒子內部,空隙變大,結果亦存在導熱率降低的問題。進而,若過於增大二次粒子,則樹脂成分更難以滲入內部,大的填料彼此的間隙亦變大,因此亦存在導熱率沒有像期待的那樣得到提高的問題。Furthermore, in the case of using a polymerizable liquid crystal compound or a plate-shaped or needle-shaped filler to produce a heat sink, the raw material flows in the plane direction of the sheet in the pressing method or the extrusion method. When the alignment is performed in the plane direction, the thermal conductivity in the plane direction becomes very high. However, there are cases where the thermal conductivity in the vertical (thickness) direction of the sheet is lower than in the non-aligned state. Therefore, in order to form the non-orientation state, an attempt was also made to agglomerate the plate-shaped filler to produce desert rose-like secondary particles and composite the secondary particles with a resin, thereby increasing the verticality of the sheet. The amount of fillers aligned in the (thickness) direction to improve thermal conductivity (Patent Document 2, paragraph 0013, Patent document 3, paragraph 0223, refer to Patent document 4, paragraph 0170). However, it is difficult for the resin component to penetrate into the inside of the secondary particles and the voids become large. As a result, there is also a problem that the thermal conductivity is reduced. Furthermore, if the secondary particles are excessively enlarged, it becomes more difficult for the resin component to penetrate into the interior, and the gap between the large fillers also becomes large. Therefore, there is also a problem that the thermal conductivity is not improved as expected.

近年來,特別是於功率半導體的領域中,重要的是需要於以夾入絕緣基板的方式配置的功率半導體元件、與熱匯或水冷裝置之間,經由絕緣基板以高效率傳導熱,從而提高絕緣基板的垂直(厚度)方向的導熱性。 [現有技術文獻] [專利文獻]In recent years, particularly in the field of power semiconductors, it is important to improve the efficiency of conducting heat between the power semiconductor element and the heat sink or water-cooling device, which are arranged to sandwich the insulating substrate, through the insulating substrate, thereby improving the efficiency. Thermal conductivity of the insulating substrate in the vertical (thickness) direction. [Prior Art Literature] [Patent Literature]

[專利文獻1]國際公開第2015/170744號 [專利文獻2]日本專利特開2015-189609號 [專利文獻3]日本專利特開2017-036190號 [專利文獻4]日本專利特開2006-265527號[Patent Literature 1] International Publication No. 2015/170744 [Patent Literature 2] Japanese Patent Laid-Open No. 2015-189609 [Patent Literature 3] Japanese Patent Laid-Open No. 2017-036190 [Patent Literature 4] Japanese Patent Laid-Open No. 2006-265527 number

[發明所欲解決之課題] 因此,本發明的課題在於提供一種具有導熱性且提高垂直(厚度)方向的導熱性的散熱片的製造方法。 [解決課題之手段][Problems to be Solved by the Invention] Therefore, an object of the present invention is to provide a method for manufacturing a heat sink having thermal conductivity and improving thermal conductivity in a vertical (thickness) direction. [Means for solving problems]

本發明者等人鑒於聚合性液晶化合物的流動方向,著眼於將聚合性液晶化合物填充至包含所述平板粒子凝聚而形成的大徑的二次粒子的填料中,藉由減少於無機材料與樹脂的複合化中的無機材料與樹脂之間產生的空隙來嘗試提高導熱性。如圖1所示,於使樹脂成分滲透至大徑的二次粒子填料的情況下,液狀的樹脂成分自填料的表面朝內部方向滲透,因此於內部方向產生放射狀的流動。即,由於樹脂成分以於垂直於球表面的方向上配向的狀態進行滲透並聚合,因此可期待導熱率於垂直於球表面的方向、即貫穿球的方向上得到提高的效果。特別是於液晶化合物的情況下,配向方向的導熱率非常高,因此該效果大,可進一步期待高導熱率。本發明者等人發現,於散熱片的製造過程中,藉由煅燒時或聚合時進行的壓縮成形、加熱處理、抽真空的組合方式,如圖2所示般可使液晶配向、或減少空隙(填埋空隙、或抑制空隙的生成),結果可提高厚度方向的導熱性,從而完成了本發明。In view of the flow direction of the polymerizable liquid crystal compound, the inventors of the present invention focused on filling the polymerizable liquid crystal compound into a filler including a large-diameter secondary particle formed by agglomeration of the flat plate particles, and reducing the amount to the inorganic material and resin. In order to improve the thermal conductivity, voids generated between the inorganic material and the resin in the composite. As shown in FIG. 1, when the resin component is penetrated into the large-diameter secondary particle filler, the liquid resin component penetrates from the surface of the filler toward the inner direction, so that a radial flow occurs in the inner direction. That is, since the resin component is permeated and polymerized in a state aligned in a direction perpendicular to the surface of the ball, an effect of improving the thermal conductivity in a direction perpendicular to the surface of the ball, that is, in a direction penetrating the ball is expected. Especially in the case of a liquid crystal compound, since the thermal conductivity in the alignment direction is very high, this effect is large, and further high thermal conductivity can be expected. The inventors have found that during the manufacturing process of the heat sink, the liquid crystal can be aligned or the void can be reduced as shown in FIG. 2 by a combination of compression molding, heating treatment, and vacuum during the calcination or polymerization. (Filling the void or suppressing the generation of voids), as a result, the thermal conductivity in the thickness direction can be improved, and the present invention has been completed.

本發明的第1實施方式的散熱片的製造方法為散熱片的製造方法,其包括煅燒步驟,所述煅燒步驟是對包含無機填料、聚合性化合物、及使所述聚合性化合物硬化的硬化劑的組成物,自相對於所述散熱片的厚度而成為上下方向的方向施加壓力,並且以使所述聚合性化合物聚合的方式進行加熱。 若如此構成,則可於聚合時對組成物繼續施加壓力,減少內部的空隙,結果所製造的散熱片可於厚度方向具有高導熱性。The method for manufacturing a heat sink according to the first embodiment of the present invention is a method for manufacturing a heat sink, which includes a firing step that includes an inorganic filler, a polymerizable compound, and a hardener that hardens the polymerizable compound. The composition is heated by applying pressure from a direction that becomes a vertical direction with respect to the thickness of the heat sink, and polymerizing the polymerizable compound. With such a structure, pressure can be continuously applied to the composition during polymerization to reduce internal voids. As a result, the manufactured heat sink can have high thermal conductivity in the thickness direction.

本發明的第2實施方式的散熱片的製造方法是如所述本發明的第1實施方式的散熱片的製造方法,其進而包括真空步驟,所述真空步驟是於所述煅燒步驟前,為了使所述聚合性化合物滲透至填料內或填料間的間隙中,對所述組成物自成為所述上下方向的方向施加壓力,並且將所述組成物置於真空環境下;所述煅燒步驟是於真空環境下,對所述組成物自成為所述上下方向的方向施加壓力並且進行加熱的步驟。所謂「真空」,是指「由壓力低於大氣壓的氣體充滿的空間內的狀態」。 若如此構成,則可於真空環境下於聚合時對組成物繼續施加壓力,進一步減少內部的空隙,結果所製造的散熱片可於厚度方向具有更高的導熱性。進而,可提高片的密度,從而可提高片的強度。The method for manufacturing a heat sink according to a second embodiment of the present invention is the method for manufacturing a heat sink according to the first embodiment of the present invention, which further includes a vacuum step, which is performed before the calcination step in order to The polymerizable compound is allowed to penetrate into the filler or the gap between the fillers, apply pressure to the composition from a direction that becomes the up-down direction, and place the composition in a vacuum environment; the calcination step is performed at A step of applying pressure to the composition in a vacuum environment and heating the composition in a direction from the vertical direction. The "vacuum" means "a state in a space filled with a gas having a pressure lower than atmospheric pressure". With such a structure, pressure can be continuously applied to the composition during polymerization in a vacuum environment to further reduce internal voids. As a result, the manufactured heat sink can have higher thermal conductivity in the thickness direction. Furthermore, the density of the sheet can be increased, and the strength of the sheet can be increased.

本發明的第3實施方式的散熱片的製造方法是如所述本發明的第2實施方式的散熱片的製造方法,其進而包括暫時成形步驟,所述暫時成形步驟是於所述真空步驟前,於大氣壓下對所述組成物自成為所述上下方向的方向施加壓力,並且以對所述聚合性化合物進行壓縮成形的方式於聚合溫度以下進行加熱。 若如此構成,則於聚合性化合物具有液晶性的情況下,於對組成物進行壓製而使其堅固時可使液晶化合物進行配向。The method for manufacturing a heat sink according to a third embodiment of the present invention is the method for manufacturing a heat sink according to the second embodiment of the present invention, and further includes a temporary forming step before the vacuum step. Applying pressure to the composition in a direction from the vertical direction under atmospheric pressure, and heating the polymerizable compound at a temperature lower than a polymerization temperature to perform compression molding. With such a configuration, when the polymerizable compound has liquid crystallinity, the liquid crystal compound can be aligned when the composition is pressed to make it strong.

本發明的第4實施方式的散熱片的製造方法為散熱片的製造方法,其包括:暫時成形步驟,於大氣壓下或真空環境下,對包含無機填料、聚合性化合物、及使聚合性化合物硬化的硬化劑的組成物,自相對於所述散熱片的厚度而成為上下方向的方向施加壓力,並且以對所述聚合性化合物進行壓縮成形的方式於聚合溫度以下進行加熱;真空步驟,於所述暫時成形步驟後,為了使所述聚合性化合物滲透至填料內或填料間的間隙中,將所述組成物置於真空環境下;以及煅燒步驟,於真空環境下,對所述組成物以使所述聚合性化合物聚合的方式進行加熱。 若如此構成,則藉由於真空環境下進行聚合,可減少內部的空隙,結果所製造的散熱片可於厚度方向具有高導熱性。進而,可提高片的密度,從而可提高片的強度。A method for manufacturing a heat sink according to a fourth embodiment of the present invention is a method for manufacturing a heat sink, which includes a temporary forming step of hardening a polymer compound containing an inorganic filler, a polymerizable compound, and a polymerizable compound under atmospheric pressure or a vacuum environment. The composition of the hardener is applied with pressure in a direction that is vertical to the thickness of the heat sink, and is heated below the polymerization temperature by compression-molding the polymerizable compound; a vacuum step is performed at After the temporary forming step, in order to make the polymerizable compound penetrate into the filler or the gap between the fillers, the composition is placed in a vacuum environment; and a calcination step is performed on the composition in a vacuum environment so that The polymerizable compound is heated while being polymerized. With this configuration, the internal voids can be reduced by polymerization in a vacuum environment, and as a result, the manufactured heat sink can have high thermal conductivity in the thickness direction. Furthermore, the density of the sheet can be increased, and the strength of the sheet can be increased.

本發明的第5實施方式的散熱片的製造方法是如所述本發明的第1~第4的任一實施方式的散熱片的製造方法,其中所述無機填料包含第一無機填料、與粒徑小於所述第一無機填料的第二無機填料,所述第一無機填料與所述第二無機填料的混合比率為將填料間的空間率最小時的填充率設為100%時所述填充率成為70%以上的比率,所述第一無機填料為針狀或板狀的粒子凝聚而成的二次粒子。再者,第一無機填料與第二無機填料可為相同的化合物,亦可為不同的化合物。 若如此構成,則小的粒子進入大的粒子間的空隙中,因此可更密地進行填充,可進一步減少片內的空隙。進而,藉由填料間的空間率的減少與本發明的製法的協同效應,可進一步提高厚度方向的導熱率。The method for manufacturing a heat sink according to a fifth embodiment of the present invention is the method for manufacturing a heat sink according to any one of the first to fourth embodiments of the present invention, wherein the inorganic filler includes a first inorganic filler and a pellet. A second inorganic filler having a diameter smaller than that of the first inorganic filler, and a mixing ratio of the first inorganic filler and the second inorganic filler is such that the filling ratio when the space ratio between the fillers is minimized is set to 100% The ratio is 70% or more, and the first inorganic filler is secondary particles obtained by aggregating needle-like or plate-like particles. Furthermore, the first inorganic filler and the second inorganic filler may be the same compound or different compounds. With such a configuration, small particles enter into the spaces between the large particles, so that the particles can be filled more densely, and the spaces in the sheet can be further reduced. Furthermore, by reducing the space ratio between the fillers and the synergistic effect of the production method of the present invention, the thermal conductivity in the thickness direction can be further improved.

本發明的第6實施方式的散熱片的製造方法是如所述本發明的第1~第5的任一實施方式的散熱片的製造方法,其中所述無機填料是由氮化物形成,所述聚合性化合物是於兩末端具有包含氧雜環丙基或氧雜環丁基的結構的聚合性液晶化合物,所述煅燒步驟的加熱溫度為所述聚合性液晶化合物顯示液晶相的溫度範圍以上。所謂「顯示液晶相的溫度範圍」,是指顯示向列相、層列相、或膽固醇相的溫度範圍。 若如此構成,則聚合性液晶化合物可以具有流動性的狀態引起配向,進而可使聚合性液晶化合物以配向的狀態(分子沿特定方向對齊的狀態)進行聚合,與無機填料一併硬化。因而,散熱片可藉由已聚合的液晶化合物的導熱性與由氮化物形成的無機填料的導熱性的協同效應而具有高導熱性。The method for manufacturing a heat sink according to a sixth embodiment of the present invention is the method for manufacturing a heat sink according to any one of the first to fifth embodiments of the present invention, wherein the inorganic filler is formed of a nitride, and The polymerizable compound is a polymerizable liquid crystal compound having a structure containing an oxetanyl group or an oxetanyl group at both ends, and a heating temperature in the firing step is at least a temperature range in which the polymerizable liquid crystal compound exhibits a liquid crystal phase. The "temperature range in which a liquid crystal phase is displayed" refers to a temperature range in which a nematic phase, a smectic phase, or a cholesterol phase is displayed. With such a configuration, the polymerizable liquid crystal compound can cause alignment in a fluid state, and can further polymerize the polymerizable liquid crystal compound in an aligned state (a state in which molecules are aligned in a specific direction) and harden together with the inorganic filler. Therefore, the heat sink can have high thermal conductivity through the synergistic effect of the thermal conductivity of the polymerized liquid crystal compound and the thermal conductivity of the inorganic filler formed of the nitride.

本發明的第7實施方式的散熱片的製造方法是如所述本發明的第6實施方式的散熱片的製造方法,其包括以下步驟,所述步驟是於所述暫時成形步驟或所述煅燒步驟的昇溫時,於所述聚合性液晶化合物的液晶相的顯現溫度區域內滯留1秒以上或保持1秒以上。 如此,於加熱時必須形成液晶狀態並配向後使其硬化,藉此可提高導熱率。The method for manufacturing a heat sink according to a seventh embodiment of the present invention is the method for manufacturing a heat sink according to the sixth embodiment of the present invention, which includes the following steps: the temporary forming step or the calcination During the step temperature rise, the polymerizable liquid crystal compound stays for 1 second or longer in the development temperature region of the liquid crystal phase of the polymerizable liquid crystal compound. In this way, it is necessary to form a liquid crystal state during heating and harden it after alignment, thereby improving thermal conductivity.

本發明的第8實施方式的散熱片的製造方法是如所述本發明的第6或第7的實施方式的散熱片的製造方法,其進而包括配向處理步驟,所述配向處理步驟是於所述暫時成形步驟及所述煅燒步驟之前進行所述組成物的配向處理。 若如此構成,則可使聚合性液晶化合物容易配向。The method for manufacturing a heat sink according to an eighth embodiment of the present invention is the method for manufacturing a heat sink according to the sixth or seventh embodiment of the present invention, which further includes an alignment process step, and the alignment process step is Before the temporary forming step and the calcining step, an alignment treatment of the composition is performed. With such a configuration, the polymerizable liquid crystal compound can be easily aligned.

本發明的第9實施方式的散熱片的製造方法是如所述本發明的第6~第8的任一實施方式的散熱片的製造方法,其中所述聚合性液晶化合物為下述式(1-1)所表示的至少一種化合物。 Ra1 -Z-(A-Z)m1 -Ra1 ・・・(1-1) [所述式(1-1)中, Ra1 分別為下述式(2-1)~式(2-2)的任一者所表示的聚合性基; A為1,4-伸環己基、1,4-伸環己烯基、1,4-伸苯基、萘-2,6-二基、四氫萘-2,6-二基、茀-2,7-二基、雙環[2.2.2]辛-1,4-二基、或雙環[3.1.0]己-3,6-二基, 於該些環中,任意的-CH2 -可經-O-取代,任意的-CH=可經-N=取代,任意的氫可經鹵素、碳數1~10的烷基、或碳數1~10的鹵化烷基取代, 於該烷基中,任意的-CH2 -可經-O-、-CO-、-COO-、或-OCO-取代,任意的-CH2 CH2 -可經-CH=CH-、或-C≡C-取代; Z分別為單鍵、或碳數1~20的伸烷基, 於該伸烷基中,任意的-CH2 -可經-O-、-S-、-CO-、-COO-、或-OCO-取代,任意的-CH2 CH2 -可經-CH=CH-、-CF=CF-、-CH=N-、-N=CH-、-N=N-、或-C≡C-取代,任意的氫可經鹵素取代; m1為1~6的整數] [化1][式(2-1)~式(2-2)中,Rb 為氫、鹵素、-CF3 、或碳數1~5的烷基,q為0或1] 若如此構成,則所述組成物可含有作為聚合性液晶化合物更佳的化合物。該些化合物為熱硬化性且可不受填料的量影響而硬化,進而耐熱性優異。另外,分子結構具有對稱性、直線性,因此認為對聲子的傳導有利。The method for manufacturing a heat sink according to a ninth embodiment of the present invention is the method for manufacturing a heat sink according to any of the sixth to eighth embodiments of the present invention, wherein the polymerizable liquid crystal compound is the following formula (1 -1) at least one compound represented by. R a1 -Z- (AZ) m1 -R a1 ・ ・ ・ (1-1) [In the formula (1-1), R a1 is the following formula (2-1) to formula (2-2) A polymerizable group represented by any of: A is 1,4-cyclohexyl, 1,4-cyclohexenyl, 1,4-phenylene, naphthalene-2,6-diyl, tetrahydro Naphthalene-2,6-diyl, fluorene-2,7-diyl, bicyclic [2.2.2] octane-1,4-diyl, or bicyclic [3.1.0] hex-3,6-diyl, in In these rings, any -CH 2 -may be substituted by -O-, any -CH = may be substituted by -N =, and any hydrogen may be substituted by halogen, alkyl group having 1 to 10 carbon atoms, or carbon number 1 ~ 10 halogenated alkyl substitution. In this alkyl, any -CH 2 -may be substituted by -O-, -CO-, -COO-, or -OCO-, and any -CH 2 CH 2 -may be substituted by -CH = CH-, or -C≡C- substitution; Z is a single bond, or an alkylene group having 1 to 20 carbon atoms. In this alkylene group, any -CH 2 -can be passed through -O-, -S-, -CO-, -COO-, or -OCO- substitution, any -CH 2 CH 2 -can be via -CH = CH-, -CF = CF-, -CH = N-, -N = CH -, -N = N-, or -C≡C- substitution, any hydrogen may be substituted by halogen; m1 is an integer from 1 to 6] [化 1] [In the formulae (2-1) to (2-2), R b is hydrogen, halogen, -CF 3 , or an alkyl group having 1 to 5 carbon atoms, and q is 0 or 1] If constituted as described above, The composition may contain a compound more preferably as a polymerizable liquid crystal compound. These compounds are thermosetting and harden without being affected by the amount of the filler, and further have excellent heat resistance. In addition, since the molecular structure has symmetry and linearity, it is considered to be advantageous for phonon conduction.

本發明的第10實施方式的散熱片的製造方法是如所述本發明的第9實施方式的散熱片的製造方法,其中所述式(1-1)中,A為1,4-伸環己基、任意的氫經鹵素取代的1,4-伸環己基、1,4-伸苯基、任意的氫經鹵素或甲基取代的1,4-伸苯基、茀-2,7-二基、或者任意的氫經鹵素或甲基取代的茀-2,7-二基。 若如此構成,則所述組成物可含有作為聚合性液晶化合物進而佳的化合物。該些化合物的分子的直線性更高,認為對聲子的傳導更有利。The method for manufacturing a heat sink according to a tenth embodiment of the present invention is the method for manufacturing a heat sink according to the ninth embodiment of the present invention, wherein in the formula (1-1), A is a 1,4-ring ring Hexyl, 1,4-cyclohexyl with any hydrogen substituted by halogen, 1,4-phenylene, 1,4-phenyl with any hydrogen substituted by halogen or methyl, fluorene-2,7-di Or fluorene-2,7-diyl in which any hydrogen is substituted with halogen or methyl. With such a structure, the composition may contain a compound which is further preferable as the polymerizable liquid crystal compound. The molecules of these compounds have a higher linearity and are considered to be more favorable for phonon conduction.

本發明的第11實施方式的散熱片的製造方法是如所述本發明的第10實施方式的散熱片的製造方法,其中所述式(1-1)中,Z為單鍵、-(CH2 )a -、-O(CH2 )a -、-(CH2 )a O-、-O(CH2 )a O-、-CH=CH-、-C≡C-、-COO-、-OCO-、-CH=CH-COO-、-OCO-CH=CH-、-CH2 CH2 -COO-、-OCO-CH2 CH2 -、-CH=N-、-N=CH-、-N=N-、-OCF2 -或-CF2 O-,該a為1~20的整數。 若如此構成,則所述組成物可含有作為聚合性液晶化合物特佳的化合物。該些化合物的物性、易製造性、或易操作性優異,故較佳。The method for manufacturing a heat sink according to an eleventh embodiment of the present invention is the method for manufacturing a heat sink according to the tenth embodiment of the present invention, wherein in the formula (1-1), Z is a single bond,-(CH 2 ) a- , -O (CH 2 ) a -,-(CH 2 ) a O-, -O (CH 2 ) a O-, -CH = CH-, -C≡C-, -COO-,- OCO-, -CH = CH-COO-, -OCO-CH = CH-, -CH 2 CH 2 -COO-, -OCO-CH 2 CH 2- , -CH = N-, -N = CH-,- N = N-, -OCF 2 -or -CF 2 O-, and a is an integer of 1-20. With such a configuration, the composition may contain a compound particularly preferable as the polymerizable liquid crystal compound. These compounds are preferable because they are excellent in physical properties, easy to manufacture, or easy to handle.

本發明的第12實施方式的散熱片的製造方法是如所述本發明的第1~第11的任一實施方式的散熱片的製造方法,其中所述無機填料為選自氮化硼、氮化鋁、及氮化矽中的至少一種。 若如此構成,則所述組成物可含有作為無機填料更佳的化合物。The method for manufacturing a heat sink according to a twelfth embodiment of the present invention is the method for manufacturing a heat sink according to any one of the first to eleventh embodiments of the present invention, wherein the inorganic filler is selected from the group consisting of boron nitride and nitrogen. At least one of aluminum nitride and silicon nitride. With such a structure, the composition may contain a compound more preferably as an inorganic filler.

本發明的第13實施方式的散熱片的製造方法是如所述本發明的第1~第12的任一實施方式的散熱片的製造方法,其中所述硬化劑為下述式(3-1)所表示的至少一種二胺化合物。 H2 N-Z-(A-Z)m2 -NH2 ・・・(3-1) [所述式(3-1)中, A為1,4-伸環己基、或1,4-伸苯基,該些環的任意的氫可經鹵素、或碳數1~10的烷基取代; Z分別為單鍵、或碳數1~10的伸烷基; m2為1~7的整數] 若如此構成,則組成物可含有作為硬化劑更佳的化合物。特別是於m2為偶數的情況下,二胺化合物可於不阻礙聚合性液晶化合物的液晶性的情況下進行硬化,故較佳。A method of manufacturing a heat sink according to a thirteenth embodiment of the present invention is the method of manufacturing a heat sink according to any one of the first to twelfth embodiments of the present invention, wherein the hardener is the following formula (3-1 At least one diamine compound. H 2 NZ- (AZ) m2 -NH 2 ・ ・ ・ (3-1) [In the formula (3-1), A is 1,4-cyclohexyl, or 1,4-phenylene, and Arbitrary hydrogen of these rings may be substituted by halogen or alkyl having 1 to 10 carbons; Z is a single bond or an alkylene having 1 to 10 carbons; m2 is an integer of 1 to 7] Then, the composition may contain a compound more preferably as a hardener. Especially when m2 is an even number, it is preferable that the diamine compound can be hardened without hindering the liquid crystallinity of the polymerizable liquid crystal compound.

本發明的第14實施方式的散熱片的製造方法是如所述本發明的第1~第13的任一實施方式的散熱片的製造方法,其中所述無機填料為經矽烷偶合劑處理的填料、或經矽烷偶合處理後藉由所述聚合性化合物進行表面修飾的填料。所謂「表面修飾」,是指使聚合性化合物進而鍵結於與填料鍵結的矽烷偶合劑。 若如此構成,則經矽烷偶合處理的填料或經表面修飾的填料可與組成物中的其他聚合性化合物或其他矽烷偶合劑形成鍵,從而可提高導熱性。The method for manufacturing a heat sink according to a fourteenth embodiment of the present invention is the method for manufacturing a heat sink according to any one of the first to thirteenth embodiments of the present invention, wherein the inorganic filler is a filler treated with a silane coupling agent. Or a filler surface-modified with the polymerizable compound after a silane coupling treatment. The "surface modification" refers to a silane coupling agent in which a polymerizable compound is further bonded to a filler. With such a configuration, the filler subjected to the silane coupling treatment or the surface-modified filler can form a bond with another polymerizable compound or another silane coupling agent in the composition, and thus can improve thermal conductivity.

本發明的第15實施方式的散熱片是由組成物形成,所述組成物包含:於兩末端具有包含氧雜環丙基或氧雜環丁基的結構的聚合性液晶化合物;使所述聚合性液晶化合物硬化的硬化劑;以及由氮化物形成的無機填料,所述散熱片中,所述無機填料包含第一無機填料、與粒徑小於所述第一無機填料的第二無機填料,所述第一無機填料與所述第二無機填料的混合比率為將填料間的空間率最小時的填充率設為100%時所述填充率成為70%以上的比率,所述第一無機填料為針狀或板狀的粒子凝聚而成的二次粒子,所述散熱片的厚度為200 μm~1000 μm,所述散熱片的厚度方向的導熱率超過20 W/mK。 若如此構成,則可獲得於厚度方向具有高導熱性的散熱片。The heat sink of the fifteenth embodiment of the present invention is formed of a composition including a polymerizable liquid crystal compound having a structure containing an oxetanyl group or an oxetanyl group at both ends; and polymerizing the polymerizable liquid crystal compound. A hardening agent that hardens a liquid crystal compound; and an inorganic filler formed of a nitride, in the heat sink, the inorganic filler includes a first inorganic filler and a second inorganic filler having a particle size smaller than the first inorganic filler, The mixing ratio of the first inorganic filler and the second inorganic filler is a ratio where the filling ratio when the space ratio between the fillers is the smallest is 100%, and the filling ratio becomes 70% or more. The first inorganic filler is Secondary particles formed by acicular or plate-shaped particles, the thickness of the heat sink is 200 μm to 1000 μm, and the thermal conductivity in the thickness direction of the heat sink exceeds 20 W / mK. With this structure, a heat sink having high thermal conductivity in the thickness direction can be obtained.

本發明的第16實施方式的基板包括:所述本發明的第15實施方式的散熱片;以及積層於所述散熱片的至少單面上的金屬板。 若如此構成,則即便是為了提高片的導熱性而更薄地形成的散熱片,亦可藉由金屬板來確保機械強度。A substrate according to a sixteenth embodiment of the present invention includes: the heat sink of the fifteenth embodiment of the present invention; and a metal plate laminated on at least one side of the heat sink. With such a configuration, even if the heat sink is formed thinner in order to improve the thermal conductivity of the sheet, the mechanical strength can be secured by the metal plate.

本發明的第17實施方式的功率半導體模組包括:功率半導體用基板,其具有成為絕緣基板的所述本發明的第15實施方式的散熱片、與形成於所述散熱片上的導體電路;以及功率半導體晶片,配置於所述功率半導體用基板上,並與所述導體電路電性連接,所述無機填料為氮化硼。 若如此構成,則散熱片成為絕緣基板,藉由厚度方向的優異的導熱性,可效率良好地釋放於功率半導體模組產生的熱。 [發明的效果]A power semiconductor module according to a seventeenth embodiment of the present invention includes a power semiconductor substrate including the heat sink of the fifteenth embodiment of the present invention as an insulating substrate, and a conductor circuit formed on the heat sink; and A power semiconductor wafer is disposed on the power semiconductor substrate and is electrically connected to the conductor circuit. The inorganic filler is boron nitride. With this configuration, the heat sink becomes an insulating substrate, and the heat generated in the power semiconductor module can be efficiently released by the excellent thermal conductivity in the thickness direction. [Effect of the invention]

藉由本發明的散熱片的製造方法而製造的散熱片具有高導熱性,特別是厚度方向的導熱性與藉由先前技術而製造的散熱片相比而極優異。The heat sink manufactured by the manufacturing method of the heat sink of this invention has high thermal conductivity, and especially the thermal conductivity in the thickness direction is extremely excellent compared with the heat sink manufactured by the prior art.

本申請案是基於在日本2017年12月13日提出申請的日本專利特願2017-239025號,且使其內容形成為本申請案的內容的一部分。本發明藉由以下的詳細說明而可更完全地理解。本發明的進一步的應用範圍藉由以下的詳細說明而變得明確。然而,詳細的說明及特定的實施例為本發明的理想的實施形態,僅為了說明而記載。其原因在於:根據該詳細的說明,於本發明的精神及範圍內,本領域技術人員明瞭各種變更、改變。申請人並未意圖將所記載的任一實施形態均呈獻給公眾,改變、代替案中語句上可能不包含於申請專利範圍內者亦設為均等論下的發明的一部分。This application is based on Japanese Patent Application No. 2017-239025 filed in Japan on December 13, 2017, and its content forms part of the content of this application. The present invention can be more fully understood from the following detailed description. The further application range of this invention will become clear by the following detailed description. However, the detailed description and specific examples are ideal embodiments of the present invention, and are described only for explanation. The reason is that, based on the detailed description, those skilled in the art will understand various changes and modifications within the spirit and scope of the present invention. The applicant does not intend to present any of the recorded embodiments to the public, and those who change or replace the statements in the case that may not be included in the scope of the patent application are also made part of the invention under the equality theory.

以下,參照圖式對本發明的實施形態進行說明。再者,於各圖中對相互相同或者相當的部分標註相同或類似的符號,並省略重覆的說明。另外,本發明並不限制於以下的實施形態。Hereinafter, embodiments of the present invention will be described with reference to the drawings. It should be noted that the same or similar parts are denoted by the same or similar symbols in each drawing, and repeated explanations are omitted. The present invention is not limited to the following embodiments.

本說明書中的用語的用法如以下般。 「液晶化合物」「液晶性化合物」是表現向列相或層列相等液晶相的化合物。The terms used in this manual are as follows. A "liquid crystal compound" and a "liquid crystal compound" are compounds which exhibit a nematic phase or a smectic liquid crystal phase.

以下述一例表示「烷基中的任意的-CH2 -可經-O-等取代」或「任意的-CH2 CH2 -可經-CH=CH-等取代」等語句的含義。例如,C4 H9 -中的任意的-CH2 -經-O-或-CH=CH-取代的基為C3 H7 O-、CH3 -O-(CH2 )2 -、CH3 -O-CH2 -O-等。同樣地,C5 H11 -中的任意的-CH2 CH2 -經-CH=CH-取代的基為H2 C=CH-(CH2 )3 -、CH3 -CH=CH-(CH2 )2 -等,進而任意的-CH2 -經-O-取代的基為CH3 -CH=CH-CH2 -O-等。如此「任意的」這一用語是指「未區分而選擇的至少一個」。再者,考慮化合物的穩定性,相較於氧與氧鄰接的CH3 -O-O-CH2 -,氧與氧不鄰接的CH3 -O-CH2 -O-較佳。The meaning of a sentence such as "arbitrary -CH 2 -in the alkyl group may be substituted with -O-, etc." or "arbitrary -CH 2 CH 2 -may be substituted with -CH = CH-, etc." For example, any of -CH 2 -substituted with -O- or -CH = CH- in C 4 H 9 -is C 3 H 7 O-, CH 3 -O- (CH 2 ) 2- , CH 3 -O-CH 2 -O- and the like. Similarly, any of -CH 2 CH 2 -substituted with -CH = CH- in C 5 H 11 -is H 2 C = CH- (CH 2 ) 3- , CH 3 -CH = CH- (CH 2 ) 2 -etc., and further any -CH 2 -substituted with -O- is CH 3 -CH = CH-CH 2 -O- and the like. Thus the term "arbitrary" means "at least one selected without distinction". Furthermore, in consideration of the stability of the compound, CH 3 -O-CH 2 -O-, which is not adjacent to oxygen, is preferable to CH 3 -OO-CH 2- , which is adjacent to oxygen.

另外,關於環A,「任意的氫可經鹵素、碳數1~10的烷基、或碳數1~10的鹵化烷基取代」這一語句是指例如1,4-伸苯基的2,3,5,6位的至少一個氫經氟或甲基等取代基取代的情況下的實施方式,另外,取代基為「碳數1~10的鹵化烷基」的情況下的實施方式包含如2-氟乙基或3-氟-5-氯己基的例子。In addition, regarding ring A, the phrase "arbitrary hydrogen may be substituted with halogen, alkyl having 1 to 10 carbon atoms, or halogenated alkyl having 1 to 10 carbon atoms" means, for example, 2,4-phenylene Embodiments in which at least one hydrogen at positions 3, 5, and 6 are substituted with a substituent such as fluorine or methyl, and embodiments in which the substituent is a "halogenated alkyl group having 1 to 10 carbon atoms" include Examples are 2-fluoroethyl or 3-fluoro-5-chlorohexyl.

「化合物(1-1)」是指下述式(1-1)所表示的液晶化合物,且亦有時是指下述式(1-1)所表示的化合物的至少一種。於一個化合物(1-1)具有多個A時,任意的兩個A可相同亦可不同。於多個化合物(1-1)具有A時,任意的兩個A可相同亦可不同。該規則亦適用於Ra1 或Z等其他記號、基等。The "compound (1-1)" means a liquid crystal compound represented by the following formula (1-1), and sometimes means at least one of the compounds represented by the following formula (1-1). When a compound (1-1) has multiple A's, any two A's may be the same or different. When multiple compounds (1-1) have A, any two A's may be the same or different. This rule also applies to other symbols and bases such as R a1 or Z.

[散熱片用組成物I] 對本發明的散熱片的製造方法中使用的組成物(以下,設為組成物I)進行說明。但是,以下說明的組成物為一例,本發明中使用的組成物並不限定於此。 散熱片用組成物亦可包含:於兩末端具有包含氧雜環丙基或氧雜環丁基的結構的聚合性液晶化合物;使所述聚合性液晶化合物硬化的硬化劑;及由氮化物形成的無機填料。組成物I的硬化溫度為所述聚合性液晶化合物顯示液晶相的溫度範圍以上且顯示各向同性相的溫度範圍以下。 藉由利用聚合性液晶化合物的液晶相,可形成於分子秩序良好地排列的狀態下聚合(硬化)而成的樹脂相。熱可經由配向的分子及沿配向排列的無機填料而流動,從而可於配向方向獲得高導熱性。[Composition I for Heat Radiation Sheet] A composition (hereinafter, referred to as a composition I) used in the method for producing a heat radiation sheet of the present invention will be described. However, the composition described below is an example, and the composition used in the present invention is not limited to this. The composition for a heat sink may further include: a polymerizable liquid crystal compound having a structure containing an oxetanyl group or an oxetanyl group at both ends; a hardener for hardening the polymerizable liquid crystal compound; and a nitride. Inorganic filler. The curing temperature of the composition I is at least the temperature range in which the polymerizable liquid crystal compound exhibits a liquid crystal phase and the temperature range in which the isotropic phase is exhibited. By using the liquid crystal phase of the polymerizable liquid crystal compound, it is possible to form a resin phase that is polymerized (cured) in a state where the molecular order is aligned. Heat can flow through aligned molecules and inorganic fillers arranged along the alignment, so that high thermal conductivity can be obtained in the alignment direction.

<聚合性液晶化合物> 作為聚合性液晶化合物,可列舉下述式(1-1)所表示的液晶化合物。化合物(1-1)具有液晶骨架與聚合性基,具有高聚合反應性、寬廣的液晶相溫度範圍、良好的混和性等。該化合物(1-1)於與其他液晶性化合物或聚合性化合物等混合時,容易變得易於均勻。 Ra1 -Z-(A-Z)m1 -Ra1 (1-1)<Polymerizable Liquid Crystal Compound> Examples of the polymerizable liquid crystal compound include a liquid crystal compound represented by the following formula (1-1). The compound (1-1) has a liquid crystal skeleton and a polymerizable group, has high polymerization reactivity, a wide liquid crystal phase temperature range, and good miscibility. When the compound (1-1) is mixed with another liquid crystal compound, a polymerizable compound, or the like, the compound (1-1) tends to be easily uniform. R a1 -Z- (AZ) m1 -R a1 (1-1)

藉由適宜選擇所述化合物(1-1)的末端基Ra1 、環結構A及鍵結基Z,可任意地調整液晶相表現區域等的物性。以下說明末端基Ra1 、環結構A及鍵結基Z的種類對化合物(1-1)的物性產生的效果、以及該些的較佳例。By appropriately selecting the terminal group R a1 , the ring structure A, and the bonding group Z of the compound (1-1), physical properties such as a liquid crystal phase expression region can be arbitrarily adjusted. The effects of the types of the terminal group R a1 , the ring structure A, and the bonding group Z on the physical properties of the compound (1-1), and preferable examples thereof will be described below.

·末端基Ra1 於末端基Ra1 為直鏈狀烷基的情況下,液晶相的溫度範圍寬廣,且黏度小。另一方面,於Ra1 為分支狀烷基的情況下,與其他液晶性化合物的相容性良好。於Ra1 為氰基、鹵素、-CF3 、-OCF3 的情況下,亦顯示良好的液晶相溫度範圍,介電常數各向異性高,具有適度的相容性。· A terminal group at the end group R a1 case where R a1 is a linear alkyl group, a wide temperature range of liquid crystal phase and a small viscosity. On the other hand, when R a1 is a branched alkyl group, compatibility with other liquid crystal compounds is good. In R a1 is cyano, halogen, -CF 3, -OCF 3 of the case, also showed good liquid crystal phase temperature range, high dielectric anisotropy, having a moderate compatibility.

作為較佳的Ra1 ,可列舉:氫、氟、氯、氰基、-N=C=O、-N=C=S、烷基、烷氧基、烷氧基烷基、烷氧基烷氧基、烷硫基、烷硫基烷氧基、烯基、烯氧基、烯氧基烷基、烷氧基烯基、炔基、炔氧基等。於該些基中,亦較佳為至少一個氫經鹵素取代的基。較佳的鹵素為氟、氯,進而佳為氟。作為具體例,為單氟烷基、聚氟烷基、全氟烷基、單氟烷氧基、聚氟烷氧基、全氟烷氧基等。關於該些基,就聲子的易傳導性、即熱的易傳遞性的觀點而言,相較於分支鏈,較佳為直鏈。Examples of preferred R a1 include: hydrogen, fluorine, chlorine, cyano, -N = C = O, -N = C = S, alkyl, alkoxy, alkoxyalkyl, and alkoxyalkane Oxy, alkylthio, alkylthioalkoxy, alkenyl, alkenyloxy, alkenylalkyl, alkoxyalkenyl, alkynyl, alkynyloxy and the like. Among these groups, a group in which at least one hydrogen is substituted with halogen is also preferable. Preferred halogens are fluorine and chlorine, and still more preferably fluorine. Specific examples include monofluoroalkyl, polyfluoroalkyl, perfluoroalkyl, monofluoroalkoxy, polyfluoroalkoxy, perfluoroalkoxy, and the like. From the viewpoint of the phonon's easy conductivity, that is, the easy transfer of heat, these groups are more preferably linear than branched chains.

作為進而佳的Ra1 ,可列舉:氫、氟、氯、氰基、-CF3 、-CF2 H、-CFH2 、-OCF3 、-OCF2 H、碳數1~10的烷基、碳數1~10的烷氧基、碳數2~10的烷氧基烷基等。作為所述烷基、烷氧基及烷氧基烷基,例如可列舉:甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基、壬基、癸基、甲氧基、乙氧基、丙氧基、丁氧基、戊氧基、己氧基、庚氧基、辛氧基、壬氧基、癸氧基、甲氧基甲基、甲氧基乙基等。作為特佳的Ra1 ,為碳數1~10的烷基、碳數1~10的烷氧基。Further preferable examples of R a1 include hydrogen, fluorine, chlorine, cyano, -CF 3 , -CF 2 H, -CFH 2 , -OCF 3 , -OCF 2 H, alkyl group having 1 to 10 carbon atoms, An alkoxy group having 1 to 10 carbon atoms, an alkoxyalkyl group having 2 to 10 carbon atoms, and the like. Examples of the alkyl group, alkoxy group, and alkoxyalkyl group include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, and methyl. Oxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, heptyloxy, octyloxy, nonoxy, decoxy, methoxymethyl, methoxyethyl Wait. Particularly preferred R a1 is an alkyl group having 1 to 10 carbon atoms and an alkoxy group having 1 to 10 carbon atoms.

·環結構A 於環結構A中的至少一個環為1,4-伸苯基的情況下,配向秩序參數(orientational order parameter)及磁化各向異性大。另外,於至少兩個環為1,4-伸苯基的情況下,液晶相的溫度範圍寬廣,進而透明點高。於1,4-伸苯基環上的至少一個氫經取代為氰基、鹵素、-CF3 或-OCF3 的情況下,介電常數各向異性高。另外,於至少兩個環為1,4-伸環己基的情況下,透明點高,且黏度小。· Ring structure A When at least one ring in ring structure A is 1,4-phenylene, the orientation order parameter and the magnetization anisotropy are large. In addition, when at least two rings are 1,4-phenylene, the temperature range of the liquid crystal phase is wide, and the transparent point is high. When at least one hydrogen on a 1,4-phenylene ring is substituted with cyano, halogen, -CF 3 or -OCF 3 , the dielectric constant anisotropy is high. In addition, when at least two rings are 1,4-cyclohexyl, the transparent point is high and the viscosity is small.

作為較佳的A,可列舉:1,4-伸環己基、1,4-伸環己烯基、2,2-二氟-1,4-伸環己基、1,3-二噁烷-2,5-二基、1,4-伸苯基、2-氟-1,4-伸苯基、2,3-二氟-1,4-伸苯基、2,5-二氟-1,4-伸苯基、2,6-二氟-1,4-伸苯基、2,3,5-三氟-1,4-伸苯基、吡啶-2,5-二基、3-氟吡啶-2,5-二基、嘧啶-2,5-二基、噠嗪-3,6-二基、萘-2,6-二基、四氫萘-2,6-二基、茀-2,7-二基、9-甲基茀-2,7-二基、9,9-二甲基茀-2,7-二基、9-乙基茀-2,7-二基、9-氟茀-2,7-二基、9,9-二氟茀-2,7-二基等。As preferred A, 1,4-cyclohexyl, 1,4-cyclohexenyl, 2,2-difluoro-1,4-cyclohexyl, 1,3-dioxane- 2,5-diyl, 1,4-phenylene, 2-fluoro-1,4-phenylene, 2,3-difluoro-1,4-phenylene, 2,5-difluoro-1 1,4-phenylene, 2,6-difluoro-1,4-phenylene, 2,3,5-trifluoro-1,4-phenylene, pyridine-2,5-diyl, 3- Fluoropyridine-2,5-diyl, pyrimidine-2,5-diyl, pyridazine-3,6-diyl, naphthalene-2,6-diyl, tetrahydronaphthalene-2,6-diyl, fluorene -2,7-diyl, 9-methylfluorene-2,7-diyl, 9,9-dimethylfluorene-2,7-diyl, 9-ethylfluorene-2,7-diyl, 9-fluorofluorene-2,7-diyl, 9,9-difluorofluorene-2,7-diyl, etc.

關於1,4-伸環己基及1,3-二噁烷-2,5-二基的立體構型,相較於順式,反式較佳。由於2-氟-1,4-伸苯基及3-氟-1,4-伸苯基結構相同,故未例示後者。該規則亦適用於2,5-二氟-1,4-伸苯基與3,6-二氟-1,4-伸苯基的關係等。Regarding the stereo configuration of 1,4-cyclohexyl and 1,3-dioxane-2,5-diyl, the trans is better than the cis. Since the structures of 2-fluoro-1,4-phenylene and 3-fluoro-1,4-phenylene are the same, the latter is not exemplified. This rule also applies to the relationship between 2,5-difluoro-1,4-phenylene and 3,6-difluoro-1,4-phenylene.

作為進而佳的A,為1,4-伸環己基、1,4-伸環己烯基、1,3-二噁烷-2,5-二基、1,4-伸苯基、2-氟-1,4-伸苯基、2,3-二氟-1,4-伸苯基、2,5-二氟-1,4-伸苯基、2,6-二氟-1,4-伸苯基等。特佳的A為1,4-伸環己基及1,4-伸苯基。Further preferred A is 1,4-cyclohexyl, 1,4-cyclohexenyl, 1,3-dioxane-2,5-diyl, 1,4-phenylene, 2- Fluoro-1,4-phenylene, 2,3-difluoro-1,4-phenylene, 2,5-difluoro-1,4-phenylene, 2,6-difluoro-1,4 -Phenylene etc. Particularly preferred A is 1,4-cyclohexyl and 1,4-phenylene.

·鍵結基Z 於鍵結基Z為單鍵、-(CH2 )2 -、-CH2 O-、-OCH2 -、-CF2 O-、-OCF2 -、-CH=CH-、-CF=CF-或-(CH2 )4 -的情況下,特別是為單鍵、-(CH2 )2 -、-CF2 O-、-OCF2 -、-CH=CH-或-(CH2 )4 -的情況下,黏度變小。另外,於鍵結基Z為-CH=CH-、-CH=N-、-N=CH-、-N=N-或-CF=CF-的情況下,液晶相的溫度範圍寬廣。另外,於鍵結基Z為碳數4~10左右的烷基的情況下,熔點降低。Bonding group Z is a single bond to bonding group Z,-(CH 2 ) 2- , -CH 2 O-, -OCH 2- , -CF 2 O-, -OCF 2- , -CH = CH-, In the case of -CF = CF- or-(CH 2 ) 4- , especially a single bond,-(CH 2 ) 2- , -CF 2 O-, -OCF 2- , -CH = CH- or-( In the case of CH 2 ) 4- , the viscosity becomes small. When the bonding group Z is -CH = CH-, -CH = N-, -N = CH-, -N = N-, or -CF = CF-, the temperature range of the liquid crystal phase is wide. When the bonding group Z is an alkyl group having about 4 to 10 carbon atoms, the melting point is lowered.

作為較佳的Z,可列舉:單鍵、-(CH2 )2 -、-(CF2 )2 -、-COO-、-OCO-、-CH2 O-、-OCH2 -、-CF2 O-、-OCF2 -、-CH=CH-、-CF=CF-、-C≡C-、-(CH2 )4 -、-(CH2 )3 O-、-O(CH2 )3 -、-(CH2 )2 COO-、-OCO(CH2 )2 -、-CH=CH-COO-、-OCO-CH=CH-等。Examples of preferred Z include a single bond,-(CH 2 ) 2 -,-(CF 2 ) 2- , -COO-, -OCO-, -CH 2 O-, -OCH 2- , -CF 2 O-, -OCF 2- , -CH = CH-, -CF = CF-, -C≡C-,-(CH 2 ) 4 -,-(CH 2 ) 3 O-, -O (CH 2 ) 3 -,-(CH 2 ) 2 COO-, -OCO (CH 2 ) 2- , -CH = CH-COO-, -OCO-CH = CH-, and the like.

作為進而佳的Z,可列舉:單鍵、-(CH2 )2 -、-COO-、-OCO-、-CH2 O-、-OCH2 -、-CF2 O-、-OCF2 -、-CH=CH-、-C≡C-等。作為特佳的Z,為單鍵、-(CH2 )2 -、-COO-或-OCO-。Further preferred Z include a single bond,-(CH 2 ) 2- , -COO-, -OCO-, -CH 2 O-, -OCH 2- , -CF 2 O-, -OCF 2- , -CH = CH-, -C≡C-, etc. Particularly preferred Z is a single bond,-(CH 2 ) 2- , -COO-, or -OCO-.

於所述化合物(1-1)具有三個以下的環時,黏度低,於具有三個以上的環時,透明點高。再者,於本說明書中,基本上將六員環及包含六員環的縮合環等視為環,例如單獨的三員環或四員環、五員環並不被視為環。另外,萘環或茀環等縮合環被視為一個環。When the compound (1-1) has three or less rings, the viscosity is low, and when it has three or more rings, the transparent point is high. In addition, in this specification, a six-membered ring and a condensed ring including a six-membered ring are basically regarded as a ring. For example, a three-membered ring or a four-membered ring and a five-membered ring are not considered as a ring. A condensed ring such as a naphthalene ring or a fluorene ring is regarded as one ring.

所述化合物(1-1)可為光學活性,亦可為光學惰性。於化合物(1-1)為光學活性的情況下,該化合物(1-1)存在具有不對稱碳的情況與具有不對稱軸的情況。不對稱碳的立體構型可為R亦可為S。不對稱碳可位於Ra1 或A的任一者,若具有不對稱碳,則化合物(1-1)的相容性良好。於化合物(1-1)具有不對稱軸的情況下,扭曲誘導力大。另外,旋光性可為任一種。 如以上般,藉由適宜選擇末端基Ra1 、環結構A及鍵結基Z的種類、環的個數,可獲得具有目標物性的化合物。The compound (1-1) may be optically active or optically inert. In the case where the compound (1-1) is optically active, the compound (1-1) has a case having an asymmetric carbon and a case having an asymmetric axis. The stereo configuration of the asymmetric carbon may be R or S. The asymmetric carbon may be located on either R a1 or A, and if it has an asymmetric carbon, the compatibility of the compound (1-1) is good. When the compound (1-1) has an asymmetric axis, the twist-inducing force is large. In addition, any of the optical rotation properties may be used. As described above, by appropriately selecting the type of the terminal group R a1 , the ring structure A and the bonding group Z, and the number of rings, a compound having a desired physical property can be obtained.

·化合物(1-1) 化合物(1-1)亦可如下述式(1-a)或式(1-b)般表示。 P-Y-(A-Z)m -Ra (1-a) P-Y-(A-Z)m -Y-P (1-b)Compound (1-1) The compound (1-1) can also be represented by the following formula (1-a) or (1-b). PY- (AZ) m -R a (1-a) PY- (AZ) m -YP (1-b)

於所述式(1-a)及式(1-b)中,A、Z、Ra 與由所述式(1-1)定義的A、Z、Ra1 含義相同,P表示下述式(2-1)~式(2-2)所表示的聚合性基,Y表示單鍵或碳數1~20的伸烷基、較佳為碳數1~10的伸烷基,該伸烷基中,任意的-CH2 -可經-O-、-S-、-CO-、-COO-、-OCO-或-CH=CH-取代。作為特佳的Y,為碳數1~10的伸烷基的單末端或兩末端的-CH2 -經-O-取代的伸烷基。m為1~6的整數,較佳為2~6的整數,進而佳為2~4的整數。In the formulae (1-a) and (1-b), A, Z, and R a have the same meanings as A, Z, and R a1 defined by the formula (1-1), and P represents the following formula (2-1) to the polymerizable group represented by formula (2-2), Y represents a single bond or an alkylene group having 1 to 20 carbon atoms, preferably an alkylene group having 1 to 10 carbon atoms, and the alkylene group In the group, any -CH 2 -may be substituted by -O-, -S-, -CO-, -COO-, -OCO-, or -CH = CH-. Particularly preferred Y is a -CH 2 -O-substituted alkylene group at one or both ends of an alkylene group having 1 to 10 carbon atoms. m is an integer of 1 to 6, preferably an integer of 2 to 6, and more preferably an integer of 2 to 4.

作為較佳的化合物(1-1)的例子,可列舉以下所示的化合物(a-1)~化合物(g-20)。Examples of the preferable compound (1-1) include the compounds (a-1) to (g-20) shown below.

[化2] [Chemical 2]

[化3] [Chemical 3]

[化4] [Chemical 4]

[化5] [Chemical 5]

[化6] [Chemical 6]

[化7] [Chemical 7]

[化8] [Chemical 8]

[化9] [Chemical 9]

[化10] [Chemical 10]

[化11] [Chemical 11]

[化12] [Chemical 12]

[化13] [Chemical 13]

[化14] [Chemical 14]

[化15] [Chemical 15]

於所述化學式(a-1)~化學式(g-20)中,Ra 、P及Y如所述式(1-a)及式(1-b)中所定義。 Z1 為單鍵、-(CH2 )2 -、-(CF2 )2 -、-(CH2 )4 -、-CH2 O-、-OCH2 -、-(CH2 )3 O-、-O(CH2 )3 -、-COO-、-OCO-、-CH=CH-、-CF=CF-、-CH=CHCOO-、-OCOCH=CH-、-(CH2 )2 COO-、-OCO(CH2 )2 -、-C≡C-、-C≡C-COO-、-OCO-C≡C-、-C≡C-CH=CH-、-CH=CH-C≡C-、-CH=N-、-N=CH-、-N=N-、-OCF2 -或-CF2 O-。再者,多個Z1 可相同亦可不同。In the chemical formula (a-1) to the chemical formula (g-20), R a , P, and Y are as defined in the formula (1-a) and the formula (1-b). Z 1 is a single bond,-(CH 2 ) 2 -,-(CF 2 ) 2 -,-(CH 2 ) 4- , -CH 2 O-, -OCH 2 -,-(CH 2 ) 3 O-, -O (CH 2 ) 3- , -COO-, -OCO-, -CH = CH-, -CF = CF-, -CH = CHCOO-, -OCOCH = CH-,-(CH 2 ) 2 COO-, -OCO (CH 2 ) 2- , -C≡C-, -C≡C-COO-, -OCO-C≡C-, -C≡C-CH = CH-, -CH = CH-C≡C- , -CH = N-, -N = CH-, -N = N-, -OCF 2 -or -CF 2 O-. Furthermore, a plurality of Z 1 may be the same or different.

Z2 為-(CH2 )2 -、-(CF2 )2 -、-(CH2 )4 -、-CH2 O-、-OCH2 -、-(CH2 )3 O-、-O(CH2 )3 -、-COO-、-OCO-、-CH=CH-、-CF=CF-、-CH=CHCOO-、-OCOCH=CH-、-(CH2 )2 COO-、-OCO(CH2 )2 -、-C≡C-、-C≡C-COO-、-OCO-C≡C-、-C≡C-CH=CH-、-CH=CH-C≡C-、-CH=N-、-N=CH-、-N=N-、-OCF2 -或-CF2 O-。Z 2 is-(CH 2 ) 2 -,-(CF 2 ) 2 -,-(CH 2 ) 4- , -CH 2 O-, -OCH 2 -,-(CH 2 ) 3 O-, -O ( CH 2 ) 3- , -COO-, -OCO-, -CH = CH-, -CF = CF-, -CH = CHCOO-, -OCOCH = CH-,-(CH 2 ) 2 COO-, -OCO ( CH 2 ) 2- , -C≡C-, -C≡C-COO-, -OCO-C≡C-, -C≡C-CH = CH-, -CH = CH-C≡C-, -CH = N-, -N = CH-, -N = N-, -OCF 2 -or -CF 2 O-.

Z3 為單鍵、碳數1~10的烷基、-(CH2 )a -、-O(CH2 )a O-、-CH2 O-、-OCH2 -、-O(CH2 )3 -、-(CH2 )3 O-、-COO-、-OCO-、-CH=CH-、-CH=CHCOO-、-OCOCH=CH-、-(CH2 )2 COO-、-OCO(CH2 )2 -、-CF=CF-、-C≡C-、-CH=N-、-N=CH-、-N=N-、-OCF2 -或-CF2 O-,多個Z3 可相同亦可不同。a為1~20的整數。Z 3 is a single bond, an alkyl group having 1 to 10 carbon atoms,-(CH 2 ) a- , -O (CH 2 ) a O-, -CH 2 O-, -OCH 2- , -O (CH 2 ) 3 -,-(CH 2 ) 3 O-, -COO-, -OCO-, -CH = CH-, -CH = CHCOO-, -OCOCH = CH-,-(CH 2 ) 2 COO-, -OCO ( CH 2 ) 2- , -CF = CF-, -C≡C-, -CH = N-, -N = CH-, -N = N-, -OCF 2 -or -CF 2 O-, multiple Z 3 can be the same or different. a is an integer of 1-20.

X為任意的氫可經鹵素、烷基、氟化烷基取代的1,4-伸苯基及茀-2,7-二基的取代基,表示鹵素、烷基或氟化烷基。X is a substituent of 1,4-phenylene and fluorene-2,7-diyl in which any hydrogen may be substituted with halogen, alkyl, or fluorinated alkyl, and represents halogen, alkyl, or fluorinated alkyl.

對所述化合物(1-1)的更佳的實施方式進行說明。更佳的化合物(1-1)可以下述式(1-c)或式(1-d)表示。 P1 -Y-(A-Z)m -Ra (1-c) P1 -Y-(A-Z)m -Y-P1 (1-d) 於所述式中,A、Y、Z、Ra 及m如上文所定義,P1 表示下述式(2-1)~式(2-2)所表示的聚合性基。於所述式(1-d)的情況下,兩個P1 表示相同的聚合性基(2-1)~聚合性基(2-2),兩個Y表示相同的基,兩個Y是以成為對稱的方式鍵結。A more preferred embodiment of the compound (1-1) will be described. A more preferable compound (1-1) can be represented by the following formula (1-c) or (1-d). P 1 -Y- (AZ) m -R a (1-c) P 1 -Y- (AZ) m -YP 1 (1-d) In the formula, A, Y, Z, R a and m As defined above, P 1 represents a polymerizable group represented by the following formulae (2-1) to (2-2). In the case of the formula (1-d), two P 1 represent the same polymerizable group (2-1) to polymerizable group (2-2), two Y represent the same group, and two Y are Bonded in a way that becomes symmetrical.

[化16] [Chemical 16]

以下表示所述化合物(1-1)的更佳的具體例。More specific examples of the compound (1-1) are shown below.

[化17] [Chemical 17]

[化18] [Chemical 18]

[化19] [Chemical 19]

·化合物(1-1)的合成方法 所述化合物(1-1)可藉由組合有機合成化學中公知的方法而合成。將目標末端基、環結構及鍵結基導入至起始物質的方法例如於霍本-維勒(Houben-Weyl, 有機化學方法(Methods of Organic Chemistry), 格奧爾格蒂梅出版社(Georg Thieme Verlag), 斯圖加特(Stuttgart))、有機合成(Organic Syntheses, 約翰威立父子出版社(John Wily & Sons, Inc.))、有機反應(Organic Reactions, 約翰威立父子出版社(John Wily & Sons Inc.))、綜合有機合成(Comprehensive Organic Synthesis,培格曼出版社(Pergamon Press))、新實驗化學講座(丸善)等成書中有所記載。另外,亦可參照日本專利特開2006-265527號公報。-Method for synthesizing compound (1-1) The compound (1-1) can be synthesized by a combination of methods known in organic synthetic chemistry. Methods for introducing target end groups, ring structures, and bonding groups into starting materials, such as Houben-Weyl (Methods of Organic Chemistry), Georg Thieme Verlag, Stuttgart), Organic Syntheses (John Wily & Sons, Inc.), Organic Reactions, John Wily & Sons Inc .)), Comprehensive Organic Synthesis (Pergamon Press), New Experimental Chemistry Lecture (Maruzen) and other books are recorded. Also, refer to Japanese Patent Laid-Open No. 2006-265527.

<硬化劑> 以下表示較佳的硬化劑的例子。 作為胺系硬化劑,可列舉:二乙三胺、三乙四胺、四乙五胺、鄰二甲苯二胺、間二甲苯二胺、對二甲苯二胺、三甲基六亞甲基二胺、2-甲基五亞甲基二胺、二乙基胺基丙基胺、異佛爾酮二胺、1,3-雙胺基甲基環己烷、雙(4-胺基-3-甲基環己基)甲烷、雙(4-胺基環己基)甲烷、降冰片烯二胺、1,2-二胺基環己烷、3,9-二丙胺-2,4,8,10-四氧雜螺[5,5]十一烷、4,4'-二胺基二苯基甲烷、4,4'-二胺基-1,2-二苯基乙烷、鄰苯二胺、間苯二胺、對苯二胺、4,4'-二胺基二苯基碸、聚氧丙烯二胺、聚氧丙烯三胺、多環己基多胺、N-胺基乙基哌嗪等。 特別是二胺可於不阻礙聚合性液晶化合物的液晶性的情況下使聚合性液晶化合物硬化,故較佳。硬化劑的量只要根據環氧當量或氧雜環丁烷當量而適宜選擇即可。<Hardener> Examples of preferred hardeners are shown below. Examples of the amine-based hardener include diethylenetriamine, triethylenetetramine, tetraethylenepentamine, o-xylenediamine, m-xylenediamine, p-xylenediamine, and trimethylhexamethylenediamine. Amine, 2-methylpentamethylenediamine, diethylaminopropylamine, isophoronediamine, 1,3-bisaminomethylcyclohexane, bis (4-amino-3 -Methylcyclohexyl) methane, bis (4-aminocyclohexyl) methane, norbornenediamine, 1,2-diaminocyclohexane, 3,9-dipropylamine-2,4,8,10 -Tetraoxaspiro [5,5] undecane, 4,4'-diaminodiphenylmethane, 4,4'-diamino-1,2-diphenylethane, o-phenylenediamine , M-phenylenediamine, p-phenylenediamine, 4,4'-diaminodiphenylphosphonium, polyoxypropylenediamine, polyoxypropylenetriamine, polycyclohexylpolyamine, N-aminoethylpiperazine Wait. In particular, a diamine is preferable because it can harden the polymerizable liquid crystal compound without hindering the liquid crystallinity of the polymerizable liquid crystal compound. The amount of the curing agent may be appropriately selected depending on the epoxy equivalent or the oxetane equivalent.

<無機填料> 作為無機填料,可列舉:可成為高導熱性的填充材的氮化鋁、氮化硼、氮化矽等氮化物。亦可為金剛石、石墨、碳化矽、矽、氧化鈹、氧化鎂、氧化鋁、氧化鋅、氧化矽、氧化銅、氧化鈦、氧化鈰、氧化釔、氧化錫、氧化鈥、氧化鉍、氧化鈷、氧化鈣、氮化鋁、氮化硼、氮化矽、氫氧化鎂、氫氧化鋁、金、銀、銅、鉑、鐵、錫、鉛、鎳、鋁、鎂、鎢、鉬、不鏽鋼等無機填充材及金屬填充材。作為填充材的形狀,可列舉:球狀、無定形、纖維狀、棒狀、筒狀、板狀等。填充材的形狀為藉由流動而容易引起配向的形狀、例如板狀或針狀、以及該些的凝聚體容易有效發揮液晶的特徵,故較佳。填充材的種類、形狀、大小、添加量等可根據目的而適宜選擇。於所獲得的散熱片需要絕緣性的情況下,若保持所期望的絕緣性,則亦可為具有導電性的填充材。<Inorganic filler> Examples of the inorganic filler include nitrides such as aluminum nitride, boron nitride, and silicon nitride that can be used as a filler with high thermal conductivity. Can also be diamond, graphite, silicon carbide, silicon, beryllium oxide, magnesium oxide, aluminum oxide, zinc oxide, silicon oxide, copper oxide, titanium oxide, cerium oxide, yttrium oxide, tin oxide, oxide ', bismuth oxide, cobalt oxide , Calcium oxide, aluminum nitride, boron nitride, silicon nitride, magnesium hydroxide, aluminum hydroxide, gold, silver, copper, platinum, iron, tin, lead, nickel, aluminum, magnesium, tungsten, molybdenum, stainless steel, etc. Inorganic filler and metal filler. Examples of the shape of the filler include a spherical shape, an amorphous shape, a fibrous shape, a rod shape, a tube shape, and a plate shape. The shape of the filler is preferably a shape in which alignment is easily caused by the flow, such as a plate shape or a needle shape, and these agglomerates are easy to effectively exhibit the characteristics of liquid crystals, and are therefore preferred. The type, shape, size, and addition amount of the filler can be appropriately selected according to the purpose. When the obtained heat sink requires insulation, it may be a conductive filler if the desired insulation is maintained.

較佳為氮化硼、氮化鋁。特佳為六方晶系的氮化硼(h-BN)或氮化鋁。氮化硼、氮化鋁由於平面方向的導熱率非常高,介電常數亦低,絕緣性亦高,故較佳。 另外,若板狀填料於板狀方向進行配向,則水平方向的導熱率上昇,但垂直方向(厚度方向)的導熱率下降。因而,較佳為使球狀、無定形、針狀(纖維狀、棒狀)、筒狀、板狀等的填料凝聚而成的例如沙漠玫瑰狀的二次粒子。Preferred are boron nitride and aluminum nitride. Particularly preferred is hexagonal boron nitride (h-BN) or aluminum nitride. Boron nitride and aluminum nitride are preferable because the thermal conductivity in the plane direction is very high, the dielectric constant is also low, and the insulation is also high. In addition, if the plate-shaped filler is aligned in the plate-like direction, the thermal conductivity in the horizontal direction increases, but the thermal conductivity in the vertical direction (thickness direction) decreases. Therefore, secondary particles, such as desert rose, are preferably formed by agglomerating fillers such as spherical, amorphous, needle-like (fibrous, rod-like), cylindrical, and plate-like fillers.

無機填料亦可直接使用未經修飾者(圖3左)。若使用未經修飾的無機填料,則可減少製備的步驟,故較佳。或者,亦可使用其表面經偶合劑處理者(圖3中央)。例如,如圖3所示,利用矽烷偶合劑對氮化硼(h-BN)進行處理。於氮化硼的情況下,由於在粒子的平面無反應基,故僅於其周圍鍵結矽烷偶合劑。認為經矽烷偶合劑處理的氮化硼可與組成物中的具有特定的鍵結基的聚合性液晶化合物經由矽烷偶合劑而形成鍵,該鍵有助於導熱。 矽烷偶合劑較佳為與氧雜環丙基等或硬化劑反應,故較佳為胺系或於末端具有氧雜環丙基等者。例如可列舉捷恩智(JNC)(股)製造的塞拉艾斯(Sila-Ace)S310、塞拉艾斯(Sila-Ace)S320、塞拉艾斯(Sila-Ace)S330、塞拉艾斯(Sila-Ace)S360、塞拉艾斯(Sila-Ace)S510、塞拉艾斯(Sila-Ace)S530等。The inorganic filler can also be directly used without modification (Figure 3 left). If an unmodified inorganic filler is used, the preparation steps can be reduced, so it is preferable. Alternatively, a surface treated with a coupling agent may be used (center in FIG. 3). For example, as shown in FIG. 3, boron nitride (h-BN) is treated with a silane coupling agent. In the case of boron nitride, since there is no reactive group in the plane of the particle, a silane coupling agent is bonded only around the particle. It is thought that boron nitride treated with a silane coupling agent can form a bond with the polymerizable liquid crystal compound having a specific bonding group in the composition via the silane coupling agent, and this bond contributes to heat conduction. The silane coupling agent preferably reacts with an oxetanyl group or a hardening agent, and is therefore preferably an amine system or has an oxetanyl group at the terminal. For example, Sila-Ace S310, Sila-Ace S320, Sila-Ace S330, Sera-Ace manufactured by JNC (Sila-Ace) S360, Sila-Ace S510, Sila-Ace S530, etc.

無機填料亦可使用經矽烷偶合劑處理後進而藉由聚合性液晶化合物進行表面修飾者(圖3右)。例如,如圖3所示,藉由聚合性液晶化合物對經矽烷偶合劑處理的氮化硼(h-BN)進行表面修飾。認為藉由聚合性液晶化合物進行表面修飾的氮化硼可與組成物中的聚合性液晶化合物形成鍵,該鍵有助於導熱。The inorganic filler can also be treated with a silane coupling agent and then surface-modified with a polymerizable liquid crystal compound (Figure 3 right). For example, as shown in FIG. 3, a boron nitride (h-BN) treated with a silane coupling agent is surface-modified with a polymerizable liquid crystal compound. It is considered that boron nitride surface-modified with a polymerizable liquid crystal compound can form a bond with the polymerizable liquid crystal compound in the composition, and this bond contributes to heat conduction.

無機填料亦可為相對於粒徑大的粒子(第一無機填料)而加入粒徑小的粒子(第二無機填料)並進行混合填充者。藉由混合填充,小的粒子進入大的粒子間的空隙中,因此可更密地進行填充,可進一步減少空隙。第一無機填料較佳為所述二次粒子,第二無機填料只要為粒徑小於第一無機填料者即可,可為二次粒子亦可為一次粒子。再者,於兩成分的混合填充中,若藉由大的粒子與小的粒子以可成為最密填充的混合比率(體積比率或重量比率)進行填充,則可有助於減少空隙而較佳。大的粒子的平均粒子型較佳為10 μm至1000 μm,更佳為10 μm至500 μm,進而佳為25 μm至500 μm。The inorganic filler may be a particle having a large particle size (first inorganic filler), and a particle having a small particle size (second inorganic filler) is added and mixed. By mixing and filling, small particles enter into the spaces between the large particles, so that the particles can be filled more densely, and the spaces can be further reduced. The first inorganic filler is preferably the secondary particle, and the second inorganic filler is only required to have a particle diameter smaller than that of the first inorganic filler, and may be a secondary particle or a primary particle. Furthermore, in the two-component mixed filling, if the large particles and the small particles are filled at the mixing ratio (volume ratio or weight ratio) that can be the most densely packed, it can help reduce voids and is better. . The average particle size of the large particles is preferably 10 μm to 1000 μm, more preferably 10 μm to 500 μm, and even more preferably 25 μm to 500 μm.

於兩成分的混合填充中,因混合比率而空間率(粒子間的間隙)發生變化。可成為空間率最小(最密填充)的混合比率可藉由公知的方法,例如參照「鈴木道隆,「粒子物性對粉體的密填充產生的影響」,粉體工學會誌,粉體工學會,2003年,第40卷,第5號,p22-28」來求出。 具體而言,空間率(ε)可藉由下述兩式而獲得。於下述兩式中,ε1、ε2為大小粒子單獨的空間率,SV1、SV2為大小粒子的體積基準混合分率。 ε=1-(1-ε1)/SV1 ε=1-(1-ε2)/{1-(SV2×ε2)} 使用藉由菲納斯(Furnas)的所述兩式而計算的空間率(ε)中大的值來求出混合比率。 關於無機填料的含量,若將以可成為最密填充的混合比率進行最密填充時(所述空間率(ε)最小時)的填充率設為100%,則較佳為填充率成為70%以上的量,更佳為成為80%以上的量,進而佳為成為90%以上的量,最佳為100%。於一成分的填充及兩成分以上的混合填充中亦相同。關於較佳的填充率下的混合比率,是使用藉由菲納斯(Furnas)的所述兩式而計算的空間率(ε)中大的值,根據空間率與混合比率(體積比率或重量比率等)的圖表而求出。 再者,無機填料可有三成分以上或不規則形狀粒子、粒度分佈。可成為最密填充的混合比率可藉由公知的方法,例如參照「鈴木道隆,「三成分粒子無規填充層的空間率」,化學工學論文集,化學工學會,1984年,第10卷,第6號,p721-727」、「鈴木道隆,「具有粒度分佈的多成分粒子無規填充層的空間率」,化學工學論文集,化學工學會,1985年,第11卷,第4號,p438-443」來求出。In the two-component mixed filling, the space ratio (gap between particles) changes due to the mixing ratio. The mixing ratio that can become the smallest space ratio (closest packing) can be known by methods such as "Suzuki Doro," The effect of particle physical properties on dense packing of powders ", Journal of Powder Engineering Society, Powder Engineering Society , 2003, Vol. 40, No. 5, p22-28 ". Specifically, the space ratio (ε) can be obtained by the following two expressions. In the following two formulas, ε1 and ε2 are individual space ratios of large and small particles, and SV1 and SV2 are volume-based mixing fractions of large and small particles. ε = 1- (1-ε1) / SV1 ε = 1- (1-ε2) / {1- (SV2 × ε2)} uses the space ratio calculated by the two expressions of Furnas ( ε) to determine the mixing ratio. Regarding the content of the inorganic filler, if the filling rate is 100% when the densest packing is performed at the mixing ratio that can be the closest packing (when the space ratio (ε) is the smallest), the filling rate is preferably 70%. The above amount is more preferably an amount of 80% or more, further preferably an amount of 90% or more, and most preferably 100%. The same applies to the filling of one component and the mixed filling of two or more components. As for the mixing ratio at a preferable filling ratio, a large value of the space ratio (ε) calculated by the two expressions of Furnas is used, and the space ratio and the mixing ratio (volume ratio or weight) are used. Ratio, etc.). Furthermore, the inorganic filler may have three or more components or irregularly shaped particles and a particle size distribution. The mixing ratio that can be the most densely packed can be achieved by a known method, for example, refer to "Suzuki Doro," Space ratio of a three-component particle random packing layer ", Proceedings of Chemical Engineering, Society of Chemical Engineering, 1984, Vol. 10 , No. 6, p721-727 "," Suzuki Doro, "Space ratio of random packing layer of multi-component particles with particle size distribution", Proceedings of Chemical Engineering, Society of Chemical Engineering, 1985, Vol. 11, No. 4 No., p438-443 ".

<其他構成要素> 本發明中使用的組成物I是包含至少一種所述化合物(1-1),且使其與作為高導熱無機填充材的無機填料複合而成者。該組成物可包括兩種以上的化合物(1-1),另外,亦可包括至少一種化合物(1-1)與化合物(1-1)以外的至少一種化合物的組合。此種化合物(1-1)以外的構成要素並無特別限定,例如可列舉化合物(1-1)以外的聚合性化合物(以下亦稱為「其他聚合性化合物」)、非聚合性的液晶性化合物、聚合起始劑、及溶媒等。<Other components> The composition I used in the present invention is composed of at least one of the compounds (1-1) and compounded with an inorganic filler as a highly thermally conductive inorganic filler. The composition may include two or more compounds (1-1), and may also include a combination of at least one compound (1-1) and at least one compound other than compound (1-1). The constituent elements other than the compound (1-1) are not particularly limited, and examples thereof include polymerizable compounds (hereinafter also referred to as "other polymerizable compounds") other than the compound (1-1), and non-polymerizable liquid crystal properties. Compounds, polymerization initiators, and solvents.

<非聚合性的液晶性化合物> 本發明中使用的組成物I亦可將不具有聚合性基的液晶性化合物作為構成要素。此種非聚合性的液晶性化合物的例子於作為液晶性化合物的資料庫的液晶資料庫(LiqCryst, LCI出版社(LCI Publisher GmbH),漢堡市(Hamburg),德國(Germany))等中有所記載。可藉由使含有非聚合性的液晶性化合物的該組成物聚合而獲得化合物(1-1)的聚合體與液晶性化合物的複合材料(composite materials)。於此種複合材料中,例如於如高分子分散型液晶的高分子網眼中存在非聚合性的液晶性化合物。<Non-polymerizable liquid crystal compound> The composition I used in the present invention may include a liquid crystal compound having no polymerizable group as a constituent element. Examples of such non-polymerizable liquid crystal compounds are available in a liquid crystal database (LiqCryst, LCI Publisher GmbH, Hamburg, Germany), etc. as a library of liquid crystal compounds. Record. By polymerizing the composition containing a non-polymerizable liquid crystal compound, a composite material of a polymer of the compound (1-1) and a liquid crystal compound can be obtained. In such a composite material, for example, a non-polymerizable liquid crystal compound is present in a polymer mesh such as a polymer dispersed liquid crystal.

<聚合起始劑> 本發明中使用的組成物I亦可將聚合起始劑作為構成要素。聚合起始劑只要根據該組成物的聚合方法使用例如光自由基聚合起始劑、光陽離子聚合起始劑、熱自由基聚合起始劑等即可。作為熱自由基聚合用的較佳的起始劑,例如可列舉:過氧化苯甲醯、過氧化二碳酸二異丙酯、過氧化-2-乙基己酸第三丁酯、過氧化三甲基乙酸第三丁酯、二-第三丁基過氧化物(DTBPO)、過氧化二異丁酸第三丁酯、過氧化月桂醯、2,2'-偶氮雙異丁酸二甲酯(MAIB)、偶氮雙異丁腈(AIBN)、偶氮雙環己烷碳腈(ACN)等。<Polymerization initiator> The composition I used in the present invention may have a polymerization initiator as a constituent element. The polymerization initiator may be, for example, a photoradical polymerization initiator, a photocationic polymerization initiator, a thermal radical polymerization initiator, or the like according to the polymerization method of the composition. Examples of preferred initiators for thermal radical polymerization include benzamidine peroxide, diisopropyl peroxydicarbonate, tert-butyl peroxy-2-ethylhexanoate, and triperoxide. Tert-butyl methyl acetate, di-tertiary butyl peroxide (DTBPO), tertiary butyl diisobutyrate, lauryl peroxide, dimethyl 2,2'-azobisisobutyrate Ester (MAIB), azobisisobutyronitrile (AIBN), azobiscyclohexanecarbonitrile (ACN), etc.

<溶媒> 本發明中使用的組成物I亦可含有溶媒。該組成物的聚合可於溶媒中進行,亦可於無溶媒下進行。亦可藉由例如旋塗法等將含有溶媒的該組成物塗佈於基板上後,去除溶媒後進行光聚合。另外,亦可於光硬化後加溫至適當的溫度,藉由熱硬化而進行後處理。作為較佳的溶媒,例如可列舉:苯、甲苯、二甲苯、均三甲苯、己烷、庚烷、辛烷、壬烷、癸烷、四氫呋喃、γ-丁內酯、N-甲基吡咯啶酮、二甲基甲醯胺、二甲基亞碸、環己烷、甲基環己烷、環戊酮、環己酮、丙二醇單甲醚乙酸酯(propylene glycol monomethyl ether acetate,PGMEA)等。所述溶媒可單獨使用一種,亦可混合使用兩種以上。再者,限定聚合時的溶媒的使用比例並無太大意義,只要考慮聚合效率、溶媒成本、能量成本等而按各事例(case)分別決定即可。<Solvent> The composition I used in the present invention may contain a solvent. The polymerization of the composition may be performed in a solvent, or may be performed without a solvent. The composition containing a solvent may be applied to a substrate by, for example, a spin coating method, and then the solvent may be removed to perform photopolymerization. In addition, it may be heated to an appropriate temperature after photo-curing, and post-treatment may be performed by thermal curing. Examples of preferred solvents include benzene, toluene, xylene, mesitylene, hexane, heptane, octane, nonane, decane, tetrahydrofuran, γ-butyrolactone, and N-methylpyrrolidine. Ketones, dimethylformamide, dimethylmethylene, cyclohexane, methylcyclohexane, cyclopentanone, cyclohexanone, propylene glycol monomethyl ether acetate (PGMEA), etc. . The solvents may be used singly or in combination of two or more kinds. Furthermore, it does not make much sense to limit the use ratio of the solvent during the polymerization, as long as the polymerization efficiency, the cost of the solvent, the energy cost, and the like are taken into consideration and determined separately for each case.

<其他> 所述化合物(1-1)由於具有高聚合性,故為了使操作容易,亦可添加穩定劑。作為此種穩定劑,可無限制地使用公知者,例如可列舉:對苯二酚、4-乙氧基苯酚及3,5-二-第三丁基-4-羥基甲苯(BHT)等。 進而,為了調整組成物I的黏度或顏色,亦可添加添加劑(氧化物等)。例如可列舉:用以形成白色的氧化鈦、用以形成黑色的碳黑、用以調整黏度的二氧化矽的微粉末。另外,為了進一步增加機械強度,亦可添加添加劑。例如可列舉:玻璃、碳纖維等無機纖維或布、或者作為高分子添加劑的聚乙烯甲醛、聚乙烯丁醛、聚酯、聚醯胺、聚醯亞胺等纖維或長分子。另外,為了提高可靠性,亦可添加抗氧化劑、耐光劑等添加劑。<Others> Since the compound (1-1) has high polymerizability, a stabilizer may be added in order to facilitate handling. As such a stabilizer, a known one can be used without limitation, and examples thereof include hydroquinone, 4-ethoxyphenol, and 3,5-di-third-butyl-4-hydroxytoluene (BHT). Further, in order to adjust the viscosity or color of the composition I, additives (such as oxides) may be added. Examples include fine powders of titanium oxide to form white, carbon black to form black, and silicon dioxide to adjust viscosity. In order to further increase the mechanical strength, additives may be added. Examples include inorganic fibers or cloths such as glass and carbon fibers, or fibers or long molecules such as polyvinyl formaldehyde, polyvinyl butyral, polyester, polyamide, and polyimide as polymer additives. In addition, in order to improve reliability, additives such as an antioxidant and a lightfastener may be added.

[散熱片用組成物II] 本發明的散熱片的製造方法中使用的組成物亦可為包含至少一種化合物(1-1)以外的聚合性化合物(其他聚合性化合物),且使其與作為高導熱無機填充材的無機填料複合而成者(以下,設為組成物II)。此種聚合性化合物較佳為不會使膜形成性及機械強度降低的化合物。該聚合性化合物分類為不具有液晶性的化合物與具有液晶性的化合物。作為不具有液晶性的聚合性化合物,可列舉:乙烯基衍生物、苯乙烯衍生物、(甲基)丙烯酸衍生物、山梨酸衍生物、富馬酸衍生物、衣康酸衍生物等。 組成物II除使用不具有液晶性的聚合性化合物代替聚合性液晶化合物以外,可設為與組成物I相同的構成要素。[Composition for heat sink II] The composition used in the method for producing a heat sink of the present invention may be a polymerizable compound (other polymerizable compound) other than at least one compound (1-1), and may be used as A composite of inorganic fillers of a highly thermally conductive inorganic filler (hereinafter, referred to as composition II). Such a polymerizable compound is preferably a compound that does not lower film formability and mechanical strength. The polymerizable compound is classified into a compound having no liquid crystallinity and a compound having liquid crystallinity. Examples of the polymerizable compound having no liquid crystal properties include a vinyl derivative, a styrene derivative, a (meth) acrylic acid derivative, a sorbic acid derivative, a fumaric acid derivative, an itaconic acid derivative, and the like. The composition II can be the same component as the composition I except that a polymerizable compound having no liquid crystallinity is used instead of the polymerizable liquid crystal compound.

[組成物的製造方法] <實施偶合處理及聚合性液晶化合物的表面修飾的情況> 於使用經偶合劑處理的無機填料的情況下,對無機填料實施偶合處理。偶合處理可使用公知的方法。 作為一例,首先將無機填料粒子與偶合劑加入至溶媒中。使用攪拌器等加以攪拌後進行放置。於溶媒乾燥後,使用真空乾燥機等在真空條件下進行加熱處理。向該無機填料粒子中加入溶媒,藉由超音波處理進行粉碎。使用離心分離機對該溶液進行分離精製。捨棄上清液後,加入溶媒進行數次相同的操作。使用烘箱而使精製後的無機填料粒子乾燥。 其次,使用瑪瑙研缽等將經偶合處理的無機填料粒子與聚合性液晶化合物混合後,使用雙軸輥等進行混練。之後,藉由超音波處理及離心分離進行分離精製。 進而使用瑪瑙研缽等將胺系硬化劑混合後,使用雙軸輥等進行混練。藉此,可獲得不含有溶媒的組成物I。[Manufacturing method of composition] <When performing a coupling treatment and surface modification of a polymerizable liquid crystal compound> When using an inorganic filler treated with a coupling agent, a coupling treatment is performed on the inorganic filler. For the coupling treatment, a known method can be used. As an example, first, inorganic filler particles and a coupling agent are added to a solvent. Stir using a stirrer or the like and let stand. After the solvent is dried, heat treatment is performed under a vacuum condition using a vacuum dryer or the like. A solvent is added to the inorganic filler particles, and the particles are pulverized by ultrasonic treatment. This solution was separated and purified using a centrifugal separator. After discarding the supernatant, the same operation was performed several times by adding a solvent. The purified inorganic filler particles are dried using an oven. Next, the coupling-treated inorganic filler particles and the polymerizable liquid crystal compound are mixed with an agate mortar or the like, and then kneaded with a biaxial roller or the like. Thereafter, separation and purification were performed by ultrasonic treatment and centrifugation. After further mixing the amine hardener with an agate mortar or the like, the mixture is kneaded with a biaxial roller or the like. Thereby, the composition I which does not contain a solvent can be obtained.

[散熱片的製造方法] 作為一例,使用不含有溶媒的組成物I來對本發明的第1實施形態的散熱片的製造方法進行具體說明。本發明的散熱片的製造方法包括煅燒步驟,煅燒步驟是以使組成物I所含有的聚合性液晶化合物進行聚合的溫度進行加熱。 (1)將不含有溶媒的組成物I放入壓縮成形機的模具中,於大氣壓下自相對於精加工後的散熱片的厚度而成為上下方向的方向施加壓力(壓製),形成壓縮的狀態(堅固狀態)。再者,所謂相對於精加工後的散熱片的厚度而成為上下方向的方向,是圖4的箭頭的方向。 (2)對堅固狀態的組成物I施加壓力並且緩緩提高溫度,藉此使聚合性液晶化合物的分子流動配向,於溫度上昇至聚合溫度為止後保持溫度而使組成物I進行聚合(煅燒步驟)。 或者 (1)將不含有溶媒的組成物I放入壓縮成形機的模具中,於大氣壓下自相對於精加工後的散熱片的厚度而成為上下方向的方向施加壓力(壓製),形成壓縮的狀態(堅固狀態)。由於在抽真空之前進行壓縮,故可抑制組成物I所含有的粒子的飛散而較佳。 (2)對堅固狀態的組成物I施加壓力,並且自室溫放入真空烘箱中而進行抽真空(真空步驟)。 (3)於真空環境下,對堅固狀態的組成物I施加壓力並且緩緩提高溫度,藉此使聚合性液晶化合物的分子流動配向,於溫度上昇至聚合溫度為止後保持溫度而使組成物I進行聚合(煅燒步驟)。[Manufacturing method of heat sink] As an example, the manufacturing method of the heat sink according to the first embodiment of the present invention will be specifically described using the composition I containing no solvent. The method for producing a heat sink of the present invention includes a firing step, and the firing step is heating at a temperature at which the polymerizable liquid crystal compound contained in the composition I is polymerized. (1) Put the composition I containing no solvent into the mold of a compression molding machine, and apply pressure (press) under the atmospheric pressure in a vertical direction relative to the thickness of the finished fins to form a compressed state. (Solid state). It should be noted that the direction that becomes the vertical direction with respect to the thickness of the fins after finishing is the direction of the arrow in FIG. 4. (2) Pressure is applied to the composition I in a solid state and the temperature is gradually increased to thereby orient the molecular flow of the polymerizable liquid crystal compound. After the temperature rises to the polymerization temperature, the composition I is polymerized by maintaining the temperature (calcination step) ). Or (1) Put the composition I containing no solvent into the mold of a compression molding machine, and apply pressure (press) under the atmospheric pressure from the direction of the up-down direction relative to the thickness of the finished heat sink to form a compressed State (solid state). Since compression is performed before evacuation, scattering of particles contained in the composition I is preferably suppressed. (2) A pressure is applied to the composition I in a solid state, and it is evacuated by placing it in a vacuum oven at room temperature (vacuum step). (3) In a vacuum environment, pressure is applied to the composition I in a solid state and the temperature is gradually increased to thereby orient the molecular flow of the polymerizable liquid crystal compound. After the temperature rises to the polymerization temperature, the temperature is maintained to make the composition I Polymerization is carried out (calcination step).

作為一例,使用不含有溶媒的組成物I來對本發明的第2實施形態的散熱片的製造方法進行具體說明。本發明的散熱片的製造方法包括暫時成形步驟與煅燒步驟,暫時成形步驟是以對組成物進行壓縮成形的溫度進行加熱,煅燒步驟是以使組成物I所含有的聚合性液晶化合物進行聚合的溫度進行加熱。 (1)將不含有溶媒的組成物I放入壓縮成形機的模具中,於大氣壓下自相對於精加工後的散熱片的厚度而成為上下方向的方向施加壓力(壓製),並且於聚合溫度以下進行加熱,形成壓縮的狀態(堅固狀態)(暫時成形步驟)。 (2)對暫時成形步驟後的組成物I施加壓力,並且放入真空烘箱中而進行抽真空(真空步驟)。 (3)於真空環境下,對暫時成形步驟後的組成物I施加壓力並且緩緩提高溫度,藉此使聚合性液晶化合物的分子流動配向,於溫度上昇至聚合溫度為止後保持溫度,藉由加熱使組成物I進行聚合(煅燒步驟)。 或者 (1)將不含有溶媒的組成物I放入壓縮成形機的模具中,於大氣壓下或真空環境下自相對於精加工後的散熱片的厚度而成為上下方向的方向施加壓力(壓製)並且進行加溫,形成壓縮的狀態(堅固狀態)(暫時成形步驟)。 (2)不對暫時成形步驟後的組成物I施加壓力,放入真空烘箱中進行抽真空(真空步驟)。 (3)於真空環境下緩緩提高溫度,藉此使聚合性液晶化合物的分子流動配向,於溫度上昇至聚合溫度為止後保持溫度,藉由加熱使暫時成形步驟後的組成物I進行聚合(煅燒步驟)。As an example, the manufacturing method of the heat sink of the 2nd Embodiment of this invention is demonstrated using composition I which does not contain a solvent. The method for manufacturing a heat sink of the present invention includes a temporary forming step and a firing step. The temporary forming step is performed by heating the composition at a temperature for compression molding. The firing step is performed by polymerizing the polymerizable liquid crystal compound contained in the composition I. The temperature is heated. (1) Put the composition I containing no solvent into the mold of a compression molding machine, apply pressure (press) under the atmospheric pressure from the direction of up-down relative to the thickness of the finished heat sink, and at the polymerization temperature Next, heating is performed to form a compressed state (solid state) (temporary forming step). (2) A pressure is applied to the composition I after the temporary forming step, and the resultant is placed in a vacuum oven to be evacuated (vacuum step). (3) In a vacuum environment, pressure is applied to the composition I after the temporary forming step, and the temperature is gradually increased, so that the molecular flow alignment of the polymerizable liquid crystal compound is maintained, and the temperature is maintained after the temperature rises to the polymerization temperature. The composition I is polymerized by heating (calcination step). Or (1) Put the composition I containing no solvent into the mold of a compression molding machine, and apply pressure (press) under the atmospheric pressure or vacuum environment from the direction of the thickness of the finished heat sink to the vertical direction. Then, heating is performed to form a compressed state (solid state) (temporary forming step). (2) Put no pressure on the composition I after the temporary forming step, and put it into a vacuum oven to evacuate (vacuum step). (3) Slowly increase the temperature in a vacuum environment, thereby orienting the molecular flow of the polymerizable liquid crystal compound, maintain the temperature after the temperature rises to the polymerization temperature, and polymerize the composition I after the temporary molding step by heating ( Calcination step).

聚合性液晶化合物藉由壓縮成形而進行配向成形,因此於顯示液晶相的溫度範圍以上進行配向成形及聚合而可形成聚合體,故較佳。 對組成物I施加的壓力只要為模具不會受到破壞的範圍即可,例如可列舉5 MPa~500 MPa。壓縮時的壓力基本上以高為佳。但是,較佳為根據模具的強度或目標物性(重視哪一方向的導熱率等)而適宜變更,施加適當的壓力。於暫時成形時與煅燒時所施加的壓力可相同亦可不同。 加熱時的溫度只要為於暫時成形步驟及煅燒步驟中可對組成物進行壓縮成形、且聚合性液晶化合物於真空狀態下可更容易浸入空隙中的溫度即可,更佳為於提高溫度時可將液晶狀態加以滯留或保持。另外,煅燒步驟根據組成物中的聚合性液晶化合物而不同,可花費時間直線性加熱,亦可於特定溫度下以特定時間進行加熱,抑或可於特定溫度下階段性實施特定時間的加熱。如此只要為促進聚合反應的加熱方法即可,根據組成物的構成要素來適宜選擇。將液晶狀態加以滯留或保持的時間較佳為1秒至4小時,更佳為1秒至1小時,進而佳為1秒至30分鐘。 真空時的壓力基本上以低為佳。例如,所謂真空,為0.1 MPa以下,較佳為1 KPa以下,更佳為100 Pa以下,進而佳為10 Pa以下。Since the polymerizable liquid crystal compound is subjected to alignment molding by compression molding, it is preferable to perform alignment molding and polymerization at a temperature range above the temperature range in which the liquid crystal phase is displayed to form a polymer, which is preferable. The pressure to be applied to the composition I may be a range in which the mold is not damaged, and examples thereof include 5 MPa to 500 MPa. The pressure during compression is basically preferably high. However, it is preferable to appropriately change according to the strength of the mold or the target physical properties (in which direction the thermal conductivity is important, etc.), and to apply an appropriate pressure. The pressure applied during the temporary forming and the firing may be the same or different. The temperature during heating may be a temperature at which the composition can be compression-molded in the temporary molding step and the calcination step, and the polymerizable liquid crystal compound can be more easily immersed in the void in a vacuum state. Hold or maintain the liquid crystal state. In addition, the firing step varies depending on the polymerizable liquid crystal compound in the composition, and it may take time to heat linearly, may be heated at a specific temperature for a specific time, or may be heated stepwise at a specific temperature for a specific time. As long as it is a heating method which accelerates a polymerization reaction as described above, it is appropriately selected depending on the constituent elements of the composition. The time for which the liquid crystal state is retained or held is preferably 1 second to 4 hours, more preferably 1 second to 1 hour, and even more preferably 1 second to 30 minutes. The pressure during vacuum is basically preferably low. For example, the vacuum is 0.1 MPa or less, preferably 1 KPa or less, more preferably 100 Pa or less, and even more preferably 10 Pa or less.

如所述般,對於組成物,與壓縮組合並且於大氣壓或真空下進行加熱來製造散熱片。認為藉由本發明的製造方法,可抑制散熱片內的空隙的生成,所生成的空隙可由組成物中的樹脂填埋,結果亦可提高垂直(厚度)方向的導熱性。As described above, the composition is combined with compression and heated under atmospheric pressure or vacuum to manufacture a heat sink. It is considered that the production method of the present invention can suppress the generation of voids in the heat sink, and the generated voids can be filled with the resin in the composition, and as a result, the thermal conductivity in the vertical (thickness) direction can be improved.

作為一例,使用含有溶媒的組成物I來對本發明的第3實施形態的散熱片的製造方法進行具體說明。 (1)於基板上塗佈組成物I並將溶媒乾燥去除而形成膜厚均勻的塗膜層。作為塗佈方法,例如可列舉:旋塗、輥塗、簾塗、流塗、印刷、微凹版塗佈、凹版塗佈、線條碼、浸漬塗佈、噴霧塗佈、彎月面塗佈法等。As an example, the manufacturing method of the heat sink of 3rd Embodiment of this invention is demonstrated concretely using the composition I containing a solvent. (1) The composition I is coated on a substrate and the solvent is dried and removed to form a coating film layer having a uniform film thickness. Examples of the coating method include spin coating, roll coating, curtain coating, flow coating, printing, microgravure coating, gravure coating, line coding, dip coating, spray coating, and meniscus coating. .

溶媒的乾燥去除例如可藉由室溫下的風乾、利用加熱板的乾燥、利用乾燥爐的乾燥、溫風或熱風的吹送等進行。溶媒去除的條件並無特別限定,只要乾燥至將溶媒大致去除,塗膜層的流動性消失即可。再者,根據組成物I中使用的化合物的種類與組成比,有時於對塗膜層進行乾燥的過程中塗膜層中的液晶分子的分子配向結束。但是,為了使塗膜層中的液晶分子的配向進一步均勻化,較佳為對經過乾燥步驟的塗膜層進行熱處理及聚合處理而使配向固定。因而,經過乾燥步驟後的步驟可與使用不含有溶媒的組成物時的方法相同。The drying and removal of the solvent can be performed, for example, by air-drying at room temperature, drying by a hot plate, drying by a drying furnace, and blowing by warm air or hot air. The conditions for removing the solvent are not particularly limited, as long as it is dried until the solvent is substantially removed, and the fluidity of the coating film layer disappears. Furthermore, depending on the type and composition ratio of the compound used in the composition I, the molecular alignment of the liquid crystal molecules in the coating film layer may be completed during the process of drying the coating film layer. However, in order to make the alignment of the liquid crystal molecules in the coating film layer more uniform, it is preferable to perform heat treatment and polymerization treatment on the coating film layer after the drying step to fix the alignment. Therefore, the steps after the drying step can be the same as when the composition containing no solvent is used.

再者,作為組成物I的聚合方法,例如可列舉:自由基聚合、陰離子聚合、陽離子聚合、配位聚合等,為了使分子排列固定或使螺旋結構固定,適宜的是利用電子束、紫外線、可見光線或紅外線(熱線)等光線或熱的熱聚合或光聚合。熱聚合較佳為於自由基聚合起始劑的存在下進行,光聚合較佳為於光自由基聚合起始劑的存在下進行。另外,根據無機填料的含量,較佳為利用熱的熱聚合。所獲得的聚合體亦可為均聚物、無規共聚物、交替共聚物、嵌段共聚物、接枝共聚物的任一種,只要根據用途等而適宜選擇即可。Examples of the polymerization method of the composition I include radical polymerization, anionic polymerization, cationic polymerization, and coordination polymerization. In order to fix the molecular arrangement or the helical structure, it is suitable to use electron beam, ultraviolet light, Thermal or photopolymerization of light or heat such as visible light or infrared rays (hot rays). The thermal polymerization is preferably performed in the presence of a radical polymerization initiator, and the photopolymerization is preferably performed in the presence of a photoradical polymerization initiator. In addition, depending on the content of the inorganic filler, thermal polymerization using heat is preferred. The obtained polymer may be any of a homopolymer, a random copolymer, an alternating copolymer, a block copolymer, and a graft copolymer, and may be appropriately selected depending on the application and the like.

亦可於組成物I的塗佈前對基板表面進行配向處理。作為對基板表面進行配向處理的方法,例如有於基板上使用液晶顯示器用垂直配向劑的方法等。It is also possible to perform an alignment treatment on the substrate surface before coating the composition I. As a method for performing an alignment treatment on the substrate surface, for example, a method of using a vertical alignment agent for a liquid crystal display on a substrate, and the like.

[散熱片] 圖2是使用氮化硼作為無機填料時的散熱片的圖像圖。 本發明的第4實施形態的散熱片於厚度方向具有超過20 W/mK的導熱率。較佳為具有25 W/mK以上的導熱率,更佳為具有30 W/mK以上的導熱率。此種散熱片可藉由所述第1實施形態~第3實施形態的散熱片的製造方法來製造。[Heat Sink] FIG. 2 is an image diagram of a heat sink when boron nitride is used as the inorganic filler. The heat sink of the fourth embodiment of the present invention has a thermal conductivity exceeding 20 W / mK in the thickness direction. The thermal conductivity is preferably 25 W / mK or more, and more preferably the thermal conductivity is 30 W / mK or more. Such a heat sink can be manufactured by the manufacturing method of the heat sink of the said 1st-3rd embodiment.

藉由對包含至少一種化合物(1-1)的組成物I進行配向控制並使其聚合而獲得的聚合體於配向方向具有高導熱性,此外藉由本發明的散熱片的製造方法而製造的片進而於厚度方向上亦可具有優異的導熱性。A polymer obtained by controlling and polymerizing composition I containing at least one compound (1-1) has high thermal conductivity in the alignment direction, and a sheet produced by the method for producing a heat sink of the present invention Furthermore, it can have excellent thermal conductivity in the thickness direction.

藉由使包含至少一種化合物(1-1)的組成物I進行聚合而獲得的聚合體較佳為熱硬化性樹脂。若使用兩末端為聚合性基的化合物(1-1),則容易獲得熱硬化性樹脂。 熱硬化性樹脂具有三維的交聯結構。此種聚合體由於不溶於溶媒,故無法測定分子量。但是,於藉由在基板上塗佈組成物I使分子的配向固定並進行聚合來獲得散熱片的情況下,由於不進一步實施加工,故分子量的大小不成問題,只要於使用環境下滿足條件即可。另外,為了進一步提高分子量,亦可添加交聯劑。藉此,可獲得耐化學品性及耐熱性極優異的聚合體。作為此種交聯劑,可無限制地使用公知者,例如可列舉三(3-巰基丙酸酯)等。The polymer obtained by polymerizing the composition I containing at least one compound (1-1) is preferably a thermosetting resin. When the compound (1-1) having a polymerizable group at both ends is used, a thermosetting resin is easily obtained. The thermosetting resin has a three-dimensional crosslinked structure. Since such a polymer is insoluble in a solvent, the molecular weight cannot be measured. However, in the case where the heat sink is obtained by applying the composition I on the substrate to fix the molecular alignment and polymerize it, the molecular weight is not a problem because no further processing is performed, as long as the conditions are satisfied in the use environment. can. In order to further increase the molecular weight, a crosslinking agent may be added. Thereby, a polymer excellent in chemical resistance and heat resistance can be obtained. As such a crosslinking agent, a known one can be used without limitation, and examples thereof include tris (3-mercaptopropionate).

藉由對包含至少一種化合物(1-1)的組成物I進行配向控制並使其聚合而獲得的聚合體具有分子配向於任意方向上固定的特徵。如此,藉由使液晶分子的液晶原部位沿一定方向儘可能均勻地配向而進行固定化,可獲得於配向方向上賦予有高導熱性的聚合體。配向方向可藉由在聚合前使液晶分子排列而任意地控制。The polymer obtained by controlling and polymerizing the composition I containing at least one compound (1-1) has a characteristic that the molecular orientation is fixed in an arbitrary direction. In this way, by fixing the liquid crystal molecules of the liquid crystal molecules as uniformly as possible in a certain direction, a polymer having high thermal conductivity in the alignment direction can be obtained. The alignment direction can be arbitrarily controlled by aligning liquid crystal molecules before polymerization.

再者,藉由使沿一定方向排列的膜於各方向上積層,可達成向全部方向的高導熱化。此種積層結構亦可藉由重覆「組成物的塗佈→聚合→組成物的塗佈→聚合」的過程而形成。以所述方式形成積層結構於緩和所獲得的散熱片的機械強度的各向異性的方面亦有用。另外,亦可切取沿一定方向排列的膜,以配向成為縱向的方式再配置膜,從而提高膜的厚度方向的導熱化。Furthermore, by laminating films arranged in a certain direction in each direction, high thermal conductivity in all directions can be achieved. Such a laminated structure can also be formed by repeating the process of "application of the composition → polymerization → application of the composition → polymerization". Forming the laminated structure in this manner is also useful for alleviating the anisotropy of the mechanical strength of the obtained heat sink. In addition, the film arranged in a certain direction may be cut out, and the film may be arranged so that the film is aligned in the vertical direction, thereby improving the thermal conductivity in the thickness direction of the film.

本發明的散熱片除片以外,亦可以膜、薄膜、纖維、成形體等形狀使用。再者,本發明的散熱片的厚度為5 μm以上,較佳為10 μm~1000 μm,更佳為20 μm~500 μm,厚度只要根據用途來適宜變更即可。例如,本發明的散熱片亦可用作導熱性優異的接著片,該情況下的厚度為數十μm。於將散熱片用作半導體的絕緣基板的情況下,厚度成為數百μm。如此,本發明的散熱片亦可用作散熱基板、散熱膜、散熱接著片、散熱成形品。In addition to the sheet, the heat sink of the present invention may be used in the shape of a film, a film, a fiber, a molded body, or the like. The thickness of the heat sink of the present invention is 5 μm or more, preferably 10 μm to 1000 μm, and more preferably 20 μm to 500 μm. The thickness may be appropriately changed according to the application. For example, the heat sink of the present invention can also be used as an adhesive sheet having excellent thermal conductivity, and the thickness in this case is several tens of μm. When a heat sink is used as an insulating substrate for a semiconductor, the thickness is several hundred μm. In this way, the heat sink of the present invention can also be used as a heat sink substrate, a heat sink film, a heat sink adhesive sheet, and a heat sink molded product.

[基板] 本發明的第5實施形態的基板包括所述第4實施形態的散熱片、與金屬板。作為包括散熱片與金屬板的基板,可列舉散熱片與熱匯的組合或散熱片與金屬電極的組合。於金屬板可列舉銅、鋁、鎳、金、鍍鎳附銅、鍍金附銅。[Substrate] A substrate according to a fifth embodiment of the present invention includes the heat sink and the metal plate of the fourth embodiment. Examples of the substrate including a heat sink and a metal plate include a combination of a heat sink and a heat sink, or a combination of a heat sink and a metal electrode. Examples of the metal plate include copper, aluminum, nickel, gold, nickel-plated copper, and gold-plated copper.

[功率半導體模組] 本發明的第6實施形態的功率半導體模組包括:功率半導體用基板,其具有成為絕緣基板的所述第4實施形態的散熱片、與形成於所述散熱片上的導體電路;以及功率半導體晶片,配置於所述功率半導體用基板上,並與所述導體電路電性連接。本發明的散熱片除高導熱性以外亦具有高耐熱性、高絕緣性。因此,於功率半導體模組中,例如對於如因高電力而需要更有效率的散熱機構的絕緣閘雙極電晶體(Insulated Gate Bipolar Transistor,IGBT)的模組特別有效。IGBT是半導體元件之一,是將金氧半導體場效電晶體(Metal-Oxide-Semiconductor Field-Effect Transistor,MOSFET)組入至閘極部而成的雙極電晶體,可用於電力控制的用途。包括IGBT的電子機器可列舉大電力反相器(inverter)的主轉換元件、無停電電源裝置、交流電動機的可變電壓可變頻率控制裝置、鐵道車輛的控制裝置、混合動力汽車、電車等的電動輸送機器、感應加熱(induction heat,IH)調理器等。 [實施例][Power semiconductor module] A power semiconductor module according to a sixth embodiment of the present invention includes a power semiconductor substrate including the heat sink of the fourth embodiment as an insulating substrate, and a conductor formed on the heat sink. A circuit; and a power semiconductor wafer, which is disposed on the power semiconductor substrate and is electrically connected to the conductor circuit. The heat sink of the present invention has high heat resistance and high insulation in addition to high thermal conductivity. Therefore, the power semiconductor module is particularly effective for, for example, an insulated gate bipolar transistor (IGBT) module that requires a more efficient heat dissipation mechanism due to high power. IGBT is one of the semiconductor components. It is a bipolar transistor formed by combining a metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) into the gate, which can be used for power control applications. Electronic devices including IGBTs include main converter elements of high-power inverters, non-stop power supply devices, variable voltage and frequency control devices for AC motors, control devices for railway vehicles, hybrid vehicles, and trams. Electric conveyors, induction heat (IH) conditioners, etc. [Example]

以下,使用實施例對本發明進行詳細說明。但是,本發明並不限定於以下實施例中所記載的內容。Hereinafter, the present invention will be described in detail using examples. However, the present invention is not limited to the contents described in the following examples.

本發明的實施例中使用的成分材料如以下般。 <無機填料> ·氮化硼h-BN粒子,日本邁圖高新材料(Momentive Performance Materials Japan)(合)製造,(商品名)帕拉姆(PolarTherm)PTX-25、帕拉姆(PolarTherm)PT-670 ·氮化硼,日本3M(股)製造,普萊特萊斯(Platelets)003 <聚合性液晶化合物> ·聚合性氧雜環丙基化合物,捷恩智(JNC)(股)製造,下述式(1) [化20](1) <胺系硬化劑> ·4,4'-乙二苯胺,東京化成工業(股)製造 <矽烷偶合劑> ·N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷,捷恩智(JNC)(股)製造,(商品名)塞拉艾斯(Sila-Ace)S320 [化21] The component materials used in the examples of the present invention are as follows. <Inorganic filler> · Boron nitride h-BN particles, manufactured by Momentive Performance Materials Japan (commercial), (brand name) PolarTherm PTX-25, PolarTherm PT -670 · Boron nitride, manufactured by Japan 3M Corporation, Platelets 003 <Polymerizable liquid crystal compound> · Polymerizable oxelanyl compound, manufactured by JNC Corporation, as follows Formula (1) (1) <Amine-based hardener> · 4,4'-ethylenediphenylamine, manufactured by Tokyo Chemical Industry Co., Ltd. <silane coupling agent> · N- (2-aminoethyl) -3-aminopropyltrimethylamine Oxysilane, manufactured by JNC (stock), (brand name) Sila-Ace S320 [Chem. 21]

<實施例1> 無機填料混合物的製作 量取捷恩智(JNC)(股)製造的化合物(1)的0.774 g、與4,4'-二胺基-1,2-二苯基甲烷的0.223 g,放入瑪瑙研缽中,充分磨碎後進行混合。該混合物的重量比率是根據環氧當量與胺的活性氫當量來求出。將該混合物稱作混合物A。 將該混合物A的0.997 g與PTX-25的5 g放入鋁容器中,於55℃的加熱板上適宜攪拌並且加熱10分鐘。將其稱作PTX-25混合物。再者,55℃為捷恩智(JNC)(股)製造的化合物(1)成為液晶狀態的溫度。 同樣地,混合物A的0.997 g與PT-670的5 g亦同樣地進行處理。將其稱作PT-670混合物。 分別量取PTX-25混合物的0.1 g與PT-670混合物的0.82 g並充分混合。粒徑不同的PTX-25與PT-670以粒子間的空間率成為最小的方式(以成為最密填充的方式)決定混合比率及含量。<Example 1> The production amount of the inorganic filler mixture was 0.774 g of Compound (1) manufactured by JNC Corporation and 0.223 with 4,4'-diamino-1,2-diphenylmethane. g, put in an agate mortar, grind thoroughly, and mix. The weight ratio of this mixture is calculated | required from epoxy equivalent and active hydrogen equivalent of an amine. This mixture is called mixture A. Put 0.997 g of this mixture A and 5 g of PTX-25 in an aluminum container, and stir and heat on a hot plate at 55 ° C. for 10 minutes. This is called a PTX-25 mixture. In addition, 55 ° C is the temperature at which the compound (1) manufactured by JNC Corporation becomes a liquid crystal state. Similarly, 0.997 g of mixture A and 5 g of PT-670 were treated in the same manner. This is called a PT-670 mixture. Measure 0.1 g of the PTX-25 mixture and 0.82 g of the PT-670 mixture separately and mix thoroughly. PTX-25 and PT-670, which have different particle sizes, determine the mixing ratio and content so that the space ratio between the particles is the smallest (so that it is the most densely packed).

成形及聚合 如圖4所示,將所獲得的PTX-25混合物與PT-670混合物的混合物夾於將散熱片的形狀挖通的模具,自上下以鋁厚板夾入該模具,利用M16的螺栓將鋁板彼此固定。使用扭矩扳手以30 N·m將該M16的螺栓加以緊固,並於大氣壓下對模具中所存在的混合物進行加壓壓製。 於加壓壓製的狀態下,利用大和科學(Yamato Scientific)製造的方形真空恒溫乾燥器(商品名DP300),於壓力0.1 KPa以下、溫度150℃下加熱15小時而製作散熱構件。此時,23℃至150℃為止的模具內部的昇溫速度為約0.5℃/min,花費約30分鐘於成為捷恩智(JNC)(股)製造的化合物(1)的液晶狀態的溫度範圍中通過。最終達到150℃,於保持所述溫度的狀態下進行聚合。Forming and polymerization As shown in Fig. 4, the obtained mixture of the PTX-25 mixture and the PT-670 mixture was sandwiched in a mold through which the shape of the heat sink was cut out, and the mold was sandwiched by an aluminum thick plate from above and below. Bolts hold the aluminum plates to each other. The M16 bolt was tightened with a torque wrench at 30 N · m, and the mixture existing in the mold was pressed under atmospheric pressure. In a pressurized state, a square vacuum thermostatic dryer (trade name DP300) manufactured by Yamato Scientific was used to heat the component at a pressure of 0.1 KPa or less and a temperature of 150 ° C for 15 hours to produce a heat dissipation member. At this time, the temperature rise rate in the mold from 23 ° C to 150 ° C was about 0.5 ° C / min, and it took about 30 minutes to pass through the temperature range of the liquid crystal state of the compound (1) manufactured by JNC Corporation. . Finally, it reached 150 ° C, and polymerization was performed while maintaining the temperature.

<實施例2> 於實施例1中,粒徑不同的PTX-25與PT-670是以粒子間的空間率最小(成為最密填充)的混合比進行混合。若將該填充率設為100%,則於實施例2中以填充率成為70%的方式將PTX-25與PT-670加以混合。除此以外與實施例1同樣地製作散熱片。<Example 2> In Example 1, PTX-25 and PT-670 having different particle diameters were mixed at a mixing ratio in which the space ratio between the particles was the smallest (closest packing). If this filling ratio is set to 100%, in Example 2, PTX-25 and PT-670 are mixed so that the filling ratio becomes 70%. Except that, a heat sink was produced in the same manner as in Example 1.

<實施例3> 將氮化硼(日本邁圖高新材料(Momentive Performance Materials Japan)(合)製造的帕拉姆(PolarTherm)PTX-25)10 g與矽烷偶合劑(捷恩智(JNC)(股)製造的S320)1 g加入至甲苯100 mL中,使用攪拌器以500 rpm攪拌1小時,將所獲得的混合物於40℃下乾燥4小時。進而,於溶媒乾燥後使用設定為120℃的真空乾燥機,於真空條件下進行5小時加熱處理。將所獲得的粒子設為填料A。填料A為藉由矽烷偶合劑對無機填料進行修飾的狀態的粒子。將該填料A與實施例1的PTX-25進行置換,除此以外與實施例1同樣地製作散熱片。<Example 3> 10 g of boron nitride (PolarTherm PTX-25 manufactured by Momentive Performance Materials Japan) was combined with a silane coupling agent (JNC) (stock 1 g of S320 manufactured) was added to 100 mL of toluene, and stirred at 500 rpm for 1 hour using a stirrer, and the obtained mixture was dried at 40 ° C for 4 hours. Furthermore, after drying the solvent, a vacuum dryer set at 120 ° C. was used, and heat treatment was performed under vacuum for 5 hours. Let the obtained particles be filler A. Filler A is a particle in a state where an inorganic filler is modified with a silane coupling agent. A heat sink was produced in the same manner as in Example 1 except that the filler A was replaced with PTX-25 of Example 1.

<實施例4> 將所獲得的PTX-25混合物與PT-670混合物的混合物夾於模具,使用設定為150℃的壓縮成形機(井元製作所(股)製造的IMC-19EC)加壓至30 MPa,持續10分鐘加熱狀態,藉此於大氣壓下進行暫時成形。 進而,如圖4所示,將所獲得的暫時成形完成後的散熱片夾於挖通為散熱片的形狀的模具,自上下以鋁厚板夾入該模具,利用M16的螺栓將鋁板彼此固定。使用扭矩扳手以30 N·m將該M16的螺栓加以緊固,並於大氣壓下對模具中所存在的混合物進行加壓壓製。 於加壓壓製的狀態下,利用大和科學(Yamato Scientific)製造的方形真空恒溫乾燥器(商品名DP300),於壓力0.1 KPa以下、溫度150℃下加熱15小時而製作散熱片。此時,23℃至150℃為止的模具內部的昇溫速度為約0.5℃/min,花費約30分鐘於成為捷恩智(JNC)(股)製造的化合物(1)的液晶狀態的溫度範圍中通過。最終達到150℃,於保持所述溫度的狀態下進行聚合。<Example 4> The obtained mixture of the PTX-25 mixture and the PT-670 mixture was sandwiched between molds, and pressurized to 30 MPa using a compression molding machine (IMC-19EC manufactured by Imoto Manufacturing Co., Ltd.) set at 150 ° C. , Heating for 10 minutes, thereby temporarily molding under atmospheric pressure. Further, as shown in FIG. 4, the obtained fins after the temporary forming were clamped in a mold cut out into a shape of a fin, and the mold was sandwiched by an aluminum thick plate from above and below, and the aluminum plates were fixed to each other with M16 bolts. . The M16 bolt was tightened with a torque wrench at 30 N · m, and the mixture existing in the mold was pressed under atmospheric pressure. In a state of pressure and pressing, a square vacuum constant temperature dryer (trade name DP300) manufactured by Yamato Scientific was used to heat the fins at a pressure of 0.1 KPa or less and a temperature of 150 ° C. for 15 hours. At this time, the temperature rise rate in the mold from 23 ° C to 150 ° C was about 0.5 ° C / min, and it took about 30 minutes to pass through the temperature range of the liquid crystal state of the compound (1) manufactured by JNC Corporation. . Finally, it reached 150 ° C, and polymerization was performed while maintaining the temperature.

<實施例5> 如圖4所示,將所獲得的PTX-25混合物與PT-670混合物的混合物夾於挖通為散熱片的形狀的模具,自上下以鋁厚板夾入該模具,利用M16的螺栓將鋁板彼此固定。使用扭矩扳手以30 N·m將該M16的螺栓加以緊固,並於大氣壓下對模具中所存在的混合物進行加壓壓製。 於加壓壓製的狀態下,利用大和科學(Yamato Scientific)製造的方形真空恒溫乾燥器(商品名DP300),於大氣壓環境下、溫度150℃下加熱15小時而製作散熱片。此時,23℃至150℃為止的模具內部的昇溫速度為約0.5℃/min,花費約30分鐘於成為捷恩智(JNC)(股)製造的化合物(1)的液晶狀態的溫度範圍中通過。最終達到150℃,於保持所述溫度的狀態下進行聚合。<Example 5> As shown in FIG. 4, the obtained mixture of the PTX-25 mixture and the PT-670 mixture was sandwiched in a mold cut into a shape of a heat sink, and the mold was sandwiched by an aluminum thick plate from above and below. M16 bolts hold the aluminum plates to each other. The M16 bolt was tightened with a torque wrench at 30 N · m, and the mixture existing in the mold was pressed under atmospheric pressure. In a state of pressure and pressing, a square vacuum constant temperature dryer (trade name DP300) manufactured by Yamato Scientific was used to heat the fins at 150 ° C for 15 hours under an atmospheric pressure environment. At this time, the temperature rise rate in the mold from 23 ° C to 150 ° C was about 0.5 ° C / min, and it took about 30 minutes to pass through the temperature range of the liquid crystal state of the compound (1) manufactured by JNC Corporation. . Finally, it reached 150 ° C, and polymerization was performed while maintaining the temperature.

<實施例6> 於實施例1中,粒徑不同的PTX-25與PT-670是以粒子間的空間率最小(成為最密填充)的混合比進行混合。若將該填充率設為100%,則於實施例6中以填充率成為70%的方式將PTX-25與PT-670加以混合。對該混合物以厚度成為230 μm的方式進行量取。 與實施例4同樣地,如圖4所示,將所獲得的PTX-25混合物與PT-670混合物的混合物夾於挖通為散熱片的形狀的模具,自上下以鋁厚板夾入該模具,利用M16的螺栓將鋁板彼此固定。使用扭矩扳手以30 N·m將該M16的螺栓加以緊固,並於大氣壓下對模具中所存在的混合物進行加壓壓製。 之後,自模具取出暫時成形完成後的散熱片,不進行加壓壓製,利用大和科學(Yamato Scientific)製造的方形真空恒溫乾燥器(商品名DP300),於壓力0.1 KPa以下、溫度150℃下加熱15小時而製作散熱片。此時,23℃至150℃為止的模具內部的昇溫速度為約0.5℃/min,花費約30分鐘於成為捷恩智(JNC)(股)製造的化合物(1)的液晶狀態的溫度範圍中通過。最終達到150℃,於保持所述溫度的狀態下進行聚合。<Example 6> In Example 1, PTX-25 and PT-670 having different particle diameters were mixed at a mixing ratio in which the space ratio between the particles was the smallest (closest packing). If this filling rate is 100%, in Example 6, PTX-25 and PT-670 were mixed so that the filling rate would become 70%. This mixture was measured so that the thickness became 230 μm. As in Example 4, as shown in FIG. 4, the obtained mixture of the PTX-25 mixture and the PT-670 mixture was sandwiched into a mold cut through a shape of a heat sink, and the mold was sandwiched into the mold from above and below , Fix the aluminum plates to each other with M16 bolts. The M16 bolt was tightened with a torque wrench at 30 N · m, and the mixture existing in the mold was pressed under atmospheric pressure. After that, the fins that have been temporarily formed are removed from the mold, and are not pressurized. A square vacuum thermostatic dryer (trade name DP300) manufactured by Yamato Scientific is used to heat at a pressure of 0.1 KPa or less and a temperature of 150 ° C. The heat sink was made in 15 hours. At this time, the temperature rise rate in the mold from 23 ° C to 150 ° C was about 0.5 ° C / min, and it took about 30 minutes to pass through the temperature range of the liquid crystal state of the compound (1) manufactured by JNC Corporation. . Finally, it reached 150 ° C, and polymerization was performed while maintaining the temperature.

<實施例7> 對於氮化硼而言,使用日本3M(股)製造的普萊特萊斯(Platelets)003代替PTX-25,分別量取普萊特萊斯(Plateltes)混合物的0.033 g、與PT-670混合物的0.930 g並充分混合,除此以外與實施例1同樣地製作散熱片。 粒徑不同的普萊特萊斯(Platelets)003與PT-670以粒子間的空間率最小的方式(以成為最密填充的方式)決定混合比率及含量。<Example 7> For boron nitride, Platelets 003 manufactured by Japan 3M Co., Ltd. was used instead of PTX-25, and 0.033 g of a mixture of Plateltes and PT were measured respectively. A heat sink was produced in the same manner as in Example 1 except that 0.930 g of the -670 mixture was sufficiently mixed. Platelets 003 and PT-670 with different particle sizes determine the mixing ratio and content in such a way that the space ratio between the particles is the smallest (in order to become the most densely packed).

<導熱率評價> 導熱率是預先求出散熱片的比熱(利用理學(Rigaku)(股)製造的高感度示差掃描熱量計Thermo Plus EVO2 DSC-8231測定)與比重(利用新光電子(股)製造的比電子天平式比重計DME-220測定),將該值與藉由日本耐馳(NETZSCH Japan)(股)製造的LFA467熱擴散率測定裝置而求出的熱擴散率相乘,藉此求出厚度方向的導熱率。 <熱膨脹率評價> 自所獲得的試樣切出4 mm×20 mm的試驗片,於50℃~200℃的範圍下求出熱膨脹率(利用SII(股)的TMA-SS6100熱機械分析裝置測定)。試驗片的長度是根據所測定的試樣的形狀適宜製備。將測定結果示於圖5~圖8中。<Evaluation of Thermal Conductivity> The specific thermal conductivity of the heat sink is determined in advance (measured with a high-sensitivity differential scanning calorimeter Thermo Plus EVO2 DSC-8231 manufactured by Rigaku) and specific gravity (produced by Shin Optoelectronics) (Measured by DME-220, a specific electronic balance type hydrometer), and multiplying this value by the thermal diffusivity obtained by an LFA467 thermal diffusivity measuring device manufactured by NETZSCH Japan (Stock), thereby calculating The thermal conductivity in the thickness direction. <Evaluation of thermal expansion coefficient> A 4 mm × 20 mm test piece was cut out of the obtained sample, and the thermal expansion coefficient was determined in a range of 50 ° C. to 200 ° C. (determined using a TMA-SS6100 thermomechanical analysis device of SII (stock) ). The length of the test piece is appropriately prepared according to the shape of the sample to be measured. The measurement results are shown in FIGS. 5 to 8.

關於實施例1~實施例7的散熱片,於表1中示出厚度方向的導熱率、厚度、線膨脹係數(TMA)。 [表1] Regarding the heat sinks of Examples 1 to 7, Table 1 shows the thermal conductivity in the thickness direction, the thickness, and the linear expansion coefficient (TMA). [Table 1]

如所述般,本發明的散熱片的厚度方向的導熱率得到提高。進而,使用熱機械分析(Thermomechanical Analysis,TMA)而測定的線膨脹係數顯示先前的半導體基板的線膨脹係數(Si:2.4 ppm/K,GaN:4.0 ppm/K,SiC:4.3 ppm/K)與銅16.8 ppm/K的中間值。因而,認為若將本發明的散熱片用作半導體基板,則可抑制由線膨脹係數不同而引起的可靠性的降低。As described above, the thermal conductivity in the thickness direction of the heat sink of the present invention is improved. Furthermore, the linear expansion coefficient measured using thermomechanical analysis (TMA) shows the linear expansion coefficient (Si: 2.4 ppm / K, GaN: 4.0 ppm / K, SiC: 4.3 ppm / K) of the previous semiconductor substrate and The median value of copper is 16.8 ppm / K. Therefore, it is considered that when the heat sink of the present invention is used as a semiconductor substrate, a decrease in reliability due to a difference in linear expansion coefficient can be suppressed.

針對本說明書中所引用的刊物、包含日本專利申請案及日本專利的所有文獻,分別具體地表示各文獻並藉由參照而組入本案、且將其全部內容與於本案中所敘述相同程度地藉由參照而組入本案中。For the publications cited in this specification, and all documents including Japanese patent applications and Japanese patents, each document is specifically indicated and incorporated into the present case by reference, and its entire contents are the same as described in the present case This case is incorporated by reference.

關聯於本發明的說明(特別是關聯於以下的申請專利範圍)而使用的名詞及同樣的指示語的使用只要於本說明書中未特別指出或未明顯與文脈矛盾,則可理解為涉及單數及複數兩者。語句「包括」、「具有」、「含有」及「包含」只要未特別說明則可理解為開放式術語(open end term)(即「包含~但不限定」的含義)。本說明書中的數值範圍的詳細說明只要於本說明書中未特別指出,則僅意圖發揮作為用以逐個言及屬於該範圍內的各值的略記法的作用,如將各值於本說明書中逐個列舉般被組入至說明書中。本說明書中所說明的全部方法只要於本說明書中未特別指出或未明顯與文脈矛盾,則可以所有適當的順序進行。本說明書中所使用的所有例子或例示性措辭(例如「等」)只要未特別主張,則僅意圖更好地說明本發明,而並非設置對本發明的範圍的限制。不能將說明書中的任何措辭均理解為表示對實施本發明而言不可或缺的申請專利範圍中未記載的要素者。The use of nouns and the same designations used in connection with the description of the present invention (especially in connection with the scope of patent applications below), as long as it is not specifically pointed out in this specification or is not clearly contradictory to the context, can be understood as involving the singular and Plural. The words "including", "having", "containing", and "including" can be understood as open end terms (ie, "including ~ but not limited to") unless otherwise specified. The detailed description of the numerical range in this specification is only intended to play a role as a notation to describe each value within the range as long as it is not specifically stated in the specification, such as listing each value in this specification one by one Generally incorporated into the manual. All the methods described in this specification can be performed in all appropriate order as long as they are not specifically pointed out in this specification or are not clearly contradictory to context. All examples or illustrative words (such as "etc.") used in this specification are only intended to better illustrate the present invention, and are not intended to limit the scope of the present invention, unless otherwise specifically claimed. Any wording in the specification should not be interpreted to mean an element that is not described in the scope of a patent application that is indispensable for implementing the present invention.

於本說明書中,為了實施本發明,包括本發明者所知的最良好的形態在內,對本發明的較佳的實施形態進行說明。對於本領域技術人員而言,於讀過所述說明後,可明確該些較佳的實施形態的變形。本發明者預想熟練者適宜應用此種變形,預定利用除本說明書中具體地說明以外的方法實施本發明。因此,如基準法所容許般,本發明包含隨附於本說明書的申請專利範圍中記載的內容的變更及均等物的全部。進而,只要於本說明書中未特別指出或未明顯與文脈矛盾,則全部的變形中的所述要素的任一組合均包含於本發明中。In this specification, in order to implement the present invention, a preferred embodiment of the present invention will be described including the best form known to the inventors. For those skilled in the art, after reading the description, modifications of the preferred embodiments will be clear. The present inventor anticipates that a skilled person may suitably apply such a modification, and plans to implement the present invention by methods other than those specifically described in this specification. Therefore, as permitted by the benchmark method, the present invention includes all changes and equivalents described in the scope of patent application accompanying this specification. Furthermore, as long as it is not specifically pointed out in the present specification or is not clearly contradictory to the context, any combination of the elements in all the modifications is included in the present invention.

1‧‧‧不鏽鋼板1‧‧‧ stainless steel plate

2‧‧‧鋁板2‧‧‧ aluminum plate

3‧‧‧螺栓3‧‧‧ Bolt

圖1是表示使用氮化硼的二次粒子作為無機填料時的圖像圖。 圖2是表示本發明的散熱片的圖像圖。 圖3是本發明中使用的組成物所含有的無機填料中未經修飾的填料(左)、經矽烷偶合劑處理的填料(中央)、經矽烷偶合劑處理後藉由聚合性化合物進行表面修飾的填料(右)的圖像圖。 圖4是於實施例中對組成物施加壓力的裝置的概略圖。 圖5是於實施例1的TMA中表示自50℃至200℃的平均線膨脹係數的圖表(9 ppm/K)。 圖6是於實施例3的TMA中表示自50℃至200℃的平均線膨脹係數的圖表(7 ppm/K)。 圖7是於實施例4的TMA中表示自50℃至200℃的平均線膨脹係數的圖表(7 ppm/K)。 圖8是於實施例5的TMA中表示自50℃至200℃的平均線膨脹係數的圖表(10 ppm/K)。FIG. 1 is a view showing an image when a secondary particle of boron nitride is used as an inorganic filler. FIG. 2 is an image diagram showing a heat sink of the present invention. FIG. 3 shows an unmodified filler (left), a filler treated with a silane coupling agent (center), an inorganic filler contained in a composition used in the present invention, and a surface modification with a polymerizable compound after the treatment with a silane coupling agent. Image of the filler (right). FIG. 4 is a schematic diagram of a device for applying pressure to a composition in an example. 5 is a graph (9 ppm / K) showing an average linear expansion coefficient from 50 ° C. to 200 ° C. in the TMA of Example 1. FIG. FIG. 6 is a graph (7 ppm / K) showing the average linear expansion coefficient from 50 ° C to 200 ° C in the TMA of Example 3. FIG. FIG. 7 is a graph (7 ppm / K) showing the average linear expansion coefficient from 50 ° C. to 200 ° C. in the TMA of Example 4. FIG. FIG. 8 is a graph (10 ppm / K) showing the average linear expansion coefficient from 50 ° C. to 200 ° C. in the TMA of Example 5. FIG.

Claims (17)

一種散熱片的製造方法,其為散熱片的製造方法,且 所述散熱片的製造方法包括煅燒步驟,所述煅燒步驟是對包含無機填料、聚合性化合物、及使所述聚合性化合物硬化的硬化劑的組成物,自相對於所述散熱片的厚度而成為上下方向的方向施加壓力,並且以使所述聚合性化合物聚合的方式進行加熱。A method for manufacturing a heat sink is a method for manufacturing a heat sink, and the method for manufacturing a heat sink includes a calcining step, wherein the calcining step includes curing an inorganic filler, a polymerizable compound, and the polymerizable compound. The composition of the hardener is heated in such a manner as to apply pressure from a direction that becomes the vertical direction with respect to the thickness of the heat sink, and polymerizes the polymerizable compound. 如申請專利範圍第1項所述的散熱片的製造方法,其進而包括真空步驟,所述真空步驟是於所述煅燒步驟前,為了使所述聚合性化合物滲透至填料內或填料間的間隙中,對所述組成物自成為所述上下方向的方向施加壓力,並且將所述組成物置於真空環境下, 所述煅燒步驟是於真空環境下,對所述組成物自成為所述上下方向的方向施加壓力並且進行加熱。The method for manufacturing a heat sink according to item 1 of the scope of patent application, further comprising a vacuum step, in which the polymerizable compound penetrates into the filler or the gap between the fillers before the calcination step. In the method, pressure is applied to the composition from a direction that becomes the up-down direction, and the composition is placed in a vacuum environment, and the calcination step is performed under the vacuum environment to the composition from the up-down direction. Apply pressure and heat in the direction of. 如申請專利範圍第2項所述的散熱片的製造方法,其進而包括暫時成形步驟,所述暫時成形步驟是於所述真空步驟前,於大氣壓下對所述組成物自成為所述上下方向的方向施加壓力,並且以對所述聚合性化合物進行壓縮成形的方式於聚合溫度以下進行加熱。The method for manufacturing a heat sink according to item 2 of the scope of patent application, further comprising a temporary forming step. The temporary forming step is before the vacuum step, and the composition is turned into the vertical direction at atmospheric pressure. A pressure is applied in a direction of 50 ° C., and the polymerizable compound is heated at a temperature lower than a polymerization temperature so as to be compression-molded. 一種散熱片的製造方法,其為散熱片的製造方法,所述散熱片的製造方法包括: 暫時成形步驟,於大氣壓下或真空環境下,對包含無機填料、聚合性化合物、及使聚合性化合物硬化的硬化劑的組成物,自相對於所述散熱片的厚度而成為上下方向的方向施加壓力,並且以對所述聚合性化合物進行壓縮成形的方式於聚合溫度以下進行加熱; 真空步驟,於所述暫時成形步驟後,為了使所述聚合性化合物滲透至填料內或填料間的間隙中,將所述組成物置於真空環境下;以及 煅燒步驟,於真空環境下,對所述組成物以使所述聚合性化合物聚合的方式進行加熱。A method for manufacturing a heat sink, which is a method for manufacturing a heat sink. The method for manufacturing a heat sink includes: a temporary forming step, including an inorganic filler, a polymerizable compound, and a polymerizable compound under atmospheric pressure or a vacuum environment. The composition of the hardened hardener is applied with pressure from a direction that is up and down with respect to the thickness of the heat sink, and is heated below the polymerization temperature by compression-molding the polymerizable compound; a vacuum step is performed at After the temporary forming step, in order to make the polymerizable compound penetrate into the filler or the gap between the fillers, the composition is placed in a vacuum environment; and a calcination step is performed on the composition in a vacuum environment. Heating is performed so as to polymerize the polymerizable compound. 如申請專利範圍第1項至第4項中任一項所述的散熱片的製造方法,其中 所述無機填料包含第一無機填料、與粒徑小於所述第一無機填料的第二無機填料, 所述第一無機填料與所述第二無機填料的混合比率為將填料間的空間率最小時的填充率設為100%時所述填充率成為70%以上的比率, 所述第一無機填料為針狀或板狀的粒子凝聚而成的二次粒子。The method for manufacturing a heat sink according to any one of claims 1 to 4, wherein the inorganic filler comprises a first inorganic filler and a second inorganic filler having a particle size smaller than the first inorganic filler. A mixing ratio of the first inorganic filler and the second inorganic filler is a ratio in which a filling ratio when a space ratio between fillers is minimum is set to 100%, and the filling ratio becomes 70% or more, the first inorganic filler The filler is secondary particles obtained by aggregating acicular or plate-like particles. 如申請專利範圍第1項至第4項中任一項所述的散熱片的製造方法,其中 所述無機填料是由氮化物形成, 所述聚合性化合物是於兩末端具有包含氧雜環丙基或氧雜環丁基的結構的聚合性液晶化合物, 所述煅燒步驟的加熱溫度為所述聚合性液晶化合物顯示液晶相的溫度範圍以上。The method for manufacturing a heat sink according to any one of claims 1 to 4, wherein the inorganic filler is formed of a nitride, and the polymerizable compound has oxetanyl groups at both ends. In the polymerizable liquid crystal compound having an oxetanyl group or an oxetanyl group, the heating temperature in the firing step is at least the temperature range in which the polymerizable liquid crystal compound exhibits a liquid crystal phase. 如申請專利範圍第6項所述的散熱片的製造方法,其包括以下步驟,所述步驟是於所述暫時成形步驟或所述煅燒步驟的昇溫時,於所述聚合性液晶化合物的液晶相的顯現溫度區域內滯留1秒以上或保持1秒以上。The method for manufacturing a heat sink according to item 6 of the patent application scope, comprising the steps of: in the liquid crystal phase of the polymerizable liquid crystal compound, when the temperature of the temporary forming step or the calcining step is elevated. It stays in the display temperature region for more than 1 second or stays for more than 1 second. 如申請專利範圍第6項所述的散熱片的製造方法,其進而包括配向處理步驟,所述配向處理步驟是於所述暫時成形步驟及所述煅燒步驟之前進行所述組成物的配向處理。The method for manufacturing a heat sink according to item 6 of the patent application, further comprising an alignment processing step, wherein the alignment processing step is performed before the temporary forming step and the calcining step. 如申請專利範圍第6項所述的散熱片的製造方法,其中所述聚合性液晶化合物為下述式(1-1)所表示的至少一種化合物, Ra1 -Z-(A-Z)m1 -Ra1 ・・・(1-1) 所述式(1-1)中, Ra1 分別為下述式(2-1)~式(2-2)的任一者所表示的聚合性基; A為1,4-伸環己基、1,4-伸環己烯基、1,4-伸苯基、萘-2,6-二基、四氫萘-2,6-二基、茀-2,7-二基、雙環[2.2.2]辛-1,4-二基、或雙環[3.1.0]己-3,6-二基, 於該些環中,任意的-CH2 -可經-O-取代,任意的-CH=可經-N=取代,任意的氫可經鹵素、碳數1~10的烷基、或碳數1~10的鹵化烷基取代, 於所述烷基中,任意的-CH2 -可經-O-、-CO-、-COO-、或-OCO-取代,任意的-CH2 CH2 -可經-CH=CH-、或-C≡C-取代; Z分別為單鍵、或碳數1~20的伸烷基, 於所述伸烷基中,任意的-CH2 -可經-O-、-S-、-CO-、-COO-、或-OCO-取代,任意的-CH2 CH2 -可經-CH=CH-、-CF=CF-、-CH=N-、-N=CH-、-N=N-、或-C≡C-取代,任意的氫可經鹵素取代; m1為1~6的整數,式(2-1)~式(2-2)中,Rb 為氫、鹵素、-CF3 、或碳數1~5的烷基,q為0或1。The method for manufacturing a heat sink according to item 6 of the application, wherein the polymerizable liquid crystal compound is at least one compound represented by the following formula (1-1), R a1 -Z- (AZ) m1 -R a1 ・ ・ ・ (1-1) In the formula (1-1), R a1 is a polymerizable group represented by any one of the following formulae (2-1) to (2-2); A 1,4-cyclohexyl, 1,4-cyclohexenyl, 1,4-phenylene, naphthalene-2,6-diyl, tetrahydronaphthalene-2,6-diyl, fluorene-2 , 7-diyl, bicyclic [2.2.2] octane-1,4-diyl, or bicyclic [3.1.0] hex-3,6-diyl, among these rings, any -CH 2 -may Substituted by -O-, any -CH = may be substituted by -N =, any hydrogen may be substituted by halogen, alkyl group having 1 to 10 carbon atoms, or halogenated alkyl group having 1 to 10 carbon atoms. In the group, any -CH 2 -may be substituted by -O-, -CO-, -COO-, or -OCO-, and any -CH 2 CH 2 -may be -CH = CH-, or -C≡C. -Substitution; Z is a single bond or an alkylene group having 1 to 20 carbon atoms, in the alkylene group, any -CH 2 -may be passed through -O-, -S-, -CO-, -COO -, Or -OCO- substitution, any -CH 2 CH 2 -can be via -CH = CH-, -CF = CF-, -CH = N-, -N = CH-, -N = N-, or -C≡C- substitution, any hydrogen may be substituted by halogen; m1 is an integer from 1 to 6, In the formulae (2-1) to (2-2), R b is hydrogen, halogen, -CF 3 , or an alkyl group having 1 to 5 carbon atoms, and q is 0 or 1. 如申請專利範圍第9項所述的散熱片的製造方法,其中所述式(1-1)中,A為1,4-伸環己基、任意的氫經鹵素取代的1,4-伸環己基、1,4-伸苯基、任意的氫經鹵素或甲基取代的1,4-伸苯基、茀-2,7-二基、或者任意的氫經鹵素或甲基取代的茀-2,7-二基。The method for manufacturing a heat sink according to item 9 of the scope of patent application, wherein in the formula (1-1), A is 1,4-cyclohexyl, and any hydrogen is substituted with a 1,4-cyclo ring Hexyl, 1,4-phenylene, 1,4-phenylene with any hydrogen substituted with halogen or methyl, fluorene-2,7-diyl with any hydrogen substituted with halogen or methyl 2,7-diyl. 如申請專利範圍第10項所述的散熱片的製造方法,其中所述式(1-1)中,Z為單鍵、-(CH2 )a -、-O(CH2 )a -、-(CH2 )a O-、-O(CH2 )a O-、-CH=CH-、-C≡C-、-COO-、-OCO-、-CH=CH-COO-、-OCO-CH=CH-、-CH2 CH2 -COO-、-OCO-CH2 CH2 -、-CH=N-、-N=CH-、-N=N-、-OCF2 -、或-CF2 O-,所述a為1~20的整數。The method for manufacturing a heat sink according to item 10 of the scope of patent application, wherein in the formula (1-1), Z is a single bond,-(CH 2 ) a- , -O (CH 2 ) a -,- (CH 2 ) a O-, -O (CH 2 ) a O-, -CH = CH-, -C≡C-, -COO-, -OCO-, -CH = CH-COO-, -OCO-CH = CH-, -CH 2 CH 2 -COO-, -OCO-CH 2 CH 2- , -CH = N-, -N = CH-, -N = N-, -OCF 2- , or -CF 2 O -, Said a is an integer of 1-20. 如申請專利範圍第1項至第4項中任一項所述的散熱片的製造方法,其中所述無機填料為選自氮化硼、氮化鋁、及氮化矽中的至少一種。The method for manufacturing a heat sink according to any one of claims 1 to 4, wherein the inorganic filler is at least one selected from the group consisting of boron nitride, aluminum nitride, and silicon nitride. 如申請專利範圍第1項至第4項中任一項所述的散熱片的製造方法,其中所述硬化劑為下述式(3-1)所表示的至少一種二胺化合物, H2 N-Z-(A-Z)m2 -NH2 ・・・(3-1) 所述式(3-1)中, A為1,4-伸環己基、或1,4-伸苯基,該些環的任意的氫可經鹵素、或碳數1~10的烷基取代; Z分別為單鍵、或碳數1~10的伸烷基; m2為1~7的整數。The method for manufacturing a heat sink according to any one of claims 1 to 4, wherein the hardener is at least one diamine compound represented by the following formula (3-1), H 2 NZ -(AZ) m2 -NH 2 ・ ・ ・ (3-1) In the formula (3-1), A is 1,4-cyclohexyl, or 1,4-phenylene. Any of these rings Hydrogen may be substituted by halogen or an alkyl group having 1 to 10 carbon atoms; Z is a single bond or an alkylene group having 1 to 10 carbon atoms; m2 is an integer of 1 to 7; 如申請專利範圍第1項至第4項中任一項所述的散熱片的製造方法,其中所述無機填料為經矽烷偶合劑處理的填料、或經矽烷偶合處理後藉由所述聚合性化合物進行表面修飾的填料。The method for manufacturing a heat sink according to any one of claims 1 to 4, wherein the inorganic filler is a filler treated with a silane coupling agent, or the polymerizable polymer is treated by the silane coupling agent. Compounds are surface-modified fillers. 一種散熱片,其是由組成物形成,所述組成物包含: 聚合性液晶化合物,於兩末端具有包含氧雜環丙基或氧雜環丁基的結構; 硬化劑,使所述聚合性液晶化合物硬化;以及 無機填料,由氮化物形成,且所述散熱片中, 所述無機填料包含第一無機填料、與粒徑小於所述第一無機填料的第二無機填料, 所述第一無機填料與所述第二無機填料的混合比率為將填料間的空間率最小時的填充率設為100%時所述填充率成為70%以上的比率, 所述第一無機填料為針狀或板狀的粒子凝聚而成的二次粒子, 所述散熱片的厚度為200 μm~1000 μm, 所述散熱片的厚度方向的導熱率超過20 W/mK。A heat sink is formed of a composition comprising: a polymerizable liquid crystal compound having a structure containing an oxetanyl group or an oxetanyl group at both ends; a hardening agent for the polymerizable liquid crystal Compound hardening; and an inorganic filler formed of a nitride, and in the heat sink, the inorganic filler includes a first inorganic filler, and a second inorganic filler having a particle size smaller than the first inorganic filler, the first inorganic filler The mixing ratio of the filler and the second inorganic filler is a ratio in which the filling ratio becomes 70% or more when the filling ratio when the space ratio between the fillers is the smallest is 100%, and the first inorganic filler is a needle or a plate Secondary particles formed by agglomerating particles, the thickness of the heat sink is 200 μm to 1000 μm, and the thermal conductivity in the thickness direction of the heat sink exceeds 20 W / mK. 一種基板,其包括: 如申請專利範圍第15項所述的散熱片;以及 積層於所述散熱片的至少單面上的金屬板。A substrate includes: the heat sink according to item 15 of the scope of patent application; and a metal plate laminated on at least one side of the heat sink. 一種功率半導體模組,其包括: 功率半導體用基板,其具有成為絕緣基板的如申請專利範圍第15項所述的散熱片、與形成於所述散熱片上的導體電路;以及 功率半導體晶片,配置於所述功率半導體用基板上,並與所述導體電路電性連接, 所述無機填料為氮化硼。A power semiconductor module includes: a substrate for a power semiconductor, which has a heat sink as an insulating substrate as described in item 15 of the scope of patent application, and a conductor circuit formed on the heat sink; and a power semiconductor chip, configured The inorganic filler is boron nitride on the power semiconductor substrate and is electrically connected to the conductor circuit.
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