TW201922367A - Storage container of scrub member and package of same - Google Patents
Storage container of scrub member and package of same Download PDFInfo
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- TW201922367A TW201922367A TW107140298A TW107140298A TW201922367A TW 201922367 A TW201922367 A TW 201922367A TW 107140298 A TW107140298 A TW 107140298A TW 107140298 A TW107140298 A TW 107140298A TW 201922367 A TW201922367 A TW 201922367A
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- Taiwan
- Prior art keywords
- storage container
- container
- scrubbing
- scrubbing member
- container body
- Prior art date
Links
- 238000009423 ventilation Methods 0.000 claims abstract description 27
- 238000005201 scrubbing Methods 0.000 claims description 90
- 239000000758 substrate Substances 0.000 description 26
- 238000004140 cleaning Methods 0.000 description 19
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 16
- 229910052760 oxygen Inorganic materials 0.000 description 16
- 239000001301 oxygen Substances 0.000 description 16
- 239000000463 material Substances 0.000 description 10
- 230000002745 absorbent Effects 0.000 description 6
- 239000002250 absorbent Substances 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 238000011109 contamination Methods 0.000 description 6
- 238000001514 detection method Methods 0.000 description 6
- 229920003023 plastic Polymers 0.000 description 5
- 239000002245 particle Substances 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 210000000078 claw Anatomy 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- -1 polyethylene Polymers 0.000 description 3
- 241000894006 Bacteria Species 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 239000003761 preservation solution Substances 0.000 description 1
- 230000035755 proliferation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D81/00—Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents
- B65D81/24—Adaptations for preventing deterioration or decay of contents; Applications to the container or packaging material of food preservatives, fungicides, pesticides or animal repellants
- B65D81/26—Adaptations for preventing deterioration or decay of contents; Applications to the container or packaging material of food preservatives, fungicides, pesticides or animal repellants with provision for draining away, or absorbing, or removing by ventilation, fluids, e.g. exuded by contents; Applications of corrosion inhibitors or desiccators
- B65D81/266—Adaptations for preventing deterioration or decay of contents; Applications to the container or packaging material of food preservatives, fungicides, pesticides or animal repellants with provision for draining away, or absorbing, or removing by ventilation, fluids, e.g. exuded by contents; Applications of corrosion inhibitors or desiccators for absorbing gases, e.g. oxygen absorbers or desiccants
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D51/00—Closures not otherwise provided for
- B65D51/16—Closures not otherwise provided for with means for venting air or gas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D43/00—Lids or covers for rigid or semi-rigid containers
- B65D43/02—Removable lids or covers
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mechanical Engineering (AREA)
- Food Science & Technology (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Closures For Containers (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Packages (AREA)
- Packaging Frangible Articles (AREA)
Abstract
Description
本發明是關於一種擦洗構件之保存容器及其封裝。 本申請案主張2017年11月14日申請的日本專利申請號第2017-219223號的優先權,引用其內容於此。The invention relates to a storage container for a scrubbing member and a package thereof. This application claims priority from Japanese Patent Application No. 2017-219223 filed on November 14, 2017, the contents of which are incorporated herein by reference.
以往,已知例如下述專利文獻1所記載的安裝於基板洗淨裝置的洗淨部件做為擦洗構件。洗淨部件被保持再洗淨部件保持機構,旋轉並擦洗洗淨基板表面。洗淨部件保持機構,採用一種筒夾夾頭結構,具備:夾持部件(套筒),下方部被複數個夾頭爪分割;以及環部件,嵌入該夾持部件的外緣,藉由該洗淨部件的端部插入以該夾持部件的複數個夾頭爪形成的插入孔,該環部件嵌入該夾持部件的外緣,來以該複數個夾頭爪鎖緊固定該洗淨部件。Conventionally, it is known, for example, that a cleaning member mounted on a substrate cleaning apparatus described in Patent Document 1 described below is used as a scrubbing member. The cleaning member is held and the cleaning member holding mechanism rotates and scrubs and cleans the surface of the substrate. The cleaning member holding mechanism adopts a collet chuck structure, which includes: a clamping member (sleeve), the lower portion of which is divided by a plurality of collet claws; and a ring member, which is embedded in the outer edge of the clamping member, The end of the cleaning member is inserted into an insertion hole formed by the plurality of collet claws of the clamping member, and the ring member is inserted into the outer edge of the clamping member to lock and fix the cleaning member with the plurality of collet claws .
[先前技術文獻] [專利文獻] [專利文獻1]日本特開2000-173966號公報[Prior Art Document] [Patent Document] [Patent Document 1] Japanese Patent Laid-Open No. 2000-173966
[發明所欲解決的問題] 像這樣的擦洗構件,為了防止變形或污染,收容在保存容器中。若擦洗構件乾燥會風化並產生塵埃,所以在浸濕狀態下收容於保存容器為較佳,但如此一來,細菌會有在擦洗構件增殖並污染的情況。因此,以往,在保存容器形成通氣口,在覆蓋保存容器的封裝中,一起放入抑制細菌增殖的氧吸收劑來保存擦洗部件。但是,保存容器的通氣口是在後加工形成,所以通氣口周圍產生毛邊,損傷擦洗部件,且毛邊附著於擦洗部件,會有產生微粒的狀況。[Problems to be Solved by the Invention] Such a scrubbing member is stored in a storage container in order to prevent deformation or contamination. If the scrubbing member is dry, it will weather and generate dust, so it is better to store it in a storage container in a wet state, but in this case, bacteria may multiply and contaminate the scrubbing member. Therefore, conventionally, an air vent is formed in a storage container, and an oxygen absorbent that suppresses the proliferation of bacteria is put together in a package covering the storage container to store the scrubbing member. However, since the ventilation opening of the storage container is formed after processing, burrs are generated around the ventilation openings, and the scrubbing member is damaged, and the burrs are attached to the scrubbing member, and particles may be generated.
本發明有鑑於上述問題點,提供一種擦洗構件之保存容器及其封裝,可抑制擦洗構件的變形或污染,以及產生微粒。In view of the above problems, the present invention provides a storage container for a scrubbing member and a package thereof, which can suppress deformation or contamination of the scrubbing member and generate particles.
[解決問題的手段] (1)關於本發明的一態樣的擦洗構件的保存容器,具有:容器本體;以及蓋體,嚙合於前述容器本體,其中將擦洗構件收容在前述容器本體與前述蓋體所包圍的保存容器內部,在前述容器本體與前述蓋體嚙合的嚙合面,形成有連通前述保存容器內部與保存容器外部的通氣溝。[Means for Solving the Problem] (1) A storage container for a scrubbing member according to one aspect of the present invention includes a container body and a lid body engaged with the container body, wherein the scrubbing member is housed in the container body and the lid. Inside the storage container surrounded by the body, an air groove is formed on the engaging surface of the container body that is engaged with the cover body to communicate the inside of the storage container and the outside of the storage container.
(2)如上述(1)所述的擦洗構件的保存容器,其中前述通氣溝也可以形成有複數個前述嚙合面。 (3)如上述(1)或(2)所述的擦洗構件的保存容器,其中前述容器本體也可以具有:嚙合溝,可嚙合於前述擦洗構件。 (4)如上述(3)所述的擦洗構件的保存容器,其中前述容器本體也可以具有:環狀壁,以內壁面形成前述嚙合溝的側面;在前述環狀壁的外壁面,形成前述通氣溝。 (5)如上述(4)所述的擦洗構件的保存容器,其中前述擦洗構件也可以具有:本體部,具有擦洗面;以及突出部,從前述本體部向前述擦洗面的相反側突出;前述突出部嚙合於前述嚙合溝時,前述環狀壁的頂面與前述本體部為非接觸。 (6)如上述(5)所述的擦洗構件的保存容器,其中前述蓋體也可以相對於前述本體部的前述擦洗面,開出前述嚙合溝的深度以下的空隙,且前述蓋體嚙合於前述容器本體。 (7)如上述(5)或(6)所述的擦洗構件的保存容器,其中前述蓋體也可以具有向著前述本體部的前述擦洗面突出的複數個凸部。(2) The storage container for the scrubbing member according to the above (1), wherein the ventilation groove may be formed with a plurality of the engagement surfaces. (3) The storage container for the scrubbing member according to the above (1) or (2), wherein the container body may further include an engagement groove that can be engaged with the scrubbing member. (4) The storage container for the scrubbing member according to the above (3), wherein the container body may further include: an annular wall, an inner wall surface forming a side surface of the engagement groove; and an outer wall surface of the annular wall, forming the ventilation. ditch. (5) The storage container for the scrubbing member according to the above (4), wherein the scrubbing member may further include: a main body portion having a scrubbing surface; and a protruding portion protruding from the main body portion to a side opposite to the scrubbing surface; When the protruding portion is engaged with the engagement groove, the top surface of the annular wall is non-contact with the body portion. (6) The storage container for the scrubbing member according to the above (5), wherein the lid body may open a gap below a depth of the engagement groove with respect to the scrubbing surface of the body portion, and the lid body is engaged with The aforementioned container body. (7) The storage container for the scrubbing member according to the above (5) or (6), wherein the cover may have a plurality of convex portions protruding toward the scrubbing surface of the body portion.
(8)一種擦洗構件的封裝,具有:如上述(1)~(7)任一項所述的擦洗構件的保存容器;以及氧吸收劑,配置於前述保存容器的容器外部。(8) A package of a scrubbing member, comprising: the storage container of the scrubbing member according to any one of (1) to (7) above; and an oxygen absorbent disposed outside the container of the storage container.
[發明效果] 根據上述本發明的態樣,可抑制擦洗構件的變形或污染,以及產生微粒。[Effects of the Invention] According to the aspect of the present invention described above, it is possible to suppress deformation or contamination of the scrubbing member, and generation of particles.
以下,參照圖式來說明關於本發明的一實施形態。 第一圖是關於一實施形態的擦洗構件2的保存容器1的剖面圖。 如圖所示,保存容器1具有容器本體10;以及蓋體20,嚙合於容器本體10。保存容器1在容器本體10與蓋體20所包圍的容器內部S1收容擦洗構件2。又,在以下說明,將除了容器內部S1的容器本體10及蓋體20外部稱為容器外部S2。Hereinafter, one embodiment of the present invention will be described with reference to the drawings. The first figure is a cross-sectional view of a storage container 1 of a scrubbing member 2 according to an embodiment. As shown in the figure, the storage container 1 includes a container body 10 and a lid body 20 that is engaged with the container body 10. The storage container 1 houses the scrubbing member 2 in a container interior S1 surrounded by the container body 10 and the lid body 20. In the following description, the outside of the container body 10 and the lid body 20 except for the container inside S1 will be referred to as a container outside S2.
保存容器1是由透明的塑膠材料所形成。做為形成保存容器1的塑膠材料,可採用例如聚乙烯(PE)、聚對苯二甲酸乙二醇酯(PET)、聚丙烯(PP)或其他通用塑膠材料。容器本體10及蓋體20較佳材料為,例如熱軟化的塑膠材料,藉由抽真空密接於特定成形模具,經冷卻形成的真空成形品。The storage container 1 is formed of a transparent plastic material. As a plastic material forming the storage container 1, for example, polyethylene (PE), polyethylene terephthalate (PET), polypropylene (PP), or other general-purpose plastic materials can be used. The preferred material of the container body 10 and the lid body 20 is, for example, a heat-softened plastic material, which is vacuum-sealed to a specific forming mold and then vacuum-formed.
第二A圖是關於一實施形態的容器本體10的平面圖,第二B圖是關於一實施形態的容器本體10的正面圖。第三A圖是關於一實施形態的容器本體10的平面側斜視圖,第三B圖是關於一實施形態的容器本體10的底面側斜視圖。 容器本體10如上述圖所示,具有嚙合溝11、環狀壁12以及凸緣部13。嚙合溝11形成於容器本體10的中心部。本實施形態的嚙合溝11具有有底圓桶形狀。FIG. 2A is a plan view of the container body 10 according to an embodiment, and FIG. 2B is a front view of the container body 10 according to an embodiment. FIG. 3A is a plan side perspective view of the container body 10 according to an embodiment, and FIG. 3B is a bottom side perspective view of the container body 10 according to an embodiment. As shown in the above figure, the container body 10 includes an engagement groove 11, an annular wall 12, and a flange portion 13. An engagement groove 11 is formed in a center portion of the container body 10. The engaging groove 11 of this embodiment has a bottomed barrel shape.
環狀壁12是在嚙合溝11周圍形成為圓環狀的環狀突起。環狀壁12在內壁面12a形成嚙合溝11的側面。環狀壁12的外壁面12b形成與蓋體20的嚙合面10a。在嚙合面10a形成有通氣溝30。通氣溝30在第二A圖所示的平面視角,以嚙合溝11為中心間隔90°形成四個。The annular wall 12 is an annular protrusion formed in a ring shape around the engagement groove 11. The annular wall 12 forms a side surface of the engagement groove 11 on the inner wall surface 12a. The outer wall surface 12 b of the annular wall 12 forms an engagement surface 10 a with the cover 20. A ventilation groove 30 is formed in the engaging surface 10a. The ventilation grooves 30 are formed at an interval of 90 ° with the meshing groove 11 as the center in the plane view shown in the second A diagram.
凸緣部13從環狀壁12的外壁面12b的下端向徑方向外側環狀延伸。在凸緣部13也形成有通氣溝30。也就是說,通氣溝30從環狀壁12的外壁面12b的上端形成到下端並彎曲,從凸緣部13的內緣形成到外緣。因此,通氣溝30在第一圖所示的剖面視角形成為L字形。The flange portion 13 extends annularly from the lower end of the outer wall surface 12 b of the annular wall 12 to the outside in the radial direction. An air groove 30 is also formed in the flange portion 13. That is, the ventilation groove 30 is formed from the upper end to the lower end of the outer wall surface 12 b of the annular wall 12 and is bent, and is formed from the inner edge to the outer edge of the flange portion 13. Therefore, the ventilation groove 30 is formed in an L shape in a cross-sectional viewing angle shown in the first figure.
第四A圖是關於一實施形態的蓋體20的平面圖,第四B圖是關於一實施形態的蓋體20的正面圖。第五A圖是關於一實施形態的蓋體20的平面側斜視圖,第五B圖是關於一實施形態的蓋體20的底面側斜視圖。 蓋體20如上述圖所示,具有上面部21、側面部22以及凸緣部23。上面部21形成為具有與環狀壁12的外徑大致相同的外徑的圓板狀。FIG. 4A is a plan view of the cover 20 according to an embodiment, and FIG. 4B is a front view of the cover 20 according to an embodiment. FIG. 5A is a plan side perspective view of the lid body 20 according to an embodiment, and FIG. 5B is a bottom side perspective view of the lid body 20 according to an embodiment. The cover 20 includes an upper surface portion 21, a side surface portion 22, and a flange portion 23 as shown in the above-mentioned figure. The upper surface portion 21 is formed in a disc shape having an outer diameter substantially the same as the outer diameter of the annular wall 12.
在上面部21的表面,如第四A及五A圖所示,以固定深度形成有複數個凹部25。複數個凹部25即「UP SIDE」,形成指出保存容器1的上面的刻痕(文字)。在上面部21的背面,對應前述複數個凹部25,如第五B圖所示,形成有複數個凸部24。複數個凸部24的形成面積比上面部21的背面的平面部的面積更小。As shown in FIGS. 4A and 5A, a plurality of concave portions 25 are formed on the surface of the upper surface portion 21 at a fixed depth. The plurality of recessed portions 25, that is, "UP SIDE", form a score (letter) indicating the upper surface of the storage container 1. On the back surface of the upper surface portion 21, a plurality of convex portions 24 are formed corresponding to the aforementioned plurality of concave portions 25, as shown in FIG. 5B. The formation area of the plurality of convex portions 24 is smaller than the area of the flat portion on the back surface of the upper surface portion 21.
側面部22如第四B圖所示,具有從上面部21的外緣向下方延伸的大致圓筒形狀。從側面部22的上端到下端為止的長度,如第一圖所示,比從環狀壁12的外壁面12b的上端(頂面12c)到下端(凸緣部13為止)的長度更長。側面部22的下端部內面,是嚙合於環狀壁12的外壁面12b(嚙合面10a)的嚙合面20a。As shown in FIG. 4B, the side surface portion 22 has a substantially cylindrical shape extending downward from the outer edge of the upper surface portion 21. As shown in the first figure, the length from the upper end to the lower end of the side surface portion 22 is longer than the length from the upper end (top surface 12c) to the lower end (up to the flange portion 13) of the outer wall surface 12b of the annular wall 12. The inner surface of the lower end portion of the side surface portion 22 is an engagement surface 20 a that is engaged with the outer wall surface 12 b (the engagement surface 10 a) of the annular wall 12.
凸緣部23從側面部22的下端向徑方向外側環狀延伸。凸緣部23在上下方向面對容器本體10的凸緣部13。藉由凸緣部23的下面抵接於凸緣部13的上面,進行對於容器本體10的蓋體20的上下方向的定位。又,藉由側面部22的下端部內面嚙合於環狀壁12的外壁面12b,進行對於容器本體10的蓋體20的徑方向(前後左右方向)的定位。The flange portion 23 extends annularly outward from the lower end of the side surface portion 22 in the radial direction. The flange portion 23 faces the flange portion 13 of the container body 10 in the vertical direction. The lower surface of the flange portion 23 is brought into contact with the upper surface of the flange portion 13 to position the lid body 20 of the container body 10 in the vertical direction. In addition, the inner surface of the lower end portion of the side surface portion 22 is engaged with the outer wall surface 12 b of the annular wall 12 to position the cover body 20 in the radial direction (front-rear, left-right direction).
如第一圖所示,在容器本體10與蓋體20嚙合的嚙合面10a、20a之中環狀壁12的外壁面12b(嚙合面10a),形成有連通容器內部S1與容器外部S2的通氣溝30。也就是說,通氣溝30形成於容器本體10與蓋體20的接合面。通氣溝30在環狀壁12的外壁面12b(嚙合面10a)形成有複數個,並形成複數個通氣流路。As shown in the first figure, the outer wall surface 12b (engaging surface 10a) of the annular wall 12 among the engaging surfaces 10a and 20a of the container body 10 and the cover body 20 is formed to communicate with the inside S1 of the container and the outside S2 of the container. Groove 30. That is, the ventilation groove 30 is formed on a joint surface between the container body 10 and the lid body 20. A plurality of ventilation grooves 30 are formed on the outer wall surface 12 b (engaging surface 10 a) of the annular wall 12, and a plurality of air flow paths are formed.
形成在容器本體10的嚙合溝11,具有可與擦洗構件2嚙合的內徑,擦洗構件2具有:本體部3,具有擦洗面3a;以及突出部4,從本體部3向擦洗面3a的相反側突出。本實施形態的擦洗構件2是安裝於基板洗淨裝置的筆型海綿,為被純水等保存液弄濕的狀態。又,擦洗構件2並非保存液滴下程度的濕潤狀態。The engagement groove 11 formed in the container body 10 has an inner diameter that can be engaged with the scrubbing member 2. The scrubbing member 2 has: a body portion 3 having a scrub surface 3a; and a protruding portion 4 opposite from the body portion 3 to the scrub surface 3a. Protruding sideways. The scrubbing member 2 according to this embodiment is a pen-shaped sponge attached to a substrate cleaning device, and is in a state of being wet with a preservation solution such as pure water. In addition, the scrubbing member 2 is not in a wet state to the extent that the liquid drops are stored.
做為擦洗構件2的材料,若為吸液性多孔質體,則沒有特別限制,可使用例如PVA(聚乙烯醇)海綿(=多孔質基材PVF(聚乙烯甲醛))。此外,做為擦洗構件2,也可以是貼附布料於本體部3的擦洗面3a的塑膠材料(包括軟質、硬質材料)。做為布料的材料,如以聚胺酯樹脂固定發泡胺基甲酸乙酯、纖維的不織布或麂皮型研磨布等,在表面上形成有細微孔,也可以是在細微孔中取出灰塵等異物性質的材料。The material of the scrubbing member 2 is not particularly limited as long as it is a liquid-absorbing porous body. For example, a PVA (polyvinyl alcohol) sponge (= porous substrate PVF (polyvinyl formaldehyde)) can be used. In addition, as the scrubbing member 2, a plastic material (including a soft material and a hard material) may be attached to the scrubbing surface 3 a of the body portion 3. As the material of the cloth, for example, polyurethane resin is used to fix foamed urethane, fiber non-woven cloth or suede-type abrasive cloth, etc., with fine holes formed on the surface, or dust can be taken out from the fine holes. Foreign material properties.
本體部3形成為具有比嚙合溝11的內徑更大的外徑的圓柱狀。本體部3的一端面成為圓形的擦洗面3a。擦洗面3a在擦洗構件2安裝於基板洗淨裝置時向下使用。突出部4形成為比本體部3外徑更小的圓柱狀。突出部4的外緣面在安裝於基板洗淨裝置時被夾持。突出部4的外徑大致等於嚙合溝11的內徑(又,也可以略大於嚙合溝11的內徑),嚙合於嚙合溝11。The body portion 3 is formed in a cylindrical shape having an outer diameter larger than the inner diameter of the engagement groove 11. One end surface of the body portion 3 becomes a circular scrubbing surface 3a. The scrub surface 3a is used downward when the scrub member 2 is mounted on a substrate cleaning apparatus. The protruding portion 4 is formed in a cylindrical shape having a smaller outer diameter than the main body portion 3. The outer edge surface of the protruding portion 4 is clamped when mounted on the substrate cleaning apparatus. The outer diameter of the protruding portion 4 is substantially equal to the inner diameter of the engaging groove 11 (also, it may be slightly larger than the inner diameter of the engaging groove 11), and engages with the engaging groove 11.
如第一圖所示,突出部4嚙合於嚙合溝11時,環狀壁12的頂面12c與本體部3為非接觸。也就是說,突出部4的長度為A1,嚙合溝11的深度為A2時,具有A1>A2的關係為較佳。又,A1是從本體部3的擦洗面3a的相反側的端面到突出部4的前端為止的長度。又,A2是從嚙合溝11的開口端(與環狀壁12的頂面12c相等)到嚙合溝11的底面為止的深度。As shown in the first figure, when the protruding portion 4 is engaged with the engagement groove 11, the top surface 12 c of the annular wall 12 and the main body portion 3 are non-contact. That is, when the length of the protruding portion 4 is A1 and the depth of the engagement groove 11 is A2, the relationship of A1> A2 is preferable. In addition, A1 is a length from the end surface on the opposite side of the scrub surface 3 a of the main body portion 3 to the front end of the protruding portion 4. A2 is the depth from the open end of the engagement groove 11 (equal to the top surface 12c of the annular wall 12) to the bottom surface of the engagement groove 11.
又,蓋體20對於本體部3的擦洗面3a,打開嚙合溝11深度以下的空隙,嚙合於容器本體10。也就是說,蓋體20與擦洗面3a的空隙大小為A3時,具有A2≧A3的關係為較佳。又,A3是從本體部3的擦洗面3a到形成於蓋體20的凸部24的前端為止的上下方向的距離。A1、A2、A3的關係,較佳為A1>A2≧A3。In addition, the lid body 20 engages with the container body 10 by opening a gap below the depth of the engagement groove 11 with respect to the scrub surface 3 a of the body portion 3. That is, when the gap between the cover body 20 and the scrub surface 3a is A3, it is preferable to have a relationship of A2 ≧ A3. In addition, A3 is a distance in the up-down direction from the scrub surface 3a of the main body portion 3 to the tip of the convex portion 24 formed in the cover body 20. The relationship between A1, A2, and A3 is preferably A1> A2 ≧ A3.
第六圖是關於一實施形態的擦洗構件2的封裝100的剖面圖。 如圖所示,在封裝100,一起收容有上述擦洗構件2的保存容器1、吸收氧的氧吸收劑102以及檢測氧的氧檢測劑103,保存容器1被包在具有通氣性的透明內袋101。又,包在內袋101的保存容器1、氧吸收劑102以及氧檢測劑103被包在透明的外袋104。外袋104是具有比內袋101通氣性低的屏蔽性的袋。The sixth figure is a cross-sectional view of the package 100 of the scrubbing member 2 according to an embodiment. As shown in the figure, in the package 100, the storage container 1 of the scrubbing member 2 described above, the oxygen absorbent 102 for absorbing oxygen, and the oxygen detection agent 103 for detecting oxygen are stored together. 101. The storage container 1, the oxygen absorbent 102, and the oxygen detection agent 103 enclosed in the inner bag 101 are enclosed in a transparent outer bag 104. The outer bag 104 is a bag having a lower air permeability than the inner bag 101.
保存容器1的容器本體10為真空成形品,在環狀壁12的背側等形成有一定程度大小的空間(背側空間S3)。氧吸收劑102及氧檢測劑103被配置在背側空間S3(容器外部S2)。藉此,可防止封裝100的小型化、以及氧吸收劑102及氧檢測劑103經由通氣溝30侵入容器內部S1。此外,由於依外袋104的大小,氧吸收劑102及氧檢測劑103不會從背側空間S3出來,所以也可以沒有內袋101。The container body 10 of the storage container 1 is a vacuum-formed product, and a space having a certain size is formed on the back side of the annular wall 12 (back space S3). The oxygen absorber 102 and the oxygen detection agent 103 are arranged in the back space S3 (the outside of the container S2). Accordingly, it is possible to prevent the miniaturization of the package 100 and the intrusion of the oxygen absorber 102 and the oxygen detection agent 103 into the container S1 through the vent groove 30. In addition, depending on the size of the outer bag 104, the oxygen absorbent 102 and the oxygen detection agent 103 do not come out of the back space S3, so the inner bag 101 may be omitted.
第七圖是關於一實施形態的安裝有擦洗構件2的基板洗淨裝置31的斜視圖。 基板洗淨裝置31為例如第七圖所示的筆型洗淨模組31B。洗淨模組31B具備:旋轉機構90,使基板W(例如半導體基板)旋轉;以及筆洗淨機構91,使擦洗構件2的擦洗面3a接觸基板W並旋轉。旋轉機構90具備:複數個夾頭90a1,保持基板W的外緣;以及旋轉台90a,在鉛直方向延伸的軸周圍使基板W旋轉。旋轉台90a在基板W的下面W2側,與馬達等電驅動部連接並水平旋轉。The seventh figure is a perspective view of the substrate cleaning device 31 on which the scrubbing member 2 is mounted according to one embodiment. The substrate cleaning device 31 is, for example, a pen-type cleaning module 31B shown in FIG. 7. The cleaning module 31B includes a rotation mechanism 90 that rotates the substrate W (for example, a semiconductor substrate), and a pen cleaning mechanism 91 that rotates the scrubbing surface 3 a of the scrubbing member 2 in contact with the substrate W. The rotation mechanism 90 includes a plurality of chucks 90 a 1 that hold the outer edge of the substrate W, and a rotation stage 90 a that rotates the substrate W around an axis extending in the vertical direction. The turntable 90a is horizontally rotated by being connected to an electric drive unit such as a motor on the lower surface W2 side of the substrate W.
筆洗淨機構91具備:擦洗構件2;以及臂91b,用以保持擦洗構件2。擦洗構件2被安裝於臂91b的前端,同時藉由配置於臂91b內部的馬達等電驅動部,在鉛直方向延伸的軸周圍旋轉。臂91b被配置在基板W的上方。在臂91b的基端部連接有旋轉軸91c。在旋轉軸91c,連接有使臂91b旋轉的馬達等電驅動部。臂91b以旋轉軸91c為中心,在平行基板W的平面內旋轉。也就是說,藉由臂91b的旋轉,被支持於此的擦洗構件2在基板W的半徑方向移動。基板W的上面W1(圖案面)被擦洗洗淨。The pen cleaning mechanism 91 includes a scrubbing member 2 and an arm 91 b for holding the scrubbing member 2. The scrubbing member 2 is attached to the front end of the arm 91b, and is rotated around an axis extending in the vertical direction by an electric drive unit such as a motor disposed inside the arm 91b. The arm 91b is disposed above the substrate W. A rotation shaft 91c is connected to a base end portion of the arm 91b. An electric drive unit such as a motor that rotates the arm 91b is connected to the rotation shaft 91c. The arm 91b rotates in a plane parallel to the substrate W with the rotation axis 91c as the center. That is, by the rotation of the arm 91b, the scrubbing member 2 supported here moves in the radial direction of the substrate W. The upper surface W1 (pattern surface) of the substrate W is scrubbed and washed.
接著,說明關於擦洗構件2的保存容器1的作用。Next, the function of the storage container 1 of the scrubbing member 2 will be described.
如第一圖所示,擦洗構件2的保存容器1具有容器本體10、嚙合於容器本體10的蓋體20,在容器本體10與蓋體20所包圍的容器內部S1收容擦洗構件2。在容器本體10與蓋體20嚙合的嚙合面10a形成有通氣溝30。通氣溝30連通容器內部S1與容器外部S2,防止容器內部S1(擦洗構件2)產生黴菌。As shown in the first figure, the storage container 1 of the scrubbing member 2 includes a container body 10 and a lid body 20 engaged with the container body 10. The scrubbing member 2 is housed in a container interior S1 surrounded by the container body 10 and the lid body 20. A ventilation groove 30 is formed on the engaging surface 10 a of the container body 10 and the lid body 20. The ventilation groove 30 communicates the inside S1 of the container with the outside S2 of the container, and prevents molds from being generated inside the container S1 (the scrubbing member 2).
透氣溝是30形成於容器本體10與蓋體20的接合面,並非在後加工(例如鑽頭等穿孔加工)設置,所以不會產生毛邊。因此,不會因毛邊損傷擦洗構件2,毛邊也不會附著於擦洗構件1而成為微粒。因此,根據像這樣的擦洗構件2的保存容器1,可抑制擦洗構件2的變形或污染、以及產生微粒。The ventilation groove 30 is formed on the joint surface of the container body 10 and the lid body 20 and is not provided in post-processing (for example, perforation processing such as a drill), so no burrs are generated. Therefore, the scrubbing member 2 is not damaged by the burrs, and the burrs are not adhered to the scrubbing members 1 and become fine particles. Therefore, according to the storage container 1 of the scrubbing member 2 as described above, deformation or contamination of the scrubbing member 2 and generation of particles can be suppressed.
又,在本實施形態中,通氣溝30在嚙合面10a形成複數個。根據如此結構,因為以複數個通氣溝30可在保存容器1形成空氣的入口與出口,所以保存容器1的通氣性變好。又,因為藉由複數個通氣溝30變大通氣流路的合計流路面積,所以保存容器1的通氣性變好。In this embodiment, a plurality of ventilation grooves 30 are formed on the engaging surface 10a. According to this structure, since the air inlet and the outlet can be formed in the storage container 1 by the plurality of ventilation grooves 30, the air permeability of the storage container 1 is improved. In addition, since the total flow path area of the air flow path is increased by the plurality of ventilation grooves 30, the air permeability of the storage container 1 is improved.
又,在本實施形態中,容器本體10具有可與擦洗構件2嚙合的嚙合溝11。根據如此結構,擦洗構件2在容器內部S1被定位,不能自由移動,所以可解除擦洗構件2的邊緣部抵住保存容器1的內面而變形的疑慮。In this embodiment, the container body 10 includes an engagement groove 11 that can be engaged with the scrubbing member 2. According to this structure, since the scrubbing member 2 is positioned inside the container S1 and cannot move freely, the suspicion that the edge portion of the scrubbing member 2 is deformed against the inner surface of the storage container 1 can be removed.
再者,在本實施形態中,容器本體10具有:環狀壁12,在內壁面12a形成嚙合溝11的側面,在環狀壁12的外壁面12b形成有通氣溝30。根據如此結構,即使保存液積存於與擦洗構件2嚙合的嚙合溝11,環狀壁12也會成為堤防,所以可防止液體經由通氣溝30從嚙合溝11漏出。Further, in the present embodiment, the container body 10 includes an annular wall 12, a side surface of the engagement groove 11 is formed on the inner wall surface 12 a, and an air vent groove 30 is formed on the outer wall surface 12 b of the annular wall 12. According to this structure, even if the storage liquid accumulates in the engagement groove 11 that is engaged with the scrubbing member 2, the annular wall 12 becomes a bank, so that the liquid can be prevented from leaking out of the engagement groove 11 through the ventilation groove 30.
在本實施形態中,擦洗構件2具有:本體部3,具有擦洗面3a;以及突出部4,從本體部3突出於擦洗面3a的相反側,當突出部4嚙合於嚙合溝11時,環狀壁12的頂面12c與本體部3非接觸。根據如此結構,可防止本體部3接觸環狀壁12的頂面12c而變形或污染。In this embodiment, the scrubbing member 2 includes: a main body portion 3 having a scrubbing surface 3a; and a protruding portion 4 protruding from the main body portion 3 on the opposite side of the scrubbing surface 3a. When the protruding portion 4 engages the engagement groove 11, the ring The top surface 12 c of the wall 12 is not in contact with the main body portion 3. With this structure, the main body portion 3 can be prevented from being deformed or contaminated by contacting the top surface 12 c of the annular wall 12.
此外,在本實施形態,蓋體20相對於本體部3的擦洗面3a,開出嚙合溝11的深度以下的空隙,嚙合於容器本體10。根據如此結構,例如,即使保存容器在搬送中受到衝擊等,擦洗構件2也不會從嚙合溝11的尺寸上脫離,所以可防止擦洗構件2的變形或污染。又,蓋體20具有向本體部3的擦洗面3a突出的複數個凸部24,所以與擦洗面3a的接觸面積變小,可防止擦洗面3a的變形或污染。In addition, in the present embodiment, the lid body 20 is opened to the scrubbing surface 3 a of the main body portion 3 with a gap below the depth of the engagement groove 11 and engages with the container body 10. According to this structure, for example, even if the storage container is impacted during transportation, the scrubbing member 2 is not detached from the size of the engagement groove 11, so that deformation or contamination of the scrubbing member 2 can be prevented. In addition, since the cover body 20 has a plurality of convex portions 24 protruding toward the scrub surface 3a of the body portion 3, the contact area with the scrub surface 3a is reduced, and deformation or contamination of the scrub surface 3a can be prevented.
以上,記載說明本發明的較佳實施形態,但是應理解這些是本發明的例示,並非做為限定來考慮。追加、省略、置換及其他變更可在不脫離本發明範圍下進行。因此,本發明不應視為以前述說明來限定,而是以申請專利範圍來限制。The preferred embodiments of the present invention have been described and described above, but it should be understood that these are examples of the present invention and are not to be considered as limiting. Additions, omissions, substitutions, and other changes can be made without departing from the scope of the present invention. Therefore, the present invention should not be regarded as limited by the foregoing description, but limited by the scope of patent application.
例如,在上述實施形態中,例示了形成有複數個通氣溝30,但若能確保通氣流路的流路面積,通氣溝30也可以是一個。For example, in the embodiment described above, it has been exemplified that a plurality of ventilation grooves 30 are formed. However, if the flow passage area of the ventilation passage can be secured, the number of the ventilation grooves 30 may be one.
又,例如在上述實施形態中,例示了通氣溝30形成於容器本體10的嚙合面10a的結構,但通氣溝30也可以形成在蓋體20的嚙合面20a,又,也可以形成在容器本體10的嚙合面10a與蓋體20的嚙合面20a兩者。For example, in the above-mentioned embodiment, the structure in which the ventilation groove 30 is formed on the engaging surface 10a of the container body 10 is exemplified. However, the ventilation groove 30 may be formed on the engaging surface 20a of the lid body 20, or may be formed on the container body Both the engaging surface 10a of 10 and the engaging surface 20a of the cover body 20 are provided.
又,例如在上述實施形態中,例示了擦洗構件2的本體部3的外形比突出部4的外形更大的結構,但也可以是本體部3的外形比突出部4的外形更小的結構。In addition, for example, in the above-mentioned embodiment, the configuration in which the outer shape of the main body portion 3 of the scrubbing member 2 is larger than the outer shape of the protruding portion 4 is exemplified. .
又,例如在上述實施形態中,例示了容器本體10的嚙合溝11在平面視角形成為圓形的結構,但嚙合溝11若為對應擦洗構件2形狀的形狀也可以。例如嚙合溝11也可以是四角形、其他多角形或除此之外的異形。又,在嚙合溝11的底面,也可以形成定位擦洗構件2的定位銷。Furthermore, for example, in the above-mentioned embodiment, the engagement groove 11 of the container body 10 is exemplified as being formed in a circular shape in plan view, but the engagement groove 11 may have a shape corresponding to the shape of the scrubbing member 2. For example, the engagement groove 11 may be a quadrangle, other polygons, or other shapes. A positioning pin for positioning the scrubbing member 2 may be formed on the bottom surface of the engagement groove 11.
又,例如在上述實施形態中,例示了形成於蓋體20的複數個凹部25形成「UP SIDE」的文字的結構,但也可以形成其他文字或模樣。但是,為了不局部負重於擦洗構件2的擦洗面3a,複數個凹部25(凸部24)較佳為佈置成在面對擦洗面3a的區域大致均勻地擴張。In addition, for example, in the embodiment described above, the structure in which the plurality of recesses 25 formed in the cover body 20 form a character “UP SIDE” is exemplified, but other characters or patterns may be formed. However, in order not to locally load the scrubbing surface 3 a of the scrubbing member 2, the plurality of concave portions 25 (convex portions 24) are preferably arranged to expand substantially uniformly in a region facing the scrubbing surface 3 a.
又,例如在上述實施形態中,例示了保存容器1收容基板洗淨裝置31的筆型海綿的結構,也可以是保存容器1收容擦洗基板的基板研磨裝置的研磨構件(擦洗構件)的結構。In addition, for example, in the embodiment described above, the structure of the pen-shaped sponge holding the substrate cleaning device 31 in the storage container 1 has been exemplified, and the structure of the polishing member (scrub member) of the substrate polishing device in which the storage container 1 stores the scrub substrate may be used.
1‧‧‧保存容器1‧‧‧Storage container
2‧‧‧擦洗構件2‧‧‧ scrubbing components
3‧‧‧本體部3‧‧‧Body
3a‧‧‧擦洗面3a‧‧‧ scrub face
4‧‧‧突出部4‧‧‧ protrusion
10‧‧‧容器本體10‧‧‧ container body
10a、20a‧‧‧嚙合面10a, 20a ‧‧‧ meshing surface
11‧‧‧嚙合溝11‧‧‧ meshing groove
12‧‧‧環狀壁12‧‧‧ annular wall
12a‧‧‧內壁面12a‧‧‧Inner wall surface
12b‧‧‧外壁面12b‧‧‧outer wall surface
12c‧‧‧頂面12c‧‧‧Top
13、23‧‧‧凸緣部13, 23‧‧‧ flange
20‧‧‧蓋體20‧‧‧ Cover
21‧‧‧上面部21‧‧‧ upper face
22‧‧‧側面部22‧‧‧Side
24‧‧‧凸部24‧‧‧ convex
25‧‧‧凹部25‧‧‧ Recess
30‧‧‧通氣溝30‧‧‧Ventilation trench
31‧‧‧基板洗淨裝置31‧‧‧ substrate cleaning device
31B‧‧‧洗淨模組31B‧‧‧washing module
90‧‧‧旋轉機構90‧‧‧ rotating mechanism
90a‧‧‧旋轉台90a‧‧‧Turntable
90a1‧‧‧夾頭90a1‧‧‧ chuck
91‧‧‧筆洗淨機構91‧‧‧Pen washing mechanism
91b‧‧‧臂91b‧‧‧arm
91c‧‧‧旋轉軸91c‧‧‧rotation axis
100‧‧‧封裝100‧‧‧ package
101‧‧‧內袋101‧‧‧Inner bag
102‧‧‧氧吸收劑102‧‧‧ oxygen absorbent
103‧‧‧氧檢測劑103‧‧‧ oxygen detection agent
104‧‧‧外袋104‧‧‧ Outer bag
A1‧‧‧突出部的長度A1‧‧‧ Length of protrusion
A2‧‧‧嚙合溝的深度A2‧‧‧ Depth of meshing groove
A3‧‧‧擦洗面至凸部的距離A3‧‧‧Distance from scrub surface to convex
S1‧‧‧容器內部S1‧‧‧ Inside the container
S2‧‧‧容器外部S2‧‧‧ Outside the container
S3‧‧‧背側空間S3‧‧‧Back space
W‧‧‧基板W‧‧‧ substrate
W1‧‧‧基板上面W1‧‧‧ On the substrate
W2‧‧‧基板下面W2‧‧‧Under the substrate
[第一圖]是關於一實施形態的擦洗構件2的保存容器1的剖面圖。 [第二A圖]是關於一實施形態的容器本體10的平面圖。 [第二B圖]是關於一實施形態的容器本體10的正面圖。 [第三A圖]是關於一實施形態的容器本體10的平面側斜視圖。 [第三B圖]是關於一實施形態的容器本體10的底面側斜視圖。 [第四A圖]是關於一實施形態的蓋體20的平面圖。 [第四B圖]是關於一實施形態的蓋體20的正面圖。 [第五A圖]是關於一實施形態的蓋體20的平面側斜視圖。 [第五B圖]是關於一實施形態的蓋體20的底面側斜視圖。 [第六圖]是關於一實施形態的擦洗構件2的封裝100的剖面圖。 [第七圖]是關於一實施形態之安裝有擦洗構件2的基板洗淨裝置31的斜視圖。[First Figure] A cross-sectional view of a storage container 1 of a scrubbing member 2 according to an embodiment. [Second A] is a plan view of a container body 10 according to an embodiment. [Second B] A front view of the container body 10 according to an embodiment. [Third A] A plan side perspective view of a container body 10 according to an embodiment. [Third B view] A perspective view of a bottom surface side of the container body 10 according to an embodiment. [Fourth A Figure] A plan view of a cover body 20 according to an embodiment. [Fourth B Figure] A front view of the cover body 20 according to an embodiment. [Fifth Figure A] is a plan side perspective view of a cover body 20 according to an embodiment. [Fifth B] FIG. 5 is a perspective view of the bottom surface of the cover 20 according to the embodiment. [Sixth Figure] A cross-sectional view of the package 100 of the scrubbing member 2 according to an embodiment. [Seventh Figure] A perspective view of the substrate cleaning device 31 on which the scrubbing member 2 is mounted according to one embodiment.
Claims (8)
Applications Claiming Priority (2)
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JP2017-219223 | 2017-11-14 | ||
JP2017219223A JP6933959B2 (en) | 2017-11-14 | 2017-11-14 | Storage container for scrubbing materials and its package |
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TW201922367A true TW201922367A (en) | 2019-06-16 |
TWI761628B TWI761628B (en) | 2022-04-21 |
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US (1) | US11180303B2 (en) |
JP (1) | JP6933959B2 (en) |
KR (1) | KR102439442B1 (en) |
CN (1) | CN110049930A (en) |
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WO (1) | WO2019098229A1 (en) |
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US2655968A (en) * | 1951-03-08 | 1953-10-20 | Verne P Simmons | Toothbrush cover |
US3746162A (en) * | 1971-09-10 | 1973-07-17 | R Bridges | Toothbrush container |
JPS51113702U (en) * | 1975-03-08 | 1976-09-14 | ||
JPS51113702A (en) | 1975-03-31 | 1976-10-07 | Hitachi Ltd | Reverberation adder |
JP4091187B2 (en) | 1998-12-08 | 2008-05-28 | 株式会社荏原製作所 | Cleaning tool, substrate cleaning apparatus and substrate cleaning method |
AU2003202420B2 (en) * | 2001-02-07 | 2007-11-01 | Manrex Pty. Ltd | Blister Packaging Improvements |
JP4588929B2 (en) * | 2001-06-29 | 2010-12-01 | 芝浦メカトロニクス株式会社 | Substrate cleaning tool and substrate processing apparatus |
JP2003292562A (en) * | 2002-04-08 | 2003-10-15 | Inoac Corp | Cleaning brush |
US20040050732A1 (en) * | 2002-09-12 | 2004-03-18 | Baker Justin M. | Paint brush protective cover and method therefor |
KR20060005690A (en) * | 2004-07-14 | 2006-01-18 | 주식회사 현동 | A lid structure for food storage container |
CN2812289Y (en) * | 2005-08-23 | 2006-08-30 | 坤德股份有限公司 | Chip box |
CN100356221C (en) | 2005-12-30 | 2007-12-19 | 武汉海博光技术有限公司 | Optical fiber arranging and packing equipment in optical fiber array component element |
WO2007138913A1 (en) * | 2006-05-29 | 2007-12-06 | Shin-Etsu Polymer Co., Ltd. | Substrate container |
JP2008068900A (en) * | 2006-09-14 | 2008-03-27 | Toppan Printing Co Ltd | Package |
JP2009012803A (en) * | 2007-07-03 | 2009-01-22 | Shoichi Nakamura | Article storing method and article storing device |
CN201990097U (en) * | 2011-01-28 | 2011-09-28 | 李健同 | Environment-friendly compact disc (CD) containing plate |
US9908670B2 (en) * | 2011-01-31 | 2018-03-06 | American Snuff Company, Llc | Container for smokeless tobacco products |
JP2015110445A (en) * | 2013-10-28 | 2015-06-18 | 株式会社 照和樹脂 | Container and cleaning method |
JP2015181153A (en) | 2014-03-06 | 2015-10-15 | 日東電工株式会社 | Gas permeable member and air permeable container |
CN204450325U (en) | 2015-01-11 | 2015-07-08 | 深圳市中孚能电气设备有限公司 | A kind of shell assembling special fixture |
CN205972350U (en) * | 2016-08-03 | 2017-02-22 | 肇庆绿健农业科技有限公司 | Bottle lid of asparagus blake bottle |
-
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-
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- 2018-11-14 KR KR1020187036755A patent/KR102439442B1/en active IP Right Grant
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Publication number | Publication date |
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US20210163208A1 (en) | 2021-06-03 |
JP6933959B2 (en) | 2021-09-08 |
CN110049930A (en) | 2019-07-23 |
JP2019089576A (en) | 2019-06-13 |
US11180303B2 (en) | 2021-11-23 |
KR20200084071A (en) | 2020-07-10 |
KR102439442B1 (en) | 2022-09-02 |
TWI761628B (en) | 2022-04-21 |
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