TW201922365A - Method for manufacturing glass plate - Google Patents

Method for manufacturing glass plate Download PDF

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Publication number
TW201922365A
TW201922365A TW107137838A TW107137838A TW201922365A TW 201922365 A TW201922365 A TW 201922365A TW 107137838 A TW107137838 A TW 107137838A TW 107137838 A TW107137838 A TW 107137838A TW 201922365 A TW201922365 A TW 201922365A
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TW
Taiwan
Prior art keywords
glass plate
liquid
drying
chamber
cleaning
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TW107137838A
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Chinese (zh)
Inventor
鑑継薫
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日商日本電氣硝子股份有限公司
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Publication of TW201922365A publication Critical patent/TW201922365A/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00Other surface treatment of glass not in the form of fibres or filaments

Abstract

A method for manufacturing a glass plate (G) is provided with a washing step (S2) for washing a glass plate (G) by supplying a first liquid (19, 20) to the glass plate (G) and a drying step (S3) for eliminating the first liquid (19, 20) from the glass plate (G) by blowing a gas (26) onto the glass plate (G) that is transported into a drying chamber (12) and being transported on a prescribed transport pathway (L) within the drying chamber (12). Liquid eliminating drying is performed by blowing the gas (26) onto the glass plate (G) in a state where a second liquid (32) is disposed at the bottom of the drying chamber (12).

Description

玻璃板的製造方法Manufacturing method of glass plate

本發明是有關於一種玻璃板的製造方法,且特別是有關於一種對玻璃板進行清洗後,將清洗液去除來使玻璃板乾燥時,防止微粒子朝玻璃板表面上的附著的技術。The present invention relates to a method for manufacturing a glass plate, and more particularly, to a technology for preventing the adhesion of fine particles on the surface of a glass plate when the glass plate is dried after removing the cleaning liquid after the glass plate is washed.

例如當製造以液晶顯示器用的玻璃基板為代表的玻璃板時,對自已成形的玻璃原板(成形原板)中切出的玻璃板實施端面加工等加工後,對該玻璃板進行清洗,並且藉由利用氣刀等的空氣的吹送來去除清洗時附著於玻璃板的表面上的清洗液(進行脫液),而使玻璃板乾燥(例如,參照專利文獻1)。另外,於經過所述一連串的作業後,檢查有無殘存(附著)於所獲得的玻璃板上的異物。
[現有技術文獻]
[專利文獻]
For example, when manufacturing a glass plate typified by a glass substrate for a liquid crystal display, the glass plate cut out of the glass original plate (formed original plate) is subjected to processing such as end face processing, and then the glass plate is cleaned and The air is blown by an air knife or the like to remove the cleaning liquid (de-liquidation) attached to the surface of the glass plate during cleaning and dry the glass plate (for example, refer to Patent Document 1). In addition, after the series of operations described above, the presence or absence of foreign matter remaining on (attached to) the obtained glass plate was checked.
[Prior Art Literature]
[Patent Literature]

專利文獻1:日本專利特開2014-38914號公報Patent Document 1: Japanese Patent Laid-Open No. 2014-38914

[發明所欲解決之課題]
如此,於檢查步驟中,檢查有無附著於玻璃板的表面上的玻璃粉等異物,另外,有時亦進行異物的數量的測定。此處,成為測定對象的異物對應於其尺寸而被分類成多個水準,其中,亦存在檢測到許多最小水準(未滿1.0 μm)的異物(以下,於本說明書中僅稱為微粒子)的傾向。此種微粒子於檢查步驟之前的期間內難以完全地去除,例如如專利文獻1中記載般,即便於對玻璃板的表面進行清洗後,利用氣刀進行了脫液乾燥的情況下,於乾燥後的玻璃板中,亦存在絕對無法忽視的數量的微粒子附著於表面上者。當然,微粒子的附著成為使玻璃板的表面品質下降的因素,因此應避免微粒子的附著。
[Problems to be Solved by the Invention]
As described above, in the inspection step, the presence or absence of foreign matter such as glass frit adhering to the surface of the glass plate is inspected, and the number of foreign matter is sometimes measured. Here, the foreign objects to be measured are classified into a plurality of levels according to their sizes. Among them, there are also many foreign objects with a minimum level (less than 1.0 μm) detected (hereinafter, referred to as only fine particles in this specification). tendency. It is difficult to completely remove such fine particles during the period before the inspection step. For example, as described in Patent Document 1, even after the surface of the glass plate is cleaned and the liquid knife is deliquored and dried, after drying, There are also a number of particles on the surface of the glass plate that cannot be ignored. Of course, the attachment of fine particles becomes a factor that reduces the surface quality of the glass plate, and therefore, the adherence of fine particles should be avoided.

鑒於以上的情況,於本說明書中,將減少微粒子朝玻璃板表面上的附著,提供表面品質優異的玻璃板作為應由本發明解決的技術課題。
[解決課題之手段]
In view of the foregoing, in the present specification, as a technical problem to be solved by the present invention, it is considered to reduce the adhesion of fine particles to the surface of a glass plate and provide a glass plate with excellent surface quality.
[Means for solving problems]

所述課題的解決藉由本發明的玻璃板的製造方法來達成。即,該製造方法包括:清洗步驟,將第一液體供給至玻璃板上,對玻璃板進行清洗;以及乾燥步驟,對被搬入乾燥處理室內,且於乾燥處理室內的規定的搬送路徑上被搬送的玻璃板吹送氣體,而自玻璃板上去除第一液體;該製造方法的特徵在於:以於乾燥處理室的底部配置有第二液體的狀態,對玻璃板吹送氣體。The above-mentioned problem is solved by the manufacturing method of the glass plate of this invention. That is, the manufacturing method includes a washing step of supplying the first liquid to the glass plate to clean the glass plate, and a drying step of being carried into the drying processing chamber and being carried on a predetermined transportation path in the drying processing chamber. The glass plate is blown with gas, and the first liquid is removed from the glass plate. The manufacturing method is characterized in that the gas is blown into the glass plate in a state where a second liquid is arranged at the bottom of the drying processing chamber.

本發明者對當進行所述清洗與脫液乾燥時,乾燥處理室內的氣流與微粒子的舉動的關係進行調查的結果,獲得了以下的發現。即,當於乾燥處理室內實施所述清洗後的乾燥時,藉由配設於乾燥處理室內的氣刀等氣體吹送裝置,進行已被搬入乾燥處理室內的玻璃板的脫液(清洗液或淋洗液等的去除)。此時,判明自氣體吹送裝置供給至玻璃板上的氣體於乾燥處理室內產生亂流,因該亂流而導致與第一液體(清洗液等)一同被自玻璃板的表面上去除,並沈降至乾燥處理室的底部的微粒子飛舞。根據以上所述,推測微粒子朝玻璃板表面上的附著由因對於玻璃板的氣體的吹送而於乾燥處理室內產生的不規則的流動(亂流)引起。The inventors investigated the relationship between the air flow in the drying processing chamber and the behavior of the microparticles when performing the cleaning and deliquoring drying, and obtained the following findings. That is, when the cleaning and drying is performed in the drying processing chamber, a glass blower such as an air knife disposed in the drying processing chamber is used to perform deliquoring (washing liquid or shower) of the glass plate that has been carried into the drying processing chamber. Removal of lotions, etc.). At this time, it was found that the gas supplied to the glass plate from the gas blowing device generated a turbulent flow in the drying processing chamber, and the turbulent flow was removed from the surface of the glass plate together with the first liquid (cleaning liquid, etc.) and settled Particles flying to the bottom of the drying chamber flutter. From the above, it is presumed that the adhesion of the fine particles on the surface of the glass plate is caused by an irregular flow (turbulent flow) generated in the drying processing chamber due to the blowing of the gas to the glass plate.

本發明是根據以上的發現而成者,當進行利用第一液體的玻璃板的清洗與乾燥時,以於乾燥處理室的底部配置有捕捉用的第二液體的狀態對玻璃板吹送氣體。如此,於在應被設定成乾燥環境的乾燥處理室的底部配置有第二液體的環境下進行利用氣體的吹送的脫液,藉此與清洗液等一同被自玻璃板上去除的微粒子由第二液體捕捉。因此,即便於乾燥處理室內產生了由氣體的吹送所引起的亂流,已沈降的微粒子亦難以乘著亂流而飛舞。因此,可於乾燥處理室內高效地去除清洗液來對玻璃板進行乾燥,並減少微粒子的附著,提供表面品質優異的玻璃板。另外,因將第二液體供給至乾燥處理室的底部,故可極力排除玻璃板與第二液體接觸的機會。因此,可儘可能地防止由將第二液體配置於乾燥處理室內所引起的玻璃板的表面品質的下降。再者,作為利用第二液體的捕捉以外的方法,例如亦可考慮對乾燥處理室內的氣體進行排氣,使經排氣的氣體穿過規定的過濾器來排除微粒子後,再次返回至乾燥處理室內的方法等,但若為該方法,則需要極大的排氣能力,無法避免排氣設備的複雜化、高成本化。相對於此,根據本發明的微粒子捕捉方法,僅藉由維持於乾燥處理室的底部配置有第二液體的狀態,便可減少微粒子朝玻璃板表面上的附著,因此只要是簡單的設備即可。根據以上所述,根據本發明,可避免成本上升,並提升玻璃板的表面品質。再者,所謂第一液體,是指於清洗步驟中被供給至玻璃板上的液體,於後述的實施方式中,清洗液及淋洗液相當於第一液體。The present invention is based on the above findings. When cleaning and drying a glass plate using a first liquid, a gas is blown to the glass plate in a state where a second liquid for trapping is disposed at the bottom of the drying processing chamber. In this manner, the liquid is blown off by using a gas blower in an environment where a second liquid is disposed at the bottom of the drying processing chamber which should be set to a dry environment, thereby removing particles from the glass plate together with the cleaning liquid and the like. Two liquid traps. Therefore, even if a turbulent flow due to gas blowing occurs in the drying processing chamber, it is difficult for the fine particles that have settled to fly in the turbulent flow. Therefore, it is possible to efficiently remove the cleaning liquid in the drying processing chamber to dry the glass plate, reduce the adhesion of fine particles, and provide a glass plate with excellent surface quality. In addition, since the second liquid is supplied to the bottom of the drying processing chamber, the opportunity for the glass plate to contact the second liquid can be eliminated as much as possible. Therefore, it is possible to prevent the degradation of the surface quality of the glass plate caused by disposing the second liquid in the drying processing chamber as much as possible. Furthermore, as a method other than capturing the second liquid, for example, it is also possible to consider exhausting the gas in the drying processing chamber, passing the exhausted gas through a predetermined filter to remove particulates, and then returning to the drying processing again. Indoor method, etc. However, if it is this method, it requires a large exhaust capacity, and it is unavoidable that the exhaust equipment becomes complicated and expensive. On the other hand, according to the microparticle capturing method of the present invention, it is possible to reduce the adhesion of microparticles to the surface of the glass plate only by maintaining the state in which the second liquid is disposed on the bottom of the drying processing chamber, so that only a simple device is required. . As described above, according to the present invention, it is possible to avoid cost increase and improve the surface quality of the glass plate. The first liquid is a liquid that is supplied to the glass plate in the cleaning step. In the embodiment described later, the cleaning liquid and the eluent correspond to the first liquid.

另外,於本發明的玻璃板的製造方法中,亦可於乾燥處理室內的底部由第一液體及第二液體覆蓋的狀態下,對玻璃板吹送氣體。Moreover, in the manufacturing method of the glass plate of this invention, you may blow gas to a glass plate in the state which the bottom part of a drying processing chamber was covered with the 1st liquid and the 2nd liquid.

藉由如所述般利用第一液體及第二液體覆蓋乾燥處理室內的底部,可無遺漏且確實地捕捉已於乾燥處理室內沈降的微粒子。另外,亦可確實地防止因亂流等的影響而導致第二液體上升並與玻璃板接觸的事態。根據以上所述,根據本結構,可進一步減少微粒子朝玻璃板上的附著,並使玻璃板乾燥。By covering the bottom of the drying processing chamber with the first liquid and the second liquid as described above, it is possible to reliably and reliably capture particles that have settled in the drying processing chamber. In addition, it is possible to reliably prevent the second liquid from rising and coming into contact with the glass plate due to the influence of turbulence and the like. As described above, according to this structure, the adhesion of fine particles to the glass plate can be further reduced, and the glass plate can be dried.

另外,於本發明的玻璃板的製造方法中,第二液體亦可為純水。Moreover, in the manufacturing method of the glass plate of this invention, a 2nd liquid may be pure water.

乾燥處理室通常將清潔度管理得比清洗處理室高。因此,藉由將純水用於第二液體,可不使乾燥處理室內空氣的清潔度惡化,捕捉於空氣中懸浮並沈降的微粒子,而減少朝玻璃板表面上的附著。Drying process chambers generally manage higher cleanliness than cleaning process chambers. Therefore, by using pure water for the second liquid, it is possible to capture particles suspended and settled in the air without deteriorating the cleanliness of the air in the drying treatment chamber, and reduce adhesion to the surface of the glass plate.

另外,於本發明的玻璃板的製造方法中,亦可藉由朝乾燥處理室內供給第二液體及朝乾燥處理室外排出第二液體,而更換配置於底部的第二液體。Moreover, in the manufacturing method of the glass plate of this invention, the 2nd liquid arrange | positioned at the bottom can also be replaced by supplying a 2nd liquid into a drying process chamber, and discharging a 2nd liquid into a drying process chamber.

藉由如所述般更換配置於乾燥處理室的底部的液體,可將已被捕捉的微粒子與第二液體一同排出。藉此,可將乾燥處理室的清潔度維持成高的狀態。
[發明的效果]
By changing the liquid disposed at the bottom of the drying processing chamber as described above, the captured microparticles can be discharged together with the second liquid. Thereby, the cleanliness of a drying process chamber can be maintained high.
[Effect of the invention]

如以上所述般,根據本發明,可減少微粒子朝玻璃板表面上的附著,提供表面品質優異的玻璃板。As described above, according to the present invention, the adhesion of fine particles to the surface of the glass plate can be reduced, and a glass plate having excellent surface quality can be provided.

以下,參照圖1~圖3對本發明的第一實施方式進行說明。Hereinafter, a first embodiment of the present invention will be described with reference to FIGS. 1 to 3.

如圖1所示,本實施方式的玻璃板的製造方法包括:加工步驟S1,對玻璃板實施規定的加工;清洗步驟S2,對已被實施規定的加工的玻璃板進行清洗;乾燥步驟S3,將附著於經清洗的玻璃板上的清洗液去除來使玻璃板乾燥;以及檢查步驟S4,檢查有無附著於乾燥後的玻璃板的表面上的微粒子等異物。於加工步驟S1中,例如利用磨石對玻璃板的端面實施加工。作為加工步驟S1的前步驟,亦可設置自成形原板切出所期望的尺寸的玻璃板的切斷步驟。以下,以清洗步驟S2與乾燥步驟S3為中心進行說明。As shown in FIG. 1, the method for manufacturing a glass plate according to this embodiment includes a processing step S1 to perform predetermined processing on the glass plate, a cleaning step S2 to clean the glass plate that has been subjected to the predetermined processing, and a drying step S3. The cleaning liquid adhering to the cleaned glass plate is removed to dry the glass plate; and the inspection step S4 is performed to check whether there is foreign matter such as fine particles adhering to the surface of the dried glass plate. In the processing step S1, the end surface of a glass plate is processed using a grindstone, for example. As a step before the processing step S1, a cutting step of cutting a glass plate of a desired size from the forming original plate may be provided. The following description focuses on the washing step S2 and the drying step S3.

圖2是表示清洗步驟S2及乾燥步驟S3中所使用的清洗乾燥裝置10的整體結構的側面圖。如圖2所示,該清洗乾燥裝置10包括清洗處理室11與乾燥處理室12,玻璃板G的搬送路徑L以橫穿清洗處理室11及乾燥處理室12的方式設置。於此情況下,於清洗處理室11與乾燥處理室12內配設沿著搬送路徑L搬送玻璃板G的搬送裝置13、搬送裝置14。各搬送裝置13、14例如包含輥式輸送機。FIG. 2 is a side view showing the overall configuration of the washing and drying device 10 used in the washing step S2 and the drying step S3. As shown in FIG. 2, the cleaning and drying device 10 includes a cleaning processing chamber 11 and a drying processing chamber 12, and a conveyance path L of the glass plate G is provided so as to cross the cleaning processing chamber 11 and the drying processing chamber 12. In this case, a conveying device 13 and a conveying device 14 that convey the glass sheet G along the conveying path L are disposed in the cleaning processing chamber 11 and the drying processing chamber 12. Each of the conveying devices 13 and 14 includes, for example, a roller conveyor.

於本實施方式中,清洗處理室11具有第一清洗室15與第二清洗室16。其中,第一清洗室15具有擦拭玻璃板G的表面Ga、Ga來去除附著於表面Ga、Ga上的異物等污垢的清洗輥17。於本實施方式中,將上下一對的清洗輥17、17配設於隔著玻璃板G的搬送路徑L而相向的位置上。清洗輥17可為利用海綿等彈性材料形成與玻璃板G的接觸部者,亦可為利用刷子形成與玻璃板G的接觸部者。於前者的情況下,清洗輥17變成海綿輥,於後者的情況下,清洗輥17變成刷輥。In this embodiment, the cleaning processing chamber 11 includes a first cleaning chamber 15 and a second cleaning chamber 16. Among them, the first cleaning chamber 15 includes a cleaning roller 17 that wipes the surfaces Ga and Ga of the glass plate G to remove dirt such as foreign matter adhering to the surfaces Ga and Ga. In this embodiment, a pair of upper and lower cleaning rollers 17 and 17 are arranged at positions facing each other across the conveyance path L of the glass sheet G. The cleaning roller 17 may be a person who forms a contact portion with the glass plate G using an elastic material such as a sponge, or a person who forms a contact portion with the glass plate G using a brush. In the former case, the cleaning roller 17 becomes a sponge roller, and in the latter case, the cleaning roller 17 becomes a brush roller.

另外,於第一清洗室15內配設清洗液供給裝置18。於此情況下,以將清洗液19(第一液體)供給至於搬送路徑L上穿過的玻璃板G的表面Ga、Ga整個區域中的方式,設定清洗液供給裝置18的供給口(省略圖示)的方向或寬度方向尺寸、供給流量等。此處,本說明書中的「寬度方向」是指與在搬送路徑L上被搬送的玻璃板G的寬度方向一致的方向。再者,於清洗液19中,例如可使用純水,視需要亦可添加洗滌劑或界面活性劑、鹼性離子水、次氯酸鈉等。A cleaning liquid supply device 18 is disposed in the first cleaning chamber 15. In this case, the supply port of the cleaning liquid supply device 18 is set so that the cleaning liquid 19 (first liquid) is supplied to the entire surface Ga, Ga of the glass plate G passing through the conveyance path L (omitted from the figure) (Shown) dimensions, supply dimensions, etc. Here, the "width direction" in the present specification means a direction that coincides with the width direction of the glass sheet G that is conveyed on the conveyance path L. Further, for the cleaning liquid 19, for example, pure water may be used, and if necessary, a detergent or a surfactant, alkaline ionized water, sodium hypochlorite, or the like may be added.

第二清洗室16位於比第一清洗室15更靠近搬送路徑L的下游側,具有將作為第一液體的淋洗液(洗滌液)20供給至已被自第一清洗室15搬入第二清洗室16內的玻璃板G的表面Ga、Ga上的淋洗液供給裝置21。於此情況下,亦以將淋洗液20供給至於搬送路徑L上穿過的玻璃板G的表面Ga、Ga整個區域中的方式,設定淋洗液供給裝置21的供給口(省略圖示)的方向或寬度方向尺寸、供給流量等。再者,於淋洗液20中,可使用純水等公知的種類的淋洗用液體。The second cleaning chamber 16 is located on the downstream side closer to the transport path L than the first cleaning chamber 15 and has an eluent (washing liquid) 20 as a first liquid supplied to the second cleaning chamber that has been carried in from the first cleaning chamber 15 The eluent supply device 21 on the surfaces Ga and Ga of the glass plate G in the chamber 16. In this case, the supply port of the eluent supply device 21 is also set so that the eluent 20 is supplied to the entire surface Ga and Ga of the glass plate G passing through the conveyance path L (not shown). Direction or width dimension, supply flow rate, etc. In addition, as the eluent 20, a known kind of eluent liquid such as pure water can be used.

再者,已被供給至玻璃板G上的清洗液19流下至第一清洗室15的底部15a中。因此,雖然省略圖示,但於底部15a中,用於排放已流下的清洗液19的排放口設置於底部15a中。另外,已被供給至玻璃板G上的清洗液19及淋洗液20流下至第二清洗室16的底部16a中。因此,雖然省略圖示,但於底部16a中,用於排放流下的清洗液19及淋洗液20的排放口設置於底部16a中。Further, the cleaning liquid 19 that has been supplied onto the glass plate G flows down to the bottom portion 15 a of the first cleaning chamber 15. Therefore, although illustration is omitted, in the bottom portion 15a, a discharge port for discharging the washing liquid 19 that has flowed down is provided in the bottom portion 15a. In addition, the cleaning liquid 19 and the eluent 20 that have been supplied to the glass plate G flow down to the bottom 16 a of the second cleaning chamber 16. Therefore, although the illustration is omitted, in the bottom portion 16a, a discharge port for discharging the flowing down washing liquid 19 and eluent liquid 20 is provided in the bottom portion 16a.

乾燥處理室12具有脫液室22、及位於比脫液室22更靠近搬送路徑L的下游側的第一乾燥室23。於本實施方式中,乾燥處理室12於位於比第一乾燥室23更靠近搬送路徑L的下游側進而具有第二乾燥室24。於脫液室22與第一乾燥室23之間設置有隔板25。藉此,限制脫液室22的空氣等流入第一乾燥室23中。再者,於清洗步驟中所供給的清洗液19及淋洗液20殘留於被搬入脫液室22中的玻璃板G上,因此淋洗液20等流下至脫液室22的底部22a中。因此,脫液室22的底部22a由淋洗液20等覆蓋,而變成潮濕的狀態。此時,雖然省略圖示,但亦可於底部22a中設置用於排放流下的淋洗液20等的排放口。The drying processing chamber 12 includes a dehydration chamber 22 and a first drying chamber 23 located on the downstream side of the transport path L than the dehydration chamber 22. In the present embodiment, the drying processing chamber 12 includes a second drying chamber 24 on a downstream side closer to the transport path L than the first drying chamber 23. A partition plate 25 is provided between the dehydration chamber 22 and the first drying chamber 23. Thereby, the air or the like of the dehydration chamber 22 is restricted from flowing into the first drying chamber 23. Furthermore, since the washing liquid 19 and the eluent 20 supplied in the washing step remain on the glass plate G carried into the dehydration chamber 22, the eluent 20 and the like flow down to the bottom 22a of the dehydration chamber 22. Therefore, the bottom 22a of the dehydration chamber 22 is covered with the eluent 20 and the like, and becomes a wet state. At this time, although illustration is omitted, a drain port for discharging the eluent 20 and the like flowing down may be provided in the bottom 22a.

於第一乾燥室23中配設用於朝被搬入第一乾燥室23內的玻璃板G的表面Ga、Ga吹送規定的氣體26(例如潔淨乾燥空氣等)的氣體吹送裝置27。於本實施方式中,氣體吹送裝置27是上下一對的氣刀28、28,玻璃板G的搬送路徑L位於所述一對氣刀28、28間。此處,各氣刀28的供給口28a的寬度方向尺寸被設定成可將氣體26吹送至於一對氣刀28、28間穿過的玻璃板G的表面Ga、Ga整個區域中的大小。另外,各氣刀28的供給口28a的角度被設定成可自第一乾燥室23側朝脫液室22側將氣體26吹送至玻璃板G的表面Ga上的大小。再者,於圖示例中,以於比脫液室22與第一乾燥室23的邊界位置(隔板25的位置)更靠近脫液室22的位置上,對玻璃板G的表面Ga、Ga吹送氣體26的方式配置一對氣刀28、28,但亦能夠以於脫液室22與第一乾燥室23的邊界位置(上下的隔板25、25間)上對表面Ga吹送氣體26的方式配置一對氣刀28、28。A gas blowing device 27 is provided in the first drying chamber 23 to blow a predetermined gas 26 (for example, clean and dry air) toward the surface Ga and Ga of the glass sheet G carried into the first drying chamber 23. In this embodiment, the gas blowing device 27 is a pair of upper and lower air knives 28 and 28, and the conveyance path L of the glass plate G is located between the pair of air knives 28 and 28. Here, the widthwise dimension of the supply port 28a of each air knife 28 is set to a size that can blow the gas 26 to the entire surface Ga, Ga of the glass plate G passing between the pair of air knifes 28, 28. In addition, the angle of the supply port 28a of each air knife 28 is set to such a size that the gas 26 can be blown onto the surface Ga of the glass plate G from the first drying chamber 23 side to the dehydration chamber 22 side. In the example shown in the figure, the surfaces Ga, G, and G of the glass plate G are positioned closer to the dehydration chamber 22 than the boundary position of the dehydration chamber 22 and the first drying chamber 23 (the position of the partition plate 25). A pair of air knives 28 and 28 are arranged as the Ga blow gas 26, but the Ga blow gas 26 can also be blown on the surface at the boundary position between the deliquoring chamber 22 and the first drying chamber 23 (between the upper and lower partitions 25 and 25). A pair of air knives 28, 28 is configured in the same manner.

於第一乾燥室23與第二乾燥室24之間設置有隔板29。藉此,第一乾燥室23的內部空間與第二乾燥室24的內部空間被劃分,因此限制第一乾燥室23的空氣等流入第二乾燥室24中。因此,可使第二乾燥室24的清潔度比第一乾燥室23的清潔度高。A partition plate 29 is provided between the first drying chamber 23 and the second drying chamber 24. Thereby, the internal space of the first drying chamber 23 and the internal space of the second drying chamber 24 are divided, so that the air or the like of the first drying chamber 23 is restricted from flowing into the second drying chamber 24. Therefore, the cleanliness of the second drying chamber 24 can be made higher than that of the first drying chamber 23.

於第二乾燥室24中配設用於朝被搬入第二乾燥室24內的玻璃板G的表面Ga、Ga吹送規定的氣體26的氣體吹送裝置30。於本實施方式中,氣體吹送裝置30是上下一對的氣刀31、31,玻璃板G的搬送路徑L位於所述一對氣刀31、31間。此處,各氣刀31的供給口31a的寬度方向尺寸被設定成可將氣體26吹送至於一對氣刀31、31間穿過的玻璃板G的表面Ga、Ga整個區域中的大小。另外,各氣刀31的供給口31a的角度被設定成可自第二乾燥室24側朝第一乾燥室23側將氣體26吹送至玻璃板G的表面Ga上的大小。再者,各氣刀31的供給口31a的角度可與第一乾燥室23內的各氣刀28的供給口28a的角度相同,亦可不同。另外,於圖示例中,以於比第一乾燥室23與第二乾燥室24的邊界位置(隔板29的位置)更靠近第一乾燥室23的位置上,對玻璃板G的表面Ga、Ga吹送氣體26的方式配置一對氣刀31、31,但亦能夠以於第一乾燥室23與第二乾燥室24的邊界位置(上下的隔板29、29間)上對表面Ga吹送氣體26的方式配置一對氣刀31、31。或者,亦能夠以於比邊界位置更靠近第二乾燥室24的位置上對表面Ga吹送氣體26的方式配置一對氣刀31、31。A gas blowing device 30 is provided in the second drying chamber 24 for blowing a predetermined gas 26 toward the surfaces Ga and Ga of the glass sheet G carried into the second drying chamber 24. In this embodiment, the gas blowing device 30 is a pair of upper and lower air knives 31 and 31, and the conveyance path L of the glass plate G is located between the pair of air knives 31 and 31. Here, the width direction dimension of the supply port 31a of each air knife 31 is set to a size that can blow the gas 26 to the entire surface Ga, Ga of the glass plate G passing between the pair of air knife 31, 31. In addition, the angle of the supply port 31a of each air knife 31 is set to a size where the gas 26 can be blown onto the surface Ga of the glass plate G from the second drying chamber 24 side to the first drying chamber 23 side. The angle of the supply port 31 a of each air knife 31 may be the same as or different from the angle of the supply port 28 a of each air knife 28 in the first drying chamber 23. In the example shown in the figure, the surface Ga of the glass plate G is closer to the first drying chamber 23 than the boundary position (the position of the partition plate 29) of the first drying chamber 23 and the second drying chamber 24. A pair of air knives 31 and 31 are arranged so that the gas 26 is blown by Ga. However, the surface Ga can also be blown at the boundary position between the first drying chamber 23 and the second drying chamber 24 (between the upper and lower partitions 29 and 29). A pair of air knives 31 and 31 are arranged in the form of the gas 26. Alternatively, the pair of air knives 31 and 31 may be disposed so as to blow the gas 26 on the surface Ga at a position closer to the second drying chamber 24 than the boundary position.

於第一乾燥室23的底部23a及第二乾燥室24的底部24a中配置有微粒子捕捉用的液體32(第二液體)。於本實施方式中,第一乾燥室23的底部23a及第二乾燥室24的底部24a處於由層狀的液體32覆蓋的狀態。該液體32並非殘留於玻璃板G上的淋洗液20等第一液體流下而成者,而是另外供給至第一乾燥室23的底部23a及第二乾燥室24的底部24a中者。In the bottom 23 a of the first drying chamber 23 and the bottom 24 a of the second drying chamber 24, a liquid 32 (second liquid) for capturing particles is disposed. In the present embodiment, the bottom 23 a of the first drying chamber 23 and the bottom 24 a of the second drying chamber 24 are in a state covered by the layered liquid 32. The liquid 32 is not one obtained by flowing down the first liquid such as the eluent 20 remaining on the glass plate G, but is separately supplied to the bottom 23 a of the first drying chamber 23 and the bottom 24 a of the second drying chamber 24.

於該微粒子捕捉用的液體32中,只要可捕捉微粒子33,則可使用任意的種類的液體,例如可使用離子交換水、蒸餾水、工業用純水等各種純水。或者,為了進一步提升微粒子33的捕捉能力,亦可將界面活性劑添加至液體32中。具體而言,亦可將於所述純水中添加界面活性劑而成者用作液體32。As long as the fine particles 33 can be captured in the fine particle-trapping liquid 32, any kind of liquid can be used, and for example, various kinds of pure water such as ion-exchanged water, distilled water, and industrial pure water can be used. Alternatively, in order to further improve the capturing ability of the microparticles 33, a surfactant may be added to the liquid 32. Specifically, a surfactant obtained by adding a surfactant to the pure water may be used as the liquid 32.

繼而,將使用所述結構的清洗乾燥裝置10的清洗步驟S2與乾燥步驟S3的一例與本發明的作用效果一同進行說明。Next, an example of the washing step S2 and the drying step S3 using the washing and drying device 10 having the above-mentioned structure will be described together with the effects of the present invention.

(S2)清洗步驟
於該步驟中,若於加工步驟S1中實施了規定的加工(端面加工、表面處理等中的至少一者以上)的玻璃板G被搬入位於搬送路徑L的最上游側的清洗乾燥裝置10的第一清洗室15內,則自清洗液供給裝置18、18朝於搬送路徑L上藉由搬送裝置13來搬送的玻璃板G的表面Ga、Ga供給清洗液19。藉此,玻璃板G的表面Ga、Ga變成已由清洗液19潤濕的狀態。而且,將該狀態的玻璃板G搬送至位於比清洗液供給裝置18、18更下游側的一對清洗輥17、17為止,利用清洗輥17、17擦拭玻璃板G的表面Ga、Ga。藉此,擦去附著於表面Ga、Ga上的微粒子33等異物。然後,藉由搬送裝置13而將玻璃板G搬入第二清洗室16內。於第二清洗室16內,自淋洗液供給裝置21朝於搬送路徑L上藉由搬送裝置13來搬送的玻璃板G的表面Ga、Ga供給淋洗液20,而沖走玻璃板G的表面Ga、Ga上的清洗液19與異物。然後,藉由搬送裝置13來將玻璃板G朝第二清洗室16外排出。
(S2) Cleaning step In this step, if a predetermined processing (at least one of end surface processing, surface processing, and the like) is performed in processing step S1, the glass plate G is carried into the most upstream side of the conveyance path L. In the first cleaning chamber 15 of the washing and drying device 10, the cleaning liquid 19 is supplied from the cleaning liquid supply devices 18, 18 toward the surface Ga, Ga of the glass plate G conveyed by the conveying device 13 on the conveying path L. As a result, the surfaces Ga and Ga of the glass plate G are in a state of being wet with the cleaning liquid 19. Then, the glass plate G in this state is transported to a pair of cleaning rollers 17 and 17 located further downstream than the cleaning liquid supply devices 18 and 18, and the surfaces Ga and Ga of the glass plate G are wiped with the cleaning rollers 17 and 17. Thereby, foreign matter such as the fine particles 33 adhering to the surface Ga and Ga is wiped off. Then, the glass plate G is carried into the second cleaning chamber 16 by the carrying device 13. In the second cleaning chamber 16, the eluent supply device 21 supplies the eluent 20 toward the surface Ga, Ga of the glass plate G conveyed by the conveyance device 13 on the conveyance path L, and flushes the glass plate G away. The cleaning liquid 19 on the surface Ga and Ga and foreign matter. Then, the glass plate G is discharged to the outside of the second cleaning chamber 16 by the transfer device 13.

(S3)乾燥步驟
已藉由搬送裝置13而朝第二清洗室16外排出的玻璃板G繼而藉由搬送裝置14而被搬入乾燥處理室12內,準確而言被搬入脫液室22內。而且,於即將被自脫液室22搬入第一乾燥室23內之前,自作為氣體吹送裝置27的一對氣刀28、28朝玻璃板G的表面Ga、Ga吹送氣體26。藉此,吹走殘存於玻璃板G的表面Ga、Ga上的淋洗液20(有時亦為少量的清洗液19)與包含微粒子33的異物。已被吹走的微粒子33朝脫液室22的底部22a、或第一乾燥室23的底部23a沈降。
(S3) The glass sheet G which has been discharged to the outside of the second cleaning chamber 16 by the conveying device 13 in the drying step is then conveyed into the drying processing chamber 12 by the conveying device 14 and accurately into the dehydration chamber 22. Immediately before being carried into the first drying chamber 23 from the dehydration chamber 22, a pair of air knives 28, 28 serving as a gas blowing device 27 blows gas 26 toward the surfaces Ga and Ga of the glass plate G. Thereby, the eluent 20 (sometimes also a small amount of the cleaning liquid 19) remaining on the surface Ga and Ga of the glass plate G and the foreign matter including the fine particles 33 are blown away. The blown-off fine particles 33 settle toward the bottom 22 a of the dehydration chamber 22 or the bottom 23 a of the first drying chamber 23.

以所述方式進行了脫液的玻璃板G繼而於第一乾燥室23內藉由搬送裝置14來搬送,於即將被自第一乾燥室23搬入第二乾燥室24內之前,自作為氣體吹送裝置30的一對氣刀31、31朝玻璃板G的表面Ga、Ga吹送氣體26。藉此,吹走殘存於玻璃板G的表面Ga、Ga上的淋洗液20等與包含微粒子33的異物。已被吹走的微粒子33朝第一乾燥室23的底部23a、或第二乾燥室24的底部24a沈降。如以上般去除淋洗液20等與包含微粒子33的異物,藉此玻璃板G的表面Ga、Ga變成乾燥的狀態。The dewatered glass sheet G is then conveyed by the conveying device 14 in the first drying chamber 23, and is blown as a gas immediately before being conveyed from the first drying chamber 23 into the second drying chamber 24. The pair of air knives 31 and 31 of the apparatus 30 blows gas 26 toward the surfaces Ga and Ga of the glass plate G. Thereby, the eluent 20 and the like remaining on the surface Ga and Ga of the glass plate G and the foreign matter including the fine particles 33 are blown away. The blown-off fine particles 33 settle toward the bottom 23 a of the first drying chamber 23 or the bottom 24 a of the second drying chamber 24. As described above, the foreign matters including the eluent 20 and the fine particles 33 are removed, whereby the surfaces Ga and Ga of the glass plate G are in a dry state.

此處,例如如圖3所示,當於乾燥處理室12的第一乾燥室23內及第二乾燥室24內未配置液體32時,已被供給至玻璃板G上的淋洗液20等的大部分流下至比氣刀28、28更上游側,因此淋洗液20等僅略微流下至比氣刀28、28更下游側。因此,第一乾燥室23的底部23a及第二乾燥室24的底部24a的大部分變成乾燥狀態。Here, for example, as shown in FIG. 3, when the liquid 32 is not disposed in the first drying chamber 23 and the second drying chamber 24 of the drying processing chamber 12, the eluent 20 and the like already supplied to the glass plate G Most of the flow down to the upstream side than the air knives 28, 28, so the eluent 20 and the like only flow down slightly to the downstream side than the air knives 28, 28. Therefore, most of the bottom 23a of the first drying chamber 23 and the bottom 24a of the second drying chamber 24 are in a dry state.

藉由一對氣刀28、28(31、31)而與淋洗液20等一同被吹走的微粒子33沈降,不與液體32接觸而堆積於第一乾燥室23的底部23a上、或第二乾燥室24的底部24a上。另一方面,有時因自一對氣刀28、28(31、31)朝玻璃板G吹送氣體26而於第一乾燥室23內、或第二乾燥室24內產生亂流34。因該亂流34而導致被自玻璃板G的表面Ga、Ga上吹走且位於乾燥狀態的底部23a、底部24a上的微粒子33飛舞,並再次附著於玻璃板G的表面Ga、Ga上。The fine particles 33 blown away with the eluent 20 and the like by a pair of air knives 28, 28 (31, 31) settle, and are deposited on the bottom 23a of the first drying chamber 23 without contacting the liquid 32, or the first On the bottom 24a of the two drying chambers 24. On the other hand, a turbulent flow 34 may be generated in the first drying chamber 23 or the second drying chamber 24 by blowing the gas 26 from the pair of air knives 28, 28 (31, 31) toward the glass plate G. Due to this turbulent flow 34, the fine particles 33 blown away from the surfaces Ga and Ga of the glass plate G and located on the bottom portions 23a and 24a of the dry state fly and attach to the surfaces Ga and Ga of the glass plate G again.

相對於此,於本發明的玻璃板的製造方法中,以於乾燥處理室12的底部配置有液體32的狀態對玻璃板G吹送氣體26(參照圖2)。於此情況下,乾燥處理室12的底部藉由液體32而變成潮濕的狀態。因此,微粒子33於被自玻璃板G上去除並已沈降時,由液體32捕捉。因此,即便於第一乾燥室23或第二乾燥室24內產生了由氣體26的吹送所引起的亂流34(參照圖3),已沈降的微粒子33亦難以乘著亂流34而飛舞。因此,可高效地去除清洗液19及淋洗液20來對玻璃板G進行脫液乾燥,並減少微粒子33的附著,提供表面品質優異的玻璃板G。另外,因將微粒子33捕捉用的液體32配置於乾燥處理室12的底部,故可極力排除玻璃板G與液體32接觸的機會。因此,可儘可能地防止由將液體32配置於乾燥處理室12內所引起的玻璃板G的表面品質的下降。另外,若為該方法,則僅藉由將液體32配置於乾燥處理室12的底部,便可減少微粒子33的附著,因此只要是簡單的設備即可。根據以上所述,根據本發明,可避免成本上升,並提升玻璃板G的表面品質。In contrast, in the method for manufacturing a glass sheet of the present invention, a gas 26 is blown onto the glass sheet G in a state where the liquid 32 is disposed at the bottom of the drying processing chamber 12 (see FIG. 2). In this case, the bottom of the drying processing chamber 12 is made wet by the liquid 32. Therefore, when the fine particles 33 are removed from the glass plate G and settled, they are captured by the liquid 32. Therefore, even if a turbulent flow 34 (see FIG. 3) caused by the blowing of the gas 26 is generated in the first drying chamber 23 or the second drying chamber 24, it is difficult for the fine particles 33 that have settled to fly on the turbulent flow 34. Therefore, the cleaning liquid 19 and the eluent 20 can be efficiently removed to dehydrate and dry the glass plate G, reduce the adhesion of the fine particles 33, and provide the glass plate G with excellent surface quality. In addition, since the liquid 32 for trapping the fine particles 33 is disposed on the bottom of the drying processing chamber 12, the chance of the glass plate G contacting the liquid 32 can be eliminated as much as possible. Therefore, it is possible to prevent the degradation of the surface quality of the glass plate G caused by disposing the liquid 32 in the drying processing chamber 12 as much as possible. In addition, according to this method, it is possible to reduce the adhesion of the fine particles 33 only by arranging the liquid 32 on the bottom of the drying processing chamber 12, so that only a simple device is required. As described above, according to the present invention, it is possible to avoid cost increase and improve the surface quality of the glass plate G.

另外,於本實施方式中,利用淋洗液20等覆蓋脫液室22的底部,並且利用液體32覆蓋第一乾燥室23及第二乾燥室24的底部23a、底部24a(參照圖2)。因此,乾燥處理室12的底部變成由第一液體(清洗液19或淋洗液20)及第二液體32覆蓋的狀態,可無遺漏且確實地捕捉已沈降至乾燥處理室12的底部的微粒子33。根據以上所述,可進一步減少微粒子33朝玻璃板G上的附著,並對該玻璃板G進行脫液乾燥。因此,將無偏差地提升玻璃板G的表面品質。In the present embodiment, the bottom of the dehydration chamber 22 is covered with the eluent 20 and the like, and the bottoms 23 a and 24 a of the first and second drying chambers 23 and 24 are covered with the liquid 32 (see FIG. 2). Therefore, the bottom of the drying processing chamber 12 is covered with the first liquid (the washing liquid 19 or the eluent 20) and the second liquid 32, and the particles that have settled to the bottom of the drying processing chamber 12 can be captured without any omissions and reliably. 33. As described above, the adhesion of the fine particles 33 to the glass plate G can be further reduced, and the glass plate G can be deliquored and dried. Therefore, the surface quality of the glass plate G will be improved without deviation.

(S4)檢查步驟
如所述般實施了清洗乾燥的玻璃板G被朝檢查步驟搬送,藉由規定的檢查裝置來測定、評價殘存於玻璃板G的表面Ga上的異物的有無及數量。於異物的有無及數量的測定中亦包含微粒子33的數量的測定。而且,例如若所測定的微粒子33的數量(每單位面積的數量)為閾值以下,則作為滿足出貨基準者而被朝包裝、出貨步驟搬送。
(S4) Inspection step The glass plate G that has been cleaned and dried as described above is transported toward the inspection step, and the presence and amount of foreign matter remaining on the surface Ga of the glass plate G are measured and evaluated by a predetermined inspection device. The measurement of the number of the fine particles 33 is also included in the measurement of the presence or absence of a foreign substance. Furthermore, for example, if the number of measured fine particles 33 (the number per unit area) is equal to or smaller than a threshold value, they are transported to the packaging and shipping steps as those who satisfy the shipping criteria.

以上,對本發明的第一實施方式進行了說明,但本發明的玻璃板的製造方法當然並不限定於所述例示的形態。該製造方法可於本發明的範圍內採用各種形態。As mentioned above, although the 1st Embodiment of this invention was described, it is needless to say that the manufacturing method of the glass plate of this invention is not limited to the said example. This manufacturing method can adopt various aspects within the scope of the present invention.

圖4是表示本發明的第二實施方式的清洗乾燥裝置40的整體結構的側面圖。該清洗乾燥裝置40與圖2中所示的第一實施方式的不同點在於:於第一乾燥室23及第二乾燥室24中設置有用於更換液體32的結構。具體而言,於第一乾燥室23的側部的下方設置一個或多個用於將液體32供給至底部23a上的供給口41,並且於底部23a中設置一個或多個用於排出液體32的排出口42。而且,排出口42與過濾裝置43連接,已被自排出口42朝第一乾燥室23外排出的液體32由過濾裝置43進行過濾。而且,藉由過濾而去除了微粒子33等異物的液體32如圖5所示,變成藉由泵44來朝供給口41壓送,而再次被供給至底部23a上的結構。於第二乾燥室24中,與第一乾燥室23同樣地,亦設置有包含供給口41、排出口42、過濾裝置43、及泵44的液體32的更換結構。再者,過濾裝置43與泵44的配置亦可調換,換言之,亦可使自泵44中噴出的液體32穿過過濾裝置43後,經由供給口41而供給至底部23a上。FIG. 4 is a side view showing the overall configuration of a washing and drying device 40 according to a second embodiment of the present invention. The cleaning and drying device 40 is different from the first embodiment shown in FIG. 2 in that a structure for replacing the liquid 32 is provided in the first drying chamber 23 and the second drying chamber 24. Specifically, one or more supply ports 41 for supplying the liquid 32 to the bottom 23a are provided below the sides of the first drying chamber 23, and one or more for discharging the liquid 32 are provided in the bottom 23a.的 排 口 42。 The exhaust port 42. The discharge port 42 is connected to the filter device 43, and the liquid 32 that has been discharged from the discharge port 42 to the outside of the first drying chamber 23 is filtered by the filter device 43. In addition, as shown in FIG. 5, the liquid 32 from which foreign matter such as the fine particles 33 is removed by filtration has a structure in which the pump 44 is pressure-fed to the supply port 41 and is again supplied to the bottom portion 23 a. Similarly to the first drying chamber 23, the second drying chamber 24 is also provided with a liquid 32 replacement structure including a supply port 41, a discharge port 42, a filtering device 43, and a pump 44. In addition, the arrangement of the filtering device 43 and the pump 44 may be changed. In other words, the liquid 32 ejected from the pump 44 may be passed through the filtering device 43 and then supplied to the bottom portion 23 a through the supply port 41.

如此,藉由更換被供給至第一乾燥室23及第二乾燥室24的底部的液體32,可將已被捕捉的微粒子33與液體32一同排出。藉此,可將第一乾燥室23及第二乾燥室24的清潔度維持成高的狀態。尤其,如圖5所示,藉由包含供給口41與排出口42、及過濾裝置43與泵44的更換結構,將液體32循環供給至底部23a(24a)上,藉此即便以必要最小限度的設備及液體32的量,亦可將第一乾燥室23及第二乾燥室24的清潔度維持成高的狀態。In this manner, by replacing the liquid 32 supplied to the bottoms of the first drying chamber 23 and the second drying chamber 24, the trapped fine particles 33 can be discharged together with the liquid 32. Thereby, the cleanliness of the first drying chamber 23 and the second drying chamber 24 can be maintained in a high state. In particular, as shown in FIG. 5, the liquid 32 is circulated and supplied to the bottom 23 a (24 a) by the replacement structure including the supply port 41 and the discharge port 42, and the filter device 43 and the pump 44. The amount of equipment and the amount of liquid 32 can also maintain the cleanliness of the first drying chamber 23 and the second drying chamber 24 to a high state.

再者,作為液體32的配置形態,並不限定於圖2等中所例示的配置成層狀的形態。例如,亦可藉由將滴狀的液體32散布於乾燥處理室12的底部而將液體32配置成斑狀。另外,亦可藉由將滴狀的液體32散布於乾燥處理室12的底部而將液體32配置成層狀。就進一步減少微粒子33朝玻璃板G上的附著的觀點而言,較佳為將液體32配置成層狀。另外,液體32的配置區域只要設為乾燥處理室12的底部中的乾燥狀態的區域(淋洗液20等第一液體不流下的區域)即可。It should be noted that the arrangement form of the liquid 32 is not limited to the arrangement form in a layered shape as exemplified in FIG. 2 and the like. For example, the liquid 32 may be arranged in a spot shape by spreading the drop-shaped liquid 32 on the bottom of the drying processing chamber 12. In addition, the liquid 32 may be arranged in a layered form by dispersing the drop-shaped liquid 32 on the bottom of the drying processing chamber 12. From the viewpoint of further reducing the adhesion of the fine particles 33 to the glass plate G, the liquid 32 is preferably arranged in a layered form. The arrangement region of the liquid 32 may be a region in a dry state (a region where the first liquid such as the eluent 20 does not flow down) in the bottom of the drying processing chamber 12.

另外,當利用第一液體及第二液體覆蓋乾燥處理室12的底部時,並不限定於如所述實施方式般的利用淋洗液20等第一液體覆蓋脫液室22的底部22a,利用第二液體32覆蓋第一乾燥室23的底部23a及第二乾燥室24的底部24a的形態。例如,乾燥處理室12的底部的一部分或全部亦可由第一液體與第二液體32的混合液覆蓋。In addition, when the bottom of the drying processing chamber 12 is covered with the first liquid and the second liquid, the bottom 22a of the dehydration chamber 22 is not limited to being covered with the first liquid such as the eluent 20 as described in the above embodiment, and the A form in which the second liquid 32 covers the bottom 23 a of the first drying chamber 23 and the bottom 24 a of the second drying chamber 24. For example, part or all of the bottom of the drying processing chamber 12 may be covered with a mixed liquid of the first liquid and the second liquid 32.

10、40‧‧‧清洗乾燥裝置10.40‧‧‧washing and drying device

11‧‧‧清洗處理室 11‧‧‧Clean treatment room

12‧‧‧乾燥處理室 12‧‧‧ drying treatment room

13、14‧‧‧搬送裝置 13, 14‧‧‧ transport device

15‧‧‧第一清洗室 15‧‧‧The first cleaning room

15a、16a、22a、23a、24a‧‧‧底部 15a, 16a, 22a, 23a, 24a ‧‧‧ bottom

16‧‧‧第二清洗室 16‧‧‧Second cleaning room

17‧‧‧清洗輥 17‧‧‧cleaning roller

18‧‧‧清洗液供給裝置 18‧‧‧ Cleaning liquid supply device

19‧‧‧清洗液(第一液體) 19‧‧‧Cleaning liquid (first liquid)

20‧‧‧淋洗液(洗滌液、第一液體) 20‧‧‧ Eluent (washing liquid, first liquid)

21‧‧‧淋洗液供給裝置 21‧‧‧ Eluent supply device

22‧‧‧脫液室 22‧‧‧ Dehydration chamber

23‧‧‧第一乾燥室 23‧‧‧The first drying room

24‧‧‧第二乾燥室 24‧‧‧Second drying room

25、29‧‧‧隔板 25, 29‧‧‧ partition

26‧‧‧氣體 26‧‧‧Gas

27、30‧‧‧氣體吹送裝置 27, 30‧‧‧gas blowing device

28、31‧‧‧氣刀 28, 31‧‧‧ Air Knife

28a、31a、41‧‧‧供給口 28a, 31a, 41‧‧‧ supply ports

32‧‧‧液體(第二液體) 32‧‧‧ liquid (second liquid)

33‧‧‧微粒子 33‧‧‧ fine particles

34‧‧‧亂流 34‧‧‧ turbulent

42‧‧‧排出口 42‧‧‧Exhaust

43‧‧‧過濾裝置 43‧‧‧filtration device

44‧‧‧泵 44‧‧‧ pump

G‧‧‧玻璃板 G‧‧‧ glass plate

Ga‧‧‧表面 Ga‧‧‧ surface

L‧‧‧搬送路徑 L‧‧‧ transport route

S1~S4‧‧‧步驟 Steps S1 ~ S4‧‧‧‧

圖1是表示本發明的第一實施方式的玻璃板的製造方法的程序的流程圖。FIG. 1 is a flowchart showing a procedure of a method for manufacturing a glass plate according to a first embodiment of the present invention.

圖2是本發明的第一實施方式的玻璃板的清洗乾燥裝置的側面圖。 FIG. 2 is a side view of the glass plate washing and drying apparatus according to the first embodiment of the present invention.

圖3是用於與本發明的比較的玻璃板的清洗乾燥裝置的側面圖。 Fig. 3 is a side view of a washing and drying device for a glass plate for comparison with the present invention.

圖4是本發明的第二實施方式的玻璃板的清洗乾燥裝置的側面圖。 Fig. 4 is a side view of a glass plate washing and drying device according to a second embodiment of the present invention.

圖5是圖4中所示的清洗乾燥裝置的A-A剖面圖。 Fig. 5 is an A-A sectional view of the washing and drying device shown in Fig. 4.

Claims (4)

一種玻璃板的製造方法,其包括: 清洗步驟,將第一液體供給至玻璃板上,對所述玻璃板進行清洗;以及 乾燥步驟,對被搬入乾燥處理室內,且於所述乾燥處理室內的規定的搬送路徑上被搬送的所述玻璃板吹送氣體,而自所述玻璃板上去除所述第一液體;且 以於所述乾燥處理室的底部配置有第二液體的狀態,對所述玻璃板吹送所述氣體。A method for manufacturing a glass plate includes: A washing step of supplying the first liquid to the glass plate to clean the glass plate; and A drying step of blowing a gas on the glass plate carried into the drying processing chamber and carried on a predetermined transportation path in the drying processing chamber to remove the first liquid from the glass plate; and In a state where a second liquid is disposed at the bottom of the drying processing chamber, the gas is blown to the glass plate. 如申請專利範圍第1項所述的玻璃板的製造方法,其中於所述乾燥處理室內的底部由所述第一液體及所述第二液體覆蓋的狀態下,對所述玻璃板吹送所述氣體。The method for manufacturing a glass plate according to item 1 of the scope of patent application, wherein the glass plate is blown with the first liquid and the second liquid in a state where the bottom of the drying processing chamber is covered with the first liquid and the second liquid. gas. 如申請專利範圍第1項或第2項所述的玻璃板的製造方法,其中所述第二液體為純水。The method for manufacturing a glass plate according to item 1 or item 2 of the scope of patent application, wherein the second liquid is pure water. 如申請專利範圍第1項至第3項中任一項所述的玻璃板的製造方法,其中藉由朝所述乾燥處理室內供給所述第二液體及朝所述乾燥處理室外排出所述第二液體,而更換配置於所述底部的所述第二液體。The method for manufacturing a glass plate according to any one of claims 1 to 3, wherein the second liquid is supplied to the drying processing chamber and the first liquid is discharged to the drying processing chamber. Two liquids, and the second liquid disposed on the bottom is replaced.
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