TW201918803A - 光阻顯影劑 - Google Patents
光阻顯影劑 Download PDFInfo
- Publication number
- TW201918803A TW201918803A TW107135337A TW107135337A TW201918803A TW 201918803 A TW201918803 A TW 201918803A TW 107135337 A TW107135337 A TW 107135337A TW 107135337 A TW107135337 A TW 107135337A TW 201918803 A TW201918803 A TW 201918803A
- Authority
- TW
- Taiwan
- Prior art keywords
- photoresist
- acid
- group
- photoresist layer
- developer
- Prior art date
Links
- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 227
- 239000002253 acid Substances 0.000 claims abstract description 41
- 239000002904 solvent Substances 0.000 claims abstract description 40
- 238000010494 dissociation reaction Methods 0.000 claims abstract description 12
- 230000005593 dissociations Effects 0.000 claims abstract description 12
- 239000013522 chelant Substances 0.000 abstract description 11
- -1 InAlAs Inorganic materials 0.000 description 91
- 230000005855 radiation Effects 0.000 description 63
- 238000000034 method Methods 0.000 description 49
- 239000000758 substrate Substances 0.000 description 49
- 239000000463 material Substances 0.000 description 33
- 230000008569 process Effects 0.000 description 29
- 239000003431 cross linking reagent Substances 0.000 description 21
- 239000002952 polymeric resin Substances 0.000 description 20
- 229920003002 synthetic resin Polymers 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 19
- 150000001875 compounds Chemical class 0.000 description 19
- 150000002430 hydrocarbons Chemical group 0.000 description 18
- 238000004132 cross linking Methods 0.000 description 17
- 239000002585 base Substances 0.000 description 16
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 16
- 229910052757 nitrogen Inorganic materials 0.000 description 16
- 229920000642 polymer Polymers 0.000 description 15
- 150000002148 esters Chemical class 0.000 description 13
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 12
- 239000004065 semiconductor Substances 0.000 description 12
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 10
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- 239000007822 coupling agent Substances 0.000 description 10
- 238000011161 development Methods 0.000 description 10
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 10
- 239000004094 surface-active agent Substances 0.000 description 10
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 7
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 7
- 239000000654 additive Substances 0.000 description 7
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 7
- 239000000872 buffer Substances 0.000 description 7
- 125000002843 carboxylic acid group Chemical group 0.000 description 7
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 6
- 239000002202 Polyethylene glycol Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 150000007513 acids Chemical class 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 239000000539 dimer Substances 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 6
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 6
- 229920001223 polyethylene glycol Polymers 0.000 description 6
- 150000003254 radicals Chemical class 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 5
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000001465 metallisation Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 239000004014 plasticizer Substances 0.000 description 5
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 206010073306 Exposure to radiation Diseases 0.000 description 4
- ZRALSGWEFCBTJO-UHFFFAOYSA-N Guanidine Chemical compound NC(N)=N ZRALSGWEFCBTJO-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Natural products OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 150000005215 alkyl ethers Chemical class 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Substances C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000003086 colorant Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 150000005690 diesters Chemical class 0.000 description 4
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 4
- 238000004090 dissolution Methods 0.000 description 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 4
- 238000001459 lithography Methods 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- YFSUTJLHUFNCNZ-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluorooctane-1-sulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YFSUTJLHUFNCNZ-UHFFFAOYSA-M 0.000 description 3
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 3
- IEPRKVQEAMIZSS-UHFFFAOYSA-N Di-Et ester-Fumaric acid Natural products CCOC(=O)C=CC(=O)OCC IEPRKVQEAMIZSS-UHFFFAOYSA-N 0.000 description 3
- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 3
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical group CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 229940022663 acetate Drugs 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 125000003158 alcohol group Chemical group 0.000 description 3
- 150000001412 amines Chemical group 0.000 description 3
- 239000003945 anionic surfactant Substances 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- 229940024874 benzophenone Drugs 0.000 description 3
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 3
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052732 germanium Inorganic materials 0.000 description 3
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical group CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 125000000686 lactone group Chemical group 0.000 description 3
- 235000011090 malic acid Nutrition 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000002950 monocyclic group Chemical group 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000002105 nanoparticle Substances 0.000 description 3
- 229910017464 nitrogen compound Inorganic materials 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 3
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 3
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 3
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 3
- LABTWGUMFABVFG-ONEGZZNKSA-N (3E)-pent-3-en-2-one Chemical compound C\C=C\C(C)=O LABTWGUMFABVFG-ONEGZZNKSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 2
- FUWDFGKRNIDKAE-UHFFFAOYSA-N 1-butoxypropan-2-yl acetate Chemical compound CCCCOCC(C)OC(C)=O FUWDFGKRNIDKAE-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- VBICKXHEKHSIBG-UHFFFAOYSA-N 1-monostearoylglycerol Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 2
- LABTWGUMFABVFG-UHFFFAOYSA-N 1-propenyl methyl ketone Natural products CC=CC(C)=O LABTWGUMFABVFG-UHFFFAOYSA-N 0.000 description 2
- JHGGYGMFCRSWIZ-UHFFFAOYSA-N 2,2-dichloro-1-(4-phenoxyphenyl)ethanone Chemical compound C1=CC(C(=O)C(Cl)Cl)=CC=C1OC1=CC=CC=C1 JHGGYGMFCRSWIZ-UHFFFAOYSA-N 0.000 description 2
- HXVNBWAKAOHACI-UHFFFAOYSA-N 2,4-dimethyl-3-pentanone Chemical compound CC(C)C(=O)C(C)C HXVNBWAKAOHACI-UHFFFAOYSA-N 0.000 description 2
- OJVAMHKKJGICOG-UHFFFAOYSA-N 2,5-hexanedione Chemical compound CC(=O)CCC(C)=O OJVAMHKKJGICOG-UHFFFAOYSA-N 0.000 description 2
- CTWRMVAKUSJNBK-UHFFFAOYSA-N 2-(2,4-dimethoxyphenyl)-4,5-diphenyl-1h-imidazole Chemical class COC1=CC(OC)=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 CTWRMVAKUSJNBK-UHFFFAOYSA-N 0.000 description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
- XIOGJAPOAUEYJO-UHFFFAOYSA-N 2-(2-methoxyphenyl)-4,5-diphenyl-1h-imidazole Chemical class COC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 XIOGJAPOAUEYJO-UHFFFAOYSA-N 0.000 description 2
- SNFCQJAJPFWBDJ-UHFFFAOYSA-N 2-(4-methoxyphenyl)-4,5-diphenyl-1h-imidazole Chemical class C1=CC(OC)=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 SNFCQJAJPFWBDJ-UHFFFAOYSA-N 0.000 description 2
- GZYZPHPDKCTFFH-UHFFFAOYSA-N 2-(4-methylsulfanylphenyl)-4,5-diphenyl-1h-imidazole Chemical class C1=CC(SC)=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 GZYZPHPDKCTFFH-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 2
- VKZRWSNIWNFCIQ-UHFFFAOYSA-N 2-[2-(1,2-dicarboxyethylamino)ethylamino]butanedioic acid Chemical compound OC(=O)CC(C(O)=O)NCCNC(C(O)=O)CC(O)=O VKZRWSNIWNFCIQ-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- ZIXLDMFVRPABBX-UHFFFAOYSA-N 2-methylcyclopentan-1-one Chemical compound CC1CCCC1=O ZIXLDMFVRPABBX-UHFFFAOYSA-N 0.000 description 2
- ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 2-octanone Chemical compound CCCCCCC(C)=O ZPVFWPFBNIEHGJ-UHFFFAOYSA-N 0.000 description 2
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 2
- UMCMPZBLKLEWAF-BCTGSCMUSA-N 3-[(3-cholamidopropyl)dimethylammonio]propane-1-sulfonate Chemical compound C([C@H]1C[C@H]2O)[C@H](O)CC[C@]1(C)[C@@H]1[C@@H]2[C@@H]2CC[C@H]([C@@H](CCC(=O)NCCC[N+](C)(C)CCCS([O-])(=O)=O)C)[C@@]2(C)[C@@H](O)C1 UMCMPZBLKLEWAF-BCTGSCMUSA-N 0.000 description 2
- XJLDYKIEURAVBW-UHFFFAOYSA-N 3-decanone Chemical compound CCCCCCCC(=O)CC XJLDYKIEURAVBW-UHFFFAOYSA-N 0.000 description 2
- UJBOOUHRTQVGRU-UHFFFAOYSA-N 3-methylcyclohexan-1-one Chemical compound CC1CCCC(=O)C1 UJBOOUHRTQVGRU-UHFFFAOYSA-N 0.000 description 2
- RHLVCLIPMVJYKS-UHFFFAOYSA-N 3-octanone Chemical compound CCCCCC(=O)CC RHLVCLIPMVJYKS-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- HCFAJYNVAYBARA-UHFFFAOYSA-N 4-heptanone Chemical compound CCCC(=O)CCC HCFAJYNVAYBARA-UHFFFAOYSA-N 0.000 description 2
- FFWSICBKRCICMR-UHFFFAOYSA-N 5-methyl-2-hexanone Chemical compound CC(C)CCC(C)=O FFWSICBKRCICMR-UHFFFAOYSA-N 0.000 description 2
- XZIIFPSPUDAGJM-UHFFFAOYSA-N 6-chloro-2-n,2-n-diethylpyrimidine-2,4-diamine Chemical compound CCN(CC)C1=NC(N)=CC(Cl)=N1 XZIIFPSPUDAGJM-UHFFFAOYSA-N 0.000 description 2
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Natural products CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- IYTXKIXETAELAV-UHFFFAOYSA-N Aethyl-n-hexyl-keton Natural products CCCCCCC(=O)CC IYTXKIXETAELAV-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- JYFHYPJRHGVZDY-UHFFFAOYSA-N Dibutyl phosphate Chemical class CCCCOP(O)(=O)OCCCC JYFHYPJRHGVZDY-UHFFFAOYSA-N 0.000 description 2
- ASMQGLCHMVWBQR-UHFFFAOYSA-N Diphenyl phosphate Chemical class C=1C=CC=CC=1OP(=O)(O)OC1=CC=CC=C1 ASMQGLCHMVWBQR-UHFFFAOYSA-N 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- HYTRYEXINDDXJK-UHFFFAOYSA-N Ethyl isopropyl ketone Chemical compound CCC(=O)C(C)C HYTRYEXINDDXJK-UHFFFAOYSA-N 0.000 description 2
- FPVVYTCTZKCSOJ-UHFFFAOYSA-N Ethylene glycol distearate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCCOC(=O)CCCCCCCCCCCCCCCCC FPVVYTCTZKCSOJ-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- 229910005542 GaSb Inorganic materials 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- CHJJGSNFBQVOTG-UHFFFAOYSA-N N-methyl-guanidine Natural products CNC(N)=N CHJJGSNFBQVOTG-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 229920001213 Polysorbate 20 Polymers 0.000 description 2
- 229920001214 Polysorbate 60 Polymers 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- HVUMOYIDDBPOLL-XWVZOOPGSA-N Sorbitan monostearate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O HVUMOYIDDBPOLL-XWVZOOPGSA-N 0.000 description 2
- 239000004147 Sorbitan trioleate Substances 0.000 description 2
- PRXRUNOAOLTIEF-ADSICKODSA-N Sorbitan trioleate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OC[C@@H](OC(=O)CCCCCCC\C=C/CCCCCCCC)[C@H]1OC[C@H](O)[C@H]1OC(=O)CCCCCCC\C=C/CCCCCCCC PRXRUNOAOLTIEF-ADSICKODSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- IJCWFDPJFXGQBN-RYNSOKOISA-N [(2R)-2-[(2R,3R,4S)-4-hydroxy-3-octadecanoyloxyoxolan-2-yl]-2-octadecanoyloxyethyl] octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OC[C@@H](OC(=O)CCCCCCCCCCCCCCCCC)[C@H]1OC[C@H](O)[C@H]1OC(=O)CCCCCCCCCCCCCCCCC IJCWFDPJFXGQBN-RYNSOKOISA-N 0.000 description 2
- ARNIZPSLPHFDED-UHFFFAOYSA-N [4-(dimethylamino)phenyl]-(4-methoxyphenyl)methanone Chemical compound C1=CC(OC)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 ARNIZPSLPHFDED-UHFFFAOYSA-N 0.000 description 2
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 2
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical compound C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 150000008052 alkyl sulfonates Chemical class 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- BTBJBAZGXNKLQC-UHFFFAOYSA-N ammonium lauryl sulfate Chemical compound [NH4+].CCCCCCCCCCCCOS([O-])(=O)=O BTBJBAZGXNKLQC-UHFFFAOYSA-N 0.000 description 2
- 229940063953 ammonium lauryl sulfate Drugs 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 150000007942 carboxylates Chemical class 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000003093 cationic surfactant Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 2
- 229920006037 cross link polymer Polymers 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 150000004292 cyclic ethers Chemical class 0.000 description 2
- CGZZMOTZOONQIA-UHFFFAOYSA-N cycloheptanone Chemical compound O=C1CCCCCC1 CGZZMOTZOONQIA-UHFFFAOYSA-N 0.000 description 2
- ZAJNGDIORYACQU-UHFFFAOYSA-N decan-2-one Chemical compound CCCCCCCCC(C)=O ZAJNGDIORYACQU-UHFFFAOYSA-N 0.000 description 2
- KXGVEGMKQFWNSR-UHFFFAOYSA-N deoxycholic acid Natural products C1CC2CC(O)CCC2(C)C2C1C1CCC(C(CCC(O)=O)C)C1(C)C(O)C2 KXGVEGMKQFWNSR-UHFFFAOYSA-N 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000012955 diaryliodonium Substances 0.000 description 2
- 125000005520 diaryliodonium group Chemical group 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 2
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- SWSQBOPZIKWTGO-UHFFFAOYSA-N dimethylaminoamidine Natural products CN(C)C(N)=N SWSQBOPZIKWTGO-UHFFFAOYSA-N 0.000 description 2
- 235000019329 dioctyl sodium sulphosuccinate Nutrition 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 229940093499 ethyl acetate Drugs 0.000 description 2
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 2
- DXVYLFHTJZWTRF-UHFFFAOYSA-N ethyl iso-butyl ketone Natural products CCC(=O)CC(C)C DXVYLFHTJZWTRF-UHFFFAOYSA-N 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- JBFHTYHTHYHCDJ-UHFFFAOYSA-N gamma-caprolactone Chemical compound CCC1CCC(=O)O1 JBFHTYHTHYHCDJ-UHFFFAOYSA-N 0.000 description 2
- IPBFYZQJXZJBFQ-UHFFFAOYSA-N gamma-octalactone Chemical compound CCCCC1CCC(=O)O1 IPBFYZQJXZJBFQ-UHFFFAOYSA-N 0.000 description 2
- 229940100608 glycol distearate Drugs 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 229910000449 hafnium oxide Inorganic materials 0.000 description 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000004679 hydroxides Chemical class 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 2
- WVDDGKGOMKODPV-UHFFFAOYSA-N hydroxymethyl benzene Natural products OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 2
- 125000005462 imide group Chemical group 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000001630 malic acid Substances 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 2
- JFTBTTPUYRGXDG-UHFFFAOYSA-N methyl violet Chemical compound Cl.C1=CC(=NC)C=CC1=C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 JFTBTTPUYRGXDG-UHFFFAOYSA-N 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- OOHAUGDGCWURIT-UHFFFAOYSA-N n,n-dipentylpentan-1-amine Chemical compound CCCCCN(CCCCC)CCCCC OOHAUGDGCWURIT-UHFFFAOYSA-N 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- YRVUCYWJQFRCOB-UHFFFAOYSA-N n-butylprop-2-enamide Chemical compound CCCCNC(=O)C=C YRVUCYWJQFRCOB-UHFFFAOYSA-N 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- ZWRUINPWMLAQRD-UHFFFAOYSA-N nonan-1-ol Chemical compound CCCCCCCCCO ZWRUINPWMLAQRD-UHFFFAOYSA-N 0.000 description 2
- VKCYHJWLYTUGCC-UHFFFAOYSA-N nonan-2-one Chemical compound CCCCCCCC(C)=O VKCYHJWLYTUGCC-UHFFFAOYSA-N 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- 150000002903 organophosphorus compounds Chemical class 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229960003330 pentetic acid Drugs 0.000 description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 2
- ULSIYEODSMZIPX-UHFFFAOYSA-N phenylethanolamine Chemical compound NCC(O)C1=CC=CC=C1 ULSIYEODSMZIPX-UHFFFAOYSA-N 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 235000010486 polyoxyethylene sorbitan monolaurate Nutrition 0.000 description 2
- 239000000256 polyoxyethylene sorbitan monolaurate Substances 0.000 description 2
- 235000010989 polyoxyethylene sorbitan monostearate Nutrition 0.000 description 2
- 239000001818 polyoxyethylene sorbitan monostearate Substances 0.000 description 2
- 235000010988 polyoxyethylene sorbitan tristearate Nutrition 0.000 description 2
- 239000001816 polyoxyethylene sorbitan tristearate Substances 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 229940090181 propyl acetate Drugs 0.000 description 2
- 229940079877 pyrogallol Drugs 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229940035044 sorbitan monolaurate Drugs 0.000 description 2
- 235000011076 sorbitan monostearate Nutrition 0.000 description 2
- 239000001587 sorbitan monostearate Substances 0.000 description 2
- 229940035048 sorbitan monostearate Drugs 0.000 description 2
- 235000019337 sorbitan trioleate Nutrition 0.000 description 2
- 229960000391 sorbitan trioleate Drugs 0.000 description 2
- 235000011078 sorbitan tristearate Nutrition 0.000 description 2
- 239000001589 sorbitan tristearate Substances 0.000 description 2
- 229960004129 sorbitan tristearate Drugs 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- 229940124530 sulfonamide Drugs 0.000 description 2
- 150000003456 sulfonamides Chemical class 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical class NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- URAYPUMNDPQOKB-UHFFFAOYSA-N triacetin Chemical compound CC(=O)OCC(OC(C)=O)COC(C)=O URAYPUMNDPQOKB-UHFFFAOYSA-N 0.000 description 2
- WTVXIBRMWGUIMI-UHFFFAOYSA-N trifluoro($l^{1}-oxidanylsulfonyl)methane Chemical group [O]S(=O)(=O)C(F)(F)F WTVXIBRMWGUIMI-UHFFFAOYSA-N 0.000 description 2
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- LLWJPGAKXJBKKA-UHFFFAOYSA-N victoria blue B Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)=C(C=C1)C2=CC=CC=C2C1=[NH+]C1=CC=CC=C1 LLWJPGAKXJBKKA-UHFFFAOYSA-N 0.000 description 2
- 229920001567 vinyl ester resin Polymers 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- LQTIAFFVNAYEGV-UHFFFAOYSA-N (2,4-dihydroxyphenyl)-phenylmethanone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=CC=C1.OC1=CC(O)=CC=C1C(=O)C1=CC=CC=C1 LQTIAFFVNAYEGV-UHFFFAOYSA-N 0.000 description 1
- YSWBUABBMRVQAC-UHFFFAOYSA-N (2-nitrophenyl)methanesulfonic acid Chemical compound OS(=O)(=O)CC1=CC=CC=C1[N+]([O-])=O YSWBUABBMRVQAC-UHFFFAOYSA-N 0.000 description 1
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical compound OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- GGJSOZXRIXSEFY-UHFFFAOYSA-N (3-acetyloxy-2-hydroxypropyl) 2-methylprop-2-enoate Chemical compound CC(=O)OCC(O)COC(=O)C(C)=C GGJSOZXRIXSEFY-UHFFFAOYSA-N 0.000 description 1
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical compound CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 description 1
- BHQCQFFYRZLCQQ-UHFFFAOYSA-N (3alpha,5alpha,7alpha,12alpha)-3,7,12-trihydroxy-cholan-24-oic acid Natural products OC1CC2CC(O)CCC2(C)C2C1C1CCC(C(CCC(O)=O)C)C1(C)C(O)C2 BHQCQFFYRZLCQQ-UHFFFAOYSA-N 0.000 description 1
- YEQCSHHDUXNEQJ-UHFFFAOYSA-N (4-amino-2-methylphenyl)-(4-aminophenyl)methanone Chemical compound CC1=CC(N)=CC=C1C(=O)C1=CC=C(N)C=C1 YEQCSHHDUXNEQJ-UHFFFAOYSA-N 0.000 description 1
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 description 1
- ULPMRIXXHGUZFA-UHFFFAOYSA-N (R)-4-Methyl-3-hexanone Natural products CCC(C)C(=O)CC ULPMRIXXHGUZFA-UHFFFAOYSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- MPUZDPBYKVEHNH-BQYQJAHWSA-N (e)-2-methyl-3-phenylprop-2-enamide Chemical compound NC(=O)C(/C)=C/C1=CC=CC=C1 MPUZDPBYKVEHNH-BQYQJAHWSA-N 0.000 description 1
- FFJCNSLCJOQHKM-CLFAGFIQSA-N (z)-1-[(z)-octadec-9-enoxy]octadec-9-ene Chemical compound CCCCCCCC\C=C/CCCCCCCCOCCCCCCCC\C=C/CCCCCCCC FFJCNSLCJOQHKM-CLFAGFIQSA-N 0.000 description 1
- QYGBYAQGBVHMDD-XQRVVYSFSA-N (z)-2-cyano-3-thiophen-2-ylprop-2-enoic acid Chemical compound OC(=O)C(\C#N)=C/C1=CC=CS1 QYGBYAQGBVHMDD-XQRVVYSFSA-N 0.000 description 1
- BYEAHWXPCBROCE-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-ol Chemical group FC(F)(F)C(O)C(F)(F)F BYEAHWXPCBROCE-UHFFFAOYSA-N 0.000 description 1
- JGTNAGYHADQMCM-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F JGTNAGYHADQMCM-UHFFFAOYSA-M 0.000 description 1
- ACEKLXZRZOWKRY-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,5,5,5-undecafluoropentane-1-sulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ACEKLXZRZOWKRY-UHFFFAOYSA-M 0.000 description 1
- KZWJWYFPLXRYIL-UHFFFAOYSA-N 1,1,2,2-tetrafluoroethanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)F KZWJWYFPLXRYIL-UHFFFAOYSA-N 0.000 description 1
- MWSOSEYIOCGKDW-UHFFFAOYSA-N 1,1,2-tris(chloranyl)ethene Chemical compound ClC=C(Cl)Cl.ClC=C(Cl)Cl MWSOSEYIOCGKDW-UHFFFAOYSA-N 0.000 description 1
- ZORQXIQZAOLNGE-UHFFFAOYSA-N 1,1-difluorocyclohexane Chemical compound FC1(F)CCCCC1 ZORQXIQZAOLNGE-UHFFFAOYSA-N 0.000 description 1
- XSFVQEHUVOVFOW-UHFFFAOYSA-N 1,10-phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1.C1=CN=C2C3=NC=CC=C3C=CC2=C1 XSFVQEHUVOVFOW-UHFFFAOYSA-N 0.000 description 1
- ZZXUZKXVROWEIF-UHFFFAOYSA-N 1,2-butylene carbonate Chemical compound CCC1COC(=O)O1 ZZXUZKXVROWEIF-UHFFFAOYSA-N 0.000 description 1
- GJZFGDYLJLCGHT-UHFFFAOYSA-N 1,2-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(CC)C(CC)=CC=C3SC2=C1 GJZFGDYLJLCGHT-UHFFFAOYSA-N 0.000 description 1
- QWUWMCYKGHVNAV-UHFFFAOYSA-N 1,2-dihydrostilbene Chemical group C=1C=CC=CC=1CCC1=CC=CC=C1 QWUWMCYKGHVNAV-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical class C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 1
- VAYTZRYEBVHVLE-UHFFFAOYSA-N 1,3-dioxol-2-one Chemical compound O=C1OC=CO1 VAYTZRYEBVHVLE-UHFFFAOYSA-N 0.000 description 1
- QPIFRSNWFVGRBE-UHFFFAOYSA-N 1,4,2,3,5,6-oxathiatetrazine 4,4-dioxide Chemical compound O1N=NS(=O)(=O)N=N1 QPIFRSNWFVGRBE-UHFFFAOYSA-N 0.000 description 1
- WGYZMNBUZFHYRX-UHFFFAOYSA-N 1-(1-methoxypropan-2-yloxy)propan-2-ol Chemical compound COCC(C)OCC(C)O WGYZMNBUZFHYRX-UHFFFAOYSA-N 0.000 description 1
- LMGYOBQJBQAZKC-UHFFFAOYSA-N 1-(2-ethylphenyl)-2-hydroxy-2-phenylethanone Chemical compound CCC1=CC=CC=C1C(=O)C(O)C1=CC=CC=C1 LMGYOBQJBQAZKC-UHFFFAOYSA-N 0.000 description 1
- ODCMOZLVFHHLMY-UHFFFAOYSA-N 1-(2-hydroxyethoxy)hexan-2-ol Chemical compound CCCCC(O)COCCO ODCMOZLVFHHLMY-UHFFFAOYSA-N 0.000 description 1
- HXKKHQJGJAFBHI-UHFFFAOYSA-N 1-aminopropan-2-ol Chemical compound CC(O)CN HXKKHQJGJAFBHI-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- VSTXCZGEEVFJES-UHFFFAOYSA-N 1-cycloundecyl-1,5-diazacycloundec-5-ene Chemical compound C1CCCCCC(CCCC1)N1CCCCCC=NCCC1 VSTXCZGEEVFJES-UHFFFAOYSA-N 0.000 description 1
- GXZPMXGRNUXGHN-UHFFFAOYSA-N 1-ethenoxy-2-methoxyethane Chemical compound COCCOC=C GXZPMXGRNUXGHN-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- ODDDCGGSPAPBOS-UHFFFAOYSA-N 1-ethoxypropan-2-yl propanoate Chemical compound CCOCC(C)OC(=O)CC ODDDCGGSPAPBOS-UHFFFAOYSA-N 0.000 description 1
- FDCJDKXCCYFOCV-UHFFFAOYSA-N 1-hexadecoxyhexadecane Chemical compound CCCCCCCCCCCCCCCCOCCCCCCCCCCCCCCCC FDCJDKXCCYFOCV-UHFFFAOYSA-N 0.000 description 1
- BPIUIOXAFBGMNB-UHFFFAOYSA-N 1-hexoxyhexane Chemical compound CCCCCCOCCCCCC BPIUIOXAFBGMNB-UHFFFAOYSA-N 0.000 description 1
- ARIWANIATODDMH-AWEZNQCLSA-N 1-lauroyl-sn-glycerol Chemical compound CCCCCCCCCCCC(=O)OC[C@@H](O)CO ARIWANIATODDMH-AWEZNQCLSA-N 0.000 description 1
- DOVZUKKPYKRVIK-UHFFFAOYSA-N 1-methoxypropan-2-yl propanoate Chemical compound CCC(=O)OC(C)COC DOVZUKKPYKRVIK-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- SNGREZUHAYWORS-UHFFFAOYSA-M 2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-pentadecafluorooctanoate Chemical compound [O-]C(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F SNGREZUHAYWORS-UHFFFAOYSA-M 0.000 description 1
- CERJZAHSUZVMCH-UHFFFAOYSA-N 2,2-dichloro-1-phenylethanone Chemical compound ClC(Cl)C(=O)C1=CC=CC=C1 CERJZAHSUZVMCH-UHFFFAOYSA-N 0.000 description 1
- CISIJYCKDJSTMX-UHFFFAOYSA-N 2,2-dichloroethenylbenzene Chemical compound ClC(Cl)=CC1=CC=CC=C1 CISIJYCKDJSTMX-UHFFFAOYSA-N 0.000 description 1
- NTAAHERWLJLTQL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1.CCOC(OCC)C(=O)C1=CC=CC=C1 NTAAHERWLJLTQL-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- KNSPBSQWRKKAPI-UHFFFAOYSA-N 2,2-dimethylcyclohexan-1-one Chemical compound CC1(C)CCCCC1=O KNSPBSQWRKKAPI-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- QNWWDWPLITVMIP-UHFFFAOYSA-N 2,5,7-trimethyloctan-4-one Chemical compound CC(C)CC(C)C(=O)CC(C)C QNWWDWPLITVMIP-UHFFFAOYSA-N 0.000 description 1
- MDKSQNHUHMMKPP-UHFFFAOYSA-N 2,5-bis(4-methoxyphenyl)-4-phenyl-1h-imidazole Chemical class C1=CC(OC)=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC(OC)=CC=2)N1 MDKSQNHUHMMKPP-UHFFFAOYSA-N 0.000 description 1
- AILVYPLQKCQNJC-UHFFFAOYSA-N 2,6-dimethylcyclohexan-1-one Chemical compound CC1CCCC(C)C1=O AILVYPLQKCQNJC-UHFFFAOYSA-N 0.000 description 1
- ACUGAGLDFIVSBR-UHFFFAOYSA-N 2,6-dimethylheptan-4-one Chemical compound CC(C)CC(=O)CC(C)C.CC(C)CC(=O)CC(C)C ACUGAGLDFIVSBR-UHFFFAOYSA-N 0.000 description 1
- NSWNXQGJAPQOID-UHFFFAOYSA-N 2-(2-chlorophenyl)-4,5-diphenyl-1h-imidazole Chemical class ClC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 NSWNXQGJAPQOID-UHFFFAOYSA-N 0.000 description 1
- UIHRWPYOTGCOJP-UHFFFAOYSA-N 2-(2-fluorophenyl)-4,5-diphenyl-1h-imidazole Chemical class FC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 UIHRWPYOTGCOJP-UHFFFAOYSA-N 0.000 description 1
- XXXFZKQPYACQLD-UHFFFAOYSA-N 2-(2-hydroxyethoxy)ethyl acetate Chemical compound CC(=O)OCCOCCO XXXFZKQPYACQLD-UHFFFAOYSA-N 0.000 description 1
- DAVVKEZTUOGEAK-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl 2-methylprop-2-enoate Chemical compound COCCOCCOC(=O)C(C)=C DAVVKEZTUOGEAK-UHFFFAOYSA-N 0.000 description 1
- HZMXJTJBSWOCQB-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl prop-2-enoate Chemical compound COCCOCCOC(=O)C=C HZMXJTJBSWOCQB-UHFFFAOYSA-N 0.000 description 1
- RHAXDUJFRIRFLY-UHFFFAOYSA-N 2-(3-methoxyphenyl)-1h-imidazole Chemical class COC1=CC=CC(C=2NC=CN=2)=C1 RHAXDUJFRIRFLY-UHFFFAOYSA-N 0.000 description 1
- XODSNUDSXHZKJJ-UHFFFAOYSA-N 2-(ethoxymethyl)butanoic acid;ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC.CCOCC(CC)C(O)=O XODSNUDSXHZKJJ-UHFFFAOYSA-N 0.000 description 1
- MIJDSYMOBYNHOT-UHFFFAOYSA-N 2-(ethylamino)ethanol Chemical compound CCNCCO MIJDSYMOBYNHOT-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- YJGHMLJGPSVSLF-UHFFFAOYSA-N 2-[2-(2-octanoyloxyethoxy)ethoxy]ethyl octanoate Chemical compound CCCCCCCC(=O)OCCOCCOCCOC(=O)CCCCCCC YJGHMLJGPSVSLF-UHFFFAOYSA-N 0.000 description 1
- YLYPIBBGWLKELC-RMKNXTFCSA-N 2-[2-[(e)-2-[4-(dimethylamino)phenyl]ethenyl]-6-methylpyran-4-ylidene]propanedinitrile Chemical compound C1=CC(N(C)C)=CC=C1\C=C\C1=CC(=C(C#N)C#N)C=C(C)O1 YLYPIBBGWLKELC-RMKNXTFCSA-N 0.000 description 1
- QAXPOSPGRHYIHE-UHFFFAOYSA-N 2-[2-[2-[2-(2-decoxyethoxy)ethoxy]ethoxy]ethoxy]ethanol Chemical compound CCCCCCCCCCOCCOCCOCCOCCOCCO QAXPOSPGRHYIHE-UHFFFAOYSA-N 0.000 description 1
- UJMHIOBAHVUDGS-UHFFFAOYSA-N 2-[2-[2-[2-[2-[2-[2-(2-decoxyethoxy)ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethanol Chemical compound CCCCCCCCCCOCCOCCOCCOCCOCCOCCOCCOCCO UJMHIOBAHVUDGS-UHFFFAOYSA-N 0.000 description 1
- ZTJNPDLOIVDEEL-UHFFFAOYSA-N 2-acetyloxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOC(C)=O ZTJNPDLOIVDEEL-UHFFFAOYSA-N 0.000 description 1
- UFIOPCXETLAGLR-UHFFFAOYSA-N 2-acetyloxyethyl prop-2-enoate Chemical compound CC(=O)OCCOC(=O)C=C UFIOPCXETLAGLR-UHFFFAOYSA-N 0.000 description 1
- VXEQGQXRKQSAMW-UHFFFAOYSA-N 2-amino-2-methylpropan-1-ol Chemical compound CC(C)(N)CO.CC(C)(N)CO VXEQGQXRKQSAMW-UHFFFAOYSA-N 0.000 description 1
- MWGATWIBSKHFMR-UHFFFAOYSA-N 2-anilinoethanol Chemical compound OCCNC1=CC=CC=C1 MWGATWIBSKHFMR-UHFFFAOYSA-N 0.000 description 1
- ICGLGDINCXDWJB-UHFFFAOYSA-N 2-benzylprop-2-enamide Chemical compound NC(=O)C(=C)CC1=CC=CC=C1 ICGLGDINCXDWJB-UHFFFAOYSA-N 0.000 description 1
- DZZAHLOABNWIFA-UHFFFAOYSA-N 2-butoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCCCC)C(=O)C1=CC=CC=C1 DZZAHLOABNWIFA-UHFFFAOYSA-N 0.000 description 1
- HXLLCROMVONRRO-UHFFFAOYSA-N 2-butoxyethenylbenzene Chemical compound CCCCOC=CC1=CC=CC=C1 HXLLCROMVONRRO-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- ZVUNTIMPQCQCAQ-UHFFFAOYSA-N 2-dodecanoyloxyethyl dodecanoate Chemical compound CCCCCCCCCCCC(=O)OCCOC(=O)CCCCCCCCCCC ZVUNTIMPQCQCAQ-UHFFFAOYSA-N 0.000 description 1
- JWCDUUFOAZFFMX-UHFFFAOYSA-N 2-ethenoxy-n,n-dimethylethanamine Chemical compound CN(C)CCOC=C JWCDUUFOAZFFMX-UHFFFAOYSA-N 0.000 description 1
- PIUJWWBOMGMSAY-UHFFFAOYSA-N 2-ethenoxybutane Chemical compound CCC(C)OC=C PIUJWWBOMGMSAY-UHFFFAOYSA-N 0.000 description 1
- QDDILSIJVYYDCY-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO.CCOCCO QDDILSIJVYYDCY-UHFFFAOYSA-N 0.000 description 1
- FWWXYLGCHHIKNY-UHFFFAOYSA-N 2-ethoxyethyl prop-2-enoate Chemical compound CCOCCOC(=O)C=C FWWXYLGCHHIKNY-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- VZMLJEYQUZKERO-UHFFFAOYSA-N 2-hydroxy-1-(2-methylphenyl)-2-phenylethanone Chemical compound CC1=CC=CC=C1C(=O)C(O)C1=CC=CC=C1 VZMLJEYQUZKERO-UHFFFAOYSA-N 0.000 description 1
- KTWCUGUUDHJVIH-UHFFFAOYSA-N 2-hydroxybenzo[de]isoquinoline-1,3-dione Chemical compound C1=CC(C(N(O)C2=O)=O)=C3C2=CC=CC3=C1 KTWCUGUUDHJVIH-UHFFFAOYSA-N 0.000 description 1
- MIFSVERSCRKWOO-UHFFFAOYSA-N 2-hydroxybenzoic acid;phenyl 2-hydroxybenzoate Chemical compound OC(=O)C1=CC=CC=C1O.OC1=CC=CC=C1C(=O)OC1=CC=CC=C1 MIFSVERSCRKWOO-UHFFFAOYSA-N 0.000 description 1
- HXDLWJWIAHWIKI-UHFFFAOYSA-N 2-hydroxyethyl acetate Chemical compound CC(=O)OCCO HXDLWJWIAHWIKI-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- CTHJQRHPNQEPAB-UHFFFAOYSA-N 2-methoxyethenylbenzene Chemical compound COC=CC1=CC=CC=C1 CTHJQRHPNQEPAB-UHFFFAOYSA-N 0.000 description 1
- YXYJVFYWCLAXHO-UHFFFAOYSA-N 2-methoxyethyl 2-methylprop-2-enoate Chemical compound COCCOC(=O)C(C)=C YXYJVFYWCLAXHO-UHFFFAOYSA-N 0.000 description 1
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 description 1
- AEBNPEXFDZBTIB-UHFFFAOYSA-N 2-methyl-4-phenylbut-2-enamide Chemical compound NC(=O)C(C)=CCC1=CC=CC=C1 AEBNPEXFDZBTIB-UHFFFAOYSA-N 0.000 description 1
- KFTHUBZIEMOORC-UHFFFAOYSA-N 2-methylbut-2-enamide Chemical compound CC=C(C)C(N)=O KFTHUBZIEMOORC-UHFFFAOYSA-N 0.000 description 1
- XYYMFUCZDNNGFS-UHFFFAOYSA-N 2-methylheptan-3-one Chemical compound CCCCC(=O)C(C)C XYYMFUCZDNNGFS-UHFFFAOYSA-N 0.000 description 1
- ZXQOBTQMLMZFOW-UHFFFAOYSA-N 2-methylhex-2-enamide Chemical compound CCCC=C(C)C(N)=O ZXQOBTQMLMZFOW-UHFFFAOYSA-N 0.000 description 1
- LPNSCOVIJFIXTJ-UHFFFAOYSA-N 2-methylidenebutanamide Chemical compound CCC(=C)C(N)=O LPNSCOVIJFIXTJ-UHFFFAOYSA-N 0.000 description 1
- YICILWNDMQTUIY-UHFFFAOYSA-N 2-methylidenepentanamide Chemical compound CCCC(=C)C(N)=O YICILWNDMQTUIY-UHFFFAOYSA-N 0.000 description 1
- BTOVVHWKPVSLBI-UHFFFAOYSA-N 2-methylprop-1-enylbenzene Chemical compound CC(C)=CC1=CC=CC=C1 BTOVVHWKPVSLBI-UHFFFAOYSA-N 0.000 description 1
- WSFWQLQMBKJYNU-UHFFFAOYSA-N 2-methylprop-2-enoic acid;propan-2-yl 2-methylprop-2-enoate Chemical compound CC(=C)C(O)=O.CC(C)OC(=O)C(C)=C WSFWQLQMBKJYNU-UHFFFAOYSA-N 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- MYISVPVWAQRUTL-UHFFFAOYSA-N 2-methylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3SC2=C1 MYISVPVWAQRUTL-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- FMFHUEMLVAIBFI-UHFFFAOYSA-N 2-phenylethenyl acetate Chemical compound CC(=O)OC=CC1=CC=CC=C1 FMFHUEMLVAIBFI-UHFFFAOYSA-N 0.000 description 1
- IMOLAGKJZFODRK-UHFFFAOYSA-N 2-phenylprop-2-enamide Chemical compound NC(=O)C(=C)C1=CC=CC=C1 IMOLAGKJZFODRK-UHFFFAOYSA-N 0.000 description 1
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- XLXJSJOICYRXSE-UHFFFAOYSA-N 2-pyridin-2-ylpyridine Chemical compound N1=CC=CC=C1C1=CC=CC=N1.N1=CC=CC=C1C1=CC=CC=N1 XLXJSJOICYRXSE-UHFFFAOYSA-N 0.000 description 1
- RBROWEJWZCQIMP-UHFFFAOYSA-N 2-tert-butyl-6-(5-chlorobenzotriazol-2-yl)-4-methylphenol Chemical compound CC(C)(C)C1=CC(C)=CC(N2N=C3C=C(Cl)C=CC3=N2)=C1O.CC(C)(C)C1=CC(C)=CC(N2N=C3C=C(Cl)C=CC3=N2)=C1O RBROWEJWZCQIMP-UHFFFAOYSA-N 0.000 description 1
- WYYQKWASBLTRIW-UHFFFAOYSA-N 2-trimethoxysilylbenzoic acid Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1C(O)=O WYYQKWASBLTRIW-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- ALZLTHLQMAFAPA-UHFFFAOYSA-N 3-Methylbutyrolactone Chemical compound CC1COC(=O)C1 ALZLTHLQMAFAPA-UHFFFAOYSA-N 0.000 description 1
- IXOCGRPBILEGOX-UHFFFAOYSA-N 3-[3-(dodecanoylamino)propyl-dimethylazaniumyl]-2-hydroxypropane-1-sulfonate Chemical compound CCCCCCCCCCCC(=O)NCCC[N+](C)(C)CC(O)CS([O-])(=O)=O IXOCGRPBILEGOX-UHFFFAOYSA-N 0.000 description 1
- CDOUZKKFHVEKRI-UHFFFAOYSA-N 3-bromo-n-[(prop-2-enoylamino)methyl]propanamide Chemical compound BrCCC(=O)NCNC(=O)C=C CDOUZKKFHVEKRI-UHFFFAOYSA-N 0.000 description 1
- SDNHWPVAYKOIGU-UHFFFAOYSA-N 3-ethyl-2-methylpent-2-enamide Chemical compound CCC(CC)=C(C)C(N)=O SDNHWPVAYKOIGU-UHFFFAOYSA-N 0.000 description 1
- PFCHFHIRKBAQGU-UHFFFAOYSA-N 3-hexanone Chemical compound CCCC(=O)CC PFCHFHIRKBAQGU-UHFFFAOYSA-N 0.000 description 1
- FWIBCWKHNZBDLS-UHFFFAOYSA-N 3-hydroxyoxolan-2-one Chemical compound OC1CCOC1=O FWIBCWKHNZBDLS-UHFFFAOYSA-N 0.000 description 1
- WKICOOSYZJKUJH-UHFFFAOYSA-N 3-methoxy-2-methylpropanoic acid;methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC.COCC(C)C(O)=O WKICOOSYZJKUJH-UHFFFAOYSA-N 0.000 description 1
- CEBRPXLXYCFYGU-UHFFFAOYSA-N 3-methylbut-1-enylbenzene Chemical compound CC(C)C=CC1=CC=CC=C1 CEBRPXLXYCFYGU-UHFFFAOYSA-N 0.000 description 1
- ZTHJQCDAHYOPIK-UHFFFAOYSA-N 3-methylbut-2-en-2-ylbenzene Chemical compound CC(C)=C(C)C1=CC=CC=C1 ZTHJQCDAHYOPIK-UHFFFAOYSA-N 0.000 description 1
- JHCXCJCPJQKLEW-UHFFFAOYSA-N 3-methylbutan-2-one Chemical compound CC(C)C(C)=O.CC(C)C(C)=O JHCXCJCPJQKLEW-UHFFFAOYSA-N 0.000 description 1
- GSYFDULLCGVSNJ-UHFFFAOYSA-N 3-methylcycloheptan-1-one Chemical compound CC1CCCCC(=O)C1 GSYFDULLCGVSNJ-UHFFFAOYSA-N 0.000 description 1
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 1
- NYYSPVRERVXMLJ-UHFFFAOYSA-N 4,4-difluorocyclohexan-1-one Chemical compound FC1(F)CCC(=O)CC1 NYYSPVRERVXMLJ-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- VGVHNLRUAMRIEW-UHFFFAOYSA-N 4-Methylcyclohexanone Natural products CC1CCC(=O)CC1 VGVHNLRUAMRIEW-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- UNDXPKDBFOOQFC-UHFFFAOYSA-N 4-[2-nitro-4-(trifluoromethyl)phenyl]morpholine Chemical compound [O-][N+](=O)C1=CC(C(F)(F)F)=CC=C1N1CCOCC1 UNDXPKDBFOOQFC-UHFFFAOYSA-N 0.000 description 1
- OKSDJGWHKXFVME-UHFFFAOYSA-N 4-ethylcyclohexan-1-one Chemical compound CCC1CCC(=O)CC1 OKSDJGWHKXFVME-UHFFFAOYSA-N 0.000 description 1
- QTWLQDVFHKLZRA-UHFFFAOYSA-N 4-ethyloxetan-2-one Chemical compound CCC1CC(=O)O1 QTWLQDVFHKLZRA-UHFFFAOYSA-N 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- KEKPAPJXCXKIDQ-UHFFFAOYSA-N 4-methylpentan-2-one Chemical compound CC(C)CC(C)=O.CC(C)CC(C)=O KEKPAPJXCXKIDQ-UHFFFAOYSA-N 0.000 description 1
- KBIWNQVZKHSHTI-UHFFFAOYSA-N 4-n,4-n-dimethylbenzene-1,4-diamine;oxalic acid Chemical compound OC(=O)C(O)=O.CN(C)C1=CC=C(N)C=C1 KBIWNQVZKHSHTI-UHFFFAOYSA-N 0.000 description 1
- DBOSBRHMHBENLP-UHFFFAOYSA-N 4-tert-Butylphenyl Salicylate Chemical compound C1=CC(C(C)(C)C)=CC=C1OC(=O)C1=CC=CC=C1O DBOSBRHMHBENLP-UHFFFAOYSA-N 0.000 description 1
- NSPMIYGKQJPBQR-UHFFFAOYSA-N 4H-1,2,4-triazole Chemical compound C=1N=CNN=1 NSPMIYGKQJPBQR-UHFFFAOYSA-N 0.000 description 1
- RNDVGJZUHCKENF-UHFFFAOYSA-N 5-hexen-2-one Chemical compound CC(=O)CCC=C RNDVGJZUHCKENF-UHFFFAOYSA-N 0.000 description 1
- RNMDNPCBIKJCQP-UHFFFAOYSA-N 5-nonyl-7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-ol Chemical compound C(CCCCCCCC)C1=C2C(=C(C=C1)O)O2 RNMDNPCBIKJCQP-UHFFFAOYSA-N 0.000 description 1
- YCPXWRQRBFJBPZ-UHFFFAOYSA-N 5-sulfosalicylic acid Chemical compound OC(=O)C1=CC(S(O)(=O)=O)=CC=C1O YCPXWRQRBFJBPZ-UHFFFAOYSA-N 0.000 description 1
- NUXLDNTZFXDNBA-UHFFFAOYSA-N 6-bromo-2-methyl-4h-1,4-benzoxazin-3-one Chemical compound C1=C(Br)C=C2NC(=O)C(C)OC2=C1 NUXLDNTZFXDNBA-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
- UPKGMKGQIDTBDN-UHFFFAOYSA-N 9-(7-acridin-9-ylheptyl)acridine Chemical compound C1=CC=CC2=NC3=CC=CC=C3C(=C12)CCCCCCCC=1C2=CC=CC=C2N=C2C=CC=CC12.C1=CC=CC2=NC3=CC=CC=C3C(=C12)CCCCCCCC=1C2=CC=CC=C2N=C2C=CC=CC12 UPKGMKGQIDTBDN-UHFFFAOYSA-N 0.000 description 1
- MTRFEWTWIPAXLG-UHFFFAOYSA-N 9-phenylacridine Chemical compound C1=CC=CC=C1C1=C(C=CC=C2)C2=NC2=CC=CC=C12 MTRFEWTWIPAXLG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- YNMZZHPSYMOGCI-UHFFFAOYSA-N Aethyl-octyl-keton Natural products CCCCCCCCC(=O)CC YNMZZHPSYMOGCI-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- GEHMBYLTCISYNY-UHFFFAOYSA-N Ammonium sulfamate Chemical compound [NH4+].NS([O-])(=O)=O GEHMBYLTCISYNY-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- FRPHFZCDPYBUAU-UHFFFAOYSA-N Bromocresolgreen Chemical compound CC1=C(Br)C(O)=C(Br)C=C1C1(C=2C(=C(Br)C(O)=C(Br)C=2)C)C2=CC=CC=C2S(=O)(=O)O1 FRPHFZCDPYBUAU-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 1
- VIUSIFLQFOWZRL-UHFFFAOYSA-N C(C)C1=C(C=CC=C1CCCCCC)C(=C(C(=O)O)C#N)C1=CC=CC=C1.C(C)C1=C(C=CC=C1CCCCCC)C(=C(C(=O)O)C#N)C1=CC=CC=C1 Chemical compound C(C)C1=C(C=CC=C1CCCCCC)C(=C(C(=O)O)C#N)C1=CC=CC=C1.C(C)C1=C(C=CC=C1CCCCCC)C(=C(C(=O)O)C#N)C1=CC=CC=C1 VIUSIFLQFOWZRL-UHFFFAOYSA-N 0.000 description 1
- DSJLBLIPSFDWPZ-UHFFFAOYSA-N C(C)NC(C(=C)C)=O.C(C(=C)C)(=O)NCC Chemical compound C(C)NC(C(=C)C)=O.C(C(=C)C)(=O)NCC DSJLBLIPSFDWPZ-UHFFFAOYSA-N 0.000 description 1
- GLZKPUOXHVXQSI-UHFFFAOYSA-N C(CCC)C(=C(C(=O)O)CC(=O)O)CCCC.C(C(=C)CC(=O)OCCCC)(=O)OCCCC Chemical compound C(CCC)C(=C(C(=O)O)CC(=O)O)CCCC.C(C(=C)CC(=O)OCCCC)(=O)OCCCC GLZKPUOXHVXQSI-UHFFFAOYSA-N 0.000 description 1
- WJSPPUTWGSKODQ-UHFFFAOYSA-N C(CCS(=O)(=O)O)S(=O)(=O)O.C(CCS(=O)(=O)O)S(=O)(=O)O Chemical compound C(CCS(=O)(=O)O)S(=O)(=O)O.C(CCS(=O)(=O)O)S(=O)(=O)O WJSPPUTWGSKODQ-UHFFFAOYSA-N 0.000 description 1
- SPLXJZGLLPRDGP-UHFFFAOYSA-N C1(=CC=CC2=CC=CC=C12)C(=O)O.C=1(C(=CC=C2C=CC=CC12)C(=O)O)C(=O)O Chemical class C1(=CC=CC2=CC=CC=C12)C(=O)O.C=1(C(=CC=C2C=CC=CC12)C(=O)O)C(=O)O SPLXJZGLLPRDGP-UHFFFAOYSA-N 0.000 description 1
- CUUHRYSNCRTUOY-UHFFFAOYSA-N C1(=CC=CC=C1)P(O)=O.C1(=CC=CC=C1)P(O)=O Chemical compound C1(=CC=CC=C1)P(O)=O.C1(=CC=CC=C1)P(O)=O CUUHRYSNCRTUOY-UHFFFAOYSA-N 0.000 description 1
- SHHWEPIPRBXTPO-UHFFFAOYSA-N CC(CC(CC)=O)CC.CC(CC(CC)=O)CC Chemical compound CC(CC(CC)=O)CC.CC(CC(CC)=O)CC SHHWEPIPRBXTPO-UHFFFAOYSA-N 0.000 description 1
- GQOOTAXWUQAXDI-UHFFFAOYSA-N CC(O)=O.CCCOCC(C)OC Chemical compound CC(O)=O.CCCOCC(C)OC GQOOTAXWUQAXDI-UHFFFAOYSA-N 0.000 description 1
- HZOJLVFDAUVTMN-UHFFFAOYSA-N CC1(C(CCC1)=O)C.CC1(C(CCC1)=O)C Chemical compound CC1(C(CCC1)=O)C.CC1(C(CCC1)=O)C HZOJLVFDAUVTMN-UHFFFAOYSA-N 0.000 description 1
- YHIGAZLMIBQHFB-UHFFFAOYSA-N CC1=C(OC(=CC1=C(C#N)C#N)C=CC2=CC=C(C=C2)N(C)C)C Chemical compound CC1=C(OC(=CC1=C(C#N)C#N)C=CC2=CC=C(C=C2)N(C)C)C YHIGAZLMIBQHFB-UHFFFAOYSA-N 0.000 description 1
- JGWRBYFSXLBCSI-UHFFFAOYSA-N CC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1.CC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 Chemical compound CC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1.CC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 JGWRBYFSXLBCSI-UHFFFAOYSA-N 0.000 description 1
- QAASXNMKXDFOPB-UHFFFAOYSA-N CC1C(=O)OCC1.CC1C(=O)OCC1 Chemical compound CC1C(=O)OCC1.CC1C(=O)OCC1 QAASXNMKXDFOPB-UHFFFAOYSA-N 0.000 description 1
- HMWIENGAOSYPII-UHFFFAOYSA-N CC1C(CC(C1)(C)C)=O.CC1C(CC(C1)(C)C)=O Chemical compound CC1C(CC(C1)(C)C)=O.CC1C(CC(C1)(C)C)=O HMWIENGAOSYPII-UHFFFAOYSA-N 0.000 description 1
- SFFYXDWXBXEQDW-UHFFFAOYSA-N CC1C(CCCCC1)=O.CC1C(CCCCC1)=O Chemical compound CC1C(CCCCC1)=O.CC1C(CCCCC1)=O SFFYXDWXBXEQDW-UHFFFAOYSA-N 0.000 description 1
- JTHWARVHBHSEPN-UHFFFAOYSA-N CC1CC(CC1)=O.CC1CC(CC1)=O Chemical compound CC1CC(CC1)=O.CC1CC(CC1)=O JTHWARVHBHSEPN-UHFFFAOYSA-N 0.000 description 1
- NGPPPMGKUPEESB-UHFFFAOYSA-N CC=1C=C(C(=O)C2=CC(=CC=C2)C)C=CC1OC.CC=1C=C(C(=O)C2=CC(=CC=C2)C)C=CC1OC Chemical compound CC=1C=C(C(=O)C2=CC(=CC=C2)C)C=CC1OC.CC=1C=C(C(=O)C2=CC(=CC=C2)C)C=CC1OC NGPPPMGKUPEESB-UHFFFAOYSA-N 0.000 description 1
- BASSNOBUPHGPKX-UHFFFAOYSA-N CCC1(CC2=C(C(C1)(CC)CC)SC3=CC=CC=C3C2=O)CC Chemical compound CCC1(CC2=C(C(C1)(CC)CC)SC3=CC=CC=C3C2=O)CC BASSNOBUPHGPKX-UHFFFAOYSA-N 0.000 description 1
- XJIUILQOCWXAMU-UHFFFAOYSA-N CCCCC(=O)CCCC.CCCCC(=O)CCCC Chemical compound CCCCC(=O)CCCC.CCCCC(=O)CCCC XJIUILQOCWXAMU-UHFFFAOYSA-N 0.000 description 1
- QVBDZXAJOVFFIM-UHFFFAOYSA-N COCCC(=O)OCC.COCCC(=O)O Chemical compound COCCC(=O)OCC.COCCC(=O)O QVBDZXAJOVFFIM-UHFFFAOYSA-N 0.000 description 1
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 1
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 239000004380 Cholic acid Substances 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- XIMXCDVLSXZGAH-UHFFFAOYSA-N ClCC(CC=C(C(=O)O)C)O.C(C(=C)C)(=O)OCC(CCl)O Chemical compound ClCC(CC=C(C(=O)O)C)O.C(C(=C)C)(=O)OCC(CCl)O XIMXCDVLSXZGAH-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 1
- HDFFVHSMHLDSLO-UHFFFAOYSA-N Dibenzyl phosphate Chemical compound C=1C=CC=CC=1COP(=O)(O)OCC1=CC=CC=C1 HDFFVHSMHLDSLO-UHFFFAOYSA-N 0.000 description 1
- PYGXAGIECVVIOZ-UHFFFAOYSA-N Dibutyl decanedioate Chemical compound CCCCOC(=O)CCCCCCCCC(=O)OCCCC PYGXAGIECVVIOZ-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- KKUKTXOBAWVSHC-UHFFFAOYSA-N Dimethylphosphate Chemical compound COP(O)(=O)OC KKUKTXOBAWVSHC-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Natural products OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 1
- 229910005898 GeSn Inorganic materials 0.000 description 1
- JZNWSCPGTDBMEW-UHFFFAOYSA-N Glycerophosphorylethanolamin Natural products NCCOP(O)(=O)OCC(O)CO JZNWSCPGTDBMEW-UHFFFAOYSA-N 0.000 description 1
- MZNHUHNWGVUEAT-XBXARRHUSA-N Hexyl crotonate Chemical compound CCCCCCOC(=O)\C=C\C MZNHUHNWGVUEAT-XBXARRHUSA-N 0.000 description 1
- JVTAAEKCZFNVCJ-UHFFFAOYSA-M Lactate Chemical compound CC(O)C([O-])=O JVTAAEKCZFNVCJ-UHFFFAOYSA-M 0.000 description 1
- ARIWANIATODDMH-UHFFFAOYSA-N Lauric acid monoglyceride Natural products CCCCCCCCCCCC(=O)OCC(O)CO ARIWANIATODDMH-UHFFFAOYSA-N 0.000 description 1
- 229920001732 Lignosulfonate Polymers 0.000 description 1
- SMEROWZSTRWXGI-UHFFFAOYSA-N Lithocholsaeure Natural products C1CC2CC(O)CCC2(C)C2C1C1CCC(C(CCC(O)=O)C)C1(C)CC2 SMEROWZSTRWXGI-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- QPJVMBTYPHYUOC-UHFFFAOYSA-N Methyl benzoate Natural products COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- RJUFJBKOKNCXHH-UHFFFAOYSA-N Methyl propionate Chemical compound CCC(=O)OC RJUFJBKOKNCXHH-UHFFFAOYSA-N 0.000 description 1
- XYVQFUJDGOBPQI-UHFFFAOYSA-N Methyl-2-hydoxyisobutyric acid Chemical compound COC(=O)C(C)(C)O XYVQFUJDGOBPQI-UHFFFAOYSA-N 0.000 description 1
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Natural products C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- AKNUHUCEWALCOI-UHFFFAOYSA-N N-ethyldiethanolamine Chemical compound OCCN(CC)CCO AKNUHUCEWALCOI-UHFFFAOYSA-N 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- GORXRFCHPRVABO-UHFFFAOYSA-N O(C)[SiH](OC)OC.C=C Chemical compound O(C)[SiH](OC)OC.C=C GORXRFCHPRVABO-UHFFFAOYSA-N 0.000 description 1
- KJCOPKDVGUISOZ-UHFFFAOYSA-N OC1=NC=NC2=NC=CN=C12.OC1=NC=NC2=NC=CN=C12 Chemical class OC1=NC=NC2=NC=CN=C12.OC1=NC=NC2=NC=CN=C12 KJCOPKDVGUISOZ-UHFFFAOYSA-N 0.000 description 1
- QLZHNIAADXEJJP-UHFFFAOYSA-N Phenylphosphonic acid Chemical compound OP(O)(=O)C1=CC=CC=C1 QLZHNIAADXEJJP-UHFFFAOYSA-N 0.000 description 1
- 229920000805 Polyaspartic acid Polymers 0.000 description 1
- 239000004693 Polybenzimidazole Substances 0.000 description 1
- 229920002675 Polyoxyl Polymers 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- MVOKJNANKGBPOZ-UHFFFAOYSA-N S(=O)(=O)(O)C1=CC=C(C)C=C1.C1(=CC=CC=C1)C(=O)C(O)C1=CC=CC=C1.CC1=CC=CC=C1.C1(=CC=CC=C1)C(=O)C(O)C1=CC=CC=C1 Chemical compound S(=O)(=O)(O)C1=CC=C(C)C=C1.C1(=CC=CC=C1)C(=O)C(O)C1=CC=CC=C1.CC1=CC=CC=C1.C1(=CC=CC=C1)C(=O)C(O)C1=CC=CC=C1 MVOKJNANKGBPOZ-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- IYFATESGLOUGBX-YVNJGZBMSA-N Sorbitan monopalmitate Chemical compound CCCCCCCCCCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O IYFATESGLOUGBX-YVNJGZBMSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- LEHOTFFKMJEONL-UHFFFAOYSA-N Uric Acid Chemical compound N1C(=O)NC(=O)C2=C1NC(=O)N2 LEHOTFFKMJEONL-UHFFFAOYSA-N 0.000 description 1
- TVWHNULVHGKJHS-UHFFFAOYSA-N Uric acid Natural products N1C(=O)NC(=O)C2NC(=O)NC21 TVWHNULVHGKJHS-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- YMOONIIMQBGTDU-VOTSOKGWSA-N [(e)-2-bromoethenyl]benzene Chemical compound Br\C=C\C1=CC=CC=C1 YMOONIIMQBGTDU-VOTSOKGWSA-N 0.000 description 1
- OLXYYDIQOLDNJX-UHFFFAOYSA-N [3-(2-chloroacetyl)oxy-2-hydroxypropyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(O)COC(=O)CCl OLXYYDIQOLDNJX-UHFFFAOYSA-N 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 1
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 1
- MSJZSAUZVOSQCM-UHFFFAOYSA-N acetic acid propane-1,2-diol Chemical compound C(C(C)O)O.C(C(C)O)O.C(C)(=O)O MSJZSAUZVOSQCM-UHFFFAOYSA-N 0.000 description 1
- WDJHALXBUFZDSR-UHFFFAOYSA-N acetoacetic acid Chemical compound CC(=O)CC(O)=O WDJHALXBUFZDSR-UHFFFAOYSA-N 0.000 description 1
- 150000001251 acridines Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000007754 air knife coating Methods 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 229940045714 alkyl sulfonate alkylating agent Drugs 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- DQPBABKTKYNPMH-UHFFFAOYSA-N amino hydrogen sulfate Chemical compound NOS(O)(=O)=O DQPBABKTKYNPMH-UHFFFAOYSA-N 0.000 description 1
- BVCZEBOGSOYJJT-UHFFFAOYSA-N ammonium carbamate Chemical compound [NH4+].NC([O-])=O BVCZEBOGSOYJJT-UHFFFAOYSA-N 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 150000008365 aromatic ketones Chemical class 0.000 description 1
- 125000004391 aryl sulfonyl group Chemical group 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- UREZNYTWGJKWBI-UHFFFAOYSA-M benzethonium chloride Chemical compound [Cl-].C1=CC(C(C)(C)CC(C)(C)C)=CC=C1OCCOCC[N+](C)(C)CC1=CC=CC=C1 UREZNYTWGJKWBI-UHFFFAOYSA-M 0.000 description 1
- 229960001950 benzethonium chloride Drugs 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 229960004365 benzoic acid Drugs 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- OPAYAQMFPGDUKW-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1.CC(=O)OCC1=CC=CC=C1 OPAYAQMFPGDUKW-UHFFFAOYSA-N 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- GSCLMSFRWBPUSK-UHFFFAOYSA-N beta-Butyrolactone Chemical compound CC1CC(=O)O1 GSCLMSFRWBPUSK-UHFFFAOYSA-N 0.000 description 1
- VEZXCJBBBCKRPI-UHFFFAOYSA-N beta-propiolactone Chemical compound O=C1CCO1 VEZXCJBBBCKRPI-UHFFFAOYSA-N 0.000 description 1
- 239000003833 bile salt Substances 0.000 description 1
- HPPSOVBQPGUHDN-UHFFFAOYSA-N bis(2,3-ditert-butylphenyl)iodanium Chemical compound CC(C)(C)C1=CC=CC([I+]C=2C(=C(C=CC=2)C(C)(C)C)C(C)(C)C)=C1C(C)(C)C HPPSOVBQPGUHDN-UHFFFAOYSA-N 0.000 description 1
- XIUFUBNQNCXVRG-UHFFFAOYSA-M bis(2,3-ditert-butylphenyl)iodanium;(7,7-dimethyl-3-oxo-4-bicyclo[2.2.1]heptanyl)methanesulfonate Chemical compound C1CC2(CS([O-])(=O)=O)C(=O)CC1C2(C)C.CC(C)(C)C1=CC=CC([I+]C=2C(=C(C=CC=2)C(C)(C)C)C(C)(C)C)=C1C(C)(C)C XIUFUBNQNCXVRG-UHFFFAOYSA-M 0.000 description 1
- WXNRYSGJLQFHBR-UHFFFAOYSA-N bis(2,4-dihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1O WXNRYSGJLQFHBR-UHFFFAOYSA-N 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- HSUIVCLOAAJSRE-UHFFFAOYSA-N bis(2-methoxyethyl) benzene-1,2-dicarboxylate Chemical compound COCCOC(=O)C1=CC=CC=C1C(=O)OCCOC HSUIVCLOAAJSRE-UHFFFAOYSA-N 0.000 description 1
- NNOOIWZFFJUFBS-UHFFFAOYSA-M bis(2-tert-butylphenyl)iodanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.CC(C)(C)C1=CC=CC=C1[I+]C1=CC=CC=C1C(C)(C)C NNOOIWZFFJUFBS-UHFFFAOYSA-M 0.000 description 1
- ZFMQKOWCDKKBIF-UHFFFAOYSA-N bis(3,5-difluorophenyl)phosphane Chemical compound FC1=CC(F)=CC(PC=2C=C(F)C=C(F)C=2)=C1 ZFMQKOWCDKKBIF-UHFFFAOYSA-N 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 229960001506 brilliant green Drugs 0.000 description 1
- NNBFNNNWANBMTI-UHFFFAOYSA-M brilliant green Chemical compound OS([O-])(=O)=O.C1=CC(N(CC)CC)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](CC)CC)C=C1 NNBFNNNWANBMTI-UHFFFAOYSA-M 0.000 description 1
- HXCILVUBKWANLN-UHFFFAOYSA-N brilliant green cation Chemical compound C1=CC(N(CC)CC)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](CC)CC)C=C1 HXCILVUBKWANLN-UHFFFAOYSA-N 0.000 description 1
- UDSAIICHUKSCKT-UHFFFAOYSA-N bromophenol blue Chemical compound C1=C(Br)C(O)=C(Br)C=C1C1(C=2C=C(Br)C(O)=C(Br)C=2)C2=CC=CC=C2S(=O)(=O)O1 UDSAIICHUKSCKT-UHFFFAOYSA-N 0.000 description 1
- MPMBRWOOISTHJV-UHFFFAOYSA-N but-1-enylbenzene Chemical compound CCC=CC1=CC=CC=C1 MPMBRWOOISTHJV-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 1
- 229940043232 butyl acetate Drugs 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- RPRPDTXKGSIXMD-UHFFFAOYSA-N butyl hexanoate Chemical compound CCCCCC(=O)OCCCC RPRPDTXKGSIXMD-UHFFFAOYSA-N 0.000 description 1
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 description 1
- CFEAAQFZALKQPA-UHFFFAOYSA-N cadmium(2+);oxygen(2-) Chemical compound [O-2].[Cd+2] CFEAAQFZALKQPA-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000004202 carbamide Chemical class 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N carbonic acid monoamide Natural products NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 229960000800 cetrimonium bromide Drugs 0.000 description 1
- 229960001927 cetylpyridinium chloride Drugs 0.000 description 1
- NFCRBQADEGXVDL-UHFFFAOYSA-M cetylpyridinium chloride monohydrate Chemical compound O.[Cl-].CCCCCCCCCCCCCCCC[N+]1=CC=CC=C1 NFCRBQADEGXVDL-UHFFFAOYSA-M 0.000 description 1
- VYXSBFYARXAAKO-WTKGSRSZSA-N chembl402140 Chemical compound Cl.C1=2C=C(C)C(NCC)=CC=2OC2=C\C(=N/CC)C(C)=CC2=C1C1=CC=CC=C1C(=O)OCC VYXSBFYARXAAKO-WTKGSRSZSA-N 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 235000019416 cholic acid Nutrition 0.000 description 1
- BHQCQFFYRZLCQQ-OELDTZBJSA-N cholic acid Chemical compound C([C@H]1C[C@H]2O)[C@H](O)CC[C@]1(C)[C@@H]1[C@@H]2[C@@H]2CC[C@H]([C@@H](CCC(O)=O)C)[C@@]2(C)[C@@H](O)C1 BHQCQFFYRZLCQQ-OELDTZBJSA-N 0.000 description 1
- 229960002471 cholic acid Drugs 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 229960004106 citric acid Drugs 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- MRUAUOIMASANKQ-UHFFFAOYSA-N cocamidopropyl betaine Chemical compound CCCCCCCCCCCC(=O)NCCC[N+](C)(C)CC([O-])=O MRUAUOIMASANKQ-UHFFFAOYSA-N 0.000 description 1
- 229940073507 cocamidopropyl betaine Drugs 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 235000001671 coumarin Nutrition 0.000 description 1
- 229960000956 coumarin Drugs 0.000 description 1
- AFYCEAFSNDLKSX-UHFFFAOYSA-N coumarin 460 Chemical compound CC1=CC(=O)OC2=CC(N(CC)CC)=CC=C21 AFYCEAFSNDLKSX-UHFFFAOYSA-N 0.000 description 1
- GZTMNDOZYLMFQE-UHFFFAOYSA-N coumarin 500 Chemical compound FC(F)(F)C1=CC(=O)OC2=CC(NCC)=CC=C21 GZTMNDOZYLMFQE-UHFFFAOYSA-N 0.000 description 1
- 150000004775 coumarins Chemical class 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- MKJDUHZPLQYUCB-UHFFFAOYSA-N decan-4-one Chemical compound CCCCCCC(=O)CCC MKJDUHZPLQYUCB-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 229940009976 deoxycholate Drugs 0.000 description 1
- KXGVEGMKQFWNSR-LLQZFEROSA-N deoxycholic acid Chemical compound C([C@H]1CC2)[C@H](O)CC[C@]1(C)[C@@H]1[C@@H]2[C@@H]2CC[C@H]([C@@H](CCC(O)=O)C)[C@@]2(C)[C@@H](O)C1 KXGVEGMKQFWNSR-LLQZFEROSA-N 0.000 description 1
- 229960003964 deoxycholic acid Drugs 0.000 description 1
- 238000010511 deprotection reaction Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 229910000071 diazene Inorganic materials 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- JBSLOWBPDRZSMB-BQYQJAHWSA-N dibutyl (e)-but-2-enedioate Chemical compound CCCCOC(=O)\C=C\C(=O)OCCCC JBSLOWBPDRZSMB-BQYQJAHWSA-N 0.000 description 1
- JBSLOWBPDRZSMB-FPLPWBNLSA-N dibutyl (z)-but-2-enedioate Chemical compound CCCCOC(=O)\C=C/C(=O)OCCCC JBSLOWBPDRZSMB-FPLPWBNLSA-N 0.000 description 1
- PUFGCEQWYLJYNJ-UHFFFAOYSA-N didodecyl benzene-1,2-dicarboxylate Chemical compound CCCCCCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCCCCCC PUFGCEQWYLJYNJ-UHFFFAOYSA-N 0.000 description 1
- ZEFVHSWKYCYFFL-UHFFFAOYSA-N diethyl 2-methylidenebutanedioate Chemical compound CCOC(=O)CC(=C)C(=O)OCC ZEFVHSWKYCYFFL-UHFFFAOYSA-N 0.000 description 1
- XSBSXJAYEPDGSF-UHFFFAOYSA-N diethyl 3,5-dimethyl-1h-pyrrole-2,4-dicarboxylate Chemical compound CCOC(=O)C=1NC(C)=C(C(=O)OCC)C=1C XSBSXJAYEPDGSF-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-AATRIKPKSA-N diethyl fumarate Chemical compound CCOC(=O)\C=C\C(=O)OCC IEPRKVQEAMIZSS-AATRIKPKSA-N 0.000 description 1
- WYACBZDAHNBPPB-UHFFFAOYSA-N diethyl oxalate Chemical compound CCOC(=O)C(=O)OCC WYACBZDAHNBPPB-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- 238000006471 dimerization reaction Methods 0.000 description 1
- ZWWQRMFIZFPUAA-UHFFFAOYSA-N dimethyl 2-methylidenebutanedioate Chemical compound COC(=O)CC(=C)C(=O)OC ZWWQRMFIZFPUAA-UHFFFAOYSA-N 0.000 description 1
- LDCRTTXIJACKKU-ONEGZZNKSA-N dimethyl fumarate Chemical compound COC(=O)\C=C\C(=O)OC LDCRTTXIJACKKU-ONEGZZNKSA-N 0.000 description 1
- 229960004419 dimethyl fumarate Drugs 0.000 description 1
- LDCRTTXIJACKKU-ARJAWSKDSA-N dimethyl maleate Chemical compound COC(=O)\C=C/C(=O)OC LDCRTTXIJACKKU-ARJAWSKDSA-N 0.000 description 1
- PSLWZOIUBRXAQW-UHFFFAOYSA-M dimethyl(dioctadecyl)azanium;bromide Chemical compound [Br-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC PSLWZOIUBRXAQW-UHFFFAOYSA-M 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- REZZEXDLIUJMMS-UHFFFAOYSA-M dimethyldioctadecylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC REZZEXDLIUJMMS-UHFFFAOYSA-M 0.000 description 1
- UXGNZZKBCMGWAZ-UHFFFAOYSA-N dimethylformamide dmf Chemical compound CN(C)C=O.CN(C)C=O UXGNZZKBCMGWAZ-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- YHAIUSTWZPMYGG-UHFFFAOYSA-L disodium;2,2-dioctyl-3-sulfobutanedioate Chemical compound [Na+].[Na+].CCCCCCCCC(C([O-])=O)(C(C([O-])=O)S(O)(=O)=O)CCCCCCCC YHAIUSTWZPMYGG-UHFFFAOYSA-L 0.000 description 1
- 239000012990 dithiocarbamate Substances 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- AFIQVBFAKUPHOA-UHFFFAOYSA-N ethenyl 2-methoxyacetate Chemical compound COCC(=O)OC=C AFIQVBFAKUPHOA-UHFFFAOYSA-N 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- LRMHFDNWKCSEQU-UHFFFAOYSA-N ethoxyethane;phenol Chemical compound CCOCC.OC1=CC=CC=C1 LRMHFDNWKCSEQU-UHFFFAOYSA-N 0.000 description 1
- UHKJHMOIRYZSTH-UHFFFAOYSA-N ethyl 2-ethoxypropanoate Chemical compound CCOC(C)C(=O)OCC UHKJHMOIRYZSTH-UHFFFAOYSA-N 0.000 description 1
- GFUIDHWFLMPAGY-UHFFFAOYSA-N ethyl 2-hydroxy-2-methylpropanoate Chemical compound CCOC(=O)C(C)(C)O GFUIDHWFLMPAGY-UHFFFAOYSA-N 0.000 description 1
- ZANNOFHADGWOLI-UHFFFAOYSA-N ethyl 2-hydroxyacetate Chemical compound CCOC(=O)CO ZANNOFHADGWOLI-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 1
- HCPOCMMGKBZWSJ-UHFFFAOYSA-N ethyl 3-hydrazinyl-3-oxopropanoate Chemical compound CCOC(=O)CC(=O)NN HCPOCMMGKBZWSJ-UHFFFAOYSA-N 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- FWKGEANWQNXYRM-UHFFFAOYSA-N ethyl n-[6-(ethoxycarbonylamino)hexyl]carbamate Chemical compound CCOC(=O)NCCCCCCNC(=O)OCC FWKGEANWQNXYRM-UHFFFAOYSA-N 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- JVICFMRAVNKDOE-UHFFFAOYSA-M ethyl violet Chemical compound [Cl-].C1=CC(N(CC)CC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 JVICFMRAVNKDOE-UHFFFAOYSA-M 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 150000002191 fatty alcohols Chemical class 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 125000004428 fluoroalkoxy group Chemical group 0.000 description 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Substances O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- YQEMORVAKMFKLG-UHFFFAOYSA-N glycerine monostearate Natural products CCCCCCCCCCCCCCCCCC(=O)OC(CO)CO YQEMORVAKMFKLG-UHFFFAOYSA-N 0.000 description 1
- SVUQHVRAGMNPLW-UHFFFAOYSA-N glycerol monostearate Natural products CCCCCCCCCCCCCCCCC(=O)OCC(O)CO SVUQHVRAGMNPLW-UHFFFAOYSA-N 0.000 description 1
- HHLFWLYXYJOTON-UHFFFAOYSA-N glyoxylic acid Chemical compound OC(=O)C=O HHLFWLYXYJOTON-UHFFFAOYSA-N 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 239000001046 green dye Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 1
- KETWBQOXTBGBBN-UHFFFAOYSA-N hex-1-enylbenzene Chemical compound CCCCC=CC1=CC=CC=C1 KETWBQOXTBGBBN-UHFFFAOYSA-N 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- OLRDMVISMZYVRU-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate 2-methylnon-2-enoic acid Chemical compound C(CCCCC)C=C(C(=O)O)C.C(C(=C)C)(=O)OCCCCCC OLRDMVISMZYVRU-UHFFFAOYSA-N 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 238000000671 immersion lithography Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- FRCAGVUKJQCWBD-UHFFFAOYSA-L iodine green Chemical compound [Cl-].[Cl-].C1=CC(N(C)C)=CC=C1C(\C=1C=CC(=CC=1)[N+](C)(C)C)=C/1C=C(C)C(=[N+](C)C)C=C\1 FRCAGVUKJQCWBD-UHFFFAOYSA-L 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical group CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 150000002596 lactones Chemical group 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000990 laser dye Substances 0.000 description 1
- SXQCTESRRZBPHJ-UHFFFAOYSA-M lissamine rhodamine Chemical compound [Na+].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=C(S([O-])(=O)=O)C=C1S([O-])(=O)=O SXQCTESRRZBPHJ-UHFFFAOYSA-M 0.000 description 1
- SMEROWZSTRWXGI-HVATVPOCSA-N lithocholic acid Chemical compound C([C@H]1CC2)[C@H](O)CC[C@]1(C)[C@@H]1[C@@H]2[C@@H]2CC[C@H]([C@@H](CCC(O)=O)C)[C@@]2(C)CC1 SMEROWZSTRWXGI-HVATVPOCSA-N 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 229940099690 malic acid Drugs 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- FMXYCZVOMYLMKM-UHFFFAOYSA-N methyl 2-hydroxy-2-methylbutanoate Chemical compound CCC(C)(O)C(=O)OC FMXYCZVOMYLMKM-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- 229940086559 methyl benzoin Drugs 0.000 description 1
- MQWCXKGKQLNYQG-UHFFFAOYSA-N methyl cyclohexan-4-ol Natural products CC1CCC(O)CC1 MQWCXKGKQLNYQG-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- 229940017219 methyl propionate Drugs 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- MYMDOKBFMTVEGE-UHFFFAOYSA-N methylsulfamic acid Chemical compound CNS(O)(=O)=O MYMDOKBFMTVEGE-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- QRWZCJXEAOZAAW-UHFFFAOYSA-N n,n,2-trimethylprop-2-enamide Chemical compound CN(C)C(=O)C(C)=C QRWZCJXEAOZAAW-UHFFFAOYSA-N 0.000 description 1
- SWSFFBPGDIHBJL-UHFFFAOYSA-N n-(2-methoxyethyl)-2-methylprop-2-enamide Chemical compound COCCNC(=O)C(C)=C SWSFFBPGDIHBJL-UHFFFAOYSA-N 0.000 description 1
- KIHJKWNSLAKEPK-UHFFFAOYSA-N n-(2-methoxyethyl)prop-2-enamide Chemical compound COCCNC(=O)C=C KIHJKWNSLAKEPK-UHFFFAOYSA-N 0.000 description 1
- VQGWOOIHSXNRPW-UHFFFAOYSA-N n-butyl-2-methylprop-2-enamide Chemical compound CCCCNC(=O)C(C)=C VQGWOOIHSXNRPW-UHFFFAOYSA-N 0.000 description 1
- PMJFVKWBSWWAKT-UHFFFAOYSA-N n-cyclohexylprop-2-enamide Chemical compound C=CC(=O)NC1CCCCC1 PMJFVKWBSWWAKT-UHFFFAOYSA-N 0.000 description 1
- JIKUXBYRTXDNIY-UHFFFAOYSA-N n-methyl-n-phenylformamide Chemical compound O=CN(C)C1=CC=CC=C1 JIKUXBYRTXDNIY-UHFFFAOYSA-N 0.000 description 1
- QQZXAODFGRZKJT-UHFFFAOYSA-N n-tert-butyl-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC(C)(C)C QQZXAODFGRZKJT-UHFFFAOYSA-N 0.000 description 1
- XFHJDMUEHUHAJW-UHFFFAOYSA-N n-tert-butylprop-2-enamide Chemical compound CC(C)(C)NC(=O)C=C XFHJDMUEHUHAJW-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical compound C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- SMGTYJPMKXNQFY-UHFFFAOYSA-N octenidine dihydrochloride Chemical compound Cl.Cl.C1=CC(=NCCCCCCCC)C=CN1CCCCCCCCCCN1C=CC(=NCCCCCCCC)C=C1 SMGTYJPMKXNQFY-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-O oxonium Chemical compound [OH3+] XLYOFNOQVPJJNP-UHFFFAOYSA-O 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- YBVNFKZSMZGRAD-UHFFFAOYSA-N pentamidine isethionate Chemical compound OCCS(O)(=O)=O.OCCS(O)(=O)=O.C1=CC(C(=N)N)=CC=C1OCCCCCOC1=CC=C(C(N)=N)C=C1 YBVNFKZSMZGRAD-UHFFFAOYSA-N 0.000 description 1
- FNXBWWLECBTZAS-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O.CCCC(C)=O FNXBWWLECBTZAS-UHFFFAOYSA-N 0.000 description 1
- QBHZMTFQTRUFIN-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC.CCC(=O)CC QBHZMTFQTRUFIN-UHFFFAOYSA-N 0.000 description 1
- JGTNAGYHADQMCM-UHFFFAOYSA-N perfluorobutanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F JGTNAGYHADQMCM-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-M phenolate Chemical compound [O-]C1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-M 0.000 description 1
- 229940031826 phenolate Drugs 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- WTJKGGKOPKCXLL-RRHRGVEJSA-N phosphatidylcholine Chemical compound CCCCCCCCCCCCCCCC(=O)OC[C@H](COP([O-])(=O)OCC[N+](C)(C)C)OC(=O)CCCCCCCC=CCCCCCCCC WTJKGGKOPKCXLL-RRHRGVEJSA-N 0.000 description 1
- 150000008104 phosphatidylethanolamines Chemical class 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- PJGSXYOJTGTZAV-UHFFFAOYSA-N pinacolone Chemical compound CC(=O)C(C)(C)C PJGSXYOJTGTZAV-UHFFFAOYSA-N 0.000 description 1
- 108010064470 polyaspartate Proteins 0.000 description 1
- 229920002480 polybenzimidazole Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 235000010483 polyoxyethylene sorbitan monopalmitate Nutrition 0.000 description 1
- 239000000249 polyoxyethylene sorbitan monopalmitate Substances 0.000 description 1
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- BKJVHAAOSQEZHM-UHFFFAOYSA-N prop-2-enoic acid;propyl prop-2-enoate Chemical compound OC(=O)C=C.CCCOC(=O)C=C BKJVHAAOSQEZHM-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical compound CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 description 1
- 229960000380 propiolactone Drugs 0.000 description 1
- ILVGAIQLOCKNQA-UHFFFAOYSA-N propyl 2-hydroxypropanoate Chemical compound CCCOC(=O)C(C)O ILVGAIQLOCKNQA-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical class C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 108700004121 sarkosyl Proteins 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229940057950 sodium laureth sulfate Drugs 0.000 description 1
- KSAVQLQVUXSOCR-UHFFFAOYSA-M sodium lauroyl sarcosinate Chemical compound [Na+].CCCCCCCCCCCC(=O)N(C)CC([O-])=O KSAVQLQVUXSOCR-UHFFFAOYSA-M 0.000 description 1
- 229940045885 sodium lauroyl sarcosinate Drugs 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- MDSQKJDNWUMBQQ-UHFFFAOYSA-M sodium myreth sulfate Chemical compound [Na+].CCCCCCCCCCCCCCOCCOCCOCCOS([O-])(=O)=O MDSQKJDNWUMBQQ-UHFFFAOYSA-M 0.000 description 1
- RYYKJJJTJZKILX-UHFFFAOYSA-M sodium octadecanoate Chemical compound [Na+].CCCCCCCCCCCCCCCCCC([O-])=O RYYKJJJTJZKILX-UHFFFAOYSA-M 0.000 description 1
- SXHLENDCVBIJFO-UHFFFAOYSA-M sodium;2-[2-(2-dodecoxyethoxy)ethoxy]ethyl sulfate Chemical compound [Na+].CCCCCCCCCCCCOCCOCCOCCOS([O-])(=O)=O SXHLENDCVBIJFO-UHFFFAOYSA-M 0.000 description 1
- 235000011069 sorbitan monooleate Nutrition 0.000 description 1
- 239000001593 sorbitan monooleate Substances 0.000 description 1
- 229940035049 sorbitan monooleate Drugs 0.000 description 1
- 235000011071 sorbitan monopalmitate Nutrition 0.000 description 1
- 239000001570 sorbitan monopalmitate Substances 0.000 description 1
- 229940031953 sorbitan monopalmitate Drugs 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 150000003431 steroids Chemical class 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical class C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- AGGIJOLULBJGTQ-UHFFFAOYSA-N sulfoacetic acid Chemical compound OC(=O)CS(O)(=O)=O AGGIJOLULBJGTQ-UHFFFAOYSA-N 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 239000003760 tallow Substances 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- VAOHZKXZONQRLI-UHFFFAOYSA-N tert-butyl 2-(4-methylphenyl)sulfonyloxy-2-phenylacetate Chemical compound C(C)(C)(C)OC(C(OS(=O)(=O)C1=CC=C(C=C1)C)C1=CC=CC=C1)=O VAOHZKXZONQRLI-UHFFFAOYSA-N 0.000 description 1
- MNEZBXTZLVGVNY-UHFFFAOYSA-N tert-butyl 2-(4-methylphenyl)sulfonyloxyacetate Chemical compound CC1=CC=C(S(=O)(=O)OCC(=O)OC(C)(C)C)C=C1 MNEZBXTZLVGVNY-UHFFFAOYSA-N 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- HTSABYAWKQAHBT-UHFFFAOYSA-N trans 3-methylcyclohexanol Natural products CC1CCCC(O)C1 HTSABYAWKQAHBT-UHFFFAOYSA-N 0.000 description 1
- OVTCUIZCVUGJHS-VQHVLOKHSA-N trans-dipyrrin Chemical compound C=1C=CNC=1/C=C1\C=CC=N1 OVTCUIZCVUGJHS-VQHVLOKHSA-N 0.000 description 1
- 239000001003 triarylmethane dye Substances 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229940116269 uric acid Drugs 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
- H01L21/46—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428
- H01L21/461—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/469—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After-treatment of these layers
- H01L21/47—Organic layers, e.g. photoresist
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
一種光阻顯影劑,包含具有25 < δd
< 15、25 < δp
< 10和30 < δh
< 6的漢森(Hansen)溶解度參數的溶劑;具有-15 < pKa
< 4的酸解離常數pKa
的酸或具有40 > pKa
> 9.5的pKa
的鹼;以及螯合物。
Description
本發明實施例有關於光阻顯影劑組合物和將半導體製造製程中所使用的光阻顯影的方法。
隨著消費者裝置因應消費者需求而變得越來越小,這些裝置的各個組件的尺寸也必然縮小。半導體裝置,其構成例如行動電話、電腦平板和前述類似裝置的主要組件,已經受到壓力而變得越來越小,半導體裝置內的各個裝置(例如,電晶體、電阻器、電容器等)也伴隨著相應的壓力而縮小尺寸。
在半導體裝置的製造製程中所使用的一種賦能技術(enabling technology)是使用光微影材料。將這樣的材料施加於待圖案化的膜層的表面,然後曝光於使其本身圖案化的能量。這樣的曝光修飾了感光材料的曝光區的化學和物理性質。此修飾以及在感光材料的未曝光區域中的修飾的缺乏,可用來移除一區域而不會移除另一區域,或反之亦然。
然而,由於各個裝置的尺寸已經縮小,光微影製程的製程裕度(process window)已變得越來越緊。因此,光微影製程領域的進步對於保持將裝置微縮化的能力而言是必要的,並且需要進一步改良,以滿足期望的設計標準,使得可保持朝向越來越小的組件前進。
隨著半導體工業發展到奈米技術製程節點,以追求更高的裝置密度,更高性能和更低成本,在縮小半導體的部件尺寸中一直存在著挑戰。
根據一些實施例,提供一種光阻顯影劑。此光阻顯影劑包含具有25 < δd
< 15、25 < δp
< 10和30 < δh
< 6的漢森(Hansen)溶解度參數的第一溶劑;具有-15 < pKa
< 4的酸解離常數pKa
的酸或具有40 > pKa
> 9.5的pKa
的鹼;以及螯合物。
根據一些實施例,提供一種在光阻中形成圖案的方法。此方法包含形成光阻層於基底上,且選擇性地使光阻層曝光於光化輻射,以形成潛在圖案。藉由將顯影劑施加於經選擇性曝光的光阻層,將潛在圖案顯影,以形成圖案。其中顯影劑包含具有25 < δd
< 15、25 < δp
< 10和30 < δh
< 6的漢森(Hansen)溶解度參數的溶劑;具有-15 < pKa
< 4的酸解離常數pKa
的酸,或具有40 > pKa
> 9.5的pKa
的鹼;以及螯合物。
根據一些實施例,提供一種在光阻中形成圖案的方法。此方法包含在基底上形成光阻層。選擇性地使光阻層曝光於光化輻射,藉此在光阻層曝光於光化輻射的區域中,使光阻層交聯。藉由將液體顯影劑施加於光阻層,將光阻層顯影,來除去光阻層曝光於光化輻射的區域。
應了解的是,以下內容提供了許多不同的實施例或範例,用於實施本發明實施例的不同部件。組件和配置的具體實施例或範例描述如下,以簡化本發明實施例。當然,這些僅僅是範例,並非用以限定本發明實施例。舉例來說,元件的尺寸不限於所揭露的範圍或數值,但可取決於裝置的製程條件和/或期望的性質。再者,敘述中若提及第一部件形成於第二部件之上或上方,可能包含第一和第二部件直接接觸的實施例,也可能包含額外的部件形成於第一和第二部件之間,使得第一和第二部件不直接接觸的實施例。為了簡單且清楚,各種部件的尺寸可依照不同的比例任意地繪製。
再者,為了容易描述,在此可以使用例如「在…底下」、「在…下方」、「下」、「在…上方」、「上」等空間相對用語,以描述如圖所示的一個元件或部件與另一個(或另一些)元件或部件之間的關係。除了圖中所示的方位外,空間相對用語可涵蓋裝置在使用或操作中的不同方位。裝置可以採用其他方位定向(旋轉90度或在其他方位),並且在此使用的空間相對描述可以同樣地作出相應的解釋。此外,「由...所形成」可指「包含」或「由...所組成」。
第1圖繪示根據本發明的實施例之製造半導體裝置的製程流程100。在一些實施例中,在步驟S110中,將光阻塗佈在待圖案化的膜層或基底10的表面上,以形成光阻層15,如第2圖所示。然後,在一些實施例中,光阻層15經歷第一烘烤步驟S120,以將光阻組合物中的溶劑蒸發。以足夠將光阻層15硬化和乾燥的溫度和時間,來烘烤光阻層15。在一些實施例中,將光阻層加熱至約40° C到約250° C的溫度持續約10秒至約10分鐘。
在第一烘烤步驟S120之後,在步驟S130中,光阻層15選擇性地曝光於光化輻射(actinic radiation) 45 (參見第3圖)。在一些實施例中,光阻層15選擇性地曝光於紫外線輻射。在一些實施例中,紫外線輻射是深紫外線輻射。在一些實施例中,紫外線輻射是極紫外線(EUV)輻射。在一些實施例中,輻射是電子束。
如第3圖所示,在一些實施例中,在照射光阻層15之前,曝光輻射45穿過光罩30。在一些實施例中,光罩具有將被複製於光阻層15中的圖案。在一些實施例中,藉由光罩基底40上的不透明圖案35,來形成圖案。可藉由對紫外線輻射不透明的材料,例如鉻(chromium),來形成不透明圖案35,而光罩基底40由對紫外線輻射透明的材料所形成,例如熔融石英(fused quartz)。
相對於光阻層未曝光於輻射的未曝光區52,光阻層曝光於輻射的曝光區50經歷化學反應,從而改變其在後續施加的顯影劑中的溶解度。在一些實施例中,光阻層曝光於輻射的曝光區50經歷交聯反應。
接下來,在步驟S140中,光阻層15經歷曝光後烘烤。在一些實施例中,將光阻層15加熱至約50° C到約160° C的溫度持續約20秒至約120秒。可使用曝光後烘烤,以輔助在曝光的期間,由輻射45照射光阻層15所產生的酸/鹼/自由基的產生、分散和反應。這樣的協助有助於產生或增強使光阻層中的曝光區50和未曝光區52間產生化學差異的化學反應。這些化學差異也導致曝光區50和未曝光區52之間的溶解度差異。
隨後,在步驟S150中,藉由顯影劑施加至選擇性曝光的光阻層,來將選擇性曝光的光阻層顯影。如第4圖所示,將光阻顯影劑57從分配器62供應到光阻層15。在一些實施例中,光阻層的曝光區50被光阻顯影劑57移除,在光阻層15中形成開口的圖案55,以露出基底10,如第5圖所示。
在一些實施例中,光阻層15中的開口的圖案55延伸至待圖案化的膜層或基底10中,以在基底10中產生開口的圖案55’,從而將光阻層15中的圖案轉移至基底10中,如第6圖所示。使用一或多種合適的蝕刻劑,藉由蝕刻將圖案延伸至基底中。在一些實施例中,在蝕刻步驟的期間,至少部分地移除未曝光的光阻層15。在另一些實施例中,在藉由使用合適的光阻剝離溶劑或藉由光阻灰化步驟,來蝕刻基底10之後,移除未曝光的光阻層15。
在一些實施例中,基底10包含單晶半導體層(single crystalline semiconductor layer)在至少其表面部分上。基底10可包含單晶半導體材料,例如但不限於Si、Ge、SiGe、GaAs、InSb、GaP、GaSb、InAlAs、InGaAs、GaSbP、GaAsSb和InP。在一些實施例中,基底10是絕緣體上矽(silicon-on insulator,SOI)基底的矽層。在某些實施例中,基底10由晶體Si所形成。
基底10可在其表面區域中包含一或多個緩衝層(未繪示)。緩衝層可有助於逐漸地將晶格常數從基底的晶格常數改變為後續形成的源極/汲極區的晶格常數。緩衝層可由磊晶成長的單晶半導體材料所形成,例如但不限於Si、Ge、GeSn、SiGe、GaAs、InSb、GaP、GaSb、InAlAs、InGaAs、GaSbP、GaAsSb、GaN、GaP和InP。在一實施例中,在矽基底10上磊晶成長矽鍺(SiGe)緩衝層。SiGe緩衝層的鍺濃度可從最底部緩衝層的30原子%增加到最頂部緩衝層的70原子%。
在一些實施例中,基底10包含至少一種金屬、金屬合金和具有式MXa
的金屬/氮化物/硫化物/氧化物/矽化物,其中M是金屬,而X是N、S、Se、O、Si,且a為約0.4至約2.5。在一些實施例中,基底10包含鈦、鋁、鈷、釕(ruthenium)、氮化鈦、氮化鎢、氮化鉭及前述之組合。
在一些實施例中,基底10包含至少具有式MXb
的矽、金屬氧化物和金屬氮化物的介電質,其中M是金屬或Si,X是N或O,且b的範圍是約0.4至約2.5。在一些實施例中,基底10包含二氧化矽、氮化矽、氧化鋁、氧化鉿、氧化鑭(lanthanum oxide)及前述之組合。
光阻層15是藉由曝光於光化輻射而圖案化的感光層。通常,被入射輻射照射的光阻區域的化學性質的改變方式,取決於所使用的光阻的類型。光阻層15通常是正型光阻或負型光阻。傳統上,正型光阻是指當曝光於輻射(通常為UV光)時,變成可溶於顯影劑中,而光阻未曝光(或曝光較少)的區域不溶於顯影劑中的光阻材料。另一方面,負型光阻傳統上是指當曝光於輻射時,變成不溶於顯影劑中,而光阻未曝光(或曝光較少)的區域可溶於顯影劑中的光阻材料。負型光阻在曝光於輻射時,變成不可溶的區域可能因曝光於輻射所引起的交聯反應,變成不可溶。
光阻是正型或負型可取決於用於將光阻顯影的顯影劑的類型。舉例而言,當顯影劑是基於水的顯影劑,例如氫氧化四甲基銨(tetramethylammonium hydroxide,TMAH)溶液時,一些正型光阻提供正型圖案(即, 曝光區被顯影劑移除)。另一方面,當顯影劑為有機溶劑時,相同的光阻提供負型圖案(即,未曝光區被顯影劑移除)。再者,在用TMAH溶液顯影的一些負型光阻中,光阻的未曝光區被TMAH溶液移除,而光阻的曝光區,其曝光於光化輻射後經歷交聯,在顯影後留在基底上。在本發明的一些實施例中,負型光阻曝光於光化輻射。由於曝光於光化輻射,負型光阻的曝光部分經歷交聯,且在顯影期間,光阻的曝光、交聯部分被顯影劑移除,使光阻的未曝光區留在基底上。
在一實施例中,光阻層15是曝光於輻射後,經歷交聯反應的負型光阻。在一些實施例中,根據本發明實施例的光阻包含聚合物樹脂以及一或多種光活性化合物(photoactive compound,PAC)於溶劑中。在一些實施例中,聚合物樹脂包含烴結構(例如脂環烴(alicyclic hydrocarbon)結構),其含有一或多種將分解的基團(例如酸不穩定基團)或與由PAC所產生的酸、鹼或自由基(如下面進一步所描述)混合時,會反應的基團。在一些實施例中,烴結構包含形成聚合物樹脂的骨架主鏈的重複單元。此重複單元可包含丙烯酸酯(acrylic ester)、甲基丙烯酸酯(methacrylic ester)、巴豆酸酯(crotonic ester)、乙烯基酯(vinyl ester)、馬來酸二酯(maleic diester)、富馬酸二酯(fumaric diester)、衣康酸二酯(itaconic diester)、(甲基)丙烯腈((meth)acrylonitrile)、(甲基)丙烯醯胺((meth)acrylamide)、苯乙烯(styrene)、乙烯基醚(vinyl ether)、這些的組合或前述類似單元。
在一些實施例中,用於烴結構的重複單元的具體結構包含以下所列的一或多個:丙烯酸甲酯(methyl acrylate)、丙烯酸乙酯(ethyl acrylate)、丙烯酸正丙酯(n-propyl acrylate)、丙烯酸異丙酯(isopropyl acrylate)、丙烯酸正丁酯(n-butyl acrylate)、丙烯酸異丁酯(isobutyl acrylate)、丙烯酸叔丁酯(tert-butyl acrylate)、丙烯酸正己酯(n-hexyl acrylate)、丙烯酸2-乙基己酯(2-ethylhexyl acrylate)、丙烯酸乙醯氧基乙酯(acetoxyethyl acrylate)、丙烯酸苯酯(phenyl acrylate)、丙烯酸2-羥乙酯(2-hydroxyethyl acrylate)、丙烯酸2-甲氧基乙酯(2-methoxyethyl acrylate)、丙烯酸2-乙氧基乙酯(2-ethoxyethyl acrylate)、丙烯酸2-(2-甲氧基乙氧基)乙酯(2-(2-methoxyethoxy)ethyl acrylate)、丙烯酸環己酯(cyclohexyl acrylate)、丙烯酸芐酯(benzyl acrylate)、2-烷基-2-金剛烷基 (甲基)丙烯酸酯(2-alkyl-2-adamantyl (meth)acrylate)或二烷基(1-金剛烷基)甲基(甲基)丙烯酸酯 (dialkyl(1-adamantyl)methyl (meth)acrylate)、甲基丙烯酸甲酯(methyl methacrylate)、甲基丙烯酸乙酯(ethyl methacrylate)、甲基丙烯酸正丙酯(n-propyl methacrylate)、甲基丙烯酸異丙酯(isopropyl methacrylate)、甲基丙烯酸正丁酯(n-butyl methacrylate)、甲基丙烯酸異丁酯(isobutyl methacrylate)、甲基丙烯酸叔丁酯(tert-butyl methacrylate)、甲基丙烯酸正己酯(n-hexyl methacrylate)、甲基丙烯酸2-乙基己酯(2-ethylhexyl methacrylate)、甲基丙烯酸乙醯氧基乙酯(acetoxyethyl methacrylate)、甲基丙烯酸苯酯(phenyl methacrylate)、甲基丙烯酸2-羥乙酯(2-hydroxyethyl methacrylate)、甲基丙烯酸2-甲氧基乙酯(2-methoxyethyl methacrylate)、甲基丙烯酸2-乙氧基乙酯(2-ethoxyethyl methacrylate)、甲基丙烯酸2-(2-甲氧基乙氧基)乙酯(2-(2-methoxyethoxy)ethyl methacrylate)、甲基丙烯酸環己酯(cyclohexyl methacrylate)、甲基丙烯酸芐酯(benzyl methacrylate)、甲基丙烯酸3-氯-2-羥丙酯(3-chloro-2-hydroxypropyl methacrylate)、甲基丙烯酸3-乙醯氧基-2-羥丙酯(3-acetoxy-2-hydroxypropyl methacrylate)、甲基丙烯酸3-氯乙醯氧基-2-羥丙酯(3-chloroacetoxy-2-hydroxypropyl methacrylate)、巴豆酸丁酯(butyl crotonate)、巴豆酸己酯(hexyl crotonate)和前述類似化合物。乙烯基酯(vinyl ester)的範例包含乙酸乙烯酯(vinyl acetate)、丙酸乙烯酯(vinyl propionate)、丁酸乙烯酯(vinyl butylate)、甲氧基乙酸乙烯酯(vinyl methoxyacetate)、苯甲酸乙烯酯(vinyl benzoate)、馬來酸二甲酯(dimethyl maleate)、馬來酸二乙酯(diethyl maleate)、馬來酸二丁酯(dibutyl maleate)、富馬酸二甲酯(dimethyl fumarate)、富馬酸二乙酯(diethyl fumarate)、富馬酸二丁酯(dibutyl fumarate)、衣康酸二甲酯(dimethyl itaconate)、衣康酸二乙酯(diethyl itaconate)、衣康酸二丁酯(dibutyl itaconate)、丙烯醯胺(acrylamide)、甲基丙烯醯胺(methyl acrylamide)、乙基丙烯醯胺(ethyl acrylamide)、丙基丙烯醯胺(propyl acrylamide)、正丁基丙烯醯胺(n-butyl acrylamid e)、叔丁基丙烯醯胺(tert-butyl acrylamide)、環己基丙烯醯胺(cyclohexyl acrylamide)、2-甲氧基乙基丙烯醯胺(2-methoxyethyl acrylamide)、二甲基丙烯醯胺(dimethyl acrylamide)、二乙基丙烯醯胺(diethyl acrylamide)、苯基丙烯醯胺(phenyl acrylamide)、芐基丙烯醯胺(benzyl acrylamide)、甲基丙烯醯胺(methacrylamide)、甲基甲基丙烯醯胺(methyl methacrylamide)、乙基甲基丙烯醯胺(ethyl methacrylamide)、丙基甲基丙烯醯胺(propyl methacrylamide)、正丁基甲基丙烯醯胺(n-butyl methacrylamide)、叔丁基甲基丙烯醯胺(tert-butyl methacrylamide)、環己基甲基丙烯醯胺(cyclohexyl methacrylamide)、2-甲氧基乙基甲基丙烯醯胺(2-methoxyethyl methacrylamide)、二甲基甲基丙烯醯胺(dimethyl methacrylamide)、二乙基甲基丙烯醯胺(diethyl methacrylamide)、苯基甲基丙烯醯胺(phenyl methacrylamide)、芐基甲基丙烯醯胺(benzyl methacrylamide)、甲基乙烯基醚(methyl vinyl ether)、丁基乙烯基醚(butyl vinyl ether)、己基乙烯基醚(hexyl vinyl ether)、甲氧基乙基乙烯基醚(methoxyethyl vinyl ether)、二甲基胺基乙基乙烯基醚(dimethylaminoethyl vinyl ether)或前述類似化合物。苯乙烯(styrene)的範例包括苯乙烯(styrene)、甲基苯乙烯(methyl styrene)、二甲基苯乙烯(dimethyl styrene)、三甲基苯乙烯(trimethyl styrene)、乙基苯乙烯(ethyl styrene)、異丙基苯乙烯(isopropyl styrene)、丁基苯乙烯(butyl styrene)、甲氧基苯乙烯(methoxy styrene)、丁氧基苯乙烯(butoxy styrene)、乙醯氧基苯乙烯(acetoxy styrene)、氯苯乙烯(chloro styrene)、二氯苯乙烯(dichloro styrene)、溴苯乙烯(bromo styrene)、苯甲酸乙烯基酯(vinyl methyl benzoate)、α-甲基苯乙烯(α-methyl styrene)、馬來醯亞胺(maleimide)、乙烯基吡啶(vinylpyridine)、乙烯基吡咯烷酮(vinylpyrrolidone)、乙烯基咔唑(vinylcarbazole)、前述之組合或前述類似化合物。
在一些實施例中,烴結構的重複單元亦具有被取代至其中的單環或多環烴結構,或者單環或多環烴結構是重複單元,以形成脂環烴(alicyclic hydrocarbon)結構。在一些實施例中,單環結構的具體範例包含雙環烷烴(bicycloalkane)、三環烷烴(tricycloalkane)、四環烷烴(tetracycloalkane)、環戊烷(cyclopentane)、環己烷(cyclohexane)或前述類似化合物。在一些實施例中,多環結構的具體範例包含金剛烷(adamantane)、降冰片烷(norbornane)、異冰片烷(isobornane)、三環癸烷(tricyclodecane)、四環十二烷(tetracycododecane)或前述類似化合物。
將分解的基團,也稱為離去基團(leaving group),或者在PAC是光酸產生劑的一些實施例中,也稱為酸不穩定基團,連接到烴結構上,使得它會與在曝光期間由PAC產生的酸/鹼/自由基反應。在一些實施例中,將分解的基團是羧酸基團(carboxylic acid group)、氟化醇基團(fluorinated alcohol group)、酚醇基團(phenolic alcohol group)、磺酸基團(sulfonic group)、磺醯胺基團(sulfonamide group)、磺醯亞胺基團(sulfonylimido group)、(烷基磺醯基)(烷基羰基)亞甲基團((alkylsulfonyl)(alkylcarbonyl)methylene group)、(烷基磺醯基)(烷基羰基)亞胺基團((alkylsulfonyl)(alkyl-carbonyl)imido group)、雙(烷基羰基)亞甲基團(bis(alkylcarbonyl)methylene group)、雙(烷基羰基)亞胺基團(bis(alkylcarbonyl)imido group)、雙(烷基磺醯基)亞甲基團(bis(alkylsylfonyl)methylene group)、雙(烷基磺醯基)亞胺基團(bis(alkylsulfonyl)imido group)、三(烷基羰基)亞甲基團(tris(alkylcarbonyl) methylene group)、三(烷基磺醯基)亞甲基團(tris(alkylsulfonyl)methylene group)、這些的組合或前述類似基團。在一些實施例中,用於氟化醇基團的具體基團包含氟化羥基烷基團(fluorinated hydroxyalkyl group),例如六氟異丙醇基團(hexafluoroisopropanol group)。用於羧酸基團的具體基團包括丙烯酸基團(acrylic acid group)、甲基丙烯酸基團(methacrylic acid group)或前述類似基團。
在一些實施例中,聚合物樹脂亦包含連接至烴結構的其他基團,其有助於改善可聚合樹脂的各種性質。舉例而言,烴結構包含內酯基團(lactone group)有助於減少將光阻顯影之後的線邊緣粗糙度的量,從而有助於減少顯影期間發生的缺陷的數量。在一些實施例中,內酯基團包含具有5-7員的環,但任何可替代地使用合適的內酯結構作為內酯基團。
在一些實施例中,聚合物樹脂包含可有助於增加光阻層15與底下結構(例如,基底10)的黏性的基團。極性基團可用於幫助增加黏性。合適的極性基團包含羥基團(hydroxyl group)、氰基團(cyano group)或前述類似基團,但可替代地使用任何合適的極性基團。
選擇性地,在一些實施例中,聚合物樹脂包含一或多個脂環烴結構,前述一或多個脂環烴結構亦不含有將分解的基團。在一些實施例中,不含有將分解的基團的烴結構包含,例如1-金剛烷基(甲基)丙烯酸酯(1-adamantyl(meth)acrylate)、三環癸烯基(甲基)丙烯酸酯(tricyclodecanyl (meth)acrylate)、環己基(甲基丙烯酸酯)(cyclohexayl (methacrylate))、這些的組合或前述之類似結構。
此外,光阻的一些實施例包含一或多種光活性化合物(photoactive compound,PAC)。 PAC是光活性成分,例如光酸產生劑、光鹼產生劑、自由基產生劑或前述類似成分。 PAC可為正作用(positive-acting)或負作用(negative-acting)。在PAC是光酸產生劑的一些實施例中,PAC包含鹵化三嗪(halogenated triazine)、鎓鹽(onium salt)、重氮鹽(diazonium salt)、芳香族重氮鹽(aromatic diazonium salt)、鏻鹽(phosphonium salt)、鋶鹽(sulfonium salt)、碘鹽(iodonium salts)、醯亞胺磺酸鹽(imide sulfonate)、肟磺酸鹽(oxime sulfonate)、重氮二碸(diazodisulfone)、二碸(disulfone)、鄰硝基芐基磺酸鹽(o-nitrobenzylsulfonate)、磺化酯(sulfonated ester)、鹵代磺醯氧基二甲醯亞胺(halogenated sulfonyloxy dicarboximide)、重氮二碸(diazodisulfone)、α-氰基羥基胺磺酸鹽(α-cyanooxyamine-sulfonate)、亞胺磺酸鹽(imidesulfonate)、酮二氮碸(ketodiazosulfone)、磺醯基二氮雜酯(sulfonyldiazoester)、1,2-二(芳基磺醯基)肼(1,2-di(arylsulfonyl)hydrazine)、硝基芐基酯(nitrobenzyl ester)和均三嗪衍生物(s-triazine derivative)、這些的組合或前述之類似化合物。
光酸產生劑的具體範例包含α-(三氟甲基磺醯氧基)-雙環[2.2.1]庚-5-烯-2,3-二碳 - 鄰二醯亞胺 (α-(trifluoromethylsulfonyloxy)-bicyclo[2.2.1]hept-5-ene-2,3-dicarb-o-ximide,MDT)、N-羥基萘二甲醯亞胺(N-hydroxy-naphthalimide,DDSN)、苯偶姻甲苯磺酸鹽(benzoin tosylate)、叔丁基苯基-α-(對甲苯磺醯氧基)-乙酸甲酯(t-butylphenyl-α-(p-toluenesulfonyloxy)-acetate)和叔丁基-α-(對甲苯磺醯氧基)-乙酸甲酯(t-butyl-α-(p-toluenesulfonyloxy)-acetate)、三芳基鋶(triarylsulfonium)和二芳基碘六氟銻酸鹽(diaryliodonium hexafluoroantimonate)、六氟砷酸鹽(hexafluoroarsenate)、三氟甲磺酸鹽(trifluoromethanesulfonate)、碘全氟辛烷磺酸鹽(iodonium perfluorooctanesulfonate)、N-樟腦磺醯氧基萘二甲醯亞胺(N-camphorsulfonyloxynaphthalimide)、N-五氟苯磺醯氧基萘二甲醯亞胺(N-pentafluorophenylsulfonyloxynaphthalimide)、離子碘磺酸鹽(ionic iodonium sulfonate),例如二芳基碘(烷基或芳基)磺酸鹽(diaryl iodonium (alkyl or aryl)sulfonate)和雙-(二叔丁基苯基)碘樟腦磺酸鹽(bis-(di-t-butylphenyl)iodonium camphanylsulfonate)、全氟烷磺酸鹽(perfluoroalkanesulfonate)例如全氟戊烷磺酸鹽(perfluoropentanesulfonate)、全氟辛烷磺酸鹽(perfluorooctanesulfonate)、全氟甲磺酸(perfluoromethanesulfonate)、三氟甲磺酸芳基(例如苯基或芐基)酯,例如三苯基鋶三氟甲磺酸鹽(triphenylsulfonium triflate)或雙-(叔丁基苯基)碘三氟甲磺酸鹽(bis-(t-butylphenyl)iodonium triflate);鄰苯三酚衍生物(pyrogallol derivative)(例如鄰苯三酚的三甲磺酸鹽(trimesylate of pyrogallol))、三氟甲磺酸酯的羥基醯亞胺(trifluoromethanesulfonate esters of hydroxyimides)、α,α’-雙磺醯基 - 二氮雜甲烷(α,α'-bis-sulfonyl-diazomethane)、硝基取代的芐醇的磺酸酯(sulfonate esters of nitro-substituted benzyl alcohol)、萘醌-4-二疊氮化物(naphthoquinone-4-diazide), 烷基二碸(alkyl disulfone)或前述類似化合物。
在PAC是自由基產生劑的一些實施例中,PAC包含N-苯基甘胺酸(n-phenylglycine);芳香酮(aromatic ketone),包括二苯甲酮(benzophenone)、N,N’-四甲基-4,4’-二胺基二苯甲酮(N,N'-tetramethyl-4,4'-diaminobenzophenone)、N,N’-四乙基-4,4’,-二胺基二苯甲酮(N,N'-tetraethyl-4,4'-diaminobenzophenone)、4-甲氧基-4’-二甲基胺基苯並-苯酮(4-methoxy-4'-dimethylaminobenzo-phenone)、3,3’-二甲基-4-甲氧基二苯甲酮(3,3'-dimethyl-4-methoxybenzophenone)、p,p’-雙(二甲基胺基)苯並-苯酮(p,p'-bis(dimethylamino)benzo-phenone)、p,p’-雙(二乙基胺基)-二苯甲酮(p,p'-bis(diethylamino)-benzophenone);蒽醌(anthraquinone)、2-乙基蒽醌(2-ethylanthraquinone);萘醌(naphthaquinone);和菲醌(phenanthraquinone);苯偶姻(benzoin),包含苯偶姻、苯偶姻甲醚(benzoinmethylether)、苯偶姻異丙基醚(benzoinisopropylether)、苯偶姻-正丁基醚(benzoin-n-butylether)、苯偶姻-苯基醚(benzoin-phenylether)、甲基苯偶姻(methylbenzoin)和乙基苯偶姻(ethylbenzoin);芐基衍生物(benzyl derivative),包含二芐基(dibenzyl)、芐基二苯基二硫醚(benzyldiphenyldisulfide)和芐基二甲基縮酮(benzyldimethylketal);吖啶衍生物(acridine derivative),包含9-苯基吖啶(9-phenylacridine)和1,7-雙(9-吖啶基)庚烷(1,7-bis(9-acridinyl)heptane);噻噸酮(thioxanthone),包含2-氯噻噸酮(2-chlorothioxanthone)、2-甲基噻噸酮(2-methylthioxanthone)、2,4-二乙基噻噸酮(2,4-diethylthioxanthone)、2,4-二甲基噻噸酮(2,4-dimethylthioxanthone)和2-異丙基噻噸酮(2-isopropylthioxanthone);苯乙酮(acetophenone),包含1,1-二氯苯乙酮(1,1-dichloroacetophenone)、對叔丁基二氯苯乙酮(p-t-butyldichloro-acetophenone)、2,2-二乙氧基苯乙酮(2,2-diethoxyacetophenone)、2,2-二甲氧基-2-苯基苯乙酮(2,2-dimethoxy-2-phenylacetophenone)和2,2-二氯-4-苯氧基苯乙酮(2,2-dichloro-4-phenoxyacetophenone);2,4,5-三芳基咪唑二聚體(2,4,5-triarylimidazole dimer),包含2-(鄰氯苯基)-4,5-二苯基咪唑二聚體(2-(o-chlorophenyl)-4,5-diphenylimidazole dimer)、2-(鄰氯苯基)-4,5-二 - (間甲氧基苯基咪唑二聚體(2-(o-fluorophenyl)-4,5-diphenylimidazole dimer)、2-(o)-氟苯基)-4,5-二苯基咪唑二聚體(2-(o-methoxyphenyl)-4,5-diphenylimidazole dimer),2-(鄰甲氧基苯基)-4,5-二苯基咪唑二聚體(2-(p-methoxyphenyl)-4,5-diphenylimidazole dimer)、2-(對甲氧基苯基)-4,5-二苯基咪唑二聚體(2,4-di(p-methoxyphenyl)-5-phenylimidazole dimer)、2,4-二(對甲氧基苯基) )-5-苯基咪唑二聚體(2-(2,4-dimethoxyphenyl)-4,5-diphenylimidazole dimer)2-(2,4-二甲氧基苯基)-4,5-二苯基咪唑二聚體和2-(對甲基巰基苯基)-4,5-二苯基咪唑二聚體(2-(p-methylmercaptophenyl)-4,5-diphenylimidazole dimer)、這些的組合或前述類似化合物。
在PAC是光鹼產生劑的一些實施例中,PAC包含四級銨二硫代胺基甲酸鹽(quaternary ammonium dithiocarbamate)、α胺基酮(α aminoketone)、含有例如二苯並苯肟六亞甲基二脲(dibenzophenoneoxime hexamethylene diurethan)、四有機基硼酸銨鹽(ammonium tetraorganylborate salt)和N-(2-硝基芐氧基羰基)環胺(N-(2-nitrobenzyloxycarbonyl)cyclic amine) 的分子的肟-胺基甲酸乙酯(oxime-urethane)、這些的組合或前述類似化合物。
如本發明所屬技術領域中具有通常知識者將理解的,本文列出的化學化合物僅作為PAC的說明性範例,並不意圖將實施例限於僅具體描述的那些PAC。而是,可使用任何合適的PAC,且所有這樣的PAC完全意圖包含於本實施例的範圍內。
在一些實施例中,將交聯劑加到光阻中。交聯劑與來自聚合物樹脂中的一種烴結構的一個基團反應,且亦與來自分開的一種烴結構的第二基團反應,以使兩個烴結構交聯和鍵結在一起。此鍵結和交聯增加了交聯反應的聚合物產物的分子重量(molecular weight),且增加了光阻的整體連接密度。密度和連接密度的這種增加有助於改善光阻圖案。
在一些實施例中,交聯劑具有以下結構:其中C是碳,n的範圍是1至15; A和B獨立地包含氫原子、羥基團、鹵化物(halide)、芳香族碳環(aromatic carbon ring),或直鏈或環狀烷基、烷氧基/氟(alkoxyl/fluoro)、具有1至12個碳數的烷基/氟烷氧基鏈,以及每個碳C含有A和B;除了當n = 1時,X和Y與相同的碳C鍵結,碳鏈C的第一末端的第一末端碳C包含X,而碳鏈的第二末端的第二末端碳C包含Y,其中X和Y獨立地包含胺基團(amine group)、硫醇基團(thiol group)、羥基、異丙醇基團(isopropyl alcohol group)或異丙胺基團(isopropyl amine group)。
可作為交聯劑的材料的具體範例包含以下:
或者,不是或除了將交聯劑添加到光阻組合物以外,在一些實施例中,將偶聯劑加入,其中除了交聯劑之外,還將偶聯劑加入。偶聯劑藉由在交聯劑之前與聚合物樹脂中的烴結構上的基團反應,來輔助交聯反應,使交聯反應的反應能量減少且提高交聯反應的速率。然後,鍵結的偶聯劑與交聯劑反應,從而使交聯劑偶聯至聚合物樹脂上。
或者,在將偶聯劑添加到光阻,而沒有交聯劑的一些實施例中,偶聯劑用於使來自聚合物樹脂中的一個烴結構的一個基團偶聯至來自烴結構中的分開的一個的第二基團,以使兩個聚合物交聯和鍵結在一起。然而,在這樣的實施例中,與交聯劑不同,偶聯劑不作為聚合物的一部分保留,且僅有助於將一烴結構直接鍵結至另一烴結構。
在一些實施例中,偶聯劑具有以下結構:其中R是碳原子、氮原子、硫原子或氧原子;M包含氯原子、溴原子、碘原子、--NO2
;--SO3
-;--H--;-- CN;--NCO、--OCN;--CO2
-;--OH;--OR*、--OC(O)CR*;--SR、-- SO2
N(R*)2
;--SO2
R*;SOR;--OC(O)R*;--C(O)OR*;--C(O)R*;--Si(OR*)3
;--Si(R*)3
;環氧基團或前述類似基團;且R*是經取代或未取代的C1-C12烷基、C1-C12芳香基、C1-C12芳烷基或前述類似基團。在一些實施例中,用作偶聯劑的材料的具體範例包含以下:
將光阻的各個成分置於溶劑中,以有助於光阻的混合和分配。為了有助於光阻的混合和分配,至少部分地基於為聚合物樹脂以及PAC所選擇的材料,來選擇溶劑。在一些實施例中,選擇使聚合物樹脂和PAC可均勻地溶解在溶劑中並分配在待圖案化的膜層上的這種溶劑。
在一些實施例中,溶劑是有機溶劑,且包含任何合適的溶劑,例如酮(ketone)、醇(alcohol)、多元醇(polyalcohol)、醚(ether)、二醇醚(glycol ether)、環醚(cyclic ether)、芳香烴(aromatic hydrocarbon)、酯(ester)、丙酸酯(propionate)、乳酸酯(lactate)、乳酸酯(lactic ester)、亞烷基二醇單烷基醚(alkylene glycol monoalkyl ether)、乳酸烷基酯(alkyl lactate)、烷基烷氧基丙酸酯(alkyl alkoxypropionate)、環內酯(cyclic lactone)、含有環的單酮化合物(monoketone compound)、碳酸亞烷基酯(alkylene carbonate)、烷基烷氧基乙酸酯(alkyl alkoxyacetate)、丙烯酸烷基酯(alkyl pyruvate)、乳酸酯(lactate ester)、乙二醇烷基醚乙酸酯(ethylene glycol alkyl ether acetate)、二乙二醇(diethylene glycol)、丙二醇烷基醚乙酸酯(propylene glycol alkyl ether acetate)、亞烷基二醇烷基醚酯(alkylene glycol alkyl ether ester)、亞烷基二醇單烷基酯(alkylene glycol monoalkyl ester)或前述類似溶劑。
可作為光阻的溶劑的材料的具體範例包含丙酮(acetone)、甲醇(methanol)、乙醇(ethanol)、甲苯(toluene)、二甲苯(xylene)、4-羥基-4-甲基-2-戊酮(4-hydroxy-4-methyl-2-pentatone)、四氫呋喃(tetrahydrofuran)、甲基乙基酮(methyl ethyl ketone)、環己酮(cyclohexanone)、甲基異戊基酮(methyl isoamyl ketone)、2-庚酮(2-heptanone)、乙二醇(ethylene glycol)、乙二醇單乙酸酯(ethylene glycol monoacetate)、乙二醇二甲醚(ethylene glycol dimethyl ether)、乙二醇甲乙醚(ethylene glycol methylethyl ether)、乙二醇單乙醚(ethylene glycol monoethyl ether)、乙酸甲基溶纖劑(methyl cellosolve acetate)、乙酸乙基溶纖劑(ethyl cellosolve acetate)、二甘醇(diethylene glycol)、二乙二醇單乙酸酯(diethylene glycol monoacetate)、二乙二醇單甲醚(diethylene glycol monomethyl ether)、二乙二醇二乙醚(diethylene glycol diethyl ether)、二乙二醇二甲醚(diethylene glycol dimethyl ether)、二乙二醇乙基甲基醚(diethylene glycol ethylmethyl ether)、二乙二醇單乙醚(diethethylene glycol monoethyl ether)、二乙二醇單丁醚(diethylene glycol monobutyl ether)、2-羥基丙酸乙酯(ethyl 2-hydroxypropionate)、2-羥基-2-甲基丙酸甲酯(methyl 2-hydroxy-2-methylpropionate)、2-羥基-2-甲基丙酸乙酯(ethyl 2-hydroxy-2-methylpropionate)、乙氧基乙酸乙酯(ethyl ethoxyacetate)、羥基乙酸乙酯(ethyl hydroxyacetate)、2-羥基-2-甲基丁酸甲酯(methyl 2-hydroxy-2-methylbutanate)、3-甲氧基丙酸甲酯(methyl 3-methoxypropionate)、3-甲氧基丙酸乙酯(ethyl 3-methoxypropionate)、3 - 乙氧基丙酸甲酯(methyl 3-ethoxypropionate)、3-乙氧基丙酸乙酯(ethyl 3-ethoxypropionate)、乙酸甲酯(methyl acetate)、乙酸乙酯(ethyl acetate)、乙酸丙酯(propyl acetate)、乙酸丁酯(butyl acetate)、乳酸甲酯(methyl lactate)、乳酸乙酯(ethyl lactate)、乳酸丙酯(propyl lactate)、乳酸丁酯(butyl lactate)、丙二醇(propylene glycol)、丙二醇單乙酸酯(propylene glycol monoacetate)、丙二醇單乙醚乙酸酯(propylene glycol monoethyl ether acetate)、丙二醇單甲醚乙酸酯(propylene glycol monomethyl ether acetate)、丙二醇單丙基甲基醚乙酸酯(propylene glycol monopropyl methyl ether acetate)、丙二醇單丁醚乙酸酯(propylene glycol monobutyl ether acetate)、丙二醇單丁醚乙酸酯(propylene glycol monobutyl ether acetate)、丙二醇單甲醚丙酸酯(propylene glycol monomethyl ether propionate)、丙二醇單乙醚丙酸酯(propylene glycol monoethyl ether propionate)、丙二醇甲醚乙酸酯(propylene glycol methyl ether acetate)、丙二醇乙醚乙酸酯(propylene glycol ethyl ether acetate)、乙二醇單甲醚乙酸酯(ethylene glycol monomethyl ether acetate)、乙二醇單乙醚乙酸酯(ethylene glycol monoethyl ether acetate)、丙二醇單甲醚(propylene glycol monomethyl ether)、丙二醇單乙醚(propylene glycol monoethyl ether)、丙二醇單丙醚(propylene glycol monopropyl ether)、丙二醇單丁醚(propylene glycol monobutyl ether)、乙二醇單甲醚(ethylene glycol monomethyl ether)、乙二醇單乙醚(ethylene glycol monoethyl ether)、3-乙氧基丙酸乙酯(ethyl 3-ethoxypropionate)、3-甲氧基丙酸甲酯(methyl 3-methoxypropionate)、3-乙氧基丙酸甲酯(methyl 3-ethoxypropionate)和3-甲氧基丙酸乙酯(ethyl 3-methoxypropionate)、β-丙內酯(β-propiolactone)、β-丁內酯(β-butyrolactone)、γ-丁內酯(γ-butyrolactone)、α-甲基-γ-丁內酯(α-methyl-γ-butyrolactone)、β-甲基-γ-丁內酯(β-methyl-γ-butyrolactone)、γ-戊內酯(γ-valerolactone)、γ-己內酯(γ-caprolactone)、γ-辛內酯(γ-octanoic lactone)、α-羥基-γ-丁內酯(α-hydroxy-γ-butyrolactone)、2 - 丁酮(2-butanone)、3-甲基丁酮(3-methylbutanone)、三級丁基乙酮(pinacolone)、2-戊酮(2-pentanone)、3-戊酮(3-pentanone)、4-甲基-2-戊酮(4-methyl-2-pentanone)、2-甲基-3-戊酮(2-methyl-3-pentanone)、4,4-二甲基-2-戊酮(4,4-dimethyl-2-pentanone)、2,4-二甲基-3-戊酮(2,4-dimethyl-3-pentanone)、2,2,4,4-四甲基-3-戊酮(2,2,4,4-tetramethyl-3-pentanone)、2-己酮(2-hexanone)、3-己酮(3-hexanone)、5-甲基-3-己酮(5-methyl-3-hexanone)、2-庚酮(2-heptanone)、3-庚酮(3-heptanone)、4-庚酮(4-heptanone)、2-甲基-3-庚酮(2-methyl-3-heptanone)、5-甲基-3-庚酮(5-methyl-3-heptanone)、2,6-二甲基-4-庚酮(2,6-dimethyl-4-heptanone)、2-辛酮(2-octanone)、3-辛酮(3-octanone)、2-壬酮(2-nonanone)、3-壬酮(3-nonanone)、5-壬酮(5-nonanone)、2-癸酮(2-decanone)、3-癸酮(3-decanone)、4 - 癸酮(4-decanone)、5-己烯-2-酮(5-hexene-2-one)、3-戊烯-2-酮(3-pentene-2-one)、環戊酮(cyclopentanone)、2-甲基環戊酮(2-methylcyclopentanone)、3-甲基環戊酮(3-methylcyclopentanone)、2,2-二甲基環戊酮(2,2-dimethylcyclopentanone)、2,4,4-三甲基環戊酮(2,4,4-trimethylcyclopentanone)、環己酮(cyclohexanone)、3-甲基環己酮(3-methylcyclohexanone)、4 - 甲基環己酮(4-methylcyclohexanone)、4-乙基環己酮(4-ethylcyclohexanone)、2,2-二甲基環己酮(2,2-dimethylcyclohexanone)、2,6-二甲基環己酮(2,6-dimethylcyclohexanone)、2,2,6-三甲基環己酮(2,2,6-trimethylcyclohexanone)、環庚酮(cycloheptanone)、2-甲基環庚酮(2-methylcycloheptanone)、3-甲基環庚酮(3-methylcycloheptanone)、碳酸亞丙酯(propylene carbonate)、碳酸亞乙烯酯(vinylene carbonate)、碳酸亞乙酯(ethylene carbonate)、碳酸亞丁酯(butylene carbonate)、乙酸-2-甲氧基乙基(acetate-2-methoxyethyl)、乙酸-2-乙氧基乙基(acetate-2-ethoxyethyl)、乙酸-2-(2-乙氧基乙氧基)乙基(acetate-2-(2-ethoxyethoxy)ethyl)、乙酸-3-甲氧基-3-甲基丁基(acetate-3-methoxy-3-methylbutyl)、乙酸-1-甲氧基-2-丙基(acetate-1-methoxy-2-propyl)、二丙二醇(dipropylene glycol)、單甲醚(monomethylether)、單乙醚(monoethylether)、單丙醚(monopropylether)、單丁醚(monobutylether)、單苯醚(monophenylether)、二丙二醇單乙酸酯(dipropylene glycol monoacetate)、二噁烷(dioxane)、丙酮酸甲酯(methyl pyruvate)、丙酮酸乙酯(ethyl pyruvate)、丙酮酸丙酯(propyl pyruvate)、甲氧基丙酸甲酯(methyl methoxypropionate)、乙氧基丙酸乙酯(ethyl ethoxypropionate)、正甲基吡咯烷酮(n-methylpyrrolidone,NMP)、2-甲氧基乙基醚(2-methoxyethyl ether)(或稱二甘醇二甲醚)(diglyme)、乙二醇單甲醚(ethylene glycol monomethyl ether)、丙二醇單甲醚(propylene glycol monomethyl ether)、丙酸甲酯(methyl propionate)、丙酸乙酯(ethyl propionate)、乙氧基丙酸乙酯(ethyl ethoxy propionate)、甲乙酮(methylethyl ketone)、環己酮(cyclohexanone)、2-庚酮(2-heptanone)、環戊酮(cyclopentanone)、環己酮(cyclohexanone)、3-乙氧基丙酸乙酯(ethyl 3-ethoxypropionate)、丙二醇甲醚乙酸酯(propylene glycol methyl ether acetate,PGMEA)、亞甲基溶纖劑(methylene cellosolve)、2-乙氧基乙醇(2-ethoxyethanol)、N-甲基甲醯胺(N-methylformamide)、N,N-二甲基甲醯胺(N,N-dimethylformamide)、N-甲基甲醯胺(N-methylformanilide)、N-甲基乙醯胺(N-methylacetamide)、N,N-二甲基乙醯胺(N,N-dimethylacetamide)、二甲基亞碸(dimethylsulfoxide)、芐基乙基醚(benzyl ethyl ether)、二己基醚(dihexyl ether)、丙酮基丙酮(acetonylacetone)、異佛爾酮(isophorone)、己酸(caproic acid)、辛酸(caprylic acid)、1-辛醇(1-octanol)、1-壬醇(1-nonanol)、苯甲醇(benzyl alcohol)、乙酸芐酯(benzyl acetate)、苯甲酸乙酯(ethyl benzoate)、草酸二乙酯(diethyl oxalate)、馬來酸二乙酯(diethyl maleate)、乙酸苯基溶纖劑(phenyl cellosolve acetate)或前述類似材料。
如本發明所屬技術領域中具有通常知識者將了解的,以上所列和描述之可用於光阻的溶劑成分的材料的實例僅僅是說明性的,並不意圖限制實施例。而是,任何溶解聚合物樹脂和PAC的合適材料可用於幫助混合和施加光阻。所有這樣材料完全地意圖被包含在實施例的範圍內。
此外,儘管上述材料中的各個皆可作為光阻的溶劑,但在另一些實施例中,使用多於一種上述材料。舉例而言,在一些實施例中,溶劑包含兩或更多種所述材料的組合混合物。所有這些組合完全地意圖被包含在實施例的範圍內。
除了聚合物樹脂、PAC、溶劑、交聯劑和偶聯劑之外,光阻的一些實施例亦包含一些其他添加物,其有助於光阻獲得高分辨率。舉例而言,光阻的一些實施例也包含界面活性劑,以幫助改善光阻塗佈在其所施加的表面上的能力。在一些實施例中,界面活性劑包含非離子界面活性劑、具有氟化脂肪族基團的聚合物、含有至少一個氟原子和/或至少一個矽原子的界面活性劑、聚氧乙烯烷基醚(polyoxyethylene alkyl ether)、聚氧乙烯烷基芳香基醚(polyoxyethylene alkyl aryl ether)、聚氧乙烯-聚氧丙烯嵌段共聚物(polyoxyethylene-polyoxypropylene block copolymer)、脫水山梨糖醇脂肪酸酯(sorbitan fatty acid ester)和聚氧乙烯脫水山梨糖醇脂肪酸酯(polyoxyethylene sorbitan fatty acid ester)。
在一些實施例中,作為界面活性劑的材料的具體範例包含聚氧乙烯十二烷基醚(polyoxyethylene lauryl ether)、聚氧乙烯十八烷基醚(polyoxyethylene stearyl ether)、聚氧乙烯十六烷基醚(polyoxyethylene cetyl ether)、聚氧乙烯油基醚(polyoxyethylene oleyl ether)、聚氧乙烯辛基酚醚(polyoxyethylene octyl phenol ether)、聚氧乙烯壬基酚醚(polyoxyethylene nonyl phenol ether)、脫水山梨糖醇單月桂酸酯(sorbitan monolaurate)、脫水山梨糖醇單棕櫚酸酯(sorbitan monopalmitate)、脫水山梨糖醇單硬脂酸酯(sorbitan monostearate)、脫水山梨糖醇單油酸酯(sorbitan monooleate)、脫水山梨糖醇三油酸酯(sorbitan trioleate)、脫水山梨糖醇三硬脂酸酯(sorbitan tristearate)、聚氧乙烯脫水山梨糖醇單月桂酸酯(polyoxyethylene sorbitan monolaurate)、聚氧乙烯脫水山梨糖醇單棕櫚酸酯(polyoxyethylene sorbitan monopalmitate)、聚氧乙烯脫水山梨糖醇單硬脂酸酯(polyoxyethylene sorbitan monostearate)、聚氧乙烯脫水山梨糖醇三油酸酯(polyoxyethylene sorbitan trioleate)、聚氧乙烯脫水山梨糖醇三硬脂酸酯(polyoxyethylene sorbitan tristearate)、聚乙二醇二硬脂酸酯(polyethylene glycol distearate)、聚乙二醇二月桂酸酯(polyethylene glycol dilaurate)、聚乙二醇(polyethylene glycol)、聚丙二醇(polypropylene glycol)、聚氧乙烯十四烷基醚(polyoxyethylenestearyl ether)、聚氧乙烯十六烷基醚(polyoxyethylene cetyl ether)、含氟的陽離子界面活性劑(fluorine containing cationic surfactant)、含氟的非離子界面活性劑(fluorine containing nonionic surfactant)、含氟的陰離子界面活性劑(fluorine containing anionic surfactant)、陽離子界面活性劑和陰離子界面活性劑、聚乙二醇(polyethylene glycol)、聚丙二醇(polypropylene glycol)、聚氧乙烯十六烷基醚(polyoxyethylene cetyl ether)、前述之組合或前述類似材料。
添加到光阻的一些實施例的另一添加物是淬滅劑(quencher),其抑制在光阻內產生的酸/鹼/自由基的擴散。淬滅劑改善了光阻圖案構造(configuration)以及光阻隨時間的穩定性。在一實施例中,淬滅劑是胺,例如二級低級脂肪族胺(second lower aliphatic amine)、三級低級脂肪族胺(tertiary lower aliphatic amine)或前述類似化合物。胺的具體範例包含三甲胺(trimethylamine)、二乙胺(diethylamine)、三乙胺(triethylamine)、二正丙胺(di-n-propylamine)、三正丙胺(tri-n-propylamine)、三戊胺(tripentylamine)、二乙醇胺(diethanolamine)和三乙醇胺(triethanolamine)、鏈烷醇胺(alkanolamine)、前述之組合或前述之類似化合物。
在一些實施例中,有機酸作為淬滅劑。有機酸的具體實施例包含丙二酸(malonic acid)、檸檬酸(citric acid)、蘋果酸(malic acid)、琥珀酸(succinic acid)、苯甲酸(benzoic acid)、水楊酸(salicylic acid);亞磷酸(phosphorous oxo acid)及其衍生物,例如磷酸及其衍生物,例如其酯、磷酸二正丁酯(phosphoric acid di-n-butyl ester)和磷酸二苯酯(phosphoric acid diphenyl ester);膦酸(phosphonic acid)及其酯衍生物,例如膦酸二甲酯(phosphonic acid dimethyl ester)、膦酸二正丁酯(phosphonic acid di-n-butyl ester)、苯基膦酸(phenylphosphonic acid)、膦酸二苯酯(phosphonic acid diphenyl ester)和膦酸二芐酯(phosphonic acid dibenzyl ester);和次膦酸(phosphinic acid)及其衍生物,例如其酯,包括苯基次膦酸(phenylphosphinic acid)。
添加到光阻的一些實施例的另一添加物是穩定劑,其有助於防止在光阻曝光期間所產生的酸的不希望的擴散。在一些實施例中,穩定劑包含氮化合物,包括脂脂族一級、二級和三級胺;環胺(cyclic amine),包含呱啶(piperidine)、吡咯烷(pyrrolidine)、嗎啉(morpholine);芳香族雜環(aromatic heterocycle),包含吡啶(pyridine)、嘧啶(pyrimidine)、嘌呤(purine);亞胺(imine),包含二氮雜雙環十一碳烯(diazabicycloundecene)、胍(guanidine)、醯亞胺(imide)、醯胺(amide)或前述類似化合物。或者,在一些實施例中,銨鹽也可用於穩定劑,包含醇鹽(alkoxide)的銨、一級、二級、三級和四級烷基和芳香基銨鹽,包含氫氧化物、酚鹽(phenolate)、羧酸鹽(carboxylate)、芳香基(aryl)和烷基磺酸鹽(alkyl sulfonate)、磺醯胺(sulfonamide)或前述類似化合物。在一些實施例中,使用其他陽離子氮化合物,包含吡啶鎓鹽(pyridinium salt)和其他有陰離子的雜環氮化合物的鹽,例如醇鹽,包含氫氧化物、酚鹽、羧酸鹽、芳香基和烷基磺酸鹽、磺醯胺或前述類似化合物。
光阻的一些實施例中的另一添加物是溶解抑制劑,以幫助控制在顯影期間光阻的溶解。在一實施例中,膽鹽酯(bile-salt ester)可作為溶解抑制劑。在一些實施例中,溶解抑制劑的具體範例包含膽酸(cholic acid)、脫氧膽酸(deoxycholic acid)、石膽酸(lithocholic acid)、叔丁基脫氧膽酸鹽(t-butyl deoxycholate)、叔丁基石膽酸鹽(t-butyl lithocholate)和叔丁基-3-乙醯基石膽酸鹽(t-butyl-3--acetyl lithocholate)。
在光阻的一些實施例中的另一添加物是塑化劑(plasticizer)。塑化劑可用於減少光阻和底下的膜層(例如,待圖案化的膜層)之間的脫層(delamination)和破裂。塑化劑包含單體、低聚和聚合物塑化劑,例如低聚和聚乙二醇醚(polyethyleneglycol ether)、脂環族酯(cycloaliphatic ester)和非酸反應性類固醇衍生材料(non-acid reactive steroidaly-derived material)。在一些實施例中,用於塑化劑的材料的具體範例包含鄰苯二甲酸二辛酯(dioctyl phthalate)、鄰苯二甲酸二十二烷基酯(didodecyl phthalate)、三甘醇二辛酸酯(triethylene glycol dicaprylate)、鄰苯二甲酸二甲酯(dimethyl glycol phthalate)、磷酸三甲苯酯(tricresyl phosphate)、己二酸二辛酯(dioctyl adipate)、癸二酸二丁酯(dibutyl sebacate)、三乙醯甘油(triacetyl glycerine)或前述類似材料。
著色劑是包含在光阻的一些實施例中的另一添加物。著色劑觀察者檢查光阻並發現在進一步製程之前,可能需要補救的任何缺陷。在一些實施例中,著色劑是三芳香基甲烷染料(triarylmethane dye)或細顆粒有機顏料。在一些實施例中,材料的具體範例包含結晶紫、甲基紫、乙基紫、油藍#603、維多利亞純藍BOH(Victoria Pure Blue BOH)、孔雀石綠、金剛石綠、酞菁顏料(phthalocyanine pigment)、偶氮顏料(azo pigment)、炭黑(carbon black)、氧化鈦、亮綠染料(brilliant green dye)(C. I. 42020),維多利亞純藍(Victoria Pure Blue FGA)(Linebrow)、維多利亞BO(Victoria BO)(Linebrow)(C. I. 42595),維多利亞藍(CI 44045),羅丹明6G (rhodamine 6G)(CI 45160),二苯甲酮(benzophenone)化合物,例如2,4-二羥基二苯甲酮(2,4-dihydroxybenzophenone)和2,2’,4,4’-四羥基二苯甲酮(2,2',4,4'-tetrahydroxybenzophenone);水楊酸(salicylic acid)化合物,例如水楊酸苯酯(phenyl salicylate)和水楊酸4-叔丁基苯酯(4-t-butylphenyl salicylate);苯基丙烯酸酯(phenylacrylate)化合物,例如2-氰基-3,3-二苯基丙烯酸乙酯(ethyl-2-cyano-3,3-diphenylacrylate)和2’-乙基己基-2-氰基-3,3-二苯基丙烯酸酯(2'-ethylhexyl-2-cyano-3,3-diphenylacrylate);苯並三唑(benzotriazole)化合物,例如2-(2-羥基-5-甲基苯基)-2H-苯並三唑(2-(2-hydroxy-5-methylphenyl)-2H-benzotriazole)和2-(3-叔丁基-2-羥基-5-甲基苯基)-5-氯-2H-苯並三唑(2-(3-t-butyl-2-hydroxy-5-methylphenyl)-5-chloro-2H-benzotriazole);香豆素(coumarin)化合物,例如4-甲基-7-二乙胺基-1-苯並吡喃-2-酮(4-methyl-7-diethylamino-1-benzopyran-2-one);噻噸酮(thioxanthone)化合物,例如二乙基噻噸酮(diethylthioxanthone);二苯乙烯(stilbene)化合物,萘二甲酸(naphthalic acid)化合物、偶氮染料(azo dye)、酞菁藍(phthalocyanine blue)、酞菁綠(phthalocyanine green)、碘綠(iodine green)、維多利亞藍、結晶紫、氧化鈦、萘黑(naphthalene black)、光適應甲基紫(Photopia methyl violet)、溴酚藍(bromphenol blue)和溴甲酚綠(bromcresol green);雷射染料(laser dye),例如羅丹明G6 (Rhodamine G6)、香豆素500(Coumarin 500)、DCM(4-(二氰基亞甲基)-2-甲基-6-(4-二甲基胺基苯乙烯基)-4H吡喃))(DCM (4-(dicyanomethylene)-2-methyl-6-(4-dimethylaminostyryl)-4H pyran)))、基頓紅620 (Kiton Red 620)、吡咯甲烷580 (Pyrromethene 580)或前述類似材料。另外,可組合使用一或多個著色劑,以提供所需的著色。
將黏合添加物添加至光阻的一些實施例中,以促進光阻與已在其上施加光阻的下層(例如,待圖案化的層)之間的黏合。在一些實施例中,黏合添加物包含具有至少一個反應性取代基,例如羧基團、甲基丙烯酰基團(methacryloyl group)、異氰酸酯基團(isocyanate group)和/或環氧基團(epoxy group)的矽烷(silane)化合物。黏合成分的具體範例包含三甲氧基甲矽烷苯甲酸(trimethoxysilyl benzoic acid)、γ-甲基丙烯醯氧基三甲氧基矽烷(γ-methacryloxypropyl trimethoxy silane)、乙烯基三乙醯氧基矽烷(vinyltriacetoxysilane)、乙烯基三甲氧基矽烷(vinyltrimethoxysilane)、γ異氰酸丙基三乙氧基矽烷(γ-isocyanatepropyl triethoxy silane)、γ環氧丙氧基丙基三甲氧基矽烷(γ-glycidoxypropyl trimethoxy silane)、β-(3,4-環氧環己基)乙基三甲氧基矽烷(β-(3,4-epoxycyclohexyl)ethyl trimethoxy silane)、苯並咪唑(benzimidazole)和聚苯並咪唑(polybenzimidazole)、經低級羥基烷基(lower hydroxyalkyl)取代的吡啶衍生物(pyridine)、氮雜環化合物,尿素(urea)、硫脲(thiourea)、有機磷化合物(organophosphorus compound)、8-羥基喹啉(8-oxyquinoline)、4-羥基蝶啶(4-hydroxypteridine)和衍生物、1,10-菲咯啉(1,10-phenanthroline)及其衍生物,2,2’-聯吡啶(2,2'-bipyridine)及其衍生物、苯並三唑(benzotriazole)、有機磷(organophosphorus)化合物,苯二胺(phenylenediamine compound)化合物,2-胺基-1-苯基乙醇(2-amino-1-phenylethanol)、N-苯基乙醇胺(N-phenylethanolamine)、N-乙基二乙醇胺(N-ethyldiethanolamine)、N-乙基乙醇胺(N-ethylethanolamine)及其衍生物、苯並噻唑(benzothiazole)和具有環己基環(cyclohexyl ring)和嗎啉環(morpholine ring)的苯並噻唑胺鹽(benzothiazoleamine salt),3-環氧丙氧基丙基三甲氧基矽烷(3-glycidoxypropyltrimethoxysilane)、3-環氧丙氧基三乙氧基矽烷(3-glycidoxypropyltriethoxysilane)、3-巰基丙基三甲氧基矽烷(3-mercaptopropyltrimethoxysilane)、3-巰基丙基三乙氧基矽烷(3-mercaptopropyltriethoxysilane)、3-甲基丙烯醯氧基丙基三甲氧基矽烷(3-methacryloyloxypropyltrimethoxysilane)、乙烯基三甲氧基矽烷(vinyl trimethoxysilane)、前述之組合或前述類似材料。
將金屬氧化物奈米顆粒添加到光阻的一些實施例。在一些實施例中,光阻包含一或多個選自由二氧化鈦、氧化鋅、二氧化鋯(zirconium dioxide)、氧化鎳、氧化鈷、氧化錳、氧化銅、氧化鐵、鈦酸鍶(strontium titanate)、氧化鎢、氧化釩(vanadium oxide)、氧化鉻(chromium oxide)、氧化錫、氧化鉿、氧化銦、氧化鎘(cadmium oxide)、氧化鉬(molybdenum oxide)、氧化鉭、氧化鈮(niobium oxide)、氧化鋁及前述之組合所組成的群組之金屬氧化物奈米顆粒。如本文所使用的,奈米顆粒是具平均粒徑為1至100 nm的顆粒。
將表面整平劑(surface leveling agent)添加到光阻的一些實施例,以幫助光阻的頂表面保持平坦,如此一來入射光(impinging light)不會被不平坦的表面進行不利地修飾。在一些實施例中,表面整平劑包含氟代脂肪族酯(fluoroaliphatic ester)、羥基封端的氟化聚醚(hydroxyl terminated fluorinated polyether)、氟化乙二醇聚合物(fluorinated ethylene glycol polymer)、矽烷氧(silicone)、丙烯酸聚合物(acrylic polymer)整平劑、前述之組合或前述類似化合物。
在一些實施例中,將聚合物樹脂和PAC以及任何所需的添加物或其他試劑添加到溶劑中,以便施用。一旦添加,接著將混合物混合,以在整個光阻中獲得均勻的組合物,以確保沒有由不均勻混合或光阻的非均勻組合物所引起的缺陷。一旦混合在一起,光阻可在其使用之前儲存或立即使用。
一旦準備好後,將光阻施加到待圖案化的膜層上,如第2圖所示,例如基底10,以形成光阻層15。在一些實施例中,使用例如旋塗製程(spin-on coating process)、浸塗法(dip coating method)、氣刀塗佈法(air-knife coating method)、簾塗佈法(curtain coating method)、線棒塗佈法(wire-bar coating method)、凹版塗佈法(gravure coating method)、層壓法(lamination method)、擠壓塗佈法(extrusion coating method)、前述的組合或前述類似方法的製程,來施加光阻。在一些實施例中,光阻層15的厚度範圍為約10 nm至約300 nm。
將光阻層15施加到基底10之後,在一些實施例中執行光阻層的預烘烤,以在輻射曝光之前,使光阻硬化和乾燥(見第1圖)。光阻層15的硬化和乾燥除去溶劑成分,同時留下聚合物樹脂、PAC、交聯劑和其它所選的添加物。在一些實施例中,在適合將溶劑蒸發的溫度下,執行預烘烤,例如約50° C至250° C,但精確的溫度取決於為光阻所選的材料。預烘烤執行足以將光阻層硬化和乾燥的時間,例如約10秒至約10分鐘。
第3圖繪示光阻層的選擇性曝光,以形成曝光區50和未曝光區52。在一些實施例中,藉由將經光阻塗佈的基底放置在光微影工具中,來執行對輻射的曝光。光微影工具包含光罩30、光學元件、曝光輻射源以提供用於曝光的輻射45以及在曝光輻射下,用於支撐和移動基底的可移動平台。
在一些實施例中,輻射源(未繪示)對光阻層15提供輻射45,例如紫外光,以誘發PAC的反應,PAC接著與聚合物樹脂反應,以化學改變光阻層被輻射45照射的那些區域。在一些實施例中,輻射是電磁輻射,例如g線(波長約436 nm)、i線(波長約365 nm)、紫外線輻射、遠紫外線輻射、極紫外線、電子束或前述類似輻射。在一些實施例中,輻射源選自由汞蒸汽燈(mercury vapor lamp)、氙燈(xenon lamp)、碳弧燈(carbon arc lamp)、KrF準分子雷射(波長248 nm)、ArF準分子雷射(波長193 nm)、 F2準分子雷射(波長157 nm)或經CO2
雷射激發的Sn電漿(極紫外線,波長13.5 nm)所組成的群組。
在一些實施例中,在光微影工具中使用光學元件(未繪示),以在藉由光罩30將輻射45圖案化之前或之後,擴展、反射或以其他方式控制輻射。在一些實施例中,光學元件包含一或多個透鏡、反射鏡、濾光器及前述之組合,以沿其路徑控制輻射45。
在一實施例中,圖案化的輻射45是具有13.5 nm波長的極紫外光,PAC是光酸產生劑,待分解的基團是烴結構上的羧酸基團,且使用交聯劑。圖案化的輻射45照射在光酸產生劑上,光酸產生劑吸收照射的圖案化的輻射45。此吸收引發光酸產生劑在光阻層15內產生質子(例如,H+
原子)。當質子影響烴結構上的羧酸基團時,質子與羧酸基團反應,大致上化學改變羧酸基團並改變聚合物樹脂的性質。然後,羧酸基團與交聯劑反應,以與光阻層15的曝光區內的其他聚合物樹脂交聯。
在一些實施例中,光阻層15的曝光使用浸漬微影技術(immersion lithography technique)。在這種技術中,浸漬介質(未繪示)放置在最終光學元件和光阻層之間,且曝光輻射45穿過浸漬介質。
在光阻層15曝光於曝光輻射45之後,在一些實施例中進行曝光後烘烤,以幫助在曝光期間,由輻射45的照射在PAC上所產生的酸/鹼/自由基的產生、分散和反應。這種熱幫助有助於產生或增強使光阻層15內的曝光區50和未曝光區52之間產生化學差異的化學反應。這些化學差異亦導致曝光區50和未曝光區52之間的溶解度差異。在一些實施例中,曝光後烘烤在約50° C至約160° C的溫度範圍,發生約20秒至約120秒。
在一些實施例中,將交聯劑包含在化學反應中有助於聚合物樹脂的成分(例如各聚合物)彼此反應和鍵結,從而增加鍵結的聚合物的分子重量。特別地,初始聚合物具有含有羧酸的支鏈,其中羧酸被待除去的基團之一/酸不穩定基所保護。待除去的基團在去保護反應(de-protecting reaction)中被除去,此去保護反應是在曝光製程期間或在曝光後烘烤製程期間,由例如光酸產生劑產生的質子H+
引發。 H+
首先除去待除去的基團/酸不穩定基,且另一氫原子可取代經除去的結構,以形成去保護的聚合物。一旦去保護,已在交聯反應中經歷去保護反應和交聯劑的兩個個別之經去保護的聚合物之間發生交聯反應。特別地,藉由去保護反應形成的羧基內的氫原子被除去,且氧原子與交聯劑反應和鍵結。交聯劑與兩個聚合物的這種鍵合不僅將兩個聚合物鍵結至交聯劑,還透過交聯劑將兩個聚合物彼此鍵結,從而形成交聯聚合物。
透過交聯反應增加聚合物的分子重量,新的交聯聚合物在常規的有機溶劑負型光阻顯影劑中變得較不可溶。
另一方面,根據本發明的一些實施例的光阻顯影劑57溶解光阻層15交聯、輻射曝光的曝光區50。
在一些實施例中,光阻顯影劑57包含主要溶劑、酸或鹼和螯合物。在一些實施例中,基於光阻顯影劑的總重量,主要溶劑的濃度為約60重量%至約99重量%。基於光阻顯影劑的總重量,酸或鹼的濃度為約0.001重量%至約20重量%。在某些實施例中,基於光阻顯影劑的總重量,顯影劑中的酸或鹼濃度為約0.01重量%至約15重量%。螯合物濃度為光阻顯影劑總重量的約0.001重量%至約20重量%。在某些實施例中,基於光阻顯影劑的總重量,螯合物的濃度範圍為約0.01重量%至約15重量%。
在一些實施例中,主要溶劑具有25< δd
< 15,25< δp
< 10和30< δh
< 6的漢森溶解度參數(Hansen solubility parameter)。漢森溶解度參數的單位是(焦耳/cm3
)1/2
或等效地,MPa½
,並且基於這樣的觀點:如果一個分子以類似的方式與自身結合,則將其定義為類似另一分子。δd
是來自分子之間分散力的能量。δp
是來分子之間偶極分子間力的能量。δh
是來自分子之間氫鍵的能量。這三個參數δd
、δp
和δh
可被認為是三維中的點的座標,稱為漢森空間。兩個分子在漢森空間中越近,它們越可能相互溶解。
具有期望的漢森溶解度參數的溶劑包含二甲基亞碸(dimethyl sulfoxide)、丙酮(acetone)、乙二醇(ethylene glycol)、甲醇、乙醇、丙醇、丙二醇(propanediol)、水、4-甲基-2-戊酮(4-methyl-2-pentanone)、過氧化氫、異丙醇和丁基二甘醇。
在一些實施例中,酸具有-15 <pKa
<4的酸解離常數pKa
。在一些實施例中,鹼具有為40> pKa
> 9.5的pKa
。酸解離常數pKa
是酸解離常數Ka
的對數常數。 Ka
是溶液中酸強度的定量測量。 Ka
是一般酸根據方程式HA +H2
O↔A-
+ H3
O+
解離的平衡常數,其中HA解離成其共軛鹼A-
,而氫離子結合水分子形成水合氫離子(hydronium ion)。解離常數可表示為平衡濃度的比值:在大多數情況下,水量是恆定的,且方程式可簡化為HA ↔ A-
+ H+
,和藉由方程式pKa
= -log10
(Ka
),對數常數pKa
與Ka有關。 pKa
的值越低,酸越強。相反地,pKa
值越高,鹼越強。
在一些實施例中,光阻顯影劑57的合適的酸包含選自由乙二酸(ethanedioic acid)、甲酸(methanoic acid)、2-羥基丙酸(2-hydroxypropanoic acid)、2-羥基丁二酸(2-hydroxybutanedioic acid)、檸檬酸、尿酸(uric acid)、三氟甲磺酸(trifluoromethanesulfonic acid)、苯磺酸(benzenesulfonic acid)、乙磺酸(ethanesulfonic acid)、甲磺酸(methanesulfonic acid)、草酸(oxalic acid)、馬來酸(maleic acid)、碳酸(carbonic acid)、乙醛酸(oxoethanoic acid)、2-羥基乙酸(2-hydroxyethanoic acid)、丙二酸(propanedioic acid)、丁二酸(butanedioic acid)、3-氧化丁酸(3-oxobutanoic acid)、羥胺-o-磺酸(hydroxylamine-o-sulfonic acid)、甲脒亞磺酸(formamidinesulfinic acid)、甲基胺基磺酸(methylsulfamic acid)、磺基乙酸(sulfoacetic acid)、1,1,2,2-四氟乙磺酸(1,1,2,2-tetrafluoroethanesulfonic acid)、1,3-丙二磺酸(1,3-propanedisulfonic acid)、九氟丁烷-1-磺酸(nonafluorobutane-1-sulfonic acid)、5-磺基水楊酸(5-sulfosalicylic acid)及前述之組合所組成的群組的有機酸。在一些實施例中,酸是選自由硝酸、硫酸、鹽酸及前述之組合所組成的群組的無機酸。
在一些實施例中,光阻顯影劑57的合適的酸包含選自由單乙醇胺(monoethanolamine)、單異丙醇胺(monoisopropanolamine)、2-胺基-2-甲基-1-丙醇(2-amino-2-methyl-1-propanol)、1H-苯並三唑(1H-benzotriazole)、1,2,4-三唑(1,2,4-triazole)、1,8-二氮雜雙環十一碳-7-烯(1,8-diazabicycloundec-7-ene)、四丁基氫氧化銨(tetrabutylammonium hydroxide)、氫氧化四甲銨(tetramethylammonium hydroxide)、氫氧化銨(ammonium hydroxide)、胺基磺酸銨(ammonium sulfamate)、胺基甲酸銨(ammonium carbamate)、氫氧化四乙基銨(tetraethylammonium hydroxide)、氫氧化四丙基銨(tetrapropylammonium hydroxide)及前述之組合所組成的群組的有機鹼。
在一些實施例中,螯合物選自由乙二胺四乙酸(ethylenediaminetetraacetic acid,EDTA)、乙二胺-N,N’-二琥珀酸(ethylenediamine-N,N'-disuccinic acid,EDDS)、二亞乙基三胺五乙酸(diethylenetriaminepentaacetic acid,DTPA)、聚天冬胺酸(polyaspartic acid)、反式-1,2-環己烷二胺-N,N,N’,N’-四乙酸一水合物(trans‐1,2‐cyclohexanediamine‐N,N,N',N'‐tetraacetic acid monohydrate)、乙二胺(ethylenediamine)及前述之組合所組成的群組。
在一實施例中,光阻顯影劑57包含額外的溶劑。在一些實施例中,額外的溶劑包含水;己烷、庚烷、辛烷、甲苯、二甲苯、二氯甲烷(dichloromethane)、氯仿(chloroform)、四氯化碳(carbon tetrachloride)、三氯乙烯(trichloroethylene) 及類似的烴類溶劑;臨界二氧化碳、甲醇、乙醇、丙醇、丁醇等醇溶劑;二乙醚(diethyl ether)、二丙醚(dipropyl ether)、二丁醚(dibutyl ether)、乙基乙烯基醚(ethyl vinyl ether)、二噁烷(dioxane)、環氧丙烷(propylene oxide)、四氫呋喃(tetrahydrofuran)、溶纖劑(cellosolve)、甲基溶纖劑(methyl cellosolve)、丁基溶纖劑(butyl cellosolve)、甲基卡必醇(methyl carbitol)、二乙二醇單乙醚(diethylene glycol monoethyl ether) 及類似的醚溶劑;丙酮、甲基乙基酮(methyl ethyl ketone)、甲基異丁基酮(methyl isobutyl ketone)、異佛爾酮(isophorone)、環己酮(cyclohexanone) 及類似的酮溶劑;乙酸甲酯(methyl acetate)、乙酸乙酯(ethyl acetate)、乙酸丙酯(propyl acetate)、乙酸丁酯(butyl acetate)及類似的酯溶劑;吡啶(pyridine)、甲醯胺(formamide)和N,N-二甲基甲醯胺(N,N-dimethyl formamide)或前述類似溶劑。在一實施例中,基於顯影劑的總重量,額外的溶劑的濃度為約1重量%至約40重量%。
在一些實施例中,基於顯影劑的總重量,光阻顯影劑57包含濃度至多約10重量%的過氧化氫。
在一些實施例中,光阻顯影劑57包含最多約1重量%的界面活性劑,以增加溶解度並降低基底上的表面張力。在一些實施例中,界面活性劑選自由烷基苯磺酸鹽(alkylbenzenesulfonate)、木質素磺酸鹽(lignin sulfonate)、脂肪醇乙氧基化物(fatty alcohol ethoxylate)和烷基酚乙氧基化物(alkylphenol ethoxylate)所組成的群組。在一些實施例中,界面活性劑選自由硬脂酸鈉(sodium stearate)、4-(5-十二烷基)苯磺酸銨(4-(5-dodecyl) benzenesulfonate)、月桂基硫酸銨(ammonium lauryl sulfate)、十二烷基硫酸鈉(sodium lauryl sulfate)、月桂基醚硫酸鈉(sodium laureth sulfate)、肉荳蔻醇聚醚硫酸鈉(sodium myreth sulfate)、二辛基磺基琥珀酸鈉(dioctyl sodium sulfosuccinate)、全氟辛烷磺酸鹽(perfluorooctanesulfonate)、全氟丁烷磺酸鹽(perfluorobutanesulfonate)、烷基芳基醚磷酸鹽(alkyl-aryl ether phosphate)、烷基醚磷酸鹽(alkyl ether phosphate)、月桂醯肌胺酸鈉(sodium lauroyl sarcosinate)、全氟壬酸(perfluoronononanoate)、全氟辛酸(perfluorooctanoate)、奧替尼啶二鹽酸鹽(octenidine dihydrochloride)、西曲溴銨(cetrimonium bromide)、氯化十六烷基吡啶(cetylpyridinium chloride)、苯紮氯銨(benzalkonium chloride)、芐索氯銨(benzethonium chloride)、二甲基二十八烷基氯化銨(dimethyldioctadecylammonium chloride)、二十八烷基二甲基溴化銨(dioctadecyldimethylammonium bromide)、3-[(3-膽醯胺丙基)二甲基銨]-1-丙磺酸鹽(3-[(3-cholamidopropyl)dimethylammonio]-1-propanesulfonate)、椰油醯胺丙基羥基磺基甜菜鹼(cocamidopropyl hydroxysultaine)、椰油醯胺丙基甜菜鹼(cocamidopropyl betaine)、磷脂磷脂醯絲胺酸(phospholipidsphosphatidylserine)、磷脂醯乙醇胺(phosphatidylethanolamine)、磷脂醯膽鹼(phosphatidylcholine)、鞘磷脂(sphingomyelin)、八乙二醇單十二烷基醚(octaethylene glycol monodecyl ether)、五乙二醇單十二烷基醚(pentaethylene glycol monodecyl ether)、聚乙氧基化牛脂胺(polyethoxylated tallow amine)、椰油醯胺單乙醇胺(cocamide monoethanolamine)、椰油醯胺二乙醇胺(cocamide diethanolamine)、甘油單硬脂酸酯(glycerol monostearate)、甘油單月桂酸酯(glycerol monolaurate)、脫水山梨糖醇單月桂酸酯(sorbitan monolaurate)、脫水山梨糖醇單硬脂酸酯(sorbitan monostearate)、脫水山梨糖醇三硬脂酸酯(sorbitan tristearate)和前述之組合所組成的群組。
在一些實施例中,使用旋塗製程,將光阻顯影劑57施加到光阻層15。在旋塗製程中,從光阻層15上方,將光阻顯影劑57施加到光阻層15,同時旋轉經光阻塗佈的基底,如第4圖所示。在一些實施例中,以約5 ml/min至約800 ml/min的速率供應光阻顯影劑57,同時以約100 rpm至約2000 rpm的速度,旋轉經光阻塗佈的基底10。在一些實施例中,光阻顯影劑是在約10° C至約80° C的溫度。在一些實施例中,顯影步驟持續約30秒至約10分鐘。
雖然旋塗步驟是一種在曝光之後,將光阻層15顯影的合適的方法,但是其意圖為說明性的,而不意圖用於限制實施例。而是,可替代地使用任何合適的顯影步驟,包含浸漬製程(dip process)、水坑製程(puddle process)和噴塗法(spray-on method)。所有這些顯影步驟都包含在實施例的範圍內。
在顯影製程的期間,光阻顯影劑57溶解交聯的負型光阻的輻射曝光區50,使基底10的表面露出,如第5圖所示,且留下明確定義的光阻未曝光區52,具有比由傳統負型光阻光微影所供提供的定義更好的定義。
在顯影步驟S150後,從被圖案化的光阻所覆蓋的基底除去剩餘的顯影劑。 在一些實施例中,使用旋轉脫水(spin-dry)製程除去剩餘的顯影劑,但是可使用任何合適的除去技術。在將光阻層15顯影及除去剩餘的顯影劑之後,在圖案化的光阻層15就位的時候,執行額外步驟。 舉例而言,在一些實施例中,使用乾式或濕式蝕刻,來執行蝕刻操作,以將光阻層15的圖案轉移到底下的基底10,形成圖案55’’,如第6圖所示。 基底10具有與光阻層15不同的蝕刻抗性。在一些實施例中,蝕刻劑對基底10比對光阻層15還具選擇性。
在一些實施例中,基底10和光阻層15含有至少一種抗蝕刻分子。 在一些實施例中,抗蝕刻分子包含具有低 Onishi數(Onishi number)的結構、雙鍵、三鍵、矽、氮化矽、鈦、氮化鈦、鋁、氧化鋁、氮氧化矽、前述之組合或前述類似物的分子。
在一些實施例中,在形成光阻層之前,將待圖案化的膜層60設置在基底上,如第7圖所示。 在一些實施例中,待圖案化的膜層60是金屬化層或設置在金屬化層上的介電層,例如鈍化層。 在待圖案化的膜層60是金屬化層的實施例中,使用金屬化製程和金屬沉積技術,包含化學氣相沉積、原子層沉積和物理氣相沉積(濺射),以導電材料形成待圖案化的膜層60。 同樣地,如果待圖案化的膜層60是介電層,則藉由介電層形成技術,包含熱氧化、化學氣相沉積、原子層沉積和物理氣相沉積,來形成待圖案化的膜層60。
隨後將光阻層15選擇性地曝光於光化輻射45,以在光阻層中形成曝光區50和未曝光區52,如第8圖所示,且在這裡結合第3圖進行描述。 如本文所解釋的,光阻是負型光阻,其中在一些實施例中,在曝光區50中發生聚合物交聯。
如第9圖所示,藉由從分配器62分配顯影劑57,以將曝光的光阻區50顯影,來形成如第10圖所示的光阻開口的圖案55。 顯影步驟類似於本文第4和5圖所說明的顯影步驟。
接下來,如第11圖所示,使用蝕刻步驟,將光阻層15中的圖案55轉移到待圖案化的膜層60,且如第6圖所說明的,將光阻層除去,以在待圖案化的膜層60中形成圖案55’’。
在一些實施例中,使用極紫外光微影,來執行光阻層15的選擇性曝光,以形成曝光區50和未曝光區52。在極紫外光微影步驟中,反射性光罩65用於形成經圖案化的曝光光,如第12圖所示。反射性光罩65包含低熱膨脹玻璃基底70,在其上形成Si和Mo的反射性多層75。在反射性多層75上形成覆蓋層80和吸收層85。在低熱膨脹基底70的背側上形成後導電層90。在極紫外光微影中,以約為6°的入射角,將極紫外線輻射95導向反射性光罩 65。極紫外線輻射的一部分97被Si /Mo多層75往經光阻塗佈的基底10反射,而入射在吸收層85上的部分極紫外線輻射被光罩吸收。 在一些實施例中,額外光學元件,包含反射鏡,位於反射性光罩65和經光阻塗佈的基底之間。
與傳統的顯影劑和技術相比,根據本發明實施例的新穎光阻顯影劑組合物和負型光阻光微影技術提供了更高的半導體裝置部件密度,並且在更有效率的製程中減少了缺陷。
本發明的實施例是一種光阻顯影劑,包含具有25 < δd
< 15、25 < δp
< 10和30 < δh
< 6的漢森(Hansen)溶解度參數的溶劑;具有-15 < pKa
< 4的酸解離常數pKa
的酸,或具有40 > pKa
> 9.5的pKa
的鹼;以及螯合物。在一實施例中,溶劑的濃度是基於光阻顯影劑的總重量,從約60重量%至約99重量%。在一實施例中,酸或鹼的濃度是基於光阻顯影劑的總重量,從約0.001重量%至約20重量%。在一實施例中,螯合物的濃度是基於光阻顯影劑的總重量,從約0.001重量%至約20重量%。在一實施例中,光阻顯影劑包含界面活性劑。在一實施例中,界面活性劑的濃度是基於光阻顯影劑的總重量,從約0.001重量%至約1重量%。在一實施例中,光阻顯影劑包含額外溶劑。在一實施例中,額外溶劑的濃度是基於光阻顯影劑的總重量,從約1重量%至約40重量%。在一實施例中,光阻顯影劑包含過氧化氫。
在本發明的另一實施例中,一種在光阻中形成圖案的方法包含形成光阻層於基底上,且選擇性地使光阻層曝光於光化輻射,以形成潛在圖案。藉由將顯影劑施加於經選擇性曝光的光阻層,將潛在圖案顯影,以形成圖案。其中顯影劑包含具有25 < δd
< 15、25 < δp
< 10和30 < δh
< 6的漢森(Hansen)溶解度參數的溶劑;具有-15 < pKa
< 4的酸解離常數pKa
的酸,或具有40 > pKa
> 9.5的pKa
的鹼;以及螯合物。在一實施例中,溶劑的濃度是基於光阻顯影劑的總重量,從約60重量%至約99重量%, 酸或鹼的濃度是基於光阻顯影劑的總重量,從約0.001重量%至約20重量%,且螯合物的濃度是基於該光阻顯影劑的總重量,從約0.001重量%至約20重量%。在一實施例中,顯影劑在顯影步驟的期間是在約25 °C至約75 °C的溫度。在一實施例中,在選擇性地使光阻層曝光於光化輻射之前,將光阻層加熱。在一實施例中,在選擇性地使光阻層曝光於光化輻射之後且在將光阻層顯影之前,將光阻層加熱。在一實施例中,在顯影步驟的期間,自光阻層將選擇性地曝光於光化輻射的該光阻層的一部分除去,藉此使部分基底露出。
本發明的另一實施例,一種在光阻中形成圖案的方法,包含在基底上形成光阻層。選擇性地使光阻層曝光於光化輻射,藉此在光阻層曝光於光化輻射的區域中,使光阻層交聯。藉由將液體顯影劑施加於光阻層,將光阻層顯影,來除去光阻層曝光於光化輻射的區域。在一實施例中, 顯影劑包含具有25 < δd
< 15、25 < δp
< 10和30 < δh
< 6的漢森(Hansen)溶解度參數的溶劑;具有-15 < pKa
< 4的酸解離常數pKa
的酸,或具有40 > pKa
> 9.5的pKa
的鹼;以及螯合物。在一實施例中,此方法包含在選擇性地使光阻層曝光於光化輻射之前,將光阻層加熱;以及在選擇性地使光阻層曝光於光化輻射之後且在將光阻層顯影之前,將光阻層加熱。在一實施例中,溶劑的濃度是基於光阻顯影劑的總重量,從約60重量%至約99重量%, 酸或鹼的濃度是基於光阻顯影劑的總重量,從約0.001重量%至約20重量%,且螯合物的濃度是基於光阻顯影劑的總重量,從0.001重量%至約20重量%。在一實施例中,顯影劑包含額外溶劑和界面活性劑。
以上概述了數個實施例的部件,使得本發明所屬技術領域中具有通常知識者可以更加理解本發明實施例的各方面。本發明所屬技術領域中具有通常知識者應該理解,他們可以容易地使用本發明實施例作為基礎,來設計或修改用於實施與在此所介紹實施例相同的目的及/或達到相同優點的其他製程和結構。本發明所屬技術領域中具有通常知識者也應該理解,這些等效的構造並不背離本發明的精神和範圍,並且在不背離本發明的精神和範圍的情況下,在此可以做出各種改變、取代或其他選擇。
10‧‧‧基底
15‧‧‧光阻層
30‧‧‧光罩
35‧‧‧不透明圖案
40‧‧‧光罩基底
45‧‧‧光化輻射
50‧‧‧曝光區
52‧‧‧未曝光區
55、55’、55’’‧‧‧圖案
57‧‧‧光阻顯影劑
60‧‧‧待圖案化的膜層
62‧‧‧分配器
65‧‧‧反射性光罩
70‧‧‧低熱膨脹基底
75‧‧‧多層
80‧‧‧覆蓋層
85‧‧‧吸收層
90‧‧‧後導電層
95‧‧‧極紫外線輻射
97‧‧‧一部分
100‧‧‧製程流程
S110、S120、S130、S140、S150‧‧‧步驟
藉由以下的實施方式配合所附圖式,可以更加理解本發明實施例的內容。需強調的是,根據產業上的標準慣例,許多部件(feature)並未按照比例繪製且僅為說明的目的。事實上,為了能清楚地討論,各種部件的尺寸可能被任意地增加或減少。 第1圖繪示出根據本發明的實施例之製造半導體裝置的製程流程。 第2圖顯示出根據本發明的實施例之連續步驟的製程階段。 第3圖顯示出根據本發明的實施例之連續步驟的製程階段。 第4圖顯示出根據本發明的實施例之連續步驟的製程階段。 第5圖顯示出根據本發明的實施例之連續步驟的製程階段。 第6圖顯示出根據本發明的實施例之連續步驟的製程階段。 第7圖顯示出根據本發明的實施例之連續步驟的製程階段。 第8圖顯示出根據本發明的實施例之連續步驟的製程階段。 第9圖顯示出根據本發明的實施例之連續步驟的製程階段。 第10圖顯示出根據本發明的實施例之連續步驟的製程階段。 第11圖顯示出根據本發明的實施例之連續步驟的製程階段。 第12圖顯示出根據本發明的實施例之連續步驟的製程階段。
Claims (1)
- 一種光阻顯影劑,包括: 一第一溶劑,具有25 < δd < 15、25 < δp < 10和30 < δh < 6的漢森(Hansen)溶解度參數; 一酸,具有-15 < pKa < 4的酸解離常數pKa ,或一鹼,具有40 > pKa > 9.5的pKa ;以及
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201762585255P | 2017-11-13 | 2017-11-13 | |
US62/585,255 | 2017-11-13 | ||
US15/938,599 US11300878B2 (en) | 2017-11-13 | 2018-03-28 | Photoresist developer and method of developing photoresist |
US15/938,599 | 2018-03-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW201918803A true TW201918803A (zh) | 2019-05-16 |
Family
ID=66432819
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107135337A TW201918803A (zh) | 2017-11-13 | 2018-10-08 | 光阻顯影劑 |
Country Status (3)
Country | Link |
---|---|
US (2) | US11300878B2 (zh) |
CN (1) | CN109782553A (zh) |
TW (1) | TW201918803A (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI763098B (zh) * | 2019-10-31 | 2022-05-01 | 台灣積體電路製造股份有限公司 | 在光阻中形成圖案的方法、顯影的方法與光阻顯影劑組成物 |
TWI780715B (zh) * | 2020-05-21 | 2022-10-11 | 台灣積體電路製造股份有限公司 | 製造半導體裝置的方法及顯影劑組成物 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11300878B2 (en) * | 2017-11-13 | 2022-04-12 | Taiwan Semiconductor Manufacturing Co., Ltd. | Photoresist developer and method of developing photoresist |
JP7045468B2 (ja) * | 2018-08-30 | 2022-03-31 | 東京エレクトロン株式会社 | 基板処理方法および基板処理装置 |
DE102020124247A1 (de) * | 2019-10-31 | 2021-05-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Fotolackentwickler und verfahren zum entwickeln von fotolack |
US20210198468A1 (en) * | 2019-12-31 | 2021-07-01 | Taiwan Semiconductor Manufacturing Co., Ltd. | Photoresist composition and method of manufacturing a semiconductor device |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3115647B2 (ja) * | 1991-07-02 | 2000-12-11 | 忠弘 大見 | 現像液及び現像方法 |
EP1502941B1 (en) * | 2003-07-30 | 2015-12-23 | FUJIFILM Corporation | Image-forming method and developer |
WO2008081679A1 (ja) * | 2006-12-28 | 2008-07-10 | Konica Minolta Medical & Graphic, Inc. | 感光性平版印刷版用現像液及びそれを用いた平版印刷版の作製方法 |
TWI548738B (zh) | 2010-07-16 | 2016-09-11 | 安堤格里斯公司 | 用於移除蝕刻後殘餘物之水性清潔劑 |
US8647796B2 (en) | 2011-07-27 | 2014-02-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoactive compound gradient photoresist |
US9213234B2 (en) | 2012-06-01 | 2015-12-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photosensitive material and method of lithography |
US9256133B2 (en) | 2012-07-13 | 2016-02-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Apparatus and method for developing process |
US9028915B2 (en) | 2012-09-04 | 2015-05-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of forming a photoresist layer |
US9093530B2 (en) | 2012-12-28 | 2015-07-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Fin structure of FinFET |
US9012132B2 (en) | 2013-01-02 | 2015-04-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | Coating material and method for photolithography |
US9223220B2 (en) | 2013-03-12 | 2015-12-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photo resist baking in lithography process |
US9110376B2 (en) | 2013-03-12 | 2015-08-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist system and method |
US9146469B2 (en) | 2013-03-14 | 2015-09-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Middle layer composition for trilayer patterning stack |
US8796666B1 (en) | 2013-04-26 | 2014-08-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | MOS devices with strain buffer layer and methods of forming the same |
JP6196897B2 (ja) | 2013-12-05 | 2017-09-13 | 東京応化工業株式会社 | ネガ型レジスト組成物、レジストパターン形成方法及び錯体 |
US9548303B2 (en) | 2014-03-13 | 2017-01-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | FinFET devices with unique fin shape and the fabrication thereof |
JP6764636B2 (ja) | 2014-10-08 | 2020-10-07 | 東京応化工業株式会社 | 感放射線性樹脂組成物、パターン製造方法、透明絶縁膜、及び表示装置 |
US9904171B2 (en) * | 2015-05-22 | 2018-02-27 | I-Shan Ke | Resist pattern hardening material and method of fabricating the same |
US9536759B2 (en) | 2015-05-29 | 2017-01-03 | Taiwan Semiconductor Manufacturing Co., Ltd | Baking apparatus and method |
US9857684B2 (en) | 2016-03-17 | 2018-01-02 | Taiwan Semiconductor Manufacturing Co., Ltd. | Silicon-containing photoresist for lithography |
US10866511B2 (en) * | 2016-12-15 | 2020-12-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | Extreme ultraviolet photolithography method with developer composition |
US11300878B2 (en) * | 2017-11-13 | 2022-04-12 | Taiwan Semiconductor Manufacturing Co., Ltd. | Photoresist developer and method of developing photoresist |
-
2018
- 2018-03-28 US US15/938,599 patent/US11300878B2/en active Active
- 2018-10-08 TW TW107135337A patent/TW201918803A/zh unknown
- 2018-10-10 CN CN201811179196.XA patent/CN109782553A/zh active Pending
-
2022
- 2022-04-11 US US17/717,984 patent/US11971657B2/en active Active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI763098B (zh) * | 2019-10-31 | 2022-05-01 | 台灣積體電路製造股份有限公司 | 在光阻中形成圖案的方法、顯影的方法與光阻顯影劑組成物 |
US11694896B2 (en) | 2019-10-31 | 2023-07-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | Photoresist developer and method of developing photoresist |
TWI780715B (zh) * | 2020-05-21 | 2022-10-11 | 台灣積體電路製造股份有限公司 | 製造半導體裝置的方法及顯影劑組成物 |
Also Published As
Publication number | Publication date |
---|---|
US11300878B2 (en) | 2022-04-12 |
US11971657B2 (en) | 2024-04-30 |
US20190146337A1 (en) | 2019-05-16 |
CN109782553A (zh) | 2019-05-21 |
US20220244639A1 (en) | 2022-08-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US11287740B2 (en) | Photoresist composition and method of forming photoresist pattern | |
US8932799B2 (en) | Photoresist system and method | |
US11971657B2 (en) | Photoresist developer and method of developing photoresist | |
US20210294212A1 (en) | Photoresist composition and method of forming photoresist pattern | |
US20150187565A1 (en) | Gap Filling Materials and Methods | |
US20210278762A1 (en) | Photoresist composition and method of forming photoresist pattern | |
US11073763B2 (en) | Photoresist and method | |
US20220351963A1 (en) | Cleaning solution and method of cleaning wafer | |
KR20240028387A (ko) | 포토레지스트 현상액 및 포토레지스트 현상 방법 | |
US20150227051A1 (en) | Photoresist Defect Reduction System and Method | |
TWI763098B (zh) | 在光阻中形成圖案的方法、顯影的方法與光阻顯影劑組成物 | |
US9110376B2 (en) | Photoresist system and method | |
US9599896B2 (en) | Photoresist system and method | |
TWI708999B (zh) | 光阻組成物及形成光阻圖案的方法 | |
US10036953B2 (en) | Photoresist system and method | |
TWI774172B (zh) | 製造半導體裝置的方法 | |
KR20210086994A (ko) | 포토레지스트 패턴의 형성 방법 |