TW201918709A - Board for inspection, and method for manufacturing board for inspection with electrically conductive protecting portion - Google Patents

Board for inspection, and method for manufacturing board for inspection with electrically conductive protecting portion Download PDF

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Publication number
TW201918709A
TW201918709A TW107126523A TW107126523A TW201918709A TW 201918709 A TW201918709 A TW 201918709A TW 107126523 A TW107126523 A TW 107126523A TW 107126523 A TW107126523 A TW 107126523A TW 201918709 A TW201918709 A TW 201918709A
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Taiwan
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thickness direction
inspection
conductive
insulating layer
thickness
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TW107126523A
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Chinese (zh)
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柴田周作
高倉隼人
髙野誉大
若木秀一
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日商日東電工股份有限公司
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Publication of TW201918709A publication Critical patent/TW201918709A/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/073Multiple probes
    • G01R1/07307Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/073Multiple probes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R3/00Apparatus or processes specially adapted for the manufacture or maintenance of measuring instruments, e.g. of probe tips
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2886Features relating to contacting the IC under test, e.g. probe heads; chucks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R11/00Individual connecting elements providing two or more spaced connecting locations for conductive members which are, or may be, thereby interconnected, e.g. end pieces for wires or cables supported by the wire or cable and having means for facilitating electrical connection to some other wire, terminal, or conductive member, blocks of binding posts
    • H01R11/01Individual connecting elements providing two or more spaced connecting locations for conductive members which are, or may be, thereby interconnected, e.g. end pieces for wires or cables supported by the wire or cable and having means for facilitating electrical connection to some other wire, terminal, or conductive member, blocks of binding posts characterised by the form or arrangement of the conductive interconnection between the connecting locations
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0263High current adaptations, e.g. printed high current conductors or using auxiliary non-printed means; Fine and coarse circuit patterns on one circuit board
    • H05K1/0265High current adaptations, e.g. printed high current conductors or using auxiliary non-printed means; Fine and coarse circuit patterns on one circuit board characterized by the lay-out of or details of the printed conductors, e.g. reinforced conductors, redundant conductors, conductors having different cross-sections

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • General Engineering & Computer Science (AREA)
  • Measuring Leads Or Probes (AREA)
  • Structure Of Printed Boards (AREA)
  • Laminated Bodies (AREA)

Abstract

This board for inspection is board for inspection for electrically connecting, in a thickness direction, an inspecting device and an inspected device disposed respectively on one side and the other side thereof in the thickness direction. The board for inspection is provided with an insulating layer and a plurality of electrically connecting portions which penetrate through the insulating layer in the thickness direction and are disposed spaced apart from one another in a direction perpendicular to the thickness direction. The insulating layer covers one surface in the thickness direction of a peripheral edge portion of each of the plurality of electrically connecting portions. The insulating layer includes opposing portions which are disposed on said one side in the thickness direction of the peripheral edge portions and which oppose the peripheral edge portions, and connecting portions which are disposed between adjacent opposing portions to connect the adjacent opposing portions to one another in the perpendicular direction. A level difference D in the thickness direction between one surface in the thickness direction of the opposing portions and one surface in the thickness direction of the connecting portions is at most equal to 5 [mu]m.

Description

檢查用基板及附導電保護部檢查用基板之製造方法Method for manufacturing inspection board and inspection board with conductive protection part

本發明係關於一種檢查用基板及附導電保護部檢查用基板之製造方法,詳細而言係關於一種檢查用基板、及使用其之附導電保護部檢查用基板之製造方法。The present invention relates to a method for manufacturing a substrate for inspection and a substrate for inspection with a conductive protection portion, and more particularly to a method for manufacturing an inspection substrate and a substrate for inspection with a conductive protection portion using the same.

檢查用基板係於厚度方向上具備具有導電性之複數個導通部之各向異性導電片材。而且,周知的是檢查用基板以如下方式使用,即,介置於電性檢查裝置與被檢查電路基板之間,使該等之電極相對於複數個導通部自厚度方向兩側接觸。The inspection substrate is an anisotropic conductive sheet having a plurality of conductive portions having conductivity in the thickness direction. Furthermore, it is known that the inspection substrate is used in such a manner that it is interposed between the electrical inspection device and the circuit board to be inspected, and the electrodes are brought into contact with the plurality of conductive portions from both sides in the thickness direction.

例如,提出有一種各向異性導電片材,其具備形成有複數個貫通孔之絕緣性片材體、填充於貫通孔之導電路元件、及覆蓋導電路元件之表面之接點用金屬層(例如參照專利文獻1)。 [先前技術文獻] [專利文獻]For example, there is proposed an anisotropic conductive sheet including an insulating sheet body formed with a plurality of through holes, a conductive element filled in the through hole, and a metal layer for contacts covering the surface of the conductive element ( For example, refer to Patent Document 1). [Prior Technical Literature] [Patent Literature]

專利文獻1:日本專利特開2000-243486號公報Patent Document 1: Japanese Patent Laid-Open No. 2000-243486

[發明所欲解決之問題][Problems to be solved by the invention]

近年來,就製造方法上之觀點及確保導通部之強度之觀點等而言,存在以絕緣性片材體被覆複數個導通部之周緣部之上側之情形。於該情形時,絕緣性片材體與周緣部相應地具有起伏(凹凸)。In recent years, from the viewpoint of the manufacturing method and the viewpoint of ensuring the strength of the conducting portion, there are cases where the upper side of the peripheral portion of the plurality of conducting portions is covered with an insulating sheet body. In this case, the insulating sheet body has undulations (concavo-convex) corresponding to the peripheral edge portion.

進而,亦存在如下情形:代替接點用金屬層而將包含導電性粒子之導電保護組合物塗佈於絕緣性片材體及導電路元件之上表面之後,將絕緣性片材體之上表面之導電保護組合物去除,由導電路元件之上表面之導電保護組合物形成導電保護部。Furthermore, there is also a case where the conductive protective composition containing conductive particles is applied on the upper surface of the insulating sheet body and the circuit-conducting element instead of the metal layer for contact, and then the upper surface of the insulating sheet body The conductive protection composition is removed, and the conductive protection composition is formed from the conductive protection composition on the upper surface of the circuit-conducting element.

此時,由於塗佈於絕緣性片材體之上表面之導電保護組合物進入凹部,因而之後該導電保護組合物難以去除,因此,若該導電保護組合物殘留,則會造成於相鄰之導電路元件彼此短路,檢查之可靠性降低之不良情況。At this time, since the conductive protective composition coated on the upper surface of the insulating sheet body enters the concave portion, it is difficult to remove the conductive protective composition afterwards. Therefore, if the conductive protective composition remains, it may cause The circuit components are short-circuited to each other, and the reliability of the inspection is reduced.

本發明提供一種即便將包含導電性粒子之導電保護組合物配置於厚度方向一面,亦可於絕緣層之厚度方向上確實地去除一面上之導電保護組合物,從而檢查之可靠性優異的檢查用基板及附導電保護部檢查用基板之製造方法。 [解決問題之技術手段]The present invention provides an inspection for excellent reliability of inspection even if a conductive protection composition containing conductive particles is arranged on one side in the thickness direction, the conductive protection composition on one side can be reliably removed in the thickness direction of the insulating layer Manufacturing method of substrate and substrate for inspection with conductive protection part. [Technical means to solve the problem]

本發明(1)包含一種檢查用基板,其係用以使分別配置於厚度方向一側及另一側之檢查裝置及被檢查裝置於上述厚度方向上導通者,且具備:絕緣層;及複數個導通部,其等貫通上述絕緣層之上述厚度方向,且於相對於上述厚度方向之正交方向上相互隔開間隔配置;上述絕緣層被覆上述複數個導通部之各者之周緣部之上述厚度方向一面,上述絕緣層具有:對向部,其相對於上述周緣部配置於上述厚度方向一側,且與上述周緣部對向;及連結部,其係配置於相鄰之上述對向部之間,且將相鄰之上述對向部於上述正交方向上連結;且上述對向部之上述厚度方向一面與上述連結部之上述厚度方向一面於上述厚度方向上之位階差D為5 μm以下。The present invention (1) includes a substrate for inspection, which is used to connect an inspection device and an inspection device arranged on one side and the other side in the thickness direction to the above-mentioned thickness direction, and includes: an insulating layer; and a plurality of A plurality of conductive portions that penetrate the thickness direction of the insulating layer and are spaced apart from each other in a direction orthogonal to the thickness direction; the insulating layer covers the peripheral portion of each of the plurality of conductive portions On one surface in the thickness direction, the insulating layer has: a facing portion, which is disposed on one side in the thickness direction with respect to the peripheral edge portion and faces the peripheral edge portion; and a connecting portion, which is disposed on the adjacent facing portion And the adjacent opposing portions are connected in the orthogonal direction; and the step difference D of the thickness direction surface of the opposing portion and the thickness direction surface of the connecting portion in the thickness direction is 5 Below μm.

於該檢查用基板中,對向部之厚度方向一面與連結部之厚度方向一面於厚度方向上之位階差D為5 μm以下。因此,即便將包含導電性粒子之導電保護組合物配置於檢查用基板之厚度方向一面,其後亦可確實地將配置於絕緣層之厚度方向一面之導電保護組合物去除。因此,該檢查用基板之檢查之可靠性優異。In this inspection substrate, the step difference D in the thickness direction between the thickness direction surface of the facing portion and the thickness direction surface of the connecting portion is 5 μm or less. Therefore, even if the conductive protective composition containing conductive particles is disposed on the surface in the thickness direction of the inspection substrate, the conductive protective composition disposed on the surface in the thickness direction of the insulating layer can be reliably removed thereafter. Therefore, the inspection substrate of the inspection is excellent in reliability.

本發明(2)包含如(1)所記載之檢查用基板,其中上述對向部之厚度T2相對於上述周緣部之厚度T1之比(T2/T1)為0.6以上。The present invention (2) includes the inspection substrate as described in (1), wherein the ratio (T2 / T1) of the thickness T2 of the opposed portion to the thickness T1 of the peripheral portion is 0.6 or more.

於該檢查用基板中,由於對向部之厚度T2相對於周緣部之厚度T1之比(T2/T1)為0.6以上,因而可將上述位階差D確實地設定為5 μm以下。因此,可更加確實地將配置於絕緣層之厚度方向一面之導電保護組合物去除。In this inspection substrate, since the ratio (T2 / T1) of the thickness T2 of the opposed portion to the thickness T1 of the peripheral portion is 0.6 or more, the step difference D can be surely set to 5 μm or less. Therefore, the conductive protective composition disposed on one side of the insulating layer in the thickness direction can be more surely removed.

本發明(3)包含如(1)或(2)所記載之檢查用基板,其中上述周緣部之厚度T1為10 μm以下。The invention (3) includes the inspection substrate as described in (1) or (2), wherein the thickness T1 of the peripheral portion is 10 μm or less.

於該檢查用基板中,由於周緣部之厚度T1為10 μm以下,因而可將上述位階差D確實地設定為5 μm以下。因此,可更加確實地將配置於絕緣層之厚度方向一面之導電保護組合物去除。In this inspection substrate, since the thickness T1 of the peripheral portion is 10 μm or less, the level difference D can be surely set to 5 μm or less. Therefore, the conductive protective composition disposed on one side of the insulating layer in the thickness direction can be more surely removed.

本發明(4)包含如(1)至(3)中任一項所記載之檢查用基板,其中上述對向部之厚度T2為7 μm以上。The present invention (4) includes the inspection substrate according to any one of (1) to (3), wherein the thickness T2 of the opposed portion is 7 μm or more.

於該檢查用基板中,由於對向部之厚度T2為7 μm以上,因而可將上述位階差D確實地設定為5 μm以下。因此,可更加確實地將配置於絕緣層之厚度方向一面之導電保護組合物去除。In this inspection substrate, since the thickness T2 of the opposing portion is 7 μm or more, the level difference D can be surely set to 5 μm or less. Therefore, the conductive protective composition disposed on one side of the insulating layer in the thickness direction can be more surely removed.

本發明(5)包含如(1)至(4)中任一項所記載之檢查用基板,其中相鄰之上述導通部間之間隔I超過5 μm且未達15 μm。The present invention (5) includes the inspection substrate according to any one of (1) to (4), wherein the interval I between the above-mentioned conductive portions exceeds 5 μm and does not reach 15 μm.

於該檢查用基板中,由於相鄰之導通部間之間隔I超過5 μm且未達15 μm,因而可將上述位階差D確實地設定為5 μm以下。因此,可更加確實地將配置於絕緣層之厚度方向一面之導電保護組合物去除。In this inspection substrate, since the interval I between adjacent conductive portions exceeds 5 μm and does not reach 15 μm, the above-mentioned level difference D can be surely set to 5 μm or less. Therefore, the conductive protective composition disposed on one side of the insulating layer in the thickness direction can be more surely removed.

本發明(6)包含如(1)至(5)中任一項所記載之檢查用基板,其進而具備墊高構件,上述墊高構件於上述複數個導通部之間埋設於上述絕緣層,使上述連結部之上述厚度方向一面於上述厚度方向上相對於上述對向部之厚度方向一面接近或配置於同一位階。The present invention (6) includes the inspection substrate as described in any one of (1) to (5), which further includes an elevation member embedded in the insulating layer between the plurality of conductive portions, The one surface of the connecting portion in the thickness direction is close to or arranged at the same level in the thickness direction relative to the surface of the facing portion in the thickness direction.

該檢查用基板具備墊高構件,該墊高構件於複數個導通部之間埋設於絕緣層,使連結部之厚度方向一面於厚度方向上相對於對向部之厚度方向一面接近或配置於同一位階。因此,可將上述位階差D確實地設定為5 μm以下。可更加確實地將配置於絕緣層之厚度方向一面之導電保護組合物去除。The inspection substrate is provided with a height member, which is buried in an insulating layer between a plurality of conductive portions, so that the thickness direction of the connecting portion is close to or arranged in the same direction as the thickness direction of the opposing portion in the thickness direction of the connecting portion Rank. Therefore, the above-mentioned level difference D can be surely set to 5 μm or less. The conductive protection composition disposed on one side in the thickness direction of the insulating layer can be removed more surely.

本發明(7)包含如(6)所記載之檢查用基板,其中上述墊高構件於上述厚度方向上與上述導通部之上述周緣部位於同一位階。The present invention (7) includes the inspection substrate as described in (6), wherein the pad member is located at the same level as the peripheral portion of the conductive portion in the thickness direction.

於該檢查用基板中,由於墊高構件於厚度方向上與導通部之周緣部位於同一位階,因而構成簡單。In this inspection substrate, the pad member is located at the same level as the peripheral portion of the conductive portion in the thickness direction, so the structure is simple.

本發明(8)包含附導電保護部檢查用基板之製造方法,其具備如下步驟:將包含具有上述位階差D以上之平均粒徑d之導電性粒子的導電保護組合物配置於如(1)至(7)中任一項所記載之檢查用基板之上述厚度方向一面;將配置於上述絕緣層之上述厚度方向一面之上述導電保護組合物去除;及由配置於上述導通部之上述厚度方向一面之上述導電保護組合物形成導電保護部。The present invention (8) includes a method for manufacturing a substrate for inspection with a conductive protection part, comprising the steps of: disposing a conductive protection composition containing conductive particles having an average particle diameter d equal to or greater than the above-mentioned step difference D in (1) To the thickness direction surface of the inspection substrate described in any one of (7); the conductive protection composition disposed on the thickness direction surface of the insulating layer is removed; and the thickness direction disposed on the conducting portion The above-mentioned conductive protection composition on one side forms a conductive protection portion.

由於該附導電保護部檢查用基板之製造方法將包含具有位階差D以上之平均粒徑d之導電性粒子的導電保護組合物配置於具有上述位階差D之檢查用基板之厚度方向一面,因而可確實地將配置於絕緣層之厚度方向一面之導電保護組合物去除。Since the method for manufacturing a substrate for inspection with a conductive protection part arranges a conductive protection composition containing conductive particles having an average particle diameter d equal to or higher than the level difference D on one side in the thickness direction of the inspection substrate having the level difference D, The conductive protection composition disposed on one side in the thickness direction of the insulating layer can be surely removed.

因此,可由配置於導通部之厚度方向一面之導電保護組合物形成導電保護部,其結果可製造檢查之可靠性較高之附導電保護部檢查用基板。Therefore, the conductive protection portion can be formed from the conductive protection composition disposed on one side in the thickness direction of the conductive portion, and as a result, a highly reliable inspection substrate with conductive protection portion can be manufactured.

本發明(9)包含如(8)所記載之附導電保護部檢查用基板之製造方法,其中上述導電性粒子之平均粒徑d未達10 μm。The present invention (9) includes the method for manufacturing a substrate for inspection with a conductive protection part as described in (8), wherein the average particle diameter d of the conductive particles is less than 10 μm.

根據該附導電保護部檢查用基板之製造方法,由於導電性粒子之平均粒徑d較小,未達10 μm,因而可將包含該導電性粒子之導電保護部確實地配置於導通部之厚度方向一面。 [發明效果]According to the manufacturing method of the substrate for inspection with a conductive protection part, since the average particle diameter d of the conductive particles is small, less than 10 μm, the conductive protection part containing the conductive particles can be reliably arranged in the thickness of the conductive part Direction side. [Effect of the invention]

本發明之檢查用基板之檢查之可靠性優異。The inspection substrate of the present invention is excellent in inspection reliability.

根據本發明之附導電保護部檢查用基板之製造方法,可製造檢查之可靠性較高之附導電保護部檢查用基板。According to the method for manufacturing a substrate for inspection with a conductive protection part of the present invention, a substrate for inspection with a conductive protection part having high inspection reliability can be manufactured.

如圖1及圖2所示,該檢查用基板1係具有具特定厚度之片形狀,用以使分別配置於上側(厚度方向一側之一例)及下側(厚度方向另一側之一例)之檢查裝置30(參照圖4H)及被檢查裝置31(參照圖4H)導通而對非檢查裝置31進行電性檢查的各向異性導電片材。檢查用基板1具有於相對於厚度方向正交之面方向上延伸之大致平板(片)形狀。檢查用基板1包含絕緣層2及複數個導通部3。As shown in FIGS. 1 and 2, the inspection substrate 1 has a sheet shape with a specific thickness, which is arranged on the upper side (an example in the thickness direction) and the lower side (an example in the thickness direction) An anisotropic conductive sheet in which the inspection device 30 (refer to FIG. 4H) and the device under inspection 31 (refer to FIG. 4H) are conducted to electrically inspect the non-inspection device 31. The inspection substrate 1 has a substantially flat plate (sheet) shape extending in a plane direction orthogonal to the thickness direction. The inspection substrate 1 includes an insulating layer 2 and a plurality of conductive parts 3.

絕緣層2具有特定厚度,且具有於面方向上延伸之片形狀。絕緣層2一體地具備下側對向部4、上側對向部5、及連結部6。下側對向部4、上側對向部5、及連結部6將於下文詳述。The insulating layer 2 has a certain thickness and has a sheet shape extending in the plane direction. The insulating layer 2 integrally includes a lower facing portion 4, an upper facing portion 5, and a connecting portion 6. The lower facing portion 4, the upper facing portion 5, and the connecting portion 6 will be described in detail below.

又,絕緣層2具有供填充複數個導通部3之各者之開口部9。開口部9與複數個導通部3對應而設置有複數個。In addition, the insulating layer 2 has an opening 9 for filling each of the plurality of conductive portions 3. A plurality of openings 9 are provided corresponding to the plurality of conductive portions 3.

絕緣層2之材料例如可列舉聚醯亞胺等樹脂。絕緣層2之尺寸將於下文詳述。Examples of the material of the insulating layer 2 include resins such as polyimide. The size of the insulating layer 2 will be described in detail below.

複數個導通部3貫通絕緣層2之厚度方向,於面方向上相互隔開間隔而配置。複數個導通部3例如於俯視時呈錯位狀地排列配置。複數個導通部3之各者具有俯視大致圓形狀。複數個導通部3之各者於剖視時具有向下側突出之帽子形狀,具體而言,一體地具備位於開口部9之本體部10、及位於其周圍之作為周緣部之一例之凸緣部11。The plurality of conductive portions 3 penetrate the thickness direction of the insulating layer 2 and are arranged at intervals in the plane direction. The plurality of conductive portions 3 are arranged in a dislocated manner in a plan view, for example. Each of the plurality of conductive portions 3 has a substantially circular shape in plan view. Each of the plurality of conducting portions 3 has a hat shape protruding downward when viewed in cross-section, specifically, a body portion 10 located at the opening 9 and a flange as an example of a peripheral portion located around it are integrally provided Department 11.

本體部10為於導通部3中確保厚度方向之導通之導通部分(導通本體部)。本體部10一體地包含中央部12及傾斜部13。The body portion 10 is a conducting portion (conducting body portion) that ensures conduction in the thickness direction in the conducting portion 3. The body portion 10 integrally includes a central portion 12 and an inclined portion 13.

中央部12具有於面方向上延伸之大致圓板形狀。中央部12為位於開口部9之內側之底部。中央部12具有相互平行之上表面及下表面。複數個中央部12於厚度方向上位於同一位階。The central portion 12 has a substantially circular plate shape extending in the plane direction. The central portion 12 is the bottom located inside the opening 9. The central portion 12 has upper and lower surfaces parallel to each other. The plurality of central portions 12 are at the same level in the thickness direction.

傾斜部13為具有自中央部12之周端緣朝向面方向外側而向上側傾斜之形狀之錐形部。傾斜部13具有俯視大致圓環形狀。傾斜部13具有相互平行之上表面(上斜面)及下表面(下斜面)。The inclined portion 13 is a tapered portion having a shape inclined upward from the peripheral end edge of the central portion 12 toward the outside in the plane direction. The inclined portion 13 has a substantially circular shape in plan view. The inclined portion 13 has an upper surface (upper inclined surface) and a lower surface (lower inclined surface) parallel to each other.

凸緣部11係導通部3中用以支持於絕緣層2而保持於檢查用基板1之被支持部分(或相對於絕緣層2之鉤掛部)。凸緣部11具有自傾斜部13之周端緣朝向面方向外側延伸之大致圓環形狀(凸緣形狀)。凸緣部11相對於中央部12位於上側位階。The flange portion 11 is a supporting portion (or a hook portion with respect to the insulating layer 2) that is supported by the insulating layer 2 and held by the inspection substrate 1 in the conducting portion 3. The flange portion 11 has a substantially circular ring shape (flange shape) extending from the peripheral end edge of the inclined portion 13 toward the outside in the plane direction. The flange portion 11 is located on the upper stage with respect to the central portion 12.

凸緣部11具有相互平行之凸緣下表面14及凸緣上表面15、以及將該等之周端緣連結之連結面16。於鄰接之導通部3中,與該等對應之2個連結面16於面方向上相互對向,且於厚度方向上位於同一位階。因此,複數個凸緣部11亦於厚度方向上位於同一位階。The flange portion 11 has a flange lower surface 14 and a flange upper surface 15 parallel to each other, and a connecting surface 16 connecting these peripheral edges. In the adjacent conducting portion 3, the two connecting surfaces 16 corresponding to each other face each other in the plane direction, and are located at the same level in the thickness direction. Therefore, the plurality of flange portions 11 are also at the same level in the thickness direction.

導通部3之材料例如可列舉銅等導體。The material of the conducting portion 3 may be a conductor such as copper.

導通部3之尺寸將於下文詳述。The dimensions of the conducting portion 3 will be described in detail below.

其次,依序對絕緣層2之下側對向部4、上側對向部5及連結部6進行詳細說明。Next, the lower facing portion 4, the upper facing portion 5, and the connecting portion 6 of the insulating layer 2 will be described in detail in order.

下側對向部4係配置於導通部3之傾斜部13及凸緣部11之下側,與該等之下側對向。下側對向部4為凸緣部11之基座。下側對向部4具有大致圓環形狀。下側對向部4具有與凸緣部11之凸緣下表面14接觸之上表面、與傾斜部13之下表面接觸之錐形面18、及與上表面及錐形面18之下側對向配置之下表面。錐形面18於下側對向部4將上表面及下表面之內周緣連結。錐形面18與傾斜部13之上表面平行。又,錐形面18朝向下側而向內側傾斜。下側對向部4之下表面於下側露出。又,下側對向部4之下表面與中央部12之下表面為同一平面。The lower facing portion 4 is disposed below the inclined portion 13 and the flange portion 11 of the conducting portion 3 and faces the lower surfaces. The lower facing portion 4 is the base of the flange portion 11. The lower side facing portion 4 has a substantially circular shape. The lower side facing portion 4 has an upper surface in contact with the flange lower surface 14 of the flange portion 11, a tapered surface 18 in contact with the lower surface of the inclined portion 13, and a lower surface facing the upper surface and the tapered surface 18 Face down the configuration. The tapered surface 18 connects the inner peripheral edges of the upper surface and the lower surface at the lower facing portion 4. The tapered surface 18 is parallel to the upper surface of the inclined portion 13. Moreover, the tapered surface 18 slopes inward toward the lower side. The lower surface of the lower facing portion 4 is exposed on the lower side. In addition, the lower surface of the lower facing portion 4 and the lower surface of the central portion 12 are on the same plane.

上側對向部5係配置於凸緣部11之上側,與該等之上側對向。上側對向部5為自上側被覆凸緣部11之被覆部分。上側對向部5具有大致圓環形狀。又,上側對向部5相對於下側對向部4隔開配置凸緣部11之間隔而對向配置於上側。上側對向部5具有對向上表面7、與對向上表面7之下側對向配置之對向下表面39、及將對向上表面7及對向下表面39之內周緣連結之對向內表面8。The upper facing portion 5 is arranged above the flange portion 11 and faces the upper sides. The upper facing portion 5 is a covering portion that covers the flange portion 11 from the upper side. The upper facing portion 5 has a substantially circular shape. In addition, the upper side facing portion 5 is arranged to face the upper side with respect to the lower side facing portion 4 at intervals of the arrangement flange portion 11. The upper facing portion 5 has a facing upward surface 7, a facing downward surface 39 disposed opposite to the lower face of the facing upward surface 7, and a facing inner surface connecting inner edges of the facing upward surface 7 and the facing downward surface 39 8.

對向上表面7具有沿面方向之平坦形狀。對向上表面7與凸緣部11之凸緣上表面15平行。The upward facing surface 7 has a flat shape along the surface direction. The opposed upper surface 7 is parallel to the flange upper surface 15 of the flange portion 11.

對向下表面39為與凸緣部11之凸緣上表面15接觸之平坦面。The downward surface 39 is a flat surface that contacts the flange upper surface 15 of the flange portion 11.

對向內表面8具有沿厚度方向延伸之形狀。對向內表面8面嚮導通部3之本體部10之上表面。The opposed inner surface 8 has a shape extending in the thickness direction. The opposed inner surface 8 faces the upper surface of the body portion 10 of the guide portion 3.

連結部6於俯視時配置於相鄰之下側對向部4之間、及相鄰之上側對向部5之間。連結部6於面方向上延伸,具體而言,將相鄰之下側對向部4於面方向上連結,並且將相鄰之上側對向部5於面方向上連結。連結部6於俯視時形成為與導通部3相反之圖案(導通部3以外之區域)。The coupling portion 6 is arranged between the adjacent lower facing portions 4 and the adjacent upper facing portions 5 in a plan view. The connecting portion 6 extends in the plane direction, specifically, the adjacent lower side facing portion 4 is connected in the plane direction, and the adjacent upper side facing portion 5 is connected in the plane direction. The connecting portion 6 is formed in a pattern opposite to the conducting portion 3 (a region other than the conducting portion 3) in a plan view.

又,連結部6亦填充(配置)於相鄰之連結面16之間。連結部6與相鄰之連結面16接觸。藉此,連結部6將相鄰之連結面16絕緣。In addition, the connecting portion 6 is also filled (arranged) between adjacent connecting surfaces 16. The connecting portion 6 is in contact with the adjacent connecting surface 16. With this, the connecting portion 6 insulates the adjacent connecting surface 16.

連結部6具有於厚度方向上相互隔開間隔而對向配置之連結下表面37及連結上表面38。The coupling portion 6 has a coupling lower surface 37 and a coupling upper surface 38 which are arranged to face each other with an interval in the thickness direction.

連結下表面37具有平坦形狀。又,連結下表面37與下側對向部4之下表面連接且為同一平面。藉此,中央部12之下表面、下側對向部4之下表面、及連結下表面37形成共通之面(下表面)。The coupling lower surface 37 has a flat shape. In addition, the connecting lower surface 37 is connected to the lower surface of the lower side facing portion 4 and is on the same plane. Thereby, the lower surface of the central portion 12, the lower surface of the lower facing portion 4, and the connecting lower surface 37 form a common surface (lower surface).

連結上表面38將上側對向部5之對向上表面7之周端緣連結。連結上表面38包含朝向下側凹陷之凹部17。凹部17例如於連結部6中位於相鄰之對向上表面7之間之大致中央部。凹部17之最深部相對於對向上表面7構成厚度方向上之位階差D。即,凹部17之最深部相對於對向上表面7位於較低之位階,具體而言,位於較對向上表面7低了差D之位階。位階差D相當於凹部17之深度D。The connecting upper surface 38 connects the peripheral edge of the upper surface 7 facing the upper facing portion 5. The connection upper surface 38 includes a concave portion 17 recessed toward the lower side. The concave portion 17 is located, for example, in the substantially central portion between the adjacent pair of upper surfaces 7 in the connecting portion 6. The deepest part of the concave portion 17 forms a level difference D in the thickness direction with respect to the upper surface 7. That is, the deepest portion of the concave portion 17 is located at a lower level with respect to the upward facing surface 7, specifically, at a lower level by a difference D than the upward facing surface 7. The level difference D corresponds to the depth D of the concave portion 17.

再者,位階差D係因具有厚度T1之凸緣部11等而不可避免地產生者,本來產生位階差D並不理想。然而,本發明由於即便具有上述位階差D亦將其設定於所期望範圍,因而可確實地達成本發明之課題即導電保護組合物之去除,從而抑制相鄰之導通部3彼此之短路。In addition, the level difference D is inevitably generated due to the flange portion 11 and the like having the thickness T1, and it is not ideal to generate the level difference D originally. However, according to the present invention, even if it has the above-mentioned level difference D, it is set in a desired range, and thus it is possible to reliably achieve the object of the invention, that is, the removal of the conductive protection composition, thereby suppressing the short circuit between adjacent conductive portions 3.

再者,雖於圖2中並未圖示,不過連結上表面38除具有凹部17以外,如圖1之虛線所示,還具有複數個第2凹部47。複數個第2凹部47位於相互接近之3個導通部3之間。具體而言,位於由將3個導通部3(之中心)間相互連結之3個假想線段所包圍之假想區域內。第2凹部47之深度與凹部17之深度D相同或較其更深。再者,第2凹部47亦與凹部17同樣為不可避免地產生者。Although not shown in FIG. 2, in addition to the concave portion 17, the connecting upper surface 38 has a plurality of second concave portions 47 as shown by the broken line in FIG. 1. The plurality of second concave portions 47 are located between the three conductive portions 3 close to each other. Specifically, it is located in a virtual region surrounded by three virtual line segments connecting the three conducting portions 3 (the center) to each other. The depth of the second concave portion 47 is the same as or deeper than the depth D of the concave portion 17. In addition, the second concave portion 47 is also an inevitable one as in the concave portion 17.

又,於下側對向部4、上側對向部5及連結部6之間,未明確形成邊界線。又,絕緣層2可為單層或複數層。於絕緣層2為複數層之情形時,各層例如於厚度方向上依序配置,於各層間可明確地形成有邊界線,或亦可不形成邊界線。In addition, a boundary line is not clearly formed between the lower facing portion 4, the upper facing portion 5, and the connecting portion 6. In addition, the insulating layer 2 may be a single layer or a plurality of layers. In the case where the insulating layer 2 is a plurality of layers, the layers are sequentially arranged in the thickness direction, for example, and boundary lines may be clearly formed between the layers, or the boundary lines may not be formed.

凸緣部11於面方向相對於絕緣層2插入(嵌入)。藉此,導通部3藉由凸緣部11而支持於絕緣層2。The flange portion 11 is inserted (embedded) with respect to the insulating layer 2 in the plane direction. Thereby, the conduction part 3 is supported by the insulating layer 2 by the flange part 11.

其次,對絕緣層2及導通部3之尺寸等進行說明。Next, the dimensions and the like of the insulating layer 2 and the conducting portion 3 will be described.

絕緣層2之厚度為下側對向部4之下表面與上側對向部5之絕緣上表面7之距離,例如為5 μm以上,較佳為10 μm以上,又,例如為50 μm以下,較佳為30 μm以下。The thickness of the insulating layer 2 is the distance between the lower surface of the lower facing portion 4 and the upper insulating surface 7 of the upper facing portion 5, for example, 5 μm or more, preferably 10 μm or more, and, for example, 50 μm or less, It is preferably 30 μm or less.

絕緣層2中之上側對向部5之厚度T2例如為1 μm以上,較佳為5 μm以上,更佳為7 μm以上。若上側對向部5之厚度T2為上述下限以上,則可將位階差D(下文詳述)確實地設定為5 μm以下。因此,可更加確實地去除配置於連結部6之連結上表面38之導電保護組合物(導電塗膜28)(下文敍述)。The thickness T2 of the upper facing portion 5 in the insulating layer 2 is, for example, 1 μm or more, preferably 5 μm or more, and more preferably 7 μm or more. If the thickness T2 of the upper facing portion 5 is equal to or greater than the above lower limit, the level difference D (described in detail below) can be surely set to 5 μm or less. Therefore, the conductive protective composition (conductive coating film 28) (described later) disposed on the connecting upper surface 38 of the connecting portion 6 can be removed more surely.

又,上側對向部5之厚度T2例如為20 μm以下,較佳為15 μm以下。The thickness T2 of the upper facing portion 5 is, for example, 20 μm or less, preferably 15 μm or less.

下側對向部4之厚度例如3 μm以上,較佳為5 μm以上,又,例如為30 μm以下,較佳為18 μm以下。The thickness of the lower facing portion 4 is, for example, 3 μm or more, preferably 5 μm or more, and for example, 30 μm or less, preferably 18 μm or less.

上側對向部5之對向上表面7與連結部6之連結上表面38之凹部17之最深部的厚度方向上之位階差D為5 μm以下,較佳為4 μm以下,更佳為3 μm以下,進而較佳為2.5 μm以下,尤其較佳為1.5 μm以下。又,位階差D例如亦為0.001 μm以上,較佳為0.01 μm以上。The step difference D in the thickness direction of the deepest portion of the deepest portion of the concave portion 17 connecting the upper surface 7 of the upper facing portion 7 and the connecting portion 6 of the upper facing portion 5 is 5 μm or less, preferably 4 μm or less, more preferably 3 μm Below, further preferably 2.5 μm or less, particularly preferably 1.5 μm or less. Also, the level difference D is, for example, 0.001 μm or more, preferably 0.01 μm or more.

若位階差D超過上述上限,則將導電保護組合物(下文敍述)配置於檢查用基板1之上表面整個面後,無法確實地去除配置於絕緣層2之上表面(尤其是凹部17)之導電保護組合物。換言之,若位階差D低於上述上限,則即便將導電保護組合物配置於檢查用基板1之上表面整個面,亦可確實地去除配置於絕緣層2之上表面(尤其是凹部17)之導電保護組合物。If the level difference D exceeds the upper limit, the conductive protection composition (described below) is disposed on the entire surface of the upper surface of the inspection substrate 1, and the upper surface of the insulating layer 2 (especially the concave portion 17) cannot be reliably removed Conductive protection composition. In other words, if the level difference D is lower than the above upper limit, even if the conductive protection composition is disposed on the entire surface of the upper surface of the inspection substrate 1, it is possible to surely remove Conductive protection composition.

導通部3之厚度例如與本體部10之厚度、及凸緣部11之厚度T1相同。具體而言,導通部3之厚度例如為25 μm以下,較佳為18 μm以下,更佳為10 μm以下,進而較佳為8 μm以下。若導通部3之厚度(凸緣部11之厚度T1)為上述上限以下,則可將位階差D確實地設定為5 μm以下。因此,可更加確實地去除配置於連結部6之連結上表面38之導電保護組合物(導電塗膜28)。The thickness of the conducting portion 3 is the same as the thickness of the body portion 10 and the thickness T1 of the flange portion 11, for example. Specifically, the thickness of the conducting portion 3 is, for example, 25 μm or less, preferably 18 μm or less, more preferably 10 μm or less, and further preferably 8 μm or less. If the thickness of the conducting portion 3 (thickness T1 of the flange portion 11) is equal to or less than the above upper limit, the level difference D can be surely set to 5 μm or less. Therefore, the conductive protection composition (conductive coating film 28) disposed on the connection upper surface 38 of the connection portion 6 can be removed more surely.

又,導通部3之厚度例如為2 μm以上,較佳為3 μm以上。The thickness of the conducting portion 3 is, for example, 2 μm or more, preferably 3 μm or more.

又,上側對向部5之厚度T2相對於凸緣部11之厚度T1之比(T2/T1)例如為0.3以上,較佳為0.6以上,更佳為0.7以上,進而較佳為1以上。若比T2/T1為上述下限以上,則可將位階差D確實地設定為5 μm以下。因此,可更加確實地去除配置於連結部6之連結上表面38之導電保護組合物(導電塗膜28)。The ratio (T2 / T1) of the thickness T2 of the upper facing portion 5 to the thickness T1 of the flange portion 11 is, for example, 0.3 or more, preferably 0.6 or more, more preferably 0.7 or more, and still more preferably 1 or more. If the ratio T2 / T1 is more than the above lower limit, the level difference D can be surely set to 5 μm or less. Therefore, the conductive protection composition (conductive coating film 28) disposed on the connection upper surface 38 of the connection portion 6 can be removed more surely.

又,比T2/T1例如為10以下,較佳為5以下。In addition, the ratio T2 / T1 is, for example, 10 or less, preferably 5 or less.

相鄰之導通部3間之間隔I、即相鄰之連結面16間之對向距離I例如未達15 μm,較佳為13 μm以下,又,例如超過5 μm,較佳為7 μm以上。若間隔I為上述上限以下,則可將位階差D確實地設定為5 μm以下。因此,可更加確實地去除配置於連結部6之連結上表面38之導電保護組合物(導電塗膜28)。若間隔I為上述下限以上,則可確實地防止鄰接之導通部3彼此之短路。The interval I between the adjacent conductive portions 3, that is, the opposed distance I between the adjacent connecting surfaces 16 is, for example, less than 15 μm, preferably 13 μm or less, and, for example, exceeds 5 μm, preferably 7 μm or more . If the interval I is equal to or less than the above upper limit, the level difference D can be surely set to 5 μm or less. Therefore, the conductive protection composition (conductive coating film 28) disposed on the connection upper surface 38 of the connection portion 6 can be removed more surely. If the interval I is equal to or greater than the above lower limit, short-circuiting of adjacent conduction parts 3 can be reliably prevented.

其次,參照圖3A~圖4H,對該檢查用基板1之製造方法進行說明。Next, the method of manufacturing the inspection substrate 1 will be described with reference to FIGS. 3A to 4H.

如圖3A所示,首先,於該方法中,準備支持板21,繼而,將絕緣下部22設置於支持板21之上表面。絕緣下部22例如為絕緣層2中位於下側之部分。絕緣下部22之材料與絕緣層2之材料相同。絕緣下部22包含下側對向部4、及連結部6之下側部分。絕緣下部22具有包含複數個開口部9之片形狀。絕緣下部22具有與支持板21之上表面接觸之下表面、與該下表面平行之上表面、及分隔開口部9且將下表面及上表面之內周緣連結之錐形面18。As shown in FIG. 3A, first, in this method, the support plate 21 is prepared, and then, the insulating lower portion 22 is provided on the upper surface of the support plate 21. The lower insulating portion 22 is, for example, a portion of the insulating layer 2 on the lower side. The material of the insulating lower portion 22 is the same as the material of the insulating layer 2. The lower insulating portion 22 includes a lower facing portion 4 and a lower portion of the connecting portion 6. The lower insulating portion 22 has a sheet shape including a plurality of openings 9. The insulating lower portion 22 has a lower surface in contact with the upper surface of the support plate 21, an upper surface parallel to the lower surface, and a tapered surface 18 that partitions the opening 9 and connects the inner periphery of the lower surface and the upper surface.

如圖3B所示,繼而,於該方法中,以具有本體部10及凸緣部11之圖案設置複數個導通部3。具體而言,於開口部9內形成本體部10,並且將凸緣部11設置於下側對向部4之上表面。例如藉由加成法、減成法等而設置複數個導通部3。As shown in FIG. 3B, then, in this method, a plurality of conducting portions 3 are provided in a pattern having a body portion 10 and a flange portion 11. Specifically, the body portion 10 is formed in the opening 9, and the flange portion 11 is provided on the upper surface of the lower facing portion 4. For example, a plurality of conduction parts 3 are provided by an addition method, a subtraction method, or the like.

此時,於凸緣部11之凸緣上表面15與連結部6之下側部分35存在階差。At this time, there is a step difference between the flange upper surface 15 of the flange portion 11 and the lower portion 35 of the connecting portion 6.

如圖3C~圖4E所示,繼而,設置絕緣上部23。如圖4E所示,絕緣上部23為與絕緣下部22之上側連接之部分,與絕緣下部22一同構成絕緣層2。絕緣上部23包含上側對向部5、及連結部6之上側部分。絕緣上部23之上表面具有上述位階差D。As shown in FIGS. 3C to 4E, then, an insulating upper portion 23 is provided. As shown in FIG. 4E, the upper insulating portion 23 is a portion connected to the upper side of the lower insulating portion 22, and together with the lower insulating portion 22 constitutes the insulating layer 2. The upper insulating portion 23 includes an upper facing portion 5 and an upper portion of the connecting portion 6. The upper surface of the insulating upper portion 23 has the above-mentioned level difference D.

於設置絕緣上部23時,例如,首先製備包含與絕緣層2相同材料之絕緣組合物。再者,於絕緣組合物中,較佳為以適當比率調配感光成分。繼而,如圖3C所示,將絕緣組合物塗佈於導通部3之上表面(包含凸緣上表面15)、及連結部6之下側部分35之上表面,其後,視需要進行乾燥,形成絕緣被膜24。When the insulating upper portion 23 is provided, for example, first, an insulating composition containing the same material as the insulating layer 2 is prepared. Furthermore, in the insulating composition, it is preferable to mix the photosensitive component in an appropriate ratio. Next, as shown in FIG. 3C, the insulating composition is applied to the upper surface of the conducting portion 3 (including the flange upper surface 15) and the upper surface of the lower portion 35 of the connecting portion 6, and thereafter, if necessary, dried , Formation Insulating film 24.

絕緣被膜24之上表面包含上述位階差D。詳細而言,基於凸緣上表面15與連結部6之下側部分35之階差,在與凸緣部11之上側對向之部分和為相鄰之凸緣部11間且與連結部6之下側部分35對向之部分之間,產生高低差、即位階差D。The upper surface of the insulating film 24 contains the above-mentioned level difference D. In detail, based on the step difference between the upper surface 15 of the flange and the lower portion 35 of the connecting portion 6, between the portion facing the upper portion of the flange portion 11 and the adjacent flange portion 11 and the connecting portion 6 Between the parts facing the lower part 35, a level difference D, that is, a level difference occurs.

再者,絕緣被膜24之上表面具有與中央部12對向之部分和與凸緣部11對向之部分之間之厚度方向上的第2位階差D2。第2位階差D2為絕緣被膜24之上表面中與中央部12對應而形成之第2凹部36之深度。In addition, the upper surface of the insulating film 24 has a second level difference D2 in the thickness direction between a portion facing the central portion 12 and a portion facing the flange portion 11. The second level difference D2 is the depth of the second concave portion 36 formed on the upper surface of the insulating film 24 corresponding to the central portion 12.

或,亦可代替絕緣組合物之塗佈而將具有片形狀且材料為絕緣組合物之絕緣片材配置於導通部3之上表面與連結部6之下側部分35之上表面。Alternatively, instead of applying the insulating composition, an insulating sheet having a sheet shape and made of an insulating composition may be arranged on the upper surface of the conducting portion 3 and the upper surface of the lower portion 35 of the connecting portion 6.

其後,如圖3D所示,於該方法中,將絕緣被膜24之一部分去除,形成絕緣上部23。具體而言,將絕緣被膜24中與本體部10對向之部分去除。Thereafter, as shown in FIG. 3D, in this method, a part of the insulating coating 24 is removed to form the upper insulating portion 23. Specifically, the portion of the insulating film 24 facing the main body 10 is removed.

於絕緣被膜24包含感光成分之情形時,藉由光加工而去除絕緣被膜24之一部分。或,藉由蝕刻等而將絕緣被膜24之一部分去除。此時,去除第2凹部36。When the insulating film 24 contains a photosensitive component, a part of the insulating film 24 is removed by optical processing. Or, a part of the insulating film 24 is removed by etching or the like. At this time, the second recess 36 is removed.

或,亦可將預先形成為絕緣上部23之圖案之絕緣片材配置於凸緣部11之凸緣上表面15與連結部6之下側部分35之上表面。Alternatively, an insulating sheet previously formed as a pattern of the insulating upper portion 23 may be disposed on the upper surface of the flange upper surface 15 of the flange portion 11 and the lower portion 35 of the connecting portion 6.

藉此,以相對於凸緣部11而與上側對向且填充於相鄰之凸緣部11之間之形狀形成絕緣上部23。絕緣上部23使本體部10之上表面露出。With this, the insulating upper portion 23 is formed in a shape facing the upper side with respect to the flange portion 11 and filled between the adjacent flange portions 11. The insulating upper portion 23 exposes the upper surface of the body portion 10.

藉此,形成包含絕緣下部22及絕緣上部23之絕緣層2。即,絕緣層2朝向上側而依序具備絕緣下部22及絕緣上部23之2層。Thereby, the insulating layer 2 including the lower insulating portion 22 and the upper insulating portion 23 is formed. That is, the insulating layer 2 faces the upper side and sequentially includes two layers of the lower insulating portion 22 and the upper insulating portion 23.

繼而,如圖4E所示,例如藉由剝離等而去除支持板21。藉此,使中央部12之下表面、下側對向部4之下表面、及連結部6之連結下表面37於下側露出。該等面形成共通之下表面。Then, as shown in FIG. 4E, the support plate 21 is removed by peeling or the like, for example. As a result, the lower surface of the central portion 12, the lower surface of the lower facing portion 4, and the connecting lower surface 37 of the connecting portion 6 are exposed on the lower side. These planes form a common lower surface.

藉此,製造包含絕緣層2及複數個導通部3之檢查用基板1。With this, the inspection substrate 1 including the insulating layer 2 and the plurality of conductive portions 3 is manufactured.

該檢查用基板1尚未具備導電保護部29(參照圖4H),即,並非為附導電保護層檢查用基板25。不過,檢查用基板1為可單獨流通之產業上可利用之器件。This inspection substrate 1 does not yet have a conductive protection portion 29 (see FIG. 4H), that is, it is not a substrate 25 for inspection with a conductive protection layer. However, the inspection substrate 1 is an industrially usable device that can be circulated separately.

其後,如圖4F~圖4H所示,於檢查用基板1形成導電保護部29。Thereafter, as shown in FIGS. 4F to 4H, the conductive protection portion 29 is formed on the inspection substrate 1.

如圖4H所示,導電保護部29具有追隨本體部10之上表面之形狀。即,導電保護部29具有隨著自面方向中央部朝向外側而向上側彎曲之形狀。導電保護部29具備與本體部10之上表面接觸之下表面、朝向上側開放(露出)之上表面、及與對向內表面8接觸之外周面。另一方面,導電保護部29實質上不存在上側對向部5之對向上表面7、及連結部6之連結上表面38。As shown in FIG. 4H, the conductive protection portion 29 has a shape that follows the upper surface of the body portion 10. That is, the conductive protection portion 29 has a shape that is curved upward as it goes outward from the center portion in the plane direction. The conductive protection portion 29 has a lower surface in contact with the upper surface of the body portion 10, an upper surface opened (exposed) toward the upper side, and an outer peripheral surface in contact with the opposed inner surface 8. On the other hand, the conductive protection portion 29 substantially does not have the facing upper surface 7 of the upper facing portion 5 and the connecting upper surface 38 of the connecting portion 6.

於設置導電保護部29時,首先製備導電保護組合物,如圖4F所示,將其配置於檢查用基板1之上表面整個面。When the conductive protection portion 29 is provided, first, a conductive protection composition is prepared, and as shown in FIG. 4F, it is disposed on the entire upper surface of the inspection substrate 1.

導電保護組合物例如含有導電性粒子、基質成分、及溶劑。The conductive protection composition contains, for example, conductive particles, a matrix component, and a solvent.

作為導電性粒子,可列舉:例如包含鐵、鈷、鎳、金、銀、銅、鈀、銠及該等之合金等金屬之金屬粒子;及例如具備作為核材之非導電性粒子(聚合物粒子、玻璃珠等)且於該核材表面具備包含上述金屬之殼部之核殼型粒子等。較佳可列舉將金屬被覆於聚合物粒子之核殼型粒子。導電性粒子之形狀並無特別限定,例如可列舉球形狀、板形狀、針形狀、不規則形狀等,較佳可列舉球形狀。Examples of the conductive particles include metal particles containing metals such as iron, cobalt, nickel, gold, silver, copper, palladium, rhodium, and alloys of these metals; and, for example, non-conductive particles (polymers) having a core material Particles, glass beads, etc.), and core-shell particles or the like including a shell portion of the above metal on the surface of the core material. Preferably, a core-shell type particle which coats a polymer particle with metal is mentioned. The shape of the conductive particles is not particularly limited, and examples thereof include a spherical shape, a plate shape, a needle shape, and an irregular shape, and preferably a spherical shape.

導電性粒子之平均粒徑d為上述位階差D以上。關於導電性粒子之平均粒徑d,平均粒徑d相對於位階差D之比(d/D)例如超過1.0,較佳為1.25以上,較佳為1.5以上,更佳為2.0以上,又,例如為100以下。The average particle diameter d of the conductive particles is equal to or higher than the above-mentioned level difference D. Regarding the average particle diameter d of the conductive particles, the ratio (d / D) of the average particle diameter d to the level difference D exceeds, for example, 1.0, preferably 1.25 or more, preferably 1.5 or more, more preferably 2.0 or more, and, For example, 100 or less.

若比(d/D)低於上述下限,則無法將配置於絕緣層2之上表面且含有導電性粒子之導電保護組合物確實地去除。換言之,若比(d/D)超過上述下限,則可將上述導電保護組合物確實地去除。If the ratio (d / D) is lower than the above lower limit, the conductive protection composition containing conductive particles disposed on the upper surface of the insulating layer 2 cannot be reliably removed. In other words, if the ratio (d / D) exceeds the lower limit, the conductive protection composition can be reliably removed.

如上所述,導電性粒子之平均粒徑d係根據位階差D而設定,例如為20 μm以下,較佳為未達10 μm,更佳為5 μm以下,又,例如為0.1 μm以上,較佳為1 μm以上。若導電性粒子之平均粒徑d為上述上限以下,則可將導電性粒子確實地設置於本體部10之上表面。As described above, the average particle diameter d of the conductive particles is set according to the level difference D, for example, 20 μm or less, preferably less than 10 μm, more preferably 5 μm or less, and, for example, 0.1 μm or more, more Preferably it is 1 μm or more. If the average particle diameter d of the conductive particles is equal to or less than the above upper limit, the conductive particles can be reliably provided on the upper surface of the main body 10.

相對於基質成分100質量份,導電性粒子之比率例如為150質量份以上,較佳為200質量份以上,又,例如為2000質量份以下,較佳為1500質量份以下。The ratio of the conductive particles to 100 parts by mass of the matrix component is, for example, 150 parts by mass or more, preferably 200 parts by mass or more, and for example, 2000 parts by mass or less, preferably 1500 parts by mass or less.

作為基質成分,例如可列舉丙烯酸系樹脂、環氧樹脂、苯氧樹脂等樹脂。Examples of the matrix component include resins such as acrylic resins, epoxy resins, and phenoxy resins.

作為溶劑,例如可列舉酯、醇、酮等有機溶劑;例如水;較佳可列舉有機溶劑。再者,溶劑可適時地用於改變導電保護部29之凹陷形狀。Examples of the solvent include organic solvents such as esters, alcohols, and ketones; for example, water; and preferably organic solvents. Furthermore, the solvent can be used to change the concave shape of the conductive protection portion 29 in a timely manner.

又,導電保護組合物可使用市售品。In addition, a commercially available product can be used for the conductive protection composition.

於將導電保護組合物配置於檢查用基板1之上表面時,例如使用刮刀、凹版塗佈機、噴注式塗佈機、塗鑄機、旋轉塗佈機、輥式塗佈機等塗佈裝置。When the conductive protective composition is placed on the upper surface of the inspection substrate 1, for example, a doctor blade, a gravure coater, a spray coater, a coater, a spin coater, a roll coater, etc. are used for coating Device.

若將導電保護組合物塗佈於檢查用基板1之上表面整個面,則於本體部10之上表面、上側對向部5之對向上表面7、及連結部6之連結上表面38形成包含導電保護組合物之導電塗膜28。If the conductive protective composition is applied to the entire upper surface of the inspection substrate 1, the upper surface 7 of the main body 10, the upper surface 7 of the upper facing portion 5, and the upper surface 38 of the connecting portion 6 are formed The conductive coating 28 of the conductive protection composition.

繼而,如圖4G所示,將塗佈於上側對向部5之對向上表面7及連結部6之連結上表面38之導電塗膜28去除。使用例如刮漿板(刮擦器)26、例如感壓接著片材(帶件)等而將上述導電塗膜28去除(洗淨)。較佳為藉由刮漿板26刮去上述導電塗膜28。Next, as shown in FIG. 4G, the conductive coating film 28 applied to the upper surface 7 of the upper opposing portion 5 and the upper surface 38 of the connecting portion 6 is removed. The conductive coating film 28 is removed (washed) using, for example, a doctor blade (scraper) 26, a pressure-sensitive adhesive sheet (tape), or the like. Preferably, the conductive coating film 28 is scraped off by the doctor blade 26.

此時,塗佈於本體部10之上表面之導電塗膜28之上側部分(具體而言,位於較上側對向部5之對向上表面7更上側之部分)被去除,而下側部分(具體而言,位於較上側對向部5之對向上表面7更下側之部分)殘留(保留),從而形成下文敍述之導電保護部29。At this time, the upper portion of the conductive coating film 28 applied to the upper surface of the main body portion 10 (specifically, the portion located above the upper surface 7 from the upper facing portion 5) is removed, and the lower portion ( Specifically, the portion located on the lower side of the upper facing surface 7 from the upper facing portion 5 remains (retains), thereby forming the conductive protection portion 29 described below.

再者,於凹部17亦塗佈有導電塗膜28,雖然該導電塗膜28容易殘留於凹部17內,但如上所述,由於差D(凹部17之深度)低於上述上限,因而凹部17中之導電塗膜28不會殘留而可容易且確實地被去除。Furthermore, the concave portion 17 is also coated with a conductive coating film 28. Although the conductive coating film 28 is likely to remain in the concave portion 17, as described above, since the difference D (the depth of the concave portion 17) is lower than the upper limit, the concave portion 17 The conductive coating film 28 in the middle can be easily and surely removed without remaining.

如圖4H所示,繼而,於該方法中,例如藉由利用加熱之乾燥而去除導電塗膜28中之溶劑。藉此,於本體部10之上表面形成包含導電性粒子及基質成分之導電保護部29。As shown in FIG. 4H, then, in this method, the solvent in the conductive coating film 28 is removed by, for example, drying by heating. As a result, a conductive protection portion 29 containing conductive particles and matrix components is formed on the upper surface of the body portion 10.

藉此,製造具備檢查用基板1、及導電保護部29之附導電保護層檢查用基板25。Thereby, the substrate 25 for inspection with a conductive protective layer provided with the substrate for inspection 1 and the conductive protection portion 29 is manufactured.

其次,對於使用該附導電保護層檢查用基板25而對非檢查裝置31進行電性檢查之方法進行說明。Next, a method of electrically inspecting the non-inspection device 31 using the substrate 25 for inspection with a conductive protective layer will be described.

於該方法中,準備具有複數個檢查電極33之檢查裝置30、及具有複數個電極34之被檢查裝置31,如圖4H之假想線所示,分別於附導電保護層檢查用基板25之上側及下側,配置檢查裝置30及被檢查裝置31之各者。In this method, an inspection device 30 having a plurality of inspection electrodes 33 and an inspection device 31 having a plurality of electrodes 34 are prepared, as shown by an imaginary line in FIG. 4H, respectively above the substrate 25 for inspection with a conductive protective layer On the lower side, each of the inspection device 30 and the inspection device 31 is arranged.

繼而,使檢查電極33與導電保護部29之上表面接觸,並且使電極34與中央部12之下表面接觸。Then, the inspection electrode 33 is brought into contact with the upper surface of the conductive protection portion 29, and the electrode 34 is brought into contact with the lower surface of the central portion 12.

藉此,對非檢查裝置31進行電性檢查。As a result, the non-inspection device 31 is electrically inspected.

而且,於該檢查用基板1中,上側對向部5之對向上表面7與連結部6之包含凹部17之連結上表面38於厚度方向上之位階差D為5 μm以下。因此,即便將包含導電性粒子之導電保護組合物配置於檢查用基板1之上表面整個面,其後亦可將配置於絕緣層2之上表面(尤其是凹部17)之導電保護組合物確實地去除。Further, in this inspection substrate 1, the level difference D in the thickness direction of the upper surface 7 of the upper facing portion 5 and the connecting upper surface 38 including the concave portion 17 of the connecting portion 6 in the thickness direction is 5 μm or less. Therefore, even if the conductive protection composition containing conductive particles is disposed on the entire upper surface of the inspection substrate 1, the conductive protection composition disposed on the upper surface of the insulating layer 2 (especially the concave portion 17) can be surely thereafter To remove.

另一方面,如圖4H之虛線所示,若上述位階差D超過5 μm,則配置於凹部17之導電保護組合物、尤其是導電性粒子容易殘留。因此,存在相鄰之導通部3彼此短路之情形。On the other hand, as indicated by the dotted line in FIG. 4H, if the level difference D exceeds 5 μm, the conductive protective composition disposed in the concave portion 17, especially conductive particles, tend to remain. Therefore, there may be a case where adjacent conduction parts 3 are short-circuited with each other.

另一方面,於該一實施形態之檢查用基板1中,位階差D為5 μm以下,可將包含導電性粒子之導電保護組合物確實地去除,因此可抑制相鄰之導通部3彼此之短路。其結果為,檢查用基板1之檢查之可靠性優異。On the other hand, in the inspection substrate 1 of this embodiment, the level difference D is 5 μm or less, and the conductive protective composition containing conductive particles can be reliably removed, so that the adjacent conductive portions 3 can be suppressed from each other. Short circuit. As a result, the reliability of the inspection of the inspection substrate 1 is excellent.

又,於該檢查用基板1中,若上側對向部5之厚度T2相對於凸緣部11之厚度T1之比(T2/T1)為0.6以上,則可將上述位階差D確實地設定為5 μm以下。因此,可更加確實地去除配置於絕緣層2之上表面之導電保護組合物。In addition, in the inspection substrate 1, if the ratio (T2 / T1) of the thickness T2 of the upper facing portion 5 to the thickness T1 of the flange portion 11 is 0.6 or more, the step difference D can be surely set to Below 5 μm. Therefore, the conductive protective composition disposed on the upper surface of the insulating layer 2 can be more surely removed.

又,於該檢查用基板1中,若凸緣部11之厚度T1為10 μm以下,則可將上述位階差D確實地設定為5 μm以下。因此,可更加確實地去除配置於絕緣層2之上表面之導電保護組合物。In addition, in the inspection substrate 1, if the thickness T1 of the flange portion 11 is 10 μm or less, the level difference D can be surely set to 5 μm or less. Therefore, the conductive protective composition disposed on the upper surface of the insulating layer 2 can be more surely removed.

又,於該檢查用基板1中,上側對向部5之厚度T2為7 μm以上,因此可將上述位階差D確實地設定為5 μm以下。因此,可更加確實地去除配置於絕緣層2之上表面之導電保護組合物。In addition, in the inspection substrate 1, the thickness T2 of the upper facing portion 5 is 7 μm or more, so the level difference D can be surely set to 5 μm or less. Therefore, the conductive protective composition disposed on the upper surface of the insulating layer 2 can be more surely removed.

又,於該檢查用基板1中,若相鄰之導通部3間之間隔I超過5 μm且未達15 μm,則可將上述位階差D確實地設定為5 μm以下。因此,可更加確實地去除配置於絕緣層2之上表面之導電保護組合物。In addition, in this inspection substrate 1, if the interval I between adjacent conductive portions 3 exceeds 5 μm and does not reach 15 μm, the above-mentioned level difference D can be surely set to 5 μm or less. Therefore, the conductive protective composition disposed on the upper surface of the insulating layer 2 can be more surely removed.

該附導電保護層檢查用基板25之製造方法係將包含具有位階差D以上之平均粒徑d之導電性粒子的導電保護組合物配置於具有上述位階差D之檢查用基板1之上表面,因此可將配置於絕緣層2之上表面之導電保護組合物確實地去除。In the manufacturing method of the substrate 25 for inspection with a conductive protective layer, a conductive protection composition containing conductive particles having an average particle diameter d equal to or higher than the level difference D is arranged on the upper surface of the inspection substrate 1 having the level difference D, Therefore, the conductive protective composition disposed on the upper surface of the insulating layer 2 can be reliably removed.

因此,可由配置於導通部3之上表面之導電保護組合物形成導電保護部29,其結果為,可製造檢查之可靠性較高之附導電保護層檢查用基板25。Therefore, the conductive protection portion 29 can be formed from the conductive protection composition disposed on the upper surface of the conductive portion 3, and as a result, the substrate 25 for inspection with a conductive protection layer having high reliability in inspection can be manufactured.

進而,根據該附導電保護層檢查用基板25之製造方法,若導電性粒子之平均粒徑d較小,未達10 μm,則可將包含該導電性粒子之導電保護部確實地配置於本體部10之上表面。Furthermore, according to the manufacturing method of the substrate 25 for inspection with a conductive protective layer, if the average particle diameter d of the conductive particles is small, not exceeding 10 μm, the conductive protection portion including the conductive particles can be reliably arranged on the body The upper surface of the portion 10.

於一實施形態中,如圖2所示,總而言之,使凸緣部11之厚度T1較薄,且使上側對向部5之厚度T2較厚,從而減小上述位階差D。In one embodiment, as shown in FIG. 2, in general, the thickness T1 of the flange portion 11 is made thinner, and the thickness T2 of the upper facing portion 5 is made thicker, thereby reducing the above-mentioned level difference D.

例如,如圖5A所示,對凸緣部11之厚度T1較薄且上側對向部5之厚度T2亦薄之情形進行考察。於該情形時,因凸緣部11產生之階差雖然較小,但由於將上側對向部5連結之連結部6(連結部6中之絕緣上部23,以下相同)較薄,因而具有確實地追隨上述較小階差之形狀。因此,較圖2所示之凹部17產生更大之凹部17。即,圖5A之位階差D大於圖2之位階差D。For example, as shown in FIG. 5A, the case where the thickness T1 of the flange portion 11 is thin and the thickness T2 of the upper facing portion 5 is also thin is considered. In this case, although the step difference due to the flange portion 11 is small, since the connecting portion 6 (the insulating upper portion 23 in the connecting portion 6, which is the same below) connecting the upper facing portion 5 is thin, it has The ground follows the shape of the smaller step mentioned above. Therefore, a larger recess 17 is produced than the recess 17 shown in FIG. 2. That is, the level difference D of FIG. 5A is greater than the level difference D of FIG. 2.

另一方面,如圖5B所示,對凸緣部11之厚度T1較厚且上側對向部5之厚度T2亦較厚之情形進行考察。於該情形時,因凸緣部11產生之階差雖然較大,但由於將上側對向部5連結之連結部6較厚,因而對上述較大階差之追隨性較低。因此,結果產生較圖2所示之凹部17更大之凹部17。即,圖5B之位階差D大於圖2之位階差D。On the other hand, as shown in FIG. 5B, the case where the thickness T1 of the flange portion 11 is thick and the thickness T2 of the upper facing portion 5 is also thick is considered. In this case, although the step difference due to the flange portion 11 is large, since the connecting portion 6 connecting the upper facing portion 5 is thick, the followability to the above large step difference is low. Therefore, as a result, a recess 17 larger than the recess 17 shown in FIG. 2 is produced. That is, the level difference D of FIG. 5B is greater than the level difference D of FIG. 2.

另一方面,如圖5C所示,對凸緣部11之厚度T1較厚而上側對向部5之厚度T2較薄之情形進行考察。於該情形時,因凸緣部11產生之階差較大且將上側對向部5連結之連結部6較薄,因此對上述較大階差之追隨性較高。因此,產生較圖5B及圖5C所示之凹部17更大之凹部17。即,產生明顯較圖5A所示之凹部17更大之凹部17。即,圖5D之位階差D明顯大於圖2之位階差D。On the other hand, as shown in FIG. 5C, the case where the thickness T1 of the flange portion 11 is thick and the thickness T2 of the upper facing portion 5 is thin is examined. In this case, since the step difference generated by the flange portion 11 is large and the connecting portion 6 connecting the upper side facing portion 5 is thin, the followability to the above large step difference is high. Therefore, a concave portion 17 larger than the concave portion 17 shown in FIGS. 5B and 5C is generated. That is, a recess 17 that is significantly larger than the recess 17 shown in FIG. 5A is generated. That is, the level difference D of FIG. 5D is significantly larger than the level difference D of FIG. 2.

於該一實施形態中,藉由將上側對向部5之厚度T2相對於凸緣部11之厚度T1之比(T2/T1)設定為較大,或進而將凸緣部11之厚度T1設定為所期望之上限以下,或將上側對向部5之厚度T2設定為所望之下限以上,而將凹部17之深度D設定為所期望之上限以下。In this embodiment, by setting the ratio (T2 / T1) of the thickness T2 of the upper facing portion 5 to the thickness T1 of the flange portion 11 to be larger, or further setting the thickness T1 of the flange portion 11 It is below the desired upper limit, or the thickness T2 of the upper facing portion 5 is set above the desired lower limit, and the depth D of the concave portion 17 is set below the desired upper limit.

另一方面,除凸緣部11之厚度T1及上側對向部5之厚度T2以外,如圖5D所示,於相鄰之導通部3間之間隔I較大之情形時,於相鄰之連結面16之內側,產生較圖2所示之凹部17更大之凹部17。即,圖5D之位階差D大於圖2之位階差D。On the other hand, except for the thickness T1 of the flange portion 11 and the thickness T2 of the upper facing portion 5, as shown in FIG. 5D, when the interval I between the adjacent conducting portions 3 is large, the adjacent Inside the connecting surface 16, a concave portion 17 larger than the concave portion 17 shown in FIG. 2 is generated. That is, the level difference D of FIG. 5D is greater than the level difference D of FIG. 2.

另一方面,如圖2所示,於相鄰之導通部3間之間隔I較小之情形時,將上側對向部5連結之連結部6不會確實地追隨階差。因此,凹部17變小。即,圖2之位階差D小於圖5D之位階差D。On the other hand, as shown in FIG. 2, when the interval I between the adjacent conductive portions 3 is small, the connecting portion 6 connecting the upper facing portion 5 does not surely follow the step difference. Therefore, the concave portion 17 becomes smaller. That is, the level difference D of FIG. 2 is smaller than the level difference D of FIG. 5D.

因此,於該一實施形態中,藉由將相鄰之導通部3間之間隔I設定為上述上限以下,而將凹部17之深度D設定為所期望之上限以下。Therefore, in this embodiment, the interval I between the adjacent conductive portions 3 is set to the above upper limit or lower, and the depth D of the recess 17 is set to or lower than the desired upper limit.

<變化例> 於以下之各變化例中,對於與上述一實施形態相同之構件及步驟標註同一參照符號,省略其詳細說明。又,可適當組合各變化例。進而,各變化例除特別說明以外,可產生與一實施形態相同之作用效果。<Modifications> In the following modifications, the same components and steps as those in the above-mentioned embodiment are denoted by the same reference symbols, and detailed descriptions thereof are omitted. Moreover, each modification can be combined as appropriate. Furthermore, unless otherwise specified, each of the modified examples can produce the same effects as those of the first embodiment.

於圖2所示之檢查用基板1中,雖未圖示,但可於中央部12之下表面、及/或中央部12及傾斜部13之上表面設置凸塊及/或鍍層。Although not shown in the inspection substrate 1 shown in FIG. 2, bumps and / or plating layers may be provided on the lower surface of the central portion 12 and / or the upper surface of the central portion 12 and the inclined portion 13.

又,絕緣層2中之連結部6之連結上表面38亦可不具有凹部17。對向上表面7與連結上表面38於厚度方向上位於同一位階,因此位階差D為0。於該情形時,具有深度D(位階差D)之第2凹部47殘留。即,檢查用基板1至少具有第2凹部47及凹部17之任一者。In addition, the connection upper surface 38 of the connection portion 6 in the insulating layer 2 may not have the concave portion 17. The upward facing surface 7 and the connecting upper surface 38 are at the same level in the thickness direction, so the level difference D is zero. In this case, the second concave portion 47 having the depth D (level difference D) remains. That is, the inspection substrate 1 has at least one of the second concave portion 47 and the concave portion 17.

於圖4F所示之步驟中,將導電保護組合物藉由塗佈而配置於檢查用基板1之上表面整個面,但例如亦可藉由網版印刷、噴墨印刷等印刷而配置於本體部10。於此時,即便印刷於本體部10之導電保護組合物向上側對向部5之對向上表面7、進而向連結部6之連結上表面38流出(移動),亦可藉由上述刮去(洗淨)等而確實地去除移動至凹部17之上側之導電保護組合物。In the step shown in FIG. 4F, the conductive protective composition is applied to the entire surface of the upper surface of the inspection substrate 1 by coating, but it can also be placed on the body by printing such as screen printing or inkjet printing, for example Department 10. At this time, even if the conductive protective composition printed on the body portion 10 flows (moves) to the upper surface 7 of the upper opposing portion 5 and further to the upper surface 38 of the connection of the connection portion 6, it can be scraped off by the above ( After washing, etc., the conductive protection composition that has moved to the upper side of the recess 17 is surely removed.

於一實施形態中,如圖1所示,複數個導通部3係呈錯位狀地配置,但例如亦可如圖6所示,沿縱向及橫向(兩方向均為沿面方向之方向且相互正交)相互隔開間隔而排列配置為格子狀。In one embodiment, as shown in FIG. 1, the plurality of conducting portions 3 are arranged in a dislocated manner, but for example, as shown in FIG. 6, along the longitudinal direction and the lateral direction (both directions are along the surface direction and are mutually (Intersection) spaced apart from each other and arranged in a lattice.

又,如圖7及圖8所示,檢查用基板1可進而包含墊高構件27。In addition, as shown in FIGS. 7 and 8, the inspection substrate 1 may further include a height member 27.

墊高構件27使連結部6之連結上表面38相對於上側對向部5之對向上表面7於厚度方向上接近或配置於同一位階。The shim member 27 brings the connecting upper surface 38 of the connecting portion 6 closer to or in the same order as the upper surface 7 of the upper facing portion 5 in the thickness direction.

墊高構件27於複數個導通部3之間埋設於絕緣層2。墊高構件27位於相互接近之3個導通部3之間。具體而言,於複數個導通部3配置為錯位狀之情形時,於由將3個導通部3(之中心)間相互連結之3條假想線段所包圍之假想區域內,配置有1個墊高構件27。或,如圖6之假想線所示,於複數個導通部3沿縱向及橫向排列配置之情形時,於由將4個導通部3(之中心)間相互連結之4條假想線段所包圍之假想區域內,配置有1個墊高構件27。The pad member 27 is buried in the insulating layer 2 between the plurality of conductive portions 3. The shim member 27 is located between the three conducting parts 3 close to each other. Specifically, in the case where the plurality of conducting parts 3 are arranged in a dislocation shape, one pad is arranged in a virtual region surrounded by three virtual line segments connecting the three conducting parts 3 (the center) to each other高 员 27. Or, as shown in the imaginary line of FIG. 6, when a plurality of conducting parts 3 are arranged in the vertical and horizontal directions, surrounded by four imaginary line segments connecting the four conducting parts 3 (the center) to each other One pad member 27 is arranged in the virtual area.

如圖8所示,墊高構件27係埋設於連結部6之厚度方向中央部。複數個墊高構件27之各者具有於面方向上延伸之大致圓板形狀。又,墊高構件27於厚度方向上位於與凸緣部11相同之位階。墊高構件27之厚度例如與導通部3(凸緣部11)之厚度T1相同。墊高構件27之外側面與凸緣部11之連結面16之間隔(對向距離)L為與上述I相同範圍。墊高構件27之材料並無特別限定。墊高構件27之材料例如可列舉導體、樹脂,較佳可列舉與導通部3相同之材料。若墊高構件27之材料為與導通部3相同之材料,則可將墊高構件27形成為不具有向厚度方向之導通之虛設導通部32。As shown in FIG. 8, the shim member 27 is embedded in the central portion of the connecting portion 6 in the thickness direction. Each of the plurality of shim members 27 has a substantially circular plate shape extending in the plane direction. In addition, the shim member 27 is located at the same level as the flange portion 11 in the thickness direction. The thickness of the shim member 27 is the same as the thickness T1 of the conducting portion 3 (flange portion 11), for example. The distance (facing distance) L between the outer side surface of the shim member 27 and the connecting surface 16 of the flange portion 11 is in the same range as I described above. The material of the cushion member 27 is not particularly limited. Examples of the material of the shim member 27 include conductors and resins, and preferably the same materials as those of the conducting portion 3. If the material of the pad member 27 is the same material as the conductive portion 3, the pad member 27 can be formed as a dummy conductive portion 32 that does not have conduction in the thickness direction.

於形成墊高構件27時,例如於圖3B所示之步驟中,與導通部3之形成同時地、或於其前後,將墊高構件27設置於下側部分35之上側(上表面)。若墊高構件27為虛設導通部32,則較佳為與導通部3之形成同時地形成虛設導通部32。When forming the shim member 27, for example, in the step shown in FIG. 3B, the shim member 27 is provided on the upper side (upper surface) of the lower portion 35 simultaneously with, or before and after the formation of the conductive portion 3. If the pad member 27 is the dummy conducting portion 32, it is preferable to form the dummy conducting portion 32 simultaneously with the formation of the conducting portion 3.

然後,於設置絕緣上部23時,連結部6之下側部分35之上表面(露出面)係由墊高構件27被覆,即墊高構件27之上表面成為露出面,該露出面被向上側墊高。因此,因凸緣部11產生之階差之影響降低,故而可使連結部6之連結上表面38相對於上側對向部5之對向上表面7於厚度方向上接近或配置於同一位階。Then, when the insulating upper portion 23 is provided, the upper surface (exposed surface) of the lower portion 35 of the connecting portion 6 is covered by the cushion member 27, that is, the upper surface of the cushion member 27 becomes the exposed surface, and the exposed surface is directed upward High. Therefore, since the influence of the step difference generated by the flange portion 11 is reduced, the connecting upper surface 38 of the connecting portion 6 can be approached or arranged at the same level in the thickness direction with respect to the facing upper surface 7 of the upper facing portion 5.

而且,該檢查用基板1包含墊高構件27,該墊高構件27於複數個導通部3之間埋設於絕緣層2,使連結部6之連結上表面38於厚度方向上相對於上側對向部5之對向上表面7接近或配置於同一位階。因此,可將上述位階差D確實地設定為5 μm以下。因此,可更加確實地去除配置於絕緣層2之上表面之導電保護組合物。Furthermore, the inspection substrate 1 includes an elevation member 27 embedded in the insulating layer 2 between the plurality of conductive portions 3 so that the connection upper surface 38 of the connection portion 6 faces the upper side in the thickness direction The pair of parts 5 is close to or arranged on the same level as the upper surface 7. Therefore, the above-mentioned level difference D can be surely set to 5 μm or less. Therefore, the conductive protective composition disposed on the upper surface of the insulating layer 2 can be more surely removed.

進而,墊高構件27於厚度方向上位於與凸緣部11相同之位階,因此構成簡單。Furthermore, the shim member 27 is located at the same level as the flange portion 11 in the thickness direction, so the structure is simple.

又,於圖7中,相互獨立地設置複數個墊高構件27,但例如亦可如圖9及圖10所示,於面方向上連續地設置1個墊高構件27。Furthermore, in FIG. 7, a plurality of shim members 27 are provided independently of each other, but for example, as shown in FIGS. 9 and 10, one shim member 27 may be continuously provided in the plane direction.

墊高構件27於俯視時具有大致蜂巢形狀。具體而言,墊高構件27係於面方向上連續形成有具有3組相互平行之邊之六邊形狀,且於由複數個六邊形之各者所包圍之區域,配置複數個導通部3之各者。The cushion member 27 has a substantially honeycomb shape in plan view. Specifically, the cushion member 27 is continuously formed in the plane direction with a hexagonal shape having three sets of mutually parallel sides, and a plurality of conducting portions 3 are arranged in an area surrounded by each of the plurality of hexagons Of each.

又,如圖11所示,亦可將墊高構件27以具有俯視大致Y字形狀之方式相互獨立地設置複數個。再者,墊高構件27之形狀並不限定於此,亦可為三角形狀、矩形狀、五邊形狀等多邊形狀。具體而言,於圖11所示之變化例中,為截取圖9所示之大致蜂巢形狀中之各邊之中央部。詳細而言,該等複數個墊高構件27之各者具有投影消波塊(註冊商標)之形狀,詳細而言,具有自上述假想區域之中心(重心)向3個方向延伸之3個直線部。3個直線部中各自所成之角度例如為120度。In addition, as shown in FIG. 11, a plurality of cushion members 27 may be provided independently of each other so as to have a substantially Y-shape in plan view. In addition, the shape of the shim member 27 is not limited to this, and may be a polygonal shape such as a triangular shape, a rectangular shape, and a pentagonal shape. Specifically, in the modification shown in FIG. 11, the center portion of each side in the roughly honeycomb shape shown in FIG. 9 is cut. In detail, each of the plurality of shim members 27 has the shape of a projection wave canceling block (registered trademark), and in detail, has three straight lines extending in three directions from the center (center of gravity) of the above-mentioned virtual region unit. The angle formed by each of the three straight portions is, for example, 120 degrees.

於一實施形態中,如圖2所示,下側對向部4之下表面、及連結部6之連結下表面37位於與中央部12之下表面相同位階。然而,如圖12所示,下側對向部4之下表面及連結部6之連結下表面37亦可相對於中央部12之下表面位於更低之位階(下側)。In one embodiment, as shown in FIG. 2, the lower surface of the lower facing portion 4 and the connecting lower surface 37 of the connecting portion 6 are located at the same level as the lower surface of the central portion 12. However, as shown in FIG. 12, the lower surface of the lower facing portion 4 and the connecting lower surface 37 of the connecting portion 6 may be located at a lower level (lower side) with respect to the lower surface of the central portion 12.

下側對向部4除具有一實施形態之錐形面18以外,進而具有第2錐形面19。即,於圖12所示之變化例中,下側對向部4具有2個錐形面。The lower facing portion 4 has a second tapered surface 19 in addition to the tapered surface 18 of one embodiment. That is, in the modification shown in FIG. 12, the lower facing portion 4 has two tapered surfaces.

第2錐形面19與錐形面18之下端緣連續。第2錐形面19朝向下側而向外側傾斜。第2錐形面19之下端緣與下側對向部4之下表面之內周緣連續。The second tapered surface 19 is continuous with the lower edge of the tapered surface 18. The second tapered surface 19 is inclined outward toward the lower side. The lower end edge of the second tapered surface 19 is continuous with the inner periphery of the lower surface of the lower side facing portion 4.

於一實施形態中,作為被絕緣層被覆之周緣部之一例,例示有凸緣部11,但例如亦可如圖13所示,例示傾斜部13。導通部3不包含凸緣部11而包含本體部10。In one embodiment, the flange portion 11 is exemplified as an example of the peripheral portion covered by the insulating layer, but for example, the inclined portion 13 may be exemplified as shown in FIG. 13. The conducting portion 3 does not include the flange portion 11 but includes the body portion 10.

導通部3中之傾斜部13被絕緣層2被覆。傾斜部13除具有上述上表面及下表面以外,還具有將該等之周端緣連結之連結面16。The inclined portion 13 in the conducting portion 3 is covered with the insulating layer 2. In addition to the above-mentioned upper surface and lower surface, the inclined portion 13 also has a connecting surface 16 connecting these peripheral edges.

另一方面,絕緣層2中之下側對向部4為自下側支持傾斜部13之基座,與傾斜部13之下表面接觸。On the other hand, the lower facing portion 4 in the insulating layer 2 is a base supporting the inclined portion 13 from the lower side, and is in contact with the lower surface of the inclined portion 13.

上側對向部5為自上側被覆傾斜部13之被覆部分,與傾斜部13之上側接觸。The upper facing portion 5 is a covering portion that covers the inclined portion 13 from the upper side, and is in contact with the upper side of the inclined portion 13.

於一實施形態中,如圖4H所示,導電保護部29具有彎曲形狀,雖然並未圖示,但例如亦可具有相對於上側對向部5之對向上表面7連續之平坦形狀。 [實施例]In one embodiment, as shown in FIG. 4H, the conductive protection portion 29 has a curved shape. Although not shown, for example, it may have a flat shape that is continuous with the upper surface 7 facing the upper facing portion 5. [Example]

以下,示出實施例及比較例,對本發明更具體地進行說明。再者,本發明並不限定於任何實施例及比較例。以下之記載中所使用之調配比率(含有比率)、物性值、參數等具體數值可由上述「實施形態」中記載之與該等對應之調配比率(含有比率)、物性值、參數等相應記載之上限值(定義為「以下」、「未達」之數值)或下限值(定義為「以上」、「超過」之數值)代替。Examples and comparative examples are shown below to explain the present invention more specifically. Furthermore, the present invention is not limited to any examples and comparative examples. The specific values of the blending ratio (content ratio), physical property values, and parameters used in the following description can be described by the corresponding blending ratios (content ratio), physical property values, and parameters described in the above “embodiments” The upper limit (defined as "below" and "not reached" values) or the lower limit (defined as "above" and "exceeded" values) instead.

實施例1~實施例11及比較例1~4 依照圖3A~圖4E所示之步驟,製造具有表1所記載之尺寸,且包含圖1~圖2所示之絕緣層2、導通部3之檢查用基板1。再者,絕緣層2之材料為聚醯亞胺。導通部3之材料為銅。Example 1 to Example 11 and Comparative Examples 1 to 4 According to the steps shown in FIGS. 3A to 4E, the insulating layer 2 and the conducting portion 3 having the dimensions described in Table 1 and having the sizes shown in Table 1 are manufactured.之 更新 的 PCB 1. Furthermore, the material of the insulating layer 2 is polyimide. The material of the conducting part 3 is copper.

再者,於實施例10及實施例11中,使檢查用基板1進而包含圖7及圖8所記載之墊高構件27。墊高構件27係材料為銅之虛設導通部32。In addition, in Example 10 and Example 11, the inspection substrate 1 further includes the cushion member 27 described in FIGS. 7 and 8. The pad member 27 is a dummy conduction part 32 made of copper.

製造例1~10及比較製造例1~5 依照圖4F~圖4H所示之步驟,於各實施例及各比較例之檢查用基板1設置導電保護部29。Manufacturing Examples 1 to 10 and Comparative Manufacturing Examples 1 to 5 According to the steps shown in FIGS. 4F to 4H, the conductive protection portion 29 is provided on the inspection substrate 1 of each embodiment and each comparative example.

導電保護部29具有表1所記載之平均粒徑d,包含含有鍍鎳樹脂粒子之導電性粒子70質量份、環氧樹脂(jER828,三菱化學公司製造)21質量份(基質成分中為70質量%)、及苯氧樹脂(YP-50,新日鐵住金化學公司製造)9質量份(基質成分中為30質量%)。又,導電塗膜28之局部去除係藉由利用刮漿板26之刮去實施。The conductive protection part 29 has the average particle diameter d described in Table 1, and contains 70 parts by mass of conductive particles containing nickel-plated resin particles, and 21 parts by mass of epoxy resin (jER828, manufactured by Mitsubishi Chemical Corporation) (70 parts by mass in the matrix component) %), And 9 parts by mass of phenoxy resin (YP-50, manufactured by Nippon Steel & Sumitomo Chemical Co., Ltd.) (30% by mass in the matrix component). In addition, the partial removal of the conductive coating film 28 is performed by scraping off with the squeegee 26.

(評價) (鄰接之導通部中之短路之發生率) 使電阻測定計之探針接觸於與接近(鄰接)之導通部3對應之導電保護部29之各上表面,測定電阻值,藉此對鄰接之導通部3中之短路之發生率進行評價。(Evaluation) (Occurrence Rate of Short Circuit in Adjacent Conducting Parts) Touch the probe of the resistance meter to each upper surface of the conductive protection part 29 corresponding to the adjacent (adjacent) conducting part 3, and measure the resistance value, thereby The occurrence rate of short circuit in the adjacent conduction part 3 was evaluated.

(絕緣內表面內之導電性粒子之比率) 藉由光學顯微鏡,對於對向內表面8內之導電性粒子之比率進行評價。(The ratio of conductive particles in the inner surface of the insulation) The ratio of the conductive particles in the inner surface 8 was evaluated by an optical microscope.

(綜合評價) ◎:短路之發生率未達0.2%,導電性粒子之比率為90%以上。 ○:短路之發生率為0.2%以上且1%以下,導電性粒子之比率為90%以上。 Δ:短路之發生率為0.2%以上且1%以下,導電性粒子之比率未達90%且為70%以上。 ×:短路之發生率超過1%。(Comprehensive evaluation) ◎: The occurrence rate of short circuit is less than 0.2%, and the ratio of conductive particles is more than 90%. ○: The occurrence rate of short circuit is 0.2% or more and 1% or less, and the ratio of conductive particles is 90% or more. Δ: The occurrence rate of short circuit is 0.2% or more and 1% or less, and the ratio of conductive particles is less than 90% and 70% or more. ×: The occurrence rate of short circuit exceeds 1%.

[表1] [Table 1]

再者,上述發明係作為本發明之例示之實施形態而提供,其僅為例示,不應限定性解釋。對本技術領域之人員而言明顯可知之本發明之變化例包含於下述專利申請範圍。 [產業上之可利用性]In addition, the above-mentioned invention is provided as an exemplary embodiment of the present invention, which is only an example and should not be interpreted in a limited manner. Variations of the invention that are obvious to those skilled in the art are included in the following patent application scope. [Industry availability]

本發明之檢查用基板用於非檢查用裝置之電性檢查。The inspection substrate of the present invention is used for electrical inspection of non-inspection devices.

1‧‧‧檢查用基板1‧‧‧ Inspection board

2‧‧‧絕緣層2‧‧‧Insulation

3‧‧‧導通部3‧‧‧Conducting Department

4‧‧‧下側對向部4‧‧‧Lower Opposite Department

5‧‧‧上側對向部5‧‧‧The upper part

6‧‧‧連結部6‧‧‧Link

7‧‧‧第1絕緣上表面7‧‧‧The first insulating upper surface

8‧‧‧對向內表面8‧‧‧Inward facing surface

9‧‧‧開口部9‧‧‧Opening

10‧‧‧本體部10‧‧‧Body

11‧‧‧凸緣部11‧‧‧Flange

12‧‧‧中央部12‧‧‧Central Department

13‧‧‧傾斜部13‧‧‧ Inclined part

14‧‧‧凸緣下表面14‧‧‧Flange lower surface

15‧‧‧凸緣上表面15‧‧‧Flange upper surface

16‧‧‧連結面16‧‧‧ Connection surface

17‧‧‧凹部17‧‧‧recess

18‧‧‧錐形面18‧‧‧conical surface

19‧‧‧第2錐形面19‧‧‧2nd conical surface

21‧‧‧支持板21‧‧‧Support board

22‧‧‧絕緣下部22‧‧‧Insulation lower part

23‧‧‧絕緣上部23‧‧‧Insulation upper part

24‧‧‧絕緣被膜24‧‧‧Insulation film

25‧‧‧附導電保護層檢查用基板25‧‧‧Substrate for inspection with conductive protective layer

26‧‧‧刮漿板26‧‧‧Scraper

27‧‧‧墊高構件27‧‧‧Elevation member

28‧‧‧導電塗膜28‧‧‧ conductive coating

29‧‧‧導電保護部29‧‧‧Conduction Protection Department

30‧‧‧檢查裝置30‧‧‧ Inspection device

31‧‧‧被檢查裝置31‧‧‧ Checked device

32‧‧‧虛設導通部32‧‧‧Dummy conduction department

33‧‧‧檢查電極33‧‧‧Check electrode

34‧‧‧電極34‧‧‧electrode

35‧‧‧下側部分35‧‧‧lower part

36‧‧‧第2凹部36‧‧‧Second recess

37‧‧‧連結下表面37‧‧‧Connect the lower surface

38‧‧‧連結上表面38‧‧‧Connect the upper surface

39‧‧‧對向下表面39‧‧‧ on the downward surface

47‧‧‧第2凹部47‧‧‧Second recess

D‧‧‧位階差D‧‧‧level difference

d‧‧‧導電性粒子之平均粒徑d‧‧‧The average particle size of conductive particles

D2‧‧‧第2位階差D2‧‧‧ 2nd place difference

I‧‧‧相鄰之導通部間之間隔I‧‧‧Interval between adjacent conducting parts

L‧‧‧間隔(對向距離)L‧‧‧Interval (opposite distance)

T1‧‧‧凸緣部之厚度T1‧‧‧Thickness of flange

T2‧‧‧上側對向部之厚度T2‧‧‧ Thickness of the opposite side

圖1表示本發明之檢查用基板之一實施形態之俯視圖。 圖2係圖1所示之檢查用基板之沿A-A線之剖視圖。 圖3A~圖3D係圖2所示之檢查用基板之製造方法及使用檢查用基板之附導電保護層檢查用基板之製造方法之步驟圖,圖3A表示設置絕緣下部之步驟,圖3B表示設置導通部之步驟,圖3C表示設置絕緣被膜之步驟,圖3D表示設置絕緣上部之步驟。 圖4E~圖4H係繼圖3D之後之圖2所示之檢查用基板之製造方法及使用檢查用基板之附導電保護層檢查用基板之製造方法之步驟圖,圖4E表示去除支持板之步驟,圖4F表示設置導電塗膜之步驟,圖4G表示去除導電塗膜之一部分之步驟,圖4H表示形成導電保護部而製造附導電保護層檢查用基板,繼而,藉由附導電保護層檢查用基板而對檢查裝置進行檢查之步驟。 圖5A~圖5D係用以對因凸緣部之厚度T1、上側對向部之厚度T2、導通部間之間隔I而產生之凹部進行考察的說明圖,圖5A例示凸緣部之厚度T1較薄且上側對向部5之厚度T2較薄之態樣,圖5B例示凸緣部之厚度T1較厚且上側對向部5之厚度T2較厚之態樣,圖5C例示凸緣部之厚度T1較厚且上側對向部5之厚度T2較薄之態樣,圖5D例示相鄰之導通部間之間隔I較大之態樣。 圖6表示圖1所示之檢查用基板之變化例(導通部於縱向及橫向上呈格子狀排列配置之態樣)之俯視圖。 圖7表示圖1所示之檢查用基板之變化例(包含墊高構件之態樣)之放大俯視圖。 圖8表示圖7所示之檢查用基板之沿B-B彎曲線之剖視圖。 圖9表示圖1所示之檢查用基板之變化例(具備1個墊高構件之態樣)之放大俯視圖。 圖10表示圖9所示之檢查用基板之沿A-A線之剖視圖。 圖11表示圖1所示之檢查用基板之變化例(墊高構件為大致Y字形狀之態樣)之俯視圖。 圖12表示圖1所示之檢查用基板之變化例(下側對向部具有2種錐形面之態樣)之俯視圖。 圖13表示圖2所示之檢查用基板之變化例(本體部不具備凸緣部之態樣)之俯視圖。FIG. 1 is a plan view showing an embodiment of the inspection substrate of the present invention. FIG. 2 is a cross-sectional view of the inspection substrate shown in FIG. 1 along line A-A. FIGS. 3A to 3D are steps of the manufacturing method of the inspection substrate shown in FIG. 2 and the manufacturing method of the inspection substrate with a conductive protective layer using the inspection substrate, FIG. 3A shows the step of providing the insulating lower part, and FIG. 3B shows the setting For the step of the conducting portion, FIG. 3C shows the step of providing an insulating coating, and FIG. 3D shows the step of providing the insulating upper portion. 4E to 4H are steps diagrams of the manufacturing method of the inspection substrate shown in FIG. 2 following FIG. 3D and the manufacturing method of the inspection substrate using the conductive protection layer with the inspection substrate, and FIG. 4E shows the step of removing the support plate 4F shows the step of providing a conductive coating film, FIG. 4G shows the step of removing a part of the conductive coating film, and FIG. 4H shows the formation of a conductive protection portion to manufacture a substrate with a conductive protective layer inspection, and then, by attaching a conductive protective layer inspection The step of inspecting the inspection device with the substrate. FIGS. 5A to 5D are explanatory diagrams for investigating the recessed portion due to the thickness T1 of the flange portion, the thickness T2 of the upper facing portion, and the interval I between the conductive portions, and FIG. 5A illustrates the thickness T1 of the flange portion It is thin and the thickness T2 of the upper facing portion 5 is thin. FIG. 5B illustrates the thickness T1 of the flange portion and the thickness T2 of the upper facing portion 5 is thick. FIG. 5C illustrates the flange portion. The thickness T1 is thicker and the thickness T2 of the upper facing portion 5 is thinner. FIG. 5D illustrates a state where the interval I between adjacent conductive portions is larger. FIG. 6 shows a plan view of a modified example of the inspection substrate shown in FIG. 1 (a state in which the conductive portions are arranged in a grid in the longitudinal and lateral directions). FIG. 7 is an enlarged plan view of a modified example of the inspection substrate shown in FIG. 8 is a cross-sectional view along the B-B bending line of the inspection substrate shown in FIG. 7. FIG. 9 shows an enlarged plan view of a modified example of the inspection substrate shown in FIG. 1 (a state in which one pad member is provided). FIG. 10 shows a cross-sectional view of the inspection substrate shown in FIG. 9 along line A-A. FIG. 11 shows a plan view of a modified example of the inspection substrate shown in FIG. 1 (the state in which the cushion member is substantially Y-shaped). FIG. 12 shows a plan view of a modified example of the inspection substrate shown in FIG. 1 (the state where the lower facing portion has two types of tapered surfaces). FIG. 13 shows a plan view of a modified example of the inspection substrate shown in FIG. 2 (a state where the body portion does not have a flange portion).

Claims (9)

一種檢查用基板,其特徵在於: 其係用以使分別配置於厚度方向一側及另一側之檢查裝置及被檢查裝置於上述厚度方向上導通者,且具備: 絕緣層;及複數個導通部,其等貫通上述絕緣層之上述厚度方向,且於相對於上述厚度方向之正交方向上相互隔開間隔配置; 上述絕緣層被覆上述複數個導通部之各者之周緣部之上述厚度方向一面, 上述絕緣層包含: 對向部,其相對於上述周緣部配置於上述厚度方向一側,且與上述周緣部對向;及 連結部,其係配置於相鄰之上述對向部之間,且將相鄰之上述對向部於上述正交方向上連結;且 上述對向部之上述厚度方向一面與上述連結部之上述厚度方向一面於上述厚度方向上之位階差D為5 μm以下。An inspection substrate, characterized in that: it is used to make the inspection device and the inspection device arranged on one side and the other side of the thickness direction respectively conduct in the thickness direction, and is provided with: an insulating layer; and a plurality of conduction A portion that penetrates the thickness direction of the insulating layer and is spaced apart from each other in a direction orthogonal to the thickness direction; the insulating layer covers the thickness direction of the peripheral portion of each of the plurality of conductive portions On one side, the insulating layer includes: a facing portion, which is disposed on one side in the thickness direction with respect to the peripheral edge portion, and is opposed to the peripheral edge portion; and a connecting portion, which is disposed between adjacent facing portions , And the adjacent opposing portions are connected in the orthogonal direction; and the step difference D of the thickness direction surface of the opposing portion and the thickness direction surface of the connecting portion in the thickness direction is 5 μm or less . 如請求項1之檢查用基板,其中上述對向部之厚度T2相對於上述周緣部之厚度T1之比(T2/T1)為0.6以上。The inspection substrate according to claim 1, wherein the ratio (T2 / T1) of the thickness T2 of the opposed portion to the thickness T1 of the peripheral portion is 0.6 or more. 如請求項1之檢查用基板,其中上述周緣部之厚度T1為10 μm以下。The inspection substrate according to claim 1, wherein the thickness T1 of the peripheral portion is 10 μm or less. 如請求項1之檢查用基板,其中上述對向部之厚度T2為7 μm以上。The substrate for inspection according to claim 1, wherein the thickness T2 of the opposed portion is 7 μm or more. 如請求項1之檢查用基板,其中相鄰之上述導通部間之間隔I超過5 μm且未達15 μm。The substrate for inspection as claimed in claim 1, wherein the interval I between the above-mentioned conductive portions exceeds 5 μm and does not reach 15 μm. 如請求項1之檢查用基板,其進而具備墊高構件,上述墊高構件於上述複數個導通部之間埋設於上述絕緣層,使上述連結部之上述厚度方向一面於上述厚度方向上相對於上述對向部之厚度方向一面接近或配置於同一位階。The inspection substrate according to claim 1, further comprising a padding member, the padding member being buried in the insulating layer between the plurality of conductive portions so that the thickness direction of the connecting portion is opposite to the thickness direction in the thickness direction The thickness direction of the above-mentioned opposing portion is close to or arranged at the same level. 如請求項6之檢查用基板,其中上述墊高構件於上述厚度方向上與上述導通部之上述周緣部位於同一位階。The inspection substrate according to claim 6, wherein the pad member is located at the same level as the peripheral portion of the conductive portion in the thickness direction. 一種附導電保護部檢查用基板之製造方法,其特徵在於具備如下步驟: 將包含具有上述位階差D以上之平均粒徑d之導電性粒子的導電保護組合物配置於如請求項1之檢查用基板之上述厚度方向一面; 將配置於上述絕緣層之上述厚度方向一面之上述導電保護組合物去除;及 由配置於上述導通部之上述厚度方向一面之上述導電保護組合物形成導電保護部。A method for manufacturing a substrate for inspection with a conductive protection part, comprising the steps of: disposing a conductive protection composition containing conductive particles having an average particle diameter d equal to or greater than the above-mentioned step difference D for inspection as in claim 1 The surface in the thickness direction of the substrate; removing the conductive protection composition disposed on the surface in the thickness direction of the insulating layer; and forming the conductive protection portion from the conductive protection composition disposed on the surface in the thickness direction of the conductive portion. 如請求項8之附導電保護部檢查用基板之製造方法,其中上述導電性粒子之平均粒徑d未達10 μm。The method for manufacturing a substrate for inspection of a conductive protection part according to claim 8, wherein the average particle diameter d of the conductive particles is less than 10 μm.
TW107126523A 2017-07-31 2018-07-31 Board for inspection, and method for manufacturing board for inspection with electrically conductive protecting portion TW201918709A (en)

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