TW201907188A - Optical member manufacturing method - Google Patents

Abstract

Provided is a method for producing an optical member having a first optical film and a second optical film formed on a substrate, either the first optical film or the second optical film being a phase contrast film and the remaining optical film being a polarizing film. The method comprises: a first optical film formation step in which a coating solution for a first optical film, the coating solution containing liquid crystal molecules and a solvent, is applied onto the substrate and dried, thereby forming the first optical film; an intermediate film formation step in which, after the first optical film formation step, a coating solution for an intermediate film which is different from the coating solution for the first optical film is applied on the first optical film and dried, thereby forming an intermediate film; and a second optical film formation step in which, after the intermediate film formation step, a coating solution for a second optical film, the coating solution containing liquid crystal molecules and a solvent, is applied onto the intermediate film and dried, thereby forming the second optical film.

Description

Manufacturing method of optical member

The present invention relates to a method for manufacturing an optical member.

For example, in a display using an Organic Light Emitting Diode (OLED: Organic Light Emitting Diode) (hereinafter also referred to as an “Organic EL (Electro Luminescence) display”), a circularly polarizing plate is used to suppress external light reflection. A circularly polarizing plate is produced by laminating a linearly polarizing plate and a wavelength plate (a retardation plate) so that their polarization axes intersect at 45 degrees. In addition, in a liquid crystal display (LCD: Liquid Crystal Display), such linear polarizers and wavelength plates are also used in order to control the optical rotation and birefringence of a display.

In addition, for example, the wavelength plate may be formed so that its polarization axis is inclined at 15 degrees or 75 degrees. Therefore, it is necessary to form the polarizing plate and the wavelength plate at an arbitrary angle. Furthermore, in order to cross the polarizing axes of the polarizing plate and the wavelength plate at an arbitrary angle, it is necessary to form the polarizing plates and the wavelength plate individually.

In the past, such a polarizing plate and a wavelength plate were produced using, for example, an stretched film. The stretched film is one in which the molecules in the material are aligned in one direction by extending and attaching the film in one direction.

In addition, in recent years, with the reduction in thickness of organic EL displays, liquid crystal displays, and the like, thinning of polarizing plates and wavelength plates is also required. However, when a polarizing plate and a wavelength plate are produced, when a stretched film is used as before, there is a limit to reducing the thickness of the stretched film itself, and a sufficient thin plate cannot be obtained.

Therefore, by applying a coating liquid having a predetermined material on a substrate, a polarizing plate and a wavelength plate having a necessary film thickness are formed to reduce the thickness. Specifically, for example, a coating liquid having liquid crystallinity as a predetermined material is applied to a substrate, and the substrate is cast / aligned. Liquid crystal molecules form supramolecular aggregates in the coating liquid, and after applying a shear stress while flowing the coating liquid, the major axis direction of the supramolecular aggregates is aligned in the flow direction.

In order to be able to apply a coating liquid to a substrate in this manner, various devices have been proposed in the past. For example, the polarizing film printing device described in Patent Document 1 includes a stage for holding a substrate, and a slit die for ejecting ink onto the substrate. The slit die is moved in the printing direction and the substrate is coated with ink. [Prior Art Literature] [Patent Literature]

[Patent Document 1] Japanese Patent Application Laid-Open No. 2005-62502

[Problems to be solved by the invention]

A technology for forming an optical member such as a circularly polarizing plate by applying a coating liquid on a substrate and drying it is being developed and reviewed.

However, during the manufacturing process of the optical member, the optical film such as a polarizing film and a retardation film may be broken, or damage or foreign matter may be attached to the optical film.

This invention was made in view of the said subject, The main objective is to provide the manufacturing method of an optical member, and to improve the quality of the optical member manufactured by apply | coating a coating liquid on a board | substrate, and drying. [Means to solve the problem]

In order to solve the above-mentioned problems, according to an aspect of the present invention, there is provided a method for manufacturing an optical member including a first optical film and a second optical film formed on a substrate, the first optical film, and the second optical One of the films is a retardation film, and the remaining one is a polarizing film. The method for manufacturing the optical member includes: (1) coating a first coating solution for an optical film containing liquid crystal molecules and a solvent on the foregoing; A first optical film forming process for forming the first optical film on the substrate and drying; 之后 After the first optical film forming process, an intermediate film different from the coating solution for the first optical film is applied by coating An intermediate film forming process for coating the first optical film and drying to form an intermediate film; 中间 after the intermediate film forming process, applying a second optical film coating liquid containing liquid crystal molecules and a solvent; A second optical film forming process for drying the intermediate film to form the second optical film. [Effect of the invention]

According to one aspect of the present invention, a method for manufacturing an optical structure is provided to improve the quality of an optical member manufactured by applying a coating liquid on a substrate and drying it.

Hereinafter, the form for implementing this invention is demonstrated with reference to drawings. In each drawing, the same or corresponding symbols are assigned to the same or corresponding components, and descriptions thereof are omitted.

<The manufacturing method of the optical member of 1st embodiment> FIG. 1: is a flowchart which shows the manufacturing method of the optical member of 1st embodiment. The optical member includes a first optical film and a second optical film formed on a substrate, one of the first optical film and the second optical film is a retardation film, and the remaining one of the first optical film and the second optical film is 1 This is a polarizing film.

The substrate may be any of a resin substrate, a glass substrate, a semiconductor substrate, and a metal substrate, and the resin substrate is preferred from the viewpoint of improving flexibility. From the viewpoints of improvement in flexibility and reduction in moisture permeability, the substrate may be a laminated substrate of a resin substrate and a glass substrate.

An organic light emitting diode (OLED) may be formed on the substrate in advance. The light extraction method of the OLED may be any of a top emission method and a bottom emission method. In addition, the OLED may not be formed in advance on the substrate on which the optical member is formed, and the substrate on which the optical member is formed and the substrate on which the OLED is formed may be separately attached and then bonded.

A touch sensor or the like may be formed in advance on the substrate. The touch sensor detects objects such as fingers touching or approaching the screen of an organic EL display or a liquid crystal display. Although the detection method of the touch sensor is not particularly limited, it may be a capacitive method, for example. Examples of the capacitance method include a surface type capacitance method and a projection type capacitance method. The projection type capacitance method includes a self-capacitance method and a mutual capacitance method. If the mutual capacitance method is used, it is preferable because it can perform multi-point detection at the same time. In addition, the touch sensor may not be formed in advance on the substrate on which the optical member is formed, and a substrate on which the optical member is formed and a substrate on which the touch sensor is formed may be separately prepared and then bonded.

The optical member is, for example, a circularly polarizing film. In this embodiment, a 1/4 wavelength film (λ / 4 film) is used as the first optical film, and a linear polarizing film is used as the second optical film. The 1/4 wavelength film and the linear polarizing film are formed in such a manner that their polarization axes cross at 45 degrees. Circular polarizing films are used to suppress external light reflections in liquid crystal displays and organic EL displays.

The optical member of this embodiment includes a 1/4 wavelength film as the first optical film and a linear polarizing film as the second optical film. However, the present invention is not limited to this. For example, the optical member may be a linear polarizing film as the first optical film, and a 1/4 wavelength film may be used as the second optical film.

In this embodiment, the optical member is manufactured at a temperature of 100 ° C. or lower without using ultraviolet light irradiation. When the OLED is formed in advance on the substrate, it is possible to suppress deterioration due to ultraviolet light of the OLED and deterioration due to heat of the OLED.

As shown in FIG. 1, the manufacturing method of the optical member has a first optical film formation process S121, an intermediate film formation process S122, a first optical film patterning process S123, a second optical film formation process S124, and a protective film formation process in this order. S125. The second optical film patterning process S126. Each process is explained below.

It is not necessary to perform all the processes shown in FIG. 1. The details will be described later. Although the first optical film patterning process S123 or the second optical film patterning process S126 is effective when a plurality of optical members are formed at intervals on a substrate, it is effective when only one optical member is formed on the substrate. It can be omitted. The same applies to a part of the insolubilization process described later.

In addition, processes other than the process shown in FIG. 1 may be performed. For example, before the first optical film formation process S121, in order to improve the adhesion of the first optical film to the substrate, a process of surface modification of the surface on which the first optical film is formed on the substrate may be performed. As the surface-modified film, an organic film such as a silane coupling agent or an inorganic film such as silicon nitride can be formed.

<First Optical Film Formation Process of First Embodiment> In the first optical film formation process S121 of FIG. 1, as shown in FIG. 2 to FIG. 4, a first optical film containing liquid crystal molecules and a solvent is applied. The cloth liquid 61 is applied on the substrate 10 and dried to form a first optical film 62. The first optical film 62 is, for example, a 1/4 wavelength film.

2 is a side view showing a liquid film of a first coating liquid for an optical film applied on a substrate according to the first embodiment. 3 is a side view showing a first optical film formed by drying a liquid film of a coating liquid for a first optical film according to the first embodiment. Fig. 4 is a side view showing a part of the first optical film in which the first embodiment is insoluble.

As shown in FIG. 2, in the first optical film formation process S121, the first optical film coating liquid 61 is applied onto the substrate 10 from the coating nozzle 60. The coating nozzle 60 is, for example, a slit coater having a strip-shaped discharge port underneath.

The first coating liquid 61 for an optical film includes liquid crystal molecules such as liquid crystal molecules or thermotropic liquid crystal molecules, and a solvent that dissolves the liquid crystal molecules. As the solvent, for example, water or the like is used. As the solvent, an organic solvent may be used.

By moving the coating nozzle 60 in one direction relative to the substrate 10, a shear stress can be applied to the first coating solution 61 for an optical film applied to the substrate 10. The application direction of the shear stress is consistent with the relative movement direction of the coating nozzle 60 and the substrate 10. By controlling the action direction of the shear stress, the alignment direction of the liquid crystal molecules can be controlled.

In the present embodiment, the first coating solution 61 for the optical film is applied using a slit coater, but a dip coater or the like may be used. It is also possible to apply a shearing stress to the first coating liquid 61 for an optical film, and to control the action direction of the shearing stress.

As shown in FIG. 3, in the first optical film formation process S121, the liquid film (see FIG. 2) of the first optical film coating liquid 61 applied on the substrate 10 is dried to form a first optical film 62. The solvent is removed from the liquid film of the first optical film coating liquid 61, and the alignment of the liquid crystal molecules is appropriately maintained. The first optical film 62 is, for example, a 1/4 wavelength film.

The liquid film of the first optical film coating liquid 61 is dried under reduced pressure, naturally, heat-dried, or air-dried. Compared with natural drying, reduced-pressure drying can shorten the processing time. In addition, compared with heat drying or air drying, reduced pressure drying can suppress convection of the liquid film and control the disorder of alignment of liquid crystal molecules. When the solvent remains due to drying under reduced pressure, heating and drying may be performed.

As shown in FIG. 4, in the first optical film formation process S121, only a part 63 of the first optical film 62 may be insolubilized with the cleaning solution used in the first optical film patterning process S123. This part of insolubilization is performed as necessary.

As the cleaning liquid used in the first optical film patterning process S123, the same solvent as that of the first optical film coating liquid 61 can be used, and for example, water can be used. At this time, insolubilization with respect to water is performed.

The fixing liquid 110 that does not dissolve a part 63 of the first optical film 62 is discharged from, for example, an inkjet-type coating nozzle 111. The application nozzle 111 has a plurality of discharge nozzles for discharging the droplets of the fixing liquid 110 on the lower surface.

By moving the coating nozzle 111 and the substrate 10 relatively, and simultaneously ejecting the droplets of the fixing liquid 110 from the coating nozzle 111, the coating liquid 110 is selectively applied to a part 63 of the first optical film 62. Thereby, a part 63 of the first optical film 62 is not dissolved.

For the fixing liquid 110, for example, a functional group (for example, a water-soluble functional group such as an OH group) at the end of the first optical film 62 is replaced with another functional group, and a part 63 of the first optical film 62 is not dissolved. Further, the fixing liquid 110 may be polymerized by a condensation reaction (for example, a dehydration condensation reaction such as an OH group) so that a part 63 of the first optical film 62 may not be dissolved. In the latter case, as compared with the former, insolubilization is easier because the polymerization progresses.

The fixing liquid 110 is removed after insolubilizing a part 63 of the first optical film 62. The fixing liquid 110 may include water or an organic solvent.

The region to which the fixing liquid 110 is applied may be, for example, a region where pixels such as a plurality of OLEDs are formed (hereinafter, also referred to as a “pixel region”).

In this embodiment, the fixing liquid 110 is applied to only a part 63 of the first optical film 62, and the inkjet application nozzle 111 is used, but the present invention is not limited to this. For example, only the remaining portion of the first optical film 62 is covered with a mask, and thereafter, the entire substrate 10 is immersed in the fixing solution 110, and the fixing solution may be applied to only a part 63 of the first optical film 62.

<Intermediate film formation process of the first embodiment> In the intermediate film formation process S122 of FIG. 1, as shown in FIGS. 5 to 6, an intermediate film different from the first optical film coating solution 61 is applied. The cloth liquid 71 is applied on the first optical film 62 and dried to form an intermediate film 72.

5 is a side view showing a liquid film of a coating liquid for an intermediate film applied on a first optical film according to the first embodiment. 6 is a side view showing an intermediate film formed by drying a liquid film of a coating liquid for an intermediate film according to the first embodiment.

As shown in FIG. 5, in the intermediate film formation process S122, the coating liquid 71 for an intermediate film is applied from the coating nozzle 70 to the substrate 10 on which the first optical film 62 is formed. The coating nozzle 70 may be an inkjet system, and may include a plurality of discharge nozzles for discharging droplets of the coating liquid 71 for an intermediate film on the lower surface.

By moving the coating nozzle 70 and the substrate 10 relatively, and simultaneously ejecting the droplets of the coating liquid 71 for the intermediate film from the coating nozzle 70, the coating liquid 71 for the intermediate film is selected and coated on a part 63 of the first optical film 62. .

The coating liquid 71 for an intermediate film is coated on the first optical film 62. Therefore, the liquid crystal molecules forming the first optical film 62 may be insoluble with respect to the solvent of the intermediate film coating liquid 71. The first optical film 62 can be prevented from being dissolved by applying the coating liquid 71 for an intermediate film.

The intermediate film coating liquid 71 includes an organic material forming the intermediate film 72 and a solvent that dissolves the organic material. The organic material forming the intermediate film 72 includes a polymer that is insoluble with respect to the cleaning solution used in the first optical film patterning process S123.

As the coating liquid 71 for an intermediate film, for example, a thermosetting transparent coating, a chemically reactive transparent coating, a dry curing transparent coating, or the like is used. Specifically, oil-based enamel paint, phthalic acid resin paint, and the like are used.

The thermosetting transparent coating, the chemically reactive transparent coating, and the dry hardening transparent coating are polymerized by thermal curing, chemical reaction, or dry curing, and can form a dense intermediate film 72. Therefore, the insolubility of the intermediate film 72 with respect to the cleaning liquid used in the first optical film patterning process S123 can be improved.

The coating liquid 71 for an intermediate film may have the same function as the fixing liquid 110. It is possible to promote insolubilization of a part of the first optical film 62. In addition, when part of the first optical film 62 is not dissolved by the coating solution 71 for an intermediate film, the part of the first optical film 62 may not be dissolved in the first optical film formation process S121 described above.

For example, in the coating liquid 71 for an intermediate film, a functional group at the end of the first optical film 62 (for example, a water-soluble functional group such as an OH group) is replaced with another functional group, so that a part 63 of the first optical film 62 is insoluble. Also works. In addition, the coating liquid 71 for an intermediate film may be polymerized by a condensation reaction (for example, a dehydration condensation reaction such as an OH group) to insolubilize a part 63 of the first optical film 62. In the latter case, as compared with the former, insolubilization is easier because the polymerization progresses.

The area where the coating liquid 71 for the intermediate film is applied may be the same as the area where the fixing liquid 110 is applied. For example, a region where the coating liquid 71 for an intermediate film is applied may be a pixel region on the substrate 10.

As shown in FIG. 6, in the intermediate film formation process S122, the liquid film (see FIG. 5) of the intermediate film coating liquid 71 applied on the substrate 10 is dried to form an intermediate film 72. The solvent is removed from the liquid film of the intermediate film coating liquid 71 to form an intermediate film 72.

For drying the liquid film of the coating liquid 71 for an intermediate film, reduced-pressure drying, natural drying, heat drying, and air drying are used. Compared with natural drying, reduced-pressure drying can shorten the processing time. When the solvent remains due to drying under reduced pressure, heating and drying may be performed.

The intermediate film 72 is insoluble in the cleaning solution used in the first optical film patterning process S123. Unlike the first optical film 62, the intermediate film 72 has isotropic optical characteristics. The visible light transmittance of the intermediate film 72 is preferably 95% or more. The thickness of the intermediate film 72 is preferably 10 μm or less. In order to suppress the deformation of the optical member, the smaller the residual stress of the intermediate film 72 is, the better.

The intermediate film 72 covers a main surface of a part 63 of the first optical film 62. The intermediate film 72 plays a role of protecting a part 63 of the first optical film 62 so that damage or foreign matter is not attached to the part 63 of the first optical film 62. The pencil hardness of the intermediate film 72 is preferably 2H or more. When the production of an optical member is temporarily interrupted on the way and it takes time to start again, it is particularly effective because the risk of damage or foreign matter adhesion increases.

In addition, since the remaining portion of the first optical film 62 is removed in the first optical film patterning process S123, damage or adhesion of foreign matter is not a problem. In addition, the foreign matter adhering to the intermediate film 72 can be removed by washing, and a portion 63 of the first optical film 62 is not damaged by the washing.

<The first optical film patterning process of the first embodiment> In the first optical film patterning process S123 of FIG. 1, after the intermediate film forming process S122 and before the second optical film forming process S124, only the first optical film is covered. The intermediate film 72, which is a part of the film 62 (see FIG. 6), is used as a mask, and the remaining portion of the first optical film 62 is removed as shown in FIG.

FIG. 7 is a side view showing the first optical film in which the portion not covered by the interlayer film is removed according to the first embodiment. Between the first optical film patterning process S123, a part 63 of the first optical film 62 can be protected by the intermediate film 72, and the shape of the part 63 of the first optical film 62 can be suppressed from being broken. Therefore, the quality of the optical member can be improved.

For example, in the first optical film patterning process S123, a cleaning solution in which the first optical film 62 is dissolved is used. While the substrate 10 is rotated by the turntable, the cleaning liquid is supplied to the substrate 10. The cleaning liquid supplied to the substrate 10 is diffused throughout the substrate 10 by centrifugal force, and is thrown away from the outer peripheral edge of the substrate 10.

Since a part 63 of the first optical film 62 is covered with the intermediate film 72, it does not come into contact with the cleaning solution and does not collapse due to the cleaning solution. On the other hand, the remaining portion of the first optical film 62 is in contact with the cleaning solution and is removed by being dissolved by the cleaning solution.

In addition, the cleaning solution is stored in a cleaning tank, and the substrate 10 is immersed in the cleaning solution of the cleaning tank to leave a part 63 of the first optical film 62 and dissolve the remaining portion of the first optical film 62 to Removal is also possible. The cleaning liquid in the cleaning tank may be stirred by a stirring blade or the like.

In order to reliably leave a part 63 of the first optical film 62, in the first optical film formation process S121 and the intermediate film formation process S122, it is effective to make part of the first optical film 62 insolubilized with the cleaning solution. of. It is possible to prevent excessive removal due to the entanglement of the cleaning solution, and it is possible to reliably leave a part 63 of the first optical film 62.

Since the intermediate film 72 is insoluble in the cleaning solution, in the first optical film formation process S121 and the intermediate film formation process S122, the first optical can be performed without dissolving part of the first optical film 62. Patterning of the film 62. In this case, the number of projects can be reduced.

In the above-mentioned first optical film formation process S121, it is difficult to apply the first optical film coating liquid 61 only to the pixel region because the first optical film coating liquid 61 is applied while applying a shear stress. Therefore, it is effective to perform the first optical film patterning process S123.

In this embodiment, a cleaning solution is used to remove the remaining portion of the first optical film 62, but the method of removing the remaining portion of the first optical film 62 is not particularly limited. For example, an etching method may be used. Etching may be either wet etching or dry etching.

Hereinafter, a part 63 of the first optical film 62 remaining in the first optical film patterning process S123 is also referred to as "first optical film 63".

<The second optical film formation process of the first embodiment> (2) In the second optical film formation process S124 of Fig. 1, as shown in Figs. 8 to 10, a second optical film containing liquid crystal molecules and a solvent is applied by coating. The cloth liquid 81 is applied on the intermediate film 72 and dried to form a second optical film 82. The second optical film 82 is, for example, a linear polarizing film.

8 to 10 are explanatory side views of a second optical film forming process according to the first embodiment. Fig. 8 is a side view showing a liquid film of a second coating liquid for an optical film applied to an intermediate film according to the first embodiment. 9 is a side view showing a second optical film formed by drying a liquid film of a second optical film coating liquid according to the first embodiment. FIG. 10 is a side view showing a second optical film in which a part of the first embodiment is insoluble.

As shown in FIG. 8, in the second optical film forming process S124, the second optical film coating liquid 81 is applied onto the substrate 10 from the coating nozzle 80. The coating nozzle 80 is, for example, a slit coater having a strip-shaped discharge port underneath.

The second optical film coating liquid 81 is applied onto the intermediate film 72. Therefore, the organic material forming the intermediate film 72 may be insoluble with respect to the solvent of the second optical film coating solution 81. The application of the second optical film coating liquid 81 can prevent the intermediate film 72 from being dissolved.

The second coating liquid 81 for an optical film includes liquid crystal molecules such as liquid crystal molecules or thermotropic liquid crystal molecules, and a solvent that dissolves the liquid crystal molecules. As the solvent, for example, water or the like is used. As the solvent, an organic solvent may be used.

By moving the coating nozzle 80 in one direction relative to the substrate 10, a shearing stress can be applied to the second optical film coating liquid 81 applied to the substrate 10. The application direction of the shear stress coincides with the relative movement direction of the coating nozzle 80 and the substrate 10. By controlling the action direction of the shear stress, the alignment direction of the liquid crystal molecules can be controlled.

The application direction of the shear stress in the second optical film formation process S124 is a direction that obliquely intersects with the application direction of the shear stress in the first optical film formation process S121. With this, the 1/4 wavelength film and the linearly polarizing film are formed so that their polarization axes cross at 45 degrees.

In addition, in this embodiment, although the application of the coating liquid 81 for a 2nd optical film is performed using a slit coater, a dip coater etc. may be used. Shear stress may be applied to the coating solution 81 for the second optical film, and the action direction of the shear stress may be controlled.

As shown in FIG. 9, in the second optical film formation process S124, the liquid film (see FIG. 8) of the second optical film coating liquid 81 applied on the substrate 10 is dried to form a second optical film 82. The solvent is removed from the liquid film of the second optical film coating liquid 81 and the alignment of the liquid crystal molecules is appropriately maintained. The second optical film 82 is, for example, a linear polarizing film.

The liquid film of the coating liquid 81 for the second optical film is dried under reduced pressure, naturally, heat-dried, or air-dried. Compared with natural drying, reduced-pressure drying can shorten the processing time. In addition, compared with heat drying or air drying, reduced pressure drying can suppress convection of the liquid film and control the disorder of alignment of liquid crystal molecules. When the solvent remains due to drying under reduced pressure, heating and drying may be performed.

As shown in FIG. 10, in the second optical film formation process S124, only a part 83 of the second optical film 82 may be insolubilized with the cleaning solution used in the second optical film patterning process S126. This partial insolubilization is performed as necessary.

As the cleaning liquid used in the second optical film patterning process S126, the same solvent as that of the second optical film coating liquid 81 can be used, and for example, water can be used. At this time, insolubilization with respect to water is performed.

The fixing liquid 120 which does not dissolve a part 83 of the second optical film 82 is discharged from, for example, an inkjet coating nozzle 121. The application nozzle 121 includes a plurality of discharge nozzles that discharge a plurality of droplets of the fixing liquid 120 on the lower surface.

By moving the coating nozzle 121 and the substrate 10 relatively, and simultaneously ejecting the droplets of the fixing liquid 120 from the coating nozzle 121, the coating liquid 120 is selectively applied to a part 83 of the second optical film 82. Thereby, a part 83 of the second optical film 82 is not dissolved.

The fixing liquid 120 replaces, for example, a functional group at the end of the second optical film 82 (for example, a water-soluble functional group such as an OH group) with another functional group, so that a part 83 of the second optical film 82 is not dissolved. In addition, the fixing liquid 120 may be polymerized by a condensation reaction (for example, a dehydration condensation reaction such as an OH group) to insolubilize a part 83 of the second optical film 82. In the latter case, as compared with the former, insolubilization is easier because the polymerization progresses.

The fixing liquid 120 is removed after insolubilizing a part 83 of the second optical film 82. The fixing liquid 120 may include water or an organic solvent.

The area where the fixing liquid 120 is applied is, for example, a pixel area.

In this embodiment, the fixing liquid 120 is applied to only a part 83 of the second optical film 82, and the inkjet application nozzle 121 is used, but the present invention is not limited to this. For example, only the remaining portion of the second optical film 82 is covered with a mask, and then the entire substrate 10 is immersed in the fixing solution 120, and the fixing solution may be applied to only a part 83 of the second optical film 82.

<Protective film formation process of the first embodiment> In the protective film formation process S125 of FIG. 1, as shown in FIGS. 11 to 12, a protective film different from the second optical film coating solution 81 is applied for coating. The cloth liquid 91 is applied on the second optical film 82 and dried to form a protective film 92.

11 is a side view showing a liquid film of a coating liquid for an intermediate film applied on a second optical film according to the first embodiment. 12 is a side view showing a protective film formed by drying a liquid film of a coating liquid for a protective film according to the first embodiment.

As shown in FIG. 11, in the protective film formation process S125, the coating liquid 91 for a protective film is applied from the coating nozzle 90 to the substrate 10 on which the second optical film 82 is formed. The coating nozzle 90 may be an inkjet system, and may include a plurality of discharge nozzles for discharging droplets of the coating liquid 91 for a protective film on the lower surface.

By moving the coating nozzle 90 relative to the substrate 10 and simultaneously ejecting the droplets of the coating liquid 91 for the protective film from the coating nozzle 90, the coating liquid 91 for the protective film is selected at a part 83 of the second optical film 82 .

The coating liquid 91 for a protective film is coated on the second optical film 82. Therefore, the liquid crystal molecules forming the second optical film 82 may be insoluble with respect to the solvent of the protective film coating liquid 91. The second optical film 82 can be prevented from being dissolved by applying the protective film coating liquid 91.

The coating liquid 91 for a protective film includes an organic material forming the protective film 92 and a solvent that dissolves the organic material. The organic material forming the protective film 92 includes a polymer that is insoluble with respect to the cleaning solution used in the second optical film patterning process S126.

As the coating liquid 91 for a protective film, for example, a thermosetting transparent coating material, a chemically reactive transparent coating material, a dry curing transparent coating material, and the like are used. Specifically, oil-based enamel paint, phthalic acid resin paint, and the like are used.

The thermosetting transparent coating, the chemically reactive transparent coating, and the dry hardening transparent coating are polymerized by heat curing, chemical reaction, or dry curing, and can form a dense protective film 92. Therefore, the insolubility of the protective film 92 with respect to the cleaning liquid used in the second optical film patterning process S126 can be improved.

The protective film coating liquid 91 may have the same function as the fixing liquid 120. It is possible to promote insolubilization of a part of the second optical film 82. In addition, when a part of the second optical film 82 is not dissolved by the protective film coating liquid 91, a part of the second optical film 82 may not be dissolved in the second optical film formation process S124.

For example, in the coating liquid 91 for a protective film, a functional group at the end of the second optical film 82 (for example, a water-soluble functional group such as an OH group) is replaced with another functional group, so that a part 83 of the second optical film 82 is insoluble. Also works. In addition, the coating liquid 91 for a protective film may be polymerized by a condensation reaction (for example, a dehydration condensation reaction such as an OH group) to insolubilize a part 83 of the second optical film 82. In the latter case, as compared with the former, insolubilization is easier because the polymerization progresses.

The region in which the coating liquid 91 for the protective film is applied may be the same as the region in which the fixing liquid 120 is applied. For example, a region where the coating solution 91 for a protective film is applied may be a pixel region on the substrate 10.

As shown in FIG. 12, in the protective film formation process S125, the liquid film (see FIG. 11) of the protective film coating liquid 91 applied on the substrate 10 is dried to form a protective film 92. The solvent is removed from the liquid film of the coating liquid 91 for a protective film, and the protective film 92 is formed.

The liquid film of the coating liquid 91 for a protective film is dried under reduced pressure, natural drying, heat drying, air drying, or the like. Compared with natural drying, reduced-pressure drying can shorten the processing time. When the solvent remains due to drying under reduced pressure, heating and drying may be performed.

The protective film 92 is insoluble in the cleaning solution used in the second optical film patterning process S126. Unlike the second optical film 82, the protective film 92 has isotropic optical characteristics. The visible light transmittance of the protective film 92 is preferably 95% or more. The thickness of the protective film 92 is preferably 10 μm or less. In order to suppress deformation of the optical member, the smaller the residual stress of the protective film 92 is, the better.

The protective film 92 covers the main surface of a part 83 of the second optical film 82. The protective film 92 plays a role of protecting a part 83 of the second optical film 82 so that no damage, foreign matter, or the like is adhered to the part 83 of the second optical film 82. The pencil hardness of the intermediate film 72 is preferably 2H or more.

In addition, since the remaining portion of the second optical film 82 is removed in the second optical film patterning process S126, damage or adhesion of foreign matter is not a problem. In addition, the foreign matter adhering to the protective film 92 can be removed by washing, and a portion 83 of the second optical film 82 is not damaged by the washing.

In addition, although the protective film 92 of this embodiment is formed by coating and drying the coating liquid 91 for a protective film on the second optical film 82, it may be attached to the second optical film 82 as a thin film.

<The second optical film patterning process of the first embodiment> In the second optical film patterning process S126 of FIG. 1, after the protective film formation process S125, the protective film 92 will cover only a part 83 of the second optical film 82. (Refer to FIG. 12) As a mask, the remaining portion of the second optical film 82 is removed as shown in FIG. 13.

FIG. 13 is a side view showing a second optical film from which a portion not covered by the protective film of the first embodiment is removed. Between the second optical film patterning process S126, a part 83 of the second optical film 82 can be protected by the protective film 92, and the shape of the part 83 of the second optical film 82 can be prevented from being broken. Therefore, the quality of the optical member can be improved.

For example, in the second optical film patterning process S126, a cleaning solution in which the second optical film 82 is dissolved is used. While the substrate 10 is rotated by the turntable, the cleaning liquid is supplied to the substrate 10, for example. The cleaning liquid supplied to the substrate 10 is diffused throughout the substrate 10 by centrifugal force, and is thrown away from the outer peripheral edge of the substrate 10.

Since a part 83 of the second optical film 82 is covered with the protective film 92, the second optical film 82 does not come into contact with the cleaning solution and does not collapse due to the cleaning solution. On the other hand, the remaining portion of the second optical film 82 is in contact with the cleaning solution, and is removed by being dissolved by the cleaning solution.

In addition, the cleaning solution is stored in a cleaning tank, and the substrate 10 is immersed in the cleaning solution of the cleaning tank to leave a part 83 of the second optical film 82 and dissolve the remaining portion of the second optical film 82. Removal is also possible. The cleaning liquid in the cleaning tank may be stirred by a stirring blade or the like.

In order to reliably leave a part 83 of the second optical film 82, in the second optical film formation process S124 and the protective film formation process S125, it is effective to make part of the second optical film 82 insolubilized with the cleaning solution. of. It is possible to prevent excessive removal due to the entanglement of the cleaning solution, and it is possible to surely leave a part 83 of the second optical film 82.

Since the protective film 92 is insoluble with respect to the cleaning solution, in the second optical film formation process S124 and the intermediate film formation process S125, the second optical can be performed without dissolving part of the second optical film 82. Patterning of the film 82. In this case, the number of projects can be reduced.

In the above-mentioned second optical film formation process S124, it is difficult to apply the second optical film coating liquid 81 only to the pixel area because the second optical film coating liquid 81 is applied while applying a shear stress. Therefore, it is effective to perform the second optical film patterning process S126.

In this embodiment, a cleaning solution is used to remove the remaining portion of the second optical film 82, but the method of removing the remaining portion of the second optical film 82 is not particularly limited. For example, an etching method may be used. Etching may be either wet etching or dry etching.

Hereinafter, a part 83 of the second optical film 82 remaining in the second optical film patterning process S126 is also referred to as a "second optical film 83".

According to the present embodiment, as shown in FIG. 13, the optical member 50 including the first optical film 63, the intermediate film 72, the second optical film 83, and the protective film 92 is formed on the substrate 10 in a plurality of intervals. Therefore, multiple elements of the optical member 50 are possible. In addition, in order to selectively form the optical member 50 in the pixel region, terminals provided around the pixel region can function appropriately.

<Finishing of the optical member formation process of the first embodiment> As described above, according to this embodiment, the first optical film formation process S121, the intermediate film formation process S122, and the second optical film formation process S124 are sequentially performed. An intermediate film 72 is formed between the first optical film 63 and the second optical film 83. The intermediate film 72 can protect the first optical film 63 so that no damage, foreign matter, or the like is attached to the first optical film 63. Therefore, the quality of the optical member 50 can be improved. When the production of the optical member 50 is temporarily interrupted on the way and it takes time to start again, it is particularly effective because the risk of damage or foreign matter adhesion increases.

According to this embodiment, after the intermediate film formation process S122 and before the second optical film formation process S124, the intermediate film 72 covering only a part 63 of the first optical film 62 is used as a mask to remove the remaining portion of the first optical film 62 The first optical film patterning process S123. Between the first optical film patterning process S123, a part 63 of the first optical film 62 can be protected by the intermediate film 72, and the shape of the part 63 of the first optical film 62 can be suppressed from being broken. Therefore, the quality of the optical member 50 can be improved.

According to this embodiment, in the first optical film patterning process S123, a cleaning solution in which the first optical film 62 is dissolved is used. Since a part 63 of the first optical film 62 is covered with the intermediate film 72, it does not come into contact with the cleaning solution and does not collapse due to the cleaning solution. On the other hand, the remaining portion of the first optical film 62 is in contact with the cleaning solution and is removed by being dissolved by the cleaning solution.

According to this embodiment, in the first optical film formation process S121, only a part 63 of the first optical film 62 is made insoluble in the cleaning solution used in the first optical film patterning process S123. Thereby, in the first optical film patterning process S123, it is possible to prevent excessive removal due to the entanglement of the cleaning solution, and it is possible to reliably leave a part 63 of the first optical film 62.

According to this embodiment, in the intermediate film formation process S122, the intermediate film coating liquid 71 is applied only to a part 63 of the first optical film 62, and only a part 63 of the first optical film 62 The cleaning solution used in the optical film patterning process S123 does not dissolve. Thereby, in the first optical film patterning process S123, it is possible to prevent excessive removal due to the entanglement of the cleaning solution, and it is possible to reliably leave a part 63 of the first optical film 62.

According to this embodiment, the protective film formation process S125 for forming the protective film 92 which protects the 2nd optical film 83 is performed. The protective film 92 can protect the second optical film 83 after the optical member 50 is manufactured so that no damage, foreign matter, or the like is adhered to the second optical film 83. Therefore, the quality of the optical member 50 can be improved.

According to this embodiment, after the protective film formation process S125, the protective film 92 covering only a part 83 of the second optical film 82 is used as a mask, and the second optical film patterning process is performed to remove the remaining portion of the second optical film 82. S126. Between the second optical film patterning process S126, a part 83 of the second optical film 82 can be protected by the protective film 92, and the shape of the part 83 of the second optical film 82 can be prevented from being broken. Therefore, the quality of the optical member 50 can be improved.

According to this embodiment, in the second optical film patterning process S126, a cleaning solution in which the second optical film 82 is dissolved is used. Since a part 83 of the second optical film 82 is covered with the protective film 92, the second optical film 82 does not come into contact with the cleaning solution and does not collapse due to the cleaning solution. On the other hand, the remaining portion of the second optical film 82 is in contact with the cleaning solution, and is removed by being dissolved by the cleaning solution.

According to this embodiment, in the second optical film formation process S124, only a part 83 of the second optical film 82 is made insoluble in the cleaning solution used in the second optical film patterning process S126. Thereby, in the second optical film patterning process S126, it is possible to prevent excessive removal due to the entanglement of the cleaning solution, and it is possible to reliably leave a part 83 of the second optical film 82.

According to this embodiment, in the protective film formation process S125, the protective film coating liquid 91 is applied only to a part 83 of the second optical film 82, so that only a part 83 of the second optical film 82 is opposed to the second optical film 82. The cleaning liquid used in the optical film patterning process S126 does not dissolve. Thereby, in the second optical film patterning process S126, it is possible to prevent excessive removal due to the entanglement of the cleaning solution, and it is possible to reliably leave a part 83 of the second optical film 82.

<The manufacturing method of the optical member of the 2nd Embodiment> The 1st optical film patterning process S123 is performed after the intermediate film formation process S122 in the said 1st embodiment, and the 1st optical film patterning is performed in this embodiment. After the process S123, the intermediate film formation process S122 is performed and there is a difference.

Therefore, unlike the first embodiment described above, the intermediate film 72 of this embodiment does not play the role of a mask for leaving a part 63 of the first optical film 62 and removing the remaining part of the first optical film 62. The intermediate film 72 of the present embodiment plays a role of protecting a part 63 of the first optical film 62 so that no damage, foreign matter, or the like is attached to the part 63 of the first optical film 62.

In addition, in the first embodiment, the second optical film patterning process S126 is performed after the protective film formation process S125, and in this embodiment, the protective film formation process S125 is performed after the second optical film patterning process S126. There are differences.

Therefore, the protective film 92 according to this embodiment is different from the first embodiment described above, and does not play a role as a mask for leaving a part 83 of the second optical film 82 and removing the remaining part of the second optical film 82. The protective film 92 of the present embodiment plays a role of protecting a part 83 of the second optical film 82 so that no damage, foreign matter, or the like is attached to the part 83 of the second optical film 82.

Hereinafter, the differences will be mainly described with reference to FIG. 14 and the like. FIG. 14 is a flowchart showing a method for manufacturing an optical member according to the second embodiment. As shown in FIG. 14, the manufacturing method of the optical member has a first optical film formation process S121, a first optical film patterning process S123, an intermediate film formation process S122, a second optical film formation process S124, and a second optical film in this order. Patterning process S126 and protective film formation process S125.

It is not necessary to perform all the processes shown in FIG. 14. For example, as described in detail below, although the first optical film patterning process S123 or the second optical film patterning process S126 is effective when a plurality of optical members 50 are formed on the substrate 10 at intervals, only one is formed on the substrate 10 In the case of the optical member 50, it may be omitted. The same applies to a part of the insolubilization process described later.

In addition, processes other than the process shown in FIG. 14 may be performed. For example, before the first optical film formation process S121, in order to improve the adhesion of the first optical film to the substrate, a process of surface modification of the surface on which the first optical film is formed on the substrate may be performed. As the surface-modified film, an organic film such as a silane coupling agent or an inorganic film such as silicon nitride can be formed.

Then, the first optical film formation process S121, the first optical film patterning process S123, the intermediate film formation process S122, and the second optical film formation process S124 shown in FIG. 1 are sequentially performed as shown in FIG. The protective film formation process S125 and the second optical film patterning process S126 may be used.

Then, the first optical film formation process S121, the intermediate film formation process S122, the first optical film patterning process S123, and the second optical film formation process shown in FIG. 14 are sequentially performed as shown in FIG. S124, the second optical film patterning process S126, and the protective film forming process S125 may be used.

<First Optical Film Formation Process of Second Embodiment> In the first optical film formation process S121 of FIG. 14, as shown in FIGS. 2 to 3, the first optical film containing liquid crystal molecules and a solvent is applied by coating The cloth liquid 61 is applied on the substrate 10 and dried to form a first optical film 62. The first optical film 62 is, for example, a 1/4 wavelength film.

In the first optical film formation process S121 of this embodiment, as shown in FIG. 4, the process of insolubilizing a part 63 of the first optical film 62 is not performed. This process is performed in the first optical film patterning process S123.

<The first optical film patterning process of the second embodiment> 中 In the first optical film patterning process S123 of FIG. 14, after the first optical film formation process S121, before the intermediate film formation process S122, the first optical film 62 is left. A part 63 removes the remaining part of the first optical film 62.

For example, in the first optical film patterning process S123, as shown in FIG. 4, only a part 63 of the first optical film 62 is insoluble in the cleaning solution, and thereafter, it is dissolved in the cleaning solution as shown in FIG. The remaining portion of the first optical film 62. FIG. 15 is a side view showing the first optical film in which a portion that has not been dissolved is removed in the second embodiment.

For example, while the substrate 10 is rotated by a turntable, the cleaning liquid is supplied to the substrate 10. The cleaning liquid supplied to the substrate 10 is diffused throughout the substrate 10 by centrifugal force, and is thrown away from the outer peripheral edge of the substrate 10.

Since a part 63 of the first optical film 62 is insoluble in the cleaning solution, it does not collapse due to the cleaning solution. On the other hand, the remaining portion of the first optical film 62 is not insolubilized with the cleaning solution, and is removed by being dissolved by the cleaning solution.

In addition, the cleaning solution is stored in a cleaning tank, and the substrate 10 is immersed in the cleaning solution of the cleaning tank to leave a part 63 of the first optical film 62 and dissolve the remaining portion of the first optical film 62 to Removal is also possible. The cleaning liquid in the cleaning tank may be stirred by a stirring blade or the like.

As shown in FIG. 15, in this embodiment, before the intermediate film 72 (see FIG. 17) is formed, a part 63 of the first optical film 62 is left and the remaining portion of the first optical film 62 is removed. The first optical film 62 is Patterned.

In the above-mentioned first optical film formation process S121, it is difficult to apply the first optical film coating liquid 61 only to the pixel region because the first optical film coating liquid 61 is applied while applying a shear stress. Therefore, it is effective to perform the first optical film patterning process S123.

Hereinafter, a part 63 of the first optical film 62 remaining in the first optical film patterning process S123 is also referred to as "first optical film 63".

<Intermediate film formation process of the second embodiment> In the intermediate film formation process S122 of FIG. 14, as shown in FIGS. 16 to 17, an intermediate film different from the first optical film coating solution 61 is applied by coating. The cloth liquid 71 is applied on the first optical film 63 and dried to form an intermediate film 72.

FIG. 16 is a diagram showing a liquid film of a coating liquid for an intermediate film applied on a first optical film according to a second embodiment. FIG. 17 is a view showing an intermediate film formed by drying a liquid film of a coating liquid for an intermediate film according to a second embodiment.

As shown in FIG. 16, in the intermediate film formation process S122, the coating liquid 71 for an intermediate film is applied from the coating nozzle 70 to the substrate 10 on which the first optical film 63 is formed. The coating nozzle 70 may be an inkjet system, and may include a plurality of discharge nozzles for discharging droplets of the coating liquid 71 for an intermediate film on the lower surface.

By moving the coating nozzle 70 relative to the substrate 10 and simultaneously ejecting the droplets of the coating liquid 71 for the intermediate film from the coating nozzle 70, only the first optical film 63 and its vicinity (for example, only in the pixel area and its vicinity) (Near), the coating liquid 71 for intermediate film is selected and applied.

The coating liquid 71 for an intermediate film is coated on the first optical film 63. Therefore, the liquid crystal molecules forming the first optical film 63 may be insoluble with respect to the solvent of the intermediate film coating liquid 71. The first optical film 63 can be prevented from being dissolved by applying the intermediate film coating liquid 71.

The intermediate film coating liquid 71 includes an organic material forming the intermediate film 72 and a solvent that dissolves the organic material. The organic material forming the intermediate film 72 includes a polymer and the like which are insoluble in a solvent of the second optical film coating liquid 81 (see FIG. 18) applied to the intermediate film 72.

As the coating liquid 71 for an intermediate film, for example, a thermosetting transparent coating, a chemically reactive transparent coating, a dry curing transparent coating, or the like is used. Specifically, oil-based enamel paint, phthalic acid resin paint, and the like are used.

The thermosetting transparent coating, the chemically reactive transparent coating, and the dry hardening transparent coating are polymerized by thermal curing, chemical reaction, or dry curing, and can form a dense intermediate film 72.

As shown in FIG. 16, the intermediate film coating liquid 71 may be applied not only to the first optical film 63 but also to cover the end surface of the first optical film 63. Not only the main surface of the first optical film 63, but also the first optical film 63 can be protected by the intermediate film 72 so that no damage, foreign matter, or the like is adhered to the end surface of the first optical film 63.

The area where the coating liquid 71 for an intermediate film is applied may be limited to the pixel area on the substrate 10 and its vicinity.

In addition, since the area where the coating liquid 71 for an intermediate film is applied is limited, a mask such as a film may be attached to the substrate 10. When the mask is peeled off later, a gap may be formed between the mask and the first optical film 63 so as not to damage the first optical film 63.

As shown in FIG. 17, in the intermediate film formation process S122, a liquid film (see FIG. 16) of the intermediate film coating liquid 71 applied on the substrate 10 is dried to form an intermediate film 72. The solvent is removed from the liquid film of the intermediate film coating liquid 71 to form an intermediate film 72.

Unlike the first optical film 63, the intermediate film 72 has isotropic optical characteristics. The visible light transmittance of the intermediate film 72 is preferably 95% or more. The thickness of the intermediate film 72 is preferably 10 μm or less. In order to suppress the deformation of the optical member, the smaller the residual stress of the intermediate film 72 is, the better.

The intermediate film 72 covers not only the main surface of the first optical film 63 but also the end surface of the first optical film 63. The intermediate film 72 plays a role of protecting the first optical film 63 so that no damage, foreign matter, or the like adheres to the first optical film 62. The pencil hardness of the intermediate film 72 is preferably 2H or more. When the production of an optical member is temporarily interrupted on the way and it takes time to start again, it is particularly effective because the risk of damage or foreign matter adhesion increases.

The intermediate film 72 is formed only in the pixel region on the substrate 10 and its vicinity, and is formed on the substrate 10 at a plurality of intervals. When it is not necessary to take out the terminals provided in the periphery of the pixel region, the intermediate film 72 may be formed on almost the entire substrate 10. When the second optical film coating liquid 81 is applied on the intermediate film 72, the alignment controllability of the liquid crystal molecules of the second optical film coating liquid 81 is excellent.

<Second Optical Film Formation Process of Second Embodiment> In the second optical film formation process S124 of FIG. 14, as shown in FIGS. 18 to 19, a second optical film containing liquid crystal molecules and a solvent is applied by coating. The cloth liquid 81 is applied on the intermediate film 72 and dried to form a second optical film 82. The second optical film 82 is, for example, a linear polarizing film.

18 is a side view showing a liquid film of a second coating liquid for an optical film applied to an intermediate film according to a second embodiment. 19 is a side view showing a second optical film formed by drying a liquid film of a coating liquid for a second optical film according to a second embodiment.

As shown in FIG. 18, in the second optical film formation process S124, the second optical film coating liquid 81 is applied onto the substrate 10 from the coating nozzle 80. The coating nozzle 80 is, for example, a slit coater having a strip-shaped discharge port underneath.

The second optical film coating liquid 81 is applied onto the intermediate film 72. Therefore, the organic material forming the intermediate film 72 may be insoluble with respect to the solvent of the second optical film coating solution 81. The application of the second optical film coating liquid 81 can prevent the intermediate film 72 from being dissolved.

In addition, in this embodiment, although the application of the coating liquid 81 for a 2nd optical film is performed using a slit coater, a dip coater etc. may be used. Shear stress may be applied to the coating solution 81 for the second optical film, and the action direction of the shear stress may be controlled.

As shown in FIG. 19, in the second optical film formation process S124, the liquid film (see FIG. 18) of the second optical film coating liquid 81 applied on the substrate 10 is dried to form a second optical film 82. The solvent is removed from the liquid film of the second optical film coating liquid 81 and the alignment of the liquid crystal molecules is appropriately maintained. The second optical film 82 is, for example, a linear polarizing film.

<The second optical film patterning process of the second embodiment> 中 In the second optical film patterning process S126 of FIG. 14, after the second optical film forming process S124 and before the protective film forming process S125, the second optical film 82 is left. A part 83 removes the remaining part of the second optical film 82.

For example, in the second optical film patterning process S126, as shown in FIG. 20, only a part 83 of the second optical film 82 is insoluble in the cleaning solution, and thereafter, it is dissolved in the cleaning solution as shown in FIG. The remaining portion of the second optical film 82.

FIG. 20 is a side view showing a second optical film in which a part of the second embodiment is insoluble. FIG. 21 is a side view showing a second optical film from which a portion that has not been dissolved is removed in the second embodiment.

As shown in FIG. 20, in the second optical film patterning process S126, only a part 83 of the second optical film 82 is made insoluble in the cleaning solution. As the cleaning liquid, the same solvent as the second optical film coating liquid 81 can be used, and for example, water can be used. At this time, insolubilization with respect to water is performed.

The fixing liquid 120 which does not dissolve a part 83 of the second optical film 82 is discharged from, for example, an inkjet coating nozzle 121. The application nozzle 121 includes a plurality of discharge nozzles that discharge a plurality of droplets of the fixing liquid 120 on the lower surface.

By moving the coating nozzle 121 and the substrate 10 relatively, and simultaneously ejecting the droplets of the fixing liquid 120 from the coating nozzle 121, the coating liquid 120 is selectively applied to a part 83 of the second optical film 82. Thereby, a part 83 of the second optical film 82 is not dissolved.

The area where the fixing liquid 120 is applied is, for example, a pixel area.

As shown in FIG. 21, in the second optical film patterning process S126, only a part 83 of the second optical film 82 is left and the remaining part of the second optical film 82 is removed. The remaining portion of the second optical film 82 is removed using, for example, a cleaning solution.

For example, while the substrate 10 is rotated by a turntable, the cleaning liquid is supplied to the substrate 10. The cleaning liquid supplied to the substrate 10 is diffused throughout the substrate 10 by centrifugal force, and is thrown away from the outer peripheral edge of the substrate 10.

Since a part 83 of the second optical film 82 is insoluble in the cleaning solution, it does not collapse due to the cleaning solution. On the other hand, the remaining portion of the second optical film 82 is not insolubilized with the cleaning solution, and is removed by being dissolved by the cleaning solution.

In addition, the cleaning solution is stored in a cleaning tank, and the substrate 10 is immersed in the cleaning solution of the cleaning tank to leave a part 83 of the second optical film 82 and dissolve the remaining portion of the second optical film 82. Removal is also possible. The cleaning liquid in the cleaning tank may be stirred by a stirring blade or the like.

As shown in FIG. 21, in this embodiment, before the protective film 92 (see FIG. 23) is formed, a part 83 of the second optical film 82 is left and the remaining portion of the second optical film 82 is removed, and the second optical film 82 is Patterned.

In the above-mentioned second optical film formation process S124, it is difficult to apply the second optical film coating liquid 81 only to the pixel area because the second optical film coating liquid 81 is applied while applying a shear stress. Therefore, it is effective to perform the second optical film patterning process S126.

Hereinafter, a part 83 of the second optical film 82 remaining in the second optical film patterning process S126 is also referred to as a "second optical film 83".

<Protective film formation process of the second embodiment> In the protective film formation process S125 of FIG. 14, as shown in FIGS. 22 to 23, a protective film different from the second optical film coating solution 81 is applied for coating. The cloth liquid 91 is applied on the second optical film 83 and dried to form a protective film 92.

22 is a side view showing a liquid film of a coating liquid for a protective film applied on a second optical film according to a second embodiment. 23 is a side view showing a protective film formed by drying a liquid film of a coating liquid for a protective film according to a second embodiment.

As shown in FIG. 22, in the protective film formation process S125, the coating liquid 91 for a protective film is applied from the coating nozzle 90 to the substrate 10 on which the second optical film 83 is formed. The coating nozzle 90 may be an inkjet system, and may include a plurality of discharge nozzles for discharging droplets of the coating liquid 91 for a protective film on the lower surface.

By moving the coating nozzle 90 relative to the substrate 10 and simultaneously ejecting the droplets of the coating liquid 91 for the protective film from the coating nozzle 90, only the second optical film 83 and its vicinity (for example, only in the pixel area and its vicinity) (Nearby) The coating liquid 91 for coating a protective film is selected.

The coating liquid 91 for a protective film is coated on the second optical film 83. Therefore, the liquid crystal molecules forming the second optical film 83 need only be insoluble with respect to the solvent of the protective film coating liquid 91. The second optical film 83 can be prevented from being dissolved by applying the protective film coating liquid 91.

The coating liquid 91 for a protective film includes an organic material forming the protective film 92 and a solvent that dissolves the organic material.

As the coating liquid 91 for a protective film, for example, a thermosetting transparent coating material, a chemically reactive transparent coating material, a dry curing transparent coating material, and the like are used. Specifically, oil-based enamel paint, phthalic acid resin paint, and the like are used.

The thermosetting transparent coating, the chemically reactive transparent coating, and the dry hardening transparent coating are polymerized by heat curing, chemical reaction, or dry curing, and can form a dense protective film 92.

As shown in FIG. 22, the coating liquid 91 for a protective film may be applied not only to the main surface of the second optical film 83 but also to cover the end surface of the second optical film 83. Not only the main surface of the second optical film 83, but also the second optical film 83 can be protected by the protective film 92 so that no damage, foreign matter, or the like is adhered to the end surface of the second optical film 83.

In addition, although the coating liquid 91 for protective films does not cover the end surface of the intermediate film 72 in FIG. 22, it may be applied so as to cover the end surface of the intermediate film 72.

The area where the coating solution 91 for a protective film is applied may be limited to the pixel area on the substrate 10 and its vicinity.

Moreover, since the area | region in which the coating liquid 91 for protective films is apply | coated is limited, the mask, such as a film, may be attached to the board | substrate 10. When the mask is peeled off later, a gap may be formed between the mask and the second optical film 83 so as not to damage the second optical film 83.

As shown in FIG. 23, in the protective film formation process S125, the liquid film (see FIG. 22) of the protective film coating liquid 91 applied on the substrate 10 is dried to form a protective film 92. The solvent is removed from the liquid film of the coating liquid 91 for a protective film, and the protective film 92 is formed.

Unlike the second optical film 83, the protective film 92 has isotropic optical characteristics. The visible light transmittance of the protective film 92 is preferably 95% or more. The thickness of the protective film 92 is preferably 10 μm or less. In order to suppress deformation of the optical member, the smaller the residual stress of the protective film 92 is, the better.

The protective film 92 covers not only the main surface of the second optical film 83 but also the end surface of the second optical film 83. The protective film 92 plays a role of protecting the second optical film 83 so that no damage, foreign matter, or the like adheres to the second optical film 83. The pencil hardness of the protective film 92 is preferably 2H or more.

The protective film 92 is formed only in the pixel area on the substrate 10 and its vicinity, and is formed on the substrate 10 at a plurality of intervals. In addition, when it is not necessary to take out the terminals provided in the periphery of the pixel region, the protective film 92 may be formed on almost the entire substrate 10.

In addition, although the protective film 92 of this embodiment is formed by coating and drying the coating liquid 91 for a protective film on the second optical film 83, it may be attached to the second optical film 83 as a thin film.

According to this embodiment, as shown in FIG. 23, the optical member 50 including the first optical film 63, the intermediate film 72, the second optical film 83, and the protective film 92 is formed on the substrate 10 in a plural number at intervals. Therefore, multiple elements of the optical member 50 are possible. In addition, since the optical member 50 is selectively formed in the pixel region and its vicinity, the terminals provided around the pixel region can function appropriately.

<Finishing of Optical Member Formation Process of Second Embodiment> As described above, according to this embodiment, the first optical film formation process S121, the intermediate film formation process S122, and the second optical film formation process S124 are sequentially performed. An intermediate film 72 is formed between the first optical film 63 and the second optical film 83. The intermediate film 72 can protect the first optical film 63 so that no damage or foreign matter adheres to the first optical film 63. Therefore, the quality of the optical member 50 can be improved. When the production of the optical member 50 is temporarily interrupted on the way and it takes time to start again, it is particularly effective because the risk of damage or foreign matter adhesion increases.

According to this embodiment, after the first optical film formation process S121 and before the intermediate film formation process S122, the first optical film patterning process S123 is performed in which a part 63 of the first optical film 62 is removed and the remaining part of the first optical film 62 is removed . Therefore, not only the main surface of the first optical film 63 remaining after the first optical film patterning process S123, but also the end surface of the first optical film 63 can be covered with the intermediate film 72.

According to this embodiment, in the first optical film patterning process S123, only a part 63 of the first optical film 62 is made insoluble in the cleaning solution in which the first optical film 62 is dissolved, and thereafter, it is dissolved in the cleaning solution. The remaining portion of the first optical film 62. Since a part 63 of the first optical film 62 is insoluble in the cleaning solution, it does not collapse due to the cleaning solution. On the other hand, the remaining portion of the first optical film 62 is not insolubilized with the cleaning solution, and is removed by being dissolved by the cleaning solution.

According to this embodiment, in the intermediate film formation process S122, the intermediate film 72 is formed so as to cover the main surface of the first optical film 63 and the end surface of the first optical film 63. The intermediate film 72 is not only the main surface of the first optical film 63, but can protect the first optical film 63 so that no damage, foreign matter, or the like adheres to the end surface of the first optical film 63. Therefore, the quality of the optical member 50 can be improved. When the production of the optical member 50 is temporarily interrupted on the way and it takes time to start again, it is particularly effective because the risk of damage or foreign matter adhesion increases.

According to this embodiment, the protective film formation process S125 for forming the protective film 92 which protects the 2nd optical film 83 is performed. The protective film 92 can protect the second optical film 83 after the manufacture of the optical member 50 so that the second optical film 83 is not damaged or foreign matter adheres. Therefore, the quality of the optical member 50 can be improved.

According to this embodiment, after the second optical film formation process S124 and before the protective film formation process S125, a second optical film patterning process S126 is performed in which a portion 83 of the second optical film 82 is left and a remaining portion of the second optical film 82 is removed. . Therefore, not only the main surface of the second optical film 83 remaining after the second optical film patterning process S126 can also cover the end surface of the second optical film 83 with the protective film 92.

According to this embodiment, in the second optical film patterning process S126, only a part 83 of the second optical film 82 is made insoluble in the cleaning solution in which the second optical film 82 is dissolved, and thereafter, it is dissolved in the cleaning solution. The remaining portion of the second optical film 82. Since a part 83 of the second optical film 82 is insoluble in the cleaning solution, it does not collapse due to the cleaning solution. On the other hand, the remaining portion of the second optical film 82 is not insolubilized with the cleaning solution, and is removed by being dissolved by the cleaning solution.

According to this embodiment, in the protective film formation process S125, the protective film 92 is formed so as to cover the main surface of the second optical film 83 and the end surface of the second optical film 83. The protective film 92 is not only the main surface of the second optical film 83, but can protect the second optical film 83 so that no damage, foreign matter, or the like is adhered to the end surface of the second optical film 83. Therefore, the quality of the optical member 50 can be improved. When the production of the optical member 50 is temporarily interrupted on the way and it takes time to start again, it is particularly effective because the risk of damage or foreign matter adhesion increases.

<Deformation and Improvement> Although the embodiments of the method for manufacturing an optical member have been described above, the present invention is not limited to the above-mentioned embodiments and the like, and various modifications and changes can be made within the scope of the gist of the present invention described in the scope of patent application. Improvement.

10‧‧‧ substrate

50‧‧‧ Optical components

61‧‧‧The first coating liquid for optical film

62‧‧‧The first optical film

63‧‧‧The first optical film

71‧‧‧coating solution for intermediate film

72‧‧‧ Interlayer

81‧‧‧The second coating liquid for optical film

82‧‧‧The second optical film

83‧‧‧The second optical film

91‧‧‧ Coating liquid for protective film

92‧‧‧ protective film

[FIG. 1] A flowchart showing a method for manufacturing an optical member according to the first embodiment. [FIG. 2] A side view showing a liquid film of a first coating liquid for an optical film applied on a substrate according to the first embodiment. [FIG. 3] A side view showing a first optical film formed by drying a liquid film of a coating liquid for a first optical film according to the first embodiment. [FIG. 4] A side view showing the first optical film in which a part of the first embodiment is insoluble. [FIG. 5] A side view showing a liquid film of a coating liquid for an intermediate film applied on a first optical film according to the first embodiment. [FIG. 6] A side view showing the intermediate film formed by drying the liquid film of the coating liquid for an intermediate film according to the first embodiment. [FIG. 7] A side view showing the first optical film in which the portion not covered by the interlayer film of the first embodiment is removed. [FIG. 8] A side view showing a liquid film of a second coating liquid for an optical film applied to an intermediate film according to the first embodiment. [FIG. 9] A side view showing a second optical film formed by drying a liquid film of a coating liquid for a second optical film according to the first embodiment. [FIG. 10] A side view showing a second optical film in which a part of the first embodiment is insoluble. [FIG. 11] A side view showing a liquid film of a coating liquid for an intermediate film applied on a second optical film according to the first embodiment. [FIG. 12] A side view showing a protective film formed by drying a liquid film of a coating liquid for a protective film according to the first embodiment. [Fig. 13] A side view showing a second optical film from which a portion not covered by a protective film of the first embodiment is removed. [FIG. 14] A flowchart showing a method for manufacturing an optical member according to the second embodiment. [Fig. 15] Fig. 15 is a side view showing a first optical film from which a portion that has not been dissolved is removed in a second embodiment. [FIG. 16] A side view showing a liquid film of a coating liquid for an intermediate film applied on a first optical film according to a second embodiment. [FIG. 17] A side view of an intermediate film formed by drying a liquid film of a coating liquid for an intermediate film according to a second embodiment. [FIG. 18] A side view showing a liquid film of a second coating liquid for an optical film applied to an intermediate film according to a second embodiment. [FIG. 19] A side view of a second optical film formed by drying a liquid film of a coating liquid for a second optical film according to a second embodiment. [FIG. 20] A side view showing a second optical film in which a part of the second embodiment is insoluble. [FIG. 21] A side view showing a second optical film in which a portion that has not been dissolved is removed in the second embodiment. [FIG. 22] A side view showing a liquid film of a coating liquid for a protective film applied on a second optical film according to a second embodiment. [FIG. 23] A side view showing a protective film formed by drying a liquid film of a coating liquid for a protective film according to a second embodiment.

Claims (16)

Provided is a method for manufacturing an optical member, the optical member having a first optical film and a second optical film formed on a substrate, one of the first optical film and the second optical film being a retardation film, and the remaining One is a polarizing film, and the method for producing the optical member includes: forming a first optical film by applying a coating liquid for a first optical film containing liquid crystal molecules and a solvent on the substrate and drying the coating liquid; 1st optical film formation process; (1) After the 1st optical film formation process, applying an intermediate film coating liquid different from the 1st optical film coating liquid to the 1st optical film and drying, An intermediate film forming process for forming an intermediate film; 之后 after the foregoing intermediate film forming process, a second optical film coating liquid containing liquid crystal molecules and a solvent is coated on the intermediate film and dried to form the second second film; The second optical film formation process of the optical film. The method for manufacturing an optical member according to claim 1, comprising using the intermediate film covering only a part of the first optical film as a mask after the intermediate film forming process and before the second optical film forming process. A first optical film patterning process in which the remaining portion of the first optical film is removed. The method for manufacturing an optical member according to claim 2, wherein in the first optical film patterning process, a cleaning solution that dissolves the first optical film is used. The method for manufacturing an optical member according to claim 3, wherein in the first optical film formation process, only the part of the first optical film is made with respect to the washing process used in the first optical film patterning process. The solution does not dissolve. The method for manufacturing an optical member according to claim 3 or 4, wherein in the intermediate film formation process, the intermediate film is coated with the coating solution for the intermediate film only on the part of the first optical film, so that only the foregoing The part of the first optical film is insoluble in the cleaning solution used in the first optical film patterning process. The method for manufacturing an optical member according to claim 1, further comprising: after the first optical film formation process, before the intermediate film formation process, leaving a part of the first optical film and removing a residual portion of the former first optical film The first optical film patterning process. The method for manufacturing an optical member according to claim 6, wherein in the first optical film patterning process, only the part of the first optical film is insoluble in a cleaning solution in which the first optical film is dissolved. Then, the remaining portion of the first optical film is dissolved with the cleaning solution. The method for manufacturing an optical member according to claim 6 or 7, wherein in the intermediate film formation process, the intermediate film is formed so as to cover a main surface of the first optical film and an end surface of the first optical film. The method for manufacturing an optical member according to any one of claims 1 to 4, further comprising: after the second optical film forming process, applying a protective film different from the second optical film coating liquid, A liquid coating process is formed on the second optical film and dried to form a protective film for protecting the second optical film. The method for manufacturing an optical member according to claim 9, further comprising: after the protective film formation process, using the protective film that covers only a part of the second optical film as a mask to remove the residue of the second optical film The second optical film patterning process. The method for manufacturing an optical member according to claim 10, wherein a cleaning solution that dissolves the second optical film is used in the second optical film patterning process. The method for manufacturing an optical member according to claim 11, wherein, in the second optical film formation process, only the part of the second optical film is made with respect to the washing process used in the second optical film patterning process. The solution does not dissolve. The method for manufacturing an optical member according to claim 11 or 12, wherein in the protective film formation process, the protective film coating liquid is applied only to the part of the second optical film, so that only the aforementioned protective film is applied. The part of the second optical film is insoluble in the cleaning solution used in the second optical film patterning process. The method for manufacturing an optical member according to claim 9, further comprising: after the second optical film forming process, before the protective film forming process, leaving a part of the second optical film and removing a residual portion of the former second optical film The second optical film patterning process. The method for manufacturing an optical member according to claim 14, wherein in the second optical film patterning process, only the part of the second optical film is made insoluble in a cleaning solution in which the second optical film is dissolved. Then, the residual portion of the second optical film is dissolved with the cleaning solution. The method for manufacturing an optical member according to claim 14 or 15, wherein in the protective film formation process, the protective film is formed so as to cover a main surface of the second optical film and an end surface of the second optical film.