TW201837042A - Composition for solid-state imaging element, infrared shielding film, and solid-state imaging element having both good visible light transmittance and infrared shielding properties - Google Patents
Composition for solid-state imaging element, infrared shielding film, and solid-state imaging element having both good visible light transmittance and infrared shielding properties Download PDFInfo
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- TW201837042A TW201837042A TW107109232A TW107109232A TW201837042A TW 201837042 A TW201837042 A TW 201837042A TW 107109232 A TW107109232 A TW 107109232A TW 107109232 A TW107109232 A TW 107109232A TW 201837042 A TW201837042 A TW 201837042A
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- infrared shielding
- solid
- state imaging
- composition
- imaging device
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- 238000002834 transmittance Methods 0.000 title claims abstract description 79
- 239000000203 mixture Substances 0.000 title claims abstract description 65
- 238000003384 imaging method Methods 0.000 title claims abstract description 63
- -1 phthalocyanine compound Chemical class 0.000 claims abstract description 113
- 229910052751 metal Inorganic materials 0.000 claims abstract description 30
- 239000002184 metal Substances 0.000 claims abstract description 30
- 125000004429 atom Chemical group 0.000 claims abstract description 23
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 17
- 125000003118 aryl group Chemical group 0.000 claims abstract description 15
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 7
- 125000005843 halogen group Chemical group 0.000 claims abstract description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 48
- 239000000975 dye Substances 0.000 claims description 28
- 229910001930 tungsten oxide Inorganic materials 0.000 claims description 16
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical group O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims description 14
- 229910044991 metal oxide Inorganic materials 0.000 claims description 13
- 150000004706 metal oxides Chemical group 0.000 claims description 13
- 239000007787 solid Substances 0.000 claims description 10
- 239000005749 Copper compound Substances 0.000 claims description 9
- 150000001880 copper compounds Chemical class 0.000 claims description 9
- 230000035515 penetration Effects 0.000 claims description 8
- 229910052738 indium Inorganic materials 0.000 claims description 5
- 229910052718 tin Inorganic materials 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 229910052748 manganese Inorganic materials 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910052763 palladium Inorganic materials 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 abstract description 26
- 150000001875 compounds Chemical class 0.000 description 71
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 44
- 239000002270 dispersing agent Substances 0.000 description 26
- 238000000034 method Methods 0.000 description 23
- 238000010521 absorption reaction Methods 0.000 description 13
- 238000000576 coating method Methods 0.000 description 12
- 239000002904 solvent Substances 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- 238000011156 evaluation Methods 0.000 description 10
- 239000003505 polymerization initiator Substances 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 9
- 238000011161 development Methods 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 230000035945 sensitivity Effects 0.000 description 8
- 239000004094 surface-active agent Substances 0.000 description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 7
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 229920001223 polyethylene glycol Polymers 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Natural products CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 5
- 239000002202 Polyethylene glycol Substances 0.000 description 5
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 5
- 239000003963 antioxidant agent Substances 0.000 description 5
- 230000003078 antioxidant effect Effects 0.000 description 5
- 235000006708 antioxidants Nutrition 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000000852 hydrogen donor Substances 0.000 description 5
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 5
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000012937 correction Methods 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 229920001451 polypropylene glycol Polymers 0.000 description 4
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 3
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 3
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 239000001384 succinic acid Substances 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical group NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical group C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- FFOPEPMHKILNIT-UHFFFAOYSA-N Isopropyl butyrate Chemical compound CCCC(=O)OC(C)C FFOPEPMHKILNIT-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 229920002873 Polyethylenimine Polymers 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000002318 adhesion promoter Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 description 2
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 239000003006 anti-agglomeration agent Substances 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- ODWXUNBKCRECNW-UHFFFAOYSA-M bromocopper(1+) Chemical compound Br[Cu+] ODWXUNBKCRECNW-UHFFFAOYSA-M 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 239000002612 dispersion medium Substances 0.000 description 2
- 238000002296 dynamic light scattering Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 2
- KLRHPHDUDFIRKB-UHFFFAOYSA-M indium(i) bromide Chemical compound [Br-].[In+] KLRHPHDUDFIRKB-UHFFFAOYSA-M 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 150000002513 isocyanates Chemical class 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical group NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 239000012860 organic pigment Substances 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920000193 polymethacrylate Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 2
- 230000004304 visual acuity Effects 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- RYNQKSJRFHJZTK-UHFFFAOYSA-N (3-methoxy-3-methylbutyl) acetate Chemical compound COC(C)(C)CCOC(C)=O RYNQKSJRFHJZTK-UHFFFAOYSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- RONYJXRSTBQEDW-NTCAYCPXSA-N (e)-3-[4-(diethylamino)phenyl]-1-phenylprop-2-en-1-one Chemical compound C1=CC(N(CC)CC)=CC=C1\C=C\C(=O)C1=CC=CC=C1 RONYJXRSTBQEDW-NTCAYCPXSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- SKYXLDSRLNRAPS-UHFFFAOYSA-N 1,2,4-trifluoro-5-methoxybenzene Chemical compound COC1=CC(F)=C(F)C=C1F SKYXLDSRLNRAPS-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- SGUVLZREKBPKCE-UHFFFAOYSA-N 1,5-diazabicyclo[4.3.0]-non-5-ene Chemical compound C1CCN=C2CCCN21 SGUVLZREKBPKCE-UHFFFAOYSA-N 0.000 description 1
- ALVZNPYWJMLXKV-UHFFFAOYSA-N 1,9-Nonanediol Chemical compound OCCCCCCCCCO ALVZNPYWJMLXKV-UHFFFAOYSA-N 0.000 description 1
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 1
- RWEAGLZFYKQPLZ-UHFFFAOYSA-N 1-[4,5-diphenyl-2-(2,4,6-trichlorophenyl)imidazol-2-yl]-4,5-diphenyl-2-(2,4,6-trichlorophenyl)imidazole Chemical compound ClC1=CC(Cl)=CC(Cl)=C1C(N1C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC(Cl)=CC=2Cl)Cl)=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 RWEAGLZFYKQPLZ-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- SMLNDVNTPWRZJH-UHFFFAOYSA-N 1-chloro-4-(trimethoxymethyl)dodecane Chemical compound ClCCCC(C(OC)(OC)OC)CCCCCCCC SMLNDVNTPWRZJH-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 1
- BRKORVYTKKLNKX-UHFFFAOYSA-N 2,4-di(propan-2-yl)thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC(C(C)C)=C3SC2=C1 BRKORVYTKKLNKX-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- ZXJCJJQOVTZXOJ-UHFFFAOYSA-N 2,5-bis[[4-(diethylamino)phenyl]methylidene]cyclohexan-1-one Chemical compound C1=CC(N(CC)CC)=CC=C1C=C(CC1)CC(=O)C1=CC1=CC=C(N(CC)CC)C=C1 ZXJCJJQOVTZXOJ-UHFFFAOYSA-N 0.000 description 1
- 150000003923 2,5-pyrrolediones Chemical class 0.000 description 1
- DKCPKDPYUFEZCP-UHFFFAOYSA-N 2,6-di-tert-butylphenol Chemical compound CC(C)(C)C1=CC=CC(C(C)(C)C)=C1O DKCPKDPYUFEZCP-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- WMDZKDKPYCNCDZ-UHFFFAOYSA-N 2-(2-butoxypropoxy)propan-1-ol Chemical compound CCCCOC(C)COC(C)CO WMDZKDKPYCNCDZ-UHFFFAOYSA-N 0.000 description 1
- MHDULSOPQSUKBQ-UHFFFAOYSA-N 2-(2-chlorophenyl)-1-[2-(2-chlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC=C1C(N1C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Cl)=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 MHDULSOPQSUKBQ-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- DRLRGHZJOQGQEC-UHFFFAOYSA-N 2-(2-methoxypropoxy)propyl acetate Chemical compound COC(C)COC(C)COC(C)=O DRLRGHZJOQGQEC-UHFFFAOYSA-N 0.000 description 1
- DJCYDDALXPHSHR-UHFFFAOYSA-N 2-(2-propoxyethoxy)ethanol Chemical compound CCCOCCOCCO DJCYDDALXPHSHR-UHFFFAOYSA-N 0.000 description 1
- XYVAYAJYLWYJJN-UHFFFAOYSA-N 2-(2-propoxypropoxy)propan-1-ol Chemical compound CCCOC(C)COC(C)CO XYVAYAJYLWYJJN-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- LZZLULLPRYQJSZ-UHFFFAOYSA-N 2-(ethylamino)-1-phenylethanone Chemical compound CCNCC(=O)C1=CC=CC=C1 LZZLULLPRYQJSZ-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ZADXFVHUPXKZBJ-UHFFFAOYSA-N 2-[(4-ethenylphenyl)methoxymethyl]oxirane Chemical compound C1=CC(C=C)=CC=C1COCC1OC1 ZADXFVHUPXKZBJ-UHFFFAOYSA-N 0.000 description 1
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 description 1
- FMVOPJLFZGSYOS-UHFFFAOYSA-N 2-[2-(2-ethoxypropoxy)propoxy]propan-1-ol Chemical compound CCOC(C)COC(C)COC(C)CO FMVOPJLFZGSYOS-UHFFFAOYSA-N 0.000 description 1
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
- MFAWEYJGIGIYFH-UHFFFAOYSA-N 2-[4-(trimethoxymethyl)dodecoxymethyl]oxirane Chemical compound C(C1CO1)OCCCC(C(OC)(OC)OC)CCCCCCCC MFAWEYJGIGIYFH-UHFFFAOYSA-N 0.000 description 1
- KJJPLEZQSCZCKE-UHFFFAOYSA-N 2-aminopropane-1,3-diol Chemical compound OCC(N)CO KJJPLEZQSCZCKE-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- FLFWJIBUZQARMD-UHFFFAOYSA-N 2-mercapto-1,3-benzoxazole Chemical compound C1=CC=C2OC(S)=NC2=C1 FLFWJIBUZQARMD-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- UPTHZKIDNHJFKQ-UHFFFAOYSA-N 2-methylprop-2-enoic acid;propane-1,2,3-triol Chemical compound CC(=C)C(O)=O.CC(=C)C(O)=O.OCC(O)CO UPTHZKIDNHJFKQ-UHFFFAOYSA-N 0.000 description 1
- MYISVPVWAQRUTL-UHFFFAOYSA-N 2-methylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3SC2=C1 MYISVPVWAQRUTL-UHFFFAOYSA-N 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- MQWCQFCZUNBTCM-UHFFFAOYSA-N 2-tert-butyl-6-(3-tert-butyl-2-hydroxy-5-methylphenyl)sulfanyl-4-methylphenol Chemical compound CC(C)(C)C1=CC(C)=CC(SC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O MQWCQFCZUNBTCM-UHFFFAOYSA-N 0.000 description 1
- OQOFAZAGMZIWPB-UHFFFAOYSA-N 3,6-bis(4-methoxybutyl)benzene-1,2-dicarbonitrile Chemical compound C(#N)C1=C(C(=CC=C1CCCCOC)CCCCOC)C#N OQOFAZAGMZIWPB-UHFFFAOYSA-N 0.000 description 1
- GOLORTLGFDVFDW-UHFFFAOYSA-N 3-(1h-benzimidazol-2-yl)-7-(diethylamino)chromen-2-one Chemical compound C1=CC=C2NC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 GOLORTLGFDVFDW-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- LDBOYMRNYCBDQK-UHFFFAOYSA-N 3-(ethenoxymethyl)-3-ethyloxetane Chemical compound C=COCC1(CC)COC1 LDBOYMRNYCBDQK-UHFFFAOYSA-N 0.000 description 1
- LBIHNTAFJVHBLJ-UHFFFAOYSA-N 3-(triethoxymethyl)undec-1-ene Chemical compound C(=C)C(C(OCC)(OCC)OCC)CCCCCCCC LBIHNTAFJVHBLJ-UHFFFAOYSA-N 0.000 description 1
- MPAGVACEWQNVQO-UHFFFAOYSA-N 3-acetyloxybutyl acetate Chemical compound CC(=O)OC(C)CCOC(C)=O MPAGVACEWQNVQO-UHFFFAOYSA-N 0.000 description 1
- KQIGMPWTAHJUMN-UHFFFAOYSA-N 3-aminopropane-1,2-diol Chemical compound NCC(O)CO KQIGMPWTAHJUMN-UHFFFAOYSA-N 0.000 description 1
- NTKBNCABAMQDIG-UHFFFAOYSA-N 3-butoxypropan-1-ol Chemical compound CCCCOCCCO NTKBNCABAMQDIG-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- HZHPOJPIGFWDTD-UHFFFAOYSA-N 3-prop-2-enoyloxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCOC(=O)C=C HZHPOJPIGFWDTD-UHFFFAOYSA-N 0.000 description 1
- SXPGQGNWEWPWQZ-UHFFFAOYSA-N 4-(triethoxymethyl)dodecan-1-amine Chemical compound NCCCC(C(OCC)(OCC)OCC)CCCCCCCC SXPGQGNWEWPWQZ-UHFFFAOYSA-N 0.000 description 1
- DFYGYTNMHPUJBY-UHFFFAOYSA-N 4-(trimethoxymethyl)dodecane-1-thiol Chemical compound SCCCC(C(OC)(OC)OC)CCCCCCCC DFYGYTNMHPUJBY-UHFFFAOYSA-N 0.000 description 1
- ARZSRJNMSIMAKS-UHFFFAOYSA-N 4-aminobutane-1,2-diol Chemical compound NCCC(O)CO ARZSRJNMSIMAKS-UHFFFAOYSA-N 0.000 description 1
- IRQWEODKXLDORP-UHFFFAOYSA-N 4-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=C(C=C)C=C1 IRQWEODKXLDORP-UHFFFAOYSA-N 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 1
- JAGRUUPXPPLSRX-UHFFFAOYSA-N 4-prop-1-en-2-ylphenol Chemical compound CC(=C)C1=CC=C(O)C=C1 JAGRUUPXPPLSRX-UHFFFAOYSA-N 0.000 description 1
- IKVYHNPVKUNCJM-UHFFFAOYSA-N 4-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C(C(C)C)=CC=C2 IKVYHNPVKUNCJM-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- LQGKDMHENBFVRC-UHFFFAOYSA-N 5-aminopentan-1-ol Chemical compound NCCCCCO LQGKDMHENBFVRC-UHFFFAOYSA-N 0.000 description 1
- IEAJQNJSHYCMEK-UHFFFAOYSA-N 5-methoxy-2,5-dimethylhexanoic acid Chemical compound COC(C)(C)CCC(C)C(O)=O IEAJQNJSHYCMEK-UHFFFAOYSA-N 0.000 description 1
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 1
- ZMFWEWMHABZQNB-UHFFFAOYSA-N 6-acetyloxyhexyl acetate Chemical compound CC(=O)OCCCCCCOC(C)=O ZMFWEWMHABZQNB-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Natural products CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 1
- JZHKIUBMQMDQRG-UHFFFAOYSA-N C(=C)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(=C)C(C(OC)(OC)OC)CCCCCCCC JZHKIUBMQMDQRG-UHFFFAOYSA-N 0.000 description 1
- UCMUEHUSODZYBG-UHFFFAOYSA-N C(=C)C(C(OCCOC)(OCCOC)OCCOC)CCCCCCCC Chemical compound C(=C)C(C(OCCOC)(OCCOC)OCCOC)CCCCCCCC UCMUEHUSODZYBG-UHFFFAOYSA-N 0.000 description 1
- GKLXZYMUWOOVDQ-UHFFFAOYSA-N C(C1CO1)OCCCC(C(OC)(OC)C)CCCCCCCC Chemical compound C(C1CO1)OCCCC(C(OC)(OC)C)CCCCCCCC GKLXZYMUWOOVDQ-UHFFFAOYSA-N 0.000 description 1
- VPLKXGORNUYFBO-UHFFFAOYSA-N C1(CC2C(CC1)O2)CCC(C(OC)(OC)OC)CCCCCCCC Chemical compound C1(CC2C(CC1)O2)CCC(C(OC)(OC)OC)CCCCCCCC VPLKXGORNUYFBO-UHFFFAOYSA-N 0.000 description 1
- FTEPFMLHRLLDAZ-UHFFFAOYSA-N CC(CCCCCCCCC)(OC)OC.ClCCC Chemical compound CC(CCCCCCCCC)(OC)OC.ClCCC FTEPFMLHRLLDAZ-UHFFFAOYSA-N 0.000 description 1
- QHJSCTNRFWNYID-UHFFFAOYSA-N CCC=COCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound CCC=COCCCC(C(OC)(OC)OC)CCCCCCCC QHJSCTNRFWNYID-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical class CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 206010073306 Exposure to radiation Diseases 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 229910021617 Indium monochloride Inorganic materials 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 1
- 229910020068 MgAl Inorganic materials 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 1
- PEXBBTCNDBSFHT-UHFFFAOYSA-N NCCNCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound NCCNCCCC(C(OC)(OC)OC)CCCCCCCC PEXBBTCNDBSFHT-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- GJEMNPKMRVBNHS-UHFFFAOYSA-N OCC(CO)(CO)CO.[Li] Chemical compound OCC(CO)(CO)CO.[Li] GJEMNPKMRVBNHS-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- WYWZRNAHINYAEF-UHFFFAOYSA-N Padimate O Chemical compound CCCCC(CC)COC(=O)C1=CC=C(N(C)C)C=C1 WYWZRNAHINYAEF-UHFFFAOYSA-N 0.000 description 1
- DIQMPQMYFZXDAX-UHFFFAOYSA-N Pentyl formate Chemical compound CCCCCOC=O DIQMPQMYFZXDAX-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- WUGQZFFCHPXWKQ-UHFFFAOYSA-N Propanolamine Chemical compound NCCCO WUGQZFFCHPXWKQ-UHFFFAOYSA-N 0.000 description 1
- 229910003691 SiBr Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- BGYHLZZASRKEJE-UHFFFAOYSA-N [3-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]-2,2-bis[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxymethyl]propyl] 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCC(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 BGYHLZZASRKEJE-UHFFFAOYSA-N 0.000 description 1
- LNWBFIVSTXCJJG-UHFFFAOYSA-N [diisocyanato(phenyl)methyl]benzene Chemical compound C=1C=CC=CC=1C(N=C=O)(N=C=O)C1=CC=CC=C1 LNWBFIVSTXCJJG-UHFFFAOYSA-N 0.000 description 1
- 230000032900 absorption of visible light Effects 0.000 description 1
- 229960000583 acetic acid Drugs 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000004849 alkoxymethyl group Chemical group 0.000 description 1
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- 125000005233 alkylalcohol group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000003868 ammonium compounds Chemical class 0.000 description 1
- 125000005577 anthracene group Chemical group 0.000 description 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- RJGDLRCDCYRQOQ-UHFFFAOYSA-N anthrone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3CC2=C1 RJGDLRCDCYRQOQ-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- VYHBFRJRBHMIQZ-UHFFFAOYSA-N bis[4-(diethylamino)phenyl]methanone Chemical compound C1=CC(N(CC)CC)=CC=C1C(=O)C1=CC=C(N(CC)CC)C=C1 VYHBFRJRBHMIQZ-UHFFFAOYSA-N 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- OCWYEMOEOGEQAN-UHFFFAOYSA-N bumetrizole Chemical compound CC(C)(C)C1=CC(C)=CC(N2N=C3C=C(Cl)C=CC3=N2)=C1O OCWYEMOEOGEQAN-UHFFFAOYSA-N 0.000 description 1
- PCDHSSHKDZYLLI-UHFFFAOYSA-N butan-1-one Chemical compound CCC[C]=O PCDHSSHKDZYLLI-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- BTMVHUNTONAYDX-UHFFFAOYSA-N butyl propionate Chemical compound CCCCOC(=O)CC BTMVHUNTONAYDX-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 150000004699 copper complex Chemical class 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 229910000071 diazene Inorganic materials 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- UYAAVKFHBMJOJZ-UHFFFAOYSA-N diimidazo[1,3-b:1',3'-e]pyrazine-5,10-dione Chemical compound O=C1C2=CN=CN2C(=O)C2=CN=CN12 UYAAVKFHBMJOJZ-UHFFFAOYSA-N 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- CKSRFHWWBKRUKA-UHFFFAOYSA-N ethyl 2-ethoxyacetate Chemical compound CCOCC(=O)OCC CKSRFHWWBKRUKA-UHFFFAOYSA-N 0.000 description 1
- FJAKCEHATXBFJT-UHFFFAOYSA-N ethyl 2-oxobutanoate Chemical compound CCOC(=O)C(=O)CC FJAKCEHATXBFJT-UHFFFAOYSA-N 0.000 description 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 239000012847 fine chemical Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- VANNPISTIUFMLH-UHFFFAOYSA-N glutaric anhydride Chemical compound O=C1CCCC(=O)O1 VANNPISTIUFMLH-UHFFFAOYSA-N 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- VPVSTMAPERLKKM-UHFFFAOYSA-N glycoluril Chemical compound N1C(=O)NC2NC(=O)NC21 VPVSTMAPERLKKM-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- APHGZSBLRQFRCA-UHFFFAOYSA-M indium(1+);chloride Chemical compound [In]Cl APHGZSBLRQFRCA-UHFFFAOYSA-M 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- 229940117955 isoamyl acetate Drugs 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-M isovalerate Chemical compound CC(C)CC([O-])=O GWYFCOCPABKNJV-UHFFFAOYSA-M 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- 125000003566 oxetanyl group Chemical group 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 125000000466 oxiranyl group Chemical group 0.000 description 1
- VNRRSGPRRULRLF-UHFFFAOYSA-N oxotungsten;ruthenium Chemical compound [Ru].[W]=O VNRRSGPRRULRLF-UHFFFAOYSA-N 0.000 description 1
- QBDSZLJBMIMQRS-UHFFFAOYSA-N p-Cumylphenol Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=CC=C1 QBDSZLJBMIMQRS-UHFFFAOYSA-N 0.000 description 1
- NKTOLZVEWDHZMU-UHFFFAOYSA-N p-cumyl phenol Natural products CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- VQSLYBNAHOGNCE-UHFFFAOYSA-N pentan-3-yl propanoate Chemical compound CCC(CC)OC(=O)CC VQSLYBNAHOGNCE-UHFFFAOYSA-N 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 235000013824 polyphenols Nutrition 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
- HUAZGNHGCJGYNP-UHFFFAOYSA-N propyl butyrate Chemical compound CCCOC(=O)CCC HUAZGNHGCJGYNP-UHFFFAOYSA-N 0.000 description 1
- 229940116423 propylene glycol diacetate Drugs 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- 150000003658 tungsten compounds Chemical class 0.000 description 1
- JABYJIQOLGWMQW-UHFFFAOYSA-N undec-4-ene Chemical compound CCCCCCC=CCCC JABYJIQOLGWMQW-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 125000005287 vanadyl group Chemical group 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- UIYCHXAGWOYNNA-UHFFFAOYSA-N vinyl sulfide Chemical group C=CSC=C UIYCHXAGWOYNNA-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B47/00—Porphines; Azaporphines
- C09B47/04—Phthalocyanines abbreviation: Pc
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B47/00—Porphines; Azaporphines
- C09B47/04—Phthalocyanines abbreviation: Pc
- C09B47/08—Preparation from other phthalocyanine compounds, e.g. cobaltphthalocyanineamine complex
- C09B47/085—Preparation from other phthalocyanine compounds, e.g. cobaltphthalocyanineamine complex substituting the central metal atom
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1462—Coatings
- H01L27/14623—Optical shielding
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optical Filters (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Solid State Image Pick-Up Elements (AREA)
Abstract
Description
本發明是有關於一種固體攝像元件用組成物、紅外線遮蔽膜及固體攝像元件。The present invention relates to a composition for a solid-state imaging device, an infrared shielding film, and a solid-state imaging device.
於攝像機、數位相機、帶相機功能的行動電話等中搭載有電荷耦合元件(Charge-Coupled Device,CCD)影像感測器或互補金屬氧化物半導體(Complementary metal oxide semiconductor,CMOS)影像感測器等固體攝像元件。該些固體攝像元件中具備的光電二極體的感度跨越可見光區域至紅外線區域。因此,於固體攝像元件中,設置有用以遮斷紅外線的濾光片。藉由所述紅外線遮斷濾光片,可以接近人類的視敏度的方式修正固體攝像元件的感度。A Charge-Coupled Device (CCD) image sensor or a Complementary Metal Oxide Semiconductor (CMOS) image sensor is mounted on a camera, a digital camera, a mobile phone with a camera function, and the like. Solid-state imaging element. The sensitivity of the photodiode provided in the solid-state imaging device spans the visible light region to the infrared region. Therefore, in the solid-state imaging element, a filter for blocking infrared rays is provided. By the infrared ray interrupting filter, the sensitivity of the solid-state imaging element can be corrected in such a manner that the human visual sensitivity is approached.
於所述紅外線遮斷濾光片中含有作為紅外線遮蔽劑的色素或顏料。對所述紅外線遮蔽劑要求使可見光充分穿透且吸收紅外線的特性。作為所述紅外線遮蔽劑之一、尤其是近紅外線的良好的遮蔽劑,研究了使用酞菁化合物(參照日本專利特開2008-201952號公報)。A dye or a pigment as an infrared shielding agent is contained in the infrared ray blocking filter. The infrared shielding agent is required to sufficiently penetrate visible light and absorb infrared rays. A phthalocyanine compound has been studied as one of the infrared shielding agents, particularly a good shielding agent for near-infrared rays (refer to Japanese Laid-Open Patent Publication No. 2008-201952).
但是,於使用了酞菁化合物的先前的紅外線遮斷濾光片中,並未充分滿足可見光穿透性與紅外線遮蔽性。因此,為了發揮良好的所述特性,例如有時亦混合使用多種紅外線遮蔽劑。所述多種紅外線遮蔽劑的使用亦成為引起成本高等、生產性下降的主要原因。另外,於使用了酞菁化合物的先前的紅外線遮斷濾光片中,有時於可見光區域中其穿透性的偏差大。於該情況下,亦未進行良好的視敏度修正。 [現有技術文獻] [專利文獻]However, in the conventional infrared ray blocking filter using a phthalocyanine compound, the visible light transmittance and the infrared ray shielding property are not sufficiently satisfied. Therefore, in order to exhibit good characteristics, for example, a plurality of infrared shielding agents may be used in combination. The use of the various infrared shielding agents also causes a high cost and a decrease in productivity. Further, in the conventional infrared ray interrupting filter using the phthalocyanine compound, the variation in the transmittance in the visible light region may be large. In this case, no good visual acuity correction was performed. [Prior Art Document] [Patent Literature]
[專利文獻1]日本專利特開2008-201952號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2008-201952
[發明所欲解決之課題] 但是,於使用了酞菁化合物的先前的固體攝像元件用紅外線遮斷濾光片中,並未充分滿足可見光穿透性與紅外線遮蔽性。因此,為了發揮良好的所述特性,例如有時亦混合使用多種紅外線遮蔽劑。所述多種紅外線遮蔽劑的使用亦成為引起成本高等、生產性下降的主要原因。另外,於使用了酞菁化合物的先前的紅外線遮斷濾光片中,有時於可見光區域中其穿透性的偏差大。於該情況下,亦未進行良好的視敏度修正。[Problems to be Solved by the Invention] However, in the infrared ray interrupting filter for a solid-state imaging device using a phthalocyanine compound, the visible light transmittance and the infrared ray shielding property are not sufficiently satisfied. Therefore, in order to exhibit good characteristics, for example, a plurality of infrared shielding agents may be used in combination. The use of the various infrared shielding agents also causes a high cost and a decrease in productivity. Further, in the conventional infrared ray interrupting filter using the phthalocyanine compound, the variation in the transmittance in the visible light region may be large. In this case, no good visual acuity correction was performed.
本發明是鑒於所述情況而成,其目的在於提供一種固體攝像元件用組成物、固體攝像元件用紅外線遮蔽膜、以及具有所述紅外線遮蔽膜的固體攝像元件,所述固體攝像元件用組成物即便於所含的有機色素的種類少的情況下,亦可形成兼具良好的可見光穿透性與紅外線遮蔽性的固體攝像元件用光學濾光片,所述固體攝像元件用紅外線遮蔽膜即便於所含的有機色素的種類少的情況下,亦兼具良好的可見光穿透性與紅外線遮蔽性。 [解決課題之手段]The present invention has been made in view of the above-described circumstances, and an object of the present invention is to provide a solid-state imaging device, a solid-state imaging device having the infrared shielding film, and a composition for the solid-state imaging device. In other words, when the type of the organic dye to be contained is small, an optical filter for a solid-state imaging device having excellent visible light transmittance and infrared shielding properties can be formed, and the infrared shielding film for the solid-state imaging device can be used even if When the type of the organic dye contained is small, it also has good visible light transmittance and infrared shielding properties. [Means for solving the problem]
為了解決所述課題而完成的發明是一種固體攝像元件用組成物,其含有由下述式(1)所表示的酞菁化合物(以下,亦稱為「[A]酞菁化合物」)。 [化1](式(1)中,多個R分別獨立地為烷基或芳基。多個X分別獨立地為氫原子、鹵素原子或烷基。多個X亦可相互鍵結並與該些所鍵結的碳鏈一起形成芳香環。M為兩個氫原子、二價金屬原子或者三價或四價的金屬原子的衍生物。多個n分別獨立地為3~6的整數)In order to solve the problem, the invention is a composition for a solid-state image sensor, which comprises a phthalocyanine compound represented by the following formula (1) (hereinafter also referred to as "[A] phthalocyanine compound"). [Chemical 1] (In the formula (1), a plurality of R are each independently an alkyl group or an aryl group. The plurality of X are each independently a hydrogen atom, a halogen atom or an alkyl group. A plurality of X may be bonded to each other and bonded thereto. The carbon chains of the knot together form an aromatic ring. M is a derivative of two hydrogen atoms, a divalent metal atom or a trivalent or tetravalent metal atom. The plurality of n are each independently an integer of 3 to 6)
為了解決所述課題而完成的另一發明為一種紅外線遮蔽膜(I),其是由該固體攝像元件用組成物所形成。Another invention completed to solve the above problems is an infrared shielding film (I) formed of the composition for a solid-state imaging device.
為了解決所述課題而完成的進而另一發明為一種固體攝像元件用紅外線遮蔽膜(II),其實質上含有僅一種或兩種有機色素,且滿足下述(A)~(C)。 (A)波長430 nm以上且580 nm以下的範圍內的穿透率的平均值為75%以上 (B)波長700 nm且900 nm以下的範圍內的穿透率的平均值為16.5%以下 (C)波長1200 nm下的穿透率為10%以下Still another invention completed in order to solve the above problem is an infrared shielding film (II) for a solid-state imaging device, which substantially contains only one or two kinds of organic dyes, and satisfies the following (A) to (C). (A) The average value of the transmittance in the range of 430 nm or more and 580 nm or less is 75% or more (B) The average value of the transmittance in the range of 700 nm and 900 nm or less is 16.5% or less ( C) The transmittance at a wavelength of 1200 nm is 10% or less
為了解決所述課題而完成的進而又一發明為一種固體攝像元件,其具有該紅外線遮蔽膜(I)或該紅外線遮蔽膜(II)。 [發明的效果]Still another invention completed to solve the above problems is a solid-state imaging element including the infrared ray shielding film (I) or the infrared ray shielding film (II). [Effects of the Invention]
根據本發明,可提供一種固體攝像元件用組成物、固體攝像元件用紅外線遮蔽膜、以及具有所述紅外線遮蔽膜的固體攝像元件,所述固體攝像元件用組成物即便於所含的有機色素的種類少的情況下,亦可形成兼具良好的可見光穿透性與紅外線遮蔽性的固體攝像元件用光學濾光片,所述固體攝像元件用紅外線遮蔽膜即便於所含的有機色素的種類少的情況下,亦兼具良好的可見光穿透性與紅外線遮蔽性。According to the present invention, there is provided a composition for a solid-state imaging device, an infrared shielding film for a solid-state imaging device, and a solid-state imaging device including the infrared shielding film, and the composition for the solid-state imaging device is even if it contains an organic dye When the type is small, an optical filter for a solid-state imaging device having excellent visible light transmittance and infrared shielding properties can be formed, and the infrared shielding film for a solid-state imaging device has a small amount of organic dye contained therein. In the case of both, it also has good visible light transmittance and infrared shielding properties.
以下,對本發明的一實施形態的固體攝像元件用組成物、紅外線遮蔽膜及固體攝像元件進行詳細說明。Hereinafter, the composition for a solid-state imaging device, the infrared shielding film, and the solid-state imaging device according to the embodiment of the present invention will be described in detail.
<固體攝像元件用組成物> 本發明的一實施形態的固體攝像元件用組成物(以下,亦簡稱為「組成物」)含有[A]酞菁化合物。該組成物較佳為進而含有[B]紅外線遮蔽劑,所述[B]紅外線遮蔽劑為金屬氧化物、銅化合物([A]酞菁化合物除外)或者該些的組合。<Composition for Solid-State Imaging Device> The composition for a solid-state imaging device according to the embodiment of the present invention (hereinafter also simply referred to as "composition") contains the [A] phthalocyanine compound. The composition preferably further contains [B] an infrared shielding agent, and the [B] infrared shielding agent is a metal oxide, a copper compound (excluding the [A] phthalocyanine compound), or a combination thereof.
([A]酞菁化合物) [A]酞菁化合物為由下述式(1)所表示的化合物。[A]酞菁化合物的可見光區域(例如430 nm以上且580 nm以下的波長區域)的穿透性高,另一方面,近紅外線區域(例如700 nm以上且900 nm以下的波長區域)的遮蔽性高。該組成物含有所述[A]酞菁化合物,因此即便於所含的有機色素的種類少的情況下,亦可形成兼具良好的可見光穿透性與紅外線遮蔽性的光學濾光片。另外,該組成物含有所述[A]酞菁化合物,因此可形成可見光區域中的均勻穿透性高的光學濾光片。([A] Phthalocyanine compound) [A] The phthalocyanine compound is a compound represented by the following formula (1). [A] The visible light region of the phthalocyanine compound (for example, a wavelength region of 430 nm or more and 580 nm or less) has high permeability, and on the other hand, the near-infrared region (for example, a wavelength region of 700 nm or more and 900 nm or less) is shielded. High sex. Since the composition contains the [A] phthalocyanine compound, an optical filter having both good visible light transmittance and infrared shielding properties can be formed even when the type of the organic dye contained is small. Further, since the composition contains the [A] phthalocyanine compound, it is possible to form an optical filter having high uniform permeability in the visible light region.
[化2] [Chemical 2]
式(1)中,多個R分別獨立地為烷基或芳基。多個X分別獨立地為氫原子、鹵素原子或烷基。多個X亦可相互鍵結並與該些所鍵結的碳鏈一起形成芳香環。M為兩個氫原子、二價金屬原子或者三價或四價的金屬原子的衍生物。多個n分別獨立地為3~6的整數。In the formula (1), the plurality of R are each independently an alkyl group or an aryl group. The plurality of X are each independently a hydrogen atom, a halogen atom or an alkyl group. A plurality of Xs may also be bonded to each other and form an aromatic ring together with the bonded carbon chains. M is a derivative of two hydrogen atoms, a divalent metal atom or a trivalent or tetravalent metal atom. The plurality of n are each independently an integer of 3 to 6.
作為所述R所表示的烷基,可列舉:甲基、乙基、正丙基、異丙基、正丁基、2-甲基丙基、1-甲基丙基、第三丁基等碳數1~30的直鏈狀或分支狀的烷基。Examples of the alkyl group represented by R include a methyl group, an ethyl group, a n-propyl group, an isopropyl group, a n-butyl group, a 2-methylpropyl group, a 1-methylpropyl group, a t-butyl group, and the like. A linear or branched alkyl group having 1 to 30 carbon atoms.
作為所述R所表示的芳基,可列舉:苯基、甲苯基、二甲苯基、萘基、蒽基等。Examples of the aryl group represented by R include a phenyl group, a tolyl group, a xylyl group, a naphthyl group, and an anthracenyl group.
作為所述R,較佳為烷基,更佳為碳數1~12的直鏈狀或分支狀的烷基。進而,所述烷基的碳數的上限較佳為6,更佳為4,進而佳為2。作為所述R,尤佳為甲基。The R is preferably an alkyl group, more preferably a linear or branched alkyl group having 1 to 12 carbon atoms. Further, the upper limit of the carbon number of the alkyl group is preferably 6, more preferably 4, and still more preferably 2. As the R, a methyl group is particularly preferable.
作為所述X所表示的鹵素原子,可列舉:氟原子、氯原子、溴原子等。Examples of the halogen atom represented by X include a fluorine atom, a chlorine atom, and a bromine atom.
作為所述X所表示的烷基,可列舉作為所述R所表示的烷基而例示者。The alkyl group represented by the above X is exemplified as the alkyl group represented by the above R.
多個X亦可相互鍵結。通常,多個X中,鍵結於同一苯環的兩個X相互鍵結,並與該些所鍵結的碳鏈一起形成芳香環。作為所形成的芳香環,可列舉:苯環、萘環、蒽環等。該些芳香環的氫原子亦可經烴基或其他取代基取代。A plurality of Xs may also be bonded to each other. Generally, in a plurality of X, two X bonds bonded to the same benzene ring are bonded to each other, and together with the bonded carbon chains form an aromatic ring. Examples of the aromatic ring to be formed include a benzene ring, a naphthalene ring, an anthracene ring and the like. The hydrogen atoms of the aromatic rings may also be substituted by a hydrocarbon group or other substituents.
作為所述X,較佳為氫原子。As the X, a hydrogen atom is preferred.
作為所述M所表示的二價金屬原子,可列舉:Pd、Cu、Zn、Pt、Ni、Co、Fe、Mn、Sn、In、Ru、Rh、Pb等。再者,所謂二價金屬原子是指可成為二價陽離子的金屬原子。Examples of the divalent metal atom represented by the above-mentioned M include Pd, Cu, Zn, Pt, Ni, Co, Fe, Mn, Sn, In, Ru, Rh, and Pb. Further, the divalent metal atom means a metal atom which can be a divalent cation.
此處,所謂金屬原子的衍生物是指包含金屬原子的原子群。所謂三價金屬原子是指可成為三價陽離子的金屬原子。作為三價金屬原子,可列舉Al、In等。所謂四價金屬原子是指可成為四價陽離子的金屬原子。作為四價金屬原子,可列舉Si、Ge、Sn等。再者,金屬原子中亦包含半金屬原子。作為所述M所表示的三價或四價金屬原子的衍生物,可列舉:AlCl、AlBr、AlI、AlOH、InCl、InBr、InI、InOH、SiCl2 、SiBr2 、SiI2 、Si(OH)2 、GeCl2 、GeBr2 、GeI2 、SnCl2 、SnBr2 、SnI2 、Sn(OH)2 、VO、TiO等。Here, the derivative of a metal atom means an atomic group containing a metal atom. The trivalent metal atom means a metal atom which can be a trivalent cation. Examples of the trivalent metal atom include Al, In, and the like. The tetravalent metal atom means a metal atom which can be a tetravalent cation. Examples of the tetravalent metal atom include Si, Ge, and Sn. Furthermore, the metal atom also contains a semi-metal atom. Examples of the derivative of the trivalent or tetravalent metal atom represented by M include AlCl, AlBr, AlI, AlOH, InCl, InBr, InI, InOH, SiCl 2 , SiBr 2 , SiI 2 , Si(OH). 2, GeCl 2, GeBr 2, GeI 2, SnCl 2, SnBr 2, SnI 2, Sn (OH) 2, VO, TiO and the like.
作為所述M,較佳為H2 (兩個氫原子)、Pd、Cu、Zn、Pt、Ni、Co、Fe、Mn、Sn、In、SnCl2 、AlCl、VO及TiO,更佳為VO。As the M, preferably H 2 (two hydrogen atoms), Pd, Cu, Zn, Pt, Ni, Co, Fe, Mn, Sn, In, SnCl 2 , AlCl, VO, and TiO, more preferably VO .
作為所述n的下限,較佳為4。作為所述n的上限,較佳為5,更佳為4。The lower limit of the n is preferably 4. The upper limit of the n is preferably 5, more preferably 4.
[A]酞菁化合物的極大吸收波長的下限較佳為680 nm,更佳為700 nm,進而佳為720 nm。另一方面,所述極大吸收波長的上限較佳為1,000 nm,更佳為900 nm,進而佳為800 nm,進而更佳為750 nm。藉由[A]酞菁化合物的極大吸收波長為所述範圍內,可形成兼具更良好的可見光穿透性與紅外線遮蔽性的光學濾光片。The lower limit of the maximum absorption wavelength of the [A] phthalocyanine compound is preferably 680 nm, more preferably 700 nm, and further preferably 720 nm. On the other hand, the upper limit of the maximum absorption wavelength is preferably 1,000 nm, more preferably 900 nm, further preferably 800 nm, and even more preferably 750 nm. When the maximum absorption wavelength of the [A] phthalocyanine compound is within the above range, an optical filter having better visible light transmittance and infrared shielding properties can be formed.
[A]酞菁化合物的合成方法並無特別限定,可將公知的方法組合而合成。例如,可根據下述流程(scheme)1而合成。The method for synthesizing the [A] phthalocyanine compound is not particularly limited, and a known method can be combined and synthesized. For example, it can be synthesized according to the following scheme (scheme) 1.
[化3] [Chemical 3]
流程1中,R、X、M及n與式(1)為相同含義。In the scheme 1, R, X, M and n have the same meanings as in the formula (1).
再者,作為所述流程1中的二氰基化合物,亦可使用取代基(RO(CH2 )n -或X)不同的多種二氰基化合物。作為M2+ 所表示的金屬離子等的供給源,可列舉乙酸鹽、氯化物、溴化物、硝酸鹽、硫酸鹽等各種金屬鹽。藉由將所述式(0)所表示的化合物與金屬鹽等於溶媒中混合,可獲得所述式(1)所表示的[A]酞菁化合物。作為所述溶媒,可列舉:芳香族烴(苯、甲苯等)、脂肪族烴(己烷、環己烷等)、氯化烴(二氯甲烷、氯仿、二氯乙烷等)、二甲基甲醯胺(Dimethyl Formamide,DMF)、二甲基亞碸(dimethylsulfoxide,DMSO)、乙腈、四氫呋喃(tetrahydrofuran,THF)、N-甲基吡咯啶酮、二噁烷、醇(甲醇、乙醇等)等。Further, as the dicyano compound in the scheme 1, a plurality of dicyano compounds having different substituents (RO(CH 2 ) n - or X) may be used. Examples of the supply source of the metal ion or the like represented by M 2+ include various metal salts such as acetate, chloride, bromide, nitrate, and sulfate. The [A] phthalocyanine compound represented by the above formula (1) can be obtained by mixing the compound represented by the formula (0) with a metal salt in a solvent. Examples of the solvent include aromatic hydrocarbons (such as benzene and toluene), aliphatic hydrocarbons (such as hexane and cyclohexane), and chlorinated hydrocarbons (such as dichloromethane, chloroform, and dichloroethane). Dimethyl Formamide (DMF), dimethylsulfoxide (DMSO), acetonitrile, tetrahydrofuran (THF), N-methylpyrrolidone, dioxane, alcohol (methanol, ethanol, etc.) Wait.
作為[A]酞菁化合物於該組成物中的全部固體成分中所佔的含量的下限,較佳為0.1質量%,更佳為0.5質量%,進而佳為1質量%。另一方面,作為所述含量的上限,較佳為30質量%,更佳為15質量%,進而佳為10質量%,進而更佳為5質量%。藉由將[A]酞菁化合物的含量設為所述範圍內,所得的光學濾光片的可見光穿透性與紅外線遮蔽性達到更良好的平衡。The lower limit of the content of the [A] phthalocyanine compound in the total solid content of the composition is preferably 0.1% by mass, more preferably 0.5% by mass, still more preferably 1% by mass. On the other hand, the upper limit of the content is preferably 30% by mass, more preferably 15% by mass, still more preferably 10% by mass, still more preferably 5% by mass. By setting the content of the [A] phthalocyanine compound within the above range, the obtained optical filter has a better balance between visible light transmittance and infrared shielding property.
[A]酞菁化合物可單獨使用一種,亦可混合使用兩種以上。其中,較佳為使用僅一種或兩種[A]酞菁化合物,更佳為使用僅一種[A]酞菁化合物。[A]酞菁化合物可僅利用一種來發揮良好的可見光穿透性與紅外線遮蔽性。因此,藉由減少[A]酞菁化合物的使用種類數,可發揮良好的可見光穿透性與紅外線遮蔽性,且提高生產性。[A] The phthalocyanine compound may be used alone or in combination of two or more. Among them, it is preferred to use only one or two kinds of [A] phthalocyanine compounds, and it is more preferred to use only one [A] phthalocyanine compound. [A] The phthalocyanine compound can exhibit good visible light transmittance and infrared shielding properties using only one type. Therefore, by reducing the number of types of use of the [A] phthalocyanine compound, it is possible to exhibit good visible light transmittance and infrared shielding properties, and to improve productivity.
([B]紅外線遮蔽劑) [B]紅外線遮蔽劑為金屬氧化物、銅化合物([A]酞菁化合物除外)或者該些的組合。作為[B]紅外線遮蔽劑,較佳為於800 nm以上且2000 nm以下的範圍內具有極大吸收波長的化合物。藉由將所述[B]紅外線遮蔽劑與[A]酞菁化合物併用,所得的光學濾光片的紅外線遮蔽性能進一步提高。([B] Infrared masking agent) [B] The infrared shielding agent is a metal oxide, a copper compound (except [A] phthalocyanine compound), or a combination of these. As the [B] infrared shielding agent, a compound having a maximum absorption wavelength in a range of 800 nm or more and 2000 nm or less is preferable. By using the [B] infrared shielding agent in combination with the [A] phthalocyanine compound, the infrared shielding performance of the obtained optical filter is further improved.
關於作為[B]紅外線遮蔽劑的金屬氧化物,例如可列舉:氧化鎢系化合物、石英(SiO2 )、磁鐵礦(Fe3 O4 )、氧化鋁(Al2 O3 )、二氧化鈦(TiO2 )、氧化鋯(ZrO2 )、尖晶石(MgAl2 O4 )等。Examples of the metal oxide as the [B] infrared shielding agent include a tungsten oxide compound, quartz (SiO 2 ), magnetite (Fe 3 O 4 ), alumina (Al 2 O 3 ), and titania (TiO). 2 ), zirconium oxide (ZrO 2 ), spinel (MgAl 2 O 4 ), and the like.
關於作為[B]紅外線遮蔽劑的銅化合物,可列舉銅酞菁系化合物或其他銅錯合物等。作為銅酞菁系化合物,可列舉銅酞菁、氯化銅酞菁、氯化溴化銅酞菁、溴化銅酞菁等。The copper compound as the [B] infrared shielding agent may, for example, be a copper phthalocyanine compound or another copper complex. Examples of the copper phthalocyanine-based compound include copper phthalocyanine, copper chloride phthalocyanine, copper bromide phthalocyanine, and copper bromide phthalocyanine.
作為[B]紅外線遮蔽劑,較佳為金屬氧化物,更佳為氧化鎢系化合物。氧化鎢系化合物是對紫外線(尤其是波長約800 nm以上且1200 nm以下的紅外線)的吸收高(即,對紅外線的遮蔽性高)、對可見光的吸收低的紅外線遮蔽劑。因此,藉由該組成物含有氧化鎢系化合物,可維持所得的光學濾光片的良好的可見光穿透性且提高紅外線遮蔽性。[B]紅外線遮蔽劑可單獨使用一種,亦可混合使用兩種以上。The [B] infrared shielding agent is preferably a metal oxide, more preferably a tungsten oxide compound. The tungsten oxide-based compound is an infrared shielding agent which has high absorption of ultraviolet rays (especially, infrared rays having a wavelength of about 800 nm or more and 1200 nm or less) (that is, high shielding properties against infrared rays) and low absorption of visible light. Therefore, by containing the tungsten oxide-based compound in the composition, it is possible to maintain good visible light transmittance of the obtained optical filter and improve infrared shielding properties. [B] The infrared shielding agent may be used singly or in combination of two or more.
作為氧化鎢系化合物,更佳為由下述式(2)所表示的氧化鎢系化合物。 Ax WOy ···(2)The tungsten oxide-based compound is more preferably a tungsten oxide-based compound represented by the following formula (2). A x WO y ···(2)
式(2)中,A為金屬元素。0.001≦x≦1.1。2.2≦y≦3.0。In the formula (2), A is a metal element. 0.001 ≦ x ≦ 1.1. 2.2 ≦ y ≦ 3.0.
作為所述式(2)中的A所表示的金屬元素,可列舉:鹼金屬、鹼土類金屬、Mg、Zr、Cr、Mn、Fe、Ru、Co、Rh、Ir、Ni、Pd、Pt、Cu、Ag、Au、Zn、Cd、Al、Ga、In、Tl、Sn、Pb、Ti、Nb、V、Mo、Ta、Re、Be、Hf、Os、Bi等。A所表示的金屬元素可為一種亦可為兩種以上。Examples of the metal element represented by A in the formula (2) include an alkali metal, an alkaline earth metal, Mg, Zr, Cr, Mn, Fe, Ru, Co, Rh, Ir, Ni, Pd, and Pt. Cu, Ag, Au, Zn, Cd, Al, Ga, In, Tl, Sn, Pb, Ti, Nb, V, Mo, Ta, Re, Be, Hf, Os, Bi, and the like. The metal element represented by A may be one type or two or more types.
作為所述A,較佳為鹼金屬,更佳為Rb及Cs,進而佳為Cs。即,金屬氧化物更佳為氧化鎢銫。The above A is preferably an alkali metal, more preferably Rb and Cs, and still more preferably Cs. That is, the metal oxide is more preferably tungsten oxide.
藉由所述式(2)中的x為0.001以上,可充分遮蔽紅外線。x的下限較佳為0.01,更佳為0.1。另一方面,藉由x為1.1以下,可更確實地避免於氧化鎢系化合物中生成雜質相。x的上限較佳為1,更佳為0.5。When x in the above formula (2) is 0.001 or more, infrared rays can be sufficiently shielded. The lower limit of x is preferably 0.01, more preferably 0.1. On the other hand, when x is 1.1 or less, it is possible to more reliably prevent the formation of an impurity phase in the tungsten oxide-based compound. The upper limit of x is preferably 1, more preferably 0.5.
藉由所述式(2)中的y為2.2以上,可進一步提高作為材料的化學穩定性。y的下限較佳為2.5。另一方面,藉由y為3.0以下,可充分遮蔽紅外線。By the y in the formula (2) being 2.2 or more, the chemical stability as a material can be further improved. The lower limit of y is preferably 2.5. On the other hand, by y being 3.0 or less, infrared rays can be sufficiently shielded.
作為所述式(2)所表示的氧化鎢系化合物的具體例,可列舉Cs0.33 WO3 、Rb0.33 WO3 、K0.33 WO3 、Ba0.33 WO3 等,較佳為Cs0.33 WO3 及Rb0.33 WO3 ,進而佳為Cs0.33 WO3 。Specific examples of the tungsten oxide-based compound represented by the formula (2) include Cs 0.33 WO 3 , Rb 0.33 WO 3 , K 0.33 WO 3 , Ba 0.33 WO 3 , etc., preferably Cs 0.33 WO 3 and Rb. 0.33 WO 3 , and thus preferably Cs 0.33 WO 3 .
[B]紅外線遮蔽劑較佳為微粒子。作為[B]紅外線遮蔽劑的平均粒徑(D50)的上限,較佳為500 nm,更佳為200 nm,進而佳為50 nm,進而更佳為30 nm。藉由平均粒徑為所述上限以下,可進一步提高可見光穿透性。另一方面,就製造時的操作容易性等的原因而言,[B]紅外線遮蔽劑的平均粒徑通常為1 nm以上,亦可為10 nm以上。[B] The infrared shielding agent is preferably fine particles. The upper limit of the average particle diameter (D50) of the [B] infrared shielding agent is preferably 500 nm, more preferably 200 nm, still more preferably 50 nm, and still more preferably 30 nm. When the average particle diameter is not more than the above upper limit, the visible light transmittance can be further improved. On the other hand, the average particle diameter of the [B] infrared shielding agent is usually 1 nm or more, and may be 10 nm or more, for reasons such as ease of handling during production.
[B]紅外線遮蔽劑亦可藉由公知的方法合成,可作為市售品而獲取。於金屬氧化物例如為氧化鎢系化合物的情況下,氧化鎢系化合物例如可藉由於惰性氣體環境或還原性氣體環境中對鎢化合物進行熱處理的方法而獲得。另外,氧化鎢系化合物例如亦可作為住友金屬礦山公司的「YMF-02」等的鎢微粒子的分散物而獲取。[B] The infrared shielding agent can also be synthesized by a known method, and can be obtained as a commercial item. In the case where the metal oxide is, for example, a tungsten oxide-based compound, the tungsten oxide-based compound can be obtained, for example, by a method of heat-treating a tungsten compound in an inert gas atmosphere or a reducing gas atmosphere. In addition, the tungsten oxide-based compound can be obtained, for example, as a dispersion of tungsten fine particles such as "YMF-02" by Sumitomo Metal Mining Co., Ltd.
作為[B]紅外線遮蔽劑於該組成物中的全部固體成分中所佔的含量的下限,較佳為1質量%,更佳為5質量%,進而佳為10質量%。所述含量的下限進而佳為20質量%,更佳為30質量%。另一方面,作為所述含量的上限,較佳為70質量%,更佳為65質量%,進而佳為60質量%。藉由將[B]紅外線遮蔽劑的含量設為所述範圍內,所得的光學濾光片的可見光穿透性與紅外線遮蔽性達到更良好的平衡。The lower limit of the content of the [B] infrared shielding agent in the total solid content of the composition is preferably 1% by mass, more preferably 5% by mass, and still more preferably 10% by mass. The lower limit of the content is more preferably 20% by mass, still more preferably 30% by mass. On the other hand, the upper limit of the content is preferably 70% by mass, more preferably 65% by mass, and still more preferably 60% by mass. By setting the content of the [B] infrared shielding agent to the above range, the obtained optical filter has a better balance between visible light transmittance and infrared shielding property.
作為[B]紅外線遮蔽劑的含量相對於[A]酞菁化合物的含量的質量比([B]/[A])的下限,較佳為2,較佳為3,進而佳為5,進而更佳為10。另一方面,作為所述質量比([B]/[A])的上限,較佳為40,更佳為30,進而佳為20。藉由將[A]酞菁化合物與[B]紅外線遮蔽劑的含量比設為所述範圍內,所得的光學濾光片的可見光穿透性與紅外線遮蔽性達到更良好的平衡。The lower limit of the mass ratio of the [B] infrared shielding agent to the content of the [A] phthalocyanine compound ([B]/[A]) is preferably 2, preferably 3, and more preferably 5, and further More preferably 10. On the other hand, as the upper limit of the mass ratio ([B]/[A]), it is preferably 40, more preferably 30, and still more preferably 20. By setting the content ratio of the [A] phthalocyanine compound to the [B] infrared shielding agent to be within the above range, the obtained optical filter has a better balance between visible light transmittance and infrared shielding property.
([C]分散劑) 該組成物較佳為進而包含[C]分散劑。藉由[C]分散劑,可提高[B]紅外線遮蔽劑(尤其是金屬氧化物)的均勻分散性,且進一步提高所得的光學濾光片的可見光穿透性與紅外線遮蔽性。([C] Dispersant) The composition preferably further contains a [C] dispersant. By the [C] dispersant, the uniform dispersibility of the [B] infrared shielding agent (especially a metal oxide) can be improved, and the visible light transmittance and infrared shielding property of the obtained optical filter can be further improved.
作為[C]分散劑,例如可列舉:胺基甲酸酯系分散劑、聚乙亞胺系分散劑、聚氧乙烯烷基醚系分散劑、聚氧乙烯烷基苯基醚系分散劑、聚乙二醇二酯系分散劑、山梨醇酐脂肪酸酯系分散劑、聚酯系分散劑、(甲基)丙烯酸系分散劑等。該些中,較佳為(甲基)丙烯酸系分散劑。[C]分散劑較佳為嵌段共聚物。Examples of the [C] dispersant include an urethane dispersant, a polyethyleneimine dispersant, a polyoxyethylene alkyl ether dispersant, and a polyoxyethylene alkyl phenyl ether dispersant. A polyethylene glycol diester dispersing agent, a sorbitan fatty acid ester dispersing agent, a polyester dispersing agent, a (meth)acrylic dispersing agent, or the like. Among these, a (meth)acrylic dispersant is preferred. The [C] dispersant is preferably a block copolymer.
[C]分散劑可於商業上獲取,例如(甲基)丙烯酸系分散劑可列舉迪斯帕畢克(Disperbyk)-2000、迪斯帕畢克(Disperbyk)-2001、畢克(BYK)-LPN6919、畢克(BYK)-LPN21116、畢克(BYK)-LPN22102(以上為畢克化學(BYK)公司製造),胺基甲酸酯系分散劑可列舉迪斯帕畢克(Disperbyk)-161、迪斯帕畢克(Disperbyk)-162、迪斯帕畢克(Disperbyk)-165、迪斯帕畢克(Disperbyk)-167、迪斯帕畢克(Disperbyk)-170、迪斯帕畢克(Disperbyk)182、迪斯帕畢克(Disperbyk)-2164(以上為畢克化學(BYK)公司製造)、索努帕斯(Solsperse)76500(路博潤(Lubrizol)(股)公司製造),聚乙亞胺系分散劑可列舉索努帕斯(Solsperse)24000(路博潤(Lubrizol)(股)公司製造),聚酯系分散劑可列舉阿吉斯帕(Ajisper)PB821、阿吉斯帕(Ajisper)PB822、阿吉斯帕(Ajisper)PB880、阿吉斯帕(Ajisper)PB881(以上為味之素精細化學(Ajinomoto Fine-Techno)(股)公司製造),此外可列舉畢克(BYK)-LPN21324(畢克化學(BYK)公司製造)等。[C] Dispersants are commercially available, for example, (meth)acrylic dispersants include Disperbyk-2000, Disperbyk-2001, BYK- LPN6919, BYK-LPN21116, BYK-LPN22102 (above is BYK), and the urethane dispersant can be listed as Disperbyk-161. , Disperbyk-162, Disperbyk-165, Disperbyk-167, Disperbyk-170, Despabike (Disperbyk) 182, Disperbyk-2164 (above made by BYK), Solsperse 76500 (manufactured by Lubrizol) Examples of the polyethylenimine dispersant include Solsperse 24000 (manufactured by Lubrizol Co., Ltd.), and polyester dispersants include Ajisper PB821 and Ajis. Ajisper PB822, Ajisper PB880, Ajisper PB881 (above Ajinomoto Fine Chemicals (Ajinomoto Fine-Techno) (shares) Corporation), in addition include BYK (BYK) -LPN21324 (BYK Chemie (BYK) Manufacturing Company) and the like.
作為[C]分散劑的胺價的下限,較佳為10 mgKOH/g,更佳為40 mgKOH/g,進而佳為80 mgKOH/g。另一方面,作為所述胺價的上限,較佳為300 mgKOH/g,更佳為200 mgKOH/g,進而佳為150 mgKOH/g。藉由使用具有所述胺價的分散劑,[B]紅外線遮蔽劑的分散性提高,可進一步提高所得的光學濾光片的可見光穿透性與紅外線遮蔽性。再者,所謂「胺價」是與中和分散劑固體成分1 g所需要的HCl當量的KOH的mg數。The lower limit of the amine value of the [C] dispersant is preferably 10 mgKOH/g, more preferably 40 mgKOH/g, and still more preferably 80 mgKOH/g. On the other hand, as the upper limit of the amine value, it is preferably 300 mgKOH/g, more preferably 200 mgKOH/g, and still more preferably 150 mgKOH/g. By using a dispersant having the amine valence, the dispersibility of the [B] infrared ray shielding agent is improved, and the visible light transmittance and infrared ray shielding property of the obtained optical filter can be further improved. Further, the "amine price" is the number of mg of KOH equivalent to the HCl equivalent required to neutralize 1 g of the solid component of the dispersant.
作為[C]分散劑的含量的下限,相對於[B]紅外線遮蔽劑100質量份,較佳為5質量份,更佳為15質量份,進而佳為30質量份。另一方面,所述含量的上限較佳為200質量份,更佳為100質量份,進而佳為60質量份。The lower limit of the content of the [C] dispersant is preferably 5 parts by mass, more preferably 15 parts by mass, even more preferably 30 parts by mass, based on 100 parts by mass of the [B] infrared shielding agent. On the other hand, the upper limit of the content is preferably 200 parts by mass, more preferably 100 parts by mass, and still more preferably 60 parts by mass.
([D]聚合性化合物) 該組成物較佳為進而包含[D]聚合性化合物。於該組成物含有[D]聚合性化合物的情況下,可發揮良好的硬化性或所得的光學濾光片的良好的耐熱性等。所謂[D]聚合性化合物是指具有兩個以上可聚合的基的化合物。作為可聚合的基,例如可列舉乙烯性不飽和基、環氧乙烷基、氧雜環丁基、N-烷氧基甲基胺基等。作為[D]聚合性化合物,較佳為具有兩個以上的(甲基)丙烯醯基的化合物及具有兩個以上的N-烷氧基甲基胺基的化合物,更佳為具有兩個以上的(甲基)丙烯醯基的化合物。[D]聚合性化合物可使用一種或混合使用兩種以上。([D] Polymerizable Compound) The composition preferably further contains a [D] polymerizable compound. When the composition contains the [D] polymerizable compound, it can exhibit good curability, good heat resistance of the obtained optical filter, and the like. The [D] polymerizable compound means a compound having two or more polymerizable groups. Examples of the polymerizable group include an ethylenically unsaturated group, an oxiranyl group, an oxetanyl group, and an N-alkoxymethylamino group. The [D] polymerizable compound is preferably a compound having two or more (meth)acrylinyl groups and a compound having two or more N-alkoxymethylamino groups, more preferably two or more. (Meth) propylene fluorenyl compound. [D] The polymerizable compound may be used alone or in combination of two or more.
作為具有兩個以上的(甲基)丙烯醯基的化合物,可列舉:作為脂肪族多羥基化合物與(甲基)丙烯酸的反應物等的多官能(甲基)丙烯酸酯、經己內酯改質的多官能(甲基)丙烯酸酯、經環氧烷改質的多官能(甲基)丙烯酸酯、作為具有羥基的(甲基)丙烯酸酯與多官能異氰酸酯的反應物等的多官能胺基甲酸酯(甲基)丙烯酸酯、作為具有羥基的(甲基)丙烯酸酯與酸酐的反應物等的具有羧基的多官能(甲基)丙烯酸酯等。Examples of the compound having two or more (meth) acrylonitrile groups include polyfunctional (meth) acrylates such as a reactant of an aliphatic polyhydroxy compound and (meth)acrylic acid, and a change in caprolactone. a polyfunctional (meth) acrylate, an alkylene oxide-modified polyfunctional (meth) acrylate, a polyfunctional amine group as a reactant of a (meth) acrylate having a hydroxyl group and a polyfunctional isocyanate A poly(meth)acrylate having a carboxyl group such as a formate (meth) acrylate or a reaction product of a (meth) acrylate having a hydroxyl group and an acid anhydride.
此處,作為所述脂肪族多羥基化合物,例如可列舉:乙二醇、丙二醇、聚乙二醇、聚丙二醇等二價脂肪族多羥基化合物、或者甘油、三羥甲基丙烷、季戊四醇、二季戊四醇等三價以上的脂肪族多羥基化合物。作為所述具有羥基的(甲基)丙烯酸酯,例如可列舉(甲基)丙烯酸2-羥基乙酯、三羥甲基丙烷二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、甘油二甲基丙烯酸酯等。作為所述多官能異氰酸酯,例如可列舉:甲苯二異氰酸酯、六亞甲基二異氰酸酯、二苯基亞甲基二異氰酸酯、異佛爾酮二異氰酸酯等。作為所述酸酐,例如可列舉:琥珀酸酐、馬來酸酐、戊二酸酐、衣康酸酐、鄰苯二甲酸酐、六氫鄰苯二甲酸酐等二元酸酐、或者均苯四甲酸二酐、聯苯四羧酸二酐、二苯甲酮四羧酸二酐等四元酸二酐。Here, examples of the aliphatic polyhydroxy compound include divalent aliphatic polyhydroxy compounds such as ethylene glycol, propylene glycol, polyethylene glycol, and polypropylene glycol, or glycerin, trimethylolpropane, pentaerythritol, and A trivalent or higher aliphatic polyhydroxy compound such as pentaerythritol. Examples of the (meth) acrylate having a hydroxyl group include 2-hydroxyethyl (meth)acrylate, trimethylolpropane di(meth)acrylate, pentaerythritol tri(meth)acrylate, and Pentaerythritol penta (meth) acrylate, glycerin dimethacrylate, and the like. Examples of the polyfunctional isocyanate include toluene diisocyanate, hexamethylene diisocyanate, diphenylmethylene diisocyanate, and isophorone diisocyanate. Examples of the acid anhydride include a dibasic acid anhydride such as succinic anhydride, maleic anhydride, glutaric anhydride, itaconic anhydride, phthalic anhydride, and hexahydrophthalic anhydride, or pyromellitic dianhydride. A tetrabasic acid dianhydride such as biphenyltetracarboxylic dianhydride or benzophenone tetracarboxylic dianhydride.
作為具有兩個以上的(甲基)丙烯醯基的化合物的具體例,例如可列舉:ω-羧基聚己內酯單(甲基)丙烯酸酯、乙二醇(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、1,9-壬二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、雙苯氧基乙醇茀二(甲基)丙烯酸酯、二羥甲基三環癸烷二(甲基)丙烯酸酯、2-羥基-3-(甲基)丙烯醯氧基丙基甲基丙烯酸酯、(甲基)丙烯酸2-(2'-乙烯氧基乙氧基)乙酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、三(2-(甲基)丙烯醯氧基乙基)磷酸酯、環氧乙烷改質二季戊四醇六丙烯酸酯、琥珀酸改質季戊四醇三丙烯酸酯、胺基甲酸酯(甲基)丙烯酸酯化合物等。Specific examples of the compound having two or more (meth)acrylinyl groups include ω-carboxypolycaprolactone mono(meth)acrylate, ethylene glycol (meth)acrylate, and 1, 6-hexanediol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylic acid Ester, polypropylene glycol di(meth) acrylate, bisphenoxyethanol hydrazine di(meth) acrylate, dimethylol tricyclodecane di(meth) acrylate, 2-hydroxy-3-(A) Acryloxypropyl methacrylate, 2-(2'-vinyloxyethoxy)ethyl (meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol III Methyl) acrylate, pentaerythritol tetra(meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, tris(2-(methyl) propylene methoxyethyl) Phosphate ester, ethylene oxide modified dipentaerythritol hexaacrylate, succinic acid modified pentaerythritol triacrylate, urethane (meth) acrylate compound, and the like.
具有兩個以上的(甲基)丙烯醯基的化合物中,較佳為多官能(甲基)丙烯酸酯,更佳為具有3個以上且10個以下的(甲基)丙烯醯基的多官能(甲基)丙烯酸酯。具體而言,較佳為三羥甲基丙烷三丙烯酸酯、季戊四醇三丙烯酸酯、二季戊四醇五丙烯酸酯及二季戊四醇六丙烯酸酯。Among the compounds having two or more (meth)acryl fluorenyl groups, polyfunctional (meth) acrylates are preferred, and polyfunctional groups having 3 or more and 10 or less (meth) acryl fluorenyl groups are more preferred. (Meth) acrylate. Specifically, trimethylolpropane triacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, and dipentaerythritol hexaacrylate are preferred.
作為具有2個以上的N-烷氧基甲基胺基的化合物,例如可列舉具有三聚氰胺結構、苯并胍胺結構、脲結構的化合物等。作為具有2個以上的N-烷氧基甲基胺基的化合物的具體例,可列舉:N,N,N',N',N'',N''-六(烷氧基甲基)三聚氰胺、N,N,N',N'-四(烷氧基甲基)苯并胍胺、N,N,N',N'-四(烷氧基甲基)乙炔脲等。Examples of the compound having two or more N-alkoxymethylamino groups include a compound having a melamine structure, a benzoguanamine structure, and a urea structure. Specific examples of the compound having two or more N-alkoxymethylamino groups include N, N, N', N', N'', N''-hexa(alkoxymethyl) Melamine, N,N,N',N'-tetrakis(alkoxymethyl)benzoguanamine, N,N,N',N'-tetrakis(alkoxymethyl)acetylene urea, and the like.
[D]聚合性化合物的含量相對於[A]酞菁化合物100質量份而較佳為10質量份,更佳為200質量份,進而佳為500質量份。另一方面,所述含量的上限較佳為3,000質量份,更佳為2,000質量份。The content of the [D] polymerizable compound is preferably 10 parts by mass, more preferably 200 parts by mass, even more preferably 500 parts by mass, per 100 parts by mass of the [A] phthalocyanine compound. On the other hand, the upper limit of the content is preferably 3,000 parts by mass, more preferably 2,000 parts by mass.
([E]聚合起始劑) 該組成物較佳為含有[E]聚合起始劑。作為[E]聚合起始劑,可列舉光聚合起始劑、熱聚合起始劑等,較佳為光聚合起始劑。藉此,可對該組成物賦予感光性(感放射線性)。所謂光聚合起始劑是指藉由可見光線、紫外線、遠紫外線、電子束、X射線等放射線的曝光而產生使[D]聚合性化合物的聚合開始的活性種的化合物。[E]聚合起始劑可使用一種或混合使用兩種以上。([E] Polymerization Initiator) The composition preferably contains [E] a polymerization initiator. The [E] polymerization initiator may, for example, be a photopolymerization initiator, a thermal polymerization initiator or the like, and is preferably a photopolymerization initiator. Thereby, the composition can be provided with photosensitivity (radial sensitivity). The photopolymerization initiator is a compound which generates an active species which initiates polymerization of the [D] polymerizable compound by exposure to radiation such as visible light, ultraviolet light, far ultraviolet light, electron beam or X-ray. [E] The polymerization initiator may be used alone or in combination of two or more.
作為[E]聚合起始劑,例如可列舉:噻噸酮系化合物、苯乙酮系化合物、聯咪唑系化合物、三嗪系化合物、O-醯基肟系化合物、鎓鹽系化合物、安息香系化合物、二苯甲酮系化合物、α-二酮系化合物、多核醌系化合物、二偶氮系化合物、醯亞胺磺酸鹽系化合物、鎓鹽系化合物等。該些中,較佳為噻噸酮系化合物、苯乙酮系化合物、聯咪唑系化合物、三嗪系化合物及O-醯基肟系化合物,更佳為O-醯基肟系化合物。Examples of the [E] polymerization initiator include a thioxanthone compound, an acetophenone compound, a biimidazole compound, a triazine compound, an O-mercaptoquinone compound, a phosphonium salt compound, and a benzoin system. A compound, a benzophenone-based compound, an α-diketone-based compound, a polynuclear oxime-based compound, a diazo-based compound, a quinone imide sulfonate-based compound, or a phosphonium salt-based compound. Among these, a thioxanthone-based compound, an acetophenone-based compound, a biimidazole-based compound, a triazine-based compound, and an O-indenyl-based compound are preferable, and an O-indenyl-based compound is more preferable.
作為噻噸酮系化合物,可列舉:噻噸酮、2-氯噻噸酮、2-甲基噻噸酮、2-異丙基噻噸酮、4-異丙基噻噸酮、2,4-二氯噻噸酮、2,4-二甲基噻噸酮、2,4-二乙基噻噸酮、2,4-二異丙基噻噸酮等。Examples of the thioxanthone-based compound include thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, 4-isopropylthioxanthone, and 2,4. - Dichlorothioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, and the like.
作為苯乙酮系化合物,例如可列舉:2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)丁烷-1-酮、2-(4-甲基苄基)-2-(二甲基胺基)-1-(4-嗎啉基苯基)丁烷-1-酮等。Examples of the acetophenone-based compound include 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one and 2-benzyl-2-dimethyl Amino-1-(4-morpholinylphenyl)butan-1-one, 2-(4-methylbenzyl)-2-(dimethylamino)-1-(4-morpholine Phenyl phenyl) butan-1-one and the like.
作為聯咪唑系化合物,例如可列舉:2,2'-雙(2-氯苯基)-4,4',5,5'-四苯基-1,2'-聯咪唑、2,2'-雙(2,4-二氯苯基)-4,4',5,5'-四苯基-1,2'-聯咪唑、2,2'-雙(2,4,6-三氯苯基)-4,4',5,5'-四苯基-1,2'-聯咪唑等。Examples of the biimidazole-based compound include 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'. - bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4,6-trichloro Phenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole and the like.
再者,於使用聯咪唑系化合物的情況下,就可改良感度的方面而言,較佳為併用供氫體。此處所述的「供氫體」是指可藉由曝光對由聯咪唑系化合物所產生的自由基供給氫原子的化合物。作為供氫體,例如可列舉2-巰基苯并噻唑、2-巰基苯并噁唑等硫醇系供氫體;4,4'-雙(二甲基胺基)二苯甲酮、4,4'-雙(二乙基胺基)二苯甲酮等胺系供氫體。Further, in the case of using a biimidazole-based compound, it is preferred to use a hydrogen donor in combination in terms of improving the sensitivity. The "hydrogen donor" as used herein means a compound which can supply a hydrogen atom to a radical generated by a biimidazole compound by exposure. Examples of the hydrogen donor include a mercaptan hydrogen donor such as 2-mercaptobenzothiazole or 2-mercaptobenzoxazole; and 4,4'-bis(dimethylamino)benzophenone; An amine-based hydrogen donor such as 4'-bis(diethylamino)benzophenone.
作為三嗪系化合物,例如可列舉日本專利特公昭57-6096號公報、日本專利特開2003-238898號公報的段落[0063]~段落[0065]中記載的化合物。Examples of the triazine-based compound include the compounds described in paragraphs [0063] to [0065] of JP-A-57-57096, and JP-A-2003-238898.
作為O-醯基肟系化合物,可列舉:1,2-辛二酮-1-[4-(苯硫基)苯基]-2-(O-苯甲醯基肟)、乙酮-1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]-1-(O-乙醯基肟)、乙酮-1-[9-乙基-6-(2-甲基-4-四氫呋喃基甲氧基苯甲醯基)-9H-咔唑-3-基]-1-(O-乙醯基肟)、乙酮-1-[9-乙基-6-{2-甲基-4-(2,2-二甲基-1,3-二氧雜環戊基)甲氧基苯甲醯基}-9H-咔唑-3-基]-1-(O-乙醯基肟)等。作為O-醯基肟系化合物的市售品,亦可使用NCI-831、NCI-930(以上為艾迪科(ADEKA)股份有限公司製造)、OXE-03、OXE-04(以上為巴斯夫(BASF)公司製造)等。Examples of the O-indenyl lanthanide compound include 1,2-octanedione-1-[4-(phenylthio)phenyl]-2-(O-benzoguanidinopurine), and ethyl ketone-1. -[9-ethyl-6-(2-methylbenzhydryl)-9H-indazol-3-yl]-1-(O-acetamidopurine), ethyl ketone-1-[9-B -6-(2-methyl-4-tetrahydrofurylmethoxybenzylidene)-9H-indazol-3-yl]-1-(O-acetamidino), ethyl ketone-1-[ 9-ethyl-6-{2-methyl-4-(2,2-dimethyl-1,3-dioxolanyl)methoxybenzylidene}-9H-carbazole-3 -yl]-1-(O-ethylindenyl) and the like. As a commercial product of an O-indenyl lanthanide compound, NCI-831, NCI-930 (above, manufactured by ADEKA Co., Ltd.), OXE-03, OXE-04 (above, BASF (above) BASF) company manufacturing) and so on.
於使用光聚合起始劑的情況下,亦可併用增感劑。作為所述增感劑,例如可列舉:4,4'-雙(二甲基胺基)二苯甲酮、4,4'-雙(二乙基胺基)二苯甲酮、4-二乙基胺基苯乙酮、4-二甲基胺基苯丙酮、4-二甲基胺基苯甲酸乙酯、4-二甲基胺基苯甲酸2-乙基己酯、2,5-雙(4-二乙基胺基亞苄基)環己酮、7-二乙基胺基-3-(4-二乙基胺基苯甲醯基)香豆素、4-(二乙基胺基)查爾酮等。In the case of using a photopolymerization initiator, a sensitizer may be used in combination. Examples of the sensitizer include 4,4′-bis(dimethylamino)benzophenone, 4,4′-bis(diethylamino)benzophenone, and 4-dimer. Ethylaminoacetophenone, 4-dimethylaminopropiophenone, ethyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2,5- Bis(4-diethylaminobenzylidene)cyclohexanone, 7-diethylamino-3-(4-diethylaminobenzimidyl)coumarin, 4-(diethyl Amino) chalcone and the like.
[E]聚合起始劑的含量的下限相對於[D]聚合性化合物100質量份而較佳為1質量份,更佳為5質量份。另一方面,作為所述含量的上限,較佳為100質量份,更佳為20質量份。The lower limit of the content of the polymerization initiator is preferably 1 part by mass, more preferably 5 parts by mass, per 100 parts by mass of the [D] polymerizable compound. On the other hand, the upper limit of the content is preferably 100 parts by mass, more preferably 20 parts by mass.
(黏合劑樹脂) 於該組成物中亦可進而含有黏合劑樹脂。作為黏合劑樹脂,並無特別限定,較佳為具有羧基、酚性羥基等酸性官能基的樹脂。其中,較佳為具有羧基的聚合物(以下,亦稱為「含羧基的聚合物」)。作為含羧基的聚合物,例如可列舉具有一個以上的羧基的乙烯性不飽和單量體(以下,亦稱為「不飽和單量體(1)」)與其他可共聚的乙烯性不飽和單量體(以下,亦稱為「不飽和單量體(2))的共聚物。(Binder Resin) The composition may further contain a binder resin. The binder resin is not particularly limited, and is preferably a resin having an acidic functional group such as a carboxyl group or a phenolic hydroxyl group. Among them, a polymer having a carboxyl group (hereinafter also referred to as "carboxyl group-containing polymer") is preferred. Examples of the carboxyl group-containing polymer include an ethylenically unsaturated monomer having one or more carboxyl groups (hereinafter also referred to as "unsaturated monomer (1)") and other copolymerizable ethylenically unsaturated monomers. A copolymer of a volume (hereinafter also referred to as "unsaturated monomer (2)).
作為所述不飽和單量體(1),例如可列舉:(甲基)丙烯酸、馬來酸、馬來酸酐、琥珀酸單[2-(甲基)丙烯醯氧基乙基]酯、ω-羧基聚己內酯單(甲基)丙烯酸酯、對乙烯基苯甲酸等。Examples of the unsaturated monomer (1) include (meth)acrylic acid, maleic acid, maleic anhydride, succinic acid mono [2-(methyl) propylene methoxyethyl] ester, and ω. - Carboxypolycaprolactone mono(meth)acrylate, p-vinylbenzoic acid, and the like.
作為所述不飽和單量體(2),例如可列舉: N-苯基馬來醯亞胺、N-環己基馬來醯亞胺等N-位取代馬來醯亞胺、 苯乙烯、α-甲基苯乙烯、對羥基苯乙烯、對羥基-α-甲基苯乙烯、對乙烯基苄基縮水甘油醚、苊等芳香族乙烯基化合物、 (甲基)丙烯酸甲酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸烯丙酯、(甲基)丙烯酸苄酯、聚乙二醇(聚合度2~10)甲醚(甲基)丙烯酸酯、聚丙二醇(聚合度2~10)甲醚(甲基)丙烯酸酯、聚乙二醇(聚合度2~10)單(甲基)丙烯酸酯、聚丙二醇(聚合度2~10)單(甲基)丙烯酸酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸異冰片酯、三環[5.2.1.02,6 ]癸烷-8-基(甲基)丙烯酸酯、(甲基)丙烯酸二環戊烯酯、甘油單(甲基)丙烯酸酯、(甲基)丙烯酸4-羥基苯酯、對枯基苯酚的環氧乙烷改質(甲基)丙烯酸酯、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸3,4-環氧基環己基甲酯、3-[(甲基)丙烯醯氧基甲基]氧雜環丁烷、3-[(甲基)丙烯醯氧基甲基]-3-乙基氧雜環丁烷等(甲基)丙烯酸酯、 環己基乙烯基醚、異冰片基乙烯基醚、三環[5.2.1.02,6 ]癸烷-8-基乙烯基醚、五環十五烷基乙烯基醚、3-(乙烯氧基甲基)-3-乙基氧雜環丁烷等乙烯基醚、 聚苯乙烯、聚(甲基)丙烯酸甲酯、聚(甲基)丙烯酸正丁酯、聚矽氧烷等於聚合物分子鏈的末端具有單(甲基)丙烯醯基的巨單體等。Examples of the unsaturated monomer (2) include an N-position substituted maleimide such as N-phenylmaleimide or N-cyclohexylmaleimine, styrene, and α. -methylstyrene, p-hydroxystyrene, p-hydroxy-α-methylstyrene, p-vinylbenzyl glycidyl ether, an aromatic vinyl compound such as hydrazine, methyl (meth) acrylate, (methyl) N-butyl acrylate, 2-ethylhexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, polyethylene glycol ( Degree of polymerization 2 to 10) methyl ether (meth) acrylate, polypropylene glycol (degree of polymerization 2 to 10) methyl ether (meth) acrylate, polyethylene glycol (degree of polymerization 2 to 10) mono (meth) acrylate Ester, polypropylene glycol (degree of polymerization 2 to 10) mono (meth) acrylate, cyclohexyl (meth) acrylate, isobornyl (meth) acrylate, tricyclo [5.2.1.0 2,6 ] decane - 8-yl (meth) acrylate, dicyclopentenyl (meth) acrylate, mono (meth) acrylate, 4-hydroxyphenyl (meth) acrylate, ethylene oxide of p-cumylphenol Modified (meth) acrylate, ( Glycidyl acrylate, 3,4-epoxycyclohexylmethyl (meth)acrylate, 3-[(meth)acryloxymethyl]oxetane, 3-[(methyl (meth) acrylate such as acryloxymethyl]-3-ethyloxetane, cyclohexyl vinyl ether, isobornyl vinyl ether, tricyclo[5.2.1.0 2,6 ]癸Vinyl-8-yl vinyl ether, pentacyclopentadecyl vinyl ether, vinyl ether such as 3-(vinyloxymethyl)-3-ethyloxetane, polystyrene, poly(methyl The methyl acrylate, the poly(meth) acrylate, and the polyoxymethane are equal to a macromonomer having a mono(meth)acryl fluorenyl group at the terminal of the polymer molecular chain.
另外,作為黏合劑樹脂,亦可使用於側鏈具有(甲基)丙烯醯基等聚合性不飽和鍵的含羧基的聚合物。另外,聚矽氧烷等亦可作為黏合劑樹脂而使用。Further, as the binder resin, a carboxyl group-containing polymer having a polymerizable unsaturated bond such as a (meth) acrylonitrile group in a side chain can also be used. Further, polysiloxane or the like can also be used as the binder resin.
於該組成物含有黏合劑樹脂的情況下,黏合劑樹脂的含量相對於[A]酞菁化合物100質量份而言通常可設為10質量份以上且10,000質量份以下。In the case where the composition contains a binder resin, the content of the binder resin is usually 10 parts by mass or more and 10,000 parts by mass or less based on 100 parts by mass of the [A] phthalocyanine compound.
(添加劑) 該組成物亦可視需要含有各種添加劑。(Additive) The composition may also contain various additives as needed.
作為添加劑,例如可列舉:界面活性劑、密接促進劑、抗氧化劑、紫外線吸收劑、防凝聚劑、殘渣改善劑、顯影性改善劑等。Examples of the additive include a surfactant, an adhesion promoter, an antioxidant, an ultraviolet absorber, an anti-agglomeration agent, a residue improving agent, and a developability improving agent.
作為界面活性劑,可列舉氟界面活性劑、矽酮界面活性劑等。作為界面活性劑的含量,相對於[A]酞菁化合物100質量份而言通常可設為0.01質量份以上且10質量份以下。Examples of the surfactant include a fluorine surfactant, an anthrone surfactant, and the like. The content of the surfactant is usually 0.01 parts by mass or more and 10 parts by mass or less based on 100 parts by mass of the [A] phthalocyanine compound.
作為密接促進劑,可列舉:乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三(2-甲氧基乙氧基)矽烷、N-(2-胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-縮水甘油氧基丙基三甲氧基矽烷、3-縮水甘油氧基丙基甲基二甲氧基矽烷、2-(3,4-環氧基環己基)乙基三甲氧基矽烷、3-氯丙基甲基二甲氧基矽烷、3-氯丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-巰基丙基三甲氧基矽烷等。Examples of the adhesion promoter include vinyl trimethoxy decane, vinyl triethoxy decane, vinyl tris(2-methoxyethoxy) decane, and N-(2-aminoethyl)-3. -Aminopropylmethyldimethoxydecane, N-(2-aminoethyl)-3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, 3-shrinkage Glycidoxypropyltrimethoxydecane, 3-glycidoxypropylmethyldimethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 3-chloropropane Methyldimethoxydecane, 3-chloropropyltrimethoxydecane, 3-methylpropenyloxypropyltrimethoxydecane, 3-mercaptopropyltrimethoxydecane, and the like.
作為抗氧化劑,可列舉:2,2-硫代雙(4-甲基-6-第三丁基苯酚)、2,6-二-第三丁基苯酚、季戊四醇四[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、3,9-雙[2-[3-(3-第三丁基-4-羥基-5-甲基苯基)-丙醯氧基]-1,1-二甲基乙基]-2,4,8,10-四氧雜-螺[5.5]十一烷、硫代二乙烯雙[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]等。作為抗氧化劑的含量,相對於[A]酞菁化合物100質量份而言通常可設為0.01質量份以上且10質量份以下。Examples of the antioxidant include 2,2-thiobis(4-methyl-6-tert-butylphenol), 2,6-di-t-butylphenol, and pentaerythritol tetra [3-(3,5). -di-t-butyl-4-hydroxyphenyl)propionate],3,9-bis[2-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)- Propyloxy]-1,1-dimethylethyl]-2,4,8,10-tetraoxa-spiro[5.5]undecane, thiodiethylene bis[3-(3,5- Di-t-butyl-4-hydroxyphenyl)propionate] and the like. The content of the antioxidant is usually 0.01 parts by mass or more and 10 parts by mass or less based on 100 parts by mass of the [A] phthalocyanine compound.
作為紫外線吸收劑,可列舉2-(3-第三丁基-5-甲基-2-羥基苯基)-5-氯苯并三唑、烷氧基二苯甲酮類等。Examples of the ultraviolet absorber include 2-(3-tert-butyl-5-methyl-2-hydroxyphenyl)-5-chlorobenzotriazole and alkoxybenzophenone.
作為防凝聚劑,可列舉聚丙烯酸鈉等。Examples of the anti-agglomeration agent include sodium polyacrylate.
作為殘渣改善劑,可列舉:丙二酸、己二酸、衣康酸、檸康酸、反丁烯二酸、中康酸、2-胺基乙醇、3-胺基-1-丙醇、5-胺基-1-戊醇、3-胺基-1,2-丙二醇、2-胺基-1,3-丙二醇、4-胺基-1,2-丁二醇等。Examples of the residue improving agent include malonic acid, adipic acid, itaconic acid, citraconic acid, fumaric acid, mesaconic acid, 2-aminoethanol, and 3-amino-1-propanol. 5-amino-1-pentanol, 3-amino-1,2-propanediol, 2-amino-1,3-propanediol, 4-amino-1,2-butanediol, and the like.
作為顯影性改善劑,可列舉:琥珀酸單[2-(甲基)丙烯醯氧基乙基]酯、鄰苯二甲酸單[2-(甲基)丙烯醯氧基乙基]酯、ω-羧基聚己內酯單(甲基)丙烯酸酯等劑等。Examples of the developability improver include succinic acid mono [2-(methyl) propylene methoxyethyl] ester, phthalic acid mono [2-(methyl) propylene oxiranyl ethyl] ester, and ω. a carboxypolycaprolactone mono(meth)acrylate or the like.
(其他有機色素等) 該組成物亦可含有[A]酞菁化合物及作為為[B]紅外線遮蔽劑的銅化合物的有機色素以外的公知的有機色素。作為其他有機色素,可列舉二亞胺化合物、方酸內鎓鹽化合物、花青化合物、萘酞菁化合物、誇特銳烯化合物、銨化合物、亞胺化合物、偶氮化合物、蒽醌化合物、卟啉化合物、吡咯并吡咯化合物、氧雜菁化合物、克酮鎓化合物、六元卟啉(hexaphyrin)化合物等(將包含銅原子者除外)。另外,亦可使用[A]酞菁化合物及作為[B]紅外線遮蔽劑的酞菁化合物以外的酞菁化合物。(Other organic dyes, etc.) The composition may contain a known organic dye other than the organic pigment of the [A] phthalocyanine compound and the copper compound which is the [B] infrared shielding agent. Examples of the other organic dyes include a diimine compound, a squarylium ylide compound, a cyanine compound, a naphthalocyanine compound, a quartetene compound, an ammonium compound, an imine compound, an azo compound, an anthraquinone compound, and an anthracene. A porphyrin compound, a pyrrolopyrrole compound, an oxophthalocyanine compound, a ketoxime compound, a hexaphyrin compound or the like (excluding a copper atom). Further, a phthalocyanine compound other than the [A] phthalocyanine compound and the phthalocyanine compound as the [B] infrared shielding agent can also be used.
再者,較佳為將[A]酞菁化合物與[A]酞菁化合物以外的酞菁化合物(以下,亦稱為「[a]酞菁化合物」)併用。作為[a]酞菁化合物的極大吸收波長的下限,較佳為600 nm,更佳為650 nm,進而佳為700 nm,有時亦進而佳為750 nm,有時亦進而佳為800 nm。另一方面,作為[a]酞菁化合物的極大吸收波長的上限,較佳為900 nm,更佳為850 nm,有時亦進而佳為800 nm,有時亦進而佳為750 nm,有時亦進而佳為700 nm。作為[A]酞菁化合物的極大吸收波長與[a]酞菁化合物的極大吸收波長的差的下限,較佳為10 nm,更佳為30 nm,有時亦進而佳為50 nm。另一方面,作為所述差的上限,較佳為100 nm,更佳為80 nm,有時亦進而佳為50 nm。藉由組合使用所述酞菁化合物,可進一步提高所得的光學濾光片的可見光穿透性與紅外線遮蔽性。另外,亦可提高所得的光學濾光片的可見光均勻穿透性。再者,於[a]酞菁化合物中亦包含作為為[B]紅外線遮蔽劑的銅化合物的酞菁化合物。[a]酞菁化合物可列舉先前公知的各種酞菁化合物。In addition, the [A] phthalocyanine compound is preferably used in combination with a phthalocyanine compound other than the [A] phthalocyanine compound (hereinafter also referred to as "[a] phthalocyanine compound"). The lower limit of the maximum absorption wavelength of the [a] phthalocyanine compound is preferably 600 nm, more preferably 650 nm, further preferably 700 nm, and sometimes 750 nm, and sometimes 800 nm. On the other hand, the upper limit of the maximum absorption wavelength of the [a] phthalocyanine compound is preferably 900 nm, more preferably 850 nm, and sometimes more preferably 800 nm, and sometimes 750 nm, sometimes It is also better to be 700 nm. The lower limit of the difference between the maximum absorption wavelength of the [A] phthalocyanine compound and the maximum absorption wavelength of the [a] phthalocyanine compound is preferably 10 nm, more preferably 30 nm, and sometimes 50 nm. On the other hand, as the upper limit of the difference, it is preferably 100 nm, more preferably 80 nm, and sometimes 50 nm. By using the phthalocyanine compound in combination, the visible light transmittance and the infrared ray shielding property of the obtained optical filter can be further improved. In addition, the visible light uniformity of the obtained optical filter can also be improved. Further, a phthalocyanine compound which is a copper compound which is a [B] infrared shielding agent is also contained in the [a] phthalocyanine compound. The [a] phthalocyanine compound may be exemplified by various phthalocyanine compounds previously known.
作為[A]酞菁化合物於該組成物中的全部有機色素中所佔的含量的下限,較佳為50質量%,更佳為70質量%,有時亦更佳為80質量%,有時亦更佳為90質量%,有時亦更佳為99質量%。作為有機色素,有時亦較佳為實質上僅含有[A]酞菁化合物。該組成物藉由以所述方式減少其他有機色素的含量,可提高生產性。另外,亦可提高所得的光學濾光片的可見光均勻穿透性等。The lower limit of the content of the [A] phthalocyanine compound in all the organic dyes in the composition is preferably 50% by mass, more preferably 70% by mass, and still more preferably 80% by mass, and sometimes It is also preferably 90% by mass, and sometimes more preferably 99% by mass. As the organic dye, it is also preferred to contain substantially only the [A] phthalocyanine compound. This composition can improve productivity by reducing the content of other organic pigments in the manner described. In addition, the visible light uniformity of the obtained optical filter can be improved.
另外,作為該組成物中含有的有機色素的種類數,亦包含[A]酞菁化合物,較佳為3種以下,更佳為2種以下,有時亦進而佳為1種。即便藉由以所述方式減少所含的有機色素的種類數,亦可提高生產性,且提高所得的光學濾光片的可見光均勻穿透性等。再者,於使用2種以上有機色素的情況下,較佳為將[A]酞菁化合物與[A]酞菁化合物以外的酞菁化合物併用。In addition, the number of the organic dyes to be contained in the composition is also included in the [A] phthalocyanine compound, preferably three or less, more preferably two or less, and even more preferably one. Even if the number of kinds of the organic dye contained therein is reduced as described above, the productivity can be improved, and the visible light uniformity of the obtained optical filter can be improved. In the case of using two or more types of organic dyes, it is preferred to use a combination of the [A] phthalocyanine compound and a phthalocyanine compound other than the [A] phthalocyanine compound.
(溶媒) 該組成物通常是作為含有溶媒(分散介質)的液狀組成物而製備。作為溶媒,只要為將其他成分分散或溶解且不與該些成分反應、具有適度的揮發性者,則可適宜選擇使用。(Solvent) This composition is usually prepared as a liquid composition containing a solvent (dispersion medium). The solvent can be suitably used as long as it disperses or dissolves other components and does not react with the components and has moderate volatility.
作為所述溶媒,例如可列舉: 乙二醇單甲醚、乙二醇單乙醚、乙二醇單-正丙醚、乙二醇單-正丁醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單-正丙醚、二乙二醇單-正丁醚、三乙二醇單甲醚、三乙二醇單乙醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單-正丙醚、丙二醇單-正丁醚、二丙二醇單甲醚、二丙二醇單乙醚、二丙二醇單-正丙醚、二丙二醇單-正丁醚、三丙二醇單甲醚、三丙二醇單乙醚等(聚)烷二醇單烷基醚類、 乳酸甲酯、乳酸乙酯等乳酸烷基酯類、 甲醇、乙醇、丙醇、丁醇、異丙醇、異丁醇、第三丁醇、辛醇、2-乙基己醇、環己醇等(環)烷基醇類、 二丙酮醇等酮醇類、 乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、二乙二醇單甲醚乙酸酯、二乙二醇單乙醚乙酸酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、二丙二醇單甲醚乙酸酯、3-甲氧基丁基乙酸酯、3-甲基-3-甲氧基丁基乙酸酯等(聚)烷二醇單烷基醚乙酸酯類、 二乙二醇二甲醚、二乙二醇甲基乙醚、二乙二醇二乙醚、四氫呋喃等其他醚類、 甲基乙基酮、2-庚酮、3-庚酮等鏈狀酮、環戊酮、環己酮等環狀酮等酮類、 丙二醇二乙酸酯、1,3-丁二醇二乙酸酯、1,6-己二醇二乙酸酯等二乙酸酯類、 3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基乙酸乙酯、3-甲基-3-甲氧基丁基丙酸酯等烷氧基羧酸酯類、 乙酸乙酯、乙酸正丙酯、乙酸異丙酯、乙酸正丁酯、乙酸異丁酯、甲酸正戊酯、乙酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸異丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯、2-氧代丁酸乙酯等其他酯類、 甲苯、二甲苯等芳香族烴類、 N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯啶酮等醯胺或內醯胺類 等。Examples of the solvent include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, and diethyl ether. Glycol monoethyl ether, diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol Mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether An alkyl lactate such as a polyalkylene glycol monoalkyl ether, methyl lactate or ethyl lactate, methanol, ethanol, propanol, butanol, isopropanol, isobutanol, butanol, (cyclo)alkyl alcohols such as octanol, 2-ethylhexanol and cyclohexanol, ketone alcohols such as diacetone alcohol, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, Ethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, dipropylene glycol monomethyl ether acetate, 3-methyl (poly)alkylene glycol monoalkyl ether acetates such as butyl acetate, 3-methyl-3-methoxybutyl acetate, diethylene glycol dimethyl ether, diethylene glycol Ketones such as ethyl ether, diethylene glycol diethyl ether, tetrahydrofuran and other ethers, methyl ketone, 2-heptanone, 3-heptanone, etc., ketones such as cyclopentanone and cyclohexanone , diacetate such as propylene glycol diacetate, 1,3-butanediol diacetate, 1,6-hexanediol diacetate, methyl 3-methoxypropionate, 3-methoxy An alkane such as ethyl propyl propionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate or 3-methyl-3-methoxybutylpropionate Oxycarboxylic acid esters, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl formate, isoamyl acetate, n-butyl propionate, butyrate B Ester, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl acetate, ethyl acetate, 2- Other esters such as ethyl oxobutanoate, aromatic hydrocarbons such as toluene and xylene, N,N-dimethyl Amides, N, N- dimethylacetamide, N- methylpyrrolidinone, etc. Amides or Lactams amines.
該組成物中的溶媒的含量並無特別限定。作為該組成物中的固體成分濃度(除了溶媒以外的各成分的合計濃度)的下限,較佳為5質量%,更佳為10質量%。另一方面,作為所述固體成分濃度的上限,較佳為50質量%,更佳為40質量%。藉由將固體成分濃度設為所述範圍內,分散性、穩定性、塗佈性等變得更良好。The content of the solvent in the composition is not particularly limited. The lower limit of the solid content concentration (the total concentration of each component other than the solvent) in the composition is preferably 5% by mass, and more preferably 10% by mass. On the other hand, the upper limit of the solid content concentration is preferably 50% by mass, and more preferably 40% by mass. When the solid content concentration is within the above range, dispersibility, stability, coatability, and the like are further improved.
(製備方法) 作為該組成物的製備方法,並無特別限定,可藉由將各成分混合而製備調整。例如,於該組成物包含作為[B]紅外線遮蔽劑的金屬氧化物、及[C]分散劑的情況下,可採用如下方法:首先製備含有[B]紅外線遮蔽劑、[C]分散劑及溶媒的分散液,於所述分散液中添加[A]酞菁化合物或其他成分並加以混合。分散液或該組成物亦可視需要實施過濾處理而去除凝聚物。(Preparation method) The preparation method of the composition is not particularly limited, and adjustment can be prepared by mixing the respective components. For example, in the case where the composition contains a metal oxide as the [B] infrared shielding agent and [C] a dispersing agent, the following method may be employed: first, a [B] infrared shielding agent, a [C] dispersing agent, and the like are prepared. A dispersion of a solvent is added to the dispersion and the [A] phthalocyanine compound or other components are added and mixed. The dispersion or the composition may also be subjected to a filtration treatment as needed to remove the agglomerates.
<紅外線遮蔽膜(I)> 本發明的一實施形態的紅外線遮蔽膜(I)是由該固體攝像元件用組成物形成的固體攝像元件用紅外線遮蔽膜。關於具有該紅外線遮蔽膜(I)的固體攝像元件用光學濾光片,即便於所含的有機色素的種類少的情況下,亦兼具良好的可見光穿透性與紅外線遮蔽性。另外,該紅外線遮蔽膜(I)的可見光區域的均勻穿透性優異。<Infrared Shielding Film (I)> The infrared ray shielding film (I) according to the embodiment of the present invention is an infrared ray shielding film for a solid-state imaging device formed of the composition for a solid-state imaging device. In the optical filter for a solid-state imaging device having the infrared ray shielding film (I), even when the type of the organic dye contained is small, both the visible light transmittance and the infrared ray shielding property are excellent. Further, the infrared shielding film (I) is excellent in uniform penetration in the visible light region.
該紅外線遮蔽膜(I)較佳為作為一構成構件而被組入至固體攝像元件中。該情況下,該紅外線遮蔽膜(I)以單體的形式作為光學濾光片(紅外線截止濾光片)發揮功能。藉由於固體攝像元件中組入該紅外線遮蔽膜(I),可獲得大的製程裕度等而較佳。於該紅外線遮蔽膜(I)被組入至固體攝像元件中的情況下,該紅外線遮蔽膜(I)例如可配置於固體攝像元件的微透鏡的外表面側、微透鏡與彩色濾光片之間、彩色濾光片與光電二極體之間等。該紅外線遮蔽膜(I)較佳為積層於微透鏡與彩色濾光片之間或彩色濾光片與光電二極體之間。The infrared shielding film (I) is preferably incorporated as a constituent member into the solid-state imaging device. In this case, the infrared shielding film (I) functions as an optical filter (infrared cut filter) in a single form. Since the infrared ray shielding film (I) is incorporated in the solid-state imaging device, a large process margin or the like can be obtained, which is preferable. When the infrared shielding film (I) is incorporated in the solid-state imaging device, the infrared shielding film (I) can be disposed, for example, on the outer surface side of the microlens of the solid-state imaging device, the microlens and the color filter. Between the color filter and the photodiode. The infrared shielding film (I) is preferably laminated between the microlens and the color filter or between the color filter and the photodiode.
作為所述光學濾光片,亦可為於透明基板的表面積層有該紅外線遮蔽膜(I)而成者。作為所述透明基板,可採用玻璃或透明樹脂等。作為所述透明樹脂,可列舉聚碳酸酯、聚酯、芳香族聚醯胺、聚醯胺醯亞胺、聚醯亞胺等。所述光學濾光片亦可作為固體攝像元件中的紅外線截止濾光片等而較佳地使用。The optical filter may be formed by laminating the infrared shielding film (I) on the surface area of the transparent substrate. As the transparent substrate, glass, a transparent resin, or the like can be used. Examples of the transparent resin include polycarbonate, polyester, aromatic polyamine, polyamidimide, and polyimine. The optical filter can also be preferably used as an infrared cut filter or the like in a solid-state image sensor.
具備所述光學濾光片的固體攝像元件於數位靜態照相機、行動電話用照相機、數位攝像機、個人電腦(Personal Computer,PC)照相機、監視照相機、汽車用照相機、可攜式資訊終端機、電腦、影像遊戲、醫療機器等中有用。A solid-state imaging device including the optical filter is a digital still camera, a mobile phone camera, a digital camera, a personal computer (PC) camera, a surveillance camera, a car camera, a portable information terminal, a computer, Useful for video games, medical equipment, etc.
該紅外線遮蔽膜(I)例如可藉由以下方法形成。首先,於支持體上塗佈該組成物後,進行預烘烤而使溶媒蒸發,從而形成塗膜。繼而,於對所述塗膜進行曝光後,使用顯影液進行顯影,並將塗膜的未曝光部溶解去除。其後,藉由進行後烘烤,可獲得經圖案化為規定形狀的紅外線遮蔽膜(I)。再者,於該組成物不含[D]聚合性化合物及[E]聚合起始劑的情況下,亦可不進行曝光等硬化處理。另外,亦可不進行顯影處理,該情況下,可形成未經圖案化的紅外線遮蔽膜(I)。The infrared shielding film (I) can be formed, for example, by the following method. First, after coating the composition on a support, prebaking is performed to evaporate the solvent to form a coating film. Then, after the coating film is exposed, development is carried out using a developing solution, and the unexposed portion of the coating film is dissolved and removed. Thereafter, by performing post-baking, an infrared shielding film (I) patterned into a predetermined shape can be obtained. In addition, when the composition does not contain the [D] polymerizable compound and the [E] polymerization initiator, the curing treatment such as exposure may not be performed. Further, development processing may not be performed, and in this case, an unpatterned infrared shielding film (I) may be formed.
作為塗佈該組成物的所述支持體,所述透明基板、微透鏡、彩色濾光片等適合。所述塗佈可採用噴霧法、輥塗法、旋轉塗佈法(旋塗法)、縫模塗佈法(狹縫塗佈法)、棒塗佈法等適宜的塗佈法。The transparent substrate, the microlens, the color filter, and the like are suitable as the support to which the composition is applied. The coating may be carried out by a suitable coating method such as a spray method, a roll coating method, a spin coating method (spin coating method), a slit die coating method (slit coating method), or a bar coating method.
作為所述預烘烤的加熱乾燥的條件,例如為70℃以上且110℃以下、1分鐘以上且10分鐘以下左右。The conditions for the heat drying of the prebaking are, for example, 70° C. or higher and 110° C. or lower, and 1 minute or longer and 10 minutes or shorter.
作為塗膜的曝光中使用的放射線的光源,例如可列舉:氙氣燈、鹵素燈、鎢燈、高壓水銀燈、超高壓水銀燈、金屬鹵素燈、中壓水銀燈、低壓水銀燈等燈光源或氬離子雷射、釔鋁石榴石(yttrium aluminum garnet,YAG)雷射、XeCl凖分子雷射、氮氣雷射等雷射光源等。作為曝光光源,亦可使用紫外線發光二極體(light emitting diode,LED)。波長較佳為190 nm以上且450 nm以下的範圍內的放射線。放射線的曝光量通常為10 J/m2 以上且50,000 J/m2 以下左右。Examples of the light source used for the exposure of the coating film include a xenon lamp, a halogen lamp, a tungsten lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a metal halide lamp, a medium pressure mercury lamp, a low pressure mercury lamp, or the like, or an argon ion laser. , yttrium aluminum garnet (YAG) laser, XeCl 凖 molecular laser, nitrogen laser and other laser sources. As the exposure light source, an ultraviolet light emitting diode (LED) can also be used. The wavelength is preferably a radiation in a range of 190 nm or more and 450 nm or less. The exposure amount of the radiation is usually about 10 J/m 2 or more and about 50,000 J/m 2 or less.
作為所述顯影液,通常為鹼性顯影液。作為鹼性顯影液,例如較佳為碳酸鈉、碳酸氫鈉、氫氧化鈉、氫氧化鉀、四甲基氫氧化銨、膽鹼、1,8-二氮雜雙環-[5.4.0]-7-十一烯、1,5-二氮雜雙環-[4.3.0]-5-壬烯等的水溶液。於鹼性顯影液中例如亦可添加適量的甲醇、乙醇等水溶性有機溶媒或界面活性劑等。再者,顯影後通常進行水洗。As the developer, it is usually an alkaline developer. As the alkaline developing solution, for example, sodium carbonate, sodium hydrogencarbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline or 1,8-diazabicyclo-[5.4.0]- is preferable. An aqueous solution of 7-undecene or 1,5-diazabicyclo-[4.3.0]-5-nonene. For example, an appropriate amount of a water-soluble organic solvent such as methanol or ethanol or a surfactant may be added to the alkaline developing solution. Further, it is usually washed with water after development.
作為顯影處理法,可應用噴淋顯影法、噴霧顯影法、浸漬(dip)顯影法、覆液(puddle)顯影法等。顯影條件於常溫下為5秒以上且300秒以下左右。As the development treatment method, a shower development method, a spray development method, a dip development method, a puddle development method, or the like can be applied. The development conditions are about 5 seconds or more and 300 seconds or less at normal temperature.
作為後烘烤的條件,通常為180℃以上且280℃以下、1分鐘以上且60分鐘以下左右。The conditions for the post-baking are usually 180° C. or higher and 280° C. or lower, and 1 minute or longer and 60 minutes or shorter.
作為以所述方式形成的紅外線遮蔽膜(I)的平均膜厚的下限,通常為0.5 μm,較佳為1 μm。另一方面,作為所述平均膜厚的上限,通常為5 μm,較佳為3 μm。藉由紅外線遮蔽膜(I)的平均膜厚為所述範圍內,可見光穿透性與紅外線遮蔽性的平衡變得更良好。另外,紅外線遮蔽膜(I)的較佳的可見光穿透率及紅外線穿透率可應用後述紅外線遮蔽膜(II)的範圍。The lower limit of the average film thickness of the infrared ray shielding film (I) formed as described above is usually 0.5 μm, preferably 1 μm. On the other hand, the upper limit of the average film thickness is usually 5 μm, preferably 3 μm. When the average film thickness of the infrared ray shielding film (I) is within the above range, the balance between the visible light transmittance and the infrared ray shielding property is further improved. Further, the preferred visible light transmittance and infrared transmittance of the infrared ray shielding film (I) can be applied to the range of the infrared shielding film (II) to be described later.
<紅外線遮蔽膜(II)> 本發明的一實施形態的紅外線遮蔽膜(II)為一種固體攝像元件用紅外線遮蔽膜,其實質上含有僅一種或兩種有機色素,且滿足下述(A)~(C)。 (A)波長430 nm以上且580 nm以下的範圍內的穿透率的平均值為75%以上 (B)波長700 nm且900 nm以下的範圍內的穿透率的平均值為16.5%以下 (C)波長1200 nm下的穿透率為10%以下<Infrared Masking Film (II)> The infrared shielding film (II) according to one embodiment of the present invention is an infrared shielding film for a solid-state imaging device, which substantially contains only one or two kinds of organic dyes, and satisfies the following (A) ~ (C). (A) The average value of the transmittance in the range of 430 nm or more and 580 nm or less is 75% or more (B) The average value of the transmittance in the range of 700 nm and 900 nm or less is 16.5% or less ( C) The transmittance at a wavelength of 1200 nm is 10% or less
具備該紅外線遮蔽膜(II)的固體攝像元件用光學濾光片兼具良好的可見光穿透性與紅外線遮蔽性。另外,該紅外線遮蔽膜(II)實質上僅含有一種或兩種有機色素,因此容易製備,生產性高。此處,所謂「實質上含有僅一種或兩種有機色素」是指一種或兩種有機色素於所含的全部有機色素中所佔的含有比例為90質量%以上。所述含有比例較佳為99質量%以上,更佳為99.9質量%以上。該紅外線遮蔽膜(II)較佳為實質上僅含有一種有機色素。The optical filter for a solid-state imaging device including the infrared shielding film (II) has both good visible light transmittance and infrared shielding properties. Further, since the infrared shielding film (II) contains substantially only one or two kinds of organic dyes, it is easy to prepare and has high productivity. Here, "substantially containing only one or two kinds of organic dyes" means that the content ratio of one or two types of organic dyes in all the organic dyes contained is 90% by mass or more. The content ratio is preferably 99% by mass or more, and more preferably 99.9% by mass or more. The infrared shielding film (II) preferably contains substantially only one organic coloring matter.
具有該紅外線遮蔽膜(II)的光學濾光片的形態、即該紅外線遮蔽膜(II)的使用形態與所述紅外線遮蔽膜(I)相同。The form of the optical filter having the infrared ray shielding film (II), that is, the use form of the infrared ray shielding film (II) is the same as that of the infrared ray shielding film (I).
(A)波長430 nm以上且580 nm以下的範圍內的穿透率的平均值的下限為75%,較佳為78%,更佳為80%。藉由所述穿透率的平均值為所述下限以上,可發揮良好的可見光穿透性。另一方面,作為所述穿透率的平均值的上限,例如可為95%,亦可為90%,亦可為85%。(A) The lower limit of the average value of the transmittance in the range of 430 nm or more and 580 nm or less is 75%, preferably 78%, more preferably 80%. When the average value of the transmittance is equal to or higher than the lower limit, good visible light transmittance can be exhibited. On the other hand, the upper limit of the average value of the transmittance may be, for example, 95%, 90% or 85%.
(B)波長700 nm且900 nm以下的範圍內的穿透率的平均值的上限為16.5%,較佳為16%,更佳為15.5%,進而佳為15%,有時亦進而佳為14%。藉由所述穿透率的平均值為所述上限以下,可發揮近紅外線的良好的遮蔽性。另一方面,作為所述平均值的下限,例如可為5%,亦可為10%,亦可為12%。(B) The upper limit of the average value of the transmittance in the range of 700 nm and 900 nm or less is 16.5%, preferably 16%, more preferably 15.5%, further preferably 15%, and sometimes even better. 14%. When the average value of the transmittance is equal to or less than the upper limit, good shielding properties of near-infrared rays can be exhibited. On the other hand, the lower limit of the average value may be, for example, 5%, may be 10%, or may be 12%.
作為波長430 nm以上且580 nm以下的範圍內的穿透率的平均值(S)相對於波長700 nm且900 nm以下的範圍內的穿透率的平均值(N)的比(S/N比)的下限,較佳為5,更佳為5.2。另一方面,作為所述比的上限,可為10,亦可為8,亦可為6.5。The ratio of the average value (S) of the transmittance in the range of 430 nm or more and 580 nm or less to the average value (N) of the transmittance in the range of 700 nm and 900 nm or less (S/N) The lower limit of the ratio is preferably 5, more preferably 5.2. On the other hand, the upper limit of the ratio may be 10 or 8 or 6.5.
(C)波長1200 nm下的穿透率的上限為10%,較佳為8%,更佳為7%,進而佳為6.1%。藉由所述穿透率為所述上限以下,可發揮良好的紅外線遮蔽性。另一方面,作為所述穿透率的下限,例如可為3%,亦可為5%,亦可為5.5%。(C) The upper limit of the transmittance at a wavelength of 1200 nm is 10%, preferably 8%, more preferably 7%, and still more preferably 6.1%. When the transmittance is equal to or less than the upper limit, good infrared shielding properties can be exhibited. On the other hand, the lower limit of the transmittance may be, for example, 3%, 5% or 5.5%.
於該紅外線遮蔽膜(II)中,較佳為滿足下述(D)。 (D)下述式所表示的可見光均勻穿透率為10%以下 所述可見光均勻穿透率的上限更佳為9%,進而佳為8%。藉由可見光均勻穿透率為所述上限以下,可實現可見光的穿透性的均勻化,可進行更良好的視敏度修正等。再者,作為所述可見光均勻穿透率的下限,並無特別限定,例如可為1%,亦可為3%,亦可為5%。In the infrared shielding film (II), it is preferable to satisfy the following (D). (D) The visible light uniform transmittance represented by the following formula is 10% or less The upper limit of the visible light uniform transmittance is more preferably 9%, and still more preferably 8%. When the visible light uniform transmittance is equal to or less than the upper limit, uniformity of visible light transmittance can be achieved, and better visual sensitivity correction or the like can be performed. Further, the lower limit of the uniform transmittance of visible light is not particularly limited, and may be, for example, 1%, 3%, or 5%.
可見光均勻穿透率={(波長430 nm以上且580 nm以下的範圍內的穿透率的平均值-波長430 nm以上且580 nm以下的範圍內的穿透率的最低值)/波長430 nm以上且580 nm以下的範圍內的穿透率的平均值}×100(%)Uniform visible light transmittance = {(average of transmittance in the range of 430 nm or more and 580 nm or less - the lowest value of the transmittance in the range of 430 nm or more and 580 nm or less) / wavelength 430 nm The average value of the transmittance above and below 580 nm} × 100 (%)
該紅外線遮蔽膜(II)例如可藉由作為所述本發明的一實施形態的固體攝像元件用組成物而形成。該紅外線遮蔽膜(II)的形成方法亦與作為紅外線遮蔽膜(I)的形成方法而敘述的方法相同。其中,於所使用的該組成物中,實質上含有僅一種或兩種有機色素,至少[A]酞菁化合物相當於有機色素。即,於該紅外線遮蔽膜(II)中,所述有機色素較佳為所述式(1)所表示的酞菁化合物([A]酞菁化合物)。The infrared shielding film (II) can be formed, for example, as a composition for a solid-state imaging device according to an embodiment of the present invention. The method of forming the infrared shielding film (II) is also the same as the method described as the method of forming the infrared shielding film (I). Among them, the composition to be used contains substantially one or two organic dyes, and at least the [A] phthalocyanine compound corresponds to an organic dye. In the infrared shielding film (II), the organic dye is preferably a phthalocyanine compound represented by the above formula (1) ([A] phthalocyanine compound).
用以形成該紅外線遮蔽膜(II)的固體攝像元件用組成物的較佳形態亦為如所述該固體攝像元件用組成物所述。即,該紅外線遮蔽膜(II)較佳為進而含有紅外線遮蔽劑([B]紅外線遮蔽劑),所述紅外線遮蔽劑為金屬氧化物、銅化合物或者該些的組合。另外,[B]紅外線遮蔽劑較佳為氧化鎢銫。該紅外線遮蔽膜(II)的其他較佳的形態亦與由該固體攝像元件用組成物形成的紅外線遮蔽膜(I)相同。A preferred embodiment of the composition for a solid-state imaging device for forming the infrared ray shielding film (II) is as described above for the composition for a solid-state imaging device. That is, the infrared shielding film (II) preferably further contains an infrared shielding agent ([B] infrared shielding agent), and the infrared shielding agent is a metal oxide, a copper compound, or a combination thereof. Further, the [B] infrared shielding agent is preferably tungsten oxide. The other preferred embodiment of the infrared shielding film (II) is also the same as the infrared shielding film (I) formed of the composition for a solid-state imaging device.
該紅外線遮蔽膜(II)較佳為包含具有交聯結構的聚合物。具有所述交聯結構的聚合物藉由所述[D]聚合性化合物、於側鏈具有聚合性不飽和鍵等聚合性基的聚合物等的聚合(交聯)反應而形成。即,包含具有交聯結構的聚合物的紅外線遮蔽膜(II)為包含[D]聚合性化合物等及[E]聚合起始劑的該組成物的硬化膜。所述紅外線遮蔽膜(II)藉由對該組成物的塗膜實施放射線的照射或加熱等硬化處理而獲得。所述紅外線遮蔽膜(II)例如與熔融成形的膜狀者相比可發揮良好的硬度或耐熱性等。另外,所述紅外線遮蔽膜(II)亦具有如下優點:可作為經由遮罩等進行圖案化的任意形狀的硬化膜而較容易地獲得。The infrared shielding film (II) preferably contains a polymer having a crosslinked structure. The polymer having the crosslinked structure is formed by a polymerization (crosslinking) reaction of the [D] polymerizable compound or a polymer having a polymerizable group such as a polymerizable unsaturated bond in a side chain. In other words, the infrared shielding film (II) containing a polymer having a crosslinked structure is a cured film of the composition containing [D] a polymerizable compound or the like and [E] a polymerization initiator. The infrared shielding film (II) is obtained by subjecting the coating film of the composition to radiation treatment such as irradiation or heating. The infrared shielding film (II) can exhibit good hardness, heat resistance, and the like, for example, compared with a melt-molded film. Further, the infrared shielding film (II) also has an advantage that it can be easily obtained as a cured film of any shape patterned through a mask or the like.
<固體攝像元件> 本發明的一實施形態的固體攝像元件是具有該紅外線遮蔽膜(I)或該紅外線遮蔽膜(II)的固體攝像元件。關於該固體攝像元件,即便於所含的有機色素的種類少的情況下,亦具有兼具良好的可見光穿透性與紅外線遮蔽性的紅外線遮蔽膜,因此進行了良好的視敏度修正。<Solid-State Imaging Device> The solid-state imaging device according to the embodiment of the present invention is a solid-state imaging device including the infrared shielding film (I) or the infrared shielding film (II). In the case of the solid-state imaging device, even when the type of the organic dye contained is small, the infrared shielding film having both good visible light transmittance and infrared shielding property is provided. Therefore, good visibility sensitivity correction is performed.
該固體攝像元件通常具有配置有多個光電二極體的層、彩色濾光片及微透鏡依次積層而成的結構。另外,亦可於該些層間設置平坦化層。於該固體攝像元件中自微透鏡側入射光。入射光穿透微透鏡及彩色濾光片而到達光電二極體。再者,關於彩色濾光片,例如於R(紅)、G(綠)及B(藍)的濾光片各自中,以僅特定的波長範圍的光穿透的方式構成。The solid-state imaging device generally has a structure in which a layer in which a plurality of photodiodes are arranged, a color filter, and microlenses are laminated in this order. In addition, a planarization layer may be provided between the layers. Light is incident from the microlens side in the solid-state imaging element. The incident light penetrates the microlens and the color filter to reach the photodiode. Further, in the color filter, for example, each of the filters of R (red), G (green), and B (blue) is configured to penetrate light of only a specific wavelength range.
於該固體攝像元件中,該紅外線遮蔽膜(I)或該紅外線遮蔽膜(II)可設置於所述微透鏡的外表面側、所述微透鏡與所述彩色濾光片之間、所述彩色濾光片與所述配置有多個光電二極體的層之間等。該紅外線遮蔽膜(I)或該紅外線遮蔽膜(II)較佳為積層於微透鏡與彩色濾光片之間或彩色濾光片與光電二極體之間。再者,於該紅外線遮蔽膜(I)或該紅外線遮蔽膜(II)與微透鏡、彩色濾光片、光電二極體等之間亦可進一步設置其他層(平坦化層等)。In the solid-state imaging device, the infrared shielding film (I) or the infrared shielding film (II) may be disposed on an outer surface side of the microlens, between the microlens and the color filter, The color filter is interposed between the layer in which the plurality of photodiodes are disposed, and the like. The infrared shielding film (I) or the infrared shielding film (II) is preferably laminated between the microlens and the color filter or between the color filter and the photodiode. Further, another layer (a planarization layer or the like) may be further provided between the infrared shielding film (I) or the infrared shielding film (II) and a microlens, a color filter, a photodiode or the like.
作為該固體攝像元件的具體例,可列舉作為照相機模組的CCD或CMOS等。該固體攝像元件於數位靜態照相機、行動電話用照相機、數位攝像機、PC照相機、監視照相機、汽車用照相機、可攜式資訊終端機、電腦、影像遊戲、醫療機器等中有用。 [實施例]Specific examples of the solid-state imaging device include a CCD, a CMOS, and the like as a camera module. The solid-state imaging device is useful for a digital still camera, a mobile phone camera, a digital camera, a PC camera, a surveillance camera, a car camera, a portable information terminal, a computer, a video game, a medical device, and the like. [Examples]
以下,基於實施例對本發明加以具體說明,但本發明並不限定於該些實施例。Hereinafter, the present invention will be specifically described based on examples, but the present invention is not limited to the examples.
<合成例1> 根據所述流程1合成下述式所表示的酞菁化合物(A-1)(極大吸收波長735 nm)。作為起始原料,使用1,2-二氰基-3,6-二(4-甲氧基丁基)苯。作為「1.鹼(base)」,使用戊醇鋰(固體鋰及戊烷-1-醇),作為「2.酸(acid)」,使用冰乙酸。另外,作為提供M2+ 的鹽,使用氧釩鹽。<Synthesis Example 1> A phthalocyanine compound (A-1) represented by the following formula (maximum absorption wavelength: 735 nm) was synthesized according to the above Scheme 1. As a starting material, 1,2-dicyano-3,6-bis(4-methoxybutyl)benzene was used. As the "1. base", lithium pentaerythritol (solid lithium and pentane-1-ol) was used, and as "2. Acid", glacial acetic acid was used. Further, as a salt which provides M 2+ , a vanadyl salt is used.
[化4] [Chemical 4]
<合成例2> 使用日本專利特開平05-25177的段落[0020]~段落[0025](實施例1)中記載的方法,合成下述式所表示的酞菁化合物(a-1)(極大吸收波長692 nm)。<Synthesis Example 2> The phthalocyanine compound (a-1) represented by the following formula was synthesized by the method described in paragraphs [0020] to [0025] (Example 1) of JP-A-2005-25177 (maximum) Absorption wavelength 692 nm).
[化5] [Chemical 5]
<合成例3> 使用日本專利特開2016-204536號公報的段落[0075](實施例4)中記載的方法,合成下述式所表示的酞菁化合物(a-2)(極大吸收波長728 nm)。<Synthesis Example 3> The phthalocyanine compound (a-2) represented by the following formula was synthesized by the method described in the paragraph [0075] (Example 4) of JP-A-2016-204536 (maximum absorption wavelength 728) Nm).
[化6] [Chemical 6]
除此以外,所使用的色素為如下所述。 ·化合物(a-3):山田化學工業公司的「FDN-002」(酞菁化合物:極大吸收波長807 nm)Other than this, the coloring matter used is as follows. ·Compound (a-3): "FDN-002" of Yamada Chemical Industry Co., Ltd. (phthalocyanine compound: maximum absorption wavelength 807 nm)
<合成例4> 使用日本專利第4096205號公報的段落[0113]中記載的方法,合成氧化鎢銫(Cs0.33 WO3 )粉末。<Synthesis Example 4> A tungsten ruthenium oxide (Cs 0.33 WO 3 ) powder was synthesized by the method described in paragraph [0113] of Japanese Patent No. 4096205.
[製備例] 準備所述氧化鎢銫25.00質量份、作為分散劑的畢克化學(BYK-Chemie)公司的「畢克(BYK)-LPM6919」(固體成分濃度61質量%、胺價120 mgKOH/g)13.11質量份、以及作為溶媒(分散介質)的環戊酮(cyclopentanone,CPN)61.89質量份。將該些與0.1 mm徑的氧化鋯顆粒2000質量份一起填充於容器中,利用塗料振盪器進行分散,藉此獲得平均粒徑(D50)為19 nm的分散液。再者,平均粒徑是使用光散射測定裝置(德國ALV公司的「ALV-5000」)並利用動態光散射(dynamic light Scattering,DLS)法來測定。[Preparation Example] 25.00 parts by mass of the tungsten oxide crucible and "BYK-LPM6919" of BYK-Chemie Co., Ltd. as a dispersing agent (solid content concentration 61% by mass, amine price 120 mgKOH/) g) 13.11 parts by mass and 61.89 parts by mass of cyclopentanone (CPN) as a solvent (dispersion medium). These were filled in a container together with 2000 parts by mass of zirconium oxide particles having a diameter of 0.1 mm, and dispersed by a coating shaker, whereby a dispersion having an average particle diameter (D50) of 19 nm was obtained. Further, the average particle diameter was measured by a light scattering measuring device ("ALV-5000" from ALV, Germany) by a dynamic light scattering (DLS) method.
[實施例1] 於容器中量取所述分散液50.00質量份、酞菁化合物(A-1)0.75質量份、作為聚合性化合物的日本化藥公司的「卡亞拉得(KAYARAD)DPHA」(二季戊四醇六丙烯酸酯與二季戊四醇五丙烯酸酯的混合物)7.01質量份、作為聚合起始劑的艾迪科(ADEKA)公司的「NCI-930」(O-乙醯基肟系化合物)0.70質量份、作為界面活性劑的奈奧斯(NEOS)公司的「FTX-218D」(氟系界面活性劑)0.02質量份、作為抗氧化劑的巴斯夫公司的「易璐諾斯(Irganox)1010」(酚系抗氧化劑)0.01質量份、以及作為溶媒的環戊酮(CNP)41.50質量份,利用攪拌機進行混合。使用0.5 μm的聚四氟乙烯(Polytetrafluoroethylene,PTFE)製過濾器於0.5 MPa下對所述混合物200 mL進行3分鐘加壓過濾,藉此獲得實施例1的組成物。[Example 1] 50.00 parts by mass of the dispersion and 0.75 parts by mass of the phthalocyanine compound (A-1) and the "KAYARAD DPHA" of the Japanese chemical company as a polymerizable compound were weighed in a container. (mixture of dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate) 7.01 parts by mass of "NCI-930" (O-acetamido oxime compound) of the ADEKA company as a polymerization initiator 0.70 mass 0.02 parts by mass of "FTX-218D" (fluorine-based surfactant) of NEOS Co., Ltd. as a surfactant, and "Irganox 1010" (phenol) of BASF Corporation as an antioxidant 0.01 parts by mass of the antioxidant) and 41.50 parts by mass of cyclopentanone (CNP) as a solvent were mixed by a stirrer. The mixture of Example 1 was obtained by pressure-filtering 200 mL of the mixture at 0.5 MPa for 3 minutes using a 0.5 μm polytetrafluoroethylene (PTFE) filter.
[實施例2~實施例3、比較例1~比較例3] 除了將各成分的組成設為表1所示以外,與實施例1同樣地獲得實施例2~實施例3及比較例1~比較例3的各組成物。[Examples 2 to 3, Comparative Example 1 to Comparative Example 3] Examples 2 to 3 and Comparative Example 1 were obtained in the same manner as in Example 1 except that the composition of each component was as shown in Table 1. Each composition of Comparative Example 3 was used.
[評價] 使用所得的各組成物,進行以下的評價。將評價結果示於表1中。[Evaluation] The following evaluations were carried out using each of the obtained compositions. The evaluation results are shown in Table 1.
於玻璃基板上以成為規定膜厚的方式利用旋塗法塗佈各組成物。其後,於100℃下對塗膜進行120秒加熱,利用i射線步進機以成為1000 mJ/cm2 的方式進行曝光。繼而,藉由於220℃下進行300秒加熱,而於玻璃基板上製作平均膜厚1.4 μm~1.6 μm的紅外線遮蔽膜。將各平均膜厚示於表1中。再者,利用觸針式階差計(大和科學公司的「α步進(Step)IQ」)測定膜厚。其次,使用分光光度計(日本分光公司的「V-7300」),以玻璃基板對比測定所述玻璃基板上製作的紅外線遮蔽膜的各波長區域中的穿透率。根據所得的光譜,藉由以下所述的評價基準進行評價。再者,將實施例1的紅外線遮蔽膜的穿透光譜示於圖1中。再者,於圖1的穿透光譜中,橫軸為波長(nm),縱軸為穿透率(%)。Each composition was applied by a spin coating method so as to have a predetermined film thickness on a glass substrate. Thereafter, the coating film was heated at 100 ° C for 120 seconds, and exposed to 1000 mJ/cm 2 by an i-ray stepper. Then, an infrared shielding film having an average film thickness of 1.4 μm to 1.6 μm was formed on the glass substrate by heating at 220 ° C for 300 seconds. The average film thickness is shown in Table 1. Further, the film thickness was measured by a stylus type step meter ("α step (Step) IQ" of Daiwa Scientific Co., Ltd.). Next, the transmittance in each wavelength region of the infrared shielding film produced on the glass substrate was measured by a glass substrate using a spectrophotometer ("V-7300" of JASCO Corporation). Based on the obtained spectrum, evaluation was performed by the evaluation criteria described below. In addition, the penetration spectrum of the infrared shielding film of Example 1 is shown in FIG. Further, in the penetration spectrum of Fig. 1, the horizontal axis represents the wavelength (nm), and the vertical axis represents the transmittance (%).
(可見光穿透性) 計算出430 nm-580 nm的平均穿透率。於平均穿透率未滿70%的情況下,作為紅外線遮蔽膜來使用時的感度下降。另外,關於所述平均穿透率,利用以下基準進行評價。 A:80%以上 B:70%以上且未滿80% C:未滿70%(Visible light transmittance) The average transmittance at 430 nm to 580 nm was calculated. When the average transmittance is less than 70%, the sensitivity when used as an infrared shielding film is lowered. Further, regarding the average transmittance, the evaluation was performed using the following criteria. A: 80% or more B: 70% or more and less than 80% C: less than 70%
(紅外線遮蔽性1) 計算出700 nm-900 nm的平均穿透率。於平均穿透率為20%以上的情況下,作為紅外線遮蔽膜來使用時雜訊量增大。另外,關於所述平均穿透率,利用以下基準進行評價。 A:未滿15% B:15%以上且未滿20% C:20%以上(Infrared shielding property 1) The average transmittance from 700 nm to 900 nm was calculated. When the average transmittance is 20% or more, the amount of noise increases when used as an infrared shielding film. Further, regarding the average transmittance, the evaluation was performed using the following criteria. A: less than 15% B: 15% or more and less than 20% C: 20% or more
(紅外線遮蔽性2) 關於波長1200 nm的穿透率,可以說穿透性未滿15%且顯示出實用上良好的紅外線遮蔽性。關於波長1200 nm的穿透率,利用以下基準進行評價。 A:未滿10% B:10%以上且未滿15% C:15%以上(Infrared ray shielding property 2) Regarding the transmittance at a wavelength of 1200 nm, it can be said that the penetration property is less than 15% and it exhibits practically good infrared shielding properties. Regarding the transmittance at a wavelength of 1200 nm, the evaluation was performed using the following criteria. A: less than 10% B: 10% or more and less than 15% C: 15% or more
(S/N比) 獲取所述可見光區域(430 nm-580 nm)的平均穿透率(S)與紅外區域(700 nm-900 nm)的平均穿透率(N)的比(S/N比),對實用性能進行推測。S/N比的數值越高,性能越良好,於為5以上的情況下,判斷為實用水準而可使用。關於S/N比,利用以下基準進行評價。 A:5以上 B:未滿5(S/N ratio) Obtain the ratio of the average transmittance (S) of the visible light region (430 nm to 580 nm) to the average transmittance (N) of the infrared region (700 nm to 900 nm) (S/N) Ratio), speculation on practical performance. The higher the value of the S/N ratio, the better the performance, and when it is 5 or more, it is judged to be a practical level and can be used. Regarding the S/N ratio, the evaluation was performed using the following criteria. A: 5 or more B: Less than 5
(可見光均勻穿透性) 根據所述可見光區域(430 nm-580 nm)的平均穿透率(S)與所述可見光區域的最低穿透率(Smin ),基於下述式,求出X(可見光均勻穿透率),評價可見光的均勻穿透性。 X=((S-Smin )/S)×100(%) 可判斷所述X越小,可見光的均勻穿透性越高。關於所述X,利用以下基準進行評價。 A:未滿10% B:10%以上(Visible visible light transmittance) According to the average transmittance (S) of the visible light region (430 nm - 580 nm) and the lowest transmittance (S min ) of the visible light region, X is obtained based on the following formula (Visible visible transmittance), evaluating the uniform penetration of visible light. X = ((SS min ) / S) × 100 (%) It can be judged that the smaller the X, the higher the uniform penetration of visible light. Regarding the X, the evaluation was performed using the following criteria. A: less than 10% B: 10% or more
[表1]
如所述表1所示般,實施例1~實施例3的紅外線遮蔽膜的可見光穿透性與紅外線遮蔽性均良好(A或B),且可見光的均勻穿透性亦優異。另外,關於實施例1~實施例3的紅外線遮蔽膜,可知雖然有機色素的含有種僅為一種或兩種,但可顯現出所述良好的特性。 [產業上之可利用性]As shown in Table 1, the infrared shielding films of Examples 1 to 3 were excellent in visible light transmittance and infrared shielding properties (A or B), and were excellent in uniform transmittance of visible light. Further, in the infrared shielding films of Examples 1 to 3, it is understood that the organic dye is only one type or two types, but the above-described excellent characteristics can be exhibited. [Industrial availability]
本發明的固體攝像元件用組成物可較佳地用作固體攝像元件的光學濾光片、更具體而言紅外線濾光片等的形成材料。The composition for a solid-state image sensor of the present invention can be preferably used as a material for forming an optical filter of a solid-state image sensor, more specifically, an infrared filter or the like.
無no
圖1是實施例1的紅外線遮蔽膜的穿透光譜。1 is a transmission spectrum of an infrared shielding film of Example 1.
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