TWI746822B - Composition for solid-state imaging device, infrared shielding film, and solid-state imaging device - Google Patents

Composition for solid-state imaging device, infrared shielding film, and solid-state imaging device Download PDF

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TWI746822B
TWI746822B TW107109232A TW107109232A TWI746822B TW I746822 B TWI746822 B TW I746822B TW 107109232 A TW107109232 A TW 107109232A TW 107109232 A TW107109232 A TW 107109232A TW I746822 B TWI746822 B TW I746822B
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畠山耕治
古川泰一
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日商Jsr股份有限公司
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
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    • C09B47/04Phthalocyanines abbreviation: Pc
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    • C09B47/00Porphines; Azaporphines
    • C09B47/04Phthalocyanines abbreviation: Pc
    • C09B47/08Preparation from other phthalocyanine compounds, e.g. cobaltphthalocyanineamine complex
    • C09B47/085Preparation from other phthalocyanine compounds, e.g. cobaltphthalocyanineamine complex substituting the central metal atom
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Abstract

本發明提供一種即便於所含的有機色素的種類少的情況下,亦可形成兼具良好的可見光穿透性與紅外線遮蔽性的固體攝像元件用光學濾光片的固體攝像元件用組成物等。本發明是一種含有下述式(1)所表示的酞菁化合物的固體攝像元件用組成物。式(1)中,多個R分別獨立地為烷基或芳基。多個X分別獨立地為氫原子、鹵素原子或烷基。多個X亦可相互鍵結並與該些所鍵結的碳鏈一起形成芳香環。M為兩個氫原子、二價金屬原子或者三價或四價的金屬原子的衍生物。多個n分別獨立地為3~6的整數。

Figure 107109232-A0101-11-0001-1
The present invention provides a solid-state imaging device composition, etc., which can form an optical filter for a solid-state imaging device that has both good visible light transmittance and infrared shielding properties even when the types of organic pigments contained are small . The present invention is a composition for a solid-state imaging device containing a phthalocyanine compound represented by the following formula (1). In formula (1), a plurality of Rs are each independently an alkyl group or an aryl group. A plurality of Xs are each independently a hydrogen atom, a halogen atom, or an alkyl group. A plurality of Xs may also be bonded to each other and form an aromatic ring together with the bonded carbon chains. M is a derivative of two hydrogen atoms, a divalent metal atom, or a trivalent or tetravalent metal atom. A plurality of n is an integer of 3-6 each independently.
Figure 107109232-A0101-11-0001-1

Description

固體攝像元件用組成物、紅外線遮蔽膜及固體攝像元件Composition for solid-state imaging device, infrared shielding film, and solid-state imaging device

本發明是有關於一種固體攝像元件用組成物、紅外線遮蔽膜及固體攝像元件。 The present invention relates to a composition for a solid-state imaging device, an infrared shielding film, and a solid-state imaging device.

於攝像機、數位相機、帶相機功能的行動電話等中搭載有電荷耦合元件(Charge-Coupled Device,CCD)影像感測器或互補金屬氧化物半導體(Complementary metal oxide semiconductor,CMOS)影像感測器等固體攝像元件。該些固體攝像元件中具備的光電二極體的感度跨越可見光區域至紅外線區域。因此,於固體攝像元件中,設置有用以遮斷紅外線的濾光片。藉由所述紅外線遮斷濾光片,可以接近人類的視敏度的方式修正固體攝像元件的感度。 Charge-Coupled Device (CCD) image sensors or Complementary Metal Oxide Semiconductor (CMOS) image sensors are installed in video cameras, digital cameras, mobile phones with camera functions, etc. Solid-state imaging element. The sensitivity of the photodiodes included in these solid-state imaging elements spans from the visible light region to the infrared region. Therefore, a solid-state imaging element is provided with a filter to block infrared rays. With the infrared blocking filter, the sensitivity of the solid-state imaging device can be corrected in a manner close to the visual acuity of human beings.

於所述紅外線遮斷濾光片中含有作為紅外線遮蔽劑的色素或顏料。對所述紅外線遮蔽劑要求使可見光充分穿透且吸收紅外線的特性。作為所述紅外線遮蔽劑之一、尤其是近紅外線的良好的遮蔽劑,研究了使用酞菁化合物(參照日本專利特開2008-201952號公報)。 The infrared shielding filter contains a dye or pigment as an infrared shielding agent. The infrared shielding agent is required to fully penetrate visible light and absorb infrared light. As one of the infrared shielding agents, especially a good shielding agent for near-infrared rays, the use of a phthalocyanine compound has been studied (see Japanese Patent Laid-Open No. 2008-201952).

但是,於使用了酞菁化合物的先前的紅外線遮斷濾光片 中,並未充分滿足可見光穿透性與紅外線遮蔽性。因此,為了發揮良好的所述特性,例如有時亦混合使用多種紅外線遮蔽劑。所述多種紅外線遮蔽劑的使用亦成為引起成本高等、生產性下降的主要原因。另外,於使用了酞菁化合物的先前的紅外線遮斷濾光片中,有時於可見光區域中其穿透性的偏差大。於該情況下,亦未進行良好的視敏度修正。 However, compared with the previous infrared blocking filter using phthalocyanine compound Among them, the visible light penetration and infrared shielding properties are not sufficiently satisfied. Therefore, in order to exhibit good characteristics, for example, a plurality of infrared shielding agents may be mixed and used. The use of the various infrared shielding agents has also become the main cause of high cost and reduced productivity. In addition, in the conventional infrared shielding filter using a phthalocyanine compound, there may be a large deviation in the transmittance in the visible light region. In this case, good visual acuity correction has not been carried out either.

[現有技術文獻] [Prior Art Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2008-201952號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2008-201952

但是,於使用了酞菁化合物的先前的固體攝像元件用紅外線遮斷濾光片中,並未充分滿足可見光穿透性與紅外線遮蔽性。因此,為了發揮良好的所述特性,例如有時亦混合使用多種紅外線遮蔽劑。所述多種紅外線遮蔽劑的使用亦成為引起成本高等、生產性下降的主要原因。另外,於使用了酞菁化合物的先前的紅外線遮斷濾光片中,有時於可見光區域中其穿透性的偏差大。於該情況下,亦未進行良好的視敏度修正。 However, in the conventional infrared shielding filter for solid-state imaging devices using a phthalocyanine compound, the visible light transmittance and infrared shielding properties are not sufficiently satisfied. Therefore, in order to exhibit good characteristics, for example, a plurality of infrared shielding agents may be mixed and used. The use of the various infrared shielding agents has also become the main cause of high cost and reduced productivity. In addition, in the conventional infrared shielding filter using a phthalocyanine compound, there may be a large deviation in the transmittance in the visible light region. In this case, good visual acuity correction has not been carried out either.

本發明是鑒於所述情況而成,其目的在於提供一種固體攝像元件用組成物、固體攝像元件用紅外線遮蔽膜、以及具有所述紅外線遮蔽膜的固體攝像元件,所述固體攝像元件用組成物即便於所含的有機色素的種類少的情況下,亦可形成兼具良好的可 見光穿透性與紅外線遮蔽性的固體攝像元件用光學濾光片,所述固體攝像元件用紅外線遮蔽膜即便於所含的有機色素的種類少的情況下,亦兼具良好的可見光穿透性與紅外線遮蔽性。 The present invention is made in view of the foregoing circumstances, and its object is to provide a composition for a solid-state imaging device, an infrared shielding film for a solid-state imaging device, and a solid-state imaging device having the infrared shielding film, and the composition for a solid-state imaging device Even when the types of organic pigments contained are small, it can also form a good Optical filters for solid-state imaging devices with visible light transmittance and infrared shielding properties. The infrared-shielding film for solid-state imaging devices has good visible light penetration even when the types of organic pigments contained are small And infrared shielding.

為了解決所述課題而完成的發明是一種固體攝像元件用組成物,其含有由下述式(1)所表示的酞菁化合物(以下,亦稱為「[A]酞菁化合物」)。 The invention completed in order to solve the above-mentioned problem is a composition for a solid-state imaging device containing a phthalocyanine compound represented by the following formula (1) (hereinafter, also referred to as "[A] phthalocyanine compound").

Figure 107109232-A0305-02-0005-1
Figure 107109232-A0305-02-0005-1

(式(1)中,多個R分別獨立地為烷基或芳基。多個X分別獨立地為氫原子、鹵素原子或烷基。多個X亦可相互鍵結並與該些所鍵結的碳鏈一起形成芳香環。M為兩個氫原子、二價金屬 原子或者三價或四價的金屬原子的衍生物。多個n分別獨立地為3~6的整數) (In formula (1), a plurality of Rs are each independently an alkyl group or an aryl group. A plurality of Xs are each independently a hydrogen atom, a halogen atom, or an alkyl group. A plurality of Xs may be bonded to each other and bonded to these The carbon chains of the knot together form an aromatic ring. M is two hydrogen atoms, a divalent metal Atom or derivative of a trivalent or tetravalent metal atom. (Multiple n is independently an integer from 3 to 6)

為了解決所述課題而完成的另一發明為一種紅外線遮蔽膜(I),其是由該固體攝像元件用組成物所形成。 Another invention completed in order to solve the above-mentioned problem is an infrared shielding film (I) formed of the composition for a solid-state imaging device.

為了解決所述課題而完成的進而另一發明為一種固體攝像元件用紅外線遮蔽膜(II),其實質上含有僅一種或兩種有機色素,且滿足下述(A)~(C)。 Yet another invention completed in order to solve the problem is an infrared shielding film (II) for a solid-state imaging element, which substantially contains only one or two organic dyes, and satisfies the following (A) to (C).

(A)波長430nm以上且580nm以下的範圍內的穿透率的平均值為75%以上 (A) The average transmittance in the wavelength range of 430nm or more and 580nm or less is 75% or more

(B)波長700nm以上且900nm以下的範圍內的穿透率的平均值為16.5%以下 (B) The average transmittance in the wavelength range of 700nm or more and 900nm or less is 16.5% or less

(C)波長1200nm下的穿透率為10%以下 (C) The transmittance at a wavelength of 1200nm is less than 10%

為了解決所述課題而完成的進而又一發明為一種固體攝像元件,其具有該紅外線遮蔽膜(I)或該紅外線遮蔽膜(II)。 Yet another invention completed in order to solve the above-mentioned problem is a solid-state imaging device having the infrared ray shielding film (I) or the infrared ray shielding film (II).

根據本發明,可提供一種固體攝像元件用組成物、固體攝像元件用紅外線遮蔽膜、以及具有所述紅外線遮蔽膜的固體攝像元件,所述固體攝像元件用組成物即便於所含的有機色素的種類少的情況下,亦可形成兼具良好的可見光穿透性與紅外線遮蔽性的固體攝像元件用光學濾光片,所述固體攝像元件用紅外線遮蔽膜即便於所含的有機色素的種類少的情況下,亦兼具良好的可見光穿透性與紅外線遮蔽性。 According to the present invention, it is possible to provide a composition for a solid-state imaging device, an infrared shielding film for a solid-state imaging device, and a solid-state imaging device having the infrared shielding film. When there are few types, it is possible to form an optical filter for solid-state imaging devices that has both good visible light transmittance and infrared shielding properties. The infrared-shielding film for solid-state imaging devices can also be formed even when the types of organic pigments contained are small. In the case of, it also has good visible light penetration and infrared shielding.

圖1是實施例1的紅外線遮蔽膜的穿透光譜。 FIG. 1 is the transmission spectrum of the infrared shielding film of Example 1. FIG.

以下,對本發明的一實施形態的固體攝像元件用組成物、紅外線遮蔽膜及固體攝像元件進行詳細說明。 Hereinafter, the composition for a solid-state imaging device, an infrared shielding film, and a solid-state imaging device according to an embodiment of the present invention will be described in detail.

<固體攝像元件用組成物> <Composition for solid-state imaging device>

本發明的一實施形態的固體攝像元件用組成物(以下,亦簡稱為「組成物」)含有[A]酞菁化合物。該組成物較佳為進而含有[B]紅外線遮蔽劑,所述[B]紅外線遮蔽劑為金屬氧化物、銅化合物([A]酞菁化合物除外)或者該些的組合。 The composition for a solid-state imaging element according to an embodiment of the present invention (hereinafter, also simply referred to as "composition") contains [A] a phthalocyanine compound. The composition preferably further contains [B] an infrared shielding agent, and the [B] infrared shielding agent is a metal oxide, a copper compound (except for the [A] phthalocyanine compound), or a combination of these.

([A]酞菁化合物) ([A] Phthalocyanine compound)

[A]酞菁化合物為由下述式(1)所表示的化合物。[A]酞菁化合物的可見光區域(例如430nm以上且580nm以下的波長區域)的穿透性高,另一方面,近紅外線區域(例如700nm以上且900nm以下的波長區域)的遮蔽性高。該組成物含有所述[A]酞菁化合物,因此即便於所含的有機色素的種類少的情況下,亦可形成兼具良好的可見光穿透性與紅外線遮蔽性的光學濾光片。另外,該組成物含有所述[A]酞菁化合物,因此可形成可見光區域中的均勻穿透性高的光學濾光片。 [A] The phthalocyanine compound is a compound represented by the following formula (1). [A] The phthalocyanine compound has high transmittance in the visible light region (for example, a wavelength range of 430 nm or more and 580 nm or less), and on the other hand, it has high shielding properties in the near infrared region (for example, a wavelength region of 700 nm or more and 900 nm or less). This composition contains the above-mentioned [A] phthalocyanine compound, and therefore, even when the types of organic dyes contained are small, it is possible to form an optical filter having both good visible light transmittance and infrared shielding properties. In addition, since this composition contains the [A] phthalocyanine compound, it can form an optical filter with high uniform transmittance in the visible light region.

[化2]

Figure 107109232-A0305-02-0008-3
[化2]
Figure 107109232-A0305-02-0008-3

式(1)中,多個R分別獨立地為烷基或芳基。多個X分別獨立地為氫原子、鹵素原子或烷基。多個X亦可相互鍵結並與該些所鍵結的碳鏈一起形成芳香環。M為兩個氫原子、二價金屬原子或者三價或四價的金屬原子的衍生物。多個n分別獨立地為3~6的整數。 In the formula (1), a plurality of Rs are each independently an alkyl group or an aryl group. A plurality of Xs are each independently a hydrogen atom, a halogen atom, or an alkyl group. A plurality of Xs may also be bonded to each other and form an aromatic ring together with the bonded carbon chains. M is a derivative of two hydrogen atoms, a divalent metal atom, or a trivalent or tetravalent metal atom. A plurality of n is an integer of 3-6 each independently.

作為所述R所表示的烷基,可列舉:甲基、乙基、正丙基、異丙基、正丁基、2-甲基丙基、1-甲基丙基、第三丁基等碳數1~30的直鏈狀或分支狀的烷基。 Examples of the alkyl group represented by R include methyl, ethyl, n-propyl, isopropyl, n-butyl, 2-methylpropyl, 1-methylpropyl, tertiary butyl, etc. A straight-chain or branched alkyl group with 1 to 30 carbon atoms.

作為所述R所表示的芳基,可列舉:苯基、甲苯基、二甲苯基、萘基、蒽基等。 Examples of the aryl group represented by R include a phenyl group, a tolyl group, a xylyl group, a naphthyl group, and an anthryl group.

作為所述R,較佳為烷基,更佳為碳數1~12的直鏈狀或分支狀的烷基。進而,所述烷基的碳數的上限較佳為6,更佳為 4,進而佳為2。作為所述R,尤佳為甲基。 As said R, an alkyl group is preferable, and a C1-C12 linear or branched alkyl group is more preferable. Furthermore, the upper limit of the carbon number of the alkyl group is preferably 6, more preferably 4, more preferably 2. As said R, methyl is particularly preferred.

作為所述X所表示的鹵素原子,可列舉:氟原子、氯原子、溴原子等。 Examples of the halogen atom represented by X include a fluorine atom, a chlorine atom, and a bromine atom.

作為所述X所表示的烷基,可列舉作為所述R所表示的烷基而例示者。 Examples of the alkyl group represented by X include those exemplified as the alkyl group represented by R.

多個X亦可相互鍵結。通常,多個X中,鍵結於同一苯環的兩個X相互鍵結,並與該些所鍵結的碳鏈一起形成芳香環。作為所形成的芳香環,可列舉:苯環、萘環、蒽環等。該些芳香環的氫原子亦可經烴基或其他取代基取代。 Multiple Xs may also be bonded to each other. Generally, among a plurality of Xs, two Xs bonded to the same benzene ring are bonded to each other and form an aromatic ring together with the bonded carbon chains. Examples of the aromatic ring formed include a benzene ring, a naphthalene ring, and an anthracene ring. The hydrogen atoms of these aromatic rings may also be substituted by hydrocarbon groups or other substituents.

作為所述X,較佳為氫原子。 The X is preferably a hydrogen atom.

作為所述M所表示的二價金屬原子,可列舉:Pd、Cu、Zn、Pt、Ni、Co、Fe、Mn、Sn、In、Ru、Rh、Pb等。再者,所謂二價金屬原子是指可成為二價陽離子的金屬原子。 Examples of the divalent metal atom represented by M include Pd, Cu, Zn, Pt, Ni, Co, Fe, Mn, Sn, In, Ru, Rh, Pb, and the like. Furthermore, the so-called divalent metal atom refers to a metal atom that can become a divalent cation.

此處,所謂金屬原子的衍生物是指包含金屬原子的原子群。所謂三價金屬原子是指可成為三價陽離子的金屬原子。作為三價金屬原子,可列舉Al、In等。所謂四價金屬原子是指可成為四價陽離子的金屬原子。作為四價金屬原子,可列舉Si、Ge、Sn等。再者,金屬原子中亦包含半金屬原子。作為所述M所表示的三價或四價金屬原子的衍生物,可列舉:AlCl、AlBr、AlI、AlOH、InCl、InBr、InI、InOH、SiCl2、SiBr2、SiI2、Si(OH)2、GeCl2、GeBr2、GeI2、SnCl2、SnBr2、SnI2、Sn(OH)2、VO、TiO等。 Here, the derivative of a metal atom refers to an atom group containing a metal atom. The so-called trivalent metal atom refers to a metal atom that can become a trivalent cation. Examples of trivalent metal atoms include Al, In, and the like. The tetravalent metal atom refers to a metal atom that can become a tetravalent cation. Examples of the tetravalent metal atom include Si, Ge, Sn, and the like. Furthermore, metal atoms also include semi-metal atoms. Examples of derivatives of trivalent or tetravalent metal atoms represented by M include: AlCl, AlBr, AlI, AlOH, InCl, InBr, InI, InOH, SiCl 2 , SiBr 2 , SiI 2 , Si(OH) 2, GeCl 2, GeBr 2, GeI 2, SnCl 2, SnBr 2, SnI 2, Sn (OH) 2, VO, TiO and the like.

作為所述M,較佳為H2(兩個氫原子)、Pd、Cu、Zn、 Pt、Ni、Co、Fe、Mn、Sn、In、SnCl2、AlCl、VO及TiO,更佳為VO。 The M is preferably H 2 (two hydrogen atoms), Pd, Cu, Zn, Pt, Ni, Co, Fe, Mn, Sn, In, SnCl 2 , AlCl, VO, and TiO, more preferably VO .

作為所述n的下限,較佳為4。作為所述n的上限,較佳為5,更佳為4。 The lower limit of n is preferably 4. As the upper limit of n, 5 is preferable, and 4 is more preferable.

[A]酞菁化合物的極大吸收波長的下限較佳為680nm,更佳為700nm,進而佳為720nm。另一方面,所述極大吸收波長的上限較佳為1,000nm,更佳為900nm,進而佳為800nm,進而更佳為750nm。藉由[A]酞菁化合物的極大吸收波長為所述範圍內,可形成兼具更良好的可見光穿透性與紅外線遮蔽性的光學濾光片。 [A] The lower limit of the maximum absorption wavelength of the phthalocyanine compound is preferably 680 nm, more preferably 700 nm, and still more preferably 720 nm. On the other hand, the upper limit of the maximum absorption wavelength is preferably 1,000 nm, more preferably 900 nm, still more preferably 800 nm, and still more preferably 750 nm. [A] When the maximum absorption wavelength of the phthalocyanine compound is within the above range, an optical filter having both better visible light transmittance and infrared shielding properties can be formed.

[A]酞菁化合物的合成方法並無特別限定,可將公知的方法組合而合成。例如,可根據下述流程(scheme)1而合成。 [A] The method for synthesizing the phthalocyanine compound is not particularly limited, and it can be synthesized by combining known methods. For example, it can be synthesized according to the following scheme (scheme) 1.

[化3]

Figure 107109232-A0305-02-0011-4
[化3]
Figure 107109232-A0305-02-0011-4

流程1中,R、X、M及n與式(1)為相同含義。 In Scheme 1, R, X, M and n have the same meanings as in formula (1).

再者,作為所述流程1中的二氰基化合物,亦可使用取代基(RO(CH2)n-或X)不同的多種二氰基化合物。作為M2+所表示的金屬離子等的供給源,可列舉乙酸鹽、氯化物、溴化物、硝酸鹽、硫酸鹽等各種金屬鹽。藉由將所述式(0)所表示的化合物與金屬鹽等於溶媒中混合,可獲得所述式(1)所表示的[A]酞菁 化合物。作為所述溶媒,可列舉:芳香族烴(苯、甲苯等)、脂肪族烴(己烷、環己烷等)、氯化烴(二氯甲烷、氯仿、二氯乙烷等)、二甲基甲醯胺(Dimethyl Formamide,DMF)、二甲基亞碸(dimethylsulfoxide,DMSO)、乙腈、四氫呋喃(tetrahydrofuran,THF)、N-甲基吡咯啶酮、二噁烷、醇(甲醇、乙醇等)等。 Furthermore, as the dicyano compound in the above scheme 1, multiple dicyano compounds with different substituents (RO(CH 2 ) n-or X) can also be used. Examples of the supply source of metal ions and the like represented by M 2+ include various metal salts such as acetate, chloride, bromide, nitrate, and sulfate. By mixing the compound represented by the formula (0) and the metal salt in a solvent, the [A] phthalocyanine compound represented by the formula (1) can be obtained. Examples of the solvent include aromatic hydrocarbons (benzene, toluene, etc.), aliphatic hydrocarbons (hexane, cyclohexane, etc.), chlorinated hydrocarbons (dichloromethane, chloroform, dichloroethane, etc.), dimethyl Dimethyl Formamide (DMF), dimethylsulfoxide (DMSO), acetonitrile, tetrahydrofuran (THF), N-methylpyrrolidone, dioxane, alcohol (methanol, ethanol, etc.) Wait.

作為[A]酞菁化合物於該組成物中的全部固體成分中所佔的含量的下限,較佳為0.1質量%,更佳為0.5質量%,進而佳為1質量%。另一方面,作為所述含量的上限,較佳為30質量%,更佳為15質量%,進而佳為10質量%,進而更佳為5質量%。藉由將[A]酞菁化合物的含量設為所述範圍內,所得的光學濾光片的可見光穿透性與紅外線遮蔽性達到更良好的平衡。 The lower limit of the content of [A] the phthalocyanine compound in the total solid content of the composition is preferably 0.1% by mass, more preferably 0.5% by mass, and still more preferably 1% by mass. On the other hand, the upper limit of the content is preferably 30% by mass, more preferably 15% by mass, still more preferably 10% by mass, and still more preferably 5% by mass. By setting the content of the [A] phthalocyanine compound within the above-mentioned range, the visible light transmittance and infrared shielding properties of the obtained optical filter achieve a better balance.

[A]酞菁化合物可單獨使用一種,亦可混合使用兩種以上。其中,較佳為使用僅一種或兩種[A]酞菁化合物,更佳為使用僅一種[A]酞菁化合物。[A]酞菁化合物可僅利用一種來發揮良好的可見光穿透性與紅外線遮蔽性。因此,藉由減少[A]酞菁化合物的使用種類數,可發揮良好的可見光穿透性與紅外線遮蔽性,且提高生產性。 [A] The phthalocyanine compound may be used individually by 1 type, and may mix and use 2 or more types. Among them, it is preferable to use only one or two [A] phthalocyanine compounds, and it is more preferable to use only one [A] phthalocyanine compound. [A] Only one phthalocyanine compound can exhibit good visible light transmittance and infrared shielding properties. Therefore, by reducing the number of [A] phthalocyanine compounds used, good visible light transmittance and infrared shielding properties can be exhibited, and productivity can be improved.

([B]紅外線遮蔽劑) ([B] Infrared shielding agent)

[B]紅外線遮蔽劑為金屬氧化物、銅化合物([A]酞菁化合物除外)或者該些的組合。作為[B]紅外線遮蔽劑,較佳為於800nm以上且2000nm以下的範圍內具有極大吸收波長的化合物。藉由將所述[B]紅外線遮蔽劑與[A]酞菁化合物併用,所得的光學濾光片 的紅外線遮蔽性能進一步提高。 [B] The infrared shielding agent is a metal oxide, a copper compound ([A] phthalocyanine compound is excluded), or a combination of these. [B] The infrared shielding agent is preferably a compound having a maximum absorption wavelength in the range of 800 nm or more and 2000 nm or less. By combining the [B] infrared shielding agent and [A] phthalocyanine compound, the resulting optical filter The infrared shielding performance is further improved.

關於作為[B]紅外線遮蔽劑的金屬氧化物,例如可列舉:氧化鎢系化合物、石英(SiO2)、磁鐵礦(Fe3O4)、氧化鋁(Al2O3)、二氧化鈦(TiO2)、氧化鋯(ZrO2)、尖晶石(MgAl2O4)等。 [B] Metal oxides as infrared shielding agents include, for example, tungsten oxide compounds, quartz (SiO 2 ), magnetite (Fe 3 O 4 ), alumina (Al 2 O 3 ), and titanium dioxide (TiO 2 ). 2 ), zirconia (ZrO 2 ), spinel (MgAl 2 O 4 ), etc.

關於作為[B]紅外線遮蔽劑的銅化合物,可列舉銅酞菁系化合物或其他銅錯合物等。作為銅酞菁系化合物,可列舉銅酞菁、氯化銅酞菁、氯化溴化銅酞菁、溴化銅酞菁等。 [B] Copper compounds as infrared shielding agents include copper phthalocyanine-based compounds and other copper complex compounds. Examples of copper phthalocyanine-based compounds include copper phthalocyanine, copper phthalocyanine chloride, copper phthalocyanine bromide chloride, copper phthalocyanine bromide, and the like.

作為[B]紅外線遮蔽劑,較佳為金屬氧化物,更佳為氧化鎢系化合物。氧化鎢系化合物是對紫外線(尤其是波長約800nm以上且1200nm以下的紅外線)的吸收高(即,對紅外線的遮蔽性高)、對可見光的吸收低的紅外線遮蔽劑。因此,藉由該組成物含有氧化鎢系化合物,可維持所得的光學濾光片的良好的可見光穿透性且提高紅外線遮蔽性。[B]紅外線遮蔽劑可單獨使用一種,亦可混合使用兩種以上。 [B] The infrared shielding agent is preferably a metal oxide, and more preferably a tungsten oxide compound. The tungsten oxide-based compound is an infrared shielding agent that has high absorption of ultraviolet rays (especially infrared rays with a wavelength of about 800 nm or more and 1200 nm or less) (that is, high infrared shielding properties) and low absorption of visible light. Therefore, when the composition contains a tungsten oxide-based compound, the obtained optical filter can maintain good visible light transmittance and improve infrared shielding properties. [B] One kind of infrared shielding agent may be used alone, or two or more kinds may be used in combination.

作為氧化鎢系化合物,更佳為由下述式(2)所表示的氧化鎢系化合物。 As the tungsten oxide compound, a tungsten oxide compound represented by the following formula (2) is more preferable.

AxWOy...(2) A x WO y . . . (2)

式(2)中,A為金屬元素。0.001≦x≦1.1。2.2≦y≦3.0。 In formula (2), A is a metal element. 0.001≦x≦1.1. 2.2≦y≦3.0.

作為所述式(2)中的A所表示的金屬元素,可列舉: 鹼金屬、鹼土類金屬、Mg、Zr、Cr、Mn、Fe、Ru、Co、Rh、Ir、Ni、Pd、Pt、Cu、Ag、Au、Zn、Cd、Al、Ga、In、Tl、Sn、Pb、Ti、Nb、V、Mo、Ta、Re、Be、Hf、Os、Bi等。A所表示的金屬元素可為一種亦可為兩種以上。 The metal element represented by A in the formula (2) includes: Alkali metals, alkaline earth metals, Mg, Zr, Cr, Mn, Fe, Ru, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Al, Ga, In, Tl, Sn , Pb, Ti, Nb, V, Mo, Ta, Re, Be, Hf, Os, Bi, etc. The metal element represented by A may be one type or two or more types.

作為所述A,較佳為鹼金屬,更佳為Rb及Cs,進而佳為Cs。即,金屬氧化物更佳為氧化鎢銫。 As said A, an alkali metal is preferable, Rb and Cs are more preferable, and Cs is still more preferable. That is, the metal oxide is more preferably cesium tungsten oxide.

藉由所述式(2)中的x為0.001以上,可充分遮蔽紅外線。x的下限較佳為0.01,更佳為0.1。另一方面,藉由x為1.1以下,可更確實地避免於氧化鎢系化合物中生成雜質相。x的上限較佳為1,更佳為0.5。 When x in the formula (2) is 0.001 or more, infrared rays can be sufficiently shielded. The lower limit of x is preferably 0.01, more preferably 0.1. On the other hand, when x is 1.1 or less, it is possible to more reliably avoid the generation of impurity phases in the tungsten oxide-based compound. The upper limit of x is preferably 1, more preferably 0.5.

藉由所述式(2)中的y為2.2以上,可進一步提高作為材料的化學穩定性。y的下限較佳為2.5。另一方面,藉由y為3.0以下,可充分遮蔽紅外線。 When y in the formula (2) is 2.2 or more, the chemical stability of the material can be further improved. The lower limit of y is preferably 2.5. On the other hand, when y is 3.0 or less, infrared rays can be sufficiently shielded.

作為所述式(2)所表示的氧化鎢系化合物的具體例,可列舉Cs0.33WO3、Rb0.33WO3、K0.33WO3、Ba0.33WO3等,較佳為Cs0.33WO3及Rb0.33WO3,進而佳為Cs0.33WO3Specific examples of the tungsten oxide compound represented by the formula (2) include Cs 0.33 WO 3 , Rb 0.33 WO 3 , K 0.33 WO 3 , Ba 0.33 WO 3, etc., preferably Cs 0.33 WO 3 and Rb 0.33 WO 3 , more preferably Cs 0.33 WO 3 .

[B]紅外線遮蔽劑較佳為微粒子。作為[B]紅外線遮蔽劑的平均粒徑(D50)的上限,較佳為500nm,更佳為200nm,進而佳為50nm,進而更佳為30nm。藉由平均粒徑為所述上限以下,可進一步提高可見光穿透性。另一方面,就製造時的操作容易性等的原因而言,[B]紅外線遮蔽劑的平均粒徑通常為1nm以上,亦可為10nm以上。 [B] The infrared shielding agent is preferably fine particles. [B] The upper limit of the average particle diameter (D50) of the infrared shielding agent is preferably 500 nm, more preferably 200 nm, still more preferably 50 nm, and still more preferably 30 nm. When the average particle size is below the upper limit, the visible light transmittance can be further improved. On the other hand, for reasons such as ease of handling at the time of manufacture, the average particle diameter of [B] the infrared shielding agent is usually 1 nm or more, and may be 10 nm or more.

[B]紅外線遮蔽劑亦可藉由公知的方法合成,可作為市售品而獲取。於金屬氧化物例如為氧化鎢系化合物的情況下,氧化鎢系化合物例如可藉由於惰性氣體環境或還原性氣體環境中對鎢化合物進行熱處理的方法而獲得。另外,氧化鎢系化合物例如亦可作為住友金屬礦山公司的「YMF-02」等的鎢微粒子的分散物而獲取。 [B] The infrared shielding agent can also be synthesized by a known method, and can be obtained as a commercially available product. When the metal oxide is, for example, a tungsten oxide-based compound, the tungsten oxide-based compound can be obtained, for example, by a method of heat-treating the tungsten compound in an inert gas atmosphere or a reducing gas atmosphere. In addition, the tungsten oxide-based compound can also be obtained as a dispersion of tungsten fine particles such as "YMF-02" of Sumitomo Metal Mining Co., Ltd., for example.

作為[B]紅外線遮蔽劑於該組成物中的全部固體成分中所佔的含量的下限,較佳為1質量%,更佳為5質量%,進而佳為10質量%。所述含量的下限進而佳為20質量%,更佳為30質量%。另一方面,作為所述含量的上限,較佳為70質量%,更佳為65質量%,進而佳為60質量%。藉由將[B]紅外線遮蔽劑的含量設為所述範圍內,所得的光學濾光片的可見光穿透性與紅外線遮蔽性達到更良好的平衡。 [B] The lower limit of the content of the infrared shielding agent in the total solid content in the composition is preferably 1% by mass, more preferably 5% by mass, and still more preferably 10% by mass. The lower limit of the content is more preferably 20% by mass, and more preferably 30% by mass. On the other hand, as the upper limit of the content, it is preferably 70% by mass, more preferably 65% by mass, and still more preferably 60% by mass. By setting the content of the infrared shielding agent [B] within the above-mentioned range, the visible light transmittance and infrared shielding properties of the obtained optical filter achieve a better balance.

作為[B]紅外線遮蔽劑的含量相對於[A]酞菁化合物的含量的質量比([B]/[A])的下限,較佳為2,更佳為3,進而佳為5,進而更佳為10。另一方面,作為所述質量比([B]/[A])的上限,較佳為40,更佳為30,進而佳為20。藉由將[A]酞菁化合物與[B]紅外線遮蔽劑的含量比設為所述範圍內,所得的光學濾光片的可見光穿透性與紅外線遮蔽性達到更良好的平衡。 The lower limit of the mass ratio ([B]/[A]) of the content of [B] infrared shielding agent to the content of [A] phthalocyanine compound is preferably 2, more preferably 3, still more preferably 5, and further More preferably, it is 10. On the other hand, as the upper limit of the mass ratio ([B]/[A]), 40 is preferable, 30 is more preferable, and 20 is still more preferable. By setting the content ratio of the [A] phthalocyanine compound to the [B] infrared shielding agent within the above-mentioned range, the visible light transmittance and infrared shielding properties of the obtained optical filter achieve a better balance.

([C]分散劑) ([C] Dispersant)

該組成物較佳為進而包含[C]分散劑。藉由[C]分散劑,可提高[B]紅外線遮蔽劑(尤其是金屬氧化物)的均勻分散性,且進一 步提高所得的光學濾光片的可見光穿透性與紅外線遮蔽性。 The composition preferably further contains [C] a dispersant. With [C] dispersant, the uniform dispersibility of [B] infrared shielding agent (especially metal oxide) can be improved, and further Step to improve the visible light transmittance and infrared shielding properties of the obtained optical filter.

作為[C]分散劑,例如可列舉:胺基甲酸酯系分散劑、聚乙亞胺系分散劑、聚氧乙烯烷基醚系分散劑、聚氧乙烯烷基苯基醚系分散劑、聚乙二醇二酯系分散劑、山梨醇酐脂肪酸酯系分散劑、聚酯系分散劑、(甲基)丙烯酸系分散劑等。該些中,較佳為(甲基)丙烯酸系分散劑。[C]分散劑較佳為嵌段共聚物。 [C] Dispersants include, for example, urethane-based dispersants, polyethyleneimine-based dispersants, polyoxyethylene alkyl ether-based dispersants, polyoxyethylene alkylphenyl ether-based dispersants, Polyethylene glycol diester dispersant, sorbitan fatty acid ester dispersant, polyester dispersant, (meth)acrylic dispersant, etc. Among these, a (meth)acrylic dispersant is preferable. [C] The dispersant is preferably a block copolymer.

[C]分散劑可於商業上獲取,例如(甲基)丙烯酸系分散劑可列舉迪斯帕畢克(Disperbyk)-2000、迪斯帕畢克(Disperbyk)-2001、畢克(BYK)-LPN6919、畢克(BYK)-LPN21116、畢克(BYK)-LPN22102(以上為畢克化學(BYK)公司製造),胺基甲酸酯系分散劑可列舉迪斯帕畢克(Disperbyk)-161、迪斯帕畢克(Disperbyk)-162、迪斯帕畢克(Disperbyk)-165、迪斯帕畢克(Disperbyk)-167、迪斯帕畢克(Disperbyk)-170、迪斯帕畢克(Disperbyk)182、迪斯帕畢克(Disperbyk)-2164(以上為畢克化學(BYK)公司製造)、索努帕斯(Solsperse)76500(路博潤(Lubrizol)(股)公司製造),聚乙亞胺系分散劑可列舉索努帕斯(Solsperse)24000(路博潤(Lubrizol)(股)公司製造),聚酯系分散劑可列舉阿吉斯帕(Ajisper)PB821、阿吉斯帕(Ajisper)PB822、阿吉斯帕(Ajisper)PB880、阿吉斯帕(Ajisper)PB881(以上為味之素精細化學(Ajinomoto Fine-Techno)(股)公司製造),此外可列舉畢克(BYK)-LPN21324(畢克化學(BYK)公司製造)等。 [C] Dispersants are commercially available. For example, (meth)acrylic dispersants can include Disperbyk-2000, Disperbyk-2001, BYK- LPN6919, BYK-LPN21116, BYK-LPN22102 (the above are manufactured by BYK), urethane-based dispersants can include Disperbyk-161 , Disperbyk -162, Disperbyk -165, Disperbyk -167, Disperbyk -170, Disperbyk -170 (Disperbyk) 182, Disperbyk-2164 (the above is made by BYK), Solsperse 76500 (made by Lubrizol (stock)), Examples of polyethyleneimine-based dispersants include Solsperse 24000 (manufactured by Lubrizol Co., Ltd.), and examples of polyester-based dispersants include Ajisper PB821 and Ajisper. (Ajisper) PB822, Ajisper (Ajisper) PB880, Ajisper (Ajisper) PB881 (the above are manufactured by Ajinomoto Fine-Techno Co., Ltd.), in addition to the BYK ( BYK)-LPN21324 (manufactured by BYK) and the like.

作為[C]分散劑的胺價的下限,較佳為10mgKOH/g,更佳為40mgKOH/g,進而佳為80mgKOH/g。另一方面,作為所述胺價的上限,較佳為300mgKOH/g,更佳為200mgKOH/g,進而佳為150mgKOH/g。藉由使用具有所述胺價的分散劑,[B]紅外線遮蔽劑的分散性提高,可進一步提高所得的光學濾光片的可見光穿透性與紅外線遮蔽性。再者,所謂「胺價」是與中和分散劑固體成分1g所需要的HCl當量的KOH的mg數。 [C] The lower limit of the amine value of the dispersant is preferably 10 mgKOH/g, more preferably 40 mgKOH/g, and still more preferably 80 mgKOH/g. On the other hand, the upper limit of the amine value is preferably 300 mgKOH/g, more preferably 200 mgKOH/g, and still more preferably 150 mgKOH/g. By using the dispersant having the amine value, [B] the dispersibility of the infrared shielding agent is improved, and the visible light transmittance and infrared shielding properties of the obtained optical filter can be further improved. In addition, the "amine value" is the mg number of KOH equivalent to 1 g of HCl required to neutralize the solid content of the dispersant.

作為[C]分散劑的含量的下限,相對於[B]紅外線遮蔽劑100質量份,較佳為5質量份,更佳為15質量份,進而佳為30質量份。另一方面,所述含量的上限較佳為200質量份,更佳為100質量份,進而佳為60質量份。 The lower limit of the content of the [C] dispersant is preferably 5 parts by mass, more preferably 15 parts by mass, and still more preferably 30 parts by mass relative to 100 parts by mass of the [B] infrared shielding agent. On the other hand, the upper limit of the content is preferably 200 parts by mass, more preferably 100 parts by mass, and still more preferably 60 parts by mass.

([D]聚合性化合物) ([D] polymerizable compound)

該組成物較佳為進而包含[D]聚合性化合物。於該組成物含有[D]聚合性化合物的情況下,可發揮良好的硬化性或所得的光學濾光片的良好的耐熱性等。所謂[D]聚合性化合物是指具有兩個以上可聚合的基的化合物。作為可聚合的基,例如可列舉乙烯性不飽和基、環氧乙烷基、氧雜環丁基、N-烷氧基甲基胺基等。作為[D]聚合性化合物,較佳為具有兩個以上的(甲基)丙烯醯基的化合物及具有兩個以上的N-烷氧基甲基胺基的化合物,更佳為具有兩個以上的(甲基)丙烯醯基的化合物。[D]聚合性化合物可使用一種或混合使用兩種以上。 The composition preferably further contains [D] a polymerizable compound. When the composition contains [D] a polymerizable compound, good curability or good heat resistance of the obtained optical filter can be exhibited. [D] The polymerizable compound refers to a compound having two or more polymerizable groups. As the polymerizable group, for example, an ethylenically unsaturated group, an oxirane group, an oxetanyl group, an N-alkoxymethylamino group, etc. may be mentioned. [D] The polymerizable compound is preferably a compound having two or more (meth)acryloyl groups and a compound having two or more N-alkoxymethylamino groups, and more preferably two or more N-alkoxymethylamino groups The (meth)acrylic compound. [D] The polymerizable compound can be used singly or in combination of two or more.

作為具有兩個以上的(甲基)丙烯醯基的化合物,可列 舉:作為脂肪族多羥基化合物與(甲基)丙烯酸的反應物等的多官能(甲基)丙烯酸酯、經己內酯改質的多官能(甲基)丙烯酸酯、經環氧烷改質的多官能(甲基)丙烯酸酯、作為具有羥基的(甲基)丙烯酸酯與多官能異氰酸酯的反應物等的多官能胺基甲酸酯(甲基)丙烯酸酯、作為具有羥基的(甲基)丙烯酸酯與酸酐的反應物等的具有羧基的多官能(甲基)丙烯酸酯等。 As a compound having two or more (meth)acryloyl groups, it can be listed Examples include: polyfunctional (meth)acrylates as reactants of aliphatic polyhydroxy compounds and (meth)acrylic acid, polyfunctional (meth)acrylates modified with caprolactone, and modified with alkylene oxide Polyfunctional (meth)acrylates, polyfunctional urethane (meth)acrylates such as the reactants of (meth)acrylates with hydroxyl groups and polyfunctional isocyanates, and (meth)acrylates with hydroxyl groups (meth) ) Polyfunctional (meth)acrylates having carboxyl groups such as reactants of acrylates and acid anhydrides.

此處,作為所述脂肪族多羥基化合物,例如可列舉:乙二醇、丙二醇、聚乙二醇、聚丙二醇等二價脂肪族多羥基化合物、或者甘油、三羥甲基丙烷、季戊四醇、二季戊四醇等三價以上的脂肪族多羥基化合物。作為所述具有羥基的(甲基)丙烯酸酯,例如可列舉(甲基)丙烯酸2-羥基乙酯、三羥甲基丙烷二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、甘油二甲基丙烯酸酯等。作為所述多官能異氰酸酯,例如可列舉:甲苯二異氰酸酯、六亞甲基二異氰酸酯、二苯基亞甲基二異氰酸酯、異佛爾酮二異氰酸酯等。作為所述酸酐,例如可列舉:琥珀酸酐、馬來酸酐、戊二酸酐、衣康酸酐、鄰苯二甲酸酐、六氫鄰苯二甲酸酐等二元酸酐、或者均苯四甲酸二酐、聯苯四羧酸二酐、二苯甲酮四羧酸二酐等四元酸二酐。 Here, as the aliphatic polyhydroxy compound, for example, divalent aliphatic polyhydroxy compounds such as ethylene glycol, propylene glycol, polyethylene glycol, and polypropylene glycol, or glycerin, trimethylolpropane, pentaerythritol, dihydric Aliphatic polyhydroxy compounds with trivalent or higher valence such as pentaerythritol. As the (meth)acrylate having a hydroxyl group, for example, 2-hydroxyethyl (meth)acrylate, trimethylolpropane di(meth)acrylate, pentaerythritol tri(meth)acrylate, two Pentaerythritol penta(meth)acrylate, glycerol dimethacrylate, etc. As said polyfunctional isocyanate, toluene diisocyanate, hexamethylene diisocyanate, diphenylmethylene diisocyanate, isophorone diisocyanate, etc. are mentioned, for example. Examples of the acid anhydride include dibasic acid anhydrides such as succinic anhydride, maleic anhydride, glutaric anhydride, itaconic anhydride, phthalic anhydride, and hexahydrophthalic anhydride, or pyromellitic dianhydride, Tetrabasic acid dianhydrides such as biphenyl tetracarboxylic dianhydride and benzophenone tetracarboxylic dianhydride.

作為具有兩個以上的(甲基)丙烯醯基的化合物的具體例,例如可列舉:ω-羧基聚己內酯單(甲基)丙烯酸酯、乙二醇(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、1,9-壬二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸 酯、聚丙二醇二(甲基)丙烯酸酯、雙苯氧基乙醇茀二(甲基)丙烯酸酯、二羥甲基三環癸烷二(甲基)丙烯酸酯、2-羥基-3-(甲基)丙烯醯氧基丙基甲基丙烯酸酯、(甲基)丙烯酸2-(2'-乙烯氧基乙氧基)乙酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、三(2-(甲基)丙烯醯氧基乙基)磷酸酯、環氧乙烷改質二季戊四醇六丙烯酸酯、琥珀酸改質季戊四醇三丙烯酸酯、胺基甲酸酯(甲基)丙烯酸酯化合物等。 As specific examples of the compound having two or more (meth)acryloyl groups, for example, ω-carboxy polycaprolactone mono(meth)acrylate, ethylene glycol (meth)acrylate, 1, 6-hexanediol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate Ester, polypropylene glycol di(meth)acrylate, bisphenoxyethanol di(meth)acrylate, dimethylol tricyclodecane di(meth)acrylate, 2-hydroxy-3-(meth)acrylate Base) acryloxy propyl methacrylate, 2-(2'-vinyloxyethoxy) ethyl (meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol tri( Meth) acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, tris(2-(meth)acryloyloxyethyl) Phosphoric acid ester, ethylene oxide modified dipentaerythritol hexaacrylate, succinic acid modified pentaerythritol triacrylate, urethane (meth)acrylate compound, etc.

具有兩個以上的(甲基)丙烯醯基的化合物中,較佳為多官能(甲基)丙烯酸酯,更佳為具有3個以上且10個以下的(甲基)丙烯醯基的多官能(甲基)丙烯酸酯。具體而言,較佳為三羥甲基丙烷三丙烯酸酯、季戊四醇三丙烯酸酯、二季戊四醇五丙烯酸酯及二季戊四醇六丙烯酸酯。 Among the compounds having two or more (meth)acryloyl groups, a polyfunctional (meth)acrylate is preferred, and a polyfunctional one having 3 or more and 10 (meth)acryloyl groups is more preferred (Meth)acrylate. Specifically, trimethylolpropane triacrylate, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, and dipentaerythritol hexaacrylate are preferable.

作為具有2個以上的N-烷氧基甲基胺基的化合物,例如可列舉具有三聚氰胺結構、苯并胍胺結構、脲結構的化合物等。作為具有2個以上的N-烷氧基甲基胺基的化合物的具體例,可列舉:N,N,N',N',N",N"-六(烷氧基甲基)三聚氰胺、N,N,N',N'-四(烷氧基甲基)苯并胍胺、N,N,N',N'-四(烷氧基甲基)乙炔脲等。 Examples of the compound having two or more N-alkoxymethylamino groups include compounds having a melamine structure, a benzoguanamine structure, and a urea structure. Specific examples of the compound having two or more N-alkoxymethylamino groups include: N,N,N',N',N",N"-hexa(alkoxymethyl)melamine, N,N,N',N'-tetra(alkoxymethyl)benzoguanamine, N,N,N',N'-tetra(alkoxymethyl)acetylene carbamide, etc.

[D]聚合性化合物的含量相對於[A]酞菁化合物100質量份而較佳為10質量份,更佳為200質量份,進而佳為500質量份。另一方面,所述含量的上限較佳為3,000質量份,更佳為2,000質量份。 [D] The content of the polymerizable compound is preferably 10 parts by mass relative to 100 parts by mass of the [A] phthalocyanine compound, more preferably 200 parts by mass, and still more preferably 500 parts by mass. On the other hand, the upper limit of the content is preferably 3,000 parts by mass, more preferably 2,000 parts by mass.

([E]聚合起始劑) ([E] polymerization initiator)

該組成物較佳為含有[E]聚合起始劑。作為[E]聚合起始劑,可列舉光聚合起始劑、熱聚合起始劑等,較佳為光聚合起始劑。藉此,可對該組成物賦予感光性(感放射線性)。所謂光聚合起始劑是指藉由可見光線、紫外線、遠紫外線、電子束、X射線等放射線的曝光而產生使[D]聚合性化合物的聚合開始的活性種的化合物。[E]聚合起始劑可使用一種或混合使用兩種以上。 The composition preferably contains [E] a polymerization initiator. [E] The polymerization initiator includes a photopolymerization initiator, a thermal polymerization initiator, and the like, and a photopolymerization initiator is preferred. Thereby, photosensitivity (radiation sensitivity) can be imparted to the composition. The term "photopolymerization initiator" refers to a compound that generates active species that initiate polymerization of the [D] polymerizable compound by exposure to radiation such as visible light, ultraviolet light, extreme ultraviolet light, electron beam, or X-ray. [E] One type of polymerization initiator can be used, or two or more types can be used in combination.

作為[E]聚合起始劑,例如可列舉:噻噸酮系化合物、苯乙酮系化合物、聯咪唑系化合物、三嗪系化合物、O-醯基肟系化合物、鎓鹽系化合物、安息香系化合物、二苯甲酮系化合物、α-二酮系化合物、多核醌系化合物、二偶氮系化合物、醯亞胺磺酸鹽系化合物等。該些中,較佳為噻噸酮系化合物、苯乙酮系化合物、聯咪唑系化合物、三嗪系化合物及O-醯基肟系化合物,更佳為O-醯基肟系化合物。 [E] The polymerization initiator includes, for example, thioxanthone-based compounds, acetophenone-based compounds, biimidazole-based compounds, triazine-based compounds, O-oxime-based compounds, onium salt-based compounds, and benzoin-based compounds. Compounds, benzophenone-based compounds, α-diketone-based compounds, polynuclear quinone-based compounds, diazo-based compounds, imine sulfonate-based compounds, etc. Among these, thioxanthone-based compounds, acetophenone-based compounds, biimidazole-based compounds, triazine-based compounds, and O-acyloxime-based compounds are preferred, and O-acyloxime-based compounds are more preferred.

作為噻噸酮系化合物,可列舉:噻噸酮、2-氯噻噸酮、2-甲基噻噸酮、2-異丙基噻噸酮、4-異丙基噻噸酮、2,4-二氯噻噸酮、2,4-二甲基噻噸酮、2,4-二乙基噻噸酮、2,4-二異丙基噻噸酮等。 Examples of thioxanthone compounds include: thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4 -Dichlorothioxanthone, 2,4-Dimethylthioxanthone, 2,4-Diethylthioxanthone, 2,4-Diisopropylthioxanthone, etc.

作為苯乙酮系化合物,例如可列舉:2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)丁烷-1-酮、2-(4-甲基苄基)-2-(二甲基胺基)-1-(4-嗎啉基苯基)丁烷-1-酮等。 Examples of acetophenone compounds include 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, 2-benzyl-2-dimethyl Amino-1-(4-morpholinylphenyl)butan-1-one, 2-(4-methylbenzyl)-2-(dimethylamino)-1-(4-morpholine) (Phenyl) butan-1-one and the like.

作為聯咪唑系化合物,例如可列舉:2,2'-雙(2-氯苯基)-4,4',5,5'-四苯基-1,2'-聯咪唑、2,2'-雙(2,4-二氯苯基)-4,4',5,5'-四苯基-1,2'-聯咪唑、2,2'-雙(2,4,6-三氯苯基)-4,4',5,5'-四苯基-1,2'-聯咪唑等。 Examples of biimidazole-based compounds include: 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2' -Bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4,6-trichloro (Phenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole and the like.

再者,於使用聯咪唑系化合物的情況下,就可改良感度的方面而言,較佳為併用供氫體。此處所述的「供氫體」是指可藉由曝光對由聯咪唑系化合物所產生的自由基供給氫原子的化合物。作為供氫體,例如可列舉2-巰基苯并噻唑、2-巰基苯并噁唑等硫醇系供氫體;4,4'-雙(二甲基胺基)二苯甲酮、4,4'-雙(二乙基胺基)二苯甲酮等胺系供氫體。 Furthermore, in the case of using a biimidazole-based compound, it is preferable to use a hydrogen donor in combination in terms of improving sensitivity. The "hydrogen donor" as used herein refers to a compound that can donate hydrogen atoms to radicals generated from a biimidazole-based compound by exposure to light. Examples of hydrogen donors include thiol-based hydrogen donors such as 2-mercaptobenzothiazole and 2-mercaptobenzoxazole; 4,4'-bis(dimethylamino)benzophenone, 4, Amine-based hydrogen donors such as 4'-bis(diethylamino)benzophenone.

作為三嗪系化合物,例如可列舉日本專利特公昭57-6096號公報、日本專利特開2003-238898號公報的段落[0063]~段落[0065]中記載的化合物。 As the triazine compound, for example, the compounds described in paragraphs [0063] to paragraph [0065] of Japanese Patent Publication No. 57-6096 and Japanese Patent Application Publication No. 2003-238898 can be cited.

作為O-醯基肟系化合物,可列舉:1,2-辛二酮-1-[4-(苯硫基)苯基]-2-(O-苯甲醯基肟)、乙酮-1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]-1-(O-乙醯基肟)、乙酮-1-[9-乙基-6-(2-甲基-4-四氫呋喃基甲氧基苯甲醯基)-9H-咔唑-3-基]-1-(O-乙醯基肟)、乙酮-1-[9-乙基-6-{2-甲基-4-(2,2-二甲基-1,3-二氧雜環戊基)甲氧基苯甲醯基}-9H-咔唑-3-基]-1-(O-乙醯基肟)等。作為O-醯基肟系化合物的市售品,亦可使用NCI-831、NCI-930(以上為艾迪科(ADEKA)股份有限公司製造)、OXE-03、OXE-04(以上為巴斯夫(BASF)公司製造)等。 Examples of O-acetoxime compounds include: 1,2-octanedione-1-[4-(phenylthio)phenyl]-2-(O-benzyloxime), ethyl ketone-1 -[9-Ethyl-6-(2-methylbenzyl)-9H-carbazol-3-yl]-1-(O-acetyloxime), ethyl ketone-1-[9-ethyl Base-6-(2-methyl-4-tetrahydrofuranylmethoxybenzyl)-9H-carbazol-3-yl]-1-(O-acetyloxime), ethyl ketone-1-[ 9-Ethyl-6-{2-methyl-4-(2,2-dimethyl-1,3-dioxolyl)methoxybenzyl}-9H-carbazole-3 -Radical]-1-(O-acetyloxime) and the like. As commercially available products of O-acetoxime-based compounds, NCI-831, NCI-930 (the above are manufactured by ADEKA Co., Ltd.), OXE-03, OXE-04 (the above are BASF ( BASF) manufactured by the company) and so on.

於使用光聚合起始劑的情況下,亦可併用增感劑。作為所述增感劑,例如可列舉:4,4'-雙(二甲基胺基)二苯甲酮、4,4'-雙(二乙基胺基)二苯甲酮、4-二乙基胺基苯乙酮、4-二甲基胺基苯丙酮、4-二甲基胺基苯甲酸乙酯、4-二甲基胺基苯甲酸2-乙基己酯、2,5-雙(4-二乙基胺基亞苄基)環己酮、7-二乙基胺基-3-(4-二乙基胺基苯甲醯基)香豆素、4-(二乙基胺基)查爾酮等。 In the case of using a photopolymerization initiator, a sensitizer may be used in combination. As the sensitizer, for example, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4-bis Ethylaminoacetophenone, 4-dimethylaminopropiophenone, ethyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2,5- Bis(4-diethylaminobenzylidene) cyclohexanone, 7-diethylamino-3-(4-diethylaminobenzyl) coumarin, 4-(diethyl Amino) chalcone and the like.

[E]聚合起始劑的含量的下限相對於[D]聚合性化合物100質量份而較佳為1質量份,更佳為5質量份。另一方面,作為所述含量的上限,較佳為100質量份,更佳為20質量份。 [E] The lower limit of the content of the polymerization initiator is preferably 1 part by mass, and more preferably 5 parts by mass with respect to 100 parts by mass of the [D] polymerizable compound. On the other hand, the upper limit of the content is preferably 100 parts by mass, and more preferably 20 parts by mass.

(黏合劑樹脂) (Binder resin)

於該組成物中亦可進而含有黏合劑樹脂。作為黏合劑樹脂,並無特別限定,較佳為具有羧基、酚性羥基等酸性官能基的樹脂。其中,較佳為具有羧基的聚合物(以下,亦稱為「含羧基的聚合物」)。作為含羧基的聚合物,例如可列舉具有一個以上的羧基的乙烯性不飽和單量體(以下,亦稱為「不飽和單量體(1)」)與其他可共聚的乙烯性不飽和單量體(以下,亦稱為「不飽和單量體(2))的共聚物。 The composition may further contain a binder resin. The binder resin is not particularly limited, but a resin having an acidic functional group such as a carboxyl group and a phenolic hydroxyl group is preferred. Among them, a polymer having a carboxyl group (hereinafter, also referred to as a "carboxyl group-containing polymer") is preferred. Examples of carboxyl group-containing polymers include ethylenically unsaturated monomers having one or more carboxyl groups (hereinafter, also referred to as "unsaturated monomers (1)") and other copolymerizable ethylenically unsaturated monomers. A copolymer of a weight body (hereinafter, also referred to as "unsaturated monomer (2)).

作為所述不飽和單量體(1),例如可列舉:(甲基)丙烯酸、馬來酸、馬來酸酐、琥珀酸單[2-(甲基)丙烯醯氧基乙基]酯、ω-羧基聚己內酯單(甲基)丙烯酸酯、對乙烯基苯甲酸等。 Examples of the unsaturated monomer (1) include (meth)acrylic acid, maleic acid, maleic anhydride, succinic acid mono[2-(meth)acryloyloxyethyl] ester, ω -Carboxyl polycaprolactone mono(meth)acrylate, p-vinyl benzoic acid, etc.

作為所述不飽和單量體(2),例如可列舉:N-苯基馬來醯亞胺、N-環己基馬來醯亞胺等N-位取代馬來醯 亞胺、苯乙烯、α-甲基苯乙烯、對羥基苯乙烯、對羥基-α-甲基苯乙烯、對乙烯基苄基縮水甘油醚、苊等芳香族乙烯基化合物、(甲基)丙烯酸甲酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸烯丙酯、(甲基)丙烯酸苄酯、聚乙二醇(聚合度2~10)甲醚(甲基)丙烯酸酯、聚丙二醇(聚合度2~10)甲醚(甲基)丙烯酸酯、聚乙二醇(聚合度2~10)單(甲基)丙烯酸酯、聚丙二醇(聚合度2~10)單(甲基)丙烯酸酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸異冰片酯、三環[5.2.1.02,6]癸烷-8-基(甲基)丙烯酸酯、(甲基)丙烯酸二環戊烯酯、甘油單(甲基)丙烯酸酯、(甲基)丙烯酸4-羥基苯酯、對枯基苯酚的環氧乙烷改質(甲基)丙烯酸酯、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸3,4-環氧基環己基甲酯、3-[(甲基)丙烯醯氧基甲基]氧雜環丁烷、3-[(甲基)丙烯醯氧基甲基]-3-乙基氧雜環丁烷等(甲基)丙烯酸酯、環己基乙烯基醚、異冰片基乙烯基醚、三環[5.2.1.02,6]癸烷-8-基乙烯基醚、五環十五烷基乙烯基醚、3-(乙烯氧基甲基)-3-乙基氧雜環丁烷等乙烯基醚、聚苯乙烯、聚(甲基)丙烯酸甲酯、聚(甲基)丙烯酸正丁酯、聚矽氧烷等於聚合物分子鏈的末端具有單(甲基)丙烯醯基的巨單體等。 Examples of the unsaturated monomer (2) include N-substituted maleimines such as N-phenylmaleimines, N-cyclohexylmaleimines, styrene, and α -Methylstyrene, p-hydroxystyrene, p-hydroxy-α-methylstyrene, p-vinylbenzyl glycidyl ether, acenaphthene and other aromatic vinyl compounds, methyl (meth)acrylate, (methyl) N-Butyl acrylate, 2-ethylhexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, polyethylene glycol ( Polymerization degree 2-10) methyl ether (meth)acrylate, polypropylene glycol (polymerization degree 2-10) methyl ether (meth)acrylate, polyethylene glycol (polymerization degree 2-10) mono(meth)acrylic acid Ester, polypropylene glycol (degree of polymerization 2~10) mono(meth)acrylate, cyclohexyl (meth)acrylate, isobornyl (meth)acrylate, tricyclo[5.2.1.0 2,6 ]decane- 8-yl (meth)acrylate, dicyclopentenyl (meth)acrylate, glycerol mono(meth)acrylate, 4-hydroxyphenyl (meth)acrylate, ethylene oxide of p-cumylphenol Modified (meth)acrylate, glycidyl (meth)acrylate, 3,4-epoxycyclohexylmethyl (meth)acrylate, 3-[(meth)acryloxymethyl]oxy Etidine, 3-[(meth)acryloyloxymethyl]-3-ethyloxetane and other (meth)acrylates, cyclohexyl vinyl ether, isobornyl vinyl ether, Tricyclic [5.2.1.0 2,6 ]decane-8-yl vinyl ether, pentacyclopentadecyl vinyl ether, 3-(vinyloxymethyl)-3-ethyloxetane, etc. Vinyl ether, polystyrene, polymethyl(meth)acrylate, poly(n-butyl)acrylate, polysiloxane are equal to a giant monomer with a single (meth)acrylic acid group at the end of the polymer molecular chain Body etc.

另外,作為黏合劑樹脂,亦可使用於側鏈具有(甲基)丙 烯醯基等聚合性不飽和鍵的含羧基的聚合物。另外,聚矽氧烷等亦可作為黏合劑樹脂而使用。 In addition, as a binder resin, it can also be used for side chains with (meth)acrylic acid A carboxyl group-containing polymer with a polymerizable unsaturated bond such as an alkenyl group. In addition, polysiloxane etc. can also be used as a binder resin.

於該組成物含有黏合劑樹脂的情況下,黏合劑樹脂的含量相對於[A]酞菁化合物100質量份而言通常可設為10質量份以上且10,000質量份以下。 When the composition contains a binder resin, the content of the binder resin can usually be 10 parts by mass or more and 10,000 parts by mass or less with respect to 100 parts by mass of the [A] phthalocyanine compound.

(添加劑) (additive)

該組成物亦可視需要含有各種添加劑。 The composition may also contain various additives as needed.

作為添加劑,例如可列舉:界面活性劑、密接促進劑、抗氧化劑、紫外線吸收劑、防凝聚劑、殘渣改善劑、顯影性改善劑等。 Examples of additives include surfactants, adhesion promoters, antioxidants, ultraviolet absorbers, anti-agglomeration agents, residue improvers, developability improvers, and the like.

作為界面活性劑,可列舉氟界面活性劑、矽酮界面活性劑等。作為界面活性劑的含量,相對於[A]酞菁化合物100質量份而言通常可設為0.01質量份以上且10質量份以下。 As the surfactant, a fluorine surfactant, a silicone surfactant, and the like can be cited. As content of a surfactant, it can be normally 0.01 mass part or more and 10 mass parts or less with respect to 100 mass parts of [A] phthalocyanine compounds.

作為密接促進劑,可列舉:乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三(2-甲氧基乙氧基)矽烷、N-(2-胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-縮水甘油氧基丙基三甲氧基矽烷、3-縮水甘油氧基丙基甲基二甲氧基矽烷、2-(3,4-環氧基環己基)乙基三甲氧基矽烷、3-氯丙基甲基二甲氧基矽烷、3-氯丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-巰基丙基三甲氧基矽烷等。 Examples of adhesion promoters include vinyl trimethoxy silane, vinyl triethoxy silane, vinyl tris(2-methoxyethoxy) silane, and N-(2-aminoethyl)-3 -Aminopropylmethyldimethoxysilane, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-condensation Glyceryloxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-chloropropane Methyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, etc.

作為抗氧化劑,可列舉:2,2-硫代雙(4-甲基-6-第三丁基 苯酚)、2,6-二-第三丁基苯酚、季戊四醇四[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、3,9-雙[2-[3-(3-第三丁基-4-羥基-5-甲基苯基)-丙醯氧基]-1,1-二甲基乙基]-2,4,8,10-四氧雜-螺[5.5]十一烷、硫代二乙烯雙[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]等。作為抗氧化劑的含量,相對於[A]酞菁化合物100質量份而言通常可設為0.01質量份以上且10質量份以下。 Examples of antioxidants include: 2,2-thiobis(4-methyl-6-tertiary butyl) Phenol), 2,6-di-tert-butylphenol, pentaerythritol tetra[3-(3,5-di-tert-butyl-4-hydroxyphenyl) propionate], 3,9-bis[2 -[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)-propionyloxy]-1,1-dimethylethyl]-2,4,8,10-tetra Oxa-spiro[5.5]undecane, thiodiethylene bis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate] and the like. As content of an antioxidant, normally, it can be 0.01 mass part or more and 10 mass parts or less with respect to 100 mass parts of [A] phthalocyanine compounds.

作為紫外線吸收劑,可列舉2-(3-第三丁基-5-甲基-2-羥基苯基)-5-氯苯并三唑、烷氧基二苯甲酮類等。 Examples of ultraviolet absorbers include 2-(3-tert-butyl-5-methyl-2-hydroxyphenyl)-5-chlorobenzotriazole, alkoxybenzophenones, and the like.

作為防凝聚劑,可列舉聚丙烯酸鈉等。 As the anti-aggregation agent, sodium polyacrylate and the like can be cited.

作為殘渣改善劑,可列舉:丙二酸、己二酸、衣康酸、檸康酸、反丁烯二酸、中康酸、2-胺基乙醇、3-胺基-1-丙醇、5-胺基-1-戊醇、3-胺基-1,2-丙二醇、2-胺基-1,3-丙二醇、4-胺基-1,2-丁二醇等。 Examples of residue improvers include malonic acid, adipic acid, itaconic acid, citraconic acid, fumaric acid, mesaconic acid, 2-aminoethanol, 3-amino-1-propanol, 5-amino-1-pentanol, 3-amino-1,2-propanediol, 2-amino-1,3-propanediol, 4-amino-1,2-butanediol, etc.

作為顯影性改善劑,可列舉:琥珀酸單[2-(甲基)丙烯醯氧基乙基]酯、鄰苯二甲酸單[2-(甲基)丙烯醯氧基乙基]酯、ω-羧基聚己內酯單(甲基)丙烯酸酯等劑等。 As the developability improver, succinic acid mono[2-(meth)acryloxyethyl] ester, phthalic acid mono[2-(meth)acryloxyethyl] ester, ω -Carboxylic polycaprolactone mono(meth)acrylate and other agents.

(其他有機色素等) (Other organic pigments, etc.)

該組成物亦可含有[A]酞菁化合物及作為為[B]紅外線遮蔽劑的銅化合物的有機色素以外的公知的有機色素。作為其他有機色素,可列舉二亞胺化合物、方酸內鎓鹽化合物、花青化合物、萘酞菁化合物、誇特銳烯化合物、銨化合物、亞胺化合物、偶氮化合物、蒽醌化合物、卟啉化合物、吡咯并吡咯化合物、氧雜菁化 合物、克酮鎓化合物、六元卟啉(hexaphyrin)化合物等(將包含銅原子者除外)。另外,亦可使用[A]酞菁化合物及作為[B]紅外線遮蔽劑的酞菁化合物以外的酞菁化合物。 This composition may contain a well-known organic dye other than the organic dye which is [A] a phthalocyanine compound and the copper compound which is [B] an infrared shielding agent. Examples of other organic pigments include diimine compounds, squaraine ylide compounds, cyanine compounds, naphthalocyanine compounds, quateracene compounds, ammonium compounds, imine compounds, azo compounds, anthraquinone compounds, porphyr Morinoline compounds, pyrrolopyrrole compounds, oxocyanation Compounds, croconium compounds, hexaphyrin compounds, etc. (excluding those containing copper atoms). In addition, phthalocyanine compounds other than [A] a phthalocyanine compound and [B] an infrared shielding agent may also be used.

再者,較佳為將[A]酞菁化合物與[A]酞菁化合物以外的酞菁化合物(以下,亦稱為「[a]酞菁化合物」)併用。作為[a]酞菁化合物的極大吸收波長的下限,較佳為600nm,更佳為650nm,進而佳為700nm,有時亦進而佳為750nm,有時亦進而佳為800nm。另一方面,作為[a]酞菁化合物的極大吸收波長的上限,較佳為900nm,更佳為850nm,有時亦進而佳為800nm,有時亦進而佳為750nm,有時亦進而佳為700nm。作為[A]酞菁化合物的極大吸收波長與[a]酞菁化合物的極大吸收波長的差的下限,較佳為10nm,更佳為30nm,有時亦進而佳為50nm。另一方面,作為所述差的上限,較佳為100nm,更佳為80nm,有時亦進而佳為50nm。藉由組合使用所述酞菁化合物,可進一步提高所得的光學濾光片的可見光穿透性與紅外線遮蔽性。另外,亦可提高所得的光學濾光片的可見光均勻穿透性。再者,於[a]酞菁化合物中亦包含作為為[B]紅外線遮蔽劑的銅化合物的酞菁化合物。[a]酞菁化合物可列舉先前公知的各種酞菁化合物。 Furthermore, it is preferable to use the [A] phthalocyanine compound in combination with a phthalocyanine compound other than the [A] phthalocyanine compound (hereinafter, also referred to as "[a] phthalocyanine compound"). [A] The lower limit of the maximum absorption wavelength of the phthalocyanine compound is preferably 600 nm, more preferably 650 nm, still more preferably 700 nm, sometimes even more preferably 750 nm, and sometimes even more preferably 800 nm. On the other hand, the upper limit of the maximum absorption wavelength of the [a] phthalocyanine compound is preferably 900 nm, more preferably 850 nm, sometimes even more preferably 800 nm, sometimes even more preferably 750 nm, and sometimes even more preferably 700nm. The lower limit of the difference between the maximum absorption wavelength of the [A] phthalocyanine compound and the maximum absorption wavelength of the [a] phthalocyanine compound is preferably 10 nm, more preferably 30 nm, and sometimes even more preferably 50 nm. On the other hand, the upper limit of the difference is preferably 100 nm, more preferably 80 nm, and sometimes even more preferably 50 nm. By using the phthalocyanine compound in combination, the visible light transmittance and infrared shielding properties of the obtained optical filter can be further improved. In addition, the uniform transmittance of visible light of the obtained optical filter can also be improved. Furthermore, [a] the phthalocyanine compound also includes a phthalocyanine compound which is a copper compound which is an infrared shielding agent [B]. [a] The phthalocyanine compound includes various conventionally known phthalocyanine compounds.

作為[A]酞菁化合物於該組成物中的全部有機色素中所佔的含量的下限,較佳為50質量%,更佳為70質量%,有時亦更佳為80質量%,有時亦更佳為90質量%,有時亦更佳為99質量%。作為有機色素,有時亦較佳為實質上僅含有[A]酞菁化合物。 該組成物藉由以所述方式減少其他有機色素的含量,可提高生產性。另外,亦可提高所得的光學濾光片的可見光均勻穿透性等。 As the lower limit of the content of [A] the phthalocyanine compound in all the organic pigments in the composition, it is preferably 50% by mass, more preferably 70% by mass, and sometimes more preferably 80% by mass, and sometimes It is more preferably 90% by mass, and sometimes 99% by mass. As an organic dye, it may also be preferable to contain substantially only the [A] phthalocyanine compound. The composition can improve productivity by reducing the content of other organic pigments in the manner described. In addition, the uniform transmittance of visible light and the like of the obtained optical filter can also be improved.

另外,作為該組成物中含有的有機色素的種類數,亦包含[A]酞菁化合物,較佳為3種以下,更佳為2種以下,有時亦進而佳為1種。即便藉由以所述方式減少所含的有機色素的種類數,亦可提高生產性,且提高所得的光學濾光片的可見光均勻穿透性等。再者,於使用2種以上有機色素的情況下,較佳為將[A]酞菁化合物與[A]酞菁化合物以外的酞菁化合物併用。 In addition, as the number of types of organic dyes contained in the composition, [A] phthalocyanine compounds are also included, and three or less types are preferable, two or less types are more preferable, and one type is even more preferable in some cases. Even if the number of types of organic dyes contained is reduced in this way, productivity can be improved, and the visible light uniform transmittance of the obtained optical filter can be improved. Furthermore, when two or more organic dyes are used, it is preferable to use [A] a phthalocyanine compound and [A] a phthalocyanine compound other than the phthalocyanine compound in combination.

(溶媒) (Solvent)

該組成物通常是作為含有溶媒(分散介質)的液狀組成物而製備。作為溶媒,只要為將其他成分分散或溶解且不與該些成分反應、具有適度的揮發性者,則可適宜選擇使用。 This composition is usually prepared as a liquid composition containing a solvent (dispersion medium). As the solvent, any one that disperses or dissolves other components, does not react with these components, and has moderate volatility, can be appropriately selected and used.

作為所述溶媒,例如可列舉:乙二醇單甲醚、乙二醇單乙醚、乙二醇單-正丙醚、乙二醇單-正丁醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單-正丙醚、二乙二醇單-正丁醚、三乙二醇單甲醚、三乙二醇單乙醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單-正丙醚、丙二醇單-正丁醚、二丙二醇單甲醚、二丙二醇單乙醚、二丙二醇單-正丙醚、二丙二醇單-正丁醚、三丙二醇單甲醚、三丙二醇單乙醚等(聚)烷二醇單烷基醚類、乳酸甲酯、乳酸乙酯等乳酸烷基酯類、甲醇、乙醇、丙醇、丁醇、異丙醇、異丁醇、第三丁醇、辛 醇、2-乙基己醇、環己醇等(環)烷基醇類、二丙酮醇等酮醇類、乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、二乙二醇單甲醚乙酸酯、二乙二醇單乙醚乙酸酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、二丙二醇單甲醚乙酸酯、3-甲氧基丁基乙酸酯、3-甲基-3-甲氧基丁基乙酸酯等(聚)烷二醇單烷基醚乙酸酯類、二乙二醇二甲醚、二乙二醇甲基乙醚、二乙二醇二乙醚、四氫呋喃等其他醚類、甲基乙基酮、2-庚酮、3-庚酮等鏈狀酮、環戊酮、環己酮等環狀酮等酮類、丙二醇二乙酸酯、1,3-丁二醇二乙酸酯、1,6-己二醇二乙酸酯等二乙酸酯類、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基乙酸乙酯、3-甲基-3-甲氧基丁基丙酸酯等烷氧基羧酸酯類、乙酸乙酯、乙酸正丙酯、乙酸異丙酯、乙酸正丁酯、乙酸異丁酯、甲酸正戊酯、乙酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸異丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯、2-氧代丁酸乙酯等其他酯類、甲苯、二甲苯等芳香族烴類、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯啶酮等 醯胺或內醯胺類等。 Examples of the solvent include: ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethyl Glycol monoethyl ether, diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol Mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether (Poly)alkylene glycol monoalkyl ethers, methyl lactate, ethyl lactate and other alkyl lactates, methanol, ethanol, propanol, butanol, isopropanol, isobutanol, tertiary butanol, pungent Alcohol, 2-ethylhexanol, cyclohexanol and other (cyclo)alkyl alcohols, diacetone alcohol and other ketone alcohols, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethyl Glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, dipropylene glycol monomethyl ether acetate, 3-methoxybutyl Acetate, 3-methyl-3-methoxybutyl acetate and other (poly)alkylene glycol monoalkyl ether acetates, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, Diethylene glycol diethyl ether, tetrahydrofuran and other ethers, methyl ethyl ketone, 2-heptanone, 3-heptanone and other chain ketones, cyclopentanone, cyclohexanone and other cyclic ketones, propylene glycol two Acetate, 1,3-butanediol diacetate, 1,6-hexanediol diacetate and other diacetate esters, methyl 3-methoxypropionate, 3-methoxypropionic acid Alkoxy carboxylates such as ethyl ester, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, 3-methyl-3-methoxybutyl propionate, etc. Esters, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-pentyl formate, isoamyl acetate, n-butyl propionate, ethyl butyrate, butyl N-Propyl Acetate, Isopropyl Butyrate, n-Butyl Butyrate, Methyl Pyruvate, Ethyl Pyruvate, N-Propyl Pyruvate, Methyl Acetate, Ethyl Acetate, 2-oxobutyl Other esters such as ethyl ester, aromatic hydrocarbons such as toluene and xylene, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, etc. Amines or internal amides, etc.

該組成物中的溶媒的含量並無特別限定。作為該組成物中的固體成分濃度(除了溶媒以外的各成分的合計濃度)的下限,較佳為5質量%,更佳為10質量%。另一方面,作為所述固體成分濃度的上限,較佳為50質量%,更佳為40質量%。藉由將固體成分濃度設為所述範圍內,分散性、穩定性、塗佈性等變得更良好。 The content of the solvent in the composition is not particularly limited. The lower limit of the solid content concentration in the composition (the total concentration of each component other than the solvent) is preferably 5% by mass, and more preferably 10% by mass. On the other hand, the upper limit of the solid content concentration is preferably 50% by mass, and more preferably 40% by mass. By setting the solid content concentration within the above range, dispersibility, stability, coatability, etc. become better.

(製備方法) (Preparation)

作為該組成物的製備方法,並無特別限定,可藉由將各成分混合而製備。例如,於該組成物包含作為[B]紅外線遮蔽劑的金屬氧化物、及[C]分散劑的情況下,可採用如下方法:首先製備含有[B]紅外線遮蔽劑、[C]分散劑及溶媒的分散液,於所述分散液中添加[A]酞菁化合物或其他成分並加以混合。分散液或該組成物亦可視需要實施過濾處理而去除凝聚物。 The preparation method of the composition is not particularly limited, and it can be prepared by mixing the components. For example, in the case where the composition contains a metal oxide as [B] an infrared shielding agent and a [C] dispersant, the following method can be used: firstly, a preparation containing [B] an infrared shielding agent, [C] a dispersant, and In the dispersion liquid of the solvent, [A] the phthalocyanine compound or other components are added to the dispersion liquid and mixed. The dispersion or the composition may also be filtered as necessary to remove aggregates.

<紅外線遮蔽膜(I)> <Infrared shielding film (I)>

本發明的一實施形態的紅外線遮蔽膜(I)是由該固體攝像元件用組成物形成的固體攝像元件用紅外線遮蔽膜。關於具有該紅外線遮蔽膜(I)的固體攝像元件用光學濾光片,即便於所含的有機色素的種類少的情況下,亦兼具良好的可見光穿透性與紅外線遮蔽性。另外,該紅外線遮蔽膜(I)的可見光區域的均勻穿透性優異。 The infrared shielding film (I) of one embodiment of the present invention is an infrared shielding film for solid-state imaging devices formed from the composition for solid-state imaging devices. Regarding the optical filter for a solid-state imaging element having this infrared shielding film (I), even when the types of organic dyes contained are small, it has both good visible light transmittance and infrared shielding properties. In addition, the infrared shielding film (I) has excellent uniform transmittance in the visible light region.

該紅外線遮蔽膜(I)較佳為作為一構成構件而被組入至固體攝像元件中。該情況下,該紅外線遮蔽膜(I)以單體的形式作為光學濾光片(紅外線截止濾光片)發揮功能。藉由於固體攝像元件中組入該紅外線遮蔽膜(I),可獲得大的製程裕度等而較佳。於該紅外線遮蔽膜(I)被組入至固體攝像元件中的情況下,該紅外線遮蔽膜(I)例如可配置於固體攝像元件的微透鏡的外表面側、微透鏡與彩色濾光片之間、彩色濾光片與光電二極體之間等。該紅外線遮蔽膜(I)較佳為積層於微透鏡與彩色濾光片之間或彩色濾光片與光電二極體之間。 The infrared shielding film (I) is preferably incorporated into a solid-state imaging device as a constituent member. In this case, the infrared shielding film (I) functions as an optical filter (infrared cut filter) as a single body. Since the infrared shielding film (I) is incorporated into the solid-state imaging device, a large process margin can be obtained, which is preferable. In the case where the infrared shielding film (I) is incorporated into the solid-state imaging device, the infrared shielding film (I) can be arranged on the outer surface side of the microlens of the solid-state imaging device, between the microlens and the color filter, for example. Between the color filter and the photodiode, etc. The infrared shielding film (I) is preferably laminated between the microlens and the color filter or between the color filter and the photodiode.

作為所述光學濾光片,亦可為於透明基板的表面積層有該紅外線遮蔽膜(I)而成者。作為所述透明基板,可採用玻璃或透明樹脂等。作為所述透明樹脂,可列舉聚碳酸酯、聚酯、芳香族聚醯胺、聚醯胺醯亞胺、聚醯亞胺等。所述光學濾光片亦可作為固體攝像元件中的紅外線截止濾光片等而較佳地使用。 As the optical filter, the infrared shielding film (I) may be layered on the surface of a transparent substrate. As the transparent substrate, glass, transparent resin, or the like can be used. Examples of the transparent resin include polycarbonate, polyester, aromatic polyamide, polyimide, and polyimide. The optical filter can also be preferably used as an infrared cut filter in a solid-state imaging device, etc.

具備所述光學濾光片的固體攝像元件於數位靜態照相機、行動電話用照相機、數位攝像機、個人電腦(Personal Computer,PC)照相機、監視照相機、汽車用照相機、可攜式資訊終端機、電腦、影像遊戲、醫療機器等中有用。 The solid-state imaging element equipped with the optical filter is used in digital still cameras, mobile phone cameras, digital video cameras, personal computer (PC) cameras, surveillance cameras, automotive cameras, portable information terminals, computers, Useful in video games, medical equipment, etc.

該紅外線遮蔽膜(I)例如可藉由以下方法形成。首先,於支持體上塗佈該組成物後,進行預烘烤而使溶媒蒸發,從而形成塗膜。繼而,於對所述塗膜進行曝光後,使用顯影液進行顯影,並將塗膜的未曝光部溶解去除。其後,藉由進行後烘烤,可獲得 經圖案化為規定形狀的紅外線遮蔽膜(I)。再者,於該組成物不含[D]聚合性化合物及[E]聚合起始劑的情況下,亦可不進行曝光等硬化處理。另外,亦可不進行顯影處理,該情況下,可形成未經圖案化的紅外線遮蔽膜(I)。 This infrared shielding film (I) can be formed by the following method, for example. First, after coating the composition on a support, prebaking is performed to evaporate the solvent to form a coating film. Then, after exposing the coating film, development is performed using a developing solution, and the unexposed part of the coating film is dissolved and removed. Afterwards, by post-baking, you can get Patterned into a predetermined shape infrared shielding film (I). In addition, when the composition does not contain [D] polymerizable compound and [E] polymerization initiator, hardening treatment such as exposure may not be performed. In addition, the development process may not be performed, and in this case, an unpatterned infrared shielding film (I) can be formed.

作為塗佈該組成物的所述支持體,所述透明基板、微透鏡、彩色濾光片等適合。所述塗佈可採用噴霧法、輥塗法、旋轉塗佈法(旋塗法)、縫模塗佈法(狹縫塗佈法)、棒塗佈法等適宜的塗佈法。 As the support on which the composition is applied, the transparent substrate, microlens, color filter, etc. are suitable. Suitable coating methods such as spray method, roll coating method, spin coating method (spin coating method), slot die coating method (slit coating method), bar coating method, etc. can be used for the coating.

作為所述預烘烤的加熱乾燥的條件,例如為70℃以上且110℃以下、1分鐘以上且10分鐘以下左右。 The conditions of the heat drying of the pre-baking are, for example, about 70° C. or more and 110° C. or less, 1 minute or more and 10 minutes or less.

作為塗膜的曝光中使用的放射線的光源,例如可列舉:氙氣燈、鹵素燈、鎢燈、高壓水銀燈、超高壓水銀燈、金屬鹵素燈、中壓水銀燈、低壓水銀燈等燈光源或氬離子雷射、釔鋁石榴石(yttrium aluminum garnet,YAG)雷射、XeCl準分子雷射、氮氣雷射等雷射光源等。作為曝光光源,亦可使用紫外線發光二極體(light emitting diode,LED)。波長較佳為190nm以上且450nm以下的範圍內的放射線。放射線的曝光量通常為10J/m2以上且50,000J/m2以下左右。 As the light source of the radiation used in the exposure of the coating film, for example, a light source such as a xenon lamp, a halogen lamp, a tungsten lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a metal halide lamp, a medium pressure mercury lamp, a low pressure mercury lamp, etc., or an argon ion laser , Yttrium aluminum garnet (YAG) laser, XeCl excimer laser, nitrogen laser and other laser light sources. As the exposure light source, an ultraviolet light emitting diode (LED) can also be used. The wavelength is preferably radiation within a range of 190 nm or more and 450 nm or less. The radiation exposure is generally 10J / m 2 or more and 50,000J / or less about 2 m.

作為所述顯影液,通常為鹼性顯影液。作為鹼性顯影液,例如較佳為碳酸鈉、碳酸氫鈉、氫氧化鈉、氫氧化鉀、四甲基氫氧化銨、膽鹼、1,8-二氮雜雙環-[5.4.0]-7-十一烯、1,5-二氮雜雙環-[4.3.0]-5-壬烯等的水溶液。於鹼性顯影液中例如亦可添加適 量的甲醇、乙醇等水溶性有機溶媒或界面活性劑等。再者,顯影後通常進行水洗。 As the developer, an alkaline developer is usually used. As the alkaline developer, for example, sodium carbonate, sodium bicarbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, 1,8-diazabicyclo-[5.4.0]- Aqueous solutions of 7-undecene, 1,5-diazabicyclo-[4.3.0]-5-nonene, etc. In the alkaline developer, for example, suitable The amount of methanol, ethanol and other water-soluble organic solvents or surfactants. In addition, water washing is usually performed after development.

作為顯影處理法,可應用噴淋顯影法、噴霧顯影法、浸漬(dip)顯影法、覆液(puddle)顯影法等。顯影條件於常溫下為5秒以上且300秒以下左右。 As the development treatment method, a shower development method, a spray development method, a dip development method, a puddle development method, and the like can be applied. The development conditions are about 5 seconds or more and 300 seconds or less at room temperature.

作為後烘烤的條件,通常為180℃以上且280℃以下、1分鐘以上且60分鐘以下左右。 The conditions for post-baking are usually about 180°C or higher and 280°C or lower, 1 minute or longer and 60 minutes or shorter.

作為以所述方式形成的紅外線遮蔽膜(I)的平均膜厚的下限,通常為0.5μm,較佳為1μm。另一方面,作為所述平均膜厚的上限,通常為5μm,較佳為3μm。藉由紅外線遮蔽膜(I)的平均膜厚為所述範圍內,可見光穿透性與紅外線遮蔽性的平衡變得更良好。另外,紅外線遮蔽膜(I)的較佳的可見光穿透率及紅外線穿透率可應用後述紅外線遮蔽膜(II)的範圍。 As the lower limit of the average film thickness of the infrared shielding film (I) formed in the above-mentioned manner, it is usually 0.5 μm, preferably 1 μm. On the other hand, as the upper limit of the average film thickness, it is usually 5 μm, preferably 3 μm. When the average film thickness of the infrared shielding film (I) is within the above range, the balance between visible light transmittance and infrared shielding properties becomes better. In addition, the preferable visible light transmittance and infrared transmittance of the infrared shielding film (I) can be applied to the range of the infrared shielding film (II) described later.

<紅外線遮蔽膜(II)> <Infrared shielding film (II)>

本發明的一實施形態的紅外線遮蔽膜(II)為一種固體攝像元件用紅外線遮蔽膜,其實質上含有僅一種或兩種有機色素,且滿足下述(A)~(C)。 The infrared shielding film (II) of one embodiment of the present invention is an infrared shielding film for solid-state imaging devices, which substantially contains only one or two organic dyes, and satisfies the following (A) to (C).

(A)波長430nm以上且580nm以下的範圍內的穿透率的平均值為75%以上 (A) The average transmittance in the wavelength range of 430nm or more and 580nm or less is 75% or more

(B)波長700nm以上且900nm以下的範圍內的穿透率的平均值為16.5%以下 (B) The average transmittance in the wavelength range of 700nm or more and 900nm or less is 16.5% or less

(C)波長1200nm下的穿透率為10%以下 (C) The transmittance at a wavelength of 1200nm is less than 10%

具備該紅外線遮蔽膜(II)的固體攝像元件用光學濾光片兼具良好的可見光穿透性與紅外線遮蔽性。另外,該紅外線遮蔽膜(II)實質上僅含有一種或兩種有機色素,因此容易製備,生產性高。此處,所謂「實質上含有僅一種或兩種有機色素」是指一種或兩種有機色素於所含的全部有機色素中所佔的含有比例為90質量%以上。所述含有比例較佳為99質量%以上,更佳為99.9質量%以上。該紅外線遮蔽膜(II)較佳為實質上僅含有一種有機色素。 The optical filter for a solid-state imaging element provided with this infrared shielding film (II) has both good visible light transmittance and infrared shielding properties. In addition, the infrared shielding film (II) substantially contains only one or two organic dyes, so it is easy to prepare and has high productivity. Here, "substantially containing only one or two organic dyes" means that the content of one or two organic dyes in all organic dyes contained is 90% by mass or more. The content ratio is preferably 99% by mass or more, more preferably 99.9% by mass or more. The infrared shielding film (II) preferably contains substantially only one organic pigment.

具有該紅外線遮蔽膜(II)的光學濾光片的形態、即該紅外線遮蔽膜(II)的使用形態與所述紅外線遮蔽膜(I)相同。 The form of the optical filter having the infrared shielding film (II), that is, the use form of the infrared shielding film (II) is the same as the infrared shielding film (I).

(A)波長430nm以上且580nm以下的範圍內的穿透率的平均值的下限為75%,較佳為78%,更佳為80%。藉由所述穿透率的平均值為所述下限以上,可發揮良好的可見光穿透性。另一方面,作為所述穿透率的平均值的上限,例如可為95%,亦可為90%,亦可為85%。 (A) The lower limit of the average value of the transmittance in the wavelength range of 430 nm or more and 580 nm or less is 75%, preferably 78%, and more preferably 80%. Since the average value of the transmittance is equal to or greater than the lower limit, good visible light transmittance can be exhibited. On the other hand, as the upper limit of the average value of the transmittance, for example, it may be 95%, 90%, or 85%.

(B)波長700nm以上且900nm以下的範圍內的穿透率的平均值的上限為16.5%,較佳為16%,更佳為15.5%,進而佳為15%,有時亦進而佳為14%。藉由所述穿透率的平均值為所述上限以下,可發揮近紅外線的良好的遮蔽性。另一方面,作為所述平均值的下限,例如可為5%,亦可為10%,亦可為12%。 (B) The upper limit of the average value of the transmittance in the range of 700 nm or more and 900 nm or less is 16.5%, preferably 16%, more preferably 15.5%, still more preferably 15%, and sometimes even more preferably 14. %. When the average value of the transmittance is equal to or less than the upper limit, good shielding properties of near-infrared rays can be exhibited. On the other hand, as the lower limit of the average value, for example, it may be 5%, may be 10%, or may be 12%.

作為波長430nm以上且580nm以下的範圍內的穿透率的平均值(S)相對於波長700nm以上且900nm以下的範圍內的 穿透率的平均值(N)的比(S/N比)的下限,較佳為5,更佳為5.2。另一方面,作為所述比的上限,可為10,亦可為8,亦可為6.5。 As the average value (S) of the transmittance in the range of wavelength 430nm or more and 580nm or less relative to the wavelength in the range of 700nm or more and 900nm or less The lower limit of the ratio (S/N ratio) of the average value (N) of the transmittance is preferably 5, more preferably 5.2. On the other hand, the upper limit of the ratio may be 10, 8, or 6.5.

(C)波長1200nm下的穿透率的上限為10%,較佳為8%,更佳為7%,進而佳為6.1%。藉由所述穿透率為所述上限以下,可發揮良好的紅外線遮蔽性。另一方面,作為所述穿透率的下限,例如可為3%,亦可為5%,亦可為5.5%。 (C) The upper limit of the transmittance at a wavelength of 1200 nm is 10%, preferably 8%, more preferably 7%, and still more preferably 6.1%. When the transmittance is equal to or lower than the upper limit, good infrared shielding properties can be exhibited. On the other hand, as the lower limit of the transmittance, for example, it may be 3%, may be 5%, or may be 5.5%.

於該紅外線遮蔽膜(II)中,較佳為滿足下述(D)。 In this infrared shielding film (II), it is preferable that the following (D) is satisfied.

(D)下述式所表示的可見光均勻穿透率為10%以下 (D) The uniform transmittance of visible light expressed by the following formula is 10% or less

所述可見光均勻穿透率的上限更佳為9%,進而佳為8%。藉由可見光均勻穿透率為所述上限以下,可實現可見光的穿透性的均勻化,可進行更良好的視敏度修正等。再者,作為所述可見光均勻穿透率的下限,並無特別限定,例如可為1%,亦可為3%,亦可為5%。 The upper limit of the uniform transmittance of visible light is more preferably 9%, and still more preferably 8%. When the uniform transmittance of visible light is less than the upper limit, the transmittance of visible light can be made uniform, and better visual acuity correction can be performed. Furthermore, the lower limit of the uniform transmittance of visible light is not particularly limited, and it may be, for example, 1%, 3%, or 5%.

可見光均勻穿透率={(波長430nm以上且580nm以下的範圍內的穿透率的平均值-波長430nm以上且580nm以下的範圍內的穿透率的最低值)/波長430nm以上且580nm以下的範圍內的穿透率的平均值}×100(%) Visible light uniform transmittance=((average value of transmittance in the range of wavelength 430nm or more and 580nm or less-the lowest value of transmittance in the range of wavelength 430nm or more and 580nm or less)/wavelength of 430nm or more and 580nm or less The average penetration rate in the range)×100(%)

該紅外線遮蔽膜(II)例如可藉由作為所述本發明的一實施形態的固體攝像元件用組成物而形成。該紅外線遮蔽膜(II)的形成方法亦與作為紅外線遮蔽膜(I)的形成方法而敘述的方法相同。其中,於所使用的該組成物中,實質上含有僅一種或兩種 有機色素,至少[A]酞菁化合物相當於有機色素。即,於該紅外線遮蔽膜(II)中,所述有機色素較佳為所述式(1)所表示的酞菁化合物([A]酞菁化合物)。 The infrared shielding film (II) can be formed by, for example, the composition for a solid-state imaging device as an embodiment of the present invention. The method of forming the infrared shielding film (II) is also the same as the method described as the method of forming the infrared shielding film (I). Among them, the composition used essentially contains only one or two The organic dye, at least [A] phthalocyanine compound is equivalent to the organic dye. That is, in the infrared shielding film (II), the organic dye is preferably a phthalocyanine compound ([A] phthalocyanine compound) represented by the formula (1).

用以形成該紅外線遮蔽膜(II)的固體攝像元件用組成物的較佳形態亦為如所述該固體攝像元件用組成物所述。即,該紅外線遮蔽膜(II)較佳為進而含有紅外線遮蔽劑([B]紅外線遮蔽劑),所述紅外線遮蔽劑為金屬氧化物、銅化合物或者該些的組合。另外,[B]紅外線遮蔽劑較佳為氧化鎢銫。該紅外線遮蔽膜(II)的其他較佳的形態亦與由該固體攝像元件用組成物形成的紅外線遮蔽膜(I)相同。 A preferable form of the composition for a solid-state imaging device for forming the infrared shielding film (II) is also as described in the composition for a solid-state imaging device. That is, the infrared shielding film (II) preferably further contains an infrared shielding agent ([B] infrared shielding agent), and the infrared shielding agent is a metal oxide, a copper compound, or a combination of these. In addition, [B] the infrared shielding agent is preferably cesium tungsten oxide. Other preferable forms of the infrared shielding film (II) are the same as those of the infrared shielding film (I) formed from the composition for solid-state imaging devices.

該紅外線遮蔽膜(II)較佳為包含具有交聯結構的聚合物。具有所述交聯結構的聚合物藉由所述[D]聚合性化合物、於側鏈具有聚合性不飽和鍵等聚合性基的聚合物等的聚合(交聯)反應而形成。即,包含具有交聯結構的聚合物的紅外線遮蔽膜(II)為包含[D]聚合性化合物等及[E]聚合起始劑的該組成物的硬化膜。所述紅外線遮蔽膜(II)藉由對該組成物的塗膜實施放射線的照射或加熱等硬化處理而獲得。所述紅外線遮蔽膜(II)例如與熔融成形的膜狀者相比可發揮良好的硬度或耐熱性等。另外,所述紅外線遮蔽膜(II)亦具有如下優點:可作為經由遮罩等進行圖案化的任意形狀的硬化膜而較容易地獲得。 The infrared shielding film (II) preferably contains a polymer having a crosslinked structure. The polymer having the crosslinked structure is formed by the polymerization (crosslinking) reaction of the [D] polymerizable compound, a polymer having a polymerizable group such as a polymerizable unsaturated bond in a side chain, and the like. That is, the infrared shielding film (II) containing a polymer having a crosslinked structure is a cured film of the composition containing [D] a polymerizable compound and the like and [E] a polymerization initiator. The infrared shielding film (II) is obtained by subjecting the coating film of the composition to a curing treatment such as radiation irradiation or heating. The infrared shielding film (II) can exhibit good hardness, heat resistance, etc., compared to, for example, a melt-molded film. In addition, the infrared shielding film (II) also has the advantage that it can be easily obtained as a cured film of any shape that is patterned through a mask or the like.

<固體攝像元件> <Solid-state imaging device>

本發明的一實施形態的固體攝像元件是具有該紅外線遮蔽膜 (I)或該紅外線遮蔽膜(II)的固體攝像元件。關於該固體攝像元件,即便於所含的有機色素的種類少的情況下,亦具有兼具良好的可見光穿透性與紅外線遮蔽性的紅外線遮蔽膜,因此進行了良好的視敏度修正。 The solid-state imaging device of one embodiment of the present invention has the infrared shielding film (I) or the solid-state imaging element of the infrared shielding film (II). Regarding this solid-state imaging element, even when the types of organic dyes contained are small, it has an infrared shielding film that has both good visible light transmittance and infrared shielding properties, and therefore good visual acuity correction is performed.

該固體攝像元件通常具有配置有多個光電二極體的層、彩色濾光片及微透鏡依次積層而成的結構。另外,亦可於該些層間設置平坦化層。於該固體攝像元件中自微透鏡側入射光。入射光穿透微透鏡及彩色濾光片而到達光電二極體。再者,關於彩色濾光片,例如於R(紅)、G(綠)及B(藍)的濾光片各自中,以僅特定的波長範圍的光穿透的方式構成。 This solid-state imaging element generally has a structure in which a layer in which a plurality of photodiodes are arranged, a color filter, and a microlens are laminated in this order. In addition, a planarization layer may also be provided between these layers. Light enters the solid-state imaging element from the side of the microlens. The incident light penetrates the micro lens and the color filter to reach the photodiode. Furthermore, with regard to the color filter, for example, each of the R (red), G (green), and B (blue) filters is configured to transmit only light in a specific wavelength range.

於該固體攝像元件中,該紅外線遮蔽膜(I)或該紅外線遮蔽膜(II)可設置於所述微透鏡的外表面側、所述微透鏡與所述彩色濾光片之間、所述彩色濾光片與所述配置有多個光電二極體的層之間等。該紅外線遮蔽膜(I)或該紅外線遮蔽膜(II)較佳為積層於微透鏡與彩色濾光片之間或彩色濾光片與光電二極體之間。再者,於該紅外線遮蔽膜(I)或該紅外線遮蔽膜(II)與微透鏡、彩色濾光片、光電二極體等之間亦可進一步設置其他層(平坦化層等)。 In the solid-state imaging element, the infrared shielding film (I) or the infrared shielding film (II) may be provided on the outer surface side of the microlens, between the microlens and the color filter, and Between the color filter and the layer in which a plurality of photodiodes are arranged, etc. The infrared shielding film (I) or the infrared shielding film (II) is preferably laminated between the microlens and the color filter or between the color filter and the photodiode. Furthermore, other layers (planarization layers, etc.) may be further provided between the infrared shielding film (I) or the infrared shielding film (II) and the microlenses, color filters, photodiodes, and the like.

作為該固體攝像元件的具體例,可列舉作為照相機模組的CCD或CMOS等。該固體攝像元件於數位靜態照相機、行動電話用照相機、數位攝像機、PC照相機、監視照相機、汽車用照相機、可攜式資訊終端機、電腦、影像遊戲、醫療機器等中有用。 As a specific example of this solid-state imaging element, CCD, CMOS, etc. which are a camera module are mentioned. The solid-state imaging element is useful in digital still cameras, mobile phone cameras, digital video cameras, PC cameras, surveillance cameras, automotive cameras, portable information terminals, computers, video games, medical equipment, and the like.

[實施例] [Example]

以下,基於實施例對本發明加以具體說明,但本發明並不限定於該些實施例。 Hereinafter, the present invention will be specifically described based on examples, but the present invention is not limited to these examples.

<合成例1> <Synthesis Example 1>

根據所述流程1合成下述式所表示的酞菁化合物(A-1)(極大吸收波長735nm)。作為起始原料,使用1,2-二氰基-3,6-二(4-甲氧基丁基)苯。作為「1.鹼(base)」,使用戊醇鋰(固體鋰及戊烷-1-醇),作為「2.酸(acid)」,使用冰乙酸。另外,作為提供M2+的鹽,使用氧釩鹽。 The phthalocyanine compound (A-1) represented by the following formula (maximum absorption wavelength 735 nm) was synthesized according to the above-mentioned scheme 1. As a starting material, 1,2-dicyano-3,6-bis(4-methoxybutyl)benzene was used. As "1. base", lithium pentanoxide (solid lithium and pentane-1-ol) was used, and as "2. acid", glacial acetic acid was used. In addition, as the salt that provides M 2+ , vanadyl salt is used.

Figure 107109232-A0305-02-0037-5
Figure 107109232-A0305-02-0037-5

<合成例2> <Synthesis example 2>

使用日本專利特開平05-25177的段落[0020]~段落[0025](實施例1)中記載的方法,合成下述式所表示的酞菁化合物(a-1)(極大吸收波長692nm)。 Using the method described in paragraph [0020] to paragraph [0025] (Example 1) of JP 05-25177, the phthalocyanine compound (a-1) (maximum absorption wavelength 692 nm) represented by the following formula was synthesized.

Figure 107109232-A0305-02-0038-6
Figure 107109232-A0305-02-0038-6

<合成例3> <Synthesis Example 3>

使用日本專利特開2016-204536號公報的段落[0075](實施例4)中記載的方法,合成下述式所表示的酞菁化合物(a-2)(極大吸收波長728nm)。 Using the method described in paragraph [0075] (Example 4) of JP 2016-204536 A, the phthalocyanine compound (a-2) (maximum absorption wavelength 728 nm) represented by the following formula was synthesized.

Figure 107109232-A0305-02-0038-7
Figure 107109232-A0305-02-0038-7

除此以外,所使用的色素為如下所述。 In addition, the dyes used are as follows.

.化合物(a-3):山田化學工業公司的「FDN-002」(酞菁化合物:極大吸收波長807nm) . Compound (a-3): Yamada Chemical Industry Co., Ltd. "FDN-002" (phthalocyanine compound: maximum absorption wavelength 807nm)

<合成例4> <Synthesis Example 4>

使用日本專利第4096205號公報的段落[0113]中記載的方法,合成氧化鎢銫(Cs0.33WO3)粉末。 The method described in paragraph [0113] of Japanese Patent No. 4096205 was used to synthesize cesium tungsten oxide (Cs 0.33 WO 3 ) powder.

[製備例] [Preparation example]

準備所述氧化鎢銫25.00質量份、作為分散劑的畢克化學(BYK-Chemie)公司的「畢克(BYK)-LPM6919」(固體成分濃度61質量%、胺價120mgKOH/g)13.11質量份、以及作為溶媒(分散介質)的環戊酮(cyclopentanone,CPN)61.89質量份。將該些與0.1mm徑的氧化鋯顆粒2000質量份一起填充於容器中,利用塗料振盪器進行分散,藉此獲得平均粒徑(D50)為19nm的分散液。再者,平均粒徑是使用光散射測定裝置(德國ALV公司的「ALV-5000」)並利用動態光散射(dynamic light Scattering,DLS)法來測定。 Prepare 25.00 parts by mass of the cesium tungsten oxide, and "BYK-LPM6919" of BYK-Chemie as a dispersant (solid content 61% by mass, amine value 120mgKOH/g) 13.11 parts by mass , And 61.89 parts by mass of cyclopentanone (CPN) as a solvent (dispersion medium). These were filled in a container with 2000 parts by mass of zirconia particles having a diameter of 0.1 mm, and dispersed by a paint shaker, thereby obtaining a dispersion liquid having an average particle diameter (D50) of 19 nm. In addition, the average particle size was measured by a light scattering measuring device ("ALV-5000" of ALV Company, Germany) and a dynamic light scattering (DLS) method.

[實施例1] [Example 1]

於容器中量取所述分散液50.00質量份、酞菁化合物(A-1)0.75質量份、作為聚合性化合物的日本化藥公司的「卡亞拉得(KAYARAD)DPHA」(二季戊四醇六丙烯酸酯與二季戊四醇五丙烯酸酯的混合物)7.01質量份、作為聚合起始劑的艾迪科(ADEKA) 公司的「NCI-930」(O-乙醯基肟系化合物)0.70質量份、作為界面活性劑的奈奧斯(NEOS)公司的「FTX-218D」(氟系界面活性劑)0.02質量份、作為抗氧化劑的巴斯夫公司的「易璐諾斯(Irganox)1010」(酚系抗氧化劑)0.01質量份、以及作為溶媒的環戊酮(CPN)41.50質量份,利用攪拌機進行混合。使用0.5μm的聚四氟乙烯(Polytetrafluoroethylene,PTFE)製過濾器於0.5MPa下對所述混合物200mL進行3分鐘加壓過濾,藉此獲得實施例1的組成物。 In a container, weigh 50.00 parts by mass of the dispersion, 0.75 parts by mass of the phthalocyanine compound (A-1), and "KAYARAD DPHA" (dipentaerythritol hexaacrylic acid) produced by Nippon Kayaku Co., Ltd. as a polymerizable compound. A mixture of ester and dipentaerythritol pentaacrylate) 7.01 parts by mass, ADEKA as a polymerization initiator 0.70 parts by mass of the company's "NCI-930" (O-acetyl oxime compound), 0.02 parts by mass of "FTX-218D" (fluorine-based surfactant) of NEOS as a surfactant, 0.01 parts by mass of "Irganox 1010" (phenolic antioxidant) of BASF as an antioxidant and 41.50 parts by mass of cyclopentanone (CPN) as a solvent were mixed with a mixer. Using a 0.5 μm polytetrafluoroethylene (PTFE) filter, 200 mL of the mixture was subjected to pressure filtration at 0.5 MPa for 3 minutes, thereby obtaining the composition of Example 1.

[實施例2~實施例3、比較例1~比較例3] [Example 2 to Example 3, Comparative Example 1 to Comparative Example 3]

除了將各成分的組成設為表1所示以外,與實施例1同樣地獲得實施例2~實施例3及比較例1~比較例3的各組成物。 Except having made the composition of each component as shown in Table 1, it carried out similarly to Example 1, and obtained each composition of Example 2-Example 3 and Comparative Example 1-Comparative Example 3.

[評價] [Evaluation]

使用所得的各組成物,進行以下的評價。將評價結果示於表1中。 Using each obtained composition, the following evaluation was performed. The evaluation results are shown in Table 1.

於玻璃基板上以成為規定膜厚的方式利用旋塗法塗佈各組成物。其後,於100℃下對塗膜進行120秒加熱,利用i射線步進機以成為1000mJ/cm2的方式進行曝光。繼而,藉由於220℃下進行300秒加熱,而於玻璃基板上製作平均膜厚1.4μm~1.6μm的紅外線遮蔽膜。將各平均膜厚示於表1中。再者,利用觸針式階差計(大和科學公司的「α步進(Step)IQ」)測定膜厚。其次,使用分光光度計(日本分光公司的「V-7300」),以玻璃基板對比測定所述玻璃基板上製作的紅外線遮蔽膜的各波長區域中的穿透 率。根據所得的光譜,藉由以下所述的評價基準進行評價。再者,將實施例1的紅外線遮蔽膜的穿透光譜示於圖1中。再者,於圖1的穿透光譜中,橫軸為波長(nm),縱軸為穿透率(%)。 Each composition was applied on a glass substrate by a spin coating method so as to have a predetermined film thickness. After that, the coating film was heated at 100°C for 120 seconds, and exposed to 1000 mJ/cm 2 by an i-ray stepper. Then, by heating at 220° C. for 300 seconds, an infrared shielding film with an average film thickness of 1.4 μm to 1.6 μm was produced on the glass substrate. Table 1 shows each average film thickness. Furthermore, the film thickness was measured with a stylus-type step meter (“α Step IQ” from Daiwa Scientific Co., Ltd.). Next, using a spectrophotometer ("V-7300" of JASCO Corporation), the transmittance in each wavelength region of the infrared shielding film produced on the glass substrate was measured by comparison with the glass substrate. Based on the obtained spectrum, the evaluation was performed based on the evaluation criteria described below. Furthermore, the transmission spectrum of the infrared shielding film of Example 1 is shown in FIG. 1. Furthermore, in the transmission spectrum of FIG. 1, the horizontal axis is wavelength (nm), and the vertical axis is transmission rate (%).

(可見光穿透性) (Visible light penetration)

計算出430nm-580nm的平均穿透率。於平均穿透率未滿70%的情況下,作為紅外線遮蔽膜來使用時的感度下降。另外,關於所述平均穿透率,利用以下基準進行評價。 Calculate the average transmittance of 430nm-580nm. When the average transmittance is less than 70%, the sensitivity when used as an infrared shielding film decreases. In addition, the average transmittance was evaluated using the following criteria.

A:80%以上 A: More than 80%

B:70%以上且未滿80% B: More than 70% and less than 80%

C:未滿70% C: Less than 70%

(紅外線遮蔽性1) (Infrared shielding 1)

計算出700nm-900nm的平均穿透率。於平均穿透率為20%以上的情況下,作為紅外線遮蔽膜來使用時雜訊量增大。另外,關於所述平均穿透率,利用以下基準進行評價。 Calculate the average transmittance of 700nm-900nm. When the average transmittance is 20% or more, the amount of noise increases when used as an infrared shielding film. In addition, the average transmittance was evaluated using the following criteria.

A:未滿15% A: Less than 15%

B:15%以上且未滿20% B: 15% or more and less than 20%

C:20%以上 C: more than 20%

(紅外線遮蔽性2) (Infrared shielding 2)

關於波長1200nm的穿透率,可以說穿透性未滿15%且顯示出實用上良好的紅外線遮蔽性。關於波長1200nm的穿透率,利用以下基準進行評價。 Regarding the transmittance at a wavelength of 1200 nm, it can be said that the transmittance is less than 15% and it shows practically good infrared shielding properties. The transmittance at a wavelength of 1200 nm was evaluated using the following criteria.

A:未滿10% A: Less than 10%

B:10%以上且未滿15% B: More than 10% and less than 15%

C:15%以上 C: 15% or more

(S/N比) (S/N ratio)

獲取所述可見光區域(430nm-580nm)的平均穿透率(S)與紅外區域(700nm-900nm)的平均穿透率(N)的比(S/N比),對實用性能進行推測。S/N比的數值越高,性能越良好,於為5以上的情況下,判斷為實用水準而可使用。關於S/N比,利用以下基準進行評價。 The ratio (S/N ratio) of the average transmittance (S) in the visible light region (430nm-580nm) to the average transmittance (N) in the infrared region (700nm-900nm) is obtained, and the practical performance is estimated. The higher the value of the S/N ratio, the better the performance. If it is 5 or more, it is judged to be a practical level and can be used. The S/N ratio was evaluated using the following criteria.

A:5以上 A: 5 or more

B:未滿5 B: less than 5

(可見光均勻穿透性) (Visible light uniform penetration)

根據所述可見光區域(430nm-580nm)的平均穿透率(S)與所述可見光區域的最低穿透率(Smin),基於下述式,求出X(可見光均勻穿透率),評價可見光的均勻穿透性。 According to the average transmittance (S) of the visible light region (430nm-580nm) and the lowest transmittance (S min ) of the visible light region, based on the following formula, X (uniform visible light transmittance) is calculated and evaluated Uniform penetration of visible light.

X=((S-Smin)/S)×100(%) X=((SS min )/S)×100(%)

可判斷所述X越小,可見光的均勻穿透性越高。關於所述X,利用以下基準進行評價。 It can be judged that the smaller the X, the higher the uniform penetration of visible light. Regarding the X, the following criteria were used for evaluation.

A:未滿10% A: Less than 10%

B:10%以上 B: 10% or more

Figure 107109232-A0305-02-0043-8
Figure 107109232-A0305-02-0043-8

如所述表1所示般,實施例1~實施例3的紅外線遮蔽 膜的可見光穿透性與紅外線遮蔽性均良好(A或B),且可見光的均勻穿透性亦優異。另外,關於實施例1~實施例3的紅外線遮蔽膜,可知雖然有機色素的含有種僅為一種或兩種,但可顯現出所述良好的特性。 As shown in Table 1, the infrared shielding of Examples 1 to 3 The visible light penetration and infrared shielding properties of the film are both good (A or B), and the uniform penetration of visible light is also excellent. In addition, with regard to the infrared shielding films of Examples 1 to 3, it can be seen that although the organic dye contains only one or two types, the above-mentioned good characteristics can be expressed.

[產業上之可利用性] [Industrial availability]

本發明的固體攝像元件用組成物可較佳地用作固體攝像元件的光學濾光片、更具體而言紅外線濾光片等的形成材料。 The composition for a solid-state imaging device of the present invention can be preferably used as a material for forming an optical filter of a solid-state imaging device, more specifically an infrared filter, and the like.

Figure 107109232-A0101-11-0002-2
Figure 107109232-A0101-11-0002-2

Claims (13)

一種固體攝像元件用組成物,其含有下述式(1)所表示的酞菁化合物;
Figure 107109232-A0305-02-0045-9
式(1)中,多個R分別獨立地為烷基或芳基;多個X分別獨立地為氫原子、鹵素原子或烷基;多個X亦可相互鍵結並與該些所鍵結的碳鏈一起形成芳香環;M為兩個氫原子、二價金屬原子或者三價或四價的金屬原子的衍生物;多個n分別獨立地為3~6的整數。
A composition for a solid-state imaging element, which contains a phthalocyanine compound represented by the following formula (1);
Figure 107109232-A0305-02-0045-9
In formula (1), multiple Rs are each independently an alkyl group or an aryl group; multiple Xs are each independently a hydrogen atom, a halogen atom or an alkyl group; multiple Xs may also be bonded to each other and to these groups The carbon chains of together form an aromatic ring; M is a derivative of two hydrogen atoms, a divalent metal atom, or a trivalent or tetravalent metal atom; multiple n are each independently an integer of 3-6.
如申請專利範圍第1項所述的固體攝像元件用組成物,其進而含有紅外線遮蔽劑,所述紅外線遮蔽劑為金屬氧化物、所述酞菁化合物除外的銅 化合物或者該些的組合。 The composition for a solid-state imaging device according to the first item of the scope of patent application, which further contains an infrared shielding agent, and the infrared shielding agent is a metal oxide or copper other than the phthalocyanine compound Compound or combination of these. 如申請專利範圍第2項所述的固體攝像元件用組成物,其中所述紅外線遮蔽劑為氧化鎢銫。 The composition for a solid-state imaging element according to claim 2, wherein the infrared shielding agent is cesium tungsten oxide. 如申請專利範圍第2項或第3項所述的固體攝像元件用組成物,其中所述金屬氧化物、銅化合物或該些的組合的含量相對於全部固體成分而為1質量%以上且70質量%以下。 The composition for a solid-state imaging device according to the second or third item of the scope of patent application, wherein the content of the metal oxide, copper compound, or combination thereof is 1% by mass or more and 70% with respect to the total solid content. Less than mass%. 如申請專利範圍第2項或第3項所述的固體攝像元件用組成物,其中所述酞菁化合物的含量相對於全部固體成分而為0.1質量%以上且30質量%以下。 The composition for a solid-state imaging element according to the scope of patent application item 2 or item 3, wherein the content of the phthalocyanine compound is 0.1% by mass or more and 30% by mass or less with respect to the total solid content. 如申請專利範圍第2項或第3項所述的固體攝像元件用組成物,其中所述式(1)中的R為碳數1~12的直鏈狀或分支狀的烷基。 The composition for a solid-state imaging device according to the second or third item of the scope of patent application, wherein R in the formula (1) is a linear or branched alkyl group having 1 to 12 carbon atoms. 如申請專利範圍第2項或第3項所述的固體攝像元件用組成物,其中所述式(1)中的M為H2、Pd、Cu、Zn、Pt、Ni、Co、Fe、Mn、Sn、In、SnCl2、AlCl、VO或TiO。 The composition for a solid-state imaging element as described in item 2 or item 3 of the scope of patent application, wherein M in the formula (1) is H 2 , Pd, Cu, Zn, Pt, Ni, Co, Fe, Mn , Sn, In, SnCl 2 , AlCl, VO or TiO. 一種固體攝像元件用紅外線遮蔽膜,其是由如申請專利範圍第1項至第7項中任一項所述的固體攝像元件用組成物所形成。 An infrared shielding film for a solid-state imaging element is formed of the composition for a solid-state imaging element as described in any one of items 1 to 7 in the scope of patent application. 一種固體攝像元件用紅外線遮蔽膜,其實質上含有僅一種或兩種有機色素,且滿足下述(A)~(C),(A)波長430nm以上且580nm以下的範圍內的穿透率的平均值為75%以上, (B)波長700nm以上且900nm以下的範圍內的穿透率的平均值為16.5%以下,(C)波長1200nm下的穿透率為10%以下,所述有機色素是由下述式(1)所表示的酞菁化合物;
Figure 107109232-A0305-02-0047-10
式(1)中,多個R分別獨立地為烷基或芳基;多個X分別獨立地為氫原子、鹵素原子或烷基;多個X亦可相互鍵結並與該些所鍵結的碳鏈一起形成芳香環;M為兩個氫原子、二價金屬原子或者三價或四價的金屬衍生物;多個n分別獨立地為3~6的整數。
An infrared shielding film for solid-state imaging elements, which essentially contains only one or two organic pigments, and satisfies the following (A) to (C), (A) the transmittance in the range of 430nm or more and 580nm or less The average value is 75% or more, (B) the average transmittance in the range of wavelength 700nm or more and 900nm or less is 16.5% or less, (C) the transmittance under the wavelength of 1200nm is 10% or less, the organic dye Is a phthalocyanine compound represented by the following formula (1);
Figure 107109232-A0305-02-0047-10
In formula (1), multiple Rs are each independently an alkyl group or an aryl group; multiple Xs are each independently a hydrogen atom, a halogen atom or an alkyl group; multiple Xs may also be bonded to each other and to these groups The carbon chains of together form an aromatic ring; M is two hydrogen atoms, a divalent metal atom or a trivalent or tetravalent metal derivative; multiple n are each independently an integer of 3-6.
如申請專利範圍第9項所述的紅外線遮蔽膜,其中(D)下述式所表示的可見光均勻穿透率為10%以下, 可見光均勻穿透率={(波長430nm以上且580nm以下的範圍內的穿透率的平均值-波長430nm以上且580nm以下的範圍內的穿透率的最低值)/波長430nm以上且580nm以下的範圍內的穿透率的平均值}×100(%)。 The infrared shielding film as described in item 9 of the scope of patent application, wherein (D) the uniform transmittance of visible light represented by the following formula is 10% or less, Visible light uniform transmittance=((average value of transmittance in the range of wavelength 430nm or more and 580nm or less-the lowest value of transmittance in the range of wavelength 430nm or more and 580nm or less)/wavelength of 430nm or more and 580nm or less The average value of the transmittance in the range}×100(%). 如申請專利範圍第9項或第10項所述的紅外線遮蔽膜,其進而含有紅外線遮蔽劑,所述紅外線遮蔽劑為金屬氧化物、銅化合物或者該些的組合。 The infrared shielding film according to item 9 or 10 of the scope of patent application, which further contains an infrared shielding agent, and the infrared shielding agent is a metal oxide, a copper compound, or a combination of these. 如申請專利範圍第11項所述的紅外線遮蔽膜,其中所述紅外線遮蔽劑為氧化鎢銫。 The infrared shielding film according to the 11th patent application, wherein the infrared shielding agent is cesium tungsten oxide. 一種固體攝像元件,其具有如申請專利範圍第8項至第12項中任一項所述的紅外線遮蔽膜。 A solid-state imaging element having the infrared shielding film according to any one of the eighth to twelfth patent applications.
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US11015061B2 (en) * 2017-04-07 2021-05-25 Yamamoto Chemicals, Inc. Phthalocyanine-based compound and uses of same

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